TW202323239A - Curable composition, production method for cured product, membrane, optical element, image sensor, solid-state imaging device, image display device, and radical polymerization initiator - Google Patents

Abstract

An embodiment of the present invention provides: a curable composition comprising a radical polymerization initiator represented by formula 1 and a radically polymerizable compound; a method for producing a cured product of the curable composition; a method for producing a cured product using the curable composition; a film; an optical device; an image sensor; a solid-state imaging device or an image display device; or a novel radical polymerization initiator. In formula 1, Ar1 and Ar2 each independently represent an aromatic group, L11 represents a single bond, L12 represents a divalent linking group, R11, R12, and R15 each independently represent a substituent, R13 and R14 each independently represent a hydrogen atom or a substituent, X1 represents a single bond, O, S, or NR16, R16 represents a hydrogen atom or a substituent, and Y1 represents a single bond or a carbonyl group.

Description

Curable composition, method for producing cured product, film, optical element, image sensor, solid-state imaging element, image display device, and radical polymerization initiator

The disclosure relates to a curable composition, a method for producing a cured product, a film, an optical element, an image sensor, a solid-state imaging element, an image display device, and a radical polymerization initiator.

Optical filters such as color filters are produced using a curable composition containing a colorant, a photopolymerization initiator, and a polymerizable compound. As a conventional curable composition, the composition described in Patent Document 1 or 2 is known. Patent Documents 1 and 2 describe a composition containing an oxime-based photopolymerization initiator having a terpene structure.

[Patent Document 1] Japanese Unexamined Patent Publication No. 2014-137466 [Patent Document 2] Japanese Patent Laid-Open No. 2017-61498

The problem to be solved by the embodiments of the present disclosure is to provide a curable composition with little outgassing from the obtained cured product. Moreover, the problem to be solved by another embodiment of the present disclosure is to provide a method for producing a cured product using the above-mentioned curable composition, a film, an optical element, an image sensor, a solid-state imaging device, or an image display device. Furthermore, the problem to be solved by another embodiment of this disclosure is to provide a novel radical polymerization initiator.

Means for solving the above-mentioned problems include the following aspects. <1> A curable composition comprising a radical polymerization initiator represented by the following formula 1 and a radical polymerizable compound.

[chemical formula 1]

In Formula 1, Ar ₁ and Ar ₂ independently represent an aromatic ring, L ₁₁ represents a single bond, L ₁₂ represents a divalent linking group, p1 represents 0 or more and the number of all positions that can be substituted on the aromatic ring in Ar ₁ is -3 The following integers, p2 represents an integer of 0 or more and the number of all substitutable positions on the aromatic ring in _Ar2 is -4 or less, R ₁₁ , R ₁₂ and R ₁₅ independently represent substituents, and R ₁₃ and R ₁₄ independently represent ground represents a hydrogen atom or a substituent, X ₁ represents a single bond O, S or NR ₁₆ , R ₁₆ represents a hydrogen atom or a substituent, Y ₁ represents a single bond or a carbonyl group, two or more of R ₁₂ to R ₁₆ may be bonded and Form a ring.

<2> The curable composition as described in <1>, wherein The radical polymerization initiator represented by the above formula 1 is a compound represented by the following formula 2.

[chemical formula 2]

In formula 2, R ₂₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₂₂ and R ₂₅ independently represent an alkyl carbonyl group, an aryl carbonyl group, a heteroaryl carbonyl group, Alkyl, alkoxy, aryl, heteroaryl, aryloxy, halogen atom, nitro or cyano, p3 represents an integer from 0 to 3, p4 represents an integer from 0 to 2, R ₂₃ and R ₂₄ are independent represents a hydrogen atom, an alkyl group or an aryl group, R ₂₆ and R ₂₇ independently represent a hydrogen atom, an alkyl group or an aryl group, Y ₂ represents a single bond or a carbonyl group, and when Y ₂ is a carbonyl group, there may be a plurality of R ₂₆ And at least one of R ₂₇ that may exist in plural is not a hydrogen atom, n is an integer of 1 to 3, and two or more of R ₂₂ to R ₂₇ may be bonded to form a ring.

<3> The curable composition as described in <1> or <2>, wherein The radical polymerization initiator represented by the above formula 1 is a compound represented by the following formula 3.

[chemical formula 3]

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ to R ₃₄ may be bonded to form a ring, and R ₃₆ and R ₃₇ may be bonded to form a ring.

[chemical formula 4]

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group.

<4> The curable composition as described in <1> or <2>, wherein The radical polymerization initiator represented by the above formula 1 is a compound represented by the following formula 4.

[chemical formula 5]

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, In the case of a primary to tertiary amino group, an alkylthio group or an arylthio group, both R ₄₆ and R ₄₇ may be hydrogen atoms.

[chemical formula 6]

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group.

<5> The curable composition according to any one of <1> to <4>, further comprising a colorant. <6> The curable composition as described in <5>, wherein The content of the coloring agent is 50% by mass or more relative to the total solid content of the curable composition. <7> The curable composition according to any one of <1> to <6>, further comprising a resin. <8> The curable composition as described in <7>, wherein The above-mentioned resin is a graft polymer having grafted chains, and the above-mentioned grafted chains include at least one selected from the group consisting of polyether chains, polyester chains, and polyacrylic acid chains, and the weight average of the above-mentioned grafted chains is The molecular weight is 1,000 or more. <9> The curable composition according to <7> or <8>, wherein The aforementioned resin has a (meth)acryl group, an epoxy group, or an oxetanyl group. <10> The curable composition according to any one of <1> to <9>, further comprising a pigment derivative. <11> A method for producing a cured product, comprising the step of irradiating the curable composition described in any one of <1> to <10> with light having a wavelength of 150 nm to 300 nm. <12> The method for producing a hardened product as described in <11>, wherein The above light is excimer laser. <13> A film obtained by curing the curable composition according to any one of <1> to <10>. <14> An optical element comprising the film according to <13>. <15> An image sensor comprising the film described in <13>. <16> A solid-state imaging device including the film according to <13>. <17> An image display device comprising the film according to <13>. <18> A radical polymerization initiator represented by the following formula 3 or formula 4.

[chemical formula 7]

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ to R ₃₄ may be bonded to form a ring, and R ₃₆ and R ₃₇ may be bonded to form a ring.

[chemical formula 8]

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, In the case of a primary to tertiary amino group, an alkylthio group or an arylthio group, both R ₄₆ and R ₄₇ may be hydrogen atoms.

[chemical formula 9]

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group. [Invention effect]

According to one aspect of the present disclosure, there is provided a curable composition with little outgassing from the obtained cured product. Also, according to another embodiment of the present disclosure, there is provided a method for producing a cured product using the curable composition, a film, an optical element, an image sensor, a solid-state imaging element, or an image display device. Furthermore, according to another embodiment of the present disclosure, a novel radical polymerization initiator is provided.

Hereinafter, the contents of the present disclosure will be described in detail. The description of the constituent requirements described below is based on typical embodiments of the present disclosure, but the present disclosure is not limited to such embodiments. In this specification, "-" is used in the meaning which includes the numerical value described before and after it as a lower limit and an upper limit. Among the notations of groups (atomic groups) in this specification, notation of substituted and unsubstituted includes groups (atomic groups) without substituents and groups (atomic groups) with substituents. For example, "alkyl" includes not only an alkyl group having no substituent (unsubstituted alkyl group), but also an alkyl group having a substituent (substituted alkyl group). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. In addition, examples of the light used for exposure include bright line spectra of mercury lamps, extreme ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, electron beams, and other active rays or radiation. In this specification, "(meth)acrylate" means both or either of acrylate and methacrylate, "(meth)acrylic acid" means both or either of acrylic acid and methacrylic acid, "(meth) "group) acryl" means both or either of acryl and methacryl. In this specification, Me in the structural formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, a weight average molecular weight and a number average molecular weight are polystyrene conversion values measured by the GPC (gel permeation chromatography) method. In this specification, the total solid content refers to the total mass of components excluding solvents from all the components of the composition. In this specification, a pigment refers to a colorant that is hardly soluble in a solvent. In this specification, the term "step" includes not only an independent step, but also includes in this term as long as the expected action of the step is achieved even if it cannot be clearly distinguished from other steps. Hereinafter, this disclosure will be described in detail.

(hardening composition) The curable composition of the present disclosure contains a radical polymerization initiator represented by the following formula 1 and a radical polymerizable compound. Also, the curable composition disclosed in the present disclosure can be preferably used as a curable composition for exposure by light with a wavelength of 150 nm to 300 nm, and can be more preferably used as a curable composition for excimer laser exposure with a wavelength of 150 nm to 300 nm. things.

[chemical formula 10]

In Formula 1, Ar ₁ and Ar ₂ independently represent an aromatic ring, L ₁₁ represents a single bond, L ₁₂ represents a divalent linking group, p1 represents 0 or more and the number of all positions that can be substituted on the aromatic ring in Ar ₁ is -3 The following integers, p2 represents an integer of 0 or more and the number of all substitutable positions on the aromatic ring in _Ar2 is -4 or less, R ₁₁ , R ₁₂ and R ₁₅ independently represent substituents, and R ₁₃ and R ₁₄ independently represent ground represents a hydrogen atom or a substituent, X ₁ represents a single bond O, S or NR ₁₆ , R ₁₆ represents a hydrogen atom or a substituent, Y ₁ represents a single bond or a carbonyl group, two or more of R ₁₂ to R ₁₆ may be bonded and Form a ring.

As a result of intensive studies by the present inventors, it was found that by adopting the above-mentioned constitution, a curable composition with little outgassing from the obtained cured product can be obtained. Since the radical polymerization initiator represented by the above-mentioned formula 1 has a cyclic oxime structure, the bond between the carbon atom to which the nitrogen atom in the above-mentioned cyclic oxime structure is bonded and the adjacent α-carbon atom is sometimes broken and Generate free radicals. It is presumed that since the free radicals generated here are linked to the part having the oxene ring structure and volatile components are less likely to be generated, gas (outgassing) emitted from the hardened product obtained by hardening the above-mentioned hardened composition after hardening can be suppressed.

The curable composition disclosed herein can be preferably used as a curable composition for optical filters. As an optical filter, a color filter, an infrared transmission filter, etc. are mentioned, and a color filter is preferable. That is, the curable composition of the present disclosure can be preferably used as a curable composition for color filters. More specifically, it can be suitably used as a curable composition for pixel formation of a color filter. Examples of the types of pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels.

As an infrared transmission filter, it is preferable to mention that the maximum value of the transmittance in the wavelength range of 400nm to 640nm is 20% or less (preferably 15% or less, more preferably 10% or less), at a wavelength of 1,100 A filter or the like having a spectral characteristic with a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the range of nm to 1,300 nm. The infrared transmission filter is preferably a filter that satisfies any one of the spectral characteristics in (1) to (5) below. (1): The maximum transmittance in the wavelength range of 400nm to 640nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 800nm to 1,500nm The filter whose minimum value is 70% or more (preferably 75% or more, more preferably 80% or more). (2): The maximum value of the transmittance in the wavelength range of 400nm to 750nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 900nm to 1,500nm The filter whose minimum value is 70% or more (preferably 75% or more, more preferably 80% or more). (3): The maximum transmittance in the wavelength range of 400nm to 830nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1,000nm to 1,500nm A filter with a minimum rate of 70% or more (preferably 75% or more, more preferably 80% or more). (4): The maximum transmittance in the wavelength range of 400nm to 950nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1,100nm to 1,500nm A filter with a minimum rate of 70% or more (preferably 75% or more, more preferably 80% or more). (5): The maximum value of transmittance in the wavelength range of 400nm to 1,050nm is 20% or less (preferably 15% or less, more preferably 10% or less) and within the wavelength range of 1,200nm to 1,500nm A filter with a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more).

Also, the curable composition of the present disclosure can be suitably used as a solid-state imaging device. More specifically, it can be preferably used as a curable composition for an optical filter used in a solid-state imaging device, and more preferably used as a curable composition for a color filter used in a solid-state imaging device.

The solid content concentration of the curable composition of the present disclosure is preferably 5% by mass to 40% by mass. The lower limit is more preferably at least 7.5% by mass, and more preferably at least 10% by mass. The upper limit is more preferably at most 35% by mass, and is still more preferably at most 30% by mass.

<Radical polymerization initiator represented by formula 1> The curable composition of the present disclosure contains the radical polymerization initiator represented by the above formula 1. In addition, the radical polymerization initiator represented by the above formula 1 is preferably a photoradical polymerization initiator, more preferably a photoradical polymerization initiator that generates radicals by light having a wavelength of 150 nm to 300 nm. The exposure wavelength at which the radical initiator represented by the above formula 1 generates radicals is preferably 150nm to 460nm, more preferably 150nm to 420nm, still more preferably 150nm to 380nm, and most preferably 150nm to 300nm.

_Ar1 and _Ar2 in Formula 1 are each independently a benzene ring or Naphthalene ring is preferred, and benzene ring is particularly preferred. In addition, the number of all substitutable positions on the above-mentioned aromatic ring is 6 in the case of a benzene ring, and 10 in the case of a naphthalene ring. The bonding position of _L11 in Formula 1 is not particularly limited as long as it is on the two aromatic rings in Formula 1. From the viewpoint of the suppression and sensitivity of outgassing from the obtained cured product, the above-mentioned 2 When the two aromatic rings are all benzene rings, one of the bonding positions is preferably the para position of the bonding position of _Y1 , and from the viewpoint of outgassing inhibition and sensitivity, the two bonding positions are respectively _R13 And the position ortho to the carbon atom bonded by R ₁₄ is preferred. From the viewpoint of synthesis, X in Formula ₁ is preferably a single bond. From the viewpoint of outgassing suppression and sensitivity, _L12 in Formula 1 is preferably an alkylene or alkenylene, more preferably an alkylene, and an alkylene with a carbon number (carbon number) of 1 to 10 More preferably, an alkylene group having 1 to 3 carbon atoms is more preferable. The above-mentioned alkylene group in _L12 may have a substituent described below. As the substituent that the above-mentioned alkylene group may have, an alkyl group or an aryl group is preferable, an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 10 carbon atoms is more preferable, and a methyl group or a phenyl group is still more preferable. , methyl is particularly preferred. It is preferable that Y ₁ in Formula 1 are each independently a carbonyl group from the viewpoint of outgassing suppression property and sensitivity. From the viewpoint of outgassing inhibition and sensitivity, the ring including L ₁₂ , X ₁ and Y ₁ in Formula 1 is preferably a 5- to 8-membered ring, more preferably a 5- to 7-membered ring, and 5 to 7-membered rings are more preferable. A ring of 6 members or 6 members is further preferred, and a ring of 5 members is particularly preferred.

The substituents in R ₁₁ to R ₁₅ in Formula 1 are not particularly limited, and preferably include substituents with 0 to 100 carbon atoms, and more preferably include substituents with 0 to 50 carbon atoms. Examples of the above substituent include halogen atom, hydroxyl group, amino group, alkyl group, cycloalkyl group, heterocyclic group, aryl group, heteroaryl group, acyl group, nitro group, cyano group, sulfo group, alkyl group Aminocarbonyl, alkoxycarbonyl, alkylthio, arylthio, thiolinyl, alkoxyalkyl, carboxy, carboxyalkyl, etc. In addition, these substituents may further have a substituent, and the substituents may be bonded together to form a ring structure. In addition, the ring formed by bonding two or more of R ₁₂ to R ₁₆ in Formula 1 may be an aliphatic hydrocarbon ring, a heteroaliphatic ring, an aromatic hydrocarbon ring, or a heteroaromatic ring , but an aliphatic hydrocarbon ring or a heteroaliphatic ring is preferred.

From the viewpoint of outgassing suppression and sensitivity, R in Formula ₁ is preferably alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, more preferably alkyl or aryl , methyl, ethyl, propyl, isopropyl, butyl, tertiary butyl or phenyl are further preferred, and methyl is particularly preferred.

From the viewpoint of outgassing suppression, sensitivity, and adhesion to the substrate (also simply referred to as "adhesion"), R ₁₂ in Formula 1 is an alkoxy group, an aryloxy group, a nitro group, a cyano group, or a halogen atom Or the group represented by following formula I or formula II is better, alkoxy group, aryloxy group, nitro group, cyano group, halogen atom or the group represented by following formula I or formula II is better, A nitro group, a halogen atom, or a group represented by the following formula I or II is further preferred, and a group represented by the following formula I or II is particularly preferred. From the viewpoint of outgassing suppression, sensitivity, and adhesiveness, p1 in Formula 1 is preferably 0 or 1, and 1 is more preferable. Also, from the viewpoint of outgassing suppression, sensitivity, and adhesiveness, the substitution position of R ₁₂ in Formula 1 includes the para position of the bonding position of L ₁₁ is preferable.

[chemical formula 11]

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group.

R ₁₀₁ -R ₁₀₅ and R ₂₀₁ -R ₂₀₅ in formulas I and II are preferably independently hydrogen atoms or alkyl groups, more preferably hydrogen atoms or methyl groups. Z in Formula I and Formula II is preferably O or S, and O is more preferred.

From the viewpoint of outgassing suppression and sensitivity, R ₁₃ and R ₁₄ in Formula 1 are each independently a hydrogen atom, an alkyl group or an aryl group is preferred, an alkyl group is more preferred, and an alkyl group having 1 to 20 carbon atoms More preferably, an alkyl group having 1 to 8 carbon atoms is particularly preferable. Also, as described above, _R13 and _R14 in Formula 1 each independently have a substituent, for example, one having at least one bond selected from the group consisting of an ether bond, a thioether bond, and an ester bond appearance. Furthermore, from the viewpoint of synthesis, R ₁₃ and R ₁₄ in Formula 1 are preferably the same group.

R ₁₅ in Formula 1 is preferably an alkoxy group, an aryloxy group, a nitro group, a cyano group, or a halogen atom from the viewpoints of outgassing suppression, sensitivity, and adhesion. From the viewpoint of outgassing suppression, sensitivity, and adhesiveness, p2 in Formula 1 is preferably 0 or 1, and 0 is more preferable.

From the viewpoints of outgassing inhibition, sensitivity, and solubility, the molecular weight of the radical polymerization initiator represented by the above formula 1 is preferably 275 or more and less than 1,000, more preferably 275 to 800, and 290 to 600. Excellent.

It is preferable that the radical polymerization initiator represented by the above formula 1 is a radical polymerization initiator represented by the following formula 2 from the viewpoint of outgassing suppression property and sensitivity.

[chemical formula 12]

In formula 2, R ₂₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₂₂ and R ₂₅ independently represent an alkyl carbonyl group, an aryl carbonyl group, a heteroaryl carbonyl group, Alkyl, alkoxy, aryl, heteroaryl, aryloxy, halogen atom, nitro or cyano, p3 represents an integer from 0 to 3, p4 represents an integer from 0 to 2, R ₂₃ and R ₂₄ are independent represents a hydrogen atom, an alkyl group or an aryl group, R ₂₆ and R ₂₇ independently represent a hydrogen atom, an alkyl group or an aryl group, Y ₂ represents a single bond or a carbonyl group, and when Y ₂ is a carbonyl group, there may be a plurality of R ₂₆ And at least one of R ₂₇ that may exist in plural is not a hydrogen atom, n is an integer of 1 to 3, and two or more of R ₂₂ to R ₂₇ may be bonded to form a ring.

Each of R ₂₁ to R ₂₇ in Formula 2 may further have a substituent described in Formula 1 above. In addition, the ring formed by bonding two or more of R ₂₂ to R ₂₇ in Formula 2 may be an aliphatic hydrocarbon ring, a heteroaliphatic ring, an aromatic hydrocarbon ring, or a heteroaromatic ring , but an aliphatic hydrocarbon ring or a heteroaliphatic ring is preferred.

From the viewpoint of outgassing inhibition and sensitivity, R in formula 2 is preferably alkyl or _aryl , methyl, ethyl, propyl, isopropyl, butyl, tertiary butyl or phenyl More preferred, methyl is especially preferred.

From the viewpoints of outgassing inhibition, sensitivity, and adhesion, R in Formula ₂ is preferably a halogen atom, nitro, aryl, heteroaryl, or a group represented by the above-mentioned formula I or formula II, and halogen Atom, nitro, aryl, heteroaryl or the group represented by the above formula I or formula II is more preferred, halogen atom, nitro or the group represented by the above formula I or formula II is further preferred, by The group represented by the above-mentioned formula I or formula II is particularly preferred. From the viewpoint of outgassing suppression, sensitivity, and adhesiveness, p3 in Formula 2 is preferably 0 or 1, and 1 is more preferable. Also, from the viewpoints of outgassing suppression, sensitivity, and adhesion, the substitution position of _R22 in Formula 2 includes the para position of the bonding position of the two aromatic rings in Formula 2 bonded by a single bond. .

From the viewpoint of outgassing suppression and sensitivity, _R23 and _R24 in Formula 2 are preferably alkyl groups independently, more preferably alkyl groups with 1 to 20 carbons, and alkyl groups with 1 to 8 carbons For the best. In addition, as described above, _R23 and _R24 in Formula 2 may each independently have a substituent, for example, include at least one bond selected from the group consisting of an ether bond, a thioether bond, and an ester bond. the state of mind. Furthermore, from the viewpoint of synthesis, R ₂₃ and R ₂₄ in Formula 2 are preferably the same group.

From the viewpoints of outgassing suppression, sensitivity, and adhesion, R ₂₅ in Formula 2 is preferably an alkoxy group, an aryloxy group, a nitro group, a cyano group, or a halogen atom. From the viewpoint of outgassing suppression, sensitivity, and adhesiveness, p4 in Formula 2 is preferably 0 or 1, and 0 is more preferable.

From the viewpoint of outgassing suppression and sensitivity, _R26 and _R27 in formula 2 are independently hydrogen atom, alkyl or aryl group, preferably hydrogen atom or alkyl group, hydrogen atom or carbon number An alkyl group of 1 to 8 is further preferred, and a hydrogen atom or a methyl group is particularly preferred. Also, from the viewpoints of outgassing inhibition, sensitivity, and solubility, among R ₂₆ and R ₂₇ in formula 2, only R ₂₆ at the alpha position of the oxime group in formula 2 is an alkyl group, and the remaining R ₂₆ and R ₂₇ It is preferable to be a hydrogen atom, and only R ₂₆ at the alpha position of the oxime group in formula 2 is a methyl group, and it is more preferable that the rest of R ₂₆ and R ₂₇ are hydrogen atoms. From the viewpoint of outgassing suppression and sensitivity, n in Formula 2 is preferably 1 or 2, and 1 is more preferable.

It is preferable that Y ₂ in Formula 2 are each independently a carbonyl group from the viewpoint of outgassing suppression property and sensitivity.

The radical polymerization initiator represented by the above formula 1 is more preferably a radical polymerization initiator represented by the following formula 3 from the viewpoint of outgassing suppression property and sensitivity.

[chemical formula 13]

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ to R ₃₄ may be bonded to form a ring, and R ₃₆ and R ₃₇ may be bonded to form a ring.

Preferred aspects of R ₃₁ , R ₃₃ and R ₃₄ in Formula 3 are the same as those of R ₂₁ , R ₂₃ and R ₂₄ in Formula 2 above. From the viewpoints of outgassing inhibition, sensitivity and adhesion, R in Formula ₃ is preferably a halogen atom, nitro, aryl, heteroaryl or a group represented by the above-mentioned formula I or formula II, and halogen Atoms, nitro groups, or groups represented by the above formula I or II are more preferred, and groups represented by the above formula I or II are particularly preferred. From the viewpoint of outgassing suppression and sensitivity, R ₃₆ , R ₃₇ and R ₃₉ in Formula 3 are each independently preferably a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom. From the viewpoints of outgassing inhibition, sensitivity and solubility, R in Formula ₃ is preferably a hydrogen atom, an alkyl group or an aryl group, more preferably an alkyl group, and an alkyl group with 1 to 8 carbon atoms is further more preferable. Preferably, methyl is especially preferred. Also, the ring that may be formed by bonding two or more of R ₃₂ to R ₃₄ in Formula 3 or the ring that may be formed by bonding R ₃₆ and R ₃₇ may be an aliphatic hydrocarbon ring or a heteroaliphatic ring .

