TW202416032A - Manufacturing method of electrochromic film - Google Patents
Manufacturing method of electrochromic film Download PDFInfo
- Publication number
- TW202416032A TW202416032A TW111137391A TW111137391A TW202416032A TW 202416032 A TW202416032 A TW 202416032A TW 111137391 A TW111137391 A TW 111137391A TW 111137391 A TW111137391 A TW 111137391A TW 202416032 A TW202416032 A TW 202416032A
- Authority
- TW
- Taiwan
- Prior art keywords
- color
- changing
- layer
- film
- conductive film
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 114
- 230000009467 reduction Effects 0.000 claims abstract description 94
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 60
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 48
- 238000005520 cutting process Methods 0.000 claims abstract description 30
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 14
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001930 tungsten oxide Inorganic materials 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 78
- 239000007784 solid electrolyte Substances 0.000 claims description 55
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 36
- 238000004140 cleaning Methods 0.000 claims description 27
- 238000007789 sealing Methods 0.000 claims description 17
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 13
- 229910017604 nitric acid Inorganic materials 0.000 claims description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 7
- 229920000178 Acrylic resin Polymers 0.000 claims description 7
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 7
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 4
- 229920000647 polyepoxide Polymers 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 178
- 239000003792 electrolyte Substances 0.000 abstract description 16
- 239000010409 thin film Substances 0.000 abstract description 2
- 238000006722 reduction reaction Methods 0.000 description 84
- 150000002500 ions Chemical class 0.000 description 54
- 230000008569 process Effects 0.000 description 53
- 238000003825 pressing Methods 0.000 description 30
- 239000003292 glue Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 239000000084 colloidal system Substances 0.000 description 14
- 230000000694 effects Effects 0.000 description 13
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 13
- 239000000203 mixture Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 238000005530 etching Methods 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 230000005684 electric field Effects 0.000 description 7
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 6
- 238000005507 spraying Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- -1 skylights Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 229910003002 lithium salt Inorganic materials 0.000 description 3
- 159000000002 lithium salts Chemical class 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Images
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本揭露內容是有關於一種電致變色膜的製造方法。The present disclosure relates to a method for manufacturing an electrochromic film.
目前市面上的電致變色元件多以玻璃基板等硬質材作為基礎層板,使得電致變色元件在生產過程中無法被收納,而僅能以獨立片狀式結構實施,且獨立片狀式的電致變色元件不利於量產,產能相對受到限制。片狀式結構的電致變色元件在應用上容易受限於材料尺寸、形狀及彎曲情形(曲面)而無法被廣泛應用,且在應用時為因應物品尺寸,在裁切後容易有廢料產生。Currently, most electrochromic components on the market use hard materials such as glass substrates as the base layer, which makes it impossible to store electrochromic components during the production process. They can only be implemented in an independent sheet-type structure. Independent sheet-type electrochromic components are not conducive to mass production and their production capacity is relatively limited. Sheet-type electrochromic components are easily limited in application due to the size, shape and curvature (curved surface) of the material and cannot be widely used. In addition, in order to adapt to the size of the object during application, waste is easily generated after cutting.
根據本揭露一些實施方式,本揭露提供一種電致變色薄膜的製造方法,包括:進行成膜步驟,包括形成膜狀疊層,其中膜狀疊層包括依序堆疊的第一導電膜材、變色還原層、固態電解質層、變色氧化層及第二導電膜材,且變色還原層的材料包括氧化鎢;進行切割步驟,包括將膜狀疊層之第一側的第二導電膜材、變色氧化層以及固態電解質層切除,使第一側的變色還原層裸露出來;進行清除步驟,包括使用第一溶液將裸露出的變色還原層清除,使部分的第一導電膜材裸露出來,其中第一溶液包括氫氧化鈉、過氧化氫及水;以及進行塗佈步驟,包括在裸露出的第一導電膜材的表面形成第一電極。According to some embodiments of the present disclosure, the present disclosure provides a method for manufacturing an electrochromic film, comprising: performing a film forming step, comprising forming a film-like stack, wherein the film-like stack comprises a first conductive film material, a color-changing reduction layer, a solid electrolyte layer, a color-changing oxide layer and a second conductive film material stacked in sequence, and the material of the color-changing reduction layer comprises tungsten oxide; performing a cutting step, comprising cutting the first side of the film-like stack to form a second conductive film material; The second conductive film material, the color-changing oxide layer and the solid electrolyte layer are removed to expose the color-changing reduction layer on the first side; a cleaning step is performed, including using a first solution to remove the exposed color-changing reduction layer to expose part of the first conductive film material, wherein the first solution includes sodium hydroxide, hydrogen peroxide and water; and a coating step is performed, including forming a first electrode on the surface of the exposed first conductive film material.
在本揭露一些實施方式中,切割步驟更包括:將膜狀疊層之第二側的第一導電膜材、變色還原層及固態電解質層切除,使第二側的變色氧化層裸露出來。In some embodiments of the present disclosure, the cutting step further includes: removing the first conductive film material, the color-changing reduction layer and the solid electrolyte layer on the second side of the film-like stack to expose the color-changing oxide layer on the second side.
在本揭露一些實施方式中,變色氧化層的材料包括氧化鎳,且進行清除步驟更包括:使用第二溶液將裸露出的變色氧化層清除,使部分的第二導電膜材裸露出來,其中第二溶液包括硝酸、檸檬酸、過氧化氫及水。In some embodiments of the present disclosure, the material of the color-changing oxide layer includes nickel oxide, and the cleaning step further includes: using a second solution to remove the exposed color-changing oxide layer to expose a portion of the second conductive film material, wherein the second solution includes nitric acid, citric acid, hydrogen peroxide and water.
在本揭露一些實施方式中,在第二溶液中,硝酸的含量介於15重量份至40重量份之間,檸檬酸的含量介於0.5重量份至10重量份之間,且過氧化氫的含量介於1重量份至10重量份之間。In some embodiments of the present disclosure, in the second solution, the content of nitric acid is between 15 parts by weight and 40 parts by weight, the content of citric acid is between 0.5 parts by weight and 10 parts by weight, and the content of hydrogen peroxide is between 1 part by weight and 10 parts by weight.
在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:調整第一溶液的酸鹼值,使第一溶液的酸鹼值介於8.0至10.0之間;以及調整第二溶液的酸鹼值,使第二溶液的酸鹼值介於1.0至3.0之間。In some embodiments of the present disclosure, the method for manufacturing an electrochromic film further includes: adjusting the pH value of the first solution so that the pH value of the first solution is between 8.0 and 10.0; and adjusting the pH value of the second solution so that the pH value of the second solution is between 1.0 and 3.0.
在本揭露一些實施方式中,在第一溶液中,氫氧化鈉的含量介於15重量份至40重量份之間,過氧化氫的含量介於2重量份至10重量份之間。In some embodiments of the present disclosure, in the first solution, the content of sodium hydroxide is between 15 parts by weight and 40 parts by weight, and the content of hydrogen peroxide is between 2 parts by weight and 10 parts by weight.
在本揭露一些實施方式中,在清除步驟中係使用擦拭的方式將裸露出的變色還原層清除。In some embodiments of the present disclosure, the exposed discoloration reduction layer is removed by wiping in the removal step.
在本揭露一些實施方式中,在塗佈步驟中形成的第一電極與固態電解質層之間具有間隙。In some embodiments of the present disclosure, a gap is formed between the first electrode formed in the coating step and the solid electrolyte layer.
在本揭露一些實施方式中,電致變色薄膜的製造方法更包括:形成封邊結構於間隙中,其中封邊結構的材料包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合。In some embodiments of the present disclosure, the method for manufacturing the electrochromic film further includes: forming an edge sealing structure in the gap, wherein the material of the edge sealing structure includes acrylic resin, epoxy resin or a combination thereof.
在本揭露一些實施方式中,封邊結構覆蓋第一電極的頂面。In some embodiments of the present disclosure, the edge sealing structure covers the top surface of the first electrode.
根據本揭露上述實施方式,本揭露透過特殊的製程方式(清潔方式)在短時間內徹底去除殘留的變色氧化/還原層,不僅有利於將電極穩固形成於電致變色薄膜中,還可大幅提升製程便利性。According to the above-mentioned implementation method of the present disclosure, the present disclosure completely removes the residual color-changing oxidation/reduction layer in a short time through a special process method (cleaning method), which is not only conducive to stably forming the electrode in the electrochromic film, but also can greatly improve the convenience of the process.
以下將揭露本揭露之複數個實施方式,為明確地說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務的細節不應用以限制本揭露。也就是說,在本揭露部分實施方式中,這些實務上的細節是非必要的,因此不應用以限制本揭露。The following will disclose multiple implementations of the present disclosure. For the purpose of clarity, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present disclosure. In other words, in some implementations of the present disclosure, these practical details are not necessary and therefore should not be used to limit the present disclosure.
應當理解,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖式中所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。舉例而言,若一附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,若一個附圖中的裝置翻轉,則被描述為在其它元件「下」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下」 或「下面」可以包括上方和下方的取向。It should be understood that relative terms such as "below" or "bottom" and "above" or "top" may be used herein to describe the relationship of one element to another element, as shown in the drawings. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in an accompanying figure is flipped, the elements described as being on the "below" side of other elements will be oriented on the "above" side of other elements. Therefore, the exemplary term "below" can include both "below" and "above" orientations, depending on the specific orientation of the accompanying figure. Similarly, if the device in an accompanying figure is flipped, the elements described as being "below" or "below" other elements will be oriented as being "above" other elements. Therefore, the exemplary term "below" or "below" can include both above and below orientations.
