TW202244069A - Colored photosensitive resin composition, cured article, partitioning wall, organic electroluminescent element, color filter containing light-emitting nanocrystal grains, and image display device - Google Patents

Abstract

Provided is a colored photosensitive resin composition which can secure satisfactory ink-repellent properties even under a small exposure amount. The colored photosensitive resin composition according to the present invention comprises (a) a coloring agent, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) a photopolymerizable compound and (e) a liquid-repellent agent, the colored photosensitive resin composition being characterized in that the coloring agent (a) contains (a1) a white pigment, the content of the coloring agent (a) is 30% by mass or less relative to the total solid content in the colored photosensitive resin composition, the double bond equivalent in the alkali-soluble resin (b) is 400 g/mol or less, and the liquid-repellent agent (e) has a crosslinkable group and contains (e1) a compound having a fluorine atom and/or a siloxane chain.

Description

Colored photosensitive resin composition, cured product, barrier rib, organic electroluminescent element, color filter containing luminous nano crystal particles, and image display device

The present invention relates to a colored photosensitive resin composition, and further relates to a cured product obtained by curing the colored photosensitive resin composition, a barrier wall including the cured product, and an organic electroluminescent element with a barrier wall, including a luminescent Nano crystal particle color filter and image display device. This case claims priority based on Japanese Patent Application No. 2021-061055 filed in Japan on March 31, 2021, the contents of which are incorporated herein.

In recent years, in order to reduce the power consumption of the display or expand the color gamut, studies have been made on the use of luminous nanocrystalline particles such as quantum dots to form pixels or color filters. The manufacturing methods of pixels or color filters include photolithography and ink-jet methods. It is known that ink-jet methods can reduce the loss of ink materials (for example, refer to Patent Document 1).

In the case of manufacturing a pixel or a color filter containing luminescent nanocrystal particles by an inkjet method, ink containing luminescent nanocrystal particles is ejected to a region (pixel portion) surrounded by a prefabricated barrier wall , forming pixels. Organic electroluminescent elements used in organic electroluminescent displays and the like are produced by forming barrier ribs (barrier ribs) on a substrate and laminating various functional layers in regions surrounded by the barrier ribs. An inkjet method is known as a method of laminating a functional layer in a barrier rib.

As barrier ribs for color filters including luminescent nanocrystalline particles and barrier ribs for organic electroluminescent elements, it is necessary to prevent ink from mixing between adjacent pixel parts when ink is ejected by inkjet, etc. Therefore, higher ink repellency is required. Regarding the material for forming a barrier rib with ink repellency by photolithography, it is described in Patent Document 2 that by using two specific alkali-soluble resins in combination, a material with high ink repellency and good linearity can be obtained. Colored photosensitive resin composition. Patent Document 3 describes a method of suppressing density unevenness over time by using titanium oxide particles and a resin containing fluorine or siloxane in combination with a white film for an optical sensor. Patent Document 4 discloses a display device using a liquid-repellent barrier rib for quantum dots containing a white pigment. [Prior Art Literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2019-086745 [Patent Document 2] International Publication No. 2019/146685 [Patent Document 3] Japanese Patent No. 06688875 [Patent Document 4] Korean Publication No. 10-2019-0094797

[Problem to be Solved by the Invention]

As a result of research conducted by the present inventors, it was found that in the photosensitive resin composition described in Patent Document 2, it is difficult to ensure sufficient ink repellency when the exposure amount is low. The composition described in Patent Document 3 has problems in that the content of metal oxide particles is high and the adhesiveness to the substrate is low. Regarding the liquid-repelling barrier rib for quantum dots described in Patent Document 4, there is no description of its specific composition, so it is not certain whether a pattern of the barrier rib can be formed.

Therefore, an object of this invention is to provide the colored photosensitive resin composition which can ensure sufficient ink repellency even with a low exposure amount. Furthermore, the object of the present invention is to provide a cured product obtained by curing a colored photosensitive resin composition, a barrier rib comprising the cured product, an organic electroluminescent device having a barrier rib, and a color display device comprising luminescent nano crystal particles. Optical filter and image display device. [Technical means to solve the problem]

As a result of earnest research, the present inventors found that the above-mentioned problems can be solved by using a specific alkali-soluble resin in a colored photosensitive resin composition containing a liquid-repellent agent, and completed the present invention. That is, the gist of the present invention is as follows.

[1] A colored photosensitive resin composition characterized in that it contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) a photopolymerizable compound, and (e) ) liquid repellant, The above-mentioned (a) coloring agent contains (a1) a white pigment, The content ratio of the above-mentioned (a) coloring agent is 30% by mass or less with respect to the total solid content of the colored photosensitive resin composition, The double bond equivalent of the above (b) alkali-soluble resin is 400 g/mol or less, and The liquid repellent (e) above contains a compound (e1) having a crosslinking group and a fluorine atom and/or a siloxane chain. [2] The colored photosensitive resin composition according to [1], wherein the above (b) alkali-soluble resin contains an acrylic copolymer resin (b1) having a partial structure represented by the following general formula (I).

[chemical 1]

(In formula (I), R ¹ and R ² independently represent a hydrogen atom or a methyl group; * represents a bond) [3] The colored photosensitive resin composition as in [2], wherein the above (b) alkali-soluble The content ratio of the said acrylic copolymer resin (b1) in resin is 40 mass % or more. [4] The colored photosensitive resin composition according to any one of [1] to [3], wherein the content ratio of the above-mentioned (a1) white pigment in the above-mentioned (a) colorant is 50% by mass or more. [5] The colored photosensitive resin composition according to any one of [1] to [4], wherein the average particle diameter of the primary particles of the above-mentioned (a1) white pigment is 100 nm or more. [6] The colored photosensitive resin composition according to any one of [1] to [5], wherein the white pigment (a1) contains at least one of titanium oxide, zirconium oxide, aluminum oxide and hafnium oxide. [7] The colored photosensitive resin composition according to [6], wherein the above-mentioned (a1) white pigment contains at least titanium oxide. [8] The colored photosensitive resin composition according to any one of [1] to [7], wherein the content ratio of the above-mentioned (c) photopolymerization initiator is relative to the total solid content of the colored photosensitive resin composition The amount is 3% by mass or less. [9] The colored photosensitive resin composition according to any one of [1] to [8], which contains a solvent. [10] A cured product obtained by curing the colored photosensitive resin composition according to any one of [1] to [9]. [11] A barrier rib comprising the hardened product according to [10]. [12] An organic electroluminescent device comprising the barrier rib according to [11]. [13] A color filter comprising luminescent nanocrystalline particles, which is provided with the barrier wall of [11]. [14] An image display device comprising the barrier rib according to [11]. [Effect of Invention]

According to this invention, the colored photosensitive resin composition which can ensure sufficient ink repellency even with a low exposure amount can be provided.

Hereinafter, the present invention will be described in detail. In addition, the following description is an example of embodiment of this invention, and this invention is not limited to these unless the summary is exceeded. In the present invention, "(meth)acrylic acid" means "any one or both of acrylic acid and methacrylic acid". The "total solid content" means the total amount of components other than the solvent in the colored photosensitive resin composition. Even if components other than the solvent are liquid at normal temperature, these components are included in the total solid content and are not included in the solvent. In the present invention, the numerical range represented by "~" means a range including the numerical values described before and after "~" as the lower limit and the upper limit. In the present invention, "(co)polymer" means to include both homopolymer (homopolymer) and copolymer (copolymer), "(acid) anhydride", "...acid (anhydride)" means to include acid and Both of its anhydrides. In the present invention, the barrier wall material refers to a barrier (bank) material, wall material, wall (wall) material, similarly, the barrier wall refers to a barrier (bank), wall, wall (wall). In the present invention, the weight average molecular weight means the weight average molecular weight (Mw) in terms of polystyrene obtained by GPC (gel permeation chromatography). In the present invention, unless otherwise specified, the acid value means an acid value in terms of effective solid content, and can be calculated by neutralization titration.

In the present invention, the barrier ribs can be used, for example, to divide functional layers such as color filters or light-emitting elements including quantum dot nanoparticles, and can be used to form pixels including functional layers and barrier ribs in the following manner Etc.: The ink used as the material for constituting the functional layer is ejected to the divided area (pixel area), and dried and cured as necessary.

[1] Colored photosensitive resin composition The colored photosensitive resin composition of the present invention contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) a photopolymerizable compound, and (e) a liquid repellent as essential components, It may further contain other components as needed, for example, (f) a dispersant, a solvent, and a chain transfer agent may be contained.

[1-1] Components and Composition of Colored Photosensitive Resin Composition The components constituting the colored photosensitive resin composition of the present invention and their composition will be described in order.

[1-1-1] (a) Colorant The colored photosensitive resin composition of this invention contains (a) coloring agent, and (a) coloring agent contains (a1) white pigment. When the (a) colorant contains the (a1) white pigment, the reflectance of the barrier ribs formed from the colored photosensitive resin composition can be increased, and the brightness of the image display device tends to be improved. (a1) The white pigment may be in particle form or non-particle form. From the viewpoint of dispersion stability or reflective performance, particle shape is preferred.

Examples of the (a1) white pigment include metal oxides, preferably titanium oxide, zirconium oxide, aluminum oxide, and hafnium oxide. (a1) The white pigment preferably contains at least one of titanium oxide, zirconium oxide, aluminum oxide, and hafnium oxide. Among titanium oxide, zirconium oxide, aluminum oxide, and hafnium oxide, titanium oxide and zirconium oxide are preferable from the viewpoint of particle stability, and titanium oxide is more preferable from the viewpoint of improving reflectance. The crystal system of titanium oxide includes, for example, anatase type and rutile type, which are not particularly limited, but from the viewpoint of stability, rutile type with low catalytic activity is preferred.

As the (a1) white pigment, other metal oxides may be used in combination in addition to titanium oxide, zirconium oxide, aluminum oxide, and hafnium oxide. Specifically, for example, iron oxide, copper oxide, zinc oxide, yttrium oxide, niobium oxide, molybdenum oxide, indium oxide, tin oxide, tantalum oxide, tungsten oxide, lead oxide, bismuth oxide, cerium oxide, antimony oxide , germanium oxide, barium titanate. Moreover, the composite oxide etc. which contain 2 or more metal elements can also be used.

When (a1) the white pigment is in the form of particles, the average particle diameter of the primary particle of (a1) the white pigment is not particularly limited, but is preferably 1000 nm or less, more preferably 500 nm or less, further preferably 400 nm below, preferably below 300 nm. Also, the thickness is preferably at least 10 nm, more preferably at least 50 nm, further preferably at least 100 nm, still more preferably at least 150 nm, and especially preferably at least 180 nm. It exists in the tendency for dispersion stability to become high that the average particle diameter of a primary particle is below the said upper limit. There exists a tendency for the reflectance of a barrier rib to become high that it is more than the said lower limit. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 10 to 1000 nm, more preferably 50 to 1000 nm, further preferably 100 to 500 nm, further preferably 150 to 400 nm, especially preferably 180 to 300 nm.

(a1) The average particle size of the primary particles of the white pigment is determined by the following method: using a transmission electron microscope (TEM) or a scanning electron microscope (SEM) to directly measure the size of the primary particles according to its electron micrograph . Specifically, the primary particle diameter of each particle was calculated as the equivalent circle diameter. Regarding the measurement, a range of 100 to 500 nm square is imaged, and all particles within the range are measured. Calculate the average particle size by the following method: multiple imaging in different ranges, measure the particle size of a total of 200 to 1000 primary particles, and take the number average. Regarding the measurement of the primary particle diameter, for example, the measurement of the primary particle diameter can be carried out on the white pigment simple substance, its dispersion liquid, and the cured film of the colored photosensitive resin composition. When making a measurement sample, (a1) the white pigment must be uniformly present in the sample. In the case of a dispersion liquid, the dispersion liquid immediately after dispersion was used, and the solvent was volatilized before measurement. Moreover, in the case of a cured film, it measures by making a cured film using the colored photosensitive resin composition in which particles were uniformly dispersed, cutting it in the thickness direction of a film, and observing the cross section.

(a1) The average particle size of dispersed particles of white pigment can be measured by dynamic light scattering method or laser diffraction method, and further can be measured by making a coating film of dispersion liquid, drying it, and measuring particle size by SEM . Although not particularly limited, it is preferably at least 50 nm, more preferably at least 100 nm, further preferably at least 150 nm, and especially preferably at least 180 nm. Moreover, it is preferably 1000 nm or less, more preferably 500 nm or less, further preferably 400 nm or less, and especially preferably 300 nm or less. It exists in the tendency for dispersion stability to become high that the average particle diameter of a primary particle is below the said upper limit. There exists a tendency for the reflectance of a barrier rib to become high that it is more than the said lower limit. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably from 50 to 1000 nm, more preferably from 100 to 500 nm, further preferably from 150 to 400 nm, and especially preferably from 180 to 300 nm.

When (a1) the white pigment is in the form of particles, for example, it is spherical, hollow, porous, rod, plate, fibrous, or indeterminate, preferably spherical.

The (a) coloring agent used in this invention can use the coloring agent other than (a1) white pigment. The type is not particularly limited, but pigments other than white pigments may be used, and dyes may also be used. In the case of using a colorant other than the white pigment (a1), it is preferable to use a pigment other than the white pigment from the viewpoint of durability.

The pigment contained in the (a) coloring agent other than (a1) white pigment may be 1 type, and may be 2 or more types. The kind of pigments other than the (a1) white pigment which can be used as (a) colorant is not specifically limited, For example, an organic pigment or an inorganic pigment is mentioned. Among them, it is preferable to use an organic pigment from the viewpoint of controlling the transmission wavelength of the colored photosensitive resin composition and curing it efficiently. As an organic pigment, an organic coloring pigment or an organic black pigment is mentioned, for example. Here, an organic coloring pigment means an organic pigment which expresses a color other than black, For example, a red pigment, an orange pigment, a blue pigment, a purple pigment, a green pigment, and a yellow pigment are mentioned.

Among the organic pigments, it is preferable to use an organic coloring pigment from the viewpoint of ultraviolet absorbing properties, and it is preferable to use an organic black pigment from the viewpoint of light-shielding properties and insulating properties. An organic coloring pigment may be used individually by 1 type, and may use 2 or more types together. In particular, when it is used for a light-shielding application, it is more preferable to use a combination of organic coloring pigments of different colors, and it is more preferable to use a combination of organic coloring pigments showing a color similar to black.

The chemical structure of these organic pigments is not particularly limited, but examples include: azo-based, phthalocyanine-based, quinacridone-based, benzimidazolone-based, isoindolinone-based, dioxane-based, Indanthrene and perylene. Hereinafter, specific examples of pigments that can be used are shown by pigment numbers. The following terms such as "C.I. Pigment Red 2" refer to the dye index (C.I.).

Examples of red pigments include: C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37 , 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53 :1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81 : 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144 ,146,147,149,151,166,168,169,170,172,173,174,175,176,177,178,179,181,184,185,187,188,190,193,194,200 ,202,206,207,208,209,210,214,216,220,221,224,230,231,232,233,235,236,237,238,239,242,243,245,247,249 ,250,251,253,254,255,256,257,258,259,260,262,263,264,265,266,267,268,269,270,271,272,273,274,275,276 . From the viewpoint of light-shielding and dispersibility, C.I. Pigment Red 48: 1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254, Further preferred examples include: C.I. Pigment Red 177, 209, 224, and 254. In terms of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Red 177, 254, and 272. When the colored photosensitive resin composition is cured by ultraviolet rays, it is preferable to use ultraviolet absorbing red pigments. If the ratio is lower, it is more preferable to use C.I. Pigment Red 254, 272 from this point of view.

Examples of orange pigments include: C.I. Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. From the viewpoint of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Orange 13, 43, 64, and 72. When curing the colored photosensitive resin composition by ultraviolet rays, it is preferable to use C.I. Those with lower ultraviolet absorption rate are more preferably C.I. Pigment Orange 64 and 72 from this point of view.

Examples of blue pigments include: C.I. Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78,79. In terms of light-shielding properties, preferred examples include: C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 60, and further preferred examples: C.I. Pigment Blue 15:6. In terms of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Blue 15:6, 16, or 60. When the colored photosensitive resin composition is hardened by ultraviolet rays, as a blue pigment, it is preferable to use It is more preferable to use C.I. Pigment Blue 60 from the viewpoint of using one with a lower ultraviolet absorption rate.

Examples of purple pigments include: C.I. Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25 , 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. From the viewpoint of light-shielding properties, C.I. Pigment Violet 19 and 23 are preferable, and C.I. Pigment Violet 23 is further preferable. In terms of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Violet 23 and 29, and when the colored photosensitive resin composition is hardened by ultraviolet rays, it is preferable to use C.I. If it is lower, it is more preferable to use C.I. Pigment Violet 29 from this point of view.

Examples of green pigments include: C.I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55 . Preferable examples include: C.I. Pigment Green 7, 36.

Examples of yellow pigments include: C.I. Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35 , 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81 ,83,87,93,94,95,97,100,101,104,105,108,109,110,111,116,117,119,120,126,127,127:1,128,129,133 ,134,136,138,139,142,147,148,150,151,153,154,155,157,158,159,160,161,162,163,164,165,166,167,168,169 ,170,172,173,174,175,176,180,181,182,183,184,185,188,189,190,191,191:1,192,193,194,195,196,197,198 , 199, 200, 202, 203, 204, 205, 206, 207, 208. Preferable examples include: C.I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, and further preferred examples include: C.I. Pigment Yellow 83, 138, 139, 150, 180.

It is preferable to use at least 1 sort(s) selected from the group which consists of a red pigment, an orange pigment, a blue pigment, and a purple pigment from a viewpoint of light-shielding property or ink repellency.

From the viewpoint of light-shielding property or ink repellency, it is preferable to contain at least one or more of the following pigments. Red pigments: C.I. Pigment Red 177, 254, 272 Orange Pigment: C.I. Pigment Orange 43, 64, 72 Blue Pigment: C.I. Pigment Blue 15: 6, 60 Violet Pigments: C.I. Pigment Violet 23, 29

As a certain aspect, when using two or more kinds of organic coloring pigments in combination, the combination of organic coloring pigments is not particularly limited, but from the viewpoint of light-shielding properties, it is preferable to contain a pigment selected from red pigments and orange pigments. At least one selected from the group consisting of blue pigments and purple pigments as (a) colorant. The combination of colors is not particularly limited, but from the viewpoint of light-shielding properties, for example, a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, a combination of a blue pigment, an orange pigment, and a purple pigment combination.

Examples of organic black pigments include perylene black, aniline black, sunfast black HB, and lactam-based compounds. From the viewpoint of plate-making properties, a lactam-based compound is preferable, and it is more preferable to use a compound selected from a compound represented by the following general formula (A) (hereinafter, also referred to as "compound (A)"), a compound (A) geometric isomer, compound (A) salt, and compound (A) geometric isomer salt of at least one organic black pigment (hereinafter sometimes referred to as "commonly referred to as" Organic black pigment represented by formula (A)").

[Chem 2]

As a specific example of such an organic black pigment, a brand name: Irgaphor (registered trademark) Black S 0100 CF (made by BASF Corporation) can be mentioned. The organic black pigment can preferably be dispersed and used by the following dispersant, solvent, and method. If the sulfonic acid derivative of the compound (A) is present at the time of dispersion, the dispersibility or storage stability may be improved, so it is preferable that the organic black pigment contains such a sulfonic acid derivative.

Examples of the inorganic pigment include inorganic black pigments such as carbon black, acetylene black, lamp black, bone black, graphite, iron black, and titanium black.

In the colored photosensitive resin composition of the present invention, the (a) content ratio of the colorant is 30% by mass or less, preferably 25% by mass or less, more preferably 25% by mass or less, relative to the total solid content of the colored photosensitive resin composition. Preferably, it is 20 mass % or less, More preferably, it is 15 mass % or less, Most preferably, it is 10 mass % or less. Moreover, it is preferably at least 1% by mass, more preferably at least 3% by mass, further preferably at least 4% by mass, and particularly preferably at least 5% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-30 mass % is preferable, 3-25 mass % is more preferable, 4-20 mass % is still more preferable, 5-15 mass % is still more preferable, 5-10 mass % is especially preferable. There exists a tendency for the reflectance of a barrier rib to become high by setting it as more than the said lower limit. There exists a tendency for the adhesiveness with a board|substrate to become high by making it below the said upper limit.

When (a1) the white pigment contains titanium oxide, the content ratio of titanium oxide in the colored photosensitive resin composition of the present invention is 30% by mass or less with respect to the total solid content of the colored photosensitive resin composition , preferably 25% by mass or less, more preferably 20% by mass or less, further preferably 15% by mass or less, further preferably 10% by mass or less. Moreover, it is preferably at least 1% by mass, more preferably at least 2% by mass, further preferably at least 3% by mass, particularly preferably at least 4% by mass, particularly preferably at least 5% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-30 mass % is preferable, 2-25 mass % is more preferable, 3-20 mass % is more preferable, 4-15 mass % is still more preferable, 5-10 mass % is especially preferable. There exists a tendency for the reflectance of a barrier rib to become high by setting it as more than the said lower limit. There exists a tendency for dispersion stability to become high by making it below the said upper limit.

