TW202538395A - 反射型光罩基底、反射型光罩、反射型光罩基底之製造方法、及反射型光罩之製造方法 - Google Patents

反射型光罩基底、反射型光罩、反射型光罩基底之製造方法、及反射型光罩之製造方法

Info

Publication number
TW202538395A
TW202538395A TW113143720A TW113143720A TW202538395A TW 202538395 A TW202538395 A TW 202538395A TW 113143720 A TW113143720 A TW 113143720A TW 113143720 A TW113143720 A TW 113143720A TW 202538395 A TW202538395 A TW 202538395A
Authority
TW
Taiwan
Prior art keywords
film
substrate
conductive film
reflective
reflective photomask
Prior art date
Application number
TW113143720A
Other languages
English (en)
Chinese (zh)
Inventor
赤木大二郎
富澤剛
Original Assignee
日商Ａｇｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ａｇｃ股份有限公司 filed Critical 日商Ａｇｃ股份有限公司
Publication of TW202538395A publication Critical patent/TW202538395A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
TW113143720A 2023-11-29 2024-11-14 反射型光罩基底、反射型光罩、反射型光罩基底之製造方法、及反射型光罩之製造方法 TW202538395A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023201163 2023-11-29
JP2023-201163 2023-11-29

Publications (1)

Publication Number Publication Date
TW202538395A true TW202538395A (zh) 2025-10-01

Family

ID=95896864

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113143720A TW202538395A (zh) 2023-11-29 2024-11-14 反射型光罩基底、反射型光罩、反射型光罩基底之製造方法、及反射型光罩之製造方法

Country Status (3)

Country Link
JP (2) JP7747246B1 (https=)
TW (1) TW202538395A (https=)
WO (1) WO2025115587A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102285099B1 (ko) * 2020-01-08 2021-08-04 주식회사 에스앤에스텍 극자외선용 반사형 블랭크 마스크 및 포토마스크
US12210279B2 (en) * 2021-05-27 2025-01-28 AGC Inc. Electroconductive-film-coated substrate and reflective mask blank
KR102638933B1 (ko) * 2021-09-28 2024-02-22 에이지씨 가부시키가이샤 Euv 리소그래피용 반사형 마스크 블랭크 및 도전막을 구비한 기판
KR102882943B1 (ko) * 2022-04-01 2025-11-07 에이지씨 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법

Also Published As

Publication number Publication date
WO2025115587A1 (ja) 2025-06-05
JP2025170142A (ja) 2025-11-14
JPWO2025115587A1 (https=) 2025-06-05
JP7747246B1 (ja) 2025-10-01

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