TW202344301A - Generation device and generation method - Google Patents
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- TW202344301A TW202344301A TW112116723A TW112116723A TW202344301A TW 202344301 A TW202344301 A TW 202344301A TW 112116723 A TW112116723 A TW 112116723A TW 112116723 A TW112116723 A TW 112116723A TW 202344301 A TW202344301 A TW 202344301A
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 238000006243 chemical reaction Methods 0.000 claims abstract description 532
- 239000002994 raw material Substances 0.000 claims abstract description 238
- 238000010438 heat treatment Methods 0.000 claims abstract description 69
- 239000003054 catalyst Substances 0.000 claims abstract description 25
- 238000001816 cooling Methods 0.000 claims description 55
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 48
- 238000000926 separation method Methods 0.000 claims description 33
- 239000007789 gas Substances 0.000 description 349
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- 230000000052 comparative effect Effects 0.000 description 18
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- 238000003860 storage Methods 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000006555 catalytic reaction Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
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- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
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- 239000013078 crystal Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 229910002076 stabilized zirconia Inorganic materials 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C1/00—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon
- C07C1/02—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon from oxides of a carbon
- C07C1/12—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon from oxides of a carbon from carbon dioxide with hydrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C9/00—Aliphatic saturated hydrocarbons
- C07C9/02—Aliphatic saturated hydrocarbons with one to four carbon atoms
- C07C9/04—Methane
Abstract
Description
本發明是有關於一種生成裝置以及生成方法。The present invention relates to a generating device and a generating method.
例如在專利文獻1中揭示了與藉由氣體狀態的反應物的發熱反應來生成製品氣體的生成裝置以及生成方法相關的技術。 [現有技術文獻] [專利文獻] For example, Patent Document 1 discloses a technology related to a generation device and a generation method that generate product gas through an exothermic reaction of a reactant in a gaseous state. [Prior art documents] [Patent Document]
[專利文獻1]日本專利第6984098號公報[Patent Document 1] Japanese Patent No. 6984098
[發明所欲解決之課題][Problem to be solved by the invention]
使熱介質通過反應器，利用加熱器等對熱介質進行加熱，藉此，將反應器內的溫度升溫至製品氣體的生成開始所需的溫度。當熱介質的溫度為製品氣體的生成開始所需的溫度以上時，向反應器中供給原料氣體，因此，直至熱介質的溫度達到製品氣體的生成開始所需的溫度以上為止，不會進行製品氣體的生成。因此，與熱介質的升溫所需的時間成比例地，製品氣體的生成所需的時間增加。The heat medium is passed through the reactor and heated by a heater or the like, thereby raising the temperature in the reactor to a temperature required to start generation of the product gas. When the temperature of the heat medium is equal to or higher than the temperature required to start the generation of the product gas, the raw material gas is supplied to the reactor. Therefore, the product is not processed until the temperature of the heat medium reaches the temperature higher than the temperature required to start the generation of the product gas. Generation of gas. Therefore, the time required to generate the product gas increases in proportion to the time required to raise the temperature of the heat medium.
本發明是有鑒於所述實際情況而完成，其目的在於提供一種可縮短製品氣體的生成所需的時間的技術。 [解決課題之手段] The present invention was made in view of the above-mentioned actual situation, and an object thereof is to provide a technology that can shorten the time required to generate product gas. [Means to solve the problem]
用於解決所述課題的本發明是一種生成裝置，包括：反應塔，藉由觸媒中的原料氣體的發熱反應來生成製品氣體；原料氣體供給部，向所述反應塔供給所述原料氣體；以及溫度調整部，藉由通過所述反應塔的熱介質的溫度調整，將所述反應塔內維持為規定範圍的運轉溫度，當進行處於冷熱停止狀態的所述反應塔的運轉開始操作時，所述溫度調整部藉由所述熱介質的加熱來開始所述反應塔的升溫，所述冷熱停止狀態是所述原料氣體供給部所進行的所述原料氣體向所述反應塔的供給已停止的狀態，所述原料氣體供給部在升溫中的所述反應塔內的溫度低於所述運轉溫度的規定的供給開始溫度時，開始所述原料氣體的供給。The present invention to solve the above problems is a generation device including: a reaction tower that generates a product gas by a heat-generating reaction of a raw material gas in a catalyst; and a raw material gas supply unit that supplies the raw material gas to the reaction tower. ; and a temperature adjustment unit that maintains the operating temperature in the reaction tower at a predetermined range by adjusting the temperature of the heat medium passing through the reaction tower when the operation of the reaction tower in the cooling and heating stop state is started. , the temperature adjustment part starts the temperature rise of the reaction tower by heating the heat medium, and the heating and cooling stop state is when the supply of the raw material gas to the reaction tower by the raw material gas supply part has been completed. In the stopped state, the raw material gas supply unit starts supply of the raw material gas when the temperature in the reaction tower being heated is lower than a predetermined supply start temperature of the operating temperature.
根據所述生成裝置，在反應塔內的溫度為低於運轉溫度的溫度時，開始原料氣體向反應塔的供給。在反應塔內的溫度為低於運轉溫度的溫度的階段，在反應塔內開始原料氣體的發熱反應，藉此，提前開始反應塔內的原料氣體的發熱反應。因此，根據所述生成裝置，可縮短製品氣體的生成所需的時間。According to the above-described generation device, when the temperature in the reaction tower becomes lower than the operating temperature, the supply of the raw material gas to the reaction tower is started. When the temperature in the reaction tower is lower than the operating temperature, the exothermic reaction of the raw material gas in the reaction tower is started, thereby starting the exothermic reaction of the raw material gas in the reaction tower in advance. Therefore, according to the above-mentioned generating device, the time required for generating the product gas can be shortened.
而且，當在所述反應塔的升溫中由所述原料氣體供給部開始所述原料氣體的供給時，所述溫度調整部亦可停止借助所述熱介質的加熱所進行的所述反應塔的升溫。在反應塔內，藉由原料氣體的發熱反應進行反應塔的升溫，因此即便藉由熱介質的加熱所進行的反應塔的升溫停止，反應塔內的溫度亦能達到運轉溫度，從而可將反應塔內維持為運轉溫度。Furthermore, when the supply of the raw material gas from the raw material gas supply part is started during the temperature rise of the reaction tower, the temperature adjustment part may stop the heating of the reaction tower by the heat medium. heat up. In the reaction tower, the temperature of the reaction tower is raised by the exothermic reaction of the raw material gas. Therefore, even if the temperature rise of the reaction tower by the heating of the heat medium is stopped, the temperature in the reaction tower can still reach the operating temperature, so that the reaction can be The tower is maintained at operating temperature.
所述溫度調整部亦可藉由對所述熱介質進行加熱、冷卻、加熱的停止以及冷卻的停止中的至少一者來進行所述熱介質的溫度調整。例如，藉由對熱介質進行加熱的加熱器來對熱介質進行加熱或加熱的停止。例如，藉由對熱介質進行冷卻的冷卻器來對熱介質進行冷卻或冷卻的停止。The temperature adjustment unit may adjust the temperature of the heat medium by performing at least one of heating, cooling, stopping of heating, and stopping of cooling of the heat medium. For example, the heat medium is heated or stopped by a heater that heats the heat medium. For example, the heat medium is cooled or stopped by a cooler that cools the heat medium.
所述原料氣體供給部亦可基於所述反應塔內的溫度來決定所述原料氣體的供給量。反應塔內的溫度與在反應塔內中由原料氣體所生成的製品氣體的濃度存在相關關係。基於此種相關關係來決定原料氣體向反應塔內的供給量，藉此，可對藉由反應塔而生成的製品氣體的濃度進行控制。The raw material gas supply unit may determine the supply amount of the raw material gas based on the temperature in the reaction tower. There is a correlation between the temperature in the reaction tower and the concentration of the product gas generated from the raw material gas in the reaction tower. By determining the supply amount of the raw material gas into the reaction tower based on this correlation, the concentration of the product gas generated by the reaction tower can be controlled.
所述生成裝置亦可包括分離部，所述分離部自生成所述製品氣體時在所述反應塔中生成的生成水中分離溶解於所述生成水中的溶解氣體。藉由自在反應塔中生成的生成水中分離溶解於生成水中的溶解氣體，從而可抑制溶解於生成水中的溶解氣體向大氣中的擴散。The generation device may include a separation unit that separates dissolved gas dissolved in the generated water generated in the reaction tower when the product gas is generated. By separating the dissolved gas dissolved in the generated water from the generated water generated in the reaction tower, the diffusion of the dissolved gas dissolved in the generated water into the atmosphere can be suppressed.
所述生成裝置亦可包括供自所述反應塔送出的所述製品氣體流動的製品氣體路徑，所述分離部亦可在所述溶解氣體為所述製品氣體的情況下，使自所述生成水分離的所述製品氣體相對於流經所述製品氣體路徑的所述製品氣體而匯流，在所述溶解氣體為未反應的所述原料氣體的情況下，使未反應的所述原料氣體返回所述原料氣體供給部。自在反應塔中生成的生成水中分離溶解於生成水中的製品氣體，並使自生成水分離的製品氣體相對於流經製品氣體路徑的製品氣體而匯流，藉此，可抑制溶解於生成水中的製品氣體向大氣中的擴散。自在反應塔中生成的生成水中分離溶解於生成水中的未反應的原料氣體，並使未反應的原料氣體返回原料氣體供給部，藉此，可抑制溶解於生成水中的未反應的原料氣體向大氣中的擴散。The generating device may include a product gas path through which the product gas sent from the reaction tower flows, and the separation unit may cause the product gas to flow from the generated gas when the dissolved gas is the product gas. The water-separated product gas merges with the product gas flowing through the product gas path, and when the dissolved gas is the unreacted raw material gas, the unreacted raw material gas is returned The raw material gas supply part. The product gas dissolved in the generated water generated in the reaction tower is separated from the generated water, and the product gas separated from the generated water is merged with the product gas flowing through the product gas path, thereby suppressing the product dissolved in the generated water. Diffusion of gases into the atmosphere. The unreacted raw material gas dissolved in the generated water generated in the reaction tower is separated from the generated water, and the unreacted raw material gas is returned to the raw material gas supply unit. This can prevent the unreacted raw material gas dissolved in the generated water from being released into the atmosphere. diffusion in.
所述生成裝置亦可包括：增壓用反應塔，藉由觸媒中的所述原料氣體的發熱反應來生成所述製品氣體；以及切換部，在所述反應塔與所述增壓用反應塔之間切換所述原料氣體供給部供給所述原料氣體的供給目標，所述溫度調整部亦可藉由通過所述增壓用反應塔以及所述反應塔的所述熱介質的溫度調整，將所述增壓用反應塔內以及所述反應塔內維持為所述運轉溫度，當進行處於冷熱停止狀態的所述增壓用反應塔的運轉開始操作時，藉由所述熱介質的加熱來開始所述增壓用反應塔以及所述反應塔的升溫，所述冷熱停止狀態是所述原料氣體供給部所進行的所述原料氣體向所述增壓用反應塔的供給已停止的狀態，所述原料氣體供給部在升溫中的所述增壓用反應塔內的溫度為所述供給開始溫度時，開始所述原料氣體向所述增壓用反應塔的供給，自所述增壓用反應塔將所述製品氣體及未反應的所述原料氣體供給至所述反應塔內，所述增壓用反應塔內的容量小於所述反應塔內的容量。The generating device may further include: a pressurizing reaction tower that generates the product gas by a heat-generating reaction of the raw material gas in a catalyst; and a switching unit that interacts with the pressurizing reaction tower in the reaction tower. The raw material gas supply part supplies the supply target of the raw material gas between towers, and the temperature adjustment part may adjust the temperature of the heat medium passing through the pressurizing reaction tower and the reaction tower, The inside of the pressurizing reaction tower and the inside of the reaction tower are maintained at the operating temperature, and when the operation of the pressurizing reaction tower in the hot and cold stop state is started, the heat medium is heated by To start the temperature rise of the pressure-increasing reaction tower and the reaction tower, the cooling and heating stop state is a state in which the supply of the source gas to the pressure-increasing reaction tower by the source gas supply unit has been stopped. , the raw material gas supply unit starts supplying the raw material gas to the supercharging reaction tower when the temperature in the supercharging reaction tower being heated reaches the supply start temperature, and starts supplying the raw material gas to the supercharging reaction tower. The product gas and the unreacted raw material gas are supplied into the reaction tower, and the capacity of the pressurizing reaction tower is smaller than the capacity of the reaction tower.
