TW202336171A - Polymer, curable resin composition, cured object, solid state imaging element, and image display apparatus - Google Patents

Polymer, curable resin composition, cured object, solid state imaging element, and image display apparatus Download PDF

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TW202336171A
TW202336171A TW111145563A TW111145563A TW202336171A TW 202336171 A TW202336171 A TW 202336171A TW 111145563 A TW111145563 A TW 111145563A TW 111145563 A TW111145563 A TW 111145563A TW 202336171 A TW202336171 A TW 202336171A
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堂前翔悟
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日商大阪有機化學工業股份有限公司
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    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures

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Abstract

The present invention provides a new polymer from which a cured object having a high refractive index can be produced. The polymer according to the present invention is represented by general formula (1). (In the formula, X1 represents an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group including a heterocycle in which a portion of carbon atoms forming any one of said hydrocarbon groups is substituted with a heteroatom, or an organic group in which two or more of those are bound, the four R1s each independently represent hydrogen, a specific organic group A, a specific organic group B, or an organic group C having a specific repeating structural unit, and at least one of the four R1s is an organic group C.).

Description

聚合物、硬化性樹脂組成物、硬化物、固態攝影元件、及影像顯示裝置Polymers, curable resin compositions, cured materials, solid-state imaging elements, and image display devices

本發明係關於一種嶄新的聚合物、含有前述聚合物之硬化性樹脂組成物、由前述硬化性樹脂組成物而得之硬化物、以及包含前述硬化物之固態攝影元件及影像顯示裝置。The present invention relates to a novel polymer, a curable resin composition containing the polymer, a cured product obtained from the curable resin composition, and a solid-state imaging element and an image display device containing the cured product.

透明構件係以絕緣膜、保護膜、光擷取層、隔件、及微透鏡等形式,而用作各種顯示裝置、攝影裝置、及太陽能電池等多種器件的結構構件。Transparent components are in the form of insulating films, protective films, light capture layers, spacers, and microlenses, and are used as structural components of various devices such as display devices, photography devices, and solar cells.

又,為了提升裝置性能,透明構件係被作為調整折射率的構件來使用,現正謀求高折射率之透明構件。In addition, in order to improve device performance, transparent members are used as members for adjusting the refractive index, and transparent members with high refractive index are currently being sought.

高折射率之透明構件,例如會被用於數位相機、附相機之行動電話等所搭載之固態攝影元件。作為代表性的固態攝影元件,可舉出CCD(charge coupled device)影像感測器、CMOS(complementaly metal-oxide semiconductor)影像感測器等。此等影像感測器中,以提升感度等為目的而設有微透鏡、或多個微透鏡在基板上規則排列之微透鏡陣列。現正謀求此微透鏡之高折射率、高透明性。Transparent members with a high refractive index are used, for example, in solid-state photographic components mounted on digital cameras, mobile phones with cameras, etc. Representative solid-state imaging elements include CCD (charge coupled device) image sensors, CMOS (complementaly metal-oxide semiconductor) image sensors, and the like. These image sensors are provided with microlenses or a microlens array in which multiple microlenses are regularly arranged on a substrate for the purpose of improving sensitivity. At present, high refractive index and high transparency of this microlens are being sought.

例如,專利文獻1提出了一種微透鏡陣列的製造方法,該製造方法具備以下步驟:感光層形成步驟,係於基板或顯示元件上裝設由特定感光性樹脂組成物所構成之感光層;曝光步驟,係於前述感光層之預定部分照射活性光線而使曝光部光硬化;顯影步驟,係除去前述曝光部以外之部分而形成圖型;加熱步驟,係加熱前述圖型。還揭示了藉由此製造法製得之微透鏡的折射率為1.58~1.59。For example, Patent Document 1 proposes a method for manufacturing a microlens array. The manufacturing method includes the following steps: a photosensitive layer forming step of installing a photosensitive layer composed of a specific photosensitive resin composition on a substrate or a display element; and exposure. The step is to irradiate active light to a predetermined portion of the photosensitive layer to photoharden the exposed portion; the developing step is to remove the portion other than the exposed portion to form a pattern; and the heating step is to heat the pattern. It is also revealed that the refractive index of the microlens produced by this manufacturing method is 1.58~1.59.

又,專利文獻2提出了一種微透鏡的製造方法,該製造方法具有以下步驟:將含有具特定結構之構成單位的聚合體(A)、聚合性化合物(B)、光聚合起始劑(C)、及溶劑(D)的感光性組成物塗佈於支撐體上的步驟;除去溶劑(D)的步驟;透過與目的圖型對應的遮罩圖型,對塗布所得之被膜進行曝光之步驟;顯影步驟;對所得圖型照射紫外線之步驟;加熱圖型之步驟。還揭示了藉由此製造法製得之微透鏡的折射率為1.58。Furthermore, Patent Document 2 proposes a method for manufacturing a microlens, which method has the following steps: combining a polymer (A) containing a structural unit with a specific structure, a polymerizable compound (B), and a photopolymerization initiator (C). ), and a photosensitive composition of solvent (D) on the support; a step of removing the solvent (D); and a step of exposing the coated film through a mask pattern corresponding to the target pattern. ; Development step; step of irradiating the obtained pattern with ultraviolet rays; step of heating the pattern. It is also revealed that the refractive index of the microlens produced by this manufacturing method is 1.58.

[先行技術文獻] [專利文獻] [專利文獻1]日本特開2011-002655號公報 [專利文獻2]日本特開2009-251537號公報 [Advanced technical documents] [Patent Document] [Patent Document 1] Japanese Patent Application Publication No. 2011-002655 [Patent Document 2] Japanese Patent Application Publication No. 2009-251537

發明概要 [發明欲解決之課題] 專利文獻1及專利文獻2所記載之微透鏡係藉由負型光阻劑製造,且作為藉由負型光阻劑所製造之微透鏡,具有一定程度的高折射率。但是,更加提升感測器感度等要求正逐漸提高,現正謀求具有更高折射率之硬化物。又,專利文獻1及專利文獻2所記載之微透鏡的製造方法中,皆在顯影步驟使用鹼性顯影液中顯影速度相對較快的TMAH(四甲基氫氧化銨)水溶液。但是,在製造半導體、LCD(Liquid crystal display)等時,大多還是使用氫氧化鉀、碳酸鈉等顯影速度相對較慢的弱鹼性顯影液。因此,在此等製品搭載微透鏡等硬化物的情況、或是與此等製品一體化地製造微透鏡等硬化物的情況中,若是使用弱鹼顯影液替代TMAH,則會有顯影時間變長,生產性下降的疑慮。 Summary of the invention [Problem to be solved by the invention] The microlenses described in Patent Document 1 and Patent Document 2 are manufactured using a negative photoresist, and have a certain high refractive index as microlenses manufactured using a negative photoresist. However, requirements for further improving sensor sensitivity are gradually increasing, and hardened materials with higher refractive index are now being sought. In addition, in the manufacturing methods of microlenses described in Patent Document 1 and Patent Document 2, a TMAH (tetramethylammonium hydroxide) aqueous solution with a relatively fast development speed in an alkaline developer is used in the development step. However, when manufacturing semiconductors, LCD (Liquid crystal display), etc., weakly alkaline developers such as potassium hydroxide and sodium carbonate, which develop relatively slowly, are mostly used. Therefore, when these products are equipped with hardened materials such as microlenses, or when hardened materials such as microlenses are manufactured integrally with these products, if a weak alkali developer is used instead of TMAH, the development time may become longer. , concerns about productivity decline.

本發明的目的之一係提供一種嶄新的聚合物,其可製作高折射率之硬化物。又,本發明的目的之一係提供一種嶄新的聚合物,其在使用弱鹼性顯影液時也可在短時間內顯影,且可製作具有高折射率之硬化膜。進一步而言,本發明的目的之一係提供一種含有前述聚合物之硬化性樹脂組成物、由前述硬化性樹脂組成物而得之硬化物、以及包含前述硬化物之固態攝影元件及影像顯示裝置。One of the objects of the present invention is to provide a new polymer that can produce hardened materials with high refractive index. Furthermore, one of the objects of the present invention is to provide a novel polymer that can be developed in a short time even when using a weakly alkaline developer and can produce a cured film with a high refractive index. Furthermore, one object of the present invention is to provide a curable resin composition containing the aforementioned polymer, a cured product obtained from the aforementioned curable resin composition, and a solid-state imaging element and an image display device containing the aforementioned cured product. .

本案發明人等為了解決前述課題進行精闢研討的結果,發現藉由使用下述聚合物、及含有該聚合物之硬化性樹脂組成物可達成上述目的,並完成了本發明。As a result of intensive research to solve the above-mentioned problems, the inventors of the present invention found that the above-mentioned object can be achieved by using the following polymer and a curable resin composition containing the polymer, and completed the present invention.

本發明係關於下述通式(1)所示聚合物: [化學式1] (式中,X 1為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代;4個R 1各自獨立為氫、下述通式(2-1)或(2-2)所示有機基A、下述通式(3)所示有機基B、或者具有重複結構單元之有機基C,該重複結構單元係選自於由下述通式(4-1)及/或(4-2)所示重複結構單元、下述通式(5-1)及/或(5-2)所示重複結構單元、下述通式(6-1)及/或(6-2)所示重複結構單元、下述通式(7-1)及/或(7-2)所示重複結構單元、下述通式(8-1)及/或(8-2)所示重複結構單元、以及下述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上,4個R 1之中至少1個為前述有機基C); [化學式2] (式中,R 2為碳數15以下之有機基,亦可與羥基所鍵結之碳原子及其相鄰碳原子共同形成環); [化學式3] (式中,R 3為碳數15以下之有機基); [化學式4] (式中,R 4為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 2為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式5] (式中,R 5為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 3為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式6] (式中,R 6為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 7為碳數15以下之有機基;X 4為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式7] (式中,R 8為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 5為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式8] (式中,R 9為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 10為碳數15以下之有機基;X 6為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式9] (式中,R 11為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 12及R 13分別獨立為碳數15以下之有機基;X 7為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代)。 The present invention relates to a polymer represented by the following general formula (1): [Chemical Formula 1] (In the formula , A part of the carbon atoms constituting the aforementioned hydrocarbon group are substituted by heteroatoms; each of the four R 1s is independently hydrogen, the organic group A represented by the following general formula (2-1) or (2-2), the following general formula (3 ) represented by the organic group B, or the organic group C having a repeating structural unit, the repeating structural unit is selected from the repeating structural units represented by the following general formulas (4-1) and/or (4-2), the following The repeating structural unit represented by the following general formula (5-1) and/or (5-2), the repeating structural unit represented by the following general formula (6-1) and/or (6-2), the following general formula ( Repeating structural units represented by 7-1) and/or (7-2), repeating structural units represented by the following general formula (8-1) and/or (8-2), and the following general formula (9-1 ) and/or (9-2), at least one of the groups of repeating structural units represented by (9-2), at least one of the four R 1s is the aforementioned organic group C); [Chemical Formula 2] (In the formula, R 2 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom to which the hydroxyl group is bonded and its adjacent carbon atoms); [Chemical Formula 3] (In the formula, R 3 is an organic group with less than 15 carbon atoms); [Chemical Formula 4] (In the formula, R 4 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bonded to the oxygen atom and its adjacent carbon atoms; X 2 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 5 ] (In the formula, R 5 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 3 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 6 ] (In the formula, R 6 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 7 is an organic group with less than 15 carbon atoms; X 4 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 7] (In the formula, R 8 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 5 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 8 ] (In the formula, R 9 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 10 is an organic group with less than 15 carbon atoms; X 6 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 9] (In the formula, R 11 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 12 and R 13 are independently an organic group with less than 15 carbon atoms. group ; A part of the carbon atoms of the aforementioned hydrocarbon group is replaced by a heteroatom).

前述有機基C宜具有選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、以及前述通式(6-1)及/或(6-2)所示重複結構單元所構成群組中之1種以上重複結構單元。The aforementioned organic group C preferably has a repeating structural unit selected from the group consisting of repeating structural units represented by the aforementioned general formulas (4-1) and/or (4-2) and represented by the aforementioned general formulas (5-1) and/or (5-2). Repeating structural units, and one or more repeating structural units in the group consisting of the repeating structural units represented by the aforementioned general formulas (6-1) and/or (6-2).

前述聚合物宜具有羧基。The aforementioned polymer preferably has a carboxyl group.

前述R 2、前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11宜分別獨立為包含(甲基)丙烯醯氧基之有機基、包含芳香族烴基之有機基、包含烯丙基之有機基、包含矽基之有機基、或包含環狀醚基之有機基。 The aforementioned R 2 , the aforementioned R 4 , the aforementioned R 5 , the aforementioned R 6 , the aforementioned R 8 , the aforementioned R 9 , and the aforementioned R 11 are preferably each independently an organic group containing a (meth)acryloxy group or an aromatic hydrocarbon group. Organic group, organic group containing allyl group, organic group containing silicon group, or organic group containing cyclic ether group.

前述R 3、前述R 7、前述R 10、前述R 12、及前述R 13宜分別獨立為包含環狀醚基之有機基、包含(甲基)丙烯醯氧基之有機基、或包含芳香族烴基之有機基。 The aforementioned R 3 , the aforementioned R 7 , the aforementioned R 10 , the aforementioned R 12 , and the aforementioned R 13 are preferably each independently an organic group containing a cyclic ether group, an organic group containing a (meth)acryloxy group, or an aromatic group. Organic radical of hydrocarbon group.

前述X 1、前述X 2、前述X 3、前述X 4、前述X 5、前述X 6、及前述X 7宜分別獨立為芳香族烴基。 The aforementioned X 1 , the aforementioned X 2 , the aforementioned X 3 , the aforementioned X 4 , the aforementioned X 5 , the aforementioned X 6 , and the aforementioned X 7 are preferably each independently an aromatic hydrocarbon group.

前述聚合物宜1分子中含有合計3~300個重複結構單元,該重複結構單元係選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、前述通式(6-1)及/或(6-2)所示重複結構單元、前述通式(7-1)及/或(7-2)所示重複結構單元、前述通式(8-1)及/或(8-2)所示重複結構單元、以及前述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上。The aforementioned polymer preferably contains a total of 3 to 300 repeating structural units per molecule, and the repeating structural units are selected from the group consisting of repeating structural units represented by the aforementioned general formulas (4-1) and/or (4-2), the aforementioned general formulas The repeating structural unit represented by formula (5-1) and/or (5-2), the repeating structural unit represented by the aforementioned general formula (6-1) and/or (6-2), the aforementioned general formula (7-1) and/or the repeating structural unit represented by (7-2), the repeating structural unit represented by the aforementioned general formula (8-1) and/or (8-2), and the aforementioned general formula (9-1) and/or (9 -2) More than one type in the group consisting of the repeating structural units shown.

