TW226053B - - Google Patents
Info
- Publication number
- TW226053B TW226053B TW82106946A TW82106946A TW226053B TW 226053 B TW226053 B TW 226053B TW 82106946 A TW82106946 A TW 82106946A TW 82106946 A TW82106946 A TW 82106946A TW 226053 B TW226053 B TW 226053B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87587192A | 1992-04-29 | 1992-04-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW226053B true TW226053B (zh) | 1994-07-01 |
Family
ID=25366514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW82106946A TW226053B (zh) | 1992-04-29 | 1993-08-27 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0567939A3 (zh) |
| JP (1) | JPH06204200A (zh) |
| TW (1) | TW226053B (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0502356A3 (en) * | 1991-02-28 | 1993-03-10 | Texas Instruments Incorporated | Photo-stimulated removal of trace metals |
| US5695569A (en) * | 1991-02-28 | 1997-12-09 | Texas Instruments Incorporated | Removal of metal contamination |
| EP0702400A3 (en) * | 1992-05-29 | 1996-05-15 | Texas Instruments Inc | Removal of metallic contaminants |
| JPH0817815A (ja) * | 1994-06-30 | 1996-01-19 | Toshiba Corp | 半導体デバイスの製造方法、半導体基板の処理方法、分析方法及び製造方法 |
| AU2001232914A1 (en) * | 2000-01-22 | 2001-07-31 | Ted Albert Loxley | Process and apparatus for cleaning silicon wafers |
| WO2003029830A1 (en) * | 2001-10-03 | 2003-04-10 | Genomic Solutions Acquisitions Limited | Cleaning method |
| JP2005030378A (ja) | 2003-05-30 | 2005-02-03 | Mahindra & Mahindra Ltd | 重力充填式燃料供給ポンプを備えるディーゼルエンジンのセルフエア抜き燃料供給システム |
| CN101107082B (zh) * | 2004-11-25 | 2010-07-21 | 荷兰联合利华有限公司 | 清洁装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01111337A (ja) * | 1987-10-26 | 1989-04-28 | Toshiba Corp | ウエーハ洗浄装置 |
| JPH03136329A (ja) * | 1989-10-23 | 1991-06-11 | Nippon Telegr & Teleph Corp <Ntt> | シリコン基板表面の清浄化方法 |
| JPH0475339A (ja) * | 1990-07-17 | 1992-03-10 | Seiko Epson Corp | 電界洗浄法 |
-
1993
- 1993-04-22 EP EP19930106589 patent/EP0567939A3/en not_active Withdrawn
- 1993-04-28 JP JP5103295A patent/JPH06204200A/ja active Pending
- 1993-08-27 TW TW82106946A patent/TW226053B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06204200A (ja) | 1994-07-22 |
| EP0567939A2 (en) | 1993-11-03 |
| EP0567939A3 (en) | 1993-12-15 |