可在藉由增壓用反應塔對製品氣體及未反應的原料氣體進行了加熱的狀態下，向反應塔內供給製品氣體及未反應的原料氣體。由於增壓用反應塔內的容量小於反應塔內的容量，因此增壓用反應塔內的溫度達到運轉溫度為止所需的時間短。因此，可在開始熱介質的加熱後的早期階段，將高溫狀態的製品氣體及未反應的原料氣體供給至反應塔內。藉此，反應塔內的溫度達到運轉溫度為止所需的時間得以縮短。The product gas and unreacted raw material gas can be supplied into the reaction tower in a state where the product gas and unreacted raw material gas are heated in the reaction tower for pressurization. Since the capacity in the pressure-increasing reaction tower is smaller than the capacity in the reaction tower, the time required for the temperature in the pressure-increasing reaction tower to reach the operating temperature is short. Therefore, the product gas and the unreacted raw material gas in a high-temperature state can be supplied into the reaction tower at an early stage after the heating of the heat medium is started. This shortens the time required for the temperature in the reaction tower to reach the operating temperature.
而且，本發明亦可為一種生成裝置，包括：反應塔，藉由觸媒中的原料氣體的發熱反應來生成製品氣體；增壓用反應塔，藉由觸媒中的所述原料氣體的發熱反應來生成所述製品氣體；原料氣體供給部，向所述增壓用反應塔供給所述原料氣體；以及溫度調整部，藉由通過所述反應塔以及所述增壓用反應塔的熱介質的溫度調整，將所述反應塔內以及所述增壓用反應塔內維持為規定範圍的運轉溫度，當進行處於冷熱停止狀態的所述增壓用反應塔的運轉開始操作時，所述溫度調整部藉由所述熱介質的加熱來開始所述反應塔以及所述增壓用反應塔的升溫，所述冷熱停止狀態是所述原料氣體供給部所進行的所述原料氣體向所述增壓用反應塔的供給已停止的狀態，所述原料氣體供給部在升溫中的所述增壓用反應塔內的溫度為低於所述運轉溫度的規定的供給開始溫度時，開始所述原料氣體向所述增壓用反應塔的供給，自所述增壓用反應塔將所述製品氣體及未反應的所述原料氣體供給至所述反應塔內，所述增壓用反應塔內的容量小於所述反應塔內的容量。Moreover, the present invention may also be a generation device including: a reaction tower that generates product gas through a thermal reaction of the raw material gas in the catalyst; and a pressurizing reaction tower that generates heat from the raw material gas in the catalyst. The reaction generates the product gas; a raw material gas supply part supplies the raw material gas to the pressurizing reaction tower; and a temperature adjusting part uses the heat medium passing through the reaction tower and the pressurizing reaction tower. The temperature is adjusted to maintain the operating temperature in the reaction tower and the pressure-increasing reaction tower within a predetermined range. When the operation of the pressure-increasing reaction tower in the hot and cold stop state is started, the temperature The adjustment part starts the temperature increase of the reaction tower and the pressure-increasing reaction tower by heating the heat medium, and the cooling and heating stop state is when the source gas supply part performs the heating of the source gas to the pressure-increasing reaction tower. In a state where the supply of the pressure reaction tower has been stopped, the raw material gas supply unit starts the supply of the raw material when the temperature in the pressure increase reaction tower being heated reaches a predetermined supply start temperature lower than the operating temperature. The gas is supplied to the pressure-increasing reaction tower. The product gas and the unreacted raw material gas are supplied from the pressure-increasing reaction tower into the reaction tower. The gas in the pressure-increasing reaction tower is The capacity is less than the capacity in the reaction tower.
根據所述生成裝置，在增壓用反應塔內的溫度為低於運轉溫度的溫度時，開始增壓用原料氣體向反應塔的供給。在增壓用反應塔內的溫度為低於運轉溫度的溫度的階段，在增壓反應塔內開始原料氣體的發熱反應，藉此，提起開始增壓用反應塔內的原料氣體的發熱反應。在藉由增壓用反應塔對製品氣體及未反應的原料氣體進行了加熱的狀態下，向反應塔內供給製品氣體及未反應的原料氣體。由於增壓用反應塔內的容量小於反應塔內的容量，因此增壓用反應塔內的溫度達到運轉溫度為止所需的時間短。因此，可在開始熱介質的加熱後的早期階段將高溫狀態的製品氣體及未反應的原料氣體供給至反應塔內。藉此，反應塔內的溫度達到運轉溫度為止所需的時間得以縮短，從而可縮短製品氣體的生成所需的時間。According to the above-described generation device, when the temperature in the pressure-increasing reaction tower becomes lower than the operating temperature, the supply of the pressure-increasing raw material gas to the reaction tower is started. When the temperature in the pressure-increasing reaction tower is lower than the operating temperature, the exothermic reaction of the raw material gas in the pressure-increasing reaction tower is started, thereby starting the exothermic reaction of the material gas in the pressure-increasing reaction tower. The product gas and the unreacted raw material gas are supplied into the reaction tower in a state where the product gas and the unreacted raw material gas are heated in the reaction tower for pressurization. Since the capacity in the pressure-increasing reaction tower is smaller than the capacity in the reaction tower, the time required for the temperature in the pressure-increasing reaction tower to reach the operating temperature is short. Therefore, the product gas and the unreacted raw material gas in a high-temperature state can be supplied into the reaction tower at an early stage after the heating of the heat medium is started. This shortens the time required for the temperature in the reaction tower to reach the operating temperature, thereby shortening the time required to generate product gas.
而且，本發明亦可自方法的側面來理解。即，本發明亦可為一種生成裝置的生成方法，所述生成裝置包括：反應塔，藉由觸媒中的原料氣體的發熱反應來生成製品氣體；原料氣體供給部，向所述反應塔供給所述原料氣體；以及溫度調整部，藉由通過所述反應塔的熱介質的溫度調整，將所述反應塔內維持為規定範圍的運轉溫度，所述生成裝置的生成方法包括下述步驟：當進行處於冷熱停止狀態的所述反應塔的運轉開始操作時，藉由所述熱介質的加熱來開始所述反應塔的升溫，所述冷熱停止狀態是所述原料氣體供給部所進行的所述原料氣體向所述反應塔的供給已停止的狀態；以及在升溫中的所述反應塔內的溫度低於所述運轉溫度的規定的供給開始溫度時，開始所述原料氣體的供給。Furthermore, the present invention can also be understood from the method aspect. That is, the present invention may also be a method of generating a generating device including: a reaction tower that generates a product gas through a heat-generating reaction of a raw material gas in a catalyst; and a raw material gas supply unit that supplies the reaction tower with The raw material gas; and a temperature adjustment unit that maintains the operating temperature in the reaction tower at a predetermined range by adjusting the temperature of the heat medium passing through the reaction tower. The generation method of the generation device includes the following steps: When the operation start operation of the reaction tower is performed in the cooling and heating stop state that is performed by the raw material gas supply unit, the temperature rise of the reaction tower is started by heating of the heat medium. The supply of the raw material gas to the reaction tower has been stopped; and when the temperature in the reaction tower being heated is lower than a predetermined supply start temperature of the operating temperature, the supply of the raw material gas is started.
根據所述生成裝置的生成方法，在反應塔內的溫度為低於運轉溫度的溫度時，開始原料氣體向反應塔的供給。在反應塔內的溫度為低於運轉溫度的溫度的階段，在反應塔內開始原料氣體的發熱反應，藉此，提前開始反應塔內的原料氣體的發熱反應。因此，根據所述生成裝置的生成方法，可縮短製品氣體的生成所需的時間。According to the generation method of the above-mentioned generation device, when the temperature in the reaction tower becomes lower than the operating temperature, the supply of the raw material gas to the reaction tower is started. When the temperature in the reaction tower is lower than the operating temperature, the exothermic reaction of the raw material gas in the reaction tower is started, thereby starting the exothermic reaction of the raw material gas in the reaction tower in advance. Therefore, according to the generation method of the generation device, the time required to generate the product gas can be shortened.
而且，本發明亦可為一種生成裝置的生成方法，所述生成裝置包括：反應塔，藉由觸媒中的原料氣體的發熱反應來生成製品氣體；增壓用反應塔，藉由觸媒中的所述原料氣體的發熱反應來生成所述製品氣體；原料氣體供給部，向所述增壓用反應塔供給所述原料氣體；以及溫度調整部，藉由通過所述反應塔以及所述增壓用反應塔的熱介質的溫度調整，將所述反應塔內以及所述增壓用反應塔內維持為規定範圍的運轉溫度，所述生成裝置的生成方法包括下述步驟：當進行處於冷熱停止狀態的所述增壓用反應塔的運轉開始操作時，藉由所述熱介質的加熱來開始所述反應塔以及所述增壓用反應塔的升溫，所述冷熱停止狀態是所述原料氣體供給部所進行的所述原料氣體向所述增壓用反應塔的供給已停止的狀態；以及在升溫中的所述增壓用反應塔內的溫度為低於所述運轉溫度的規定的供給開始溫度時，開始所述原料氣體向所述增壓用反應塔的供給，自所述增壓用反應塔將所述製品氣體及未反應的所述原料氣體供給至所述反應塔內，所述增壓用反應塔內的容量小於所述反應塔內的容量。Moreover, the present invention may also be a method of generating a generating device including: a reaction tower that generates product gas through the exothermic reaction of raw material gas in a catalyst; and a pressurizing reaction tower that generates product gas by using a catalyst in the catalyst. The product gas is generated by the exothermic reaction of the raw material gas; the raw material gas supply part supplies the raw material gas to the pressurizing reaction tower; and the temperature adjusting part generates the product gas by passing through the reaction tower and the pressurizing reaction tower. The temperature of the heat medium in the pressurizing reaction tower is adjusted to maintain the operating temperature in the reaction tower and the pressurizing reaction tower at a specified range. The generating method of the generating device includes the following steps: when the process is in a cold or hot state When the operation of the pressurizing reaction tower in the stopped state is started, the temperature rise of the reaction tower and the pressurizing reaction tower is started by heating of the heat medium, and the cold and heat stop state is when the raw material The supply of the raw material gas to the pressure-increasing reaction tower by the gas supply unit has been stopped; and the temperature in the pressure-increasing reaction tower being heated is a predetermined level lower than the operating temperature. At the supply start temperature, the supply of the raw material gas to the pressurizing reaction tower is started, and the product gas and the unreacted raw material gas are supplied from the pressurizing reaction tower into the reaction tower, The capacity in the pressurizing reaction tower is smaller than the capacity in the reaction tower.
