TW202231821A - Electronic component transferring adhesive sheet, and electronic component processing method using electronic component transferring adhesive sheet - Google Patents

Electronic component transferring adhesive sheet, and electronic component processing method using electronic component transferring adhesive sheet Download PDF

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TW202231821A
TW202231821A TW110145039A TW110145039A TW202231821A TW 202231821 A TW202231821 A TW 202231821A TW 110145039 A TW110145039 A TW 110145039A TW 110145039 A TW110145039 A TW 110145039A TW 202231821 A TW202231821 A TW 202231821A
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adhesive sheet
adhesive layer
electronic parts
electronic component
adhesive
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上野周作
加藤和通
平山高正
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日商日東電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025Crosslinking or vulcanising agents; including accelerators
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/12Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
    • C09J2301/124Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Die Bonding (AREA)

Abstract

Provided is an electronic component transferring adhesive sheet that is excellent in both fixing performance and releasing performance with respect to an electronic component, and that enables reception and delivery of the electronic component while preventing problems such as breakage, even if the electronic component is small and/or thin. The electronic component transferring adhesive sheet according to the present invention comprises a substrate and an adhesive layer disposed on at least one side of the substrate, wherein the adhesive layer, after irradiated with ultraviolet rays of 460 mJ/cm2, exhibits a nano indenter elastic modulus of 500 MPa or less at 25 degrees Celsius.

Description

電子零件轉印用黏著片材及使用電子零件轉印用黏著片材之電子零件之加工方法Adhesive sheet for transfer of electronic parts and processing method of electronic parts using the adhesive sheet for transfer of electronic parts

本發明係關於一種電子零件轉印用黏著片材及使用電子零件轉印用黏著片材之電子零件之加工方法。The present invention relates to an adhesive sheet for transferring electronic parts and a method for processing electronic parts using the adhesive sheet for transferring electronic parts.

先前,於將配置於特定構件上之電子零件移置於其他構件時,藉由黏著片材接收該電子零件,其後,將該電子零件交接至其他構件。例如,於將LED(light-emitting diode,發光二極體)晶片組裝於裝置時,暫時先將形成於構件上之LED晶片轉印至黏著片材上而由其接收,其後,將LED晶片自黏著片材交接至特定之裝置或構件,進行LED晶片之轉移。Previously, when an electronic component arranged on a specific component was transferred to another component, the electronic component was received by an adhesive sheet, and thereafter, the electronic component was handed over to other components. For example, when assembling an LED (light-emitting diode) chip into a device, temporarily transfer the LED chip formed on the component to an adhesive sheet and receive it, and then transfer the LED chip The self-adhesive sheet is transferred to a specific device or component for the transfer of LED chips.

如上所述,作為將電子零件暫時固定(即,接收電子零件,其後進行交接)之黏著片材,可使用具備活性能量線硬化型黏著劑層之黏著片材。此種黏著片材於活性能量線(例如紫外線)照射前,可表現出特定之黏著力而較佳地固定電子零件,照射活性能量線之後,黏著劑層硬化而黏著力降低,容易進行電子零件之拾取。As described above, as an adhesive sheet for temporarily fixing electronic components (ie, receiving electronic components and then transferring them), an adhesive sheet having an active energy ray-curable adhesive layer can be used. This kind of adhesive sheet can exhibit a specific adhesive force before irradiation with active energy rays (such as ultraviolet rays) to better fix electronic parts. After the active energy rays are irradiated, the adhesive layer is hardened and the adhesive force is reduced, making it easier to process electronic parts. Pickup.

近年來,有大量使用小型化、薄型化之電子零件之傾向。小型、薄型之電子零件由於無法充分確保與黏著片材之接觸面積,又,剝離時易破損,因此較佳為使用如上所述兼具固定性及剝離性之具備活性能量線硬化型黏著劑層之黏著片材。然而,尤其是於小型化、薄型化之電子零件(例如100 μm以下,厚度30 μm以下)中,接收並固定電子零件時,該電子零件以高比率嵌入黏著劑層,如此一來,即便於黏著劑層硬化後,亦會產生不易剝離,容易破損之問題。 [先前技術文獻] [專利文獻] In recent years, there has been a tendency to use a large number of miniaturized and thinned electronic components. Since small and thin electronic parts cannot sufficiently secure the contact area with the adhesive sheet, and are easily damaged when peeled off, it is preferable to use an active energy ray-curable adhesive layer having both fixability and peelability as described above. The adhesive sheet. However, especially in miniaturized and thinned electronic parts (for example, 100 μm or less, thickness 30 μm or less), when receiving and fixing electronic parts, the electronic parts are embedded in the adhesive layer at a high rate. After the adhesive layer is hardened, it will also be difficult to peel off and easily damaged. [Prior Art Literature] [Patent Literature]

專利文獻1:日本專利特開2020-53558號公報Patent Document 1: Japanese Patent Laid-Open No. 2020-53558

[發明所欲解決之問題][Problems to be Solved by Invention]

本發明係為了解決上述先前問題而完成者,其目的在於提供一種電子零件之固定性及剝離性兩者優異,即使該電子零件為小型、薄型,亦防止破損等缺陷,可進行該電子零件之接收及交接的電子零件轉印用黏著片材。 [解決問題之技術手段] The present invention has been accomplished in order to solve the above-mentioned problems, and an object of the present invention is to provide an electronic component which is excellent in both fixability and peelability, prevents defects such as breakage even if the electronic component is small and thin, and enables the electronic component to be Adhesive sheet for transfer of electronic parts received and handed over. [Technical means to solve problems]

本發明之電子零件轉印用黏著片材具備基材、及配置於該基材之至少單側之黏著劑層,該黏著劑層於照射460 mJ/cm 2之紫外線後之25℃下之奈米壓痕儀彈性模數為500 MPa以下。 於一個實施方式中,上述黏著片材之使用TMA(thermomechanical analysis,熱機械分析機)獲得之40℃環境下之下沉量為3 μm~27 μm。 於一個實施方式中,上述黏著劑層之厚度為2.1 μm~35 μm。 於一個實施方式中,上述黏著劑層之25℃下之常態奈米壓痕儀彈性模數為0.4 MPa以上。 於一個實施方式中,上述黏著劑層之常態探針黏性值為8 N/cm 2以上。 於一個實施方式中,上述基材包含聚酯系樹脂。 於一個實施方式中,上述基材之厚度為30 μm~200 μm。 於一個實施方式中,上述電子零件為迷你LED或微型LED。 於一個實施方式中,上述電子零件轉印用黏著片材依序具備上述黏著劑層、上述基材及另一黏著劑層。 根據本發明之另一態樣,提供一種電子零件之加工方法。該加工方法係使用上述電子零件轉印用黏著片材之電子零件之加工方法,且包括:步驟a,其將配置於第1構件之電子零件轉印至上述黏著片材之上述黏著劑層上;及步驟b,其藉由第2構件拾取該電子零件,將該電子零件自該黏著片材剝離。 於一個實施方式中,上述電子零件為迷你LED或微型LED。 於一個實施方式中,上述步驟b包括:步驟b-1,其使上述第2構件接觸上述黏著劑層上之上述電子零件;步驟b-2,其對上述黏著片材照射活性能量線;及步驟b-3,其藉由該第2構件拾取該電子零件,將該電子零件自該黏著片材剝離。 於一個實施方式中,上述第1構件為藍寶石基板。 於一個實施方式中,上述電子零件為微型LED,於上述步驟a中,包括對配置有複數個微型LED之上述藍寶石基板照射UV(ultraviolet,紫外線)雷射光,將該微型LED轉印至上述黏著片材。 於一個實施方式中,將配置於上述藍寶石基板之上述微型LED之一部分選擇性地轉印至上述黏著片材。 [發明之效果] The adhesive sheet for transferring electronic parts of the present invention includes a base material and an adhesive layer disposed on at least one side of the base material, and the adhesive layer is irradiated with 460 mJ/cm 2 of ultraviolet rays at a temperature of 25°C. The elastic modulus of the meter indenter is below 500 MPa. In one embodiment, the sinking amount of the above-mentioned adhesive sheet obtained by using TMA (thermomechanical analysis, thermomechanical analysis machine) at 40° C. is 3 μm˜27 μm. In one embodiment, the thickness of the above-mentioned adhesive layer is 2.1 μm˜35 μm. In one embodiment, the elastic modulus of the above-mentioned adhesive layer at 25° C. under the normal state of the nano-indenter is 0.4 MPa or more. In one embodiment, the normal probe viscosity value of the adhesive layer is above 8 N/cm 2 . In one embodiment, the above-mentioned base material contains a polyester-based resin. In one embodiment, the thickness of the above-mentioned substrate is 30 μm˜200 μm. In one embodiment, the above-mentioned electronic components are mini-LEDs or micro-LEDs. In one Embodiment, the said adhesive sheet for electronic component transcription|transfer is equipped with the said adhesive bond layer, the said base material, and another adhesive bond layer in this order. According to another aspect of the present invention, a processing method of an electronic part is provided. The processing method is a processing method of electronic parts using the above-mentioned adhesive sheet for transferring electronic parts, and includes: a step a of transferring the electronic parts arranged on the first member to the above-mentioned adhesive layer of the above-mentioned adhesive sheet. ; and step b, which picks up the electronic component by the second member, and peels the electronic component from the adhesive sheet. In one embodiment, the above-mentioned electronic components are mini-LEDs or micro-LEDs. In one embodiment, the step b includes: step b-1, which makes the second member contact the electronic component on the adhesive layer; step b-2, which irradiates the adhesive sheet with active energy rays; and In step b-3, the electronic component is picked up by the second member, and the electronic component is peeled off from the adhesive sheet. In one embodiment, the first member is a sapphire substrate. In one embodiment, the electronic component is a micro LED, and the step a includes irradiating UV (ultraviolet, ultraviolet) laser light to the sapphire substrate configured with a plurality of micro LEDs, and transferring the micro LEDs to the adhesive Sheet. In one embodiment, a portion of the micro LEDs disposed on the sapphire substrate is selectively transferred to the adhesive sheet. [Effect of invention]

根據本發明,可提供一種電子零件之固定性及剝離性兩者優異,即使該電子零件為小型、薄型,亦防止缺陷,可進行該電子零件之接收及交接的電子零件轉印用黏著片材。According to the present invention, it is possible to provide an electronic component transfer adhesive sheet which is excellent in both the fixability and peelability of the electronic component, prevents defects even if the electronic component is small and thin, and can receive and transfer the electronic component .

A. 電子零件轉印用黏著片材之概要圖1係本發明之一個實施方式之電子零件轉印用黏著片材之概略剖視圖。該實施方式之電子零件轉印用黏著片材100具備基材10、及配置於基材10之至少單側之黏著劑層20。圖2係本發明之另一實施方式之黏著片材之概略剖視圖。該實施方式之黏著片材200具備黏著劑層20、基材10及另一黏著劑層30。 A. Outline of the adhesive sheet for electronic component transfer FIG. 1 is a schematic cross-sectional view of the adhesive sheet for electronic component transfer according to one embodiment of the present invention. The adhesive sheet 100 for electronic component transfer of this embodiment includes a base material 10 and an adhesive layer 20 arranged on at least one side of the base material 10 . 2 is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention. The adhesive sheet 200 of this embodiment includes an adhesive layer 20 , a base material 10 and another adhesive layer 30 .

黏著劑層20包含活性能量線硬化型黏著劑。包含活性能量線硬化型黏著劑之黏著劑層藉由照射活性能量線而硬化,黏著力降低。本發明之電子零件轉印用黏著片材(以下亦簡稱為黏著片材)於照射活性能量線照射之前,具有特定之黏著力,可較佳地固定電子零件,另一方面,於照射活性能量線之後,如上所述,黏著力降低,可將電子零件容易地剝離(交接)。The adhesive layer 20 contains an active energy ray hardening adhesive. The adhesive layer containing the active energy ray hardening type adhesive is hardened by irradiating the active energy ray, and the adhesive force is lowered. The adhesive sheet for transfer of electronic parts of the present invention (hereinafter also simply referred to as the adhesive sheet) has a specific adhesive force before irradiation with active energy rays, so that the electronic parts can be preferably fixed. After the wire, as described above, the adhesive force is lowered, and the electronic components can be easily peeled off (transferred).

黏著劑層20照射460 mJ/cm 2之紫外線後之25℃下之奈米壓痕儀彈性模數為500 MPa以下。再者,所謂奈米壓痕儀彈性模數,指橫跨負載時、卸載時連續測定將壓頭壓入試樣(例如黏著面)時對壓頭之負載荷重及壓入深度,根據所獲得之負載荷重-壓入深度曲線所求出的彈性模數。奈米壓痕儀彈性模數之測定方法之詳細內容將於下文進行敍述。上述紫外線照射例如係使用紫外線照射裝置(日東精機公司製造,商品名「UM-810」),對黏著劑層照射高壓水銀燈之紫外線(特性波長:365 nm,累計光量:460 mJ/cm 2,照射能:70 W/cm 2,照射時間:6.6秒)而進行。 The elastic modulus of the nano-indenter at 25° C. after the adhesive layer 20 is irradiated with ultraviolet rays of 460 mJ/cm 2 is below 500 MPa. Furthermore, the so-called elastic modulus of the nano-indenter refers to the continuous measurement of the load load and the indentation depth of the indenter when the indenter is pressed into the sample (such as the adhesive surface) under load and unloading. The modulus of elasticity obtained from the load load-indentation depth curve. The details of the measuring method of the elastic modulus of the nanoindenter will be described below. The above-mentioned ultraviolet irradiation is, for example, using an ultraviolet irradiation apparatus (manufactured by Nitto Seiki Co., Ltd., trade name "UM-810") to irradiate the adhesive layer with ultraviolet rays of a high-pressure mercury lamp (characteristic wavelength: 365 nm, cumulative light intensity: 460 mJ/cm 2 , irradiation energy: 70 W/cm 2 , irradiation time: 6.6 seconds).

一般而言,於在黏著劑層上固定電子零件時,該電子零件之一部分(或者全部)可為嵌入黏著劑層之狀態,藉此表現出特定之固定力。另一方面,於將電子零件剝離之情形時,電子零件之嵌入成為妨礙剝離性之因素。於本發明中,可提供一種黏著片材,其藉由硬化後之黏著劑層之奈米壓痕儀彈性模數為上述範圍,黏著劑層上之電子零件於面方向之活動自由度較高,即使電子零件之一部分嵌入,亦可容易地將該電子零件剝離。若使用此種本發明之黏著片材,則即使於貼附小型、薄型之電子零件(例如迷你LED、微型LED)時,亦可進行再次剝離而不損壞該電子零件。又,如上所述,由於表現較佳之剝離性,因此容許電子零件之充分嵌入,其結果為本發明之黏著片材之電子零件之固定性亦優異。Generally speaking, when fixing an electronic component on the adhesive layer, a part (or all) of the electronic component can be in a state of being embedded in the adhesive layer, thereby exhibiting a specific fixing force. On the other hand, when an electronic component is peeled off, the insertion of the electronic component becomes a factor which hinders the peelability. In the present invention, an adhesive sheet can be provided, wherein the elastic modulus of the nano-indenter of the hardened adhesive layer is in the above range, and the degree of freedom of movement of the electronic parts on the adhesive layer in the surface direction is high. , even if a part of an electronic component is embedded, the electronic component can be easily peeled off. If the adhesive sheet of the present invention is used, even when attaching small and thin electronic components (eg, mini-LED, micro-LED), it can be peeled off again without damaging the electronic components. In addition, as described above, since the better peelability is exhibited, the electronic components can be fully embedded, and as a result, the adhesive sheet of the present invention is also excellent in the fixability of the electronic components.

