TW202416033A - Manufacturing method of electrochromic film - Google Patents

Manufacturing method of electrochromic film Download PDF

Info

Publication number
TW202416033A
TW202416033A TW111137393A TW111137393A TW202416033A TW 202416033 A TW202416033 A TW 202416033A TW 111137393 A TW111137393 A TW 111137393A TW 111137393 A TW111137393 A TW 111137393A TW 202416033 A TW202416033 A TW 202416033A
Authority
TW
Taiwan
Prior art keywords
color
conductive film
changing
layer
film material
Prior art date
Application number
TW111137393A
Other languages
Chinese (zh)
Other versions
TWI818753B (en
Inventor
邱達成
Original Assignee
昶曜科技股份有限公司
Filing date
Publication date
Application filed by 昶曜科技股份有限公司 filed Critical 昶曜科技股份有限公司
Priority to TW111137393A priority Critical patent/TWI818753B/en
Priority claimed from TW111137393A external-priority patent/TWI818753B/en
Priority to JP2023167638A priority patent/JP2024052603A/en
Application granted granted Critical
Publication of TWI818753B publication Critical patent/TWI818753B/en
Publication of TW202416033A publication Critical patent/TW202416033A/en

Links

Images

Abstract

The present disclosure provides a manufacturing method for an electrochromic thin film. The manufacturing method includes: forming a color-changing reduction layer on a first conductive film; receiving a second conductive film, the second conductive film includes a first electrode area and a first non-electrode area; forming a color-changing oxidation layer on the first non-electrode area of the second conductive film; continuously supplying the second conductive film provided with the color-changing reduction layer, such that an ion-conducting colloid is formed on the color-changing reduction layer; pressing the first conductive film with the color-changing reduction layer onto the continuously supplied ion-conducting colloid, such that the color-changing reduction layer is disposed between the first conductive film and the ion-conducting colloid; and curing the ion-conducting colloid to form a solid-state electrolyte layer.

Description

電致變色薄膜的製造方法Method for manufacturing electrochromic film

本揭露內容是有關於一種電致變色膜的製造方法。The present disclosure relates to a method for manufacturing an electrochromic film.

目前市面上的電致變色元件多以玻璃基板等硬質材作為基礎層板,使得電致變色元件在生產過程中無法被收納,而僅能以獨立片狀式結構實施,且獨立片狀式的電致變色元件不利於量產,產能相對受到限制。片狀式結構的電致變色元件在應用上容易受限於材料尺寸、形狀及彎曲情形(曲面)而無法被廣泛應用,且在應用時為因應物品尺寸,在裁切後容易有廢料產生。Currently, most electrochromic components on the market use hard materials such as glass substrates as the base layer, which makes it impossible to store electrochromic components during the production process. They can only be implemented in an independent sheet-type structure. Independent sheet-type electrochromic components are not conducive to mass production and their production capacity is relatively limited. Sheet-type electrochromic components are easily limited in application due to the size, shape and curvature (curved surface) of the material and cannot be widely used. In addition, in order to adapt to the size of the object during application, waste is easily generated after cutting.

根據本揭露一些實施方式,本揭露提供一種電致變色薄膜的製造方法,該製造方法包括:在第一導電膜材上形成變色還原層;接收第二導電膜材,第二導電膜材包括第一電極區及第一非電極區;在第二導電膜材的第一非電極區上形成變色氧化層;連續供應設置有變色氧化層的第二導電膜材,使離子傳導膠體形成於變色氧化層上;將設置有變色還原層的第一導電膜材壓合至連續供應的離子傳導膠體上,使變色還原層位於第一導電膜材與離子傳導膠體之間;以及將離子傳導膠體固化以形成固態電解質層。According to some embodiments of the present disclosure, the present disclosure provides a method for manufacturing an electrochromic film, which includes: forming a color-changing reduction layer on a first conductive film material; receiving a second conductive film material, the second conductive film material including a first electrode region and a first non-electrode region; forming a color-changing oxide layer on the first non-electrode region of the second conductive film material; continuously supplying the second conductive film material provided with the color-changing oxide layer so that an ion-conductive colloid is formed on the color-changing oxide layer; pressing the first conductive film material provided with the color-changing reduction layer onto the continuously supplied ion-conductive colloid so that the color-changing reduction layer is located between the first conductive film material and the ion-conductive colloid; and curing the ion-conductive colloid to form a solid electrolyte layer.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:在形成變色氧化層之前,在第二導電膜材的第一電極區上形成遮蔽層。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: before forming the color-changing oxide layer, forming a shielding layer on the first electrode region of the second conductive film material.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:在形成變色氧化層之後,去除遮蔽層。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: after forming the color-changing oxide layer, removing the shielding layer.

在本揭露一些實施方式中,離子傳導膠體更包括形成離子傳導膠體於第二導電膜材的第一電極區上。In some embodiments of the present disclosure, the ion conductive colloid further includes forming the ion conductive colloid on the first electrode region of the second conductive film material.

在本揭露一些實施方式中,第一導電膜材包括第二電極區及第二非電極區,且變色還原層係形成在第一導電膜材的第二非電極區上。In some embodiments of the present disclosure, the first conductive film includes a second electrode region and a second non-electrode region, and the color-changing reduction layer is formed on the second non-electrode region of the first conductive film.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:在形成變色還原層之前,在第一導電膜材的第二電極區上形成遮蔽層。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: before forming the color-changing reduction layer, forming a shielding layer on the second electrode region of the first conductive film material.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:在形成變色還原層之後,去除遮蔽層。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: after forming the color-changing reduction layer, removing the shielding layer.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:進行塗佈步驟,以形成電極於第二導電膜材的第一電極區,其中電極與固態電解質層之間具有間隙。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: performing a coating step to form an electrode in the first electrode region of the second conductive film material, wherein a gap is provided between the electrode and the solid electrolyte layer.

在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:形成封邊結構於間隙中,其中封邊結構的材料包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: forming an edge sealing structure in the gap, wherein the material of the edge sealing structure includes acrylic resin, epoxy resin or a combination thereof.

在本揭露一些實施方式中,封邊結構覆蓋第一電極的頂面。In some embodiments of the present disclosure, the edge sealing structure covers the top surface of the first electrode.

根據本揭露上述實施方式,由於本揭露事先於導電膜材上規劃出電極區及非電極區,因此可確保變色氧化層僅形成在非電極區中,如此不須額外清除多餘的變色氧化層,大幅提升製程便利性,並且可確保電極穩固地形成於電致變色薄膜中。According to the above-mentioned implementation method of the present disclosure, since the present disclosure plans the electrode area and the non-electrode area on the conductive film material in advance, it can be ensured that the color-changing oxide layer is only formed in the non-electrode area. In this way, there is no need to additionally remove the excess color-changing oxide layer, which greatly improves the convenience of the process and ensures that the electrode is stably formed in the electrochromic film.

以下將揭露本揭露之複數個實施方式,為明確地說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務的細節不應用以限制本揭露。也就是說,在本揭露部分實施方式中,這些實務上的細節是非必要的,因此不應用以限制本揭露。The following will disclose multiple implementations of the present disclosure. For the purpose of clarity, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present disclosure. In other words, in some implementations of the present disclosure, these practical details are not necessary and therefore should not be used to limit the present disclosure.

應當理解,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖式中所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。舉例而言,若一附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,若一個附圖中的裝置翻轉,則被描述為在其它元件「下」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下」 或「下面」可以包括上方和下方的取向。It should be understood that relative terms such as "below" or "bottom" and "above" or "top" may be used herein to describe the relationship of one element to another element, as shown in the drawings. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in an accompanying figure is flipped, the elements described as being on the "below" side of other elements will be oriented on the "above" side of other elements. Therefore, the exemplary term "below" can include both "below" and "above" orientations, depending on the specific orientation of the accompanying figure. Similarly, if the device in an accompanying figure is flipped, the elements described as being "below" or "below" other elements will be oriented as being "above" other elements. Therefore, the exemplary term "below" or "below" can include both above and below orientations.

本揭露提供一種電致變色薄膜的製造方法,其透過特殊的製程改良,將電致變色薄膜的製造過程整合至卷對卷(roll to roll)製程中。如此一來,不僅可提高生產效率及良率、避免廢氣或廢液排放、提高儲存及運送的便利性,還可形成卷狀的電致變色薄膜,進而取代傳統板材(片材)狀的電致變色元件。藉此,成卷的電致變色薄膜可直接根據後端的設計而裁切為合適的形狀及尺寸,使整個電致變色薄膜的製造方法不會受限於電致變色薄膜於應用時的最終形狀、尺寸及彎曲弧度。此外,由於事先於導電膜材規劃出電極區及非電極區,因此可確保變色氧化/還原層僅形成在非電極區中,如此不須額外清除多餘的變色氧化/還原層,大幅提升製程便利性,並且可確保電極穩固地形成於電致變色薄膜中。另外,以本揭露之製造方法製備而成的電致變色薄膜可省去框膠(框架)的配置,也就是說,不需額外引入框膠來避免電致變色薄膜中的電解液外漏,進而大幅提升電致變色薄膜的應用性以及安裝便利性,使電致變色薄膜可應用於多種領域。本揭露的電致變色薄膜可應用於建材帷幕玻璃、採光窗、智慧窗、室內隔間牆、汽車後視鏡或外視鏡、汽車天窗、側窗和擋風玻璃(應用在汽車、大型陸上運輸工具、捷運、電車、高鐵、飛機、船舶等)、個人穿戴鏡片(變色鏡、雪鏡、安全鏡)、3C虛擬實境鏡、安全帽鏡片等多種領域。The present disclosure provides a method for manufacturing an electrochromic film, which integrates the manufacturing process of the electrochromic film into a roll-to-roll process through a special process improvement. In this way, not only can the production efficiency and yield be improved, the emission of waste gas or waste liquid be avoided, and the convenience of storage and transportation be improved, but also a roll-shaped electrochromic film can be formed to replace the traditional plate (sheet)-shaped electrochromic element. In this way, the rolled electrochromic film can be directly cut into a suitable shape and size according to the design of the back end, so that the entire electrochromic film manufacturing method is not limited by the final shape, size and curvature of the electrochromic film when it is used. In addition, since the electrode area and the non-electrode area are planned in advance in the conductive film material, it can be ensured that the color-changing oxidation/reduction layer is only formed in the non-electrode area, so there is no need to remove the excess color-changing oxidation/reduction layer, which greatly improves the convenience of the process and ensures that the electrode is stably formed in the electrochromic film. In addition, the electrochromic film prepared by the manufacturing method disclosed in the present invention can save the configuration of the frame glue (frame), that is, there is no need to introduce additional frame glue to prevent the electrolyte in the electrochromic film from leaking out, thereby greatly improving the applicability and installation convenience of the electrochromic film, so that the electrochromic film can be applied to a variety of fields. The electrochromic film disclosed herein can be applied to building curtain glass, skylights, smart windows, interior partition walls, automobile rearview mirrors or exterior mirrors, automobile sunroofs, side windows and windshields (applied in automobiles, large land transportation vehicles, subways, trams, high-speed railways, airplanes, ships, etc.), personal wearable lenses (photochromic lenses, snow goggles, safety goggles), 3C virtual reality goggles, helmet lenses, and many other fields.

請參閱第1圖,其繪示根據本揭露一些實施方式之電致變色薄膜的製造方法的流程圖。電致變色薄膜的製造方法包括步驟S10至步驟S60,其中步驟S10至步驟S60可依序進行。在步驟S10中,在第一導電膜材上形成變色還原層。在步驟S20中,接收第二導電膜材,第二導電膜材包括第一電極區及第一非電極區(在第二導電膜材上規劃第一電極區及第一非電極區)。在步驟S30中,在第二導電膜材的第一非電極區上形成變色氧化層。在步驟S40中,連續供應設置有變色氧化層的第二導電膜材,使離子傳導膠體形成於變色氧化層上。在步驟S50中,將設置有變色還原層的第一導電膜材壓合至連續供應的離子傳導膠體上,使變色還原層位於第一導電膜材與離子傳導膠體之間。在步驟S60中,將離子傳導膠體固化以形成固態電解質層。在以下敘述中,將透過第2圖至第3H圖來詳細說明上述各步驟,其中第2圖繪示根據本揭露一些實施方式之膜狀疊層100的製程示意圖,第3A圖至第3H圖繪示根據本揭露一些實施方式之電致變色薄膜1000的製造方法在不同步驟的剖面示意圖,且第4A圖至第4C圖繪示Please refer to Figure 1, which shows a flow chart of a method for manufacturing an electrochromic film according to some embodiments of the present disclosure. The method for manufacturing an electrochromic film includes steps S10 to S60, wherein steps S10 to S60 can be performed in sequence. In step S10, a color-changing reduction layer is formed on a first conductive film material. In step S20, a second conductive film material is received, the second conductive film material includes a first electrode region and a first non-electrode region (the first electrode region and the first non-electrode region are planned on the second conductive film material). In step S30, a color-changing oxide layer is formed on the first non-electrode region of the second conductive film material. In step S40, a second conductive film material provided with a color-changing oxide layer is continuously supplied, so that an ion-conducting colloid is formed on the color-changing oxide layer. In step S50, a first conductive film material provided with a color-changing reduction layer is pressed onto the continuously supplied ion-conducting colloid, so that the color-changing reduction layer is located between the first conductive film material and the ion-conducting colloid. In step S60, the ion-conducting colloid is cured to form a solid electrolyte layer. In the following description, each of the above steps will be described in detail through Figures 2 to 3H, wherein Figure 2 is a schematic diagram of the process of manufacturing the film-like stack 100 according to some embodiments of the present disclosure, Figures 3A to 3H are schematic diagrams of cross-sections of the manufacturing method of the electrochromic film 1000 according to some embodiments of the present disclosure at different steps, and Figures 4A to 4C are schematic diagrams of the manufacturing method of the electrochromic film 1000 according to some embodiments of the present disclosure.

