TW202237399A - Laminated film and use thereof comprising a base material layer, a release layer, and an adhesive layer sandwiched between the base material layer and the release layer - Google Patents

Laminated film and use thereof comprising a base material layer, a release layer, and an adhesive layer sandwiched between the base material layer and the release layer Download PDF

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TW202237399A
TW202237399A TW111110344A TW111110344A TW202237399A TW 202237399 A TW202237399 A TW 202237399A TW 111110344 A TW111110344 A TW 111110344A TW 111110344 A TW111110344 A TW 111110344A TW 202237399 A TW202237399 A TW 202237399A
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laminated film
layer
die
film
meth
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TWI813211B (en
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福井和寿
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日商大賽璐股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B33/00Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/04Punching, slitting or perforating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/04Punching, slitting or perforating
    • B32B2038/042Punching

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Control Of Cutting Processes (AREA)

Abstract

The present invention provides a laminated film having die cut resistance. The laminated film of this invention is a laminated film comprising a base material layer, a release layer, and an adhesive layer sandwiched between the base material layer and the release layer, and the shear yield stress when a strain is applied at 5 mm/min to the adhesive layer in a direction parallel to the film surface is adjusted to 0.15 N/mm<SP>2</SP> or more. The shear yield stress may be 0.17 N/mm<SP>2</SP> or more. The laminated film may be a transparent film. The adhesive layer may include an optically transparent adhesive. The optically transparent adhesive may be a cured product of a curable composition. The curable composition may contain a (meth)acrylic polymer and a crosslinking agent. The base material layer may contain a transparent resin. The laminated film may be a film for die-cutting.

Description

積層膜及其用途Laminated films and their uses

本發明係關於一種具有耐衝切痕性之積層膜及其用途。The present invention relates to a laminated film with punching mark resistance and its application.

以往,如日本專利特開2015-98123號公報(專利文獻1)等中所記載,作為個人電腦(PC)監視器、電視、智慧型手機等各種顯示裝置的顯示面所配設之光學膜,利用有包含基材層、光學功能層、覆蓋層、黏著層(或接著層)之透明積層膜。於透明積層膜中,黏著層由光學透明接著劑(OCA)所形成。Conventionally, as described in Japanese Patent Application Laid-Open No. 2015-98123 (Patent Document 1), as an optical film provided on the display surface of various display devices such as personal computer (PC) monitors, TVs, and smartphones, A transparent laminated film including a substrate layer, an optical function layer, a cover layer, and an adhesive layer (or adhesive layer) is used. In the transparent laminated film, the adhesive layer is formed by an optically clear adhesive (OCA).

作為將透明積層膜成形為目標顯示器尺寸之方法,利用有衝切加工。以往,於透明積層膜之衝切加工中,已知有沿著衝切形狀於膜端部的內側產生少許變形之現象。該變形被稱作邊緣線痕(TM;touring mark),例如因於衝切加工中黏著層暫時變形而產生,且於膜端部附近(切斷部位近旁)以沿著端部之線狀痕之形式產生。因此,於先前的顯示裝置中,藉由顯示器的框來隱藏邊緣線痕之存在,因而不會成為嚴重問題。但是,近年來,隨著顯示器(監視器)之窄邊框化(細邊框化),使得邊緣線痕於顯示器上明顯存在而導致圖像產生應變,因而邊緣線痕成為了問題。 [先前技術文獻] Die-cutting is used as a method of forming a transparent laminated film into a target display size. Conventionally, in the die-cutting process of a transparent laminated film, it is known that a slight deformation occurs inside the film edge along the die-cut shape. This deformation is called the edge line mark (TM; touring mark), for example, due to the temporary deformation of the adhesive layer during the die-cutting process, and near the end of the film (near the cut-off position), there is a linear mark along the end. produced in the form. Therefore, in the previous display device, the existence of the edge lines is hidden by the frame of the display, so it will not become a serious problem. However, in recent years, along with narrower borders (thinner borders) of displays (monitors), edge lines are conspicuously present on the display, causing image strain, and thus edge lines have become a problem. [Prior Art Literature]

[專利文獻]專利文獻1:日本特開2015-98123號公報[Patent Document] Patent Document 1: Japanese Patent Laid-Open No. 2015-98123

[發明所欲解決之課題][Problem to be Solved by the Invention]

但是,關於先前的OCA等黏著劑(或接著劑),作為其設計準則,主要有光學特性、黏彈特性、黏著性受到關注,尚無基於抑制衝切痕之觀點之設計。另外,本發明者研究了衝切痕之產生與黏著劑之黏著性的相關關係,結果判定這些特性與衝切痕之產生之間並無相關關係。However, conventional adhesives (or adhesives) such as OCA have focused on optical properties, viscoelastic properties, and adhesiveness as design criteria, and there has been no design based on the viewpoint of suppressing punch marks. In addition, the present inventors studied the correlation between the occurrence of die-cut marks and the adhesiveness of the adhesive, and found that there is no correlation between these characteristics and the generation of die-cut marks.

因此,本發明的目的在於提供一種具有耐衝切痕性之積層膜及其用途。 [解決課題之技術手段] Therefore, the object of the present invention is to provide a laminated film having die cut resistance and its use. [Technical means to solve the problem]

本發明者發現,藉由將積層膜的接著層(或黏著層)的剪切降伏應力(或降伏剪切應力)調整為0.15N/mm 2以上,而表現出耐衝切痕性,從而完成了本發明。 The present inventors found that by adjusting the shear yield stress (or yield shear stress) of the adhesive layer (or adhesive layer) of the laminated film to 0.15N/ mm2 or more, punching mark resistance was exhibited, thereby completing the invention.

亦即,本發明的積層膜係包含基材層、離型層、及介置於前述基材層與前述離型層之間的接著層之積層膜,且對前述接著層沿著與膜面平行的方向以5 mm/分鐘施加應變時的剪切降伏應力為0.15N/mm 2以上。前述剪切降伏應力可為0.17N/mm 2以上。前述接著層可包含光學透明接著劑。前述光學透明接著劑可為硬化性組成物之硬化物。前述硬化性組成物可包含(甲基)丙烯酸系聚合物及交聯劑。前述基材層可包含透明樹脂。前述積層膜可為用以供至衝切加工之膜。前述積層膜可為經衝切加工所得之衝切膜。 That is to say, the laminated film of the present invention is a laminated film comprising a substrate layer, a release layer, and an adhesive layer interposed between the substrate layer and the release layer, and the adhesive layer along the film surface The shear yield stress when a strain is applied in a parallel direction at 5 mm/min is 0.15 N/mm 2 or more. The aforementioned shear yield stress may be 0.17 N/mm 2 or more. The aforementioned adhesive layer may include an optically transparent adhesive. The aforementioned optically transparent adhesive may be a cured product of a curable composition. The aforementioned curable composition may include a (meth)acrylic polymer and a crosslinking agent. The aforementioned base material layer may contain a transparent resin. The aforementioned laminated film may be a film to be subjected to die-cutting. The aforementioned laminated film may be a die-cut film obtained by die-cutting.

本發明中亦包括一種方法,其係將前述積層膜進行衝切加工而製造衝切膜。Also included in the present invention is a method of producing a die-cut film by performing a die-cut process on the aforementioned laminated film.

本發明中亦包括一種顯示裝置,其於顯示面具備前述衝切膜。該顯示裝置可為窄邊框顯示器。The present invention also includes a display device including the aforementioned die-cut film on a display surface. The display device can be a narrow frame display.

本發明中亦包括一種方法,其係針對包含基材層、離型層、及介置於前述基材層與前述離型層之間的接著層之積層膜,將對前述接著層沿著與膜面平行的方向以5 mm/分鐘施加應變時的剪切降伏應力調整為0.15N/mm 2以上,藉此來提升前述積層膜的耐衝切痕性。 Also included in the present invention is a method, which is for a laminated film comprising a substrate layer, a release layer, and an adhesive layer interposed between the aforementioned substrate layer and the aforementioned release layer, the aforementioned adhesive layer along the The shear yield stress is adjusted to 0.15 N/mm 2 or more when a strain is applied at a rate of 5 mm/min in the direction parallel to the film surface, thereby improving the die cut resistance of the laminated film.