(a) The content ratio of the (a1) white pigment in the colorant is preferably at least 50% by mass, more preferably at least 60% by mass, further preferably at least 70% by mass, based on the total mass of the (a) colorant, Furthermore, it is more preferably 80 mass % or more, especially preferably 90 mass % or more, and it is 100 mass % or less. There exists a tendency for the reflectance of a barrier rib to become high by setting it as more than the said lower limit. (a) The content ratio of titanium oxide in the colorant is preferably at least 50% by mass, more preferably at least 60% by mass, further preferably at least 70% by mass, and still more preferably at least 70% by mass, based on the total mass of the (a) colorant It is 80 mass % or more, especially 90 mass % or more, and it is 100 mass % or less. There exists a tendency for the reflectance of a barrier rib to become high by setting it as more than the said lower limit.

[1-1-2] (b) Alkali-soluble resin The colored photosensitive resin composition of this invention contains (b) alkali-soluble resin. In this invention, it will not specifically limit as (b) alkali-soluble resin, if it can develop with an alkaline developing solution. As the alkali-soluble resin, various resins having a carboxyl group or a hydroxyl group may be mentioned, and those having a carboxyl group are preferable from the viewpoint of being excellent in developability.

The (b) alkali-soluble resin of the colored photosensitive resin composition of the present invention has a double bond equivalent of 400 g/mol or less. In addition, the (b) alkali-soluble resin preferably contains an acrylic copolymer resin (b1) having a partial structure represented by the following general formula (I) (hereinafter, sometimes simply referred to as "acrylic copolymer resin (b1)") ).

[Chem 3]

In formula (I), R ¹ and R ² each independently represent a hydrogen atom or a methyl group. ＊Indicates a bonding key.

[Acrylic copolymer resin (b1)] The acrylic copolymer resin (b1) has a partial structure including a side chain having an ethylenically unsaturated group as represented by formula (I). It is believed that having an ethylenically unsaturated group causes photohardening caused by exposure to become a firmer film, and it is not easy to flow out the liquid repellant during development, and it is easy to express ink repellency. In addition, by having the partial structure represented by the formula (I), the flexibility of the film is maintained, and free radicals tend to disperse easily.

Moreover, among the partial structures represented by formula (I), the partial structure represented by following general formula (I') is preferable from a viewpoint of sensitivity or alkali developability.

[chemical 4]

In formula (I'), R ¹ and R ² each independently represent a hydrogen atom or a methyl group. R ^X represents a hydrogen atom or a polybasic acid residue.

The polybasic acid residue in the formula (I') means a valent group obtained by removing one OH group from a polybasic acid or an anhydride thereof. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. , one of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid or 2 or more. From the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid are preferred. Formic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

The content ratio of the partial structure represented by the formula (I) contained in the acrylic copolymer resin (b1) is not particularly limited, but is preferably 10 mol% or more, more preferably 30 mol% or more, more preferably 50 mol% or more, more preferably 60 mol% or more, particularly preferably 70 mol% or more, especially preferably 80 mol% mol% or more, and preferably 99 mol% or less, more preferably 95 mol% or less, further preferably 90 mol% or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 10-99 mol%, preferably 30-95 mol%, more preferably 50-95 mol%, further preferably 60-95 mol%, even more preferably 70-95 mol% , preferably 80-90 mole%. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

When the acrylic copolymer resin (b1) has a partial structure represented by the formula (I'), its content ratio is not particularly limited, but it is relatively small relative to the total number of moles of the constituent units of the acrylic copolymer resin (b1). Preferably at least 10 mol %, more preferably at least 30 mol %, more preferably at least 50 mol %, even more preferably at least 60 mol %, especially preferably at least 70 mol %, especially preferably at least 70 mol % 80 mol% or more, and preferably 99 mol% or less, more preferably 95 mol% or less, further preferably 90 mol% or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 10-99 mol%, preferably 30-95 mol%, more preferably 50-95 mol%, further preferably 60-95 mol%, even more preferably 70-95 mol% , preferably 80-90 mole%. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

(partial structure represented by general formula (II)) The partial structure of the acrylic copolymer resin (b1) is not particularly limited other than the partial structure represented by the formula (I), but it may have the following general formula (II) from the viewpoint of developing adhesiveness, for example The partial structure represented.

[chemical 5]

In formula (II), R ³ represents a hydrogen atom or a methyl group, and R ⁴ represents an alkyl group that may have a substituent, an aromatic ring group that may have a substituent, or an alkenyl group that may have a substituent.

(R ⁴ ) In the above formula (II), R ⁴ represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent. The alkyl group in R ⁴ may, for example, be a linear, branched or cyclic alkyl group. The carbon number is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, especially preferably 8 or more, and preferably 20 or less, more preferably 18 or less, further preferably 16 or less, and further preferably More preferably, it is 14 or less, especially preferably 12 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-20 is preferable, 1-18 is more preferable, 3-16 is still more preferable, 5-14 is still more preferable, 8-12 is especially preferable. There exists a tendency for film strength to become high and image development adhesiveness to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

As an alkyl group, a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentyl group, and a dodecyl group are mentioned, for example. From the viewpoint of developability, dicyclopentyl and dodecyl are preferred, and dicyclopentyl is more preferred. Examples of substituents that the alkyl group may have include: methoxy group, ethoxy group, chlorine group, bromine group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, A carboxyl group, an acryl group, and a methacryl group are preferably a hydroxyl group and an oligoglycol group from the viewpoint of developability.

The aromatic ring group in R ⁴ may, for example, be a monovalent aromatic hydrocarbon ring group or a monovalent aromatic heterocyclic group. The carbon number is preferably at least 6, and is preferably at most 24, more preferably at most 22, further preferably at most 20, particularly preferably at most 18. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 6-24, Preferably it is 6-22, More preferably, it is 6-20, More preferably, it is 6-18. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環。 作為芳香族雜環基中之芳香族雜環，可為單環，亦可為縮合環，例如可例舉：呋喃環、苯并呋喃環、噻吩環、苯并噻吩環、吡咯環、吡唑環、咪唑環、㗁二唑環、吲哚環、咔唑環、吡咯并咪唑環、吡咯并吡唑環、吡咯并吡咯環、噻吩并吡咯環、噻吩并噻吩環、呋喃并吡咯環、呋喃并呋喃環、噻吩并呋喃環、苯并異㗁唑環、苯并異噻唑環、苯并咪唑環、吡啶環、吡𠯤環、嗒𠯤環、嘧啶環、三𠯤環、喹啉環、異喹啉環、㖕啉環、喹㗁啉環、啡啶環、苯并咪唑環、呸啶環、喹唑啉環、喹唑啉酮環、薁環。就顯影性之觀點而言，較佳為苯環、萘環，更佳為苯環。 作為芳香族環基可具有之取代基，例如可例舉：甲基、乙基、丙基、甲氧基、乙氧基、氯基、溴基、氟基、羥基、胺基、環氧基、低聚乙二醇基、苯基、羧基，就顯影性之觀點而言，較佳為羥基、低聚乙二醇基。 As the aromatic hydrocarbon ring in the aromatic hydrocarbon ring group, it can be a single ring or a condensed ring, such as: benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring,

ring, terpene ring, ethane-naphthalene ring, fluoranthene ring, and fluorine ring. The aromatic heterocycle in the aromatic heterocyclic group may be a single ring or a condensed ring, for example, furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, oxadiazole ring, indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furan Furan ring, thienofuran ring, benzisoxazole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, pyridine ring, pyrimidine ring, three sulfa ring, quinoline ring, iso Quinoline ring, phenoline ring, quinoline ring, phenanthridine ring, benzimidazole ring, pythidine ring, quinazoline ring, quinazolinone ring, azulene ring. From the viewpoint of developability, a benzene ring and a naphthalene ring are preferable, and a benzene ring is more preferable. Examples of substituents that the aromatic ring group may have include: methyl, ethyl, propyl, methoxy, ethoxy, chlorine, bromine, fluorine, hydroxyl, amino, epoxy , an oligoethylene glycol group, a phenyl group, and a carboxyl group, and preferably a hydroxyl group and an oligoethylene glycol group from the viewpoint of developability.

The alkenyl in R ⁴ may, for example, be linear, branched or cyclic alkenyl. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, further preferably 18 or less, still more preferably 16 or less, particularly preferably 14 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, More preferably, it is 2-16, More preferably, it is 2-14. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

Examples of substituents that an alkenyl group may have include: methoxy, ethoxy, chloro, bromo, fluoro, hydroxyl, amine, epoxy, oligoglycol, phenyl, The carboxyl group is preferably a hydroxyl group or an oligoethylene glycol group from the viewpoint of developability.

R ⁴ is preferably an alkyl group or an alkenyl group, more preferably an alkyl group, from the viewpoint of developability and film strength.

When the acrylic copolymer resin (b1) has a partial structure represented by the formula (II), its content ratio is not particularly limited, but it is preferably relative to the total number of moles of the constituent units of the acrylic copolymer resin (b1) It is more than 1 mole %, more preferably more than 2 mole %, more preferably more than 5 mole %, more preferably more than 10 mole %, especially preferably more than 20 mole %, and more preferably 70 mol% or less, more preferably 60 mol% or less, further preferably 50 mol% or less, further preferably 40 mol% or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-70 mol%, preferably 2-70 mol%, more preferably 5-60 mol%, still more preferably 10-50 mol%, most preferably 20-40 mol%. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

(partial structure represented by general formula (III)) In addition to the partial structure represented by the formula (I), the partial structure of the acrylic copolymer resin (b1) may also have the following general formula (III) from the viewpoint of heat resistance and film strength. partial structure.

[chemical 6]

In formula (III), R ⁵ represents a hydrogen atom or a methyl group, R ⁶ represents an alkyl group that may have a substituent, an alkenyl group that may have a substituent, an alkynyl group that may have a substituent, a hydroxyl group, a carboxyl group, a halogen atom, or an optional substituent An alkoxy group having a substituent, a thiol group, or an alkylthio group which may have a substituent. t represents an integer of 0-5.

(R ⁶ ) The alkyl group in R ⁶ may, for example, be linear, branched or cyclic. The carbon number is preferably at least 1, more preferably at least 3, more preferably at least 5, and preferably at most 20, more preferably at most 18, further preferably at most 16, and even more preferably at most 14, Preferably under 12. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 3-16, More preferably, it is 5-14. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

As an alkyl group, a methyl group, an ethyl group, a cyclohexyl group, a dicyclopentyl group, and a dodecyl group are mentioned, for example. From the viewpoint of developability and film strength, dicyclopentyl or dodecyl is preferred, and dicyclopentyl is more preferred. Examples of substituents that the alkyl group may have include: methoxy group, ethoxy group, chlorine group, bromine group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, A carboxyl group, an acryl group, and a methacryl group are preferably a hydroxyl group and an oligoglycol group from the viewpoint of developability.

The alkenyl in R ⁶ may, for example, be linear, branched or cyclic alkenyl. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, further preferably 18 or less, still more preferably 16 or less, particularly preferably 14 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, More preferably, it is 2-16, More preferably, it is 2-14. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

Examples of substituents that an alkenyl group may have include: methoxy, ethoxy, chloro, bromo, fluoro, hydroxyl, amine, epoxy, oligoglycol, phenyl, The carboxyl group is preferably a hydroxyl group or an oligoethylene glycol group from the viewpoint of developability.

The alkynyl group in R ⁶ may, for example, be straight-chain, branched or cyclic alkynyl. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, further preferably 18 or less, still more preferably 16 or less, particularly preferably 14 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, More preferably, it is 2-16, More preferably, it is 2-14. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

Examples of substituents that an alkynyl group may have include: methoxy, ethoxy, chloro, bromo, fluoro, hydroxyl, amine, epoxy, oligoethylene glycol, phenyl, The carboxyl group is preferably a hydroxyl group or an oligoethylene glycol group from the viewpoint of developability.

As the halogen atom in ^R6 , for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom may be mentioned, and a fluorine atom is preferable from the viewpoint of ink repellency.

The alkoxy group in R ⁶ may, for example, be a linear, branched or cyclic alkoxy group. The carbon number is 1 or more, preferably 20 or less, more preferably 18 or less, further preferably 16 or less, still more preferably 14 or less, particularly preferably 12 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 1-16, More preferably, it is 1-14, More preferably, it is 1-12. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

Examples of substituents that an alkoxy group may have include: methoxy group, ethoxy group, chlorine group, bromine group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group , carboxyl, acryl, and methacryl, and from the viewpoint of developability, preferably hydroxyl and oligoethylene glycol.

The alkylthio group in R ⁶ may, for example, be a linear, branched or cyclic alkylthio group. The number of carbon atoms is preferably at least 1, preferably at most 20, more preferably at most 18, further preferably at most 16, even more preferably at most 14, particularly preferably at most 12. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 1-16, More preferably, it is 1-14, More preferably, it is 1-12. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

Examples of substituents that the alkyl group in the alkylthio group may have include: methoxy, ethoxy, chloro, bromo, fluoro, hydroxyl, amine, epoxy, ethylene glycol Alcohol group, phenyl group, carboxyl group, acryl group, and methacryl group are preferably hydroxyl group and oligoglycol group from the viewpoint of developability.

From the viewpoint of developability, R ⁶ is preferably a hydroxyl group or a carboxyl group, and more preferably a carboxyl group.

In formula (III), t represents an integer of 0 to 5, and t is preferably 0 from the viewpoint of ease of manufacture.

When the acrylic copolymer resin (b1) has a partial structure represented by the formula (III), its content ratio is not particularly limited, but it is preferably relative to the total number of moles of the constituent units of the acrylic copolymer resin (b1) It is 0.5 mol % or more, more preferably 1 mol % or more, still more preferably 2 mol % or more, especially preferably 4 mol % or more. Moreover, it is preferably 50 mol% or less, more preferably 30 mol% or less, further preferably 20 mol% or less, still more preferably 10 mol% or less, especially preferably 6 mol% or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 0.5-50 mol%, preferably 1-30 mol%, more preferably 1-20 mol%, further preferably 2-10 mol%, still more preferably 4-6 mol% . There exists a tendency for the uniformity of a film to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

(partial structure represented by general formula (IV)) In addition to the partial structure represented by the formula (I), the partial structure of the acrylic copolymer resin (b1) may have a partial structure represented by the following general formula (IV) from the viewpoint of developability.

[chemical 7]

In formula (IV), R ⁷ represents a hydrogen atom or a methyl group.

When the acrylic copolymer resin (b1) has a partial structure represented by the formula (IV), its content ratio is not particularly limited, but it is preferably relative to the total number of moles of the constituent units of the acrylic copolymer resin (b1) It is more than 5 mole %, more preferably more than 10 mole %, more preferably more than 20 mole %, and preferably less than 80 mole %, more preferably less than 70 mole %, and more preferably Below 60 mole%. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 5-80 mol%, preferably 10-70 mol%, more preferably 20-60 mol%. There exists a tendency for a residue to reduce by setting it as more than the said lower limit. There exists a tendency for ink repellency to improve by being below the said upper limit.

The double bond equivalent of the acrylic copolymer resin (b1) is 400 g/mol or less, preferably 350 g/mol or less, more preferably 300 g/mol or less, further preferably 270 g/mol or less. Also, it is preferably at least 80 g/mol, more preferably at least 100 g/mol, still more preferably at least 150 g/mol, particularly preferably at least 200 g/mol. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 80-400 g/mol, more preferably 100-350 g/mol, still more preferably 150-300 g/mol, especially preferably 200-270 g/mol. There exists a tendency for ink repellency to improve by being below the said upper limit. There exists a tendency for developability to improve by making it more than the said lower limit.

The double bond equivalent of the acrylic copolymer resin (b1) can be calculated by the following formula. (Double bond equivalent of acrylic copolymer resin (b1)) =(weight average molecular weight of acrylic copolymer resin (b1))/(number of ethylenically unsaturated double bonds per molecule of acrylic copolymer resin (b1))

The acid value of the acrylic copolymer resin (b1) is not particularly limited, but is preferably at least 10 mgKOH/g, more preferably at least 15 mgKOH/g, still more preferably at least 20 mgKOH/g, still more preferably at least 25 mgKOH /g or more, preferably more than 30 mgKOH/g, and preferably less than 150 mgKOH/g, more preferably less than 120 mgKOH/g, more preferably less than 100 mgKOH/g, and more preferably 80 mgKOH/g below g. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 10-150 mgKOH/g, more preferably 15-120 mgKOH/g, further preferably 20-100 mgKOH/g, further preferably 25-80 mgKOH/g, especially preferably 30-80 mgKOH /g. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for image development adhesiveness to improve by being below the said upper limit.

The weight average molecular weight (Mw) of the acrylic copolymer resin (b1) is not particularly limited, but is preferably at least 1,000, more preferably at least 2,000, further preferably at least 4,000, still more preferably at least 6,000, and especially preferably at least 7,000. More preferably, it is 30,000 or less, more preferably 20,000 or less, still more preferably 15,000 or less, especially preferably 10,000 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 1000-30000, more preferably 2000-20000, still more preferably 4000-20000, still more preferably 6000-15000, particularly preferably 7000-15000, especially preferably 7000-10000. Image development adhesiveness tends to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

The content ratio of the acrylic copolymer resin (b1) contained in the alkali-soluble resin is not particularly limited, but is preferably at least 10% by mass, more preferably at least 20% by mass, based on the total mass of the alkali-soluble resin (b). More preferably, it is at least 30% by mass, more preferably at least 40% by mass, especially preferably at least 50% by mass, and more preferably at most 100% by mass, more preferably at most 95% by mass, and still more preferably at most 90% by mass. % or less, preferably less than 85% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 10-100 mass % is preferable, 20-95 mass % is more preferable, 30-90 mass % is still more preferable, 40-85 mass % is still more preferable, 50-85 mass % is especially preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

When the alkali-soluble resin contains both of the acrylic copolymer resin (b1) and the following epoxy (meth)acrylate resin (b2), the content ratio of the acrylic copolymer resin (b1) relative to the acrylic copolymer resin The total content ratio of (b1) and epoxy (meth)acrylate resin (b2) is preferably at least 10% by mass, more preferably at least 30% by mass, still more preferably at least 50% by mass, still more preferably at least 50% by mass. 60 mass % or more, preferably 70 mass % or more, and preferably 99 mass % or less, more preferably 95 mass % or less, further preferably 90 mass % or less, especially preferably 85 mass % or less. For example, 10-99 mass % is preferable, 30-95 mass % is more preferable, 50-90 mass % is still more preferable, and 70-85 mass % is especially preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for the verticality of a barrier rib cross section to improve by being below the said upper limit.

Specific examples of the acrylic copolymer resin (b1) include, for example, resins described in JP-A-8-297366 or JP-A-2001-89533.

The (b) alkali-soluble resin of the colored photosensitive resin composition of this invention may contain epoxy (meth)acrylate resin (b2). [Epoxy (meth)acrylate resin (b2)] Epoxy (meth)acrylate resin (b2) is the addition of ethylenically unsaturated monocarboxylic acid or ester compound to epoxy resin, optionally reacting isocyanate group-containing compound, and then reacting polybasic acid or its anhydride The resulting resin. For example, an ethylenically unsaturated bond is added to an epoxy compound via an ester bond (-COO-) by ring-opening and adding a carboxyl group of an unsaturated monocarboxylic acid to an epoxy group of an epoxy resin, and to The hydroxyl group produced at this time is obtained by adding a carboxyl group of polybasic acid anhydride. Moreover, when adding a polybasic acid anhydride, what added and added polyhydric alcohol can also be mentioned.

Furthermore, the resin obtained by reacting the carboxyl group of the resin obtained by the said reaction with the compound which has a reactive functional group is also contained in the said epoxy (meth)acrylate resin (b2). In this way, epoxy (meth)acrylate resin does not have epoxy group substantially in chemical structure, and is not limited to "(meth)acrylate", but since epoxy compound (epoxy resin) is used as a raw material, And "(meth)acrylate" is a representative example, so the epoxy (meth)acrylate resin is named according to the convention. As (b2) epoxy (meth)acrylate resin, what has an aromatic ring in a main chain can be used more preferably from the viewpoint of the linearity of a pattern.

