TW202348939A - Furnace and sintering furnace comprising same - Google Patents

Furnace and sintering furnace comprising same Download PDF

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Publication number
TW202348939A
TW202348939A TW112101344A TW112101344A TW202348939A TW 202348939 A TW202348939 A TW 202348939A TW 112101344 A TW112101344 A TW 112101344A TW 112101344 A TW112101344 A TW 112101344A TW 202348939 A TW202348939 A TW 202348939A
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Taiwan
Prior art keywords
furnace
pair
processing element
space
conveying
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TW112101344A
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Chinese (zh)
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王傳波
劉維洲
王文博
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美商伊利諾工具工程公司
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Publication of TW202348939A publication Critical patent/TW202348939A/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/12Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/10Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated heated by hot air or gas
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36Arrangements of heating devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67248Temperature monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • B23K1/0008Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0016Brazing of electronic components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • B23K1/008Soldering within a furnace
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/12Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
    • F27B2009/124Cooling
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36Arrangements of heating devices
    • F27B2009/3638Heaters located above and under the track
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27MINDEXING SCHEME RELATING TO ASPECTS OF THE CHARGES OR FURNACES, KILNS, OVENS OR RETORTS
    • F27M2003/00Type of treatment of the charge
    • F27M2003/04Sintering
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Furnace Details (AREA)
  • Tunnel Furnaces (AREA)
  • Powder Metallurgy (AREA)

Abstract

The invention discloses a furnace and a sintering furnace comprising the same, and the furnace comprises a hearth which comprises an upper hearth and a lower hearth which are oppositely arranged; and a conveying device; wherein in the height direction of the hearth, the conveying space comprises a conveying device containing space and a machining element containing space, the conveying device containing space is located below the machining element containing space, and the conveying device is contained in the conveying device containing space; the machining element containing space is used for containing the machining element when the machining element is vertically borne on the conveying device. According to the furnace, the processing element can be vertically carried on the conveying belt and is heated or cooled through the hearth. Compared with a furnace which generally places the machining elements on a conveying belt in a flat laying mode, under the condition of the same conveying speed and length, the furnace can process more machining elements in unit time, and higher working efficiency is achieved.

Description

爐及包括其的燒結爐Furnaces and sintering furnaces including them

本案涉及一種爐,特別涉及一種用於烘乾光伏裝置的爐。This case relates to a furnace, specifically a furnace used for drying photovoltaic devices.

在晶體矽太陽能電池矽晶片等光伏裝置的生產中,需要使用燒結爐對光伏裝置進行燒結加工。燒結爐通常包括烘乾段、燒結段以及冷卻段。其中用銀漿等漿料印刷過的光伏裝置經傳送帶輸送依次經過烘乾段、燒結段以及冷卻段,再被傳送帶輸送離開燒結爐。In the production of photovoltaic devices such as crystalline silicon solar cell silicon wafers, a sintering furnace is required for sintering the photovoltaic devices. The sintering furnace usually includes a drying section, a sintering section and a cooling section. The photovoltaic device printed with silver paste and other pastes is transported by a conveyor belt through the drying section, sintering section and cooling section, and then is conveyed by the conveyor belt to leave the sintering furnace.

本案在第一方面的至少一個目的是提供一種爐,包括:爐膛和輸送裝置。所述爐膛包括相對設置的上爐膛和下爐膛,所述上爐膛和所述下爐膛之間具有沿所述爐膛的長度方向延伸穿過所述爐膛的輸送空間。所述輸送裝置用於承載並使加工元件在所述輸送空間中移動通過所述爐膛。其中在所述爐膛的高度方向上,所述輸送空間包括輸送裝置容納空間和加工元件容納空間。所述輸送裝置容納空間位於所述加工元件容納空間的下方,所述輸送裝置被容納在所述輸送裝置容納空間中,所述加工元件容納空間用於當所述加工元件豎立地被承載在所述輸送裝置上時,容納所述加工元件。At least one purpose of the first aspect of this case is to provide a furnace including: a furnace and a conveying device. The furnace includes an upper furnace and a lower furnace arranged oppositely. There is a transportation space extending through the furnace along the length direction of the furnace between the upper furnace and the lower furnace. The conveying device is used to carry and move processing elements through the furnace in the conveying space. Wherein, in the height direction of the furnace, the conveying space includes a conveying device accommodation space and a processing element accommodation space. The conveying device accommodating space is located below the processing element accommodating space, the conveying device is accommodated in the conveying device accommodating space, and the processing element accommodating space is used when the processing element is carried upright. When placed on the conveyor device, the processing element is accommodated.

根據上述第一方面,所述上爐膛包括一對相對設置在所述爐膛的寬度方向上、沿所述爐膛的長度方向延伸的上爐膛側部。所述下爐膛包括一對相對設置在所述爐膛的寬度方向上、沿所述爐膛的長度方向延伸的下爐膛側部。其中所述一對上爐膛側部和所述一對下爐膛側部相應地連接。並且在所述爐膛的高度方向上,所述上爐膛的底部與所述一對上爐膛側部的底部間隔一定距離,所述下爐膛的頂部和所述一對下爐膛側部的頂部間隔一定距離,以使得在所述上爐膛的底部和所述下爐膛的頂部之間形成所述輸送空間。其中所述爐膛還包括一對側部升高部。所述一對側部升高部相對地設置在所述爐膛的寬度方向上、並沿所述爐膛的長度方向延伸。所述一對側部升高部設置在所述上爐膛側部的底部及/或所述下爐膛側部的頂部,以使得當所述加工元件豎立地被承載在所述輸送裝置上時,所述加工元件容納空間能夠容納所述加工元件。According to the above first aspect, the upper furnace includes a pair of upper furnace side portions arranged oppositely in the width direction of the furnace and extending along the length direction of the furnace. The lower furnace includes a pair of lower furnace side portions arranged oppositely in the width direction of the furnace and extending along the length direction of the furnace. The pair of upper furnace side portions and the pair of lower furnace side portions are connected correspondingly. And in the height direction of the furnace, the bottom of the upper furnace is spaced at a certain distance from the bottoms of the pair of upper furnace sides, and the top of the lower furnace is spaced from the tops of the pair of lower furnace sides at a certain distance. The distance is such that the conveying space is formed between the bottom of the upper furnace and the top of the lower furnace. The furnace further includes a pair of side elevations. The pair of side raised portions are arranged oppositely in the width direction of the furnace and extend along the length direction of the furnace. The pair of side raised parts are provided at the bottom of the upper furnace side and/or the top of the lower furnace side, so that when the processing element is carried upright on the conveying device, The processing element receiving space can accommodate the processing element.

根據上述第一方面,所述一對側部升高部分別設置在所述一對下爐膛側部的頂部,並與所述一對上爐膛側部相連。According to the above first aspect, the pair of side raised portions are respectively provided on the tops of the pair of lower furnace side portions and connected to the pair of upper furnace side portions.

