TW202348597A - Novel diamine, method for producing the same, and polyamic acid and polyimide produced from the diamine - Google Patents

Novel diamine, method for producing the same, and polyamic acid and polyimide produced from the diamine Download PDF

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TW202348597A
TW202348597A TW112109390A TW112109390A TW202348597A TW 202348597 A TW202348597 A TW 202348597A TW 112109390 A TW112109390 A TW 112109390A TW 112109390 A TW112109390 A TW 112109390A TW 202348597 A TW202348597 A TW 202348597A
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diamine
polyimide
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坂口勇二
湯浅亮輝
仲辻秀文
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日商田岡化學工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C205/00Compounds containing nitro groups bound to a carbon skeleton
    • C07C205/49Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
    • C07C205/57Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/04Formation of amino groups in compounds containing carboxyl groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/52Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
    • C07C229/54Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring
    • C07C229/60Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton with amino and carboxyl groups bound to carbon atoms of the same non-condensed six-membered aromatic ring with amino and carboxyl groups bound in meta- or para- positions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Abstract

Provided are a diamine represented by formula (1), a method for producing the same, and a polyamic acid and polyimide produced from the diamine.

Description

新穎的二胺及其製造方法、以及由該二胺所製造的聚醯胺酸及聚醯亞胺 Novel diamine and its production method, as well as polyamic acid and polyimide produced from the diamine

本發明係有關一種可使用來作為聚醯亞胺樹脂等之原料的新穎之含酯基的二胺及其製造方法、以及由該二胺所製造的聚醯胺酸及聚醯亞胺。 The present invention relates to a novel ester group-containing diamine that can be used as a raw material for polyimide resin and the like, a method for producing the same, and polyamic acid and polyimide produced from the diamine.

聚醯亞胺係在現存之樹脂中合併具有最高等級的耐熱性、耐化學性、電絕緣性、耐輻射性等,因可藉由原料之組合而容易顯現合併各種的用途之特性,故可在廣泛的領域中使用。 Polyimide combines the highest levels of heat resistance, chemical resistance, electrical insulation, radiation resistance, etc. among existing resins. It can be easily combined with the characteristics of various uses through the combination of raw materials, so it can Used in a wide range of fields.

其中,就聚醯亞胺之用途而言,近年來著隨第5代通訊系統之普及,已聚焦在可撓性印刷配線板(FPC)。屬於FPC之基板材料的聚醯亞胺在封裝步驟中因曝露於各式各樣的熱循環而產生尺寸變化,故為了抑制此種情況,希望為聚醯亞胺之耐熱性高(例如,玻璃轉移溫度(Tg)高於步驟溫度)、及線性熱膨脹係數(CTE)儘可能地低(例如,與銅箔之CTE(約20ppm/K)為同等或低於銅箔之CTE)。 Among them, as for the use of polyimide, with the popularity of fifth-generation communication systems in recent years, it has focused on flexible printed wiring boards (FPC). Polyimide, which is a substrate material for FPC, undergoes dimensional changes due to exposure to various thermal cycles during the packaging step. Therefore, in order to suppress this, it is desirable to make polyimide with high heat resistance (for example, glass The transfer temperature (Tg) is higher than the step temperature), and the linear thermal expansion coefficient (CTE) is as low as possible (for example, the same as or lower than the CTE of copper foil (about 20 ppm/K)).

就賦予如此的高耐熱性且具有低CTE的聚醯亞胺之二胺而言,已知有下述式(8)所示的二胺(專利文獻1)。 A diamine represented by the following formula (8) is known as a polyimide diamine that provides such high heat resistance and has low CTE (Patent Document 1).

Figure 112109390-A0202-12-0002-4
Figure 112109390-A0202-12-0002-4

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Document]

[專利文獻1]日本特開平08-048773號公報 [Patent Document 1] Japanese Patent Application Publication No. 08-048773

然而,上述式(8)所示的二胺因溶劑溶解性極差,故為了以均勻系進行聚合,必須在加熱下使該二胺完全溶解,並與酸二酐進行混合,因此,會有產生如製造步驟變得繁瑣,或生產效率降低之問題的情形。 However, the diamine represented by the above formula (8) has extremely poor solvent solubility. Therefore, in order to polymerize in a homogeneous system, the diamine must be completely dissolved under heating and mixed with the acid dianhydride. Therefore, there are problems. This may cause problems such as manufacturing steps becoming complicated or production efficiency being reduced.

本發明之目的在於提供一種具有與上述式(8)所示的二胺類似之構造,且溶劑溶解性優異之新穎的二胺。 An object of the present invention is to provide a novel diamine having a structure similar to the diamine represented by the above formula (8) and having excellent solvent solubility.

本發明人等致力研究之結果,發現下述式(1)所示的二胺呈示優異的溶劑溶解性,可解決前述問題。具體而言,本發明係包含如下之發明。 As a result of intensive research, the present inventors found that the diamine represented by the following formula (1) exhibits excellent solvent solubility and can solve the aforementioned problems. Specifically, the present invention includes the following inventions.

〔1〕一種下述式(1)所示的二胺, [1] A diamine represented by the following formula (1),

Figure 112109390-A0202-12-0003-5
Figure 112109390-A0202-12-0003-5

〔2〕一種〔1〕所述之二胺的製造方法,其係將下述式(2):所示的二硝基化合物進行還原, [2] A method for producing the diamine described in [1], which is to reduce the dinitro compound represented by the following formula (2):

Figure 112109390-A0202-12-0003-6
Figure 112109390-A0202-12-0003-6

〔3〕一種二硝基化合物,係下述式(2)所示者, [3] A dinitro compound represented by the following formula (2),

Figure 112109390-A0202-12-0003-7
Figure 112109390-A0202-12-0003-7

〔4〕一種聚醯胺酸,係具有下述通式(3)所示的重複單元, [4] A polyamide having a repeating unit represented by the following general formula (3),

Figure 112109390-A0202-12-0003-8
(式中,A表示4價之芳香族基或4價之脂肪族基。)。
Figure 112109390-A0202-12-0003-8
(In the formula, A represents a tetravalent aromatic group or a tetravalent aliphatic group.).

〔5〕一種聚醯亞胺,其具有下述通式(4)所示的重複單元, [5] A polyimide having a repeating unit represented by the following general formula (4),

Figure 112109390-A0202-12-0003-9
(式中,A表示4價之芳香族基或4價之脂肪族基。)。
Figure 112109390-A0202-12-0003-9
(In the formula, A represents a tetravalent aromatic group or a tetravalent aliphatic group.).

〔6〕一種聚醯胺酸溶液,其含有〔4〕所述之聚醯胺酸及溶劑。 [6] A polyamic acid solution containing the polyamic acid described in [4] and a solvent.

〔7〕一種薄膜,其含有〔4〕所述之聚醯胺酸。 [7] A film containing the polyamide according to [4].

〔8〕一種薄膜,其含有〔5〕所述之聚醯亞胺。 [8] A film containing the polyimide according to [5].

〔9〕一種積層體,其具有含有〔5〕所述之聚醯亞胺的層。 [9] A laminated body having a layer containing the polyimide according to [5].

上述本發明的二胺(上述式(1)所示的二胺)係儘管具有與上述式(8)所示的二胺類似之構造,但具有優異的溶劑溶解性。因此,不進行特別加熱,而在室溫(25℃)附近亦可以均勻系進行反應,是故,在室溫(25℃)附近亦可充分進行聚合反應,又,可抑制寡聚物化或凝膠化而獲得本發明之聚醯胺酸(具有上述通式(3)所示的重複單元之聚醯胺酸)之均勻溶液。 The diamine of the present invention (diamine represented by the above formula (1)) has excellent solvent solubility although it has a similar structure to the diamine represented by the above formula (8). Therefore, the reaction can proceed uniformly around room temperature (25°C) without special heating. Therefore, the polymerization reaction can sufficiently proceed around room temperature (25°C), and oligomerization or coagulation can be suppressed. After gelation, a homogeneous solution of the polyamic acid of the present invention (polyamic acid having a repeating unit represented by the above general formula (3)) is obtained.

又,由本發明之二胺所製造的本發明之聚醯亞胺(具有上述通式(4)所示的重複單元之聚醯亞胺)係不僅為高Tg且低CTE,而低介電特性(低介電常數、低介電損耗正切)亦為優異。在近年之5G用途的FPC基板材料係從傳輸損耗(Transmission Loss)降低之觀點而言,被要求具有低介電特性(低介電常數、低介電損耗正切),故本發明之聚醯亞胺例如可適合使用作為FPC基板材料,尤其是高頻FPC基板材料(例如,在可撓性銅箔積層板或覆蓋層薄膜等之積層體中的樹脂基板等)。 Furthermore, the polyimide of the present invention (polyimide having a repeating unit represented by the general formula (4)) produced from the diamine of the present invention not only has high Tg and low CTE, but also has low dielectric properties. (Low dielectric constant, low dielectric loss tangent) is also excellent. In recent years, FPC substrate materials for 5G applications are required to have low dielectric properties (low dielectric constant, low dielectric loss tangent) from the perspective of reducing transmission loss (Transmission Loss). Therefore, the polyethylene of the present invention An amine can be suitably used as an FPC substrate material, especially a high-frequency FPC substrate material (for example, a resin substrate in a laminated body such as a flexible copper foil laminated board or a cover layer film).

圖1係在實施例1所得上述式(2)所示的二硝基化合物之1H-NMR圖表。 Figure 1 is a 1 H-NMR chart of the dinitro compound represented by the above formula (2) obtained in Example 1.

圖2係在實施例2所得上述式(1)所示的二胺之1H-NMR圖表。 Figure 2 is a 1 H-NMR chart of the diamine represented by the above formula (1) obtained in Example 2.

圖3係在實施例2所得上述式(1)所示的二胺之LC-MS圖表。 Figure 3 is an LC-MS chart of the diamine represented by the above formula (1) obtained in Example 2.

在本說明書中,以「A至B」表示數值範圍時,意指A以上B以下。 In this specification, when a numerical range is expressed as "A to B", it means above A and below B.

