TW202304669A - System and method for teaching silicon wafer taking and placing of manipulator relative to bearing space - Google Patents

System and method for teaching silicon wafer taking and placing of manipulator relative to bearing space Download PDF

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TW202304669A
TW202304669A TW111139031A TW111139031A TW202304669A TW 202304669 A TW202304669 A TW 202304669A TW 111139031 A TW111139031 A TW 111139031A TW 111139031 A TW111139031 A TW 111139031A TW 202304669 A TW202304669 A TW 202304669A
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manipulator
touch
teaching
carrying
orientation
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TW111139031A
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Chinese (zh)
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TWI824772B (en
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呂天爽
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大陸商西安奕斯偉材料科技有限公司
大陸商西安奕斯偉矽片技術有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/0081Programme-controlled manipulators with master teach-in means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/16Programme controls
    • B25J9/1602Programme controls characterised by the control system, structure, architecture
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/16Programme controls
    • B25J9/1656Programme controls characterised by programming, planning systems for manipulators
    • B25J9/1664Programme controls characterised by programming, planning systems for manipulators characterised by motion, path, trajectory planning

Abstract

The embodiment of the invention discloses a system and method for teaching silicon wafer taking and placing of a manipulator relative to a bearing space, and the system comprises a touch part which is disposed on the manipulator; the driving device is used for enabling the manipulator to move so that the touch piece can make contact with a plurality of parts of the bearing part defining the bearing space, and is used for enabling the manipulator to stop moving when the touch piece makes contact with each part of the bearing part; the obtaining unit is used for obtaining the positions of the multiple parts of the bearing part according to the direction of the manipulator when the manipulator stops moving every time and the position of the part, making contact with the bearing part, of the touch part in the touch part; the analysis unit is used for analyzing the orientation and the contour shape of the bearing space according to the positions of the multiple parts; and the determining unit is used for determining the teaching orientation of the manipulator according to the orientation and the contour shape of the bearing space.

Description

對機械手相對於承載空間取放矽片進行示教的系統及方法System and method for teaching manipulator to pick and place silicon wafer relative to carrying space

本發明屬於半導體矽片生產領域,尤其關於一種對機械手相對於承載空間取放矽片進行示教的系統及方法。The invention belongs to the field of semiconductor silicon wafer production, in particular to a system and method for teaching a manipulator to pick and place silicon wafers relative to a carrying space.

直拉法拉制的晶棒在被線切割後便可以獲得多個矽片,在後續的加工過程中,矽片會被臨時存放在矽片盒中以便於運輸等操作,在需要使用或加工時從矽片盒中取出。After the Czochralski crystal ingot is cut by wire, multiple silicon wafers can be obtained. During the subsequent processing, the silicon wafers will be temporarily stored in the silicon wafer box for transportation and other operations. When it needs to be used or processed Take it out of the silicon box.

如上所述的將矽片放置到矽片盒中或者將矽片從矽片盒中取出通常都是通過機械手的操作來完成的。在這種情況下,就需要對機械手相對於矽片盒取放矽片進行示教,以便於比如在機械手將載持著的矽片放入到矽片盒中時能夠將矽片放置到矽片盒中正確的位置,或者在機械手將放置在矽片盒中的矽片取出時能夠準確地對矽片進行夾持。Putting the silicon wafers into the silicon wafer box or taking the silicon wafers out of the silicon wafer box as mentioned above is usually done by manipulator operation. In this case, it is necessary to teach the manipulator to pick and place the silicon wafer relative to the silicon wafer box, so that, for example, when the manipulator puts the carried silicon wafer into the silicon wafer box, the silicon wafer can be placed in the The correct position in the silicon wafer box, or the silicon wafer can be accurately clamped when the robot arm takes out the silicon wafer placed in the silicon wafer box.

相關技術中的對機械手進行示教通常是通過人工作業來完成的,具體地,在確保機械手和矽片不與矽片盒的內壁、凸肋產生干涉的情況下使機械手連同矽片一起緩慢移動至矽片盒內,然後根據目測情況多次微調機械手的位置,直至人工判斷出矽片以適當的方式承載在矽片盒中,將此時機械手所處於的位置來作為示教方位。In the related art, the teaching of the manipulator is usually done manually. Specifically, the manipulator and the silicon wafer are not interfered with the inner wall and rib of the silicon wafer box. slowly move the wafers together into the wafer box, and then fine-tune the position of the manipulator several times according to the visual inspection until it is manually judged that the silicon wafers are carried in the silicon wafer box in an appropriate way, and the position of the manipulator at this time is used as Teach orientation.