Here, the epoxy resin refers to what also includes the raw material compound before forming a resin by thermosetting, and as this epoxy resin, it can select suitably from well-known epoxy resin, and can use it. Moreover, the compound obtained by making a phenolic compound and epihalohydrin react can be used for an epoxy resin. The phenolic compound is preferably a compound having a divalent or higher phenolic hydroxyl group, and may be a monomer or a polymer. Specifically, for example, bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenolic novolak epoxy resin, cresol novolac epoxy resin, biphenol novolac Epoxy resin, trisphenol epoxy resin, polymerized epoxy resin of phenol and dicyclopentadiene, dihydroxy fluorine type epoxy resin, dihydroxy alkeneoxy fluorine type epoxy resin, 9,9-bis( Diglycidyl ether compound of 4'-hydroxyphenyl) terpene and diglycidyl ether compound of 1,1-bis(4'-hydroxyphenyl)adamantane, those having an aromatic ring in the main chain can be preferably used.

From the viewpoint of higher cured film strength, bisphenol A epoxy resin, phenolic novolac epoxy resin, cresol novolac epoxy resin, and polymerized epoxy resin of phenol and dicyclopentadiene are preferred , 9,9-bis(4'-hydroxyphenyl) diglycidyl etherate of terpene, especially bisphenol A epoxy resin. As the epoxy resin, for example, bisphenol A type epoxy resin (for example, "jER (registered trademark, the same below) 828", "jER1001", "jER1002", "jER1004" manufactured by Mitsubishi Chemical Co., Ltd., Japan "NER-1302" (epoxy equivalent 323, softening point 76°C) manufactured by Kayaku Co., Ltd.), bisphenol F type resin (for example, "jER807", "jER4004P", "jER4005P", "jER4005P" manufactured by Mitsubishi Chemical Co., Ltd. jER4007P”, Nippon Kayaku’s “NER-7406” (epoxy equivalent 350, softening point 66°C), etc.), bisphenol S-type epoxy resin, biphenyl glycidyl ether (for example, Mitsubishi Chemical’s “ jERYX-4000"), phenolic novolak-type epoxy resin (for example, "EPPN (registered trademark, the same below)-201" manufactured by Nippon Kayaku Co., Ltd., "jER152" and "jER154" manufactured by Mitsubishi Chemical Co., Ltd., pottery "DEN-438" manufactured by Shi Chemical Co., Ltd.), (ortho, m, p) cresol novolak type epoxy resin (for example, "EOCN (registered trademark, the same below)-102S" manufactured by Nippon Kayaku Co., Ltd., " EOCN-1020", "EOCN-104S"), triglycidyl isocyanurate (for example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd.), trisphenol methane type epoxy resin (for example, Nippon Kayaku Co., Ltd. "EPPN-501", "EPPN-502", "EPPN-503" manufactured by the company), alicyclic epoxy resins ("Celoxide (registered trademark, the same below) 2021P" manufactured by Daicel Corporation, "Celloxide EHPE"), Epoxy resins obtained by glycidylating phenol resins obtained by reacting dicyclopentadiene with phenols (for example, "EXA-7200" manufactured by DIC Corporation, "NC-7300" manufactured by Nippon Kayaku Co., Ltd.) . Epoxy resins represented by the following general formulas (i-11) to (i-14). Specifically, for example, "XD-1000" manufactured by Nippon Kayaku Co., Ltd., which is an epoxy resin represented by the following general formula (i-11), and "XD-1000" represented by the following general formula (i-12) The epoxy resin is "NC-3000" manufactured by Nippon Kayaku Co., Ltd., and "ESF-300" manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd. is an epoxy resin represented by the following general formula (i-14).

[chemical 8]

In formula (i-11), n is an average value and represents a number of 0-10. R ¹¹¹ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, a plurality of R ¹¹¹ present in one molecule may be the same or different.

[chemical 9]

In formula (i-12), n is an average value and represents a number of 0-10. R ¹²¹ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, a plurality of R ¹²¹ present in one molecule may be the same or different.

[chemical 10]

In formula (i-13), X represents a linking group represented by the following general formula (i-13-1) or (i-13-2). Among them, the molecular structure contains more than one adamantane structure. c means 2 or 3.

[chemical 11]

In the formulas (i-13-1) and (i-13-2), R ¹³¹ to R ¹³⁴ and R ¹³⁵ to R ¹³⁷ independently represent an adamantyl group which may have a substituent, a hydrogen atom, and a substituent An alkyl group having 1 to 12 carbon atoms, or a phenyl group which may have a substituent. ＊Indicates a bonding key.

[chemical 12]

In formula (i-14), p and q each independently represent an integer of 0 to 4, and R ¹⁴¹ and R ¹⁴² each independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom. R ¹⁴³ and R ¹⁴⁴ each independently represent an alkylene group having 1 to 4 carbon atoms. x and y each independently represent an integer of 0 or more.

It is preferable to use the epoxy resin represented by any one of formula (i-11)-(i-14).

Examples of ethylenically unsaturated monocarboxylic acids include (meth)acrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid, etc., and pentaerythritol tri(meth)acrylate Succinic anhydride adduct, pentaerythritol tri(meth)acrylate tetrahydrophthalic anhydride adduct, dipentaerythritol penta(meth)acrylate succinic anhydride adduct, dipentaerythritol penta(meth)acrylate o Phthalic anhydride adduct, dipentaerythritol penta(meth)acrylate tetrahydrophthalic anhydride adduct, reaction product of (meth)acrylic acid and ε-caprolactone. From the viewpoint of sensitivity, (meth)acrylic acid is preferable.

As the polybasic acid (anhydride), for example, succinic acid, maleic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, 3-methyltetrahydrophthalic acid, 4-methyl Tetrahydrophthalic acid, 3-ethyltetrahydrophthalic acid, 4-ethyltetrahydrophthalic acid, hexahydrophthalic acid, 3-methylhexahydrophthalic acid, 4-methyl Hexahydrophthalic acid, 3-ethylhexahydrophthalic acid, 4-ethylhexahydrophthalic acid, trimellitic acid, pyromellitic acid, benzophenone tetracarboxylic acid, biphenyl Tetracarboxylic acids, and their anhydrides. From the viewpoint of outgassing, succinic anhydride, maleic anhydride, tetrahydrophthalic anhydride, and hexahydrophthalic anhydride are preferable, and succinic anhydride and tetrahydrophthalic anhydride are more preferable.

By using a polyhydric alcohol, the molecular weight of an epoxy (meth)acrylate resin (b2) can be enlarged, a branch can be introduced into a molecule, and the balance of molecular weight and viscosity can be acquired. In addition, there is a tendency that the introduction rate of acid groups into the molecule can be increased, and a balance between sensitivity and adhesiveness can be easily obtained. As the polyhydric alcohol, for example, one selected from trimethylolpropane, di-trimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, and 1,2,3-propanetriol is preferable. Or two or more polyols.

As an epoxy (meth)acrylate resin (b2), what was described in Korean Laid-open Patent No. 10-2013-0022955 can also be mentioned, for example other than the above.

The acid value of the epoxy (meth)acrylate resin (b2) is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, and further preferably More preferably 70 mgKOH/g or more, especially preferably 80 mgKOH/g or more, and preferably 200 mgKOH/g or less, more preferably 180 mgKOH/g or less, more preferably 150 mgKOH/g or less, and even more preferably Preferably, it is 120 mgKOH/g or less, especially preferably 110 mgKOH/g or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 10-200 mgKOH/g, more preferably 30-180 mgKOH/g, further preferably 50-150 mgKOH/g, further preferably 70-120 mgKOH/g, and most preferably 80-110 mgKOH /g. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit.

The weight average molecular weight (Mw) of the epoxy (meth)acrylate resin (b2) is not particularly limited, but is preferably at least 1,000, more preferably at least 2,000, further preferably at least 3,000, and even more preferably at least 4,000 , preferably at least 5,000, more preferably at most 30,000, more preferably at most 20,000, further preferably at most 15,000, further preferably at most 10,000, and most preferably at most 8,000. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1000-30000 is preferable, 2000-20000 is more preferable, 3000-15000 is more preferable, 4000-10000 is more preferable, 5000-8000 is especially preferable. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

The double bond equivalent of the epoxy (meth)acrylate resin (b2) is not particularly limited, but is preferably 600 g/mol or less, more preferably 500 g/mol or less, further preferably 450 g/mol or less, More preferably, it is 400 g/mol or less, and more preferably 100 g/mol or more, more preferably 200 g/mol or more, further preferably 250 g/mol or more, especially preferably 300 g/mol or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 100-600 g/mol, more preferably 200-500 g/mol, still more preferably 250-450 g/mol, especially preferably 300-400 g/mol. There exists a tendency for ink repellency to improve by being below the said upper limit. There exists a tendency for developability to improve by making it more than the said lower limit. The double bond equivalent of epoxy (meth)acrylate resin (b2) can be calculated by the same method as the double bond equivalent of acrylic copolymer resin (b1).

When the (b) alkali-soluble resin contains epoxy (meth)acrylate resin (b2), the content ratio is not particularly limited, but is preferably 10% by mass relative to the total mass of (b) alkali-soluble resin more than 20% by mass, more preferably more than 30% by mass, more preferably more than 35% by mass, especially preferably more than 40% by mass, most preferably more than 50% by mass, and more preferably 90% by mass Mass % or less, More preferably, it is 70 mass % or less, More preferably, it is 60 mass % or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 10 to 90% by mass, more preferably 20 to 90% by mass, further preferably 30 to 70% by mass, still more preferably 35 to 70% by mass, particularly preferably 40 to 60% by mass, especially Preferably, it is 50 to 60% by mass. There exists a tendency for linearity to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

Epoxy (meth)acrylate resin (b2) can be synthesize|combined by the method known previously. Specifically, the following method can be used: the above-mentioned epoxy resin is dissolved in an organic solvent, and under the coexistence of a catalyst and a thermal polymerization inhibitor, an acid or ester compound having the above-mentioned ethylenically unsaturated bond is added to carry out an addition reaction, Furthermore, polybasic acid or its anhydride is added to continue the reaction. For example, methods described in Japanese Patent No. 3938375 and Japanese Patent No. 5169422 may be mentioned.

Examples of organic solvents used in the reaction include one or more organic solvents such as methyl ethyl ketone, cyclohexanone, diethylene glycol ethyl ether acetate, and propylene glycol monomethyl ether acetate. . Examples of the catalyst include: tertiary amines such as triethylamine, dimethylbenzylamine, and tribenzylamine; tetramethylammonium chloride; methyltriethylammonium chloride; tetraethylammonium chloride; One or more of quaternary ammonium salts such as tetrabutylammonium chloride and trimethylbenzylammonium chloride, phosphorus compounds such as triphenylphosphine, and antimony such as triphenylantimony. As a thermal polymerization inhibitor, 1 type or 2 or more types of hydroquinone, hydroquinone monomethyl ether, and methyl hydroquinone are mentioned, for example.

The amount of the acid or ester compound having an ethylenically unsaturated bond is preferably 0.7-1.3 chemical equivalents, more preferably 0.9-1.1 chemical equivalents, relative to 1 chemical equivalent of the epoxy group of the epoxy resin. The temperature at the time of the addition reaction is preferably from 60 to 150°C, more preferably from 80 to 120°C. The amount of the polybasic acid (anhydride) used is preferably 0.1 to 1.2 chemical equivalents, more preferably 0.2 to 1.1 chemical equivalents relative to 1 chemical equivalent of hydroxyl groups generated in the addition reaction.

Regarding the epoxy (meth)acrylate resin (b2), from the viewpoint of film strength or linearity, the epoxy (meth)acrylate resin (b2) preferably contains At least one of the group consisting of epoxy (meth)acrylate resin with a partial structure represented by ) and epoxy (meth)acrylate resin with a partial structure represented by the following general formula (ii) .

[chemical 13]

In formula (i), R ^a represents a hydrogen atom or a methyl group, and R ^b represents a divalent hydrocarbon group which may have a substituent. The benzene ring in formula (i) may be further substituted with any substituent. ＊Indicates a bonding key.

[chemical 14]

In formula (ii), R ^c each independently represent a hydrogen atom or a methyl group. R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. ＊Indicates a bonding key.

Epoxy (meth)acrylate resin (hereinafter sometimes referred to as "epoxy (meth)acrylate resin (b2-1)") having a partial structure represented by the following general formula (i) will be described in detail. describe.

[chemical 15]

In formula (i), R ^a represents a hydrogen atom or a methyl group, and R ^b represents a divalent hydrocarbon group which may have a substituent. The benzene ring in formula (i) may be further substituted with any substituent. ＊Indicates a bonding key.

(R ^b ) In the above formula (i), R ^b represents a divalent hydrocarbon group which may have a substituent. As the divalent hydrocarbon group, for example, a divalent aliphatic group, a divalent aromatic ring group, and a group obtained by linking one or more divalent aliphatic groups and one or more divalent aromatic ring groups may be mentioned.

The divalent aliphatic group may, for example, be a linear, branched or cyclic aliphatic group. Among them, a straight-chain aliphatic group is preferable from the viewpoint of image development solubility, and a cyclic aliphatic group is preferable from the viewpoint of reducing penetration of a developing solution into an exposed portion on the other hand. The carbon number is preferably at least 1, more preferably at least 3, still more preferably at least 6, and is preferably at most 20, more preferably at most 15, and still more preferably at least 10. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 3-15, More preferably, it is 6-10. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for ink repellency to improve by being below the said upper limit.

As a divalent linear aliphatic group, a methylene group, an ethylidene group, a n-propylidene group, a n-butylene group, a n-hexylene group, and a n-heptyl group are mentioned, for example. Among them, methylene is preferable from the viewpoint of ink repellency or production cost. Examples of the divalent branched aliphatic group include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second Dibutyl, tertiary butyl as side chain structure. The number of rings in the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 10 or more, more preferably 5 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-5. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. As a divalent cyclic aliphatic group, for example, a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norberane ring, an isobornane ring, an adamantane ring, A group obtained by removing two hydrogen atoms from a ring such as cyclododecane ring. Among them, a group obtained by removing two hydrogen atoms from the adamantane ring is preferable from the viewpoint of film strength and developability.

As a substituent which a divalent aliphatic group may have, a C1-C5 alkoxy group, such as a methoxy group and an ethoxy group, a hydroxyl group, a nitro group, a cyano group, and a carboxyl group are mentioned, for example. Among these, unsubstituted is preferred from the viewpoint of easiness of synthesis.

Moreover, as a divalent aromatic ring group, a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group are mentioned. The carbon number is preferably at least 4, more preferably at least 5, still more preferably at least 6, and is preferably at most 20, more preferably at most 15, and still more preferably at least 10. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-20, Preferably it is 5-15, More preferably, it is 6-10. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環。The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. As the divalent aromatic hydrocarbon ring group, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring,

ring, terpene ring, ethane-naphthalene ring, fluoranthene ring, and fluorine ring.

The aromatic heterocycle in the aromatic heterocyclic group may be a single ring or a condensed ring. Examples of divalent aromatic heterocyclic groups include furan rings, benzofuran rings, thiophene rings, benzothiophene rings, pyrrole rings, pyrazole rings, imidazole rings, and oxadiazoles having two free atomic valences. ring, indole ring, carbazole ring, pyrrolopyrrole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furofuran ring, thienofuran ring , Benzisoxazole ring, Benzisothiazole ring, Benzimidazole ring, Pyridine ring, Pyridine ring, Pyridine ring, Pyrimidine ring, Trinyl ring, Quinoline ring, Isoquinoline ring, Gheoline ring, Quinoline ring, phenanthridine ring, phetidine ring, quinazoline ring, quinazolinone ring, azulene ring. Among them, from the viewpoint of production cost, a benzene ring and a naphthalene ring having two free atomic valences are preferable, and a benzene ring having two free atomic valences is more preferable.

As a substituent which a divalent aromatic ring group may have, a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group are mentioned, for example. Among these, unsubstituted is preferable from the viewpoint of hardenability.

As a group formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups, there may be mentioned: a combination of one or more divalent aliphatic groups and one or more divalent aromatic ring groups. A group formed by linking valent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, more preferably 10 or more, more preferably 5 or less, further preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit. The number of divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, further preferably 10 or more, more preferably 5 or less, further preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

As a group which connected one or more divalent aliphatic groups and one or more divalent aromatic ring groups, the group represented by following formula (i-A) - (i-F) is mentioned, for example. From the viewpoint of the rigidity of the skeleton and the hydrophobization of the film, a group represented by the following formula (i-A) is preferable.

[chemical 16]

The benzene ring in formula (i) may be further substituted with any substituent. As a permissible substituent of the benzene ring in formula (i), for example, a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group may, for example, be mentioned. The number of substituents is also not particularly limited, and may be one or two. Among these, unsubstituted is preferable from the viewpoint of hardenability.

Regarding the partial structure represented by the formula (i), the partial structure represented by the formula (i) is preferably a partial structure represented by the following general formula (i-1) from the viewpoint of image development solubility.

[chemical 17]

In formula (i-1), R ^a and R ^b have the same meaning as those in formula (i) above. ^RY represents a hydrogen atom or a residue of a polybasic acid. ＊Indicates a bonding key. The benzene ring in formula (i-1) may be further substituted with any substituent.

The polybasic acid residue in formula (i-1) means a valent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. , one of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid or 2 or more. From the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid are preferred. Formic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

The repeating unit structure represented by the said formula (i-1) contained in 1 molecule of epoxy (meth)acrylate resin (b2-1) may be 1 type, and may be 2 or more types.

The number of partial structures represented by the above formula (i) contained in one molecule of the epoxy (meth)acrylate resin (b2-1) is not particularly limited, but is preferably 1 or more, more preferably 2 or more , and more preferably 3 or more, and more preferably 10 or more, and still more preferably 8 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-8. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit.

The number of partial structures represented by formula (i-1) contained in one molecule of epoxy (meth)acrylate resin (b2-1) is not particularly limited, but is preferably 1 or more, more preferably 2 or more, more preferably 3 or more, and more preferably 10 or more, further preferably 8 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-8. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit.

Specific examples of the epoxy (meth)acrylate resin (b2-1) are given below.

[chemical 18]

[chemical 19]

[chemical 20]

[chem 21]

[chem 22]

[chem 23]

[chem 24]

Epoxy (meth)acrylate resin (hereinafter sometimes referred to as "epoxy (meth)acrylate resin (b2-2)") having a partial structure represented by the following general formula (ii) will be described in detail. describe.

[chem 25]

In formula (ii), R ^c each independently represent a hydrogen atom or a methyl group. R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. ＊Indicates a bonding key.

(R ^d ) In the above formula (II), R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. As a cyclic hydrocarbon group, an aliphatic ring group and an aromatic ring group are mentioned.

The number of rings in the aliphatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 10 or more, more preferably 5 or less, further preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. The number of carbon atoms in the aliphatic ring group is preferably at least 4, more preferably at least 6, still more preferably at least 8, and preferably at most 40, more preferably at most 30, further preferably at most 20, especially preferably at most 15 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-40, Preferably it is 4-30, More preferably, it is 6-20, More preferably, it is 8-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

Examples of the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norberane ring, isobornane ring, and adamantane ring. , Cyclododecane ring. Among them, an adamantane ring is preferable from the viewpoint of film strength and developability.

The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, further preferably 3 or more, and preferably 10 or more, more preferably 5 or less, and further preferably Preferably it is 4 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-5, More preferably, it is 3-4. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

The aromatic ring group may, for example, be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. In addition, the number of carbon atoms in the aromatic ring group is preferably at least 4, more preferably at least 6, further preferably at least 8, even more preferably at least 10, especially preferably at least 12, and preferably at most 40, and even more preferably at least 8. Preferably, it is 30 or less, More preferably, it is 20 or less, Most preferably, it is 15 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-40, Preferably it is 6-40, More preferably, it is 8-30, More preferably, it is 10-20, More preferably, it is 12-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環。該等之中，就圖案化特性之觀點而言，較佳為茀環。As the aromatic ring in the aromatic ring group, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring,

ring, terpene ring, ethane-naphthalene ring, fluoranthene ring, and fluorine ring. Among them, from the viewpoint of patterning properties, a fennel ring is preferable.

Regarding the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, the divalent hydrocarbon group is not particularly limited, but examples thereof include: a divalent aliphatic group, a divalent aromatic ring group, a combination of one or more divalent aliphatic groups A group formed by linking one or more divalent aromatic ring groups.

The divalent aliphatic group may, for example, be a linear, branched or cyclic aliphatic group. From the viewpoint of improving developability, a straight-chain aliphatic group is preferred, and on the other hand, a cyclic aliphatic group is preferred from the viewpoint of film strength. The carbon number is preferably at least 1, more preferably at least 3, still more preferably at least 6, and is preferably at most 25, more preferably at most 20, even more preferably at most 15. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-25, Preferably it is 3-20, More preferably, it is 6-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

As a divalent linear aliphatic group, a methylene group, an ethylidene group, a n-propylidene group, a n-butylene group, a n-hexylene group, and a n-heptyl group are mentioned, for example. From the viewpoint of ink repellency, methylene is preferred. Examples of the divalent branched aliphatic group include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second Dibutyl, tertiary butyl as side chain structure.