將上述黏著片材之黏著劑層貼附於不鏽鋼板(SUS304)時之23℃下之初始黏著力較佳為0.1 N/20 mm~30 N/20 mm,更佳為0.1 N/20 mm~15 N/20 mm。若為此種範圍,則可獲得可良好地保持電子零件之黏著片材。黏著力係依據JIS Z 0237:2000而測定。具體而言,藉由2 kg之輥往復1次而將黏著片材貼附於不鏽鋼板(算術平均表面粗糙度Ra:50±25 nm),於23℃下放置30分鐘後,於剝離角度180°、300 mm/min之拉伸速度之條件下,將黏著片材剝下而測定。黏著劑層之黏著力藉由活性能量線照射而發生變化,於本說明書中,「初始黏著力」意指照射活性能量線之前之黏著力。When the adhesive layer of the above-mentioned adhesive sheet is attached to the stainless steel plate (SUS304), the initial adhesive force at 23°C is preferably 0.1 N/20 mm~30 N/20 mm, more preferably 0.1 N/20 mm~ 15N/20mm. Within such a range, an adhesive sheet that can hold electronic components well can be obtained. The adhesive force was measured according to JIS Z 0237:2000. Specifically, the adhesive sheet was attached to a stainless steel plate (arithmetic average surface roughness Ra: 50±25 nm) by reciprocating once with a 2 kg roller, and after standing at 23°C for 30 minutes, the peeling angle was 180°C. ° Under the conditions of a tensile speed of 300 mm/min, the adhesive sheet was peeled off and measured. The adhesive force of the adhesive layer is changed by active energy ray irradiation, and in this specification, "initial adhesive force" means the adhesive force before active energy ray irradiation.

於一個實施方式中,將黏著片材之黏著劑層貼附於不鏽鋼板(SUS304),照射460 mJ/cm 2之紫外線後之23℃下之黏著力較佳為0.01 N/20 mm~0.3 N/20 mm,更佳為0.02 N/20 mm以上且未達0.2 N/20 mm。若為此種範圍,則可獲得剝離性優異之黏著片材。再者,紫外線照射後之黏著力可於將黏著劑層貼附於被黏著體,接著對黏著面照射紫外線後而測定。 In one embodiment, the adhesive layer of the adhesive sheet is attached to a stainless steel plate (SUS304), and the adhesive force at 23°C after irradiating ultraviolet rays of 460 mJ/cm 2 is preferably 0.01 N/20 mm~0.3 N /20 mm, more preferably 0.02 N/20 mm or more and less than 0.2 N/20 mm. Within such a range, an adhesive sheet excellent in releasability can be obtained. Furthermore, the adhesive force after ultraviolet irradiation can be measured by attaching the adhesive layer to the adherend and then irradiating the adhesive surface with ultraviolet rays.

黏著片材之厚度較佳為1 μm~300 μm,更佳為3 μm~200 μm。The thickness of the adhesive sheet is preferably 1 μm to 300 μm, more preferably 3 μm to 200 μm.

上述黏著片材使用TMA獲得之40℃環境下之下沉量較佳為2 μm~35 μm,更佳為3 μm~27 μm,進而較佳為4 μm~25 μm,尤佳為5 μm~20 μm。若為此種範圍,則可獲得作為被黏著體之電子零件適度嵌入黏著劑層中,固定性(即接收性)及剝離性(即交接性)優異之黏著片材。「使用TMA獲得之40℃環境下之下沉量」意指使用熱機械分析機(TMA),使探針接觸黏著劑層並經過20分鐘後之下沉量。測定條件設為探針直徑:1.0 mm、模式:針入模式、氮氣流量:50.0 ml/min、壓入荷重:0.5 N、測定氛圍溫度:40℃。The amount of sinking of the above-mentioned adhesive sheet at 40°C obtained by using TMA is preferably 2 μm~35 μm, more preferably 3 μm~27 μm, further preferably 4 μm~25 μm, particularly preferably 5 μm~ 20 μm. Within such a range, an electronic component as an adherend is appropriately embedded in the adhesive layer, and an adhesive sheet excellent in fixability (ie, receptivity) and peelability (ie, transferability) can be obtained. "Sinking amount in 40°C environment obtained using TMA" means the amount of sinking after 20 minutes have elapsed after the probe was brought into contact with the adhesive layer using a thermomechanical analyzer (TMA). The measurement conditions were set to probe diameter: 1.0 mm, mode: needle penetration mode, nitrogen flow rate: 50.0 ml/min, pressing load: 0.5 N, and measurement atmosphere temperature: 40°C.

B. 黏著劑層如上所述,黏著劑層於紫外線照射後之25℃下之奈米壓痕儀彈性模數為500 MPa以下。上述黏著劑層於照射460 mJ/cm 2之紫外線後之25℃下之奈米壓痕儀彈性模數更佳為450 MPa以下,進而較佳為400 MPa以下,尤佳為350 MPa以下,最佳為300 MPa以下。若為此種範圍,則上述效果變得顯著。又,上述黏著劑層於照射460 mJ/cm 2之紫外線後之25℃下之奈米壓痕儀彈性模數較佳為1 MPa以上,更佳為5 MPa以上,進而較佳為10 MPa以上,尤佳為50 MPa以上,最佳為100 MPa以上。若為此種範圍,則可獲得固定性優異,又,位置精度良好且可進行電子零件之交接之黏著片材。再者,黏著劑層之彈性模數可藉由構成黏著劑層之黏著劑之組成、例如黏著劑中所包含之聚合物之結構、黏著劑中所包含之交聯劑之種類及量等任意適當之方法進行調整。 B. Adhesive layer As mentioned above, the nanoindenter elastic modulus of the adhesive layer at 25° C. after ultraviolet irradiation is below 500 MPa. The elastic modulus of the nano-indenter at 25°C after the above-mentioned adhesive layer is irradiated with ultraviolet rays of 460 mJ/cm 2 is more preferably 450 MPa or less, more preferably 400 MPa or less, particularly preferably 350 MPa or less, most preferably Preferably, it is 300 MPa or less. Within such a range, the above-mentioned effects become remarkable. In addition, the elastic modulus of the nano-indenter at 25°C after the above-mentioned adhesive layer is irradiated with ultraviolet rays of 460 mJ/cm 2 is preferably 1 MPa or more, more preferably 5 MPa or more, and more preferably 10 MPa or more. , more preferably 50 MPa or more, and most preferably 100 MPa or more. Within such a range, an adhesive sheet that is excellent in fixability and has good positional accuracy and can be used for delivery of electronic components can be obtained. Furthermore, the elastic modulus of the adhesive layer can be determined arbitrarily by the composition of the adhesive constituting the adhesive layer, such as the structure of the polymer contained in the adhesive, and the type and amount of the cross-linking agent contained in the adhesive. Adjust in an appropriate way.

上述黏著劑層之25℃下之常態奈米壓痕儀彈性模數較佳為0.1 MPa~55 MPa,更佳為0.2 MPa~40 MPa,進而較佳為0.3 MPa~30 MPa,尤佳為0.3 MPa~20 MPa。若為此種範圍,則可獲得電子零件之固定性優異之黏著片材。「常態奈米壓痕儀彈性模數」意指照射活性能量線之前之彈性模數。The elastic modulus of the above-mentioned adhesive layer at 25°C is preferably 0.1 MPa to 55 MPa, more preferably 0.2 MPa to 40 MPa, further preferably 0.3 MPa to 30 MPa, and particularly preferably 0.3 MPa. MPa~20MPa. Within such a range, an adhesive sheet excellent in fixability of electronic components can be obtained. "Nanoindenter elastic modulus in normal state" means the elastic modulus before irradiation with active energy rays.

於一個實施方式中,上述黏著劑層之25℃下之常態奈米壓痕儀彈性模數較佳為10 MPa以下,更佳為8 MPa以下,進而較佳為3 MPa以下。若為此種範圍,則可獲得電子零件之固定性尤其優異之黏著片材。In one embodiment, the normal-state nanoindenter elastic modulus of the adhesive layer at 25° C. is preferably 10 MPa or less, more preferably 8 MPa or less, and still more preferably 3 MPa or less. If it is such a range, the adhesive sheet excellent in the fixability of an electronic component especially can be obtained.

於另一實施方式中,上述黏著劑層之25℃下之常態奈米壓痕儀彈性模數較佳為0.4 MPa以上,更佳為0.5 MPa以上,進而較佳為0.8 MPa以上。若為此種範圍,則提高將電子零件自特定之構件(例如藍寶石基板)轉印至黏著片材,使該黏著片材接收電子零件時之轉印性。如此,電子零件之接收時之轉印性優異之黏著片材於例如藉由黏著片材僅選擇性地接收在特定之構件上配置有複數個之電子零件之一部分之步驟(例如PSLLO步驟)中,尤其有用。In another embodiment, the normal nanoindenter elastic modulus of the adhesive layer at 25°C is preferably 0.4 MPa or more, more preferably 0.5 MPa or more, and more preferably 0.8 MPa or more. Within such a range, the transferability when electronic parts are transferred from a specific member (for example, a sapphire substrate) to an adhesive sheet and the electronic parts are received by the adhesive sheet is improved. In this way, the adhesive sheet excellent in transferability at the time of receiving electronic parts is used, for example, in a step of selectively receiving only a part of electronic parts in which a plurality of electronic parts are arranged on a specific member by the adhesive sheet (for example, the PSLLO step). , especially useful.

上述黏著劑層之25℃下之常態儲存模數較佳為10 MPa以下,更佳為5 MPa以下,進而較佳為0.01 MPa~3 MPa。「常態儲存模數」意指照射活性能量線之前之彈性模數。儲存模數之測定方法將於下文進行敍述。The normal storage modulus of the adhesive layer at 25° C. is preferably 10 MPa or less, more preferably 5 MPa or less, and still more preferably 0.01 MPa to 3 MPa. "Normal storage modulus" means the elastic modulus before irradiation of active energy rays. The measurement method of the storage modulus will be described below.

上述黏著劑層於照射460 mJ/cm 2之紫外線後之25℃下之拉伸模數較佳為0.05 MPa~100 MPa,更佳為0.1 MPa~70 MPa。拉伸模數之測定方法將於下文進行敍述。 The tensile modulus of the adhesive layer at 25° C. after irradiating ultraviolet rays of 460 mJ/cm 2 is preferably 0.05 MPa to 100 MPa, more preferably 0.1 MPa to 70 MPa. The measurement method of the tensile modulus will be described below.

上述黏著劑層之厚度較佳為1.5 μm~50 μm,更佳為2.1 μm~35 μm,進而較佳為3 μm~30 μm。若為此種範圍,則可獲得作為被黏著體之電子零件適度嵌入黏著劑層中,固定性(即接收性)及剝離性(即交接性)優異之黏著片材。The thickness of the above-mentioned adhesive layer is preferably 1.5 μm to 50 μm, more preferably 2.1 μm to 35 μm, and still more preferably 3 μm to 30 μm. Within such a range, an electronic component as an adherend is appropriately embedded in the adhesive layer, and an adhesive sheet excellent in fixability (ie, receptivity) and peelability (ie, transferability) can be obtained.

於一個實施方式中,黏著劑層之厚度較佳為40 μm以下,更佳為30 μm以下,進而較佳為20 μm以下。藉由使黏著劑層之厚度變薄,提高將電子零件自特定之構件(例如藍寶石基板)轉印至黏著片材,使該黏著片材接收電子零件時之轉印性。如此,電子零件之接收時之轉印性優異之黏著片材於例如藉由黏著片材僅選擇性地接收在特定之構件上配置有複數個之電子零件之一部分之步驟(例如PSLLO步驟)中,尤其有用。In one embodiment, the thickness of the adhesive layer is preferably 40 μm or less, more preferably 30 μm or less, and still more preferably 20 μm or less. By reducing the thickness of the adhesive layer, the transferability of electronic parts from a specific member (such as a sapphire substrate) to an adhesive sheet is improved, so that the adhesive sheet can receive electronic parts. In this way, the adhesive sheet excellent in transferability at the time of receiving electronic parts is used, for example, in a step of selectively receiving only a part of electronic parts in which a plurality of electronic parts are arranged on a specific member by the adhesive sheet (for example, the PSLLO step). , especially useful.

上述黏著劑層之常態探針黏性值較佳為8 N/cm 2以上,更佳為12 N/cm 2以上,進而較佳為15 N/cm 2以上。若為此種範圍,則可獲得電子零件之固定性優異之黏著片材。上述黏著劑層之常態探針黏性值之上限例如為60 N/cm 2。探針黏性值之測定方法將於下文進行敍述。「常態探針黏性值」意指照射活性能量線之前之探針黏性值。 The normal probe viscosity value of the above-mentioned adhesive layer is preferably 8 N/cm 2 or more, more preferably 12 N/cm 2 or more, and still more preferably 15 N/cm 2 or more. Within such a range, an adhesive sheet excellent in fixability of electronic components can be obtained. The upper limit of the normal probe viscosity value of the adhesive layer is, for example, 60 N/cm 2 . The measurement method of the probe viscosity value will be described below. "Normal probe viscosity value" means the probe viscosity value before irradiation with active energy rays.

上述黏著劑層於照射460 mJ/cm 2之紫外線後之探針黏性值較佳為15 N/cm 2以下,進而較佳為12 N/cm 2以下。若為此種範圍,則可獲得剝離性優異之黏著片材。 The probe viscosity value of the above-mentioned adhesive layer after being irradiated with ultraviolet rays of 460 mJ/cm 2 is preferably 15 N/cm 2 or less, and more preferably 12 N/cm 2 or less. Within such a range, an adhesive sheet excellent in releasability can be obtained.

(活性能量線硬化型黏著劑) 如上所述,黏著劑層包含活性能量線硬化型黏著劑。 (active energy ray hardening adhesive) As described above, the adhesive layer contains an active energy ray-curable adhesive.

作為構成上述黏著劑之基礎聚合物,例如可例舉:丙烯酸系聚合物、橡膠系聚合物(例如天然橡膠、氯丁二烯橡膠、苯乙烯-丁二烯橡膠、腈橡膠等)、聚酯、胺基甲酸酯系聚合物、聚醚、矽酮系聚合物、聚醯胺、氟系聚合物、乙烯-乙酸乙烯酯系聚合物、環氧系樹脂、氯乙烯系聚合物、氰基丙烯酸酯系聚合物、纖維素系聚合物(硝化纖維素系聚合物等)、酚樹脂、聚醯亞胺、聚烯烴、苯乙烯系聚合物、聚乙酸乙烯酯、聚乙烯醇、聚乙烯醇縮醛、聚乙烯吡咯啶酮、聚乙烯醇縮丁醛、聚苯并咪唑、三聚氰胺樹脂、尿素樹脂、間苯二酚系聚合物等。該等聚合物可單獨使用1種,亦可組合2種以上使用。就密接性或成本等觀點而言,較佳為丙烯酸系聚合物、橡膠系聚合物,更佳為丙烯酸系聚合物。再者,「基礎聚合物」指黏著劑中所包含之聚合物之主成分。上述聚合物較佳為在室溫附近之溫度區域表現出橡膠彈性之橡膠狀聚合物。又,於該說明書中,所謂「主成分」,只要無特別說明,則指包含超過50重量%之成分。Examples of the base polymer constituting the above-mentioned adhesive include acrylic polymers, rubber-based polymers (for example, natural rubber, chloroprene rubber, styrene-butadiene rubber, nitrile rubber, etc.), polyester , urethane polymer, polyether, silicone polymer, polyamide, fluorine polymer, ethylene-vinyl acetate polymer, epoxy resin, vinyl chloride polymer, cyano Acrylate-based polymer, cellulose-based polymer (nitrocellulose-based polymer, etc.), phenol resin, polyimide, polyolefin, styrene-based polymer, polyvinyl acetate, polyvinyl alcohol, polyvinyl alcohol Acetal, polyvinylpyrrolidone, polyvinyl butyral, polybenzimidazole, melamine resin, urea resin, resorcinol-based polymer, and the like. These polymers may be used alone or in combination of two or more. From the viewpoints of adhesiveness, cost, and the like, an acrylic polymer and a rubber-based polymer are preferred, and an acrylic polymer is more preferred. Furthermore, the "base polymer" refers to the main component of the polymer contained in the adhesive. The above-mentioned polymer is preferably a rubber-like polymer that exhibits rubber elasticity in a temperature region around room temperature. In addition, in this specification, unless otherwise specified, the "main component" means a component containing more than 50% by weight.

