TW202348954A - Optical detecting system and operating method thereof - Google Patents

Optical detecting system and operating method thereof Download PDF

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TW202348954A
TW202348954A TW111122521A TW111122521A TW202348954A TW 202348954 A TW202348954 A TW 202348954A TW 111122521 A TW111122521 A TW 111122521A TW 111122521 A TW111122521 A TW 111122521A TW 202348954 A TW202348954 A TW 202348954A
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light
under test
polarized light
component
linear polarizer
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TWI808798B (en
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施宏欣
葉肇懿
周蔣云
梁哲源
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大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
大陸商業成光電(無錫)有限公司
英特盛科技股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations

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Abstract

An optical detecting system is configured to detect a to-be tested device having a first linear polarizer and a quarter-wave plate. The optical detecting system includes a light source, a polarization adjustment assembly, and a detecting unit. The light source has a light emitting surface and is configured to emit light. The polarization adjustment assembly faces the light emitting surface of the light source. The polarization adjustment assembly is configured to convert the light to linearly polarized light. The first linear polarizer is located between the polarization adjustment assembly and the quarter-wave plate. The to-be tested device is configured to convert the linearly polarized light to circularly polarized light. The detecting unit is located on a side of the to-be tested device facing away from the polarization adjustment assembly. The detecting unit is configured to calculate an including angle between an absorption axis of the first linear polarizer and a fast axis of the quarter-wave plate of the to-be tested device based on the circularly polarized light.

Description

光學檢測系統及其操作方法Optical detection system and method of operation thereof

本揭露係關於一種光學檢測系統以及一種光學檢測系統的操作方法。The present disclosure relates to an optical detection system and an operating method of the optical detection system.

一般而言,虛擬實境(Virtual reality,VR)產品中的光學組件主要以線偏光片以及四分之一波片組成,並藉由檢測設備判斷線偏光片的線偏振方向性與四分之一波片的圓偏振方向性是否產生偏移。然而,現有的檢測設備其檢測過程需要輸入四分之一波片以及線偏光片的材料相關參數,例如厚度、折射率以及消光係數等,增加了整體作業時間以及操作複雜度。Generally speaking, the optical components in virtual reality (VR) products are mainly composed of linear polarizers and quarter-wave plates. The linear polarization directionality and quarter-wave plate of the linear polarizers are judged by testing equipment. Whether the circular polarization directivity of a wave plate is shifted. However, the inspection process of existing inspection equipment requires the input of material-related parameters of quarter-wave plates and linear polarizers, such as thickness, refractive index, and extinction coefficient, which increases the overall operation time and operational complexity.

本揭露之一技術態樣為一種光學檢測系統。One technical aspect of the present disclosure is an optical detection system.

根據本揭露一實施方式,一種光學檢測系統配置以檢測具有第一線偏振片及四分之一波片的待測元件。光學檢測系統包括:光源、偏光調整組件以及檢測單元。光源具有出光面且配置以發射光線。偏光調整組件朝向光源的出光面。偏光調整組件配置以將光線轉換為線性偏振光。第一線偏振片位於偏光調整組件與四分之一波片之間。待測元件配置以將線性偏振光轉換為圓偏振光。檢測單元位於待測元件背對偏光調整組件的一側。檢測單元配置以根據圓偏振光計算待測元件的第一線偏振片的吸收軸與待測元件的四分之一波片的快軸之間的相差角度。According to an embodiment of the present disclosure, an optical detection system is configured to detect a device under test having a first linear polarizer and a quarter-wave plate. The optical detection system includes: light source, polarization adjustment component and detection unit. The light source has a light exit surface and is configured to emit light. The polarization adjustment component faces the light exit surface of the light source. The polarization adjustment component is configured to convert light into linearly polarized light. The first linear polarizer is located between the polarization adjustment component and the quarter wave plate. The element under test is configured to convert linearly polarized light into circularly polarized light. The detection unit is located on the side of the component under test facing away from the polarization adjustment component. The detection unit is configured to calculate a phase difference angle between the absorption axis of the first linear polarizer of the component under test and the fast axis of the quarter-wave plate of the component under test based on the circularly polarized light.

在本揭露一實施方式中,上述偏光調整組件包括消偏器。消偏器位於光源與待測元件的第一線偏振片之間。消偏器配置以將光線轉換為非偏振光。In an embodiment of the present disclosure, the above-mentioned polarization adjustment component includes a depolarizer. The depolarizer is located between the light source and the first linear polarizer of the component under test. Depolarizers are configured to convert light into unpolarized light.

在本揭露一實施方式中,上述偏光調整組件更包括第二線偏振片。第二線偏振片位於消偏器與待測元件的第一線偏振片之間。第二線偏振片配置以將非偏振光轉換為線性偏振光。In an embodiment of the present disclosure, the above-mentioned polarization adjustment component further includes a second linear polarizing plate. The second linear polarizer is located between the depolarizer and the first linear polarizer of the device under test. The second linear polarizer is configured to convert unpolarized light into linearly polarized light.

在本揭露一實施方式中,上述光學檢測系統更包括縮束鏡。縮束鏡位於待測元件與檢測單元之間。In an embodiment of the present disclosure, the above-mentioned optical detection system further includes a condenser. The condenser is located between the component under test and the detection unit.

在本揭露一實施方式中,上述四分之一波片的中心波長相同於光線的波長。In an embodiment of the present disclosure, the center wavelength of the quarter-wave plate is the same as the wavelength of the light.

在本揭露一實施方式中,上述光源為雷射光源。In an embodiment of the present disclosure, the above-mentioned light source is a laser light source.

本揭露之一技術態樣為一種光學檢測系統的操作方法。One technical aspect of the present disclosure is an operating method of an optical detection system.

根據本揭露一實施方式,一種光學檢測系統的操作方法包括:藉由光源發射光線至偏光調整組件;藉由偏光調整組件將光線轉換為線性偏振光並發射至待測元件,其中待測元件具有第一線偏振片以及四分之一波片,第一線偏振片位於偏光調整組件與四分之一波片之間;藉由待測元件將線性偏振光轉換為圓偏振光並發射至檢測單元;以及根據圓偏振光計算待測元件的第一線偏振片的吸收軸與待測元件的四分之一波片的快軸之間的相差角度。According to an embodiment of the present disclosure, an operating method of an optical detection system includes: emitting light to a polarization adjustment component through a light source; converting the light into linearly polarized light through the polarization adjustment component and transmitting it to a component under test, wherein the component under test has The first linear polarizer and the quarter-wave plate. The first linear polarizer is located between the polarization adjustment component and the quarter-wave plate; the component under test converts linearly polarized light into circularly polarized light and transmits it to the detection unit; and calculate the phase difference angle between the absorption axis of the first linear polarizer of the component under test and the fast axis of the quarter-wave plate of the component under test based on the circularly polarized light.