本揭露提供一種電致變色薄膜的製造方法,其透過特殊的製程改良,將電致變色薄膜的製造過程整合至卷對卷(roll to roll)製程中。如此一來,不僅可提高生產效率及良率、避免廢氣或廢液排放、提高儲存及運送的便利性,還可形成卷狀的電致變色薄膜,進而取代傳統板材(片材)狀的電致變色元件。藉此,成卷的電致變色薄膜可直接根據後端的設計而裁切為合適的形狀及尺寸,使整個電致變色薄膜的製造方法不會受限於電致變色薄膜於應用時的最終形狀、尺寸及彎曲弧度。此外,成卷的電致變色薄膜可於裁切後透過本揭露特殊的製程方式(清潔方式)來在短時間內徹底去除殘留的變色氧化/還原層,不僅有利於將電極穩固地形成於電致變色薄膜中,還可大幅提升製程便利性。另外,以本揭露之製造方法製備而成的電致變色薄膜可省去框膠(框架)的配置,也就是說,不需額外引入框膠來避免電致變色薄膜中的電解液外漏,進而大幅提升電致變色薄膜的應用性以及安裝便利性,使電致變色薄膜可應用於多種領域。本揭露的電致變色薄膜可應用於建材帷幕玻璃、採光窗、智慧窗、室內隔間牆、汽車後視鏡或外視鏡、汽車天窗、側窗和擋風玻璃(應用在汽車、大型陸上運輸工具、捷運、電車、高鐵、飛機、船舶等)、個人穿戴鏡片(變色鏡、雪鏡、安全鏡)、安全帽鏡片、3C虛擬實境鏡等多種領域。The present disclosure provides a method for manufacturing an electrochromic film, which integrates the manufacturing process of the electrochromic film into a roll-to-roll process through a special process improvement. In this way, not only can the production efficiency and yield be improved, the emission of waste gas or waste liquid be avoided, and the convenience of storage and transportation be improved, but also a roll-shaped electrochromic film can be formed to replace the traditional plate (sheet)-shaped electrochromic element. In this way, the rolled electrochromic film can be directly cut into a suitable shape and size according to the design of the back end, so that the entire electrochromic film manufacturing method is not limited by the final shape, size and curvature of the electrochromic film when it is used. In addition, the rolled electrochromic film can be completely removed from the residual color-changing oxidation/reduction layer in a short time through the special process method (cleaning method) disclosed in the present invention after cutting, which is not only conducive to stably forming the electrode in the electrochromic film, but also greatly improves the convenience of the process. In addition, the electrochromic film prepared by the manufacturing method disclosed in the present invention can save the configuration of the frame glue (frame), that is, there is no need to introduce additional frame glue to prevent the electrolyte in the electrochromic film from leaking out, thereby greatly improving the applicability and installation convenience of the electrochromic film, so that the electrochromic film can be applied to a variety of fields. The electrochromic film disclosed herein can be applied to building curtain glass, skylights, smart windows, interior partition walls, automobile rearview mirrors or exterior mirrors, automobile sunroofs, side windows and windshields (applied in automobiles, large land transportation vehicles, subways, trams, high-speed railways, airplanes, ships, etc.), personal wearable lenses (photochromic lenses, snow goggles, safety goggles), helmet lenses, 3C virtual reality goggles, and many other fields.
請參閱第1圖,其繪示根據本揭露一些實施方式之電致變色薄膜的製造方法的流程圖。電致變色薄膜的製造方法包括步驟S10至步驟S40,其中步驟S10至步驟S40可依序進行。在步驟S10中,進行成膜步驟,以形成膜狀疊層,膜狀疊層包括依序堆疊的第一導電膜材、變色還原層、固態電解質層、變色氧化層一第二導電膜材,且變色還原層的材料包括氧化鎢。在步驟S20中,進行切割步驟,包括將膜狀疊層之第一側的第二導電膜材、變色氧化層及固態電解質層切除,使第一側的變色還原層裸露出來。在步驟S30中,進行清除步驟,包括使用第一溶液將裸露出的變色還原層清除,使部分的第一導電膜材裸露出來,其中第一溶液包括氫氧化鈉、過氧化氫及水。在步驟S40中,進行塗佈步驟,包括在裸露出的第一導電膜材的表面形成第一電極。在以下敘述中,將透過第2圖至第5C圖來詳細說明上述各步驟,其中第2圖繪示根據本揭露一些實施方式之膜狀疊層的製程示意圖,第3A圖繪示根據本揭露一些實施方式之膜狀疊層100的立體示意圖,第3B圖繪示第3A圖之膜狀疊層100沿線段A-A'截取的剖面示意圖,第4A圖、第4B圖及第4C圖繪示根據本揭露一些實施方式之電致變色薄膜1000在製程期間於不同步驟中的剖面示意圖,而第5A圖至5C圖繪示根據本揭露一些實施方式之電致變色薄膜1000在製程期間於不同實施方式中的上視示意圖。Please refer to FIG. 1, which shows a flow chart of a method for manufacturing an electrochromic film according to some embodiments of the present disclosure. The method for manufacturing an electrochromic film includes steps S10 to S40, wherein steps S10 to S40 can be performed in sequence. In step S10, a film forming step is performed to form a film-like stack, and the film-like stack includes a first conductive film material, a color-changing reduction layer, a solid electrolyte layer, a color-changing oxide layer, and a second conductive film material stacked in sequence, and the material of the color-changing reduction layer includes tungsten oxide. In step S20, a cutting step is performed, including removing the second conductive film material, the color-changing oxide layer and the solid electrolyte layer on the first side of the film-like stack, so that the color-changing reduction layer on the first side is exposed. In step S30, a cleaning step is performed, including using a first solution to clean the exposed color-changing reduction layer, so that part of the first conductive film material is exposed, wherein the first solution includes sodium hydroxide, hydrogen peroxide and water. In step S40, a coating step is performed, including forming a first electrode on the surface of the exposed first conductive film material. In the following description, each of the above steps will be described in detail through Figures 2 to 5C, wherein Figure 2 is a schematic diagram of the process of the film-like stack according to some embodiments of the present disclosure, Figure 3A is a three-dimensional schematic diagram of the film-
首先,在步驟S10中,進行成膜步驟,以形成膜狀疊層100。具體而言,成膜步驟可包括步驟S11至步驟S16。首先,在步驟S11中,在第一導電膜材110上形成變色還原層120。在一些實施方式中,可透過卷對卷製程將變色還原層120形成於連續供應之第一導電膜材110的表面111。在一些實施方式中,第一導電膜材110可包括基材115及配置於基材115之表面116的氧化銦錫導電薄膜117,其中基材115的材料可包括聚對苯二甲酸乙二醇酯,且基材115的厚度H1可介於38微米至188微米之間,較佳可介於75微米至125微米之間,更佳可介於100微米至125微米之間,使第一導電膜材110兼具一定的承載力以及良好的可撓性,進而利於整合至卷對卷製程中。在一些實施方式中,氧化銦錫導電薄膜117的面阻值可介於5Ω/□至50Ω/□之間,使電致變色薄膜1000具有合適的電性規格。First, in step S10, a film forming step is performed to form a film-
在一些實施方式中,可透過蒸鍍或濺鍍的方式形成變色還原層120,使變色還原層120配置於氧化銦錫導電薄膜117背對於基材115之表面118。透過蒸鍍或濺鍍的方式形成的變色還原層120可具有良好的材料密度及材料分佈均勻性,進而不易脫落或龜裂,並在電場改變時穩定地提供離子。補充說明的是,相較於使用旋轉塗佈(spin coating)、電鍍、濕式塗佈等製程,使用蒸鍍或濺鍍的方式形成變色還原層120具有其優勢,詳細而言,使用旋轉塗佈、電鍍、濕式塗佈等製程易導致漿料附著性差,進而使變色還原層120容易脫落,造成無法變色或減低使用壽命等情形發生。在一些實施方式中,變色還原層120的材料可包括氧化鎢。在一些實施方式中,變色還原層120的厚度H2可介於50奈米至800奈米之間,較佳可介於100奈米至600奈米之間,更佳可介於100奈米至400奈米之間,使變色還原層120可在電場改變時穩定地提供離子(穩定地產生顏色變化)並具有良好的可撓性並且不至於過厚,進而利於整合至卷對卷製程中。In some embodiments, the color-changing reduction layer 120 can be formed by evaporation or sputtering, so that the color-changing reduction layer 120 is disposed on the surface 118 of the indium tin oxide conductive film 117 facing away from the substrate 115. The color-changing reduction layer 120 formed by evaporation or sputtering can have good material density and material distribution uniformity, so it is not easy to fall off or crack, and stably provides ions when the electric field changes. It is to be noted that, compared with the use of spin coating, electroplating, wet coating and other processes, the use of evaporation or sputtering to form the color-changing reduction layer 120 has its advantages. Specifically, the use of spin coating, electroplating, wet coating and other processes easily leads to poor slurry adhesion, which makes the color-changing reduction layer 120 easy to fall off, resulting in the inability to change color or reducing the service life. In some embodiments, the material of the color-changing reduction layer 120 may include tungsten oxide. In some embodiments, the thickness H2 of the color-changing reduction layer 120 may be between 50 nm and 800 nm, preferably between 100 nm and 600 nm, and more preferably between 100 nm and 400 nm, so that the color-changing reduction layer 120 can stably provide ions (stably produce color changes) when the electric field changes, has good flexibility and is not too thick, thereby facilitating integration into the roll-to-roll process.