Furthermore, it is preferable that the radical polymerization initiator represented by the above-mentioned formula 1 is a radical polymerization initiator represented by the following formula 4 from the viewpoint of outgassing suppression property and sensitivity.

[chemical formula 14]

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, In the case of a primary to tertiary amino group, an alkylthio group or an arylthio group, both R ₄₆ and R ₄₇ may be hydrogen atoms.

Preferred aspects of R ₄₁ to R ₄₄ in Formula 4 are the same as those of R ₃₁ to R ₃₄ in Formula 3 above. Preferred aspects of R ₄₆ and R ₄₇ in Formula 4 are the same as those of R ₃₈ and R ₃₉ in Formula 3 above. The radical polymerization initiator represented by the above formula 1 is more preferably the radical polymerization initiator represented by the above formula 3 or formula 4, and the radical polymerization initiator represented by the above formula 4 is particularly preferable.

The radical polymerization initiator represented by the above-mentioned formula 1 preferably has absorption in any one of the ArF absorption region, i.e. wavelength 193nm, the KrF absorption region, i.e. wavelength 248nm, and i-ray absorption region, i.e. wavelength 365nm, and in the ArF absorption region i.e. It is more preferable to have absorption at any one of the wavelength 193nm and the KrF absorption region, that is, the wavelength 248nm. From the viewpoint of sensitivity, the molar absorption coefficient of the radical polymerization initiator represented by the above formula 1 at any wavelength of 193nm, 248nm or 365nm is preferably 10L·mol ^-1 ·cm ^-1 or more, 100L・mol ^-1・cm ^-1 or more is more preferable, and 1,000L・mol ^-1・cm ^-1 or more is especially preferable. Among them, from the viewpoint of sensitivity and adhesion, the radical polymerization initiator represented by the above formula 1 has a molar absorption coefficient of 1,000 L·mol ^-1 with respect to light having a wavelength of 248 nm at 25°C in an acetonitrile solution.・More than cm ^-1 is better, more than 2,000 is more preferable, and more than 3,000 is especially good. The upper limit is not limited, but it is preferably 50,000 or less, more preferably 30,000 or less, and particularly preferably 10,000 or less. By setting the upper limit of the molar absorptivity to 10,000 or less, the transmittance of the exposure light source is improved, and the adhesiveness is improved. In addition, from the viewpoint of sensitivity and adhesion, the radical polymerization initiator represented by the above formula 1 has a molar absorption coefficient of 1,000 or more at a wavelength of 248 nm at 25° C. in an acetonitrile solution, and a molar absorption coefficient at a wavelength of 405 nm. The absorbance coefficient is preferably less than 1,000.

As a specific example of the radical polymerization initiator represented by said Formula 1, A-1 - A-119 are mentioned preferably. However, of course, it is not limited to these. In addition, Me represents a methyl group.

[chemical formula 15]

[chemical formula 16]

[chemical formula 17]

[chemical formula 18]

[chemical formula 19]

[chemical formula 20]

[chemical formula 21]

The curable composition of the present disclosure may contain one type of radical polymerization initiator represented by the above formula 1 alone, or may contain two or more types. When using 2 or more types, it is preferable that these total amounts are in the following range. From the viewpoint of outgassing suppression and simplicity, the content of the radical polymerization initiator represented by the above formula 1 is preferably 0.01% by mass to 30% by mass, and 0.05% by mass relative to the total solid content of the curable composition. -20 mass % is more preferable, 0.1 mass % - 10 mass % is still more preferable, and 1 mass % - 8 mass % is especially preferable.

Also, the radical polymerization initiator represented by the above formula 1 preferably has no absorption at a wavelength of 450 nm or more, and more preferably does not have absorption at a wavelength of 420 nm or more. That is, the radical polymerization initiator represented by the above formula 1 is preferably white to pale yellow. If it is the above-mentioned color, the effect on the light spectrum of the color filter is small, which is preferable.

The method for producing the radical polymerization initiator represented by the above formula 1 is not particularly limited, and it can be produced by a known method, or can be produced with reference to a known method. Moreover, as a manufacturing method of the radical polymerization initiator represented by said Formula 1, for example, the following method is mentioned preferably. In the following method, the radical polymerization initiator represented by the above formula 1 in which Y ₁ is a single bond can be obtained. To prepare the 9,9-unsubstituted stilbene compound, 2 molar equivalents of the brominated compound (R ₁ -Br) were reacted with the above stilbene compound using tertiary butoxypotassium (tBuOK) as a base to produce A compound in which the 9-position of the stilbene ring is disubstituted (9,9-disubstituted stilbene compound). A cyclic ketone compound is produced by performing a ring formation reaction involving a rearrangement reaction between α-bromoacyl bromide and a 9,9-disubstituted stilbene compound using an aluminum chloride (AlCl ₃ ) catalyst. For cyclic ketone compounds, in the presence of sodium acetate (AcONa), react hydroxylamine hydrochloride with carbonyl to form an oxime group, and in the presence of triethylamine (TEA), make acyl chloride (R ₃ COCl) react with an oxime group reaction, thereby producing a radical polymerization initiator represented by the above formula 1.

[chemical formula 22]

Moreover, as another manufacturing method of the radical polymerization initiator represented by said Formula 1, for example, the following method can be mentioned preferably. In the following method, the radical polymerization initiator represented by the above formula 1 in which Y ₁ is a carbonyl group can be obtained. In the above method, after the 9,9-disubstituted fennel compound is prepared, aluminum chloride (AlCl ₃ ) catalyst is used to carry out the rearrangement reaction involving α-bromoacyl bromide and the 9,9-disubstituted fennel compound. Ring formation reaction to produce cyclic ketone compounds in which the substitution position of ^R2 is different from the above. For the obtained cyclic ketone compound, use sodium methoxide (NaOMe) as a base to react isoamyl nitrite to form an oxime group at the α position of the carbonyl group, and in the presence of triethylamine (TEA), make the acyl chloride compound (R ₃ COCl) reacts with an oxime group to produce a radical polymerization initiator represented by the above formula 1.

[chemical formula 23]

＜Other radical polymerization initiators＞ The curable composition of the present disclosure may contain other radical polymerization initiators other than the radical polymerization initiator represented by Formula 1 above. Examples of other radical polymerization initiators include oxime compounds, α-aminoacetophenone compounds, α-hydroxyketone compounds, acylphosphine compounds, and the like. Among them, oxime compounds are preferred. By using the radical polymerization initiator represented by the above-mentioned formula 1 together with other radical polymerization initiators, it is possible to obtain a rectangular pattern with better balance.

Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, J.C.S.Perkin II ( Compounds described in 1979, pp. 1653-1660), compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) Compounds described in Japanese Patent Application Laid-Open No. 2000-066385, Compounds described in Japanese Patent Application Publication No. 2004-534797, Compounds described in Japanese Patent Application Publication No. 2006-342166, Japanese Patent Application Publication No. 2017-019766 Compounds described in Japanese Patent No. 6065596, Compounds described in International Publication No. 2015/152153, Compounds described in International Publication No. 2017/051680, Japanese Patent Application Publication No. 2017-198865 Compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, compounds described in International Publication No. 2013/167515, polymers described in Japanese Patent Laid-Open No. 2020-172619, and International Publication No. 2020 Compounds described in /152120, oxime ester compounds described in International Publication No. 2021/023144, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, Butan-2-one, 2-Acetyloxyiminopentan-3-one, 2-Acetyloxyimino-1-phenylpropan-1-one, 2-Benzyloxyimine Base-1-phenylpropan-1-one, 3-(4-tosyloxy)iminobutan-2-one and 2-ethoxycarbonyloxyimino-1-phenylpropan- 1-ketone, etc., 1-[4-(phenylthio)phenyl]-3-cyclohexane-propan-1,2-dione-2-(O-acetyloxime). Commercially available items include Irgacure-OXE01, Irgacure-OXE02, Irgacure-OXE03, Irgacure-OXE04 (the above are manufactured by BASF Corporation), TR-PBG-304, TR-PBG-327 (manufactured by TRONLY Corporation), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, as the oxime compound, it is also preferable to use a non-coloring compound or a compound with high transparency and low discoloration. As a commercial item, ADEKA ARKLS NCI-730, NCI-831, NCI-930 (the above are made by ADEKA CORPORATION) etc. are mentioned. In addition, as other radical polymerization initiators, the fenylaminoketone-based photoinitiators described in JP 2020-507664 A can also be used.

As the oxime compound, an oxime compound having a terme ring can also be used. Specific examples of oxime compounds having a stilbene ring include the compounds described in JP-A-2014-137466, the compounds described in JP-A-6636081, and the compounds described in Korean Laid-Open Patent No. 10-2016-0109444. listed compounds.

As an oxime compound, the oxime compound which has at least one benzene ring which has a carbazole ring as a skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As an oxime compound, the oxime compound which has a fluorine atom can also be used. Specific examples of oxime compounds having a fluorine atom include compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, JP-A-2013- Compound (C-3) described in Publication No. 164471, etc.

As the oxime compound, an oxime compound having a nitro group can be used. It is also preferred that the oxime compound having a nitro group be a dimer. Specific examples of oxime compounds having a nitro group include compounds described in paragraphs 0031 to 0047 of JP-A-2013-114249 , compounds described in paragraphs 0008-0012 and 0070-0079 of JP-A-2014-137466 , A compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

As an oxime compound, the oxime compound which has a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

As the oxime compound, an oxime compound in which a substituent having a hydroxyl group is bonded to the carbazole skeleton can also be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055, and the like.

As the photoxime compound, an oxime compound (hereinafter, also referred to as an oxime compound OX.) having an aromatic ring group Ar ^OX1 having an electron-withdrawing group introduced into an aromatic ring can also be used. Examples of the electron-withdrawing group included in the aromatic ring group Ar ^OX1 include an acyl group, a nitro group, a trifluoromethyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, An arylsulfonyl group, a cyano group, an acyl group, and a nitro group are preferable, an acyl group is more preferable, and a benzoyl group is still more preferable from the viewpoint of being easy to form a film excellent in light resistance. The benzoyl group may have a substituent. As a substituent, a halogen atom, a cyano group, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic epoxy group, an alkenyl group, an alkylthiol group, an arylhydrogen group Thio group, acyl group or amino group are preferred, alkyl group, alkoxy group, aryl group, aryloxy group, heterocyclic epoxy group, alkyl sulfide group, aryl sulfide group or amine group are more preferred, alkyl group An oxy group, an alkylsulfhydryl group or an amine group is further preferred.

It is also preferable that the curable composition of the present disclosure contains an oxime ester compound represented by the following general formula (I).

[chemical formula 24]

In the general formula (I), R ₁ and R ₂ each independently represent R ₁₁₁ , OR ₁₁₁ , COR ₁₁₁ , SR ₁₁₁ , CONR ₁₁₂ R ₁₁₃ or CN. R ₁₁₁ , R ₁₁₂ and R ₁₁₃ each independently represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms, an aryl group with 6 to 30 carbon atoms, an arylalkyl group with 7 to 30 carbon atoms, or a carbon number 2 to 20 heterocyclic groups, the hydrogen atoms of the groups represented by R ₁₁₁ , R ₁₁₂ and R ₁₁₃ can be further replaced by R ₁₂₁ , OR ₁₂₁ , COR ₁₂₁ , SR ₁₂₁ , NR ₁₂₂ R ₁₂₃ , CONR ₁₂₂ R ₁₂₃ , - NR ₁₂₂ -OR ₁₂₃ , -NCOR ₁₂₂ -OCOR ₁₂₃ , NR ₁₂₂ COR ₁₂₁ , OCOR ₁₂₁ , COOR ₁₂₁ , SCOR ₁₂₁ , OCSR ₁₂₁ , COSR ₁₂₁ , CSOR ₁₂₁ , hydroxyl, nitro, CN, halogen atom or COOR ₁₂₁ substitution. R ₁₂₁ , R ₁₂₂ and R ₁₂₃ each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a carbon number 2 to 20 heterocyclic groups. The hydrogen atoms of the groups represented by R ₁₂₁ , R ₁₂₂ and R ₁₂₃ may be further substituted with a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group. The alkylene moieties of the groups represented by R ₁₁₁ , R ₁₁₂ , R ₁₁₃ , R ₁₂₁ , R ₁₂₂ and R ₁₂₃ are not affected by -O-, -S-, -COO-, -OCO-, -NR ₁₂₄ -, -NR ₁₂₄ CO-, -NR ₁₂₄ COO-, -OCONR ₁₂₄ -, -SCO-, -COS-, -OCS- or -CSO- can be disconnected 1 to 5 times under the condition that the oxygen atom is adjacent . R ₁₂₄ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms. The alkyl portion of the groups represented by R ₁₁₁ , R ₁₁₂ , R ₁₁₃ , R ₁₂₁ , R ₁₂₂ , R ₁₂₃ and R ₁₂₄ may have a branched side chain or may be a cyclic alkyl group.

In the general formula (I), R ₃ represents a hydrogen atom, an alkyl group with 1 to 20 carbon atoms, an aryl group with 6 to 30 carbon atoms, an arylalkyl group with 7 to 30 carbon atoms, or an alkyl group with 2 to 30 carbon atoms. 20 heterocyclyl. The alkyl portion of the group represented by R ₃ may have a branched side chain or may be a cyclic alkyl group. Also, R ₃ and R ₇ , R ₃ and R ₈ , R ₄ and R ₅ , R ₅ and R ₆ , and R ₆ and R ₇ may be linked to form a ring. The hydrogen atom of the group represented by R ₃ may be further replaced by R ₁₂₁ , OR ₁₂₁ , COR ₁₂₁ , SR ₁₂₁ , NR ₁₂₂ R ₁₂₃ , CONR ₁₂₂ R ₁₂₃ , -NR ₁₂₂ -OR ₁₂₃ , -NCOR ₁₂₂ -OCOR ₁₂₃ , NR ₁₂₂ Substituted by COR ₁₂₁ , OCOR ₁₂₁ , COOR ₁₂₁ , SCOR ₁₂₁ , OCSR ₁₂₁ , COSR ₁₂₁ , CSOR ₁₂₁ , hydroxyl group, nitro group, CN, halogen atom or COOR ₁₂₁ .

In general formula (I), R ₄ , R ₅ , R ₆ and R ₇ independently represent R ₁₁₁ , OR ₁₁₁ , SR ₁₁₁ , COR ₁₁₄ , CONR ₁₁₅ R ₁₁₆ , NR ₁₁₂ COR ₁₁₁ , OCOR ₁₁₁ , COOR ₁₁₄ , SCOR ₁₁₁ , OCSR ₁₁₁ , COSR ₁₁₄ , CSOR ₁₁₁ , hydroxyl group, CN or a halogen atom, R ₄ and R ₅ , R ₅ and R ₆ , and R ₆ and R ₇ may be linked to form a ring. R ₁₁₄ , R ₁₁₅ and R ₁₁₆ represent a hydrogen atom or an alkyl group with 1 to 20 carbon atoms, and the alkyl part of the group represented by R ₁₁₄ , R ₁₁₅ and R ₁₁₆ may have a branched side chain or may be cyclic alkyl.

In general formula (I), R ₈ represents R ₁₁₁ , OR ₁₁₁ , SR ₁₁₁ , COR ₁₁₁ , CONR ₁₁₂ R ₁₁₃ , NR ₁₁₂ COR ₁₁₁ , OCOR ₁₁₁ , COOR ₁₁₁ , SCOR ₁₁₁ , OCSR ₁₁₁ , COSR ₁₁₁ , CSOR ₁₁₁ , Hydroxyl, CN or halogen atom. In general formula (I), n represents 0 or 1.

Specific examples of the oxime compound OX include compounds described in paragraphs 0083 to 0105 of Japanese Patent No. 4600600.

Moreover, as an oxime compound, the compound shown below can be illustrated particularly preferably.

[chemical formula 25]

[chemical formula 26]

[chemical formula 27]

[chemical formula 28]

[chemical formula 29]

[chemical formula 30]

The mass ratio when used together with other radical polymerization initiators is not particularly limited. From the viewpoint of outgassing suppression, the content of the radical polymerization initiator represented by the above formula 1 relative to the total amount of the polymerization initiator The mass is preferably 10% by mass or more, more preferably 50% by mass or more, further preferably 80% by mass or more, and particularly preferably 90% by mass or more.

＜Radical polymerizable compound＞ The curable composition of the present disclosure contains a radically polymerizable compound. As a radically polymerizable compound, the compound etc. which have an ethylenically unsaturated group are mentioned.

Examples of the resin-type radically polymerizable compound include resins containing a repeating unit having a radically polymerizable group, and the like. It is preferable that the weight average molecular weight (Mw) of a resin type polymeric compound is 2,000-2,000,000. The upper limit of the weight average molecular weight is more preferably at most 1,000,000, and is still more preferably at most 500,000. The lower limit of the weight average molecular weight is more preferably 3,000 or more, and is still more preferably 5,000 or more.

The molecular weight of the monomer type radically polymerizable compound (polymerizable monomer) is preferably less than 2,000, more preferably 1,500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, more preferably 200 or more.

Moreover, it is preferable that the compound which has an ethylenically unsaturated group as a polymerizable monomer is a 3-15 functional (meth)acrylate compound, and it is more preferable that it is a 3-6 functional (meth)acrylate compound. Specific examples include paragraphs 0095 to 0108 of JP-A 2009-288705, paragraph 0227 of JP-A 2013-029760, paragraphs 0254-0257 of JP-A 2008-292970, JP-A Paragraphs 0034 to 0038 of Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Application Laid-Open No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, Japanese Patent Publication No. 6031807, Japanese Patent Publication No. 2017 - Compounds described in Publication No. 194662, the content of which is incorporated in this specification.

Examples of the compound having an ethylenically unsaturated group include diperythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), diperythritol Tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), Dineopentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; Nippon Kayaku Co., Ltd.), diperythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; Shin-Nakamura Chemical Co., Ltd.) and compounds whose (meth)acryloyl groups are bonded via ethylene glycol and/or propylene glycol residues (for example, SR454, SR499 commercially available from SARTOMER Company, Inc.) wait. Also, as a compound having an ethylenically unsaturated group, diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; manufactured by TOAGOSEI CO., LTD.), Neopentylitol tetraacrylate (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., Ltd.), etc.

In addition, as compounds having ethylenically unsaturated groups, trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ring Trifunctional (meth)acrylates such as ethylene oxide modified tri(meth)acrylate, isocyanuric acid ethylene oxide modified tri(meth)acrylate, neopentylthritol tri(meth)acrylate, etc. Acrylate compounds are also preferred. Commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, and M-306 , M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO.,LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A- TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (Nippon Kayaku Co., Ltd.), etc.

The compound having an ethylenically unsaturated group may further have an acid group such as a carboxyl group, a sulfo group, or a phosphoric acid group. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like.

As a compound which has an ethylenically unsaturated group, the compound which has a caprolactone structure can also be used. About the compound which has a caprolactone structure, the description of paragraph 0042-0045 of Unexamined-Japanese-Patent No. 2013-253224 can be referred, and this content is incorporated in this specification. As for the compound having a caprolactone structure, for example, DPCA-20, DPCA-30, DPCA-60, DPCA-120 etc. commercially available from Nippon Kayaku Co., Ltd. are mentioned.

As a compound which has an ethylenically unsaturated group, the compound which has an ethylenically unsaturated group and an alkyleneoxy group can also be used. Such compounds are preferably compounds with ethylenically unsaturated groups and ethyleneoxy and/or propyleneoxy groups, more preferably compounds with ethylenically unsaturated groups and ethyleneoxy groups, and have 4 to 20 ethyleneoxy groups The 3-6 functional (meth)acrylate compound is further preferred. As commercially available products, for example, tetrafunctional (meth)acrylate SR494 having 4 ethyleneoxy groups manufactured by SARTOMER Company, Inc., and trifunctional (meth)acrylate having 3 isobutyloxy groups manufactured by Nippon Kayaku Co., Ltd. Meth)acrylate KAYARAD TPA-330, etc.

As a compound having an ethylenically unsaturated group, a polymerizable compound having a fennel skeleton can also be used. As a commercial item, OGSOL EA-0200, EA-0300 (Osaka Gas Chemicals Co., Ltd. make, the (meth)acrylate monomer which has a fennel skeleton), etc. are mentioned.

As the compound having an ethylenically unsaturated group, it is also preferable to use a compound that does not substantially contain environmentally regulated substances such as toluene. As a commercial item of such a compound, KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.) etc. are mentioned.

As the compound having an ethylenically unsaturated group, UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA -306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by KYOEISHA CHEMICAL Co., LTD.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., LTD.) and the like are also preferable.

The content of the radically polymerizable compound is preferably 0.1% by mass to 50% by mass relative to the total solid content of the curable composition. The lower limit is more preferably at least 0.5% by mass, and more preferably at least 1% by mass. The upper limit is more preferably 45% by mass or less, and more preferably 40% by mass or less. In the curable composition of the present disclosure, only one type of radically polymerizable compound may be used, or two or more types may be used. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜Coloring agent＞ Preferably, the curable composition of the present disclosure contains a colorant. As a coloring agent, a chromatic coloring agent, a black coloring agent, etc. are mentioned. As a color coloring agent, the coloring agent which has a maximum absorption wavelength in the wavelength range of 400 nm - 700 nm is mentioned. For example, a green coloring agent, a red coloring agent, a yellow coloring agent, a purple coloring agent, a blue coloring agent, an orange coloring agent etc. are mentioned. The coloring agent may be a pigment or a dye. In addition, as a coloring agent, from the viewpoint of colorability and dispersibility, diketopyrrolopyrrole pigments, quinacridone pigments, anthraquinone pigments, perylene pigments, phthalocyanine pigments, isoindoline pigments, quinine pigments, Preferably, at least one pigment selected from the group consisting of diketopyrrolopyrrole pigments, phthalocyanine pigments, and isoindoline pigments is selected from the group consisting of phthalocyanine pigments, azocyanine pigments, and diketopyrrolopyrrole pigments. At least one pigment in the group is more preferred. Furthermore, as a coloring agent, from the viewpoint of further exhibiting the effects of the present disclosure, a pigment containing a titanium atom or a zirconium atom is preferable, and a black pigment containing a titanium atom or a zirconium atom is more preferable.

The average primary particle size of the pigment is preferably 1 nm to 200 nm. The lower limit is more preferably 5 nm or more, and still more preferably 10 nm or more. The upper limit is more preferably 180 nm or less, further preferably 150 nm or less, and particularly preferably 100 nm or less. In addition, in this specification, the primary particle diameter of a pigment can be calculated|required from the obtained image photograph by observing the primary particle of a pigment with a transmission electron microscope. Specifically, the projected area of the primary particle of the pigment is obtained, and the equivalent circle diameter corresponding thereto is calculated as the primary particle diameter of the pigment. Moreover, the average primary particle diameter in this specification is made into the arithmetic mean value of one primary particle diameter with respect to the primary particle of 400 pigments. In addition, the primary particle of the pigment refers to unaggregated independent particles. The crystallite size calculated from the half-value width of the peak originating from an arbitrary crystal plane in the X-ray diffraction spectrum when the CuKα ray of the pigment is used as the X-ray source is preferably 0.1 nm to 100 nm, more preferably 0.5 nm to 50 nm. Preferably, 1 nm to 30 nm is more preferable, and 5 nm to 25 nm is particularly preferable.

