TW202323473A - Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet and device manufacturing method that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film - Google Patents

Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet and device manufacturing method that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film Download PDF

Info

Publication number
TW202323473A
TW202323473A TW111145413A TW111145413A TW202323473A TW 202323473 A TW202323473 A TW 202323473A TW 111145413 A TW111145413 A TW 111145413A TW 111145413 A TW111145413 A TW 111145413A TW 202323473 A TW202323473 A TW 202323473A
Authority
TW
Taiwan
Prior art keywords
protective film
film
forming
workpiece
sheet
Prior art date
Application number
TW111145413A
Other languages
Chinese (zh)
Inventor
田中佑耶
山下茂之
Original Assignee
日商琳得科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW202323473A publication Critical patent/TW202323473A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/062Copolymers with monomers not covered by C09D133/06
    • C09D133/068Copolymers with monomers not covered by C09D133/06 containing glycidyl groups
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • C09D7/62Additives non-macromolecular inorganic modified by treatment with other compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/70Additives characterised by shape, e.g. fibres, flakes or microspheres
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesive Tapes (AREA)
  • Dicing (AREA)
  • Laser Beam Processing (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

The present invention provides a protective film-forming film that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film, a protective film-forming sheet and a protective film-forming composite sheet including the protective film-forming film , and a method for manufacturing devices such as semiconductor devices. The protective film-forming film is a protective film-forming film that becomes a protective film after curing, wherein, when the cured protective film-forming film is subjected to a right-angle tear test at 23 DEG C, the right-angle tear strength is 10 N/mm or more. In addition, in the right-angle tear test, the elongation at break of the cured protective film-forming film is 10% or less.

Description

保護膜形成膜、保護膜形成用片、保護膜形成用複合片及裝置的製造方法Film for forming protective film, sheet for forming protective film, composite sheet for forming protective film, and manufacturing method of device

本發明是有關於保護膜形成膜、保護膜形成用片、保護膜形成用複合片及裝置的製造方法。特別是有關於一種適合用於保護半導體晶圓等工件或對工件進行加工而得到的半導體晶片等加工物的保護膜形成膜、具備該保護膜形成膜的保護膜形成用片及保護膜形成用複合片、以及具備半導體晶片等的裝置的製造方法。The present invention relates to a protective film forming film, a sheet for forming a protective film, a composite sheet for forming a protective film, and a method for producing a device. In particular, it relates to a protective film forming film suitable for protecting a workpiece such as a semiconductor wafer or a processed product such as a semiconductor wafer obtained by processing a workpiece, a sheet for forming a protective film provided with the protective film forming film, and a sheet for forming a protective film. A method for manufacturing a composite sheet and a device including a semiconductor wafer or the like.

近年來,利用一種被稱作倒裝晶片鍵合(Flip-Chip Bonding)的安裝方法製造半導體裝置。該安裝方法中,在安裝具有形成有凸點(bump)等凸狀電極的電路面的半導體晶片時,會以半導體晶片的電路面與基板的晶片搭載面相對的方式將半導體晶片翻轉(倒裝(face down)),從而使半導體晶片的電路面與基板的晶片搭載面以無線方式接合。因此,半導體晶片的與電路面為相反側的面(未形成電路的面,以下也稱作背面)會露出於外部。In recent years, semiconductor devices have been manufactured using a mounting method called flip-chip bonding (Flip-Chip Bonding). In this mounting method, when mounting a semiconductor wafer having a circuit surface on which protruding electrodes such as bumps are formed, the semiconductor wafer is turned over (flip-chip) in such a manner that the circuit surface of the semiconductor wafer faces the wafer mounting surface of the substrate. (face down)), so that the circuit surface of the semiconductor chip and the chip mounting surface of the substrate are wirelessly bonded. Therefore, the surface of the semiconductor wafer opposite to the circuit surface (the surface on which no circuit is formed, hereinafter also referred to as the back surface) is exposed to the outside.

若半導體晶片的背面露出於外部,則有可能在之後的步驟中發生因運輸時等的衝擊造成的破裂或缺損等的崩邊(chipping)。因此,為了保護半導體晶片以避免發生這種崩邊,較多情況下會在半導體晶片的背面形成由有機材料構成的硬質的樹脂膜作為保護膜。If the back surface of the semiconductor wafer is exposed to the outside, chipping such as cracking or chipping due to impacts during transportation or the like may occur in subsequent steps. Therefore, in order to protect the semiconductor wafer from such edge chipping, a hard resin film made of an organic material is often formed as a protective film on the back surface of the semiconductor wafer.

這種保護膜藉由使作為其前驅物的未固化的樹脂膜(以下,也稱作保護膜形成膜)固化而形成。保護膜形成膜被貼附於半導體晶圓的背面,在保護膜形成膜固化前或固化後,半導體晶圓與保護膜形成膜或保護膜被切割而分割(單顆化)成複數個小片。在保護膜形成膜固化前的情況下,保護膜形成膜在分割後進行固化。由此得到的分割而成的小片為背面具有保護膜的半導體晶片(附保護膜的半導體晶片)。Such a protective film is formed by curing an uncured resin film (hereinafter, also referred to as a protective film forming film) as its precursor. The protective film forming film is attached to the back surface of the semiconductor wafer. Before or after the protective film forming film is cured, the semiconductor wafer and the protective film forming film or protective film are diced and divided (singulated) into a plurality of small pieces. Before the protective film forming film is cured, the protective film forming film is cured after being divided. The divided small pieces thus obtained are semiconductor wafers (semiconductor wafers with protective films) having a protective film on their back surfaces.

作為藉由切割將半導體晶圓等工件單顆化的方法,除了在對工件噴灑以清洗及冷卻等為目的的液體的同時使用旋轉刀片對其進行切割的刀片切割以外,還已知有隱形切割((Stealth-dicing)註冊商標)。Stealth dicing is also known as a method of singulating workpieces such as semiconductor wafers by dicing, in addition to blade dicing in which a rotating blade is used to cut the workpiece while spraying liquid for cleaning, cooling, etc. ((Stealth-dicing) registered trademark).

對於隱形切割,首先,使雷射聚焦於工件的內部而沿著分割預定線形成改質區域。改質區域是因雷射照射使得強度變得低於其他區域的區域,其沿著工件的厚度方向產生裂紋。接著,使拉伸力沿與厚度方向垂直的方向作用於形成有改質區域的工件,利用拉伸應力將改質區域中所產生的裂紋延伸至工件的兩個主面。最終工件沿著分割預定線被分割成複數個小片(被單顆化)。For stealth dicing, first, a laser is focused on the inside of the workpiece to form modified regions along planned dividing lines. The modified region is a region whose intensity becomes lower than other regions due to laser irradiation, which generates cracks along the thickness direction of the workpiece. Next, a tensile force is applied to the workpiece with the modified region formed in a direction perpendicular to the thickness direction, and the cracks generated in the modified region are extended to both main surfaces of the workpiece by the tensile stress. The final workpiece is divided into a plurality of small pieces along the planned dividing line (singulated).

作為使拉伸力作用於工件的方法,可示例出如下方法:將貼附有具有伸縮性的膠帶或片材的工件載置於工作臺上,並將膠帶或片材沿著與工件的厚度方向相垂直的方向拉伸(擴展)的方法。As a method of applying tensile force to the workpiece, the following method can be exemplified: placing the workpiece with an elastic tape or sheet on the table, and placing the tape or sheet along the thickness of the workpiece. A method of stretching (expanding) in a direction perpendicular to the direction.

此時,在形成於工件背面的保護膜上也會產生拉伸應力,需要在分割工件的同時,將保護膜也分割成與晶片形狀大致相同的形狀。At this time, tensile stress is also generated on the protective film formed on the back surface of the workpiece, and it is necessary to divide the protective film into substantially the same shape as the wafer while dividing the workpiece.

作為可在隱形切割中進行擴展時與晶片一同被適當分割的保護膜形成膜的一個例子,專利文獻1公開了一種在0℃下的斷裂應力與斷裂應變之乘積在規定範圍內的保護膜形成膜。 現有技術文獻 專利文獻 As an example of a protective film forming film that can be appropriately divided together with a wafer when spreading in stealth dicing, Patent Document 1 discloses a protective film forming film whose product of breaking stress and breaking strain at 0°C is within a predetermined range. membrane. prior art literature patent documents

專利文獻1:日本特開2016-115943號公報Patent Document 1: Japanese Patent Laid-Open No. 2016-115943

本發明要解決的技術問題The technical problem to be solved in the present invention

然而,其存在如下問題:即便在工件上產生了擴展帶來的拉伸應力,也未能沿著分割預定線而被分割,導致無法得到規定數量的附保護膜的晶片,晶片成品率降低。認為導致該問題的主要原因在於,擴展時保護膜未能被確實地分割。對此,為了使保護膜容易分割,提出了一種低溫下的擴展(冷擴展),然而,卻存在需要較多時間及能源來將擴展裝置等冷卻至低溫的問題。However, there is a problem that even if tensile stress due to expansion occurs on the workpiece, it cannot be divided along the planned dividing line, so that a predetermined number of wafers with protective films cannot be obtained, and the yield of wafers decreases. The main cause of this problem is considered to be that the protective film was not reliably divided during expansion. On the other hand, expansion at low temperature (cold expansion) has been proposed in order to make the protective film easy to split, however, there is a problem that it takes a lot of time and energy to cool the expansion device etc. to a low temperature.

此外,本申請的發明人發現,當降低保護膜的強度而使保護膜容易分割時,有時會因擴展前所施加的衝擊等而意外地使保護膜被分割。當並非因擴展而被分割,而是由於衝擊等而使保護膜被分割時,存在俯視保護膜時的保護膜的外周邊線為鋸齒線而非直線的傾向。這種保護膜的外周邊線為鋸齒線的晶片會被判定為外觀不良,存在晶片成品率降低的問題。In addition, the inventors of the present application found that when the strength of the protective film is lowered to make the protective film easily split, the protective film may be accidentally split due to impact or the like applied before expansion. When the protective film is divided not by expansion but by impact or the like, the outer peripheral line of the protective film tends to be a zigzag line rather than a straight line when the protective film is viewed from above. A wafer whose outer peripheral line of the protective film is a jagged line is judged to be poor in appearance, and there is a problem that the yield of the wafer decreases.

本發明鑒於上述實際情況而進行,其目的在於提供一種附保護膜的工件的分割性良好且能夠抑制分割後的保護膜的外觀不良的保護膜形成膜、具備該保護膜形成膜的保護膜形成用片及保護膜形成用複合片、以及半導體裝置等裝置的製造方法。 解決技術問題的技術手段 The present invention was made in view of the above-mentioned circumstances, and an object of the present invention is to provide a protective film-forming film capable of suppressing poor appearance of a protective film after separation, and a protective film forming film provided with the protective film-forming film. A method of manufacturing a sheet, a composite sheet for forming a protective film, and a device such as a semiconductor device. Technical means to solve technical problems

本發明的技術方案如下所示。 (1) 一種保護膜形成膜,其為在固化後成為保護膜的保護膜形成膜,其中,在23℃下,對固化後的保護膜形成膜實施直角撕裂試驗時,直角撕裂強度為10N/mm以上,且在該直角撕裂試驗中,固化後的保護膜形成膜斷裂時的伸長率為10%以下。 (2) 根據(1)所述的保護膜形成膜,其中,保護膜為熱固化物或能量射線固化物。 (3) 根據(1)或(2)所述的保護膜形成膜,其中,直角撕裂強度為25N/mm以下。 (4) 根據(1)~(3)中任一項所述的保護膜形成膜,其用於藉由使雷射聚焦於保護膜從而形成改質區域。 (5) 一種保護膜形成用片,其具有(1)~(4)中任一項所述的保護膜形成膜與以能夠剝離的方式配置於保護膜形成膜的至少一個主面的剝離膜。 (6) 一種保護膜形成用複合片,其具有(1)~(4)中任一項所述的保護膜形成膜與支撐保護膜形成膜的支撐片。 (7) 根據(6)所述的保護膜形成用複合片,其中,在將23℃下的固化後的保護膜形成膜的直角撕裂強度設為TS1,並將在23℃下對支撐片實施直角撕裂試驗時的支撐片的直角撕裂強度設為TS2時,TS1/TS2為0.15以下。 (8) 一種裝置的製造方法,其具有: 將保護膜形成膜貼附於工件的背面的步驟; 使所貼附的保護膜形成膜固化,從而在工件的背面形成保護膜,得到附保護膜的工件的步驟; 使雷射聚焦於工件內部的事先設定的區域,從而形成第一改質區域的步驟; 使雷射聚焦於保護膜內部的事先設定的區域,從而形成第二改質區域的步驟;及 使拉伸力作用於形成有所述第一改質區域及所述第二改質區域的附保護膜的工件,從而將該附保護膜的工件單顆化,得到複數個附保護膜的工件加工物的步驟。 (9) 根據(8)所述的裝置的製造方法,其中,保護膜形成膜為(5)所述的保護膜形成用片所具備的保護膜形成膜、或者(6)或(7)所述的保護膜形成用複合片所具備的保護膜形成膜。 發明效果 Technical scheme of the present invention is as follows. (1) A protective film-forming film, which is a protective film-forming film that becomes a protective film after curing, wherein, at 23° C., when the cured protective film-forming film is subjected to a right-angle tear test, the right-angle tear strength is 10 N/mm or more, and in the right-angle tear test, the elongation of the cured protective film-forming film at rupture is 10% or less. (2) The protective film forming film as described in (1) whose protective film is a thermosetting material or an energy-beam hardening material. (3) The protective film forming film as described in (1) or (2) whose right-angle tear strength is 25 N/mm or less. (4) The protective film-forming film according to any one of (1) to (3), which is used to form a modified region by focusing laser light on the protective film. (5) A sheet for forming a protective film comprising the protective film forming film according to any one of (1) to (4) and a release film disposed on at least one main surface of the protective film forming film in a releasable manner . (6) A composite sheet for forming a protective film, comprising the protective film forming film according to any one of (1) to (4), and a support sheet for supporting the protective film forming film. (7) The composite sheet for forming a protective film according to (6), wherein the right-angle tear strength of the protective film-forming film after curing at 23° C. is TS1, and the protective film forming film at 23° C. When the right-angle tear strength of the support sheet when performing the right-angle tear test is TS2, TS1/TS2 is 0.15 or less. (8) A method of manufacturing a device, comprising: a step of attaching a protective film forming film to the back surface of the workpiece; making the attached protective film forming film solidified, thereby forming a protective film on the back side of the workpiece to obtain a workpiece with a protective film; Focusing the laser on a pre-set area inside the workpiece, thereby forming a first modified area; Focusing the laser on a predetermined area inside the protective film to form a second modified area; and applying a tensile force to the workpiece with a protective film on which the first modified region and the second modified region are formed, thereby singulating the workpiece with a protective film to obtain a plurality of workpieces with a protective film Processed product steps. (9) The method for manufacturing a device according to (8), wherein the protective film forming film is the protective film forming film included in the protective film forming sheet described in (5), or the protective film forming film described in (6) or (7). The protective film forming film which the composite sheet for protective film formation mentioned above is equipped with. Invention effect

根據本發明,能夠提供一種附保護膜的工件的分割性良好且能夠抑制分割後的保護膜的外觀不良的保護膜形成膜、具備該保護膜形成膜的保護膜形成用片及保護膜形成用複合片、以及半導體裝置等裝置的製造方法。According to the present invention, it is possible to provide a protective film forming film which has good splittability of a workpiece with a protective film and which can suppress the appearance defect of the divided protective film, a protective film forming sheet and a protective film forming sheet comprising the protective film forming film. A method for manufacturing devices such as a composite sheet and a semiconductor device.

以下,基於具體的實施形態,利用附圖對本發明進行詳細說明。首先,對本說明書中使用的主要術語進行說明。Hereinafter, based on specific embodiments, the present invention will be described in detail using the drawings. First, the main terms used in this specification will be explained.

工件為貼附本實施形態的保護膜形成用片或保護膜形成用複合片並待加工的板狀體。作為工件,例如可列舉出晶圓、面板。具體可列舉出半導體晶圓、半導體面板。作為工件加工物,例如可列舉出將晶圓單顆化而得到的晶片。具體可示例出將半導體晶圓單顆化而得到的半導體晶片。The workpiece is a plate-shaped body to be processed by attaching the sheet for forming a protective film or the composite sheet for forming a protective film according to the present embodiment. Examples of the workpiece include wafers and panels. Specific examples thereof include semiconductor wafers and semiconductor panels. Examples of workpiece processed products include wafers obtained by singulating wafers. Specifically, a semiconductor wafer obtained by singulating a semiconductor wafer can be exemplified.

晶圓等工件的「表面」是指形成有電路、凸點等凸狀電極等的面,「背面」是指未形成電路、電極(例如凸點等凸狀電極)等的面。保護膜形成於晶圓及晶片的背面。The "surface" of a workpiece such as a wafer refers to the surface on which circuits and convex electrodes such as bumps are formed, and the "back surface" refers to the surface on which no circuits or electrodes (such as convex electrodes such as bumps) are formed. The protective film is formed on the wafer and the backside of the chip.

晶圓的單顆化是指以每個電路分割晶圓而得到晶片。Singulation of a wafer refers to obtaining a wafer by dividing the wafer for each circuit.

在本說明書中,例如「(甲基)丙烯酸酯」是指用於表示「丙烯酸酯」及「甲基丙烯酸酯」這兩者的術語,其他類似表述也相同。In this specification, for example, "(meth)acrylate" is a term used to represent both "acrylate" and "methacrylate", and other similar expressions are also the same.

「能量射線」是指紫外線、電子束等,較佳為紫外線。"Energy rays" refer to ultraviolet rays, electron beams, etc., preferably ultraviolet rays.

剝離膜為以能夠剝離的方式支撐黏著劑層或保護膜形成膜的膜。對於膜這一術語,以包含片材的概念而使用,並不限定其厚度。The release film is a film that supports the adhesive layer or the protective film forming film in a peelable manner. The term "film" is used to include the concept of a sheet and does not limit its thickness.

與保護膜形成膜用組合物等組合物相關的說明中的質量比,以有效成分(固含量)為基準,只要沒有特殊說明,則不計入溶劑。The mass ratio in the description of compositions such as the protective film-forming composition is based on the active ingredient (solid content), and the solvent is not included unless otherwise specified.

(1. 保護膜形成膜) 本實施形態的保護膜形成膜可用於形成貼附於工件且用以保護工件或工件加工物的保護膜。 (1. Protective film forming film) The protective film-forming film of this embodiment can be used to form a protective film that is attached to a workpiece and protects a workpiece or a processed workpiece.

(1.1 保護膜) 在本實施形態中,保護膜可藉由使本實施形態的保護膜形成膜固化而得到。即,本實施形態的保護膜形成膜為固化性。藉由在將固化性保護膜形成膜與工件重疊後,使保護膜形成膜固化,能夠將保護膜牢固地黏合在工件上,形成具有耐久性的保護膜。 (1.1 Protective film) In this embodiment, a protective film can be obtained by hardening the protective film forming film of this embodiment. That is, the protective film-forming film of this embodiment is curable. By laminating the curable protective film-forming film on the workpiece and then curing the protective film-forming film, the protective film can be firmly adhered to the workpiece and a durable protective film can be formed.

保護膜為保護膜形成膜的固化物,其與保護膜形成膜不同。作為固化物,例如可示例出熱固化物、能量射線固化物。在本實施形態中,更佳為保護膜為熱固化物。The protective film is a cured product of the protective film forming film, and is different from the protective film forming film. As cured products, for example, heat cured products and energy ray cured products can be exemplified. In this embodiment, it is more preferable that the protective film is a thermally cured product.

