JP2023062553A - Exchange apparatus, processing apparatus and exchange method - Google Patents

Abstract

To provide a technique that can reduce burdens on a user who uses a processing apparatus.SOLUTION: An exchange apparatus exchanges a holding part that is used in a processing apparatus. The processing apparatus comprises: the holding part that holds a process body; a mounting part on which the holding part is exchangeably mounted; a processing part that processes the process body held by the holding part; and an exterior cover that stores the holding part, the mounting part and the processing part. The exchange apparatus comprises: an exchange mechanism that attaches the holding part to the mounting part or detaches the holding part from the mounting part; a movement mechanism that moves the exchange mechanism from the outside to the inside of the exterior cover through an approach port of the exterior cover; a running base on which the movement mechanism is supported; and a running mechanism that makes the running base run.SELECTED DRAWING: Figure 6

Description

TECHNICAL FIELD The present disclosure relates to an exchange device, a processing device, and an exchange method.

A grinding apparatus described in Patent Document 1 includes a chuck table that holds a workpiece, and a grinding wheel that grinds the workpiece held on the chuck table. A grinding apparatus performs so-called self-grinding in which, when the grinding wheel or chuck table is replaced, the chuck table is ground by the grinding wheel to form the grinding surface of the grinding wheel and the holding surface of the chuck table in parallel.

JP 2014-237210 A

One aspect of the present disclosure provides technology that reduces the burden on a user using a processing device.

A replacement device according to an aspect of the present disclosure replaces a holder used in a processing device. The processing apparatus includes a holding portion that holds a processing object, a mounting portion that replaceably attaches the holding portion, a processing portion that processes the processing object held by the holding portion, the holding portion and the An exterior cover that accommodates the attachment portion and the processing portion is provided. The replacement device includes: a replacement mechanism for attaching the holding portion to the attachment portion or removing the holding portion from the attachment portion; a moving mechanism for moving the moving mechanism, a running stand for supporting the moving mechanism, and a running mechanism for running the running stand.

According to one aspect of the present disclosure, it is possible to reduce the burden on the user who uses the processing device.

FIG. 1 is a plan view showing an example of a factory layout. FIG. 2 is a plan view showing another example of the layout of the factory. FIG. 3 is a plan view showing an example of the grinding system. FIG. 4 is a cross-sectional view showing a grinding device according to one embodiment. FIG. 5 is a plan view showing an example of the chuck of the grinding device. FIG. 6 is a cross-sectional view showing a grinding device and an exchange device according to one embodiment. FIG. 7 is a cross-sectional view showing an example of an operating mechanism included in the exchange mechanism. FIG. 8 is a cross-sectional view showing an example of the injection port of the mount. FIG. 9 is a cross-sectional view showing an example of an arm included in the exchange mechanism. FIG. 10 is a cross-sectional view showing another example of an arm included in the exchange mechanism. FIG. 11 is a cross-sectional view showing an example of the positioning portion. FIG. 12 is a cross-sectional view showing another example of the positioning portion. FIG. 13 is a cross-sectional view showing an example of a measuring mechanism included in the exchange mechanism. FIG. 14 is a diagram showing, in functional blocks, constituent elements of respective control units of the grinding device and the exchanging device according to one embodiment. FIG. 15 is a cross-sectional view showing a grinding device and an exchange device according to a first modified example. FIG. 16 is a cross-sectional view showing a grinding device and an exchanging device according to a second modified example. FIG. 17 is a cross-sectional view showing a grinding device and an exchanging device according to a third modified example. FIG. 18 is a plan view showing an example of an exchange device having a storage section.

Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. In addition, in each drawing, the same reference numerals are given to the same or corresponding configurations, and explanations thereof may be omitted. In this specification, the X-axis direction, the Y-axis direction, and the Z-axis direction are directions perpendicular to each other. The X-axis direction and Y-axis direction are horizontal directions, and the Z-axis direction is vertical direction.

As shown in FIG. 1, in the factory room, for example, the grinding system 1 for grinding the substrate W, the exchange device 7 for exchanging the chuck 42, the hangar 8 for storing the exchange device 7, and the chuck 42 are stored. A storage unit 9 is installed. The factory may be, for example, a semiconductor factory, and the room may be, for example, a clean room. In this embodiment, the substrate W corresponds to the processing body described in the claims, and the chuck 42 corresponds to the holding part described in the claims.

The substrate W includes a semiconductor substrate such as a silicon wafer or compound semiconductor wafer, or a glass substrate. The substrate W may further include a device layer formed on the surface of the semiconductor substrate or glass substrate. The device layer contains electronic circuitry. Also, the substrate W may be a superimposed substrate obtained by bonding a plurality of substrates.

A plurality of grinding systems 1 may be arranged in a factory room as shown in FIG. 1, or only one may be arranged. The chuck 42 is replaced by the replacement device 7 at desired timing. Since the chuck 42 is heavy (for example, about 10 kg), if the exchange device 7 replaces the chuck 42 instead of the human, the burden on the human can be reduced. The exchange operation of the chuck 42 includes the operation of removing and carrying out the used chuck 42 and the operation of carrying in and attaching the unused chuck 42 .

The storage section 9 stores the chuck 42 . The used chuck 42 and the unused chuck 42 are stored in the same storage unit 9 in this embodiment, but may be stored in separate storage units 9 . The storage unit 9 is provided outside the grinding system 1 . Therefore, miniaturization of the grinding system 1 is possible. Since the storage unit 9 is provided outside the grinding system 1 , a self-propelled robot is used as the exchange device 7 unlike the case where the storage unit 9 is provided inside the grinding system 1 .

The exchange device 7 waits in the hangar 8 until receiving a command to exchange the chuck 42 . When receiving the replacement command, the replacement device 7 travels to, for example, the grinding system 1 and removes the used chuck 42 from the grinding system 1 . Next, the exchange device 7 travels to the storage unit 9 while holding the used chuck 42 that has been removed, and places the used chuck 42 in the storage unit 9 . After that, the exchange device 7 acquires an unused chuck 42 in the storage unit 9, travels to the grinding system 1 while holding the acquired unused chuck 42, and transfers the unused chuck 42 to the grinding system 1. Install. Finally, the exchange device 7 returns to the hangar 8 and waits.

Alternatively, upon receiving the exchange command, the exchange device 7 first travels to the storage unit 9, acquires an unused chuck 42 from the storage unit 9, and moves the grinding system 1 while holding the acquired unused chuck 42. run up to The exchange device 7 then removes the used chuck 42 from the grinding system 1 . The exchange device 7 then attaches an unused chuck 42 to the grinding system 1 . After that, the exchange device 7 travels to the storage unit 9 while holding the used chuck 42 that has been removed, and places the used chuck 42 in the storage unit 9 . Finally, the exchange device 7 returns to the hangar 8 and waits.

Storage unit 9 is common to a plurality of grinding systems 1 . Compared to the case where the storage unit 9 is provided for each grinding system 1, the number of storage units 9 to be installed can be reduced.

In addition, as shown in FIG. 2 , the storage unit 9 may be provided for each grinding system 1 . In this case, the storage unit 9 can be installed in the vicinity of the grinding system 1 compared to the case where the storage unit 9 is common to a plurality of grinding systems 1 .