<本發明之二胺> <Diamine of the present invention>

本發明之二胺係具有上述式(1)所示的構造。 The diamine system of the present invention has a structure represented by the above formula (1).

本發明之二胺係可藉由例如:使第三丁基氫醌或其衍生物、與4-硝基苯甲酸或其衍生物反應而獲得上述式(2)所示的二硝基化合物(酯化反應),並將該二硝基化合物之硝基進行還原(胺基化反應)之方法來製造。 The diamine system of the present invention can be obtained by, for example, reacting tert-butylhydroquinone or its derivatives with 4-nitrobenzoic acid or its derivatives to obtain the dinitro compound represented by the above formula (2) ( It is produced by reducing the nitro group of the dinitro compound (amination reaction).

作為上述酯化反應之方法係可列舉例如:使第三丁基氫醌與4-硝基苯甲酸類在高溫下直接脫水反應之方法;使用N,N’-二環己基碳二亞胺等脫水試藥使第三丁基氫醌與4-硝基苯甲酸類脫水縮合之方法;使第三丁基氫醌之二乙酸酯化體與4-硝基苯甲酸類在高溫下反應而進行去乙酸並進行酯化之方法(酯交換法);使第三丁基氫醌與4-硝基苯甲醯氯在去氧劑之存在下反應之方法(醯鹵法);使用甲苯磺醯氯/N,N-二甲基甲醯胺/吡啶混合物使4-硝基苯甲酸類之羧基進行活化並與第三丁基氫醌反應之方法 等。在此等的方法之中,從經濟性、反應性之觀點而言,以醯氯法為佳。 以下,詳細敘述有關醯氯法。 Examples of the method for the above-mentioned esterification reaction include: direct dehydration reaction between tert-butylhydroquinone and 4-nitrobenzoic acids at high temperature; use of N,N'-dicyclohexylcarbodiimide, etc. Dehydration reagent is a method of dehydrating and condensing tert-butylhydroquinone and 4-nitrobenzoic acids; reacting the diacetate ester of tert-butylhydroquinone with 4-nitrobenzoic acids at high temperature. A method of removing acetic acid and performing esterification (ester exchange method); a method of reacting tert-butylhydroquinone and 4-nitrobenzoyl chloride in the presence of an oxygen scavenger (halide method); using toluene sulfonate A method for activating the carboxyl group of 4-nitrobenzoic acids and reacting it with tert-butylhydroquinone using a chloride/N,N-dimethylformamide/pyridine mixture wait. Among these methods, the chlorination method is preferred from the viewpoint of economy and reactivity. Hereinafter, the chlorination method will be described in detail.

在上述醯鹵法中之4-硝基苯甲醯鹵係可列舉例如:4-硝基苯甲醯氯、4-硝基苯甲醯溴、4-硝基苯甲醯碘等。此等4-硝基苯甲醯鹵之中,以4-硝基苯甲醯氯為佳。又,例如相對於第三丁基氫醌1莫耳,4-硝基苯甲醯鹵之使用量為2莫耳至4莫耳,較佳係2莫耳至3莫耳。若使用量為2莫耳以上,可獲得充分的反應速度,又,若為4莫耳以下,可降低未反應之4-硝基苯甲醯鹵,可更提高所得的本發明之二胺的純度。 Examples of the 4-nitrobenzyl halides in the above-mentioned chloride method include 4-nitrobenzyl chloride, 4-nitrobenzyl bromide, 4-nitrobenzyl iodide, and the like. Among these 4-nitrobenzoyl halides, 4-nitrobenzoyl chloride is preferred. For example, the usage amount of 4-nitrobenzoyl halide is 2 to 4 moles, preferably 2 to 3 moles, based on 1 mole of tert-butylhydroquinone. If the usage amount is 2 moles or more, a sufficient reaction rate can be obtained, and if it is 4 moles or less, the amount of unreacted 4-nitrobenzoyl halide can be reduced, and the properties of the obtained diamine of the present invention can be further improved. Purity.

作為上述醯鹵法中之去氧劑,可列舉例如:吡啶、三乙基胺、N,N-二甲基苯胺等有機3級胺類、環氧丙烷、烯丙基環氧丙基醚等環氧類;碳酸鉀、氫氧化鈉等無機鹼等。此等去氧劑係可單獨使用,亦可併用2種以上。此等去氧劑之中,因為價廉且容易在反應後分離去除,故以吡啶為較佳。又,例如相對於第三丁基氫醌1莫耳,去氧劑之使用量為2莫耳至4莫耳,較佳係2莫耳至3莫耳。若使用量為2莫耳以上,可獲得充分的反應速度,又,若為4莫耳以下,可抑制雜質之生成。 Examples of the oxygen scavenger in the above-mentioned halogen method include organic tertiary amines such as pyridine, triethylamine, N,N-dimethylaniline, propylene oxide, allylglycidyl ether, etc. Epoxy; potassium carbonate, sodium hydroxide and other inorganic bases, etc. These oxygen scavengers may be used alone, or two or more types may be used in combination. Among these oxygen scavengers, pyridine is preferred because it is cheap and easy to separate and remove after the reaction. For example, the amount of the oxygen scavenger used is 2 moles to 4 moles, preferably 2 moles to 3 moles, based on 1 mole of tert-butylhydroquinone. If the usage amount is 2 moles or more, sufficient reaction speed can be obtained, and if it is 4 moles or less, the generation of impurities can be suppressed.

醯鹵法通常係在溶劑之存在下實施。作為可在醯鹵法使用的溶劑係可列舉例如:丙酮、甲基乙基酮、甲基異丁基酮、二異丁基酮、環己酮、苯乙酮等酮系溶劑;1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、四氫呋喃、二丁基醚、二乙基醚、1,4-二

Figure 112109390-A0202-12-0006-25
烷、環戊基甲基醚、二甘醇二甲醚、三甘醇二甲醚等醚系溶劑;甲苯、二甲苯等芳香族烴系溶劑;氯苯、二氯苯等鹵化芳香族烴系溶劑;乙腈、丙腈、丁腈、異丁腈、戊腈、異戊腈、苯甲腈等腈系溶劑;N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯 胺、N,N-二甲基甲醯胺、1,3-二甲基-2-咪唑啶酮等醯胺系溶劑等。此等溶劑之中,從取得性及操作性之點而言,以醚系溶劑、芳香族烴系溶劑、腈系溶劑為佳。此等溶劑可單獨使用,亦可併用2種以上。又,相對於第三丁基氫醌1重量倍,使用溶劑時之使用量,例如為1重量倍至30重量倍,較佳係1重量倍至5重量倍。 The halogenation method is usually carried out in the presence of a solvent. Examples of solvents that can be used in the halogenation method include ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, and acetophenone; 1,2 -Dimethoxyethane, 1,2-diethoxyethane, tetrahydrofuran, dibutyl ether, diethyl ether, 1,4-di
Figure 112109390-A0202-12-0006-25
Ether solvents such as alkane, cyclopentyl methyl ether, diglyme, triglyme and other ether solvents; aromatic hydrocarbon solvents such as toluene and xylene; halogenated aromatic hydrocarbon solvents such as chlorobenzene and dichlorobenzene. Solvents; nitrile solvents such as acetonitrile, propionitrile, butyronitrile, isobutyronitrile, valeronitrile, isovaleronitrile, and benzonitrile; N-methyl-2-pyrrolidone, N,N-dimethylacetamide , N,N-diethyl acetamide, N,N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone and other amide solvents. Among these solvents, ether solvents, aromatic hydrocarbon solvents, and nitrile solvents are preferred from the viewpoint of availability and workability. These solvents can be used alone, or two or more types can be used in combination. Moreover, the usage amount when using a solvent is, for example, 1 to 30 weight times, preferably 1 to 5 weight times, relative to 1 weight of tert-butylhydroquinone.

醯鹵法係例如在-10℃至120℃下實施,較佳係在-5℃至100℃下實施,更佳係在20℃至90℃下實施。若反應溫度為120℃以下,可更降低副生成物,又,若為-10℃以上,可獲得充分的反應速度。 The halogenation method is implemented, for example, at -10°C to 120°C, preferably at -5°C to 100°C, and more preferably at 20°C to 90°C. If the reaction temperature is 120°C or lower, by-products can be further reduced, and if the reaction temperature is -10°C or higher, a sufficient reaction rate can be obtained.

醯鹵法係可列舉例如:攪拌下在包含4-硝基苯甲醯鹵與上述溶劑之溶液中,以成為上述溫度範圍之方式間歇性或連續性地添加另外調製出的包含第三丁基氫醌、去氧劑及上述溶劑之溶液後,在上述溫度範圍進一步持續反應之方法、或在包含4-硝基苯甲醯鹵、第三-丁基氫醌及上述溶劑之溶液中,以成為上述溫度範圍之方式間歇性或者連續性地添加去氧劑或含有去氧劑及上述溶劑之溶液後,在上述溫度範圍進一步持續反應之方法等。 Examples of the halogen method include: adding a separately prepared tert-butyl group to a solution containing 4-nitrobenzoyl halide and the above-mentioned solvent intermittently or continuously under stirring so that the temperature range becomes the above-mentioned range. After the solution of hydroquinone, oxygen scavenger and the above solvent, the reaction is further continued in the above temperature range, or in a solution containing 4-nitrobenzoyl halide, tert-butylhydroquinone and the above solvent, to A method in which an oxygen scavenger or a solution containing an oxygen scavenger and the above solvent is added intermittently or continuously to achieve the above temperature range, and then the reaction is further continued in the above temperature range, etc.

醯鹵法實施後,所得的反應混合物係直接在後述胺基化反應中使用,亦可藉由常用之純化方法(萃取、洗淨、吸附、水蒸氣蒸餾、晶析、管柱純化等)進行純化。又,純化係可僅進行一次,或進行複數次。 After the halogenation method is carried out, the reaction mixture obtained can be used directly in the amination reaction described below, or can be carried out by commonly used purification methods (extraction, washing, adsorption, steam distillation, crystallization, column purification, etc.) Purification. In addition, the purification system may be performed only once or a plurality of times.

