TWI826695B - Photosensitive colored resin composition, cured material, barrier rib and image display device - Google Patents

Abstract

The present invention provides a photosensitive colored resin composition that has good green light shielding properties, high ink repellency, and can form high-definition barrier ribs. The photosensitive colored resin composition of the present invention contains (A) ethylenically unsaturated compound, (B) photopolymerization initiator, (C) alkali-soluble resin, (D) liquid repellent, and (E) colorant , and the above-mentioned (D) liquid repellent contains a fluorine atom-containing resin having a cross-linked group, the above-mentioned (E) colorant contains a purple pigment, and the content ratio of the above-mentioned purple pigment in the above-mentioned (E) colorant is 45% by mass. above.

Description

Photosensitive colored resin composition, cured material, barrier rib and image display device

The present invention relates to a photosensitive colored resin composition, and further relates to a cured product obtained by curing the photosensitive colored resin composition, a barrier rib composed of the cured product, or an image display device provided with a barrier rib. Part of the contents disclosed in the specification, patent scope, drawings and abstract of Japanese Patent Application No. 2019-134426 filed with the Japan Patent Office on July 22, 2019, as well as the documents cited in this specification, or All are cited here and adopted as the disclosure content of this specification.

In previous displays, color filters using organic pigments to form red, green, and blue pixels were often used. In recent years, in order to achieve low power consumption or wide color gamut of displays, color filters using luminescent nanocrystalline particles such as quantum dots to form pixels have been studied. Specifically, it is known to have a red pixel including red luminescent nanocrystal particles, a green pixel including green luminescent nanocrystal particles, and a blue pixel that transmits blue light from a light source.

As methods for manufacturing color filters, there are photolithography methods and inkjet methods, and it is known that the latter can reduce the loss of ink materials (see, for example, Patent Document 1). When a color filter containing luminescent nanocrystal particles is manufactured by the inkjet method, ink is ejected into a region (pixel portion) surrounded by a pre-made barrier rib to form a pixel. Therefore, the barrier ribs must prevent inks from being mixed between adjacent pixel portions, and are required to have high ink repellency.

As a material for forming a barrier rib with ink repellency, Patent Document 2 describes a photosensitive colored resin composition containing a specific alkali-soluble resin and a black organic pigment, and having an acid value of a solid component within a specific range. Moreover, Patent Document 3 describes a photosensitive colored resin composition containing a specific resin and a colorant. [Prior technical literature] [Patent Document]

[Patent Document 1] Japanese Patent Application Publication No. 2019-086745 [Patent Document 2] International Publication No. WO2013/069789 [Patent Document 3] International Publication No. WO2017/057281

[Problem to be solved by the invention]

Through studies by the present inventors, it has been found that in a color filter having pixels containing luminescent nanocrystalline particles, the green light emitted from the green pixel excites the red luminescence of the adjacent red pixel. Nano crystal particles cause them to emit light, and the color reproducibility of the image display device deteriorates. Therefore, studies have been conducted on using a purple pigment as a colorant in a photosensitive colored resin composition for forming a barrier rib to block green light. As a result, it has become difficult to achieve both ink repellency and high definition of the barrier rib.

The photosensitive colored resin composition described in Patent Document 2 does not contain a purple pigment. On the other hand, the photosensitive colored resin composition described in Patent Document 3 does not contain both the purple pigment and the liquid repellent agent.

Therefore, an object of the present invention is to provide a photosensitive colored resin composition that has good green light shielding properties, high ink repellency, and can form high-definition barrier ribs. Furthermore, an object of the present invention is to provide a cured product formed by curing a photosensitive colored resin composition that has good green light shielding properties, high ink repellency, and can form high-definition barrier ribs, and a barrier composed of the cured product. Walls, and image display devices with barrier walls. [Technical means to solve problems]

The present inventors conducted intensive research and found that the above problems can be solved by setting the content ratio of the purple pigment in the colorant to a specific range in a photosensitive colored resin composition containing a specific liquid repellent agent. Thus, the present invention is completed. That is, the gist of this invention is as follows.

[1] A photosensitive colored resin composition characterized by containing (A) an ethylenically unsaturated compound, (B) a photopolymerization initiator, (C) an alkali-soluble resin, (D) a liquid repellent agent, and (E) colorants, and The above-mentioned (D) liquid repellent contains a fluorine atom-containing resin having a cross-linking group, The colorant (E) above contains a purple pigment, and The content ratio of the purple pigment in the colorant (E) is 45% by mass or more.

[2] The photosensitive colored resin composition according to [1], wherein the content ratio of the purple pigment in the colorant (E) is 50 mass % or more. [3] The photosensitive colored resin composition according to [1] or [2], wherein the purple pigment is C.I. Pigment Violet 23 and/or C.I. Pigment Violet 29. [4] The photosensitive colored resin composition according to any one of [1] to [3], wherein the content ratio of the colorant (E) is 20 mass in the total solid content of the photosensitive colored resin composition. %the following.

[5] A cured product obtained by curing the photosensitive colored resin composition according to any one of [1] to [4]. [6] A barrier wall composed of the hardened material described in [5]. [7] An image display device provided with the barrier wall as described in [6]. [Effects of the invention]

The present invention can provide a photosensitive colored resin composition that has good green light shielding properties, high ink repellency, and can form high-definition barrier ribs.

Hereinafter, the present invention will be described in detail. In addition, the following description is an example of embodiment of this invention, and this invention is not limited to these as long as it does not deviate from the summary. Furthermore, in the present invention, "(meth)acrylic acid" means "either or both acrylic acid and methacrylic acid", and "total solid content" means photosensitive colored resin. The total ingredients in a composition other than solvents. Furthermore, in the present invention, the numerical range represented by "～" means a range including the numerical values described before and after "～" as the lower limit and the upper limit. In addition, in the present invention, the so-called "(co)polymer" means both a homopolymer (homopolymer) and a copolymer (copolymer), and the so-called "(acid)anhydride" and "acid (anhydride) ” means both the acid and its anhydride. In the present invention, the so-called barrier wall material refers to a bank material, a wall material, and a wall material. Similarly, the so-called barrier wall material refers to a barrier wall, a wall, and a wall. In the present invention, the weight average molecular weight refers to the weight average molecular weight (Mw) in terms of polystyrene obtained by GPC (gel permeation chromatography). In the present invention, the acid value means an acid value in terms of effective solid content, unless otherwise specified, and is calculated by neutralization titration.

In the present invention, barrier ribs are those used to divide pixel portions in color filters containing luminescent nanocrystalline particles, and are used to form pixels by ejecting ink into the divided areas and drying them. .

[1] Photosensitive colored resin composition The photosensitive colored resin composition of the present invention contains (A) ethylenically unsaturated compound, (B) photopolymerization initiator, (C) alkali-soluble resin, (D) liquid repellent agent, and (E) colorant as essential components ingredients, and optionally other ingredients, such as solvents or chain transfer agents.

[1-1] Components and composition of photosensitive colored resin composition The components constituting the photosensitive colored resin composition of the present invention and their composition will be described in order.

[1-1-1] (A) Component: Ethylenically unsaturated compound The photosensitive colored resin composition of the present invention contains (A) an ethylenically unsaturated compound. It is considered that by containing (A) the ethylenically unsaturated compound, the curability of the coating film is improved, and the ink repellency is also improved. The ethylenically unsaturated compound used here means a compound having one or more ethylenically unsaturated bonds in the molecule, which has polymerizability, cross-linkability, and the ability to expand the exposed portion and the non-exposed portion associated therewith. In view of the difference in solubility of the developer, etc., a compound having two or more ethylenically unsaturated bonds in the molecule is preferred. Moreover, the ethylenically unsaturated bond is preferably derived from a (meth)acryloxy group. That is, as the ethylenically unsaturated compound, a (meth)acrylate compound is more preferred.

In the present invention, it is particularly preferable to use a polyfunctional vinyl monomer having two or more ethylenically unsaturated bonds per molecule. The number of ethylenically unsaturated groups in the polyfunctional ethylenic monomer is not particularly limited, but is preferably 2 or more, more preferably 3 or more, further preferably 5 or more, and more preferably 15 or less, still more preferably It is 10 or less, more preferably 8 or less, especially 7 or less. For example, it is 2-15, Preferably it is 2-10, More preferably, it is 3-8, Still more preferably, it is 5-7 or less. When the value is equal to or higher than the above-mentioned lower limit, the polymerizability tends to be improved and the ink repellency becomes higher. When the value is equal to or less than the above-mentioned upper limit, the developability tends to become better. Specific examples of ethylenically unsaturated compounds include: esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; Esters obtained by the esterification reaction of polyhydric hydroxyl compounds such as hydroxyl compounds and unsaturated carboxylic acids and polycarboxylic acids.

Examples of esters of the aliphatic polyhydroxy compound and unsaturated carboxylic acid include: ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, and trimethylolethane triacrylate. Acrylic acid esters of aliphatic polyhydroxy compounds such as ester, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glyceryl acrylate, etc. Methacrylate obtained by replacing part or all of the acrylate ester of the above-mentioned example compound with methacrylate, Iconate ester obtained by replacing part or all of the acrylate ester of the above-mentioned example compound with itaconate, A crotonic acid ester obtained by replacing part or all of the acrylic acid ester of the above-mentioned exemplary compound with a crotonic acid ester. A ciscrylic acid ester obtained by replacing part or all of the acrylic acid ester of the above-mentioned exemplary compound with a maleic acid ester. Butenedioate, etc.

Examples of esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids include: hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, and resorcin dimethyl Acrylates, pyrogallol triacrylate and other aromatic polyhydroxy compounds such as acrylates and methacrylates. The ester obtained by the esterification reaction of a polyhydric hydroxy compound such as an aliphatic polyhydroxy compound and an aromatic polyhydroxy compound, an unsaturated carboxylic acid, and a polyhydric carboxylic acid is not necessarily a single substance. If representative specific examples are given, Examples: condensates of acrylic acid, phthalic acid, and ethylene glycol; condensates of acrylic acid, maleic acid, and diethylene glycol; condensates of methacrylic acid, terephthalic acid, and pentaerythritol; acrylic acid, Condensates of adipic acid, butylene glycol and glycerol, etc.

Examples of the polyfunctional vinyl monomer used in the present invention include a polyisocyanate compound and a hydroxyl-containing (meth)acrylate, or a polyisocyanate compound and a polyol and a hydroxyl-containing (meth)acrylate. (meth)acrylic urethanes obtained by reacting hydroxyl)acrylates; such as epoxy acrylates which are the addition reactants of polyvalent epoxy compounds and hydroxyl (meth)acrylates or (meth)acrylic acid; Acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as divinyl phthalate. Examples of the (meth)acrylic urethanes include: DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, UA-1100H (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), UA-306H, UA-510H, UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd. ), UV-1700B, UV-7600B, UV-7605B, UV-7630B, UV-7640B (manufactured by Mitsubishi Chemical Corporation), etc.

Among them, from the viewpoint of the adhesion of the barrier to the substrate and the ink repellency, as (A) the ethylenically unsaturated compound, it is preferable to use an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid. Or (meth)acrylic urethanes, preferably dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, or 2,2,2-tris(meth)acryloxy Methyl ethyl phthalic acid, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate dibasic anhydride adduct, pentaerythritol tri(meth)acrylate ) Dibasic acid anhydride adduct of acrylate, etc. These may be used individually by 1 type, and may be used in combination of 2 or more types.

In the present invention, the molecular weight of (A) the ethylenically unsaturated compound is not particularly limited, but from the viewpoint of ink repellency and formation of high-definition barrier ribs with thin line widths, it is preferably 100 or more, and more preferably 150 or more, more preferably 200 or more, more preferably 300 or more, especially 400 or more, most preferably 500 or more, and preferably 1,000 or less, more preferably 700 or less. For example, it is 100-1000, Preferably it is 150-1000, More preferably, it is 200-1000, Still more preferably, it is 300-700, Still more preferably, it is 400-700, Especially preferably, it is 500-700. Moreover, the carbon number of (A) the ethylenically unsaturated compound is not particularly limited, but from the viewpoint of ink repellency and residue suppression, it is preferably 7 or more, more preferably 10 or more, further preferably 15 or more, and still more preferably More preferably, it is 20 or more, especially preferably 25 or more, and it is more preferably 50 or less, more preferably 40 or less, still more preferably 35 or less, especially 30 or less. For example, it is 7 to 50, preferably 10 to 40, more preferably 15 to 35, still more preferably 20 to 35, particularly preferably 25 to 30 or more. Furthermore, from the viewpoint of ink repellency and formation of high-definition barrier ribs with thin line widths, ester (meth)acrylates, epoxy (meth)acrylates, and (meth)acrylates are preferred. Acrylic urethanes, among which pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, etc. have more than three functions Esters of (meth)acrylates, 2,2,2-tris(meth)acryloyloxymethylethyl phthalic acid, and dipentaerythritol penta(meth)acrylate dibasic acid anhydride adducts The adducts of acid anhydrides of trifunctional or higher ester (meth)acrylates are even better in terms of ink repellency and formation of high-definition barrier ribs with thin line widths.

The content ratio of (A) the ethylenically unsaturated compound in the photosensitive colored resin composition of the present invention is not particularly limited, but it is usually 1 mass % or more, preferably 5 mass % or more, and more preferably 5 mass % or more in the total solid content. It is 10 mass % or more, more preferably 15 mass % or more, especially 20 mass % or more, and usually 80 mass % or less, preferably 60 mass % or less, more preferably 40 mass % or less, still more preferably It is 30 mass% or less. For example, the total solid content is 1 to 80 mass%, preferably 5 to 80 mass%, more preferably 10 to 60 mass%, further preferably 15 to 40 mass%, and particularly preferably 20 to 30 mass%. %. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

Moreover, the content ratio of the (A) ethylenically unsaturated compound relative to 100 parts by mass of the alkali-soluble resin (C) is not particularly limited, but is usually 1 part by mass or more, preferably 5 parts by mass or more, and more preferably 10 parts by mass. parts by mass or more, more preferably 15 parts by mass or more, more preferably 20 parts by mass or more, especially 25 parts by mass or more, most preferably 30 parts by mass or more, and usually 150 parts by mass or less, preferably 100 parts by mass parts by mass or less, more preferably 70 parts by mass or less, still more preferably 50 parts by mass or less, still more preferably 40 parts by mass or less. For example, it is 1 to 150 parts by mass, preferably 5 to 150 parts by mass, more preferably 10 to 100 parts by mass, still more preferably 15 to 100 parts by mass, still more preferably 20 to 70 parts by mass, and particularly preferably 25 ~50 parts by mass, preferably 30-40 parts by mass. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

[1-1-2] (B) Component: Photopolymerization initiator The photosensitive colored resin composition of the present invention contains (B) a photopolymerization initiator. (B) The photopolymerization initiator is a compound that polymerizes the ethylenically unsaturated compound (A) by active light, for example, the ethylenically unsaturated bond of the ethylenically unsaturated compound (A). No special restrictions.

The photosensitive colored resin composition of the present invention can use a photopolymerization initiator commonly used in this field as the (B) photopolymerization initiator. Examples of such photopolymerization initiators include metallocene compounds including titanocene compounds described in Japanese Patent Application Laid-Open No. Sho 59-152396 and Japanese Patent Application Laid-Open No. Sho 61-151197; Hexaarylbiimidazole derivatives described in Japanese Patent Application Publication No. 2000-56118; Halomethylated tetrazole derivatives and halomethyl-mesotrioxadiazole derivatives described in Japanese Patent Application Publication No. 10-39503 Free radical activity such as N-aryl-α-amino acids, N-phenylglycine and other N-aryl-α-amino acids, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters, etc. agents, α-aminophenanone derivatives; oxime ester compounds described in Japanese Patent Laid-Open No. 2000-80068, Japanese Patent Laid-Open No. 2006-36750, etc.

Specifically, examples of metallocene compounds include: dicyclopentadienyl titanium dichloride, dicyclopentadienyl titanium biphenyl, dicyclopentadienyl bis(2,3,4,5, 6-pentafluorophenyl)titanium, dicyclopentadienylbis(2,3,5,6-tetrafluorophenyl)titanium, dicyclopentadienylbis(2,4,6-trifluorophenyl)titanium )Titanium, dicyclopentadienylbis(2,6-difluorophenyl)titanium, dicyclopentadienylbis(2,4-difluorophenyl)titanium, bis(methylcyclopentadienyl) )bis(2,3,4,5,6-pentafluorophenyl)titanium, bis(methylcyclopentadienyl)bis(2,6-difluorophenyl)titanium, dicyclopentadienyl[ 2,6-Di-fluoro-3-(pyrrol-1-yl)-phenyl]titanium, etc.

Moreover, examples of biimidazole derivatives include: 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-chlorophenyl)-4,5- Bis(3'-methoxyphenyl)imidazole dimer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-methoxyphenyl) )-4,5-diphenylimidazole dimer, (4'-methoxyphenyl)-4,5-diphenylimidazole dimer, etc.

Furthermore, examples of halomethylated ethadiazole derivatives include: 2-trichloromethyl-5-(2'-benzofuranyl)-1,3,4-ethadiazole, 2-trichloro Methyl-5-[β-(2'-benzofuranyl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6' '-Benzofuryl)vinyl)]-1,3,4-ethadiazole, 2-trichloromethyl-5-furyl-1,3,4-ethadiazole, etc.

In addition, examples of halomethyl-mesosine derivatives include: 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-mesosine, 2-(4- Methoxynaphthyl)-4,6-bis(trichloromethyl)-mesotriene, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-mesotriene , 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-mesotriene, etc.

Also, examples of α-aminophenanone derivatives include: 2-methyl-1-[4-(methylthio)phenyl]-2-𠰌linylpropan-1-one, 2-benzyl Benzyl-2-dimethylamino-1-(4-𠰌linylphenyl)-butanone-1, 2-benzyl-2-dimethylamino-1-(4-𠰌linylphenyl)butanone Alkane-1-one, ethyl 4-dimethylaminobenzoate, isopentyl 4-dimethylaminobenzoate, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, 1, 2-ethylhexyl 4-dimethylaminobenzoate, 2,5-bis(4-diethylaminobenzylidene)cyclohexanone, 7-diethylamino-3-(4-diethylamine) Benzyl benzyl) coumarin, 4-(diethylamino) chalcone, etc.

As a photopolymerization initiator, oxime ester-based compounds are particularly effective in terms of sensitivity and plate-making properties. The use of alkali-soluble resins containing phenolic hydroxyl groups is disadvantageous in terms of sensitivity, so it is particularly effective. This type of oxime ester compound with excellent sensitivity is useful. Oxime ester compounds have a structure that absorbs ultraviolet rays, transmits light energy, and generates free radicals. Therefore, a small amount of the compound has high sensitivity and is stable to thermal reactions. It can obtain high-sensitivity photosensitive coloring with a small amount. Resin composition.

Examples of the oxime ester compound include compounds represented by the following general formula (IV).

[Chemical 1]

In the above formula (IV), R ^21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent. R ^21b represents an optional substituent containing an aromatic ring. R ^22a represents an alkyl group which may have a substituent, or an aryl group which may have a substituent. n represents an integer of 0 or 1.

The number of carbon atoms in the alkyl group in R ^21a is not particularly limited. From the viewpoint of solubility or sensitivity in a solvent, it is usually 1 or more, preferably 2 or more, and usually 20 or less, preferably 15. below, preferably below 10. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 2-10. Specific examples of the alkyl group include methyl, ethyl, propyl, cyclopentylethyl, and the like. Examples of substituents that the alkyl group may have include: aromatic ring group, hydroxyl group, carboxyl group, halogen atom, amino group, amide group, 4-(2-methoxy-1-methyl)ethoxy-2 -Methylphenyl or N-acetyl-N-acetyloxyamine group, etc. are preferably unsubstituted from the viewpoint of ease of synthesis.

Examples of the aromatic ring group in R ^21a include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. The number of carbon atoms in the aromatic ring group is not particularly limited, but from the viewpoint of solubility in the photosensitive colored resin composition, it is preferably 5 or more. Moreover, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and still more preferably 12 or less. For example, it is 5-30, Preferably it is 5-20, More preferably, it is 5-12.

Specific examples of the aromatic ring group include phenyl, naphthyl, pyridyl, furyl, and the like. Among these, from the viewpoint of developability, phenyl or naphthyl is preferred, and more preferred is phenyl or naphthyl. phenyl. Examples of substituents that the aromatic ring group may have include: hydroxyl group, carboxyl group, halogen atom, amine group, amide group, alkyl group, alkoxy group, a group formed by linking these substituents, etc., in terms of developability From a viewpoint, an alkyl group, an alkoxy group, or a group obtained by linking these is preferable, and a linked alkoxy group is more preferable. Among these, from the viewpoint of sensitivity, R ^21a is preferably an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent.

Moreover, as R ^21b , preferred examples include an optionally substituted carbazolyl group and an optionally substituted 9-oxysulfide group. group or optionally substituted diphenyl sulfide group. Among these, from the viewpoint of sensitivity, an optionally substituted carbazolyl group and an optionally substituted diphenyl sulfide group are preferred, and an optionally substituted carbazolyl group is more preferred.

In addition, the number of carbon atoms in the alkyl group in R ^22a is not particularly limited. From the viewpoint of solubility or sensitivity in a solvent, it is usually 2 or more, preferably 3 or more, and usually 20 or less, preferably 3 or more. Preferably it is 15 or less, more preferably 10 or less, still more preferably 5 or less. For example, it is 2-20, Preferably it is 2-15, More preferably, it is 3-10, Even more preferably, it is 3-5. Specific examples of the alkyl group include acetyl, ethynoyl, propyl, butyl and the like. Examples of substituents that the alkyl group may have include aromatic ring groups, hydroxyl groups, carboxyl groups, halogen atoms, amino groups, amide groups, and the like. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

In addition, the number of carbon atoms of the arylide group in R ^22a is not particularly limited. From the viewpoint of solubility or sensitivity in a solvent, it is usually 7 or more, preferably 8 or more, and usually 20 or less, preferably 8 or more. Preferably it is 15 or less, and even more preferably it is 10 or less. For example, it is 7-20, Preferably it is 7-15, More preferably, it is 8-10. Specific examples of the arylyl group include benzyl group, naphthoyl group, and the like. Examples of substituents that the aryl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, a amide group, an alkyl group, and the like. From the viewpoint of ease of synthesis, unsubstituted groups are preferred. Among these, from the viewpoint of sensitivity, R ^22a is preferably an alkyl group which may have a substituent, more preferably an unsubstituted alkyl group, and still more preferably an acetyl group.

One type of photopolymerization initiator may be used alone, or two or more types may be used in combination. In the photopolymerization initiator, if necessary, a sensitizing pigment and a polymerization accelerator corresponding to the wavelength of the image exposure light source can be blended for the purpose of improving the sensitivity. Examples of sensitizing dyes include those described in Japanese Patent Application Laid-Open No. 4-221958 and Japanese Patent Application Laid-Open No. 4-219756. Pigment, Coumarin pigment having a heterocyclic ring described in Japanese Patent Application Laid-Open No. 3-239703, Japanese Patent Application Laid-Open No. 5-289335, Japanese Patent Application Publication No. 3-239703, Japanese Patent Application Laid-Open No. 5-289335 The 3-ketocoumarin compound described in Japanese Patent Application Publication No. 6-19240, the pyrromethene pigment described in Japanese Patent Application Publication No. 6-19240, and further examples include: Japanese Patent Application Publication No. 47-2528, Japanese Patent Application Publication No. Japanese Patent Publication No. 54-155292, Japanese Patent Publication No. 45-37377, Japanese Patent Publication No. 48-84183, Japanese Patent Publication No. 52-112681, Japanese Patent Publication No. 58-15503 , Japanese Patent Laid-Open No. Sho 60-88005, Japanese Patent Laid-Open No. Sho 59-56403, Japanese Patent Laid-Open No. Hei 2-69, Japanese Patent Laid-Open No. Sho 57-168088, Japanese Patent Laid-Open No. Hei 5- Pigments having a dialkylaminobenzene skeleton described in Japanese Patent Application Laid-Open No. 107761, Japanese Patent Application Laid-Open No. 5-210240, and Japanese Patent Application Publication No. 4-288818.

Among these sensitizing dyes, a sensitizing dye containing an amine group is preferred, and a compound having an amine group and a phenyl group in the same molecule is more preferred. Preferred sensitizing dyes include, for example: 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4- Aminobenzophenone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4-diaminobenzophenone and other benzophenone series Compound; 2-(p-dimethylaminophenyl)benzoethazole, 2-(p-diethylaminophenyl)benzoethazole, 2-(p-dimethylaminophenyl)benzo[4, 5]benzoethazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoethazole, 2,5-bis(p-diethylaminophenyl)-1,3,4 -Ozole, 2-(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2 -(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-Dimethylaminophenyl)pyridine, (p-Dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-Dimethylaminophenyl)pyrimidine, (p-diethylaminophenyl) Aminophenyl) pyrimidine and other compounds containing p-dialkylaminophenyl. Among these, 4,4'-dialkylaminobenzophenone is particularly preferred. In addition, one type of sensitizing dye may be used alone, or two or more types may be used in combination.

Examples of polymerization accelerators used include aromatic amines such as p-dimethylaminoethyl benzoate and 2-dimethylaminoethyl benzoate, and aliphatic amines such as n-butylamine and N-methyldiethanolamine. A polymerization accelerator may be used individually by 1 type, and may be used in combination of 2 or more types.

The content ratio of (B) photopolymerization initiator in the photosensitive colored resin composition of the present invention is not particularly limited. It is usually 0.01 mass % or more in the total solid content of the photosensitive colored resin composition, and is preferably It is 0.1 mass% or more, more preferably 1 mass% or more, further preferably 2 mass% or more, especially 3 mass% or more, and usually 25 mass% or less, preferably 20 mass% or less, more preferably 15 mass % or less, more preferably 10 mass % or less, still more preferably 7 mass % or less, particularly preferably 5 mass % or less. For example, it is 0.01 to 25 mass%, preferably 0.01 to 20 mass%, more preferably 0.1 to 15 mass%, further preferably 1 to 10 mass%, still more preferably 2 to 7 mass%, and particularly preferably 3 ~5% by mass. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residue reduction.