1 and 2 is provided separately from the exchange device 7, the exchange device 7 may be provided with the storage unit 9 as shown in FIG. The storage section 9 of the exchanging device 7 is caused to travel together with the traveling platform 73 of the exchanging device 7 . In this case, the traveling distance of the exchanging device 7 can be shortened. The storage unit 9 of the exchange device 7 temporarily stores the chuck 42 transported between the storage unit 9 (see FIG. 1 or 2) fixed to the outside of the exchange device 7 and the grinding device 40 of the grinding system 1. Store in

Next, the grinding system 1 will be described with reference to FIG. The grinding system 1 includes a loading/unloading section 2 , a cleaning section 3 , a grinding section 4 and a control section 5 . The loading/unloading section 2, the cleaning section 3, and the grinding section 4 are arranged in this order from the negative side in the X-axis direction to the positive side in the X-axis direction.

The loading/unloading section 2 has a mounting table 21 . The mounting table 21 is for mounting the cassette C thereon. The cassette C accommodates a plurality of substrates W at intervals in the vertical direction. The mounting table 21 includes a plurality of mounting plates 22 arranged in a row in the Y-axis direction. A cassette C is mounted on each of the plurality of mounting plates 22 . Note that the number of mounting plates 22 is not particularly limited. Similarly, the number of cassettes C is not particularly limited.

In addition, the loading/unloading section 2 has a first transport area 23 . In a plan view, the first transport area 23 is arranged next to the mounting table 21 and a transition device 35 to be described later so as to be sandwiched between the mounting table 21 and the transition device 35 . The loading/unloading section 2 has a first transport device 24 that transports the substrate W in the first transport area 23 . The first transport device 24 transports the substrate W between a plurality of devices arranged next to the first transport area 23 . The first transport device 24 includes a first transport arm 24a that holds the substrate W. As shown in FIG. The first transfer arm 24a is capable of horizontal (both X-axis and Y-axis) and vertical movement, and rotation about the vertical axis. The number of first transfer arms 24a may be one or plural.

The cleaning section 3 has a first cleaning device 31 . The first cleaning device 31 scrubs and cleans the substrate W after being ground by the grinding device 40 described later. The first cleaning device 31 includes a cleaning body such as a sponge or a brush, and removes particles such as grinding dust with the cleaning body.

The cleaning section 3 also has a second cleaning device 32 . The second cleaning device 32 etches the substrate W after being ground by the grinding device 40 with a chemical solution. The second cleaning device 32 includes a spin chuck that holds the substrate W and a nozzle that ejects the chemical solution. The nozzle supplies the chemical solution to the center of the upper surface of the substrate W as it rotates.

The cleaning section 3 may further have a third cleaning device 33 . Unlike the first cleaning device 31 and the second cleaning device 32 , the third cleaning device 33 cleans the substrate W before being ground by the grinding device 40 . The third cleaning device 33 scrubs the substrate W similarly to the first cleaning device 31 . Foreign matter can be prevented from being caught between the chuck 42 of the grinding device 40 and the substrate W, and the substrate W can be ground flat.

The washing section 3 has a detection device 34 . The detection device 34 detects the center of the substrate W before being ground by the grinding device 40 . The center of the chuck 42 of the grinding device 40 and the center of the substrate W can be aligned in plan view. In addition to the center of the substrate W, the detection device 34 may also detect the crystallographic orientation of the substrate W, specifically a notch or orientation flat representing the crystallographic orientation of the substrate W. The crystal orientation of the substrate W can be aligned to a desired orientation in a rotating coordinate system that rotates with the chuck 42 .

The first cleaning device 31 , the third cleaning device 33 and the detection device 34 may be vertically stacked to reduce the footprint of the grinding system 1 . For example, the detection device 34, the first cleaning device 31, and the third cleaning device 33 are arranged in this order from the bottom to the top. However, the order is not particularly limited.

The cleaning section 3 has a transition device 35 . The transition device 35 accommodates the substrate W temporarily. Multiple transition devices 35 may be vertically stacked. The arrangement and number of transition devices 35 are not particularly limited.

The cleaning section 3 has a second transport area 36 . In a plan view, the second transport area 36 is adjacent to the first cleaning device 31, the second cleaning device 32, and the transition device 35, and has three sides formed by the first cleaning device 31, the second cleaning device 32, and the transition device 35. arranged to be enclosed. The cleaning section 3 has a second transport device 37 that transports the substrate W in the second transport area 36 . The second transport device 37 transports the substrate W between a plurality of devices arranged next to the second transport area 36 . The second transport device 37 includes a second transport arm 37a that holds the substrate W. As shown in FIG. The second transport arm 37a is capable of horizontal (both X-axis and Y-axis) and vertical movement, and rotation about the vertical axis. The number of second transfer arms 37a may be one or plural.

The cleaning unit 3 has a rectangular shape with corners notched in a plan view, and the third transfer area 38 is arranged at the notched position. In plan view, the third transport area 38 is adjacent to the second transport area 36, the first cleaning device 31, and the grinding device 40, and the second transport region 36, the first cleaning device 31, and the grinding device 40 on three sides. arranged to be enclosed. The third transfer area 38 may be provided inside a housing that covers both the cleaning section 3 and the third transfer area 38, or may be provided inside a housing that is separate from the housing that covers the cleaning section 3. , may be connected to the cleaning unit 3 .

The grinding system 1 includes a third transport device 39 that transports the substrate W in the third transport area 38 . The third transport device 39 transports the substrate W between a plurality of devices arranged next to the third transport area 38 . The third transfer device 39 includes a suction pad 39a that holds the substrate W thereon. The suction pad 39a sucks the substrate W from above. The suction pad 39a can move in the horizontal direction (both the X-axis direction and the Y-axis direction) and the vertical direction, and can rotate about the vertical axis.

The grinding section 4 includes a grinding device 40 . The grinding device 40 grinds the substrate W. As shown in FIG. Grinding includes polishing. The grinding device 40 includes, for example, a table 41 , four chucks 42 and three processing units 43 .

The table 41 holds four chucks 42 at equal intervals around the rotation center line R1 and rotates around the rotation center line R1. Each of the four chucks 42 rotates together with the table 41, and moves to the loading/unloading position A0, the primary grinding position A1, the secondary grinding position A2, the tertiary grinding position A3, and the loading/unloading position A0 in this order. Moving.

The loading/unloading position A0 serves both as a position where the substrate W is loaded and a position where the substrate W is unloaded. In this embodiment, the carry-in position and the carry-out position are the same position, but the carry-in position and the carry-out position may be different positions. The primary grinding position A1 is a position where the substrate W is primarily ground. The secondary grinding position A2 is a position where the substrate W is secondary grounded. The tertiary grinding position A3 is a position where the substrate W is subjected to tertiary grinding.

The four chucks 42 are attached to the table 41 so as to be rotatable around their respective rotation center lines R2 (see FIG. 4). At the primary grinding position A1, the secondary grinding position A2, and the tertiary grinding position A3, the chuck 42 rotates about the rotation center line R2.

One processing section 43 primarily grinds the substrate W at the primary grinding position A1. Another processing section 43 performs secondary grinding of the substrate W at the secondary grinding position A2. The remaining processing section 43 tertiary grinds the substrate W at the tertiary grinding position A3.

Note that the number of processing units 43 may be one or more. Also, the number of chucks 42 should be larger than the number of processing units 43 . However, the table 41 may be omitted. If there is no table 41, the number of chucks 42 may be the same as the number of processing units 43, or may be one.

The control unit 5 is, for example, a computer, and includes a CPU (Central Processing Unit) 51 and a storage medium 52 such as a memory. The storage medium 52 stores programs for controlling various processes executed in the grinding system 1 . The control unit 5 controls the operation of the grinding system 1 by causing the CPU 51 to execute programs stored in the storage medium 52 .

