TW202226435A - Holding method and holding device capable of reducing unnecessary power consumption during processing - Google Patents

Holding method and holding device capable of reducing unnecessary power consumption during processing Download PDF

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Publication number
TW202226435A
TW202226435A TW110143507A TW110143507A TW202226435A TW 202226435 A TW202226435 A TW 202226435A TW 110143507 A TW110143507 A TW 110143507A TW 110143507 A TW110143507 A TW 110143507A TW 202226435 A TW202226435 A TW 202226435A
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Taiwan
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holding
fluid
support surface
hardening
water
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TW110143507A
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Chinese (zh)
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山田忠知
毛受利彰
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日商琳得科股份有限公司
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Publication of TW202226435A publication Critical patent/TW202226435A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/10Arrangements for cooling or lubricating tools or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q11/00Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
    • B23Q11/12Arrangements for cooling or lubricating parts of the machine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • B24B55/03Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant

Abstract

The invention provides a holding method, which includes: a supporting step for supporting the holding target object (WK) from one surface (WK1) side of the holding target object (WK) using the supporting surface (12A); a fluid supply step for supplying the fluid (WT) to the supporting surface (12A) during the front-end or back-end of the supporting step; and, a curing step for performing a curing process for curing the fluid (WT) to cure the fluid (WT) for holding the holding target object (WK) using the supporting surface (12A). In which, the curing step performs the curing process for the fluid (WT) from the side of the holding target object (WK) supported on the supporting surface (12A) by the fluid (WT).

Description

保持方法以及保持裝置Holding method and holding device

本發明係關於:保持方法以及保持裝置。The present invention relates to a holding method and a holding device.

將保持對象物利用支承面來予以保持之保持方法已為習知(請參照例如:文獻1的日本特開2011-096929號公報)。 文獻1所記載的半導體元件之製造方法(保持方法),是對於被供給到暫時載置台3的上表面(支承面)的液體50 (流體),從支承面側實施使其凍結(使其硬化)的冷卻處理(硬化處理),以利用支承面來保持住半導體元件晶片1A (保持對象物),因此,必須對於每一個具有暫時載置台3這一類的支承面之構件都實施硬化處理,因而會有導致能源(電力)之無謂的消耗之問題。 A holding method of holding a holding object by a support surface is known (see, for example, Japanese Patent Laid-Open No. 2011-096929 of Document 1). The manufacturing method (holding method) of a semiconductor element described in Document 1 is to freeze (harden) the liquid 50 (fluid) supplied to the upper surface (support surface) of the temporary mounting table 3 from the support surface side. ) cooling treatment (hardening treatment) to hold the semiconductor element wafer 1A (holding object) by the support surface, therefore, it is necessary to perform the hardening treatment for each member having a support surface such as the temporary mounting table 3, so There is a problem of unnecessary consumption of energy (electricity).

本發明之目的,係在於提供:能夠極力地降低能源(電力)之無謂的消耗之保持方法以及保持裝置。 本發明是採用了如請求項所記載的構成內容。 根據本發明,是從藉由流體而被支承在支承面上的保持對象物側來對於該流體實施硬化處理,因此,可以不必對於每一個具有支承面的構件都實施硬化處理,所以能夠極力地降低能源(電力)之無謂的消耗。 此外,只要預先實施流體前處理工序的話,就能夠縮短以支承面來支承保持對象物之後的流體硬化時間。 An object of the present invention is to provide a holding method and a holding device capable of reducing wasteful consumption of energy (electricity) as much as possible. The present invention employs the constitution described in the claims. According to the present invention, the fluid is hardened from the side of the object to be held that is supported on the support surface by the fluid. Therefore, it is not necessary to perform the hardening process on every member having the support surface, so it is possible to maximize the Reduce unnecessary consumption of energy (electricity). In addition, if the fluid pretreatment step is performed in advance, the fluid hardening time after the object is supported and held by the support surface can be shortened.