根據上述第一方面,所述爐還包括鉸鏈裝置。所述鉸鏈裝置包括連接桿和支撐桿。所述連接桿與所述上爐膛連接,所述支撐桿被固定,所述連接桿和所述支撐桿通過軸可轉動地連接,其中所述鉸鏈裝置被配置為通過驅動所述連接桿相對於所述支撐桿轉動,能夠相對於所述下爐膛翻開所述上爐膛。According to the above first aspect, the furnace further includes hinge means. The hinge device includes a connecting rod and a supporting rod. The connecting rod is connected to the upper furnace, the support rod is fixed, the connecting rod and the support rod are rotatably connected through a shaft, wherein the hinge device is configured to drive the connecting rod relative to The support rod rotates to open the upper furnace relative to the lower furnace.

根據上述第一方面,所述加工元件容納空間的高度為200~300mm。According to the above first aspect, the height of the processing element accommodation space is 200~300mm.

根據上述第一方面,所述爐被配置為提供加熱以烘乾所述加工元件,從而從所述加工元件中移除有機物。According to the above first aspect, the furnace is configured to provide heat to dry the processing element to remove organic matter from the processing element.

根據上述第一方面,所述爐膛包括數個加熱單元,各個加熱單元沿所述爐膛的長度方向並排地設置,並被配置為各自獨立地通過加熱元件提供所述熱。According to the above first aspect, the furnace includes a plurality of heating units, each heating unit being arranged side by side along the length of the furnace and configured to independently provide the heat through a heating element.

根據上述第一方面,每個所述加熱單元包括風機元件、上部分隔件和下部分隔件,所述上部分隔件設置在所述上爐膛中,並且所述上部分隔件的底部形成所述上爐膛的底部,所述下部分隔件設置在所述下爐膛中,並且所述下部分隔件的頂部形成所述下爐膛的頂部,其中風機組件、所述上部分隔件和所述下部分隔件被配置為所述加熱單元中的氣體能夠在各自的單元內部流動,以使得所述加熱元件提供的所述熱均勻地擴散至所述加工元件。According to the above first aspect, each of the heating units includes a fan element, an upper partition and a lower partition, the upper partition is disposed in the upper furnace, and the bottom of the upper partition forms the upper furnace the bottom of the lower furnace, the lower partition is disposed in the lower furnace, and the top of the lower partition forms the top of the lower furnace, wherein the fan assembly, the upper partition and the lower partition are configured as The gases in the heating units are able to flow inside the respective units so that the heat provided by the heating elements diffuses evenly to the processing elements.

根據上述第一方面,所述爐還包括兩個端部阻隔部,所述兩個端部阻隔部分別設置在所述爐膛的入口端和出口端,其中每個所述端部阻隔部中包括氣簾裝置和排氣裝置,所述端部阻隔部被配置為阻隔所述爐膛內部和外部環境中的氣體流通,以使得所述爐膛內的氣體中的氧氣含量達到預設值。According to the above first aspect, the furnace further includes two end blocking parts, the two end blocking parts are respectively provided at the inlet end and the outlet end of the furnace, wherein each of the end blocking parts includes An air curtain device and an exhaust device, the end blocking part is configured to block gas circulation inside the furnace and the external environment, so that the oxygen content in the gas in the furnace reaches a preset value.

根據上述第一方面,所述加工元件為光伏裝置。According to the above first aspect, the processing element is a photovoltaic device.

根據上述第一方面,所述加工元件為電路板,所述爐被配置為用於回流焊接所述電路板。According to the above first aspect, the processing element is a circuit board, and the furnace is configured for reflow soldering of the circuit board.

本案在第二方面的至少一個目的是提供一種燒結爐,所述燒結爐包括烘乾段、燒結段和冷卻段。其中所述烘乾段包括第一方面中任一項所述的爐。At least one object of the second aspect of this case is to provide a sintering furnace, which includes a drying section, a sintering section and a cooling section. The drying section includes the furnace described in any one of the first aspects.

通過下文中參照附圖對本案所作的描述,本案的其它目的和優點將顯而易見,並可幫助對本案有全面的理解。Through the following description of this case with reference to the accompanying drawings, other purposes and advantages of this case will be apparent and can help to have a comprehensive understanding of this case.

下面將參考構成本說明書一部分的附圖對本案的各種具體實施方式進行描述。應該理解的是,雖然在本案中使用表示方向的術語,諸如 「前」、「後」、「上」、「下」、「左」、「右」、「頂」、「底」、「內」、「外」等描述本案的各種示例結構部分和元件,但是在此使用這些術語只是為了方便說明的目的,基於附圖中顯示的示例方位而決定的。由於本案所揭示的實施例可以按照不同的方向設置,所以這些表示方向的術語只是作為說明而不應視作為限制。Various specific embodiments of the present invention will be described below with reference to the accompanying drawings that form a part of this specification. It should be understood that although terms indicating direction are used in this case, such as "front", "back", "upper", "lower", "left", "right", "top", "bottom", "inner" ”, “outside”, etc. describe various example structural parts and elements of the present invention, but these terms are used here for convenience of explanation only and are determined based on the orientation of the examples shown in the drawings. Since the embodiments disclosed in this case can be arranged in different directions, these terms indicating directions are for illustration only and should not be regarded as limiting.

圖1A和圖1B為根據本案的一個實施例的爐100的結構圖,其中圖1A為立體結構圖,圖1B為簡化原理示意圖。如圖1A和圖1B所示,爐100包括爐膛112、輸送裝置118和支架111,爐膛112支撐在支架111的上方。爐膛112包括上爐膛113和下爐膛114,以及設置在上爐膛113和下爐膛114之間的輸送空間120。輸送空間120沿爐膛112的長度方向L延伸穿過爐膛112。輸送裝置118沿爐膛112的長度方向L貫穿爐膛112,用於承載並使加工元件110從爐膛112的入口端151(即圖1B中的左端)進入輸送空間120,在輸送空間120中移動通過爐膛112後,從爐膛112的出口端152(即圖1B中的右端)輸出。輸送裝置118用於承載並使加工元件110在輸送空間120中沿著輸送方向移動通過爐膛112。輸送裝置118包括傳送帶115,加工元件110被承載在傳送帶115上。Figures 1A and 1B are structural diagrams of a furnace 100 according to an embodiment of the present invention, wherein Figure 1A is a three-dimensional structural diagram, and Figure 1B is a simplified schematic diagram of the principle. As shown in FIGS. 1A and 1B , the furnace 100 includes a furnace 112 , a conveying device 118 and a bracket 111 . The furnace 112 is supported above the bracket 111 . The furnace 112 includes an upper furnace 113 and a lower furnace 114, and a transport space 120 provided between the upper furnace 113 and the lower furnace 114. The conveying space 120 extends through the furnace 112 along the length direction L of the furnace 112 . The conveying device 118 penetrates the furnace 112 along the length direction L of the furnace 112, and is used to carry and enable the processing element 110 to enter the conveying space 120 from the entrance end 151 of the furnace 112 (ie, the left end in FIG. 1B), and move through the furnace in the conveying space 120. 112, it is output from the outlet end 152 of the furnace 112 (ie, the right end in Figure 1B). The conveying device 118 is used to carry and move the processing element 110 in the conveying space 120 along the conveying direction through the furnace 112 . The conveying device 118 includes a conveyor belt 115 on which the processing elements 110 are carried.

