TW202210409A - Method for removing hydrogen peroxide from sulfuric acid - Google Patents

Method for removing hydrogen peroxide from sulfuric acid Download PDF

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TW202210409A
TW202210409A TW109131566A TW109131566A TW202210409A TW 202210409 A TW202210409 A TW 202210409A TW 109131566 A TW109131566 A TW 109131566A TW 109131566 A TW109131566 A TW 109131566A TW 202210409 A TW202210409 A TW 202210409A
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sulfuric acid
hydrogen peroxide
catalyst
removing hydrogen
chemical reaction
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TW109131566A
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黃建銘
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淨寶化工股份有限公司
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Abstract

A method for removing hydrogen peroxide from sulfuric acid comprises the following steps: Add catalysts into the feedstock, perform cooling, remove metal in sulfuric acid, and obtain high purity dilute sulfuric acid after filtration. The present invention eventually generates metal sulfide and high purity dilute sulfuric acid (completely without hydrogen peroxide) whereas both materials can be recycled and re-used. Therefore, the effect of recycle and reuse of polybasic products can be achieved. The present invention will not produce chloride ions and thus reduce the additional risk that the equipment may be corroded. Furthermore, the present invention can completely remove hydrogen peroxide from sulfuric acid and produce high purity dilute sulfuric acid. High purity dilute sulfuric acid can directly serve as the raw material for various processing chemical reactions to achieve the goal of highly purifying waste sulfuric acid as well as recycle and reuse with high efficiency. Thus, the sustainable utilization rate of waste sulfuric acid is enhanced.

Description

去除硫酸中雙氧水的方法Method for removing hydrogen peroxide in sulfuric acid

本發明係關於一種去除硫酸中雙氧水的方法,特別係指可使具有雙氧水的廢硫酸產生更充分再利用之去除硫酸中雙氧水的方法。The present invention relates to a method for removing hydrogen peroxide in sulfuric acid, in particular, it refers to a method for removing hydrogen peroxide in sulfuric acid which can make waste sulfuric acid with hydrogen peroxide to be more fully reused.

半導體業晶圓代工廠在晶圓製程中以高純度之硫酸清洗矽晶圓表面,主要用於光阻去除後之矽晶圓清洗,使用的硫酸(H2 SO4 )加入雙氧水(H2 O2 ),形成為一強氧化劑,而將晶片中的有機物氧化分解為 CO2 和 H2 O,最後產生了所謂廢硫酸;而該廢硫酸中主成份係含有硫酸(H2 SO4 )的濃度約 40%-85%、雙氧水(H2 O2 )約 4%∼8%左右、其他主要為水份。The wafer foundry in the semiconductor industry cleans the surface of silicon wafers with high - purity sulfuric acid during the wafer manufacturing process, mainly for cleaning silicon wafers after photoresist removal . 2 ), forming a strong oxidant, and oxidatively decomposes the organic matter in the wafer into CO 2 and H 2 O, and finally produces the so-called waste sulfuric acid; and the main component in the waste sulfuric acid is the concentration of sulfuric acid (H 2 SO 4 ) About 40%-85%, hydrogen peroxide (H 2 O 2 ) about 4% to 8%, and the rest are mainly water.

然而,廢硫酸中的雜質過多,尤其是廢硫酸含有的雙氧水(H2 O2 )為強氧化劑,所以會限制硫酸(H2 SO4 )的再利用性,因此廢硫酸無法直接回到晶圓製程再次使用;晶圓代工廠對於廢硫酸處理的再利用做法,通常都會將廢硫酸中的雙氧水(H2 O2 )去除並生成其他再利用的產物,以此作為對於廢硫酸的處理方式。However, there are too many impurities in the waste sulfuric acid, especially the hydrogen peroxide (H 2 O 2 ) contained in the waste sulfuric acid is a strong oxidant, so it will limit the reusability of the sulfuric acid (H 2 SO 4 ), so the waste sulfuric acid cannot be directly returned to the wafer. The process is reused; the foundry's reuse of waste sulfuric acid treatment usually removes the hydrogen peroxide (H 2 O 2 ) in the waste sulfuric acid and generates other reused products as a treatment method for waste sulfuric acid.

