TW202347484A - Processing device capable of suppressing machining chips adhering to a cleaning liquid supply nozzle from falling onto a workpiece or a holding table - Google Patents

Processing device capable of suppressing machining chips adhering to a cleaning liquid supply nozzle from falling onto a workpiece or a holding table Download PDF

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Publication number
TW202347484A
TW202347484A TW112115145A TW112115145A TW202347484A TW 202347484 A TW202347484 A TW 202347484A TW 112115145 A TW112115145 A TW 112115145A TW 112115145 A TW112115145 A TW 112115145A TW 202347484 A TW202347484 A TW 202347484A
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Taiwan
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processing
axis direction
holding table
cleaning liquid
workpiece
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TW112115145A
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Chinese (zh)
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渡部和秀
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日商迪思科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/0042Devices for removing chips
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Dicing (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

This invention provides a processing device capable of suppressing machining chips adhering to a cleaning liquid supply nozzle from falling onto a workpiece or a holding table. The processing device (1) is equipped with: a holding table (10) that holds a workpiece (200); a cutting unit (20) that has a cutting blade (21) for cutting the workpiece (200) held by the holding table (10); and a processing feed unit (41) for processing and feeding the holding table (10) in the X-axis direction; and a cleaning liquid supply nozzle (70), which has: a main body (73), which is disposed above a moving path for processing and feeding the holding table (10) in the X-axis direction and extends in the Y-axis direction that intersects with the X-axis direction; and one or more ejection ports (74) formed in the main body (73) and supplying the cleaning liquid (71) downward from the ejection ports (74). The main body (73) of the cleaning liquid supply nozzle (70) is provided obliquely from one end in the Y-axis direction to the other end.

Description

加工裝置Processing equipment

本發明係關於一種具有清洗液供給噴嘴之加工裝置。The present invention relates to a processing device having a cleaning liquid supply nozzle.

加工裝置的情形,有時在保持台於X軸方向移動之移動路徑的上方具備清洗液供給噴嘴,所述清洗液供給噴嘴具有在與X軸方向交叉之Y軸方向延伸之棒狀的本體部(例如,參照專利文獻1)。In the case of a processing device, a cleaning liquid supply nozzle having a rod-shaped body portion extending in the Y-axis direction crossing the X-axis direction may be provided above the movement path of the holding table in the X-axis direction. (For example, refer to Patent Document 1).

此清洗液供給噴嘴被使用於保持台所保持之被加工物、保持台、加工室內等的清洗。 [習知技術文獻] [專利文獻] This cleaning liquid supply nozzle is used for cleaning the workpiece held by the holding table, the holding table, the processing chamber, etc. [Known technical documents] [Patent Document]

[專利文獻1]日本特開2015-149428號公報[Patent Document 1] Japanese Patent Application Publication No. 2015-149428

[發明所欲解決的課題] 然而,由於專利文獻1所示之加工裝置在加工期間加工屑會飛散,因此包含加工屑之液體亦會附著於清洗液供給噴嘴。尤其在加工中使用液體之加工裝置的情形,加工屑係以被包含於液體之狀態作為噴霧而飛散,而變得容易附著於清洗液供給噴嘴。 [Problem to be solved by the invention] However, in the processing apparatus shown in Patent Document 1, machining chips are scattered during processing, and therefore the liquid containing the machining chips also adheres to the cleaning liquid supply nozzle. Particularly in the case of a processing device using a liquid for processing, the processing chips are scattered as a spray while being contained in the liquid, and easily adhere to the cleaning liquid supply nozzle.

在加工屑附著於清洗液供給噴嘴之狀態下,若停止來自清洗液供給噴嘴的液體的供給,則加工屑會固著於清洗液供給噴嘴。在加工屑固著之狀態下,若重新開始清洗液的供給,則清洗液所包含之加工屑滴落至被加工物或保持台之疑慮升高。If the supply of liquid from the cleaning liquid supply nozzle is stopped while the machining chips adhere to the cleaning liquid supply nozzle, the machining chips will adhere to the cleaning liquid supply nozzle. If the supply of the cleaning fluid is restarted while the machining chips are fixed, there is a high risk that the machining chips contained in the cleaning fluid will drip onto the workpiece or the holding table.

並且,即使始終從清洗液供給噴嘴供給清洗液,若加工屑附著於噴出口之間,則亦有在非預期之時間點加工屑與清洗液一起落下或者被包含於清洗液而滴落之疑慮。Furthermore, even if the cleaning liquid is always supplied from the cleaning liquid supply nozzle, if the machining chips adhere to the space between the nozzles, there is a possibility that the machining chips will fall together with the cleaning liquid at an unexpected time or be included in the cleaning liquid and drip. .

若加工屑滴落至被加工物之上,則有影響被加工物的加工品質之疑慮,若滴落至保持台之上,則成為在保持台上附著有異物之狀態,因此有以後加工之被加工物的加工品質惡化之疑慮。If machining chips drop onto the workpiece, there is a concern that the processing quality of the workpiece will be affected. If they drop onto the holding table, foreign matter will be attached to the holding table, which will cause problems in subsequent processing. Concerns about the deterioration of the processing quality of the processed objects.

並且,即使加工屑未附著於清洗液供給噴嘴,若儲存於清洗液供給噴嘴的流路之清洗液、或以表面張力附著於噴出口周邊之清洗液在非預期之時間點落下至被加工物,而形成被稱作水痕之液體的痕跡,則亦有影響被加工物的加工品質之疑慮或外觀上不討喜之問題。Furthermore, even if machining debris does not adhere to the cleaning fluid supply nozzle, if the cleaning fluid stored in the flow path of the cleaning fluid supply nozzle or the cleaning fluid adhered to the periphery of the ejection port with surface tension falls to the workpiece at an unexpected time, , and the formation of traces of liquid called water marks may also affect the processing quality of the processed object or cause an unpleasant appearance.

並且,不受限於清洗液,在被加工物的加工期間,包含附著於清洗液供給噴嘴之加工屑之加工液在非預期之時間點落下至被加工物之上或保持台之上之情況,亦同樣有使被加工物的加工品質惡化之疑慮。Furthermore, it is not limited to the cleaning fluid. During the processing of the workpiece, the machining fluid including the machining chips attached to the cleaning fluid supply nozzle falls onto the workpiece or the holding table at an unexpected time. , there is also a concern that the processing quality of the workpiece will be deteriorated.

本發明之目的在於提供一種加工裝置,其可抑制附著於清洗液供給噴嘴之清洗液、清洗液所包含之加工屑、附著於清洗液供給噴嘴之加工液及加工液所包含之加工屑的至少任一者落下至被加工物或保持台上。An object of the present invention is to provide a machining apparatus that can suppress at least 10% of the cleaning liquid adhering to the cleaning liquid supply nozzle, the machining debris contained in the cleaning liquid, the machining fluid adhering to the cleaning liquid supply nozzle, and the machining debris contained in the machining liquid. Either one falls onto the workpiece or the holding table.

[解決課題的技術手段] 為了解決上述之課題並達成目的,本發明之加工裝置的特徵在於,具備:保持台,其保持被加工物;加工單元,其具有將被保持於該保持台之被加工物進行加工之加工工具;加工進給單元,其將該保持台在X軸方向進行加工進給;以及清洗液供給噴嘴,其具有:本體部,其設置於將該保持台在X軸方向進行加工進給之移動路徑的上方,且在與該X軸方向交叉之Y軸方向延伸;以及一個以上的噴出口,其形成於該本體部,並且,從該噴出口朝向下方供給清洗液,該清洗液供給噴嘴中,該本體部係從Y軸方向的一端向另一端傾斜而設置。 [Technical means to solve the problem] In order to solve the above-mentioned problems and achieve the object, a processing device of the present invention is characterized by including: a holding table that holds a workpiece; and a processing unit that has a processing tool for processing the workpiece held by the holding table. ; a processing and feeding unit that processes and feeds the holding table in the X-axis direction; and a cleaning liquid supply nozzle that has: a body portion that is disposed on a movement path that processes and feeds the holding table in the X-axis direction above and extending in the Y-axis direction that intersects with the X-axis direction; and one or more ejection ports, which are formed on the body part, and the cleaning liquid is supplied downward from the ejection port, and the cleaning liquid is supplied to the nozzle, The main body portion is inclined from one end to the other end in the Y-axis direction.