對於保護膜形成膜是否為熱固性,可藉由以下方式進行判斷。首先,將常溫(23℃)的保護膜形成膜加熱至高於常溫的溫度,接著冷卻至常溫,由此製成加熱並冷卻後的保護膜形成膜。接著,在相同溫度下,對加熱並冷卻後的保護膜形成膜的硬度與加熱前的保護膜形成膜的硬度進行比較,若此時加熱並冷卻後的保護膜形成膜更硬,則將該保護膜形成膜判定為熱固性。Whether or not the protective film forming film is thermosetting can be judged in the following manner. First, a protective film-forming film at normal temperature (23° C.) was heated to a temperature higher than normal temperature, and then cooled to normal temperature to prepare a heated and cooled protective film-forming film. Next, at the same temperature, the hardness of the protective film-forming film after heating and cooling is compared with the hardness of the protective film-forming film before heating. If the protective film-forming film after heating and cooling is harder at this time, the The protective film forming film was judged to be thermosetting.

此外,較佳為保護膜形成膜在常溫(23℃)下具有黏著性、或藉由加熱而發揮黏著性。由此,在將保護膜形成膜與工件重疊時,能夠將兩者貼合。因此,能夠在使保護膜形成膜固化前確實地確定其位置。Moreover, it is preferable that the protective film forming film has adhesiveness at normal temperature (23 degreeC), or develops adhesiveness by heating. Thereby, when laminating|stacking a protective film forming film and a work, both can be bonded together. Therefore, the position can be reliably identified before the protective film forming film is cured.

保護膜形成膜可以由一層(單層)構成,也可以由兩層以上的複數層構成。當保護膜形成膜具有複數層時,這些複數層可以彼此相同,也可以彼此不同,對於構成這些複數層的層的組合,沒有特別限制。The protective film forming film may be composed of one layer (single layer), or may be composed of a plurality of two or more layers. When the protective film forming film has plural layers, these plural layers may be the same as each other or may be different from each other, and the combination of the layers constituting these plural layers is not particularly limited.

在本實施形態中,較佳為保護膜形成膜為一層(單層)。由於一層的保護膜形成膜能夠以較高精度的厚度而得到,容易生產。此外,若保護膜形成膜由複數層構成,則需要考慮層間的密合性及各層的伸縮性,且因此會存在從被黏物上剝離的風險。當保護膜形成膜為一層時,能夠降低上述風險,設計自由度也會升高。此外,還能夠降低在溫度會發生變化的步驟(進行回流焊處理時或使用裝置時)中,因層間的熱伸縮性差異而引發層間剝離的風險。In this embodiment, it is preferable that the protective film forming film is one layer (single layer). Since the one-layer protective film forming film can be obtained with a relatively high-precision thickness, it is easy to produce. In addition, if the protective film forming film is composed of a plurality of layers, it is necessary to consider the adhesiveness between the layers and the stretchability of each layer, and therefore there is a risk of peeling from the adherend. When the protective film is formed as a single film, the above risks can be reduced, and the degree of freedom in design can also be increased. In addition, it is also possible to reduce the risk of interlayer delamination due to differences in thermal stretchability between layers in steps where temperature changes (during reflow processing or when using a device).

保護膜形成膜的厚度沒有特別限制,較佳為100μm以下、70μm以下、45μm以下、30μm以下。此外,保護膜形成膜的厚度較佳為5μm以上、10μm以上、15μm以上。若保護膜形成膜的厚度在上述範圍內,則所得到的保護膜的保護性能良好。The thickness of the protective film forming film is not particularly limited, but is preferably not more than 100 μm, not more than 70 μm, not more than 45 μm, and not more than 30 μm. In addition, the thickness of the protective film-forming film is preferably 5 μm or more, 10 μm or more, and 15 μm or more. When the thickness of a protective film forming film exists in the said range, the protective performance of the protective film obtained will become favorable.

另外,保護膜形成膜的厚度是指保護膜形成膜整體的厚度。例如,由複數層構成的保護膜形成膜的厚度是指構成保護膜形成膜的所有層的合計厚度。In addition, the thickness of a protective film forming film means the thickness of the whole protective film forming film. For example, the thickness of the protective film forming film which consists of several layers means the total thickness of all the layers which comprise a protective film forming film.

本實施形態的保護膜形成膜貼附於工件並藉由固化而成為保護膜。最終可得到形成有作為固化物的保護膜的工件(附保護膜的工件)。The protective film-forming film of the present embodiment is attached to a workpiece and cured to form a protective film. Finally, a work (work with a protective film) on which a protective film is formed as a cured product can be obtained.

圖1中示出附保護膜的工件100。附保護膜的工件100在工件6的背面側(圖1中的下側)形成有保護膜1,且在工件6的表面側(圖1中的上側)形成有凸狀電極6b。工件6的表面側形成有電路,凸狀電極6b以與電路電氣連接的方式而形成。作為凸狀電極6b,可示例出凸點、柱狀(pillar)電極等。A workpiece 100 with a protective film is shown in FIG. 1 . In the workpiece 100 with a protective film, the protective film 1 is formed on the back side of the workpiece 6 (lower side in FIG. 1 ), and the protruding electrode 6 b is formed on the front side of the workpiece 6 (upper side in FIG. 1 ). A circuit is formed on the surface side of the workpiece 6, and the protruding electrode 6b is formed so as to be electrically connected to the circuit. A bump, a pillar electrode, etc. can be illustrated as the convex electrode 6b.

在本實施形態中,附保護膜的工件100是以保護膜1的與工件6相接的主面為相反側的主面被安裝在切割膠帶或切割片這種具有伸縮性的膠帶或片材上的狀態供於隱形切割。In this embodiment, the workpiece 100 with a protective film is attached to a stretchable tape or sheet such as a dicing tape or a dicing sheet with the main surface opposite to the main surface of the protective film 1 in contact with the workpiece 6. The state above is for stealth cutting.

在隱形切割中,首先,使規定的雷射聚焦於工件的內部並沿著分割預定線形成改質區域。然後,以拉伸力沿著朝向工件6的外周的方向作用於工件6的方式,拉伸(擴展)具有伸縮性的膠帶或片材,利用拉伸應力使改質區域中產生的裂紋延伸至工件的兩個主面。最終工件沿著分割預定線被分割成複數個小片(被單顆化),得到工件加工物。In stealth dicing, first, a predetermined laser is focused on the inside of the workpiece to form modified regions along planned dividing lines. Then, the stretchable adhesive tape or sheet is stretched (expanded) in such a manner that a tensile force acts on the workpiece 6 in a direction toward the outer periphery of the workpiece 6, and the crack generated in the modified region is extended to the The two main faces of the workpiece. Finally, the workpiece is divided into a plurality of small pieces (singulated) along the planned dividing line to obtain a workpiece.

此時,保護膜上也會產生拉伸應力,使得保護膜被拉伸,進而被分割成對應於分割預定線的形狀。因此,藉由該擴展,圖1所示的附保護膜的工件100被分割,並如圖2所示,得到作為工件加工物的複數個附保護膜的晶片100a。附保護膜的晶片100a在晶片6a的背面側(圖2中的下側)形成有保護膜1,且在晶片6a的表面側(圖2中的上側)形成有凸狀電極6b。At this time, tensile stress is also generated on the protective film, so that the protective film is stretched and then divided into shapes corresponding to the planned dividing lines. Therefore, by this expansion, the work 100 with a protective film shown in FIG. 1 is divided, and as shown in FIG. 2 , a plurality of wafers with a protective film 100 a are obtained as workpieces. In the protective film-attached wafer 100a, the protective film 1 is formed on the back side (lower side in FIG. 2) of the wafer 6a, and the protruding electrodes 6b are formed on the front side (upper side in FIG. 2) of the wafer 6a.

然而,有時也會存在以下情況,即,即使在附保護膜的工件上產生了擴展帶來的拉伸應力,也未能沿著分割預定線被分割,導致無法得到規定數量的附保護膜的晶片。圖3為從III方向觀察圖2中的藉由擴展得到的複數個附保護膜的晶片100a時的圖。即,圖3中示出從III方向進行觀察時的附保護膜的晶片100a的平面形狀。However, sometimes, even if tensile stress due to expansion occurs on the workpiece with a protective film, it cannot be divided along the planned dividing line, resulting in the failure to obtain a predetermined number of protective films. of wafers. FIG. 3 is a view of a plurality of wafers 100a with protective films obtained by expansion in FIG. 2 when viewed from the III direction. That is, FIG. 3 shows the planar shape of the protective film-attached wafer 100a when viewed from the III direction.

在圖3的左上方存在應當沿著分割預定線200而分割的附保護膜的晶片100a的未被分割的未分割的附保護膜的晶片101a。由於這種未分割的附保護膜的晶片101a為殘次品,存在晶片成品率降低的問題。In the upper left of FIG. 3 , there are non-segmented unsegmented protective film-attached wafers 101 a of the protective film-attached wafer 100 a that should be divided along the dividing line 200 . Since such an unsegmented protective film-attached wafer 101a is a defective product, there is a problem that the yield of the wafer decreases.

以往,為了應對該問題,採取了將隱形切割中的擴展以低溫(例如,0℃以下)下實施的冷擴展。然而,冷卻所需要的時間及能源成為了問題。Conventionally, in order to cope with this problem, cold spreading in which spreading in stealth dicing is carried out at a low temperature (eg, 0° C. or lower) has been employed. However, the time and energy required for cooling are problematic.

對此,在本實施形態中,不僅在工件的內部,在保護膜的內部也形成有沿著分割預定線的改質區域。藉由在保護膜的內部形成有改質區域,即使在常溫(例如,23℃)下實施隱形切割中的擴展,附保護膜的工件也能夠確實地沿著分割預定線而分割,可得到預定數量的附保護膜的晶片。On the other hand, in this embodiment, not only the inside of the workpiece but also the inside of the protective film are formed with modified regions along the planned division lines. Since the modified region is formed inside the protective film, even if the expansion in stealth dicing is carried out at room temperature (for example, 23°C), the workpiece with the protective film can be surely divided along the planned dividing line, and the planned cutting can be obtained. Quantity of wafers with protective film.

然而,當由於在保護膜的內部形成改質區域,而使得在保護膜的內部形成強度變低的區域時,會存在並非因擴展而被分割而是由於擴展前所施加的衝擊等而意外地使保護膜被分割的情況。當並非因擴展而被分割而是由於衝擊等而使保護膜被分割時,如圖3的右下方所示,存在會得到俯視該保護膜時的保護膜的外周邊線為鋸齒線而非直線的附保護膜的晶片102a的傾向。這種附保護膜的晶片102a會被判定為外觀不良,存在晶片成品率降低的問題。However, when a region with low strength is formed inside the protective film due to the formation of a modified region inside the protective film, there may be an accidental split not due to expansion but due to an impact applied before expansion. The case where the protective film is split. When the protective film is divided not by expansion but by impact or the like, as shown in the lower right of FIG. The tendency of the attached protective film wafer 102a. Such a wafer with a protective film 102a is judged to be poor in appearance, and there is a problem that the wafer yield decreases.

為了抑制這種外觀不良,除了在保護膜中形成改質區域以外,還將實施保護膜的直角撕裂試驗時的斷裂強度(直角撕裂強度)與直角撕裂試驗中的斷裂時的伸長率控制為如下。由於如上所述,保護膜為保護膜形成膜的固化物,保護膜的直角撕裂強度與固化後的保護膜形成膜的直角撕裂強度為同義,保護膜的斷裂時的伸長率與固化後的保護膜形成膜的斷裂時的伸長率為同義。In order to suppress this appearance defect, in addition to forming a modified region in the protective film, the breaking strength (right-angle tear strength) and the elongation at break in the right-angle tear test of the protective film are also carried out. Control is as follows. As mentioned above, the protective film is a cured product of the protective film-forming film, and the right-angle tear strength of the protective film is synonymous with the right-angle tear strength of the cured protective film-forming film, and the elongation at break of the protective film is the same as that after curing. The elongation at break of the protective film forming film is synonymous.

(1.1.1 直角撕裂強度) 在本實施形態中,在23℃下,固化後的保護膜形成膜(保護膜)的直角撕裂強度(TS1)為10N/mm以上。藉由使直角撕裂強度在上述範圍內,能夠抑制因擴展前所施加的衝擊等意外地使保護膜分割。因此,保護膜不會在隱形切割的擴展前被分割,即使在常溫下進行擴展也能夠確實且適當地被分割,得到預定數量的俯視保護膜時的保護膜的外周邊線為直線的附保護膜的晶片。 (1.1.1 Right angle tear strength) In the present embodiment, the right-angle tear strength (TS1) of the cured protective film-forming film (protective film) at 23° C. is 10 N/mm or more. By setting the right-angle tear strength within the above-mentioned range, it is possible to suppress unintentional splitting of the protective film due to impact applied before expansion. Therefore, the protective film will not be divided before the expansion of the stealth dicing, even if it is expanded at room temperature, it can be divided reliably and appropriately, and a predetermined number of protective films in which the outer peripheral line of the protective film is a straight line when viewed from above are obtained. Membrane wafers.

較佳為固化後的保護膜形成膜的直角撕裂強度(TS1)為13N/mm以上,更佳為15N/mm以上,進一步較佳為17N/mm以上。The right-angle tear strength (TS1) of the cured protective film-forming film is preferably 13 N/mm or more, more preferably 15 N/mm or more, further preferably 17 N/mm or more.

另一方面,為了在擴展時更確實地分割保護膜,在23℃下,固化後的保護膜形成膜的直角撕裂強度(TS1)較佳為25N/mm以下,更佳為22N/mm以下。On the other hand, in order to more reliably divide the protective film during expansion, the right-angle tear strength (TS1) of the cured protective film forming film at 23° C. is preferably 25 N/mm or less, more preferably 22 N/mm or less .

固化後的保護膜形成膜的直角撕裂強度(TS1)按照JIS K 7128-3:1998而測定。即,固化後的保護膜形成膜的直角撕裂強度以與JIS K 7128-3:1998中規定的測定方法(直角形撕裂法)相同的方式而測定,測定條件也可以不同。具體的測定方法會在實施例中進行說明。試驗片具有JIS K 7128-3:1998中的圖2所示的形狀,試驗片的中央部為呈90°角度的凹陷形狀。直角撕裂試驗藉由拉伸試驗片的兩端而實施。The right-angle tear strength (TS1) of the protective film forming film after curing was measured in accordance with JIS K 7128-3:1998. That is, the right-angle tear strength of the cured protective film-forming film is measured in the same manner as the measurement method (right-angle tear method) prescribed in JIS K 7128-3:1998, and the measurement conditions may be different. The specific measurement method will be described in the examples. The test piece has the shape shown in FIG. 2 in JIS K 7128-3:1998, and the central part of the test piece is a concave shape at an angle of 90°. The right-angle tear test was implemented by pulling both ends of the test piece.

(1.1.2 斷裂時的伸長率) 在本實施形態中,在23℃下,在測定上述直角撕裂強度的試驗中,固化後的保護膜形成膜(保護膜)斷裂時的伸長率為10%以下。藉由使伸長率在上述範圍內,即使在常溫下進行擴展也能夠適當地分割保護膜,且能夠得到預定數量的俯視保護膜時的保護膜的外周邊線為直線的附保護膜的晶片。 (1.1.2 Elongation at break) In the present embodiment, the elongation at breakage of the cured protective film-forming film (protective film) is 10% or less in the test for measuring the right-angle tear strength at 23°C. By setting the elongation within the above range, the protective film can be appropriately divided even when stretched at room temperature, and a predetermined number of wafers with protective film can be obtained in which the outer peripheral line of the protective film is a straight line in plan view.

固化後的保護膜形成膜斷裂時的伸長率較佳為8%以下,更佳為7%以下,進一步較佳為4%以下。另一方面,伸長率的下限值沒有特別限定,從降低擴展時在俯視保護膜時的保護膜的外周邊線以外的位置產生裂紋或缺損的風險的觀點而言,較佳為0.2%以上。The elongation at break of the protective film-forming film after curing is preferably 8% or less, more preferably 7% or less, further preferably 4% or less. On the other hand, the lower limit of the elongation is not particularly limited, but it is preferably 0.2% or more from the viewpoint of reducing the risk of cracks or chipping at positions other than the outer peripheral line of the protective film when the protective film is viewed from above during expansion. .

如上所述,由於固化後的保護膜形成膜斷裂時的伸長率為(1.1.1)中所示的測定直角撕裂強度的試驗中的測定值,該伸長率按照JIS K 7128-3:1998而測定。即,固化後的保護膜形成膜的直角撕裂強度以與JIS K 7128-3:1998中規定的測定方法相同的方式而測定,測定條件也可以不同。具體的測定方法會在實施例中進行說明。As described above, the elongation at the time of film rupture due to the formation of the cured protective film is the measured value in the test for measuring the right-angle tear strength shown in (1.1.1), which is in accordance with JIS K 7128-3:1998 And measure. That is, the right-angle tear strength of the cured protective film-forming film is measured in the same manner as the measurement method prescribed in JIS K 7128-3:1998, and the measurement conditions may be different. The specific measurement method will be described in the examples.

(1.2 保護膜形成膜用組合物) 只要保護膜具有上述物理特性,則對保護膜形成膜的組成沒有特別限定。在本實施形態中,構成保護膜形成膜的組合物(保護膜形成膜用組合物)較佳為至少含有聚合物成分(A)、固化性成分(B)及填充材料(E)的樹脂組合物。聚合物成分被視作聚合性化合物進行聚合反應而形成的成分。此外,固化性成分為可進行固化(聚合)反應的成分。另外,在本發明中,聚合反應也包括縮聚反應。 (1.2 Composition for Forming a Protective Film) The composition of the protective film forming film is not particularly limited as long as the protective film has the above-mentioned physical properties. In this embodiment, the composition constituting the protective film forming film (the composition for forming a protective film) is preferably a resin composition containing at least a polymer component (A), a curable component (B) and a filler (E). thing. The polymer component is regarded as a component formed by polymerizing a polymeric compound. In addition, a curable component is a component which can undergo a curing (polymerization) reaction. In addition, in the present invention, the polymerization reaction also includes polycondensation reaction.

此外,聚合物成分中所含的成分有時也屬於固化性成分。在本實施形態中,當保護膜形成膜用組合物含有這種既屬於聚合物成分又屬於固化性成分的成分時,視作保護膜形成膜用組合物含有聚合物成分及固化性成分這兩種成分。In addition, components contained in polymer components may also belong to curable components. In this embodiment, when the composition for forming a protective film contains such a component as both a polymer component and a curable component, it is deemed that the composition for forming a protective film contains both a polymer component and a curable component. ingredients.

(1.2.1 聚合物成分) 聚合物成分(A)在使保護膜形成膜具有膜形成性(成膜性)的同時,還賦予其適度的黏性(tack),確保將保護膜形成膜均一地貼附於工件。聚合物成分的重均分子量通常為5萬~200萬,較佳為10萬~150萬,特佳為在20萬~100萬的範圍內。作為這種聚合物成分,例如可以使用丙烯酸樹脂、胺基甲酸酯(urthane)樹脂、苯氧樹脂、聚矽氧樹脂(silicone resin)、飽和聚酯樹脂等,特佳為使用丙烯酸樹脂。 (1.2.1 Polymer composition) The polymer component (A) not only imparts film-forming properties (film-forming properties) to the protective film-forming film, but also imparts appropriate tack to ensure uniform adhesion of the protective film-forming film to the workpiece. The weight-average molecular weight of the polymer component is usually 50,000 to 2 million, preferably 100,000 to 1.5 million, most preferably 200,000 to 1 million. As such a polymer component, for example, acrylic resin, urthane resin, phenoxy resin, silicone resin, saturated polyester resin, etc. can be used, and acrylic resin is particularly preferably used.