接著,在步驟S12中,在第二導電膜材130上形成變色氧化層140。在一些實施方式中,可透過卷對卷製程將變色氧化層140形成於連續供應之第二導電膜材130的表面131。在一些實施方式中,第二導電膜材130可包括基材135及配置於基材135之表面136的氧化銦錫導電薄膜137,其中基材135的材料可包括聚對苯二甲酸乙二醇酯,且基材135的厚度H3可介於38微米至188微米之間,較佳可介於75微米至125微米之間,更佳可介於100微米至125微米之間,使第二導電膜材130兼具一定的承載力及良好的可撓性,進而利於整合至卷對卷製程中。在一些實施方式中,氧化銦錫導電薄膜137的面阻值可介於5Ω/□至50Ω/□間,使電致變色薄膜1000具有合適的電性規格。值得說明的是,選用相同的材料、厚度及規格形成第一導電膜材110及第二導電膜材130,可使電致變色薄膜1000在結構穩定性及電性穩定性方面皆具有較佳的表現。Next, in step S12, a color-changing oxide layer 140 is formed on the second conductive film material 130. In some embodiments, the color-changing oxide layer 140 can be formed on the surface 131 of the continuously supplied second conductive film material 130 through a roll-to-roll process. In some embodiments, the second conductive film material 130 can include a substrate 135 and an indium tin oxide conductive film 137 disposed on a surface 136 of the substrate 135, wherein the material of the substrate 135 can include polyethylene terephthalate, and the thickness H3 of the substrate 135 can be between 38 microns and 188 microns, preferably between 75 microns and 125 microns, and more preferably between 100 microns and 125 microns, so that the second conductive film material 130 has both a certain bearing capacity and good flexibility, thereby facilitating integration into the roll-to-roll process. In some embodiments, the surface resistance of the indium tin oxide conductive film 137 can be between 5Ω/□ and 50Ω/□, so that the
在一些實施方式中,可透過蒸鍍或濺鍍的方式形成變色氧化層140,使變色氧化層140配置於氧化銦錫導電薄膜137背對於基材135之表面138。透過蒸鍍或濺鍍的方式形成的變色氧化層140可具有良好的材料密度及材料分佈均勻性,進而不易脫落或龜裂,並在電場改變時穩定地提供離子,補充說明的是,相較於使用旋轉塗佈(spin coating)、電鍍、濕式塗佈等製程,使用蒸鍍或濺鍍的方式形成變色氧化層140具有其優勢,詳細而言,使用旋轉塗佈、電鍍、濕式塗佈等製程易導致漿料附著性差,進而使變色還原層120容易脫落,造成無法變色或減低使用壽命等情形發生。在一些實施方式中,變色氧化層140的材料可包括氧化鎳。在一些實施方式中,變色氧化層140的厚度H4可介於100奈米至800奈米之間,較佳可介於200奈米至700奈米之間,更佳可介於400奈米至600奈米之間,使變色氧化層140可在電場改變時穩定地接受離子(穩定地產生顏色變化),並具有良好的可撓性且不至於過厚,進而利於整合至卷對卷製程中。在一些實施方式中,由於變色還原層120與變色氧化層140反應速度不相同,可將變色氧化層140的厚度H4調整為較變色還原層120的厚度H2大至少100奈米,以使變色氧化層140與變色還原層120搭配出較佳的電致變色性能。In some embodiments, the color-changing oxide layer 140 can be formed by evaporation or sputtering, so that the color-changing oxide layer 140 is disposed on the surface 138 of the indium tin oxide conductive film 137 facing away from the substrate 135. The color-changing oxide layer 140 formed by evaporation or sputtering can have good material density and uniform material distribution, and is not easy to fall off or crack, and can stably provide ions when the electric field changes. It should be noted that compared with using spin coating, electroplating, wet coating and other processes, using evaporation or sputtering to form the color-changing oxide layer 140 has its advantages. Specifically, using spin coating, electroplating, wet coating and other processes can easily lead to poor slurry adhesion, which can easily cause the color-changing reduction layer 120 to fall off, resulting in failure to change color or reduced service life. In some embodiments, the material of the color-changing oxide layer 140 may include nickel oxide. In some embodiments, the thickness H4 of the color-changing oxide layer 140 may be between 100 nanometers and 800 nanometers, preferably between 200 nanometers and 700 nanometers, and more preferably between 400 nanometers and 600 nanometers, so that the color-changing oxide layer 140 can stably accept ions (stably produce color changes) when the electric field changes, and has good flexibility and is not too thick, thereby facilitating integration into a roll-to-roll process. In some embodiments, since the color-changing reduction layer 120 and the color-changing oxide layer 140 have different reaction speeds, the thickness H4 of the color-changing oxide layer 140 can be adjusted to be at least 100 nanometers greater than the thickness H2 of the color-changing reduction layer 120, so that the color-changing oxide layer 140 and the color-changing reduction layer 120 can be matched to produce better electrochromic performance.
隨後,在步驟S13中,連續供應變色還原層120並且在變色還原層120上形成離子傳導膠體G。更詳細而言,配置有變色還原層120的第一導電膜材110可透過第一輸送輪R1的轉動而在卷對卷製程中進行輸送,使配置有變色還原層120的第一導電膜材110可持續且不間斷地供應。於此同時提供離子傳導膠體G至第一輸送輪R1,使變色還原層120背對於第一導電膜材110的表面121可承接由噴塗機M提供的離子傳導膠體G。在一些實施方式中,噴塗機M的塗佈速度可介於1公尺/分鐘至20公尺/分鐘之間,也就是說,可將離子傳導膠體G以1公尺/分鐘至20公尺/分鐘的速度塗佈至連續供應的變色還原層120的表面121,使離子傳導膠體G可以合適的量及合適的密度配置於變色還原層120的表面121。詳細而言,若噴塗機M的塗佈速度大於20公尺/分鐘,可能導致變色還原層120之表面121在單位面積下所承載之離子傳導膠體G含量過低,即離子傳導膠體G在變色還原層120之表面121的分佈狀況過於稀疏,無法於後續緊密地黏合變色還原層120及變色氧化層140;而若噴塗機M的塗佈速度小於1公尺/分鐘,則可能導致變色還原層120之表面121在單位面積下所承載之離子傳導膠體G含量過多,不僅容易造成在後續壓合期間發生溢膠的狀況,且造成材料的不必要浪費。在較佳的實施方式中,噴塗機M的塗佈速度可介於2公尺/分鐘至6公尺/分鐘之間,進而達到較佳的黏合效果。Then, in step S13, the color-changing reduction layer 120 is continuously supplied and the ion-conducting gel G is formed on the color-changing reduction layer 120. In more detail, the first conductive film material 110 provided with the color-changing reduction layer 120 can be transported in a roll-to-roll process by the rotation of the first conveying wheel R1, so that the first conductive film material 110 provided with the color-changing reduction layer 120 can be continuously and uninterruptedly supplied. At the same time, the ion-conducting gel G is provided to the first conveying wheel R1, so that the surface 121 of the color-changing reduction layer 120 opposite to the first conductive film material 110 can receive the ion-conducting gel G provided by the sprayer M. In some embodiments, the coating speed of the sprayer M may be between 1 m/min and 20 m/min, that is, the ion conductive colloid G may be coated on the surface 121 of the continuously supplied color-changing reduction layer 120 at a speed of 1 m/min to 20 m/min, so that the ion conductive colloid G may be arranged on the surface 121 of the color-changing reduction layer 120 in an appropriate amount and at an appropriate density. Specifically, if the coating speed of the spray coating machine M is greater than 20 m/min, the content of the ion conductive colloid G carried per unit area on the surface 121 of the color-changing reduction layer 120 may be too low, that is, the distribution of the ion conductive colloid G on the surface 121 of the color-changing reduction layer 120 is too sparse, and the color-changing reduction layer 120 cannot be closely bonded to the subsequent color-changing reduction layer 120. If the coating speed of the spraying machine M is less than 1 meter/minute, the surface 121 of the color-changing reduction layer 120 may carry too much ion-conducting gel G per unit area, which may easily cause glue overflow during the subsequent pressing and cause unnecessary waste of materials. In a preferred embodiment, the coating speed of the spraying machine M can be between 2 meters/minute and 6 meters/minute, thereby achieving a better bonding effect.