然而,不同型號矽片盒中用於承載矽片的位置或者說機械手的示教方位是不同的,需要肉眼識別和判斷矽片、機械手在矽片盒中的位置,並且要精確控制距離、速度,重複驗證示教方位,不僅過程複雜,精度較差,還容易造成矽片劃傷和機械手損壞。However, the positions used to carry silicon wafers in different types of wafer cassettes or the teaching orientation of the manipulator are different. It is necessary to identify and judge the position of the wafer and the manipulator in the wafer cassette with the naked eye, and to accurately control the distance , speed, and repeated verification of the teaching orientation, not only the process is complicated, the accuracy is poor, and it is easy to cause scratches on the silicon chip and damage to the manipulator.

為解決上述技術問題,本發明實施例期望提供一種對機械手相對於承載空間取放矽片進行示教的系統及方法,不需要人工作業和判斷便能夠實現機械手的自動示教,不僅能夠保證機械手的精準定位,還由此能夠保證機械手的安全性,降低矽片被劃傷的風險。In order to solve the above technical problems, the embodiment of the present invention expects to provide a system and method for teaching the manipulator to pick and place silicon wafers relative to the carrying space, which can realize the automatic teaching of the manipulator without manual work and judgment, and can not only ensure The precise positioning of the manipulator can also ensure the safety of the manipulator and reduce the risk of silicon wafer being scratched.

本發明的技術方案是這樣實現的: 第一方面,本發明實施例提供了一種對機械手相對於承載空間取放矽片進行示教的系統,該系統包括: 觸碰件,該觸碰件設置在該機械手上; 驅動裝置,該驅動裝置用於使該機械手移動以使該觸碰件接觸限定出該承載空間的承載部件的多個部位,並且用於在該觸碰件接觸該承載部件的每個部位時使該機械手停止移動; 獲取單元,該獲取單元用於根據每次停止移動時該機械手的方位以及該觸碰件與該承載部件接觸的部位在該觸碰件中的位置獲取該承載部件的該多個部位的位置; 分析單元,該分析單元用於根據該多個部位的位置分析該承載空間的方位和輪廓形狀; 確定單元,該確定單元用於根據該承載空間的方位和輪廓形狀確定該機械手的示教方位。 Technical scheme of the present invention is realized like this: In the first aspect, an embodiment of the present invention provides a system for teaching a manipulator to pick and place silicon wafers relative to a carrying space. The system includes: a touch piece, the touch piece is arranged on the manipulator; a driving device, the driving device is used to move the manipulator so that the touch piece contacts a plurality of parts of the carrying part defining the carrying space, and is used for when the touch part touches each part of the carrying part stop the robot from moving; An acquisition unit, configured to acquire the positions of the plurality of positions of the carrying part according to the orientation of the manipulator each time the movement stops and the position of the contact part of the touch part with the carrying part in the touch part ; An analysis unit, configured to analyze the orientation and contour shape of the bearing space according to the positions of the multiple parts; A determination unit is configured to determine the teaching orientation of the manipulator according to the orientation and contour shape of the bearing space.

第二方面,本發明實施例提供了一種對機械手相對於承載空間取放矽片進行示教的方法,該方法包括: 使該機械手移動以使被該機械手載持的觸碰件接觸限定出該承載空間的承載部件的多個部位; 當該觸碰件接觸該承載部件的每個部位時使該機械手停止移動; 根據每次停止移動時該機械手的方位以及該觸碰件與該承載部件接觸的部位在該觸碰件中的位置獲取該承載部件的該多個部位的位置; 根據該多個部位的位置分析該承載空間的方位和輪廓形狀; 根據該承載空間的方位和輪廓形狀確定該機械手的示教方位。 In the second aspect, an embodiment of the present invention provides a method for teaching a manipulator to pick and place silicon wafers relative to a carrying space, the method comprising: moving the manipulator so that the touch member carried by the manipulator contacts multiple parts of the carrying part defining the carrying space; stopping the movement of the manipulator when the touch piece contacts each part of the bearing part; Obtaining the positions of the plurality of positions of the carrying part according to the orientation of the manipulator and the position of the contact part of the touching part in the touching part when the movement is stopped each time; Analyzing the orientation and contour shape of the bearing space according to the positions of the multiple parts; The teaching orientation of the manipulator is determined according to the orientation and contour shape of the bearing space.

本發明實施例提供了一種對機械手相對於承載空間取放矽片進行示教的系統及方法,由於能夠獲得機械手的示教方位,因此不僅可以利用機械手按照示教方位將承載在承載空間中的特定位置處的矽片取出,而且可以利用機械手按照示教方位將矽片放入到承載空間中的特定位置處,不需要人工作業和判斷便實現了機械手的自動示教。Embodiments of the present invention provide a system and method for teaching the manipulator to pick and place silicon wafers relative to the carrying space. Since the teaching orientation of the manipulator can be obtained, it is not only possible to use the manipulator to place the silicon wafers in the carrying space according to the teaching azimuth. The silicon chip at a specific position in the robot can be taken out, and the silicon chip can be placed into the specific position in the carrying space according to the teaching orientation by the manipulator, and the automatic teaching of the manipulator is realized without manual work and judgment.

