TW202229878A - Contact probe - Google Patents

Contact probe Download PDF

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Publication number
TW202229878A
TW202229878A TW110129583A TW110129583A TW202229878A TW 202229878 A TW202229878 A TW 202229878A TW 110129583 A TW110129583 A TW 110129583A TW 110129583 A TW110129583 A TW 110129583A TW 202229878 A TW202229878 A TW 202229878A
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Taiwan
Prior art keywords
contact
measured
metal conductor
contact probe
probe
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TW110129583A
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Chinese (zh)
Inventor
小路遼太
深澤雅章
小澤卓彌
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日商東京特殊電線股份有限公司
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Publication of TW202229878A publication Critical patent/TW202229878A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733Geometry aspects
    • G01R1/06738Geometry aspects related to tip portion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06716Elastic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06755Material aspects
    • G01R1/06761Material aspects related to layers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2896Testing of IC packages; Test features related to IC packages

Abstract

The present invention addresses the problem of providing a contact probe, the tip part of which can reliably contact an inspection point on a body to be measured, and which can be configured so as not to cut or damage the inspection point of the body to be measured. The problem is solved by a contact probe (10) having a body part (14) having an insulating film (12) on the outer periphery of a metal conductor (11), and end parts (16) which are formed at both ends of the metal conductor (11) and which do not have the insulating film (12), the contact probe (10) being bent by application of a load thereto in the axial direction, and thereby obtaining a contact pressure with respect to a body (20) to be measured and measuring an electrical characteristic thereof, wherein the surface shape of at least the end part (16) on the side contacting the body (20) to be measured from among the end parts (16) is curved, and R is in the range of more than 0.5D and no more than 5D, where R is the curvature radius of the curved surface, and D is the diameter of the metal conductor (11).

Description

接觸探針touch probe

本發明係關於一種接觸探針,其使用於電子零件及基板等之電氣特性的檢查。The present invention relates to a contact probe used for inspection of electrical characteristics of electronic components, substrates, and the like.

近年來,使用有用於智慧型手機及攜帶電話等之高密度安裝基板、或組入個人電腦等的BGA(Ball Grid Array)及CSP(Chip Size Package)等IC封裝基板等各種之電路基板。 這些電路基板於安裝前後之步驟中被進行例如直流電阻值之測定及導通檢查等,以檢查其電氣特性的良否。 In recent years, various circuit boards have been used, such as high-density mounting boards for smartphones and mobile phones, and IC package boards such as BGA (Ball Grid Array) and CSP (Chip Size Package) incorporated into personal computers. These circuit boards are subjected to, for example, DC resistance value measurement and continuity inspection in the steps before and after installation to check whether the electrical characteristics are good or not.

例如,如專利文獻1所示,電氣特性之良否的檢查,係使用連接於檢查裝置之檢查裝置用治具(以下,有時可稱為探針單元)進行。 具體而言,藉由使安裝於探針單元之前端的針形(pin-shape)接觸探針之前端接觸於作為測定對象的電路基板(以下,有時可稱為被測定體)的電極(以下,有時可稱為檢查點)而進行。 For example, as shown in Patent Document 1, the inspection of electrical characteristics is performed using an inspection device jig (hereinafter, may be referred to as a probe unit) connected to the inspection device. Specifically, the tip of the probe is brought into contact with an electrode (hereinafter, may be referred to as a measurement object) of a circuit board (hereinafter, may be referred to as a measurement object) by contacting a pin-shaped (pin-shaped) tip attached to the tip of the probe unit. , sometimes referred to as checkpoints).

於專利文獻2中,記載有接觸探針之前端部的形狀可適宜選擇半球形、圓錐形、前端具有半球形的圓錐形、前端具有平坦形狀之圓錐形中的任一種形狀。In Patent Document 2, it is described that the shape of the distal end portion of the contact probe can be suitably selected from any of a hemispherical shape, a conical shape, a conical shape with a hemispherical tip, and a conical shape with a flat tip.

於專利文獻3中,記載有接觸探針之前端部的形狀為平坦形狀者。 [先前技術文獻] [專利文獻] In Patent Document 3, it is described that the shape of the front end portion of the contact probe is a flat shape. [Prior Art Literature] [Patent Literature]

專利文獻1:日本特開2002-131334號公報 專利文獻2:日本特開2007-322369號公報 專利文獻3:日本特開2013-024716號公報 Patent Document 1: Japanese Patent Laid-Open No. 2002-131334 Patent Document 2: Japanese Patent Laid-Open No. 2007-322369 Patent Document 3: Japanese Patent Laid-Open No. 2013-024716

[發明欲解決之課題][The problem to be solved by the invention]

誠如前述專利文獻1及專利文獻2之記載,若接觸探針之前端部的形狀為半球形,則接觸探針之前端部會自被測定體的檢查點過分滑動,以致於接觸探針之前端部不接觸檢查點,從而可能無法進行正確的檢查。As described in Patent Document 1 and Patent Document 2, if the shape of the front end of the touch probe is hemispherical, the front end of the touch probe may slide too much from the inspection point of the object to be measured, so that the The front end does not touch the inspection point, so correct inspection may not be possible.