作為胺基化反應之方法係可列舉例如:使上述式(2)所示的二硝基化合物溶解於惰性溶劑中,在氫氣環境下,使用鈀或鉑等過渡金屬原子負載於活性碳而成之觸媒並進行還原之方法(接觸還原法)等。 Examples of the amination reaction method include: dissolving the dinitro compound represented by the above formula (2) in an inert solvent, and supporting transition metal atoms such as palladium or platinum on activated carbon in a hydrogen atmosphere. Catalyst and reduction method (contact reduction method), etc.

在接觸還原法中之觸媒係可列舉例如:使鈀或鉑等過渡金屬原子負載在活性碳而成之觸媒,其中,從反應速度之觀點而言,較佳係使鈀負載於活性碳而成之觸媒(鈀/碳)或使鉑負載於活性碳而成之觸媒(鉑/碳)。此等觸媒係可單獨使用,亦可併用2種以上。就觸媒中之過渡金屬原子之重量而言,相對於上述式(2)所示的二硝基化合物1重量倍,此等觸媒之使用量例如為0.0001重量倍至0.01重量倍。 Examples of the catalyst system in the contact reduction method include a catalyst in which transition metal atoms such as palladium or platinum are supported on activated carbon. Among them, from the viewpoint of reaction speed, it is preferable to support palladium on activated carbon. Catalyst (palladium/carbon) or catalyst (platinum/carbon) formed by loading platinum on activated carbon. These catalysts can be used alone, or two or more types can be used in combination. Regarding the weight of transition metal atoms in the catalyst, relative to 1 weight times of the dinitro compound represented by the above formula (2), the usage amount of these catalysts is, for example, 0.0001 to 0.01 weight times.

作為在接觸還原法中之溶劑係例如,只要為不與上述式(2)所示的二硝基化合物、或者屬於生成物之上述式(1)所示的二胺反應,且在接觸還原時不進行反應者即可,可列舉例如:1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、四氫呋喃、二丁基醚、二乙基醚、1,4-二

Figure 112109390-A0202-12-0008-26
烷、環戊基甲基醚、二甘醇二甲醚、三甘醇二甲醚等醚系溶劑;乙酸乙酯、乙酸丁酯、乙酸異丁酯、γ-丁內酯、γ-戊內酯、δ-戊內酯、γ-己內酯、ε-己內酯、α-甲基-γ-丁內酯等酯系溶劑;丙酮、甲基乙基酮、甲基異丁基酮、二異丁基酮、環己酮、苯乙酮等酮系溶劑;氯仿、二氯甲烷、三氯甲烷、1,2-二氯乙烷等鹵烷系溶劑;甲苯、二甲苯等芳香族烴系溶劑;N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、1,3-二甲基-2-咪唑啶酮等醯胺系溶劑;二甲基亞碸、環丁碸等碸系溶劑;甲基吡啶;吡啶等。此等溶劑之中,以醯胺系溶劑為較佳。此等溶劑係可單獨使用,亦可併用2種以上。相對於上述式(2)所示的二硝基化合物1重量倍,作為此等溶劑之使用量例如為2至10重量倍。 As a solvent in the contact reduction method, for example, as long as it does not react with the dinitro compound represented by the above formula (2) or the diamine represented by the above formula (1) that is a product, and during the contact reduction method Those that do not react need only be used, and examples include: 1,2-dimethoxyethane, 1,2-diethoxyethane, tetrahydrofuran, dibutyl ether, diethyl ether, 1,4-dimethoxyethane,
Figure 112109390-A0202-12-0008-26
Alkane, cyclopentyl methyl ether, diglyme, triglyme and other ether solvents; ethyl acetate, butyl acetate, isobutyl acetate, γ-butyrolactone, γ-valerolactone ester, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone and other ester solvents; acetone, methyl ethyl ketone, methyl isobutyl ketone, Ketone solvents such as diisobutyl ketone, cyclohexanone, and acetophenone; haloalkane solvents such as chloroform, dichloromethane, chloroform, and 1,2-dichloroethane; aromatic hydrocarbons such as toluene and xylene Solvents; N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylformamide, 1,3 - Amide solvents such as dimethyl-2-imidazolidinone; styrene solvents such as dimethyl tyrosine and cyclotenine; methylpyridine; pyridine, etc. Among these solvents, amide solvents are preferred. These solvents can be used alone, or two or more types can be used in combination. The usage amount of these solvents is, for example, 2 to 10 times by weight relative to 1 time by weight of the dinitro compound represented by the above formula (2).

從提升反應速度及抑制雜質生成之觀點而言,接觸還原法係例如在20℃至160℃下實施,較佳係在20℃至100℃下實施。 From the viewpoint of increasing the reaction speed and suppressing the generation of impurities, the contact reduction method is implemented at, for example, 20°C to 160°C, preferably 20°C to 100°C.

實施接觸還原法之後,例如,藉由過濾去除觸媒之後,將所得的反應混合物滴入上述式(1)所示的二胺難以溶解的溶劑(以下,有時目的物難以溶解的溶劑稱為「弱溶劑」)之方法等,可分離上述式(1)所示的二胺。如此方式所得的上述式(1)所示的二胺係可直接在後續的步驟使用,但亦可藉由常用之純化方法(萃取、洗淨、吸附、水蒸氣蒸餾、晶析、管柱純化等)進行純化。又,純化係可僅進行一次,或可進行複數次。 After performing the contact reduction method, for example, removing the catalyst by filtration, the reaction mixture obtained is dropped into a solvent in which the diamine is hardly soluble (hereinafter, a solvent in which the target substance is hardly soluble) represented by the above formula (1) is sometimes referred to as The diamine represented by the above formula (1) can be separated by a method such as "weak solvent"). The diamine represented by the above formula (1) obtained in this way can be used directly in subsequent steps, but it can also be purified by commonly used purification methods (extraction, washing, adsorption, steam distillation, crystallization, column purification etc.) for purification. In addition, the purification system may be performed only once, or may be performed a plurality of times.

<本發明之聚醯胺酸及其製造方法> <Polyamide of the present invention and its production method>

本發明之聚醯胺酸係具有上述通式(3)所示的重複單元。又,在上述通式(3)中,鍵結於構造單元A之2個羧基為了方便記載為順式位置,但實際係順式位置及反式位置混合存在。 The polyamide of the present invention has a repeating unit represented by the above general formula (3). In addition, in the above general formula (3), the two carboxyl groups bonded to the structural unit A are described as cis positions for convenience, but in reality, cis positions and trans positions are mixed.

上述通式(3)之構造單元A係表示4價芳香族基或4價脂肪族基。又,4價芳香族基係源自於芳香族四羧酸二酐,且4價脂肪族基係源自於脂肪族四羧酸。 The structural unit A of the general formula (3) represents a tetravalent aromatic group or a tetravalent aliphatic group. Furthermore, the tetravalent aromatic group is derived from aromatic tetracarboxylic dianhydride, and the tetravalent aliphatic group is derived from aliphatic tetracarboxylic acid.

上述通式(3)中之構造單元A較佳係包含下述式(5)至(7)所示的構造中之至少1者。又,*係表示鍵結點。 The structural unit A in the general formula (3) preferably includes at least one of the structures represented by the following formulas (5) to (7). In addition, * represents a bonding point.

Figure 112109390-A0202-12-0009-10
Figure 112109390-A0202-12-0009-10

Figure 112109390-A0202-12-0009-11
Figure 112109390-A0202-12-0009-11

Figure 112109390-A0202-12-0010-12
Figure 112109390-A0202-12-0010-12

本發明之聚醯胺酸的分子量例如以重量平均分子量計為1萬至50萬,較佳係1萬至30萬,更佳係2萬至20萬。若聚醯胺酸之分子量為1萬以上,可容易維持良好的力學特性。又,若聚醯胺酸之分子量為50萬以下,合成時容易控制分子量,又,容易獲得適度的黏度之溶液,且容易操作的情形居多。又,聚醯胺酸之分子量例如可藉由GPC(凝膠滲透色層分析法)法等之常用方法進行測定。 The molecular weight of the polyamide of the present invention is, for example, 10,000 to 500,000 in terms of weight average molecular weight, preferably 10,000 to 300,000, more preferably 20,000 to 200,000. If the molecular weight of polyamide is more than 10,000, it can easily maintain good mechanical properties. In addition, if the molecular weight of the polyamide acid is 500,000 or less, the molecular weight can be easily controlled during synthesis, and a solution of appropriate viscosity can be easily obtained, and the operation is often easy. In addition, the molecular weight of polyamide can be measured by a common method such as GPC (gel permeation chromatography) method.

本發明之聚醯胺酸係例如,使上述式(1)所示的二胺(以下,有時稱為「本發明之二胺」)、及依需要之本發明的二胺以外之其他二胺(以下,有時稱為「其他二胺」。)溶解於溶劑(聚合溶劑)之後,添加酸二酐粉末並使其聚合之方法等,藉此,可獲得作為聚合溶劑之溶液(以下,有時稱為「聚醯胺酸溶液」)。因本發明之二胺係溶劑溶解性優異,故尤其,不進行加熱而在室溫(25℃)附近亦可以均勻系進行反應,因此,在室溫(25℃)附近亦可充分地進行聚合反應,又,可抑制寡聚物化或凝膠化而獲得本發明之聚醯胺酸的均勻溶液。因此,作為使其聚合時之溫度,較佳係10℃至30℃。 The polyamide of the present invention is, for example, a diamine represented by the above formula (1) (hereinafter, sometimes referred to as "the diamine of the present invention") and, if necessary, other diamines other than the diamine of the present invention. A solution (hereinafter, a polymerization solvent) can be obtained by a method such as a method in which an amine (hereinafter, sometimes referred to as "other diamine") is dissolved in a solvent (polymerization solvent), and then acid dianhydride powder is added and polymerized. Sometimes called "polyamide solution"). Since the diamine solvent of the present invention has excellent solubility, the reaction can proceed uniformly at room temperature (25°C) without heating, and polymerization can be fully carried out at room temperature (25°C). The reaction also inhibits oligomerization or gelation, thereby obtaining a homogeneous solution of the polyamide of the present invention. Therefore, the temperature during polymerization is preferably 10°C to 30°C.

