CN115031928A - Optical detection system and method of operation thereof - Google Patents
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Abstract
An optical inspection system is configured to inspect a DUT having a first linear polarizer and a quarter-wave plate. The optical detection system includes: light source, polarisation adjusting part and detecting element. The light source is provided with a light emergent surface and is configured to emit light. The polarization adjustment assembly faces the light-emitting surface of the light source. The polarization adjustment assembly is configured to convert light into linearly polarized light. The first linear polarizer is positioned between the polarization adjustment assembly and the quarter-wave plate. The device under test is configured to convert linearly polarized light into circularly polarized light. The detection unit is positioned on one side of the component to be detected, which is back to the polarized light adjustment component. The detection unit is configured to calculate a phase difference angle between an absorption axis of the first linear polarizer of the component to be detected and a fast axis of the quarter-wave plate of the component to be detected according to the circularly polarized light. The optical detection system does not need to input the material related parameters of the component to be detected, so that the detection time of the optical detection system can be saved, and the overall operation complexity can be reduced.
Description
Technical Field
The present disclosure relates to an optical inspection system and a method of operating an optical inspection system.
Background
Generally, an optical assembly in a Virtual Reality (VR) product mainly includes a linear polarizer and a quarter-wave plate, and a detection device determines whether a linear polarization direction of the linear polarizer and a circular polarization direction of the quarter-wave plate deviate. However, the conventional inspection apparatus requires the input of the quarter-wave plate and the material-related parameters of the linear polarizer, such as thickness, refractive index, extinction coefficient, etc., thereby increasing the overall operation time and complexity.
Disclosure of Invention
One aspect of the present disclosure is an optical inspection system.
According to one embodiment of the present disclosure, an optical inspection system is configured to inspect a dut having a first linear polarizer and a quarter-wave plate. The optical detection system includes: light source, polarisation adjusting part and detecting element. The light source is provided with a light emergent surface and is configured to emit light. The polarization adjustment assembly faces the light-emitting surface of the light source. The polarization adjustment assembly is configured to convert light into linearly polarized light. The first linear polarizer is positioned between the polarization adjustment assembly and the quarter-wave plate. The device under test is configured to convert linearly polarized light into circularly polarized light. The detection unit is positioned on one side of the to-be-detected assembly back to the polarized light adjustment assembly. The detection unit is configured to calculate a phase difference angle between an absorption axis of the first linear polarizer of the component to be detected and a fast axis of the quarter-wave plate of the component to be detected according to the circularly polarized light.
In an embodiment of the present disclosure, the polarization adjustment assembly includes a depolarizer. The depolarizer is located between the light source and the first linear polarizer of the component to be measured. The depolarizer is configured to convert light into unpolarized light.
In an embodiment of the present disclosure, the polarization adjustment assembly further includes a second linear polarizer. The second linear polarizer is positioned between the depolarizer and the first linear polarizer of the component to be tested. The second linear polarizer is configured to convert unpolarized light to linearly polarized light.
In an embodiment of the present disclosure, the optical detection system further includes a beam reduction mirror. The beam shrinking mirror is positioned between the component to be detected and the detection unit.
In an embodiment of the present disclosure, the center wavelength of the quarter-wave plate is the same as the wavelength of light.
In one embodiment of the present disclosure, the light source is a laser light source.
One aspect of the present disclosure is a method of operating an optical inspection system.
According to an embodiment of the present disclosure, a method of operating an optical inspection system includes: transmitting light to the polarization adjustment assembly through the light source; converting light rays into linearly polarized light through the polarization adjustment assembly and transmitting the linearly polarized light to the assembly to be tested, wherein the assembly to be tested is provided with a first linear polarizer and a quarter-wave plate, and the first linear polarizer is positioned between the polarization adjustment assembly and the quarter-wave plate; converting the linearly polarized light into circularly polarized light through the component to be detected and transmitting the circularly polarized light to the detection unit; and calculating a phase difference angle between the absorption axis of the first linear polarizer of the component to be tested and the fast axis of the quarter-wave plate of the component to be tested according to the circularly polarized light.