另外,在本說明書中,在沒有特殊說明的情況下,「重均分子量」是指藉由凝膠滲透層析(GPC)法測定的聚苯乙烯換算值。基於該方法的測定例如以下述方式實施:使用在TOSOH CORPORATION製造的高速GPC裝置「HLC-8120GPC」上依次連接有高速管柱「TSK guard column H XL-H」、「TSK Gel GMH XL」、「TSK Gel G2000 H XL」(以上,均為TOSOH CORPORATION製造)的設備,在管柱溫度為40℃、進液速度為1.0mL/分鐘的條件下,將示差折射率檢測器作為檢測器。 In addition, in this specification, unless otherwise specified, "weight average molecular weight" means the polystyrene conversion value measured by the gel permeation chromatography (GPC) method. Measurement based on this method is carried out, for example, as follows: High-speed columns "TSK guard column H XL -H", "TSK Gel GMH XL ", "TSK Gel GMH XL ", " TSK Gel G2000 H XL ” (all above are manufactured by TOSOH CORPORATION) uses a differential refractive index detector as a detector under the conditions of a column temperature of 40°C and a liquid feed rate of 1.0mL/min.

作為丙烯酸樹脂,例如可列舉出由(甲基)丙烯酸酯單體與衍生自(甲基)丙烯酸衍生物的結構單元構成的(甲基)丙烯酸酯共聚物。其中,作為(甲基)丙烯酸酯單體,較佳列舉出烷基的碳原子數為1~18的(甲基)丙烯酸烷基酯,具體可列舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯等。此外,作為(甲基)丙烯酸衍生物,例如可列舉出(甲基)丙烯酸、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸羥基乙酯等。As an acrylic resin, the (meth)acrylate copolymer which consists of a (meth)acrylate monomer and the structural unit derived from a (meth)acrylic acid derivative is mentioned, for example. Among them, as the (meth)acrylate monomer, preferably an alkyl (meth)acrylate with an alkyl group having 1 to 18 carbon atoms, specifically methyl (meth)acrylate, (meth)acrylate, base) ethyl acrylate, propyl (meth)acrylate, butyl (meth)acrylate, etc. Moreover, as a (meth)acrylic acid derivative, (meth)acrylic acid, glycidyl (meth)acrylate, hydroxyethyl (meth)acrylate, etc. are mentioned, for example.

在本實施形態中,為了控制對工件的黏合性或黏著物性,較佳為使用丙烯酸羥基乙酯等向丙烯酸樹脂中導入羥基。In the present embodiment, it is preferable to introduce hydroxyl groups into the acrylic resin using hydroxyethyl acrylate or the like in order to control the adhesiveness or stickiness to the workpiece.

丙烯酸樹脂的玻璃轉化溫度較佳為-70℃~40℃、-60℃~30℃、-50℃~25℃、-40℃~20℃、-35℃~15℃。藉由使丙烯酸樹脂的玻璃轉化溫度在上述範圍內,能夠在適度提高保護膜形成膜的黏性的同時,提高保護膜形成膜對工件的黏著力,並且能夠在適度提高保護膜對工件的黏合力的同時,更加容易地將直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率設定在上述範圍內。The glass transition temperature of the acrylic resin is preferably -70°C~40°C, -60°C~30°C, -50°C~25°C, -40°C~20°C, -35°C~15°C. By setting the glass transition temperature of the acrylic resin within the above-mentioned range, it is possible to moderately increase the viscosity of the protective film-forming film and at the same time improve the adhesion of the protective film-forming film to the workpiece, and to moderately improve the adhesion of the protective film to the workpiece. At the same time, it is easier to set the right-angle tear strength and elongation at break in the right-angle tear test within the above-mentioned ranges.

當丙烯酸樹脂具有m種(m為2以上的整數)結構單元時,能夠藉由以下方式計算出該丙烯酸樹脂的玻璃轉化溫度。即,對衍生出丙烯酸樹脂中的結構單元的m種單體,分別依次分配由1至m的任意不重複的序號並命名為「單體m」時,能夠使用以下所示的Fox公式計算出丙烯酸樹脂的玻璃轉化溫度(Tg)。When the acrylic resin has m types (m is an integer greater than or equal to 2) of structural units, the glass transition temperature of the acrylic resin can be calculated in the following manner. That is, when m types of monomers from which structural units in acrylic resins are derived are sequentially assigned any non-repeating serial numbers from 1 to m and named "monomer m", it can be calculated using the Fox formula shown below Glass transition temperature (Tg) of acrylic resins.

[數學式1]

Figure 02_image001
式中,Tg為丙烯酸樹脂的玻璃轉化溫度;m為2以上的整數;Tgk為單體m的均聚物的玻璃轉化溫度;Wk為丙烯酸樹脂中衍生自單體m的結構單元m的質量分率,且Wk滿足下述式。 [mathematical formula 1]
Figure 02_image001
In the formula, Tg is the glass transition temperature of the acrylic resin; m is an integer above 2; Tgk is the glass transition temperature of the homopolymer of the monomer m; Wk is the mass fraction of the structural unit m derived from the monomer m in the acrylic resin rate, and Wk satisfies the following formula.

[數學式2]

Figure 02_image003
式中,m及Wk與上述m及Wk相同。 [mathematical formula 2]
Figure 02_image003
In the formula, m and Wk are the same as above-mentioned m and Wk.

作為Tgk,可使用高分子資料手冊、黏著手冊或聚合物手冊(Polymer Handbook)等中記載的值。例如,丙烯酸甲酯的均聚物的Tgk為10℃、丙烯酸正丁酯的均聚物的Tgk為-54℃、甲基丙烯酸甲酯的均聚物的Tgk為105℃、丙烯酸2-羥基乙酯的均聚物的Tgk為-15℃、甲基丙烯酸縮水甘油酯的均聚物的Tgk為41℃、丙烯酸2-乙基己酯的均聚物的Tgk為-70℃、丙烯酸乙酯的均聚物的Tgk為-24℃。As Tgk, the value described in a polymer data handbook, an adhesive handbook, a polymer handbook (Polymer Handbook), etc. can be used. For example, the Tgk of the homopolymer of methyl acrylate is 10°C, the Tgk of the homopolymer of n-butyl acrylate is -54°C, the Tgk of the homopolymer of methyl methacrylate is 105°C, 2-hydroxyethyl acrylate Tgk of ester homopolymer is -15℃, Tgk of glycidyl methacrylate homopolymer is 41℃, Tgk of 2-ethylhexyl acrylate homopolymer is -70℃, ethyl acrylate The Tgk of the homopolymer was -24°C.

將保護膜形成膜用組合物的總重量設為100質量份時的聚合物成分的含量較佳為5~60質量份、10~50質量份、13~40質量份、16~30質量份。藉由使聚合物成分的含量在上述範圍內,更容易使直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率在上述範圍內。並且,更容易控制保護膜形成膜的黏著性。The content of the polymer component when the total weight of the composition for forming a protective film is 100 parts by mass is preferably 5 to 60 parts by mass, 10 to 50 parts by mass, 13 to 40 parts by mass, and 16 to 30 parts by mass. By setting the content of the polymer component within the above range, it becomes easier to set the right-angle tear strength in the right-angle tear test and the elongation at break within the above-mentioned range. Also, it is easier to control the tackiness of the protective film forming film.

(1.2.2 熱固性成分) 固化性成分(B)藉由保護膜形成膜固化而形成作為固化物的保護膜。由於如上所述,保護膜較佳為熱固化物、能量射線固化物,作為固化性成分,能夠使用熱固性成分、能量射線固化性成分或該等的混合物。 (1.2.2 Thermosetting components) The curable component (B) forms a protective film as a cured product by curing the protective film-forming film. As described above, the protective film is preferably a thermosetting material or an energy ray curable material, and as a curable component, a thermosetting component, an energy ray curable component, or a mixture thereof can be used.

本實施形態的保護膜形成膜由於含有後述的填充材料及著色劑等,故而透光率降低。能量射線固化性的保護膜形成膜藉由照射能量射線而固化,因此,例如當保護膜形成膜的厚度變厚時,由能量射線引起的固化容易變得不充分。Since the protective film-forming film of this embodiment contains a filler, a colorant, etc. which will be described later, light transmittance falls. An energy ray-curable protective film-forming film is cured by irradiating an energy ray. Therefore, for example, when the thickness of the protective film-forming film becomes thicker, the curing by the energy ray tends to become insufficient.

然而,對於熱固性的保護膜形成膜而言,即使其厚度變厚,也能夠藉由加熱而充分固化,因此能夠形成保護性能高的保護膜。此外,藉由使用加熱烘箱等常規的加熱手段,能夠將多個保護膜形成膜一併進行加熱而使其熱固化。However, since a thermosetting protective film forming film can be fully cured by heating even if its thickness becomes thick, the protective film with high protective performance can be formed. Moreover, by using normal heating means, such as a heating oven, several protective film formation films can be heated collectively and can be thermally cured.

由於保護膜較佳為熱固化物,保護膜形成膜中所含的固化性成分較佳為熱固性。即,本實施形態的保護膜形成膜較佳為熱固性。Since the protective film is preferably a thermosetting material, the curable component contained in the protective film forming film is preferably thermosetting. That is, the protective film-forming film of the present embodiment is preferably thermosetting.

作為熱固性成分,例如較佳為使用環氧樹脂、熱固性聚醯亞胺樹脂、不飽和聚酯樹脂及該等的混合物。另外,熱固性聚醯亞胺樹脂是指藉由熱固化而形成聚醯亞胺樹脂的低分子量、且低黏性的單體或前驅物聚合物的統稱。熱固性聚醯亞胺樹脂的非限制性的具體實例,例如記載於纖維學會雜誌(繊維學會誌)「繊維及工業」,Vol.50, No.3 (1994), P106-P118中。As the thermosetting component, for example, epoxy resins, thermosetting polyimide resins, unsaturated polyester resins, and mixtures thereof are preferably used. In addition, a thermosetting polyimide resin is a collective term for low molecular weight and low viscosity monomers or precursor polymers that form polyimide resins by thermal curing. Non-limiting specific examples of thermosetting polyimide resins are described, for example, in the Journal of the Fiber Society (Journal of the Textile Society) "Vision and Industry", Vol.50, No.3 (1994), P106-P118.

作為熱固性成分的環氧樹脂,具有受熱時會變為立體網狀從而形成牢固覆膜的性質。作為這種環氧樹脂,可使用公知的各種環氧樹脂。在本實施形態中,環氧樹脂的分子量(式量)較佳為300以上且小於50000、300以上且小於10000、300以上且小於5000、300以上且小於3000。此外,環氧樹脂的環氧當量較佳為50~5000g/eq,更佳為100~2000g/eq,進一步較佳為150~1000g/eq。Epoxy resin, which is a thermosetting component, has the property of becoming a three-dimensional network when heated to form a strong coating. As such an epoxy resin, various known epoxy resins can be used. In this embodiment, the molecular weight (formula weight) of the epoxy resin is preferably 300 to less than 50,000, 300 to less than 10,000, 300 to less than 5,000, and 300 to less than 3,000. In addition, the epoxy equivalent of the epoxy resin is preferably 50-5000 g/eq, more preferably 100-2000 g/eq, further preferably 150-1000 g/eq.

作為這種環氧樹脂,具體可列舉出雙酚A、雙酚F、間苯二酚、苯基酚醛清漆、甲酚酚醛清漆等酚類的縮水甘油醚;丁二醇、聚乙二醇、聚丙二醇等醇類的縮水甘油醚;鄰苯二甲酸、間苯二甲酸、四氫鄰苯二甲酸等羧酸的縮水甘油醚;用縮水甘油基取代苯胺異氰脲酸酯(aniline isocyanurate)等的與氮原子鍵結的活性氫而成的縮水甘油基型或烷基縮水甘油基型的環氧樹脂;乙烯基環己烷二環氧化物、3,4-環氧基環己基甲基-3,4-二環己烷甲酸酯、2-(3,4-環氧)環己基-5,5-螺(3,4-環氧)環己烷-間二氧六環等例如藉由氧化分子內的碳碳雙鍵而導入了環氧基的所謂的脂環式環氧化物。另外,還可以使用具有聯苯基骨架、二環己二烯骨架、萘骨架等的環氧樹脂。Specific examples of such epoxy resins include glycidyl ethers of phenols such as bisphenol A, bisphenol F, resorcinol, phenyl novolac, and cresol novolak; butylene glycol, polyethylene glycol, Glycidyl ethers of alcohols such as polypropylene glycol; glycidyl ethers of carboxylic acids such as phthalic acid, isophthalic acid, and tetrahydrophthalic acid; glycidyl substituted aniline isocyanurate, etc. Glycidyl-type or alkylglycidyl-type epoxy resins made of active hydrogen bonded to nitrogen atoms; vinylcyclohexane diepoxide, 3,4-epoxycyclohexylmethyl- 3,4-dicyclohexane carboxylate, 2-(3,4-epoxy)cyclohexyl-5,5-spiro(3,4-epoxy)cyclohexane-dioxane, etc. A so-called alicyclic epoxide in which an epoxy group is introduced by oxidizing a carbon-carbon double bond in the molecule. In addition, epoxy resins having a biphenyl skeleton, a dicyclohexadiene skeleton, a naphthalene skeleton, and the like can also be used.

將熱固性成分用作固化性成分(B)時,較佳為同時使用作為輔助劑的固化劑(C)。作為針對環氧樹脂的固化劑,較佳為熱活性型潛伏性環氧樹脂固化劑。「熱活性型潛伏性環氧樹脂固化劑」是指,在常溫(23℃)下不易與環氧樹脂反應,但藉由加熱至一定溫度以上而活化從而與環氧樹脂反應的類型的固化劑。熱活性型潛伏性環氧樹脂固化劑的活化方法中存在以下方法:利用基於加熱的化學反應生成活性物種(陰離子、陽離子)的方法;在常溫附近穩定地分散於環氧樹脂中,但在高溫下與環氧樹脂相容.溶解並開始固化反應的方法;利用分子篩密封型固化劑,在高溫下溶出並開始固化反應的方法;採用微膠囊的方法等。When a thermosetting component is used as the curable component (B), it is preferable to use a curing agent (C) as an auxiliary agent together. As a curing agent for epoxy resin, a thermally active latent epoxy resin curing agent is preferable. "Heat-activated latent epoxy resin curing agent" refers to a type of curing agent that does not easily react with epoxy resin at room temperature (23°C), but is activated by heating above a certain temperature to react with epoxy resin . There are the following methods in the activation method of thermally active latent epoxy resin curing agent: the method of generating active species (anion, cation) by chemical reaction based on heating; stable dispersion in epoxy resin near normal temperature, but at high temperature Compatible with epoxy resin. The method of dissolving and starting the curing reaction; the method of using molecular sieve sealing type curing agent to dissolve at high temperature and starting the curing reaction; the method of using microcapsules, etc.

在所示例的方法中,較佳為在常溫附近穩定地分散於環氧樹脂中,但在高溫下與環氧樹脂相容.溶解並開始固化反應的方法。In the exemplified method, it is preferable to be stably dispersed in epoxy resin near normal temperature, but compatible with epoxy resin at high temperature. A method of dissolving and starting the curing reaction.

作為熱活性型潛伏性環氧樹脂固化劑的具體實例,可列舉出各種鎓鹽、二元酸二醯肼化合物、雙氰胺、胺加成物固化劑、咪唑化合物等高熔點活性氫化合物等。這些熱活性型潛伏性環氧樹脂固化劑可以單獨使用一種,或者也可以組合使用兩種以上。在本實施形態中,特佳為雙氰胺。Specific examples of thermally active latent epoxy resin curing agents include various onium salts, dibasic acid dihydrazide compounds, dicyandiamide, amine adduct curing agents, and high melting point active hydrogen compounds such as imidazole compounds. . These thermoactive latent epoxy resin curing agents may be used alone or in combination of two or more. In this embodiment, dicyandiamide is particularly preferable.

此外,作為針對環氧樹脂的固化劑,較佳也為酚醛樹脂。作為酚醛樹脂,可無特別限制地使用烷基酚、多元酚、萘酚等酚類與醛類的縮合物等。具體可以使用苯酚酚醛清漆樹脂、鄰甲酚酚醛清漆樹脂、對甲酚酚醛清漆樹脂、三級丁基苯酚酚醛清漆樹脂、雙環戊二烯甲酚樹脂、聚對乙烯基苯酚樹脂、雙酚A型酚醛清漆樹脂或該等的改性物等。In addition, as a curing agent for epoxy resins, phenolic resins are also preferable. As the phenolic resin, condensates of phenols such as alkylphenols, polyhydric phenols, and naphthols and aldehydes can be used without particular limitation. Specifically, phenol novolac resin, o-cresol novolac resin, p-cresol novolac resin, tertiary butylphenol novolac resin, dicyclopentadiene cresol resin, polyvinylphenol resin, bisphenol A type Novolak resins or modified products thereof, etc.

這些酚醛樹脂中所含的酚羥基能夠藉由加熱而容易地與上述環氧樹脂的環氧基進行加成反應,從而形成抗衝擊性高的固化物。The phenolic hydroxyl group contained in these phenolic resins can easily perform addition reaction with the epoxy group of the said epoxy resin by heating, and can form the hardened|cured material with high impact resistance.

相對於100質量份的環氧樹脂,固化劑(C)的含量較佳為0.5~100質量份、0.8~20質量份、1.2~8質量份、1.6~4質量份。藉由使固化劑(C)的含量在上述範圍內,保護膜的網狀結構變得緻密,因此,作為保護膜容易得到保護工件的性能,且更容易使直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率在上述範圍內。The content of the curing agent (C) is preferably 0.5-100 parts by mass, 0.8-20 parts by mass, 1.2-8 parts by mass, or 1.6-4 parts by mass relative to 100 parts by mass of the epoxy resin. By making the content of the curing agent (C) within the above-mentioned range, the network structure of the protective film becomes dense, therefore, it is easy to obtain the performance of protecting the workpiece as a protective film, and it is easier to make the right-angle tear in the right-angle tear test The strength and elongation at break are within the above ranges.

將雙氰胺用作固化劑(C)時,較佳為進一步同時使用固化促進劑(D)。作為固化促進劑,例如較佳為2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑等咪唑類(一個以上氫原子被氫原子以外的基團取代而成的咪唑)。其中,特佳為2-苯基-4,5-二羥甲基咪唑。When dicyandiamide is used as the curing agent (C), it is preferred to further use a curing accelerator (D) together. As a curing accelerator, for example, 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl imidazoles (imidazoles in which one or more hydrogen atoms are replaced by groups other than hydrogen atoms) such as 4-methyl-5-hydroxymethylimidazole. Among them, 2-phenyl-4,5-dimethylolimidazole is particularly preferred.

相對於100質量份的環氧樹脂,固化促進劑的含量較佳為0.5~10質量份、0.8~7質量份、1.2~5質量份、1.6~4質量份。藉由使固化促進劑(D)的含量在上述範圍內,保護膜的網狀結構變得緻密,因此,作為保護膜容易得到保護工件的性能,且更容易使直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率在上述範圍內。The content of the curing accelerator is preferably 0.5-10 parts by mass, 0.8-7 parts by mass, 1.2-5 parts by mass, or 1.6-4 parts by mass relative to 100 parts by mass of the epoxy resin. By making the content of the curing accelerator (D) within the above-mentioned range, the network structure of the protective film becomes dense, therefore, it is easy to obtain the performance of protecting the workpiece as a protective film, and it is easier to make the right-angle tearing in the right-angle tear test easier. The crack strength and elongation at break are within the above ranges.