前述聚合物之酸價宜為20~120mgKOH/g。The acid value of the aforementioned polymer is preferably 20 to 120 mgKOH/g.

前述聚合物之雙鍵當量宜為200~5000。The double bond equivalent of the aforementioned polymer is preferably 200 to 5000.

前述聚合物之重量平均分子量宜為1500~100000。The weight average molecular weight of the aforementioned polymer is preferably 1,500 to 100,000.

前述聚合物的原料宜包含四羧酸及/或四羧酸二酐、含羥基化合物、以及含環氧基化合物。The raw materials of the aforementioned polymer preferably include tetracarboxylic acid and/or tetracarboxylic dianhydride, hydroxyl-containing compounds, and epoxy group-containing compounds.

又,本發明係關於至少含有前述聚合物、聚合性單體、及聚合起始劑之硬化性樹脂組成物。Furthermore, the present invention relates to a curable resin composition containing at least the aforementioned polymer, a polymerizable monomer, and a polymerization initiator.

前述硬化性樹脂組成物宜為負型光阻劑材料。The aforementioned curable resin composition is preferably a negative photoresist material.

又,本發明係關於由前述硬化性樹脂組成物而得之硬化物。Furthermore, the present invention relates to a cured product obtained from the aforementioned curable resin composition.

前述硬化物宜為透鏡、光間隔件、隔壁材料、層間絕緣膜材料、保護膜材料、光波導材料、或平坦化膜材料。The aforementioned hardened material is preferably a lens, an optical spacer, a partition wall material, an interlayer insulating film material, a protective film material, an optical waveguide material, or a planarizing film material.

進一步而言,本發明係關於包含前述硬化物之固態攝影元件或影像顯示裝置。Furthermore, the present invention relates to a solid-state imaging element or an image display device including the aforementioned hardened material.

[發明效果] 若使用本發明之聚合物,藉由其特徴結構可製作高折射率之硬化物,且進一步可製作在使用弱鹼性顯影液時亦可在短時間內顯影的高折射率硬化膜(例如,微透鏡)。又,使用本發明之聚合物而得之硬化物,其透明性高,且即便厚度厚其透明性仍良好。又,本發明之聚合物可作為負型光阻劑材料所含之負型阻劑聚合物來使用,因此使用本發明之聚合物的阻劑材料容易厚膜化,且可形成透明性良好的圖型。 [Effects of the invention] If the polymer of the present invention is used, a cured product with a high refractive index can be produced due to its characteristic structure, and a cured film with a high refractive index that can be developed in a short time even when using a weakly alkaline developer can be produced (for example, microlens). In addition, the cured product obtained by using the polymer of the present invention has high transparency, and the transparency is good even if the thickness is thick. In addition, the polymer of the present invention can be used as a negative resist polymer contained in a negative photoresist material. Therefore, the resist material using the polymer of the present invention can be easily thickened and can form a film with good transparency. graphics.

本發明之聚合物具有前述有機基C,且該有機基C具有選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、以及前述通式(6-1)及/或(6-2)所示重複結構單元所構成群組中之1種以上重複結構單元時,亦即,其為一分子內具有多數分支點的樹枝狀高分子(超分支聚合物)時,可獲得更加優異之前述效果。The polymer of the present invention has the aforementioned organic group C, and the organic group C has a repeating structural unit selected from the aforementioned general formula (4-1) and/or (4-2), the aforementioned general formula (5-1 ) and/or (5-2), and more than one type of repeating structural unit in the group consisting of the repeating structural units represented by the aforementioned general formula (6-1) and/or (6-2) , that is, when it is a dendritic polymer (hyperbranched polymer) having many branch points in one molecule, the above-mentioned effect can be obtained even more excellently.

本發明之聚合物係下述通式(1)所示者: [化學式10] (式中,X 1為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代;4個R 1各自獨立為氫、下述通式(2-1)或(2-2)所示有機基A、下述通式(3)所示有機基B、或者具有重複結構單元之有機基C,該重複結構單元係選自於由下述通式(4-1)及/或(4-2)所示重複結構單元、下述通式(5-1)及/或(5-2)所示重複結構單元、下述通式(6-1)及/或(6-2)所示重複結構單元、下述通式(7-1)及/或(7-2)所示重複結構單元、下述通式(8-1)及/或(8-2)所示重複結構單元、以及下述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上,4個R 1之中至少1個為前述有機基C); [化學式11] (式中,R 2為碳數15以下之有機基,亦可與羥基所鍵結之碳原子及其相鄰碳原子共同形成環); [化學式12] (式中,R 3為碳數15以下之有機基); [化學式13] (式中,R 4為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 2為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式14] (式中,R 5為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 3為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式15] (式中,R 6為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 7為碳數15以下之有機基;X 4為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式16] (式中,R 8為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 5為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式17] (式中,R 9為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 10為碳數15以下之有機基;X 6為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式18] (式中,R 11為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 12及R 13分別獨立為碳數15以下之有機基;X 7為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代)。 The polymer of the present invention is represented by the following general formula (1): [Chemical Formula 10] (In the formula , A part of the carbon atoms constituting the aforementioned hydrocarbon group are substituted by heteroatoms; each of the four R 1s is independently hydrogen, the organic group A represented by the following general formula (2-1) or (2-2), the following general formula (3 ) represented by the organic group B, or the organic group C having a repeating structural unit, the repeating structural unit is selected from the repeating structural units represented by the following general formulas (4-1) and/or (4-2), the following The repeating structural unit represented by the following general formula (5-1) and/or (5-2), the repeating structural unit represented by the following general formula (6-1) and/or (6-2), the following general formula ( Repeating structural units represented by 7-1) and/or (7-2), repeating structural units represented by the following general formula (8-1) and/or (8-2), and the following general formula (9-1 ) and/or (9-2), at least one of the group of repeating structural units represented by (9-2), at least one of the four R 1 is the aforementioned organic group C); [Chemical Formula 11] (In the formula, R 2 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom to which the hydroxyl group is bonded and its adjacent carbon atoms); [Chemical Formula 12] (In the formula, R 3 is an organic group with less than 15 carbon atoms); [Chemical Formula 13] (In the formula, R 4 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bonded to the oxygen atom and its adjacent carbon atoms; X 2 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 14 ] (In the formula, R 5 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 3 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 15 ] (In the formula, R 6 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 7 is an organic group with less than 15 carbon atoms; X 4 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 16] (In the formula, R 8 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 5 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 17 ] (In the formula, R 9 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 10 is an organic group with less than 15 carbon atoms; X 6 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 18] (In the formula, R 11 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 12 and R 13 are independently an organic group with less than 15 carbon atoms. group ; A part of the carbon atoms of the aforementioned hydrocarbon group is replaced by a heteroatom).

有機基C中,作為重複結構單元所示之各結構分別存在2種結構。例如,通式(4-1)及(4-2)所示結構可根據生成重複結構中之酯鍵時的起始物質、以及環狀化合物之開環反應時的開環方向等來選擇。具體而言,若為源自羧酸與環氧之加成反應的結構,會根據其開環方向成為通式(4-1)或式(4-2)之結構。通式(4-1)或式(4-2)的比率會根據反應條件等而變動,但一般而言多為兩方併存。又,若源自酸酐與醇之加成反應會成為通式(4-1)之結構。關於作為有機基C之其他通式中所示結構、有機基A中通式(2-1)及(2-2)所示結構亦相同。In the organic group C, each structure shown as a repeating structural unit exists in two structures. For example, the structures represented by the general formulas (4-1) and (4-2) can be selected based on the starting material when generating the ester bond in the repeating structure, the ring-opening direction during the ring-opening reaction of the cyclic compound, and the like. Specifically, if it is a structure derived from the addition reaction of carboxylic acid and epoxy, it will have a structure of general formula (4-1) or formula (4-2) depending on its ring-opening direction. The ratio of the general formula (4-1) or the formula (4-2) changes depending on the reaction conditions, etc., but generally both of them coexist in many cases. Moreover, if it is derived from the addition reaction of an acid anhydride and an alcohol, it will become the structure of general formula (4-1). The same applies to the structures represented by other general formulas as the organic group C and the structures represented by the general formulas (2-1) and (2-2) of the organic group A.

本發明中,(甲基)丙烯酸((meth)acrylic)意指丙烯酸(acrylic)或甲基丙烯酸(methacrylic);(甲基)丙烯醯基((meth)acryloyl)意指丙烯醯基(acryloyl)或甲基丙烯醯基(methacryloyl);(甲基)丙烯酸((meth)acrylic acid)意指丙烯酸(acrylic acid)或甲基丙烯酸(methacrylic acid);(甲基)丙烯酸酯((meth)acrylate)意指丙烯酸酯(acrylate)或甲基丙烯酸酯(methacrylate)。又,前述R 2~R 13之碳數在具有取代基時亦包含取代基之碳數。 In the present invention, (meth)acrylic ((meth)acrylic) means acrylic or methacrylic; (meth)acryloyl ((meth)acryloyl) means acryloyl. Or methacryloyl; (meth)acrylic acid means acrylic acid or methacrylic acid; (meth)acrylate Means acrylate or methacrylate. In addition, the carbon number of the aforementioned R 2 to R 13 also includes the carbon number of the substituent when it has a substituent.

前述通式(1)中,前述X 1~X 7分別獨立為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代。前述芳香族烴基無特別限制,可舉例如:苯環、萘環、聯苯環、蒽環、菲環、芘環、茀環、苊環、乙烷合萘環、及此等中之2種以上鍵結而成之芳香環等。前述脂環式飽和烴基及脂環式不飽和烴基並無特別限制,可舉例如構成環之碳數為6~20者,宜為構成環之碳數為6~12者,亦可為橋聯環或縮合環。作為前述雜環之雜原子,可舉例如氧原子、氮原子、及硫原子等,此等雜原子可包含1種或2種以上。前述烴基或前述有機基在不損害本發明效果之範圍內,亦可具有各種取代基(例如,鹵素基、羥基、胺基、烷基、烯基、烷氧基、及矽基等)。從獲得具有高折射率之硬化膜的觀點來看、及從獲得使用弱鹼性顯影液時亦可在短時間內顯影之硬化性樹脂組成物的觀點來看,前述X 1~X 7宜為芳香族烴基,較佳為分別獨立為下述任一芳香族烴基。 [化學式19] In the aforementioned general formula (1), the aforementioned X 1 ~ In the organic group formed by the bond, part of the carbon atoms constituting the hydrocarbon group in the heterocyclic ring are replaced by heteroatoms. The aforementioned aromatic hydrocarbon group is not particularly limited, and examples thereof include benzene ring, naphthalene ring, biphenyl ring, anthracene ring, phenanthrene ring, pyrene ring, fentanyl ring, acenaphthylene ring, ethane naphthalene ring, and two of these. Aromatic rings formed by the above bonds, etc. The aforesaid alicyclic saturated hydrocarbon group and alicyclic unsaturated hydrocarbon group are not particularly limited. For example, the number of carbon atoms constituting the ring is 6 to 20. Preferably, the number of carbon atoms constituting the ring is 6 to 12. They may also be bridged. ring or condensed ring. Examples of the heteroatoms of the heterocyclic ring include oxygen atoms, nitrogen atoms, and sulfur atoms, and these heteroatoms may include one type or two or more types. The above-mentioned hydrocarbon group or the above-mentioned organic group may also have various substituents (for example, halogen group, hydroxyl group, amino group, alkyl group, alkenyl group, alkoxy group, and silicon group, etc.) within the scope that does not impair the effects of the present invention. From the viewpoint of obtaining a cured film having a high refractive index, and from the viewpoint of obtaining a curable resin composition that can be developed in a short time using a weakly alkaline developer, the above X 1 to X 7 are preferably The aromatic hydrocarbon group is preferably any one of the following aromatic hydrocarbon groups independently. [Chemical formula 19]

前述通式(1)中,前述R 2~R 13分別獨立為碳數15以下之有機基,宜為碳數2~12之有機基,較佳為碳數4~10之有機基。前述R 2亦可與羥基所鍵結之碳原子及其相鄰碳原子共同形成環。又,前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11分別亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環。作為前述有機基,可舉例如:直鏈狀或支鏈狀的脂肪族飽和或不飽和烴基、脂環式飽和或不飽和烴基(包含橋聯環、縮合環)、芳香族烴基(例如,苯環、萘環、聯苯環、蒽環、及菲環等)、構成前述烴基之碳原子的一部分被雜原子(例如,氧原子、氮原子、及硫原子等)取代之有機基、及此等中之2種以上鍵結而成之有機基。又,前述烴基或前述有機基亦可具有各種取代基(例如,鹵素基、羥基、羧基、胺基、烷基、烯基、烷氧基、芳基、丙烯醯氧基、甲基丙烯醯氧基、氧雜環丁烷基、及矽基等)、官能基(例如,酯鍵、醯胺鍵、醚鍵、硫醚鍵、胺甲酸乙酯鍵、及矽氧烷鍵等)。 In the aforementioned general formula (1), the aforementioned R 2 to R 13 are each independently an organic group having a carbon number of 15 or less, preferably an organic group having a carbon number of 2 to 12, and more preferably an organic group having a carbon number of 4 to 10. The aforementioned R 2 may also form a ring together with the carbon atom to which the hydroxyl group is bonded and its adjacent carbon atoms. Furthermore, the aforementioned R 4 , the aforementioned R 5 , the aforementioned R 6 , the aforementioned R 8 , the aforementioned R 9 , and the aforementioned R 11 may respectively form a ring together with the carbon atom to which the oxygen atom is bonded and its adjacent carbon atoms. Examples of the organic group include linear or branched aliphatic saturated or unsaturated hydrocarbon groups, alicyclic saturated or unsaturated hydrocarbon groups (including bridged rings and condensed rings), aromatic hydrocarbon groups (for example, benzene ring, naphthalene ring, biphenyl ring, anthracene ring, and phenanthrene ring, etc.), an organic group in which part of the carbon atoms constituting the aforementioned hydrocarbon group is substituted by a heteroatom (such as an oxygen atom, a nitrogen atom, a sulfur atom, etc.), and this An organic radical formed by the bonding of two or more kinds of them. In addition, the aforementioned hydrocarbon group or the aforementioned organic group may have various substituents (for example, halogen group, hydroxyl group, carboxyl group, amino group, alkyl group, alkenyl group, alkoxy group, aryl group, acryloxy group, methacryloxy group group, oxetanyl group, and silicon group, etc.), functional groups (for example, ester bond, amide bond, ether bond, thioether bond, urethane bond, and siloxane bond, etc.).