再者,於本說明書及申請專利範圍中,所謂「耐衝切痕性」,係指以下之膜特性,亦即,不產生邊緣線痕等衝切痕,或者即便產生衝切痕,亦產生於膜的端部近旁,而即便為窄邊框(細邊框)的顯示器,圖像亦不會產生應變。Furthermore, in this specification and the scope of the patent application, the so-called "die-cut resistance" refers to the following film characteristics, that is, no die-cut marks such as edge line marks are generated, or even if die-cut marks are generated, they are also produced. Near the end of the film, the image will not be strained even for a narrow bezel (thin bezel) display.

另外,於本說明書及申請專利範圍中,所謂「窄邊框顯示器」,係指顯示裝置的框部分(畫面周圍的鑲邊部分)的寬度窄的顯示器。In addition, in this specification and the scope of the patent application, the so-called "narrow bezel display" refers to a display in which the width of the frame portion (border portion around the screen) of the display device is narrow.

進而,於本案說明書及申請專利範圍中,所謂「衝切面」,係指衝切刀最先接觸積層膜之側的表面。 [發明之效果] Furthermore, in the description of this case and the scope of the patent application, the so-called "cutting surface" refers to the surface on the side where the punching knife first contacts the laminated film. [Effect of Invention]

於本發明中,積層膜的接著層的剪切降伏應力(詳細而言,使其沿著膜面方向移位(橫向剪切)時的最大應力)被調整為0.15N/mm 2以上,因此能夠對積層膜賦予耐衝切痕性。 In the present invention, the shear yield stress of the adhesive layer of the laminated film (specifically, the maximum stress when it is displaced in the direction of the film surface (transverse shear)) is adjusted to 0.15N/ mm2 or more, so Die cut resistance can be imparted to a laminated film.

[積層膜] 本發明的積層膜包含基材層、離型層、及介置於前述基材層與前述離型層之間的接著層(或黏著層)。 [laminated film] The laminated film of the present invention includes a substrate layer, a release layer, and an adhesive layer (or adhesive layer) interposed between the substrate layer and the release layer.

(接著層或黏著層) 於本發明的積層膜中,對前述接著層沿著與膜面平行的方向以5 mm/分鐘施加應變時的剪切降伏應力(或應力的最大值)為0.15N/mm 2以上(例如0.15N/mm 2~1N/mm 2),較佳為0.17N/mm 2以上(例如0.17N/mm 2~0.8N/mm 2),進一步較佳為0.18N/mm 2以上(例如0.18N/mm 2~0.5N/mm 2),更佳為0.19N/mm 2以上(例如0.19N/mm 2~0.4N/mm 2),最佳為0.2N/mm 2以上(例如0.2N/mm 2~0.3N/mm 2)。若前述剪切降伏應力未達0.15N/mm 2,則無法對積層膜賦予耐衝切痕性。相對於此,若前述剪切降伏應力為0.15N/mm 2以上,則能夠對積層膜賦予耐衝切痕性。亦即,能夠抑制邊緣線痕之產生,即便產生邊緣線痕時,亦產生於靠近積層膜的端部之區域,因此即便為窄邊框的顯示器,亦能夠抑制圖像的應變。尤其是,若前述剪切降伏應力為0.17N/mm 2以上,則能夠根本性地抑制邊緣線痕之產生。 (Adhesive layer or adhesive layer) In the laminated film of the present invention, the shear yield stress (or the maximum value of the stress) when a strain is applied to the above-mentioned adhesive layer in a direction parallel to the film surface at 5 mm/min is 0.15N /mm 2 or more (eg 0.15N/mm 2 ~1N/mm 2 ), preferably 0.17N/mm 2 or more (eg 0.17N/mm 2 ~0.8N/mm 2 ), more preferably 0.18N/mm 2 or more (for example, 0.18N/mm 2 ~0.5N/mm 2 ), more preferably 0.19N/mm 2 or more (for example, 0.19N/mm 2 ~0.4N/mm 2 ), most preferably 0.2N/mm 2 or more (eg 0.2N/mm 2 ~0.3N/mm 2 ). If the shear yield stress is less than 0.15 N/mm 2 , die cut resistance cannot be imparted to the laminated film. On the other hand, if the shear yield stress is at least 0.15 N/mm 2 , die cut resistance can be imparted to the laminated film. That is, the occurrence of edge lines can be suppressed, and even if edge lines are generated, they are generated in the region near the end of the laminated film, so that even in a narrow bezel display, image strain can be suppressed. In particular, when the shear yield stress is 0.17 N/mm 2 or more, the occurrence of edge lines can be fundamentally suppressed.

再者,於本說明書及申請專利範圍中,前述剪切降伏應力係指使接著層沿著膜面方向移位(橫向剪切)時的最大應力,可利用後述之實施例中所記載之方法來測定。Furthermore, in this specification and the scope of the patent application, the aforementioned shear yield stress refers to the maximum stress when the adhesive layer is displaced along the film surface direction (transverse shear), which can be determined by the method described in the examples described later. Determination.

關於接著層(或黏著層),前述剪切降伏應力為0.15N/mm 2以上即可,可利用慣用的接著劑、黏著劑,但就邊緣線痕容易成為問題之方面而言,較佳為由透明光學用途中所利用之光學透明接著劑(OCA)所形成。 Regarding the adhesive layer (or adhesive layer), the aforementioned shear yield stress is sufficient to be 0.15 N/mm or more, and conventional adhesives and adhesives can be used, but edge lines are likely to be a problem, preferably Formed from optically clear adhesive (OCA) used in transparent optical applications.

光學透明接著劑可利用慣用的OCA,例如可為(甲基)丙烯酸系接著劑(或黏著劑)、胺基甲酸酯系接著劑(或黏著劑)、矽酮系接著劑(或黏著劑)、橡膠系接著劑(或黏著劑)等。這些接著劑(或黏著劑)可單獨使用或組合兩種以上使用。Optically transparent adhesives can use conventional OCA, such as (meth)acrylic adhesives (or adhesives), urethane-based adhesives (or adhesives), silicone-based adhesives (or adhesives) ), rubber adhesives (or adhesives), etc. These adhesives (or adhesives) can be used alone or in combination of two or more.

作為較佳的OCA,就透明性及接著性優異且容易調整前述剪切降伏應力之方面而言,較佳為硬化性組成物之硬化物,尤佳為包含(甲基)丙烯酸系聚合物及交聯劑之硬化性組成物之硬化物。As a preferred OCA, it is preferably a cured product of a curable composition, especially one containing a (meth)acrylic polymer and The cured product of the curable composition of the crosslinking agent.

形成(甲基)丙烯酸系聚合物之(甲基)丙烯酸系單體中包含具有交聯性基之交聯性(甲基)丙烯酸系單體、不具有交聯性基之非交聯性(甲基)丙烯酸系單體等。The (meth)acrylic monomers that form (meth)acrylic polymers include crosslinkable (meth)acrylic monomers that have crosslinkable groups and non-crosslinkable (meth)acrylic monomers that do not have crosslinkable groups. Meth)acrylic monomers, etc.

於具有交聯性基之(甲基)丙烯酸系單體中,作為交聯性基,可舉例為:羥基、羧基、環氧基、醯胺基等。In the (meth)acrylic-type monomer which has a crosslinkable group, a hydroxyl group, a carboxyl group, an epoxy group, an amide group etc. are mentioned as a crosslinkable group.