此外,如專利文獻2之記載,於接觸探針之前端部的形狀為圓錐形、前端具有半球形的圓錐形、前端具有平坦形狀的圓錐形的情況下,由於與被測定體之檢查點的接觸面積變小,因此,隨著近年來電極之狹間距化趨勢,而可能變得難以使接觸探針之前端部接觸於各檢查點進行檢查。In addition, as described in Patent Document 2, when the tip of the touch probe has a conical shape, a hemispherical tip has a conical shape, and a tip has a flat conical shape, due to the difference with the inspection point of the object to be measured Since the contact area becomes smaller, it may become difficult to make the front end of the contact probe come into contact with each inspection point for inspection due to the trend of narrowing the electrode pitch in recent years.

此外,如專利文獻3之記載,於接觸探針之前端部的形狀為平坦形狀之情況下,雖然可充分確保與被測定體之檢查點的接觸面積,但由於在接觸探針之前端部產生有直角之邊緣部,因此於該邊緣部與檢查點接觸之情況下,可能將檢查點削除或劃傷。In addition, as described in Patent Document 3, when the shape of the tip of the touch probe is a flat shape, although the contact area with the inspection point of the object to be measured can be sufficiently ensured, since the tip of the touch probe is generated There is a right-angled edge, so when the edge is in contact with the inspection point, the inspection point may be cut off or scratched.

爰此,本發明係為了解決前述課題而完成,其目的在於提供一種接觸探針,其可將接觸探針之前端部確實地接觸於被測定體的檢查點,且可緩減對被測定體之檢查點造成的削傷或劃傷。 [用以解決課題之手段] Therefore, the present invention has been made in order to solve the above-mentioned problems, and an object thereof is to provide a touch probe capable of reliably contacting the distal end of the touch probe with an inspection point of a to-be-measured body, and to reduce the need for the measurement of the body-to-be-measured body. Cuts or scratches caused by the inspection points. [means to solve the problem]

根據本發明之接觸探針,一種接觸探針,係具有:本體部,其於針狀之金屬導體的外周具有絕緣被膜;及端部,其形成於前述金屬導體之兩端且不具有前述絕緣被膜,且藉由朝軸線方向施加負載使之彎曲,獲得對被測定體的接觸壓力以測定電氣特性,其特徵在於:前述端部中之至少與被測定體接觸之側的端部的形狀係曲面,當將該曲面的曲率半徑設為R,且將前述金屬導體的直徑設為D時,R係在大於0.5D且為5D以下的範圍內。 藉由採用此構成,由於可將與被測定體接觸之端部作成大致接近平坦形狀的曲面,因此於接觸被測定體的檢查點時不會過分滑動,此外,由於邊緣部並非直角,因此可與檢查點面接觸,可保護檢查點不被削傷或劃傷。 A contact probe according to the present invention is a contact probe comprising: a main body part having an insulating coating on the outer periphery of a needle-shaped metal conductor; and an end part formed on both ends of the metal conductor and not having the insulation The film is bent by applying a load in the axial direction to obtain a contact pressure on the object to be measured to measure electrical characteristics, wherein the shape of at least one of the ends on the side that is in contact with the object to be measured is a As for the curved surface, when R is the radius of curvature of the curved surface and D is the diameter of the metal conductor, R is in the range of more than 0.5D and 5D or less. By adopting this configuration, since the end portion in contact with the object to be measured can be formed into a substantially flat curved surface, it does not slip excessively when it contacts the inspection point of the object to be measured. In addition, since the edge portion is not a right angle, it is possible to In contact with the inspection point surface, it protects the inspection point from being chipped or scratched.

此外,其特徵在於:前述曲率半徑R也可為D以上。In addition, it is characterized in that the curvature radius R may be greater than or equal to D.

此外,其特徵在於:前述金屬導體之直徑,也可為8μm以上且為180μm以下。 [發明之效果] Moreover, it is characterized in that the diameter of the said metal conductor may be 8 micrometers or more and 180 micrometers or less. [Effect of invention]

根據本發明,可提供一種可確實地接觸被測定體的檢查點,且不會削傷或劃傷被測定體之檢查點的接觸探針。According to the present invention, it is possible to provide a touch probe capable of reliably touching the inspection point of the object to be measured, and without chipping or scratching the inspection point of the object to be measured.

[用以實施發明的形態][Form for carrying out the invention]

以下,根據圖式對本發明之接觸探針之實施形態詳細地進行說明。 圖1為接觸探針之示意俯視圖,圖2為使用接觸探針執行被測定體之電氣特性等檢查時的說明圖。 Hereinafter, embodiments of the contact probe of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic plan view of the contact probe, and FIG. 2 is an explanatory view when the contact probe is used to perform an inspection of the electrical characteristics of an object to be measured.