以下,將佐以圖面來說明本發明之其中一種實施方式。 此外,本實施方式中的X軸、Y軸、Z軸,分別都是處於彼此正交(垂直交叉)的關係,X軸及Y軸是在既定平面內的軸,而Z軸是與前述既定的平面正交的軸。再者,本實施方式是以從與Y軸保持平行之圖1A~圖1E的眼前方向來觀看時當作基準,在表示方向時,Z軸的箭頭方向是表示「上」,其相反方向是表示「下」,X軸的箭頭方向是表示「左」,其相反方向是表示「右」,Y軸的箭頭方向是表示「前」,其相反方向是表示「後」。 本發明的保持裝置EA,係具備:利用支承面12A從保持對象物WK的其中一面WK1側來支承該保持對象物WK之支承手段10;將作為流體的水WT供給到支承面12A之流體供給手段20;用來實施作為使水WT硬化也就是使其凍結的硬化處理之冷卻處理,而使該水WT凍結以利用支承面12A來保持住保持對象物WK之硬化手段30。 此外,保持對象物WK是由母材WKB所形成的,在該母材WKB(保持對象物WK)之另外一面WK2,張貼著黏合膜片AS,因而形成為一體物UP。 在本實施方式的情況下,保持裝置EA是被配置在:將黏合膜片AS從保持對象物WK剝離之剝離手段40、以及對於黏合膜片AS施加張力而從該母材WKB形成出複數個隔著既定的間隔的保持對象物WK之分開手段50的近旁。 支承手段10係具備:作為驅動機器之直動馬達(也就是直線作動馬達)11、以及被支承在直動馬達11的輸出軸11A,且具有支承面12A之作為支承構件的平台12。 平台12係具備:與設在上表面的凹部12B連通之流路12C、以及被配置在凹部12B內,且其上表面被當作支承面12A之由樹脂、金屬等所構成之多孔質構件12D。 在支承面12A上,係如圖1A中標註AA的部分所示般地,係將具有疏水性的疏水部12E予以形成格子狀,並且利用該疏水部12E來區劃出親水部12F。疏水部12E,係在支承面12A上所形成格子狀的凹溝的內面配置了樹脂、金屬等之具有撥水性(不吸水性)的構件而形成的。親水部12F,則是利用粗面加工、噴砂加工等之粗面處理,來予以實施形成粗糙表面之粗面處理。 流體供給手段20係具備:用來收容水WT之水槽21;加壓泵浦或渦輪等之加壓手段22;減壓泵浦或真空噴射器等之減壓手段23;用來切換加壓手段22及減壓手段23對於水槽21的連通狀態之切換閥24;以及經由配管25A來與流路12C相連接,並且用來切換與水槽21相連接之加壓側配管21A及減壓側配管21B的連通狀態之切換閥25。 硬化手段30係具備:由複數個臂部所構成,且被當作:在其作業範圍內,能夠將作業部也就是前端臂部31A所支承的物品移動到任何位置和任何角度之驅動機器之所謂的多關節機器手臂31;被支承在前端臂部31A的支承板32;穿插於被形成在支承板32的貫通孔32A,且在上端側具有凸緣部33A之複數個導引構件33;被支承在導引構件33的下端側,且可利用珀爾帖元件(也就是熱電元件)或熱管的冷卻側等之未圖示的冷卻手段來實施冷卻處理之冷卻板34;以及作為朝向將冷卻板34從支承板32分開的方向施加彈力的彈推手段之複數個彈簧35;並且被建構成:可以從藉由水WT而被支承在支承面12A上的保持對象物WK側來對於該水WT實施冷卻處理。 剝離手段40係具備:直動馬達11,並且被建構成:將該直動馬達11兼用作為支承手段10。 分開手段50係具備:作為驅動機器之複數個直動馬達51、以及作為驅動機器而分別被支承在各個直動馬達51的輸出軸51A,具有一對握持構件52A之保持手段也就是夾頭壓缸52。 其次,說明以上之保持裝置EA的動作。 首先,對於各個構件被配置在圖1A中的實線所示的初期位置之保持裝置EA,該保持裝置EA的使用者(以下,簡稱為「使用者」),係透過操作面板或個人電腦等之未圖示的操作手段來輸入開始進行自動運轉的信號。如此一來,流體供給手段20就會驅動切換閥24、25,如圖1B所示般地,將加壓手段22與水槽21相連通,並且經由加壓側配管21A來將水槽21與凹部12B相連通之後,又驅動該加壓手段22將水槽21內的壓力予以上昇而將水WT供給到支承面12A的親水部12F(流體供給工序)。此外,被供給到親水部12F的水WT,是利用由:照相機或投影機等的攝像手段、光學感測器或超音波感測器等的各種感測器等所構成之未圖示的流體感測手段來進行監視,流體供給手段20係以這個未圖示的流體感測手段的監視狀態作為基礎,來調整水槽21內的壓力,以使得被供給到親水部12F的水WT不要溢出到疏水部12E。接下來,硬化手段30預先實施:流體前處理工序,也就是在支承手段10將保持對象物WK予以支承之前,先對於水WT實施了不至於使該水WT凍結之程度的冷卻處理。換言之,硬化手段30先驅動多關節機器手臂31以及未圖示的冷卻手段,如圖1B中的兩點鏈線所示般地,將冷卻板34靠近支承面12A,以使得水WT的溫度降低到不至於凍結之程度的溫度也就是2℃~3℃的程度,來對於該水WT實施冷卻處理(流體前處理工序)。此外,支承面12A上的水WT的溫度,是利用熱電偶、紅外線感測器等之未圖示的溫度感測手段來進行監視,硬化手段30是以這個未圖示的溫度感測手段之監視狀態作為基礎來調整水WT的溫度。其後,硬化手段30停止對於未圖示的冷卻手段進行驅動之後,就驅動多關節機器手臂31以將冷卻板34回歸到初期位置。接下來,多關節機器手臂或帶式輸送機等之未圖示的搬運手段,如圖1A所示般地,將一體物UP搬運到平台12上方之既定位置的話,分開手段50就驅動直動馬達51及夾頭壓缸52如圖1A中的兩點鏈線所示般地,利用一對握持構件52A來握持住黏合膜片AS。然後,分開手段50就驅動直動馬達51來抽拉黏合膜片AS而從母材WKB形成複數個保持對象物WK(分開工序)。此時,各保持對象物WK是以分別對應於支承面12A上的各親水部12F的方式,來擴大彼此之間的間隔。 接下來,支承手段10就驅動直動馬達11,如圖1C所示般地,將平台12予以上昇,利用支承面12A來支承保持對象物WK(支承工序)。此時,各個保持對象物WK係藉由被供給到各個親水部12F的水WT而被分別支承在該各個親水部12F。然後,硬化手段30就驅動多關節機器手臂31及未圖示的冷卻手段,如圖1C所示般地,將冷卻板34靠近黏合膜片AS,從保持對象物WK側來對於水WT實施冷卻處理而使該水WT凍結,而以支承面12A來保持住該保持對象物WK(硬化工序)。此時,硬化手段30既可以將冷卻板34抵接到黏合膜片AS,也可以將冷卻板34不抵接到黏合膜片AS。此外,例如:因為水WT的凍結而導致該水WT的體積膨脹,因而使得保持對象物WK被朝向冷卻板34這一側推迫時,可以利用設置在冷卻板34與支承板32之間的彈簧35來減輕加諸到保持對象物WK的負荷。接下來,硬化手段30停止對於未圖示的冷卻手段進行驅動,並且對於多關節機器手臂31進行驅動,來將冷卻板34回歸到初期位置。然後,剝離手段40對於直動馬達11進行驅動,如圖1D所示般地,將平台12下降而從保持對象物WK來將黏合膜片AS予以剝離(剝離工序)。 從所有的保持對象物WK將黏合膜片AS剝離出來,且平台12回歸到初期位置的話,剝離手段40就停止對於直動馬達11的驅動,然後,分開手段50就對於直動馬達51及夾頭壓缸52進行驅動,來使握持構件52A回歸到初期位置。此外,不再被握持構件52A所支承之後的黏合膜片AS,則是被移送到使用者或未圖示的搬運手段之後,被廢棄。接下來,利用線圈加熱器或熱管的加熱側等之未圖示的加熱手段,來進行加熱或者進行自然解凍,而將凍結的水WT予以解凍(流體化工序)。此時,被親水部12F所支承之各個保持對象物WK,受到水WT的作用而被定位在既定的位置以及既定的角度。然後,流體供給手段20就驅動切換閥24、25,如圖1E所示般地,將減壓手段23與水槽21相連通,並且經由減壓側配管21B來將水槽21與凹部12B相連通之後,驅動該減壓手段23來將水槽21內的壓力予以下降(流體回收工序)。如此一來,原本在支承面12A上的水WT就被回收,保持對象物WK是以被定位在既定的位置和既定的角度的狀態,被支承於支承面12A。接下來,使用者或未圖示的搬運手段就從支承面12A上取出所有的保持對象物WK(除去工序),然後,反覆地實施上述同樣的工序。 根據以上所述的實施方式,是從藉由水WT而被支承在支承面12A上的保持對象物WK側來對於該水WT實施冷卻處理,因此,不必對於每一個具有支承面12A的構件(平台12、多孔質構件12D)實施冷卻處理,能夠極力地降低能源(電力)之無謂的消耗。 如上所述,用來實施本發明之最佳的構成、方法等,雖然是利用前述的記載內容來揭示出來,但是,本發明並不限定於此。換言之,雖然本發明主要是針對於特定的實施方式,揭示了其圖示且進行了說明,但是,本發明所屬之技術領域的同業者,在不脫離本發明的技術思想及目的的範圍內,也都可以容易想到針對於上述的實施方式,就形狀、材質、數量、其他之詳細的構成,再施加各種的變形。又,上述所揭示之對於形狀、材質等予以限定的記載,是為了要使得本發明更容易被理解起見,所做的舉例說明方式的記載,並不是用來限定本發明的範圍之記載,因此,以脫離這些形狀、材質等所涵蓋的部分限定或全部限定之構件的名稱來做的記載也是被包含在本發明內。 例如:支承手段10,也可以是將解凍後的水WT回收之後,利用減壓手段23或者與流體供給手段20不同個體之其他的減壓手段,來將保持對象物WK吸附保持在支承面12A上;而且直動馬達11也可以不要兼用作為剝離手段40;而且也可以在親水部12F形成有可供水WT通過的孔,而在疏水部12E並未形成有可供水WT通過的孔;而且也可以在親水部12F及疏水部12E之兩者都形成有可供水WT通過的孔;而且也可以將具有疏水性或親水性的薄片、膜片、膠帶等張貼在支承面12A,或者針對於支承面12A實施可以發揮疏水性或親水性的表面處理或鍍膜處理,來形成疏水部12E或親水部12F;而且也可以在支承面12A並未形成有疏水部12E或親水部12F。 流體供給手段20,也可以是利用噴嘴或軟管等的供給構件,從平台12的外側將水WT供給到支承面12A;也可以是在平台12設置與流路12C不同之其他的回收用流路,而從該回收用流路來回收水WT;而且也可以是不採用切換閥24、25,而是例如:將加壓手段22及減壓手段23予以個別地與水槽21相連接,而從水槽21個別地連接到凹部12B。 流體供給手段20所供給的流體,並不限定是水WT,也可以是酒精溶液或機油等的液體之外,也可以是凝膠體;而且也可以是利用冷卻處理即可昇華的單體氣體、混合氣體等之氣體,具體而言,也可以是例如:接著劑、乾冰、紫外線(UV)硬化型樹脂、水泥等,只要是利用硬化處理就可以硬化的物質即可,只要是可以變得比被實施硬化處理之前的狀態時更硬,因而可以獲得對於保持對象物WK之所期望的保持力的物質即可。此外,在本案中所稱的「硬度」,可以是指:以布氏硬度、維氏硬度、洛氏硬度等來表達的硬度;而且也可以是指:以楊氏模量、剛性率、拉伸強度、壓縮強度、剪切強度等來表達的硬度。 硬化手段30,也可以是利用冷卻空氣或冷卻氣體等的冷卻媒體來將水WT予以;而且如果流體是經由作為硬化處理的加熱處理就會硬化的物質,例如:熱硬化性樹脂、加熱硬化劑等的情況下,也可以採用:線圈加熱器或熱管的加熱側等的加熱手段;而且如果流體是經由作為硬化處理的紫外線或X射線等的能量射線之照射處理就會硬化的物質,例如:能量射線硬化性樹脂或能量射線硬化劑等的情況下,也可以採用:能夠照射出能量射線之高壓水銀燈或LED(發光二極體,Light Emitting Diode)燈等的能量射線照射手段;而且如果流體是經由作為硬化處理的乾燥處理就會硬化的物質,例如:黏著劑或水泥等的情況下,也可以採用:送風機或加熱手段,考慮流體的特性、特質、性質、材質、組成及構成、氣相氛圍的條件、其他的因素等的各種條件後,只要是能夠使流體硬化之手段的話即可採用;而且在前述實施方式中,雖然是從保持對象物WK之另外一面WK2側(上方側)來對於水WT實施冷卻處理,但是,也可以從例如:保持對象物WK的左方、前方、右斜後方、左斜前方、右斜上方或者左斜上方之所謂的保持對象物WK側,來對於水WT實施冷卻處理。 硬化手段30,也可以利用上述的冷卻手段或冷卻媒體,將水槽21內的水WT或配管21A、25A內的水WT直接冷卻,或者經由水槽21、配管21A、25A以及支承面12A之至少其中之一種來將水WT間接地冷卻,預先在支承手段10將保持對象物WK予以支承之前,就先實施流體前處理工序;而且也可以將實施硬化工序的冷卻手段與實施流體前處理的冷卻手段以相同的冷卻手段來構成;而且也可以不同的冷卻手段來構成。此外,如果是預先實施流體前處理工序的話,作為不至於使得流體硬化之程度的溫度,如果流體是水WT的情況下,也可以是2℃以下,而且也可以是3℃以上;如果流體是經由加熱處理就會硬化之物質的話,例如:也可以將該流體進行加熱到60℃或120℃的溫度之加熱處理,考慮流體的特性、特質、性質、材質、組成以及構成、氣相氛圍的條件、其他的因素等的各種條件後,只要是能夠使流體不至於硬化之溫度的話,無論是多少度(℃)皆可。 剝離手段40,也可以是不將平台12下降或者一邊將平台12下降的同時也將夾頭壓缸52上昇,而將黏合膜片AS從保持對象物WK剝離;而且也可以是在支承面12A內將保持對象物WK與黏合膜片AS進行相對旋轉而將黏合膜片AS從保持對象物WK剝離;而且也可以是利用超音波振動裝置或振動器等的振動手段來使平台12進行振動,來使得黏合膜片AS很容易從保持對象物WK剝離;而且也可以採用:不兼用作為支承手段10的驅動機器;而且也可以將單片狀或帶狀的黏合膠帶或黏著膠帶等的剝離用膠帶張貼到黏合膜片AS上,並且對於該剝離用膠帶施加張力而將黏合膜片AS從保持對象物WK剝離,並且將這種剝離手段與上述舉例說明的剝離手段一起併用或者取代上述舉例說明的剝離手段;而且本發明的保持裝置EA也可以是具備或不具備剝離手段40,如果是不具備剝離手段40的話,也可以利用其他的裝置來將黏合膜片AS從保持對象物WK剝離。 分開手段50,也可以是在黏合膜片AS的面內,對於黏合膜片AS施加朝往單一方向或朝往兩個方向以上的方向的張力,來擴大保持對象物WK之彼此的間隔;而且如果是使用隔介著黏合膜片AS來與保持對象物WK形成一體化之環形框架等的框架構件的話,也可以支承著框架構件來對於黏合膜片AS施加張力,藉此來擴大保持對象物WK之彼此的間隔;而且本發明的保持裝置EA也可以是具備或不具備分開手段50,如果是不具備分開手段50的話,也可以利用其他的裝置來將保持對象物WK之彼此的間隔予以擴大。 保持裝置EA,也可以是採用:可除去殘留在支承面12A上的流體或其他粉塵等的塵埃之刮板、雨刷或可將流體吹掉的鼓風機等的塵埃除去手段,而在將流體供給到支承面12A之前,或者從支承面12A回收了流體之後,從支承面12A上除去塵埃;而且也可以是具備:可對於母材WKB切割出貫穿在厚度方向上的切溝,或者對於該母材WKB切割出未貫穿厚度方向的切溝,而只要施加張力即可將母材WKB分裂成複數個保持對象物WK之切割刃或雷射切割機等的母材切斷手段;而且也可以是具備:可在母材WKB上形成只要施加張力即可將母材WKB分裂成複數個保持對象物WK之脆弱的改質層之雷射照射裝置或藥液投注手段等的脆弱層形成手段;而且也可以是具備:可對於母材WKB進行研削來使得該母材WKB的厚度變薄的研磨機或砂輪機等的研削手段;而且也可以是具備:對於已經被形成了未貫穿厚度方向的切溝的母材WKB,可從已經形成了該切溝的這一面的相反側面進行抵達該切溝為止的研削作業,而可以從母材WKB形成出複數個保持對象物WK之研磨機或砂輪機等的研削個別單片化手段。 保持裝置EA,也可以是在支承工序的前段實施流體供給工序;而且也可以是在支承工序的後段實施流體供給工序;而且也可以是在支承工序的前段與該支承工序的後段都實施流體供給工序;而且也可以是實施或不實施:流體前處理工序、分開工序、剝離工序、流體化工序、流體回收工序以及除去工序之中的至少一種工序。 母材WKB,也可以是被形成了貫穿厚度方向的切溝,且利用該切溝來形成有複數個保持對象物WK之母材WKB;而且也可以是被形成了未貫穿厚度方向的切溝,只要被施加張力即可分裂成複數個保持對象物WK之母材WKB;而且也可以是被形成了脆弱的改質層,只要被施加張力即可分裂成複數個保持對象物WK之母材WKB;而且也可以是沒有張貼黏合膜片AS之母材WKB。 保持對象物WK,可以是沒有張貼黏合膜片AS的保持對象物WK;而且也可以是並非從母材WKB形成的,而是一開始就被配置成隔開既定間隔的保持對象物WK。 一體物UP,也可以是黏合膜片AS支承於框架構件之一體物UP。 框架構件,除了環型框架以外,也可以是:非環狀(外周並未連繫在一起)的框架、或者圓形、橢圓形、多角形、其他形狀的框架。 在前述實施方式中,舉例說明的保持對象物,雖然是複數個保持對象物WK的例子,但是,保持對象物也可以是只有一個。 本發明中的手段以及工序,只要能夠發揮針對於這些手段及工序所說明的動作、功能或工序的話即可,並無任何限定,而且也完全沒有受到前述實施方式所示的單純只是一種實施方式的構成物、工序的限定。例如:支承工序,只要是利用支承面從保持對象物的其中一面側來支承該保持對象物之工序的話,無論是哪一種工序皆可,與申請專利當時的技術常識相對照的話,只要是落在其技術範圍內的話即可,並未受到任何的限定(其他的手段以及工序也是同樣)。 黏合膜片AS、母材WKB、保持對象物WK以及剝離用膠帶的材質、種別、形狀等,並未特別地限定。