另一方面,將噴塗機M的塗佈速度控制在上述範圍中,還可有助於控制離子傳導膠體G的形成於變色還原層120之表面121的厚度H5,使離子傳導膠體G的厚度H5可被控制在介於10微米至100微米之間,如此不僅可提升膜材(例如,配置有離子傳導膠體G及變色還原層120的第一導電膜材110)在輸送時的穩定性,還可避免在後續壓合期間發生溢膠的狀況,又可確保離子傳導膠體G在後續經固化後所形成之固態電解質層150具有良好的離子傳導性。詳細而言,若離子傳導膠體G的厚度H5小於10微米,可能導致後續壓合時形成斷點,造成所形成之固態電解質層150的分佈不連續,進而無法提供良好的離子傳導性;而若離子傳導膠體G的厚度H5大於100微米,則可能造成後續壓合困難,且離子傳導膠體G的厚度H5越厚,電子傳導效率越慢,造成變色速度變慢,且不利於形成本揭露所強調之「薄膜狀」的電致變色薄膜1000。在較佳的實施方式中,離子傳導膠體G的厚度H5可進一步被控制在介於20微米至50微米之間,進而較佳地達到上述效果。在一些實施方式中,離子傳導膠體G的形成於變色還原層120之表面121的厚度H5即為固化後之固態電解質層150的厚度H5。On the other hand, controlling the coating speed of the spray coating machine M within the above range can also help control the thickness H5 of the ion conductive gel G formed on the surface 121 of the color-changing reduction layer 120, so that the thickness H5 of the ion conductive gel G can be controlled between 10 microns and 100 microns. This can not only improve the stability of the film material (for example, the first conductive film material 110 configured with the ion conductive gel G and the color-changing reduction layer 120) during transportation, but also avoid the overflow of the glue during the subsequent pressing period, and ensure that the solid electrolyte layer 150 formed by the ion conductive gel G after subsequent curing has good ionic conductivity. Specifically, if the thickness H5 of the ion conductive gel G is less than 10 microns, a break may be formed during subsequent pressing, resulting in a discontinuous distribution of the formed solid electrolyte layer 150, and thus failing to provide good ion conductivity; and if the thickness H5 of the ion conductive gel G is greater than 100 microns, subsequent pressing may be difficult, and the thicker the thickness H5 of the ion conductive gel G, the slower the electron conduction efficiency, resulting in a slower color change speed, and not conducive to forming the "thin film"
值得說明的是,本揭露進一步使用經特殊改良的離子傳導膠體G,以將離子傳導膠體G的塗佈整合至卷對卷製程中,並且離子傳導膠體G可在最終固化為固態電解質層150,使得最終形成的電致變色薄膜1000可省去框膠的配置(此部分將於下文中進行更詳細的說明),進而使得電致變色薄膜1000可因應不同形狀、弧度的物體進行配置,進而大幅提升電致變色薄膜1000的應用性及安裝便利性,使電致變色薄膜1000可應用於多種領域中。It is worth noting that the present disclosure further uses a specially improved ion conductive gel G to integrate the coating of the ion conductive gel G into the roll-to-roll process, and the ion conductive gel G can be finally cured into a solid electrolyte layer 150, so that the
詳細而言,離子傳導膠體G的製備方法可包括以下步驟。首先,將過氯酸鋰(LiClO 4)加入聚碳酸酯(Polycarbonate,PC)中攪拌8小時至12小時,以使之均勻分散混合,進而形成電解質混合物。接著,將電解質混合物加入紫外光固化膠中,並以均質機攪拌8小時至12小時使之均勻分散混合後,再加入光起始劑並攪拌0.5小時至2小時,進而形成離子傳導膠體G。在一些實施方式中,電解質混合物的含量可介於30重量份至40重量份之間,紫外光固化膠的含量可介於60重量份至70重量份之間,且以電解質混合物的總重量計,過氯酸鋰的含量可介於1wt%至15wt%之間。詳細而言,若電解質混合物的含量大於40重量份(或紫外光固化膠的含量小於60重量份),且過氯酸鋰的含量大於15wt%,可能導致離子傳導膠體G中的鋰鹽(過氯酸鋰)過多,難以均勻分散並容易聚集成塊(成團、沉澱),且可能因紫外光固化膠的含量過少而導致離子傳導膠體G中的局部區塊未能完全固化,有溢膠(或漏膠)的風險;若電解質混合物的含量小於30重量份(或紫外光固化膠的含量大於70重量份),且過氯酸鋰的含量小於1wt%,可能導致離子傳導膠體G中的鋰鹽(過氯酸鋰)過少,無法提供足夠的離子傳導性,且可能因紫外光固化膠的含量過多而來不及在動態的卷對卷製程中迅速地完全固化,同樣有溢膠(或漏膠)的風險。在較佳的實施方式中,以電解質混合物的總重量計,過氯酸鋰的含量介於4wt%至10wt%之間,以較佳地達到上述功效。 In detail, the preparation method of the ion conductive gel G may include the following steps. First, lithium perchlorate (LiClO 4 ) is added to polycarbonate (PC) and stirred for 8 to 12 hours to uniformly disperse and mix, thereby forming an electrolyte mixture. Then, the electrolyte mixture is added to the UV curable glue and stirred for 8 to 12 hours with a homogenizer to uniformly disperse and mix, and then a photoinitiator is added and stirred for 0.5 to 2 hours to form the ion conductive gel G. In some embodiments, the content of the electrolyte mixture may be between 30 parts by weight and 40 parts by weight, the content of the UV-curable adhesive may be between 60 parts by weight and 70 parts by weight, and the content of lithium perchlorate may be between 1 wt% and 15 wt% based on the total weight of the electrolyte mixture. In detail, if the content of the electrolyte mixture is greater than 40 parts by weight (or the content of the UV-curable adhesive is less than 60 parts by weight), and the content of lithium perchlorate is greater than 15 wt%, it may cause the lithium salt (lithium perchlorate) in the ion-conducting gel G to be too much, making it difficult to disperse evenly and easily aggregate into lumps (clumps, precipitation), and the content of the UV-curable adhesive may be too little, causing the local block in the ion-conducting gel G to fail to fully cure, resulting in glue overflow (or If the content of the electrolyte mixture is less than 30 parts by weight (or the content of the UV-curable adhesive is greater than 70 parts by weight), and the content of lithium perchlorate is less than 1wt%, the lithium salt (lithium perchlorate) in the ion conductive gel G may be too little to provide sufficient ion conductivity, and the UV-curable adhesive may not be able to fully cure quickly in the dynamic roll-to-roll process due to the excessive content, and there is also the risk of glue overflow (or glue leakage). In a preferred embodiment, the content of lithium perchlorate is between 4wt% and 10wt% based on the total weight of the electrolyte mixture to better achieve the above effect.
在一些實施方式中,紫外光固化膠可包括丙烯酸系樹脂(或丙烯酸系感壓樹脂)。舉例而言,丙烯酸系(感壓)樹脂可以是聚甲基丙烯酸甲酯、聚氨酯丙烯酸酯或環氧丙烯酸酯。上述丙烯酸系樹脂的紫外光固化膠在特定的紫外光波長範圍內可迅速固化,因此可有助於將固化製程整合至卷對卷製程中,並可避免因固化所提供能量過高或因固化時間過長而傷以及電致變色薄膜1000中的其他層別(例如,變色還原層120及變色氧化層140),此將於下文進行說明。如前所述,離子傳導膠體G可包括適量的光起始劑,以使離子傳導膠體G在照射紫外光後迅速地反應而固化。具體而言,本揭露可選用的光起始劑包括醯基膦氧化物系材料(型號:Irgacure®TPO、Irgacure®819),且以電解質混合物的總重量計,光起始劑的含量可介於0.5wt%至2.5wt%之間,以達到最佳的固化效果,並可避免光起始劑殘留而在已固化的固態電解質層150中進一步分解其他成分而導致其他成分降解,進而避免固態電解質層150的離子傳導性隨時間而快速耗損。詳細而言,若光起始劑的含量小於0.5wt%,可能導致離子傳導膠體G無法完全固化;而若光起始劑的含量大於2.5wt%,可能導致光起始劑因消耗不完全而殘留於固態電解質層150中。In some embodiments, the UV-curable adhesive may include an acrylic resin (or an acrylic pressure-sensitive resin). For example, the acrylic (pressure-sensitive) resin may be polymethyl methacrylate, polyurethane acrylate, or epoxy acrylate. The above-mentioned acrylic resin UV-curable adhesive can be rapidly cured within a specific UV wavelength range, thereby facilitating the integration of the curing process into a roll-to-roll process, and avoiding damage to other layers in the electrochromic film 1000 (e.g., the color-changing reduction layer 120 and the color-changing oxidation layer 140) due to excessive energy provided for curing or excessive curing time, which will be described below. As previously described, the ion-conducting gel G may include an appropriate amount of a photoinitiator so that the ion-conducting gel G reacts rapidly and cures after being irradiated with UV light. Specifically, the optional photoinitiator disclosed in the present invention includes acylphosphine oxide materials (models: Irgacure® TPO, Irgacure® 819), and the content of the photoinitiator can be between 0.5wt% and 2.5wt% based on the total weight of the electrolyte mixture to achieve the best curing effect and avoid the photoinitiator residue from further decomposing other components in the cured solid electrolyte layer 150 and causing degradation of other components, thereby avoiding the rapid loss of ionic conductivity of the solid electrolyte layer 150 over time. Specifically, if the content of the photoinitiator is less than 0.5 wt %, the ion conductive gel G may not be completely cured; and if the content of the photoinitiator is greater than 2.5 wt %, the photoinitiator may remain in the solid electrolyte layer 150 due to incomplete consumption.
另一方面,離子傳導膠體G的黏度對於固態電解質層150是否能透過卷對卷製程穩固地配置於電致變色薄膜1000中是重要的,且對於固態電解質層150中電解質是否能均勻分散以達到良好的離子傳導性亦是重要的。詳細而言,離子傳導膠體G的黏度可影響其流動性、黏滯性及其中離鹽的分散性,若離子傳導膠體G的黏度過高,可能導致離子傳導膠體G的流動性過低且黏滯性過高,易累積成團於噴塗機M的噴頭處,且不易於承載面(例如,變色還原層120的表面121)延展開來,來不及在動態的卷對卷製程中的壓合步驟前均勻分散開來,導致最終所形成的固態電解質層150無法具有均勻的厚度,進而影響固態電解質層150的離子傳導性,另易導致離子傳導膠體G中的鋰鹽分散不均,容易聚集成團或沉積;而若離子傳導膠體G的黏度過低,則可能導致離子傳導膠體G的流動性過高且黏滯性過低,在動態的卷對卷製程中不利於穩定地配置於承載面(例如,變色還原層120的表面121),亦不適合作為具有一定黏合性的膠體。基於上述,本揭露在卷對卷製程的加工溫度範圍內(介於15℃至70℃之間)可將離子傳導膠體G的黏度控制在介於200cps至10000cps之間的範圍中,以利於離子傳導膠體G在卷對卷製程中的整體塗佈性。在較佳的實施方式中,可進一步在介於25℃至40℃之間的加工範圍內,將離子傳導膠體G的黏度控制在介於250cps至500cps之間的範圍中,進而較佳實現上述功效,並能夠較為穩定地維持成卷之電致變色薄膜1000整體的品質。補充說明的是,離子傳導膠體G的黏度是使用BROOKFIELD(型號:DV-E)的黏度計進行量測而得。在一些實施方式中,可使用恆溫槽(圖未示)盛裝待塗佈的離子傳導膠體G,以確保離子傳導膠體G維持在塗佈期間具有合適的黏度。換句話說,可將恆溫槽的溫度控制在介於15℃至70℃之間,較佳為控制在介於25℃至40℃之間。On the other hand, the viscosity of the ion conductive gel G is important for whether the solid electrolyte layer 150 can be stably disposed in the
在一些實施方式中,在步驟S13中,亦可選擇將離子傳導膠體G形成於連續供應之變色氧化層140背對於第二導電膜材130的表面141。換句話說,離子傳導膠體G可依照實際製程條件選擇性地形成於連續供應之變色還原層120的表面121,或者形成於連續供應之變色氧化層140的表面141。In some embodiments, in step S13, the ion conductive colloid G can also be selectively formed on the surface 141 of the continuously supplied color-changing oxide layer 140 opposite to the second conductive film material 130. In other words, the ion conductive colloid G can be selectively formed on the surface 121 of the continuously supplied color-changing reduction layer 120, or on the surface 141 of the continuously supplied color-changing oxide layer 140 according to actual process conditions.