習知去除廢硫酸中雙氧水的方法很多種,目前以下列兩種最廣為使用,一種方法係將廢硫酸中加入鹽酸(HCl)進行化學反應,鹽酸(HCl)是反應物也是催化物,其主要化學反應為:H2 O2 + 2HCl→ Cl2(g) + 2H2 O;另一種方法係將廢硫酸中加入活性碳或是酵素,而後達成分解雙氧水(H2 O2 )的效果。There are many known methods for removing hydrogen peroxide in waste sulfuric acid. At present, the following two are most widely used. One method is to add hydrochloric acid (HCl) to waste sulfuric acid for chemical reaction. The main chemical reaction is: H 2 O 2 + 2HCl→ Cl 2(g) + 2H 2 O; another method is to add activated carbon or enzymes to waste sulfuric acid, and then achieve the effect of decomposing hydrogen peroxide (H 2 O 2 ).

然而,習知去除廢硫酸中雙氧水的方法具有下列缺失:However, the conventional method for removing hydrogen peroxide in waste sulfuric acid has the following deficiencies:

1.廢硫酸中加入鹽酸(HCl),雖然可去除廢硫酸中的部分雙氧水(H2 O2 ),但是最後的產物會產生含氯離子(Cl- )的稀硫酸(H2 SO4 ),氯離子(Cl- )會造成產品加工過程出現問題,製程設備可能因此容易受到腐蝕,最後導致加工產品品質不佳。1. Adding hydrochloric acid (HCl) to waste sulfuric acid, although part of hydrogen peroxide (H 2 O 2 ) in waste sulfuric acid can be removed, the final product will produce dilute sulfuric acid (H 2 SO 4 ) containing chloride ions (Cl - ), Chloride ions (Cl - ) can cause problems in product processing, and process equipment may be easily corroded, resulting in poor quality of processed products.

2.廢硫酸中加入酵素,雖然可去除廢硫酸中的部分雙氧水,但其去除率不高,而且化學反應時間很長,最後導致處理成本提高許多。2. Adding enzymes to waste sulfuric acid can remove part of hydrogen peroxide in waste sulfuric acid, but its removal rate is not high, and the chemical reaction time is very long, which finally leads to a lot of increase in treatment costs.

有鑑於此,本案申請人遂依其多年從事相關領域之研發經驗,針對前述之缺失進行深入探討,並依前述需求積極尋求解決之道,歷經長時間的努力研究與多次測試,終於完成本發明。In view of this, the applicant of this case, based on his years of experience in research and development in related fields, conducted in-depth discussions on the aforementioned deficiencies, and actively sought solutions based on the aforementioned needs. invention.

本發明之主要目的在於一種去除硫酸中雙氧水的方法,更進一步而言係可使具有雙氧水的廢硫酸產生更充分再利用之去除硫酸中雙氧水的方法。The main purpose of the present invention is a method for removing hydrogen peroxide in sulfuric acid, and further speaking, a method for removing hydrogen peroxide in sulfuric acid by making waste sulfuric acid with hydrogen peroxide to be more fully reused.

為達上述目的,本發明去除硫酸中雙氧水的方法,係包含有下列步驟S1~S5:In order to achieve the above-mentioned purpose, the present invention removes the method for hydrogen peroxide in sulfuric acid, and includes the following steps S1~S5:

S1進料步驟:以含有雙氧水(H2 O2 )0.1%~10%的硫酸(H2 SO4 )為原料進料;S1 feeding step: take sulfuric acid (H 2 SO 4 ) containing hydrogen peroxide (H 2 O 2 ) 0.1% to 10% as raw material feed;

S2加入觸媒步驟:加入金屬類或金屬氧化物做為觸媒進行化學反應以去除雙氧水(H2 O2 );S2 adding catalyst step: adding metal or metal oxide as catalyst to carry out chemical reaction to remove hydrogen peroxide (H 2 O 2 );

S3降溫步驟:硫酸(H2 SO4 )與觸媒進行化學反應產生放熱現象,使用降溫設備進行溫度控制;S3 cooling step: sulfuric acid (H 2 SO 4 ) chemically reacts with the catalyst to generate exothermic phenomenon, and temperature control is performed using cooling equipment;

