TW202309149A - Film-forming composition - Google Patents

Film-forming composition Download PDF

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TW202309149A
TW202309149A TW111115480A TW111115480A TW202309149A TW 202309149 A TW202309149 A TW 202309149A TW 111115480 A TW111115480 A TW 111115480A TW 111115480 A TW111115480 A TW 111115480A TW 202309149 A TW202309149 A TW 202309149A
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古川智規
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日商日產化學股份有限公司
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Abstract

A film-forming composition that comprises a triazine ring-containing polymer, which contains a repeating unit structure represented by formula (1) and has at least one terminal triazine ring and in which at least a part of the terminal triazine ring is blocked with an amino group having a crosslinking group, a crosslinking agent, inorganic fine particles and an organic solvent. [In formula (1): R and R' independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group; Q represents a divalent group having a cyclic structure and carrying 3-30 carbon atoms; and the symbol * represents a bond.].

Description

膜形成用組成物Composition for film formation

本發明關於一種膜形成用組成物。The present invention relates to a film-forming composition.

近年來,開發液晶顯示器、有機電致發光(EL)元件(有機EL顯示器或有機EL照明)、觸控板、光半導體(發光二極體(LED)等)元件、固體攝影元件、有機薄膜太陽電池、色素增感太陽電池及有機薄膜電晶體(TFT)等之電子裝置時,逐漸要求高機能之高分子材料。 作為要求之具體特性,有舉出1)耐熱性、2)透明性、3)高折射率、4)高溶解性、5)低體積收縮率、6)高溫高濕耐性、7)高膜硬度等。 有鑑於此點,本申請人已發現,包含具有三嗪環及芳香環之重複單位之聚合物具有高折射率,聚合物能夠單獨地達成高耐熱性、高透明性、高折射率、高溶解性、低體積收縮,適合作為製作電子裝置時之膜形成用組成物(專利文獻1)。 In recent years, liquid crystal displays, organic electroluminescent (EL) elements (organic EL displays or organic EL lighting), touch panels, optical semiconductors (light-emitting diodes (LEDs, etc.) For electronic devices such as batteries, dye-sensitized solar cells, and organic thin-film transistors (TFT), high-performance polymer materials are gradually required. Specific properties required include 1) heat resistance, 2) transparency, 3) high refractive index, 4) high solubility, 5) low volume shrinkage, 6) high temperature and high humidity resistance, 7) high film hardness wait. In view of this, the present applicant has found that a polymer comprising a repeating unit having a triazine ring and an aromatic ring has a high refractive index, and that the polymer alone can achieve high heat resistance, high transparency, high refractive index, high solubility properties, low volume shrinkage, and is suitable as a film-forming composition for the production of electronic devices (Patent Document 1).

然而,一般來說,有機EL照明之平坦化層或光散射層等中,有使用將高折射率材料溶解於有機溶媒之組成物,並藉由塗布法來製作薄膜,但有時候由於透明導電膜之種類,會沒辦法使用高極性之溶媒。 且,使用塗布裝置,塗布包含高折射聚合物之膜形成用組成物後,作為裝置之管線洗淨溶媒,有時能使用低極性溶媒等,若為對如此溶媒之溶解性較低之聚合物,會產生管線阻塞之問題。進而,電子裝置之製造時,薄膜暴露於溶劑中時,因條件的不同,有時製作出的薄膜會產生裂縫,關於其耐久性也要求進一步的改善。 [先前技術文獻] [專利文獻] However, in general, in the planarization layer or light scattering layer of organic EL lighting, there is a composition that dissolves a high refractive index material in an organic solvent, and the film is made by a coating method, but sometimes due to the transparent conductive Depending on the type of membrane, it is impossible to use a highly polar solvent. Also, after coating a film-forming composition containing a high-refractive polymer using a coating device, as a solvent for cleaning the pipeline of the device, a low-polarity solvent or the like can be used in some cases. If it is a polymer with low solubility in such a solvent , will cause the problem of pipeline blockage. Furthermore, when the thin film is exposed to solvents during the manufacture of electronic devices, cracks may occur in the thin film produced depending on the conditions, and further improvement in durability is required. [Prior Art Literature] [Patent Document]

[專利文獻1]國際公開第2010/128661號[Patent Document 1] International Publication No. 2010/128661

[解決發明之課題][Solving the Problem of Invention]

本發明有鑑於上述事情,目的為提供一種能夠形成高折射率且透明性及耐溶劑性(耐裂縫性)優異之薄膜之膜形成用組成物。 [解決課題之手段] In view of the above, the present invention aims to provide a film-forming composition capable of forming a thin film having a high refractive index and excellent transparency and solvent resistance (crack resistance). [Means to solve the problem]

本發明者為了達成上述目的,進行縝密探討結果發現,藉由使用具有至少1個三嗪環末端的同時,其三嗪環末端至至少一部份經具有交聯基之胺基封止之含三嗪環之聚合物與無機微粒子,能夠形成高折射率且透明性及耐溶劑性優異之薄膜,進而完成本發明。In order to achieve the above object, the present inventors conducted careful research and found that by using at least one triazine ring terminal, at least a part of the triazine ring terminal is blocked by an amino group having a crosslinking group. A polymer of triazine rings and inorganic fine particles can form a thin film with a high refractive index and excellent transparency and solvent resistance, thereby completing the present invention.

亦即,本發明提供一種下述含三嗪環之聚合物及包含其之膜形成用組成物。 [1] 膜形成用組成物,其係包含: 包含下述式(1)表示之重複單位構造,至少具有1個三嗪環末端,且此三嗪環末端之至少一部份經具有交聯基之胺基封止之含三嗪環之聚合物,與 交聯劑,與 無機微粒子,與 有機溶媒,

Figure 02_image001
(式(1)中,R及R’各自獨立表示氫原子、烷基、烷氧基、芳基或芳烷基,Q表示具有環構造之碳數3~30之2價基,*表示鍵結處)。 [2] 如[1]之膜形成用組成物,其中,前述式(1)中之Q表示選自式(2)~(13)及式(102)~(115)所示之群中至少1種。
Figure 02_image003
[式(2)~式(13)中,R 1~R 92各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, R 93及R 94表示氫原子或碳數1~10之烷基, W 1及W 2各自獨立表示單鍵、CR 95R 96(R 95及R 96各自獨立表示氫原子、碳數1~10之烷基(惟,此等亦可一起形成環),或碳數1~10之鹵素化烷基)、C=O、O、S、SO、SO 2,或NR 97(R 97表示氫原子、碳數1~10之烷基或苯基), X 1及X 2各自獨立表示單鍵、碳數1~10之伸烷基,或式(14)
Figure 02_image005
(式(14)中,R 98~R 101各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, Y 1及Y 2各自獨立表示單鍵或碳數1~10之伸烷基)所示之基, *表示鍵結處]
Figure 02_image007
(式(102)~式(115)中,R 1及R 2各自獨立表示亦可具有分枝構造之碳數1~5之伸烷基,*表示鍵結處)。 [3] 如[2]之膜形成用組成物,其中,前述式(2)~(13)中,前述R 1~R 92及R 98~R 101各自獨立為氫原子、鹵原子或碳數1~10之鹵素化烷基。 [4] 如[1]~[3]中任一項之膜形成用組成物,其中,前述具有交聯基之胺基為式(15)所示,
Figure 02_image009
(式(15)中,R 102表示交聯基,*表示鍵結處)。 [5] 如[4]之膜形成用組成物,其中,前述具有交聯基之胺基為式(16)所示,
Figure 02_image011
(式(16)中,R 102表示與上述相同意義,*表示鍵結處)。 [6] 如[4]或[5]之膜形成用組成物,其中,前述R 102為含羥基之基或含(甲基)丙烯醯基之基。 [7] 如[6]之膜形成用組成物,其中,前述R 102為羥基烷基、(甲基)丙烯醯基氧基烷基或下述式(i)表示之基,
Figure 02_image013
(式(i)中,A 1表示碳數1~10之伸烷基,A 2表示單鍵或下述式(j)
Figure 02_image015
表示之基,A 3表示亦可經羥基取代之(a+1)價之脂肪族烴基,A 4表示氫原子或甲基,a表示1或2,*表示鍵結處)。 [8] 如[7]之膜形成用組成物,其中,前述R 102為選自羥基甲基、2-羥基乙基、(甲基)丙烯醯基氧基甲基、(甲基)丙烯醯基氧基乙基及下述式(i-2)~式(i-5)表示之基中之基,
Figure 02_image017
(式(i-1)~式(i-5)中,*表示鍵結處)。 [9] 如[2]~[8]中任一項之膜形成用組成物,其中,前述式(1)中之Q中至少1個芳香族環中含有至少1個鹵原子或碳數1~10之鹵素化烷基。 [10] 如[1]~[9]中任一項之膜形成用組成物,其中,三嗪環末端之一部份經無取代芳基胺基封止。 [11] 如[10]之膜形成用組成物,其中,前述無取代芳基胺基為式(33)所示,
Figure 02_image019
(式(33)中,*表示鍵結處)。 [12] 如[1]~[11]中任一項之膜形成用組成物,其中,前述式(1)中之Q為式(17)所示,
Figure 02_image021
(式(17)中,*表示鍵結處)。 [13] 如[1]~[12]中任一項之膜形成用組成物,其中,前述式(1)中之Q為式(20)所示,
Figure 02_image023
(式(20)中,*表示鍵結處)。 [14] 如[1]~[13]中任一項之膜形成用組成物,其中,前述交聯劑為多官能(甲基)丙烯酸化合物。 [15] 如[1]~[14]中任一項之膜形成用組成物,其中,前述無機微粒子包含金屬氧化物、金屬硫化物或金屬氮化物。 [16] 如[1]~[15]中任一項之膜形成用組成物,其中,前述有機溶媒包含選自二醇酯系溶媒、酮系溶媒及酯系溶媒中至少1種。 [17] 一種薄膜,其係由如[1]~[16]中任一項之膜形成用組成物而得。 [18] 一種電子裝置,其係具備基材與形成於前述基材上之如[17]之薄膜。 [19] 一種光學構件,其係具備基材與形成於前述基材上之如[17]之薄膜。 [發明效果] That is, the present invention provides the following triazine ring-containing polymer and a film-forming composition comprising the same. [1] A film-forming composition comprising: a repeating unit structure represented by the following formula (1), having at least one triazine ring terminal, and at least a part of the triazine ring terminal having a crosslink Polymers containing triazine rings blocked by amine groups, cross-linking agents, inorganic microparticles, and organic solvents,
Figure 02_image001
(In formula (1), R and R' each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, Q represents a divalent group with 3 to 30 carbon atoms having a ring structure, and * represents a bond junction). [2] The film-forming composition according to [1], wherein Q in the aforementioned formula (1) represents at least 1 species.
Figure 02_image003
[In formulas (2) to (13), R 1 to R 92 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, or a halogenated alkyl group with 1 to 10 carbons or an alkoxy group with 1 to 10 carbons, R 93 and R 94 represent a hydrogen atom or an alkyl group with 1 to 10 carbons, W 1 and W 2 independently represent a single bond, CR 95 R 96 (R 95 and R 96 Each independently represents a hydrogen atom, an alkyl group with a carbon number of 1 to 10 (but these can also form a ring together), or a halogenated alkyl group with a carbon number of 1 to 10), C=O, O, S, SO, SO 2 , or NR 97 (R 97 represents a hydrogen atom, an alkyl group with 1 to 10 carbons or a phenyl group), X 1 and X 2 each independently represent a single bond, an alkylene group with 1 to 10 carbons, or the formula (14 )
Figure 02_image005
(In formula (14), R 98 ~ R 101 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, a halogenated alkyl group with 1 to 10 carbons, or a halogenated alkyl group with 1 to 10 carbons 10 alkoxy, Y 1 and Y 2 each independently represent a single bond or a group represented by an alkylene group with 1 to 10 carbons), * represents a bond]
Figure 02_image007
(In formulas (102) to (115), R 1 and R 2 each independently represent an alkylene group with 1 to 5 carbons that may also have a branched structure, and * represents a bond). [3] The film-forming composition according to [2], wherein, in the aforementioned formulas (2) to (13), the aforementioned R 1 to R 92 and R 98 to R 101 are each independently a hydrogen atom, a halogen atom, or a carbon number 1-10 halogenated alkyl groups. [4] The film-forming composition according to any one of [1] to [3], wherein the amino group having a crosslinking group is represented by formula (15),
Figure 02_image009
(In the formula (15), R 102 represents a crosslinking group, and * represents a bond). [5] The film-forming composition according to [4], wherein the amine group having a crosslinking group is represented by formula (16),
Figure 02_image011
(In the formula (16), R 102 represents the same meaning as above, and * represents a bond). [6] The film-forming composition according to [4] or [5], wherein the aforementioned R 102 is a hydroxyl group-containing group or a (meth)acryl group-containing group. [7] The film-forming composition according to [6], wherein the aforementioned R 102 is a hydroxyalkyl group, a (meth)acryloxyalkyl group, or a group represented by the following formula (i),
Figure 02_image013
(In formula (i), A 1 represents an alkylene group with 1 to 10 carbon atoms, A 2 represents a single bond or the following formula (j)
Figure 02_image015
The group represented by A 3 represents an aliphatic hydrocarbon group with a valence of (a+1) which may also be substituted by a hydroxyl group, A 4 represents a hydrogen atom or a methyl group, a represents 1 or 2, and * represents a bond). [8] The film-forming composition according to [7], wherein the R102 is selected from hydroxymethyl, 2-hydroxyethyl, (meth)acryloxymethyl, (meth)acryl Base oxyethyl group and the base in the base represented by the following formula (i-2) ~ formula (i-5),
Figure 02_image017
(In the formula (i-1) to the formula (i-5), * represents a bonding position). [9] The film-forming composition according to any one of [2] to [8], wherein at least one aromatic ring in Q in the aforementioned formula (1) contains at least one halogen atom or one carbon number 1 ~10 halogenated alkyl groups. [10] The film-forming composition according to any one of [1] to [9], wherein a part of the terminal of the triazine ring is blocked with an unsubstituted arylamine group. [11] The film-forming composition according to [10], wherein the unsubstituted arylamine group is represented by formula (33),
Figure 02_image019
(In the formula (33), * represents a bonding site). [12] The film-forming composition according to any one of [1] to [11], wherein Q in the aforementioned formula (1) is represented by formula (17),
Figure 02_image021
(In the formula (17), * represents a bonding site). [13] The film-forming composition according to any one of [1] to [12], wherein Q in the aforementioned formula (1) is represented by formula (20),
Figure 02_image023
(In the formula (20), * represents a bonding site). [14] The film-forming composition according to any one of [1] to [13], wherein the crosslinking agent is a polyfunctional (meth)acrylic compound. [15] The film-forming composition according to any one of [1] to [14], wherein the inorganic fine particles include metal oxides, metal sulfides, or metal nitrides. [16] The film-forming composition according to any one of [1] to [15], wherein the organic solvent contains at least one selected from the group consisting of glycol ester-based solvents, ketone-based solvents, and ester-based solvents. [17] A thin film obtained from the film-forming composition according to any one of [1] to [16]. [18] An electronic device comprising a substrate and the thin film according to [17] formed on the substrate. [19] An optical member comprising a substrate and the thin film according to [17] formed on the substrate. [Invention effect]

藉由本發明,能夠提供一種形成高折射率且透明性及耐溶劑性優異之薄膜之膜形成用組成物。 由本發明之膜形成用組成物所製作之薄膜,由於能夠發揮高耐熱性、高折射率、低體積收縮、耐溶劑性(耐裂縫性)這些特性,能夠適當地利用在製作液晶顯示器、有機EL元件(有機EL顯示器或有機EL照明)、觸控板、光半導體元件、固體撮像元件、有機薄膜太陽電池、色素增感太陽電池、有機薄膜電晶體、鏡片、稜鏡、相機、雙筒望遠鏡、顯微鏡、半導體曝光裝置等時之一構件等電子裝置或光學材料之領域。 尤其是由本發明之膜形成用組成物所製作之薄膜之透明性較高,且折射率或耐溶劑性(耐裂縫性)亦較高,藉由作為有機EL照明之平坦化層或光散射層來使用,能夠改善其光取出之效率(光擴散效率),且同時能改善其耐久性。 According to the present invention, it is possible to provide a film-forming composition that forms a thin film having a high refractive index and excellent transparency and solvent resistance. The thin film made of the film-forming composition of the present invention can be suitably utilized in the production of liquid crystal displays, organic ELs, etc. Components (organic EL display or organic EL lighting), touch panels, optical semiconductor components, solid-state imaging components, organic thin-film solar cells, dye-sensitized solar cells, organic thin-film transistors, lenses, lenses, cameras, binoculars, The field of electronic devices or optical materials such as components of microscopes, semiconductor exposure devices, etc. In particular, a thin film made of the film-forming composition of the present invention has high transparency, high refractive index or solvent resistance (crack resistance), and can be used as a planarization layer or a light scattering layer for organic EL lighting. To use, can improve its light extraction efficiency (light diffusion efficiency), and at the same time can improve its durability.

以下關於本發明進行更詳細之說明。 本發明相關之膜形成用組成物包含:含三嗪環之聚合物,與交聯劑,與無機微粒子,與有機溶媒。 The present invention will be described in more detail below. The film-forming composition related to the present invention includes: a polymer containing a triazine ring, a cross-linking agent, inorganic fine particles, and an organic solvent.

(1).含三嗪環之聚合物 含三嗪環之聚合物包含下述式(1)表示之重複單位構造。 含三嗪環之聚合物例如所謂超枝聚合物。超枝聚合物意指具有不規則之分枝構造之高分枝聚合物。於此之不規則意指比具有規則的分枝構造之高分枝聚合物之樹枝狀聚合物之分枝構造更不規則。 例如超枝聚合物之含三嗪環之聚合物中,作為比式(1)表示之重複單位構造大之構造,為式(1)表示之重複單位構造的三個鍵結處各自包含式(1)表示之重複單位構造所鍵結之構造(構造X)。超枝聚合物之含三嗪環之聚合物中,構造X會分布在含三嗪環之聚合物之去除末端之全體。 超枝聚合物之含三嗪環之聚合物中,重複單位構造亦可實質上僅有式(1)表示之重複單位構造。 (1). Polymers containing triazine rings The triazine ring-containing polymer includes a repeating unit structure represented by the following formula (1). Polymers containing triazine rings are, for example, so-called hyperbranch polymers. Hyperbranched polymers refer to highly branched polymers with irregular branched structures. Irregular here means that the branched structure of the dendritic polymer is more irregular than that of a hyperbranched polymer having a regular branched structure. For example, in the polymer containing triazine ring of hyperbranch polymer, as a structure larger than the repeating unit structure represented by formula (1), the three bonds of the repeating unit structure represented by formula (1) respectively include formula ( 1) The structure (structure X) bonded by the repeating unit structure represented. In the triazine ring-containing polymer of the hyperbranch, the structure X is distributed over the entirety of the triazine ring-containing polymer except for the terminal. In the triazine ring-containing polymer of the hyperbranch polymer, the repeating unit structure may be substantially only the repeating unit structure represented by formula (1).

Figure 02_image025
*表示鍵結處。
Figure 02_image025
*Indicates a bond.

<<R及R’>> 上述式中,R及R’各自獨立表示氫原子、烷基、烷氧基、芳基或芳烷基,但以更提高折射率之觀點來看,一起為氫原子較佳。 本發明中,作為烷基之碳數並無特別限定,但為1~20較佳,若考慮更提高聚合物之耐熱性的話,作為烷基之碳數,為1~10再較佳,為1~3再更較佳。且,烷基之構造並無特別限定,亦可為例如直鏈狀、分枝狀、環狀及此等之2種以上之組合之任一者。 <<R and R'>> In the above formula, R and R' each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, but they are preferably a hydrogen atom together from the viewpoint of further increasing the refractive index. In the present invention, the carbon number of the alkyl group is not particularly limited, but it is preferably 1 to 20. In consideration of improving the heat resistance of the polymer, the carbon number of the alkyl group is more preferably 1 to 10, which is 1~3 is better. In addition, the structure of the alkyl group is not particularly limited, and may be, for example, any of linear, branched, cyclic, and combinations of two or more of these.

作為烷基之具體例,有舉出甲基、乙基、n-丙基、異丙基、環丙基、n-丁基、異丁基、s-丁基、t-丁基、環丁基、1-甲基-環丙基、2-甲基-環丙基、n-戊基、1-甲基-n-丁基、2-甲基-n-丁基、3-甲基-n-丁基、1,1-二甲基-n-丙基、1,2-二甲基-n-丙基、2,2-二甲基-n-丙基、1-乙基-n-丙基、環戊基、1-甲基-環丁基、2-甲基-環丁基、3-甲基-環丁基、1,2-二甲基-環丙基、2,3-二甲基-環丙基、1-乙基-環丙基、2-乙基-環丙基、n-己基、1-甲基-n-戊基、2-甲基-n-戊基、3-甲基-n-戊基、4-甲基-n-戊基、1,1-二甲基-n-丁基、1,2-二甲基-n-丁基、1,3-二甲基-n-丁基、2,2-二甲基-n-丁基、2,3-二甲基-n-丁基、3,3-二甲基-n-丁基、1-乙基-n-丁基、2-乙基-n-丁基、1,1,2-三甲基-n-丙基、1,2,2-三甲基-n-丙基、1-乙基-1-甲基-n-丙基、1-乙基-2-甲基-n-丙基、環己基、1-甲基-環戊基、2-甲基-環戊基、3-甲基-環戊基、1-乙基-環丁基、2-乙基-環丁基、3-乙基-環丁基、1,2-二甲基-環丁基、1,3-二甲基-環丁基、2,2-二甲基-環丁基、2,3-二甲基-環丁基、2,4-二甲基-環丁基、3,3-二甲基-環丁基、1-n-丙基-環丙基、2-n-丙基-環丙基、1-異丙基-環丙基、2-異丙基-環丙基、1,2,2-三甲基-環丙基、1,2,3-三甲基-環丙基、2,2,3-三甲基-環丙基、1-乙基-2-甲基-環丙基、2-乙基-1-甲基-環丙基、2-乙基-2-甲基-環丙基、2-乙基-3-甲基-環丙基等。Specific examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, cyclopropyl, n-butyl, isobutyl, s-butyl, t-butyl, cyclobutyl Base, 1-methyl-cyclopropyl, 2-methyl-cyclopropyl, n-pentyl, 1-methyl-n-butyl, 2-methyl-n-butyl, 3-methyl- n-butyl, 1,1-dimethyl-n-propyl, 1,2-dimethyl-n-propyl, 2,2-dimethyl-n-propyl, 1-ethyl-n -Propyl, cyclopentyl, 1-methyl-cyclobutyl, 2-methyl-cyclobutyl, 3-methyl-cyclobutyl, 1,2-dimethyl-cyclopropyl, 2,3 -Dimethyl-cyclopropyl, 1-ethyl-cyclopropyl, 2-ethyl-cyclopropyl, n-hexyl, 1-methyl-n-pentyl, 2-methyl-n-pentyl , 3-methyl-n-pentyl, 4-methyl-n-pentyl, 1,1-dimethyl-n-butyl, 1,2-dimethyl-n-butyl, 1,3 -Dimethyl-n-butyl, 2,2-dimethyl-n-butyl, 2,3-dimethyl-n-butyl, 3,3-dimethyl-n-butyl, 1 -Ethyl-n-butyl, 2-ethyl-n-butyl, 1,1,2-trimethyl-n-propyl, 1,2,2-trimethyl-n-propyl, 1 -Ethyl-1-methyl-n-propyl, 1-ethyl-2-methyl-n-propyl, cyclohexyl, 1-methyl-cyclopentyl, 2-methyl-cyclopentyl, 3-methyl-cyclopentyl, 1-ethyl-cyclobutyl, 2-ethyl-cyclobutyl, 3-ethyl-cyclobutyl, 1,2-dimethyl-cyclobutyl, 1, 3-Dimethyl-cyclobutyl, 2,2-dimethyl-cyclobutyl, 2,3-dimethyl-cyclobutyl, 2,4-dimethyl-cyclobutyl, 3,3- Dimethyl-cyclobutyl, 1-n-propyl-cyclopropyl, 2-n-propyl-cyclopropyl, 1-isopropyl-cyclopropyl, 2-isopropyl-cyclopropyl, 1,2,2-Trimethyl-cyclopropyl, 1,2,3-trimethyl-cyclopropyl, 2,2,3-trimethyl-cyclopropyl, 1-ethyl-2-methyl Base-cyclopropyl, 2-ethyl-1-methyl-cyclopropyl, 2-ethyl-2-methyl-cyclopropyl, 2-ethyl-3-methyl-cyclopropyl, etc.

作為上述烷氧基之碳數,並無特別限定,但為1~20較佳,若考慮更提高聚合物之耐熱性的話,作為烷氧基之碳數,為1~10再較佳,為1~3再更較佳。且,此烷基部分之構造並無特別限定,亦可為例如直鏈狀、分枝狀、環狀及此等之2種以上之組合之任一者。The carbon number of the above-mentioned alkoxy group is not particularly limited, but it is preferably 1 to 20. In consideration of improving the heat resistance of the polymer, the carbon number of the alkoxy group is more preferably 1 to 10, which is 1~3 is better. In addition, the structure of the alkyl moiety is not particularly limited, and may be, for example, any of linear, branched, cyclic, and combinations of two or more of these.

作為烷氧基之具體例,有舉出甲氧基、乙氧、n-丙氧基、異丙氧基、n-丁氧基、異丁氧基、s-丁氧基、t-丁氧基、n-戊氧基、1-甲基-n-丁氧基、2-甲基-n-丁氧基、3-甲基-n-丁氧基、1,1-二甲基-n-丙氧基、1,2-二甲基-n-丙氧基、2,2-二甲基-n-丙氧基、1-乙基-n-丙氧基、n-己基氧基、1-甲基-n-戊基氧基、2-甲基-n-戊基氧基、3-甲基-n-戊基氧基、4-甲基-n-戊基氧基、1,1-二甲基-n-丁氧基、1,2-二甲基-n-丁氧基、1,3-二甲基-n-丁氧基、2,2-二甲基-n-丁氧基、2,3-二甲基-n-丁氧基、3,3-二甲基-n-丁氧基、1-乙基-n-丁氧基、2-乙基-n-丁氧基、1,1,2-三甲基-n-丙氧基、1,2,2-三甲基-n-丙氧基、1-乙基-1-甲基-n-丙氧基、1-乙基-2-甲基-n-丙氧基等。Specific examples of alkoxy include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy base, n-pentyloxy, 1-methyl-n-butoxy, 2-methyl-n-butoxy, 3-methyl-n-butoxy, 1,1-dimethyl-n -propoxy, 1,2-dimethyl-n-propoxy, 2,2-dimethyl-n-propoxy, 1-ethyl-n-propoxy, n-hexyloxy, 1-methyl-n-pentyloxy, 2-methyl-n-pentyloxy, 3-methyl-n-pentyloxy, 4-methyl-n-pentyloxy, 1, 1-Dimethyl-n-butoxy, 1,2-dimethyl-n-butoxy, 1,3-dimethyl-n-butoxy, 2,2-dimethyl-n- Butoxy, 2,3-dimethyl-n-butoxy, 3,3-dimethyl-n-butoxy, 1-ethyl-n-butoxy, 2-ethyl-n- Butoxy, 1,1,2-trimethyl-n-propoxy, 1,2,2-trimethyl-n-propoxy, 1-ethyl-1-methyl-n-propoxy base, 1-ethyl-2-methyl-n-propoxy, etc.

作為上述芳基之碳數,並無特別限定,但為6~40較佳,若考慮更提高聚合物之耐熱性的話,作為芳基之碳數,為6~16再較佳,為6~13再更較佳。 本發明中,上述芳基中包含具有取代基之芳基。作為取代基,有舉例如鹵原子、碳數1~6之烷基、碳數1~6之烷氧基、硝基、氰基等。 作為芳基之具體例,有舉出苯基、o-氯苯基、m-氯苯基、p-氯苯基、o-氟苯基、p-氟苯基、o-甲氧基苯基、p-甲氧基苯基、p-硝基苯基、p-氰基苯基、α-萘基、β-萘基、o-聯苯基、m-聯苯基、p-聯苯基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基等。 The carbon number of the above-mentioned aryl group is not particularly limited, but it is preferably 6-40. If considering improving the heat resistance of the polymer, the carbon number of the aryl group is more preferably 6-16, and is 6-40. 13 is more preferably. In the present invention, the above-mentioned aryl group includes an aryl group having a substituent. Examples of the substituent include a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a nitro group, and a cyano group. Specific examples of the aryl group include phenyl, o-chlorophenyl, m-chlorophenyl, p-chlorophenyl, o-fluorophenyl, p-fluorophenyl, o-methoxyphenyl , p-methoxyphenyl, p-nitrophenyl, p-cyanophenyl, α-naphthyl, β-naphthyl, o-biphenyl, m-biphenyl, p-biphenyl , 1-anthracenyl, 2-anthracenyl, 9-anthracenyl, 1-phenanthrenyl, 2-phenanthrenyl, 3-phenanthrenyl, 4-phenanthrenyl, 9-phenanthrenyl, etc.

