TW202302802A - Silver containing paste - Google Patents

Silver containing paste Download PDF

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TW202302802A
TW202302802A TW111117962A TW111117962A TW202302802A TW 202302802 A TW202302802 A TW 202302802A TW 111117962 A TW111117962 A TW 111117962A TW 111117962 A TW111117962 A TW 111117962A TW 202302802 A TW202302802 A TW 202302802A
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silver
containing paste
paste
less
temperature
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TW111117962A
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渡部直輝
高本真
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日商住友電木股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/08Metals
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49503Lead-frames or other flat leads characterised by the die pad
    • H01L23/49513Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/08Metals
    • C08K2003/0806Silver
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Conductive Materials (AREA)
  • Die Bonding (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

This silver-containing paste contains: silver-containing particles; a cyanamide derivative; a solvent; and a polyfunctional compound comprising one or both of (A) an epoxy compound having two or more intramolecular epoxy groups and (B) a (meth)acrylic compound containing two or more intramolecular polymerizable double bonds.

Description

含銀糊劑silver paste

本發明係有關一種含銀糊劑。The present invention relates to a silver-containing paste.

已知一種為了提高半導體裝置的散熱性而使用含有金屬粒子的熱固性樹脂組成物來製造半導體裝置之技術。藉由使熱固性樹脂組成物含有具有比樹脂大的導熱率之金屬粒子,能夠提高其硬化物的導熱性。There is known a technique of manufacturing a semiconductor device using a thermosetting resin composition containing metal particles in order to improve the heat dissipation of the semiconductor device. By making the thermosetting resin composition contain metal particles having a higher thermal conductivity than the resin, the thermal conductivity of the cured product can be improved.

專利文獻1中公開了一種糊劑狀含銀粒子組成物,其由表面被覆之特定燒結性含銀粒子、揮發性分散介質及特定的2種樹脂粉末構成。該文獻中記載了使糊劑狀含銀粒子組成物在特定的環境下以100℃以上且250℃以下的溫度進行燒結。還記載了該糊劑狀含銀粒子組成物的保存穩定性良好,可獲得對金屬製構件的接著強度優異之接合體。Patent Document 1 discloses a paste-like silver-containing particle composition composed of surface-coated specific sinterable silver-containing particles, a volatile dispersion medium, and two specific resin powders. This document describes that the paste-like silver particle-containing composition is sintered at a temperature of 100° C. or higher and 250° C. or lower under a specific environment. It is also described that this paste-like silver particle-containing composition has good storage stability and can obtain a bonded body excellent in adhesive strength to metal members.

專利文獻2中公開了一種糊劑狀接著劑組成物,其包含:金屬粒子,其藉由熱處理引起燒結而形成粒子連結結構;及樹脂,其具有40℃以上且250℃以下的分解開始溫度。在該文獻中記載了糊劑狀接著劑組成物的燒結體的金屬密接性優異。 [先前技術文獻] [專利文獻] Patent Document 2 discloses a paste-like adhesive composition comprising: metal particles that are sintered by heat treatment to form a particle-connected structure; and a resin that has a decomposition initiation temperature of 40°C to 250°C. This document describes that a sintered body of a paste-like adhesive composition is excellent in metal adhesion. [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2019-189936號公報 [專利文獻2]日本特開2018-98272號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2019-189936 [Patent Document 2] Japanese Patent Laid-Open No. 2018-98272

[發明所欲解決之課題][Problem to be Solved by the Invention]

然而,本發明人進行了研究,其結果,上述文獻中記載的含銀糊劑在接合半導體晶片與例如引線架等金屬表面的情況下,在引線架及晶片之間的密接力等方面存在改善的餘地。 [解決課題之技術手段] However, as a result of the present inventors' investigations, the silver-containing paste described in the above-mentioned document is improved in terms of the adhesion force between the lead frame and the chip, etc., when bonding a semiconductor chip to a metal surface such as a lead frame. room for. [Technical means to solve the problem]

本發明人等根據這種見解進行了深入研究,發現藉由適當選擇具有輔助金屬粒子彼此的燒結的特性的樹脂,並進一步添加密接助劑,藉此改善了引線架及晶片之間的密接性,進而完成了本發明。The inventors of the present invention conducted intensive research based on this knowledge, and found that the adhesion between the lead frame and the chip was improved by appropriately selecting a resin having a property of assisting sintering of metal particles and further adding an adhesion auxiliary agent. , and then completed the present invention.

藉由本發明,提供一種含銀糊劑,其包含: 含銀粒子; 氰胺衍生物; 溶劑;及 由(A)分子內具有2個以上環氧基之環氧化合物、及(B)分子內包含2個以上聚合性雙鍵之(甲基)丙烯酸化合物中的至少一者或兩者構成之多官能化合物。 [發明之效果] By the present invention, a kind of silver-containing paste is provided, it comprises: Silver particles; Cyanamide derivatives; solvents; and Consisting of at least one or both of (A) an epoxy compound having two or more epoxy groups in the molecule, and (B) a (meth)acrylic compound containing two or more polymerizable double bonds in the molecule functional compound. [Effect of Invention]

藉由本發明,提供一種引線架及晶片之間的密接力優異之含銀糊劑。According to this invention, the silver-containing paste excellent in the adhesive force between a lead frame and a chip is provided.

<含銀糊劑> 對本實施形態之含銀糊劑的概要進行說明。 本實施形態之含銀糊劑包含:含銀粒子、氰胺衍生物、溶劑、及由(A)分子內具有2個以上環氧基之環氧化合物、及(B)分子內包含2個以上聚合性雙鍵之(甲基)丙烯酸化合物中的至少一者或兩者構成之多官能化合物。 <Silver-containing paste> The outline of the silver-containing paste of this embodiment is demonstrated. The silver-containing paste of this embodiment includes: silver-containing particles, cyanamide derivatives, solvents, and (A) epoxy compounds having two or more epoxy groups in the molecule, and (B) containing two or more epoxy groups in the molecule A polyfunctional compound composed of at least one or both of (meth)acrylic compounds with polymerizable double bonds.

在本實施形態中,藉由包含氰胺衍生物,提高引線架及晶片之間的密接力。詳細的機制尚不確定,但認為其由於氰胺衍生物的極性所致。 氰胺衍生物在分子內具有2個以上氮原子的孤電子對,進而在氰基中亦具有氮原子。氰胺衍生物藉由具有該氮原子而具有強極性,因此作為與引線架或晶片的密接助劑發揮作用。認為這種氰胺衍生物附著於含銀粒子的表面,藉此提高含銀粒子與引線架及晶片的親和性,其結果,提高了燒結時的引線架及晶片的密接力。 In this embodiment, by including the cyanamide derivative, the adhesion force between the lead frame and the chip is improved. The detailed mechanism is uncertain, but it is considered to be due to the polarity of the cyanamide derivative. The cyanamide derivative has lone electron pairs of two or more nitrogen atoms in the molecule, and also has nitrogen atoms in the cyano group. Since the cyanamide derivative has strong polarity by having this nitrogen atom, it functions as an adhesion aid to a lead frame or a chip. It is considered that the cyanamide derivative adheres to the surface of the silver-containing particles, thereby improving the affinity of the silver-containing particles with the lead frame and the chip, and as a result, the adhesion between the lead frame and the chip during sintering is improved.

此時,藉由將在本實施形態中的含銀糊劑中使用之多官能化合物作為由(A)分子內具有2個以上環氧基之環氧化合物、及(B)分子內包含2個以上聚合性雙鍵之(甲基)丙烯酸化合物中的至少一者或兩者構成之多官能化合物,能夠使氰胺衍生物容易導入到多官能化合物,並合適地提高基於氰胺衍生物之含銀粒子與引線架及晶片的密接力之效果。In this case, by using the polyfunctional compound used in the silver-containing paste in this embodiment as an epoxy compound having two or more epoxy groups in the molecule (A) and (B) including two or more epoxy groups in the molecule A multifunctional compound composed of at least one or both of the above polymerizable double bond (meth)acrylic compounds can easily introduce cyanamide derivatives into the multifunctional compound, and appropriately increase the content of cyanamide derivatives. The effect of the adhesion force between silver particles, lead frame and chip.

以下,對本實施形態之含銀糊劑的各成分進行說明。Hereinafter, each component of the silver-containing paste of this embodiment is demonstrated.

[含銀粒子] 本實施形態之含銀糊劑包含含銀粒子。 本實施形態之含銀粒子係藉由熱處理引起燒結(Sintering)而形成粒子連結結構(燒結構造)之燒結含銀粒子。 [containing silver particles] The silver-containing paste of this embodiment contains silver-containing particles. The silver-containing particles of this embodiment are sintered silver-containing particles that form a particle connection structure (sintered structure) by causing sintering (Sintering) by heat treatment.

尤其,藉由在含銀糊劑中含有含銀粒子,尤其,含有粒徑相對小且比表面積相對大的含銀粒子,即使在相對低溫(180℃左右)中進行熱處理亦容易形成燒結結構。較佳之粒徑留待後述。In particular, by including silver-containing particles in the silver-containing paste, especially silver-containing particles having a relatively small particle size and a relatively large specific surface area, it is easy to form a sintered structure even when heat treatment is performed at a relatively low temperature (about 180° C.). The preferred particle size will be described later.

作為本實施形態之含銀粒子藉由熱處理引起燒結之溫度的上限值,較佳為260℃以下,更佳為250℃以下,進一步較佳為240℃以下。引起燒結之溫度的上限值為上述上限值以下,藉此在使用了本實施形態中的含銀糊劑之電子裝置中,引線架及晶片之間的密接性更合適。 又,作為引起燒結之溫度的下限值,160℃以上為較佳,更佳為165℃以上,進一步較佳為170℃以上。引起燒結之溫度的下限值為上述下限值以上,藉此,在使用了本實施形態中的含銀糊劑之電子裝置中,高溫可靠性更合適。 The upper limit of the temperature at which the silver-containing particles of this embodiment are sintered by heat treatment is preferably 260°C or lower, more preferably 250°C or lower, further preferably 240°C or lower. The upper limit of the temperature at which sintering occurs is not more than the above upper limit, so that the adhesiveness between the lead frame and the chip is more suitable in the electronic device using the silver-containing paste in this embodiment. Also, the lower limit of the temperature at which sintering occurs is preferably 160°C or higher, more preferably 165°C or higher, and still more preferably 170°C or higher. The lower limit of the temperature at which sintering occurs is more than the above-mentioned lower limit, whereby high-temperature reliability is more suitable for an electronic device using the silver-containing paste in this embodiment.

含銀粒子的形狀沒有特別限定。較佳之形狀為球狀,但是亦可以為非球狀的形狀,例如橢圓體狀、扁平狀、板狀、片(flake)狀、針狀、鱗片狀、凝聚狀及多面體形狀等。含銀粒子能夠含有至少一種該等形狀的含銀粒子。 在本實施形態中,包含選自球狀、片狀、鱗片狀、凝聚狀孔多面體形狀的含銀粒子之2種以上為較佳。藉此,進一步提高含銀粒子彼此的接觸率,因此在該含銀糊劑的燒結後容易形成網格且使用了本實施形態中的含銀糊劑之電子裝置中,散熱性更合適。 The shape of the silver-containing particles is not particularly limited. The preferred shape is spherical, but non-spherical shapes such as ellipsoid, flat, plate, flake, needle, scale, agglomerate and polyhedron are also possible. The silver-containing particles can contain at least one of these shapes. In this embodiment, it is preferable to contain two or more kinds of silver-containing particles selected from the group consisting of spherical, flaky, scaly, and aggregated porous polyhedral shapes. Thereby, since the contact rate of silver-containing particle|grains is further improved, it is easy to form a network|network after sintering this silver-containing paste, and in the electronic device using the silver-containing paste in this embodiment, heat dissipation is more suitable.

另外,在本實施形態中,「球狀」並不限於完美的真球,還包括表面上帶有些許凹凸之形狀等。 含銀粒子的表面亦可以被羧酸、碳數4~30的飽和脂肪酸、或一價的碳數4~30的不飽和脂肪酸、長鏈烷基腈等進行處理。 In addition, in this embodiment, the "spherical shape" is not limited to a perfect true sphere, but also includes a shape with some unevenness on the surface. The surface of silver-containing particles may also be treated with carboxylic acid, saturated fatty acid with 4-30 carbon atoms, unsaturated fatty acid with monovalent carbon number 4-30, long-chain alkyl nitrile, and the like.

