TW202243778A - Electrical discharge machining apparatus - Google Patents
Electrical discharge machining apparatus Download PDFInfo
- Publication number
- TW202243778A TW202243778A TW111117038A TW111117038A TW202243778A TW 202243778 A TW202243778 A TW 202243778A TW 111117038 A TW111117038 A TW 111117038A TW 111117038 A TW111117038 A TW 111117038A TW 202243778 A TW202243778 A TW 202243778A
- Authority
- TW
- Taiwan
- Prior art keywords
- processed
- discharge machining
- machining device
- discharge
- jig
- Prior art date
Links
Images
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
Description
本發明是有關於一種加工裝置,特別是有關於一種放電加工裝置。The present invention relates to a processing device, in particular to a discharge processing device.
隨著半導體產業蓬勃發展,放電加工技術已常見用於加工處理晶錠或晶圓。放電加工(Electrical Discharge Machining,EDM)是一種藉由放電產生火花,使待加工物成為所需形狀的一種製造工藝。介電材料分隔兩電極並施以電壓,產生週期性快速變化的電流放電,用以加工上述之待加工物。放電加工技術採用兩個電極,其中一個電極稱為工具電極,或稱為放電電極,另一個電極則稱為工件電極,連接上述之待加工物。在放電加工的過程中,放電電極和工件電極間不會有實際的接觸。With the vigorous development of the semiconductor industry, electrical discharge machining technology has been commonly used to process crystal ingots or wafers. Electrical discharge machining (Electrical Discharge Machining, EDM) is a manufacturing process that generates sparks through electrical discharge to make the object to be processed into a desired shape. The dielectric material separates the two electrodes and applies a voltage to generate periodic and rapidly changing current discharges for processing the above-mentioned objects to be processed. EDM technology uses two electrodes, one of which is called tool electrode, or discharge electrode, and the other electrode is called workpiece electrode, which is connected to the above-mentioned object to be processed. During EDM, there is no actual contact between the discharge electrode and the workpiece electrode.
當兩個電極間的電位差增大時,兩電極之間的電場亦會增大,直到電場強度高過介電強度,此時會發生介電崩潰,電流流過兩電極,並去除部分材料。當電流停止時,新的介電材料會流到電極間的電場,排除上述的部分材料,並重新提供介電質絕緣效果。在電流流過之後,兩電極間的電位差會回到介電崩潰之前,如此可以重複進行新一次的介電崩潰。As the potential difference between the two electrodes increases, the electric field between the two electrodes also increases until the electric field strength exceeds the dielectric strength, at which point dielectric breakdown occurs and current flows through the two electrodes, removing some of the material. When the current flow ceases, new dielectric material flows into the electric field between the electrodes, displacing some of the aforementioned material and re-providing dielectric insulation. After the current flows, the potential difference between the two electrodes will return to before the dielectric breakdown, so that a new dielectric breakdown can be repeated.
然而,放電加工技術的缺點在於,其切割面的粗糙度不佳,且切割面上具有相當多表面裂縫,甚至會沿著非切割方向延伸,導致非預期方向的破裂效果。而且,現有的放電加工技術在進行例如晶錠切割時,都是使用治具夾持晶錠的周緣,亦即徑向夾持晶錠的側邊,以防止滾動或位移。然而,由於晶錠的切割面也是位在徑向上,因此傳統技術僅能切割暴露在治具外側的晶錠,無法切割治具與晶錠重疊之區域,所以傳統技術需要停機並重新調整位置後,才能再次切割。然而,不論如何調整位置,治具與晶錠之間始終會有部分區域相互重疊,而無法進行放電加工。However, the disadvantage of EDM technology is that the roughness of the cutting surface is not good, and there are quite a lot of surface cracks on the cutting surface, which may even extend along the non-cutting direction, resulting in the cracking effect in unexpected directions. Moreover, the existing electrical discharge machining technology uses jigs to clamp the periphery of the crystal ingot, that is, radially clamp the sides of the crystal ingot, to prevent rolling or displacement when cutting the crystal ingot. However, since the cutting surface of the ingot is also located in the radial direction, the traditional technology can only cut the ingot exposed to the outside of the jig, and cannot cut the area where the jig and the ingot overlap, so the traditional technology needs to stop and readjust the position , to cut again. However, no matter how the position is adjusted, there will always be some areas overlapping each other between the jig and the crystal ingot, and EDM cannot be performed.
有鑑於此,本發明之一或多種目的就是在提供一種放電加工裝置,以解決上述習知技藝之問題。In view of this, one or more purposes of the present invention is to provide an electric discharge machining device to solve the above-mentioned problems in the prior art.
為達前述目的,本發明提出一種放電加工裝置,包含一載台,該載台係設有一治具,該治具包含一承載板,用以承載至少一待加工物,其中該待加工物係定義有一加工目標區;以及一放電加工(EDM)單元,該放電加工(EDM)單元係經由至少一放電電極以一非均勻電場分佈施加一放電能量予該待加工物之該加工目標區,藉以沿著該加工目標區加工該待加工物。In order to achieve the aforementioned purpose, the present invention proposes an electrical discharge machining device, which includes a stage, the stage is provided with a jig, and the jig includes a carrying plate for carrying at least one object to be processed, wherein the object to be processed is Define a processing target area; and an electrical discharge machining (EDM) unit, the electrical discharge machining (EDM) unit applies a discharge energy to the processing target area of the object to be processed through at least one discharge electrode with a non-uniform electric field distribution, thereby The object to be processed is processed along the processing target area.
其中,該放電電極之兩側包覆有一電性遮蔽結構,藉以使得該放電能量形成該非均勻電場分佈。Wherein, both sides of the discharge electrode are coated with an electrical shielding structure, so that the discharge energy forms the non-uniform electric field distribution.
其中,該放電電極具有一凹陷區,藉以使得該放電能量形成該非均勻電場分佈。Wherein, the discharge electrode has a recessed area, so that the discharge energy forms the non-uniform electric field distribution.