作為芳烷基之碳數,並無特別限定,但為碳數7~20較佳,其烷基部分之構造並無特別限定,亦可為例如直鏈、分枝、環狀及此等之2種以上之組合之任一者。 本發明中,芳烷基中包含具有取代基之芳烷基。作為取代基,有舉例如鹵原子、碳數1~6之烷基、碳數1~6之烷氧基、硝基、氰基等。 作為其具體例,有舉出苄基、p-甲基苯基甲基、m-甲基苯基甲基、o-乙基苯基甲基、m-乙基苯基甲基、p-乙基苯基甲基、2-丙基苯基甲基、4-異丙基苯基甲基、4-異丁基苯基甲基、α-萘基甲基等。 The number of carbons in the aralkyl group is not particularly limited, but it is preferably 7 to 20 carbons. The structure of the alkyl part is not particularly limited, and it can also be linear, branched, cyclic, and the like. Any one of two or more combinations. In the present invention, an aralkyl group having a substituent is included in the aralkyl group. Examples of the substituent include a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a nitro group, and a cyano group. Specific examples thereof include benzyl, p-methylphenylmethyl, m-methylphenylmethyl, o-ethylphenylmethyl, m-ethylphenylmethyl, p-ethylphenylmethyl, p-ethylphenylmethyl, phenylmethyl, 2-propylphenylmethyl, 4-isopropylphenylmethyl, 4-isobutylphenylmethyl, α-naphthylmethyl, etc.

<<Q>> 作為式(1)中之Q,只要是具有環構造之碳數3~30之2價基即可,並無特別限定。 環構造亦可為芳香族環構造或脂環構造。 <<Q>> Q in the formula (1) is not particularly limited as long as it is a divalent group having 3 to 30 carbon atoms having a ring structure. The ring structure may be an aromatic ring structure or an alicyclic structure.

上述Q較佳為表示選自式(2)~(13)所示之群中至少1種。The aforementioned Q preferably represents at least one selected from the group represented by formulas (2) to (13).

Figure 02_image027
*表示鍵結處。
Figure 02_image027
*Indicates a bond.

上述R 1~R 92各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, R 93及R 94表示氫原子或碳數1~10之烷基, W 1及W 2各自獨立表示單鍵、CR 95R 96(R 95及R 96各自獨立表示氫原子、碳數1~10之烷基(惟,此等亦可一起形成環),或碳數1~10之鹵素化烷基)、C=O、O、S、SO、SO 2,或NR 97(R 97表示氫原子、碳數1~10之烷基或苯基)。 作為鹵原子,有舉出氟原子、氯原子、溴原子、碘原子。 且作為烷基、烷氧基,有舉出與上述相同者。 The above R 1 ~ R 92 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, a halogenated alkyl group with 1 to 10 carbons or an alkoxy group with 1 to 10 carbons, R 93 and R 94 represent a hydrogen atom or an alkyl group with a carbon number of 1 to 10, W 1 and W 2 each independently represent a single bond, CR 95 R 96 (R 95 and R 96 each independently represent a hydrogen atom with a carbon number of 1 to 10 (However, these can also form a ring together), or a halogenated alkyl group with 1 to 10 carbons), C=O, O, S, SO, SO 2 , or NR 97 (R 97 represents a hydrogen atom , alkyl group or phenyl group with 1 to 10 carbon atoms). Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the alkyl group and the alkoxy group include the same ones as above.

作為鹵原子,有舉出氟原子、氯原子、溴原子、碘原子。 且,作為烷基、烷氧基,有舉出與R、R’中之烷基、烷氧基相同者。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. In addition, examples of the alkyl group and alkoxy group include the same ones as the alkyl group and alkoxy group in R and R'.

碳數1~10之鹵素化烷基為上述碳數1~10之烷基中至少1個氫原子經鹵原子取代,作為其具體例,有舉例如三氟甲基、2,2,2-三氟乙基、全氟乙基、3,3,3-三氟丙基、2,2,3,3,3-五氟丙基、2,2,3,3-四氟丙基、2,2,2-三氟-1-(三氟甲基)乙基、全氟丙基、4,4,4-三氟丁基、3,3,4,4,4-五氟丁基、2,2,3,3,4,4,4-七氟丁基、全氟丁基、2,2,3,3,4, 4,5,5,5-九氟戊基、2,2,3,3,4,4,5,5-八氟戊基、全氟戊基、2,2,3,3,4,4,5,5,6,6,6-十一氟己基、2,2,3,3,4,4,5,5,6,6-十氟己基、3,3,4,4,5,5,6,6,6-九氟己基及全氟己基。本發明中,若考慮維持折射率的同時,也提高含三嗪環之聚合物對低極性溶媒等之溶解性的話,為碳數1~10之全氟烷基較佳,尤其是為碳數1~5之全氟烷基再較佳,為三氟甲基再更較佳。The halogenated alkyl group with 1 to 10 carbons is that at least one hydrogen atom in the above-mentioned alkyl group with 1 to 10 carbons is replaced by a halogen atom. Specific examples thereof include trifluoromethyl, 2,2,2- Trifluoroethyl, perfluoroethyl, 3,3,3-trifluoropropyl, 2,2,3,3,3-pentafluoropropyl, 2,2,3,3-tetrafluoropropyl, 2 ,2,2-trifluoro-1-(trifluoromethyl)ethyl, perfluoropropyl, 4,4,4-trifluorobutyl, 3,3,4,4,4-pentafluorobutyl, 2,2,3,3,4,4,4-Heptafluorobutyl, Perfluorobutyl, 2,2,3,3,4, 4,5,5,5-Nafluoropentyl, 2,2 ,3,3,4,4,5,5-Octafluoropentyl, Perfluoropentyl, 2,2,3,3,4,4,5,5,6,6,6-Undecafluorohexyl, 2,2,3,3,4,4,5,5,6,6-Decafluorohexyl, 3,3,4,4,5,5,6,6,6-Nafluorohexyl and Perfluorohexyl. In the present invention, if consideration is given to maintaining the refractive index and improving the solubility of triazine ring-containing polymers to low-polarity solvents, etc., a perfluoroalkyl group with 1 to 10 carbons is preferred, especially a perfluoroalkyl group with 1 to 10 carbons. A perfluoroalkyl group of 1 to 5 is more preferred, and a trifluoromethyl group is still more preferred.

且,X 1及X 2各自獨立表示單鍵、碳數1~10之伸烷基,或式(14)所示之基。 此等之烷基、鹵素化烷基、烷氧基及伸烷基之構造並無特別限定,亦可為例如直鏈狀、分枝狀、環狀及此等之2種以上之組合之任一者。 And, each of X1 and X2 independently represents a single bond, an alkylene group having 1 to 10 carbon atoms, or a group represented by formula (14). The structures of these alkyl groups, halogenated alkyl groups, alkoxy groups, and alkylene groups are not particularly limited, and may be, for example, linear, branched, cyclic, and any combination of two or more of these. one.

Figure 02_image029
*表示鍵結處。
Figure 02_image029
*Indicates a bond.

上述R 98~R 101各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, Y 1及Y 2各自獨立表示單鍵或碳數1~10之伸烷基。 作為此等鹵原子、烷基、鹵素化烷基、烷氧基,有舉出與R 1~R 92中之鹵原子、烷基、鹵素化烷基、烷氧基相同者。 The above R 98 ~ R 101 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, a halogenated alkyl group with 1 to 10 carbons or an alkoxy group with 1 to 10 carbons, Y 1 and Y 2 each independently represent a single bond or an alkylene group having 1 to 10 carbon atoms. Examples of these halogen atoms, alkyl groups, halogenated alkyl groups, and alkoxy groups include the same ones as the halogen atoms, alkyl groups, halogenated alkyl groups, and alkoxy groups in R 1 to R 92 .

作為碳數1~10之伸烷基,有舉出亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、五亞甲基等。 上述伸烷基之構造並無特別限定,亦可為例如直鏈狀、分枝狀、環狀及此等之2種以上之組合之任一者。 Examples of the alkylene group having 1 to 10 carbon atoms include a methylene group, an ethylene group, a propylene group, a trimethylene group, a tetramethylene group, and a pentamethylene group. The structure of the alkylene group is not particularly limited, and may be, for example, any of linear, branched, cyclic, and combinations of two or more of these.

此等之中,作為R 1~R 92及R 98~R 101,為氫原子、鹵原子、磺基、碳數1~5之烷基、碳數1~5之鹵素化烷基或碳數1~5之烷氧基較佳,為氫原子再較佳。 Among these, R 1 to R 92 and R 98 to R 101 are a hydrogen atom, a halogen atom, a sulfo group, an alkyl group having 1 to 5 carbons, a halogenated alkyl group having 1 to 5 carbons, or a carbon number An alkoxy group of 1-5 is preferable, and a hydrogen atom is more preferable.

本發明之含三嗪環之聚合物中,Q包含芳香族環時,上述Q所包含之芳香族環中,至少1個芳香族環中含有至少1個鹵原子或碳數1~10之鹵素化烷基較佳。一般來說已知藉由於化合物中導入氟原子,其折射率會有降低之傾向,但本發明之含三嗪環之聚合物中儘管有導入氟原子,也能夠維持超過1.7之折射率。芳香族環中之鹵原子或鹵素化烷基之數,能夠為該芳香族環上能夠取代之任意數,但若考慮折射率維持與對溶媒之溶解性之平衡的話,為1~4個較佳,為1~2個再較佳,為1個再更較佳。且,芳香族環為萘環等之複數芳香族環縮環時,全體中只要具有至少1個上述基即可。 且,Q包含複數芳香族環時,至少1個芳香族環中至少含有1個鹵原子或鹵素化烷基即可,但所有芳香族環中至少含有1個鹵原子或鹵素化烷基較佳,所有芳香族環含有1個鹵原子或鹵素化烷基再較佳。 In the triazine ring-containing polymer of the present invention, when Q includes an aromatic ring, at least one of the aromatic rings included in Q includes at least one halogen atom or a halogen having 1 to 10 carbon atoms Alkyl groups are preferred. It is generally known that the introduction of fluorine atoms into a compound tends to lower its refractive index, but the triazine ring-containing polymer of the present invention can maintain a refractive index exceeding 1.7 despite the introduction of fluorine atoms. The number of halogen atoms or halogenated alkyl groups in the aromatic ring can be any number that can be substituted on the aromatic ring, but if considering the balance between the maintenance of the refractive index and the solubility of the solvent, it is relatively 1 to 4 Better, 1 to 2 more preferably, 1 more preferably. In addition, when the aromatic ring is a plurality of condensed aromatic rings such as a naphthalene ring, it is only necessary to have at least one of the above-mentioned groups in the whole. Also, when Q contains a plurality of aromatic rings, at least one of the aromatic rings may contain at least one halogen atom or a halogenated alkyl group, but it is preferable that all aromatic rings contain at least one halogen atom or a halogenated alkyl group. , all aromatic rings contain one halogen atom or a halogenated alkyl group is more preferred.

尤其是作為Q,為式(2)、(5)~(13)所示之至少1種較佳,為式(2)、(5)、(7)、(8)、(11)~(13)所示之至少1種再較佳。作為上述式(2)~(13)表示之2價基之具體例,有舉出下述式所示者,但不限定於此等。Especially as Q, it is preferably at least one of the formulas (2), (5) to (13), and it is the formula (2), (5), (7), (8), (11) to ( 13) At least one of the above is more preferred. Specific examples of the divalent groups represented by the above formulas (2) to (13) include those represented by the following formulas, but are not limited thereto.

Figure 02_image031
「Ph」表示苯基。*表示鍵結處。
Figure 02_image031
"Ph" means phenyl. *Indicates a bond.

Figure 02_image033
(式中,A各自獨立表示鹵原子或碳數1~10之鹵素化烷基,p各自獨立表示0~4之整數,q各自獨立表示0~3之整數,r各自獨立表示0~2之整數,s各自獨立表示0~5之整數,t表示1~6之整數,u表示1~4之整數。惟,各自基中,p、q、r、s之合計為1以上。「Ph」表示苯基。*表示鍵結處。)
Figure 02_image033
(In the formula, A each independently represents a halogen atom or a halogenated alkyl group with 1 to 10 carbons, p represents an integer of 0 to 4 independently, q represents an integer of 0 to 3 independently, and r independently represents an integer of 0 to 2 For integers, s independently represents an integer from 0 to 5, t represents an integer from 1 to 6, and u represents an integer from 1 to 4. However, in each base, the total of p, q, r, and s is 1 or more. "Ph" Indicates a phenyl group. * Indicates a bond.)

此等中,為了得到更高折射率之聚合物,Q為下述式所示之2價基再較佳。Among these, in order to obtain a polymer with a higher refractive index, Q is more preferably a divalent group represented by the following formula.

Figure 02_image035
「Ph」表示苯基。*表示鍵結處。
Figure 02_image035
"Ph" means phenyl. *Indicates a bond.

Figure 02_image037
(式中,A、p、q、r及u表示與上述相同意義,「Ph」表示苯基。*表示鍵結處。)
Figure 02_image037
(In the formula, A, p, q, r, and u represent the same meanings as above, and "Ph" represents a phenyl group. * represents a bond.)

尤其是,若考慮更提高對低極性溶劑等之有機溶媒之含三嗪環之聚合物之溶解性的話,作為Q,為式(17)所示之m-伸苯基較佳。In particular, in consideration of improving the solubility of triazine ring-containing polymers in organic solvents such as low-polarity solvents, Q is preferably an m-phenylene group represented by formula (17).

Figure 02_image039
(式中,*表示鍵結處。)
Figure 02_image039
(In the formula, * indicates the bonding position.)

尤其是,若考慮更提高含三嗪環之聚合物之折射率的話,作為Q,為式(18)~(20)所示之具有二苯基醚骨架之基較佳。In particular, in consideration of increasing the refractive index of the triazine ring-containing polymer, Q is preferably a group having a diphenyl ether skeleton represented by formulas (18) to (20).

Figure 02_image041
(式中,A及p表示與上述相同意義,*表示鍵結處。)
Figure 02_image041
(In the formula, A and p represent the same meanings as above, and * represents a bond.)

Figure 02_image043
(式中,A及p表示與上述相同意義,*表示鍵結處。)
Figure 02_image043
(In the formula, A and p represent the same meanings as above, and * represents a bond.)

Figure 02_image045
(式中,*表示鍵結處。)
Figure 02_image045
(In the formula, * indicates the bonding position.)

且,式(1)中之Q表示例如選自式(102)~(115)所示之群中至少1種。

Figure 02_image047
*表示鍵結處。 In addition, Q in formula (1) represents, for example, at least one selected from the group represented by formulas (102) to (115).
Figure 02_image047
*Indicates a bond.

式(102)~(115)中,上述R 1及R 2各自獨立表示亦可具有分枝構造之碳數1~5之伸烷基, 作為如此之伸烷基,有舉出亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、五亞甲基等,但若考慮更提高所得之聚合物之折射率的話,為碳數1~3之伸烷基較佳,為碳數1~2之伸烷基,具體來說為亞甲基、伸乙基再較佳,為亞甲基最適合。 In the formulas (102) to (115), the above-mentioned R 1 and R 2 each independently represent an alkylene group having 1 to 5 carbon atoms that may have a branched structure, and such an alkylene group includes methylene, Ethylene, propylene, trimethylene, tetramethylene, pentamethylene, etc., but if it is considered to increase the refractive index of the polymer obtained, it is better to be an alkylene group with 1~3 carbons. It is an alkylene group having 1 to 2 carbon atoms, specifically, a methylene group or an ethylene group is more preferable, and a methylene group is most suitable.

<具有交聯基之胺基> 且,本發明之含三嗪環之聚合物至少具有1個三嗪環末端,但此三嗪環末端之至少一部份經具有交聯基之胺基封止。 且,本發明之含三嗪環之聚合物至少具有1個三嗪環末端,但此末端之三嗪環中,通常具有2個能夠取代上述具有交聯基之胺基之鹵原子。因此,上述具有交聯基之胺基亦可鍵結在相同三嗪環末端上,或三嗪環末端為複數時,亦可各自鍵結在不同的三嗪環末端。 <Amino group with crosslinking group> Furthermore, the triazine ring-containing polymer of the present invention has at least one triazine ring terminal, but at least a part of the triazine ring terminal is blocked by an amine group having a crosslinking group. Furthermore, the triazine ring-containing polymer of the present invention has at least one triazine ring terminal, but the triazine ring at the terminal usually has two halogen atoms capable of substituting the above-mentioned amine group having a crosslinking group. Therefore, the above-mentioned amine groups having a crosslinking group may be bonded to the same triazine ring end, or when there are plural triazine ring ends, each may be bonded to a different triazine ring end.

具有交聯基之胺基之交聯基數並無特別限定,能夠設為任意數,但若考慮耐溶劑性與對有機溶媒之溶解性之平衡,為1~4個較佳,為1~2個再較佳,為1個再更較佳。 具有交聯基之胺基具有複數交聯基時,複數交聯基亦可為相同構造或相異構造。 The number of cross-linking groups of amino groups with cross-linking groups is not particularly limited, and can be set to any number, but considering the balance between solvent resistance and solubility in organic solvents, 1-4 is preferred, and 1-2 More preferably one, even more preferably one. When the amine group having a crosslinking group has plural crosslinking groups, the plural crosslinking groups may have the same structure or different structures.

具有交聯基之胺基為例如下述式(X)表示。

Figure 02_image049
(式中,Z表示具有交聯基之基。*表示鍵結處。) The amino group which has a crosslinking group is represented by following formula (X), for example.
Figure 02_image049
(In the formula, Z represents a group having a crosslinking group. * represents a bond.)

式(X)中,Z亦可為交聯基本身。 交聯基藉由伸芳基鍵結於胺基較佳。 In formula (X), Z may be the crosslinking group itself. The crosslinking group is preferably bonded to the amine group via an aryl group.

且,具有交聯基之胺基再較佳為下述式(15)所示,特別佳為下述式(16)所示。

Figure 02_image051
(式中,R 102表示交聯基,*表示鍵結處。)
Figure 02_image053
(式中,R 102表示與上述相同意義,*表示鍵結處。) Furthermore, the amino group having a crosslinking group is more preferably represented by the following formula (15), particularly preferably represented by the following formula (16).
Figure 02_image051
(In the formula, R 102 represents a crosslinking group, and * represents a bond.)
Figure 02_image053
(In the formula, R 102 represents the same meaning as above, and * represents a bond.)

作為交聯基,能夠舉出含羥基之基、含乙烯基之基、含環氧之基、含環氧丙烷之基、含羧基之基、含磺酸基之基、含氫硫基之基、含(甲基)丙烯醯基之基等,若考慮使含三嗪環之聚合物之耐熱性及所得之薄膜之耐溶劑性(耐裂縫性)更提升的話,為含羥基之基及含(甲基)丙烯醯基之基較佳。Examples of the crosslinking group include hydroxyl-containing groups, vinyl-containing groups, epoxy-containing groups, propylene oxide-containing groups, carboxyl-containing groups, sulfonic acid-containing groups, and sulfhydryl-containing groups. , (meth)acryl group-containing group, etc., if considering improving the heat resistance of the triazine ring-containing polymer and the solvent resistance (crack resistance) of the resulting film, it is a hydroxyl-containing group and a group containing A (meth)acryloyl group is preferred.

作為含羥基之基,有舉出羥基及羥基烷基等,但為碳數1~10之羥基烷基較佳,為碳數1~5之羥基烷基再較佳,為碳數1~3之羥基烷基再更較佳。 作為碳數1~10之羥基烷基,有舉出羥基甲基、2-羥基乙基、3-羥基丙基、4-羥基丁基、5-羥基戊基、6-羥基己基、7-羥基庚基、8-羥基辛基、9-羥基壬基、10-羥基癸基、2-羥基-1-甲基乙基、2-羥基-1,1-二甲基乙基、3-羥基-1-甲基丙基、3-羥基-2-甲基丙基、3-羥基-1,1-二甲基丙基、3-羥基-1,2-二甲基丙基、3-羥基-2,2-二甲基丙基、4-羥基-1-甲基丁基、4-羥基-2-甲基丁基、4-羥基-3-甲基丁基等之羥基所鍵結之碳原子為一級碳原子者;1-羥基乙基、1-羥基丙基、2-羥基丙基、1-羥基丁基、2-羥基丁基、1-羥基己基、2-羥基己基、1-羥基辛基、2-羥基辛基、1-羥基癸基、2-羥基癸基、1-羥基-1-甲基乙基、2-羥基-2-甲基丙基等之羥基所鍵結之碳原子為二級或三級碳原子。 As the hydroxyl-containing group, there are hydroxyl group and hydroxyalkyl group, etc., but the hydroxyalkyl group with 1 to 10 carbon atoms is preferred, and the hydroxyalkyl group with 1 to 5 carbon atoms is more preferable, and the hydroxyalkyl group with 1 to 3 carbon atoms is more preferable. A hydroxyalkyl group is even more preferred. Examples of hydroxyalkyl groups having 1 to 10 carbon atoms include hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, 4-hydroxybutyl, 5-hydroxypentyl, 6-hydroxyhexyl, and 7-hydroxy Heptyl, 8-hydroxyoctyl, 9-hydroxynonyl, 10-hydroxydecyl, 2-hydroxy-1-methylethyl, 2-hydroxy-1,1-dimethylethyl, 3-hydroxy- 1-Methylpropyl, 3-Hydroxy-2-Methylpropyl, 3-Hydroxy-1,1-Dimethylpropyl, 3-Hydroxy-1,2-Dimethylpropyl, 3-Hydroxy- 2,2-Dimethylpropyl, 4-hydroxy-1-methylbutyl, 4-hydroxy-2-methylbutyl, 4-hydroxy-3-methylbutyl, etc., the carbon bonded by the hydroxyl group The atom is a primary carbon atom; 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 1-hydroxybutyl, 2-hydroxybutyl, 1-hydroxyhexyl, 2-hydroxyhexyl, 1-hydroxy Carbon bonded to hydroxyl groups such as octyl, 2-hydroxyoctyl, 1-hydroxydecyl, 2-hydroxydecyl, 1-hydroxy-1-methylethyl, 2-hydroxy-2-methylpropyl The atoms are secondary or tertiary carbon atoms.

尤其是,若考慮使耐熱性及高溫高濕耐性提高的話,為羥基所鍵結之碳原子為一級碳原子較佳,其中,為碳數1~5之羥基烷基再較佳,為碳數1~3之羥基烷基再更較佳,為羥基甲基及2-羥基乙基更較佳,為2-羥基乙基最佳。In particular, in consideration of improving heat resistance and high-temperature and high-humidity resistance, the carbon atom bonded to the hydroxyl group is preferably a primary carbon atom, and among them, a hydroxyalkyl group having 1 to 5 carbon atoms is more preferred, and the carbon number is 1 to 3 hydroxyalkyl groups are more preferred, hydroxymethyl and 2-hydroxyethyl are more preferred, and 2-hydroxyethyl is most preferred.

作為含(甲基)丙烯醯基之基,有舉出(甲基)丙烯醯基、(甲基)丙烯醯基氧基烷基及下述式(i)表示之基等,但為具有碳數1~10之伸烷基之(甲基)丙烯醯基氧基烷基及下述式(i)表示之基較佳,為下述式(i)表示之基再較佳。As the group containing a (meth)acryloyl group, there are mentioned a (meth)acryloyl group, a (meth)acryloyloxyalkyl group and a group represented by the following formula (i). The (meth)acryloyloxyalkyl group of the alkylene group having a number of 1 to 10 is preferably a group represented by the following formula (i), and is more preferably a group represented by the following formula (i).

Figure 02_image055
(式中,A 1表示碳數1~10之伸烷基,A 2表示單鍵或下述式(j)
Figure 02_image057
表示之基,A 3表示亦可經羥基取代之(a+1)價之脂肪族烴基,A 4表示氫原子或甲基,a表示1或2,*表示鍵結處。)
Figure 02_image055
(In the formula, A 1 represents an alkylene group with 1 to 10 carbon atoms, and A 2 represents a single bond or the following formula (j)
Figure 02_image057
The group represented by A 3 represents an aliphatic hydrocarbon group with a valence of (a+1) that may also be substituted by a hydroxyl group, A 4 represents a hydrogen atom or a methyl group, a represents 1 or 2, and * represents a bond. )

作為具有碳數1~10之伸烷基(烷烴二基)之(甲基)丙烯醯基氧基烷基中包含之伸烷基,有舉出亞甲基、伸乙基、三亞甲基、丙烷-1,2-二基、四亞甲基、丁烷-1,3-二基、丁烷-1,2-二基、2-甲基丙烷-1,3-二基、五亞甲基、六亞甲基、七亞甲基、八亞甲基、九亞甲基、十亞甲基等。若考慮使耐熱性及高溫高濕耐性提升的話,此等之中,為具有碳數1~5之伸烷基者較佳,為具有碳數1~3之伸烷基者較佳,為具有碳數1或2之伸烷基者再較佳。Examples of the alkylene group included in the (meth)acryloxyalkyl group having an alkylene group (alkanediyl group) having 1 to 10 carbon atoms include methylene, ethylene, trimethylene, Propane-1,2-diyl, tetramethylene, butane-1,3-diyl, butane-1,2-diyl, 2-methylpropane-1,3-diyl, pentamethylene group, hexamethylene, heptamethylene, octamethylene, nonamethylene, decamethylene, etc. In consideration of improving heat resistance and high-temperature and high-humidity resistance, among these, those with alkylene groups having 1 to 5 carbons are preferred, those with alkylene groups having 1 to 3 carbons are preferred, and those with alkylene groups having 1 to 3 carbons are preferred. An alkylene group having 1 or 2 carbon atoms is more preferred.

作為上述(甲基)丙烯醯基氧基烷基之具體例,有舉例如(甲基)丙烯醯基氧基甲基、2-(甲基)丙烯醯基氧基乙基、3-(甲基)丙烯醯基氧基丙基、4-(甲基)丙烯醯基氧基丁基。Specific examples of the aforementioned (meth)acryloxyalkyl groups include (meth)acryloxymethyl, 2-(meth)acryloxyethyl, 3-(methyl) base) acryloxypropyl, 4-(meth)acryloxybutyl.

式(i)中,A 1為碳數1~10之伸烷基,但為碳數1~5之伸烷基較佳,為亞甲基及伸乙基再較佳。作為碳數1~10之伸烷基,有舉出與上述(甲基)丙烯醯基氧基烷基中包含之伸烷基相同者。 In formula (i), A 1 is an alkylene group having 1 to 10 carbon atoms, preferably an alkylene group having 1 to 5 carbon atoms, and more preferably a methylene group or an ethylene group. Examples of the alkylene group having 1 to 10 carbon atoms include the same ones included in the above-mentioned (meth)acryloxyalkyl group.

A 2表示單鍵或式(j)表示之基,但為式(j)表示之基較佳。 A 2 represents a single bond or a group represented by formula (j), but is preferably a group represented by formula (j).

A 3為亦可經羥基取代之(a+1)價脂肪族烴基,但作為其具體例,有舉例如碳數1~5之伸烷基及下述式(k-1)~(k-3)

Figure 02_image059
(式中,*與上述相同。) 表示之基,為碳數1~5之伸烷基較佳,為碳數1~3之伸烷基再較佳,為亞甲基及伸乙基再更較佳。作為A 3之伸烷基,A 1所例示之伸烷基中,能夠舉出碳數1~5之伸烷基。 A3 is a (a+1) valent aliphatic hydrocarbon group that may also be substituted by a hydroxyl group, but as its specific example, there are for example an alkylene group with 1 to 5 carbon atoms and the following formulas (k-1)~(k- 3)
Figure 02_image059
(In the formula, * is the same as above.) The base represented is preferably an alkylene group having 1 to 5 carbon atoms, more preferably an alkylene group having 1 to 3 carbon atoms, and is further preferably a methylene group or an ethylene group. better. As the alkylene group of A3 , among the alkylene groups exemplified in A1 , alkylene groups having 1 to 5 carbon atoms can be mentioned.

a表示1或2,但為1較佳。a represents 1 or 2, but 1 is preferred.

作為式(i)表示之基之適合之型態,有舉出下述式(i-1)表示者。Examples of suitable forms of the group represented by the formula (i) include those represented by the following formula (i-1).

Figure 02_image061
(式中,A 1、A 3、A 4及*與上述相同。)
Figure 02_image061
(In the formula, A 1 , A 3 , A 4 and * are the same as above.)

作為式(i)表示之基之更適合之型態,有舉出下述式(i-2)~(i-5)表示者。More suitable forms of the group represented by the formula (i) include those represented by the following formulas (i-2) to (i-5).

Figure 02_image063
(式中,*與上述相同。)
Figure 02_image063
(In the formula, * is the same as above.)

作為含乙烯基之基,有舉出末端具有乙烯基之碳數2~10之烯基等。作為具體例,有舉出乙烯基、1-丙烯基、烯丙基、異丙烯基、1-丁烯基、2-丁烯基、2-戊烯基等。Examples of the vinyl group-containing group include alkenyl groups having 2 to 10 carbon atoms having a vinyl group at the terminal, and the like. Specific examples include vinyl, 1-propenyl, allyl, isopropenyl, 1-butenyl, 2-butenyl, 2-pentenyl and the like.

作為含環氧之基,有舉出環氧、環氧丙基、環氧丙基氧基等。作為具體例,有舉出環氧丙基甲基、2-環氧丙基乙基、3-環氧丙基丙基、4-環氧丙基丁基等。Epoxy, glycidyl, glycidyloxy etc. are mentioned as an epoxy-containing group. Specific examples include glycidylmethyl, 2-glycidylethyl, 3-glycidylpropyl, 4-glycidylbutyl, and the like.

作為含環氧丙烷之基,有舉出環氧丙烷-3-基、(環氧丙烷-3-基)甲基、2-(環氧丙烷-3-基)乙基、3-(環氧丙烷-3-基)丙基、4-(環氧丙烷-3-基)丁基等。As the group containing propylene oxide, there are propylene oxide-3-yl, (propylene oxide-3-yl)methyl, 2-(propylene oxide-3-yl)ethyl, 3-(epoxypropylene-3-yl)ethyl, propan-3-yl)propyl, 4-(epoxypropan-3-yl)butyl and the like.