從獲得具有高折射率之硬化膜的觀點來看,前述R 2、前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11宜分別獨立為包含(甲基)丙烯醯氧基之有機基、包含芳香族烴基之有機基、包含烯丙基之有機基、包含矽基之有機基、及包含環狀醚基之有機基,較佳為包含(甲基)丙烯醯氧基之有機基、或包含芳香族烴基之有機基,更佳為(甲基)丙烯醯氧甲基、或苯氧甲基。 From the viewpoint of obtaining a cured film having a high refractive index, it is preferred that the above R 2 , the above R 4 , the above R 5 , the above R 6 , the above R 8 , the above R 9 , and the above R 11 each independently include (methyl ) Organic groups containing acryloyloxy groups, organic groups containing aromatic hydrocarbon groups, organic groups containing allyl groups, organic groups containing silicon groups, and organic groups containing cyclic ether groups, preferably containing (methyl) The organic group of acryloxy group or the organic group containing aromatic hydrocarbon group is more preferably (meth)acryloxymethyl group or phenoxymethyl group.

又,從獲得具有高折射率之硬化膜的觀點、及所得硬化膜之硬度的觀點來看,前述通式(2-1)或(2-2)所示有機基A宜為下述任一有機基。特別是,從使所得硬化膜之硬度變高的觀點來看,有機基A宜具有交聯性基。從使所得硬化膜之折射率變高的觀點來看,有機基A宜具有芳香族烴基。 [化學式20] Furthermore, from the viewpoint of obtaining a cured film having a high refractive index and the hardness of the obtained cured film, the organic group A represented by the general formula (2-1) or (2-2) is preferably any of the following: Organic based. In particular, from the viewpoint of increasing the hardness of the obtained cured film, the organic group A preferably has a crosslinking group. From the viewpoint of making the refractive index of the obtained cured film high, the organic group A preferably has an aromatic hydrocarbon group. [Chemical formula 20]

又,從獲得具有高折射率之硬化膜的觀點、及所得硬化膜之硬度的觀點來看,前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11宜分別獨立為下述任一有機基(此外,前述各通式中,前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環時,係包含環結構來記載)。特別是,從使所得硬化膜之硬度提高的觀點來看,前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11宜具有交聯性基。從使所得硬化膜之折射率提高的觀點來看,前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11宜具有芳香族烴基。 [化學式21] Moreover, from the viewpoint of obtaining a cured film having a high refractive index and the hardness of the obtained cured film, the above R 4 , the above R 5 , the above R 6 , the above R 8 , the above R 9 , and the above R 11 are suitable. Each independently represents any of the following organic groups (in addition, in each of the aforementioned general formulas, the aforementioned R 4 , the aforementioned R 5 , the aforementioned R 6 , the aforementioned R 8 , the aforementioned R 9 , and the aforementioned R 11 are bonded to the carbon atoms of oxygen atoms. When an atom and its adjacent carbon atoms together form a ring, it is recorded as including the ring structure). In particular, from the viewpoint of improving the hardness of the obtained cured film, it is preferable that the above R 4 , the above R 5 , the above R 6 , the above R 8 , the above R 9 , and the above R 11 have a crosslinking group. From the viewpoint of improving the refractive index of the obtained cured film, it is preferable that the aforementioned R 4 , the aforementioned R 5 , the aforementioned R 6 , the aforementioned R 8 , the aforementioned R 9 , and the aforementioned R 11 have an aromatic hydrocarbon group. [Chemical formula 21]

從獲得具有高折射率之硬化膜的觀點來看,前述R 3、前述R 7、前述R 10、前述R 12、及前述R 13宜分別獨立為包含環狀醚基之有機基、包含(甲基)丙烯醯氧基之有機基、或包含芳香族烴基之有機基,較佳為分別獨立為下述任一有機基。特別是,從使所得硬化膜之硬度提高的觀點來看,前述R 3、前述R 7、前述R 10、前述R 12、及前述R 13宜具有交聯性基。從使所得硬化膜之折射率提高的觀點來看,前述R 3、前述R 7、前述R 10、前述R 12、及前述R 13宜具有芳香族烴基。 [化學式22] From the viewpoint of obtaining a cured film having a high refractive index, it is preferred that the aforementioned R 3 , the aforementioned R 7 , the aforementioned R 10 , the aforementioned R 12 , and the aforementioned R 13 are each independently an organic group containing a cyclic ether group, including (methane (yl) acryloxy group, or an organic group containing an aromatic hydrocarbon group, preferably each independently is any one of the following organic groups. In particular, from the viewpoint of improving the hardness of the obtained cured film, it is preferable that the above R 3 , the above R 7 , the above R 10 , the above R 12 , and the above R 13 have a crosslinking group. From the viewpoint of improving the refractive index of the obtained cured film, it is preferable that the above R 3 , the above R 7 , the above R 10 , the above R 12 , and the above R 13 have an aromatic hydrocarbon group. [Chemical formula 22]

前述通式(1)中,從獲得使用弱鹼性顯影液時亦可在短時間內顯影之硬化膜的觀點(以下稱為顯影性的觀點)來看,前述有機基C宜具有選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、以及前述通式(6-1)及/或(6-2)所示重複結構單元所構成群組中之1種以上重複結構單元。亦即,前述通式(1)所示聚合物宜為一分子內具有多數分支點的樹枝狀高分子(超分支聚合物)。In the general formula (1), from the viewpoint of obtaining a cured film that can be developed in a short time even when a weakly alkaline developer is used (hereinafter referred to as the viewpoint of developability), the organic group C preferably has a compound selected from the group consisting of: The repeating structural unit represented by the aforementioned general formula (4-1) and/or (4-2), the repeating structural unit represented by the aforementioned general formula (5-1) and/or (5-2), and the aforementioned general formula ( One or more repeating structural units in the group consisting of the repeating structural units shown in 6-1) and/or (6-2). That is, the polymer represented by the general formula (1) is preferably a dendritic polymer (hyperbranched polymer) having a plurality of branch points in one molecule.

前述通式(1)中,4個R 1之中至少1個為前述有機基C,從顯影性的觀點來看,4個R 1之中宜2個以上的R 1為前述有機基C,較佳為3個以上的R 1為前述有機基C,更佳為4個R 1全部為前述有機基C。 In the aforementioned general formula (1), at least one of the four R 1s is the aforementioned organic group C. From the viewpoint of developability , it is preferable that at least 2 or more of the four R 1s are the aforementioned organic group C. Preferably, three or more R 1 are the aforementioned organic groups C, and more preferably, all four R 1 are the aforementioned organic groups C.

從顯影性的觀點來看,前述聚合物宜1分子中含有合計3~300個重複結構單元,該重複結構單元係選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、前述通式(6-1)及/或(6-2)所示重複結構單元、前述通式(7-1)及/或(7-2)所示重複結構單元、前述通式(8-1)及/或(8-2)所示重複結構單元、以及前述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上,較佳為1分子中含有合計3~150個,更佳為合計3~100個。重複結構單元的數量可依據所使用之原材料的量(比率)、反應條件來調整。又,重複結構單元的數量可用製造聚合物時所使用原料的分子量、所預測之聚合物的結構、及聚合物的分子量來決定。決定重複結構單元的數量之具體方法記載於後述實施例中。From the viewpoint of developability, the polymer preferably contains a total of 3 to 300 repeating structural units per molecule, and the repeating structural units are selected from the group consisting of the aforementioned general formulas (4-1) and/or (4-2). The repeating structural unit shown, the repeating structural unit represented by the aforementioned general formula (5-1) and/or (5-2), the repeating structural unit represented by the aforementioned general formula (6-1) and/or (6-2), The repeating structural unit represented by the aforementioned general formula (7-1) and/or (7-2), the repeating structural unit represented by the aforementioned general formula (8-1) and/or (8-2), and the aforementioned general formula (9 -1) and/or (9-2) contains at least one type of the group of repeating structural units, preferably a total of 3 to 150 units per molecule, more preferably a total of 3 to 100 units. The number of repeating structural units can be adjusted according to the amount (ratio) of raw materials used and reaction conditions. In addition, the number of repeating structural units can be determined by the molecular weight of the raw materials used when producing the polymer, the predicted structure of the polymer, and the molecular weight of the polymer. Specific methods for determining the number of repeating structural units are described in the Examples described below.

前述聚合物宜在其結構中具有至少1個羧基。具體而言可舉出前述通式(1)中,至少1個R 1為氫之態樣、至少1個前述有機基A具有羧基之態樣、至少1個前述有機基B具有羧基之態樣、至少1個前述有機基C具有羧基之態樣、及組合此等態樣之態樣。 The aforementioned polymer preferably has at least one carboxyl group in its structure. Specifically, in the general formula (1), at least one R 1 is hydrogen, at least one organic group A has a carboxyl group, and at least one organic group B has a carboxyl group. , an aspect in which at least one of the aforementioned organic groups C has a carboxyl group, and an aspect in which these aspects are combined.

前述有機基C所具有之末端官能基無特別限制,可舉例如:於末端具有羧基之有機基、於末端具有(甲基)丙烯醯氧基等乙烯性不飽和基之有機基、於末端具有芳香族烴基之有機基、及於末端具有環狀醚基之有機基等。The terminal functional group of the aforementioned organic group C is not particularly limited, and examples thereof include: an organic group having a carboxyl group at the terminal; an organic group having an ethylenically unsaturated group such as a (meth)acryloxy group at the terminal; Organic groups such as aromatic hydrocarbon groups, organic groups having a cyclic ether group at the end, etc.

前述聚合物之製造方法無特別限制,例如可藉由使包含下述者之單體組成物聚合之方法來合成:1種或2種以上之 (甲基)丙烯酸環氧丙基酯、環氧丙基苯基醚等含環氧基化合物;1種或2種以上之含羥基化合物;四羧酸及/或四羧酸二酐。詳細而言,屬反應起始劑之含羥基化合物其羥基會與四羧酸二酐之酸酐基反應,並在生成酯的同時生成羧基,接下來,生成之羧基及/或四羧酸之羧基會與含環氧基化合物之環氧基反應進一步生成酯,與此同時生成羥基,生成之羥基會與別的酸酐基或羧基反應。藉由此等反應依序發生之逐次反應可獲得前述聚合物。此外,四羧酸二酐中所存在之已開環的游離二質子酸與環氧基反應的情況亦可。聚合反應中亦可使用下述等催化劑:鹼金屬化合物、有機磷化合物、三級胺、四級銨鹽、環狀胺類、及咪唑類。The method for producing the aforementioned polymer is not particularly limited. For example, it can be synthesized by polymerizing a monomer composition containing one or more types of glycidyl (meth)acrylate, epoxy Epoxy group-containing compounds such as propyl phenyl ether; one or more hydroxyl-containing compounds; tetracarboxylic acid and/or tetracarboxylic dianhydride. Specifically, the hydroxyl group of the hydroxyl-containing compound that is the reaction initiator will react with the acid anhydride group of tetracarboxylic dianhydride, and generate a carboxyl group while generating an ester. Next, the generated carboxyl group and/or the carboxyl group of the tetracarboxylic acid It will react with the epoxy group of the epoxy-containing compound to further generate ester, and at the same time generate a hydroxyl group, which will react with other anhydride groups or carboxyl groups. The aforementioned polymer can be obtained by sequential reactions in which these reactions occur sequentially. In addition, the ring-opened free diprotic acid present in the tetracarboxylic dianhydride may react with the epoxy group. The following catalysts can also be used in the polymerization reaction: alkali metal compounds, organic phosphorus compounds, tertiary amines, quaternary ammonium salts, cyclic amines, and imidazoles.

前述聚合物之重量平均分子量無特別限制,但從顯影性的觀點來看,宜為1500~100000,較佳為1500~50000。前述重量平均分子量係使用凝膠滲透層析法(GPC)所測定並以聚苯乙烯換算的值,且為遵循JIS 7252-4所測定之值。於後述實施例中記載之重量平均分子量亦為遵循本項記載所求得之值。The weight average molecular weight of the aforementioned polymer is not particularly limited, but from the viewpoint of developability, it is preferably 1,500 to 100,000, more preferably 1,500 to 50,000. The weight average molecular weight mentioned above is a value measured using gel permeation chromatography (GPC) and converted to polystyrene, and is a value measured in accordance with JIS 7252-4. The weight average molecular weights described in the examples described below are also values obtained in accordance with this description.

前述聚合物之酸價無特別限制,但從顯影性的觀點來看,宜為20~120mgKOH/g,較佳為40~100mgKOH/g。The acid value of the aforementioned polymer is not particularly limited, but from the viewpoint of developability, it is preferably 20 to 120 mgKOH/g, and more preferably 40 to 100 mgKOH/g.

前述聚合物之雙鍵當量無特別限制,但作為一個例子,可設為200~5000。特別是用於微透鏡時,從形成良好的透鏡形狀的觀點來看,前述聚合物之雙鍵當量宜為500~4000,較佳為1000~3000。The double bond equivalent of the aforementioned polymer is not particularly limited, but as an example, it can be set to 200 to 5,000. Especially when used in microlenses, from the viewpoint of forming a good lens shape, the double bond equivalent of the polymer is preferably 500 to 4000, and more preferably 1000 to 3000.

本發明之硬化性樹脂組成物至少含有本發明之前述聚合物、聚合性單體、及聚合起始劑。聚合起始劑可為光聚合起始劑,亦可為熱聚合起始劑,因應硬化方法適宜選擇即可。The curable resin composition of the present invention contains at least the aforementioned polymer of the present invention, a polymerizable monomer, and a polymerization initiator. The polymerization initiator can be a photopolymerization initiator or a thermal polymerization initiator, which can be appropriately selected according to the hardening method.

前述硬化性樹脂組成物亦可包含本發明之前述聚合物以外的公知鹼溶性樹脂。前述硬化性樹脂組成物包含本發明之前述聚合物及鹼溶性樹脂時,從顯影性的觀點來看,本發明之前述聚合物的含量,相對於前述聚合物與鹼溶性樹脂整體宜為70質量%以上,較佳為80質量%以上,更佳為90質量%以上。The curable resin composition may contain known alkali-soluble resins other than the polymers described above in the present invention. When the aforementioned curable resin composition contains the aforementioned polymer of the present invention and an alkali-soluble resin, from the viewpoint of developability, the content of the aforementioned polymer of the present invention is preferably 70 mass based on the total of the aforementioned polymer and alkali-soluble resin. % or more, preferably 80 mass% or more, more preferably 90 mass% or more.