其中,該放電電極之剖面形狀為T字形、l字形或橢圓形,藉以使得該放電能量形成該非均勻電場分佈。Wherein, the cross-sectional shape of the discharge electrode is T-shaped, L-shaped or elliptical, so that the discharge energy forms the non-uniform electric field distribution.
其中,該放電電極之剖面形狀為圓形,藉以使得該放電能量形成該非均勻電場分佈。Wherein, the cross-sectional shape of the discharge electrode is circular, so that the discharge energy forms the non-uniform electric field distribution.
其中,該放電電極為線狀或板狀。Wherein, the discharge electrode is in the shape of a line or a plate.
其中,該電性遮蔽結構係一支撐結構。Wherein, the electrical shielding structure is a supporting structure.
其中,該放電電極或該支撐結構具有一導凸塊,該導凸塊係對應於該放電加工(EDM)單元之一滑輪之一導槽,藉以利用該導槽導引該導凸塊。Wherein, the discharge electrode or the supporting structure has a guide bump corresponding to a guide groove of a pulley of the electrical discharge machining (EDM) unit, so that the guide groove guides the guide bump.
其中,該放電電極為一磁性元件,當該放電電極沿著該加工目標區加工該待加工物時,該放電加工(EDM)單元係以一磁吸力非接觸式作用於該磁性元件,藉以固定該放電電極之一位向。Wherein, the discharge electrode is a magnetic element. When the discharge electrode processes the object to be processed along the processing target area, the electrical discharge machining (EDM) unit acts on the magnetic element in a non-contact manner with a magnetic attraction force, so as to fix One orientation of the discharge electrode.
其中,該放電電極係包含一第一導電線及一第二導電線,該第一導電線之厚度及/或所施加之電壓係不同於該第二導電線。Wherein, the discharge electrode includes a first conductive wire and a second conductive wire, and the thickness and/or applied voltage of the first conductive wire are different from the second conductive wire.
其中,更包含一微波或射頻源,用以經由該放電加工(EDM)單元之該放電電極供應一微波或射頻能量予該待加工物之該加工目標區。Wherein, it further includes a microwave or radio frequency source for supplying a microwave or radio frequency energy to the processing target area of the object to be processed through the discharge electrode of the electrical discharge machining (EDM) unit.
為達前述目的,本發明提出一種放電加工裝置,包含:一載台,該載台設有一治具,該治具包含一承載板,用以承載至少一待加工物,其中該待加工物定義有一加工目標區,且該待加工物之該加工目標區之位置係位於該承載板之上方;以及一放電加工(EDM)單元,用以經由至少一放電電極施加一放電能量予該待加工物之該加工目標區,藉以沿著該加工目標區加工該待加工物。In order to achieve the above-mentioned purpose, the present invention proposes an electric discharge machining device, comprising: a stage, the stage is provided with a jig, and the jig includes a carrying plate for carrying at least one object to be processed, wherein the object to be processed is defined as There is a processing target area, and the position of the processing target area of the object to be processed is located above the carrier plate; and an electric discharge machining (EDM) unit is used to apply a discharge energy to the object to be processed through at least one discharge electrode The processing target area, so as to process the object to be processed along the processing target area.
其中,該治具更具有兩側板設於該承載板之兩端,該兩側板係用以分別位於該待加工物之兩側。Wherein, the jig further has two side plates arranged at both ends of the bearing plate, and the two side plates are used to respectively locate on both sides of the object to be processed.
其中,該治具具有一黏膠層設於該承載板上,該待加工物之周緣係局部黏貼於該治具之該黏膠層上。Wherein, the jig has an adhesive layer disposed on the bearing plate, and the peripheral edge of the object to be processed is partially pasted on the adhesive layer of the jig.
其中,該黏膠層為一導電膠層。Wherein, the adhesive layer is a conductive adhesive layer.
其中,該黏膠層為非連續式設於該承載板上。Wherein, the adhesive layer is discontinuously arranged on the bearing plate.
其中,該黏膠層係從該承載板向上延伸至該待加工物之至少一側邊。Wherein, the adhesive layer extends upwards from the carrier board to at least one side of the object to be processed.
其中,該黏膠層係滲入該待加工物中。Wherein, the adhesive layer penetrates into the object to be processed.
其中,該治具具有一導電板設於該承載板上,且該黏膠層係設於該導電板上。Wherein, the jig has a conductive plate set on the carrier plate, and the adhesive layer is set on the conductive plate.
其中,該導電板為功函數4.5eV以下的導電金屬結構。Wherein, the conductive plate is a conductive metal structure with a work function below 4.5eV.
其中,該放電電極係以一非均勻電場分佈施加該放電能量予該待加工物之該加工目標區。Wherein, the discharge electrode applies the discharge energy to the processing target area of the workpiece with a non-uniform electric field distribution.
其中,該載台係調整該治具相對於該放電電極之傾斜度或該放電加工(EDM)單元係調整該放電電極相對於該待加工物之傾斜度,藉以調整該待加工物之該加工目標區相對於該治具之該承載板之夾角。Wherein, the stage adjusts the inclination of the jig relative to the discharge electrode or the electrical discharge machining (EDM) unit adjusts the inclination of the discharge electrode relative to the object to be processed, so as to adjust the processing of the object to be processed The angle between the target area and the carrier plate of the jig.
其中,該待加工物及/或該治具更具有一導電增益層,藉以提高該待加工物與該治具間的電性接觸。Wherein, the object to be processed and/or the jig further has a conductive enhancement layer, so as to improve the electrical contact between the object to be processed and the jig.
其中,更包含一熱源,用以加熱該承載板上之該待加工物,藉以提高該待加工物與該治具間的電性接觸。Wherein, a heat source is further included for heating the object to be processed on the carrier plate, so as to improve the electrical contact between the object to be processed and the jig.
其中,該放電電極係於一流體中切割該待加工物之該加工目標區。Wherein, the discharge electrode cuts the processing target area of the object to be processed in a fluid.
其中,該放電電極係於一真空環境中切割該待加工物之該加工目標區。Wherein, the discharge electrode cuts the processing target area of the object to be processed in a vacuum environment.