作為含羧基之基,有舉出羧基及碳數2~10之羧基烷基等。作為碳數2~10之羧基烷基,為羧基所鍵結之碳原子為二級碳原子者較佳,作為具體例,有舉出羧基甲基、2-羧基乙基、3-羧基丙基及4-羧基丁基等。Examples of the carboxyl group-containing group include a carboxyl group and a carboxyalkyl group having 2 to 10 carbon atoms. As a carboxyalkyl group with 2 to 10 carbons, the carbon atom to which the carboxyl group is bonded is preferably a secondary carbon atom. As specific examples, there are carboxymethyl, 2-carboxyethyl, and 3-carboxypropyl groups. And 4-carboxybutyl etc.

作為含磺酸基之基,有舉出磺基及碳數1~10之磺酸基烷基等。作為碳數1~10之磺酸基烷基,為磺基所鍵結之碳原子為一級碳原子者較佳,作為具體例,有舉出磺酸基甲基、2-磺酸基乙基、3-磺酸基丙基及4-磺酸基丁基等。Examples of the sulfonic acid group-containing group include a sulfonic acid group, a sulfonic acid alkyl group having 1 to 10 carbon atoms, and the like. As a sulfoalkyl group with 1 to 10 carbons, the carbon atom to which the sulfo group is bonded is preferably a primary carbon atom. Specific examples include sulfomethyl, 2-sulfoethyl , 3-sulfopropyl and 4-sulfobutyl, etc.

作為含氫硫基之基,有舉出氫硫基及碳數1~10之氫硫基烷基等。作為碳數1~10之氫硫基烷基,為氫硫基所鍵結之碳原子為一級碳原子者較佳,作為具體例,有舉出氫硫基甲基、2-氫硫基乙基、3-氫硫基丙基及4-氫硫基丁基等。Examples of the mercapto group-containing group include mercapto and mercaptoalkyl groups having 1 to 10 carbon atoms. As a mercaptoalkyl group having 1 to 10 carbons, the carbon atom to which the mercapto group is bonded is preferably a primary carbon atom. Specific examples include mercaptomethyl, 2-mercaptoethyl base, 3-mercaptopropyl and 4-mercaptobutyl, etc.

作為具有交聯基之胺基之具體例,有舉出下述式所示者,但不限定於此等。Specific examples of the amino group having a crosslinking group include those represented by the following formulas, but are not limited thereto.

Figure 02_image065
式中,*表示鍵結處。
Figure 02_image065
In the formula, * represents the bonding position.

且,具有羥基烷基之芳基胺基在後述製造法中,能夠使用對應之羥基烷基取代芳基胺基化合物來導入。 作為羥基烷基取代芳基胺基化合物之具體例,有舉出(4-胺基苯基)甲醇及2-(4-胺基苯基)乙醇等。 In addition, the arylamine group having a hydroxyalkyl group can be introduced using a corresponding hydroxyalkyl-substituted arylamine group in the production method described later. Specific examples of the hydroxyalkyl-substituted arylamino compound include (4-aminophenyl)methanol and 2-(4-aminophenyl)ethanol.

具有(甲基)丙烯醯基氧基烷基之芳基胺基能夠使用對應之(甲基)丙烯醯基氧基烷基取代芳基胺基化合物之方法,或對含三嗪環之聚合物導入具有羥基烷基之芳基胺基後,進而藉由使上述羥基烷基中包含之羥基與鹵化(甲基)丙烯酸酯或(甲基)丙烯酸環氧丙酯作用之方法來導入。Arylamine groups having (meth)acryloxyalkyl groups can use the corresponding (meth)acryloxyalkyl groups to replace arylamine compounds, or polymers containing triazine rings After introducing an arylamine group having a hydroxyalkyl group, it is further introduced by a method in which the hydroxyl group contained in the hydroxyalkyl group reacts with a halogenated (meth)acrylate or glycidyl (meth)acrylate.

具有式(i)表示之基之芳基胺基能夠使用具有目的之交聯基之芳基胺基化合物之方法,或對含三嗪環之聚合物導入具有羥基烷基之芳基胺基後,進而藉由使上述羥基烷基中包含之羥基與下述式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物作用之方法來導入。The arylamine group having a group represented by the formula (i) can use the method of using an arylamine compound having a desired crosslinking group, or after introducing an arylamine group having a hydroxyalkyl group to a polymer containing a triazine ring , and further introduced by a method of causing the hydroxyl group contained in the above-mentioned hydroxyalkyl group to act on a (meth)acrylate compound having an isocyanate group represented by the following formula (i′).

Figure 02_image067
(式中,A 3、A 4及a與上述相同。)
Figure 02_image067
(In the formula, A 3 , A 4 and a are the same as above.)

作為(甲基)丙烯醯基氧基烷基取代芳基胺基化合物之具體例,有舉例如使上述羥基烷基取代芳基胺基化合物之羥基與鹵化(甲基)丙烯酸酯或(甲基)丙烯酸環氧丙酯作用所得之酯化合物。 作為上述鹵化(甲基)丙烯酸酯,能夠舉出氯化(甲基)丙烯酸酯、溴化(甲基)丙烯酸酯及碘化(甲基)丙烯酸酯。 作為上述式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物之具體例,能夠舉例如2-異氰酸酯乙基丙烯酸酯、2-異氰酸酯乙基甲基丙烯酸酯及1,1-(雙丙烯醯基氧基甲基)乙基異氰酸酯。本發明中,以簡單之合成法之觀點來看,為2-異氰酸酯乙基丙烯酸酯較佳。 As a specific example of the (meth)acryloxyalkyl substituted arylamine compound, for example, the hydroxyl group of the above-mentioned hydroxyalkyl substituted arylamine compound is mixed with a halogenated (meth)acrylate or (methyl) ) Ester compounds obtained by the action of glycidyl acrylate. Chlorinated (meth)acrylate, brominated (meth)acrylate, and iodized (meth)acrylate are mentioned as said halogenated (meth)acrylate. Specific examples of (meth)acrylate compounds having isocyanate groups represented by the above formula (i') include 2-isocyanate ethyl acrylate, 2-isocyanate ethyl methacrylate and 1,1-( Bisacryloxymethyl)ethyl isocyanate. In the present invention, 2-isocyanate ethyl acrylate is preferable from the viewpoint of a simple synthesis method.

本發明中,作為特別適合之含三嗪環之聚合物,有舉出包含式(21)~(28)所示之重複單位者。In the present invention, examples of particularly suitable triazine ring-containing polymers include repeating units represented by formulas (21) to (28).

Figure 02_image069
(式中,R、R’、R 1~R 4及R 102表示與上述相同意義)
Figure 02_image069
(In the formula, R, R', R 1 ~ R 4 and R 102 represent the same meaning as above)

Figure 02_image071
(式中,R 1~R 4及R 102表示與上述相同意義)
Figure 02_image071
(In the formula, R 1 ~ R 4 and R 102 represent the same meaning as above)

Figure 02_image073
(式中,R 102表示與上述相同意義)
Figure 02_image073
(In the formula, R 102 represents the same meaning as above)

Figure 02_image075
(式中,R 102表示與上述相同意義)
Figure 02_image075
(In the formula, R 102 represents the same meaning as above)

Figure 02_image077
(式中,R、R’、R 16~R 23及R 102表示與上述相同意義)
Figure 02_image077
(In the formula, R, R', R 16 ~ R 23 and R 102 represent the same meaning as above)

Figure 02_image079
(式中,R 16~R 23及R 102表示與上述相同意義)
Figure 02_image079
(In the formula, R 16 ~ R 23 and R 102 represent the same meaning as above)

Figure 02_image081
(式中,R 102表示與上述相同意義)
Figure 02_image081
(In the formula, R 102 represents the same meaning as above)

Figure 02_image083
(式中,R 102表示與上述相同意義)
Figure 02_image083
(In the formula, R 102 represents the same meaning as above)

本發明中聚合物之重量平均分子量並無特別限定,但為500~500,000較佳,為500~100,000再較佳,以更提升耐熱性且同時降低收縮率之觀點來看,為2,000以上較佳,以更提高溶解性且使所得之組成物之黏度降低之觀點來看,為50,000以下較佳,為30,000以下再較佳,為25,000以下再更較佳,為10,000以下最佳。 且,本發明中,重量平均分子量為藉由凝膠滲透層析(以下稱為GPC)分析並以標準聚苯乙烯換算所得之平均分子量。 The weight average molecular weight of the polymer in the present invention is not particularly limited, but it is preferably 500-500,000, more preferably 500-100,000, and more preferably 2,000 or more from the viewpoint of improving heat resistance and reducing shrinkage. , from the viewpoint of improving the solubility and reducing the viscosity of the resulting composition, it is preferably 50,000 or less, more preferably 30,000 or less, more preferably 25,000 or less, most preferably 10,000 or less. In addition, in the present invention, the weight average molecular weight is an average molecular weight obtained by analyzing gel permeation chromatography (hereinafter referred to as GPC) and converted to standard polystyrene.

本發明之含三嗪環之聚合物(超枝聚合物)能夠根據上述國際公開第2010/128661號中揭示之手法來製造。 亦即,能夠藉由使三鹵素化三嗪化合物與芳基二胺基化合物於有機溶媒中反應後,例如使其與末端封止劑之選自具有羥基烷基(含羥基之基)之胺基化合物、具有丙烯醯基氧基烷基(含丙烯醯基之基)之胺基化合物及具有式(i)表示之基(含丙烯醯基之基)之胺基化合物中至少1種胺基化合物反應,得到本發明之含三嗪環之聚合物。 The triazine ring-containing polymer (hyperbranch polymer) of the present invention can be produced according to the method disclosed in the aforementioned International Publication No. 2010/128661. That is, after reacting a trihalogenated triazine compound and an aryl diamine compound in an organic solvent, for example, making it react with an amine having a hydroxyalkyl group (hydroxyl-containing group) with a terminal blocking agent At least one amine group in the amino compound having an acryloxyalkyl group (acrylyl group-containing group) and the amino compound having a group represented by formula (i) (acrylyl group-containing group) The compounds are reacted to obtain the triazine ring-containing polymer of the present invention.

例如,如下述流程1所示,含三嗪環之聚合物(23)能夠藉由使三嗪化合物(29)及芳基二胺基化合物(30)於適當的有機溶媒中反應後,使其與末端封止劑之選自具有羥基烷基之芳基胺基化合物及具有式(i)表示之基之芳基胺基化合物中至少1種芳基胺基化合物(31)反應而得。For example, as shown in the following Scheme 1, the triazine ring-containing polymer (23) can be obtained by reacting a triazine compound (29) and an aryl diamine compound (30) in a suitable organic solvent, and then making it It is obtained by reacting with at least one arylamine compound (31) selected from the group consisting of arylamine compounds having a hydroxyalkyl group and arylamine compounds having a group represented by formula (i) as a terminal blocking agent.

Figure 02_image085
(式中,X各自獨立表示鹵原子,R a表示羥基烷基或式(i)表示之基。)
Figure 02_image085
(In the formula, X each independently represents a halogen atom, and R a represents a hydroxyalkyl group or a group represented by formula (i).)

且,例如,如下述流程2所示,含三嗪環之聚合物(27)能夠藉由使三嗪化合物(29)及芳基二胺基化合物(32)於適當的有機溶媒中反應後,使其與末端封止劑之選自具有羥基烷基之芳基胺基化合物及具有式(i)表示之基之芳基胺基化合物中至少1種芳基胺基化合物(31)反應而得。And, for example, as shown in the following scheme 2, the triazine ring-containing polymer (27) can be obtained by reacting a triazine compound (29) and an aryl diamine compound (32) in a suitable organic solvent, It is obtained by reacting at least one arylamine compound (31) selected from the group consisting of arylamine compounds having a hydroxyalkyl group and arylamine compounds having a group represented by formula (i) as a terminal blocking agent .

Figure 02_image087
(式中,X各自獨立表示鹵原子,R a表示羥基烷基或式(i)表示之基。)
Figure 02_image087
(In the formula, X each independently represents a halogen atom, and R a represents a hydroxyalkyl group or a group represented by formula (i).)

上述流程1或流程2中,芳基二胺基化合物(30)或(32)之添加比只要能夠得到目的之聚合物可為任意,但相對於三嗪化合物(29)1當量,芳基二胺基化合物(30)或(32)為0.01~10當量較佳,為0.7~5當量再較佳。 芳基二胺基化合物(30)或(32)亦可直接添加,亦可以溶解於有機溶媒之溶液來加,但考慮操作容易度或反應之控制容易度的話,為後者之手法較適合。 反應溫度只要適當地在使用之溶媒之融點至溶媒之沸點之範圍中來設定即可,但為-30~150℃左右較佳,為   -10~100℃再較佳。 In the above scheme 1 or scheme 2, the addition ratio of the aryl diamine compound (30) or (32) can be arbitrary as long as the target polymer can be obtained, but relative to 1 equivalent of the triazine compound (29), the aryl diamine The amino compound (30) or (32) is preferably 0.01-10 equivalents, more preferably 0.7-5 equivalents. The aryl diamine compound (30) or (32) can also be added directly or dissolved in an organic solvent solution, but considering the ease of operation and the ease of control of the reaction, the latter method is more suitable. The reaction temperature may be appropriately set within the range from the melting point of the solvent used to the boiling point of the solvent, but it is preferably about -30 to 150°C, and more preferably -10 to 100°C.

作為另一型態,有舉出下述流程3所示之手法。此手法中,含三嗪環之聚合物(23)能夠藉由使三嗪化合物(29)及芳基二胺基化合物(30)於適當的有機溶媒中反應後,使其與末端封止劑之具有羥基烷基之芳基胺基化合物(31’)反應,得到含三嗪環之聚合物(23’)(第1階段),之後,進而使該含三嗪環之聚合物(23’)中包含之羥基烷基之羥基與式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物作用(第2階段)而得。 且,將含三嗪環之聚合物(23’)作為目的物時,不實施第2階段之反應,在第1階段結束即可。 As another mode, there is a method shown in Flow 3 below. In this method, the triazine ring-containing polymer (23) can be prepared by reacting the triazine compound (29) and the aryldiamine compound (30) in an appropriate organic solvent, and then reacting it with a terminal blocking agent. The arylamino compound (31') having a hydroxyalkyl group reacts to obtain a triazine ring-containing polymer (23') (the first stage), and then the triazine ring-containing polymer (23' ) and the hydroxyl group of the hydroxyalkyl group contained in ) react with the (meth)acrylate compound having an isocyanate group represented by formula (i') (second stage). In addition, when the triazine ring-containing polymer (23') is used as the target object, the reaction in the second stage is not carried out, and the reaction in the first stage may be completed.

Figure 02_image089
(式中,R a1表示羥基烷基,X、A 3、A 4、R a及a表示與上述相同意義)
Figure 02_image089
(In the formula, R a1 represents a hydroxyalkyl group, and X, A 3 , A 4 , R a and a represent the same meanings as above)

且,作為另一型態,有舉出下述流程4所示之手法。此手法中,含三嗪環之聚合物(27)能夠藉由使三嗪化合物(29)及芳基二胺基化合物(32)於適當的有機溶媒中反應後,使其與末端封止劑之具有羥基烷基之芳基胺基化合物(31’)反應,得到含三嗪環之聚合物(27’)(第1階段),之後,進而使該含三嗪環之聚合物(27’)中包含之羥基烷基之烷基與式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物作用(第2階段)而得。 且,將含三嗪環之聚合物(27’)作為目的物時,不實施第2階段之反應,在第1階段結束即可。 In addition, as another mode, there is a technique shown in Flowchart 4 below. In this method, the triazine ring-containing polymer (27) can be prepared by reacting the triazine compound (29) and the aryl diamine compound (32) in an appropriate organic solvent, and then reacting it with a terminal blocking agent. The arylamino compound (31') having a hydroxyalkyl group reacts to obtain a triazine ring-containing polymer (27') (the first stage), and then the triazine ring-containing polymer (27' ) and the alkyl group of the hydroxyalkyl group contained in ) react with the (meth)acrylate compound having an isocyanate group represented by the formula (i') (the second stage). In addition, when the triazine ring-containing polymer (27') is used as the target object, the reaction in the second stage is not carried out, and the reaction in the first stage may be completed.

Figure 02_image091
(式中,R a1表示羥基烷基,X、A 3、A 4、R a及a表示與上述相同意義)
Figure 02_image091
(In the formula, R a1 represents a hydroxyalkyl group, and X, A 3 , A 4 , R a and a represent the same meanings as above)

上述流程3中,第1階段中之芳基二胺基化合物(30)之添加比及添加方法、得到含三嗪環之聚合物(23’)為止之反應中的反應溫度能夠與流程1之說明相同。 且,第2階段中,相對於含三嗪環之聚合物(23’),式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物之添加比能夠因應羥基烷基與式(i)表示之基之比來任意地設定,相對於使用之具有羥基烷基之芳基胺基化合物之1當量,較佳為0.1~10當量,再較佳為0.5~5當量,再更較佳為0.7~3當量,更較佳為0.9~1.5當量。例如,將含三嗪環之聚合物(23’)中包含之所有羥基烷基作為式(i)表示之基時,其添加比相對於使用之具有羥基烷基之芳基胺基化合物1當量,上述(甲基)丙烯酸酯化合物較佳為1.0~10當量,再較佳為1.0~5當量,再更較佳為1.0~3當量,更較佳為1.0~1.5當量。 該反應中的反應溫度與得到含三嗪環之聚合物(23’)之反應中的反應溫度相同,但考慮在反應中不引起(甲基)丙烯醯基聚合的話,為30~80℃較佳,為40~70℃再較佳,為50~60℃再更較佳。 In the above scheme 3, the addition ratio and addition method of the aryl diamine compound (30) in the first stage, and the reaction temperature in the reaction until the triazine ring-containing polymer (23') can be obtained can be compared with those of the scheme 1. The instructions are the same. And, in the second stage, relative to the triazine ring-containing polymer (23'), the addition ratio of the (meth)acrylate compound having an isocyanate group represented by the formula (i') can be adjusted according to the ratio of the hydroxyalkyl group to the formula ( The ratio of the groups represented by i) is set arbitrarily, preferably 0.1 to 10 equivalents, more preferably 0.5 to 5 equivalents, and even more preferably 1 equivalent of the arylamino compound having a hydroxyalkyl group used. Preferably it is 0.7-3 equivalents, more preferably 0.9-1.5 equivalents. For example, when all the hydroxyalkyl groups contained in the triazine ring-containing polymer (23') are used as groups represented by the formula (i), the addition ratio is 1 equivalent of the arylamino compound having a hydroxyalkyl group used. , the above-mentioned (meth)acrylate compound is preferably 1.0-10 equivalents, more preferably 1.0-5 equivalents, still more preferably 1.0-3 equivalents, still more preferably 1.0-1.5 equivalents. The reaction temperature in this reaction is the same as the reaction temperature in the reaction to obtain the triazine ring-containing polymer (23'), but considering that polymerization of (meth)acryl groups does not occur during the reaction, it is 30 to 80°C. Preferably, it is more preferably 40~70°C, and even more preferably 50~60°C.

上述流程4中,芳基二胺基化合物(32)之添加比及添加方法、反應溫度能夠與流程2之說明相同。 且,第2階段中,相對於含三嗪環之聚合物(27’),式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物之添加比能夠因應羥基烷基與式(i)表示之基之比來任意地設定,相對於使用之具有羥基烷基之芳基胺基化合物1當量,較佳為0.1~10當量,再較佳為0.5~5當量,再更較佳為0.7~3當量,更較佳為0.9~1.5當量。例如將含三嗪環之聚合物(22’)中包含之羥基烷基所有作為式(i)表示之基時,其添加比相對於使用之具有羥基烷基之芳基胺基化合物1當量,上述(甲基)丙烯酸酯化合物較佳為1.0~10當量,再較佳為1.0~5當量,再更較佳為1.0~3當量,更較佳為1.0~1.05當量。 該反應中的反應溫度相同,但考慮在反應中不引起(甲基)丙烯醯基聚合的話,為30~80℃較佳,為40~70℃再較佳,為50~60℃再更較佳。 In the above scheme 4, the addition ratio, addition method, and reaction temperature of the aryl diamine compound (32) can be the same as those described in scheme 2. And, in the second stage, relative to the triazine ring-containing polymer (27'), the addition ratio of the (meth)acrylate compound having an isocyanate group represented by the formula (i') can be adjusted according to the ratio of the hydroxyalkyl group and the formula ( The ratio of the groups represented by i) is set arbitrarily, preferably 0.1-10 equivalents, more preferably 0.5-5 equivalents, and still more preferably 1 equivalent of the arylamino compound having a hydroxyalkyl group used. 0.7-3 equivalents, more preferably 0.9-1.5 equivalents. For example, when all the hydroxyalkyl groups contained in the triazine ring-containing polymer (22') are used as groups represented by the formula (i), the addition ratio is 1 equivalent of the arylamino compound having a hydroxyalkyl group used, The above-mentioned (meth)acrylate compound is preferably 1.0-10 equivalents, more preferably 1.0-5 equivalents, still more preferably 1.0-3 equivalents, still more preferably 1.0-1.05 equivalents. The reaction temperature in this reaction is the same, but in consideration of not causing (meth)acryl group polymerization during the reaction, it is preferably 30 to 80°C, more preferably 40 to 70°C, and still more preferably 50 to 60°C. good.

流程3及流程4之第2階段中,為了在反應中不引起(甲基)丙烯醯基聚合,反應亦可在聚合禁止劑存在下進行。 作為聚合禁止劑,有舉例如N-甲基-N-亞硝基苯胺、N-亞硝基苯基羥基胺或其鹽類、苯并醌類、酚系聚合禁止劑、吩噻嗪等。此等中,以聚合禁止效果優異之觀點來看,為N-亞硝基苯基羥基胺或其鹽類較佳。 作為N-亞硝基苯基羥基胺鹽類,有舉例如N-亞硝基苯基羥基胺銨鹽、N-亞硝基苯基羥基胺鋁鹽等。 作為苯并醌類,有舉例如p-苯并醌、2-甲基-1,4-苯并醌等。 作為酚系聚合禁止劑,有舉例如氫醌、p-甲氧基酚、4-t-丁基苯二酚、2-t-丁基氫醌、2,6-二-t-丁基-4-甲基酚等。 作為聚合禁止劑之使用量,並無特別限制,但例如相對於式(i’)表示之具有異氰酸酯基之(甲基)丙烯酸酯化合物,質量比亦可為1~200ppm或10~100ppm。 藉由使用聚合禁止劑,即使將反應溫度提高到60~80℃左右,也能夠抑制(甲基)丙烯醯基之聚合,進行第2階段之反應。 In the second stage of scheme 3 and scheme 4, in order not to cause (meth)acryl group polymerization during the reaction, the reaction can also be carried out in the presence of a polymerization inhibitor. Examples of the polymerization inhibitor include N-methyl-N-nitrosoaniline, N-nitrosophenylhydroxylamine or salts thereof, benzoquinones, phenolic polymerization inhibitors, and phenothiazines. Among them, N-nitrosophenylhydroxylamine or a salt thereof is preferable from the viewpoint of excellent polymerization inhibition effect. Examples of N-nitrosophenylhydroxylamine salts include N-nitrosophenylhydroxylamine ammonium salt and N-nitrosophenylhydroxylamine aluminum salt. Examples of benzoquinones include p-benzoquinone, 2-methyl-1,4-benzoquinone, and the like. Examples of phenolic polymerization inhibitors include hydroquinone, p-methoxyphenol, 4-t-butylbenzenediol, 2-t-butylhydroquinone, 2,6-di-t-butyl- 4-Methylphenol etc. The usage amount of the polymerization inhibitor is not particularly limited, but for example, the mass ratio may be 1~200ppm or 10~100ppm relative to the (meth)acrylate compound having isocyanate group represented by formula (i'). By using a polymerization inhibitor, even if the reaction temperature is increased to about 60~80°C, the polymerization of (meth)acryloyl groups can be inhibited, and the second-stage reaction can proceed.

作為有機溶媒,能夠使用此種反應中通常使用之各種溶媒,有舉例如四氫呋喃(THF)、二氧雜環、二甲基亞碸;N,N-二甲基甲醯胺、N-甲基-2-吡咯烷酮、四甲基尿素、六甲基磷醯胺、N,N-二甲基乙醯胺、3-甲氧基-N,N-二甲基丙烷醯胺、3-丁氧基-N,N-二甲基丙烷醯胺、N-甲基-2-哌啶酮、N,N’-二甲基伸乙基尿素、N,N,N’,N’-四甲基丙二酸醯胺、N-甲基己內醯胺、N-乙醯基吡咯啶、N,N-二乙基乙醯胺、N-乙基-2-吡咯烷酮、N,N-二甲基丙酸醯胺、N,N-二甲基異丁基醯胺、N-甲基甲醯胺、N,N’-二甲基伸丙基尿素等之醯胺系溶媒及此等之混合溶媒。 其中,為N,N-二甲基甲醯胺、二甲基亞碸、N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、3-甲氧基-N,N-二甲基丙烷醯胺、3-丁氧基-N,N-二甲基丙烷醯胺及此等之混合系較佳,尤其是N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮、3-甲氧基-N,N-二甲基丙烷醯胺、3-丁氧基-N,N-二甲基丙烷醯胺較適合。 As the organic solvent, various solvents commonly used in this reaction can be used, such as tetrahydrofuran (THF), dioxane, dimethylsulfoxide; N,N-dimethylformamide, N-methyl -2-pyrrolidone, tetramethylurea, hexamethylphosphoramide, N,N-dimethylacetamide, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy -N,N-Dimethylpropanamide, N-methyl-2-piperidone, N,N'-Dimethylethylenylurea, N,N,N',N'-Tetramethylpropane Diacidamide, N-methylcaprolactam, N-acetylpyrrolidine, N,N-diethylacetamide, N-ethyl-2-pyrrolidone, N,N-dimethylpropane Amide-based solvents such as amide, N,N-dimethylisobutylamide, N-methylformamide, N,N'-dimethylpropylidene urea, and their mixed solvents. Among them, N,N-dimethylformamide, dimethylsulfoxide, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, 3-methoxy-N,N- Dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide and mixtures thereof are preferred, especially N,N-dimethylacetamide, N-methyl- 2-pyrrolidone, 3-methoxy-N,N-dimethylpropanamide, and 3-butoxy-N,N-dimethylpropanamide are more suitable.

且,上述流程1或流程2之第1階段之反應中,亦可在聚合時或聚合後添加通常使用之各種鹽基。 作為此鹽基之具體例,有舉出碳酸鉀、羥化鉀、碳酸鈉、羥化鈉、碳酸氫鈉、乙氧鈉、乙酸鈉、碳酸鋰、羥化鋰、氧化鋰、乙酸鉀、氧化鎂、氧化鈣、羥化鋇、磷酸三鋰、磷酸三鈉、磷酸三鉀、氟化銫、氧化鋁、銨、n-丙基胺、三甲基胺、三乙基胺、二異丙基胺、二異丙基乙基胺、N-甲基哌啶、2,2,6,6-四甲基-N-甲基哌啶、吡啶、4-二甲基胺基吡啶、N-甲基嗎呋啉、2-胺基乙醇、乙基二乙醇胺、二乙基胺基乙醇等。 鹽基之添加量相對於三嗪化合物(29)1當量,為1~100當量較佳,為1~10當量再較佳。且,此等之鹽基亦可作為水溶液來使用。 所得之聚合物中不殘存原料成分較佳,但只要不損害本發明之效果,亦可殘存一部份之原料。 反應結束後,生成物能夠藉由再沉澱法等來輕易地純化。 In addition, in the reaction of the first stage of the above-mentioned Scheme 1 or Scheme 2, various salt groups commonly used may be added during or after polymerization. Specific examples of this base include potassium carbonate, potassium hydroxide, sodium carbonate, sodium hydroxide, sodium bicarbonate, sodium ethoxide, sodium acetate, lithium carbonate, lithium hydroxide, lithium oxide, potassium acetate, Magnesium, calcium oxide, barium hydroxide, trilithium phosphate, trisodium phosphate, tripotassium phosphate, cesium fluoride, aluminum oxide, ammonium, n-propylamine, trimethylamine, triethylamine, diisopropylamine Amine, diisopropylethylamine, N-methylpiperidine, 2,2,6,6-tetramethyl-N-methylpiperidine, pyridine, 4-dimethylaminopyridine, N-methylpiperidine Morphofurin, 2-aminoethanol, ethyldiethanolamine, diethylaminoethanol, etc. The amount of the base added is preferably 1 to 100 equivalents, more preferably 1 to 10 equivalents, relative to 1 equivalent of the triazine compound (29). Moreover, these bases can also be used as an aqueous solution. It is preferable that no raw material components remain in the obtained polymer, but a part of the raw materials may remain as long as the effect of the present invention is not impaired. After the reaction, the product can be easily purified by reprecipitation or the like.

作為使用具有交聯基之胺基化合物之末端封止方法,採用公知方法即可。 此時,末端封止劑之使用量相對於來自聚合反應中沒有被使用之剩餘三嗪化合物之鹵原子1當量,為0.05~10當量左右較佳,為0.1~5當量再較佳,為0.5~2當量再更較佳。 作為反應溶媒或反應溫度,有舉出與上述流程1或流程2之第1階段之反應所述相同之條件,且末端封止劑亦可與芳基二胺基化合物(30)或(32)同時添加。 且,亦可使用不具有交聯基之無取代芳基胺基化合物,以2種類以上之基進行末端封止。作為該無取代芳基胺基化合物之芳基,有舉出與上述相同者。 A known method may be used as a terminal-blocking method using an amino compound having a crosslinking group. At this time, the amount of the end-blocking agent is preferably about 0.05-10 equivalents, more preferably 0.1-5 equivalents, and 0.5 equivalents relative to 1 equivalent of halogen atoms from the remaining triazine compound not used in the polymerization reaction ~2 equiv is even better. As the reaction medium or reaction temperature, the same conditions as those described in the first stage of the above-mentioned scheme 1 or scheme 2 are mentioned, and the terminal blocking agent can also be mixed with the aryl diamine compound (30) or (32) Also added. In addition, an unsubstituted arylamino compound having no crosslinking group may be used to end-cap with two or more types of groups. Examples of the aryl group of the unsubstituted arylamino compound include the same ones as above.