接著,在步驟S14中,將設置有變色氧化層140的第二導電膜材130壓合至連續供應且已配置於變色還原層120之表面121的離子傳導膠體G上,使變色氧化層140位於第二導電膜材130與離子傳導膠體G之間。詳細而言,設置有變色氧化層140的第二導電膜材130可透過第二輸送輪R2的轉動在卷對卷製程中進行輸送,以將設置有變色氧化層140的第二導電膜材130輸送至第一壓合輪P1與第二壓合輪P2之間,且於此同時,設置有離子傳導膠體G及變色還原層120的第一導電膜材110可透過第一輸送輪R1的轉動而輸送至第一壓合輪P1與第二壓合輪P2之間,其中第一壓合輪P1與第二壓合輪P2配置以將設置有變色氧化層140的第二導電膜材130壓合至連續供應的離子傳導膠體G上,且第一壓合輪P1與第二壓合輪P2具有相反的轉動方向(例如,第一壓合輪P1為順時針方向轉動,而第二壓合輪P2為逆時針方向轉動)。Next, in step S14, the second conductive film material 130 provided with the color-changing oxide layer 140 is pressed onto the ion-conducting colloid G which is continuously supplied and arranged on the surface 121 of the color-changing reduction layer 120, so that the color-changing oxide layer 140 is located between the second conductive film material 130 and the ion-conducting colloid G. Specifically, the second conductive film material 130 provided with the color-changing oxide layer 140 can be transported in the roll-to-roll process by the rotation of the second conveying wheel R2, so as to transport the second conductive film material 130 provided with the color-changing oxide layer 140 to between the first pressing wheel P1 and the second pressing wheel P2, and at the same time, the first conductive film material 110 provided with the ion conductive gel G and the color-changing reduction layer 120 can be transported by the rotation of the first conveying wheel R1. The first pressing wheel P1 and the second pressing wheel P2 are configured to press the second conductive film material 130 provided with the color-changing oxide layer 140 onto the continuously supplied ion-conductive gel G, and the first pressing wheel P1 and the second pressing wheel P2 have opposite rotation directions (for example, the first pressing wheel P1 rotates clockwise, and the second pressing wheel P2 rotates counterclockwise).
在一些實施方式中,第一壓合輪P1與第二壓合輪P2之間的間距d可介於100微米至500微米之間,亦即間距d可為本揭露所預計得到之電致變色薄膜1000(或膜狀疊層100)的整體厚度的85%至105%,進而提供良好的壓合強度。詳細而言,若第一壓合輪P1與第二壓合輪P2之間的間距d小於100微米(亦即,小於電致變色薄膜1000或膜狀疊層100的整體厚度的85%),可能導致滲膠,進而恐影響離子傳導膠體G的配置狀態;而若第一壓合輪P1與第二壓合輪P2之間的間距d大於500微米(亦即,大於電致變色薄膜1000或膜狀疊層100的整體厚度的105%),可能導致各層無法緊密地黏合,進而影響電致變色薄膜1000的結構穩定性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2的轉速比可介於1.5:1.0至1.0:1.5之間(例如,1:1),進而控制各層的張力使最終所形成的電致變色薄膜1000具有良好的平整性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2各自的輪溫度可介於15℃至70℃之間,且較佳可介於25℃至40℃之間,以確保離子傳導膠體G在輸送過程中仍具有良好的流平性。在一些實施方式中,第一壓合輪P1與第二壓合輪P2可分別受不同且獨立運作的馬達來驅動。In some embodiments, the distance d between the first pressing wheel P1 and the second pressing wheel P2 may be between 100 μm and 500 μm, that is, the distance d may be 85% to 105% of the overall thickness of the electrochromic film 1000 (or film-like laminate 100) expected to be obtained in the present disclosure, thereby providing good pressing strength. Specifically, if the distance d between the first pressing wheel P1 and the second pressing wheel P2 is less than 100 microns (i.e., less than 85% of the overall thickness of the
隨後,在步驟S15中,將離子傳導膠體G固化以形成固態電解質層150。詳細而言,在各層(第一導電膜材110、變色還原層120、離子傳導膠體G、變色氧化層140及第二導電膜材130)受到第一壓合輪P1與第二壓合輪P2的壓合後,各層可經過一紫外光源U,使各層在卷對卷製程的輸送期間受到紫外光照射。換句話說,可使用紫外光照射夾置於變色還原層120及變色氧化層140之間的離子傳導膠體G,使離子傳導膠體G固化而形成固態電解質層150,並將變色還原層120及變色氧化層140緊密且穩固地黏合。如前所述,本揭露選用可在特定的紫外光波長範圍內迅速固化的丙烯酸系樹脂作為紫外光固化膠,且該特定的紫外光波長範圍可避免傷及電致變色薄膜1000中的其他層別。具體而言,紫外光的波長可介於365奈米至395奈米之間。由於此波長範圍窄,因此可提供較為集中的能量,使離子傳導膠體G在卷對卷製程中即便需快速地通過紫外光源U(例如,以1公尺/分鐘至20公尺/分鐘的輸送速度通過紫外光源U),仍能夠徹底地被固化。在一些實施方式中,紫外光照射範圍的長度(與輸送方向平行的長度)可介於1公尺至3公尺之間,而寬度(與輸送方向垂直的寬度,幅寬)可介於300毫米至1600毫米之間,以確保所有的離子傳導膠體G皆確實受到紫外光的照射而固化而形成固態電解質層150。Then, in step S15, the ion conductive gel G is cured to form a solid electrolyte layer 150. Specifically, after each layer (the first conductive film material 110, the color-changing reduction layer 120, the ion conductive gel G, the color-changing oxide layer 140, and the second conductive film material 130) is pressed by the first pressing wheel P1 and the second pressing wheel P2, each layer can pass through an ultraviolet light source U so that each layer is irradiated with ultraviolet light during the transport of the roll-to-roll process. In other words, ultraviolet light can be used to irradiate the ion conductive gel G sandwiched between the color-changing reduction layer 120 and the color-changing oxidation layer 140, so that the ion conductive gel G is cured to form a solid electrolyte layer 150, and the color-changing reduction layer 120 and the color-changing oxidation layer 140 are tightly and firmly bonded. As mentioned above, the present disclosure uses an acrylic resin that can be quickly cured within a specific ultraviolet light wavelength range as the ultraviolet light curing glue, and the specific ultraviolet light wavelength range can avoid damaging other layers in the
在至少進行上述步驟S11至S15後,可收卷以形成膜狀疊層100。在一些實施方式中,可進一步對成卷的膜狀疊層100進行裁切步驟,以根據實際應用需求形成預期尺寸及形狀的電致變色薄膜1000。請同時參閱第3A圖及第3B圖,經裁切後的膜狀疊層100包括第一導電膜材110、變色還原層120、固態電解質層150、變色氧化層140以及第二導電膜材130。變色還原層120配置於第一導電膜材110上,固態電解質層150配置於變色還原層120上,變色氧化層140配置於固態電解質層150上,且第二導電膜材130配置於變色氧化層140上。在膜狀疊層100中,變色還原層120被設定為在電致變色薄膜1000經歷電場改變時與變色氧化層140產生氧化還原反應,變色還原層120中的離子移動至變色氧化層140時,變色還原層120產生顏色變化,而變色氧化層140則因接受變色還原層120中的離子而進行氧化反應,並同樣產生顏色變化。舉例而言,變色氧化層140中含有氧化鎢,而電致變色薄膜1000的電場未被改變時,變色氧化層140呈現透明,當電致變色薄膜1000的電場被改變時,變色氧化層140轉為藍色,使得電致變色薄膜1000的透光性有所變化。After at least performing the above steps S11 to S15, the film-
值得說明的是,經裁切步驟而形成的膜狀疊層100中的各層具有實質上齊平的側壁S,且經由固態電解質層150的設置,本揭露的膜狀疊層100及後續形成的電致變色薄膜1000皆不需額外在其側壁S設置框膠(框架)來防止固態電解質層150中的離子傳導物質流出,且經由上述卷對卷製程的設計,變色還原層120及變色氧化層140可彼此緊密黏合,因此亦不需額外在膜狀疊層100及後續形成的電致變色薄膜1000的側壁S設置框膠(框架)來防止變色還原層120及變色氧化層140剝離。換句話說,本揭露最終形成的電致變色薄膜1000不具有設置於第一導電膜材110、變色還原層120、固態電解質層150、變色氧化層140以及第二導電膜材130各自之至少一側並接觸至少該側的框膠,因此電致變色薄膜1000的側壁S是裸露於外界環境中。詳細而言,傳統電致變色元件所使用之框膠的材料通常可包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合(例如,液晶滴入式封裝製程(One Drop Filling,ODF)製程用框膠材料、Seal 框膠(製造商:積水化學、三井化學、協立協立及日本化藥)),而本揭露的電致變色薄膜1000不具有包括上述材料的框膠。It is worth noting that each layer in the film-
在一些實施方式中,膜狀疊層100還可進一步包括硬化層160。硬化層160可保護其 於層別免於受到刮傷或磨損,延長電致變色薄膜1000的使用壽命。在一些實施方式中,硬化層160的材料可包括樹脂混合物,確保膜狀疊層100具有可撓性及輕薄性。在一些實施方式中,硬化層160的疊設亦可整合製卷對卷製程中,進而利於提升製程便利性及產能。In some embodiments, the film-
隨後,請參閱第4A圖,在步驟S20中,進行切割步驟,包括將膜狀疊層100之第一側S1的第二導電膜材130、變色氧化層140及固態電解質層150切除,使第一側S1的變色還原層120裸露出來。詳細而言,可在進行切割步驟前先預留出電極欲設置的區域(電極區域),並透過切割步驟將位於電極區域中的第二導電膜材130、變色氧化層140、固態電解質層150以及接觸第二導電膜材130之表面的硬化層160切除。在一些實施方式中,切割步驟可透過使用CO
2雷射機、沖壓成型機、調光膜電極刀等的切割器材(手段)來進行。在一些實施方式中,可在將膜狀疊層100裁切為合適尺寸前(進行裁切步驟之前)對膜狀疊層100進行電極區域的切割步驟,例如將切割步驟整合至卷對卷製程中,並透過輸送輪的轉動而在卷對卷製程中輸送膜狀疊層100,使膜狀疊層100不間斷地供應至切割器處以進行切割,以提升切割步驟進行的速率。在切除位於電極區域的第二導電膜材130、變色氧化層140、固態電解質層150及接觸第二導電膜材130之表面的硬化層160後,位於電極區域的變色還原層120可裸露出來,並且變色還原層120及第一導電膜材110各自的側壁會凸出於第二導電膜材130、變色氧化層140及固態電解質層150各自的側壁。在一些實施方式中,切割步驟無法完整切除位於電極區域的固態電解質層150,例如切割步驟可能僅減薄固態電解質層150的厚度H5,或切除部分的固態電解質層150使位於電極區域之部分的變色還原層120裸露出來。