The number of rings in the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and is preferably 10 or more, more preferably 5 or less, and still more preferably 3 the following. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

As a divalent cyclic aliphatic group, for example, a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norberane ring, an isobornane ring, an adamantane ring, The group obtained by removing 2 hydrogen atoms from the ring of cyclododecane ring. From the viewpoint of film strength, a group obtained by removing two hydrogen atoms from the adamantane ring is preferable.

As a substituent which a divalent aliphatic group may have, a C1-C5 alkoxy group, such as a methoxy group and an ethoxy group, a hydroxyl group, a nitro group, a cyano group, and a carboxyl group are mentioned, for example. From the viewpoint of easiness of synthesis, it is preferably unsubstituted.

As a divalent aromatic ring group, a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group are mentioned. The carbon number is preferably at least 4, more preferably at least 5, still more preferably at least 6, and is preferably at most 30, more preferably at most 20, and still more preferably at most 15. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-30, Preferably it is 5-20, More preferably, it is 6-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

環、聯三伸苯環、乙烷合萘環、螢蒽環、茀環。The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. As the divalent aromatic hydrocarbon ring group, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring,

ring, terpene ring, ethane-naphthalene ring, fluoranthene ring, and fluorine ring.

The aromatic heterocycle in the divalent aromatic heterocyclic group may be a single ring or a condensed ring. Examples of divalent aromatic heterocyclic groups include furan rings, benzofuran rings, thiophene rings, benzothiophene rings, pyrrole rings, pyrazole rings, imidazole rings, and oxadiazoles having two free atomic valences. ring, indole ring, carbazole ring, pyrrolopyrrole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furofuran ring, thienofuran ring , Benzisoxazole ring, Benzisothiazole ring, Benzimidazole ring, Pyridine ring, Pyridine ring, Pyridine ring, Pyrimidine ring, Trinyl ring, Quinoline ring, Isoquinoline ring, Gheoline ring, Quinoline ring, phenanthridine ring, phetidine ring, quinazoline ring, quinazolinone ring, azulene ring. From the viewpoint of production cost, a benzene ring and a naphthalene ring having two free atomic valences are preferable, and a benzene ring having two free atomic valences is more preferable.

As a substituent which a divalent aromatic ring group may have, a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group are mentioned, for example. From the viewpoint of curability, it is preferably unsubstituted.

As a group formed by linking one or more divalent aliphatic groups with one or more divalent aromatic ring groups, there may be mentioned: a combination of one or more divalent aliphatic groups and one or more divalent aromatic ring groups. A group formed by linking valent aromatic ring groups. The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, more preferably 10 or more, more preferably 5 or less, further preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit. The number of divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, preferably 2 or more, and preferably 10 or more, more preferably 5 or less, and still more preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

Specific examples of groups in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include, for example, groups represented by the above formulas (i-A) to (i-F). Among them, the group represented by the formula (i-C) is preferable from the viewpoint of both film strength and ink repellency.

The bonding state of the divalent hydrocarbon group to the cyclic hydrocarbon group as a side chain is not particularly limited, but for example, one hydrogen atom of an aliphatic group or an aromatic ring group is substituted by a cyclic hydrocarbon group as a side chain Aspect, or an aspect constituting a cyclic hydrocarbon group as a side chain including one carbon atom of an aliphatic group.

Regarding the partial structure represented by the formula (ii), the partial structure represented by the formula (ii) is preferably a partial structure represented by the following formula (ii-1) from the viewpoint of ink repellency.

[chem 26]

In formula (ii-1), R ^c has the same meaning as in formula (ii) above. R ^α represents a valent cyclic hydrocarbon group which may have a substituent. n is an integer of 1 or more. ＊Indicates a bonding key. The benzene ring in formula (ii-1) may be further substituted with any substituent.

(R ^α ) In the above formula (ii-1), R ^α represents a valent cyclic hydrocarbon group which may have a substituent. As a cyclic hydrocarbon group, an aliphatic ring group and an aromatic ring group are mentioned.

The number of rings in the aliphatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and is preferably 6 or less, more preferably 4 or less, further preferably 3 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-6, Preferably it is 1-4, More preferably, it is 2-3. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. The number of carbon atoms in the aliphatic ring group is preferably at least 4, more preferably at least 6, still more preferably at least 8, and preferably at most 40, more preferably at most 30, further preferably at most 20, especially preferably at most 15 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-40, Preferably it is 4-30, More preferably, it is 6-20, More preferably, it is 8-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

Examples of the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norberane ring, isobornane ring, and adamantane ring. , Cyclododecane ring. From the viewpoint of both film strength and developability, an adamantane ring is preferable.

The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, further preferably 3 or more, and preferably 10 or more, more preferably 5 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-5. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. The aromatic ring group may, for example, be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is preferably 4 or more, more preferably 5 or more, further preferably 6 or more, and preferably 30 or less, more preferably 20 or less, further preferably 15 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-30, Preferably it is 5-20, More preferably, it is 6-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. From the viewpoint of achieving both film strength and developability, fennel ring is preferred.

Examples of substituents that a cyclic hydrocarbon group may have include: hydroxyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, third-butyl, pentyl, isopentyl Alkyl groups with 1 to 5 carbons such as radicals; alkoxy groups with 1 to 5 carbons such as methoxy and ethoxy groups; nitro groups; cyano groups; carboxyl groups. From the viewpoint of easiness of synthesis, it is preferably unsubstituted.

n represents an integer of 1 or more, preferably 2 or more, and preferably 3 or less. For example, it is 1-3, Preferably it is 2-3. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for film strength to improve by being below the said upper limit.

From the viewpoint of both film strength and developability, R ^α is preferably a monovalent aliphatic cyclic group, more preferably an adamantyl group.

The benzene ring in formula (ii-1) may be further substituted with any substituent. As a permissible substituent of the benzene ring in formula (ii-1), for example, a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group are mentioned. The number of substituents is also not particularly limited, and may be one or two. Among these, unsubstituted is preferable from the viewpoint of hardenability.

Specific examples of the partial structure represented by the formula (ii-1) are given below.

[chem 27]

[chem 28]

[chem 29]

[chem 30]

[chem 31]

Regarding the partial structure represented by the formula (ii), the partial structure represented by the formula (ii) is preferably a partial structure represented by the following general formula (ii-2) from the viewpoint of image development adhesiveness.

[chem 32]

In formula (ii-2), R ^c has the same meaning as in formula (ii). R ^β represents a divalent cyclic hydrocarbon group which may have a substituent. ＊Indicates a bonding key. The benzene ring in formula (ii-2) may be further substituted with any substituent.

(R ^β ) In formula (ii-2), R ^β represents a divalent cyclic hydrocarbon group which may have a substituent. The cyclic hydrocarbon group may, for example, be an aliphatic ring group or an aromatic ring group.

The number of rings in the aliphatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 10 or more, more preferably 5 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-5. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. The number of carbon atoms in the aliphatic ring group is preferably 4 or more, more preferably 6 or more, further preferably 8 or more, and preferably 40 or less, more preferably 35 or less, still more preferably 30 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-40, Preferably it is 6-35, More preferably, it is 8-30. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. Examples of the aliphatic ring in the aliphatic ring group include cyclohexane ring, cycloheptane ring, cyclodecane ring, cyclododecane ring, norberane ring, isobornane ring, and adamantane ring. , Cyclododecane ring. Among them, an adamantane ring is preferable from the viewpoint of both film strength and developability.

The number of rings in the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, further preferably 3 or more, and preferably 10 or more, more preferably 5 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-5. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit. The aromatic ring group may, for example, be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. Also, the number of carbon atoms in the aromatic ring group is preferably 4 or more, more preferably 6 or more, further preferably 8 or more, especially preferably 10 or more, and preferably 40 or less, more preferably 30 or less, and more preferably Preferably below 20, especially below 15. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 4-40, Preferably it is 6-30, More preferably, it is 8-20, More preferably, it is 10-15. There exists a tendency for film strength to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. From the viewpoint of film strength and developability, fennel ring is preferred.

Examples of substituents that a cyclic hydrocarbon group may have include: hydroxyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, third-butyl, pentyl, isopentyl Alkyl groups with 1 to 5 carbons such as radicals; alkoxy groups with 1 to 5 carbons such as methoxy and ethoxy groups; nitro groups; cyano groups; carboxyl groups. From the viewpoint of the ease of synthesis, it is preferably unsubstituted.

From the viewpoint of both film strength and developability, R ^β is preferably a divalent aliphatic ring group, more preferably a divalent adamantane ring group. From the viewpoint of both film strength and developability, R ^β is preferably a divalent aromatic ring group, more preferably a divalent oxene ring group.

The benzene ring in formula (ii-2) may be further substituted with any substituent. As a permissible substituent of the benzene ring in formula (ii-2), a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group are mentioned, for example. The number of substituents is also not particularly limited, and may be one or two. From the viewpoint of curability, it is preferably unsubstituted.

Specific examples of the partial structure represented by the formula (ii-2) are given below.

[chem 33]

[chem 34]

[chem 35]

[chem 36]

The partial structure represented by formula (ii) is preferably a partial structure represented by the following general formula (ii-3) from the viewpoint of developability.

[chem 37]

In formula (ii-3), R ^c and R ^d have the same meaning as those in formula (ii). R ^Z represents a hydrogen atom or a polybasic acid residue.

The polybasic acid residue in the formula (ii-3) means a valent group obtained by removing one OH group from a polybasic acid or an anhydride thereof. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. , one of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid or 2 or more. From the viewpoint of patterning properties, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid are preferred. Formic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

The partial structure represented by the formula (ii-3) contained in 1 molecule of epoxy (meth)acrylate resin (b2-2) may be 1 type, and may be 2 or more types.

The number of partial structures represented by the formula (ii) contained in one molecule of the epoxy (meth)acrylate resin (b2-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, Moreover, it is preferably 20 or less, more preferably 15 or less, and still more preferably 10 or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

The number of partial structures represented by formula (ii-1) contained in one molecule of epoxy (meth)acrylate resin (b2-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, and still more preferably 10 or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

The number of partial structures represented by formula (ii-2) contained in one molecule of epoxy (meth)acrylate resin (b2-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, and still more preferably 10 or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

The number of partial structures represented by formula (ii-3) contained in one molecule of epoxy (meth)acrylate resin (b2-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, and still more preferably 10 or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for developability to improve by being below the said upper limit.

The (b) alkali-soluble resin in the present invention may contain other alkali-soluble resins besides the acrylic copolymer resin (b1) and the epoxy (meth)acrylate resin (b2).

(b) The acid value of the alkali-soluble resin is not particularly limited, but is preferably at least 10 mgKOH/g, more preferably at least 20 mgKOH/g, further preferably at least 25 mgKOH/g, and more preferably at least 200 mgKOH /g or less, more preferably 150 mgKOH/g or less, still more preferably 100 mgKOH/g or less, especially preferably 80 mgKOH/g or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 10-200 mgKOH/g, preferably 20-150 mgKOH/g, more preferably 25-100 mgKOH/g, especially preferably 25-80 mgKOH/g. There exists a tendency for developability to improve by making it more than the said lower limit. There exists a tendency for image development adhesiveness to improve by being below the said upper limit. In addition, when (b) alkali-soluble resin is a mixture of 2 or more types, an acid value means the weighted average value corresponding to the content ratio.

(b) The double bond equivalent weight of the alkali-soluble resin is 400 g/mol or less, preferably 390 g/mol or less, more preferably 370 g/mol or less, further preferably 350 g/mol or less, still more preferably 330 g/mol or less g/mol or less, especially preferably 300 g/mol or less. Also, it is preferably at least 100 g/mol, more preferably at least 150 g/mol, still more preferably at least 200 g/mol, particularly preferably at least 250 g/mol. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 100-400 g/mol, more preferably 150-370 g/mol, still more preferably 200-330 g/mol, especially preferably 250-300 g/mol. There exists a tendency for ink repellency to improve by being below the said upper limit. There exists a tendency for developability to improve by making it more than the said lower limit. (b) The double bond equivalent of the alkali-soluble resin can be calculated by the same method as the acrylic copolymer resin (b1). When (b) the alkali-soluble resin is a mixture of two or more types, the double bond equivalent means the The weighted average corresponding to the ratio.

The content ratio of (b) alkali-soluble resin in the colored photosensitive resin composition of the present invention is not particularly limited, but is preferably at least 5% by mass, more preferably at least 10% by mass, with respect to the total solid content, and further Preferably at least 20% by mass, more preferably at least 30% by mass, particularly preferably at least 40% by mass, particularly preferably at least 50% by mass, especially preferably at least 60% by mass, and more preferably at least 90% by mass % or less, more preferably less than 80 mass %, further preferably less than 70 mass %. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 5 to 90% by mass, preferably 10 to 90% by mass, more preferably 20 to 90% by mass, further preferably 30 to 80% by mass, still more preferably 40 to 80% by mass, especially preferably 50% by mass. ~70% by mass, preferably 60-70% by mass. There exists a tendency for a residue to reduce by setting it as more than the said lower limit. There exists a tendency for ink repellency to improve by being below the said upper limit.

The sum of the content ratio of (d) photopolymerizable compound and the content ratio of (b) alkali-soluble resin is not particularly limited with respect to the total solid content of the colored photosensitive resin composition, but is preferably 10% by mass or more, More preferably at least 30% by mass, more preferably at least 60% by mass, especially preferably at least 80% by mass, more preferably at most 98% by mass, more preferably at most 95% by mass, further preferably at most 92% by mass the following. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is 10-98 mass %, Preferably it is 30-95 mass %, More preferably, it is 60-92 mass %, More preferably, it is 80-92 mass %. There exists a tendency for the adhesiveness of a barrier rib to a base material to improve by making it more than the said lower limit. There exists a tendency for light-shielding property or ink repellency to improve by being below the said upper limit.

[1-1-3] (c) Photopolymerization initiator The colored photosensitive resin composition of this invention contains (c) photoinitiator. The (c) photopolymerization initiator will not be particularly limited as long as it is a compound that polymerizes the (d) photopolymerizable compound with an active ray.

In the colored photosensitive resin composition of the present invention, those generally used in the technical field of the present invention can be used as (c) photopolymerization initiator. For example, it can be exemplified: Japanese Patent Laid-Open No. 59-152396, Japanese Patent Laid-Open No. 61-151197, metallocene compounds containing titanocene compounds; Japanese Patent Laid-Open No. 2000-56118 Hexaarylbiimidazole derivatives; halomethylated oxadiazole derivatives, halomethyl symmetrical trioxane derivatives, N-phenylglycine Free radical active agents such as N-aryl-α-amino acids, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters, α-aminoalkylphenones Derivatives.

Specifically, as the metallocene compound, for example, dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium biphenyl, dicyclopentadienyl titanium bis(2,3,4, 5,6-pentafluorophenyl), dicyclopentadienyl titanium bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyl titanium bis(2,4,6-trifluoro phenyl), dicyclopentadienyl titanium bis(2,6-difluorophenyl), dicyclopentadienyl titanium bis(2,4-difluorophenyl), bis(methylcyclopentadiene base) titanium bis(2,3,4,5,6-pentafluorophenyl), bis(methylcyclopentadienyl)titanium bis(2,6-difluorophenyl), dicyclopentadienyl Titanium [2,6-di-fluoro-3-(pyrrol-1-yl)phenyl].

Examples of biimidazole derivatives include: 2-(2'-chlorophenyl)-4,5-dibendizole dimer, 2-(2'-chlorophenyl)-4,5-bis (3'-Methoxyphenyl) imidazole dimer, 2-(2'-fluorophenyl)-4,5-dibenzimidazole dimer, 2-(2'-methoxyphenyl)- 4,5-dibendimidazole dimer, (4'-methoxyphenyl)-4,5-dibendimidazole dimer.

Examples of halomethylated oxadiazole derivatives include: 2-trichloromethyl-5-(2'-benzofuryl)-1,3,4-oxadiazole, 2-trichloro Methyl-5-[β-(2'-benzofuryl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6' '-benzofuryl)vinyl)]-1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole.

Examples of halomethyl symmetrical trioxetine derivatives include: 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)symmetric trioxetine, 2-(4-methoxy Nylnaphthyl)-4,6-bis(trichloromethyl)symmetric trisulfone, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)symmetric trisulfite, 2-( 4-Ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)symmetric trisulfone.

Examples of α-aminoalkylphenone derivatives include: 2-methyl-1[4-(methylthio)phenyl]-2-metholinylpropan-1-one, 2-benzyl -2-Dimethylamino-1-(4-𠰌linylphenyl)butan-1-one, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-𠰌 Linylphenyl)butan-1-one, 3,6-bis(2-methyl-2-?olinylpropionyl)-9-octylcarbazole.

As the (c) photopolymerization initiator, an oxime ester compound is particularly effective in terms of sensitivity or plate making property. Since it is disadvantageous in terms of sensitivity when using an alkali-soluble resin containing a phenolic hydroxyl group, an oxime ester compound excellent in sensitivity is particularly useful. Since the oxime ester compound has the structure of absorbing ultraviolet rays, the structure of transmitting light energy and the structure of generating free radicals in its structure, it is highly sensitive and stable to heat in a small amount, and can be obtained in a small amount. In the case of high sensitivity colored photosensitive resin composition. Hereinafter, the photopolymerization initiator of an oxime ester type compound may be described as an "oxime ester type photopolymerization initiator (c1)".

As an oxime ester compound, the compound represented by following general formula (IV) is mentioned, for example.

[chem 38]

In formula (IV), R ^21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent. R ^21b represents an optional substituent including an aromatic ring. R ^22a represents an alkanoyl group which may have a substituent, or an arayl group which may have a substituent. n represents an integer of 0 or 1.

The carbon number of the alkyl group in R ^21a is not particularly limited, but from the viewpoint of solubility or sensitivity to solvents, it is preferably 1 or more, more preferably 2 or more, and is preferably 20 or less, more preferably 15 or less, and more preferably 10 or more. Examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, cyclopentylmethyl, cyclopentylethyl, cyclohexylmethyl, and cyclohexylethyl. Examples of substituents that the alkyl group may have include: aromatic ring group, hydroxyl group, carboxyl group, halogen atom, amine group, amido group, 4-(2-methoxy-1-methyl)ethoxy group - 2-methylphenyl group and N-acetyl-N-acetylamino group are preferably unsubstituted from the viewpoint of ease of synthesis.

The aromatic ring group in R ^21a may, for example, be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. The carbon number of the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the colored photosensitive resin composition. Moreover, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and still more preferably 12 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 5-30 are preferable, 5-20 are more preferable, and 5-12 are still more preferable.

Examples of the aromatic ring group include phenyl, naphthyl, pyridyl, and furyl. Among these, phenyl and naphthyl are preferred from the viewpoint of developability, and phenyl is more preferred. . The substituents that the aromatic ring group may have include, for example, hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amido groups, alkyl groups, alkoxy groups, and groups formed by linking these substituents. From the viewpoint of sex, it is preferably an alkyl group, an alkoxy group, or a group obtained by connecting them, and an alkoxy group obtained by connecting them is more preferable. From the viewpoint of sensitivity, R ^21a is preferably an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent.

基、可被取代之二苯硫醚基、可被取代之茀基或可被取代之吲哚基。就感度之觀點而言，較佳為可被取代之咔唑基。 As R ^21b , preferably, carbazolyl which may be substituted, 9-oxothiol which may be substituted

group, diphenylsulfide group which may be substituted, fenyl group which may be substituted or indolyl group which may be substituted. From the viewpoint of sensitivity, a carbazolyl group which may be substituted is preferred.

The carbon number of the alkyl group in ^R22a is not particularly limited, but from the viewpoint of solubility or sensitivity to solvents, it is preferably 2 or more, and preferably 20 or less, more preferably 15 or less, and further Preferably it is 10 or more, especially preferably 5 or less. As an alkyl group, an acetyl group, an ethyl group, a propionyl group, and a butyryl group are mentioned, for example. Examples of substituents that the alkacyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, and an amido group, and are preferably unsubstituted from the viewpoint of ease of synthesis.

The carbon number of the aryl group in R ^22a is not particularly limited, but from the viewpoint of solubility or sensitivity to solvents, it is preferably 7 or more, and preferably 20 or less, more preferably 15 or less, and further Preferably it is 10 or more. As an aryl group, a benzoyl group and a naphthyl group are mentioned, for example. As a substituent which an aramide group may have, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amido group, an alkyl group is mentioned, for example, It is preferable that it is unsubstituted from a viewpoint of easy synthesis. From the viewpoint of sensitivity, R ^22a is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and still more preferably an acetyl group.

For example, Japanese Patent No. 4454067, International Publication No. 2002/100903, International Publication No. 2012/45736, International Publication No. 2015/36910, International Publication No. 2006/18973, Japanese Patent No. 4818458, International Publication No. Photopolymerization described in International Publication No. 2005/80338, International Publication No. 2008/75564, International Publication No. 2009/131189, International Publication No. 2010/133077, International Publication No. 2010/102502, International Publication No. 2012/68879 starter etc.