接觸探針10,係由截面圓形的極細之圓柱狀(針狀)的金屬導體11構成,且具有本體部14,該具有本體部14係於金屬導體11之外周具有絕緣被膜12。於金屬導體11之兩端形成有不具絕緣被膜12之端部16。 接觸探針10係以藉由朝軸線方向施加負載使之彎曲,獲得對被測定體的接觸壓力以檢查電氣特性之方式構成。 The contact probe 10 is composed of an extremely thin cylindrical (needle-shaped) metal conductor 11 with a circular cross section, and has a body portion 14 having an insulating coating 12 on the outer periphery of the metal conductor 11 . End portions 16 without the insulating coating 12 are formed at both ends of the metal conductor 11 . The contact probe 10 is configured so as to obtain a contact pressure on the object to be measured by applying a load in the axial direction to bend it, and to check the electrical characteristics.

(使用接觸探針之電氣特性的檢查方法) 根據圖2對接觸探針之使用態樣進行說明。 在此所示的例中,將IC封裝基板等作為被測定體20,將形成於被測定體20之表面的複數個電極作為檢查點22,且使接觸探針10之端部16接觸於該檢查點22。 (Inspection method for electrical characteristics using contact probes) The use of the contact probe will be described with reference to FIG. 2 . In the example shown here, an IC package substrate or the like is used as the object to be measured 20 , a plurality of electrodes formed on the surface of the object to be measured 20 are used as inspection points 22 , and the ends 16 of the contact probes 10 are brought into contact with the object to be measured 20 . Checkpoint 22.

檢查用之治具即探針單元30,具有複數個接觸探針10。 探針單元30具有保持複數個接觸探針10之上端部的上板32、及導引接觸探針10之下端部的下板,上板32與下板34之間係藉由支撐柱36支撐。 於下板34形成有孔徑略大於接觸探針10之下端部的導引孔,接觸探針10之下端部可於導引孔內沿軸向移動。 此外,於上板32配置有與複數個接觸探針10之各上端部電性連接的複數條引線37。複數條引線37連接於測定機(未圖示)或電源(未圖示)。 The probe unit 30 , which is a jig for inspection, has a plurality of contact probes 10 . The probe unit 30 has an upper plate 32 for holding the upper ends of a plurality of contact probes 10 , and a lower plate for guiding the lower ends of the contact probes 10 . The upper plate 32 and the lower plate 34 are supported by a support column 36 . . A guide hole with a diameter slightly larger than that of the lower end of the contact probe 10 is formed in the lower plate 34 , and the lower end of the contact probe 10 can move axially in the guide hole. In addition, a plurality of lead wires 37 are arranged on the upper plate 32 to be electrically connected to the respective upper end portions of the plurality of contact probes 10 . The plurality of lead wires 37 are connected to a measuring machine (not shown) or a power source (not shown).

如圖2之右圖所示,於被測定體20之上方,以各接觸探針10之下端部與被測定體20之各檢查點22的位置對向之方式配置探針單元30。 並且,以使各接觸探針10之下端部接觸被測定體20之各檢查點22之方式使探針單元30下降,並且,如圖2之右圖所示,自上方朝下方對探針單元30進行加壓。 於是,沿著接觸探針10之軸線方向施加負載而使接觸探針10彎曲。此時,接觸探針10之端部16,係以因接觸探針10彎曲而產生的彈性力所形成之既定接觸壓力與檢查點22接觸。 As shown in the right diagram of FIG. 2 , above the object to be measured 20 , the probe unit 30 is arranged so that the lower end of each contact probe 10 faces the position of each inspection point 22 of the object to be measured 20 . Then, the probe unit 30 is lowered so that the lower ends of the contact probes 10 come into contact with the inspection points 22 of the object 20 to be measured, and, as shown in the right diagram of FIG. 30 is pressurized. Then, a load is applied along the axial direction of the contact probe 10 to bend the contact probe 10 . At this time, the end portion 16 of the contact probe 10 is in contact with the inspection point 22 with a predetermined contact pressure formed by the elastic force generated by the bending of the contact probe 10 .

(金屬導體) 作為金屬導體11,採用具有高導電性及高彈性模量的金屬線(也稱為金屬彈簧線)。作為使用於金屬導體11之金屬材料,可適宜地使用鎢、錸鎢、鈹銅等銅合金、鈀合金、銅銀合金等。 (metal conductor) As the metal conductor 11, a metal wire (also referred to as a metal spring wire) having high conductivity and high elastic modulus is used. As the metal material used for the metal conductor 11 , copper alloys such as tungsten, rhenium tungsten, and beryllium copper, palladium alloys, copper-silver alloys, and the like can be suitably used.