在前述加工裝置中,亦可進一步具有:加工液供給噴嘴,其將加工液供給至加工被加工物之加工區域。The aforementioned processing device may further include a processing fluid supply nozzle for supplying the processing fluid to a processing area where the workpiece is processed.

在前述加工裝置中,該加工工具為切割刀片,該切割刀片亦可固定於能旋轉的主軸。In the aforementioned processing device, the processing tool is a cutting blade, and the cutting blade can also be fixed on a rotatable spindle.

在前述加工裝置中,該本體部的下端亦可定位於比該保持台更外邊。In the aforementioned processing device, the lower end of the main body part may also be positioned outside the holding table.

在前述加工裝置中,亦可在該本體部的形成有該噴出口之面的至少一部分形成沿著該本體部的長邊方向延伸之槽。In the aforementioned processing device, a groove extending along the longitudinal direction of the main body may be formed in at least part of the surface of the main body on which the ejection port is formed.

[發明功效] 本發明發揮可抑制附著於清洗液供給噴嘴之加工屑落下至被加工物或保持台上之功效。 [Invention effect] The present invention has the effect of preventing machining chips attached to the cleaning fluid supply nozzle from falling onto the workpiece or the holding table.

針對用於實施本發明的方式(實施方式),一邊參照圖式一邊詳細地進行說明。本發明並不受限於以下的實施方式所記載之內容。並且,在以下所記載之構成要素中,包含本發明所屬技術領域中具有通常知識者可輕易思及者、實質上相同者。再者,以下所記載之構成能適當組合。並且,在不脫離本發明的主旨之範圍內,可進行構成的各種省略、取代或變更。Modes (embodiments) for implementing the present invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. In addition, the structural elements described below include those that can be easily imagined by a person with ordinary knowledge in the technical field to which the present invention belongs and are substantially the same. In addition, the structures described below can be combined appropriately. In addition, various omissions, substitutions, or changes in the structure may be made without departing from the gist of the present invention.

[實施方式1] 基於圖式說明本發明的實施方式1之加工裝置。圖1係示意性地表示實施方式1之加工裝置的構成例之立體圖。圖2係示意性地表示圖1所示之加工裝置的主要部分之剖面圖。 [Embodiment 1] The processing device according to Embodiment 1 of the present invention will be described based on the drawings. FIG. 1 is a perspective view schematically showing a structural example of a processing device according to Embodiment 1. FIG. 2 is a cross-sectional view schematically showing the main part of the processing device shown in FIG. 1 .

實施方式1之圖1所示之加工裝置1為將被加工物200進行切割加工之切割裝置。圖1所示之加工裝置1的加工對象亦即被加工物200為以矽、藍寶石、鎵等作為基板201之圓板狀的半導體晶圓或光元件晶圓等晶圓。被加工物200係在正面202設定有多條互相交叉之分割預定線(未圖示),且在正面202的藉由分割預定線所劃分之各區域形成有元件(未圖示)。The processing device 1 shown in FIG. 1 of Embodiment 1 is a cutting device that cuts an object 200 to be processed. The object 200 to be processed by the processing apparatus 1 shown in FIG. 1 is a disc-shaped semiconductor wafer or an optical element wafer or other wafer having a substrate 201 of silicon, sapphire, gallium, or the like. The workpiece 200 is provided with a plurality of dividing lines (not shown) that cross each other on the front surface 202 , and components (not shown) are formed in each area divided by the dividing lines on the front surface 202 .

元件例如為IC(Integrated Circuit,積體電路)或LSI(Large Scale Integration,大型積體電路)等積體電路、CCD(Charge Coupled Device,電荷耦合元件)或CMOS(Complementary Metal Oxide Semiconductor,互補金屬氧化半導體)等影像感測器,或者記憶體(半導體記憶裝置)等。The components are, for example, integrated circuits such as IC (Integrated Circuit) or LSI (Large Scale Integration), CCD (Charge Coupled Device) or CMOS (Complementary Metal Oxide Semiconductor). image sensors such as semiconductors), or memories (semiconductor memory devices), etc.

在實施方式1中,被加工物200係沿著分割預定線被切割加工,而被分割成一個個元件。In Embodiment 1, the workpiece 200 is cut along the planned dividing line and divided into individual components.

此外,在本發明中,被加工物200並不受限於晶圓,例如,亦可為在矩形的基板上配設多個元件晶片並以封膜樹脂被覆元件晶片之封裝基板、陶瓷板或玻璃板等。In addition, in the present invention, the object 200 to be processed is not limited to a wafer. For example, it may also be a packaging substrate, a ceramic plate, or a package substrate in which a plurality of component chips are arranged on a rectangular substrate and the component chips are covered with a sealing resin. Glass plates etc.

(加工裝置) 圖1所示之加工裝置1為以保持台10保持被加工物200並以切割刀片21(相當於加工工具)沿著分割預定線進行切割加工而將被加工物200分割成一個個元件之切割裝置。 (Processing device) The processing device 1 shown in FIG. 1 holds a workpiece 200 with a holding table 10 and cuts the workpiece 200 into individual components with a cutting blade 21 (equivalent to a processing tool) along a planned division line. device.

如圖1所示,加工裝置1具備:保持台10,其以保持面11吸引保持被加工物200;切割單元20,其為具有切割刀片21之加工單元,所述切割刀片21將被保持於保持台10之被加工物200進行切割加工;攝像單元30(圖2所示),其攝影被保持於保持台10之被加工物200;以及控制單元100。如圖1所示,加工裝置為具備兩個切割單元20亦即兩個主軸的切割機,且為所謂的對向式雙主軸型的切割裝置。As shown in FIG. 1 , the processing device 1 is provided with: a holding table 10 that attracts and holds a workpiece 200 with a holding surface 11; and a cutting unit 20 that is a processing unit having a cutting blade 21 that is held on the holding surface 11. The workpiece 200 held on the holding table 10 is cut and processed; the imaging unit 30 (shown in FIG. 2 ) takes a picture of the workpiece 200 held on the holding table 10 ; and the control unit 100 . As shown in FIG. 1 , the processing device is a cutting machine provided with two cutting units 20 , that is, two spindles, and is a so-called opposing dual-spindle type cutting device.

並且,加工裝置1具備使保持台10與切割單元20相對地移動之移動單元40。移動單元40至少具備:加工進給單元41,其將保持台10在與水平方向平行的X軸方向進行加工進給;分度進給單元42,其將切割單元20在與水平方向平行且與X軸方向正交之Y軸方向進行分度進給;切入進給單元43,其將切割單元20在Z軸方向進行切入進給,所述Z軸方向係平行於與X軸方向、Y軸方向兩者正交之鉛直方向;以及旋轉移動單元44,其將保持台10繞著與Z軸方向平行的軸心旋轉。亦即,移動單元40使保持台10與切割單元20在X軸方向、Y軸方向、Z軸方向及繞著軸心相對地移動。Furthermore, the processing device 1 is provided with the moving unit 40 which relatively moves the holding table 10 and the cutting unit 20. The moving unit 40 at least includes: a processing and feeding unit 41, which processes and feeds the holding table 10 in the X-axis direction parallel to the horizontal direction; and an indexing feeding unit 42, which processes the cutting unit 20 parallel to the horizontal direction and with Indexing feed is performed in the Y-axis direction orthogonal to the The vertical direction in which the directions are orthogonal to the two directions; and the rotational movement unit 44, which rotates the holding table 10 around an axis parallel to the Z-axis direction. That is, the moving unit 40 relatively moves the holding table 10 and the cutting unit 20 in the X-axis direction, the Y-axis direction, the Z-axis direction and around the axis.

