JPWO2025115587A1 - - Google Patents
Info
- Publication number
- JPWO2025115587A1 JPWO2025115587A1 JP2025522224A JP2025522224A JPWO2025115587A1 JP WO2025115587 A1 JPWO2025115587 A1 JP WO2025115587A1 JP 2025522224 A JP2025522224 A JP 2025522224A JP 2025522224 A JP2025522224 A JP 2025522224A JP WO2025115587 A1 JPWO2025115587 A1 JP WO2025115587A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2025153206A JP2025170142A (ja) | 2023-11-29 | 2025-09-16 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023201163 | 2023-11-29 | ||
| JP2023201163 | 2023-11-29 | ||
| PCT/JP2024/040091 WO2025115587A1 (ja) | 2023-11-29 | 2024-11-12 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025153206A Division JP2025170142A (ja) | 2023-11-29 | 2025-09-16 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2025115587A1 true JPWO2025115587A1 (https=) | 2025-06-05 |
| JP7747246B1 JP7747246B1 (ja) | 2025-10-01 |
| JPWO2025115587A5 JPWO2025115587A5 (https=) | 2025-10-24 |
Family
ID=95896864
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025522224A Active JP7747246B1 (ja) | 2023-11-29 | 2024-11-12 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
| JP2025153206A Pending JP2025170142A (ja) | 2023-11-29 | 2025-09-16 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025153206A Pending JP2025170142A (ja) | 2023-11-29 | 2025-09-16 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP7747246B1 (https=) |
| TW (1) | TW202538395A (https=) |
| WO (1) | WO2025115587A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102285099B1 (ko) * | 2020-01-08 | 2021-08-04 | 주식회사 에스앤에스텍 | 극자외선용 반사형 블랭크 마스크 및 포토마스크 |
| US12210279B2 (en) * | 2021-05-27 | 2025-01-28 | AGC Inc. | Electroconductive-film-coated substrate and reflective mask blank |
| KR102638933B1 (ko) * | 2021-09-28 | 2024-02-22 | 에이지씨 가부시키가이샤 | Euv 리소그래피용 반사형 마스크 블랭크 및 도전막을 구비한 기판 |
| KR102882943B1 (ko) * | 2022-04-01 | 2025-11-07 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법 |
-
2024
- 2024-11-12 WO PCT/JP2024/040091 patent/WO2025115587A1/ja active Pending
- 2024-11-12 JP JP2025522224A patent/JP7747246B1/ja active Active
- 2024-11-14 TW TW113143720A patent/TW202538395A/zh unknown
-
2025
- 2025-09-16 JP JP2025153206A patent/JP2025170142A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025115587A1 (ja) | 2025-06-05 |
| TW202538395A (zh) | 2025-10-01 |
| JP2025170142A (ja) | 2025-11-14 |
| JP7747246B1 (ja) | 2025-10-01 |
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