將保護膜形成膜用組合物的總重量設為100質量份時的熱固性成分及固化劑的合計含量較佳為6~80質量份、8~70質量份、10~60質量份、12~50質量份、14~40質量份。藉由使熱固性成分及固化劑的合計含量為上述下限值以上,能夠在固化前表現出適度的黏性,穩定地進行貼附操作。此外,在固化後,作為保護膜容易得到保護工件的性能。藉由使熱固性成分及固化劑的合計含量在上述範圍內來調整固化程度,更容易使直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率在上述範圍內。When the total weight of the composition for forming a protective film is 100 parts by mass, the total content of the thermosetting component and the curing agent is preferably 6 to 80 parts by mass, 8 to 70 parts by mass, 10 to 60 parts by mass, 12 to 50 parts by mass. parts by mass, 14 to 40 parts by mass. By making the total content of a thermosetting component and a hardening|curing agent more than the said lower limit, moderate viscosity can be expressed before hardening, and sticking operation can be performed stably. In addition, after curing, it is easy to obtain the performance of protecting workpieces as a protective film. Adjusting the degree of curing by setting the total content of the thermosetting component and the curing agent within the above-mentioned range makes it easier to make the right-angle tear strength and elongation at break in the right-angle tear test within the above-mentioned range.

(1.2.3 能量射線固化性成分) 當固化性成分(B)為能量射線固化性成分時,能量射線固化性成分較佳為未固化,較佳為具有黏著性,更佳為未固化且具有黏著性。 (1.2.3 Energy ray curable components) When the curable component (B) is an energy ray curable component, the energy ray curable component is preferably uncured, preferably has adhesiveness, more preferably is uncured and has adhesiveness.

能量射線固化性成分為藉由照射能量射線而固化的成分,也是用於賦予保護膜形成膜成膜性、可撓性等的成分。The energy ray curable component is a component that is cured by irradiation with energy rays, and is also a component for imparting film-forming properties, flexibility, and the like to a protective film-forming film.

作為能量射線固化性成分,例如較佳為具有能量射線固化性基團的化合物。作為這種化合物,可列舉出公知的具有能量射線固化性基團的化合物。As the energy ray curable component, for example, a compound having an energy ray curable group is preferable. As such a compound, the compound which has a well-known energy-ray curable group is mentioned.

(1.2.4 填充材料) 藉由使保護膜形成膜含有填充材料(E),將保護膜形成膜製成保護膜而得到的保護膜的熱膨脹係數的調節變得更容易,藉由使該熱膨脹係數接近於工件的熱膨脹係數,使用保護膜形成膜而得到的附保護膜的晶片的黏合可靠性進一步升高。此外,藉由使保護膜形成膜含有填充材料(E),可得到硬質的保護膜,進一步能夠降低保護膜的吸濕率,附保護膜的晶片的黏合可靠性進一步升高。 (1.2.4 Filling material) By making the protective film forming film contain the filler (E), the adjustment of the thermal expansion coefficient of the protective film obtained by making the protective film forming film into a protective film becomes easier, and by making the thermal expansion coefficient close to the thermal expansion coefficient of the workpiece , the bonding reliability of the wafer with a protective film obtained by forming a film using the protective film is further improved. In addition, by making the protective film forming film contain the filler (E), a hard protective film can be obtained, the moisture absorption rate of the protective film can be further reduced, and the adhesion reliability of the wafer with the protective film is further improved.

填充材料(E)可以為有機填充材料及無機填充材料中的任一種,從高溫下的形狀穩定性的觀點而言,較佳為無機填充材料。The filler (E) may be either an organic filler or an inorganic filler, and is preferably an inorganic filler from the viewpoint of shape stability at high temperature.

作為較佳為的無機填充材料,例如可列舉出二氧化矽、氧化鋁、滑石、碳酸鈣、紅氧化鐵、碳化矽、氮化硼等的粉末;將這些無機填充材料製成球狀而得到的珠子(beads);這些無機填充材料的表面改性物;這些無機填充材料的單晶纖維;玻璃纖維等。其中,較佳為二氧化矽及經過表面改性的二氧化矽。經過表面改性的二氧化矽較佳為利用偶合劑實施表面改性,更佳為利用矽烷偶合劑實施表面改性。As preferred inorganic fillers, for example, powders of silicon dioxide, alumina, talc, calcium carbonate, red iron oxide, silicon carbide, boron nitride, etc. are exemplified; these inorganic fillers are made spherical to obtain Beads of these inorganic fillers; surface modifications of these inorganic fillers; single crystal fibers of these inorganic fillers; glass fibers, etc. Among them, silicon dioxide and surface-modified silicon dioxide are preferred. The surface-modified silica is preferably surface-modified by a coupling agent, more preferably surface-modified by a silane coupling agent.

填充材料的平均粒徑較佳為0.02~10μm、0.05~5μm、0.10~3μm。The average particle size of the filler is preferably 0.02-10 μm, 0.05-5 μm, or 0.10-3 μm.

藉由將填充材料的平均粒徑的範圍設定為上述範圍,保護膜形成膜用組合物的操作性變得良好。其結果,容易使保護膜形成膜用組合物及保護膜形成膜的品質穩定。By setting the range of the average particle diameter of a filler to the said range, the handleability of the composition for protective film formation becomes favorable. As a result, it becomes easy to stabilize the quality of the composition for protective film forming films and a protective film forming film.

另外,在本說明書中,在沒有特別說明的情況下,「平均粒徑」是指藉由雷射繞射散射法求出的粒度分佈曲線中累積值為50%時的粒徑(D50)的值。In addition, in this specification, unless otherwise specified, "average particle diameter" refers to the particle diameter (D50) when the cumulative value is 50% in the particle size distribution curve obtained by the laser diffraction scattering method. value.

將保護膜形成膜用組合物的總重量設為100質量份時的填充材料的含量較佳為15~80質量份、30~75質量份、40~70質量份、45~65質量份。The content of the filler when the total weight of the composition for forming a protective film is 100 parts by mass is preferably 15-80 parts by mass, 30-75 parts by mass, 40-70 parts by mass, or 45-65 parts by mass.

藉由使填充材料的含量的下限值為上述值,使用保護膜形成膜而得到的附保護膜的晶片的黏合可靠性進一步升高。此外,藉由將填充材料的含量的上限值設為上述值,保護膜形成膜對工件的黏著力升高,且保護膜對工件的黏合力適度升高。此外,藉由使填充材料的含量在上述範圍內,更容易使直角撕裂試驗中的直角撕裂強度及斷裂時的伸長率在上述範圍內。By setting the lower limit of the content of the filler to the above-mentioned value, the adhesion reliability of the wafer with a protective film obtained by forming a film using a protective film further increases. Moreover, by making the upper limit of content of a filler into the said value, the adhesive force of a protective film forming film to a workpiece|work increases, and the adhesive force of a protective film to a workpiece increases moderately. Moreover, by making content of a filler exist in the said range, it becomes easier to make the right-angled tear strength in a right-angled tear test, and the elongation at the time of fracture fall in the said range.

(1.2.5 偶合劑) 保護膜形成膜較佳為含有偶合劑(F)。藉由含有偶合劑,在保護膜形成膜固化後,能夠在不損害保護膜的耐熱性的同時,提高保護膜與工件之間的黏合性,同時還能夠提高耐水性(耐濕熱性)。作為偶合劑,從通用性與成本優勢的觀點而言,較佳為矽烷偶合劑。 (1.2.5 Coupler) It is preferable that a protective film forming film contains a coupling agent (F). By containing the coupling agent, after the protective film forming film is cured, the adhesion between the protective film and the workpiece can be improved without impairing the heat resistance of the protective film, and the water resistance (moisture and heat resistance) can also be improved. As the coupling agent, a silane coupling agent is preferred from the viewpoint of versatility and cost advantages.

作為矽烷偶合劑,例如可列舉出γ-縮水甘油醚氧基丙基三甲氧基矽烷、γ-縮水甘油醚氧基丙基甲基二乙氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷、γ-(甲基丙烯醯氧丙基)三甲氧基矽烷、γ-胺丙基三甲氧基矽烷、N-6-(胺乙基)-γ-胺丙基三甲氧基矽烷、N-6-(胺乙基)-γ-胺丙基甲基二乙氧基矽烷、N-苯基-γ-胺丙基三甲氧基矽烷、γ-脲丙基三乙氧基矽烷、γ-巰丙基三甲氧基矽烷、γ-巰丙基甲基二甲氧基矽烷、雙(3-三乙氧基丙基)四硫化物、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、咪唑矽烷等。Examples of silane coupling agents include γ-glycidyloxypropyltrimethoxysilane, γ-glycidyloxypropylmethyldiethoxysilane, β-(3,4-epoxy Hexyl)ethyltrimethoxysilane, γ-(methacryloxypropyl)trimethoxysilane, γ-aminopropyltrimethoxysilane, N-6-(aminoethyl)-γ-aminopropyl Trimethoxysilane, N-6-(aminoethyl)-γ-aminopropylmethyldiethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-ureapropyltriethyl Oxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, bis(3-triethoxypropyl)tetrasulfide, methyltrimethoxysilane, methyl Triethoxysilane, Vinyltrimethoxysilane, Vinyltriacetoxysilane, Imidazolesilane, etc.

作為較佳為的矽烷偶合劑,還可列舉出一分子中具有複數個烷氧基矽基的低聚物型矽烷偶合劑。由於所述低聚物型矽烷偶合劑不易揮發且在一分子中具有複數個烷氧基矽基,就有效提高耐久性這一點而言是較佳的。作為所述低聚物型矽烷偶合劑,例如可列舉出作為含環氧基低聚物型矽烷偶合劑的「X-41-1053」、「X-41-1059A」、「X-41-1056」及「X-40-2651」(均為Shin-Etsu Chemical Co., Ltd.製造);作為含巰基低聚物型矽烷偶合劑的「X-41-1818」、「X-41-1810」及「X-41-1805」(均為Shin-Etsu Chemical Co., Ltd.製造)等。這些矽烷偶合劑可以單獨使用一種、或混合使用兩種以上。As a preferable silane coupling agent, the oligomer type silane coupling agent which has a plurality of alkoxysilyl groups in one molecule can also be mentioned. Since the oligomer-type silane coupling agent is less volatile and has a plurality of alkoxysilyl groups in one molecule, it is preferable in terms of effectively improving durability. Examples of the oligomer type silane coupling agent include "X-41-1053", "X-41-1059A", "X-41-1056" which are epoxy group-containing oligomer type silane coupling agents. " and "X-40-2651" (both manufactured by Shin-Etsu Chemical Co., Ltd.); "X-41-1818" and "X-41-1810" which are mercapto-containing oligomer type silane coupling agents and "X-41-1805" (both manufactured by Shin-Etsu Chemical Co., Ltd.), etc. These silane coupling agents can be used alone or in combination of two or more.

將保護膜形成膜用組合物的總重量設為100質量份時的偶合劑的含量較佳為0.01~20質量份、0.1~10質量份、0.2~5質量份、0.3~3質量份。The content of the coupling agent when the total weight of the composition for forming a protective film is 100 parts by mass is preferably 0.01 to 20 parts by mass, 0.1 to 10 parts by mass, 0.2 to 5 parts by mass, or 0.3 to 3 parts by mass.

(1.2.6 著色劑) 保護膜形成膜較佳為含有著色劑(G)。由此,晶片等工件加工物的背面被遮蓋,因此能夠屏蔽電子設備內產生的各種電磁波,能夠減少晶片等工件加工物的故障。 (1.2.6 Colorants) It is preferable that a protective film forming film contains a coloring agent (G). Thus, since the back surface of workpieces such as wafers is covered, various electromagnetic waves generated in electronic equipment can be shielded, and failures of workpieces such as wafers can be reduced.

作為著色劑(G),例如能夠使用有機類顏料、有機類染料、無機類顏料等公知的著色劑。在本實施形態中,較佳為無機類顏料。As the colorant (G), known colorants such as organic pigments, organic dyes, and inorganic pigments can be used, for example. In this embodiment, inorganic pigments are preferable.

作為無機類顏料,例如可列舉出碳黑、鈷類色素、鐵類色素、鉻類色素、鈦類色素、釩類色素、鋯類色素、鉬類色素、釕類色素、鉑類色素、ITO(氧化銦錫)類色素、ATO(氧化銻錫)類色素等。其中,特佳為使用碳黑。藉由碳黑,能夠屏蔽寬波長範圍的電磁波。Examples of inorganic pigments include carbon black, cobalt-based pigments, iron-based pigments, chromium-based pigments, titanium-based pigments, vanadium-based pigments, zirconium-based pigments, molybdenum-based pigments, ruthenium-based pigments, platinum-based pigments, ITO ( Indium tin oxide) pigments, ATO (antimony tin oxide) pigments, etc. Among them, it is particularly preferable to use carbon black. With carbon black, electromagnetic waves in a wide wavelength range can be shielded.

保護膜形成膜中的著色劑(特別是碳黑)的摻合量,因保護膜形成膜的厚度而異,例如當保護膜形成膜的厚度為25μm時,將保護膜形成膜用組合物的總重量設為100質量份時的著色劑的含量較佳為0.01~10質量份、0.03~7質量份、0.05~4質量份。The blending amount of the colorant (especially carbon black) in the protective film-forming film varies depending on the thickness of the protective film-forming film. For example, when the thickness of the protective film-forming film is 25 μm, the composition for protective film-forming film The content of the colorant when the total weight is 100 parts by mass is preferably 0.01 to 10 parts by mass, 0.03 to 7 parts by mass, or 0.05 to 4 parts by mass.

著色劑(特別是碳黑)的平均粒徑較佳為1~500nm、3~100nm、5~50nm。若著色劑的平均粒徑在上述範圍內,則容易將透光率控制在所需範圍內。The average particle size of the colorant (especially carbon black) is preferably 1-500 nm, 3-100 nm, 5-50 nm. When the average particle diameter of the coloring agent is within the above-mentioned range, it is easy to control the light transmittance within the desired range.

(1.2.7 其他添加劑) 保護膜形成膜用組合物可以在不損害本發明的效果的範圍內含有例如光聚合起始劑、交聯劑、增塑劑、抗靜電劑、抗氧化劑、吸雜劑(gettering agent)、增黏劑、剝離劑等作為其他添加劑。 (1.2.7 Other additives) The composition for forming a protective film may contain, for example, a photopolymerization initiator, a crosslinking agent, a plasticizer, an antistatic agent, an antioxidant, a gettering agent, a Adhesives, release agents, etc. are used as other additives.

(2. 保護膜形成用片) 本實施形態的保護膜形成用片具有上述保護膜形成膜與配置於保護膜形成膜的至少一個主面的剝離膜。剝離膜在使用保護膜形成膜時被剝離。 (2. Sheet for protective film formation) The sheet for protective film formation of this embodiment has the said protective film forming film, and the peeling film arrange|positioned at least one main surface of a protective film forming film. The peeling film is peeled when forming a film using a protective film.

圖4所示的保護膜形成用片51具有以下構成:在保護膜形成膜10的一個主面10a上配置有支撐保護膜形成膜10的第一剝離膜21,並在另一個主面10b上配置有第二剝離膜22。The protective film forming sheet 51 shown in FIG. 4 has a structure in which a first release film 21 supporting the protective film forming film 10 is disposed on one main surface 10a of the protective film forming film 10, and a first release film 21 is disposed on the other main surface 10b. A second release film 22 is provided.

本實施形態的保護膜形成用片用於:在將工件單顆化前,將保護膜形成膜貼附於該工件的背面,並使保護膜形成膜固化,在該工件的背面形成保護膜。形成有保護膜的工件(附保護膜的工件)藉由隱形切割而被單顆化,得到作為工件加工物的附保護膜的晶片。The protective film-forming sheet of this embodiment is used to attach a protective film-forming film to the back surface of the workpiece before singulating the workpiece, and to cure the protective film-forming film to form a protective film on the rear surface of the workpiece. The workpiece on which the protective film was formed (workpiece with protective film) is singulated by stealth dicing to obtain a wafer with protective film as a processed workpiece.

此外,保護膜形成用片也可以為相對於寬度方向的長度而言長度方向的長度非常長的長條片的形態。此外,也可以為將這種長條片捲繞而得到的片卷的形態。Moreover, the sheet|seat for protective film formation may be the form of the elongated sheet whose length in the longitudinal direction is very long with respect to the length in the width direction. In addition, it may be in the form of a sheet roll obtained by winding such a long sheet.

進一步,保護膜形成用片也可以為,以應貼附於工件的保護膜形成膜具有規定的閉合形狀的方式實施了沖切加工的保護膜形成用片。規定的閉合形狀沒有特別限制,較佳為與所貼附的工件大致相同的形狀。Furthermore, the sheet for forming a protective film may be a sheet for forming a protective film that has been punched so that the forming film to be attached to the workpiece has a predetermined closed shape. The predetermined closed shape is not particularly limited, and is preferably approximately the same shape as the attached workpiece.

(2.1 剝離膜) 剝離膜為以能夠剝離的方式支撐保護膜形成膜的膜。剝離膜可以由一層(單層)或兩層以上的基材構成,從控制剝離性的觀點而言,也可以對基材的表面實施剝離處理。即,可以對基材的表面實施改性,也可以在基材的表面形成並非來自於基材的材料(剝離劑層)。 (2.1 Peel-off film) The peeling film is a film that supports the protective film forming film in a peelable manner. The peeling film may be composed of one layer (single layer) or two or more layers of substrates, and the surface of the substrates may be subjected to a peeling treatment from the viewpoint of controlling peelability. That is, the surface of the base material may be modified, or a material not derived from the base material (release agent layer) may be formed on the surface of the base material.

作為基材,只要為能夠在保護膜形成膜貼附於工件之前支撐保護膜形成膜的材料,則沒有特別限定,通常由以樹脂類的材料為主要材料的膜(以下稱作「樹脂膜」)構成。The substrate is not particularly limited as long as it is a material that can support the protective film forming film before the protective film forming film is attached to the workpiece, and is usually made of a resin-based film (hereinafter referred to as "resin film"). )constitute.

作為樹脂膜的具體實例,可使用聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、聚氯乙烯膜、氯乙烯共聚物膜、聚對苯二甲酸乙二醇酯膜、聚萘二甲酸乙二醇酯膜、聚對苯二甲酸丁二醇酯膜、聚氨酯膜、乙烯乙酸乙烯酯共聚物膜、離聚物樹脂膜、乙烯-(甲基)丙烯酸共聚物膜、乙烯-(甲基)丙烯酸酯共聚物膜、聚苯乙烯膜、聚碳酸酯膜、聚醯亞胺膜、氟樹脂膜等。此外,還可使用這些樹脂膜的交聯膜。進一步,也可以為這些樹脂膜的積層膜。在本實施形態中,從環境安全性、成本等觀點而言,較佳為聚對苯二甲酸乙二醇酯膜。As specific examples of the resin film, polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyterephthalene film, Ethylene formate film, polyethylene naphthalate film, polybutylene terephthalate film, polyurethane film, ethylene vinyl acetate copolymer film, ionomer resin film, ethylene-(methyl ) acrylic copolymer film, ethylene-(meth)acrylate copolymer film, polystyrene film, polycarbonate film, polyimide film, fluororesin film, and the like. In addition, crosslinked films of these resin films can also be used. Furthermore, a laminated film of these resin films may also be used. In the present embodiment, a polyethylene terephthalate film is preferable from the viewpoints of environmental safety, cost, and the like.

上述的樹脂膜也可以含有著色劑、阻燃劑、增塑劑、抗靜電劑、潤滑劑、填料等各種添加劑。The aforementioned resin film may contain various additives such as coloring agents, flame retardants, plasticizers, antistatic agents, lubricants, and fillers.