在爐膛112的高度方向H上,上爐膛113的底部135和下爐膛114的頂部136之間形成輸送空間120。輸送空間120包括輸送裝置容納空間142和加工元件容納空間141,輸送裝置容納空間142位於加工元件容納空間141的下方。輸送裝置容納空間和加工元件容納空間141由用於承載加工元件110的傳送帶115分隔形成。加工元件容納空間141具有高度D1,即上爐膛113的底部135與傳送帶115間隔D1,加工元件容納空間141用於容納加工元件110。輸送裝置容納空間142具有高度D2,即下爐膛114的頂部136與傳送帶115間隔D2,輸送裝置容納空間142用於容納輸送裝置118。在本案的實施例中,加工元件110被豎立地放置在輸送裝置118的傳送帶115上,加工元件容納空間141的高度D1被設置為與加工元件110的最大高度匹配,以使得加工元件容納空間141能夠容納豎立放置時的加工元件110。In the height direction H of the furnace 112, a transport space 120 is formed between the bottom 135 of the upper furnace 113 and the top 136 of the lower furnace 114. The conveying space 120 includes a conveying device accommodating space 142 and a processing element accommodating space 141. The conveying device accommodating space 142 is located below the processing element accommodating space 141. The conveyor accommodation space and the processing element accommodation space 141 are separated by a conveyor belt 115 for carrying the processing element 110 . The processing element accommodating space 141 has a height D1, that is, the distance D1 between the bottom 135 of the upper furnace 113 and the conveyor belt 115. The processing element accommodating space 141 is used to accommodate the processing element 110. The conveying device accommodating space 142 has a height D2, that is, the distance D2 between the top 136 of the lower furnace 114 and the conveyor belt 115, and the conveying device accommodating space 142 is used to accommodate the conveying device 118. In the embodiment of this case, the processing element 110 is placed vertically on the conveyor belt 115 of the conveying device 118, and the height D1 of the processing element accommodation space 141 is set to match the maximum height of the processing element 110, so that the processing element accommodation space 141 Capable of accommodating the processing element 110 when placed upright.

在爐膛112的長度方向L上,爐100包括設置在爐膛入口端151和出口端152的兩個端部阻隔部108,以及設置在兩個端部阻隔部108之間的數個加熱單元101和至少一個冷卻單元102。端部阻隔部108用於阻隔爐膛112內部和外部環境的氣體流通,以使得爐膛112內部的氣體中的氧氣含量可以被控制在預定的某一範圍內。在本實施例中,每個端部阻隔部108中包括一個氣簾裝置109和一個排氣裝置154,排氣裝置154設置在氣簾裝置109的外側。排氣裝置154用於排出爐膛入口端151和出口端152的空氣,氣簾裝置109中包括一對端部阻隔箱107,一對端部阻隔箱107的出風口面對面放置。每個端部阻隔箱107分別各自與惰性氣體源153a和惰性氣體源153b流體連通,以通過相對流動的惰性氣體氣流來產生氣簾。雖然圖1B中示出的上爐膛113中的端部阻隔箱107和下爐膛114中的端部阻隔箱107連接至不同的惰性氣體源,但是在其他實施例中,它們也可以連接至同一個惰性氣體源。通過設置排氣裝置154和氣簾裝置109,能夠減少或大致阻斷爐膛112的內部和外部的氣體流通。進一步地,惰性氣體源153a還與爐膛112的中部流體連通,以向爐膛112內部輸入惰性氣體,輸入的惰性氣體從爐膛112的中部向入口端151和出口端152的方向流動,能夠更好地阻隔爐膛112外部環境的空氣進入爐膛112內部。氣簾裝置109的具體結構將結合圖2A-2C詳細描述。在其他實施例中,端部阻隔部108也可以根據具體需要設置其他結構或其他方式來阻隔爐膛112的內部和外部的氣體流通。In the length direction L of the furnace 112, the furnace 100 includes two end blocking portions 108 disposed at the furnace inlet end 151 and the outlet end 152, and a plurality of heating units 101 and 101 disposed between the two end blocking portions 108. At least one cooling unit 102. The end blocking portion 108 is used to block the gas flow between the interior of the furnace 112 and the external environment, so that the oxygen content in the gas inside the furnace 112 can be controlled within a predetermined range. In this embodiment, each end blocking portion 108 includes an air curtain device 109 and an exhaust device 154, and the exhaust device 154 is disposed outside the air curtain device 109. The exhaust device 154 is used to discharge air from the inlet end 151 and the outlet end 152 of the furnace. The air curtain device 109 includes a pair of end baffle boxes 107, and the air outlets of the pair of end baffle boxes 107 are placed face to face. Each end baffle box 107 is in fluid communication with an inert gas source 153a and an inert gas source 153b, respectively, to create a gas curtain by counter-flowing inert gas streams. Although the end baffle box 107 in the upper furnace chamber 113 and the end baffle box 107 in the lower furnace chamber 114 are shown in FIG. 1B as being connected to different inert gas sources, in other embodiments, they may also be connected to the same source. Source of inert gas. By providing the exhaust device 154 and the air curtain device 109, the gas circulation inside and outside the furnace 112 can be reduced or substantially blocked. Further, the inert gas source 153a is also in fluid communication with the middle part of the furnace 112 to input inert gas into the interior of the furnace 112. The input inert gas flows from the middle part of the furnace 112 toward the inlet end 151 and the outlet end 152, which can better The air from the external environment of the furnace 112 is blocked from entering the interior of the furnace 112 . The specific structure of the air curtain device 109 will be described in detail with reference to FIGS. 2A-2C. In other embodiments, the end blocking portion 108 can also be provided with other structures or other methods according to specific needs to block the gas flow inside and outside the furnace 112 .