作為具體的無取代芳基胺基,有舉出下述式(33)所示者,但不限定於此等。Specific examples of unsubstituted arylamine groups include those represented by the following formula (33), but are not limited thereto.

Figure 02_image093
*表示鍵結處。
Figure 02_image093
*Indicates a bond.

且,無取代芳基胺基能夠使用對應之無取代芳基胺基化合物來導入。 作為無取代芳基胺基化合物之具體例,有舉出苯胺等。 Also, the unsubstituted arylamine group can be introduced using a corresponding unsubstituted arylamine compound. Aniline etc. are mentioned as a specific example of an unsubstituted aryl amino compound.

且,導入無取代芳基胺基時,具有交聯基之胺基化合物及無取代芳基胺基化合物之比率以平衡良好地發揮對有機溶媒之溶解性與耐黃變性之觀點來看,相對於具有交聯基之胺基化合物1莫耳,無取代芳基胺基化合物為0.1~1.0莫耳較佳,為0.1~0.5莫耳再較佳,為0.1~0.3莫耳再更較佳。Moreover, when introducing an unsubstituted arylamine group, the ratio of the amino compound having a crosslinking group to the unsubstituted arylamine compound is relatively good in terms of exhibiting a good balance of solubility in organic solvents and yellowing resistance. 0.1-1.0 mole of the unsubstituted aryl amino compound is preferably 0.1-0.5 mole, still more preferably 0.1-0.3 mole, based on 1 mole of the amino compound having a crosslinking group.

且,除了使用具有交聯基之胺基化合物之末端封止,亦可使用具有含特定雜原子之取代基之芳基胺基化合物來進行末端封止。藉由具有含特定雜原子之取代基之芳基胺基來末端封止,能夠更提高所得之膜之折射率。 作為含特定雜原子之取代基,有舉出氰基、烷基胺基、芳基胺基、硝基、烷基氫硫基、芳基氫硫基、烷氧基羰基、烷氧基羰基氧基。 作為具有含特定雜原子之取代基之芳基胺基,有舉出下述式(34)所示者。 Also, in addition to the end-capping using an amine compound having a crosslinking group, an arylamine compound having a substituent containing a specific heteroatom can also be used for terminal capping. The refractive index of the resulting film can be further increased by end-capping with an arylamine group having a substituent containing a specific heteroatom. Examples of substituents containing specific heteroatoms include cyano, alkylamino, arylamino, nitro, alkylsulfhydryl, arylsulfhydryl, alkoxycarbonyl, alkoxycarbonyloxy base. Examples of the arylamine group having a substituent containing a specific heteroatom include those represented by the following formula (34).

Figure 02_image095
式中,Y為「含特定雜原子之取代基」,且表示氰基、烷基胺基、芳基胺基、硝基、烷基氫硫基、芳基氫硫基、烷氧基羰基或烷氧基羰基氧基。m表示1~5之整數。m為2以上時,Y亦可相同或相異。*表示鍵結處。
Figure 02_image095
In the formula, Y is a "substituent containing a specific heteroatom" and represents a cyano group, an alkylamino group, an arylamino group, a nitro group, an alkylsulfhydryl group, an arylsulfhydryl group, an alkoxycarbonyl group or Alkoxycarbonyloxy. m represents an integer from 1 to 5. When m is 2 or more, Y may be the same or different. *Indicates a bond.

此等中,Y為氰基、硝基較佳。m為1較佳。m為1時,Y為取代對位或間位較佳。Among these, Y is preferably a cyano group or a nitro group. m is preferably 1. When m is 1, Y is preferably a substituent para-position or meta-position.

且,導入具有含特定雜原子之取代基之芳基胺基時,具有交聯基之胺基化合物及具有含特定雜原子之取代基之芳基胺基化合物之比率以平衡良好地發揮之耐溶解性與高折射率化之觀點來看,相對於具有交聯基之胺基化合物1莫耳,具有含特定雜原子之取代基之芳基胺基化合物為0.1~1.0莫耳較佳,為0.1~0.5莫耳再較佳,為0.1~0.3莫耳再更較佳。Also, when introducing an arylamine group having a substituent containing a specific heteroatom, the ratio of the amine compound having a crosslinking group to the arylamine compound having a substituent containing a specific heteroatom is well balanced to exhibit good resistance. From the viewpoint of solubility and high refractive index, relative to 1 mole of the amino compound having a crosslinking group, the arylamine compound having a substituent containing a specific heteroatom is preferably 0.1 to 1.0 mole, which is 0.1~0.5 mole is more preferable, and 0.1~0.3 mole is still more preferable.

作為膜形成用組成物中之含三嗪環之聚合物之含量,並無特別限制,但為1~50質量%較佳,為5~30質量%再較佳。The content of the triazine ring-containing polymer in the film-forming composition is not particularly limited, but is preferably 1 to 50% by mass, more preferably 5 to 30% by mass.

(2).交聯劑 作為交聯劑,只要是具有2個以上能夠與上述含三嗪環之聚合物之交聯基反應之取代基之化合物即可,並無特別限定。 作為如此之化合物,有舉出具有羥甲基、甲氧基甲基等之交聯形成取代基之三聚氰胺系化合物(例如酚醛塑料化合物、胺塑料化合物等)、取代尿素系化合物、含有環氧基或環氧丙烷基等之交聯形成取代基之化合物(例如多官能環氧化合物、多官能環氧丙烷化合物等)、含有嵌段異氰酸酯基之化合物、具有酸酐基之化合物、具有(甲基)丙烯酸基之化合物等,但以耐熱性或保存安定性之觀點來看,為含有環氧基、嵌段異氰酸酯基、(甲基)丙烯酸基之化合物較佳,尤其是,具有嵌段異氰酸酯基之化合物,或不使用起始劑也能夠賦予光硬化之組成物之多官能環氧化合物及/或多官能(甲基)丙烯酸化合物較佳。 (2).Crosslinking agent The crosslinking agent is not particularly limited as long as it is a compound having two or more substituents capable of reacting with the crosslinking group of the triazine ring-containing polymer. Examples of such compounds include melamine-based compounds (such as phenolic plastic compounds, amine plastic compounds, etc.), substituted urea-based compounds, epoxy group-containing Or cross-linked propylene oxide groups to form substituent compounds (such as polyfunctional epoxy compounds, polyfunctional propylene oxide compounds, etc.), compounds containing blocked isocyanate groups, compounds with acid anhydride groups, compounds with (methyl) Compounds with acrylic groups, etc., but from the viewpoint of heat resistance and storage stability, compounds containing epoxy groups, blocked isocyanate groups, and (meth)acrylic groups are preferred, especially those with blocked isocyanate groups Compounds, or polyfunctional epoxy compounds and/or polyfunctional (meth)acrylic compounds capable of imparting a photocurable composition without using an initiator are preferred.

作為多官能環氧化合物,只要一分子中具有2個以上環氧基者即可,並無特別限定。 作為其具體例,有舉出參(2,3-環氧丙基)聚異氰酸酯、1,4-丁烷二醇二環氧丙基醚、1,2-環氧-4-(環氧乙基)環己烷、甘油三環氧丙基醚、二乙二醇二環氧丙基醚、2,6-二環氧丙基苯基環氧丙基醚、1,1,3-參[p-(2,3-環氧丙氧基)苯基]丙烷、1,2-環己烷二羧酸二環氧丙基酯、4,4’-亞甲基雙(N,N-二環氧丙基苯胺)、3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯、三羥甲基乙烷三環氧丙基醚、雙酚-A-二環氧丙基醚、季戊四醇聚環氧丙基醚等。 The polyfunctional epoxy compound is not particularly limited as long as it has two or more epoxy groups in one molecule. Specific examples thereof include ginseng (2,3-epoxypropyl) polyisocyanate, 1,4-butanediol diglycidyl ether, 1,2-epoxy-4-(ethylene oxide) base) cyclohexane, glycerol triglycidyl ether, diethylene glycol diglycidyl ether, 2,6-diglycidyl phenyl glycidyl ether, 1,1,3-reference [ p-(2,3-Epoxypropoxy)phenyl]propane, Diglycidyl 1,2-cyclohexanedicarboxylate, 4,4'-methylenebis(N,N-di Epoxypropylaniline), 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, trimethylolethane triglycidyl ether, bisphenol-A-di Glycidyl ether, pentaerythritol polyglycidyl ether, etc.

且,作為市售品,能夠使用至少具有2個環氧基之環氧樹脂之YH-434、YH434L(NIPPON STEEL Chemical & Material(股)製)、具有環氧環己烷構造之環氧樹脂之Epolead GT-401、同GT-403、同GT-301、同GT-302、Celoxide 2021、同3000((股)Daicel製)、雙酚A型環氧樹脂之jER1001、同1002、同1003、同1004、同1007、同1009、同1010、同828(以上為三菱Chemical(股)製)、雙酚F型環氧樹脂之jER807(三菱Chemical(股)製)、苯酚酚醛樹脂型環氧樹脂之jER152、同154(以上為三菱Chemical(股)製)、EPPN201、同202(以上為日本化藥(股)製)、甲苯酚酚醛樹脂型環氧樹脂之EOCN-102、同103S、同104S、同1020、同1025、同1027(以上為日本化藥(股)製)、jER180S75(三菱Chemical(股)製)、脂環式環氧樹脂之Denacol EX-252(Nagase ChemteX(股)製)、CY175、CY177、CY179(以上為CIBA-GEIGY A.G製)、Araldite CY-182、同CY-192、同CY-184(以上為CIBA-GEIGY A.G製)、Epiclon 200、同400(以上為DIC(股)製)、jER871、同872(以上為三菱Chemical(股)製)、ED-5661、ED-5662(以上為Celanese coating(股)製)、脂肪族聚環氧丙基醚之Denacol EX-611、同EX-612、同EX-614、同EX-622、同EX-411、同EX-512、同EX-522、同EX-421、同EX-313、同EX-314、同EX-321(Nagase ChemteX(股)製)等。In addition, as commercially available products, YH-434 and YH434L (manufactured by NIPPON STEEL Chemical & Material Co., Ltd.) of epoxy resins having at least two epoxy groups, and epoxy resins having an epoxycyclohexane structure can be used. Epolead GT-401, same GT-403, same GT-301, same GT-302, Celoxide 2021, same 3000 (made by Daicel), jER1001 of bisphenol A type epoxy resin, same 1002, same 1003, same 1004, same as 1007, same as 1009, same as 1010, same as 828 (manufactured by Mitsubishi Chemical Co., Ltd. above), jER807 of bisphenol F type epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd.), of phenol novolac resin type epoxy resin jER152, Tong 154 (the above are manufactured by Mitsubishi Chemical Co., Ltd.), EPPN201, Tong 202 (the above are manufactured by Nippon Kayaku Co., Ltd.), EOCN-102 of cresol phenolic resin type epoxy resin, Tong 103S, Tong 104S, Same 1020, Same 1025, Same 1027 (manufactured by Nippon Kayaku Co., Ltd. above), jER180S75 (manufactured by Mitsubishi Chemical Co., Ltd.), Denacol EX-252 of alicyclic epoxy resin (manufactured by Nagase ChemteX Co., Ltd.), CY175, CY177, CY179 (the above are manufactured by CIBA-GEIGY A.G), Araldite CY-182, the same as CY-192, the same as CY-184 (the above are manufactured by CIBA-GEIGY A.G), Epiclon 200, the same as 400 (the above are DIC (shares) )), jER871, Tong 872 (the above are manufactured by Mitsubishi Chemical Co., Ltd.), ED-5661, ED-5662 (the above are manufactured by Celanese Coating Co., Ltd.), Denacol EX-611 of aliphatic polyglycidyl ether , Same as EX-612, Same as EX-614, Same as EX-622, Same as EX-411, Same as EX-512, Same as EX-522, Same as EX-421, Same as EX-313, Same as EX-314, Same as EX-321 (manufactured by Nagase ChemteX Co., Ltd.), etc.

作為多官能(甲基)丙烯酸化合物,只要是一分子中具有2個以上(甲基)丙烯酸基者即可,並無特別限定。 作為其具體例,有舉出乙二醇二丙烯酸酯、乙二醇二甲基丙烯酸酯、聚乙二醇二丙烯酸酯、聚乙二醇二甲基丙烯酸酯、乙氧化雙酚A二丙烯酸酯、乙氧化雙酚A二甲基丙烯酸酯、乙氧化三羥甲基丙烷三丙烯酸酯、乙氧化三羥甲基丙烷三甲基丙烯酸酯、乙氧化丙三醇三丙烯酸酯、乙氧化丙三醇三甲基丙烯酸酯、乙氧化季戊四醇四丙烯酸酯、乙氧化季戊四醇四甲基丙烯酸酯、乙氧化二季戊四醇六丙烯酸酯、聚丙三醇單氧化乙烯聚丙烯酸酯、聚丙三醇聚乙二醇聚丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇六甲基丙烯酸酯、新戊二醇二丙烯酸酯、新戊二醇二甲基丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇三甲基丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三環癸烷二甲醇二丙烯酸酯、三環癸烷二甲醇二甲基丙烯酸酯、1,6-己烷二醇二丙烯酸酯、1,6-己烷二醇二甲基丙烯酸酯、多鹼基酸變性丙烯酸寡聚物等。 The polyfunctional (meth)acrylic compound is not particularly limited as long as it has two or more (meth)acrylic groups in one molecule. Specific examples thereof include ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, and ethoxylated bisphenol A diacrylate. , Ethoxylated Bisphenol A Dimethacrylate, Ethoxylated Trimethylolpropane Triacrylate, Ethoxylated Trimethylolpropane Trimethacrylate, Ethoxylated Glycerol Triacrylate, Ethoxylated Glycerol Trimethacrylate, Ethoxylated Pentaerythritol Tetraacrylate, Ethoxylated Pentaerythritol Tetramethacrylate, Ethoxylated Dipentaerythritol Hexaacrylate, Polyglycerol Monooxide Polyacrylate, Polyglycerol Polyethylene Glycol Polyacrylate , dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, trimethylolpropane Triacrylate, trimethylolpropane trimethacrylate, tricyclodecane dimethanol diacrylate, tricyclodecane dimethanol dimethacrylate, 1,6-hexanediol diacrylate, 1 , 6-hexanediol dimethacrylate, polybasic acid denatured acrylic oligomer, etc.

且,多官能(甲基)丙烯酸化合物能夠以市售品來取得,作為其具體例,有舉出NK esterA-200、同A-400、同A-600、同A-1000、同A-9300(異三聚氰酸參(2-丙烯醯基氧基乙酯))、同A-9300-1CL、同A-TMPT、同UA-53H、同1G、同2G、同3G、同4G、同9G、同14G、同23G、同ABE-300、同A-BPE-4、同A-BPE-6、同A-BPE-10、同A-BPE-20、同A-BPE-30、同BPE-80N、同BPE-100N、同BPE-200、同BPE-500、同BPE-900、同BPE-1300N、同A-GLY-3E、同A-GLY-9E、同A-GLY-20E、同A-TMPT-3EO、同A-TMPT-9EO、同AT-20E、同ATM-4E、同ATM-35E、APG-100、APG-200(以上為新中村化學工業(股)製)、KAYARAD(註冊商標)DPEA-12、同PEG400DA、同THE-330、同RP-1040(以上為日本化藥(股)製)、ARONIX M-210、M-350(以上為東亞合成(股)製)、KAYARAD(註冊商標)DPHA、同NPGDA、同PET30(以上為日本化藥(股)製)、NK ester A-DPH、同A-TMPT、同A-DCP、同A-HD-N、同TMPT、同DCP、同NPG、同HD-N(以上為新中村化學工業(股)製)、NK OLIGO U-15HA(新中村化學工業(股)製)、NK Polymers VANARESIN GH-1203(新中村化學工業(股)製)、DN-0075(日本化藥(股)製)等。 上述多鹼基酸變性丙烯酸寡聚物也能夠以市售品來取得,作為其具體例,有舉出ARONIX M-510,520(以上為東亞合成(股)製)等。 In addition, the polyfunctional (meth)acrylic compound can be obtained as a commercial item, and its specific examples include NK ester A-200, TO A-400, TO A-600, TO A-1000, TO A-9300 (isocyanuric acid ginseng (2-acryloxyethyl ester)), same A-9300-1CL, same A-TMPT, same UA-53H, same 1G, same 2G, same 3G, same 4G, same 9G, same 14G, same 23G, same ABE-300, same A-BPE-4, same A-BPE-6, same A-BPE-10, same A-BPE-20, same A-BPE-30, same BPE -80N, Same as BPE-100N, Same as BPE-200, Same as BPE-500, Same as BPE-900, Same as BPE-1300N, Same as A-GLY-3E, Same as A-GLY-9E, Same as A-GLY-20E, Same as A-TMPT-3EO, same as A-TMPT-9EO, same as AT-20E, same as ATM-4E, same as ATM-35E, APG-100, APG-200 (the above are manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), KAYARAD ( Registered trademark) DPEA-12, same as PEG400DA, same as THE-330, same as RP-1040 (manufactured by Nippon Kayaku Co., Ltd. above), ARONIX M-210, M-350 (manufactured by Toagosei Co., Ltd. above), KAYARAD (registered trademark) DPHA, same NPGDA, same PET30 (the above are made by Nippon Kayaku Co., Ltd.), NK ester A-DPH, same A-TMPT, same A-DCP, same A-HD-N, same TMPT, Same as DCP, same NPG, same HD-N (manufactured by New Nakamura Chemical Co., Ltd. above), NK OLIGO U-15HA (manufactured by New Nakamura Chemical Co., Ltd.), NK Polymers VANARESIN GH-1203 (manufactured by New Nakamura Chemical Co., Ltd. (Co., Ltd.), DN-0075 (Nippon Kayaku Co., Ltd.), etc. The above-mentioned polybasic acid-denatured acrylic oligomer can also be obtained as a commercial item, and its specific example includes ARONIX M-510, 520 (the above are manufactured by Toagosei Co., Ltd.).

作為具有酸酐基之化合物,只要是使2分子之羧酸去水縮合之羧酸酐即可,並無特別限定,作為其具體例,有舉出苯二甲酸酐、四氫苯二甲酸酐、六氫苯二甲酸酐、甲基四氫苯二甲酸酐、甲基六氫苯二甲酸酐、四氫酞酸酐、內亞甲基四氫酞酸酐、馬來酸酐、丁二酸酐、辛基丁二酸酐、十二烯基丁二酸酐等分子內具有1個酸酐基者;1,2,3,4-環丁烷四羧酸二酐、苯均四酸酐、3,4-二羧基-1,2,3,4-四氫-1-萘丁二酸二酐、雙環[3.3.0]辛烷-2,4,6,8-四羧酸二酐、5-(2,5-二氧基四氫-3-呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、1,2,3,4-丁烷四羧酸二酐、3,3’,4,4’-二苯酮四羧酸二酐、3,3’,4,4’-雙苯基四羧酸二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、1,3-二甲基-1,2,3,4-環丁烷四羧酸二酐等分子內具有2個酸酐基者等。The compound having an acid anhydride group is not particularly limited as long as it is a carboxylic anhydride obtained by dehydrating and condensing two molecules of carboxylic acid. Hydrophthalic anhydride, methyl tetrahydrophthalic anhydride, methyl hexahydrophthalic anhydride, tetrahydrophthalic anhydride, endomethylene tetrahydrophthalic anhydride, maleic anhydride, succinic anhydride, octylbutane Acid anhydride, dodecenylsuccinic anhydride, etc. have an acid anhydride group in the molecule; 1,2,3,4-cyclobutanetetracarboxylic dianhydride, pyromellitic anhydride, 3,4-dicarboxy-1, 2,3,4-tetrahydro-1-naphthalene dianhydride, bicyclo[3.3.0]octane-2,4,6,8-tetracarboxylic dianhydride, 5-(2,5-dioxo Tetrahydro-3-furyl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 1,2,3,4-butanetetracarboxylic dianhydride, 3,3', 4,4'-Benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoro Those having two acid anhydride groups in the molecule, such as propane dianhydride and 1,3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, etc.

作為含有嵌段異氰酸酯基之化合物,只要是一分子中具有2個以上異氰酸酯基(-NCO)經適當的保護基嵌段之嵌段異氰酸酯基,且暴露在熱硬化時之高溫下,保護基(嵌段部分)會熱解離並分離,所產生之異氰酸酯基會在本發明之含三嗪環之聚合物之交聯基(例如,含羥基之基)之間引起交聯反應即可,並無特別限定,例如有舉出一分子中具有2個以上下述式所示之基(且此等基亦可同或各自相異)之化合物。As a compound containing a blocked isocyanate group, as long as it has two or more isocyanate groups (-NCO) blocked by an appropriate protecting group in one molecule, and is exposed to high temperature during thermal curing, the protecting group ( block part) will thermally dissociate and separate, and the resulting isocyanate group will cause a crosslinking reaction between the crosslinking groups (for example, hydroxyl group-containing groups) of the triazine ring-containing polymer of the present invention, and there is no Particularly limited examples include compounds having two or more groups represented by the following formula (and these groups may be the same or different) in one molecule.

Figure 02_image097
(式中,R b表示嵌段部之有機基。)
Figure 02_image097
(In the formula, R b represents the organic group of the block part.)

如此之化合物能夠藉由例如使一分子中具有2個以上異氰酸酯基之化合物與適當的嵌段劑反應而得。 作為一分子中具有2個以上異氰酸酯基之化合物,有舉例如異佛爾酮二異氰酸酯、1,6-六亞甲基二異氰酸酯、亞甲基雙(4-環己基異氰酸酯)、三甲基六亞甲基二異氰酸酯之聚異氰酸酯,或此等之二量體、三量體及此等與二醇類、三醇類、二胺類或三胺類之反應物等。 作為嵌段劑,有舉例如甲醇、乙醇、異丙醇、n-丁醇、2-乙氧己醇、2-N,N-二甲基胺基乙醇、2-乙氧乙醇、環己醇等之醇類;酚、o-硝基酚、p-氯酚、o-、m-或p-甲酚等之酚類;ε-己內醯胺等之內醯胺類、丙酮肟、甲基乙基酮肟、甲基異丁基酮肟、環己酮肟、苯乙酮肟、二苯酮肟等之肟類;吡唑、3,5-二甲基吡唑、3-甲基吡唑等之吡唑類;十二烷硫醇、苯硫醇等之硫醇類等。 Such a compound can be obtained, for example, by reacting a compound having two or more isocyanate groups in one molecule with an appropriate blocking agent. Examples of compounds having two or more isocyanate groups in one molecule include isophorone diisocyanate, 1,6-hexamethylene diisocyanate, methylene bis(4-cyclohexyl isocyanate), trimethylhexa Polyisocyanate of methylene diisocyanate, or its dimers, trimers, and their reactants with diols, triols, diamines or triamines, etc. Examples of blocking agents include methanol, ethanol, isopropanol, n-butanol, 2-ethoxyhexanol, 2-N,N-dimethylaminoethanol, 2-ethoxyethanol, cyclohexanol Alcohols such as phenol, o-nitrophenol, p-chlorophenol, o-, m- or p-cresol and other phenols; ε-caprolactam and other lactams, acetone oxime, formazan Oximes such as ethyl ethyl ketone oxime, methyl isobutyl ketone oxime, cyclohexanone oxime, acetophenone oxime, benzophenone oxime, etc.; pyrazole, 3,5-dimethylpyrazole, 3-methyl Pyrazoles such as pyrazole; Thiols such as dodecanethiol and benzenethiol, etc.

含有嵌段異氰酸酯基之化合物能夠以市售品取得,作為其具體例,有舉出Takenate(註冊商標)B-830、B-815N、B-842N、B-870N、B-874N、B-882N、B-7005、B-7030、B-7075、B-5010(以上為三井化學(股)製)、Duranate(註冊商標)17B-60PX、同TPA-B80E、同MF-B60X、同MF-K60X、同E402-B80T(以上為旭化成(股)製)、Karenz MOI-BM(註冊商標)(以上為昭和電工(股)製)、TRIXENE(註冊商標) BI-7950、BI-7951、BI-7960、BI-7961、BI-7963、BI-7982、BI-7991、BI-7992 (Baxenden chemicals LTD公司製)等。Compounds containing blocked isocyanate groups are commercially available, and specific examples thereof include Takenate (registered trademark) B-830, B-815N, B-842N, B-870N, B-874N, and B-882N , B-7005, B-7030, B-7075, B-5010 (the above are manufactured by Mitsui Chemicals Co., Ltd.), Duranate (registered trademark) 17B-60PX, same as TPA-B80E, same as MF-B60X, same as MF-K60X , Same as E402-B80T (manufactured by Asahi Kasei Co., Ltd. above), Karenz MOI-BM (registered trademark) (manufactured by Showa Denko Co., Ltd. above), TRIXENE (registered trademark) BI-7950, BI-7951, BI-7960 , BI-7961, BI-7963, BI-7982, BI-7991, BI-7992 (manufactured by Baxenden Chemicals LTD), etc.

作為胺塑料化合物,只要是一分子中具有2個以上甲氧基甲基者即可,並無特別限定,有舉例如六甲氧基甲基三聚氰胺 CYMEL(註冊商標)303、四丁氧基甲基乙炔脲 同1170、四甲氧基甲基苯胍胺 同1123(以上為日本Cytec Industries(股)製)等之Cymel系列、甲基化三聚氰胺樹脂之NIKALAC(註冊商標)MW-30HM、同MW-390、同MW-100LM、同MX-750LM、甲基化尿素樹脂之同MX-270、同MX-280、同MX-290(以上為(股)三和Chemical製)等之NIKALAC系列等之三聚氰胺系化合物。 作為多官能環氧丙烷化合物,只要是一分子中具有2個以上環氧丙烷基者即可,並無特別限定,有舉例如含有環氧丙烷基之OXT-221、OX-SQ-H、OX-SC(以上為東亞合成(股)製)等。 The amine plastic compound is not particularly limited as long as it has two or more methoxymethyl groups in one molecule, and examples include hexamethoxymethylmelamine CYMEL (registered trademark) 303, tetrabutoxymethyl Acetylene carbamide Tong 1170, Tetramethoxymethylbenzoguanamine Tong 1123 (the above are Cytec Industries Co., Ltd., Japan) and other Cymel series, methylated melamine resin NIKALAC (registered trademark) MW-30HM, Tong MW- 390, same MW-100LM, same MX-750LM, methylated urea resin same as MX-270, same MX-280, same MX-290 (the above are manufactured by Sanwa Chemical) and other melamine Department of compounds. The polyfunctional propylene oxide compound is not particularly limited as long as it has two or more propylene oxide groups in one molecule. Examples include OXT-221, OX-SQ-H, and OX that contain propylene oxide groups. -SC (the above are manufactured by Toa Gosei Co., Ltd.), etc.

酚醛塑料化合物為一分子中具有2個以上羥基甲基,且暴露於熱硬化時之高溫中,在本發明之含三嗪環之聚合物之交聯基之間,能夠藉由去水縮合反應進行交聯反應者。 作為酚醛塑料化合物,有舉例如2,6-二羥基甲基-4-甲基酚、2,4-二羥基甲基-6-甲基酚、雙(2-羥基-3-羥基甲基-5-甲基苯基)甲烷、雙(4-羥基-3-羥基甲基-5-甲基苯基)甲烷、2,2-雙(4-羥基-3,5-二羥基甲基苯基)丙烷、雙(3-甲醯基-4-羥基苯基)甲烷、雙(4-羥基-2,5-二甲基苯基)甲醯基甲烷、α,α-雙(4-羥基-2,5-二甲基苯基)-4-甲醯基甲苯等。 酚醛塑料化合物能夠以市售品來取得,作為其具體例,有舉出26DMPC、46DMOC、DM-BIPC-F、DM-BIOC-F、TM-BIP-A、BISA-F、BI25X-DF、BI25X-TPA(以上為旭有機材工業(股)製)等。 Bakelite compounds have more than 2 hydroxymethyl groups in one molecule, and when exposed to high temperature during thermosetting, the cross-linking groups of the triazine ring-containing polymer of the present invention can be dehydrated and condensed for cross-linking reactions. Examples of phenoplast compounds include 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis(2-hydroxy-3-hydroxymethyl- 5-methylphenyl)methane, bis(4-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, 2,2-bis(4-hydroxy-3,5-dihydroxymethylphenyl) ) propane, bis(3-formyl-4-hydroxyphenyl)methane, bis(4-hydroxy-2,5-dimethylphenyl)formylmethane, α,α-bis(4-hydroxy- 2,5-Dimethylphenyl)-4-formyltoluene, etc. The phenolic plastic compound can be obtained as a commercial product, and its specific examples include 26DMPC, 46DMOC, DM-BIPC-F, DM-BIOC-F, TM-BIP-A, BISA-F, BI25X-DF, BI25X -TPA (the above are manufactured by Asahi Organic Materials Co., Ltd.), etc.

此等之中,以能夠抑制交聯劑之摻混所造成的折射率降低,且同時使硬化反應快速進行之觀點來看,為多官能(甲基)丙烯酸化合物較適合,其中,以與含三嗪環之聚合物之相溶性優異之觀點來看,為具有下述異三聚氰酸骨架之多官能(甲基)丙烯酸化合物再較佳。 作為具有如此骨架之多官能(甲基)丙烯酸化合物,有舉例如NK esterA-9300、同A-9300-1CL(皆為新中村化學工業(股)製)。 Among these, polyfunctional (meth)acrylic compounds are suitable from the viewpoint of suppressing the decrease in the refractive index caused by the blending of the crosslinking agent and at the same time rapidly advancing the curing reaction. From the viewpoint of excellent compatibility of polymers of triazine rings, polyfunctional (meth)acrylic compounds having the following isocyanuric acid skeleton are more preferable. Examples of the polyfunctional (meth)acrylic compound having such a skeleton include NK ester A-9300 and Tong A-9300-1CL (both are manufactured by Shin-Nakamura Chemical Co., Ltd.).