例如:黏合膜片AS、母材WKB、保持對象物WK以及剝離用膠帶,也可以是:圓形、橢圓形、三角形和四角形等之多角形、以及其他的形狀;黏合膜片AS以及剝離用膠帶,也可以是:感壓黏著性、感熱黏著性等的黏著形態的膜片和膠帶;如果是採用感熱黏著性之膜片和膠帶的話,只要設置可對於黏合膜片AS和剝離用膠帶進行加熱之適當的線圈加熱器或熱管的加熱側等的加熱手段,以適當的方法來進行黏著即可。再者,這種黏合膜片AS和剝離用膠帶,也可以是例如:只有黏著劑層之單層的膜片和膠帶、在基材與黏著劑層之間具有中間層的膜片和膠帶、在基材的上表面還有覆蓋層等之三層以上的膜片和膠帶;此外,也可以是可將基材從黏著劑層剝離之所謂的兩面黏合膜片的這種形式的膜片和膠帶;而兩面黏合膜片,也可以是單層或者具有複數個中間層的兩面黏合膜片,或者是不具中間層之單層或複數層的兩面黏合膜片。又,可以作為母材WKB以及保持對象物WK的例子,可以舉出例如:食品、樹脂容器、矽半導體晶圓或化合物半導體晶圓等的半導體晶圓、電路基板、光碟等的訊息記憶基板、玻璃板、鋼板、陶器、木板或樹脂等的單體物,而且也可以是由兩個以上的上述物品所形成的複合物;也能夠以任意的形態的構件或物品等來作為對象。再者,黏合膜片AS,變更其功能性、用途性的說法的話,也可以是例如:記載訊息用標籤、裝飾用標籤、保護膜片、晶圓切割用膠帶、切割貼片膜、晶片貼合膠帶、形成記錄層用樹脂膜片等之任意的膜片、薄膜、膠帶等。 前述實施方式中的驅動機器,除了可以採用:旋動馬達、直動馬達、線性馬達、單軸機器手臂、具有雙軸或三軸以上的關節之多關節機器手臂等的電動機器、氣壓缸、油壓缸、無桿氣缸以及旋轉缸等的致動器之外,也可以採用將這些裝置直接或間接地組合在一起的驅動機器。 前述實施方式中,如果是採用可將支承(保持)手段或支承(保持)構件等的被支承構件(被保持構件)予以支承(保持)的手段的話,係可以採用:利用機械夾頭或夾頭壓缸等的握持手段、庫侖力、黏合劑(黏合膜片、黏合膠帶)、黏著劑(黏著膜片、黏著膠帶)、磁力、伯努利吸附作用、吸引吸附、驅動機器等來支承(保持)被支承構件的構成方式;如果是採用可將切斷手段或切斷構件等的被切斷構件予以切斷,或者可在被切斷構件上形成切溝或切斷線之手段的話,也可以採用切刃、雷射切割機、離子光束、火力、熱、水壓、電熱線、吹噴氣體或液體等的方式來進行切斷的手段來取代或者同時併用上述舉例說明的例子;而且也可以利用組合了適當的驅動機器的手段,來移動將要進行切斷的物品而予以切斷;而且如果是採用彈推手段的話,也可以是利用彈簧、橡膠、樹脂或驅動機器等來構成彈推手段。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings. In addition, the X-axis, Y-axis, and Z-axis in this embodiment are in a relationship of being orthogonal to each other (perpendicularly intersecting), the X-axis and the Y-axis are axes in a predetermined plane, and the Z-axis is the same as the above-mentioned predetermined the plane orthogonal to the axis. Furthermore, in this embodiment, when viewed from the front direction of FIG. 1A to FIG. 1E parallel to the Y axis, it is used as a reference. When indicating the direction, the arrow direction of the Z axis indicates "up", and the opposite direction is "up". Indicates "down", the direction of the arrow on the X-axis is "left", the opposite direction is "right", the direction of the arrow on the Y-axis is "front", and the opposite direction is "rear". The holding device EA of the present invention includes the support means 10 for supporting the holding object WK from one surface WK1 side of the holding object WK by the support surface 12A, and a fluid supply for supplying water WT as a fluid to the support surface 12A The means 20; the hardening means 30 for performing a cooling process as a hardening process for hardening, ie, freezing, the water WT to hold the holding object WK by the support surface 12A by freezing the water WT. In addition, the holding object WK is formed of the base material WKB, and the adhesive film AS is pasted on the other surface WK2 of the base material WKB (holding object WK), thereby forming an integrated body UP. In the case of the present embodiment, the holding device EA is disposed in the peeling means 40 for peeling the adhesive sheet AS from the holding object WK, and applying tension to the adhesive sheet AS to form a plurality of pieces from the base material WKB The vicinity of the separating means 50 of the holding object WK at a predetermined interval. The support means 10 includes a linear motor (that is, a linear motion motor) 11 as a driving device, and a stage 12 as a support member which is supported on an output shaft 11A of the linear motor 11 and has a support surface 12A. The stage 12 is provided with a flow path 12C communicating with the recess 12B provided on the upper surface, and a porous member 12D made of resin, metal, etc., which is arranged in the recess 12B and whose upper surface is regarded as a support surface 12A. . On the support surface 12A, as shown in the portion marked AA in FIG. 1A , the hydrophobic portion 12E having hydrophobicity is formed in a lattice shape, and the hydrophilic portion 12F is defined by the hydrophobic portion 12E. The water-repellent portion 12E is formed by arranging a member having water repellency (non-absorbent) such as resin or metal on the inner surface of the lattice-shaped grooves formed on the support surface 12A. The hydrophilic portion 12F is subjected to rough surface treatment to form a rough surface by rough surface treatment such as rough surface processing and sandblasting. The fluid supply means 20 includes: a water tank 21 for accommodating water WT; a pressurizing means 22 such as a pressurizing pump or a turbine; a decompressing means 23 such as a decompression pump or a vacuum ejector; 22 and the pressure reducing means 23 for switching the state of communication with the water tank 21; and the valve 24 for switching the pressure side piping 21A and the pressure reducing side piping 21B connected to the water tank 21 to be connected to the flow path 12C via the piping 25A The switching valve 25 in the connected state. The hardening means 30 is provided with a plurality of arm parts, and is regarded as part of a driving machine capable of moving the work part, that is, the article supported by the front end arm part 31A, to any position and any angle within its work range. A so-called multi-joint robot arm 31; a support plate 32 supported by the front end arm portion 31A; a plurality of guide members 33 inserted through a through hole 32A formed in the support plate 32 and having a flange portion 33A on the upper end side; The cooling plate 34 is supported on the lower end side of the guide member 33 and can be cooled by a cooling means not shown such as a Peltier element (that is, a thermoelectric element) or a cooling side of a heat pipe; The cooling plate 34 has a plurality of springs 35 for urging means for applying an elastic force in a direction in which the cooling plate 34 is separated from the support plate 32; Water WT is subjected to cooling treatment. The peeling means 40 is equipped with the linear motion motor 11, and is constructed so that the linear motion motor 11 is also used as the support means 10. The separating means 50 is provided with a plurality of linear motors 51 as driving means, output shafts 51A respectively supported by the respective linear motors 51 as driving means, and holding means having a pair of holding members 52A, that is, a chuck Cylinder 52 . Next, the operation of the above-mentioned holding device EA will be described. First, for the holding device EA in which each member is arranged at the initial position shown by the solid line in FIG. 1A , the user of the holding device EA (hereinafter, simply referred to as "user") uses an operation panel, a personal computer, or the like. A signal to start automatic operation is input by an operation means not shown. In this way, the fluid supply means 20 drives the switching valves 24 and 25, as shown in FIG. 1B, the pressurizing means 22 and the water tank 21 are communicated, and the water tank 21 and the concave portion 12B are connected via the pressurizing side piping 21A. After the connection is made, the pressurizing means 22 is driven to increase the pressure in the water tank 21 to supply the water WT to the hydrophilic portion 12F of the support surface 12A (fluid supply step). In addition, the water WT supplied to the hydrophilic portion 12F is a fluid (not shown) composed of imaging means such as cameras and projectors, various sensors such as optical sensors and ultrasonic sensors, and the like. Monitoring is performed by a sensing means, and the fluid supply means 20 adjusts the pressure in the water tank 21 on the basis of the monitoring