Furthermore, as a compounding ratio of (B) photopolymerization initiator to (A) ethylenically unsaturated compound in the photosensitive colored resin composition, it is preferably: 1 mass part or more, more preferably 5 mass parts or more, further preferably 10 mass parts or more, still more preferably 15 mass parts or more, especially 20 mass parts or more, and preferably 200 mass parts or less, more preferably It is preferably 100 parts by mass or less, more preferably 50 parts by mass or less, and particularly preferably 30 parts by mass or less. For example, it is 1 to 200 parts by mass, preferably 5 to 100 parts by mass, more preferably 10 to 50 parts by mass, further preferably 15 to 30 parts by mass, and particularly preferably 20 to 30 parts by mass. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residue reduction.

Moreover, it is preferable to use a chain transfer agent together with the said photopolymerization initiator. Examples of the chain transfer agent include compounds containing a mercapto group, carbon tetrachloride, and the like. Since the chain transfer effect tends to be high, it is more preferable to use a compound containing a mercapto group. The reason is considered to be that the S-H bonding energy is small and bond breaking is easy to occur, thereby easily causing a hydrogen abstraction reaction or a chain transfer reaction. Effective for sensitivity improvement or surface hardening.

Examples of compounds containing mercapto groups include: 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoethazole, 3-mercapto-1,2,4-triazole, 2-mercapto-4( 3H)-quinazoline, β-mercaptonaphthalene, 1,4-dimethylmercaptobenzene and other mercapto group-containing compounds with aromatic rings; hexanedithiol, decanedithiol, butanediol bis(3-mercapto) propionate), butylene glycol bis(3-mercaptopropionate), ethylene glycol bis(3-mercaptopropionate), ethylene glycol bis(mercaptopropionate), trimethylolpropane tris(3-mercaptopropionate) , Trimethylolpropane Trimercaptoacetate, Trihydroxyethyl Trithiopropionate, Pentaerythritol Tetrakis (3-Mercaptopropionate), Pentaerythritol Tris (3-Mercaptopropionate), Butanediol Bis( 3-Mercaptobutyrate), Ethylene Glycol Bis(3-Mercaptobutyrate), Trimethylolpropane Tris(3-Mercaptobutyrate), Pentaerythritol Tetrakis(3-Mercaptobutyrate), Pentaerythritol Tris( 3-Mercaptobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tris-2,4,6(1H,3H,5H)-trione Such aliphatic compounds containing mercapto groups, especially compounds with multiple mercapto groups, etc.

Among them, among the mercapto group-containing compounds having an aromatic ring, 2-mercaptobenzothiazole and 2-mercaptobenzimidazole are preferred, and among the aliphatic mercapto group-containing compounds, 2-mercaptobenzothiazole and 2-mercaptobenzimidazole are preferred. Trimethylolpropane tris(3-mercaptopropionate), pentaerythritol tetrakis(3-mercaptopropionate), pentaerythritol tris(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate) ), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tris𠯤 -2,4,6(1H,3H,5H)-trione.

In terms of sensitivity, aliphatic mercapto group-containing compounds are preferred, and specifically, trimethylolpropane tris(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptopropionate) are preferred. acid ester), pentaerythritol tris(3-mercaptopropionate), trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate) ), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-tris-2,4,6(1H,3H,5H)-trione, preferably pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate). These may be used individually by 1 type, and may be used in combination of 2 or more types.

Among these, from the viewpoint of increasing the taper angle, one selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoethazole is preferred. Or two or more types are combined with a photopolymerization initiator and used as a photopolymerization initiator system. For example, 2-mercaptobenzothiazole may be used, 2-mercaptobenzimidazole may be used, or 2-mercaptobenzothiazole and 2-mercaptobenzimidazole may be used in combination. Furthermore, from the viewpoint of sensitivity, it is preferable to use one or two or more types selected from the group consisting of pentaerythritol tetrakis (3-mercaptopropionate) and pentaerythritol tetrakis (3-mercaptobutyrate). Furthermore, from the viewpoint of sensitivity, it is preferable to use one or more types selected from the group consisting of 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, and 2-mercaptobenzoethazole in combination. , one or more types selected from the group consisting of pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate), and a photopolymerization initiator.

The content ratio of the chain transfer agent in the photosensitive colored resin composition of the present invention is not particularly limited. It is usually 0.01 mass % or more, preferably 0.1 mass % or more in the total solid content of the photosensitive colored resin composition. , more preferably 0.5 mass% or more, further preferably 0.8 mass% or more, and usually 5 mass% or less, preferably 4 mass% or less, more preferably 3 mass% or less, still more preferably 2 mass% or less. . For example, it is 0.01 to 5 mass%, preferably 0.1 to 4 mass%, more preferably 0.5 to 3 mass%, and still more preferably 0.8 to 2 mass%. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

Furthermore, the content ratio of the chain transfer agent in the photosensitive colored resin composition relative to the (B) photopolymerization initiator is preferably 5 parts by mass or more relative to 100 parts by mass of the (B) photopolymerization initiator. More preferably, it is 10 parts by mass or more, further preferably 15 parts by mass or more, particularly preferably 20 parts by mass or more. Furthermore, it is preferably 500 parts by mass or less, more preferably 300 parts by mass or less, and still more preferably 100 parts by mass. or less, particularly preferably 50 parts by mass or less. For example, it is 5-500 parts by mass, preferably 10-300 parts by mass, more preferably 15-100 parts by mass, and still more preferably 20-50 parts by mass. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

[1-1-3] (C) Component: Alkali-soluble resin The photosensitive colored resin composition of the present invention contains (C) an alkali-soluble resin. In the present invention, (C) the alkali-soluble resin is not particularly limited as long as it can be developed with an alkaline developer. Examples of the alkali-soluble resin include various resins having a carboxyl group or a hydroxyl group. From the viewpoint of excellent developability, those having a carboxyl group are preferred. Moreover, from the viewpoint of improving ink repellency, an alkali-soluble resin having an ethylenically unsaturated group is preferred.

From the viewpoint of ink repellency, the alkali-soluble resin (C) of the photosensitive colored resin composition of the present invention is preferably an acrylic copolymer resin (C11) containing an ethylenically unsaturated group in the side chain (hereinafter, abbreviated In the case of "acrylic copolymer resin (C11)"). On the other hand, from the viewpoint of the linearity of the pattern, it is preferable to contain epoxy (meth)acrylate resin (C12).

Furthermore, from the viewpoint of balancing ink repellency and linearity, it is preferable to include both an acrylic copolymer resin (C11) and an epoxy (meth)acrylate resin (C12) as the (C) alkali-soluble resin. .

First, the acrylic copolymer resin (C11) will be described in detail.

[Acrylic copolymer resin (C11)] The acrylic copolymer resin (C11) has an ethylenically unsaturated group in the side chain. It is considered that by having an ethylenically unsaturated group, photohardening due to exposure occurs and the film becomes stronger. The liquid-repellent agent is less likely to flow out during development, making it easier to express ink-repellent properties.

(Partial structure represented by general formula (I)) The partial structure including a side chain having an ethylenically unsaturated group that the acrylic copolymer resin (C11) has is not particularly limited, but from the viewpoint of the ease of dispersion of free radicals consistent with the flexibility of the film, for example, it is preferable It has a partial structure represented by the following general formula (I).

[Chemicalization 2]

(In formula (I), R ¹ and R ² each independently represent a hydrogen atom or a methyl group. * represents a bond)

Moreover, among the partial structures represented by the above-mentioned formula (I), from the viewpoint of sensitivity or alkaline developability, a partial structure represented by the following general formula (I′) is preferred.

[Chemical 3]

(In formula (I'), R ¹ and R ² each independently represent a hydrogen atom or a methyl group. ^{R X} represents a hydrogen atom or a polybasic acid residue)

The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. One of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or 2 or more types. Among these, from the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and homogeneous acid. Promellitic acid, trimellitic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (I), the content ratio is not particularly limited. It is preferably 10 mol% or more, more preferably 20 mol% or more, still more preferably 30 mol% or more, still more preferably 40 mol% or more, especially 50 mol% or more, and more preferably It is preferably 99 mol% or less, more preferably 95 mol% or less, still more preferably 90 mol% or less, still more preferably 80 mol% or less, and particularly preferably 70 mol% or less. For example, it is 10 to 99 mol%, preferably 20 to 95 mol%, more preferably 30 to 90 mol%, further preferably 40 to 80 mol%, still more preferably 50 to 70 mol%. . By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (I'), the content ratio is not particularly limited, relative to the total molar number of structural units of the acrylic copolymer resin (C11) , preferably 10 mol% or more, more preferably 20 mol% or more, further preferably 30 mol% or more, still more preferably 40 mol% or more, particularly preferably 50 mol% or more, and, It is preferably 99 mol% or less, more preferably 95 mol% or less, still more preferably 90 mol% or less, still more preferably 80 mol% or less, and particularly preferably 70 mol% or less. For example, it is 10 to 99 mol%, preferably 20 to 95 mol%, more preferably 30 to 90 mol%, further preferably 40 to 80 mol%, still more preferably 50 to 70 mol%. . By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

(Partial structure represented by general formula (II)) When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (I), the contained partial structure is not particularly limited. From the viewpoint of development adhesion, for example, it is preferable to further have A partial structure represented by the following general formula (II).

[Chemical 4]

In the above formula (II), R ³ represents a hydrogen atom or a methyl group, and R ⁴ represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent.

(R ⁴ ) In the above formula (II), R ⁴ represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent. Examples of the alkyl group in R ⁴ include linear, branched or cyclic alkyl groups. The number of carbon atoms is preferably 1 or more, more preferably 3 or more, further preferably 5 or more, especially 8 or more, and preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, and further It is better to be below 14, and especially preferably below 12. For example, 1 to 20 is preferred, 1 to 18 is more preferred, 3 to 16 is still more preferred, 5 to 14 is more preferred, and 8 to 12 is particularly preferred. By setting it to the above-mentioned lower limit value or more, there exists a tendency that film strength becomes high and development adhesion improves, and by setting it below the said upper limit value, there exists a tendency for residues to reduce.

Specific examples of the alkyl group include methyl, ethyl, cyclohexyl, dicyclopentyl, dodecyl and the like. Among these, from the viewpoint of developability, dicyclopentyl or dodecyl is preferred, and dicyclopentyl is more preferred. In addition, examples of substituents that the alkyl group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, Carboxyl group, acryl group, methacryl group, etc., from the viewpoint of developability, hydroxyl group and oligoethylene glycol group are preferred.

Examples of the aromatic ring group in R ⁴ include a monovalent aromatic hydrocarbon ring group and a monovalent aromatic heterocyclic group. The carbon number is preferably 6 or more, more preferably 24 or less, more preferably 22 or less, further preferably 20 or less, especially 18 or less. For example, it is 6-24, Preferably it is 6-22, More preferably, it is 6-20, Even more preferably, it is 6-18. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce. The aromatic hydrocarbon ring in the aromatic hydrocarbon ring group can be a single ring or a condensed ring. Examples include: benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, and pyrene ring. , benzopyrene ring, ring, ternaryphenyl ring, acenaphthene ring, fluoranthene ring, fluoranthene ring, etc. In addition, the aromatic heterocyclic ring in the aromatic heterocyclic group may be a single ring or a condensed ring. Examples thereof include: furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrrole ring, etc. Azole ring, imidazole ring, dioxadiazole ring, indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, Furanofuran ring, thienofuran ring, benzisinozole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, pyridine ring, pyrimidine ring, trisulfazone ring, quinoline ring, Isoquinoline ring, zeoline ring, quinoline ring, phenanthridine ring, benzimidazole ring, phenidine ring, quinazoline ring, quinazolinone ring, azulene ring, etc. Among these, from the viewpoint of developability, a benzene ring or a naphthalene ring is preferred, and a benzene ring is more preferred. Examples of substituents that the aromatic ring group may have include methyl, ethyl, propyl, methoxy, ethoxy, chlorine, bromo, fluoro, hydroxyl, amino, and epoxy groups. , oligoethylene glycol group, phenyl group, carboxyl group, etc., from the viewpoint of developability, hydroxyl group and oligoethylene glycol group are preferred.

Examples of the alkenyl group in R ⁴ include linear, branched or cyclic alkenyl groups. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, still more preferably 18 or less, still more preferably 16 or less, and particularly preferably 14 or less. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, Still more preferably, it is 2-16, Even more preferably, it is 2-14. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

In addition, examples of substituents that the alkenyl group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, From the viewpoint of developability, carboxyl groups and the like are preferably hydroxyl groups and oligoglycol groups.

As mentioned above, R ⁴ represents an alkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkenyl group which may have a substituent. Among these, from the viewpoint of developability and film strength, An alkyl group or an alkenyl group is preferred, and an alkyl group is more preferred.

When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (II), the content ratio is not particularly limited. It is preferably 1 mol% or more, more preferably 2 mol% or more, still more preferably 5 mol% or more, still more preferably 10 mol% or more, still more preferably 20 mol% or more, and more preferably It is preferably 70 mol% or less, more preferably 60 mol% or less, still more preferably 50 mol% or less, even more preferably 40 mol% or less. For example, it is 1 to 70 mol%, preferably 2 to 70 mol%, more preferably 5 to 60 mol%, further preferably 10 to 50 mol%, and particularly preferably 20 to 40 mol%. By setting it as above the said lower limit value, adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

(Partial structure represented by general formula (III)) When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (I), as the additional partial structure, from the viewpoint of heat resistance and film strength, it is preferable to include the following general structure: Partial structure represented by formula (III).

[Chemistry 5]

In the above formula (III), R ⁵ represents a hydrogen atom or a methyl group, and R ⁶ represents an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted alkynyl group, a hydroxyl group, a carboxyl group, or a halogen atom. , an alkoxy group which may have a substituent, a thiol group, or an alkylthio group which may have a substituent. t represents an integer from 0 to 5.

(R ⁶ ) In the above formula (III), R ⁶ represents an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, a hydroxyl group, a carboxyl group, a halogen atom, which may have a substituent. an alkoxy group, a thiol group, or an alkylthio group that may have a substituent. Examples of the alkyl group in R ⁶ include linear, branched or cyclic alkyl groups. The carbon number is preferably 1 or more, more preferably 3 or more, still more preferably 5 or more, and preferably 20 or less, more preferably 18 or less, further preferably 16 or less, still more preferably 14 or less, Especially preferably below 12. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 3-16, Even more preferably, it is 5-14. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

Specific examples of the alkyl group include methyl, ethyl, cyclohexyl, dicyclopentyl, dodecyl and the like. Among these, from the viewpoint of developability and film strength, dicyclopentyl or dodecyl is preferred, and dicyclopentyl is more preferred. In addition, examples of substituents that the alkyl group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, Carboxyl group, acryl group, methacryl group, etc., from the viewpoint of developability, hydroxyl group and oligoethylene glycol group are preferred.

Examples of the alkenyl group in R ⁶ include linear, branched or cyclic alkenyl groups. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, still more preferably 18 or less, still more preferably 16 or less, and particularly preferably 14 or less. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, Still more preferably, it is 2-16, Even more preferably, it is 2-14. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

In addition, examples of substituents that the alkenyl group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, From the viewpoint of developability, carboxyl groups and the like are preferably hydroxyl groups and oligoglycol groups.

Examples of the alkynyl group in R ⁶ include linear, branched or cyclic alkynyl groups. The carbon number is 2 or more, preferably 22 or less, more preferably 20 or less, still more preferably 18 or less, still more preferably 16 or less, and particularly preferably 14 or less. For example, it is 2-22, Preferably it is 2-20, More preferably, it is 2-18, Still more preferably, it is 2-16, Even more preferably, it is 2-14. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

In addition, examples of substituents that the alkynyl group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, phenyl group, From the viewpoint of developability, carboxyl groups and the like are preferably hydroxyl groups and oligoglycol groups.

Examples of the halogen atom in R ⁶ include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom is preferred from the viewpoint of ink repellency.

Examples of the alkoxy group in R ⁶ include linear, branched or cyclic alkoxy groups. The carbon number is 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, still more preferably 14 or less, especially 12 or less. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 1-16, Still more preferably, it is 1-14, Even more preferably, it is 1-12. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

In addition, examples of substituents that the alkoxy group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoglycol group, and phenyl group. , carboxyl group, acrylyl group, methacrylyl group, etc., from the viewpoint of developability, hydroxyl group and oligoglycol group are preferred.

Examples of the alkylthio group in R ⁶ include linear, branched or cyclic alkylthio groups. The carbon number is preferably 1 or more, preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, still more preferably 14 or less, and particularly preferably 12 or less. For example, it is 1-20, Preferably it is 1-18, More preferably, it is 1-16, Still more preferably, it is 1-14, Even more preferably, it is 1-12. By setting it as above the said lower limit value, development adhesion tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

In addition, the substituents that the alkyl group in the alkylthio group may have include: methoxy group, ethoxy group, chlorine group, bromo group, fluorine group, hydroxyl group, amino group, epoxy group, oligoethylene glycol group Alcohol group, phenyl group, carboxyl group, acrylic group, methacrylic group, etc., from the viewpoint of developability, hydroxyl group and oligoethylene glycol group are preferred.

As mentioned above, R ⁶ represents an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted alkynyl group, a hydroxyl group, a carboxyl group, a halogen atom, an alkoxy group, a hydroxyalkyl group, or a thiol group, Or an alkylthio group which may have a substituent, among these, from the viewpoint of developability, a hydroxyl group or a carboxyl group is preferred, and a carboxyl group is more preferred.

In the above formula (III), t represents an integer from 0 to 5, and from the viewpoint of ease of production, t is preferably 0.

When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (III), the content ratio is not particularly limited. It is preferably 0.5 mol% or more, more preferably 1 mol% or more, still more preferably 2 mol% or more, and even more preferably 4 mol% or more. Moreover, it is preferably 50 mol% or less, more preferably 30 mol% or less, still more preferably 20 mol% or less, still more preferably 10 mol% or less, and particularly preferably 6 mol% or less. For example, it is 0.5 to 50 mol%, preferably 1 to 30 mol%, more preferably 1 to 20 mol%, still more preferably 2 to 10 mol%, still more preferably 4 to 6 mol%. . When the value is equal to or higher than the above-mentioned lower limit, the uniformity of the film tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, residues tend to be reduced.

(Partial structure represented by general formula (IV)) When the acrylic copolymer resin (C11) has a partial structure represented by the above-mentioned general formula (I), from the viewpoint of developability, it is also preferred that the partial structure contained in addition has the following general formula ( IV) Partial structure represented.

[Chemical 6]

In the above formula (IV), R ⁷ represents a hydrogen atom or a methyl group.

When the acrylic copolymer resin (C11) contains a partial structure represented by the above-mentioned general formula (IV), the content ratio is not particularly limited. It is preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 20 mol% or more, and preferably 80 mol% or less, more preferably 70 mol% or less, and still more preferably Preferably, it is less than 60 mol%. For example, it is 5-80 mol%, preferably 10-70 mol%, more preferably 20-60 mol%. When the value is equal to or higher than the above-mentioned lower limit, residues tend to be reduced, and when the value is equal to or less than the above-mentioned upper limit, the ink repellency tends to be improved.

On the other hand, the acid value of the acrylic copolymer resin (C11) is not particularly limited, but it is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more, still more preferably 30 mgKOH/g or more, still more preferably It is 50 mgKOH/g or more, more preferably 60 mgKOH/g or more, more preferably 150 mgKOH/g or less, more preferably 140 mgKOH/g or less, still more preferably 130 mgKOH/g or less, still more preferably 120 mgKOH/g or less. For example, it is 10 to 150 mgKOH/g, preferably 20 to 140 mgKOH/g, more preferably 30 to 130 mgKOH/g, still more preferably 50 to 120 mgKOH/g, still more preferably 60 to 120 mgKOH/g. . By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for development adhesiveness to improve.

The weight average molecular weight (Mw) of the acrylic copolymer resin (C11) is not particularly limited, but is usually 1,000 or more, preferably 2,000 or more, more preferably 4,000 or more, further preferably 6,000 or more, still more preferably 7,000 or more, In particular, it is preferably 8,000 or more, and usually it is 30,000 or less, preferably 20,000 or less, more preferably 15,000 or less, and still more preferably 10,000 or less. For example, it is 1000-30000, Preferably it is 2000-20000, More preferably, it is 4000-20000, Still more preferably, it is 6000-15000, Still more preferably, it is 7000-15000, Especially preferably, it is 8000-10000. By setting it as above the said lower limit value, development adhesiveness tends to improve, and by setting it as below the said upper limit value, there exists a tendency for residues to reduce.

(C) The content ratio of the acrylic copolymer resin (C11) contained in the alkali-soluble resin is not particularly limited, but is preferably 10 mass% or more, more preferably 30 mass% or more, and further preferably 40 mass% or more, Furthermore, it is more preferably 50 mass % or more, particularly preferably 55 mass % or more, and further preferably 90 mass % or less, more preferably 80 mass % or less, still more preferably 70 mass % or less, especially 65 mass %. the following. For example, it is 10-90 mass %, Preferably it is 30-80 mass %, More preferably, it is 40-80 mass %, Still more preferably, it is 50-70 mass %, Still more preferably, it is 55-65 mass %. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting the value below the upper limit, a high-definition barrier rib with a thin line width tends to be formed.

Moreover, when (C) the alkali-soluble resin contains both the acrylic copolymer resin (C11) and the epoxy (meth)acrylate resin (C12), the content ratio of the acrylic copolymer resin (C11) relative to the acrylic acid The total content ratio of the copolymer resin (C11) and the epoxy (meth)acrylate resin (C12) is preferably 10 mass% or more, more preferably 30 mass% or more, and further preferably 40 mass% or more. Furthermore, it is more preferably 50 mass % or more, particularly preferably 55 mass % or more, and further preferably 90 mass % or less, more preferably 80 mass % or less, further preferably 70 mass % or less, especially 65 mass %. the following. For example, it is 10 to 90 mass%, preferably 30 to 80 mass%, more preferably 40 to 80 mass%, further preferably 50 to 70 mass%, and still more preferably 55 to 65 mass% or more. When the value is equal to or higher than the above lower limit, the ink repellency tends to be improved, and when the value is lower than the above upper limit, the perpendicularity of the barrier rib cross section tends to be improved.

Specific examples of the acrylic copolymer resin (C11) include resins described in Japanese Patent Application Laid-Open No. 8-297366 or Japanese Patent Application Laid-Open No. 2001-89533.

Next, the epoxy (meth)acrylate resin (C12) will be described in detail.

[Epoxy (meth)acrylate resin (C12)] Epoxy (meth)acrylate resin (C12) is made by adding an ethylenically unsaturated monocarboxylic acid or ester compound to an epoxy resin, allowing it to react with a compound containing an isocyanate group, and then reacting with a polybasic acid or its anhydride Resin formed by reaction. For example, the ring-opening addition of the carboxyl group of an unsaturated monocarboxylic acid to the epoxy group of the epoxy resin can be used to add an ethylenically unsaturated bond to the epoxy compound via an ester bond (-COO-). The produced hydroxyl group is added to one of the carboxyl groups of the polybasic acid anhydride. In addition, when adding a polybasic acid anhydride, a polyhydric alcohol may be added at the same time.

Furthermore, the resin obtained by reacting the carboxyl group of the resin obtained by the above reaction with a compound having a reactive functional group is also included in the above-mentioned epoxy (meth)acrylate resin (C12). As mentioned above, epoxy (meth)acrylate resin does not have an epoxy group in its chemical structure and is not limited to "(meth)acrylate". However, since an epoxy compound (epoxy resin) is used as a raw material And "(meth)acrylate" is a representative example, so it is named like this according to convention.

Here, the so-called epoxy resin also includes the raw material compound before forming the resin by thermal hardening, and as the epoxy resin, it can be appropriately selected from among known epoxy resins and used. In addition, a compound obtained by reacting a phenolic compound and an epihalohydrin can be used as the epoxy resin. The phenolic compound is preferably a compound having a divalent or higher phenolic hydroxyl group, and may be a monomer or a polymer. Specific examples include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, and biphenyl novolac epoxy resin. Resin, trisphenol epoxy resin, polymerized epoxy resin of phenol and dicyclopentadiene, dihydroxyalkyleneoxy fluorine type epoxy resin, dihydroxyalkyleneoxy fluorine type epoxy resin, 9,9-bis(4'- Those having an aromatic ring in the main chain, such as the diglycidyl etherate of hydroxyphenyl)furdan and the diglycidyl etherate of 1,1-bis(4'-hydroxyphenyl)adamantane, can be preferably used.

Among them, from the viewpoint of higher cured film strength, bisphenol A epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, and polymerized epoxy of phenol and dicyclopentadiene are preferred. Resin, 9,9-bis(4'-hydroxyphenyl)diglycidyl etherate, etc., especially bisphenol A epoxy resin. As a specific example of the epoxy resin, bisphenol A type epoxy resin (for example, "jER (registered trademark, the same below) 828", "jER1001", "jER1002" manufactured by Mitsubishi Chemical Corporation) can be preferably used, for example. "jER1004", "NER-1302" manufactured by Nippon Chemical Company (epoxy equivalent 323, softening point 76°C), etc.), bisphenol F-type resin (for example, "jER807", "jER4004P" manufactured by Mitsubishi Chemical Corporation, "jER4005P", "jER4007P", "NER-7406" manufactured by Nippon Chemical Co., Ltd. (epoxy equivalent 350, softening point 66°C), etc.), bisphenol S-type epoxy resin, biphenyl glycidyl ether (for example, Mitsubishi "jERYX-4000" manufactured by a chemical company), phenol novolak type epoxy resin (for example, "EPPN (registered trademark, the same below)-201" manufactured by Nippon Chemical Company, "jER152" manufactured by Mitsubishi Chemical Corporation, " jER154", "DEN-438" manufactured by Dow Chemical Co., Ltd.), (o-, m-, p-) cresol novolak type epoxy resin (for example, "EOCN (registered trademark, the same below)-102S manufactured by Nippon Chemical Co., Ltd. ", "EOCN-1020", "EOCN-104S"), triglycidyl isocyanurate (for example, "TEPIC (registered trademark)" manufactured by Nissan Chemical Co., Ltd.), trisphenolmethane type epoxy resin (for example, Japan "EPPN-501", "EPPN-502", "EPPN-503" manufactured by chemical companies), alicyclic epoxy resin ("Celloxide (registered trademark, the same below) 2021P" manufactured by Daicel Corporation, "Celloxide EHPE" ”), epoxy resin produced by glycidylizing a phenol resin obtained by the reaction of dicyclopentadiene and phenol (for example, “EXA-7200” manufactured by DIC Corporation, “NC” manufactured by Nippon Kayaku Co., Ltd. -7300"), epoxy resins represented by the following general formulas (i-11) to (i-14), etc. Specifically, as the epoxy resin represented by the following general formula (i-11), "XD-1000" manufactured by Nippon Kayaku Co., Ltd. can be cited, and as the epoxy resin represented by the following general formula (i-12) Examples of the resin include "NC-3000" manufactured by Nippon Kayaku Co., Ltd., and examples of the epoxy resin represented by the following general formula (i-14) include "ESF-300" manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd.