作為其他二胺係可列舉例如:芳香族二胺、脂肪族二胺、脂環式二胺等。更具體而言,可列舉例如:1,4-二胺基苯、1,3-二胺基苯、2,4-二胺基甲苯、4,4-二胺基二苯基甲烷、4,4’-二胺基二苯基醚、3,4’-二胺基二苯基醚、3,3’-二甲基-4,4’-二胺基聯苯、2,2’-二甲基-4,4’-二胺基聯苯、 2,2’-雙(三氟甲基)-4,4’-二胺基聯苯、3,7-二胺基-二甲基二苯并噻吩-5,5-二氧化物、4,4-二胺基二苯甲酮、3,3’-二胺基二苯甲酮、4,4’-雙(4-胺基苯基)硫醚、4,4’-二胺基二苯基碸、4,4’-二胺基苯甲醯苯胺、1,3-雙(4-胺基苯氧基)丙烷、1,4-雙(4-胺基苯氧基)丁烷、1,5-雙(4-胺基苯氧基)戊烷、1,3-雙(4-胺基苯氧基)-2,2-二甲基丙烷、1,2-雙[2-(4-胺基苯氧基)乙氧基]乙烷、9,9-雙(4-胺基苯基)茀、1-(4-胺基苯基)-2,3-二氫-1,3,3-三甲基-1H-茚-5-胺、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、4,4’-雙(4-胺基苯氧基)聯苯、4,4’-雙(3-胺基苯氧基)聯苯、2,2-雙(4-胺基苯氧基苯基)丙烷、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷、3,3’-二羧基-4,4’-二胺基二苯基甲烷、4,6-二羥基-1,3-苯二胺、3,3’-二羥基-4,4’-二胺基聯苯、2,2-雙(3-胺基-4-羥基苯基)-六氟丙烷、3,3’,4,4’-四胺基聯苯、1,6-二胺基己烷、1,3-雙(3-胺基丙基)-1,1,3,3-四甲基二矽氧烷、1-胺基-3-胺基甲基-3,5,5-三甲基環己烷、4,4’-亞甲基雙(4-環己基胺)、1,4-二胺基環己烷、雙環[2.2.1]庚烷雙(甲基胺)、三環[3.3.1.13.7]癸烷-1,3-二胺、4-胺基苯甲酸-4-胺基苯基酯、2-(4-胺基苯基)-5-胺基苯并

Figure 112109390-A0202-12-0011-27
唑、9,9-雙[4-(4-胺基苯氧基)苯基]茀、2,2’-雙(3-磺丙氧基)-4,4’-二胺基聯苯、4,4’-雙(4-胺基苯氧基)聯苯-3,3’-二磺酸等。此等其他二胺係可使用1種或併用2種以上。併用其他二胺時,全部二胺中之其他二胺之使用量例如為90重量%以下,較佳係70重量%以下。 Examples of other diamines include aromatic diamines, aliphatic diamines, alicyclic diamines, and the like. More specifically, examples include: 1,4-diaminobenzene, 1,3-diaminobenzene, 2,4-diaminotoluene, 4,4-diaminodiphenylmethane, 4, 4'-Diaminodiphenyl ether, 3,4'-Diaminodiphenyl ether, 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-diamine Methyl-4,4'-diaminobiphenyl, 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, 3,7-diamino-dimethylbiphenyl Benzothiophene-5,5-dioxide, 4,4-diaminobenzophenone, 3,3'-diaminobenzophenone, 4,4'-bis(4-aminophenyl) ) thioether, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminobenzoaniline, 1,3-bis(4-aminophenoxy)propane, 1,4- Bis(4-aminophenoxy)butane, 1,5-bis(4-aminophenoxy)pentane, 1,3-bis(4-aminophenoxy)-2,2-bis Methylpropane, 1,2-bis[2-(4-aminophenoxy)ethoxy]ethane, 9,9-bis(4-aminophenyl)fluoride, 1-(4-amino Phenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene-5-amine, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis (4-Aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 4,4'-bis(4-aminophenoxy)biphenyl, 4,4'- Bis(3-aminophenoxy)biphenyl, 2,2-bis(4-aminophenoxyphenyl)propane, bis[4-(4-aminophenoxy)phenyl]terine, bis [4-(3-Aminophenoxy)phenyl]trines, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 3,3'-dicarboxy-4 ,4'-Diaminodiphenylmethane, 4,6-dihydroxy-1,3-phenylenediamine, 3,3'-dihydroxy-4,4'-diaminobiphenyl, 2,2- Bis(3-amino-4-hydroxyphenyl)-hexafluoropropane, 3,3',4,4'-tetraaminobiphenyl, 1,6-diaminohexane, 1,3-bis( 3-Aminopropyl)-1,1,3,3-tetramethyldisiloxane, 1-amino-3-aminomethyl-3,5,5-trimethylcyclohexane, 4 ,4'-methylenebis(4-cyclohexylamine), 1,4-diaminocyclohexane, bicyclo[2.2.1]heptanebis(methylamine), tricyclo[3.3.1.13.7 ] Decane-1,3-diamine, 4-aminobenzoic acid-4-aminophenyl ester, 2-(4-aminophenyl)-5-aminobenzo
Figure 112109390-A0202-12-0011-27
Azole, 9,9-bis[4-(4-aminophenoxy)phenyl]fluorine, 2,2'-bis(3-sulfopropoxy)-4,4'-diaminobiphenyl, 4,4'-bis(4-aminophenoxy)biphenyl-3,3'-disulfonic acid, etc. These other diamines can be used alone or in combination of two or more types. When other diamines are used together, the usage amount of other diamines in all diamines is, for example, 90% by weight or less, preferably 70% by weight or less.

作為酸二酐係可列舉例如:焦蜜石酸酐、氧二酞酸二酐、聯苯基-3,4,3’,4’-四羧酸二酐、二苯甲酮-3,4,3’,4’-四羧酸二酐、二苯基碸- 3,4,3’,4’-四羧酸二酐、4,4’-(2,2-六氟亞異丙基)二酞酸二酐、間-聯三苯基-3,4,3’,4’-四羧酸二酐、對-聯三苯基-3,4,3’,4’-四羧酸二酐、環丁烷-1,2,3,4-四羧酸二酐、1-羧基甲基-2,3,5-環戊烷三羧酸-2,6:3,5-二酸酐、環己烷-1,2,4,5-四羧酸二酐、丁烷-1,2,3,4-四羧酸二酐、4-苯基乙炔基酞酸酐、萘-1,4,5,8-四羧酸二酐、雙(1,3-二側氧基-1,3-二氫異苯并呋喃-5-羧酸)1,4-伸苯酯等。此等酸二酐之中,對應於上述通式(3)中之構造單元A的較佳態樣,較佳係焦蜜石酸酐、聯苯基-3,4,3’,4’-四羧酸二酐、雙(1,3-二側氧基-1,3-二氫異苯并呋喃-5-羧酸)1,4-伸苯酯。此等酸二酐係可單獨使用,亦可併用2種以上。酸二酐之使用量係例如,併用本發明之二胺、及其他二胺時,相對於亦包含其他二胺的全部二胺1莫耳,為0.9莫耳至1.1莫耳,從更提高聚合度之觀點而言,較佳係0.95莫耳至1.05莫耳。 Examples of acid dianhydrides include: pyromelite acid anhydride, oxyphthalic acid dianhydride, biphenyl-3,4,3',4'-tetracarboxylic dianhydride, benzophenone-3,4, 3',4'-tetracarboxylic dianhydride, diphenylsine- 3,4,3',4'-tetracarboxylic dianhydride, 4,4'-(2,2-hexafluoroisopropylidene) diphthalic acid dianhydride, m-terphenyl-3,4, 3',4'-tetracarboxylic dianhydride, p-terphenyl-3,4,3',4'-tetracarboxylic dianhydride, cyclobutane-1,2,3,4-tetracarboxylic acid dianhydride, 1-carboxymethyl-2,3,5-cyclopentanetricarboxylic acid-2,6:3,5-dicanhydride, cyclohexane-1,2,4,5-tetracarboxylic dianhydride , Butane-1,2,3,4-tetracarboxylic dianhydride, 4-phenylethynyl phthalic anhydride, naphthalene-1,4,5,8-tetracarboxylic dianhydride, bis(1,3-di Side oxygen group-1,3-dihydroisobenzofuran-5-carboxylic acid) 1,4-phenylene ester, etc. Among these acid dianhydrides, preferred ones corresponding to the structural unit A in the above general formula (3) are pyromelite acid anhydride and biphenyl-3,4,3',4'-tetrakis. Carboxylic dianhydride, bis(1,3-dihydroisobenzofuran-5-carboxylic acid) 1,4-phenylene ester. These acid dianhydrides may be used alone, or two or more types may be used in combination. For example, when the diamine of the present invention and other diamines are used together, the usage amount of the acid dianhydride is 0.9 mole to 1.1 mole relative to 1 mole of all diamines including other diamines, thereby further improving polymerization. From a temperature perspective, the preferred range is 0.95 mol to 1.05 mol.