state of the fluid sensing means (not shown) so that the water WT supplied to the hydrophilic portion 12F does not overflow into the water tank 21. The water-repellent portion 12E. Next, the hardening means 30 preliminarily performs a fluid pretreatment step, that is, before the support means 10 supports the object to be held WK, cooling treatment is performed on the water WT to an extent that does not freeze the water WT. In other words, the hardening means 30 first drives the multi-joint robot arm 31 and the cooling means not shown, and as shown by the two-dotted chain line in FIG. 1B , the cooling plate 34 is brought close to the support surface 12A to reduce the temperature of the water WT This water WT is subjected to cooling treatment (fluid pre-treatment step) to a temperature of 2°C to 3°C, which is a temperature that does not freeze. In addition, the temperature of the water WT on the support surface 12A is monitored by unshown temperature sensing means such as thermocouples and infrared sensors, and the curing means 30 is one of these unshown temperature sensing means. The monitoring status is used as a basis to adjust the temperature of the water WT. After that, after the hardening means 30 stops driving the cooling means (not shown), the articulated robot arm 31 is driven to return the cooling plate 34 to the initial position. Next, as shown in FIG. 1A , when conveying means (not shown) such as a multi-joint robot arm or a belt conveyor conveys the integrated object UP to a predetermined position above the platform 12, the separating means 50 is driven to move linearly. The motor 51 and the collet cylinder 52 hold the adhesive film AS by a pair of holding members 52A, as shown by the two-dot chain line in FIG. 1A . Then, the separating means 50 drives the linear motor 51 to pull the adhesive sheet AS to form a plurality of holding objects WK from the base material WKB (separation step). At this time, each of the holding objects WK is widened so as to correspond to each of the hydrophilic portions 12F on the support surface 12A, respectively. Next, the support means 10 drives the linear motion motor 11, as shown in FIG. 1C, the stage 12 is raised, and the holding object WK is supported by the support surface 12A (support process). At this time, each holding object WK is supported by each hydrophilic part 12F by the water WT supplied to each hydrophilic part 12F, respectively. Then, the curing means 30 drives the multi-joint robot arm 31 and the cooling means (not shown), and as shown in FIG. 1C , the cooling plate 34 is brought close to the adhesive film AS, and the water WT is cooled from the holding object WK side. The water WT is frozen by the treatment, and the holding object WK is held by the support surface 12A (hardening step). At this time, the hardening means 30 may abut the cooling plate 34 to the adhesive film AS, or may not abut the cooling plate 34 to the adhesive film AS. In addition, for example, when the volume of the water WT expands due to freezing of the water WT, and the object to be held WK is pushed toward the cooling plate 34, the cooling plate 34 and the support plate 32 may be provided by using the The spring 35 reduces the load applied to the holding object WK. Next, the hardening means 30 stops driving the cooling means (not shown) and drives the articulated robot arm 31 to return the cooling plate 34 to the initial position. Then, the peeling means 40 drives the linear motor 11 and, as shown in FIG. 1D , lowers the stage 12 to peel the adhesive film AS from the holding object WK (peeling step). When the adhesive film AS is peeled off from all the holding objects WK and the table 12 returns to the initial position, the peeling means 40 stops the driving of the linear motor 11, and then the separating means 50 drives the linear motor 51 and the clamp. The head cylinder 52 is driven to return the grip member 52A to the initial position. In addition, the adhesive sheet AS after being no longer supported by the holding member 52A is discarded after being transferred to a user or a conveyance means not shown. Next, the frozen water WT is thawed by heating or natural thawing by heating means not shown, such as a coil heater or a heating side of a heat pipe (fluidizing step). At this time, each holding object WK supported by the hydrophilic portion 12F is positioned at a predetermined position and a predetermined angle by the action of the water WT. Then, the fluid supply means 20 drives the switching valves 24 and 25, and as shown in FIG. 1E, the decompression means 23 is communicated with the water tank 21, and the water tank 21 and the concave portion 12B are communicated through the decompression side piping 21B. , the pressure reduction means 23 is driven to lower the pressure in the water tank 21 (fluid recovery step). In this way, the water WT originally on the support surface 12A is recovered, and the holding object WK is supported on the support surface 12A in a state of being positioned at a predetermined position and a predetermined angle. Next, the user or a conveyance means (not shown) takes out all the holding objects WK from the support surface 12A (removal step), and then repeats the same steps as described above. According to the above-described embodiment, the cooling process is performed on the water WT from the side of the holding object WK supported on the support surface 12A by the water WT, and therefore, it is not necessary for each member having the support surface 12A ( The platform 12 and the porous member 12D) are subjected to cooling treatment, so that wasteful consumption of energy (electricity) can be reduced as much as possible. As described above, the best configuration, method, etc. for carrying out the present invention have been disclosed based on the foregoing description, but the present invention is not limited thereto. In other words, although the present invention is mainly aimed at specific embodiments, and the drawings and descriptions thereof are disclosed and described, those in the technical field to which the present invention pertains, within the scope of not departing from the technical idea and purpose of the present invention, It is also conceivable to apply various modifications to the above-described embodiments in terms of the shape, material, number, and other detailed configurations. In addition, the above-mentioned descriptions that limit the shape, material, etc., are for the purpose of making the present invention easier to understand, and the descriptions in the form of illustration are not used to limit the scope of the present invention. Therefore, descriptions made by the names of members deviating from some or all of the limitations included in these shapes, materials, and the like are also included in the present invention. For example, after the support means 10 recovers the thawed water WT, the decompression means 23 or another decompression means separate from the fluid supply means 20 may be used to adsorb and hold the object to be held WK on the support surface 12A. Moreover, the direct-acting motor 11 may not also be used as the peeling means 40; and the hydrophilic portion 12F may be formed with a hole through which the water WT can pass, but the hydrophobic portion 12E may not be formed