TW202324149A - 強健的張量塑形設定點波形串流化控制 - Google Patents

強健的張量塑形設定點波形串流化控制 Download PDF

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Publication number
TW202324149A
TW202324149A TW111139835A TW111139835A TW202324149A TW 202324149 A TW202324149 A TW 202324149A TW 111139835 A TW111139835 A TW 111139835A TW 111139835 A TW111139835 A TW 111139835A TW 202324149 A TW202324149 A TW 202324149A
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TW
Taiwan
Prior art keywords
setpoint
waveform
module
setpoint waveform
streaming
Prior art date
Application number
TW111139835A
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English (en)
Chinese (zh)
Inventor
查德 Ｓ 賽謬爾斯
Original Assignee
新加坡商Aes 全球公司
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Publication date
Application filed by 新加坡商Aes 全球公司 filed Critical 新加坡商Aes 全球公司
Publication of TW202324149A publication Critical patent/TW202324149A/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32926—Software, data control or modelling

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Measurement And Recording Of Electrical Phenomena And Electrical Characteristics Of The Living Body (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Measuring Pulse, Heart Rate, Blood Pressure Or Blood Flow (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
TW111139835A 2021-10-25 2022-10-20 強健的張量塑形設定點波形串流化控制 TW202324149A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/509,539 2021-10-25
US17/509,539 US12300464B2 (en) 2021-10-25 2021-10-25 Robust tensorized shaped setpoint waveform streaming control

Publications (1)

Publication Number Publication Date
TW202324149A true TW202324149A (zh) 2023-06-16

Family

ID=86057270

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111139835A TW202324149A (zh) 2021-10-25 2022-10-20 強健的張量塑形設定點波形串流化控制

Country Status (5)

Country Link
US (2) US12300464B2 (https=)
EP (1) EP4423792A4 (https=)
JP (1) JP2024545563A (https=)
TW (1) TW202324149A (https=)
WO (1) WO2023076079A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12360512B2 (en) 2022-03-03 2025-07-15 Advanced Energy Industries, Inc. Multi-step predictive control system
US12272536B2 (en) * 2022-03-03 2025-04-08 Advanced Energy Industries, Inc. Systems and methods for delay and amplitude correction

Family Cites Families (23)

* Cited by examiner, † Cited by third party
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JP2008218898A (ja) * 2007-03-07 2008-09-18 Hitachi High-Technologies Corp プラズマ処理装置
US8258874B2 (en) 2008-12-31 2012-09-04 Advanced Energy Industries, Inc. Dual-mode control of a power generator
US8040068B2 (en) 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
US8659335B2 (en) 2009-06-25 2014-02-25 Mks Instruments, Inc. Method and system for controlling radio frequency power
US8716984B2 (en) 2009-06-29 2014-05-06 Advanced Energy Industries, Inc. Method and apparatus for modifying the sensitivity of an electrical generator to a nonlinear load
US8916793B2 (en) * 2010-06-08 2014-12-23 Applied Materials, Inc. Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow
US9309594B2 (en) * 2010-04-26 2016-04-12 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution of a projected plasma
US8773019B2 (en) * 2012-02-23 2014-07-08 Mks Instruments, Inc. Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing
JP6063776B2 (ja) * 2013-03-04 2017-01-18 東京エレクトロン株式会社 基板搬送経路の決定方法、基板搬送装置、基板処理装置及びプログラム
US10049857B2 (en) 2014-12-04 2018-08-14 Mks Instruments, Inc. Adaptive periodic waveform controller
US9721758B2 (en) 2015-07-13 2017-08-01 Mks Instruments, Inc. Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
US10395895B2 (en) 2015-08-27 2019-08-27 Mks Instruments, Inc. Feedback control by RF waveform tailoring for ion energy distribution
CN107219478A (zh) * 2016-03-22 2017-09-29 西门子(深圳)磁共振有限公司 一种磁共振成像系统的谱仪和信号处理板
US10571551B2 (en) * 2016-05-05 2020-02-25 Rohde & Schwarz Gmbh & Co. Kg Signal generation device and method
US10546724B2 (en) * 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US10396601B2 (en) * 2017-05-25 2019-08-27 Mks Instruments, Inc. Piecewise RF power systems and methods for supplying pre-distorted RF bias voltage signals to an electrode in a processing chamber
CN115662868A (zh) * 2017-07-07 2023-01-31 先进能源工业公司 等离子体功率输送系统的周期间控制系统及其操作方法
JP7121506B2 (ja) * 2018-03-14 2022-08-18 株式会社日立ハイテク 探索装置、探索方法及びプラズマ処理装置
JP7170422B2 (ja) * 2018-05-15 2022-11-14 東京エレクトロン株式会社 処理装置
US11042140B2 (en) 2018-06-26 2021-06-22 Mks Instruments, Inc. Adaptive control for a power generator
US11626907B2 (en) * 2019-06-19 2023-04-11 Analogic Corporation Radio frequency generators, and related systems, methods, and devices
WO2022169518A1 (en) * 2021-02-05 2022-08-11 Lam Research Corporation Duty cycle control to achieve uniformity
US11715624B2 (en) * 2021-08-09 2023-08-01 Mks Instruments, Inc. Adaptive pulse shaping with post match sensor

Also Published As

Publication number Publication date
JP2024545563A (ja) 2024-12-10
US12300464B2 (en) 2025-05-13
US20250253134A1 (en) 2025-08-07
EP4423792A4 (en) 2025-09-17
EP4423792A1 (en) 2024-09-04
US20230125521A1 (en) 2023-04-27
WO2023076079A1 (en) 2023-05-04

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