含銀粒子可以為(i)實質上僅由銀構成之銀粒子(銀粉),亦可以為(ii)由銀和除了銀以外的成分構成之粒子。又,作為含金屬之粒子,亦可以併用(i)及(ii)。The silver-containing particles may be (i) silver particles (silver powder) substantially composed only of silver, or (ii) particles composed of silver and components other than silver. In addition, (i) and (ii) may be used together as the metal-containing particles.

在本實施形態中,作為由銀和除了銀以外的成分構成之粒子,亦能夠包含樹脂粒子的表面被銀塗佈之銀被覆樹脂粒子。在銀被覆樹脂粒子中,銀層只要覆蓋樹脂粒子的表面的至少一部分區域即可。當然,銀亦可以覆蓋樹脂粒子的整個表面。作為這種銀被覆樹脂粒子,例如可以舉出鍍銀聚矽氧樹脂等。In this embodiment, silver-coated resin particles in which the surfaces of resin particles are coated with silver can also be included as particles composed of silver and components other than silver. In the silver-coated resin particle, the silver layer only needs to cover at least a part of the surface of the resin particle. Of course, silver may also cover the entire surface of the resin particles. Examples of such silver-coated resin particles include silver-plated silicone resins and the like.

作為銀被覆樹脂粒子中的「樹脂」,例如可舉出聚矽氧樹脂、(甲基)丙烯酸樹脂、酚樹脂、聚苯乙烯樹脂、三聚氰胺樹脂、聚醯胺樹脂、聚四氟乙烯樹脂等。當然,亦可以為除此之外的樹脂。又,樹脂可以僅為1種,亦可以併用2種以上的樹脂。Examples of the "resin" in the silver-coated resin particles include silicone resins, (meth)acrylic resins, phenol resins, polystyrene resins, melamine resins, polyamide resins, and polytetrafluoroethylene resins. Of course, other resins may also be used. Moreover, only 1 type may be sufficient as resin, and 2 or more types of resin may be used together.

聚矽氧樹脂可以為由有機聚矽氧烷構成之粒子,該有機聚矽氧烷藉由使甲基氯矽烷、三甲基三氯矽烷、二甲基二氯矽烷等有機氯矽烷聚合而得。又,亦可以為以將有機聚矽氧烷進一步三維交聯而成之結構為基本骨架之聚矽氧樹脂。The polysiloxane resin may be particles composed of organopolysiloxane obtained by polymerizing organochlorosilanes such as methylchlorosilane, trimethyltrichlorosilane, and dimethyldichlorosilane . Also, it may be a polysiloxane resin having a structure obtained by further three-dimensionally crosslinking an organopolysiloxane as a basic skeleton.

(甲基)丙烯酸樹脂可以為使含有(甲基)丙烯酸酯作為主成分(50重量%以上,較佳為70重量%以上,更佳為90重量%以上)之單體聚合而得之樹脂。作為(甲基)丙烯酸酯,例如可舉出選自由(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-丙酯、(甲基)丙烯酸氯-2-羥乙酯、單(甲基)丙烯酸二乙二醇酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊烯酯及(甲基)丙烯酸異莰酯組成之群中之至少一種化合物。又,丙烯酸系樹脂的單體成分可以含有少量的其他單體。The (meth)acrylic resin may be a resin obtained by polymerizing a monomer containing (meth)acrylate as a main component (at least 50% by weight, preferably at least 70% by weight, more preferably at least 90% by weight). Examples of (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, (meth) 2-ethylhexyl acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth)acrylic acid 2-Propyl ester, Chloro-2-hydroxyethyl (meth)acrylate, Diethylene glycol mono(meth)acrylate, Methoxyethyl (meth)acrylate, Glycidyl (meth)acrylate , dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, and isobornyl (meth)acrylate. In addition, the monomer component of the acrylic resin may contain a small amount of other monomers.

可以在聚矽氧樹脂或(甲基)丙烯酸樹脂中導入各種官能基。可導入之官能基沒有特別限定。例如可舉出環氧基、胺基、甲氧基、苯基、羧基、羥基、烷基、乙烯基、巰基等。Various functional groups can be introduced into silicone resin or (meth)acrylic resin. The functional group that can be introduced is not particularly limited. For example, an epoxy group, an amino group, a methoxy group, a phenyl group, a carboxyl group, a hydroxyl group, an alkyl group, a vinyl group, a mercapto group etc. are mentioned.

銀被覆樹脂粒子中的樹脂粒子的部分可以含有各種添加成分,例如低應力改質劑等。作為低應力改質劑,可舉出丁二烯苯乙烯橡膠、丁二烯丙烯腈橡膠、聚胺酯(polyurethane)橡膠、聚異戊二烯橡膠、丙烯酸橡膠、氟橡膠、液狀有機聚矽氧烷、液狀聚丁二烯等液狀合成橡膠等。The part of the resin particle among the silver-coated resin particles may contain various additive components such as a stress-reducing modifier and the like. Examples of low stress modifiers include butadiene styrene rubber, butadiene acrylonitrile rubber, polyurethane (polyurethane) rubber, polyisoprene rubber, acrylic rubber, fluororubber, liquid organopolysiloxane , Liquid synthetic rubber such as liquid polybutadiene, etc.

含銀粒子的中值粒徑D 50例如為0.001~1000μm,較佳為0.01~100μm,更佳為0.1~20μm。藉由將D 50設為適當的值,容易保持導熱性、燒結性、對熱循環之耐性等的平衡。又,藉由將D 50設為適當的值,亦有可謀求提高塗佈/接著的作業性之提高之情形。 含銀粒子的粒度分布(橫軸:粒徑、縱軸:頻率)可以為單峰性,亦可以為多峰性。 The median diameter D 50 of the silver-containing particles is, for example, 0.001-1000 μm, preferably 0.01-100 μm, more preferably 0.1-20 μm. By setting D 50 to an appropriate value, it is easy to maintain a balance of thermal conductivity, sinterability, resistance to thermal cycles, and the like. In addition, by setting D50 to an appropriate value, it may be possible to improve the workability of coating/bonding. The particle size distribution of the silver-containing particles (horizontal axis: particle size, vertical axis: frequency) may be unimodal or multimodal.

(i)實質上僅由銀構成之粒子的中值粒徑D 50例如為0.8μm以上,較佳為1.0μm以上,更佳為1.2μm以上。藉此,能夠使燒結結構堅固,在使用了本實施形態中的含銀糊劑之電子裝置中,能夠使引線架及晶片之間的密接性更合適。 (i) The median diameter D 50 of the particles consisting essentially of silver is, for example, 0.8 μm or more, preferably 1.0 μm or more, more preferably 1.2 μm or more. Thereby, the sintered structure can be made strong, and in the electronic device using the silver-containing paste in this embodiment, the adhesiveness between a lead frame and a chip can be made more suitable.

又,(i)實質上僅由銀構成之粒子的中值粒徑D 50例如為10.0μm,較佳為8.0μm以下,更佳為6.0μm以下。藉此,能夠謀求易燒結性之進一步提高和燒結的均勻性之提高等。 Also, (i) the median diameter D 50 of the particles consisting substantially only of silver is, for example, 10.0 μm, preferably 8.0 μm or less, more preferably 6.0 μm or less. Thereby, the further improvement of sinterability, the improvement of the uniformity of sintering, etc. can be aimed at.

(ii)由銀和除了銀以外的成分構成之粒子的中值粒徑D 50例如為0.5μm以上,較佳為1.5μm以上,更佳為2.0μm以上。藉此,容易將儲存模數設為適當的值。 (ii) The median diameter D 50 of the particles composed of silver and components other than silver is, for example, 0.5 μm or more, preferably 1.5 μm or more, more preferably 2.0 μm or more. Thereby, it is easy to set the storage modulus to an appropriate value.

又,(ii)由銀和除了銀以外的成分構成之粒子的中值粒徑D 50例如為20μm以下,較佳為15μm以下,更佳為10μm以下。藉此,能夠謀求易燒結性之進一步提高和燒結的均勻性之提高等。 Also, (ii) the median diameter D 50 of the particles composed of silver and components other than silver is, for example, 20 μm or less, preferably 15 μm or less, more preferably 10 μm or less. Thereby, the further improvement of sinterability, the improvement of the uniformity of sintering, etc. can be aimed at.

含銀粒子的中值粒徑D 50例如能夠藉由使用Sysmex Corporation製流動式粒子像分析裝置FPIA(註冊商標)-3000進行粒子影像測量來求出。更具體而言,能夠藉由使用該裝置以濕式測量體積基準的中值粒徑來確定含銀粒子的粒徑。 The median particle diameter D 50 of the silver-containing particles can be obtained, for example, by performing particle image measurement using a flow type particle image analyzer FPIA (registered trademark)-3000 manufactured by Sysmex Corporation. More specifically, the particle diameter of the silver-containing particles can be determined by wet measurement of the volume-based median diameter using the apparatus.

相對於除了後述之溶劑以外的固體成分100質量%,含銀糊劑中的含銀粒子的含量較佳為80.0質量%以上且99.0質量%以下,更佳為82.5質量%以上且97.5質量%以下,進一步較佳為85.0質量%以上且95質量%。 藉由本實施形態的含銀糊劑中的含銀粒子的含量為該範圍,能夠使燒結結構更堅固,在使用了本實施形態中的含銀糊劑之電子裝置中,能夠使引線架及晶片之間的密接性更合適。 The content of the silver-containing particles in the silver-containing paste is preferably from 80.0% by mass to 99.0% by mass, more preferably from 82.5% by mass to 97.5% by mass, relative to 100% by mass of the solid content excluding the solvent described below. , and more preferably at least 85.0% by mass and 95% by mass. With the content of silver-containing particles in the silver-containing paste of this embodiment within this range, the sintered structure can be made stronger, and in electronic devices using the silver-containing paste of this embodiment, lead frames and chips can be made The closeness between them is more appropriate.

含銀粒子中實質上僅由銀構成之粒子例如能夠從DOWA HIGHTECH CO.,LTD.、Fukuda Metal Foil & Powder Co.,Ltd.等獲取。又,銀被覆樹脂粒子例如能夠從Mitsubishi Materials Corporation、Sekisui Chemical Co.,Ltd.、Sanno Co.,Ltd.等獲取。Among the silver-containing particles, those composed of substantially only silver can be obtained from, for example, DOWA HIGHTECH CO., LTD., Fukuda Metal Foil & Powder Co., Ltd., and the like. Moreover, the silver-coated resin particle can be acquired from Mitsubishi Materials Corporation, Sekisui Chemical Co., Ltd., Sanno Co., Ltd., etc., for example.

在本實施形態中,含銀粒子的比表面積能夠設為0.10m 2/g以上為較佳,較佳為0.15m 2/g以上,進一步較佳為0.20m 2/g。上限值並無特別限定,但從獲得觀點考慮,能夠設為2.0m 2/g以下。在包含2種以上的含銀粒子的情況下,含銀粒子的比表面積為其平均值。含銀粒子的比表面積設為使用自動比表面積測量裝置來測量之BET比表面積。 藉由本實施形態的含銀粒子的比表面積為該範圍,能夠使燒結結構堅固,在使用了本實施形態中的含銀糊劑之電子裝置中,能夠使引線架及晶片之間的密接性更合適。 在本實施形態中,從本發明的效果的觀點考慮,使用2種以上比表面積不同的含銀粒子為更佳。 In the present embodiment, the specific surface area of the silver-containing particles is preferably 0.10 m 2 /g or more, preferably 0.15 m 2 /g or more, and more preferably 0.20 m 2 /g. The upper limit is not particularly limited, but can be set to 2.0 m 2 /g or less from the viewpoint of yield. When two or more types of silver-containing particles are contained, the specific surface area of the silver-containing particles is an average value thereof. The specific surface area of the silver-containing particles was set as the BET specific surface area measured using an automatic specific surface area measuring device. With the specific surface area of the silver-containing particles of this embodiment within this range, the sintered structure can be made strong, and in an electronic device using the silver-containing paste of this embodiment, the adhesion between the lead frame and the chip can be improved. suitable. In this embodiment, it is more preferable to use two or more types of silver-containing particles with different specific surface areas from the viewpoint of the effects of the present invention.

另外,含銀粒子的振實密度能夠設為較佳為4.0g/cm 3以上,更佳為4.5g/cm 3以上,進一步較佳為5.0g/cm 3以上,特佳為5.5g/cm 3以上。上限值並無特別限定,但能夠設為8.0g/cm 3以下。 振實密度根據ISO 3953-1985(E)的「金屬粉-振實密度的測量方法」測量。 藉由該振實密度,容易使糊劑黏度成為適當的值。 In addition, the tap density of the silver-containing particles can be set to preferably 4.0 g/cm 3 or more, more preferably 4.5 g/cm 3 or more, further preferably 5.0 g/cm 3 or more, particularly preferably 5.5 g/cm 3 or more. 3 or more. The upper limit is not particularly limited, but can be set to 8.0 g/cm 3 or less. The tap density was measured in accordance with ISO 3953-1985 (E) "Metal powder-Measurement method of tap density". This tap density makes it easy to set the paste viscosity to an appropriate value.