剝離劑層可藉由在基材的一個面上塗佈包含剝離劑層用組合物的塗佈劑後,使該塗膜乾燥並固化而得到。剝離劑層用組合物只要為能夠對基材賦予與保護膜形成膜之間的剝離性的材料,則沒有特別限制。在本實施形態中,作為剝離劑層用組合物,例如較佳為醇酸類離型劑、矽酮類離型劑、氟類離型劑、不飽和聚酯類離型劑、聚烯烴類離型劑、石蠟類離型劑,其中,較佳為矽酮類離型劑。The release agent layer can be obtained by applying a coating agent containing a composition for a release agent layer on one surface of a substrate, and then drying and curing the coating film. The composition for a release agent layer is not particularly limited as long as it is a material capable of imparting releasability with a protective film forming film to a base material. In this embodiment, as the composition for the release agent layer, for example, alkyd-based release agents, silicone-based release agents, fluorine-based release agents, unsaturated polyester-based release agents, polyolefin-based release agents, etc. are preferable. Molding agent, paraffin type release agent, among them, silicone type release agent is preferred.

剝離膜的厚度沒有特別限制,較佳為15~100μm,進一步較佳為25~80μm,更佳為35~60μm。The thickness of the release film is not particularly limited, but is preferably 15-100 μm, more preferably 25-80 μm, and more preferably 35-60 μm.

另外,如圖4所示,當在保護膜形成膜的兩個主面上形成有剝離膜時,較佳為將一個剝離膜的剝離力設置得較大而作為重剝離型剝離膜,並將另一個剝離膜的剝離力設置得較小而作為輕剝離型剝離膜。In addition, as shown in FIG. 4, when a peeling film is formed on both main surfaces of the protective film forming film, it is preferable to set the peeling force of one peeling film to be larger as a heavy peeling type peeling film, and set The peeling force of the other peeling film was set to be small as a light peeling type peeling film.

(3. 保護膜形成用複合片) 本實施形態的保護膜形成用複合片具有上述保護膜形成膜與支撐保護膜形成膜的支撐片。 (3. Composite sheet for protective film formation) The composite sheet for protective film formation of this embodiment has the said protective film forming film, and the support sheet which supports a protective film forming film.

本實施形態的保護膜形成用複合片用於:在將工件單顆化前,將保護膜形成用複合片中所包含的保護膜形成膜貼附於該工件的背面,並使保護膜形成膜固化,在該工件上形成保護膜。The protective film-forming composite sheet of this embodiment is used to attach the protective-film-forming film contained in the protective-film-forming composite sheet to the back surface of the workpiece before singulating the workpiece, and form the protective film into a film. Curing forms a protective film on the workpiece.

進一步,在將形成有保護膜的工件(附保護膜的工件)藉由隱形切割而單顆化時,保護膜形成用複合片中所包含的支撐片由於使拉伸力作用於形成有改質區域的工件而被拉伸。最終可得到作為工件加工物的附保護膜的晶片。Furthermore, when the work on which the protective film is formed (work with the protective film) is singulated by stealth dicing, the support sheet included in the composite sheet for forming the protective film is subjected to a tensile force acting on the modified film. Artifacts in the region are stretched. Finally, a wafer with a protective film can be obtained as a workpiece to be processed.

因此,較佳為支撐片具有能夠實現規定擴展量的程度的伸縮性,且能夠以能夠保持工件且在擴展時可使拉伸力傳遞至工件的程度與工件密合。Therefore, it is preferable that the support sheet has stretchability to a degree that can achieve a predetermined amount of expansion, and can closely adhere to the work to such an extent that the work can be held and tensile force can be transmitted to the work when it is expanded.

具體而言,支撐片較佳為具有基材及黏著劑層的黏著片。Specifically, the support sheet is preferably an adhesive sheet having a base material and an adhesive layer.

圖5所示的保護膜形成用複合片61具有具備黏著片4、保護膜形成膜10及夾具用黏著劑層5的構成,其中,黏著片4藉由在基材41的一個面上積層黏著劑層42而成,保護膜形成膜10積層於黏著片4的黏著劑層42側,且以小於黏著劑層42的徑而形成,夾具用黏著劑層5積層在比保護膜形成膜10更靠近外側的黏著片4的周邊部。即,黏著片4為支撐片。另外,夾具用黏著劑層5為用於將保護膜形成用複合片61黏合於環形框架等夾具的層。The composite sheet 61 for protective film formation shown in FIG. 42, the protective film forming film 10 is laminated on the adhesive layer 42 side of the adhesive sheet 4, and is formed with a diameter smaller than the adhesive layer 42, and the adhesive layer 5 for jigs is laminated on The peripheral portion of the adhesive sheet 4 near the outer side. That is, the adhesive sheet 4 is a supporting sheet. Moreover, the adhesive agent layer 5 for jigs is a layer for adhering the composite sheet 61 for protective film formation to jig|tools, such as a ring frame.

(3.1 黏著片) 在本實施形態中,作為支撐片,對具有基材及黏著劑層的黏著片進行說明。 (3.1 Adhesive sheet) In this embodiment, the adhesive sheet which has a base material and an adhesive layer as a support sheet is demonstrated.

(3.1.1 直角撕裂強度比) 在本實施形態中,將在23℃下對支撐片實施直角撕裂試驗時的支撐片的直角撕裂強度設為TS2時,作為TS1(23℃下的固化後的保護膜形成膜的直角撕裂強度)相對於TS2的比、即TS1/TS2較佳為0.15以下。 (3.1.1 Right angle tear strength ratio) In the present embodiment, when the right-angle tear strength of the support sheet when the support sheet is subjected to the right-angle tear test at 23° C. is TS2, the right-angle tear strength of the protective film forming film after curing at 23° C. The ratio of cracking strength) to TS2, that is, TS1/TS2 is preferably 0.15 or less.

支撐片需具有擴展時不會斷裂的程度的強度。然而,擴展量與拉伸支撐片的力成正比。使TS1/TS2在上述範圍內時,由於TS2相對於TS1而言足夠大,即使將擴展量設置得較大,也不會使支撐片在擴展時斷裂且能夠確實地分割保護膜。即,能夠應對擴展量的較寬範圍的變化,且能夠充分確保擴展量的裕度(margin)。The supporting sheet needs to have such strength that it does not break when expanded. However, the amount of expansion is directly proportional to the force stretching the support sheet. When TS1/TS2 is within the above range, since TS2 is sufficiently larger than TS1, even if the amount of expansion is set larger, the protective film can be reliably divided without breaking the support sheet during expansion. That is, it is possible to cope with a wide range of changes in the amount of expansion, and it is possible to ensure a sufficient margin for the amount of expansion.

TS1/TS2更佳為0.125以下,進一步較佳為0.116以下。TS1/TS2 is more preferably at most 0.125, further preferably at most 0.116.

另一方面,雖然TS1/TS2的下限值沒有特別限制,從構成支撐片的材料的選擇性的觀點,及使分割後的保護膜的外周邊線為良好的直線的觀點而言,較佳為0.03以上,更佳為0.06以上。On the other hand, although the lower limit of TS1/TS2 is not particularly limited, it is preferable from the viewpoint of the selectivity of the material constituting the support sheet and the viewpoint of making the outer peripheral line of the divided protective film a good straight line. It is at least 0.03, more preferably at least 0.06.

當TS1/TS2在上述範圍之外時,TS2較低,意味著TS2相對於TS1而言並不是那麼大。即,與TS1/TS2在上述範圍內的情況相比,意味著支撐片在擴展時容易斷裂。當支撐片在擴展時發生斷裂時,拉伸力變得無法作用於附保護膜的工件,因此,附保護膜的工件中的大部分無法被分割。結果導致晶片成品率大幅降低。When TS1/TS2 is outside the above range, TS2 is low, meaning TS2 is not that large relative to TS1. That is, compared with the case where TS1/TS2 is within the above-mentioned range, it means that the supporting sheet is easily broken when expanded. When the support sheet breaks while expanding, the tensile force becomes unable to act on the protected filmed workpiece, and therefore, most of the protected filmed workpiece cannot be divided. As a result, wafer yields are greatly reduced.

因此,通常將由TS2高的材料構成的片材用作支撐片。藉由使TS2較高,即使在使用支撐片時意外地使支撐片處於比通常更容易斷裂的狀態,也能夠進一步降低支撐片斷裂的風險。例如,即使是由相同材料構成的片材,當片材上存在傷痕時,會以傷痕為起點發生斷裂,因此,支撐片變得在擴展時容易斷裂,但藉由使TS2較高而使TS1/TS2較小,可容易兼顧支撐片斷裂風險的降低及保護膜的良好分割性。上述傷痕可能會因運輸步驟等中的衝擊等而產生。Therefore, a sheet made of a material having a high TS2 is generally used as a support sheet. By making TS2 higher, it is possible to further reduce the risk of the support sheet breaking even if the support sheet is accidentally left in a state where it is more easily broken than usual when using the support sheet. For example, even if the sheet is made of the same material, if there is a flaw on the sheet, it will break starting from the flaw. Therefore, the support sheet will be easily broken when it expands. However, by making TS2 higher and TS1 /TS2 is small, and it is easy to take into account the reduction of the risk of fracture of the support sheet and the good splittability of the protective film. The above-mentioned scratches may be caused by shocks during transportation steps and the like.

當支撐片為具有基材及黏著劑層的黏著片時,只要為黏著片的TS2滿足上述TS1/TS2的範圍的組成,則基材及黏著劑層的組成沒有特別限定。When the support sheet is an adhesive sheet having a base material and an adhesive layer, the composition of the base material and the adhesive layer is not particularly limited as long as TS2 of the adhesive sheet satisfies the composition in the range of TS1/TS2.

(3.1.2. 基材) 黏著片4的基材41通常由以樹脂材料作為主要成分的膜(以下稱作樹脂膜)構成。 (3.1.2. Substrate) The base material 41 of the adhesive sheet 4 is generally composed of a film (hereinafter referred to as a resin film) mainly composed of a resin material.

作為樹脂膜的具體實例,可列舉出低密度聚乙烯(LDPE)膜、線性低密度聚乙烯(LLDPE)膜、高密度聚乙烯(HDPE)膜等聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、乙烯-降莰烯共聚物膜、降莰烯樹脂膜等聚烯烴類膜;乙烯-乙酸乙烯酯共聚物膜、乙烯-(甲基)丙烯酸共聚物膜、乙烯-(甲基)丙烯酸酯共聚物膜等乙烯類共聚物膜;聚氯乙烯膜、氯乙烯共聚物膜等聚氯乙烯類膜;聚對苯二甲酸乙二醇酯膜、聚對苯二甲酸丁二醇酯膜等聚酯類膜;聚氨酯膜;聚醯亞胺膜;聚苯乙烯膜;聚碳酸酯膜;氟樹脂膜等。此外,也可使用這些樹脂膜的交聯膜、離聚物膜這種改性膜。上述基材41可以為由這些樹脂膜中的一種構成的膜,也可以為進一步組合這些樹脂膜中的兩種以上而成的積層膜。在本實施形態中,從擴展性及直角撕裂強度的觀點而言,較佳為聚丙烯膜及聚氯乙烯類膜。Specific examples of the resin film include polyethylene films such as low-density polyethylene (LDPE) films, linear low-density polyethylene (LLDPE) films, and high-density polyethylene (HDPE) films, polypropylene films, and polybutylene films. , polybutadiene film, polymethylpentene film, ethylene-norbornene copolymer film, norbornene resin film and other polyolefin films; ethylene-vinyl acetate copolymer film, ethylene-(meth)acrylic acid Ethylene-based copolymer films such as copolymer films and ethylene-(meth)acrylate copolymer films; polyvinyl chloride films such as polyvinyl chloride films and vinyl chloride copolymer films; polyethylene terephthalate films, Polyester films such as polybutylene terephthalate films; polyurethane films; polyimide films; polystyrene films; polycarbonate films; fluororesin films, etc. In addition, a modified film such as a crosslinked film of these resin films or an ionomer film can also be used. The above-mentioned base material 41 may be a film composed of one of these resin films, or may be a laminated film obtained by further combining two or more of these resin films. In the present embodiment, a polypropylene film and a polyvinyl chloride film are preferable from the viewpoint of expansibility and right-angle tear strength.

出於提高上述樹脂膜與積層於上述樹脂膜的表面的黏著劑層42之間的密合性的目的,可根據需要對上述樹脂膜的單面或兩面實施基於氧化法或凹凸化法等的表面處理、或底塗處理。作為上述氧化法,例如可列舉出電暈放電處理、等離子體放電處理、鉻酸化處理(濕式)、火焰處理、熱風處理、臭氧、紫外線照射處理等,此外,作為凹凸化法,例如可列舉出噴砂法、熱噴塗處理法等。For the purpose of improving the adhesiveness between the above-mentioned resin film and the adhesive layer 42 laminated on the surface of the above-mentioned resin film, one side or both sides of the above-mentioned resin film may be subjected to an oxidation method or a concave-convex method, etc. Surface treatment, or primer treatment. Examples of the oxidation method include corona discharge treatment, plasma discharge treatment, chromating treatment (wet method), flame treatment, hot air treatment, ozone, and ultraviolet irradiation treatment. Sandblasting, thermal spraying, etc.

上述樹脂膜也可以含有著色劑、阻燃劑、增塑劑、抗靜電劑、潤滑劑、填料等各種添加劑。The above-mentioned resin film may contain various additives such as a colorant, a flame retardant, a plasticizer, an antistatic agent, a lubricant, and a filler.

只要基材41能夠在使用保護膜形成用複合片的各步驟中適當地發揮作用,則對其厚度沒有特別限定。較佳為20~200μm,更佳為40~170μm,特佳為50~140μm的範圍。The thickness of the base material 41 is not specifically limited as long as it can function suitably in each process which uses the composite sheet for protective film formation. It is preferably in the range of 20-200 μm, more preferably in the range of 40-170 μm, particularly preferably in the range of 50-140 μm.

(3.1.3. 黏著劑層) 本實施形態的保護膜形成用複合片的黏著片4所具備的黏著劑層42可以由非能量射線固化性黏著劑構成,也可以由能量射線固化性黏著劑構成。作為非能量射線固化性黏著劑,較佳為具有所需黏著力及再剝離性的黏著劑,例如可使用丙烯酸類黏著劑、橡膠類黏著劑、矽酮類黏著劑、胺基甲酸酯(urethane)類黏著劑、聚酯類黏著劑、聚乙烯醚類黏著劑等。其中,從與保護膜形成膜10之間的密合性高,且能夠在擴展時確實地保持附保護膜的晶片的觀點而言,較佳為丙烯酸類黏著劑。此外,從容易控制附保護膜的晶片的拾取適性的觀點而言,也較佳為丙烯酸類黏著劑。 (3.1.3. Adhesive layer) The adhesive layer 42 included in the adhesive sheet 4 of the composite sheet for forming a protective film according to this embodiment may be composed of a non-energy ray-curable adhesive or an energy ray-curable adhesive. The non-energy ray-curable adhesive is preferably an adhesive having required adhesive force and re-peelability, for example, an acrylic adhesive, a rubber adhesive, a silicone adhesive, a urethane ( urethane) adhesives, polyester adhesives, polyvinyl ether adhesives, etc. Among these, an acrylic adhesive is preferable from the viewpoint of having high adhesion with the protective film forming film 10 and being able to reliably hold a wafer with a protective film during expansion. Moreover, an acrylic adhesive is also preferable from a viewpoint of easy control of the pick-up property of the wafer with a protective film.

另一方面,由於能量射線固化性黏著劑的黏著力會因照射能量射線而降低,在需要將工件或工件加工物與黏著片分離時,能夠藉由照射能量射線而容易地使其分離。On the other hand, since the adhesive force of the energy ray-curable adhesive is lowered by irradiating energy rays, when it is necessary to separate the workpiece or workpiece from the adhesive sheet, it can be easily separated by irradiating the energy ray.

構成黏著劑層42的能量射線固化性黏著劑可以以具有能量射線固化性的聚合物作為主要成分,也可以以不具有能量射線固化性的聚合物與能量射線固化性的單體及/或低聚物的混合物作為主要成分。The energy ray-curable adhesive constituting the adhesive layer 42 may contain an energy-ray-curable polymer as a main component, or may contain a non-energy-ray-curable polymer and an energy-ray-curable monomer and/or a low-energy ray-curable adhesive. A mixture of polymers as the main component.

作為具有能量射線固化性的聚合物,例如可示例出導入了能量射線固化性基團的(甲基)丙烯酸酯(共)聚合物等。作為能量射線固化性的單體及/或低聚物,可示例出多元醇與(甲基)丙烯酸的酯。此外,能量射線固化性黏著劑除了包含具有能量射線固化性的成分以外,還可以包含光聚合起始劑、交聯劑等添加劑。As a polymer having energy ray curability, for example, a (meth)acrylate (co)polymer into which an energy ray curable group has been introduced can be exemplified. As an energy ray curable monomer and/or oligomer, the ester of a polyhydric alcohol and (meth)acrylic acid is mentioned. In addition, the energy ray-curable adhesive may contain additives such as photopolymerization initiators and crosslinking agents in addition to energy ray-curable components.

只要黏著劑層42能夠在使用保護膜形成用複合片的各步驟中適當地發揮作用,則對其厚度沒有特別限定。具體而言,黏著劑層的厚度較佳為1~50μm、2~30μm、2~20μm、3~10μm、3~8μm。The thickness of the pressure-sensitive adhesive layer 42 is not particularly limited as long as it can function appropriately in each step of using the composite sheet for protective film formation. Specifically, the thickness of the adhesive layer is preferably 1-50 μm, 2-30 μm, 2-20 μm, 3-10 μm, 3-8 μm.

作為構成夾具用黏著劑層5的黏著劑,較佳為具有所需黏著力及再剝離性的黏著劑,例如可使用丙烯酸類黏著劑、橡膠類黏著劑、矽酮類黏著劑、胺基甲酸酯類黏著劑、聚酯類黏著劑、聚乙烯醚類黏著劑等。其中,較佳為丙烯酸類黏著劑,其與環形框架等夾具之間的密合性高,能夠有效抑制在切割步驟等中保護膜形成用複合片從環形框架等上剝落。另外,也可以在夾具用黏著劑層5的厚度方向的中途存在作為芯材的基材。As the adhesive constituting the adhesive layer 5 for jigs, an adhesive having required adhesive force and re-peelability is preferable, and for example, acrylic adhesives, rubber adhesives, silicone adhesives, urethane adhesives, etc. can be used. Ester adhesives, polyester adhesives, polyvinyl ether adhesives, etc. Among them, an acrylic adhesive is preferable because it has high adhesion to jigs such as a ring frame and can effectively suppress peeling of the protective film-forming composite sheet from the ring frame or the like in a cutting step or the like. Moreover, the base material which is a core material may exist in the middle of the thickness direction of the adhesive agent layer 5 for jigs.

從對環形框架等夾具的黏著性的觀點而言,夾具用黏著劑層5的厚度較佳為5~200μm,特佳為10~100μm。From the viewpoint of adhesiveness to jigs such as ring frames, the thickness of the adhesive layer 5 for jigs is preferably 5 to 200 μm, particularly preferably 10 to 100 μm.

(4. 保護膜形成膜及保護膜形成用片的製造方法) 保護膜形成膜的製造方法沒有特別限定。該膜可以使用上述保護膜形成膜用組合物、或用溶劑將該保護膜形成膜用組合物稀釋而得到的組合物(將所述兩種組合物稱作「塗佈劑」)而製造。塗佈塗佈劑可藉由公知的方法將構成保護膜形成膜用組合物的成分混合而製備。 (4. Manufacturing method of protective film forming film and protective film forming sheet) The manufacturing method of the protective film forming film is not specifically limited. The film can be produced using the above-mentioned composition for forming a protective film or a composition obtained by diluting the composition for forming a protective film with a solvent (these two compositions are referred to as "coating agent"). The coating agent can be prepared by mixing the components constituting the protective film-forming composition by a known method.