加工進給單元41係藉由使保持台10及旋轉移動單元44在加工進給方向亦即X軸方向移動,而使切割單元20與保持台10相對地沿著X軸方向移動。分度進給單元42係藉由使切割單元20在分度進給方向亦即Y軸方向移動,而使切割單元20與保持台10相對地沿著Y軸方向移動。切入進給單元43係藉由使切割單元20在切入進給方向亦即Z軸方向移動,而使切割單元20與保持台10相對地沿著Z軸方向移動。旋轉移動單元44係被加工進給單元41支撐,並支撐保持台10,且被配設成與保持台10一起在X軸方向移動自如。The processing and feeding unit 41 moves the holding table 10 and the rotational movement unit 44 in the processing feeding direction, that is, the X-axis direction, thereby moving the cutting unit 20 and the holding table 10 relatively along the X-axis direction. The indexing feeding unit 42 moves the cutting unit 20 in the indexing feeding direction, that is, the Y-axis direction, so that the cutting unit 20 and the holding table 10 move relatively along the Y-axis direction. The cutting unit 43 moves the cutting unit 20 in the cutting feeding direction, that is, the Z-axis direction, so that the cutting unit 20 and the holding table 10 move relatively along the Z-axis direction. The rotational movement unit 44 is supported by the processing feed unit 41, supports the holding table 10, and is disposed to be movable in the X-axis direction together with the holding table 10.

加工進給單元41、分度進給單元42及切入進給單元43具備:習知的滾珠螺桿,其被設置成繞著軸心旋轉自如;習知的馬達,其使滾珠螺桿繞著軸心旋轉;以及習知的導軌,其將保持台10或切割單元20支撐成在X軸方向、Y軸方向或Z軸方向移動自如。並且,旋轉移動單元44具備將保持台10繞著軸心旋轉之馬達。The machining feed unit 41, the index feed unit 42, and the plunge feed unit 43 are equipped with: a conventional ball screw, which is configured to freely rotate around the axis; and a conventional motor, which rotates the ball screw around the axis. Rotation; and conventional guide rails that support the holding table 10 or the cutting unit 20 to move freely in the X-axis direction, the Y-axis direction, or the Z-axis direction. Furthermore, the rotational movement unit 44 is provided with a motor that rotates the holding base 10 around the axis.

保持台10係圓盤形狀,且保持被加工物200之保持面11係由多孔陶瓷等所形成。並且,保持台10係藉由加工進給單元41而被設置成橫越在切割單元20的下方的加工區域3與從切割單元20的下方遠離且被加工物200被搬入搬出之搬入搬出區域4而移動自如。保持台10係藉由旋轉移動單元44而被設置成繞著與Z軸方向平行的軸心旋轉自如。The holding base 10 has a disk shape, and the holding surface 11 for holding the workpiece 200 is formed of porous ceramics or the like. Furthermore, the holding table 10 is provided by the processing feeding unit 41 so as to span the processing area 3 below the cutting unit 20 and the loading and unloading area 4 away from the lower part of the cutting unit 20 and where the workpiece 200 is carried in and out. And move freely. The holding table 10 is rotatably provided around an axis parallel to the Z-axis direction by the rotational movement unit 44 .

保持台10中,保持面11係與未圖示之吸引源連接,並藉由吸引源進行吸引,藉此吸引、保持載置於保持面11之被加工物200。In the holding table 10, the holding surface 11 is connected to a suction source (not shown), and is suctioned by the suction source, thereby attracting and holding the workpiece 200 placed on the holding surface 11.

切割單元20為切割刀片21固定於主軸23且將被保持於保持台10之被加工物200進行切割加工之加工單元。切割單元20係分別相對於被保持於保持台10之被加工物200,藉由分度進給單元42而被設置成在Y軸方向移動自如,且藉由切入進給單元43而被設置成在Z軸方向移動自如。切割單元20係透過分度進給單元42及切入進給單元43等而設置於從裝置本體2立設之支撐框架5。切割單元20能藉由分度進給單元42及切入進給單元43而將切割刀片21定位於保持台10的保持面11的任意的位置。The cutting unit 20 is a processing unit in which the cutting blade 21 is fixed to the spindle 23 and cuts the workpiece 200 held on the holding table 10 . The cutting unit 20 is provided to be movable in the Y-axis direction by the indexing feed unit 42 and is provided so as to be movable in the Y-axis direction by the cutting feed unit 43 with respect to the workpiece 200 held on the holding table 10 . Move freely in the Z-axis direction. The cutting unit 20 is installed on the support frame 5 erected from the device body 2 through the indexing feeding unit 42 and the cutting feeding unit 43 . The cutting unit 20 can position the cutting blade 21 at any position on the holding surface 11 of the holding table 10 by using the indexing feed unit 42 and the cutting feed unit 43 .

切割單元20具備下述等構件:切割刀片21;主軸外殼22,其藉由分度進給單元42及切入進給單元43而被設置成在Y軸方向及Z軸方向移動自如;主軸23,其能繞著軸心旋轉地設置於主軸外殼22,且在前端固定有切割刀片21;以及未圖示之主軸馬達,其將主軸23繞著軸心旋轉。The cutting unit 20 includes the following components: a cutting blade 21; a spindle housing 22, which is provided to be movable in the Y-axis direction and the Z-axis direction by an indexing feed unit 42 and a cutting feed unit 43; a spindle 23, It is disposed on the spindle housing 22 so as to be rotatable around the axis, and has a cutting blade 21 fixed at the front end; and a spindle motor (not shown), which rotates the spindle 23 around the axis.

切割刀片21為具有大致環形狀之極薄的切割磨石。切割刀片21固定於主軸23的前端。在實施方式1中,切割刀片21為所謂的輪轂型刀片,其具備:圓環狀的圓形基台;以及圓環狀的切刃,其配設於圓形基台的外周緣且切割被加工物200。切刃係由鑽石、CBN(Cubic Boron Nitride,立方氮化硼)等磨粒與金屬、樹脂等黏合材(結合材)所構成,且形成為預定厚度。此外,在本發明中,切割刀片21亦可為僅以切刃所構成之所謂的墊圈型刀片。The cutting blade 21 is an extremely thin cutting grindstone having a substantially ring shape. The cutting blade 21 is fixed on the front end of the main shaft 23 . In Embodiment 1, the cutting blade 21 is a so-called hub-type blade, which includes an annular circular base and an annular cutting edge that is arranged on the outer peripheral edge of the circular base and cuts the object. Processed product 200. The cutting edge is composed of abrasive grains such as diamond and CBN (Cubic Boron Nitride) and binding materials (bonding materials) such as metal and resin, and is formed to a predetermined thickness. In addition, in the present invention, the cutting blade 21 may be a so-called washer type blade composed only of a cutting edge.

此外,切割單元20的切割刀片21及主軸23的軸心被設定成與Y軸方向平行。In addition, the axes of the cutting blade 21 and the main shaft 23 of the cutting unit 20 are set parallel to the Y-axis direction.

