TW202218027A - An assembly and method of handling wafers - Google Patents
An assembly and method of handling wafers Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
Abstract
Description
發明領域Field of Invention
本發明係關於處理半導體晶圓之總成及方法;且特別是關於總成及方法,其中在自位於拾取站處的第一晶圓固持器拾取組件時,將包含待拾取的組件之晶圓裝載至第二晶圓固持器上。The present invention relates to assemblies and methods for processing semiconductor wafers; and in particular to assemblies and methods in which, upon picking up components from a first wafer holder located at a pickup station, a wafer containing the components to be picked will be loaded onto the second wafer holder.
發明背景Background of the Invention
用於處理半導體晶圓之現有總成及方法通常包含載體,載體在裝載站處接收晶圓且將該晶圓輸送至拾取站;在拾取站處,拾取晶圓上的半導體組件且使其移動至可旋轉塔上,可旋轉塔將相應的所拾取組件中之每一者輸送至位於塔的周邊處的一系列處理/測試站。Existing assemblies and methods for processing semiconductor wafers typically include a carrier that receives the wafer at a loading station and delivers the wafer to a pickup station where semiconductor components on the wafer are picked up and moved onto the rotatable tower, which transports each of the respective picked-up components to a series of processing/testing stations located at the perimeter of the tower.
不利的是,當晶圓上的所有半導體組件已被拾取時,塔及處理/測試站在載體自拾取站移動至裝載站時的時段期間,在載體在裝載站處被再裝載新的晶圓(具有更多待拾取的半導體組件)時的時段期間,且在載體再次自裝載站移動回至拾取站時的時段期間經受空閒的停機時間。Disadvantageously, the tower and processing/testing station is reloaded with new wafers at the loading station during the period when the carrier moves from the pickup station to the loading station when all semiconductor components on the wafer have been picked up (with more semiconductor components to be picked up), and during the period when the carrier is again moved from the loading station back to the picking station, is subject to idle downtime.
此外,在用於處理半導體晶圓之現有總成及方法中,裝載晶圓及自載體卸載晶圓是耗時的且常常需要複雜的總成。Furthermore, in existing assemblies and methods for processing semiconductor wafers, loading and unloading wafers from carriers is time-consuming and often requires complex assemblies.
本發明之一目的是消除或減輕與現有晶圓處理總成及用於處理晶圓之現有方法相關聯的缺點中之至少一些。It is an object of the present invention to eliminate or mitigate at least some of the disadvantages associated with existing wafer processing assemblies and existing methods for processing wafers.
發明概要Summary of Invention
根據本發明,提供了一種用於處理半導體晶圓之總成,其具有獨立請求項1中所述的特徵;以及一種處理半導體晶圓之方法,其包含執行請求項13中所述的步驟。According to the invention, there is provided an assembly for processing semiconductor wafers, having the features described in
附屬請求項陳述了較佳實施例的可選特徵。The dependent claims set forth optional features of the preferred embodiment.