作為具有羥基之(甲基)丙烯酸系單體,例如可舉例為:(甲基)丙烯酸2-羥基乙酯等(甲基)丙烯酸羥基C 2-4烷基酯;(聚)乙二醇單(甲基)丙烯酸酯等(聚)C 2-4伸烷基二醇單(甲基)丙烯酸酯;甘油二(甲基)丙烯酸酯、三羥甲基乙烷二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、季戊四醇二或三(甲基)丙烯酸酯、二季戊四醇二或五(甲基)丙烯酸酯等。 Examples of (meth)acrylic monomers having a hydroxyl group include hydroxy C 2-4 alkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate; (poly)ethylene glycol mono (Meth)acrylates and other (poly)C 2-4 alkylene glycol mono(meth)acrylates; glycerol di(meth)acrylate, trimethylolethane di(meth)acrylate, Trimethylolpropane di(meth)acrylate, pentaerythritol di- or tri(meth)acrylate, dipentaerythritol di- or penta(meth)acrylate, and the like.

作為具有羧基之(甲基)丙烯酸系單體,例如可舉例為:(甲基)丙烯酸;(甲基)丙烯酸β-羧基乙酯等(甲基)丙烯酸羧基C 2-6烷基酯;二羧酸與具有羥基之(甲基)丙烯酸系單體之單酯等。 Examples of (meth)acrylic monomers having a carboxyl group include: (meth)acrylic acid; (meth)acrylic acid carboxyl C 2-6 alkyl esters such as β-carboxyethyl (meth)acrylate; Monoesters of carboxylic acids and (meth)acrylic monomers having hydroxyl groups, etc.

作為具有環氧基之(甲基)丙烯酸系單體,例如可舉例為(甲基)丙烯酸縮水甘油酯等。As a (meth)acrylic-type monomer which has an epoxy group, glycidyl (meth)acrylate etc. are mentioned, for example.

作為具有醯胺基之(甲基)丙烯酸系單體,例如可舉例為:(甲基)丙烯醯胺;N,N-二C 1-4烷基(甲基)丙烯醯胺等N-取代(甲基)丙烯醯胺等。 Examples of (meth)acrylic monomers having an amide group include: (meth)acrylamide; N,N-diC 1-4 alkyl (meth)acrylamide, etc. (Meth)acrylamide, etc.

作為非交聯性(甲基)丙烯酸系單體,例如可舉例為:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯等(甲基)丙烯酸直鏈狀或支鏈狀C 1-20烷基酯;(甲基)丙烯酸環己酯等(甲基)丙烯酸C 5-10環烷基酯;(甲基)丙烯酸異冰片酯等交聯環式(甲基)丙烯酸酯;(甲基)丙烯酸苯酯等(甲基)丙烯酸C 6-10芳酯等。 Examples of non-crosslinkable (meth)acrylic monomers include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and butyl (meth)acrylate. , Isobutyl (meth)acrylate, tertiary butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, (meth)acrylate (meth)acrylic acid linear or branched C 1-20 alkyl esters such as isooctyl acrylate and isononyl (meth)acrylate; (meth)acrylic acid such as cyclohexyl (meth)acrylate C 5-10 cycloalkyl esters; cross-linked cyclic (meth)acrylates such as isobornyl (meth)acrylate; C 6-10 aryl (meth)acrylates such as phenyl (meth)acrylate, etc.

這些(甲基)丙烯酸系單體可單獨使用或組合兩種以上使用。這些(甲基)丙烯酸系單體可為至少具有交聯性基之(甲基)丙烯酸系單體,亦可為具有交聯性基之(甲基)丙烯酸系單體與具有非交聯性基之(甲基)丙烯酸系單體之組合。作為具有交聯性基之(甲基)丙烯酸系單體與具有非交聯性基之(甲基)丙烯酸系單體之組合,較佳為丙烯酸C 1-10烷基酯與具有羥基之丙烯酸系單體及/或具有羧基之丙烯酸系單體之組合,尤佳為丙烯酸C 2-8烷基酯與丙烯酸羥基C 2-6烷基酯之組合。 These (meth)acrylic monomers can be used individually or in combination of 2 or more types. These (meth)acrylic monomers may be (meth)acrylic monomers having at least a crosslinkable group, or may be (meth)acrylic monomers having a crosslinkable group and non-crosslinkable A combination of (meth)acrylic monomers. As a combination of a (meth)acrylic monomer having a crosslinking group and a (meth)acrylic monomer having a non-crosslinking group, C 1-10 alkyl acrylate and acrylic acid having a hydroxyl group are preferred. A combination of monomers and/or acrylic monomers having a carboxyl group, especially a combination of C 2-8 alkyl acrylate and hydroxy C 2-6 alkyl acrylate.

(甲基)丙烯酸系聚合物的重量平均分子量可藉由凝膠滲透層析法(GPC;Gel Permeation Chromatography)等來測定,換算為聚苯乙烯時,例如為1000~100萬,較佳為3000~80萬,進一步較佳為5000~50萬,更佳為1萬~50萬。The weight-average molecular weight of the (meth)acrylic polymer can be measured by gel permeation chromatography (GPC; Gel Permeation Chromatography), etc., and when converted to polystyrene, it is, for example, 1,000 to 1,000,000, preferably 3,000 ~800,000, more preferably 5,000~500,000, more preferably 10,000~500,000.

交聯劑中可舉例為異氰酸酯系交聯劑、環氧系交聯劑等。這些之中,較佳為異氰酸酯系交聯劑。As a crosslinking agent, an isocyanate type crosslinking agent, an epoxy type crosslinking agent, etc. are mentioned, for example. Among these, an isocyanate-based crosslinking agent is preferable.

作為異氰酸酯系交聯劑,只要具有多個異氰酸酯基,則並無特別限制,例如可例示:脂肪族多異氰酸酯(例如,四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯、離胺酸二異氰酸酯等二異氰酸酯;1,3,6-六亞甲基三異氰酸酯等三異氰酸酯等)、脂環族多異氰酸酯(例如,環己烷1,4-二異氰酸酯、異佛爾酮二異氰酸酯、氫化苯二甲基二異氰酸酯、氫化雙(異氰酸基苯基)甲烷等二異氰酸酯;雙環庚烷三異氰酸酯等三異氰酸酯等)、芳香族多異氰酸酯(例如,苯二異氰酸酯、甲苯二異氰酸酯、苯二甲基二異氰酸酯(XDI)、四甲基苯二甲基二異氰酸酯、萘二異氰酸酯、雙(異氰酸基苯基)甲烷(MDI)、甲苯胺二異氰酸酯、1,3-雙(異氰酸基苯基)丙烷等二異氰酸酯;三苯基甲烷三異氰酸酯等三異氰酸酯等)、這些多異氰酸酯之二聚物、三聚物、加成物、縮二脲體等。The isocyanate-based crosslinking agent is not particularly limited as long as it has a plurality of isocyanate groups. For example, aliphatic polyisocyanates (for example, tetramethylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanates such as methyl diisocyanate and lysine diisocyanate; triisocyanates such as 1,3,6-hexamethylene triisocyanate, etc.), alicyclic polyisocyanates (for example, cyclohexane 1,4-diisocyanate, Diisocyanates such as isophorone diisocyanate, hydrogenated xylylene diisocyanate, hydrogenated bis(isocyanatophenyl)methane; triisocyanates such as dicycloheptane triisocyanate, etc.), aromatic polyisocyanates (such as benzene Isocyanate, Toluene Diisocyanate, Xylylene Diisocyanate (XDI), Tetramethylxylylene Diisocyanate, Naphthalene Diisocyanate, Bis(isocyanatophenyl)methane (MDI), Toluidine Diisocyanate, 1 , diisocyanate such as 3-bis(isocyanatophenyl)propane; triisocyanate such as triphenylmethane triisocyanate, etc.), dimers, trimers, adducts, biurets, etc. of these polyisocyanates .

這些異氰酸酯系交聯劑可單獨使用或組合兩種以上使用。這些異氰酸酯系交聯劑中,較佳為芳香族多異氰酸酯系交聯劑(例如,XDI、MDI等芳香族多異氰酸酯、經三羥甲基丙烷等烷烴多元醇改性之芳香族多異氰酸酯等)。These isocyanate type crosslinking agents can be used individually or in combination of 2 or more types. Among these isocyanate-based crosslinking agents, aromatic polyisocyanate-based crosslinking agents are preferred (for example, aromatic polyisocyanates such as XDI and MDI, aromatic polyisocyanates modified with alkane polyols such as trimethylolpropane, etc.) .