with a hole through which the water WT can pass; Pores through which the water WT can pass may be formed in both the hydrophilic portion 12F and the hydrophobic portion 12E; and a sheet, film, tape, etc. having hydrophobicity or hydrophilicity may be attached to the support surface 12A, or for the support surface 12A. Surface 12A is subjected to surface treatment or plating treatment that can exhibit hydrophobicity or hydrophilicity to form hydrophobic portion 12E or hydrophilic portion 12F; and support surface 12A may not be formed with hydrophobic portion 12E or hydrophilic portion 12F. The fluid supply means 20 may be a supply means such as a nozzle or a hose to supply the water WT to the support surface 12A from the outside of the platform 12, or may be provided in the platform 12 with another flow for recovery that is different from the flow path 12C. Furthermore, instead of using the switching valves 24 and 25, for example, the pressurizing means 22 and the depressurizing means 23 may be individually connected to the water tank 21, and the The slave water tanks 21 are individually connected to the recesses 12B. The fluid supplied by the fluid supply means 20 is not limited to water WT, and may be a liquid other than an alcohol solution or engine oil, or a gel, or a single gas that can be sublimated by cooling treatment. , mixed gas, etc., specifically, it may be, for example, adhesive, dry ice, ultraviolet (UV) hardening resin, cement, etc., as long as it is a substance that can be hardened by hardening treatment, as long as it can become Since it is harder than the state before the hardening treatment, it is sufficient to obtain a desired holding force for the holding object WK. In addition, the "hardness" referred to in this case may refer to: hardness expressed in Brinell hardness, Vickers hardness, Rockwell hardness, etc.; and may also refer to: Young's modulus, stiffness ratio, tensile strength The hardness expressed by tensile strength, compressive strength, shear strength, etc. The hardening means 30 may be water WT by using a cooling medium such as cooling air or cooling gas; and if the fluid is a material that is hardened by heat treatment as hardening treatment, for example: thermosetting resin, heat curing agent In the case of fluids, etc., heating means such as a coil heater or the heating side of a heat pipe can also be used; and if the fluid is a material that is hardened by irradiation with energy rays such as ultraviolet rays or X-rays as hardening treatments, for example: In the case of an energy ray curable resin or an energy ray hardener, etc., energy ray irradiation means such as a high-pressure mercury lamp or an LED (Light Emitting Diode) lamp capable of irradiating energy rays can also be used; It is a substance that can be hardened by drying treatment as a hardening treatment, for example, in the case of adhesives or cement, etc., a blower or heating means can also be used, considering the characteristics, characteristics, properties, material, composition and composition of the fluid, gas Various conditions such as the conditions of the phase atmosphere and other factors can be used as long as it is a means that can harden the fluid; and in the above-mentioned embodiment, although the object WK is held from the other side WK2 side (upper side) Although the cooling process is performed on the water WT, the water WT may be obtained from the so-called holding object WK side, such as the left, front, right obliquely rear, left obliquely front, right obliquely upper, or left obliquely upper side of the holding object WK, for example. A cooling process is performed on the water WT. The hardening means 30 may directly cool the water WT in the water tank 21 or the water WT in the pipes 21A and 25A by using the above-mentioned cooling means or cooling medium, or through at least one of the water tank 21 , the pipes 21A and 25A and the support surface 12A. One is to indirectly cool the water WT, and before the support means 10 supports the object to be held WK, a fluid pretreatment process is performed first; and the cooling means for performing the hardening process and the cooling means for performing the fluid pretreatment may be used. It is constructed by the same cooling means; and it can also be constructed by different cooling means. In addition, if the fluid pretreatment process is performed in advance, the temperature that does not harden the fluid may be 2°C or lower if the fluid is water WT, and may be 3°C or higher; if the fluid is For substances that can be hardened by heat treatment, for example, the fluid can also be heated to a temperature of 60°C or 120°C, considering the characteristics, characteristics, properties, material, composition and composition of the fluid, gas phase atmosphere After various conditions such as conditions and other factors, the temperature may be any degree (°C) as long as the fluid is not hardened. The peeling means 40 may peel off the adhesive film AS from the holding object WK without lowering the stage 12 or by raising the chuck cylinder 52 while lowering the stage 12, or on the support surface 12A. The holding object WK and the adhesive film AS are relatively rotated to peel off the adhesive film AS from the holding object WK; and the platform 12 can also be vibrated by a vibration means such as an ultrasonic vibration device or a vibrator, In order to make the adhesive film AS easy to peel off from the holding object WK, it is also possible to use a driving device that does not also serve as the support means 10, and it is also possible to use a sheet-like or tape-like adhesive tape or adhesive tape for peeling off. A tape is attached to the adhesive film AS, and tension is applied to the peeling tape to peel the adhesive film AS from the holding object WK, and this peeling means is used in combination with or in place of the above-exemplified peeling means Moreover, the holding device EA of the present invention may or may not have the peeling means 40. If the peeling means 40 is not provided, other devices may be used to peel the adhesive film AS from the holding object WK. The separating means 50 may extend the distance between the holding objects WK by applying tension in a single direction or in two or more directions to the adhesive film AS within the surface of the adhesive film AS; and If a frame member such as a ring frame integrated with the holding object WK via the adhesive film AS is used, the holding target may be expanded by supporting the frame member and applying tension to the adhesive film AS. The distance between the WKs; and the holding device EA of the present invention may be provided with or without the separation means 50, and if it is not provided with the separation means 50, other means can be used to maintain the distance between the objects WK. expand. The holding device EA may be a dust removing means such as a scraper, a wiper, or a blower capable of blowing off the fluid, which can remove the fluid or other dust remaining on the support surface 12A, and the fluid is supplied to the surface. Before the support surface 12A, or after the fluid is recovered from the support surface 12A, dust is removed from the support surface 12A; and the base material WKB may be provided with a groove