在本揭露一實施方式中,上述根據圓偏振光計算相差角度更包括:旋轉待測元件以獲得待測元件的光強度與旋光強度;以及根據光強度與旋光強度計算待測元件的最大橢圓偏振率。In an embodiment of the present disclosure, the above-mentioned calculation of the phase difference angle based on circularly polarized light further includes: rotating the component under test to obtain the light intensity and optical rotation intensity of the component under test; and calculating the maximum elliptical polarization of the component under test based on the light intensity and optical rotation intensity. Rate.

在本揭露一實施方式中,上述藉由偏光調整組件將光線轉換為線性偏振光並發射至待測元件更包括:藉由偏光調整組件的消偏器將光線轉換為非偏振光並發射至偏光調整組件的第二線偏振片;以及藉由偏光調整組件的第二線偏振片將偏振光轉換為線性偏振光並發射至待測元件。In an embodiment of the present disclosure, the above-mentioned conversion of light into linearly polarized light through the polarization adjustment component and emitting it to the device under test further includes: converting the light into unpolarized light through the depolarizer of the polarization adjustment component and emitting it to the polarized light. The second linear polarizer of the adjustment component; and the second linear polarizer of the polarization adjustment component converts the polarized light into linearly polarized light and transmits it to the device under test.

在本揭露一實施方式中,上述根據圓偏振光計算相差角度更包括:旋轉第二線偏振片以獲得待測元件的光強度與旋光強度;以及根據光強度與旋光強度計算待測元件的最大橢圓偏振率。In an embodiment of the present disclosure, the above-mentioned calculation of the phase difference angle based on circularly polarized light further includes: rotating the second linear polarizer to obtain the light intensity and optical rotation intensity of the component under test; and calculating the maximum maximum value of the component under test based on the light intensity and optical rotation intensity. Elliptical polarization ratio.

在本揭露一實施方式中,上述藉由待測元件將線性偏振光轉換為圓偏振光並發射至檢測單元更包括:藉由縮束鏡將經過待測元件的圓偏振光之光斑直徑縮小至0.1mm與5mm之間並發射至檢測單元。In an embodiment of the present disclosure, the above step of converting linearly polarized light into circularly polarized light through the device under test and transmitting it to the detection unit further includes: using a condenser to reduce the spot diameter of the circularly polarized light passing through the device under test to Between 0.1mm and 5mm and launched to the detection unit.

在本揭露上述實施方式中,光學檢測系統的檢測單元可根據通過待測元件的圓偏振光計算待測元件的第一線偏振片的吸收軸與待測元件的四分之一波片的快軸之間的相差角度。當相差角度趨近於0時,光學檢測系統可判定待測元件的第一線偏振片的吸收軸(亦即線偏振方向)以及四分之一波片的快軸(亦即圓偏振方向)並無產生偏移,可確保每一經由光學檢測系統檢測的待測元件皆具有相同品質表現。此外,光學檢測系統的檢測單元在檢測待測元件時,並不需要輸入待測元件的材料相關參數(例如厚度、折射率以及消光係數),可節省光學檢測系統進行檢測的時間並降低整體操作複雜度。In the above-mentioned embodiments of the present disclosure, the detection unit of the optical detection system can calculate the absorption axis of the first linear polarizer of the component under test and the fast speed of the quarter-wave plate of the component under test based on the circularly polarized light passing through the component under test. The angle of difference between the axes. When the phase difference angle approaches 0, the optical detection system can determine the absorption axis (i.e., linear polarization direction) of the first linear polarizer of the component under test and the fast axis (i.e., circular polarization direction) of the quarter-wave plate. There is no offset, ensuring that every component under test inspected by the optical inspection system has the same quality performance. In addition, when the detection unit of the optical detection system detects the component to be tested, it does not need to input the material-related parameters of the component to be tested (such as thickness, refractive index, and extinction coefficient), which can save the inspection time of the optical detection system and reduce the overall operation. complexity.

以下揭示之實施方式內容提供了用於實施所提供的標的之不同特徵的許多不同實施方式,或實例。下文描述了元件和佈置之特定實例以簡化本案。當然,該等實例僅為實例且並不意欲作為限制。此外,本案可在各個實例中重複元件符號及/或字母。此重複係用於簡便和清晰的目的,且其本身不指定所論述的各個實施方式及/或配置之間的關係。The following disclosure of embodiments provides many different implementations, or examples, for implementing various features of the provided subject matter. Specific examples of components and arrangements are described below to simplify the present application. Of course, these examples are examples only and are not intended to be limiting. Additionally, reference symbols and/or letters may be repeated in each instance. This repetition is for simplicity and clarity and does not by itself specify a relationship between the various embodiments and/or configurations discussed.

諸如「在……下方」、「在……之下」、「下部」、「在……之上」、「上部」等等空間相對術語可在本文中為了便於描述之目的而使用,以描述如附圖中所示之一個元件或特徵與另一元件或特徵之關係。空間相對術語意欲涵蓋除了附圖中所示的定向之外的在使用或操作方法中的裝置的不同定向。裝置可經其他方式定向(旋轉90度或以其他定向)並且本文所使用的空間相對描述詞可同樣相應地解釋。Spatially relative terms such as “below,” “below,” “lower,” “above,” “upper,” and the like may be used herein for convenience of description, to describe The relationship of one element or feature to another element or feature is illustrated in the drawings. Spatially relative terms are intended to encompass different orientations of the device in use or methods of operation in addition to the orientation illustrated in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