數個加熱單元101和至少一個冷卻單元102沿爐膛112的長度方向L並排地設置,並且加熱單元101設置在輸送方向上的上游,冷卻單元102設置在輸送方向上的下游。每個加熱單元101中設有獨立的加熱元件103,以各自獨立地通過加熱元件103提供熱。每個冷卻單元102中設有獨立的冷卻元件(圖中未示出),以各自獨立地通過冷卻元件提供冷。在本實施例中,加熱元件103為加熱棒,冷卻元件為空氣冷卻換熱器或者水冷換熱器。每個加熱單元101和每個冷卻單元102中還設有風機元件104和分隔元件(見圖2A-2C中的上部分隔件245和下部分隔件246)。通過在每個加熱單元101和每個冷卻單元102設置獨立的風機元件104和分隔元件,每個加熱單元101和每個冷卻單元102內的氣體能夠按照一定的流動路徑在各自的單元內部流動,從而使加熱元件103和冷卻元件提供的熱和冷能夠均勻地擴散至加工元件110。Several heating units 101 and at least one cooling unit 102 are arranged side by side along the length direction L of the furnace 112, with the heating unit 101 being arranged upstream in the conveying direction and the cooling unit 102 being arranged downstream in the conveying direction. An independent heating element 103 is provided in each heating unit 101 to provide heat through the heating element 103 independently. An independent cooling element (not shown in the figure) is provided in each cooling unit 102 to provide cooling through the cooling element independently. In this embodiment, the heating element 103 is a heating rod, and the cooling element is an air-cooling heat exchanger or a water-cooling heat exchanger. A fan element 104 and a partition element are also provided in each heating unit 101 and each cooling unit 102 (see upper partition 245 and lower partition 246 in Figures 2A-2C). By arranging independent fan elements 104 and partition elements in each heating unit 101 and each cooling unit 102, the gas in each heating unit 101 and each cooling unit 102 can flow inside the respective units according to a certain flow path, This allows the heat and cold provided by the heating element 103 and the cooling element to be evenly diffused to the processing element 110 .

在爐膛112的長度方向L上,爐100還包括數個鉸鏈裝置121,鉸鏈裝置121固定地連接在上爐膛113上方。鉸鏈裝置121能夠帶動上爐膛113相對於下爐膛114運動,從而打開上爐膛113,以暴露輸送空間120。In the length direction L of the furnace 112, the furnace 100 also includes several hinge devices 121, and the hinge devices 121 are fixedly connected above the upper furnace 113. The hinge device 121 can drive the upper furnace 113 to move relative to the lower furnace 114 , thereby opening the upper furnace 113 to expose the conveying space 120 .

在本實施例中,加工元件110為光伏裝置,例如印刷有漿料的矽晶片等薄片,爐100用於烘乾光伏裝置,移除漿料中的有機溶劑等有機物,以便於光伏裝置後續進行燒結。在其他實施例中,加工元件110也可以為電路板,爐100用於回流焊接電路板上的電子元件。In this embodiment, the processing element 110 is a photovoltaic device, such as a silicon wafer printed with slurry. The furnace 100 is used to dry the photovoltaic device and remove organic solvents and other organic matter in the slurry to facilitate subsequent processing of the photovoltaic device. sintering. In other embodiments, the processing component 110 may also be a circuit board, and the furnace 100 is used to reflow solder the electronic components on the circuit board.

圖2A-圖2C圖示本案的爐100的爐膛112的具體結構,其中圖2A為爐膛112的立體結構圖,圖2B為爐膛112的一個寬度方向的剖視圖,圖2C為爐膛112的一個長度方向的局部剖視圖。如圖2A-圖2C所示,上爐膛113包括上爐膛頂部233和一對上爐膛側部231,一對上爐膛側部231連接在上爐膛頂部233在寬度方向W上的相對兩側,並且每個上爐膛側部231沿長度方向L延伸。下爐膛114包括下爐膛底部234和一對下爐膛側部232,一對下爐膛側部232連接在下爐膛底部234在寬度方向W上的相對兩側,並且每個下爐膛側部232沿長度方向L延伸。每個上爐膛側部231的底部邊沿向外翻折形成上爐膛連接部263,每個下爐膛側部232的底部邊沿向外翻折形成下爐膛連接部264,上爐膛連接部263和下爐膛連接部264通過沿長度方向L延伸的長條狀的密封件227密封地連接在一起,以使得上爐膛113和下爐膛114能夠通過各自的側部連接在一起。由此,爐膛112在寬度方向W上是密封的,防止爐膛112內的氣體從寬度方向W上的兩側溢出。上爐膛側部231的底部邊沿和上爐膛113的底部135之間間隔一定距離,並且下爐膛側部232的頂部邊沿和下爐膛114的頂部136之間間隔一定距離。因此,當上爐膛側部231和下爐膛側部232連接在一起時,在上爐膛113的底部135和下爐膛114的頂部136之間能夠形成輸送空間120。本領域技藝人士可以理解的是,在本案中,上爐膛113的底部135是指的一對上爐膛側部231之間的上爐膛113的底部,並且下爐膛114的頂部136是指的一對下爐膛側部232之間的下爐膛114的頂部。具體來說,上爐膛113還包括上部分隔件245,上部分隔件245的底部形成上爐膛113的底部135。下爐膛114還包括下部分隔件246,下部分隔件246的頂部形成下爐膛114的頂部136。Figures 2A to 2C illustrate the specific structure of the furnace 112 of the furnace 100 in this case. Figure 2A is a three-dimensional structural view of the furnace 112, Figure 2B is a cross-sectional view of the furnace 112 in the width direction, and Figure 2C is a length direction of the furnace 112. Partial cross-section view. As shown in Figures 2A-2C, the upper furnace 113 includes an upper furnace top 233 and a pair of upper furnace side portions 231. The pair of upper furnace side portions 231 are connected to opposite sides of the upper furnace top 233 in the width direction W, and Each upper furnace side portion 231 extends along the length direction L. The lower furnace 114 includes a lower furnace bottom 234 and a pair of lower furnace side portions 232. The pair of lower furnace side portions 232 are connected to opposite sides of the lower furnace bottom 234 in the width direction W, and each lower furnace side portion 232 extends along the length direction. L extension. The bottom edge of each upper furnace side part 231 is folded outward to form an upper furnace connection part 263, and the bottom edge of each lower furnace side part 232 is folded outward to form a lower furnace connection part 264. The upper furnace connection part 263 and the lower furnace part are The connecting portion 264 is sealingly connected together through a strip-shaped sealing member 227 extending along the length direction L, so that the upper furnace 113 and the lower furnace 114 can be connected together through their respective sides. Thereby, the furnace 112 is sealed in the width direction W, preventing the gas in the furnace 112 from escaping from both sides in the width direction W. There is a certain distance between the bottom edge of the upper furnace side 231 and the bottom 135 of the upper furnace 113 , and there is a certain distance between the top edge of the lower furnace side 232 and the top 136 of the lower furnace 114 . Therefore, when the upper furnace side 231 and the lower furnace side 232 are connected together, the conveying space 120 can be formed between the bottom 135 of the upper furnace 113 and the top 136 of the lower furnace 114 . Those skilled in the art can understand that in this case, the bottom 135 of the upper furnace 113 refers to the bottom of the upper furnace 113 between the pair of upper furnace sides 231 , and the top 136 of the lower furnace 114 refers to the pair of The top of the lower furnace 114 between the lower furnace sides 232 . Specifically, the upper furnace 113 also includes an upper partition 245, the bottom of the upper partition 245 forms the bottom 135 of the upper furnace 113. The lower furnace 114 also includes a lower partition 246 , the top of which forms the top 136 of the lower furnace 114 .