Examples of the green colorant include phthalocyanine compounds and squarylium compounds, and phthalocyanine compounds are preferred. Moreover, it is preferable that a green coloring agent is a pigment. Specific examples of green colorants include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. In addition, as a green colorant, a zinc halide phthalocyanine pigment with an average number of halogen atoms of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 in one molecule can also be used. . Specific examples include compounds described in International Publication No. 2015/118720. In addition, as a green coloring agent, compounds described in the specification of Chinese Patent Application No. 106909027, phthalocyanine compounds described in International Publication No. 2012/102395, which use phosphate as a ligand, and Japanese Patent Application Laid-Open No. 2019-008014 Phthalocyanine compounds described in Japanese Patent Laid-Open No. 2018-180023, compounds described in Japanese Patent Laid-Open No. 2019-038958, aluminum phthalocyanines described in Japanese Patent Laid-Open No. 2020-070426 Cyanine compounds, core-shell pigments described in JP-A-2020-076995, diarylmethane compounds described in JP-A-2020-504758, etc.

The green colorant is preferably C.I. Pigment Green 7, 36, 58, 59, 62, 63, and C.I. Pigment Green 7, 36, 58, 59 is more preferred.

Examples of the red coloring agent include diketopyrrolopyrrole compounds, anthraquinone compounds, azo compounds, naphthol compounds, imine compounds, kousuka compounds, quinacridone compounds, perylene compounds, and thioindigo compounds, A diketopyrrolopyrrole compound, an anthraquinone compound, and an azo compound are preferable, and a diketopyrrolopyrrole compound is more preferable. Moreover, it is preferable that a red coloring agent is a pigment. Specific examples of red colorants include C.I. (Pigment Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294, 295, 296, 297 and other red pigments. In addition, as a red coloring agent, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, described in paragraphs 0016 to 0022 of JP-A-6248838 can also be used. Diketopyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, Japanese Patent Laid-Open No. 2020-085947 The brominated diketopyrrolopyrrole compound described in, the naphthol azo compound described in Japanese Patent Application Laid-Open No. 2012-229344, the red coloring agent described in Japanese Patent No. 6516119, and the red coloring agent described in Japanese Patent No. 6525101 The red colorant, the brominated diketopyrrolopyrrole compound described in paragraph 0229 of JP-A-2020-090632, the anthraquinone compound described in Korean Laid-Open Patent No. 10-2019-0140741, the Korean Laid-Open Patent No. Anthraquinone compounds described in JP-A No. 10-2019-0140744, perylene compounds described in JP-A No. 2020-079396, perylene compounds described in JP-A No. 2020-083982, JP-A No. 2018-035345 Kusama Kuchi compounds described in JP-A-2020-066702, diketopyrrolopyrrole compounds described in paragraphs 0025 to 0041 of JP-A-2020-066702, and the like. Also, as a red coloring agent, a compound having a structure in which an aromatic ring group introduced into an aromatic ring with a group bonded to an oxygen atom, a sulfur atom, or a nitrogen atom is bonded to a diketopyrrolopyrrole skeleton can also be used. The structure. As a red colorant, Lumogen F Orange 240 (manufactured by BASF, red pigment, perylene pigment) can also be used.

The red colorant is preferably C.I. Pigment Red 122, 177, 179, 254, 255, 264, 269, 272, 291, and C.I. Pigment Red 254, 264, 272 is more preferable.

As a yellow coloring agent, an azo compound, an imine compound, an isoindoline compound, a pteridyl compound, a quinoline yellow compound, a perylene compound, etc. are mentioned. The yellow colorant is preferably a pigment, more preferably an azo pigment, an imine pigment, an isoindoline pigment, a pteridine-based pigment, a quinoline yellow pigment or a perylene pigment, and more preferably an azo pigment or an imine pigment. good. Specific examples of yellow colorants include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc. yellow paint.

Moreover, as a yellow coloring agent, the nickel azobarbiturate complex compound of the following structure can also be used.

[chemical formula 31]

Moreover, as a yellow coloring agent, the compound described in JP-A-2017-201003, the compound described in JP-A-2017-197719, the compound of 0011-0062, 0137 in JP-A-2017-171912 can also be used. Compounds described in Paragraph 0276, Compounds described in Paragraphs 0010-0062, 0138-0295 of JP-A-2017-171913, Paragraphs 0011-0062, 0139-0190 of JP-A-2017-171914 Compounds, compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of JP-A-2017-171915, quinophthalone compounds described in paragraphs 0011-0034 of JP-A-2013-054339, JP-A-2014- Quinophthalone compounds described in paragraphs 0013 to 0058 of Publication No. 026228, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, quinophthalone compounds described in Japanese Patent Application Publication No. 2018-203798, Japan The quinophthalone compound described in JP-A-2018-062578, the quinophthalone compound described in Japanese Patent No. 6432076, the quinophthalone compound described in JP-A-2018-155881, JP-A-2018- The quinophthalone compound described in JP-A No. 111757, the quinophthalone compound described in JP-A No. 2018-040835, the quinophthalone compound described in JP-A No. 2017-197640, JP-A No. 2016-145282 The quinophthalone compound described in the gazette, the quinophthalone compound described in the Japanese Patent Application Laid-Open No. 2014-085565, the quinophthalone compound described in the Japanese Patent Laid-Open No. 2014-021139, and the quinophthalone compound described in the Japanese Patent Laid-Open No. 2013-209614 The quinophthalone compound described in JP-A No. 2013-209435, the quinophthalone compound described in JP-A No. 2013-181015, and the compound described in JP-A No. 2013-061622 Quinoline yellow compounds, quinoline yellow compounds described in JP 2013-032486 A, quinoline yellow compounds described in JP 2012-226110 A, quinolines described in JP 2008-074987 A Yellow compound, quinophthalone compound described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthalone yellow compound described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthalone yellow compound described in Japanese Patent Application Laid-Open No. 2008-074985 , the quinophthalone compound described in Japanese Patent Application Publication No. 2008-050420, the quinophthalone compound described in Japanese Patent Application Publication No. 2008-031281, the quinophthalone compound described in Japanese Patent Application Publication No. 48-032765, Japan Quinophthalone compounds described in Japanese Patent Laid-Open No. 2019-008014, quinophthalone compounds described in Japanese Patent No. 6607427, compounds described in Korean Laid-Open Patent No. 10-2014-0034963, Japanese Patent Laid-Open No. 2017- Compounds described in Publication No. 095706, Compounds described in Taiwan Patent Application Publication No. 201920495, Compounds described in Japanese Patent No. 6607427, Compounds described in Japanese Patent Laid-Open No. 2020-033525, Japanese Patent Laid-Open No. 2020- Compounds described in Japanese Patent Application Laid-Open No. 033524, Compounds described in Japanese Patent Application Laid-Open No. 2020-033523, Compounds described in Japanese Patent Laid-Open No. 2020-033522, Compounds described in Japanese Patent Laid-Open No. 2020-033521 Compounds described in No. 2020/045200, compounds described in International Publication No. 2020/045199, compounds described in International Publication No. 2020/045197, azo compounds described in Japanese Patent Application Laid-Open No. 2020-093994, The perylene compound described in No. 2020/105346, the quinophthalone compound described in JP No. 2020-517791, the compound represented by the following formula (QP1), and the compound represented by the following formula (QP2). Moreover, from the viewpoint of improving the color value, those obtained by multimerizing these compounds can also be preferably used.

[chemical formula 32]

In formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. Specific examples of the compound represented by the formula (QP1) include compounds described in paragraph 0016 of Japanese Patent No. 6443711.

[chemical formula 33]

In formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m represent the integer of 0-6, and p represents the integer of 0-5. (n+m) is 1 or more. Specific examples of the compound represented by the formula (QP2) include compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.

The yellow colorant is preferably C.I. Pigment Yellow 117, 129, 138, 139, 150, 185.

Examples of orange colorants include C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61 , 62, 64, 71, 73 and other orange pigments.

Examples of the purple colorant include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

Examples of blue colorants include C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, 88, etc. Moreover, as a blue coloring agent, the aluminum phthalocyanine compound which has a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraphs 0047 of JP-A-2011-157478.

A dye can also be used as a color coloring agent. The dye is not particularly limited, and known dyes can be used. For example, pyrazole azo series, anilino azo series, triarylmethane series, anthraquinone series, anthrapyridone series, benzylidene series, oxonol series, pyrazolotriazole azo series, Pyridone azo-based, cyanine-based, pyrrolo-pyrazole-based, pyrrolopyrazole-based, phthalocyanine-based, benzopyran-based, indigo-based, pyrromethene-based and other dyes.

A pigment multimer can also be used as a color coloring agent. It is preferable that the dye multimer is used as a dye dissolved in an organic solvent. Also, pigment multimers may form particles. When the pigment multimer is in the form of particles, it is usually used in a dispersed state in a solvent. The pigment multimer in particle state can be obtained by emulsion polymerization, for example, and the compound and production method described in JP-A-2015-214682 can be mentioned as a specific example. A pigment multimer has two or more pigment structures in one molecule, preferably three or more pigment structures. The upper limit is not particularly limited, and may be 100 or less. The plural pigment structures contained in one molecule may be the same pigment structure or different pigment structures. The weight average molecular weight (Mw) of the pigment multimer is preferably 2,000 to 50,000. The lower limit is more preferably 3000 or more, and more preferably 6000 or more. The upper limit is more preferably 30,000 or less, and further preferably 20,000 or less. As the pigment polymer, JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, and International Publication No. 2016/031442 can also be used. Compounds described in et al.

As the coloring agent, diarylmethane compounds described in Japanese PCT Publication No. 2020-504758, triarylmethane dye polymers described in Korean Laid-Open Patent No. 10-2020-0028160, and Japanese Patent Laid-Open No. 2020-117638 can be used. Kuchi Yamaguchi compounds described in the gazette, phthalocyanine compounds described in International Publication No. 2020/174991, isoindoline compounds described in Japanese Patent Laid-Open No. 2020-160279 or their salts, Korean Laid-Open Patent No. 10 - Compounds represented by Formula 1 described in Publication No. 2020-0069442, compounds represented by Formula 1 described in Korean Laid-Open Patent No. 10-2020-0069730, and Korean Laid-Open Patent No. 10-2020-0069070 The compound represented by Formula 1, the compound represented by Formula 1 described in Korean Laid-Open Patent No. 10-2020-0069067, the compound represented by Formula 1 described in Korean Laid-Open Patent No. 10-2020-0069062, Zinc halide phthalocyanine pigments described in Japanese Patent No. 6809649, and isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-180176. The colored coloring agent can be a rotaxane, and the pigment skeleton can be used in a cyclic structure of a rotaxane, a rod structure, or both structures.

A color coloring agent can also be used in combination of 2 or more types. Also, when two or more color colorants are used in combination, black can be formed by the combination of two or more color colorants.

It does not specifically limit as a black coloring agent, A well-known thing can be used. For example, carbon black, titanium black, zirconium oxynitride, graphite, etc. are mentioned as an inorganic black coloring agent, Carbon black, titanium black, or zirconium oxynitride is preferable, and titanium black or zirconium oxynitride is more preferable. Titanium black refers to black particles containing titanium atoms, preferably low-suboxide titanium and titanium oxynitride. Titanium black can be surface-modified as needed for the purpose of improving dispersibility, suppressing cohesion, and the like. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. In addition, treatment using a water-repellent substance as disclosed in JP-A-2007-302836 can also be performed. As the black colorant, Pigment Black 1 and 7 of Pigment Index (C.I.) can also be used. Regarding titanium black, it is preferable that both the primary particle diameter and the average primary particle diameter of each particle are small. Specifically, the average primary particle diameter is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion including titanium black particles and silica particles, and a dispersion in which the content ratio of Si atoms and Ti atoms in the dispersion is adjusted within a range of 0.20 to 0.50, etc. are mentioned. Regarding the above-mentioned dispersion, the description in paragraphs 0020 to 0105 of JP-A-2012-169556 can be referred to, and the content is incorporated in this specification. Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (product name: manufactured by Mitsubishi Materials Corporation), Tilack D (product name: Ako Kasei Co., Ltd.), etc. Examples of the organic black colorant include a bisbenzofuranone compound, an imine compound, a perylene compound, an azo compound, and the like, and a bisbenzofuranone compound and a perylene compound are preferable. Examples of the bisbenzofuranone compound include JP 2010-534726, JP 2012-515233, JP 2012-515234, International Publication 2014/208348, JP 2015- The compound described in Publication No. 525260 etc. is available as "Irgaphor Black" manufactured by BASF Corporation, for example. C.I. Pigment Black 31, 32 etc. are mentioned as a perylene compound. Examples of the formimine compound include compounds described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Laid-Open No. 02-034664, etc., for example, "CHROMO" manufactured by Dainichiseika Color & Chemicals Mfg.Co., Ltd. FINE BLACK A1103" was obtained. In addition, as the organic black colorant, perylene black (Lumogen Black FK4280, etc.) described in paragraphs 0016 to 0020 of JP-A-2017-226821 can also be used.

The curable composition of the present disclosure may contain coloring agents alone, or may contain two or more of them. When using 2 or more types, it is preferable that these total amounts are in the following range. From the viewpoint of further exhibiting the effects of the present disclosure, the content of the coloring agent is preferably 10% by mass to 75% by mass relative to the total solid content of the curable composition. The upper limit is more preferably at most 70% by mass, and more preferably at most 65% by mass. The lower limit is more preferably at least 20% by mass, more preferably at least 30% by mass, and particularly preferably at least 50% by mass.

＜Resin＞ Preferably, the curable composition of the present disclosure contains a resin. The curable composition of the present disclosure can use a resin as a radically polymerizable compound. It is preferable to use what contains resin at least as a radically polymerizable compound. For example, resins are used for dispersing pigments in curable compositions or for binders. In addition, resins mainly used to disperse pigments in curable compositions are also called dispersants. However, such use of the resin is an example, and the resin can also be used for purposes other than such use. In addition, resins having radically polymerizable groups also belong to radically polymerizable compounds.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4000 or more, more preferably 5000 or more.

Examples of the resin include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyphenolic resins, polyethersulfonic resins, polyphenylene resins, Polyaryl ether phosphine oxide resin, polyimide resin, polyamide resin, polyamide imide resin, polyolefin resin, cycloolefin resin, polyester resin, styrene resin, vinyl acetate resin, poly Vinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, etc. Among these resins, one type may be used alone, or two or more types may be used in combination. As the cycloolefin resin, norcamphene resin is preferable from the viewpoint of improving heat resistance. As a commercial item of norcamphene resin, the ARTON series by JSR Corporation (for example, ARTON F4520) etc. are mentioned, for example. In addition, as the resin, resins described in the examples of International Publication No. 2016/088645, resins described in Japanese Patent Laid-Open No. 2017-057265, resins described in Japanese Patent Laid-Open No. 2017-032685, Japanese Resin described in JP-A No. 2017-075248, resin described in JP-A No. 2017-066240, resin described in JP-A No. 2017-167513, resin described in JP-A No. 2017-173787 , Resins described in paragraphs 0041 to 0060 of JP-A No. 2017-206689, resins described in paragraphs 0022-0071 of JP-A No. 2018-010856, end caps described in JP-A No. 2016-222891 Polyisocyanate resin, resin described in JP-A No. 2020-122052, resin described in JP-A No. 2020-111656, resin described in JP-A No. 2020-139021, JP-A No. 2017-138503 The resin described in the publication includes a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. In addition, as the resin, a resin having a fennel skeleton can also be preferably used. Regarding the resin having a fenugreek skeleton, reference can be made to the description of US Patent Application Publication No. 2017/0102610, and the content is incorporated in this specification. In addition, as the resin, resins described in paragraphs 0199 to 0233 of JP-A-2020-186373, alkali-soluble resins described in JP-A-2020-186325, Korean Laid-Open Patent No. 10-2020-0078339 can also be used. The resin represented by Formula 1 described in the Publication No.

As the resin, it is preferable to use a resin having an acid group. As an acidic group, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group etc. are mentioned, for example. These acid groups may be only one type, or may be two or more types. For example, a resin having an acid group can be used as the alkali-soluble resin. The acid value of the resin with acid groups is preferably 30-500 mgKOH/g. The lower limit is preferably at least 50 mgKOH/g, more preferably at least 70 mgKOH/g. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, further preferably 150 mgKOH/g or less, most preferably 120 mgKOH/g or less.

The resin includes a resin comprising a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimer".) Also better.

[chemical formula 34]

In formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

[chemical formula 35]

In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of the formula (ED2), the description in JP-A-2010-168539 can be referred to.

For specific examples of ether dimers, Paragraph 0317 of JP-A-2013-029760 can be referred to, and the content is incorporated in this specification.

It is also preferable to use a resin having a polymerizable group as the resin. Examples of the polymerizable group include ethylenically unsaturated groups and cyclic ether groups. Among them, it is preferable to have a (meth)acryl group, an epoxy group, or an oxetanyl group from the viewpoint of outgassing suppression.

Also, as a resin, one having at least one repeating unit selected from repeating units represented by formula (Ep-1) and repeating units represented by formula (Ep-2) (hereinafter also referred to as repeating unit Ep) can also be used. The resin (hereinafter also referred to as resin Ep). The above-mentioned resin Ep may only contain repeating units represented by formula (Ep-1) and repeating units represented by formula (Ep-2), or may contain repeating units represented by formula (Ep-1) respectively and a repeating unit represented by formula (Ep-2). When two kinds of repeating units are included, the ratio of the repeating unit represented by formula (Ep-1) to the repeating unit represented by formula (Ep-2) is in molar ratio, and the repeating unit represented by formula (Ep-1): The repeating unit represented by the formula (Ep-2) is preferably 5:95 to 95:5, more preferably 10:90 to 90:10, and still more preferably 20:80 to 80:20.

[chemical formula 36]

In formulas (Ep-1) and (Ep-2), L ¹ represents a single bond or a divalent linking group, and R ¹ represents a hydrogen atom or a substituent. Examples of the substituent represented by ^R1 include an alkyl group and an aryl group, and an alkyl group is preferred. The carbon number of the alkyl group is preferably 1-10, more preferably 1-5, and still more preferably 1-3. R ¹ is preferably a hydrogen atom or a methyl group. Examples of the divalent linking group represented by ^L include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylylene group (preferably an arylylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ₂ -, -CO-, -O-, -COO-, -OCO-, -S-, and a combination of two or more of these. The alkylene group may be any of linear, branched and cyclic, and linear or branched is preferred. In addition, the alkylene group may have a substituent or may be unsubstituted. As a substituent, a hydroxyl group, an alkoxy group, etc. are mentioned.

The content of the repeating unit Ep in the resin Ep is preferably 1 mol% to 100 mol% of all the repeating units in the resin Ep. The upper limit is more preferably 90 mol% or less, and more preferably 80 mol% or less. The lower limit is more preferably at least 2 mol%, and more preferably at least 3 mol%.

The resin Ep may contain other repeating units other than the above-mentioned repeating unit Ep. As another repeating unit, the repeating unit which has an acidic group, the repeating unit which has an ethylenically unsaturated group, etc. are mentioned.

Examples of the acid group include a phenolic hydroxyl group, a carboxyl group, a sulfo group, and a phosphoric acid group, with a phenolic hydroxyl group or a carboxyl group being preferred, and a carboxyl group being more preferred.

Examples of the ethylenically unsaturated group include a vinyl group, a styryl group, a (meth)allyl group, a (meth)acryl group, and the like.

When the resin Ep contains a repeating unit having an acid group, the content of the repeating unit having an acid group in the resin Ep is preferably 5 mol% to 85 mol% of all the repeating units in the resin Ep. The upper limit is more preferably 60 mol% or less, and more preferably 40 mol% or less. The lower limit is more preferably at least 8 mol%, and more preferably at least 10 mol%.

When the resin Ep contains a repeating unit having an ethylenically unsaturated group, the content of the repeating unit having an ethylenically unsaturated group in the resin Ep is preferably 1 mol% to 65 mol% of all the repeating units in the resin Ep . The upper limit is more preferably 45 mol% or less, and more preferably 30 mol% or less. The lower limit is more preferably at least 2 mol%, and more preferably at least 3 mol%.

It is preferable that the resin Ep further includes a repeating unit having an aromatic hydrocarbon ring. As the aromatic hydrocarbon ring, a benzene ring or a naphthalene ring is preferable, and a benzene ring is more preferable. The aromatic hydrocarbon ring may have a substituent. An alkyl group etc. are mentioned as a substituent. When the resin with a cyclic ether group contains repeating units with an aromatic hydrocarbon ring, the content of the repeating unit with an aromatic hydrocarbon ring is 1 mol % to 65 mol in all the repeating units of the resin with a cyclic ether group % is better. The upper limit is more preferably 45 mol% or less, and more preferably 30 mol% or less. The lower limit is more preferably at least 2 mol%, and more preferably at least 3 mol%. Examples of the repeating unit having an aromatic hydrocarbon ring include repeating units derived from monofunctional polymerizable compounds having an aromatic hydrocarbon ring, such as vinyltoluene and benzyl (meth)acrylate.

As the resin, it is also preferable to use a resin comprising a repeating unit derived from the compound represented by formula (X).

[chemical formula 37]

In the formula, ^R1 represents a hydrogen atom or a methyl group, ^R21 and ^R22 each independently represent an alkylene group, and n represents an integer of 0-15. The carbon number of the alkylene group represented by R ²¹ and R ²² is preferably 1-10, more preferably 1-5, still more preferably 1-3, particularly preferably 2 or 3. n represents an integer of 0-15, preferably an integer of 0-5, more preferably an integer of 0-4, and further preferably an integer of 0-3.

Examples of the compound represented by the formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of p-cumylphenol (para-cumyl phenol). As a commercial item, ARONIX M-110 (made by TOAGOSEI CO., LTD.) etc. are mentioned.

It is also preferable to use a resin (hereinafter also referred to as resin Ac) having an aromatic carboxyl group as the resin. In resin Ac, the aromatic carboxyl group may be included in the main chain of the repeating unit, or may be included in the side chain of the repeating unit. An aromatic carboxyl group is preferably included in the main chain of the repeating unit. In addition, in this specification, an aromatic carboxyl group means the group of the structure which bonded one or more carboxyl groups to an aromatic ring. Among the aromatic carboxyl groups, the number of carboxyl groups bonded to the aromatic ring is preferably 1 to 4, more preferably 1 to 2.

Resin Ac is preferably a resin containing at least one repeating unit selected from repeating units represented by formula (Ac-1) and repeating units represented by formula (Ac-2).

[chemical formula 38]

In formula (Ac-1), Ar ¹ represents a group including an aromatic carboxyl group, L ¹ represents -COO- or -CONH-, and L ² represents a divalent linking group. In formula (Ac-2), Ar ¹⁰ represents a group including an aromatic carboxyl group, L ¹¹ represents -COO- or -CONH-, L ¹² represents a trivalent linking group, and P ¹⁰ represents a polymer chain.

In formula (Ac-1), as the group containing an aromatic carboxyl group represented by Ar ¹ , a structure derived from an aromatic tricarboxylic anhydride, a structure derived from an aromatic tetracarboxylic anhydride, and the like are exemplified. Examples of the aromatic tricarboxylic acid anhydride and the aromatic tetracarboxylic acid anhydride include compounds of the following structures.

[chemical formula 39]

In the above formula, Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, represented by the following formula (Q-1) or a group represented by the following formula (Q-2).

[chemical formula 40]

The group containing an aromatic carboxyl group represented by Ar ¹ may have a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated group and a cyclic ether group, more preferably an ethylenically unsaturated group. Specific examples of the group containing an aromatic carboxyl group represented by Ar ¹ include groups represented by formula (Ar-11), groups represented by formula (Ar-12), groups represented by formula (Ar-13 ) represents the group, etc.

[chemical formula 41]

In formula (Ar-11), n1 represents an integer of 1 to 4, 1 or 2 is preferable, and 2 is more preferable. In formula (Ar-12), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and still more preferably 2. In formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4, an integer of 0 to 2 is preferable, 1 or 2 is more preferable, and 1 is still more preferable. However, at least one of n3 and n4 is an integer of 1 or more. In the formula (Ar-13), Q ¹ represents a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, from the above formula (Q- 1) The group represented by or the group represented by the above-mentioned formula (Q-2). In formulas (Ar-11) to (Ar-13), *1 represents a bonding position with L ¹ .

In the formula (Ac-1), L ¹ represents -COO- or CONH-, preferably -COO-.

Examples of the divalent linking group represented by ^L2 in formula (Ac-1) include alkylene, arylylene, -O-, -CO-, -COO-, -OCO-, -NH-, - S- and a group formed by combining two or more of these. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The alkylene group may be any of linear, branched and cyclic. The carbon number of the arylylene group is preferably 6-30, more preferably 6-20, and still more preferably 6-10. An alkylene group and an arylylene group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned. The divalent linking group represented by L ² is preferably a group represented by -L ^2a -O-. L ^2a can include an alkylene group; an arylylene group; a group formed by a combination of an alkylene group and an arylylene group; at least one selected from the group consisting of an alkylene group and an arylylene group and a group selected from -O-, -CO A group formed by combining at least one of -, -COO-, -OCO-, -NH-, and -S-, etc., preferably an alkylene group. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The alkylene group may be any of linear, branched and cyclic. An alkylene group and an arylylene group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned.

The group containing an aromatic carboxyl group represented by Ar ¹⁰ in formula (Ac-2) has the same meaning as Ar ¹ in formula (Ac-1), and the preferred aspects are also the same.

In the formula (Ac-2), L ¹¹ represents -COO- or CONH-, preferably -COO-.

In formula (Ac-2), as the trivalent linking group represented by L ¹² , hydrocarbon groups and hydrocarbon groups selected from -O-, -CO-, -COO-, -OCO-, -NH-, and A group formed by combining at least one of -S-. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1-30, more preferably 1-20, and still more preferably 1-15. The aliphatic hydrocarbon group may be any of linear, branched and cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6-30, more preferably 6-20, and still more preferably 6-10. The hydrocarbon group may have a substituent. As a substituent, a hydroxyl group etc. are mentioned. The trivalent linking group represented by L ¹² is preferably a group represented by formula (L12-1), more preferably a group represented by formula (L12-2).

[chemical formula 42]

In formula (L12-1), L ^12b represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), and *2 represents the bonding position with formula (Ac-2) Bonding position of P ¹⁰ . Examples of the trivalent linking group represented by ^L12b include a hydrocarbon group and a combination of a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S- As the resulting group, etc., a hydrocarbon group or a combination of a hydrocarbon group and -O- is preferable.

In formula (L12-2), L ^12c represents a trivalent linking group, X ¹ represents S, *1 represents the bonding position with L ¹¹ of formula (Ac-2), and *2 represents the bond with formula (Ac-2) Bonding position of P ¹⁰ . Examples of the trivalent linking group represented by L ^12c include a hydrocarbon group and a combination of a hydrocarbon group and at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S- The resulting groups, etc., are preferably hydrocarbon groups.

In the formula (Ac-2), P ¹⁰ represents a polymer chain. The polymer chain represented by ^P10 preferably has at least one repeating unit selected from poly(meth)acrylic acid repeating units, polyether repeating units, polyester repeating units and polyol repeating units. The weight average molecular weight of the polymer chain ^P10 is preferably 500-20,000. The lower limit is more preferably 1,000 or more. The upper limit is more preferably 10,000 or less, further preferably 5,000 or less, and particularly preferably 3,000 or less. As long as the weight average molecular weight of P ¹⁰ is within the above range, the dispersibility of the pigment in the composition will be good. When the resin having an aromatic carboxyl group is a resin having a repeating unit represented by formula (Ac-2), the resin can be preferably used as a dispersant.

The polymer chain represented by ^P10 may contain a polymerizable group. Examples of the polymerizable group include ethylenically unsaturated groups.

The curable composition of the present disclosure preferably contains a resin as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin having more acidic groups than basic groups. As the acidic dispersant (acidic resin), when the total amount of the amount of acid groups and the amount of bases is 100 mol%, a resin having an amount of acid groups of 70 mol% or more is preferable. It is preferable that the acidic group which the acidic dispersant (acidic resin) has is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 mgKOH/g-105 mgKOH/g. In addition, the basic dispersant (basic resin) means a resin having more basic groups than acid groups. As the basic dispersant (basic resin), when the total amount of the amount of acid groups and the amount of bases is 100 mol %, a resin with an amount of bases exceeding 50 mol % is preferable. The base that the alkaline dispersant has is preferably an amine group.

It is also preferred that the resin used as the dispersant is a graft polymer. For details of the graft polymer, the description in paragraphs 0025 to 0094 of JP-A-2012-255128 can be referred to, and the content is incorporated in this specification. Also, from the viewpoint of dispersion stability, the above-mentioned resin is preferably a graft polymer having a grafted chain, and the above-mentioned grafted chain includes a polyether chain, a polyester chain, and a polyacrylic acid chain. At least one kind, and the weight average molecular weight of the above-mentioned graft chain is 1,000 or more.

It is also preferable that the resin used as the dispersant is a polyimide-based dispersant containing nitrogen atoms in at least one of the main chain and the side chain. As a polyimide-based dispersant, a resin having a main chain and a side chain and having a basic nitrogen atom on at least one of the main chain and the side chain is preferable, and the main chain includes a partial structure having a functional group of pKa14 or less , the number of atoms in the side chain is 40 to 10,000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. As for the polyimide-based dispersant, the description in paragraphs 0102 to 0166 of JP-A-2012-255128 can be referred to, and the content is incorporated in this specification.

It is also preferable that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core. Examples of such resins include dendrimers (including star polymers). Moreover, specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962 .

It is also preferable that the resin used as a dispersant is a resin containing a repeating unit having an ethylenically unsaturated group in a side chain. The content of repeating units with ethylenically unsaturated groups in the side chains in all the repeating units of the resin is preferably 10 mol% or more, more preferably 10 mol% to 80 mol%, and 20 mol% to 70 mol% % is further preferred.

Also, the resin used as a dispersant is preferably a resin containing an oxetanyl group in the side chain, and more preferably a resin containing a repeating unit having an oxetanyl group in the side chain. Furthermore, it is preferable that the resin whose side chain contains an oxetanyl group is a graft polymer. As a resin containing an oxetanyl group in a side chain, those described in the Examples described later are preferably mentioned. The content of repeating units with oxetane groups in the side chains of the above resins in all the repeating units of the resin is preferably 10 mole % or more, more preferably 10 mole % to 80 mole %, and 20 mole % % to 70 mol% is further preferred. As the resin having an oxetanyl group, for example, resins described in International Publication No. 2021/182268 or International Publication No. 2021/187257 can be used.

Also, as a dispersant, resins described in JP-A-2018-087939 and block copolymers (EB-1) to (EB-9) described in paragraphs 0219-0221 of JP-A-6432077 can also be used. ), the polyethyleneimine having polyester side chains described in International Publication No. 2016/104803, the block copolymer described in International Publication No. 2019/125940, and the polyethylenimine described in Japanese Patent Laid-Open No. 2020-066687 A block polymer of an acrylamide structural unit, a block polymer having an acrylamide structural unit described in JP-A-2020-066688, a dispersant described in International Publication No. 2016/104803, etc.

The dispersant can be obtained as a commercial product, and such specific examples include the Disperbyk series manufactured by BYK-Chemie GmbH (for example, Disperbyk-111, 161, 2001, etc.), the SOLSPERSE series manufactured by Japan Lubrizol Corporation (for example, SOLSPERSE 20000, 76500, etc.), Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc., etc. Moreover, the product described in paragraph 0129 of JP-A-2012-137564 and the product described in paragraph 0235 of JP-A-2017-194662 can also be used as a dispersant.

When the curable composition disclosed herein contains a resin as a radically polymerizable compound, the content of the resin is preferably 1% by mass to 70% by mass relative to the total solid content of the curable composition. The lower limit is more preferably 2% by mass or more, still more preferably 3% by mass or more, and particularly preferably 5% by mass or more. The upper limit is more preferably 65% by mass or less, and more preferably 60% by mass or less. Also, the content of the resin having an acid group is preferably 1% by mass to 70% by mass relative to the total solid content of the curable composition. The lower limit is more preferably 2% by mass or more, still more preferably 3% by mass or more, and particularly preferably 5% by mass or more. The upper limit is more preferably 65% by mass or less, and more preferably 60% by mass or less. Also, the content of the alkali-soluble resin is preferably 1% by mass to 70% by mass relative to the total solid content of the curable composition. The lower limit is more preferably 2% by mass or more, still more preferably 3% by mass or more, and particularly preferably 5% by mass or more. The upper limit is more preferably 65% by mass or less, and more preferably 60% by mass or less. When the curable composition of the present disclosure contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1% by mass to 30% by mass relative to the total solid content of the curable composition. The upper limit is more preferably at most 25% by mass, and is still more preferably at most 20% by mass. The lower limit is more preferably at least 0.5% by mass, and more preferably at least 1% by mass. Moreover, content of the resin which is a dispersing agent is preferably 1 mass part - 100 mass parts with respect to 100 mass parts of coloring agents. The upper limit is more preferably at most 80 parts by mass, further preferably at most 70 parts by mass, and particularly preferably at most 60 parts by mass. The lower limit is more preferably 5 parts by mass or more, further preferably 10 parts by mass or more, and particularly preferably 20 parts by mass or more. The curable composition of this disclosure may contain only 1 type of resin, and may contain 2 or more types. When two or more types of resins are included, it is preferable that the total amount thereof is within the above range.

<Solvent> It is preferable that the curable composition disclosed herein contains a solvent. An organic solvent is mentioned as a solvent. The type of solvent is basically not particularly limited as long as it satisfies the solubility of each component and the applicability of the composition. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. Regarding such details, reference can be made to paragraph 0223 of International Publication No. 2015/166779, which is incorporated in this specification. In addition, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl celuxoacetate , ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone , 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate , Butyl Carbitol Acetate, Propylene Glycol Monomethyl Ether, Propylene Glycol Monomethyl Ether Acetate, 3-Methoxy-N,N-Dimethylpropionamide, 3-Butoxy-N,N- Dimethylacrylamide, Propylene Glycol Diacetate, 3-Methoxybutanol, Methyl Ethyl Ketone, γ-Butyrolactone, Cyclobutane, Anisole, 1,4-Diacetyloxy Butane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as 4-hydroxy-4-methyl-2 -pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropanol, etc. However, sometimes for reasons such as the environment, it is better to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents (for example, it can be set to 50 mass ppm (parts per million: parts per million) or less, may be 10 mass ppm or less, may also be 1 mass ppm or less).

In this disclosure, it is preferable to use an organic solvent with a low metal content. The metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion: parts per billion) or less. Organic solvents at the ppt (parts per trillion: parts per million) level can be used as needed, and such organic solvents are provided by Toyo Gosei Co., Ltd, for example (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and still more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents can contain isomers (compounds with the same number of atoms but different structures). In addition, the isomer may contain only 1 type, and may contain plural types.

It is preferable that the content rate of a peroxide in an organic solvent is 0.8 mmol/L or less, and it is more preferable not to contain a peroxide substantially.

The content of the solvent in the curable composition is preferably 10% by mass to 95% by mass, more preferably 20% by mass to 90% by mass, and still more preferably 30% by mass to 90% by mass.

Moreover, from the viewpoint of environmental control, it is preferable that the curable composition of the present disclosure does not substantially contain an environmental control substance. In addition, in the present disclosure, the term "substantially not containing environmentally regulated substances" means that the content of the environmentally regulated substances in the curable composition is 50 mass ppm or less, preferably 30 mass ppm or less, and more preferably 10 mass ppm or less. , below 1 mass ppm is particularly preferred. Examples of environmental control substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These are based on REACH (Registration, Evaluation, Authorization and Restriction of Chemicals; Registration Evaluation Authorization and Restriction of Chemicals) Act, PRTR (Pollutant Release and Transfer Register) Act, VOC (Volatile Organic Compounds; Volatile Organic Compounds) control, etc., registered as an environmental control substance, and strictly regulated the amount of use and operation method. These compounds are sometimes used as solvents when producing components used in curable compositions, etc., and are sometimes mixed into curable compositions as residual solvents. From the standpoint of human safety and environmental protection, it is preferable to reduce these substances as much as possible. As a method of reducing environmentally regulated substances, there is a method of distilling and reducing the environmentally regulated substances from the inside of the system by heating and reducing the pressure inside the system to a temperature above the boiling point of the environmentally regulated substances. In addition, when distilling off a small amount of environmentally controlled substances, it is also useful to azeotrope with a solvent having the same boiling point as the solvent in order to increase efficiency. In addition, when a compound having radical polymerizability is contained, a polymerization inhibitor or the like may be added and removed by vacuum distillation to suppress intermolecular crosslinking caused by radical polymerization reaction during vacuum distillation. These distillation removal methods can be used at the stage of raw materials, at the stage of products made by reacting raw materials (such as polymerized resin solutions, multifunctional monomer solutions), or at the stage of hardening compositions produced by mixing these compounds, etc. implemented at any stage.

＜Pigment Derivatives＞ The curable composition of the present disclosure can contain pigment derivatives. Pigment derivatives can be used, for example, as dispersing aids. Examples of pigment derivatives include compounds having a structure in which an acidic group or a basic group is bonded to a pigment skeleton.

Examples of the dye skeleton constituting the pigment derivative include a quinoline dye skeleton, a benzimidazolone dye skeleton, a benzindole dye skeleton, a benzothiazole dye skeleton, an iminium dye skeleton, and a squarylium dye skeleton. , crotonium dye skeleton, oxonol dye skeleton, pyrrolopyrrole dye skeleton, diketopyrrolopyrrole dye skeleton, azo dye skeleton, formimine dye skeleton, phthalocyanine dye skeleton, naphthalocyanine dye skeleton, anthracene Quinone pigment skeleton, quinacridone pigment skeleton, dioxane pigment skeleton, perylene pigment skeleton, thioindigo pigment skeleton, isoindoline pigment skeleton, isoindolinone pigment skeleton, quinoline yellow pigment skeleton, dithiol dye skeleton, triarylmethane dye skeleton, pyrromethene dye skeleton, etc.

Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amido group, a sulfonamide acid group, an imidic acid group, and salts thereof. The atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^+, etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, pyridinium ions, etc. ions, phosphonium ions, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^X1 is preferable. As the sulfonamide group, a group represented by -NHSO ₂ R ^X2 is preferable. As the imidic acid group, a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 or -SO ₂ NHCOR ^X6 is preferable, and -SO ₂ NHSO ₂ R ^X3 is more preferable. R ^X1 to R ^X6 each independently represent an alkyl group or an aryl group. The alkyl and aryl groups represented by R ^X1 to R ^X6 may have a substituent. As the substituent, a halogen atom is preferable, and a fluorine atom is more preferable.

Examples of the base include an amino group, a pyridyl group and salts thereof, ammonium group salts, and phthalimidomethyl group. Examples of the atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions, and the like.

Pigment derivatives can also use pigment derivatives excellent in visibility and transparency (hereinafter also referred to as transparent pigment derivatives). The maximum molar absorption coefficient (εmax) of transparent pigment derivatives in the wavelength region of 400nm to 700nm is preferably 3,000L・mol ^-1・cm ^-1 or less, and 1,000L・mol ^-1・cm ^-1 or less More preferably, less than 100L·mol ^-1 ·cm ^-1 is still more preferable. The lower limit of εmax is, for example, 1 L·mol ⁻¹ ·cm ⁻¹ or more, and may be 10 L·mol ⁻¹ ·cm ⁻¹ or more.

Specific examples of pigment derivatives include compounds described in JP-A-56-118462, compounds described in JP-A-63-264674, and compounds described in JP-A-01-217077. Compounds, compounds described in JP-A-03-009961, compounds described in JP-A-03-026767, compounds described in JP-A-03-153780, compounds described in JP-A-03-045662 Compounds described, compounds described in JP-A-04-285669, compounds described in JP-A-06-145546, compounds described in JP-A-06-212088, JP-A-06-240158 Compounds described in the gazette, compounds described in Japanese Patent Laid-Open No. 10-030063, compounds described in Japanese Patent Laid-Open No. 10-195326, compounds described in paragraphs 0086 to 0098 of International Publication No. 2011/024896, International Compounds described in paragraphs 0063 to 0094 of Publication No. 2012/102399, compounds described in paragraph 0082 of International Publication No. 2017/038252, compounds described in paragraph 0171 of JP-A-2015-151530, JP-A Compounds described in paragraphs 0162 to 0183 of Publication No. 2011-252065, compounds described in Japanese Patent Application Laid-Open No. 2003-081972, compounds described in Japanese Patent Publication No. 5299151, compounds described in Japanese Patent Application Publication No. 2015-172732 Compounds, compounds described in JP 2014-199308 A, compounds described in JP 2014-085562 A, compounds described in JP 2014-035351 A, JP 2008-081565 A Compounds described, compounds described in JP-A-2019-109512, compounds described in JP-A-2019-133154, diketopyrroloxyls having a thiol linking group described in International Publication No. 2020/002106 Pyrrole compounds, benzimidazolone compounds described in JP-A-2018-168244, or salts thereof.

The content of the pigment derivative is preferably from 1 to 30 parts by mass, more preferably from 3 to 20 parts by mass, based on 100 parts by mass of the colorant. In addition, the total content of the pigment derivative and the colorant is preferably at least 35% by mass, more preferably at least 40% by mass, more preferably at least 45% by mass, and even more preferably at least 50% by mass, based on the total solid content of the curable composition. The above is excellent. The upper limit is preferably at most 70% by mass, more preferably at most 65% by mass. A pigment derivative may be used individually by 1 type, and may use 2 or more types together.

＜Polyalkyleneimine＞ The curable composition of the present disclosure can contain polyalkyleneimine. Polyalkyleneimines can be used, for example, as dispersing aids for pigments. A dispersing aid refers to a material used to improve the dispersibility of a pigment in a curable composition. Polyalkyleneimine refers to a polymer formed by ring-opening polymerization of alkyleneimine and having at least a secondary amine group. The polyalkyleneimine may contain primary or tertiary amine groups in addition to secondary amine groups. It is preferable that the polyalkyleneimine is a polymer having a branched chain structure respectively including primary amine groups, secondary amine groups and tertiary amine groups. The carbon number of the alkyleneimine is preferably 2-6, more preferably 2-4, further preferably 2 or 3, and particularly preferably 2.

The molecular weight of the polyalkyleneimine is preferably 200 or more, more preferably 250 or more. The upper limit is preferably at most 100,000, more preferably at most 50,000, further preferably at most 10,000, and particularly preferably at most 2,000. In addition, when the molecular weight of polyalkyleneimine can be calculated from a structural formula about the value of the molecular weight of a polyalkyleneimine, the molecular weight of a polyalkyleneimine is the value calculated from a structural formula. On the other hand, when the molecular weight of the specific amine compound cannot be calculated from the structural formula or is difficult to calculate, the value of the number average molecular weight measured by the boiling point increase method is used. In addition, when it is impossible or difficult to measure by the boiling point elevation method, the value of the number average molecular weight measured by the viscosity method is used. Moreover, when it cannot measure by a viscosity method or it is difficult to measure by a viscosity method, the value of the number average molecular weight in terms of the polystyrene conversion value measured by the GPC (gel permeation chromatography) method is used.

The amine value of the polyalkyleneimine is preferably at least 5 mmol/g, more preferably at least 10 mmol/g, and still more preferably at least 15 mmol/g.

Specific examples of alkyleneimine include ethyleneimine, propyleneimine, 1,2-buteneimine, 2,3-buteneimine, etc., and ethyleneimine or propyleneimine is preferable. , ethyleneimine is more preferred. The polyalkyleneimine is particularly preferably polyethyleneimine. In addition, in polyethyleneimine, it is preferable that the primary amine group contains 10 mol% or more, more preferably 20 mol% or more, and contains More than 30 mol % is more preferable. Examples of commercially available polyethyleneimines include EPOMIN SP-003, SP-006, SP-012, SP-018, SP-200, and P-1000 (manufactured by NIPPON SHOKUBAI CO., LTD.). .

The content of the polyalkyleneimine in the total solid content of the curable composition is preferably 0.1% by mass to 5% by mass. The lower limit is more preferably 0.2 mass % or more, still more preferably 0.5 mass % or more, and particularly preferably 1 mass % or more. The upper limit is more preferably 4.5 mass % or less, still more preferably 4 mass % or less, and particularly preferably 3 mass % or less. In addition, the content of the polyalkyleneimine is preferably 0.5 to 20 parts by mass relative to 100 parts by mass of the pigment. The lower limit is more preferably at least 0.6 parts by mass, still more preferably at least 1 part by mass, and particularly preferably at least 2 parts by mass. The upper limit is more preferably 10 parts by mass or less, and is still more preferably 8 parts by mass or less. The polyalkyleneimine may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜Hardening Accelerator＞ The curable composition of the present disclosure can contain a curing accelerator. Examples of the curing accelerator include thiol compounds, methylol compounds, amine compounds, phosphonium salt compounds, amidine salt compounds, amide compounds, base generators, isocyanate compounds, alkoxysilane compounds, onium salt compounds, and the like. Specific examples of the hardening accelerator include compounds described in paragraphs 0094 to 0097 of International Publication No. 2018/056189, compounds described in paragraphs 0246 to 0253 of JP 2015-034963 A, JP 2013 - Compounds described in paragraphs 0186 to 0251 of JP-041165, ionic compounds described in JP-A-2014-055114, compounds described in JP-A-2012-150180, paragraphs 0071-0080, JP-A Alkoxysilane compounds having an epoxy group described in Publication No. 2011-253054, compounds described in paragraphs 0085 to 0092 of Japanese Patent No. 5765059, rings containing carboxyl groups described in Japanese Patent Application Laid-Open No. 2017-036379 Oxygen Hardener etc. The content of the hardening accelerator in the total solid content of the curable composition is preferably 0.3% by mass to 8.9% by mass, more preferably 0.8% by mass to 6.4% by mass.

<Infrared Absorber> The curable composition of the present disclosure may contain an infrared absorber. For example, when an infrared transmission filter is formed using the curable composition of the present disclosure, the wavelength of transmitted light can be shifted to a longer wavelength side for a film obtained by including an infrared absorber in the curable composition. The infrared absorber is preferably a compound having a maximum absorption wavelength on the longer wavelength side than the wavelength of 700 nm. The infrared absorbing agent is preferably a compound having a maximum absorption wavelength in a range from 700 nm to 1800 nm. Also, the ratio A ¹ / ^A 2 of the absorbance A ¹ at a wavelength of 500 nm to the absorbance A ² at the maximum absorption wavelength of the infrared absorber is preferably 0.08 or less, more preferably 0.04 or less.

Examples of infrared absorbers include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, crotonium compounds, Oxygenol compounds, imonium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, amethanimine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfide metal complexes, metal oxides, metal borides, etc. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614 , compounds described in paragraphs 0037-0052 of JP-A-2011-068731 , international publication 2015/ Compounds described in paragraphs 0010 to 0033 of No. 166873, etc. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP-A-2011-208101, compounds described in paragraphs 0060-0061 of JP-A-6065169, WO2016/181987 Compounds described in paragraph 0040 of JP-A-2015-176046, compounds described in paragraph 0072 of International Publication No. 2016/190162, and paragraphs 0196-0228 of JP-A-2016-074649 Compounds described, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in International Publication No. 2017/135359, compounds described in JP-A-2017-114956, JP-A-6197940 Compounds described in , compounds described in International Publication No. 2016/120166, etc. Examples of cyanine compounds include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, JP 2015-172004 Compounds described in Publication No. 2015-172102, Compounds described in Japanese Patent Application Publication No. 2008-088426, Compounds described in Paragraph 0090 of International Publication No. 2016/190162, Japanese Patent Application Laid-Open No. Compounds described in Publication No. 2017-031394, etc. Examples of the crotonium compound include compounds described in JP-A-2017-082029. Examples of iminium compounds include compounds described in JP-A-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, international publications Compounds described in paragraphs 0048 to 0063 of No. 2018/043564. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of JP-A-2012-077153, the oxytitanium phthalocyanine described in JP-A-2006-343631, and the compound described in JP-A-2013-195480. Compounds described in paragraphs ～0029, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, vanadium phthalocyanine compounds described in International Publication No. 2020/071486, phthalocyanine compounds described in International Publication No. 2020/071470 . As a naphthalocyanine compound, the compound described in paragraph 0093 of Unexamined-Japanese-Patent No. 2012-077153 is mentioned. Examples of the disulfide metal complexes include compounds described in Japanese Patent No. 5733804 . Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details of tungsten oxide, paragraph 0080 of JP-A-2016-006476 can be referred to, and this content is incorporated in this specification. Lanthanum boride etc. are mentioned as a metal boride. Commercially available lanthanum borides include LaB ₆ -F (manufactured by Japan New Metals Co., Ltd.) and the like. In addition, as the metal boride, the compound described in International Publication No. 2017/119394 can also be used. As a commercial item of indium tin oxide, F-ITO (made by DOWA HIGHTECH CO., LTD.) etc. are mentioned.

In addition, as an infrared absorber, the squarylium compound described in JP-A-2017-197437, the squarylium compound described in JP-A-2017-025311, and the squaraine compound described in JP-A-2016/154782 can also be used. The squarylium compound described in Japanese Patent No. 5884953, the squarylium compound described in Japanese Patent No. 6036689, the squaraine compound described in Japanese Patent No. 5810604, the international The squaraine compound described in paragraphs 0090 to 0107 of Publication No. 2017/213047, the pyrrole ring-containing compound described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, and the 0078 Pyrrole ring-containing compounds described in paragraphs 0082 to 0082, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP-A-2018-002773, acylic acid compounds described in paragraphs 0024-0086 of JP-A-2018-041047 A squaraine compound having an aromatic ring at the amine α-position, an amide-linked squaraine compound described in JP-A-2017-179131, and a squaraine compound having a pyrrole double type described in JP-A-2017-141215 Skeleton or crotonium skeleton compound, dihydrocarbazole double-type squaraine compound described in JP-A-2017-082029, asymmetric type described in paragraphs 0027-0114 of JP-A-2017-068120 Compound, pyrrole ring-containing compound (carbazole type) described in JP-A-2017-067963, phthalocyanine compound described in JP-A-6251530, paragraphs 0144-0146 of International Publication No. 2021/049441 compounds etc.

The content of the infrared absorber in the total solid content of the curable composition is preferably 1% by mass to 40% by mass. The lower limit is more preferably 2% by mass or more, still more preferably 5% by mass or more, and particularly preferably 10% by mass or more. The upper limit is more preferably at most 30% by mass, and more preferably at most 25% by mass. The curable composition of this disclosure may contain only one kind of infrared absorbing agent, or may contain two or more kinds. When two or more types of infrared absorbers are included, the total amount of these is preferably within the above range.

＜UV absorbers＞ The curable composition of the present disclosure can contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, amino diene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriene compounds, indoles Indole compounds, three 𠯤 compounds, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of JP 2009-217221 , paragraphs 0052 to 0072 of JP 2012-208374 , and paragraphs 0317 to 0072 of JP 2013-068814 . Paragraph 0334 and the compounds described in paragraphs 0061 to 0080 of JP-A-2016-162946 are incorporated in this specification. Examples of commercially available ultraviolet absorbers include UV-503 (manufactured by DAITO CHEMICAL CO., LTD.), Tinuvin series and Uvinul series produced by BASF Corporation, Sumika Chemtex Company Sumisorb series, and the like. Moreover, as a benzotriazole compound, MYUA series by MIYOSHI OIL & FAT CO., LTD. is mentioned (Chemical Industry Daily, February 1, 2016). In addition, as the ultraviolet absorber, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, compounds described in paragraphs 0059 to 0076 of International Publication No. 2016/181987, and compounds described in International Publication No. 2020/137819 can also be used. A thioaryl substituted benzotriazole type UV absorber. The content of the ultraviolet absorber in the total solid content of the curable composition is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass. The ultraviolet absorber may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜Polymerization inhibitor＞ The curable composition of the present disclosure can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, gallicol, tertiary butylcatechol, benzoquinone, 4,4'-thio Bis(3-methyl-6-tertiary butylphenol), 2,2'-methylene bis(4-methyl-6-tertiary butylphenol), N-nitrosophenyl hydroxylamine salt ( ammonium salt, first cerium salt, etc.). Among them, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the curable composition is preferably 0.0001% by mass to 5% by mass. A polymerization inhibitor may be only 1 type, and may be 2 or more types. In the case of 2 or more, it is preferable that the total amount of these is within the said range.

＜Silane coupling agent＞ The curable composition of the present disclosure can contain a silane coupling agent. In this disclosure, a silane coupling agent refers to a silane compound having a hydrolyzable group and other functional groups. Also, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group, and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)allyl groups, (meth)acryl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, Urea group, thioether group, isocyanate group, phenyl group, etc., amine group, (meth)acryl group and epoxy group are preferred. Specific examples of the silane coupling agent include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-602), N-β-aminoethyl-γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-603), N-β-aminoethyl-γ-amine propyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBE-602), γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-903), γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBE-903), 3-methacryloxypropylmethyl dimethyl Oxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-502), 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product name KBM-503), etc. Also, specific examples of silane coupling agents include compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703 and compounds described in paragraphs 0056-0066 of JP-A-2009-242604. etc. are included in this manual. The content of the silane coupling agent in the total solid content of the curable composition is preferably 0.01% by mass to 15.0% by mass, more preferably 0.05% by mass to 10.0% by mass. Only 1 type may be sufficient as a silane coupling agent, and 2 or more types may be sufficient as it. In the case of 2 or more, it is preferable that the total amount of these is within the said range.

＜Surfactant＞ The curable composition of the present disclosure can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane-based surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Regarding the surfactant, the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015/166779 can be referred to, and the content is incorporated in this specification.

The fluorine content in the fluorine-based surfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, particularly preferably 7% by mass to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in uniformity of coating film thickness and liquid-saving properties, and has good solubility in curable compositions.

Examples of fluorine-based surfactants include those described in paragraphs 0060 to 0064 of JP-A-2014-041318 (corresponding to paragraphs 0060-0064 of International Publication No. 2014/017669), etc., JP-A The surfactants described in Paragraphs 0117 to 0132 of Publication No. 2011-132503 and the surfactants described in Japanese Patent Application Laid-Open No. 2020-008634 are incorporated in this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F -144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F -560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41 , R-41-LM, RS-43, R-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above are manufactured by DIC Corporation), FLUORAD FC430, FC431, FC171 (The above are manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 ( The above are made by AGC INC.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are made by OMNOVA SOLUTIONS INC.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FT x -218 (the above are manufactured by NEOS COMPANY LIMITED), etc.

The fluorine-based surfactant can also preferably use an acrylic compound that has a molecular structure including a functional group containing a fluorine atom, and when heated, the portion of the functional group containing a fluorine atom is cut off and the fluorine atom volatilizes. . Examples of such fluorine-based surfactants include MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), for example, MEGAFACE DS-21.

It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. Examples of such fluorine-based surfactants include fluorine-based surfactants described in JP-A-2016-216602, which are incorporated in this specification.

A block polymer can also be used as a fluorine-type surfactant. The fluorine-based surfactant can also preferably use a fluorine-containing polymer compound, which contains: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; It is preferably a repeating unit of (meth)acrylate compound having 5 or more) alkyleneoxy groups (preferably ethyleneoxy, propyleneoxy). In addition, the fluorine-containing surfactant described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorine-based surfactant used in the present disclosure.

[chemical formula 43]

The weight average molecular weight of the above-mentioned compound is preferably 3,000-50,000, for example, 14,000. In the above-mentioned compounds, % representing the ratio of repeating units is mole %.

In addition, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated group in a side chain can also be used. Specific examples include compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP-A-2010-164965, MEGAFACE RS-101, RS-102, RS-718K, RS-72- K et al. Moreover, the compound described in paragraph 0015-0158 of Unexamined-Japanese-Patent No. 2015-117327 can also be used as a fluorine-type surfactant.

In addition, it is also preferable from the viewpoint of environmental control to use the surfactant described in International Publication No. 2020/084854 as a substitute for a surfactant having a perfluoroalkyl group having 6 or more carbon atoms.

Furthermore, it is also preferable to use a fluoroimide salt-containing compound represented by the formula (fi-1) as a surfactant.

[chemical formula 44]

In formula (fi-1), m represents 1 or 2, n represents an integer of 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, Quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propane Oxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl ether Phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF Corporation), Tetronic 304, 701, 704, 901, 904, 150R1 (by BASF Corporation), SOLSPERSE 20000 (by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (by FUJIFILM Wako Pure Chemical Corporation), PIONIN D- 6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

Examples of polysiloxane-based surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (manufactured by Dow Corning Toray Co., Ltd.), TSF- 4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (the above are Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (manufactured by BYK-Chemie GmbH), etc.

Moreover, the compound of the following structure can also be used for a polysiloxane type surfactant.

[chemical formula 45]

The content of the surfactant in the total solid content of the curable composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. Surfactant may be only 1 type, and may be 2 or more types. In the case of 2 or more, it is preferable that the total amount of these is within the said range.

＜Antioxidant＞ The curable composition of the present disclosure can contain an antioxidant. As an antioxidant, a phenolic compound, a phosphite compound, a thioether compound, etc. are mentioned. As the phenolic compound, any phenolic compound known as a phenolic antioxidant can be used. A hindered phenol compound is mentioned as a preferable phenol compound. A compound having a substituent at a position adjacent to the phenolic hydroxyl group (ortho position) is preferred. As the above-mentioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable. Moreover, it is also preferable that an antioxidant is a compound which has a phenol group and a phosphite group in the same molecule. Moreover, phosphorus antioxidant can also be used preferably as an antioxidant. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphine-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tertiary butyldibenzo[d,f] [1,3,2]dioxaphosphine-2-yl)oxy]ethyl]amine, bis(2,4-di-tertiary-butyl-6-methylphenylphosphite ) ethyl ester etc. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60, and ADEKA STAB AO-60. STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330 (the above are manufactured by ADEKA CORPORATION), etc. In addition, as an antioxidant, compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017/006600, compounds described in International Publication No. 2017/164024, Korean Laid-Open Patent Compounds described in Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the curable composition is preferably 0.01% by mass to 20% by mass, more preferably 0.3% by mass to 15% by mass. Antioxidant may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜Other ingredients＞ The curable composition disclosed herein may contain sensitizers, hardening accelerators, fillers, thermosetting accelerators, plasticizers, and other additives (for example, conductive particles, defoamers, flame retardants, leveling agents, etc.) agents, peel accelerators, fragrances, surface tension regulators, chain transfer agents, etc.). Properties such as membrane physical properties can be adjusted by appropriately containing these components. Regarding these components, for example, reference can be made to the descriptions in paragraphs 0183 and later of Japanese Patent Application Publication No. 2012-003225 (corresponding to paragraph 0237 of US Patent Application Publication No. 2013/0034812 specification), and the descriptions in Japanese Patent Application Publication No. 2008-250074. 0101-0104, 0107-0109, etc., these contents are incorporated into this specification. Moreover, the curable composition of this disclosure may contain a latent antioxidant as needed. Examples of potential antioxidants include compounds in which the site functioning as an antioxidant is protected by a protecting group and protected by heating at 100°C to 250°C or heating at 80°C to 200°C in the presence of an acid/alkali catalyst free radicals and act as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219. As a commercial item of a latent antioxidant, ADEKA ARKLS GPA-5001 (made by ADEKA CORPORATION) etc. are mentioned.

The curable composition of the present disclosure may contain metal oxides to adjust the refractive index of the resulting film. Examples of metal oxides include TiO ₂ , ZrO ₂ , Al ₂ O ₃ , SiO ₂ and the like. The primary particle size of the metal oxide is preferably from 1 nm to 100 nm, more preferably from 3 nm to 70 nm, and still more preferably from 5 nm to 50 nm. Metal oxides may have a core-shell structure. Also, at this time, the core portion may be hollow.

The curable composition of the present disclosure may contain a light resistance improver. Examples of light resistance improvers include compounds described in paragraphs 0036 to 0037 of JP-A-2017-198787, compounds described in paragraphs 0029-0034 of JP-A-2017-146350, compounds described in JP-A-2017-146350, Compounds described in paragraphs 0036 to 0037 and 0049 to 0052 of Japanese Patent Application Laid-Open No. 129774, compounds described in paragraphs 0031 to 0034 and 0058 to 0059 of Japanese Patent Application Laid-Open No. 2017-129674, and compounds described in paragraphs 0036 to 0058 of Japanese Patent Application Laid-Open No. 2017-122803 0037, compounds described in paragraphs 0051 to 0054, compounds described in paragraphs 0025 to 0039 of International Publication No. 2017/164127, compounds described in paragraphs 0034 to 0047 of JP 2017-186546 A, JP 2015 - Compounds described in paragraphs 0019 to 0041 of Japanese Patent Application Laid-Open No. 025116, compounds described in paragraphs 0101 to 0125 of Japanese Patent Application Laid-Open No. 2012-145604, compounds described in paragraphs 0018 to 0021 of Japanese Patent Application Laid-Open No. 2012-103475, Compounds described in paragraphs 0015 to 0018 of JP-A-2011-257591, compounds described in paragraphs 0017-0021 of JP-A-2011-191483, and paragraphs 0108-0116 of JP-A-2011-145668 Compounds described, compounds described in paragraphs 0103 to 0153 of JP-A-2011-253174, and the like.

It is also preferable that the curable composition of the present disclosure does not substantially contain terephthalate. Here, "substantially not containing" means that the content of terephthalate in the total amount of the curable composition is 1000 mass ppb or less, more preferably 100 mass ppb or less, and particularly preferably zero.

From the viewpoint of environmental control, the use of perfluoroalkane sulfonic acids and their salts and perfluoroalkyl carboxylic acids and their salts are sometimes regulated. In the curable composition of the present disclosure, when the content of the above-mentioned compounds is reduced, perfluoroalkylsulfonic acid (especially, perfluoroalkyl having 6 to 8 carbon atoms) Perfluoroalkyl sulfonic acid) and its salts, and perfluoroalkyl carboxylic acids (especially perfluoroalkyl carboxylic acids with 6 to 8 carbon atoms in the perfluoroalkyl group) and their salts in a content rate of 0.01ppb to 1,000 The range of ppb is preferable, the range of 0.05ppb to 500ppb is more preferable, and the range of 0.1ppb to 300ppb is still more preferable. The curable composition of the present disclosure may also substantially not contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt. For example, by using compounds that can be substitutes for perfluoroalkylsulfonic acids and their salts and compounds that can be substitutes for perfluoroalkylcarboxylic acids and their salts, it is also possible to select compounds that do not substantially contain perfluoroalkyl groups. Hardening compositions of sulfonic acids and their salts and perfluoroalkylcarboxylic acids and their salts. Examples of compounds that can serve as substitutes for regulated compounds include compounds that are excluded from control targets due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above does not prevent the use of perfluoroalkylsulfonic acids and their salts and perfluoroalkylcarboxylic acids and their salts. The curable composition of the present disclosure may also contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt within the maximum allowable range.

The water content of the curable composition disclosed herein is preferably 3% by mass or less, more preferably 0.01% by mass to 1.5% by mass, and more preferably 0.1% by mass to 1.0% by mass. Moisture content can be determined by the Karl Fischer method.

The curable composition of the present disclosure can be used by adjusting the viscosity for the purpose of adjusting the film surface shape (flatness, etc.), adjusting the film thickness, and the like. The value of the viscosity can be appropriately selected according to needs, for example, at 25° C., 0.3 mPa·s to 50 mPa·s is preferable, and 0.5 mPa·s to 20 mPa·s is more preferable. As a method for measuring the viscosity, for example, it can be measured using a cone plate (cone plate) type viscometer, in a state where the temperature is adjusted to 25°C. Regarding the curable composition of the present disclosure, from the viewpoints of environmental response, suppression of foreign matter generation, suppression of device contamination, etc., the amount of chloride ions in the curable composition is preferably 10,000 ppm or less, more preferably 1000 ppm or less. In order to make the chloride ions in the curable composition fall within the above range, methods of using a raw material with a low content of chloride ions, methods of removing chloride ions by washing with water, ion exchange resin, filter filtration, etc. are mentioned. As a method for measuring chloride ions, known methods can be used, for example, ion chromatography, combustion ion chromatography, and the like.

＜Containment container＞ The storage container for the present curable composition is not particularly limited, and known storage containers can be used. Also, as a storage container, for the purpose of preventing impurities from mixing into raw materials and curable compositions, it is also preferable to use a multi-layer bottle whose inner wall is composed of 6 types of 6-layer resins, or a bottle with 6 types of resins in a 7-layer structure. . As such a container, the container described in Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example. Furthermore, the inner wall of the container is preferably made of glass, stainless steel, etc. for the purpose of preventing elution of metal from the inner wall of the container, improving storage stability of the curable composition, or suppressing deterioration of components.

<Preparation method of curable composition> The curable composition of the present disclosure can be prepared by mixing the aforementioned components. When preparing a curable composition, all components can be dissolved and/or dispersed in a solvent at the same time to prepare a curable composition, or each component can be appropriately divided into two or more solutions or dispersions as needed, and used These are mixed at the time (at the time of coating) to prepare a curable composition.

Also, when preparing the curable composition, the process including dispersing the pigment is preferable. In the pigment dispersion process, examples of the mechanical force used to disperse the pigment include compression, extrusion, impact, shearing, and pitting. Specific examples of these processes include bead milling, sand milling, roller milling, ball milling, paint stirring, micro jets, high-speed impellers, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, in the pulverization of the pigment in a sand mill (bead mill), it is preferable to process under the conditions that the pulverization efficiency is improved by using small-diameter beads, increasing the filling rate of the microbeads, and the like. Also, after pulverization, it is preferable to remove coarse particles by filtration, centrifugation, or the like. Also, regarding the pigment dispersion process and dispersing machine, it is preferable to use "Compendium of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Suspension (solid/liquid dispersion system) as the center Dispersion Technology and Industrial Practical Application Comprehensive Information Collection, Issued by the Publishing Department of the Management and Development Center, October 10, 1978", the process and dispersion machine recorded in paragraph 0022 of Japanese Patent Application Laid-Open No. 2015-157893. In addition, in the pigment dispersion process, the particles can be miniaturized through the salt milling step. For example, materials, devices, and processing conditions used in the salt milling step can refer to the descriptions in JP-A-2015-194521 and JP-A-2012-046629. As beads for dispersion, zirconia, agate, quartz, titanium dioxide, tungsten carbide, silicon nitride, alumina, stainless steel, glass, or combinations thereof can be used. Moreover, the inorganic compound whose Mohs' hardness is 2 or more can be used. The above-mentioned beads may be included in the composition at 1 to 10000 ppm.

When preparing a curable composition, it is preferable to filter the curable composition with a filter in order to remove foreign substances, reduce defects, and the like. As a filter, if it is a filter conventionally used for a filtration use etc., it can use without limitation in particular. For example, fluorine resins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (such as nylon-6, nylon-6,6), polyethylene, polypropylene ( PP) and other polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins) and other materials. Among these materials, polypropylene (including high density polypropylene) and nylon are preferred.

The pore size of the filter is preferably from 0.01 μm to 7.0 μm, more preferably from 0.01 μm to 3.0 μm, and still more preferably from 0.05 μm to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore diameter value of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by Nihon Pall Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, and the like can be used.

Moreover, it is also preferable to use a fibrous filter material as a filter. As a fibrous filter medium, a polypropylene fiber, a nylon fiber, a glass fiber etc. are mentioned, for example. Examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, different filters (for example, a 1st filter and a 2nd filter, etc.) can be combined. At this time, the filtration using each filter may be performed only once, or may be performed two or more times. Also, filters with different pore diameters may be combined within the above range. In addition, the filtration using the first filter is performed only on the dispersion liquid, and the second filter may be used for filtration after mixing other components. In addition, the filter can be appropriately selected according to the hydrophilicity and hydrophobicity of the composition.

(hardened material and film) The cured product of the present disclosure is a cured product obtained by curing the curable composition of the present disclosure. The film of the present disclosure is a film obtained from the curable composition of the present disclosure, preferably a film obtained by curing the curable composition of the present disclosure. The film of the present disclosure can be used for filters such as color filters, infrared transmission filters, and the like. In particular, specifically, it is a colored pixel that can be preferably used as a color filter. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels, among which green pixels and blue pixels are preferable, and green pixels are still more preferable.

The film thickness of the film disclosed herein can be appropriately adjusted according to the purpose, and is preferably 0.1 μm to 20 μm. The upper limit of the film thickness is more preferably 10 μm or less, further preferably 5 μm or less, particularly preferably 3 μm or less, most preferably 1.5 μm or less. The lower limit of the film thickness is more preferably 0.2 μm or more, and more preferably 0.3 μm or more.

(Method for producing cured product and method for producing film) The method for producing the cured product of the present disclosure and the method for producing the film of the present disclosure are not particularly limited, but preferably include a step of irradiating the curable composition of the present disclosure with light having a wavelength of 150 nm to 300 nm. Examples of light having a wavelength of 150 nm to 300 nm include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and the like. In addition, it is preferable that the light with a wavelength of 150 nm to 300 nm is an excimer laser. The shape of the obtained cured product is not particularly limited, but a film shape is preferred.

The film of the present disclosure can be produced through the step of coating the curable composition of the present disclosure on a support. It is preferable that the film manufacturing method further includes a step of forming a pattern (pixel). As a method for forming a pattern (pixel), photolithography and dry etching are mentioned, and photolithography is preferred.

Pattern formation based on photolithography includes the steps of forming a curable composition layer on a support using the curable composition disclosed herein, exposing the curable composition layer in a pattern, and developing and removing the curable composition layer. The step of forming a pattern (pixel) of the unexposed part is preferable. A step of baking the curable composition layer (pre-baking step) and a step of baking the developed pattern (pixel) (post-baking step) may also be provided as needed.

In the step of forming the curable composition layer, the curable composition layer of the present disclosure is used to form the curable composition layer on the support. It does not specifically limit as a support body, It can select suitably according to a use. For example, a glass substrate, a silicon substrate, etc. are mentioned, and a silicon substrate is preferable. In addition, a charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, and the like may be formed on the silicon substrate. Also, sometimes a black matrix is formed on the silicon substrate to isolate each pixel. In addition, an underlayer may be provided on the silicon substrate in order to improve the adhesion with the upper layer, prevent the diffusion of substances, or flatten the surface of the substrate. The base layer can be formed using a composition obtained by removing a colorant from a curable composition described in this specification, a composition including a resin described in this specification, a polymerizable compound, a surfactant, and the like. When measured with diiodomethane, the surface contact angle of the base layer is preferably 20° to 70°. Also, when measured with water, 30° to 80° is preferable.

As a coating method of the curable composition, known methods can be used. For example, drop casting method (drop casting: drop cast); slit coating method; spray method; roll coating method; spin coating method (spin coating); Wet method (for example, the method described in Japanese Patent Laid-Open No. 2009-145395); inkjet (for example, drop-on-demand method, piezoelectric method, thermal method), jet printing such as nozzle jetting, flexographic printing, screen printing, Various printing methods such as gravure printing, reverse offset printing, and metal mask printing; transfer printing using molds, etc.; nanoimprinting, etc. There are no particular limitations on the method of application to inkjet, and examples include "Inkjet Expansion and Use - Unlimited Possibilities Appearing in Patents - Issued in February 2005, Sumitbe Techon Research Co., Ltd." The method shown (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, The method described in Japanese Unexamined Patent Publication No. 2006-169325 and the like. In addition, regarding the coating method of the curable composition, reference can be made to the descriptions in International Publication No. 2017/030174 and International Publication No. 2017/018419, and these contents are incorporated in this specification.

The curable composition layer formed on the support may be dried (prebaked). Pre-baking may not be performed when a film is manufactured by a low-temperature process. When performing prebaking, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and still more preferably 110°C or lower. The lower limit may be, for example, 50°C or higher, or may be 80°C or higher. The prebaking time is preferably from 10 seconds to 300 seconds, more preferably from 40 seconds to 250 seconds, and still more preferably from 80 seconds to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

Next, the curable composition layer is exposed in a pattern (exposure step). For example, by exposing the curable composition layer through a mask having a predetermined mask pattern using a stepper, a scanning exposure machine, etc., it is possible to expose in a pattern form. Thereby, the exposed portion can be hardened.

Examples of radiation (light) that can be used for exposure include g-rays, i-rays, and the like. In addition, light having a wavelength of 300 nm or less (preferably light having a wavelength of 150 nm to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a long-wavelength light source of 300 nm or more can also be used.

Moreover, at the time of exposure, exposure may be performed by continuously irradiating light, or may be performed by performing pulsed irradiation (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly for a short period of time (eg, millisecond order or less) to perform exposure.

The amount of irradiation (exposure amount) is, for example, preferably 0.03 J/cm ² to 2.5 J/cm ² , more preferably 0.05 J/cm ² to 1.0 J/cm ² . The oxygen concentration at the time of exposure can be appropriately selected. In addition to performing the exposure in the atmosphere, for example, the exposure can also be performed in a low-oxygen environment (for example, 15 volume %, 5 volume % or substantially no oxygen) with an oxygen concentration of 19 volume % or less. , and exposure can also be performed under a high oxygen environment (for example, 22 volume %, 30 volume % or 50 volume %) where the oxygen concentration exceeds 21 volume %. In addition, the exposure illuminance can be appropriately set, and usually can be selected from the range of 1000 W/m ² to 100,000 W/m ² (for example, 5,000 W/m ² , 15,000 W/m ² , or 35,000 W/m ² ). Conditions of oxygen concentration and exposure illuminance can be appropriately combined, for example, the oxygen concentration is 10 vol % and the illuminance is 10000 W/m ² , and the oxygen concentration is 35 vol % and the illuminance is 20000 W/m ² .

Next, unexposed portions of the curable composition layer are removed by development to form a pattern (pixel). The development and removal of the unexposed portion of the curable composition layer can be performed using a developing solution. Thereby, the curable composition layer in the unexposed portion in the exposure step is eluted into the developing solution, and only the photocured portion remains. For example, the temperature of the developer is preferably 20°C to 30°C. The development time is preferably 20 seconds to 180 seconds. Also, in order to improve the residue removal performance, the step of shaking off the developing solution every 60 seconds and then supplying a new developing solution may be repeated several times.

As a developing solution, an organic solvent, an alkali developing solution, etc. are mentioned, and an alkali developing solution can be used preferably. As the alkaline developing solution, an alkaline aqueous solution (alkali developing solution) obtained by diluting the alkaline agent with pure water is preferable. Examples of alkaline agents include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethyleneglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide , Tetrapropylammonium Hydroxide, Tetrabutylammonium Hydroxide, Ethyltrimethylammonium Hydroxide, Benzyltrimethylammonium Hydroxide, Dimethylbis(2-Hydroxyethyl)ammonium Hydroxide, Choline , pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate , sodium metasilicate and other inorganic alkaline compounds. From the viewpoint of environment and safety, it is preferable that the alkali agent is a compound with a large molecular weight. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 1% by mass. In addition, the developer may further contain a surfactant. From the viewpoint of convenient transportation and storage, the developer solution can be made into a concentrated solution first and then diluted to the required concentration when used. The dilution ratio is not particularly limited, and can be set, for example, within a range of 1.5 times to 100 times. Moreover, it is also preferable to wash (rinse) with pure water after image development. Moreover, it is preferable to perform rinsing by supplying a rinsing solution to the developed curable composition layer while rotating the support on which the developed curable composition layer is formed. Moreover, it is also preferable to carry out by moving the nozzle which ejects a rinsing liquid from the center part of a support body to the peripheral part of a support body. At this time, when moving the nozzle from the central portion of the support to the peripheral portion, the nozzle can be moved while gradually reducing the moving speed. By performing rinsing in this way, in-plane unevenness of rinsing can be suppressed. Also, the same effect can be obtained by gradually reducing the rotational speed of the support while moving the nozzle from the center portion of the support to the peripheral portion.

After image development, it is preferable to perform additional exposure processing and heat processing (post-baking) after performing drying. Additional exposure treatment and post-baking are hardening treatments after development to make fully hardened ones. The heating temperature in the post-baking is, for example, preferably 100°C to 240°C, more preferably 200°C to 240°C. The film after development can be post-baked continuously or batchwise using a heating mechanism such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so as to satisfy the above conditions. When additional exposure processing is performed, light used for exposure is preferably light having a wavelength of 400 nm or less. Also, the additional exposure treatment can be performed by the method described in Korean Laid-Open Patent No. 10-2017-0122130.

It is preferable that the pattern formation by the dry etching method includes the steps of: using the curable composition of the present disclosure to form a curable composition layer on a support, and curing the curable composition layer as a whole to form a cured layer , the step of forming a photoresist layer on the hardened layer, the step of pattern-exposing the photoresist layer and then developing to form a photoresist pattern, using the photoresist pattern as a mask, and drying the hardened layer with etching gas Etching step. When forming the photoresist layer, it is preferable to further perform pre-baking treatment. In particular, as a formation process of the photoresist layer, a form in which heat treatment after exposure and heat treatment after development (post-baking treatment) are performed is preferable. Regarding the content of forming a pattern by the dry etching method, the description in paragraphs 0010 to 0067 of JP-A-2013-064993 can be referred to, and the content is incorporated in this specification.

(Optical element) The optical element of the present disclosure has the film of the present disclosure. Examples of optical elements include optical filters, lenses, lenses, reflection mirrors, and diffraction gratings. Among them, an optical filter is preferably used. As a kind of optical filter, a color filter, an infrared transmission filter, etc. are mentioned, and a color filter is preferable. The color filter preferably has the film of the present disclosure as its colored pixels.

In an optical filter, the film thickness of the film of this disclosure can be adjusted suitably according to the purpose. The film thickness is preferably at most 20 μm, more preferably at most 10 μm, and still more preferably at most 5 μm. The lower limit of the film thickness is preferably at least 0.1 μm, more preferably at least 0.2 μm, and still more preferably at least 0.3 μm.

The width of the pixels included in the filter is preferably 0.4 μm to 10.0 μm. The lower limit is more preferably 0.4 μm or more, still more preferably 0.5 μm or more, and particularly preferably 0.6 μm or more. The upper limit is more preferably 5.0 μm or less, more preferably 2.0 μm or less, particularly preferably 1.0 μm or less, most preferably 0.8 μm or less. In addition, the Young's modulus of the pixel is preferably 0.5 GPa to 20 GPa, more preferably 2.5 GPa to 15 GPa.

It is preferable that each pixel included in the filter has high flatness. Specifically, the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and still more preferably 15 nm or less. The lower limit is not specified, but it is preferably 0.1 nm or more, for example. The surface roughness of a pixel can be measured using AFM (atomic force microscope) Dimension 3100 manufactured by Veeco, for example. In addition, the water contact angle on the pixel can be set to an appropriate preferable value, and is usually in the range of 50° to 110°. For example, the contact angle can be measured using a contact angle meter CV-DT・A type (manufactured by Kyowa Interface Science Co., Ltd.). Moreover, it is preferable that the volume resistance value of a pixel is high. Specifically, the volume resistance value of the pixel is preferably at least 10 ⁹ Ω·cm, more preferably at least 10 ¹¹ Ω·cm. Although the upper limit is not specified, for example, it is preferably 10 ¹⁴ Ω·cm or less. For example, the volume resistance value of the pixel can be measured using an ultrahigh resistance meter 5410 (manufactured by ADVANTEST CORPORATION).

In the optical filter, a protective layer may be provided on the surface of the film of the present disclosure. By providing a protective layer, various functions such as oxidation resistance, low reflection, hydrophilicity and hydrophobicity, and shielding of light of specific wavelengths (ultraviolet rays, near-infrared rays, etc.) can be imparted. The thickness of the protective layer is preferably from 0.01 μm to 10 μm, more preferably from 0.1 μm to 5 μm. The method of forming the protective layer includes a method of applying a product for forming a protective layer, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive material. Examples of components constituting the protective layer include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyethene resins, polyethersulfur resins, polyphenylene resins, Polyaryl ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cycloolefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, Melamine resin, polyurethane resin, aromatic polyamide resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluororesin, polyacrylonitrile resin, cellulose resin, Si, C, W , Al ₂ O ₃ , Mo, SiO ₂ , Si ₂ N ₄ , etc., may contain two or more of these components. For example, in the case of a protective layer for the purpose of preventing oxidation, it is preferable that the protective layer contains polyol resin, SiO ₂ and Si ₂ N ₄ . Moreover, in the case of the protective layer for the purpose of low reflection, it is preferable that the protective layer contains (meth)acrylic resin and fluororesin.

The protective layer may contain additives such as organic/inorganic particles, light absorbers of specific wavelengths (for example, ultraviolet rays, near-infrared rays, etc.), refractive index modifiers, antioxidants, adhesives, and surfactants as needed. Examples of organic/inorganic particles include polymer particles (for example, silicone resin particles, polystyrene particles, melamine resin particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, Titanium nitride, titanium oxynitride, magnesium fluoride, hollow silicon dioxide, silicon dioxide, calcium carbonate, barium sulfate, etc. As the absorber for light of a specific wavelength, known absorbers can be used. The content of these additives can be appropriately adjusted, but is preferably 0.1% by mass to 70% by mass, more preferably 1% by mass to 60% by mass, based on the total mass of the protective layer.

Moreover, as a protective layer, the protective layer described in paragraph 0073-0092 of Unexamined-Japanese-Patent No. 2017-151176 can also be used.

The optical filter may also have a structure in which, for example, each pixel is embedded in a grid-like space partitioned by partition walls.

(image sensor) The image sensor of the present disclosure has the film of the present disclosure. Examples of the image sensor include solid-state imaging elements, X-ray imaging elements, organic thin film imaging elements, and the like. Among them, it can be suitably used in a solid-state imaging device. The solid-state imaging device of the present disclosure includes the film of the present disclosure. The configuration of the solid-state imaging device is not particularly limited as long as it functions as a solid-state imaging device, and examples thereof include the following configurations.

That is, on the substrate, there are a plurality of photodiodes and The transmission electrode composed of polysilicon, etc. has a light-shielding film with only the light-receiving part of the photodiode on the photodiode and the transmission electrode, and has a method on the light-shielding film to cover the entire surface of the light-shielding film and the light-receiving part of the photodiode An element protective film composed of silicon nitride or the like is formed, and a color filter is provided on the element protective film. Furthermore, it is also possible to have a light-condensing mechanism (such as a microlens, etc., the same below) on the element protection film and on the lower side of the color filter (the side closer to the substrate), or have a light-condensing mechanism on the color filter. organization structure, etc. In addition, the color filter may have a structure in which, for example, colored pixels are embedded in a grid-like space partitioned by partition walls. In this case, the refractive index of the partition wall is preferably lower than that of each colored pixel. Examples of imaging devices having such a configuration include devices described in JP-A-2012-227478, JP-A-2014-179577, and WO2018/043654. Also, as shown in JP-A-2019-211559, light resistance can be improved by providing an ultraviolet absorbing layer within the structure of the solid-state imaging device. The imaging device equipped with the solid-state imaging device of the present disclosure can be used not only as a digital camera, an electronic device (mobile phone, etc.) with an imaging function, but also as a car camera and a surveillance camera.

(image display device) The image display device of the present disclosure includes the film of the present disclosure. As an image display device, a liquid crystal display device, an organic electroluminescent display device, etc. are mentioned. The definition of an image display device and the details of each image display device are described, for example, in "Electronic Display Devices (written by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)", "Display Devices (by Shun Ibuki). Chapter, Sangyo Tosho Publishing Co., Ltd., issued in 1989)", etc. Also, liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display devices to which the present disclosure can be applied are not particularly limited, and for example, can be applied to liquid crystal display devices of various types described in the above-mentioned "next-generation liquid crystal display technology".

(radical polymerization initiator represented by formula 1) The radical polymerization initiator of the present disclosure is a radical polymerization initiator represented by Formula 1 below. The radical polymerization initiator disclosed herein is preferably a photoradical polymerization initiator, more preferably a photoradical polymerization initiator that generates free radicals by light with a wavelength of 150 nm to 300 nm.

[chemical formula 46]

In Formula 1, Ar ₁ and Ar ₂ independently represent an aromatic ring, L ₁₁ represents a single bond, L ₁₂ represents a divalent linking group, p1 represents 0 or more and the number of all positions that can be substituted on the aromatic ring in Ar ₁ is -3 The following integers, p2 represents an integer of 0 or more and the number of all substitutable positions on the aromatic ring in _Ar2 is -4 or less, R ₁₁ , R ₁₂ and R ₁₅ independently represent substituents, and R ₁₃ and R ₁₄ independently represent ground represents a hydrogen atom or a substituent, X ₁ represents a single bond O, S or NR ₁₆ , R ₁₆ represents a hydrogen atom or a substituent, Y ₁ represents a single bond or a carbonyl group, two or more of R ₁₂ to R ₁₆ may be bonded and Form a ring.

A preferred aspect of the radical polymerization initiator represented by the formula 1 among the radical polymerization initiators of the present disclosure and a preferred aspect of the radical polymerization initiator represented by the above formula 1 in the curable composition same.

From the viewpoint of outgassing suppression and sensitivity, the free radical polymerization initiator of the present disclosure is preferably a free radical polymerization initiator represented by the following formula 3 or formula 4, represented by the following formula 3 or formula 4 A radical polymerization initiator for excimer laser exposure with a wavelength of 150nm to 300nm is more preferable.

[chemical formula 47]

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ to R ₃₄ may be bonded to form a ring, and R ₃₆ and R ₃₇ may be bonded to form a ring.

[chemical formula 48]

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, In the case of a primary to tertiary amino group, an alkylthio group or an arylthio group, both R ₄₆ and R ₄₇ may be hydrogen atoms.

[chemical formula 49]

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group.

The preferred aspects of formula 3, formula 4, formula I and formula II in the free radical polymerization initiator disclosed herein are compared with formula 3, formula 4, formula I and formula II described above in the curable composition Good looks are the same. [Example]

Hereinafter, an Example is given and this indication is demonstrated in more detail. Materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed as long as they do not deviate from the spirit of the present disclosure. Therefore, the scope of the present disclosure is not limited to the specific examples shown below. Me in the structural formula shown below represents a methyl group, Et represents an ethyl group, and Ph represents a phenyl group. In addition, in the present examples, unless otherwise specified, "%" and "part" mean "mass%" and "mass part", respectively. In addition, the radical polymerization initiators A-1 to A-131 used in the examples are the radical polymerization initiator A-1 described above as a specific example of the radical polymerization initiator represented by Formula 1, respectively. - The same compound as A-131.

＜Synthesis of radical polymerization initiator＞ -Synthesis example 1: Synthesis of radical polymerization initiator A-1- 16.6 g of terpene was added to a 500 mL flask and dissolved in 50 mL of chlorobenzene. This was cooled to 0°C, 14.6 g of aluminum chloride was added, and 12.7 g of 3-chloropropionyl chloride was added dropwise over 30 minutes. The temperature was raised to 25° C., and further stirred for 2 hours. The obtained reaction solution was liquid-separated between 300 mL of ethyl acetate and 200 mL of 1N (=1 mol/L) hydrochloric acid water, and the organic layer was dried with magnesium sulfate, and filtered to distill off the solvent. The obtained mixture was purified by column chromatography (hexane/ethyl acetate=8/1) to obtain 17.7 g of 2-(3-chloropropan-1-one)-9H-fluorene (yield: 69 %). In a 100 mL flask, 12.8 g of 2-(3-chloropropan-1-one)-9H-tertilene was dissolved in 30 mL of concentrated sulfuric acid, and heated and stirred at 100° C. for 2 hours. The reaction solution was poured into 300 mL of ice water, and the obtained solid was collected by filtration and dried. Purified by column chromatography (hexane/ethyl acetate=8/1), obtained 9.4 g of 3,9-dihydrocyclopenta[b]fluorene-1(2H)-one (yield: 85 %). In a 200 mL flask, 2.6 g of hydroxylamine hydrochloride and 4.1 g of sodium acetate were added, and dissolved in a mixed solvent of 100 mL of tetrahydrofuran and 10 mL of pure water. 5.9 g of 3,9-dihydrocyclopenta[b]fluorene-1(2H)-one was added, followed by heating and stirring at 50° C. for 12 hours. The crystals obtained by crystallizing the reaction solution with pure water were recrystallized with acetonitrile, thereby obtaining 4.3 g of 3,9-dihydrocyclopenta[b]fluorene-1(2H)-ketoxime (yield: 74 %). Into a 200 mL flask was added 2.4 g of 3,9-dihydrocyclopenta[b]fluorene-1(2H)-ketoxime, and dissolved in 50 mL of ethyl acetate. This was cooled to 0° C., and 1.5 g of triethylamine was added thereto. Further, 1.2 g of acetyl chloride was added dropwise over 30 minutes, followed by further stirring at 25° C. for 2 hours. Liquid separation was performed by ethyl acetate 200mL and pure water 100mL, the organic layer was dried with magnesium sulfate, filtered, and distilled off under reduced pressure to obtain 2.4 g of radical polymerization initiator A-1 (yield is 90%).

-Synthesis example 2: Synthesis of radical polymerization initiator A-4- 50 g of terpene was added to a 1 L flask, and dissolved in 500 mL of tetrahydrofuran (THF). This was cooled to 0° C., and 80.1 g of potassium tertiary butoxide was added in five portions. Furthermore, 88.6 g of 1-bromopropane was dripped at 0 degreeC over 1 hour, it heated up gradually to room temperature, and it stirred at room temperature further for 24 hours. The obtained reaction solution was separated with 1 L of pure water and 1 L of ethyl acetate, and the organic layer was dried over magnesium sulfate and distilled off under reduced pressure to obtain 9,9-dipropylterpineol as orange crystals. 69 g (92% yield). 25 g of 9,9-dipropyl terpene was added to a 500 mL flask, and it was dissolved in 200 mL of chlorobenzene. After cooling this to 0° C. and adding 30 g of aluminum chloride, 20.7 g of 2-bromoisobutyryl bromide was added dropwise over 1 hour, and after returning to room temperature, the mixture was stirred for further 4 hours. The obtained reaction solution was poured into 1 L of ice water, and the precipitated solid was collected by filtration and recrystallized with methanol to obtain 9,9-dipropyl-2-methyl-3,9-dihydrocyclopenta[ b] fennel-1(2H)-one 21.5 g (70% yield). In a 200 mL flask, 7.8 g of hydroxylamine hydrochloride and 10 g of sodium acetate were added, and dissolved in a mixed solvent of 100 mL of N,N-dimethylacetamide and 50 mL of pure water. 4.9 g of 9,9-dipropyl-2-methyl-3,9-dihydrocyclopenta[b]fluorene-1(2H)-one was added, and it heated and stirred at 50 degreeC for 48 hours. The crystals obtained by crystallizing the reaction solution with pure water were recrystallized with acetonitrile to obtain 9,9-dipropyl-2-methyl-3,9-dihydrocyclopenta[b]terrene-1 (2H)-Ketoxime 4.3 g (83% yield). In a 200 mL flask, 4.3 g of 9,9-dipropyl-2-methyl-3,9-dihydrocyclopenta[b]fluorene-1(2H)-ketoxime was added and dissolved in 50 mL of ethyl acetate. This was cooled to 0° C., and 3.0 g of triethylamine was added thereto. Further, 2.4 g of acetyl chloride was added dropwise over 30 minutes, followed by further stirring at 25° C. for 2 hours. Liquid separation was performed by ethyl acetate 200mL and pure water 100mL, the organic layer was dried with magnesium sulfate, filtered, and distilled off under reduced pressure to obtain 3.9 g of radical polymerization initiator A-4 (yield 87%).

-Synthesis example 3: Synthesis of radical polymerization initiator A-64- In Synthesis Example 1, 3-methyl- 9,9-Dipropyl-3,9-dihydrocyclopenta[b]fluorene-1(2H)-one. 7.2 g of 3-methyl-9,9-dipropyl-3,9-dihydrocyclopenta[b]fluorene-1(2H)-one was added to a 200 mL flask and dissolved in THF. After cooling to 0° C., 5.1 g of a sodium methoxide methanol 28% solution was added, and 3.2 g of isoamyl nitrite was added thereto, followed by stirring at 0° C. for 4 hours. The crystals obtained by crystallizing the reaction solution with pure water were recrystallized with acetonitrile to obtain 2-(hydroxyimino)-3-methyl-9,9-dipropyl-3,9-di Hydrocyclopenta[b]fluorene-1(2H)-one 8.1 g (79% yield). Add 3.5 g of 2-(hydroxyimino)-3-methyl-9,9-dipropyl-3,9-dihydrocyclopenta[b]fluorene-1(2H)-one to a 200 mL flask and dissolve In ethyl acetate 50mL. This was cooled to 0° C., and 1.9 g of triethylamine was added thereto. Further, 1.5 g of acetyl chloride was added dropwise over 30 minutes, followed by further stirring at 25° C. for 2 hours. Liquid separation was performed by ethyl acetate 200mL and pure water 100mL, the organic layer was dried with magnesium sulfate, filtered, and distilled off under reduced pressure to obtain 3.0 g of radical polymerization initiator A-64 (yield was 88%).

-Synthesis example 4: Synthesis method of radical polymerization initiators other than the above- Radical polymerization initiators A-2, A-3, A-5 to A-63, and A-65 to A-131 were obtained in a similar manner to Synthesis Example 1, except that the raw materials were changed.

<Manufacture of Dispersion Liquid> A mixed liquid obtained by mixing the raw materials listed in Table 1 below was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm). Next, dispersion treatment was carried out at a pressure of 2,000 kg/cm ² and a flow rate of 500 g/min using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated a total of 10 times to obtain a dispersion liquid. The numerical values showing the compounding amounts described in the following Table 1 are parts by mass. In addition, the numerical value of the compounding quantity of a dispersing agent is a numerical value in conversion of a solid content.

[Table 1] Colorant Pigment derivatives Resin (dispersant) solvent PR 264 PR 254 PR 291 PO 71 PG 36 PG 58 PY 129 PY 139 PY 185 PY 215 PB 16 PB 15:6 IR pigment ikB Oxynitride Zr Derivative S-1 Derivative S-2 P-1 P-2 P-3 P-4 P-5 S-1 S-2 S-3 Dispersion R1 10.4 - - - - - - - - - - - - - - - 5.6 7.8 - - - - 76.2 - - Dispersion R2 - 12.1 - - - - - - - - - - - - - - 5.6 - 8.2 - - - 65.0 9.1 - Dispersion R3 - - 13.1 - - - - - - - - - - - - - 4.6 - - 10.5 - - - 2.0 69.8 Dispersion R4 - - - 11.5 - - - - - - - - - - - - 5.0 - - - 8.3 - 75.2 - - Dispersion R5 - - - 8.3 - - - - - 3.9 - - - - - 5.2 - - - 8.5 - - 59.8 - 14.3 Dispersion R6 - 15.5 - - - - - 5.3 - - - - - - - - 3.3 - 3.8 - - - 72.1 - - Dispersion R7 - 15.5 - - - - - 5.3 - - - - - - - - - - 7.1 - - - 72.1 - - Dispersion G1 - - - - 13.0 - - - - - - - - - - 5.2 - 9.8 - - - - 72.0 - - Dispersion G2 - - - - - 11.9 - - - - - - - - - 1.2 4.0 - 10.3 - - - 64.8 7.8 - Dispersion G3 - - - - 8.9 - 1.5 - 2.0 - - - - - - 5.2 - - - 10.2 - - 64.8 - 7.4 Dispersion G4 - - - - - 8.9 1.5 - 2.0 - - - - - - - 6.2 - - - 9.7 - 64.8 - 6.9 Dispersion G5 - - - - 8.9 - - - 3.6 - - - - - - - 5.8 - - - - 10.7 64.8 6.2 - Dispersion B1 - - - - - - - - - - 10.1 - - - - 5.3 - 8.7 - - - - 64.8 - 11.1 Dispersion B2 - - - - - - - - - - 10.1 - - - - 5.6 - - 8.9 - - - 64.8 10.6 - Dispersion B3 - - - - - - - - - - 5.0 5.0 - - - - 5.7 - - 7.5 - - 64.8 12.0 - Dispersion B4 - - - - - - - - - - - 10.4 - - - - 5.5 - - - 7.4 - 64.8 - 11.9 Dispersion B5 - - - - - - - - - - - 10.4 - - - - 5.9 - - 6.9 - - 64.8 - 12.0 Dispersion I1 - - - - - - - - - - - - 5.3 - - - 6.3 9.3 - - - - 14.3 - 64.8 Dispersion I2 - - - - - - - - - - - - 6.2 - - 6.6 - - 9.4 - - - - - 77.8 Dispersion I3 - - - - - - - - - - - - 6.6 - - - 4.8 - - 7.3 - - - - 81.3 Dispersion Bk1 5.5 - - - - - - - - - 5.5 - - - - - 5.3 7.1 - - - - 76.6 - - Dispersion Bk2 7.8 - - - - - - - - - 7.0 - - - - - 5.0 - 7.5 - - - 64.8 7.9 - Dispersion Bk3 7.8 - - - - - - - - 1.5 3.5 - - - - 1.2 5.0 - - 7.8 - - 64.8 - 8.4 Dispersion Bk4 - 7.3 - - - - - - - - 3.8 - - - - 6.2 - - - - 7.9 - 64.8 10.0 - Dispersion Bk5 - - 7.3 - - - - - - - 3.8 - - - - 5.2 5.6 - - - - 7.4 70.7 - - Dispersion TBk1 - - - - - - - - - - - - - 16.8 - - 4.9 10.4 - - - - 64.8 3.1 - Dispersion TBk2 - - - - - - - - - - - - - 16.8 - 0.5 5.6 - 10.2 - - - 55.6 - 11.3 Dispersion TBk3 - - - - - - - - - - - - - 7.8 7.8 - 5.2 - - 9.5 - - 55.6 - 14.1 Dispersion TBk4 - - - - - - - - - - - - - - 16.2 1.0 4.2 - - - 11.8 - 66.8 - - Dispersion TBk5 - - - - - - - - - - - - - - 16.2 - 6.2 - - - - 9.2 68.4 - -

The details of the materials represented by the abbreviations in Table 1 representing the formulation of the above dispersion liquid are as follows.

＜Coloring agent＞ PR264: C.I. Pigment Red 264 [diketopyrrolopyrrole compound, red pigment (R pigment)] PR254: C.I. Pigment Red 254 [diketopyrrolopyrrole compound, red pigment (R pigment)] PR291: C.I. Pigment Red 291 [brominated diketopyrrolopyrrole compound, red pigment (R pigment)] PO71: C.I. Pigment Orange 71 [diketopyrrolopyrrole compound, orange pigment (O pigment)] PG36: C.I. Pigment Green 36 [copper phthalocyanine complex, green pigment (G pigment)] PG58: C.I. Pigment Green 58 [zinc phthalocyanine complex, green pigment (G pigment)] PY129: C.I. Pigment Yellow 129 [formimine copper complex, yellow pigment (Y pigment)] PY139: C.I. Pigment Yellow 139 [isoindoline compound, yellow pigment (Y pigment)] PY185: C.I. Pigment Yellow 185 [isoindoline compound, yellow pigment (Y pigment)] PY215: C.I. Pigment Yellow 215 [pteridine compound, yellow pigment (Y pigment)] PB16: C.I. Pigment Blue 16 [metal-free phthalocyanine compound, blue pigment (B pigment)] PB15:6: C.I. Pigment Blue 15:6 [copper phthalocyanine complex, blue pigment (B pigment)] IR pigment: a compound with the following structure (near-infrared absorbing pigment, in the following structural formula, Me represents a methyl group, and Ph represents a phenyl group.)

[chemical formula 50]

TiBk: Titanium black [black pigment (Bk pigment)] Zr Oxynitride: Zirconium Oxynitride [Black Pigment (Bk Pigment)]

＜Pigment Derivatives＞ Derivative S-1: the following compound Derivative S-2: the following compound

[chemical formula 51]

＜Dispersant＞ P-1: 30 mass % propylene glycol monomethyl ether acrylate (PGMEA) solution of the resin of the following structure. The value marked in the main chain is the molar ratio, and the value marked in the side chain is the number of repeating units. Mw: 20,000.

[chemical formula 52]

P-2: 30 mass % PGMEA solution of the resin of the following structure. The value marked in the main chain is the molar ratio, and the value marked in the side chain is the number of repeating units. Mw: 28,000. In the formula, r=15, s=63, t=5, u=17, n=9.

[chemical formula 53]

P-3: 30 mass % PGMEA solution of the resin of the following structure. The value marked in the main chain is the molar ratio, and the value marked in the side chain is the number of repeating units. Mw: 21,000.

[chemical formula 54]

P-4: 30 mass % PGMEA solution of the resin of the following structure. The value marked in the side chain is the number of repeating units. Mw: 9,000.

[chemical formula 55]

P-5: 30 mass % PGMEA solution of the resin of the following structure. The value marked in the side chain is the number of repeating units. Mw: 10,000.

[chemical formula 56]

<Solvent> S-1: Propylene Glycol Monomethyl Ether Acetate (PGMEA) S-2: Propylene Glycol Monomethyl Ether (PGME) S-3: Cyclohexanone

(Examples 1-154, Comparative Examples 1-8] ＜Manufacture of curable composition＞ Mix the dispersions listed in the following Tables 2 to 5, the resins listed in the following Tables 2 to 5, the radical polymerizable compounds listed in the following Tables 2 to 5, and the following Tables 2 to 5. The radical polymerization initiator described, the solvent described in the following Tables 2 to 5, epoxy compound (EHPE-3150, manufactured by Daicel Corporation) 1 part by mass, ultraviolet absorber (TINUVIN326, manufactured by BASF Corporation) 1 part by mass , 1 part by mass of the surfactant 1 shown below, and 0.1 part by mass of the polymerization inhibitor (p-methoxyphenol), the curable compositions of Examples and Comparative Examples were produced, respectively.

Surfactant 1: 1% by mass PGMEA solution of KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd.).

[Table 2] Dispersions resin free radical polymerizable compound Free Radical Polymerization Initiator solvent type parts by mass type parts by mass type parts by mass type parts by mass type parts by mass Example 1 Dispersion R1 44.6 Ba-1 3.0 D-1 5.0 A-1 3.0 S-1 44.4 Example 2 Dispersion R2 44.6 Ba-1 2.0 D-2 10.0 A-2 3.0 S-1 40.4 Example 3 Dispersion R3 46.4 Ba-1 4.0 D-3 4.0 A-3 3.0 S-1 42.6 Example 4 Dispersion R4 44.6 Ba-1 2.0 D-4 3.0 A-4 3.0 S-3 47.4 Example 5 Dispersion R5 43.4 Ba-1 5.0 D-5 3.0 A-5 3.0 S-3 45.6 Example 6 Dispersion G1 48.6 Ba-1 5.0 D-1 3.0 A-6 3.0 S-3 40.4 Example 7 Dispersion G2 45.0 Ba-1 5.0 D-2 3.0 A-7 3.0 S-3 44.0 Example 8 Dispersion G3 45.9 Ba-1 5.0 D-3 5.0 A-8 3.0 S-3 41.1 Example 9 Dispersion G4 47.2 Ba-1 5.0 D-4 5.0 A-9 3.0 S-3 39.8 Example 10 Dispersion G5 43.6 Ba-1 5.0 D-5 4.0 A-10 3.0 S-1 44.4 Example 11 Dispersion B1 46.9 Ba-1 5.0 D-1 4.0 A-11 3.0 S-3 41.1 Example 12 Dispersion B2 45.0 Ba-1 5.0 D-2 4.0 A-12 3.0 S-1 43.0 Example 13 Dispersion B3 45.0 Ba-1 5.0 D-3 3.0 A-13 3.0 S-1 44.0 Example 14 Dispersion B4 45.0 Ba-1 5.0 D-4 3.0 A-14 3.0 S-1 44.0 Example 15 Dispersion B5 45.0 Ba-2 5.0 D-5 2.0 A-15 3.0 S-1 45.0 Example 16 Dispersion I1 42.5 Ba-2 3.0 D-1 5.0 A-16 3.0 S-3 46.5 Example 17 Dispersion I2 42.0 Ba-2 3.0 D-2 5.0 A-17 3.0 S-3 47.0 Example 18 Dispersion I3 45.0 Ba-2 3.0 D-3 5.0 A-18 3.0 S-3 44.0 Example 19 Dispersion Bk1 50.0 Ba-2 3.0 D-4 5.0 A-19 3.0 S-3 39.0 Example 20 Dispersion Bk2 58.0 Ba-2 3.0 D-5 5.0 A-20 3.0 S-3 31.0 Example 21 Dispersion Bk3 47.9 Ba-2 3.0 D-1 5.0 A-21 3.0 S-3 41.1 Example 22 Dispersion Bk4 42.4 Ba-2 3.0 D-2 5.0 A-22 3.0 S-3 46.6 Example 23 Dispersion Bk5 46.7 Ba-2 3.0 D-3 2.0 A-23 3.0 S-3 45.3 Example 24 Dispersion TBk1 45.1 Ba-2 3.0 D-4 5.0 A-24 3.0 S-1 43.9 Example 25 Dispersion TBk2 48.0 Ba-2 4.0 D-5 5.0 A-25 3.0 S-1 40.0 Example 26 Dispersion TBk3 43.8 Ba-2 4.0 D-1 2.0 A-26 3.0 S-1 47.2 Example 27 Dispersion TBk4 44.1 Ba-2 4.0 D-2 5.0 A-27 3.0 S-1 43.9 Example 28 Dispersion TBk5 49.2 Ba-2 4.0 D-3 5.0 A-28 3.0 S-3 38.8 Example 29 Dispersion R1 46.4 Ba-2 3.0 D-4 5.0 A-29 3.0 S-3 42.6 Example 30 Dispersion R2 46.8 Ba-3 3.0 D-5 2.0 A-30 3.0 S-3 45.2 Example 31 Dispersion R3 43.7 Ba-3 3.0 D-1 5.0 A-31 3.0 S-3 45.3 Example 32 Dispersion R4 40.2 Ba-3 3.0 D-2 5.0 A-32 3.0 S-3 48.8 Example 33 Dispersion R5 45.0 Ba-3 3.0 D-3 5.0 A-33 3.0 S-1 44.0 Example 34 Dispersion G1 45.0 Ba-3 3.0 D-4 5.0 A-34 3.0 S-1 44.0 Example 35 Dispersion G2 45.0 Ba-3 3.0 D-5 5.0 A-35 3.0 S-1 44.0 Example 36 Dispersion G3 45.0 Ba-3 3.0 D-1 5.0 A-36 3.0 S-1 44.0 Example 37 Dispersion G4 45.0 Ba-3 3.0 D-2 2.0 A-37 3.0 S-1 47.0 Example 38 Dispersion G5 45.0 Ba-3 3.0 D-3 5.0 A-38 3.0 S-1 44.0 Example 39 Dispersion B1 43.8 Ba-3 3.0 D-4 2.0 A-39 3.0 S-1 48.2 Example 40 Dispersion B2 46.6 Ba-3 3.0 D-5 5.0 A-40 3.0 S-1 42.4 Example 41 Dispersion B3 49.8 Ba-3 3.0 D-1 5.0 A-41 3.0 S-1 39.2 Example 42 Dispersion B4 40.3 Ba-3 3.0 D-2 2.0 A-42 3.0 S-3 51.7 Example 43 Dispersion B5 47.1 Ba-3 3.0 D-3 5.0 A-43 3.0 S-3 41.9 Example 44 Dispersion R2 46.3 Ba-1 12.0 D-4 5.0 A-44 2.0 S-3 34.7 Example 45 Dispersion R3 45.9 Ba-1 8.0 D-5 5.0 A-45 2.0 S-3 39.1

[table 3] Dispersions resin free radical polymerizable compound Free Radical Polymerization Initiator solvent type parts by mass type parts by mass type parts by mass type parts by mass type parts by mass Example 46 Dispersion G3 44.1 Ba-1 8.0 D-1 2.0 A-46 2.0 S-3 43.9 Example 47 Dispersion B5 45.9 Ba-1 8.0 D-2 2.0 A-47 2.0 S-3 42.1 Example 48 Dispersion Bk1 44.6 Ba-1 8.0 D-3 5.0 A-48 2.0 S-3 40.4 Example 49 Dispersion Bk3 44.6 Ba-1 8.0 D-4 5.0 A-49 2.0 S-3 40.4 Example 50 Dispersion TBk2 46.4 Ba-2 8.0 D-5 5.0 A-50 2.0 S-3 38.6 Example 51 Dispersion R2 44.6 Ba-2 5.0 D-1 2.0 A-51 2.0 S-1 46.4 Example 52 Dispersion R3 43.4 Ba-2 5.0 D-2 2.0 A-52 2.0 S-1 47.6 Example 53 Dispersion G3 48.6 Ba-2 5.0 D-3 2.0 A-53 2.0 S-1 42.4 Example 54 Dispersion B5 45.0 Ba-2 5.0 D-4 2.0 A-54 2.0 S-1 46.0 Example 55 Dispersion Bk1 45.9 Ba-2 5.0 D-5 5.0 A-55 2.0 S-1 42.1 Example 56 Dispersion Bk3 47.2 Ba-2 5.0 D-1 2.0 A-56 2.0 S-1 43.8 Example 57 Dispersion TBk2 43.6 Ba-2 10.0 D-2 6.0 A-57 2.0 S-1 38.4 Example 58 Dispersion R2 46.9 Ba-2 5.0 D-3 5.0 A-58 2.0 S-1 41.1 Example 59 Dispersion R3 45.0 Ba-2 5.0 D-4 5.0 A-59 2.0 S-1 43.0 Example 60 Dispersion G3 45.0 Ba-2 5.0 D-5 5.0 A-60 2.0 S-1 43.0 Example 61 Dispersion B5 45.0 Ba-2 5.0 D-1 2.0 A-61 2.0 S-1 46.0 Example 62 Dispersion Bk1 45.0 Ba-2 5.0 D-2 2.0 A-62 2.0 S-1 46.0 Example 63 Dispersion Bk3 42.5 Ba-2 5.0 D-3 2.0 A-63 2.0 S-1 48.5 Example 64 Dispersion TBk2 42.0 Ba-2 5.0 D-4 3.0 A-64 2.0 S-1 48.0 Example 65 Dispersion R2 45.0 Ba-2 5.0 D-5 3.0 A-65 2.0 S-3 45.0 Example 66 Dispersion R3 50.0 Ba-3 8.0 D-1 5.0 A-66 2.0 S-1 35.0 Example 67 Dispersion G3 58.0 Ba-3 8.0 D-2 5.0 A-67 2.0 S-1 27.0 Example 68 Dispersion B5 47.9 Ba-3 8.0 D-3 5.0 A-68 2.0 S-1 37.1 Example 69 Dispersion Bk1 42.4 Ba-3 8.0 D-4 5.0 A-69 2.0 S-1 42.6 Example 70 Dispersion Bk3 46.7 Ba-3 8.0 D-5 5.0 A-70 2.0 S-1 38.3 Example 71 Dispersion TBk2 45.1 Ba-3 8.0 D-1 5.0 A-71 2.0 S-1 39.9 Example 72 Dispersion R2 48.0 Ba-3 8.0 D-2 5.0 A-72 3.0 S-1 36.0 Example 73 Dispersion R3 43.8 Ba-3 8.0 D-3 5.0 A-73 3.0 S-1 40.2 Example 74 Dispersion G3 44.1 Ba-3 8.0 D-4 5.0 A-74 3.0 S-1 39.9 Example 75 Dispersion B5 49.2 Ba-3 8.0 D-5 5.0 A-75 3.0 S-1 34.8 Example 76 Dispersion Bk1 44.6 Ba-3 8.0 D-1 5.0 A-76 3.0 S-1 39.4 Example 77 Dispersion Bk3 44.6 Ba-3 8.0 D-2 5.0 A-77 3.0 S-1 39.4 Example 78 Dispersion TBk2 46.4 Ba-1 5.0 D-3 5.0 A-78 3.0 S-1 40.6 Example 79 Dispersion R2 44.6 Ba-1 5.0 D-4 5.0 A-79 3.0 S-1 42.4 Example 80 Dispersion R3 43.4 Ba-1 5.0 D-5 5.0 A-80 3.0 S-1 43.6 Example 81 Dispersion G3 48.6 Ba-1 5.0 D-1 5.0 A-81 3.0 S-1 38.4 Example 82 Dispersion B5 45.0 Ba-1 5.0 D-2 5.0 A-82 3.0 S-1 42.0 Example 83 Dispersion Bk1 45.9 Ba-1 5.0 D-3 5.0 A-83 3.0 S-1 41.1 Example 84 Dispersion Bk3 47.2 Ba-1 5.0 D-4 5.0 A-84 3.0 S-1 39.8 Example 85 Dispersion TBk2 43.6 Ba-1 5.0 D-5 5.0 A-85 3.0 S-1 43.4 Example 86 Dispersion R2 46.9 Ba-1 5.0 D-1 5.0 A-86 3.0 S-1 40.1 Example 87 Dispersion R3 45.0 Ba-1 5.0 D-2 5.0 A-87 3.0 S-1 42.0 Example 88 Dispersion G3 45.0 Ba-1 5.0 D-3 5.0 A-88 3.0 S-1 42.0 Example 89 Dispersion B5 45.0 Ba-1 5.0 D-4 5.0 A-89 3.0 S-1 42.0 Example 90 Dispersion Bk1 45.0 Ba-1 5.0 D-5 5.0 A-90 3.0 S-1 42.0

[Table 4] Dispersions resin free radical polymerizable compound Free Radical Polymerization Initiator solvent type parts by mass type parts by mass type parts by mass type parts by mass type parts by mass Example 91 Dispersion Bk3 42.5 Ba-1 5.0 D-1 5.0 A-91 3.0 S-1 44.5 Example 92 Dispersion TBk2 42.0 Ba-1 5.0 D-2 5.0 A-92 3.0 S-1 45.0 Example 93 Dispersion R2 45.0 Ba-1 5.0 D-3 5.0 A-93 3.0 S-1 42.0 Example 94 Dispersion R3 50.0 Ba-1 5.0 D-4 5.0 A-94 3.0 S-1 37.0 Example 95 Dispersion G3 58.0 Ba-1 5.0 D-5 5.0 A-95 3.0 S-1 29.0 Example 96 Dispersion B5 47.9 Ba-1 5.0 D-1 5.0 A-96 3.0 S-1 39.1 Example 97 Dispersion Bk1 42.4 Ba-1 5.0 D-2 5.0 A-97 3.0 S-1 44.6 Example 98 Dispersion Bk3 46.7 Ba-1 5.0 D-3 5.0 A-98 3.0 S-1 40.3 Example 99 Dispersion TBk2 45.1 Ba-1 5.0 D-4 5.0 A-99 3.0 S-1 41.9 Example 100 Dispersion R2 48.0 Ba-1 5.0 D-5 5.0 A-100 3.0 S-1 39.0 Example 101 Dispersion R3 43.8 Ba-1 5.0 D-1 5.0 A-101 3.0 S-1 43.2 Example 102 Dispersion G3 44.1 Ba-1 5.0 D-2 5.0 A-102 3.0 S-1 42.9 Example 103 Dispersion B5 49.2 Ba-1 5.0 D-3 5.0 A-103 3.0 S-1 37.8 Example 104 Dispersion Bk1 45.0 Ba-1 5.0 D-4 5.0 A-104 3.0 S-1 42.0 Example 105 Dispersion Bk3 45.9 Ba-1 5.0 D-5 5.0 A-105 3.0 S-1 41.1 Example 106 Dispersion TBk2 47.2 Ba-1 5.0 D-1 5.0 A-106 3.0 S-1 39.8 Example 107 Dispersion R2 43.6 Ba-1 5.0 D-2 5.0 A-107 3.0 S-1 43.4 Example 108 Dispersion R3 46.9 Ba-1 5.0 D-3 5.0 A-108 3.0 S-1 40.1 Example 109 Dispersion G3 45.0 Ba-1 5.0 D-4 5.0 A-109 3.0 S-1 42.0 Example 110 Dispersion B5 45.0 Ba-1 5.0 D-5 5.0 A-110 3.0 S-1 42.0 Example 111 Dispersion Bk1 45.0 Ba-1 5.0 D-1 5.0 A-111 3.0 S-1 42.0 Example 112 Dispersion Bk3 45.0 Ba-1 5.0 D-2 5.0 A-112 3.0 S-1 42.0 Example 113 Dispersion R2 42.5 Ba-1 5.0 D-1 5.0 A-4 3.0 S-1 44.5 Example 114 Dispersion R2 42.0 Ba-1 5.0 D-1 D-3 3.0 2.0 A-7 3.0 S-1 45.0 Example 115 Dispersion R2 45.0 Ba-1 5.0 D-2 D-4 3.0 2.0 A-22 3.0 S-1 42.0 Example 116 Dispersion R2 50.0 Ba-1 5.0 D-1 5.0 A-27 3.0 S-1 37.0 Example 117 Dispersion R2 58.0 Ba-1 5.0 D-1 5.0 A-32 3.0 S-1 29.0 Example 118 Dispersion R2 47.9 Ba-1 5.0 D-1 5.0 A-40 3.0 S-1 39.1 Example 119 Dispersion R2 42.4 Ba-1 5.0 D-1 5.0 A-64 3.0 S-1 44.6 Example 120 Dispersion R2 46.7 Ba-1 5.0 D-1 5.0 A-82 3.0 S-1 40.3 Example 121 Dispersion R2 45.1 Ba-1 5.0 D-1 5.0 A-87 3.0 S-1 41.9 Example 122 Dispersion R2 48.0 Ba-1 5.0 D-1 5.0 A-94 3.0 S-1 39.0 Example 123 Dispersion R2 43.8 Ba-1 5.0 D-1 5.0 A-104 3.0 S-1 43.2 Example 124 Dispersion G3 44.1 Ba-1 5.0 D-1 5.0 A-106a-1 2.0 1.0 S-1 42.9 Example 125 Dispersion G3 49.2 Ba-1 5.0 D-1 5.0 A-4 a-2 1.0 2.0 S-1 37.8 Example 126 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 A-7 3.0 S-1 42.0 Example 127 Dispersion G3 45.9 Ba-1 5.0 D-1 5.0 A-22 3.0 S-1 41.1 Example 128 Dispersion G3 47.2 Ba-1 5.0 D-1 5.0 A-27 3.0 S-1 39.8 Example 129 Dispersion G3 43.6 Ba-1 5.0 D-1 5.0 A-32 3.0 S-1 43.4 Example 130 Dispersion G3 46.9 Ba-1 5.0 D-1 5.0 A-40 3.0 S-1 40.1