S4去除金屬步驟:硫酸(H2 SO4 )與觸媒進行化學反應後生成含有金屬離子的硫酸(H2 SO4 ),因此加入二價硫(S2- )物質將金屬進行化學反應生成金屬硫化物;S4 metal removal step: sulfuric acid (H 2 SO 4 ) chemically reacts with the catalyst to generate sulfuric acid (H 2 SO 4 ) containing metal ions, so divalent sulfur (S 2- ) substances are added to chemically react the metal to generate metal sulfide;

S5過濾步驟:將反應生成的產物進行過濾分離,可分離出高純度金屬硫化物以及高純度稀硫酸(H2 SO4 )。S5 Filtration step: The product generated by the reaction is filtered and separated, and high-purity metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ) can be separated.

其中,S5過濾步驟後可加入活性碳進行除味,使過濾後所生成的產品減少異味,以維持產品品質。Among them, activated carbon can be added after the filtration step S5 for deodorization, so that the product generated after filtration can reduce the peculiar smell, so as to maintain the product quality.

其中,S4去除金屬步驟中的二價硫(S2- )物質在輸入進行化學反應時,可以透過ORP(氧化還原電位)控制裝置控制其輸入的劑量;而二價硫(S2- )物質可以為硫氫化鈉(NaHS)、硫化鈉(Na2 S)、有機硫或硫化氫(H2 S)等二價硫(S2- )物質,該二價硫(S2- )物質之供應來源可以透過市售的二價硫(S2- )物質作為供應使用,以確保含有金屬離子的硫酸(H2 SO4 )有穩定及適當的二價硫(S2- )物質來源,以此達到穩定進行去除金屬離子的化學反應目的。Among them, when the divalent sulfur (S 2- ) substance in the metal removal step of S4 is input for chemical reaction, the input dose can be controlled by the ORP (redox potential) control device; while the divalent sulfur (S 2- ) substance It can be divalent sulfur (S 2- ) substances such as sodium hydrosulfide (NaHS), sodium sulfide (Na 2 S), organic sulfur or hydrogen sulfide (H 2 S), the supply of the divalent sulfur (S 2- ) substances The source can be supplied through commercially available divalent sulfur (S 2- ) substances to ensure that the sulfuric acid (H 2 SO 4 ) containing metal ions has a stable and appropriate source of divalent sulfur (S 2- ) substances, thereby To achieve the purpose of stably carrying out the chemical reaction of removing metal ions.

藉由本發明去除硫酸中雙氧水的方法,最後可生成高純度金屬硫化物以及高純度稀硫酸(H2 SO4 ),其化學反應時間可透過加入的觸媒劑量、降溫設備、二價硫(S2- )物質劑量控制,因此可有效率的進行化學反應,而且最後生成的兩個產物皆可作為其它加工製程的原料或是其他用途使用,因此提高製程加工後的產物永續利用率,尤其是本發明最後生成可直接進行許多化學反應加工應用的高純度稀硫酸(H2 SO4 ),因此使得原本含有雙氧水的廢硫酸經過本發明處理後,可使用的用途範圍更為廣泛。By the method for removing hydrogen peroxide in sulfuric acid of the present invention, high-purity metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ) can finally be generated, and the chemical reaction time can be passed through the added catalyst dosage, cooling equipment, divalent sulfur (S 2- ) Substance dosage control, so chemical reaction can be carried out efficiently, and the two final products can be used as raw materials for other processing processes or used for other purposes, thus improving the sustainable utilization rate of products after process processing, especially The present invention finally produces high-purity dilute sulfuric acid (H 2 SO 4 ) that can be directly processed by many chemical reactions. Therefore, the waste sulfuric acid originally containing hydrogen peroxide can be used in a wider range of applications after being treated by the present invention.

為期許本發明之目的、功效、特徵及結構能夠有更為詳盡之瞭解,茲舉較佳實施例並配合圖式說明如後。In order to allow a more detailed understanding of the purpose, effect, features and structure of the present invention, preferred embodiments are given and described in conjunction with the drawings as follows.