為了使得輸送空間120的加工元件容納空間141能夠容納豎立放置的加工元件110,爐膛112還包括一對沿長度方向L延伸的側部升高部140,一對側部升高部140設置在爐膛112的寬度方向W上的相對兩側,並且設置在上爐膛側部231的底部及/或下爐膛側部232的頂部。與不包括側部升高部140的爐相比,爐100通過設置一對側部升高部140,能夠使輸送空間120被加高,從而使得在輸送裝置容納空間142的高度D2保持不變的情況下,加工元件容納空間141的高度能夠被加高至達到D1,即滿足豎立放置的加工元件的高度要求。在本實施例中,一對側部升高部140分別設置在一對下爐膛側部232的頂部,並且與相應的一對上爐膛側部231連接。本領域技藝人士可以理解的是,一對側部升高部140也可以設置在一對上爐膛側部231的底部,並與相應的一對下爐膛側部232連接。或者一對側部升高部140分別設置在一個上爐膛側部231的底部與相應的一個下爐膛側部232的頂部。只要能夠通過升高爐膛側壁的高度,升高加工元件容納空間141的高度即可。在另一些實施例中,如果加工元件110豎立放置在傳送帶115上的高度較小,也可以在輸送空間120的高度保持不變的情況下,通過減小輸送裝置容納空間142的高度D2來升高加工元件容納空間141的高度D1。此時,僅需要降低輸送裝置118的一對導軌219的高度即可。作為一個更具體的示例,加工元件容納空間241的高度約為200~300mm,即可滿足大部分光伏裝置的尺寸要求。In order to enable the processing element accommodating space 141 of the conveying space 120 to accommodate the uprightly placed processing elements 110, the furnace 112 also includes a pair of side elevated portions 140 extending along the length direction L. The pair of side elevated portions 140 are disposed in the furnace. 112 on opposite sides in the width direction W, and are provided at the bottom of the upper furnace side portion 231 and/or the top of the lower furnace side portion 232 . Compared with a furnace that does not include the side raised portions 140, the furnace 100 can increase the height of the conveying space 120 by providing a pair of side raised portions 140, so that the height D2 of the conveying device accommodating space 142 remains unchanged. In this case, the height of the processing element accommodating space 141 can be increased to reach D1, that is, to meet the height requirement of the vertically placed processing element. In this embodiment, a pair of side raised portions 140 are respectively provided on the tops of a pair of lower furnace side portions 232 and are connected to a corresponding pair of upper furnace side portions 231 . Those skilled in the art can understand that a pair of side raised portions 140 can also be provided at the bottom of a pair of upper furnace side portions 231 and connected to a corresponding pair of lower furnace side portions 232 . Or a pair of side raised portions 140 are respectively provided at the bottom of an upper furnace side portion 231 and the top of a corresponding lower furnace side portion 232 . As long as the height of the furnace side wall can be raised, the height of the processing element accommodating space 141 can be raised. In other embodiments, if the height of the processing element 110 placed vertically on the conveyor belt 115 is small, the height of the conveyor space 120 can also be increased by reducing the height D2 of the conveyor device accommodating space 142 while the height of the conveyor space 120 remains unchanged. The height D1 of the high processing component accommodation space 141 . At this time, it is only necessary to lower the height of the pair of guide rails 219 of the conveying device 118 . As a more specific example, the height of the processing element accommodation space 241 is about 200~300 mm, which can meet the size requirements of most photovoltaic devices.

鉸鏈裝置121包括連接桿224和支撐桿222,連接桿224包括豎向段和橫向段,橫向段固定地連接在上爐膛113的頂部233上方。支撐桿222也被固定,例如固定在支架111上。連接桿224的豎向段的一端和支撐桿222的一端通過軸223可轉動地連接。在推動連接桿224的橫向段的另一端(例如圖2B中的右端)時,連接桿224能夠圍繞軸223轉動,以帶動上爐膛113運動而被翻開一定角度,從而暴露輸送空間120。在翻開上爐膛113後,操作人員可以對爐膛112的內部空間進行清洗及維護等操作。翻開上爐膛113後,由於輸送空間120的高度增加,爐膛的整體高度將會更高。受到爐膛整體高度的影響,將側部升高部140分別設置在一對下爐膛側部232的頂部相較於設置在上爐膛側部231的底部來說,能夠更方便翻開上爐膛113後,操作人員對爐膛112的內部空間進行清洗及維護。The hinge device 121 includes a connecting rod 224 and a supporting rod 222. The connecting rod 224 includes a vertical section and a transverse section, and the transverse section is fixedly connected above the top 233 of the upper furnace 113. The support rod 222 is also fixed, for example to the bracket 111 . One end of the vertical section of the connecting rod 224 and one end of the supporting rod 222 are rotatably connected through a shaft 223 . When the other end of the transverse section of the connecting rod 224 is pushed (for example, the right end in FIG. 2B ), the connecting rod 224 can rotate around the axis 223 to drive the upper furnace chamber 113 to move and be opened at a certain angle, thereby exposing the conveying space 120 . After opening the upper furnace 113, the operator can perform operations such as cleaning and maintenance on the internal space of the furnace 112. After the upper furnace 113 is opened, the overall height of the furnace will be higher due to the increased height of the conveying space 120 . Affected by the overall height of the furnace, it is more convenient to open the upper furnace 113 by arranging the side elevated portions 140 at the top of the pair of lower furnace side portions 232 than at the bottom of the upper furnace side portions 231. , the operator cleans and maintains the internal space of the furnace 112.

氣簾裝置109包括在爐膛112的高度方向H上相對設置的一對端部阻隔箱107。每個端部阻隔箱107包括進氣口262和數個導流翅片261,端部阻隔箱107被配置為引導從進氣口262進入端部阻隔箱107的氣體沿著每個導流翅片261流動。例如位於上爐膛113中的端部阻隔箱107a被配置為引導從進氣口262進入的氣體沿著導流翅片261向下流動,位於下爐膛114中的端部阻隔箱107b被配置為引導從進氣口262進入的氣體沿著導流翅片261向上流動。由此,從進氣口262流入的氣體能夠形成氣簾,氣簾能夠減少爐膛112的內外空氣流動。The air curtain device 109 includes a pair of end baffle boxes 107 oppositely arranged in the height direction H of the furnace 112 . Each end baffle box 107 includes an air inlet 262 and a plurality of guide fins 261 . The end baffle box 107 is configured to guide the gas entering the end baffle box 107 from the air inlet 262 along each guide fin. Piece 261 flows. For example, the end baffle box 107a located in the upper furnace 113 is configured to guide the gas entering from the air inlet 262 to flow downward along the guide fins 261, and the end baffle box 107b located in the lower furnace 114 is configured to guide The gas entering from the air inlet 262 flows upward along the guide fins 261 . Therefore, the gas flowing in from the air inlet 262 can form an air curtain, and the air curtain can reduce the air flow inside and outside the furnace 112 .