[Chemical 7]

In the above general formula (i-11), n is an average value and represents a number from 0 to 10. R ¹¹¹ each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. In addition, the plurality of R ¹¹¹ present in one molecule may be the same or different.

[Chemical 8]

In the above general formula (i-12), n is an average value and represents a number from 0 to 10. R ¹²¹ each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group, or a biphenyl group. Furthermore, the plurality of R ¹²¹ present in one molecule may be the same or different.

[Chemical 9]

In the above general formula (i-13), X represents a linking group represented by the following general formula (i-13-1) or (i-13-2). Among them, the molecular structure contains more than one adamantane structure. c means 2 or 3.

[Chemical 10]

In the above general formulas (i-13-1) and (i-13-2), R ¹³¹ to R ¹³⁴ and R ¹³⁵ to R ¹³⁷ each independently represent an adamantyl group which may have a substituent, a hydrogen atom, or an adamantyl group which may have a substituent. The substituent is an alkyl group having 1 to 12 carbon atoms, or a phenyl group which may have a substituent. ＊indicates a bonded key.

[Chemical 11]

In the general formula (i-14), p and q each independently represent an integer of 0 to 4, and R ¹⁴¹ and R ¹⁴² each independently represent an alkyl group or a halogen atom having 1 to 4 carbon atoms. R ¹⁴³ and R ¹⁴⁴ each independently represent an alkylene group having 1 to 4 carbon atoms. x and y each independently represent an integer above 0.

Among these, it is preferable to use an epoxy resin represented by any one of general formulas (i-11) to (i-14).

Examples of ethylenically unsaturated monocarboxylic acids include (meth)acrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid, etc., and pentaerythritol tris(methyl )Acrylate succinic anhydride adduct, pentaerythritol tri(meth)acrylate tetrahydrophthalic anhydride adduct, dipentaerythritol penta(meth)acrylate succinic anhydride adduct, dipentaerythritol penta(meth)acrylate Acrylate phthalic anhydride adduct, dipentaerythritol penta(meth)acrylate tetrahydrophthalic anhydride adduct, reaction product of (meth)acrylic acid and ε-caprolactone, etc. Among them, (meth)acrylic acid is preferred from the viewpoint of sensitivity.

Examples of the polybasic acid (anhydride) include succinic acid, maleic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, 3-methyltetrahydrophthalic acid, 4-methyl ethyltetrahydrophthalic acid, 3-ethyltetrahydrophthalic acid, 4-ethyltetrahydrophthalic acid, hexahydrophthalic acid, 3-methylhexahydrophthalic acid, 4- Methylhexahydrophthalic acid, 3-ethylhexahydrophthalic acid, 4-ethylhexahydrophthalic acid, trimellitic acid, pyromellitic acid, benzophenone tetracarboxylic acid, Phenyltetracarboxylic acid, and its anhydrides, etc. Among them, from the viewpoint of outgassing, succinic anhydride, maleic anhydride, tetrahydrophthalic anhydride, or hexahydrophthalic anhydride is preferred, and succinic anhydride or tetrahydrophthalic anhydride is more preferred. Formic anhydride.

By using polyol, the molecular weight of the epoxy (meth)acrylate resin (C12) tends to be increased, and branches can be introduced into the molecule to achieve a balance between molecular weight and viscosity. In addition, there is a tendency to increase the introduction rate of acid groups in the molecule, making it easier to achieve a balance of sensitivity, adhesion, etc. As the polyhydric alcohol, for example, one selected from trimethylolpropane, di-trimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, and 1,2,3-glycerol, or 2 or more types of polyols.

Examples of epoxy (meth)acrylate resins other than those described above include those described in Korean Patent Publication No. 10-2013-0022955.

The acid value of the epoxy (meth)acrylate resin (C12) is not particularly limited, but is preferably 10 mgKOH/g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, and more preferably It is preferably 70 mgKOH/g or more, particularly preferably 80 mgKOH/g or more, and preferably 200 mgKOH/g or less, more preferably 180 mgKOH/g or less, still more preferably 150 mgKOH/g or less, still more preferably It is 120 mgKOH/g or less, especially 110 mgKOH/g or less. For example, it is 10 to 200 mgKOH/g, preferably 30 to 180 mgKOH/g, more preferably 50 to 150 mgKOH/g, still more preferably 70 to 120 mgKOH/g, still more preferably 80 to 110 mgKOH/g. . By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve.

The weight average molecular weight (Mw) of the epoxy (meth)acrylate resin (C12) is not particularly limited, but is usually 1,000 or more, preferably 2,000 or more, more preferably 3,000 or more, further preferably 4,000 or more, and particularly preferably It is 5000 or more, and usually it is 30000 or less, Preferably it is 20000 or less, More preferably, it is 15000 or less, More preferably, it is 10000 or less, Especially preferably, it is 8000 or less. For example, it is 1000-30000, Preferably it is 2000-20000, More preferably, it is 3000-15000, More preferably, it is 4000-10000, Especially preferably, it is 5000-8000. When the value is equal to or above the lower limit, the film strength tends to be improved, and when the value is equal to or less than the upper limit, the residue tends to be reduced.

When (C) alkali-soluble resin contains epoxy (meth)acrylate resin (C12), the content ratio is not particularly limited. In (C) alkali-soluble resin, it is preferably 10 mass % or more, more preferably It is preferably 20 mass% or more, more preferably 30 mass% or more, still more preferably 35 mass% or more, especially 40 mass% or more, most preferably 50 mass% or more, and more preferably 90 mass% or less. , more preferably 70 mass% or less, further preferably 60 mass% or less. For example, it is 10 to 90 mass %, preferably 20 to 90 mass %, more preferably 30 to 70 mass %, still more preferably 35 to 70 mass %, still more preferably 40 to 60 mass %, especially 50 ~60% by mass. By setting the value above the lower limit, linearity tends to be improved, and by setting it below the upper limit, there is a tendency to form high-definition barrier ribs with thin line widths.

Epoxy (meth)acrylate resin (C12) can be synthesized by previously known methods. Specifically, the following method can be used: the above-mentioned epoxy resin is dissolved in an organic solvent, and the above-mentioned acid or ester compound having an ethylenically unsaturated bond is added in the coexistence of a catalyst and a thermal polymerization inhibitor to perform an addition reaction, and then Add polybasic acid or its anhydride to continue the reaction. For example, methods described in Japanese Patent No. 3938375 and Japanese Patent No. 5169422 can be cited.

Examples of the organic solvent used in the reaction include one or more organic solvents such as methyl ethyl ketone, cyclohexanone, diethylene glycol ether acetate, and propylene glycol monomethyl ether acetate. . Examples of the catalyst include tertiary amines such as triethylamine, benzyldimethylamine, and tribenzylamine, tetramethylammonium chloride, methyltriethylammonium chloride, and or 2 or more types. Furthermore, examples of the thermal polymerization inhibitor include one or more types of hydroquinone, hydroquinone monomethyl ether, methyl hydroquinone, and the like.

Furthermore, the acid or ester compound having an ethylenically unsaturated bond can be used in an amount of 1 chemical equivalent relative to the epoxy group of the epoxy resin, usually 0.7 to 1.3 chemical equivalents, preferably 0.9 to 1.1 chemical equivalents. . In addition, the temperature during the addition reaction can be generally 60 to 150°C, preferably 80 to 120°C. Furthermore, the usage amount of the polybasic acid (anhydride) can be set to an amount of usually 0.1 to 1.2 chemical equivalents, preferably 0.2 to 1.1 chemical equivalents relative to 1 chemical equivalent of the hydroxyl group produced in the above addition reaction.

Among the epoxy (meth)acrylate resin (C12), from the viewpoint of film strength or linearity, it is preferable to include an epoxy (meth)acrylate resin selected from the group consisting of epoxy (meth)acrylate resins (C12) having a partial structure represented by the following general formula (i). methyl) acrylate resin, an epoxy (meth)acrylate resin having a partial structure represented by the following general formula (ii), and an epoxy (meth)acrylate resin having a partial structure represented by the following general formula (iii) ) at least one of the group consisting of acrylic resins.

[Chemical 12]

In formula (i), R ^a represents a hydrogen atom or a methyl group, and R ^b represents a divalent hydrocarbon group which may have a substituent. The benzene ring in formula (i) may be further substituted by any substituent. ＊indicates a bonded key.

[Chemical 13]

In formula (ii), R ^c each independently represents a hydrogen atom or a methyl group. R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. ＊indicates a bonded key.

[Chemical 14]

In formula (iii), R ^e represents a hydrogen atom or a methyl group, and γ represents a single bond, -CO-, an alkylene group which may have a substituent, or a divalent cyclic hydrocarbon group which may have a substituent. The benzene ring in formula (iii) may be further substituted by any substituent. ＊indicates a bonded key.

Among them, first, an epoxy (meth)acrylate resin (hereinafter, referred to as "epoxy (meth)acrylate resin (C12-1)") having a partial structure represented by the following general formula (i) )" will be described in detail.

[Chemical 15]

In formula (i), R ^a represents a hydrogen atom or a methyl group, and R ^b represents a divalent hydrocarbon group which may have a substituent. The benzene ring in formula (i) may be further substituted by any substituent. ＊indicates a bonded key.

(R ^b ) In the above formula (i), R ^b represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include: divalent aliphatic groups, divalent aromatic ring groups, and combinations of one or more divalent aliphatic groups and one or more divalent aromatic ring groups. base.

Examples of the divalent aliphatic group include linear, branched, and cyclic ones. Among these, linear ones are preferred from the viewpoint of development solubility, and cyclic ones are preferred from the viewpoint of reduced penetration of the developer solution into the exposed portion. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 1-20, Preferably it is 3-15, More preferably, it is 6-10. When the value is equal to or higher than the above-mentioned lower limit, the film strength tends to be improved, and when the value is below the above-mentioned upper limit, the ink repellency tends to be improved.

Specific examples of the divalent linear aliphatic group include methylene, ethylene, n-propyl, n-butyl, n-hexyl, n-heptyl, and the like. Among these, methylene is preferred from the viewpoint of ink repellency and production cost. Specific examples of the divalent branched aliphatic group include methyl, ethyl, n-propyl, isopropyl, n-butyl, and isobutyl. , second butyl group, third butyl group, etc. as side chain structures. The number of rings contained in the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbivalent alkane ring, an isobivalent alkane ring, and an adamantane ring. A base formed by removing two hydrogen atoms from a ring such as a cyclododecane ring or a cyclododecane ring. Among these, from the viewpoint of film strength and developability, a group obtained by removing two hydrogen atoms from an adamantane ring is preferred.

Examples of substituents that the divalent aliphatic group may have include alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; carboxyl groups; and the like. Among these, from the viewpoint of ease of synthesis, unsubstituted is preferred.

Examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 4-20, Preferably it is 5-15, More preferably, it is 6-10. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring, which have two free atomic valences. Ring, triphenylene ring, acenaphthene ring, fluoranthene ring, fluoranthene ring and other bases.

In addition, the aromatic heterocyclic ring in the aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, and dioxadiazole ring having two free atom valences. , indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furanofuran ring, thienofuran ring, Benzisozole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, pyridine ring, pyrimidine ring, trisulfonate ring, quinoline ring, isoquinoline ring, pyridine ring, quinine ring Zyline ring, phenanthridine ring, phenidine ring, quinazoline ring, quinazolinone ring, azulene ring and other bases. Among them, from the viewpoint of production cost, a benzene ring or a naphthalene ring having a valency of two free atoms is preferred, and a benzene ring having a valency of two free atoms is more preferred.

Examples of substituents that the divalent aromatic ring group may have include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy, and the like. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

Furthermore, examples of the group formed by connecting one or more divalent aliphatic groups and one or more divalent aromatic ring groups include connecting one or more of the above-mentioned divalent aliphatic groups and one or more divalent aromatic ring groups. A base formed from the above-mentioned divalent aromatic ring group. The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve. The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are connected include groups represented by the following formulas (i-A) to (i-F), and the like. Among these, the group represented by the following formula (i-A) is preferred from the viewpoint of rigidity of the skeleton and hydrophobization of the membrane.

[Chemical 16]

As mentioned above, the benzene ring in formula (i) may be further substituted by any substituent. Examples of substituents allowed by the benzene ring in formula (i) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy, and the like. The number of substituents is not particularly limited and may be 1 or 2 or more. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

Furthermore, from the viewpoint of development solubility, the partial structure represented by the above formula (i) is preferably a partial structure represented by the following formula (i-1).

[Chemical 17]

In the formula (i-1), R ^a and R ^b are synonymous with those of the above formula (i). R ^Y represents a hydrogen atom or a polybasic acid residue. ＊indicates a bonded key. The benzene ring in formula (i-1) may be further substituted by any substituent.

The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. One of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or 2 or more types. Among these, from the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and homogeneous acid. Promellitic acid, trimellitic acid, biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid, biphenyltetracarboxylic acid.

There may be one type of repeating unit structure represented by the above-mentioned formula (i-1) contained in one molecule of epoxy (meth)acrylate resin (C12-1), or two or more types.

Furthermore, the number of partial structures represented by the above formula (i) contained in one molecule of epoxy (meth)acrylate resin (C12-1) is not particularly limited, but is preferably 1 or more, and more preferably 2 or more. , more preferably 3 or more, more preferably 10 or less, still more preferably 8 or less. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-8. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve.

Furthermore, the number of partial structures represented by the above formula (i-1) contained in one molecule of epoxy (meth)acrylate resin (C12-1) is not particularly limited, but is preferably 1 or more, more preferably 2 or more, more preferably 3 or more, more preferably 10 or less, further preferably 8 or less. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-8. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve.

Specific examples of epoxy (meth)acrylate resin (C12-1) are listed below.

[Chemical 18]

[Chemical 19]

[Chemistry 20]

[Chemistry 21]

[Chemistry 22]

[Chemistry 23]

[Chemistry 24]

Next, there is a case where an epoxy (meth)acrylate resin (hereinafter, referred to as "epoxy (meth)acrylate resin (C12-2)") has a partial structure represented by the following general formula (ii) ) for details.

[Chemical 25]

In formula (ii), R ^c each independently represents a hydrogen atom or a methyl group. R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. ＊indicates a bonded key.

(R ^d ) In the above formula (ii), R ^d represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain. Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

The number of rings the aliphatic cyclic group has is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. When the value is equal to or higher than the above-mentioned lower limit, the film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, the developability tends to be improved. Furthermore, the number of carbon atoms in the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. For example, it is 4-40, Preferably it is 4-30, More preferably, it is 6-20, Even more preferably, it is 8-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbisine ring, an isobisine ring, and an adamantane ring. ring, cyclododecane ring, etc. Among these, an adamantane ring is preferable from the viewpoint of film strength and developability.

On the other hand, the number of rings in the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and is usually 10 or less, preferably 5 or less, and more The best value is below 4. For example, it is 1-10, Preferably it is 2-5, More preferably, it is 3-4. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Examples of the aromatic ring group include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. Furthermore, the number of carbon atoms in the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, still more preferably 10 or more, especially 12 or more, and preferably 40 or less, more preferably 30 or less, more preferably 20 or less, particularly preferably 15 or less. For example, it is 4-40, Preferably it is 6-40, More preferably, it is 8-30, Still more preferably, it is 10-20, Even more preferably, it is 12-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the aromatic ring in the aromatic ring group include: benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring, ring, ternaryphenyl ring, acenaphthene ring, fluoranthene ring, fluoranthene ring, etc. Among them, from the viewpoint of patterning characteristics, the ring is preferable.

In addition, the divalent hydrocarbon group among the divalent hydrocarbon groups having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include divalent aliphatic groups, divalent aromatic ring groups, and divalent hydrocarbon groups connecting one or more A group consisting of an aliphatic group and one or more divalent aromatic ring groups.

Examples of the divalent aliphatic group include linear, branched, and cyclic ones. Among these, from the viewpoint of improvement in developability, a linear one is preferable, and on the other hand, from a viewpoint of film strength, a cyclic one is preferable. The carbon number is usually 1 or more, preferably 3 or more, more preferably 6 or more, and preferably 25 or less, more preferably 20 or less, still more preferably 15 or less. For example, it is 1-25, Preferably it is 3-20, More preferably, it is 6-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the divalent linear aliphatic group include methylene, ethylene, n-propyl, n-butyl, n-hexyl, n-heptyl, and the like. Among these, from the viewpoint of ink repellency, methylene is preferred. Specific examples of the divalent branched aliphatic group include methyl, ethyl, n-propyl, isopropyl, n-butyl, and isobutyl on the above-mentioned divalent linear aliphatic group. , second butyl group, third butyl group, etc. as side chain structures.

The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the divalent cyclic aliphatic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbivalent alkane ring, an isobivalent alkane ring, and an adamantane ring. , cyclododecane ring and other rings, which are formed by removing two hydrogen atoms. Among these, from the viewpoint of film strength, a group obtained by removing two hydrogen atoms from an adamantane ring is preferred.

Examples of substituents that the divalent aliphatic group may have include alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; carboxyl groups; and the like. Among these, from the viewpoint of ease of synthesis, unsubstituted is preferred.

Examples of the divalent aromatic ring group include a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group. The carbon number is usually 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 30 or less, more preferably 20 or less, and still more preferably 15 or less. For example, it is 4-30, Preferably it is 5-20, More preferably, it is 6-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a single ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, perylene ring, condensed tetraphenyl ring, pyrene ring, benzopyrene ring, which have two free atomic valences. Ring, triphenylene ring, acenaphthene ring, fluoranthene ring, fluoranthene ring and other bases.

In addition, the aromatic heterocyclic ring in the divalent aromatic heterocyclic group may be a single ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include furan ring, benzofuran ring, thiophene ring, benzothiophene ring, pyrrole ring, pyrazole ring, imidazole ring, and dioxadiazole ring having two free atom valences. , indole ring, carbazole ring, pyrroloimidazole ring, pyrrolopyrazole ring, pyrrolopyrrole ring, thienopyrrole ring, thienothiophene ring, furopyrrole ring, furanofuran ring, thienofuran ring, Benzisozole ring, benzisothiazole ring, benzimidazole ring, pyridine ring, pyridine ring, pyridine ring, pyrimidine ring, trisulfonate ring, quinoline ring, isoquinoline ring, pyridine ring, quinine ring Zyline ring, phenanthridine ring, phenidine ring, quinazoline ring, quinazolinone ring, azulene ring and other bases. Among them, from the viewpoint of production cost, a benzene ring or a naphthalene ring having a valency of two free atoms is preferred, and a benzene ring having a valency of two free atoms is more preferred.

Examples of substituents that the divalent aromatic ring group may have include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy, and the like. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

Furthermore, examples of the group formed by connecting one or more divalent aliphatic groups and one or more divalent aromatic ring groups include connecting one or more of the above-mentioned divalent aliphatic groups and one or more divalent aromatic ring groups. A base formed from the above-mentioned divalent aromatic ring group. The number of divalent aliphatic groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve. The number of divalent aromatic ring groups is not particularly limited, but is usually 1 or more, preferably 2 or more, and usually 10 or less, preferably 5 or less, and more preferably 3 or less. For example, it is 1-10, Preferably it is 1-5, More preferably, it is 2-3. When the value is equal to or higher than the above-mentioned lower limit, the film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, the developability tends to be improved.

Specific examples of the group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are connected include groups represented by the above formulas (i-A) to (i-F), and the like. Among these, from the viewpoint of balancing film strength and ink repellency, the group represented by the above formula (i-C) is preferred.

The bonding form between the cyclic hydrocarbon group as the side chain and the divalent hydrocarbon group is not particularly limited. For example, one hydrogen atom of an aliphatic group or aromatic cyclic group is replaced by a cyclic hydrocarbon group as a side chain. or a cyclic hydrocarbon group including one carbon atom of the aliphatic group as a side chain.

Furthermore, from the viewpoint of ink repellency, the partial structure represented by the above formula (ii) is preferably a partial structure represented by the following formula (ii-1).

[Chemical 26]

In formula (ii-1), R ^c is synonymous with the above formula (ii). R ^α represents a monovalent cyclic hydrocarbon group which may have a substituent. n is an integer above 1. ＊indicates a bonded key. The benzene ring in formula (ii-1) may be further substituted by any substituent.

(R ^α ) In the above formula (ii-1), R ^α represents a monovalent cyclic hydrocarbon group which may have a substituent. Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

The number of rings included in the aliphatic cyclic group is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 6 or less, preferably 4 or less, and more preferably 3 or less. For example, it is 1-6, Preferably it is 1-4, More preferably, it is 2-3. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. In addition, the number of carbon atoms in the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. For example, it is 4-40, Preferably it is 4-30, More preferably, it is 6-20, Even more preferably, it is 8-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbisine ring, an isobisine ring, and an adamantane ring. ring, cyclododecane ring, etc. Among these, an adamantane ring is preferable from the viewpoint of balancing film strength and developability.

On the other hand, the number of rings included in the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Examples of the aromatic ring group include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. Moreover, the number of carbon atoms in the aromatic ring group is usually 4 or more, preferably 5 or more, more preferably 6 or more, and preferably 30 or less, more preferably 20 or less, and still more preferably 15 or less. For example, it is 4-30, Preferably it is 5-20, More preferably, it is 6-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorine ring, and the like. Among these, from the viewpoint of balancing film strength and developability, fluorine is preferred.

Examples of substituents that the cyclic hydrocarbon group may have include: hydroxyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, pentyl, isopentyl, etc. Alkyl groups with 1 to 5 carbon atoms; alkoxy groups with 1 to 5 carbon atoms such as methoxy and ethoxy groups; nitro group; cyano group; carboxyl group, etc. Among these, from the viewpoint of ease of synthesis, unsubstituted is preferred.

n represents an integer of 1 or more, preferably 2 or more, and preferably 3 or less. For example, it is 1-3, Preferably it is 2-3. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for film strength to improve.

Among these, from the viewpoint of balancing film strength and developability, R ^α is preferably a monovalent aliphatic cyclic group, and more preferably an adamantyl group.

As mentioned above, the benzene ring in formula (ii-1) may be further substituted by any substituent. Examples of substituents allowed by the benzene ring in formula (ii-1) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy, and the like. The number of substituents is not particularly limited and may be 1 or 2 or more. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

Specific examples of the partial structure represented by the above formula (ii-1) are listed below.

[Chemical 27]

[Chemical 28]

[Chemical 29]

[Chemical 30]

[Chemical 31]

Moreover, from the viewpoint of development adhesion, the partial structure represented by the above formula (ii) is preferably a partial structure represented by the following formula (ii-2).

[Chemical 32]

In formula (ii-2), R ^c is synonymous with the above formula (ii). ^Rβ represents a divalent cyclic hydrocarbon group which may have a substituent. ＊indicates a bonded key. The benzene ring in formula (ii-2) may be further substituted by any substituent.

(R ^β ) In the above formula (ii-2), R ^β represents a divalent cyclic hydrocarbon group which may have a substituent. Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

The number of rings the aliphatic cyclic group has is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Moreover, the carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 35 or less, still more preferably 30 or less. For example, it is 4-40, Preferably it is 6-35, More preferably, it is 8-30. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbisine ring, an isobisine ring, and an adamantane ring. ring, cyclododecane ring, etc. Among these, an adamantane ring is preferable from the viewpoint of balancing film strength and developability.

On the other hand, the number of rings included in the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Examples of the aromatic ring group include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. Moreover, the carbon number of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, further preferably 10 or more, and preferably 40 or less, more preferably 30 or less, still more preferably It is below 20, preferably below 15. For example, it is 4-40, Preferably it is 6-30, More preferably, it is 8-20, Even more preferably, it is 10-15. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorine ring, and the like. Among these, from the viewpoint of film strength and developability, fluorine is preferred.

Examples of substituents that the cyclic hydrocarbon group may have include: hydroxyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, pentyl, isopentyl, etc. Alkyl groups with 1 to 5 carbon atoms; alkoxy groups with 1 to 5 carbon atoms such as methoxy and ethoxy groups; nitro group; cyano group; carboxyl group, etc. Among these, from the viewpoint of simplicity of synthesis, unsubstituted is preferred.

Among them, from the viewpoint of balancing film strength and developability, ^Rβ is preferably a divalent aliphatic ring group, and more preferably a divalent adamantane ring group. On the other hand, from the viewpoint of balancing film strength and developability, ^Rβ is preferably a divalent aromatic ring group, more preferably a divalent fluorocyclic group.

As mentioned above, the benzene ring in formula (ii-2) may be further substituted by any substituent. Examples of substituents allowed by the benzene ring in formula (ii-2) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy, and the like. The number of substituents is not particularly limited and may be 1 or 2 or more. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

Specific examples of the partial structure represented by the above formula (ii-2) are listed below.

[Chemical 33]

[Chemical 34]

[Chemical 35]

[Chemical 36]

On the other hand, from the viewpoint of developability, the partial structure represented by the above formula (ii) is preferably a partial structure represented by the following formula (ii-3).

[Chemical 37]

In formula (ii-3), R ^c and R ^d are synonymous with the above formula (ii). R ^Z represents a hydrogen atom or a polybasic acid residue.

The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. One of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or 2 or more types. Among these, from the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and homogeneous acid. Promellitic acid, trimellitic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

The partial structure represented by the above-mentioned formula (ii-3) contained in one molecule of epoxy (meth)acrylate resin (C12-2) may be one type or two or more types.

