TW202503813A - 產生離子能量分佈函數的方法 - Google Patents

產生離子能量分佈函數的方法 Download PDF

Info

Publication number
TW202503813A
TW202503813A TW113129778A TW113129778A TW202503813A TW 202503813 A TW202503813 A TW 202503813A TW 113129778 A TW113129778 A TW 113129778A TW 113129778 A TW113129778 A TW 113129778A TW 202503813 A TW202503813 A TW 202503813A
Authority
TW
Taiwan
Prior art keywords
voltage
wafer
electrode
applying
energy distribution
Prior art date
Application number
TW113129778A
Other languages
English (en)
Chinese (zh)
Inventor
雷歐尼德 朵夫
特拉維斯 高
奧黎維兒 魯爾
奧利維爾 朱伯特
菲利浦Ａ 克勞司
拉吉德 汀德沙
詹姆士修 羅傑斯
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TW202503813A publication Critical patent/TW202503813A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
    • H01L21/32136—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
TW113129778A 2016-12-12 2017-12-12 產生離子能量分佈函數的方法 TW202503813A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662433204P 2016-12-12 2016-12-12
US62/433,204 2016-12-12
US15/834,939 US10312048B2 (en) 2016-12-12 2017-12-07 Creating ion energy distribution functions (IEDF)
US15/834,939 2017-12-07

Publications (1)

Publication Number Publication Date
TW202503813A true TW202503813A (zh) 2025-01-16

Family

ID=62490319

Family Applications (3)

Application Number Title Priority Date Filing Date
TW113129778A TW202503813A (zh) 2016-12-12 2017-12-12 產生離子能量分佈函數的方法
TW111141611A TWI855415B (zh) 2016-12-12 2017-12-12 產生離子能量分佈函數的方法
TW106143511A TWI784991B (zh) 2016-12-12 2017-12-12 產生離子能量分佈函數（ｉｅｄｆ）的方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW111141611A TWI855415B (zh) 2016-12-12 2017-12-12 產生離子能量分佈函數的方法
TW106143511A TWI784991B (zh) 2016-12-12 2017-12-12 產生離子能量分佈函數（ｉｅｄｆ）的方法

Country Status (6)