排氣裝置154位於端部阻隔箱107a的外側,用於抽出爐膛112的入口端151和出口端152處的空氣,使得爐膛112的入口端151和出口端152處大致能夠形成負壓,因此端部阻隔部108處的氣體大致是從爐膛內向爐膛外流動的,從而更好地防止外部空氣進入爐膛112中。並且爐膛112內部的氣體在向外流動後,也能夠及時被排氣裝置154抽走,從而基本上阻隔爐膛112的內部和外部環境中的氣體流體連通。需要說明的是,圖2C中雖然僅示出爐膛112的入口端151處的端部阻隔部108的具體結構,但是本領域技藝人士可以理解的是,在爐膛112的出口端152處也設有相同結構的端部阻隔部108。The exhaust device 154 is located outside the end barrier box 107a and is used to extract the air at the inlet end 151 and the outlet end 152 of the furnace 112, so that a negative pressure can be formed at the inlet end 151 and the outlet end 152 of the furnace 112, so the end The gas at the first barrier portion 108 generally flows from the inside of the furnace to the outside of the furnace, thereby better preventing outside air from entering the furnace 112. Moreover, after the gas inside the furnace 112 flows outward, it can also be extracted by the exhaust device 154 in time, thereby basically blocking the gas fluid communication between the inside of the furnace 112 and the external environment. It should be noted that although FIG. 2C only shows the specific structure of the end blocking portion 108 at the inlet end 151 of the furnace 112, those skilled in the art can understand that there is also an end blocking portion 108 at the outlet end 152 of the furnace 112. The end blocking portion 108 has the same structure.

通過設置端部阻隔部108的氣簾裝置109和排氣裝置154,並且進一步向爐膛112的長度方向L上的中部輸入惰性氣體,能夠基本保持爐膛112內的氣體中的氧氣含量達到一定的範圍,特別適合於印刷有某些漿料的光伏裝置。By arranging the air curtain device 109 and the exhaust device 154 of the end barrier 108, and further inputting inert gas into the middle part of the furnace 112 in the length direction L, the oxygen content in the gas in the furnace 112 can be basically maintained within a certain range. Particularly suitable for photovoltaic devices printed with certain pastes.

圖3圖示包括圖1A所示爐100的一個燒結爐380的示意圖。如圖3所示,燒結爐380包括烘乾段370、燒結段371和冷卻段372,烘乾段370、燒結段371和冷卻段372可以通過同一個輸送裝置373相連,也可以通過各自獨立的輸送裝置相連。在烘乾段370中,光伏裝置印刷的漿料中有機物等能夠揮發。在燒結段371中,光伏裝置上的電極材料和矽加熱達到共晶溫度,矽原子以一定比例溶入到熔融狀態的電極材料中。在冷卻段372中,溶入電極材料中的矽原子重新以固態形式結晶出來,使得電極與矽之間形成歐姆接觸,從而得到太陽能電池。在本實施例中,烘乾段370包括爐100。Figure 3 illustrates a schematic diagram of a sintering furnace 380 including the furnace 100 shown in Figure 1A. As shown in Figure 3, the sintering furnace 380 includes a drying section 370, a sintering section 371 and a cooling section 372. The drying section 370, the sintering section 371 and the cooling section 372 can be connected through the same conveying device 373, or through separate The conveyor is connected. In the drying section 370, organic matter and the like in the slurry printed by the photovoltaic device can volatilize. In the sintering section 371, the electrode material and silicon on the photovoltaic device are heated to the eutectic temperature, and silicon atoms are dissolved into the molten electrode material in a certain proportion. In the cooling section 372, the silicon atoms dissolved in the electrode material crystallize out in a solid state again, so that an ohmic contact is formed between the electrode and the silicon, thereby obtaining a solar cell. In this embodiment, the drying section 370 includes the furnace 100 .

現有的燒結爐的烘乾段、燒結段和冷卻段一般為一體結構,受到框架結構的限制,單獨升高烘乾段中爐的輸送空間的高度十分困難。本案將回流焊爐進行一定改造即可得到能夠烘乾豎立的光伏裝置的爐,特別適合於用於燒結爐的烘乾段,並且也可以用於回流焊接電路板上的電子元件。The drying section, sintering section and cooling section of existing sintering furnaces generally have an integrated structure. Due to the limitations of the frame structure, it is very difficult to independently increase the height of the conveying space of the furnace in the drying section. In this case, the reflow oven can be modified to a certain extent to obtain an oven that can dry upright photovoltaic devices. It is particularly suitable for use in the drying section of sintering furnaces, and can also be used to reflow solder electronic components on circuit boards.

現有的光伏裝置一般為薄板形狀,具有較大的長度和寬度,以及較小的厚度。它們平鋪地被承載在傳送帶上進行烘乾,工作效率有限。本案的爐將加工元件容納空間的高度D1設置為能夠容納豎立放置時的加工元件,也就是說,高度D1被設置為大於或基本等於加工元件的長度和寬度中的最大尺寸。由此,本案的爐能夠使加工元件豎立地被承載在傳送帶上,通過爐膛被加熱或冷卻。與一般將加工元件平鋪地放置在傳送帶上的爐相比,在同樣的傳送速度和長度的條件下,本案的爐能夠在單位時間內處理更多的加工元件,具有更高的工作效率。Existing photovoltaic devices are generally in the shape of thin plates, with large lengths and widths, and small thicknesses. They are carried flat on the conveyor belt for drying, and the work efficiency is limited. The furnace of this case sets the height D1 of the processing element accommodating space to be able to accommodate the processing element when placed upright, that is, the height D1 is set to be greater than or substantially equal to the largest dimension of the length and width of the processing element. Therefore, the furnace of this case enables the processing elements to be carried vertically on the conveyor belt and heated or cooled through the furnace. Compared with furnaces that generally place processing elements flat on a conveyor belt, under the same conveying speed and length, the furnace in this case can process more processing elements per unit time and has higher work efficiency.

並且,本案的爐包括多個獨立提供熱的加熱單元,能夠對各個加熱單元獨立地控制溫度,使得爐膛的內部可以具有更加豐富的溫度曲線,進而為印刷在光伏裝置上的漿料中的有機物提供更多的可能性。In addition, the furnace in this case includes multiple heating units that independently provide heat, and can independently control the temperature of each heating unit, so that the interior of the furnace can have a richer temperature curve, and then the organic matter in the slurry printed on the photovoltaic device can be Provide more possibilities.

此外,本案的爐根據具體需要,還可以控制爐膛內部氣體中的氧氣含量,針對漿料中的某些有機物的去除具有特別好的效果。In addition, the furnace in this case can also control the oxygen content in the gas inside the furnace according to specific needs, and has a particularly good effect on the removal of certain organic matter in the slurry.