Next, operation of the grinding system 1 will be described. The following operations are performed under the control of the control section 5 .

First, the first transport device 24 takes out the substrate W from the cassette C and transports it to the transition device 35 . Subsequently, the second transport device 37 transports the substrate W from the transition device 35 to the third cleaning device 33 .

Next, the third cleaning device 33 cleans the substrate W before being ground by the grinding device 40 . A clean substrate W can be placed on the chuck 42 of the grinding device 40, and foreign matter can be prevented from being caught. Therefore, the substrate W can be ground flat, and the deterioration of the thickness deviation of the substrate W can be suppressed. After drying the substrate W, the second transport device 37 transports the substrate W from the third cleaning device 33 to the detection device 34 .

If the unground substrate W is clean, or if the grinding device 40 has a mechanism for cleaning the unground substrate W, the third cleaning device 33 may be omitted. In that case, the second transport device 37 transports the substrate W from the transition device 35 to the detection device 34 .

Next, the detection device 34 detects the center of the substrate W. FIG. The detection device 34 may also detect the crystal orientation of the substrate W, and more specifically may detect notches and the like. After that, the third transport device 39 transports the substrate W from the detection device 34 to the chuck 42 of the grinding device 40 . During this time, the control unit 5 controls the third transfer device 39 based on the detection result of the detection device 34 to align the center of the chuck 42 and the center of the substrate W. FIG. Further, the control unit 5 controls the third transfer device 39 based on the detection result of the detection device 34 to align the crystal orientation of the substrate W with a desired orientation in the rotating coordinate system that rotates together with the chuck 42 .

Next, the grinding device 40 grinds the upper surface of the substrate W. As shown in FIG. The substrate W rotates together with the table 41 and moves to a loading/unloading position A0, a primary grinding position A1, a secondary grinding position A2, a tertiary grinding position A3, and a loading/unloading position A0 in this order. During this time, primary grinding, secondary grinding, and tertiary grinding are performed. After that, the third transport device 39 transports the substrate W from the chuck 42 to the first cleaning device 31 .

Next, the first cleaning device 31 cleans the upper surface of the substrate W to remove particles such as grinding dust. After drying the substrate W, the second transport device 37 transports the substrate W from the first cleaning device 31 to the second cleaning device 32 .

Next, the second cleaning device 32 etches the upper surface of the substrate W to remove grinding marks. After drying the substrate W, the second transport device 37 transports the substrate W from the second cleaning device 32 to the transition device 35 . Subsequently, the first transport device 24 transports the substrate W from the transition device 35 to the cassette C. As shown in FIG. A substrate W is accommodated in a cassette C. As shown in FIG.

Next, the grinding device 40 will be described mainly with reference to FIG. The grinding device 40 includes a processing section 43 . The processing section 43 processes the substrate W held by the chuck 42 . Processing the substrate W includes grinding the substrate W, for example. The processing unit 43 has, for example, a flange 43a to which the grinding tool D is attached, a spindle shaft 43b provided with the flange 43a at its lower end, and a spindle motor 43c for rotating the spindle shaft 43b.

The flange 43a is horizontally arranged, and a grinding tool D is attached to its lower surface. The grinding tool D includes, for example, a disk-shaped grinding wheel D1 and a plurality of grindstones D2 arranged in a ring on the lower surface of the grinding wheel D1. The spindle shaft 43b is arranged vertically. The spindle motor 43c rotates the spindle shaft 43b to rotate the grinding tool D around the rotation center line R3. The processing unit 43 raises and lowers the grinding tool D by raising and lowering the spindle motor 43c.

The processing unit 43 lowers the grinding tool D to contact the upper surface of the substrate W while rotating the grinding tool D about the rotation center line R3. At this time, the substrate W is rotated around another rotation center line R2. The grinding tool D grinds the entire upper surface of the substrate W. As shown in FIG. When the thickness of the substrate W reaches the set value, the processing section 43 stops the descent of the grinding tool D. Thereafter, the processing section 43 raises the grinding tool D.

The chuck 42 holds the substrate W from below. Although not shown, the attraction surface of the chuck 42 for attracting the substrate W, that is, the upper surface of the chuck 42 may be a conical surface symmetrical about the rotation center line R2 of the chuck 42 . The thickness distribution of the substrate W in the radial direction can be adjusted by adjusting the inclination angle of the rotation center line R2 of the chuck 42 using a chuck inclination adjustment mechanism (not shown). The chuck motor 82 rotates the substrate W by rotating the chuck 42 .

The chuck 42 includes, for example, a porous body 42a that vacuum-sucks the substrate W, a holding table 42b that holds the porous body 42a, and a flange 42c provided at the lower edge of the holding table 42b. The chuck 42 is replaceably attached to the mount 49 . A fastener for fastening the chuck 42 to the mount 49 is not particularly limited, but is, for example, a bolt 81 .

As shown in FIG. 5 , a plurality of bolts 81 are provided at intervals in the circumferential direction of the chuck 42 . As shown in FIG. 4 , the shaft portion 81 a of the bolt 81 passes through the through hole of the flange 42 c of the chuck 42 and is screwed into the bolt hole of the mount 49 . The head 81b of the bolt 81 presses the flange 42c of the chuck 42 from above. By loosening or tightening the bolt 81, the chuck 42 can be replaced.

After the chuck 42 is attached to the mounting table 49 and before the processing unit 43 grinds the substrate W, the processing unit 43 grinds the chuck 42 to adjust the shape of the suction surface of the chuck 42 . The grinding tool for grinding the chuck 42 may be prepared separately from the grinding tool D for grinding the substrate W. The processing unit 43 may grind the chuck 42 in order to remove stains and the like attached to the chuck 42 between repetitions of grinding the substrate W. FIG. When the total grinding amount of the chuck 42 reaches the set amount, the chuck 42 is replaced.

Next, mainly referring to FIGS. 6 to 13, the attachment and detachment of the chuck 42 with respect to the attachment base 49 will be described. As shown in FIG. 6 , the grinding device 40 has an exterior cover 44 . The exterior cover 44 accommodates the chuck 42, the mount 49, and the processing section 43 (see FIG. 4). Exterior cover 44 may also accommodate table 41 and the like. The exterior cover 44 prevents particles such as grinding dust generated inside thereof from flowing out to the outside. The factory room can be kept clean.

The outer cover 44 has an entrance 44a through which the exchange device 7 enters from the outside of the outer cover 44 to the inside. Instead of a human, an exchanging device 7 enters from the outside of the exterior cover 44 and exchanges the chuck 42 inside the exterior cover 44 .

Since the exchanging device 7 enters the interior of the outer cover 44 instead of the human to replace the chuck 42, the sediments inside the outer cover 44 can prevent the human from becoming dirty. Moreover, since the exchange device 7 is provided outside the grinding device 40 , the size of the grinding device 40 can be reduced compared to the case where the exchange device 7 is provided inside the grinding device 40 .

The grinding device 40 includes a shutter 45 that opens and closes an entrance 44 a of an exterior cover 44 . The shutter 45 basically closes the entry port 44a, and opens the entry port 44a when the exchanging device 7 enters. Compared to the case where the entry port 44a is always open, it is possible to suppress the outflow of particles from the inside of the exterior cover 44 to the outside through the entry port 44a, and the factory room can be kept clean.