首先,請先參閱第3A圖,在步驟S10中,在第一導電膜材110上形成變色還原層120。在一些實施方式中,可透過卷對卷製程將變色還原層120形成於連續供應之第一導電膜材110的表面111。在一些實施方式中,第一導電膜材110可包括基材115及配置於基材115之表面116的氧化銦錫導電薄膜117,其中基材115的材料可包括聚對苯二甲酸乙二醇酯,且基材115的厚度H1可介於38微米至188微米之間,較佳可介於75微米至125微米之間,更佳可介於100微米至125微米之間,使第一導電膜材110兼具一定的承載力以及良好的可撓性,進而利於整合至卷對卷製程中。在一些實施方式中,氧化銦錫導電薄膜117的面阻值可介於5Ω/□至50Ω/□之間,使電致變色薄膜1000具有合適的電性規格。First, please refer to FIG. 3A. In step S10, a color-changing reduction layer 120 is formed on the first conductive film 110. In some embodiments, the color-changing reduction layer 120 can be formed on the surface 111 of the first conductive film 110 that is continuously supplied through a roll-to-roll process. In some embodiments, the first conductive film 110 may include a substrate 115 and an indium tin oxide conductive film 117 disposed on the surface 116 of the substrate 115, wherein the material of the substrate 115 may include polyethylene terephthalate, and the thickness H1 of the substrate 115 may be between 38 microns and 188 microns, preferably between 75 microns and 125 microns, and more preferably between 100 microns and 125 microns, so that the first conductive film 110 has both a certain bearing capacity and good flexibility, thereby facilitating integration into the roll-to-roll process. In some embodiments, the surface resistance of the indium tin oxide conductive film 117 may be between 5Ω/□ and 50Ω/□, so that the electrochromic film 1000 has appropriate electrical specifications.

在一些實施方式中,可透過蒸鍍或濺鍍的方式形成變色還原層120,使變色還原層120配置於氧化銦錫導電薄膜117背對於基材115之表面118。透過蒸鍍或濺鍍的方式形成的變色還原層120可具有良好的材料密度及材料分佈均勻性,進而不易脫落或龜裂,並在電場改變時穩定地提供離子。補充說明的是,相較於使用旋轉塗佈(spin coating)、電鍍、濕式塗佈等製程,使用蒸鍍或濺鍍的方式形成變色還原層120具有其優勢,詳細而言,使用旋轉塗佈、電鍍、濕式塗佈等製程易導致漿料附著性差,進而使變色還原層120容易脫落,造成無法變色或減低使用壽命等情形發生。在一些實施方式中,變色還原層120的材料可包括氧化鎢。在一些實施方式中,變色還原層120的厚度H2可介於50奈米至800奈米之間,較佳可介於100奈米至600奈米之間,更佳可介於100奈米至400奈米之間,使變色還原層120可在電場改變時穩定地提供離子(穩定地產生顏色變化)並具有良好的可撓性並且不至於過厚,進而利於整合至卷對卷製程中。In some embodiments, the color-changing reduction layer 120 can be formed by evaporation or sputtering, so that the color-changing reduction layer 120 is disposed on the surface 118 of the indium tin oxide conductive film 117 facing away from the substrate 115. The color-changing reduction layer 120 formed by evaporation or sputtering can have good material density and material distribution uniformity, so it is not easy to fall off or crack, and stably provides ions when the electric field changes. It is to be noted that, compared with the use of spin coating, electroplating, wet coating and other processes, the use of evaporation or sputtering to form the color-changing reduction layer 120 has its advantages. Specifically, the use of spin coating, electroplating, wet coating and other processes easily leads to poor slurry adhesion, which makes the color-changing reduction layer 120 easy to fall off, resulting in the inability to change color or reducing the service life. In some embodiments, the material of the color-changing reduction layer 120 may include tungsten oxide. In some embodiments, the thickness H2 of the color-changing reduction layer 120 may be between 50 nm and 800 nm, preferably between 100 nm and 600 nm, and more preferably between 100 nm and 400 nm, so that the color-changing reduction layer 120 can stably provide ions (stably produce color changes) when the electric field changes, has good flexibility and is not too thick, thereby facilitating integration into the roll-to-roll process.

接著,請參閱第3B圖,在步驟S20中,接收第二導電膜材130,第二導電膜材130包括第一電極區ES1及第一非電極區NS1。詳細而言,第一電極區ES1為後續用於設置電極(例如,正或負電極)的區域,而第一非電極區NS1為後續用於設置電極以外之層別的區域。在一些實施方式中,在規劃出第一電極區ES1及第一非電極區NS1之後,可在第一電極區ES1上形成遮蔽層180,以完全覆蓋第一電極區ES1。詳細而言,遮蔽層180可例如是透過網版印刷、噴塗或轉印的方式而形成的可剝膠,可剝膠的材料可包括紫外線固化型低黏度矽膠、聚氨酯樹酯或其組合,以利於後續輕易將其撕除。具體而言,請先參閱第4A圖至第4C圖,其繪示根據本揭露一些實施方式之成卷的第二導電膜材130的第一電極區ES1及第一非電極區NS1之規劃的上視示意圖。第4A圖的實施方式顯示第二導電膜材130的第一電極區ES1具有矩形的形狀。第4B圖的實施方式顯示第二導電膜材130的第一電極區ES1具有「L」型的形狀。第4C圖的實施方式顯示第二導電膜材130的第一電極區ES1具有「U」型的形狀。此外,在第4A圖至第4C圖的實施方式中,第一電極區ES1皆以遮蔽層180完全覆蓋。簡而言之,第二導電膜材130的第一電極區ES1可具有各種可能的配置方式及形狀,並不以本揭露的實施方式為限。Next, please refer to FIG. 3B , in step S20, a second conductive film material 130 is received, and the second conductive film material 130 includes a first electrode region ES1 and a first non-electrode region NS1. In detail, the first electrode region ES1 is a region for setting an electrode (e.g., a positive or negative electrode) later, and the first non-electrode region NS1 is a region for setting a layer other than the electrode later. In some embodiments, after planning the first electrode region ES1 and the first non-electrode region NS1, a shielding layer 180 may be formed on the first electrode region ES1 to completely cover the first electrode region ES1. In detail, the shielding layer 180 may be a peelable adhesive formed by screen printing, spraying or transfer, and the peelable adhesive material may include UV-curable low-viscosity silicone, polyurethane resin or a combination thereof, so as to facilitate easy removal thereof later. Specifically, please refer to Figures 4A to 4C, which show top views of the first electrode region ES1 and the first non-electrode region NS1 of the rolled second conductive film material 130 according to some embodiments of the present disclosure. The embodiment of Figure 4A shows that the first electrode region ES1 of the second conductive film material 130 has a rectangular shape. The embodiment of Figure 4B shows that the first electrode region ES1 of the second conductive film material 130 has an "L" shape. The embodiment of FIG. 4C shows that the first electrode region ES1 of the second conductive film material 130 has a "U" shape. In addition, in the embodiments of FIG. 4A to FIG. 4C, the first electrode region ES1 is completely covered by the shielding layer 180. In short, the first electrode region ES1 of the second conductive film material 130 can have various possible configurations and shapes, and is not limited to the embodiments disclosed herein.

接著,請繼續參閱第3B圖,在步驟S30中,在第二導電膜材130上形成變色氧化層140。在一些實施方式中,可透過卷對卷製程而將變色氧化層140形成於連續供應之第二導電膜材130的表面131。由於第二導電膜材130的第一電極區ES1已受到遮蔽層180覆蓋,因此變色氧化層140可形成於第二導電膜材130的第一非電極區NS1上及對應於第一電極區ES1的遮蔽層180上,也就是說,變色氧化層140直接接觸第二導電膜材130的第一非電極區NS1及遮蔽層180。在一些實施方式中,第二導電膜材130可包括基材135及配置於基材135之表面136的氧化銦錫導電薄膜137,其中基材135的材料可包括聚對苯二甲酸乙二醇酯,且基材135的厚度H3可介於38微米至188微米之間,較佳可介於75微米至125微米之間,更佳可介於100微米至125微米之間,使第二導電膜材130兼具一定的承載力以及良好的可撓性,進而利於整合至卷對卷製程中。在一些實施方式中,氧化銦錫導電薄膜137的面阻值可介於5Ω/□至50Ω/□間,使電致變色薄膜1000具有合適的電性規格。值得說明的是,選用相同的材料、厚度及規格形成第一導電膜材110及第二導電膜材130,可使電致變色薄膜1000在結構穩定性及電性穩定性方面皆具有較佳的表現。Next, please continue to refer to FIG. 3B. In step S30, a color-changing oxide layer 140 is formed on the second conductive film material 130. In some embodiments, the color-changing oxide layer 140 can be formed on the surface 131 of the continuously supplied second conductive film material 130 through a roll-to-roll process. Since the first electrode region ES1 of the second conductive film material 130 has been covered by the shielding layer 180, the color-changing oxide layer 140 can be formed on the first non-electrode region NS1 of the second conductive film material 130 and on the shielding layer 180 corresponding to the first electrode region ES1, that is, the color-changing oxide layer 140 directly contacts the first non-electrode region NS1 of the second conductive film material 130 and the shielding layer 180. In some embodiments, the second conductive film material 130 may include a substrate 135 and an indium tin oxide conductive film 137 disposed on a surface 136 of the substrate 135, wherein the material of the substrate 135 may include polyethylene terephthalate, and the thickness H3 of the substrate 135 may be between 38 microns and 188 microns, preferably between 75 microns and 125 microns, and more preferably between 100 microns and 125 microns, so that the second conductive film material 130 has a certain bearing capacity and good flexibility, and is thus easy to integrate into a roll-to-roll process. In some embodiments, the surface resistance of the indium tin oxide conductive film 137 may be between 5Ω/□ and 50Ω/□, so that the electrochromic film 1000 has suitable electrical specifications. It is worth noting that by using the same material, thickness and specification to form the first conductive film material 110 and the second conductive film material 130, the electrochromic film 1000 can have better performance in terms of structural stability and electrical stability.

在一些實施方式中,可透過蒸鍍或濺鍍的方式形成變色氧化層140,使變色氧化層140配置於氧化銦錫導電薄膜137背對於基材135之表面138。透過蒸鍍或濺鍍的方式形成的變色氧化層140可具有良好的材料密度及材料分佈均勻性,進而不易脫落或龜裂,並在電場改變時穩定地提供離子,補充說明的是,相較於使用旋轉塗佈(spin coating)、電鍍、濕式塗佈等製程,使用蒸鍍或濺鍍的方式形成變色氧化層140具有其優勢,詳細而言,使用旋轉塗佈、電鍍、濕式塗佈等製程易導致漿料附著性差,進而使變色還原層120容易脫落,造成無法變色或減低使用壽命等情形發生。在一些實施方式中,變色氧化層140的材料可包括氧化鎳。在一些實施方式中,變色氧化層140的厚度H4可介於100奈米至800奈米之間,較佳可介於200奈米至700奈米之間,更佳可介於400奈米至600奈米之間,使變色氧化層140可在電場改變時穩定地接受離子(穩定地產生顏色變化),並具有良好的可撓性且不至於過厚,進而利於整合至卷對卷製程中。在一些實施方式中,由於變色還原層120與變色氧化層140反應速度不相同,可將變色氧化層140的厚度H4調整為較變色還原層120的厚度H2大至少100奈米,以使變色氧化層140與變色還原層120搭配出較佳的電致變色性能。In some embodiments, the color-changing oxide layer 140 can be formed by evaporation or sputtering, so that the color-changing oxide layer 140 is disposed on the surface 138 of the indium tin oxide conductive film 137 facing away from the substrate 135. The color-changing oxide layer 140 formed by evaporation or sputtering can have good material density and uniform material distribution, and is not easy to fall off or crack, and can stably provide ions when the electric field changes. It should be noted that compared with using spin coating, electroplating, wet coating and other processes, using evaporation or sputtering to form the color-changing oxide layer 140 has its advantages. Specifically, using spin coating, electroplating, wet coating and other processes can easily lead to poor slurry adhesion, which can easily cause the color-changing reduction layer 120 to fall off, resulting in failure to change color or reduced service life. In some embodiments, the material of the color-changing oxide layer 140 may include nickel oxide. In some embodiments, the thickness H4 of the color-changing oxide layer 140 may be between 100 nanometers and 800 nanometers, preferably between 200 nanometers and 700 nanometers, and more preferably between 400 nanometers and 600 nanometers, so that the color-changing oxide layer 140 can stably accept ions (stably produce color changes) when the electric field changes, and has good flexibility and is not too thick, thereby facilitating integration into a roll-to-roll process. In some embodiments, since the color-changing reduction layer 120 and the color-changing oxide layer 140 have different reaction speeds, the thickness H4 of the color-changing oxide layer 140 can be adjusted to be at least 100 nanometers greater than the thickness H2 of the color-changing reduction layer 120, so that the color-changing oxide layer 140 and the color-changing reduction layer 120 can be matched to produce better electrochromic performance.

