TW202406869A - 玻璃、玻璃板及玻璃板之製造方法 - Google Patents
玻璃、玻璃板及玻璃板之製造方法 Download PDFInfo
- Publication number
- TW202406869A TW202406869A TW112116382A TW112116382A TW202406869A TW 202406869 A TW202406869 A TW 202406869A TW 112116382 A TW112116382 A TW 112116382A TW 112116382 A TW112116382 A TW 112116382A TW 202406869 A TW202406869 A TW 202406869A
- Authority
- TW
- Taiwan
- Prior art keywords
- less
- glass
- still
- abs
- mgo
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 562
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 144
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 47
- 229910018068 Li 2 O Inorganic materials 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims description 83
- 238000000034 method Methods 0.000 claims description 52
- 239000003513 alkali Substances 0.000 claims description 23
- 238000002844 melting Methods 0.000 claims description 22
- 230000008018 melting Effects 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 21
- 229910052708 sodium Inorganic materials 0.000 claims description 17
- 239000007864 aqueous solution Substances 0.000 claims description 14
- 238000004090 dissolution Methods 0.000 claims description 12
- 238000011156 evaluation Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 9
- 239000004615 ingredient Substances 0.000 claims description 5
- 238000006124 Pilkington process Methods 0.000 claims description 4
- 230000009477 glass transition Effects 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 28
- 239000002585 base Substances 0.000 description 45
- 238000004031 devitrification Methods 0.000 description 41
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 36
- 239000010410 layer Substances 0.000 description 24
- 239000002994 raw material Substances 0.000 description 22
- 238000001816 cooling Methods 0.000 description 21
- 230000000694 effects Effects 0.000 description 18
- 229910052697 platinum Inorganic materials 0.000 description 18
- 239000006060 molten glass Substances 0.000 description 16
- 230000006866 deterioration Effects 0.000 description 15
- 238000005191 phase separation Methods 0.000 description 14
- 238000010583 slow cooling Methods 0.000 description 14
- 239000005357 flat glass Substances 0.000 description 12
- 238000007654 immersion Methods 0.000 description 12
- 230000007547 defect Effects 0.000 description 11
- 238000002834 transmittance Methods 0.000 description 11
- 229910006404 SnO 2 Inorganic materials 0.000 description 10
- 239000004020 conductor Substances 0.000 description 10
- 238000000227 grinding Methods 0.000 description 10
- 238000005352 clarification Methods 0.000 description 9
- 230000007423 decrease Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 8
- 238000010828 elution Methods 0.000 description 8
- 238000004891 communication Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 229910010413 TiO 2 Inorganic materials 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 230000005484 gravity Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000010897 surface acoustic wave method Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 150000001342 alkaline earth metals Chemical class 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 238000005485 electric heating Methods 0.000 description 4
- 239000000156 glass melt Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000007872 degassing Methods 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 150000003606 tin compounds Chemical class 0.000 description 3
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 2
- 229910005793 GeO 2 Inorganic materials 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000694440 Colpidium aqueous Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 101100496858 Mus musculus Colec12 gene Proteins 0.000 description 1