The grinding device 40 may include a moving mechanism 46 that moves the shutter 45 between an open position (for example, the position shown in FIG. 6) that opens the inlet 44a and a closed position that closes the inlet 44a. The moving mechanism 46 is a pneumatic cylinder, an electric cylinder, or the like. The electric cylinder includes a motor and a ball screw. The shutter 45 can be moved automatically instead of manually.

The entrance 44a of the exterior cover 44 and the shutter 45 are provided, for example, at the loading/unloading position A0. The loading/unloading position A0 is a position where the substrate W is loaded/unloaded. The processing unit 43 for grinding the substrate W does not exist at the loading/unloading position A0. Therefore, the replacement work of the chuck 42 is easy. The exchange operation of the chuck 42 includes the operation of removing and carrying out the used chuck 42 and the operation of carrying in and attaching the unused chuck 42 .

Grinding device 40 may include a limiting mechanism 47 . The restriction mechanism 47 restricts the outflow of gas from the inside of the outer cover 44 to the outside through the inlet 44 a of the outer cover 44 . By restricting the outflow of gas, the outflow of particles can be suppressed and the factory room can be kept clean.

For example, the restriction mechanism 47 includes an exhaust line 47a that makes the inside of the outer cover 44 negative pressure compared to the outside. The exhaust line 47a is a duct or the like, and connects the exterior cover 44 and the exhaust source. The evacuation source is, for example, a vacuum pump or an ejector. An air pressure controller 47b, for example, is provided in the middle of the exhaust line 47a. The air pressure controller 47b controls the air pressure inside the outer cover 44. As shown in FIG. Due to the pressure difference, an air current is formed from the inlet 44a of the outer cover 44 toward the inside. As a result, the outflow of gas from the inside of the outer cover 44 to the outside can be restricted.

The connection port of the exhaust line 47a to the exterior cover 44 is located above the entrance port 44a of the exterior cover 44 in FIG. 6, but may be located below. In the latter case, a downflow can be formed inside the exterior cover 44 . A fan such as a fan filter unit may be provided on the ceiling of the exterior cover 44 . The amount of blown air and the amount of exhaust air are controlled so that the pressure inside the exterior cover 44 is made negative compared to the outside.

Grinding device 40 may include cleaning mechanism 48 . The cleaning mechanism 48 supplies cleaning liquid to the chuck 42 or peripheral members of the chuck 42 through a nozzle or the like. The cleaning liquid is, for example, DIW (deionized water) or the like. A peripheral member of the chuck 42 is, for example, a mount 49 . The cleaning mechanism 48 cleans the chuck 42 and the like before removing the used chuck 42 from the mount 49 . As a result, it is possible to prevent the exchanging device 7 from becoming soiled. Further, if the chuck 42 is cleaned by the cleaning mechanism 48 , it is possible to suppress the particles from being carried out together with the chuck 42 .

The grinding device 40 includes a control section 50 . The control unit 50 is, for example, a computer, and includes a CPU 50a and a storage medium 50b such as a memory. The storage medium 50b stores a program for controlling various processes executed in the grinding device 40. FIG. The control unit 50 controls the operation of the grinding device 40 by causing the CPU 50a to execute a program stored in the storage medium 50b. The controller 50 of the grinding device 40 may be part of the controller 5 of the grinding system 1 .

The exchanging device 7 includes, for example, an exchanging mechanism 71 , a moving mechanism 72 , a running table 73 , and a running mechanism 74 . The exchange mechanism 71 attaches the chuck 42 to the mount 49 or removes the chuck 42 from the mount 49 . The exchange mechanism 71 is capable of horizontal (both X-axis and Y-axis) and vertical movement, and rotation about the vertical axis. The moving mechanism 72 moves the replacement mechanism 71 from the outside to the inside of the exterior cover 44 through the entry port 44 a of the exterior cover 44 . The moving mechanism 72 is, for example, a multi-joint arm, holds the exchange mechanism 71 at one end, and is connected to the running table 73 at the other end. The running platform 73 supports the moving mechanism 72 . The traveling mechanism 74 causes the traveling platform 73 to travel.

Since the replacement device 7 is provided outside the grinding device 40 , a self-propelled robot is used as the replacement device 7 unlike the case where the replacement device 7 is provided inside the grinding device 40 . Instead of a human, the exchange device 7 exchanges the chuck 42 . It can prevent people from getting dirty. Moreover, since the exchange device 7 is provided outside the grinding device 40 , the size of the grinding device 40 can be reduced compared to the case where the exchange device 7 is provided inside the grinding device 40 .

As shown in FIG. 7, the replacement mechanism 71 has an operation mechanism 71a for tightening or loosening the fastener that fastens the chuck 42 to the mount 49. As shown in FIG. When the fastener is the bolt 81, the operating mechanism 71a is composed of a tool such as a spanner or wrench that fits into the bolt 81 and a rotating mechanism that rotates the tool.

The replacement mechanism 71 may have a detent mechanism 71 b that stops the rotation of the mount 49 . The anti-rotation mechanism 71b includes, for example, a clamp that grips the mount 49 or a pin that is inserted into a hole of the mount 49 . The fastener can be tightened or loosened while the rotation of the mount 49 is stopped by the anti-rotation mechanism 71b.

The replacement mechanism 71 may have a rotation mechanism 71c that rotates the mounting base 49 . The rotating mechanism 71c includes, for example, a holder that grips the mount 49 and a motor that rotates the holder about the rotation center line R2. When a plurality of fasteners are present on a rotational orbit centered on the rotation centerline R2, the plurality of fasteners can be arranged in order directly below the operating mechanism 71a.

As shown in FIG. 8, the mounting base 49 may have a jetting port 49b for jetting fluid on a mounting surface 49a to which the chuck 42 is mounted. A liquid such as water or a gas such as air is used as the fluid. The mounting base 49 and the chuck 42 can be separated by the jet pressure of the fluid. When the substrate W is ground, the grinding liquid supplied to the substrate W enters between the chuck 42 and the mount 49 to form a liquid film, which is effective when the chuck 42 is attached to the mount 49 .

As shown in FIG. 9, the exchange mechanism 71 has a pair of arms 71d for gripping the chuck 42, for example. The pair of arms 71d are arranged symmetrically about the rotation center line R2 of the chuck 42, and are made to approach or separate from each other in a direction orthogonal to the rotation center line R2. Each of the pair of arms 71d has a claw portion 711d inserted between the mount 49 and the chuck 42, for example. The claw portion 711d is inserted into the gap formed by the jet pressure of the fluid. After that, the injection of fluid is stopped. The claw portion 711d holds the chuck 42 from below.

10, each of the pair of arms 71d may have a bifurcated fork portion 712d hooked on the bolt 81. As shown in FIG. For example, the fork portion 712d is inserted into a gap between the head portion 81b of the bolt 81 and the flange 42c of the chuck 42, sandwiches the shaft portion 81a of the bolt 81, and holds the head portion 81b of the bolt 81 from below. In a state where the fork portion 712d is hooked on the bolt 81, fluid injection is started. Instead of the bolt 81, a dedicated bolt for hooking the fork portion 712d may be provided.

It should be noted that the chuck 42 may be peeled off from the mount 49 only by the driving force of the arm 71d without using the jet pressure of the fluid.

As shown in FIG. 11, a plurality of positioning portions 83 (only one is shown in FIG. 11) for positioning the chuck 42 with respect to the mount 49 may be provided. The positioning portion 83 includes, for example, a positioning pin 83a and a positioning hole 83b fitted into the positioning pin 83a. The positioning pin 83 a is provided on the upper surface of the mount 49 , and the positioning hole 83 b is provided on the lower surface of the chuck 42 . The tip of the positioning pin 83a may have a tapered taper.