為了抑制金屬導體11與被測定體20之檢查點22或檢測裝置的引線37之接觸電阻值的上升,也可根據需要於金屬導體11之前述金屬材料表面設置鍍敷層。作為形成鍍敷層的金屬,可列舉鎳、金、銠等金屬及金合金等合金。鍍敷層可為單層或多層。作為多層的鍍敷層,較佳為例如於鎳鍍敷層上形成有鍍金層者。鍍敷層之厚度並無特別限制,例如可設定為1μm以上且為5μm以下。In order to suppress an increase in the contact resistance between the metal conductor 11 and the inspection point 22 of the object to be measured 20 or the lead wire 37 of the detection device, a plating layer may be provided on the surface of the metal material of the metal conductor 11 as required. Metals such as nickel, gold, and rhodium, and alloys such as gold alloys are exemplified as the metal forming the plating layer. The plating layer may be a single layer or multiple layers. As a multi-layered plating layer, for example, a gold plating layer is preferably formed on a nickel plating layer. The thickness of the plating layer is not particularly limited, but can be set to, for example, 1 μm or more and 5 μm or less.

根據近年來的狹間距化要求而趨向於細徑化,本實施形態之金屬導體11之導體直徑,可適宜地使用8μm以上且為180μm以下者。並且較佳為,可使用導體直徑為10μm以上且為110μm以下的範圍內者。 金屬導體11係以成為既定直徑之針形導體的方式藉由冷延伸或熱延伸等塑性加工所製造。 The diameter of the metal conductor 11 of the present embodiment tends to be reduced in accordance with the demand for narrowing the pitch in recent years, and the conductor diameter of the metal conductor 11 of the present embodiment can be suitably used to be 8 μm or more and 180 μm or less. In addition, it is preferable to use a conductor whose diameter is within the range of 10 μm or more and 110 μm or less. The metal conductor 11 is manufactured by plastic working such as cold drawing or hot drawing so as to be a needle-shaped conductor of a predetermined diameter.

再者,為了容易將接觸探針10安裝於探針單元30,且不會卡絆於探針單元30之下板34的導引孔內,而不妨礙接觸探針10之運動,較佳為採用直線度高之金屬導體11,具體而言,較佳為,直線度係曲率半徑1000mm以上。 直線度高之金屬導體11,係藉由對設置絕緣被膜12之前的細長金屬線進行直線矯正處理而獲得。直線矯正處理,例如藉由轉模(rotary die)式直線矯正裝置等進行。 Furthermore, in order to easily install the contact probe 10 on the probe unit 30, and not get caught in the guide hole of the lower plate 34 of the probe unit 30, and not hinder the movement of the contact probe 10, preferably The metal conductor 11 with high straightness is used. Specifically, it is preferable that the straightness is a radius of curvature of 1000 mm or more. The metal conductor 11 with high straightness is obtained by straightening the elongated metal wire before the insulating film 12 is provided. The straight-line straightening process is performed by, for example, a rotary die-type straight-line straightening apparatus or the like.

(端部) 金屬導體11之兩端部中的一端部16接觸於被測定體20之檢查點22。 如圖3所示,本實施形態之接觸探針10,係將至少金屬導體11之兩端部中的與被測定體20之檢查點22接觸的端部16的形狀作成曲面。 此外,於將該曲面的曲率半徑設為R,且將金屬導體11之直徑設為D時,可適宜採用R大於0.5D且為5D以下(以下,有時可表現為0.5D<R≦5D)的構成。 惟,作成如上述之條件的曲面,不僅僅於一端部16,而且還可將兩端部形成為如上述之條件的曲面。 (Ends) One end 16 of both ends of the metal conductor 11 is in contact with the inspection point 22 of the object to be measured 20 . As shown in FIG. 3 , in the contact probe 10 of the present embodiment, at least the shape of the end portion 16 of the both end portions of the metal conductor 11 that is in contact with the inspection point 22 of the object to be measured 20 is curved. In addition, when the radius of curvature of the curved surface is R, and the diameter of the metal conductor 11 is D, R may be preferably greater than 0.5D and less than 5D (hereinafter, it may be expressed as 0.5D<R≦5D in some cases) ) composition. However, in order to form a curved surface under the above-mentioned conditions, not only the one end portion 16 but also both end portions can be formed as curved surfaces under the above-mentioned conditions.

藉由將端部16之曲面的曲率半徑R設為0.5D<R≦5D,可將與被測定體20之檢查點22接觸的端部16形成為大致接近平坦形狀的曲面。 因此,當使端部16與被測定體20之檢查點22接觸時不會過分滑動。此外,由於端部16之邊緣部非直角,因此可相對於檢查點22進行面接觸,可抑制削傷或劃傷檢查點22。並且,可充分地確保與檢查點22之接觸面積。 By setting the radius of curvature R of the curved surface of the end portion 16 to be 0.5D<R≦5D, the end portion 16 in contact with the inspection point 22 of the object to be measured 20 can be formed into a curved surface approximately close to a flat shape. Therefore, when the end portion 16 is brought into contact with the inspection point 22 of the object to be measured 20, excessive sliding is prevented. In addition, since the edge portion of the end portion 16 is not at a right angle, surface contact can be made with respect to the inspection point 22, and the inspection point 22 can be prevented from being chipped or scratched. In addition, the contact area with the inspection point 22 can be sufficiently secured.