關於交聯劑的比率,相對於(甲基)丙烯酸系聚合物100質量份,可自0.01質量份~10質量份左右之範圍內選擇,例如為0.05質量份~5質量份,較佳為0.1質量份~3質量份,進一步較佳為0.2質量份~2質量份,更佳為0.3質量份~1.5質量份,最佳為0.5質量份~1質量份。於本發明的硬化性組成物中,藉由將交聯劑的比率調整為前述範圍內,能夠調整接著層的剪切降伏應力。若交聯劑的比率過少,則有難以將剪切降伏應力調整為0.15N/mm 2以上之虞。 The ratio of the crosslinking agent can be selected from the range of 0.01 to 10 parts by mass relative to 100 parts by mass of the (meth)acrylic polymer, for example, 0.05 to 5 parts by mass, preferably 0.1 Parts by mass to 3 parts by mass, more preferably 0.2 parts by mass to 2 parts by mass, more preferably 0.3 parts by mass to 1.5 parts by mass, most preferably 0.5 parts by mass to 1 part by mass. In the curable composition of the present invention, by adjusting the ratio of the crosslinking agent within the aforementioned range, the shear yield stress of the adhesive layer can be adjusted. When the ratio of the crosslinking agent is too small, it may be difficult to adjust the shear yield stress to 0.15 N/mm 2 or more.

關於(甲基)丙烯酸系聚合物及交聯劑的合計比率,於硬化性組成物之硬化物中,可為50質量%以上,較佳為80質量%以上,進一步較佳為90質量%以上,更佳為95質量%以上,亦可為100質量%。The total ratio of the (meth)acrylic polymer and the crosslinking agent may be at least 50% by mass, preferably at least 80% by mass, and more preferably at least 90% by mass in the cured product of the curable composition , more preferably at least 95% by mass, and may be 100% by mass.

硬化性組成物可為常溫硬化型、熱硬化型、光硬化型之任一種硬化型組成物。這些之中,就能夠容易地調整前述剪切降伏應力之方面而言,較佳為常溫硬化型。The curable composition may be any curable composition of a room temperature curable type, a heat curable type, or a light curable type. Among these, the room temperature hardening type is preferable at the point that the aforementioned shear yield stress can be easily adjusted.

硬化性組成物亦可進一步包含溶媒。作為溶媒,可舉例為慣用的溶媒,例如水、醇類、酮類、醚類、酯類、醯胺類、腈類、亞碸類、脂肪族烴類、芳香族烴類、鹵化烴類等。這些溶媒可單獨使用或組合兩種以上使用。這些溶媒中,較佳為乙酸乙酯、乙酸異丙酯等酯類。關於溶媒的比率,相對於(甲基)丙烯酸系聚合物100質量份,例如為10質量份~1000質量份,較佳為50質量份~500質量份,進一步較佳為100質量份~400質量份,更佳為200質量份~350質量份。The curable composition may further contain a solvent. Examples of the solvent include conventional solvents such as water, alcohols, ketones, ethers, esters, amides, nitriles, ethylene oxides, aliphatic hydrocarbons, aromatic hydrocarbons, halogenated hydrocarbons, etc. . These solvents can be used alone or in combination of two or more. Among these solvents, esters such as ethyl acetate and isopropyl acetate are preferred. The ratio of the solvent is, for example, 10 to 1,000 parts by mass, preferably 50 to 500 parts by mass, and more preferably 100 to 400 parts by mass to 100 parts by mass of the (meth)acrylic polymer. parts, more preferably 200 parts by mass to 350 parts by mass.

硬化性組成物中,除了(甲基)丙烯酸系聚合物及交聯劑以外,亦可進一步包含慣用的添加劑。作為慣用的添加劑,例如可舉例為:黏著賦予劑(膠黏劑)、黏度調整劑、增黏劑、消泡劑、填充劑、滑劑、穩定劑(抗氧化劑、熱穩定劑、光穩定劑等)、阻燃劑等。這些添加劑可單獨使用或組合兩種以上使用。關於其他添加劑的合計比率,相對於(甲基)丙烯酸系聚合物100質量份,可為50質量份以下,例如為0.1質量份~30質量份,較佳為0.5質量份~10質量份。In addition to a (meth)acrylic-type polymer and a crosslinking agent, a curable composition may further contain usual additives. Commonly used additives include, for example, adhesion imparting agents (adhesives), viscosity modifiers, thickeners, defoamers, fillers, lubricants, stabilizers (antioxidants, heat stabilizers, light stabilizers) etc.), flame retardants, etc. These additives may be used alone or in combination of two or more. The total ratio of other additives may be 50 parts by mass or less, for example, 0.1 to 30 parts by mass, preferably 0.5 to 10 parts by mass, based on 100 parts by mass of the (meth)acrylic polymer.

接著層的全光線透過率可為70%以上,例如為70%~99.9%,較佳為75%~99%,進一步較佳為80%~98%。若全光線透過率降低,則衝切痕不成問題,而有表現不出本發明的效果之虞。The total light transmittance of the bonding layer may be above 70%, such as 70%-99.9%, preferably 75%-99%, further preferably 80%-98%. If the total light transmittance is lowered, punching marks are not a problem, but there is a possibility that the effect of the present invention may not be exhibited.

再者,於本說明書及申請專利範圍中,全光線透過率可依據JIS K7361來測定。In addition, in this specification and the claims, the total light transmittance can be measured based on JIS K7361.

接著層的平均厚度例如為1 µm~100 µm,較佳為3 µm~80 µm,進一步較佳為5 µm~50 µm,更佳為10 µm~40 µm,最佳為20 µm~30 µm。若接著層的平均厚度過薄,則有接著性降低之虞,且過薄或過厚,均有容易產生衝切痕之虞。The average thickness of the bonding layer is, for example, 1 µm to 100 µm, preferably 3 µm to 80 µm, further preferably 5 µm to 50 µm, more preferably 10 µm to 40 µm, most preferably 20 µm to 30 µm. If the average thickness of the adhesive layer is too thin, the adhesiveness may be lowered, and if it is too thin or too thick, punching marks may be easily generated.

再者,於本說明書及申請專利範圍中,各層的平均厚度可使用接著式膜厚計,測定任意之10個部位,算出平均值而求出。In addition, in this specification and the claims, the average thickness of each layer can be obtained by measuring arbitrary 10 locations using an adhesive film thickness gauge, and calculating the average value.

(基材層) 基材層的材質並無特別限定,可為有機材料、無機材料之任一種,但就邊緣線痕容易成為問題之方面而言,較佳為由透明材料所形成。 (substrate layer) The material of the substrate layer is not particularly limited, and may be any of organic materials and inorganic materials, but it is preferably formed of a transparent material in terms of edge marks that tend to become a problem.

透明材料可為玻璃等無機材料,但多數情況下利用衝切加工來成形,當接著層與基材層接觸時,就接著性亦優異之方面而言,較佳為有機材料。The transparent material may be an inorganic material such as glass, but in many cases it is formed by die-cutting. When the adhesive layer is in contact with the base layer, an organic material is preferable in terms of excellent adhesiveness.

作為有機材料,例如可舉例為:纖維素酯、聚酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚碳酸酯系樹脂、(甲基)丙烯酸系聚合物等透明樹脂。這些之中,較佳為纖維素酯、聚酯系樹脂、聚碳酸酯系樹脂。Examples of the organic material include transparent resins such as cellulose esters, polyester resins, polyamide resins, polyimide resins, polycarbonate resins, and (meth)acrylic polymers. Among these, cellulose ester, polyester-based resin, and polycarbonate-based resin are preferable.

作為纖維素酯,可舉例為:三乙酸纖維素(TAC)等乙酸纖維素、乙酸丙酸纖維素、乙酸丁酸纖維素等乙酸C 3-4醯化纖維素等。 Examples of the cellulose ester include cellulose acetate such as cellulose triacetate (TAC), cellulose acetate propionate, cellulose acetate butyrate, and cellulose acetate C3-4 acylate.

