TW265454B - - Google Patents

Info

Publication number
TW265454B
TW265454B TW084105277A TW84105277A TW265454B TW 265454 B TW265454 B TW 265454B TW 084105277 A TW084105277 A TW 084105277A TW 84105277 A TW84105277 A TW 84105277A TW 265454 B TW265454 B TW 265454B
Authority
TW
Taiwan
Application number
TW084105277A
Other languages
Chinese (zh)
Original Assignee
Viratec Thin Films Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Viratec Thin Films Inc filed Critical Viratec Thin Films Inc
Application granted granted Critical
Publication of TW265454B publication Critical patent/TW265454B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00—Abrasive blasting machines or devices; Plants
    • B24C3/32—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks
    • B24C3/322—Abrasive blasting machines or devices; Plants designed for abrasive blasting of particular work, e.g. the internal surfaces of cylinder blocks for electrical components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00—Abrasive blasting machines or devices; Plants
    • B24C3/08—Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • H10P72/0414—

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
TW084105277A 1994-04-13 1995-05-25 TW265454B (show.php)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/227,156 US5651723A (en) 1994-04-13 1994-04-13 Method and apparatus for cleaning substrates in preparation for deposition of thin film coatings

Publications (1)

Publication Number Publication Date
TW265454B true TW265454B (show.php) 1995-12-11

Family

ID=22851989

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084105277A TW265454B (show.php) 1994-04-13 1995-05-25

Country Status (4)

Country Link
US (1) US5651723A (show.php)
AU (1) AU2282495A (show.php)
TW (1) TW265454B (show.php)
WO (1) WO1995028256A1 (show.php)

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US5904611A (en) * 1996-05-10 1999-05-18 Canon Kabushiki Kaisha Precision polishing apparatus
JP2000516861A (ja) * 1996-08-22 2000-12-19 ザ グッドイヤー タイヤ アンド ラバー カンパニー ロボットｃｏ▲下２▼清浄
US5836809A (en) * 1996-10-07 1998-11-17 Eco-Snow Systems, Inc. Apparatus and method for cleaning large glass plates using linear arrays of carbon dioxide (CO2) jet spray nozzles
JP3183214B2 (ja) * 1997-05-26 2001-07-09 日本電気株式会社 洗浄方法および洗浄装置
US6572457B2 (en) 1998-09-09 2003-06-03 Applied Surface Technologies System and method for controlling humidity in a cryogenic aerosol spray cleaning system
DE19943005A1 (de) * 1999-09-09 2001-05-23 Heinrich Gruber Verfahren zum Reinigen der Oberfläche eines Kunststoffgegenstands
KR20010062209A (ko) 1999-12-10 2001-07-07 히가시 데쓰로 고내식성 막이 내부에 형성된 챔버를 구비하는 처리 장치
US6719613B2 (en) * 2000-08-10 2004-04-13 Nanoclean Technologies, Inc. Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide
CN101250680B (zh) * 2000-12-12 2013-06-26 东京毅力科创株式会社 等离子体处理容器内部件以及等离子体处理装置
JP3887570B2 (ja) * 2002-02-18 2007-02-28 協和化工株式会社 高速乾燥装置
US6764385B2 (en) * 2002-07-29 2004-07-20 Nanoclean Technologies, Inc. Methods for resist stripping and cleaning surfaces substantially free of contaminants
US7297286B2 (en) * 2002-07-29 2007-11-20 Nanoclean Technologies, Inc. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
US7101260B2 (en) * 2002-07-29 2006-09-05 Nanoclean Technologies, Inc. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
US7066789B2 (en) * 2002-07-29 2006-06-27 Manoclean Technologies, Inc. Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
US7134941B2 (en) * 2002-07-29 2006-11-14 Nanoclean Technologies, Inc. Methods for residue removal and corrosion prevention in a post-metal etch process
US20040029494A1 (en) * 2002-08-09 2004-02-12 Souvik Banerjee Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and CO2 based cryogenic cleaning techniques
US7166200B2 (en) * 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7147749B2 (en) * 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US7166166B2 (en) * 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7137353B2 (en) * 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
DE10251815A1 (de) * 2002-11-07 2004-05-19 Abb Patent Gmbh Verfahren und Anordnung zum Trocknen von Kunststoffoberflächen
US7780786B2 (en) 2002-11-28 2010-08-24 Tokyo Electron Limited Internal member of a plasma processing vessel
WO2004095532A2 (en) 2003-03-31 2004-11-04 Tokyo Electron Limited A barrier layer for a processing element and a method of forming the same
JP4597972B2 (ja) * 2003-03-31 2010-12-15 東京エレクトロン株式会社 処理部材上に隣接するコーティングを接合する方法。
US20050067172A1 (en) * 2003-09-26 2005-03-31 Belvis Glen P. System, apparatus and method for fire suppression
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
WO2006076005A1 (en) * 2005-01-12 2006-07-20 Boc, Inc. System for cleaning a surface using cryogenic aerosol and fluid reactant
US7710687B1 (en) 2006-09-13 2010-05-04 Hutchinson Technology Incorporated High conductivity ground planes for integrated lead suspensions
US7929252B1 (en) 2006-10-10 2011-04-19 Hutchinson Technology Incorporated Multi-layer ground plane structures for integrated lead suspensions
US7832082B1 (en) 2006-10-10 2010-11-16 Hutchinson Technology Incorporated Method for manufacturing an integrated lead suspension component
US20090107526A1 (en) * 2007-10-31 2009-04-30 Zhuge Jun Co2 system for polymer film cleaning
WO2009086023A2 (en) * 2007-12-19 2009-07-09 Applied Materials, Inc. Methods for cleaning process kits and chambers, and for ruthenium recovery
US8885299B1 (en) 2010-05-24 2014-11-11 Hutchinson Technology Incorporated Low resistance ground joints for dual stage actuation disk drive suspensions
CN104205216A (zh) 2012-03-22 2014-12-10 哈特奇桑科技公司 用于磁盘驱动器磁头悬架挠性件的接地特征
US20140137910A1 (en) * 2012-11-20 2014-05-22 Bratney Companies Dry ice blasting cleaning system and method of using the same
US8896969B1 (en) 2013-05-23 2014-11-25 Hutchinson Technology Incorporated Two-motor co-located gimbal-based dual stage actuation disk drive suspensions with motor stiffeners
ES2525400B1 (es) * 2013-06-21 2015-09-29 Proyectos Y Montajes Ingemont, S.A. Procedimiento y equipo de limpieza de instalaciones eléctricas en tensión.
US9070392B1 (en) 2014-12-16 2015-06-30 Hutchinson Technology Incorporated Piezoelectric disk drive suspension motors having plated stiffeners
US9318136B1 (en) 2014-12-22 2016-04-19 Hutchinson Technology Incorporated Multilayer disk drive motors having out-of-plane bending
US9296188B1 (en) 2015-02-17 2016-03-29 Hutchinson Technology Incorporated Partial curing of a microactuator mounting adhesive in a disk drive suspension
US20160322239A1 (en) * 2015-04-28 2016-11-03 Applied Materials, Inc. Methods and Apparatus for Cleaning a Substrate
US9734852B2 (en) 2015-06-30 2017-08-15 Hutchinson Technology Incorporated Disk drive head suspension structures having improved gold-dielectric joint reliability
US9646638B1 (en) 2016-05-12 2017-05-09 Hutchinson Technology Incorporated Co-located gimbal-based DSA disk drive suspension with traces routed around slider pad