其中,該放電電極之數量為一或複數個。Wherein, the quantity of the discharge electrode is one or plural.
其中,該待加工物之數量為一或複數個。Wherein, the quantity of the object to be processed is one or plural.
綜上所述,本發明之放電加工裝置具有以下優點:In summary, the electrical discharge machining device of the present invention has the following advantages:
(1) 藉由非均勻電場分佈設計,可使得電場集中於行進方向上。(1) With the non-uniform electric field distribution design, the electric field can be concentrated in the direction of travel.
(2) 藉由非均勻電場分佈設計,可減少非行進方向之電場分布,故能減少待加工物在非行進方向上的表面粗糙度以及表面裂縫。(2) With the non-uniform electric field distribution design, the electric field distribution in the non-traveling direction can be reduced, so the surface roughness and surface cracks of the workpiece in the non-traveling direction can be reduced.
(3) 藉由治具設置黏膠層,可避免待加工物在放電加工程序過程中所產生的抖動現象,還能避免放電加工程序結束前產生毛邊現象。(3) By setting the adhesive layer on the jig, the shaking phenomenon of the object to be processed during the EDM process can be avoided, and the burr phenomenon before the end of the EDM process can also be avoided.
(4) 藉由治具設置黏膠層,可避免治具妨礙待加工物進行放電加工程序,故能使得放電加工程序更加靈活。(4) By setting the adhesive layer on the jig, the jig can prevent the jig from hindering the EDM process of the object to be processed, so the EDM process can be made more flexible.
(5) 藉由放電電極具有多條導電線,可同時進行切割步驟及磨拋步驟,故可加快整體加工程序之進行,還可獲得粗糙度低的表面。(5) Since the discharge electrode has multiple conductive wires, the cutting step and the grinding and polishing step can be performed at the same time, so the overall processing procedure can be accelerated, and a surface with low roughness can also be obtained.
(6) 藉由待加工物及/或治具的導電增益層,可以提高待加工物與治具間的電性接觸,藉以提高放電加工程序效率。(6) The electrical contact between the object to be processed and the jig can be improved by using the conductive gain layer of the object to be processed and/or the jig, so as to improve the efficiency of the EDM process.
茲為使鈞審對本發明的技術特徵及所能達到的技術功效有更進一步的瞭解與認識,謹佐以較佳的實施例及配合詳細的說明如後。Herein, in order to make Jun Shen have a further understanding and understanding of the technical characteristics of the present invention and the technical effects that can be achieved, the preferred embodiment and detailed description are as follows.
為利瞭解本創作之技術特徵、內容與優點及其所能達成之功效,茲將本創作配合圖式,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本創作實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本創作於實際實施上的權利範圍。此外,為使便於理解,下述實施例中的相同元件係以相同的符號標示來說明。In order to facilitate the understanding of the technical features, content and advantages of this creation and the effects it can achieve, this creation is hereby combined with the drawings and described in detail in the form of embodiments as follows, and the ideas used in it are only for the purpose of For the purpose of illustration and auxiliary instructions, it may not be the true proportion and precise configuration of this creation after its implementation. Therefore, the scale and configuration relationship of the attached drawings should not be interpreted or limited to the scope of rights of this creation in actual implementation. In addition, for ease of understanding, the same elements in the following embodiments are described with the same symbols.
另外,在全篇說明書與申請專利範圍所使用的用詞,除有特別註明外,通常具有每個用詞使用在此領域中、在此揭露的內容中與特殊內容中的平常意義。某些用以描述本創作的用詞將於下或在此說明書的別處討論,以提供本領域技術人員在有關本創作的描述上額外的引導。In addition, the terms used in the entire specification and patent claims generally have the ordinary meanings of each term used in this field, in the disclosed content and in the special content, unless otherwise specified. Certain terms used to describe the invention are discussed below or elsewhere in this specification to provide those skilled in the art with additional guidance in describing the invention.
關於本文中如使用“第一”、“第二”、“第三”等,並非特別指稱次序或順位的意思,亦非用以限定本創作,其僅僅是為了區別以相同技術用語描述的組件或操作而已。Regarding the use of "first", "second", "third", etc. in this article, it does not specifically refer to the meaning of order or order, nor is it used to limit the creation, it is just to distinguish components described with the same technical terms or operation only.
其次,在本文中如使用用詞“包含”、“包括”、“具有”、“含有”等,其均為開放性的用語,即意指包含但不限於。Secondly, if the words "comprising", "including", "having", "containing" etc. are used in this article, they are all open terms, meaning including but not limited to.