較佳實施例之詳細說明DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
圖1及圖2係根據本發明之示範性實施例之晶圓處理總成1的示範性實施例的透視圖,晶圓處理總成1可用於執行根據根據本發明之示範性實施例之方法。FIGS. 1 and 2 are perspective views of an exemplary embodiment of a
參考圖1及圖2,可看出,總成1包含第一晶圓固持器2a及第二晶圓固持器2b,其中每一者可固持相應的晶圓3,晶圓3包含半導體組件3a。Referring to Figures 1 and 2, it can be seen that the
總成1進一步包含載體5,其選擇性地可操作來攜載該等晶圓固持器2a、2b中之一者以將該晶圓固持器移動至總成1內的預定義的不同位置。The
總成包含拾取站7、裝載站8及中間休息站9。拾取站7包含用以自已由載體5送至拾取站之晶圓固持器2a、2b上的晶圓拾取半導體組件的構件。裝載站8包含用以將具有半導體組件的晶圓裝載至位於裝載站8處的晶圓固持器2a、2b上的構件。中間休息站9包含可在其中停放晶圓固持器2a、2b的區域。The assembly includes a pick-
應理解,可使用任何適合的構件來拾取組件3a,在此實例中,使用拾取工具上的組件處理頭來拾取組件;然後移動拾取工具上的組件處理頭以將所拾取組件送至在可旋轉塔上的相應組件處理頭下方的位置;可旋轉塔上的組件處理頭然後自拾取工具上的組件處理頭拾取組件。有多個不同的處理及/或測試站位於可旋轉塔的周邊處,且塔交互地旋轉以將每個所拾取組件輸送至每個相應的處理及/或測試站。It will be appreciated that any suitable means may be used to pick up the
總成1進一步包含傳輸構件10,其選擇性地可操作來將晶圓固持器2a、2b自中間休息站9移動至裝載站8。在此實例中,傳輸構件10包含位於中間休息站9處的第一對夾緊構件11a,b、位於裝載站8處的第二對夾緊構件12a,b、以及傳輸臂13。傳輸臂13經組配以使得它可選擇性地移動至第一位置及第二位置,其中在該第一位置中,傳輸臂13可與由第一對夾緊構件11a,b固持之晶圓固持器2a,b機械配合以固持該晶圓固持器,且在該第二位置中,位於裝載站8處的第二對夾緊構件12a,b可夾緊由傳輸臂13固持之晶圓固持器2a,b。The
總成進一步包含控制器20,其可經組配來操作該載體5及傳輸構件10,使得載體5將第二晶圓固持器2b自裝載站8移動至拾取站7,其中在拾取站7處,可自固持在第二晶圓固持器2b上的晶圓3拾取該晶圓上的上的半導體組件3a;且使得在載體5已自裝載站8移動第二晶圓固持器2b之後,傳輸構件10將第一晶圓固持器2a自中間休息站9移動至裝載站8,使得在於拾取站7處拾取固持在第二晶圓固持器2b上的晶圓3上的半導體組件3a時,將包含待拾取的半導體組件3a的晶圓3裝載至第一晶圓固持器2a上。The assembly further includes a
在此總成1實施例中,控制器20進一步經組配來操作該載體5及傳輸構件10,使得在已拾取第二晶圓固持器2b上的晶圓3上的所有半導體組件3a之後,載體5將第二晶圓固持器2b自拾取站7移動至中間休息站9;使得在第一晶圓固持器2a位於裝載站8處的同時,第二晶圓固持器2b (它現在固持空的晶圓3 (即,不再具有半導體組件3a的晶圓3))位於中間休息站9處。In this embodiment of the
應理解,在本申請中,較佳地,晶圓3包含附接至晶圓環的晶圓箔;半導體組件3位於晶圓箔上。It should be understood that in the present application, the
圖3提供第一晶圓固持器2a及第二晶圓固持器2b的透視圖(在圖3中,第一晶圓固持器2a位於中間站9處且第二晶圓固持器2b位於裝載站8處)及載體5的透視圖。第一晶圓固持器2a及第二晶圓固持器2b中之每一者包含:基底平台構件31,其包含突出部分33,晶圓箔3可支撐在突出部分33上,晶圓箔3具有附接至其的半導體組件3a;以及頂部構件34,其中頂部構件具有界定於其中的孔32,孔32可接收基底平台構件31的突出部分33。Figure 3 provides a perspective view of the