如上述,若將金屬導體11之直徑設為8μm以上且為180μm以下,則例如於D=8μm的情況下,端部16的曲率半徑R在4μm<R≦40μm的範圍內,於D=180μm的情況下,端部16的曲率半徑R在90μm<R≦900μm的範圍內。As described above, if the diameter of the metal conductor 11 is 8 μm or more and 180 μm or less, for example, when D=8 μm, the curvature radius R of the end portion 16 is in the range of 4 μm<R≦40 μm, and when D=180 μm In the case of , the radius of curvature R of the end portion 16 is in the range of 90 μm<R≦900 μm.

此外,如圖4所示,本實施形態之接觸探針10,可適宜於配置在被測定體20之2個檢查點22之中間的情況下使用。再者,雖然於圖4中圖示了半球形的檢查點22,但檢查點22之形狀不限於如上述的形狀。 於此情況下,端部不會相對於半球形的檢查點22過分滑動,並且可充分確保與檢查點22之接觸面積。此外,由於端部16的邊緣部非直角,因此可與檢查點22面接觸而不會將2個檢查點22削傷或劃傷。 In addition, as shown in FIG. 4, the touch probe 10 of this embodiment can be suitably used when it is arrange|positioned in the middle of the two inspection points 22 of the to-be-measured body 20. In addition, although the hemispherical inspection point 22 is shown in FIG. 4, the shape of the inspection point 22 is not limited to the shape mentioned above. In this case, the end portion does not slide excessively with respect to the hemispherical inspection point 22, and the contact area with the inspection point 22 can be sufficiently secured. In addition, since the edge portion of the end portion 16 is not at a right angle, it can come into surface contact with the inspection point 22 without chipping or scratching the two inspection points 22 .

作為將金屬導體11之端部16形成為前述形狀的方法,係藉由對金屬導體11之端部16進行研磨加工而進行。 研磨加工可藉由使用研磨砂紙、或使用鑽石砂輪而進行。此外,也可使用可研磨針形之金屬材料的公知研磨加工機。 As a method of forming the end portion 16 of the metal conductor 11 into the aforementioned shape, the end portion 16 of the metal conductor 11 is subjected to a grinding process. Grinding can be performed by using abrasive sandpaper, or by using a diamond wheel. In addition, a known grinding machine capable of grinding a needle-shaped metal material can also be used.

(絕緣被膜) 絕緣被膜12只要為具有絕緣性的被膜,則對其材料並無特別限制,但可適宜使用選自聚胺基甲酸酯樹脂、尼龍樹脂、聚酯樹脂、環氧樹脂、聚酯醯亞胺樹脂、聚醯胺樹脂、聚醯胺醯亞胺樹脂等中的1種或2種以上的樹脂材料。 此外,由這些樹脂構成的絕緣被膜12,其耐熱性係根據樹脂的種類而變化,因此可考慮在被測定體20之檢查時產生的熱或周圍環境溫度而任意選擇。 (insulating film) The material of the insulating film 12 is not particularly limited as long as it is an insulating film, and a material selected from the group consisting of polyurethane resin, nylon resin, polyester resin, epoxy resin, polyesterimide can be suitably used One or more resin materials of resin, polyamide resin, polyamide imide resin, etc. In addition, since the heat resistance of the insulating film 12 made of these resins varies depending on the type of resin, it can be arbitrarily selected in consideration of heat generated during inspection of the object to be measured 20 and ambient temperature.

絕緣被膜12之厚度,只要為可確保電氣絕緣性之程度的厚度即可,可考慮與金屬導體11之直徑的關係,於1μm以上且為30μm以下的範圍內適宜地設定。 較佳為,絕緣被膜12,係作為烤漆被膜形成於金屬導體11。由於烤漆被膜係藉由反復之塗料塗佈與烘烤的連續步驟而形成,因此生產性良好,與金屬導體11之間的密接性高,且可進一步提高被膜強度。 The thickness of the insulating film 12 may be a thickness sufficient to ensure electrical insulating properties, and may be appropriately set within a range of 1 μm or more and 30 μm or less in consideration of the relationship with the diameter of the metal conductor 11 . Preferably, the insulating coating 12 is formed on the metal conductor 11 as a baking varnish coating. Since the baking varnish film is formed by repeating the continuous steps of coating and baking, the productivity is good, the adhesion with the metal conductor 11 is high, and the film strength can be further improved.