Then, please refer to FIG. 4A , in step S20, a cutting step is performed, including removing the second conductive film material 130, the color-changing oxide layer 140, and the solid electrolyte layer 150 on the first side S1 of the film-
此外,在步驟S20中,進行切割步驟更包括將膜狀疊層100之第二側S2的第一導電膜材110、變色還原層120、固態電解質層150及接觸第一導電膜材110之表面的硬化層160切除,使第二側S2的變色氧化層140裸露出來。詳細而言,可在進行切割步驟前,先預留出電極欲設置的區域(電極區域),並透過切割步驟將位於電極區域中的第一導電膜材110、變色還原層120、固態電解質層150切除以及接觸第一導電膜材110之表面的硬化層160。具體切除方式如前段所述,於此便不再贅述。在切除位於電極區域的第一導電膜材110、變色還原層120及固態電解質層150後,位於電極區域的變色氧化層140可裸露出來,且變色氧化層140及第二導電膜材130各自的側壁會凸出於第一導電膜材110、變色還原層120及固態電解質層150各自的側壁。在一些實施方式中,切割步驟無法完整切除位於電極區域的固態電解質層150,例如切割步驟可能僅減薄固態電解質層150的厚度H5,或切除部分的固態電解質層150使位於電極區域之部分的變色氧化層140裸露出來。在完成此步驟後,便可在膜狀疊層100的第一側S1及第二側S2分別定義出第一電極區域A1及第二電極區域A2,以預備於後續製程中設置正電極及負電極。In addition, in step S20, the cutting step further includes removing the first conductive film material 110, the color-changing reduction layer 120, the solid electrolyte layer 150 and the hardening layer 160 contacting the surface of the first conductive film material 110 on the second side S2 of the film-
接著,請參閱第4B圖,在步驟S30中,進行清除步驟,包括分別使用第一溶液及第二溶液將裸露出的變色還原層120及變色氧化層140清除。針對變色還原層120而言,當變色還原層120的材料包括氧化鎢時,所使用的第一溶液可包括氫氧化鈉、過氧化氫及水。更詳細而言,氫氧化鈉可與氧化鎢反應,使氧化鎢由第一導電膜材110的氧化銦錫導電薄膜117的表面118脫落,而過氧化氫可維持穩定的蝕刻(清除)速率,並且水可適當地調整氧化鈉及過氧化氫的濃度,並有助於將反應完畢的殘留物帶離。在一些實施方式中,在第一溶液中,氫氧化鈉的含量介於15重量份至40重量份之間(較佳可介於25重量份至35重量份之間),且過氧化氫的含量介於2重量份至10重量份之間(較佳可介於4重量份至8重量份之間),以達到優異的清除效果。詳細而言,若氫氧化鈉的含量(比例)過高,而過氧化氫的含量(比例)過低,可能導致氫氧化鈉殘留於氧化銦錫導電薄膜117的表面118,而導致清除的時間增加,並可能在反應期間因過氧化氫消耗完畢而使蝕刻速率降低;若氫氧化鈉的含量過低,而過氧化氫的含量過高,可能導致氧化鎢反應不完全而無法被徹底清除,並可能因氫氧化鈉在反應期間不斷消耗而造成過氧化氫過剩進而導致第一溶液的酸鹼值(pH值)受到影響(下降),影響清除效果。換句話說,藉由氫氧化鈉、過氧化氫以及水的協同作用,變色還原層120的材料可在短時間內被徹底地去除,使位於被去除之變色還原層120下方的第一導電膜材110裸露出來。Next, referring to FIG. 4B , in step S30, a cleaning step is performed, including using a first solution and a second solution to clean the exposed color-changing reduction layer 120 and the color-changing oxidation layer 140. For the color-changing reduction layer 120, when the material of the color-changing reduction layer 120 includes tungsten oxide, the first solution used may include sodium hydroxide, hydrogen peroxide and water. In more detail, sodium hydroxide can react with tungsten oxide, so that tungsten oxide falls off from the surface 118 of the indium tin oxide conductive film 117 of the first conductive film material 110, and hydrogen peroxide can maintain a stable etching (removal) rate, and water can properly adjust the concentration of sodium oxide and hydrogen peroxide, and help to take away the residues after the reaction is completed. In some embodiments, in the first solution, the content of sodium hydroxide is between 15 parts by weight and 40 parts by weight (preferably between 25 parts by weight and 35 parts by weight), and the content of hydrogen peroxide is between 2 parts by weight and 10 parts by weight (preferably between 4 parts by weight and 8 parts by weight) to achieve an excellent removal effect. In detail, if the content (ratio) of sodium hydroxide is too high and the content (ratio) of hydrogen peroxide is too low, sodium hydroxide may remain on the surface 118 of the indium tin oxide conductive film 117, resulting in an increase in the cleaning time, and the etching rate may be reduced due to the complete consumption of hydrogen peroxide during the reaction period; if the content of sodium hydroxide is too low and the content of hydrogen peroxide is too high, the tungsten oxide may not react completely and cannot be completely removed, and the sodium hydroxide may be continuously consumed during the reaction period, resulting in excess hydrogen peroxide, which may affect (decrease) the pH value of the first solution and affect the cleaning effect. In other words, through the synergistic effect of sodium hydroxide, hydrogen peroxide and water, the material of the color-changing reduction layer 120 can be completely removed in a short time, so that the first conductive film material 110 located under the removed color-changing reduction layer 120 is exposed.
在一些實施方式中,在使用第一溶液進行清除之前或期間,可將第一溶液的pH值調整(維持)至介於8.0至10.0之間,以在蝕刻期間使氫氧化鈉、過氧化氫及水彼此穩定地協同以維持第一溶液的反應性及反應速率。在一些實施方式中,可在使用第一溶液進行清除步驟後,使用75%的乙醇清潔第一導電膜材110的表面111,以確保所有殘留物皆脫離第一導電膜材110的表面111。在一些實施方式中,若位於第一電極區域A1中的固態電解質層150在前一步驟(切割步驟)未完全被去除,則可在進行清除步驟之前,使用丙酮或75%的乙醇先將固態電解質層150徹底去除,以提升第一溶液與變色還原層120的反應效果。換句話說,在本揭露中,由離子傳導膠體G所形成的固態電解質層150可由丙酮或75%的乙醇簡單去除,提升清除步驟的簡便性。在一些實施方式中,可使用擦拭的方式進行清除步驟,例如使用第一溶液在位於第一電極區域A1中之變色還原層120的表面121來回擦拭多次(例如,5~20次),以達到優異的清除效果。由此可見,本揭露所使用的第一溶液可快速且簡單地清除變色還原層120。本揭露可透過使用四點探針來確認第一導電膜材110的阻值低於500Ω,以確認位於第一電極區域A1中的變色還原層120被徹底地清除。In some embodiments, before or during the cleaning step using the first solution, the pH value of the first solution may be adjusted (maintained) to between 8.0 and 10.0, so that sodium hydroxide, hydrogen peroxide, and water can be stably coordinated with each other during etching to maintain the reactivity and reaction rate of the first solution. In some embodiments, after the cleaning step using the first solution, the surface 111 of the first conductive film material 110 may be cleaned with 75% ethanol to ensure that all residues are removed from the surface 111 of the first conductive film material 110. In some embodiments, if the solid electrolyte layer 150 in the first electrode region A1 is not completely removed in the previous step (cutting step), the solid electrolyte layer 150 can be completely removed using acetone or 75% ethanol before the cleaning step to enhance the reaction effect between the first solution and the color-changing reduction layer 120. In other words, in the present disclosure, the solid electrolyte layer 150 formed by the ion-conducting colloid G can be simply removed by acetone or 75% ethanol, thereby enhancing the simplicity of the cleaning step. In some embodiments, the cleaning step can be performed by wiping, for example, using the first solution to wipe back and forth multiple times (e.g., 5 to 20 times) on the surface 121 of the color-changing reduction layer 120 in the first electrode region A1 to achieve an excellent cleaning effect. It can be seen that the first solution used in the present disclosure can quickly and easily remove the color-changing reduction layer 120. The present disclosure can confirm that the resistance of the first conductive film 110 is lower than 500Ω by using a four-point probe to confirm that the color-changing reduction layer 120 located in the first electrode area A1 is completely removed.