為利 貴審查委員了解本發明之技術特徵、內容與優點及其所能達到之功效,茲將本發明配合附圖及附件,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的申請範圍,合先敘明。In order for Ligui examiners to understand the technical characteristics, content and advantages of the present invention and the effects it can achieve, the present invention is hereby combined with the accompanying drawings and appendices, and is described in detail in the form of embodiments as follows, and the drawings used therein , the purpose of which is only for illustration and auxiliary instructions, and not necessarily the true proportion and precise configuration of the present invention after implementation, so it should not be interpreted based on the proportion and configuration relationship of the attached drawings, and limit the application of the present invention in actual implementation The scope is described first.

在本發明實施例的描述中,需要理解的是,術語“長度”、“寬度”、“上”、“下”、“前”、“後”、“左”、“右”、“垂直”、“水平”、“頂”、“底”“內”、“外”等指示的方位或位置關係為基於附圖所示的方位或位置關係,僅是為了便於描述本發明實施例和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作,因此不能理解為對本發明的限制。In the description of the embodiments of the present invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical" , "horizontal", "top", "bottom", "inner", "outer" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the embodiments of the present invention and simplifying the description , rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention.

此外,術語“第一”、“第二”僅用於描述目的,而不能理解為指示或暗示相對重要性或者隱含指明所指示的技術特徵的數量。由此,限定有“第一”、“第二”的特徵可以明示或者隱含地包括一個或者更多個所述特徵。在本發明實施例的描述中,“多個”的含義是兩個或兩個以上,除非另有明確具體的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of said features. In the description of the embodiments of the present invention, "plurality" means two or more, unless otherwise specifically defined.

下面將結合本發明實施例中的附圖,對本發明實施例中的技術方案進行清楚、完整地描述。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.

參見圖1,本發明實施例提供了一種對機械手MH相對於承載空間S取放矽片W進行示教的系統1,該系統1可以包括: 觸碰件10,該觸碰件10設置在該機械手MH上; 驅動裝置20,該驅動裝置20用於使該機械手MH移動以使該觸碰件10接觸限定出該承載空間S的承載部件C的多個部位CP,其中,圖1中示例性地示出了,驅動裝置20使機械手MH移動至三個方位處,如在圖1中通過虛線示出的三個機械手MH所表示的,進而使設置在機械手MH上的觸碰件10處於三個位置處,如在圖1中通過虛線示出的三個觸碰件10所表示的,又進而使觸碰件10接觸承載部件C的三個部位,即由“叉號”示意性地示出的部位CP1、由“圓點”示意性地示出的部位CP2和由“方點”示意性地示出的部位CP3,需要說明的是,驅動裝置20可以使機械手MH移動而使設置在機械手MH上的觸碰件10接觸承載部件C的除上述三個部位以外的更多個其他部位,也就是說圖1中示出的三個部位僅僅是示例性的,其目的在於方便理解的而並非在於限定,該驅動裝置20還用於在該觸碰件10接觸該承載部件C的每個部位CP時使該機械手MH停止移動; 獲取單元30,該獲取單元30用於根據每次停止移動時該機械手MH的方位以及該觸碰件10與該承載部件C接觸的部位10P在該觸碰件10中的位置獲取該承載部件C的該多個部位CP的位置,其中,圖1中示例性地示出了,觸碰件10與承載部件C接觸的三個部位,即由“叉號”示意性地示出的部位10P1、由“圓點”示意性地示出的部位10P2和由“方點”示意性地示出的部位10P3,另外對此需要說明的是,首先,機械手MH的初始方位是能夠獲知的並且其停止移動時的方位是能夠根據初始方位和移動量獲知的,其次,由於觸碰件10設置在機械手MH上,因此觸碰件10相對於機械手MH的位置是固定的並且是能夠獲知的,再次,對於觸碰件10而言,具體是哪個部位與承載部件C產生了接觸也是容易獲知的,也就是說產生了接觸的部位比如圖1中示出的部位10P1、部位10P2和部位10P3在觸碰件10中的位置是容易獲知的,這樣,部位10P1、部位10P2和部位10P3在整個移動空間中的位置便能夠獲知,而參見圖1容易理解的是,部位10P1、部位10P2和部位10P3在整個移動空間中的位置便分別是承載部件C的部位CP1、部位CP2和部位CP3在整個移動空間中的位置,另外在圖1中,出於清楚的目的僅示出了獲取單元30與最上方機械手MH及部位10P1之間的連接線,以表示獲取單元30需要利用機械手MH的方位以及部位10P1在觸碰件10中的位置,而並未示出與另外兩個位置的機械手MH及部位10P2和部位10P3之間的連接線; Referring to FIG. 1 , an embodiment of the present invention provides a system 1 for teaching a manipulator MH to pick and place a silicon wafer W relative to a carrying space S. The system 1 may include: a touch piece 10, the touch piece 10 is arranged on the manipulator MH; A driving device 20, the driving device 20 is used to move the manipulator MH so that the touch member 10 contacts a plurality of positions CP of the carrying part C defining the carrying space S, wherein, it is exemplarily shown in FIG. 1 Therefore, the driving device 20 moves the manipulator MH to three orientations, as indicated by the three manipulators MH shown by dotted lines in FIG. At a position, as represented by the three touch members 10 shown by dotted lines in FIG. The part CP1, the part CP2 schematically shown by the "dot" and the part CP3 schematically shown by the "square point", it should be noted that the driving device 20 can move the manipulator MH to make the setting The touch member 10 on the manipulator MH contacts more other positions of the carrying part C except the above three positions, that is to say the three positions shown in FIG. 1 are only exemplary, and its purpose is to facilitate For understanding but not limitation, the driving device 20 is also used to stop the movement of the manipulator MH when the touch member 10 contacts each part CP of the bearing part C; An acquisition unit 30, configured to acquire the carrying part according to the orientation of the manipulator MH each time it stops moving and the position 10P of the touch part 10 in contact with the carrying part C in the touch part 10 The positions of the multiple parts CP of C, wherein, Fig. 1 exemplarily shows the three parts where the touch member 10 is in contact with the carrier part C, that is, the part 10P1 schematically shown by "cross". , the position 10P2 schematically shown by the "circle point" and the position 10P3 schematically shown by the "square point". In addition, it needs to be explained that firstly, the initial orientation of the manipulator MH can be known and The orientation when it stops moving can be known according to the initial orientation and the amount of movement. Secondly, since the touch piece 10 is arranged on the manipulator MH, the position of the touch piece 10 relative to the manipulator MH is fixed and can be known. Yes, once again, for the touch member 10, it is easy to know which part is in contact with the bearing part C, that is to say, the part where contact is made, such as the part 10P1, the part 10P2 and the part shown in FIG. 1 The position of 10P3 in the touch member 10 is easy to know, so that the positions of the parts 10P1, 10P2 and 10P3 in the entire moving space can be known, and referring to FIG. 1, it is easy to understand that the parts 10P1, 10P2 and The positions of the parts 10P3 in the entire moving space are respectively the positions of the parts CP1, CP2 and CP3 of the bearing part C in the entire moving space. In addition, in FIG. 1, only the acquisition unit 30 is shown for the purpose of clarity The connection line between the uppermost manipulator MH and the part 10P1 is used to indicate the orientation of the manipulator MH and the position of the part 10P1 in the touch member 10 that the acquisition unit 30 needs to use, and the connection with the other two positions is not shown. The connection line between the manipulator MH and parts 10P2 and 10P3;