Figure 02_image099
(式中,R 111~R 113各自獨立為末端具有至少1個(甲基)丙烯酸基之一價有機基。)
Figure 02_image099
(In the formula, R 111 to R 113 are each independently a valent organic group having at least one (meth)acrylic group at the end.)

且,以更提升硬化速度,且同時提高所得之硬化膜之耐溶劑性及耐酸性、耐鹼性之觀點來看,於25℃為液體,且其黏度為5,000mPa・s以下,較佳為1~3,000mPa・s,再較佳為1~1,000mPa・s,再更較佳為1~500mPa・s之多官能(甲基)丙烯酸化合物(以下稱為低黏度交聯劑)以單獨或組合2種以上來使用,或與上述具有異三聚氰酸骨架之多官能(甲基)丙烯酸化合物組合來使用較適合。 如此之低黏度交聯劑亦能夠以市售品來取得,有例如上述多官能(甲基)丙烯酸化合物中,NK esterA-GLY-3E(85mPa・s,25℃)、同A-GLY-9E(95mPa・s,25℃)、同A-GLY-20E(200mPa・s,25℃)、同A-TMPT-3EO(60mPa・s,25℃)、同A-TMPT-9EO、同ATM-4E(150mPa・s,25℃)、同ATM-35E(350mPa・s,25℃)(以上為新中村化學工業(股)製)等之(甲基)丙烯酸基間之鏈長較長之交聯劑。 And, from the point of view of increasing the curing speed and improving the solvent resistance, acid resistance and alkali resistance of the obtained cured film at the same time, it is liquid at 25°C, and its viscosity is 5,000mPa・s or less, preferably 1~3,000mPa・s, more preferably 1~1,000mPa・s, more preferably 1~500mPa・s multifunctional (meth)acrylic compound (hereinafter referred to as low viscosity crosslinking agent) alone or It is suitable to use in combination of 2 or more types, or to use in combination with the said polyfunctional (meth)acrylic compound which has an isocyanuric acid skeleton. Such a low-viscosity crosslinking agent can also be obtained as a commercial product, for example, among the above-mentioned polyfunctional (meth)acrylic compounds, NK esterA-GLY-3E (85mPa・s, 25°C), same as A-GLY-9E (95mPa・s, 25℃), same as A-GLY-20E (200mPa・s, 25℃), same as A-TMPT-3EO (60mPa・s, 25℃), same as A-TMPT-9EO, same as ATM-4E (150mPa・s, 25°C), and ATM-35E (350mPa・s, 25°C) (the above are manufactured by Shin-Nakamura Chemical Co., Ltd.) agent.

進而,若考慮使所得之硬化膜之耐鹼性提升的話,NK esterA-GLY-20E(新中村化學工業(股)製)及同ATM-35E(新中村化學工業(股)製)中至少一種與上述具有異三聚氰酸骨架之多官能(甲基)丙烯酸化合物組合來使用較適合。Furthermore, in consideration of improving the alkali resistance of the resulting cured film, at least one of NK esterA-GLY-20E (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) and ATM-35E (manufactured by Shin-Nakamura Chemical Co., Ltd.) It is suitable to be used in combination with the polyfunctional (meth)acrylic compound having the above-mentioned isocyanuric acid skeleton.

且,於PET或聚烯烴薄膜等之保護薄膜積層本發明之含三嗪環之聚合物而成之薄膜,介隔著保護薄膜進行光照射時,薄膜積層薄膜中,也能夠不受到氧阻礙且得到良好之硬化性。此時,保護薄膜在硬化後,必須要剝離,因此使用賦予剝離性良好之薄膜之多鹼基酸變性丙烯酸寡聚物較佳。In addition, when a film formed by laminating the triazine ring-containing polymer of the present invention on a protective film such as PET or polyolefin film is irradiated with light through the protective film, the film laminated film can also be free from oxygen hindrance and Get good hardenability. At this time, since the protective film must be peeled off after hardening, it is preferable to use a polybasic acid-denatured acrylic oligomer that imparts a film with good peelability.

上述交聯劑亦可單獨使用,亦可組合2種以上來使用。 膜形成用組成物中之交聯劑之含量相對於含三嗪環之聚合物100質量份,為1~500質量份較佳,但若考慮控制折射率,較佳為30~300質量份,再較佳為50~100質量份。 The above-mentioned crosslinking agents may be used alone or in combination of two or more. The content of the crosslinking agent in the film-forming composition is preferably 1 to 500 parts by mass relative to 100 parts by mass of the triazine ring-containing polymer, but in consideration of controlling the refractive index, it is preferably 30 to 300 parts by mass. More preferably, it is 50-100 mass parts.

(3).無機微粒子 作為無機微粒子,例如含有選自Be、Al、Si、Ti、V、Fe、Cu、Zn、Y、Zr、Nb、Mo、In、Sn、Sb、Ta、W、Pb、Bi及Ce所成群中之1種或2種以上之金屬之氧化物、硫化物或氮化物,尤其是包含此等之金屬氧化物較適合。且,無機微粒子亦可單獨使用,亦可組合2種以上組合來使用。 作為金屬氧化物之具體例,以舉出例Al 2O 3、ZnO、TiO 2、ZrO 2、Fe 2O 3、Sb 2O 5、BeO、ZnO、SnO 2、CeO 2、SiO 2、WO 3等。 且,將複數金屬氧化物作為複合氧化物來使用最有效。複合氧化物意指在微粒子之製造階段,使2種以上無機氧化物混合者。有舉例如TiO 2與ZrO 2之複合氧化物、TiO 2與ZrO 2與SnO 2之複合氧化物、ZrO 2與SnO 2之複合氧化物等。 進而,亦可為上述金屬之化合物。有舉例如ZnSb 2O 6、BaTiO 3、SrTiO 3、SrSnO 3等。此等之化合物能夠以單獨或混合2種以上來使用,進而亦可與上述氧化物混合來使用。 (3). Inorganic microparticles. Inorganic microparticles contain, for example, Be, Al, Si, Ti, V, Fe, Cu, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Ta, W, Pb, Oxides, sulfides, or nitrides of one or more metals in the group consisting of Bi and Ce, especially metal oxides containing these are suitable. In addition, the inorganic fine particles may be used alone, or may be used in combination of two or more. Specific examples of metal oxides include Al 2 O 3 , ZnO, TiO 2 , ZrO 2 , Fe 2 O 3 , Sb 2 O 5 , BeO, ZnO, SnO 2 , CeO 2 , SiO 2 , WO 3 wait. Furthermore, it is most effective to use a plurality of metal oxides as composite oxides. The composite oxide refers to a mixture of two or more inorganic oxides in the production stage of fine particles. Examples include composite oxides of TiO 2 and ZrO 2 , composite oxides of TiO 2 and ZrO 2 and SnO 2 , composite oxides of ZrO 2 and SnO 2 , and the like. Furthermore, compounds of the above-mentioned metals may also be used. Examples include ZnSb 2 O 6 , BaTiO 3 , SrTiO 3 , SrSnO 3 and the like. These compounds can be used individually or in mixture of 2 or more types, and can also be used in mixture with the said oxide.

且,本發明中使用之無機微粒子亦可為經表面修飾之無機微粒子。如此之無機微粒子亦可為表面具有親水性基及交聯性基中至少任一者。 表面具有親水性基及交聯性基中至少任一者之無機微粒子(以下有時亦稱作「表面修飾無機微粒子」)能夠例如將如上述之無機微粒子作為核粒子,並藉由以具有親水性基之有機矽化合物及具有交聯性基之有機矽化合物中至少任一者修飾核粒子之表面而得。 藉由使用表面修飾無機微粒子作為無機微粒子,能夠提升在樹脂中之分散安定性,並能夠更抑制硬化膜之HAZE。 有機矽化合物具有因水解而生成Si-OH基之水解性基。作為水解性基,有舉例如鍵結於矽原子之烷氧基、鍵結於矽原子之乙醯氧基等。作為有機矽化合物中之水解基之數,並無特別限定,但有舉例如1~3個。 In addition, the inorganic fine particles used in the present invention may be surface-modified inorganic fine particles. Such inorganic fine particles may have at least any one of a hydrophilic group and a crosslinkable group on the surface. Inorganic microparticles having at least any one of a hydrophilic group and a crosslinking group on the surface (hereinafter also sometimes referred to as "surface-modified inorganic microparticles") can, for example, use the above-mentioned inorganic microparticles as core particles, and have hydrophilic Obtained by modifying the surface of the core particle by at least any one of the organosilicon compound having a sex group and the organosilicon compound having a cross-linking group. By using the surface-modified inorganic fine particles as the inorganic fine particles, the dispersion stability in the resin can be improved, and the HAZE of the cured film can be further suppressed. Organosilicon compounds have hydrolyzable groups that generate Si-OH groups by hydrolysis. Examples of the hydrolyzable group include an alkoxy group bonded to a silicon atom, an acetyloxy group bonded to a silicon atom, and the like. The number of hydrolyzable groups in the organosilicon compound is not particularly limited, but there are, for example, 1 to 3 groups.

作為親水性基,有舉例如聚氧乙烯、聚氧丙烯、聚氧基丁烯基等之聚醚基。Examples of the hydrophilic group include polyether groups such as polyoxyethylene, polyoxypropylene, and polyoxybutylene groups.

作為具有親水性基之有機矽化合物,有舉例如[甲氧基(聚乙烯氧基)n-丙基]三甲氧基矽烷、[甲氧基(聚乙烯氧基)n-丙基]三乙氧矽烷、[甲氧基(聚乙烯氧基)n-丙基]三丙氧基矽烷、[甲氧基(聚乙烯氧基)n-丙基]三乙醯氧基矽烷、[甲氧基(聚丙烯氧基)n-丙基]三甲氧基矽烷、[甲氧基(聚丙烯氧基)n-丙基]三乙氧矽烷、[甲氧基(聚丙烯氧基)n-丙基]三丙氧基矽烷、「甲氧基(聚丙烯氧基)n-丙基」三乙醯氧基矽烷、[甲氧基(聚丁烯氧基)n-丙基]三甲氧基矽烷、[甲氧基(聚丁烯氧基)n-丙基]三丙氧基矽烷、[甲氧基(聚丁烯氧基)n-丙基]三乙醯氧基矽烷、[甲氧基(聚乙烯氧基)n-丙基]二甲氧基甲基矽烷、[甲氧基(聚乙烯氧基)n-丙基]二乙氧甲基矽烷、[甲氧基(聚乙烯氧基)n-丙基]二丙氧基甲基矽烷、[甲氧基(聚乙烯氧基)n-丙基]二乙醯氧基甲基矽烷、[甲氧基(聚丙烯氧基)n-丙基]二甲氧基甲基矽烷、[甲氧基(聚丙烯氧基)n-丙基]二乙氧甲基矽烷、[甲氧基(聚丙烯氧基)n-丙基]二丙氧基甲基矽烷、[甲氧基(聚丙烯氧基)n-丙基]二乙醯氧基甲基矽烷、[甲氧基(聚丁烯氧基)n-丙基]二甲氧基甲基矽烷、[甲氧基(聚丁烯氧基)n-丙基]二乙氧甲基矽烷、[甲氧基(聚丁烯氧基)n-丙基]二丙氧基甲基矽烷、[甲氧基(聚丁烯氧基)n-丙基]二乙醯氧基甲基矽烷等。Examples of organosilicon compounds having hydrophilic groups include [methoxy(polyethyleneoxy)n-propyl]trimethoxysilane, [methoxy(polyethyleneoxy)n-propyl]triethyl Oxysilane, [methoxy(polyethyleneoxy) n-propyl]tripropropoxysilane, [methoxy(polyethyleneoxy)n-propyl]triacetyloxysilane, [methoxy (Polypropyleneoxy)n-Propyl]Trimethoxysilane, [Methoxy(Polypropyleneoxy)n-Propyl]Triethoxysilane, [Methoxy(Polypropyleneoxy)n-Propyl] ]Tripropoxysilane, "Methoxy(polypropyleneoxy) n-propyl" triacetyloxysilane, [methoxy(polybutenyloxy) n-propyl]trimethoxysilane, [Methoxy(polybutenyloxy) n-propyl]tripropropoxysilane, [methoxy(polybutenyloxy)n-propyl]triacetyloxysilane, [methoxy( Polyvinyloxy)n-propyl]dimethoxymethylsilane, [methoxy(polyethyleneoxy)n-propyl]diethoxymethylsilane, [methoxy(polyethyleneoxy) n-propyl]dipropoxymethylsilane, [methoxy(polyethyleneoxy)n-propyl]diacetyloxymethylsilane,[methoxy(polypropyleneoxy)n-propyl base] dimethoxymethylsilane, [methoxy(polypropyleneoxy) n-propyl]diethoxymethylsilane, [methoxy(polypropyleneoxy)n-propyl]dipropoxy Dimethoxymethylsilane, [methoxy(polypropyleneoxy) n-propyl]diethyloxymethylsilane, [methoxy(polybutenyloxy)n-propyl]dimethoxymethylsilane Diethoxymethylsilane, [methoxy(polybutenyloxy) n-propyl]diethoxymethylsilane, [methoxy(polybutenyloxy)n-propyl]dipropoxymethylsilane, [Methoxy(polybutenyloxy)n-propyl]diacetyloxymethylsilane, etc.

作為交聯性基,只要是能夠與交聯劑反應且形成交聯構造之基即可,並無特別限定,有舉例如自由基聚合性基、環氧基、胺基等。 作為自由基聚合性基,有舉例如烯丙基、(甲基)丙烯醯基氧基等。 The crosslinkable group is not particularly limited as long as it can react with a crosslinking agent to form a crosslinked structure, and examples thereof include radical polymerizable groups, epoxy groups, and amine groups. As a radical polymerizable group, an allyl group, a (meth)acryloxy group, etc. are mentioned, for example.

作為具有自由基聚合性基之有機矽化合物,有舉例如3-丙烯醯基氧基丙基甲基二甲氧基矽烷、3-丙烯醯基氧基丙基三甲氧基矽烷、3-丙烯醯基氧基丙基甲基二乙氧矽烷、3-丙烯醯基氧基丙基三乙氧矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧矽烷、3-甲基丙烯醯氧基丙基三乙氧矽烷、8-甲基丙烯醯氧基辛基三甲氧基矽烷、10-甲基丙烯醯氧基癸基三甲氧基矽烷等。 作為具有環氧基之有機矽化合物,有舉例如3-縮水甘油基氧基丙基三甲氧基矽烷、8-縮水甘油基氧基辛基三甲氧基矽烷等。 作為具有胺基之有機矽化合物,有舉例如N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧矽烷、3-三乙氧矽烷基-N-(1,3-二甲基-亞丁基)丙基胺等。 此等亦可單獨使用1種,亦可組合2種以上來使用。 Examples of organosilicon compounds having radically polymerizable groups include 3-acryloxypropylmethyldimethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyl oxypropylmethyldiethoxysilane, 3-acryloxypropyltriethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryl Oxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 8-methacryloxyoctyl Trimethoxysilane, 10-methacryloxydecyltrimethoxysilane, etc. Examples of organosilicon compounds having epoxy groups include 3-glycidyloxypropyltrimethoxysilane and 8-glycidyloxyoctyltrimethoxysilane. Examples of organosilicon compounds with amino groups include N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, N-2-(aminoethyl)-3- Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N-(1,3-dimethyl-butylene)propylamine, etc. These may be used individually by 1 type, and may use it in combination of 2 or more types.

對核粒子之表面之有機矽化合物之鍵結量並無特別限定,但相對於核粒子,為0.1~30質量%較佳,為1~15質量%再較佳。The bonding amount of the organosilicon compound on the surface of the core particle is not particularly limited, but is preferably 0.1 to 30% by mass, more preferably 1 to 15% by mass, relative to the core particle.

無機微粒子或表面修飾無機微粒子之一次粒徑(以透過型電子顯微鏡觀察)以分散安定性、所得之膜之折射率及透明性之觀點來看,為20nm以下較佳。 無機微粒子或表面修飾無機微粒子之二次粒徑(以動態光散射法)以分散安定性、所得之薄膜之折射率及透明性之觀點來看,為2~100nm較佳,為5~50nm再較佳,為5~20nm再更較佳。 The primary particle diameter (observed by a transmission electron microscope) of the inorganic fine particles or surface-modified inorganic fine particles is preferably 20 nm or less from the viewpoints of dispersion stability, refractive index and transparency of the resulting film. The secondary particle size (by dynamic light scattering method) of inorganic fine particles or surface-modified inorganic fine particles is preferably 2-100nm, and 5-50nm from the perspective of dispersion stability, refractive index and transparency of the resulting film. More preferably, it is more preferably 5-20nm.

例如表面修飾無機微粒子能夠藉由於核粒子之水分散液或親水性有機溶媒分散液中添加特定量之有機矽化合物,以稀鹽酸等之觸媒使該有機矽化合物水解,使其鍵結於核粒子之表面而得。For example, surface-modified inorganic microparticles can add a specific amount of organosilicon compound to the aqueous dispersion of core particles or hydrophilic organic solvent dispersion, and use a catalyst such as dilute hydrochloric acid to hydrolyze the organosilicon compound to bond to the nucleus. obtained from the surface of the particle.

上述核粒子之水分散液或親水性有機溶媒分散液能夠進而取代成疏水性有機溶媒。此取代方法能夠藉由蒸餾法、超過濾法等通常之方法來行。作為疏水性溶媒之例,有舉例如甲基乙基酮、甲基異丁基酮等之酮類、環戊酮、環己酮等之環狀酮、乙酸乙酯、乙酸丁酯等之酯類。The aqueous dispersion of the core particles or the dispersion in a hydrophilic organic solvent can be further replaced by a hydrophobic organic solvent. This substitution method can be carried out by a usual method such as a distillation method or an ultrafiltration method. Examples of hydrophobic solvents include ketones such as methyl ethyl ketone and methyl isobutyl ketone, cyclic ketones such as cyclopentanone and cyclohexanone, and esters such as ethyl acetate and butyl acetate. kind.

上述核粒子之有機溶媒分散液亦可含有任意成分。尤其是藉由使其含有磷酸、磷酸衍生物、磷酸系界面活性劑、氧基羧酸等,能夠進而提升上述核粒子之分散性等。作為磷酸系衍生物,有舉例如苯基膦酸及其金屬鹽。作為磷酸系界面活性劑,有舉例如Disperbyk(BYK公司製)、Phosphanol(東邦化學工業(股)製)、Nikkol(日光Chemicals(股)製)。作為氧基羧酸,有舉例如乳酸、酒石酸、檸檬酸、葡萄糖酸、蘋果酸及乙醇酸。此等任意成分之含量相對於上述核粒子之全金屬氧化物,設為約30質量%以下較佳。The organic solvent dispersion of the aforementioned core particles may contain optional components. In particular, by containing phosphoric acid, phosphoric acid derivatives, phosphoric acid-based surfactants, oxycarboxylic acids, etc., the dispersibility of the above-mentioned core particles can be further improved. Examples of phosphoric acid derivatives include phenylphosphonic acid and metal salts thereof. Examples of the phosphoric acid-based surfactant include Disperbyk (manufactured by BYK), Phospharol (manufactured by Toho Chemical Industry Co., Ltd.), and Nikkol (manufactured by Nikko Chemicals Co., Ltd.). Examples of oxycarboxylic acids include lactic acid, tartaric acid, citric acid, gluconic acid, malic acid and glycolic acid. The content of these optional components is preferably about 30% by mass or less with respect to the full metal oxide of the above-mentioned core particles.

上述核粒子之有機溶媒分散液之濃度若考慮其分散安定性,為10~60質量%較佳,為30~50質量%再較佳。The concentration of the above-mentioned organic solvent dispersion of the core particles is preferably 10 to 60% by mass, more preferably 30 to 50% by mass, in consideration of the dispersion stability.

且,表面修飾無機微粒子之核粒子而成之無機微粒子,亦可為例如將第1金屬氧化物粒子(A)之表面以第2金屬氧化物粒子(B)來被覆而成之第3金屬氧化物粒子(C)。In addition, the surface-modified inorganic fine particles of the core particles of inorganic fine particles may be, for example, a third metal oxide particle in which the surface of the first metal oxide particle (A) is coated with the second metal oxide particle (B). matter particles (C).

第1金屬氧化物粒子(A)能夠以公知之方法,例如離子交換法、解膠法、水解法、反應法來製造。作為離子交換法之例,有舉出將選自Ti、Fe、Cu、Zn、Y、Zr、Nb、Mo、In、Sn、Sb、Ta、W、Pb、Bi及Ce所成群中至少1種金屬之酸性鹽以氫型離子交換樹脂處理之方法,或將上述金屬之鹼基性鹽以羥基型陰離子交換樹脂處理之方法。作為解膠法之例,有舉出將上述金屬之酸性鹽以鹽基中和,或藉由將上述金屬之鹼基性鹽以酸中和,再將所得之膠體洗淨後,以酸或鹼基來解膠之方法。做為水解法之例,有舉出將上述金屬之烷氧化物水解之方法,或將上述金屬之鹼基性鹽在加熱下水解後,將不必要之酸去除之方法。作為反應法之例,有舉出使上述金屬之粉末與酸反應之方法。The first metal oxide particles (A) can be produced by known methods such as ion exchange method, peptization method, hydrolysis method, and reaction method. As an example of the ion exchange method, there are examples of the ion exchange method in which at least 1 A method of treating an acidic salt of a metal with a hydrogen-type ion-exchange resin, or a method of treating a basic salt of the above metal with a hydroxyl-type anion-exchange resin. As an example of the degumming method, there are examples of neutralizing the acidic salt of the above-mentioned metals with a base, or neutralizing the basic salts of the above-mentioned metals with an acid, and then washing the resulting colloid with an acid or The method of dissolving gel by base. Examples of the hydrolysis method include a method of hydrolyzing an alkoxide of the above-mentioned metal, or a method of removing unnecessary acid after hydrolyzing a basic salt of the above-mentioned metal under heating. As an example of the reaction method, there is a method of reacting the powder of the above-mentioned metal with an acid.

第1金屬氧化物粒子(A)為原子價2~6之金屬之氧化物較佳,為選自Ti、Fe、Cu、Zn、Y、Zr、Nb、Mo、In、Sn、Sb、Ta、W、Pb、Bi、Ba、Al、Sr、Hf及Ce所成群中至少1種金屬之氧化物再較佳。作為金屬氧化物之形態,有舉例如TiO 2、Fe 2O 3、CuO、ZnO、Y 2O 3、ZrO 2、Nb 2O 5、MoO 3、In 2O 3、SnO 2、Sb 2O 5、Ta 2O 5、WO 3、PbO、Bi 2O 3、BaO、Al 2O 3、SrO、HfO 2、CeO 2等。此等之金屬氧化物亦可單獨使用1種,或組合2種以上來使用。作為組合上述金屬氧化物之方法,有舉例如混合上述金屬氧化物數種類之方法、使上述金屬氧化物複合化之方法,或將上述金屬氧化物以原子層級固溶體化之方法。 The first metal oxide particle (A) is preferably an oxide of a metal having an atomic valence of 2 to 6, and is selected from Ti, Fe, Cu, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Ta, An oxide of at least one metal in the group consisting of W, Pb, Bi, Ba, Al, Sr, Hf, and Ce is more preferred. The forms of metal oxides include, for example, TiO 2 , Fe 2 O 3 , CuO, ZnO, Y 2 O 3 , ZrO 2 , Nb 2 O 5 , MoO 3 , In 2 O 3 , SnO 2 , Sb 2 O 5 , Ta 2 O 5 , WO 3 , PbO, Bi 2 O 3 , BaO, Al 2 O 3 , SrO, HfO 2 , CeO 2 , etc. These metal oxides may be used alone or in combination of two or more. As a method of combining the above-mentioned metal oxides, there are, for example, a method of mixing several types of the above-mentioned metal oxides, a method of compounding the above-mentioned metal oxides, or a method of forming a solid solution of the above-mentioned metal oxides at the atomic level.

作為上述金屬氧化物之組合,有舉例如SnO 2粒子與TiO 2粒子在其界面產生化學性鍵結而複合化之SnO 2-TiO 2複合粒子、SnO 2粒子與WO 3粒子在其界面產生化學性鍵結而複合化之SnO 2-WO 3複合粒子、SnO 2粒子與ZrO 2粒子在其界面產生化學性鍵結而複合化之SnO 2-ZrO 2複合粒子、TiO 2與ZrO 2與SnO 2以原子層級形成固溶體所得之TiO 2-ZrO 2-SnO 2複合粒子等。 As a combination of the above-mentioned metal oxides, there are, for example, SnO 2 -TiO 2 composite particles in which SnO 2 particles and TiO 2 particles are chemically bonded at the interface, and SnO 2 particles and WO 3 particles are chemically bonded at the interface. SnO 2 -WO 3 composite particles that are chemically bonded and composited, SnO 2 -ZrO 2 composite particles that are chemically bonded and composited at the interface between SnO 2 particles and ZrO 2 particles, TiO 2 and ZrO 2 and SnO 2 TiO 2 -ZrO 2 -SnO 2 composite particles obtained by forming a solid solution at the atomic level, etc.

且,第1金屬氧化物粒子(A)因金屬成分之組合,能夠作為化合物來使用,有舉例如ZnSb 2O 6、InSbO 4、ZnSnO 3、錫摻雜氧化銦(ITO)、In 2O 3-ZnO、BaTiO 3、SrTiO 3、鋁摻雜氧化鋅等。 Furthermore, the first metal oxide particle (A) can be used as a compound due to the combination of metal components, such as ZnSb 2 O 6 , InSbO 4 , ZnSnO 3 , tin-doped indium oxide (ITO), In 2 O 3 -ZnO, BaTiO 3 , SrTiO 3 , aluminum-doped zinc oxide, etc.

第1金屬氧化物粒子(A)包含TiO 2時,作為該粒子中包含之TiO 2,亦可為具有銳鈦礦型、金紅石型、銳鈦礦・金紅石混合型、板鈦礦型之任一種結晶構造者,但此等之中,若考慮所得之薄膜之折射率及透明性,為金紅石型較佳。 When the first metal oxide particles (A) contain TiO 2 , the TiO 2 contained in the particles may have anatase type, rutile type, anatase/rutile mixed type, or brookite type. Any type of crystal structure, but among these, the rutile type is preferable in consideration of the refractive index and transparency of the obtained thin film.

進而,上述第1金屬氧化物粒子(A),以抑制其活性(例如光觸媒性能)之觀點來看,亦可在其表面形成含有氧化鋯、氧化矽、氧化鋁等之金屬氧化物之薄膜層。上述薄膜層能夠藉由例如於第1金屬氧化物粒子(A)之水分散液中添加鋯化合物,以40~200℃加熱後來形成。作為上述鋯化合物,有舉例如氧基氯化鋯、氯化鋯、羥化鋯、硫酸鋯、硝酸鋯、氧基硝酸鋯、乙酸鋯、碳酸鋯、碳酸鋯銨、碳酸鋯鉀、乙基己烷酸鋯、硬脂酸鋯、辛基酸鋯、乙氧化鋯、n-丙氧化鋯、異丙氧化鋯、n-丁氧化鋯、異丙氧化鋯、t-丁氧化鋯、鋯四乙醯基丙酮酸酯等,為氧基氯化鋯較佳。上述氧化鋯化合物之使用量,作為氧化鋯,相對於使用之第1金屬氧化物粒子(A),較佳為3~50質量%。Furthermore, the above-mentioned first metal oxide particle (A), from the viewpoint of suppressing its activity (such as photocatalytic performance), may also form a thin film layer containing metal oxides such as zirconia, silicon oxide, aluminum oxide, etc. on its surface . The above-mentioned thin film layer can be formed, for example, by adding a zirconium compound to an aqueous dispersion of the first metal oxide particle (A) and heating at 40 to 200°C. Examples of the aforementioned zirconium compounds include zirconium oxychloride, zirconium chloride, zirconium hydroxide, zirconium sulfate, zirconium nitrate, zirconium oxynitrate, zirconium acetate, zirconium carbonate, ammonium zirconium carbonate, potassium zirconium carbonate, ethylhexyl Zirconium alkanoate, zirconium stearate, zirconium octylate, zirconium ethoxide, n-propoxide, zirconium isopropoxide, zirconium n-butoxide, zirconium isopropoxide, zirconium t-butoxide, zirconium tetraacetyl oxypyruvate, etc., preferably zirconium oxychloride. The usage-amount of the said zirconia compound is preferably 3-50 mass % with respect to the 1st metal oxide particle (A) used as zirconia.

第1金屬氧化物粒子(A)之一次粒徑(以透過型電子顯微鏡觀察),以分散安定性、所得之薄膜之折射率及透明性之觀點來看,為2~60nm較佳,為2~30nm再較佳,為2~20nm特別佳。 第1金屬氧化物粒子(A)之二次粒徑之動態光散射法粒徑(以動態光散射法),以分散安定性、所得之薄膜之折射率及透明性之觀點來看,為5~100nm較佳,為5~50nm再較佳,為5~30nm特別佳。 The primary particle size of the first metal oxide particle (A) (observed by a transmission electron microscope) is preferably 2 to 60 nm from the viewpoint of dispersion stability, refractive index and transparency of the obtained thin film, and is 2 ~30nm is even better, especially 2~20nm. The dynamic light scattering method particle size (by dynamic light scattering method) of the secondary particle size of the first metal oxide particle (A) is 5 from the viewpoint of dispersion stability, refractive index and transparency of the obtained thin film. ~100nm is better, 5~50nm is more preferable, and 5~30nm is especially preferable.