When attaching the chuck 42 to the mount 49 , the position of the chuck 42 with respect to the mount 49 is determined by fitting the positioning pin 83 a into the positioning hole 83 b. Therefore, the work of adjusting the position of the chuck 42 with respect to the mount 49, specifically, the work of aligning the center of the chuck 42 with the center of the mount 49 becomes unnecessary.

The arrangement of the positioning pin 83a and the positioning hole 83b may be reversed. That is, the positioning pins 83 a may be provided on the lower surface of the chuck 42 and the positioning holes 83 b may be provided on the upper surface of the mount 49 .

As shown in FIG. 12, the positioning portion 83 may include a tapered screw 83c and tapered screw holes 83d and 83e into which the tapered screw 83c is screwed. A tapered screw hole 83 d is formed in the flange 42 c of the chuck 42 , for example, and another tapered screw hole 83 e is formed in the upper surface of the mount 49 .

When attaching the chuck 42 to the mounting base 49, the position of the chuck 42 with respect to the mounting base 49 is corrected by screwing the taper screw 83c into the taper screw holes 83d and 83e. Therefore, the work of adjusting the position of the chuck 42 with respect to the mount 49, specifically, the work of aligning the center of the chuck 42 with the center of the mount 49 becomes unnecessary.

When the taper screw 83c is screwed into the taper screw holes 83d and 83e, if the chuck 42 sticks to the mount 49 and does not move, the jet port 49b of the mount 49 may jet the fluid. The mounting base 49 and the chuck 42 can be separated by the jet pressure of the fluid. After that, the position of the chuck 42 with respect to the mount 49 is corrected by screwing the taper screw 83c into the taper screw holes 83d and 83e.

After positioning the chuck 42 with respect to the mount 49 by the positioning portion 83 , the chuck 42 is fastened to the mount 49 with the bolt 81 . In addition, when the positioning portion 83 includes the tapered screw 83c, the tapered screw 83c may be removed after the chuck 42 is positioned with respect to the mount 49 .

As shown in FIG. 13 , the exchange mechanism 71 may have a measuring mechanism 7 e 1 that measures the positional deviation of the chuck 42 with respect to the mount 49 . The measuring mechanism 71 e measures, for example, the displacement of the center of the chuck 42 with respect to the center of the mount 49 . If the positional deviation measured by the measuring mechanism 71e is out of the allowable range, the position of the chuck 42 with respect to the mount 49 is corrected so that the positional deviation is within the allowable range.

The measuring mechanism 71e includes, for example, a probe that is pressed against the outer peripheral surface of the chuck 42, a guide that guides the probe, and a sensor that measures the displacement of the probe. The positional deviation of the center of the chuck 42 with respect to the center of the mounting table 49 can be measured from the displacement of the probe when the mounting table 49 is rotated. In addition, although the measuring mechanism 71e is a contact type in this embodiment, it may be a non-contact type.

As shown in FIG. 1 and the like, a plurality of pairs of exchange mechanisms 71 and moving mechanisms 72 may be provided and controlled independently. One set is used to attach chuck 42 and another set is used to remove chuck 42 . If there are a plurality of sets of the exchange mechanism 71 and the moving mechanism 72, unlike the case where there is only one, the chuck 42 can be quickly removed and attached in succession. In other words, the replacement device 7 does not have to reciprocate between the grinding device 40 and the storage section 9 between the removal and attachment of the chuck 42 .

Note that if the storage section 9 (see FIG. 18) of the exchange device 7 stores both the used chuck 42 and the unused chuck 42, even if there is one exchange mechanism 71 and one moving mechanism 72, the chuck Removal and installation of 42 can be performed quickly in sequence.

As shown in FIG. 6 , the exchange device 7 may include an imaging device 75 that images the exchange mechanism 71 . The imaging device 75 is attached to one end of the moving mechanism 72 in the same manner as the exchange mechanism 71 . The exchange mechanism 71 can be controlled while monitoring the operation of the exchange mechanism 71 by the imaging device 75 . For example, when mounting the chuck 42 on the mount 49 , the bolt holes of the mount 49 and the through holes of the flange 42 c of the chuck 42 can be aligned.

The exchange device 7 includes a control section 76 . The control unit 76 is, for example, a computer, and includes a CPU 76a and a storage medium 76b such as a memory. The storage medium 76b stores a program for controlling various processes executed in the exchange device 7. FIG. The control unit 76 controls the operation of the exchange device 7 by causing the CPU 76a to execute a program stored in the storage medium 76b.

Next, with reference to FIG. 14, functions of the control section 50 of the grinding device 40 and functions of the control section 76 of the exchanging device 7 will be described. Each functional block illustrated in FIG. 14 is conceptual, and does not necessarily need to be physically configured as illustrated. All or part of each functional block can be functionally or physically distributed and integrated in arbitrary units. All or any part of each processing function performed by each functional block can be implemented by a program executed by a CPU, or by hardware using wired logic.

First, functions of the control section 50 of the grinding device 40 will be described. The control unit 50 includes, for example, an exchange command generation unit 50c, a position detection unit 50d, an opening/closing control unit 50e, a negative pressure control unit 50f, a cleaning control unit 50g, an auto-setup control unit 50h, and a blow control unit 50i. , has

The replacement command creation unit 50c determines whether or not the chuck 42 needs to be replaced, and creates a replacement command for the chuck 42 . Specifically, the replacement command creation unit 50c monitors, for example, the total grinding amount of the chuck 42, or the elapsed time from the attachment of the chuck 42, and creates a replacement command when the monitored value reaches the set value. do. The created exchange command is transmitted to the control unit 76 of the exchange device 7 wirelessly or by wire. Signals may be transmitted and received between the exchanging device 7 and the grinding device 40 via an external computer. The exchange device 7 travels to the grinding device 40 when it receives the exchange command and receives a request from the grinding device 40 .

The position detection unit 50d detects by the detection unit 53 whether or not the traveling table 73 of the exchange device 7 has arrived at the position for exchanging the chuck 42 (for example, the position shown in FIG. 6). The position for replacing the chuck 42 is set outside the exterior cover 44 and serves as both the position for attaching the chuck 42 and the position for removing the chuck 42 . The detection unit 53 (see FIG. 6) detects, for example, that the traveling base 73 of the exchanging device 7 has arrived at a set position outside the exterior cover 44 . The detection unit 53 is attached, for example, to the outer wall surface of the exterior cover 44 and is attached above the entry port 44a. The detection unit 53 is, for example, a camera.

The opening/closing control unit 50 e controls the moving mechanism 46 of the shutter 45 and controls the position of the shutter 45 . When the carriage 73 of the exchange device 7 reaches the position for exchanging the chuck 42, the opening/closing control section 50e changes the position of the shutter 45 from the closed position to the open position. Further, when the carriage 73 of the exchanging device 7 moves out of the position for exchanging the chuck 42, the opening/closing control section 50e changes the position of the shutter 45 from the open position to the closed position.

The negative pressure control unit 50f controls the air pressure controller 47b of the exhaust line 47a to make the inside of the exterior cover 44 have a negative pressure compared to the outside. The negative pressure control unit 50f makes the inside of the exterior cover 44 at a negative pressure compared to the outside at least while the shutter 45 is opening the inlet 44a of the exterior cover 44 .