(c) The photoinitiator may be used individually by 1 type, and may use it in combination of 2 or more types.

In (c) the photopolymerization initiator, a sensitizing pigment and a polymerization accelerator corresponding to the wavelength of the image exposure light source may be prepared as needed to increase the sensitivity. As the sensitizing dye, for example, dibenzopyran dyes described in Japanese Patent Laid-Open No. 4-221958, Japanese Patent Laid-Open No. 4-219756, Japanese Patent Laid-Open No. 3-239703, Japanese Patent Laid-Open No. Heterocyclic coumarin pigments described in Japanese Patent Laid-Open No. 5-289335, 3-ketocoumarin compounds described in Japanese Patent Laid-Open No. 3-239703, Japanese Patent Laid-Open No. 5-289335, Pyrromethene pigments described in Japanese Patent Laid-Open Publication No. 6-19240, Japanese Patent Laid-Open Publication No. 47-2528, Japanese Patent Laid-Open Publication No. 54-155292, Japanese Patent Publication No. 45-37377, Japan Japanese Patent Laid-Open No. 48-84183, Japanese Patent Laid-Open No. 52-112681, Japanese Patent Laid-Open No. 58-15503, Japanese Patent Laid-Open No. 60-88005, Japanese Patent Laid-Open No. 59- No. 56403, Japanese Patent Laid-Open No. 2-69, Japanese Patent Laid-Open No. 57-168088, Japanese Patent Laid-Open No. 5-107761, Japanese Patent Laid-Open No. 5-210240, Japanese Patent Laid-Open No. 4 -A pigment having a dialkylaminobenzene skeleton described in Publication No. 288818.

The sensitizing dye is preferably an amino group-containing sensitizing dye, more preferably a compound having an amino group and a phenyl group in the same molecule. For example, and more preferably: 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone Ketone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4-diaminobenzophenone and other benzophenone compounds; 2-( p-Dimethylaminophenyl)benzoxazole, 2-(p-Diethylaminophenyl)benzoxazole, 2-(p-Dimethylaminophenyl)benzo[4,5]benzoxazole oxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-oxazole, 2 -(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethyl Aminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylamine phenyl) pyridine, (p-dimethylaminophenyl) quinoline, (p-diethylaminophenyl) quinoline, (p-dimethylaminophenyl) pyrimidine, (p-diethylaminophenyl) Pyrimidine and other compounds containing p-dialkylaminophenyl groups. Among these, 4,4'-dialkylaminobenzophenone is particularly preferred. The sensitizing dye may be used alone or in combination of two or more.

As a polymerization accelerator, for example, ethyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 4-dimethylaminoacetophenone, 4-dimethylamine Aromatic amines such as phenylpropiophenone, aliphatic amines such as n-butylamine, N-methyldiethanolamine, and 2-dimethylaminoethyl benzoate. A polymerization accelerator may be used individually by 1 type, and may use 2 or more types together.

The content ratio of (c) photopolymerization initiator in the colored photosensitive resin composition of the present invention is not particularly limited, but is preferably 0.01% by mass or more relative to the total solid content of the colored photosensitive resin composition, More preferably at least 0.1% by mass, more preferably at least 1% by mass, more preferably at most 25% by mass, more preferably at most 20% by mass, still more preferably at most 15% by mass, still more preferably at most 10% by mass % or less, particularly preferably less than 7 mass %, particularly preferably less than 5 mass %, especially preferably less than 3 mass %, most preferably less than 2 mass %. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.01 to 25% by mass, more preferably 0.01 to 20% by mass, further preferably 0.1 to 15% by mass, still more preferably 1 to 10% by mass, particularly preferably 1 to 7% by mass, especially More preferably, it is 1-5 mass %, More preferably, it is 1-3 mass %, Most preferably, it is 1-2 mass %. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for the linearity of a line and a residue to reduce by making it below the said upper limit. When the colored photosensitive resin composition of the present invention contains an oxime ester-based photopolymerization initiator (c1), the content ratio of the oxime ester-based photopolymerization initiator (c1) is not particularly limited, but relative to the colored photosensitive The total solid content of the permanent resin composition is preferably at least 0.01% by mass, more preferably at least 0.1% by mass, further preferably at least 1% by mass, and preferably at most 25% by mass, more preferably at most 20% by mass % or less, more preferably less than 15 mass %, further preferably less than 10 mass %, particularly preferably less than 7 mass %, particularly preferably less than 5 mass %, especially preferably less than 3 mass %, most preferably less than 3 mass % 2% by mass or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.01 to 25% by mass, more preferably 0.01 to 20% by mass, further preferably 0.1 to 15% by mass, still more preferably 1 to 10% by mass, particularly preferably 1 to 7% by mass, especially More preferably, it is 1-5 mass %, More preferably, it is 1-3 mass %, Most preferably, it is 1-2 mass %. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for the linearity of a line and a residue to reduce by making it below the said upper limit.

When the colored photosensitive resin composition of the present invention contains the oxime ester-based photopolymerization initiator (c1), the content ratio of the oxime ester-based photopolymerization initiator (c1) in (c) the photopolymerization initiator It is not particularly limited, but is preferably at least 30% by mass, more preferably at least 50% by mass, further preferably at least 70% by mass, particularly preferably at least 90% by mass, based on the total mass of the (c) photopolymerization initiator above. Moreover, it is 100 mass % or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 30-100 mass % is preferable, 50-100 mass % is more preferable, 70-100 mass % is still more preferable, 90-100 mass % is especially preferable. Sufficient ink repellency tends to be produced by setting it as more than the said lower limit. There exists a tendency for a taper shape to become favorable by making it below the said upper limit.

As the compounding ratio of (c) photopolymerization initiator to (d) photopolymerizable compound in the colored photosensitive resin composition, with respect to 100 mass parts of (d) photopolymerizable compound, (c) photopolymerization initiator The agent is preferably at least 0.1 parts by mass, more preferably at least 1 part by mass, more preferably at least 2 parts by mass, more preferably at least 3 parts by mass, and preferably less than 200 parts by mass, more preferably 100 parts by mass It is not more than 50 parts by mass, more preferably not more than 30 parts by mass, particularly preferably not more than 10 parts by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.1 to 200 parts by mass, more preferably 1 to 100 parts by mass, still more preferably 2 to 50 parts by mass, still more preferably 3 to 30 parts by mass, particularly preferably 3 to 10 parts by mass. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

When the colored photosensitive resin composition of the present invention contains the oxime ester photopolymerization initiator (c1), as the oxime ester photopolymerization initiator (c1) in the colored photosensitive resin composition relative to (d) The blending ratio of the photopolymerizable compound is preferably at least 0.1 part by mass of the oxime ester photopolymerization initiator (c1), more preferably at least 1 part by mass, and still more preferably at least 100 parts by mass of the photopolymerizable compound (d). 2 parts by mass or more, more preferably 3 parts by mass or more, further preferably 200 parts by mass or less, more preferably 100 parts by mass or less, further preferably 50 parts by mass or less, further preferably 30 parts by mass or less , particularly preferably 10 parts by mass or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.1 to 200 parts by mass, more preferably 1 to 100 parts by mass, still more preferably 2 to 50 parts by mass, still more preferably 3 to 30 parts by mass, particularly preferably 3 to 10 parts by mass. There exists a tendency for ink repellency to improve by making it more than the said lower limit. There exists a tendency for a residue to reduce by making it below the said upper limit.

A chain transfer agent can also be used together with (c) photoinitiator. As the chain transfer agent, for example, a mercapto group-containing compound and carbon tetrachloride may be mentioned. Among them, a mercapto group-containing compound is more preferable in terms of a tendency to have a higher chain transfer effect. The reason for this is considered to be that, since the S-H bonding energy is small, bond breaking occurs easily, and hydrogen abstraction reaction or chain transfer reaction easily occurs. The use of chain transfer agents is more effective for sensitivity improvement or surface hardening.

As a compound containing a mercapto group, it may also have a plurality of mercapto groups in the molecule, for example: 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 3-mercapto-1,2 ,4-triazole, 2-mercapto-4(3H)-quinazoline, β-mercaptonaphthalene, 1,4-dimethylmercaptobenzene and other mercapto-containing compounds with aromatic rings; Hexamethylene Thiol, Decanedithiol, Butylene Glycol Bis(3-Mercaptopropionate), Butylene Glycol Bis(3-Mercaptopropionate), Ethylene Glycol Bis(3-Mercaptopropionate), Ethylene Glycol Dimercapto Acetate, trimethylolpropane tris(3-mercaptopropionate), trimethylolpropane trimercaptoacetate, trihydroxyethyl trithiopropionate, pentaerythritol tetrakis(3-mercaptopropionate) , pentaerythritol tris(3-mercaptopropionate), butanediol bis(3-mercaptobutyrate), ethylene glycol bis(3-mercaptobutyrate), trimethylolpropane tris(3-mercaptobutyrate) ester), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tri 𠯤-2,4,6(1H,3H,5H)-trione and other aliphatic thiol-containing compounds.

Among mercapto-containing compounds with aromatic rings, 2-mercaptobenzothiazole and 2-mercaptobenzimidazole are preferred; among aliphatic mercapto-containing compounds, trimethylolpropanetri (3-mercaptopropionate), pentaerythritol tetrakis(3-mercaptopropionate), pentaerythritol tris(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptopropionate) -mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tris(3-mercaptobutoxyethyl)-2,4,6 (1H,3H,5H)-trione.

In terms of sensitivity, aliphatic mercapto-containing compounds are preferred, specifically, trimethylolpropane tris(3-mercaptopropionate), pentaerythritol tetrakis(3-mercaptopropionate) , Pentaerythritol tris(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1 ,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tris𠯤-2,4,6(1H,3H,5H)-trione, more preferably pentaerythritol tetrakis(3- mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate). These may be used individually by 1 type, and may use 2 or more types together.

Among them, from the viewpoint of increasing the cone angle, one selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoxazole is preferred. One or two or more are used in combination with a photopolymerization initiator as a photopolymerization initiator system. For example, 2-mercaptobenzothiazole may be used, 2-mercaptobenzimidazole may be used, or 2-mercaptobenzothiazole and 2-mercaptobenzimidazole may be used in combination. From the viewpoint of sensitivity, it is preferable to use one or two or more selected from the group consisting of pentaerythritol tetrakis(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptobutyrate). Furthermore, from the viewpoint of sensitivity, one or more selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzothiazole, One or two or more selected from the group consisting of pentaerythritol tetrakis(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptobutyrate) are used in combination with a photopolymerization initiator.

When the colored photosensitive resin composition of the present invention contains a chain transfer agent, the content ratio of the chain transfer agent is not particularly limited, but it is preferably 0.01% by mass relative to the total solid content of the colored photosensitive resin composition Above, more preferably at least 0.1% by mass, more preferably at least 0.5% by mass, still more preferably at least 0.8% by mass, more preferably at most 5% by mass, more preferably at most 4% by mass, and still more preferably at most 0.8% by mass 3% by mass or less, more preferably 2% by mass or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.01 to 5% by mass, more preferably 0.1 to 4% by mass, further preferably 0.5 to 3% by mass, and particularly preferably 0.8 to 2% by mass. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

When the colored photosensitive resin composition of the present invention contains a chain transfer agent, as the content ratio of the chain transfer agent in the colored photosensitive resin composition relative to (c) photopolymerization initiator, relative to (c) photopolymerization initiator 100 parts by mass of the polymerization initiator, preferably more than 5 parts by mass of the chain transfer agent, more preferably more than 10 parts by mass, more preferably more than 15 parts by mass, especially preferably more than 20 parts by mass, and preferably 500 parts by mass It is not more than 300 parts by mass, more preferably not more than 200 parts by mass, particularly preferably not more than 100 parts by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 5-500 mass parts is preferable, 10-300 mass parts is more preferable, 15-200 mass parts is still more preferable, 20-100 mass parts is especially preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

[1-1-4] (d) Photopolymerizable compound The colored photosensitive resin composition of the present invention contains (d) a photopolymerizable compound. It is thought that by including (d) a photopolymerizable compound, the curability of a coating film becomes high and ink repellency improves. Here, as (d) photopolymerizable compound used, the compound (henceforth the ethylenically unsaturated compound) which has one or more ethylenically unsaturated bonds in a molecule|numerator is mentioned. In terms of polymerizability, crosslinkability, and the ability to expand the difference in solubility of the developer between the exposed part and the non-exposed part accompanying it, it is preferably a compound having two or more ethylenically unsaturated bonds in the molecule, Moreover, it is more preferable that the unsaturated bond is derived from a (meth)acryloxy group, that is, a (meth)acrylate compound.

In the present invention, it is particularly desirable to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated bonds in one molecule. The number of ethylenically unsaturated groups in the polyfunctional ethylenic monomer is not particularly limited, but is preferably 2 or more, more preferably 3 or more, further preferably 5 or more, and preferably 15 or less , more preferably 10 or less, further preferably 8 or less, especially preferably 7 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 2-15 are preferable, 2-10 are more preferable, 3-8 are still more preferable, and 5-7 are especially preferable. By setting it as more than the said lower limit, polymerizability improves, and there exists a tendency for ink repellency to become high. It exists in the tendency for developability to become more favorable by being below the said upper limit. As ethylenically unsaturated compounds, for example, esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aliphatic polyhydroxy compounds, aromatic polyhydroxy compounds, Esters obtained by the esterification reaction of polyhydric hydroxyl compounds such as compounds with unsaturated carboxylic acids and polycarboxylic acids.

Examples of esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids include: ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate Acrylates, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glyceryl acrylate and other aliphatic polyol acrylates, the Methacrylate in which the acrylate of the exemplary compounds is replaced with methacrylate, and itaconic acid ester in which the acrylate of the exemplary compounds is replaced with itaconate , the acrylate of these exemplary compounds is replaced by crotonate (crotonic acid ester), or the acrylate of these exemplary compounds is replaced by maleate (maleate) It is made of maleic acid ester.

Examples of esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids include: hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol diacrylate Acrylates and methacrylates of aromatic polyhydroxy compounds such as methacrylates and pyrogallol triacrylate. The ester obtained by the esterification reaction of polyhydroxy compounds such as aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds with unsaturated carboxylic acids and polycarboxylic acids does not necessarily have to be a single substance. If a typical example is given, then For example, condensates of acrylic acid, phthalic acid, and ethylene glycol, condensates of acrylic acid, maleic acid, and diethylene glycol, condensates of methacrylic acid, terephthalic acid, and pentaerythritol, acrylic acid , Condensate of adipic acid, butanediol and glycerol.

In addition, as examples of polyfunctional vinyl monomers used in the present invention, polyisocyanate compounds, hydroxyl-containing (meth)acrylates, or polyisocyanate compounds, polyols, and hydroxyl-containing (meth)acrylic acid esters can be used. ) urethane (meth)acrylates obtained by the reaction of acrylates; epoxy acrylates such as addition reactants of polyvalent epoxy compounds and hydroxy (meth)acrylates or (meth)acrylic acid acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as divinyl phthalate. Examples of the above-mentioned urethane (meth)acrylates include: DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U -2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (Kyoeisha Chemical Co., Ltd.), UV-1700B, UV-7600B, UV-7605B, UV-7630B, UV7640B (Mitsubishi Chemical Co., Ltd.).

Among them, it is preferable to use an ester or an amine group of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid as (d) the photopolymerizable compound from the viewpoint of the adhesion of the barrier rib to the substrate and the ink repellency. Formate (meth)acrylates, preferably dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, 2,2,2-tri(methyl)phthalate Acryloxymethyl ethyl ester, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dibasic anhydride adduct of dipentaerythritol penta(meth)acrylate, pentaerythritol tri(meth)acrylate Dibasic anhydride adduct of acrylate. These may be used individually by 1 type, and may use 2 or more types together.

In the present invention, the molecular weight of (d) the photopolymerizable compound is not particularly limited, but is preferably 100 or more, more preferably 150 or more, more preferably 200 or more, still more preferably 300 or more, especially preferably 400 or more, most preferably 500 or more, preferably 1000 or less, more preferably 700 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 100-1000 is preferable, 150-1000 is more preferable, 200-1000 is still more preferable, 300-700 is still more preferable, 400-700 is especially preferable, 500-700 is especially preferable.

(d) The carbon number of the photopolymerizable compound is not particularly limited, but is preferably at least 7, more preferably at least 10, further preferably at least 15, and still more preferably from the viewpoint of ink repellency and residue suppression It is 20 or more, particularly preferably 25 or more, preferably 50 or less, more preferably 40 or less, further preferably 35 or less, especially preferably 30 or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 7-50 is preferable, 10-50 is more preferable, 15-40 is more preferable, 20-35 is still more preferable, 25-30 is especially preferable.

From the viewpoint of ink repellency and formation of high-definition barrier ribs with thinner line widths, (meth)acrylates, epoxy (meth)acrylates, urethane (meth) ) acrylates, among which, in terms of ink repellency and formation of fine barrier ribs with thinner line widths, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, Trifunctional or higher (meth)acrylates such as dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, 2,2,2-tri(meth)acryloxymethylethyl Dibasic acid anhydride adducts such as ester phthalic acid and dipentaerythritol penta(meth)acrylate, etc., are adducts of acid anhydrides to trifunctional or higher (meth)acrylates.

The content ratio of (d) photopolymerizable compound in the colored photosensitive resin composition of the present invention is not particularly limited, but is preferably 1% by mass or more with respect to the total solid content of the colored photosensitive resin composition, more preferably Preferably at least 5% by mass, more preferably at least 10% by mass, still more preferably at least 15% by mass, especially preferably at least 20% by mass, more preferably at most 80% by mass, more preferably at most 60% by mass , and more preferably 40% by mass or less, and still more preferably 30% by mass or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-80 mass % is preferable, 5-80 mass % is more preferable, 10-60 mass % is more preferable, 15-40 mass % is still more preferable, 20-30 mass % is especially preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

(d) The content ratio of the photopolymerizable compound to 100 parts by mass of the (b) alkali-soluble resin is not particularly limited, but is preferably at least 1 part by mass, more preferably at least 5 parts by mass, and still more preferably 10 parts by mass more than 15 parts by mass, more preferably more than 20 parts by mass, especially preferably more than 25 parts by mass, most preferably more than 30 parts by mass, and preferably less than 150 parts by mass, more preferably 100 parts by mass It is not more than 70 parts by mass, more preferably not more than 50 parts by mass, particularly preferably not more than 40 parts by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 1 to 150 parts by mass, more preferably 5 to 150 parts by mass, further preferably 10 to 100 parts by mass, even more preferably 15 to 100 parts by mass, particularly preferably 20 to 70 parts by mass, especially Preferably, it is 25-50 mass parts, Most preferably, it is 30-40 mass parts. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By setting it below the said upper limit, it exists in the tendency for the formation of the high-definition barrier rib with a narrow line width to be possible.

[1-1-5] (e) liquid repellent The colored photosensitive resin composition of the present invention contains (e) a liquid-repellent agent, and (e) the liquid-repellent agent contains a compound (e1) having a crosslinking group and a fluorine atom and/or a siloxane chain. By containing the compound (e1) having a fluorine atom and/or a siloxane chain, ink repellency can be imparted to the surface of the obtained barrier rib, so that the obtained barrier rib can prevent color mixing of each pixel.

＜Compound (e1)＞ Compound (e1) has a crosslinking group, a fluorine atom, and/or a siloxane chain. As the crosslinking group of the compound (e1), for example, an epoxy group, an ethylenically unsaturated group, or an active group that generates free radicals by irradiating active energy rays, inhibits the outflow of the liquid repellent agent to the developer. From a viewpoint, an ethylenically unsaturated group is preferable. By using the compound (e1) having a crosslinking group, the crosslinking reaction on the surface of the formed coating film can be accelerated during exposure, and the compound (e1) is less likely to flow out during the development process. The barrier wall shows higher ink repellency.

Since the compound (e1) has a fluorine atom, the compound (e1) tends to exert the effect of aligning the compound (e1) on the surface of the barrier rib to prevent ink from blurring or color mixing. In more detail, it tends to play the following role: the base having fluorine atoms repels the ink and prevents the ink from smearing or color mixing caused by the ink crossing the barrier wall and entering the adjacent area.

When the compound (e1) has a fluorine atom, the compound (e1) preferably has either or both of a perfluoroalkyl group and a perfluoroalkylene ether chain. By having any one or both of the perfluoroalkyl group and the perfluoroalkylene ether chain, there is a tendency that the compound (e1) is easily further aligned on the surface of the barrier wall, showing higher ink repellency, Further prevent ink from smearing or color mixing.

As a perfluoroalkyl group, a perfluorobutyl group, a perfluorohexyl group, and a perfluorooctyl group are mentioned, for example. Examples of perfluoroalkylene ether chains include -CF ₂ -O-, -(CF ₂ ) ₂ -O-, -(CF ₂ ) ₃ -O-, -CF ₂ -C(CF ₃ ) ₂ -O-, -C(CF ₃ ) ₂ -CF ₂ -O- and divalent groups having these repeating units.