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US4631250A (en) * 1985-03-13 1986-12-23 Research Development Corporation Of Japan Process for removing covering film and apparatus therefor
US4936922A (en) * 1987-05-21 1990-06-26 Roger L. Cherry High-purity cleaning system, method, and apparatus
DE3844649C2 (show.php) * 1987-06-23 1992-04-23 Taiyo Sanso Co. Ltd., Osaka, Jp
JPH02130921A (ja) * 1988-11-11 1990-05-18 Taiyo Sanso Co Ltd 固体表面洗浄装置
JP2750895B2 (ja) * 1989-05-22 1998-05-13 株式会社ニッサンキ ステアリングホイールの加工装置
US5009240A (en) * 1989-07-07 1991-04-23 United States Of America Wafer cleaning method
US5071289A (en) * 1989-12-27 1991-12-10 Alpheus Cleaning Technologies Corp. Particulate delivery system
JP2825301B2 (ja) * 1990-02-14 1998-11-18 三菱電機株式会社 微細凍結粒子による洗浄装置
JPH0744166B2 (ja) * 1990-07-31 1995-05-15 三菱電機株式会社 半導体ウエハ洗浄装置
US5365699A (en) * 1990-09-27 1994-11-22 Jay Armstrong Blast cleaning system
US5123207A (en) * 1990-10-30 1992-06-23 Tti Engineering Inc. Mobile co2 blasting decontamination system
US5203794A (en) * 1991-06-14 1993-04-20 Alpheus Cleaning Technologies Corp. Ice blasting apparatus
US5315793A (en) * 1991-10-01 1994-05-31 Hughes Aircraft Company System for precision cleaning by jet spray
US5182882A (en) * 1991-12-30 1993-02-02 Fedco Automotive Components Co., Inc. Heater cores having exposed surfaces burnished by wet blasting
JP3287424B2 (ja) * 1991-12-31 2002-06-04 ゼロックス・コーポレーション 円筒状基板用の二酸化炭素精密清掃システム
CA2097222A1 (en) * 1992-06-01 1993-12-02 Somyong Visaisouk Particle blasting utilizing crystalline ice
US5249426A (en) * 1992-06-02 1993-10-05 Alpheus Cleaning Technologies Corp. Apparatus for making and delivering sublimable pellets
US5364472A (en) * 1993-07-21 1994-11-15 At&T Bell Laboratories Probemat cleaning system using CO2 pellets

Also Published As

Publication number Publication date
AU2282495A (en) 1995-11-10
WO1995028256A1 (en) 1995-10-26
US5651723A (en) 1997-07-29

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