本案的爐可以由回流焊爐改造而成,除了保持其可以用於回流焊接電路板上的電子元件的功能外,特別適合於燒結爐的烘乾段。The furnace in this case can be modified from a reflow oven. In addition to maintaining its function of reflow soldering electronic components on circuit boards, it is particularly suitable for the drying section of a sintering furnace.

儘管已經結合以上概述的實施例的實例描述了本案,但是對於本領域中至少具有普通技術的人員而言,各種替代方案、修改、變化、改進及/或基本等同方案,無論是已知的或是現在或可以不久預見的,都可能是顯而易見的。另外,本說明書中所描述的技術效果及/或技術問題是示例性而不是限制性的;所以本說明書中的披露可能用於解決其他技術問題和具有其他技術效果及/或可以解決其他技術問題。因此,如上陳述的本案的實施例的實例旨在是說明性而不是限制性的。在不背離本案的精神或範圍的情況下,可以進行各種改變。因此,本案旨在包括所有已知或較早開發的替代方案、修改、變化、改進及/或基本等同方案。Although the present invention has been described in connection with the examples of embodiments outlined above, various alternatives, modifications, variations, improvements and/or substantial equivalents, whether known or otherwise, will occur to those of at least ordinary skill in the art. It may be obvious whether it is now or can be foreseen in the near future. In addition, the technical effects and/or technical problems described in this specification are illustrative rather than restrictive; therefore, the disclosure in this specification may be used to solve other technical problems and have other technical effects and/or can solve other technical problems. . Accordingly, the examples of embodiments of the present invention set forth above are intended to be illustrative rather than restrictive. Various changes may be made without departing from the spirit or scope of the case. It is therefore intended to include all known or earlier developed alternatives, modifications, variations, improvements and/or substantial equivalents.

100:爐 101:加熱單元 102:冷卻單元 103:加熱元件 104:風機元件 107:端部阻隔箱 107a:端部阻隔箱 107b:端部阻隔箱 108:端部阻隔部 109:氣簾裝置 110:加工元件 111:支架 112:爐膛 113:上爐膛 114:下爐膛 115:傳送帶 118:輸送裝置 120:輸送空間 121:鉸鏈裝置 135:底部 136:頂部 140:側部升高部 141:加工元件容納空間 142:輸送裝置容納空間 151:入口端 152:出口端 153a:惰性氣體源 153b:惰性氣體源 154:排氣裝置 219:導軌 222:支撐桿 223:軸 224:連接桿 227:密封件 231:上爐膛側部 232:下爐膛側部 233:頂部 234:下爐膛底部 245:上部分隔件 246:下部分隔件 261:導流翅片 262:進氣口 263:上爐膛連接部 264:下爐膛連接部 370:烘乾段 371:燒結段 372:冷卻段 380:燒結爐 D1:高度 D2:高度 H:高度方向 L:長度方向 W:寬度方向 100:furnace 101:Heating unit 102: Cooling unit 103:Heating element 104:Fan components 107: End barrier box 107a: End barrier box 107b: End barrier box 108: End blocking part 109: Air curtain device 110: Processing components 111:Bracket 112:Hearth 113: Upper furnace 114: Lower the furnace 115: Conveyor belt 118:Conveying device 120:Conveying space 121:Hinge device 135:Bottom 136:Top 140: Side raised part 141: Processing component accommodation space 142: Conveying device accommodation space 151: Entrance port 152:Export end 153a: Inert gas source 153b: Inert gas source 154:Exhaust device 219: Guide rail 222:Support rod 223:shaft 224:Connecting rod 227:Seals 231: Upper furnace side 232: Side of lower furnace 233:Top 234: Bottom of lower furnace 245: Upper partition 246:Lower partition 261: Guide fins 262:Air inlet 263: Upper furnace connection part 264:Lower furnace connection part 370: Drying section 371: sintering section 372: Cooling section 380:Sintering furnace D1: height D2: height H: height direction L:Length direction W: Width direction

圖1A為根據本案的一個實施例的爐的立體結構圖;Figure 1A is a three-dimensional structural view of a furnace according to an embodiment of the present case;

圖1B為圖1A所示爐的原理示意圖;Figure 1B is a schematic diagram of the principle of the furnace shown in Figure 1A;

圖2A為圖1A中爐膛的立體結構圖;Figure 2A is a three-dimensional structural view of the furnace in Figure 1A;

圖2B為圖2A的爐膛沿寬度方向的剖視圖;Figure 2B is a cross-sectional view of the furnace of Figure 2A along the width direction;

圖2C為圖2A的爐膛沿長寬度方向的局部剖視圖;Figure 2C is a partial cross-sectional view of the furnace of Figure 2A along the length and width direction;

圖3為包括圖1A所示爐的燒結爐的示意圖。Figure 3 is a schematic diagram of a sintering furnace including the furnace shown in Figure 1A.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in order of storage institution, date and number) without Overseas storage information (please note in order of storage country, institution, date, and number) without

100:爐 100:furnace

101:加熱單元 101:Heating unit

102:冷卻單元 102: Cooling unit

108:端部阻隔部 108: End blocking part

110:加工元件 110: Processing components

113:上爐膛 113: Upper furnace

114:下爐膛 114: Lower the furnace

115:傳送帶 115: Conveyor belt

120:輸送空間 120:Conveying space

135:底部 135:Bottom

136:頂部 136:Top

141:加工元件容納空間 141: Processing component accommodation space

142:輸送裝置容納空間 142: Conveying device accommodation space

151:入口端 151: Entrance port

152:出口端 152:Export end

153a:惰性氣體源 153a: Inert gas source

153b:惰性氣體源 153b: Inert gas source

154:排氣裝置 154:Exhaust device

D1:高度 D1: height

D2:高度 D2: height

H:高度方向 H: height direction

L:長度方向 L:Length direction

Claims (12)