penetrating in the thickness direction, or the base material may be WKB cuts the grooves that do not penetrate the thickness direction, and can split the base material WKB into a plurality of cutting blades holding the object WK or a laser cutting machine as long as tension is applied; : It is possible to form a fragile layer forming means such as a laser irradiation device or a chemical solution injection means, etc., on the base material WKB, as long as tension is applied, the base material WKB can be split into a plurality of fragile modified layers that hold the object WK; Grinding means such as a grinder or a grinder that can grind the base material WKB to reduce the thickness of the base material WKB may be provided; The base material WKB can be ground from the side opposite to the side on which the groove has been formed to reach the groove, and a plurality of grinding machines, grinders, etc., which can form a plurality of holding objects WK from the base material WKB means of grinding individual monoliths. In the holding device EA, the fluid supply process may be implemented in the front stage of the support process; the fluid supply process may be implemented in the latter stage of the support process; and the fluid supply may be implemented in both the front stage of the support process and the back stage of the support process. and may be implemented or not implemented at least one of the fluid pretreatment process, the separation process, the peeling process, the fluidization process, the fluid recovery process, and the removal process. The base material WKB may be a base material WKB in which grooves penetrating the thickness direction are formed and a plurality of holding objects WK are formed by the grooves, or grooves that do not penetrate the thickness direction may be formed. , as long as tension is applied, it can be split into a plurality of base materials WKB of the holding object WK; and a fragile modified layer can also be formed, as long as tension is applied, it can be split into a plurality of base materials of the holding object WK WKB; and it can also be the base material WKB without the adhesive film AS. The holding target WK may be a holding target WK that is not attached with the adhesive film AS, or may be a holding target WK that is not formed from the base material WKB but is initially arranged at a predetermined interval. The unitary body UP may be a unitary body UP which is supported by the adhesive film AS on the frame member. The frame member, in addition to the ring-shaped frame, may be a non-annular frame (the outer peripheries are not connected together), or a circular, oval, polygonal or other shaped frame. In the above-described embodiment, the holding target object described as an example is an example of a plurality of holding target objects WK, but the holding target object may be only one. The means and steps in the present invention are not limited at all as long as they can exhibit the operations, functions, or steps described with respect to these means and steps, and are not limited to the above-mentioned embodiments, which are merely an embodiment. The limitations of the components and processes. For example, the supporting process may be any process as long as it is a process of supporting the object to be held from one of its sides by using a support surface. In contrast to the technical common sense at the time of filing the patent application, as long as the object is supported As long as it is within the technical scope, it is not limited at all (the same applies to other means and steps). The material, type, shape, etc. of the adhesive sheet AS, the base material WKB, the object to be held WK, and the peeling tape are not particularly limited. For example: adhesive sheet AS, base material WKB, holding object WK, and tape for peeling; polygonal shapes such as circle, ellipse, triangle, and square, and other shapes are also possible; adhesive sheet AS and peeling tape The tape may also be: pressure-sensitive adhesive, heat-sensitive adhesive and other adhesive forms of film and tape; if the thermal-adhesive film and tape are used, as long as the setting can be used for the adhesive film AS and the peeling tape. A suitable heating method, such as a coil heater or the heating side of a heat pipe, can be used for adhesion. Furthermore, the adhesive sheet AS and the tape for peeling may be, for example, a sheet and tape with only a single layer of the adhesive layer, a sheet and tape with an intermediate layer between the substrate and the adhesive layer, On the upper surface of the base material, there are three or more layers of films and tapes, such as a cover layer; in addition, there may be a so-called double-sided adhesive film that can peel the base material from the adhesive layer. The double-sided adhesive film can also be a single-layer or double-sided adhesive film with multiple intermediate layers, or a single-layer or multiple-layer double-sided adhesive film without intermediate layers. Further, examples of the base material WKB and the holding object WK include food, resin containers, semiconductor wafers such as silicon semiconductor wafers or compound semiconductor wafers, circuit boards, information memory boards such as optical discs, etc. A single product such as a glass plate, steel plate, pottery, wood board, or resin may be used, and a composite of two or more of the above-mentioned articles may also be used, and a member or article of any form may be targeted. Furthermore, the adhesive sheet AS may be, for example, a label for recording information, a label for decoration, a protective sheet, a tape for wafer dicing, a dicing film, a chip sticker, etc. Any film, film, tape, etc., such as a laminating tape, a resin film for forming a recording layer, etc. can be used. The drive machine in the foregoing embodiment can be used except for: electric machines, pneumatic cylinders, etc. In addition to actuators such as hydraulic cylinders, rodless cylinders, and rotary cylinders, it is also possible to use drive machines that directly or indirectly combine these devices. In the aforementioned embodiment, if a means for supporting (holding) a supported member (member to be held) such as a supporting (holding) means or a supporting (holding) member, etc. is used, a mechanical chuck or a clamp may be used. Holding means of head press cylinder, etc., Coulomb force, adhesive (adhesive film, adhesive tape), adhesive (adhesive film, adhesive tape), magnetic force, Bernoulli adsorption, suction adsorption, drive machine, etc. to support (Maintaining) the structure of the supported member; if the member to be cut, such as the cutting means or the cutting member, can be cut, or the member to be cut can be formed by means of cutting grooves or cutting lines , can also use cutting edge, laser cutting machine, ion beam, fire, heat, water pressure, electric heating wire, blowing gas or liquid, etc. to cut the means to replace or use the above-mentioned examples at the same time; In addition, it is also possible to use a means combined with an appropriate driving machine to move the object to be cut and cut; and if a spring push means is used, it can also be composed of a spring, rubber, resin, or a driving machine, etc. Push means.