請參閱圖1及圖2,圖1係顯示本發明之放電加工裝置之結構,且係由治具前方所得之示意圖。圖2為本發明之放電加工裝置之結構,且係由治具側面所得之局部示意圖。本發明之放電加工裝置10包含載台20以及放電加工(EDM)單元50,用以對待加工物100進行放電加工程序,例如切割(Cutting)及/或磨拋(Electric Discharge Grinding,EDG)待加工物100。載台20設有治具22,載台20可為移動式載台或固定式載台。治具22至少包含承載板24用以放置待加工物100,其中待加工物100係定義有加工目標區110,且此加工目標區110可位於待加工物100中任何適合加工之位置上。待加工物100可為任何導體或半導體結構,例如晶圓或晶錠等,惟待加工物100之剖面不限於圓形,其可為任意形狀。Please refer to Figure 1 and Figure 2, Figure 1 shows the structure of the electrical discharge machining device of the present invention, and is a schematic view obtained from the front of the jig. Fig. 2 is the structure of the electrical discharge machining device of the present invention, and is a partial schematic view obtained from the side of the jig. The electrical
放電加工(EDM)單元50具有放電電極52,放電電極52例如為線狀之導電線、板狀之導電板或其他形狀之導電結構。以待加工物100為圓柱狀之晶錠舉例,加工目標區110例如為定義在晶錠之徑向上,如圖2之點虛線所示。惟,上述加工目標區110之位置僅為舉例,並非用以限定本發明。如圖3所示,放電電極52之表面與待加工物100在行進方向之表面(切割面100a)及非行進方向之表面(切割面100b、100c)之間存在有一間隙,其中此間隙中填充有空氣、去離子水或油等絕緣材料或其他合適之絕緣物質,以作為介電材料。例如,若在去離子水中進行放電加工步驟,則去離子水會填充入上述之間隙中。同理,若在具有大氣環境中進行放電加工步驟,則空氣會填充入上述之間隙中。此外,如圖4所示,若在加熱液體槽59a中進行放電加工步驟,則加熱液體59b會填充入上述之間隙中,而且加熱液體槽59a中的加熱液體59b,例如熱油,還可以減少熱衝擊或增加熱均勻性。此外,在放電加工程序的過程中,本發明藉由液體壓力可使得待加工物100減少產生抖動,減少切割面100b、100c的表面粗糙度,有助於提升放電加工品質。如上所述,本發明雖以一條放電電極52(單一導電結構)對一個待加工物100(即單一固體結構)進行切割舉例說明,如圖2所示,然而本發明不侷限於此。本發明之放電電極52也可例如同時對多個待加工物100(即多個固體結構)進行放電加工程序,如圖15a所示,亦即放電電極52可同時切割多個待加工物100。同理,本發明亦可以多條分離之放電電極52(多個導電結構)同時對一個待加工物100(如圖15b所示)或多個待加工物(如圖15c所示)進行切割程序。而且,本發明之放電加工程序不侷限於在上述之液態或氣態等流體中進行,本發明之放電加工程序亦可在真空環境中進行。換言之,本發明之放電加工程序除了可以放電電極52濕式切割待加工物100(亦即在液體槽或加熱液體槽59a中進行),還可以放電電極52乾式切割待加工物100(亦即在空氣中或真空環境中)。其中,本發明在放電電極52乾式切割待加工物100的過程中,亦可選擇性對放電電極52進行降溫,例如,使用液體或氣體等降溫流體使放電電極52降溫或保持溫度,或者是也可以使得放電電極52藉由放電能量而昇溫,亦即不使用液體或氣體等降溫流體。The electrical discharge machining (EDM)
請繼續參閱圖1至圖3所示,本發明的放電加工(EDM)單元50更具有電力源54,電力源54係以一電性迴路連接放電電極52,藉以在放電電極52與待加工物100之間產生電壓差,當此電壓差之數值大於上述之間隙所能提供之絕緣強度時,則會產生放電能量並提供放電能量予待加工物100之加工目標區110,藉此可沿著加工目標區110加工待加工物100。此外,以線狀之導電線為例,本發明之放電電極52可為單一條導電線(如圖3),或者為多條導電線。以兩條導電線為例,如圖5所示,第一導電線55a之厚度(直徑)及/或所施加之電壓可相同或不同於第二導電線55b。舉例而言,第二導電線55b之厚度實質大於第一導電線55a之厚度,藉此第一導電線55a可用來切割位在行進方向(前側)上之待加工物100之切割面100a,第二導電線55b則可用來磨拋非行進方向上之待加工物100之切割面100b、100c。其中,第一導電線55a及第二導電線55b之厚度及/或所施加之電壓可依據所需之切割面粗糙度而定,故不另舉例。本發明亦可選擇性包含一微波或射頻源60,用以例如經由第一導電線55a及/或第二導電線55b供應微波能量或射頻能量予待加工物100之加工目標區110,藉以提供加熱功效、退火功效或磨拋功效,可有效降低表面粗糙度,避免後續還需要進行機械或化學磨拋步驟。同理,若本發明之放電電極52僅為單一條導電線,則本發明之微波或射頻源60亦可經由此單一條導電線供應微波能量或射頻能量予待加工物100之加工目標區110。以微波或射頻源60為微波為例,本發明之微波之波長範圍為約1mm至約1m,頻率範圍為約300GHz至約0.3GHz,功率範圍例如為約200瓦至約5,000瓦。放電電極52的材質可例如選自由銅(Copper)、黃銅(Brass)、鉬(Molybdenum)、鎢(Tungsten)、石墨(Graphite)、鋼(Steel)、鋁(Aluminum)及鋅(Zinc)所組成之族群。放電電極52的厚度約小於300μm,厚度範圍較佳為約30μm至約300μm。Please continue to refer to FIGS. 1 to 3, the electric discharge machining (EDM)
在一實施態樣中,本發明之放電電極52所提供之放電能量較佳為具有非均勻電場分佈,放電電極52所提供之放電能量之電場較佳為集中於放電電極52之行進方向上。亦即,放電電極52之行進方向(切割方向)之電場分佈較大,而垂直於其行進方向之側向之電場分佈較小。換言之,放電電極52所提供之放電能量較佳為集中施加予行進方向(前側)上之待加工物100上,而減少施加放電能量予非行進方向(兩側)上之待加工物100上,故能減少非行進方向上的待加工物100之切割面100b、100c之表面粗糙度,例如減少Ra及Rz值,以及切割面100b、100c之表面裂縫。In one embodiment, the discharge energy provided by the