分析單元40,該分析單元40用於根據該多個部位CP的位置分析該承載空間S的方位和輪廓形狀,這裡需要說明的是,很顯然地承載部件C是由多個部位構成或者說組成或者說“包絡出”的,而只要足夠多的這樣的部位的位置被獲知,那麼承載部件C的方位和輪廓形狀便是能夠獲知的,由此承載空間S的方位和輪廓形狀也是能夠獲知的,而如前所述,只要使觸碰件10接觸承載部件C的足夠多的部位,便能夠獲知足夠多的承載部件C的部位的位置; 確定單元50,該確定單元50用於根據該承載空間S的方位和輪廓形狀確定該機械手MH的示教方位,如在圖1中,在承載空間S內通過實線示出了位於所需位置處的矽片W以及處於示教方位的機械手MH,對此需要說明的是,總是希望將矽片W放置在承載空間S中的特定位置處,因此只要承載空間S的輪廓形狀確定,則相對於承載空間S的示教方位便能夠確定,而在承載空間S的方位也得到確定的情況下,則能夠在整個移動空間中確定出示教方位。 Analysis unit 40, which is used to analyze the orientation and contour shape of the carrying space S according to the positions of the multiple parts CP. It should be noted here that the carrying part C is obviously composed of multiple parts In other words, it is "enveloped", and as long as enough positions of such parts are known, then the orientation and contour shape of the carrying part C can be known, and thus the orientation and contour shape of the carrying space S can also be known , and as mentioned above, as long as the touch member 10 contacts enough parts of the carrying part C, the positions of enough parts of the carrying part C can be known; Determining unit 50, the determining unit 50 is used to determine the teaching orientation of the manipulator MH according to the orientation and contour shape of the carrying space S, as shown in Fig. The silicon wafer W at the position and the manipulator MH at the teaching orientation. It should be noted that it is always desirable to place the silicon wafer W at a specific position in the carrying space S, so as long as the contour shape of the carrying space S is determined , then the teaching orientation relative to the carrying space S can be determined, and when the orientation of the carrying space S is also determined, the teaching orientation can be determined in the entire moving space.