另一方面,在步驟S30中,針對變色氧化層140而言,當變色氧化層140的材料包括氧化鎳時,所使用的第二溶液可包括硝酸、檸檬酸、過氧化氫及水。更詳細而言,硝酸可與氧化鎳反應,使氧化鎳由第二導電膜材130的氧化銦錫導電薄膜137的表面138脫落,檸檬酸可提升蝕刻(清除)速率,而過氧化氫可維持穩定的蝕刻速率,且水可適當地調整硝酸、檸檬酸及過氧化氫的濃度,並有助於將反應完畢的殘留物帶離。在一些實施方式中,在第二溶液中,硝酸的含量介於15重量份至40重量份之間(較佳可介於30重量份至40重量份之間),檸檬酸的含量介於0.5重量份至10重量份之間(較佳可介於4重量份至6重量份之間),且過氧化氫的含量介於1重量份至10重量份之間(較佳可介於3重量份至8重量份之間),以達到優異的清除效果。詳細而言,若硝酸的含量(比例)過高,易導致硝酸殘留於氧化銦錫導電薄膜117的表面118,而導致清除的時間增加,而若硝酸的含量過低,則可能導致氧化鎳反應不完全而無法被徹底地清除;若檸檬酸的含量(比例)過高,可能導致蝕刻速率過高,容易侵蝕氧化銦錫導電薄膜117的表面118,而導致氧化銦錫導電薄膜117溶解或剝落,而若檸檬酸的含量過低,則可能導致蝕刻速率降低;若過氧化氫的含量(比例)過低,可能在反應期間因過氧化氫不足而導致蝕刻速率降低,而若過氧化氫的含量過高,可能因氫氧化鈉在反應期間不斷消耗而造成過氧化氫過剩而導致第二溶液的酸鹼值(pH值)受到影響,影響清除效果。換句話說,藉由硝酸、檸檬酸、過氧化氫及水的協同作用,變色氧化層140的材料可在短時間內被徹底地去除,使位於被去除之變色氧化層140下方的第二導電膜材130裸露出來。On the other hand, in step S30, for the color-changing oxide layer 140, when the material of the color-changing oxide layer 140 includes nickel oxide, the second solution used may include nitric acid, citric acid, hydrogen peroxide and water. In more detail, nitric acid can react with nickel oxide to cause nickel oxide to fall off from the surface 138 of the indium tin oxide conductive film 137 of the second conductive film material 130, citric acid can increase the etching (removal) rate, and hydrogen peroxide can maintain a stable etching rate, and water can appropriately adjust the concentrations of nitric acid, citric acid and hydrogen peroxide, and help to take away the residues after the reaction is completed. In some embodiments, in the second solution, the content of nitric acid is between 15 parts by weight and 40 parts by weight (preferably between 30 parts by weight and 40 parts by weight), the content of citric acid is between 0.5 parts by weight and 10 parts by weight (preferably between 4 parts by weight and 6 parts by weight), and the content of hydrogen peroxide is between 1 part by weight and 10 parts by weight (preferably between 3 parts by weight and 8 parts by weight) to achieve excellent cleaning effect. In detail, if the content (ratio) of nitric acid is too high, nitric acid residues may remain on the surface 118 of the indium tin oxide conductive film 117, which may increase the cleaning time. If the content of nitric acid is too low, nickel oxide may not react completely and cannot be completely removed. If the content (ratio) of citric acid is too high, the etching rate may be too high, which may easily erode the surface 118 of the indium tin oxide conductive film 117, resulting in indium oxide. The tin conductive film 117 is dissolved or peeled off, and if the content of citric acid is too low, the etching rate may be reduced; if the content (ratio) of hydrogen peroxide is too low, the etching rate may be reduced due to insufficient hydrogen peroxide during the reaction period, and if the content of hydrogen peroxide is too high, the sodium hydroxide may be continuously consumed during the reaction period, resulting in excess hydrogen peroxide, which may affect the pH value of the second solution and affect the cleaning effect. In other words, through the synergistic effect of nitric acid, citric acid, hydrogen peroxide and water, the material of the color-changing oxide layer 140 can be completely removed in a short time, so that the second conductive film material 130 located below the removed color-changing oxide layer 140 is exposed.
在一些實施方式中,在使用第二溶液進行清除之前或期間,可將第二溶液的pH值調整(維持)至介於1.0至3.0之間,以在蝕刻期間使硝酸、檸檬酸、過氧化氫及水彼此穩定地協同以維持第二溶液的反應性及反應速率。在一些實施方式中,可在使用第二溶液進行清除步驟後,使用75%的乙醇清潔第二導電膜材130的表面131,以確保所有殘留物皆脫離第二導電膜材130的表面131。在一些實施方式中,若位於第二電極區域A2中的固態電解質層150在前一步驟(切割步驟)未完全被去除,則可在進行清除步驟之前,使用丙酮或75%的乙醇先將固態電解質層150徹底去除,以提升第二溶液與變色氧化層140的反應效果。在一些實施方式中,可使用擦拭的方式進行清除步驟,例如使用第二溶液在位於第二電極區域A2之變色氧化層140的表面141來回擦拭多次(例如,5~20次),以達到優異的清除效果。由此可見,本揭露使用的第二溶液可快速且簡單地清除變色氧化層140。本揭露可透過使用四點探針來確認第二導電膜材130的阻值低於500Ω,以確認位於第二電極區域A2中的變色氧化層140被徹底地清除。In some embodiments, before or during the cleaning step using the second solution, the pH value of the second solution may be adjusted (maintained) to be between 1.0 and 3.0, so that nitric acid, citric acid, hydrogen peroxide, and water can be stably coordinated with each other during etching to maintain the reactivity and reaction rate of the second solution. In some embodiments, after the cleaning step using the second solution, the surface 131 of the second conductive film material 130 may be cleaned with 75% ethanol to ensure that all residues are removed from the surface 131 of the second conductive film material 130. In some embodiments, if the solid electrolyte layer 150 in the second electrode region A2 is not completely removed in the previous step (cutting step), the solid electrolyte layer 150 may be completely removed using acetone or 75% ethanol before the cleaning step to enhance the reaction effect between the second solution and the color-changing oxide layer 140. In some embodiments, the cleaning step may be performed by wiping, for example, using the second solution to wipe back and forth multiple times (e.g., 5 to 20 times) on the surface 141 of the color-changing oxide layer 140 in the second electrode region A2 to achieve an excellent cleaning effect. It can be seen that the second solution used in the present disclosure can quickly and easily remove the color-changing oxide layer 140. The present disclosure can confirm that the resistance of the second conductive film 130 is lower than 500Ω by using a four-point probe to confirm that the color-changing oxide layer 140 in the second electrode region A2 is completely removed.
應瞭解到,前述位於膜狀疊層100之第一側S1及第二側S2的第一電極區域A1及第二電極區域A2在位置的配置上可因應膜狀疊層100被裁切的形狀(即電致變色薄膜1000最終的形狀)而設置。舉例而言,請先參閱第5A至第5C圖,其繪示根據本揭露一些實施方式之電致變色薄膜1000在製程期間(切割步驟及清除步驟)於不同實施方式中的上視示意圖。第5A圖的實施方式顯示電致變色薄膜1000具有矩形的形狀,且第一電極區域A1及第二電極區域A2是分別位於電致變色薄膜1000的相對兩側。第5B圖的實施方式顯示電致變色薄膜1000具有正方形的形狀,且第一電極區域A1及第二電極區域A2是彼此相鄰並各自具有「L」型的形狀。第5C圖的實施方式顯示電致變色薄膜1000具有類橢圓形的形狀,且第一電極區域A1及第二電極區域A2是分別位於電致變色薄膜1000的相對兩側並各自具有「U」型的形狀。簡而言之,第一電極區域A1及第二電極區域A2可具有各種可能的配置方式及形狀,並不以本揭露的實施方式為限。It should be understood that the first electrode region A1 and the second electrode region A2 located on the first side S1 and the second side S2 of the film-
隨後,請參閱第4C圖,在步驟S40中,進行塗佈步驟,包括在裸露出的第一導電膜材110的表面111形成第一電極E1,並在裸露出的第二導電膜材130的表面131形成第二電極E2。具體而言,第一電極E1及第二電極E2可分別為電致變色薄膜1000的正、負電極,且第一電極E1及第二電極E2的可例如是導電銀膠、軟性電路板(Flexible Printed Circuit,FPC)或導電銅箔。經塗佈所形成的第一電極E1可相鄰於變色還原層120,且與變色還原層120之間具有間隙SP;而經塗佈所形成的第二電極E2可相鄰於變色氧化層140,且與變色氧化層140之間具有間隙SP。在一些實施方式中,可經多次塗佈而使第一電極E1的厚度H6增加,使第一電極E1進一步相鄰於固態電解質層150及變色氧化層140各自的側壁,並可經多次塗佈而使第二電極E2的厚度H7增加,使第二電極E2進一步相鄰於固態電解質層150及變色還原層120各自的側壁。如此可確保第一電極E1及第二電極E2具有高的材料緻密性,進而降低電性失效的機率。在一些實施方式中,可使第一電極E1的頂面E1T低於第二導電膜材130的表面131,並可使第二電極E2的頂面E2T低於第一導電膜材110的表面111,以確保第一電極E1與第二電極E2之間不產生電性連接。Subsequently, referring to FIG. 4C , in step S40, a coating step is performed, including forming a first electrode E1 on the surface 111 of the exposed first conductive film material 110, and forming a second electrode E2 on the surface 131 of the exposed second conductive film material 130. Specifically, the first electrode E1 and the second electrode E2 can be the positive and negative electrodes of the
接著,請繼續參閱第4C圖,電致變色薄膜1000的製造方法可更包括步驟S50。在步驟S50中,可在間隙SP中形成封邊結構170。更詳細而言,位於第一電極區域A1中的封邊結構170可將間隙SP填滿並延伸於變色還原層120、固態電解質層150、變色氧化層140、第二導電膜材130及硬化層160各自的側壁,以降低水氣、灰塵等環境因子侵入電致變色薄膜1000中的機率;同樣地,位於第二電極區域A2中的封邊結構170可將間隙SP填滿並延伸於變色氧化層140、固態電解質層150、變色還原層120、第一導電膜材110及硬化層160各自的側壁,以降低水氣、灰塵等環境因子侵入電致變色薄膜1000中的機率。在一些實施方式中,封邊結構170可進一步延伸於並且覆蓋及接觸第一電極E1的頂面E1T及第二電極E2的頂面E2T,且不凸出於第一電極E1及第二電極E2各自的外側壁,以提升封邊結構170的結構穩固性。在一些實施方式中,封邊結構170可具有一弧形側壁C,以承受彎曲應力。在一些實施方式中,封邊結構170的材料可包括壓克力樹脂(Acrylic Resin)、環氧樹脂(Epoxy)或其組合,以具備良好的阻隔性。在一些實施方式中,可使用塗佈的方式形成封邊結構170,所使用的漿料可用波長為365nm至395nm的紫外光照射,所需的時間為30秒至60秒下固化,如此不會傷及電致變色薄膜1000中的其他層別,且具有製程便利性。希望強調的是,本揭露的封邊結構170的設置並非為了防止其中的電解質流出,更詳細而言,由於本揭露所使用的電解質係固態電解質,因此即使不設置封邊結構170,亦不會產生電解質外漏或流出的狀況。Next, please continue to refer to FIG. 4C , the manufacturing method of the
根據本揭露上述實施方式,本揭露不僅僅將傳統以玻璃基板等硬質材作為基礎層板之板材狀的電致變色元件改良而形成電致變色薄膜,更透過具體的製程改良,將電致變色薄膜的製造過程整合至卷對卷(roll to roll)製程中。如此一來,可得到成卷且膜狀的電致變色薄膜而非傳統以玻璃基板等硬質材作為基礎層板之板材(片材)狀的電致變色元件。因此,電致變色薄膜可直接根據後端的設計而裁切為合適的形狀及尺寸,使整個電致變色薄膜的製造方法不會受限於電致變色薄膜於應用時的最終形狀、尺寸及彎曲弧度。另一方面,透過卷對卷製程形成電致變色薄膜不僅可提高生產效率及良率、避免廢氣或廢液排放、提高儲存及運送的便利性,且相較於傳統的玻璃製程可在較小的生產基地生產,大幅提升製程便利性且產能不會受到限制。此外,成卷的電致變色薄膜可於裁切後透過本揭露特殊的製程方式(清潔溶液/方式)來在短時間內徹底去除殘留的變色氧化/還原層,不僅有利於將電極穩固地形成於電致變色薄膜中,還可大幅提升製程便利性。另外,以本揭露之製造方法製備而成的電致變色薄膜可省去框膠(框架)的配置,也就是說,不需額外引入框膠來避免電致變色薄膜中的電解液外漏,進而大幅提升電致變色薄膜的應用性以及安裝便利性,使電致變色薄膜可應用於多種領域。According to the above-mentioned implementation method of the present disclosure, the present disclosure not only improves the traditional plate-shaped electrochromic element with a hard material such as a glass substrate as a base layer to form an electrochromic film, but also integrates the manufacturing process of the electrochromic film into a roll-to-roll process through specific process improvements. In this way, a rolled and film-shaped electrochromic film can be obtained instead of the traditional plate-shaped (sheet) electrochromic element with a hard material such as a glass substrate as a base layer. Therefore, the electrochromic film can be directly cut into a suitable shape and size according to the design of the back end, so that the entire electrochromic film manufacturing method will not be limited by the final shape, size and curvature of the electrochromic film when it is used. On the other hand, the formation of electrochromic film through roll-to-roll process can not only improve production efficiency and yield, avoid exhaust gas or waste liquid emission, and improve storage and transportation convenience, but also can be produced in a smaller production base compared to the traditional glass process, greatly improving the process convenience and not limiting the production capacity. In addition, the rolled electrochromic film can be cut and the residual color-changing oxidation/reduction layer can be completely removed in a short time through the special process method (cleaning solution/method) disclosed in the present invention, which is not only conducive to the stable formation of electrodes in the electrochromic film, but also greatly improves the process convenience. In addition, the electrochromic film prepared by the manufacturing method disclosed herein can omit the configuration of a frame glue (frame), that is, there is no need to introduce additional frame glue to prevent the electrolyte in the electrochromic film from leaking out, thereby greatly improving the applicability and installation convenience of the electrochromic film, so that the electrochromic film can be applied to a variety of fields.