為了可經由放電電極52提供非均勻電場分佈之放電能量,如圖6a至圖6g所示,因此本發明之放電電極52之周圍(例如左右兩側或單側)可具有凹陷區52a或是放電電極52之周圍(例如左右兩側或單側)可具有電性遮蔽結構52b,其係例如為絕緣材質或其他合適材質。其中,凹陷區52a及電性遮蔽結構52b皆可達到減少放電電極52之電場外擴範圍之效果,故能減少待加工物100之切割面100b、100c之表面粗糙度。舉例而言,放電電極52之剖面形狀可例如為具有凹陷區52a之T字形(如圖6a)、l字形或其他外形。或者是,放電電極52之周圍(例如左右兩側或單側)包覆有電性遮蔽結構52b,放電電極52之剖面形狀也可例如為T字形(如圖6b)、l字形(如圖6e、圖6f、圖6g)、圓形(如圖6c)、橢圓形(如圖6d)或其他外型,且較佳為僅露出放電電極52之前側(行進方向),以便放電電極52所提供之放電能量之電場集中於放電電極52之行進方向上。其中,在放電加工程序中,上述之凹陷區52a可發揮固定放電電極52之作用,以減少放電電極52在切割過程中的晃動或轉動現象,還可提供漏孔排水的效果。In order to provide the discharge energy of the non-uniform electric field distribution through the
除此之外,如圖1及圖4所示,本發明之放電加工(EDM)單元50還可選擇性具有送線捲線器56a及收線捲線器56b,其中放電電極52之兩端係分別連接於送線捲線器56a及收線捲線器56b,且送線捲線器56a及收線捲線器56b可分別利用滑輪57a、57b套接放電電極52,藉以定位放電電極52,並且例如調整放電電極52之張力。因此,本發明之放電加工(EDM)單元50之放電電極52還可選擇性具有導凸塊53a(如圖6g所示)對應於滑輪57a、57b之導槽58a、58b(如圖7a所示),以及/或者是,電性遮蔽結構52b不僅可包覆放電電極52之周圍,還可選擇性具有導凸塊53b(如圖6d所示)對應於滑輪57a、57b之導槽58a、58b(如圖7b所示),藉以同時作為支撐結構之用。In addition, as shown in Fig. 1 and Fig. 4, the electric discharge machining (EDM)
除此之外,請參閱圖1至圖12b,為了避免待加工物100在被放電電極52放電加工程序的過程中產生抖動(晃動)現象或者是避免放電加工程序結束前產生毛邊現象,因此本發明之治具22更選擇性設有黏膠層70設於承載板24上。待加工物100之周緣係局部黏貼於黏膠層70上,藉以使得待加工物100穩固黏貼於治具20之承載板24上。其中,黏膠層70不限於連續式(如圖8b所示)或非連續式(如圖8c所示)設於該承載板上。以非連續式為例,黏膠層70係例如間隔式設於治具22之承載板24上,且其位置係對應於加工目標區110,亦即黏膠層70之位置位於加工目標區110之下方。黏膠層70之位置不限於位於加工目標區110之正下方,只要可黏固待加工物100,即可適用於本發明。In addition, please refer to FIG. 1 to FIG. 12b. In order to avoid the vibration (shaking) phenomenon of the
其中,治具22還可選擇性具有一導電板72設於承載板24上,且上述之黏膠層70係設於導電板72上,藉此可作為緩衝層以避免放電加工過程導致治具22受損。導電板72例如為,但不限於,功函數為約4.5eV以下的材料層,例如鋅、鈦、鋁或其他合適之導電金屬結構。黏膠層70還提供了導電、固定及保護導電板72的功能,且具有容易去除的優點。此外,除了上述之黏膠層70設於治具22之承載板24之外,本發明之治具22還可選擇性包含兩側板26設於承載板24之兩端(如圖8a所示),其中兩側板26係分別位於待加工物100之兩側,且較佳為固持待加工物100之兩側,例如軸向固持晶錠,可在傾斜加工角度時避免待加工物100滑動或傾倒,還能使得側板26錯開放電電極52之行進路線,藉以阻礙放電加工程序之進行。此外,本發明亦可省略黏膠層70,亦即待加工物100可直接放置於治具22之導電板72上,且若省略黏膠層70,則本發明還可選擇性以治具22之兩側板26直接固持待加工物100之兩側,可防止待加工物100滑動或傾倒。其中,黏膠層70可為非導電膠層或為導電膠層,只要能夠將待加工物100黏固於治具20之承載板24或者是黏固於導電板72上,即可適用於本發明,並且黏膠層70與待加工物100之黏貼面積並無限定,只要能夠使得待加工物100電性導通其下方的承載板24或導電板72以構成電性迴路,即可適用於本發明。Wherein, the
如圖9所示,黏膠層70不限於僅黏貼待加工物100之底部,黏膠層70亦可選擇性從承載板24(即待加工物100之底部)向上延伸至待加工物100之至少一側邊,只要可穩固黏貼待加工物100即可適用於本發明。 此外,如圖10所示,在黏貼至黏膠層70之前,本發明也可以例如對待加工物100進行預加工程序,藉以使得待加工物100欲黏貼黏膠層70之區域具有粗糙表面或縫隙,因此黏膠層70可進一步由待加工物100表面滲入待加工物100中,以提升黏貼附著效果,並且若黏膠層70為導電膠材質,則還可提升導電效果。其中,黏膠層70可為任何合適之材質,例如市售之導電膠材質或非導電膠材質。As shown in FIG. 9, the
除此之外,如圖2至圖3及圖8a所示,本發明之待加工物100之加工目標區110之位置較佳為位於承載板24之上方,即加工目標區110之投影線係落在兩側板26之間,而非習知所採用之加工目標區位於承載板之側板之外側之技術,藉此本發明可減少待加工物100在放電加工程序中產生抖動現象,還能避免放電加工程序結束前,待加工物100之切割面100b、100c產生毛邊。除此之外,本發明藉由將待加工物100之加工目標區110之位置位於承載板24之上方,亦即加工目標區110之位置係位於兩側板26之間,所以放電電極52只會在兩側板26之間進行放電加工程序。待加工物100之加工目標區110之位置不限於位於承載板24之正上方,只要可供進行加工程序,即可適用於本發明。因此,本發明可以對整個待加工物100進行放電加工程序,可避免如同習知技術般因受到側板26阻礙,而只能對位於承載板之側板外側之加工目標區進行放電加工程序之缺點。如圖8b及圖8c所示,由於本發明已於治具22之承載板24上設置黏膠層70,且承載板24之位置位於加工目標區110之下方,可確實支撐整個待加工物100,因此縱使省略上述之兩側板26,本發明亦可達到降低抖動現象及毛邊現象之功效,而且放電加工程序完全不會受到側板26阻礙。In addition, as shown in FIG. 2 to FIG. 3 and FIG. 8a, the position of the
由於,當放電電極52與待加工物100之重疊長度太長時,則滑輪57a、57b 之間的放電電極52在切割待加工物100的過程中,容易產生抖動,造成切割面偏移或歪斜。而且,越遠離滑輪57a、57b之位置,放電電極52之抖動幅度越大。因此,本發明還可例如選擇性具有定位單元62用以非接觸式固定放電電極52之位向。舉例而言,放電電極52或電性遮蔽結構52b例如為一磁性元件,例如磁鐵或含鐵材料,而定位單元62則例如為磁鐵或電磁鐵等可產生磁吸力之元件,且放電電極52與定位單元62係分別位於加工目標區110之相對側,藉以利用磁吸力作用於上述之磁性元件,使得放電電極52在放電加工程序中可保持固定位向。Because, when the overlapping length of the
此外,本發明還可例如調整待加工物100之加工目標區110相對於治具22之承載板24之夾角,藉以進行偏軸式(Off-Axis)放電加工程序。舉例而言,如圖1及圖12a所示,本發明之載台20可例如為具有多軸(例如,2軸、3軸或以上)馬達之移動式載台,藉以達到移動位置,甚至調整治具22相對於放電電極52之傾斜度,或是如圖1及圖12b所示,本發明之放電加工(EDM)單元50之送線捲線器56a及收線捲線器56b可例如為具有多軸(例如,2軸、3軸或以上)馬達,藉由調整放電加工(EDM)單元50之進線方向,可調整放電電極52相對於待加工物100之傾斜度。In addition, the present invention can also, for example, adjust the angle between the
