TW274626B - - Google Patents
Info
- Publication number
- TW274626B TW274626B TW84109549A TW84109549A TW274626B TW 274626 B TW274626 B TW 274626B TW 84109549 A TW84109549 A TW 84109549A TW 84109549 A TW84109549 A TW 84109549A TW 274626 B TW274626 B TW 274626B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3636894A JPH07223894A (ja) | 1994-02-10 | 1994-02-10 | 半導体単結晶製造装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW274626B true TW274626B (ja) | 1996-04-21 |
Family
ID=12467898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW84109549A TW274626B (ja) | 1994-02-10 | 1995-09-12 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH07223894A (ja) |
TW (1) | TW274626B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3750174B2 (ja) * | 1996-01-24 | 2006-03-01 | 株式会社Sumco | 単結晶の製造装置および製造方法 |
JP4730937B2 (ja) * | 2004-12-13 | 2011-07-20 | Sumco Techxiv株式会社 | 半導体単結晶製造装置および製造方法 |
JP2007112663A (ja) * | 2005-10-20 | 2007-05-10 | Sumco Techxiv株式会社 | 半導体単結晶製造装置および製造方法 |
JP6257483B2 (ja) | 2014-09-05 | 2018-01-10 | グローバルウェーハズ・ジャパン株式会社 | シリコン単結晶製造方法 |
US10378121B2 (en) | 2015-11-24 | 2019-08-13 | Globalwafers Co., Ltd. | Crystal pulling system and method for inhibiting precipitate build-up in exhaust flow path |
CN116951994A (zh) * | 2023-07-31 | 2023-10-27 | 芯朋半导体科技(如东)有限公司 | 一种半导体设备的炉体废气回收装置 |
-
1994
- 1994-02-10 JP JP3636894A patent/JPH07223894A/ja active Pending
-
1995
- 1995-09-12 TW TW84109549A patent/TW274626B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH07223894A (ja) | 1995-08-22 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |