TW202310977A - Replacement device and replacement method - Google Patents

Replacement device and replacement method Download PDF

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TW202310977A
TW202310977A TW110133690A TW110133690A TW202310977A TW 202310977 A TW202310977 A TW 202310977A TW 110133690 A TW110133690 A TW 110133690A TW 110133690 A TW110133690 A TW 110133690A TW 202310977 A TW202310977 A TW 202310977A
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Taiwan
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processing
replacement
grinding
tool
replacement device
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TW110133690A
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Chinese (zh)
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溝本康隆
早川晋
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日商東京威力科創股份有限公司
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Publication of TW202310977A publication Critical patent/TW202310977A/en

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Abstract

A replacement device of the invention replaces a processing tool used by a processing device. The processing device comprises a holding section which holds an object to be processed, a processing mechanism to which a process tool that processes the object to be processed held by the holding device can be mounted in a replaceable manner, and an external cover which houses the holding section and the processing mechanism. The replacement device comprises a replacement mechanism, a movement mechanism, a traveling stage, and a traveling mechanism. The replacement mechanism attaches the processing tool to the processing mechanism, or removes the processing tool from the processing mechanism. The movement mechanism moves the replacement mechanism from the outside of the external cover to the inside through an entrance in the external cover. The traveling stage supports the movement mechanism. The traveling mechanism causes the traveling stage to travel.

Description

更換裝置及更換方法Replacement device and replacement method

本發明係有關於更換裝置及更換方法。The present invention relates to a replacement device and a replacement method.

記載於專利文獻1之磨削設備具有心軸、配設於心軸之下端的磨輪座、可裝卸地裝設於該磨輪座之下面的磨輪。磨輪包含環狀磨輪基台、於該磨輪基台之下面配設成環狀之複數的磨石。作業員以扣結螺栓將磨輪基台安裝於磨輪座之下面。 [先前技術文獻] [專利文獻] The grinding equipment described in Patent Document 1 has a mandrel, a grinding wheel seat arranged at the lower end of the mandrel, and a grinding wheel detachably installed on the lower surface of the grinding wheel seat. The grinding wheel includes a ring-shaped grinding wheel base, and a plurality of ring-shaped grinding stones arranged under the grinding wheel base. The operator installs the grinding wheel abutment under the grinding wheel seat with fastening bolts. [Prior Art Literature] [Patent Document]

專利文獻1:日本專利公開公報2019-177444號Patent Document 1: Japanese Patent Laid-Open Publication No. 2019-177444

[發明欲解決之課題][Problem to be solved by the invention]

本發明之一態樣係提供防止更換加工工具之際,作業員被弄髒之技術。 [解決課題之手段] One aspect of the present invention is to provide a technique for preventing workers from being soiled when changing processing tools. [Means to solve the problem]

本發明之一態樣的更換裝置更換在加工裝置使用之加工工具。該加工裝置具有:固持部,用以固持處理體;加工機構,將用以加工固持於該固持部之該處理體的該加工工具以可更換方式安裝;及外蓋,收納該固持部與該加工機構。該更換裝置具有更換機構、移動機構、移行台、移行機構。該更換機構將該加工工具安裝於該加工機構或從該加工機構卸除該加工工具。該移動機構使該更換機構經由該外蓋之進入口,從該外蓋之外部移動至內部。該移行台支持該移動機構。該移行機構使該移行台移行。 [發明之效果] A replacement device according to an aspect of the present invention replaces a processing tool used in a processing device. The processing device has: a holding part for holding the processing object; a processing mechanism for installing the processing tool for processing the processing object held in the holding part in a replaceable manner; and an outer cover for accommodating the holding part and the processing object. Processing institutions. The replacement device has a replacement mechanism, a moving mechanism, a moving platform, and a moving mechanism. The replacement mechanism installs the processing tool on the processing mechanism or removes the processing tool from the processing mechanism. The moving mechanism enables the replacement mechanism to move from the outside of the outer cover to the inside through the entrance of the outer cover. The mobile station supports the mobile mechanism. The moving mechanism moves the moving platform. [Effect of Invention]

根據本發明之一態樣,可防止更換加工工具之際,作業員被弄髒。According to an aspect of the present invention, it is possible to prevent a worker from being soiled when replacing a processing tool.

[用以實施發明之形態][Mode for Carrying out the Invention]

以下,就本發明之實施形態,參照圖式來說明。此外,有在各圖式,對同一或對應之結構附上同一符號,而省略說明之情形。在本說明書,X軸方向、Y軸方向、Z軸方向為相互垂直之方向。X軸方向及Y軸方向為水平方向,Z軸方向為鉛直方向。Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in each drawing, the same symbol is attached to the same or corresponding structure, and description may be omitted. In this specification, the X-axis direction, the Y-axis direction, and the Z-axis direction are directions perpendicular to each other. The X-axis direction and the Y-axis direction are horizontal directions, and the Z-axis direction is a vertical direction.

如圖1所示,於工廠之房間設置例如磨削基板W之磨削系統1、更換搭載於磨削系統1之磨削工具D的更換裝置7、貯存更換裝置7之貯存庫8、保管磨削工具D之保管部9。工廠亦可為例如半導體工廠,其房間亦可為例如無塵室。As shown in FIG. 1, for example, a grinding system 1 for grinding a substrate W, a replacement device 7 for replacing a grinding tool D mounted on the grinding system 1, a storage room 8 for storing the replacement device 7, a storage grinding system 1, etc. are installed in a factory room. The storage part 9 of the sharpening tool D. The factory may also be, for example, a semiconductor factory, and its room may also be, for example, a clean room.

基板W包含矽晶圓或化合物半導體晶圓等半導體基板抑或玻璃基板。基板W亦可更包含形成於半導體基板或玻璃基板之表面的元件層。元件層包含電子電路。又,基板W亦可為接合複數之基板的疊合基板。The substrate W includes a semiconductor substrate such as a silicon wafer or a compound semiconductor wafer, or a glass substrate. The substrate W may further include an element layer formed on the surface of a semiconductor substrate or a glass substrate. The component layer contains electronic circuits. In addition, the substrate W may be a laminated substrate in which a plurality of substrates are bonded together.

如圖1所示,磨削系統1可於工廠之房間配置複數個,亦可僅配置一個。磨削系統1以磨削工具D磨削基板W。當磨削工具D磨損時,便以更換裝置7更換。由於由更換裝置7取代人來更換磨削工具D,故可防止人被弄髒。更換磨削工具D包含卸除使用完畢之磨削工具D的步驟及安裝未使用之磨削工具D的步驟。As shown in FIG. 1 , a plurality of grinding systems 1 may be installed in a factory room, or only one grinding system 1 may be installed. The grinding system 1 grinds a substrate W with a grinding tool D. As shown in FIG. When the grinding tool D is worn out, it is replaced by the changing device 7 . Since the grinding tool D is replaced by the changing device 7 instead of a person, it is possible to prevent the person from being soiled. Replacing the grinding tool D includes the steps of removing the used grinding tool D and installing the unused grinding tool D.

保管部9保管磨削工具D。使用完畢之磨削工具D與未使用之磨削工具D在本實施形態保管在同一保管部9,亦可保管在不同之保管部9。保管部9設於磨削系統1之外部。是故,磨削系統1可小型化。由於保管部9設於磨削系統1之外部,故不同於保管部9設於磨削系統1之內部的情形,使用自走式機器人作為更換裝置7。The storage unit 9 stores the grinding tool D. As shown in FIG. The used grinding tool D and the unused grinding tool D are stored in the same storage unit 9 in this embodiment, but may be stored in different storage units 9 . The storage unit 9 is provided outside the grinding system 1 . Therefore, the grinding system 1 can be miniaturized. Since the storage unit 9 is provided outside the grinding system 1 , it is different from the case where the storage unit 9 is provided inside the grinding system 1 , and a self-propelled robot is used as the replacement device 7 .

更換裝置7在貯存庫8待機直至接收磨削工具D之更換指令為止。更換裝置7當接收更換指令時,便移行至例如磨削系統1,從磨削系統1卸除使用完畢之磨削工具D。接著,更換裝置7以固持所卸除之使用完畢的磨削工具D之狀態,移行至保管部9,將使用完畢之磨削工具D放置於保管部9。之後,更換裝置7在保管部9取得未使用之磨削工具D,以固持所取得之未使用的磨削工具D之狀態,移行至磨削系統1,將未使用之磨削工具D安裝於磨削系統1。最後,更換裝置7返回至貯存庫8來待機。The replacement device 7 waits in the storage 8 until a grinding tool D replacement command is received. When the replacement device 7 receives the replacement command, it moves to, for example, the grinding system 1 to remove the used grinding tool D from the grinding system 1 . Next, the replacement device 7 moves to the storage unit 9 in a state of holding the removed used grinding tool D, and places the used grinding tool D in the storage unit 9 . Afterwards, the replacement device 7 obtains the unused grinding tool D from the storage unit 9, moves to the grinding system 1 in the state of holding the obtained unused grinding tool D, and installs the unused grinding tool D on the Grinding system 1. Finally, the replacement device 7 returns to the storage 8 to stand by.

或者,更換裝置7當接收更換指令時,首先,移行至保管部9,在保管部9取得未使用之磨削工具D,以固持所取得之未使用的磨削工具D之狀態,移行至磨削系統1。接著,更換裝置7從磨削系統1卸除使用完畢之磨削工具D。然後,更換裝置7將未使用之磨削工具D安裝於磨削系統1。之後,更換裝置7以固持所卸除之使用完畢的磨削工具D之狀態,移行至保管部9,將使用完畢之磨削工具D放置於保管部9。最後,更換裝置7返回至貯存庫8來待機。Or, when the replacement device 7 receives the replacement command, it first moves to the storage unit 9, obtains an unused grinding tool D in the storage unit 9, and transfers to the grinding tool D in a state of holding the obtained unused grinding tool D. Cut system 1. Then, the changing device 7 removes the used grinding tool D from the grinding system 1 . Then, the replacement device 7 installs the unused grinding tool D in the grinding system 1 . Thereafter, the replacement device 7 moves to the storage unit 9 in a state of holding the removed used grinding tool D, and places the used grinding tool D in the storage unit 9 . Finally, the replacement device 7 returns to the storage 8 to stand by.

保管部9在複數之磨削系統1通用。相較於依各磨削系統1設保管部9之情形,可減低保管部9之設置數。The storage unit 9 is common to the plurality of grinding systems 1 . Compared with the case where storage units 9 are provided for each grinding system 1, the number of storage units 9 installed can be reduced.

此外,如圖2所示,保管部9亦可依各磨削系統1而設。此時,相較於保管部9在複數之磨削系統1通用的情形,可將保管部9設置於磨削系統1之附近。In addition, as shown in FIG. 2 , the storage unit 9 may be provided for each grinding system 1 . In this case, the storage unit 9 can be installed in the vicinity of the grinding system 1 compared to the case where the storage unit 9 is commonly used by a plurality of grinding systems 1 .

又,圖1及圖2所示之保管部9與更換裝置7分開而設,亦可如圖11所示,更換裝置7具有保管部9。使更換裝置7之保管部9與更換裝置7之移行台73一起移行。此時,可縮短更換裝置7之移行距離。更換裝置7之保管部9暫時保管在固定於更換裝置7之外部的保管部9(參照圖1或圖2)與磨削系統1的加工機構43之間搬運的磨削工具D。In addition, the storage unit 9 shown in FIGS. 1 and 2 is provided separately from the replacement device 7 , and the replacement device 7 may have a storage unit 9 as shown in FIG. 11 . The storage unit 9 of the replacement device 7 is moved together with the transfer table 73 of the replacement device 7 . In this case, the travel distance of the replacement device 7 can be shortened. The storage unit 9 of the replacement device 7 temporarily stores the grinding tool D conveyed between the storage unit 9 (see FIG. 1 or FIG. 2 ) fixed outside the replacement device 7 and the machining mechanism 43 of the grinding system 1 .

接著,參照圖3,就磨削系統1作說明。磨削系統1具有搬入搬出部2、清洗部3、磨削部4、控制部5。搬入搬出部2、清洗部3及磨削部4依序從X軸方向負側往X軸方向正側配置。Next, the grinding system 1 will be described with reference to FIG. 3 . The grinding system 1 has a loading and unloading unit 2 , a cleaning unit 3 , a grinding unit 4 , and a control unit 5 . The loading and unloading unit 2 , the cleaning unit 3 , and the grinding unit 4 are sequentially arranged from the negative side in the X-axis direction to the positive side in the X-axis direction.

搬入搬出部2具有載置台21。載置台21用以載置匣C。匣C在鉛直方向隔著間隔收納複數片基板W。載置台21包含於Y軸方向配置成一列之複數的載置板22。於複數之載置板22分別載置匣C。此外,載置板22之數量未特別限定。同樣地,匣C之數量亦未特別限定。The loading/unloading unit 2 has a mounting table 21 . The loading table 21 is used for loading the cassette C. As shown in FIG. The cassette C stores a plurality of substrates W at intervals in the vertical direction. The mounting table 21 includes a plurality of mounting plates 22 arranged in a row in the Y-axis direction. The cassettes C are placed on the plurality of loading plates 22, respectively. In addition, the number of placing plates 22 is not particularly limited. Likewise, the number of cassettes C is not particularly limited.

又,搬入搬出部2具有第1搬運區域23。俯視時,第1搬運區域23於載置台21與後述過渡裝置35的旁邊配置成被載置台21與過渡裝置35夾在其間。搬入搬出部2具有在第1搬運區域23搬運基板W之第1搬運裝置24。第1搬運裝置24在配置於第1搬運區域23旁邊之複數的裝置間搬運基板W。第1搬運裝置24包含固持基板W之第1搬運臂24a。第1搬運臂24a可進行水平方向(X軸方向及Y軸方向兩方向)及鉛直方向之移動以及以鉛直軸為中心之旋轉。第1搬運臂24a之數量可為一個,亦可為複數個。Moreover, the import/export unit 2 has a first conveyance area 23 . In a plan view, the first transfer area 23 is disposed beside the mounting table 21 and a transition device 35 described later so as to be sandwiched between the mounting table 21 and the transition device 35 . The loading/unloading unit 2 has a first transport device 24 that transports the substrate W in the first transport area 23 . The first transfer device 24 transfers the substrate W between a plurality of devices arranged on the side of the first transfer area 23 . The first transport device 24 includes a first transport arm 24a holding the substrate W. As shown in FIG. The first transfer arm 24a can move horizontally (in both directions of the X-axis and Y-axis) and vertically, and can rotate around the vertical axis. The number of the 1st conveyance arm 24a may be one or plural.

清洗部3具有第1清洗裝置31。第1清洗裝置31刷洗以後述磨削裝置40磨削後之基板W。第1清洗裝置31包含海綿或刷子等清洗體,以清洗體去除磨削屑等微粒。The cleaning unit 3 has a first cleaning device 31 . The first cleaning device 31 scrubs the substrate W ground by the grinding device 40 which will be described later. The first cleaning device 31 includes a cleaning body such as a sponge or a brush, and removes fine particles such as grinding chips by the cleaning body.

又,清洗部3具有第2清洗裝置32。第2清洗裝置32以藥液蝕刻以磨削裝置40磨削後之基板W。第2清洗裝置32包含固持基板W之旋轉吸盤、噴吐藥液之噴嘴。噴嘴對旋轉之基板W的上面之中心供應藥液。In addition, the cleaning unit 3 has a second cleaning device 32 . The second cleaning device 32 etches the substrate W ground by the grinding device 40 with a chemical solution. The second cleaning device 32 includes a spin chuck for holding the substrate W, and a nozzle for ejecting a chemical solution. The nozzle supplies the chemical solution to the center of the upper surface of the rotating substrate W.

清洗部3亦可更具有第3清洗裝置33。第3清洗裝置33不同於第1清洗裝置31及第2清洗裝置32,清洗以磨削裝置40磨削前之基板W。第3清洗裝置33與第1清洗裝置31同樣地刷洗基板W。可抑制異物卡入磨削裝置40之吸盤42與基板W之間,而可將基板W磨削成平坦。The cleaning unit 3 may further include a third cleaning device 33 . The third cleaning device 33 is different from the first cleaning device 31 and the second cleaning device 32 , and cleans the substrate W before being ground by the grinding device 40 . The third cleaning device 33 scrubs the substrate W in the same manner as the first cleaning device 31 . It is possible to prevent foreign matter from being caught between the chuck 42 of the grinding device 40 and the substrate W, and to grind the substrate W flat.

清洗部3具有檢測裝置34。檢測裝置34檢測以磨削裝置40磨削前之基板W的中心。俯視時,可將磨削裝置40之吸盤42的中心與基板W之中心對準。檢測裝置34除了檢測基板W之中心,還可檢測基板W之結晶方位,具體為亦可檢測表示基板W之結晶方位的凹口或定向平面。在與吸盤42一同旋轉之旋轉座標系,可將基板W之結晶方位對準所期之方位。The cleaning unit 3 has a detection device 34 . The detection device 34 detects the center of the substrate W before being ground by the grinding device 40 . The center of the chuck 42 of the grinding device 40 can be aligned with the center of the substrate W when viewed from above. In addition to detecting the center of the substrate W, the detecting device 34 can also detect the crystallographic orientation of the substrate W, specifically, it can also detect notches or orientation planes representing the crystallographic orientation of the substrate W. In the rotating coordinate system that rotates together with the chuck 42, the crystal orientation of the substrate W can be aligned with a desired orientation.

第1清洗裝置31、第3清洗裝置33、檢測裝置34亦可於鉛直方向積層,以減低磨削系統1之設置面積。舉例而言,從下側往上側,依序配置檢測裝置34、第1清洗裝置31、第3清洗裝置33。惟,其順序未特別限定。The first cleaning device 31 , the third cleaning device 33 , and the detection device 34 can also be stacked vertically to reduce the installation area of the grinding system 1 . For example, from the lower side to the upper side, the detection device 34 , the first cleaning device 31 , and the third cleaning device 33 are arranged in sequence. However, the order is not particularly limited.

清洗部3具有過渡裝置35。過渡裝置35暫時收納基板W。複數之過渡裝置35亦可於鉛直方向層疊。過渡裝置35之配置及個數未特別限定。The cleaning section 3 has a transition device 35 . The transition unit 35 temporarily accommodates the substrate W. A plurality of transition devices 35 can also be stacked vertically. The configuration and number of transition devices 35 are not particularly limited.

清洗部3具有第2搬運區域36。俯視時,第2搬運區域36於第1清洗裝置31、第2清洗裝置32及過渡裝置35的旁邊配置成以第1清洗裝置31、第2清洗裝置32、過渡裝置35包圍三邊。清洗部3具有在第2搬運區域36搬運基板W之第2搬運裝置37。第2搬運裝置37在配置於第2搬運區域36的旁邊之複數的裝置間搬運基板W。第2搬運裝置37包含固持基板W之第2搬運臂37a。第2搬運臂37a可進行水平方向(X軸方向及Y軸方向兩方向)及鉛直方向之移動、以及以鉛直軸為中心之旋轉。第2搬運臂37a之數量可為一個,亦可為複數個。The cleaning unit 3 has a second conveyance area 36 . In a plan view, the second transfer area 36 is arranged beside the first cleaning device 31 , the second cleaning device 32 and the transition device 35 such that the first cleaning device 31 , the second cleaning device 32 and the transition device 35 surround three sides. The cleaning unit 3 has a second transport device 37 for transporting the substrate W in the second transport area 36 . The second transfer device 37 transfers the substrate W between a plurality of devices arranged beside the second transfer area 36 . The second transfer device 37 includes a second transfer arm 37a holding the substrate W. As shown in FIG. The second transfer arm 37a can move horizontally (both directions of the X-axis and Y-axis) and vertically, and can rotate around the vertical axis. The number of the 2nd conveyance arm 37a may be one or plural.

清洗部3呈俯視時截去矩形之角的形狀,於該截去之位置配置第3搬運區域38。俯視時,第3搬運區域38於第2搬運區域36、第1清洗裝置31與磨削裝置40的旁邊配置成被第2搬運區域36、第1清洗裝置31及磨削裝置40包圍三邊。第3搬運區域38亦可設於覆蓋清洗部3及第3搬運區域38兩者之殼體的內部,也可設於與覆蓋清洗部3之殼體不同的殼體之內部,並連接於清洗部3The cleaning unit 3 has a shape in which corners of a rectangle are truncated in plan view, and a third transfer area 38 is arranged at the truncated position. In plan view, the third transfer area 38 is arranged beside the second transfer area 36 , the first cleaning device 31 and the grinding device 40 so as to be surrounded on three sides by the second transfer area 36 , the first cleaning device 31 and the grinding device 40 . The 3rd conveying area 38 also can be arranged in the inside of the housing that covers cleaning part 3 and the 3rd conveying area 38 both, also can be located in the inside of the housing different from the housing that covers cleaning part 3, and be connected to cleaning. part 3

磨削系統1具有在第3搬運區域38搬運基板W之第3搬運裝置39。第3搬運裝置39在配置於第3搬運區域38的旁邊之複數的裝置間搬運基板W。第3搬運裝置39包含固持基板W之吸附墊39a。吸附墊39a從上方吸附基板W。吸附墊39a可進行往水平方向(X軸方向及Y軸方向兩方向)及鉛直方向之移動以及以鉛直軸為中心之旋轉。The grinding system 1 has a third transfer device 39 for transferring the substrate W in the third transfer area 38 . The third transfer device 39 transfers the substrate W between a plurality of devices arranged beside the third transfer area 38 . The third transfer device 39 includes an adsorption pad 39a for holding the substrate W. As shown in FIG. The adsorption pad 39a adsorbs the substrate W from above. The suction pad 39a can move in the horizontal direction (both directions of the X-axis direction and the Y-axis direction) and the vertical direction, and can rotate around the vertical axis.

磨削部4包含磨削裝置40。磨削裝置40磨削基板W。磨削包含研磨。用於磨削之磨粒為固定磨粒及游離磨粒任一者皆可。磨削裝置40具有例如台41、四個吸盤42、三個加工機構43。The grinding unit 4 includes a grinding device 40 . The grinding device 40 grinds the substrate W. As shown in FIG. Grinding includes grinding. The abrasive grains used for grinding may be either fixed abrasive grains or free abrasive grains. The grinding device 40 has, for example, a table 41 , four suction pads 42 , and three processing mechanisms 43 .

台41於旋轉中心線R1周圍以等間隔固持四個吸盤42,以旋轉中心線R1為中心而旋轉。四個吸盤42分別與台41一同旋轉,依序移動至搬入搬出位置A0、一次磨削位置A1、二次磨削位置A2、三次磨削位置A3、搬入搬出位置A0。The table 41 holds four suction pads 42 at equal intervals around the rotation center line R1, and rotates around the rotation center line R1. The four suction pads 42 rotate together with the table 41 and move sequentially to the loading and unloading position A0, the primary grinding position A1, the secondary grinding position A2, the tertiary grinding position A3, and the loading and unloading position A0.

搬入搬出位置A0兼作進行基板W之搬入的位置與進行基板W之搬出的位置。此外,在本實施形態,搬入位置與搬出位置係相同之位置,搬入位置與搬出位置亦可為不同之位置。一次磨削位置A1為進行基板W之一次磨削的位置。二次磨削位置A2為進行基板W之二次磨削的位置。三次磨削位置A3為進行基板W之三次磨削的位置。The loading/unloading position A0 also serves as a position where substrates W are loaded in and a location where substrates W are loaded out. In addition, in this embodiment, the import position and the export position are the same position, but the import position and the export position may be different positions. The primary grinding position A1 is a position where primary grinding of the substrate W is performed. The secondary grinding position A2 is a position where secondary grinding of the substrate W is performed. The tertiary grinding position A3 is a position where the tertiary grinding of the substrate W is performed.

四個吸盤42以各旋轉中心線R2(參照圖4)為中心旋轉自如地安裝於台41。在一次磨削位置A1、二次磨削位置A2及三次磨削位置A3,吸盤42以各旋轉中心線R2為中心而旋轉。The four suction pads 42 are rotatably attached to the table 41 around each rotation center line R2 (see FIG. 4 ). At the primary grinding position A1 , the secondary grinding position A2 , and the tertiary grinding position A3 , the chuck 42 rotates about each rotation center line R2 .

一個加工機構43在一次磨削位置A1將基板W進行一次磨削。另一加工機構43在二次磨削位置A2將基板W進行二次磨削。其餘之加工機構43在三次磨削位置A3將基板W進行三次磨削。One processing mechanism 43 performs primary grinding on the substrate W at the primary grinding position A1. Another processing mechanism 43 performs secondary grinding on the substrate W at the secondary grinding position A2. The rest of the processing mechanism 43 grinds the substrate W three times at the third grinding position A3.

此外,加工機構43之數量只要為一個以上即可。又,吸盤42之數量只要多於加工機構43之數量即可。惟,沒有台41亦無妨。沒有台41時,吸盤42之數量可為與加工機構43相同之數量,亦可為一個。In addition, the number of the processing mechanism 43 should just be one or more. In addition, the number of suction pads 42 only needs to be greater than the number of processing mechanisms 43 . However, it doesn't matter if there is no Taiwan 41. When there is no table 41, the number of suction cups 42 can be the same as that of the processing mechanism 43, or one.

控制部5係例如電腦,具有CPU(中央處理單元)51、記憶體等記憶媒體52。於記憶媒體52儲存用以控制在磨削系統1執行之各種處理的程式。控制部5藉使CPU51執行記憶於記憶媒體52之程式,而控制磨削系統1之動作。The control unit 5 is, for example, a computer, and has a CPU (Central Processing Unit) 51 and a storage medium 52 such as a memory. Programs for controlling various processes executed in the grinding system 1 are stored in the storage medium 52 . The control unit 5 controls the operation of the grinding system 1 by causing the CPU 51 to execute the program stored in the storage medium 52 .

接著,就磨削系統1之動作作說明。下述動作在以控制部5所行之控制下實施。Next, the operation of the grinding system 1 will be described. The following operations are carried out under the control of the control unit 5 .

首先,第1搬運裝置24從匣C取出基板W,將之搬運至過渡裝置35。接著,第2搬運裝置37從過渡裝置35將基板W搬運至第3清洗裝置33。First, the first transfer device 24 takes out the substrate W from the cassette C and transfers it to the transition device 35 . Next, the second transfer device 37 transfers the substrate W from the transition device 35 to the third cleaning device 33 .

然後,第3清洗裝置33清洗以磨削裝置40磨削前之基板W。可將乾淨之基板W載置於磨削裝置40之吸盤42,而可抑制異物之卡入。是故,可將基板W磨削成平坦,而可抑制基板W之厚度偏差的惡化。基板W乾燥後,第2搬運裝置37從第3清洗裝置33將基板W搬運至檢測裝置34。Then, the third cleaning device 33 cleans the substrate W before being ground by the grinding device 40 . A clean substrate W can be placed on the suction pad 42 of the grinding device 40, and foreign objects can be suppressed from being caught. Therefore, the substrate W can be ground flat, and the deterioration of the thickness variation of the substrate W can be suppressed. After the substrate W is dried, the second transfer device 37 transfers the substrate W from the third cleaning device 33 to the detection device 34 .

此外,當未磨削之基板W乾淨時,或當磨削裝置40具有清洗未磨削之基板W的機構時,沒有第3清洗裝置33亦無妨。此時,第2搬運裝置37從過渡裝置35將基板W搬運至檢測裝置34。In addition, when the unground substrate W is clean, or when the grinding device 40 has a mechanism for cleaning the unground substrate W, there is no problem without the third cleaning device 33 . At this time, the second transport device 37 transports the substrate W from the transition device 35 to the detection device 34 .

然後,檢測裝置34檢測基板W之中心。檢測裝置34亦可也檢測基板W之結晶方位,具體為亦可也檢測凹口等。之後,第3搬運裝置39從檢測裝置34將基板W搬運至磨削裝置40之吸盤42。在此期間,控制部5依據檢測裝置34之檢測結果,控制第3搬運裝置39,將吸盤42之中心與基板W之中心對準。又,控制部5依據檢測裝置34之檢測結果,控制第3搬運裝置39,在與吸盤42一同旋轉之旋轉座標系,將基板W之結晶方位對準所期之方位。Then, the detection device 34 detects the center of the substrate W. As shown in FIG. The detection device 34 may also detect the crystal orientation of the substrate W, specifically, may also detect notches and the like. Thereafter, the third transfer device 39 transfers the substrate W from the detection device 34 to the chuck 42 of the grinding device 40 . During this period, the control unit 5 controls the third transfer device 39 to align the center of the chuck 42 with the center of the substrate W according to the detection result of the detection device 34 . In addition, the control unit 5 controls the third transfer device 39 based on the detection result of the detection device 34, and aligns the crystal orientation of the substrate W with a desired orientation in the rotation coordinate system that rotates together with the chuck 42.

接著,磨削裝置40磨削基板W之上面。基板W與台41一同旋轉,依序移動至搬入搬出位置A0、一次磨削位置A1、二次磨削位置A2、三次磨削位置A3、搬入搬出位置A0。在此期間,實施一次磨削、二次磨削、三次磨削。之後,第3搬運裝置39從吸盤42將基板W搬運至第1清洗裝置31。Next, the grinding device 40 grinds the upper surface of the substrate W. As shown in FIG. The substrate W rotates together with the table 41, and moves sequentially to the loading and unloading position A0, the primary grinding position A1, the secondary grinding position A2, the tertiary grinding position A3, and the loading and unloading position A0. During this period, primary grinding, secondary grinding, and tertiary grinding are performed. Thereafter, the third transfer device 39 transfers the substrate W from the chuck 42 to the first cleaning device 31 .

然後,第1清洗裝置31清洗基板W之上面,去除磨削屑等微粒。基板W乾燥後,第2搬運裝置37從第1清洗裝置31將基板W搬運至第2清洗裝置32。Then, the first cleaning device 31 cleans the upper surface of the substrate W to remove particles such as grinding chips. After the substrate W is dried, the second transfer device 37 transfers the substrate W from the first cleaning device 31 to the second cleaning device 32 .

接著,第2清洗裝置32蝕刻基板W之上面,去除磨削痕。基板W乾燥後,第2搬運裝置37從第2清洗裝置32將基板W搬運至過渡裝置35。然後,第1搬運裝置24從過渡裝置35將基板W搬運至匣C。而將基板W收納於匣C。Next, the second cleaning device 32 etches the upper surface of the substrate W to remove grinding marks. After the substrate W is dried, the second transfer device 37 transfers the substrate W from the second cleaning device 32 to the transition device 35 . Then, the first transfer device 24 transfers the substrate W to the cassette C from the transition device 35 . And the substrate W is accommodated in the cassette C.

接著,參照圖4,就磨削裝置40之加工機構43作說明。加工機構43具有裝設磨削工具D之可動部43a。加工機構43係驅動磨削工具D之驅動機構。使磨削工具D接觸基板W而磨削基板W。磨削工具D具有例如圓盤狀磨輪D1、於磨輪D1之下面排列成環狀之複數的磨石D2。Next, referring to FIG. 4 , the processing mechanism 43 of the grinding device 40 will be described. The processing mechanism 43 has a movable part 43a on which the grinding tool D is installed. The machining mechanism 43 is a driving mechanism for driving the grinding tool D. The substrate W is ground by bringing the grinding tool D into contact with the substrate W. FIG. The grinding tool D has, for example, a disc-shaped grinding wheel D1 and a plurality of grinding stones D2 arranged in a ring under the grinding wheel D1.

可動部43a包含裝設磨削工具D之凸緣43a1、於下端設凸緣43a1之心軸43a2、使心軸43a2旋轉之心軸馬達43a3。凸緣43a1配置成水平,磨削工具D於其下面安裝成可以螺栓等扣結工具E更換。扣結工具E沿著凸緣43a1之周緣隔著間隔設複數個。心軸43a2配置成鉛直。心軸馬達43a3使心軸43a2旋轉,而使裝設於凸緣43a1之磨削工具D旋轉。磨削工具D之旋轉中心線R3係心軸43a2之旋轉中心線。The movable part 43a includes a flange 43a1 on which the grinding tool D is installed, a spindle 43a2 provided with the flange 43a1 at the lower end, and a spindle motor 43a3 for rotating the spindle 43a2. The flange 43a1 is arranged horizontally, and the grinding tool D is mounted below it so that fastening tools E such as bolts can be replaced. A plurality of fastening tools E are provided at intervals along the periphery of the flange 43a1. The mandrel 43a2 is arranged vertically. The spindle motor 43a3 rotates the spindle 43a2 to rotate the grinding tool D attached to the flange 43a1. The rotation center line R3 of the grinding tool D is the rotation center line of the spindle 43a2.

加工機構43更具有使可動部43a升降之升降部43b。升降部43b包含例如鉛直之Z軸導件43b1、沿著Z軸導件43b1移動之Z軸滑動器43b2、使Z軸滑動器43b2移動之Z軸馬達43b3。於Z軸滑動器43b2固定可動部43a,可動部43a及磨削工具D與Z軸滑動器43b2一同升降。升降部43b更包含檢測磨削工具D之位置的位置檢測器43b4。位置檢測器43b4檢測例如Z軸馬達43b3之旋轉,而檢測磨削工具D之位置。The processing mechanism 43 further has an elevating portion 43b for elevating the movable portion 43a. The lifting unit 43b includes, for example, a vertical Z-axis guide 43b1, a Z-axis slider 43b2 that moves along the Z-axis guide 43b1, and a Z-axis motor 43b3 that moves the Z-axis slider 43b2. The movable part 43a is fixed to the Z-axis slider 43b2, and the movable part 43a and the grinding tool D are raised and lowered together with the Z-axis slider 43b2. The lifting part 43b further includes a position detector 43b4 for detecting the position of the grinding tool D. As shown in FIG. The position detector 43b4 detects the rotation of the Z-axis motor 43b3 to detect the position of the grinding tool D, for example.

升降部43b使磨削工具D從待機位置下降。磨削工具D一面下降,一面旋轉,與旋轉之基板W的上面接觸,而磨削基板W之上面整面。當基板W之厚度達到設定值時,升降部43b停止磨削工具D之下降。之後,升降部43b使磨削工具D上升至待機位置。The raising and lowering part 43b lowers the grinding tool D from a standby position. The grinding tool D rotates while descending, contacts the upper surface of the rotating substrate W, and grinds the entire upper surface of the substrate W. When the thickness of the substrate W reaches a set value, the lifting portion 43b stops the grinding tool D from descending. Thereafter, the raising and lowering unit 43b raises the grinding tool D to the standby position.

接著,參照圖5及圖6,就對加工機構43之磨削工具D的安裝及卸除作說明。如圖5所示,磨削裝置40具有外蓋44。外蓋44收納作為固持基板W之固持部的吸盤42、磨削工具D安裝成可更換之加工機構43。外蓋44抑制在其內部產生之磨削屑等微粒流出至外部。而可將工廠之房間維持乾淨。Next, the installation and removal of the grinding tool D of the processing mechanism 43 will be described with reference to FIGS. 5 and 6 . As shown in FIG. 5 , the grinding device 40 has an outer cover 44 . The outer cover 44 accommodates the suction cup 42 as a holding part for holding the substrate W, and the processing mechanism 43 which is installed as a replaceable grinding tool D. The outer cover 44 suppresses particles such as grinding chips generated inside from flowing out to the outside. And can keep the room of the factory clean.

外蓋44具有更換裝置7從外蓋44的外部進入至內部之際通過的進入口44a。由更換裝置7取代人來從外蓋44之外部進入至內部,在外蓋44之內部更換磨削工具D。The outer cover 44 has an entrance port 44 a through which the replacement device 7 passes when entering from the outside of the outer cover 44 to the inside. Instead of people, the changing device 7 enters from the outside of the outer cover 44 to the inside, and the grinding tool D is replaced inside the outer cover 44 .

由於由更換裝置7取代人來進入外蓋44之內部,更換磨削工具D,故可防止人被外蓋44之內部的堆積物弄髒。又,由於更換裝置7設於磨削裝置40之外部,故相較於更換裝置7設於磨削裝置40之內部的情形,磨削裝置40可小型化。Since the replacement device 7 enters the inside of the outer cover 44 instead of a person to replace the grinding tool D, it is possible to prevent people from being soiled by the deposits inside the outer cover 44 . Also, since the replacement device 7 is provided outside the grinding device 40 , the grinding device 40 can be miniaturized compared to the case where the replacement device 7 is provided inside the grinding device 40 .

磨削裝置40具有開關外蓋44之進入口44a的擋門45。擋門45基本上閉塞進入口44a,於更換裝置7進入時,開放進入口44a。相較於進入口44a一直開放之情形,可抑制微粒經由進入口44a,從外蓋44之內部流出至外部,而可將工廠之房間維持乾淨。The grinding device 40 has a shutter 45 for opening and closing the entrance 44 a of the outer cover 44 . The shutter 45 basically blocks the entrance 44a, and opens the entrance 44a when the replacement device 7 enters. Compared with the case where the inlet 44a is always open, particles can be suppressed from flowing out from the inside of the cover 44 to the outside through the inlet 44a, and the room of the factory can be kept clean.

磨削裝置40亦可具有使擋門45在開放進入口44a之開位置(例如圖5所示之位置)與閉塞進入口44a的閉位置之間移動的移動機構46。移動機構46係氣壓缸、或電動缸等。電動缸包含馬達與滾珠螺桿。可非手動而自動移動擋門45。The grinding device 40 may also have a moving mechanism 46 for moving the shutter 45 between an open position for opening the entrance 44a (such as the position shown in FIG. 5 ) and a closed position for blocking the entrance 44a. The moving mechanism 46 is a pneumatic cylinder or an electric cylinder or the like. An electric cylinder consists of a motor and a ball screw. The shutter 45 can be moved automatically instead of manually.

如圖3所示,磨削裝置40具有複數之加工機構43,依各加工機構43,設進入口44a。舉例而言,於一次磨削位置A1、二次磨削位置A2、三次磨削位置A3各設加工機構43與進入口44a。於各進入口44a設擋門45,依各進入口44a,使擋門45移動。As shown in FIG. 3 , the grinding device 40 has a plurality of processing mechanisms 43 , and an inlet 44 a is provided for each processing mechanism 43 . For example, a processing mechanism 43 and an inlet 44 a are respectively provided at the primary grinding position A1 , the secondary grinding position A2 , and the tertiary grinding position A3 . Each entrance 44a is provided with a shutter 45, and the shutter 45 is moved according to each entrance 44a.

加工機構43之數量越多,可越顯著地獲得於磨削裝置40之外部設更換裝置7的效果。不同於本實施形態,當依各加工機構43,將更換裝置7設於磨削裝置40之內部時,或當於研磨裝置40之內部設在複數之加工機構43通用的更換裝置7時,磨削裝置40會大型化。另一方面,根據本實施形態,由於將更換裝置7設於磨削裝置40之外部,故磨削裝置40可小型化。惟,加工機構43之數量亦可為一個。The more the number of processing mechanisms 43 is, the more significantly the effect of installing the replacement device 7 outside the grinding device 40 can be obtained. Different from this embodiment, when the replacement device 7 is arranged inside the grinding device 40 according to each processing mechanism 43, or when the replacement device 7 common to a plurality of processing mechanisms 43 is arranged inside the grinding device 40, the grinding The cutting device 40 will be enlarged. On the other hand, according to this embodiment, since the replacement device 7 is provided outside the grinding device 40, the grinding device 40 can be miniaturized. However, the number of processing mechanism 43 can also be one.

如圖5所示,磨削裝置40亦可具有限制機構47。限制機構47限制氣體經由外蓋44之進入口44a,從外蓋44之內部流出至外部。藉限制氣體之流出,可抑制微粒之流出,而可將工廠之房間維持乾淨。As shown in FIG. 5 , the grinding device 40 may have a restriction mechanism 47 . The restriction mechanism 47 restricts gas from flowing out from the inside of the outer cover 44 to the outside through the inlet 44 a of the outer cover 44 . By restricting the outflow of gas, the outflow of particles can be suppressed, and the room of the factory can be kept clean.

舉例而言,限制機構47具有使外蓋44之內部比外部負壓的排氣管路47a。排氣管路47a係導管等,將外蓋44與排氣源連接。排氣源係例如真空泵或排射器等。於排氣管路47a之中途設例如氣壓控制器47b。氣壓控制器47b控制外蓋44之內部的氣壓。藉氣壓差,形成從外蓋44之進入口44a往內部之氣流。結果,可限制氣體從外蓋44之內部流出至外部。For example, the restricting mechanism 47 has an exhaust line 47a that makes the inside of the outer cover 44 negative in pressure compared to the outside. The exhaust line 47a is a conduit or the like, and connects the outer cover 44 to an exhaust source. The exhaust source is such as a vacuum pump or an ejector. In the middle of the exhaust line 47a, for example, an air pressure controller 47b is provided. The air pressure controller 47b controls the air pressure inside the outer cover 44 . The airflow from the inlet 44a of the outer cover 44 to the inside is formed by the air pressure difference. As a result, the outflow of gas from the inside of the outer cover 44 to the outside can be restricted.

排氣管路47a之與外蓋44的連接口在圖5為外蓋44之進入口44a的上方,亦可為下方。為後者時,可於外蓋44之內部形成降流。於外蓋44之頂部亦可設風扇過濾組等送風機。將送風量與排氣量控制成使外蓋44之內部比外部負壓。The connection port of the exhaust pipeline 47a with the outer cover 44 is above the inlet 44a of the outer cover 44 in FIG. 5 , or it may be lower. In the latter case, a downflow can be formed inside the outer cover 44 . The top of the outer cover 44 can also be provided with air blowers such as a fan filter group. The air supply volume and exhaust volume are controlled so that the inside of the outer cover 44 has a negative pressure compared to the outside.

磨削裝置40亦可具有清洗機構48。清洗機構48以噴嘴等,對磨削工具D、或磨削工具D之周邊構件供應清洗液。清洗液為例如DIW(去離子水)等。磨削工具D之周邊構件為例如凸緣43a1或心軸43a2。於從加工機構43卸除使用完畢之磨削工具D前,清洗磨削工具D等。藉此,可抑制更換裝置7被弄髒。又,若以清洗機構48清洗磨削工具D,可抑制將微粒與磨削工具D一同運送至外面。The grinding device 40 may also have a cleaning mechanism 48 . The cleaning mechanism 48 supplies cleaning liquid to the grinding tool D or peripheral members of the grinding tool D through nozzles or the like. The cleaning solution is, for example, DIW (deionized water) or the like. The peripheral member of the grinding tool D is, for example, a flange 43a1 or a spindle 43a2. Before removing the used grinding tool D from the machining mechanism 43, the grinding tool D and the like are cleaned. Thereby, contamination of the replacement device 7 can be suppressed. In addition, if the grinding tool D is cleaned by the cleaning mechanism 48, it is possible to suppress the particles from being transported outside together with the grinding tool D.

磨削裝置40具有控制部50。控制部50係例如電腦,具有CPU50a、記憶體等記憶媒體50b。於記憶媒體50b儲存用以控制在磨削裝置40執行之各種處理的程式。控制部50藉使CPU50a執行記憶於記憶媒體50b之程式,而控制磨削裝置40之動作。磨削裝置40之控制部50亦可為磨削系統1之控制部5的一部分。The grinding device 40 has a control unit 50 . The control unit 50 is, for example, a computer, and has a storage medium 50b such as a CPU 50a and a memory. Programs for controlling various processes executed by the grinding device 40 are stored in the storage medium 50b. The control part 50 controls the operation|movement of the grinding apparatus 40 by CPU50a executing the program memorize|stored in the memory medium 50b. The control unit 50 of the grinding device 40 can also be a part of the control unit 5 of the grinding system 1 .

更換裝置7具有例如更換機構71、移動機構72、移行台73、移行機構74。更換機構71將磨削工具D安裝於加工機構43,或從加工機構43卸除磨削工具D。更換機構71可進行水平方向(X軸方向及Y軸方向兩方向)及鉛直方向之移動、以及以鉛直軸為中心之旋轉。移動機構72使更換機構71經由外蓋44之進入口44a,從外蓋44之外部移動至內部。移動機構72為例如肢接臂,以一端固持更換機構71,以另一端連結移行台73。移行台73支持移動機構72。移行機構74使移行台73移行。The replacement device 7 has, for example, a replacement mechanism 71 , a moving mechanism 72 , a moving table 73 , and a moving mechanism 74 . The replacement mechanism 71 attaches the grinding tool D to the machining mechanism 43 or removes the grinding tool D from the machining mechanism 43 . The replacement mechanism 71 is capable of movement in the horizontal direction (both directions of the X-axis direction and the Y-axis direction) and the vertical direction, and rotation about the vertical axis. The moving mechanism 72 moves the replacement mechanism 71 from the outside of the outer cover 44 to the inside through the entrance 44 a of the outer cover 44 . The moving mechanism 72 is, for example, a limb joint arm, with one end holding the replacement mechanism 71 and the other end connected to the moving platform 73 . The mobile platform 73 supports the mobile mechanism 72 . The moving mechanism 74 moves the moving platform 73 .

由於更換裝置7設於磨削裝置40之外部,故不同於更換裝置7設於磨削裝置40之內部的情形,使用自走式機器人作為更換裝置7。由更換裝置7取代人來更換磨削工具D。而可防止人被弄髒。又,由於更換裝置7設於磨削裝置40之外部,故相較於更換裝置7設於磨削裝置40之內部的情形,磨削裝置40可小型化。Since the replacement device 7 is provided outside the grinding device 40 , a self-propelled robot is used as the replacement device 7 unlike the case where the replacement device 7 is provided inside the grinding device 40 . The grinding tool D is changed by the changing device 7 instead of a person. And can prevent people from being soiled. Also, since the replacement device 7 is provided outside the grinding device 40 , the grinding device 40 can be miniaturized compared to the case where the replacement device 7 is provided inside the grinding device 40 .

如圖6所示,更換機構71具有固持磨削工具D之固持機構71a。固持機構71a固持收納磨削工具D之容器F。容器F為上方開放之箱形,上面有凹部。於該凹部收納磨削工具D。容器F收納磨削工具D,於卸除磨削工具D時,防止磨削液或磨削屑等之落下。此外,固持機構71a亦可固持磨削工具D。As shown in FIG. 6, the exchange mechanism 71 has the holding mechanism 71a which holds the grinding tool D. As shown in FIG. The holding mechanism 71a holds the container F for storing the grinding tool D. The container F is a box shape with an open top, and a concave portion is arranged on the top. The grinding tool D is accommodated in this recessed part. The container F stores the grinding tool D, and prevents the grinding fluid or grinding chips from falling when the grinding tool D is removed. In addition, the holding mechanism 71a can also hold the grinding tool D.

更換機構71具有制止加工機構43之心軸43a2的旋轉之旋轉制止機構71b。旋轉制止機構71b包含例如抓持凸緣43a1或心軸43a2之夾。或者,旋轉制止機構71b包含插入至凸緣43a1或心軸43a2之孔的銷。以旋轉制止機構71b制止心軸43a2之旋轉,而可在制止磨削工具D之旋轉的狀態下,緊固或鬆開扣結工具E。The replacement mechanism 71 has a rotation stop mechanism 71b that stops the rotation of the spindle 43a2 of the processing mechanism 43 . The rotation stop mechanism 71b includes, for example, a clip that grips the flange 43a1 or the spindle 43a2. Alternatively, the rotation deterring mechanism 71b includes a pin inserted into a hole in the flange 43a1 or the spindle 43a2. The rotation of the spindle 43a2 is stopped by the rotation stop mechanism 71b, and the fastening tool E can be fastened or loosened while the rotation of the grinding tool D is stopped.

更換機構71具有緊固或鬆開將磨削工具D與加工機構43扣結之扣結工具E的操作機構71c。扣結工具E為螺栓時,以嵌合於螺栓之扳手或扳鉗等工具及使該工具旋轉之旋轉機構構成操作機構71c。The replacement mechanism 71 has an operating mechanism 71c for fastening or loosening the fastening tool E that fastens the grinding tool D and the machining mechanism 43 . When the fastening tool E is a bolt, the operating mechanism 71c is constituted by a tool such as a wrench or a wrench fitted to the bolt, and a rotation mechanism for rotating the tool.

如圖1等所示,更換機構71與移動機構72之組合亦可設複數組,而獨立控制。一組用於磨削工具D之安裝,另一組用於磨削工具D之卸除。若更換機構71與移動機構72之組合為複數組,不同於一組之情形,可相繼迅速地實施磨削工具D之卸除與安裝。亦即,在磨削工具D之卸除與安裝的空檔,更換裝置7不用在磨削裝置40與保管部9之間往返。As shown in Fig. 1 etc., the combination of the replacement mechanism 71 and the moving mechanism 72 can also be set up in multiple groups, and controlled independently. One set is used for the installation of the grinding tool D, and the other set is used for the removal of the grinding tool D. If the combination of the replacement mechanism 71 and the moving mechanism 72 is a plurality of groups, which are different from one group, the removal and installation of the grinding tool D can be carried out rapidly one after another. In other words, the replacement device 7 does not need to go back and forth between the grinding device 40 and the storage unit 9 during the removal and installation of the grinding tool D.

此外,若更換裝置7之保管部9(參照圖11)保管使用完畢之磨削工具D與未使用之磨削工具D兩者時,即使更換機構71與移動機構72為各一個,亦可相繼迅速地實施磨削工具D之卸除與安裝。又,若更換裝置7之保管部9(參照圖11)保管使用完畢之磨削工具D與未使用之磨削工具D兩者各複數個,可不在固定於更換裝置7之外部的保管部9(參照圖1及圖2)與磨削裝置40之間往返,而對複數之加工機構43連續進行更換作業。In addition, if the storage part 9 (refer to FIG. 11 ) of the replacement device 7 stores both the used grinding tool D and the unused grinding tool D, even if the replacement mechanism 71 and the moving mechanism 72 are each one, they can be replaced successively. Quickly implement the removal and installation of the grinding tool D. Also, if the storage unit 9 (refer to FIG. 11 ) of the replacement device 7 stores a plurality of used grinding tools D and unused grinding tools D, the storage unit 9 fixed to the outside of the replacement device 7 may not be used. (Refer to FIG. 1 and FIG. 2 ) and back and forth between the grinding device 40, and continuously perform replacement operations on a plurality of processing mechanisms 43.

更換裝置7亦可具有拍攝更換機構71之拍攝裝置75。拍攝裝置75與更換機構71同樣地,安裝於移動機構72之一端。可一面以拍攝裝置75監視更換機構71之動作,一面控制更換機構71。The replacement device 7 may also have a photographing device 75 for photographing the replacement mechanism 71 . The imaging device 75 is attached to one end of the moving mechanism 72 similarly to the changing mechanism 71 . It is possible to control the replacement mechanism 71 while monitoring the operation of the replacement mechanism 71 with the camera 75 .

更換裝置7具有控制部76。控制部76為例如電腦,具有CPU76a、記憶體等記憶媒體76b。於記憶媒體76b儲存用以控制在更換裝置7執行之各種處理的程式。控制部76藉使CPU76a執行記憶於記憶媒體76b之程式,而控制更換裝置7之動作。The replacement device 7 has a control unit 76 . The control unit 76 is, for example, a computer, and has a storage medium 76b such as a CPU 76a and a memory. Programs for controlling various processes executed by the replacement device 7 are stored in the storage medium 76b. The control unit 76 controls the operation of the replacement device 7 by causing the CPU 76a to execute the program stored in the storage medium 76b.

接著,參照圖7,就磨削裝置40之控制部50的功能與更換裝置7之控制部76的功能作說明。此外,圖7所示之各功能塊為概念性,未必需要物理上如圖示構成。可以任意之單位在功能上或物理上分散、統合各功能塊之全部或一部分而構成。在各功能塊進行之各處理功能其全部或任意之一部分可以用CPU執行之程式實現或以布線邏輯之硬體實現。Next, the functions of the control unit 50 of the grinding device 40 and the function of the control unit 76 of the replacement device 7 will be described with reference to FIG. 7 . In addition, each functional block shown in FIG. 7 is conceptual and does not necessarily need to be physically configured as shown. All or a part of each functional block may be configured by functionally or physically dispersing and integrating all or part of each functional block in any unit. All or any part of each processing function performed by each function block can be realized by a program executed by the CPU or by hardware of wired logic.

首先,就磨削裝置40之控制部50的功能作說明。控制部50具有例如更換指令作成部50c、位置檢測部50d、開關控制部50e、負壓控制部50f、清洗控制部50g、自動設置控制部50h。First, the function of the control unit 50 of the grinding device 40 will be described. The control unit 50 includes, for example, a replacement command creation unit 50c, a position detection unit 50d, a switch control unit 50e, a negative pressure control unit 50f, a cleaning control unit 50g, and an automatic setting control unit 50h.

更換指令作成部50c判斷是否需要磨削工具D之更換,來作成磨削工具D之更換指令。具體而言,更換指令作成部50c監視例如以磨削工具D磨削之基板W的片數、磨削工具D之磨損量、或自磨削工具D安裝時起經過之時間等,當其監視之值達到設定值時,便作成更換指令。所作成之更換指令以無線或有線發送至更換裝置7之控制部76。更換裝置7與磨削裝置40亦可藉由外部之電腦,發送接收信號。更換裝置7當接收更換指令,從磨削裝置40接受要求時,便移行至磨削裝置40。The replacement command creation unit 50c determines whether or not the grinding tool D needs to be replaced, and creates a grinding tool D replacement command. Specifically, the replacement command generation unit 50c monitors, for example, the number of substrates W ground by the grinding tool D, the amount of wear of the grinding tool D, or the time elapsed since the grinding tool D was mounted. When the value reaches the set value, a replacement command will be made. The generated replacement command is sent to the control unit 76 of the replacement device 7 by wireless or wired. The replacement device 7 and the grinding device 40 can also send and receive signals through an external computer. The replacement device 7 moves to the grinding device 40 when receiving the replacement command and receiving the request from the grinding device 40 .

位置檢測部50d以檢測部53檢測更換裝置7之移行台73是否已到達更換磨削工具D之位置(例如圖5所示之位置)。更換磨削工具D之位置設定於外蓋44之外部,兼作安裝磨削工具D之位置與卸除磨削工具D之位置。檢測部53檢測例如更換裝置7之移行台73已到達外蓋44之外部的設定位置。檢測部53安裝於例如外蓋44之外壁面,並安裝於進入口44a之上方。檢測部53為例如照相機等。The position detecting part 50d uses the detecting part 53 to detect whether the moving table 73 of the changing device 7 has reached the position for changing the grinding tool D (such as the position shown in FIG. 5 ). The position for replacing the grinding tool D is set outside the outer cover 44, which is also used as a position for installing the grinding tool D and a position for removing the grinding tool D. The detecting unit 53 detects that, for example, the moving table 73 of the changing device 7 has reached a set position outside the outer cover 44 . The detection part 53 is installed, for example, on the outer wall surface of the outer cover 44, and is installed above the inlet 44a. The detection unit 53 is, for example, a camera or the like.

開關控制部50e控制擋門45之移動機構46,而控制擋門45之位置。當更換裝置7之移行台73到達更換磨削工具D之位置時,開關控制部50e便將擋門45之位置從閉位置變更成開位置。又,當更換裝置7之移行台73從更換磨削工具D之位置退出時,開關控制部50e便將擋門45之位置從開位置變更至閉位置。The switch control unit 50 e controls the moving mechanism 46 of the shutter 45 to control the position of the shutter 45 . When the moving table 73 of the changing device 7 reaches the position for changing the grinding tool D, the switch control unit 50e changes the position of the shutter 45 from the closed position to the open position. Also, when the moving table 73 of the changing device 7 withdraws from the position for changing the grinding tool D, the switch control unit 50e changes the position of the shutter 45 from the open position to the closed position.

負壓控制部50f控制排氣管路47a之氣壓控制器47b,使外蓋44之內部比外部負壓。負壓控制部50f至少在擋門45開放外蓋44之進入口44a的期間,使外蓋44之內部比外部負壓。The negative pressure control unit 50f controls the air pressure controller 47b of the exhaust pipeline 47a to make the inside of the outer cover 44 negative in pressure compared to the outside. The negative pressure control unit 50f makes the inside of the outer cover 44 have a negative pressure than the outside at least while the shutter 45 opens the inlet 44a of the outer cover 44 .

清洗控制部50g於擋門45開放外蓋44之進入口44a前,控制清洗機構48,對磨削工具D或磨削工具D之周邊構件供應清洗液。清洗液之供應於例如磨削工具D之更換指令作成後實施。此外,清洗液之供應亦可於也在基板W磨削中或磨削結束時實施。The cleaning control unit 50g controls the cleaning mechanism 48 to supply the cleaning liquid to the grinding tool D or peripheral components of the grinding tool D before the door 45 opens the inlet 44a of the outer cover 44 . The supply of the cleaning liquid is implemented after the replacement command of the grinding tool D is made, for example. In addition, the supply of the cleaning liquid may also be performed during grinding of the substrate W or at the end of grinding.

自動設置控制部50h當磨削工具D之更換結束,更換裝置7從更換磨削工具D之位置退出時,便實施自動設置。自動設置包含例如未使用之磨削工具D的修整或外蓋44之內部的溫度調節。The automatic setting control unit 50h executes the automatic setting when the replacement of the grinding tool D is completed and the changing device 7 withdraws from the position where the grinding tool D is replaced. Automatic settings include, for example, dressing of unused grinding tools D or temperature regulation of the interior of the outer cover 44 .

接著,就更換裝置7之控制部76的功能作說明。控制部76具有例如移行控制部76c、移動控制部76d、更換控制部76e。Next, the function of the control unit 76 of the replacement device 7 will be described. The control unit 76 has, for example, a travel control unit 76c, a movement control unit 76d, and an exchange control unit 76e.

移行控制部76c控制移行機構74,而控制移行台73之位置。舉例而言,移行控制部76c控制移行機構74,使移行台73在保管磨削工具D之位置與更換磨削工具D的位置之間移行。The traveling control unit 76c controls the traveling mechanism 74 to control the position of the traveling platform 73 . For example, the traveling control unit 76c controls the traveling mechanism 74 so that the traveling table 73 travels between the position where the grinding tool D is stored and the position where the grinding tool D is replaced.

移動控制部76d控制移動機構72,而控制更換機構71之位置。移行台73在更換磨削工具D之位置停止,當更換裝置7以從磨削裝置40發送之信號等檢測到外蓋44之進入口44a開放時,移動控制部76d便使更換機構71經由外蓋44之進入口44a,從外蓋44之外部移動至內部。又,於移行台73從更換磨削工具D之位置退出前,移動控制部76d使更換機構71經由外蓋44之進入口44a,從外蓋44之內部移動至外部。The movement control part 76d controls the movement mechanism 72, and controls the position of the replacement mechanism 71. The moving table 73 stops at the position where the grinding tool D is replaced, and when the changing device 7 detects that the entrance 44a of the outer cover 44 is opened by the signal sent from the grinding device 40, the movement control part 76d makes the changing mechanism 71 pass through the outer The inlet 44a of the cover 44 is moved from the outside of the outer cover 44 to the inside. Also, before the moving table 73 withdraws from the position for replacing the grinding tool D, the movement control unit 76d moves the replacement mechanism 71 from the inside of the outer cover 44 to the outside through the entrance 44a of the outer cover 44 .

更換控制部76e控制更換機構71,而控制磨削工具D之卸除或安裝。更換控制部76e在以固持機構71a固持磨削工具D,同時以旋轉制止機構71b制止心軸43a2之旋轉的狀態下,以操作機構71c將扣結工具E緊固或鬆開。更換控制部76e一面以拍攝裝置75監視更換機構71之動作,一面控制更換機構71。The replacement control part 76e controls the replacement mechanism 71, and controls removal or attachment of the grinding tool D. As shown in FIG. The replacement control unit 76e fastens or loosens the fastening tool E with the operating mechanism 71c while the grinding tool D is held by the holding mechanism 71a and the rotation of the spindle 43a2 is stopped by the rotation stopping mechanism 71b. The replacement control unit 76e controls the replacement mechanism 71 while monitoring the operation of the replacement mechanism 71 with the imaging device 75 .

接著,匯整說明磨削裝置40與更換裝置7之動作。磨削裝置40判斷是否需要磨削工具D之更換,來作成磨削工具D之更換指令。接著,磨削裝置40將所作成之更換指令發送至更換裝置7。又,磨削裝置40當判斷為需要磨削工具D之更換時,便停止基板W之磨削,實施以清洗機構48所行之清洗。另一方面,更換裝置7當從磨削裝置40接收更換指令時,便靠近磨削裝置40。磨削裝置40當檢測出更換裝置7之移行台73已到達更換磨削工具D之位置時,便開啟擋門45。之後,更換裝置7使更換機構71從外蓋44之進入口44a進入至內部。接著,更換裝置7從加工機構43卸除使用完畢之磨削工具D,將未使用之磨削工具D安裝於加工機構43。之後,更換裝置7使更換機構71從外蓋44之進入口44a退出至外部。此後,磨削裝置40關閉擋門45,實施自動設置控制。然後,磨削裝置40再開始基板W之磨削。此外,更換裝置7亦可具有圖中未示之清洗部或清洗工具,而於從加工機構43卸除使用完畢之磨削工具D後,將未使用之磨削工具D安裝於加工機構43前,以清洗部或清洗工具清洗加工機構43之與磨削工具D的接觸面。Next, the operations of the grinding device 40 and the replacement device 7 will be collectively described. The grinding device 40 determines whether or not the grinding tool D needs to be replaced, and generates a grinding tool D replacement command. Then, the grinding device 40 sends the generated replacement command to the replacement device 7 . Furthermore, when the grinding device 40 determines that the grinding tool D needs to be replaced, it stops grinding the substrate W and performs cleaning by the cleaning mechanism 48 . On the other hand, the replacement device 7 approaches the grinding device 40 when receiving a replacement command from the grinding device 40 . When the grinding device 40 detects that the moving table 73 of the changing device 7 has arrived at the position for changing the grinding tool D, it opens the blocking door 45 . Afterwards, the replacement device 7 allows the replacement mechanism 71 to enter the inside from the inlet 44 a of the outer cover 44 . Next, the replacement device 7 removes the used grinding tool D from the processing mechanism 43 and installs the unused grinding tool D on the processing mechanism 43 . After that, the replacement device 7 makes the replacement mechanism 71 withdraw from the inlet 44 a of the outer cover 44 to the outside. Thereafter, the grinding device 40 closes the shutter 45 and implements automatic setting control. Then, the grinding device 40 starts grinding the substrate W again. In addition, the replacement device 7 may also have a cleaning part or a cleaning tool not shown in the figure, and after the used grinding tool D is removed from the processing mechanism 43, the unused grinding tool D is installed in front of the processing mechanism 43 , the contact surface between the processing mechanism 43 and the grinding tool D is cleaned with a cleaning part or a cleaning tool.

接著,參照圖8,就第1變形例之磨削裝置40與更換裝置7作說明。以下,主要就與上述實施形態之不同點作說明。Next, referring to FIG. 8 , the grinding device 40 and the replacement device 7 according to the first modified example will be described. Hereinafter, differences from the above-mentioned embodiment will be mainly described.

本變形例之磨削裝置40的限制機構47除了排氣管路47a,還具有密封構件47c。此外,限制機構47亦可僅具有密封構件47c。密封構件47c接觸進入至外蓋44之進入口44a的更換裝置7之肢接臂等,堵住外蓋44之進入口44a。藉密封構件47c,可限制氣體之流出,而抑制微粒之流出。The restricting mechanism 47 of the grinding device 40 of this modified example has a sealing member 47c in addition to the exhaust duct 47a. In addition, the restricting mechanism 47 may only have the sealing member 47c. The sealing member 47c comes into contact with the arm or the like of the replacement device 7 that enters the inlet 44a of the outer cover 44 to block the inlet 44a of the outer cover 44 . The outflow of gas can be restricted by the sealing member 47c, and the outflow of particles can be suppressed.

密封構件47c安裝於例如擋門45,而與擋門45一同移動。擋門45設有一對,於一對擋門45相互對向之面安裝密封構件47c。一對密封構件47c將更換裝置7夾在其間而包住,而堵住外蓋44之進入口44a。密封構件47c以橡膠等可撓性材料形成,仿照更換裝置7之外形而變形。The sealing member 47 c is attached to the shutter 45 , for example, and moves together with the shutter 45 . A pair of shutter doors 45 is provided, and a sealing member 47c is attached to the surfaces of the pair of shutter doors 45 facing each other. The pair of sealing members 47c sandwich and enclose the replacement device 7 to block the entrance 44a of the outer cover 44 . The sealing member 47c is formed of a flexible material such as rubber, and deforms following the outer shape of the replacement device 7 .

當更換裝置7之移行台73到達外蓋44之外部的設定位置時,開關控制部50e便將擋門45之位置從閉位置變更成開位置。之後,移動控制部76d使更換機構71經由外蓋44之進入口44a,從外蓋44之外部移動至內部。此時,密封構件47c不接觸更換裝置7。When the moving table 73 of the replacement device 7 reaches the set position outside the outer cover 44, the switch control unit 50e changes the position of the shutter 45 from the closed position to the open position. Thereafter, the movement control unit 76 d moves the replacement mechanism 71 from the outside of the outer cover 44 to the inside through the entrance 44 a of the outer cover 44 . At this time, the sealing member 47c does not contact the replacement device 7 .

之後,開關控制部50e將擋門45之位置從開位置變更成密封位置(例如圖8所示之位置)。密封位置係密封構件47c接觸更換裝置7之肢接臂等,而堵住外蓋44之進入口44a的位置。在密封構件47c堵住進入口44a之狀態下,更換控制部76e控制更換機構71,而實施磨削工具D之卸除或安裝。Thereafter, the switch control unit 50e changes the position of the shutter 45 from the open position to the sealed position (for example, the position shown in FIG. 8 ). The sealing position is a position where the sealing member 47c contacts the arm of the replacement device 7 and blocks the inlet 44a of the outer cover 44 . The replacement control unit 76e controls the replacement mechanism 71 to remove or mount the grinding tool D in a state where the sealing member 47c blocks the inlet port 44a.

當磨削工具D之卸除或安裝結束時,開關控制部50e便將擋門45之位置從密封位置變更成開位置。接著,移動控制部76d使更換機構71經由外蓋44之進入口44a,從外蓋44之外部移動至內部。之後,移行控制部76c控制移行機構74,使移行台73從更換磨削工具D之位置移行至保管磨削工具D之位置。When the removal or installation of the grinding tool D is completed, the switch control unit 50e changes the position of the shutter 45 from the sealed position to the open position. Next, the movement control unit 76d moves the replacement mechanism 71 from the outside of the outer cover 44 to the inside through the inlet 44a of the outer cover 44 . Afterwards, the traveling control unit 76c controls the traveling mechanism 74 to move the traveling table 73 from the position where the grinding tool D is replaced to the position where the grinding tool D is stored.

接著,參照圖9,就第2變形例之磨削裝置40與更換裝置7作說明。以下,主要就與上述實施形態及上述第1變形例之不同點作說明。Next, referring to FIG. 9 , the grinding device 40 and the replacement device 7 according to the second modified example will be described. Hereinafter, differences from the above-mentioned embodiment and the above-mentioned first modified example will be mainly described.

本變形例之磨削裝置40的外蓋44具有形成進入口44a之主殼體44b、於主殼體44b之外壁面安裝成包圍主殼體44b之進入口44a的副殼體44c。主殼體44b收納作為固持基板W之固持部的吸盤42、磨削工具D安裝成可更換之加工機構43。The outer cover 44 of the grinding device 40 of this modified example has a main housing 44b forming an inlet 44a, and a sub-housing 44c mounted on the outer wall of the main housing 44b to surround the inlet 44a of the main housing 44b. The main housing 44b accommodates the suction cup 42 serving as a holding portion for holding the substrate W, and the processing mechanism 43 that is installed replaceably with the grinding tool D.

副殼體44c包含更換裝置7從副殼體44c的外部進入至內部之際通過的第2進入口44d。更換裝置7於到達更換磨削工具D之位置後,依序通過第2進入口44d及進入口44a,進入至主殼體44b之內部,在主殼體44b之內部更換磨削工具D。The sub-casing 44c includes a second inlet port 44d through which the replacement device 7 passes when entering from the outside of the sub-casing 44c to the inside. After the replacement device 7 reaches the position for replacing the grinding tool D, it enters the inside of the main casing 44b through the second inlet 44d and the inlet 44a in sequence, and replaces the grinding tool D inside the main casing 44b.

磨削裝置40具有開關副殼體44c之第2進入口44d的第2擋門61。第2擋門61基本上閉塞第2進入口44d,於更換裝置7進入時,開放第2進入口44d。相較於一直開放第2進入口44d之情形,可抑制微粒經由第2進入口44d,從外蓋44之內部流至外部,而可將工廠之房間維持乾淨。The grinding device 40 has a second shutter 61 for opening and closing the second inlet 44d of the sub-housing 44c. The second shutter 61 basically closes the second inlet 44d, and opens the second inlet 44d when the replacement device 7 enters. Compared with the case where the second inlet 44d is always open, the flow of particles from the inside to the outside of the cover 44 through the second inlet 44d can be suppressed, and the room of the factory can be kept clean.

磨削裝置40亦可具有使第2擋門61在開放第2進入口44d之第2開位置與閉塞第2進入口44d的第2閉位置之間移動的第2移動機構62。第2移動機構62係氣壓缸或電動缸等。可非手動而自動移動第2擋門61。The grinding device 40 may have a second moving mechanism 62 that moves the second shutter 61 between the second open position that opens the second inlet 44d and the second closed position that closes the second inlet 44d. The second moving mechanism 62 is a pneumatic cylinder, an electric cylinder, or the like. The second door 61 can be moved automatically instead of manually.

第2進入口44d與進入口44a同樣地,依各加工機構43而設。舉例而言,第2進入口44d係分別設於一次磨削位置A1、二次磨削位置A2、三次磨削位置A3。於各第2進入口44d設第2擋門61,依各第2進入口44d,使第2擋門61移動。The second inlet 44d is provided for each processing mechanism 43 similarly to the inlet 44a. For example, the 2nd inlet 44d is respectively provided in the primary grinding position A1, the secondary grinding position A2, and the tertiary grinding position A3. A second shutter 61 is provided at each second entrance 44d, and the second shutter 61 is moved according to each second entrance 44d.

磨削裝置40之控制部50具有圖中未示之第2開關控制部。第2開關控制部控制第2移動機構62,而控制第2擋門61之位置。當更換裝置7之移行台73到達更換磨削裝置D之位置時,第2開關控制部便將第2擋門61之位置從第2關位置變更成第2開位置。又,當更換裝置7之移行台73從更換磨削工具D之位置退出時,第2開關控制部便將第2擋門61之位置從第2開位置變更成第2關位置。The control part 50 of the grinding apparatus 40 has the 2nd switch control part which is not shown in figure. The second switch control unit controls the second moving mechanism 62 to control the position of the second shutter 61 . When the moving table 73 of the replacement device 7 arrived at the position for replacing the grinding device D, the second switch control unit changed the position of the second shutter 61 from the second closed position to the second open position. Again, when the moving table 73 of the changing device 7 withdraws from the position of changing the grinding tool D, the second switch control unit changes the position of the second blocking door 61 from the second open position to the second closed position.

磨削裝置40之限制機構47亦可具有第2密封構件47d。第2密封構件47d接觸進入至副殼體44c之第2進入口44d的更換裝置7之肢接臂等,而堵住副殼體44c之第2進入口44d。可以第2密封構件47d,限制氣體之流出而抑制微粒之流出。The restriction mechanism 47 of the grinding apparatus 40 may have the 2nd sealing member 47d. The second sealing member 47d contacts the arm or the like of the replacement device 7 entering the second inlet 44d of the sub-case 44c to block the second inlet 44d of the sub-case 44c. The outflow of gas can be restricted by the second sealing member 47d to suppress the outflow of fine particles.

第2密封構件47d安裝於例如第2擋門61,而與第2擋門61一同移動。第2擋門61設有一對,於一對第2擋門61相互對向之面安裝第2密封構件47d。一對第2密封構件47d將更換裝置7夾在其間而包住,堵住外蓋44之第2進入口44d。第2密封構件47d以橡膠等可撓性材料形成,仿照更換裝置7之外形而變形。The second sealing member 47 d is attached to, for example, the second shutter 61 and moves together with the second shutter 61 . A pair of 2nd shutter 61 is provided, and 2nd sealing member 47d is attached to the surface which a pair of 2nd shutter 61 opposes mutually. The pair of second sealing members 47d sandwich and enclose the replacement device 7 to block the second inlet port 44d of the outer cover 44 . The second sealing member 47d is formed of a flexible material such as rubber, and deforms following the outer shape of the replacement device 7 .

當更換裝置7之移行台73到達外蓋44之外部的設定位置時,第2開關控制部便將第2擋門61之位置從第2關位置變更成第2開位置。之後,移動控制部76d使更換機構71經由副殼體44c之第2進入口44d,從副殼體44c之外部移動至內部。此時,第2密封構件47d不接觸更換裝置7。When the moving platform 73 of the replacement device 7 arrived at the outside set position of the outer cover 44, the second switch control unit changed the position of the second blocking door 61 from the second closed position to the second open position. Thereafter, the movement control unit 76d moves the replacement mechanism 71 from the outside of the sub-casing 44c to the inside through the second inlet 44d of the sub-casing 44c. At this time, the second sealing member 47d does not contact the replacement device 7 .

之後,第2開關控制部將第2擋門61之位置從第2開位置變更成第2密封位置(例如圖9所示之位置)。第2密封位置係第2密封構件47d接觸更換裝置7之肢接臂等,而堵住副殼體44c之第2進入口44d的位置。在第2密封構件47d堵住第2進入口44d之狀態下,開關控制部50e將擋門45之位置從閉位置變更成開位置。接著,移動控制部76d使更換機構71經由主殼體44b之進入口44a,從主殼體44b之外部移動至內部。然後,開關控制部50e將擋門45之位置從開位置變更成密封位置。之後,更換控制部76e控制更換機構71,實施磨削工具D之卸除或安裝。此外,當第2密封構件47d安裝於第2擋門61時,若第2密封構件47d堵住副殼體44c之第2進入口44d,可抑制微粒之流出。是故,沒有密封構件47c亦無妨。惟,若亦有密封構件47c,可更抑制微粒之流出。Thereafter, the second switch control unit changes the position of the second shutter 61 from the second open position to the second sealed position (for example, the position shown in FIG. 9 ). The second sealing position is a position where the second sealing member 47d contacts the arm of the replacement device 7 and blocks the second inlet 44d of the sub-housing 44c. In the state where the second sealing member 47d blocks the second inlet port 44d, the opening and closing control unit 50e changes the position of the shutter 45 from the closed position to the open position. Next, the movement control unit 76d moves the replacement mechanism 71 from the outside of the main casing 44b to the inside through the inlet 44a of the main casing 44b. Then, the switch control unit 50e changes the position of the shutter 45 from the open position to the sealed position. Thereafter, the replacement control unit 76e controls the replacement mechanism 71 to remove or mount the grinding tool D. As shown in FIG. In addition, when the second sealing member 47d is attached to the second shutter 61, if the second sealing member 47d blocks the second inlet 44d of the sub-housing 44c, the outflow of particles can be suppressed. Therefore, it does not matter if there is no sealing member 47c. However, if the sealing member 47c is also provided, the outflow of fine particles can be further suppressed.

當磨削工具D之卸除或安裝結束時,開關控制部50e將擋門45之位置從密封位置變更成開位置。接著,移動控制部76d使更換機構71經由主殼體44b之進入口44a,從主殼體44b之內部移動至外部。然後,開關控制部50e將擋門45之位置從開位置變更成閉位置。之後,第2開關控制部將第2擋門61之位置從第2密封位置變更成第2開位置。接著,移動控制部76d使更換機構71經由副殼體44c之第2進入口44d,從副殼體44c之內部移動至外部。之後,移行控制部76c控制移行機構74,使移行台73從更換磨削工具D之位置移行至保管磨削工具D之位置。如此,藉不同時開放進入口44a與進入口44d,而閉塞至少一者,可防止主殼體44b之內部對磨削裝置40之外部開放。When the removal or attachment of the grinding tool D is completed, the switch control unit 50e changes the position of the shutter 45 from the sealed position to the open position. Next, the movement control unit 76d moves the replacement mechanism 71 from the inside of the main casing 44b to the outside through the inlet 44a of the main casing 44b. Then, the switch control unit 50e changes the position of the shutter 45 from the open position to the closed position. Thereafter, the second switch control unit changes the position of the second shutter 61 from the second sealed position to the second open position. Next, the movement control unit 76d moves the replacement mechanism 71 from the inside of the sub-casing 44c to the outside through the second inlet 44d of the sub-casing 44c. Afterwards, the traveling control unit 76c controls the traveling mechanism 74 to move the traveling table 73 from the position where the grinding tool D is replaced to the position where the grinding tool D is stored. Thus, by blocking at least one of the inlet port 44a and the inlet port 44d at the same time, it is possible to prevent the inside of the main housing 44b from being opened to the outside of the grinding device 40 .

接著,參照圖10,就第3變形例之磨削裝置40與更換裝置7作說明。以下,主要就與上述實施形態、上述第1變形例及上述第2變形例之不同點作說明。Next, referring to FIG. 10 , a grinding device 40 and a replacement device 7 according to a third modified example will be described. Hereinafter, differences from the above-mentioned embodiment, the above-mentioned first modification example, and the above-mentioned second modification example will be mainly described.

本變形例之更換裝置7具有安裝於移行台73之殼體77。殼體77以收納有更換機構71與移動機構72之狀態,接觸外蓋44之外壁面,而密閉殼體77之內部。殼體77亦可於與外蓋44之接觸面具有密封構件77a。The replacement device 7 of this modified example has a casing 77 mounted on a moving table 73 . The casing 77 contacts the outer wall surface of the outer cover 44 in a state where the replacement mechanism 71 and the moving mechanism 72 are accommodated, thereby sealing the inside of the casing 77 . The casing 77 may also have a sealing member 77 a on the contact surface with the outer cover 44 .

當擋門45開放外蓋44之進入口44a時,殼體77之內部與外蓋44之內部藉由外蓋44之進入口44a連通。在此狀態下,實施磨削工具D之更換。可以殼體77限制氣體之流出,而可抑制微粒之流出,可將工廠之房間維持乾淨。When the door 45 opens the inlet 44 a of the outer cover 44 , the inside of the casing 77 communicates with the inside of the outer cover 44 through the inlet 44 a of the outer cover 44 . In this state, the grinding tool D is replaced. The casing 77 can limit the outflow of gas, thereby suppressing the outflow of particles, and keeping the room of the factory clean.

此外,如圖9所示,當外蓋44有主殼體44b及副殼體44c時,殼體77接觸副殼體44c之外壁面。當第2擋門61開放副殼體44c之第2進入口44d,且擋門45開放主殼體44b之進入口44a時,殼體77之內部與主殼體44b之內部連通。In addition, as shown in FIG. 9, when the outer cover 44 has a main case 44b and a sub-case 44c, the case 77 contacts the outer wall of the sub-case 44c. When the second shutter 61 opens the second inlet 44d of the auxiliary housing 44c, and the shutter 45 opens the inlet 44a of the main housing 44b, the inside of the housing 77 communicates with the inside of the main housing 44b.

附帶一提,如圖6所示,加工機構43包含磨削工具D安裝成可更換之安裝部(例如凸緣43a1)、扣結凸緣43a1與磨削工具D之扣結工具E。扣結工具E係例如螺栓。扣結工具E從凸緣43a1之上方扣結凸緣43a1與磨削工具D。舉例而言,扣結工具E插穿將凸緣43a1於上下方向貫穿之直孔,而擰入形成於磨削工具D(詳而言之為磨輪D1)之上面的螺孔。扣結工具E之操作以操作機構71c進行。如圖6所示,操作機構71c在凸緣43a1之上方緊固或鬆開扣結工具E。Incidentally, as shown in FIG. 6 , the machining mechanism 43 includes a replaceable mounting part (such as a flange 43a1 ) for mounting the grinding tool D, and a fastening tool E for fastening the flange 43a1 and the grinding tool D. The fastening tool E is, for example, a bolt. The fastening tool E fastens the flange 43a1 and the grinding tool D from above the flange 43a1. For example, the fastening tool E is inserted into a straight hole through which the flange 43a1 penetrates in the vertical direction, and is screwed into a screw hole formed on the upper surface of the grinding tool D (specifically, the grinding wheel D1). The operation of the fastening tool E is performed by the operating mechanism 71c. As shown in FIG. 6, the operating mechanism 71c tightens or loosens the fastening tool E over the flange 43a1.

有於凸緣43a1之上方設覆蓋心軸43a2之蓋等,以保護心軸43a2避開包含磨削屑之磨削液的情形。當設蓋等時,操作機構71c不易進入至凸緣43a1之上方,而難以操作扣結工具E。A cover or the like covering the mandrel 43a2 may be provided above the flange 43a1 to protect the mandrel 43a2 from grinding fluid containing grinding chips. When a cover or the like is provided, it is difficult for the operating mechanism 71c to enter above the flange 43a1, and it is difficult to operate the fastening tool E.

是故,如圖12所示,扣結工具E亦可從凸緣43a1之旁側扣結凸緣43a1與磨削工具D。或者,扣結工具E亦可從凸緣43a1之斜下方扣結凸緣43a1與磨削工具D。無論如何,即使蓋等存在於凸緣43a1之上方時,由於操作機構71c不進入至凸緣43a1之上方,故操作機構71c易操作扣結工具E。Therefore, as shown in FIG. 12, the fastening tool E can also fasten the flange 43a1 and the grinding tool D from the side of the flange 43a1. Alternatively, the fastening tool E can fasten the flange 43a1 and the grinding tool D from obliquely below the flange 43a1. In any case, even if a cover or the like exists above the flange 43a1, since the operating mechanism 71c does not enter above the flange 43a1, the fastening tool E can be easily operated by the operating mechanism 71c.

如圖12所示,凸緣43a1具有例如圓盤狀上部凸緣101、外徑小於上部凸緣101之圓盤狀下部凸緣102。另一方面,磨削工具D包含嵌合下部凸緣102之環部111、堵住環部111之下方的圓盤部112、沿著圓盤部112之外周排列的複數之磨石113。As shown in FIG. 12 , the flange 43a1 has, for example, a disc-shaped upper flange 101 and a disc-shaped lower flange 102 whose outer diameter is smaller than that of the upper flange 101 . On the other hand, the grinding tool D includes a ring portion 111 fitted with the lower flange 102 , a disk portion 112 blocking the lower portion of the ring portion 111 , and a plurality of grinding stones 113 arranged along the outer periphery of the disk portion 112 .

如圖12所示,扣結工具E之軸方向亦可為與心軸43a2之旋轉中心線R3垂直相交的方向。扣結工具E插入至例如將磨削工具D(詳而言之為環部111)於徑向貫穿之直孔,而擰入形成於凸緣43a1(詳而言之為下部凸緣102)之外周面的螺孔。As shown in FIG. 12, the axial direction of the fastening tool E may also be a direction perpendicular to the rotation center line R3 of the mandrel 43a2. The fastening tool E is inserted into, for example, a straight hole through which the grinding tool D (specifically, the ring portion 111 ) penetrates radially, and is screwed into a hole formed on the flange 43a1 (specifically, the lower flange 102 ). Screw holes on the outer peripheral surface.

或者,如圖13所示,扣結工具E之軸方向亦可為傾斜成越遠離心軸43a2之旋轉中心線R3,越往下方之方向。扣結工具E插入至例如將磨削工具D斜向貫穿之直孔,而擰入形成於凸緣43a1之下面的螺孔。Alternatively, as shown in FIG. 13 , the axial direction of the fastening tool E can also be inclined so that the farther away from the rotation center line R3 of the mandrel 43a2, the lower the direction. The fastening tool E is inserted into, for example, a straight hole through which the grinding tool D is obliquely penetrated, and is screwed into a screw hole formed on the lower surface of the flange 43a1.

如圖14所示,更換機構71具有固持磨削工具D之固持機構71a。固持機構71a從下方固持例如磨削工具D。固持機構71a隔著例如後述之第1旋轉機構71d,設於肢接臂72a之前端。肢接臂72a之前端從旁側進入至加工機構43之下方,而被舉起至上方。之後,固持機構71a接觸磨削工具D而固持磨削工具D。As shown in FIG. 14, the exchange mechanism 71 has the holding mechanism 71a which holds the grinding tool D. As shown in FIG. The holding mechanism 71a holds, for example, a grinding tool D from below. The holding mechanism 71a is provided at the front end of the limb joint arm 72a through, for example, a first rotation mechanism 71d to be described later. The front end of the limb connecting arm 72a enters below the processing mechanism 43 from the side and is lifted up. After that, the holding mechanism 71a contacts the grinding tool D to hold the grinding tool D. As shown in FIG.

更換機構71亦可具有使固持機構71a旋轉之第1旋轉機構71d。固持機構71a固持磨削工具D時,固持機構71a之旋轉中心線與心軸43a2之旋轉中心線R3一致。藉第1旋轉機構71d使固持機構71a旋轉,可使磨削工具D及凸緣43a1同時旋轉,而可將扣結工具E朝向操作機構71c。因而,可使操作機構71c之動作簡化。The replacement mechanism 71 may have the 1st rotation mechanism 71d which rotates the holding mechanism 71a. When the holding mechanism 71a holds the grinding tool D, the rotation centerline of the holding mechanism 71a coincides with the rotation centerline R3 of the spindle 43a2. When the holding mechanism 71a is rotated by the first rotating mechanism 71d, the grinding tool D and the flange 43a1 can be rotated simultaneously, and the fastening tool E can be directed toward the operating mechanism 71c. Therefore, the operation of the operating mechanism 71c can be simplified.

當扣結工具E於磨削工具D之周向隔著間隔設複數個時,控制部76反覆實施以第1旋轉機構71d使固持機構71a旋轉的動作及以操作機構71c鬆開扣結工具E之動作。操作機構71c鬆開扣結工具E前,將固持機構71a之旋轉停止而使扣結工具E朝向操作機構71c。此時,控制部76亦可使用圖6所示之拍攝裝置75,監視扣結工具E之位置,判斷扣結工具E之位置是否為所期之位置,而控制固持機構71a之旋轉停止位置。當卸除所有扣結工具E時,便可解除磨削工具D與加工機構43之扣結。When a plurality of fastening tools E are provided at intervals in the circumferential direction of the grinding tool D, the control unit 76 repeatedly executes the operation of rotating the holding mechanism 71a by the first rotating mechanism 71d and releasing the fastening tool E by the operating mechanism 71c. action. Before the operating mechanism 71c releases the fastening tool E, the rotation of the holding mechanism 71a is stopped so that the fastening tool E faces the operating mechanism 71c. At this time, the control unit 76 can also use the photographing device 75 shown in FIG. 6 to monitor the position of the fastening tool E, determine whether the position of the fastening tool E is the expected position, and control the rotation stop position of the holding mechanism 71a. When all fastening tools E are removed, the fastening of the grinding tool D and the processing mechanism 43 can be released.

更換機構71亦可如圖15所示,具有對磨削工具D與加工機構43之間供應氣體之氣體供應機構71e,以支援磨削工具D與加工機構43之分離。氣體供應機構71e包含噴吐氣體之噴嘴121。噴嘴121對例如上部凸緣101之下面與環部111的上面之間隙供應氣體。藉氣體之速壓,可易將磨削工具D與加工機構43剝離。The replacement mechanism 71 may also have a gas supply mechanism 71e for supplying gas between the grinding tool D and the processing mechanism 43 as shown in FIG. 15 to support the separation of the grinding tool D and the processing mechanism 43 . The gas supply mechanism 71e includes a nozzle 121 for blowing out gas. The nozzle 121 supplies gas to, for example, a gap between the lower surface of the upper flange 101 and the upper surface of the ring portion 111 . With the rapid pressure of the gas, the grinding tool D can be easily separated from the processing mechanism 43 .

亦可如圖16所示,於磨削工具D形成有將從噴嘴121供應之氣體引導至磨削工具D與加工機構43的接觸面之孔114。孔114將從噴嘴121供應之氣體引導至例如凸緣43a1之下面與磨削工具D的上面之間隙。孔114可為專用孔,亦可與安裝扣結工具E之孔(例如直孔或螺孔)兼用。As shown in FIG. 16 , the grinding tool D may be formed with a hole 114 for guiding the gas supplied from the nozzle 121 to the contact surface between the grinding tool D and the machining mechanism 43 . The hole 114 guides the gas supplied from the nozzle 121 to, for example, the gap between the lower side of the flange 43a1 and the upper side of the grinding tool D. As shown in FIG. The hole 114 can be a dedicated hole, and can also be used together with the hole for installing the fastening tool E (such as a straight hole or a screw hole).

如圖17所示,更換機構71亦可具有使加工機構43之心軸43a2旋轉的第2旋轉機構71f。第2旋轉機構71f包含例如輥131。輥131之旋轉中心線對心軸43a2之旋轉中心線R3平行,輥131與凸緣43a1接觸。當使輥131旋轉時,便藉摩擦使凸緣43a1旋轉。As shown in FIG. 17, the exchange mechanism 71 may have the 2nd rotation mechanism 71f which rotates the spindle 43a2 of the processing mechanism 43. As shown in FIG. 71 f of 2nd rotation mechanisms include the roller 131, for example. The rotation center line of the roller 131 is parallel to the rotation center line R3 of the spindle 43a2, and the roller 131 is in contact with the flange 43a1. When the roller 131 is rotated, the flange 43a1 is rotated by friction.

第2旋轉機構71f於將磨削工具D安裝於凸緣43a1前,使凸緣43a1旋轉,而將凸緣43a1之安裝扣結工具E的孔105(例如螺孔或直孔)朝向所期之方向。此時,控制部76亦可使用圖6所示之拍攝裝置75,監視凸緣43a1之方向,判斷凸緣43a1之方向是否為所期之方向來控制凸緣43a1之旋轉停止位置。The second rotating mechanism 71f rotates the flange 43a1 before the grinding tool D is installed on the flange 43a1, and the hole 105 (such as a screw hole or a straight hole) of the mounting fastening tool E of the flange 43a1 is directed toward the desired position. direction. At this time, the control unit 76 can also use the imaging device 75 shown in FIG. 6 to monitor the direction of the flange 43a1, and determine whether the direction of the flange 43a1 is the expected direction to control the rotation stop position of the flange 43a1.

又,如圖17所示,第1旋轉機構71d於將磨削工具D安裝於凸緣43a1前,使磨削工具D旋轉,而將磨削工具D之安裝扣結工具E的孔115(例如直孔或螺孔)朝向所期之方向。此時,控制部76亦可使用圖6所示之拍攝裝置75,監視磨削工具D之方向,判斷磨削工具D之方向是否為所期之方向來控制磨削工具D之旋轉停止位置。之後,肢接臂72a之前端被舉起至上方,磨削工具D接觸凸緣43a1。Also, as shown in FIG. 17, the first rotating mechanism 71d rotates the grinding tool D before the grinding tool D is mounted on the flange 43a1, and the hole 115 (such as straight hole or screw hole) in the desired direction. At this time, the control unit 76 can also use the camera 75 shown in FIG. 6 to monitor the direction of the grinding tool D, and determine whether the direction of the grinding tool D is the desired direction to control the rotation stop position of the grinding tool D. Thereafter, the front end of the limb arm 72a is lifted upward, and the grinding tool D contacts the flange 43a1.

使磨削工具D之安裝扣結工具E的孔115之方向與凸緣43a1之安裝扣結工具E的孔105之方向對齊。將任一組孔115、105之方向朝向操作機構71c。之後,肢接臂72a之前端被舉起至上方,磨削工具D接觸凸緣43a1。接著,操作機構71c以扣結工具E扣結磨削工具D與凸緣43a1。之後,控制部76反覆實施以第1旋轉機構71d使固持機構71a旋轉之動作及以操作機構71c緊固扣結工具E之動作。此時,控制部76亦可使用圖6所示之拍攝裝置75,監視孔115、105之位置,判斷孔115、105之位置是否為所期之位置來控制固持機構71a之旋轉停止位置。當緊固所有扣結工具E時,磨削工具D與加工機構43之扣結完畢。The direction of the hole 115 for attaching the fastening tool E of the grinding tool D is aligned with the direction of the hole 105 for attaching the fastening tool E of the flange 43a1. Orient any one set of holes 115, 105 toward the operating mechanism 71c. Thereafter, the front end of the limb arm 72a is lifted upward, and the grinding tool D contacts the flange 43a1. Next, the operating mechanism 71c uses the fastening tool E to fasten the grinding tool D and the flange 43a1. Thereafter, the control unit 76 repeatedly executes the operation of rotating the holding mechanism 71a by the first rotation mechanism 71d and the operation of fastening the fastening tool E by the operation mechanism 71c. At this time, the control unit 76 can also use the photographing device 75 shown in FIG. 6 to monitor the positions of the holes 115 and 105, and determine whether the positions of the holes 115 and 105 are expected to control the rotation stop position of the holding mechanism 71a. When all fastening tools E are fastened, the fastening of the grinding tool D and the processing mechanism 43 is completed.

以上,就本發明之加工裝置、加工裝置之加工工具的安裝方法、更換裝置、及更換方法作了說明,本發明不限於上述實施形態等。在記載於申請專利範圍之範疇內,可進行各種變更、修正、置換、附加、刪除及組合。此等亦當然屬於本發明之技術範圍。In the above, the processing device of the present invention, the method of installing the processing tool of the processing device, the replacement device, and the replacement method have been described, but the present invention is not limited to the above-mentioned embodiments and the like. Various changes, amendments, substitutions, additions, deletions, and combinations are possible within the scope of the patent application. These also naturally belong to the technical scope of the present invention.

舉例而言,本發明之加工裝置在上述實施形態為磨削裝置,亦可為切削裝置或切斷裝置等。此外,磨削包含研磨。加工裝置只要為具有加工工具安裝成可更換之加工機構的裝置即可。當加工裝置為切削裝置時,端銑刀等切削工具於加工機構安裝成可更換。又,當加工裝置為切斷裝置時,刀片等切斷工具於加工機構安裝成可更換。加工工具只要為接觸處理體來加工處理體之物即可。加工工具當接觸處理體而磨損時便更換。For example, the processing device of the present invention is a grinding device in the above embodiment, but may also be a cutting device or a cutting device. In addition, grinding includes grinding. The processing device should just be a device having a processing mechanism in which a processing tool is mounted so as to be replaceable. When the processing device is a cutting device, cutting tools such as end mills are installed in the processing mechanism so as to be replaceable. Also, when the processing device is a cutting device, cutting tools such as blades are attached to the processing mechanism so as to be replaceable. The processing tool should just be what contacts a processing object and processes a processing object. The processing tools are replaced as they wear out from contact with the process body.

又,以本發明之加工裝置加工的處理體在上述實施形態為基板W,但不限基板W。Also, the processed object processed by the processing apparatus of the present invention is the substrate W in the above embodiment, but the substrate W is not limited thereto.

本申請案主張依據2020年5月1日向日本特許廳提申之日本專利申請案2020-081377號的優先權,於本申請案引用日本專利申請案2020-081377號之所有內容。This application claims priority based on Japanese Patent Application No. 2020-081377 filed with the Japan Patent Office on May 1, 2020, and all content of Japanese Patent Application No. 2020-081377 is cited in this application.

1:磨削系統 2:搬入搬出部 3:清洗部 4:磨削部 5:控制部 7:更換裝置 8:貯存庫 9:保管部 21:載置台 22:載置板 23:第1搬運區域 24:第1搬運裝置 24a:第1搬運臂 31:第1清洗裝置 32:第2清洗裝置 33:第3清洗裝置 34:檢測裝置 35:過渡裝置 36:第2搬運區域 37:第2搬運裝置 37a:第2搬運臂 38:第3搬運區域 39:第3搬運裝置 39a:吸附墊 40:磨削裝置(加工裝置) 41:台 42:吸盤(固持部) 43:加工機構 43a:可動部 43a1:凸緣 43a2:心軸 43a3:心軸馬達 43b:升降部 43b1:Z軸導件 43b2:Z軸滑動器 43b3:Z軸馬達 43b4:位置檢測器 44:外蓋 44a:進入口 44b:主殼體 44c:副殼體 44d:第2進入口 45:擋門 46:移動機構 47:限制機構 47a:排氣管路 47b:氣壓控制器 47c:密封構件 47d:第2密封構件 48:清洗機構 50:控制部 50a:CPU 50b:記憶媒體 50c:更換指令作成部 50d:位置檢測部 50e:開關控制部 50f:負壓控制部 50g:清洗控制部 50h:自動設置控制部 51:CPU 52:記憶媒體 53:檢測部 61:第2擋門 62:第2移動機構 71:更換機構 71a:固持機構 71b:旋轉制止機構 71d:第1旋轉機構 71e:氣體供應機構 71f:第2旋轉機構 72:移動機構 73:移行台 74:移行機構 75:拍攝裝置 76:控制部 76a:CPU 76b:記憶媒體 76c:移行控制部 76d:移動控制部 76e:更換控制部 77:殼體 101:上部凸緣 102:下部凸緣 105:孔 111:環部 112:圓盤部 113:磨石 114:孔 115:孔 121:噴嘴 131:輥 A0:搬入搬出位置 A1:一次磨削位置 A2:二次磨削位置 A3:三次磨削位置 C:匣 D:磨削工具(加工工具) D1:磨輪 D2:磨石 E:扣結工具 F:容器 R1:旋轉中心線 R2:旋轉中心線 W:基板(處理體) X:方向 Y:方向 Z:方向 1: Grinding system 2: Import and export department 3: cleaning department 4: Grinding department 5: Control Department 7: Replacement device 8: Repository 9: Storage department 21: Carrying table 22: Loading plate 23: The first handling area 24: The first conveying device 24a: The first transport arm 31: The first cleaning device 32: The second cleaning device 33: The third cleaning device 34: Detection device 35: Transition device 36: The second handling area 37: The second conveying device 37a: The second transport arm 38: The 3rd handling area 39: The third handling device 39a: Adsorption pad 40: Grinding device (processing device) 41: Taiwan 42: suction cup (holding part) 43: Processing mechanism 43a: Movable part 43a1: Flange 43a2: mandrel 43a3: spindle motor 43b: Lifting part 43b1: Z-axis guide 43b2: Z-axis slider 43b3: Z-axis motor 43b4: Position detector 44: outer cover 44a: entrance 44b: main housing 44c: Sub-housing 44d: 2nd entrance 45: door stop 46: Mobile Mechanism 47: Restricted institutions 47a: exhaust pipe 47b: Air pressure controller 47c: sealing member 47d: 2nd sealing member 48: cleaning mechanism 50: Control Department 50a: CPU 50b: memory media 50c: Replacement instruction making part 50d: position detection unit 50e: switch control part 50f: Negative pressure control unit 50g: cleaning control part 50h: Automatic setting control section 51:CPU 52: memory media 53: Detection Department 61: The second door 62: The second moving mechanism 71: Replacement mechanism 71a: holding mechanism 71b: Rotation stop mechanism 71d: 1st rotating mechanism 71e: Gas supply mechanism 71f: Second rotating mechanism 72: Mobile Mechanism 73: Moving platform 74: Migration Agency 75: Shooting device 76: Control Department 76a: CPU 76b: Memory media 76c: Department of Migration Control 76d: Mobile Control Department 76e: Replace the control unit 77: Shell 101: Upper flange 102: Lower flange 105: hole 111: ring department 112: Disc Department 113: millstone 114: hole 115: hole 121: Nozzle 131: roll A0: Moving in and out position A1: primary grinding position A2: Secondary grinding position A3: Third grinding position C: Cassette D: Grinding tools (processing tools) D1: grinding wheel D2: Millstone E: Knot tool F: container R1: Centerline of rotation R2: Centerline of rotation W: substrate (processing body) X: direction Y: Direction Z: Direction

圖1係顯示工廠之佈置的一例之平面圖。 圖2係顯示工廠之佈置的另一例之平面圖。 圖3係顯示磨削系統之一例的平面圖。 圖4係顯示一實施形態之磨削裝置的加工機構之剖面圖。 圖5係顯示一實施形態之磨削裝置與更換裝置的剖面圖。 圖6係放大圖5之一部分的剖面圖。 圖7係以功能塊顯示一實施形態之磨削裝置與更換裝置各自之控制部的構成要件之圖。 圖8係顯示第1變形例之磨削裝置與更換裝置的剖面圖。 圖9係顯示第2變形例之磨削裝置與更換裝置的剖面圖。 圖10係顯示第3變形例之磨削裝置與更換裝置的剖面圖。 圖11係顯示具有保管部之更換裝置的一例之平面圖。 圖12係顯示扣結工具之第1變形例的剖面圖。 圖13係顯示扣結工具之第2變形例的剖面圖。 圖14係顯示第1旋轉機構之一例的剖面圖。 圖15係顯示氣體供應機構之一例的剖面圖。 圖16係顯示氣體供應機構之另一例的剖面圖。 圖17係顯示第2旋轉機構之一例的剖面圖。 Fig. 1 is a plan view showing an example of the layout of a factory. Fig. 2 is a plan view showing another example of factory layout. Fig. 3 is a plan view showing an example of a grinding system. Fig. 4 is a cross-sectional view showing a processing mechanism of a grinding device according to an embodiment. Fig. 5 is a cross-sectional view showing a grinding device and a replacement device according to an embodiment. FIG. 6 is an enlarged sectional view of a part of FIG. 5 . Fig. 7 is a diagram showing the components of the respective control units of the grinding device and the replacement device according to an embodiment in functional blocks. Fig. 8 is a cross-sectional view showing a grinding device and a replacement device according to a first modified example. Fig. 9 is a cross-sectional view showing a grinding device and a replacement device according to a second modified example. Fig. 10 is a cross-sectional view showing a grinding device and a replacement device according to a third modified example. Fig. 11 is a plan view showing an example of a replacement device having a storage unit. Fig. 12 is a sectional view showing a first modified example of the fastening tool. Fig. 13 is a sectional view showing a second modified example of the fastening tool. Fig. 14 is a sectional view showing an example of the first rotating mechanism. Fig. 15 is a sectional view showing an example of the gas supply mechanism. Fig. 16 is a sectional view showing another example of the gas supply mechanism. Fig. 17 is a sectional view showing an example of the second rotation mechanism.

7:更換裝置 7: Replacement device

40:磨削裝置(加工裝置) 40: Grinding device (processing device)

42:吸盤(固持部) 42: suction cup (holding part)

43:加工機構 43: Processing mechanism

43a1:凸緣 43a1: Flange

43a2:心軸 43a2: mandrel

43a3:心軸馬達 43a3: spindle motor

44:外蓋 44: outer cover

44a:進入口 44a: entrance

45:擋門 45: door stop

46:移動機構 46: Mobile Mechanism

47:限制機構 47: Restricted institutions

47a:排氣管路 47a: exhaust pipe

47b:氣壓控制器 47b: Air pressure controller

48:清洗機構 48: cleaning mechanism

50:控制部 50: Control Department

50a:CPU 50a: CPU

50b:記憶媒體 50b: memory media

53:檢測部 53: Detection Department

71:更換機構 71: Replacement mechanism

72:移動機構 72: Mobile Mechanism

73:移行台 73: Moving platform

74:移行機構 74: Migration agency

75:拍攝裝置 75: Shooting device

76:控制部 76: Control Department

76a:CPU 76a: CPU

76b:記憶媒體 76b: Memory media

A1:一次磨削位置 A1: primary grinding position

D:磨削工具(加工工具) D: Grinding tools (processing tools)

E:扣結工具 E: Knot tool

F:容器 F: container

X:方向 X: direction

Y:方向 Y: Direction

Z:方向 Z: Direction

Claims (14)

一種更換裝置,其係為在加工裝置使用之加工工具的更換裝置,該加工裝置具有:固持部,用以固持處理體;加工機構,將用以加工固持於該固持部之該處理體的該加工工具以可更換方式安裝;及外蓋,收納該固持部與該加工機構, 該更換裝置包含: 更換機構,將該加工工具安裝於該加工機構或從該加工機構卸除該加工工具; 移動機構,使該更換機構經由該外蓋之進入口,從該外蓋之外部移動至內部; 移行台,支持該移動機構;及 移行機構,使該移行台移行。 A replacement device, which is a replacement device for a processing tool used in a processing device, the processing device has: a holding part for holding a processing object; a processing mechanism for processing the processing object held in the holding part The processing tool is installed in a replaceable manner; and the outer cover accommodates the holding part and the processing mechanism, This replacement set contains: changing the mechanism, installing the processing tool on the processing mechanism or removing the processing tool from the processing mechanism; a moving mechanism for moving the replacement mechanism from the outside of the cover to the inside through the entrance of the cover; a mobile station supporting the mobile mechanism; and The moving mechanism makes the moving platform move. 如請求項1之更換裝置,更包含: 移行控制部,控制該移行機構; 該加工工具被保管於在複數之該加工裝置通用的保管部, 該移行控制部進行控制俾該移行機構令移行台在保管該加工工具之位置與更換該加工工具的位置之間移行。 Such as the replacement device of claim 1, which further includes: The Department of Migration Control, which controls the Migration Agency; The processing tool is stored in a common storage unit for the plurality of processing devices, The moving control part controls the moving mechanism so that the moving table moves between a position for storing the processing tool and a position for replacing the processing tool. 如請求項1之更換裝置,更包含: 移行控制部,控制該移行機構; 該加工工具被保管於針對複數之該加工裝置各自設於該加工裝置之外部的保管部, 該移行控制部進行控制俾該移行機構令移行台在保管該加工工具之位置與更換該加工工具的位置之間移行。 Such as the replacement device of claim 1, which further includes: The Department of Migration Control, which controls the Migration Agency; The processing tool is stored in a storage unit provided outside the processing device for each of the plurality of processing devices, The moving control part controls the moving mechanism so that the moving table moves between a position for storing the processing tool and a position for replacing the processing tool. 如請求項1至請求項3中任一項之更換裝置,更包含: 保管部,保管該加工工具; 使該保管部與該移行台一同移行。 The replacement device of any one of claim 1 to claim 3 further includes: The storage department keeps the processing tool; The storage unit is moved together with the moving platform. 如請求項1至請求項4中任一項之更換裝置,更包含: 殼體,安裝於該移行台; 該殼體以收納有該更換機構與該移動機構之狀態接觸該外蓋之外壁面,而將該殼體之內部密閉, 該殼體之內部與該外蓋之內部藉由該外蓋之該進入口連通。 The replacement device of any one of claim 1 to claim 4 further includes: the housing is installed on the moving platform; The casing contacts the outer wall surface of the outer cover in a state where the replacement mechanism and the moving mechanism are accommodated, thereby sealing the inside of the casing, The inside of the casing communicates with the inside of the outer cover through the inlet of the outer cover. 如請求項1至請求項5中任一項之更換裝置,其中, 該更換機構包含固持該加工工具之固持機構。 The replacement device according to any one of claim 1 to claim 5, wherein, The replacement mechanism includes a holding mechanism for holding the processing tool. 如請求項6之更換裝置,其中, 該固持機構將收納該加工工具之容器加以固持。 Such as the replacement device of claim 6, wherein, The holding mechanism holds the container for accommodating the processing tool. 如請求項6或請求項7之更換裝置,其中, 該更換機構包含使該固持機構旋轉之第1旋轉機構。 Such as the replacement device of claim 6 or claim 7, wherein, The replacement mechanism includes a first rotation mechanism that rotates the holding mechanism. 如請求項1至請求項8中任一項之更換裝置,其中, 該更換機構包含制止該加工機構之心軸的旋轉之旋轉制止機構。 The replacement device according to any one of claim 1 to claim 8, wherein, The changing mechanism includes a rotation inhibiting mechanism that inhibits rotation of the spindle of the processing mechanism. 如請求項1至請求項9中任一項之更換裝置,其中, 該更換機構包含使該加工機構之心軸旋轉的第2旋轉機構。 The replacement device according to any one of claim 1 to claim 9, wherein, The replacement mechanism includes a second rotation mechanism for rotating the spindle of the machining mechanism. 如請求項1至請求項10中任一項之更換裝置,其中, 該更換機構具有將扣結該加工工具與該加工機構之扣結工具緊固或鬆開的操作機構。 The replacement device according to any one of claim 1 to claim 10, wherein, The replacement mechanism has an operating mechanism for fastening or loosening the fastening tool that fastens the processing tool and the processing mechanism. 如請求項1至請求項11中任一項之更換裝置,其中, 該更換機構包含對該加工工具與該加工機構之間供應氣體的氣體供應機構。 The replacement device according to any one of claim 1 to claim 11, wherein, The exchange mechanism includes a gas supply mechanism for supplying gas between the processing tool and the processing mechanism. 如請求項1至請求項12中任一項之更換裝置,其中, 該更換機構與該移動機構之組合設複數組,而獨立控制。 The replacement device according to any one of claim 1 to claim 12, wherein, The combination of the changing mechanism and the moving mechanism is set up in multiple groups and controlled independently. 一種更換方法,其係在加工裝置使用之加工工具的更換方法,該加工裝置具有:固持部,用以固持處理體;加工機構,將用以加工固持於該固持部之該處理體的該加工工具以可更換方式安裝;及外蓋,收納該固持部與該加工機構, 該更換方法包含下列步驟: 該加工工具之更換裝置接收在該加工裝置作成之更換指令; 該更換裝置移行至該外蓋之外部的設定位置; 該更換裝置檢測到該外蓋之進入口為開放; 該更換裝置經由該外蓋之該進入口,從該外蓋之外部進入至內部; 該更換裝置將該加工工具安裝於該加工機構或從該加工機構卸除該加工工具。 A method for replacing a processing tool used in a processing device, the processing device has: a holding part for holding a processing object; a processing mechanism for processing the processing object held in the holding part The tool is installed in a replaceable manner; and the outer cover accommodates the holding part and the processing mechanism, This replacement method includes the following steps: The replacement device of the processing tool receives the replacement instruction made in the processing device; the changing device travels to a set position on the outside of the cover; the replacement device detects that the access opening of the cover is open; the replacement device enters from the outside of the cover to the inside through the inlet of the cover; The changing device installs the processing tool on the processing mechanism or removes the processing tool from the processing mechanism.
TW110133690A 2021-09-10 2021-09-10 Replacement device and replacement method TW202310977A (en)

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