攝像單元30係以與切割單元20一體地移動之方式固定於切割單元20。攝像單元30具備攝像元件,所述攝像元件攝影被保持於保持台10之切割前的被加工物200的應分割之區域。攝像元件例如為CCD(Charge-Coupled Device,電荷耦合元件)攝像元件或CMOS(Complementary MOS,互補金屬氧化半導體)攝像元件。攝像單元30攝影被保持於保持台10之被加工物200而得到用於執行對準等的圖像,並將得到之圖像輸出至控制單元100,所述對準係進行被加工物200與切割刀片21的對位。The camera unit 30 is fixed to the cutting unit 20 so as to move integrally with the cutting unit 20 . The imaging unit 30 is provided with an imaging element that photographs a region to be divided of the workpiece 200 held on the holding table 10 before cutting. The imaging element is, for example, a CCD (Charge-Coupled Device) imaging element or a CMOS (Complementary MOS, complementary metal oxide semiconductor) imaging element. The imaging unit 30 takes a picture of the workpiece 200 held on the holding table 10 to obtain an image for performing alignment, etc., and outputs the obtained image to the control unit 100 . The alignment is performed between the workpiece 200 and the like. Alignment of cutting blade 21.

並且,加工裝置1具備:未圖示之X軸方向位置檢測單元,其用於檢測保持台10的X軸方向的位置;未圖示之Y軸方向位置檢測單元,其用於檢測切割單元20的Y軸方向的位置;以及Z軸方向位置檢測單元,其用於檢測切割單元20的Z軸方向的位置。X軸方向位置檢測單元及Y軸方向位置檢測單元可藉由與X軸方向或Y軸方向平行的線性標度尺及讀取頭所構成。Z軸方向位置檢測單元係以馬達的脈衝而檢測切割單元20的Z軸方向的位置。X軸方向位置檢測單元、Y軸方向位置檢測單元及Z軸方向位置檢測單元將保持台10的X軸方向、切割單元20的切刃的下端的Y軸方向或Z軸方向的位置輸出至控制單元100。Furthermore, the processing device 1 is provided with an X-axis direction position detection unit (not shown) for detecting the X-axis direction position of the holding table 10 and a Y-axis direction position detection unit (not shown) for detecting the cutting unit 20 The position of the cutting unit 20 in the Y-axis direction; and a Z-axis position detection unit used to detect the position of the cutting unit 20 in the Z-axis direction. The X-axis direction position detection unit and the Y-axis direction position detection unit can be composed of a linear scale and a read head parallel to the X-axis direction or the Y-axis direction. The Z-axis direction position detection unit detects the Z-axis direction position of the cutting unit 20 using the pulses of the motor. The X-axis direction position detection unit, the Y-axis direction position detection unit, and the Z-axis direction position detection unit output the position in the X-axis direction of the holding table 10 and the Y-axis direction or the Z-axis direction of the lower end of the cutting blade of the cutting unit 20 to the control Unit 100.

此外,在實施方式1中,加工裝置1的保持台10及切割單元20的X軸方向的位置、Y軸方向及Z軸方向的位置係基於預定之未圖示之基準位置而定。在實施方式1中,X軸方向的位置、Y軸方向及Z軸方向的位置係以從基準位置算起的X軸方向、Y軸方向及Z軸方向的距離而定。在實施方式1中,由加工裝置1的X軸方向與Y軸方向所表示之XY坐標(藉由表示X軸方向的位置之從基準位置算起的X軸方向的距離與表示Y軸方向的位置之從基準位置算起的Y軸方向的距離所表示之坐標)有時表示被保持於保持台10的保持面11之被加工物200的任意的位置。Furthermore, in Embodiment 1, the positions of the holding table 10 and the cutting unit 20 of the processing device 1 in the X-axis direction, the Y-axis direction, and the Z-axis direction are determined based on a predetermined reference position (not shown). In Embodiment 1, the position in the X-axis direction, the Y-axis direction, and the Z-axis direction are determined by the distances in the X-axis direction, the Y-axis direction, and the Z-axis direction from the reference position. In Embodiment 1, the XY coordinates represented by the X-axis direction and the Y-axis direction of the processing device 1 (by the distance in the X-axis direction from the reference position indicating the position in the X-axis direction and the distance in the Y-axis direction The position (coordinates represented by the distance in the Y-axis direction from the reference position) may represent an arbitrary position of the workpiece 200 held on the holding surface 11 of the holding table 10 .

並且,加工裝置1具備:卡匣升降機50,其載置容納多片切割加工前後的被加工物200之卡匣(未圖示),且使卡匣在Z軸方向移動;以及搬送單元(未圖示),其使被加工物200進出卡匣,且在卡匣與保持台10之間搬送被加工物200。卡匣為在內部能容納多片被加工物200的容納容器。Furthermore, the processing device 1 is provided with: a cassette lift 50 that places a cassette (not shown) accommodating a plurality of workpieces 200 before and after cutting processing and moves the cassette in the Z-axis direction; and a transport unit (not shown). (shown in the figure), which allows the workpiece 200 to enter and exit the cassette, and transports the workpiece 200 between the cassette and the holding table 10 . The cassette is a container that can accommodate a plurality of workpieces 200 inside.

並且,如圖2所示,加工裝置1具有供給加工液61之加工液供給噴嘴60。加工液供給噴嘴60將純水等加工液61供給至將被加工物200進行切割加工之加工區域3。在實施方式1中,加工液供給噴嘴60具備噴淋噴嘴62與一對刀片噴嘴63。Furthermore, as shown in FIG. 2 , the machining apparatus 1 has a machining fluid supply nozzle 60 for supplying a machining fluid 61 . The machining fluid supply nozzle 60 supplies a machining fluid 61 such as pure water to the processing area 3 where the workpiece 200 is cut. In Embodiment 1, the machining fluid supply nozzle 60 includes a shower nozzle 62 and a pair of blade nozzles 63 .

噴淋噴嘴62具備噴出口,所述噴出口係與切割刀片21的切刃的刀鋒在X軸方向面對。噴淋噴嘴62從未圖示之加工液供給源供給加工液61。噴淋噴嘴62在切割加工期間從噴出口將加工液61供給至切割刀片21的切刃的刀鋒。The shower nozzle 62 has a spray port that faces the edge of the cutting edge of the cutting blade 21 in the X-axis direction. The shower nozzle 62 supplies the machining fluid 61 from a machining fluid supply source (not shown). The shower nozzle 62 supplies the processing fluid 61 from the discharge port to the cutting edge of the cutting edge of the cutting blade 21 during the cutting process.

刀片噴嘴63係與X軸方向平行地延伸,且互相在Y軸方向空開間隔而配置。刀片噴嘴63將切割刀片21的切刃的下端定位於彼此之間,且具備面對切割刀片21的切刃的下端之噴出口。刀片噴嘴63從未圖示之加工液供給源供給加工液61。刀片噴嘴63在切割加工期間從噴出口將加工液61供給至切割刀片21的切刃的下端。The blade nozzles 63 extend parallel to the X-axis direction and are spaced apart from each other in the Y-axis direction. The blade nozzle 63 positions the lower ends of the cutting edges of the cutting blade 21 between each other, and has an ejection port facing the lower end of the cutting edge of the cutting blade 21 . The blade nozzle 63 supplies the machining fluid 61 from a machining fluid supply source (not shown). The blade nozzle 63 supplies the processing fluid 61 from the discharge port to the lower end of the cutting edge of the cutting blade 21 during the cutting process.

加工液供給噴嘴60係藉由在切割加工期間從噴嘴62、63將加工液61供給至切割刀片21,而將加工液61供給至定位於加工區域3之保持台10所吸引保持之被加工物200。在切割加工期間所供給之加工液61係藉由切割刀片21的旋轉等而在加工區域3內作為噴霧而飛散。並且,在切割加工期間所供給之加工液61有時會包含藉由切割加工而產生之加工屑,並附著於被加工物200的正面202。The machining fluid supply nozzle 60 supplies the machining fluid 61 from the nozzles 62 and 63 to the cutting blade 21 during the cutting process, thereby supplying the machining fluid 61 to the workpiece attracted and held by the holding table 10 positioned in the machining area 3 200. The machining fluid 61 supplied during the cutting process is scattered as a spray in the machining area 3 by the rotation of the cutting blade 21 or the like. Furthermore, the machining fluid 61 supplied during the cutting process may contain machining debris generated by the cutting process and adhere to the front surface 202 of the workpiece 200 .