根據所述生成裝置的生成方法，在增壓用反應塔內的溫度為低於運轉溫度的溫度時，開始增壓用原料氣體向反應塔的供給。在增壓用反應塔內的溫度為低於運轉溫度的溫度的階段，在增壓反應塔內開始原料氣體的發熱反應，藉此，提起開始增壓用反應塔內的原料氣體的發熱反應。在藉由增壓用反應塔對製品氣體及未反應的原料氣體進行了加熱的狀態下，向反應塔內供給製品氣體及未反應的原料氣體。由於增壓用反應塔內的容量小於反應塔內的容量，因此增壓用反應塔內的溫度達到運轉溫度為止所需的時間短。因此，可在開始熱介質的加熱後的早期階段將高溫狀態的製品氣體及未反應的原料氣體供給至反應塔內。藉此，反應塔內的溫度達到運轉溫度為止所需的時間得以縮短，從而可縮短製品氣體的生成所需的時間。 [發明的效果] According to the generation method of the above-described generation device, when the temperature in the pressure-increasing reaction tower becomes lower than the operating temperature, the supply of the pressure-increasing raw material gas to the reaction tower is started. When the temperature in the pressure-increasing reaction tower is lower than the operating temperature, the exothermic reaction of the raw material gas in the pressure-increasing reaction tower is started, thereby starting the exothermic reaction of the material gas in the pressure-increasing reaction tower. The product gas and the unreacted raw material gas are supplied into the reaction tower in a state where the product gas and the unreacted raw material gas are heated in the reaction tower for pressurization. Since the capacity in the pressure-increasing reaction tower is smaller than the capacity in the reaction tower, the time required for the temperature in the pressure-increasing reaction tower to reach the operating temperature is short. Therefore, the product gas and the unreacted raw material gas in a high-temperature state can be supplied into the reaction tower at an early stage after the heating of the heat medium is started. This shortens the time required for the temperature in the reaction tower to reach the operating temperature, thereby shortening the time required to generate product gas. [Effects of the invention]
可提供一種能夠縮短製品氣體的生成所需的時間的技術。It is possible to provide a technology capable of shortening the time required to generate product gas.
以下，對本發明的實施方式進行說明。以下所示的實施方式為本發明的實施方式的一例，並不將本發明的技術範圍限定為以下的形態。Hereinafter, embodiments of the present invention will be described. The embodiment shown below is an example of the embodiment of the present invention, and the technical scope of the present invention is not limited to the following forms.
〈第一實施方式〉 圖1是本發明的第一實施方式的生成裝置的結構圖。圖1所示的生成裝置100例如藉由原料氣體（反應氣體）即氣體狀態的氫與二氧化碳的發熱反應，生成製品氣體即甲烷氣與水。而且，所述化學反應亦為可逆反應。若以化學反應式來表示所述發熱反應則如下所示。 4H 2+CO 2⇔CH 4+2H 2O （1） <First Embodiment> FIG. 1 is a structural diagram of a generation device according to the first embodiment of the present invention. The generation device 100 shown in FIG. 1 generates, for example, product gases, methane gas and water, through the exothermic reaction of gaseous hydrogen and carbon dioxide, which are raw material gases (reaction gases). Moreover, the chemical reaction is also a reversible reaction. The exothermic reaction expressed as a chemical reaction formula is as follows. 4H 2 +CO 2 ⇔CH 4 +2H 2 O (1)
生成裝置100包括第一級的反應塔1、第一級的氣體冷卻用熱交換器2、第二級的反應塔3、第二級的氣體冷卻用熱交換器4、熱介質加熱器5、熱介質用熱交換器6、氣液分離器7、氣液分離器8以及原料氣體供給部9。The generation device 100 includes a first-stage reaction tower 1, a first-stage gas cooling heat exchanger 2, a second-stage reaction tower 3, a second-stage gas cooling heat exchanger 4, a heat medium heater 5, The heat exchanger 6 for heat medium, the gas-liquid separator 7, the gas-liquid separator 8, and the raw material gas supply part 9.
反應塔1藉由觸媒中的原料氣體的發熱反應來生成製品氣體。原料氣體例如包含氫（H 2）以及二氧化碳（CO 2）。製品氣體例如為甲烷氣。反應塔1與原料氣體供給部9藉由配管而連接，原料氣體自原料氣體供給部9被供給至反應塔1內。而且，反應塔1藉由觸媒中的原料氣體的發熱反應而生成生成水。反應塔1與氣體冷卻用熱交換器2藉由配管而連接。在連接反應塔1與氣體冷卻用熱交換器2的配管中設有閥等。 The reaction tower 1 generates product gas through the exothermic reaction of the raw material gas in the catalyst. The raw material gas contains, for example, hydrogen (H 2 ) and carbon dioxide (CO 2 ). The product gas is, for example, methane gas. The reaction tower 1 and the raw material gas supply part 9 are connected by pipes, and the raw material gas is supplied from the raw material gas supply part 9 into the reaction tower 1 . Furthermore, the reaction tower 1 generates product water by the exothermic reaction of the raw material gas in the catalyst. The reaction tower 1 and the gas cooling heat exchanger 2 are connected by pipes. A valve or the like is provided in the piping connecting the reaction tower 1 and the gas cooling heat exchanger 2 .
氣體冷卻用熱交換器2使在反應塔1中生成的生成水（水蒸氣）冷凝。氣體冷卻用熱交換器2與氣液分離器7藉由配管而連接。在連接氣體冷卻用熱交換器2與氣液分離器7的配管中設有閥等。氣液分離器7自製品氣體及未反應的原料氣體中分離生成水（液體）。生成裝置100包括分離部10，生成水自氣液分離器7被送往分離部10。關於分離部10的詳情將後述。The gas cooling heat exchanger 2 condenses the generated water (water vapor) generated in the reaction tower 1 . The gas cooling heat exchanger 2 and the gas-liquid separator 7 are connected by pipes. A valve or the like is provided in the pipe connecting the gas cooling heat exchanger 2 and the gas-liquid separator 7 . The gas-liquid separator 7 separates the product gas and the unreacted raw material gas to generate water (liquid). The generation device 100 includes a separation unit 10 , and the generated water is sent from the gas-liquid separator 7 to the separation unit 10 . Details of the separation unit 10 will be described later.
反應塔3與氣液分離器7藉由配管而連接。在連接反應塔3與氣液分離器7的配管中設有閥等。反應塔1中生成的製品氣體及未反應的原料氣體經由氣體冷卻用熱交換器2以及氣液分離器7被送往反應塔3。反應塔3藉由觸媒中的原料氣體的發熱反應來生成製品氣體。在反應塔3中由未反應的原料氣體生成製品氣體，藉此，生成裝置100可生成高濃度的製品氣體。The reaction tower 3 and the gas-liquid separator 7 are connected by pipes. A valve or the like is provided in the pipe connecting the reaction tower 3 and the gas-liquid separator 7 . The product gas and unreacted raw material gas generated in the reaction tower 1 are sent to the reaction tower 3 via the gas cooling heat exchanger 2 and the gas-liquid separator 7 . The reaction tower 3 generates product gas through the exothermic reaction of the raw material gas in the catalyst. The product gas is generated from the unreacted raw material gas in the reaction tower 3, whereby the generation device 100 can generate a high-concentration product gas.
反應塔3與氣體冷卻用熱交換器4藉由配管而連接。在連接反應塔3與氣體冷卻用熱交換器4的配管中設有閥等。氣體冷卻用熱交換器4使在反應塔3中生成的生成水（水蒸氣）冷凝。氣體冷卻用熱交換器4與氣液分離器8藉由配管而連接。在連接氣體冷卻用熱交換器4與氣液分離器8的配管中設有閥等。氣液分離器8自製品氣體及未反應的原料氣體中分離生成水（液體）。The reaction tower 3 and the gas cooling heat exchanger 4 are connected by pipes. A valve or the like is provided in the piping connecting the reaction tower 3 and the gas cooling heat exchanger 4 . The gas cooling heat exchanger 4 condenses the generated water (water vapor) generated in the reaction tower 3 . The gas cooling heat exchanger 4 and the gas-liquid separator 8 are connected by pipes. A valve or the like is provided in a pipe connecting the gas cooling heat exchanger 4 and the gas-liquid separator 8 . The gas-liquid separator 8 separates the product gas and unreacted raw material gas to generate water (liquid).
生成裝置100包括貯存罐11。生成水自氣液分離器8被送往分離部10，製品氣體自氣液分離器8被送往貯存罐11。貯存罐11貯存製品氣體。在氣液分離器7以及氣液分離器8中，設有用於排出生成水的排水閥。排水閥既可為排泄阱（drain trap）之類的使用浮體的浮力來使閥開閉者，或者亦可為電性探測水位而開閉電磁閥者。The generation device 100 includes a storage tank 11 . The generated water is sent from the gas-liquid separator 8 to the separation unit 10 , and the product gas is sent from the gas-liquid separator 8 to the storage tank 11 . The storage tank 11 stores product gas. The gas-liquid separator 7 and the gas-liquid separator 8 are provided with drain valves for discharging generated water. The drain valve may be a drain trap that uses the buoyancy of a floating body to open and close the valve, or it may be a solenoid valve that electrically detects the water level and opens and closes the solenoid valve.
在反應塔1及反應塔3中，預先填充有觸媒。觸媒只要是促進反應式（1）的觸媒，則為任何物質皆可，例如可列舉如下所述的觸媒，其包括由穩定化元素固溶且具有正方晶系及/或立方晶系的結晶結構的穩定化氧化鋯載體與由穩定化氧化鋯載體所承載的Ni，且穩定化元素包含自由Mn、Fe以及Co構成之群中選擇的至少一種過渡元素。Reaction tower 1 and reaction tower 3 are filled with catalyst in advance. The catalyst may be any substance as long as it promotes reaction formula (1). Examples include the following catalysts, which include solid solutions of stabilizing elements and have tetragonal and/or cubic crystal systems. A stabilized zirconia carrier with a crystal structure and Ni carried by the stabilized zirconia carrier, and the stabilizing element includes at least one transition element selected from the group consisting of free Mn, Fe and Co.
而且，反應塔1及反應塔3呈夾套結構，與產生發熱反應的反應塔內的發熱部分進行熱交換的熱介質可流出/流入夾套部分（殼體（shell））。對於熱介質，例如使用熱載體油。熱介質加熱器5與反應塔1的夾套部分藉由供熱介質流動的配管而連接。而且，反應塔1的夾套部分與反應塔3的夾套部分藉由供熱介質流動的配管而連接。在供熱介質流動的配管中設有閥等。熱介質加熱器5是對熱介質進行加熱的加熱器。經熱介質加熱器5加熱的熱介質在通過了反應塔1後，通過反應塔3。Furthermore, the reaction tower 1 and the reaction tower 3 have a jacket structure, and the heat medium that exchanges heat with the heat-generating part in the reaction tower where the exothermic reaction occurs can flow out/flow into the jacket part (shell). For heat medium, use heat carrier oil, for example. The heat medium heater 5 and the jacket portion of the reaction tower 1 are connected by a pipe for flowing the heat medium. Furthermore, the jacketed portion of the reaction tower 1 and the jacketed portion of the reaction tower 3 are connected by a pipe through which the heating medium flows. A valve or the like is provided in the piping through which the heating medium flows. The heat medium heater 5 is a heater that heats the heat medium. The heat medium heated by the heat medium heater 5 passes through the reaction tower 1 and then passes through the reaction tower 3 .
反應塔3的夾套部分與熱介質用熱交換器6藉由供熱介質流動的配管而連接。熱介質用熱交換器6對通過了反應塔1及反應塔3的熱介質進行冷卻。熱介質加熱器5與熱介質用熱交換器6藉由供熱介質流動的配管而連接。在連接熱介質加熱器5與熱介質用熱交換器6的配管中，設有熱介質循環泵12，所述熱介質循環泵12將經熱介質用熱交換器6冷卻的熱介質送往熱介質加熱器5。而且，在供熱介質流動的配管中設有調整閥13及調整閥14。藉由開閉調整閥13及調整閥14，可將通過了反應塔1及反應塔3的熱介質經由熱介質用熱交換器6而送往熱介質加熱器5，或者不經由熱介質用熱交換器6而送往熱介質加熱器5。The jacket part of the reaction tower 3 and the heat exchanger 6 for heat medium are connected by a pipe through which the heat medium flows. The heat medium heat exchanger 6 cools the heat medium that has passed through the reaction tower 1 and the reaction tower 3 . The heat medium heater 5 and the heat exchanger 6 for heat medium are connected by a pipe through which the heat medium flows. In the pipe connecting the heat medium heater 5 and the heat exchanger 6 for heat medium, a heat medium circulation pump 12 is provided. The heat medium circulation pump 12 sends the heat medium cooled by the heat exchanger 6 for heat medium to the thermal medium. Media heater 5. Furthermore, the regulating valve 13 and the regulating valve 14 are provided in the pipe through which the heating medium flows. By opening and closing the regulating valve 13 and the regulating valve 14, the heat medium that has passed through the reaction tower 1 and the reaction tower 3 can be sent to the heat medium heater 5 through the heat exchanger 6 for heat medium, or can be sent without passing through the heat exchanger for heat medium. 6 and sent to the heat medium heater 5.