另外,為了提高放電加工程序效率,本發明還可以透過導電增益層,來提高待加工物100與治具22間的電性接觸。舉例來說,如圖13所示,可以透過表面改質方式,例如利用前述之放電加工(EDM)單元50或雷射,來讓待加工物100上形成導電增益層80,導電增益層80之成分係依據待加工物100之組成而定,且導電增益層80之位置為鄰近治具22之承載板24或與承載板24直接連接。本發明藉由對待加工物100進行表面改質,以提高治具22與待加工物100間的電性接觸。或者,本發明也可以透過鍍膜等方式,來讓治具22的承載板24及/或兩側板26形成導電增益層82及/或84,以提供良好電性接觸,甚至導電板72也可以鍍膜有導電增益層86或本身即為導電增益層86 (如圖14所示),以提供良好電性接觸,且導電增益層82、84之位置可為鄰近或直接接觸待加工物100。其中,導電增益層82及/或84之材料可例如為相同或不同之導電材料,只要可提供良好電性接觸即可適用於本發明。另外,導電板72、治具22的承載板24及/或兩側板26本身也可以例如為由上述之導電增益層82、84及/或86的導電增益材質所構成,導電增益材質可例如選用不同或相同的導電材料,例如是不同或相同的金屬材料,只要能夠提供良好電性接觸即可適用於本發明。亦或者,在放電加工程序過程中,也可以在前述之加熱液體槽59a的加熱液體59b中添加可幫助導電的材料,以促進放電加工程序的進行,尤其能提高半導體或不良導體等待加工物100的放電加工效率。上述之導電增益層82、84及/或86功函數例如為約4.5eV以下,但不限於此,只要有助於提昇電性接觸即可適用於本發明。In addition, in order to improve the efficiency of the electrical discharge machining process, the present invention can also improve the electrical contact between the object to be processed 100 and the
除此之外,本發明也可以透過熱源90來對承載板24上之待加工物100進行加熱,來提高待加工物100與治具22間的電性接觸。熱源90可例如是前述之加熱液體槽59a、微波或射頻源60,或者是雷射源及/或紅外光源。在待加工物100與治具22接觸後,利用熱源90進行熱處理,可以提高電性接觸,藉以提高後續進行的放電加工程序之效率。Besides, the present invention can also heat the object to be processed 100 on the
綜上所述,本發明之放電加工裝置具有以下優點:In summary, the electrical discharge machining device of the present invention has the following advantages:
(1) 藉由非均勻電場分佈設計,可使得電場集中於行進方向上。(1) With the non-uniform electric field distribution design, the electric field can be concentrated in the direction of travel.
(2) 藉由非均勻電場分佈設計,可減少非行進方向之電場分布,故能減少待加工物在非行進方向上的表面粗糙度以及表面裂縫。(2) With the non-uniform electric field distribution design, the electric field distribution in the non-traveling direction can be reduced, so the surface roughness and surface cracks of the workpiece in the non-traveling direction can be reduced.
(3) 藉由治具設置黏膠層,可避免待加工物在放電加工程序過程中所產生的抖動現象,還能避免放電加工程序結束前產生毛邊現象。(3) By setting the adhesive layer on the jig, the shaking phenomenon of the object to be processed during the EDM process can be avoided, and the burr phenomenon before the end of the EDM process can also be avoided.
(4) 藉由治具設置黏膠層,可避免治具妨礙待加工物進行放電加工程序,故能使得放電加工程序更加靈活。(4) By setting the adhesive layer on the jig, the jig can prevent the jig from hindering the EDM process of the object to be processed, so the EDM process can be made more flexible.
(5) 藉由放電電極具有多條導電線,可同時進行切割步驟及磨拋步驟,故可加快整體加工程序之進行,還可獲得粗糙度低的表面。(5) Since the discharge electrode has multiple conductive wires, the cutting step and the grinding and polishing step can be performed at the same time, so the overall processing procedure can be accelerated, and a surface with low roughness can also be obtained.
(6) 藉由待加工物及/或治具的導電增益層,可以提高待加工物與治具間的電性接觸,藉以提高放電加工程序效率。(6) The electrical contact between the object to be processed and the jig can be improved by using the conductive gain layer of the object to be processed and/or the jig, so as to improve the efficiency of the EDM process.
以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。The above descriptions are illustrative only, not restrictive. Any equivalent modification or change made without departing from the spirit and scope of the present invention shall be included in the scope of the appended patent application.