使用輥塗機、刮刀塗佈機、輥刀塗佈機、氣刀塗佈機、模塗機、棒塗機、凹版塗佈機、幕塗機等塗佈機,將所得到的塗佈劑塗佈於第一剝離膜的剝離面,並根據需要使其乾燥,在第一剝離膜上形成保護膜形成膜。The obtained coating agent is coated with a coating machine such as a roll coater, a knife coater, a roll coater, an air knife coater, a die coater, a rod coater, a gravure coater, or a curtain coater. It is applied to the release surface of the first release film and dried as necessary to form a protective film-forming film on the first release film.

接著,藉由在形成於第一剝離膜上的保護膜形成膜的露出面上進一步貼合第二剝離膜的剝離面,得到圖4所示的保護膜形成用片。Next, the peeling surface of the 2nd peeling film was bonded to the exposed surface of the protective film forming film formed on the 1st peeling film, and the sheet|seat for protective film formation shown in FIG. 4 was obtained.

(5. 保護膜形成用複合片的製造方法) 保護膜形成用複合片的製造方法沒有特別限制。例如能夠藉由以下方法製造:分別製作包含保護膜形成膜的第一積層體與包含作為支撐片的黏著片的第二積層體,然後,使用第一積層體及第二積層體,將保護膜形成膜與黏著片積層。 (5. Manufacturing method of composite sheet for protective film formation) The manufacturing method of the composite sheet for protective film formation is not specifically limited. For example, it can be produced by a method of separately producing a first laminate including a protective film-forming film and a second laminate including an adhesive sheet as a support sheet, and then using the first laminate and the second laminate to attach the protective film Form film and adhesive sheet laminate.

第一積層體能夠藉由與上述保護膜形成用片相同的方法而製造。即,在第一剝離膜的剝離面上形成保護膜形成膜,並將第二剝離膜的剝離面貼合於保護膜形成膜的露出面。The 1st laminated body can be manufactured by the method similar to the said sheet|seat for protective film formation. That is, the protective film forming film is formed on the peeling surface of the 1st peeling film, and the peeling surface of the 2nd peeling film is bonded to the exposed surface of the protective film forming film.

另一方面,為了製造第二積層體,首先,製備構成黏著劑層的黏著劑組合物、或用溶劑將該黏著劑組合物稀釋而得到的組合物(將所述兩種組合物稱作「塗佈劑」)。接著,在第三剝離膜的剝離面上塗佈塗佈劑,並根據需要進行乾燥,在第三剝離膜上形成黏著劑層。然後,將基材貼合於黏著劑層的露出面,得到由黏著片與第三剝離膜構成的積層體(第二積層體),該黏著片由基材及黏著劑層構成。On the other hand, in order to manufacture the second laminate, first, an adhesive composition constituting the adhesive layer, or a composition obtained by diluting the adhesive composition with a solvent (these two compositions are referred to as " coating agent"). Next, a coating agent is applied on the release surface of the third release film, and dried as necessary to form an adhesive layer on the third release film. Then, the substrate was attached to the exposed surface of the adhesive layer to obtain a laminate (second laminate) composed of an adhesive sheet composed of the substrate and the adhesive layer and a third release film.

其中,當黏著劑層由能量射線固化性黏著劑構成時,可以在該階段對黏著劑層照射能量射線,從而使黏著劑層固化,也可以在與保護膜形成膜積層之後使黏著劑層固化。此外,當在與保護膜形成膜積層之後使黏著劑層固化時,可以在切割步驟前使黏著劑層固化,也可以在切割步驟後使黏著劑層固化。However, when the adhesive layer is composed of an energy ray-curable adhesive, the adhesive layer may be cured by irradiating the adhesive layer with energy rays at this stage, or may be cured after forming a film laminate with the protective film. . Furthermore, when the adhesive layer is cured after forming a film laminate with the protective film, the adhesive layer may be cured before the dicing step, or may be cured after the dicing step.

作為能量射線,通常使用紫外線、電子束等。能量射線的照射量因能量射線的種類而異,例如採用紫外線時,較佳為光量為50~1000mJ/cm 2,特佳為100~500mJ/cm 2。此外,採用電子束時,較佳為10~1000krad左右。 As the energy rays, ultraviolet rays, electron beams, and the like are generally used. The irradiation amount of energy rays varies depending on the type of energy rays. For example, when ultraviolet rays are used, the amount of light is preferably 50-1000 mJ/cm 2 , and particularly preferably 100-500 mJ/cm 2 . In addition, when an electron beam is used, it is preferably about 10 to 1000 krad.

以上述方式得到第一積層體及第二積層體後,剝離第一積層體中的第二剝離膜,且同時剝離第二積層體中的第三剝離膜,並將第一積層體所露出的保護膜形成膜與第二積層體所露出的黏著片的黏著劑層貼合。After the first laminate and the second laminate are obtained in the above manner, the second release film in the first laminate is peeled off, and the third release film in the second laminate is peeled off at the same time, and the exposed part of the first laminate is The protective film forming film is bonded to the adhesive layer of the adhesive sheet exposed in the second laminate.

由此得到保護膜形成用複合片,該保護膜形成用複合片由在基材上積層有黏著劑層的黏著片、積層於黏著片的黏著劑層側的保護膜形成膜及積層於保護膜形成膜的與黏著片為相反側的第一剝離膜構成。根據需要剝離第一剝離膜後,在露出的黏著劑層的周邊部形成夾具用黏著劑層。Thus, a composite sheet for forming a protective film is obtained, which is composed of an adhesive sheet on which an adhesive layer is laminated on a base material, a protective film forming film laminated on the adhesive layer side of the adhesive sheet, and a laminated film on the protective film. The first release film on the opposite side to the adhesive sheet forming the film is constituted. After peeling off the 1st peeling film as needed, the adhesive agent layer for clips is formed in the peripheral part of the exposed adhesive agent layer.

(6. 裝置的製造方法) 作為使用本實施形態的保護膜形成膜的裝置的製造方法的一個例子,對得到附保護膜的工件加工物的方法進行說明,該附保護膜的工件加工物由將貼附有保護膜形成膜的工件單顆化而得到。 (6. Manufacturing method of device) As an example of the manufacturing method using the apparatus for forming a protective film according to this embodiment, a method for obtaining a processed workpiece with a protective film made by attaching a protective film forming film will be described. obtained by singulating the workpiece.

本實施形態的裝置的製造方法至少具有以下的步驟1~5。 步驟1:將保護膜形成膜貼附於工件的背面的步驟; 步驟2:使所貼附的保護膜形成膜固化,從而在工件的背面形成保護膜,得到附保護膜的工件的步驟; 步驟3:使雷射聚焦於工件內部的事先設定的區域,從而形成第一改質區域的步驟; 步驟4:使雷射聚焦於保護膜內部的事先設定的區域,從而形成第二改質區域的步驟; 步驟5:使拉伸力作用於形成有第一改質區域及第二改質區域的附保護膜的工件,從而將該附保護膜的工件單顆化,得到複數個附保護膜的工件加工物的步驟。 The manufacturing method of the device of this embodiment has at least the following steps 1 to 5. Step 1: a step of attaching the protective film forming film to the back surface of the workpiece; Step 2: curing the attached protective film to form a film, thereby forming a protective film on the back of the workpiece to obtain a workpiece with a protective film; Step 3: focusing the laser on a pre-set area inside the workpiece to form a first modified area; Step 4: Focusing the laser on a pre-set area inside the protective film to form a second modified area; Step 5: applying a tensile force to the workpiece with the protective film formed with the first modified region and the second modified region, thereby singulating the workpiece with the protective film to obtain a plurality of workpieces with the protective film. step of the object.

另外,步驟2在步驟4之前實施。此外,較佳為步驟2在步驟3之前實施。In addition, step 2 is implemented before step 4. In addition, it is preferable that step 2 is implemented before step 3.

利用附圖對具有上述步驟1~5的裝置的製造方法進行說明。以下,對工件為晶圓的情況進行說明。首先,將保護膜形成膜貼附於工件(晶圓)的背面(步驟1)。所貼附的保護膜形成膜沒有特別限定,較佳為例如上述的保護膜形成膜。The manufacturing method of the device having the above steps 1 to 5 will be described with reference to the drawings. Hereinafter, a case where the workpiece is a wafer will be described. First, a protective film forming film is attached to the back surface of a workpiece (wafer) (step 1). The protective film-forming film to be attached is not particularly limited, and is preferably, for example, the above-mentioned protective film-forming film.

當保護膜形成膜包含於保護膜形成用片時,如圖6A所示,將保護膜形成用片51的保護膜形成膜10貼附於工件6的背面(步驟1)。貼附之後,根據需要剝下第一剝離膜21。When the protective film forming film is included in the protective film forming sheet, as shown in FIG. 6A , the protective film forming film 10 of the protective film forming sheet 51 is attached to the back surface of the workpiece 6 (step 1). After sticking, the first release film 21 is peeled off as necessary.

此外,當保護膜形成膜包含於保護膜形成用複合片時,如圖6B所示,將保護膜形成用複合片61的保護膜形成膜10貼附於作為工件的晶圓6(步驟1)。此時,黏著劑層42的外周部可藉由環形框架7而固定。在本實施形態中,如圖5所示,在黏著劑層42的外周部設置有夾具用黏著劑層5,因此,將夾具用黏著劑層5貼附於環形框架7。保護膜形成膜10貼附於晶圓6的背面。作為支撐片的黏著片4可作為隱形切割用切割膠帶發揮作用。Further, when the protective film forming film is included in the protective film forming composite sheet, as shown in FIG. 6B , the protective film forming film 10 of the protective film forming composite sheet 61 is attached to the wafer 6 as the workpiece (step 1) . At this time, the outer peripheral portion of the adhesive layer 42 can be fixed by the ring frame 7 . In this embodiment, as shown in FIG. 5 , since the adhesive layer 5 for the jig is provided on the outer peripheral portion of the adhesive layer 42 , the adhesive layer 5 for the jig is attached to the ring frame 7 . The protective film forming film 10 is attached to the back surface of the wafer 6 . The adhesive sheet 4 as a support sheet functions as a dicing tape for stealth dicing.

然後,如圖7所示,使所貼附的保護膜形成膜10固化而形成保護膜,得到附保護膜的晶圓100(步驟2)。當保護膜形成膜10為熱固性時,將保護膜形成膜10以規定溫度且以適當的時間進行加熱形成保護膜1即可。例如,加熱溫度較佳為100~200℃,例如可以為110~180℃及120~170℃中的任一範圍。加熱時間較佳為0.5~5小時,例如可以為0.5~3小時及1~2小時中的任一範圍。此外,當保護膜形成膜10為能量射線固化性時,使能量射線自黏著片4或剝離膜21側入射而形成保護膜1即可。例如,能量射線的照度較佳為120~280mW/cm 2,能量射線的光量較佳為100~1000mJ/cm 2Then, as shown in FIG. 7 , the attached protective film-forming film 10 is cured to form a protective film to obtain a protective film-attached wafer 100 (step 2). When the protective film forming film 10 is thermosetting, the protective film 1 may be formed by heating the protective film forming film 10 at a predetermined temperature for an appropriate time. For example, the heating temperature is preferably 100-200°C, for example, may be any range of 110-180°C and 120-170°C. The heating time is preferably 0.5 to 5 hours, for example, may be in any range of 0.5 to 3 hours and 1 to 2 hours. Moreover, what is necessary is just to form the protective film 1 by making the energy ray inject from the side of the adhesive sheet 4 or the peeling film 21, when the protective film forming film 10 is energy-ray curable. For example, the illuminance of energy rays is preferably 120-280 mW/cm 2 , and the light intensity of energy rays is preferably 100-1000 mJ/cm 2 .

對將圖4所示的保護膜形成用片51的保護膜形成膜10固化而得到的附保護膜的晶圓,貼附作為隱形切割用切割膠帶的支撐片。支撐片也貼附於環形框架。作為支撐片,可示例出上述的黏著片。即,將黏著片貼附於附保護膜的晶圓及環形框架時,可從圖7所示的構成中省略夾具用黏著劑層5,而成為黏著片4貼附於環形框架7的構成。A support sheet as a dicing tape for stealth dicing is attached to a wafer with a protective film obtained by curing the protective film forming film 10 of the protective film forming sheet 51 shown in FIG. 4 . Support sheets are also attached to the ring frame. As a support sheet, the above-mentioned adhesive sheet can be illustrated. That is, when attaching the adhesive sheet to the wafer with protective film and the ring frame, the adhesive layer 5 for jigs can be omitted from the configuration shown in FIG.

接著,如圖8所示,使雷射自雷射照射裝置L聚焦於晶圓6內部的對應於分割預定線的區域,從而形成第一改質區域A1(步驟3)。進一步,在形成第一改質區域的前後,使雷射自雷射照射裝置L聚焦於保護膜1內部的對應於分割預定線的區域,從而形成第二改質區域A2(步驟4)。Next, as shown in FIG. 8 , the first modified region A1 is formed by focusing the laser from the laser irradiation device L on the region corresponding to the planned dividing line inside the wafer 6 (step 3). Furthermore, before and after the formation of the first modified region, the laser is focused from the laser irradiation device L on the region corresponding to the planned dividing line inside the protective film 1 to form the second modified region A2 (step 4).

第一改質區域及第二改質區域為因照射雷射使得強度變得低於其他區域的區域,在該區域中,沿著晶圓或保護膜的厚度方向產生裂紋。作為雷射,例如可使用紅外線區域的雷射。The first modified region and the second modified region are regions whose intensity is lower than that of other regions due to laser irradiation, and cracks are generated along the thickness direction of the wafer or the protective film in these regions. As the laser, for example, a laser in the infrared region can be used.

只要在擴展時裂紋延伸並適當地進行附保護膜的晶圓的分割,則第一改質區域的形成位置不受限定。此外,在晶圓的深度方向上,也可以形成複數個第一改質區域。The formation position of the first modified region is not limited as long as the crack extends when it propagates and the protective film-attached wafer is properly divided. In addition, a plurality of first modified regions may also be formed in the depth direction of the wafer.

藉由在保護膜中形成第二改質區域,可在保護膜的特定區域中形成強度低於其他部分的部分。因此,在擴展時,會以第二改質區域為起點,確實且充分地進行保護膜的分割。By forming the second modified region in the protective film, a portion having lower strength than other portions can be formed in a specific area of the protective film. Therefore, at the time of expansion, the protective film is surely and sufficiently divided from the second modified region as a starting point.

這種在保護膜的特定區域形成有強度低於其他部分的部分的狀態,對應於拉伸力容易集中在試驗片的特定位置的直角撕裂試驗。因此,在本實施形態中,藉由使直角撕裂試驗中的固化後的保護膜形成膜(保護膜)的直角撕裂強度在規定範圍內,能夠使擴展時的附保護膜的工件的分割性變得良好。Such a state where a portion having lower strength than other portions is formed in a specific region of the protective film corresponds to a right-angle tear test in which tensile force tends to concentrate on a specific position of the test piece. Therefore, in the present embodiment, by making the right-angle tear strength of the cured protective film-forming film (protective film) in the right-angle tear test within a predetermined range, the division of the workpiece with the protective film at the time of expansion can be made Sex becomes good.

相反,通常的拉伸試驗並不對應於在保護膜的特定區域形成有強度低於其他部分的部分的狀態。因此,根據通常的拉伸試驗計算出的拉伸強度與直角撕裂強度沒有直接關聯。On the contrary, a general tensile test does not correspond to a state where a portion having lower strength than other portions is formed in a specific region of the protective film. Therefore, the tensile strength calculated from the usual tensile test is not directly related to the right-angle tear strength.

在本實施形態中,為了確實地進行保護膜的分割,較佳為使第二改質區域形成於保護膜與晶圓的界面附近。In this embodiment, in order to reliably divide the protective film, it is preferable to form the second modified region near the interface between the protective film and the wafer.

如圖9所示,藉由擴展E而將形成有第一改質區域及第二改質區域的附保護膜的晶圓100單顆化(步驟5)。附保護膜的晶圓的單顆化可藉由拉伸黏著片4的基材41而使拉伸力作用於附保護膜的晶圓而實施。藉由該拉伸力而產生在附保護膜的晶圓100內部的拉伸應力,使得形成於第一改質區域及第二改質區域的裂紋延伸至附保護膜的晶圓100的兩個主面。最終,附保護膜的晶圓沿著分割預定線被分割成複數個小片(被單顆化),可得到作為工件加工物的附保護膜的晶片100a。As shown in FIG. 9 , the protective film-attached wafer 100 formed with the first modified region and the second modified region is singulated by expanding E (step 5 ). Singulation of the wafer with a protective film can be performed by stretching the base material 41 of the adhesive sheet 4 so that a tensile force acts on the wafer with a protective film. The tensile stress inside the wafer with a protective film 100 is generated by this tensile force, so that the cracks formed in the first modified region and the second modified region extend to both sides of the wafer with a protective film 100 . main face. Finally, the protective film-attached wafer is divided into a plurality of small pieces (singulated) along the planned dividing line, and the protective film-attached wafer 100a as a workpiece can be obtained.

擴展也可以為在低於常溫(23℃)的溫度下實施的冷擴展,在本實施形態中,即使是常溫下的擴展,也能夠使附保護膜的工件的分割性良好。Stretching may be cold stretching performed at a temperature lower than normal temperature (23° C.). In this embodiment, even if stretching is performed at normal temperature, the splittability of the workpiece with a protective film can be improved.

此外,在本實施形態中,藉由使直角撕裂試驗中的固化後的保護膜形成膜(保護膜)的直角撕裂強度在規定範圍內,能夠抑制因對保護膜的衝擊等而在擴展前意外地分割保護膜。其結果,分割後的保護膜的外周邊線為直線,能夠抑制關於保護膜形狀的不良。In addition, in this embodiment, by setting the right-angle tear strength of the cured protective film-forming film (protective film) in the right-angle tear test within a predetermined range, it is possible to suppress the expansion due to impact on the protective film or the like. before accidentally splitting the protective film. As a result, the outer peripheral line of the divided protective film becomes a straight line, and defects in the shape of the protective film can be suppressed.

在擴展後,為了使因擴展而被拉伸而鬆弛的區域收縮,也可以對黏著片的該區域實施加熱處理(熱收縮)。然後,如圖10所示,藉由真空吸嘴等將附保護膜的晶片從黏著片上拾取而對其進行回收。After the expansion, in order to shrink the stretched and loosened area due to the expansion, the area of the adhesive sheet may be subjected to heat treatment (heat shrinkage). Then, as shown in FIG. 10 , the wafer with the protective film is picked up from the adhesive sheet by a vacuum nozzle or the like to recover it.

可以將被拾取的附保護膜的晶片運輸至下一道步驟,也可將其暫時保管在託盤、帶等中,並在規定期間後再運輸至下一道步驟。The picked-up wafer with protective film can be transported to the next step, or temporarily stored in a tray, tape, etc., and transported to the next step after a predetermined period of time.

將被運輸至下一道步驟的附保護膜的晶片100a安裝在基板上,製造半導體裝置。The wafer with protective film 100a transported to the next step is mounted on a substrate to manufacture a semiconductor device.

(7. 變形例) 此外,可在保護膜形成用複合片61的保護膜形成膜10側的面上積層剝離膜,以在進行使用之前保護保護膜形成膜。 (7. Variations) In addition, a release film may be laminated on the surface of the protective film-forming composite sheet 61 on the protective-film-forming film 10 side to protect the protective-film-forming film before use.