再者,於本實施形態中,形成有自金屬導體11之各個端部16除去既定長度的絕緣被膜12之區域。除去絕緣被膜12之區域的長度,可根據探針單元30之構造等適宜地設定。In addition, in this embodiment, the area|region which removes the predetermined length of the insulating film 12 from each edge part 16 of the metal conductor 11 is formed. The length of the region from which the insulating film 12 is removed can be appropriately set according to the structure of the probe unit 30 and the like.

(實施例) 於以下的實施例中,作為金屬導體11,係使用細長之錸鎢線(外徑D:0.025mm)。 絕緣被膜12係設為2層構造,第1絕緣被膜,係使用胺基甲酸乙酯樹脂系烤漆塗料作為第1絕緣被膜用塗料,且以1μm的厚度形成第1絕緣被膜。第2絕緣被膜,係使用與第1絕緣被膜相同的烤漆塗料,作為相對於該烤漆塗料100重量份含有顏料(BASF Japan Ltd.製,商品名稱:Irgazin(註冊商標))4重量份的第2絕緣被膜用烤漆塗料,以2.5μm的厚度形成第2絕緣被膜。 (Example) In the following examples, as the metal conductor 11, a long and thin rhenium tungsten wire (outer diameter D: 0.025 mm) was used. The insulating film 12 has a two-layer structure, and the first insulating film is formed with a thickness of 1 μm using a urethane resin-based baking varnish paint as the paint for the first insulating film. For the second insulating coating, the same stoving varnish as the first insulating coating was used, and as the second insulating coating, 4 parts by weight of a pigment (manufactured by BASF Japan Ltd., trade name: Irgazin (registered trademark)) was used with respect to 100 parts by weight of the stoving varnish. The second insulating film was formed with a baking varnish paint for the insulating film with a thickness of 2.5 μm.

使用標準切割機對形成有絕緣被膜12(總厚約為3.5μm)之細長接觸探針進行切割,切割出長度為10mm的附有絕緣被膜的接觸探針,且對附有該絕緣被膜的接觸探針之兩端部的既定長度進行雷射剝離,製作成由圖1所示之態樣構成的接觸探針10。 當藉由研磨加工裝置對金屬導體11進行加工時,藉由適宜調整研磨角度及時間等而調整端部16的形狀。 The slender contact probes formed with the insulating film 12 (total thickness of about 3.5 μm) are cut using a standard cutting machine, and the contact probes with the insulating film having a length of 10 mm are cut out, and the contact probes with the insulating film are cut out. A predetermined length of both ends of the probe is subjected to laser lift-off to produce a contact probe 10 having the aspect shown in FIG. 1 . When the metal conductor 11 is processed by the polishing device, the shape of the end portion 16 is adjusted by appropriately adjusting the polishing angle, time, and the like.

並且,於將絕緣被膜12剝離而露出的金屬導體11之表面,藉由鍍敷設置厚度為1μm的鎳鍍敷層後,再於其上面設置厚度為0.2μm的金鍍敷層,形成總厚度為1.2μm的鍍敷層。Then, on the surface of the metal conductor 11 exposed by peeling off the insulating film 12, a nickel plated layer with a thickness of 1 μm is provided by plating, and then a gold plated layer with a thickness of 0.2 μm is provided on the surface to form a total thickness of It is a plated layer of 1.2 μm.

圖5顯示於變更了前述實施例之接觸探針10之端部16的曲面之曲率半徑R的情況下之、進行了端部16的相對於檢查點22的滑動、檢查點22之損傷之評價後的結果。再者,於本實施例中,金屬導體11之直徑D恆定。 再者,對作為比較例1之端部的曲率半徑R為0.5D的情況、作為比較例2之端部為平坦形狀的情況、及作為比較例3之端部為銳角的情況進行了評價。 5 shows the evaluation of the sliding of the end portion 16 relative to the inspection point 22 and the evaluation of the damage to the inspection point 22 in the case where the curvature radius R of the curved surface of the end portion 16 of the touch probe 10 of the above-mentioned embodiment is changed the result after. Furthermore, in this embodiment, the diameter D of the metal conductor 11 is constant. Furthermore, the case where the radius of curvature R of the end portion as Comparative Example 1 was 0.5D, the case where the end portion was flat as Comparative Example 2, and the case where the end portion was acute-angled as Comparative Example 3 were evaluated.

順帶言之,圖6圖示有圖5之實施例及比較例中之接觸探針10的端部形狀的概略。 圖6A中,端部為曲面。 圖6B中,端部為平坦形狀。 圖6C中,端部為銳角。 Incidentally, FIG. 6 shows an outline of the shape of the end portion of the contact probe 10 in the embodiment and the comparative example of FIG. 5 . In Fig. 6A, the end portion is a curved surface. In Fig. 6B, the end portion has a flat shape. In Fig. 6C, the end portion is an acute angle.