[氰胺衍生物] 本實施形態之含銀糊劑進一步包含氰胺衍生物。 藉由氰胺衍生物,如上述提高含銀粒子與引線架及晶片的親和性,其結果,提高了燒結時的引線架及晶片的密接力。 [cyanamide derivatives] The silver-containing paste of this embodiment further contains a cyanamide derivative. The cyanamide derivative improves the affinity of the silver-containing particles with the lead frame and the chip as described above, and as a result, the adhesive force between the lead frame and the chip during sintering is improved.

通常,氰胺衍生物添加到後述之多官能化合物之情況下,作為硬化促進劑起作用。另一方面,本實施形態中的氰胺衍生物具有作為提高引線架與晶片之間的密接性之密接助劑的功能,藉由進一步加入除了氰胺衍生物以外的硬化促進劑,能夠謀求本實施形態之含銀糊劑的機械特性及引線架與晶片之間的密接性之兼顧。Usually, when a cyanamide derivative is added to the polyfunctional compound mentioned later, it functions as a hardening accelerator. On the other hand, the cyanamide derivative in this embodiment has a function as an adhesion aid to improve the adhesion between the lead frame and the chip, and by further adding a hardening accelerator other than the cyanamide derivative, the present invention can be achieved. The mechanical properties of the silver-containing paste of the embodiment and the adhesiveness between the lead frame and the chip are balanced.

作為氰胺衍生物,例如可以舉出二氰二胺;胍;胺磺酸胍、磷酸胍等胍鹽;三聚氰胺;甲脒脲及雙胍等。該等可以單獨使用,亦可以組合複數個來使用。又,在該等中,從燒結時的引線架及晶片的密接力的觀點考慮,包含選自二氰二胺、胍、胍鹽、三聚氰胺及甲脒脲之1種或2種以上為較佳,二氰二胺為更佳。Examples of cyanamide derivatives include dicyandiamine; guanidine; guanidine salts such as guanidine sulfamate and phosphate; melamine; These may be used alone or in combination of a plurality of them. Moreover, among these, it is preferable to contain one or more kinds selected from dicyandiamide, guanidine, guanidine salt, melamine, and formamiduron from the viewpoint of the adhesive force between the lead frame and the wafer during sintering. , dicyandiamide is more preferred.

作為上述氰胺衍生物的含量的上限值,將後述之本實施形態之多官能化合物的含量設為100質量份時,較佳為3質量份以下,更佳為2.7質量份以下,進一步較佳為2.5質量份以下。藉由將氰胺衍生物的含量設為上述上限值以下,能夠使含銀糊劑的散熱性更合適。 作為上述氰胺衍生物的含量的下限值,將後述之本實施形態之多官能化合物的含量設為100質量份時,較佳為0.01質量份以上,更佳為0.05質量份以上,進一步較佳為0.1質量份以上。藉由將氰胺衍生物的含量設為上述下限值以上,能夠使燒結時的引線架及晶片的密接力更合適。 The upper limit of the content of the above-mentioned cyanamide derivative is preferably 3 parts by mass or less, more preferably 2.7 parts by mass or less when the content of the polyfunctional compound of the present embodiment described later is 100 parts by mass, and is further preferably 2.7 parts by mass or less. Preferably, it is 2.5 parts by mass or less. By making content of a cyanamide derivative below the said upper limit, the heat radiation property of a silver-containing paste can be made more suitable. The lower limit of the content of the cyanamide derivative is preferably 0.01 parts by mass or more, more preferably 0.05 parts by mass or more, and even more preferably 0.01 parts by mass or more when the content of the polyfunctional compound of the present embodiment described later is 100 parts by mass. Preferably, it is 0.1 mass part or more. By making content of a cyanamide derivative more than the said lower limit, the adhesive force of the lead frame and a wafer at the time of sintering can be made more suitable.

[溶劑] 本實施形態之含銀糊劑進一步包含溶劑。 藉由溶劑,例如能夠謀求含銀糊劑的流動性之調整,在基材上形成接著層時的作業性之提高等。 [solvent] The silver-containing paste of this embodiment further contains a solvent. With the solvent, for example, adjustment of fluidity of the silver-containing paste, improvement of workability when forming an adhesive layer on a base material, and the like can be achieved.

作為溶劑,例如可以舉出乙醇、丙醇、丁醇、戊醇、己醇、庚醇、辛醇、壬醇、癸醇、乙二醇單甲醚、乙二醇單乙醚、乙二醇單丙醚、乙二醇單丁醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丙醚、丙二醇單丁醚、甲基甲氧基丁醇、α-萜品醇、β-萜品醇、己二醇、苯甲醇、2-苯乙醇、異棕櫚醇、異硬脂醇、月桂醇、乙二醇、丙二醇、乙基己二醇、丁基丙二醇或甘油等醇類;丙酮、甲基乙基酮、甲基異丁基酮、環己酮、二丙酮醇(4-羥基-4-甲基-2-戊酮)、2-辛酮、異佛酮(3,5,5-三甲基-2-環己烯-1-基)或二異丁基酮(2,6-二甲基-4-庚酮)等酮類;乙酸乙酯、乙酸丁酯、鄰苯二甲酸二乙酯、鄰苯二甲酸二丁酯、乙醯氧乙酸、丁酸甲酯、己酸甲酯、辛酸甲酯、癸酸甲酯、乙酸甲賽璐蘇、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、1,2-二乙醯氧基乙烷、磷酸三丁酯、磷酸三甲苯酯或磷酸三戊酯等酯類;四氫呋喃、二丙醚、乙二醇二甲醚、乙二醇二乙醚、乙二醇二丁醚、丙二醇二甲醚、乙氧基乙基醚、1,2-雙(2-二乙氧基)乙烷或1,2-雙(2-甲氧基乙氧基)乙烷等醚類;乙酸2-(2-丁氧基乙氧基)乙烷和其他酯醚類;2-(2-甲氧基乙氧基)乙醇等醚醇類;甲苯、二甲苯、正烷烴、異烷烴、十二烷基苯、萜品油、煤油或柴油等烴類;乙腈或丙腈等腈類;乙醯胺或N,N-二甲基甲醯胺等醯胺類;低分子量的揮發性矽油或揮發性有機改質矽油。 該等可以僅使用1種溶劑,亦可以併用2種以上的溶劑。 Examples of solvents include ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, nonanol, decanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether, Propyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, methyl methoxybutanol, α-terpineol, β-terpineol, hexyl Alcohols such as glycol, benzyl alcohol, 2-phenylethyl alcohol, isopalmityl alcohol, isostearyl alcohol, lauryl alcohol, ethylene glycol, propylene glycol, ethyl hexanediol, butyl propylene glycol or glycerin; acetone, methyl ethyl Ketone, methyl isobutyl ketone, cyclohexanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), 2-octanone, isophorone (3,5,5-trimethyl -2-cyclohexen-1-yl) or ketones such as diisobutyl ketone (2,6-dimethyl-4-heptanone); ethyl acetate, butyl acetate, diethyl phthalate , dibutyl phthalate, acetoxyacetic acid, methyl butyrate, methyl caproate, methyl caprylate, methyl caprate, methyl celluloid acetate, ethylene glycol monobutyl ether acetate, propylene glycol Esters such as monomethyl ether acetate, 1,2-diacetyloxyethane, tributyl phosphate, tricresyl phosphate or tripentyl phosphate; tetrahydrofuran, dipropyl ether, ethylene glycol dimethyl ether, Ethylene glycol diethyl ether, ethylene glycol dibutyl ether, propylene glycol dimethyl ether, ethoxyethyl ether, 1,2-bis(2-diethoxy)ethane or 1,2-bis(2-methyl 2-(2-butoxyethoxy)ethane and other ethers; 2-(2-butoxyethoxy)ethane and other ester ethers; 2-(2-methoxyethoxy)ethanol and other ether alcohols ; Hydrocarbons such as toluene, xylene, n-alkane, isoalkane, dodecylbenzene, terpineol, kerosene or diesel; Nitriles such as acetonitrile or propionitrile; Acetamide or N,N-dimethylformamide Amides such as amines; low molecular weight volatile silicone oil or volatile organically modified silicone oil. These may use only 1 type of solvent, and may use 2 or more types of solvents together.

上述溶劑的沸點較佳為150℃以上,更佳為170℃以上,進一步較佳為200℃以上。沸點的上限值若藉由燒結消失則並無特別限定,在本實施形態中能夠設為300℃以下。 藉由將溶劑的沸點設為上述範圍內,能夠使在基材上接著含銀糊劑時的作業性更合適。 The above solvent has a boiling point of preferably 150°C or higher, more preferably 170°C or higher, further preferably 200°C or higher. The upper limit of the boiling point is not particularly limited as long as it disappears by sintering, but it can be set to 300° C. or lower in the present embodiment. By making the boiling point of a solvent into the said range, the workability|operativity at the time of adhering a silver-containing paste to a base material can be made more suitable.

在本實施形態的含銀糊劑100質量%中,上述溶劑較佳為能夠包含1質量%以上且10質量%以下,進一步較佳為能夠包含2質量%以上且8質量%以下。藉由將溶劑的含量設為上述範圍內,能夠使在基材上接著含銀糊劑時的作業性更合適。In 100% by mass of the silver-containing paste of the present embodiment, the above-mentioned solvent can preferably be contained in an amount of 1% by mass to 10% by mass, and more preferably can be contained in an amount of 2% by mass to 8% by mass. By making content of a solvent into the said range, the workability|operativity at the time of adhering a silver-containing paste to a base material can be made more suitable.

[多官能化合物] 本實施形態之含銀糊劑包含多官能化合物。 作為本實施形態之多官能化合物,係由(A)分子內具有2個以上環氧基之環氧化合物、及(B)分子內包含2個以上聚合性雙鍵之(甲基)丙烯酸化合物中的至少一者或兩者構成之多官能化合物。藉由使用多官能化合物,藉由樹脂的凝聚效果,容易形成含銀粒子彼此的燒結結構。 [Multifunctional compound] The silver-containing paste of this embodiment contains a polyfunctional compound. The polyfunctional compound of this embodiment is composed of (A) an epoxy compound having two or more epoxy groups in the molecule, and (B) a (meth)acrylic compound having two or more polymerizable double bonds in the molecule. A multifunctional compound composed of at least one or both of them. By using the polyfunctional compound, the sintered structure of the silver-containing particles can be easily formed through the aggregation effect of the resin.

作為本實施形態之環氧化合物,例如可以舉出苯酚酚醛清漆型環氧化合物、甲酚酚醛清漆型環氧化合物、甲酚萘酚型環氧化合物、聯苯型環氧化合物、聯苯芳烷基型環氧化合物、苯氧基化合物、萘骨架型環氧化合物、雙酚A型環氧化合物、雙酚F型環氧化合物、二烯丙基雙酚A型環氧化合物、雙酚A型二環氧丙基醚型環氧化合物、雙酚F型二環氧丙基醚型環氧化合物、雙酚S型二環氧丙基醚型環氧化合物、o-烯丙基雙酚A型二環氧丙基醚、3,3',5,5'-四甲基4,4'-二羥基聯苯二環氧丙基醚型環氧化合物、1,1,2,2-四(羥基苯基)乙烷型環氧化合物、4,4'-二羥基聯苯二環氧丙基醚型環氧化合物、溴型甲酚酚醛清漆型環氧化合物、雙酚D型二環氧丙基醚型環氧化合物、1,6-萘二醇的環氧丙基醚、胺基苯酚類的三環氧丙基醚等環氧化合物。該等可以單獨使用,亦可以組合複數個來使用。又,在該等中,包含選自雙酚A型環氧化合物及雙酚F型環氧化合物之1種或其兩者為較佳,包含雙酚F型環氧化合物為更佳。藉由從上述種類選擇環氧化合物,能夠謀求易燒結性之進一步提高、燒結的均勻性之提高等。 又,環氧化合物能夠使用在25℃時為固體狀者、液狀者中的任一個。 Examples of the epoxy compound in this embodiment include phenol novolak type epoxy compounds, cresol novolac type epoxy compounds, cresol naphthol type epoxy compounds, biphenyl type epoxy compounds, biphenylarane Base type epoxy compound, phenoxy compound, naphthalene skeleton type epoxy compound, bisphenol A type epoxy compound, bisphenol F type epoxy compound, diallyl bisphenol A type epoxy compound, bisphenol A type Diglycidyl ether type epoxy compound, Bisphenol F type Diglycidyl ether type epoxy compound, Bisphenol S type Diglycidyl ether type epoxy compound, o-allyl bisphenol A type Diglycidyl ether, 3,3',5,5'-tetramethyl 4,4'-dihydroxybiphenyl diglycidyl ether type epoxy compound, 1,1,2,2-tetra( Hydroxyphenyl) ethane type epoxy compound, 4,4'-dihydroxybiphenyl diglycidyl ether type epoxy compound, bromocresol novolac type epoxy compound, bisphenol D type epoxypropylene Epoxy compounds such as base ether epoxy compounds, glycidyl ethers of 1,6-naphthalene diol, and triglycidyl ethers of aminophenols. These may be used alone or in combination of a plurality of them. Moreover, among these, it is preferable to contain 1 type or both selected from the bisphenol A type epoxy compound and the bisphenol F type epoxy compound, and it is more preferable to contain the bisphenol F type epoxy compound. By selecting an epoxy compound from the above-mentioned types, further improvement of sinterability, improvement of the uniformity of sintering, etc. can be aimed at. In addition, as the epoxy compound, either a solid or liquid epoxy compound can be used at 25°C.