Furthermore, the number of partial structures represented by the above formula (ii) contained in one molecule of epoxy (meth)acrylate resin (C12-2) is not particularly limited, but is preferably 1 or more, and more preferably 3 or more. , and it is preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Furthermore, the number of partial structures represented by the above formula (ii-1) contained in one molecule of epoxy (meth)acrylate resin (C12-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Furthermore, the number of partial structures represented by the above formula (ii-2) contained in one molecule of epoxy (meth)acrylate resin (C12-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Furthermore, the number of partial structures represented by the above formula (ii-3) contained in one molecule of epoxy (meth)acrylate resin (C12-2) is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and preferably 20 or less, more preferably 15 or less, still more preferably 10 or less. For example, it is 1-20, Preferably it is 1-15, More preferably, it is 3-10. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Next, there is a case where an epoxy (meth)acrylate resin (hereinafter, referred to as "epoxy (meth)acrylate resin (C12-3)") has a partial structure represented by the following general formula (iii) ) for details.

[Chemical 38]

In formula (iii), R ^e represents a hydrogen atom or a methyl group, and γ represents a single bond, -CO-, an alkylene group which may have a substituent, or a divalent cyclic hydrocarbon group which may have a substituent. The benzene ring in formula (iii) may be further substituted by any substituent. ＊indicates a bonded key.

(γ) In the above formula (iii), γ represents a single bond, -CO-, an alkylene group which may have a substituent, or a divalent cyclic hydrocarbon group which may have a substituent.

The alkylene group may be a straight chain or a branched chain. From the viewpoint of development solubility, a straight chain is preferred, and from the viewpoint of development adhesion, a branched chain is preferred. The number of carbon atoms is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 6 or less, preferably 4 or less. For example, it is 1-6, Preferably it is 2-4. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved.

Specific examples of the alkylene group include methylene, ethylene, propylene, butylene, hexylene, and heptylene. From the viewpoint of balancing film strength and developability, preferred ones are Ethyl or propylene, more preferably propylene.

Examples of substituents that the alkylene group may have include alkoxy groups having 1 to 5 carbon atoms such as methoxy and ethoxy groups; hydroxyl; nitro; cyano group; carboxyl group; and the like. Among these, from the viewpoint of ease of synthesis, unsubstituted is preferred.

Examples of the divalent cyclic hydrocarbon group include a divalent aliphatic ring group or a divalent aromatic ring group.

The number of rings the aliphatic cyclic group has is not particularly limited, but is usually 1 or more, preferably 2 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Moreover, the carbon number of the aliphatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, and preferably 40 or less, more preferably 35 or less, still more preferably 30 or less. For example, it is 4-40, Preferably it is 6-35, More preferably, it is 8-30. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Specific examples of the aliphatic ring in the aliphatic ring group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbisine ring, an isobisine ring, and an adamantane ring. ring, cyclododecane ring, etc. Among these, an adamantane ring is preferable from the viewpoint of balancing film strength and developability.

On the other hand, the number of rings included in the aromatic ring group is not particularly limited, but is usually 1 or more, preferably 2 or more, more preferably 3 or more, and is usually 10 or less, preferably 5 or less. For example, it is 1-10, Preferably it is 2-10, More preferably, it is 3-5. When the value is equal to or greater than the above-mentioned lower limit, film strength tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, developability tends to be improved. Examples of the aromatic ring group include aromatic hydrocarbon ring groups and aromatic heterocyclic groups. Moreover, the carbon number of the aromatic ring group is usually 4 or more, preferably 6 or more, more preferably 8 or more, further preferably 10 or more, and preferably 40 or less, more preferably 30 or less, still more preferably It is below 20, preferably below 15. For example, when the value is equal to or higher than the lower limit, film strength tends to be improved, and when the value is equal to or lower than the upper limit, developability tends to be improved. For example, it is 4-40, Preferably it is 6-30, More preferably, it is 8-20, Even more preferably, it is 10-15. Specific examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorine ring, and the like. Among these, from the viewpoint of balancing film strength and developability, fluorine is preferred.

Examples of substituents that the cyclic hydrocarbon group may have include: hydroxyl, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, third butyl, pentyl, isopentyl, etc. Alkyl groups with 1 to 5 carbon atoms; alkoxy groups with 1 to 5 carbon atoms such as methoxy and ethoxy groups; nitro group; cyano group; carboxyl group, etc. Among these, from the viewpoint of simplicity of synthesis, unsubstituted is preferred.

Moreover, among these, from the viewpoint of developability, γ is preferably an alkylene group which may have a substituent, and more preferably is a dimethylmethylene group.

As mentioned above, the benzene ring in formula (iii) may be further substituted by any substituent. Examples of substituents allowed by the benzene ring in formula (iii) include hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy and the like. The number of substituents is not particularly limited and may be 1 or 2 or more. Among these, from the viewpoint of hardening properties, unsubstituted is preferred.

On the other hand, from the viewpoint of development solubility, the partial structure represented by the above formula (iii) is preferably a partial structure represented by the following formula (iii-1).

[Chemical 39]

In formula (iii-1), R ^e and γ are synonymous with the above formula (iii). R ^W represents a hydrogen atom or a polybasic acid residue. ＊indicates a bonded key. The benzene ring in formula (iii-1) may be further substituted by any substituent.

The polybasic acid residue means a monovalent group obtained by removing one OH group from a polybasic acid or its anhydride. Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, and trimellitic acid. One of benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorobacteric acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid Or 2 or more types. Among these, from the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and homogeneous acid. Promellitic acid, trimellitic acid and biphenyltetracarboxylic acid, more preferably tetrahydrophthalic acid and biphenyltetracarboxylic acid.

Furthermore, the number of repeating unit structures represented by the above formula (iii) contained in one molecule of epoxy (meth)acrylate resin (C12-3) is not particularly limited, but is preferably 1 or more, and more preferably 5. or more, more preferably 10 or more, and more preferably 18 or less, still more preferably 15 or less. For example, it is 1-18, Preferably it is 5-18, More preferably, it is 10-15. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Furthermore, the number of repeating unit structures represented by the above formula (iii-1) contained in one molecule of epoxy (meth)acrylate resin (C12-3) is not particularly limited, but is preferably 1 or more, more preferably It is 3 or more, and it is more preferable that it is 5 or more, and it is more preferable that it is 18 or less, and it is further more preferable that it is 15 or less. For example, it is 1-18, Preferably it is 3-18, More preferably, it is 5-15. By setting it as above the said lower limit value, the ink repellency tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the developability to improve.

Specific examples of epoxy (meth)acrylate resin (C12-3) are listed below.

[Chemical 40]

[Chemical 41]

As described above, the alkali-soluble resin (C) in the present invention may include other alkali-soluble resins in addition to the acrylic copolymer resin (C11) or the epoxy (meth)acrylate resin (C12).

Moreover, the acid value of the alkali-soluble resin of component (C) is not particularly limited, but is preferably 30 mgKOH/g or more, more preferably 50 mgKOH/g or more, further preferably 70 mgKOH/g or more, and more preferably It is 200 mgKOH/g or less, more preferably 150 mgKOH/g or less, still more preferably 100 mgKOH/g or less. For example, it is 30-200 mgKOH/g, preferably 50-150 mgKOH/g, more preferably 70-100 mgKOH/g. By setting it as above the said lower limit value, developability tends to improve, and by setting it as below the said upper limit value, there exists a tendency for development adhesiveness to improve. In addition, when (C) alkali-soluble resin is a mixture of 2 or more types, the acid value means the weighted average value corresponding to the content ratio.

The content ratio of (C) alkali-soluble resin in the photosensitive colored resin composition of the present invention is not particularly limited. In the total solid content, it is usually 5 mass% or more, preferably 10 mass% or more, and more preferably 20 mass% or more, more preferably 30 mass% or more, more preferably 40 mass% or more, especially 50 mass% or more, most preferably 60 mass% or more, and usually 90 mass% or less, preferably It is 80 mass % or less, more preferably, it is 70 mass % or less. For example, it is 5 to 90 mass %, preferably 10 to 90 mass %, more preferably 20 to 90 mass %, still more preferably 30 to 80 mass %, still more preferably 40 to 80 mass %, especially 50 ~70% by mass, preferably 60-70% by mass. When the value is equal to or higher than the above-mentioned lower limit, residues tend to be reduced, and when the value is equal to or less than the above-mentioned upper limit, the ink repellency tends to be improved.

In addition, the total content ratio of (A) ethylenically unsaturated compound and (C) alkali-soluble resin in the total solid content is not particularly limited, but is preferably 10% by mass or more, more preferably 30% by mass. More preferably, it is 60 mass % or more, especially 80 mass % or more. Furthermore, it is preferably 95 mass % or less, more preferably 92 mass % or less, and still more preferably 90 mass % or less. For example, it is 10-95 mass %, Preferably it is 30-95 mass %, More preferably, it is 60-92 mass %, Still more preferably, it is 80-90 mass %. When the value is equal to or higher than the above-mentioned lower limit, the adhesion of the barrier ribs to the base material tends to be improved, and when the value is below the above-mentioned upper limit, light-shielding properties or ink repellency tend to be improved.

[1-1-4](D) Ingredient: Liquid repellent The photosensitive colored resin composition of the present invention contains a fluorine atom-containing resin having a crosslinking group as (D) a liquid repellent. It is considered that by containing a fluorine atom-containing resin having a cross-linking group, ink repellency can be imparted to the surface of the barrier rib, and therefore the barrier rib can be made to prevent color mixing of each pixel.

Examples of the crosslinking group include an epoxy group or an ethylenically unsaturated group. From the viewpoint of suppressing the outflow of the liquid repellent agent into the developer, an ethylenically unsaturated group is preferred. It is thought that by using a liquid-repellent agent having a cross-linked group, the cross-linking reaction on the surface of the formed coating film can be accelerated when the formed coating film is exposed, and the liquid-repellent agent is difficult to flow out during the development process. As a result, the obtained film can be The barrier wall is made to show higher ink repellency.

In addition, since the resin contains fluorine atoms, the resin containing fluorine atoms tends to be aligned on the surface of the barrier ribs and prevent ink from bleeding or color mixing. More specifically, the group having fluorine atoms tends to repel the ink and prevent the ink from penetrating or color mixing due to the ink crossing the barrier and entering into the adjacent area.

Furthermore, the fluorine atom-containing resin having a cross-linking group preferably has either or both of a perfluoroalkyl group and a perfluoroalkylene ether chain. By having either or both perfluoroalkyl and perfluoroalkylene ether chains, the resin containing fluorine atoms is easily aligned on the surface of the barrier ribs, showing higher ink repellency and further preventing ink from being Tendency to bleed or mix colors.

Examples of the perfluoroalkyl group include perfluorobutyl, perfluorohexyl, perfluorooctyl, and the like. Examples of perfluoroalkylene ether chains include: -CF ₂ -O-, -(CF ₂ ) ₂ -O-, -(CF ₂ ) ₃ -O-, -CF ₂ -C(CF ₃ )O- , -C(CF ₃ )-CF ₂ -O- and divalent bases having these repeating units.

Specific examples of the fluorine atom-containing resin having a crosslinking group include, for example, an acrylic copolymer resin having an epoxy group and a perfluoroalkyl group, and an acrylic copolymer resin having an epoxy group and a perfluoroalkyl ether chain. Resins, acrylic copolymer resins with ethylenically unsaturated groups and perfluoroalkyl groups, acrylic copolymer resins with ethylenically unsaturated groups and perfluoroalkyl ether chains, rings with epoxy groups and perfluoroalkyl groups Oxy (meth)acrylate resin, epoxy (meth)acrylate resin with epoxy group and perfluoroalkyl ether chain, epoxy (methyl) with ethylenically unsaturated group and perfluoroalkyl group Acrylate resin, epoxy (meth)acrylate resin with ethylenically unsaturated groups and perfluoroalkylene ether chains, etc. Among them, from the viewpoint of ink repellency, an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkyl group, and an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkyl ether chain are preferred. , and more preferably an acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkylene ether chain.

As commercial products of the fluorine atom-containing resin having a cross-linking group, "Megafac (registered trademark, the same below) F116", "Megafac F120", "Megafac F142D" and "Megafac F144D" manufactured by DIC Corporation can be used ", "Megafac F150", "Megafac F160", "Megafac F171", "Megafac F172", "Megafac F173", "Megafac F177", "Megafac F178A", "Megafac F178K", "Megafac F179", "Megafac F183" ”, “Megafac F184”, “Megafac F191”, “Megafac F812”, “Megafac F815”, “Megafac F824”, “Megafac F833”, “Megafac RS101”, “Megafac RS102”, “Megafac RS105”, “Megafac RS201” , "Megafac RS202", "Megafac RS301", "Megafac RS303", "Megafac RS304", "Megafac RS401", "Megafac RS402", "Megafac RS501", "Megafac RS502", "Megafac RS-72-K", " Megafac RS-78", "Megafac RS-90", "DEFENSA (registered trademark, the same below) MCF300", "DEFENSA MCF310", "DEFENSA MCF312", "DEFENSA MCF323", "Fluorad FC430" manufactured by 3M JAPAN, "Fluorad FC431", "FC-4430", "FC4432", "AsahiGuard (registered trademark) AG710" manufactured by AGC, "Surflon (registered trademark, the same below) S-382", "Surflon SC-101", " Fluorine-containing organic compounds are commercially available under trade names such as "Surflon SC-102", "Surflon SC-103", "Surflon SC-104", "Surflon SC-105", and "Surflon SC-106". Among them, "Megafac RS-72-K", "Megafac RS-78", and "Megafac RS-90" are preferably used as the acrylic copolymer resin having an ethylenically unsaturated group and a perfluoroalkylene group. "wait.

The fluorine atom content ratio in the fluorine atom-containing resin having a cross-linking group is not particularly limited. In the fluorine atom-containing resin having a cross-linking group, it is preferably 5 mass % or more, and more preferably 10 mass % or more. More preferably, it is 20 mass % or more, and still more preferably, it is 25 mass % or more. Furthermore, the content is preferably 50 mass% or less, and more preferably 35 mass% or less. By setting the value above the lower limit, the outflow to the pixel portion tends to be suppressed, and by setting the value below the upper limit, a high contact angle tends to be displayed.

The molecular weight of the fluorine atom-containing resin having a cross-linking group is not particularly limited and may be a low molecular weight compound or a high molecular weight body. A high molecular weight body is preferable because it suppresses fluidity caused by post-baking and prevents outflow from the barrier wall. From this point of view, the number average molecular weight of the fluorine atom-containing resin having a cross-linking group is preferably 100 or more. , more preferably 500 or more, more preferably 100,000 or less, more preferably 10,000 or less.

The content ratio of the (D) liquid repellent in the photosensitive colored resin composition of the present invention is not particularly limited, but is usually 0.01 mass% or more, preferably 0.1 mass% or more, and more preferably 0.1 mass% or more in the total solid content. 0.5 mass% or more, and usually 5 mass% or less, preferably 3 mass% or less, more preferably 2 mass% or less. For example, it is 0.01-5 mass %, Preferably it is 0.1-3 mass %, More preferably, it is 0.5-2 mass %. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting it below the above upper limit, it is easier to obtain a uniform coating film when ink is applied to the pixel portion after the barrier ribs are formed. tendency.

In addition, the content ratio of the fluorine atom-containing resin having a crosslinking group is not particularly limited, but it is usually 0.01 mass% or more, preferably 0.1 mass% or more, and more preferably 0.5 mass% or more in the total solid content. Moreover, it is usually 5 mass% or less, preferably 3 mass% or less, more preferably 2 mass% or less. For example, it is 0.01-5 mass %, Preferably it is 0.1-3 mass %, More preferably, it is 0.5-2 mass %. By setting the value above the lower limit, the ink repellency tends to be improved, and by setting it below the above upper limit, it is easier to obtain a uniform coating film when ink is applied to the pixel portion after the barrier ribs are formed. tendency.

On the other hand, in the photosensitive colored resin composition of the present invention, a surfactant may be used together with the (D) liquid repellent agent. The surfactant can be used for the purpose of improving the coating properties of the photosensitive colored resin composition as a coating liquid and the developability of the coating film. Among them, polysiloxane-based surfactants or surfactants without Fluorine-based surfactant with cross-linking group. In particular, since it has the function of removing residues of the photosensitive colored resin composition from unexposed parts during development and also has the function of expressing wettability, a polysiloxane-based surfactant is preferred, and a further preferred one is Polyether modified polysiloxane surfactant.

As the fluorine-based surfactant having no cross-linking group, a compound having a fluoroalkyl group or a fluoroalkylene group at at least any one of the terminal, main chain and side chain is preferred. Examples of such commercial products include "BM-1000" and "BM-1100" manufactured by BM Chemie, and "Megafac F142D", "Megafac F172", "Megafac F173" and "Megafac" manufactured by DIC. F183", "Megafac F470", "Megafac F475", "Megafac F554", "Megafac F559", "FC430" manufactured by 3M JAPAN Company, "DFX-18" manufactured by NEOS Company, etc.

Examples of polysilicone-based surfactants include "DC3PA", "SH7PA", "DC11PA", "SH21PA", "SH28PA", "SH29PA", "8032Additive", " SH8400", "BYK (registered trademark, the same below) 323", "BYK330" manufactured by BYK-Chemie Co., Ltd. and other commercial products. The surfactant may include surfactants other than fluorine-based surfactants and polysiloxane-based surfactants. Examples of surfactants include nonionic, anionic, cationic, and amphoteric surfactants.

Examples of the nonionic surfactant include polyoxyethylene alkyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene alkyl esters, and polyoxyethylene alkyl ethers. Oxyethylene fatty acid esters, glycerin fatty acid esters, polyoxyethylene glycerol fatty acid esters, pentaerythritol fatty acid esters, polyoxyethylene pentaerythritol fatty acid esters, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters , sorbitol fatty acid esters, polyoxyethylene sorbitol fatty acid esters, etc. Examples of such commercially available products include polyoxyethylene surfactants such as "Emulgen (registered trademark, the same below) 104P" and "Emulgen A60" manufactured by Kao Corporation.

Examples of the anionic surfactant include alkyl sulfonates, alkyl benzene sulfonates, alkyl naphthalene sulfonates, polyoxyethylene alkyl ether sulfonates, and alkyl surfactants. Sulfates, alkyl sulfate ester salts, higher alcohol sulfate ester salts, aliphatic alcohol sulfate ester salts, polyoxyethylene alkyl ether sulfates, polyoxyethylene alkyl phenyl ether sulfates, alkyl phosphates Ester salts, polyoxyethylene alkyl ether phosphates, polyoxyethylene alkyl phenyl ether phosphates, special polymer surfactants, etc. Among them, a special polymer surfactant is preferred, and a special polycarboxylic acid type polymer surfactant is further preferred. As such anionic surfactants, commercially available products can be used. For example, alkyl sulfate ester salts include "EMAL (registered trademark, the same below) 10" manufactured by Kao Corporation, and alkyl naphthalene sulfonate salts can be used. Examples include "Pelex (registered trademark) NB-L" manufactured by Kao Corporation, and examples of special polymer surfactants include "Homogenol (registered trademark, the same below) L-18" and "Homogenol L-100" manufactured by Kao Corporation wait.

Furthermore, examples of the cationic surfactant include quaternary ammonium salts, imidazoline derivatives, alkylamine salts, etc. Examples of the amphoteric surfactant include betaine-type compounds, imidazole Onium salts, imidazolines, amino acids, etc. Among these, quaternary ammonium salts are preferred, and stearyltrimethylammonium salts are further preferred. Examples of commercially available alkylamine salts include "Acetamin (registered trademark) 24" manufactured by Kao Corporation, and examples of quaternary ammonium salts include "Quartamin (registered trademark, the same below) 24P" manufactured by Kao Corporation. , "Quartamin 86W", etc.

In addition, surfactants can also be used in combination of two or more types. For example, polysilicone surfactants/fluorine-based surfactants, polysilicone-based surfactants/special polymer surfactants, fluorine-based surfactants Combination of surfactant/special polymer surfactant, etc. Among them, a combination of polysiloxane surfactant/fluorine surfactant is preferred. Examples of the polysilicone surfactant/fluorine surfactant combination include "DFX-18" manufactured by NEOS, "BYK-300" or "BYK-330" manufactured by BYK-Chemie. /"S-393" made by AGC Seimi Chemical Co., Ltd., "KP340" made by Shin-Etsu Silicone Co., Ltd. / "F-554" or "F-559" made by DIC Co., Ltd., "SH7PA" made by Dow Corning Toray Co., Ltd. / "DS-401" manufactured by Daikin Company, "L-77" manufactured by NUC Company/"FC4430" manufactured by 3M JAPAN Company, etc.

[1-1-5](E) Colorant The photosensitive colored resin composition of the present invention contains (E) colorant. By containing the coloring agent (E), appropriate light absorbing properties can be obtained, and in particular, when used for forming light-shielding members such as colored barrier ribs, appropriate light-shielding properties can be obtained.

The colorant (E) in the photosensitive colored resin composition of the present invention contains a purple pigment, and the content ratio of the purple pigment in the colorant (E) is 45% by mass or more.

Since purple pigments have an absorption band in the wavelength range of 450 nm to 600 nm, inclusion of purple pigments improves the light-shielding properties of green light. Therefore, by containing a large amount of purple pigment, the resulting colored barrier can be used to fully absorb the green light emitted from the green pixels of the color filter, thereby suppressing the excitation of the red luminescent nanocrystalline particles of the red pixel.

On the other hand, in order to obtain a color filter having pixels containing luminescent nanocrystal particles, ink in which luminescent nanocrystal particles are dispersed is ejected into a region surrounded by barrier ribs to form pixels. In order to prevent the inks between adjacent pixels from mixing with each other, the barrier ribs are required to have high ink repellency. In addition, a colorant is used to form the barrier rib into a colored barrier rib. However, the inclusion of the colorant tends to lower the hardenability of the film and lower the ink repellency.

In view of this, the photosensitive colored resin composition of the present invention is one that can obtain a colored barrier with excellent ink repellency by setting the content ratio of the purple pigment in the colorant (E) to 45% by mass or more. As mentioned above, the purple pigment has an absorption band on the long wavelength side of the visible region of 450 nm to 600 nm. On the other hand, it has high transmittance in the short wavelength side of the wavelength range of 360 nm to 400 nm, so it is considered that it Since the colorant contains a large amount of purple pigment, the curability by ultraviolet exposure becomes higher, the amount of liquid repellent remaining on the surface of the film after development increases, and the ink repellency of the colored barrier becomes higher.

Furthermore, since the purple pigment has high transmittance in the wavelength range of 360 nm to 400 nm, the internal hardenability of the film becomes high. Therefore, it is considered that even a thick film can form a high-definition colored barrier rib with good verticality.

Examples of purple pigments include: C.I. Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Among them, from the viewpoint of light-shielding properties, C.I. Pigment Violet 19, 23, and 29 are preferred, and C.I. Pigment Violet 23 and/or C.I. Pigment Violet 29 are more preferred. On the other hand, from the viewpoint of dispersibility, it is preferable to use C.I. Pigment Violet 29.

(E) The content ratio of the purple pigment in the colorant is not particularly limited as long as it is 45% by mass or more. From the viewpoint of green light blocking properties and hardening properties, it is preferably 50% by mass in the total solid content. Above, more preferably 55 mass% or more, still more preferably 60 mass% or more, still more preferably 70 mass% or more, particularly preferably 80 mass% or more, and usually 100 mass% or less. On the other hand, from the viewpoint of utilizing the optical properties of colorants other than purple pigments to expand the absorption band, 99 mass % or less is preferred, 90 mass % or less is more preferred, and 80 mass % or less is more preferred, especially Preferably, it is 70 mass % or less. From the viewpoint of green light shielding property and hardening property, for example, it is 50 to 100 mass %, preferably 55 to 100 mass %, more preferably 60 to 100 mass %, still more preferably 70 to 100 mass %, and further More preferably, it is 80-100 mass %. Moreover, from the viewpoint of utilizing the optical properties of colorants other than purple pigments to expand the absorption band, for example, it is 45 to 99 mass %, preferably 45 to 90 mass %, more preferably 45 to 80 mass %, and still more preferably It is 45-70 mass %, and as another form, it is 50-99 mass %, Preferably it is 50-90 mass %, More preferably, it is 50-80 mass %, Still more preferably, it is 50-70 mass %.

Among the above-mentioned purple pigments, the purple pigment preferably includes C.I. Pigment Violet 29 from the viewpoint of the light-shielding property or curability of blue light. In this case, the content ratio of C.I. Pigment Violet 29 is not particularly limited, but in the total solid content, it is preferably 1 mass % or more, more preferably 2 mass % or more, further preferably 3 mass % or more, and particularly preferably It is 4 mass % or more, and it is preferably 20 mass % or less, more preferably 15 mass % or less, further preferably 10 mass % or less, and particularly preferably 5 mass % or less. For example, it is 1 to 20 mass%, preferably 2 to 15 mass%, more preferably 3 to 10 mass%, and still more preferably 4 to 5 mass%. When the value is equal to or greater than the above-mentioned lower limit, the light-shielding property of blue light tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, the absorption band tends to be expanded. Moreover, the content ratio of C.I. Pigment Violet 29 in the purple pigment is not particularly limited, but it is preferably 30 mass% or more, more preferably 40 mass% or more, further preferably 50 mass% or more, still more preferably 60 mass% Mass% or more, preferably 80 mass% or more, and preferably 99 mass% or less, more preferably 95 mass% or less, further preferably 90 mass% or less, especially 85 mass% or less. For example, it is 30 to 99 mass%, preferably 40 to 95 mass%, more preferably 50 to 90 mass%, and still more preferably 60 to 85 mass%. By setting the value above the lower limit, the light-shielding property or curability of blue light tends to be improved, and by setting the value below the upper limit, the absorption band tends to be broadened.