10:放電加工裝置
20:載台
22:治具
24:承載板
26:側板
50:放電加工(EDM)單元
52:放電電極
52a:凹陷區
52b:電性遮蔽結構
53a、53b:導凸塊
54:電力源
59a:加熱液體槽
59b:加熱液體
55a:第一導電線
55b:第二導電線
56a:送線捲線器
56b:收線捲線器
57a、57b:滑輪
58a、58b:導槽
60:微波或射頻源
62:定位單元
70:黏膠層
72:導電板
100:待加工物
100a:切割面
100b:切割面
100c:切割面
110:加工目標區
80、82、84、86:導電增益層
90:熱源
10: Electrical discharge machining device
20: Carrier
22: Fixture
24: Loading board
26: side panel
50: Electrical discharge machining (EDM) unit
52:
圖1係顯示本發明之放電加工裝置之結構,且係由治具前方所得之示意圖。Fig. 1 shows the structure of the electrical discharge machining device of the present invention, and is a schematic diagram obtained from the front of the jig.
圖2為本發明之放電加工裝置之結構,且係由治具側面所得之局部示意圖。Fig. 2 is the structure of the electrical discharge machining device of the present invention, and is a partial schematic view obtained from the side of the jig.
圖3為本發明之放電加工裝置於進行放電加工程序之局部放大示意圖,其中放電電極為單條導電線。3 is a partially enlarged schematic view of the discharge machining device of the present invention during the discharge machining process, wherein the discharge electrode is a single conductive wire.
圖4係顯示本發明之放電加工裝置之結構,且係於加熱液體槽中進行放電加工程序之示意圖。Fig. 4 shows the structure of the electrical discharge machining device of the present invention, and is a schematic diagram of the electrical discharge machining procedure performed in the heating liquid tank.
圖5為本發明之放電加工裝置於進行放電加工程序之局部放大示意圖,其中放電電極為多條導電線。FIG. 5 is a partially enlarged schematic view of the discharge machining device of the present invention during the discharge machining process, wherein the discharge electrodes are a plurality of conductive wires.
圖6a至圖6g為本發明之放電加工裝置中可產生非均勻電場分佈之放電電極及其電性遮蔽結構之示意圖。6a to 6g are schematic diagrams of the discharge electrode capable of generating non-uniform electric field distribution and its electrical shielding structure in the discharge machining device of the present invention.
圖7a至圖7b為本發明之放電加工裝置之放電電極及其電性遮蔽結構具有導凸塊以對應於滑輪之導槽之示意圖。7a to 7b are schematic diagrams of the discharge electrode and its electrical shielding structure of the discharge machining device of the present invention having guide bumps corresponding to the guide grooves of the pulley.
圖8a至圖8c為本發明之放電加工裝置之待加工物、治具及載台之分解示意圖。8a to 8c are exploded schematic diagrams of the object to be processed, the jig and the carrier of the electric discharge machining device of the present invention.
圖9為本發明之放電加工裝置之治具之黏膠層延伸至待加工物之側邊之示意圖。FIG. 9 is a schematic diagram of the adhesive layer of the jig extending to the side of the object to be processed in the electrical discharge machining device of the present invention.
圖10為本發明之放電加工裝置之治具之黏膠層滲入待加工物中之示意圖。FIG. 10 is a schematic diagram of the adhesive layer of the jig of the electrical discharge machining device of the present invention penetrating into the object to be processed.
圖11為本發明之放電加工裝置在放電加工程序中以定位單元固定放電電極之位向之示意圖。FIG. 11 is a schematic diagram of the electrical discharge machining device of the present invention using the positioning unit to fix the orientation of the discharge electrode during the electrical discharge machining procedure.
圖12a至圖12b為本發明之放電加工裝置進行偏軸式放電加工程序之示意圖。12a to 12b are schematic diagrams of the off-axis EDM procedure performed by the EDM device of the present invention.
圖13為本發明中導電增益層之示意圖。Fig. 13 is a schematic diagram of a conductive gain layer in the present invention.
圖14為本發明中導電板為導電增益層之示意圖。FIG. 14 is a schematic diagram of the conductive plate as the conductive gain layer in the present invention.
圖15a為本發明以單一放電電極切割多個待加工物之示意圖,圖15b為本發明以多個放電電極切割單一待加工物之示意圖,圖15c為本發明以多個放電電極切割多個待加工物之示意圖,其中圖15a之視角不同於圖15b及圖15c。Figure 15a is a schematic diagram of cutting multiple objects to be processed with a single discharge electrode in the present invention, Figure 15b is a schematic diagram of cutting a single object to be processed with multiple discharge electrodes in the present invention, and Figure 15c is a schematic diagram of cutting multiple objects to be processed with multiple discharge electrodes in the present invention Schematic diagram of the processed object, where the viewing angle of Fig. 15a is different from that of Fig. 15b and Fig. 15c.