雖然本揭露已以實施方式揭露如上,然其並非用以限定本揭露,任何熟習此技藝者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。Although the present disclosure has been disclosed in the above implementation form, it is not intended to limit the present disclosure. Anyone skilled in the art can make various changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be determined by the scope of the attached patent application.
1000:電致變色薄膜 100:膜狀疊層 110:第一導電膜材 111:表面 115:基材 116:表面 117:氧化銦錫導電薄膜 118:表面 120:變色還原層 121:表面 130:第二導電膜材 131:表面 135:基材 136:表面 137:氧化銦錫導電薄膜 138:表面 140:變色氧化層 141:表面 150:固態電解質層 160:硬化層 170:封邊結構 G:離子傳導膠體 M:噴塗機 P1:第一壓合輪 P2:第二壓合輪 R1:第一輸送輪 R2:第二輸送輪 H1,H2,H3,H4,H5,H6,H7:厚度 d:間距 S:側壁 S1:第一側 S2:第二側 A1:第一電極區域 A2:第二電極區域 E1:第一電極 E2:第二電極 E1T,E2T:頂面 SP:間隙 U:紫外光源 C:弧形側壁 S10~S40:步驟 A-A':線段 1000: electrochromic film 100: film-like laminate 110: first conductive film material 111: surface 115: substrate 116: surface 117: indium tin oxide conductive film 118: surface 120: color-changing reduction layer 121: surface 130: second conductive film material 131: surface 135: substrate 136: surface 137: indium tin oxide conductive film 138: surface 140: color-changing oxide layer 141: surface 150: solid electrolyte layer 160: hardening layer 170: edge sealing structure G: ion conductive colloid M: spray coating machine P1: first pressing wheel P2: Second pressing wheel R1: First conveyor wheel R2: Second conveyor wheel H1, H2, H3, H4, H5, H6, H7: Thickness d: Spacing S: Sidewall S1: First side S2: Second side A1: First electrode area A2: Second electrode area E1: First electrode E2: Second electrode E1T, E2T: Top surface SP: Gap U: UV light source C: Curved sidewall S10~S40: Steps A-A': Line segment
為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1圖繪示根據本揭露一些實施方式之電致變色薄膜的製造方法的流程圖; 第2圖繪示根據本揭露一些實施方式之膜狀疊層的製程示意圖; 第3A圖繪示根據本揭露一些實施方式之膜狀疊層的立體示意圖; 第3B圖繪示第3A圖之膜狀疊層沿線段A-A'截取的剖面示意圖; 第4A圖、第4B圖以及第4C圖繪示根據本揭露一些實施方式之電致變色薄膜在製程期間於不同步驟中的剖面示意圖;以及 第5A圖至5C圖繪示根據本揭露一些實施方式之電致變色薄膜在製程期間於不同實施方式中的上視示意圖。 In order to make the above and other purposes, features, advantages and embodiments of the present disclosure more clearly understandable, the attached drawings are described as follows: FIG. 1 is a flow chart of a method for manufacturing an electrochromic film according to some embodiments of the present disclosure; FIG. 2 is a schematic diagram of a process of a film-like stack according to some embodiments of the present disclosure; FIG. 3A is a three-dimensional schematic diagram of a film-like stack according to some embodiments of the present disclosure; FIG. 3B is a schematic diagram of a cross-section of the film-like stack along line segment A-A' of FIG. 3A; FIG. 4A, FIG. 4B and FIG. 4C are schematic diagrams of cross-sections of an electrochromic film according to some embodiments of the present disclosure at different stages during the process; and FIG. 5A to FIG. 5C are schematic diagrams of an electrochromic film according to some embodiments of the present disclosure in different embodiments during the process.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None
S10~S40:步驟 S10~S40: Steps
Claims (10)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111137391A TWI839877B (en) | 2022-09-30 | 2022-09-30 | Manufacturing method of electrochromic film |
JP2023167626A JP2024052602A (en) | 2022-09-30 | 2023-09-28 | Manufacturing method for electrochromic film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111137391A TWI839877B (en) | 2022-09-30 | 2022-09-30 | Manufacturing method of electrochromic film |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202416032A true TW202416032A (en) | 2024-04-16 |
TWI839877B TWI839877B (en) | 2024-04-21 |
Family
ID=90622502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111137391A TWI839877B (en) | 2022-09-30 | 2022-09-30 | Manufacturing method of electrochromic film |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2024052602A (en) |
TW (1) | TWI839877B (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1295169B1 (en) * | 2000-05-24 | 2008-06-25 | Schott North America, Inc. | Electrode for electrochromic devices |
KR102488802B1 (en) * | 2014-12-19 | 2023-01-13 | 뷰, 인크. | Mitigating defects in an electrochromic device under a bus bar |
KR102475733B1 (en) * | 2020-09-01 | 2022-12-08 | 에스케이씨 주식회사 | Electrochromic device |
TWM621122U (en) * | 2021-08-23 | 2021-12-11 | 昶曜科技股份有限公司 | Soft electrochromic film |
-
2022
- 2022-09-30 TW TW111137391A patent/TWI839877B/en active
-
2023
- 2023-09-28 JP JP2023167626A patent/JP2024052602A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2024052602A (en) | 2024-04-11 |
TWI839877B (en) | 2024-04-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3669363B2 (en) | Electrodeposition type display panel manufacturing method, electrodeposition type display panel, and electrodeposition type display device | |
TWI430005B (en) | Method for manufacturing electrochromic element | |
US5657150A (en) | Electrochromic edge isolation-interconnect system, process, and device for its manufacture | |
US5943113A (en) | Method of producing a liquid crystal display unit | |
WO2020056326A1 (en) | Method for fabricating solid state electrochromic device, solid state electrochromic device and its applications | |
WO2011093264A1 (en) | Method for producing electrophoretic display device | |
JP2022549081A (en) | Manufacturing method of flexible electrochromic element | |
JP2009169229A (en) | Electrochromic element and method of manufacturing the same | |
TWI839877B (en) | Manufacturing method of electrochromic film | |
TWI818753B (en) | Manufacturing method of electrochromic film | |
WO2009157244A1 (en) | Electrically conductive transparent substrate, method for production of electrically conductive transparent substrate, and electrochemical display element | |
CN110133934B (en) | Bistable electrochromic device and preparation method thereof | |
TWI828348B (en) | Electrochromic film and manufacturing method thereof | |
JP2008192469A (en) | Electrochemical cell and its manufacturing method | |
JP2013210529A (en) | Electrophoretic display device | |
JP2005242228A (en) | Dimming device and its manufacturing method | |
CN114637150B (en) | Electrochromic device | |
JP2005316180A (en) | Dimming device and method for manufacturing the same | |
JPS63262624A (en) | Electrochromic element | |
CN112499684B (en) | Multilayer WO based on ion repulsion action dispersion stripping 3 Method of nanosheet | |
JP4678075B2 (en) | Method for producing electrochemical display element | |
JP2001249365A (en) | Electrochromic mirror | |
JP4963199B2 (en) | Method for manufacturing photoelectric conversion device | |
KR20030067021A (en) | Passive matrix electorchromic display using electrochromic matrial and manufacturing method thereof | |
JP2000214493A (en) | Electrochromic device and its production |