作為聚酯系樹脂,例如可舉例為:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等聚伸烷基芳酯系樹脂等。As a polyester resin, polyalkylene arylate resins, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), etc. are mentioned, for example.

作為聚碳酸酯系樹脂,例如可例示雙酚A型聚碳酸酯等雙酚型聚碳酸酯等。As polycarbonate-type resin, bisphenol type polycarbonate, such as bisphenol A type polycarbonate, etc. are illustrated, for example.

這些之中,就機械特性、透明性等之平衡優異之方面而言,較佳為TAC等乙酸纖維素、PET等聚伸烷基芳酯系樹脂,尤佳為聚C 2-4伸烷基芳酯系樹脂。 Among these, polyalkylene arylate-based resins such as cellulose acetate such as TAC and PET are preferable, and poly C 2-4 alkylene resins are particularly preferable in terms of excellent balance between mechanical properties and transparency. Aryl ester resin.

關於透明樹脂的比率,於基材層中,可為50質量%以上,較佳為80質量%以上,進一步較佳為90質量%以上,更佳為95質量%以上,亦可為100質量%。The ratio of the transparent resin in the substrate layer may be at least 50% by mass, preferably at least 80% by mass, further preferably at least 90% by mass, more preferably at least 95% by mass, and may be 100% by mass .

基材層包含透明樹脂時,亦可進一步包含作為前述接著層的硬化性組成物中的慣用的添加劑所例示之添加劑。關於添加劑的比率,相對於透明樹脂100質量份,可為50質量份以下,例如為0.1質量份~30質量份,較佳為0.5質量份~10質量份。When the base material layer contains a transparent resin, it may further contain the additives exemplified as usual additives in the curable composition of the above-mentioned adhesive layer. The ratio of the additives may be 50 parts by mass or less, for example, 0.1 parts by mass to 30 parts by mass, preferably 0.5 parts by mass to 10 parts by mass, based on 100 parts by mass of the transparent resin.

基材層為有機材料(尤其是聚酯系樹脂)時,可為未延伸膜,亦可為單軸或雙軸延伸膜。有機材料為聚酯系樹脂時,可為雙軸延伸膜。When the substrate layer is an organic material (especially polyester-based resin), it may be an unstretched film or a uniaxially or biaxially stretched film. When the organic material is a polyester resin, it may be a biaxially stretched film.

基材層可經表面處理(例如,電暈放電處理、火焰處理、電漿處理、臭氧照射處理、紫外線照射處理等),亦可具有易接著層。The substrate layer may be surface-treated (for example, corona discharge treatment, flame treatment, plasma treatment, ozone irradiation treatment, ultraviolet irradiation treatment, etc.), and may also have an easy-adhesive layer.

基材層的全光線透過率可為70%以上,例如為70%~99.9%,較佳為75%~99%,進一步較佳為80%~98%。若全光線透過率降低,則衝切痕不成問題,而有表現不出本發明的效果之虞。The total light transmittance of the substrate layer may be above 70%, such as 70%-99.9%, preferably 75%-99%, and more preferably 80%-98%. If the total light transmittance is lowered, punching marks are not a problem, but there is a possibility that the effect of the present invention may not be exhibited.

基材層的平均厚度可自10 µm~2000 µm左右之範圍內選擇,例如為20 µm~1000 µm,較佳為30 µm~300 µm,進一步較佳為50 µm~200 µm,最佳為75 µm~150 µm。若基材層的厚度過薄,則有積層膜的機械特性降低之虞,若過厚,則有難以賦予耐衝切痕性之虞。The average thickness of the substrate layer can be selected from a range of about 10 µm to 2000 µm, such as 20 µm to 1000 µm, preferably 30 µm to 300 µm, further preferably 50 µm to 200 µm, and most preferably 75 µm~150 µm. If the thickness of the base material layer is too thin, the mechanical properties of the laminated film may be reduced, and if it is too thick, it may be difficult to impart die cut resistance.

(離型層) 本發明的積層膜具有離型層,因此於衝切加工中,離型層隨著衝切刀之移動而容易暫時層間剝離,因離型層之剝離而容易產生衝切痕。本發明的積層膜中,儘管具有離型層,亦能夠提升耐衝切痕性。 (release layer) The laminated film of the present invention has a release layer. Therefore, during the punching process, the release layer tends to be temporarily peeled off with the movement of the punching knife, and punching marks are easily generated due to the peeling of the release layer. In the laminated film of the present invention, die cut resistance can be improved despite having a release layer.

離型層只要與前述接著層適度地接著而能夠剝離,則並無特別限定,可利用慣用的離型膜等。The release layer is not particularly limited as long as it adheres moderately to the above-mentioned adhesive layer and can be peeled off, and a commonly used release film or the like can be used.

另外,離型層可由包含熱塑性樹脂及離型劑之樹脂組成物所形成。作為熱塑性樹脂,例如可舉例為:聚烯烴系樹脂、聚乙烯醇系聚合物、聚酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚碳酸酯系樹脂、聚苯醚系樹脂、聚苯硫醚系樹脂、纖維素酯等。這些熱塑性樹脂可單獨使用或組合兩種以上使用。這些熱塑性樹脂中,較佳為PET等聚C 2-4伸烷基芳酯系樹脂。 In addition, the release layer may be formed of a resin composition including a thermoplastic resin and a release agent. Examples of thermoplastic resins include polyolefin-based resins, polyvinyl alcohol-based polymers, polyester-based resins, polyamide-based resins, polyimide-based resins, polycarbonate-based resins, and polyphenylene ether-based resins. , polyphenylene sulfide resin, cellulose ester, etc. These thermoplastic resins can be used individually or in combination of 2 or more types. Among these thermoplastic resins, poly C 2-4 alkylene arylate resins such as PET are preferable.

作為離型劑,例如可舉例為:矽酮油、矽酮樹脂、具有聚氧伸烷基單元之聚有機矽氧烷等矽酮系化合物;植物蠟、動物蠟、石蠟、聚乙烯蠟、乙烯共聚物蠟、聚丙烯蠟等蠟類;C 8-35脂肪酸鹼金屬鹽等高級脂肪酸金屬鹽;C 8-35脂肪酸烷基酯等高級脂肪酸烷基酯;C 8-35脂肪酸醯胺、伸烷基雙脂肪酸醯胺等高級脂肪酸醯胺;氟油、氟樹脂等氟化合物等。這些離型劑可單獨使用或組合兩種以上使用。這些之中,較佳為矽酮系化合物。 As the release agent, for example, silicone-based compounds such as silicone oil, silicone resin, and polyorganosiloxane having polyoxyalkylene units; vegetable wax, animal wax, paraffin wax, polyethylene wax, vinyl wax, etc. Copolymer wax, polypropylene wax and other waxes; C 8-35 fatty acid alkali metal salts and other higher fatty acid metal salts; C 8-35 fatty acid alkyl esters and other higher fatty acid alkyl esters; C 8-35 fatty acid amides, extension Higher fatty acid amide such as alkylbis fatty acid amide; fluorine compounds such as fluorine oil and fluorine resin, etc. These release agents can be used alone or in combination of two or more. Among these, silicone-based compounds are preferable.

關於離型劑的比率,相對於熱塑性樹脂100質量份,例如為0.01質量份~30質量份,較佳為0.05質量份~20質量份,進一步較佳為0.1質量份~10質量份左右。The ratio of the release agent is, for example, 0.01 to 30 parts by mass, preferably 0.05 to 20 parts by mass, and more preferably about 0.1 to 10 parts by mass with respect to 100 parts by mass of the thermoplastic resin.

離型層亦可進一步包含作為前述接著層的硬化性組成物中的慣用的添加劑所例示之添加劑。關於添加劑的比率,相對於熱塑性樹脂100質量份,可為50質量份以下,例如為0.1質量份~30質量份,較佳為0.5質量份~10質量份。The release layer may further contain the additives exemplified as usual additives in the curable composition of the above-mentioned adhesive layer. The ratio of the additives may be 50 parts by mass or less, for example, 0.1 parts by mass to 30 parts by mass, preferably 0.5 parts by mass to 10 parts by mass, based on 100 parts by mass of the thermoplastic resin.