100:待加工物 100: to be processed
10:放電加工裝置 10: Electrical discharge machining device
20:載台 20: Carrier
22:治具 22: Fixture
24:承載板 24: Loading board
50:放電加工(EDM)單元 50: Electrical discharge machining (EDM) unit
52:放電電極 52: discharge electrode
54:電力源 54: Power source
56a:送線捲線器 56a: Wire feeding reel
56b:收線捲線器 56b: Take-up reel
57a、57b:滑輪 57a, 57b: pulleys
60:微波或射頻源 60: Microwave or RF source
70:黏膠層 70: adhesive layer
72:導電板 72: Conductive plate
Claims (29)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210511666.8A CN115338489A (en) | 2021-05-14 | 2022-05-11 | Electric discharge machining apparatus |
JP2022078912A JP7357109B2 (en) | 2021-05-14 | 2022-05-12 | Electric discharge machining equipment |
US17/742,444 US20220362870A1 (en) | 2021-05-14 | 2022-05-12 | Electrical discharge machining apparatus |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202163188478P | 2021-05-14 | 2021-05-14 | |
US63/188,478 | 2021-05-14 | ||
US202163252652P | 2021-10-06 | 2021-10-06 | |
US63/252,652 | 2021-10-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202243778A true TW202243778A (en) | 2022-11-16 |
TWI835130B TWI835130B (en) | 2024-03-11 |
Family
ID=85460717
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111117037A TWI812204B (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus and method with adjustable processing parameters |
TW111204638U TWM632642U (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus |
TW111117038A TWI835130B (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus |
TW112111257A TWI835611B (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus |
TW111204635U TWM633622U (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus with adjustable processing parameters |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111117037A TWI812204B (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus and method with adjustable processing parameters |
TW111204638U TWM632642U (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112111257A TWI835611B (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus |
TW111204635U TWM633622U (en) | 2021-05-14 | 2022-05-05 | Electrical discharge machining apparatus with adjustable processing parameters |
Country Status (1)
Country | Link |
---|---|
TW (5) | TWI812204B (en) |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IE43938B1 (en) * | 1975-09-04 | 1981-07-01 | De Beers Ind Diamond | Improvements in spark erosion |
JPH01205925A (en) * | 1988-02-08 | 1989-08-18 | Amada Co Ltd | Electric discharge machining and device therefor |
JPH01228728A (en) * | 1988-03-03 | 1989-09-12 | Mitsubishi Electric Corp | Wire electrode for wire cut electric discharge machining |
JP2007276097A (en) * | 2006-04-03 | 2007-10-25 | Takatori Corp | Wire saw |
JP5475772B2 (en) * | 2008-07-11 | 2014-04-16 | サンーゴバン アブレイシブズ,インコーポレイティド | Wire slicing system |
JP2010046792A (en) * | 2008-07-22 | 2010-03-04 | Yyl:Kk | Cutting apparatus and cutting method |
JP2012245567A (en) * | 2011-05-25 | 2012-12-13 | Okayama Univ | Wire for electric discharge machining |
US20150053650A1 (en) * | 2012-04-12 | 2015-02-26 | Mitsubishi Electric Corporation | Wire discharge machining apparatus and manufacturing method for semiconductor wafers using the same |
JP6397738B2 (en) * | 2014-11-26 | 2018-09-26 | 株式会社ディスコ | Wafer manufacturing method |
KR101905692B1 (en) * | 2016-11-15 | 2018-10-12 | 한국에너지기술연구원 | Silicon ingot slicing device using micro bubble and wire electric discharge, and silicon slicing method |
TWI620840B (en) * | 2017-03-15 | 2018-04-11 | 環球晶圓股份有限公司 | Slicing apparatus for silicon carbide ingot and slicing method for silicon carbide ingot |
CN106825806B (en) * | 2017-03-29 | 2019-04-30 | 江苏大学 | A kind of device and method in the introduction by magnetic field electrolysis curved hole of electric spark Compound Machining |
CN108995063A (en) * | 2018-08-11 | 2018-12-14 | 山西潞安太阳能科技有限责任公司 | A kind of method of diamond wire group technology cutting silicon wafer |
CN111267245A (en) * | 2018-12-05 | 2020-06-12 | 上海新昇半导体科技有限公司 | Crystal bar slicing device |
CN112297261B (en) * | 2019-07-29 | 2022-04-01 | 内蒙古中环光伏材料有限公司 | Cutting process of large-size silicon wafer for solar energy |
TWM623562U (en) * | 2021-08-26 | 2022-02-21 | 華信光電科技股份有限公司 | Dual wavelength gun-sight direct light source module |
-
2022
- 2022-05-05 TW TW111117037A patent/TWI812204B/en active
- 2022-05-05 TW TW111204638U patent/TWM632642U/en unknown
- 2022-05-05 TW TW111117038A patent/TWI835130B/en active
- 2022-05-05 TW TW112111257A patent/TWI835611B/en active
- 2022-05-05 TW TW111204635U patent/TWM633622U/en unknown
Also Published As
Publication number | Publication date |
---|---|
TW202332523A (en) | 2023-08-16 |
TWM633622U (en) | 2022-11-01 |
TWI835611B (en) | 2024-03-11 |
TWI812204B (en) | 2023-08-11 |
TW202243777A (en) | 2022-11-16 |
TWI835130B (en) | 2024-03-11 |
TWM632642U (en) | 2022-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10177004B2 (en) | Method of processing wafer | |
JP6320505B2 (en) | Method and apparatus for plasma dicing a semiconductor wafer | |
TWI587388B (en) | Method and apparatus for plasma dicing a semi-conductor wafer | |
CN104979265B (en) | Method for plasma dicing a substrate | |
US9082839B2 (en) | Method and apparatus for plasma dicing a semi-conductor wafer | |
JP3069271B2 (en) | High-efficiency processing method and device using high-density radical reaction using rotating electrode | |
KR101929278B1 (en) | Electrostatic chuck | |
JP2016136624A (en) | Electrostatic chuck | |
JP2019197899A (en) | Method and apparatus for plasma-dicing semiconductor wafer | |
JP6388886B2 (en) | Method for plasma dicing a semiconductor wafer | |
JP2012526718A (en) | Method for smoothing and / or beveling the edge of a substrate | |
TW202243778A (en) | Electrical discharge machining apparatus | |
CN218253274U (en) | Electric discharge machining apparatus | |
JP7357109B2 (en) | Electric discharge machining equipment | |
TWI721855B (en) | Wire electric discharge machining machine | |
JP3238218U (en) | Electric discharge machine | |
KR102391949B1 (en) | Hole fabrication method | |
JP3597105B2 (en) | Plasma processing apparatus and plasma processing method | |
TWM644737U (en) | Electrical discharge machining apparatus | |
JP2018010975A (en) | Tray for plasma processing device | |
JP2017212195A (en) | Plasma processing device, plasma processing method, and manufacturing method of electronic device | |
JP2023081007A (en) | Manufacturing method of device chip | |
CN114709158A (en) | Electrostatic chuck and substrate fixing device | |
JP2023166615A (en) | Device and method for electrical discharge machining allowing adjustment of processing parameter | |
JP2021044422A (en) | Wafer processing method |