在一些實施方式中,可在形成變色氧化層140之後,去除遮蔽層180(請參閱第3C圖)。在去除遮蔽層180的同時,可一併去除配置於遮蔽層180上的變色氧化層140,使得原本位於遮蔽層180下方的第二導電膜材130裸露出來。換句話說,在去除遮蔽層180之後,可形成第二導電膜材130以及配置於第二導電膜材130之第一非電極區NS1上的變色氧化層140。在一些實施方式中,可透過撕除的方式去除遮蔽層180。由於是選用與氧化銦錫導電薄膜137親和力(黏著力、附著力)小的材料作為遮蔽層180的材料,因此可在不破壞或損傷氧化銦錫導電薄膜137的狀況下,輕易地撕除遮蔽層180。在一些實施方式中,在去除遮蔽層180後,可使用例如是75%乙醇、丙酮的溶液清潔原本位於遮蔽層180下方之第二導電膜材130的表面131。In some embodiments, the shielding layer 180 can be removed after the color-changing oxide layer 140 is formed (see FIG. 3C ). When removing the shielding layer 180, the color-changing oxide layer 140 disposed on the shielding layer 180 can be removed at the same time, so that the second conductive film material 130 originally located under the shielding layer 180 is exposed. In other words, after removing the shielding layer 180, the second conductive film material 130 and the color-changing oxide layer 140 disposed on the first non-electrode region NS1 of the second conductive film material 130 can be formed. In some embodiments, the shielding layer 180 can be removed by tearing off. Since a material with low affinity (adhesion, adhesion) with the indium tin oxide conductive film 137 is selected as the material of the shielding layer 180, the shielding layer 180 can be easily torn off without destroying or damaging the indium tin oxide conductive film 137. In some embodiments, after removing the shielding layer 180, a solution such as 75% ethanol or acetone can be used to clean the surface 131 of the second conductive film material 130 originally located under the shielding layer 180.

隨後,請同時參閱第2圖以及第3D圖,在步驟S40中,連續供應設置有變色氧化層140的第二導電膜材130,使離子傳導膠體G形成於變色氧化層140上。更詳細而言,配置有變色氧化層140的第二導電膜材130可透過第一輸送輪R1(見第2圖)的轉動而在卷對卷製程中進行輸送,使配置有變色氧化層140的第二導電膜材130可持續且不間斷地供應。於此同時,持續提供離子傳導膠體G至第一輸送輪R1,使變色氧化層140背對於第二導電膜材130的表面141可承接由噴塗機M提供的離子傳導膠體G。在一些實施方式中,離子傳導膠體G更形成於第二導電膜材130的第一電極區ES1上,亦即,離子傳導膠體G不僅接觸變色氧化層140,亦可接觸第二導電膜材130的第一電極區ES1,並在變色氧化層140與第二導電膜材130的第一電極區ES1之間形成一爬坡區域SL。然而,在另一些實施方式中,亦可透過卷對卷製程的設計使離子傳導膠體G僅形成於變色氧化層140的表面141。Subsequently, please refer to FIG. 2 and FIG. 3D simultaneously. In step S40, the second conductive film material 130 provided with the color-changing oxide layer 140 is continuously supplied so that the ion conductive colloid G is formed on the color-changing oxide layer 140. In more detail, the second conductive film material 130 provided with the color-changing oxide layer 140 can be transported in a roll-to-roll process by the rotation of the first transport wheel R1 (see FIG. 2), so that the second conductive film material 130 provided with the color-changing oxide layer 140 can be continuously and uninterruptedly supplied. At the same time, the ion conductive gel G is continuously provided to the first conveying wheel R1, so that the surface 141 of the color-changing oxide layer 140 facing away from the second conductive film material 130 can receive the ion conductive gel G provided by the sprayer M. In some embodiments, the ion conductive gel G is further formed on the first electrode region ES1 of the second conductive film material 130, that is, the ion conductive gel G not only contacts the color-changing oxide layer 140, but also contacts the first electrode region ES1 of the second conductive film material 130, and forms a climbing region SL between the color-changing oxide layer 140 and the first electrode region ES1 of the second conductive film material 130. However, in other embodiments, the ion conductive gel G can be formed only on the surface 141 of the color-changing oxide layer 140 through the design of a roll-to-roll process.

在一些實施方式中,噴塗機M的塗佈速度可介於1公尺/分鐘至20公尺/分鐘之間,也就是說,可將離子傳導膠體G以1公尺/分鐘至20公尺/分鐘的速度塗佈至連續供應的變色氧化層140的表面141,使離子傳導膠體G可以合適的量及合適的密度配置於變色氧化層140的表面141。詳細而言,若噴塗機M的塗佈速度大於20公尺/分鐘,可能導致變色氧化層140的表面141在單位面積下所承載之離子傳導膠體G含量過低,即離子傳導膠體G在變色氧化層140的表面141的分佈狀況過於稀疏,無法於後續緊密地黏合變色還原層120及變色氧化層140;而若噴塗機M的塗佈速度小於1公尺/分鐘,則可能導致變色氧化層140的表面141在單位面積下所承載之離子傳導膠體G含量過多,不僅容易造成在後續壓合期間發生溢膠的狀況,並且容易造成材料的不必要浪費。在較佳的實施方式中,噴塗機M的塗佈速度可介於2公尺/分鐘至6公尺/分鐘之間,進而達到較佳的黏合效果。In some embodiments, the coating speed of the sprayer M may be between 1 m/min and 20 m/min, that is, the ion conductive colloid G may be coated on the surface 141 of the continuously supplied color-changing oxide layer 140 at a speed of 1 m/min to 20 m/min, so that the ion conductive colloid G may be arranged on the surface 141 of the color-changing oxide layer 140 in an appropriate amount and at an appropriate density. Specifically, if the coating speed of the spraying machine M is greater than 20 m/min, the content of the ion conductive colloid G carried per unit area on the surface 141 of the color-changing oxide layer 140 may be too low, that is, the distribution of the ion conductive colloid G on the surface 141 of the color-changing oxide layer 140 is too sparse, and the color-changing oxide layer 140 cannot be closely bonded to the subsequent color-changing oxide layer. The original layer 120 and the color-changing oxide layer 140; if the coating speed of the spray coating machine M is less than 1 meter/minute, the surface 141 of the color-changing oxide layer 140 may carry too much ion conductive gel G per unit area, which not only easily causes glue overflow during the subsequent pressing period, but also easily causes unnecessary waste of materials. In a preferred embodiment, the coating speed of the spray coating machine M can be between 2 meters/minute and 6 meters/minute, thereby achieving a better bonding effect.

另一方面,將噴塗機M的塗佈速度控制在上述範圍中,還可有助於控制 離子傳導膠體G的形成於變色氧化層140的表面141的厚度H5,使離子傳導膠體G的厚度H5可被控制在介於10微米至100微米之間,如此不僅可提升膜材(例如,配置有離子傳導膠體G及變色氧化層140的第二導電膜材130)在輸送時的穩定性,還可避免在後續壓合期間發生溢膠的狀況,又可確保離子傳導膠體G在後續經固化後所形成之固態電解質層150具有良好的離子傳導性。詳細而言,若離子傳導膠體G的厚度H5小於10微米,可能導致後續壓合時形成斷點,造成所形成之固態電解質層150的分佈不連續,進而無法提供良好的離子傳導性;而若離子傳導膠體G的厚度H5大於100微米,則可能造成後續壓合困難,且離子傳導膠體G的厚度H5越厚,電子傳導效率越慢,造成變色速度變慢,且不利於形成本揭露所強調之「薄膜狀」的電致變色薄膜1000。在較佳的實施方式中,離子傳導膠體G的厚度H5可進一步被控制在介於20微米至50微米之間,進而較佳地達到上述效果。在一些實施方式中,離子傳導膠體G的形成於變色氧化層140之表面141的厚度H5即為固化後之固態電解質層150的厚度H5。On the other hand, controlling the coating speed of the spray coating machine M within the above range can also help control the thickness H5 of the ion conductive gel G formed on the surface 141 of the color-changing oxide layer 140, so that the thickness H5 of the ion conductive gel G can be controlled between 10 microns and 100 microns. This can not only improve the stability of the film material (for example, the second conductive film material 130 configured with the ion conductive gel G and the color-changing oxide layer 140) during transportation, but also avoid the overflow of the glue during the subsequent pressing period, and ensure that the solid electrolyte layer 150 formed by the ion conductive gel G after subsequent curing has good ionic conductivity. Specifically, if the thickness H5 of the ion conductive gel G is less than 10 microns, a break may be formed during subsequent pressing, resulting in a discontinuous distribution of the formed solid electrolyte layer 150, and thus failing to provide good ion conductivity; and if the thickness H5 of the ion conductive gel G is greater than 100 microns, subsequent pressing may be difficult, and the thicker the thickness H5 of the ion conductive gel G, the slower the electron conduction efficiency, resulting in a slower color change speed, and not conducive to forming the "thin film" electrochromic film 1000 emphasized in the present disclosure. In a preferred embodiment, the thickness H5 of the ion conductive gel G can be further controlled to be between 20 microns and 50 microns, thereby better achieving the above effect. In some embodiments, the thickness H5 of the ion conductive gel G formed on the surface 141 of the color-changing oxide layer 140 is the thickness H5 of the solid electrolyte layer 150 after curing.

值得說明的是,本揭露進一步使用經特殊改良的離子傳導膠體G,以將離子傳導膠體G的塗佈整合至卷對卷製程中,並且離子傳導膠體G可在最終固化為固態電解質層150,使得最終形成的電致變色薄膜1000可省去框膠的配置(此部分將於下文中進行更詳細的說明),進而使得電致變色薄膜1000可因應不同形狀、弧度的物體進行配置,大幅提升電致變色薄膜1000的應用性以及安裝便利性,使電致變色薄膜1000可應用於多種領域中。It is worth noting that the present disclosure further uses a specially improved ion conductive gel G to integrate the coating of the ion conductive gel G into the roll-to-roll process, and the ion conductive gel G can be finally cured into a solid electrolyte layer 150, so that the final electrochromic film 1000 can omit the configuration of the frame glue (this part will be described in more detail below), so that the electrochromic film 1000 can be configured according to objects of different shapes and curvatures, greatly improving the applicability and installation convenience of the electrochromic film 1000, so that the electrochromic film 1000 can be applied to a variety of fields.