In an embodiment of the present disclosure, the calculating the phase difference angle according to the circularly polarized light further includes: rotating the component to be detected to obtain the light intensity and the optical rotation intensity of the component to be detected; and calculating the maximum elliptical polarization rate of the component to be measured according to the light intensity and the optical rotation intensity.
In an embodiment of the present disclosure, the converting the light into the linearly polarized light by the polarization adjustment assembly and transmitting the linearly polarized light to the device under test further includes: the light is converted into non-polarized light by a depolarizer of the polarized light adjusting assembly and is emitted to a second linear polarizer of the polarized light adjusting assembly; and converting the polarized light into linearly polarized light through a second linear polarizer of the polarization adjustment assembly and transmitting the linearly polarized light to the assembly to be tested.
In an embodiment of the present disclosure, the calculating the phase difference angle according to the circularly polarized light further includes: rotating the second linear polarizer to obtain the light intensity and the optical rotation intensity of the component to be measured; and calculating the maximum elliptical polarization rate of the component to be measured according to the light intensity and the optical rotation intensity.
In an embodiment of the present disclosure, the step of converting the linearly polarized light into circularly polarized light by the device under test and transmitting the circularly polarized light to the detecting unit further includes: the diameter of a light spot of the circularly polarized light passing through the component to be detected is reduced to between 0.1 millimeter and 5 millimeters through a beam reducing mirror and is transmitted to a detection unit.
In the above-described embodiments of the present disclosure, the detecting unit of the optical detecting system may calculate a phase difference angle between the absorption axis of the first linear polarizer of the device under test and the fast axis of the quarter-wave plate of the device under test according to the circularly polarized light passing through the device under test. When the phase difference angle approaches 0, the optical detection system can determine that the absorption axis (i.e., linear polarization direction) of the first linear polarizer and the fast axis (i.e., circular polarization direction) of the quarter-wave plate of the dut do not deviate, thereby ensuring that each dut detected by the optical detection system has the same quality. In addition, when the detection unit of the optical detection system detects the component to be detected, the material related parameters (such as thickness, refractive index and extinction coefficient) of the component to be detected do not need to be input, so that the detection time of the optical detection system can be saved, and the overall operation complexity can be reduced.
Drawings
An embodiment of the present disclosure is best understood from the following detailed description when read in connection with the accompanying drawings. It is emphasized that, in accordance with the standard practice in the industry, various features are not drawn to scale and are used for illustrative purposes only. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.
FIG. 1 is a schematic diagram illustrating an optical inspection system according to an embodiment of the present disclosure in operation.
FIG. 2 is a flow chart illustrating a method of operating an optical detection system according to an embodiment of the present disclosure.
FIG. 3 is a diagram illustrating fast axis and absorption axis relationships according to an embodiment of the present disclosure.
Fig. 4A to 7 are graphs showing the relationship between the phase difference angle and the elliptical polarization ratio according to various embodiments of the present disclosure.
FIG. 8A is a graph illustrating the relationship between angle and light intensity according to an embodiment of the disclosure.
FIG. 8B is a graph showing the relationship between the angle and the elliptical polarization rate according to an embodiment of the present disclosure.
FIG. 9 is a schematic diagram illustrating an optical inspection system according to another embodiment of the present disclosure.
Reference numerals: 100 optical detection system
100a optical inspection system
110 light source
112 light-emitting surface
120 polarized light adjusting assembly
122 depolarizer
124 second linear polarizer
130 detection unit
132 light-receiving surface
140 beam-contracting mirror
200 component to be tested
210 first linear polarizer
220 quarter wave plate
230 base plate
410 measuring line segment
420 experiment line segment
510 measuring line segment
520 experiment line segment
610 experimental line segment
620 experimental line segment
710 ideal line segment
720 measuring line segment
730 measuring line segment
810 measuring line segment
820, measuring line segment
angle a is
b is the angle
L is light ray
P1 unpolarized light
P2 Linear polarized light
P3 circular polarized light
S1 step
S2 step
S3 step
And S4, step.