On the other hand, among the above-mentioned purple pigments, the purple pigment preferably contains C.I. Pigment Violet 23 from the viewpoint of broadening the absorption band. In this case, the content ratio of C.I. Pigment Violet 23 is not particularly limited, but in the total solid content, it is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, further preferably 1 mass% or more, and particularly preferably It is 2 mass % or more, and preferably it is 20 mass % or less, more preferably 15 mass % or less, further preferably 10 mass % or less, especially 5 mass % or less. For example, it is 0.1 to 20 mass%, preferably 0.5 to 15 mass%, more preferably 1 to 10 mass%, and still more preferably 2 to 5 mass%. By setting the value above the lower limit, the absorption band tends to expand, and by setting the value below the upper limit, the light-shielding property of blue light tends to improve. Moreover, the content ratio of C.I. Pigment Violet 23 in the purple pigment is not particularly limited, but it is preferably 5 mass% or more, more preferably 10 mass% or more, further preferably 20 mass% or more, and particularly preferably 30 mass%. % or more, and preferably 90 mass% or less, more preferably 80 mass% or less, further preferably 70 mass% or less, particularly preferably 60 mass% or less. For example, it is 5 to 90 mass%, preferably 10 to 80 mass%, more preferably 20 to 70 mass%, and still more preferably 30 to 60 mass%. By setting the value above the lower limit, the absorption band tends to expand, and by setting the value below the upper limit, the light-shielding property of blue light tends to improve.

Moreover, from the viewpoint of broadening the absorption band and taking into consideration the light-shielding property or hardening property of blue light, the purple pigment preferably includes C.I. Pigment Violet 29 and C.I. Pigment Violet 23. In this case, the total content ratio of C.I. Pigment Violet 29 and C.I. Pigment Violet 23 is not particularly limited, but in the total solid content, it is preferably 1 mass % or more, more preferably 2 mass % or more, and still more preferably 3% by mass or more, preferably 4% by mass or more, preferably 20% by mass or less, more preferably 15% by mass or less, further preferably 10% by mass or less, especially 5% by mass or less. For example, it is 1 to 20 mass%, preferably 2 to 15 mass%, more preferably 3 to 10 mass%, and still more preferably 4 to 5 mass%. When the value is equal to or higher than the above-mentioned lower limit, the absorption band tends to expand and the light-shielding property or curability of blue light becomes good, and when the value is equal to or less than the above-mentioned upper limit, the light resistance tends to be improved.

Moreover, the total content ratio of C.I. Pigment Violet 29 and C.I. Pigment Violet 23 in the colorant (E) is not particularly limited, but it is preferably 50 mass % or more, more preferably 60 mass % or more, and still more preferably 70 mass % or more, preferably 80 mass % or more, more preferably 99 mass % or less, more preferably 95 mass % or less, further preferably 90 mass % or less, particularly 85 mass % or less. For example, it is 50-99 mass %, Preferably it is 60-95 mass %, More preferably, it is 70-90 mass %, Even more preferably, it is 80-85 mass %. When the value is equal to or greater than the above-mentioned lower limit, the absorption band tends to be expanded, and when the value is equal to or less than the above-mentioned upper limit, the light resistance tends to be improved.

Moreover, the total content ratio of C.I. Pigment Violet 29 and C.I. Pigment Violet 23 in the purple pigment is not particularly limited, but it is preferably 50 mass% or more, more preferably 60 mass% or more, and still more preferably 70 mass% More preferably, it is 80 mass % or more, and usually it is 100 mass % or less. For example, it is 50-100 mass %, Preferably it is 60-100 mass %, More preferably, it is 70-100 mass %, Even more preferably, it is 80-100 mass %. By setting it to the above-mentioned lower limit value or more, the absorption band tends to expand.

Furthermore, the content ratio of C.I. Pigment Violet 23 to the content ratio of C.I. Pigment Violet 29 is not particularly limited, but it is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, based on 100 parts by mass of C.I. Pigment Violet 29. , more preferably 20 parts by mass or more, particularly preferably 30 parts by mass or more, more preferably 80 parts by mass or less, more preferably 60 parts by mass or less, further preferably 50 parts by mass or less, especially 40 parts by mass portion or less. For example, it is 5-80 parts by mass, preferably 10-60 parts by mass, more preferably 20-50 parts by mass, and still more preferably 30-40 parts by mass. By setting the value above the lower limit, the absorption band tends to expand, and by setting the value below the upper limit, the light-shielding property or curability of blue light tends to improve.

(E) The coloring agent preferably contains coloring agents other than purple pigments (hereinafter, simply referred to as "other coloring agents"). Examples of other colorants include pigments and dyes. Pigments are preferred from the viewpoint of heat resistance, and organic pigments are preferred from the viewpoints of hue, photocurability, and sensitivity.

Examples of pigments include organic colored pigments such as yellow pigments, orange pigments, red pigments, blue pigments, green pigments, and brown pigments. Examples of yellow pigments include: C.I. Pigment Yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208. Among them, from the viewpoint of dispersion and reliability, C.I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, and 185 are preferred, and C.I. Pigment Yellow 138, 139, 150. From the perspective of light-shielding properties, C.I. Pigment Yellow 139 is particularly preferred.

Examples of orange pigments include: C.I. Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. Among them, in terms of dispersibility or light-shielding properties, C.I. Pigment Orange 13, 43, 64, and 72 are preferably used. When the photosensitive colored resin composition is cured with ultraviolet rays, as the orange pigment, C.I. Pigment Orange 13, 43, 64, and 72 are preferably used. From this point of view, it is more preferable to use C.I. Pigment Orange 64 and 72, and particularly preferably C.I. Pigment Orange 64, which has a lower ultraviolet absorption rate.

Examples of red pigments include: C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53: 1, 53:2, 53:3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81: 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276. Among them, from the viewpoint of light-shielding properties and dispersion properties, preferred ones include: C.I. Pigment Red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254, and more preferably include: C.I. Pigment Red 177, 209, 224, and 254. Furthermore, in terms of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Red 177, 254, and 272. When curing the photosensitive colored resin composition with ultraviolet rays, it is preferable to use C.I. Pigment Red 177, 254, and 272 as the red pigment. From this point of view, it is more preferable to use C.I. Pigment Red 254 or 272 when the ultraviolet absorption rate is low.

Examples of blue pigments include: C.I. Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25 ,27,28,29,33,35,36,56,56:1,60,61,61:1,62,63,66,67,68,71,72,73,74,75,76,78 ,79. Among them, from the viewpoint of light-shielding properties, preferred ones include: C.I. Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, and 60, and further preferred ones are C.I. Enumeration: C.I. Pigment Blue 15:6, 16. Furthermore, in terms of dispersibility or light-shielding properties, it is preferable to use C.I. Pigment Blue 15:6, 16, and 60. When the photosensitive colored resin composition is cured with ultraviolet rays, as a blue pigment, it is more preferable to use it. It is preferable to use one with a low ultraviolet absorption rate. From this point of view, it is more preferable to use C.I. Pigment Blue 60.

Examples of green pigments include: C.I. Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58. Among them, from the viewpoint of dispersibility, C.I. Pigment Green 7 and 36 are preferred.

Examples of brown pigments include C.I. Pigment Brown 23, 25, 26, 28, 38, 41, 83, and 93. Among them, from the viewpoint of balancing near-infrared ray transmittance and light-shielding properties, C.I. Pigment Brown 26, 28, 83, and 93 are preferred.

Among these organic color pigments, orange pigments are preferred in terms of having an absorption band near a wavelength of 400 to 550 nm. When an orange pigment is included, the content ratio of the orange pigment is not particularly limited, but in the total solid content, it is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, and still more preferably 0.8 mass% or more. It is preferably 1 mass% or more, more preferably 10 mass% or less, more preferably 8 mass% or less, further preferably 4 mass% or less, and particularly preferably 2 mass% or less. For example, when an orange pigment is included, it is 0.1-10 mass %, Preferably it is 0.5-8 mass %, More preferably, it is 0.8-4 mass %, Still more preferably, it is 1-2 mass %. When the value is equal to or higher than the above-mentioned lower limit, the light-shielding property of blue light tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, the light-shielding property of green light tends to be improved.

In addition, when an orange pigment is included, the content ratio of the orange pigment in the colorant (E) is not particularly limited, but is preferably 5 mass% or more, more preferably 10 mass% or more, and still more preferably 20 mass%. The above content is preferably 30 mass% or more, more preferably 50 mass% or less, more preferably 45 mass% or less, further preferably 40 mass% or less, and particularly preferably 35 mass% or less. For example, it is 5 to 50 mass%, preferably 10 to 50 mass%, more preferably 20 to 45 mass%, further preferably 30 to 40 mass%, and particularly preferably 30 to 35 mass%. When the value is equal to or higher than the above-mentioned lower limit, the light-shielding property of blue light tends to be improved, and when the value is equal to or less than the above-mentioned upper limit, the light-shielding property of green light tends to be improved.

Moreover, as other colorants, a black pigment may also be included. Examples of the black pigment include organic black pigments and inorganic black pigments. Examples of organic black pigments include compounds selected from the group consisting of compounds represented by the following formula (1), geometric isomers of the compounds represented by the following formula (1), and salts of compounds represented by the following formula (1). , and at least one organic black pigment from the group consisting of salts of geometric isomers of the compound represented by the following formula (1).

[Chemical 42]

In formula (1), R ¹ and R ⁶ are independently a hydrogen atom, CH ₃ , CF ₃ , fluorine atom or chlorine atom; R ² , R ³ , R ⁴ , R ⁵ , R ⁷ , R ⁸ , R ⁹ and R ¹⁰ are independently a hydrogen atom, a halogen atom, R ¹¹ , COOH, COOR ¹¹ , COO ^- , CONH ₂ , CONHR ¹¹ , CONR ¹¹ R ¹² , CN, OH, OR ¹¹ , COCR ¹¹ , OOCNH ₂ , OOCNHR ¹¹ , OOCNR ¹¹ R ¹² , NO ₂ , NH ₂ , NHR ¹¹ , NR ¹¹ R ¹² , NHCOR ¹² , NR ¹¹ COR ¹² , N=CH ₂ , N=CHR ¹¹ , N=CR ¹¹ R ¹² , SH, SR ¹¹ , SOR ¹¹ , SO ₂ R ¹¹ , SO ₃ R ¹¹ , SO ₃ H, SO ₃ ^- , SO ₂ NH ₂ , SO ₂ NHR ¹¹ or SO ₂ NR ¹¹ R ¹² ; and selected from R ² and R ³ , R ³ At least one combination of the group consisting of R ⁴ , R ⁴ and R ⁵ , R ⁷ and R ⁸ , R ⁸ and R ⁹ , and R ⁹ and R ¹⁰ may be directly bonded to each other, or may be oxygen atom, sulfur atom, NH or NR ¹¹ bridging group (bridge) and bonded to each other; R ¹¹ and R ¹² are independently an alkyl group with 1 to 12 carbon atoms, a cycloalkyl group with 3 to 12 carbon atoms, and a cycloalkyl group with 3 to 12 carbon atoms. Alkenyl group having 2 to 12 carbon atoms, cycloalkenyl group having 3 to 12 carbon atoms, or alkynyl group having 2 to 12 carbon atoms.

The geometric isomer of the compound represented by the above formula (1) (hereinafter also referred to as "general formula (1)") has the following core structure (where the substituents in the structural formula are omitted), trans-trans isomer may be the most stable.

[Chemical 43]

When the compound represented by the general formula (1) is anionic, it is preferably formed by any known suitable cation, such as a metal, organic, inorganic or metal-organic cation, specifically an alkali metal or an alkaline earth group. Salts composed of metals, transition metals, primary ammonium, secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium, or organic metal complexes to compensate for their charge. Furthermore, when the geometric isomer of the compound represented by general formula (1) is anionic, the same salt is preferred.

Among the definitions of the substituents of the general formula (1) and the like, the following are preferred from the viewpoint that the shielding rate tends to be high. The reason is that the following substituents have no absorption and are not considered to affect the hue of the pigment. R ² , R ⁴ , R ⁵ , R ⁷ , R ⁹ and R ¹⁰ are each independently preferably a hydrogen atom, a fluorine atom or a chlorine atom, and more preferably a hydrogen atom. R ³ and R ⁸ are each independently preferably a hydrogen atom, NO ₂ , OCH ₃ , OC ₂ H ₅ , a bromine atom, a chlorine atom, CH ₃ , C ₂ H ₅ , N(CH ₃ ) ₂ , N(CH ₃ )(C ₂ H ₅ ), N(C ₂ H ₅ ) ₂ , α-naphthyl group, β-naphthyl group, SO ₃ H or SO ₃ ^- , and more preferably a hydrogen atom or SO ₃ H.

R ¹ and R ⁶ are each independently preferably a hydrogen atom, CH ₃ or CF ₃ , and more preferably a hydrogen atom. Preferably, at least one combination selected from the group consisting of R ¹ and R ⁶ , R ² and R ⁷ , R ³ and R ⁸ , R ⁴ and R ⁹ , and R ⁵ and R ¹⁰ is the same, and more preferably ^R1 is the same as ^R6 , ^R2 is the same as ^R7 , ^R3 is the same as ^R8 , ^R4 is the same as ^R9 , and ^R5 is the same as ^R10 .

The alkyl group having 1 to 12 carbon atoms is, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, 2-butyl, isobutyl, 3-butyl, 2-methylbutyl, n-butyl, etc. Pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2-ethyl Hexyl, nonyl, decyl, undecyl or dodecyl.

Examples of cycloalkyl groups having 3 to 12 carbon atoms include cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, and thujyl, Norcaryl, Norcaryl, Norcaryl, Carbenyl, Menthyl, Norpinyl, Pinyl, 1-adamantyl or 2-adamantyl.

Examples of alkenyl groups having 2 to 12 carbon atoms include vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, and 1,3-butadiene. -2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-menthyl-1-buten-3-yl, 2-methyl-3-buten-2-yl , 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl, hexenyl, octenyl, nonenyl, decenyl or dodecenyl.

Examples of the cycloalkenyl group having 3 to 12 carbon atoms include 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, and 3-cyclohexen-1-yl. , 2,4-cyclohexadien-1-yl, 1-p-menthene-8-yl, 4(10)-thujen-10-yl, 2-norphen-1-yl, 2,5 -Nordadien-1-yl, 7,7-dimethyl-2,4-norcampadien-3-yl or camphenyl.

Examples of alkynyl groups having 2 to 12 carbon atoms include 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, and 2-methyl-3-butyn-2-yl. , 1,4-pentadiyn-3-yl, 1,3-pentadiyn-5-yl, 1-hexyn-6-yl, cis-3-methyl-2-pentene-4-yne- 1-yl, trans-3-methyl-2-penten-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyn-8-yl, 1-nonyn- 9-yl, 1-decyn-10-yl or 1-dodecyn-12-yl.

The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

The organic black pigment represented by the above general formula (1) is preferably a compound represented by the following general formula (2) and/or a geometric isomer of the compound represented by the following general formula (2).

[Chemical 44]

Specific examples of such organic black pigments include the trade name Irgaphor (registered trademark) Black S 0100 CF (manufactured by BASF Corporation). The organic black pigment is preferably dispersed using the following dispersants, solvents, and methods. Furthermore, if the compound represented by the above-mentioned general formula (2) or a sulfonic acid derivative of a geometric isomer of the compound represented by the above-mentioned general formula (2) is present during dispersion, dispersibility or storage stability may be improved. In addition, as the organic black pigment, from the viewpoint of optical properties and reliability, it is preferable to use the organic black pigment described in Korean Patent Publication No. 10-2018-0052502, or Korean Patent Publication No. 10-2018-0052864 Organic black pigments recorded in the Gazette No.

Examples of other organic black pigments include aniline black, cyanine black, perylene black, and the like. In addition, carbon black as an inorganic black pigment can also be used. Examples of carbon black include the following carbon blacks.

Manufactured by Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40 , #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, #960, #970, #980, #990, #1000, # 2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #3150, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B , OIL11B, OIL30B, OIL31B Manufactured by Degussa: Printex (registered trademark, the same below) 3, Printex 3OP, Printex 30, Printex 30OP, Printex 40, Printex 45, Printex 55, Printex 60, Printex 75, Printex 80, Printex 85, Printex 90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V, Special Black 550, Special Black 350, Special Black 250, Special Black 100, Special Black 6, Special Black 5, Special Black 4, Color Black FW1, Color Black FW2 , Color Black FW2V, Color Black FW18, Color Black FW200, Color Black S160, Color Black S170 Manufactured by Cabot Company: Monarch (registered trademark, the same below) 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, below) Same) 99, REGAL 99R, REGAL 415, REGAL 415R, REGAL 250, REGAL 250R, REGAL 330, REGAL 400R, REGAL 55R0, REGAL 660R, BLACK PEARLS 480, PEARLS 130, VULCAN (registered trademark) XC72R, ELFTEX (registered trademark) -8 Manufactured by Birla: RAVEN (registered trademark, the same below) 11, RAVEN 14, RAVEN 15, RAVEN 16, RAVEN 22, RAVEN 30, RAVEN 35, RAVEN 40, RAVEN 410, RAVEN 420, RAVEN 450, RAVEN 500, RAVEN 780, RAVEN 850, RAVEN 890H, RAVEN 1000, RAVEN 1020, RAVEN 1040, RAVEN 1060U, RAVEN 1080U, RAVEN 1170, RAVEN 1190U, RAVEN 1250, RAVEN 1500, RAVEN 2000, RAVEN 2500U, RAVEN 3500, RAVEN 5000, RA VEN 5250, RAVEN 5750 , RAVEN 7000

Carbon black may also be coated with resin. If resin-coated carbon black is used, it has the effect of improving the adhesion to the glass substrate or the volume resistance value. As the resin-coated carbon black, for example, the carbon black described in Japanese Patent Application Laid-Open No. 09-71733 can be suitably used. In terms of volume resistance or dielectric constant, resin-coated carbon black can be preferably used.

The average primary particle size of the pigment is usually 0.2 μm or less, preferably 0.1 μm or less, more preferably 0.04 μm or less. The average primary particle size of the pigment is measured by directly measuring the size of the primary particles from the electron micrograph using a transmission electron microscope (TEM) or a scanning electron microscope (SEM). The particle diameter of each pigment particle is the diameter of an equal-area circle converted into the diameter of a circle of the same area, and the particle diameter is determined for each of the plurality of pigment particles, and the number average is calculated as shown in the calculation formula below. Find the average particle size. Particle size of each pigment particle: X ₁ , X ₂ , X ₃ , X ₄ ,・・・, _{X i} , _...

In addition to the above-mentioned pigments, dyes may also be used. Examples of dyes include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinone imine dyes, quinoline dyes, nitro dyes, carbonyl dyes, methine dyes, and the like. Examples of azo dyes include: C.I. Acid Yellow 11, C.I. Acid Orange 7, C.I. Acid Red 37, C.I. Acid Red 180, C.I. Acid Blue 29, C.I. Direct Red 28, C.I. Direct Red 83, C.I. Direct Yellow 12, C.I. Direct Orange 26, C.I. Direct Green 28, C.I. Direct Green 59, C.I. Reactive Yellow 2, C.I. Reactive Red 17, C.I. Reactive Red 120, C.I. Reactive Black 5, C.I. Disperse Orange 5, C.I. Disperse Red 58, C.I. Disperse blue 165, C.I. basic blue 41, C.I. basic red 18, C.I. mordant red 7, C.I. mordant yellow 5, C.I. mordant black 7, etc.

Examples of anthraquinone-based dyes include: C.I. Vat Blue 4, C.I. Acid Blue 40, C.I. Acid Green 25, C.I. Reactive Blue 19, C.I. Reactive Blue 49, C.I. Disperse Red 60, C.I. Disperse Blue 56, C.I. Disperse Blue 60 etc. Examples of phthalocyanine-based dyes include C.I. Vat Blue 5, etc. Examples of quinoneimine-based dyes include C.I. Basic Blue 3, C.I. Basic Blue 9, etc. Examples of quinoline-based dyes include : C.I. Solvent Yellow 33, C.I. Acid Yellow 3, C.I. Disperse Yellow 64, etc. Examples of nitro-based dyes include: C.I. Acid Yellow 1, C.I. Acid Orange 3, C.I. Disperse Yellow 42, etc.

The content ratio of the (E) colorant in the photosensitive colored resin composition of the present invention is not particularly limited. It is usually 1 mass % or more, preferably 2 mass % or more, and more preferably 3 mass % in the total solid content. mass % or more, and more preferably 4 mass % or more. Moreover, it is usually 50 mass % or less, preferably 30 mass % or less, more preferably 25 mass % or less, still more preferably 20 mass % or less, still more preferably 15 mass % or less, especially 10 mass % or less. , further preferably 8 mass% or less, and most preferably 7 mass% or less. For example, it is 1 to 50 mass %, preferably 1 to 30 mass %, more preferably 2 to 25 mass %, still more preferably 2 to 20 mass %, still more preferably 3 to 15 mass %, especially 3 ~10 mass%, more preferably 4-8 mass%, most preferably 4-7 mass%. When the value is equal to or higher than the above-mentioned lower limit, light-shielding properties tend to be improved, and when the value is equal to or below the above-mentioned upper limit, the hardenability becomes favorable and high-definition barrier ribs tend to be formed.

[1-1-6](F) Dispersant The photosensitive colored resin composition of the present invention preferably contains (F) a dispersant to finely disperse the (E) colorant and stabilize its dispersion state. As the (F) dispersant, a polymer dispersant having a functional group is preferred, and in terms of dispersion stability, a polymer dispersant having the following functional groups is preferred: carboxyl group; phosphoric acid group; sulfonic acid base; or the bases thereof; primary, secondary or tertiary amine groups; quaternary ammonium bases; groups derived from pyridine, pyrimidine, pyridine and other nitrogen-containing heterocycles. Among them, polymer dispersants with the following basic functional groups are especially preferred in terms of dispersing pigments with a small amount of dispersant: primary, secondary or tertiary amine groups; quaternary ammonium salt groups ; Derived from the base of nitrogen-containing heterocycles such as pyridine, pyrimidine, and pyridine.

Examples of polymer dispersants include urethane dispersants, acrylic dispersants, polyethyleneimine dispersants, polyallylamine dispersants, and monomers containing amine groups. Dispersants with macromonomers, polyoxyethylene alkyl ether dispersants, polyoxyethylene diester dispersants, polyether phosphate dispersants, polyester phosphate dispersants, sorbitan aliphatic ester dispersants agent, aliphatic modified polyester dispersant, etc.

Specific examples of such dispersants include trade names: EFKA (registered trademark, manufactured by BASF Co., Ltd.), DISPERBYK (registered trademark, manufactured by BYK-Chemie Co., Ltd.), Disparlon (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Kusumoto Chemical Co., Ltd.) Registered trademarks: Lubrizol Co., Ltd.), KP (manufactured by Shin-Etsu Chemical Industry Co., Ltd.), Polyflow (manufactured by Kyeisha Chemical Co., Ltd.), Ajisper (registered trademark: Ajinomoto Co., Ltd.), etc. One type of these polymer dispersants may be used alone, or two or more types may be used in combination.

The weight average molecular weight (Mw) of the polymer dispersant is usually 700 or more, preferably 1,000 or more, and usually 100,000 or less, preferably 50,000 or less. For example, the weight average molecular weight (Mw) of the polymer dispersant is preferably 700 to 100,000, more preferably 1,000 to 50,000. Among them, from the viewpoint of the dispersibility of the pigment, the (F) dispersant is preferably any one of a urethane polymer dispersant and an acrylic polymer dispersant having a functional group, or Of the two, it is particularly preferable to include an acrylic polymer dispersant. In terms of dispersibility and storage properties, a polymer dispersant having a basic functional group and either or both of a polyester bond and a polyether bond is preferred.

Examples of urethane-based and acrylic-based polymer dispersants include: DISPERBYK-160 to 167, 182 series (all urethane-based), DISPERBYK-2000, 2001, BYK-LPN21116, etc. (all urethane-based) Acrylic type) (all of the above are manufactured by BYK-Chemie). Specific examples of a preferred chemical structure as a urethane-based polymer dispersant include, for example, a polyisocyanate compound having one or two hydroxyl groups in the same molecule and a number average molecular weight of 300 to 10,000. Compounds, and dispersion resins with a weight average molecular weight of 1,000 to 200,000 obtained by reacting compounds with active hydrogen and tertiary amine groups in the same molecule. By treating these with a quaternary agent such as toluene chloride, all or part of the tertiary amine groups can be converted into quaternary ammonium salt groups.

Examples of the above-mentioned polyisocyanate compounds include terephthalene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and naphthalene-1,5 -Diisocyanates, benzidine diisocyanate and other aromatic diisocyanates, hexamethylene diisocyanate, lysine methyl ester diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, dimer diisocyanate Aliphatic diisocyanates such as isocyanate, isophorone diisocyanate, 4,4'-methylene bis(cyclohexyl isocyanate), ω,ω'-diisocyanatodimethylcyclohexane and other alicyclic diisocyanates, Aliphatic diisocyanates with aromatic rings such as xylylene diisocyanate, α,α,α',α'-tetramethylxylylene diisocyanate, lysate triisocyanate, 1,6,11-deca Monoalkane triisocyanate, 1,8-diisocyanato-4-isocyanatomethyloctane, 1,3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, tris(isocyanatophenylmethane), Triisocyanates such as tris(isocyanatophenyl)thiophosphate, their trimers, water adducts, and polyol adducts, etc. As the polyisocyanate, a terpolymer of organic diisocyanate is preferred, and a terpolymer of toluene diisocyanate and isophorone diisocyanate is most preferred. These may be used individually by 1 type, and may be used in combination of 2 or more types.

Examples of methods for producing isocyanate terpolymers include the following: using an appropriate trimerization catalyst, such as tertiary amines, phosphines, alkoxides, metal oxides, and carboxylates, for the above-mentioned polyisocyanates. etc., perform partial trimerization of the isocyanate group, stop the trimerization by adding catalyst poison, and then remove the unreacted polyisocyanate through solvent extraction and thin film distillation to obtain the target isocyanurate-containing Based on polyisocyanate.

Examples of compounds having one or two hydroxyl groups in the same molecule and a number average molecular weight of 300 to 10,000 include polyether diol, polyester diol, polycarbonate diol, polyolefin diol, etc., and these compounds The single terminal hydroxyl group of these compounds is alkoxylated with an alkyl group having 1 to 25 carbon atoms, and mixtures of two or more of these compounds. Examples of the polyether diol include polyether diol, polyether ester diol, and mixtures of two or more of these. Examples of the polyether glycol include those obtained by homopolymerizing or copolymerizing alkylene oxide, such as polyethylene glycol, polypropylene glycol, ethylene glycol-propylene glycol copolymer, polyoxytetramethylene glycol, and polyoxyhexamethylene glycol. Methyl glycol, polyoxyoctamethylene glycol and mixtures of two or more thereof.