並且,如圖1所示,加工裝置1具備清洗液供給噴嘴70。清洗液供給噴嘴70將純水等清洗液71供給至已實施切割加工之被加工物200的正面202,而從被加工物200的正面202去除加工液61,所述加工液61包含附著於被加工物200的正面202等之加工屑。在實施方式1中,清洗液供給噴嘴70配置於加工區域3與搬入搬出區域4之間。Furthermore, as shown in FIG. 1 , the processing device 1 is provided with a cleaning liquid supply nozzle 70 . The cleaning liquid supply nozzle 70 supplies a cleaning liquid 71 such as pure water to the front surface 202 of the workpiece 200 on which the cutting process has been performed, and removes the machining liquid 61 from the front surface 202 of the workpiece 200 . The machining liquid 61 contains adhesion to the workpiece. Processing chips such as the front surface 202 of the workpiece 200. In Embodiment 1, the cleaning liquid supply nozzle 70 is arranged between the processing area 3 and the loading/unloading area 4 .

接著,說明清洗液供給噴嘴70。圖3係示意性地表示圖1所示之加工裝置的清洗液供給噴嘴等之前視圖。圖4係從下方觀看圖3所示之清洗液供給噴嘴之俯視圖。圖5係沿著圖4中的V-V線之剖面圖。圖6係沿著圖4中的VI-VI線之剖面圖。Next, the cleaning liquid supply nozzle 70 will be described. FIG. 3 is a front view schematically showing a cleaning liquid supply nozzle and the like of the processing apparatus shown in FIG. 1 . FIG. 4 is a top view of the cleaning liquid supply nozzle shown in FIG. 3 viewed from below. Figure 5 is a cross-sectional view along line V-V in Figure 4. Figure 6 is a cross-sectional view along line VI-VI in Figure 4.

如圖3所示,清洗液供給噴嘴70具有:一對支柱72,其等配置於藉由加工進給單元41而在X軸方向移動之保持台10的移動路徑的Y軸方向的兩外側;本體部73;一個以上的噴出口74,其形成於本體部73;以及槽75,其形成於本體部73。支柱72係分別從裝置本體2立設,且互相在Y軸方向空開間隔而配置。此外,在本說明書中,所謂保持台10的移動路徑,係指藉由加工進給單元41而進行加工進給之保持台10的保持面11的移動軌跡。As shown in FIG. 3 , the cleaning liquid supply nozzle 70 has: a pair of pillars 72 arranged on both outer sides in the Y-axis direction of the moving path of the holding table 10 that moves in the X-axis direction by the processing feed unit 41; The main body part 73; one or more ejection ports 74 formed in the main body part 73; and grooves 75 formed in the main body part 73. The pillars 72 are respectively erected from the device body 2 and are spaced apart from each other in the Y-axis direction. In addition, in this specification, the movement path of the holding table 10 refers to the movement locus of the holding surface 11 of the holding table 10 which is processed and fed by the processing feed unit 41 .

本體部73設有噴出口74,且從噴出口74朝向下方供給清洗液71。本體部73被形成為兩端731、732堵塞之筒狀(在實施方式1中為圓筒狀),長邊方向的兩端被支柱72支撐,且設置於藉由加工進給單元41而將保持台10在X軸方向進行加工進給之移動路徑的上方。本體部73中,長邊方向在Y軸方向延伸,且全長比被保持於保持台10之被加工物200的外徑及保持台10的外徑更長。本體部73在內側從未圖示之清洗液供給源往內側供給清洗液71。The main body 73 is provided with an ejection port 74, and the cleaning liquid 71 is supplied downward from the ejection port 74. The main body 73 is formed in a cylindrical shape (cylindrical shape in Embodiment 1) with both ends 731 and 732 closed, and both ends in the longitudinal direction are supported by pillars 72 . The holding table 10 is above the movement path for processing in the X-axis direction. The main body part 73 has a longitudinal direction extending in the Y-axis direction, and the overall length is longer than the outer diameter of the workpiece 200 held on the holding table 10 and the outer diameter of the holding table 10 . The main body 73 supplies cleaning fluid 71 to the inside from a cleaning fluid supply source (not shown).

如圖4所示,本體部73形成有至少一個以上的噴出口74。如圖5所示,噴出口74貫通本體部73的外壁的下表面,且在本體部73的下方開口。在實施方式1中,本體部73係在長邊方向空開間隔(在實施方式1中為等間隔)而形成多個噴出口74。噴出口74將往本體部73的內側供給之清洗液71朝向下方噴出。如此進行,清洗液供給噴嘴70從噴出口74朝向下方供給清洗液71。As shown in FIG. 4 , the main body 73 is formed with at least one ejection port 74 . As shown in FIG. 5 , the discharge port 74 penetrates the lower surface of the outer wall of the main body 73 and opens below the main body 73 . In Embodiment 1, the main body part 73 forms a plurality of ejection ports 74 at intervals (equal intervals in Embodiment 1) in the longitudinal direction. The discharge port 74 discharges the cleaning liquid 71 supplied to the inside of the main body 73 downward. In this manner, the cleaning liquid supply nozzle 70 supplies the cleaning liquid 71 downward from the discharge port 74 .

槽75係從本體部73的形成有噴出口74之下表面凹狀地形成,且沿著本體部73的長邊方向延伸。槽75將附著於本體部73之清洗液71或加工液61引導成在本體部73的延伸方向流動。如圖6所示,槽75係從本體部73的下表面凹狀地形成,且未貫通本體部73的外壁。在實施方式1中,槽75係橫越本體部73的一端731與最靠近一端731的噴出口74而形成,橫越本體部73的互相相鄰之噴出口74而形成,橫越本體部73的另一端732與最靠近另一端732的噴出口74而形成,且橫越本體部73的兩端731、732而形成。The groove 75 is formed in a concave shape from the lower surface of the main body 73 where the discharge port 74 is formed, and extends along the longitudinal direction of the main body 73 . The groove 75 guides the cleaning fluid 71 or the machining fluid 61 attached to the main body 73 to flow in the extending direction of the main body 73 . As shown in FIG. 6 , the groove 75 is formed in a concave shape from the lower surface of the main body 73 and does not penetrate the outer wall of the main body 73 . In Embodiment 1, the groove 75 is formed across one end 731 of the main body 73 and the ejection outlet 74 closest to the one end 731 , and is formed across the adjacent ejection outlets 74 of the main body 73 . The other end 732 is formed with the ejection port 74 closest to the other end 732 , and is formed across the two ends 731 and 732 of the main body 73 .

然而,在本發明中,槽75亦可不橫越本體部73的兩端731、732而形成,亦可到達傾斜而位於下方側之垂下之一邊的另一端732。並且,槽75亦可形成為從噴出口74的開口的邊緣連結相鄰之噴出口74的開口的邊緣,亦可從噴出口74的開口的邊緣空開間隙而形成。並且,槽75亦可僅形成於附著在本體部73之清洗液71、加工液61難以順流之區域。如此,清洗液供給噴嘴70在本體部73的形成有噴出口74之下表面的至少一部分形成有沿著本體部73的長邊方向延伸之槽75。However, in the present invention, the groove 75 may not be formed across the two ends 731 and 732 of the body part 73, but may also reach the other end 732 of the hanging side that is inclined and located on the lower side. Furthermore, the groove 75 may be formed so as to connect the edge of the opening of the adjacent ejection port 74 from the edge of the opening of the ejection port 74 , or may be formed with a gap from the edge of the opening of the ejection port 74 . Furthermore, the groove 75 may be formed only in a region where the cleaning fluid 71 and the machining fluid 61 adhering to the main body 73 are difficult to flow downstream. In this way, the cleaning liquid supply nozzle 70 has the groove 75 extending along the longitudinal direction of the main body 73 in at least a part of the lower surface of the main body 73 where the discharge port 74 is formed.