作為上述丙烯酸系聚合物,例如較佳為包含(甲基)丙烯酸烷基酯作為主單體,包含該主單體及具有共聚性之副單體之單體原料之聚合物。此處,主單體指上述單體原料中占單體組成超過50重量%之成分。主單體之含有比率相對於單體原料中之單體總量100重量份,較佳為60重量份~100重量份,更佳為70重量份~99.5重量份。As said acrylic polymer, for example, a polymer containing an alkyl (meth)acrylate as a main monomer and a monomer raw material containing the main monomer and a copolymerizable sub-monomer is preferable. Here, the main monomer refers to a component that accounts for more than 50% by weight of the monomer composition in the above-mentioned monomer raw materials. The content ratio of the main monomer is preferably 60 parts by weight to 100 parts by weight, more preferably 70 parts by weight to 99.5 parts by weight, relative to 100 parts by weight of the total amount of monomers in the monomer raw material.

作為(甲基)丙烯酸烷基酯,例如適宜使用下述式(1)所表示之化合物。 CH 2=C(R 1)COOR 2(1) 此處,上述式(1)中之R 1為氫原子或甲基。又,R 2為碳原子數為1~20之支鏈狀或直鏈狀之烷基(以下,有時將此種碳原子數之範圍表示為「C1-20」)。R 2較佳為支鏈狀或直鏈狀之C1-14烷基,更佳為支鏈狀或直鏈狀之C6-14烷基,進而較佳為支鏈狀或直鏈狀之C8-12烷基。 As the alkyl (meth)acrylate, for example, a compound represented by the following formula (1) is suitably used. CH 2 =C(R 1 )COOR 2 (1) Here, R 1 in the above formula (1) is a hydrogen atom or a methyl group. In addition, R 2 is a branched or linear alkyl group having 1 to 20 carbon atoms (hereinafter, the range of such a carbon number may be expressed as "C1-20"). R 2 is preferably a branched or straight-chain C1-14 alkyl group, more preferably a branched or straight-chain C6-14 alkyl group, and further preferably a branched or straight-chain C8- 12 alkyl.

作為上述(甲基)丙烯酸烷基酯之具體例,可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等。該等(甲基)丙烯酸烷基酯可單獨使用1種,或可組合2種以上使用。其中,較佳為丙烯酸2-乙基己酯(2EHA)、(甲基)丙烯酸十二烷基酯(LA、LMA)。Specific examples of the above-mentioned alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and isopropyl (meth)acrylate. , n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, amyl (meth)acrylate, isoamyl (meth)acrylate, (meth)acrylate Hexyl acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, ( isononyl meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, (meth)acrylate ) Tridecyl acrylate, tetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, heptadecyl (meth)acrylate ester, octadecyl (meth)acrylate, nonadecyl (meth)acrylate, eicosyl (meth)acrylate, and the like. These alkyl (meth)acrylates may be used individually by 1 type, or may be used in combination of 2 or more types. Among them, 2-ethylhexyl acrylate (2EHA) and dodecyl (meth)acrylate (LA, LMA) are preferred.

於一個實施方式中,使用R 2為碳數8以上之支鏈狀或直鏈狀烷基之(甲基)丙烯酸烷基酯。若使用此種單體作為主單體,則可獲得於硬化前後具有較佳之彈性模數,電子零件之固定性及剝離性尤其優異之黏著片材。作為R 2為碳數8以上之支鏈狀或直鏈狀烷基之(甲基)丙烯酸烷基酯,例如可例舉:2EHA、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十二烷基酯等。源自R 2為碳數8以上之支鏈狀或直鏈狀烷基之(甲基)丙烯酸烷基酯之結構單元之含有比率相對於基礎聚合物100重量份,較佳為60重量份~100重量份,更佳為70重量份~95重量份。 In one embodiment, an alkyl (meth)acrylate in which R 2 is a branched or linear alkyl group having 8 or more carbon atoms is used. If such a monomer is used as the main monomer, an adhesive sheet having a better elastic modulus before and after curing, and particularly excellent in fixability and peelability of electronic parts can be obtained. Examples of alkyl (meth)acrylates in which R 2 is a branched or linear alkyl group having 8 or more carbon atoms include 2EHA, octyl (meth)acrylate, and isooctyl (meth)acrylate. ester, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, dodecyl (meth)acrylate, and the like. The content ratio of the structural unit derived from the (meth)acrylate alkyl ester in which R 2 is a branched or linear alkyl group having 8 or more carbon atoms is preferably 60 parts by weight to 100 parts by weight of the base polymer 100 parts by weight, more preferably 70 parts by weight to 95 parts by weight.

與作為主單體之(甲基)丙烯酸烷基酯具有共聚性之副單體可有助於對丙烯酸系聚合物導入交聯點,或提高丙烯酸系聚合物之凝聚力。又,較佳為採用具有可與下述含碳-碳雙鍵單體之官能基(官能基b)反應之官能基(官能基a)之單體作為副單體。作為副單體,例如可僅單獨使用1種以下所示之含官能基單體成分,或可組合2種以上使用。 含羧基單體:例如丙烯酸(AA)、甲基丙烯酸(MAA)、丁烯酸等乙烯性不飽和單羧酸;順丁烯二酸、伊康酸、檸康酸等乙烯性不飽和二羧酸及其酐(順丁烯二酸酐、伊康酸酐等); 含羥基單體:例如(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2-羥基丁酯等(甲基)丙烯酸羥烷基酯類;乙烯醇、烯丙醇等不飽和醇類;2-羥乙基乙烯基醚、4-羥丁基乙烯基醚、二乙二醇單乙烯基醚等醚系化合物; 含胺基單體:例如(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯; 含環氧基單體:例如(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯、烯丙基縮水甘油醚; 含氰基單體:例如丙烯腈、甲基丙烯腈; 含酮基單體:例如二丙酮(甲基)丙烯醯胺、二丙酮(甲基)丙烯酸酯、乙烯基甲基酮、乙烯基乙基酮、乙醯乙酸烯丙酯、乙醯乙酸乙烯酯; 具有含氮原子環之單體:例如N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、N-乙烯基吡啶、N-乙烯基哌啶酮、N-乙烯基嘧啶、N-乙烯基哌𠯤、N-乙烯基吡𠯤、N-乙烯基吡咯、N-乙烯基咪唑、N-乙烯基㗁唑、N-乙烯基𠰌啉、N-乙烯基己內醯胺、N-(甲基)丙烯醯𠰌啉; 含烷氧基矽烷基單體:例如3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二乙氧基矽烷; 含異氰酸基單體:(甲基)丙烯醯異氰酸酯、異氰酸2-(甲基)丙烯醯氧基乙酯、間異丙烯基-α,α-二甲基苄基異氰酸酯。 再者,就維持剝離性之觀點而言,較佳為不使用可生成與金屬之親和性高之聚合物之含醯胺基單體。 The sub-monomer which is copolymerizable with the alkyl (meth)acrylate as the main monomer can contribute to the introduction of a cross-linking point to the acrylic polymer or improve the cohesive force of the acrylic polymer. Moreover, it is preferable to use the monomer which has a functional group (functional group a) which can react with the functional group (functional group b) of the following carbon-carbon double bond-containing monomer as a sub-monomer. As the sub-monomer, for example, only one of the functional group-containing monomer components shown below may be used alone, or two or more of them may be used in combination. Carboxyl-containing monomers: for example, ethylenically unsaturated monocarboxylic acids such as acrylic acid (AA), methacrylic acid (MAA), and crotonic acid; ethylenically unsaturated dicarboxylic acids such as maleic acid, itaconic acid, and citraconic acid Acids and their anhydrides (maleic anhydride, itaconic anhydride, etc.); Hydroxyl-containing monomers: such as 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, etc. Hydroxyalkyl (meth)acrylates; unsaturated alcohols such as vinyl alcohol and allyl alcohol; 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol monovinyl ether, etc. ether compounds; Amine group-containing monomers: such as aminoethyl (meth)acrylate, N,N-dimethylaminoethyl (meth)acrylate, tert-butylaminoethyl (meth)acrylate; Epoxy group-containing monomers: such as glycidyl (meth)acrylate, methyl glycidyl (meth)acrylate, allyl glycidyl ether; Cyano-containing monomers: such as acrylonitrile, methacrylonitrile; Ketone group-containing monomers: such as diacetone (meth)acrylamide, diacetone (meth)acrylate, vinyl methyl ketone, vinyl ethyl ketone, allyl acetoacetate, vinyl acetoacetate ; Monomers with nitrogen-containing rings: such as N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpyridine, N-vinylpiperidone, N-vinylpyrimidine , N-vinylpiperidine, N-vinylpyridine, N-vinylpyrrole, N-vinylimidazole, N-vinyloxazole, N-vinylpyridine, N-vinylcaprolactam, N-(meth)acrylohydrin; Alkoxysilane-containing monomers: such as 3-(meth)acryloyloxypropyltrimethoxysilane, 3-(meth)acryloyloxypropyltriethoxysilane, 3-(methyl) ) Acrylooxypropylmethyldimethoxysilane, 3-(meth)acrylooxypropylmethyldiethoxysilane; Isocyanate group-containing monomers: (meth)acryloyl isocyanate, 2-(meth)acryloyloxyethyl isocyanate, m-isopropenyl-α,α-dimethylbenzyl isocyanate. Furthermore, it is preferable not to use the amide|amido group containing monomer which can generate|occur|produce a polymer with high affinity with a metal from a viewpoint of maintaining peelability.

於一個實施方式中,作為上述副單體,較佳地使用含羥基單體,更佳地可使用(甲基)丙烯酸2-羥基乙酯。若使用該單體,則可獲得於硬化前後具有較佳之彈性模數,電子零件之固定性及剝離性尤其優異之黏著片材。In one embodiment, as the above-mentioned secondary monomer, a hydroxyl group-containing monomer is preferably used, and 2-hydroxyethyl (meth)acrylate can be more preferably used. If this monomer is used, it is possible to obtain an adhesive sheet having a better elastic modulus before and after curing, and particularly excellent in fixability and releasability of electronic parts.

源自上述副單體之結構單元之含有比率相對於基礎聚合物100重量份,較佳為0.1重量份~40重量份,更佳為1重量份~30重量份。若為此種範圍,則可形成凝聚力高、且黏著性優異之黏著劑層。The content ratio of the structural unit derived from the above-mentioned sub-monomer is preferably 0.1 part by weight to 40 parts by weight, more preferably 1 part by weight to 30 parts by weight with respect to 100 parts by weight of the base polymer. Within such a range, an adhesive layer having high cohesive force and excellent adhesiveness can be formed.

又,作為基礎聚合物,於如下所述使用具有碳-碳雙鍵之基礎聚合物之情形時,作為副單體,較佳為使用具有可與下述具有碳-碳雙鍵之化合物B之官能基(官能基b)反應之官能基(官能基a)之副單體。於該情形時,副單體之種類由上述化合物B之種類決定。作為具有官能基a之副單體,例如較佳為含羧基單體、含環氧基單體、含羥基單體、含異氰酸基單體,尤佳為含羥基單體。藉由使用含羥基單體作為副單體,丙烯酸系聚合物具有羥基。與此相對,藉由使用含異氰酸基單體作為具有碳-碳雙鍵之化合物B,上述丙烯酸系聚合物之羥基與上述化合物之異氰酸基進行反應,源自上述化合物B之碳-碳雙鍵導入至丙烯酸系聚合物。In addition, when a base polymer having a carbon-carbon double bond is used as the base polymer as described below, as a sub-monomer, it is preferable to use a compound B having a carbon-carbon double bond which can be combined with the following. The sub-monomer of the functional group (functional group a) reacted with the functional group (functional group b). In this case, the kind of the sub-monomer is determined by the kind of the compound B described above. As the sub-monomer having the functional group a, for example, a carboxyl group-containing monomer, an epoxy group-containing monomer, a hydroxyl group-containing monomer, and an isocyanate group-containing monomer are preferable, and a hydroxyl group-containing monomer is particularly preferable. The acrylic polymer has a hydroxyl group by using a hydroxyl group-containing monomer as a sub-monomer. On the other hand, by using an isocyanate group-containing monomer as the compound B having a carbon-carbon double bond, the hydroxyl group of the above-mentioned acrylic polymer reacts with the isocyanate group of the above-mentioned compound, and the carbon derived from the above-mentioned compound B is reacted. - Carbon double bonds are introduced into the acrylic polymer.

又,以提高丙烯酸系聚合物之凝聚力等目的,可使用除上述副單體以外之其他共聚成分。作為該共聚成分,例如可例舉:乙酸乙烯酯、丙酸乙烯酯等乙烯酯系單體;苯乙烯、取代苯乙烯(α-甲基苯乙烯等)、乙烯基甲苯等芳香族乙烯系化合物;(甲基)丙烯酸環己酯、二(甲基)丙烯酸環戊酯等(甲基)丙烯酸異𦯉基酯等(甲基)丙烯酸環烷基酯;(甲基)丙烯酸芳基酯(例如(甲基)丙烯酸苯酯)、(甲基)丙烯酸芳氧基烷基酯(例如(甲基)丙烯酸苯氧基乙酯)、(甲基)丙烯酸芳烷基酯(例如(甲基)丙烯酸苄酯)等含有芳香族性環之(甲基)丙烯酸酯;乙烯、丙烯、異戊二烯、丁二烯、異丁烯等烯烴系單體;氯乙烯、偏二氯乙烯等含氯單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等含有烷氧基之單體;甲基乙烯基醚、乙基乙烯基醚等乙烯基醚系單體;等。該等除副單體以外之其他共聚成分可單獨使用1種,或可組合2種以上使用。該其他共聚成分之量相對於單體原料中之單體總量100重量份,例如為2重量份~20重量份。In addition, for the purpose of improving the cohesion of the acrylic polymer, etc., other copolymerization components other than the above-mentioned sub-monomers can be used. Examples of the copolymerization component include vinyl ester monomers such as vinyl acetate and vinyl propionate; aromatic vinyl compounds such as styrene, substituted styrene (α-methylstyrene, etc.), and vinyltoluene. ; Cycloalkyl (meth)acrylates such as (meth)acrylates such as cyclohexyl (meth)acrylate and cyclopentyl di(meth)acrylate; (meth)acrylates such as cycloalkyl (meth)acrylates; (Phenyl (meth)acrylate), aryloxyalkyl (meth)acrylate (eg phenoxyethyl (meth)acrylate), aralkyl (meth)acrylate (eg (meth)acrylic acid) (meth)acrylates containing aromatic rings such as benzyl ester); olefin monomers such as ethylene, propylene, isoprene, butadiene, isobutylene; chlorine-containing monomers such as vinyl chloride and vinylidene chloride; Alkoxy-containing monomers such as methoxyethyl (meth)acrylate and ethoxyethyl (meth)acrylate; vinyl ether-based monomers such as methyl vinyl ether and ethyl vinyl ether; etc. . These other copolymerization components other than a sub-monomer may be used individually by 1 type, or may be used in combination of 2 or more types. The amount of the other copolymerization components is, for example, 2 to 20 parts by weight relative to 100 parts by weight of the total amount of monomers in the monomer raw material.