生成裝置100包括冷卻器15。冷卻器15對用於在氣體冷卻用熱交換器2及氣體冷卻用熱交換器4中使生成水冷凝的冷卻水（冷媒）進行冷卻。氣體冷卻用熱交換器2、氣體冷卻用熱交換器4以及冷卻器15藉由供冷卻水流動的配管彼此連接。經冷卻器15冷卻的冷卻水經由氣體冷卻用熱交換器2及氣體冷卻用熱交換器4而返回冷卻器15。The generating device 100 includes a cooler 15 . The cooler 15 cools the cooling water (refrigerant) used to condense the water produced in the gas cooling heat exchanger 2 and the gas cooling heat exchanger 4 . The gas cooling heat exchanger 2, the gas cooling heat exchanger 4, and the cooler 15 are connected to each other by pipes through which cooling water flows. The cooling water cooled by the cooler 15 returns to the cooler 15 via the gas cooling heat exchanger 2 and the gas cooling heat exchanger 4 .
生成裝置100包括冷卻塔16以及冷卻水循環泵17。冷卻塔16對在熱介質用熱交換器6中與熱介質進行熱交換的冷卻水進行冷卻。例如，亦可使用自系統外供給至冷卻塔16的自來水作為冷卻水。冷卻水循環泵17使供給至冷卻塔16內的冷卻水在熱介質用熱交換器6與冷卻塔16之間循環。The generation device 100 includes a cooling tower 16 and a cooling water circulation pump 17 . The cooling tower 16 cools the cooling water that exchanges heat with the heat medium in the heat exchanger 6 for heat medium. For example, tap water supplied to the cooling tower 16 from outside the system may also be used as the cooling water. The cooling water circulation pump 17 circulates the cooling water supplied into the cooling tower 16 between the heat exchanger 6 for heat medium and the cooling tower 16 .
生成裝置100包括控制部21、對反應塔1內的溫度進行測定的測定感測器22、以及對反應塔3內的溫度進行測定的測定感測器23。由測定感測器22所測定出的測定資料以及由測定感測器23所測定出的測定資料被送往控制部21。藉此，控制部21獲取反應塔1內的溫度以及反應塔3內的溫度。控制部21將由測定感測器22所測定出的測定資料以及由測定感測器23所測定出的測定資料送往原料氣體供給部9。藉此，原料氣體供給部9獲取反應塔1內的溫度以及反應塔3內的溫度。The production device 100 includes a control unit 21 , a measurement sensor 22 that measures the temperature in the reaction tower 1 , and a measurement sensor 23 that measures the temperature in the reaction tower 3 . The measurement data measured by the measurement sensor 22 and the measurement data measured by the measurement sensor 23 are sent to the control unit 21 . Thereby, the control unit 21 acquires the temperature in the reaction tower 1 and the temperature in the reaction tower 3 . The control unit 21 sends the measurement data measured by the measurement sensor 22 and the measurement data measured by the measurement sensor 23 to the raw material gas supply unit 9 . Thereby, the raw material gas supply unit 9 acquires the temperature in the reaction tower 1 and the temperature in the reaction tower 3 .
控制部21是對生成裝置100的動作整體進行控制的控制器。控制部21既可包含專用的機器，亦可包含通用的電腦。控制部21包括處理器（中央處理單元（Central Processing Unit，CPU））、記憶體、儲存器、通訊介面（Interface，I/F）等的硬體資源。記憶體亦可為隨機存取記憶體（Random Access Memory，RAM）。儲存器亦可為非揮發性的記憶裝置（例如唯讀記憶體（Read Only Memory，ROM）、快閃記憶體等）。控制部21的功能是藉由將保存於儲存器中的程式展開至記憶體中並由處理器來執行而實現。再者，控制部21的結構並不限於此。例如，亦可使功能的全部或一部分包含特殊應用積體電路（Application Specific lntegrated Circuit，ASIC）或現場可程式閘陣列（Field Programmable Gate Array，FPGA）等電路，或者還可由雲伺服器或其他裝置來執行功能的全部或一部分。The control unit 21 is a controller that controls the entire operation of the generation device 100 . The control unit 21 may include a dedicated machine or a general-purpose computer. The control unit 21 includes hardware resources such as a processor (Central Processing Unit (CPU)), memory, storage, and communication interface (Interface, I/F). The memory can also be random access memory (Random Access Memory, RAM). The storage can also be a non-volatile memory device (such as Read Only Memory (ROM), flash memory, etc.). The function of the control unit 21 is realized by expanding the program stored in the storage into the memory and executing it by the processor. In addition, the structure of the control part 21 is not limited to this. For example, all or part of the function can also include circuits such as Application Specific Integrated Circuit (ASIC) or Field Programmable Gate Array (FPGA), or it can also be configured by a cloud server or other device. to perform all or part of a function.
控制部21對熱介質加熱器5進行控制。藉由控制熱介質加熱器5的動作，熱介質加熱器5進行對熱介質的加熱，或者停止對熱介質的加熱。如此，使用熱介質加熱器5來進行對熱介質的加熱或加熱的停止。而且，控制部21對調整閥13及調整閥14進行控制。藉由對調整閥13及調整閥14的開閉進行控制，將熱介質經由熱介質用熱交換器6而送往熱介質加熱器5，從而進行對熱介質的冷卻。藉由對調整閥13及調整閥14的開閉進行控制，將熱介質不經由熱介質用熱交換器6而送往熱介質加熱器5，從而進行對熱介質的冷卻的停止。如此，使用作為冷卻器的熱介質用熱交換器6來進行對熱介質的冷卻或冷卻的停止。藉由進行對熱介質的加熱、冷卻、加熱的停止以及冷卻的停止中的至少一者，從而進行熱介質的溫度調整。控制部21為溫度調整部的一例。The control unit 21 controls the heat medium heater 5 . By controlling the operation of the heat medium heater 5, the heat medium heater 5 heats the heat medium or stops heating the heat medium. In this way, the heat medium heater 5 is used to heat the heat medium or to stop the heating. Furthermore, the control unit 21 controls the regulating valve 13 and the regulating valve 14 . By controlling the opening and closing of the regulating valve 13 and the regulating valve 14, the heat medium is sent to the heat medium heater 5 through the heat exchanger 6 for heat medium, thereby cooling the heat medium. By controlling the opening and closing of the regulating valve 13 and the regulating valve 14, the heat medium is sent to the heat medium heater 5 without passing through the heat exchanger 6 for heat medium, thereby stopping the cooling of the heat medium. In this manner, the heat medium heat exchanger 6 serving as a cooler is used to cool or stop the cooling of the heat medium. The temperature of the heat medium is adjusted by performing at least one of heating, cooling, stopping of heating, and stopping of cooling of the heat medium. The control unit 21 is an example of a temperature adjustment unit.
控制部21藉由熱介質的溫度調整來將反應塔1內維持為規定範圍的運轉溫度。控制部21亦可調整熱介質的溫度，以將反應塔1內的溫度維持為例如200℃以上且220℃以下。運轉溫度並不限於200℃以上且220℃以下。運轉溫度亦可為原料氣體的發熱反應良好地推進的溫度即額定溫度。額定溫度亦可為生成高濃度的製品氣體的溫度。而且，運轉溫度以及額定溫度是較反應塔1內的觸媒反應開始的溫度為高的溫度，例如是效率良好地推進反應塔1內的觸媒反應的溫度。The control unit 21 maintains the operating temperature in the reaction tower 1 within a predetermined range by adjusting the temperature of the heat medium. The control unit 21 may also adjust the temperature of the heat medium so as to maintain the temperature in the reaction tower 1 at, for example, 200°C or more and 220°C or less. The operating temperature is not limited to 200°C or more and 220°C or less. The operating temperature may be a temperature at which the exothermic reaction of the raw material gas proceeds favorably, that is, a rated temperature. The rated temperature may also be a temperature at which a high concentration of product gas is generated. Furthermore, the operating temperature and the rated temperature are temperatures higher than the temperature at which the catalytic reaction in the reaction tower 1 starts, and are, for example, temperatures at which the catalytic reaction in the reaction tower 1 can be efficiently advanced.
控制部21藉由熱介質的溫度調整來將反應塔3內維持為規定範圍的運轉溫度。控制部21亦可調整熱介質的溫度，以將反應塔3內的溫度維持為例如200℃以上且220℃以下。運轉溫度並不限於200℃以上且220℃以下。運轉溫度亦可為原料氣體的發熱反應良好地推進的溫度即額定溫度。額定溫度亦可為生成高濃度的製品氣體的溫度。而且，運轉溫度以及額定溫度是較反應塔3內的觸媒反應開始的溫度為高的溫度，例如是效率良好地推進反應塔3內的觸媒反應的溫度。The control unit 21 maintains the operating temperature in the reaction tower 3 within a predetermined range by adjusting the temperature of the heat medium. The control unit 21 may also adjust the temperature of the heat medium so as to maintain the temperature in the reaction tower 3 at, for example, 200°C or more and 220°C or less. The operating temperature is not limited to 200°C or more and 220°C or less. The operating temperature may be a temperature at which the exothermic reaction of the raw material gas proceeds favorably, that is, a rated temperature. The rated temperature may also be a temperature at which a high concentration of product gas is generated. Furthermore, the operating temperature and the rated temperature are temperatures higher than the temperature at which the catalytic reaction in the reaction tower 3 starts, and are, for example, temperatures at which the catalytic reaction in the reaction tower 3 can be efficiently advanced.
＜運轉過程＞ 對第一實施方式的生成裝置100的運轉過程進行說明。圖2是表示第一實施方式的生成裝置100的運轉過程的流程的流程圖。首先，啟動熱介質循環泵12（S101）。熱介質被送往反應塔1的夾套部分，通過反應塔1。通過了反應塔1的熱介質被送往反應塔3的夾套部分，通過反應塔3。如此，進行反應塔1的運轉開始操作，並且進行反應塔3的運轉開始操作。 ＜Operation process＞ The operation process of the generation device 100 of the first embodiment will be described. FIG. 2 is a flowchart showing the flow of the operation process of the generation device 100 according to the first embodiment. First, the heat medium circulation pump 12 is started (S101). The heat medium is sent to the jacket part of the reaction tower 1 and passes through the reaction tower 1. The heat medium that has passed through reaction tower 1 is sent to the jacket part of reaction tower 3 and passes through reaction tower 3. In this way, the operation start operation of the reaction tower 1 is performed, and the operation start operation of the reaction tower 3 is performed.
當進行了處於原料氣體供給部9所進行的原料氣體向反應塔1的供給已停止的狀態（冷熱停止狀態）的反應塔1的運轉開始操作時，控制部21藉由熱介質的加熱來開始反應塔1的升溫（S102）。具體而言，控制部21接通熱介質加熱器5的電源，藉由控制熱介質加熱器5來對熱介質進行加熱。經加熱的熱介質被送往反應塔1的夾套部分，通過反應塔1。藉由經加熱的熱介質通過反應塔1，反應塔1升溫。藉此，反應塔1內的溫度上升。並且，通過了反應塔1的熱介質被送往反應塔3的夾套部分，通過反應塔3。藉由經加熱的熱介質通過反應塔3，反應塔3升溫。藉此，反應塔3內的溫度上升。When the operation start operation of the reaction tower 1 in which the supply of the raw material gas to the reaction tower 1 by the raw material gas supply unit 9 is stopped (the cooling and heating stop state) is performed, the control unit 21 starts by heating the heat medium. Heating of reaction tower 1 (S102). Specifically, the control unit 21 turns on the power of the heat medium heater 5 and controls the heat medium heater 5 to heat the heat medium. The heated heat medium is sent to the jacket part of the reaction tower 1 and passes through the reaction tower 1. As the heated heat medium passes through the reaction tower 1, the temperature of the reaction tower 1 is increased. Thereby, the temperature in the reaction tower 1 rises. Furthermore, the heat medium that has passed through the reaction tower 1 is sent to the jacket part of the reaction tower 3 and passes through the reaction tower 3 . As the heated heat medium passes through the reaction tower 3, the temperature of the reaction tower 3 increases. Thereby, the temperature in the reaction tower 3 rises.