這樣,由於能夠獲得機械手MH的示教方位,因此不僅可以利用機械手MH按照示教方位將承載在承載空間S中的特定位置處的矽片W取出,而且可以利用機械手MH按照示教方位將矽片W放入到承載空間S中的特定位置處,不需要人工作業和判斷便實現了機械手的自動示教。In this way, since the teaching orientation of the manipulator MH can be obtained, it is not only possible to use the manipulator MH to take out the silicon wafer W carried at a specific position in the carrying space S according to the teaching azimuth, but also to use the manipulator MH to take out the silicon wafer W carried at a specific position in the carrying space S according to the teaching orientation. Azimuth puts the silicon wafer W into a specific position in the carrying space S, and realizes the automatic teaching of the manipulator without manual work and judgment.

如上所述,觸碰件10只要接觸到承載部件C,便需要驅動裝置20停止對機械手MH的驅動以使機械手MH停止移動,對此,在本發明的可選實施例中,參見圖2,該觸碰件10可以為壓力感應器,以對該觸碰件10因與該承載部件C的該多個部位CP接觸而受到的壓力進行感應並且在感應到該觸碰件10受到壓力時生成指令信號如在圖2中通過虛線箭頭示意性地示出的指令信號CS,該驅動裝置20基於該指令信號CS使該機械手MH停止移動。As mentioned above, as long as the touch member 10 touches the carrier part C, the driving device 20 needs to stop driving the manipulator MH so that the manipulator MH stops moving. For this, in an optional embodiment of the present invention, refer to FIG. 2. The touch piece 10 can be a pressure sensor, so as to sense the pressure on the touch piece 10 due to contact with the multiple parts CP of the bearing part C and sense that the touch piece 10 is under pressure When generating a command signal, such as a command signal CS schematically indicated by a dotted arrow in FIG. 2 , the drive device 20 stops the movement of the manipulator MH based on the command signal CS.

如上所述,觸碰件10需要被設置在機械手MH上以隨機械手MH一起移動,而另一方面,機械手MH本身是用於對矽片M進行夾持的,因此,為了方便觸碰件10的設置,在本發明的可選實施例中,參見圖1或圖2,該觸碰件10可以具有與該矽片W相同的輪廓形狀以便以與該矽片W相同的方式被該機械手MH載持。在這種情況下,由於承載部件C本身是用於承載矽片W的,其輪廓形狀必然與矽片W的輪廓形狀是相關聯的,因此,與觸碰件10具有其他輪廓形狀相比,具有與矽片W相同的輪廓形狀的觸碰件10可以在產生較少移動的情況下便能夠實現與承載部件C的不同的部位進行接觸,由此減少了驅動裝置20的工作負荷。As mentioned above, the touch piece 10 needs to be set on the manipulator MH so as to move together with the manipulator MH. On the other hand, the manipulator MH itself is used to clamp the silicon wafer M. Therefore, in order to facilitate the touch The arrangement of the touch piece 10, in an alternative embodiment of the present invention, referring to FIG. 1 or FIG. 2, the touch piece 10 may have the same contour shape as the silicon wafer W so as to be fabricated in the same manner as the silicon wafer W. The manipulator MH carries. In this case, since the carrying part C itself is used to carry the silicon wafer W, its contour shape must be associated with the contour shape of the silicon wafer W. Therefore, compared with the contact member 10 having other contour shapes, The touch piece 10 having the same outline shape as the silicon wafer W can make contact with different parts of the carrier part C with less movement, thereby reducing the workload of the driving device 20 .

在上述情形下,該觸碰件10能夠確定出受到壓力的部位10P在該觸碰件10中的位置,這樣,確定出的位置便可以被獲取單元30直接使用。對此,比如觸碰件10的不同的部位受到壓力時,除了生成上述的指令信號CS以外,還可以生成不同於彼此的另外的信號,根據這樣的信號便可以確定出是觸碰件10的哪個部位受到了壓力。In the above situation, the touch member 10 can determine the position of the pressured part 10P in the touch member 10 , so that the determined position can be directly used by the acquisition unit 30 . In this regard, for example, when different parts of the touch member 10 are under pressure, in addition to generating the above-mentioned command signal CS, other signals different from each other can also be generated. According to such signals, it can be determined that the touch member 10 is Which part is under pressure.

在本發明的可選實施例中,參見圖3,該承載空間S可以由矽片盒WC的兩個側壁SW以及從該兩個側壁SW向內凸出並且豎向排列的多個凸肋R限定出。In an alternative embodiment of the present invention, referring to FIG. 3 , the carrying space S can be composed of two side walls SW of the wafer box WC and a plurality of ribs R protruding inward from the two side walls SW and arranged vertically. limited out.