作為聚合溶劑係可列舉例如:N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、1,3-二甲基-2-咪唑啶酮等醯胺系溶劑;乙酸乙酯、乙酸丁酯、乙酸異丁酯、γ-丁內酯、γ-戊內酯、δ-戊內酯、γ-己內酯、ε-己內酯、α-甲基-γ-丁內酯等酯系溶劑;碳酸伸乙酯、碳酸伸丙酯等碳酸酯系溶劑;三乙二醇、乙基賽珞蘇、丁基賽珞蘇、丙二醇甲基醚乙酸酯、2-甲基賽珞蘇乙酸酯、乙基賽珞蘇乙酸酯、丁基賽珞蘇乙酸酯、二乙二醇等二醇系溶劑;酚、鄰-甲酚、間-甲酚、對-甲酚、3-氯酚、4-氯酚等酚系溶劑;1,2-二甲氧基乙烷、1,2-二乙氧基乙烷、四氫呋喃、二丁基醚、二乙基醚、1,4-二

Figure 112109390-A0202-12-0012-28
烷、環戊基甲基醚、二甘醇二甲醚、三甘醇二甲醚等醚系溶劑;丙酮、甲基乙基酮、甲基異丁基酮、二異丁基酮、環己酮、苯乙酮等酮系溶劑;甲苯、二甲苯等芳香族烴系溶劑;氯苯、二氯 苯等鹵化芳香族烴系溶劑;二甲基亞碸、環丁碸等碸系溶劑等。此等聚合溶劑之中,以N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-吡咯啶酮等醯胺系溶劑為佳。此等聚合溶劑係可單獨使用,亦可併用2種以上。 Examples of the polymerization solvent include N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, and N,N-dimethylformamide. Amine, 1,3-dimethyl-2-imidazolidinone and other amide solvents; ethyl acetate, butyl acetate, isobutyl acetate, γ-butyrolactone, γ-valerolactone, δ-valerolactone Ester solvents such as ester, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone; carbonate solvents such as ethyl carbonate and propyl carbonate; triethylene glycol, ethylene glycol, etc. Baserosu, butylcellosu, propylene glycol methyl ether acetate, 2-methylcellosu acetate, ethylcellosu acetate, butylcellosu acetate, diethyl Diol-based solvents such as diol; phenol-based solvents such as phenol, o-cresol, m-cresol, p-cresol, 3-chlorophenol, 4-chlorophenol; 1,2-dimethoxyethane, 1,2-diethoxyethane, tetrahydrofuran, dibutyl ether, diethyl ether, 1,4-di
Figure 112109390-A0202-12-0012-28
Alkanes, cyclopentyl methyl ether, diglyme, triglyme and other ether solvents; acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexane Ketone-based solvents such as ketone and acetophenone; aromatic hydrocarbon-based solvents such as toluene and xylene; halogenated aromatic hydrocarbon-based solvents such as chlorobenzene and dichlorobenzene; dimethyl sulfoxide, cyclobutane and other styrene-based solvents, etc. Among these polymerization solvents, amide solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-pyrrolidone are preferred. These polymerization solvents may be used alone, or two or more types may be used in combination.

作為聚合溶劑之使用量係反應系中之單體成分(二胺+酸二酐)之合計濃度通常成為5重量%至40重量%之量,較佳係成為10重量%至30重量%之量。藉由在5重量%至40重量%之單體濃度範圍進行聚合,可均勻地獲得高聚合度之聚醯胺酸溶液。又,若以低於上述單體濃度範圍之濃度進行聚合,聚醯胺酸之聚合度不夠高,會有最後所得的聚醯亞胺膜易碎之情形,若以高於上述單體濃度範圍之濃度進行聚合,會有單體不充分溶解的情形或反應溶液變得不均且進行凝膠化之情形。上述方法所得的上述通式(3)所示的聚醯胺酸溶液通常係直接使用於以後述方法所實施的聚醯亞胺化步驟。 The amount used as the polymerization solvent is such that the total concentration of the monomer components (diamine + acid dianhydride) in the reaction system is usually 5 to 40% by weight, preferably 10 to 30% by weight. . By performing polymerization in a monomer concentration range of 5% to 40% by weight, a polyamide solution with a high degree of polymerization can be obtained uniformly. In addition, if the polymerization is performed at a concentration lower than the above-mentioned monomer concentration range, the degree of polymerization of the polyamide acid is not high enough, and the final polyimide film will be brittle. If the polymerization is performed at a concentration higher than the above-mentioned monomer concentration range, When polymerizing at a certain concentration, the monomer may not be fully dissolved or the reaction solution may become uneven and gel. The polyamide solution represented by the general formula (3) obtained by the above method is usually used directly in the polyamide imidization step performed by the method described below.

<本發明之聚醯亞胺及其製造方法> <Polyimide of the present invention and its manufacturing method>

本發明之聚醯亞胺係具有以上述通式(4)所示的重複單元。又,上述通式(4)中之構造單元A係與上述通式(3)中之構造單元A相同,其較佳態樣亦為相同。 The polyimide system of the present invention has repeating units represented by the above general formula (4). In addition, the structural unit A in the above-mentioned general formula (4) is the same as the structural unit A in the above-mentioned general formula (3), and the preferred aspects thereof are also the same.

本發明之聚醯亞胺係可藉由以上述方法所得的本發明之聚醯胺酸進行脫水閉環反應(亞胺化反應)來製造。作為亞胺化反應之方法係可列舉例如:熱亞胺化法或化學亞胺化法。首先,詳細敘述有關熱亞胺化法。 The polyimide of the present invention can be produced by subjecting the polyamide of the present invention obtained by the above method to a dehydration ring-closure reaction (imidization reaction). Examples of methods for the imidization reaction include thermal imidization and chemical imidization. First, the thermal imidization method will be described in detail.

作為熱亞胺化法可列舉例如:使以上述方法所得的本發明之聚醯胺酸溶液澆注於玻璃板上,在真空中、或者氮氣等惰性氣體中、或空氣中進行加熱之方法等。更具體而言,例如,將本發明之聚醯胺酸溶液澆 注於玻璃板上,使其在烘箱中以50℃至190℃加熱,較佳係以100℃至180℃加熱並乾燥,形成聚醯胺酸膜(薄膜),再者,在200℃至400℃下加熱,較佳係在230℃至350℃下加熱,以進行亞胺化反應,可獲得聚醯亞胺膜(薄膜)。又,亞胺化反應較佳係在真空中或惰性氣體中進行。 Examples of the thermal imidization method include a method in which the polyamide solution of the present invention obtained by the above method is poured onto a glass plate and heated in a vacuum, in an inert gas such as nitrogen, or in air. More specifically, for example, the polyamide solution of the present invention is poured into Inject it on the glass plate, heat it in an oven at 50°C to 190°C, preferably 100°C to 180°C, and dry it to form a polyamide film (thin film). Furthermore, heat it at 200°C to 400°C. Heating at ℃, preferably at 230℃ to 350℃, to carry out the imidization reaction, a polyimide film (film) can be obtained. In addition, the imidization reaction is preferably carried out in vacuum or in an inert gas.

繼而,詳細敘述有關化學亞胺化法。作為化學亞胺化法係可列舉例如:在溶液中且在有機酸之酐及鹼存在下將以上述方法所得的本發明之聚醯胺酸進行脫水閉環反應之方法。更具體而言,例如在聚醯胺酸溶液中依需要再加入溶劑並調整成容易攪拌的適當之溶液黏度,一邊攪拌,一邊在其中添加由有機酸之酐及鹼所構成的脫水閉環劑(化學亞胺化劑),在0℃至100℃,較佳係在10℃至50℃下攪拌1小時至72小時,以進行亞胺化反應,可獲得聚醯亞胺。作為可使用的溶劑係可列舉例如:與聚醯胺酸之聚合溶劑為相同者,較佳態樣亦為相同。作為可使用的有機酸之酐係可列舉例如:乙酸酐、丙酸酐等,其中,從操作或分離容易性而言,以乙酸酐為佳。又,作為鹼係可列舉例如:吡啶、三乙基胺、喹啉等3級胺等,其中,從操作或分離容易性而言,以吡啶為佳。相對於聚醯胺酸之理論脫水量1莫耳,有機酸之酐的使用量通常為1莫耳至10莫耳,較佳係2莫耳至5莫耳。又,相對於有機酸之酐1莫耳,鹼之使用量通常為0.1莫耳至2莫耳,較佳係0.2莫耳至1莫耳。 Next, the chemical imidization method will be described in detail. Examples of the chemical imidization method include a method in which the polyamic acid of the present invention obtained by the above method is subjected to a dehydration ring-closure reaction in a solution in the presence of an anhydride of an organic acid and a base. More specifically, for example, a solvent is added to the polyamic acid solution as necessary to adjust the viscosity of the solution to an appropriate solution that is easy to stir, and a dehydration ring-closing agent composed of an anhydride of an organic acid and a base is added thereto while stirring. Chemical imidization agent), stir at 0°C to 100°C, preferably at 10°C to 50°C for 1 hour to 72 hours, to carry out the imidization reaction to obtain polyimide. Examples of solvents that can be used include those that are the same as the polymerization solvent for polyamide acid, and preferred embodiments are also the same. Examples of organic acid anhydrides that can be used include acetic anhydride, propionic anhydride, and the like. Among them, acetic anhydride is preferred in terms of ease of handling or separation. Examples of the base include tertiary amines such as pyridine, triethylamine, and quinoline. Among them, pyridine is preferred in terms of ease of handling and separation. Relative to the theoretical dehydration amount of polyamide 1 mole, the usage amount of organic acid anhydride is usually 1 mole to 10 mole, preferably 2 mole to 5 mole. In addition, the usage amount of the base is usually 0.1 mole to 2 mole, preferably 0.2 mole to 1 mole, based on 1 mole of the anhydride of the organic acid.