基底平台構件31進一步包含第一邊緣35,且頂部構件34包含第二邊緣36,且其中基底平台構件31及頂部構件34可經選擇性地配置來夾緊晶圓箔3所附接至的晶圓環;且其中當基底平台構件31及頂部構件34經選擇性地配置來夾緊晶圓環時,基底平台構件31的突出部分33向界定於頂部構件34中的孔32中突出,使得附接至晶圓環的晶圓箔被拉伸。The
第一晶圓固持器2a及第二晶圓固持器2b中之每一者包含可旋轉台39,其中基底平台構件31附接至台39;其中該台39包含邊緣構件38。Each of the
圖3亦展示出載體5包含致動器37;當晶圓固持器2a,b支撐在載體5上時,致動器37可與相應的晶圓固持器2a,b的邊緣構件38機械配合;且致動器可經選擇性地操作來旋轉該晶圓固持器2a,b的台39。如所展示,致動器37包含輪構件40,輪構件40包含溝槽41,且其中溝槽41所具有的尺寸使得當晶圓固持器2a,b支撐在載體5上時,台39的邊緣構件38抵接界定了溝槽41的表面;當致動器37經致動時,輪構件40旋轉,且輪構件40的旋轉將力施加至晶圓固持器2a,b的台39的邊緣構件38以實現台39的旋轉。3 also shows that the
致動器37進一步包含偏壓構件43(在此實例中,其包含彈簧43),當晶圓固持器2a,b支撐在載體5上時,偏壓構件43將輪構件40朝向抵接台39之邊緣構件38偏壓。致動器37進一步包含槓桿構件43b,其經組配以使得當力施加至槓桿構件43b時,輪構件40抵抗偏壓構件43而在離開邊緣構件38的方向上移動。The
再次參考圖1,可看出,總成1進一步包含第一凸輪構件48a及第二凸輪構件48b。第一凸輪構件48a經定位以使得當載體5向中間休息站9中移動時,載體5向中間休息站9中的移動致使第一凸輪構件48a將力施加至屬於載體5之致動器37的槓桿構件43b,使得輪構件40抵抗偏壓構件43而在離開支撐在載體5上之晶圓固持器2a,b的邊緣構件38的方向上移動,然後,位於中間休息站9處的第一對夾緊構件11a,b將晶圓固持器2a,b從載體5中移出。總成進一步包含第二凸輪構件48b。第二凸輪構件48b經定位以使得當載體5向裝載站8中移動時,載體5向裝載站8中的移動致使第二凸輪構件48b將力施加至屬於載體5之致動器37的槓桿構件43b,使得輪構件40抵抗偏壓構件而移動,使得輪構件40從正在裝載站8處傳遞至載體5上之晶圓固持器2a,b的台39的邊緣構件38的路徑中移出;隨後,當載體5從裝載站8中移出時,第二凸輪構件48b施加至槓桿構件43b的力被移除且偏壓構件43使輪構件40移動以抵接已在裝載站8處傳遞至載體5上之晶圓固持器2a,b的台39的邊緣構件38。Referring again to Figure 1, it can be seen that the
總成1可用於執行根據本發明之另一態樣之晶圓處理方法。應理解,本發明之方法不限於要求使用總成1,而是可使用任何適合的總成來執行本發明之該方法。將描述方法之示範性實施例,其使用上文所描述之總成1。在下文中,將描述方法之特定實施例,然而應理解,唯有在本申請案之獨立方法請求項中陳述的方法步驟是本發明必不可少的,所有其他所描述之方法步驟是可選的步驟。The
本發明之方法之較佳實施例包含以下步驟,
在已於拾取站處拾取第一晶圓固持器2a上的晶圓3的半導體組件3a之後,將第一晶圓固持器2a自拾取站7移動至中間休息站9 (如圖4所例示);
在中間休息站9處將第一晶圓固持器2a自載體5傳輸至傳輸構件10;圖5及圖6例示出當載體5使第一晶圓固持器2a向中間休息站中移動時,載體5之致動器37及第一凸輪48a的操作;因此,在方法之此階段處,在第二晶圓固持器2b位於裝載站8處的同時,第一晶圓固持器2a位於中間休息站9處。圖5及圖6例示出當載體5使第一晶圓固持器2a向中間休息站中移動時,載體5之致動器37及第一凸輪48a的操作。如圖5及圖6所例示,載體5向中間休息站9中的移動致使第一凸輪構件48a將力施加至屬於載體5之致動器37的槓桿構件43b,使得輪構件40抵抗偏壓構件43而在離開支撐在載體5上之第一晶圓固持器2a的邊緣構件38的方向上移動;然後,位於中間休息站9處的第一對夾緊構件11a,b將第一晶圓固持器2a從載體5中移出(如圖7a所展示)。