且,第1金屬氧化物粒子(A)能夠根據例如國際公開第2013/081136號中記載之方法來合成。In addition, the first metal oxide particles (A) can be synthesized by, for example, the method described in International Publication No. 2013/081136.

第2金屬氧化物粒子(B)為選自Si、Al、Sn、Zr、Mo、Sb及W所成群中至少1種金屬之氧化物粒子較佳。第2金屬氧化物粒子(B),作為金屬氧化物之形態,能夠例示例如SiO 2、Al 2O 3、SnO 2、ZrO 2、MoO 3、Sb 2O 5、WO 3等。且,此等之金屬氧化物亦可單獨使用1種,或組合2種以上來使用。作為組合上述金屬氧化物之方法,有舉例如混合上述金屬氧化物數種類之方法、使上述金屬氧化物複合化之方法,或將上述金屬氧化物以原子層級固溶體化之方法。 The second metal oxide particles (B) are preferably oxide particles of at least one metal selected from the group consisting of Si, Al, Sn, Zr, Mo, Sb, and W. The second metal oxide particle (B) may, for example, be SiO 2 , Al 2 O 3 , SnO 2 , ZrO 2 , MoO 3 , Sb 2 O 5 , WO 3 or the like as the form of the metal oxide. In addition, these metal oxides may be used alone or in combination of two or more. As a method of combining the above-mentioned metal oxides, there are, for example, a method of mixing several types of the above-mentioned metal oxides, a method of compounding the above-mentioned metal oxides, or a method of forming a solid solution of the above-mentioned metal oxides at the atomic level.

作為第2金屬氧化物粒子(B)之具體例,有舉例如SnO 2粒子與WO 3粒子在其界面產生化學性鍵結而複合化之SnO 2-WO 3複合粒子、SnO 2粒子與SiO 2粒子在其界面產生化學性鍵結而複合化之SnO 2-SiO 2複合粒子、SnO 2粒子與WO 3粒子與SiO 2粒子在其界面產生化學性鍵結而複合化之SnO 2-WO 3-SiO 2複合粒子、SnO 2粒子與MoO 3粒子與SiO 2粒子在其界面產生化學性鍵結而複合化之SnO 2-MoO 3-SiO 2複合粒子、Sb 2O 5粒子與SiO 2粒子在其界面產生化學性鍵結而複合化之Sb 2O 5-SiO 2複合粒子等。 Specific examples of the second metal oxide particles (B) include SnO 2 -WO 3 composite particles in which SnO 2 particles and WO 3 particles are chemically bonded at the interface, and SnO 2 particles and SiO 2 SnO 2 -SiO 2 composite particles that are chemically bonded at the interface of the particles, SnO 2 -WO 3 - SiO 2 composite particles, SnO 2 -MoO 3 -SiO 2 composite particles, SnO 2 -MoO 3 -SiO 2 composite particles, Sb 2 O 5 particles and SiO 2 particles in which chemical bonding occurs between SnO 2 particles and MoO 3 particles and SiO 2 particles Sb 2 O 5 -SiO 2 composite particles that are chemically bonded and composited at the interface.

作為第2金屬氧化物粒子(B),使用複數種金屬氧化物時,含有之金屬氧化物之比例(質量比)並無特別限制,但為例如SnO 2-SiO 2複合粒子中,SiO 2/SnO 2之質量比為0.1~5較佳,Sb 2O 5-SiO 2複合粒子中,Sb 2O 5/SiO 2之質量比為0.1~5較佳。 When a plurality of metal oxides are used as the second metal oxide particles (B), the ratio (mass ratio) of the metal oxides contained is not particularly limited, but for example, in SnO 2 -SiO 2 composite particles, SiO 2 / The mass ratio of SnO 2 is preferably 0.1-5, and in the Sb 2 O 5 -SiO 2 composite particles, the mass ratio of Sb 2 O 5 /SiO 2 is preferably 0.1-5.

第2金屬氧化物粒子(B)能夠以公知之方法,例如離子交換法、解膠法、氧化法來製造。作為離子交換法之例,有舉出將上述金屬之酸性鹽以氫型離子交換樹脂處理之方法。作為氧化法之例,有舉出使上述金屬或上述金屬之氧化物之粉末與過氧化氫反應之方法。The second metal oxide particle (B) can be produced by a known method, for example, an ion exchange method, a peptization method, or an oxidation method. As an example of the ion exchange method, there is a method of treating an acidic salt of the above-mentioned metal with a hydrogen-form ion exchange resin. As an example of the oxidation method, there is a method of reacting the powder of the above-mentioned metal or the oxide of the above-mentioned metal with hydrogen peroxide.

第2金屬氧化物粒子(B)之一次粒徑(以透過型電子顯微鏡觀察),以分散安定性、所得之薄膜之折射率及透明性之觀點來看,為5nm以下較佳,為1~5nm再較佳。The primary particle size of the second metal oxide particle (B) (observed by a transmission electron microscope) is preferably 5 nm or less from the viewpoint of dispersion stability, refractive index and transparency of the obtained thin film, and is 1 to 5 nm. 5nm is even better.

第3金屬氧化物粒子(C)為將第1金屬氧化物粒子(A)之表面以第2金屬氧化物粒子(B)被覆所得之金屬氧化物粒子。作為其製造方法,有舉例如下述第1方法及第2方法。The third metal oxide particle (C) is a metal oxide particle obtained by coating the surface of the first metal oxide particle (A) with the second metal oxide particle (B). As its production method, there are, for example, the following first method and second method.

第1方法為將含有第1金屬氧化物粒子(A)之水分散液與含有第2金屬氧化物粒子(B)之水分散液混合,使(B)/(A)表示之質量比(金屬氧化物換算值)成為0.05~0.5後,加熱其水分散液之方法。例如將含有第1金屬氧化物粒子(A)之水分散液與含有作為第2金屬氧化物粒子(B)之Sb 2O 5-SiO 2複合粒子(Sb 2O 5/SiO 2=0.1~5)之水分散液混合,使上述質量比成為0.05~0.5,並藉由將混合所得之水分散液加熱至70~350℃,得到第1金屬氧化物粒子(A)之表面經Sb 2O 5-SiO 2複合粒子被覆之第3金屬氧化物粒子(C)之水分散液。 The first method is to mix the aqueous dispersion containing the first metal oxide particles (A) with the aqueous dispersion containing the second metal oxide particles (B), so that the mass ratio represented by (B)/(A) (metal A method of heating the aqueous dispersion after the oxide conversion value) becomes 0.05~0.5. For example, an aqueous dispersion containing the first metal oxide particles (A) and Sb 2 O 5 -SiO 2 composite particles (Sb 2 O 5 /SiO 2 =0.1~5 ) water dispersion, so that the above mass ratio becomes 0.05~0.5, and by heating the mixed aqueous dispersion to 70~350°C, the surface of the first metal oxide particle (A) is coated with Sb 2 O 5 - an aqueous dispersion of the third metal oxide particles (C) coated with SiO 2 composite particles.

第2方法係將含有第1金屬氧化物粒子(A)之水分散液與作為第2金屬氧化物粒子(B)之水溶性氧化錫鹼鹽與氧化矽鹼鹽混合,使SnO 2/SiO 2表示之質量比(金屬氧化物換算值)成為0.1~5後,進行陽離子交換,去除鹼金屬離子,與所得SnO 2-SiO 2複合粒子之水分散液混合,使(B)/(A)表示之質量比(金屬氧化物換算值)成為0.05~0.5後,將混合所得之水分散液加熱之方法。此第2方法使用之水溶性鹼鹽之水溶液能夠較佳使用鈉鹽之水溶液。例如將含有第1金屬氧化物粒子(A)之水分散液與作為第2金屬氧化物粒子(B)之錫酸鈉與矽酸鈉之水溶液混合後,進行陽離子交換,與所得之SnO 2-SiO 2複合粒子之水分散液混合,使上述質量比成為0.05~0.5,將該水分散液以70~350℃加熱,得到將第1金屬氧化物粒子(A)作為核,且將其表面經含有SnO 2-SiO 2複合粒子之第2金屬氧化物粒子(B)被覆之第3金屬氧化物粒子(C)之水分散液。 The second method is to mix the aqueous dispersion containing the first metal oxide particles (A) with the water-soluble alkali salt of tin oxide and alkali salt of silicon oxide as the second metal oxide particles (B), and make the SnO 2 /SiO 2 After the expressed mass ratio (converted value of metal oxide) becomes 0.1~5, perform cation exchange to remove alkali metal ions, and mix with the obtained aqueous dispersion of SnO 2 -SiO 2 composite particles to express (B)/(A) After the mass ratio (converted value of metal oxide) becomes 0.05~0.5, the method of heating the aqueous dispersion obtained by mixing. The aqueous solution of the water-soluble alkali salt used in this second method can preferably use the aqueous solution of the sodium salt. For example, after mixing the aqueous dispersion containing the first metal oxide particles (A) and the aqueous solution of sodium stannate and sodium silicate as the second metal oxide particles (B), cation exchange is performed, and the obtained SnO 2 - The aqueous dispersion of SiO 2 composite particles is mixed so that the above-mentioned mass ratio becomes 0.05~0.5, and the aqueous dispersion is heated at 70~350°C to obtain the first metal oxide particle (A) as the nucleus, and its surface is treated with Aqueous dispersion of third metal oxide particles (C) coated with second metal oxide particles (B) containing SnO 2 -SiO 2 composite particles.

混合上述第1金屬氧化物粒子(A)與上述第2金屬氧化物粒子(B)時之溫度,通常為1~100℃,為20~60℃較佳。且混合後之加熱溫度為70~350℃較佳,為70~150℃再較佳。且,混合後之加熱時間通常為10分鐘~5小時,為30分鐘~4小時較佳。The temperature for mixing the first metal oxide particles (A) and the second metal oxide particles (B) is usually 1 to 100°C, preferably 20 to 60°C. Moreover, the heating temperature after mixing is preferably 70-350°C, more preferably 70-150°C. Moreover, the heating time after mixing is usually 10 minutes to 5 hours, preferably 30 minutes to 4 hours.

上述第3金屬氧化物粒子(C)之水分散液亦可含有任意成分。尤其是,使其含有氧基羧酸類,能夠更提升第3金屬氧化物粒子(C)之分散性等知性能。作為上述氧基羧酸,有舉例如乳酸、酒石酸、檸檬酸、葡萄糖酸、蘋果酸及乙醇酸。上述氧基羧酸類之含量,相對於第3金屬氧化物粒子(C)之全金屬氧化物,為約30質量%以下較佳。The aqueous dispersion of the third metal oxide particles (C) may contain optional components. In particular, by including oxycarboxylic acids, intellectual properties such as dispersibility of the third metal oxide particles (C) can be further improved. Examples of the oxycarboxylic acid include lactic acid, tartaric acid, citric acid, gluconic acid, malic acid and glycolic acid. The content of the above-mentioned oxycarboxylic acids is preferably about 30% by mass or less with respect to the total metal oxide of the third metal oxide particle (C).

且,作為第3金屬氧化物粒子(C)之分散液,亦可含有鹼成分。作為上述鹼成分,有舉例如Li、Na、K、Rb、Cs等之鹼金屬羥化物;銨;乙基胺、異丙基胺、n-丙基胺、n-丁基胺、二乙基胺、二-n-丙基胺、二異丙基胺、二-n-丁基胺、二異丁基胺、三乙基胺、三丙基胺、三丁基胺、三異丁基胺、三戊基胺(三-n-戊基胺)、三-n-己基胺、三-n-辛基胺、二甲基丙基胺、二甲基丁基胺、二甲基己基胺等之一級、二級及三級烷基胺;苄基胺、二甲基苄基胺等之芳烷基胺;哌啶等之脂環式胺;單乙醇胺、三乙醇胺等之烷醇胺;羥化四甲基銨羥、羥化四乙基銨、羥化四丙基銨等之四級銨鹽。此等亦可單獨使用1種,或組合2種以上來使用。上述鹼成分之含量,相對於第3金屬氧化物粒子(C)之全金屬氧化物,為約30質量%以下較佳。且,此等之鹼成分能夠與上述氧基羧酸併用。Moreover, as a dispersion liquid of the 3rd metal oxide particle (C), you may contain an alkali component. As the above-mentioned alkali component, there are alkali metal hydroxides such as Li, Na, K, Rb, Cs, etc.; ammonium; ethylamine, isopropylamine, n-propylamine, n-butylamine, diethylamine, Amine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, triethylamine, tripropylamine, tributylamine, triisobutylamine , tripentylamine (tri-n-pentylamine), tri-n-hexylamine, tri-n-octylamine, dimethylpropylamine, dimethylbutylamine, dimethylhexylamine, etc. Primary, secondary and tertiary alkylamines; aralkylamines such as benzylamine and dimethylbenzylamine; alicyclic amines such as piperidine; alkanolamines such as monoethanolamine and triethanolamine; Quaternary ammonium salts such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, etc. These can also be used individually by 1 type, or in combination of 2 or more types. The content of the alkali component is preferably about 30% by mass or less with respect to the total metal oxide of the third metal oxide particle (C). And, these alkali components can be used together with the above-mentioned oxycarboxylic acid.

欲更提高第3金屬氧化物粒子(C)之水分散液之濃度時,能夠以一般方法濃縮至最大約65質量%。作為其方法,有舉例如蒸發法、超過濾法。且,欲調整此水分散液之pH值時,添加上述鹼金屬羥化物、胺、四級銨鹽、氧基羧酸等即可。 第3金屬氧化物粒子(C)之溶媒分散液之全金屬氧化物濃度較佳為10~60質量%,再較佳為20~50質量%。 When it is desired to further increase the concentration of the aqueous dispersion of the third metal oxide particles (C), it can be concentrated to a maximum of about 65% by mass by a common method. As the method, there are, for example, an evaporation method and an ultrafiltration method. And, when it is desired to adjust the pH of the aqueous dispersion, the above-mentioned alkali metal hydroxides, amines, quaternary ammonium salts, oxycarboxylic acids, etc. may be added. The concentration of all metal oxides in the solvent dispersion liquid of the third metal oxide particle (C) is preferably 10 to 60% by mass, more preferably 20 to 50% by mass.

相對於第3金屬氧化物粒子(C)之水分散液,藉由將其水媒體以親水性有機溶媒來取代,能夠得到第3金屬氧化物粒子(C)之有機溶媒分散液。此取代能夠藉由蒸餾法、超過濾法等之通常方法來進行。作為上述親水性有機溶媒,有舉例如甲醇、乙醇、異丙醇及1-丙醇等之低級醇、丙二醇單甲基醚等之醚類、二甲基甲醯胺及N,N’-二甲基乙醯胺等之直鏈醯胺類、N-甲基-2-吡咯烷酮等之環狀醯胺類、乙基賽珞蘇及乙二醇等之二醇類。An organic solvent dispersion of the third metal oxide particles (C) can be obtained by substituting the aqueous medium for the aqueous dispersion of the third metal oxide particles (C) with a hydrophilic organic solvent. This substitution can be performed by ordinary methods such as distillation and ultrafiltration. Examples of the above-mentioned hydrophilic organic solvent include lower alcohols such as methanol, ethanol, isopropanol, and 1-propanol, ethers such as propylene glycol monomethyl ether, dimethylformamide, and N,N'-dimethoxy Straight-chain amides such as methylacetamide, cyclic amides such as N-methyl-2-pyrrolidone, diols such as ethyl cellophane and ethylene glycol.

第3金屬氧化物粒子(C)之一次粒徑(以透過型電子顯微鏡觀察),以分散安定性、所得之膜之折射率及透明性之觀點來看,為20nm以下較佳。 第3金屬氧化物粒子(C)之二次粒徑之動態光散射法粒徑(以動態光散射法),以分散安定性、所得之薄膜之折射率及透明性之觀點來看,為2~100nm較佳。 The primary particle size (observed by a transmission electron microscope) of the third metal oxide particles (C) is preferably 20 nm or less from the viewpoints of dispersion stability, refractive index and transparency of the obtained film. The dynamic light scattering method particle size (by dynamic light scattering method) of the secondary particle size of the third metal oxide particle (C) is 2 from the viewpoint of dispersion stability, refractive index and transparency of the obtained thin film. ~100nm is preferred.

作為無機微粒子之折射率,並無特別限定,但以不使所得之膜之折射率降低之觀點來看,為1.6~2.6較佳,為1.8~2.6再較佳。無機微粒子之折射率能夠藉由例如將分散至折射率為已知之溶媒或樹脂之無機微粒子之液體以阿貝折射計測定折射率,自其值外插之方法,或者將含有無機微粒子之膜或硬化物以阿貝折射計或分光橢偏儀測定折射率,自其值外插之方法來測定。The refractive index of the inorganic fine particles is not particularly limited, but is preferably 1.6 to 2.6, more preferably 1.8 to 2.6, from the viewpoint of not lowering the refractive index of the obtained film. The refractive index of the inorganic microparticles can be obtained by, for example, measuring the refractive index with an Abbe refractometer in a liquid dispersed in inorganic microparticles in a solvent or resin whose refractive index is known, or by extrapolating the value of the film containing the inorganic microparticles or The cured product is measured by Abbe refractometer or spectroscopic ellipsometer and extrapolated from its value.

作為組成物中無機微粒子之含量,在所得之最後組成物中,只要在不損害其分散性之範圍內即可,能夠依照製作之膜之目的之折射率、透過率、耐熱性等來控制。例如相對於含三嗪環之聚合物100質量份,能夠在0.1~1,000質量份之範圍內添加,較佳為1~500質量份,以保持膜質且得到安定之折射率及耐溶劑性之觀點來看,再較佳為10~300質量份。The content of inorganic fine particles in the composition can be controlled in accordance with the target refractive index, transmittance, heat resistance, etc. of the film to be produced as long as it is within the range that does not impair the dispersibility of the final composition obtained. For example, it can be added in the range of 0.1 to 1,000 parts by mass, preferably 1 to 500 parts by mass, relative to 100 parts by mass of the triazine ring-containing polymer, in order to maintain film quality and obtain stable refractive index and solvent resistance. From the point of view, it is more preferably 10 to 300 parts by mass.

(4).有機溶媒 作為有機溶媒,有舉例如甲苯、p-二甲苯、o-二甲苯、m-二甲苯、乙基苯、苯乙烯、乙二醇二甲基醚、丙二醇單甲基醚、乙二醇單甲基醚、丙二醇、丙二醇單乙基醚、乙二醇單乙基醚、乙二醇單異丙基醚、乙二醇單甲基醚乙酸酯、丙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、二乙二醇二甲基醚、丙二醇單丁基醚、乙二醇單丁基醚、二乙二醇二乙基醚、二丙二醇單甲基醚、二乙二醇單甲基醚、二丙二醇單乙基醚、二乙二醇單乙基醚、三乙二醇二甲基醚、二乙二醇單乙基醚乙酸酯、二乙二醇、1-辛醇、乙二醇、戊二醇、三亞甲基二醇、1-甲氧基-2-丁醇、環己醇、二丙酮醇、糠醇、四氫糠醇、丙二醇、苄醇、1,3-丁烷二醇、1,4-丁烷二醇、2,3-丁烷二醇、γ-丁內酯、丙酮、甲基乙基酮、甲基異丙基酮、二乙基酮、甲基異丁基酮、甲基n-丁基酮、環戊酮、環己酮、乙酸乙酯、乙酸異丙酯、乙酸n-丙酯、乙酸異丁酯、乙酸n-丁酯、乳酸乙酯、甲醇、乙醇、異丙醇、tert-丁醇、烯丙醇、n-丙醇、2-甲基-2-丁醇、異丁醇、n-丁醇、2-甲基-1-丁醇、1-戊醇、2-甲基-1-戊醇、2-乙基己醇、1-甲氧基-2-丙醇、四氫呋喃、1,4-二氧雜環、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺(DMAc)、N-甲基-2-吡咯烷酮、1,3-二甲基-2-四氫咪唑酮、二甲基亞碸、N-環己基-2-吡咯啶酮等,此等亦可單獨使用,亦可混合2種以上來使用。 (4).Organic solvent Examples of organic solvents include toluene, p-xylene, o-xylene, m-xylene, ethylbenzene, styrene, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, and Ethyl ether, propylene glycol, propylene glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol Alcohol monoethyl ether acetate, diethylene glycol dimethyl ether, propylene glycol monobutyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, dipropylene glycol monomethyl ether, diethylene glycol Glycol monomethyl ether, dipropylene glycol monoethyl ether, diethylene glycol monoethyl ether, triethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol, 1 -octanol, ethylene glycol, pentylene glycol, trimethylene glycol, 1-methoxy-2-butanol, cyclohexanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, propylene glycol, benzyl alcohol, 1, 3-butanediol, 1,4-butanediol, 2,3-butanediol, γ-butyrolactone, acetone, methyl ethyl ketone, methyl isopropyl ketone, diethyl ketone , methyl isobutyl ketone, methyl n-butyl ketone, cyclopentanone, cyclohexanone, ethyl acetate, isopropyl acetate, n-propyl acetate, isobutyl acetate, n-butyl acetate, Ethyl lactate, methanol, ethanol, isopropanol, tert-butanol, allyl alcohol, n-propanol, 2-methyl-2-butanol, isobutanol, n-butanol, 2-methyl- 1-butanol, 1-pentanol, 2-methyl-1-pentanol, 2-ethylhexanol, 1-methoxy-2-propanol, tetrahydrofuran, 1,4-dioxane, N , N-dimethylformamide, N,N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidone, 1,3-dimethyl-2-tetrahydroimidazolone, dimethyl Gyridine, N-cyclohexyl-2-pyrrolidone, and the like may be used alone or in combination of two or more.

如上述,本發明之含三嗪環之聚合物由於對有機溶媒之溶解性較優異,故充分溶解於乙二醇單甲基醚乙酸酯、丙二醇單甲基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二乙二醇單乙基醚乙酸酯等之二醇酯系溶媒;丙酮、甲基乙基酮、甲基異丁基酮、二異丁基酮、環戊酮、環己酮、二丙酮醇等之酮系溶媒;乙酸乙酯、乙酸甲酯、乙酸丁酯、乙酸甲氧基丁酯、乙酸賽珞蘇、乙酸戊酯、乙酸n-丙酯、乙酸異丙酯、乳酸甲酯、乳酸乙酯、乳酸丁酯等之酯系溶媒,特別適合用在需要此等溶媒之部位上形成薄膜時。As mentioned above, the triazine ring-containing polymer of the present invention has excellent solubility in organic solvents, so it is fully soluble in ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether acetate, and diethylene glycol monomethyl ether acetate. Glycol ester solvents such as alcohol monobutyl ether acetate and diethylene glycol monoethyl ether acetate; acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclic Ketone-based solvents such as pentanone, cyclohexanone, and diacetone alcohol; ethyl acetate, methyl acetate, butyl acetate, methoxybutyl acetate, celloxuloacetate, amyl acetate, n-propyl acetate, Ester-based solvents such as isopropyl acetate, methyl lactate, ethyl lactate, and butyl lactate are especially suitable for forming films on parts that require such solvents.

此時,組成物中之固形分濃度只要在不影響保存安定性之範圍內即可,並無特別限定,可因應目的之膜之厚度來適當地設定。具體來說,以溶解性及保存安定性之觀點來看,為固形分濃度0.1~50質量%較佳,再較佳為0.1~40質量%。At this time, the solid content concentration in the composition is not particularly limited as long as it is within a range that does not affect the storage stability, and can be appropriately set according to the thickness of the intended film. Specifically, from the viewpoint of solubility and storage stability, the solid content concentration is preferably 0.1 to 50% by mass, and more preferably 0.1 to 40% by mass.

本發明之組成物中亦能夠摻混因應各自交聯劑之起始劑。且,如上述,作為交聯劑,使用多官能環氧化合物及/或多官能(甲基)丙烯酸化合物時,不使用起始劑也能夠進行光硬化,並賦予硬化膜,但此時使用起始劑也無妨。Initiators corresponding to respective crosslinking agents can also be blended into the composition of the present invention. And, as mentioned above, when a multifunctional epoxy compound and/or a multifunctional (meth)acrylic compound is used as a crosslinking agent, photocuring can be performed without using an initiator, and a cured film can be provided. The starter is okay too.

將多官能環氧化合物作為交聯劑使用時,能夠使用光酸產生劑或光鹼基產生劑。 作為光酸產生劑,只要從公知中適當地選擇來使用即可,能夠使用例如重氮鹽、鋶鹽或錪鹽等之鎓鹽衍生物。 作為其具體例,有舉出苯基重氮六氟磷酸酯、4-甲氧基苯基重氮六氟銻酸酯、4-甲基苯基重氮六氟磷酸酯等之芳基重氮鹽;二苯基錪鎓六氟銻酸酯、雙(4-甲基苯基)錪鎓六氟磷酸酯、雙(4-tert-丁基苯基)錪鎓六氟磷酸酯等之二芳基錪鹽;三苯基鋶六氟銻酸酯、參(4-甲氧基苯基)鋶六氟磷酸酯、二苯基-4-硫基苯氧基苯基鋶六氟銻酸酯、二苯基-4-硫基苯氧基苯基鋶六氟磷酸酯、4,4’-雙(二苯基二氫硫基)苯基硫醚-雙六氟銻酸酯、4,4’-雙(二苯基二氫硫基)苯基硫醚-雙六氟磷酸酯、4,4’-雙[二(β-羥基乙氧)苯基二氫硫基]苯基硫醚-雙六氟銻酸酯、4,4’-雙[二(β-羥基乙氧)苯基二氫硫基]苯基硫醚-雙-六氟磷酸酯、4-[4’-(苯甲醯基)苯基硫基]苯基-二(4-氟苯基)鋶六氟銻酸酯、4-[4’-(苯甲醯基)苯基硫基]苯基-雙(4-氟苯基)鋶六氟磷酸酯等之三芳基鋶鹽等。 When using a polyfunctional epoxy compound as a crosslinking agent, a photoacid generator or a photobase generator can be used. As a photoacid generator, what is necessary is just to select and use from well-known thing suitably, for example, the onium salt derivatives, such as a diazonium salt, a permeicium salt, or an indium salt, can be used. Specific examples thereof include aryl diazonium diazides such as phenyldiazohexafluorophosphate, 4-methoxyphenyldiazohexafluoroantimonate, and 4-methylphenyldiazohexafluorophosphate. Salt; Diaryl of diphenyliodonium hexafluoroantimonate, bis(4-methylphenyl)iodonium hexafluorophosphate, bis(4-tert-butylphenyl)iodonium hexafluorophosphate, etc. Base salt; triphenyl percited hexafluoroantimonate, ginseng (4-methoxyphenyl) percited hexafluorophosphate, diphenyl-4-thiophenoxyphenyl percited hexafluoroantimonate, Diphenyl-4-thiophenoxyphenyl percolium hexafluorophosphate, 4,4'-bis(diphenyldihydrothio)phenylsulfide-bishexafluoroantimonate, 4,4' -Bis(diphenylthio)phenylsulfide-bishexafluorophosphate, 4,4'-bis[bis(β-hydroxyethoxy)phenylthio]phenylsulfide-bis Hexafluoroantimonate, 4,4'-bis[bis(β-hydroxyethoxy)phenyldihydrothio]phenylsulfide-bis-hexafluorophosphate, 4-[4'-(benzoyl Base) phenylthio] phenyl-bis(4-fluorophenyl) percite hexafluoroantimonate, 4-[4'-(benzoyl)phenylthio]phenyl-bis(4-fluoro Phenyl) percited hexafluorophosphate and other triaryl percited salts, etc.

此等之鎓鹽亦可使用市售品,作為其具體例,能夠舉出SAN-AID SI-60、SI-80、SI-100、SI-60L、SI-80L、SI-100L、SI-L145、SI-L150、SI-L160、SI-L110、SI-L147(以上為三新化學工業(股)製)、UVI-6950、UVI-6970、UVI-6974、UVI-6990、UVI-6992(以上為Union Carbide公司製)、CPI-100P、CPI-100A、CPI-200K、CPI-200S(以上為SAN-APRO(股)製)、Adekaoptomer SP-150、SP-151、SP-170、SP-171(以上為旭電化工業(股)製)、Irgacure 261(BASF公司製)、CI-2481、CI-2624、CI-2639、CI-2064(以上為日本曹達(股)製)、CD-1010、CD-1011、CD-1012(以上為SARTOMER公司製)、DS-100、DS-101、DAM-101、DAM-102、DAM-105、DAM-201、DSM-301、NAI-100、NAI-101、NAI-105、NAI-106、SI-100、SI-101、SI-105、SI-106、PI-105、NDI-105、BENZOIN TOSYLATE、MBZ-101、MBZ-301、PYR-100、PYR-200、DNB-101、NB-101、NB-201、BBI-101、BBI-102、BBI-103、BBI-109(以上為Midori化學(股)製)、PCI-061T、PCI-062T、PCI-020T、PCI-022T (以上為日本化藥(股)製)、IBPF、IBCF(三和Chemical(股)製)等。These onium salts can also be commercially available, and specific examples thereof include SAN-AID SI-60, SI-80, SI-100, SI-60L, SI-80L, SI-100L, and SI-L145 . Made by Union Carbide Co., Ltd.), CPI-100P, CPI-100A, CPI-200K, CPI-200S (the above are made by SAN-APRO Co., Ltd.), Adekaoptomer SP-150, SP-151, SP-170, SP-171 (The above are made by Asahi Denka Co., Ltd.), Irgacure 261 (manufactured by BASF Corporation), CI-2481, CI-2624, CI-2639, CI-2064 (the above are made by Nippon Soda Co., Ltd.), CD-1010, CD-1011, CD-1012 (the above are made by SARTOMER), DS-100, DS-101, DAM-101, DAM-102, DAM-105, DAM-201, DSM-301, NAI-100, NAI-101 , NAI-105, NAI-106, SI-100, SI-101, SI-105, SI-106, PI-105, NDI-105, BENZOIN TOSYLATE, MBZ-101, MBZ-301, PYR-100, PYR- 200, DNB-101, NB-101, NB-201, BBI-101, BBI-102, BBI-103, BBI-109 (the above are made by Midori Chemical Co., Ltd.), PCI-061T, PCI-062T, PCI- 020T, PCI-022T (manufactured by Nippon Kayaku Co., Ltd.), IBPF, IBCF (manufactured by Sanwa Chemical Co., Ltd.), etc.