在上述情形下,仍然參見圖3,當觸碰件10隨機械手MH一起移動時,可能會受到凸肋R向上的壓力,如觸碰件10和機械手MH處於圖3中實線示出的位置時,可能會受到凸肋R向下的壓力,如觸碰件10和機械手MH處於圖3中上方虛線示出的位置時,另外可能會受到側壁SW側向的壓力,如觸碰件10和機械手MH處於圖3中下方虛線示出的位置時,對此,在本發明的可選實施例中,參見圖4,該觸碰件10可以包括條狀的三個壓力感應器,具體地為如圖4中示出的第一壓力感應器11、第二壓力感應器12和第三壓力感應器13,該第一壓力感應器11與該矽片W的正面WF相對應,該第二壓力感應器12與該矽片W的側面WS相對應,而該第三壓力感應器13與該矽片W的背面WB相對應。In the above situation, still referring to FIG. 3 , when the touch piece 10 moves together with the manipulator MH, it may be pressed upward by the rib R, as shown by the solid line in FIG. 3 between the touch piece 10 and the manipulator MH. position, it may be subject to downward pressure from the convex rib R, such as when the touch member 10 and the manipulator MH are in the position shown by the upper dotted line in Figure 3, and may be subject to lateral pressure from the side wall SW, such as touching When the part 10 and the manipulator MH are in the position shown by the dotted line below in Fig. 3, for this, in an alternative embodiment of the present invention, referring to Fig. 4, the touch part 10 may include three bar-shaped pressure sensors , specifically the first pressure sensor 11, the second pressure sensor 12 and the third pressure sensor 13 as shown in FIG. The second pressure sensor 12 corresponds to the side WS of the silicon wafer W, and the third pressure sensor 13 corresponds to the back WB of the silicon wafer W.

在本發明的可選實施例中,參見圖5,該觸碰件10可以呈點狀以使該觸碰件10的同一部位或者說點狀的觸碰件10自身與該承載部件C的該多個部位CP接觸。在這種情況下,將圖5與圖1對比可以看到,儘管為了使觸碰件10與承載部件C的多個部位接觸需要使機械手MH進行更多的移動,但是,不再需要對觸碰件10的完成接觸的部位在觸碰件10中的位置進行確定,從而使確定出機械手MH的示教方位的整個過程得到簡化。In an optional embodiment of the present invention, referring to FIG. 5 , the touch piece 10 can be in the shape of a point so that the same part of the touch piece 10 or the point-shaped touch piece 10 itself and the bearing part C Multiple parts of CP are in contact. In this case, comparing FIG. 5 with FIG. 1, it can be seen that although the manipulator MH needs to be moved more in order to make the touch member 10 contact with multiple parts of the carrier part C, it is no longer necessary to The position of the touch part 10 where the contact is completed is determined in the touch part 10 , so that the whole process of determining the teaching orientation of the manipulator MH is simplified.

參見圖6並結合圖1,本發明實施例還提供了一種對機械手MH相對於承載空間S取放矽片W進行示教的方法,該方法可以包括: S601:使機械手MH移動以使被該機械手MH載持的觸碰件10接觸限定出承載空間S的承載部件C的多個部位CP; S602:當該觸碰件10接觸該承載部件C的每個部位CP時使該機械手MH停止移動; S603:根據每次停止移動時該機械手MH的方位以及該觸碰件10與該承載部件C接觸的部位10P在該觸碰件10中的位置獲取該承載部件C的該多個部位CP的位置; S604:根據該多個部位CP的位置分析該承載空間S的方位和輪廓形狀; S605:根據該承載空間S的方位和輪廓形狀確定該機械手MH的示教方位。 Referring to FIG. 6 in conjunction with FIG. 1 , an embodiment of the present invention also provides a method for teaching the manipulator MH to pick and place the silicon wafer W relative to the carrying space S, the method may include: S601: Make the manipulator MH move so that the touch member 10 carried by the manipulator MH contacts multiple parts CP of the carrying part C defining the carrying space S; S602: stop the movement of the manipulator MH when the touch member 10 contacts each part CP of the bearing part C; S603: According to the orientation of the manipulator MH and the position of the contact part 10P of the contact part 10 and the carrier part C in the touch part 10 when the movement stops each time, obtain the information of the plurality of parts CP of the carrier part C Location; S604: Analyze the orientation and contour shape of the carrying space S according to the positions of the multiple parts CP; S605: Determine the teaching orientation of the manipulator MH according to the orientation and contour shape of the carrying space S.

在上述方法中,可選地,該當該觸碰件10接觸該承載部件C的每個部位CP時使該機械手MH停止移動可以包括: 對該觸碰件10因與該承載部件C的該多個部位CP接觸而產生的壓力進行感應; 當感應到該觸碰件10受到壓力時生成指令信號; 基於該指令信號使該機械手MH停止移動。 In the above method, optionally, stopping the movement of the manipulator MH when the touch member 10 contacts each part CP of the bearing part C may include: Sensing the pressure generated by the touch member 10 due to contact with the plurality of parts CP of the bearing part C; generating a command signal when it is sensed that the touch member 10 is under pressure; The movement of the manipulator MH is stopped based on the command signal.