Country Link
US (4) US10312048B2 (enExample)
JP (3) JP7213808B2 (enExample)
KR (3) KR102770824B1 (enExample)
CN (2) CN109997214B (enExample)
TW (3) TW202503813A (enExample)
WO (1) WO2018111751A1 (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10312048B2 (en) * 2016-12-12 2019-06-04 Applied Materials, Inc. Creating ion energy distribution functions (IEDF)
US10510575B2 (en) 2017-09-20 2019-12-17 Applied Materials, Inc. Substrate support with multiple embedded electrodes
US10555412B2 (en) 2018-05-10 2020-02-04 Applied Materials, Inc. Method of controlling ion energy distribution using a pulse generator with a current-return output stage
US11810761B2 (en) 2018-07-27 2023-11-07 Eagle Harbor Technologies, Inc. Nanosecond pulser ADC system
US11476145B2 (en) 2018-11-20 2022-10-18 Applied Materials, Inc. Automatic ESC bias compensation when using pulsed DC bias
JP7451540B2 (ja) 2019-01-22 2024-03-18 アプライド マテリアルズ インコーポレイテッド パルス状電圧波形を制御するためのフィードバックループ
US11508554B2 (en) 2019-01-24 2022-11-22 Applied Materials, Inc. High voltage filter assembly
US20230352264A1 (en) * 2019-05-07 2023-11-02 Applied Materials, Inc. Creating Ion Energy Distribution Functions (IEDF)
JP7603649B2 (ja) 2019-07-12 2024-12-20 エーイーエス グローバル ホールディングス， プライベート リミテッド 単一制御型スイッチを伴うバイアス供給装置
NL2023935B1 (en) * 2019-10-02 2021-05-31 Prodrive Tech Bv Determining an optimal ion energy for plasma processing of a dielectric substrate
US11043387B2 (en) 2019-10-30 2021-06-22 Applied Materials, Inc. Methods and apparatus for processing a substrate
US11742184B2 (en) 2020-02-28 2023-08-29 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
US12125674B2 (en) * 2020-05-11 2024-10-22 Advanced Energy Industries, Inc. Surface charge and power feedback and control using a switch mode bias system
US11967484B2 (en) 2020-07-09 2024-04-23 Eagle Harbor Technologies, Inc. Ion current droop compensation
NL2026071B1 (en) * 2020-07-15 2022-03-18 Prodrive Tech Bv Voltage waveform generator for plasma assisted processing apparatuses
US11462389B2 (en) 2020-07-31 2022-10-04 Applied Materials, Inc. Pulsed-voltage hardware assembly for use in a plasma processing system
CN116636144A (zh) * 2020-10-02 2023-08-22 鹰港科技有限公司 离子电流下降补偿
US11901157B2 (en) * 2020-11-16 2024-02-13 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11798790B2 (en) * 2020-11-16 2023-10-24 Applied Materials, Inc. Apparatus and methods for controlling ion energy distribution
US11495470B1 (en) 2021-04-16 2022-11-08 Applied Materials, Inc. Method of enhancing etching selectivity using a pulsed plasma
US11948780B2 (en) 2021-05-12 2024-04-02 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US11791138B2 (en) 2021-05-12 2023-10-17 Applied Materials, Inc. Automatic electrostatic chuck bias compensation during plasma processing
US20220375013A1 (en) * 2021-05-21 2022-11-24 Stanislav Chijik Method And Apparatus For Cannabis and Cannabinoid Rights Certification, Verification, And Tracking System
US11967483B2 (en) 2021-06-02 2024-04-23 Applied Materials, Inc. Plasma excitation with ion energy control
US20220399185A1 (en) 2021-06-09 2022-12-15 Applied Materials, Inc. Plasma chamber and chamber component cleaning methods
US12148595B2 (en) 2021-06-09 2024-11-19 Applied Materials, Inc. Plasma uniformity control in pulsed DC plasma chamber
US11810760B2 (en) 2021-06-16 2023-11-07 Applied Materials, Inc. Apparatus and method of ion current compensation
US11569066B2 (en) 2021-06-23 2023-01-31 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US11776788B2 (en) 2021-06-28 2023-10-03 Applied Materials, Inc. Pulsed voltage boost for substrate processing
US11476090B1 (en) 2021-08-24 2022-10-18 Applied Materials, Inc. Voltage pulse time-domain multiplexing
US12106938B2 (en) 2021-09-14 2024-10-01 Applied Materials, Inc. Distortion current mitigation in a radio frequency plasma processing chamber
US11694876B2 (en) 2021-12-08 2023-07-04 Applied Materials, Inc. Apparatus and method for delivering a plurality of waveform signals during plasma processing
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
US11996274B2 (en) * 2022-04-07 2024-05-28 Mks Instruments, Inc. Real-time, non-invasive IEDF plasma sensor
US11972924B2 (en) 2022-06-08 2024-04-30 Applied Materials, Inc. Pulsed voltage source for plasma processing applications
US12315732B2 (en) 2022-06-10 2025-05-27 Applied Materials, Inc. Method and apparatus for etching a semiconductor substrate in a plasma etch chamber
US11824542B1 (en) 2022-06-29 2023-11-21 Eagle Harbor Technologies, Inc. Bipolar high voltage pulser
US12272524B2 (en) 2022-09-19 2025-04-08 Applied Materials, Inc. Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics
KR20250084155A (ko) 2022-09-29 2025-06-10 이글 하버 테크놀로지스, 인코포레이티드 고전압 플라즈마 제어
US12111341B2 (en) 2022-10-05 2024-10-08 Applied Materials, Inc. In-situ electric field detection method and apparatus
CN116066319A (zh) * 2023-03-14 2023-05-05 哈尔滨工业大学 抑制电推进空心阴极放电振荡的阴极外部电子补偿方法
JP7545608B1 (ja) * 2024-05-09 2024-09-04 株式会社京三製作所 パルス電源装置
JP7545607B1 (ja) 2024-05-09 2024-09-04 株式会社京三製作所 パルス電源装置