相對於前述硬化性樹脂組成物中全部固體成分的含量,本發明之前述聚合物的含有比率無特別限制,但從顯影性的觀點來看,通常為30~90質量%左右,宜為35~85質量%,較佳為40~80質量%。The content ratio of the aforementioned polymer in the present invention is not particularly limited relative to the total solid content in the curable resin composition. However, from the viewpoint of developability, it is usually about 30 to 90 mass %, preferably 35 to 90% by mass. 85 mass%, preferably 40 to 80 mass%.

作為前述聚合性單體無特別限制,可舉例如:壬基苯基卡必醇(甲基)丙烯酸酯、2-羥基-3-苯氧丙基(甲基)丙烯酸酯、2-乙基己基卡必醇(甲基)丙烯酸酯、2-羥基乙基(甲基)丙烯酸酯、N-乙烯吡咯啶酮、及乙氧基化-o-苯基苯酚(甲基)丙烯酸酯等單官能單體;二乙烯基苯、苯二甲酸二烯丙基酯、及苯磷酸二烯丙基酯等多官能芳香族乙烯基系單體;(二)乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、雙酚A環氧乙烷加成二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇二(甲基)丙烯酸酯、二新戊四醇三(甲基)丙烯酸酯、二新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、及參(羥基乙基)三聚異氰酸酯的三(甲基)丙烯酸酯等多官能(甲基)丙烯酸酯;雙酚二環氧丙基醚、酞酸二環氧丙基酯、3’,4’-環氧環己基甲基 3,4-環氧環己烷羧酸酯、及三環氧丙基三聚異氰酸酯等多官能環氧系單體。此等聚合性單體可單獨使用,亦可併用2種以上。The polymerizable monomer is not particularly limited, and examples thereof include nonylphenylcarbitol (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, and 2-ethylhexyl Carbitol (meth)acrylate, 2-hydroxyethyl (meth)acrylate, N-vinylpyrrolidone, and ethoxylated-o-phenylphenol (meth)acrylate and other monofunctional monoacrylates Polyfunctional aromatic vinyl monomers such as divinylbenzene, diallyl phthalate, and diallyl phenylphosphate; (di) ethylene glycol di(meth)acrylate, propylene glycol Di(meth)acrylate, trimethylolpropane di(meth)acrylate, bisphenol A ethylene oxide addition di(meth)acrylate, trimethylolpropane tri(meth)acrylate ,Neopenterythritol di(meth)acrylate,Neopenterythritol tri(meth)acrylate,Neopenterythritol tetra(meth)acrylate,DiNeopenterythritol di(meth)acrylate, Dineopenterythritol tri(meth)acrylate, dipenterythritol tetra(meth)acrylate, dipenterythritol penta(meth)acrylate, dineopenterythritol hexa(meth)acrylate esters, and polyfunctional (meth)acrylates such as tri(meth)acrylate of (hydroxyethyl)tripolyisocyanate; bisphenol diepoxypropyl ether, diepoxypropyl phthalate, 3' , 4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate, and triepoxypropyltriisocyanate and other multifunctional epoxy monomers. These polymerizable monomers may be used alone, or two or more types may be used in combination.

前述聚合性單體的含量無特別限制,但從充分獲得本發明效果的觀點來看,相對於本發明之前述聚合物100質量份宜為10~200質量份,較佳為20~150質量份,更佳為40~120質量份。The content of the aforementioned polymerizable monomer is not particularly limited, but from the viewpoint of fully obtaining the effects of the present invention, it is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass based on 100 parts by mass of the aforementioned polymer. , more preferably 40 to 120 parts by mass.

作為前述光聚合起始劑無特別限制,可舉例如:苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚等苯偶姻與苯偶姻烷基醚類;苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1,1-二氯苯乙酮等苯乙酮類;2-甲基蒽醌、2-戊基蒽醌、2-t-丁基蒽醌、1-氯蒽醌等蒽醌類;2,4-二甲基9-氧硫𠮿、2,4-二異丙基9-氧硫𠮿、2-氯9-氧硫𠮿等9-氧硫𠮿類;苯乙酮二甲基縮酮、苯甲基二甲基縮酮等縮酮類;二苯基酮等二苯基酮類;2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-丙烷-1-酮、2-苯甲基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1;醯基膦氧化物類及𠮿酮類等。此等光聚合起始劑可單獨使用,亦可併用2種以上。The aforementioned photopolymerization initiator is not particularly limited, and examples thereof include benzoin, benzoin alkyl ethers such as benzoin, benzoin methyl ether, and benzoin ethyl ether; acetophenone, 2 , 2-Dimethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone and other acetophenones; 2-methylanthraquinone, 2-pentylanthraquinone, 2-t-butanone Anthraquinones such as 1-chloroanthraquinone and 1-chloroanthraquinone; 2,4-dimethyl 9-oxysulfide𠮿 , 2,4-diisopropyl 9-oxosulfide𠮿 , 2-chloro-9-oxosulfide𠮿 Etc. 9-oxysulfur𠮿 Class; ketals such as acetophenone dimethyl ketal, benzyl dimethyl ketal; diphenyl ketones such as diphenyl ketone; 2-methyl-1-[4-(methylthio) Phenyl]-2-morpholinyl-propan-1-one, 2-phenylmethyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1; acylphosphine Oxides and ketones, etc. These photopolymerization initiators may be used alone, or two or more types may be used in combination.

前述光聚合起始劑之含量無特別限制,但相對於本發明之前述聚合物100質量份,宜為0.3~8質量份,較佳為0.5~7質量份,更佳為1~6質量份。The content of the aforementioned photopolymerization initiator is not particularly limited, but relative to 100 parts by mass of the aforementioned polymer of the present invention, it is preferably 0.3 to 8 parts by mass, preferably 0.5 to 7 parts by mass, and more preferably 1 to 6 parts by mass. .

亦可於前述硬化性樹脂組成物添加光聚合起始助劑。作為光聚合起始助劑,可舉例如:1,3,5-三(3-巰基丙醯基氧乙基)-三聚異氰酸酯、1,3,5-三(3-巰基丁基氧乙基)-三聚異氰酸酯(昭和電工公司製,Karenz MT(註冊商標)NR1)、三羥甲基丙烷三(3-巰基丙酸酯)等3官能硫醇化合物;新戊四醇四(3-巰基丙酸酯)、新戊四醇四(3-巰基丁酸酯)(昭和電工公司製,Karenz MT(註冊商標)PEI)等4官能硫醇化合物;二新戊四醇六(3-丙酸酯)等6官能硫醇化合物等多官能硫醇。此等光聚合開始助劑可單獨使用,亦可併用2種以上。A photopolymerization initiating assistant may also be added to the aforementioned curable resin composition. Examples of photopolymerization starting aids include: 1,3,5-tris(3-mercaptopropyloxyethyl)-triisocyanate, 1,3,5-tris(3-mercaptobutyloxyethyl) trifunctional thiol compounds such as triisocyanate (manufactured by Showa Denko Co., Ltd., Karenz MT (registered trademark) NR1), trimethylolpropane tris(3-mercaptopropionate); neopentylerythritol tetrakis(3- Tetrafunctional thiol compounds such as mercaptopropionate), neopentyltetrakis (3-mercaptobutyrate) (manufactured by Showa Denko Co., Ltd., Karenz MT (registered trademark) PEI); dineopenterythritol hexa(3-propane) Hexafunctional thiol compounds such as acid esters) and other polyfunctional thiols. These photopolymerization starting aids may be used alone, or two or more types may be used in combination.

作為前述熱聚合起始劑,可舉例如:氫異丙基苯過氧化物、二異丙基苯過氧化物、二-t-丁基過氧化物、月桂基過氧化物、苯甲醯基過氧化物、t-丁基過氧異丙基碳酸酯、t-丁基過氧-2-已酸乙基酯、t-戊基過氧-2-已酸乙基酯等有機過氧化物;2,2’-偶氮二(異丁腈)、1,1’-偶氮二(環己腈)、2,2’-偶氮二(2,4-二甲基纈腈)、二甲基2,2’-偶氮二(2-甲基丙酸酯)等偶氮化合物等。此等熱聚合起始劑可單獨使用亦可併用2種以上。Examples of the thermal polymerization initiator include hydrocumene peroxide, diisopropylbenzene peroxide, di-t-butyl peroxide, lauryl peroxide, and benzyl peroxide. Peroxides, t-butylperoxyisopropyl carbonate, t-butylperoxy-2-caproic acid ethyl ester, t-pentylperoxy-2-caproic acid ethyl ester and other organic peroxides ; 2,2'-Azobis(isobutyronitrile), 1,1'-Azobis(cyclohexanenitrile), 2,2'-Azobis(2,4-dimethylvalonitrile), Azo compounds such as methyl 2,2'-azobis(2-methylpropionate), etc. These thermal polymerization initiators may be used alone or in combination of two or more types.

亦可於前述硬化性樹脂組成物添加不飽和聚酯、環氧丙烯酸酯、聚胺酯丙烯酸酯、聚酯丙烯酸酯等自由基聚合性寡聚物;環氧樹脂等硬化性樹脂。Radically polymerizable oligomers such as unsaturated polyester, epoxy acrylate, polyurethane acrylate, and polyester acrylate; and curable resins such as epoxy resin may also be added to the aforementioned curable resin composition.

前述硬化性樹脂組成物亦可含有溶劑。作為溶劑可舉例如:四氫呋喃、二㗁烷、乙二醇二甲基醚、二乙二醇二甲基醚等醚類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮等酮類;乙酸乙酯、乙酸丁酯、丙二醇單甲基醚乙酸酯、3-甲氧基丁基乙酸酯等酯類;甲醇、乙醇、異丙醇、n-丁醇、乙二醇單甲基醚、丙二醇單甲基醚等醇類;甲苯、二甲苯、乙苯等芳香族烴類;氯仿、二甲亞碸等。此等溶劑可單獨使用,亦可併用2種以上。此外,溶劑含量因應使用該組成物時最適合的黏度來適宜設定即可。The curable resin composition may contain a solvent. Examples of the solvent include ethers such as tetrahydrofuran, dihexane, ethylene glycol dimethyl ether, and diethylene glycol dimethyl ether; acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone Ketones; ethyl acetate, butyl acetate, propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate and other esters; methanol, ethanol, isopropyl alcohol, n-butanol, ethylene glycol Alcohols such as alcohol monomethyl ether and propylene glycol monomethyl ether; aromatic hydrocarbons such as toluene, xylene, and ethylbenzene; chloroform, dimethyl sulfoxide, etc. These solvents can be used alone, or two or more types can be used in combination. In addition, the solvent content can be appropriately set according to the most suitable viscosity when using the composition.

前述硬化性樹脂組成物在不損害本發明效果的範圍內,亦可含有:氫氧化鋁、滑石、黏土、硫酸鋇等充填材;交聯劑、染料、顏料、消泡劑、耦合劑、調平劑、增感劑、脫模劑、滑劑、塑化劑、抗氧化劑、紫外線吸收劑、阻燃劑、聚合抑制劑、增黏劑、及分散劑等公知添加劑。The aforementioned curable resin composition may also contain: filling materials such as aluminum hydroxide, talc, clay, and barium sulfate; cross-linking agents, dyes, pigments, defoaming agents, coupling agents, modifiers, etc., within the scope that does not impair the effect of the present invention. Well-known additives such as flattening agents, sensitizers, release agents, lubricants, plasticizers, antioxidants, ultraviolet absorbers, flame retardants, polymerization inhibitors, tackifiers, and dispersants.

本發明之硬化物係藉由使前述硬化性樹脂組成物硬化而得。作為前述硬化物的製造方法,可舉以下方法為例:將前述硬化性樹脂組成物注入成型模具(樹脂模具),或是將前述硬化性樹脂組成物塗佈於基材(基板)、各種機能層上,使其成為所期望的形狀後,進行加熱或照射光(例如,紫外線)來使前述硬化性樹脂組成物硬化。硬化條件係因應所使用之前述硬化性樹脂組成物來適宜調整。The cured product of the present invention is obtained by curing the aforementioned curable resin composition. Examples of methods for producing the cured product include injecting the curable resin composition into a mold (resin mold), or applying the curable resin composition to a base material (substrate), various functions, etc. After the curable resin composition is formed into a desired shape, it is heated or irradiated with light (for example, ultraviolet rays) to harden the curable resin composition. The curing conditions are appropriately adjusted according to the aforementioned curable resin composition used.

前述硬化物之折射率(波長594nm)為1.60以上,宜為1.61以上。The refractive index (wavelength 594 nm) of the hardened material is 1.60 or more, preferably 1.61 or more.

前述硬化物適合用作透鏡(微透鏡)、光間隔件、隔壁材料、層間絕緣膜材料、保護膜材料、光波導材料料、或平坦化膜材料,尤其適合作為微透鏡使用。The aforementioned hardened product is suitable for use as a lens (microlens), an optical spacer, a partition wall material, an interlayer insulating film material, a protective film material, an optical waveguide material, or a planarizing film material, and is particularly suitable for use as a microlens.

微透鏡的製造方法無特別限制,可舉以下方法為例:使用前述硬化性樹脂組成物,在基板上形成由矩形點與格子狀空間所構成之點圖型,之後對前述點圖型藉由加熱來進行熱流而形成微透鏡圖型(微透鏡陣列等)。The manufacturing method of the microlens is not particularly limited, and the following method can be cited as an example: using the aforementioned curable resin composition, a dot pattern composed of rectangular dots and grid-like spaces is formed on the substrate, and then the dot pattern is formed by Heating causes heat flow to form a microlens pattern (microlens array, etc.).

基板若是作為微透鏡圖型的形成對象來使用者則無特別限定。作為適宜基板的一個例子,可舉出在聚矽氧基板上形成固態攝影元件、第1平坦化膜、濾色片、及第2平坦化膜的基板。該基板中係以披覆分散於聚矽氧基板上預定位置之固態攝影元件的方式,來形成具備平坦面的第1平坦化膜。第1平坦化膜上係於各固態攝影元件之位置的上方位置形成濾色片。接下來,以披覆濾色片之方式來形成具備平坦面的第2平坦化膜。此外,基板中係將從聚矽氧基板往第2平坦化膜側之方向設為上方,將從第2平坦化膜往聚矽氧基板側之方向設為下方。The substrate is not particularly limited as long as it is used as a target for forming the microlens pattern. An example of a suitable substrate includes a substrate in which a solid-state imaging element, a first planarizing film, a color filter, and a second planarizing film are formed on a polysilicone substrate. In this substrate, a first planarization film having a flat surface is formed by covering the solid-state imaging elements dispersed at predetermined positions on the polysiloxane substrate. A color filter is formed on the first planarizing film above the position of each solid-state imaging element. Next, a second planarizing film having a flat surface is formed by covering the color filter. In addition, in the substrate, the direction from the polysilicone substrate to the second planarizing film side is set to upward, and the direction from the second planarizing film to the polysilicone substrate side is set to downward.