首先請同時參閱圖1、圖2,圖1為本發明較佳實施例去除硫酸中雙氧水的方法之流程圖,圖2為本發明較佳實施例去除硫酸中雙氧水的方法之實施示意圖。First, please refer to Fig. 1 and Fig. 2 at the same time, Fig. 1 is a flow chart of a method for removing hydrogen peroxide in sulfuric acid according to a preferred embodiment of the present invention, and Fig. 2 is a schematic implementation diagram of a method for removing hydrogen peroxide in sulfuric acid according to a preferred embodiment of the present invention.

本發明較佳實施例去除硫酸中雙氧水的方法1,係包含有下列步驟S1~S5(如圖1所示),而本實施例係以氧化銅(CuO)為觸媒為例說明(如圖2所示):The method 1 of removing hydrogen peroxide in sulfuric acid according to a preferred embodiment of the present invention includes the following steps S1 to S5 (as shown in FIG. 1 ), and this embodiment is illustrated by taking copper oxide (CuO) as an example (as shown in FIG. 1 ) 2):

S1進料步驟:如圖2中的S101所示,以含有雙氧水(H2 O2 )0.1%~10%的硫酸(H2 SO4 )為原料進料;S1 feeding step: as shown in S101 in Figure 2, using sulfuric acid (H 2 SO 4 ) containing 0.1% to 10% of hydrogen peroxide (H 2 O 2 ) as raw material feed;

S2加入觸媒步驟:加入金屬類或金屬類化合物做為觸媒進行化學反應以去除雙氧水(H2 O2 );該觸媒可以為銅類或銅類化合物,例如氧化銅(CuO)、氫氧化銅(Cu(OH)2 )、碳酸銅(‎CuCO3 )、硫酸銅(‎CuSO4 )、金屬銅(Cu)等;該觸媒也可以為銀(Ag)或銀類化合物;該觸媒也可以為汞(Hg)或汞類化合物,而其中以氧化銅(CuO)做觸媒為最佳,因此本實施例係以氧化銅(CuO)做觸媒進行說明;S2 adding catalyst step: adding metal or metal compound as a catalyst for chemical reaction to remove hydrogen peroxide (H 2 O 2 ); the catalyst can be copper or copper compounds, such as copper oxide (CuO), hydrogen Copper oxide (Cu(OH) 2 ), copper carbonate (‎CuCO 3 ), copper sulfate (‎CuSO 4 ), metal copper (Cu), etc.; the catalyst can also be silver (Ag) or silver compounds; The catalyst can also be mercury (Hg) or mercury compounds, and among them, copper oxide (CuO) is the best catalyst, so this embodiment is described with copper oxide (CuO) as the catalyst;

如圖2中的S201、S202所示,當含有雙氧水(H2 O2 )的硫酸(H2 SO4 )加入氧化銅(CuO)做觸媒時,可使雙氧水(H2 O2 )分解的化學反應加速並生成硫酸銅(CuSO4 ),而氧化銅(CuO)投入的劑量可以按照雙氧水(H2 O2 )在硫酸(H2 SO4 )中的比例濃度進行調整,以使雙氧水(H2 O2 )得以完全分解而去除,而且不會產生非必要的生成物,主要只有金屬離子以及硫酸(H2 SO4 )。As shown in S201 and S202 in Figure 2, when sulfuric acid (H 2 SO 4 ) containing hydrogen peroxide (H 2 O 2 ) is added with copper oxide (CuO) as a catalyst, the hydrogen peroxide (H 2 O 2 ) can be decomposed. The chemical reaction is accelerated and copper sulfate (CuSO 4 ) is formed, and the dose of copper oxide (CuO) can be adjusted according to the proportional concentration of hydrogen peroxide (H 2 O 2 ) in sulfuric acid (H 2 SO 4 ), so that hydrogen peroxide (H 2 O 2 ) can be completely decomposed and removed without producing unnecessary products, mainly only metal ions and sulfuric acid (H 2 SO 4 ).