作為本實施形態之(甲基)丙烯酸化合物,例如可以舉出乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯等2官能(甲基)丙烯酸酯;三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯等3官能以上的多官能(甲基)丙烯酸酯;2官能以上的環氧(甲基)丙烯酸酯;2官能以上的胺酯(甲基)丙烯酸酯;2官能以上的聚酯(甲基)丙烯酸酯。該等可以單獨使用,亦可以組合複數個來使用。又,在該等中,包含選自2官能(甲基)丙烯酸酯及3官能以上的多官能(甲基)丙烯酸酯之一者或其兩者為較佳,包含乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯等2官能(甲基)丙烯酸酯為更佳,包含乙二醇二(甲基)丙烯酸酯為進一步較佳。藉由從上述種類選擇(甲基)丙烯酸化合物,能夠謀求易燒結性之進一步提高、燒結的均勻性之提高等。Examples of the (meth)acrylic compound in this embodiment include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and triethylene glycol di(meth)acrylate. , tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate and other bifunctional (meth)acrylates; trimethylolpropane tri(meth)acrylate, neopentyl tetra Polyfunctional (meth)acrylates with more than 3 functions such as alcohol tri(meth)acrylates; epoxy (meth)acrylates with more than 2 functions; amine ester (meth)acrylates with more than 2 functions; 2 functions Polyester (meth)acrylate above. These may be used alone or in combination of a plurality of them. Also, among these, it is preferable to include one or both of bifunctional (meth)acrylates and trifunctional or more multifunctional (meth)acrylates, including ethylene glycol di(meth)acrylate ) acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate Bifunctional (meth)acrylates, such as ester, are more preferable, and it is still more preferable to contain ethylene glycol di(meth)acrylate. By selecting the (meth)acrylic compound from the above-mentioned types, it is possible to further improve the sinterability, improve the uniformity of sintering, and the like.

在本實施形態中,多官能化合物的含量的下限值並無特別限定,例如相對於含銀糊劑的固體成分總量,可以包含1質量%以上,亦可以包含3質量%以上,亦可以包含5質量%以上。藉此,能發揮作為硬化物的適當的機械特性。 又,多官能化合物的含量的上限值並無特別限定,例如相對於含銀糊劑的固體成分總量,可以包含20質量%以下,亦可以包含15質量%以下,亦可以包含10質量%以下。 In the present embodiment, the lower limit of the content of the polyfunctional compound is not particularly limited, and for example, it may contain 1% by mass or more, 3% by mass or more, or Contains 5% by mass or more. Thereby, suitable mechanical characteristics can be exhibited as a cured product. In addition, the upper limit of the content of the polyfunctional compound is not particularly limited. For example, it may be 20% by mass or less, 15% by mass or less, or 10% by mass relative to the total solid content of the silver-containing paste. the following.

在本實施形態中,多官能化合物的硬化物的玻璃轉移溫度(Tg)的下限值並無特別限定,例如可以設為60℃以上,亦可以設為65℃以上,亦可以設為70℃以上。該玻璃轉移溫度(Tg)的上限值並無特別限定,例如可以設為300℃以下,亦可以設為290℃以下,亦可以設為280℃以下。藉此,可獲得耐熱性。In this embodiment, the lower limit of the glass transition temperature (Tg) of the cured product of the polyfunctional compound is not particularly limited, for example, it may be 60°C or higher, 65°C or higher, or 70°C. above. The upper limit of the glass transition temperature (Tg) is not particularly limited, and may be, for example, 300° C. or lower, 290° C. or lower, or 280° C. or lower. Thereby, heat resistance can be obtained.

在本實施形態中,作為測量玻璃轉移溫度之方法,例如使用熱機械分析裝置(TMA SS7100,SII Nanotechnology公司製)等。In this embodiment, as a method of measuring the glass transition temperature, for example, a thermomechanical analyzer (TMA SS7100, manufactured by SII Nanotechnology Co., Ltd.) or the like is used.

[其他成分] 在本實施形態之含銀糊劑中,根據需要,亦能夠添加硬化劑、硬化促進劑、塑化劑、起始劑、抗氧化劑、分散劑、二氧化矽、氧化鋁等無機填充材料、聚矽氧樹脂或丁二烯橡膠等其他彈性體、偶合劑、起始劑、消泡劑、調平劑、微細二氧化矽(觸變改質劑)等成分。該等成分的含量能夠根據適用含銀糊劑之用途適當設定。 [other ingredients] In the silver-containing paste of this embodiment, if necessary, it is also possible to add hardeners, hardening accelerators, plasticizers, initiators, antioxidants, dispersants, inorganic fillers such as silica and alumina, and polymers. Other elastomers such as silicone resin or butadiene rubber, coupling agent, initiator, defoamer, leveling agent, fine silicon dioxide (thixotropic modifier) and other components. The contents of these components can be appropriately set according to the application of the silver-containing paste.

(硬化劑) 在本實施形態之含銀糊劑中,例如能夠包含硬化劑。作為硬化劑,只要係促進多官能化合物(例如環氧化合物)的聚合反應者,則並無特別限定。藉此,能夠促進上述多官能化合物的聚合反應,有助於提高使用含銀糊劑而獲得之機械特性。 (hardener) In the silver-containing paste of this embodiment, for example, a curing agent can be contained. The curing agent is not particularly limited as long as it accelerates the polymerization reaction of polyfunctional compounds (for example, epoxy compounds). Thereby, the polymerization reaction of the above-mentioned polyfunctional compound can be accelerated, which contributes to the improvement of the mechanical properties obtained by using the silver-containing paste.

本實施形態的硬化劑能夠從公知者中適當選擇而用作多官能化合物的硬化劑。具體而言,例如,能夠舉出酚樹脂系硬化劑、胺系硬化劑、酸酐系硬化劑、硫醇系硬化劑等。可以單獨使用該等,亦可以組合2種以上來使用。The hardening agent of this embodiment can be suitably selected from well-known ones, and it can be used as a hardening agent of a polyfunctional compound. Specifically, for example, phenol resin-based curing agents, amine-based curing agents, acid anhydride-based curing agents, mercaptan-based curing agents, and the like can be mentioned. These may be used alone or in combination of two or more.

作為上述酚樹脂系硬化劑,例如能夠使用苯酚酚醛清漆樹脂、甲酚酚醛清漆樹脂、萘酚酚醛清漆樹脂、胺基三𠯤酚醛清漆樹脂、酚醛清漆樹脂、三苯甲烷型苯酚酚醛清漆樹脂等酚醛清漆型酚樹脂;萜烯改質酚樹脂、二環戊二烯改質酚樹脂等改質酚樹脂;具有伸苯基骨架和/或聯伸苯基骨架之苯酚芳烷基樹脂、具有伸苯基骨架和/或聯伸苯基骨架之萘酚芳烷基樹脂等芳烷基型樹脂;雙酚A、雙酚F等具有雙酚骨架之雙酚樹脂;可溶型酚樹脂等。該等可以單獨使用,亦可以組合複數個來使用。又,該等中,具有雙酚A、雙酚F等具有雙酚骨架之雙酚樹脂為較佳,具有雙酚F骨架之雙酚樹脂為更佳。藉由從上述種類選擇硬化劑,能夠提高使用含銀糊劑獲得之機械特性,從而改善引線架及晶片之間的密接性。As the above-mentioned phenolic resin-based hardener, for example, phenol novolac resin, cresol novolac resin, naphthol novolac resin, aminotrisium novolac resin, novolak resin, triphenylmethane type phenol novolak resin, etc. can be used. Varnish-type phenolic resins; modified phenolic resins such as terpene-modified phenolic resins and dicyclopentadiene-modified phenolic resins; Aralkyl type resins such as naphthol aralkyl resins with base skeleton and/or biphenylene skeleton; bisphenol resins with bisphenol skeletons such as bisphenol A and bisphenol F; soluble phenol resins, etc. These may be used alone or in combination of a plurality of them. Also, among these, bisphenol resins having a bisphenol skeleton such as bisphenol A and bisphenol F are preferable, and bisphenol resins having a bisphenol F skeleton are more preferable. By selecting a hardener from the above-mentioned types, it is possible to improve the mechanical properties obtained by using the silver-containing paste, thereby improving the adhesiveness between the lead frame and the chip.

作為上述胺系硬化劑,例如能夠包含具有三級胺基之化合物。具有三級胺基之化合物例如可以舉出:苄基二甲胺(BDMA)等三級胺類、2-甲基咪唑、2-乙基-4-甲基咪唑(EMI24)等咪唑類、吡唑、3,5-二甲基吡唑、吡唑啉等吡唑類、三唑、1,2,3-三唑、1,2,4-三唑、1,2,3-苯并三唑等三唑類、咪唑啉、2-甲基-2-咪唑啉、2-苯基咪唑啉等咪唑啉類,能夠包含選自該等之1種或2種以上。As said amine hardening agent, the compound which has a tertiary amino group can be contained, for example. Compounds having a tertiary amine group include, for example, tertiary amines such as benzyldimethylamine (BDMA), imidazoles such as 2-methylimidazole and 2-ethyl-4-methylimidazole (EMI24), pyridine Azole, 3,5-dimethylpyrazole, pyrazoline and other pyrazoles, triazole, 1,2,3-triazole, 1,2,4-triazole, 1,2,3-benzotriazole Triazoles such as azoles, and imidazolines such as imidazoline, 2-methyl-2-imidazoline, and 2-phenylimidazoline can contain one or two or more selected from these.

本實施形態之含銀糊劑中包含之硬化劑的含量的上限值並無特別限定,例如相對於多官能化合物100重量份,25重量份以下為較佳,5重量份以下為更佳,3重量份以下為進一步較佳,1重量份以下為特佳。該硬化劑的含量的下限值並無特別限定,例如為0重量份以上為較佳,從提高含銀糊劑的機械特性的觀點考慮,0.1重量份以上為更佳。The upper limit of the content of the curing agent contained in the silver-containing paste of the present embodiment is not particularly limited, for example, with respect to 100 parts by weight of the polyfunctional compound, preferably 25 parts by weight or less, more preferably 5 parts by weight or less, 3 parts by weight or less is further preferred, and 1 part by weight or less is particularly preferred. The lower limit of the content of the curing agent is not particularly limited, for example, it is preferably 0 part by weight or more, and more preferably 0.1 part by weight or more from the viewpoint of improving the mechanical properties of the silver-containing paste.

(硬化促進劑) 在本實施形態之含銀糊劑中,能夠包含硬化促進劑。在此,作為硬化促進劑,可以包含除了上述之氰胺衍生物以外的硬化促進劑。作為本實施形態之硬化促進劑,並無特別限定,例如可以舉出:聚胺系硬化促進劑、咪唑系硬化促進劑、三苯膦或四苯膦的鹽類等。該等中,作為本實施形態之硬化促進劑,包含選自聚胺系硬化促進劑及咪唑系硬化促進劑之至少一種為較佳,包含咪唑系硬化促進劑為更佳。 (hardening accelerator) In the silver-containing paste of this embodiment, a hardening accelerator can be contained. Here, as the hardening accelerator, hardening accelerators other than the above-mentioned cyanamide derivatives may be contained. The curing accelerator of the present embodiment is not particularly limited, and examples thereof include polyamine-based curing accelerators, imidazole-based curing accelerators, salts of triphenylphosphine or tetraphenylphosphine, and the like. Among them, the curing accelerator of the present embodiment preferably contains at least one selected from polyamine-based curing accelerators and imidazole-based curing accelerators, and more preferably contains imidazole-based curing accelerators.