Examples of the compound (e1) having a crosslinking group and a fluorine atom include: an acrylic copolymer resin having an epoxy group and a perfluoroalkyl group, an acrylic copolymer resin having an epoxy group and a perfluoroalkylene ether chain Resins, acrylic copolymer resins with ethylenically unsaturated groups and perfluoroalkyl groups, acrylic copolymer resins with ethylenically unsaturated groups and perfluoroalkylene ether chains, rings with epoxy groups and perfluoroalkyl groups Oxygen(meth)acrylate resin, epoxy(meth)acrylate resin with epoxy group and perfluoroalkylene ether chain, epoxy(meth)acrylate resin with ethylenically unsaturated group and perfluoroalkyl group Acrylate resin, epoxy (meth)acrylate resin with ethylenically unsaturated group and perfluoroalkylene ether chain. From the viewpoint of ink repellency, it is preferably an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkyl group, an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkylene ether chain, and It is preferably an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkylene ether chain.

As commercially available products of the compound (e1) having a crosslinking group and a fluorine atom, for example, "MEGAFAC (registered trademark, the same applies hereinafter) F116", "MEGAFAC F120", "MEGAFAC F142D", " MEGAFAC F144D, MEGAFAC F150, MEGAFAC F160, MEGAFAC F171, MEGAFAC F172, MEGAFAC F173, MEGAFAC F177, MEGAFAC F178A, MEGAFAC F178K, MEGAFAC F179, MEGAFAC F183", "MEGAFAC F184", "MEGAFAC F191", "MEGAFAC F812", "MEGAFAC F815", "MEGAFAC F824", "MEGAFAC F833", "MEGAFAC RS101", "MEGAFAC RS102", "MEGAFAC RS105", "MEGAFAC RS201", "MEGAFAC RS202", "MEGAFAC RS301", "MEGAFAC RS303", "MEGAFAC RS304", "MEGAFAC RS401", "MEGAFAC RS402", "MEGAFAC RS501", "MEGAFAC RS502", "MEGAFAC RS-72-K" , "MEGAFAC RS-78", "MEGAFAC RS-90", "DEFENSA (registered trademark, the same below) MCF300", "DEFENSA MCF310", "DEFENSA MCF312", "DEFENSA MCF323", "Fluorad FC430" manufactured by 3M Japan ", "Fluorad FC431", "FC-4430", "FC4432", "AsahiGuard (registered trademark) AG710" manufactured by AGC Corporation, "Surflon (registered trademark, the same below) S-382", "Surflon SC-101" , "Surflon SC-102", "Surflon SC-103", "Surflon SC-104", "Surflon SC-105", "Surflon SC-106" trade names of fluorinated organic compounds sold. As the acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkylene group, "MEGAFAC RS-72-K", "MEGAFAC RS-78", and "MEGAFAC RS-90" can be preferably used.

When the compound (e1) has a fluorine atom, the content ratio of the fluorine atom in the compound (e1) is not particularly limited, but is preferably at least 5% by mass, more preferably 10% by mass, based on the total mass of the compound (e1) or more, more preferably at least 15% by mass, and still more preferably at least 20% by mass. Also, it is preferably at most 50% by mass, more preferably at most 35% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 5-50 mass % is preferable, 10-50 mass % is more preferable, 15-35 mass % is still more preferable, and 20-35 mass % is especially preferable. By setting it as more than the said lower limit value, it exists in the tendency for the outflow to the adjacent pixel part to be suppressed. There exists a tendency for a high contact angle to express by being below the said upper limit.

The molecular weight of the compound (e1) is not particularly limited, and may be a low molecular weight compound or a high molecular weight compound. A high molecular weight body is preferable because it can suppress fluidity caused by post-baking, and can suppress outflow from barrier ribs. When the compound (e1) is a high molecular weight body, the number average molecular weight of the compound (e1) is preferably at least 100, more preferably at least 500, preferably at most 300,000, more preferably at most 200,000, still more preferably at least 100,000 the following. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 100 to 300,000, more preferably 500 to 200,000, and still more preferably 500 to 100,000.

Specifically, the siloxane chain contained in the compound (e1) is preferably a polysiloxane represented by the following structural formula (E). R ¹ R ² R ³ Si-O-(SiR ⁴ R ⁵ -O) _n -SiR ⁶ R ⁷ R ⁸ (E) Here, R ¹ , R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ⁸ each independently represent a monovalent organic group or a hydrogen atom.

The monovalent organic group is preferably a hydrocarbon group with 1 to 10 carbon atoms, and specific examples thereof include alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, and heptyl; Vinyl, allyl, butenyl, pentenyl, hexenyl and other alkenyl groups; phenyl, tolyl, xylyl and other aryl groups; benzyl, phenethyl and other aralkyl groups; chloromethyl, 3-chloropropyl, 3,3,3-trifluoropropyl, nonafluorobutylethyl and other substituted alkyl groups, and these organic groups may have an ester bond. n is an integer of 0 or more, preferably 5 or more, more preferably 10 or more, and is preferably 2000 or less, more preferably 1500 or less, further preferably 1000 or less, still more preferably 500 or less, especially preferably Below 300. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 5-2000 is preferable, 5-1500 is more preferable, 5-1000 is more preferable, 10-500 is still more preferable, 10-300 is especially preferable. There exists a tendency for ink repellency to become high by setting it as more than the said lower limit. There exists a tendency for the uniformity of a coating film to become high by making it below the said upper limit.

As a commercial product of the compound (e1) containing a crosslinking group and a siloxane chain, for example, "BYK-UV3500 series" manufactured by BYK-Chemie, "8SS" series manufactured by Taisei Fine Chemical, Compounds sold under the trade name of "KP Series" manufactured by Shin-Etsu Chemical Co., Ltd.

The content ratio of (e) liquid-repellent agent in the colored photosensitive resin composition of the present invention is not particularly limited, but is preferably 0.01% by mass or more with respect to the total solid content of the colored photosensitive resin composition, more preferably It is at least 0.05% by mass, more preferably at least 0.1% by mass, and is preferably at most 5% by mass, more preferably at most 3% by mass, further preferably at most 2% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 0.01-5 mass % is preferable, 0.05-3 mass % is more preferable, and 0.1-2 mass % is still more preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By making it below the said upper limit, it exists in the tendency which becomes easy to obtain a uniform coating film when ink is apply|coated to a pixel part after barrier rib formation.

When the compound (e1) has a crosslinking group and a fluorine atom, the content ratio of the compound (e1) in the colored photosensitive resin composition of the present invention is not particularly limited, but relative to the total amount of the colored photosensitive resin composition The solid content is preferably at least 0.01% by mass, more preferably at least 0.05% by mass, still more preferably at least 0.1% by mass, more preferably at most 5% by mass, more preferably at most 3% by mass, and still more preferably 2% by mass or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 0.01-5 mass % is preferable, 0.05-3 mass % is more preferable, and 0.1-2 mass % is still more preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By making it below the said upper limit, it exists in the tendency which becomes easy to obtain a uniform coating film when ink is apply|coated to a pixel part after barrier rib formation.

When the compound (e1) has a crosslinking group and a siloxane chain, the content ratio of the compound (e1) in the colored photosensitive resin composition of the present invention is not particularly limited, but relative to the colored photosensitive resin composition The total solid content is preferably at least 0.1% by mass, more preferably at least 0.2% by mass, further preferably at least 0.5% by mass, and preferably at most 5% by mass, more preferably at most 3% by mass, and further preferably at least 5% by mass. Preferably it is 2 mass % or less. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 0.1-5 mass % is preferable, 0.2-3 mass % is more preferable, and 0.5-2 mass % is still more preferable. There exists a tendency for ink repellency to improve by making it more than the said lower limit. By making it below the said upper limit, it exists in the tendency which becomes easy to obtain a uniform coating film when ink is apply|coated to a pixel part after barrier rib formation.

In the colored photosensitive resin composition of the present invention, a surfactant can be used together with (e) a liquid repellent. Surfactants, for example, can be used to improve the applicability of the coating solution as a colored photosensitive resin composition, and the developability of the coating film, among which silicone-based surfactants or fluorine-based surfactants without crosslinking groups are preferred. active agent. In particular, in terms of having the function of removing the residue of the colored photosensitive resin composition from the unexposed part during development and the function of expressing wettability, silicone-based surfactants are preferred, and polymeric surfactants are further preferred. Ether modified silicone surfactant.

As the fluorine-based surfactant not having a crosslinking group, a compound having a fluoroalkyl group or a fluoroalkylene group at least any one of a terminal, a main chain, and a side chain is preferable. Examples of such commercially available products include "BM-1000" and "BM-1100" manufactured by BM Chemie, "MEGAFAC F142D" manufactured by DIC Corporation, "MEGAFAC F172", "MEGAFAC F173", "MEGAFAC F183", "MEGAFAC F470", "MEGAFAC F475", "MEGAFAC F554", "MEGAFAC F559", "FC430" manufactured by 3M Japan, "DFX-18" manufactured by NEOS Corporation.

Examples of silicone-based surfactants include "DC3PA", "SH7PA", "DC11PA", "SH21PA", "SH28PA", "SH29PA", "8032 Additive", and "SH8400" manufactured by Dow Corning Toray Co., Ltd. , Commercially available products of "BYK (registered trademark, hereinafter the same) 323" and "BYK 330" manufactured by BYK-Chemie. Surfactants other than fluorine-based surfactants and silicone-based surfactants may also be included, and examples of the surfactant include nonionic, anionic, cationic, and amphoteric surfactants.

As the nonionic surfactant, for example, polyoxyethylene alkyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl esters, polyoxyethylene alkyl ethers, Oxyethylene fatty acid esters, glycerin fatty acid esters, polyoxyethylene glycerin fatty acid esters, pentaerythritol fatty acid esters, polyoxyethylene pentaerythritol fatty acid esters, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters, sorbitan Sugar alcohol fatty acid esters, polyoxyethylene sorbitol fatty acid esters. Examples of such commercially available products include polyoxyethylene-based surfactants such as "Emulgen (registered trademark, the same hereinafter) 104P" and "Emulgen A60" manufactured by Kao Corporation.

Examples of anionic surfactants include: alkylsulfonates, alkylbenzenesulfonates, alkylnaphthalenesulfonates, polyoxyethylene alkylethersulfonates, alkyl sulfates Alkyl sulfates, higher alcohol sulfates, aliphatic alcohol sulfates, polyoxyethylene alkyl ether sulfates, polyoxyethylene alkylphenyl ether sulfates, alkyl phosphates Classes, polyoxyethylene alkyl ether phosphates, polyoxyethylene alkylphenyl ether phosphates, special polymer surfactants. Among them, a special polymer-based surfactant is preferred, and a special polycarboxylic acid-type polymer-based surfactant is further preferred. Such commercially available products include, for example, "Emal (registered trademark, the same hereinafter) 10" manufactured by Kao Corporation as alkyl sulfates, and Kao Corporation as alkylnaphthalene sulfonates. "Pelex (registered trademark) NB-L" produced by Kao Corporation as a special polymer surfactant, for example, "Homogenol (registered trademark, the same below) L-18" and "Homogenol L-100" manufactured by Kao Corporation .

As a cationic surfactant, quaternary ammonium salts, imidazoline derivatives, and alkylamine salts are mentioned, for example. Moreover, as an amphoteric surfactant, betaine-type compounds, imidazolium salts, imidazolines, and amino acids are mentioned, for example. Among these, quaternary ammonium salts are preferred, and stearyl trimethylammonium salts are further preferred. Such commercially available products include, for example, "Acetamin (registered trademark) 24" manufactured by Kao Corporation as alkylamine salts, and "Quartamin (registered trademark) 24" manufactured by Kao Corporation as examples of quaternary ammonium salts. , the same below) 24P", "Quartamin 86W".

Surfactants may be used alone or in combination of two or more. Examples include: a combination of a silicone-based surfactant and a fluorine-based surfactant, a combination of a silicone-based surfactant and a special polymer-based surfactant, a fluorine-based surfactant and a special polymer-based surfactant combination. Among them, a combination of a silicone-based surfactant and a fluorine-based surfactant is preferable. Examples of combinations of silicone-based surfactants and fluorine-based surfactants include "DFX-18" manufactured by NEOS, "BYK-300" or "BYK-330" manufactured by BYK-Chemie, and AGC. A combination of "S-393" manufactured by Seimi Chemical Co., Ltd.; a combination of "KP340" manufactured by Shin-Etsu Silicone Co., Ltd. and "F-554" or "F-559" manufactured by DIC Corporation; "SH7PA" manufactured by Dow Corning Toray Co., Ltd. and A combination of "DS-401" manufactured by Daikin Corporation; a combination of "L-77" manufactured by NUC Corporation and "FC4430" manufactured by 3M Japan Corporation.

[1-1-6] (f) Dispersant The colored photosensitive resin composition of the present invention preferably contains (f) a dispersant for finely dispersing (a) the colorant and stabilizing its dispersed state. As the (f) dispersant, it is preferably a polymer dispersant having a functional group, and in terms of dispersion stability, it is preferably a polymer dispersant having the following functional groups: carboxyl group; phosphoric acid group; sulfonic acid group ; or bases of these; primary, secondary or tertiary amino groups; quaternary ammonium bases; pyridine, pyrimidine, pyrimidine, etc. derived from nitrogen-containing heterocyclic rings; In particular, from the point of view that a small amount of dispersant can be used to disperse the pigment, it is especially preferred to be a polymer dispersant with the following basic functional groups: primary amine group, secondary amine group or tertiary amine group; Grade ammonium base; pyridine, pyrimidine, pyrimidine, etc. are derived from nitrogen-containing heterocyclic rings; etc.

Examples of polymer dispersants include urethane-based dispersants, acrylic-based dispersants, polyethyleneimine-based dispersants, polyallylamine-based dispersants, monomers containing amino groups, and Macromonomer dispersant, polyoxyethylene alkyl ether dispersant, polyoxyethylene diester dispersant, polyether phosphoric acid dispersant, polyester phosphoric acid dispersant, sorbitan aliphatic ester dispersant, Aliphatic modified polyester based dispersant.

Specific examples of such dispersants include, for example, trade names EFKA (registered trademark, manufactured by BASF Corporation), DISPERBYK (registered trademark, manufactured by BYK-Chemie Corporation), Disparlon (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Lubrizol), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), Ajisper (registered trademark, manufactured by Ajinomoto Corporation). The polymer dispersant may be used alone or in combination of two or more.

The weight average molecular weight (Mw) of the polymer dispersant is preferably at least 700, more preferably at least 1,000, and is preferably at most 100,000, more preferably at most 50,000. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, the weight average molecular weight (Mw) of the polymer dispersant is preferably 700-100,000, more preferably 1,000-50,000. From the viewpoint of the dispersion stability of the colorant, the (f) dispersant preferably contains an acrylic polymer dispersant having a functional group. In terms of dispersibility and storage stability, a polymer dispersant having a basic functional group and either or both of a polyester bond and a polyether bond is preferred.

As the acrylic polymer dispersant, it is preferable to use: an unsaturated group-containing monomer and an unsaturated group having a functional group (the functional group referred to here is the functional group mentioned above as the functional group contained in the polymer dispersant) Random copolymers, graft copolymers, and block copolymers of unsaturated group-containing monomers with functional groups. These copolymers can be produced by known methods.

Examples of unsaturated group-containing monomers having functional groups include (meth)acrylic acid, 2-(meth)acryloxyethyl succinate, and 2-(meth)acryl phthalate. Acyloxyethyl ester, 2-(meth)acryloxyethyl hexahydrophthalate, unsaturated monomers with carboxyl groups such as acrylic acid dimer, dimethylaminoethyl (meth)acrylate, Diethylaminoethyl (meth)acrylate and their quaternary compounds are unsaturated monomers with tertiary amino groups and quaternary ammonium bases. These may be used individually by 1 type, and may use 2 or more types together.

Examples of unsaturated group-containing monomers that do not have a functional group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and isopropyl (meth)acrylate. ester, n-butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, benzyl (meth)acrylate, phenyl (meth)acrylate, (meth) Cyclohexyl acrylate, phenoxyethyl (meth)acrylate, phenoxymethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, iso(meth)acrylate, tricyclic Decane (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, N-vinylpyrrolidone, styrene and its derivatives, α-methylstyrene, N-cyclohexylmaleimide , N-phenylmaleimide, N-benzylmaleimide and other N-substituted maleimides, acrylonitrile, vinyl acetate and poly(meth)acrylate macromonomers, poly Macromonomers such as styrene macromonomer, poly(2-hydroxyethyl)acrylate macromonomer, polyethylene glycol macromonomer, polypropylene glycol macromonomer, polycaprolactone macromonomer, etc. These may be used individually by 1 type, and may use 2 or more types together.

The acrylic polymer dispersant is preferably an A-B or B-A-B block copolymer comprising an A block with a functional group and a B block without a functional group. In this case, in the A block, in addition to containing In addition to the partial structure of the unsaturated group-containing monomer containing a functional group, it may also contain a partial structure derived from the above-mentioned unsaturated group-containing monomer that does not contain a functional group, and any of these may be random copolymerized or block copolymerized. Aspects are contained in the A block. The content of the partial structure not containing a functional group in the A block is preferably 80% by mass or less, more preferably 50% by mass or less, further preferably 30% by mass or less.

The B block contains a partial structure derived from the above-mentioned unsaturated group-containing monomer that does not contain a functional group, and one B block may contain a partial structure derived from two or more monomers, which can be randomly copolymerized or embedded. Any aspect of block copolymerization is included in the B block. A-B or B-A-B block copolymers can be prepared, for example, by the living polymerization method shown below. The living polymerization method includes an anionic living polymerization method, a cationic living polymerization method, and a radical living polymerization method.

When synthesizing the acrylic polymer dispersant, for example, Japanese Patent Laying-Open No. 9-62002, P.Lutz, P.Masson et al, Polym. Bull. 12, 79 (1984), B.C.Anderson, G.D.Andrews et al, Macromolecules, 14, 1601(1981), K.Hatada, K.Ute, et al, Polym. J. 17, 977(1985), 18, 1037(1986), Koichi Right, Koichi Hatada, Polymer Processing , 36, 366(1987), Toshinobu Higashimura, Mitsuo Sawamoto, Polymer Papers, 46, 189(1989), M.Kuroki, T.Aida, J. Am. Chem. Sic, 109, 4737(1987), Takuzo Aida, Shohei Inoue, Synthetic Organic Chemistry, 43, 300 (1985), D.Y. Sogoh, W.R. Hertler et al, Macromolecules, 20, 1473 (1987) are known methods.

The acrylic polymer dispersant that can be used in the present invention can be A-B block copolymer, also can be B-A-B block copolymer, and the A block/B block ratio of constituting this copolymer is preferably 1/99～80/ 20 (mass ratio), especially preferably 5/95 to 60/40 (mass ratio). There exists a tendency for the balance of dispersibility and storage stability to be ensured by being in the said range. The amount of the quaternary ammonium base in 1 g of the A-B block copolymer and B-A-B block copolymer that can be used in the present invention is preferably 0.1-10 mmol. There exists a tendency for favorable dispersibility to be ensured by being in the said range.

When such a block copolymer contains an amine group generated during the production process, the amine value is preferably 1 to 100 mgKOH/g, and from the viewpoint of dispersibility, it is preferably 10 mgKOH/g Above, more preferably above 30 mgKOH/g, more preferably above 50 mgKOH/g, more preferably below 90 mgKOH/g, more preferably below 80 mgKOH/g, further preferably below 75 mgKOH/g . The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 1-100 mgKOH/g, more preferably 10-90 mgKOH/g, still more preferably 30-80 mgKOH/g, especially preferably 50-75 mgKOH/g. The amine value of a dispersant such as a block copolymer is represented by the mass of KOH in an amount equivalent to the amount of alkali per 1 g of the solid content of the dispersant sample after removing the solvent, and is measured by the following method. Accurately weigh 0.5-1.5 g of dispersant sample, put it into a 100 mL beaker, and dissolve it with 50 mL of acetic acid. Using an automatic titration device equipped with a pH electrode, the solution was neutralized and titrated with 0.1 mol/L HClO ₄ acetic acid solution. Set the inflection point of the titration pH curve as the titration end point, and obtain the amine value by the following formula.

Amine value [mgKOH/g]=(561×V)/(W×S) [Wherein, W represents the weighted amount of the dispersant sample [g], V represents the titration at the end point of the titration [mL], S represents the dispersion Concentration of solid content of agent sample [mass%]] The acid value of the block copolymer also depends on the presence or absence and the type of the acidic group which is the source of the acid value, and the acid value is preferably lower, preferably less than 10 mgKOH/g. The weight average molecular weight (Mw) of the block copolymer is preferably in the range of 1,000 to 100,000. There exists a tendency for favorable dispersibility to be securable by setting it as the said range.