為了在基板上形成微透鏡圖型,首先,使用前述硬化性樹脂組成物於基板上形成點圖型。點圖型的形成方法無特別限定,例如可藉由噴墨印刷法等印刷法來形成、亦可藉由光微影術來形成,該光微影術包含藉由曝光及顯影所行之圖案化。In order to form a microlens pattern on a substrate, first, the aforementioned curable resin composition is used to form a dot pattern on the substrate. The method of forming a dot pattern is not particularly limited. For example, it can be formed by a printing method such as inkjet printing, or by photolithography, which includes patterns formed by exposure and development. change.

光微影術中,例如可適宜使用負型光微影術,該方法係於前述硬化性樹脂組成物之塗膜上配置光罩,藉由照射紫外線使塗膜光硬化,並在照射紫外線後之塗膜噴灑鹼性水溶液來溶解、去除未曝光部,再對剩餘之曝光部進行水洗來顯影,藉此形成點圖型。此外,本發明之聚合物等並不限用於負型光微影術,亦可用於正型光微影術。In photolithography, for example, negative photolithography can be suitably used. In this method, a mask is placed on the coating film of the curable resin composition, and the coating film is photohardened by irradiating ultraviolet rays. The coating film is sprayed with an alkaline aqueous solution to dissolve and remove the unexposed parts, and then the remaining exposed parts are washed and developed to form a dot pattern. In addition, the polymers of the present invention are not limited to negative photolithography, but can also be used in positive photolithography.

本發明中,藉由使用包含前述聚合物之前述硬化性樹脂組成物,可製作出高折射率的硬化物(例如,微透鏡)。又,本發明之硬化性樹脂組成物在使用弱鹼性顯影液(例如,pH11以下之顯影液)時亦可在短時間內顯影,因此可生產性良好地製作高折射率的硬化膜(例如,微透鏡)。In the present invention, by using the curable resin composition containing the polymer, a cured product (for example, a microlens) with a high refractive index can be produced. In addition, the curable resin composition of the present invention can be developed in a short time even when using a weakly alkaline developer (for example, a developer with a pH of 11 or less), and therefore can produce a high refractive index cured film (for example, a high refractive index film) with good productivity. , microlens).

[實施例] 以下雖會舉出實施例及比較例來說明本發明,但本發明不受此等實施例的任何限定。 [Example] Although Examples and Comparative Examples will be given below to illustrate the present invention, the present invention is not limited to these Examples in any way.

實施例1 [聚合物1的合成] 藉由下述製造方法合成聚合物1,該聚合物1係如下述:前述通式(1)中,X 1為下述式(x)所示有機基,4個R 1係下述式(2-1a)及(2-2a)所示有機基A、下述式(3a)所示有機基B、或具有重複結構單元之有機基C,前述重複結構單元係選自於由下述式(4-1a)及(4-2a)所示重複結構單元、下述式(5-1a)、(5-1b)、(5-1c)、(5-2a)、(5-2b)及(5-2c)所示重複結構單元、下述式(6-1a)、(6-1b)、(6-1c)、(6-2a)、(6-2b)及(6-2c)所示重複結構單元、下述式(7-1a)、(7-1b)、(7-2a)及(7-2b)所示重複結構單元、下述式(8-1a)、(8-1b)、(8-1c)、(8-1d)、(8-1e)、(8-1f)、(8-2a)、(8-2b)、(8-2c)、(8-2d)、(8-2e)及(8-2f)所示重複結構單元、以及下述式(9-1a)、(9-1b)、(9-2a)及(9-2b)所示重複結構單元所構成群組中之1種以上,4個R 1之中至少1個為前述有機基C。 [化學式23] [化學式24] [化學式25] [化學式26] [化學式27] [化學式28] [化學式29] [化學式30] [化學式31] Example 1 [Synthesis of Polymer 1] Polymer 1 was synthesized by the following production method. The polymer 1 is as follows: In the aforementioned general formula (1), X 1 is an organic group represented by the following formula (x) , 4 R 1 are organic groups A represented by the following formulas (2-1a) and (2-2a), organic groups B represented by the following formula (3a), or organic groups C having repeating structural units, the aforementioned repeating The structural unit is selected from the group consisting of repeating structural units represented by the following formulas (4-1a) and (4-2a), the following formulas (5-1a), (5-1b), (5-1c), (5 Repeating structural units represented by -2a), (5-2b) and (5-2c), the following formulas (6-1a), (6-1b), (6-1c), (6-2a), (6 Repeating structural units represented by -2b) and (6-2c), repeating structural units represented by the following formulas (7-1a), (7-1b), (7-2a) and (7-2b), the following formulas (8-1a), (8-1b), (8-1c), (8-1d), (8-1e), (8-1f), (8-2a), (8-2b), (8 -2c), (8-2d), (8-2e) and (8-2f), and the following formulas (9-1a), (9-1b), (9-2a) and ( 9-2b) More than one type of the group consisting of the repeating structural units, and at least one of the four R 1's is the aforementioned organic group C. [Chemical formula 23] [Chemical formula 24] [Chemical formula 25] [Chemical formula 26] [Chemical formula 27] [Chemical formula 28] [Chemical formula 29] [Chemical formula 30] [Chemical Formula 31]

於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管的玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、環氧丙基苯基醚36.5g、3-乙基-3-氧環丁烷甲醇22.6g、四丁基氯化銨1.6g、及丙二醇單甲基醚乙酸酯165.9g,在氮氣體環境下,於80℃反應26小時,獲得包含聚合物1的溶液。以GPC測定重量平均分子量的結果,聚合物1之重量平均分子量(Mw)為11,500。此外,分子量測定係使用凝膠滲透層析儀(東曹公司製,製品編號:HLC-8120、管柱:G-5000HXL及G-3000HXL之2連結、檢測器:RI、移動相:N,N-二甲基甲醯胺)來進行。以下亦使用同樣方法來測定重量平均分子量。又,聚合物1之酸價為70mgKOH/g。In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and glycidyl phenyl ether. 36.5g, 22.6g of 3-ethyl-3-oxetanemethanol, 1.6g of tetrabutylammonium chloride, and 165.9g of propylene glycol monomethyl ether acetate, in a nitrogen atmosphere, react at 80°C for 26 hours, a solution containing polymer 1 was obtained. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 1 was 11,500. In addition, the molecular weight was measured using gel permeation chromatography (manufactured by Tosoh Corporation, product number: HLC-8120, column: G-5000HXL and G-3000HXL 2-link, detector: RI, mobile phase: N, N -dimethylformamide). The weight average molecular weight is measured using the same method below. In addition, the acid value of polymer 1 is 70 mgKOH/g.

藉由所得之重量平均分子量,計算聚合物1之分子中所含之下述重複結構單元的合計數量:前述式(4-1a)及(4-2a)所示重複結構單元、前述式(5-1a)、(5-1b)、(5-1c)、(5-2a)、(5-2b)及(5-2c)所示重複結構單元、前述式(6-1a)、(6-1b)、(6-1c)、(6-2a)、(6-2b)及(6-2c)所示重複結構單元、前述式(7-1a)、(7-1b)、(7-2a)及(7-2b)所示重複結構單元、前述式(8-1a)、(8-1b)、(8-1c)、(8-1d)、(8-1e)、(8-1f)、(8-2a)、(8-2b)、(8-2c)、(8-2d)、(8-2e)及(8-2f)所示重複結構單元、及前述式(9-1a)、(9-1b)、(9-2a)及(9-2b)所示重複結構單元。 聚合物1為超分支聚合物的集合體。此超分支聚合物可包含下述重複結構單元:前述式(4-1a)及(4-2a)所示重複結構單元、前述式(5-1a)、(5-1b)、(5-1c)、(5-2a)、(5-2b)及(5-2c)所示重複結構單元、前述式(6-1a)、(6-1b)、(6-1c)、(6-2a)、(6-2b)及(6-2c)所示重複結構單元、前述式(7-1a)、(7-1b)、(7-2a)及(7-2b)所示重複結構單元、前述式(8-1a)、(8-1b)、(8-1c)、(8-1d)、(8-1e)、(8-1f)、(8-2a)、(8-2b)、(8-2c)、(8-2d)、(8-2e)及(8-2f)所示重複結構單元、及前述式(9-1a)、(9-1b)、(9-2a)及(9-2b)所示重複結構單元。 From the obtained weight average molecular weight, calculate the total number of the following repeating structural units contained in the molecules of polymer 1: repeating structural units represented by the aforementioned formulas (4-1a) and (4-2a), the aforementioned formula (5 -Repeating structural units represented by -1a), (5-1b), (5-1c), (5-2a), (5-2b) and (5-2c), the aforementioned formulas (6-1a), (6- Repeating structural units shown in 1b), (6-1c), (6-2a), (6-2b) and (6-2c), the aforementioned formulas (7-1a), (7-1b), (7-2a ) and the repeating structural unit represented by (7-2b), the aforementioned formulas (8-1a), (8-1b), (8-1c), (8-1d), (8-1e), (8-1f) , the repeating structural units shown in (8-2a), (8-2b), (8-2c), (8-2d), (8-2e) and (8-2f), and the aforementioned formula (9-1a) , (9-1b), (9-2a) and (9-2b) as the repeating structural units. Polymer 1 is an aggregate of hyperbranched polymers. This hyperbranched polymer may include the following repeating structural units: repeating structural units represented by the aforementioned formulas (4-1a) and (4-2a), the aforementioned formulas (5-1a), (5-1b), (5-1c) ), (5-2a), (5-2b) and (5-2c), the aforementioned formulas (6-1a), (6-1b), (6-1c), (6-2a) , the repeating structural units represented by (6-2b) and (6-2c), the repeating structural units represented by the aforementioned formulas (7-1a), (7-1b), (7-2a) and (7-2b), the aforementioned Formula (8-1a), (8-1b), (8-1c), (8-1d), (8-1e), (8-1f), (8-2a), (8-2b), ( Repeating structural units shown in 8-2c), (8-2d), (8-2e) and (8-2f), and the aforementioned formulas (9-1a), (9-1b), (9-2a) and ( The repeating structural unit shown in 9-2b).

前述3,3’,4,4’-聯苯四羧酸二酐之分子量為294.22g/mol,環氧丙基苯基醚之分子量為150.18g/mol,3-乙基-3-氧環丁烷甲醇之分子量為116.16g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A個源自3,3’,4,4’-聯苯四羧酸二酐的結構、B個源自環氧丙基苯基醚的結構、C個源自3-乙基-3-氧環丁烷甲醇的結構,此時,A個×294.22g/mol+B個×150.18g/mol+C個×116.16g/mol=11,500,並且,所使用之3,3’,4,4’-聯苯四羧酸二酐、環氧丙基苯基醚、3-乙基-3-氧環丁烷甲醇之莫耳比成立A:B:C=70:100:80,因此解開此等式則A=17.93、B=25.61、C=20.49。The molecular weight of the aforementioned 3,3',4,4'-biphenyltetracarboxylic dianhydride is 294.22g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the 3-ethyl-3-oxo ring The molecular weight of butanemethanol is 116.16g/mol. Therefore, it is assumed that all the raw materials used have reacted, and the molecular weight of the hyperbranched polymer is set to the aforementioned weight average molecular weight, and one hyperbranched polymer contains A Structures derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride, B structures derived from glycidyl phenyl ether, C structures derived from 3-ethyl-3-oxetane The structure of alkanemethanol, at this time, A × 294.22g/mol + B × 150.18g/mol + C × 116.16g/mol = 11,500, and the 3,3',4,4'-biphenyltetracarboxylic acid used The molar ratio of dianhydride, glycidyl phenyl ether, and 3-ethyl-3-oxetanemethanol is A: B: C = 70: 100: 80. Therefore, when solving this equation, A = 17.93 , B=25.61, C=20.49.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自3,3’,4,4’-聯苯四羧酸二酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即16.93個,將此作為聚合物1之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride in a repeating structural unit, the hyperbranched polymer is The average number of repeating structural units is calculated by subtracting the value of quantity.

[感光性樹脂組成物1的調製] 混合包含100質量份前述聚合物1之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、雙酚A之EO3.8莫耳加成二丙烯酸酯(大阪有機化學工業公司製,V#700HV)5質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.60質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.20質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.16質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物1。 [Preparation of photosensitive resin composition 1] Mix 100 parts by mass of a solution containing the aforementioned polymer 1, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and EO 3.8 Mo of bisphenol A. 5 parts by mass of ear addition diacrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., V#700HV), 1.60 parts by mass of photopolymerization initiator (manufactured by BASF JAPAN Co., Ltd., Irgacure OXE01), and 1.60 parts by mass of photopolymerization initiator (manufactured by LAMBSON Co., Ltd. SPEEDCURE TPO) 3.20 parts by mass and surfactant (FZ-2122 manufactured by Dow Corning Toray Co., Ltd.) 0.16 parts by mass to prepare a photosensitive resin composition 1 with a solid content of 40% by mass.

實施例2 [聚合物2的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、環氧丙基苯基醚29.2g、甲基丙烯酸環氧丙基酯6.9g、3-乙基-3-氧環丁烷甲醇22.6g、四丁基氯化銨1.6g、氫醌0.01g、及丙二醇單甲基醚乙酸酯165.3g,在氮氣體環境下於80℃反應26小時,獲得包含聚合物2之溶液。以GPC測定重量平均分子量的結果,聚合物2之重量平均分子量(Mw)為15,200。又,聚合物2之酸價為57mgKOH/g,雙鍵當量為2240。 Example 2 [Synthesis of Polymer 2] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and glycidyl phenyl ether. 29.2g, glycidyl methacrylate 6.9g, 3-ethyl-3-oxetanemethanol 22.6g, tetrabutylammonium chloride 1.6g, hydroquinone 0.01g, and propylene glycol monomethyl ether ethyl 165.3g of the acid ester was reacted at 80°C for 26 hours under a nitrogen atmosphere to obtain a solution containing polymer 2. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 2 was 15,200. In addition, the acid value of polymer 2 is 57 mgKOH/g, and the double bond equivalent is 2240.