Detailed Description
The following disclosure of embodiments provides many different embodiments, or examples, for implementing different features of the provided objects. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these examples are merely examples and are not intended to be limiting. Moreover, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
Spatially relative terms, such as "under … …", "under … …", "under … …", "above", and the like, may be used herein for convenience of description to describe one element or feature's relationship to another element or feature as illustrated in the figures. Spatially relative terms are intended to encompass different orientations of the device in use or method of operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly as such.
FIG. 1 is a schematic diagram illustrating an optical inspection system 100 according to an embodiment of the present disclosure. The optical inspection system 100 is configured to inspect a dut 200 having a first linear polarizer 210 and a quarter-wave plate 220. For example, the device under test 200 may be a lens of Virtual Reality (VR) glasses, but not limited thereto. The optical detection system 100 includes a light source 110, a polarization adjustment assembly 120, and a detection unit 130. The light source 110 of the optical detection system 100 has an exit surface 112 and is configured to emit light L. In some embodiments, the light source 110 may be a laser light source 110, and the laser light source 110 may emit green laser light with a wavelength of 532nm and a power of 20 mW. In addition, the central wavelength of the quarter-wave plate 220 of the dut 200 is the same as the wavelength of the light L. For example, when the surface of the device under test 200 is a plane, the central wavelength of the quarter-wave plate 220 and the wavelength of the light L of the device under test 200 may be 532nm, but not limited thereto.
In addition, the polarization adjustment assembly 120 of the optical detection system 100 faces the light-emitting surface 112 of the light source 110. The polarization adjustment assembly 120 includes a depolarizer 122 and a second linear polarizer 124. The depolarizer 122 of the polarization adjustment assembly 120 is located between the light source 110 and the second linear polarizer 124. The second linear polarizer 124 of the polarization adjustment assembly 120 is located between the depolarizer 122 and the first linear polarizer 210 of the dut 200. The first linear polarizer 210 of the device under test 200 is located between the second linear polarizer 124 of the polarization adjustment assembly 120 and the quarter-wave plate 220 of the device under test 200. The second polarizer 124 and the dut 200 may be rotatably disposed on the rotation system. In some embodiments, the detection unit 130 is located on a side of the device under test 200 opposite to the polarization adjustment assembly 120. That is to say, the detecting unit 130 and the polarization adjusting assembly 120 are located at two opposite sides of the to-be-tested assembly 200, the first linear polarizer 210 of the to-be-tested assembly 200 is closer to the polarization adjusting assembly 120 than the quarter-wave plate 220, and the quarter-wave plate 220 of the to-be-tested assembly 200 is closer to the detecting unit 130 than the first linear polarizer 210.
In some embodiments, the device under test 200 may include a substrate 230. The first linear polarizer 210 and the quarter-wave plate 220 of the dut 200 are attached to two opposite sides of the substrate 230, and the substrate 230 may be made of glass or polymer material. The detection unit 130 of the optical detection system 100 may include a processor or chip with a default circuit layout or built-in application. The detecting unit 130 can calculate the light intensity, the circular polarization direction and the light rotation intensity received by the device under test 200, so as to achieve the effect of performing optical alignment detection on the device under test 200. For example, the optical inspection system 100 can detect whether the device under test 200 has the proper polarization direction and angle. When a user wears the virtual reality glasses to watch a stereoscopic image, phenomena such as the inclination of a penetrating axis or crosstalk (crosstalk) can be reduced.
It should be understood that the connection and function of the components described above will not be repeated and will be described in detail. In the following description, the operation method of the optical detection system will be explained.
FIG. 2 is a flow chart illustrating a method of operating an optical inspection system according to an embodiment of the present disclosure. The method of operation of the optical detection system includes the following steps. First, in step S1, light is emitted to the polarization adjustment assembly by the light source. In step S2, the light is converted into linearly polarized light by the polarization adjustment assembly and transmitted to the device under test, wherein the device under test has a first linear polarizer and a quarter-wave plate, and the first linear polarizer is located between the polarization adjustment assembly and the quarter-wave plate. Then, in step S3, the linearly polarized light is converted into circularly polarized light by the component to be tested and emitted to the detection unit. Next, in step S4, a phase difference angle between the absorption axis of the first linear polarizer of the device under test and the fast axis of the quarter-wave plate of the device under test is calculated according to the circularly polarized light. In the following description, each of the above-described steps will be described in detail.