原料氣體供給部9在升溫中的反應塔1內的溫度為低於運轉溫度的規定的供給開始溫度時，開始原料氣體向反應塔1的供給（S103）。規定的供給開始溫度例如為180℃。規定的供給開始溫度並不限於180℃，亦可為其他溫度。藉由向反應塔1內供給原料氣體，從而生成製品氣體。藉由原料氣體的發熱反應，反應塔1升溫。藉由經加熱的熱介質通過反應塔1時的反應塔1的升溫與反應塔1內的原料氣體的發熱反應所引起的反應塔1的升溫，反應塔1內的溫度上升而達到運轉溫度。The raw material gas supply unit 9 starts supplying the raw material gas to the reaction tower 1 when the temperature inside the reaction tower 1 being heated reaches a predetermined supply start temperature lower than the operating temperature (S103). The predetermined supply start temperature is, for example, 180°C. The prescribed supply start temperature is not limited to 180°C and may be other temperatures. By supplying raw material gas into the reaction tower 1, product gas is generated. Due to the exothermic reaction of the raw material gas, the temperature of the reaction tower 1 increases. Due to the temperature rise of the reaction tower 1 when the heated heat medium passes through the reaction tower 1 and the temperature rise of the reaction tower 1 caused by the exothermic reaction of the raw material gas in the reaction tower 1, the temperature in the reaction tower 1 rises and reaches the operating temperature.
對比較例進行說明。比較例的方法中，藉由加熱器對熱介質進行加熱，在熱介質的溫度達到運轉溫度的時機，向反應塔供給原料氣體。即，比較例的方法中，在熱介質的溫度達到運轉溫度後，向反應塔供給原料氣體，因此要進行加熱器對熱介質的加熱直至熱介質的溫度達到運轉溫度為止。因此，比較例的方法中，直至反應塔內的溫度達到運轉溫度為止需要時間。而且，比較例的方法中，要進行加熱器對熱介質的加熱直至熱介質的溫度達到運轉溫度為止，因此加熱器的消耗電力大。根據第一實施方式，藉由經加熱的熱介質通過反應塔1時的反應塔1的升溫與反應塔1內的原料氣體的發熱反應所引起的反應塔1的升溫，反應塔1內的溫度上升。因此，第一實施方式中，在開始了熱介質加熱器5對熱介質的加熱後，反應塔1內的溫度達到運轉溫度為止所需的時間得以縮短。其結果，可抑制熱介質加熱器5的消耗電力。Comparative examples will be described. In the method of the comparative example, the heat medium is heated with a heater, and when the temperature of the heat medium reaches the operating temperature, the raw material gas is supplied to the reaction tower. That is, in the method of the comparative example, the raw material gas is supplied to the reaction tower after the temperature of the heat medium reaches the operating temperature. Therefore, the heat medium is heated by the heater until the temperature of the heat medium reaches the operating temperature. Therefore, in the method of the comparative example, it takes time until the temperature in the reaction tower reaches the operating temperature. Furthermore, in the method of the comparative example, the heater heats the heat medium until the temperature of the heat medium reaches the operating temperature, so the heater consumes a large amount of power. According to the first embodiment, by the temperature rise of the reaction tower 1 when the heated heat medium passes through the reaction tower 1 and the temperature rise of the reaction tower 1 caused by the exothermic reaction of the raw material gas in the reaction tower 1, the temperature in the reaction tower 1 rise. Therefore, in the first embodiment, after the heat medium heater 5 starts heating the heat medium, the time required until the temperature in the reaction tower 1 reaches the operating temperature is shortened. As a result, the power consumption of the heat medium heater 5 can be suppressed.
而且，第一實施方式中，在反應塔1內的溫度為低於運轉溫度的溫度時，開始原料氣體向反應塔1的供給。在反應塔1內的溫度為低於運轉溫度的溫度的階段，在反應塔1內開始原料氣體的發熱反應，藉此，在第一實施方式中，與比較例相比，提前開始反應塔1內的原料氣體的發熱反應。因此，生成裝置100可縮短製品氣體的生成所需的時間，而且，可在短時間生成高濃度的製品氣體。其結果，第一實施方式中，與比較例相比，可縮短高濃度的製品氣體的生成所需的時間。Furthermore, in the first embodiment, when the temperature in the reaction tower 1 is lower than the operating temperature, the supply of the raw material gas to the reaction tower 1 is started. When the temperature in the reaction tower 1 is lower than the operating temperature, the exothermic reaction of the raw material gas is started in the reaction tower 1 . Therefore, in the first embodiment, the reaction tower 1 is started earlier than in the comparative example. The exothermic reaction of the raw material gas inside. Therefore, the generation device 100 can shorten the time required to generate the product gas, and can generate a high-concentration product gas in a short time. As a result, in the first embodiment, the time required to generate high-concentration product gas can be shortened compared to the comparative example.
流入至反應塔1的夾套部分而循環的熱介質藉由原料氣體的發熱反應受到加熱。因此，原料氣體的發熱反應亦成為熱介質的加熱源，第一實施方式中的熱介質的溫度較比較例更快地上升。圖3是表示第一實施方式中的通過反應塔1的熱介質的溫度變化與比較例中的通過反應塔的熱介質的溫度變化的關係的圖。圖3的橫軸表示自熱介質的加熱開始後計起的時間。圖3的縱軸表示各時間的熱介質的溫度（℃）。第一實施方式中，通過反應塔1的熱介質的溫度達到230℃所需的時間為6小時左右。比較例的方法中，通過反應塔的熱介質的溫度達到230℃所需的時間為7小時左右。如此，與比較例相比較，第一實施方式中的通過反應塔1的熱介質的溫度達到230℃所需的時間短了1小時左右。The heat medium that flows into the jacket portion of the reaction tower 1 and circulates is heated by the exothermic reaction of the raw material gas. Therefore, the exothermic reaction of the raw material gas also becomes a heating source for the heat medium, and the temperature of the heat medium in the first embodiment rises faster than in the comparative example. FIG. 3 is a diagram showing the relationship between the temperature change of the heat medium passing through the reaction tower 1 in the first embodiment and the temperature change of the heat medium passing through the reaction tower in the comparative example. The horizontal axis of FIG. 3 represents the time since the heating of the heating medium started. The vertical axis of FIG. 3 represents the temperature (°C) of the heat medium at each time. In the first embodiment, the time required for the temperature of the heat medium passing through the reaction tower 1 to reach 230°C is about 6 hours. In the method of the comparative example, the time required for the temperature of the heat medium passing through the reaction tower to reach 230°C is about 7 hours. Thus, compared with the comparative example, the time required for the temperature of the heat medium passing through the reaction tower 1 to reach 230°C is shorter by about 1 hour in the first embodiment.
控制部21藉由熱介質的溫度調整來將反應塔1內維持為規定範圍的運轉溫度（S104）。例如，在反應塔1的升溫中開始原料氣體供給部9所進行的原料氣體的供給的情況下，控制部21亦可停止藉由熱介質的加熱所進行的反應塔1的升溫。藉由停止熱介質加熱器5對熱介質的加熱，藉由熱介質的加熱所進行的反應塔1的升溫停止。在反應塔1內，正在進行原料氣體的發熱反應所引起的反應塔1的升溫，因此即便停止藉由熱介質的加熱所進行的反應塔1的升溫，反應塔1內的溫度亦會達到運轉溫度。因此，可將反應塔1內維持為運轉溫度。控制部21在停止了藉由熱介質的加熱所進行的反應塔1的升溫後，亦可再次開始藉由熱介質的加熱所進行的反應塔1的升溫。The control unit 21 maintains the operating temperature in the reaction tower 1 within a predetermined range by adjusting the temperature of the heat medium (S104). For example, when the supply of the raw material gas by the raw material gas supply unit 9 is started during the temperature rise of the reaction tower 1, the control unit 21 may stop the temperature rise of the reaction tower 1 by heating of the heat medium. By stopping the heating of the heat medium by the heat medium heater 5, the temperature rise of the reaction tower 1 by the heating of the heat medium is stopped. In the reaction tower 1, the temperature of the reaction tower 1 is being raised due to the exothermic reaction of the raw material gas. Therefore, even if the temperature rise of the reaction tower 1 by heating of the heat medium is stopped, the temperature in the reaction tower 1 will reach the operating temperature. temperature. Therefore, the inside of the reaction tower 1 can be maintained at the operating temperature. The control unit 21 may restart the temperature increase of the reaction tower 1 by heating the heat medium after stopping the temperature increase of the reaction tower 1 by heating the heat medium.
原料氣體供給部9亦可基於反應塔1內的溫度來決定原料氣體向反應塔1的供給量。反應塔1內的溫度與在反應塔1內由原料氣體所生成的製品氣體的濃度存在相關關係。原料氣體供給部9亦可基於表示反應塔1內的溫度與製品氣體的濃度的相關關係的映射或關係式來決定原料氣體向反應塔1的供給量。映射或關係式亦可藉由設計、實驗或模擬來求出。映射或關係式亦可記憶於原料氣體供給部9所具有的記憶部中。映射或關係式亦可記憶於控制部21所具有的記憶體等記憶部中。原料氣體供給部9亦可自控制部21獲取原料氣體向反應塔1的供給量。藉由基於反應塔1內的溫度與在反應塔1內由原料氣體所生成的製品氣體的濃度的相關關係來決定原料氣體向反應塔1內的供給量，可控制藉由反應塔1而生成的製品氣體的濃度。The raw material gas supply unit 9 may determine the supply amount of the raw material gas to the reaction tower 1 based on the temperature in the reaction tower 1 . There is a correlation between the temperature in the reaction tower 1 and the concentration of the product gas generated from the raw material gas in the reaction tower 1 . The raw material gas supply unit 9 may determine the supply amount of the raw material gas to the reaction tower 1 based on a map or a relational expression showing the correlation between the temperature in the reaction tower 1 and the concentration of the product gas. Mappings or relationships can also be found through design, experiment, or simulation. The map or the relational expression may be stored in the memory unit of the raw material gas supply unit 9 . The mapping or the relational expression may be stored in a memory unit such as a memory included in the control unit 21. The raw material gas supply unit 9 may obtain the supply amount of the raw material gas to the reaction tower 1 from the control unit 21 . By determining the supply amount of the raw material gas into the reaction tower 1 based on the correlation between the temperature in the reaction tower 1 and the concentration of the product gas generated from the raw material gas in the reaction tower 1, the production by the reaction tower 1 can be controlled. The concentration of the product gas.
圖4是表示第一實施方式的運轉負載量（%）與比較例的運轉負載量（%）的關係的圖。圖4的橫軸表示自熱介質的加熱開始後計起的時間。圖4的縱軸表示運轉負載量（各時間的原料氣體供給量相對於運轉溫度時的原料氣體供給量的比例）。第一實施方式中，在反應塔1內的溫度為低於運轉溫度的規定的供給開始溫度時開始原料氣體向反應塔1的供給，使運轉負載量按照25%、50%、75%、100%的順序階段性地增加。比較例中，自反應塔內的溫度達到運轉溫度後開始原料氣體向反應塔的供給，使運轉負載量增加。如圖4所示，在第一實施方式與比較例中，原料氣體的供給開始時間不同，並且運轉負載量的增加方法不同。FIG. 4 is a diagram showing the relationship between the operating load amount (%) of the first embodiment and the operating load amount (%) of the comparative example. The horizontal axis of FIG. 4 represents the time since the heating of the heating medium started. The vertical axis of FIG. 4 represents the operating load (the ratio of the raw material gas supply amount at each time to the raw material gas supply amount at the operating temperature). In the first embodiment, the supply of raw material gas to the reaction tower 1 is started when the temperature in the reaction tower 1 reaches a predetermined supply start temperature lower than the operating temperature, and the operating load is adjusted to 25%, 50%, 75%, and 100%. % increases in stages. In the comparative example, the supply of raw material gas to the reaction tower was started after the temperature in the reaction tower reached the operating temperature, thereby increasing the operating load. As shown in FIG. 4 , in the first embodiment and the comparative example, the supply start time of the raw material gas is different, and the method of increasing the operating load amount is different.