詳細而言,離子傳導膠體G的製備方法可包括以下步驟。首先,將過氯酸鋰(LiClO 4)加入聚碳酸酯(Polycarbonate,PC)中攪拌8小時至12小時,以使之均勻分散混合,進而形成電解質混合物。接著,將電解質混合物加入紫外光固化膠中,並以均質機攪拌8小時至12小時使之均勻分散混合後,再加入光起始劑並攪拌0.5小時至2小時,進而形成離子傳導膠體G。在一些實施方式中,電解質混合物的含量可介於30重量份至40重量份之間,紫外光固化膠的含量可介於60重量份至70重量份之間,且以電解質混合物的總重量計,過氯酸鋰的含量可介於1wt%至15wt%之間。詳細而言,若電解質混合物的含量大於40重量份(或紫外光固化膠的含量小於60重量份),且過氯酸鋰的含量大於15wt%,可能導致離子傳導膠體G中的鋰鹽(過氯酸鋰)過多,難以均勻分散並容易聚集成塊(成團、沉澱),且可能因紫外光固化膠的含量過少而導致離子傳導膠體G中的局部區塊未能完全固化,有溢膠(或漏膠)的風險;若電解質混合物的含量小於30重量份(或紫外光固化膠的含量大於70重量份),且過氯酸鋰的含量小於1wt%,可能導致離子傳導膠體G中的鋰鹽(過氯酸鋰)過少,無法提供足夠的離子傳導性,且可能因紫外光固化膠的含量過多而來不及在動態的卷對卷製程中迅速地完全固化,同樣有溢膠(或漏膠)的風險。在較佳的實施方式中,以電解質混合物的總重量計,過氯酸鋰的含量介於4wt%至10wt%之間,以較佳地達到上述功效。 In detail, the preparation method of the ion conductive gel G may include the following steps. First, lithium perchlorate (LiClO 4 ) is added to polycarbonate (PC) and stirred for 8 to 12 hours to uniformly disperse and mix, thereby forming an electrolyte mixture. Then, the electrolyte mixture is added to the UV curable glue and stirred for 8 to 12 hours with a homogenizer to uniformly disperse and mix, and then a photoinitiator is added and stirred for 0.5 to 2 hours to form the ion conductive gel G. In some embodiments, the content of the electrolyte mixture may be between 30 parts by weight and 40 parts by weight, the content of the UV-curable adhesive may be between 60 parts by weight and 70 parts by weight, and the content of lithium perchlorate may be between 1 wt% and 15 wt% based on the total weight of the electrolyte mixture. In detail, if the content of the electrolyte mixture is greater than 40 parts by weight (or the content of the UV-curable adhesive is less than 60 parts by weight), and the content of lithium perchlorate is greater than 15 wt%, it may cause the lithium salt (lithium perchlorate) in the ion-conducting gel G to be too much, making it difficult to disperse evenly and easily aggregate into lumps (clumps, precipitation), and the content of the UV-curable adhesive may be too little, causing the local block in the ion-conducting gel G to fail to fully cure, resulting in glue overflow (or If the content of the electrolyte mixture is less than 30 parts by weight (or the content of the UV-curable adhesive is greater than 70 parts by weight), and the content of lithium perchlorate is less than 1wt%, the lithium salt (lithium perchlorate) in the ion conductive gel G may be too little to provide sufficient ion conductivity, and the UV-curable adhesive may not be able to fully cure quickly in the dynamic roll-to-roll process due to the excessive content, and there is also the risk of glue overflow (or glue leakage). In a preferred embodiment, the content of lithium perchlorate is between 4wt% and 10wt% based on the total weight of the electrolyte mixture to better achieve the above effect.

在一些實施方式中,紫外光固化膠可包括丙烯酸系樹脂(或丙烯酸系感壓樹脂)。舉例而言,丙烯酸系(感壓)樹脂可以是聚甲基丙烯酸甲酯、聚氨酯丙烯酸酯或環氧丙烯酸酯。上述丙烯酸系樹脂的紫外光固化膠在特定的紫外光波長範圍內可迅速固化,因此可有助於將固化製程整合至卷對卷製程中,並可避免因固化所提供能量過高或因固化時間過長而傷以及電致變色薄膜1000中的其他層別(例如,變色還原層120及變色氧化層140),此將於下文進行說明。如前所述,離子傳導膠體G可包括適量的光起始劑,以使離子傳導膠體G在照射紫外光後迅速地反應而固化。具體而言,本揭露可選用的光起始劑包括醯基膦氧化物系材料(型號:Irgacure®TPO、Irgacure®819),且以電解質混合物的總重量計,光起始劑的含量可介於0.5wt%至2.5wt%之間,以達到最佳的固化效果,並可避免光起始劑殘留而在已固化的固態電解質層150中進一步分解其他成分而導致其他成分降解,進而避免固態電解質層150的離子傳導性隨時間而快速耗損。詳細而言,若光起始劑的含量小於0.5wt%,可能導致離子傳導膠體G無法完全固化;而若光起始劑的含量大於2.5wt%,可能導致光起始劑因消耗不完全而殘留於固態電解質層150中。In some embodiments, the UV-curable adhesive may include an acrylic resin (or an acrylic pressure-sensitive resin). For example, the acrylic (pressure-sensitive) resin may be polymethyl methacrylate, polyurethane acrylate, or epoxy acrylate. The above-mentioned acrylic resin UV-curable adhesive can be rapidly cured within a specific UV wavelength range, thereby facilitating the integration of the curing process into a roll-to-roll process, and avoiding damage to other layers in the electrochromic film 1000 (e.g., the color-changing reduction layer 120 and the color-changing oxidation layer 140) due to excessive energy provided for curing or excessive curing time, which will be described below. As previously described, the ion-conducting gel G may include an appropriate amount of a photoinitiator so that the ion-conducting gel G reacts rapidly and cures after being irradiated with UV light. Specifically, the optional photoinitiator disclosed in the present invention includes acylphosphine oxide materials (models: Irgacure® TPO, Irgacure® 819), and the content of the photoinitiator can be between 0.5wt% and 2.5wt% based on the total weight of the electrolyte mixture to achieve the best curing effect and avoid the photoinitiator residue from further decomposing other components in the cured solid electrolyte layer 150 and causing degradation of other components, thereby avoiding the rapid loss of ionic conductivity of the solid electrolyte layer 150 over time. Specifically, if the content of the photoinitiator is less than 0.5 wt %, the ion conductive gel G may not be completely cured; and if the content of the photoinitiator is greater than 2.5 wt %, the photoinitiator may remain in the solid electrolyte layer 150 due to incomplete consumption.

另一方面,離子傳導膠體G的黏度對於固態電解質層150是否能透過卷對卷製程穩固地配置於電致變色薄膜1000中是重要的,且對於固態電解質層150中電解質是否能均勻分散以達到良好的離子傳導性亦是重要的。詳細而言,離子傳導膠體G的黏度可影響其流動性、黏滯性及其中離鹽的分散性,若離子傳導膠體G的黏度過高,可能導致離子傳導膠體G的流動性過低且黏滯性過高,易累積成團於噴塗機M的噴頭處,且不易於承載面(例如,變色氧化層140的表面141)延展開來,來不及在動態的卷對卷製程中的壓合步驟前均勻分散開來,導致最終所形成的固態電解質層150無法具有均勻的厚度,進而影響固態電解質層150的離子傳導性,另易導致離子傳導膠體G中的鋰鹽分散不均,容易聚集成團或沉積;而若離子傳導膠體G的黏度過低,則可能導致離子傳導膠體G的流動性過高且黏滯性過低,在動態的卷對卷製程中不利於穩定地配置於承載面(例如,變色氧化層140的表面141),亦不適合作為具有一定黏合性的膠體。基於上述,本揭露在卷對卷製程的加工溫度範圍內(介於15℃至70℃之間)可將離子傳導膠體G的黏度控制在介於200cps至10000cps之間的範圍中,以利於離子傳導膠體G在卷對卷製程中的整體塗佈性。在較佳的實施方式中,可進一步在介於25℃至40℃之間的加工範圍內,將離子傳導膠體G的黏度控制在介於250cps至500cps之間的範圍中,進而較佳實現上述功效,並能夠較為穩定地維持成卷之電致變色薄膜1000整體的品質。補充說明的是,離子傳導膠體G的黏度是使用BROOKFIELD(型號:DV-E)的黏度計進行量測而得。在一些實施方式中,可使用恆溫槽(圖未示)盛裝待塗佈的離子傳導膠體G,以確保離子傳導膠體G維持在塗佈期間具有合適的黏度。換句話說,可將恆溫槽的溫度控制在介於15℃至70℃之間,較佳為控制在介於25℃至40℃之間。On the other hand, the viscosity of the ion conductive gel G is important for whether the solid electrolyte layer 150 can be stably disposed in the electrochromic film 1000 through a roll-to-roll process, and is also important for whether the electrolyte in the solid electrolyte layer 150 can be uniformly dispersed to achieve good ionic conductivity. Specifically, the viscosity of the ion conductive gel G can affect its fluidity, viscosity and the dispersion of the ion salt therein. If the viscosity of the ion conductive gel G is too high, the fluidity of the ion conductive gel G may be too low and the viscosity may be too high. The ion conductive gel G may easily accumulate at the nozzle of the spray coating machine M and may not easily spread on the supporting surface (e.g., the surface 141 of the color-changing oxide layer 140). The ion conductive gel G may not be evenly dispersed before the pressing step in the dynamic roll-to-roll process, resulting in the final solid electrolyte layer 1 being too thin. 50 cannot have a uniform thickness, thereby affecting the ionic conductivity of the solid electrolyte layer 150, and easily causing the lithium salt in the ion conductive colloid G to be unevenly dispersed, easily agglomerated or deposited; and if the viscosity of the ion conductive colloid G is too low, it may cause the fluidity of the ion conductive colloid G to be too high and the viscosity to be too low, which is not conducive to stably configuring it on the supporting surface (for example, the surface 141 of the color-changing oxide layer 140) in the dynamic roll-to-roll process, and it is not suitable as a colloid with a certain degree of adhesion. Based on the above, the present disclosure can control the viscosity of the ion conductive gel G within the range of 200 cps to 10000 cps within the processing temperature range of the roll-to-roll process (between 15° C. and 70° C.), so as to facilitate the overall coating of the ion conductive gel G in the roll-to-roll process. In a preferred embodiment, the viscosity of the ion conductive gel G can be further controlled within the processing range of 25° C. to 40° C., thereby better achieving the above effects and more stably maintaining the overall quality of the rolled electrochromic film 1000. It is to be noted that the viscosity of the ion conductive gel G is measured using a Brookfield viscometer (model: DV-E). In some embodiments, a thermostatic bath (not shown) may be used to contain the ion conductive gel G to be coated to ensure that the ion conductive gel G maintains a suitable viscosity during coating. In other words, the temperature of the thermostatic bath may be controlled between 15°C and 70°C, preferably between 25°C and 40°C.

在一些實施方式中,在步驟S40中,亦可選擇將離子傳導膠體G形成於連續供應之變色還原層120背對於第一導電膜材110的表面121(請參見第3A圖)。換句話說,離子傳導膠體G可依照實際製程條件選擇性地形成於連續供應之變色還原層120的表面121,或者形成於連續供應之變色氧化層140的表面141。In some embodiments, in step S40, the ion conductive colloid G can also be selectively formed on the surface 121 of the continuously supplied color-changing reduction layer 120 opposite to the first conductive film material 110 (see FIG. 3A ). In other words, the ion conductive colloid G can be selectively formed on the surface 121 of the continuously supplied color-changing reduction layer 120 or on the surface 141 of the continuously supplied color-changing oxidation layer 140 according to actual process conditions.

接著,請同時參閱第2圖以及第3E圖。在步驟S50中,將設置有變色還原層120的第一導電膜材110壓合至連續供應且已配置於變色氧化層140之表面141的離子傳導膠體G上,使變色還原層120位於第一導電膜材110與離子傳導膠體G之間。詳細而言,設置有變色還原層120的第一導電膜材110可透過第二輸送輪R2的轉動在卷對卷製程中進行輸送,以將設置有變色還原層120的第一導電膜材110輸送至第一壓合輪P1與第二壓合輪P2之間,且於此同時,設置有離子傳導膠體G以及變色氧化層140的第二導電膜材130可透過第一輸送輪R1的轉動而輸送至第一壓合輪P1與第二壓合輪P2之間,其中第一壓合輪P1與第二壓合輪P2配置以將設置有變色還原層120的第一導電膜材110壓合至連續供應的離子傳導膠體G上,且第一壓合輪P1與第二壓合輪P2具有相反的轉動方向(例如,第一壓合輪P1為順時針方向轉動,而第二壓合輪P2為逆時針方向轉動)。Next, please refer to FIG. 2 and FIG. 3E at the same time. In step S50, the first conductive film material 110 provided with the color-changing reduction layer 120 is pressed onto the ion-conducting colloid G which is continuously supplied and arranged on the surface 141 of the color-changing oxide layer 140, so that the color-changing reduction layer 120 is located between the first conductive film material 110 and the ion-conducting colloid G. Specifically, the first conductive film material 110 provided with the color-changing reduction layer 120 can be transported in the roll-to-roll process by the rotation of the second conveying wheel R2, so that the first conductive film material 110 provided with the color-changing reduction layer 120 is transported between the first pressing wheel P1 and the second pressing wheel P2, and at the same time, the second conductive film material 130 provided with the ion conductive gel G and the color-changing oxide layer 140 can be transported by the rotation of the first conveying wheel R1. The first pressing wheel P1 and the second pressing wheel P2 are configured to press the first conductive film material 110 provided with the color-changing reduction layer 120 onto the continuously supplied ion-conductive gel G, and the first pressing wheel P1 and the second pressing wheel P2 have opposite rotation directions (for example, the first pressing wheel P1 rotates clockwise, and the second pressing wheel P2 rotates counterclockwise).