第1圖繪示根據本揭露一實施方式之光學檢測系統100運作時的示意圖。光學檢測系統100配置以檢測具有第一線偏振片210以及四分之一波片220的待測元件200。舉例來說,待測元件200可為虛擬實境(VR)眼鏡的鏡片,但並不以此為限。光學檢測系統100包括光源110、偏光調整組件120以及檢測單元130。光學檢測系統100的光源110具有出光面112且配置以發射光線L。在一些實施方式中,光源110係可為雷射光之光源110,雷射光源110可發射波長為532nm之綠光雷射光且功率可為20mW。此外,待測元件200的四分之一波片220的中心波長相同於光線L的波長。舉例來說,當待測元件200的表面為平面時,待測元件200的四分之一波片220的中心波長與光線L的波長可為532nm,但並不此為限。Figure 1 is a schematic diagram of the operation of the optical detection system 100 according to an embodiment of the present disclosure. The optical detection system 100 is configured to detect the component under test 200 having the first linear polarizer 210 and the quarter-wave plate 220 . For example, the device under test 200 can be a lens of virtual reality (VR) glasses, but is not limited thereto. The optical detection system 100 includes a light source 110, a polarization adjustment component 120 and a detection unit 130. The light source 110 of the optical detection system 100 has a light exit surface 112 and is configured to emit light L. In some embodiments, the light source 110 may be a laser light source 110, and the laser light source 110 may emit green laser light with a wavelength of 532 nm and a power of 20 mW. In addition, the center wavelength of the quarter-wave plate 220 of the device under test 200 is the same as the wavelength of the light L. For example, when the surface of the device under test 200 is a plane, the central wavelength of the quarter-wave plate 220 of the device under test 200 and the wavelength of the light L can be 532 nm, but this is not a limitation.

此外,光學檢測系統100的偏光調整組件120朝向光源110的出光面112。偏光調整組件120包括消偏器122與第二線偏振片124。偏光調整組件120的消偏器122位於光源110與第二線偏振片124之間。偏光調整組件120的第二線偏振片124位於消偏器122與待測元件200的第一線偏振片210之間。待測元件200的第一線偏振片210位於偏光調整組件120的第二線偏振片124與待測元件200的四分之一波片220之間。第二線偏振片124與待測元件200皆可位於轉動系統上而可旋轉。在一些實施方式中,檢測單元130位於待測元件200背對偏光調整組件120的一側。也就是說,檢測單元130與偏光調整組件120位於待測元件200的相對兩側,並且待測元件200的第一線偏振片210較四分之一波片220靠近偏光調整組件120,待測元件200的四分之一波片220較第一線偏振片210靠近檢測單元130。In addition, the polarization adjustment component 120 of the optical detection system 100 faces the light exit surface 112 of the light source 110 . The polarization adjustment component 120 includes a depolarizer 122 and a second linear polarizer 124 . The depolarizer 122 of the polarization adjustment component 120 is located between the light source 110 and the second linear polarizer 124 . The second linear polarizer 124 of the polarization adjustment component 120 is located between the depolarizer 122 and the first linear polarizer 210 of the device under test 200 . The first linear polarizing plate 210 of the device under test 200 is located between the second linear polarizing plate 124 of the polarization adjustment assembly 120 and the quarter-wave plate 220 of the device under test 200 . Both the second linear polarizing plate 124 and the device under test 200 can be located on the rotating system and can rotate. In some embodiments, the detection unit 130 is located on a side of the component under test 200 facing away from the polarization adjustment component 120 . That is to say, the detection unit 130 and the polarization adjustment component 120 are located on opposite sides of the component under test 200, and the first linear polarizing plate 210 of the component under test 200 is closer to the polarization adjustment component 120 than the quarter wave plate 220. The quarter wave plate 220 of the element 200 is closer to the detection unit 130 than the first linear polarizing plate 210 .

在一些實施方式中,待測元件200可包括基板230。待測元件200的第一線偏振片210與四分之一波片220貼合於基板230的相對兩側,並且基板230的材質可包括玻璃及聚合物材料。光學檢測系統100的檢測單元130可包括具有預設電路佈局或內建應用程式的處理器或晶片。檢測單元130可計算經過待測元件200所接收之光強度、圓偏振方向以及光旋轉強度,以達到對待測元件200進行光學對位檢測的效果。舉例來說,光學檢測系統100可檢測待測元件200是否具有合適的偏光方向及角度。當使用者穿戴虛擬實境眼鏡觀看立體影像時,可減少發生穿透軸傾斜或是串擾(Cross talk)等現象。In some embodiments, the device under test 200 may include a substrate 230 . The first linear polarizing plate 210 and the quarter-wave plate 220 of the device under test 200 are attached to opposite sides of the substrate 230, and the material of the substrate 230 may include glass and polymer materials. The detection unit 130 of the optical detection system 100 may include a processor or chip with a preset circuit layout or built-in application program. The detection unit 130 can calculate the light intensity, circular polarization direction and light rotation intensity received by the component under test 200 to achieve the effect of optical alignment detection of the component under test 200 . For example, the optical detection system 100 can detect whether the component under test 200 has a suitable polarization direction and angle. When users wear virtual reality glasses to view stereoscopic images, phenomena such as penetration axis tilt or cross talk can be reduced.

應理解到,已敘述的元件連接關係與功效將不重覆贅述,合先敘明。在以下敘述中,將說明光學檢測系統的操作方法。It should be understood that the connection relationships and functions of the components that have been described will not be repeated and will be explained first. In the following description, the operation method of the optical detection system will be explained.

第2圖繪示根據本揭露一實施方式之光學檢測系統的操作方法的流程圖。光學檢測系統的操作方法包括下列步驟。首先在步驟S1中,藉由光源發射光線至偏光調整組件。接著在步驟S2中,藉由偏光調整組件將光線轉換為線性偏振光並發射至待測元件,其中待測元件具有第一線偏振片以及四分之一波片,第一線偏振片位於偏光調整組件與四分之一波片之間。之後在步驟S3中,藉由待測元件將線性偏振光轉換為圓偏振光並發射至檢測單元。接著在步驟S4中,根據圓偏振光計算待測元件的第一線偏振片的吸收軸與待測元件的四分之一波片的快軸之間的相差角度。在以下敘述中,將詳細說明上述各步驟。FIG. 2 illustrates a flowchart of an operating method of an optical detection system according to an embodiment of the present disclosure. The operating method of the optical detection system includes the following steps. First, in step S1, the light source is used to emit light to the polarization adjustment component. Then in step S2, the light is converted into linearly polarized light by the polarization adjustment component and emitted to the device under test, where the device under test has a first linear polarizer and a quarter-wave plate, and the first linear polarizer is located at the polarization between the adjustment component and the quarter-wave plate. Then, in step S3, the linearly polarized light is converted into circularly polarized light by the element under test and emitted to the detection unit. Next, in step S4, the phase difference angle between the absorption axis of the first linear polarizer of the component under test and the fast axis of the quarter-wave plate of the component under test is calculated based on the circularly polarized light. In the following description, each of the above steps will be explained in detail.