在上述化學亞胺化法所得的反應混合物中,因混入未反應之鹼或有機酸之酐、副生成物等(以下,此等有時一律稱為雜質。),故可去除此等並將聚醯亞胺進行分離/純化。作為純化方法係可利用公知方法,例如可應用下述方法:一邊攪拌在亞胺化反應後所得的反應混合物,一邊添加 在大量之弱溶劑中使聚醯亞胺析出之後回收聚醯亞胺粉末,重複洗淨雜質去除,再進行減壓乾燥而獲得聚醯亞胺粉末之方法等。此時,作為可使用之弱溶劑係使聚醯亞胺析出,並可有效地去除雜質,只要為容易乾燥之溶劑即可,可列舉例如:水;甲醇、乙醇、異丙醇等醇類等,又,此等係可混合使用。添加於弱溶劑中並析出時之聚醯亞胺溶液的濃度,過高時,析出之聚醯亞胺變成粒塊,在該粗大粒子中會有雜質殘留的情形,或將所得的聚醯亞胺粉末再溶解於溶劑時,會有耗時的情形。另一方面,聚醯亞胺溶液之濃度過度稀薄時,必須有大量之弱溶劑,而有以廢溶劑處理而增加環境負荷或製造成本變高之情形。因此,添加於弱溶劑中時之聚醯亞胺溶液的濃度為20重量%以下,更佳係10重量%以下。此時使用之弱溶劑之量較佳係與聚醯亞胺溶液為相同量(重量基準)以上,以1.5重量倍至10重量倍為佳。回收所得的聚醯亞胺粉末,以真空乾燥或熱風乾燥等去除殘留溶劑。乾燥溫度與時間係只要為聚醯亞胺不變質的溫度、時間即可,並無限制,例如在溫度30℃至150℃下乾燥3小時至24小時。 Since the reaction mixture obtained by the above chemical imidization method contains unreacted alkali, anhydride of organic acid, by-products, etc. (hereinafter, these are sometimes collectively referred to as impurities), these can be removed and Polyimide for isolation/purification. Known methods can be used as the purification method. For example, the following method can be applied: adding the reaction mixture obtained after the imidization reaction while stirring Methods such as precipitating polyimide in a large amount of weak solvent, recovering polyimide powder, repeatedly washing to remove impurities, and then drying under reduced pressure to obtain polyimide powder. At this time, the weak solvent that can be used is a solvent that can precipitate polyimide and effectively remove impurities, as long as it is easy to dry. Examples include: water; alcohols such as methanol, ethanol, isopropyl alcohol, etc. , and these systems can be mixed. When the concentration of the polyimide solution added to a weak solvent and precipitated is too high, the precipitated polyimide will turn into particles, and impurities may remain in the coarse particles, or the resulting polyimide may be It is time-consuming to redissolve the amine powder in the solvent. On the other hand, when the concentration of the polyimide solution is too thin, a large amount of weak solvent is required, and waste solvent treatment may increase the environmental load or increase the manufacturing cost. Therefore, the concentration of the polyimide solution when added to the weak solvent is 20% by weight or less, more preferably 10% by weight or less. The amount of the weak solvent used at this time is preferably the same amount (weight basis) or more as the polyimide solution, preferably 1.5 times to 10 times by weight. The obtained polyimide powder is recovered and the residual solvent is removed by vacuum drying or hot air drying. The drying temperature and time are not limited as long as the polyimide does not deteriorate, for example, drying at a temperature of 30°C to 150°C for 3 hours to 24 hours.

將以如此方式所得的上述通式(4)所示的聚醯亞胺粉末作成聚醯亞胺膜時,必須將上述通式(4)所示的聚醯亞胺粉末暫時溶解於溶劑並形成聚醯亞胺溶液。作為可使用的溶劑係例如,除了與上述聚合溶劑為相同的溶劑以外,可列舉如:松節油、礦油精、石油腦系溶劑等。此等溶劑係可單獨使用,亦可併用2種以上。聚醯亞胺粉末之溶解方法係可在空氣中或惰性氣體中在室溫至溶劑之沸點以下的溫度範圍經過1小時至48小時而溶解,並形成為聚醯亞胺溶液。 When forming a polyimide film from the polyimide powder represented by the above-mentioned general formula (4) obtained in this way, it is necessary to temporarily dissolve the polyimide powder represented by the above-mentioned general formula (4) in a solvent and form Polyimide solution. Examples of solvent systems that can be used include the same solvents as the above-mentioned polymerization solvents, and include turpentine, mineral spirits, naphtha-based solvents, and the like. These solvents can be used alone, or two or more types can be used in combination. The polyimide powder can be dissolved in the air or in an inert gas at a temperature ranging from room temperature to below the boiling point of the solvent for 1 to 48 hours, and formed into a polyimide solution.

將如此方式所得的聚醯亞胺溶液澆注於玻璃板上,在真空中、或者氮氣等惰性氣體中、或空氣中進行加熱,藉此可獲得聚醯亞胺膜(薄膜)。例如,在烘箱中,通常在200℃至400℃下,較佳係在250℃至350℃下乾燥,藉此可獲得聚醯亞胺膜。製作聚醯亞胺膜較佳係在真空中或在惰性氣體中進行。 The polyimide solution obtained in this manner is poured onto a glass plate and heated in a vacuum, in an inert gas such as nitrogen, or in air, thereby obtaining a polyimide film (thin film). For example, the polyimide film can be obtained by drying in an oven, usually at 200°C to 400°C, preferably at 250°C to 350°C. Preferably, the polyimide film is produced in a vacuum or in an inert gas.

化學亞胺化反應亦可藉由使形成於基板上之聚醯胺酸膜在吡啶或三乙胺等3級胺存在下、浸漬於含有乙酸酐等脫水環化試劑的溶液中而進行。藉此,亦可製作部分或幾乎完全經醯亞胺化而成的聚醯亞胺薄膜,使此再如上述般進行熱處理,可獲得聚醯亞胺薄膜。 The chemical imidization reaction can also be performed by immersing the polyamide film formed on the substrate in a solution containing a dehydration cyclization reagent such as acetic anhydride in the presence of a tertiary amine such as pyridine or triethylamine. In this way, a polyimide film that is partially or almost completely imidized can also be produced, and then heat-treated as above to obtain a polyimide film.

藉由上述之方法所得的上述通式(4)所示的聚醯亞胺之分子量以重量平均分子量計,係以1萬至50萬為佳,以1萬至30萬更佳,以2萬至20萬又更佳。若聚醯亞胺之分子量為1萬以上,為可成型,又,容易維持良好的力學特性。又,若聚醯亞胺之分子量為50萬以下,進行合成時容易控制分子量,又,容易獲得適度的黏度之溶液且容易操作之情形居多。又,聚醯亞胺之分子量係可藉由例如GPC法等常用方法進行測定。 The molecular weight of the polyimide represented by the above general formula (4) obtained by the above method is based on the weight average molecular weight, and is preferably 10,000 to 500,000, more preferably 10,000 to 300,000, and 20,000. To 200,000 is even better. If the molecular weight of polyimide is above 10,000, it is moldable and can easily maintain good mechanical properties. In addition, if the molecular weight of the polyimide is 500,000 or less, it is easy to control the molecular weight during synthesis, and it is often easy to obtain a solution with appropriate viscosity and easy to handle. In addition, the molecular weight of polyimide can be measured by a common method such as GPC method.

[實施例] [Example]

以下,呈示本發明之實施例,但本發明並不受此等所限定。又,各實施例/比較例所示的值係藉由下述分析方法分析之值。 Examples of the present invention are shown below, but the present invention is not limited thereto. In addition, the values shown in each Example/Comparative Example are values analyzed by the following analysis method.

[HPLC純度] [HPLC purity]

以下列測定條件進行HPLC測定時之面積百分率值設為實施例中記載之各化合物的純度。 The area percentage value when HPLC measurement was performed under the following measurement conditions was taken as the purity of each compound described in the Examples.

<液體色層分析法測定條件> <Measurement conditions for liquid chromatography>

裝置:島津製作所股份有限公司製LC-20AD Device: LC-20AD manufactured by Shimadzu Corporation

管柱:L-column2 ODS(3μm、4.6mmφ×150mm) Column: L-column2 ODS (3μm, 4.6mmφ×150mm)

流動相:A液=50%乙腈水(添加0.1體積%甲酸) Mobile phase: Liquid A = 50% acetonitrile water (add 0.1% by volume formic acid)

B液=乙腈(添加0.1體積%甲酸) Liquid B = acetonitrile (add 0.1% by volume formic acid)

流動相梯度:B液濃度:50%(0分鐘)→100%(15分鐘後)→100%(25分鐘後) Mobile phase gradient: Solution B concentration: 50% (0 minutes) → 100% (after 15 minutes) → 100% (after 25 minutes)

流量:1.0ml/min Flow rate: 1.0ml/min

管柱溫度:40℃、檢測波長:UV254nm Column temperature: 40℃, detection wavelength: UV254nm

[NMR測定] [NMR measurement]

1H-NMR係使用四甲基矽烷作為內標,並使用氘代二甲基亞碸(DMSO)作為溶劑,藉由JEOL-ESC400分光計記錄。 1 H-NMR was recorded with a JEOL-ESC400 spectrometer using tetramethylsilane as the internal standard and deuterated dimethylsulfoxide (DMSO) as the solvent.

[LC-MS測定] [LC-MS measurement]

LC-MS係以下列測定條件進行分離、質量分析,並鑑定目的物。 LC-MS uses the following measurement conditions to perform separation, mass analysis, and identification of the target substance.

<LC-MS測定條件> <LC-MS measurement conditions>

裝置:Waters股份有限公司製「Xevo G2 Q-Tof」 Device: "Xevo G2 Q-Tof" manufactured by Waters Co., Ltd.

管柱:CELI製 Column: Made by CELI

L-column2 ODS(2μm、2.1mm

Figure 112109390-A0202-12-0017-30
×100mm) L-column2 ODS (2μm, 2.1mm
Figure 112109390-A0202-12-0017-30
×100mm)

管柱溫度:40℃ Tube string temperature: 40℃

檢測波長:UV 220-550nm Detection wavelength: UV 220-550nm

流動相:A液=10mM乙酸銨水、B液=乙腈、 Mobile phase: Liquid A = 10mM ammonium acetate water, Liquid B = acetonitrile,

C液=異丙醇 Liquid C = isopropyl alcohol

流動相流量:0.4ml/min Mobile phase flow: 0.4ml/min

流動相梯度:A/B/C=40/50/10→0/90/10(5.21分鐘) Mobile phase gradient: A/B/C=40/50/10→0/90/10 (5.21 minutes)

檢測法:Q-Tof Detection method: Q-Tof

離子化法:ESI(+)(-)法 Ionization method: ESI(+)(-) method

離子源(Ion Source):電壓(+)2.0kV、溫度120℃ Ion Source: Voltage (+) 2.0kV, temperature 120℃

取樣錐(Sampling Cone):電壓30V、氣體流量50L/h Sampling Cone: Voltage 30V, gas flow 50L/h

脫溶劑氣體(Desolvation Gas):溫度400℃、氣體流量1200L/h Desolvation Gas: Temperature 400℃, gas flow 1200L/h

[融點之測定] [Measurement of melting point]

使用TG-DTA(RIGAKU股份有限公司製TG-DTA 8121/S),在氮氣氣流下、從室溫以10℃/分鐘昇溫至500℃,測定融點(融解吸熱最大峰的峰頂溫度)。 Using TG-DTA (TG-DTA 8121/S manufactured by RIGAKU Co., Ltd.), the temperature was raised from room temperature to 500°C at a rate of 10°C/min under nitrogen flow, and the melting point (peak temperature of the maximum peak of melting endotherm) was measured.

