TW202429625A - 半導體裝置結構及其製備方法 - Google Patents
半導體裝置結構及其製備方法 Download PDFInfo
- Publication number
- TW202429625A TW202429625A TW112109849A TW112109849A TW202429625A TW 202429625 A TW202429625 A TW 202429625A TW 112109849 A TW112109849 A TW 112109849A TW 112109849 A TW112109849 A TW 112109849A TW 202429625 A TW202429625 A TW 202429625A
- Authority
- TW
- Taiwan
- Prior art keywords
- dielectric layer
- semiconductor device
- device structure
- preparing
- same
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 125000006850 spacer group Chemical group 0.000 abstract 3
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Abstract
本申請提供一種半導體裝置結構及其製備方法。該半導體裝置結構包含設置在一半導體基底上的一第一介電層,以及設置在該第一介電層上的一第二介電層。半導體裝置結構也包含設置在該第二介電層內的一間隙物結構,以及穿過該第二介電層且延伸進入該第一介電層的一導電結構。該導電結構由該間隙物結構環繞。半導體裝置結構更包含將該導電結構與該第一介電層、該第二介電層和該間隙物結構隔開的一襯層。該襯層具有直接接觸該第一介電層的一錐形側壁。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18/094,507 US20240234313A1 (en) | 2023-01-09 | 2023-01-09 | Semiconductor device structure with liner layer having tapered sidewall and method for preparing the same |
US18/094,507 | 2023-01-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI833606B TWI833606B (zh) | 2024-02-21 |
TW202429625A true TW202429625A (zh) | 2024-07-16 |
Family
ID=90825132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112109849A TWI833606B (zh) | 2023-01-09 | 2023-03-16 | 半導體裝置結構及其製備方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20240234313A1 (zh) |
CN (1) | CN118315368A (zh) |
DE (1) | DE102023115196A1 (zh) |
TW (1) | TWI833606B (zh) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10014382B2 (en) * | 2014-03-13 | 2018-07-03 | Taiwan Semiconductor Manufacturing Company Limited | Semiconductor device with sidewall passivation and method of making |
US9299608B2 (en) * | 2014-05-19 | 2016-03-29 | Globalfoundries Inc. | T-shaped contacts for semiconductor device |
US11424346B2 (en) * | 2020-06-30 | 2022-08-23 | Nanya Technology Corporation | Semiconductor device with programmable feature and method for fabricating the same |
-
2023
- 2023-01-09 US US18/094,507 patent/US20240234313A1/en active Pending
- 2023-03-16 TW TW112109849A patent/TWI833606B/zh active
- 2023-04-26 CN CN202310460831.6A patent/CN118315368A/zh active Pending
- 2023-06-12 DE DE102023115196.7A patent/DE102023115196A1/de active Pending
- 2023-10-16 US US18/380,330 patent/US20240234314A1/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1860686A3 (en) | Semiconductor memory device having a recess-type control gate electrode and method of fabricating the semiconductor memory device | |
TW200601485A (en) | Semiconductor device substrate with wmbedded capacitor | |
WO2003103032A3 (en) | A method for making a semiconductor device having a high-k gate dielectric | |
TW200741916A (en) | Low resistance and inductance backside through vias and methods of fabricating same | |
TW200419802A (en) | Structure of multiple-gate transistor and method for manufacturing the same | |
EP3579291A3 (en) | Method of forming niobium nitride electrode for capacitor | |
TW200638555A (en) | Solar cell and semiconductor device, and manufacturing method thereof | |
CN104409411A (zh) | 半导体器件及其形成方法 | |
TW200616028A (en) | Passive device and method for forming the same | |
US8907382B2 (en) | Semiconductor device and fabrication method thereof | |
TW200644163A (en) | Multilevel semiconductor devices and methods of manufacturing the same | |
WO2019165107A8 (en) | Apparatus with overlapping deep trench and shallow trench and method of fabricating the same with low defect density | |
TW200744162A (en) | Method for fabricating semiconductor device having capacitor | |
WO2004017398A3 (en) | Semiconductor-on-insulator device and method of its manufacture | |
WO2004077509A3 (en) | SHALLOW TRENCH ISOLATION STRUCTURE FOR STRAINED Si ON SiGe | |
TWI264083B (en) | Method for forming capacitor of semiconductor device | |
EP3421415A3 (en) | Device package with reduced radio frequency losses | |
TW200625446A (en) | Semiconductor devices and methods for fabricating the same | |
TW200746391A (en) | Embedded capacitor in semiconductor device and methods for fabricating the same | |
TW202429625A (zh) | 半導體裝置結構及其製備方法 | |
TWI265570B (en) | Semiconductor device with composite etch stop layer and fabrication method thereof | |
US10204779B2 (en) | Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof, display apparatus | |
EP1353369A3 (en) | Method for producing semiconductor device | |
TWI267146B (en) | Method for fabricating semiconductor device | |
US9847357B2 (en) | Thin film transistor that includes group VB metal oxide insulating layer |