The cleaning control unit 50g controls the cleaning mechanism 48 to supply the cleaning liquid to the chuck 42 or the peripheral members of the chuck 42 before the shutter 45 opens the inlet 44a of the exterior cover 44 . The supply of the cleaning liquid is performed, for example, after generation of an instruction to replace the chuck 42 . The supply of the cleaning liquid may also be performed during the grinding of the substrate W or at the end of the grinding.

The auto-setup control unit 50h performs auto-setup when the exchange of the chuck 42 is completed and the exchange device 7 moves out of the position where the chuck 42 is exchanged. Auto-setup includes, for example, grinding an unused chuck 42 by the processing unit 43 or adjusting the temperature inside the exterior cover 44 .

The blow control unit 50 i controls ejection of fluid from the ejection port 49 b of the mounting base 49 . For example, the blow control unit 50i performs control for ejecting fluid from the ejection port 49b of the mounting base 49 when the chuck 42 is removed from the mounting base 49 . Further, the blow control unit 50i may perform control for ejecting fluid from the injection port 49b of the mount 49 in order to correct the position of the chuck 42 when mounting the chuck 42 on the mount 49 .

Next, functions of the control unit 76 of the exchange device 7 will be described. The control unit 76 has, for example, a travel control unit 76c, a movement control unit 76d, and an exchange control unit 76e.

The travel control unit 76 c controls the travel mechanism 74 and controls the position of the travel table 73 . For example, the travel control unit 76c controls the travel mechanism 74 to travel the travel table 73 between the position where the chuck 42 is stored and the position where the chuck 42 is replaced.

The movement control section 76 d controls the movement mechanism 72 and controls the position of the exchange mechanism 71 . When the carriage 73 stops at the position for exchanging the chuck 42 and the exchange device 7 detects that the entry port 44a of the outer cover 44 is open by a signal or the like transmitted from the grinding device 40, the movement control unit 76d is activated. The exchange mechanism 71 is moved from the outside to the inside of the exterior cover 44 through the entry port 44a of the exterior cover 44 . Further, before the traveling table 73 leaves the position for replacing the chuck 42 , the movement control section 76 d moves the replacement mechanism 71 from the inside to the outside of the outer cover 44 through the entrance 44 a of the outer cover 44 .

The exchange control section 76 e controls the exchange mechanism 71 and controls the removal or attachment of the chuck 42 . The replacement control unit 76e tightens or loosens the bolt 81 with the operation mechanism 71a while the rotation of the mounting base 49 is stopped by the anti-rotation mechanism 71b. The exchange control unit 76 e controls the exchange mechanism 71 while monitoring the operation of the exchange mechanism 71 using the imaging device 75 .

Next, the operations of the grinding device 40 and the exchange device 7 will be collectively described. The grinding device 40 determines whether or not the chuck 42 needs to be replaced, and creates a command to replace the chuck 42 . Next, the grinding device 40 transmits the created replacement command to the replacement device 7 . Further, when the grinding device 40 determines that the chuck 42 needs to be replaced, it stops grinding the substrate W and performs cleaning by the cleaning mechanism 48 .

On the other hand, when receiving the replacement command from the grinding device 40 , the replacement device 7 approaches the grinding device 40 . The grinding device 40 opens the shutter 45 when it detects that the carriage 73 of the replacement device 7 has arrived at the position for replacing the chuck 42 . After that, the exchanging device 7 allows the exchanging mechanism 71 to enter through the entrance 44 a of the exterior cover 44 .

Next, the replacement mechanism 71 removes the used chuck 42 from the mount 49 . Specifically, for example, the bolt 81 is loosened by the operation mechanism 71a while the rotation of the mount 49 is stopped by the anti-rotation mechanism 71b. This operation is repeated by rotating the mounting base 49 by the rotation mechanism 71c to change the bolt 81 located directly below the operation mechanism 71a.

Next, the injection port 49b of the mount 49 injects the fluid. A gap is formed between the chuck 42 and the mount 49 by the jet pressure of the fluid, and the claw portion 711d of the arm 71d is inserted into the gap. After that, the injection of fluid is stopped. A claw portion 711d of the arm 71d holds the chuck 42 from below. The fork portion 712d of the arm 71d may be hooked on the bolt 81.

Next, the moving mechanism 72 carries out the used chuck 42 from the inside of the outer cover 44 to the outside by moving the arm 71d. After that, the arm 71 d stores the used chuck 42 in the storage section 9 of the exchange device 7 and takes out the unused chuck 42 from the storage section 9 . Subsequently, the moving mechanism 72 moves the arm 71d to carry the unused chuck 42 into the outer cover 44 from the outside.

Next, the exchange mechanism 71 attaches the unused chuck 42 to the mount 49 . Specifically, for example, the chuck 42 is placed on the mounting table 49 while the relative positions of the mounting table 49 and the chuck 42 are monitored by the imaging device 75 . At this time, the position of the chuck 42 with respect to the mount 49 may be corrected by fitting the positioning pin 83a into the positioning hole 83b.

Instead of or in addition to the positioning pin 83a and the positioning hole 83b, a taper screw 83c and taper screw holes 83d and 83e may be used to correct the position of the chuck 42 with respect to the mount 49. FIG. When the taper screw 83c is screwed into the taper screw holes 83d and 83e, if the chuck 42 sticks to the mount 49 and does not move, the jet port 49b of the mount 49 may jet the fluid.

After positioning the chuck 42 with respect to the mount 49 by the positioning portion 83 , the chuck 42 is fastened to the mount 49 with the bolt 81 . The bolt 81 is tightened by the operation mechanism 71a while the rotation of the mount 49 is stopped by the anti-rotation mechanism 71b. This operation is repeated by rotating the mounting base 49 by the rotation mechanism 71c to change the bolt 81 located directly below the operation mechanism 71a.

Next, the measuring mechanism 71 e measures the positional deviation of the chuck 42 with respect to the mount 49 . For example, the measuring mechanism 71 e measures the positional deviation of the center of the chuck 42 with respect to the center of the mount 49 . If the positional deviation measured by the measuring mechanism 71e is out of the allowable range, the arm 71d or the like corrects the position of the chuck 42 so that the positional deviation is within the allowable range.

Next, the exchanging device 7 causes the exchanging mechanism 71 to withdraw from the inlet 44a of the exterior cover 44 to the outside. Subsequently, the grinding device 40 closes the shutter 45 and performs auto-setup control. Auto-setup control includes, for example, grinding of an unused chuck 42 by the processing section 43 . Grinding of the chuck 42 is performed at the tertiary grinding position A3, for example, but may be performed at the primary grinding position A1 or the secondary grinding position A2.

The processing unit 43 grinds the chuck 42 to adjust the shape of the chuck surface of the chuck 42 . The grinding tool for grinding the chuck 42 may be prepared separately from the grinding tool D for grinding the substrate W. In this case, the exchange device 7 may exchange not only the chuck 42 but also the grinding tool D before closing the shutter 45 to perform auto-setup control.

After that, the grinding device 40 resumes grinding the substrate W. FIG. The grinding device 40 may measure the thickness distribution of the substrate W ground first after the exchange of the chuck 42, and change the inclination angle of the rotation center line R2 of the chuck 42 according to the thickness distribution. The inclination angle is changed so that variations in the thickness of the substrate W are reduced.

Next, with reference to FIG. 15, the grinding device 40 and the exchange device 7 according to the first modified example will be described. Differences from the above embodiment will be mainly described below.