在一些實施方式中,第一壓合輪P1與第二壓合輪P2之間的間距d可介於100微米至500微米之間,亦即間距d可為本揭露所預計得到之電致變色薄膜1000(或膜狀疊層100)的整體厚度的85%至105%,進而提供良好的壓合強度。詳細而言,若第一壓合輪P1與第二壓合輪P2之間的間距d小於100微米(亦即,小於電致變色薄膜1000或膜狀疊層100的整體厚度的85%),可能導致滲膠,進而恐影響離子傳導膠體G的配置狀態;而若第一壓合輪P1與第二壓合輪P2之間的間距d大於500微米(亦即,大於電致變色薄膜1000或膜狀疊層100的整體厚度的105%),可能導致各層無法緊密地黏合,進而影響電致變色薄膜1000的結構穩定性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2的轉速比可介於1.5:1.0至1.0:1.5之間(例如,1:1),進而控制各層的張力使最終所形成的電致變色薄膜1000具有良好的平整性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2各自的輪溫度可介於15℃至70℃之間,且較佳可介於25℃至40℃之間,以確保離子傳導膠體G在輸送過程中仍具有良好的流平性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2可分別受不同且獨立運作的馬達來驅動。In some embodiments, the distance d between the first pressing wheel P1 and the second pressing wheel P2 may be between 100 μm and 500 μm, that is, the distance d may be 85% to 105% of the overall thickness of the electrochromic film 1000 (or film-like laminate 100) expected to be obtained in the present disclosure, thereby providing good pressing strength. Specifically, if the distance d between the first pressing wheel P1 and the second pressing wheel P2 is less than 100 microns (i.e., less than 85% of the overall thickness of the electrochromic film 1000 or the film-like laminate 100), it may cause seepage, thereby affecting the configuration state of the ion-conducting gel G; and if the distance d between the first pressing wheel P1 and the second pressing wheel P2 is greater than 500 microns (i.e., greater than 105% of the overall thickness of the electrochromic film 1000 or the film-like laminate 100), it may cause the layers to fail to be tightly bonded, thereby affecting the structural stability of the electrochromic film 1000. In some embodiments, the speed ratio of the first pressing wheel P1 and the second pressing wheel P2 may be between 1.5:1.0 and 1.0:1.5 (e.g., 1:1), thereby controlling the tension of each layer so that the electrochromic film 1000 formed finally has good flatness. In some embodiments, the wheel temperature of the first pressing wheel P1 and the second pressing wheel P2 may be between 15°C and 70°C, and preferably between 25°C and 40°C, to ensure that the ion conductive gel G still has good leveling during the conveying process. In some embodiments, the first pressing wheel P1 and the second pressing wheel P2 may be driven by different and independently operated motors.

在一些實施方式中,由於離子傳導膠體G在變色氧化層140與第二導電膜材130的第一電極區ES1之間具有一爬坡區域SL,因此變色還原層120與位於第二導電膜材130之第一電極區ES1上的離子傳導膠體G之間可具有一縫隙Q(可參見第3E圖以便於理解),且縫隙Q可作為溢膠的緩衝區域,也就是說,過多的離子傳導膠體G可流動至該縫隙Q中,進而有利於提升卷對卷製程的便利性。In some embodiments, since the ion conductive gel G has a climbing region SL between the color-changing oxide layer 140 and the first electrode region ES1 of the second conductive film material 130, there may be a gap Q between the color-changing reduction layer 120 and the ion conductive gel G located on the first electrode region ES1 of the second conductive film material 130 (see FIG. 3E for easy understanding), and the gap Q may serve as a buffer area for overflowing gel, that is, excess ion conductive gel G may flow into the gap Q, thereby facilitating the convenience of the roll-to-roll process.

隨後,在步驟S60中,將離子傳導膠體G固化以形成固態電解質層150。詳細而言,在各層(第一導電膜材110、變色還原層120、離子傳導膠體G、變色氧化層140及第二導電膜材130)受到第一壓合輪P1與第二壓合輪P2的壓合後,各層可經過一紫外光源U,使各層在卷對卷製程的輸送期間受到紫外光照射。換句話說,可使用紫外光照射夾置於變色還原層120及變色氧化層140之間的離子傳導膠體G,使離子傳導膠體G固化而形成固態電解質層150,並將變色還原層120及變色氧化層140緊密且穩固地黏合。如前所述,本揭露選用可在特定的紫外光波長範圍內迅速固化的丙烯酸系樹脂作為紫外光固化膠,且該特定的紫外光波長範圍可避免傷及電致變色薄膜1000中的其他層別。具體而言,紫外光的波長可介於365奈米至395奈米之間。由於此波長範圍窄,因此可提供較為集中的能量,使離子傳導膠體G在卷對卷製程中即便需快速地通過紫外光源U(例如,以1公尺/分鐘至20公尺/分鐘的輸送速度通過紫外光源U),仍能夠徹底地被固化。在一些實施方式中,紫外光照射範圍的長度(與輸送方向平行的長度)可介於1公尺至3公尺之間,而寬度(與輸送方向垂直的寬度,幅寬)可介於300毫米至1600毫米之間,以確保所有的離子傳導膠體G皆確實受到紫外光的照射而固化而形成固態電解質層150。Then, in step S60, the ion conductive gel G is cured to form a solid electrolyte layer 150. Specifically, after each layer (the first conductive film material 110, the color-changing reduction layer 120, the ion conductive gel G, the color-changing oxide layer 140, and the second conductive film material 130) is pressed by the first pressing wheel P1 and the second pressing wheel P2, each layer can pass through an ultraviolet light source U so that each layer is irradiated with ultraviolet light during the transport of the roll-to-roll process. In other words, ultraviolet light can be used to irradiate the ion conductive gel G sandwiched between the color-changing reduction layer 120 and the color-changing oxidation layer 140, so that the ion conductive gel G is cured to form a solid electrolyte layer 150, and the color-changing reduction layer 120 and the color-changing oxidation layer 140 are tightly and firmly bonded. As mentioned above, the present disclosure uses an acrylic resin that can be quickly cured within a specific ultraviolet light wavelength range as the ultraviolet light curing glue, and the specific ultraviolet light wavelength range can avoid damaging other layers in the electrochromic film 1000. Specifically, the wavelength of the ultraviolet light can be between 365 nanometers and 395 nanometers. Since this wavelength range is narrow, it can provide relatively concentrated energy, so that the ion conductive gel G can be thoroughly cured even if it needs to pass through the ultraviolet light source U quickly (for example, passing through the ultraviolet light source U at a conveying speed of 1 meter/minute to 20 meters/minute) during the roll-to-roll process. In some embodiments, the length of the ultraviolet light irradiation range (the length parallel to the conveying direction) can be between 1 meter and 3 meters, and the width (the width perpendicular to the conveying direction, the width) can be between 300 mm and 1600 mm, so as to ensure that all the ion conductive gel G is indeed irradiated by the ultraviolet light and cured to form a solid electrolyte layer 150.

在至少進行上述步驟S10至S60後,可收卷以形成膜狀疊層100。在一些實施方式中,可進一步對成卷的膜狀疊層100進行裁切步驟,以根據實際應用需求形成預期尺寸及形狀的電致變色薄膜1000。經裁切後的膜狀疊層100包括第一導電膜材110、變色還原層120、固態電解質層150、變色氧化層140以及第二導電膜材130。變色氧化層140配置於第二導電膜材130上,固態電解質層150配置於變色氧化層140上,變色還原層120配置於固態電解質層150上,且第一導電膜材110配置於變色還原層120上。在一些實施方式中,當溢膠狀況不明顯時,變色還原層120與位於第二導電膜材130之第一電極區ES1上的離子傳導膠體G之間仍存在縫隙Q。在膜狀疊層100中,變色還原層120被設定為在電致變色薄膜1000經歷電場改變時與變色氧化層140產生氧化還原反應,變色還原層120中的離子移動至變色氧化層140時變色還原層120產生顏色變化,而變色氧化層140則因接受變色還原層120中的離子而進行氧化反應,並且同樣產生顏色變化。舉例而言,變色氧化層140中含有氧化鎢,而電致變色薄膜1000的電場未被改變時,變色氧化層140呈現透明,當電致變色薄膜1000的電場被改變時,變色氧化層140轉為藍色,使得電致變色薄膜1000的透光性有所變化。After at least performing the above steps S10 to S60, the film-like laminate 100 may be rolled up to form a film-like laminate 100. In some embodiments, the rolled film-like laminate 100 may be further cut to form an electrochromic film 1000 of a desired size and shape according to actual application requirements. The cut film-like laminate 100 includes a first conductive film material 110, a color-changing reduction layer 120, a solid electrolyte layer 150, a color-changing oxide layer 140, and a second conductive film material 130. The color-changing oxide layer 140 is disposed on the second conductive film material 130, the solid electrolyte layer 150 is disposed on the color-changing oxide layer 140, the color-changing reduction layer 120 is disposed on the solid electrolyte layer 150, and the first conductive film material 110 is disposed on the color-changing reduction layer 120. In some embodiments, when the overflow of the glue is not obvious, there is still a gap Q between the color-changing reduction layer 120 and the ion-conductive gel G located on the first electrode region ES1 of the second conductive film material 130. In the film-like stack 100, the color-changing reduction layer 120 is configured to produce an oxidation-reduction reaction with the color-changing oxide layer 140 when the electrochromic film 1000 undergoes an electric field change. When ions in the color-changing reduction layer 120 move to the color-changing oxide layer 140, the color-changing reduction layer 120 changes color, and the color-changing oxide layer 140 undergoes an oxidation reaction due to accepting the ions in the color-changing reduction layer 120, and also produces a color change. For example, the color-changing oxide layer 140 contains tungsten oxide, and when the electric field of the electrochromic film 1000 is not changed, the color-changing oxide layer 140 is transparent. When the electric field of the electrochromic film 1000 is changed, the color-changing oxide layer 140 turns blue, so that the light transmittance of the electrochromic film 1000 changes.

值得說明的是,本揭露的膜狀疊層100以及後續所形成的電致變色薄膜1000皆不需額外在其外側壁設置框膠(框架)來防止固態電解質層150中的離子傳導物質流出,且經由上述卷對卷製程的設計,變色還原層120及變色氧化層140可彼此緊密黏合,因此不需額外在膜狀疊層100及後續形成的電致變色薄膜1000的外側壁設置框膠(框架)來防止變色還原層120及變色氧化層140剝離。換句話說,本揭露最終形成的電致變色薄膜1000不具有設置於第一導電膜材110、變色還原層120、固態電解質層150、變色氧化層140以及第二導電膜材130各自之至少一側並接觸至少該側的框膠,因此電致變色薄膜1000的外側壁是裸露於外界環境中。更詳細而言,傳統電致變色元件所使用之框膠的材料通常可包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合(例如液晶滴入式封裝製程(One Drop Filling,ODF)製程用框膠材料、Seal 框膠(製造商:積水化學、三井化學、協立協立及日本化藥)等,而本揭露的電致變色薄膜1000不具有包括上述材料的框膠。It is worth noting that the film-like stack 100 disclosed herein and the electrochromic film 1000 formed subsequently do not need to be additionally provided with a frame glue (frame) on the outer side wall thereof to prevent the ion-conducting material in the solid electrolyte layer 150 from flowing out, and through the design of the above-mentioned roll-to-roll process, the color-changing reduction layer 120 and the color-changing oxidation layer 140 can be tightly bonded to each other, so there is no need to additionally provide a frame glue (frame) on the outer side wall of the film-like stack 100 and the electrochromic film 1000 formed subsequently to prevent the color-changing reduction layer 120 and the color-changing oxidation layer 140 from peeling off. In other words, the electrochromic film 1000 finally formed by the present disclosure does not have a frame glue disposed on at least one side of the first conductive film material 110, the color-changing reduction layer 120, the solid electrolyte layer 150, the color-changing oxide layer 140 and the second conductive film material 130 and in contact with at least that side, so the outer side wall of the electrochromic film 1000 is exposed to the external environment. In more detail, the frame material used in traditional electrochromic elements may generally include acrylic resin, epoxy resin or a combination thereof (e.g., frame material used in One Drop Filling (ODF) process, Seal frame (manufacturer: Sekisui Chemical, Mitsui Chemicals, Kyoritsu Kyoritsu and Nippon Kayaku), etc., while the electrochromic film 1000 disclosed herein does not have a frame including the above materials.

在一些實施方式中,膜狀疊層100還可進一步包括硬化層160。硬化層160可保護其於層別免於受到刮傷或磨損,延長電致變色薄膜1000的使用壽命。在一些實施方式中,硬化層160的材料包括樹脂混合物,以確保膜狀疊層100具有可撓性及輕薄性。在一些實施方式中,硬化層160的疊設亦可整合製卷對卷製程中,進而利於提升製程便利性及產能。In some embodiments, the film-like laminate 100 may further include a hardening layer 160. The hardening layer 160 can protect the layers from being scratched or worn, thereby extending the service life of the electrochromic film 1000. In some embodiments, the material of the hardening layer 160 includes a resin mixture to ensure that the film-like laminate 100 is flexible and thin. In some embodiments, the stacking of the hardening layer 160 can also be integrated into the roll-to-roll process, thereby facilitating the improvement of process convenience and productivity.