Examples of polyetherester diols include those obtained by reacting a diol containing an ether group or a mixture with other diols and a dicarboxylic acid or anhydride thereof, or by reacting a polyester diol with an alkylene oxide. For example, poly(polyoxytetramethylene) adipate, etc. As the polyether glycol, the most preferred ones are polyethylene glycol, polypropylene glycol, polyoxytetramethylene glycol, or those obtained by alkoxylating the single terminal hydroxyl group of these compounds with an alkyl group having 1 to 25 carbon atoms. into a compound.

Examples of the polyester diol include dicarboxylic acids (succinic acid, glutaric acid, adipic acid, sebacic acid, fumaric acid, maleic acid, phthalic acid, etc.) or the like. Anhydrides and glycols (ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol Alcohol, 2,3-butanediol, 3-methyl-1,5-pentanediol, neopentyl glycol, 2-methyl-1,3-propanediol, 2-methyl-2-propyl-1 ,3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,5-pentanediol, 1,6-hexanediol, 2-methyl-2,4-pentanediol, 2,2,4-Trimethyl-1,3-pentanediol, 2-ethyl-1,3-hexanediol, 2,5-dimethyl-2,5-hexanediol, 1,8 -Aliphatic diols such as octamethylene glycol, 2-methyl-1,8-octamethylene glycol, 1,9-nonanediol, and alicyclic diols such as bishydroxymethylcyclohexane , aromatic diols such as benzenedimethanol and bishydroxyethoxybenzene, N-alkyl dialkanolamines such as N-methyldiethanolamine, etc.), such as polyethylene adipate, polyhexylene adipate Butylene diol, polyhexylene adipate, polyethylene/propylene adipate, etc.; or polyethylene obtained by using the above glycols or monohydric alcohols with 1 to 25 carbon atoms as initiators. Ester diol or polylactone monool, such as polycaprolactone diol, polymethylvalerolactone and mixtures of two or more of these. As the polyester diol, polycaprolactone diol or polycaprolactone using an alcohol having 1 to 25 carbon atoms as a initiator is optimal.

Examples of the polycarbonate diol include polycarbonate (1,6-hexanediester), polycarbonate (3-methyl-1,5-pentanediol), etc. Examples of the polyolefin diol include: polycarbonate Butadiene glycol, hydrogenated polybutadiene glycol, hydrogenated polyisoprene glycol, etc. These may be used individually by 1 type, and may be used in combination of 2 or more types.

The number average molecular weight of a compound having one or two hydroxyl groups in the same molecule and a number average molecular weight of 300 to 10,000 is preferably 500 to 6,000, and more preferably 1,000 to 4,000.

Describe compounds that have active hydrogen and tertiary amine groups in the same molecule. As active hydrogen, that is, a hydrogen atom directly bonded to an oxygen atom, a nitrogen atom or a sulfur atom, hydrogen atoms in functional groups such as a hydroxyl group, an amine group, and a thiol group may be cited. Among them, the amine group is preferred, especially the primary one. The hydrogen atom of the amine group. The tertiary amino group is not particularly limited, and examples thereof include an amino group having an alkyl group having 1 to 4 carbon atoms, a heterocyclic structure, and more specifically, an imidazole ring or a triazole ring.

Examples of such compounds having active hydrogen and tertiary amine groups in the same molecule include: N,N-dimethyl-1,3-propanediamine, N,N-diethyl-1,3-propane Diamine, N,N-dipropyl-1,3-propanediamine, N,N-dibutyl-1,3-propanediamine, N,N-dimethylethylenediamine, N,N- Diethylethylenediamine, N,N-dipropylethylenediamine, N,N-dibutylethylenediamine, N,N-dimethyl-1,4-butanediamine, N,N-diamine Ethyl-1,4-butanediamine, N,N-dipropyl-1,4-butanediamine, N,N-dibutyl-1,4-butanediamine, etc.

In addition, when the tertiary amino group is a nitrogen-containing heterocyclic structure, examples of the nitrogen-containing heterocyclic ring include: pyrazole ring, imidazole ring, triazole ring, tetrazole ring, indole ring, carbazole ring, indazole Ring, benzimidazole ring, benzotriazole ring, benzothezole ring, benzothiazole ring, benzothiadiazole ring and other nitrogen-containing five-membered heterocyclic rings, pyridine ring, pyridine ring, pyrimidine ring, three-membered ring Ring, quinoline ring, acridine ring, isoquinoline ring and other nitrogen-containing six-membered rings. Among these nitrogen-containing heterocycles, an imidazole ring or a triazole ring is preferred.

Examples of compounds having such an imidazole ring and an amino group include 1-(3-aminopropyl)imidazole, histidine, 2-aminoimidazole, 1-(2-aminoethyl)imidazole, and the like. Furthermore, examples of compounds having a triazole ring and an amino group include: 3-amino-1,2,4-triazole, 5-(2-amino-5-chlorophenyl)-3-phenyl- 1H-1,2,4-triazole, 4-amino-4H-1,2,4-triazole-3,5-diol, 3-amino-5-phenyl-1H-1,3, 4-triazole, 5-amino-1,4-diphenyl-1,2,3-triazole, 3-amino-1-benzyl-1H-2,4-triazole, etc.

As a compound having an active hydrogen and a tertiary amine group in the same molecule, N,N-dimethyl-1,3-propanediamine and N,N-diethyl-1,3-propanediamine are preferred. , 1-(3-aminopropyl)imidazole, 3-amino-1,2,4-triazole. These may be used individually by 1 type, and may be used in combination of 2 or more types.

A preferable blending ratio of raw materials for producing a urethane-based polymer dispersant is a compound with a number average molecular weight of 300 to 10,000 having 1 or 2 hydroxyl groups in the same molecule relative to 100 parts by mass of the polyisocyanate compound. It is 10 to 200 parts by mass, preferably 20 to 190 parts by mass, and further preferably 30 to 180 parts by mass, and the compound having active hydrogen and tertiary amine group in the same molecule is 0.2 to 25 parts by mass, preferably 0.3～24 parts by mass.

The production of the urethane polymer dispersant is carried out according to the well-known method for the production of polyurethane resin. As solvents during production, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, and isophorone, ethyl acetate, butyl acetate, and cellosolve acetate are usually used. Esters such as agents, hydrocarbons such as benzene, toluene, xylene, and hexane, some alcohols such as diacetone alcohol, isopropyl alcohol, 2-butanol, 3-butanol, etc., chlorides such as methylene chloride, chloroform, etc. Ethers such as tetrahydrofuran and diethyl ether, aprotic polar solvents such as dimethylformamide, N-methylpyrrolidone, and dimethylstyrene, etc. These may be used individually by 1 type, and may be used in combination of 2 or more types.

In the above production, a urethanization reaction catalyst is usually used. Examples of the catalyst include: tin-based catalysts such as dibutyltin dilaurate, dioctyltin dilaurate, dibutyltin dioctoate, and stannous octoate; iron-based catalysts such as acetyl iron pyruvate and ferric chloride; triethyl alcohol; Tertiary amines such as amine, triethylenediamine, etc. These may be used individually by 1 type, and may be used in combination of 2 or more types.

The introduction amount of the compound having active hydrogen and tertiary amine group in the same molecule is preferably 1 to 100 mgKOH/g, more preferably 5 to 95 mgKOH/g, based on the amine value after the reaction. The amine value is a neutralization titration of a basic amine group by an acid, and corresponds to the acid value expressed in mg of KOH. By setting it as above the said lower limit value, the dispersion ability tends to be improved, and by setting it as below the said upper limit value, the developability tends to be improved.

Furthermore, when an isocyanate group remains in the polymer dispersant due to the above reaction, it is preferable to further inert the isocyanate group using an alcohol or an amine compound because the stability of the product over time becomes higher. The weight average molecular weight (Mw) of the urethane polymer dispersant is usually in the range of 1,000 to 200,000, preferably 2,000 to 100,000, and more preferably 3,000 to 50,000. By setting it as above the said lower limit value, the dispersibility and dispersion stability tend to be improved, and by setting it as below the said upper limit value, there exists a tendency for solubility to improve and dispersion property to be improved.

As the acrylic polymer dispersant, it is preferable to use an unsaturated group-containing monomer having a functional group (the functional group here refers to the functional group mentioned above as a functional group contained in the polymer dispersant), and an unsaturated group. Random copolymers, graft copolymers, and block copolymers of monomers containing unsaturated groups with functional groups. These copolymers can be produced by known methods.

Examples of the unsaturated group-containing monomer having a functional group include (meth)acrylic acid, 2-(meth)acryloxyethylsuccinic acid, and 2-(meth)acryloxyethylphthalate. Dicarboxylic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, acrylic acid dimer and other unsaturated monomers with carboxyl groups, (meth)acrylic acid dimethylaminoethyl ester, (methyl ) Diethylaminoethyl acrylate and unsaturated monomers having tertiary amine groups and quaternary ammonium salt groups such as these quaternary compounds are given as specific examples. These may be used individually by 1 type, and may be used in combination of 2 or more types.

Examples of the unsaturated group-containing monomer having no functional group include: (methylmeth)acrylate, ethyl(meth)acrylate, propyl(meth)acrylate, isopropyl(meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, benzyl (meth)acrylate, phenyl (meth)acrylate, cyclo(meth)acrylate Hexyl ester, phenoxyethyl (meth)acrylate, phenoxymethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isoester (meth)acrylate, tricyclodecane (Meth)acrylate, tetrahydrofurfuryl (meth)acrylate, N-vinylpyrrolidone, styrene and its derivatives, α-methylstyrene, N-cyclohexylmaleimide , N-phenylmaleimide, N-benzylmaleimide and other N-substituted maleimides, acrylonitrile, vinyl acetate and poly(meth)acrylic acid methyl Ester macromonomer, polystyrene macromonomer, poly(meth)acrylate macromonomer, polyethylene glycol macromonomer, polypropylene glycol macromonomer, polycaprolactone macromonomer, etc. Monomer etc. These may be used individually by 1 type, and may be used in combination of 2 or more types.

The acrylic polymer dispersant is particularly preferably an A-B or B-A-B block copolymer containing an A block with a functional group and a B block without a functional group. In this case, in addition to the above-mentioned A block containing the functional group, the acrylic polymer dispersant In addition to the partial structure of the unsaturated group-containing monomer, it may also include partial structures derived from the above-mentioned unsaturated group-containing monomers that do not contain functional groups. These can be randomly copolymerized or block copolymerized in the A block. Any form contains. Moreover, the content of the partial structure not containing a functional group in the A block is usually 80 mass% or less, preferably 50 mass% or less, and further preferably 30 mass% or less.

The B block contains partial structures derived from the above-mentioned unsaturated group-containing monomers that do not contain functional groups. One B block may contain partial structures derived from two or more monomers. These may be included in the B block. The segments are contained in any form of random copolymerization or block copolymerization. A-B or B-A-B block copolymers are prepared, for example, by the living polymerization method shown below. Living polymerization methods include anionic living polymerization, cationic living polymerization, and free radical living polymerization.

When synthesizing the acrylic polymer dispersant, Japanese Patent Application Laid-Open No. 9-62002, or P. Lutz, P. Masson et al, Polym. Bull. 12, 79 (1984), B. C. Anderson, G. D. Andrews et al, Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al, Polym. J. 17, 977 (1985), 18, 1037 (1986), Koichi Shou, Koichi Hatada, Polymolecular Processing , 36, 366 (1987), Toshinobu Higashimura, Mitsuo Sawamoto, Polymer Papers, 46, 189 (1989), M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987), A well-known method described in Takuzo Aida, Shohei Inoue, Synthetic Organic Chemistry, 43, 300 (1985), D. Y. Sogoh, W. R. Hertler et al, Macromolecules, 20, 1473 (1987), etc.

The acrylic polymer dispersant that can be used in the present invention can be an A-B block copolymer or a B-A-B block copolymer. The A block/B block ratio constituting the copolymer is preferably 1/99 to 80. /20, especially 5/95 to 60/40 (mass ratio), by setting it within this range, there is a tendency to ensure a balance between dispersibility and storage stability. In addition, the amount of the quaternary ammonium salt group in 1 g of the A-B block copolymer and B-A-B block copolymer that can be used in the present invention is usually preferably 0.1 to 10 mmol. By setting it within this range, there can be Ensure good dispersion tendency.

Furthermore, such block copolymers often contain amine groups generated during the manufacturing process, and their amine value is about 1 to 100 mgKOH/g. From the perspective of dispersion, 10 mgKOH is preferred. /g or more, more preferably 30 mgKOH/g or more, further preferably 50 mgKOH/g or more, and preferably 90 mgKOH/g or less, more preferably 80 mgKOH/g or less, still more preferably 75 mgKOH/g g below. For example, 10 to 90 mgKOH/g is preferred, 30 to 80 mgKOH/g is more preferred, and 50 to 75 mgKOH/g is still more preferred. Here, the amine value of dispersants such as block copolymers is expressed as the mass of KOH equivalent to the amount of alkali per 1 g of the solid component other than the solvent in the dispersant sample, and is measured by the following method . Accurately weigh 0.5 to 1.5 g of the dispersant sample into a 100 mL beaker, and dissolve it with 50 mL of acetic acid. Use an automatic titration device equipped with a pH value electrode to neutralize and titrate the solution with 0.1 mol/L HClO ₄ acetic acid solution. The inflection point of the titration pH value curve is set as the titration end point, and the amine value is calculated by the following formula.

Amine value [mgKOH/g]=(561×V)/(W×S) [Wherein, W represents the weighed amount of the dispersant sample [g], V represents the titration end point of the titration [mL], and S represents the solid content concentration of the dispersant sample [mass %]] In addition, the acid value of the block copolymer also depends on the presence and type of acidic groups that form the basis of the acid value, but is generally preferably low, usually 10 mgKOH/g or less. Moreover, the weight average molecular weight (Mw) of the block copolymer is preferably in the range of 1,000 to 100,000. By setting the acid value and weight average molecular weight of the block copolymer within the above ranges, good dispersibility tends to be ensured.

In the case of having a quaternary ammonium salt group as a functional group, the specific structure of the polymer dispersant is not particularly limited, but from the viewpoint of dispersion, it is preferred to have a repeating structure represented by the following formula (i) unit (hereinafter, sometimes referred to as "repeating unit (i)").

[Chemical 45]

In the above formula (i), R ³¹ to R ³³ each independently represent a hydrogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, or an aralkyl group that may have a substituent; R ³¹ to R More than two of ³³ can bond with each other to form a cyclic structure; R ³⁴ is a hydrogen atom or a methyl group; X is a divalent linking group; Y ^- is a counter anion.

The carbon number of the alkyl group which may have a substituent among R ³¹ to R ³³ in the above formula (i) is not particularly limited, but is 1 or more, preferably 10 or less, and more preferably 6 or less. For example, it is 1-10, Preferably it is 1-6. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and the like. Among these, methyl, ethyl, and propyl are preferred. , butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. Moreover, it may be either linear or branched. Furthermore, cyclic structures such as cyclohexyl and cyclohexylmethyl may also be included.

The carbon number of the aryl group which may have a substituent among R ³¹ to R ³³ in the above formula (i) is not particularly limited, but is usually 6 or more, preferably 16 or less, and more preferably 12 or less. For example, it is 6-16, Preferably it is 6-12. Specific examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl. Among these, preferred are Phenyl, methylphenyl, ethylphenyl, dimethylphenyl or diethylphenyl, more preferably phenyl, methylphenyl or ethylphenyl.

The carbon number of the optionally substituted aralkyl group among R ³¹ to R ³³ in the above formula (i) is not particularly limited, but is usually 7 or more, preferably 16 or less, and more preferably 12 or less. For example, it is 7-16, Preferably it is 7-12. Specific examples of the aralkyl group include phenylmethyl (benzyl), phenylethyl (phenylethyl), phenylpropyl, phenylbutyl, phenylisopropyl, and the like. Among them, phenylmethyl, phenylethyl, phenylpropyl, or phenylbutyl is preferred, and phenylmethyl or phenylethyl is more preferred.

Among these, from the viewpoint of dispersibility, it is preferable that R ³¹ to R ³³ each independently be an alkyl group or an aralkyl group. Specifically, it is preferable that R ³¹ and R ³³ each independently be a methyl group. group, or ethyl group, and R ³² is phenylmethyl or phenylethyl, more preferably, R ³¹ and R ³³ are methyl, and R ³² is phenylmethyl.

In addition, when the above-mentioned polymer dispersant has a tertiary amine as a functional group, from the viewpoint of dispersibility, it is preferable to have a repeating unit represented by the following formula (ii) (hereinafter, the presence of a repeating unit is referred to as "repeating unit"). unit (ii)").

[Chemical 46]

In the above formula (ii), R ³⁵ and R ³⁶ are each independently a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent; R ³⁵ and R ³⁶ can bond with each other to form a cyclic structure; R ³⁷ is a hydrogen atom or a methyl group; Z is a divalent linking group.

As the alkyl group which may have a substituent in R ³⁵ and R ³⁶ of the above formula (ii), those exemplified as R ³¹ to R ³³ of the above formula (i) can be preferably used. As the aryl group which may have a substituent in R ³⁵ and R ³⁶ of the above formula (ii), those exemplified as R ³¹ to R ³³ of the above formula (i) are preferably used. As the aralkyl group which may have a substituent in R ³⁵ and R ³⁶ of the above formula (ii), those exemplified as R ³¹ to R ³³ of the above formula (i) are preferably used.

Among these, it is preferable that R ³⁵ and R ³⁶ are each independently an alkyl group which may have a substituent, and more preferably a methyl group or an ethyl group.

Examples of substituents that the alkyl group, aralkyl group or aryl group in R ³¹ to R ³³ in the above formula (i) and R ³⁵ and R ³⁶ in the above formula (ii) may have include: halogen atom, alkoxy group , benzyl group, hydroxyl group, etc.

In the above formulas (i) and (ii), examples of the divalent linking groups X and Z include an alkylene group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, and -CONH-R. ⁴³ -yl, -COOR ⁴⁴ -yl [wherein R ⁴³ and R ⁴⁴ are a single bond, an alkylene group with 1 to 10 carbon atoms, or an ether group (alkoxyalkyl group with 2 to 10 carbon atoms)], etc., Preferred is -COO-R ⁴⁴ - group. In addition, in the above formula (i), examples of the counter anion Y ^- include Cl ^- , Br ^- , I ^- , ClO ₄ ^- , BF ₄ ^- , CH ₃ COO ^- , PF ₆ ^- , etc.

The content ratio of the repeating unit represented by the above formula (i) is not particularly limited. From the viewpoint of dispersion, the content ratio of the repeating unit represented by the above formula (i) is the same as the content ratio of the repeating unit represented by the above formula (ii). The total content ratio of the repeating units is preferably 60 mol% or less, more preferably 50 mol% or less, further preferably 40 mol% or less, particularly preferably 35 mol% or less, and more preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 20 mol% or more, especially 30 mol% or more. For example, it is 5 to 60 mol%, preferably 10 to 50 mol%, more preferably 20 to 40 mol%, and still more preferably 30 to 35 mol%.

In addition, the content ratio of the repeating units represented by the above formula (i) in the total repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, more preferably It is preferably 5 mol% or more, more preferably 10 mol% or more, and preferably 50 mol% or less, more preferably 30 mol% or less, still more preferably 20 mol% or less, especially preferably It is less than 15 mol%. For example, it is 1 to 50 mol%, preferably 5 to 30 mol%, more preferably 10 to 20 mol%, and still more preferably 10 to 15 mol%.

In addition, the content ratio of the repeating units represented by the above formula (ii) in the total repeating units of the polymer dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 5 mol% or more, more preferably It is preferably 10 mol% or more, more preferably 15 mol% or more, especially 20 mol% or more, and preferably 60 mol% or less, more preferably 40 mol% or less, still more preferably It is 30 mol% or less, and it is especially preferable that it is 25 mol% or less. For example, it is 5 to 60 mol%, preferably 10 to 40 mol%, more preferably 15 to 30 mol%, and still more preferably 20 to 25 mol%.

Furthermore, from the viewpoint of improving compatibility with binder components such as solvents and improving dispersion stability, the polymer dispersant preferably has a repeating unit represented by the following formula (iii) (hereinafter, the presence of a repeating unit is referred to as "repeating unit"). unit (iii)").

[Chemical 47]

In the above formula (iii), R ⁴⁰ is an ethylene group or a propylene group; R ⁴¹ is an alkyl group which may have a substituent; R ⁴² is a hydrogen atom or a methyl group; n is an integer from 1 to 20.

The carbon number of the alkyl group which may have a substituent in R ⁴¹ of the above formula (iii) is not particularly limited, but is 1 or more, preferably 2 or more, and is preferably 10 or less, more preferably 6 or less. For example, it is 1-10, Preferably it is 2-6. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and the like. Among these, methyl, ethyl, and propyl are preferred. , butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. Moreover, it may be either linear or branched. Furthermore, cyclic structures such as cyclohexyl and cyclohexylmethyl may also be included. For example, the carbon number of the alkyl group is preferably 1 to 10, more preferably 2 to 6.

Furthermore, from the viewpoint of compatibility and dispersibility of binder components such as solvents, n in the above formula (iii) is 1 or more, preferably 2 or more, and preferably 10 or less, more preferably 5. the following. For example, it is 1-10, Preferably it is 2-5.

In addition, the content ratio of the repeating units represented by the above formula (iii) in the total repeating units of the polymer dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more. Furthermore, it is preferably 4 mol% or more, further preferably 30 mol% or less, more preferably 20 mol% or less, still more preferably 10 mol% or less. For example, it is 1 to 30 mol%, preferably 2 to 20 mol%, and more preferably 4 to 10 mol%. By setting it within the above range, there is a tendency that both compatibility with binder components such as solvents and dispersion stability can be achieved. For example, the content ratio of the repeating units represented by the above formula (iii) in the total repeating units of the polymer dispersant is preferably 1 to 30 mol%, more preferably 2 to 20 mol%, and still more preferably It is 4~10 mol%.

In addition, from the viewpoint of improving the compatibility of the dispersant with binder components such as solvents and improving the dispersion stability, the polymer dispersant preferably has a repeating unit represented by the following formula (iv) (hereinafter, there is "Repeating unit (iv)").

[Chemical 48]

In the above formula (iv), R ³⁸ is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent; R ³⁹ is a hydrogen atom or a methyl group.

The carbon number of the alkyl group which may have a substituent in R ³⁸ of the above formula (iv) is not particularly limited, but is 1 or more, preferably 2 or more, more preferably 4 or more, and preferably 10 or less, and more preferably The best value is below 8. Specific examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and the like. Among these, methyl, ethyl, and propyl are preferred. , butyl, pentyl, or hexyl, more preferably methyl, ethyl, propyl, or butyl. Moreover, it may be either linear or branched. Furthermore, cyclic structures such as cyclohexyl and cyclohexylmethyl may also be included. For example, the number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 2 to 8, and still more preferably 4 to 8.

The carbon number of the aryl group which may have a substituent in R ³⁸ of the above formula (iv) is not particularly limited, but is usually 6 or more, preferably 16 or less, more preferably 12 or less, still more preferably 8 or less. . Specific examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl. Among these, preferred are Phenyl, methylphenyl, ethylphenyl, dimethylphenyl or diethylphenyl, more preferably phenyl, methylphenyl or ethylphenyl. For example, the number of carbon atoms in the aryl group is preferably 6 to 16, more preferably 6 to 12, and still more preferably 8 to 12.

The carbon number of the aralkyl group which may have a substituent in R ³⁸ of the above formula (iv) is not particularly limited, but is usually 7 or more, preferably 16 or less, more preferably 12 or less, still more preferably 10 the following. Specific examples of the aralkyl group include phenylmethyl (benzyl), phenylethyl (phenylethyl), phenylpropyl, phenylbutyl, phenylisopropyl, and the like. Among them, phenylmethyl, phenylethyl, phenylpropyl, or phenylbutyl is preferred, and phenylmethyl or phenylethyl is more preferred. For example, the number of carbon atoms in the aralkyl group is preferably 7 to 16, more preferably 7 to 12, and still more preferably 7 to 10.

Among them, from the viewpoint of solvent compatibility and dispersion stability, R ³⁸ is preferably an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group, or a phenylmethyl group. Examples of substituents that the alkyl group in R ³⁸ may have include a halogen atom, an alkoxy group, and the like. In addition, examples of substituents that the aryl group or aralkyl group may have include chain alkyl groups, halogen atoms, alkoxy groups, and the like. In addition, the chain alkyl group represented by R ³⁸ includes both linear and branched chains.

Furthermore, from the viewpoint of dispersibility, the content ratio of the repeating units represented by the above formula (iv) in the total repeating units of the polymer dispersant is preferably 30 mol% or more, more preferably 40 mol%. % or more, more preferably 50 mol% or more, and preferably 80 mol% or less, more preferably 70 mol% or less. For example, it is 30-80 mol%, preferably 40-80 mol%, more preferably 50-70 mol%.

The polymer dispersant may also have repeating units other than repeating unit (i), repeating unit (ii), repeating unit (iii) and repeating unit (iv). Examples of such repeating units include repeating units derived from the following monomers: styrenic monomers such as styrene and α-methylstyrene; (meth)acrylic acid salts such as (meth)acrylic acid chloride; Monomers; (meth)acrylamide-based monomers such as (meth)acrylamide and N-hydroxymethylacrylamide; vinyl acetate; acrylonitrile; allyl glycidyl ether, glycidyl crotonate Ether; N-methacrylyl 𠰌line.

From the viewpoint of further improving dispersion, the polymer dispersant preferably contains an A block having repeating units (i) and repeating units (ii) and a B block having no repeating units (i) and repeating units (ii). Block copolymer. The block copolymer is preferably an A-B block copolymer or a B-A-B block copolymer. By introducing not only a quaternary ammonium salt group but also a tertiary amine group into the A block, the dispersing ability of the dispersant tends to be significantly improved unexpectedly. Moreover, it is preferable that the B block has the repeating unit (iii), and it is more preferable that it has the repeating unit (iv).

In the A block, the repeating unit (i) and the repeating unit (ii) may be contained in any form of random copolymerization or block copolymerization. In addition, the repeating unit (i) and the repeating unit (ii) may each contain two or more types in one A block. In this case, each repeating unit may be randomly copolymerized or block copolymerized in the A block. Contains any form.