The restriction mechanism 47 of the grinding device 40 of this modified example has a sealing member 47c in addition to the exhaust line 47a. Note that the restriction mechanism 47 may have only the seal member 47c. The seal member 47 c contacts the multi-joint arm of the exchanging device 7 that enters the inlet 44 a of the outer cover 44 and closes the inlet 44 a of the outer cover 44 . The sealing member 47c can restrict the outflow of gas and suppress the outflow of particles.

The seal member 47c is attached to the shutter 45, for example, and is moved together with the shutter 45. As shown in FIG. A pair of shutters 45 are provided, and sealing members 47c are attached to surfaces of the pair of shutters 45 facing each other. The pair of seal members 47 c sandwich and wrap the exchange device 7 and block the inlet 44 a of the exterior cover 44 . The sealing member 47c is made of a flexible material such as rubber, and deforms following the outer shape of the exchanging device 7. As shown in FIG.

When the carriage 73 of the exchanging device 7 reaches the set position outside the exterior cover 44, the opening/closing control section 50e changes the position of the shutter 45 from the closed position to the open position. After that, the movement control section 76d moves the exchange mechanism 71 from the outside to the inside of the exterior cover 44 through the entry port 44a of the exterior cover 44 . At that time, the seal member 47c does not come into contact with the exchanging device 7. As shown in FIG.

After that, the opening/closing control unit 50e changes the position of the shutter 45 from the open position to the seal position (for example, the position shown in FIG. 15). The sealing position is a position where the sealing member 47c contacts the multi-joint arm of the exchanging device 7 and closes the entry port 44a of the outer cover 44. As shown in FIG. With the sealing member 47c blocking the entry port 44a, the replacement control unit 76e controls the replacement mechanism 71 to remove or attach the chuck 42. FIG.

When the chuck 42 is removed or attached, the opening/closing control unit 50e changes the position of the shutter 45 from the sealing position to the open position. Subsequently, the movement control unit 76 d moves the exchange mechanism 71 from the outside to the inside of the exterior cover 44 through the entrance 44 a of the exterior cover 44 . Thereafter, the travel control unit 76c controls the travel mechanism 74 to travel the travel table 73 from the position where the chuck 42 is replaced to the position where the chuck 42 is stored.

Next, a grinding device 40 and an exchanging device 7 according to a second modified example will be described with reference to FIG. 16 . Differences from the above embodiment and the first modification will be mainly described below.

The exterior cover 44 of the grinding apparatus 40 of this modified example includes a main housing 44b in which an entrance 44a is formed, and a sub-housing 44b attached to the outer wall surface of the main housing 44b so as to surround the entrance 44a of the main housing 44b. and a body 44c. The main housing 44b accommodates the chuck 42, the mount 49, and the processing section 43 (see FIG. 4).

The sub-housing 44c includes a second inlet 44d through which the exchanging device 7 enters from the outside of the sub-housing 44c. After arriving at the position where the chuck 42 is to be replaced, the exchanging device 7 passes through the second inlet 44d and the inlet 44a in this order, enters the main housing 44b, and moves inside the main housing 44b. Replace the chuck 42.

The grinding device 40 includes a second shutter 61 that opens and closes the second inlet 44d of the sub-housing 44c. The second shutter 61 basically closes the second inlet 44d, and opens the second inlet 44d when the exchanging device 7 enters. Compared to the case where the second inlet 44d is always open, it is possible to suppress the outflow of particles from the inside of the exterior cover 44 to the outside through the second inlet 44d, and the factory room can be kept clean.

The grinding device 40 includes a second moving mechanism 62 that moves the second shutter 61 between a second open position that opens the second inlet 44d and a second closed position that closes the second inlet 44d. may The second moving mechanism 62 is a pneumatic cylinder, an electric cylinder, or the like. The second shutter 61 can be moved automatically instead of manually.

The control unit 50 of the grinding device 40 includes a second open/close control unit (not shown). The second opening/closing control section controls the second moving mechanism 62 and controls the position of the second shutter 61 . When the carriage 73 of the exchange device 7 reaches the position for exchanging the chuck 42, the second opening/closing control section changes the position of the second shutter 61 from the second closed position to the second open position. Further, when the carriage 73 of the exchanging device 7 moves out of the position for exchanging the chuck 42, the second opening/closing control section changes the position of the second shutter 61 from the second open position to the second closed position.

The limiting mechanism 47 of the grinding device 40 may have a second sealing member 47d. The second seal member 47d comes into contact with the articulated arm or the like of the exchanging device 7 entering the second inlet 44d of the sub-housing 44c, and closes the second inlet 44d of the sub-housing 44c. The second sealing member 47d can restrict the outflow of gas and suppress the outflow of particles.

The second seal member 47 d is attached to, for example, the second shutter 61 and is moved together with the second shutter 61 . A pair of second shutters 61 are provided, and a second sealing member 47d is attached to the surfaces of the pair of second shutters 61 facing each other. The pair of second seal members 47 d sandwich and wrap the exchange device 7 and block the second inlet 44 d of the exterior cover 44 . The second seal member 47 d is made of a flexible material such as rubber, and deforms following the outer shape of the exchanging device 7 .

When the carriage 73 of the exchanging device 7 reaches the set position outside the exterior cover 44, the second opening/closing control section changes the position of the second shutter 61 from the second closed position to the second open position. After that, the movement control section 76d moves the exchange mechanism 71 from the outside to the inside of the sub-housing 44c through the second inlet 44d of the sub-housing 44c. At that time, the second seal member 47d does not come into contact with the exchanging device 7. As shown in FIG.

After that, the second opening/closing control unit changes the position of the second shutter 61 from the second open position to the second sealing position (for example, the position shown in FIG. 16). The second seal position is a position where the second seal member 47d contacts the multi-joint arm of the exchanging device 7 and closes the second inlet 44d of the sub-housing 44c. With the second sealing member 47d blocking the second inlet 44d, the opening/closing control unit 50e changes the position of the shutter 45 from the closed position to the open position. Next, the movement control section 76d moves the exchange mechanism 71 from the outside to the inside of the main housing 44b through the entrance 44a of the main housing 44b. Subsequently, the opening/closing control unit 50e changes the position of the shutter 45 from the open position to the seal position. Thereafter, the exchange control section 76e controls the exchange mechanism 71 to remove or attach the chuck 42. FIG. When the second seal member 47d is attached to the second shutter 61, if the second seal member 47d closes the second entrance 44d of the sub-housing 44c, the outflow of particles can be suppressed. Therefore, the seal member 47c may be omitted. However, if the sealing member 47c is also provided, the outflow of particles can be further suppressed.

When the chuck 42 is removed or attached, the opening/closing control unit 50e changes the position of the shutter 45 from the sealing position to the open position. Next, the movement control section 76d moves the exchange mechanism 71 from the inside of the main housing 44b to the outside through the entrance 44a of the main housing 44b. Next, the opening/closing control unit 50e changes the position of the shutter 45 from the open position to the closed position. After that, the second opening/closing control unit changes the position of the second shutter 61 from the second seal position to the second open position. Subsequently, the movement control section 76d moves the exchange mechanism 71 from the inside of the sub-housing 44c to the outside through the second inlet 44d of the sub-housing 44c. Thereafter, the travel control unit 76c controls the travel mechanism 74 to travel the travel table 73 from the position where the chuck 42 is replaced to the position where the chuck 42 is stored. By closing at least one of the inlet 44a and the second inlet 44d instead of opening them at the same time, the inside of the main housing 44b is prevented from being opened to the outside of the grinding apparatus 40. can.