[table 5] Dispersions resin free radical polymerizable compound Free Radical Polymerization Initiator solvent type parts by mass type parts by mass type parts by mass type parts by mass type parts by mass Example 131 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 A-38 3.0 S-1 42.0 Example 132 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 A-42 3.0 S-1 42.0 Example 133 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 A-46 3.0 S-1 42.0 Example 134 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 A-50a-3 2.5 0.5 S-1 42.0 Example 135 Dispersion B5 42.5 Ba-1 5.0 D-1 5.0 A-56 3.0 S-1 44.5 Example 136 Dispersion B5 42.0 Ba-1 5.0 D-1 5.0 A-57 3.0 S-1 45.0 Example 137 Dispersion B5 45.0 Ba-1 5.0 D-1 5.0 A-79 3.0 S-1 42.0 Example 138 Dispersion B5 50.0 Ba-1 5.0 D-1 5.0 A-82 3.0 S-1 37.0 Example 139 Dispersion B5 58.0 Ba-1 5.0 D-1 5.0 A-83 3.0 S-1 29.0 Example 140 Dispersion B5 47.9 Ba-1 5.0 D-1 D-5 2.5 2.5 A-86a-4 1.5 1.5 S-1 S-2 29.1 10.0 Example 141 Dispersion B5 42.4 Ba-1 5.0 D-2 D-5 5.0 A-90 3.0 S-1 S-3 34.6 10.0 Example 142 Dispersion B5 46.7 Ba-1 5.0 D-1 5.0 A-94 3.0 S-1 40.3 Example 143 Dispersion B5 45.1 Ba-1 5.0 D-1 5.0 A-92 3.0 S-1 41.9 Example 144 Dispersion B5 48.0 Ba-1 5.0 D-1 5.0 A-82 A-83 1.5 1.5 S-1 39.0 Example 145 Dispersion B5 43.8 Ba-1 5.0 D-1 5.0 A-94 3.0 S-1 43.2 Example 146 Dispersion R6 48.0 Ba-1 5.0 D-1 5.0 A-117 1.5 S-1 40.5 Example 147 Dispersion R6 55.0 Ba-1 5.0 D-1 5.0 A-118 1.0 S-1 34.0 Example 148 Dispersion R6 60.0 Ba-1 5.0 D-1 5.0 A-119 0.8 S-1 29.2 Example 149 Dispersion R6 70.0 Ba-1 5.0 D-1 5.0 A-120 1.0 S-1 19.0 Example 150 Dispersion R6 70.0 Ba-1 3.0 D-1 2.0 A-121 1.0 S-1 24.0 Example 151 Dispersion R6 70.0 Ba-1 3.0 D-1 2.0 A-122 1.0 S-1 24.0 Example 152 Dispersion R6 70.0 Ba-1 3.0 D-1 2.0 A-117 1.0 S-1 24.0 Example 153 Dispersion R6 70.0 Ba-1 3.0 D-1 2.0 A-118 0.5 S-1 24.5 Example 154 Dispersion R7 60.0 Ba-1 5.0 D-1 5.0 A-119 0.8 S-1 29.2 Comparative example 1 Dispersion R2 44.1 Ba-1 5.0 D-1 5.0 CA-1 3.0 S-1 42.9 Comparative example 2 Dispersion R3 49.2 Ba-1 5.0 D-1 5.0 CA-1 3.0 S-1 37.8 Comparative example 3 Dispersion G3 45.0 Ba-1 5.0 D-1 5.0 CA-1 3.0 S-1 42.0 Comparative example 4 Dispersion B5 45.0 Ba-1 5.0 D-1 5.0 CA-1 3.0 S-1 42.0 Comparative Example 5 Dispersion Bk1 45.0 Ba-1 5.0 D-1 5.0 CA-2 3.0 S-1 42.0 Comparative example 6 Dispersion Bk3 45.0 Ba-1 5.0 D-1 5.0 CA-2 3.0 S-1 42.0 Comparative Example 7 Dispersion TBk2 45.0 Ba-1 5.0 D-1 5.0 CA-2 3.0 S-1 42.0 Comparative Example 8 Dispersion R7 60.0 Ba-1 5.0 D-1 5.0 CA-1 0.8 S-1 29.2

The details of the materials indicated by the abbreviations in Tables 2 to 5 representing the formulations of the above-mentioned curable composition other than the above are as follows.

＜Resin＞ Ba-1: Resin with the following structure (the value marked in the main chain is the molar ratio. The weight average molecular weight is 11,000)

[chemical formula 57]

Ba-2: Resin with the following structure (the value marked in the main chain is the molar ratio. The weight average molecular weight is 15,000)

[chemical formula 58]

Ba-3: Resin with the following structure (the value marked in the main chain is the molar ratio. The total value of x, y and z is 50. Mw=15,000)

[chemical formula 59]

＜Radical polymerizable compound＞ D-1: KAYARAD DPHA (6-functional acrylate compound, manufactured by Nippon Kayaku Co., Ltd.) D-2: NK ESTER A-DPH-12E (ethylene oxide (EO) modified 6-functional acrylate compound, manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.) D-3: NK ESTER A-TMMT (4-functional acrylate compound, manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.) D-4: ARONIX M-510 (3-4 functional acrylate compound, manufactured by TOAGOSEI CO., LTD.) D-5: LIGHT ACRYLATE DCP-A (bifunctional alicyclic acrylate compound, manufactured by KYOEISHA CHEMICAL Co.,LTD.)

＜Radical polymerization initiator used at the same time＞ a-1: IRGACURE OXE01, manufactured by BASF Corporation, an oxime ester-based polymerization initiator a-2: IRGACURE OXE02, manufactured by BASF Corporation, an oxime ester-based polymerization initiator a-3: IRGACURE OXE03, manufactured by BASF Corporation, an oxime ester-based polymerization initiator a-4: Omnirad379EG, manufactured by IGM resins B.V, α-aminoacetophenone-based polymerization initiator

＜Radical polymerization initiator for comparison＞ CA-1: The following compound (photopolymerization initiator described in JP-A-2017-61498) CA-2: The following compound (photopolymerization initiator described in JP-A-2014-137466)

[chemical formula 60]

<Evaluation> The following evaluations were performed on each of the curable compositions produced as described above. <<Outgassing (outgassing suppression)>> Each curable composition is coated on a silicon wafer using a spin coater, and then heated at 100°C for 120 seconds using a hot plate (pre-baking) , and a coating film with a film thickness of 1.0 μm was obtained. Next, using an i-ray stepper exposure device FPA-3000iS+ (manufactured by Canon Inc.), exposure was performed at an exposure dose of 400 mJ/cm ² through a mask engraved with a checkerboard pattern of 0.8 μm. Next, the outgassing was collected at 100°C for 1 hour in a vacuum-cleaned oven, and the amount of outgassing was calculated based on the peaks obtained from gas chromatography mass spectrometer (GC/MS). -Evaluation Criteria- A: Outgassing was less than 0.01 ppm. B: Outgassing is at least 0.01 ppm and less than 0.05 ppm C: Outgassing is at least 0.05 ppm and less than 0.10 ppm D: Outgassing is at least 0.10 ppm and less than 1 ppm E: Outgassing is at least 1 ppm.

<<Sensitivity>> Each curable composition was coated on a silicon wafer using a spin coater, and then heated (pre-baked) at 100°C for 120 seconds using a hot plate to obtain a film thickness of 1.0 μm coating film. Next, using the i-ray stepper FPA-3000iS+ (manufactured by Canon Inc.), the range of 50 to 1000 mJ/cm ² was irradiated at a variable rate of 10 mJ/cm ² through a mask engraved with a checkerboard pattern of 0.8 μm. exposure (exposure steps). Next, using a 0.3% aqueous solution of tetramethylammonium hydroxide (TMAH), perform spin-coating and immersion development at 23°C for 60 seconds, and then rinse with pure water for 20 seconds by rotary spraying, and further use pure water. wash. After that, water droplets adhering to the surface of the pattern were removed by blowing air, and the pattern was allowed to dry naturally to obtain a pattern. Regarding the evaluation of sensitivity, the minimum exposure amount (optimum exposure amount) at which the film thickness after development of the area irradiated with light in the above-mentioned exposure step is 95% or more of the film thickness before exposure to 100% is measured, and this is taken as the sensitivity. was evaluated. The smaller the value of the aforementioned minimum exposure amount (best exposure amount), the higher the sensitivity. -Evaluation criteria- A: less than 50mJ/cm ² B: more than 50mJ/cm ² and less than 100mJ/cm ² C: more than 100mJ/cm ² and less than 200mJ/cm ² D: more than 200mJ/cm ² and less than 300mJ/cm ² E: 300mJ/cm ² or more

＜<Adhesion>> Each curable composition was coated on a silicon wafer using a spin coater, and then heated (pre-baked) at 100°C for 120 seconds using a hot plate to obtain a film thickness of 1.0μm coating film. Next, using an i-ray stepper exposure device FPA-3000iS+ (manufactured by Canon Inc.), exposure was performed at an exposure dose of 400 mJ/cm ² through a mask engraved with a checkerboard pattern of 0.8 μm. Next, using a 0.3% aqueous solution of tetramethylammonium hydroxide (TMAH), perform spin-coating and immersion development at 23°C for 60 seconds, and then rinse with pure water for 20 seconds by rotary spraying, and further use pure water. wash. After that, water droplets adhering to the surface of the pattern were removed by blowing air, and the pattern was allowed to dry naturally to obtain a pattern. The patterned silicon wafer was observed by SEM (Scanning Electron Microscope: magnification: 20,000 times), and the ratio of frames with missing patterns in 100 frames of SEM photographs was observed to evaluate the adhesion. The evaluation criteria are as follows. -Evaluation Criteria- A: The ratio of pattern defects was 0%. B: The ratio of pattern missing exceeds 0% and is 10% or less. C: The ratio of pattern lack exceeds 10% and is 20% or less. D: The ratio of pattern missing exceeds 20% and is 50% or less. E: The ratio of lack of patterns exceeds 50%.

＜＜Undercut＞＞ Patterns were formed in the same procedure as in the evaluation of the above-mentioned adhesiveness. The cross-sectional shape of the obtained pattern was observed by SEM (Scanning Electron Microscope: magnification: 20,000 times), and 5 patterns were extracted from the SEM photograph, and the average slope of the cross-section of the 5 patterns was obtained, and evaluated according to the following criteria The cross-sectional shape of the pattern is 1. In addition, the slope of the cross section of the pattern refers to the slope in the thickness direction of the pattern on the silicon wafer in the portion where the pattern is formed. Specifically, the angle of the portion formed by the surface of the silicon wafer and the side in the thickness direction of the pattern was measured. The slope of the pattern exceeds 90 degrees relative to the surface of the silicon wafer, which means that the area of the pattern becomes larger from the side of the silicon wafer toward the surface of the pattern, that is, an edge is formed on the bottom of the pattern, which is not good. -Evaluation criteria- A: The angle exceeds 80 degrees and is 90 degrees or less. B: The angle exceeds 90 degrees and is 100 degrees or less. C: The angle exceeds 100 degrees and is 110 degrees or less. D: The angle exceeds 110 degrees and is 150 degrees or less. E: The angle exceeds 150 degrees.

＜＜Solubility＞＞ 100 g of each curable composition obtained above was put into a plastic container and sealed, stored at 0° C. for 3 months, and then returned to room temperature to check for the presence or absence of precipitates. The stored curable composition was filtered using filter paper (ADVANTEC No. 4A, manufactured by Advantec Toyo Kaisha, Ltd.), and the weight of the precipitate remaining on the filtered filter paper was weighed. -Evaluation criteria- A: Precipitates were not confirmed at all. B: The precipitate was less than 0.1 g. C: The precipitate is 0.1 g or more and less than 0.5 g. D: A precipitate is 0.5 g or more and less than 1.0 g. E: The precipitate is 1.0 g or more.

The evaluation results are collectively shown in Tables 6 to 9.

[Table 6] Evaluation results outgassing sensitivity Closeness undercut Solubility Example 1 A B B C B Example 2 A A B B A Example 3 A A B B A Example 4 A A A B A Example 5 A C B B A Example 6 A C B C A Example 7 A B A B B Example 8 A B B B B Example 9 A B B B B Example 10 A B C C B Example 11 A B B C B Example 12 A A B B A Example 13 A A B B A Example 14 A A B B A Example 15 A A B B A Example 16 A A B C A Example 17 A A B B A Example 18 A A B B A Example 19 A A B C A Example 20 A A B B A Example 21 A A B B A Example 22 A A A B A Example 23 A A C C A Example 24 A A B C A Example 25 A A B B A Example 26 A A B B A Example 27 A A A B A Example 28 A A C C A Example 29 A A B C A Example 30 A A B B A Example 31 A A B B A Example 32 A A A B A Example 33 A A B B A Example 34 A A B B A Example 35 A A B B A Example 36 A A B B A Example 37 A A B B A Example 38 A A C C A Example 39 A A B C A Example 40 A A A B A Example 41 A A B B A Example 42 A A B B A Example 43 A A B B A Example 44 A A B B A Example 45 A A B B A

[Table 7] Evaluation results outgassing sensitivity Closeness undercut Solubility Example 46 A B B B B Example 47 A B B B B Example 48 A B B C B Example 49 A B B B B Example 50 A B B B B Example 51 A B B B B Example 52 A B B B B Example 53 A B B B B Example 54 A A B B A Example 55 A A B C A Example 56 A A B B A Example 57 A A B B A Example 58 A A B B A Example 59 A A B B A Example 60 A A B B A Example 61 B C C C C Example 62 A A B C A Example 63 A A B B A Example 64 A A A B A Example 65 A C B B A Example 66 A C B B A Example 67 B C C C C Example 68 A B B B B Example 69 A B B C B Example 70 A B B B B Example 71 B C C C C Example 72 A A B B A Example 73 A A B B A Example 74 A A B B A Example 75 A A B B A Example 76 A A B C A Example 77 A A B B A Example 78 A A B B A Example 79 A A B B A Example 80 A A B B A Example 81 A A B B A Example 82 A A A B A Example 83 A A B B A Example 84 A A B B A Example 85 A A B B A Example 86 A B B B B Example 87 A B A B B Example 88 A B B B B Example 89 A B B B B Example 90 B B B B C

[Table 8] Evaluation results outgassing sensitivity Closeness undercut Solubility Example 91 A A B B A Example 92 B B B B C Example 93 A A B B A Example 94 B B A B C Example 95 A A B B A Example 96 A A B B A Example 97 A A B C A Example 98 B B B B C Example 99 A A B B A Example 100 B A B B C Example 101 A A B B A Example 102 B B B B C Example 103 A B B B B Example 104 A A A C A Example 105 A A B B A Example 106 A A A B A Example 107 A A B B A Example 108 B C C C C Example 109 A B B B B Example 110 A B B B B Example 111 A B B C B Example 112 B C C C C Example 113 A A A A A Example 114 A A A A A Example 115 A A A A A Example 116 A A A A A Example 117 A A A A A Example 118 A A A A A Example 119 A A A A A Example 120 A A A A A Example 121 A A A A A Example 122 A A A A A Example 123 A A A A A Example 124 A A A A A Example 125 A A A A A Example 126 A A A A A Example 127 A A A A A Example 128 A A A A A Example 129 A A A A A Example 130 A A A A A

[Table 9] Evaluation results outgassing sensitivity Closeness undercut Solubility Example 131 A A A A A Example 132 A A A A A Example 133 A A A A A Example 134 A A A A A Example 135 A A A A A Example 136 A A A A A Example 137 A A A A A Example 138 A A A A A Example 139 A A A A A Example 140 A A A A A Example 141 A A A A A Example 142 A A A A A Example 143 A A A A A Example 144 A A A A A Example 145 A A A A A Example 146 A A A A A Example 147 A A A A A Example 148 A A A A A Example 149 A A A A A Example 150 A A A B A Example 151 A A A B A Example 152 A A A B A Example 153 A B B B A Example 154 A A C C A Comparative example 1 E. D. D. D. D. Comparative example 2 E. D. D. D. D. Comparative example 3 E. D. D. D. D. Comparative example 4 E. D. D. D. D. Comparative Example 5 D. D. D. D. D. Comparative Example 6 D. D. D. D. D. Comparative Example 7 D. D. D. D. D. Comparative Example 8 E. D. E. E. D.

As shown in Tables 6 to 9 above, the curable compositions of the examples had less outgassing from the obtained cured products than the curable compositions of the comparative examples. In addition, as shown in Tables 6 to 9 above, the curable compositions of Examples were also excellent in sensitivity, adhesiveness, undercut suppression, and solubility.

(Example 155) The radical polymerization initiator A-30 (3.0 mass parts) of Example 30 was changed to the radical polymerization initiator A-30 (1.5 mass parts) and the following a-5 (1.5 mass parts), except that , a curable composition was produced and evaluated in the same manner as in Example 30. As a result of the evaluation, all were A.

(Example 156) The radical polymerization initiator A-36 (3.0 mass parts) of Example 36 was changed to the radical polymerization initiator A-36 (1.5 mass parts) and the following a-6 (1.5 mass parts), except that , A curable composition was produced and evaluated in the same manner as in Example 36. As a result of the evaluation, all were A.

(Example 157) The radical polymerization initiator A-40 (3.0 parts by mass) of Example 40 was changed to the radical polymerization initiator A-40 (1.5 parts by mass) and the following a-7 (1.5 parts by mass), except that , a curable composition was produced and evaluated in the same manner as in Example 40. As a result of the evaluation, all were A.

(Example 158) The radical polymerization initiator A-104 (3.0 parts by mass) of Example 123 was changed to the radical polymerization initiator A-104 (1.5 parts by mass) and the following a-7 (1.5 parts by mass), except that , A curable composition was produced and evaluated in the same manner as in Example 123. As a result of the evaluation, all were A.

In addition, a-5 to a-7 are the following compounds.

a-5: a compound represented by the following formula [Chemical Formula 61]

a-6: a compound represented by the following formula [Chemical Formula 62]

a-7: a compound represented by the following formula [Chemical Formula 63]

Even when the curable composition of each Example was irradiated with KrF rays instead of i rays, the same effect was obtained. As the conditions for KrF ray irradiation, for example, exposure light: KrF ray (wavelength: 248nm), exposure amount: 10mJ/cm ² -500mJ/cm ² , maximum instantaneous illuminance: 250,000,000W/m ² (average illuminance: 30,000W /m ² ), pulse width: 30 nanoseconds, frequency: 4kHz.

The disclosures of Japanese Patent Application No. 2021-182791 filed on November 9, 2021 and Japanese Patent Application No. 2022-151758 filed on September 22, 2022 are incorporated herein by reference. All documents, patent applications, and technical specifications described in this specification are incorporated by reference into this specification to the same extent as if each individual document, patent application, and technical specification was specifically and individually indicated to be incorporated by reference.

none

Claims (18)

A curable composition comprising: a radical polymerization initiator represented by the following formula 1; and a radical polymerizable compound,

In Formula 1, Ar ₁ and Ar ₂ independently represent an aromatic ring, L ₁₁ represents a single bond, L ₁₂ represents a divalent linking group, p1 represents 0 or more and the number of all positions that can be substituted on the aromatic ring in Ar ₁ is -3 The following integers, p2 represents an integer of 0 or more and the number of all substitutable positions on the aromatic ring in _Ar2 is -4 or less, R ₁₁ , R ₁₂ and R ₁₅ independently represent substituents, and R ₁₃ and R ₁₄ independently represent ground represents a hydrogen atom or a substituent, X ₁ represents a single bond O, S or NR ₁₆ , R ₁₆ represents a hydrogen atom or a substituent, Y ₁ represents a single bond or a carbonyl group, two or more of R ₁₂ to R ₁₆ may be bonded and Form a ring. The curable composition according to claim 1, wherein the radical polymerization initiator represented by the aforementioned formula 1 is a compound represented by the following formula 2,

In formula 2, R ₂₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₂₂ and R ₂₅ independently represent an alkyl carbonyl group, an aryl carbonyl group, a heteroaryl carbonyl group, Alkyl, alkoxy, aryl, heteroaryl, aryloxy, halogen atom, nitro, cyano, primary to tertiary amino, alkylthio or arylthio, p3 represents an integer from 0 to 3, p4 represents an integer of 0 to 2, R ₂₃ and R ₂₄ independently represent a hydrogen atom, an alkyl group or an aryl group, R ₂₆ and R ₂₇ represent a hydrogen atom, an alkyl group or an aryl group independently, and Y ₂ represents a single bond or Carbonyl, when Y ₂ is a carbonyl group, at least one of the plural R ₂₆ and the plural R ₂₇ that may exist is not a hydrogen atom, n is an integer of 1 to 3, and two or more of R ₂₂ to R ₂₇ may be bonds to form a ring. The curable composition according to claim 1, wherein the radical polymerization initiator represented by the aforementioned formula 1 is a compound represented by the following formula 3,

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ ~R ₃₄ may be bonded to form a ring, R ₃₆ and R ₃₇ may be bonded to form a ring,

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group. The curable composition according to claim 1, wherein the radical polymerization initiator represented by the aforementioned formula 1 is a compound represented by the following formula 4,

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, For primary to tertiary amino groups, alkylthio groups or arylthio groups, R ₄₆ and R ₄₇ can both be hydrogen atoms,

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group. The curable composition according to claim 1, further comprising a colorant. The curable composition as described in Claim 5, wherein Content of the said coloring agent is 50 mass % or more with respect to the total solid content of a curable composition. The curable composition according to claim 1, further comprising a resin. The curable composition as described in Claim 7, wherein The aforementioned resin is a graft polymer having grafted chains, and the aforementioned grafted chains include at least one selected from the group consisting of polyether chains, polyester chains, and polyacrylic acid chains, and the weight average of the aforementioned grafted chains The molecular weight is 1,000 or more. The curable composition as described in Claim 7, wherein The foregoing resin has a (meth)acryl group, an epoxy group, or an oxetanyl group. The curable composition according to claim 1, further comprising pigment derivatives. A method for producing a cured product, comprising the step of irradiating the curable composition described in any one of claim 1 to claim 10 with light having a wavelength of 150 nm to 300 nm. The manufacturing method of the hardened object as described in Claim 11, wherein The aforementioned light is an excimer laser. A film formed by curing the curable composition according to any one of claims 1 to 10. An optical element comprising the film described in claim 13. An image sensor comprising the film described in claim 13. A solid-state imaging device comprising the film described in claim 13. An image display device comprising the film described in claim 13. A radical polymerization initiator, which is represented by the following formula 3 or formula 4,

In formula 3, R ₃₁ represents alkyl, alkenyl, aryl, heteroaryl, alkoxy or aryloxy, R ₃₂ represents hydrogen atom, halogen atom, nitro, aryl, heteroaryl, alkoxy , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₃₃ and R ₃₄ independently represent a hydrogen atom or an alkyl group, R ₃₆ ~R ₃₉ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₃₂ ~R ₃₄ may be bonded to form a ring, R ₃₆ and R ₃₇ may be bonded to form a ring,

In formula 4, R ₄₁ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group or an aryloxy group, and R ₄₂ represents a hydrogen atom, a halogen atom, a nitro group, an aryl group, a heteroaryl group, an alkoxy group , aryloxy group, primary to tertiary amino group, alkylthio group, arylthio group or a group represented by the following formula I or formula II, R ₄₃ and R ₄₄ independently represent a hydrogen atom or an alkyl group, R ₄₆ and R ₄₇ each independently represent a hydrogen atom, an alkyl group or an aryl group, two or more of R ₄₂ to R ₄₄ may be bonded to form a ring, R ₄₆ and R ₄₇ may be bonded to form a ring, R ₄₂ is a hydrogen atom, When a halogen atom, nitro, alkoxy, aryloxy group or a group represented by the following formula I or formula II, R ₄₆ and R ₄₇ will not both become hydrogen atoms, and R ₄₂ is aryl, heteroaryl, For primary to tertiary amino groups, alkylthio groups or arylthio groups, R ₄₆ and R ₄₇ can both be hydrogen atoms,

In formula I and formula II, * represents the bonding position with other structures, and R ₁₀₁ ~ R ₁₀₅ and R ₂₀₁ ~ R ₂₀₅ independently represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, a hydroxyl group , amine group, nitro group, cyano group or halogen atom, two or more R ₁₀₁ to R ₁₀₅ or two or more R ₂₀₁ to R ₂₀₅ can be bonded to form a ring, Z represents O, S or NR ₂₀₇ , R ₂₀₇ represents a hydrogen atom, an alkyl group or an aryl group.