A preferred embodiment of the method of the present invention comprises the following steps,
After the
位於中間休息站9處的第一對夾緊構件11a,b移動第一晶圓固持器2a,自第一對夾緊構件11a,b傳輸至傳輸臂13;使得傳輸臂13現在固持第一晶圓固持器2a。如圖7b所展示,在第一對夾緊構件11a,b將第一晶圓固持器2a從載體5中移出之後,載體然後自中間休息站9移動至在裝載站8處的第二晶圓固持器2b下方的位置。重要的是,第二晶圓固持器2b已裝載有包含待拾取的半導體組件3a的晶圓3,且已在裝載站8中由第二對夾緊構件12a,b移動至升高位置以允許有足夠的空間供載體在第二晶圓固持器2b下方移動(因此,方法進一步包含以下步驟:給第二晶圓固持器2b裝載包含待拾取的半導體組件3a的晶圓3,以及使用第二對夾緊構件12a,b將第二晶圓固持器2b移動至裝載站8中的位置以允許有足夠的空間供載體在第二晶圓固持器2b下方移動)。如圖8所例示,第二對夾緊構件12a,b然後移動以在裝載站處將第二晶圓固持器2b傳遞至載體5上。圖8亦例示出當載體5向裝載站中移動且第二晶圓固持器被置放至載體5上時,載體5上的致動器37及第二凸輪48b的操作。當載體5向裝載站8中移動時,載體5向裝載站8中的移動致使第二凸輪構件48b將力施加至屬於載體5之致動器37的槓桿構件43b,使得輪構件40抵抗偏壓構件43而移動,使得輪構件40從正在裝載站8處傳遞至載體5上之第二晶圓固持器2b的台39的邊緣構件38的路徑中移出;隨後,當載體5從裝載站8中移出時,第二凸輪構件48b施加至槓桿構件43b的力被移除且偏壓構件43使輪構件40移動以抵接第二晶圓固持器2b的台39的邊緣構件38。The first pair of
方法包含以下步驟,
在包含待拾取的半導體組件3a的晶圓3已裝載至第二晶圓固持器2b上之後,使用載體將第二晶圓固持器2b自裝載站8移動至拾取站7(如圖9所例示);
在載體5自裝載站移動第二晶圓固持器2b之後,使用傳輸構件10將第一晶圓固持器2a自中間休息站9移動至裝載站8 (如圖10及圖11所例示);
在拾取站處自固持在第二晶圓固持器2b上的晶圓3拾取半導體組件3a;
在於拾取站7處自固持在第二晶圓固持器2b上的晶圓3拾取該晶圓上的半導體組件3a時,在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第一晶圓固持器2a上(如圖12至圖14所例示)。
The method contains the following steps,
After the
較佳方法進一步包含以下步驟,
在已拾取第二晶圓固持器2b上的晶圓3上的半導體組件3a之後,將第二晶圓固持器2b自拾取站7移動至中間休息站9;使得在方法之此階段處,在第一晶圓固持器2a位於裝載站8處的同時,第二晶圓固持器2b位於中間休息站9處;
在中間休息站9處將第二晶圓固持器2b自載體5傳輸至傳輸構件10;
將載體5自中間休息站9移動至裝載站8,且在裝載站8處將第一晶圓固持器2a傳輸至載體5上(在包含待拾取的半導體組件3a的晶圓3已裝載至第一晶圓固持器2a上之後);
使用載體5將第一晶圓固持器2a (它現在固持具有將要在拾取站7處拾取的半導體組件3a的晶圓3)自裝載站8移動至拾取站7;
在載體自裝載站8移動第一晶圓固持器2a之後,使用傳輸構件10將第二晶圓固持器2b自中間休息站移動至裝載站8;
在拾取站8處自固持在第一晶圓固持器2a上的晶圓3拾取半導體組件;
在於拾取站7處拾取固持在第一晶圓固持器2a上的晶圓3上的半導體組件3a時,在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第二晶圓固持器2b上。
The preferred method further comprises the following steps,
After the
在最佳的實施例中,將上文所提及之步驟重複多次。In a preferred embodiment, the above-mentioned steps are repeated multiple times.