隨後,請參閱第3F圖,進行切割步驟。應先瞭解到,第3F圖的結構為將第3E圖的結構倒置並且進行切割後的態樣。切割步驟包括將膜狀疊層100之第二側S2的硬化層160、第一導電膜材110、變色還原層120以及固態電解質層150切除,使第二側S2之第二導電膜材130的第一電極區ES1裸露出來。詳細而言,切割步驟對應於第一電極區ES1的範圍來進行。在一些實施方式中,切割步驟可透過使用CO 2雷射機、沖壓成型機、調光膜電極刀等的切割器材(手段)來進行。在一些實施方式中,可在將膜狀疊層100裁切為合適尺寸前(進行裁切步驟前),對膜狀疊層100進行切割步驟,例如將切割步驟整合至卷對卷製程中,並透過輸送輪的轉動而在卷對卷製程中輸送膜狀疊層100,使膜狀疊層100不間斷地供應至切割器處以進行切割,以提升切割步驟進行的速率。在切除對應於第一電極區ES1的第一導電膜材110、變色還原層120、固態電解質層150以及接觸第一導電膜材110的硬化層160後,第二導電膜材130的第一電極區ES1可裸露出來。在一些實施方式中,切割步驟無法完整切除對應於第一電極區ES1的固態電解質層150,例如切割步驟可能僅減薄固態電解質層150的厚度H5,或切除對應於第一電極區ES1之部分的固態電解質層150,而僅使部分之第二導電膜材130的第一電極區ES1裸露出來,在此狀況下,可使用丙酮或75%的乙醇將固態電解質層150徹底去除,使得第二導電膜材130的第一電極區ES1完全裸露地出來。換句話說,在本揭露中,由離子傳導膠體G所形成的固態電解質層150可由丙酮或75%的乙醇簡單去除,提升清除步驟的簡便性。 Then, please refer to FIG. 3F to perform the cutting step. It should be understood that the structure of FIG. 3F is the structure of FIG. 3E that is inverted and cut. The cutting step includes removing the hardening layer 160, the first conductive film material 110, the color-changing reduction layer 120, and the solid electrolyte layer 150 of the second side S2 of the film-like stack 100, so that the first electrode region ES1 of the second conductive film material 130 of the second side S2 is exposed. In detail, the cutting step is performed corresponding to the range of the first electrode region ES1. In some embodiments, the cutting step can be performed by using cutting equipment (means) such as a CO2 laser machine, a stamping molding machine, a dimming film electrode knife, etc. In some embodiments, the film-like stack 100 may be cut into a suitable size before being cut (before the cutting step), for example, the cutting step may be integrated into the roll-to-roll process, and the film-like stack 100 may be transported in the roll-to-roll process by the rotation of the transport wheel, so that the film-like stack 100 is continuously supplied to the cutter for cutting, thereby increasing the speed of the cutting step. After the first conductive film material 110, the color-changing reduction layer 120, the solid electrolyte layer 150, and the hardening layer 160 contacting the first conductive film material 110 corresponding to the first electrode region ES1 are removed, the first electrode region ES1 of the second conductive film material 130 may be exposed. In some embodiments, the cutting step cannot completely remove the solid electrolyte layer 150 corresponding to the first electrode region ES1. For example, the cutting step may only reduce the thickness H5 of the solid electrolyte layer 150, or remove the portion of the solid electrolyte layer 150 corresponding to the first electrode region ES1, and only expose a portion of the first electrode region ES1 of the second conductive film material 130. In this case, acetone or 75% ethanol can be used to completely remove the solid electrolyte layer 150, so that the first electrode region ES1 of the second conductive film material 130 is completely exposed. In other words, in the present disclosure, the solid electrolyte layer 150 formed by the ion conductive gel G can be simply removed by acetone or 75% ethanol, thereby improving the simplicity of the cleaning step.

值得說明的是,由於在前述步驟S20中,已使用遮蔽層180來防止變色氧化層140形成於第二導電膜材130的第一電極區ES1上,因此在切割步驟中,不須額外清除變色氧化層140,不僅大幅提升製程的便利性,還可降低變色氧化層140殘留於第一電極區ES1,進而降低電性失效的可能性。It is worth mentioning that, since in the aforementioned step S20, the shielding layer 180 has been used to prevent the color-changing oxide layer 140 from being formed on the first electrode region ES1 of the second conductive film material 130, there is no need to additionally remove the color-changing oxide layer 140 in the cutting step, which not only greatly improves the convenience of the process, but also reduces the color-changing oxide layer 140 remaining in the first electrode region ES1, thereby reducing the possibility of electrical failure.

請繼續參閱第3F圖,切割步驟進一步包括將膜狀疊層100之第一側S1的第二導電膜材130、變色氧化層140、固態電解質層150及接觸第二導電膜材130的硬化層160切除,進而使第一側S1的變色還原層120裸露出來。詳細而言,可在進行切割步驟前,先預留出電極欲設置的區域(電極區域A),並透過切割步驟將位於電極區域A中的硬化層160、第二導電膜材130、變色氧化層140及固態電解質層150切除。具體切除方式如前段所述,於此便不再贅述。在切除位於第一側S1之電極區域A的硬化層160、第二導電膜材130、變色氧化層140及固態電解質層150後,位於電極區域A的變色還原層120可裸露出來。同樣地,若切割步驟無法完整切除位於電極區域A的固態電解質層150,可使用丙酮或75%的乙醇將固態電解質層150徹底去除,使位於電極區域A的變色還原層120完全裸露出來。Please continue to refer to FIG. 3F. The cutting step further includes removing the second conductive film material 130, the color-changing oxide layer 140, the solid electrolyte layer 150 and the hardening layer 160 contacting the second conductive film material 130 on the first side S1 of the film-like stack 100, thereby exposing the color-changing reduction layer 120 on the first side S1. In detail, before the cutting step, the area where the electrode is to be set (electrode area A) can be reserved first, and the hardening layer 160, the second conductive film material 130, the color-changing oxide layer 140 and the solid electrolyte layer 150 located in the electrode area A are removed through the cutting step. The specific removal method is as described in the previous paragraph, and will not be repeated here. After the hardening layer 160, the second conductive film material 130, the color-changing oxide layer 140 and the solid electrolyte layer 150 in the electrode region A located at the first side S1 are removed, the color-changing reduction layer 120 located in the electrode region A can be exposed. Similarly, if the cutting step cannot completely remove the solid electrolyte layer 150 located in the electrode region A, acetone or 75% ethanol can be used to completely remove the solid electrolyte layer 150 so that the color-changing reduction layer 120 located in the electrode region A is completely exposed.

接著,請參閱第3G圖,進行清除步驟,包括使用一溶液將裸露出的變色還原層120清除。詳細而言,當變色還原層120的材料包括氧化鎢時,所使用的溶液可包括氫氧化鈉、過氧化氫及水。更詳細而言,氫氧化鈉可與氧化鎢反應,使氧化鎢由第一導電膜材110的氧化銦錫導電薄膜117的表面118脫落,而過氧化氫可維持穩定的蝕刻(清除)速率,並且水可適當地調整氧化鈉及過氧化氫的濃度,並有助於將反應完畢的殘留物帶離。在一些實施方式中,在該溶液中,氫氧化鈉的含量介於15重量份至40重量份之間(較佳可介於25重量份至35重量份之間),且過氧化氫的含量介於2重量份至10重量份之間(較佳可介於4重量份至8重量份之間),以達到優異的清除效果。詳細而言,若氫氧化鈉的含量(比例)過高,而過氧化氫的含量(比例)過低,可能導致氫氧化鈉殘留於氧化銦錫導電薄膜117的表面118,而導致清除的時間增加,並可能在反應期間因過氧化氫消耗完畢而使蝕刻速率降低;若氫氧化鈉的含量過低,而過氧化氫的含量過高,可能導致氧化鎢反應不完全而無法被徹底清除,並可能因氫氧化鈉在反應期間不斷消耗而造成過氧化氫過剩,進而導致溶液的酸鹼值(pH值)受到影響(下降),影響清除效果。換句話說,藉由氫氧化鈉、過氧化氫以及水的協同作用,變色還原層120的材料可在短時間內被徹底地去除,使位於被去除之變色還原層120下方的第一導電膜材110裸露出來。Next, please refer to FIG. 3G, and a cleaning step is performed, including using a solution to clean the exposed color-changing reduction layer 120. In detail, when the material of the color-changing reduction layer 120 includes tungsten oxide, the solution used may include sodium hydroxide, hydrogen peroxide and water. In more detail, sodium hydroxide can react with tungsten oxide to cause tungsten oxide to fall off the surface 118 of the indium tin oxide conductive film 117 of the first conductive film material 110, while hydrogen peroxide can maintain a stable etching (cleaning) rate, and water can appropriately adjust the concentration of sodium oxide and hydrogen peroxide, and help to take away the residues after the reaction is completed. In some embodiments, in the solution, the content of sodium hydroxide is between 15 parts by weight and 40 parts by weight (preferably between 25 parts by weight and 35 parts by weight), and the content of hydrogen peroxide is between 2 parts by weight and 10 parts by weight (preferably between 4 parts by weight and 8 parts by weight) to achieve excellent cleaning effect. In detail, if the content (ratio) of sodium hydroxide is too high and the content (ratio) of hydrogen peroxide is too low, sodium hydroxide may remain on the surface 118 of the indium tin oxide conductive film 117, resulting in an increase in the cleaning time, and the etching rate may be reduced due to the complete consumption of hydrogen peroxide during the reaction period; if the content of sodium hydroxide is too low and the content of hydrogen peroxide is too high, the tungsten oxide may not react completely and cannot be completely removed, and the sodium hydroxide may be continuously consumed during the reaction period, resulting in excess hydrogen peroxide, which in turn causes the acid-base value (pH value) of the solution to be affected (decreased), affecting the cleaning effect. In other words, through the synergistic effect of sodium hydroxide, hydrogen peroxide and water, the material of the color-changing reduction layer 120 can be completely removed in a short time, so that the first conductive film material 110 located under the removed color-changing reduction layer 120 is exposed.

在一些實施方式中,在使用該溶液進行清除之前或期間,可將該溶液的pH值調整(維持)至介於8.0至10.0之間,以在蝕刻期間使氫氧化鈉、過氧化氫及水彼此穩定地協同以維持該溶液的反應性以及反應速率。在一些實施方式中,可在使用該溶液進行清除步驟後,使用75%的乙醇清潔第一導電膜材110的表面111,以確保所有的殘留物皆徹底脫離第一導電膜材110的表面111。在一些實施方式中,可使用擦拭的方式進行清除步驟,例如使用該溶液在位於電極區域A中之變色還原層120的表面121來回擦拭多次(例如,5~20次),以達到優異的清除效果。由此可見,本揭露所使用的溶液可快速且簡單地清除變色還原層120。本揭露可透過使用四點探針來確認第一導電膜材110的阻值低於500Ω,以確認位於電極區域A中的變色還原層120被徹底地清除。In some embodiments, before or during the use of the solution for cleaning, the pH value of the solution may be adjusted (maintained) to between 8.0 and 10.0, so that sodium hydroxide, hydrogen peroxide, and water can stably cooperate with each other during etching to maintain the reactivity and reaction rate of the solution. In some embodiments, after the use of the solution for cleaning, the surface 111 of the first conductive film 110 may be cleaned with 75% ethanol to ensure that all residues are completely removed from the surface 111 of the first conductive film 110. In some embodiments, the cleaning step may be performed by wiping, for example, using the solution to wipe back and forth multiple times (e.g., 5 to 20 times) on the surface 121 of the color-changing reduction layer 120 located in the electrode region A to achieve an excellent cleaning effect. It can be seen that the solution used in the present disclosure can quickly and easily remove the color-changing reduction layer 120. The present disclosure can confirm that the resistance of the first conductive film 110 is less than 500Ω by using a four-point probe to confirm that the color-changing reduction layer 120 located in the electrode region A is completely removed.