When the colored photosensitive resin composition of the present invention contains (f) a dispersant, the content ratio is not particularly limited, but is preferably 0.1% by mass or more relative to the total solid content of the colored photosensitive resin composition , more preferably at least 0.5% by mass, and more preferably at most 8% by mass, more preferably at most 5% by mass, further preferably at most 3% by mass, especially preferably at most 2% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 0.1-8 mass % is preferable, 0.1-5 mass % is more preferable, 0.5-3 mass % is still more preferable, and 0.5-2 mass % is especially preferable. By setting it as more than the said lower limit, it exists in the tendency for an aggregate to be suppressed and a uniform coating film to be formed. There exists a tendency for ink repellency or developability to improve by being below the said upper limit.

(f) The content ratio of the dispersant is preferably at least 1 part by mass, more preferably at least 3 parts by mass, further preferably at least 5 parts by mass, and more preferably 25 parts by mass relative to 100 parts by mass of the (a) colorant It is not more than 20 parts by mass, more preferably not more than 15 parts by mass, especially preferably not more than 12 parts by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-25 mass parts is preferable, 3-20 mass parts is more preferable, 5-15 mass parts is still more preferable, 5-12 mass parts is especially preferable. By setting it as more than the said lower limit, it exists in the tendency for an aggregate to be suppressed and a uniform coating film to be formed. There exists a tendency for ink repellency or developability to improve by being below the said upper limit.

(f) The content ratio of the dispersant is preferably at least 1 part by mass, more preferably at least 3 parts by mass, further preferably at least 5 parts by mass, and more preferably 25 parts by mass with respect to 100 parts by mass of the (a1) white pigment It is not more than 20 parts by mass, more preferably not more than 15 parts by mass, especially preferably not more than 12 parts by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 1-25 mass parts is preferable, 3-20 mass parts is more preferable, 5-15 mass parts is still more preferable, 5-12 mass parts is especially preferable. There exists a tendency for the generation|occurrence|production of the residue by an aggregate to be suppressed by setting it as more than the said lower limit. There exists a tendency for ink repellency or developability to improve by being below the said upper limit.

[1-1-7] UV absorber The colored photosensitive resin composition of the present invention may contain an ultraviolet absorber. The ultraviolet absorber is added for the purpose of controlling the photohardening distribution by absorbing the specific wavelength of the light source used for exposure by the ultraviolet absorber.

[1-1-8] Polymerization inhibitor The colored photosensitive resin composition of this invention may contain a polymerization inhibitor. Since radical polymerization is suppressed by containing a polymerization inhibitor, there exists a tendency for the taper angle of the obtained barrier rib to be enlarged.

A polymerization inhibitor may be used individually by 1 type, and may use 2 or more types together. A polymerization inhibitor may be contained in the alkali-soluble resin manufactured by (b) the manufacturing method of alkali-soluble resin. In this case, it can be used directly in the state where the alkali-soluble resin contains the polymerization inhibitor, or in addition to the polymerization inhibitor contained in the resin, it can also be added to the colored photosensitive resin composition. The same or different polymerization inhibitors.

When the colored photosensitive resin composition of the present invention contains a polymerization inhibitor, the content ratio of the polymerization inhibitor is not particularly limited, but is preferably 0.0005% by mass relative to the total solid content of the colored photosensitive resin composition Above, more preferably at least 0.001% by mass, still more preferably at least 0.01% by mass, more preferably at most 0.1% by mass, more preferably at most 0.08% by mass, further preferably at most 0.05% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.0005 to 0.1% by mass, more preferably 0.001 to 0.08% by mass, further preferably 0.01 to 0.05% by mass. There exists a tendency for the storage stability of a coating liquid to be improved by setting it as more than the said lower limit. There exists a tendency for ink repellency to become high by making it below the said upper limit.

[1-1-9] Thermal polymerization initiator The colored photosensitive resin composition of the present invention may contain a thermal polymerization initiator. By containing a thermal polymerization initiator, there exists a tendency for the crosslinking degree of a film to be raised. As a specific example of such a thermal-polymerization initiator, an azo compound, an organic peroxide, and hydrogen peroxide are mentioned, for example. These may be used individually by 1 type, and may use 2 or more types together.

When a thermal polymerization initiator is used together with a photopolymerization initiator to improve the ink repellency or increase the crosslink density of the film, the total content ratio of these is preferably the photopolymerization initiator The content ratio of the total solid content of the above-mentioned colored photosensitive resin composition, and the combined use ratio of the photopolymerization initiator and thermal polymerization initiator are preferably relative from the viewpoint of ink repellency. 5-300 mass parts of thermal polymerization initiators are used with respect to 100 mass parts of photopolymerization initiators.

[1-1-10] Amino compounds The colored photosensitive resin composition of the present invention may contain an amino compound to accelerate thermosetting. When the colored photosensitive resin composition of the present invention contains an amino compound, the content ratio of the amino compound is preferably 40% by mass or less with respect to the total solid content of the colored photosensitive resin composition, more preferably It is 30 mass % or less, and, Preferably it is 0.5 mass % or more, More preferably, it is 1 mass % or more. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, 0.5-40 mass % is preferable, and 1-30 mass % is more preferable. There exists a tendency for sufficient thermosetting property to be securable by setting it as more than the said lower limit. Storage stability tends to become high by making it below the said upper limit.

As the amino compound, for example, an amino compound having at least two methylol groups and an alkoxymethyl group obtained by carrying out alcohol condensation modification having 1 to 8 carbon atoms as a functional group may be mentioned. Specifically, for example, melamine resin obtained by polycondensation of melamine and formaldehyde; benzoguanamine resin obtained by polycondensation of benzoguanamine and formaldehyde; glycoluril resin obtained by polycondensation of glycoluril and formaldehyde; Urea resin obtained by polycondensation of formaldehyde; resin obtained by co-condensation of two or more kinds of melamine, benzoguanamine, glycoluril, or urea with formaldehyde; modified resin obtained by alcohol condensation modification using the methylol group of the above resin . These may be used individually by 1 type, and may use 2 or more types together.

[1-1-11] Silane coupling agent The colored photosensitive resin composition of the present invention may contain a silane coupling agent to improve the adhesion with the substrate. As the silane coupling agent, for example, epoxy-based, methacrylic-based, amino-based, and imidazole-based silane coupling agents can be used. From the viewpoint of improving adhesion, epoxy-based and imidazole-based silane coupling agents are particularly preferred. When the colored photosensitive resin composition of the present invention contains a silane coupling agent, its content is preferably 20% relative to the total solid content of the colored photosensitive resin composition from the viewpoint of adhesion. Mass % or less, More preferably, it is 15 mass % or less, More preferably, it is 10 mass % or less, More preferably, it is 5 mass % or less, Especially preferably, it is 2 mass % or less. There exists a tendency for the adhesiveness with a board|substrate to become high by making it more than the said lower limit. There exists a tendency for the storage stability of a coating liquid to become high by making it below the said upper limit.

[1-1-12] Inorganic filler The colored photosensitive resin composition of the present invention may also contain an inorganic filler in addition to the (a1) white pigment, so that the strength of the cured product is improved, and due to the moderate interaction with the alkali-soluble resin (matrix structure Formation) to improve the excellent verticality of the coating film and increase the cone angle. Examples of the inorganic filler include talc, silica, alumina, barium sulfate, magnesium oxide, and those obtained by surface-treating them with various silane coupling agents.

The average particle diameter of the inorganic filler is preferably from 0.005 to 2 μm, more preferably from 0.01 to 1 μm. The average particle diameter is a value measured by a laser diffraction scattering particle size distribution measuring device manufactured by Beckman Coulter Co., Ltd. or the like. Among the inorganic fillers, silica sol and modified silica sol are particularly preferable because they tend to have excellent dispersion stability and an excellent effect of increasing the cone angle. When the colored photosensitive resin composition of the present invention contains an inorganic filler, its content is preferably 5% by mass relative to the total solid content of the colored photosensitive resin composition from the viewpoint of ink repellency. % or more, more preferably 10 mass % or more, preferably 80 mass % or less, more preferably 70 mass % or less. The above-mentioned upper limit and lower limit can be combined arbitrarily. For example, 5-80 mass % is preferable, and 10-70 mass % is more preferable.

[1-1-13] Adhesion improving agent The colored photosensitive resin composition of the present invention may contain an adhesion improving agent in order to provide adhesion with a substrate. As an adhesive improvement agent, a phosphoric acid type vinylic monomer is mentioned, for example. As the phosphoric acid-based vinyl monomer, (meth)acryloxy-containing phosphoric acid esters are preferred, and those represented by the following general formulas (g1), (g2), and (g3) are preferred.

[chem 39]

(In the above general formulas (g1), (g2), and (g3), R ⁵¹ represents a hydrogen atom or a methyl group, l and l' are integers from 1 to 10, and m is 1, 2 or 3)

These phosphate-based vinyl monomers may be used alone or in combination of two or more. When the colored photosensitive resin composition of the present invention contains a phosphoric acid-based vinyl monomer as an adhesion improving agent, its content ratio is preferably 0.02% by mass or more with respect to the total solid content of the colored photosensitive resin composition , more preferably at least 0.05% by mass, more preferably at least 0.1% by mass, especially preferably at least 0.2% by mass, and more preferably at most 4% by mass, more preferably at most 3% by mass, and more preferably at most 2% by mass % or less, preferably less than 1% by mass. The above-mentioned upper limit and lower limit may be combined arbitrarily. For example, it is preferably 0.02 to 4% by mass, more preferably 0.05 to 3% by mass, further preferably 0.1 to 2% by mass, and particularly preferably 0.2 to 1% by mass. There exists a tendency for the improvement effect of the adhesiveness with a board|substrate to become sufficient by making it more than the said lower limit. There exists a tendency for the adhesiveness with a board|substrate to be suppressed easily by making it below the said upper limit and to fall.

[1-1-14] Solvent The colored photosensitive resin composition of the present invention usually contains a solvent, and can be used in a state where each component contained in the colored photosensitive resin composition is dissolved or dispersed in the solvent. It does not specifically limit as this solvent, For example, the organic solvent described below is mentioned.

Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol tertiary butyl ether, diethyl Glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methyl-3-methoxybutanol, 3-methoxy Ethylene glycol monoalkyl ethers such as 1-butanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether; Ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol Ethylene glycol dialkyl ethers such as dibutyl ether and dipropylene glycol dimethyl ether; Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether ethyl Ester, Propylene Glycol Monobutyl Ether Acetate, 3-Methoxy-1-Butyl Acetate, Methoxypentyl Acetate, Diethylene Glycol Monomethyl Ether Acetate, Diethylene Glycol Monoethyl Ether Acetate , Diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, 3-methyl-3 acetic acid - Glycol alkyl ether acetates such as methoxybutyl esters; Ethylene glycol diacetate, propylene glycol diacetate, 1,3-butanediol diacetate, 1,4-butanediol diacetate, 1,6-hexanol diacetate, etc. Glycol diacetates; Alkyl acetates such as cyclohexanol acetate; Ethers such as pentyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, ethyl isobutyl ether, dihexyl ether; Acetone, methyl ethyl ketone, methyl isopropyl ketone, methyl amyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone , ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxymethyl pentanone and other ketones; Methanol, Ethanol, Propanol, Butanol, Hexanol, Cyclohexanol, Ethylene Glycol, Propylene Glycol, Butylene Glycol, Diethylene Glycol, Dipropylene Glycol, Triethylene Glycol, Methoxymethylpentanol, Glycerin, Monohydric or polyhydric alcohols such as benzyl alcohol; Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutene, n-hexane, hexene, isoprene, dipentene, and dodecane; Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and dicyclohexyl; Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene; Amyl formate, ethyl formate, ethyl acetate, propyl acetate, butyl acetate, amyl acetate, methyl isobutyrate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate , methyl isobutyrate, ethyl octanoate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, 3-methoxy Chain or cyclic esters such as ethyl propionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, and γ-butyrolactone; Alkoxy carboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as chlorobutane and chloropentane; Ether ketones such as methoxymethylpentanone; Nitriles such as acetonitrile and benzonitrile; Tetrahydrofuran such as tetrahydrofuran, dimethyltetrahydrofuran, and dimethoxytetrahydrofuran.

As commercially available solvents, for example, mineral spirits, valsol #2, apco #18 solvent, apco thinner, Socal solvent No.1 and No.2, Solvesso #150, Shell TS28 solvent, carbitol, Ethyl carbitol, butyl carbitol, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, diethylene glycol dimethyl ether ( are trade names).

The solvent can dissolve or disperse each component contained in the colored photosensitive resin composition, and can be selected according to the usage method of the colored photosensitive resin composition of the present invention. From the viewpoint of coatability, the boiling point of the solvent under atmospheric pressure is preferably from 60 to 280°C, more preferably from 70 to 260°C. Among them, propylene glycol monomethyl ether, 3-methoxy-1-butanol, propylene glycol monomethyl ether acetate, and 3-methoxy-1-butyl acetate are preferable.

A solvent may be used individually by 1 type, and may use 2 or more types together. The solvent is preferably such that the content ratio of the total solids in the colored photosensitive resin composition solution is preferably at least 10% by mass, more preferably at least 15% by mass, further preferably at least 20% by mass, and most preferably at least 20% by mass. It is used in an amount of 25% by mass or more, preferably 90% by mass or less, more preferably 50% by mass or less, further preferably 40% by mass or less, particularly preferably 35% by mass or less. For example, the solvent is preferably such that the content ratio of the total solids in the colored photosensitive resin composition solution is preferably 10 to 90% by mass, more preferably 15 to 50% by mass, and still more preferably 20 to 40% by mass. %, preferably 25-35% by mass. There exists a tendency for the generation|occurrence|production of coating unevenness to be suppressed by setting it as more than the said lower limit. There exists a tendency for generation|occurrence|production of a foreign material, repulsion, etc. to be suppressed by making it below the said upper limit.

[1-2] Preparation method of colored photosensitive resin composition The colored photosensitive resin composition of the present invention can be prepared by mixing each component contained in the colored photosensitive resin composition with a mixer. For example, when a solvent-insoluble component such as a pigment is contained as (a) a colorant, it is preferable to use a paint conditioner, a sand mill, a ball mill, a roller mill, a stone mill, a jet mill, or a homogenizer in advance. and so on for dispersal. (a) Since the coloring agent is micronized by the dispersion treatment, the coating properties of the colored photosensitive resin composition are improved.

Dispersion treatment is generally preferably carried out in the following system: a system in which (a) a colorant, a solvent, and (f) a dispersant is used in combination; or a system in which (b) part or all of an alkali-soluble resin is used in combination (hereinafter , Sometimes the mixture used for dispersion treatment and the composition obtained by dispersion treatment are called "ink" or "pigment dispersion liquid"). In particular, when a polymer dispersant is used as the (f) dispersant, the obtained ink and colored photosensitive resin composition are excellent in dispersion stability and can suppress thickening over time, which is preferable. Thus, in the process of manufacturing a colored photosensitive resin composition, it is preferable to manufacture the pigment dispersion liquid containing at least (a) coloring agent, a solvent, and (f) dispersing agent. As the (a) colorant, organic solvent, and (f) dispersant that can be used in the pigment dispersion liquid, they can be preferably used in the description that can be used in the colored photosensitive resin composition. Moreover, as the content rate of each coloring agent of (a) coloring agent in a pigment dispersion liquid, what was described as the content rate in the coloring photosensitive resin composition can also be used preferably.

When dispersing the (a) colorant with a sand mill, glass beads or zirconia beads with a particle diameter of about 0.1 to 8 mm can be preferably used. Regarding the dispersion treatment conditions, the temperature is preferably in the range of 0°C to 100°C, more preferably in the range of room temperature to 80°C. Regarding the dispersing time, since the reasonable time varies depending on the composition of the liquid and the size of the dispersing treatment device, etc., the dispersing time is appropriately adjusted. The dispersion standard controls the gloss of the ink so that the 20-degree specular gloss (JIS Z8741) of the colored photosensitive resin composition falls within the range of 50 to 300.

The dispersed particle size of the pigment dispersed in the ink is preferably 0.03-0.3 μm, which can be measured by dynamic light scattering method or the like. Next, the ink obtained by the dispersion treatment is mixed with other components included in the colored photosensitive resin composition to prepare a uniform solution or dispersion. In the manufacturing process of a colored photosensitive resin composition, since fine dirt may mix in a liquid, it is desirable to filter the obtained colored photosensitive resin composition with a filter etc..

[2] Barrier wall and its formation method The cured product of this invention can be obtained by hardening the colored photosensitive resin composition of this invention. The colored photosensitive resin composition of the present invention can be used to form a barrier wall, for example, it can be preferably used to form a barrier wall for dividing an organic layer in an organic electroluminescent device, or a color filter containing luminous nano crystal particles The barrier wall used to divide the pixel part in the device. The barrier rib of the present invention includes the cured product of the present invention. The method of forming a barrier rib using the colored photosensitive resin composition of the present invention is not particularly limited, and a conventionally known method can be used. As a method for forming a barrier rib, for example, a method comprising the steps of: a coating step of applying a colored photosensitive resin composition on a substrate to form a colored photosensitive resin composition layer; and an exposure step of applying the colored photosensitive resin composition The colored photosensitive resin composition layer is exposed. As a specific example of the formation method of such a barrier rib, an inkjet method and a photolithography method are mentioned.

In the inkjet method, a colored photosensitive resin composition whose viscosity has been adjusted by dilution with a solvent is used as an ink, and ink droplets are sprayed onto the substrate by the inkjet method along a pattern of a specific barrier rib , whereby the colored photosensitive resin composition is coated on the substrate to form a pattern of unhardened barrier ribs. Then, the pattern of the uncured barrier ribs is exposed to form cured barrier ribs on the substrate. The exposure of the pattern of the uncured barrier rib was performed in the same manner as the exposure step in the photolithography method described below except that a mask was not used.

In the photolithography method, the colored photosensitive resin composition is applied to the entire area of the substrate where barrier ribs are formed to form a colored photosensitive resin composition layer. After exposing the formed colored photosensitive resin composition layer according to a specific barrier rib pattern, the exposed colored photosensitive resin composition layer is developed to form barrier ribs on the substrate.

In the coating step of coating the colored photosensitive resin composition on the substrate in the photolithography method, contact transfer coating using a roll coater, reverse coater, bar coater, etc. A non-contact coating device such as a device or a spinner (rotary coating device), a curtain-type flat coating machine, etc., coats the colored photosensitive resin composition on the substrate to be formed for barrier ribs, and if necessary, by drying to remove the solvent to form a colored photosensitive resin composition layer.

Next, in the exposure step, the colored photosensitive resin composition is irradiated with active energy rays such as ultraviolet rays and excimer laser light using a negative mask to partially expose the colored photosensitive resin composition layer according to the pattern of barrier ribs. Exposure can use high-pressure mercury lamps, ultra-high pressure mercury lamps, xenon lamps, carbon arc lamps and other light sources that emit ultraviolet light. The amount of exposure varies depending on the composition of the colored photosensitive resin composition, but is preferably about 10 to 400 mJ/cm ² , for example.

Next, in the developing step, the colored photosensitive resin composition layer exposed according to the pattern of the barrier ribs is developed with a developer, thereby forming the barrier ribs. The image development method is not particularly limited, and a dipping method, a spraying method, or the like can be used. Specific examples of the developing solution include those of organic systems such as dimethylbenzylamine, monoethanolamine, diethanolamine, and triethanolamine, or those of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, and quaternary ammonium salts. aqueous solution. Moreover, you may add an antifoaming agent or surfactant to a developer.

Thereafter, post-baking is performed on the developed barrier ribs to heat-harden them. As conditions of post-baking, it is preferable to carry out at 80-250 degreeC for 15-180 minutes.

The substrate used for the formation of the barrier ribs is not particularly limited, and can be appropriately selected according to the type of organic electroluminescent element manufactured using the substrate on which the barrier ribs are formed. As a preferable material of a board|substrate, glass and various resin materials are mentioned, for example. Specific examples of resin materials include: polyesters such as polyethylene terephthalate; polyolefins such as polyethylene and polypropylene; polycarbonate; poly(meth)methacrylic resin; polyethylene; Polyimide. Among the materials of these substrates, glass and polyimide are preferable in terms of excellent heat resistance. Also, depending on the type of organic electroluminescent element to be manufactured, a transparent electrode layer such as ITO or ZnO may be provided in advance on the surface of the substrate on which the barrier ribs are to be formed.

The film thickness of the barrier rib of the present invention is preferably at least 0.1 μm, more preferably at least 1 μm, further preferably at least 5 μm, especially preferably at least 10 μm, and more preferably at most 1 mm, more preferably at least 100 μm or less, more preferably 50 μm or less, still more preferably 30 μm or less, especially preferably 20 μm or less. There exists a tendency for light-shielding property to improve by making it more than the said lower limit. Moreover, it exists in the tendency for adhesiveness to improve by making it below the said upper limit. The film thickness of the barrier wall can be measured by a step difference-surface roughness-fine shape measuring device, a scanning white interference microscope, an ellipsometer, a reflection spectrometer, and an electron microscope.