本實施形態之含銀糊劑中包含之硬化促進劑的含量的上限值並無特別限定,例如相對於多官能化合物100重量份,5重量份以下為較佳,4重量份以下為更佳,3重量份以下為進一步較佳,2重量份以下為進一步較佳。又,硬化促進劑的含量的下限值並無特別限定,例如為0重量份以上為較佳,從提高含銀糊劑的機械特性的觀點考慮,0.1重量份以上為較佳,0.3重量份以上為更佳,0.5質量份以上為進一步較佳。The upper limit of the content of the hardening accelerator contained in the silver-containing paste of this embodiment is not particularly limited, for example, it is preferably 5 parts by weight or less, more preferably 4 parts by weight or less, based on 100 parts by weight of the polyfunctional compound. , 3 parts by weight or less is further preferred, and 2 parts by weight or less is further preferred. Also, the lower limit of the content of the hardening accelerator is not particularly limited, for example, it is preferably 0 part by weight or more, from the viewpoint of improving the mechanical properties of the silver-containing paste, it is preferably 0.1 part by weight or more, and 0.3 parts by weight The above is more preferable, and 0.5 mass part or more is still more preferable.

(塑化劑) 在本實施形態之含銀糊劑中,能夠包含塑化劑。作為本實施形態之塑化劑,並無特別限定,例如可以舉出芳香族羧酸酯、脂肪族單羧酸酯、脂肪族二羧酸酯、脂肪族三羧酸酯、磷酸三酯及石油樹脂等、聚亞烷基二醇系塑化劑、環氧系塑化劑、蓖麻油系塑化劑、新戊二醇二苯甲酸酯、二乙二醇二苯甲酸酯、三乙二醇二-2-丁酸乙酯、聚氧乙烯基二乙酸酯、聚氧乙烯基二(2-乙基己酸酯)、聚氧丙烯單月桂酸酯、聚氧丙烯單硬脂酸酯、聚氧乙烯基二苯甲酸酯、聚氧丙烯二苯甲酸酯等多元醇酯、油酸丁酯等脂肪族羧酸酯、乙醯檸檬酸三乙酯、乙醯檸檬酸三丁酯、檸檬酸乙氧基羰基甲基二丁酯、檸檬酸二-2-乙基己酯、乙醯蓖麻油酸甲酯或乙醯蓖麻油酸丁酯等含氧酸酯、大豆油、大豆油脂肪酸、大豆油脂肪酸酯、環氧化大豆油、菜籽油、菜籽油脂肪酸、菜籽油脂肪酸酯、環氧化菜籽油、亞麻籽油、亞麻籽油脂肪酸、亞麻籽油脂肪酸酯、環氧化亞麻籽油、椰油或椰油脂肪酸等植物油系化合物、新戊四醇、山梨糖醇、聚丙烯酸酯、聚矽氧油或烷烴類、烯烴過氧化物、丁基環氧丙基醚、己基環氧丙基醚、2-乙基己酯環氧丙基醚、烷基環氧丙基醚、烷基酚單環氧丙基醚、鄰甲苯基環氧丙基醚、對正丁基-苯基環氧丙基醚、對三級丁基-苯基環氧丙基醚、壬基苯基環氧丙基醚、椰油脂肪酸環氧丙基醚、烯丙基環氧丙基醚、環氧丙醇、新戊二醇二環氧丙基醚、1,6-己二醇二環氧丙基醚、烷酸環氧丙酯(glycidyl alkanoate)、乙二醇二環氧丙基醚及丙二醇二環氧丙基醚等。 (Plasticizer) A plasticizer can be contained in the silver-containing paste of this embodiment. The plasticizer of this embodiment is not particularly limited, and examples thereof include aromatic carboxylic acid esters, aliphatic monocarboxylic acid esters, aliphatic dicarboxylic acid esters, aliphatic tricarboxylic acid esters, phosphoric acid triesters, and petroleum Resins, etc., polyalkylene glycol-based plasticizers, epoxy-based plasticizers, castor oil-based plasticizers, neopentyl glycol dibenzoate, diethylene glycol dibenzoate, triethylene glycol dibenzoate Ethyl diol di-2-butyrate, polyoxyethylene diacetate, polyoxyethylene bis(2-ethylhexanoate), polyoxypropylene monolaurate, polyoxypropylene monostearate Polyol esters such as polyoxyethylene dibenzoate and polyoxypropylene dibenzoate, aliphatic carboxylic acid esters such as butyl oleate, acetyl triethyl citrate, acetyl tributyl citrate esters, oxyesters such as ethoxycarbonylmethyl dibutyl citrate, di-2-ethylhexyl citrate, methyl acetyl ricinoleate or butyl acetyl ricinoleate, soybean oil, Soybean fatty acid, soybean fatty acid ester, epoxidized soybean oil, rapeseed oil, rapeseed fatty acid, rapeseed fatty acid ester, epoxidized rapeseed oil, linseed oil, linseed fatty acid, linseed fatty acid Esters, epoxidized linseed oil, vegetable oil compounds such as coconut oil or coconut fatty acid, neopentylthritol, sorbitol, polyacrylates, polysiloxane oils or alkanes, olefin peroxides, butylglycidyl Base ether, hexyl glycidyl ether, 2-ethylhexyl glycidyl ether, alkyl glycidyl ether, alkylphenol monoglycidyl ether, o-cresyl glycidyl ether, p- n-butyl-phenylglycidyl ether, p-tertiary butyl-phenylglycidyl ether, nonylphenylglycidyl ether, coconut oil fatty acid glycidyl ether, allyl epoxy Propyl Ether, Glycidyl Alcohol, Neopentyl Glycol Diglycidyl Ether, 1,6-Hexanediol Diglycidyl Ether, Glycidyl Alkanoate, Ethylene Glycol Bicyclo Oxypropyl ether and propylene glycol diglycidyl ether, etc.

塑化劑的含量在該含銀糊劑的總質量中為5質量%以下為較佳,2質量%以下為更佳。若塑化劑的含量為上述上限值以下,則能夠使含銀糊劑的接著性更合適。又,塑化劑的含量的下限值並無特別限定,例如為0質量%以上。The content of the plasticizer is preferably 5% by mass or less, more preferably 2% by mass or less, based on the total mass of the silver-containing paste. The adhesiveness of a silver-containing paste can be made more suitable as content of a plasticizer is below the said upper limit. Moreover, the lower limit of content of a plasticizer is not specifically limited, For example, it is 0 mass % or more.

(偶合劑) 在本實施形態之含銀糊劑中,能夠包含偶合劑。作為本實施形態之偶合劑,並無特別限定,例如可以舉出:如甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、苯基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、己基三甲氧基矽烷、己基三乙氧基矽烷、癸基三甲氧基矽烷的烷氧基矽烷;如甲基三氯矽烷、二甲基二氯矽烷、三甲基氯矽烷、苯基三氯矽烷的氯矽烷;六甲基二矽氮烷;如甲基丙烯醯氧丙基三乙氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷、甲基丙烯醯氧基丙基甲基二乙氧基矽烷、甲基丙烯醯氧基丙基甲基二甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基甲基二甲氧基矽烷、環氧丙氧基丙基三甲氧基矽烷的烷氧基矽烷;如乙烯基三氯矽烷、乙烯基甲基二氯矽烷的氯矽烷;二乙烯基四甲基二矽氮烷。 (coupling agent) In the silver-containing paste of this embodiment, a coupling agent can be contained. The coupling agent of this embodiment is not particularly limited, and examples include: methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, Dimethyldiethoxysilane, phenyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, decyltrimethoxysilane Alkoxysilanes of oxysilanes; chlorosilanes such as methyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltrichlorosilane; hexamethyldisilazane; such as methacrylic Methacryloxypropyltriethoxysilane, Methacryloxypropyltrimethoxysilane, Methacryloxypropylmethyldiethoxysilane, Methacryloxypropylmethyl Diethoxysilane Alkoxysilanes of methoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, vinylmethyldimethoxysilane, glycidoxypropyltrimethoxysilane; such as vinyl Trichlorosilane, chlorosilane of vinylmethyldichlorosilane; divinyltetramethyldisilazane.

將該含銀糊劑中的多官能化合物的質量設為100質量份時,本實施形態之含銀糊劑中包含之偶合劑的含量為5質量份以下為較佳,4質量份以下為更佳,3質量份以下為進一步較佳。若偶合劑的含量為上述上限值以下,則能夠使含銀糊劑的接著性更合適。When the mass of the polyfunctional compound in the silver-containing paste is 100 parts by mass, the content of the coupling agent contained in the silver-containing paste of the present embodiment is preferably 5 parts by mass or less, more preferably 4 parts by mass or less. Preferably, 3 parts by mass or less is still more preferable. The adhesiveness of a silver-containing paste can be made more suitable as content of a coupling agent is below the said upper limit.

(起始劑) 在本實施形態之含銀糊劑中,能夠包含起始劑。作為起始劑,例如可以舉出自由基聚合起始劑等。藉此,例如藉由加熱聚合之化合物包含在分子內具有自由基聚合性雙鍵之化合物之情況下,能夠促進該化合物進行聚合。自由基聚合起始劑例如能夠包含選自下述化合物之1種或2種以上:辛醯基過氧化物、月桂醯基過氧化物、硬酯醯基過氧化物、1,1,3,3-四甲基丁基過氧基2-乙基己酸酯、草酸過氧化物、2,5-二甲基-2,5-二(2-乙基己酸過氧基)己烷、1-環己基-1-甲基乙基過氧基2-乙基己酸酯、三級己基過氧基2-乙基己酸酯、三級丁基過氧基2-乙基己酸酯、間甲苯甲醯基過氧化物、苯甲醯過氧化物、甲基乙基酮過氧化物、乙醯基過氧化物、三級丁基氫過氧化物、二-三級丁基過氧化物、異丙苯氫過氧化物、二異丙苯基過氧化物、過氧苯甲酸三級丁酯、對氯苯甲醯基過氧化物及環己酮過氧化物。 (starter) In the silver-containing paste of this embodiment, an initiator can be contained. As an initiator, a radical polymerization initiator etc. are mentioned, for example. Thereby, for example, when the compound to be polymerized by heating includes a compound having a radically polymerizable double bond in the molecule, the polymerization of the compound can be accelerated. The free radical polymerization initiator can contain, for example, one or more compounds selected from the following compounds: octyl peroxide, lauryl peroxide, stearyl peroxide, 1,1,3,3- Tetramethylbutylperoxy 2-ethylhexanoate, oxalic acid peroxide, 2,5-dimethyl-2,5-di(2-ethylhexanoylperoxy)hexane, 1- Cyclohexyl-1-methylethylperoxy 2-ethylhexanoate, tertiary hexylperoxy 2-ethylhexanoate, tertiary butylperoxy 2-ethylhexanoate, meta Toluyl peroxide, benzoyl peroxide, methyl ethyl ketone peroxide, acetyl peroxide, tertiary butyl hydroperoxide, di-tertiary butyl peroxide, Cumene hydroperoxide, dicumyl peroxide, tertiary butyl peroxybenzoate, p-chlorobenzoyl peroxide and cyclohexanone peroxide.

將該含銀糊劑中的多官能化合物的質量設為100質量份時,本實施形態之含銀糊劑中包含之起始劑的含量為10質量份以下為較佳,更佳為7質量份以下,進一步較佳為5質量份以下。若起始劑的含量為上述上限值以下,則能夠使含銀糊劑的機械特性更合適。又,本實施形態之含銀糊劑中包含之起始劑的含量的下限值並無特別限定,但是將該含銀糊劑中的多官能化合物的質量設為100質量份時,較佳為0.5質量份以上,更佳為1質量份以上,進一步較佳為2質量份以上。When the mass of the polyfunctional compound in the silver-containing paste is 100 parts by mass, the content of the initiator contained in the silver-containing paste of the present embodiment is preferably 10 parts by mass or less, more preferably 7 parts by mass Part or less, more preferably 5 parts by mass or less. The mechanical characteristics of a silver-containing paste can be made more suitable as content of an initiator is below the said upper limit. Also, the lower limit of the content of the initiator contained in the silver-containing paste of this embodiment is not particularly limited, but when the mass of the polyfunctional compound in the silver-containing paste is 100 parts by mass, it is preferable It is 0.5 mass part or more, More preferably, it is 1 mass part or more, More preferably, it is 2 mass parts or more.

