TW202307578A - 在單一微影曝光遍次中形成多個空間影像 - Google Patents

在單一微影曝光遍次中形成多個空間影像 Download PDF

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Publication number
TW202307578A
TW202307578A TW111110990A TW111110990A TW202307578A TW 202307578 A TW202307578 A TW 202307578A TW 111110990 A TW111110990 A TW 111110990A TW 111110990 A TW111110990 A TW 111110990A TW 202307578 A TW202307578 A TW 202307578A
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TW
Taiwan
Prior art keywords
energy
pulse
pulses
optical
optical source
Prior art date
Application number
TW111110990A
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English (en)
Chinese (zh)
Inventor
趙穎博
約書亞 瓊 索恩斯
Original Assignee
美商希瑪有限責任公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 美商希瑪有限責任公司 filed Critical 美商希瑪有限責任公司
Publication of TW202307578A publication Critical patent/TW202307578A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
TW111110990A 2021-04-19 2022-03-24 在單一微影曝光遍次中形成多個空間影像 TW202307578A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202163176646P 2021-04-19 2021-04-19
US63/176,646 2021-04-19

Publications (1)

Publication Number Publication Date
TW202307578A true TW202307578A (zh) 2023-02-16

Family

ID=81308156

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111110990A TW202307578A (zh) 2021-04-19 2022-03-24 在單一微影曝光遍次中形成多個空間影像

Country Status (4)

Country Link
JP (1) JP2024518258A (fr)
CN (1) CN117441133A (fr)
TW (1) TW202307578A (fr)
WO (1) WO2022225647A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6192064B1 (en) 1997-07-01 2001-02-20 Cymer, Inc. Narrow band laser with fine wavelength control
US7154928B2 (en) 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US7868999B2 (en) * 2006-08-10 2011-01-11 Asml Netherlands B.V. Lithographic apparatus, source, source controller and control method
US8144739B2 (en) 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
JP2013062484A (ja) * 2011-08-24 2013-04-04 Gigaphoton Inc レーザ装置
US10816905B2 (en) * 2015-04-08 2020-10-27 Cymer, Llc Wavelength stabilization for an optical source
US9939732B2 (en) * 2015-10-27 2018-04-10 Cymer, Llc Controller for an optical system

Also Published As

Publication number Publication date
WO2022225647A1 (fr) 2022-10-27
CN117441133A (zh) 2024-01-23
JP2024518258A (ja) 2024-05-01

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