以上,對本發明的實施形態進行了說明,但本發明不受上述實施形態的任何限定,可以在本發明的範圍內以各種方式進行變更。 實施例 As mentioned above, although embodiment of this invention was described, this invention is not limited to the said embodiment at all, It can change in various forms within the range of this invention. Example

以下,利用實施例對本發明進行更詳細的說明,但本發明並不限定於這些實施例。Hereinafter, although an Example demonstrates this invention in more detail, this invention is not limited to these Examples.

(保護膜形成用片的製作) 使用下述包含保護膜形成膜用組合物的塗佈劑,以如下方式製作保護膜形成用片。 (Production of sheet for protective film formation) Using the following coating agent containing the composition for protective film formation, the sheet|seat for protective film formation was produced as follows.

(包含保護膜形成膜用組合物的塗佈劑) 按照表1所示的配比(固含量換算)混合以下各成分,並使用甲基乙基酮以使固含量濃度為50質量%的方式進行稀釋,製備包含保護膜形成膜用組合物的塗佈劑。 (A)聚合物成分 (A-1):由55質量份丙烯酸正丁酯、10質量份丙烯酸乙酯、20質量份甲基丙烯酸縮水甘油酯及15質量份丙烯酸2-羥基乙酯共聚而成的(甲基)丙烯酸酯共聚物(重均分子量:80萬、玻璃轉化溫度:-31℃) (A-2):由10質量份丙烯酸乙酯、70質量份丙烯酸甲酯、5質量份甲基丙烯酸縮水甘油酯及15質量份丙烯酸2-羥基乙酯共聚而成的(甲基)丙烯酸酯共聚物(重均分子量:40萬、玻璃轉化溫度:4℃) (B)固化性成分(熱固性成分) (B-1)液狀雙酚A型環氧樹脂及丙烯酸橡膠微粒的混合物(NIPPON SHOKUBAI CO., LTD.製造,BPA328,環氧當量為235g/eq) (B-2)雙酚A型環氧樹脂(Mitsubishi Chemical Corporation製造,jER1055,環氧當量為800~900g/eq) (B-3)雙環戊二烯型環氧樹脂(DIC CORPORATION製造,EPICLON HP-7200HH,軟化點為88~98℃,環氧當量為274~286g/eq) (C)固化劑:雙氰胺(ADEKA CORPORATION製造,ADEKA HARDENER EH-3636AS,熱活性潛伏性環氧樹脂固化劑,活性氫量為21g/eq) (D)固化促進劑:2-苯基-4,5-二羥甲基咪唑(SHIKOKU CHEMICALS CORPORATION製造,CUREZOL 2PHZ-PW) (E)填充材料 (E-1)環氧基修飾球狀二氧化矽填料(Admatechs公司製造,SC2050MA,平均粒徑為0.5μm) (E-2)無定形二氧化矽填料(TATSUMORI LTD.製造,SV-10,平均粒徑為8μm) (F)偶合劑:含環氧基低聚物型矽烷偶合劑(Mitsubishi Chemical Corporation製造,MKC Silicate MSEP2) (G)著色劑:碳黑(Mitsubishi Chemical Corporation製造,MA-600B,平均粒徑為20nm) (Coating agent containing protective film-forming film composition) The following components were mixed according to the composition ratio (solid content conversion) shown in Table 1, and diluted with methyl ethyl ketone so that the solid content concentration was 50% by mass to prepare a coating containing the composition for forming a protective film. Cloth agent. (A) Polymer composition (A-1): (meth)acrylic acid copolymerized by 55 parts by mass of n-butyl acrylate, 10 parts by mass of ethyl acrylate, 20 parts by mass of glycidyl methacrylate and 15 parts by mass of 2-hydroxyethyl acrylate Ester copolymer (weight average molecular weight: 800,000, glass transition temperature: -31°C) (A-2): (meth)acrylate copolymerized by 10 parts by mass of ethyl acrylate, 70 parts by mass of methyl acrylate, 5 parts by mass of glycidyl methacrylate and 15 parts by mass of 2-hydroxyethyl acrylate Copolymer (weight average molecular weight: 400,000, glass transition temperature: 4°C) (B) Curable component (thermosetting component) (B-1) Mixture of liquid bisphenol A epoxy resin and acrylic rubber particles (manufactured by NIPPON SHOKUBAI CO., LTD., BPA328, epoxy equivalent 235g/eq) (B-2) bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Corporation, jER1055, epoxy equivalent is 800~900g/eq) (B-3) Dicyclopentadiene-type epoxy resin (manufactured by DIC CORPORATION, EPICLON HP-7200HH, softening point: 88-98° C., epoxy equivalent: 274-286 g/eq) (C) Curing agent: Dicyandiamide (manufactured by ADEKA CORPORATION, ADEKA HARDENER EH-3636AS, thermoactive latent epoxy resin curing agent, active hydrogen content is 21g/eq) (D) Curing accelerator: 2-phenyl-4,5-dimethylimidazole (manufactured by SHIKOKU CHEMICALS CORPORATION, CUREZOL 2PHZ-PW) (E) Filling material (E-1) Epoxy-modified spherical silica filler (manufactured by Admatechs, SC2050MA, with an average particle diameter of 0.5 μm) (E-2) Amorphous silica filler (manufactured by TATSUMORI LTD., SV-10, with an average particle diameter of 8 μm) (F) Coupling agent: epoxy group-containing oligomer type silane coupling agent (manufactured by Mitsubishi Chemical Corporation, MKC Silicate MSEP2) (G) Coloring agent: carbon black (manufactured by Mitsubishi Chemical Corporation, MA-600B, average particle diameter of 20 nm)

準備在厚度為50μm的聚對苯二甲酸乙二醇酯(PET)膜的單面形成矽酮類剝離劑層而成的第一剝離膜(LINTEC Corporation製造,SP-PET502150)。此外,準備在厚度為38μm的聚對苯二甲酸乙二醇酯(PET)膜的單面形成矽酮類剝離劑層而成的第二剝離膜(LINTEC Corporation製造,SP-PET381031)。A first release film (manufactured by LINTEC Corporation, SP-PET502150) in which a silicone-based release agent layer was formed on one side of a polyethylene terephthalate (PET) film having a thickness of 50 μm was prepared. In addition, a second release film (manufactured by LINTEC Corporation, SP-PET381031) in which a silicone-based release agent layer was formed on one side of a polyethylene terephthalate (PET) film having a thickness of 38 μm was prepared.

將所製備的包含保護膜形成膜用組合物的塗佈劑塗佈於第一剝離膜的剝離處理面,在100℃下乾燥2分鐘,從而形成厚度為25μm的保護膜形成膜。接著,將第二剝離膜貼附於保護膜形成膜上,得到在保護膜形成膜的兩面積層有剝離膜的三層結構的保護膜形成用片。第二剝離膜的貼附條件為:溫度60℃、壓力0.4MPa、速度1m/分鐘。The prepared coating agent containing the protective film-forming film composition was applied to the release-treated surface of the first release film, and dried at 100° C. for 2 minutes to form a protective film-forming film with a thickness of 25 μm. Next, the second release film was attached to the protective film forming film to obtain a three-layer sheet for protective film formation in which the release film was laminated on both surfaces of the protective film forming film. The sticking conditions of the second peeling film were: temperature 60° C., pressure 0.4 MPa, speed 1 m/min.

使用所得到的保護膜形成用片,進行下述測定及評價。The following measurement and evaluation were performed using the obtained sheet|seat for protective film formation.

(固化後的保護膜形成膜的直角撕裂強度及斷裂時的伸長率) 剝離所得到的兩片保護膜形成用片各自的第二剝離膜,並將保護膜形成膜的露出面(未形成第一剝離膜的面)彼此貼附,剝離一個第一剝離膜,從而得到在另一個第一剝離膜上積層有兩片保護膜形成膜的積層體。進一步,將從另一個保護膜形成用片中剝離了第二剝離膜的保護膜形成膜的露出面與所述在第一剝離膜上積層有兩片保護膜形成膜的積層體的保護膜形成膜的露出面進行貼附,並剝離另一個保護膜形成用片的第一剝離膜。重複次操作兩次,合計積層四片保護膜形成膜,從而製作依次積層第一剝離膜、厚度為100μm的保護膜形成膜及第一剝離膜而構成的積層體。 (Right-angle tear strength and elongation at break of protective film forming film after curing) The respective second release films of the obtained two protective film-forming sheets were peeled off, and the exposed surfaces of the protective film-forming films (surfaces on which the first release film was not formed) were attached to each other, and one of the first release films was peeled off to obtain A laminate in which two protective films are laminated on the other first release film forms a film. Further, the exposed surface of the protective film-forming film from which the second peeling film was peeled off from another protective film-forming sheet is formed with the protective film of the laminate in which two protective film-forming films are laminated on the first peeling film. The exposed surface of the film is attached, and the first release film of the other protective film forming sheet is peeled off. This operation was repeated twice, and a total of four protective film forming films were laminated to produce a laminate in which the first release film, the protective film forming film having a thickness of 100 μm, and the first release film were sequentially laminated.

另外,當保護膜形成膜為25μm時,所積層的保護膜形成膜的厚度較佳為100μm,當保護膜形成膜並非25μm時,可適當選擇積層次數,且較佳為將所積層的保護膜形成膜的厚度設為95~120μm。In addition, when the protective film forming film is 25 μm, the thickness of the laminated protective film forming film is preferably 100 μm. The thickness of the formed film was set at 95 to 120 μm.

使該積層體在大氣環境下以130℃、2小時的條件加熱固化,從而得到在固化後的所積層的保護膜形成膜的兩個表面上積層有第一剝離膜的積層體。This laminate was heated and cured at 130° C. for 2 hours in an air atmosphere to obtain a laminate in which the first release film was laminated on both surfaces of the cured protective film forming film laminated thereon.

使用啞鈴型裁刀(Super Dumbbell Cutter)(DUMBBELL CO., LTD製造,SDBK-1000),按照JIS K 7128-3:1998中記載的直角形撕裂試驗片的尺寸,對在所得到的經積層的固化後的保護膜形成膜的兩個表面上積層有第一剝離膜的積層體進行沖切。直角形撕裂試驗片的形狀為JIS K 7128-3:1998中的圖2所示的形狀。Using a dumbbell-shaped cutter (Super Dumbbell Cutter) (manufactured by DUMBBELL CO., LTD, SDBK-1000), according to the dimensions of the rectangular tear test piece recorded in JIS K 7128-3:1998, the obtained laminated The laminate in which the first release film was laminated on both surfaces of the cured protective film forming film was die-cut. The shape of the rectangular tear test piece is the shape shown in FIG. 2 in JIS K 7128-3:1998.

從所得到的直角形撕裂試驗片中去除兩表面的第一剝離膜,使用萬能拉伸試驗機(Shimadzu Corporation製造,AG-IS),在23℃的試驗溫度下實施直角撕裂試驗。在直角撕裂試驗中,將試驗前的直角形撕裂試驗片的試驗長度(夾頭間距)設為60mm,拉伸速度設為10mm/分鐘,採樣時間設為10ms。The first peeling films on both surfaces were removed from the obtained right-angle tear test piece, and a right-angle tear test was implemented at a test temperature of 23° C. using a universal tensile tester (manufactured by Shimadzu Corporation, AG-IS). In the right-angle tear test, the test length (clamp distance) of the right-angle tear test piece before the test was set to 60 mm, the tensile speed was set to 10 mm/min, and the sampling time was set to 10 ms.

23℃下的直角撕裂強度(TS1:N/mm)藉由將直至試驗片斷裂為止的最大拉伸力(N)除以試驗前的直角形撕裂試驗片的厚度(0.1mm(=100μm))而計算出。此外,當以開始拉伸時為基準點而將斷裂時的試驗片的伸長設為ΔL時,23℃下的斷裂時的伸長率(%)藉由下述公式計算出。將結果示於表1。 斷裂時的伸長率=(ΔL/試驗前的直角形撕裂試驗片的試驗長度(60mm))×100 The right-angle tear strength (TS1: N/mm) at 23°C is obtained by dividing the maximum tensile force (N) until the test piece breaks by the thickness of the right-angle tear test piece before the test (0.1mm (=100μm) )) and calculated. In addition, the elongation (%) at break at 23° C. was calculated by the following formula when the elongation of the test piece at break was ΔL based on the start of stretching. The results are shown in Table 1. Elongation at break=(ΔL/test length (60mm) of the rectangular tear test piece before the test)×100

(支撐片的製作) 作為支撐片,以如下方式製作具有基材與黏著劑層的黏著片(隱形切割用切割膠帶)。在本實施形態中,製作支撐片A與支撐片B這兩種支撐片。 (manufacturing of support sheet) As a support sheet, the adhesive sheet (dicing tape for stealth dicing) which has a base material and an adhesive layer was produced as follows. In this embodiment, two types of support sheets, the support sheet A and the support sheet B, are produced.

(支撐片A的製作) 將如下的(h)及(i)的成分混合,使用甲基乙基酮以使固含量濃度為25質量%的方式進行稀釋,從而製備包含黏著劑層用組合物的塗佈劑。 (h)黏著主劑:將80質量份丙烯酸2-乙基己酯、10質量份甲基丙烯酸甲酯及10質量份丙烯酸2-羥基乙酯進行共聚而得到的(甲基)丙烯酸酯共聚物(重均分子量:60萬,玻璃轉化溫度:-55℃)100質量份 (i)交聯劑:三羥甲基丙烷的苯二亞甲基二異氰酸酯加成物(MITSUI TAKEDA CHEMICALS,INC製造,TAKENATE D110N)15質量份 (Production of Support Sheet A) The following components (h) and (i) were mixed, diluted with methyl ethyl ketone so that the solid content concentration became 25 mass %, and the coating agent containing the composition for adhesive layer was prepared. (h) Adhesive main agent: (meth)acrylate copolymer obtained by copolymerizing 80 parts by mass of 2-ethylhexyl acrylate, 10 parts by mass of methyl methacrylate and 10 parts by mass of 2-hydroxyethyl acrylate (Weight average molecular weight: 600,000, glass transition temperature: -55°C) 100 parts by mass (i) Crosslinking agent: 15 parts by mass of xylylene diisocyanate adduct of trimethylolpropane (manufactured by MITSUI TAKEDA CHEMICALS, INC, TAKENATE D110N)

作為基材,準備無載荷伸縮率為MD方向99%/CD方向99%、拉伸模數為MD方向290MPa/CD方向270MPa、熔點為138℃的聚丙烯膜(厚度:80μm)。As a base material, a polypropylene film (thickness: 80 μm) having a no-load stretch rate of 99% in the MD direction/99% in the CD direction, a tensile modulus of 290 MPa in the MD direction/270 MPa in the CD direction, and a melting point of 138° C. was prepared.

將所製備的包含黏著劑層用組合物的塗佈劑塗佈於厚度為38μm的剝離膜(LINTEC Corporation製造SP-PET381031)上後,在100℃下乾燥2分鐘,從而形成厚度為5μm的黏著劑層。然後,藉由貼附黏著劑層與基材,得到支撐片A。The prepared coating agent containing the adhesive layer composition was coated on a release film (SP-PET381031 manufactured by LINTEC Corporation) with a thickness of 38 μm, and dried at 100° C. for 2 minutes to form an adhesive layer with a thickness of 5 μm. agent layer. Then, the support sheet A is obtained by attaching the adhesive layer and the base material.

(支撐片B的製作) 將如下(j)~(l)的成分混合,使用甲基乙基酮以使固含量濃度為25質量%的方式進行稀釋,從而製備包含黏著劑層用組合物的塗佈劑。 (j)黏著主劑:將22質量份丙烯酸2-乙基己酯、73質量份乙酸乙烯酯、1質量份丙烯酸及4質量份甲基丙烯酸甲酯進行共聚而得到的(甲基)丙烯酸酯共聚物(重均分子量:60萬,玻璃轉化溫度:6℃)100質量份 (k)胺基甲酸酯丙烯酸酯(urthane acrylate)(Dainichiseika Color & Chemicals Mfg.Co.,Ltd.製造,SEIKABEAM14-29B)110質量份 (l)交聯劑:三羥甲基丙烷甲苯二異氰酸酯加成物(TOSOH CORPORATION製造,Coronate L)5質量份 (Production of support sheet B) The following components (j) to (l) were mixed and diluted with methyl ethyl ketone so that the solid content concentration became 25% by mass to prepare a coating agent containing the composition for an adhesive layer. (j) Adhesive main agent: (meth)acrylate obtained by copolymerizing 22 parts by mass of 2-ethylhexyl acrylate, 73 parts by mass of vinyl acetate, 1 part by mass of acrylic acid and 4 parts by mass of methyl methacrylate Copolymer (weight average molecular weight: 600,000, glass transition temperature: 6°C) 100 parts by mass (k) urthane acrylate (manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd., SEIKABEAM14-29B) 110 parts by mass (l) Crosslinking agent: 5 parts by mass of trimethylolpropane toluene diisocyanate adduct (manufactured by TOSOH CORPORATION, Coronate L)

作為基材,準備氯乙烯樹脂類膜(ACHILLES CORPORATION製造,PVC80,厚度為80μm)。As a base material, a vinyl chloride resin film (manufactured by ACHILLES CORPORATION, PVC80, thickness 80 μm) was prepared.

將所製備的包含黏著劑層用組合物的塗佈劑塗佈於厚度為38μm的剝離膜(LINTEC Corporation製造,SP-PET381031)上後,在100℃下乾燥2分鐘,從而形成厚度為5μm的黏著劑層。然後,藉由貼合黏著劑層與基材,得到支撐片B。The prepared coating agent containing the adhesive layer composition was coated on a release film (manufactured by LINTEC Corporation, SP-PET381031) with a thickness of 38 μm, and dried at 100° C. for 2 minutes to form a 5 μm-thick release film. Adhesive layer. Then, the support sheet B is obtained by pasting the adhesive layer and the base material.

(支撐片的直角撕裂強度) 以與固化後的保護膜形成膜的直角撕裂試驗相同的方式,將所得到的支撐片沖切為直角形撕裂試驗片的形狀,從而製作試驗片。其中,未進行複數個支撐片彼此的積層。以與固化後的保護膜形成膜的直角撕裂試驗相同的方式,從所製作的試驗片中去除剝離膜,測定支撐片的直角撕裂強度(TS2)。將結果示於表1。 (right-angle tear strength of support sheet) In the same manner as in the right-angle tear test of the cured protective film-forming film, the obtained support sheet was punched into the shape of a right-angle tear test piece to prepare a test piece. However, the lamination|stacking of several support sheets was not performed. The peeling film was removed from the prepared test piece in the same manner as the right-angle tear test of the cured protective film-forming film, and the right-angle tear strength (TS2) of the support sheet was measured. The results are shown in Table 1.

(擴展試驗) 使用貼附裝置(LINTEC Corporation製造,RAD-3600F/12),將工件的吸附工作臺的溫度設為70℃,並將切斷加工成與矽晶圓相同形狀的保護膜形成用片的保護膜形成膜的第二剝離膜剝下後產生的露出面,貼附於厚度為100μm且外徑為8英寸的由矽晶圓構成的工件上。剝離第一剝離膜後,在烘箱內(大氣環境下)於130℃下加熱2小時,使其固化,製作附保護膜的晶圓。 (extended test) Using an attachment device (manufactured by LINTEC Corporation, RAD-3600F/12), set the temperature of the adsorption table of the workpiece to 70°C, and cut the protective film of the sheet for forming a protective film that has the same shape as the silicon wafer The exposed surface formed by peeling off the second release film forming the film was attached to a workpiece made of a silicon wafer having a thickness of 100 μm and an outer diameter of 8 inches. After the first release film was peeled off, it was heated in an oven (in the atmosphere) at 130° C. for 2 hours to be cured to produce a wafer with a protective film.