<含銀糊劑的性狀及物性> 接著,對本實施形態之含銀糊劑的性狀及物性進行說明。 本實施形態之含銀糊劑較佳為在20℃時為糊劑狀。亦即,本實施形態之含銀糊劑能夠在20℃時如漿糊劑般接著於基板等為較佳。藉此,能夠將本實施形態之含銀糊劑較佳地用作半導體元件的接著劑等。 當然,依據所適用之製程等,本實施形態之含銀糊劑亦可以為相對低黏度的清漆狀等。 <Characteristics and physical properties of silver-containing paste> Next, the properties and physical properties of the silver-containing paste of this embodiment will be described. The silver-containing paste of this embodiment is preferably in a paste state at 20°C. That is, it is preferable that the silver-containing paste of this embodiment can adhere to a substrate etc. like a paste at 20 degreeC. Thereby, the silver-containing paste of this embodiment can be used suitably as an adhesive agent of a semiconductor element, etc. Of course, depending on the applicable manufacturing process, etc., the silver-containing paste in this embodiment may also be in the form of a relatively low-viscosity varnish.

使用本實施形態之含銀糊劑,根據以下<測量方法>測量之晶粒剪切強度的下限值在260℃中較佳為1.5N/mm 2以上,更加為1.9N/mm 2以上,進一步較佳為2.2N/mm 2以上。藉此,使用了本實施形態之含銀糊劑時的與引線架的黏著強度增提高,從而能夠改善引線架及晶片之間的密接性。 <測量方法> 將含銀糊劑塗佈於銅基板上而形成塗膜,且在其塗膜上放置表面鍍金的7×7mm的矽晶片,之後,花費60分鐘從30℃升溫至200℃,接著以200℃進行120分鐘熱處理,藉由以上使含銀糊劑硬化或將矽晶片接合到基板。 之後,將上述測量樣品在60℃・濕度60%的恆溫恆濕槽中處理48小時,使用裸晶剪力測試儀,且以260℃測量晶粒剪切強度(N/mm 2)。 Using the silver-containing paste of this embodiment, the lower limit value of the grain shear strength measured according to the following <measurement method> is preferably 1.5 N/mm 2 or more at 260° C., more preferably 1.9 N/mm 2 or more, More preferably, it is 2.2 N/mm 2 or more. Thereby, when the silver-containing paste of this embodiment is used, the adhesive strength with a lead frame increases, and the adhesiveness between a lead frame and a chip can be improved. <Measurement method> A silver-containing paste is coated on a copper substrate to form a coating film, and a gold-plated 7×7mm silicon wafer is placed on the coating film, and then the temperature is raised from 30°C to 200°C in 60 minutes. Then heat treatment is performed at 200° C. for 120 minutes, by which the silver-containing paste is hardened or the silicon wafer is bonded to the substrate. Afterwards, the above measurement samples were treated in a constant temperature and humidity chamber at 60°C and humidity of 60% for 48 hours, and the grain shear strength (N/mm 2 ) was measured at 260°C using a bare die shear tester.

又,上述晶粒剪切強度的上限值並無特別限定,例如在260℃為100N/mm 2以下。 In addition, the upper limit of the grain shear strength is not particularly limited, and is, for example, 100 N/mm 2 or less at 260°C.

在本實施形態中,作為測量晶粒剪切強度之方法,例如能夠使用裸晶剪力測試儀(DAGE-4000型,Nordson Advanced Technology K.K.製)等。In this embodiment, as a method of measuring the grain shear strength, for example, a bare die shear tester (DAGE-4000 type, manufactured by Nordson Advanced Technology K.K.) can be used.

在本實施形態的較佳態樣中,本實施形態之含銀糊劑在使用BF型黏度計並以溫度:25℃、剪切速度:0.5rpm測量時的0.5rpm黏度η 0.5的下限值為20Pa・s以上為較佳,更佳為25Pa・s以上,進一步較佳為30Pa・s以上。藉此,能夠防止接著含銀糊劑時在基板上擴散,從而能夠防止與其他系統的晶片的短路。 又,上述η 0.5的上限值並無特別限定,例如為300Pa・s以下。 In a preferred aspect of this embodiment, the silver-containing paste of this embodiment is measured with a BF-type viscometer at a temperature of 25°C and a shear rate of 0.5rpm. The lower limit value of the viscosity η of 0.5 at 0.5rpm It is preferably at least 20 Pa·s, more preferably at least 25 Pa·s, and still more preferably at least 30 Pa·s. Thereby, it is possible to prevent the silver-containing paste from spreading on the substrate when the silver-containing paste is applied, and to prevent a short circuit with a wafer of another system. Also, the upper limit of the aforementioned η 0.5 is not particularly limited, and is, for example, 300 Pa·s or less.

在本實施形態的較佳態樣中,本實施形態之含銀糊劑在使用BF型黏度計並以溫度:25℃、剪切速度:5rpm測量時的5rpm黏度η 5的下限值為5Pa・s以上為較佳,更佳為5.5Pa・s以上,進一步較佳為6Pa・s以上。藉此,能夠防止接著含銀糊劑時在基板上擴散,從而能夠防止與其他系統的晶片的短路。 又,上述η 5的上限值並無特別限定,例如為40Pa・s以下,亦可以為35Pa・s以下,亦可以為30Pa・s以下。 In a preferred aspect of this embodiment, the lower limit value of the silver-containing paste of this embodiment is 5Pa when measured with a BF type viscometer at a temperature of 25°C and a shear rate of 5rpm .・s or higher is preferable, more preferably 5.5 Pa・s or higher, further preferably 6 Pa・s or higher. Thereby, it is possible to prevent the silver-containing paste from spreading on the substrate when the silver-containing paste is applied, and to prevent a short circuit with a wafer of another system. In addition, the upper limit of η 5 is not particularly limited, for example, it may be 40 Pa·s or less, may be 35 Pa·s or less, or may be 30 Pa·s or less.

在本實施形態的較佳態樣中,本實施形態之含銀糊劑的由以下式(1)表示之上述η 5及上述η 0.5的黏度比的下限值較佳為2以上,更佳為2.5以上,進一步較佳為3以上。 黏度比=η 0.55(1) 藉由黏度比為上述下限值以上,能夠使在基材上接著含銀糊劑時的作業性更合適。 又,上述黏度比的上限值並無特別限定,例如為10以下。 In a preferred aspect of this embodiment, the lower limit of the viscosity ratio of the above-mentioned η 5 to the above-mentioned η 0.5 represented by the following formula (1) of the silver-containing paste of the present embodiment is preferably 2 or more, more preferably 2.5 or more, and more preferably 3 or more. Viscosity ratio=η 0.55 (1) When the viscosity ratio is equal to or greater than the above-mentioned lower limit, workability at the time of bonding the silver-containing paste to the substrate can be made more suitable. Moreover, the upper limit of the said viscosity ratio is not specifically limited, For example, it is 10 or less.

在本實施形態的較佳態樣中,本實施形態之含銀糊劑的使用動態黏彈性測量裝置測量於頻率:1Hz、溫度:25℃時之儲存模數的下限值較佳為2000MPa以上,更佳為2500MPa以上,進一步較佳為3000MPa以上,進一步較佳為4000MPa以上。藉由儲存模數為上述下限值以上,能夠使基於含銀糊劑之引線架與晶片的連接穩定性更合適。In a preferred form of this embodiment, the lower limit value of the storage modulus of the silver-containing paste of this embodiment measured by a dynamic viscoelasticity measuring device at a frequency of 1 Hz and a temperature of 25° C. is preferably 2000 MPa or more , more preferably at least 2500 MPa, further preferably at least 3000 MPa, even more preferably at least 4000 MPa. When the storage modulus is more than the above-mentioned lower limit value, the connection stability between the lead frame and the chip by the silver-containing paste can be made more suitable.

又,上述儲存模數的上限值較佳為20000MPa以下,更佳為17500MPa以下,進一步較佳為15000MPa以下,進一步較佳為10000MPa以下,進一步較佳為8000MPa以下。藉由儲存模數為上述上限值以下,使用了本實施形態之含銀糊劑時的與引線架的黏著強度提高,從而能夠改善引線架及晶片之間的密接性。Also, the upper limit of the storage modulus is preferably 20000 MPa or less, more preferably 17500 MPa or less, further preferably 15000 MPa or less, still more preferably 10000 MPa or less, still more preferably 8000 MPa or less. When the storage modulus is below the above-mentioned upper limit, the adhesive strength with the lead frame when using the silver-containing paste of this embodiment improves, and the adhesiveness between a lead frame and a chip can be improved.

再者,作為用於儲存模數的測量之動態黏彈性測量裝置,能夠使用公知的裝置。作為公知的裝置,例如可以舉出SII Nanotechnology公司製的動態黏彈性測量裝置DMS6100、Thermo Fisher Scientific製的動態黏彈性測量裝置HAAKE MARS等。In addition, as the dynamic viscoelasticity measuring device for measuring the storage modulus, a known device can be used. As a well-known apparatus, the dynamic viscoelasticity measurement apparatus DMS6100 by SII Nanotechnology company, the dynamic viscoelasticity measurement apparatus HAAKE MARS by Thermo Fisher Scientific, etc. are mentioned, for example.

在本實施形態的方式中,本實施形態之含銀糊劑的藉由雷射閃光法測量之導熱率的下限值較佳為10W/mK以上,更佳為12W/mK以上,進一步較佳為14W/mK以上。導熱率為上述下限值以上,藉此在使用了本實施形態中的含銀糊劑之電子裝置中,高溫可靠性更合適。 又,上述導熱率的上限值並無特別限定,例如為200W/mK以下。 In the form of the present embodiment, the lower limit value of the thermal conductivity of the silver-containing paste of the present embodiment measured by the laser flash method is preferably 10 W/mK or more, more preferably 12 W/mK or more, still more preferably It is above 14W/mK. Thermal conductivity is more than the above-mentioned lower limit value, and high-temperature reliability is more suitable by this in the electronic device using the silver-containing paste in this embodiment. Moreover, the upper limit of the said thermal conductivity is not specifically limited, For example, it is 200 W/mK or less.

再者,作為用於測量導熱率之雷射閃光法熱常數測量裝置,能夠使用公知的裝置。作為公知的裝置,例如可以舉出NETZSCH Japan K.K.製的雷射閃光法熱常數測量裝置LFA447等。In addition, a known device can be used as a laser flash method thermal constant measuring device for measuring thermal conductivity. As a well-known apparatus, the laser flash method thermal constant measuring apparatus LFA447 etc. which are made from NETZSCH Japan K.K. are mentioned, for example.

<含銀糊劑的用途> 本實施形態之含銀糊劑能夠用於各種用途。例如,可以舉出晶粒黏著材或導電糊劑等。作為晶粒黏著材,例如可以用於電子裝置,亦可以更佳地用於半導體裝置。作為導電糊劑,作為代表用途例,可以舉出印刷電路板的跳線電路(jumper circuit)或貫穿孔導體、加成電路(additive circuit)、觸控面板的導體電路、電阻端子、太陽能電池的電極、鉭電容器的電極、膜電容器的電極、晶片型陶瓷電子零件的外部電極或內部電極等的形成、作為電磁波屏蔽層的使用等。又,作為焊料的代替品,除了作為用於將半導體元件或電子零件安裝於基板的導電性接著劑的使用之外,亦能夠用作由焊料覆蓋太陽能電池的高溫燒成之銀電極的表面之類型的柵電極之焊料部分的代替品。 <Applications of silver-containing paste> The silver-containing paste of this embodiment can be used for various purposes. For example, a die attach material, a conductive paste, etc. are mentioned. As a die attach material, for example, it can be used in electronic devices, and it can be more preferably used in semiconductor devices. Examples of typical uses of the conductive paste include jumper circuits or through-hole conductors for printed circuit boards, additive circuits, conductor circuits for touch panels, resistor terminals, and solar cells. Formation of electrodes, electrodes of tantalum capacitors, electrodes of film capacitors, external electrodes or internal electrodes of wafer-type ceramic electronic parts, use as an electromagnetic wave shielding layer, etc. In addition, as a substitute for solder, in addition to being used as a conductive adhesive for mounting semiconductor elements or electronic parts on a substrate, it can also be used as a surface of a high-temperature-fired silver electrode of a solar cell covered with solder. A substitute for the solder portion of the gate electrode.