Next, a grinding device 40 and an exchanging device 7 according to a third modified example will be described with reference to FIG. 17 . Differences from the above embodiment, the first modification, and the second modification will be mainly described below.

The exchange device 7 of this modified example includes a housing 77 attached to a running platform 73 . The housing 77 contacts the outer wall surface of the exterior cover 44 in a state in which the replacement mechanism 71 and the moving mechanism 72 are housed therein, and seals the inside of the housing 77 . The housing 77 may have a seal member 77a on the contact surface with the exterior cover 44 .

When the shutter 45 opens the entry port 44 a of the exterior cover 44 , the interior of the housing 77 and the interior of the exterior cover 44 communicate through the entry port 44 a of the exterior cover 44 . In this state, the chuck 42 is replaced. The housing 77 can limit the outflow of gas, suppress the outflow of particles, and keep the factory room clean.

When the exterior cover 44 has the main housing 44b and the sub-housing 44c as shown in FIG. 16, the housing 77 contacts the outer wall surface of the sub-housing 44c. When the second shutter 61 opens the second entrance 44d of the sub-housing 44c and the shutter 45 opens the entrance 44a of the main housing 44b, the inside of the housing 77 and the inside of the main housing 44b communicate. .

Although the exchange device, the processing device, and the exchange method according to the present disclosure have been described above, the present disclosure is not limited to the above-described embodiments and the like. Various changes, modifications, substitutions, additions, deletions, and combinations are possible within the scope of the claims. These also naturally belong to the technical scope of the present disclosure.

In addition, although the processing apparatus of the present disclosure is a grinding apparatus in the above embodiment, it may be a cutting apparatus, a cutting apparatus, or the like. Grinding includes polishing. The processing apparatus may include a holding section that holds a processing object, a mounting section to which the holding section is replaceably attached, and a processing section that processes the processing object held by the holding portion. The processing unit drives, for example, a processing tool. A processing tool is replaceably attached to the processing section. When the processing device is a cutting device, a cutting tool such as an end mill is used as the processing tool. Further, when the processing device is a cutting device, a cutting tool such as a blade is used as the processing tool. The processing tool contacts the processing object and processes the processing object. Processing tools are replaced when they wear out.

Further, although the object to be processed by the processing apparatus of the present disclosure is the substrate W in the above embodiment, it is not limited to the substrate W.

7 exchange device 40 grinding device (processing device)
42 chuck (holding part)
43 Processing unit 44 Exterior cover 44a Entrance port 49 Mounting base (mounting unit)
71 Exchange mechanism 72 Moving mechanism 73 Travel table 74 Travel mechanism W Substrate (processing body)

Claims (14)

A holding part for holding an object to be processed, a mounting part to which the holding part is exchangeably mounted, a processing part for processing the object to be processed held by the holding part, the holding part, the mounting part, and the processing A replacement device for the holding part used in a processing apparatus comprising an exterior cover that houses the holding part,
a replacement mechanism for attaching the holding portion to the attaching portion or removing the holding portion from the attaching portion;
a moving mechanism for moving the exchange mechanism from the outside to the inside of the exterior cover through the entrance of the exterior cover;
a running platform that supports the moving mechanism;
a running mechanism for running the running platform;
A switching device. 2. The exchange device according to claim 1, wherein said exchange mechanism has a detent mechanism for stopping rotation of said holder. 3. The exchanging device according to claim 1, wherein said exchanging mechanism has a rotating mechanism for rotating said holding portion. A housing attached to the running platform,
the housing accommodates the exchange mechanism and the moving mechanism and is in contact with an outer wall surface of the exterior cover to seal the inside of the housing;
4. The exchange device according to claim 1, wherein the inside of said housing and the inside of said exterior cover communicate with each other through said entrance of said exterior cover. Equipped with a control unit,
The control unit receives a replacement command created by the processing device, travels the traveling platform to a set position outside the outer cover when receiving the replacement command, and enters the outer cover. detecting that the port is open; entering the replacement mechanism from the outside of the exterior cover into the interior through the entrance; attaching the holding portion to the attachment portion with the replacement mechanism; or removing the holding portion from the mounting portion. The exchange mechanism has a pair of arms that grip the holding part,
Each of the pair of arms has a claw portion inserted between the mounting portion and the holding portion, or a bifurcated fork portion hooked on a bolt attached to the holding portion. An exchange device according to any one of the preceding claims. A holding part for holding an object to be processed, a mounting part to which the holding part is exchangeably mounted, a processing part for processing the object to be processed held by the holding part, the holding part, the mounting part, and the processing A method for replacing the holding part used in a processing apparatus comprising an exterior cover for housing the holding part,
a replacement device of the holding part receiving a replacement command generated by the processing device;
the replacement device traveling to a set position outside the exterior cover;
detecting by the replacement device that the entry port of the exterior cover is open;
the exchanging device enters from the outside of the exterior cover into the exterior cover through the entry port of the exterior cover;
the exchange device attaching the holding portion to the attaching portion or removing the holding portion from the attaching portion;
exchange method, including A holding part for holding an object to be processed, a mounting part to which the holding part is exchangeably mounted, a processing part for processing the object to be processed held by the holding part, the holding part, the mounting part, and the processing A processing device comprising an exterior cover that houses a part,
The outer cover has an entrance through which the replacement device for the holding part enters from the outside of the outer cover to the inside,
The processing device includes a shutter that opens and closes the entrance of the exterior cover, and a control unit,
The control unit creates a replacement command to replace the holding unit, transmits the replacement command to the replacement device, detects arrival of the replacement device, and detects the arrival of the replacement device. A processing unit that performs controls including opening the shutter. The control unit performs control including closing the shutter after the replacement device exits from the inside of the exterior cover and processing the holding unit by the processing unit after closing the shutter. 9. The processing apparatus of claim 8, wherein 10. The processing apparatus according to claim 8, further comprising a seal member that contacts said exchange device that has entered said entrance of said exterior cover and closes said entrance of said exterior cover. The exterior cover has a main housing in which the entrance is formed, and a sub-housing attached to an outer wall surface of the main housing so as to surround the entrance of the main housing,
The sub-housing includes a second entrance through which the exchange device enters from the outside of the sub-housing to the inside,
The processing device contacts the second shutter that opens and closes the second entrance of the sub-casing, and the exchange device that has entered the second entrance of the sub-casing. 11. The processing apparatus according to any one of claims 8 to 10, further comprising a second sealing member that closes the second inlet. 12. The processing apparatus according to any one of claims 8 to 11, further comprising a positioning portion that determines the position of said holding portion with respect to said mounting portion. 13. The processing apparatus according to any one of claims 8 to 12, wherein said mounting portion has a jetting port for jetting a fluid on a mounting surface to which said holding portion is mounted. A holding part for holding an object to be processed, a mounting part to which the holding part is exchangeably mounted, a processing part for processing the object to be processed held by the holding part, the holding part, the mounting part, and the processing A method for replacing the holding part used in a processing apparatus comprising an exterior cover for housing the holding part,
the processing device creating a replacement command to replace the holding unit and transmitting the replacement command to a holding unit replacement device;
detecting by the processing device that the replacement device has reached a set position outside the exterior cover;
After detecting the arrival of the replacement device, the processing device opens a shutter that opens and closes the entrance of the exterior cover;
the exchanging device enters from the outside of the exterior cover into the exterior cover through the entry port of the exterior cover;
the exchange device attaching the holding portion to the attaching portion or removing the holding portion from the attaching portion;
exchange method, including

Images