同時參照第1圖與第3圖,首先,可藉由光源110發射光線L至偏光調整組件120。舉例來說,光源110可為雷射光之光源110,且光源110可發射波長為532nm之綠光雷射光至偏光調整組件120的消偏器122。在一些實施方式中,偏光調整組件120的消偏器122可將接收到的光線L轉換為非偏振光P1,並將非偏振光P1發射至偏光調整組件120的第二線偏振片124。偏光調整組件120的第二線偏振片124可將接收到的非偏振光P1轉換為線性偏振光P2,並將線性偏振光P2發射至待測元件200。Referring to FIGS. 1 and 3 simultaneously, first, the light source 110 can emit light L to the polarization adjustment component 120 . For example, the light source 110 may be a laser light source 110, and the light source 110 may emit green laser light with a wavelength of 532 nm to the depolarizer 122 of the polarization adjustment component 120. In some embodiments, the depolarizer 122 of the polarization adjustment component 120 may convert the received light L into unpolarized light P1 and emit the non-polarized light P1 to the second linear polarizer 124 of the polarization adjustment component 120 . The second linear polarizer 124 of the polarization adjustment component 120 can convert the received unpolarized light P1 into linearly polarized light P2, and emit the linearly polarized light P2 to the device under test 200.

在一些實施方式中,待測元件200具有第一線偏振片210、四分之一波片220以及位於第一線偏振片210與四分之一波片220之間的基板230。舉例來說,待測元件200可為虛擬實境(VR)眼鏡的鏡片,但並不以此為限。在一些實施方式中,待測元件200的四分之一波片220的中心波長相同於光線L的波長。舉例來說,待測元件200的四分之一波片220的中心波長與光線L的波長可為532nm,但並不此為限。待測元件200可將接收到的線性偏振光P2轉換為圓偏振光P3,並將圓偏振光P3發射至檢測單元130的收光面132。In some embodiments, the device under test 200 has a first linear polarizer 210 , a quarter-wave plate 220 , and a substrate 230 located between the first linear polarizer 210 and the quarter-wave plate 220 . For example, the device under test 200 can be a lens of virtual reality (VR) glasses, but is not limited thereto. In some embodiments, the center wavelength of the quarter-wave plate 220 of the device under test 200 is the same as the wavelength of the light L. For example, the center wavelength of the quarter-wave plate 220 of the device under test 200 and the wavelength of the light L can be 532 nm, but this is not a limitation. The device under test 200 can convert the received linearly polarized light P2 into circularly polarized light P3, and emit the circularly polarized light P3 to the light-collecting surface 132 of the detection unit 130.

在一些實施方式中,檢測單元130可包括具有預設電路佈局或內建應用程式的處理器或晶片。檢測單元130可根據圓偏振光P3計算待測元件200的橢圓偏振率(Ellipticity)。詳細來說,可藉由轉動系統旋轉偏光調整組件120的第二線偏振片124或藉由轉動系統旋轉承載待測元件200的載台(圖未示)以獲得待測元件200各處的光強度與旋光強度,並且檢測單元130可根據待測元件200的光強度與旋光強度計算待測元件200的最大橢圓偏振率。舉例來說,檢測單元130可在第二線偏振片124或承載待測元件200的載台每旋轉10度時,便進行一次光強度與旋光強度的測量,並且檢測單元130可使用史托克斯向量(Stokes vector)計算待測元件200的橢圓偏振率。橢圓偏振率的數學式可為 ,其中I、Q、U及V為史托克斯向量的四個參數。 In some embodiments, the detection unit 130 may include a processor or chip with a preset circuit layout or built-in application program. The detection unit 130 can calculate the elliptical polarization rate (Ellipticity) of the component under test 200 based on the circularly polarized light P3. Specifically, the second linear polarizing plate 124 of the polarization adjustment component 120 can be rotated by the rotation system or the stage (not shown) carrying the device under test 200 can be rotated by the rotation system to obtain the light everywhere on the device under test 200 intensity and optical rotation intensity, and the detection unit 130 can calculate the maximum elliptical polarization rate of the component under test 200 based on the light intensity and optical rotation intensity of the component under test 200 . For example, the detection unit 130 can measure the light intensity and optical rotation intensity every time the second linear polarizing plate 124 or the stage carrying the component under test 200 rotates 10 degrees, and the detection unit 130 can use Stork's The Stokes vector is used to calculate the elliptical polarization rate of the component under test 200 . The mathematical formula of elliptical polarization rate can be , where I, Q, U and V are the four parameters of the Stokes vector.

在計算得到待測元件200的最大橢圓偏振率後,檢測單元130可將最大橢圓偏振率之數值轉換為待測元件200的第一線偏振片210的吸收軸(見第3圖)與待測元件200的四分之一波片220的快軸(見第3圖)之間的相差角度。舉例來說,方位角與四分之一波片220的快軸所夾的角度a減去方位角與第一線偏振片210的吸收軸所夾的角度b(負數)後,再減去理論數值(即135度),即可得到相差角度。After calculating the maximum elliptical polarization rate of the component under test 200, the detection unit 130 can convert the value of the maximum elliptical polarization ratio into the absorption axis (see Figure 3) of the first linear polarizing plate 210 of the component under test 200 and the value of the component under test. The phase difference angle between the fast axes (see Figure 3) of the quarter wave plate 220 of the element 200. For example, the angle a between the azimuth angle and the fast axis of the quarter-wave plate 220 is subtracted from the angle b (a negative number) between the azimuth angle and the absorption axis of the first linear polarizing plate 210 , and then the theoretical angle b is subtracted. value (i.e. 135 degrees), you can get the phase difference angle.

具體而言,當相差角度趨近於0時,光學檢測系統100可判定待測元件200的第一線偏振片210的吸收軸(亦即線偏振方向)以及四分之一波片220的快軸(亦即圓偏振方向)並無產生偏移,可確保每一經由光學檢測系統100檢測的待測元件200皆具有相同品質表現。此外,光學檢測系統100的檢測單元130在檢測待測元件200時,並不需要輸入待測元件200的材料相關參數(例如厚度、折射率以及消光係數),可節省光學檢測系統100進行檢測的時間並降低整體操作複雜度。Specifically, when the phase difference angle approaches 0, the optical detection system 100 can determine the absorption axis (that is, the linear polarization direction) of the first linear polarizer 210 of the component under test 200 and the velocity of the quarter-wave plate 220 . There is no offset in the axis (that is, the direction of circular polarization), which ensures that each component under test 200 inspected by the optical inspection system 100 has the same quality performance. In addition, when the detection unit 130 of the optical detection system 100 detects the component to be tested 200, it does not need to input the material-related parameters (such as thickness, refractive index and extinction coefficient) of the component to be tested 200, which can save the time of the optical detection system 100 for detection. time and reduce overall operational complexity.