本實施形態之含銀糊劑能夠藉由硬化而成為硬化物。本實施形態的硬化物能夠利用於各種用途。例如,使用於電子裝置。即,本實施形態之電子裝置具備本實施形態的含銀糊劑的硬化體、及接著有該硬化體之電子零件。 本實施形態的硬化物中,在硬化物中包含銀粒子,因此能夠適用於形成有電極或配線之各種電子機器的零件。又,作為填充於印刷配線基板的貫穿孔或通孔(via hole)之用途亦能夠較佳地使用。 當然,在此舉出之用途為實施形態的一例,即使係除此之外的用途,亦能夠調整含銀糊劑的組成同時進行適用者亦不必言說。 The silver-containing paste of the present embodiment can be cured by hardening. The cured product of this embodiment can be utilized in various applications. For example, used in electronic devices. That is, the electronic device of this embodiment is equipped with the cured body of the silver-containing paste of this embodiment, and the electronic component to which this hardened body was adhered. In the cured product of this embodiment, since silver particles are contained in the cured product, it can be applied to components of various electronic devices in which electrodes and wiring are formed. Moreover, it can also be used suitably as the application which fills the through-hole or the via hole (via hole) of a printed wiring board. Of course, the use mentioned here is an example of an embodiment, and even if it is a use other than this, it is needless to say that the composition of a silver-containing paste can be adjusted and applied simultaneously.

<含銀糊劑的製造方法> 接著,對本實施形態之含銀糊劑的製造方法進行說明。 本實施形態的含銀糊劑能夠藉由混練混合上述之各成分來製造。該混合例如可以使用捏合機、三輥磨、擂潰機等混練裝置或各種攪拌裝置等進行。 <Manufacturing method of silver-containing paste> Next, the manufacturing method of the silver-containing paste of this embodiment is demonstrated. The silver-containing paste of this embodiment can be manufactured by kneading and mixing the above-mentioned components. This mixing can be performed using, for example, a kneading device such as a kneader, a three-roll mill, or a crushing machine, or various stirring devices.

又,本實施形態之含銀糊劑的硬化體的製造方法具有以下步驟:藉由混合銀粒子和樹脂,準備本實施形態之含銀糊劑之步驟;及藉由熱處理該含銀糊劑,引起銀粒子的燒結來形成粒子連結結構之步驟。Also, the method for producing a cured body of the silver-containing paste of the present embodiment has the steps of: preparing the silver-containing paste of the present embodiment by mixing silver particles and resin; and heat-treating the silver-containing paste, The step of causing sintering of silver particles to form a particle interconnected structure.

在本實施形態中,作為樹脂選擇具有輔助燒結之特性者,因此在硬化步驟中,能夠提高製造製程特性,亦即能夠降低燒結溫度或縮短燒結時間等。亦即,在硬化步驟中,即使採用低溫或短時間的燒結條件,亦能夠實現含銀糊劑低電阻和密接性之兼顧。In the present embodiment, the resin is selected to have the property of assisting sintering. Therefore, in the curing step, the characteristics of the manufacturing process can be improved, that is, the sintering temperature can be lowered, the sintering time can be shortened, and the like. That is, in the hardening step, even if low temperature or short-time sintering conditions are used, both low resistance and adhesiveness of the silver-containing paste can be achieved.

本實施形態之含銀糊劑藉由260℃以下且160℃以上的熱處理引起燒結為較佳。在本實施形態中,燒結溫度的上限值並無特別限定,例如為260℃以下為較佳,250℃以下為進一步較佳,240℃以下為特佳。又,該燒結溫度的下限值並無特別限定,例如為160℃以上為較佳,165℃以上為進一步較佳,170℃以上為特佳。The silver-containing paste of this embodiment is preferably sintered by heat treatment at 260° C. or lower and 160° C. or higher. In this embodiment, the upper limit of the sintering temperature is not particularly limited, for example, it is preferably 260° C. or lower, more preferably 250° C. or lower, and particularly preferably 240° C. or lower. In addition, the lower limit of the sintering temperature is not particularly limited, for example, it is preferably 160°C or higher, more preferably 165°C or higher, and particularly preferably 170°C or higher.

又,在本實施形態中,燒結時間的下限值並無特別限定,例如為15分鐘以上為較佳,18分鐘以上為更佳,20分鐘以上為進一步較佳。作為該燒結時間的上限值,並無特別限定,例如為60分鐘以下為較佳,55分鐘以下為更佳,50分鐘以下為特佳。Also, in this embodiment, the lower limit of the sintering time is not particularly limited, for example, it is preferably at least 15 minutes, more preferably at least 18 minutes, and still more preferably at least 20 minutes. The upper limit of the sintering time is not particularly limited, for example, it is preferably 60 minutes or less, more preferably 55 minutes or less, and particularly preferably 50 minutes or less.

以上,對本發明的實施形態進行了敘述,但是該等僅為本發明的示例,能夠採用上述以外的各種構成。又,本發明並不限定於上述實施形態,可達成本發明的目的之範圍內的變形、改良等皆包括在本發明中。 [實施例] As mentioned above, although embodiment of this invention was described, these are only the example of this invention, and various structures other than the above can be employ|adopted. In addition, the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope of attaining the object of the present invention are included in the present invention. [Example]

[清漆的製備] 關於各實施例1~4及比較例1~3製備了清漆。該製備藉由根據表1所示之摻合均勻地混合各成分來進行。再者,表1所示的成分的詳細如下。又,表1中的各成分以摻合份數表示。表中的「-」表示無法測量。 [Preparation of varnish] Regarding each of Examples 1-4 and Comparative Examples 1-3, varnishes were prepared. The preparation was carried out by uniformly mixing the ingredients according to the incorporation shown in Table 1. In addition, the details of the components shown in Table 1 are as follows. In addition, each component in Table 1 is shown by the blending part. "-" in the table means not measurable.

(環氧化合物) 環氧化合物1:雙酚F型液狀環氧化合物、RE-303S,Nippon Kayaku Co.,Ltd.製 (epoxy compound) Epoxy compound 1: bisphenol F type liquid epoxy compound, RE-303S, manufactured by Nippon Kayaku Co., Ltd.

(丙烯酸化合物) 丙烯酸化合物1:乙二醇二甲基丙烯酸酯,LIGHT ESTER EG,Kyoeisha Chemical Co.,Ltd.製 (acrylic compound) Acrylic compound 1: Ethylene glycol dimethacrylate, LIGHT ESTER EG, manufactured by Kyoeisha Chemical Co., Ltd.

(硬化劑) 硬化劑1:具有雙酚F骨架之雙酚樹脂,DIC-BPF(在室溫25℃為固態),DIC Corporation製 (hardener) Hardener 1: Bisphenol resin having a bisphenol F skeleton, DIC-BPF (solid at room temperature 25°C), manufactured by DIC Corporation

(氰胺衍生物) 氰胺衍生物1:二氰二胺,EH-3636AS,ADEKA CORPORATION製 (cyanamide derivatives) Cyanamide derivative 1: dicyandiamide, EH-3636AS, manufactured by ADEKA CORPORATION

(硬化促進劑) 硬化促進劑1:聚胺系硬化促進劑,EH-5057P,ADEKA CORPORATION製 硬化促進劑2:咪唑系硬化促進劑,2PHZ-PW,SHIKOKU CHEMICALS CORPORATION製 (hardening accelerator) Hardening accelerator 1: Polyamine-based hardening accelerator, EH-5057P, manufactured by ADEKA CORPORATION Hardening accelerator 2: imidazole-based hardening accelerator, 2PHZ-PW, manufactured by SHIKOKU CHEMICALS CORPORATION

(起始劑) 起始劑1:二異丙苯基過氧化物,Perkadox BC,Kayaku Akzo Corporation製 (starter) Initiator 1: Dicumyl peroxide, Perkadox BC, manufactured by Kayaku Akzo Corporation

[含銀糊劑的製備] 接著,使用在各實施例1~4及比較例1~3中調整之清漆製備了含銀糊劑。將在各實施例1~4及比較例1~3中調整之清漆13.0質量份、作為含銀粒子的銀粉(鱗片形狀銀、D 50:6.0μm、Fukuda Metal Foil & Powder Co.,Ltd.製、燒結溫度:200℃、振實密度:5.5g/cm 3、比表面積:0.2m 2/g)65質量份、鍍銀聚矽氧樹脂粒子(Mitsubishi Materials Corporation製、耐熱・表面處理10μm等級、球形狀、D 50:10μm、燒結溫度:210℃、振實密度:5.5g/cm 3)20質量份、作為溶劑的丁基丙二醇(BFTG、Nippon Nyukazai Co., LTd.製、沸點:274℃)2.0質量份合計100質量份,作為各實施例1~4及比較例1~3中的含銀糊劑。 [Preparation of Silver-Containing Paste] Next, a silver-containing paste was prepared using the varnish adjusted in each of Examples 1-4 and Comparative Examples 1-3. 13.0 parts by mass of the varnishes adjusted in Examples 1-4 and Comparative Examples 1-3 were used as silver powder containing silver particles (scale-shaped silver, D 50 : 6.0 μm, manufactured by Fukuda Metal Foil & Powder Co., Ltd. , Sintering temperature: 200°C, Tap density: 5.5g/cm 3 , Specific surface area: 0.2m 2 /g) 65 parts by mass, silver-plated silicone resin particles (manufactured by Mitsubishi Materials Corporation, heat-resistant and surface-treated 10μm grade, Spherical shape, D 50 : 10 μm, sintering temperature: 210°C, tap density: 5.5g/cm 3 ) 20 parts by mass, butylpropylene glycol (BFTG, manufactured by Nippon Nyukazai Co., LTd.) as a solvent, boiling point: 274°C ) 2.0 parts by mass and 100 parts by mass in total were used as the silver-containing paste in each of Examples 1-4 and Comparative Examples 1-3.

[評價] 關於各實施例及各比較例,利用以下方式進行了評價。將結果示於表1。 [evaluate] About each Example and each comparative example, evaluation was performed in the following manner. The results are shown in Table 1.

(導熱率) 在厚度約1mm、邊長10mm的四邊形模具中塗佈各實施例1~4及比較例1~3中的含銀糊劑,經60分鐘從30℃升溫至200℃,然後以200℃加熱120分鐘,藉此製作了硬化物試驗片。製作硬化物試驗片後,使用NETZSCH Japan K.K.製的雷射閃光法熱常數測量裝置LFA447來測量熱擴散率並由比熱和比重計算了導熱率。 (Thermal conductivity) Coat the silver-containing paste in each of Examples 1 to 4 and Comparative Examples 1 to 3 in a quadrilateral mold with a thickness of about 1 mm and a side length of 10 mm, heat up from 30°C to 200°C in 60 minutes, and then heat at 200°C for 120 Minutes, thereby making a hardened test piece. After preparing the hardened test piece, thermal diffusivity was measured using laser flash method thermal constant measuring device LFA447 manufactured by NETZSCH Japan K.K., and thermal conductivity was calculated from specific heat and specific gravity.

(體積電阻率) 將各實施例1~4及比較例1~3中的含銀糊劑以厚度0.1mm×寬度4mm×長度50mm塗佈於基板上,經60分鐘從30℃升溫至200℃,然後以200℃加熱了120分鐘。接著,將測量端子抵在基板上下端來測量的電阻值。測量長度設為40mm。之後,將所測量之電阻值換算為體積電阻率。 (volume resistivity) The silver-containing paste in each of Examples 1 to 4 and Comparative Examples 1 to 3 is coated on the substrate with a thickness of 0.1mm×width 4mm×length 50mm, and is heated from 30°C to 200°C in 60 minutes, and then heated at 200°C Heat up for 120 minutes. Next, measure the resistance value by touching the measurement terminals against the upper and lower ends of the substrate. The measurement length is set to 40 mm. Afterwards, the measured resistance value was converted into volume resistivity.

(儲存模數) 將各實施例1~4及比較例1~3中的含銀糊劑塗佈於約0.1mm×約10mm×約4mm模具,經60分鐘從30℃升溫至200℃,然後以200℃加熱120分鐘,藉此獲得了評價用條狀樣品。使用該樣品,藉由DMA(動態黏彈性測量,SII Nanotechnology公司製的DMS6100,拉伸模式)在升溫速度5℃/min、頻率1Hz的條件下測量了25℃時的儲存彈性模數(E’)。 (storage modulus) The silver-containing paste in each of Examples 1 to 4 and Comparative Examples 1 to 3 is coated on a mold of about 0.1mm × about 10mm × about 4mm, and is heated from 30°C to 200°C in 60 minutes, and then heated at 200°C for 120 Minutes, thereby obtaining a strip sample for evaluation. Using this sample, the storage elastic modulus at 25°C (E' ).