進而,以丙烯酸系聚合物之交聯處理等為目的,可使用多官能性單體作為共聚性成分。作為上述多官能性單體,可使用己二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、環氧丙烯酸酯、聚酯丙烯酸酯、胺基甲酸酯丙烯酸酯等之1種或2種以上。上述多官能性單體之量相對於單體原料中之單體總量100重量份,例如為30重量份以下。Furthermore, a multifunctional monomer can be used as a copolymerizable component for the purpose of crosslinking treatment of an acrylic polymer or the like. As the above-mentioned polyfunctional monomer, hexanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate can be used base) acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, epoxy acrylate , polyester acrylate, urethane acrylate, etc. 1 or more. The quantity of the said polyfunctional monomer is 30 weight part or less with respect to 100 weight part of total monomers in a monomer raw material, for example.

上述丙烯酸系聚合物可藉由任意適當之聚合方法獲得。例如可例舉:溶液聚合法、乳化聚合法、塊狀聚合法、懸浮聚合法等。The above-mentioned acrylic polymer can be obtained by any appropriate polymerization method. For example, a solution polymerization method, an emulsion polymerization method, a block polymerization method, a suspension polymerization method, etc. are mentioned.

較佳為於上述基礎聚合物(較佳為丙烯酸系聚合物)導入有碳-碳雙鍵。藉由使用具有碳-碳雙鍵之基礎聚合物,可形成藉由活性能量線(具有代表性的是紫外線)硬化之黏著劑層。再者,於本發明中,除該方法以外,使用含有聚合性單體或低聚物及丙烯酸系聚合物之黏著劑,亦可形成硬化性黏著劑層,但就獲得剝離性優異之黏著片材之觀點而言,較佳為使用具有碳-碳雙鍵之基礎聚合物形成硬化性黏著劑層。Preferably, a carbon-carbon double bond is introduced into the above-mentioned base polymer (preferably an acrylic polymer). By using a base polymer having a carbon-carbon double bond, an adhesive layer hardened by active energy rays (representatively, ultraviolet rays) can be formed. Furthermore, in the present invention, in addition to this method, a curable adhesive layer can be formed using an adhesive containing a polymerizable monomer or oligomer and an acrylic polymer, but an adhesive sheet excellent in releasability can be obtained. From the viewpoint of the material, it is preferable to form the curable adhesive layer using a base polymer having a carbon-carbon double bond.

作為具有碳-碳雙鍵之基礎聚合物之生成方法,可採用任意適當之方法。例如,可例舉使具有可與該官能基a反應之官能基(官能基b)及碳-碳雙鍵之化合物B與具有官能基a之聚合物A進行反應的方法。此時,較佳為進行反應以使碳-碳雙鍵不消失,例如可採用縮合反應、加成反應等。作為聚合物A,例如如上述說明所示,可使用將作為主單體之(甲基)丙烯酸烷基酯、與具有官能基a之副單體共聚而獲得之聚合物。Any appropriate method can be adopted as a method for producing the base polymer having a carbon-carbon double bond. For example, the method of reacting the compound B which has a functional group (functional group b) and a carbon-carbon double bond which can react with this functional group a, and the polymer A which has a functional group a can be mentioned. At this time, it is preferable to carry out the reaction so that the carbon-carbon double bond does not disappear, and for example, a condensation reaction, an addition reaction, or the like can be used. As the polymer A, as described above, for example, a polymer obtained by copolymerizing an alkyl (meth)acrylate as a main monomer and a sub-monomer having a functional group a can be used.

作為上述官能基a及官能基b之組合,可例舉:羧基及環氧基之組合、羧基及氮丙啶基之組合、羥基及異氰酸基之組合等。其中,就追蹤反應性之觀點而言,較佳為羥基及異氰酸基之組合。就聚合物設計等觀點而言,尤佳為丙烯酸系聚合物具有羥基且上述化合物具有異氰酸基之組合。As a combination of the said functional group a and functional group b, the combination of a carboxyl group and an epoxy group, a combination of a carboxyl group and an aziridine group, a combination of a hydroxyl group and an isocyanate group, etc. are mentioned. Among them, from the viewpoint of tracking reactivity, a combination of a hydroxyl group and an isocyanate group is preferable. From the viewpoint of polymer design, etc., a combination in which the acrylic polymer has a hydroxyl group and the above-mentioned compound has an isocyanate group is particularly preferable.

作為上述具有碳-碳雙鍵及官能基b之化合物,例如可例舉含異氰酸基單體(含異氰酸基之化合物)。其中,更佳為異氰酸2-(甲基)丙烯醯氧基乙酯。As a compound which has the said carbon-carbon double bond and a functional group b, an isocyanate group-containing monomer (an isocyanate group-containing compound) is mentioned, for example. Among them, 2-(meth)acryloyloxyethyl isocyanate is more preferred.

相對於導入碳-碳雙鍵前之聚合物(即,聚合物A)100重量份,含異氰酸基單體之調配量較佳為1重量份~40重量份,更佳為5重量份~30重量份,進而較佳為8重量份~15重量份。The compounding amount of the isocyanate group-containing monomer is preferably 1 to 40 parts by weight, more preferably 5 parts by weight, relative to 100 parts by weight of the polymer (ie, polymer A) before the introduction of carbon-carbon double bonds ~ 30 parts by weight, more preferably 8 parts by weight to 15 parts by weight.

又,可以使聚合物A所具有之羥基殘存之方式導入碳-碳雙鍵。如此一來,對黏著劑層進行加熱時,可提高交聯度。於該情形時,作為官能基a之羥基與作為官能基b之異氰酸基之莫耳比(a/b)超過1較為適宜,較佳為設為1.1以上。In addition, a carbon-carbon double bond can be introduced so that the hydroxyl group contained in the polymer A remains. In this way, when the adhesive layer is heated, the degree of crosslinking can be increased. In this case, it is preferable that the molar ratio (a/b) of the hydroxyl group which is the functional group a and the isocyanate group which is the functional group b exceeds 1, and is preferably 1.1 or more.

上述基礎聚合物(較佳為丙烯酸系聚合物)之重量平均分子量Mw較佳為10×10 4~500×10 4,更佳為20×10 4~200×10 4,進而較佳為30×10 4~100×10 4。若為此種範圍,則可形成糊劑殘留較少,且密接性優異之黏著劑層。再者,於本說明書中,Mw指利用GPC(gel permeation chromatography,凝膠滲透層析法)所獲得之標準聚苯乙烯換算之值。 The weight average molecular weight Mw of the above-mentioned base polymer (preferably an acrylic polymer) is preferably 10×10 4 to 500×10 4 , more preferably 20×10 4 to 200×10 4 , and more preferably 30× 10 4 to 100×10 4 . If it is such a range, the adhesive bond layer which is excellent in adhesiveness with few paste residues can be formed. Furthermore, in this specification, Mw refers to a value in terms of standard polystyrene obtained by GPC (gel permeation chromatography, gel permeation chromatography).

較佳為上述黏著劑包含交聯劑。作為交聯劑,例如可例舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、三聚氰胺系交聯劑、過氧化物系交聯劑、尿素系交聯劑、金屬烷氧化物系交聯劑、金屬螯合物系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、胺系交聯劑等。該等交聯劑可單獨使用1種,或可組合2種以上使用。Preferably, the above-mentioned adhesive contains a crosslinking agent. As a cross-linking agent, for example, an isocyanate-based cross-linking agent, an epoxy-based cross-linking agent, an oxazoline-based cross-linking agent, an aziridine-based cross-linking agent, a melamine-based cross-linking agent, and a peroxide-based cross-linking agent may, for example, be mentioned. Linking agent, urea-based cross-linking agent, metal alkoxide-based cross-linking agent, metal chelate-based cross-linking agent, metal salt-based cross-linking agent, carbodiimide-based cross-linking agent, amine-based cross-linking agent, etc. . These crosslinking agents may be used alone or in combination of two or more.

相對於黏著劑之基礎聚合物100重量份,上述交聯劑之含有比率較佳為0.1重量份~10重量份,更佳為0.2重量份~8重量份。若為此種範圍,則可形成奈米壓痕儀彈性模數經適當調整之黏著劑層。The content ratio of the crosslinking agent is preferably 0.1 to 10 parts by weight, more preferably 0.2 to 8 parts by weight, relative to 100 parts by weight of the base polymer of the adhesive. Within such a range, an adhesive layer with an appropriately adjusted elastic modulus of the nanoindenter can be formed.

於一個實施方式中,較佳地使用異氰酸酯系交聯劑。異氰酸酯系交聯劑就可與多種官能基反應之方面而言較佳。作為上述異氰酸酯系交聯劑之具體例,可例舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(日本聚胺酯工業公司製造,商品名「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(日本聚胺酯工業公司製造,商品名「Coronate HL」)、六亞甲基二異氰酸酯之異氰尿酸酯體(日本聚胺酯工業公司製造,商品名「Coronate HX」)等異氰酸酯加成物;等。較佳為使用具有3個以上之異氰酸基之交聯劑。In one embodiment, an isocyanate-based crosslinking agent is preferably used. The isocyanate-based crosslinking agent is preferable in that it can react with various functional groups. Specific examples of the above-mentioned isocyanate-based crosslinking agent include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentylene diisocyanate, cyclohexylene diisocyanate, isophor Alicyclic isocyanates such as Erone diisocyanate; Aromatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; Trimethylolpropane/toluene Diisocyanate trimer adduct (manufactured by Nippon Polyurethane Industries, trade name "Coronate L"), trimethylolpropane/hexamethylene diisocyanate trimer adduct (manufactured by Nippon Polyurethane Industries, trade name "Coronate HL"), isocyanurate of hexamethylene diisocyanate (manufactured by Japan Polyurethane Industry Co., Ltd., trade name "Coronate HX") and other isocyanate adducts; etc. It is preferable to use the crosslinking agent which has 3 or more isocyanate groups.

上述異氰酸酯系交聯劑之異氰酸酯系交聯劑之官能基數相對於基礎聚合物中可與異氰酸酯系交聯劑反應之官能基之官能基數,較佳為以成為10 mol%~50 mol%之方式添加,更佳為以成為20 mol%~40 mol%之方式添加。若以此種量添加,則可形成奈米壓痕儀彈性模數經適當調整之黏著劑層。The number of functional groups of the isocyanate-based cross-linking agent in the above-mentioned isocyanate-based cross-linking agent is preferably 10 mol% to 50 mol% relative to the number of functional groups in the base polymer that can react with the isocyanate-based cross-linking agent. Adding, it is more preferable to add so that it may become 20 mol% - 40 mol%. If added in such an amount, an adhesive layer with an appropriately adjusted elastic modulus of the nanoindenter can be formed.

上述黏著劑視需要可進而包含任意適當之添加劑。作為該添加劑,例如可例舉:光聚合起始劑、黏著賦予劑、塑化劑(例如偏苯三甲酸酯系塑化劑、均苯四甲酸酯系塑化劑)、顏料、染料、填充劑、抗老化劑、導電材、紫外線吸收劑、光穩定劑、剝離調整劑、軟化劑、界面活性劑、阻燃劑、抗氧化劑、溶劑等。The above-mentioned adhesive may further contain any appropriate additives as needed. Examples of such additives include photopolymerization initiators, adhesion imparting agents, plasticizers (for example, trimellitate-based plasticizers, pyromellitic acid-based plasticizers), pigments, dyes, Fillers, anti-aging agents, conductive materials, ultraviolet absorbers, light stabilizers, peeling regulators, softeners, surfactants, flame retardants, antioxidants, solvents, etc.

C. 基材上述基材可包含任意適當之樹脂。作為該樹脂,例如可例舉:聚乙烯系樹脂、聚丙烯系樹脂、聚丁烯系樹脂、聚甲基戊烯系樹脂等聚烯烴系樹脂、聚胺基甲酸酯系樹脂、聚酯系樹脂、聚醯亞胺系樹脂、聚醚酮系樹脂、聚苯乙烯系樹脂、聚氯乙烯系樹脂、聚偏二氯乙烯系樹脂、氟系樹脂、矽酮系樹脂、纖維素系樹脂、離子聚合物樹脂等。 C. Substrate The above-mentioned substrate may contain any suitable resin. Examples of the resin include polyolefin-based resins such as polyethylene-based resins, polypropylene-based resins, polybutene-based resins, and polymethylpentene-based resins, polyurethane-based resins, and polyester-based resins. Resin, polyimide resin, polyetherketone resin, polystyrene resin, polyvinyl chloride resin, polyvinylidene chloride resin, fluorine resin, silicone resin, cellulose resin, ionic polymer resin, etc.

於一個實施方式中,作為上述基材,可使用包含聚酯系樹脂之基材。包含聚酯系樹脂之基材較佳為具有剛性,若使用該基材,則可防止固定電子零件時之位置偏移。In one embodiment, as the above-mentioned base material, a base material containing a polyester-based resin can be used. It is preferable that the base material containing polyester-based resin has rigidity, and if this base material is used, positional displacement when fixing electronic parts can be prevented.

上述基材之厚度較佳為2 μm~300 μm,更佳為5 μm~200 μm,進而較佳為10 μm~200 μm。The thickness of the base material is preferably 2 μm to 300 μm, more preferably 5 μm to 200 μm, and still more preferably 10 μm to 200 μm.

於一個實施方式中,使用厚度為30 μm~200 μm之基材(較佳為包含聚酯系樹脂之基材)。若使用此種厚度之基材,可防止固定電子零件時之位置偏移。In one embodiment, a substrate having a thickness of 30 μm to 200 μm (preferably a substrate containing polyester-based resin) is used. If the base material of this thickness is used, positional deviation when fixing electronic parts can be prevented.

D. 另一黏著劑層上述另一黏著劑層可包含任意適當之黏著劑。該黏著劑可為硬化型黏著劑,亦可為壓敏型黏著劑。上述另一黏著劑層例如包含丙烯酸系黏著劑、橡膠系黏著劑、矽酮系黏著劑等黏著劑。 D. Another Adhesive Layer The above-mentioned another adhesive layer may contain any suitable adhesive. The adhesive can be a hardening adhesive or a pressure-sensitive adhesive. The above-mentioned another adhesive layer includes, for example, an adhesive such as an acrylic adhesive, a rubber-based adhesive, and a silicone-based adhesive.

上述另一黏著劑層之厚度例如為1 μm~100 μm。The thickness of the other adhesive layer is, for example, 1 μm˜100 μm.

E. 黏著片材之製造方法上述黏著片材可藉由任意適當之方法製造。黏著片材例如可於基材上塗佈上述黏著劑而獲得。作為塗佈方法,可採用棒式塗佈機塗佈、氣刀塗佈、凹版塗佈、反向凹版塗佈、逆輥塗佈、模唇塗佈、模嘴塗佈、浸漬塗佈、膠版印刷、軟版印刷、網版印刷等各種方法。又,另外可採用於在剝離襯墊形成黏著劑層後,將其貼合於基材之方法等。 E. Manufacturing Method of Adhesive Sheet The above-mentioned adhesive sheet can be manufactured by any appropriate method. The adhesive sheet can be obtained by, for example, coating the above-mentioned adhesive on a base material. As the coating method, bar coater coating, air knife coating, gravure coating, reverse gravure coating, reverse roll coating, die lip coating, die die coating, dip coating, offset coating can be used Printing, flexographic printing, screen printing and other methods. Moreover, after forming an adhesive bond layer in a release liner, the method of bonding it to a base material etc. can also be employ|adopted.