其中化學反應式主要如下:The chemical reaction formula is mainly as follows:

CuO(s) + H2 SO4(l) → CuSO4(l) + H2 O(l) CuO (s) + H 2 SO 4(l) → CuSO 4(l) + H 2 O (l)

2H2 O2  ( l ) Cu2+ 2H2 O( l ) + O2 ( g ) 2H2 O2 ( l ) Cu2+ 2H2 O( l ) + O2 ( g )

S3降溫步驟:硫酸(H2 SO4 )與觸媒進行化學反應產生放熱現象,使用降溫設備進行溫度控制;由於硫酸(H2 SO4 )與觸媒進行化學反應係屬連鎖反應,該反應過程的溫度會不斷的升高到反應物完全反應耗盡為止,因此若不對反應溫度進行控制,當溫度過高時就可能產生設備受損、甚至引發爆炸的危險,因此透過降溫設備將該反應溫度維持在60℃~90℃為佳,以保持溫度穩定進而使化學反應穩定進行。S3 cooling step: the chemical reaction between sulfuric acid (H 2 SO 4 ) and the catalyst produces exothermic phenomenon, and temperature control equipment is used for temperature control; since the chemical reaction between sulfuric acid (H 2 SO 4 ) and the catalyst is a chain reaction, the reaction process The temperature will continue to rise until the reactants are completely reacted and exhausted. Therefore, if the reaction temperature is not controlled, when the temperature is too high, the equipment may be damaged or even the danger of explosion may occur. It is better to maintain at 60℃~90℃ to keep the temperature stable and make the chemical reaction proceed stably.

S4去除金屬步驟:硫酸(H2 SO4 )與觸媒進行化學反應後生成含有金屬離子的硫酸(H2 SO4 ),因此加入二價硫(S2- )物質將金屬進行化學反應生成金屬硫化物;如圖2中的S401所示,以氧化銅(CuO)做觸媒、以硫化氫(H2 S)氣體做為二價硫(S2- )物質為例,硫酸(H2 SO4 )經過反應後生成硫酸銅(CuSO4 ),而該硫化氫(H2 S)氣體可與硫酸銅(CuSO4 )化學反應生成硫化銅(CuS),以此化學反應來去除硫酸銅(CuSO4 )中的銅離子(Cu2+ )。S4 metal removal step: sulfuric acid (H 2 SO 4 ) chemically reacts with the catalyst to generate sulfuric acid (H 2 SO 4 ) containing metal ions, so divalent sulfur (S 2- ) substances are added to chemically react the metal to generate metal Sulfide; as shown in S401 in Figure 2, using copper oxide (CuO) as a catalyst and hydrogen sulfide (H 2 S) gas as a divalent sulfur (S 2- ) substance as an example, sulfuric acid (H 2 SO 4 ) After the reaction, copper sulfate (CuSO 4 ) is generated, and the hydrogen sulfide (H 2 S) gas can chemically react with copper sulfate (CuSO 4 ) to generate copper sulfide (CuS), and this chemical reaction is used to remove copper sulfate (CuSO 4 ) 4 ) in copper ions (Cu 2+ ).

其中化學反應式主要如下:The chemical reaction formula is mainly as follows:

H2 S(g) + CuSO4(l) → CuS(s) ↓+ H2 SO4(l) H 2 S (g) + CuSO 4(l) → CuS (s) ↓+ H 2 SO 4(l)

S5過濾步驟:如圖2中的S501、S502所示,將反應生成的產物進行過濾分離,可分離出金屬硫化物以及高純度稀硫酸(H2 SO4 );以該反應生成的產物硫酸銅(CuSO4 )為例,硫酸銅(CuSO4 )與硫化氫(H2 S)氣體反應生成高純度硫化銅(CuS)以及高純度稀硫酸(H2 SO4 ),此化學反應最後生成物單純,最後該高純度硫化銅(CuS)以及高純度稀硫酸(H2 SO4 )可分別進行收集再次利用,前述高純度硫化銅(CuS)可以提供作為分析實驗的製劑及其他用途,而高純度稀硫酸(H2 SO4 )可以直接提供各種加工製程的化學反應原料,形成多元化回收再利用的功效(如圖2中的S501、S502)。S5 filtration step: as shown in S501 and S502 in Figure 2, the product generated by the reaction is filtered and separated, and metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ) can be separated; the product copper sulfate generated by the reaction is used. (CuSO 4 ) as an example, copper sulfate (CuSO 4 ) reacts with hydrogen sulfide (H 2 S) gas to generate high-purity copper sulfide (CuS) and high-purity dilute sulfuric acid (H 2 SO 4 ). The final product of this chemical reaction is pure Finally, the high-purity copper sulfide (CuS) and the high-purity dilute sulfuric acid (H 2 SO 4 ) can be collected and reused separately. The aforementioned high-purity copper sulfide (CuS) can be used as a preparation for analysis experiments and other purposes, while the high-purity copper sulfide (CuS) can be used for Dilute sulfuric acid (H 2 SO 4 ) can directly provide chemical reaction raw materials for various processing processes, resulting in the effect of diversified recovery and reuse (S501 and S502 in Figure 2).