[溶劑溶解性] [Solvent solubility]

混合二胺化合物1重量份、及下述溶劑5重量份,依據下述評定基準,評定溶劑溶解性。 1 part by weight of the diamine compound and 5 parts by weight of the following solvent were mixed, and the solvent solubility was evaluated based on the following evaluation criteria.

<溶劑> <Solvent>

‧NMP(N-甲基吡咯啶酮) ‧NMP (N-methylpyrrolidone)

‧DMAc(N,N-二甲基乙醯胺) ‧DMAc(N,N-Dimethylacetamide)

‧DMF(N,N-二甲基甲醯胺) ‧DMF(N,N-dimethylformamide)

<評定基準> <Evaluation criteria>

○:在室溫下溶解 ○: Dissolve at room temperature

△:若進行加溫則會溶解,即使進行冷卻,亦不析出結晶 △: It dissolves when heated and does not crystallize even when cooled.

×:若進行加溫則會溶解,但若進行冷卻,則會析出結晶,或者即使進行加溫亦不溶解 ×: It will dissolve if heated, but crystals will precipitate if cooled, or it will not dissolve even if heated.

[5%失重溫度之測定] [Measurement of 5% weight loss temperature]

使用TG-DTA(RIGAKU股份有限公司製TG-DTA 8121/S),在氮氣氣流下,從室溫以10℃/分鐘昇溫至500℃,測定5%失重溫度(在氮氣下之Td 5、℃)。 Using TG-DTA (TG-DTA 8121/S manufactured by RIGAKU Co., Ltd.), the temperature was raised from room temperature to 500°C at a rate of 10°C/min under nitrogen flow, and the 5% weight loss temperature (T d 5 under nitrogen, ℃).

[玻璃轉移溫度之測定] [Measurement of glass transition temperature]

使用DMA(SII DMS-6100(Hitachi High-Tech Science公司製),以拉伸模式(昇溫速度5℃/分鐘、頻率1Hz、溫度40℃-350℃)進行測定,從損耗模數之極大值求出玻璃轉移溫度(Tg、℃)。 Measurement was performed using DMA (SII DMS-6100 (manufactured by Hitachi High-Tech Science Co., Ltd.)) in the tensile mode (heating rate 5°C/min, frequency 1Hz, temperature 40°C-350°C) and calculated from the maximum value of the loss modulus. Get the glass transition temperature (Tg, ℃).

[線性熱膨脹係數之測定] [Measurement of linear thermal expansion coefficient]

使用熱機械分析裝置(Hitachi High-Tech Science公司製TMA-7100),將荷重(靜荷重)設為膜厚(μm)×0.5g重,使5mm×10mm大小的聚醯亞胺膜加熱至150℃之後,冷卻至40℃。將此以5℃/分鐘二次運行至450℃所得的TMA曲線從100℃至200℃的斜率之平均設為線性熱膨脹係數(CTE、ppm/K)。 Using a thermomechanical analysis device (TMA-7100 manufactured by Hitachi High-Tech Science Co., Ltd.), the load (static load) was set to film thickness (μm) × 0.5 g weight, and a polyimide film of 5 mm × 10 mm was heated to 150 °C, cool to 40 °C. The average of the slopes of the TMA curve from 100°C to 200°C obtained by running twice to 450°C at 5°C/min was defined as the coefficient of linear thermal expansion (CTE, ppm/K).

[比介電常數及介電損耗正切之測定] [Determination of specific dielectric constant and dielectric loss tangent]

使用向量網路分析儀(Vector Network Analyzer)(Anritsu公司製、商品名;MS46122B)及TE模式之空腔共振器(AET公司製),測定頻率10GHz之聚醯亞胺膜的比介電常數及介電損耗正切。又,於測定所使用之材料係在溫度:24℃至26℃、相對濕度:未達25%之條件下放置24小時者。 Using a vector network analyzer (Vector Network Analyzer) (manufactured by Anritsu Co., Ltd., trade name; MS46122B) and a TE mode cavity resonator (manufactured by AET Co., Ltd.), the specific dielectric constant and Dielectric loss tangent. In addition, the material used for the measurement is left at a temperature of 24°C to 26°C and a relative humidity of less than 25% for 24 hours.

[實施例1](上述式(2)所示的二硝基化合物之製造例) [Example 1] (Production example of dinitro compound represented by the above formula (2))

在具備攪拌機、溫度計及回流冷卻管之四口燒瓶中裝入4-硝基苯甲醯氯245.62g(1.32mol)、乙腈400g,一邊攪拌一邊冷卻至0℃。然後,一邊 攪拌一邊使混合溶解有第三丁基氫醌100.01g(0.60mol)、乙腈400.00g、吡啶104.71g(1.32mol)者在0℃至15℃下以20分鐘滴入。然後,升溫至20℃,將反應溫度保持於20℃至25℃,一邊攪拌15小時。反應結束後,藉由將析出之結晶進行過濾、乾燥,獲得上述式(2)所示的二硝基化合物之白色粉末275.28g(HPLC純度98.28%、物理收率98.51%)。1H-NMR之光譜值係如下述,以及在圖1中呈示測定圖表。 Put 245.62g (1.32mol) of 4-nitrobenzyl chloride and 400g of acetonitrile into a four-necked flask equipped with a stirrer, a thermometer and a reflux cooling tube, and cool to 0°C while stirring. Then, 100.01 g (0.60 mol) of tert-butylhydroquinone, 400.00 g of acetonitrile, and 104.71 g of pyridine (1.32 mol) were mixed and dissolved while stirring, and the mixture was added dropwise over 20 minutes at 0°C to 15°C. Then, the temperature was raised to 20°C, and the reaction temperature was maintained at 20°C to 25°C while stirring for 15 hours. After the reaction, the precipitated crystals were filtered and dried to obtain 275.28 g of white powder of the dinitro compound represented by the above formula (2) (HPLC purity 98.28%, physical yield 98.51%). The spectral values of 1 H-NMR are as follows, and the measurement chart is shown in Fig. 1 .

[1H-NMR(二甲基亞碸-d6)] [ 1 H-NMR (dimethylsulfoxide-d6)]

δ(ppm)=8.47-8.37ppm(8H、m)、7.42-7.39(2H、m)、7.33(1H、dd)、1.32(9H、s)。 δ(ppm)=8.47-8.37ppm(8H,m), 7.42-7.39(2H,m), 7.33(1H,dd), 1.32(9H,s).

[實施例2](上述式(1)所示的二胺之製造例) [Example 2] (Production example of diamine represented by the above formula (1))

在具有氫氣導入管之四口燒瓶中裝入實施例1中所得的式(2)所示的二硝基化合物40.01g(0.09mol)、含有水50重量%之鈀/碳粉末(鈀含量:以乾燥重量換算為5重量%)0.80g及N,N-二甲基甲醯胺400.01g,在反應容器以氫氣取代。將此一邊攪拌一邊升溫至80℃,使式(2)所示的二硝基化合物溶解之後,在80℃下攪拌2小時並使其反應。反應結束後,藉由過濾去除鈀/碳粉末,將濾液冷卻至室溫之後,滴入至大量之水中以使結晶析出。濾取析出之結晶,以甲醇洗淨之後,在90℃下真空乾燥6小時,獲得上述式(1)所示的二胺之灰色粉末32.99g(HPLC純度99.81%、物理收率94.68%)。融點(TG-DTA)為295.2℃。又,1H-NMR及LC-MS之光譜值係如下述,以及分別在圖2及3中呈示各個測定圖表。又,依據上述評定基準並將所評定的溶劑溶解性之結果呈示於表1中。 A four-necked flask with a hydrogen gas inlet pipe was charged with 40.01 g (0.09 mol) of the dinitro compound represented by formula (2) obtained in Example 1 and palladium/carbon powder containing 50% by weight of water (palladium content : 5% by weight based on dry weight) 0.80g and 400.01g of N,N-dimethylformamide were replaced with hydrogen in the reaction vessel. The temperature was raised to 80°C while stirring to dissolve the dinitro compound represented by the formula (2), and then the mixture was stirred at 80°C for 2 hours to react. After the reaction is completed, the palladium/carbon powder is removed by filtration, and the filtrate is cooled to room temperature and then dropped into a large amount of water to precipitate crystals. The precipitated crystals were filtered, washed with methanol, and dried in vacuum at 90° C. for 6 hours to obtain 32.99 g of gray powder of the diamine represented by the above formula (1) (HPLC purity 99.81%, physical yield 94.68%). The melting point (TG-DTA) is 295.2°C. In addition, the spectral values of 1 H-NMR and LC-MS are as follows, and each measurement chart is shown in FIGS. 2 and 3 respectively. In addition, the results of the solvent solubility evaluation based on the above evaluation criteria are shown in Table 1.

[1H-NMR(二甲基亞碸-d6)] [ 1 H-NMR (dimethylsulfoxide-d6)]

δ(ppm)=7.82-7.78ppm(4H、m)、7.14-7.09(3H、m)、6.66-6.62(4H、m)、6.19-6.15(4H、m)、1.29(9H、s)。 δ(ppm)=7.82-7.78ppm(4H,m), 7.14-7.09(3H,m), 6.66-6.62(4H,m), 6.19-6.15(4H,m), 1.29(9H,s).

[LC-MS] [LC-MS]

質譜值([M+H]+):405.1822 Mass spectrum value ([M+H] + ): 405.1822

(上述式(1)所示的二胺之計算分子量(ESI+;[C24H24N2O4+H]+):405.1809)。 (Calculated molecular weight (ESI + ; [C 24 H 24 N 2 O 4 +H] + ) of the diamine represented by the above formula (1): 405.1809).

[比較例1](上述式(8)所示的化合物) [Comparative Example 1] (Compound represented by the above formula (8))

對於上述式(8)所示的化合物(HPLC純度:99.68%),依據上述評定基準評定溶劑溶解性。結果呈示於表1中。 The solvent solubility of the compound represented by the above formula (8) (HPLC purity: 99.68%) was evaluated based on the above evaluation criteria. The results are presented in Table 1.