(黏度) 關於各實施例1~4及比較例1~3中的含銀糊劑,使用BF型黏度計(BROOKFIELD ENGINEERING公司製、型號DV3T),在剛製作含銀糊劑之後測量了室溫25℃的黏度。作為此時的測量順序,依剪切速度0.5rpm、然後剪切速度5rpm的順序進行了測量。黏度的單位為Pa・s。 (viscosity) Regarding the silver-containing pastes in each of Examples 1-4 and Comparative Examples 1-3, using a BF-type viscometer (manufactured by Brookfield Engineering Co., Ltd., model DV3T), the temperature of the silver-containing paste at room temperature 25° C. was measured immediately after the preparation of the silver-containing paste. viscosity. As the measurement order at this time, the measurement was performed in the order of a shear rate of 0.5 rpm and then a shear rate of 5 rpm. The unit of viscosity is Pa·s.

(密接性) 作為密接性的指標,利用以下方法測量了晶粒剪切強度。 將各實施例1~4及比較例1~3中的含銀糊劑塗佈於銅基板上,在其上以糊劑厚度成為15μm的方式搭載表面鍍金的7mm×7mm×0.35mm的矽晶片。之後,花費60分鐘從30℃升溫至200℃,接著以200℃進行了120分鐘熱處理,藉由以上使含銀糊劑硬化或將矽晶片接合到基板。 之後,將上述測量樣品在60℃・濕度60%的恆溫恆濕槽中處理48小時,使用裸晶剪力測試儀(Nordson Advanced Technology K.K.製,DAGE-4000型),且在試驗速度:500μm/秒的條件下,以260℃測量了晶粒剪切強度(N/mm 2)。 (Adhesion) As an index of adhesion, grain shear strength was measured by the following method. The silver-containing paste in each of Examples 1-4 and Comparative Examples 1-3 was coated on a copper substrate, and a silicon wafer of 7 mm×7 mm×0.35 mm with a gold-plated surface was mounted on it so that the thickness of the paste became 15 μm. . After that, it took 60 minutes to raise the temperature from 30° C. to 200° C., and then heat-treated at 200° C. for 120 minutes. Through the above, the silver-containing paste was hardened or the silicon wafer was bonded to the substrate. After that, the above-mentioned measurement samples were treated in a constant temperature and humidity chamber at 60°C and humidity of 60% for 48 hours, using a bare die shear tester (manufactured by Nordson Advanced Technology KK, DAGE-4000 type), and at a test speed: 500μm/ The grain shear strength (N/mm 2 ) was measured at 260°C under the condition of 2 seconds.

[表1]    實施例1 實施例2 實施例3 實施例4 比較例1 比較例2 比較例3 清漆 環氧化合物1 50.0 50.0 50.0 50.0 50.0 50.0 50.0 丙烯酸化合物1 20.0 20.0 20.0 20.0 20.0 20.0 20.0 硬化劑1 20.0 20.0 20.0 20.0 20.0 20.0 20.0 氰胺衍生物 0.1 0.2 0.5 1.5          硬化促進劑1                0.5 1.5 硬化促進劑2 1.00 1.00 1.00 1.00 1.00 1.00 1.00 起始劑1 3.5 3.5 3.5 3.5 3.5 3.5 3.5 糊劑 清漆 13.0 13.0 13.0 13.0 13.0 13.0 13.0 銀粉 65.0 65.0 65.0 65.0 65.0 65.0 65.0 鍍銀聚矽氧樹脂 20.0 20.0 20.0 20.0 20.0 20.0 20.0 溶劑 2.0 2.0 2.0 2.0 2.0 2.0 2.0 特性 導熱率(W/mK) 28 24 17 14 30 26 22 體積電阻率(μΩ·cm) 41 57 63 88 30 32 40 儲存模數(MPa) 6400 6400 6500 6500 6400 6600 6300 黏度 (Pa·s) η 0.5 44 46 53 58 36 47 475 η 5 11 12 19 21 10 14 62 η 0.55 4.0 3.8 2.8 2.8 3.6 3.4 7.7 晶粒剪切強度(N/mm 2 3.4 3.8 2.9 2.3 0.4 0.4 0.2 [Table 1] Example 1 Example 2 Example 3 Example 4 Comparative example 1 Comparative example 2 Comparative example 3 varnish epoxy compound 1 50.0 50.0 50.0 50.0 50.0 50.0 50.0 Acrylic Compound 1 20.0 20.0 20.0 20.0 20.0 20.0 20.0 Hardener 1 20.0 20.0 20.0 20.0 20.0 20.0 20.0 Cyanamide derivatives 0.1 0.2 0.5 1.5 hardening accelerator 1 0.5 1.5 hardening accelerator 2 1.00 1.00 1.00 1.00 1.00 1.00 1.00 Initiator 1 3.5 3.5 3.5 3.5 3.5 3.5 3.5 Paste varnish 13.0 13.0 13.0 13.0 13.0 13.0 13.0 silver powder 65.0 65.0 65.0 65.0 65.0 65.0 65.0 Silver-plated silicone 20.0 20.0 20.0 20.0 20.0 20.0 20.0 solvent 2.0 2.0 2.0 2.0 2.0 2.0 2.0 characteristic Thermal conductivity (W/mK) 28 twenty four 17 14 30 26 twenty two Volume resistivity (μΩ·cm) 41 57 63 88 30 32 40 Storage modulus (MPa) 6400 6400 6500 6500 6400 6600 6300 Viscosity (Pa·s) η 0.5 44 46 53 58 36 47 475 n 5 11 12 19 twenty one 10 14 62 η 0.55 4.0 3.8 2.8 2.8 3.6 3.4 7.7 Grain shear strength (N/mm 2 ) 3.4 3.8 2.9 2.3 0.4 0.4 0.2

在實施例1~4中,與銅板的晶粒剪切強度相較於比較例1~3特異性地變高,因此實施例1~4的含銀糊劑係引線架及晶片之間的密接力優異之含銀糊劑。In Examples 1 to 4, the grain shear strength with the copper plate was specifically higher than that of Comparative Examples 1 to 3, so that the silver-containing pastes of Examples 1 to 4 were closely bonded between the lead frame and the chip. Excellent silver-containing paste.

本申請主張基於2021年5月14日申請之日本特願2021-082513號之優先權,並將其揭示的全部內容援用於此。This application claims priority based on Japanese Patent Application No. 2021-082513 for which it applied on May 14, 2021, and uses all the content disclosed here.

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Claims (12)

一種含銀糊劑,其包含: 含銀粒子; 氰胺衍生物; 溶劑;及 由(A)分子內具有2個以上環氧基之環氧化合物、及(B)分子內包含2個以上聚合性雙鍵之(甲基)丙烯酸化合物中的至少一者或兩者構成之多官能化合物。 A silver-containing paste comprising: Silver particles; Cyanamide derivatives; solvents; and Consisting of at least one or both of (A) an epoxy compound having two or more epoxy groups in the molecule, and (B) a (meth)acrylic compound containing two or more polymerizable double bonds in the molecule functional compound. 如請求項1之含銀糊劑,其中, 前述氰胺衍生物包含選自二氰二胺、胍、胍鹽、三聚氰胺及甲脒脲之1種或2種以上。 Such as the silver-containing paste of claim 1, wherein, The aforementioned cyanamide derivatives include one or two or more selected from the group consisting of dicyandiamine, guanidine, guanidine salt, melamine, and formidine urea. 如請求項1或2之含銀糊劑,其中, 將前述多官能化合物的含量設為100質量份時,前述氰胺衍生物的含量為0.01質量份以上且3質量份以下。 Such as the silver-containing paste of claim 1 or 2, wherein, When content of the said polyfunctional compound is 100 mass parts, content of the said cyanamide derivative is 0.01 mass part or more and 3 mass parts or less. 如請求項1或2之含銀糊劑,其中, 前述(A)分子內具有2個以上環氧基之環氧化合物包含選自雙酚A型環氧化合物及雙酚F型環氧化合物之1種或其兩者。 Such as the silver-containing paste of claim 1 or 2, wherein, The epoxy compound having two or more epoxy groups in the molecule (A) includes one or both of bisphenol A epoxy compounds and bisphenol F epoxy compounds. 如請求項1或2之含銀糊劑,其 進一步包含硬化劑, 前述硬化劑包含雙酚樹脂。 Such as the silver-containing paste of claim 1 or 2, its further containing a hardener, The aforementioned hardener contains a bisphenol resin. 如請求項1或2之含銀糊劑,其中, 前述含銀粒子為在160℃以上且260℃以下的溫度引起燒結之含銀粒子。 Such as the silver-containing paste of claim 1 or 2, wherein, The said silver-containing particle is a silver-containing particle which sinters at the temperature of 160 degreeC or more and 260 degreeC or less. 如請求項1或2之含銀糊劑,其 根據以下<測量方法>測量之晶粒剪切強度為1.5N/mm 2以上且100N/mm 2以下, <測量方法> 將含銀糊劑塗佈於銅基板上而形成塗膜,且在其塗膜上放置表面鍍金的7×7mm的矽晶片,之後,花費60分鐘從30℃升溫至200℃,接著以200℃進行120分鐘熱處理,藉由以上使含銀糊劑硬化或將矽晶片接合到基板,並將其作為測量樣品, 之後,將上述測量樣品在60℃・濕度60%的恆溫恆濕槽中處理48小時,使用裸晶剪力測試儀(Nordson Advanced Technology K.K.製,DAGE-4000型),且以260℃測量晶粒剪切強度(N/mm 2)。 The silver-containing paste according to claim 1 or 2, which has a grain shear strength of 1.5 N/mm 2 or more and 100 N/mm 2 or less measured according to the following <measurement method>, <measurement method> coating the silver-containing paste Spread it on a copper substrate to form a coating film, and place a gold-plated 7×7mm silicon wafer on the coating film, then spend 60 minutes heating up from 30°C to 200°C, and then heat treatment at 200°C for 120 minutes, by Harden the silver-containing paste or bond the silicon wafer to the substrate as above, and use it as a measurement sample. After that, treat the above-mentioned measurement sample in a constant temperature and humidity chamber at 60°C and 60% humidity for 48 hours, using bare die scissors A force tester (manufactured by Nordson Advanced Technology KK, model DAGE-4000), and grain shear strength (N/mm 2 ) was measured at 260°C. 如請求項1或2之含銀糊劑,其 使用BF型黏度計,並以溫度:25℃、剪切速度:0.5rpm攪拌該含銀糊劑且同時測量時的0.5rpm黏度η 0.5為20Pa・s以上且300Pa・s以下。 Such as the silver-containing paste of claim 1 or 2, which uses a BF-type viscometer, and stirs the silver-containing paste at a temperature of 25°C and a shear rate of 0.5rpm, and simultaneously measures the viscosity η 0.5 of 0.5rpm when it is 20Pa・s or more and 300Pa・s or less. 如請求項1或2之含銀糊劑,其 使用BF型黏度計,並以溫度:25℃、剪切速度:5rpm攪拌該含銀糊劑且同時測量時的5rpm黏度η 5為5Pa・s以上且40Pa・s以下。 Such as the silver-containing paste of claim 1 or 2, which uses a BF-type viscometer, and stirs the silver-containing paste at a temperature of 25°C and a shear rate of 5rpm, and simultaneously measures the viscosity η 5 at 5rpm when it is 5Pa·s Above and below 40Pa・s. 如請求項1或2之含銀糊劑,其 以下式(1)表示之黏度比為2以上且10以下,該黏度比為使用BF型黏度計並以溫度:25℃、剪切速度:0.5rpm攪拌且同時測量時的0.5rpm黏度η 0.5與使用BF型黏度計並以溫度:25℃、剪切速度:5rpm攪拌且同時測量時的5rpm黏度η 5的黏度比, 黏度比=η 0.55(1)。 As for the silver-containing paste of claim 1 or 2, the viscosity ratio represented by the following formula (1) is not less than 2 and not more than 10, and the viscosity ratio is measured by using a BF type viscometer at a temperature of 25°C and a shear rate of 0.5 Viscosity ratio of viscosity η 0.5 at 0.5 rpm when stirred at rpm and measured simultaneously with viscosity η 5 at 5 rpm when stirred at temperature: 25°C, shear rate: 5 rpm and measured simultaneously using a BF type viscometer, viscosity ratio = η 0.5 / η 5 (1). 如請求項1或2之含銀糊劑,其 使用動態黏彈性測量裝置測量於頻率:1Hz、溫度:25℃時之儲存模數為2000MPa以上且20000MPa以下。 Such as the silver-containing paste of claim 1 or 2, its The storage modulus measured by a dynamic viscoelasticity measuring device at a frequency of 1Hz and a temperature of 25°C is above 2000MPa and below 20000MPa. 如請求項1或2之含銀糊劑,其 藉由雷射閃光法測量之導熱率為10W/mK以上且200W/mK以下。 Such as the silver-containing paste of claim 1 or 2, its The thermal conductivity measured by the laser flash method is not less than 10 W/mK and not more than 200 W/mK.
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