Referring to fig. 1 and 3, first, light L may be emitted to the polarization adjustment assembly 120 by the light source 110. For example, the light source 110 can be a laser light source 110, and the light source 110 can emit green laser light with a wavelength of 532nm to the depolarizer 122 of the polarization adjustment assembly 120. In some embodiments, the depolarizer 122 of the polarization adjustment assembly 120 can convert the received light L into unpolarized light P1 and transmit the unpolarized light P1 to the second linear polarizer 124 of the polarization adjustment assembly 120. The second polarizer 124 of the polarization adjustment assembly 120 may convert the received unpolarized light P1 into a linearly polarized light P2, and emit the linearly polarized light P2 to the device under test 200.
In some embodiments, the device under test 200 has a first linear polarizer 210, a quarter-wave plate 220, and a substrate 230 between the first linear polarizer 210 and the quarter-wave plate 220. For example, the device under test 200 may be a lens of Virtual Reality (VR) glasses, but not limited thereto. In some embodiments, the center wavelength of the quarter-wave plate 220 of the dut 200 is the same as the wavelength of the light L. For example, the central wavelength of the quarter-wave plate 220 of the dut 200 and the wavelength of the light L may be 532nm, but not limited thereto. The dut 200 may convert the received linearly polarized light P2 into circularly polarized light P3, and emit the circularly polarized light P3 to the light receiving surface 132 of the detecting unit 130.
In some embodiments, the detection unit 130 may include a processor or chip with a default circuit layout or built-in application. The detecting unit 130 can calculate the elliptical polarization rate (elipticity) of the device under test 200 according to the circularly polarized light P3. In detail, the second linear polarizer 124 of the polarization adjustment assembly 120 can be rotated by the rotation system or a stage (not shown) carrying the to-be-detected assembly 200 can be rotated by the rotation system to obtain the light intensity and the optical rotation intensity of the to-be-detected assembly 200, and the detection unit 130 can calculate the maximum elliptical polarization rate of the to-be-detected assembly 200 according to the light intensity and the optical rotation intensity of the to-be-detected assembly 200. For example, the detecting unit 130 can measure the light intensity and the optical rotation intensity every 10 degrees of rotation of the second polarizer 124 or the stage carrying the dut 200, and the detecting unit 130 can calculate the elliptical polarization rate of the dut 200 using a Stokes vector (Stokes vector). The numerical expression of the elliptical polarization rate can be
Where I, Q, U and V are the four parameters of the Steckey vector.
After calculating the maximum elliptical polarization rate of the to-be-measured component 200, the detecting unit 130 may convert the value of the maximum elliptical polarization rate into a phase difference angle between an absorption axis (see fig. 3) of the first linear polarizer 210 of the to-be-measured component 200 and a fast axis (see fig. 3) of the quarter-wave plate 220 of the to-be-measured component 200. For example, the angle a between the azimuth angle and the fast axis of the quarter-wave plate 220 is subtracted by the angle b (negative) between the azimuth angle and the absorption axis of the first linear polarizer 210, and then the theoretical value (i.e., 135 degrees) is subtracted to obtain the phase difference angle.
Specifically, when the phase difference angle approaches 0, the optical inspection system 100 can determine that the absorption axis (i.e., the linear polarization direction) of the first linear polarizer 210 and the fast axis (i.e., the circular polarization direction) of the quarter-wave plate 220 of the dut 200 are not shifted, thereby ensuring that each dut 200 inspected by the optical inspection system 100 has the same quality. In addition, when the inspection unit 130 of the optical inspection system 100 inspects the device under test 200, the material-related parameters (such as thickness, refractive index and extinction coefficient) of the device under test 200 do not need to be input, so that the inspection time of the optical inspection system 100 can be saved and the overall operation complexity can be reduced.