F. 黏著片材之使用方法 ( 電子零件之加工方法 )本發明之黏著片材可於任意適當之電子零件之加工步驟中,於構件間轉移該電子零件時使用。例如,於一個實施方式中,提供一種使用上述黏著片材之電子零件之加工方法,該加工方法包括:(a)步驟a,其將配置於第1構件之該電子零件轉印至上述黏著片材之黏著劑層上(黏著片材接收電子零件);及(b)步驟b,其藉由第2構件拾取該電子零件,將該電子零件自上述黏著片材剝離(自黏著片材交接電子零件)。於步驟a之前、步驟a與步驟b之間、步驟b之後,可進行任意適當之加工步驟。 F. Method of Using Adhesive Sheet ( Processing Method of Electronic Parts ) The adhesive sheet of the present invention can be used in any appropriate processing steps of electronic parts, when transferring the electronic parts between components. For example, in one embodiment, there is provided a processing method of an electronic part using the above-mentioned adhesive sheet, the processing method comprising: (a) step a of transferring the electronic part arranged on the first member to the above-mentioned adhesive sheet On the adhesive layer of the material (the adhesive sheet receives the electronic parts); and (b) step b, which picks up the electronic parts by the second member, and peels the electronic parts from the above-mentioned adhesive sheet (self-adhesive sheet handover electronic parts); Components). Any suitable processing steps can be performed before step a, between step a and step b, and after step b.

於一個實施方式中,於第1構件配置有複數個上述電子零件。於一個實施方式中,於上述步驟a中,將配置於第1構件之全部電子零件轉印至上述黏著片材上。於另一實施方式中,將配置於第1構件之電子零件之一部分選擇性地轉印至上述黏著片材上。In one embodiment, a plurality of the above-mentioned electronic components are arranged on the first member. In one Embodiment, in the said step a, all the electronic components arrange|positioned on the 1st member are transcribe|transferred on the said adhesive sheet. In another embodiment, a part of the electronic component arrange|positioned in a 1st member is selectively transcribe|transferred on the said adhesive sheet.

於一個實施方式中,上述步驟b包括:步驟b-1,其使上述第2構件接觸上述黏著劑層上之電子零件;步驟b-2,其對上述黏著片材(實質上為上述黏著劑層)照射活性能量線;及步驟b-3,其藉由上述第2構件拾取該電子零件,將該電子零件自上述黏著片材剝離。In one embodiment, the above-mentioned step b includes: step b-1, which makes the second member contact the electronic parts on the above-mentioned adhesive layer; layer) irradiating active energy rays; and step b-3, which picks up the electronic component by the second member, and peels the electronic component from the adhesive sheet.

於一個實施方式中,上述電子零件可為LED。於一個實施方式中,可使用迷你LED或微型LED作為該LED。所謂迷你LED,例如LED晶片之1邊為100 μm以上之尺寸,具有藍寶石基板等生長支持基板與以氮化鎵作為主成分之發光(磊晶)層鄰接之構造。於本說明書中,即使1邊為100 μm以下,具有藍寶石基板等生長支持基板之LED晶片亦定義為迷你LED。迷你LED晶片之1邊例如為50 μm~500 μm,厚度例如為30 μm~200 μm。又,所謂微型LED,例如LED晶片之1邊為100 μm以下,具有以氮化鎵為主成分之發光(磊晶)層自藍寶石基板等生長支持基板分離,僅由發光(磊晶)層構成之構造。於本說明書中,即使1邊為100 μm以上,不具有藍寶石基板等生長支持基板之LED晶片亦定義為微型LED。微型LED晶片之1邊例如為5 μm~200 μm,厚度例如為3 μm~30 μm。In one embodiment, the above-mentioned electronic components can be LEDs. In one embodiment, mini-LEDs or micro-LEDs can be used as the LEDs. The so-called mini LED, for example, has a size of 100 μm or more on one side of an LED chip, and has a structure in which a growth support substrate such as a sapphire substrate and a light-emitting (epitaxial) layer mainly composed of gallium nitride are adjacent to each other. In this specification, even if one side is 100 μm or less, an LED chip having a growth support substrate such as a sapphire substrate is defined as a mini LED. One side of the mini LED chip is, for example, 50 μm to 500 μm, and the thickness is, for example, 30 μm to 200 μm. In addition, the so-called micro LED, for example, one side of the LED chip is 100 μm or less, and has a light-emitting (epitaxy) layer mainly composed of gallium nitride. It is separated from a growth support substrate such as a sapphire substrate and consists of only a light-emitting (epitaxy) layer. the structure. In this specification, even if one side is 100 μm or more, an LED chip that does not have a growth support substrate such as a sapphire substrate is defined as a micro LED. One side of the micro LED chip is, for example, 5 μm to 200 μm, and the thickness is, for example, 3 μm to 30 μm.

於一個實施方式中,上述電子零件為LED(較佳為微型LED),上述第1構件為藍寶石基板。於此種實施方式中,於步驟a中,對配置有LED之藍寶石基板照射UV雷射光,將該LED轉印至上述黏著片材。此處,藉由進行UV雷射光照射,將藍寶石基板與LED之界面化學性分解,從而LED自藍寶石基板剝離。具體而言,存在於藍寶石基板與LED之界面附近之氮化鎵藉由UV雷射光照射,分解為液態金屬鎵及氣態氮,從而LED自藍寶石基板分離。於一個實施方式中,將配置於藍寶石基板之全部LED轉印至上述黏著片材上。於另一實施方式中,將配置於藍寶石基板之LED之一部分選擇性地轉印至上述黏著片材上。 [實施例] In one embodiment, the electronic component is an LED (preferably a micro LED), and the first member is a sapphire substrate. In this embodiment, in step a, UV laser light is irradiated to the sapphire substrate on which the LEDs are arranged, and the LEDs are transferred to the above-mentioned adhesive sheet. Here, by irradiating with UV laser light, the interface between the sapphire substrate and the LED is chemically decomposed, and the LED is peeled off from the sapphire substrate. Specifically, the gallium nitride existing near the interface between the sapphire substrate and the LED is decomposed into liquid metal gallium and gaseous nitrogen by irradiation with UV laser light, so that the LED is separated from the sapphire substrate. In one embodiment, all the LEDs arranged on the sapphire substrate are transferred onto the above-mentioned adhesive sheet. In another embodiment, a portion of the LEDs disposed on the sapphire substrate is selectively transferred onto the above-mentioned adhesive sheet. [Example]

以下,藉由實施例對本發明具體地說明,但本發明並不限定於該等實施例。實施例中之試驗及評價方法如以下所示。又,除非另有說明,否則「份」及「%」為重量基準。Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. The tests and evaluation methods in the examples are as follows. In addition, unless otherwise specified, "parts" and "%" are based on weight.

(1)奈米壓痕儀彈性模數 使用奈米壓痕儀(Hysitron Inc公司製造,商品名「Triboindenter TI-950」),利用特定溫度(25℃)下之單一壓入法,於約500 nm/sec之壓入速度、約500 nm/sec之抽拉速度、約3000 nm之壓入深度之測定條件下,測定常態及照射460 mJ/cm 2之紫外線後之黏著劑層表面之彈性模數。 (1) The elastic modulus of the nanoindenter Using a nanoindenter (manufactured by Hysitron Inc, trade name "Triboindenter TI-950"), a single indentation method at a specific temperature (25°C) was used to measure it at about 500 Under the measurement conditions of the pressing speed of nm/sec, the pulling speed of about 500 nm/sec, and the pressing depth of about 3000 nm, the elastic mode of the surface of the adhesive layer in the normal state and after irradiating ultraviolet rays of 460 mJ/cm 2 was measured. number.

(2)常態之黏著劑層之儲存模數 使用動態黏彈性測定裝置(TA instruments公司製造,商品名「ARES-G2」),對測定頻率1 Hz、應變0.05%、25℃下之儲存模數G'、損耗係數tanδ進行測定。具體而言,使用實施例及比較例中所獲得之常態之黏著劑,製作厚度50 μm之不具有基材之黏著片材,以厚度成為1.0 mm以上之方式積層該黏著片材,使用治具衝壓為

Figure 02_image001
8 mm尺寸,設置於ARES-G2之探針。自-50℃至200℃以5℃/min.之升溫速度進行測定。根據所獲得之資料擷取25℃下之儲存模數G'之值。 (2) Storage modulus of the adhesive layer in normal state Using a dynamic viscoelasticity measuring device (manufactured by TA instruments, trade name "ARES-G2"), the storage modulus at a measurement frequency of 1 Hz, strain of 0.05%, and 25°C was measured. G' and loss coefficient tanδ were measured. Specifically, an adhesive sheet having a thickness of 50 μm without a substrate was produced using the normal adhesive obtained in the Examples and Comparative Examples, and the adhesive sheets were laminated so that the thickness was 1.0 mm or more, and a jig was used. stamping as
Figure 02_image001
8 mm size, set on the probe of ARES-G2. The measurement is carried out at a heating rate of 5°C/min. from -50°C to 200°C. According to the obtained data, the value of the storage modulus G' at 25°C was extracted.

(3)照射460 mJ/cm 2之紫外線後之黏著劑層之拉伸模數 使用動態黏彈性測定裝置(TA Instrument公司製造,商品名「RSA-3」),對測定頻率1 Hz、應變0.05%、25℃下之拉伸模數E'進行測定。具體而言,使用實施例及比較例中所獲得之黏著劑,製作厚度50 μm之不具有基材之黏著片材,以厚度成為200 μm以上之方式積層該黏著片材。以於樣本兩側附有剝離襯墊之狀態,自兩側各照射1次460 mJ/cm 2之紫外線後去除剝離襯墊,將所得之黏著劑層設為寬度10 mm之樣本。再者,夾頭間距離設為20 mm,自0℃至200℃以5℃/min.之升溫速度進行測定。根據所獲得之資料,擷取25℃下之拉伸模數E'之值。 (3) Tensile modulus of the adhesive layer after being irradiated with ultraviolet rays of 460 mJ /cm %, and the tensile modulus E' at 25°C was measured. Specifically, using the adhesives obtained in Examples and Comparative Examples, an adhesive sheet having a thickness of 50 μm without a base material was produced, and the adhesive sheets were laminated so that the thickness would be 200 μm or more. With the release liner attached to both sides of the sample, the release liner was removed after irradiating ultraviolet rays of 460 mJ/cm 2 once from both sides, and the obtained adhesive layer was set as a sample with a width of 10 mm. In addition, the distance between the chucks was set to 20 mm, and the measurement was performed at a temperature increase rate of 5°C/min. from 0°C to 200°C. From the data obtained, the value of the tensile modulus E' at 25°C was extracted.

(4)探針黏性 將與黏著片材(寬度20 mm×長度50 mm)之評價面之黏著劑層為相反側之面之整面,經由雙面膠帶(日東電工股份有限公司,商品名「No.5600」),使用2 kg手壓輥貼附於載玻片(松浪玻璃工業公司製造,26 mm×76 mm)。繼而,使用探針黏性測定機(RHESCA公司製造,商品名「TACKINESS Model TAC-II」),以5 mm

Figure 02_image001
之SUS製之探針端子於探針下降速度(Immersion speed):120 mm/min、測試速度(tests peed):600 mm/min、密接荷重(Prelod):20 gf、密接保持時間(press time):1秒之條件下,測量暴露之黏著劑層面之探針黏性值、及對暴露之黏著劑層面照射460 mJ/cm 2之紫外線後之探針黏性值。測定係於N=5下實施,將該等測定值之平均值設為探針黏性值。又,關於實施例17~22之黏著片材,使用2 kg手壓輥將與評價面之黏著劑層為相反側之黏著劑面貼附於上述載玻片,以與上述相同之條件測量探針黏性值。 (4) Probe Adhesion The entire surface of the surface opposite to the adhesive layer on the evaluation surface of the adhesive sheet (width 20 mm × length 50 mm) was passed through a double-sided tape (Nitto Denko Co., Ltd., trade name "No. 5600"), and attached to a glass slide (manufactured by Songnami Glass Industry Co., Ltd., 26 mm×76 mm) using a 2 kg hand roller. Next, using a probe viscosity measuring machine (manufactured by RHESCA, trade name "TACKINESS Model TAC-II"), 5 mm
Figure 02_image001
The probe terminal made of SUS is at the probe descending speed (Immersion speed): 120 mm/min, test speed (tests speed): 600 mm/min, close contact load (Prelod): 20 gf, close contact retention time (press time) : Under the condition of 1 second, measure the probe viscosity value of the exposed adhesive layer and the probe viscosity value after irradiating the exposed adhesive layer with 460 mJ/ cm2 of ultraviolet light. The measurement was carried out at N=5, and the average value of these measurement values was taken as the probe viscosity value. In addition, regarding the adhesive sheets of Examples 17 to 22, the adhesive surface on the opposite side to the adhesive layer on the evaluation surface was adhered to the above-mentioned glass slide using a 2 kg hand roller, and the probe was measured under the same conditions as above. Needle viscosity value.

(5)黏著力 將黏著片材之黏著劑層貼附於SUS304BA,藉由依據JIS Z 0237:2000之方法(貼合條件:2 kg輥1次往復、拉伸速度:300 mm/min、剝離角度180°、測定溫度:23℃),測定該黏著片材相對之黏著力。又,將黏著片材之黏著劑層貼附於聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Lumirror S10」,厚度:25 μm),藉由依據JIS Z 0237:2000之方法(貼合條件:2 kg輥1次往復、拉伸速度:300 mm/min、剝離角度180°、測定溫度:23℃),將被黏著體自黏著片材剝下而測定該黏著片材相對於聚對苯二甲酸乙二酯膜之黏著力。 又,如上所述貼附於被黏著體後,藉由上述方法測定對黏著劑層照射460 mJ/cm 2之紫外線後之黏著力。 (5) Adhesion The adhesive layer of the adhesive sheet was attached to SUS304BA by a method according to JIS Z 0237:2000 (lamination conditions: 2 kg roller 1 reciprocation, stretching speed: 300 mm/min, peeling Angle 180°, measurement temperature: 23°C), the relative adhesive force of the adhesive sheet was measured. Furthermore, the adhesive layer of the adhesive sheet was adhered to a polyethylene terephthalate film (manufactured by Toray Industries, Ltd., trade name "Lumirror S10", thickness: 25 μm), and the Method (bonding conditions: one reciprocation of a 2 kg roller, stretching speed: 300 mm/min, peeling angle 180°, measurement temperature: 23°C), the adherend was peeled off from the adhesive sheet, and the adhesive sheet was measured Adhesion relative to polyethylene terephthalate film. In addition, after sticking to the adherend as described above, the adhesive force after irradiating the adhesive layer with ultraviolet rays of 460 mJ/cm 2 was measured by the method described above.

(6)TMA下沉深度 使用熱機械分析裝置(TA-instrument公司製造,商品名「TMA Q400」),使用

Figure 02_image001
1.0 mm之探針,以針入模式於氮氣流量:50.0 ml/min、壓入荷重:0.5 N、測定氛圍溫度:40℃、壓入負載時間:20 min之條件下,自黏著劑層側測量黏著片材之下沉深度。測定係於N=5下實施,將除該等測定值中之最大值及最小值以外之N=3之平均值設為樣本之下沉深度。 (6) TMA subsidence depth A thermomechanical analyzer (manufactured by TA-instrument, trade name "TMA Q400") was used, and the
Figure 02_image001
1.0 mm probe, measured from the adhesive layer side in the needle penetration mode under the conditions of nitrogen flow rate: 50.0 ml/min, pressing load: 0.5 N, measurement atmosphere temperature: 40°C, pressing load time: 20 min The subsidence depth of the adhesive sheet. The measurement was carried out at N=5, and the average value of N=3 excluding the maximum and minimum values among the measured values was set as the subsidence depth of the sample.

(7)貼合時之晶片嵌入性 於藉由熱機械分析(TMA)測得之黏著片材之下沉深度為3 μm以上且未達27 μm之情形時,嵌入性優異(表中為〇),於27 μm以上之情形時,嵌入性過度(表中為×)。 (7) Chip embedment during bonding When the subsidence depth of the adhesive sheet measured by thermomechanical analysis (TMA) was 3 μm or more and less than 27 μm, the embeddability was excellent (0 in the table), and when it was 27 μm or more, the Excessive embeddedness (x in the table).