需要說明的是:本發明實施例所記載的技術方案之間,在不衝突的情況下,可以任意組合。It should be noted that: the technical solutions described in the embodiments of the present invention can be combined arbitrarily if there is no conflict.

以上僅為本發明之較佳實施例,並非用來限定本發明之實施範圍,如果不脫離本發明之精神和範圍,對本發明進行修改或者等同替換,均應涵蓋在本發明申請專利範圍的保護範圍當中。The above are only preferred embodiments of the present invention, and are not used to limit the implementation scope of the present invention. If the present invention is modified or equivalently replaced without departing from the spirit and scope of the present invention, it shall be covered by the protection of the patent scope of the present invention. in the range.

1:系統 10:觸碰件 11:第一壓力感應器 12:第二壓力感應器 13:第三壓力感應器 20:驅動裝置 30:獲取單元 40:分析單元 50:確定單元 10P:部位 10P1:部位 10P2:部位 10P3:部位 CP:部位 CP1:部位 CP2:部位 CP3:部位 C:承載部件 S:承載空間 W:矽片 WF:正面 WB:背面 WS:側面 CS:指令信號 MH:機械手 WC:矽片盒 SW:側壁 R:凸肋 S601-S605:步驟 1: system 10: Touch parts 11: The first pressure sensor 12:Second pressure sensor 13: The third pressure sensor 20: Drive device 30: Get unit 40:Analysis unit 50: determine unit 10P: parts 10P1: parts 10P2: parts 10P3: parts CP: part CP1: part CP2: parts CP3: parts C: Bearing parts S: Carrying space W: Wafer WF: front WB: back WS: side CS: command signal MH: manipulator WC: Wafer box SW: side wall R: convex rib S601-S605: Steps

圖1為根據本發明的實施例的對機械手相對於承載空間取放矽片進行示教的系統的示意圖; 圖2為根據本發明的另一實施例的對機械手相對於承載空間取放矽片進行示教的系統的示意圖; 圖3為根據本發明的實施例的承載空間的正視示意圖; 圖4為根據本發明的實施例的觸碰件的剖視示意圖; 圖5為根據本發明的另一實施例的對機械手相對於承載空間取放矽片進行示教的系統的示意圖; 圖6為根據本發明的實施例的對機械手相對於承載空間取放矽片進行示教的方法的示意圖。 1 is a schematic diagram of a system for teaching a manipulator to pick and place silicon wafers relative to a carrying space according to an embodiment of the present invention; 2 is a schematic diagram of a system for teaching a manipulator to pick and place silicon wafers relative to a carrying space according to another embodiment of the present invention; Fig. 3 is a schematic front view of a carrying space according to an embodiment of the present invention; 4 is a schematic cross-sectional view of a touch element according to an embodiment of the present invention; 5 is a schematic diagram of a system for teaching a manipulator to pick and place silicon wafers relative to a carrying space according to another embodiment of the present invention; FIG. 6 is a schematic diagram of a method for teaching a manipulator to pick and place silicon wafers relative to a carrying space according to an embodiment of the present invention.

1:系統 1: system

10:觸碰件 10: Touch parts

20:驅動裝置 20: Drive device

30:獲取單元 30: Get unit

40:分析單元 40:Analysis unit

50:確定單元 50: determine unit

10P:部位 10P: parts

10P1:部位 10P1: parts

10P2:部位 10P2: parts

10P3:部位 10P3: parts

CP:部位 CP: part

CP1:部位 CP1: part

CP2:部位 CP2: parts

CP3:部位 CP3: parts

C:承載部件 C: Bearing parts

S:承載空間 S: Carrying space

W:矽片 W: Wafer

MH:機械手 MH: manipulator

Claims (10)