Fig. 4A to 7 are graphs showing the relationship between the phase difference angle and the elliptical polarization ratio according to various embodiments of the present disclosure. Referring to fig. 1, 4A and 4B, when the surface of the device under test 200 is a plane, the reference wavelength of the light L and the center wavelength of the quarter-wave plate 220 may be 532 nm. In fig. 4A and 4B, the horizontal axis represents the value of the difference angle (degrees) and the vertical axis represents the value of the elliptical polarization rate (maximum 1). The diamond symbols are experimental values at a reference wavelength of 532 nm. The measurement line 410 and the experimental line 420 with diamond symbols show that the larger the elliptical polarization ratio (elipticity), the smaller the phase difference angle, which indicates the more accurate the alignment of the absorption axis (i.e. linear polarization direction) of the first linear polarizer 210 and the fast axis (i.e. circular polarization direction) of the quarter-wave plate 220 of the device under test 200. For example, the experimental line segment 420 may be obtained by mathematical simulation software (e.g., LightTools). In the real measurement line 410 and the experimental line 420 of the experimental data model, the elliptical polarization ratio and the phase difference angle both exhibit negative correlation characteristics, i.e., the larger the elliptical polarization ratio, the smaller the absolute value of the phase difference angle. In addition, the R squared (R squared) may be calculated by the metrology segment 410. The R-square may also be referred to as a decision Coefficient (Coefficient of determination). The model has higher explanatory power as the R square approaches 1, and has model explanatory power as long as the R square is greater than 0.75. In the present embodiment, the R-square of the real measurement line segment 410 may be 0.78.
Referring to fig. 1, 5A, 5B and 5C, when the surface of the device under test 200 is a curved surface, the reference wavelength of the light L and the center wavelength of the quarter-wave plate 220 may be 589 nm. In fig. 5, the horizontal axis is a value of the phase difference angle, and the vertical axis is a value of the elliptical polarization rate. From the measurement line 510 and the experimental line 520, it can be known that the larger the elliptical polarization ratio (Ellipticity), the smaller the phase difference angle, which means that the absorption axis (i.e. linear polarization direction) of the first linear polarizer 210 and the fast axis (i.e. circular polarization direction) of the quarter-wave plate 220 of the device under test 200 are not shifted. For example, the experimental segment 520 may be obtained by mathematical simulation software (e.g., Zemax). In the real measurement line 510 and the experimental line 520 of the experimental data model, the elliptical polarization ratio and the phase difference angle both have a negative correlation characteristic, i.e. the larger the elliptical polarization ratio is, the smaller the absolute value of the phase difference angle is. In addition, in the present embodiment, the R-square of the real measurement line segment 410 may be 0.94. Fig. 5C shows the property that the elliptical polarization ratios and the phase difference angles of the measurement line 510 and the experimental line 520 are negatively correlated even though the measurement line 510 and the experimental line 520 have slight data difference.
The experimental segment 610 of fig. 6A shows the numerical variation of the phase difference angle between 1 degree and 1.5 degrees and the elliptical polarization ratio. The experimental segment 620 of fig. 6B shows the numerical variation of the phase difference angle between 1.6 degrees and 5 degrees and the elliptical polarization ratio. Referring to fig. 1, fig. 6A and fig. 6B, when the surface of the device 200 to be measured is a curved surface, the reference wavelength of the light L and the central wavelength of the quarter-wave plate 220 may be about 587.6 nm. For example, the experimental segment 610 and the experimental segment 620 may be obtained by mathematical simulation software (e.g., Zemax). In fig. 6A and 6B, the horizontal axis represents the value of the difference angle, and the vertical axis represents the value of the elliptical polarization ratio. When the phase difference angle is about 1 degree, the maximum elliptical polarization rate (Ellipticity) is obtained, namely, the elliptical polarization rate is about 0.966. When the phase difference angle is about 5 degrees, the elliptical polarization ratio (Ellipticity) is small, namely the elliptical polarization ratio is about 0.84. The elliptical polarization ratios in fig. 6A and 6B are both inversely related to the retardation angle, that is, the larger the elliptical polarization ratio is, the smaller the absolute value of the retardation angle is. In the present embodiment, the R-square of the experimental segment 610 and the experimental segment 620 may be 0.999.