10:支承手段 11:直動馬達 11A:輸出軸 12:平台 12A:支承面 12B:凹部 12C:流路 12D:多孔質構件 12E:疏水部 12F:親水部 20:流體供給手段 21:水槽 21A:加壓側配管 21B:減壓側配管 22:加壓手段 23:減壓手段 24:切換閥 25:切換閥 25A:配管 30:硬化手段 31:多關節機器手臂 31A:前端臂部 32:支承板 32A:貫通孔 33:導引構件 33A:凸緣部 34:冷卻板 35:彈簧 40:剝離手段 50:分開手段 51:直動馬達 51A:輸出軸 52:夾頭壓缸 52A:握持構件 EA:保持裝置 AS:黏合膜片 UP:一體物 WK:保持對象物 WKB:母材 WT:水 10: Supporting means 11: Direct motor 11A: Output shaft 12: Platform 12A: bearing surface 12B: Recess 12C: flow path 12D: Porous Components 12E: hydrophobic part 12F: Hydrophilic part 20: Fluid supply means 21: Sink 21A: Pressurized side piping 21B: Decompression side piping 22: Pressure means 23: Decompression means 24: Switching valve 25: Switching valve 25A: Piping 30: Hardening means 31: Multi-joint robotic arm 31A: Front end arm 32: support plate 32A: Through hole 33: Guide member 33A: Flange 34: Cooling Plate 35: Spring 40: Stripping Means 50: Separate means 51: Direct motor 51A: output shaft 52: Chuck Cylinder 52A: Holding member EA: holding device AS: Adhesive Diaphragm UP: One thing WK: keep the object WKB: Base Metal WT: water