[參考例1](下述式(9)所示的化合物) [Reference Example 1] (Compound represented by the following formula (9))

對於下述式(9)所示的化合物(HPLC純度:99.51%),依據上述評定基準評定溶劑溶解性。結果呈示於表1中。 The solvent solubility of the compound represented by the following formula (9) (HPLC purity: 99.51%) was evaluated based on the above evaluation criteria. The results are presented in Table 1.

Figure 112109390-A0202-12-0021-13
Figure 112109390-A0202-12-0021-13

[表1]

Figure 112109390-A0202-12-0021-14
[Table 1]
Figure 112109390-A0202-12-0021-14

[實施例3](具有上述通式(3)所示的重複單元之聚醯胺酸及具有上述通式(4)所示的重複單元之聚醯亞胺的製造例) [Example 3] (Example of production of polyamide having a repeating unit represented by the above general formula (3) and polyimide having a repeating unit represented by the above general formula (4))

將實施例2所得的上述式(1)所示的二胺6.08g(15.00mmol)溶解於脫水N-甲基吡咯啶酮(以下,有時稱為「NMP」)24.46g中。然後,徐緩地加入聯苯基-3,4,3’,4’-四羧酸二酐(以下,有時稱為「BPDA」)4.41g(15.00mmol)之後(全部溶質濃度:30重量%),在室溫下攪拌24小時,進行增黏而攪拌變得困難,故一邊適當加入脫水NMP一邊再攪拌48小時而獲得具有上述通式(3)所示的重複單元之聚醯胺酸的溶液(最終溶質濃度:18.53重量%)。然後,將所得的聚醯胺酸溶液塗佈於玻璃板上之後,在80℃下加熱3小時而獲得聚醯胺酸膜,再於250℃下加熱1小時,在300℃下加熱1小時進行熱亞胺化。然後,為了去除殘留應力,從玻璃基板剝離而在310℃下加熱1小時,獲得具有上述通式(4)所示的重複單元之聚醯亞胺膜。對於所得的聚醯亞胺膜,測定玻璃轉移溫度、5%失重溫度、線性熱膨脹係數、比介電常數及介電損耗正切。測定結果呈示於表2中。 6.08 g (15.00 mmol) of the diamine represented by the above formula (1) obtained in Example 2 was dissolved in 24.46 g of dehydrated N-methylpyrrolidone (hereinafter, sometimes referred to as "NMP"). Then, 4.41 g (15.00 mmol) of biphenyl-3,4,3',4'-tetracarboxylic dianhydride (hereinafter, sometimes referred to as "BPDA") was gradually added (total solute concentration: 30% by weight) ) and stirred at room temperature for 24 hours. The viscosity increased and stirring became difficult. Therefore, dehydrated NMP was appropriately added while stirring for another 48 hours to obtain a polyamide having a repeating unit represented by the above general formula (3). Solution (final solute concentration: 18.53 wt%). Then, the obtained polyamic acid solution was coated on a glass plate, heated at 80°C for 3 hours to obtain a polyamic acid film, and then heated at 250°C for 1 hour and 300°C for 1 hour. Thermal imidization. Then, in order to remove residual stress, the film was peeled off from the glass substrate and heated at 310° C. for 1 hour to obtain a polyimide film having a repeating unit represented by the above general formula (4). For the obtained polyimide film, the glass transition temperature, 5% weight loss temperature, linear thermal expansion coefficient, specific dielectric constant and dielectric loss tangent were measured. The measurement results are presented in Table 2.

[參考例2](由上述式(8)所示的二胺及BPDA所得的聚醯亞胺) [Reference Example 2] (Polyimide obtained from the diamine represented by the above formula (8) and BPDA)

將上述式(8)所示的二胺1.05g(3.00mmol)加入脫水NMP7.71g中,在室溫下攪拌片刻,但未完全溶解。在此,加熱至95℃使二胺溶解,然後,在95℃加熱下徐緩地加入BPDA0.88g(3.00mmol)之後(全部溶質濃度:30重量%),冷卻至室溫而反應2小時,進行增黏而攪拌變得困難,故使用脫水NMP而稀釋至15.15重量%,再持續攪拌而獲得聚醯胺酸溶液(添加BPDA後至獲得聚醯胺酸為止,合計進行攪拌72小時)。將所得聚醯胺酸溶液塗佈於玻璃板上之後,在80℃下加熱3小時而形成為聚醯胺酸膜,再將此於250℃下加熱1小時,在300℃下加熱1小時而進行熱亞胺化。然 後,為了去除殘留應力,從玻璃基板剝離而在310℃下加熱1小時,獲得聚醯亞胺膜。對於所得的聚醯亞胺薄膜,測定玻璃轉移溫度、5%失重溫度、線性熱膨脹係數、比介電常數及介電損耗正切。測定結果呈示於表2中。 1.05g (3.00mmol) of the diamine represented by the above formula (8) was added to 7.71g of dehydrated NMP, and the mixture was stirred at room temperature for a while, but it was not completely dissolved. Here, the diamine was dissolved by heating to 95°C, and then 0.88g (3.00mmol) of BPDA was slowly added while heating at 95°C (total solute concentration: 30% by weight), and then cooled to room temperature and reacted for 2 hours. The viscosity increased and stirring became difficult, so dehydrated NMP was used to dilute to 15.15% by weight, and stirring was continued to obtain a polyamic acid solution (a total of 72 hours of stirring were carried out after adding BPDA until polyamic acid was obtained). The obtained polyamide solution was coated on a glass plate, heated at 80°C for 3 hours to form a polyamide film, and then heated at 250°C for 1 hour and 300°C for 1 hour. Perform thermal imidization. Ran Then, in order to remove residual stress, it was peeled off from the glass substrate and heated at 310° C. for 1 hour to obtain a polyimide film. For the obtained polyimide film, the glass transition temperature, 5% weight loss temperature, linear thermal expansion coefficient, specific dielectric constant and dielectric loss tangent were measured. The measurement results are presented in Table 2.

[參考例3](由上述式(9)所示的二胺及BPDA所得的聚醯亞胺) [Reference Example 3] (Polyimide obtained from the diamine represented by the above formula (9) and BPDA)

除了使用上述式(9)所示的二胺3.62g(10.00mmol)以取代上述式(8)所示的二胺之外,進行與參考例2之相同操作而獲得聚醯亞胺膜。對於所得的聚醯亞胺薄膜,測定玻璃轉移溫度、5%失重溫度、線性熱膨脹係數、比介電常數及介電損耗正切。測定結果呈示於表2中。 Except that 3.62 g (10.00 mmol) of the diamine represented by the above formula (9) was used instead of the diamine represented by the above formula (8), the same operation as Reference Example 2 was performed to obtain a polyimide film. For the obtained polyimide film, the glass transition temperature, 5% weight loss temperature, linear thermal expansion coefficient, specific dielectric constant and dielectric loss tangent were measured. The measurement results are presented in Table 2.

[參考例4](由下述式(10)所示的二胺及BPDA所得的聚醯亞胺) [Reference Example 4] (Polyimide obtained from the diamine represented by the following formula (10) and BPDA)

除了使用上述式(10)所示的二胺0.69g(1.50mmol)以取代上述式(8)所示的二胺之外,進行與參考例2之相同操作而獲得聚醯亞胺膜。對於所得的聚醯亞胺膜,測定玻璃轉移溫度、5%失重溫度、線性熱膨脹係數、比介電常數及介電損耗正切。測定結果呈示於表2中。 Except that 0.69 g (1.50 mmol) of the diamine represented by the above formula (10) was used instead of the diamine represented by the above formula (8), the same operation as in Reference Example 2 was performed to obtain a polyimide film. For the obtained polyimide film, the glass transition temperature, 5% weight loss temperature, linear thermal expansion coefficient, specific dielectric constant and dielectric loss tangent were measured. The measurement results are presented in Table 2.

Figure 112109390-A0202-12-0023-15
Figure 112109390-A0202-12-0023-15

[表2]

Figure 112109390-A0202-12-0024-16
[Table 2]
Figure 112109390-A0202-12-0024-16

Figure 112109390-A0202-11-0002-3
Figure 112109390-A0202-11-0002-3

Claims (9)

一種二胺,其為下述式(1)所示者, A diamine represented by the following formula (1),
Figure 112109390-A0202-13-0001-17
Figure 112109390-A0202-13-0001-17
一種請求項1所述的二胺之製造方法,其係將下述式(2)所示的二硝基化合物進行還原, A method for producing the diamine according to claim 1, which is to reduce the dinitro compound represented by the following formula (2),
Figure 112109390-A0202-13-0001-18
Figure 112109390-A0202-13-0001-18
一種二硝基化合物,其為下述式(2)所示者, A dinitro compound represented by the following formula (2),
Figure 112109390-A0202-13-0001-19
Figure 112109390-A0202-13-0001-19
一種聚醯胺酸,係具有下述通式(3)所示的重複單元, A polyamide having repeating units represented by the following general formula (3),
Figure 112109390-A0202-13-0001-20
Figure 112109390-A0202-13-0001-20
式中,A表示4價之芳香族基或4價之脂肪族基。 In the formula, A represents a tetravalent aromatic group or a tetravalent aliphatic group.
一種聚醯亞胺,係具有下述通式(4)所示的重複單元, A polyimide having repeating units represented by the following general formula (4),
Figure 112109390-A0202-13-0001-21
Figure 112109390-A0202-13-0001-21
式中,A表示4價之芳香族基或4價之脂肪族基。 In the formula, A represents a tetravalent aromatic group or a tetravalent aliphatic group.
一種聚醯胺酸溶液,其含有請求項4所述之聚醯胺酸及溶劑。 A polyamide solution containing the polyamide described in claim 4 and a solvent. 一種薄膜,其含有請求項4所述之聚醯胺酸。 A film containing the polyamide according to claim 4. 一種薄膜,其含有請求項5所述之聚醯亞胺。 A film containing the polyimide described in claim 5. 一種積層體,其具有含有請求項5所述之聚醯亞胺的層。 A laminated body having a layer containing the polyimide according to claim 5.
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