並且,如圖3所示,清洗液供給噴嘴70中,本體部73係從Y軸方向的一端731向另一端732相對於水平方向(Y軸方向)傾斜而設置。清洗液供給噴嘴70中,由於本體部73的兩端731、732被一對支柱72支撐,因此本體部73的下端亦即另一端732及一端731定位於比保持台10更靠移動路徑的Y軸方向的外側(外邊)。Furthermore, as shown in FIG. 3 , in the cleaning liquid supply nozzle 70 , the main body 73 is provided inclined with respect to the horizontal direction (Y-axis direction) from one end 731 in the Y-axis direction to the other end 732 . In the cleaning liquid supply nozzle 70 , since the two ends 731 and 732 of the main body 73 are supported by the pair of pillars 72 , the lower end of the main body 73 , that is, the other end 732 and the first end 731 are positioned closer to Y on the movement path than the holding table 10 The outside (outside) of the axis direction.

並且,在實施方式1中,清洗液供給噴嘴70的本體部73的至少設有噴出口74之下表面被氟樹脂被覆。並且,在本發明中,亦可在本體部73的至少設有噴出口74之下表面形成微少的凹凸。在本發明中,本體部73的至少下表面係藉由被氟樹脂被覆或形成微少的凹凸而提升撥水性。因此,清洗液供給噴嘴70中,清洗液71、加工液61等液體在從本體部73的一端731朝向另一端732之中途不會落下,且變得容易從一端順流至另一端。Furthermore, in Embodiment 1, at least the lower surface of the main body 73 of the cleaning liquid supply nozzle 70 where the discharge port 74 is provided is covered with a fluororesin. Furthermore, in the present invention, slight irregularities may be formed on the lower surface of the main body 73 where at least the ejection port 74 is provided. In the present invention, at least the lower surface of the main body portion 73 is coated with fluororesin or has slight unevenness to improve water repellency. Therefore, in the cleaning liquid supply nozzle 70 , liquids such as the cleaning liquid 71 and the machining liquid 61 do not fall on the way from the one end 731 to the other end 732 of the main body 73 , and can easily flow downstream from one end to the other end.

並且,如圖2所示,加工裝置1具備加工室80。加工室80設置於裝置本體2上,且圍繞保持台10與切割單元20。加工室80設置於裝置本體2上,且橫越搬入搬出區域4與加工區域3而圍繞保持台10。如圖2所示,加工室80具備:多個側板81,其等係從裝置本體2立設並互相連接;分隔板82,其將加工室80內分隔成搬入搬出區域4與加工區域3;以及頂板83,其係與側板81的上端連接。Furthermore, as shown in FIG. 2 , the processing device 1 includes a processing chamber 80 . The processing chamber 80 is disposed on the device body 2 and surrounds the holding table 10 and the cutting unit 20 . The processing chamber 80 is provided on the apparatus body 2 and surrounds the holding table 10 across the loading and unloading area 4 and the processing area 3 . As shown in FIG. 2 , the processing chamber 80 is provided with: a plurality of side plates 81 erected from the device body 2 and connected to each other; and a partition plate 82 that divides the processing chamber 80 into a loading and unloading area 4 and a processing area 3 ; And the top plate 83 is connected to the upper end of the side plate 81.

控制單元100亦分別控制加工裝置1的各構成要素並使加工裝置1實施對於被加工物200之加工動作。此外,控制單元100為電腦,所述電腦具有:運算處理裝置,其具有如CPU(central processing unit,中央處理單元)般的微處理器;記憶裝置,其具有如ROM(read only memory,唯讀記憶體)或RAM(random access memory,隨機存取記憶體)般的記憶體;以及輸入輸出介面裝置。控制單元100的運算處理裝置遵循記憶於記憶裝置之電腦程式而實施運算處理,並將用於控制加工裝置1的控制訊號透過輸入輸出介面裝置而輸出至加工裝置1的各構成要素。The control unit 100 also controls each component of the processing device 1 respectively and causes the processing device 1 to perform processing operations on the workpiece 200 . In addition, the control unit 100 is a computer, and the computer has: a processing device, which has a microprocessor like a CPU (central processing unit, central processing unit); a memory device, which has a ROM (read only memory, read-only memory). Memory) or RAM (random access memory, random access memory)-like memory; and input and output interface devices. The arithmetic processing device of the control unit 100 performs arithmetic processing in accordance with the computer program stored in the memory device, and outputs control signals for controlling the processing device 1 to each component of the processing device 1 through the input/output interface device.

控制單元100係與下述單元連接:顯示單元,其藉由顯示加工動作的狀態、圖像等之液晶顯示裝置等所構成;以及輸入單元,其在操作員登錄加工條件等之際使用。輸入單元係藉由設於顯示單元之觸控面板所構成。The control unit 100 is connected to a display unit composed of a liquid crystal display device that displays the status of the processing operation, images, etc., and an input unit used when the operator registers processing conditions and the like. The input unit is composed of a touch panel provided on the display unit.

此外,圖1省略攝像單元30及加工室80等,圖2省略清洗液供給噴嘴70。In addition, the imaging unit 30 and the processing chamber 80 are omitted in FIG. 1 , and the cleaning liquid supply nozzle 70 is omitted in FIG. 2 .

(加工動作) 接著,說明加工裝置1的加工動作。前述之構成的加工裝置1中,加工條件設定於控制單元100,且已容納被加工物200之卡匣設置於卡匣升降機50。若控制單元100接收來自操作員等的加工動作的開始指示,則加工裝置1開始加工動作。若開始加工動作,則加工裝置1的控制單元100控制切割單元20而將主軸23亦即切割刀片21旋轉,並從加工液供給源將加工液61供給至噴嘴62、63而從噴嘴62、63的噴出口噴出加工液61,且從清洗液供給源將清洗液71供給至清洗液供給噴嘴70的本體部73而從噴出口74噴出清洗液71。 (processing action) Next, the processing operation of the processing device 1 will be described. In the processing device 1 having the above-mentioned structure, the processing conditions are set in the control unit 100, and the cassette that has accommodated the workpiece 200 is installed in the cassette lift 50. When the control unit 100 receives an instruction to start a processing operation from an operator or the like, the processing device 1 starts a processing operation. When the machining operation is started, the control unit 100 of the machining device 1 controls the cutting unit 20 to rotate the main shaft 23, that is, the cutting blade 21, and supplies the machining fluid 61 from the machining fluid supply source to the nozzles 62 and 63. The machining fluid 61 is ejected from the ejection port, and the cleaning fluid 71 is supplied from the cleaning fluid supply source to the main body 73 of the cleaning liquid supply nozzle 70 and the cleaning fluid 71 is ejected from the ejection port 74 .

在加工動作中,加工裝置1的控制單元100控制搬送單元而從卡匣取出一片被加工物200,並使被加工物200載置於保持台10的保持面11。在加工動作中,加工裝置1將被加工物200吸引保持於保持面11。During the processing operation, the control unit 100 of the processing device 1 controls the transport unit to take out one piece of workpiece 200 from the cassette, and place the workpiece 200 on the holding surface 11 of the holding table 10 . During the processing operation, the processing device 1 attracts and holds the workpiece 200 on the holding surface 11 .