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1285343A (fr) * 1961-01-10 1962-02-23 Leybolds Nachfolger E Dispositif pour la détection d'ions de masses différentes et son procédé de fonctionnement
JP4018935B2 (ja) * 1996-03-01 2007-12-05 株式会社日立製作所 プラズマ処理装置
JP3319285B2 (ja) * 1996-06-05 2002-08-26 株式会社日立製作所 プラズマ処理装置及びプラズマ処理方法
US6201208B1 (en) * 1999-11-04 2001-03-13 Wisconsin Alumni Research Foundation Method and apparatus for plasma processing with control of ion energy distribution at the substrates
US6544895B1 (en) * 2000-08-17 2003-04-08 Micron Technology, Inc. Methods for use of pulsed voltage in a plasma reactor
US6875700B2 (en) * 2000-08-29 2005-04-05 Board Of Regents, The University Of Texas System Ion-Ion plasma processing with bias modulation synchronized to time-modulated discharges
JP4319514B2 (ja) * 2002-11-29 2009-08-26 株式会社日立ハイテクノロジーズ サグ補償機能付き高周波電源を有するプラズマ処理装置
US7510665B2 (en) * 2003-08-15 2009-03-31 Applied Materials, Inc. Plasma generation and control using dual frequency RF signals
US7666464B2 (en) * 2004-10-23 2010-02-23 Applied Materials, Inc. RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor
KR100782370B1 (ko) 2006-08-04 2007-12-07 삼성전자주식회사 지연 전기장을 이용한 이온 에너지 분포 분석기에 근거한이온 분석 시스템
US20090004836A1 (en) 2007-06-29 2009-01-01 Varian Semiconductor Equipment Associates, Inc. Plasma doping with enhanced charge neutralization
US8140292B2 (en) * 2007-09-18 2012-03-20 Wisconsin Alumni Research Foundation Method and system for controlling a voltage waveform
JP5295833B2 (ja) * 2008-09-24 2013-09-18 株式会社東芝 基板処理装置および基板処理方法
US9208902B2 (en) 2008-10-31 2015-12-08 Texas Instruments Incorporated Bitline leakage detection in memories
US9887069B2 (en) * 2008-12-19 2018-02-06 Lam Research Corporation Controlling ion energy distribution in plasma processing systems
JP5221403B2 (ja) * 2009-01-26 2013-06-26 東京エレクトロン株式会社 プラズマエッチング方法、プラズマエッチング装置および記憶媒体
US9287092B2 (en) * 2009-05-01 2016-03-15 Advanced Energy Industries, Inc. Method and apparatus for controlling ion energy distribution
US9435029B2 (en) * 2010-08-29 2016-09-06 Advanced Energy Industries, Inc. Wafer chucking system for advanced plasma ion energy processing systems
US11615941B2 (en) 2009-05-01 2023-03-28 Advanced Energy Industries, Inc. System, method, and apparatus for controlling ion energy distribution in plasma processing systems
US9767988B2 (en) * 2010-08-29 2017-09-19 Advanced Energy Industries, Inc. Method of controlling the switched mode ion energy distribution system
US9287086B2 (en) * 2010-04-26 2016-03-15 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution
CN102549724B (zh) * 2009-09-29 2015-01-28 株式会社东芝 基板处理装置
US9309594B2 (en) 2010-04-26 2016-04-12 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution of a projected plasma
US9362089B2 (en) * 2010-08-29 2016-06-07 Advanced Energy Industries, Inc. Method of controlling the switched mode ion energy distribution system
JP2012104382A (ja) * 2010-11-10 2012-05-31 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法並びにプラズマ処理のバイアス電圧決定方法
JP6329542B2 (ja) * 2012-08-28 2018-05-23 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． プラズマ処理システム、プラズマシース電圧確立方法、および当該方法を実行可能な命令を読み取り可能な記憶媒体
US9210790B2 (en) 2012-08-28 2015-12-08 Advanced Energy Industries, Inc. Systems and methods for calibrating a switched mode ion energy distribution system
WO2014036000A1 (en) 2012-08-28 2014-03-06 Advanced Energy Industries, Inc. Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6329543B2 (ja) * 2012-08-28 2018-05-23 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 切り替えモードイオンエネルギー分布システムを制御する方法
US9053908B2 (en) 2013-09-19 2015-06-09 Lam Research Corporation Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etching
KR20160022458A (ko) * 2014-08-19 2016-03-02 삼성전자주식회사 플라즈마 장비 및 이의 동작 방법
US10049857B2 (en) 2014-12-04 2018-08-14 Mks Instruments, Inc. Adaptive periodic waveform controller
US9595424B2 (en) * 2015-03-02 2017-03-14 Lam Research Corporation Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
KR101563252B1 (ko) 2015-03-03 2015-10-28 주식회사 이노액시스 에너지 환수 가능한 디스플레이 드라이버, 에너지 환수 가능한 디스플레이 및 에너지 환수 가능한 디스플레이 구동 방법
US10395895B2 (en) 2015-08-27 2019-08-27 Mks Instruments, Inc. Feedback control by RF waveform tailoring for ion energy distribution
US9966231B2 (en) 2016-02-29 2018-05-08 Lam Research Corporation Direct current pulsing plasma systems
US12456611B2 (en) * 2016-06-13 2025-10-28 Applied Materials, Inc. Systems and methods for controlling a voltage waveform at a substrate during plasma processing
US10026592B2 (en) 2016-07-01 2018-07-17 Lam Research Corporation Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
WO2018098550A1 (en) 2016-12-01 2018-06-07 Fernandes Joao Marques Constructive arrangement for the opening of a beverage can
US10312048B2 (en) * 2016-12-12 2019-06-04 Applied Materials, Inc. Creating ion energy distribution functions (IEDF)
US11011351B2 (en) 2018-07-13 2021-05-18 Lam Research Corporation Monoenergetic ion generation for controlled etch