[圖1A]係本發明之一種實施方式的保持裝置之說明圖。 [圖1B]係本發明之一種實施方式的保持裝置之說明圖。 [圖1C]係本發明之一種實施方式的保持裝置之說明圖。 [圖1D]係本發明之一種實施方式的保持裝置之說明圖。 [圖1E]係本發明之一種實施方式的保持裝置之說明圖。 1A is an explanatory diagram of a holding device according to an embodiment of the present invention. 1B is an explanatory diagram of the holding device according to one embodiment of the present invention. [ Fig. 1C ] An explanatory diagram of the holding device according to one embodiment of the present invention. 1D is an explanatory diagram of the holding device according to one embodiment of the present invention. 1E is an explanatory diagram of a holding device according to one embodiment of the present invention.

10:支承手段 10: Supporting means

11A:輸出軸 11A: Output shaft

12:平台 12: Platform

12A:支承面 12A: bearing surface

25A:配管 25A: Piping

30:硬化手段 30: Hardening means

31:多關節機器手臂 31: Multi-joint robotic arm

32:支承板 32: support plate

34:冷卻板 34: Cooling Plate

35:彈簧 35: Spring

50:分開手段 50: Separate means

51:直動馬達 51: Direct motor

52:夾頭壓缸 52: Chuck Cylinder

52A:握持構件 52A: Holding member

AS:黏合膜片 AS: Adhesive Diaphragm

WK:保持對象物 WK: keep the object

WK1:其中一面 WK1: One Side

WK2:另外一面 WK2: The other side

WT:水 WT: water

Claims (3)

一種保持方法,其特徵為:實施 利用支承面從保持對象物之其中一面側來支承該保持對象物之支承工序; 在前述支承工序的前段或後段,將流體供給到前述支承面之流體供給工序;以及 實施使前述流體硬化的硬化處理來使該流體硬化,以利用前述支承面來保持住前述保持對象物之硬化工序;並且 在前述硬化工序中,是從藉由前述流體而被支承在前述支承面上的前述保持對象物側來對於該流體實施前述硬化處理。 A holding method characterized by: implementing A supporting step of supporting the object to be held from one side of the object to be held by using a support surface; A fluid supply process for supplying fluid to the aforesaid support surface in a preceding stage or a subsequent stage of the aforementioned support process; and A hardening process of hardening the fluid to harden the fluid so as to hold the object to be held by the support surface is performed; and In the hardening step, the hardening treatment is performed on the fluid from the holding object side supported on the support surface by the fluid. 如請求項1所述之保持方法,其中,在前述硬化工序中,是在前述支承工序進行支承前述保持對象物之前,預先對於前述流體實施了使該流體不至於硬化之程度的前述硬化處理之流體前處理工序。The holding method according to claim 1, wherein, in the hardening step, before the holding object is supported in the supporting step, the fluid is subjected to the hardening treatment to the extent that the fluid is not hardened. Fluid pretreatment process. 一種保持裝置,其特徵為:具備 利用支承面從保持對象物之其中一面側來支承該保持對象物之支承手段; 將流體供給到前述支承面之流體供給手段;以及 實施使前述流體硬化的硬化處理來使該流體硬化,以利用前述支承面來保持住前述保持對象物之硬化手段;並且 前述硬化手段,是從藉由前述流體而被支承在前述支承面上的前述保持對象物側來對於該流體實施前述硬化處理。 A holding device is characterized by: having A support means for supporting the object to be held from one side of the object to be held by a support surface; fluid supply means for supplying fluid to the aforementioned support surface; and hardening means for holding the object to be held with the support surface by performing a hardening treatment for hardening the fluid to harden the fluid; and The hardening means performs the hardening treatment on the fluid from the holding object side supported on the support surface by the fluid.
TW110143507A 2020-12-08 2021-11-23 Holding method and holding device capable of reducing unnecessary power consumption during processing TW202226435A (en)

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JP2020203672A JP2022091010A (en) 2020-12-08 2020-12-08 Holding method and holding device

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