加工裝置1的控制單元100控制移動單元40而使保持台10朝向加工區域3移動且移動至攝像單元30的下方為止,並藉由攝像單元30攝影被吸引保持於保持台10之被加工物200,而執行對準。在加工動作中,加工裝置1的控制單元100基於加工條件而控制移動單元40等,且一邊使切割刀片21與被加工物200沿著分割預定線相對地移動,一邊使切割刀片21切入被加工物200的分割預定線而進行切割加工。The control unit 100 of the processing device 1 controls the moving unit 40 to move the holding table 10 toward the processing area 3 and below the imaging unit 30, and uses the imaging unit 30 to take a picture of the workpiece 200 attracted and held on the holding table 10. , while performing alignment. During the processing operation, the control unit 100 of the processing device 1 controls the moving unit 40 and the like based on the processing conditions, and causes the cutting blade 21 to cut into the workpiece while relatively moving the cutting blade 21 and the workpiece 200 along the planned dividing line. The object 200 is cut along the planned dividing lines.

加工裝置1係沿著加工條件而切割被加工物200的分割預定線,將被加工物200分割成一個個元件。清洗液供給噴嘴70在加工被加工物200之際,會有加工液61、加工屑、加工液61所包含之加工屑等附著於本體部73之疑慮。所附著之加工液61係藉由表面張力而維持附著於本體部73之狀態,且有時會藉由加工裝置1的振動而落下。The processing device 1 cuts the planned division line of the workpiece 200 along the processing conditions, and divides the workpiece 200 into individual components. When the cleaning liquid supply nozzle 70 processes the workpiece 200 , the machining liquid 61 , machining chips, machining chips contained in the machining liquid 61 , etc. may adhere to the main body 73 . The attached machining fluid 61 is maintained attached to the main body 73 by surface tension, and may fall due to vibration of the machining device 1 .

若將被加工物200的所有分割預定線進行切割,則加工裝置1的控制單元100控制移動單元40而使保持台10從加工區域3朝向搬入搬出區域4移動。此時,在保持台10通過清洗液供給噴嘴70的本體部73的下方之際,藉由清洗液71而清洗被保持於保持台10之被加工物200的正面202。此外,清洗液供給噴嘴70在清洗被加工物200的正面202等之際,包含加工屑之清洗液71有時會附著於本體部73。附著之清洗液71係藉由表面張力而維持附著於本體部73之狀態,且有時會藉由加工裝置1的振動而落下。When all the planned dividing lines of the workpiece 200 are cut, the control unit 100 of the processing device 1 controls the moving unit 40 to move the holding table 10 from the processing area 3 toward the loading/unloading area 4 . At this time, when the holding table 10 passes under the main body part 73 of the cleaning liquid supply nozzle 70 , the front surface 202 of the workpiece 200 held on the holding table 10 is cleaned by the cleaning liquid 71 . In addition, when the cleaning liquid supply nozzle 70 cleans the front surface 202 and the like of the workpiece 200 , the cleaning liquid 71 including machining debris may adhere to the main body 73 . The attached cleaning fluid 71 is maintained attached to the main body 73 by surface tension, and may fall due to vibration of the processing device 1 .

在加工動作中,加工裝置1在搬入搬出區域4中停止保持台10的移動,並停止保持台10的被加工物200的吸引保持。在加工動作中,加工裝置1的控制單元100控制搬送單元,使被加工物200從保持台10的保持面11上搬送至卡匣內。若加工裝置1將卡匣內的所有被加工物200進行切割加工,則結束加工動作。During the processing operation, the processing device 1 stops the movement of the holding table 10 in the loading and unloading area 4 and stops the suction and holding of the workpiece 200 on the holding table 10 . During the processing operation, the control unit 100 of the processing device 1 controls the transport unit to transport the workpiece 200 from the holding surface 11 of the holding table 10 into the cassette. If the processing device 1 cuts all the workpieces 200 in the cassette, the processing operation ends.

此外,加工裝置1中,附著於清洗液供給噴嘴70的本體部73之清洗液71朝向本體部73的下端亦即另一端732移動。加工裝置1中,附著於清洗液供給噴嘴70的本體部73之清洗液71如圖3所示地從本體部73的下端亦即另一端732往下方落下。因此,加工裝置1可抑制從清洗液供給噴嘴70的本體部73落下之清洗液71附著於保持台10或被保持於保持台10之被加工物200。Furthermore, in the processing device 1 , the cleaning liquid 71 adhering to the main body 73 of the cleaning liquid supply nozzle 70 moves toward the other end 732 , which is the lower end of the main body 73 . In the processing device 1 , the cleaning liquid 71 attached to the main body 73 of the cleaning liquid supply nozzle 70 falls downward from the other end 732 , which is the lower end of the main body 73 , as shown in FIG. 3 . Therefore, the processing apparatus 1 can prevent the cleaning liquid 71 falling from the main body part 73 of the cleaning liquid supply nozzle 70 from adhering to the holding table 10 or the workpiece 200 held on the holding table 10 .

圖7所示之以往所使用之加工裝置1的清洗液供給噴嘴70中,由於本體部73係沿著水平方向(Y軸方向)而配置,因此從本體部73落下之清洗液71有時會從本體部73朝向保持台10或被保持於保持台10之被加工物200落下。此外,圖7係示意性地表示比較例的加工裝置的清洗液供給噴嘴等之前視圖。圖7中,在與實施方式1相同的部分標記相同的符號並省略說明。In the cleaning liquid supply nozzle 70 of the conventional processing device 1 shown in FIG. 7 , since the main body 73 is arranged along the horizontal direction (Y-axis direction), the cleaning liquid 71 falling from the main body 73 may sometimes It falls from the main body 73 toward the holding table 10 or the workpiece 200 held by the holding table 10 . In addition, FIG. 7 is a front view schematically showing the cleaning liquid supply nozzle and the like of the processing apparatus of the comparative example. In FIG. 7 , the same parts as those in Embodiment 1 are denoted by the same reference numerals, and description thereof is omitted.

圖7所示之以往所使用之加工裝置1的清洗液供給噴嘴70在將切割加工前的被加工物200搬送至保持台10之際,有時清洗液71會從本體部73落下,而附著於被加工物200或保持台10的保持面11。並且,圖7所示之以往所使用之加工裝置1的清洗液供給噴嘴70在將切割加工前的被加工物200從保持台10搬出之後,有時清洗液71會從本體部73落下,而附著於保持台10的露出之保持面11。並且,圖7所示之以往所使用之加工裝置1的清洗液供給噴嘴70在未保持被加工物200之狀態下使保持台10移動之際,有時清洗液71會從本體部73落下,而附著於保持台10的保持面11。被包含於附著之清洗液71之加工屑若固著則難以去除。When the cleaning liquid supply nozzle 70 of the conventionally used processing device 1 shown in FIG. 7 transports the workpiece 200 before cutting to the holding table 10, the cleaning liquid 71 may fall from the main body 73 and adhere. on the workpiece 200 or the holding surface 11 of the holding table 10 . Furthermore, in the cleaning liquid supply nozzle 70 of the conventionally used processing device 1 shown in FIG. 7 , after the workpiece 200 before cutting is carried out from the holding table 10 , the cleaning liquid 71 may fall from the main body 73 , and the cleaning liquid 71 may fall from the main body 73 . Attached to the exposed holding surface 11 of the holding platform 10 . Furthermore, when the cleaning liquid supply nozzle 70 of the conventionally used processing device 1 shown in FIG. 7 moves the holding table 10 without holding the workpiece 200, the cleaning liquid 71 may fall from the main body 73. And attached to the holding surface 11 of the holding base 10 . The machining chips contained in the adhering cleaning fluid 71 are difficult to remove if they adhere.

於是,以上說明之實施方式1之加工裝置1將清洗液供給噴嘴70的本體部73相對於水平方向傾斜而設置,藉此附著於本體部73之清洗液71係透過傾斜而朝向下端亦即另一端732流動。因此,實施方式1之加工裝置1中,包含加工屑之清洗液71係藉由表面張力而停留於本體部73,且在落下之際會從另一端732落下,因此可抑制滴落至被加工物200或保持台10上。Therefore, in the processing device 1 of Embodiment 1 described above, the main body 73 of the cleaning liquid supply nozzle 70 is inclined with respect to the horizontal direction, so that the cleaning liquid 71 attached to the main body 73 is tilted toward the lower end, that is, the other end. One end 732 flows. Therefore, in the processing device 1 of Embodiment 1, the cleaning fluid 71 containing processing chips stays on the main body 73 due to surface tension, and falls from the other end 732 when it falls, so it can be suppressed from dripping to the workpiece. 200 or keep the table on 10.