(8)基材之變形量 算出自藉由熱機械分析(TMA)測得之黏著片材之下沉深度減去黏著片材之黏著劑層厚度而得之值作為基材之變形量。於黏著片材之下沉深度小於黏著劑層厚度之情形時,基材之變形設為無。 (8) Deformation of the base material A value obtained by subtracting the thickness of the adhesive layer of the adhesive sheet from the subsidence depth of the adhesive sheet measured by thermomechanical analysis (TMA) was calculated as the deformation amount of the substrate. When the subsidence depth of the adhesive sheet is less than the thickness of the adhesive layer, the deformation of the substrate is set as no.

(9)晶片之位置精度 於根據藉由熱機械分析(TMA)測得之黏著片材之下沉深度所算出之基材之變形量未達20 μm之情形時,接收晶片時之位置精度優異(表中為〇),於20 μm以上之情形時,接收晶片時之位置精度不充分(表中為×)。 (9) Positional accuracy of the wafer When the deformation amount of the substrate calculated from the subsidence depth of the adhesive sheet measured by thermomechanical analysis (TMA) did not reach 20 μm, the positional accuracy at the time of receiving the wafer was excellent (0 in the table), In the case of 20 μm or more, the positional accuracy at the time of receiving the wafer is insufficient (X in the table).

(10)照射460 mJ/cm 2之紫外線後之剪切接著力 將實施例及比較例中所獲得之黏著片材(尺寸:20 mm×20 mm)與黏著劑層為相反側之面貼附於特定之基底(例如松浪玻璃工業公司製造,26 mm×76 mm載玻片)而固定,於該黏著片材之黏著劑層表面配置1 mm×1 mm矽晶片,藉由熱壓機,於40℃、0.05 MPa之貼合條件下對該矽晶片進行1分鐘之熱壓接合而製作評價用樣本。再者,其他不具備黏著劑層之黏著片材對基底之固定係使用雙面膠帶(日東電工股份有限公司,商品名「No.5600」)。自所獲得之評價用樣本之特定之基底側,使用紫外線照射裝置(日東精機公司製造,商品名「UM-810」),對該附帶矽晶片之黏著片材之黏著劑層照射高壓水銀燈之紫外線(特性波長:365 nm、累計光量:460 mJ/cm 2、照射能:70 W/cm 2、照射時間:6.6秒)而製作評價用樣本。 關於該評價用樣本,於25℃之環境溫度下,使用Nordson公司製造之dage4000,於距離貼附面50 μm高度之位置將測定端子設置於1 mm×1 mm矽晶片之側面,以500 μm/sec.之剪切速度對晶片及水平方向施加外力,藉此獲得荷重-位移曲線,自該荷重-位移曲線讀取最大破壞荷重,將其設為25℃環境溫度下之剪切接著力。測定係於N=5下實施,將除該等測定值中之最大值及最小值以外之N=3之平均值設為樣本之剪切接著力。 (10) Shear Adhesion after Irradiation of 460 mJ/cm 2 of Ultraviolet Light The adhesive sheets (dimensions: 20 mm×20 mm) obtained in Examples and Comparative Examples were attached to the opposite side of the adhesive layer It is fixed on a specific substrate (such as a 26 mm × 76 mm glass slide manufactured by Songlang Glass Industry Co., Ltd.), and a 1 mm × 1 mm silicon wafer is arranged on the surface of the adhesive layer of the adhesive sheet. The silicon wafer was subjected to thermocompression bonding for 1 minute under the bonding conditions of 40° C. and 0.05 MPa to prepare a sample for evaluation. Furthermore, the other adhesive sheets that do not have an adhesive layer are fixed to the substrate using double-sided tape (Nitto Denko Co., Ltd., trade name "No. 5600"). From the specific base side of the obtained sample for evaluation, an ultraviolet irradiation device (manufactured by Nitto Seiki Co., Ltd., trade name "UM-810") was used to irradiate the adhesive layer of the adhesive sheet with the silicon wafer with ultraviolet rays from a high-pressure mercury lamp (Characteristic wavelength: 365 nm, cumulative light intensity: 460 mJ/cm 2 , irradiation energy: 70 W/cm 2 , irradiation time: 6.6 seconds) to prepare a sample for evaluation. For this evaluation sample, at an ambient temperature of 25°C, a dage4000 manufactured by Nordson Corporation was used, and a measurement terminal was placed on the side of a 1 mm × 1 mm silicon wafer at a height of 50 μm from the attachment surface, and a measurement of 500 μm/ The shear rate of sec. applies external force to the wafer and the horizontal direction, thereby obtaining a load-displacement curve, and reading the maximum failure load from the load-displacement curve, which is set as the shear adhesion force at an ambient temperature of 25°C. The measurement was carried out at N=5, and the average value of N=3 excluding the maximum value and the minimum value among the measured values was taken as the shear adhesion force of the sample.

(11)轉印性 於照射460 mJ/cm 2之紫外線後之剪切接著力未達2000 N/cm 2之情形時,交接晶片時之轉印性優異(表中為〇),於2000 N/cm 2以上且未達2400 N/cm 2之情形時,交接晶片時之轉印性良好(表中為△),於2400 N/cm 2以上之情形時,交接晶片時之轉印性不充分(表中為×)。 (11) Transferability When the shear adhesion force after irradiating ultraviolet rays of 460 mJ/cm 2 did not reach 2000 N/cm 2 , the transferability at the time of wafer transfer was excellent (0 in the table), and at 2000 N In the case of more than 2400 N/cm 2 and less than 2400 N/cm 2 , the transferability at the time of wafer transfer is good (△ in the table), and when it is more than 2400 N/cm 2 , the transferability at the time of wafer transfer is not good. Sufficient (X in the table).

[製造例1]丙烯酸系聚合物A之製備 將丙烯酸2-乙基己酯(2-EHA)88.8重量份、丙烯酸羥基乙酯(HEA)11.2重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.2重量份及甲苯進行混合。於氮氣氣流下、60℃下,使所獲得之混合物聚合,獲得重量平均分子量(Mw)為約60萬之丙烯酸系共聚物。 對包含丙烯酸系共聚物100重量份之甲苯溶液添加甲基丙烯醯氧乙基異氰酸酯(MOI)12重量份及二月桂酸丁基錫0.06重量份,使MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物A。 [Production Example 1] Preparation of Acrylic Polymer A 88.8 parts by weight of 2-ethylhexyl acrylate (2-EHA), 11.2 parts by weight of hydroxyethyl acrylate (HEA), 0.2 parts by weight of a polymerization initiator (manufactured by NOF Corporation, trade name "Nyper BW") and toluene Mix. The obtained mixture was polymerized under nitrogen flow at 60° C. to obtain an acrylic copolymer having a weight average molecular weight (Mw) of about 600,000. 12 parts by weight of methacryloyloxyethyl isocyanate (MOI) and 0.06 part by weight of butyltin dilaurate were added to the toluene solution containing 100 parts by weight of the acrylic copolymer, and the MOI was subjected to an addition reaction to prepare a carbon-carbon double bond The acrylic polymer A.

[製造例2]丙烯酸系聚合物B之製備 將甲基丙烯酸月桂酯(LMA)91重量份、甲基丙烯酸2-乙基己酯(2-HEMA)9.3重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.2重量份及甲苯進行混合。於氮氣氣流下、60℃下,使所獲得之混合物聚合,獲得丙烯酸系共聚物。 對包含丙烯酸系共聚物100重量份之甲苯溶液添加甲基丙烯醯氧乙基異氰酸酯(MOI)9.1重量份及二月桂酸丁基錫0.04重量份,使MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物B。 [Production Example 2] Preparation of Acrylic Polymer B 91 parts by weight of lauryl methacrylate (LMA), 9.3 parts by weight of 2-ethylhexyl methacrylate (2-HEMA), and 0.2 weight part of a polymerization initiator (manufactured by NOF Corporation, trade name "Nyper BW") parts and toluene were mixed. The obtained mixture was polymerized at 60° C. under a nitrogen stream to obtain an acrylic copolymer. To the toluene solution containing 100 parts by weight of the acrylic copolymer, 9.1 parts by weight of methacryloyloxyethyl isocyanate (MOI) and 0.04 parts by weight of butyltin dilaurate were added, and the MOI was subjected to an addition reaction to prepare a carbon-carbon double bond The acrylic polymer B.

[製造例3]丙烯酸系聚合物C之製備 將丙烯酸2-乙基己酯(2-EHA)100重量份、丙烯醯𠰌啉(ACMO)25.5重量份、丙烯酸羥基乙酯(HEA)18.5重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.2重量份及甲苯進行混合。於氮氣氣流下、60℃下,使所獲得之混合物聚合,獲得重量平均分子量(Mw)為約90萬之丙烯酸系共聚物。 對包含丙烯酸系共聚物100重量份之甲苯溶液添加甲基丙烯醯氧乙基異氰酸酯(MOI)8.5重量份及二月桂酸丁基錫0.04重量份,使MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物C。 [Production Example 3] Preparation of Acrylic Polymer C 100 parts by weight of 2-ethylhexyl acrylate (2-EHA), 25.5 parts by weight of acrylonitrile (ACMO), 18.5 parts by weight of hydroxyethyl acrylate (HEA), a polymerization initiator (manufactured by NOF Corporation, commodity (name "Nyper BW") 0.2 weight part and toluene were mixed. The obtained mixture was polymerized under nitrogen flow at 60° C. to obtain an acrylic copolymer having a weight average molecular weight (Mw) of about 900,000. To the toluene solution containing 100 parts by weight of the acrylic copolymer, 8.5 parts by weight of methacryloyloxyethyl isocyanate (MOI) and 0.04 part by weight of butyltin dilaurate were added, and the MOI was subjected to an addition reaction to prepare a carbon-carbon double bond. The acrylic polymer C.

[製造例4]丙烯酸系聚合物D之製備 將丙烯酸2-乙基己酯(2-EHA)75重量份、丙烯醯𠰌啉(ACMO)15重量份、丙烯酸羥基乙酯(HEA)22重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.2重量份及甲苯進行混合。於氮氣氣流下、60℃下,使所獲得之混合物聚合,獲得丙烯酸系共聚物。 對包含丙烯酸系共聚物100重量份之甲苯溶液添加甲基丙烯醯氧乙基異氰酸酯(MOI)17.7重量份及二月桂酸丁基錫0.04重量份,使MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物D。 [Production Example 4] Preparation of Acrylic Polymer D 75 parts by weight of 2-ethylhexyl acrylate (2-EHA), 15 parts by weight of acrylonitrile (ACMO), 22 parts by weight of hydroxyethyl acrylate (HEA), a polymerization initiator (manufactured by NOF Corporation, commodity (name "Nyper BW") 0.2 weight part and toluene were mixed. The obtained mixture was polymerized at 60° C. under a nitrogen stream to obtain an acrylic copolymer. 17.7 parts by weight of methacryloyloxyethyl isocyanate (MOI) and 0.04 part by weight of butyltin dilaurate were added to the toluene solution containing 100 parts by weight of the acrylic copolymer, and the MOI was subjected to an addition reaction to prepare a carbon-carbon double bond The acrylic polymer D.

[製造例5]丙烯酸系聚合物E之製備 將丙烯酸丁酯(BA)50重量份、丙烯酸乙酯(EA)39重量份、丙烯酸羥基乙酯(HEA)20重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.3重量份及甲苯進行混合。於氮氣氣流下、60℃下,使所獲得之混合物聚合,獲得丙烯酸系共聚物。 對包含丙烯酸系共聚物100重量份之甲苯溶液添加甲基丙烯醯氧乙基異氰酸酯(MOI)19.5重量份及二月桂酸丁基錫0.06重量份,使MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物E。 [Production Example 5] Preparation of Acrylic Polymer E 50 parts by weight of butyl acrylate (BA), 39 parts by weight of ethyl acrylate (EA), 20 parts by weight of hydroxyethyl acrylate (HEA), and a polymerization initiator (manufactured by NOF Corporation, trade name "Nyper BW") 0.3 The parts by weight and toluene are mixed. The obtained mixture was polymerized at 60° C. under a nitrogen stream to obtain an acrylic copolymer. 19.5 parts by weight of methacryloyloxyethyl isocyanate (MOI) and 0.06 part by weight of butyltin dilaurate were added to the toluene solution containing 100 parts by weight of the acrylic copolymer, and the MOI was subjected to an addition reaction to prepare a carbon-carbon double bond The acrylic polymer E.

[製造例6]丙烯酸系聚合物F之製備 將丙烯酸2-乙基己酯(2-EHA)30重量份、丙烯酸甲酯(MA)70重量份、丙烯酸(AA)10重量份、聚合起始劑(日本油脂公司製造,商品名「Nyper BW」)0.4重量份及甲苯進行混合後,於70℃下進行加熱,製備丙烯酸系共聚物(丙烯酸系聚合物F)之甲苯溶液。 [Production Example 6] Preparation of Acrylic Polymer F 30 parts by weight of 2-ethylhexyl acrylate (2-EHA), 70 parts by weight of methyl acrylate (MA), 10 parts by weight of acrylic acid (AA), a polymerization initiator (manufactured by NOF Corporation, trade name "Nyper BW ”) 0.4 parts by weight and toluene were mixed, and then heated at 70° C. to prepare a toluene solution of the acrylic copolymer (acrylic polymer F).

[實施例1] 於上述丙烯酸系聚合物A之甲苯溶液中,相對於丙烯酸聚合物之固形物成分100重量份添加異氰酸酯系交聯劑(日本聚胺酯工業公司製造,商品名「Coronate L」)3重量份、及光聚合起始劑(BASF公司製造,商品名「Omnirad」(Omnirad127):2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮)3重量份而製備黏著劑。將該黏著劑塗佈於PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)基材(100 μm,東麗公司製造之「Lumirror S1N」)之一面,獲得具備紫外線硬化型黏著劑層(厚度:2 μm)之黏著片材A(黏著劑層/PET基材)。 將所獲得之黏著片材A供於上述評價。將結果示於表1。 [Example 1] To the toluene solution of the above-mentioned acrylic polymer A, 3 parts by weight of an isocyanate-based crosslinking agent (manufactured by Japan Polyurethane Industry Co., Ltd., trade name "Coronate L"), and light were added to 100 parts by weight of the solid content of the acrylic polymer. Polymerization initiator (manufactured by BASF, trade name "Omnirad" (Omnirad127): 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]phenyl }-2-methyl-propan-1-one) 3 parts by weight to prepare an adhesive. The adhesive was coated on one side of a PET (polyethylene terephthalate, polyethylene terephthalate) substrate (100 μm, “Lumirror S1N” manufactured by Toray Corporation) to obtain a UV-curable adhesive layer (thickness : 2 μm) of adhesive sheet A (adhesive layer/PET substrate). The obtained adhesive sheet A was used for the above evaluation. The results are shown in Table 1.