如上文已提及,較佳地,晶圓3包含附接至晶圓環的晶圓箔;半導體組件3位於晶圓箔上。As already mentioned above, the
在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第一晶圓固持器2a上的步驟較佳地包含:將晶圓3傳輸至第一晶圓固持器2a的基底平台構件31上,晶圓3包含晶圓環,晶圓環包含附接至其的晶圓箔,且晶圓3包含附接至晶圓箔的半導體組件;以及移動第一晶圓固持器2a的頂部構件34,使得晶圓環夾緊在第一晶圓固持器2a的基底平台構件31與頂部構件34之間;以及使基底平台構件31的突出部分33向界定於頂部構件34中的孔32中移動,使得晶圓箔被拉伸。類似地,在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第二晶圓固持器2b上的步驟包含:將晶圓3傳輸至第二晶圓固持器2b的基底平台構件32上,晶圓3包含晶圓環,晶圓環包含附接至其的晶圓箔,且晶圓3包含附接至晶圓箔的半導體組件;以及移動第二晶圓固持器2b的頂部構件34,使得晶圓環夾緊在第二晶圓固持器2b的基底平台構件31與頂部構件34之間;以及使基底平台構件31的突出部分33向界定於頂部構件34中的孔32中移動,使得晶圓箔被拉伸。The step of loading the
在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第一晶圓固持器2a上的步驟在圖12至圖14中例示出;更精確地,圖12例示出空的晶圓(即,已在拾取站7處自其拾取了所有半導體組件的晶圓)的卸載,且圖13例示出將包含待拾取的半導體組件3a之新的晶圓裝載至第一晶圓固持器2a上,且圖14例示出第一晶圓固持器的閉合,使得晶圓牢固地固持在第一晶圓固持器上且晶圓的晶圓箔被拉伸。應理解,雖然圖12至圖14例示出在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第一晶圓固持器2a上的步驟,但是當在裝載站8處將包含待拾取的半導體組件3a的晶圓3裝載至第二晶圓固持器2b上時,執行相同的步驟。參考圖12,為了自第一晶圓固持器2a卸載空的晶圓,將第一晶圓固持器2a的頂部構件34從基底平台構件31移開,使得第一晶圓固持器2a上的空的晶圓3之晶圓環60被鬆開;一旦鬆開,就將空的晶圓3自第一晶圓固持器2a移動至匣61a中。參考圖13,然後將包含待拾取的半導體組件3a的新的晶圓3自匣61a移動至第一晶圓固持器2a中;具體而言,將新的晶圓3移動至第一晶圓固持器2a的基底平台構件31上,使得新的晶圓3定位在第一晶圓固持器2a的頂部構件34與基底平台構件31之間。參考圖14,使第一晶圓固持器2a的頂部構件34朝向基底平台構件31移動,使得新的晶圓3的晶圓環60夾緊在基底平台構件31的第一邊緣35與頂部構件34的第二邊緣36之間;此夾緊確保新的晶圓3牢固地固持在第一晶圓固持器2a上。另外,當第一晶圓固持器2a的頂部構件34朝向基底平台構件31移動時,基底平台構件31的突出部分33向界定於頂部構件34中的孔32中突出,使得新的晶圓3的晶圓箔60b被拉伸,晶圓箔60b附接至新的晶圓的晶圓環60。The step of loading the
在中間休息站9處將第二晶圓固持器2b自載體5傳輸至傳輸構件10的步驟包含:使用位於中間休息站9處的第一對夾緊構件11a,b夾緊第二晶圓固持器2b;使用第一對夾緊構件11a,b使第二晶圓固持器2b朝向傳輸臂13移動,使得傳輸臂13與第二晶圓固持器2b機械配合;以及然後將第一對夾緊構件11a,b從第二晶圓固持器2b移開,使得第二晶圓固持器2b僅僅由傳輸臂13固持。The step of transferring the
在中間休息站9處將第一晶圓固持器2a自載體5傳輸至傳輸構件10的步驟包含:使用位於中間休息站9處的第一對夾緊構件11a,b夾緊第一晶圓固持器2a;使用第一對夾緊構件11a,b使第一晶圓固持器2a朝向傳輸臂13移動,使得傳輸臂13與第一晶圓固持器2a機械配合;以及然後將第一對夾緊構件11a,b從第一晶圓固持器2a移開,使得第一晶圓固持器2a僅僅由傳輸臂13固持。The step of transferring the