接下來對分離部10進行說明。圖5是分離部10的結構圖。分離部10自在反應塔1中生成製品氣體時在反應塔1中生成的生成水中，分離溶解於生成水中的溶解氣體。而且，分離部10自在反應塔3中生成製品氣體時在反應塔3中生成的生成水中，分離溶解於生成水中的溶解氣體。分離部10包括泵31、分離膜模組32、真空泵33、緩衝罐34以及壓縮機35。生成裝置100包括供自反應塔3送出的製品氣體流動的製品氣體路徑41。Next, the separation unit 10 will be described. FIG. 5 is a structural diagram of the separation unit 10. The separation unit 10 separates the dissolved gas dissolved in the generated water generated in the reaction tower 1 when the product gas is generated in the reaction tower 1 . Furthermore, the separation unit 10 separates the dissolved gas dissolved in the generated water generated in the reaction tower 3 when the product gas is generated in the reaction tower 3 . The separation part 10 includes a pump 31 , a separation membrane module 32 , a vacuum pump 33 , a buffer tank 34 and a compressor 35 . The generation device 100 includes a product gas path 41 through which the product gas sent from the reaction tower 3 flows.
自氣液分離器7以及氣液分離器8送往分離部10的生成水藉由泵31被送至分離膜模組32。分離膜模組32具有分離膜36。分離膜36例如為中空絲膜。在分離膜模組32連接有真空泵33。藉由分離膜36自生成水中分離溶解氣體。在溶解氣體為製品氣體的情況下，藉由真空泵33對分離膜模組32內進行抽真空，並將製品氣體送往緩衝罐34。緩衝罐34暫時貯存製品氣體。貯存於緩衝罐34中的製品氣體藉由壓縮機35被送至製品氣體路徑41。藉此，自生成水分離的製品氣體相對於流經製品氣體路徑41的製品氣體而匯流。The generated water sent to the separation part 10 from the gas-liquid separator 7 and the gas-liquid separator 8 is sent to the separation membrane module 32 by the pump 31 . The separation membrane module 32 has a separation membrane 36 . The separation membrane 36 is, for example, a hollow fiber membrane. A vacuum pump 33 is connected to the separation membrane module 32 . Dissolved gases are separated from the generated water by the separation membrane 36 . When the dissolved gas is product gas, the inside of the separation membrane module 32 is evacuated by the vacuum pump 33 , and the product gas is sent to the buffer tank 34 . The buffer tank 34 temporarily stores product gas. The product gas stored in the buffer tank 34 is sent to the product gas path 41 by the compressor 35 . Thereby, the product gas separated from the generated water merges with the product gas flowing through the product gas path 41 .
以往，使用將溶解於生成水的製品氣體擴散至大氣中的方法、或者使用除氣機（脫氣裝置）向貯存有生成水的罐內吹入空氣等氣體而強制性地自生成水中趕出製品氣體的方法。此種方法中，需要用於貯存製品氣體的大容積的罐或者用於向罐內吹入氣體的機器。根據第一實施方式，由於暫時貯存製品氣體的緩衝罐34的容積小，因此緩衝罐34可實現省空間化。而且，根據第一實施方式，需要用於向罐內吹入氣體的機器。由於使自生成水分離的製品氣體相對於流經製品氣體路徑41的製品氣體而匯流，因此可抑制製品氣體向大氣中的擴散。Conventionally, a method was used to diffuse the product gas dissolved in the generated water into the atmosphere, or a degasser (degassing device) was used to blow gases such as air into a tank storing the generated water to forcefully expel it from the generated water. Product gas method. This method requires a large-capacity tank for storing product gas or a machine for blowing gas into the tank. According to the first embodiment, since the volume of the buffer tank 34 for temporarily storing the product gas is small, the space of the buffer tank 34 can be saved. Furthermore, according to the first embodiment, a machine for blowing gas into the tank is required. Since the product gas separated from the generated water merges with the product gas flowing through the product gas path 41 , diffusion of the product gas into the atmosphere can be suppressed.
上文中，對溶解氣體為製品氣體的情況進行了說明，但溶解氣體亦可為未反應的原料氣體。藉由變更分離膜模組32的分離膜36的種類，可自生成水中分離溶解於生成水中的製品氣體，或者自生成水中分離溶解於生成水中的未反應的原料氣體。而且，分離部10亦可包括用於自生成水中分離溶解於生成水中的製品氣體的分離膜模組32、以及自生成水中分離溶解於生成水中的未反應的原料氣體的分離膜模組32。而且，分離部10亦可包括製品氣體用的緩衝罐34與未反應的原料氣體用的緩衝罐34。The case where the dissolved gas is a product gas has been described above, but the dissolved gas may also be an unreacted raw material gas. By changing the type of the separation membrane 36 of the separation membrane module 32, the product gas dissolved in the generated water can be separated from the generated water, or the unreacted raw material gas dissolved in the generated water can be separated from the generated water. Furthermore, the separation unit 10 may include a separation membrane module 32 for separating product gas dissolved in the generated water from the generated water, and a separation membrane module 32 for separating unreacted raw material gas dissolved in the generated water from the generated water. Furthermore, the separation unit 10 may include a buffer tank 34 for product gas and a buffer tank 34 for unreacted raw material gas.
在溶解氣體為未反應的原料氣體的情況下，藉由真空泵33對分離膜模組32內進行抽真空，並將未反應的原料氣體送往緩衝罐34。貯存於緩衝罐34中的未反應的原料氣體藉由壓縮機35被送至原料氣體供給部9。藉此，未反應的原料氣體返回原料氣體供給部9。根據第一實施方式，由於暫時貯存未反應的原料氣體的緩衝罐34的容積小，因此緩衝罐34可實現省空間化。而且，根據第一實施方式，不需要用於向罐內吹入氣體的機器。由於使未反應的原料氣體返回原料氣體供給部9，因此可抑制未反應的原料氣體向大氣中的擴散。When the dissolved gas is unreacted raw material gas, the inside of the separation membrane module 32 is evacuated by the vacuum pump 33 , and the unreacted raw material gas is sent to the buffer tank 34 . The unreacted raw material gas stored in the buffer tank 34 is sent to the raw material gas supply unit 9 through the compressor 35 . Thereby, the unreacted raw material gas returns to the raw material gas supply part 9 . According to the first embodiment, since the buffer tank 34 that temporarily stores unreacted raw material gas has a small volume, the buffer tank 34 can save space. Furthermore, according to the first embodiment, a machine for blowing gas into the tank is not required. Since the unreacted raw material gas is returned to the raw material gas supply part 9, diffusion of the unreacted raw material gas into the atmosphere can be suppressed.
＜第二實施方式＞ 對第二實施方式進行說明。第二實施方式中，對於與第一實施方式相同的構成元件，標註與第一實施方式相同的符號並適當省略其說明。亦可將第一實施方式、第二實施方式的生成裝置100適當組合。 <Second Embodiment> The second embodiment will be described. In the second embodiment, the same constituent elements as those in the first embodiment are denoted by the same reference numerals as in the first embodiment, and descriptions thereof are appropriately omitted. The generation devices 100 of the first embodiment and the second embodiment may be combined appropriately.
圖6是本發明的第二實施方式的生成裝置100的結構圖。圖6中示出了生成裝置100的一部分。與第一實施方式的生成裝置100相比較，第二實施方式的生成裝置100更包括增壓用反應塔51、切換部52、氣體冷卻用熱交換器53、氣液分離器54以及測定感測器55。FIG. 6 is a structural diagram of the generation device 100 according to the second embodiment of the present invention. A part of the generation device 100 is shown in FIG. 6 . Compared with the production device 100 of the first embodiment, the production device 100 of the second embodiment further includes a pressurizing reaction tower 51, a switching unit 52, a gas cooling heat exchanger 53, a gas-liquid separator 54, and a measurement sensor. Device 55.
增壓用反應塔51藉由觸媒中的原料氣體的發熱反應來生成製品氣體。原料氣體供給部9與增壓用反應塔51藉由配管而連接，在連接原料氣體供給部9與增壓用反應塔51的配管的中途設有切換部52。切換部52例如為三通閥。切換部52在反應塔1與增壓用反應塔51之間切換原料氣體供給部9供給原料氣體的供給目標。控制部21亦可進行切換部52的切換控制。在原料氣體供給部9供給原料氣體的供給目標由反應塔1切換為增壓用反應塔51的情況下，原料氣體自原料氣體供給部9被供給至增壓用反應塔51內。增壓用反應塔51藉由觸媒中的原料氣體的發熱反應而生成生成水。而且，在原料氣體供給部9供給原料氣體的供給目標由增壓用反應塔51切換為反應塔1的情況下，原料氣體自原料氣體供給部9被供給至反應塔1內。The pressure-increasing reaction tower 51 generates product gas through the exothermic reaction of the raw material gas in the catalyst. The raw material gas supply part 9 and the pressurizing reaction tower 51 are connected by pipes, and a switching part 52 is provided in the middle of the pipe connecting the raw material gas supply part 9 and the pressurizing reaction tower 51 . The switching unit 52 is a three-way valve, for example. The switching unit 52 switches the supply target of the raw material gas supplied by the raw material gas supply unit 9 between the reaction tower 1 and the pressurizing reaction tower 51 . The control unit 21 may also perform switching control of the switching unit 52 . When the supply destination of the raw material gas supplied by the raw material gas supply unit 9 is switched from the reaction tower 1 to the pressure-increasing reaction tower 51 , the material gas is supplied from the material gas supply unit 9 into the pressure-increasing reaction tower 51 . The pressurizing reaction tower 51 generates product water by a heat-generating reaction of the raw material gas in the catalyst. Furthermore, when the supply destination of the raw material gas supplied by the raw material gas supply unit 9 is switched from the pressurizing reaction tower 51 to the reaction tower 1 , the raw material gas is supplied from the raw material gas supply unit 9 into the reaction tower 1 .
在增壓用反應塔51中預先填充有觸媒。增壓用反應塔51的結構與反應塔1為同樣的結構，但增壓用反應塔51內的容量小於反應塔1內的容量。增壓用反應塔51與氣體冷卻用熱交換器53藉由配管而連接。在連接增壓用反應塔51與氣體冷卻用熱交換器53的配管中設有閥等。反應塔1與氣液分離器54藉由配管而連接。在連接反應塔1與氣液分離器54的配管中設有閥等。The pressurizing reaction tower 51 is filled with a catalyst in advance. The pressure-increasing reaction tower 51 has the same structure as the reaction tower 1 , but the capacity in the pressure-increasing reaction tower 51 is smaller than the capacity in the reaction tower 1 . The pressurizing reaction tower 51 and the gas cooling heat exchanger 53 are connected by pipes. A valve or the like is provided in a pipe connecting the pressurizing reaction tower 51 and the gas cooling heat exchanger 53 . The reaction tower 1 and the gas-liquid separator 54 are connected through pipes. A valve or the like is provided in the pipe connecting the reaction tower 1 and the gas-liquid separator 54 .
