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Application filed by Sy-Yaw ShyufiledCriticalSy-Yaw Shyu
Priority to TW82105968ApriorityCriticalpatent/TW216411B/en
Application grantedgrantedCritical
Publication of TW216411BpublicationCriticalpatent/TW216411B/en
A pattern duplication method is disclosed, in which the patterns to be duplicated are printed on a metal plate using etch-resistant paint and then the metal plate is etched to cut the pattern into its surface. After the etching treatment, the paint covered portion remains by nature and the other portions will be further polished and lacquered to prevent oxidation and prolong its service life. The paint on the pattern can be kept as a primitive color after the duplication is completed.
Method and arrangement for the repair of damage to surfaces having an embossed patterned texture, especially surfaces on which the embossed pattern is repeated