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910000310 actinide oxide Inorganic materials 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000002222 fluorine compounds Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000009740 moulding (composite fabrication) Methods 0.000 description 1
- 239000002365 multiple layer Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B18/00—Shaping glass in contact with the surface of a liquid
- C03B18/02—Forming sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/16—Compositions for glass with special properties for dielectric glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022077216 | 2022-05-09 | ||
| JP2022-077216 | 2022-05-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202406869A true TW202406869A (zh) | 2024-02-16 |
Family
ID=88730467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112116382A TW202406869A (zh) | 2022-05-09 | 2023-05-03 | 玻璃、玻璃板及玻璃板之製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250034029A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP4524118A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JPWO2023219023A1 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20250006873A (cg-RX-API-DMAC7.html) |
| CN (1) | CN119156354A (cg-RX-API-DMAC7.html) |
| TW (1) | TW202406869A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2023219023A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120553999B (zh) * | 2025-04-30 | 2025-12-16 | 东莞市晶博光电股份有限公司 | 一种抗微裂纹防崩边强化玻璃的生产工艺 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5827643B2 (ja) * | 1979-07-13 | 1983-06-10 | 株式会社日立製作所 | 非直線抵抗体およびその製法 |
| US4605632A (en) * | 1984-10-24 | 1986-08-12 | Corning Glass Works | Glass for tungsten-halogen lamps |
| JPS61106437A (ja) * | 1984-10-26 | 1986-05-24 | Asahi Glass Co Ltd | 多孔質ガラス用組成物及び多孔質ガラスの製造法 |
| JPS622406A (ja) * | 1985-06-27 | 1987-01-08 | 松下電器産業株式会社 | 多層基板用絶縁ペ−スト |
| CA2288804C (en) * | 1997-05-13 | 2007-07-17 | Richter, Robin | Al2o3-containing, high-temperature resistant glass sliver with highly textile character, and products thereof |
| FR2957529B1 (fr) * | 2010-03-19 | 2012-04-06 | Saint Gobain Ct Recherches | Structure filtrante comprenant un materiau de bouchage ameliore |
| CN112759255A (zh) | 2016-09-13 | 2021-05-07 | Agc株式会社 | 高频器件用玻璃基板和高频器件用电路基板 |
| DE102018112069A1 (de) * | 2018-05-18 | 2019-11-21 | Schott Ag | Verwendung eines Flachglases in elektronischen Bauteilen |
| WO2020184175A1 (ja) * | 2019-03-08 | 2020-09-17 | 日本電気硝子株式会社 | ガラス板 |
| WO2022045226A1 (ja) * | 2020-08-27 | 2022-03-03 | Agc株式会社 | 無アルカリガラスおよびガラス板 |
| WO2022054694A1 (ja) * | 2020-09-08 | 2022-03-17 | 日本電気硝子株式会社 | ガラス及びそれを用いた誘電特性の測定方法 |
| JP7694015B2 (ja) | 2020-11-11 | 2025-06-18 | Toppanホールディングス株式会社 | 酸素バリア性積層フィルム |
| JP7885856B2 (ja) * | 2022-02-24 | 2026-07-07 | Agc株式会社 | 無アルカリガラスおよびガラス板 |
-
2023
- 2023-04-28 JP JP2024520417A patent/JPWO2023219023A1/ja active Pending
- 2023-04-28 CN CN202380037678.4A patent/CN119156354A/zh active Pending
- 2023-04-28 EP EP23803501.8A patent/EP4524118A4/en active Pending
- 2023-04-28 KR KR1020247036878A patent/KR20250006873A/ko active Pending
- 2023-04-28 WO PCT/JP2023/016980 patent/WO2023219023A1/ja not_active Ceased
- 2023-05-03 TW TW112116382A patent/TW202406869A/zh unknown
-
2024
- 2024-10-10 US US18/911,496 patent/US20250034029A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20250034029A1 (en) | 2025-01-30 |
| EP4524118A1 (en) | 2025-03-19 |
| EP4524118A4 (en) | 2026-05-27 |
| WO2023219023A1 (ja) | 2023-11-16 |
| JPWO2023219023A1 (cg-RX-API-DMAC7.html) | 2023-11-16 |
| KR20250006873A (ko) | 2025-01-13 |
| CN119156354A (zh) | 2024-12-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7694644B2 (ja) | 高周波デバイス用ガラス基板と高周波デバイス用回路基板 | |
| TWI806992B (zh) | 玻璃基板、液晶天線及高頻裝置 | |
| CN113661148B (zh) | 无碱玻璃和玻璃板 | |
| TWI841627B (zh) | 高頻裝置用玻璃基板、液晶天線及高頻裝置 | |
| US12428334B2 (en) | Alkali-free glass and glass plate | |
| TW202346224A (zh) | 無鹼玻璃及玻璃板 | |
| US20250034029A1 (en) | Glass, glass sheet, and method for producing glass sheet |