離型層的平均厚度可自1 µm~2000 µm左右之範圍內選擇,例如為5 µm~1000 µm,較佳為10 µm~300 µm,進一步較佳為30 µm~200 µm。The average thickness of the release layer can be selected from a range of about 1 µm to 2000 µm, for example, 5 µm to 1000 µm, preferably 10 µm to 300 µm, and more preferably 30 µm to 200 µm.

(積層膜的特性) 本發明的積層膜係用以供至衝切加工之膜,藉由將接著層的前述剪切降伏應力調整為0.15N/mm 2以上,能夠對積層膜賦予耐衝切痕性。作為接著層的前述剪切降伏應力的調整方法,可藉由適宜選擇接著層的材質而進行調整,如上所述接著層由硬化性樹脂組成物之硬化物所形成時,可藉由控制硬化性組成物的材質及/或硬化的程度而進行調整。 (Characteristics of laminated film) The laminated film of the present invention is a film to be subjected to die-cutting, and by adjusting the aforementioned shear yield stress of the adhesive layer to 0.15 N/mm 2 or more, punching resistance can be imparted to the laminated film trace. As a method of adjusting the aforementioned shear yield stress of the adhesive layer, it can be adjusted by appropriately selecting the material of the adhesive layer. The material of the composition and/or the degree of hardening are adjusted.

本發明的積層膜只要於基材層與離型層之間介置接著層即可,除了基材層、離型層及接著層以外,亦可包含其他層。作為其他層,例如可舉例為:硬塗層、光學功能層(防眩層、偏光層、抗反射層、折射率調整層、抗牛頓環層等)、表面保護層(覆蓋層)等。其他層可配設於離型層與接著層之間、基材層與接著層之間、基材層上(與接著層為相反側的面)之任一位置,但較佳為基材層與接著層之間、基材層上,尤佳為基材層上。例如,亦可於基材層上積層硬塗層,於前述硬塗層上積層成為衝切面之覆蓋層。The laminated film of the present invention only needs to interpose an adhesive layer between the base material layer and the release layer, and may include other layers in addition to the base material layer, the release layer, and the adhesive layer. Examples of other layers include hard coat layers, optical functional layers (anti-glare layer, polarizing layer, antireflection layer, refractive index adjustment layer, anti-Newton ring layer, etc.), surface protection layer (covering layer), and the like. Other layers can be arranged at any position between the release layer and the adhesive layer, between the substrate layer and the adhesive layer, or on the substrate layer (on the side opposite to the adhesive layer), but the substrate layer is preferred Between the bonding layer and on the substrate layer, especially preferably on the substrate layer. For example, a hard coat layer may be laminated on the substrate layer, and a cover layer for the die-cut surface may be laminated on the hard coat layer.

積層膜中除離型層以外的積層膜較佳為透明性優異。除離型層以外的積層膜的全光線透過率可為70%以上,例如為70%~99.9%,較佳為75%~99%,進一步較佳為80%~98%。若全光線透過率降低,則衝切痕不成問題,而有表現不出本發明的效果之虞。Among the laminated films, the laminated films other than the release layer are preferably excellent in transparency. The total light transmittance of the laminated film other than the release layer may be more than 70%, such as 70%-99.9%, preferably 75%-99%, and more preferably 80%-98%. If the total light transmittance is lowered, punching marks are not a problem, but there is a possibility that the effect of the present invention may not be exhibited.

接著層與離型層接觸時,接著層與離型層之剝離強度例如為0.001N/50 mm~2N/50 mm、較佳為0.01N/50 mm~1N/50 mm,進一步較佳為0.05N/50 mm~0.5N/50 mm。若剝離強度過大,則有離型性降低之虞,反之,若剝離強度過低,則有操作性降低之虞。When the adhesive layer is in contact with the release layer, the peel strength between the adhesive layer and the release layer is, for example, 0.001N/50mm~2N/50mm, preferably 0.01N/50mm~1N/50mm, more preferably 0.05 N/50mm~0.5N/50mm. When the peeling strength is too high, there is a possibility that the release property may be lowered, and conversely, when the peeling strength is too low, there is a possibility that the handleability may be lowered.

再者,於本說明書及申請專利範圍中,剝離強度可依據JIS Z 0237:2009中所記載之方法來測定。In addition, in this specification and the claims, the peel strength can be measured according to the method described in JIS Z 0237:2009.

本發明的積層膜的衝切面至接著層(或黏著層)的平均厚度(亦即,衝切面與接著層之間的層的平均厚度)可為150 µm以下(例如10 µm~150 µm),較佳為135 µm以下(例如20 µm~135 µm),進一步較佳為130 µm以下(例如30 µm~130 µm),更佳為100 µm以下(例如40 µm~100 µm),最佳為80 µm以下(例如50 µm~80 µm)。若前述平均厚度超過150 µm,則有耐衝切痕性降低之虞。The average thickness of the laminated film of the present invention from the die-cut surface to the bonding layer (or adhesive layer) (that is, the average thickness of the layer between the die-cut surface and the bonding layer) may be 150 µm or less (for example, 10 µm to 150 µm), Preferably less than 135 µm (eg 20 µm~135 µm), more preferably less than 130 µm (eg 30 µm~130 µm), more preferably less than 100 µm (eg 40 µm~100 µm), most preferably 80 Below µm (for example, 50 µm~80 µm). When the said average thickness exceeds 150 micrometers, there exists a possibility that punching mark resistance may fall.

(積層膜的製造方法) 本發明的積層膜可利用慣用的方法製造,可利用共擠壓法、塗佈法、層壓法等製造,接著層由硬化性組成物之硬化物所形成時,藉由調整接著層的硬化方法,能夠調整接著層的前述剪切降伏應力。硬化性組成物為常溫硬化性組成物時,例如可藉由控制硬化時間(熟化時間或老化時間),來調整前述剪切降伏應力。另外,硬化性組成物為熱硬化性組成物時,例如可藉由控制加熱溫度及/或加熱時間,來調整前述剪切降伏應力。進而,硬化性樹脂組成物為光硬化性組成物時,例如可藉由控制光照射量及/或照射時間,來調整前述剪切降伏應力。再者,如上所述,無論為任一種硬化性組成物,硬化性組成物包含交聯劑時,均可藉由控制交聯劑的比率,來調整前述剪切降伏應力。 (Manufacturing method of laminated film) The laminated film of the present invention can be manufactured by a conventional method, such as co-extrusion, coating, lamination, etc., and when the adhesive layer is formed of a cured product of a curable composition, by adjusting the curing of the adhesive layer In this way, the aforementioned shear yield stress of the adhesive layer can be adjusted. When the curable composition is a room temperature curable composition, for example, the aforementioned shear yield stress can be adjusted by controlling the curing time (curing time or aging time). In addition, when the curable composition is a thermosetting composition, the aforementioned shear yield stress can be adjusted, for example, by controlling the heating temperature and/or heating time. Furthermore, when the curable resin composition is a photocurable composition, for example, by controlling the light irradiation amount and/or irradiation time, the aforementioned shear yield stress can be adjusted. Furthermore, as mentioned above, regardless of any curable composition, when the curable composition contains a cross-linking agent, the aforementioned shear yield stress can be adjusted by controlling the ratio of the cross-linking agent.

[衝切膜及其用途] 根據用途將前述積層膜衝切加工成目標形狀而製造衝切膜(成形膜)。作為將積層膜進行衝切加工之方法,可利用慣用的方法,例如可使用具備Pinnacle刀、Thomson刀之衝壓機等進行衝切加工。於衝切加工中,可對接著層以形成有基材層之側的面作為衝切面進行衝切加工,亦可對接著層以形成有離型層之側的面作為衝切面進行衝切加工。 [Die-cut film and its application] Die-cut films (formed films) are produced by die-cutting the aforementioned laminated film into the desired shape according to the application. As a method of punching the laminated film, a conventional method can be used, for example, a punching machine equipped with a Pinnacle knife or a Thomson knife can be used for punching. In the die-cutting process, the die-cutting process can be performed on the side of the adhesive layer on which the substrate layer is formed, or the die-cutting process can be performed on the side of the adhesive layer on which the release layer is formed. .