Also Published As

Publication number Publication date
JP2024133686A (ja) 2024-10-02
TWI784991B (zh) 2022-12-01
JP2020501351A (ja) 2020-01-16
TWI855415B (zh) 2024-09-11
US20210343496A1 (en) 2021-11-04
TW201833965A (zh) 2018-09-16
KR102335200B1 (ko) 2021-12-02
US11069504B2 (en) 2021-07-20
TW202312210A (zh) 2023-03-16
JP7213808B2 (ja) 2023-01-27
US20180166249A1 (en) 2018-06-14
JP7766751B2 (ja) 2025-11-10
US10312048B2 (en) 2019-06-04
WO2018111751A1 (en) 2018-06-21
US10685807B2 (en) 2020-06-16
CN112701025B (zh) 2024-03-26
US11728124B2 (en) 2023-08-15
KR102770824B1 (ko) 2025-02-19
CN112701025A (zh) 2021-04-23
KR20190083007A (ko) 2019-07-10
JP2023022086A (ja) 2023-02-14
KR20230062662A (ko) 2023-05-09
KR102527251B1 (ko) 2023-04-27
US20190259562A1 (en) 2019-08-22
CN109997214B (zh) 2023-08-22
KR20210150603A (ko) 2021-12-10
JP7703507B2 (ja) 2025-07-07
CN109997214A (zh) 2019-07-09
US20200266022A1 (en) 2020-08-20

Similar Documents

Publication Publication Date Title
TWI855415B (zh) 產生離子能量分佈函數的方法
CN102217045B (zh) 用于控制离子能量分布的方法和设备
TW202524527A (zh) 建立離子能量分佈函數(iedf)
US9287086B2 (en) System, method and apparatus for controlling ion energy distribution
JP2010515262A (ja) プラズマ強化型基板処理方法および装置
KR20230053681A (ko) 펄스형 용량성 결합 플라즈마 공정
KR102857907B1 (ko) 임피던스 조정장치
US12237149B2 (en) Reducing aspect ratio dependent etch with direct current bias pulsing
CN121175777A (en) Establishing Ion Energy Distribution Function (IEDF)
WO2023211665A1 (en) Method to enhance etch rate and improve critical dimension of features and mask selectivity