The ideal line 710 in FIG. 7 shows the numerical variation of the elliptical polarization ratio and the phase difference angle of the DUT 200 without the laser spot from the light source 110. The measurement line 720 of fig. 7 shows the numerical variation of the elliptical polarization ratio and the phase difference angle of the dut 200 when the laser spot of the light source 110 is 3 millimeters (mm). The measurement line 730 of fig. 7 shows the numerical variation of the elliptical polarization ratio and the phase difference angle of the dut 200 when the laser spot of the light source 110 is 5 millimeters (mm). Referring to fig. 1 and 7, the horizontal axis represents the value of the angle difference, and the vertical axis represents the value of the elliptical polarization rate. The laser spot of the light source 110 is 3mm corresponding to the deviation of the expression beam L from the optical axis by 1.5mm, and the laser spot of the light source 110 is 5mm corresponding to the deviation of the expression beam L from the optical axis by 2.5 mm. For the curved dut 200, the ideal line 710 has a slight difference from the measurement line 720 with the laser spot and the measurement line 730, but the elliptical polarization rate and the difference angle still show a negative correlation, i.e. the larger the elliptical polarization rate, the smaller the absolute value of the difference angle.
FIG. 8A is a graph illustrating the relationship between angle and light intensity according to an embodiment of the disclosure. FIG. 8B is a graph showing the relationship between the angle and the elliptical polarization rate according to an embodiment of the present disclosure. The horizontal axis of fig. 8A is the value of the phase difference angle, and the vertical axis is the value of the light intensity. The horizontal axis of fig. 8B is a value of the phase difference angle, and the vertical axis is a value of the elliptical polarization rate. In some embodiments, the mathematical expression for the elliptical polarization rate may be
Where I, Q, U and V are the four parameters of the Steckey vector. For example, when the angle of the measurement line 810 is between 130 degrees and 140 degrees, the device 200 under test has the maximum light intensity, i.e., the maximum I parameter and the maximum V parameter. When the dut 200 has the maximum light intensity (i.e., has the maximum I parameter and the maximum V parameter), the measurement line 820 has the maximum elliptical polarization rate of the dut 200, i.e., the elliptical polarization rate is about 0.99. That is, the I and V parameters of the dut 200 affect the elliptical polarization ratio of the dut 200.
In the following description, other forms of optical detection systems will be described.
FIG. 9 is a schematic diagram illustrating an operation of an optical inspection system 100a according to another embodiment of the present disclosure. The difference from the embodiment shown in fig. 1 is that the optical detection system 100a further includes a beam reducer 140. The beam shrinking mirror 140 is located between the device under test 200 and the detecting unit 130. When the circularly polarized light P3 passes through the device under test 200 with a curved surface, the spot diameter may be enlarged, and the beam shrinking mirror 140 may shrink the spot diameter of the circularly polarized light P3 passing through the device under test 200 to between 0.1mm and 5mm, so that the laser spot of the circularly polarized light P3 after shrinking can be completely received by the detecting unit 130.
In summary, the detecting unit of the optical detecting system can calculate the phase difference angle between the absorption axis of the first linear polarizer of the to-be-detected component and the fast axis of the quarter-wave plate of the to-be-detected component according to the circularly polarized light passing through the to-be-detected component. When the phase difference angle approaches 0, the optical detection system can determine that the absorption axis (i.e. linear polarization direction) of the first linear polarizer of the device under test and the fast axis (i.e. circular polarization direction) of the quarter-wave plate have no deviation, thereby ensuring that each device under test detected by the optical detection system has the same quality performance. In addition, when the detection unit of the optical detection system detects the component to be detected, the material related parameters (such as thickness, refractive index and extinction coefficient) of the component to be detected do not need to be input, so that the detection time of the optical detection system can be saved, and the overall operation complexity can be reduced.
The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions and alterations herein without departing from the spirit and scope of the present disclosure.