除離型層以外的積層膜的透明性高時,所獲得之衝切膜較佳為配設於顯示裝置的顯示面。作為顯示裝置,例如可舉例為:液晶顯示(LCD;liquid crystal display)裝置、陰極管顯示裝置、有機或無機電致發光(EL;electroluminescence)顯示器、場發射顯示器(FED;field emission display)、表面傳導電子發射顯示器(SED;surface-conduction electron-emitter display)、背投電視顯示器、電漿顯示器、附觸控面板之顯示裝置、觸控面板顯示器、觸控感測器等。這些顯示裝置中,前述積層膜具有耐衝切痕性,因此較佳為配設於顯示面中的框的寬度窄的窄邊框顯示器。窄邊框顯示器中,框的寬度例如可為5 mm以下,較佳為3 mm以下。When the transparency of the laminated film other than the release layer is high, it is preferable to arrange the obtained die-cut film on the display surface of the display device. As the display device, for example, a liquid crystal display (LCD; liquid crystal display) device, a cathode tube display device, an organic or inorganic electroluminescence (EL; electroluminescence) display, a field emission display (FED; field emission display), a surface Conduction electron emission display (SED; surface-conduction electron-emitter display), rear projection TV display, plasma display, display device with touch panel, touch panel display, touch sensor, etc. In these display devices, since the laminated film has die-cut resistance, it is preferable to be a narrow-frame display in which the width of the frame arranged on the display surface is narrow. In a narrow bezel display, the width of the frame may be, for example, less than 5 mm, preferably less than 3 mm.

再者,本說明書中所揭示之各種態樣亦可與本說明書中所揭示之其他任意特徵組合。 [實施例] Furthermore, various aspects disclosed in this specification can also be combined with any other features disclosed in this specification. [Example]

以下,基於實施例更詳細地說明本發明,但本發明並不受這些實施例之限定。實施例中所使用之原料如下所述,利用以下之方法評價所獲得之積層膜。Hereinafter, although an Example demonstrates this invention in more detail, this invention is not limited to these Examples. The raw materials used in the examples are as follows, and the obtained laminated film was evaluated by the following method.

[原料] 丙烯酸系黏著劑:三菱化學(股)製造的「Coponyl N-7520」 交聯劑:東曹(股)製造的「Coronate L-45E」 離型膜:東洋紡(股)製造的「COSMOPEEL TZ-600」 基材膜:三菱化學(股)製造的「Diafoil O321E」、平均厚度75 µm~140 µm。 [raw material] Acrylic adhesive: "Coponyl N-7520" manufactured by Mitsubishi Chemical Co., Ltd. Cross-linking agent: "Coronate L-45E" manufactured by Tosoh Co., Ltd. Release film: "COSMOPEEL TZ-600" manufactured by Toyobo Co., Ltd. Base film: "Diafoil O321E" manufactured by Mitsubishi Chemical Co., Ltd., with an average thickness of 75 µm to 140 µm.

[剪切特性] 將所獲得之積層膜加工成圖1所示之形狀,作為測定樣品。測定樣品如圖1之側視圖(a)及俯視圖(b)所示,測定樣品係將所獲得之積層膜切斷成寬度10 mm,並以僅長度方向的中央部殘留積層構造之方式進行加工。詳細而言,測定樣品如圖1之側視圖(a)所示具有如下構造,亦即,於長度方向的中央部以10 mm之長度殘留有積層構造,相對於中央部而言,於一端部,基材層1及接著層2被移除而離型層3露出,且於另一端部,離型層3及接著層2被移除而基材層1露出。 [Shear characteristics] The obtained laminated film was processed into the shape shown in Fig. 1 and used as a measurement sample. As shown in the side view (a) and top view (b) of Fig. 1, the measurement sample was obtained by cutting the obtained laminated film into a width of 10 mm, and processing it so that only the central part in the longitudinal direction remained the laminated structure . Specifically, as shown in the side view (a) of Fig. 1, the measurement sample has a structure in which a laminated structure remains at a length of 10 mm in the central part in the longitudinal direction, and at one end of the central part , the substrate layer 1 and the bonding layer 2 are removed and the release layer 3 is exposed, and at the other end, the release layer 3 and the bonding layer 2 are removed and the substrate layer 1 is exposed.

將前述測定樣品設置於Tensilon(島津製作所(股)製造的「AGS-X50N」),如圖1之側視圖(a)所示,以拉伸速度5 mm/分鐘,將所露出之基材膜沿著測定樣品的膜面方向拉伸而進行拉伸試驗,測定對接著層所施加之剪切降伏應力值。具體而言,將拉伸移位為0 mm~1 mm時的應力的最大值或峰值除以接著層的面積(接著區域的面積),將所得值作為剪切降伏應力值。Set the above-mentioned measurement sample on Tensilon ("AGS-X50N" manufactured by Shimadzu Corporation Co., Ltd.), as shown in the side view (a) of Fig. 1, and stretch the exposed base film The tensile test was performed by stretching along the film surface direction of the measurement sample, and the shear yield stress value applied to the adhesive layer was measured. Specifically, the maximum value or peak value of the stress when the tensile displacement is 0 mm to 1 mm is divided by the area of the bonding layer (the area of the bonding region), and the obtained value is regarded as the shear yield stress value.

[邊緣線痕] 使用衝壓機(DAITEX(股)製造的「PAC-HD」),在Pinnacle刀、刀高2.2 mm、兩刀30°之條件下,將所獲得之積層膜自基材膜側衝切成90 mm×130 mm。使用LED照明(PiPhotonics(股)製造的「HOLOLIGHT」)作為光源,使光透過衝切後的衝切膜,將膜的影投影至白板上而於膜的邊緣部分的內側產生邊緣線痕,按照以下指標評價所產生之邊緣線痕。投影方法係將衝切後的積層膜設置於白板與光源之間,且以白板與光源之距離為80 cm、積層膜與白板之距離為5 cm~10 cm之間之方式,調整為最易觀察到邊緣線痕之位置。 [edge line marks] Using a punching machine ("PAC-HD" manufactured by DAITEX Co., Ltd.), the obtained laminated film is punched into 90 mm from the base film side under the conditions of a pinnacle knife, a knife height of 2.2 mm, and two knife angles of 30°. ×130mm. Using LED lighting ("HOLOLIGHT" manufactured by PiPhotonics Co., Ltd.) as a light source, light is transmitted through the die-cut film, and the shadow of the film is projected on a white board to generate edge lines inside the edge of the film. The following indicators evaluate the edge lines produced. The projection method is to place the die-cut laminated film between the whiteboard and the light source, and adjust the distance between the whiteboard and the light source to be 80 cm, and the distance between the laminated film and the whiteboard to be between 5 cm and 10 cm. Observe the position of the edge line marks.

○:完全無邊緣線痕 △:邊緣線痕位於自衝切膜的端部起未達3 mm之位置 ×:邊緣線痕位於自衝切膜的端部起為3 mm以上之位置。 ○: No edge marks at all △: The edge line mark is located within 3 mm from the end of the die-cut film ×: Edge lines are located at a position of 3 mm or more from the end of the die-cut film.

實施例1 (OCA塗敷液之製備) 使丙烯酸系黏著劑35質量份、交聯劑0.15質量份溶解於乙酸乙酯90質量份中而製備OCA塗敷液。 Example 1 (Preparation of OCA coating solution) An OCA coating liquid was prepared by dissolving 35 parts by mass of an acrylic adhesive and 0.15 parts by mass of a crosslinking agent in 90 parts by mass of ethyl acetate.