其結果,實施方式1之加工裝置1發揮下述功效:可抑制附著於清洗液供給噴嘴70之清洗液71、清洗液71所包含之加工屑、附著於清洗液供給噴嘴70之加工液61及加工液61所包含之加工屑的至少任一者落下至被加工物200或保持台10上。As a result, the processing device 1 of Embodiment 1 exhibits the effect of suppressing the cleaning liquid 71 adhering to the cleaning liquid supply nozzle 70, the machining debris contained in the cleaning liquid 71, the machining liquid 61 adhering to the cleaning liquid supply nozzle 70, and At least any of the machining chips contained in the machining fluid 61 falls onto the workpiece 200 or the holding table 10 .

並且,實施方式1之加工裝置1將清洗液供給噴嘴70的本體部73的Y軸方向的全長設成比保持台10的外徑及被保持於保持台10之被加工物200的外徑更長,並以配置於保持台10的移動路徑的Y軸方向的兩外側之一對支柱72支撐本體部73的兩端731、732。因此,實施方式1之加工裝置1將本體部73的兩端731、732定位於在Y軸方向遠離保持台10及被保持於保持台10之被加工物200之位置。其結果,實施方式1之加工裝置1中,從下端亦即另一端732落下之包含加工屑之清洗液71會滴落於遠離保持台10與保持於保持台10之被加工物200之位置。Furthermore, in the processing apparatus 1 of Embodiment 1, the overall length of the main body 73 of the cleaning liquid supply nozzle 70 in the Y-axis direction is set to be longer than the outer diameter of the holding table 10 and the outer diameter of the workpiece 200 held on the holding table 10 . It is long and supports both ends 731 and 732 of the main body 73 with a pair of pillars 72 arranged on both outer sides of the movement path of the holding table 10 in the Y-axis direction. Therefore, the processing device 1 of Embodiment 1 positions both ends 731 and 732 of the main body 73 at a position away from the holding table 10 and the workpiece 200 held by the holding table 10 in the Y-axis direction. As a result, in the processing device 1 of Embodiment 1, the cleaning liquid 71 containing processing chips dropped from the lower end, that is, the other end 732 , drops to a position away from the holding table 10 and the workpiece 200 held on the holding table 10 .

此外,本發明並不受限於上述實施方式。亦即,在不脫離本發明的主旨之範圍可進行各種變形並實施。In addition, the present invention is not limited to the above-described embodiment. That is, various modifications and implementations can be made without departing from the gist of the present invention.

1:加工裝置 3:加工區域 10:保持台 20:切割單元(加工單元) 21:切割刀片(加工工具) 23:主軸 41:加工進給單元 60:加工液供給噴嘴 61:加工液 70:清洗液供給噴嘴 71:清洗液 73:本體部 74:噴出口 75:槽 200:被加工物 731:一端 732:另一端(下端) 1: Processing device 3: Processing area 10:Keeping platform 20: Cutting unit (processing unit) 21: Cutting blade (processing tool) 23:Spindle 41: Processing feed unit 60:Machining fluid supply nozzle 61: Processing fluid 70: Cleaning fluid supply nozzle 71:Cleaning fluid 73: Ontology part 74:Spout 75:Slot 200: Processed object 731:One end 732:The other end (lower end)

圖1係示意性地表示實施方式1之加工裝置的構成例之立體圖。 圖2係示意性地表示圖1所示之加工裝置的主要部分之剖面圖。 圖3係示意性地表示圖1所示之加工裝置的清洗液供給噴嘴等之前視圖。 圖4係從下方觀看圖3所示之清洗液供給噴嘴之俯視圖。 圖5係沿著圖4中的V-V線之剖面圖。 圖6係沿著圖4中的VI-VI線之剖面圖。 圖7係示意性地表示比較例的加工裝置的清洗液供給噴嘴等之前視圖。 FIG. 1 is a perspective view schematically showing a structural example of a processing device according to Embodiment 1. FIG. 2 is a cross-sectional view schematically showing the main part of the processing device shown in FIG. 1 . FIG. 3 is a front view schematically showing a cleaning liquid supply nozzle and the like of the processing apparatus shown in FIG. 1 . FIG. 4 is a top view of the cleaning liquid supply nozzle shown in FIG. 3 viewed from below. Figure 5 is a cross-sectional view along line V-V in Figure 4. Figure 6 is a cross-sectional view along line VI-VI in Figure 4. FIG. 7 is a front view schematically showing a cleaning liquid supply nozzle and the like of the processing apparatus of the comparative example.

1:加工裝置 1: Processing device

2:裝置本體 2:Device body

10:保持台 10:Keeping platform

11:保持面 11: Keep the surface

70:清洗液供給噴嘴 70: Cleaning fluid supply nozzle

71:清洗液 71:Cleaning fluid

72:支柱 72:Pillar

73:本體部 73: Ontology part

74:噴出口 74:Spout

75:槽 75:Slot

200:被加工物 200: Processed object

201:基板 201:Substrate

202:正面 202:front

731:一端 731:One end

732:另一端 732:The other end

Claims (5)

一種加工裝置,其特徵在於,具備: 保持台,其保持被加工物; 加工單元,其具有將被保持於該保持台之被加工物進行加工之加工工具; 加工進給單元,其將該保持台在X軸方向進行加工進給;以及 清洗液供給噴嘴,其具有:本體部,其設置於將該保持台在X軸方向進行加工進給之移動路徑的上方,且在與該X軸方向交叉之Y軸方向延伸;以及一個以上的噴出口,其形成於該本體部,並且,從該噴出口朝向下方供給清洗液, 該清洗液供給噴嘴中,該本體部係從Y軸方向的一端向另一端傾斜而設置。 A processing device, characterized by having: Holding table, which holds the workpiece; A processing unit having a processing tool for processing the workpiece held on the holding table; a processing and feeding unit that processes and feeds the holding table in the X-axis direction; and A cleaning liquid supply nozzle having: a body portion disposed above a moving path for processing and feeding the holding table in the X-axis direction, and extending in the Y-axis direction intersecting the X-axis direction; and one or more a discharge port formed in the main body part, and supplying cleaning liquid downward from the discharge port, In the cleaning liquid supply nozzle, the main body portion is inclined from one end to the other end in the Y-axis direction. 如請求項1之加工裝置,其中,進一步具有:加工液供給噴嘴,其將加工液供給至加工被加工物之加工區域。The processing device according to claim 1, further comprising: a processing fluid supply nozzle that supplies the processing fluid to a processing area where the workpiece is processed. 如請求項1之加工裝置,其中,該加工工具為切割刀片, 該切割刀片固定於能旋轉的主軸。 The processing device of claim 1, wherein the processing tool is a cutting blade, The cutting blade is fixed to a rotatable spindle. 如請求項1之加工裝置,其中,該本體部的下端定位於比該保持台更外邊。The processing device of claim 1, wherein the lower end of the body part is positioned further outside than the holding platform. 如請求項1之加工裝置,其中,在該本體部的形成有該噴出口之面的至少一部分形成沿著該本體部的長邊方向延伸之槽。The processing device of claim 1, wherein a groove extending along the longitudinal direction of the body is formed on at least a portion of the surface of the body where the ejection port is formed.
TW112115145A 2022-04-28 2023-04-24 Processing device capable of suppressing machining chips adhering to a cleaning liquid supply nozzle from falling onto a workpiece or a holding table TW202347484A (en)

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