第4A圖至第7圖繪示根據本揭露不同實施方式之相差角度與橢圓偏振率的關係圖。請參照第1圖、第4A圖以及第4B圖,當待測元件200的表面為平面時,光線L的參考波長以及四分之一波片220的中心波長可為532nm。在第4A圖與第4B圖中,水平軸為相差角度的數值(度數),垂直軸為橢圓偏振率的數值(最大為1)。菱形符號為參考波長532nm的實驗數值。由菱形符號所組成的量測線段410以及實驗線段420可得知當橢圓偏振率(Ellipticity)越大時,則相差角度越小,代表待測元件200的第一線偏振片210的吸收軸(亦即線偏振方向)以及四分之一波片220的快軸(亦即圓偏振方向)對準得越準確。舉例來說,可藉由數學模擬軟體(例如LightTools)得到實驗線段420。在真實的量測線段410以及實驗數據模型的實驗線段420中,橢圓偏振率皆與相差角度呈現負相關的特性,也就是橢圓偏振率越大則相差角度的絕對值越小。此外,可藉由量測線段410計算R平方(R squared)。R平方也可稱為判定係數(Coefficient of determination)。當R平方越趨近1時,模型的解釋力越高,並且只要R平方大於0.75即具有模型解釋力。在本實施方式中,真實的量測線段410的R平方可為0.78。Figures 4A to 7 illustrate the relationship between phase difference angle and elliptical polarization rate according to different embodiments of the present disclosure. Please refer to Figure 1, Figure 4A and Figure 4B. When the surface of the component under test 200 is flat, the reference wavelength of the light L and the central wavelength of the quarter-wave plate 220 can be 532nm. In Figures 4A and 4B, the horizontal axis is the value of the phase difference angle (degrees), and the vertical axis is the value of the elliptical polarization rate (maximum is 1). The diamond symbol is the experimental value at the reference wavelength of 532nm. It can be seen from the measurement line segment 410 and the experimental line segment 420 composed of diamond symbols that the larger the elliptical polarization rate (Ellipticity), the smaller the phase difference angle, which represents the absorption axis ( That is, the linear polarization direction) and the fast axis of the quarter-wave plate 220 (that is, the circular polarization direction) are aligned more accurately. For example, the experimental line segment 420 can be obtained through mathematical simulation software (such as LightTools). In the real measurement line segment 410 and the experimental line segment 420 of the experimental data model, the elliptical polarization rate exhibits a negative correlation with the phase difference angle. That is, the greater the elliptical polarization rate, the smaller the absolute value of the phase difference angle. In addition, R squared can be calculated by measuring the line segment 410 . R-squared can also be called the coefficient of determination. When R square approaches 1, the explanatory power of the model is higher, and as long as R square is greater than 0.75, it has model explanatory power. In this embodiment, the R-squared of the real measurement line segment 410 may be 0.78.

請參照第1圖、第5A圖、第5B圖以及第5C圖,當待測元件200的表面為曲面時,光線L的參考波長以及四分之一波片220的中心波長可為589nm。在第5圖中,水平軸為相差角度的數值,垂直軸為橢圓偏振率的數值。根據量測線段510以及實驗線段520可得知當橢圓偏振率(Ellipticity)越大時,則相差角度越小,代表待測元件200的第一線偏振片210的吸收軸(亦即線偏振方向)以及四分之一波片220的快軸(亦即圓偏振方向)未產生偏移。舉例來說,可藉由數學模擬軟體(例如Zemax)得到實驗線段520。在真實的量測線段510以及實驗數據模型的實驗線段520中,橢圓偏振率皆與相差角度呈現負相關的特性,也就是橢圓偏振率越大則相差角度的絕對值越小。此外,在本實施方式中,真實的量測線段410的R平方可為0.94。第5C圖繪示即使量測線段510以及實驗線段520具有些微數據差異,但量測線段510以及實驗線段520的橢圓偏振率與相差角度依然呈現負相關的特性。Please refer to Figure 1, Figure 5A, Figure 5B and Figure 5C. When the surface of the component under test 200 is a curved surface, the reference wavelength of the light L and the central wavelength of the quarter-wave plate 220 can be 589nm. In Figure 5, the horizontal axis represents the value of the phase difference angle, and the vertical axis represents the value of the elliptical polarization rate. According to the measurement line segment 510 and the experimental line segment 520, it can be known that when the elliptical polarization rate (Ellipticity) is larger, the phase difference angle is smaller, which represents the absorption axis (that is, the linear polarization direction) of the first linear polarizing plate 210 of the device under test 200. ) and the fast axis (that is, the circular polarization direction) of the quarter-wave plate 220 does not shift. For example, the experimental line segment 520 can be obtained through mathematical simulation software (such as Zemax). In the real measurement line segment 510 and the experimental line segment 520 of the experimental data model, the elliptical polarization rate exhibits a negative correlation with the phase difference angle. That is, the greater the elliptical polarization rate, the smaller the absolute value of the phase difference angle. In addition, in this embodiment, the R-squared of the real measurement line segment 410 may be 0.94. Figure 5C shows that even if there are slight data differences between the measured line segment 510 and the experimental line segment 520, the elliptical polarization rate and phase difference angle of the measured line segment 510 and the experimental line segment 520 still exhibit a negative correlation characteristic.