Furthermore, the A block may contain repeating units other than the repeating unit (i) and the repeating unit (ii). Examples of such repeating units include repeating units derived from the above-mentioned (meth)acrylate monomers. Unit etc. The content of repeating units other than repeating unit (i) and repeating unit (ii) in the A block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and most preferably the repeating unit does not contain in the A block.

The B block may also contain repeating units other than repeating units (iii) and (iv). Examples of such repeating units include repeating units derived from the following monomers: styrene, α-methylstyrene Styrene-based monomers; (meth)acrylate-based monomers such as (meth)acrylyl chloride; (meth)acrylamide-based monomers such as (meth)acrylamide and N-hydroxymethylacrylamide Monomer; vinyl acetate; acrylonitrile; allyl glycidyl ether, crotonic acid glycidyl ether; N-methacrylamide. The content of repeating units other than repeating unit (iii) and repeating unit (iv) in the B block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and most preferably the repeating unit does not contain in the B block.

When the photosensitive colored resin composition of the present invention contains (F) a dispersant, its content ratio is not particularly limited, but it is preferably 0.1 mass % or more in the total solid content of the photosensitive colored resin composition. More preferably, it is 0.5 mass % or more, and more preferably, it is 8 mass % or less, more preferably 5 mass % or less, further preferably 3 mass % or less, especially 2 mass % or less. For example, it is 0.1-8 mass %, Preferably it is 0.1-5 mass %, More preferably, it is 0.5-3 mass %, Even more preferably, it is 0.5-2 mass %. By setting it to the above-mentioned lower limit value or more, there exists a tendency that the generation of residues due to aggregates can be suppressed, and by setting it below the said upper limit value, there exists a tendency for ink repellency or developability to improve.

[1-1-7]UV absorber The photosensitive colored resin composition of the present invention may also contain an ultraviolet absorber. The ultraviolet absorber is added for the purpose of controlling the photohardening distribution by absorbing a specific wavelength of the light source used for exposure using the ultraviolet absorber. By adding ultraviolet absorbers, the following effects can be achieved: forming high-definition barrier ribs with thin line widths, or removing residue remaining in non-exposed areas after development. As the ultraviolet absorber, from the viewpoint of suppressing the light absorption of the (B) photopolymerization initiator, for example, a compound having an absorption maximum between 250 nm and 400 nm in wavelength can be used. The ultraviolet absorber preferably contains any one or both of a benzotriazole-based compound and a tristriazole-based compound. It is believed that by including either or both benzotriazole-based compounds and tristriazole-based compounds, the light absorption rate of the initiator at the bottom of the film is reduced, and the line width at the bottom of the coating film becomes smaller, thereby forming a line width A thinner, high-definition barrier.

Examples of benzotriazole compounds include: 2-(5-methyl-2-hydroxyphenyl)benzotriazole, 2-(2-hydroxy-5-tert-butylphenyl)-2H-benzene Triazole, 3-[3-tertiary butyl-5-(5-chloro-2H-benzotriazol-2-yl)-4-hydroxyphenyl]octyl propionate, 3-[3-tertiary acid Butyl-5-(5-chloro-2H-benzotriazol-2-yl)-4-hydroxyphenyl]propionic acid ethylhexyl ester, 2-[2-hydroxy-3,5-bis(α, α-Dimethylbenzyl)phenyl]-2H-benzotriazole, 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, 2 -(3,5-Di-tertiary pentyl-2-hydroxyphenyl)benzotriazole, 2-(2'-hydroxy-5'-tertiary octylphenyl)benzotriazole, 2-( 2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol, 2-(2H-benzotriazol-2-yl)-6-( 1-Methyl-1-phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol, 3-[3-tert-butyl-5-(5-chloro-2H -Ester compounds of -benzotriazol-2-yl)-4-hydroxyphenyl]propionic acid and C7-9 linear and branched chain alkyl alcohols.

Examples of commercially available benzotriazole compounds include SUMISORB (registered trademark, the same below) 200, SUMISORB250, SUMISORB300, SUMISORB340, SUMISORB350 (manufactured by Sumitomo Chemical), JF77, JF78, JF79, JF80, JF83 (Johoku Chemical) Industrial manufacturing), TINUVIN (registered trademark, the same below) PS, TINUVIN99-2, TINUVIN109, TINUVIN384-2, TINUVIN326, TINUVIN900, TINUVIN928, TINUVIN1130 (manufactured by BASF), EVERSORB70, EVERSORB71, EVERSORB72, EVERSORB73, EVERSORB74, EVERSORB75, EVERSORB76 , EVERSORB234, EVERSORB77, EVERSORB78, EVERSORB80, EVERSORB81 (manufactured by Taiwan Yongguang Chemical Industry), TOMISORB (registered trademark, the same below) 100, TOMISORB600 (manufactured by API Corporation), SEESORB (registered trademark, the same below) 701, SEESORB702, SEESORB703, SEESORB704, SEESORB706, SEESORB707, SEESORB709 (manufactured by Shipro Kasei), RUVA-93 (Otsuka Chemical Co., Ltd.), etc.

Examples of trisulfonate-based compounds include: 2-[4,6-bis(2,4-dimethylphenyl)-1,3,5-trisaccharide-2-yl]-5-octyloxyphenol, 2- [4,6-bis(2,4-dimethylphenyl)-1,3,5-tris-2-yl]-5-[3-(dodecyloxy)-2-hydroxypropoxy base]phenol, 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-trihydroxyphenyl and 2-ethylhexyl glycidyl The reaction product of ether, 2,4-bis[2-hydroxy-4-butoxyphenyl]-6-(2,4-dibutoxyphenyl)-1,3-5-trihydroxyphenyl, etc. Among these, the hydroxyphenyltrifluoroethylene compound is preferred from the viewpoint of ink repellency and formation of high-definition barrier ribs with thin line widths. Examples of commercially available tertiary compounds include TINUVIN400, TINUVIN405, TINUVIN460, TINUVIN477, and TINUVIN479 (manufactured by BASF).

Examples of other ultraviolet absorbers include benzophenone compounds, benzoate compounds, cinnamic acid derivatives, naphthalene derivatives, anthracene and its derivatives, dinaphthalene compounds, phenanthroline compounds, dyes, and the like. More specifically, examples include SUMISORB130 (manufactured by Sumitomo Chemical), EVERSORB10, EVERSORB11, EVERSORB12 (manufactured by Taiwan Ever-Kwang Chemical Industry), TOMISORB800 (manufactured by API Corporation), SEESORB100, SEESORB101, SEESORB101S, SEESORB102, SEESORB103, SEESORB105, SEESORB106, Benzophenone compounds such as SEESORB107 and SEESORB151 (manufactured by Shipro Kasei); benzoate compounds such as SUMISORB400 (manufactured by Sumitomo Chemical), phenyl salicylate; 2-ethylhexyl cinnamate, p-methoxycinnamic acid 2 -Cinnamic acid derivatives such as ethylhexyl, isopropyl methoxycinnamate, isopentyl methoxycinnamate; α-naphthol, β-naphthol, α-naphthol methyl ether, α-naphthol Diethyl ether, 1,2-dihydroxynaphthalene, 1,3-dihydroxynaphthalene, 1,4-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 1,7-dihydroxynaphthalene, Naphthalene derivatives such as 1,8-dihydroxynaphthalene, 2,3-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 2,7-dihydroxynaphthalene; anthracene, 9,10-dihydroxyanthracene and other anthracenes and their derivatives Materials; azo dyes, benzophenone dyes, aminoketone dyes, quinoline dyes, anthraquinone dyes, diphenylcyanoacrylate dyes, triphenylcyanoacrylate dyes, p-aminobenzoic acid Department of dyes and other dyes. Among them, from the viewpoint of ink repellency, it is preferable to use cinnamic acid derivatives and naphthalene derivatives, and particularly preferably to use cinnamic acid derivatives. One type of these light absorbers may be used alone, or two or more types may be used in combination.

Among these, from the viewpoint of a tapered shape, benzotriazole compounds and hydroxyphenyltrioxane compounds are preferred, and benzotriazole compounds are particularly preferred.

As the ultraviolet absorber, one type may be used alone, or two or more types may be used in combination.

When the photosensitive colored resin composition of the present invention contains an ultraviolet absorber, the content ratio is not particularly limited. In the total solid content of the photosensitive colored resin composition, it is usually 0.01 mass % or more, preferably 0.05 mass% or more, more preferably 0.1 mass% or more, further preferably 0.5 mass% or more, especially 1 mass% or more, and usually 15 mass% or less, preferably 10 mass% or less, more preferably 5 mass% or less, and more preferably 3 mass% or less. For example, when an ultraviolet absorber is contained, it is 0.01 to 15 mass%, preferably 0.05 to 15 mass%, more preferably 0.1 to 10 mass%, further preferably 0.5 to 5 mass%, and particularly preferably 1 ~3% by mass. By setting the value above the above lower limit, there is a tendency that high-definition barrier ribs with thin line widths can be formed, and by setting the value below the above upper limit, the ink repellency tends to be improved.

Moreover, when the photosensitive colored resin composition of the present invention contains an ultraviolet absorber, the compounding ratio with respect to (B) photopolymerization initiator is 100 parts by mass of (B) photopolymerization initiator. The compounding amount of the ultraviolet absorber is usually 1 part by mass or more, preferably 10 parts by mass or more, more preferably 30 parts by mass or more, further preferably 50 parts by mass or more, especially 80 parts by mass or more, and usually It is 500 parts by mass or less, preferably 300 parts by mass or less, more preferably 200 parts by mass or less, and still more preferably 100 parts by mass or less. For example, when containing an ultraviolet absorber, it is 1 to 500 parts by mass, preferably 10 to 300 parts by mass, more preferably 30 to 200 parts by mass, still more preferably 50 to 200 parts by mass, and particularly preferably 80 parts by mass. ~100 parts by mass. By setting the value above the above lower limit, there is a tendency that high-definition barrier ribs with thin line widths can be formed, and by setting the value below the above upper limit, the ink repellency tends to be improved.

[1-1-8]Polymerization inhibitor The photosensitive colored resin composition of the present invention preferably contains a polymerization inhibitor. By containing a polymerization inhibitor, radical polymerization is suppressed, thereby tending to increase the taper angle of the resulting barrier ribs. Examples of polymerization inhibitors include hydroquinone, hydroquinone monomethyl ether, methyl hydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-cresol (BHT )wait. Among these, from the viewpoint of polymerization inhibitory ability, hydroquinone or methoxyphenol is preferred, and methylhydroquinone is more preferred.

It is preferable to contain 1 type or 2 or more types of polymerization inhibitors. Usually, when producing (C) alkali-soluble resin, a polymerization inhibitor may be included in the resin. It may be used as it is, or in addition to the polymerization inhibitor contained in the resin, the same polymerization inhibitor may be added during production of the photosensitive colored resin composition. or different polymerization inhibitors.

When the photosensitive colored resin composition contains a polymerization inhibitor, the content ratio is not particularly limited. In the total solid content of the photosensitive colored resin composition, it is usually 0.0005 mass % or more, preferably 0.001 mass %. Above, more preferably 0.01 mass % or more, and usually 0.1 mass % or less, preferably 0.08 mass % or less, more preferably 0.05 mass % or less. For example, when a polymerization inhibitor is contained, the content is 0.0005 to 0.1 mass%, preferably 0.001 to 0.08 mass%, and more preferably 0.01 to 0.05 mass%. By setting it to the above lower limit value or more, the taper angle tends to be increased, and by setting it to below the above upper limit value, the ink repellency tends to become higher.

[1-1-9] Thermal polymerization initiator Furthermore, the photosensitive colored resin composition of the present invention may contain a thermal polymerization initiator. By containing a thermal polymerization initiator, the cross-linking degree of the film tends to be increased. Specific examples of such thermal polymerization initiators include azo compounds, organic peroxides, hydrogen peroxide, and the like. These may be used individually by 1 type, and may be used in combination of 2 or more types.

Furthermore, when a thermal polymerization initiator is used in combination with a photopolymerization initiator in order to improve the ink repellency or increase the cross-linking density of the film, it is preferable that the total of these content ratios becomes the photosensitivity The content ratio of the photopolymerization initiator in the colored resin composition, and the ratio of the combined use of the photopolymerization initiator and the thermal polymerization initiator, from the viewpoint of ink repellency, is preferably The initial amount is 100 parts by mass, and the thermal polymerization initiator is 5 to 300 parts by mass.

[1-1-10]Amine compound The photosensitive colored resin composition of the present invention may contain an amino compound in order to accelerate thermal hardening. When an amino compound is included, the content ratio of the amino compound in the total solid content of the photosensitive colored resin composition is usually 40 mass % or less, preferably 30 mass % or less. Moreover, it is usually 0.5 mass % or more, and preferably 1 mass % or more. For example, when an amino compound is contained, it is 0.5-40 mass %, Preferably it is 1-30 mass %. By setting the value below the above-mentioned upper limit, storage stability tends to be maintained, and by setting it above the above-mentioned lower limit, sufficient thermosetting properties tend to be ensured.

Examples of the amino compound include an amino compound having at least two hydroxymethyl groups and an alkoxymethyl group as a functional group, which is modified by condensation-modification with an alcohol having 1 to 8 carbon atoms. Specific examples include: melamine resin obtained by condensing melamine and formaldehyde; benzoguanamine resin obtained by condensing benzoguanamine and formaldehyde; glycoluril obtained by condensing glycoluril and formaldehyde. Resin; urea resin obtained by condensing urea and formaldehyde; resin obtained by cocondensing two or more types of melamine, benzoguanamine, glycoluril, or urea with formaldehyde; hydroxymethyl group of the above resin Modified resin obtained by alcohol condensation modification, etc. These may be used individually by 1 type, and may be used in combination of 2 or more types. As the amine compound, melamine resin and its modified resin are preferred, and a modified resin having a methylol modification ratio of 70% or more is more preferred, and a hydroxymethyl modification ratio of 80% is particularly preferred. The above modified resin.

Specific examples of the above-mentioned amino compound include melamine resin and modified resins thereof: "Cymel" (registered trademark, the same below) 300, 301, 303, 350, 736, 738, 370, 771 manufactured by Cytec Corporation, 325, 327, 703, 701, 266, 267, 285, 232, 235, 238, 1141, 272, 254, 202, 1156, 1158, and "NIKALAC" (registered trademark, the same below) MW manufactured by Sanwa Chemical Co., Ltd. -390, MW-100LM, MX-750LM, MW-30M, MX-45, MX-302, etc. Examples of the benzoguanamine resin and its modified resin include "Cymel" 1123, 1125, and 1128 manufactured by Cytec Corporation. Examples of the glycoluril resin and its modified resin include "Cymel" 1170, 1171, 1174, and 1172 manufactured by Cytec Corporation, and "NIKALAC" MX-270 manufactured by Sanwa Chemical Corporation. Examples of the urea resin and its modified resin include "UFR" (registered trademark) 65 and 300 manufactured by Cytec Corporation, and "NIKALAC" MX-290 manufactured by Sanwa Chemical Corporation.

[1-1-11] Silane coupling agent In order to improve the adhesiveness with the substrate, it is also preferable to add a silane coupling agent to the photosensitive colored resin composition of the present invention. As the type of silane coupling agent, various types such as epoxy type, methacrylic type, amino type, imidazole type, etc. can be used. From the viewpoint of improving the adhesion, especially epoxy type and imidazole type silane coupling agents are relatively good. Regarding the content, when a silane coupling agent is included, from the viewpoint of adhesiveness, it is usually 20 mass% or less, preferably 15 mass% or less, in the total solid content of the photosensitive colored resin composition.

[1-1-12]Inorganic filler In addition, the photosensitive colored resin composition of the present invention can also be used to improve the strength of the cured product and to provide excellent verticality and verticality of the coating film obtained by moderate interaction with the alkali-soluble resin (formation of the matrix structure). Inorganic fillers are further included for the purpose of improving the taper angle. Examples of such inorganic fillers include talc, silica, alumina, barium sulfate, magnesium oxide, titanium oxide, or those obtained by surface treatment with various silane coupling agents.

The average particle size of these inorganic fillers is usually 0.005 to 2 μm, preferably 0.01 to 1 μm. Here, the average particle diameter in this embodiment is a value measured by a laser diffraction scattering particle size distribution measuring device or a dynamic light scattering device manufactured by Beckman Coulter Co., Ltd. or the like. Among these inorganic fillers, silica sol and modified silica sol, in particular, tend to have excellent dispersion stability and cone angle improvement effects, so they are preferably formulated. When the photosensitive colored resin composition of the present invention contains such inorganic fillers, the content thereof is usually 5 mass % or more, preferably 5 mass % or more, and preferably 5 mass % or more of the total solid content from the viewpoint of ink repellency. 10% by mass or more, and usually 80% by mass or less, preferably 70% by mass or less. For example, when the photosensitive colored resin composition contains an inorganic filler, the content ratio in the total solid content of the photosensitive colored resin composition is preferably 5 to 80 mass %, more preferably 10 to 70 mass %.

[1-1-13] Adhesion improving agent The photosensitive colored resin composition of the present invention may contain a phosphoric acid-based vinyl monomer for the purpose of imparting adhesiveness to a substrate. As the phosphoric acid-based vinyl monomer, phosphate esters containing a (meth)acryloxy group are preferred, and those represented by the following general formulas (g1), (g2), and (g3) are preferred.

[Chemical 49]

[In the above general formulas (g1), (g2) and (g3), R ⁵¹ represents a hydrogen atom or a methyl group, l and l' are integers from 1 to 10, and m is 1, 2 or 3]

One type of these phosphoric acid-based vinyl monomers may be used alone, or two or more types may be used in combination. When these phosphoric acid-based vinyl monomers are used, the content ratio in the total solid content of the photosensitive colored resin composition is usually preferably 0.02 mass % or more, more preferably 0.05 mass % or more, and still more preferably 0.1 It is 0.2 mass % or more, especially 0.2 mass % or more. Furthermore, the content is preferably 4 mass% or less, more preferably 3 mass% or less, further preferably 2 mass% or less, and particularly preferably 1 mass% or less. For example, when a phosphoric acid-based vinyl monomer is included, it is 0.02 to 4 mass%, preferably 0.05 to 3 mass%, more preferably 0.1 to 2 mass%, and still more preferably 0.2 to 1 mass%. By setting the value above the lower limit, the effect of improving the adhesion to the substrate tends to be sufficient. On the other hand, by setting it below the upper limit, deterioration in the adhesion to the substrate tends to be suppressed. tendency.

[1-1-14]Solvent The photosensitive colored resin composition of the present invention usually contains a solvent, and is used in a state in which the above-mentioned components are dissolved or dispersed in the solvent. The solvent is not particularly limited, and examples thereof include the organic solvents described below.

Such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol-tertiary butyl ether , diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methyl-3-methoxybutanol, 3-Methoxy-1-butanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether and glycol monoalkyl ethers; Such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol Dibutyl ether, dipropylene glycol dimethyl ether and glycol dialkyl ethers; Such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropylene Ether acetate, propylene glycol monobutyl ether acetate, 3-methoxy-1-butyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether ethyl Acid ester, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, 3-methyl acetate Diol alkyl ether acetates of 3-methoxybutyl ester; Ethylene glycol diacetate, propylene glycol diacetate, 1,3-butanediol diacetate, 1,4-butanediol diacetate, 1,6-hexanol diacetate, etc. Alcohol diacetates; Alkyl acetates such as cyclohexyl acetate; Ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, dipyl ether, ethyl isobutyl ether, and dihexyl ether; Such as acetone, methyl ethyl ketone, methyl isopropyl ketone, methyl amyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexan Ketones, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxymethyl pentanone; Such as methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerin , benzyl alcohol monobasic or polyhydric alcohols; Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, and dodecane; Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and bicyclohexyl; Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene; Such as amyl formate, ethyl formate, ethyl acetate, propyl acetate, butyl acetate, amyl acetate, methyl isobutyrate, ethyl propionate, propyl propionate, butyl butyrate, isobutyrate Ester, methyl isobutyrate, ethyl octanoate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, 3-methoxypropionate Chain or cyclic esters of ethyl propionate, 3-methoxypropyl propionate, 3-methoxybutyl propionate, and γ-butyrolactone; Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as chlorobutane and chloropentane; Ether ketones such as methoxymethylpentanone; Nitriles such as acetonitrile and benzonitrile; Such as tetrahydrofuran, dimethyltetrahydrofuran, dimethoxytetrahydrofuran and other tetrahydrofurans.

Examples of such commercially available solvents include: mineral spirit, Varsol#2, Apco#18 Solvent, Apco thinner, Socal Solvent No.1 and No.2, Solvesso#150, Shell TS28 Solvent, Carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, diethylene glycol Dimethyl ether (all are trade names), etc.

The above-mentioned solvent can dissolve or disperse each component in the photosensitive colored resin composition, and is selected according to the method of using the photosensitive colored resin composition of the present invention. From the viewpoint of coating properties, atmospheric pressure is preferably selected. The boiling point below is in the range of 60 to 280℃. More preferably, it has a boiling point of 70° C. or more and 260° C. or less. For example, propylene glycol monomethyl ether, 3-methoxy-1-butanol, propylene glycol monomethyl ether acetate, and 3-methoxy-acetate are more preferred. 1-Butyl ester.

One type of these solvents may be used alone, or two or more types may be used in combination. Moreover, these solvents are preferably such that the content ratio of the total solid content in the photosensitive colored resin composition solution is usually 10% by mass or more, preferably 15% by mass or more, more preferably 20% by mass or more, and still more. It is preferably 25 mass% or more, and usually 90 mass% or less, preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 35 mass% or less. For example, it is 10-90 mass %, Preferably it is 15-50 mass %, More preferably, it is 20-40 mass %, Even more preferably, it is 25-35 mass %. By being equal to or more than the above-mentioned lower limit, the occurrence of uneven coating tends to be suppressed, and by being equal to or less than the above-mentioned upper limit, the occurrence of foreign matter, shrinkage, etc. tends to be suppressed.

[1-2] Preparation method of photosensitive colored resin composition The photosensitive colored resin composition of the present invention can be prepared by mixing the above-mentioned components with a mixer. The photosensitive colored resin composition of the present invention contains solvent-insoluble components such as purple pigment as the colorant (E). Therefore, it is preferable to use a paint conditioner, a sand mill, a ball mill, a roller mill, a stone mill, and a jet mill in advance. machine, homogenizer, etc. for dispersion processing. (E) The colorant is converted into fine particles by dispersion treatment, so the coating characteristics of the photosensitive colored resin composition are improved.

The dispersion treatment is generally preferably carried out by a system in which part or all of (E) a colorant, a solvent, and (F) a dispersant, and (C) an alkali-soluble resin are used in combination (hereinafter, there are mixtures to be used for the dispersion treatment, and the composition obtained by dispersion treatment is called "pigment dispersion"). In particular, it is preferable to use a polymeric dispersant as the dispersant (F) because the resulting pigment dispersion and the photosensitive colored resin composition are prevented from increasing in viscosity over time, that is, the dispersion stability is excellent. In this way, in the step of producing the photosensitive colored resin composition, it is preferable to produce a pigment dispersion liquid containing at least (E) a colorant, a solvent, and (F) a dispersant. As the (E) colorant, organic solvent, and (F) dispersant that can be used in the pigment dispersion liquid, those described as those that can be used in the photosensitive colored resin composition can be preferably used. In addition, as the content ratio of each colorant of the (E) colorant in the pigment dispersion liquid, the content ratio described as the content ratio in the photosensitive colored resin composition can also be preferably used.

When dispersing the colorant (E) using a sand mill, glass beads or zirconia beads with a particle size of about 0.1 to 8 mm can be preferably used. Regarding the dispersion treatment conditions, the temperature is usually in the range of 0°C to 100°C, preferably in the range of room temperature to 80°C. Regarding the dispersion time, the appropriate time differs depending on the composition of the solution, the size of the dispersion processing device, etc., so it should be adjusted appropriately. The purpose of the dispersion is to control the gloss of the ink so that the 20-degree mirror gloss (JIS Z8741) of the photosensitive colored resin composition falls within the range of 50 to 300.

In addition, the dispersed particle size of the pigment dispersed in the pigment dispersion is usually 0.01 to 1 μm, preferably 0.02 to 0.5 μm, and further preferably 0.03 to 0.3 μm, and is determined by dynamic light scattering method or the like as a number basis. Measured by median diameter. Then, the ink obtained by the above-mentioned dispersion treatment and the above-mentioned other components contained in the photosensitive colored resin composition are mixed to prepare a uniform solution. In the production process of the photosensitive colored resin composition, fine contaminants may be mixed into the solution. Therefore, the obtained photosensitive colored resin composition is preferably filtered through a filter or the like.

[2] Barrier walls and methods of forming them The cured product of the present invention is obtained by curing the photosensitive colored resin composition of the present invention. Furthermore, the barrier rib of the present invention is composed of the hardened material of the present invention. The photosensitive colored resin composition of the present invention can be used to form barrier ribs, and is particularly preferably used to form barrier ribs for dividing pixel portions in color filters containing luminescent nanocrystalline particles. The method of forming the barrier rib using the photosensitive colored resin composition is not particularly limited, and a conventionally known method can be used. Examples of a method for forming a barrier rib include a method including a coating step of applying a photosensitive colored resin composition on a substrate to form a photosensitive colored resin composition layer, and a step of applying the photosensitive colored resin composition to a substrate. Exposure step for layer exposure. Specific examples of methods for forming such barrier ribs include inkjet methods and photolithography methods.

In the inkjet method, a photosensitive colored resin composition whose viscosity has been adjusted by dilution with a solvent or the like is used as ink, and ink droplets are ejected onto a substrate along a specific pattern of barrier ribs by the inkjet method. Thereby, the photosensitive colored resin composition is coated on the substrate to form a pattern of uncured barrier ribs. Then, the pattern of the unhardened barrier ribs is exposed to form hardened barrier ribs on the substrate. The pattern of the unhardened barrier ribs is exposed in the same manner as the exposure step in the photolithography method described below, except that a photomask is not used.

In the photolithography method, the photosensitive colored resin composition is coated on the entire area of the substrate where barrier ribs are to be formed to form a photosensitive colored resin composition layer. After the formed photosensitive colored resin composition layer is exposed corresponding to a specific barrier rib pattern, the exposed photosensitive colored resin composition layer is developed to form barrier ribs on the substrate.