另一方面,作為光鹼基產生劑,自公知者中適當地選擇來使用即可,能夠使用例如Co-胺錯合物系、肟羧酸酯系、胺甲酸酯系、四級銨鹽系光鹽基產生劑等。 作為其具體例,有舉出2-硝基苄基環己基氨基甲酸酯、三苯基甲醇、O-胺甲醯基羥基醯胺、O-胺甲醯基肟、[[(2,6-二硝基苄基)氧基]羰基]環己基胺、雙[[(2-硝基苄基)氧基]羰基]己烷1,6-二胺、4-(甲基硫基苯甲醯基)-1-甲基-1-嗎啉基乙烷、(4-嗎啉基苯甲醯基)-1-苄基-1-二甲基胺基丙烷、N-(2-硝基苄基氧基羰基)吡咯啶、六氨鈷(III)參(三苯基甲基硼酸酯)、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮、2,6-二甲基-3,5-二乙醯基-4-(2’-硝基苯基)-1,4-二氫吡啶、2,6-二甲基-3,5-二乙醯基-4-(2’,4’-二硝基苯基)-1,4-二氫吡啶等。 且,光鹽基產生劑亦可使用市售品,作為其具體例,有舉出TPS-OH、NBC-101、ANC-101(皆為製品名,Midori化學(股)製)等。 On the other hand, what is necessary is just to use as a photobase generator suitably selected from well-known persons, for example, can use Co-amine complex system, oxime carboxylate system, carbamate system, quaternary ammonium salt It is a photobase generator, etc. Specific examples thereof include 2-nitrobenzylcyclohexyl carbamate, triphenylmethanol, O-carbamoyl hydroxyamide, O-carbamoyl oxime, [[(2,6 -Dinitrobenzyl)oxy]carbonyl]cyclohexylamine, bis[[(2-nitrobenzyl)oxy]carbonyl]hexane 1,6-diamine, 4-(methylthiobenzyl Acyl)-1-methyl-1-morpholinoethane, (4-morpholinobenzoyl)-1-benzyl-1-dimethylaminopropane, N-(2-nitro Benzyloxycarbonyl)pyrrolidine, hexaammonocobalt (III) ginseng (triphenylmethyl borate), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl )-butanone, 2,6-dimethyl-3,5-diacetyl-4-(2'-nitrophenyl)-1,4-dihydropyridine, 2,6-dimethyl- 3,5-Diacetyl-4-(2',4'-dinitrophenyl)-1,4-dihydropyridine, etc. Moreover, a commercial item can also be used for a photobase generator, and TPS-OH, NBC-101, ANC-101 (all are product names, manufactured by Midori Chemical Co., Ltd.) etc. are mentioned as a specific example.

使用光酸或鹼基產生劑時,相對於多官能環氧化合物100質量份,在0.1~15質量份之範圍內使用較佳,再較佳為1~10質量份之範圍。 且,因應必要,亦可將環氧樹脂硬化劑以相對於多官能環氧化合物100質量份,為1~100質量份之量來摻混。 When using a photoacid or a base generating agent, it is preferable to use it in the range of 0.1-15 mass parts with respect to 100 mass parts of polyfunctional epoxy compounds, and it is more preferable to use it in the range of 1-10 mass parts. Furthermore, if necessary, you may mix|blend an epoxy resin hardening agent in the quantity of 1-100 mass parts with respect to 100 mass parts of polyfunctional epoxy compounds.

另一方面,使用多官能(甲基)丙烯酸化合物時,能夠使用光自由基聚合起始劑。 作為光自由基聚合起始劑,只要自公知者中適當地選擇來使用即可,有舉例如苯乙酮類、二苯酮類、米氏之苯甲醯基苯甲酸酯、戊肟酯、肟酯類、四甲基秋蘭姆單硫化物及硫基黃圜酮類等。 尤其是為光開裂型之光自由基聚合起始劑較佳。關於光開裂型之光自由基聚合起始劑,有記載於最新UV硬化技術(159頁,發行人:高薄一弘,發行處:(股)技術情報協會,1991年發行)。 作為市售之光自由基聚合起始劑,有舉例如BASF公司製 商品名:Irgacure 127、184、369、379、379EG、651、500、754、819、903、907、784、2959、CGI1700、CGI1750、CGI1850、CG24-61、OXE01、OXE02、Darocur 1116、1173、MBF、BASF公司製 商品名:Lucirin TPO、UCB公司製 商品名:EBECRYL P36、Fratelli Lamberti公司製 商品名:Esacure KIP150、KIP65LT、KIP100F、KT37、KT55、KTO46、KIP75/B等。 使用光自由基聚合起始劑時,相對於多官能(甲基)丙烯酸酯化合物100質量份,在0.1~200質量份之範圍內使用較佳,在1~150質量份之範圍內使用再較佳。 On the other hand, when using a polyfunctional (meth)acrylic compound, a photoradical polymerization initiator can be used. As a photoradical polymerization initiator, what is necessary is just to select and use from well-known ones suitably, for example, there are acetophenones, benzophenones, Mie's benzoyl benzoate, valeroxime ester , oxime esters, tetramethylthiuram monosulfide and thioxanthones, etc. In particular, a photocleavage-type photoradical polymerization initiator is preferable. About the photocleavage-type photoradical polymerization initiator, it is described in the latest UV curing technology (159 pages, issuer: Kazuhiro Takamasu, issuer: Technical Information Association, issued in 1991). Examples of commercially available photoradical polymerization initiators include trade names manufactured by BASF Corporation: Irgacure 127, 184, 369, 379, 379EG, 651, 500, 754, 819, 903, 907, 784, 2959, CGI1700, CGI1750, CGI1850, CG24-61, OXE01, OXE02, Darocur 1116, 1173, MBF, BASF product name: Lucirin TPO, UCB company product name: EBECRYL P36, Fratelli Lamberti company product name: Esacure KIP150, KIP65LT, KIP100F , KT37, KT55, KTO46, KIP75/B, etc. When using a photoradical polymerization initiator, it is better to use it in the range of 0.1 to 200 parts by mass, and to use it in the range of 1 to 150 parts by mass relative to 100 parts by mass of the polyfunctional (meth)acrylate compound. good.

進而,本發明之組成物中,以促進含三嗪環之聚合物與交聯劑之反應等為目的,亦可添加分子內具有2個以上氫硫基之多官能氫硫基化合物。 具體來說,為下述式所示之多官能氫硫基化合物較佳。 Furthermore, in the composition of the present invention, for the purpose of accelerating the reaction between the triazine ring-containing polymer and the crosslinking agent, etc., a polyfunctional mercapto compound having 2 or more mercapto groups in the molecule may be added. Specifically, it is preferably a polyfunctional mercapto compound represented by the following formula.

Figure 02_image101
Figure 02_image101

上述L表示2~4價之有機基,但為2~4價之碳數2~12之脂肪族基或2~4價之含雜環之基較佳,為2~4價之碳數2~8之脂肪族基,或下述式所示之具有異三聚氰酸骨架(1,3,5-三嗪-2,4,6(1H,3H,5H)-三酮環)之3價基再較佳。 上述n表示對應L價數之2~4之整數。 The above-mentioned L represents a 2-4 valent organic group, but it is preferably a 2-4 valent aliphatic group with 2-12 carbons or a 2-4 valent heterocycle-containing group, and it is a 2-4 valent carbon number 2 ~8 aliphatic groups, or 3 with isocyanuric acid skeleton (1,3,5-triazine-2,4,6(1H,3H,5H)-trione ring) represented by the following formula The price base is even better. The above-mentioned n represents an integer of 2 to 4 corresponding to the valence of L.

Figure 02_image103
(式中,「・」表示與氧原子之鍵結部。)
Figure 02_image103
(In the formula, "・" represents the bonding part with the oxygen atom.)

作為具體的化合物,有舉出1,4-雙(3-氫硫基丁醯基氧基)丁烷、1,3,5-參(3-氫硫基丁醯基氧基乙基)-1,3,5-三嗪-2,4,6-(1H,3H,5H)-三酮、季戊四醇肆(3-氫硫基丁酸酯)、三羥甲基丙烷參(3-氫硫基丁酸酯)、三羥甲基乙烷參(3-氫硫基丁酸酯)等。 此等之多官能氫硫基化合物能夠作為市售品來取得,有舉例如Karenz MT-BD1、Karenz MT NR1、Karenz MT PE1、TPMB、TEMB(以上為昭和電工(股)製)等。 此等之多官能氫硫基化合物亦可單獨使用1種,亦可組合2種以上組合來使用。 Specific compounds include 1,4-bis(3-mercaptobutyryloxy)butane, 1,3,5-para(3-mercaptobutyryloxyethyl)-1,3, 5-triazine-2,4,6-(1H,3H,5H)-trione, pentaerythritol (3-mercaptobutyrate), trimethylolpropane ginseng (3-mercaptobutyrate ), trimethylolethane ginseng (3-hydrogen thiobutyrate), etc. These polyfunctional mercapto compounds can be obtained as commercial items, and examples thereof include Karenz MT-BD1, Karenz MT NR1, Karenz MT PE1, TPMB, and TEMB (manufactured by Showa Denko Co., Ltd.). These polyfunctional thiol compounds may be used alone or in combination of two or more.

使用多官能氫硫基化合物時,作為其添加量,只要不會對所得之薄膜帶來不良影響即可,並無特別限定,但本發明中,固形分100質量%中為0.01~10質量%較佳,為0.03~6質量%再較佳。When a polyfunctional mercapto compound is used, the amount added is not particularly limited as long as it does not adversely affect the obtained film, but in the present invention, it is 0.01 to 10% by mass based on 100% by mass of the solid content More preferably, it is 0.03 to 6% by mass, more preferably.

本發明之組成物中,只要不損害本發明之效果,亦可包含含三嗪環之聚合物、交聯劑、無機微粒子及有機溶媒以外之其他成分,例如均染劑、界面活性劑、矽烷耦合劑等之添加劑。 作為界面活性劑,有舉例如聚氧乙烯月桂基醚、聚氧乙烯硬脂醯醚、聚氧乙烯鯨蠟基醚、聚氧乙烯油醯基醚等之聚氧乙烯烷基醚類;聚氧乙烯辛基酚醚、聚氧乙烯壬基酚醚等之聚氧乙烯烷基烯丙基醚類;聚氧乙烯・聚氧丙烯嵌段共聚合物類;山梨糖醇單月桂酸酯、山梨糖醇單棕櫚酸酯、山梨糖醇單硬脂酸酯、山梨糖醇單油酸酯、山梨糖醇三油酸酯、山梨糖醇三硬脂酸酯等之山梨糖醇脂肪酸酯類;聚氧乙烯山梨糖醇單月桂酸酯、聚氧乙烯山梨糖醇單棕櫚酸酯、聚氧乙烯山梨糖醇單硬脂酸酯、聚氧乙烯山梨糖醇三油酸酯、聚氧乙烯山梨糖醇三硬脂酸酯等之聚氧乙烯山梨糖醇脂肪酸酯類等之非離子系界面活性劑、商品名F-top EF301、EF303、EF352(三菱Material電子化成(股)製(舊(股)Gemco製))、商品名MEGAFAC F171、F173、R-08、R-30、R-40、F-553、F-554、RS-75、RS-72-K(DIC(股)製)、FLUORAD FC430、FC431(住友3M(股)製)、商品名Asahi Guard AG710,Surflon S-382、SC101、SC102、SC103、SC104、SC105、SC106(AGC(股)製)等之氟系界面活性劑、有機矽氧烷聚合物KP341(信越化學工業(股)製)、BYK-302、BYK-307、BYK-322、BYK-323、BYK-330、BYK-333、BYK-370、BYK-375、BYK-378 (BYK・Japan(股)製)等。 In the composition of the present invention, as long as the effects of the present invention are not impaired, other components other than polymers containing triazine rings, crosslinking agents, inorganic particles and organic solvents, such as leveling agents, surfactants, and silanes, may also be included. Additives such as coupling agent. As the surfactant, there are polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, polyoxyethylene oleyl ether, etc.; Polyoxyethylene alkyl allyl ethers such as ethylene octylphenol ether and polyoxyethylene nonylphenol ether; polyoxyethylene and polyoxypropylene block copolymers; sorbitol monolaurate, sorbose Alcohol monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, sorbitan tristearate and other sorbitol fatty acid esters; polyoxygen Ethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, polyoxyethylene sorbitan trioleate Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as stearate, trade names F-top EF301, EF303, EF352 (manufactured by Mitsubishi Material Electronics Co., Ltd. (formerly) Gemco )), trade name MEGAFAC F171, F173, R-08, R-30, R-40, F-553, F-554, RS-75, RS-72-K (manufactured by DIC), FLUORAD FC430, Fluorinated surfactants such as FC431 (manufactured by Sumitomo 3M Co., Ltd.), product name Asahi Guard AG710, Surflon S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Co., Ltd.), and organosiloxane Alkane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-302, BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-370, BYK-375, BYK-378 ( BYK・Japan Co., Ltd.), etc.

此等之界面活性劑亦可單獨使用,亦可組合2種以上來使用。界面活性劑之使用量相對於含三嗪環之聚合物100質量份,為0.0001~5質量份較佳,為0.001~1質量份再較佳,為0.01~0.5質量份再更較佳。These surfactants may be used alone or in combination of two or more. The amount of the surfactant used is preferably 0.0001-5 parts by mass, more preferably 0.001-1 part by mass, and still more preferably 0.01-0.5 parts by mass, relative to 100 parts by mass of the triazine ring-containing polymer.

本發明之膜形成用組成物能夠藉由塗布於基材後,因應必要加熱,使溶劑蒸發後,進行加熱或光照射,形成所期望之硬化膜。 組成物之塗布方法為任意,能夠採用例如旋轉塗布法、浸漬法、流動塗布法、噴墨法、噴射分注法、噴霧法、棒塗布法、凹版印刷塗布法、狹縫塗布法、卷軸塗布法、轉印印刷法、刷毛塗布、葉片塗布法、空氣刀塗布法等之方法。 The film-forming composition of the present invention can form a desired cured film by applying the composition for film formation of the present invention to a substrate, heating as necessary to evaporate the solvent, and then performing heating or light irradiation. The coating method of the composition is optional, and for example, spin coating method, dipping method, flow coating method, inkjet method, jet dispensing method, spray method, bar coating method, gravure coating method, slit coating method, and roll coating method can be used. method, transfer printing method, brush coating, blade coating method, air knife coating method and other methods.

且,作為基材,有舉出經矽氧、銦錫氧化物(ITO)成膜之玻璃、經銦鋅氧化物(IZO)成膜之玻璃、金屬奈米線、聚乙烯對苯二甲酸酯(PET)、塑膠、玻璃、石英、陶瓷等而成之基材等,能夠使用具有可撓性之可撓性基材。 燒成溫度只要以使溶媒蒸發為目的,並無特別限定,例如能夠在110~400℃中進行。 作為燒成方法,並無特別限定,例如使用熱盤或烤箱,在大氣、氮等之惰性氣體、真空中等之適當的環境下使其蒸發即可。 燒成溫度及燒成時間只要選擇適合目的之電子裝置的流程步驟之條件即可,選擇所得之膜之物性值適合電子裝置所要求之特性之燒成條件即可。 光照射時之條件亦並無特別限定,因應所使用之含三嗪環之聚合物及交聯劑,採用適當之照射能量及時間即可。 In addition, as substrates, silicon oxide, indium tin oxide (ITO) film-formed glass, indium zinc oxide (IZO) film-formed glass, metal nanowires, polyethylene terephthalic acid For substrates made of polyester (PET), plastic, glass, quartz, ceramics, etc., flexible substrates with flexibility can be used. The firing temperature is not particularly limited as long as the purpose is to evaporate the solvent, and it can be performed at, for example, 110 to 400°C. The firing method is not particularly limited, and for example, it may be evaporated in an appropriate environment such as the air, an inert gas such as nitrogen, or a vacuum using a hot plate or an oven. As for the firing temperature and firing time, it is only necessary to select the conditions suitable for the process steps of the electronic device for the purpose, and select the firing conditions so that the physical properties of the obtained film are suitable for the characteristics required by the electronic device. The conditions of light irradiation are not particularly limited, and appropriate irradiation energy and time can be adopted according to the triazine ring-containing polymer and crosslinking agent used.

如以上所得之本發明之薄膜或硬化膜由於能夠達成高耐熱性、高折射率及低體積收縮,故利用在製作液晶顯示器、有機EL元件(有機EL顯示器或有機EL照明)、觸控板、光半導體(LED)元件、固體撮像元件、有機薄膜太陽電池、色素增感太陽電池、有機薄膜電晶體(TFT)、鏡片、稜鏡相機、雙筒望遠鏡、顯微鏡、半導體曝光裝置等時之一構件等電子裝置或光學材料領域中較適合。 尤其是由本發明之組成物所製作之薄膜或硬化膜,由於透明性較高且折射率亦較高,故作為有機EL照明之平坦化膜或光散射層使用時,能夠改善其光取出效率(光擴散效率),同時亦能夠改善其耐久性。 The thin film or cured film of the present invention obtained as above can be used in the production of liquid crystal displays, organic EL elements (organic EL displays or organic EL lighting), touch panels, A component of optical semiconductor (LED) elements, solid-state imaging elements, organic thin-film solar cells, dye-sensitized solar cells, organic thin-film transistors (TFT), lenses, cameras, binoculars, microscopes, semiconductor exposure devices, etc. It is more suitable in the field of electronic devices or optical materials. In particular, the thin film or cured film made of the composition of the present invention has high transparency and high refractive index, so when used as a planarizing film or light scattering layer for organic EL lighting, its light extraction efficiency can be improved ( Light diffusion efficiency), but also can improve its durability.

且,將本發明之組成物使用於有機EL元件之光散射層時,作為光擴散劑,能夠使用公知之有機無機複合光擴散劑、有機光擴散劑、無機光擴散劑,並無特別限定。此等亦可各自單獨使用,亦可組合同種2種以上來使用,亦可組合異種2種以上來使用。Furthermore, when the composition of the present invention is used in the light scattering layer of an organic EL element, known organic-inorganic composite light-diffusing agents, organic light-diffusing agents, and inorganic light-diffusing agents can be used as the light-diffusing agent, and are not particularly limited. These may be used alone, respectively, may be used in combination of two or more of the same kind, or may be used in combination of two or more of different kinds.

作為有機無機複合光擴散劑,有舉出三聚氰胺樹脂・氧化矽複合粒子等。 作為有機光擴散劑,有舉出交聯聚甲基甲基丙烯酸酯(PMMA)粒子、交聯聚甲基丙烯酸酯粒子、交聯聚苯乙烯粒子、交聯苯乙烯丙烯酸共聚合粒子、三聚氰胺-甲醛粒子、矽氧樹脂粒子、矽・丙烯酸複合粒子、耐綸粒子、苯胍胺-甲醛粒子、苯胍胺・三聚氰胺・甲醛粒子、氟樹脂粒子、環氧樹脂粒子、聚伸苯基硫醚樹脂粒子、聚醚碸樹脂粒子、聚丙烯腈粒子、聚胺基甲酸酯粒子等。 作為無機光擴散劑,有舉出碳酸鈣(CaCO 3)、氧化鈦(TiO 2)、硫酸鋇(BaSO 4)、羥化鋁(Al(OH) 3)、矽(SiO 2)、滑石等,但以更提高所得之硬化膜之光擴散性之觀點來看,為氧化鈦(TiO 2)或凝集矽粒子較佳,為非凝集性之氧化鈦(TiO 2)再較佳。 此等之光擴散劑亦可使用經適當之表面修飾劑進行表面處理者。 [實施例] Examples of the organic-inorganic composite light-diffusing agent include melamine resin-silica composite particles and the like. Examples of organic light diffusing agents include cross-linked polymethylmethacrylate (PMMA) particles, cross-linked polymethacrylate particles, cross-linked polystyrene particles, cross-linked styrene-acrylic acid copolymer particles, melamine- Formaldehyde particles, silicone resin particles, silicone-acrylic composite particles, nylon particles, benzoguanamine-formaldehyde particles, benzoguanamine-melamine-formaldehyde particles, fluororesin particles, epoxy resin particles, polyphenylene sulfide resin Particles, polyether resin particles, polyacrylonitrile particles, polyurethane particles, etc. Examples of inorganic light diffusing agents include calcium carbonate (CaCO 3 ), titanium oxide (TiO 2 ), barium sulfate (BaSO 4 ), aluminum hydroxide (Al(OH) 3 ), silicon (SiO 2 ), and talc. However, from the viewpoint of further improving the light diffusibility of the resulting cured film, titanium oxide (TiO 2 ) or aggregated silicon particles are preferred, and non-aggregated titanium oxide (TiO 2 ) is even more preferred. These light diffusing agents may also be surface-treated with an appropriate surface modifier. [Example]

以下,舉出實施例及比較例,更具體地說明本發明,本發明並非限定於下述實施例。且,實施例中使用之各測定裝置如以下所述。 [ 1H-NMR] 裝置:Bruker NMR System AVANCE III HD 500 (500MHz) 測定溶媒:DMSO-d6 基準物質:四甲基矽烷(TMS)(δ0.0ppm) [GPC] 裝置:TOSOH (股)製 HLC-8200 GPC 管柱:TOSOH TSKgel α-3000 +TOSOH TSKgel α-4000 管柱溫度:40℃ 溶媒:二甲基甲醯胺(DMF) 檢出器:UV(271nm) 檢量線:標準聚苯乙烯 [橢偏儀] 裝置:J. A. Woollam・ Japan製 多入射角分光橢偏儀VASE [分光測色計] 裝置:Konica Minolta製 CM-3700A Hereinafter, although an Example and a comparative example are given and this invention is demonstrated more concretely, this invention is not limited to a following example. In addition, each measuring device used in the examples is as follows. [ 1 H-NMR] Apparatus: Bruker NMR System AVANCE III HD 500 (500MHz) Measurement solvent: DMSO-d6 Reference material: Tetramethylsilane (TMS) (δ0.0ppm) [GPC] Apparatus: HLC manufactured by TOSOH Co., Ltd. -8200 GPC column: TOSOH TSKgel α-3000 +TOSOH TSKgel α-4000 Column temperature: 40℃ Solvent: Dimethylformamide (DMF) Detector: UV (271nm) Calibration line: Standard polystyrene [Ellipsometer] Device: Multi-incident Angle Spectroscopic Ellipsometer VASE made by JA Woollam・Japan [Spectrophotometer] Device: CM-3700A made by Konica Minolta

[1]含三嗪環之聚合物之合成 [合成例1-1]高分子化合物[5]之合成

Figure 02_image105
[1] Synthesis of Polymers Containing Triazine Rings [Synthesis Example 1-1] Synthesis of High Molecular Compounds [5]
Figure 02_image105

於3,000mL四口燒瓶中添加2,2’-雙(三氟甲基)-4,4’-二胺二苯基醚[2](218.79g、0.651mol、Wuhan Sunshine公司製)及二甲基乙醯胺1,693.96g(DMAc、關東化學(股)製),進行氮取代後,攪拌使2,2’-雙(三氟甲基)-4,4’-二胺二苯基醚[2]溶解於DMAc中。之後,以乙醇-乾冰浴冷卻至-10℃,一邊確認浴溫不會成為0℃以上,一邊添加將2,4,6-三氯-1,3,5-三嗪[1](120.00g,0.651mol,東京化成工業(股)製)。攪拌30分鐘後,將反應溶液滴入預先添加有DMAc1,693.96g且氮取代後,將油池設定至90~100℃,使內溫成為75℃±5℃之5,000mL四口燒瓶中。以內溫75℃攪拌1小時後,預先使苯胺[3](73.39g,0.456mol,東京化成工業(股)製)及2-(4-胺基苯基)乙醇[4](62.49g,0.456mol,Oakwood公司製)溶解於DMAc124.97g後滴入,攪拌3小時。之後,降溫至室溫,滴入n-丙基胺(115.39g、東京化成工業(股)製),攪拌30分鐘後,停止攪拌。於反應溶液中添加THF(2,051g)、乙酸銨(1,846g)及離子交換水(1,846g),攪拌30分鐘。攪拌停止後,將溶液移至分液漏斗,分成有機層與水層,回收有機層。將回收之有機層滴入甲醇(3,282g)及離子交換水(8,206g),使其再沉澱。將所得之沉澱物濾別,以減壓乾燥機進行120℃之乾燥8小時,得到目的之高分子化合物[5](以下稱作P-1)235.51g。化合物P-1之 1H-NMR光譜之測定結果如圖1所示。 化合物P-1之以GPC之聚苯乙烯換算所測定之重量平均分子量Mw為6,070,多分散度Mw/Mn為2.6。 Add 2,2'-bis(trifluoromethyl)-4,4'-diamine diphenyl ether [2] (218.79 g, 0.651 mol, manufactured by Wuhan Sunshine Co., Ltd.) and dimethyl 1,693.96 g of acetylacetamide (DMAc, manufactured by Kanto Chemical Co., Ltd.), after nitrogen substitution, stirred to make 2,2'-bis(trifluoromethyl)-4,4'-diamine diphenyl ether [2 ] dissolved in DMAc. After that, cool to -10°C in an ethanol-dry ice bath, and add 2,4,6-trichloro-1,3,5-triazine[1] (120.00g , 0.651mol, produced by Tokyo Chemical Industry Co., Ltd.). After stirring for 30 minutes, drop the reaction solution into a 5,000mL four-neck flask with DMAc1,693.96g added in advance and nitrogen substitution, set the oil pool to 90~100°C, and make the internal temperature 75°C±5°C. After stirring at an internal temperature of 75° C. for 1 hour, aniline [3] (73.39 g, 0.456 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) and 2-(4-aminophenyl) ethanol [4] (62.49 g, 0.456 mol) were prepared in advance. mol, manufactured by Oakwood Company) was dissolved in DMAc124.97g and added dropwise, followed by stirring for 3 hours. Thereafter, the temperature was lowered to room temperature, n-propylamine (115.39 g, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise, and stirring was stopped after stirring for 30 minutes. THF (2,051g), ammonium acetate (1,846g), and ion exchanged water (1,846g) were added to the reaction solution, and it stirred for 30 minutes. After the stirring stopped, the solution was transferred to a separatory funnel, separated into an organic layer and an aqueous layer, and the organic layer was recovered. The recovered organic layer was dropped into methanol (3,282 g) and ion-exchanged water (8,206 g), and reprecipitated. The obtained precipitate was filtered and dried at 120° C. for 8 hours with a vacuum drier to obtain 235.51 g of the target polymer compound [5] (hereinafter referred to as P-1). The measurement results of the 1 H-NMR spectrum of Compound P-1 are shown in FIG. 1 . Compound P-1 had a weight average molecular weight Mw of 6,070 and a polydispersity Mw/Mn of 2.6 as measured in terms of polystyrene by GPC.

將化合物P-1(3.0g)各自溶解於丙二醇單甲基醚(以下簡稱為PGME)(7.0g)、丙二醇單甲基醚乙酸酯(以下簡稱為PGMEA)(7.0g)、環戊酮(以下簡稱為CPN)(7.0g)後,皆溶解於所有溶媒中,並得到30質量%之均勻之清漆。Compound P-1 (3.0 g) was dissolved in propylene glycol monomethyl ether (hereinafter abbreviated as PGME) (7.0 g), propylene glycol monomethyl ether acetate (hereinafter abbreviated as PGMEA) (7.0 g), cyclopentanone (hereinafter abbreviated as CPN) (7.0 g), all were dissolved in all solvents, and a uniform varnish of 30% by mass was obtained.