第6A圖的實驗線段610繪示相差角度在1度至1.5度與橢圓偏振率之間的數值變化。第6B圖的實驗線段620繪示相差角度在1.6度至5度與橢圓偏振率之間的數值變化。請參照第1圖、第6A圖以及第6B圖,當待測元件200的表面為曲面時,光線L的參考波長以及四分之一波片220的中心波長可約為587.6nm。舉例來說,可藉由數學模擬軟體(例如Zemax)得到實驗線段610以及實驗線段620。在第6A圖與第6B圖中,水平軸為相差角度的數值,垂直軸為橢圓偏振率的數值。當相差角度約為1度時,則具有最大的橢圓偏振率(Ellipticity),即橢圓偏振率約為0.966。當相差角度約為5度時,則具有較小的橢圓偏振率(Ellipticity),即橢圓偏振率約為0.84。第6A圖與第6B圖的橢圓偏振率皆與相差角度呈現負相關的特性,也就是橢圓偏振率越大則相差角度的絕對值越小。此外,在本實施方式中,實驗線段610以及實驗線段620的R平方可為0.999。The experimental line segment 610 in Figure 6A shows the numerical change of the phase difference angle between 1 degree and 1.5 degrees and the elliptical polarization rate. The experimental line segment 620 in Figure 6B shows the numerical change of the phase difference angle between 1.6 degrees and 5 degrees and the elliptical polarization rate. Please refer to Figure 1, Figure 6A and Figure 6B. When the surface of the component under test 200 is a curved surface, the reference wavelength of the light L and the central wavelength of the quarter wave plate 220 can be approximately 587.6 nm. For example, the experimental line segment 610 and the experimental line segment 620 can be obtained through mathematical simulation software (such as Zemax). In Figures 6A and 6B, the horizontal axis represents the value of the phase difference angle, and the vertical axis represents the value of the elliptical polarization rate. When the phase difference angle is about 1 degree, it has the maximum elliptical polarization rate (Ellipticity), that is, the elliptical polarization rate is about 0.966. When the phase difference angle is about 5 degrees, it has a smaller elliptical polarization rate (Ellipticity), that is, the elliptical polarization rate is about 0.84. The elliptical polarization ratio in Figure 6A and Figure 6B both exhibits a negative correlation with the phase difference angle. That is, the greater the elliptical polarization ratio, the smaller the absolute value of the phase difference angle. In addition, in this embodiment, the R-squared of the experimental line segment 610 and the experimental line segment 620 may be 0.999.

第7圖的理想線段710繪示光源110無雷射光斑時待測元件200的橢圓偏振率與相差角度的數值變化。第7圖的量測線段720繪示光源110的雷射光斑為3公釐(mm)時待測元件200的橢圓偏振率與相差角度的數值變化。第7圖的量測線段730繪示光源110的雷射光斑為5公釐(mm)時待測元件200的橢圓偏振率與相差角度的數值變化。請參照第1圖以及第7圖,水平軸為相差角度的數值,垂直軸為橢圓偏振率的數值。光源110的雷射光斑為3公釐(mm)可對應表達光線L從光軸偏移了1.5mm,光源110的雷射光斑為5mm可對應表達光線L從光軸偏移了2.5mm。對於曲面的待測元件200來說,理想線段710與具有雷射光斑的量測線段720以及量測線段730的數值具有些微差異,但橢圓偏振率與相差角度仍然呈現負相關的特性,也就是橢圓偏振率越大則相差角度的絕對值越小。The ideal line segment 710 in Figure 7 illustrates the numerical changes in the elliptical polarization rate and phase difference angle of the device under test 200 when the light source 110 has no laser spot. The measurement line segment 720 in Figure 7 illustrates the numerical changes in the elliptical polarization rate and phase difference angle of the device under test 200 when the laser spot of the light source 110 is 3 millimeters (mm). The measurement line segment 730 in Figure 7 illustrates the numerical changes in the elliptical polarization rate and phase difference angle of the device under test 200 when the laser spot of the light source 110 is 5 millimeters (mm). Please refer to Figure 1 and Figure 7. The horizontal axis is the value of the phase difference angle, and the vertical axis is the value of the elliptical polarization rate. The laser spot of the light source 110 is 3 millimeters (mm), which can correspond to the light L being shifted by 1.5 mm from the optical axis. The laser spot of the light source 110 is 5 mm, which can be represented by the light L being shifted by 2.5 mm from the optical axis. For the device under test 200 with a curved surface, the values of the ideal line segment 710 and the measurement line segment 720 and 730 with the laser spot are slightly different, but the elliptical polarization rate and the phase difference angle still show a negative correlation characteristic, that is, The larger the elliptical polarization rate is, the smaller the absolute value of the phase difference angle is.

第8A圖繪示根據本揭露一實施方式之角度與光強度的關係圖。第8B圖繪示根據本揭露一實施方式之角度與橢圓偏振率的關係圖。第8A圖的水平軸為相差角度的數值,垂直軸為光強度的數值。第8B圖的水平軸為相差角度的數值,垂直軸為橢圓偏振率的數值。在一些實施方式中,橢圓偏振率的數學式可為 ,其中I、Q、U及V為史托克斯向量的四個參數。舉例來說,量測線段810的角度在130度與140度之間時,待測元件200具有最大光強度,即具有最大的I參數及V參數。在待測元件200具有最大的光強度(即具有最大的I參數及V參數)時,量測線段820具有待測元件200最大的橢圓偏振率,即橢圓偏振率約為0.99。也就是說,待測元件200的I參數及V參數將影響待測元件200的橢圓偏振率的數值。 Figure 8A is a diagram illustrating the relationship between angle and light intensity according to an embodiment of the present disclosure. Figure 8B is a diagram illustrating the relationship between angle and elliptical polarization rate according to an embodiment of the present disclosure. The horizontal axis of Figure 8A is the value of the phase difference angle, and the vertical axis is the value of the light intensity. The horizontal axis of Figure 8B is the value of the phase difference angle, and the vertical axis is the value of the elliptical polarization rate. In some embodiments, the mathematical formula for the elliptical polarization rate can be , where I, Q, U and V are the four parameters of the Stokes vector. For example, when the angle of the measurement line segment 810 is between 130 degrees and 140 degrees, the component under test 200 has the maximum light intensity, that is, it has the maximum I parameter and V parameter. When the component under test 200 has the maximum light intensity (that is, has the largest I parameter and V parameter), the measurement line segment 820 has the maximum elliptical polarization rate of the component under test 200 , that is, the elliptical polarization rate is approximately 0.99. That is to say, the I parameters and V parameters of the device under test 200 will affect the value of the elliptical polarization rate of the device under test 200 .

在以下敘述中,將說明其他形式的光學檢測系統。In the following description, other forms of optical detection systems will be described.

第9圖繪示根據本揭露另一實施方式之光學檢測系統100a運作時的示意圖。與第1圖所示之實施方式不同地方在於,光學檢測系統100a還進一步包括縮束鏡140。縮束鏡140位於待測元件200與檢測單元130之間。當圓偏振光P3經過表面為曲面的待測元件200後可能會放大光斑直徑,可藉由縮束鏡140將經過待測元件200的圓偏振光P3之光斑直徑縮小至0.1mm與5mm之間,使得縮小後的圓偏振光P3之雷射光斑可完整地被檢測單元130接收。Figure 9 is a schematic diagram illustrating the operation of the optical detection system 100a according to another embodiment of the present disclosure. The difference from the embodiment shown in Figure 1 is that the optical detection system 100a further includes a condenser 140. The condenser mirror 140 is located between the component under test 200 and the detection unit 130 . When the circularly polarized light P3 passes through the device under test 200 with a curved surface, the spot diameter may be enlarged. The beam reducer 140 can be used to reduce the spot diameter of the circularly polarized light P3 passing through the device under test 200 to between 0.1mm and 5mm. , so that the reduced laser spot of circularly polarized light P3 can be completely received by the detection unit 130 .