其中,S5過濾步驟後可加入活性碳進行除味,使過濾後所生成的產品減少異味,以維持產品品質。Among them, activated carbon can be added to remove odor after the filtration step S5, so that the product generated after filtration can reduce the peculiar smell, so as to maintain the product quality.

其中,S4去除金屬步驟中的二價硫(S2- )物質在輸入進行化學反應時,可以透過ORP(氧化還原電位)控制裝置控制其輸入的劑量;而二價硫(S2- )物質可以為硫氫化鈉(NaHS )、硫化鈉(Na2 S)、有機硫或硫化氫(H2 S)等二價硫(S2- )物質,也可透過市售的二價硫(S2- )物質作為來源使用,以確保含有金屬離子的硫酸(H2 SO4 )有穩定及適當的二價硫(S2- )物質來源,以此達到穩定進行去除金屬離子的化學反應目的(本實施例係以為硫酸銅(CuSO4 )為例)。Among them, when the divalent sulfur (S 2- ) substance in the metal removal step of S4 is input for chemical reaction, the input dose can be controlled by the ORP (redox potential) control device; while the divalent sulfur (S 2- ) substance It can be divalent sulfur (S 2- ) such as sodium hydrosulfide (NaHS), sodium sulfide (Na 2 S), organic sulfur or hydrogen sulfide (H 2 S), or through commercially available divalent sulfur (S 2 ). - ) substance is used as a source to ensure that the sulfuric acid (H 2 SO 4 ) containing metal ions has a stable and appropriate source of divalent sulfur (S 2- ), so as to achieve the purpose of stably carrying out the chemical reaction of removing metal ions (this The examples take copper sulfate (CuSO 4 ) as an example).

藉由本發明去除硫酸中雙氧水的方法,最後可生成高純度金屬硫化物以及高純度稀硫酸(H2 SO4 ),不會生成氯離子(Cl- ),而是生成得兩種產物皆可作為其它加工製程的原料或是其他用途使用,達成提高製程加工後的產物永續利用率,尤其是本發明最後生成可直接進行許多化學反應加工應用的高純度稀硫酸(H2 SO4 ),使得原本含有雙氧水的廢硫酸經本發明處理後的用途範圍更為廣泛。By the method for removing hydrogen peroxide in sulfuric acid of the present invention, high-purity metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ) can be finally generated, and chloride ions (Cl - ) will not be generated, but both products can be generated as The raw materials of other processing processes or other purposes can be used to improve the sustainable utilization rate of the products after processing . The waste sulfuric acid originally containing hydrogen peroxide can be used in a wider range after being treated by the present invention.

請參閱圖3,圖3為本發明較佳實施例去除硫酸中雙氧水的方法之檢驗報告;前述經本發明處理後生成的稀硫酸(H2 SO4 )之純度可由圖3得知,該硫酸中雙氧水已經幾乎完全被去除,因此完全將最後生成的高純度稀硫酸(H2 SO4 )可以直接回收再次使用。Please refer to Fig. 3, Fig. 3 is the inspection report of the method for removing hydrogen peroxide in sulfuric acid according to the preferred embodiment of the present invention; The hydrogen peroxide has been almost completely removed, so the finally generated high-purity dilute sulfuric acid (H 2 SO 4 ) can be directly recovered and used again.