一種爐,其特徵在於包括: 爐膛,所述爐膛包括相對設置的上爐膛和下爐膛,所述上爐膛和所述下爐膛之間具有沿所述爐膛的長度方向延伸穿過所述爐膛的輸送空間;及 輸送裝置,所述輸送裝置用於承載並使加工元件在所述輸送空間中移動通過所述爐膛; 其中在所述爐膛的高度方向上,所述輸送空間包括輸送裝置容納空間和加工元件容納空間,所述輸送裝置容納空間位於所述加工元件容納空間的下方,所述輸送裝置被容納在所述輸送裝置容納空間中,所述加工元件容納空間用於當所述加工元件豎立地被承載在所述輸送裝置上時,容納所述加工元件。 A furnace is characterized by including: A furnace including an upper furnace and a lower furnace arranged opposite each other, with a transport space extending through the furnace along the length direction of the furnace between the upper furnace and the lower furnace; and a conveying device for carrying and moving processing elements through the furnace in the conveying space; Wherein in the height direction of the furnace, the conveying space includes a conveying device accommodating space and a processing element accommodating space, the conveying device accommodating space is located below the processing element accommodating space, and the conveying device is accommodated in the In the conveying device accommodation space, the processing element accommodation space is used to accommodate the processing element when the processing element is carried upright on the conveying device. 根據請求項1之爐,其中: 所述上爐膛包括一對相對設置在所述爐膛的寬度方向上、沿所述爐膛的長度方向延伸的上爐膛側部,所述下爐膛包括一對相對設置在所述爐膛的寬度方向上、沿所述爐膛的長度方向延伸的下爐膛側部,其中所述一對上爐膛側部和所述一對下爐膛側部相應地連接,並且在所述爐膛的高度方向上,所述上爐膛的底部與所述一對上爐膛側部的底部間隔一定距離,所述下爐膛的頂部和所述一對下爐膛側部的頂部間隔一定距離,以使得在所述上爐膛的底部和所述下爐膛的頂部之間形成所述輸送空間; 其中所述爐膛還包括一對側部升高部,所述一對側部升高部相對地設置在所述爐膛的寬度方向上、並沿所述爐膛的長度方向延伸,所述一對側部升高部設置在所述上爐膛側部的底部及/或所述下爐膛側部的頂部,以使得當所述加工元件豎立地被承載在所述輸送裝置上時,所述加工元件容納空間能夠容納所述加工元件。 Furnace according to claim 1, wherein: The upper furnace includes a pair of upper furnace side portions arranged oppositely in the width direction of the furnace and extending along the length direction of the furnace, and the lower furnace includes a pair of upper furnace side portions oppositely arranged in the width direction of the furnace. a lower furnace side extending along the length direction of the furnace, wherein the pair of upper furnace sides and the pair of lower furnace sides are connected correspondingly, and in the height direction of the furnace, the upper furnace The bottom of the upper furnace is spaced a certain distance from the bottom of the pair of upper furnace sides, and the top of the lower furnace is spaced a certain distance from the top of the pair of lower furnace sides, so that the bottom of the upper furnace and the The conveying space is formed between the tops of the lower furnace; The furnace further includes a pair of side raised portions, the pair of side raised portions are oppositely arranged in the width direction of the furnace and extend along the length direction of the furnace, and the pair of side raised portions A raised portion is provided at the bottom of the upper furnace side and/or the top of the lower furnace side, so that when the processing element is carried upright on the conveyor, the processing element is accommodated The space is capable of accommodating the processing elements. 根據請求項2之爐,其中: 所述一對側部升高部分別設置在所述一對下爐膛側部的頂部,並與所述一對上爐膛側部相連。 Furnace according to claim 2, wherein: The pair of side raised portions are respectively disposed on the tops of the pair of lower furnace side portions and connected to the pair of upper furnace side portions. 根據請求項3之爐,其中: 所述爐還包括鉸鏈裝置,所述鉸鏈裝置包括連接桿和支撐桿,所述連接桿與所述上爐膛連接,所述支撐桿被固定,所述連接桿和所述支撐桿通過軸可轉動地連接,其中所述鉸鏈裝置被配置為通過驅動所述連接桿相對於所述支撐桿轉動,能夠相對於所述下爐膛翻開所述上爐膛。 Furnace according to claim 3, wherein: The furnace also includes a hinge device. The hinge device includes a connecting rod and a support rod. The connecting rod is connected to the upper furnace hearth. The support rod is fixed. The connecting rod and the support rod are rotatable through an axis. ground connection, wherein the hinge device is configured to be able to flip the upper furnace chamber relative to the lower furnace chamber by driving the connecting rod to rotate relative to the support rod. 根據請求項2之爐,其中: 所述加工元件容納空間的高度為200~300mm。 Furnace according to claim 2, wherein: The height of the processing element accommodation space is 200~300mm. 根據請求項1之爐,其中: 所述爐被配置為提供加熱以烘乾所述加工元件,從而從所述加工元件中移除有機物。 Furnace according to claim 1, wherein: The oven is configured to provide heat to dry the processing element to remove organic matter from the processing element. 根據請求項6之爐,其中: 所述爐膛包括數個加熱單元,各個加熱單元沿所述爐膛的長度方向並排地設置,並被配置為各自獨立地通過加熱元件提供所述熱。 Furnace according to claim 6, wherein: The furnace includes a plurality of heating units, each heating unit being arranged side by side along the length of the furnace and configured to each independently provide the heat via a heating element. 根據請求項7之爐,其中: 每個所述加熱單元包括風機元件、上部分隔件和下部分隔件,所述上部分隔件設置在所述上爐膛中,並且所述上部分隔件的底部形成所述上爐膛的底部,所述下部分隔件設置在所述下爐膛中,並且所述下部分隔件的頂部形成所述下爐膛的頂部,其中風機組件、所述上部分隔件和所述下部分隔件被配置為所述加熱單元中的氣體能夠在各自的單元內部流動,以使得所述加熱元件提供的所述熱均勻地擴散至所述加工元件。 Furnace according to claim 7, wherein: Each of the heating units includes a fan element, an upper partition and a lower partition. The upper partition is disposed in the upper furnace, and the bottom of the upper partition forms the bottom of the upper furnace. The lower partition A partition is disposed in the lower furnace, and a top of the lower partition forms a top of the lower furnace, wherein the fan assembly, the upper partition and the lower partition are configured as the heating unit. Gases can flow inside the respective units so that the heat provided by the heating elements diffuses evenly to the processing elements. 根據請求項6之爐,其中: 所述爐還包括兩個端部阻隔部,所述兩個端部阻隔部分別設置在所述爐膛的入口端和出口端,其中每個所述端部阻隔部中包括氣簾裝置和排氣裝置,所述端部阻隔部被配置為阻隔所述爐膛內部和外部環境中的氣體流通,以使得所述爐膛內的氣體中的氧氣含量達到預設值。 Furnace according to claim 6, wherein: The furnace also includes two end blocking parts, the two end blocking parts are respectively provided at the inlet end and the outlet end of the furnace, wherein each of the end blocking parts includes an air curtain device and an exhaust device. , the end blocking part is configured to block gas circulation inside the furnace and the external environment, so that the oxygen content in the gas in the furnace reaches a preset value. 根據請求項6之爐,其中: 所述加工元件為光伏裝置。 Furnace according to claim 6, wherein: The processing element is a photovoltaic device. 根據請求項1之爐,其中: 所述加工元件為電路板,所述爐被配置為用於回流焊接所述電路板。 Furnace according to claim 1, wherein: The process element is a circuit board and the oven is configured for reflow soldering of the circuit board. 一種燒結爐,其中: 所述燒結爐包括烘乾段、燒結段和冷卻段; 其中所述烘乾段包括請求項1-11中任一項所述的爐。 A sintering furnace, wherein: The sintering furnace includes a drying section, a sintering section and a cooling section; The drying section includes the furnace described in any one of claims 1-11.
TW112101344A 2022-02-28 2023-01-12 Furnace and sintering furnace comprising same TW202348939A (en)

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