綜上所述,光學檢測系統的檢測單元可根據通過待測元件的圓偏振光計算待測元件的第一線偏振片的吸收軸與待測元件的四分之一波片的快軸之間的相差角度。當相差角度趨近於0時,光學檢測系統可判定待測元件的第一線偏振片的吸收軸(亦即線偏振方向)以及四分之一波片的快軸(亦即圓偏振方向)並無產生偏移,可確保每一經由光學檢測系統檢測的待測元件皆具有相同品質表現。此外,光學檢測系統的檢測單元在檢測待測元件時,並不需要輸入待測元件的材料相關參數(例如厚度、折射率以及消光係數),可節省光學檢測系統進行檢測的時間並降低整體操作複雜度。To sum up, the detection unit of the optical detection system can calculate the relationship between the absorption axis of the first linear polarizer of the component under test and the fast axis of the quarter-wave plate of the component under test based on the circularly polarized light passing through the component under test. phase difference angle. When the phase difference angle approaches 0, the optical detection system can determine the absorption axis (i.e., linear polarization direction) of the first linear polarizer of the component under test and the fast axis (i.e., circular polarization direction) of the quarter-wave plate. There is no offset, ensuring that every component under test inspected by the optical inspection system has the same quality performance. In addition, when the detection unit of the optical detection system detects the component to be tested, it does not need to input the material-related parameters of the component to be tested (such as thickness, refractive index, and extinction coefficient), which can save the inspection time of the optical detection system and reduce the overall operation. complexity.

前述概述了幾個實施方式的特徵,使得本領域技術人員可以更好地理解本揭露的態樣。本領域技術人員應當理解,他們可以容易地將本揭露用作設計或修改其他過程和結構的基礎,以實現與本文介紹的實施方式相同的目的和/或實現相同的優點。本領域技術人員還應該認識到,這樣的等效構造不脫離本揭露的精神和範圍,並且在不脫離本揭露的精神和範圍的情況下,它們可以在這裡進行各種改變,替換和變更。The foregoing outlines features of several embodiments so that those skilled in the art may better understand aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also recognize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they can be variously changed, substituted, and altered herein without departing from the spirit and scope of the present disclosure.

100:光學檢測系統 100a:光學檢測系統 110:光源 112:出光面 120:偏光調整組件 122:消偏器 124:第二線偏振片 130:檢測單元 132:收光面 140:縮束鏡 200:待測元件 210:第一線偏振片 220:四分之一波片 230:基板 410:量測線段 420:實驗線段 510:量測線段 520:實驗線段 610:實驗線段 620:實驗線段 710:理想線段 720:量測線段 730:量測線段 810:量測線段 820:量測線段 a:角度 b:角度 L:光線 P1:非偏振光 P2:線性偏振光 P3:圓偏振光 S1:步驟 S2:步驟 S3:步驟 S4:步驟 100: Optical detection system 100a: Optical detection system 110:Light source 112: Shiny surface 120:Polarization adjustment component 122:Depolarizer 124: Second linear polarizer 130:Detection unit 132: Glossy surface 140: Beam reducer 200: component under test 210: The first linear polarizer 220: Quarter wave plate 230:Substrate 410: Measure line segments 420: Experimental line segment 510: Measure line segments 520: Experimental line segment 610: Experimental line segment 620: Experimental line segment 710:Ideal line segment 720: Measure line segments 730: Measure line segments 810: Measure line segments 820: Measure line segments a: angle b: angle L:Light P1: unpolarized light P2: Linearly polarized light P3: Circularly polarized light S1: Steps S2: Step S3: Steps S4: Steps

當結合隨附諸圖閱讀時,得自以下詳細描述最佳地理解本揭露之一實施方式。應強調,根據工業上之標準實務,各種特徵並未按比例繪製且僅用於說明目的。事實上,為了論述清楚,可任意地增大或減小各種特徵之尺寸。 第1圖繪示根據本揭露一實施方式之光學檢測系統運作時的示意圖。 第2圖繪示根據本揭露一實施方式之光學檢測系統的操作方法的流程圖。 第3圖繪示根據本揭露一實施方式之快軸與吸收軸的關係圖。 第4A圖至第7圖繪示根據本揭露不同實施方式之相差角度與橢圓偏振率的關係圖。 第8A圖繪示根據本揭露一實施方式之角度與光強度的關係圖。 第8B圖繪示根據本揭露一實施方式之角度與橢圓偏振率的關係圖。 第9圖繪示根據本揭露另一實施方式之光學檢測系統運作時的示意圖。 One embodiment of the present disclosure is best understood from the following detailed description when read in conjunction with the accompanying drawings. It is emphasized that, in accordance with standard industry practice, various features are not drawn to scale and are for illustrative purposes only. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion. Figure 1 is a schematic diagram illustrating the operation of an optical detection system according to an embodiment of the present disclosure. FIG. 2 illustrates a flowchart of an operating method of an optical detection system according to an embodiment of the present disclosure. Figure 3 is a diagram illustrating the relationship between the fast axis and the absorption axis according to an embodiment of the present disclosure. Figures 4A to 7 illustrate the relationship between phase difference angle and elliptical polarization rate according to different embodiments of the present disclosure. Figure 8A is a diagram illustrating the relationship between angle and light intensity according to an embodiment of the present disclosure. Figure 8B is a diagram illustrating the relationship between angle and elliptical polarization rate according to an embodiment of the present disclosure. Figure 9 is a schematic diagram illustrating the operation of an optical detection system according to another embodiment of the present disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in order of storage institution, date and number) without Overseas storage information (please note in order of storage country, institution, date, and number) without

100:光學檢測系統 100: Optical detection system

110:光源 110:Light source

112:出光面 112: Shiny surface

120:偏光調整組件 120:Polarization adjustment component

122:消偏器 122:Depolarizer

124:第二線偏振片 124: Second linear polarizer

130:檢測單元 130:Detection unit

132:收光面 132: Glossy surface

200:待測元件 200: component under test

210:第一線偏振片 210: The first linear polarizer

220:四分之一波片 220: Quarter wave plate

230:基板 230:Substrate

L:光線 L:Light

P1:非偏振光 P1: unpolarized light

P2:線性偏振光 P2: Linearly polarized light

P3:圓偏振光 P3: Circularly polarized light

Claims (11)