氣體冷卻用熱交換器53與氣體冷卻用熱交換器2為同樣的結構，對在增壓用反應塔51中生成的生成水（水蒸氣）進行冷凝。氣液分離器54與氣液分離器7為同樣的結構，自製品氣體及未反應的原料氣體中分離生成水（液體）。測定感測器55與測定感測器22為同樣的結構，對增壓用反應塔51內的溫度進行測定。經熱介質加熱器5加熱的熱介質依序通過增壓用反應塔51、反應塔1及反應塔3。The gas cooling heat exchanger 53 has the same structure as the gas cooling heat exchanger 2 and condenses the generated water (water vapor) generated in the pressurizing reaction tower 51 . The gas-liquid separator 54 has the same structure as the gas-liquid separator 7 and separates water (liquid) from the product gas and unreacted raw material gas. The measurement sensor 55 has the same structure as the measurement sensor 22 and measures the temperature in the pressure-increasing reaction tower 51 . The heat medium heated by the heat medium heater 5 passes through the pressurizing reaction tower 51 , the reaction tower 1 and the reaction tower 3 in sequence.
控制部21藉由熱介質的溫度調整來將增壓用反應塔51內維持為規定範圍的運轉溫度。控制部21亦可調整熱介質的溫度，以將增壓用反應塔51內的溫度維持為例如200℃以上且220℃以下。運轉溫度並不限於200℃以上且220℃以下。運轉溫度亦可為原料氣體的發熱反應良好地推進的溫度即額定溫度。額定溫度亦可為生成高濃度的製品氣體的溫度。The control unit 21 maintains the operation temperature in the pressure-increasing reaction tower 51 within a predetermined range by adjusting the temperature of the heat medium. The control unit 21 may adjust the temperature of the heat medium so as to maintain the temperature in the pressurizing reaction tower 51 at, for example, 200° C. or more and 220° C. or less. The operating temperature is not limited to 200°C or more and 220°C or less. The operating temperature may be a temperature at which the exothermic reaction of the raw material gas proceeds favorably, that is, a rated temperature. The rated temperature may also be a temperature at which a high concentration of product gas is generated.
＜運轉過程＞ 對第二實施方式的生成裝置100的運轉過程進行說明。圖7是表示第二實施方式的生成裝置100的運轉過程的流程的流程圖。首先，啟動熱介質循環泵12（S201）。熱介質被送往增壓用反應塔51的夾套部分，通過增壓用反應塔51。通過了增壓用反應塔51的熱介質被送往反應塔1的夾套部分，通過反應塔1。通過了反應塔1的熱介質被送往反應塔3的夾套部分，通過反應塔3。如此，進行反應塔1的運轉開始操作、反應塔3的運轉開始操作以及增壓用反應塔51的運轉開始操作。 ＜Operation process＞ The operation process of the generation device 100 of the second embodiment will be described. FIG. 7 is a flowchart showing the flow of the operation process of the generation device 100 according to the second embodiment. First, the heat medium circulation pump 12 is started (S201). The heat medium is sent to the jacket part of the pressure-pressurizing reaction tower 51 and passes through the pressure-pressurizing reaction tower 51 . The heat medium that has passed through the pressure-increasing reaction tower 51 is sent to the jacket portion of the reaction tower 1 and passes through the reaction tower 1 . The heat medium that has passed through reaction tower 1 is sent to the jacket part of reaction tower 3 and passes through reaction tower 3. In this way, the operation start operation of the reaction tower 1, the operation start operation of the reaction tower 3, and the operation start operation of the pressurizing reaction tower 51 are performed.
當進行了處於原料氣體供給部9所進行的原料氣體向增壓用反應塔51的供給已停止的狀態（冷熱停止狀態）的增壓用反應塔51的運轉開始操作時，控制部21藉由熱介質的加熱來開始增壓用反應塔51的升溫（S202）。具體而言，控制部21接通熱介質加熱器5的電源，藉由控制熱介質加熱器5來對熱介質進行加熱。經加熱的熱介質被送往增壓用反應塔51的夾套部分，通過增壓用反應塔51。藉此，增壓用反應塔51內的溫度上升。並且，通過了增壓用反應塔51的熱介質被送往反應塔1的夾套部分，通過反應塔1。藉由經加熱的熱介質通過反應塔1，反應塔1升溫。藉此，反應塔1內的溫度上升。進而，通過了反應塔1的熱介質被送往反應塔3的夾套部分，通過反應塔3。藉由經加熱的熱介質通過反應塔3，反應塔3升溫。藉此，反應塔3內的溫度上升。When the operation start operation of the supercharging reaction tower 51 in which the supply of the raw material gas to the supercharging reaction tower 51 by the raw material gas supply unit 9 is stopped (cooling and heating stop state) is performed, the control unit 21 The heat medium is heated to start the temperature rise of the pressurizing reaction tower 51 (S202). Specifically, the control unit 21 turns on the power of the heat medium heater 5 and controls the heat medium heater 5 to heat the heat medium. The heated heat medium is sent to the jacket part of the pressure-increasing reaction tower 51 and passes through the pressure-increasing reaction tower 51 . Thereby, the temperature inside the pressure-increasing reaction tower 51 rises. Furthermore, the heat medium that has passed through the pressure-increasing reaction tower 51 is sent to the jacket portion of the reaction tower 1 and passes through the reaction tower 1 . As the heated heat medium passes through the reaction tower 1, the temperature of the reaction tower 1 is raised. Thereby, the temperature in the reaction tower 1 rises. Furthermore, the heat medium that has passed through the reaction tower 1 is sent to the jacket part of the reaction tower 3 and passes through the reaction tower 3 . As the heated heat medium passes through the reaction tower 3, the temperature of the reaction tower 3 increases. Thereby, the temperature in the reaction tower 3 rises.
原料氣體供給部9在升溫中的增壓用反應塔51內的溫度為低於運轉溫度的規定的供給開始溫度時，開始原料氣體向增壓用反應塔51的供給（S203）。原料氣體供給部9供給原料氣體的供給目標由反應塔1切換為增壓用反應塔51。因此，原料氣體被供給至增壓用反應塔51，並且原料氣體經由增壓用反應塔51被供給至反應塔1。規定的供給開始溫度例如為180℃。規定的供給開始溫度並不限於180℃，亦可為其他溫度。藉由向增壓用反應塔51內供給原料氣體，從而生成製品氣體。藉由原料氣體的發熱反應，增壓用反應塔51升溫。藉由經加熱的熱介質通過增壓用反應塔51時的增壓用反應塔51的升溫與增壓用反應塔51內的原料氣體的發熱反應所引起的增壓用反應塔51的升溫，增壓用反應塔51內的溫度上升而達到運轉溫度。The raw material gas supply unit 9 starts supplying the raw material gas to the supercharging reaction tower 51 when the temperature in the rising pressure reaction tower 51 reaches a predetermined supply start temperature lower than the operating temperature (S203). The supply target of the raw material gas supplied by the raw material gas supply unit 9 is switched from the reaction tower 1 to the pressurizing reaction tower 51 . Therefore, the raw material gas is supplied to the pressurizing reaction tower 51 , and the raw material gas is supplied to the reaction tower 1 via the pressurizing reaction tower 51 . The predetermined supply start temperature is, for example, 180°C. The prescribed supply start temperature is not limited to 180°C and may be other temperatures. By supplying the raw material gas into the pressurizing reaction tower 51, product gas is generated. Due to the exothermic reaction of the raw material gas, the temperature of the pressurizing reaction tower 51 is increased. The temperature rise of the supercharger reaction tower 51 when the heated heat medium passes through the supercharger reaction tower 51 and the temperature rise of the supercharger reaction tower 51 caused by the exothermic reaction of the raw material gas in the supercharger reaction tower 51, The temperature in the pressurizing reaction tower 51 rises and reaches the operating temperature.
根據第二實施方式，藉由經加熱的熱介質通過增壓用反應塔51時的增壓用反應塔51的升溫與增壓用反應塔51內的原料氣體的發熱反應所引起的增壓用反應塔51的升溫，增壓用反應塔51內的溫度上升。因此，第二實施方式中，在開始了熱介質加熱器5對熱介質的加熱後，增壓用反應塔51內的溫度達到運轉溫度為止所需的時間得以縮短。其結果，可抑制熱介質加熱器5的消耗電力。According to the second embodiment, the pressure for pressurization is caused by the temperature rise of the pressurization reaction tower 51 when the heated heat medium passes through the pressurization reaction tower 51 and the exothermic reaction of the raw material gas in the pressurization reaction tower 51 . As the temperature of the reaction tower 51 rises, the temperature in the pressurizing reaction tower 51 rises. Therefore, in the second embodiment, after the heat medium heater 5 starts heating the heat medium, the time required until the temperature in the pressure-increasing reaction tower 51 reaches the operating temperature is shortened. As a result, the power consumption of the heat medium heater 5 can be suppressed.
而且，第二實施方式中，在增壓用反應塔51內的溫度為低於運轉溫度的溫度時，開始原料氣體向增壓用反應塔51的供給。在增壓用反應塔51內的溫度為低於運轉溫度的溫度的階段，在增壓用反應塔51內開始原料氣體的發熱反應，藉此，第二實施方式中，與比較例相比，提前開始增壓用反應塔51內的原料氣體的發熱反應。因此，生成裝置100可縮短製品氣體的生成所需的時間，而且，可在短時間生成高濃度的製品氣體。其結果，第二實施方式中，與比較例相比，可縮短直至生成高濃度的製品氣體為止的時間。Furthermore, in the second embodiment, when the temperature in the pressure-increasing reaction tower 51 is lower than the operating temperature, the supply of the raw material gas to the pressure-increasing reaction tower 51 is started. When the temperature in the pressure-increasing reaction tower 51 is lower than the operating temperature, the exothermic reaction of the raw material gas is started in the pressure-increasing reaction tower 51 . Accordingly, in the second embodiment, compared with the comparative example, The exothermic reaction of the raw material gas in the pressurizing reaction tower 51 is started in advance. Therefore, the generation device 100 can shorten the time required to generate the product gas, and can generate a high-concentration product gas in a short time. As a result, in the second embodiment, the time until a high-concentration product gas is generated can be shortened compared to the comparative example.
而且，第二實施方式中，通過了增壓用反應塔51的熱介質在增壓用反應塔51內藉由原料氣體的發熱反應受到加熱。即，通過反應塔1的熱介質在增壓用反應塔51內藉由原料氣體的發熱反應而預先受到加熱。因此，第二實施方式中，在開始了熱介質加熱器5對熱介質的加熱後，反應塔1內的溫度達到運轉溫度為止所需的時間得以縮短。其結果，可抑制熱介質加熱器5的消耗電力。Furthermore, in the second embodiment, the heat medium that has passed through the pressure-increasing reaction tower 51 is heated by the exothermic reaction of the raw material gas in the pressure-increasing reaction tower 51 . That is, the heat medium passing through the reaction tower 1 is heated in advance by the exothermic reaction of the raw material gas in the pressure-increasing reaction tower 51 . Therefore, in the second embodiment, after the heat medium heater 5 starts heating the heat medium, the time required until the temperature in the reaction tower 1 reaches the operating temperature is shortened. As a result, the power consumption of the heat medium heater 5 can be suppressed.
第二實施方式中，可在藉由增壓用反應塔51對製品氣體及未反應的原料氣體進行了加熱的狀態下向反應塔1內供給製品氣體及未反應的原料氣體。增壓用反應塔51內的容量小於反應塔1內的容量。因此，增壓用反應塔51內的溫度達到運轉溫度為止所需的時間較第一實施方式中的反應塔1內的溫度達到運轉溫度為止所需的時間更短。因此，可在開始熱介質加熱器5對熱介質的加熱後的早期階段，將高溫狀態的製品氣體及未反應的原料氣體供給至反應塔1內。藉此，反應塔1內的溫度達到運轉溫度為止所需的時間得以縮短。In the second embodiment, the product gas and the unreacted raw material gas can be supplied into the reaction tower 1 in a state where the product gas and the unreacted raw material gas are heated by the pressurizing reaction tower 51 . The capacity in the pressurizing reaction tower 51 is smaller than the capacity in the reaction tower 1 . Therefore, the time required until the temperature in the pressure-increasing reaction tower 51 reaches the operating temperature is shorter than the time required until the temperature in the reaction tower 1 reaches the operating temperature in the first embodiment. Therefore, the product gas and the unreacted raw material gas in a high-temperature state can be supplied into the reaction tower 1 at an early stage after the heating of the heat medium by the heat medium heater 5 is started. This shortens the time required for the temperature in the reaction tower 1 to reach the operating temperature.