藉由所得之重量平均分子量,計算聚合物2之分子中所含之相當於前述通式(4-1)~(9-2)所示各重複結構單元的各重複結構單元(於此省略具體的重複結構單元。)的合計數量。聚合物2為超分支聚合物的集合體。此超分支聚合物可包含相當於前述通式(4-1)~(9-2)所示各重複結構單元之各重複結構單元。Based on the obtained weight average molecular weight, calculate the repeating structural units contained in the molecules of polymer 2 corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2) (the details are omitted here). the total number of repeating structural units.). Polymer 2 is an aggregate of hyperbranched polymers. The hyperbranched polymer may include repeating structural units corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2).

前述3,3’,4,4’-聯苯四羧酸二酐之分子量為294.22g/mol,環氧丙基苯基醚之分子量為150.18g/mol,甲基丙烯酸環氧丙基酯之分子量為142.15g/mol,3-乙基-3-氧環丁烷甲醇之分子量為116.16g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A個源自3,3’,4,4’-聯苯四羧酸二酐的結構、B個源自環氧丙基苯基醚的結構、C個源自甲基丙烯酸環氧丙基酯的結構、D個源自3-乙基-3-氧環丁烷甲醇的結構,此時,A個×294.22g/mol+B個×150.18g/mol+C個×142.15g/mol+D個×116.16g/mol=15,200,並且,所使用之3,3’,4,4’-聯苯四羧酸二酐、環氧丙基苯基醚、甲基丙烯酸環氧丙基酯、3-乙基-3-氧環丁烷甲醇之莫耳比成立A:B:C:D=70:80:20:80,因此解開此等式則A=23.78,B=27.18,C=6.79,D=27.18。The molecular weight of the aforementioned 3,3',4,4'-biphenyltetracarboxylic dianhydride is 294.22g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the molecular weight of glycidyl methacrylate is 294.22g/mol. The molecular weight is 142.15g/mol, and the molecular weight of 3-ethyl-3-oxetanemethanol is 116.16g/mol. Therefore, it is assumed that all the raw materials used have been reacted, and the molecular weight of the hyperbranched polymer is assumed to be the aforementioned The weight average molecular weight is assumed to be 1. A hyperbranched polymer contains A structures derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride and B structures derived from glycidyl phenyl ether. structure, C structures derived from glycidyl methacrylate, and D structures derived from 3-ethyl-3-oxetanemethanol, at this time, A × 294.22g/mol + B × 150.18g /mol+C pieces The molar ratio of glycidyl acrylate and 3-ethyl-3-oxetanemethanol is A: B: C: D = 70: 80: 20: 80. Therefore, when solving this equation, A = 23.78 , B=27.18, C=6.79, D=27.18.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自3,3’,4,4’-聯苯四羧酸二酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即22.78個,將此作為聚合物2之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride in a repeating structural unit, the hyperbranched polymer is The average number of repeating structural units is calculated by subtracting the value of quantity.

[感光性樹脂組成物2的調製] 混合包含100質量份前述聚合物2之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.55質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.10質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.15質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物2。 [Preparation of photosensitive resin composition 2] Mix 100 parts by mass of a solution containing the aforementioned polymer 2, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and a photopolymerization initiator (BASF JAPAN The prepared composition contains 1.55 parts by mass of Irgacure OXE01, manufactured by the company, 3.10 parts by mass of a photopolymerization initiator (SPEEDCURE TPO, manufactured by LAMBSON), and 0.15 parts by mass of a surfactant (FZ-2122, manufactured by Dow Corning Toray). Photosensitive resin composition 2 with a solid content of 40% by mass.

實施例3 [聚合物3的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入9,9-二(3,4-二羧基苯基)茀二酸酐50.0g、環氧丙基苯基醚15.3g、甲基丙烯酸環氧丙基酯6.2g、3-乙基-3-氧環丁烷甲醇14.4g、四丁基氯化銨0.9g、氫醌0.01g、及丙二醇單甲基醚乙酸酯130.2g,在氮氣體環境下於80℃反應26小時,獲得包含聚合物3之溶液。以GPC測定重量平均分子量的結果,聚合物3之重量平均分子量(Mw)為7,400。又,聚合物3之酸價為63mgKOH/g,雙鍵當量為1970。 Example 3 [Synthesis of Polymer 3] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 9,9-bis(3,4-dicarboxyphenyl)bazidic anhydride and glycidyl phenyl 15.3g ether, 6.2g glycidyl methacrylate, 14.4g 3-ethyl-3-oxetanemethanol, 0.9g tetrabutylammonium chloride, 0.01g hydroquinone, and propylene glycol monomethyl ether 130.2 g of acetate was reacted at 80° C. for 26 hours in a nitrogen atmosphere to obtain a solution containing polymer 3. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 3 was 7,400. In addition, the acid value of polymer 3 is 63 mgKOH/g, and the double bond equivalent is 1970.

藉由所得之重量平均分子量,計算聚合物3之分子中所含之相當於前述通式(4-1)~(9-2)所示各重複結構單元的各重複結構單元(此省略具體的重複結構單元。)的合計數量。聚合物3為超分支聚合物的集合體。此超分支聚合物可包含相當於前述通式(4-1)~(9-2)所示各重複結構單元之各重複結構單元。Based on the obtained weight average molecular weight, calculate the repeating structural units contained in the molecules of polymer 3 corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2) (specific details are omitted here). The total number of repeating structural units.). Polymer 3 is an aggregate of hyperbranched polymers. The hyperbranched polymer may include repeating structural units corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2).

前述9,9-二(3,4-二羧基苯基)茀二酸酐之分子量為458.43g/mol,環氧丙基苯基醚之分子量為150.18g/mol,甲基丙烯酸環氧丙基酯之分子量為142.15g/mol,3-乙基-3-氧環丁烷甲醇之分子量為116.16g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A個源自9,9-二(3,4-二羧基苯基)茀二酸酐的結構、B個源自環氧丙基苯基醚的結構、C個源自甲基丙烯酸環氧丙基酯的結構、D個源自3-乙基-3-氧環丁烷甲醇的結構,此時,A個×458.43g/mol+B個×150.18g/mol+C個×142.15g/mol+D個×116.16g/mol=7,400,並且,所使用之9,9-二(3,4-二羧基苯基)茀二酸酐、環氧丙基苯基醚、甲基丙烯酸環氧丙基酯、3-乙基-3-氧環丁烷甲醇之莫耳比成立A:B:C:D=75:70:30:85,因此解開此等式則A=9.40,B=8.77,C=3.76,D=10.65。The molecular weight of the aforementioned 9,9-bis(3,4-dicarboxyphenyl)azidic anhydride is 458.43g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the molecular weight of glycidyl methacrylate is 458.43g/mol. The molecular weight of 3-ethyl-3-oxetanemethanol is 142.15g/mol, and the molecular weight of 3-ethyl-3-oxetanemethanol is 116.16g/mol. Therefore, it is assumed that all the raw materials used have been reacted, and the molecular weight of the hyperbranched polymer is set to The aforementioned weight average molecular weight is assumed to mean that one hyperbranched polymer contains A structures derived from 9,9-bis(3,4-dicarboxyphenyl)azidic anhydride and B structures derived from epoxypropylphenyl groups. The structure of ether, C structures derived from glycidyl methacrylate, and D structures derived from 3-ethyl-3-oxetanemethanol, at this time, A × 458.43g/mol + B × 150.18g/mol + C pieces The molar ratio of glycidyl methacrylate and 3-ethyl-3-oxetanemethanol is A: B: C: D = 75: 70: 30: 85. Therefore, solving this equation is A=9.40, B=8.77, C=3.76, D=10.65.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自9,9-二(3,4-二羧基苯基)茀二酸酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即8.40個,將此作為聚合物3之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 9,9-bis(3,4-dicarboxyphenyl)bazidic anhydride in a repeating structural unit, the hyperbranched polymer The average number of repeating structural units is calculated by subtracting from the A value the value of Total quantity.

[感光性樹脂組成物3的調製] 混合包含100質量份前述聚合物3之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、雙酚A之EO3.8莫耳加成二丙烯酸酯(大阪有機化學工業公司製,V#700HV)5質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.60質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.20質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.16質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物3。 [Preparation of photosensitive resin composition 3] Mix 100 parts by mass of a solution containing the aforementioned polymer 3, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and EO 3.8 Mo of bisphenol A. 5 parts by mass of ear addition diacrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., V#700HV), 1.60 parts by mass of photopolymerization initiator (manufactured by BASF JAPAN Co., Ltd., Irgacure OXE01), and 1.60 parts by mass of photopolymerization initiator (manufactured by LAMBSON Co., Ltd. SPEEDCURE TPO) 3.20 parts by mass, and surfactant (FZ-2122 manufactured by Dow Corning Toray Co., Ltd.) 0.16 parts by mass to prepare a photosensitive resin composition 3 with a solid content of 40% by mass.

實施例4 [聚合物4的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、環氧丙基苯基醚31.9g、苯甲基醇20.7g、四丁基氯化銨1.4g、及丙二醇單甲基醚乙酸酯155.9g,在氮氣體環境下於100℃反應9小時,獲得包含聚合物4之溶液。以GPC測定重量平均分子量的結果,聚合物4之重量平均分子量(Mw)為3,500。又,聚合物4之酸價為78mgKOH/g。 Example 4 [Synthesis of Polymer 4] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and glycidyl phenyl ether. 31.9g, 20.7g of benzyl alcohol, 1.4g of tetrabutylammonium chloride, and 155.9g of propylene glycol monomethyl ether acetate were reacted at 100°C for 9 hours in a nitrogen atmosphere to obtain a solution containing polymer 4. . As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 4 was 3,500. In addition, the acid value of polymer 4 is 78 mgKOH/g.

藉由所得之重量平均分子量,計算聚合物4之分子中所含之相當於前述通式(4-1)~(9-2)所示各重複結構單元的各重複結構單元(於此省略具體的重複結構單元。)的合計數量。聚合物4為超分支聚合物的集合體。此超分支聚合物可包含相當於前述通式(4-1)~(9-2)所示各重複結構單元之各重複結構單元。Based on the obtained weight average molecular weight, the repeating structural units contained in the molecules of the polymer 4 corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2) are calculated (the details are omitted here). the total number of repeating structural units.). Polymer 4 is an aggregate of hyperbranched polymers. The hyperbranched polymer may include repeating structural units corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2).

前述3,3’,4,4’-聯苯四羧酸二酐之分子量為294.22g/mol,環氧丙基苯基醚之分子量為150.18g/mol,苯甲基醇之分子量為108.14g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A源自3,3’,4,4’-聯苯四羧酸二酐的結構、B個源自環氧丙基苯基醚的結構、C個源自苯甲基醇的結構,此時,A個×294.22g/mol+B個×150.18g/mol+C個×108.14g/mol=3,500,並且,所使用之3,3’,4,4’-聯苯四羧酸二酐、環氧丙基苯基醚、苯甲基醇之莫耳比成立A:B:C=80:100:90,因此解開此等式則A=5.78,B=7.25,C=6.52。The molecular weight of the aforementioned 3,3',4,4'-biphenyltetracarboxylic dianhydride is 294.22g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the molecular weight of benzyl alcohol is 108.14g. /mol, therefore, it is assumed that all the raw materials used have reacted, and the molecular weight of the hyperbranched polymer is set to the aforementioned weight average molecular weight, and 1 hyperbranched polymer contains A derived from 3,3',4, The structure of 4'-biphenyltetracarboxylic dianhydride, B structures derived from glycidyl phenyl ether, and C structures derived from benzyl alcohol, at this time, A × 294.22g/mol + B × 150.18g/mol + C pieces The ear ratio is A: B: C = 80: 100: 90. Therefore, solving this equation means A = 5.78, B = 7.25, and C = 6.52.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自3,3’,4,4’-聯苯四羧酸二酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即4.78個,將此作為聚合物4之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride in a repeating structural unit, the hyperbranched polymer is The average number of repeating structural units is calculated by subtracting the value of quantity.

[感光性樹脂組成物4的調製] 混合包含100質量份前述聚合物4之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、雙酚A之EO3.8莫耳加成二丙烯酸酯(大阪有機化學工業公司製,V#700HV)5質量份、3’,4’-環氧環己基甲基 3,4-環氧環己烷羧酸酯(DAICEL公司製,CELLOXIDE 2021P)25質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.86質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.72質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.19質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物4。 [Preparation of photosensitive resin composition 4] Mix 100 parts by mass of a solution containing the aforementioned polymer 4, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and EO 3.8 Mo of bisphenol A. 5 parts by mass of ear-addition diacrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd., V#700HV), 3',4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (manufactured by DAICEL) , CELLOXIDE 2021P) 25 parts by mass, photopolymerization initiator (Irgacure OXE01 manufactured by BASF JAPAN) 1.86 parts by mass, photopolymerization initiator (SPEEDCURE TPO manufactured by LAMBSON) 3.72 parts by mass, and surfactant (Dow Corning Photosensitive resin composition 4 (manufactured by Toray Co., Ltd., FZ-2122) 0.19 parts by mass, and the solid content in the prepared composition is 40% by mass.

實施例5 [聚合物5的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、環氧丙基苯基醚31.9g、苯甲基醇15.4g、丙烯酸2-羥基乙基酯5.7g、四丁基氯化銨1.4g、氫醌0.01g、及丙二醇單甲基醚乙酸酯156.5g,在氮氣體環境下於100℃反應9小時,獲得包含聚合物5之溶液。以GPC測定重量平均分子量的結果,聚合物5之重量平均分子量(Mw)為3,900。又,聚合物5之酸價為78mgKOH/g,雙鍵當量為2110。 Example 5 [Synthesis of Polymer 5] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and glycidyl phenyl ether. 31.9g, benzyl alcohol 15.4g, 2-hydroxyethyl acrylate 5.7g, tetrabutylammonium chloride 1.4g, hydroquinone 0.01g, and propylene glycol monomethyl ether acetate 156.5g, in a nitrogen atmosphere The reaction was carried out at 100° C. for 9 hours to obtain a solution containing polymer 5. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 5 was 3,900. In addition, the acid value of polymer 5 is 78 mgKOH/g, and the double bond equivalent is 2110.