一種光學檢測系統,配置以檢測具有一第一線偏振片及一四分之一波片的一待測元件,該光學檢測系統包含: 一光源,具有一出光面且配置以發射一光線; 一偏光調整組件,朝向該光源的該出光面,且配置以將該光線轉換為一線性偏振光,其中該第一線偏振片位於該偏光調整組件與該四分之一波片之間,該待測元件配置以將該線性偏振光轉換為一圓偏振光;以及 一檢測單元,位於該待測元件背對該偏光調整組件的一側,且配置以根據該圓偏振光計算該待測元件的該第一線偏振片的一吸收軸與該待測元件的該四分之一波片的一快軸之間的一相差角度。 An optical detection system configured to detect a component under test having a first linear polarizer and a quarter-wave plate, the optical detection system includes: a light source having a light emitting surface and configured to emit a light ray; A polarization adjustment component faces the light exit surface of the light source and is configured to convert the light into a linearly polarized light, wherein the first linear polarizer is located between the polarization adjustment component and the quarter wave plate, the The device under test is configured to convert the linearly polarized light into a circularly polarized light; and A detection unit is located on the side of the component under test facing away from the polarization adjustment component, and is configured to calculate an absorption axis of the first linear polarizer of the component under test and the absorption axis of the component under test based on the circularly polarized light. A phase difference angle between a fast axis of a quarter wave plate. 如請求項1所述之光學檢測系統,其中該偏光調整組件包含: 一消偏器,位於該光源與該待測元件的該第一線偏振片之間,且配置以將該光線轉換為一非偏振光。 The optical detection system as described in claim 1, wherein the polarization adjustment component includes: A depolarizer is located between the light source and the first linear polarizer of the component under test, and is configured to convert the light into unpolarized light. 如請求項2所述之光學檢測系統,其中該偏光調整組件更包含: 一第二線偏振片,位於該消偏器與該待測元件的該第一線偏振片之間,且配置以將該非偏振光轉換為該線性偏振光。 The optical detection system as described in claim 2, wherein the polarization adjustment component further includes: A second linear polarizer is located between the depolarizer and the first linear polarizer of the device under test, and is configured to convert the unpolarized light into the linearly polarized light. 如請求項1所述之光學檢測系統,更包含: 一縮束鏡,位於該待測元件與該檢測單元之間。 The optical detection system as described in claim 1 further includes: A condenser is located between the component to be tested and the detection unit. 如請求項1所述之光學檢測系統,其中該四分之一波片的中心波長相同於該光線的波長。The optical detection system as claimed in claim 1, wherein the center wavelength of the quarter wave plate is the same as the wavelength of the light. 如請求項1所述之光學檢測系統,其中該光源為雷射光源。The optical detection system as claimed in claim 1, wherein the light source is a laser light source. 一種光學檢測系統的操作方法,包含: 藉由一光源發射一光線至一偏光調整組件; 藉由該偏光調整組件將該光線轉換為一線性偏振光並發射至一待測元件,其中該待測元件具有一第一線偏振片以及一四分之一波片,該第一線偏振片位於該偏光調整組件與該四分之一波片之間; 藉由該待測元件將該線性偏振光轉換為一圓偏振光並發射至一檢測單元;以及 根據該圓偏振光計算該待測元件的該第一線偏振片的一吸收軸與該待測元件的該四分之一波片的一快軸之間的一相差角度。 An operating method of an optical detection system, including: Emitting a light beam to a polarization adjustment component through a light source; The light is converted into linearly polarized light by the polarization adjustment component and is emitted to a device under test, wherein the device under test has a first linear polarizer and a quarter-wave plate. The first linear polarizer Located between the polarization adjustment component and the quarter-wave plate; Converting the linearly polarized light into circularly polarized light by the device under test and transmitting it to a detection unit; and A phase difference angle between an absorption axis of the first linear polarizer of the device under test and a fast axis of the quarter-wave plate of the device under test is calculated based on the circularly polarized light. 如請求項7所述之方法,其中根據該圓偏振光計算該相差角度更包含: 旋轉該待測元件以獲得該待測元件的一光強度與一旋光強度;以及 根據該光強度與該旋光強度計算該待測元件的最大橢圓偏振率。 The method as described in claim 7, wherein calculating the phase difference angle based on the circularly polarized light further includes: Rotate the device under test to obtain a light intensity and an optical rotation intensity of the device under test; and The maximum elliptical polarization rate of the component under test is calculated based on the light intensity and the optical rotation intensity. 如請求項7所述之方法,其中藉由該偏光調整組件將該光線轉換為該線性偏振光並發射至該待測元件更包含: 藉由該偏光調整組件的一消偏器將該光線轉換為一非偏振光並發射至該偏光調整組件的一第二線偏振片;以及 藉由該偏光調整組件的該第二線偏振片將該偏振光轉換為該線性偏振光並發射至該待測元件。 The method as described in claim 7, wherein converting the light into the linearly polarized light by the polarization adjustment component and transmitting it to the device under test further includes: The light is converted into unpolarized light by a depolarizer of the polarization adjustment component and emitted to a second linear polarizer of the polarization adjustment component; and The polarized light is converted into linearly polarized light by the second linear polarizing plate of the polarization adjustment component and is emitted to the device under test. 如請求項9所述之方法,其中根據該圓偏振光計算該相差角度更包含: 旋轉該第二線偏振片以獲得該待測元件的一光強度與一旋光強度;以及 根據該光強度與該旋光強度計算該待測元件的最大橢圓偏振率。 The method of claim 9, wherein calculating the phase difference angle based on the circularly polarized light further includes: Rotate the second linear polarizer to obtain a light intensity and an optical rotation intensity of the component under test; and The maximum elliptical polarization rate of the component under test is calculated based on the light intensity and the optical rotation intensity. 如請求項7所述之方法,其中藉由該待測元件將該線性偏振光轉換為該圓偏振光並發射至該檢測單元更包含: 藉由一縮束鏡將經過該待測元件的該圓偏振光之光斑直徑縮小至0.1mm與5mm之間並發射至該檢測單元。 The method of claim 7, wherein converting the linearly polarized light into the circularly polarized light by the component to be tested and transmitting it to the detection unit further includes: A spot diameter of the circularly polarized light passing through the component under test is reduced to between 0.1 mm and 5 mm through a condenser and is emitted to the detection unit.
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