[實施例2~16、實施例23、比較例1~3] 除按照表1及表2所示之調配量使用表1所示之丙烯酸系聚合物、交聯劑、黏著賦予劑、光聚合起始劑,且使用表1所示之基材以外,以與實施例1相同之方式,獲得黏著片材。將所獲得之黏著片材供於上述評價。將結果示於表1及表2。 實施例及比較例中使用之化合物等如以下所示。 ・「YS POLYSTER S145」:萜酚系黏著賦予劑,Yasuhara Chemical公司製造 ・「UV-1700」:活性能量線硬化性低聚物(日本合成化學工業公司製造,商品名「紫光UV-1700B」) ・「Omnirad651」:BASF公司製造,商品名「Omnirad651」 ・「PET(印刷品)」:大三紙業公司製造之PET膜(厚度:50 μm,淺紅色滿版印刷) ・「PO」:將包含丙烯成分及乙烯丙烯橡膠成分之丙烯系熱塑性彈性體(三菱化學公司製造,商品名「Zelas」)供給至PLACO公司製造之T模成形機(設定溫度:230℃),成形為厚度80 μm之膜狀所獲得之基材 [Examples 2 to 16, Example 23, Comparative Examples 1 to 3] In addition to using the acrylic polymer, crosslinking agent, adhesion imparting agent, photopolymerization initiator shown in Table 1 and using the base material shown in Table 1 according to the formulation amounts shown in Table 1 and Table 2, to In the same manner as in Example 1, an adhesive sheet was obtained. The obtained adhesive sheet was used for the above evaluation. The results are shown in Table 1 and Table 2. Compounds and the like used in Examples and Comparative Examples are shown below. ・"YS POLYSTER S145": Terpene phenol-based adhesion imparting agent, manufactured by Yasuhara Chemical Co., Ltd. ・"UV-1700": Active energy ray curable oligomer (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name "Purple UV-1700B") ・"Omnirad651": manufactured by BASF, trade name "Omnirad651" ・"PET (printed matter)": PET film manufactured by Dasan Paper Co., Ltd. (thickness: 50 μm, light red solid printing) ・"PO": A propylene-based thermoplastic elastomer (manufactured by Mitsubishi Chemical Corporation, trade name "Zelas") containing a propylene component and an ethylene propylene rubber component was supplied to a T-die molding machine manufactured by PLACO Corporation (set temperature: 230°C), Base material obtained by molding into a film with a thickness of 80 μm

[實施例17] 除按照表1所示之調配量使用表1所示之丙烯酸系聚合物、交聯劑、黏著賦予劑、光聚合起始劑以外,以與實施例1相同之方式,獲得黏著片材i(黏著劑層/PET基材)。 於包含丙烯酸系聚合物G(丙烯酸2-乙基己酯(2-EHA)95重量份與丙烯酸(AA)5重量份之共聚物)100重量份之甲苯溶液中,添加環氧系交聯劑(三菱瓦斯化學公司製造,商品名「Tetrad C」)0.6重量份而製備塗佈液。將該塗佈液塗佈於上述黏著片材i之PET基材之與黏著劑層為相反側之面,獲得黏著片材I(黏著劑層/PET基材/另一黏著劑層(厚度:30 μm))。將所獲得之黏著片材供於上述評價。將結果示於表3。 [Example 17] An adhesive sheet i ( adhesive layer/PET substrate). In a toluene solution containing 100 parts by weight of acrylic polymer G (a copolymer of 95 parts by weight of 2-ethylhexyl acrylate (2-EHA) and 5 parts by weight of acrylic acid (AA)), an epoxy-based crosslinking agent was added (Mitsubishi Gas Chemical Co., Ltd. make, trade name "Tetrad C") 0.6 weight part, and the coating liquid was prepared. The coating solution was applied to the surface of the PET substrate of the above-mentioned adhesive sheet i on the opposite side to the adhesive layer to obtain an adhesive sheet 1 (adhesive layer/PET substrate/another adhesive layer (thickness: 30 μm)). The obtained adhesive sheet was used for the above evaluation. The results are shown in Table 3.

[實施例18~22] 除使用表3及表4所示之厚度之基材以外,以與實施例17相同之方式獲得黏著片材。將所獲得之黏著片材供於上述評價。將結果示於表3及表4。 [Examples 18 to 22] An adhesive sheet was obtained in the same manner as in Example 17, except that the substrates having the thicknesses shown in Tables 3 and 4 were used. The obtained adhesive sheet was used for the above evaluation. The results are shown in Table 3 and Table 4.

[表1]    實施例1 實施例2 實施例3 實施例4 實施例5 黏著劑層 基礎聚合物 聚合物種類 聚合物A 聚合物A 聚合物A 聚合物A 聚合物A 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 3 3 3 3 3 添加劑(黏著賦予劑/低聚物) 添加樹脂種類 - - - - - - - - - - 添加樹脂調配量[重量份] - - - - - 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 3 3 厚度[μm] 2 5 10 15 30 基材 材質 PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) 厚度[μm] 100 100 100 100 100 評價 黏著劑層 常態儲存模數G'[MPa] 0.13 0.13 0.13 0.13 0.13 常態奈米壓痕儀彈性模數Er[MPa] 1.2 1.2 1.2 1.2 1.2 UV照射後之拉伸模數E'[MPa] 34.9 34.9 34.9 34.9 34.9 UV照射後之奈米壓痕儀彈性模數Er[MPa] 295.8 295.8 295.8 295.8 295.8 常態探針黏性[N/cm 2] 19.9 33.5 29.2 27.9 48.9 黏著片材 厚度[μm] 102 105 110 115 130 常態黏著力(對SUS304)[N/20 mm] 0.12 0.14 0.15 0.17 0.22 UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.03 0.03 0.03 0.04 0.04 常態黏著力(對PET)[N/20 mm] 0.18 0.31 0.53 0.71 0.96 UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.04 0.04 0.04 0.04 0.04 TMA下沉深度[μm] 2.8 7.7 9.9 17.8 26.5 貼合時之晶片嵌入性 × 基材之變形量[μm] 0.8 2.7 0.0 2.8 0.0 晶片之位置精度 UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 2098.7 1698.7 1801.7 1927.3 2174.3 轉印性       實施例6 實施例7 實施例8 實施例9 實施例10 黏著劑層 基礎聚合物 聚合物種類 聚合物A 聚合物A 聚合物A 聚合物A 聚合物A 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 3 1 1 1 0.2 添加劑 (黏著賦予劑/低聚物) 添加樹脂種類 - - - - - - - - - - 添加樹脂調配量[重量份] - - - - - 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 3 3 厚度[μm] 40 10 20 30 5 基材 材質 PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(印刷品) 厚度[μm] 100 100 100 100 50 評價 黏著劑層 常態儲存模數G'[MPa] 0.13 0.05 0.05 0.05 0.03 常態奈米壓痕儀彈性模數Er[MPa] 1.2 0.5 0.5 0.5 0.4 UV照射後之拉伸模數E'[MPa] 34.9 25.8 25.8 25.8 22.5 UV照射後之奈米壓痕儀彈性模數Er[MPa] 295.8 222.8 222.8 222.8 196.1 常態探針黏性[N/cm 2] 50.1 34.8 44.2 43.7 43.2 黏著片材 厚度[μm] 140 110 120 130 55 常態黏著力(對SUS304)[N/20 mm] 0.26 0.30 0.39 0.50 4.25 UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.04 0.04 0.04 0.05 0.05 常態黏著力(對PET)[N/20 mm] 0.99 1.92 2.40 2.53 4.44 UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.05 0.04 0.05 0.06 0.05 TMA下沉深度[μm] 28.9 12.9 19.0 29.5 8.0 貼合時之晶片嵌入性 × × 基材之變形量[μm] 0.0 2.9 0.0 0.0 3.0 晶片之位置精度 UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 2297.6 1596.1 2045.3 2228.0 562.2 轉印性 [Table 1] Example 1 Example 2 Example 3 Example 4 Example 5 adhesive layer base polymer Type of polymer polymer A polymer A polymer A polymer A polymer A cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 3 3 3 3 3 Additives (adhesion imparting agents/oligomers) Add resin type - - - - - - - - - - Add resin compounding amount [weight part] - - - - - photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 3 3 Thickness [μm] 2 5 10 15 30 substrate material PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) Thickness [μm] 100 100 100 100 100 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.13 0.13 0.13 0.13 0.13 Normal state nanoindenter elastic modulus Er[MPa] 1.2 1.2 1.2 1.2 1.2 Tensile modulus E'[MPa] after UV irradiation 34.9 34.9 34.9 34.9 34.9 Nanoindenter elastic modulus Er[MPa] after UV irradiation 295.8 295.8 295.8 295.8 295.8 Normal probe viscosity [N/cm 2 ] 19.9 33.5 29.2 27.9 48.9 adhesive sheet Thickness [μm] 102 105 110 115 130 Normal adhesion (to SUS304) [N/20 mm] 0.12 0.14 0.15 0.17 0.22 Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.03 0.03 0.03 0.04 0.04 Normal Adhesion (to PET) [N/20 mm] 0.18 0.31 0.53 0.71 0.96 Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.04 0.04 0.04 0.04 0.04 TMA subsidence depth [μm] 2.8 7.7 9.9 17.8 26.5 Chip embeddability during bonding × Substrate deformation [μm] 0.8 2.7 0.0 2.8 0.0 The positional accuracy of the chip Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 2098.7 1698.7 1801.7 1927.3 2174.3 transferability Example 6 Example 7 Example 8 Example 9 Example 10 adhesive layer base polymer Type of polymer polymer A polymer A polymer A polymer A polymer A cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 3 1 1 1 0.2 Additives (adhesion imparting agents/oligomers) Add resin type - - - - - - - - - - Add resin compounding amount [weight part] - - - - - photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 3 3 Thickness [μm] 40 10 20 30 5 substrate material PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) PET (print) Thickness [μm] 100 100 100 100 50 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.13 0.05 0.05 0.05 0.03 Normal state nanoindenter elastic modulus Er[MPa] 1.2 0.5 0.5 0.5 0.4 Tensile modulus E'[MPa] after UV irradiation 34.9 25.8 25.8 25.8 22.5 Nanoindenter elastic modulus Er[MPa] after UV irradiation 295.8 222.8 222.8 222.8 196.1 Normal probe viscosity [N/cm 2 ] 50.1 34.8 44.2 43.7 43.2 adhesive sheet Thickness [μm] 140 110 120 130 55 Normal adhesion (to SUS304) [N/20 mm] 0.26 0.30 0.39 0.50 4.25 Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.04 0.04 0.04 0.05 0.05 Normal Adhesion (to PET) [N/20 mm] 0.99 1.92 2.40 2.53 4.44 Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.05 0.04 0.05 0.06 0.05 TMA subsidence depth [μm] 28.9 12.9 19.0 29.5 8.0 Chip embeddability during bonding × × Substrate deformation [μm] 0.0 2.9 0.0 0.0 3.0 The positional accuracy of the chip Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 2297.6 1596.1 2045.3 2228.0 562.2 transferability

[表2]    實施例11 實施例12 實施例13 實施例14 實施例15 黏著劑層 基礎聚合物 聚合物種類 聚合物A 聚合物A 聚合物A 聚合物A 聚合物B 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 0.2 0.2 0.2 0.2 0.5 添加劑(黏著賦予劑/低聚物) 添加樹脂種類 - - - 萜酚系 - - - - YS POLYSTER S145 - 添加樹脂調配量[重量份] - - - 5 - 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 3 3 厚度[μm] 10 15 20 10 10 基材 材質 PET(印刷品) PET(印刷品) PET(印刷品) PET(印刷品) PET(Lumirror S1N) 厚度[μm] 50 50 50 50 100 評價 黏著劑層 常態儲存模數G'[MPa] 0.03 0.03 0.03 0.03 0.05 常態奈米壓痕儀彈性模數Er[MPa] 0.4 0.4 0.4 0.4 0.5 UV照射後之拉伸模數E'[MPa] 22.5 22.5 22.5 17.0 48.2 UV照射後之奈米壓痕儀彈性模數Er[MPa] 196.1 196.1 196.1 150.8 400.8 常態探針黏性[N/cm 2] 33.5 30.6 38.5 40.3 40.3 黏著片材 厚度[μm] 60 65 70 60 110 常態黏著力(對SUS304)[N/20 mm] 6.70 7.38 7.96 8.26 6.13(凝聚破壞) UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.04 0.04 0.05 0.06 0.04 常態黏著力(對PET)[N/20 mm] 4.81 5.04 5.08 6.65 9.07(凝聚破壞) UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.05 0.05 0.06 0.07 0.05(黏滑) TMA下沉深度[μm] 10.8 19.3 22.5 9.6 11.0 貼合時之晶片嵌入性 基材之變形量[μm] 0.8 4.3 2.5 0.0 1.0 晶片之位置精度 UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 617.1 822.2 869.9 691.2 2169.1 轉印性       實施例16 實施例23 比較例1 比較例2 比較例3 黏著劑層 基礎聚合物 聚合物種類 聚合物C 聚合物A 聚合物D 聚合物E 聚合物F 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 4 0.2 0.5 0.2 3.5 添加劑(黏著賦予劑/低聚物) 添加樹脂種類 - - - - UV低聚物 - - - - UV-1700 添加樹脂調配量[重量份]             100 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad651 Omnirad127 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 3 3 厚度[μm] 10 20 10 10 10 基材 材質 PET(Lumirror S1N) PO PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) 厚度[μm] 100 80 100 100 100 評價 黏著劑層 常態儲存模數G'[MPa] 0.58 0.03 0.07 0.08 0.10 常態奈米壓痕儀彈性模數Er[MPa] 5.1 0.4 0.7 0.8 1.0 UV照射後之拉伸模數E'[MPa] 50.3 22.5 147.0 109.6 1672.2 UV照射後之奈米壓痕儀彈性模數Er[MPa] 416.7 196.1 1140.2 865.5 11160.6 常態探針黏性[N/cm 2] 22.0 34.5 31.2 45.0 38.4 黏著片材 厚度[μm] 110 100 110 110 110 常態黏著力(對SUS304)[N/20 mm] 0.45 9.80 6.50 4.08 22.48 UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.06 0.08 0.02 0.03 0.02 常態黏著力(對PET)[N/20 mm] 3.85 5.78 8.24 8.39(抓固破壞) 12.23(抓固破壞) UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.07(黏滑) 0.08 0.03(黏滑) 0.04(黏滑) 0.02(黏滑) TMA下沉深度[μm] 10.7 32.5 9.6 10.1 9.8 貼合時之晶片嵌入性 × 基材之變形量[μm] 0.7 12.5 0.0 0.1 0.0 晶片之位置精度 UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 2288.8 1269.9 2308.6 2359.4 2400.5 轉印性 × × × [Table 2] Example 11 Example 12 Example 13 Example 14 Example 15 adhesive layer base polymer Type of polymer polymer A polymer A polymer A polymer A polymer B cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 0.2 0.2 0.2 0.2 0.5 Additives (adhesion imparting agents/oligomers) Add resin type - - - Terpene phenols - - - - YS POLYSTER S145 - Add resin compounding amount [weight part] - - - 5 - photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad127 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 3 3 Thickness [μm] 10 15 20 10 10 substrate material PET (print) PET (print) PET (print) PET (print) PET(Lumirror S1N) Thickness [μm] 50 50 50 50 100 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.03 0.03 0.03 0.03 0.05 Normal state nanoindenter elastic modulus Er[MPa] 0.4 0.4 0.4 0.4 0.5 Tensile modulus E'[MPa] after UV irradiation 22.5 22.5 22.5 17.0 48.2 Nanoindenter elastic modulus Er[MPa] after UV irradiation 196.1 196.1 196.1 150.8 400.8 Normal probe viscosity [N/cm 2 ] 33.5 30.6 38.5 40.3 40.3 adhesive sheet Thickness [μm] 60 65 70 60 110 Normal adhesion (to SUS304) [N/20 mm] 6.70 7.38 7.96 8.26 6.13 (Cohesion failure) Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.04 0.04 0.05 0.06 0.04 Normal Adhesion (to PET) [N/20 mm] 4.81 5.04 5.08 6.65 9.07 (Cohesion Destruction) Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.05 0.05 0.06 0.07 0.05 (sticky) TMA subsidence depth [μm] 10.8 19.3 22.5 9.6 11.0 Chip embeddability during bonding Substrate deformation [μm] 0.8 4.3 2.5 0.0 1.0 The positional accuracy of the chip Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 617.1 822.2 869.9 691.2 2169.1 transferability Example 16 Example 23 Comparative Example 1 Comparative Example 2 Comparative Example 3 adhesive layer base polymer Type of polymer polymer C polymer A polymer D polymer E Polymer F cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 4 0.2 0.5 0.2 3.5 Additives (adhesion imparting agents/oligomers) Add resin type - - - - UV oligomer - - - - UV-1700 Add resin compounding amount [weight part] 100 photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad651 Omnirad127 Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 3 3 Thickness [μm] 10 20 10 10 10 substrate material PET(Lumirror S1N) PO PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) Thickness [μm] 100 80 100 100 100 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.58 0.03 0.07 0.08 0.10 Normal state nanoindenter elastic modulus Er[MPa] 5.1 0.4 0.7 0.8 1.0 Tensile modulus E'[MPa] after UV irradiation 50.3 22.5 147.0 109.6 1672.2 Nanoindenter elastic modulus Er[MPa] after UV irradiation 416.7 196.1 1140.2 865.5 11160.6 Normal probe viscosity [N/cm 2 ] 22.0 34.5 31.2 45.0 38.4 adhesive sheet Thickness [μm] 110 100 110 110 110 Normal adhesion (to SUS304) [N/20 mm] 0.45 9.80 6.50 4.08 22.48 Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.06 0.08 0.02 0.03 0.02 Normal Adhesion (to PET) [N/20 mm] 3.85 5.78 8.24 8.39 (grasping failure) 12.23 (Grasping failure) Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.07 (sticky) 0.08 0.03 (sticky) 0.04 (sticky) 0.02 (sticky) TMA subsidence depth [μm] 10.7 32.5 9.6 10.1 9.8 Chip embeddability during bonding × Substrate deformation [μm] 0.7 12.5 0.0 0.1 0.0 The positional accuracy of the chip Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 2288.8 1269.9 2308.6 2359.4 2400.5 transferability × × ×