藉由所得之重量平均分子量,計算聚合物5之分子中所含之相當於前述通式(4-1)~(9-2)所示各重複結構單元的各重複結構單元(於此省略具體的重複結構單元。)的合計數量。聚合物5為超分支聚合物的集合體。此超分支聚合物可包含相當於前述通式(4-1)~(9-2)所示各重複結構單元之各重複結構單元。Based on the obtained weight average molecular weight, the repeating structural units contained in the molecules of polymer 5 corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2) are calculated (the details are omitted here). the total number of repeating structural units.). Polymer 5 is an aggregate of hyperbranched polymers. The hyperbranched polymer may include repeating structural units corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2).

前述3,3’,4,4’-聯苯四羧酸二酐之分子量為294.22g/mol,環氧丙基苯基醚之分子量為150.18g/mol,苯甲基醇之分子量為108.14g/mol,丙烯酸2-羥基乙基酯之分子量為116.12g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A個源自3,3’,4,4’-聯苯四羧酸二酐的結構、B個源自環氧丙基苯基醚的結構、C個源自苯甲基醇的結構、D個源自丙烯酸2-羥基乙基酯的結構,此時,A個×294.22g/mol+B個×150.18g/mol+C個×108.14g/mol+D個×116.12g/mol=3,900,並且,所使用之3,3’,4,4’-聯苯四羧酸二酐、環氧丙基苯基醚、苯甲基醇、丙烯酸2-羥基乙基酯之莫耳比成立A:B:C:D=80:100:67:23,因此解開此等式則A=6.44,B=8.05,C=5.39,D=1.85。The molecular weight of the aforementioned 3,3',4,4'-biphenyltetracarboxylic dianhydride is 294.22g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the molecular weight of benzyl alcohol is 108.14g. /mol, the molecular weight of 2-hydroxyethyl acrylate is 116.12g/mol, therefore, it is assumed that all the raw materials used have reacted, and the molecular weight of the hyperbranched polymer is set to the aforementioned weight average molecular weight, and is set to 1 The hyperbranched polymer contains A structures derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride, B structures derived from glycidyl phenyl ether, and C structures derived from benzyl The structure of the alcohol, D structures derived from 2-hydroxyethyl acrylate, at this time, A × 294.22g/mol + B × 150.18g/mol + C × 108.14g/mol + D × 116.12g/mol = 3,900, and , the molar ratio of the used 3,3',4,4'-biphenyltetracarboxylic dianhydride, glycidyl phenyl ether, benzyl alcohol, and 2-hydroxyethyl acrylate is A:B :C:D=80:100:67:23, so solving this equation means A=6.44, B=8.05, C=5.39, D=1.85.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自3,3’,4,4’-聯苯四羧酸二酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即5.44個,將此作為聚合物5之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride in a repeating structural unit, the hyperbranched polymer is The average number of repeating structural units is calculated by subtracting the value of quantity.

[感光性樹脂組成物5的調製] 混合包含100質量份前述聚合物5之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、3’,4’-環氧環己基甲基 3,4-環氧環己烷羧酸酯(DAICEL公司製,CELLOXIDE 2021P)25質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.81質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.61質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.18質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物5。 [Preparation of photosensitive resin composition 5] Mix 100 parts by mass of a solution containing the aforementioned polymer 5, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and 3',4'-epoxy 25 parts by mass of cyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (CELLOXIDE 2021P manufactured by DAICEL), 1.81 parts by mass of photopolymerization initiator (Irgacure OXE01 manufactured by BASF JAPAN), photopolymerization starter Photosensitive resin composition 5 with a solid content of 40% by mass was prepared using 3.61 parts by mass of agent (SPEEDCURE TPO manufactured by LAMBSON Co., Ltd.) and 0.18 parts by mass of surfactant (FZ-2122 manufactured by Dow Corning Toray Co., Ltd.).

實施例6 [聚合物6的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、環氧丙基苯基醚24.9g、甲基丙烯酸環氧丙基酯6.8g、苯甲基醇20.7g、四丁基氯化銨1.4g、氫醌0.01g、及丙二醇單甲基醚乙酸酯155.6g,在氮氣體環境下於100℃反應9小時,獲得包含聚合物6之溶液。以GPC測定重量平均分子量的結果,聚合物6之重量平均分子量(Mw)為10,000。又,聚合物6之酸價為78mgKOH/g,雙鍵當量為2150。 Example 6 [Synthesis of Polymer 6] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride and glycidyl phenyl ether. 24.9g, glycidyl methacrylate 6.8g, benzyl alcohol 20.7g, tetrabutylammonium chloride 1.4g, hydroquinone 0.01g, and propylene glycol monomethyl ether acetate 155.6g, in nitrogen gas The reaction was carried out at 100°C for 9 hours under ambient conditions to obtain a solution containing polymer 6. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 6 was 10,000. In addition, the acid value of polymer 6 is 78 mgKOH/g, and the double bond equivalent is 2150.

藉由所得之重量平均分子量,計算聚合物6之分子中所含之相當於前述通式(4-1)~(9-2)所示各重複結構單元的各重複結構單元(於此省略具體的重複結構單元。)的合計數量。聚合物6為超分支聚合物的集合體。此超分支聚合物可包含相當於前述通式(4-1)~(9-2)所示各重複結構單元之各重複結構單元。From the obtained weight average molecular weight, the repeating structural units contained in the molecules of polymer 6 corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2) are calculated (the details are omitted here). the total number of repeating structural units.). Polymer 6 is an aggregate of hyperbranched polymers. The hyperbranched polymer may include repeating structural units corresponding to the repeating structural units represented by the aforementioned general formulas (4-1) to (9-2).

前述3,3’,4,4’-聯苯四羧酸二酐之分子量為294.22g/mol,環氧丙基苯基醚之分子量為150.18g/mol,甲基丙烯酸環氧丙基酯之分子量為142.15g/mol,苯甲基醇之分子量為108.14g/mol,因此,設為所使用之原料已全部反應,且將超分支聚合物之分子量設為前述重量平均分子量,並設為1個超分支聚合物包含A個源自3,3’,4,4’-聯苯四羧酸二酐的結構、B個源自環氧丙基苯基醚的結構、C個源自甲基丙烯酸環氧丙基酯的結構、D個源自苯甲基醇的結構,此時,A個×294.22g/mol+B個×150.18g/mol+C個×142.15g/mol+D個×108.14g/mol=10,000,並且,所使用之3,3’,4,4’-聯苯四羧酸二酐、環氧丙基苯基醚、甲基丙烯酸環氧丙基酯、苯甲基醇之莫耳比成立A:B:C:D=80:100:67:23,因此解開此等式則A=6.64,B=6.48,C=7.47,D=1.86。The molecular weight of the aforementioned 3,3',4,4'-biphenyltetracarboxylic dianhydride is 294.22g/mol, the molecular weight of glycidyl phenyl ether is 150.18g/mol, and the molecular weight of glycidyl methacrylate is 294.22g/mol. The molecular weight is 142.15g/mol, and the molecular weight of benzyl alcohol is 108.14g/mol. Therefore, it is assumed that all the raw materials used have reacted, and the molecular weight of the hyperbranched polymer is set to the aforementioned weight average molecular weight, and is set to 1 The hyperbranched polymer contains A structures derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride, B structures derived from glycidyl phenyl ether, and C structures derived from methyl The structure of glycidyl acrylate and D structures derived from benzyl alcohol. At this time, A × 294.22g/mol + B × 150.18g/mol + C × 142.15g/mol + D × 108.14g/mol = 10,000 , and the molar ratio of 3,3',4,4'-biphenyltetracarboxylic dianhydride, glycidyl phenyl ether, glycidyl methacrylate, and benzyl alcohol used is established A:B:C:D=80:100:67:23, so solving this equation means A=6.64, B=6.48, C=7.47, D=1.86.

根據以上內容,從前述分子量為平均值、以及從一個重複結構單元中必定存在一個源自3,3’,4,4’-聯苯四羧酸二酐的結構來看,超分支聚合物之重複結構單元的平均數量,係從A值減去會成為超分支聚合物之核的前述通式(1)中X 1的值,即5.64個,將此作為聚合物6之重複結構單元的合計數量。 According to the above content, from the perspective that the aforementioned molecular weight is an average value, and from the fact that there must be a structure derived from 3,3',4,4'-biphenyltetracarboxylic dianhydride in a repeating structural unit, the hyperbranched polymer is The average number of repeating structural units is calculated by subtracting the value of quantity.

[感光性樹脂組成物6的調製] 混合包含100質量份前述聚合物6之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、3’,4’-環氧環己基甲基 3,4-環氧環己烷羧酸酯(DAICEL公司製,CELLOXIDE 2021P)25質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.81質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.61質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.18質量份,調製組成物中固體成分為40質量%之感光性樹脂組成物6。 [Preparation of photosensitive resin composition 6] Mix 100 parts by mass of a solution containing the aforementioned polymer 6, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and 3',4'-epoxy 25 parts by mass of cyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (CELLOXIDE 2021P manufactured by DAICEL), 1.81 parts by mass of photopolymerization initiator (Irgacure OXE01 manufactured by BASF JAPAN), photopolymerization starter Photosensitive resin composition 6, which contains 3.61 parts by mass of agent (SPEEDCURE TPO manufactured by LAMBSON Co., Ltd.) and 0.18 parts by mass of surfactant (FZ-2122 manufactured by Dow Corning Toray Co., Ltd.), has a solid content of 40 mass % in the composition.

比較例1 [聚合物7的合成] 於具備加熱冷卻・攪拌裝置、回流冷卻管、及氮導入管之玻璃製燒瓶中,加入3,3’,4,4’-聯苯四羧酸二酐50.0g、苯二甲醇22.3g、四丁基氯化銨1.1g、及丙二醇單甲基醚乙酸酯73.41g,在氮氣體環境下於100℃反應4小時後,進一步加入苯甲基醇1.84g、及丙二醇單甲基醚乙酸酯1.84g,在氮氣體環境下於100℃反應8小時。於所得溶液中,進一步添加環氧丙基苯基醚25.52g、甲基丙烯酸環氧丙基酯7.25g、及丙二醇單甲基醚乙酸酯32.77g,在氮氣體環境下於100℃反應12小時,獲得包含聚合物7之溶液。以GPC測定重量平均分子量的結果,聚合物7之重量平均分子量(Mw)為5,800。又,聚合物7之酸價為76mgKOH/g,雙鍵當量為2100。 Comparative example 1 [Synthesis of Polymer 7] In a glass flask equipped with a heating, cooling and stirring device, a reflux cooling tube, and a nitrogen introduction tube, add 50.0g of 3,3',4,4'-biphenyltetracarboxylic dianhydride, 22.3g of benzenedimethanol, and tetracarboxylic acid dianhydride. 1.1g butylammonium chloride and 73.41g propylene glycol monomethyl ether acetate were reacted at 100°C for 4 hours in a nitrogen atmosphere, and then 1.84g benzyl alcohol and propylene glycol monomethyl ether acetate were added. 1.84g of ester was reacted at 100°C for 8 hours in a nitrogen atmosphere. To the obtained solution, 25.52g of glycidyl phenyl ether, 7.25g of glycidyl methacrylate, and 32.77g of propylene glycol monomethyl ether acetate were further added, and the reaction was carried out at 100°C for 12 seconds in a nitrogen atmosphere. hours, a solution containing polymer 7 was obtained. As a result of measuring the weight average molecular weight by GPC, the weight average molecular weight (Mw) of polymer 7 was 5,800. In addition, the acid value of polymer 7 is 76 mgKOH/g, and the double bond equivalent is 2100.

[感光性樹脂組成物7的調製] 混合包含100質量份前述聚合物7之溶液、乙氧基化-o-苯基苯酚丙烯酸酯(新中村化學工業公司製,A-LEN-10)50質量份、3’,4’-環氧環己基甲基 3,4-環氧環己烷羧酸酯(DAICEL公司製,CELLOXIDE 2021P)25質量份、光聚合起始劑(BASF JAPAN公司製,Irgacure OXE01)1.81質量份、光聚合起始劑(LAMBSON公司製,SPEEDCURE TPO)3.61質量份、及界面活性劑(Dow Corning Toray公司製,FZ-2122)0.18質量份,調製組成物中之固體成分為40質量%之感光性樹脂組成物7。 [Preparation of photosensitive resin composition 7] Mix 100 parts by mass of a solution containing the aforementioned polymer 7, 50 parts by mass of ethoxylated-o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Industry Co., Ltd., A-LEN-10), and 3',4'-epoxy 25 parts by mass of cyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (CELLOXIDE 2021P manufactured by DAICEL), 1.81 parts by mass of photopolymerization initiator (Irgacure OXE01 manufactured by BASF JAPAN), photopolymerization starter 3.61 parts by mass of agent (SPEEDCURE TPO manufactured by LAMBSON Co., Ltd.) and 0.18 parts by mass of surfactant (FZ-2122 manufactured by Dow Corning Toray Co., Ltd.), and the solid content in the prepared composition was 40 mass % of the photosensitive resin composition 7 .

[顯影性的評價] 使用旋塗機將前述感光性樹脂組成物1~7分別以表1所記載之膜厚塗佈於10cm×10cm四方之各玻璃基板上形成塗膜,於90℃之加熱板上加熱將該塗膜2分鐘完全去除溶劑。之後,對所得之塗膜使用0.3%Na 2CO 3水溶液進行鹼性顯影,並將塗膜被溶解去除的時間作為最小顯影時間,以下述基準進行顯影性的評價。 〇:最小顯影時間小於90秒。 △:最小顯影時間為90秒以上且180秒以下。 ×:最小顯影時間大於180秒。 [Evaluation of developability] The aforementioned photosensitive resin compositions 1 to 7 were each coated with a film thickness listed in Table 1 using a spin coater on each 10 cm × 10 cm square glass substrate to form a coating film, and heated at 90°C. The coating film was heated on the plate for 2 minutes to completely remove the solvent. Thereafter, the obtained coating film was subjected to alkaline development using a 0.3% Na 2 CO 3 aqueous solution, and the time required for the coating film to be dissolved and removed was regarded as the minimum development time, and the developability was evaluated based on the following criteria. 〇: The minimum development time is less than 90 seconds. △: The minimum development time is 90 seconds or more and 180 seconds or less. ×: The minimum development time is greater than 180 seconds.