[2]表面處理無機微粒子之調製 以下製造例1~4中實施之物性測定之方法及測定裝置如以下所示。 (1)水分量:以Karl Fischer滴定法來求出。 (2)一次粒徑:使分散液於銅網布上乾燥,以透過型電子顯微鏡來觀察,測定100個粒徑,將平均值作為一次粒徑來求出。 (3)比重:以漂浮法求出(20℃)。 (4)黏度:以奥士華黏度計求出(20℃)。 (5)以動態光散射法粒徑:以Malvern製之Zetasizer Nano測定來求出。 (6)固形分濃度:以500℃燒成時之殘存固形物來求出。 (7)有機矽烷化合物之結合量:與變性金屬氧化物膠質粒子結合之有機矽烷化合物之量以元素分析來求出。 裝置:PerkinElmer製,SeriesII CHNS/O Analyzer 2400 [2] Preparation of surface-treated inorganic fine particles The methods and measuring devices for measuring physical properties implemented in Production Examples 1 to 4 below are as follows. (1) Moisture content: determined by Karl Fischer titration. (2) Primary particle diameter: The dispersion liquid was dried on a copper mesh, observed with a transmission electron microscope, and 100 particle diameters were measured, and the average value was determined as the primary particle diameter. (3) Specific gravity: Calculated by floating method (20°C). (4) Viscosity: Calculated with an Oswald viscometer (20°C). (5) Particle size by dynamic light scattering method: determined by measurement with a Zetasizer Nano manufactured by Malvern. (6) Solid content concentration: Calculated from the residual solid content when fired at 500°C. (7) Binding amount of organosilane compound: The amount of organosilane compound bound to denatured metal oxide colloidal particles was determined by elemental analysis. Device: Made by PerkinElmer, Series II CHNS/O Analyzer 2400

製造例1:第1金屬氧化物粒子(核粒子)(A1)之製造 於1公升之容器中添加純水126.2g,在攪拌下添加偏錫酸17.8g(以SnO 2換算含有15g,昭和化工(股)製)、四異丙氧化鈦284g(以TiO 2換算含有80g,日本曹達(股)製A-1)、草酸二水和物98(以草酸換算含有70g,宇部興產(股)製)、35質量%羥化四乙基銨水溶液438g(Sechem Japan製)。所得之混合溶液中,草酸/鈦原子之莫耳比為0.78,羥化四乙基銨/鈦原子之莫耳比為1.04。將該混合溶液950g於80℃中保持2小時,進而減壓至580Torr,保持2小時,調製鈦混合溶液。調製後之鈦混合溶液之pH值為4.7,電導度為27.2mS/cm,金屬氧化物濃度為10.0質量%。於3公升之經玻璃內襯之高壓釜容器中添加上述鈦混合溶液950g、純水950g,以140℃進行5小時之水熱處理。冷卻至室溫後,取出之水熱處理後之溶液為淡乳白色之含有氧化鈦之膠質粒子之水分散液。所得之分散液之pH值為3.9,電導度為19.7mS/cm,TiO 2濃度為4.2質量%,羥化四乙基銨濃度為8.0質量%,草酸濃度為3.7質量%,動態光散射法粒徑為16nm,以透過型電子顯微鏡觀察,會觀察到一次粒徑5~15nm之橢圓粒子。將所得之分散液以110℃乾燥之粉末進行X線回折分析,確認為金紅石型結晶。將所得之含有氧化鈦之膠質粒子作為核粒子(A)。接著,將氧基氯化鋯(作為ZrO 2,含有21.19質量%,第一稀元素化學工業(股)製)70.8g以純水429.2g稀釋,另外調製氧基氯化鋯水溶液500g(作為ZrO 2,含有3.0質量%),在攪拌下於此添加核粒子(A)之分散液(水分散溶膠)1,000g。接著,加熱至95℃,進行水解,得到表面有形成氧化鋯之薄膜層之含氧化鈦之核粒子(A1)(以下為第1金屬氧化物粒子(A1))之水分散溶膠。所得之水分散溶膠之pH值為1.2,全金屬氧化物濃度為20質量%,以透過型電子顯微鏡觀察,會觀察到一次粒徑為4~8nm之膠質粒子。 Production Example 1: Production of the first metal oxide particle (nuclear particle) (A1) Add 126.2 g of pure water to a 1-liter container, add 17.8 g of metastannic acid (contains 15 g in terms of SnO 2 ) under stirring, Showa Chemical Industry Co., Ltd.), titanium tetraisopropoxide 284g (80g in TiO2 conversion, A- 1 manufactured by Nippon Soda Co., Ltd.), oxalic acid dihydrate Wamono 98 (70g in oxalic acid conversion, Ube Industries Co., Ltd. 438 g (manufactured by Sechem Japan) and 35 mass % tetraethylammonium hydroxide aqueous solution. In the obtained mixed solution, the molar ratio of oxalic acid/titanium atom was 0.78, and the molar ratio of tetraethylammonium hydroxide/titanium atom was 1.04. 950 g of this mixed solution was kept at 80° C. for 2 hours, and then the pressure was reduced to 580 Torr, and kept for 2 hours to prepare a titanium mixed solution. The pH of the prepared titanium mixed solution was 4.7, the electrical conductivity was 27.2 mS/cm, and the metal oxide concentration was 10.0% by mass. 950 g of the titanium mixed solution and 950 g of pure water were added to a 3-liter glass-lined autoclave container, and hydrothermal treatment was performed at 140° C. for 5 hours. After cooling to room temperature, the taken out solution after hydrothermal treatment is a pale milky white aqueous dispersion of colloidal particles containing titanium oxide. The resulting dispersion had a pH of 3.9, an electrical conductivity of 19.7 mS/cm, a TiO concentration of 4.2% by mass, a hydroxylated tetraethylammonium concentration of 8.0% by mass, and an oxalic acid concentration of 3.7% by mass. The diameter is 16nm. When observed by a transmission electron microscope, elliptical particles with a primary particle diameter of 5-15nm will be observed. The resulting dispersion liquid was dried at 110°C for X-ray retroreflection analysis, and it was confirmed to be rutile crystals. The obtained colloidal particles containing titanium oxide were used as core particles (A). Next, 70.8 g of zirconium oxychloride (containing 21.19% by mass as ZrO 2 , manufactured by Daiichi Razor Chemical Co., Ltd.) was diluted with 429.2 g of pure water, and 500 g of an aqueous solution of zirconium oxychloride (as ZrO 2 2 , containing 3.0% by mass), 1,000 g of the dispersion liquid (water dispersion sol) of the core particle (A) was added here under stirring. Then, it was heated to 95°C and hydrolyzed to obtain a water-dispersed sol of titanium oxide-containing core particles (A1) (hereinafter referred to as first metal oxide particles (A1)) having a thin film layer of zirconium oxide formed on the surface. The pH value of the obtained water-dispersed sol was 1.2, and the concentration of all metal oxides was 20% by mass. When observed with a transmission electron microscope, colloidal particles with a primary particle size of 4-8 nm were observed.

製造例2:第2金屬氧化物粒子(B1)之製造 將JIS3號矽酸鈉(作為SiO 2,含有29.8質量%,富士化學(股)製)77.2g溶解於純水1,282g中,接著,溶解錫酸鈉NaSnO 3・H 2O(作為SnO 2,含有55.1質量%,昭和化工(股)製)20.9g。藉由將所得之水溶液通入有填充氫型陽離子交換樹脂(Amberlite(註冊商標)IR-120B)之管柱中,得到酸性之二氧化矽-氧化第二錫複合膠質粒子(B1)之水分散溶膠(pH2.4,作為SnO 2,含有0.44質量%,作為SiO 2,含有0.87質量%,SiO 2/SnO 2質量比為2.0)2,634g。接著,於所得之水分散溶膠中添加二異丙基胺6.9g。所得之溶膠為鹼性之二氧化矽-氧化第二錫複合膠質粒子(B1)(以下為第2金屬氧化物粒子(B1))之水分散溶膠,pH值為8.0。該水分散溶膠以透過型電子顯微鏡可觀察到5nm以下之一次粒徑之膠質粒子。 Production Example 2: Production of Second Metal Oxide Particles (B1) 77.2 g of JIS No. 3 sodium silicate (containing 29.8% by mass as SiO 2 , manufactured by Fuji Chemical Co., Ltd.) was dissolved in 1,282 g of pure water, and then, 20.9 g of sodium stannate NaSnO 3 ·H 2 O (55.1% by mass as SnO 2 , produced by Showa Chemical Co., Ltd.) was dissolved. By passing the resulting aqueous solution into a column filled with hydrogen-type cation exchange resin (Amberlite (registered trademark) IR-120B), the aqueous dispersion of acidic silica-second tin oxide composite colloidal particles (B1) was obtained Sol (pH 2.4, contains 0.44 mass % as SnO 2 , contains 0.87 mass % as SiO 2 , SiO 2 /SnO 2 mass ratio is 2.0) 2,634 g. Next, 6.9 g of diisopropylamine was added to the obtained water dispersion sol. The obtained sol is a water-dispersed sol of alkaline silicon dioxide-second tin oxide composite colloidal particles (B1) (hereinafter referred to as the second metal oxide particles (B1)), with a pH value of 8.0. Colloidal particles with a primary particle size of 5 nm or less can be observed in the water-dispersed sol by a transmission electron microscope.

製造例3:第3金屬氧化物粒子(C1)之製造 在攪拌下將製造例1所得之第1金屬氧化物粒子(A1)之水分散溶膠1,455g添加於製造例2所調製之第2金屬氧化物粒子(B1)之水分散溶膠2,634g中。接著,通液至有填充陰離子交換樹脂(Amberlite(註冊商標)IRA-410,Orgaho(股)製)500毫升之管柱中。接著,將通液後之水分散溶膠於95℃加熱3小時後,通液至有填充氫型陽離子交換樹脂(Amberlite(註冊商標)IR-120B)之管柱中,以三-n-戊基胺使其安定化,以超過濾膜法進行濃縮,得到第1金屬氧化物粒子(A1)與第2金屬氧化物粒子(B1)之間有形成含有氧化鋯之中間薄膜層之二氧化矽-氧化第二錫複合氧化物被覆之含有氧化鈦之膠質粒子(C1)(以下為第3金屬氧化物粒子(C1))之水分散溶膠。所得之水分散溶膠之全金屬氧化物濃度為20質量%,此溶膠以透過型電子顯微鏡觀察之一次粒徑為4~10nm。接著,將所得之水分散溶膠之分散媒使用旋轉蒸發器,取代成甲醇,得到第3金屬氧化物粒子(C1)之甲醇分散溶膠。此甲醇分散溶膠之全金屬氧化物濃度為30質量%,黏度為1.5mPa・s,以動態光散射法粒徑為18nm,水份為1.0質量%。 Production Example 3: Production of the third metal oxide particle (C1) 1,455 g of the water-dispersed sol of the first metal oxide particle (A1) obtained in Production Example 1 was added to 2,634 g of the water-dispersed sol of the second metal oxide particle (B1) prepared in Production Example 2 under stirring. Next, the liquid was passed to a column filled with 500 ml of anion exchange resin (Amberlite (registered trademark) IRA-410, manufactured by Orgaho Co., Ltd.). Next, after heating the water-dispersed sol at 95° C. for 3 hours, pass the liquid into a column filled with a hydrogen-type cation exchange resin (Amberlite (registered trademark) IR-120B), and replace it with tri-n-pentyl The amine is stabilized and concentrated by the ultrafiltration membrane method to obtain the silica- Aqueous dispersion sol of titanium oxide-containing colloidal particles (C1) (hereinafter referred to as third metal oxide particles (C1)) coated with the second tin oxide composite oxide. The total metal oxide concentration of the obtained water-dispersed sol was 20% by mass, and the primary particle diameter of the sol observed by a transmission electron microscope was 4-10 nm. Next, the dispersion medium of the obtained water-dispersed sol was replaced with methanol using a rotary evaporator to obtain a methanol-dispersed sol of the third metal oxide particle (C1). The total metal oxide concentration of this methanol dispersion sol is 30% by mass, the viscosity is 1.5mPa・s, the particle size is 18nm according to the dynamic light scattering method, and the water content is 1.0% by mass.

製造例4:表面修飾無機微粒子(D1)之製造 於製造例3所得之第3金屬氧化物粒子(C1)之甲醇分散溶膠533g中添加聚醚變性矽烷(信越化學工業(股)製,商品名:X-12-641)8.0g,於70℃進行還流加熱5小時。接著,添加3-甲基丙烯醯氧基丙基三甲氧基矽烷(信越化學工業(股)製,商品名:KBM-503)6.4g,於70℃進行還流加熱5小時,得到聚醚變性矽烷之水解物及3-甲基丙烯醯氧基丙基三甲氧基矽烷之水解物結合於表面之表面修飾膠質粒子(D1)(以下為表面修飾金屬氧化物粒子(D1))之甲醇分散液。接著,使用蒸發器,藉由一邊以80Torr添加丙二醇單甲基醚,一邊將甲醇餾去,將甲醇取代成丙二醇單甲基醚,得到表面修飾金屬氧化物粒子(D1)之丙二醇單甲基醚分散液530g。所得之分散液之比重為1.209,黏度為3.6mPa・s,全金屬氧化物濃度為30.0質量%,以透過型電子顯微鏡觀察之一次粒徑為5~10nm,動態光散射法粒徑為11nm。所得之表面修飾金屬氧化物粒子(D1)中,結合於第3金屬氧化物粒子(C1)之表面之聚醚變性矽烷之水解物相對於第3金屬氧化物粒子(C1)之全金屬氧化物,為4.0質量%,結合於第3金屬氧化物粒子(C1)之表面之3-甲基丙烯醯氧基丙基三甲氧基矽烷之水解物相對於第3金屬氧化物粒子(C1)之全金屬氧化物,為2.5質量%。 Production Example 4: Production of Surface Modified Inorganic Microparticles (D1) Add 8.0 g of polyether denatured silane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: X-12-641) to 533 g of methanol dispersion sol of the third metal oxide particle (C1) obtained in Production Example 3, and heat at 70°C Refluxing heating was carried out for 5 hours. Next, 6.4 g of 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBM-503) was added, and reflux heating was carried out at 70° C. for 5 hours to obtain polyether-modified silane The hydrolyzate of 3-methacryloxypropyltrimethoxysilane and the hydrolyzate of 3-methacryloxypropyltrimethoxysilane are bound to the methanol dispersion of surface-modified colloidal particles (D1) (hereinafter referred to as surface-modified metal oxide particles (D1)). Next, using an evaporator, methanol was distilled off while adding propylene glycol monomethyl ether at 80 Torr, and methanol was replaced with propylene glycol monomethyl ether to obtain propylene glycol monomethyl ether of surface-modified metal oxide particles (D1) Dispersion liquid 530g. The specific gravity of the obtained dispersion was 1.209, the viscosity was 3.6mPa・s, the total metal oxide concentration was 30.0% by mass, the primary particle size observed by transmission electron microscope was 5-10nm, and the particle size by dynamic light scattering method was 11nm. In the obtained surface-modified metal oxide particle (D1), the hydrolyzate of polyether-modified silane bonded to the surface of the third metal oxide particle (C1) is compared to the full metal oxide of the third metal oxide particle (C1) , is 4.0% by mass, the hydrolyzate of 3-methacryloxypropyltrimethoxysilane bonded to the surface of the third metal oxide particle (C1) relative to the total amount of the third metal oxide particle (C1) A metal oxide is 2.5% by mass.

[3]膜形成用組成物之調製及硬化膜之製作 [參考例1-1] 將合成例1-1所得之化合物P-1(1.0g)溶解於PGME (9.0g),調製10質量%之均勻且透明之清漆(以下為P-1溶液)。 將所得之P-1溶液使用旋轉塗布器,旋轉塗布於50mm×50mm×0.7mm之無鹼玻璃基板上成為500nm,於100℃熱盤上暫時加熱1分鐘後,再以250℃真燒成5分鐘,得到硬化膜(以下為P-1膜)。 [3] Preparation of film-forming composition and production of cured film [Reference example 1-1] Compound P-1 (1.0 g) obtained in Synthesis Example 1-1 was dissolved in PGME (9.0 g) to prepare a 10% by mass uniform and transparent varnish (hereinafter referred to as P-1 solution). Spin-coat the resulting P-1 solution on a 50mm×50mm×0.7mm alkali-free glass substrate to a thickness of 500nm using a spin coater, heat it on a hot plate at 100°C for 1 minute, and then bake it at 250°C for 5 minutes. Minutes to obtain a cured film (hereinafter referred to as P-1 film).

將上述參考例1-1所製作之硬化膜之折射率及膜厚表示於表1。Table 1 shows the refractive index and film thickness of the cured film prepared in Reference Example 1-1 above.

Figure 02_image107
Figure 02_image107

由表1可得知使用合成例1-1所得之高分子化合物所製作之薄膜,能夠提高對有機溶媒之溶解性,且同時具有超過1.64之折射率。It can be seen from Table 1 that the film produced by using the polymer compound obtained in Synthesis Example 1-1 can improve the solubility to organic solvents, and at the same time have a refractive index exceeding 1.64.

[4]交聯劑添加膜形成組成物之調製及硬化膜之製作 [實施例1-1] 於合成例1-1所合成之化合物P-1(1.521g)中,添加作為無機微粒子之30質量%PGME溶液之D1(15.214g)、作為交聯劑之70質量%PGME溶液之嵌段異氰酸酯(BI-7992,1,500mPa・s,BAXENDEN公司製)1.304g、作為界面活性劑之1質量%PGME溶液之MEGAFAC F-563(DIC(股)製)0.152g以及PGME1.808g,以目視確認其溶解,調製固形分35質量%之清漆(以下為SP-1溶液)。 將此SP-1溶液以旋轉塗布器,以200rpm5秒鐘且1,000rpm30秒鐘之條件,旋轉塗布於50mm×50mm×0.7mm之無鹼玻璃基板上,使用熱盤,以100℃進行1分鐘暫時乾燥後,以200℃進行5分鐘之真燒成,得到硬化膜(以下為SP-1膜)。 [4] Preparation of cross-linking agent added film-forming composition and production of cured film [Example 1-1] To compound P-1 (1.521 g) synthesized in Synthesis Example 1-1, D1 (15.214 g) as a 30% by mass PGME solution of inorganic fine particles, and blocked isocyanate as a 70% by mass PGME solution as a crosslinking agent were added (BI-7992, 1,500mPa・s, manufactured by BAXENDEN Co., Ltd.) 1.304g, MEGAFAC F-563 (manufactured by DIC Co., Ltd.) 0.152g of a 1% by mass PGME solution as a surfactant, and 1.808g of PGME were visually confirmed. Dissolve and prepare a varnish with a solid content of 35% by mass (hereinafter referred to as SP-1 solution). Spin-coat this SP-1 solution on a 50mm×50mm×0.7mm alkali-free glass substrate with a spin coater at 200rpm for 5 seconds and 1,000rpm for 30 seconds, and use a hot plate at 100°C for 1 minute. After drying, true firing was performed at 200° C. for 5 minutes to obtain a cured film (hereinafter referred to as SP-1 film).

[比較例1-1] 添加作為無機微粒子之30質量%PGME溶液之D1 (20.285g)、作為交聯劑之70質量%PGME溶液之嵌段異氰酸酯(BI-7992,1,500mPa・s,BAXENDEN公司製)1.304g、作為界面活性劑之1質量%PGME溶液之MEGAFAC F-563 (DIC(股)製)0.152g,以目視確認其溶解,調製固形分約35質量%之清漆(以下為SP-1溶液)。 使用此SP-1溶液,以與實施例1-1相同之順序得到硬化膜(以下為S-1膜)。 [Comparative Example 1-1] Add D1 (20.285g) of 30% by mass PGME solution as inorganic fine particles, 1.304g of blocked isocyanate (BI-7992, 1,500mPa・s, manufactured by BAXENDEN Co., Ltd.) as a crosslinking agent, and as an interface Dissolution of 0.152 g of MEGAFAC F-563 (manufactured by DIC Co., Ltd.) of 1 mass % PGME solution of the active agent was visually confirmed, and a varnish with a solid content of about 35 mass % was prepared (hereinafter referred to as SP-1 solution). Using this SP-1 solution, a cured film (hereinafter referred to as S-1 film) was obtained in the same procedure as in Example 1-1.

關於上述所得之硬化膜,測定折射率、膜厚、b*、400~800nm之透過率、HAZE。將結果表示於表2、圖2。關於透過率,算出400~800nm之平均透過率,並表示於表中。Regarding the cured film obtained above, the refractive index, film thickness, b*, transmittance at 400 to 800 nm, and HAZE were measured. The results are shown in Table 2 and Fig. 2 . Regarding the transmittance, the average transmittance of 400~800nm was calculated and shown in the table.

Figure 02_image109
Figure 02_image109

由此等結果可得知,使用合成例1-1所得之高分子化合物所製作之硬化膜,能夠維持較高折射率,且同時具有b*、HAZE降低或提升透過率之優異效果。From these results, it can be seen that the cured film produced by using the polymer compound obtained in Synthesis Example 1-1 can maintain a high refractive index, and at the same time have excellent effects of reducing b* and HAZE or increasing transmittance.

[圖1]合成例1-1所得之高分子化合物[5]之 1H-NMR光譜圖。 [圖2]表示實施例1-1及比較例1-1所製作之硬化膜之透過率之圖。 [ Fig. 1 ] 1 H-NMR spectrum chart of the polymer compound [5] obtained in Synthesis Example 1-1. [ Fig. 2 ] A graph showing the transmittance of the cured films prepared in Example 1-1 and Comparative Example 1-1.

Claims (19)

一種膜形成用組成物,其係包含: 包含下述式(1)表示之重複單位構造,至少具有1個三嗪環末端,且此三嗪環末端之至少一部份經具有交聯基之胺基封止之含三嗪環之聚合物,與 交聯劑,與 無機微粒子,與 有機溶媒,
Figure 03_image001
(式(1)中,R及R’各自獨立表示氫原子、烷基、烷氧基、芳基或芳烷基,Q表示具有環構造之碳數3~30之2價基,*表示鍵結處)。
A film-forming composition comprising: a repeating unit structure represented by the following formula (1), having at least one triazine ring terminal, and at least a part of the triazine ring terminal having a crosslinking group Polymers containing triazine rings blocked by amine groups, crosslinking agents, inorganic microparticles, and organic solvents,
Figure 03_image001
(In formula (1), R and R' each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, Q represents a divalent group with 3 to 30 carbon atoms having a ring structure, and * represents a bond junction).
如請求項1之膜形成用組成物,其中,前述式(1)中之Q表示選自式(2)~(13)及式(102)~(115)所示之群中至少1種,
Figure 03_image003
[式(2)~式(13)中,R 1~R 92各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, R 93及R 94表示氫原子或碳數1~10之烷基, W 1及W 2各自獨立表示單鍵、CR 95R 96(R 95及R 96各自獨立表示氫原子、碳數1~10之烷基(惟,此等亦可一起形成環),或碳數1~10之鹵素化烷基)、C=O、O、S、SO、SO 2,或NR 97(R 97表示氫原子、碳數1~10之烷基或苯基), X 1及X 2各自獨立表示單鍵、碳數1~10之伸烷基,或式(14)
Figure 03_image005
(式(14)中,R 98~R 101各自獨立表示氫原子、鹵原子、羧基、磺基、碳數1~10之烷基、碳數1~10之鹵素化烷基或碳數1~10之烷氧基, Y 1及Y 2各自獨立表示單鍵或碳數1~10之伸烷基)所示之基, *表示鍵結處]
Figure 03_image007
(式(102)~式(115)中,R 1及R 2各自獨立表示亦可具有分枝構造之碳數1~5之伸烷基,*表示鍵結處)。
The film-forming composition according to claim 1, wherein Q in the aforementioned formula (1) represents at least one selected from the group represented by formulas (2)-(13) and formulas (102)-(115),
Figure 03_image003
[In formulas (2) to (13), R 1 to R 92 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, or a halogenated alkyl group with 1 to 10 carbons or an alkoxy group with 1 to 10 carbons, R 93 and R 94 represent a hydrogen atom or an alkyl group with 1 to 10 carbons, W 1 and W 2 independently represent a single bond, CR 95 R 96 (R 95 and R 96 Each independently represents a hydrogen atom, an alkyl group with a carbon number of 1 to 10 (but these can also form a ring together), or a halogenated alkyl group with a carbon number of 1 to 10), C=O, O, S, SO, SO 2 , or NR 97 (R 97 represents a hydrogen atom, an alkyl group with 1 to 10 carbons or a phenyl group), X 1 and X 2 each independently represent a single bond, an alkylene group with 1 to 10 carbons, or the formula (14 )
Figure 03_image005
(In formula (14), R 98 ~ R 101 each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group with 1 to 10 carbons, a halogenated alkyl group with 1 to 10 carbons, or a halogenated alkyl group with 1 to 10 carbons 10 alkoxy, Y 1 and Y 2 each independently represent a single bond or a group represented by an alkylene group with 1 to 10 carbons), * represents a bond]
Figure 03_image007
(In formulas (102) to (115), R 1 and R 2 each independently represent an alkylene group with 1 to 5 carbons that may also have a branched structure, and * represents a bond).
如請求項2脂膜形成用組成物,其中,前述式(2)~(13)中,前述R 1~R 92及R 98~R 101各自獨立為氫原子、鹵原子或碳數1~10之鹵素化烷基。 Such as the composition for lipid film formation in claim item 2, wherein, in the aforementioned formulas (2) to (13), the aforementioned R 1 to R 92 and R 98 to R 101 are each independently a hydrogen atom, a halogen atom, or a carbon number of 1 to 10 halogenated alkyl. 如請求項1之膜形成用組成物,其中,前述具有交聯基之胺基為式(15)所示,
Figure 03_image009
(式(15)中,R 102表示交聯基,*表示鍵結處)。
The film-forming composition according to claim 1, wherein the aforementioned amino group having a crosslinking group is represented by formula (15),
Figure 03_image009
(In the formula (15), R 102 represents a crosslinking group, and * represents a bond).
如請求項4之膜形成用組成物,其中,前述具有交聯基之胺基為式(16)所示,
Figure 03_image011
(式(16)中,R 102表示與上述相同意義,*表示鍵結處)。
The film-forming composition according to Claim 4, wherein the aforementioned amine group having a crosslinking group is represented by formula (16),
Figure 03_image011
(In the formula (16), R 102 represents the same meaning as above, and * represents a bond).
如請求項4之膜形成用組成物,其中,前述R 102為含羥基之基或含(甲基)丙烯醯基之基。 The film-forming composition according to claim 4, wherein the aforementioned R 102 is a group containing a hydroxyl group or a group containing a (meth)acryl group. 如請求項6之膜形成用組成物,其中,前述R 102為羥基烷基、(甲基)丙烯醯基氧基烷基或下述式(i)表示之基,
Figure 03_image013
(式(i)中,A 1表示碳數1~10之伸烷基,A 2表示單鍵或下述式(j)
Figure 03_image015
表示之基,A 3表示亦可經羥基取代之(a+1)價之脂肪族烴基,A 4表示氫原子或甲基,a表示1或2,*表示鍵結處)。
The film-forming composition according to claim 6, wherein the aforementioned R 102 is a hydroxyalkyl group, a (meth)acryloxyalkyl group, or a group represented by the following formula (i),
Figure 03_image013
(In formula (i), A 1 represents an alkylene group with 1 to 10 carbon atoms, A 2 represents a single bond or the following formula (j)
Figure 03_image015
The group represented by A 3 represents an aliphatic hydrocarbon group with a valence of (a+1) which may also be substituted by a hydroxyl group, A 4 represents a hydrogen atom or a methyl group, a represents 1 or 2, and * represents a bond).
如請求項7之膜形成用組成物,其中,前述R 102為選自羥基甲基、2-羥基乙基、(甲基)丙烯醯基氧基甲基、(甲基)丙烯醯基氧基乙基及下述式(i-2)~式(i-5)表示之基中之基,
Figure 03_image017
(式(i-1)~式(i-5)中,*表示鍵結處)。
The composition for film formation as claimed in item 7, wherein, the aforementioned R 102 is selected from hydroxymethyl, 2-hydroxyethyl, (meth)acryloxymethyl, (meth)acryloxy Ethyl group and the group represented by the following formula (i-2) ~ formula (i-5),
Figure 03_image017
(In the formula (i-1) to the formula (i-5), * represents a bonding position).
如請求項2之膜形成用組成物,前述式(1)中之Q中至少1個芳香族環中含有至少1個鹵原子或碳數1~10之鹵素化烷基。The film-forming composition according to claim 2, wherein at least one aromatic ring in Q in the aforementioned formula (1) contains at least one halogen atom or a halogenated alkyl group having 1 to 10 carbon atoms. 如請求項1之膜形成用組成物,其中,三嗪環末端之一部份經無取代芳基胺基封止。The film-forming composition according to claim 1, wherein a part of the end of the triazine ring is blocked by an unsubstituted arylamine group. 如請求項10之膜形成用組成物,其中,前述無取代芳基胺基為式(33)所示,
Figure 03_image019
(式(33)中,*表示鍵結處)。
The film-forming composition according to Claim 10, wherein the aforementioned unsubstituted arylamine group is represented by formula (33),
Figure 03_image019
(In the formula (33), * represents a bonding site).
如請求項1之膜形成用組成物,其中,前述式(1)中之Q為式(17)所示,
Figure 03_image021
(式(17)中,*表示鍵結處)。
The film-forming composition according to claim 1, wherein Q in the aforementioned formula (1) is represented by formula (17),
Figure 03_image021
(In the formula (17), * represents a bonding site).
如請求項1之膜形成用組成物,其中,前述式(1)中之Q為式(20)所示,
Figure 03_image023
(式(20)中,*表示鍵結處)。
The film-forming composition according to claim 1, wherein Q in the aforementioned formula (1) is represented by formula (20),
Figure 03_image023
(In the formula (20), * represents a bonding site).
如請求項1之膜形成用組成物,其中,前述交聯劑為多官能(甲基)丙烯酸化合物。The film-forming composition according to claim 1, wherein the crosslinking agent is a polyfunctional (meth)acrylic compound. 如請求項1之膜形成用組成物,其中,前述無機微粒子包含金屬氧化物、金屬硫化物或金屬氮化物。The film-forming composition according to claim 1, wherein the inorganic fine particles include metal oxides, metal sulfides, or metal nitrides. 如請求項1之膜形成用組成物,其中,前述有機溶媒包含選自二醇酯系溶媒、酮系溶媒及酯系溶媒中至少1種。The film-forming composition according to claim 1, wherein the organic solvent contains at least one selected from glycol ester-based solvents, ketone-based solvents, and ester-based solvents. 一種薄膜,其係由如請求項1~16中任一項之膜形成用組成物而得。A thin film obtained from the film-forming composition according to any one of claims 1 to 16. 一種電子裝置,其係具備基材與形成於前述基材上之如請求項17之薄膜。An electronic device comprising a substrate and the thin film according to claim 17 formed on the substrate. 一種光學構件,其係具備基材與形成於前述基材上之如請求項17之薄膜。An optical member comprising a substrate and the thin film according to claim 17 formed on the substrate.
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