然後,使用貼附裝置(LINTEC Corporation製造,RAD-2700F/12),將上述製作的隱形切割用切割膠帶(支撐片A或支撐片B)貼附於附保護膜的晶圓的保護膜面。此時,對8英寸晶圓用環形框架也貼附了切割膠帶。使用雷射照射裝置(DISCO CORPORATION製造,DFL7361),隔著切割膠帶,以使雷射(波長:1064nm)聚焦在晶圓內部及保護膜的與晶圓的界面上的方式照射雷射。此時,一邊沿著以形成5mm×5mm的晶片體的方式而設定的分割預定線進行掃描一邊照射,形成改質區域(第一改質區域及第二改質區域)。Then, the dicing tape for stealth dicing (support sheet A or support sheet B) prepared above was attached to the protective film surface of the wafer with protective film using an attaching device (manufactured by LINTEC Corporation, RAD-2700F/12). At this time, the dicing tape was also attached to the ring frame for the 8-inch wafer. A laser irradiation device (manufactured by DISCO CORPORATION, DFL7361) was used to irradiate laser light (wavelength: 1064 nm) through a dicing tape so as to focus on the inside of the wafer and the interface between the protective film and the wafer. At this time, irradiation was performed while scanning along planned dividing lines set so as to form a wafer body of 5 mm×5 mm, to form modified regions (first modified region and second modified region).

然後,使用擴展裝置(DISCO CORPORATION製造,DDS2300),在溫度為23℃的環境下,以100mm/秒的速度,以表1所示的擴展量的條件,實施與附保護膜的晶圓緊密貼合的切割膠帶的擴展。Then, using a spreading device (manufactured by DISCO CORPORATION, DDS2300), in an environment at a temperature of 23°C, at a speed of 100mm/sec, and under the conditions of the spreading amount shown in Table 1, close contact with the wafer with a protective film was carried out. Fitting extensions for dicing tape.

分別對使用沒有傷痕的支撐片的情況;與設想在運輸時有可能產生傷痕,而使用在支撐片的中央部,在基材表面形成有長度為5mm、深度為10μm的傷痕的支撐片的情況,實施擴展試驗。The case of using a support sheet without scratches and the case of using a support sheet with a scratch of 5 mm in length and 10 μm in depth on the surface of the substrate assuming that scratches may occur during transportation are used. , to implement the extended test.

在擴展試驗中,將保護膜及晶圓被100%分割成附保護膜的晶片的情況判定為分割性良好,將保護膜及晶圓沒有被100%分割的情況判定為分割性不合格。將結果示於表1。In the extension test, the case where the protective film and the wafer were 100% divided into wafers with a protective film was judged to be good in divisibility, and the case where the protective film and wafer were not 100% divided was judged to be unacceptable in divisibility. The results are shown in Table 1.

此外,將分割後的保護膜的外周邊線為直線的情況判定為外周形狀良好,將產生了分割後的保護膜的外周邊線並非直線的附保護膜的晶片的情況判定為外周形狀不合格。將結果示於表1。In addition, when the outer peripheral line of the divided protective film is straight, it is judged that the outer peripheral shape is good, and when a wafer with a protective film in which the outer peripheral line of the divided protective film is not straight is generated, it is judged that the outer peripheral shape is unacceptable. . The results are shown in Table 1.

此外,對在擴展時支撐片是否發生開裂進行評價。將結果示於表1。In addition, evaluation was performed on whether or not the supporting sheet was cracked during expansion. The results are shown in Table 1.

[表1]   實施例1A 實施例2A 實施例2B 實施例2C 實施例3A 實施例3B 實施例3C 比較例1A 比較例1B 比較例1C 比較例2A 比較例3A 保護膜形成膜的配比 聚合物成分 A-1 19 19 19.8 19.9 8 A-2 26 環氧樹脂 B-1 11.2 11.2 10.4 11.2 11.2 6.2 B-2 2 2 1.7 2 2 1 B-3 5.6 5.6 5.2 5.6 5.6 2.6 固化劑 C 0.5 0.5 0.47 0.05 0.45 固化促進劑 D 0.4 0.4 0.37 0.05 0.45 填充材料 E-1 6 6 55.4 6 6 26 E-2 54.8 54.8 54.8 54.8 54.8 偶合劑 F 0.4 0.4 0.36 0.4 0.4 0.4 著色劑 G 0.1 0.1 0.1 0.1 0.1 0.1 固化後的 保護膜形成膜 (保護膜) 撕裂強度(N/mm):TS1 15.28 15.28 19.45 18.65 19.73 8.41 斷裂時的伸長率(%) 0.46 0.46 6.59 58.34 61.21 0.39 支撐片 種類 支撐片A 支撐片B 支撐片A 支撐片B 支撐片A 支撐片A 撕裂強度(N/mm):TS2 169 118 169 118 169 169 撕裂強度比:TS1/TS2 0.090 0.129 0.115 0.158 0.117 0.050 特性評價 擴展量 10mm 10mm 15mm 20mm 10mm 15mm 20mm 10mm 15mm 20mm 10mm 10mm 分割性 良好 良好 良好 良好 良好 良好 良好 不合格 不合格 不合格 不合格 良好 分割後的外周形狀 良好 良好 良好 良好 良好 良好 良好 良好 良好 良好 良好 不合格 支撐片(有傷痕)的開裂 支撐片(無傷痕)的開裂 [Table 1] Example 1A Example 2A Example 2B Example 2C Example 3A Example 3B Example 3C Comparative Example 1A Comparative Example 1B Comparative Example 1C Comparative Example 2A Comparative Example 3A Proportion of protective film forming film polymer composition A-1 19 19 - 19.8 19.9 8 A-2 - - 26 - - - epoxy resin B-1 11.2 11.2 10.4 11.2 11.2 6.2 B-2 2 2 1.7 2 2 1 B-3 5.6 5.6 5.2 5.6 5.6 2.6 Hardener C 0.5 0.5 0.47 0.05 - 0.45 curing accelerator D. 0.4 0.4 0.37 0.05 - 0.45 Filler E-1 6 6 55.4 6 6 26 E-2 54.8 54.8 - 54.8 54.8 54.8 Coupler f 0.4 0.4 0.36 0.4 0.4 0.4 Colorant G 0.1 0.1 0.1 0.1 0.1 0.1 Cured protective film forms a film (protective film) Tear strength (N/mm): TS1 15.28 15.28 19.45 18.65 19.73 8.41 Elongation at break (%) 0.46 0.46 6.59 58.34 61.21 0.39 support sheet type Support piece A Support piece B Support piece A Support piece B Support piece A Support piece A Tear strength (N/mm): TS2 169 118 169 118 169 169 Tear strength ratio: TS1/TS2 0.090 0.129 0.115 0.158 0.117 0.050 Characteristic evaluation Expansion 10mm 10mm 15mm 20mm 10mm 15mm 20mm 10mm 15mm 20mm 10mm 10mm Separation good good good good good good good unqualified unqualified unqualified unqualified good Peripheral shape after division good good good good good good good good good good good unqualified Cracking of support sheet (with scars) none none none have none none none none none have none none Cracking of support sheet (without scars) none none none none none none none none none none none none

根據表1可知,固化後的保護膜形成膜的直角撕裂強度及斷裂時的伸長率在上述範圍內時,隱形切割中的擴展時的附保護膜的工件的分割性及保護膜的外周形狀為良好。另一方面,還確認到,固化後的保護膜形成膜的直角撕裂強度及斷裂時的伸長率在上述範圍外時,分割性或保護膜的外周形狀差。As can be seen from Table 1, when the right-angle tear strength and elongation at break of the cured protective film forming film are within the above ranges, the splittability of the workpiece with the protective film and the outer peripheral shape of the protective film at the time of expansion in stealth dicing can be seen. for good. On the other hand, it was also confirmed that when the right-angle tear strength and the elongation at break of the cured protective film-forming film are outside the above-mentioned ranges, the splittability and the outer peripheral shape of the protective film are poor.

1:保護膜 5:夾具用黏著劑層 51:保護膜形成用片 6:工件 6a:晶片 6b:凸狀電極 10:保護膜形成膜 10a,10b:主面 21:第一剝離膜 22:第二剝離膜 61:保護膜形成用複合片 4:黏著片 41:基材 42:黏著劑層 7:環形框架 100:附保護膜的工件 100a:附保護膜的晶片 101a:未分割的附保護膜的晶片 102a:附保護膜的晶片 200:分割預定線 A1:第一改質區域 A2:第二改質區域 E:擴展 L:雷射照射裝置 III:方向 1: Protective film 5: Adhesive layer for fixture 51: Sheet for protective film formation 6: Workpiece 6a: Wafer 6b: Convex electrode 10: Protective film forming film 10a, 10b: main surface 21: The first release film 22: Second release film 61: Composite sheet for protective film formation 4: Adhesive sheet 41: Substrate 42: Adhesive layer 7: Ring frame 100: Work piece with protective film 100a: wafer with protective film 101a: undivided wafer with protective film 102a: wafer with protective film 200: split schedule line A1: The first modified area A2: The second modified area E: extension L: Laser irradiation device III: Direction

圖1為在工件的背面形成有本實施形態的保護膜形成膜固化而成的保護膜的附保護膜的工件的一個例子的剖面示意圖。 圖2為附保護膜的工件單顆化而成的附保護膜的晶片的集合體的剖面示意圖。 圖3為從圖2所示的III方向俯視單顆化而成的附保護膜的晶片的集合體時的局部平面示意圖。 圖4為本實施形態的保護膜形成用片的一個例子的剖面示意圖。 圖5為本實施形態的保護膜形成用複合片的一個例子的剖面示意圖。 圖6A為用於說明將本實施形態的保護膜形成用片貼附於工件的背面的步驟的剖面示意圖。 圖6B為用於說明將本實施形態的保護膜形成用複合片貼附於工件的背面的步驟的剖面示意圖。 圖7為用於說明使已貼附於工件的背面的保護膜形成膜固化而形成保護膜的步驟的剖面示意圖。 圖8為用於說明在工件內部及保護膜內部形成改質區域的步驟的剖面示意圖。 圖9為用於說明對形成有改質區域的附保護膜的工件進行擴展的步驟的剖面示意圖。 圖10為用於說明從單顆化而成的附保護膜的晶片的集合體中拾取附保護膜的晶片的步驟的剖面示意圖。 1 is a schematic cross-sectional view of an example of a work with a protective film in which a protective film obtained by curing the protective film-forming film of this embodiment is formed on the back surface of the work. FIG. 2 is a schematic cross-sectional view of an assembly of wafers with a protective film obtained by singulating workpieces with a protective film. 3 is a schematic partial plan view of an aggregate of singulated protective film-attached wafers viewed from the III direction shown in FIG. 2 . Fig. 4 is a schematic cross-sectional view of an example of the sheet for forming a protective film according to the present embodiment. Fig. 5 is a schematic cross-sectional view of an example of the composite sheet for forming a protective film according to the present embodiment. 6A is a schematic cross-sectional view for explaining the step of attaching the sheet for forming a protective film according to the present embodiment to the back surface of a workpiece. 6B is a schematic cross-sectional view for explaining the step of attaching the composite sheet for forming a protective film according to the present embodiment to the back surface of a workpiece. 7 is a schematic cross-sectional view illustrating a step of forming a protective film by curing the protective film-forming film attached to the back surface of the workpiece. 8 is a schematic cross-sectional view for explaining the step of forming a modified region inside the workpiece and inside the protective film. FIG. 9 is a schematic cross-sectional view for explaining a step of expanding a workpiece with a protective film on which a modified region is formed. 10 is a schematic cross-sectional view for explaining a step of picking up a wafer with a protective film from an aggregate of wafers with a protective film that have been singulated.

1:保護膜 1: Protective film

5:夾具用黏著劑層 5: Adhesive layer for fixture

6:工件 6: Workpiece

6b:凸狀電極 6b: Convex electrode

61:保護膜形成用複合片 61: Composite sheet for protective film formation

4:黏著片 4: Adhesive sheet

41:基材 41: Substrate

42:黏著劑層 42: Adhesive layer

7:環形框架 7: Ring frame

100:附保護膜的工件 100: Work piece with protective film

A1:第一改質區域 A1: The first modified area

A2:第二改質區域 A2: The second modified area

L:雷射照射裝置 L: Laser irradiation device

Claims (9)

一種保護膜形成膜,其為在固化後成為保護膜的保護膜形成膜,其中,在23℃下,對固化後的保護膜形成膜實施直角撕裂試驗時,直角撕裂強度為10N/mm以上,且在該直角撕裂試驗中,固化後的保護膜形成膜斷裂時的伸長率為10%以下。A protective film-forming film that becomes a protective film after curing, wherein the right-angle tear strength is 10 N/mm when the cured protective film-forming film is subjected to a right-angle tear test at 23° C. The above, and in this right-angle tear test, the elongation at the time of rupture of the cured protective film-forming film is 10% or less. 如請求項1所述之保護膜形成膜,其中,前述保護膜為熱固化物或能量射線固化物。The protective film forming film according to claim 1, wherein the protective film is a thermally cured or energy ray cured product. 如請求項1或2所述之保護膜形成膜,其中,前述直角撕裂強度為25N/mm以下。The protective film forming film according to claim 1 or 2, wherein the right-angle tear strength is 25 N/mm or less. 如請求項1~3中任一項所述之保護膜形成膜,其用於藉由使雷射聚焦於前述保護膜從而形成改質區域。The protective film forming film according to any one of claims 1 to 3, which is used to form a modified region by focusing laser light on the protective film. 一種保護膜形成用片,其具有請求項1~4中任一項所述之保護膜形成膜與以能夠剝離的方式配置於前述保護膜形成膜的至少一個主面的剝離膜。A sheet for forming a protective film comprising the protective film forming film according to any one of claims 1 to 4, and a release film disposed on at least one main surface of the protective film forming film so as to be peelable. 一種保護膜形成用複合片,其具有請求項1~4中任一項所述之保護膜形成膜與支撐前述保護膜形成膜的支撐片。A composite sheet for forming a protective film, comprising the protective film forming film according to any one of claims 1 to 4, and a support sheet supporting the protective film forming film. 如請求項6所述之保護膜形成用複合片,其中,在將23℃下的固化後的保護膜形成膜的直角撕裂強度設為TS1,並將在23℃下對前述支撐片實施直角撕裂試驗時的前述支撐片的直角撕裂強度設為TS2時,TS1/TS2為0.15以下。The composite sheet for forming a protective film according to claim 6, wherein the right-angle tear strength of the protective film-forming film after curing at 23°C is set to TS1, and the support sheet is subjected to a right-angle tearing strength at 23°C. When the right-angle tear strength of the said support sheet at the time of a tear test is made into TS2, TS1/TS2 is 0.15 or less. 一種裝置的製造方法,其具有: 將保護膜形成膜貼附於工件的背面的步驟; 將所貼附的保護膜形成膜固化,從而在工件的背面形成保護膜,得到附保護膜的工件的步驟; 使雷射聚焦於前述工件內部的事先設定的區域,從而形成第一改質區域的步驟; 使雷射聚焦於前述保護膜內部的事先設定的區域,從而形成第二改質區域的步驟;及 使拉伸力作用於形成有前述第一改質區域及前述第二改質區域的附保護膜的工件,從而將該附保護膜的工件單顆化,得到複數個附保護膜的工件加工物的步驟。 A method of manufacturing a device, comprising: a step of attaching a protective film forming film to the back surface of the workpiece; The attached protective film forming film is solidified to form a protective film on the back side of the workpiece to obtain a workpiece with a protective film; Focusing the laser on a pre-set area inside the aforementioned workpiece, thereby forming a step of the first modified area; Focusing the laser on a predetermined area inside the protective film to form a second modified area; and A tensile force is applied to the workpiece with a protective film on which the first modified region and the second modified region are formed, thereby singulating the workpiece with a protective film to obtain a plurality of processed workpieces with a protective film A step of. 如請求項8所述之裝置的製造方法,其中,前述保護膜形成膜為請求項5所述之保護膜形成用片所具備的保護膜形成膜、或者請求項6或7所述之保護膜形成用複合片所具備的保護膜形成膜。The method for manufacturing a device according to claim 8, wherein the protective film forming film is the protective film forming film included in the protective film forming sheet according to claim 5, or the protective film according to claim 6 or 7. A protective film forming film included in the composite sheet is formed.
TW111145413A 2021-12-07 2022-11-28 Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet and device manufacturing method that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film TW202323473A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021198609A JP2023084431A (en) 2021-12-07 2021-12-07 Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet, and method for manufacturing device
JP2021-198609 2021-12-07

Publications (1)

Publication Number Publication Date
TW202323473A true TW202323473A (en) 2023-06-16

Family

ID=86623056

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111145413A TW202323473A (en) 2021-12-07 2022-11-28 Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet and device manufacturing method that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film

Country Status (4)

Country Link
JP (1) JP2023084431A (en)
KR (1) KR20230085855A (en)
CN (1) CN116239923A (en)
TW (1) TW202323473A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102221484B1 (en) 2014-03-24 2021-02-26 린텍 가부시키가이샤 Protective film forming film, protective film forming sheet and work product manufacturing method

Also Published As

Publication number Publication date
CN116239923A (en) 2023-06-09
JP2023084431A (en) 2023-06-19
KR20230085855A (en) 2023-06-14

Similar Documents

Publication Publication Date Title
TWI706023B (en) Sheet for forming protective film and method of manufacturing tip having protective film
TWI675900B (en) Composite sheet for forming protective film
US20160218077A1 (en) Composite Sheet for Resin Film Formation
TWI671338B (en) Film for forming protective film, composite film for forming protective film
JP2019096913A (en) Sheet for resin film formation and composite sheet for resin film formation
TWI702643B (en) Plates for semiconductor processing
TWI694129B (en) Resin film forming sheet, resin film forming composite sheet, and silicon wafer regeneration method
TW201542742A (en) Die-bonding layer formation film, workpiece having die-bonding layer formation film attached thereto, and semiconductor device
WO2015059944A1 (en) Sheet for forming resin film
KR102330885B1 (en) Protective membrane forming film
JP6574787B2 (en) Sheet laminate for resin film formation
TW202323473A (en) Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet and device manufacturing method that has good splittability of workpiece with a protective film and can suppress poor appearance of the split protective film
JP2022032554A (en) Protective film forming sheet and processing method for protective film forming sheet
TW202313880A (en) Protective film-forming film, sheet for forming protective film, composite sheet for forming protective film, rework method, and method for manufacturing devices wherein the protective film-forming film has good reworkability even when reworking the protective film-forming film damaged after being adhered
JP7448441B2 (en) Protective film forming sheet and manufacturing method thereof
JP7457513B2 (en) PRODUCTION METHOD OF PROTECTIVE FILM-FORMING FILM, COMPOSITE SHEET FOR PROTECTIVE FILM-FORMING, AND APPARATUS
TW202237784A (en) Film for forming protective film, sheet for forming protective film, composite sheet for forming protective film, and method for manufacturing device capable of suppressing peeling between a protective film and a chip caused by flux cleaning
TW202218869A (en) Protective film forming sheet and manufacturing method thereof capable of sufficiently suppressing defects in scrap removal even when the cut width in a hole punching process is relatively narrow
TW202124157A (en) Film for forming protective film, composite sheet for forming protective film, and production method of small piece with protective film
JP2022143454A (en) Support sheet, composite sheet for protective film formation, and method for manufacturing apparatus