滑動評價的方法,對接觸探針10之端部16與被測定體20進行了10000次接觸試驗,其中,對於產生滑動之次數為9次以下之情況採用評價A,對於產生滑動之次數為10次以上且為99次以下之情況採用評價B,對於產生滑動之次數為100次以上之情況採用評價C。For the method of sliding evaluation, 10,000 contact tests were performed between the end portion 16 of the contact probe 10 and the object to be measured 20, and the evaluation A was used when the number of times of occurrence of sliding was 9 or less, and the number of times of occurrence of sliding was 10. When the number of times of slippage was more than 99 times, evaluation B was used, and when the number of times of slipping was 100 times or more, evaluation C was used.

損傷評價方法,對接觸探針10之端部16與被測定體20進行了10000次接觸試驗,其中,對於無損傷的情況採用評價A,對於具有損傷的情況採用評價B。In the damage evaluation method, the contact test was performed 10,000 times between the end portion 16 of the contact probe 10 and the object to be measured 20, and the evaluation A was used for the case of no damage, and the evaluation B was used for the case of damage.

以下,對各實施例進行說明。 實施例1之端部,R=5D,對應模型為圖6A。實施例1之滑動評價為A,損傷評價為A。 Hereinafter, each Example will be described. For the end of Example 1, R=5D, and the corresponding model is shown in Figure 6A. The slip evaluation of Example 1 was A, and the damage evaluation was A.

實施例2之端部,R=4D,對應模型為圖6A。實施例2之滑動評價為A,損傷評價為A。For the end of Example 2, R=4D, and the corresponding model is shown in Figure 6A. The slip evaluation of Example 2 was A, and the damage evaluation was A.

實施例3之端部,R=3D,對應模型為圖6A。實施例3之滑動評價為A,損傷評價為A。For the end of Example 3, R=3D, the corresponding model is shown in FIG. 6A . The slip evaluation of Example 3 was A, and the damage evaluation was A.

實施例4之端部,R=2D,對應模型為圖6A。實施例4之滑動評價為A,損傷評價為A。For the end of Example 4, R=2D, the corresponding model is shown in Figure 6A. The slip evaluation of Example 4 was A, and the damage evaluation was A.

實施例5之端部,R=1.5D,對應模型為圖6A。實施例5之滑動評價為A,損傷評價為A。For the end of Example 5, R=1.5D, and the corresponding model is shown in Figure 6A. The slip evaluation of Example 5 was A, and the damage evaluation was A.

實施例6之端部,R=D,對應模型為圖6A。實施例6之滑動評價為A,損傷評價為A。The end of Example 6, R=D, corresponds to the model shown in Figure 6A. The slip evaluation of Example 6 was A, and the damage evaluation was A.

實施例7之端部,R=0.9D,對應模型為圖6A。實施例7之滑動評價為B,損傷評價為A。For the end of Example 7, R=0.9D, and the corresponding model is shown in Figure 6A. The slip evaluation of Example 7 was B, and the damage evaluation was A.

實施例8之端部,R=0.7D,對應模型為圖6A。實施例8之滑動評價為B,損傷評價為A。For the end of Example 8, R=0.7D, and the corresponding model is shown in Figure 6A. The slip evaluation of Example 8 was B, and the damage evaluation was A.

再者,比較例1之端部,R=0.5D,形狀雖然與實施例1〜實施例8相同,但曲率半徑形成為大於實施例1〜8。比較例1之滑動評價為C,損傷評價為A。Furthermore, the end portion of Comparative Example 1, R=0.5D, has the same shape as that of Examples 1 to 8, but the radius of curvature is formed to be larger than that of Examples 1 to 8. The slip evaluation of Comparative Example 1 was C, and the damage evaluation was A.

比較例2之端部係平坦形狀,對應模型為圖6B。比較例2之滑動評價為A,損傷評價為B。The end portion of Comparative Example 2 is a flat shape, and the corresponding model is shown in FIG. 6B . The slip evaluation of Comparative Example 2 was A, and the damage evaluation was B.

比較例3之端部係前端尖銳的銳角,對應模型為圖6C。比較例3之滑動評價為A,損傷評價為B。The end of Comparative Example 3 is an acute angle with a sharp front end, and the corresponding model is shown in FIG. 6C . The slip evaluation of Comparative Example 3 was A, and the damage evaluation was B.

由圖5之結果判明,於如比較例1那樣接觸探針10之端部為曲面,且其曲率半徑R為R≦0.5D之情況下容易滑動,因此滑動評價變差。 此外,若如比較例2那樣接觸探針之端部為平坦形狀,雖然滑動評價無問題,但會出現損傷。 並且,若如比較例3那樣接觸探針之端部為銳角,雖然滑動評價無問題,但會出現損傷。 因此,可以判明於接觸探針10之端部為曲面,且其曲率半徑R為0.5D<R≦5D之情況下,變得不易滑動,且也不會損傷,故而較佳。 5 , as in Comparative Example 1, it was found that the end of the contact probe 10 is a curved surface and the radius of curvature R is R≦0.5D, which is easy to slide, and the sliding evaluation deteriorates. In addition, if the end portion of the contact probe is in a flat shape as in Comparative Example 2, there is no problem in sliding evaluation, but damage occurs. In addition, if the end portion of the contact probe is at an acute angle as in Comparative Example 3, there is no problem in sliding evaluation, but damage occurs. Therefore, it can be found that when the end portion of the contact probe 10 is a curved surface and the radius of curvature R is 0.5D<R≦5D, it becomes difficult to slide and is not damaged, which is preferable.