控制部21藉由熱介質的溫度調整來將增壓用反應塔51內維持為規定範圍的運轉溫度（S204）。例如在增壓用反應塔51的升溫中開始了原料氣體供給部9對原料氣體的供給的情況下，控制部21亦可停止藉由熱介質的加熱所進行的增壓用反應塔51的升溫。藉由停止熱介質加熱器5對熱介質的加熱，藉由熱介質的加熱所進行的增壓用反應塔51的升溫停止。在增壓用反應塔51內，正在進行原料氣體的發熱反應所引起的增壓用反應塔51的升溫，因此即便藉由熱介質的加熱所進行的增壓用反應塔51的升溫停止，增壓用反應塔51內的溫度亦會達到運轉溫度。而且，高溫狀態的製品氣體及未反應的原料氣體自增壓用反應塔51被供給至反應塔1內，且藉由增壓用反應塔51內的原料氣體的發熱反應經加熱的熱介質通過反應塔1。因此，即便藉由熱介質的加熱所進行的增壓用反應塔51的升溫停止，反應塔1內的溫度亦會達到運轉溫度。控制部21在停止了藉由熱介質的加熱所進行的增壓用反應塔51的升溫後，亦可再次開始藉由熱介質的加熱所進行的增壓用反應塔51的升溫。The control unit 21 maintains the operation temperature in the pressure-increasing reaction tower 51 within a predetermined range by adjusting the temperature of the heat medium (S204). For example, when the supply of the raw material gas from the raw material gas supply unit 9 is started while the temperature of the pressure-increasing reaction tower 51 is being raised, the control unit 21 may stop the temperature increase of the pressure-increasing reaction tower 51 by heating of the heat medium. . By stopping the heating of the heat medium by the heat medium heater 5, the temperature increase of the pressurizing reaction tower 51 by heating of the heat medium is stopped. In the pressurizing reaction tower 51, the temperature of the pressurizing reaction tower 51 is being raised due to the exothermic reaction of the raw material gas. Therefore, even if the temperature rise of the pressurizing reaction tower 51 by heating of the heat medium stops, the increase in temperature is The temperature in the pressure reaction tower 51 will also reach the operating temperature. Furthermore, the product gas and unreacted raw material gas in a high-temperature state are supplied into the reaction tower 1 from the pressurizing reaction tower 51 , and the heat medium heated by the exothermic reaction of the raw material gas in the pressurizing reaction tower 51 passes therethrough. Reaction tower 1. Therefore, even if the temperature increase of the pressurizing reaction tower 51 by heating of the heat medium is stopped, the temperature in the reaction tower 1 will reach the operating temperature. The control unit 21 may restart the temperature increase of the pressure-increasing reaction tower 51 by heating the heat medium after stopping the temperature increase of the pressure-increasing reaction tower 51 by heating the heat medium.
原料氣體供給部9亦可基於增壓用反應塔51內的溫度來決定原料氣體向增壓用反應塔51的供給量。而且，原料氣體供給部9亦可基於反應塔1內的溫度來決定原料氣體向增壓用反應塔51的供給量。原料氣體供給部9亦可基於表示增壓用反應塔51內的溫度與製品氣體的濃度的相關關係的映射或關係式來決定原料氣體向增壓用反應塔51的供給量。原料氣體供給部9亦可基於表示反應塔1內的溫度與製品氣體的濃度的相關關係的映射或關係式來決定原料氣體向增壓用反應塔51的供給量。映射或關係式亦可藉由設計、實驗或模擬來求出。映射或關係式亦可記憶於原料氣體供給部9所具有的記憶部中。映射或關係式亦可記憶於控制部21所具有的記憶體等記憶部中。原料氣體供給部9亦可自控制部21獲取原料氣體向增壓用反應塔51的供給量。The raw material gas supply unit 9 may determine the supply amount of the raw material gas to the supercharging reaction tower 51 based on the temperature in the supercharging reaction tower 51 . Furthermore, the raw material gas supply unit 9 may determine the supply amount of the raw material gas to the pressurizing reaction tower 51 based on the temperature in the reaction tower 1 . The raw material gas supply unit 9 may determine the supply amount of the raw material gas to the supercharging reaction tower 51 based on a map or a relational expression showing the correlation between the temperature in the supercharging reaction tower 51 and the concentration of the product gas. The raw material gas supply unit 9 may determine the supply amount of the raw material gas to the pressurizing reaction tower 51 based on a map or a relational expression showing the correlation between the temperature in the reaction tower 1 and the concentration of the product gas. Mappings or relationships can also be found through design, experiment, or simulation. The map or the relational expression may be stored in the memory unit of the raw material gas supply unit 9 . The mapping or the relational expression may be stored in a memory unit such as a memory included in the control unit 21. The raw material gas supply unit 9 may obtain the supply amount of the raw material gas to the pressurizing reaction tower 51 from the control unit 21 .
＜變形例＞ 接下來，對所述的實施方式的變形例進行說明。第一實施方式以及第二實施方式中，測定感測器22測定反應塔1內的溫度，測定感測器23測定反應塔3內的溫度。並不限於此，測定感測器22亦可測定通過反應塔1的熱介質的溫度，測定感測器23亦可測定通過反應塔3的熱介質的溫度。控制部21亦可基於通過反應塔1的熱介質的溫度以及通過反應塔3的熱介質的溫度的至少一者來進行各種控制。而且，原料氣體供給部9亦可基於通過反應塔1的熱介質的溫度以及通過反應塔3的熱介質的溫度的至少一者來進行原料氣體的供給的控制。 ＜Modification＞ Next, modifications of the above-described embodiment will be described. In the first and second embodiments, the measurement sensor 22 measures the temperature in the reaction tower 1 , and the measurement sensor 23 measures the temperature in the reaction tower 3 . It is not limited thereto. The measuring sensor 22 may also measure the temperature of the heat medium passing through the reaction tower 1 , and the measuring sensor 23 may also measure the temperature of the heat medium passing through the reaction tower 3 . The control unit 21 may perform various controls based on at least one of the temperature of the heat medium passing through the reaction tower 1 and the temperature of the heat medium passing through the reaction tower 3 . Furthermore, the raw material gas supply unit 9 may control the supply of the raw material gas based on at least one of the temperature of the heat medium passing through the reaction tower 1 and the temperature of the heat medium passing through the reaction tower 3 .
第二實施方式中，測定感測器55測定增壓用反應塔51內的溫度。並不限於此，測定感測器55亦可測定通過增壓用反應塔51的熱介質的溫度。控制部21亦可基於通過反應塔1的熱介質的溫度、通過反應塔3的熱介質的溫度以及通過增壓用反應塔51的熱介質的溫度中的至少一者來進行各種控制。而且，原料氣體供給部9亦可基於通過反應塔1的熱介質的溫度、通過反應塔3的熱介質的溫度以及通過增壓用反應塔51的熱介質的溫度中的至少一者來進行原料氣體的供給的控制。In the second embodiment, the measurement sensor 55 measures the temperature in the pressure-increasing reaction tower 51 . Without being limited to this, the measurement sensor 55 may also measure the temperature of the heat medium passing through the pressurizing reaction tower 51 . The control unit 21 may perform various controls based on at least one of the temperature of the heat medium passing through the reaction tower 1 , the temperature of the heat medium passing through the reaction tower 3 , and the temperature of the heat medium passing through the pressurizing reaction tower 51 . Furthermore, the raw material gas supply unit 9 may supply the raw material based on at least one of the temperature of the heat medium passing through the reaction tower 1 , the temperature of the heat medium passing through the reaction tower 3 , and the temperature of the heat medium passing through the pressurizing reaction tower 51 . Control of gas supply.
第一實施方式以及第二實施方式中，包括兩個反應塔，但反應塔的數量亦可為一級，亦可為三級，亦可為四級，亦可為任何級。而且，第一實施方式以及第二實施方式中，對於熱介質使用了熱載體油，但熱介質亦可考慮使用溫度、使用設備等使用條件而使用熔融鹽或高壓水等適合於使用條件的物質。而且，與反應塔1進行了熱交換的熱介質的一部分亦可不經由反應塔3而被送往熱介質用熱交換器6。而且，在反應塔中進行的反應為不可逆反應的情況下，亦可不使用生成裝置100。In the first embodiment and the second embodiment, two reaction towers are included, but the number of reaction towers may be one stage, three stages, four stages, or any stage. Furthermore, in the first and second embodiments, heat carrier oil is used as the heat medium. However, the heat medium may also be a substance suitable for the use conditions such as molten salt or high-pressure water, taking into consideration the use conditions such as the use temperature and use equipment. . Furthermore, a part of the heat medium that has undergone heat exchange with the reaction tower 1 may be sent to the heat exchanger 6 for heat medium without passing through the reaction tower 3 . Furthermore, when the reaction performed in the reaction tower is an irreversible reaction, the generation device 100 does not need to be used.
而且，上文中說明的各處理亦可理解為生成裝置100的生成方法或運轉方法等。亦可理解為具有上文中說明的各處理或功能的至少一部分的生成系統或運轉系統。再者，所述部件以及處理各自可儘可能地彼此組合而構成本發明。Furthermore, each process described above can also be understood as a generation method or an operation method of the generation device 100 , or the like. It can also be understood as a production system or operation system having at least a part of each process or function described above. Furthermore, the components and processes described may each be combined with each other as much as possible to constitute the present invention.
1、3:反應塔 2、4、53:氣體冷卻用熱交換器 5:熱介質加熱器 6:熱介質用熱交換器 7、8、54:氣液分離器 9:原料氣體供給部 10:分離部 11:貯存罐 12:熱介質循環泵 13、14:調整閥 15:冷卻器 16:冷卻塔 17:冷卻水循環泵 21:控制部 22、23、55:測定感測器 31:泵 32:分離膜模組 33:真空泵 34:緩衝罐 35:壓縮機 36:分離膜 41:製品氣體路徑 51:增壓用反應塔 52:切換部 100:生成裝置 S101～S104、S201～S204:步驟 1, 3: Reaction tower 2, 4, 53: Heat exchanger for gas cooling 5: Thermal medium heater 6: Heat exchanger for heat medium 7, 8, 54: Gas-liquid separator 9: Raw gas supply department 10:Separation department 11:Storage tank 12:Heat medium circulation pump 13, 14: Adjustment valve 15:Cooler 16: Cooling tower 17: Cooling water circulation pump 21:Control Department 22, 23, 55: Measurement sensor 31:Pump 32:Separation membrane module 33: Vacuum pump 34: Buffer tank 35:Compressor 36:Separation membrane 41: Product gas path 51: Reaction tower for pressurization 52: Switching Department 100: Generating device S101～S104, S201～S204: steps
圖1是第一實施方式的生成裝置的結構圖。 圖2是表示第一實施方式的生成裝置的運轉過程的流程的流程圖。 圖3是表示第一實施方式中的通過反應塔的熱介質的溫度變化、與比較例中的通過反應塔的熱介質的溫度變化的關係的圖。 圖4是表示第一實施方式的運轉負載量與比較例的運轉負載量的關係的圖。 圖5是分離部的結構圖。 圖6是第二實施方式的生成裝置的結構圖。 圖7是表示第二實施方式的生成裝置的運轉過程的流程的流程圖。 FIG. 1 is a structural diagram of the generation device according to the first embodiment. FIG. 2 is a flowchart showing the flow of the operation process of the generation device according to the first embodiment. 3 is a diagram showing the relationship between the temperature change of the heat medium passing through the reaction tower in the first embodiment and the temperature change of the heat medium passing through the reaction tower in the comparative example. FIG. 4 is a diagram showing the relationship between the operating load amount of the first embodiment and the operating load amount of the comparative example. Fig. 5 is a structural diagram of the separation unit. FIG. 6 is a structural diagram of the generation device according to the second embodiment. FIG. 7 is a flowchart showing the flow of the operation process of the generation device according to the second embodiment.
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