[3] Organic electroluminescence element The organic electroluminescent device of the present invention has the barrier rib of the present invention. Various organic electroluminescent elements can be produced using a substrate having a barrier rib pattern produced by the method described above. The method for forming the organic electroluminescent element is not particularly limited, and it is preferable to form a pattern of barrier ribs on the substrate by the above method, and then inject ink into the area surrounded by the barrier ribs on the substrate to form organic elements such as pixels. layer, whereby organic electroluminescent devices can be manufactured. The type of the organic electroluminescent device may, for example, be a bottom emission type or a top emission type. As a bottom emission type, for example, a barrier rib is formed on a glass substrate on which a transparent electrode is laminated, and a hole transport layer, a light emitting layer, an electron transport layer, and a metal electrode layer are stacked in an opening surrounded by the barrier rib to form a bottom emission type. type. On the other hand, as a top emission type, for example, a barrier rib is formed on a glass substrate on which a metal electrode layer is laminated, and an electron transport layer, a light emitting layer, a hole transport layer, and a transparent electrode layer are stacked in an opening surrounded by the barrier rib. And make the top glow type.

When the barrier rib is in the shape of a bead, since the ink for forming the organic layer is repelled by the bead portion of the barrier rib, the area surrounded by the barrier rib may not be sufficiently covered with the ink for forming the organic layer. . On the other hand, by adopting a good shape without curling, the area surrounded by the barrier ribs can be sufficiently covered with the ink for forming the organic layer. Thereby, for example, the problem of halation in an organic EL display element can be solved.

As the solvent used when forming the ink for forming an organic layer, water, an organic solvent, and a mixed solvent of these can be used. The organic solvent is not particularly limited as long as the organic solvent can be removed from the film formed after injecting the ink. Specific examples of organic solvents include toluene, xylene, anisole, mesitylene, tetralin, cyclohexylbenzene, acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone , methanol, ethanol, isopropanol, ethyl acetate, butyl acetate, 3-phenoxytoluene, etc. In addition, surfactants, antioxidants, viscosity modifiers, ultraviolet absorbers, and the like may be added to the ink.

As a method of injecting ink into a region surrounded by barrier walls, an inkjet method is preferable in that a small amount of ink can be easily injected into a specific portion. The ink used for the formation of the organic layer can be appropriately selected according to the type of organic electroluminescent device to be produced. In the case of injecting ink by the inkjet method, the viscosity of the ink is not particularly limited as long as the ink can be ejected from the inkjet head well, but it is preferably 4 to 20 mPa·s, more preferably 5 to 10 mPa·s s. The viscosity of the ink can be adjusted by adjusting the solid content in the ink, changing the solvent, adding a viscosity modifier, etc.

Furthermore, the light emitting layer may, for example, be an organic electroluminescent layer described in Japanese Patent Application Laid-Open No. 2009-146691 or Japanese Patent No. 5734681. Also, quantum dots as described in Japanese Patent No. 5653387 or Japanese Patent No. 5653101 may be used.

[4] Color filter containing luminescent nanocrystalline particles The color filter including the luminescent nano crystal particles of the present invention is not particularly limited as long as it has the barrier ribs of the present invention, and examples thereof include those in which pixels are formed in regions partitioned by the barrier ribs.

Fig. 1 is a schematic cross-sectional view of an example of a color filter provided with a barrier rib of the present invention. As shown in FIG. 1 , the color filter 100 includes a substrate 10 , barrier ribs 20 provided on the substrate, red pixels 30 , green pixels 40 , and blue pixels 50 . The red pixels 30 , the green pixels 40 , and the blue pixels 50 can be arranged in a grid pattern in such a manner that this order is repeated. The barrier wall 20 is disposed between the adjacent pixels. In other words, the adjacent pixels can be divided by the barrier ribs 20 .

The red pixel 30 includes red luminescent nanocrystalline particles 2 , and the green pixel 40 includes green luminescent nanocrystalline particles 1 . Blue pixels 50 are pixels that transmit blue light from a light source.

These nanocrystalline particles are nanometer-sized crystals that absorb excitation light and emit fluorescence or phosphorescence, for example, crystals with a maximum particle size of 100 nm or less measured by a transmission electron microscope or a scanning electron microscope .

Luminescent nanocrystalline particles can emit light of a wavelength different from the absorbed wavelength (fluorescence or phosphorescence) by absorbing light of a specific wavelength. For example, red luminescent nanocrystalline particles 2 emit at 605-665 nm The range has a light emission peak wavelength (red light), and the green luminescent nano crystal particles 1 emit light (green light) with a light emission peak wavelength in the range of 500-560 nm.

According to the solution of the Schrödinger wave equation of the well-type potential model, the wavelength (luminescent color) of the light emitted by the luminescent nanocrystalline particles depends on the size (such as particle diameter) of the luminescent nanocrystalline particles, and also depends on the luminescent nanocrystalline particles. The energy gap of rice crystal particles. Therefore, by changing the constituent material and size of the luminescent nano crystal particles used, the luminous color can be selected. As the luminescent nano crystal particles, quantum dots and the like may, for example, be mentioned.

The method of manufacturing a color filter containing luminescent nanocrystalline particles is not particularly limited, and the following method is exemplified: preparing a substrate having a barrier rib comprising the cured product of the present invention, forming a barrier rib containing A layer of luminescent nanocrystalline particles. The method of forming the layer containing luminescent nano crystal particles is not particularly limited, for example, it can be produced by the following method: selectively attaching an ink composition containing luminescent nano crystal particles by inkjet method, and using active energy rays The irradiation or heating hardens the ink composition.

[5] Image display device The image display device of the present invention includes the barrier rib of the present invention. As the image display device of the present invention, for example, an image display device including the organic electroluminescent element of the present invention may be mentioned. There are no particular limitations on the type or structure of the image display device as long as it includes an organic electroluminescent element. For example, an active-driven organic electroluminescent element can be used and assembled according to a conventional method. For example, the image display device of the present invention can be formed by the method described in "Organic EL Display" (Ohmsha, published on August 20, 2004, by Seishi Oto, Chihaya Adachi, and Hideyuki Murata). For example, an organic electroluminescent element that emits white light can be combined with a color filter for image display, and an organic electroluminescent element with different luminescent colors such as RGB can be combined for image display.

Moreover, as an image display device of this invention, the image display device provided with the color filter containing the luminous nanocrystal particle of this invention is mentioned, for example. The type of image display device may, for example, be a liquid crystal display device or an image display device including an organic electroluminescence element. In the case of a liquid crystal display device, for example, a liquid crystal layer including a light source having a blue LED (Light-Emitting Diode) and an electrode for controlling blue light emitted from the light source on a pixel-by-pixel basis By. On the other hand, as an image display device including an organic electroluminescent element, one in which a blue light-emitting organic electroluminescent element is arranged at a position corresponding to each pixel portion of the color filter is mentioned. Specifically, the method described in Japanese Patent Application Laid-Open No. 2019-87746 may be cited. [Example]

Hereinafter, the colored photosensitive resin composition of the present invention will be described. Although specific examples are given and described, the present invention is not limited to the following examples unless the gist is exceeded. The components of the colored photosensitive resin composition used in the following examples and comparative examples are as follows.

＜Alkali-soluble resin-I＞ Alkali-soluble acrylic copolymer resin is obtained by using dicyclopentanyl methacrylate/styrene/glycidyl methacrylate (molar ratio: 0.02/0.05/0.93) as constituent monomers To the copolymer resin, acrylic acid equivalent to the above-mentioned glycidyl methacrylate was subjected to an addition reaction, and tetrahydrophthalic anhydride was added so that 0.10 mol of tetrahydrophthalic anhydride was added to 1 mol of the above-mentioned copolymer resin. The polystyrene-equivalent weight-average molecular weight (Mw) measured by GPC is 7700, the acid value of the solid content is 28.5 mgKOH/g, and the double bond equivalent is 260 g/mol, and the acrylic copolymer resin (b1) match.

＜Alkali-soluble resin-II＞ Alkali-soluble acrylic copolymer resin is obtained by using dicyclopentanyl methacrylate/styrene/glycidyl methacrylate (molar ratio: 0.30/0.10/0.60) as constituent monomers Addition reaction of acrylic acid equivalent to the above-mentioned glycidyl methacrylate to the copolymer resin, and further addition reaction of tetrahydrophthalic anhydride to 0.39 moles relative to 1 mole of the above-mentioned copolymer resin . The polystyrene-equivalent weight average molecular weight (Mw) measured by GPC is 9000, the acid value of the solid content is 80 mgKOH/g, and the double bond equivalent is 470 g/mol, and the acrylic copolymer resin (b1) do not match.

＜Alkali-soluble resin-III＞ ZCR-1642H manufactured by Nippon Kayaku Co., Ltd. (weight average molecular weight Mw=6500, acid value=98 mgKOH/g, double bond equivalent=500 g/mol) It does not correspond to the acrylic copolymer resin (b1).

<Solvent-I> PGMEA: Propylene Glycol Monomethyl Ether Acetate ＜Solvent-II＞ PGME: Propylene Glycol Monomethyl Ether

＜Photopolymerizable Compound-I＞ DPHA: dipentaerythritol hexaacrylate manufactured by Nippon Kayaku Co., Ltd.

＜Photopolymerization Initiator-I＞ A compound having the following chemical structure, which can be produced by the method described in International Publication No. 2009/131189, was used.

[chemical 40]

＜Liquid Repellent-I＞ MEGAFAC RS-90 manufactured by DIC Corporation (a compound having an ethylenically unsaturated group and a perfluoroalkylene group)

＜Surfactant-I＞ MEGAFAC F-559 manufactured by DIC Corporation (a fluorine-based surfactant without a crosslinking group)

＜Additive-I＞ Karenz MT PE1 (pentaerythritol tetrakis(3-mercaptobutyrate)) manufactured by Showa Denko Co., Ltd. ＜Additive-II＞ KAYAMER PM-21 (Phosphate Ester Containing Methacrylyl) manufactured by Nippon Kayaku Co., Ltd.

<Pigment dispersion 1> TiO ₂ titanium oxide PT501R (average primary particle diameter: 0.18 μm) manufactured by Ishihara Sangyo Co., Ltd., amine basic polymer acrylic dispersant (dispersant-I), and solvent are listed in Table 1 The recorded mass ratios are mixed. The mixed solution was dispersed for 6 hours in the range of 25 to 45° C. by means of a paint shaker. As beads, use 0.3 mmϕ zirconia beads and add 2.5 times the mass of the mixture. After the dispersion was completed, the beads and the dispersion liquid were separated by a filter to prepare a pigment dispersion liquid 1. In addition, the compounding ratio of the dispersant in Table 1 is a solid content converted value, and the compounding ratio of a solvent also includes the amount of the solvent originating in a dispersant.

[Table 1] Pigment dispersion 1 Blending ratio (parts by mass) Colorant Titanium oxide 25.0 Dispersant (converted by solid content) Dispersant-I 2.5 solvent Solvent-I 72.5

[Examples 1-7 and Comparative Examples 1-3] Using the pigment dispersion 1 prepared above, each component was added so that the ratio of the solid content of each component in the total solid content became the compounding ratio in Table 2, and the content ratio of the total solid content became 31% by mass. , and solvent-I/solvent-II=80/20 (mass ratio) in the total solvent, add the solvent, stir to dissolve it, and prepare colored photosensitive resin compositions 1-10 (compositions 1-10). Using each obtained colored photosensitive resin composition, it evaluated by the following method. Furthermore, the blending ratios of the pigment dispersion liquid, alkali-soluble resin, and liquid-repelling agent in Table 2 are converted values based on solid content.

[Table 2] Example comparative example 1 2 3 4 5 6 7 1 2 3 combination 1 2 3 4 5 6 9 7 8 10 Blending ratio (parts by mass) Pigment dispersion 1 6.05 6.05 6.05 6.05 6.05 6.05 6.05 6.05 6.05 6.05 Alkali-soluble resin-I (converted by solid content) 64.96 58.47 45.48 39.98 32.48 25.99 62.68 0.00 0.00 64.96 Alkali-soluble resin-II (converted by solid content) 0.00 6.50 19.49 25.99 32.48 38.98 0.00 64.96 0.00 0.00 Alkali-soluble resin-III (converted by solid content) 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 64.96 0.00 Photopolymerizable compound-I 25.99 25.99 25.99 25.99 25.99 25.99 25.07 25.99 25.99 25.99 Photopolymerization Initiator-I 1.00 1.00 1.00 1.00 1.00 1.00 4.20 1.00 1.00 1.00 Liquid repellant-I (converted by solid content) 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.00 Surfactant-I (converted by solid content) 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.50 Additive-I 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 Additive-II 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 (b) Content rate (%) of acrylic copolymer resin (b1) in alkali-soluble resin 100 90 70 60 50 40 100 0 0 100 (b) Double bond equivalent of alkali-soluble resin (g/mol) 260 272 300 317 335 355 260 470 500 260 Evaluation results PGMEA contact angle (°) 41 (A) 40 (A) 39 (A) 37 (A) 37 (A) 34 (A) 49 (A) 24 (B) 12 (B) 22 (B) Min dense line width (μm) 7 (A) 8 (A) 9 (A) 10 (A) 11 (A) 11 (A) 5 (A) 12 (B) 8 (A) 10 (A) linearity of line A A A A A A B A A A

The performance evaluation method will be described below.

<Measurement of PGMEA contact angle> The said photosensitive colored resin composition was apply|coated so that the thickness may become 10 micrometers after heat hardening using the spin coater on a glass substrate. This coated substrate was vacuum-dried for 1 minute, and further heat-dried on a hot plate at 100° C. for 120 seconds. The obtained coated substrate was exposed to 100 mJ/cm ² at a wavelength of 365 nm and an intensity of 500 mW/cm ² using an exposure apparatus MPA-600FA (manufactured by Canon Corporation). Next, an aqueous solution of 0.03% by mass of KOH and 0.05% by mass of Emulgen A-60 (surfactant manufactured by Kao Corporation) was dissolved as a developing solution, and the substrate was spray-developed at 24° C. with a spray pressure of 0.05 MPa for 70 seconds, and then rinse with pure water for 10 seconds at a spray pressure of 0.5 MPa. Finally, the substrate was heated and hardened in an oven at 150° C. for 30 minutes to obtain a substrate for contact angle measurement.

Using the Drop Master 500 (contact angle measurement device) manufactured by Kyowa Interface Science Co., Ltd., 0.7 μL of PGMEA was dropped under the conditions of 23°C and humidity 50%RH, and the contact angle of the above-mentioned substrate for contact angle measurement was measured 1 second after the drop. Ink repellency was evaluated by the following criteria. The results are shown in Table 2. A larger contact angle indicates higher ink repellency.

(evaluation criteria for ink repellency) A: PGMEA contact angle is more than 30° B: PGMEA contact angle is less than 30°

<Evaluation of minimum dense line width> The said photosensitive colored resin composition was apply|coated so that the thickness may become 10 micrometers after heat hardening using the spin coater on a glass substrate. This coated substrate was vacuum-dried for 1 minute, and further heat-dried on a hot plate at 100° C. for 120 seconds. Next, the obtained coated film substrate was exposed to 80 mJ/cm ² at a wavelength of 365 nm and an intensity of 500 mW/cm ² using a photomask and an exposure device MPA-600FA (manufactured by Canon Corporation). The mask used has linear openings of various widths with an opening width of 5 to 50 μm (5 to 20 μm: every 1 μm, 25 to 50 μm: every 5 μm) and an opening length of 2 mm. Next, development and water washing were carried out under the same conditions as those used to measure the contact angle, and then heated and hardened in an oven at 150°C for 30 minutes to prepare a linear patterned substrate presumed to have barrier walls. Observing the entire line (2 mm) on the above-mentioned linear pattern substrate with an optical microscope, for the line that is closely connected to the substrate without missing or peeling, the line corresponding to the minimum opening width of the mask will be The opening width was set as the minimum dense line width, and the following criteria were used for evaluation. The smaller the minimum tightness line width, the higher the adhesion.

(Evaluation criteria for the minimum dense line width) A: Less than 12 μm B: 12 μm or more

＜Evaluation of Linearity of Line＞ The entire line (2 mm) on the linear pattern substrate was observed with an optical microscope, and the linearity of the line was evaluated by the following criteria. Higher linearity of the line indicates higher developability.

(Evaluation criteria for linearity of lines) A: The line is a straight line or a substantially straight line. B: In the state shown in Figure 2, the line is not a straight line.

According to the comparison of Examples 1-6 and Comparative Examples 1-2 in Table 2, it is clear that using a compound having a crosslinking group and a fluorine atom and/or a siloxane chain as a liquid-repellent agent, the (b) alkali-soluble resin The double bond equivalent is set below 400 g/mol, so that the contact angle of PGMEA can be increased and the ink repellency can be improved. It is believed that by reducing the double bond equivalent of (b) alkali-soluble resin, the cross-linking density in the coating film becomes higher, so the liquid-repellent agent is also likely to remain in the film after development, showing higher ink repellency. In addition, it is considered that since the crosslink density in the coating film becomes high, it is also possible to suppress peeling of lines formed during exposure during development. According to the comparison of Examples 1-6 and Comparative Example 3 in Table 2, it can be clearly seen that when using a fluorine-based surfactant without a cross-linking group instead of a compound with a cross-linking group and a fluorine atom and/or a siloxane chain In this case, ink repellency becomes insufficient. The reason for this is considered to be that since the film does not have a crosslinking group, the surfactant is eluted during development, and the amount of the surfactant remaining on the film surface after development is reduced. According to the comparison between Examples 1-6 and Example 7 in Table 2, it is clear that when the content ratio of the photopolymerization initiator is 3% by mass or less, both high ink repellency and line linearity can be achieved. The reason for this is considered to be that high ink repellency can be expressed even if the content ratio of the photopolymerization initiator is 3% by mass or less, and developability can be improved by reducing the content ratio of the photopolymerization initiator.

1: Green luminescent nano crystal particles 2: Red luminous nano crystal particles 10: Substrate 20: barrier wall 30: red pixels 40: green pixels 50: blue pixels 100: color filter 200: linear pattern 300: Glass substrate exposure department

FIG. 1 is a schematic cross-sectional view of an example of a color filter provided with a barrier rib of the present invention. Fig. 2 is a schematic diagram of an example of a linear pattern substrate.

Claims (14)

A colored photosensitive resin composition, characterized in that it contains (a) a colorant, (b) an alkali-soluble resin, (c) a photopolymerization initiator, (d) a photopolymerizable compound, and (e) a liquid repellent dosers, The above-mentioned (a) coloring agent contains (a1) a white pigment, The content ratio of the above-mentioned (a) coloring agent is 30% by mass or less with respect to the total solid content of the colored photosensitive resin composition, The double bond equivalent of the above (b) alkali-soluble resin is 400 g/mol or less, and The liquid repellent (e) above contains a compound (e1) having a crosslinking group and a fluorine atom and/or a siloxane chain. The colored photosensitive resin composition according to claim 1, wherein the above-mentioned (b) alkali-soluble resin contains an acrylic copolymer resin (b1) having a partial structure represented by the following general formula (I): [Chemical 1]

(In formula (I), R ¹ and R ² independently represent a hydrogen atom or a methyl group; * represents a bond). The colored photosensitive resin composition according to claim 2, wherein the content ratio of the above-mentioned acrylic copolymer resin (b1) in the above-mentioned (b) alkali-soluble resin is 40% by mass or more. The colored photosensitive resin composition according to any one of Claims 1 to 3, wherein the content ratio of the above-mentioned (a1) white pigment in the above-mentioned (a) colorant is 50% by mass or more. The colored photosensitive resin composition according to any one of Claims 1 to 4, wherein the average particle diameter of the primary particles of the above-mentioned (a1) white pigment is 100 nm or more. The colored photosensitive resin composition according to any one of Claims 1 to 5, wherein the white pigment (a1) includes at least one of titanium oxide, zirconium oxide, aluminum oxide, and hafnium oxide. The colored photosensitive resin composition according to claim 6, wherein the above-mentioned (a1) white pigment contains at least titanium oxide. The colored photosensitive resin composition according to any one of Claims 1 to 7, wherein the content ratio of the above-mentioned (c) photopolymerization initiator is 3 with respect to the total solid content of the colored photosensitive resin composition Mass% or less. The colored photosensitive resin composition according to any one of claims 1 to 8, which contains a solvent. A cured product obtained by curing the colored photosensitive resin composition according to any one of claims 1 to 9. A barrier wall comprising the cured product according to claim 10. An organic electroluminescent element, which is provided with the barrier wall as claimed in claim 11. A color filter comprising luminescent nano crystal particles, which is provided with the barrier wall as claimed in claim 11. An image display device provided with the barrier wall according to claim 11.

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