(積層膜之製作) 利用貝克式敷料器將OCA塗敷液塗佈於離型膜的離型面,使用乾燥爐於120℃乾燥2分鐘而形成平均厚度25 µm之接著層(黏著層)。利用壓接輥使平均厚度125 µm之基材膜貼合於所獲得之接著層的表面而製作積層膜前驅物。將所獲得之積層膜前驅物於30℃、50%RH之環境下靜置,將接著層進行硬化處理而獲得積層膜。此時,評價靜置5天後及10天後的接著層的剪切特性及積層膜的邊緣線痕。 (production of laminated film) The OCA coating solution was applied to the release surface of the release film with a Baker applicator, and dried in a drying oven at 120°C for 2 minutes to form an adhesive layer (adhesive layer) with an average thickness of 25 µm. A substrate film with an average thickness of 125 µm was bonded to the surface of the obtained adhesive layer using a pressure bonding roller to prepare a laminated film precursor. The obtained laminated film precursor was left to stand in an environment of 30° C. and 50% RH, and the subsequent layer was hardened to obtain a laminated film. At this time, the shear properties of the adhesive layer and the edge marks of the laminated film were evaluated after standing for 5 days and 10 days.

實施例2 將交聯劑變更為0.3質量份,除此以外,與實施例1同樣地製作積層膜,評價接著層的剪切特性及積層膜的邊緣線痕。 Example 2 Except having changed the crosslinking agent into 0.3 mass parts, the laminated|multilayer film was produced similarly to Example 1, and the shear characteristic of an adhesive layer and the edge line mark of a laminated film were evaluated.

評價結果示於下述表1。The evaluation results are shown in Table 1 below.

[表1] (剪切特性及邊緣線痕評價) 接著層的硬化天數 5天 10天 剪切降伏應力(N/mm 2) 邊緣線痕 剪切降伏應力(N/mm 2) 邊緣線痕 實施例1 0.12 × 0.15 實施例2 0.16 0.21 [Table 1] (Evaluation of shear characteristics and edge marks) Hardening days of next layer 5 days 10 days Shear yield stress (N/mm 2 ) edge line marks Shear yield stress (N/mm 2 ) edge line marks Example 1 0.12 x 0.15 Example 2 0.16 0.21

由表1之結果可明顯看出,若接著層的剪切降伏應力為0.15N/mm 2以上,則邊緣線痕之產生得到抑制。 From the results in Table 1, it can be clearly seen that if the shear yield stress of the adhesive layer is above 0.15N/mm 2 , the occurrence of edge marks can be suppressed.

實施例3 使用平均厚度75 µm之基材膜,除此以外,與實施例2同樣地製造積層膜前驅物,將所獲得之積層膜前驅物於30℃、50%RH之環境下靜置10天,將接著層進行硬化處理而獲得積層膜。評價積層膜的邊緣線痕,評價結果為「○」。 Example 3 Except for using a substrate film with an average thickness of 75 µm, a laminated film precursor was produced in the same manner as in Example 2, and the obtained laminated film precursor was left to stand at 30°C and 50%RH for 10 days. The subsequent layer is subjected to curing treatment to obtain a laminated film. The edge marks of the laminated film were evaluated, and the evaluation result was "◯".

實施例4 使用平均厚度140 µm之基材膜,除此以外,與實施例2同樣地製造積層膜前驅物,將所獲得之積層膜前驅物於30℃、50%RH之環境下靜置10天,將接著層進行硬化處理而獲得積層膜。評價積層膜的邊緣線痕,評價結果為「△」。 [產業上之可利用性] Example 4 Except for using a substrate film with an average thickness of 140 µm, a laminated film precursor was produced in the same manner as in Example 2, and the obtained laminated film precursor was left to stand at 30°C and 50%RH for 10 days. The subsequent layer is subjected to curing treatment to obtain a laminated film. The edge marks of the laminated film were evaluated, and the evaluation result was "△". [Industrial availability]

本發明的積層膜可用作藉由衝切加工所成形之積層膜,例如作為配設於各種顯示器的顯示面之膜有用,可用作PC監視器、電視、汽車導航、智慧型手機、平板PC、遊戲機等的顯示面所配設之膜,可為預先組裝至顯示面之膜,亦可為面向售後市場(aftermarket)之保護膜(protect film),但作為應用於衝切痕之存在容易顯眼的窄邊框顯示器之膜特別有用。The laminated film of the present invention can be used as a laminated film formed by punching, for example, it is useful as a film arranged on the display surface of various displays, and can be used as a PC monitor, TV, car navigation, smart phone, tablet The film provided on the display surface of PC, game machine, etc. can be pre-assembled to the display surface, or it can be a protective film for the aftermarket (aftermarket). The films are particularly useful where there are narrow bezel displays that are easily noticeable.

1:基材層 2:接著層 3:離型層 1: Substrate layer 2: Next layer 3: Release layer

[圖1]係實施例中用以測定接著層的剪切降伏應力之樣品的概略側視圖(a)及俯視圖(b)。[ Fig. 1 ] It is a schematic side view (a) and a top view (b) of a sample used to measure the shear yield stress of the adhesive layer in the examples.

無。none.

Claims (12)

一種積層膜,其係包含基材層、離型層、及介置於前述基材層與前述離型層之間的接著層之積層膜,且對前述接著層沿著與膜面平行的方向以5 mm/分鐘施加應變時的剪切降伏應力為0.15N/mm 2以上。 A laminated film, which is a laminated film comprising a base material layer, a release layer, and an adhesive layer interposed between the aforementioned base material layer and the aforementioned release layer, and the aforementioned adhesive layer is aligned in a direction parallel to the film surface The shear yield stress when a strain is applied at 5 mm/min is 0.15 N/mm 2 or more. 如請求項1之積層膜,其中前述剪切降伏應力為0.17N/mm 2以上。 The laminated film according to claim 1, wherein the shear yield stress is 0.17 N/mm 2 or more. 如請求項1或2之積層膜,其中前述接著層由光學透明接著劑所形成。The laminated film according to claim 1 or 2, wherein the adhesive layer is formed of an optically transparent adhesive. 如請求項3之積層膜,其中前述光學透明接著劑為硬化性組成物之硬化物。The laminated film according to claim 3, wherein the optically transparent adhesive is a cured product of a curable composition. 如請求項4之積層膜,其中前述硬化性組成物包含(甲基)丙烯酸系聚合物及交聯劑。The laminated film according to claim 4, wherein the curable composition includes a (meth)acrylic polymer and a crosslinking agent. 如請求項1或2之積層膜,其中前述基材層包含透明樹脂。The laminated film according to claim 1 or 2, wherein the base material layer comprises a transparent resin. 如請求項1或2之積層膜,其係用以供至衝切加工之膜。The laminated film of claim 1 or 2 is a film for die-cutting. 如請求項1或2之積層膜,其係經衝切加工所得之衝切膜。The laminated film of claim 1 or 2 is a die-cut film obtained by die-cutting. 一種衝切膜的製造方法,其係將如請求項1或2之積層膜進行衝切加工而製造衝切膜。A method for producing a die-cut film, comprising performing die-cut processing on the laminated film according to claim 1 or 2 to produce a die-cut film. 一種顯示裝置,其於顯示面具備如請求項8之衝切膜。A display device having the die-cut film according to claim 8 on the display surface. 如請求項10之顯示裝置,其係窄邊框顯示器。As the display device of claim 10, it is a narrow frame display. 一種積層膜之耐衝切痕性之提升方法,其係針對包含基材層、離型層、及介置於前述基材層與前述離型層之間的接著層之積層膜,將對前述接著層沿著與膜面平行的方向以5 mm/分鐘施加應變時的剪切降伏應力調整為0.15N/mm 2以上,藉此來提升前述積層膜的耐衝切痕性。 A method for improving the punching mark resistance of a laminated film, which is aimed at a laminated film comprising a base material layer, a release layer, and an adhesive layer interposed between the aforementioned base material layer and the aforementioned release layer. The shear yield stress of the subsequent layer when a strain is applied at 5 mm/min in a direction parallel to the film surface is adjusted to be 0.15 N/mm 2 or more, thereby improving the die cut resistance of the laminated film.
TW111110344A 2021-03-24 2022-03-21 Laminated film, method for improving punching mark resistance of laminated film, method for manufacturing die-cut film, and display device TWI813211B (en)

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