綜合上述,本發明去除硫酸中雙氧水的方法,其優點在於:In summary, the present invention removes the method for hydrogen peroxide in sulfuric acid, and its advantages are:

1.生成高純度稀硫酸(H2 SO4 )進行高比例回收再利用:本發明最後可生成高純度金屬硫化物以及高純度稀硫酸(H2 SO4 ),而且兩種主要生成物皆可再次回收利用,達成提高製程加工後的產物永續利用率,尤其是本發明最後生成可直接進行許多化學反應加工應用的高純度稀硫酸(H2 SO4 ),使得原本含有雙氧水(H2 O2 )的廢硫酸經本發明處理後的用途範圍更為廣泛。1. Generate high-purity dilute sulfuric acid (H 2 SO 4 ) for high-proportion recovery and reuse: the present invention can finally generate high-purity metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ), and both main products can be It is recycled again to improve the sustainable utilization rate of the product after the process, especially the present invention finally generates high-purity dilute sulfuric acid (H 2 SO 4 ) that can be directly used for many chemical reaction processing applications, so that the original containing hydrogen peroxide (H 2 O 2 ) The waste sulfuric acid treated by the present invention has a wider range of uses.

2.多元化回收再利用的產物:本發明會將含有雙氧水(H2 O2 )的廢硫酸最後生成兩種以上的可回收產物,例如高純度硫化銅(CuS)、高純度稀硫酸(H2 SO4 ),可提供更多元化回收再利用。2. Products of multiple recycling and reuse: the present invention will finally generate two or more recyclable products from waste sulfuric acid containing hydrogen peroxide (H 2 O 2 ), such as high-purity copper sulfide (CuS), high-purity dilute sulfuric acid (H 2 O 2 ). 2 SO 4 ), which can provide more diversified recycling.

3.因以銅離子作為觸媒不會產生其他氯離子:本發明以銅離子作為觸媒,最後主要生成物為金屬硫化物以及高純度稀硫酸,所以不會產生氯離子,因此可保持設備較不易受到腐蝕,以避免發生非必要的製程風險。3. Because copper ions are used as catalysts, other chloride ions will not be generated: the present invention uses copper ions as catalysts, and the final main products are metal sulfides and high-purity dilute sulfuric acid, so chloride ions will not be generated, so the equipment can be maintained. Less susceptible to corrosion to avoid unnecessary process risks.

故,本發明在同類產品中具有極佳之進步性以及實用性,同時查遍國內外關於此類結構之技術資料文獻後,確實未發現有相同或近似之構造存在於本案申請之前,因此本案應已符合『創作性』、『合於產業利用性』以及『進步性』的專利要件,爰依法提出申請之。Therefore, the present invention has excellent progress and practicability among similar products, and at the same time, after searching domestic and foreign technical data and documents about such structures, it is true that no identical or similar structures exist before the application in this case. Therefore, this case The patent requirements for "creativeness", "suitability for industrial utilization" and "progressiveness" should be met, and the application should be filed in accordance with the law.

唯,以上所述者,僅係本發明之較佳實施例而已,舉凡應用本發明說明書及申請專利範圍所為之其它等效結構變化者,理應包含在本發明之申請專利範圍內。However, the above are only preferred embodiments of the present invention, and any other equivalent structural changes made by applying the description of the present invention and the scope of the patent application should be included in the scope of the patent application of the present invention.

1:去除硫酸中雙氧水的方法 S1:進料步驟 S2:加入觸媒步驟 S3:降溫步驟 S4:去除金屬步驟 S5:過濾步驟 S101:原料(含雙氧水的硫酸) S201:加入觸媒(氧化銅) S202:去除雙氧水生成硫酸銅 S401:加入硫化氫生成硫化銅及高純度硫酸 S501:收集硫化銅再利用 S502:收集高純度硫酸再利用1: Method for removing hydrogen peroxide in sulfuric acid S1: Feeding step S2: Add catalyst step S3: cooling step S4: Metal removal step S5: Filtration step S101: raw material (sulfuric acid containing hydrogen peroxide) S201: Add catalyst (copper oxide) S202: Removal of hydrogen peroxide to form copper sulfate S401: Adding hydrogen sulfide to generate copper sulfide and high-purity sulfuric acid S501: Collect copper sulfide for reuse S502: Collect high-purity sulfuric acid for reuse

圖1:本發明較佳實施例去除硫酸中雙氧水的方法之流程圖; 圖2:本發明較佳實施例去除硫酸中雙氧水的方法之實施示意圖; 圖3:本發明較佳實施例去除硫酸中雙氧水的方法之檢驗報告。Fig. 1: the flow chart of the method for removing hydrogen peroxide in sulfuric acid in the preferred embodiment of the present invention; Fig. 2: the implementation schematic diagram of the method for removing hydrogen peroxide in sulfuric acid in the preferred embodiment of the present invention; Fig. 3: The inspection report of the method for removing hydrogen peroxide in sulfuric acid in the preferred embodiment of the present invention.