一種對機械手相對於承載空間取放矽片進行示教的系統,該系統包括: 觸碰件,該觸碰件設置在該機械手上; 驅動裝置,該驅動裝置用於使該機械手移動以使該觸碰件接觸限定出該承載空間的承載部件的多個部位,並且用於在該觸碰件接觸該承載部件的每個部位時使該機械手停止移動; 獲取單元,該獲取單元用於根據每次停止移動時該機械手的方位以及該觸碰件與該承載部件接觸的部位在該觸碰件中的位置獲取該承載部件的該多個部位的位置; 分析單元,該分析單元用於根據該多個部位的位置分析該承載空間的方位和輪廓形狀; 確定單元,該確定單元用於根據該承載空間的方位和輪廓形狀確定該機械手的示教方位。 A system for teaching a manipulator to pick and place silicon wafers relative to a carrying space, the system includes: a touch piece, the touch piece is arranged on the manipulator; a driving device, the driving device is used to move the manipulator so that the touch piece contacts a plurality of parts of the carrying part defining the carrying space, and is used for when the touch part touches each part of the carrying part stop the robot from moving; An acquisition unit, configured to acquire the positions of the plurality of positions of the carrying part according to the orientation of the manipulator each time the movement stops and the position of the contact part of the touch part with the carrying part in the touch part ; An analysis unit, configured to analyze the orientation and contour shape of the bearing space according to the positions of the multiple parts; A determination unit is configured to determine the teaching orientation of the manipulator according to the orientation and contour shape of the bearing space. 如請求項1所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該觸碰件為壓力感應器,以對該觸碰件因與該承載部件的該多個部位接觸而受到的壓力進行感應並且在感應到該觸碰件受到壓力時生成指令信號,該驅動裝置基於該指令信號使該機械手停止移動。The system for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 1, wherein the touch part is a pressure sensor, and the touch part is connected to the multiple positions of the carrying part The pressure received by the contact is sensed and an instruction signal is generated when sensing that the touch member is under pressure, and the driving device stops the movement of the manipulator based on the instruction signal. 如請求項2所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該觸碰件具有與該矽片相同的輪廓形狀以便以與該矽片相同的方式被該機械手載持。The system for teaching a manipulator to pick and place a silicon chip relative to the carrying space as described in claim 2, wherein the touch piece has the same contour shape as the silicon chip so that it can be controlled by the robot in the same way as the silicon chip hand holding. 如請求項3所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該觸碰件能夠確定出受到壓力的部位在該觸碰件中的位置。The system for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 3, wherein the touch piece can determine the position of the pressured part in the touch piece. 如請求項3所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該承載空間由矽片盒的兩個側壁以及從該兩個側壁向內凸出並且豎向排列的多個凸肋限定出。The system for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 3, wherein the carrying space is composed of two side walls of the silicon wafer box and protrudes inward from the two side walls and is vertically arranged defined by a plurality of ribs. 如請求項5所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該觸碰件包括條狀的三個壓力感應器,該三個壓力感應器分別與該矽片的正面、側面和背面相對應。The system for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 5, wherein the touch member includes three strip-shaped pressure sensors, and the three pressure sensors are respectively connected to the silicon wafer The front, side and back correspond to each other. 如請求項2所述之對機械手相對於承載空間取放矽片進行示教的系統,其中,該觸碰件呈點狀以使該觸碰件的同一部位與該承載部件的該多個部位接觸。The system for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 2, wherein the touch piece is in the shape of a point so that the same part of the touch piece is in the same position as the multiple places of the carrying part touch. 一種對機械手相對於承載空間取放矽片進行示教的方法,該方法包括: 使該機械手移動以使被該機械手載持的觸碰件接觸限定出該承載空間的承載部件的多個部位; 當該觸碰件接觸該承載部件的每個部位時使該機械手停止移動; 根據每次停止移動時該機械手的方位以及該觸碰件與該承載部件接觸的部位在該觸碰件中的位置獲取該承載部件的該多個部位的位置; 根據該多個部位的位置分析該承載空間的方位和輪廓形狀; 根據該承載空間的方位和輪廓形狀確定該機械手的示教方位。 A method for teaching a manipulator to pick and place silicon wafers relative to a carrying space, the method comprising: moving the manipulator so that the touch member carried by the manipulator contacts multiple parts of the carrying part defining the carrying space; stopping the movement of the manipulator when the touch piece contacts each part of the bearing part; Obtaining the positions of the plurality of positions of the carrying part according to the orientation of the manipulator and the position of the contact part of the touching part in the touching part when the movement is stopped each time; Analyzing the orientation and contour shape of the bearing space according to the positions of the multiple parts; The teaching orientation of the manipulator is determined according to the orientation and contour shape of the bearing space. 如請求項8所述之對機械手相對於承載空間取放矽片進行示教的方法,其中,該當該觸碰件接觸該承載部件的每個部位時使該機械手停止移動包括: 對該觸碰件因與該承載部件的該多個部位接觸而產生的壓力進行感應; 當感應到該觸碰件受到壓力時生成指令信號; 基於該指令信號使該機械手停止移動。 The method for teaching the manipulator to pick and place silicon wafers relative to the carrying space as described in claim 8, wherein stopping the movement of the manipulator when the touch member touches each part of the carrying part includes: Sensing the pressure generated by the touch member due to contact with the plurality of parts of the bearing part; Generate a command signal when sensing that the touch piece is under pressure; The manipulator is stopped based on the command signal. 如請求項8或9所述之對機械手相對於承載空間取放矽片進行示教的方法,其中,該觸碰件具有與該矽片相同的輪廓形狀以便以與該矽片相同的方式被該機械手載持。The method for teaching a manipulator to pick and place a silicon chip relative to a carrying space as described in claim 8 or 9, wherein the touch piece has the same contour shape as the silicon chip so as to be handled in the same manner as the silicon chip The manipulator carries.
TW111139031A 2022-06-30 2022-10-14 System and method for teaching a robot to pick and place silicon wafers relative to the carrying space TWI824772B (en)

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