In the coating step of coating the photosensitive colored resin composition on the substrate in the photolithography method, contact transfer coating such as a roll coater, reverse coater, and rod coater is used The device or non-contact coating device such as a rotator (rotary coating device) or a curtain flow coater (curtain flow coater) is used to coat the photosensitive colored resin composition on the substrate where the barrier ribs are to be formed. The solvent needs to be removed by drying to form a photosensitive colored resin composition layer.

Then, in the exposure step, a negative photomask is used to irradiate the photosensitive colored resin composition layer with active energy rays such as ultraviolet rays and excimer laser light, and the photosensitive colored resin composition layer is partially exposed in accordance with the pattern of the barrier ribs. exposure. Light sources that emit ultraviolet light such as high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, and carbon arc lamps can be used during exposure. The exposure amount also varies depending on the composition of the photosensitive colored resin composition, but for example, it is preferably about 10 to 400 mJ/cm ² .

Then, in the development step, the exposed photosensitive colored resin composition layer corresponding to the pattern of the barrier ribs is developed with a developer, thereby forming the barrier ribs. The development method is not particularly limited, and dipping method, spray method, etc. can be used. Specific examples of the developer include organic ones such as dimethylbenzylamine, monoethanolamine, diethanolamine, and triethanolamine, or aqueous solutions of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salts, etc. . In addition, a defoaming agent or surfactant can also be added to the developer. A post-exposure step can also be added after development. Light sources that emit ultraviolet light such as high-pressure mercury lamps, ultra-high-pressure mercury lamps, xenon lamps, and carbon arc lamps can be used during exposure. The same light source as the above exposure step or a different light source can be used. The exposure amount also varies depending on the composition of the photosensitive colored resin composition, but for example, it is preferably about 10 mJ/cm ² to 5 J/cm ² . The post-exposure step is suitable for increasing the taper angle.

Thereafter, the developed barrier ribs are post-baked and heat-hardened. Post-baking is preferably performed at 150 to 250°C for 15 to 60 minutes.

The substrate used for forming the barrier ribs is not particularly limited, and can be appropriately selected according to the type of organic electroluminescent element manufactured using the substrate on which the barrier ribs are formed. Preferred materials for the substrate include glass or various resin materials. Specific examples of the resin material include: polyesters such as polyethylene terephthalate; polyolefins such as polyethylene and polypropylene; polycarbonate; poly(meth)acrylic resins; polyethylene; polyester. imine. Among the materials of the substrate, glass and polyimide are preferred in terms of excellent heat resistance. In addition, depending on the type of organic electroluminescent element to be manufactured, a transparent electrode layer such as ITO or ZnO may be provided in advance on the surface of the substrate on which the barrier ribs are formed.

The film thickness of the barrier rib of the present invention is usually 0.1 μm or more, preferably 1 μm or more, more preferably 5 μm or more, further preferably 10 μm or more, and usually 1 mm or less, preferably 100 μm or less. It is more preferably 50 μm or less, still more preferably 30 μm or less, and particularly preferably 20 μm or less. For example, it is 0.1 μm to 1 mm, preferably 1 to 100 μm, more preferably 1 to 50 μm, further preferably 5 to 30 μm, and particularly preferably 10 to 20 μm. By setting it as above the said lower limit value, the light-shielding property tends to improve, and by setting it as below the said upper limit value, there exists a tendency for the adhesiveness to improve. The film thickness of the barrier rib is measured using a step, surface roughness, and fine shape measuring device, a scanning white interference microscope, an ellipsometer, a reflection spectroscopic film thickness meter, and an electron microscope.

[3] Color filters containing luminescent nanocrystalline particles The image display device of the present invention includes the barrier rib of the present invention. The image display device of the present invention includes, for example, a color filter containing luminescent nanocrystalline particles. When the image display device of the present invention is provided with a color filter containing luminescent nanoparticles, the color filter containing luminescent nanocrystalline particles only needs to have the barrier rib of the present invention composed of the cured product of the present invention. There is no particular limitation, and examples include those in which pixels are formed in areas divided by the barrier ribs of the present invention.

FIG. 1 is a schematic cross-sectional view of an example of a color filter equipped with barrier ribs of the present invention. As shown in FIG. 1 , the color filter 100 includes a substrate 10 , barrier ribs 20 provided on the substrate, red pixels 30 , green pixels 40 , and blue pixels 50 . The red pixels 30, the green pixels 40, and the blue pixels 50 are arranged in a grid pattern in a sequential and repeated manner. The barrier ribs 20 are disposed between the adjacent pixels. In other words, the adjacent pixels are divided from each other by the barrier ribs 20 .

The red pixel 30 includes red luminescent nanocrystalline particles 2 , and the green pixel 40 includes green luminescent nanocrystalline particles 1 . The blue pixel 50 is a pixel that transmits blue light from the light source.

These luminescent nanocrystalline particles are nanosized crystals that absorb excitation light and emit fluorescence or phosphorescence. For example, the maximum particle size measured by a transmission electron microscope or a scanning electron microscope is less than 100 nm. Crystalline.

By absorbing light of a specific wavelength, luminescent nanocrystalline particles can emit light of a different wavelength (fluorescence or phosphorescence) than the absorbed wavelength. For example, the red luminescent nanocrystalline particles 2 emit light (red light) having a luminescence peak wavelength in the range of 605 to 665 nm. For example, the green luminescent nanocrystal particles 1 emit light (green light) having an emission peak wavelength in the range of 500 to 560 nm.

According to the solution of the Schrödinger wave equation of the square well potential energy model, the wavelength (luminescence color) of the light emitted by the luminescent nanocrystalline particles depends on the size (such as particle diameter) of the luminescent nanocrystalline particles, and also depends on the size of the luminescent nanocrystalline particles. The energy gap possessed by crystalline particles. Therefore, by changing the constituent materials and sizes of the luminescent nanocrystal particles used, the luminescent color can be selected. Examples of luminescent nanocrystalline particles include quantum dots and the like.

Generally speaking, the light absorbed by luminescent nanocrystalline particles is light with a wavelength of 400 to 500 nm (blue light). However, red luminescent nanocrystalline particles not only absorb blue light, but also absorb green light near 600 nm. inspired by the light. Even if the light source is controlled to extinguish the red pixel, there may be cases where the red luminescent nanocrystal particles of the red pixel are excited due to the light emission of the adjacent green pixel, causing the red pixel to emit light. Since the content ratio of the purple pigment in the (E) colorant is increased, the barrier rib of the present invention can efficiently absorb the green light from the green pixel. Therefore, the intrusion of green light into adjacent red pixels can be reduced, and the excitation of red luminescent nanocrystalline particles can be suppressed. As a result, it is considered that the color reproducibility of the image display device can be improved.

The method of manufacturing a color filter containing luminescent nanocrystal particles is not particularly limited. Examples include the following method: preparing a substrate with barrier ribs made of the cured product of the present invention, and forming a luminescent color filter in a region divided by the barrier ribs. A layer of nanocrystalline particles. The method of forming a layer containing luminescent nanocrystalline particles is not particularly limited. For example, it can be produced by the following method: selectively attaching an ink composition containing luminescent nanocrystalline particles by an inkjet method, and using active energy to Radiation of light or heating hardens the ink composition.

[4]Image display device The image display device of the present invention includes the barrier rib of the present invention made of the hardened material of the present invention. For example, an image display device including a color filter including the barrier rib of the present invention and a layer containing luminescent nanocrystal particles can be cited. Examples of types of image display devices include liquid crystal display devices, image display devices including organic electroluminescent elements, and the like. In the case of a liquid crystal display device, examples include a liquid crystal layer including a light source having a blue LED and an electrode that controls blue light emitted from the light source corresponding to each pixel portion. On the other hand, as an image display device including an organic electroluminescent element, an organic electroluminescent element that emits blue light is arranged at a position corresponding to each pixel portion of the color filter. Specifically, the method described in Japanese Patent Application Laid-Open No. 2019-87746 can be cited. [Example]

Hereinafter, the photosensitive colored resin composition of the present invention will be described with reference to specific examples. However, the present invention is not limited to the following examples as long as the gist thereof is not exceeded. The components of the photosensitive colored resin composition used in the following Examples and Comparative Examples are as follows.

＜Alkali-soluble resin-I＞ Copolymerization of acrylic acid and dicyclopentyl methacrylate/styrene/glycidyl methacrylate (molar ratio: 0.30/0.10/0.60) as constituent monomers in equal amounts to glycidyl methacrylate The resin is subjected to an addition reaction, and the tetrahydrophthalic anhydride is added to the copolymer resin in such a manner that the total mole number per mole of the above-mentioned constituent monomers becomes 0.39 moles. Alkali-soluble acrylic copolymer resin. The weight average molecular weight (Mw) measured by GPC in terms of polystyrene is 9000, and the acid value of the solid content is 80 mgKOH/g.

＜Alkali-soluble resin-II＞ Copolymerization of acrylic acid and dicyclopentyl methacrylate/styrene/glycidyl methacrylate (molar ratio: 0.02/0.05/0.93) as constituent monomers in equal amounts to glycidyl methacrylate The resin undergoes an addition reaction, and alkali-soluble acrylic acid obtained by adding tetrahydrophthalic anhydride is added so that the total mole number of the above-mentioned constituent monomers relative to the above-mentioned copolymer resin becomes 0.10 moles per 1 mole. Copolymer resin. The weight average molecular weight (Mw) measured by GPC in terms of polystyrene was 7700, and the acid value of the solid content was 28.5 mgKOH/g.

＜Alkali-soluble resin-III＞ ZCR-1642H manufactured by Nippon Chemical Company (weight average molecular weight Mw=6500, acid value=98 mgKOH/g)

＜Dispersant-I＞ BYK-LPN21116 manufactured by BYK-Chemie (acrylic A-B block copolymer including A block with quaternary ammonium salt group and tertiary amine group and B block without quaternary ammonium salt group and tertiary amine group) substance. The amine value is 70 mgKOH/g. The acid value is below 1 mgKOH/g)

＜Solvent-I＞ PGMEA: propylene glycol monomethyl ether acetate ＜Solvent-II＞ MB: 3-methoxy-1-butanol

＜Photopolymerizable monomer＞ DPHA: dipentaerythritol hexaacrylate manufactured by Nippon Chemical Co., Ltd.

＜Photopolymerization initiator-I＞ Use compounds with the following chemical structures.

[Chemical 50]

＜Photopolymerization Initiator-II＞ Use compounds with the following chemical structures.

[Chemistry 51]

＜Liquid repellent-I＞ Megafac RS-90 manufactured by DIC (fluorine-based liquid repellent with vinyl double bonds)

＜Surfactant-I＞ Megafac F-559 manufactured by DIC (fluorine-based surfactant without cross-linking groups)

＜Additive-I＞ Karenz MT PE1 (pentaerythritol tetrakis(3-mercaptobutyrate)) manufactured by Showa Denko Co., Ltd. ＜Additive-II＞ KAYAMER PM-21 (phosphate containing methacrylic acid group) manufactured by Nippon Kayaku Co., Ltd.

<Preparation of Pigment Dispersions 1 to 5> The pigment, dispersant, alkali-soluble resin, and solvent were mixed so as to have the mass ratio described in Table 1. The solution was dispersed for 3 hours using a paint shaker in a temperature range of 25 to 45°C. Beads use 0.5 mm For zirconia beads, add 2.5 times the mass of the dispersion. After the dispersion is completed, the beads and the dispersion liquid are separated with a filter to prepare pigment dispersions 1 to 5. Furthermore, the solvent preparation ratio in Table 1 also includes the amount of solvent derived from the dispersant and the alkali-soluble resin.

[Table 1] Pigment dispersion 1 2 3 4 5 Mixing ratio (mass parts) Pigments CI Pigment Violet 29 100 0 0 0 0 CI Pigment Orange 64 0 100 0 0 0 CI Pigment Blue 60 0 0 100 0 0 CI Pigment Blue 15:6 0 0 0 100 0 CI Pigment Violet 23 0 0 0 0 100 Dispersant (solid content conversion) Dispersant-I twenty two 20 20 33 33 Alkali-soluble resin (solid content conversion) Alkali soluble resin-I 33 50 33 50 33 Solvent Solvent-I 367 413 374 440 400 Solvent-II 92 103 93 110 100

[Examples 1 to 8 and Comparative Examples 1 to 3] Using the pigment dispersions 1 to 5 prepared above, add each component so that the ratio of the solid content of each component in the total solid content becomes the blending ratio in Table 2, and further, the content ratio of the total solid content becomes 31 The solvent was added in mass % so that solvent-I/solvent-II=80/20 (mass ratio) in the total solvent, and stirred and dissolved to prepare photosensitive colored resin compositions 1 to 11. Each of the obtained photosensitive colored resin compositions was used for evaluation by the following method. In addition, the compounding ratios of the pigment dispersion liquid, alkali-soluble resin, and liquid repellent agent in Table 2 are the solid content conversion values.

[Table 2] Example Comparative example 1 2 3 4 5 6 7 8 1 2 3 Composition 1 2 3 6 7 8 9 10 4 5 11 Mixing ratio (parts by weight) Pigment dispersion 1 (solid content conversion) 6.69 4.01 3.34 6.02 6.02 7.78 9.33 6.02 2.67 0.00 6.69 Pigment dispersion 2 (solid content conversion) 0.00 2.64 3.30 0.00 0.00 0.00 0.00 0.00 3.95 6.59 0.00 Pigment dispersion 3 (solid content conversion) 0.00 0.00 0.00 0.66 0.00 0.00 0.00 0.00 0.00 0.00 0.00 Pigment dispersion 4 (solid content conversion) 0.00 0.00 0.00 0.00 0.79 0.00 0.00 0.00 0.00 0.00 0.00 Pigment dispersion 5 (solid content conversion) 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.72 0.00 0.00 0.00 Alkali-soluble resin-I (solid content conversion) 19.30 19.31 19.31 19.30 19.27 19.04 18.67 19.29 19.32 19.33 19.30 Alkali-soluble resin-II (solid content conversion) 19.30 19.31 19.31 19.30 19.27 19.04 18.67 19.29 19.32 19.33 19.30 Alkali-soluble resin-III (solid content conversion) 25.74 25.75 25.76 25.74 25.70 25.39 24.89 25.72 25.76 25.76 25.74 Photopolymerizable monomer 21.93 21.94 21.94 21.94 21.91 21.71 21.40 21.92 21.94 21.95 21.93 Photopolymerization initiator-I 4.00 4.00 4.00 4.00 4.00 4.00 4.00 4.00 4.00 4.00 4.00 Photopolymerization initiator-II 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 Liquid repellent-I (solid content conversion) 1.04 1.04 1.04 1.04 1.04 1.04 1.04 1.04 1.04 1.04 0.00 Surfactant-I (solid content conversion) 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 0.00 1.04 Additive-I 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 Additive-II 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 0.50 Pigment content ratio Colorant content ratio in total solid content (mass %) 4.3 4.3 4.3 4.3 4.3 5.0 6.0 4.3 4.3 4.3 4.3 Purple pigment content ratio in colorant (mass %) 100 60 50 90 90 100 100 100 40 0 100 Evaluation results PGMEA contact angle (°) 50(A) 54(A) 50(A) 57(A) 58(A) 57(A) 58(A) 58(A) 10(B) 27(B) 27(B) 600 nm transmittance (%) 2.1 (A) 7.2 (A) 10.9(A) 1.9(A) 1.6(A) 1.0(A) 0.5(A) 1.7(A) 14.2 (B) 49.6 (B) 1.8(A) 450 nm transmittance (%) 3.1 (A) 0.7(A) 0.5(A) 4.0(A) 4.2 (A) 1.6(A) 1.0(A) 3.4 (A) 0.4(A) 0.1(A) 2.9(A)

The method of performance evaluation is explained below.

<Measurement of PGMEA contact angle> The photosensitive colored resin composition was applied to the glass substrate using a spinner so that it would become a thickness of 10 μm after heating and hardening. The coated substrate was vacuum dried for 1 minute, and further heated and dried on a hot plate at 100° C. for 120 seconds. Use a high-pressure mercury lamp to expose the entire surface of the coating film at 27 mJ/ ^cm2 . At this time, the light intensity at the wavelength of 365 nm is 100 mW/cm ² . Next, an aqueous solution in which 0.04% by mass of KOH and 0.07% by mass of Emulgen A-60 (surfactant manufactured by Kao Corporation) was dissolved was used as a developer, and the substrate was spray developed at 24° C. for 70 seconds, and then used Rinse with pure water for 27 seconds. Finally, the substrate was heated and hardened in an oven at 230° C. for 30 minutes to obtain a substrate for contact angle measurement.

Use the Drop Master 500 (contact angle measurement device) manufactured by Kyowa Interface Science Co., Ltd. to measure the contact angle of the above-mentioned contact angle measurement substrate after adding 0.7 μL of PGMEA dropwise for 1 second under conditions of 23°C and 50% RH, as follows. The benchmark evaluation of ink repellency. The results are shown in Table 2. The larger the contact angle, the higher the ink repellency.

(Evaluation criteria for ink repellency) A: PGMEA contact angle is above 30° B: PGMEA contact angle does not reach 30°

<Measurement of transmittance> Using a spinner, the photosensitive colored resin composition was applied to the glass substrate so that the thickness would be 10 μm after heating and hardening. The coated substrate was vacuum dried for 1 minute, and further heated and dried at 100° C. for 120 seconds on a hot plate to obtain a coated substrate. Then, use a high-pressure mercury lamp to cut off wavelengths below 330 nm, and expose the entire surface of the coated substrate at 50 mJ/cm ² . At this time, the light intensity at the wavelength of 365 nm is 45 mW/cm ² . Then, the substrate was developed under the same conditions as when the substrate for contact angle measurement was produced, and then washed with pure water for 10 seconds. Finally, the substrate was heated and hardened in an oven at 230° C. for 30 minutes to obtain a substrate for transmittance measurement.

Using a spectrophotometer (U-3100PC manufactured by Shimadzu Corporation), the spectral transmittance of the transmittance measurement substrate was measured with the glass substrate as a reference. Table 2 shows the measurement results of the transmittance at each wavelength of 450 nm and 600 nm and the evaluation results based on the following standards. The lower the transmittance, the higher the light-shielding property of that wavelength.

(Evaluation standard for transmittance at 600 nm) A: Less than 13% B: More than 13% (Evaluation standard for transmittance at 450 nm) A: Less than 5% B：More than 5%

<Evaluation of Line Width> Using a spinner, the photosensitive colored resin composition was applied on the glass substrate so that it would have a thickness of 10 μm after heating and hardening. The coated substrate was vacuum dried for 1 minute, and then heated and dried at 100° C. for 120 seconds on a hot plate to obtain a coated substrate. Then, using a photomask, the obtained coated substrate was exposed to ultraviolet light by using a high-pressure mercury lamp to cut off wavelengths below 330 nm. The exposure amount was set to 50 mJ/cm ² and the exposure gap was set to 5 μm. At this time, the light intensity at the wavelength of 365 nm is 45 mW/cm ² . As the photomask, a photomask having linear openings of various widths with an opening width of 5 to 50 μm (5 to 20 μm: every 1 μm, 25 to 50 μm: every 5 μm) and an opening length of 2 mm is used. Then, it was developed under the same conditions as when producing the substrate for contact angle measurement, washed with pure water for 10 seconds, and heated and hardened in an oven at 230°C for 30 minutes to create a linear pattern assuming barrier ribs. substrate.

A scanning electron microscope (SEM) was used to observe the cross section of the portion of the obtained linear pattern substrate that was not defective or peeled corresponding to the linear opening with an opening width of 10 μm at 4000 times. The width of the portion of the line cross section that is in contact with the glass substrate and parallel to the surface of the glass substrate is measured as the lower line width, and evaluated based on the following criteria. The results are shown in Table 3. The larger the lower line width, the harder it is to harden to the lower part of the line. In addition, the line width of the portion with the largest width parallel to the surface of the glass substrate in the entire cross section of the line was measured as the maximum line width, and the following criteria were used for evaluation. The results are shown in Table 3.

(Evaluation criteria for maximum line width) A: Less than 12.6 μm B: 12.6 μm or more

(Evaluation criteria for lower line width) A: 9.8 μm or more B: Less than 9.8 μm

＜Evaluation of minimum dense line width＞ Use an optical microscope to observe the entire line (2 mm) on the linear pattern substrate. Set the opening width to the smallest opening width of the corresponding photomask if there is no defect or peeling and it is closely connected to the lines on the substrate. This is the minimum dense line width and is evaluated using the following criteria. The results are shown in Table 3. The smaller the minimum tight line width, the higher the tightness.

(Evaluation criteria for minimum dense line width) A: Less than 13 μm B: 13 μm or more

[table 3] Example Comparative example 1 2 3 4 5 6 7 8 2 Composition 1 2 3 6 7 8 9 10 5 Evaluation results Maximum line width (μm) 11.5 (A) 11.6 (A) 11.9 (A) 11.7 (A) 12.2 (A) 12.4 (A) 12.0(A) 11.8 (A) 12.1 (A) Lower line width (μm) 11.0(A) 10.6 (A) 10.5 (A) 11.1 (A) 11.5 (A) 11.6 (A) 10.4 (A) 11.6 (A) 9.6 (B) Minimum dense line width (μm) 11(A) 12(A) 12(A) 9(A) 11(A) 12(A) 11(A) 10(A) 13(B)

From the comparison between Examples 1 to 8 and Comparative Examples 1 to 2 in Table 2, it is clear that by increasing the purple pigment content ratio in the colorant, the transmittance at 600 nm can be reduced and the color filter can fully absorb the light. The green light emitted by the green pixel inhibits the excitation of the red luminescent nanocrystalline particles of the red pixel. As in Comparative Examples 1 and 2, if the purple pigment content ratio in the colorant is less than 45% by mass, the ink repellency becomes insufficient. On the other hand, by setting the purple pigment content ratio to 45% by mass or more like Examples 1 to 8, the ink repellency can be made sufficient. The reason is thought to be that the purple pigment has an absorption band in the wavelength range of 450 to 600 nm. On the other hand, the transmittance in the wavelength range of 360 to 400 nm is higher than that on the shorter wavelength side. Therefore, by increasing the total colorant The content ratio of purple pigment in the film can increase the hardening property during exposure and increase the amount of liquid repellent remaining on the surface of the film after development. When a fluorine-based surfactant without a crosslinking group is used instead of the liquid repellent agent like Comparative Example 3, the ink repellency becomes insufficient. The reason is considered to be that since it does not have a cross-linking group, the surfactant is eluted during development, and the residual amount of the surfactant on the film surface after development is reduced.

In addition, it is clear from Table 2 that by increasing the purple pigment content ratio in the colorant, the transmittance at a wavelength of 450 nm can be reduced, and blue light can be effectively blocked. As mentioned above, it is thought that the reason is that purple pigment has an absorption band in a wide wavelength range of 450 to 600 nm. Therefore, by containing a large amount of purple pigment, not only green light with a wavelength of 600 nm can be effectively absorbed, but also green light with a wavelength of 600 nm can be effectively absorbed. Absorbs blue light with a wavelength of 450 nm.

As is clear from Table 3, the maximum line width is equal regardless of the content ratio of the purple pigment in the colorant. However, by setting the purple pigment content ratio in the colorant as in Examples 1 to 8, More than 45 mass% can reduce the minimum dense line width and form high-definition barrier walls. It is believed that by increasing the content ratio of the purple pigment, the internal hardenability of the pattern, especially the internal hardenability of the thick film pattern, can be improved, which is beneficial to the formation of high-definition thick film barrier ribs.

Moreover, as is clear from Table 3, by setting the purple pigment content ratio in the colorant to 45% by mass or more as in Examples 1 to 8, the lower line width can be suppressed from becoming too small. The reason is considered to be that by increasing the content ratio of the purple pigment, the internal hardenability can be improved and the lower part of the pattern can be suppressed from being excessively dissolved in the developer during the development process. As described above, in Examples 1 to 8, the lower line width is sufficiently large, and the verticality of the barrier ribs is also good.

1: Green luminescent nanocrystalline particles 2: Red luminescent nanocrystalline particles 10:Substrate 20: Barrier wall 30: red pixels 40: Green pixels 50: blue pixels 100: Color filter

FIG. 1 is a schematic cross-sectional view of an example of a color filter equipped with barrier ribs of the present invention.

Claims (7)

A photosensitive colored resin composition, characterized in that it contains (A) ethylenically unsaturated compound, (B) photopolymerization initiator, (C) alkali-soluble resin, (D) liquid repellent, and (E) ) colorant, the above-mentioned (A) ethylenically unsaturated compound contains a (meth)acrylate compound, and the above-mentioned (B) photopolymerization initiator contains a metallocene compound, hexaarylbimidazole derivatives, halogenated

Oxidazole derivatives, halomethyl-trisine

Derivatives, N-aryl-α-amino acids such as N-phenylglycine, N-aryl-α-amino acid salts, N-aryl-α-amino acid esters, etc. Any of the base activators, α-aminophenanone derivatives, and oxime ester compounds, the above-mentioned (C) alkali-soluble resin has a carboxyl group or a hydroxyl group, and the above-mentioned (D) liquid repellent agent contains an epoxy group or an ethylene group. A resin containing fluorine atoms with a sexually unsaturated group as a cross-linking group. The above-mentioned (E) colorant contains a purple pigment. The above-mentioned purple pigment contains CI pigment violet 1, 1:1, 2, 2:2, 3, 3:1, 3: 3, 5, 5: any one of 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50, and the above (E) The content ratio of the purple pigment in the colorant is 45% by mass or more. The photosensitive colored resin composition according to claim 1, wherein the content ratio of the purple pigment in the colorant (E) is 50% by mass or more. The photosensitive colored resin composition of claim 1 or 2, wherein the purple pigment is a C.I. pigment Pigment Violet 23 and/or C.I. Pigment Violet 29. The photosensitive colored resin composition according to claim 1 or 2, wherein the content ratio of the colorant (E) is 20 mass % or less in the total solid content of the photosensitive colored resin composition. A cured product obtained by curing the photosensitive colored resin composition according to any one of claims 1 to 4. A barrier wall composed of the hardened material of claim 5. An image display device provided with a barrier wall as claimed in claim 6.

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