[表3]    實施例17 實施例18 實施例19 黏著劑層 基礎聚合物 聚合物種類 聚合物A 聚合物A 聚合物A 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 0.2 0.2 0.2 添加劑(黏著賦予劑/低聚物) 添加樹脂種類 萜酚系 萜酚系 萜酚系 YS POLYSTER S145 YS POLYSTER S145 YS POLYSTER S145 添加樹脂調配量[重量份] S 5 5 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 厚度[μm] 10 10 10 基材 材質 PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) 厚度[μm] 12 25 38 另一黏著劑層 基礎聚合物 聚合物種類 聚合物G 聚合物G 聚合物G 交聯劑 交聯劑種類 環氧系 環氧系 環氧系 Tetrad/C Tetrad/C Tetrad/C 交聯劑調配量[重量份] 0.6 0.6 0.6 厚度[μm] 30 30 30 評價 黏著劑層 常態儲存模數G'[MPa] 0.03 0.03 0.03 常態奈米壓痕儀彈性模數Er[MPa] 0.4 0.4 0.4 UV照射後之拉伸模數E'[MPa] 17.0 17.0 17.0 UV照射後之奈米壓痕儀彈性模數Er[MPa] 150.8 150.8 150.8 常態探針黏性[N/cm 2] 54.8 44.1 43.6 黏著片材 厚度[μm] 52 65 78 常態黏著力(對SUS304)[N/20 mm] 4.20 5.67 6.64 UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.05 0.04 0.05 常態黏著力(對PET)[N/20 mm] 4.64 6.37 6.55 UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.07 0.07 0.06 TMA下沉深度[μm] 35.0 28.5 26.6 貼合時之晶片嵌入性 × × 基材之變形量[μm] 25.0 18.5 16.6 晶片之位置精度 × UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 93.1 154.8 319.5 轉印性 [table 3] Example 17 Example 18 Example 19 adhesive layer base polymer Type of polymer polymer A polymer A polymer A cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 0.2 0.2 0.2 Additives (adhesion imparting agents/oligomers) Add resin type Terpene phenols Terpene phenols Terpene phenols YS POLYSTER S145 YS POLYSTER S145 YS POLYSTER S145 Add resin compounding amount [weight part] S 5 5 photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 Thickness [μm] 10 10 10 substrate material PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) Thickness [μm] 12 25 38 another adhesive layer base polymer Type of polymer polymer G polymer G polymer G cross-linking agent Types of crosslinkers Epoxy system Epoxy system Epoxy system Tetrad/C Tetrad/C Tetrad/C Amount of cross-linking agent [parts by weight] 0.6 0.6 0.6 Thickness [μm] 30 30 30 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.03 0.03 0.03 Normal state nanoindenter elastic modulus Er[MPa] 0.4 0.4 0.4 Tensile modulus E'[MPa] after UV irradiation 17.0 17.0 17.0 Nanoindenter elastic modulus Er[MPa] after UV irradiation 150.8 150.8 150.8 Normal probe viscosity [N/cm 2 ] 54.8 44.1 43.6 adhesive sheet Thickness [μm] 52 65 78 Normal adhesion (to SUS304) [N/20 mm] 4.20 5.67 6.64 Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.05 0.04 0.05 Normal Adhesion (to PET) [N/20 mm] 4.64 6.37 6.55 Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.07 0.07 0.06 TMA subsidence depth [μm] 35.0 28.5 26.6 Chip embeddability during bonding × × Substrate deformation [μm] 25.0 18.5 16.6 The positional accuracy of the chip × Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 93.1 154.8 319.5 transferability

[表4]    實施例20 實施例21 實施例22 黏著劑層 基礎聚合物 聚合物種類 聚合物A 聚合物A 聚合物A 交聯劑 交聯劑種類 異氰酸酯系 異氰酸酯系 異氰酸酯系 Coronate/L Coronate/L Coronate/L 交聯劑調配量[重量份] 0.2 0.2 0.2 添加劑(黏著賦予劑/低聚物) 添加樹脂種類 萜酚系 萜酚系 萜酚系 YS POLYSTER S145 YS POLYSTER S145 YS POLYSTER S145 添加樹脂調配量[重量份] 5 5 5 光聚合起始劑 光聚合起始劑種類 α-羥基酮系 α-羥基酮系 α-羥基酮系 Omnirad127 Omnirad127 Omnirad127 光聚合起始劑種類調配量[重量份] 3 3 3 厚度[μm] 10 10 10 基材 材質 PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) 厚度[μm] 50 100 188 另一黏著劑層 基礎聚合物 聚合物種類 聚合物G 聚合物G 聚合物G 交聯劑 交聯劑種類 環氧系 環氧系 環氧系 Tetrad/C Tetrad/C Tetrad/C 交聯劑調配量[重量份] 0.6 0.6 0.6 厚度[μm] 30 30 30 評價 黏著劑層 常態儲存模數G'[MPa] 0.03 0.03 0.03 常態奈米壓痕儀彈性模數Er[MPa] 0.4 0.4 0.4 UV照射後之拉伸模數E'[MPa] 17.0 17.0 17.0 UV照射後之奈米壓痕儀彈性模數Er[MPa] 150.8 150.8 150.8 常態探針黏性[N/cm 2] 53.8 55.6 44.7 黏著片材 厚度[μm] 90 140 228 常態黏著力(對SUS304)[N/20 mm] 6.68 3.57 1.01 UV硬化(460 mJ/cm 2)後黏著力(對SUS304)[N/20 mm] 0.05 0.06 0.06 常態黏著力(對PET)[N/20 mm] 6.74 6.59 6.62 UV硬化(460 mJ/cm 2)後黏著力(對PET)[N/20 mm] 0.06 0.07 0.07 TMA下沉深度[μm] 20.0 11.0 5.0 貼合時之晶片嵌入性 基材之變形量[μm] 10.0 1.0 0.0 晶片之位置精度 UV硬化(460 mJ/cm 2)後剪切接著力[N/cm 2] 648.4 1918.2 1663.1 轉印性 [Table 4] Example 20 Example 21 Example 22 adhesive layer base polymer Type of polymer polymer A polymer A polymer A cross-linking agent Types of crosslinkers Isocyanate series Isocyanate series Isocyanate series Coronate/L Coronate/L Coronate/L Amount of cross-linking agent [parts by weight] 0.2 0.2 0.2 Additives (adhesion imparting agents/oligomers) Add resin type Terpene phenols Terpene phenols Terpene phenols YS POLYSTER S145 YS POLYSTER S145 YS POLYSTER S145 Add resin compounding amount [weight part] 5 5 5 photopolymerization initiator Types of photopolymerization initiators α-Hydroxyketone series α-Hydroxyketone series α-Hydroxyketone series Omnirad127 Omnirad127 Omnirad127 Types of photopolymerization initiators preparation amount [parts by weight] 3 3 3 Thickness [μm] 10 10 10 substrate material PET(Lumirror S1N) PET(Lumirror S1N) PET(Lumirror S1N) Thickness [μm] 50 100 188 another adhesive layer base polymer Type of polymer polymer G polymer G polymer G cross-linking agent Types of crosslinkers Epoxy system Epoxy system Epoxy system Tetrad/C Tetrad/C Tetrad/C Amount of cross-linking agent [parts by weight] 0.6 0.6 0.6 Thickness [μm] 30 30 30 Evaluation adhesive layer Normal storage modulus G'[MPa] 0.03 0.03 0.03 Normal state nanoindenter elastic modulus Er[MPa] 0.4 0.4 0.4 Tensile modulus E'[MPa] after UV irradiation 17.0 17.0 17.0 Nanoindenter elastic modulus Er[MPa] after UV irradiation 150.8 150.8 150.8 Normal probe viscosity [N/cm 2 ] 53.8 55.6 44.7 adhesive sheet Thickness [μm] 90 140 228 Normal adhesion (to SUS304) [N/20 mm] 6.68 3.57 1.01 Adhesion after UV curing (460 mJ/cm 2 ) (to SUS304) [N/20 mm] 0.05 0.06 0.06 Normal Adhesion (to PET) [N/20 mm] 6.74 6.59 6.62 Adhesion (to PET) after UV curing (460 mJ/cm 2 ) [N/20 mm] 0.06 0.07 0.07 TMA subsidence depth [μm] 20.0 11.0 5.0 Chip embeddability during bonding Substrate deformation [μm] 10.0 1.0 0.0 The positional accuracy of the chip Shear Adhesion After UV Curing (460 mJ/cm 2 ) [N/cm 2 ] 648.4 1918.2 1663.1 transferability

10:基材 20:黏著劑層 30:另一黏著劑層 100:黏著片材 200:黏著片材 10: Substrate 20: Adhesive layer 30: Another adhesive layer 100: Adhesive sheet 200: Adhesive sheet

圖1係本發明之一個實施方式之黏著片材之概略剖視圖。 圖2係本發明之另一實施方式之黏著片材之概略剖視圖。 FIG. 1 is a schematic cross-sectional view of an adhesive sheet according to one embodiment of the present invention. 2 is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention.

10:基材 10: Substrate

20:黏著劑層 20: Adhesive layer

100:黏著片材 100: Adhesive sheet

Claims (15)

一種電子零件轉印用黏著片材, 其具備基材、及配置於該基材之至少單側之黏著劑層, 該黏著劑層於照射460 mJ/cm 2之紫外線後之25℃下之奈米壓痕儀彈性模數為500 MPa以下。 An adhesive sheet for transferring electronic parts, comprising a base material and an adhesive layer disposed on at least one side of the base material, the adhesive layer being irradiated with ultraviolet rays of 460 mJ/cm 2 at 25° C. The elastic modulus of the meter indenter is below 500 MPa. 如請求項1之電子零件轉印用黏著片材,其中上述黏著片材之使用TMA獲得之40℃環境下之下沉量為3 μm~27 μm。The adhesive sheet for electronic parts transfer according to claim 1, wherein the amount of sinking of the above-mentioned adhesive sheet obtained by using TMA in a 40°C environment is 3 μm to 27 μm. 如請求項1或2之電子零件轉印用黏著片材,其中上述黏著劑層之厚度為2.1 μm~35 μm。The adhesive sheet for electronic parts transfer according to claim 1 or 2, wherein the thickness of the above-mentioned adhesive layer is 2.1 μm to 35 μm. 如請求項1至3中任一項之電子零件轉印用黏著片材,其中上述黏著劑層之25℃下之常態奈米壓痕儀彈性模數為0.4 MPa以上。The adhesive sheet for transfer of electronic parts according to any one of claims 1 to 3, wherein the elastic modulus of the adhesive layer at 25° C. under a normal state nanoindenter is 0.4 MPa or more. 如請求項1至4中任一項之電子零件轉印用黏著片材,其中上述黏著劑層之常態探針黏性值為8 N/cm 2以上。 The adhesive sheet for electronic parts transfer according to any one of claims 1 to 4, wherein the normal probe viscosity value of the adhesive layer is 8 N/cm 2 or more. 如請求項1至5中任一項之電子零件轉印用黏著片材,其中上述基材包含聚酯系樹脂。The adhesive sheet for electronic component transfer according to any one of claims 1 to 5, wherein the base material comprises a polyester-based resin. 如請求項1至6中任一項之電子零件轉印用黏著片材,其中上述基材之厚度為30 μm~200 μm。The adhesive sheet for electronic parts transfer according to any one of claims 1 to 6, wherein the thickness of the substrate is 30 μm to 200 μm. 如請求項1至7中任一項之電子零件轉印用黏著片材,其中上述電子零件為迷你LED或微型LED。The adhesive sheet for transferring electronic parts according to any one of claims 1 to 7, wherein the electronic parts are mini LEDs or micro LEDs. 如請求項1至8中任一項之電子零件轉印用黏著片材,其依序具備上述黏著劑層、上述基材及另一黏著劑層。The adhesive sheet for electronic component transfer according to any one of claims 1 to 8, comprising the above-mentioned adhesive layer, the above-mentioned base material, and another adhesive layer in this order. 一種電子零件之加工方法,其係使用如請求項1至9中任一項之電子零件轉印用黏著片材者, 且包括: 步驟a,其將配置於第1構件之電子零件轉印至上述黏著片材之上述黏著劑層上;及 步驟b,其藉由第2構件拾取該電子零件,將該電子零件自該黏著片材剝離。 A processing method of electronic parts using the adhesive sheet for electronic parts transfer according to any one of claims 1 to 9, and includes: Step a, which transfers the electronic parts arranged on the first member to the above-mentioned adhesive layer of the above-mentioned adhesive sheet; and In step b, the electronic component is picked up by the second member, and the electronic component is peeled off from the adhesive sheet. 如請求項10之電子零件之加工方法,其中上述電子零件為迷你LED或微型LED。The processing method of electronic parts according to claim 10, wherein the electronic parts are mini LEDs or micro LEDs. 如請求項10或11之電子零件之加工方法,其中 上述步驟b包括: 步驟b-1,其使上述第2構件接觸上述黏著劑層上之上述電子零件; 步驟b-2,其對上述黏著片材照射活性能量線;及 步驟b-3,其藉由該第2構件拾取該電子零件,將該電子零件自該黏著片材剝離。 The processing method of electronic parts as claimed in claim 10 or 11, wherein The above step b includes: Step b-1, which makes the second member contact the electronic component on the adhesive layer; Step b-2, which irradiates the above-mentioned adhesive sheet with active energy rays; and In step b-3, the electronic component is picked up by the second member, and the electronic component is peeled off from the adhesive sheet. 如請求項11或12之電子零件之加工方法,其中上述第1構件為藍寶石基板。The processing method of an electronic part according to claim 11 or 12, wherein the first member is a sapphire substrate. 如請求項13之電子零件之加工方法,其中上述電子零件為微型LED, 於上述步驟a中,包括對配置有複數個微型LED之上述藍寶石基板照射UV雷射光,將該微型LED轉印至上述黏著片材。 The processing method of electronic parts as claimed in claim 13, wherein the electronic parts are micro LEDs, In the above-mentioned step a, including irradiating UV laser light to the above-mentioned sapphire substrate configured with a plurality of micro-LEDs, and transferring the micro-LEDs to the above-mentioned adhesive sheet. 如請求項14之電子零件之加工方法,其中將配置於上述藍寶石基板之上述微型LED之一部分選擇性地轉印至上述黏著片材。The processing method of electronic parts according to claim 14, wherein a part of the micro LEDs arranged on the sapphire substrate is selectively transferred to the adhesive sheet.
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