再者,實施例1〜6的滑動評價及損傷評價雙方皆為A。因此,如實施例1〜6所示,還判明D≦R≦5D之R的範圍更優異。In addition, both the sliding evaluation and the damage evaluation of Examples 1 to 6 were A. Therefore, as shown in Examples 1 to 6, it was also found that the range of R of D≦R≦5D is more excellent.

10:接觸探針 11:金屬導體 12:絕緣被膜 14:本體部 16:端部 20:被測定體 22:檢查點 30:探針單元 32:上板 34:下板 36:支撐柱 37:引線 10: Contact Probe 11: Metal conductor 12: Insulating film 14: Main body 16: End 20: Object to be measured 22: Checkpoint 30: Probe unit 32: Upper board 34: Lower board 36: Support column 37: Leads

圖1為接觸探針之示意俯視圖。 圖2為顯示接觸探針之使用態樣的說明圖。 圖3為接觸探針之端部的放大圖。 圖4為顯示接觸探針之端部接觸於2個檢查點時的說明圖。 圖5為將變更端部之形狀且實施滑動試驗及損傷試驗的情況下之結果匯總後的表。 圖6A〜圖6C為顯示於圖5之表中對應的端部形狀的說明圖。 FIG. 1 is a schematic top view of a contact probe. FIG. 2 is an explanatory diagram showing a usage aspect of the contact probe. Figure 3 is an enlarged view of the end of the contact probe. FIG. 4 is an explanatory diagram showing a case where the ends of the contact probes are in contact with two inspection points. FIG. 5 is a table in which the results of the sliding test and the damage test were carried out by changing the shape of the end portion. 6A to 6C are explanatory diagrams showing the corresponding end shapes in the table of FIG. 5 .

16:端部 16: End

D:金屬導體的直徑 D: the diameter of the metal conductor

R:曲率半徑 R: radius of curvature

Claims (3)

一種接觸探針,係具有:本體部,其於針狀之金屬導體的外周具有絕緣被膜;及端部,其形成於前述金屬導體之兩端且不具有前述絕緣被膜,藉由朝軸線方向施加負載使之彎曲,獲得對被測定體的接觸壓力以測定電氣特性,該接觸探針之特徵在於:前述端部中之至少與被測定體接觸的側之端部的形狀係曲面,當將該曲面的曲率半徑設為R,且將前述金屬導體的直徑設為D時,R係在大於0.5D且為5D以下。A contact probe comprising: a main body part having an insulating coating on the outer periphery of a needle-shaped metal conductor; and an end part, which is formed on both ends of the metal conductor and does not have the insulating coating, by applying an insulating coating in an axial direction It is bent under load to obtain a contact pressure on the object to be measured, and electrical characteristics are measured. The contact probe is characterized in that the shape of at least one of the end portions on the side that is in contact with the object to be measured is a curved surface. When the radius of curvature of the curved surface is R and the diameter of the metal conductor is D, R is greater than 0.5D and 5D or less. 如請求項1之接觸探針,其中前述曲率半徑R為D以上。The contact probe of claim 1, wherein the curvature radius R is greater than or equal to D. 如請求項1或2之接觸探針,其中前述金屬導體之直徑為8μm以上且為180μm以下。The contact probe according to claim 1 or 2, wherein the diameter of the metal conductor is 8 μm or more and 180 μm or less.
TW110129583A 2020-10-05 2021-08-11 Contact probe TW202229878A (en)

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JPH08166407A (en) * 1994-10-14 1996-06-25 Kobe Steel Ltd Probe card for semiconductor element check
JP2002131334A (en) 2000-10-24 2002-05-09 Nec Yamaguchi Ltd Probe needle, probe card, and manufacturing method of probe card
JP2007322369A (en) * 2006-06-05 2007-12-13 Totoku Electric Co Ltd Contact probe and its manufacturing method
JP5027522B2 (en) * 2007-02-09 2012-09-19 東京特殊電線株式会社 Probe unit and method of using a contact probe using the probe unit
JP4539681B2 (en) * 2007-06-04 2010-09-08 三菱電機株式会社 Probe card for wafer test
JP5144997B2 (en) * 2007-09-21 2013-02-13 東京特殊電線株式会社 Contact probe unit and manufacturing method thereof
JP5845678B2 (en) 2011-07-21 2016-01-20 日本電産リード株式会社 Inspection contact and inspection jig

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