值得說明的是,在本揭露中,亦可在形成變色還原層120於第一導電膜材110上前,先在第一導電膜材110上規劃第二電極區及第二非電極區。同理,第二電極區為後續用於設置電極(例如,正電極或負電極)的區域,而第一非電極區則為後續用於設置電極以外之層別的區域。在一些實施方式中,在規劃出第二電極區及第二非電極區之後,可在第二電極區上形成遮蔽層,以完全覆蓋第二電極區。詳細而言,遮蔽層可例如是透過網版印刷、噴塗或轉印的方式而形成的可剝膠,可剝膠的材料可包括紫外線固化型低黏度矽膠、聚氨酯樹酯或其組合,以利於後續輕易將其撕除。具體而言,第二電極區ES2及第二非電極區NS2的配置可參考第4A圖至第4C圖所示之第一電極區ES1及第一非電極區NS1的配置方式,於此不再贅述,然不以此為限。在此實施方式中,由於第一導電膜材110的第二電極區ES2受到遮蔽層覆蓋,因此變色還原層120可形成於第一導電膜材110的第二非電極區NS2上及遮蔽層上。另一方面,在形成變色還原層120之後,可去除遮蔽層,且在一些實施方式中,可一併去除配置於遮蔽層上的變色還原層120,使得原本位於遮蔽層下方的第一導電膜材110可裸露出來。其餘細節皆同前述步驟S20及S30,於此便不再贅述。It is worth noting that in the present disclosure, before forming the color-changing reduction layer 120 on the first conductive film 110, the second electrode region and the second non-electrode region may be planned on the first conductive film 110. Similarly, the second electrode region is a region for subsequently setting an electrode (e.g., a positive electrode or a negative electrode), and the first non-electrode region is a region for subsequently setting a layer other than the electrode. In some embodiments, after planning the second electrode region and the second non-electrode region, a shielding layer may be formed on the second electrode region to completely cover the second electrode region. In detail, the shielding layer may be a peelable adhesive formed by screen printing, spraying or transfer, and the peelable adhesive material may include UV-curable low-viscosity silicone, polyurethane resin or a combination thereof, so as to facilitate easy removal thereof later. Specifically, the configuration of the second electrode region ES2 and the second non-electrode region NS2 may refer to the configuration of the first electrode region ES1 and the first non-electrode region NS1 shown in Figures 4A to 4C, which will not be described in detail here, but is not limited to this. In this embodiment, since the second electrode region ES2 of the first conductive film material 110 is covered by the shielding layer, the color-changing reduction layer 120 can be formed on the second non-electrode region NS2 of the first conductive film material 110 and on the shielding layer. On the other hand, after the color-changing reduction layer 120 is formed, the shielding layer can be removed, and in some embodiments, the color-changing reduction layer 120 disposed on the shielding layer can be removed together, so that the first conductive film material 110 originally located under the shielding layer can be exposed. The remaining details are the same as the aforementioned steps S20 and S30, and will not be repeated here.

若已預先在第一導電膜材110上規劃第二電極區ES2及第二非電極區NS2,並使變色還原層120免於形成於第一導電膜材110的第二電極區ES2上,則在切割步驟中,對於膜狀疊層100的第一側S1而言,可省去切除變色還原層120,也就是說,在切除第一側S1的硬化層160、第二導電膜材130及固態電解質層150後,第一導電膜材110的第二電極區ES2可裸露出來。藉此,不須額外清除變色還原層120,不僅大幅提升製程的便利性,還可降低變色還原層120殘留於第二電極區ES2,進而降低電性失效的可能性。此外,離子傳導膠體G在變色還原層120與第一導電膜材110的第二電極區ES2之間亦可形成爬坡區域(如第3D圖所示的爬坡區域SL),因此變色氧化層140與位於第一導電膜材110之第二電極區ES2上的離子傳導膠體G之間亦可具有一縫隙(如第3E圖所示的縫隙Q)作為溢膠的緩衝區域。更多細節可參考前文中有關於第一電極區ES1及第一非電極區NS1的說明,於此便不再贅述。If the second electrode region ES2 and the second non-electrode region NS2 are planned in advance on the first conductive film material 110, and the color-changing reduction layer 120 is prevented from being formed on the second electrode region ES2 of the first conductive film material 110, then in the cutting step, for the first side S1 of the film-like stack 100, the color-changing reduction layer 120 can be omitted from being removed, that is, after the hardening layer 160, the second conductive film material 130 and the solid electrolyte layer 150 of the first side S1 are removed, the second electrode region ES2 of the first conductive film material 110 can be exposed. In this way, there is no need to additionally remove the color-changing reduction layer 120, which not only greatly improves the convenience of the process, but also reduces the color-changing reduction layer 120 remaining in the second electrode region ES2, thereby reducing the possibility of electrical failure. In addition, the ion conductive gel G can also form a climbing region (such as the climbing region SL shown in FIG. 3D ) between the color-changing reduction layer 120 and the second electrode region ES2 of the first conductive film material 110, so there can also be a gap (such as the gap Q shown in FIG. 3E ) between the color-changing oxide layer 140 and the ion conductive gel G located on the second electrode region ES2 of the first conductive film material 110 as a buffer region for overflowing gel. For more details, please refer to the description of the first electrode region ES1 and the first non-electrode region NS1 in the previous text, which will not be repeated here.

補充說明的是,在較佳的實施方式中,可選擇預先在第二導電膜材130上規劃第一電極區ES1,而不預先在第一導電膜材110上規劃第二電極區ES2;或者選擇預先在第一導電膜材110上規劃第二電極區ES2,而不預先在第二導電膜材130上規劃第一電極區ES1。藉此,可省略第一電極區ES1與第二電極區ES2之間的預對位,進一步提升製程便利性。在更佳的實施方式中,可選擇預先在第二導電膜材130上規劃第一電極區ES1,而不預先在第一導電膜材110上規劃第二電極區ES2,如此一來,不僅可提升製程便利性,還可省略相對於變色還原層120而言較難去除之變色氧化層140的清除步驟,進而避免因清除不淨而導致的電性問題。It is to be noted that in a preferred embodiment, the first electrode region ES1 may be pre-planned on the second conductive film material 130, but the second electrode region ES2 may not be pre-planned on the first conductive film material 110; or the second electrode region ES2 may be pre-planned on the first conductive film material 110, but the first electrode region ES1 may not be pre-planned on the second conductive film material 130. In this way, the pre-alignment between the first electrode region ES1 and the second electrode region ES2 may be omitted, further improving the process convenience. In a more preferred implementation, the first electrode region ES1 may be pre-planned on the second conductive film material 130, rather than the second electrode region ES2 on the first conductive film material 110. This not only improves process convenience, but also omits the step of cleaning the discoloration oxide layer 140, which is more difficult to remove than the discoloration reduction layer 120, thereby avoiding electrical problems caused by incomplete cleaning.

隨後,請參閱第3H圖,進行塗佈步驟,其可包括在裸露出的第一導電膜材110的表面111(第二電極區ES2)形成第一電極E1,並且在裸露出的第二導電膜材130的表面131(第一電極區ES1)形成第二電極E2。具體而言,第一電極E1及第二電極E2可分別為電致變色薄膜1000的正電極及負電極,且第一電極E1及第二電極E2的可例如是導電銀膠、軟性電路板(Flexible Printed Circuit,FPC)或導電銅箔。經塗佈所形成的第一電極E1可相鄰於變色還原層120,且與變色還原層120之間具有間隙SP;經塗佈所形成的第二電極E2可相鄰於變色氧化層140,且與變色氧化層140之間具有間隙SP。在一些實施方式中,可經多次塗佈而使第一電極E1的厚度H6增加,使第一電極E1進一步相鄰於固態電解質層150及變色氧化層140各自的側壁,並可經多次塗佈而使第二電極E2的厚度H7增加,使第二電極E2進一步相鄰於固態電解質層150及變色還原層120各自的側壁。如此可確保第一電極E1及第二電極E2具有高的材料緻密性,進而降低電性失效的機率。在一些實施方式中,可使第一電極E1的頂面E1T低於第二導電膜材130的表面131,並可使第二電極E2的頂面E2T低於第一導電膜材110的表面111,以確保第一電極E1與第二電極E2之間不產生電性連接。Then, referring to FIG. 3H , a coating step is performed, which may include forming a first electrode E1 on the surface 111 (second electrode region ES2) of the exposed first conductive film material 110, and forming a second electrode E2 on the surface 131 (first electrode region ES1) of the exposed second conductive film material 130. Specifically, the first electrode E1 and the second electrode E2 may be the positive electrode and the negative electrode of the electrochromic film 1000, respectively, and the first electrode E1 and the second electrode E2 may be, for example, conductive silver gel, flexible printed circuit (FPC) or conductive copper foil. The first electrode E1 formed by coating may be adjacent to the color-changing reduction layer 120, and have a gap SP between the color-changing reduction layer 120; the second electrode E2 formed by coating may be adjacent to the color-changing oxide layer 140, and have a gap SP between the color-changing oxide layer 140. In some embodiments, the thickness H6 of the first electrode E1 may be increased by coating multiple times, so that the first electrode E1 is further adjacent to the side walls of the solid electrolyte layer 150 and the color-changing oxide layer 140, and the thickness H7 of the second electrode E2 may be increased by coating multiple times, so that the second electrode E2 is further adjacent to the side walls of the solid electrolyte layer 150 and the color-changing reduction layer 120. This ensures that the first electrode E1 and the second electrode E2 have high material density, thereby reducing the probability of electrical failure. In some embodiments, the top surface E1T of the first electrode E1 can be lower than the surface 131 of the second conductive film material 130, and the top surface E2T of the second electrode E2 can be lower than the surface 111 of the first conductive film material 110 to ensure that there is no electrical connection between the first electrode E1 and the second electrode E2.

接著,請繼續參閱第3H圖,電致變色薄膜1000的製造方法可更包括在間隙SP中形成封邊結構170。更詳細而言,對應於第一電極區ES1的封邊結構170可將間隙SP填滿,並且延伸於變色還原層120、固態電解質層150、變色氧化層140、第二導電膜材130及硬化層160各自的側壁,以降低水氣、灰塵等環境因子侵入電致變色薄膜1000中的機率;同樣地,對應於第二電極區ES2的封邊結構170可將間隙SP填滿,並且延伸於變色氧化層140、固態電解質層150、變色還原層120、第一導電膜材110及硬化層160各自的側壁,以降低水氣、灰塵等環境因子侵入電致變色薄膜1000中的機率。在一些實施方式中,封邊結構170可進一步延伸於並且覆蓋及接觸第一電極E1的頂面E1T及第二電極E2的頂面E2T,且不凸出於第一電極E1及第二電極E2各自的外側壁,以提升封邊結構170的結構穩固性。在一些實施方式中,封邊結構170可具有一弧形側壁C,以承受彎曲應力。在一些實施方式中,封邊結構170的材料可包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合,以具備良好的阻隔性。在一些實施方式中,可使用塗佈的方式形成封邊結構170,所使用的漿料可用波長為365nm至395nm的紫外光照射,所需時間為30秒至60秒下固化,如此不會傷及電致變色薄膜1000中的其他層別,且還可具有製程便利性。希望強調的是,本揭露的封邊結構170並非為了防止其中的電解質流出,更詳細而言,由於本揭露所使用的電解質係固態電解質,因此即使不設置封邊結構170,亦不會產生電解質外漏或流出的狀況。Next, please continue to refer to FIG. 3H , the manufacturing method of the electrochromic film 1000 may further include forming an edge sealing structure 170 in the gap SP. In more detail, the edge sealing structure 170 corresponding to the first electrode region ES1 can fill the gap SP and extend to the side walls of the color-changing reduction layer 120, the solid electrolyte layer 150, the color-changing oxide layer 140, the second conductive film material 130 and the hardening layer 160 to reduce the probability of environmental factors such as moisture and dust invading the electrochromic film 1000; similarly, the edge sealing structure 170 corresponding to the second electrode region ES2 can fill the gap SP and extend to the side walls of the color-changing oxide layer 140, the solid electrolyte layer 150, the color-changing reduction layer 120, the first conductive film material 110 and the hardening layer 160 to reduce the probability of environmental factors such as moisture and dust invading the electrochromic film 1000. In some embodiments, the edge sealing structure 170 may further extend to, cover and contact the top surface E1T of the first electrode E1 and the top surface E2T of the second electrode E2, and not protrude from the outer side walls of the first electrode E1 and the second electrode E2, so as to enhance the structural stability of the edge sealing structure 170. In some embodiments, the edge sealing structure 170 may have a curved side wall C to withstand bending stress. In some embodiments, the material of the edge sealing structure 170 may include acrylic resin, epoxy resin or a combination thereof to have good barrier properties. In some embodiments, the edge sealing structure 170 can be formed by coating, and the slurry used can be irradiated with ultraviolet light with a wavelength of 365nm to 395nm, and the required time is 30 seconds to 60 seconds to cure, so that other layers in the electrochromic film 1000 will not be damaged, and the process is convenient. It is hoped that the edge sealing structure 170 disclosed in the present invention is not to prevent the electrolyte from flowing out. More specifically, since the electrolyte used in the present invention is a solid electrolyte, even if the edge sealing structure 170 is not provided, there will be no leakage or outflow of the electrolyte.