[微透鏡圖型的製作] 使用旋塗機將前述感光性樹脂組成物2、3、5、6、及7分別以表1所記載之膜厚塗佈於10cm×10cm四方之各玻璃基板上形成塗膜,於90℃之加熱板上加熱將該塗膜2分鐘完全去除溶劑。之後,對所得之塗膜,通過每1cm 2具有100個直徑20μm孔洞開口部的圖型遮罩,以100mJ/cm 2照射超高壓水銀燈光(以i線換算之照度21mW/cm 2)。此外,以遮罩與基板之間隔(曝光間隙)為100μm進行曝光。之後,使用0.3%Na 2CO 3水溶液進行鹼性顯影。顯影時間係設為前述方法所測定之最小顯影時間的1.5倍。之後,進行水洗並以230℃進行30分鐘的後烘烤,製作微透鏡圖型。 [Preparation of Microlens Patterns] Use a spin coater to apply the aforementioned photosensitive resin compositions 2, 3, 5, 6, and 7 on each of the 10 cm × 10 cm square glass substrates at the film thicknesses listed in Table 1. A coating film was formed, and the coating film was heated on a hot plate at 90° C. for 2 minutes to completely remove the solvent. Thereafter, the obtained coating film was irradiated with an ultra-high-pressure mercury lamp at 100 mJ/cm 2 (illuminance converted to i-line: 21 mW/cm 2 ) through a pattern mask having 100 openings of 20 μm diameter holes per 1 cm 2 . In addition, exposure was performed with the distance (exposure gap) between the mask and the substrate being 100 μm. After that, alkaline development was performed using 0.3% Na 2 CO 3 aqueous solution. The development time is set to 1.5 times the minimum development time measured by the aforementioned method. After that, it is washed with water and post-baked at 230°C for 30 minutes to produce a microlens pattern.

[折射率的測定] 使用旋塗機將前述感光性樹脂組成物1~7分別塗佈於10cm×10cm四方之各玻璃基板上形成塗膜,於90℃之加熱板上加熱該塗膜2分鐘完全去除溶劑。之後,對所得之塗膜,以100mJ/cm 2全面照射超高壓水銀燈(以i線換算之照度21mW/cm 2)。之後,使用0.3%Na 2CO 3水溶液進行鹼性顯影。顯影時間係設為前述方法所測定之最小顯影時間的1.5倍。之後,進行水洗並以230℃進行30分鐘的後烘烤形成硬化膜。對於所得之硬化膜使用折射率測定裝置2010型稜鏡耦合儀(Metricon公司製,Model 2010 Prism Coupler)測定594nm之折射率。 [Measurement of refractive index] Use a spin coater to apply the aforementioned photosensitive resin compositions 1 to 7 on each glass substrate measuring 10 cm x 10 cm to form a coating film, and heat the coating film on a 90°C hot plate for 2 minutes. Remove solvent completely. Thereafter, the entire coating film obtained was irradiated with an ultrahigh-pressure mercury lamp at 100 mJ/cm 2 (illuminance converted to i-line: 21 mW/cm 2 ). After that, alkaline development was performed using 0.3% Na 2 CO 3 aqueous solution. The development time is set to 1.5 times the minimum development time measured by the aforementioned method. Thereafter, it was washed with water and post-baked at 230° C. for 30 minutes to form a cured film. The refractive index of the obtained cured film was measured at 594 nm using a refractive index measuring device 2010 Model 2010 Prism Coupler (manufactured by Metricon Corporation, Model 2010 Prism Coupler).

[微透鏡形狀的評價] 以掃描電子顯微鏡(SEM)觀察前述製作完成之微透鏡,並以下述基準評價微透鏡形狀。 〇:為半球狀,透鏡形狀良好。 ×:因過度熔化而無法形成透鏡形狀。 [Evaluation of microlens shape] The microlenses produced as described above were observed with a scanning electron microscope (SEM), and the shape of the microlenses was evaluated based on the following criteria. 〇: It is hemispherical and the lens shape is good. ×: Unable to form a lens shape due to excessive melting.

[表1] [Table 1]

本發明之感光性樹脂組成物1~6(實施例1~6),可製作即便在使用弱鹼性顯影液時亦可在短時間內顯影,且折射率為1.60以上之高折射率的硬化物。又,使用本發明之聚合物而製作的硬化物,其透明性高且著色少。The photosensitive resin compositions 1 to 6 (Examples 1 to 6) of the present invention can be developed in a short time even when using a weak alkaline developer, and can produce hardened products with a high refractive index of 1.60 or more. things. In addition, the cured product produced using the polymer of the present invention has high transparency and little coloration.

[產業上之可利用性] 本發明之聚合物、及含有該聚合物之硬化性樹脂組成物可適合用作透鏡(微透鏡)、光間隔件、隔壁材料、層間絕緣膜材料、保護膜材料、光波導材料、或平坦化膜材料的原料。 [Industrial availability] The polymer of the present invention and the curable resin composition containing the polymer can be suitably used as lenses (microlenses), optical spacers, barrier rib materials, interlayer insulating film materials, protective film materials, optical waveguide materials, or planarization Raw materials for membrane materials.

(無)(without)

Claims (17)

一種下述通式(1)所示聚合物: [化學式1] (式中,X 1為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代;4個R 1各自獨立為氫、下述通式(2-1)或(2-2)所示有機基A、下述通式(3)所示有機基B、或者具有重複結構單元之有機基C,該重複結構單元係選自於由下述通式(4-1)及/或(4-2)所示重複結構單元、下述通式(5-1)及/或(5-2)所示重複結構單元、下述通式(6-1)及/或(6-2)所示重複結構單元、下述通式(7-1)及/或(7-2)所示重複結構單元、下述通式(8-1)及/或(8-2)所示重複結構單元、以及下述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上,4個R 1之中至少1個為前述有機基C); [化學式2] (式中,R 2為碳數15以下之有機基,亦可與羥基所鍵結之碳原子及其相鄰碳原子共同形成環); [化學式3] (式中,R 3為碳數15以下之有機基); [化學式4] (式中,R 4為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 2為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式5] (式中,R 5為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 3為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式6] (式中,R 6為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 7為碳數15以下之有機基;X 4為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式7] (式中,R 8為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;X 5為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式8] (式中,R 9為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 10為碳數15以下之有機基;X 6為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代); [化學式9] (式中,R 11為碳數15以下之有機基,亦可與氧原子所鍵結之碳原子及其相鄰碳原子共同形成環;R 12及R 13分別獨立為碳數15以下之有機基;X 7為芳香族烴基、脂環式飽和烴基、脂環式不飽和烴基、包含雜環的有機基、或此等中之2種以上鍵結而成之有機基,前述雜環中構成前述烴基之碳原子的一部分被雜原子取代)。 A polymer represented by the following general formula (1): [Chemical Formula 1] (In the formula , A part of the carbon atoms constituting the aforementioned hydrocarbon group are substituted by heteroatoms; each of the four R 1s is independently hydrogen, the organic group A represented by the following general formula (2-1) or (2-2), the following general formula (3 ) represented by the organic group B, or the organic group C having a repeating structural unit, the repeating structural unit is selected from the repeating structural units represented by the following general formulas (4-1) and/or (4-2), the following The repeating structural unit represented by the following general formula (5-1) and/or (5-2), the repeating structural unit represented by the following general formula (6-1) and/or (6-2), the following general formula ( Repeating structural units represented by 7-1) and/or (7-2), repeating structural units represented by the following general formula (8-1) and/or (8-2), and the following general formula (9-1 ) and/or (9-2), at least one of the groups of repeating structural units represented by (9-2), at least one of the four R 1s is the aforementioned organic group C); [Chemical Formula 2] (In the formula, R 2 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom to which the hydroxyl group is bonded and its adjacent carbon atoms); [Chemical Formula 3] (In the formula, R 3 is an organic group with less than 15 carbon atoms); [Chemical Formula 4] (In the formula, R 4 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bonded to the oxygen atom and its adjacent carbon atoms; X 2 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 5 ] (In the formula, R 5 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 3 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 6 ] (In the formula, R 6 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 7 is an organic group with less than 15 carbon atoms; X 4 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 7] (In the formula, R 8 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; X 5 is an aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an aliphatic A cyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group in which two or more of these are bonded, and a part of the carbon atoms constituting the aforementioned hydrocarbon group in the aforementioned heterocyclic ring is replaced by a heteroatom); [Chemical Formula 8 ] (In the formula, R 9 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 10 is an organic group with less than 15 carbon atoms; X 6 is An aromatic hydrocarbon group, an alicyclic saturated hydrocarbon group, an alicyclic unsaturated hydrocarbon group, an organic group containing a heterocyclic ring, or an organic group formed by bonding two or more of these, the carbon atoms in the aforementioned heterocyclic ring constituting the aforementioned hydrocarbon group Part of is replaced by heteroatoms); [Chemical Formula 9] (In the formula, R 11 is an organic group with less than 15 carbon atoms, and can also form a ring with the carbon atom bound to the oxygen atom and its adjacent carbon atoms; R 12 and R 13 are independently an organic group with less than 15 carbon atoms. group ; A part of the carbon atoms of the aforementioned hydrocarbon group is replaced by a heteroatom). 如請求項1之聚合物,其中前述有機基C具有選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、以及前述通式(6-1)及/或(6-2)所示重複結構單元所構成群組中之1種以上重複結構單元。The polymer of claim 1, wherein the aforementioned organic group C has a repeating structural unit selected from the group consisting of repeating structural units represented by the aforementioned general formulas (4-1) and/or (4-2), the aforementioned general formulas (5-1) and/ Or one or more repeating structural units in the group consisting of the repeating structural unit represented by (5-2) and the repeating structural unit represented by the aforementioned general formula (6-1) and/or (6-2). 如請求項1之聚合物,其中前述聚合物具有羧基。The polymer of claim 1, wherein the aforementioned polymer has a carboxyl group. 如請求項1之聚合物,其中前述R 2、前述R 4、前述R 5、前述R 6、前述R 8、前述R 9、及前述R 11分別獨立為包含(甲基)丙烯醯氧基之有機基、包含芳香族烴基之有機基、包含烯丙基之有機基、包含矽基之有機基、或包含環狀醚基之有機基。 The polymer of claim 1, wherein the aforementioned R 2 , the aforementioned R 4 , the aforementioned R 5 , the aforementioned R 6 , the aforementioned R 8 , the aforementioned R 9 , and the aforementioned R 11 are each independently a group containing a (meth)acryloxy group. Organic group, an organic group containing an aromatic hydrocarbon group, an organic group containing an allyl group, an organic group containing a silicon group, or an organic group containing a cyclic ether group. 如請求項1之聚合物,其中前述R 3、前述R 7、前述R 10、前述R 12、及前述R 13分別獨立為包含環狀醚基之有機基、包含(甲基)丙烯醯氧基之有機基、或包含芳香族烴基之有機基。 The polymer of claim 1, wherein the aforementioned R 3 , the aforementioned R 7 , the aforementioned R 10 , the aforementioned R 12 , and the aforementioned R 13 are each independently an organic group containing a cyclic ether group and a (meth)acryloxy group. organic groups, or organic groups containing aromatic hydrocarbon groups. 如請求項1之聚合物,其中前述X 1、前述X 2、前述X 3、前述X 4、前述X 5、前述X 6、及前述X 7分別獨立為芳香族烴基。 The polymer of claim 1, wherein the aforementioned X 1 , the aforementioned X 2 , the aforementioned X 3 , the aforementioned X 4 , the aforementioned X 5 , the aforementioned X 6 , and the aforementioned X 7 are each independently an aromatic hydrocarbon group. 如請求項1之聚合物,其中前述聚合物1分子中含有合計3~300個重複結構單元,該重複結構單元係選自於由前述通式(4-1)及/或(4-2)所示重複結構單元、前述通式(5-1)及/或(5-2)所示重複結構單元、前述通式(6-1)及/或(6-2)所示重複結構單元、前述通式(7-1)及/或(7-2)所示重複結構單元、前述通式(8-1)及/或(8-2)所示重複結構單元、以及前述通式(9-1)及/或(9-2)所示重複結構單元所構成群組中之1種以上。The polymer of claim 1, wherein the aforementioned polymer contains a total of 3 to 300 repeating structural units in one molecule, and the repeating structural units are selected from the group consisting of the aforementioned general formulas (4-1) and/or (4-2) The repeating structural unit shown, the repeating structural unit represented by the aforementioned general formula (5-1) and/or (5-2), the repeating structural unit represented by the aforementioned general formula (6-1) and/or (6-2), The repeating structural unit represented by the aforementioned general formula (7-1) and/or (7-2), the repeating structural unit represented by the aforementioned general formula (8-1) and/or (8-2), and the aforementioned general formula (9 -1) and/or (9-2) more than one type in the group consisting of the repeating structural units. 如請求項1之聚合物,其中前述聚合物之酸價為20~120mgKOH/g。Such as the polymer of claim 1, wherein the acid value of the aforementioned polymer is 20~120mgKOH/g. 如請求項1之聚合物,其中前述聚合物之雙鍵當量為200~5000。Such as the polymer of claim 1, wherein the double bond equivalent of the aforementioned polymer is 200~5000. 如請求項1之聚合物,其中前述聚合物之重量平均分子量為1500~100000。The polymer of claim 1, wherein the weight average molecular weight of the aforementioned polymer is 1,500~100,000. 如請求項1之聚合物,其中前述聚合物的原料包含四羧酸及/或四羧酸二酐、含羥基化合物、以及含環氧基化合物。The polymer of claim 1, wherein the raw materials of the aforementioned polymer include tetracarboxylic acid and/or tetracarboxylic dianhydride, hydroxyl-containing compounds, and epoxy-containing compounds. 一種硬化性樹脂組成物,至少含有如請求項1至11中任一項之聚合物、聚合性單體、及聚合起始劑。A curable resin composition containing at least the polymer according to any one of claims 1 to 11, a polymerizable monomer, and a polymerization initiator. 如請求項12之硬化性樹脂組成物,其為負型光阻劑材料。The curable resin composition of claim 12 is a negative photoresist material. 一種硬化物,係由如請求項13之硬化性樹脂組成物而得者。A cured product obtained from the curable resin composition of claim 13. 如請求項14之硬化物,其中前述硬化物為透鏡、光間隔件、隔壁材料、層間絕緣膜材料、保護膜材料、光波導材料、或平坦化膜材料。The cured article of claim 14, wherein the cured article is a lens, an optical spacer, a partition wall material, an interlayer insulating film material, a protective film material, an optical waveguide material, or a planarizing film material. 一種固態攝影元件,包含如請求項14或15之硬化物。A solid-state photographic element including a hardened object according to claim 14 or 15. 一種影像顯示裝置,包含如請求項14或15之硬化物。An image display device comprising the hardened object of claim 14 or 15.
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