在實施例中,使用傳輸構件10將第一晶圓固持器2a自中間休息站9移動至裝載站8的步驟包含:移動傳輸臂13,使得傳輸臂13將第一晶圓固持器2a自中間休息站9移動至裝載站8。如圖10所例示,中間休息站9處的第一對夾緊構件11a,b自載體5提升第一晶圓固持器2a;第一對夾緊構件11a,b移動第一晶圓固持器2a,使得第一晶圓固持器2a被傳輸至傳輸臂13。傳輸臂13然後沿著軌道13b自中間休息站9移動至裝載站8,從而將第一晶圓固持器2a自中間休息站9輸送至裝載站8。在裝載站8處,第二對夾緊構件12a,b移動來夾緊由傳輸臂13固持的第一晶圓固持器2a,一旦第二對夾緊構件12a,b已夾緊第一晶圓固持器2a,就自傳輸臂13釋放第一晶圓固持器2a,使得第一晶圓固持器2a僅僅由第二對夾緊構件12a,b固持。傳輸臂13然後沿著軌道13b自裝載站8移動回到中間休息站9。在較佳實施例中,如圖11所展示,第二對夾緊構件12a,b使第一晶圓固持器2a離開傳輸臂13向下移動,使得第一晶圓固持器2a不會阻礙傳輸臂13自裝載站8回到中間休息站9的移動。類似地,在實施例中,使用傳輸構件10將第二晶圓固持器2b自中間休息站9移動至裝載站8的步驟包含:移動傳輸臂13,使得傳輸臂13將第二晶圓固持器2b自中間休息站9移動至裝載站8。應理解,當將第二晶圓固持器2b自中間休息站9移動至裝載站8時,執行與上文所描述相同的步驟。In an embodiment, the step of using the
方法較佳地包含以下步驟:在傳輸構件10將第二晶圓固持器2b自中間休息站9移動至裝載站8之後,使用位於裝載站8處的第二對夾緊構件12a,b夾緊第二晶圓固持器2b;以及使用第二對夾緊構件12a,b將第二晶圓固持器2b從傳輸臂13移開,使得第二晶圓固持器2b僅僅由第二對夾緊構件12a,b固持。類似地,方法較佳地包含以下步驟:在傳輸構件10將第一晶圓固持器2a自中間休息站9移動至裝載站8之後,使用位於裝載站8處的第二對夾緊構件12a,b夾緊第一晶圓固持器2a;以及使用第二對夾緊構件12a,b將第一晶圓固持器2a從傳輸臂13移開,使得第一晶圓固持器2a僅僅由第二對夾緊構件12a,b固持。在此等實施例中,在第一晶圓固持器或第二晶圓固持器已裝載有待拾取的半導體組件之後,載體5自夾緊構件12a,b接收經裝載的晶圓固持器2a,b,然後將經裝載的晶圓固持器2a,b輸送至拾取站7。The method preferably comprises the steps of: after the
在實施例中,在裝載站8處將包含待拾取的半導體組件的晶圓裝載至第二晶圓固持器2b上的步驟是在第二晶圓固持器2b僅僅由第二對夾緊構件12a,b固持時進行。類似地,在裝載站8處將包含待拾取的半導體組件的晶圓裝載至第一晶圓固持器2a上的步驟是在第一晶圓固持器2a僅僅由第二對夾緊構件12a,b固持時進行。In an embodiment, the step of loading the wafer containing the semiconductor components to be picked up onto the
在不脫離如所附申請專利範圍中定義的本發明之範疇的情況下,本發明所述實施例之各種修改及變化對於熟習此項技術者來說將顯而易見。儘管已經結合特定較佳實施例描述了本發明,但是應理解,所主張之本發明不應不適當地限於此種特定實施例。Various modifications and variations of the described embodiments of this invention will become apparent to those skilled in the art without departing from the scope of the invention as defined in the appended claims. Although the present invention has been described in connection with specific preferred embodiments, it should be understood that the invention as claimed should not be unduly limited to such specific embodiments.