根據本揭露上述實施方式,本揭露不僅僅將傳統以玻璃基板等硬質材作為基礎層板之板材狀的電致變色元件改良而形成電致變色薄膜,更透過具體的製程改良,將電致變色薄膜的製造過程整合至卷對卷(roll to roll)製程中。如此一來,可得到成卷且膜狀的電致變色薄膜而非傳統以玻璃基板等硬質材作為基礎層板之板材(片材)狀的電致變色元件。因此,電致變色薄膜可直接根據後端的設計而裁切為合適的形狀及尺寸,使整個電致變色薄膜的製造方法不會受限於電致變色薄膜於應用時的最終形狀、尺寸及彎曲弧度。另一方面,透過卷對卷製程形成電致變色薄膜不僅可提高生產效率及良率、避免廢氣或廢液排放、提高儲存及運送的便利性,且相較於傳統的玻璃製程可在較小的生產基地生產,大幅提升製程便利性且產能不會受到限制。此外,由於事先於導電膜材規劃出電極區及非電極區,因此可確保變色氧化/還原層僅形成在非電極區中,如此不須額外清除多餘的變色氧化/還原層,大幅提升製程便利性,並且可確保電極穩固地形成於電致變色薄膜中。另外,以本揭露之製造方法製備而成的電致變色薄膜可省去框膠(框架)的配置,也就是說,不需額外引入框膠來避免電致變色薄膜中的電解液外漏,進而大幅提升電致變色薄膜的應用性以及安裝便利性,使電致變色薄膜可應用於多種領域。According to the above-mentioned implementation method of the present disclosure, the present disclosure not only improves the traditional plate-shaped electrochromic element with a hard material such as a glass substrate as a base layer to form an electrochromic film, but also integrates the manufacturing process of the electrochromic film into a roll-to-roll process through specific process improvements. In this way, a rolled and film-shaped electrochromic film can be obtained instead of the traditional plate-shaped (sheet) electrochromic element with a hard material such as a glass substrate as a base layer. Therefore, the electrochromic film can be directly cut into a suitable shape and size according to the design of the back end, so that the entire electrochromic film manufacturing method will not be limited by the final shape, size and curvature of the electrochromic film when it is used. On the other hand, the formation of electrochromic film through roll-to-roll process can not only improve production efficiency and yield, avoid exhaust gas or waste liquid discharge, and improve storage and transportation convenience, but also can be produced in a smaller production base compared to the traditional glass process, greatly improving the convenience of the process and not limiting the production capacity. In addition, since the electrode area and non-electrode area are planned in advance in the conductive film material, it can be ensured that the color-changing oxidation/reduction layer is only formed in the non-electrode area, so there is no need to remove the excess color-changing oxidation/reduction layer, which greatly improves the convenience of the process and ensures that the electrode is stably formed in the electrochromic film. In addition, the electrochromic film prepared by the manufacturing method disclosed herein can omit the configuration of a frame glue (frame), that is, there is no need to introduce additional frame glue to prevent the electrolyte in the electrochromic film from leaking out, thereby greatly improving the applicability and installation convenience of the electrochromic film, so that the electrochromic film can be applied to a variety of fields.

雖然本揭露已以實施方式揭露如上,然其並非用以限定本揭露,任何熟習此技藝者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。Although the present disclosure has been disclosed in the above implementation form, it is not intended to limit the present disclosure. Anyone skilled in the art can make various changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be determined by the scope of the attached patent application.

1000:電致變色薄膜 100:膜狀疊層 110:第一導電膜材 111:表面 115:基材 116:表面 117:氧化銦錫導電薄膜 118:表面 120:變色還原層 121:表面 130:第二導電膜材 131:表面 135:基材 136:表面 137:氧化銦錫導電薄膜 138:表面 140:變色氧化層 141:表面 150:固態電解質層 160:硬化層 170:封邊結構 180:遮蔽層 G:離子傳導膠體 M:噴塗機 P1:第一壓合輪 P2:第二壓合輪 R1:第一輸送輪 R2:第二輸送輪 H1,H2,H3,H4,H5,H6,H7:厚度 d:間距 SL:爬坡區域 Q:縫隙 S1:第一側 S2:第二側 ES1:第一電極區 ES2:第二電極區 NS1:第一非電極區 NS2:第二非電極區 A:電極區域 E1:第一電極 E2:第二電極 E1T,E2T:頂面 SP:間隙 U:紫外光源 C:弧形側壁 S10~S60:步驟 1000: electrochromic film 100: film-like laminate 110: first conductive film 111: surface 115: substrate 116: surface 117: indium tin oxide conductive film 118: surface 120: color-changing reduction layer 121: surface 130: second conductive film 131: surface 135: substrate 136: surface 137: indium tin oxide conductive film 138: surface 140: color-changing oxide layer 141: surface 150: solid electrolyte layer 160: hardening layer 170: edge sealing structure 180: shielding layer G: ion conductive colloid M: spray coating machine P1: First pressing wheel P2: Second pressing wheel R1: First conveyor wheel R2: Second conveyor wheel H1, H2, H3, H4, H5, H6, H7: Thickness d: Spacing SL: Climbing area Q: Gap S1: First side S2: Second side ES1: First electrode area ES2: Second electrode area NS1: First non-electrode area NS2: Second non-electrode area A: Electrode area E1: First electrode E2: Second electrode E1T, E2T: Top surface SP: Gap U: UV light source C: Curved side wall S10~S60: Steps

為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1圖繪示根據本揭露一些實施方式之電致變色薄膜的製造方法的流程圖; 第2圖繪示根據本揭露一些實施方式之膜狀疊層的製程示意圖; 第3A圖至第3H圖繪示根據本揭露一些實施方式之電致變色薄膜的製造方法在不同步驟的剖面示意圖;以及 第4A圖至第4C圖繪示根據本揭露一些實施方式之成卷的第二導電膜材(第一導電膜材)的第一電極區(第二電極區)及第一非電極區(第二非電極區)之規劃的上視示意圖。 In order to make the above and other purposes, features, advantages and embodiments of the present disclosure more clearly understandable, the attached drawings are described as follows: FIG. 1 is a flow chart of a method for manufacturing an electrochromic film according to some embodiments of the present disclosure; FIG. 2 is a schematic diagram of a film-like stacking process according to some embodiments of the present disclosure; FIG. 3A to FIG. 3H are schematic cross-sectional views of different steps of a method for manufacturing an electrochromic film according to some embodiments of the present disclosure; and FIG. 4A to FIG. 4C are schematic top views of the planning of a first electrode region (second electrode region) and a first non-electrode region (second non-electrode region) of a rolled second conductive film material (first conductive film material) according to some embodiments of the present disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None

S10~S60:步驟 S10~S60: Steps

Claims (10)

一種電致變色薄膜的製造方法,包括: 在一第一導電膜材上形成一變色還原層; 接收一第二導電膜材,該第二導電膜材包括一第一電極區及一第一非電極區; 在該第二導電膜材的該第一非電極區上形成一變色氧化層; 連續供應設置有該變色氧化層的該第二導電膜材,並使一離子傳導膠體形成於該變色氧化層上; 將設置有該變色還原層的該第一導電膜材壓合至連續供應的該離子傳導膠體上,使該變色還原層位於該第一導電膜材與該離子傳導膠體之間;以及 將該離子傳導膠體固化以形成一固態電解質層。 A method for manufacturing an electrochromic film, comprising: forming a color-changing reduction layer on a first conductive film material; receiving a second conductive film material, the second conductive film material comprising a first electrode region and a first non-electrode region; forming a color-changing oxide layer on the first non-electrode region of the second conductive film material; continuously supplying the second conductive film material provided with the color-changing oxide layer, and forming an ion-conducting colloid on the color-changing oxide layer; pressing the first conductive film material provided with the color-changing reduction layer onto the continuously supplied ion-conducting colloid, so that the color-changing reduction layer is located between the first conductive film material and the ion-conducting colloid; and The ion-conducting colloid is cured to form a solid electrolyte layer. 如請求項1所述的電致變色薄膜的製造方法,更包括: 在形成該變色氧化層之前,在該第二導電膜材的該第一電極區上形成一遮蔽層。 The method for manufacturing the electrochromic film as described in claim 1 further comprises: Before forming the color-changing oxide layer, forming a shielding layer on the first electrode region of the second conductive film material. 如請求項2所述的電致變色薄膜的製造方法,更包括: 在形成該變色氧化層之後,去除該遮蔽層。 The method for manufacturing the electrochromic film as described in claim 2 further comprises: After forming the color-changing oxide layer, removing the shielding layer. 如請求項1所述的電致變色薄膜的製造方法,更包括: 形成該離子傳導膠體於該第二導電膜材的該第一電極區上。 The method for manufacturing the electrochromic film as described in claim 1 further comprises: Forming the ion conductive colloid on the first electrode region of the second conductive film material. 如請求項1所述的電致變色薄膜的製造方法,其中該第一導電膜材包括一第二電極區及一第二非電極區,且該變色還原層係形成在該第一導電膜材的該第二非電極區上。In the method for manufacturing an electrochromic film as described in claim 1, the first conductive film material includes a second electrode region and a second non-electrode region, and the color-changing reduction layer is formed on the second non-electrode region of the first conductive film material. 如請求項5所述的電致變色薄膜的製造方法,更包括: 在形成該變色還原層之前,在該第一導電膜材的該第二電極區上形成一遮蔽層。 The method for manufacturing the electrochromic film as described in claim 5 further comprises: Before forming the color-changing reduction layer, forming a shielding layer on the second electrode region of the first conductive film material. 如請求項6所述的電致變色薄膜的製造方法,更包括: 在形成該變色還原層之後,去除該遮蔽層。 The method for manufacturing the electrochromic film as described in claim 6 further comprises: After forming the color-changing reduction layer, removing the shielding layer. 如請求項1所述的電致變色薄膜的製造方法,更包括: 進行一塗佈步驟,以形成一電極於該第二導電膜材的該第一電極區,其中該電極與該固態電解質層之間具有一間隙。 The method for manufacturing the electrochromic film as described in claim 1 further comprises: Performing a coating step to form an electrode in the first electrode region of the second conductive film material, wherein there is a gap between the electrode and the solid electrolyte layer. 如請求項8所述的電致變色薄膜的製造方法,更包括: 形成一封邊結構於該間隙中,其中該封邊結構的材料包括壓克力樹脂、環氧樹脂或其組合。 The method for manufacturing the electrochromic film as described in claim 8 further comprises: Forming a sealing structure in the gap, wherein the material of the sealing structure comprises acrylic resin, epoxy resin or a combination thereof. 如請求項8所述的電致變色薄膜的製造方法,其中該封邊結構覆蓋該電極的一頂面。A method for manufacturing an electrochromic film as described in claim 8, wherein the edge sealing structure covers a top surface of the electrode.
TW111137393A 2022-09-30 2022-09-30 Manufacturing method of electrochromic film TWI818753B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW111137393A TWI818753B (en) 2022-09-30 2022-09-30 Manufacturing method of electrochromic film
JP2023167638A JP2024052603A (en) 2022-09-30 2023-09-28 Manufacturing method of electrochromic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW111137393A TWI818753B (en) 2022-09-30 2022-09-30 Manufacturing method of electrochromic film

Publications (2)

Publication Number Publication Date
TWI818753B TWI818753B (en) 2023-10-11
TW202416033A true TW202416033A (en) 2024-04-16

Family

ID=89857609

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111137393A TWI818753B (en) 2022-09-30 2022-09-30 Manufacturing method of electrochromic film

Country Status (2)

Country Link
JP (1) JP2024052603A (en)
TW (1) TWI818753B (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112534345B (en) * 2018-09-13 2022-10-14 深圳市光羿科技有限公司 Preparation method of solid electrochromic device, solid electrochromic device and application of solid electrochromic device
KR102101866B1 (en) * 2019-09-11 2020-04-20 주식회사 스위스 Method for manufacturing Flexible Electro-Chromic element
US20220276541A1 (en) * 2021-02-26 2022-09-01 Brite Hellas Ae Electrochromic glass pane and method of producing the same
TWM621122U (en) * 2021-08-23 2021-12-11 昶曜科技股份有限公司 Soft electrochromic film

Similar Documents

Publication Publication Date Title
JP3669363B2 (en) Electrodeposition type display panel manufacturing method, electrodeposition type display panel, and electrodeposition type display device
US5943113A (en) Method of producing a liquid crystal display unit
JP5267955B2 (en) Method for manufacturing electrophoretic display device
TWI839877B (en) Manufacturing method of electrochromic film
TW202416033A (en) Manufacturing method of electrochromic film
TWI818753B (en) Manufacturing method of electrochromic film
CN102369563B (en) Display device manufacturing method
JP2011133622A (en) Method for manufacturing electrochemical display element, and electrochemical display element
TW202416032A (en) Manufacturing method of electrochromic film
WO2009157244A1 (en) Electrically conductive transparent substrate, method for production of electrically conductive transparent substrate, and electrochemical display element
TWI828348B (en) Electrochromic film and manufacturing method thereof
JP2024052602A (en) Manufacturing method of electrochromic film
TW202416031A (en) Electrochromic film and manufacturing method thereof
JP2012013934A (en) Electronic paper and method for manufacturing electronic paper
JP6892738B2 (en) Optical element and manufacturing method of optical element
JP2013210529A (en) Electrophoretic display device
JP2001188262A (en) Production method of cell for electrochromic mirrors, and electrochromic mirror
JP4678075B2 (en) Method for producing electrochemical display element
JP2012008218A (en) Electronic paper and method for manufacturing electronic paper
JP2005316180A (en) Dimming device and method for manufacturing the same
JP2001051259A (en) Production of substrate, production of optoelectronic device and the optoelectronic device
JP2001249365A (en) Electrochromic mirror
KR100647261B1 (en) Method for manufacturing organic electroluminescent display
JP2015172647A (en) Method for manufacturing reflective display device
TW202202920A (en) Methods for manufacturing a liquid crystal device comprising an interstitial substrate