Claims (11)
1. An optical inspection system configured to inspect a dut having a first linear polarizer and a quarter-wave plate, the optical inspection system comprising:
a light source having a light emitting surface and configured to emit light;
a polarized light adjusting component facing the light-emitting surface of the light source and configured to convert the light into linearly polarized light, wherein the first linear polarizer is located between the polarized light adjusting component and the quarter-wave plate, and the component to be tested is configured to convert the linearly polarized light into circularly polarized light; and
and the detection unit is positioned on one side of the to-be-detected assembly back to the polarized light adjusting assembly and is configured to calculate a phase difference angle between the absorption axis of the first linear polarizer of the to-be-detected assembly and the fast axis of the quarter wave plate of the to-be-detected assembly according to the circularly polarized light.
2. The optical inspection system of claim 1, wherein the polarization adjustment assembly comprises:
the depolarizer is positioned between the light source and the first linear polaroid of the component to be tested and is configured to convert the light into unpolarized light.
3. The optical inspection system of claim 2, wherein the polarization adjustment assembly further comprises:
the second linear polarizer is positioned between the depolarizer and the first linear polarizer of the component to be tested and is configured to convert the unpolarized light into the linearly polarized light.
4. The optical inspection system of claim 1, further comprising:
and the beam shrinking mirror is positioned between the component to be detected and the detection unit.
5. The optical detection system of claim 1, wherein the center wavelength of the quarter-wave plate is the same as the wavelength of the light.
6. The optical inspection system of claim 1, wherein the light source is a laser light source.
7. A method of operating an optical inspection system, comprising:
transmitting light to the polarization adjustment assembly through the light source;
converting the light into linearly polarized light through the polarized light adjusting assembly and transmitting the linearly polarized light to a component to be tested, wherein the component to be tested is provided with a first linear polarizer and a quarter wave plate, and the first linear polarizer is positioned between the polarized light adjusting assembly and the quarter wave plate;
converting the linearly polarized light into circularly polarized light through the component to be detected and transmitting the circularly polarized light to a detection unit; and
and calculating the phase difference angle between the absorption axis of the first linear polarizer of the component to be tested and the fast axis of the quarter-wave plate of the component to be tested according to the circularly polarized light.
8. The method of claim 7, wherein calculating the phase difference angle from the circularly polarized light further comprises:
rotating the component to be tested to obtain the light intensity and the optical rotation intensity of the component to be tested; and
and calculating the maximum elliptical polarization rate of the component to be tested according to the light intensity and the optical rotation intensity.
9. The operating method according to claim 7, wherein converting the light into the linearly polarized light by the polarization adjustment assembly and emitting the linearly polarized light to the dut further comprises:
the light is converted into non-polarized light by the depolarizer of the polarization adjustment assembly and is emitted to the second linear polarizer of the polarization adjustment assembly; and
the polarized light is converted into the linearly polarized light by the second linearly polarizer of the polarized light adjusting assembly and is emitted to the assembly to be measured.
10. The method of claim 9, wherein calculating the phase difference angle from the circularly polarized light further comprises:
rotating the second linear polarizer to obtain the light intensity and the optical rotation intensity of the component to be measured; and
and calculating the maximum elliptical polarization rate of the component to be detected according to the light intensity and the optical rotation intensity.
11. The operating method of claim 7, wherein converting the linearly polarized light into the circularly polarized light by the device under test and transmitting the circularly polarized light to the detecting unit further comprises:
the diameter of the light spot of the circularly polarized light passing through the component to be detected is reduced to between 0.1 millimeter and 5 millimeters through a beam shrinking mirror and is transmitted to the detection unit.
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| CN202210653794.6A CN115031928A (en) | 2022-06-10 | 2022-06-10 | Optical detection system and method of operation thereof |
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Cited By (1)
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| CN117782525A (en) * | 2023-11-22 | 2024-03-29 | 珠海广浩捷科技股份有限公司 | VR lens QWP film and linear polarizer positioning test machine and positioning method |
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| CN114035338B (en) * | 2021-11-23 | 2024-05-07 | 四川中科朗星光电科技有限公司 | Device for generating mixed-order Poincare light beam |
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| CN117782525A (en) * | 2023-11-22 | 2024-03-29 | 珠海广浩捷科技股份有限公司 | VR lens QWP film and linear polarizer positioning test machine and positioning method |
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