1:總成
2a:第一晶圓固持器
2b:第二晶圓固持器
3:晶圓
3a:半導體組件
5:載體
7:拾取站
8:裝載站
9:中間休息站
10:傳輸構件
11a,11b:第一對夾緊構件
12a,12b:第二對夾緊構件
13:傳輸臂
13b:軌道
20:控制器
31:基底平台構件
32:孔
33:突出部分
34:頂部構件
35:第一邊緣
36:第二邊緣
37:致動器
38:邊緣構件
39:可旋轉台
40:輪構件
41:溝槽
43:偏壓構件
43b:槓桿構件
48a:第一凸輪構件
48b:第二凸輪構件
60:晶圓環
60b:晶圓箔
61a:匣
1:
在描述中揭示本發明的示範性實施例且藉由圖式例示出該等實施例,在圖式中:
圖1及圖2提供根據本發明之實施例之總成1的透視圖;
圖3提供在圖1及圖2之總成中使用的第一及第二晶圓固持器及載體的透視圖;
圖4例示出載體將晶圓固持器自拾取站移動至總成的中間休息站的步驟;
圖5及圖6例示出當載體使晶圓固持器向中間休息站中移動時,總成的致動器及凸輪的操作;
圖7a例示出其中藉由第一對夾緊構件提升中間休息站中的第一晶圓固持器以便自載體移除第一晶圓固持器的步驟;圖7a亦例示出已藉由第二對夾緊構件將裝載站中的第二晶圓固持器移動至升高位置以便提供空間來允許載體在第二晶圓固持器下方移動;圖7b例示出在第二晶圓固持器下方移動的載體。
圖8例示出其中使裝載站中的第二晶圓固持器離開圖7所展示的升高位置向下移動至載體上的步驟;且亦例示出在第二晶圓固持器已置放於載體上之後,致動器對載體的操作;
圖9例示出其中將第二晶圓固持器自裝載站移動至拾取站的步驟,第二晶圓固持器已裝載有具有待拾取的半導體組件的晶圓(參見圖7);
圖10例示出其中藉由傳輸臂將第一晶圓固持器自中間休息站移動至裝載站的步驟;
圖11例示出其中將第一晶圓固持器自傳輸臂傳輸至位於裝載站處的第一對夾緊構件的步驟;
圖12例示出其中將第一晶圓固持器上的空的晶圓(即,已從中拾取了所有半導體組件的晶圓)自第一晶圓固持器移除且置放至匣中的步驟;
圖13例示出其中將具有待拾取的半導體組件的晶圓自匣裝載至第一晶圓固持器上的步驟;
圖14例示出其中將第一晶圓固持器組配來夾緊晶圓且拉伸晶圓箔的步驟;且藉由第一對夾緊構件提升第一晶圓固持器以便提供空間來允許載體在第一晶圓固持器下方移動。
Exemplary embodiments of the invention are disclosed in the description and illustrated by the drawings, in which:
1 and 2 provide perspective views of an
1:總成 1: Assembly
2a:第一晶圓固持器 2a: First wafer holder
2b:第二晶圓固持器 2b: Second wafer holder
3:晶圓 3: Wafer
3a:半導體組件 3a: Semiconductor components
5:載體 5: Carrier
7:拾取站 7: Pickup Station
8:裝載站 8: Loading Station
9:中間休息站 9: Intermediate rest stop
10:傳輸構件 10: Transmission components
11a,11b:第一對夾緊構件 11a, 11b: The first pair of clamping members
12a,12b:第二對夾緊構件 12a, 12b: Second pair of clamping members
13:傳輸臂 13: Transmission arm
20:控制器 20: Controller
48a:第一凸輪構件 48a: first cam member
48b:第二凸輪構件 48b: Second cam member
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CN115069653A (en) * | 2022-08-23 | 2022-09-20 | 智程半导体设备科技(昆山)有限公司 | Groove type wafer cleaning equipment and use method |
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KR100634869B1 (en) * | 2005-05-30 | 2006-10-17 | 삼성전자주식회사 | Apparatus for attaching multi-die |
US20080075563A1 (en) * | 2006-09-27 | 2008-03-27 | Mclane James R | Substrate handling system and method |
US9881820B2 (en) * | 2015-10-22 | 2018-01-30 | Lam Research Corporation | Front opening ring pod |
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CN115069653A (en) * | 2022-08-23 | 2022-09-20 | 智程半导体设备科技(昆山)有限公司 | Groove type wafer cleaning equipment and use method |
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WO2022090823A1 (en) | 2022-05-05 |
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