無。without.

1:去除硫酸中雙氧水的方法1: Method for removing hydrogen peroxide in sulfuric acid

S1:進料步驟S1: Feeding step

S2:加入觸媒步驟S2: Add catalyst step

S3:降溫步驟S3: cooling step

S4:去除金屬步驟S4: Metal removal step

S5:過濾步驟S5: Filtering step

Claims (10)

一種去除硫酸中雙氧水的方法,其包含有下列步驟S1~S4: S1進料步驟:以含有雙氧水(H2 O2 )0.1%~10%的硫酸為原料進料; S2加入觸媒步驟:加入金屬類或金屬類化合物做為觸媒進行化學反應以去除雙氧水(H2 O2 ); S3降溫步驟:硫酸(H2 SO4 )與觸媒進行化學反應產生放熱現象,使用降溫設備進行溫度控制; S4去除金屬步驟:硫酸(H2 SO4 )與觸媒進行化學反應後生成含有金屬離子的硫酸,因此加入二價硫(S2- )物質將金屬進行化學反應生成金屬硫化物; S5過濾步驟:將反應生成的的產物進行過濾分離,可分離出金屬硫化物以及高純度稀硫酸(H2 SO4 )。A method for removing hydrogen peroxide in sulfuric acid, comprising the following steps S1~S4: S1 feeding step: using sulfuric acid containing hydrogen peroxide (H 2 O 2 ) 0.1%~10% as raw material feed; S2 adding catalyst step: adding Metals or metal compounds are used as catalysts for chemical reaction to remove hydrogen peroxide (H 2 O 2 ); S3 cooling step: sulfuric acid (H 2 SO 4 ) chemically reacts with catalysts to generate exothermic phenomena, and temperature control equipment is used for temperature control ; S4 removes metal step: sulfuric acid (H 2 SO 4 ) and catalyst are chemically reacted to generate sulfuric acid containing metal ions, so adding divalent sulfur (S 2- ) substance to chemically react metal to generate metal sulfide; S5 filtration Step: filter and separate the product generated by the reaction, and metal sulfide and high-purity dilute sulfuric acid (H 2 SO 4 ) can be separated. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入銅(Cu)作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is to add copper (Cu) as a catalyst for chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入銅類化合物作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is to add a copper compound as a catalyst to carry out a chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入銀(Ag)作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is adding silver (Ag) as a catalyst to carry out a chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入銀類化合物作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is to add a silver compound as a catalyst to carry out a chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入汞(Hg)作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is to add mercury (Hg) as a catalyst for chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S2加入觸媒步驟係加入汞類化合物作為觸媒進行化學反應。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the step of adding a catalyst to S2 is to add a mercury compound as a catalyst to carry out a chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S5過濾步驟後可加入活性碳進行除味。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein, after the filtering step S5, activated carbon can be added for deodorization. 如請求項1所述去除硫酸中雙氧水的方法,其中,S4去除金屬步驟之二價硫(S2- )物質係透過ORP(氧化還原電位)控制裝置控制其輸入進行化學反應的劑量。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the divalent sulfur (S 2- ) substance in the metal removal step S4 is controlled by an ORP (redox potential) control device to control its input dose for chemical reaction. 如請求項1所述去除硫酸中雙氧水的方法,其中,S4去除金屬步驟之二價硫(S2- )物質供應來源可以直接透過市售之二價硫(S2- )物質作為來源使用。The method for removing hydrogen peroxide in sulfuric acid according to claim 1, wherein the supply source of divalent sulfur (S 2- ) material in the metal removal step of S4 can be directly used as a source through commercially available divalent sulfur (S 2- ) material.
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