TW275183B - - Google Patents

Info

Publication number
TW275183B
TW275183B TW84109270A TW84109270A TW275183B TW 275183 B TW275183 B TW 275183B TW 84109270 A TW84109270 A TW 84109270A TW 84109270 A TW84109270 A TW 84109270A TW 275183 B TW275183 B TW 275183B
Authority
TW
Taiwan
Application number
TW84109270A
Other languages
Chinese (zh)
Original Assignee
Seikosya Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seikosya Kk filed Critical Seikosya Kk
Application granted granted Critical
Publication of TW275183B publication Critical patent/TW275183B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW84109270A 1994-02-28 1995-09-06 TW275183B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6030039A JP2810909B2 (ja) 1994-02-28 1994-02-28 露光装置

Publications (1)

Publication Number Publication Date
TW275183B true TW275183B (es) 1996-05-01

Family

ID=12292690

Family Applications (1)

Application Number Title Priority Date Filing Date
TW84109270A TW275183B (es) 1994-02-28 1995-09-06

Country Status (2)

Country Link
JP (1) JP2810909B2 (es)
TW (1) TW275183B (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
JP4949195B2 (ja) * 2007-10-26 2012-06-06 株式会社アドテックエンジニアリング 露光装置及び基板の矯正装置
JP6149214B2 (ja) * 2013-03-26 2017-06-21 サンエー技研株式会社 露光装置、露光方法

Also Published As

Publication number Publication date
JP2810909B2 (ja) 1998-10-15
JPH07239551A (ja) 1995-09-12

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees