TW202136857A - Beam splitting device and splitting ratio adjustment method - Google Patents
Beam splitting device and splitting ratio adjustment method Download PDFInfo
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
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- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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- G02B27/14—Beam splitting or combining systems operating by reflection only
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- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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- G—PHYSICS
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Abstract
Description
本發明係有關一種將雷射光束進行分歧之光束分歧裝置及分歧比調整方法。 本申請案係主張基於2020年3月16日申請之日本專利申請第2020-045372號的優先權。該日本申請案的全部內容係藉由參閱而援用於本說明書中。The invention relates to a beam divergence device and a method for adjusting the divergence ratio of laser beams. This application claims priority based on Japanese Patent Application No. 2020-045372 filed on March 16, 2020. The entire content of this Japanese application is incorporated in this specification by reference.
公知有一種雙軸雷射加工裝置,其為了提高雷射加工的效率,從輸出自雷射振盪器之脈衝雷射光束的一個脈衝切出兩個脈衝並利用兩條雷射光束進行加工(例如,參閲下述專利文獻1)。於揭示於專利文獻1之雷射加工裝置中,脈衝雷射光束的一個脈衝藉由聲光元件在時間軸上被分割成兩個脈衝,且兩個脈衝分別傳播不同之光路。聲光元件具有從一個脈衝切出加工用的脈衝之功能及將一條光路分歧成兩條光路之功能。 [先前技術文獻]A dual-axis laser processing device is known. In order to improve the efficiency of laser processing, two pulses are cut out from one pulse of a pulsed laser beam output from a laser oscillator and processed with two laser beams (for example, , Please refer to the following patent document 1). In the laser processing device disclosed in Patent Document 1, one pulse of the pulsed laser beam is divided into two pulses on the time axis by an acousto-optic element, and the two pulses propagate in different optical paths. The acousto-optic element has the function of cutting out the pulse for processing from one pulse and the function of dividing an optical path into two optical paths. [Prior Technical Literature]
[專利文獻1] 日本特開2013-71136號公報[Patent Document 1] JP 2013-71136 A
[發明所欲解決之問題][The problem to be solved by the invention]
藉由聲光元件而分歧之兩條光路所成之角度很小。因此,應配置於分歧後的兩條光路上之光學組件於空間上容易發生干涉,使得配置光學組件之位置受限制。代替聲光元件而使用按照偏光方向將雷射光束分歧成兩條路徑之偏光光束分光器,藉此能夠將一條光路分歧成兩條光路。The angle formed by the two light paths diverged by the acousto-optic element is very small. Therefore, the optical components that should be arranged on the two divergent optical paths are prone to interference in space, which restricts the position where the optical components are arranged. Instead of the acousto-optic element, a polarizing beam splitter that splits the laser beam into two paths according to the polarization direction is used, so that one optical path can be split into two optical paths.
由於偏光光束分光器的製造偏差,使雷射光束的分歧比在個體間發生偏差。為了將被分歧之兩條雷射光束的強度設定為目標值,必須對入射於偏光光束分光器之雷射光束的偏光方向進行微調,以對P偏光成分及S偏光成分的強度比進行微調。能夠使用布魯斯特窗來調整P偏光成分及S偏光成分的強度比。若僅為了調整P偏光成分及S偏光成分的強度比而在雷射光束的光路插入布魯斯特窗,則會導致光學組件的個數增加。增加之光學組件會對雷射光束的收斂發散造成熱透鏡效應等各種不利影響。Due to the manufacturing deviation of the polarizing beam splitter, the divergence ratio of the laser beam varies among individuals. In order to set the intensity of the two divided laser beams to the target value, it is necessary to fine-tune the polarization direction of the laser beam incident on the polarizing beam splitter to fine-tune the intensity ratio of the P-polarized component and the S-polarized component. The Brewster window can be used to adjust the intensity ratio of the P-polarized component and the S-polarized component. If the Brewster window is inserted into the optical path of the laser beam only to adjust the intensity ratio of the P-polarized component and the S-polarized component, the number of optical components will increase. The additional optical components will cause various adverse effects such as thermal lens effect on the convergence and divergence of the laser beam.
本發明的目的為提供一種不增加插入於雷射光束的光路之光學組件的個數亦能夠對入射於偏光光束分光器之雷射光束的偏光方向進行微調之光束分歧裝置及分歧比調整方法。 [解決問題之技術手段]The object of the present invention is to provide a beam splitting device and a split ratio adjustment method that can finely adjust the polarization direction of the laser beam incident on the polarizing beam splitter without increasing the number of optical components inserted into the optical path of the laser beam. [Technical means to solve the problem]
依本發明的一個觀點,提供一種光束分歧裝置,係具有: 偏光光束分光器,係將被直線偏光後之雷射光束進行分歧;及 偏光方向調整光學系,係將所入射之雷射光束引導至前述偏光光束分光器, 前述偏光方向調整光學系係具有: 第1反射鏡、第2反射鏡、及第3反射鏡,係在入射於前述偏光光束分光器之雷射光束的路徑上沿著雷射光束的傳播方向依次配置; 第1調整機構,係將前述第1反射鏡支撐為:能夠在改變入射向前述第1反射鏡的入射光的偏光面與被前述第1反射鏡反射之反射光的光軸所成之角度之方向上進行傾斜調整;及 第2調整機構,係將前述第2反射鏡支撐為:當藉由前述第1調整機構改變了前述第1反射鏡的姿勢時,能夠在維持前述第1反射鏡的反射光入射於前述第2反射鏡之狀態及前述第2反射鏡的反射光入射於前述第3反射鏡之狀態之方向上移動並且能夠進行傾斜調整。According to an aspect of the present invention, a beam splitting device is provided, which has: Polarized beam splitter, which splits the linearly polarized laser beam; and The polarization direction adjustment optical system guides the incident laser beam to the aforementioned polarized beam splitter, The aforementioned polarization direction adjustment optical system has: The first reflector, the second reflector, and the third reflector are sequentially arranged along the propagation direction of the laser beam on the path of the laser beam incident on the polarizing beam splitter; The first adjustment mechanism is to support the first mirror so as to change the angle between the polarization plane of the incident light incident on the first mirror and the optical axis of the reflected light reflected by the first mirror. Tilt adjustment in the direction; and The second adjustment mechanism supports the second mirror so that when the posture of the first mirror is changed by the first adjustment mechanism, the reflected light from the first mirror can be maintained to be incident on the second mirror. The state of the mirror and the reflected light of the second mirror are incident on the direction of the state of the third mirror, and the tilt can be adjusted.
依本發明的另一觀點,提供一種分歧比調整方法, 在將被直線偏光後之雷射光束入射於按照偏光方向改變分歧比而進行分歧之偏光光束分光器之雷射光束的路徑上沿著雷射光束的傳播方向依次配置第1反射鏡、第2反射鏡、及第3反射鏡, 在改變入射向前述第1反射鏡的入射光的偏光面與被前述第1反射鏡反射後之反射光的光軸所成之角度之方向上進行前述第1反射鏡的傾斜調整, 進行前述第2反射鏡的移動及傾斜調整,藉此在改變了前述第1反射鏡的姿勢之後,亦維持前述第1反射鏡的反射光入射於前述第2反射鏡之狀態及前述第2反射鏡的反射光入射於前述第3反射鏡之狀態。 [發明之效果]According to another aspect of the present invention, a method for adjusting the divergence ratio is provided, The linearly polarized laser beam is incident on the path of the laser beam of the polarizing beam splitter that changes the branch ratio in accordance with the polarization direction to branch. The first mirror and the second mirror are arranged in order along the propagation direction of the laser beam Reflector, and third reflector, The tilt adjustment of the first mirror is performed in a direction that changes the angle between the polarization plane of the incident light incident on the first mirror and the optical axis of the reflected light after being reflected by the first mirror, The movement and tilt adjustment of the second mirror are performed to maintain the state where the reflected light of the first mirror is incident on the second mirror and the second reflection after the posture of the first mirror is changed. The state where the reflected light of the mirror is incident on the aforementioned third mirror. [Effects of Invention]
進行第1反射鏡的傾斜調整以及第2反射鏡的移動及傾斜調整,藉此不增加光學組件的個數亦能夠調整入射於偏光光束分光器之雷射光束的偏光方向。By performing the tilt adjustment of the first mirror and the movement and tilt adjustment of the second mirror, the polarization direction of the laser beam incident on the polarizing beam splitter can be adjusted without increasing the number of optical components.
參閲圖1~圖3,對一實施例之光束分歧裝置進行說明。
圖1係一實施例之光束分歧裝置的概略立體圖。於光學平台10上支撐有雷射光源20、偏光方向調整光學系30及偏光光束分光器40。偏光方向調整光學系30包括第1反射鏡31、第2反射鏡32、第3反射鏡33、第1調整機構36、及第2調整機構37。將xyz直角座標系定義成以光學平台10的上表面作為xy面,且將光學平台10的上表面的法線方向作為z軸方向。例如,xy面為水平面,z軸朝向鉛直上方。Referring to FIGS. 1 to 3, a beam splitting device according to an embodiment will be described.
Fig. 1 is a schematic perspective view of a beam splitting device according to an embodiment. A
圖2A係表示各光學組件的配置及雷射光束的光軸的位置關係之概略平面圖,圖2B係表示沿x軸觀察時的各光學組件的配置及雷射光束的光軸的位置關係之概略側視圖。於以下說明中,參閲圖1並且根據需要參閲圖2A及圖2B。2A is a schematic plan view showing the arrangement of the optical components and the positional relationship of the optical axis of the laser beam, and FIG. 2B is a schematic plan view showing the arrangement of the optical components and the positional relationship of the optical axis of the laser beam when viewed along the x-axis Side view. In the following description, refer to Figure 1 and refer to Figures 2A and 2B as needed.
雷射光源20輸出被直線偏光後之雷射光束。從雷射光源20輸出之雷射光束的光軸,是相對於光學平台10的上表面平行。例如,從雷射光源20輸出之雷射光束的光軸與xy面平行,雷射光束向x軸的負向進行傳播。於本說明書中,將xy面稱為基準平面。該雷射光束的偏光方向PD與y軸平行。亦即,偏光面與xy面平行。從雷射光源20輸出之雷射光束依次被第1反射鏡31、第2反射鏡32、及第3反射鏡33反射並入射於偏光光束分光器40。The
第1反射鏡31相對於所入射之雷射光束(以下,稱為入射光。)的偏光面、及包括入射光的光軸且相對於偏光面正交之平面的任一個面,皆為朝向所反射之雷射光束(以下,稱為反射光。)的光軸成傾斜之方向反射雷射光束。例如,由第1反射鏡31所反射之反射光的光軸相對於基準平面(xy面)及zx面的任一個面皆傾斜(參閲圖2B)。又,第1反射鏡31的反射光的光軸相對於入射光的光軸正交。亦即,第1反射鏡31的反射光的光軸與yz面平行(參閲圖2A)。The first reflecting
第1調整機構36,是將第1反射鏡31支撐為:能夠在改變入射向第1反射鏡31的入射光的偏光面與被第1反射鏡31反射之反射光的光軸所成之角度之方向上進行傾斜調整(參閲圖2B)。若進行第1反射鏡31的傾斜調整,則由第1反射鏡31所反射之反射光的光軸在與yz面平行的面內發生變化,且從基準平面(xy面)傾斜的傾斜角(以下,稱為仰角θ。)發生變化。The
由第2反射鏡32所反射之反射光的光軸相對於基準平面(xy面)為垂直(參閲圖2B)。第2調整機構37,是將第2反射鏡32支撐為:即使進行第1反射鏡31的傾斜調整,亦能夠在維持第1反射鏡31的反射光入射於第2反射鏡32之狀態及第2反射鏡32的反射光入射於第3反射鏡33之狀態之方向上移動並且能夠進行傾斜調整(參閲圖2B)。即使第2反射鏡32移動,第2反射鏡32的反射光的光軸於xy面內的位置亦不變。The optical axis of the reflected light reflected by the
第3反射鏡33,是固定於光學平台10。第3反射鏡33的反射光的光軸相對於基準平面(xy面)為平行,反射光向x軸的正向進行傳播(參閲圖2A)。亦即,第3反射鏡33的反射光的傳播方向是與第1反射鏡31的入射光的傳播方向反平行。第3反射鏡33的反射光入射於偏光光束分光器40。第3反射鏡33的反射光的偏光方向PD按照仰角θ(參閲圖2B)相對於xy面傾斜。例如,當仰角θ為45˚時,第3反射鏡33的反射光的偏光面相對於xy面傾斜45˚。The
偏光光束分光器40,是將所入射之雷射光束分歧成與x軸平行的光路及與z軸平行的光路這兩個光路。分歧比取決於所入射之雷射光束的偏光方向。當第3反射鏡33的反射光的偏光面相對於xy面傾斜45˚時,由偏光光束分光器40所形成之雷射光束的分歧比大約成為1比1。The
圖3係第2調整機構37的概略前視圖。於光學平台10固定有支撐構件51。支撐構件51具有與yz面平行的引導面。於支撐構件51的引導面,升降構件53及定位塊52被安裝成能夠在z軸方向上移動。例如,定位塊52在z軸方向上透過長形的長孔55而螺鎖緊固於支撐構件51。升降構件53在z軸方向上透過長形的複數個長孔56而螺鎖緊固於支撐構件51。當進行升降構件53的定位時,首先將定位塊52固定於支撐構件51,使朝向升降構件53的下方之面與朝向定位塊52的上方之面接觸。FIG. 3 is a schematic front view of the
於升降構件53安裝有鏡架54。於鏡架54,第2反射鏡32被支撐為能夠傾斜調整。A
接著,對上述實施例的優異的效果進行說明。
於上述實施例中,藉由第1調整機構36進行第1反射鏡31的傾斜調整,並調整仰角θ(圖2B),藉此能夠調整入射於偏光光束分光器40之雷射光束的偏光方向。亦即,能夠調整相對於偏光光束分光器40之P偏光成分及S偏光成分的強度比。藉此,能夠吸收偏光光束分光器40的製造上的偏差所致之分歧比的個別差異,並且使被分歧之兩條雷射光束的強度相同。Next, the excellent effects of the above-mentioned embodiment will be described.
In the above embodiment, the
接著,對第1反射鏡31的傾斜調整的範圍及第2反射鏡32的x軸方向的移動範圍進行說明。第1反射鏡31的傾斜調整的範圍,是依據偏光光束分光器40的分歧比各自之間的偏差的大小來設定即可。若擴大第1反射鏡31的傾斜調整的範圍,則能夠應對偏光光束分光器40的分歧比各自之間的更大的偏差。例如,為了能夠應對一般的偏光光束分光器40的分歧比各自之間的標準偏差,以仰角θ(圖2B)的可調整範圍包括45˚±1˚的範圍之方式設定第1反射鏡31的傾斜調整的範圍即可。Next, the tilt adjustment range of the
仰角θ的可調整範圍,是只要能夠吸收偏光光束分光器40的分歧比各自之間的偏差便足以,無需過於擴大。若擴大仰角θ(圖2B)的可調整範圍,則不得不為了維持第1反射鏡31的反射光入射於第2反射鏡32之狀態而擴大第2反射鏡32的可移動範圍。亦即,不得不擴大由將第2反射鏡32支撐為能夠移動之支撐構件51和鏡架54(圖3)所形成的可調整範圍。若過於擴大第2反射鏡32的可移動範圍,則由支撐構件51和鏡架54所進行之應對會變得困難。因此,以能夠在45˚±5˚的範圍內調整仰角θ之方式設定第1反射鏡31的傾斜調整的範圍即可。The adjustable range of the elevation angle θ is sufficient as long as it can absorb the deviation between the divergence ratios of the
若將第1反射鏡31的入射光的光軸與第3反射鏡33的反射光的光軸的間隔標記為L,則從第3反射鏡33至第2反射鏡32為止的高度為L×tanθ。當設為能夠在45˚±5˚的範圍內調整仰角θ時,只要設為能夠於L×tan40˚至L×tan50˚的範圍內移動第2反射鏡32的高度即可。只要能夠於該範圍內移動第2反射鏡32,則即使進行第1反射鏡31的傾斜調整,亦能夠維持第1反射鏡31的反射光入射於第2反射鏡32之狀態。作為一例,當間隔L為143mm時,只要能夠於120.0mm以上170.4mm以下的範圍內調整從第3反射鏡33至第2反射鏡32為止的高度即可。If the distance between the optical axis of the incident light of the
又,上述實施例中所使用之第1反射鏡31、第2反射鏡32及第3反射鏡33通常為用於使從雷射光源20輸出之雷射光束的偏光方向迴旋45˚時所需的光學組件。於上述實施例中,不將用於對偏光方向進行微調的專用光學組件(例如布魯斯特窗等)額外配置於雷射光束的光軸上,亦能夠對偏光方向進行微調。因此,能夠減少因光學組件件數增加所導致之對雷射光束的收斂發散的影響等。In addition, the
並且,於上述實施例中,即使進行第1反射鏡31的傾斜調整來改變仰角θ(圖2B),第2反射鏡32與第3反射鏡33之間的雷射光束的光軸亦不會向xy面內方向移動。因此,當進行偏光方向的調整時,無需進行第3反射鏡33的位置調整和傾斜調整。進而,即使進行第1反射鏡31的傾斜調整,從雷射光源20輸出之雷射光束的光軸與入射於偏光光束分光器40之雷射光束的光軸之間的間隔亦不變。因此,即使進行偏光方向的調整,亦無需調整雷射光源20與偏光光束分光器40的相對位置關係。In addition, in the above embodiment, even if the tilt adjustment of the
接著,對上述實施例的變形例進行說明。
於上述實施例中,從雷射光源20輸出之雷射光束的偏光方向與y軸方向平行,但亦可以與z軸方向平行。又,於上述實施例,從雷射光源20輸出之雷射光束的傳播方向與入射於偏光光束分光器40之雷射光束的傳播方向為反平行,但兩者亦可以平行。Next, a modification of the above-mentioned embodiment will be described.
In the above embodiment, the polarization direction of the laser beam output from the
於上述實施例中,雖設為使被偏光光束分光器40反射之雷射光束的光軸與z軸平行,但亦可以設為使其與y軸平行。又,於上述實施例中,雖於yz面內改變了第1反射鏡31的反射光的光軸,但亦可以在相對於x軸傾斜之平面內進行改變。In the above-mentioned embodiment, although the optical axis of the laser beam reflected by the
接著,參閲圖4,對另一實施例之雷射加工裝置進行說明。
圖4係本實施例之雷射加工裝置的概略圖。於光學平台10的上表面支撐有雷射光源20、偏光方向調整光學系30、偏光光束分光器40及摺鏡(folding mirror)23。另外,根據需要配置調整雷射光束的光束直徑和發散收斂之光學組件(例如孔徑、光束擴展器等)。從雷射光源20輸出之雷射光束藉由偏光方向調整光學系30而偏光方向被調整,並入射於偏光光束分光器40。作為偏光方向調整光學系30,是使用圖1~圖3所示之實施例之偏光方向調整光學系30。Next, referring to FIG. 4, a laser processing apparatus of another embodiment will be described.
Fig. 4 is a schematic diagram of the laser processing apparatus of this embodiment. A
藉由偏光方向調整光學系30而偏光方向被調整之雷射光束,藉由偏光光束分光器40被分歧成兩條。被偏光光束分光器40反射後之雷射光束穿過設置於光學平台10之開口,入射到配置於光學平台10下之光束掃描器24A。直線通過偏光光束分光器40之雷射光束藉由摺鏡23反射到下方,並穿過設置於光學平台10之開口而入射到配置於光學平台10下之光束掃描器24B。The laser beam whose polarization direction is adjusted by the polarization direction adjustment
藉由光束掃描器24A、24B掃描之雷射光束,是分別通過聚光透鏡25A、25B而入射於加工對象物60A、60B。加工對象物60A、60B例如為印刷電路板,其藉由雷射光束的入射而進行鑽孔加工。The laser beams scanned by the
加工對象物60A、60B,是藉由移動機構70被保持為能夠向基板面內方向移動。於移動機構70安裝有功率計26。將兩條雷射光束中之一方的雷射光束入射於功率計26,藉此能夠測定雷射光束的功率。控制裝置71控制雷射光源20、光束掃描器24A、24B及移動機構70。The objects to be processed 60A and 60B are held by the moving
接著,對本實施例的優異的效果進行說明。
一邊利用功率計26計測兩條雷射光束各自的功率,一邊藉由偏光方向調整光學系30調整入射於偏光光束分光器40之雷射光束的偏光方向,藉此能夠使兩條雷射光束的功率相等。作為偏光方向調整光學系30,由於使用圖1~圖3所示之實施例之偏光方向調整光學系30,因此不將用於對偏光方向進行微調的專用光學組件(例如布魯斯特窗等)配置於雷射光束的光軸上,亦能夠對偏光方向進行微調。Next, the excellent effects of this embodiment will be described.
While measuring the respective powers of the two laser beams with the
接著,對上述實施例的變形例進行說明。於上述實施例,構成為用一個功率計26計測兩條雷射光束各自的功率,但作為一變形例,亦可以在移動機構70安裝兩個功率計。若安裝兩個功率計,則能夠同時計測兩條雷射光束的功率。因此,可得到用於使兩條雷射光束的功率相等的偏光方向調整光學系30的調整變得容易之效果。Next, a modification of the above-mentioned embodiment will be described. In the above-mentioned embodiment, one
接著,參閲圖5,對又另一實施例之偏光方向調整光學系進行說明。以下,省略關於與圖1~圖3所示之實施例之偏光方向調整光學系30共通的構成的說明。Next, referring to FIG. 5, the polarization direction adjusting optical system of still another embodiment will be described. Hereinafter, a description of the configuration common to the polarization direction adjusting
圖5係表示本實施例之偏光方向調整光學系30的第1反射鏡31、第2反射鏡32及第3反射鏡33的位置關係之概略圖。於圖2B所示之實施例中,第2反射鏡32的移動方向是與z軸平行。因此,若進行第1反射鏡31的傾斜調整,則第1反射鏡31與第2反射鏡32之間的光路長度及第2反射鏡32與第3反射鏡33之間的光路長度這兩者皆發生變化。相對於此,於本實施例中,當進行第1反射鏡31的傾斜調整時,第2反射鏡32沿著以第3反射鏡33的雷射光束的入射點為中心之圓弧38移動。因此,即使進行偏光方向的調整,第2反射鏡32與第3反射鏡33之間的光路長度亦不會變化,只有第1反射鏡31與第2反射鏡32之間的光路長度發生變化。5 is a schematic diagram showing the positional relationship of the
接著,對本實施例的優異的效果進行說明。 於本實施例中,亦與圖1~圖3所示之實施例相同地,不將用於對偏光方向進行微調的專用光學組件(例如布魯斯特窗等)配置於雷射光束的光軸上,亦能夠對偏光方向進行微調。Next, the excellent effects of this embodiment will be described. In this embodiment, similar to the embodiment shown in FIGS. 1 to 3, no special optical components (such as Brewster window, etc.) for fine adjustment of the polarization direction are arranged on the optical axis of the laser beam. , It can also fine-tune the polarization direction.
接著,對上述實施例的變形例進行說明。
於上述實施例中,當進行第1反射鏡31的傾斜調整時,不改變第2反射鏡32與第3反射鏡33之間的光路長度,而是改變第1反射鏡31與第2反射鏡32之間的光路長度。相反地,亦可以構成為不改變第1反射鏡31與第2反射鏡32之間的光路長度,而改變第2反射鏡32與第3反射鏡33之間的光路長度。Next, a modification of the above-mentioned embodiment will be described.
In the above embodiment, when the tilt adjustment of the
上述各實施例為示例,當然能夠進行不同之實施例中所示之構成的局部替換或組合。關於由複數個實施例的相同的構成所產生之相同的作用效果,在各實施例不予一一贅述。再者,本發明並不限於上述實施例。例如,作為本領域技術人員顯而易知能夠進行各種變更、改進、組合等。The foregoing embodiments are examples, and it is of course possible to make partial replacements or combinations of the configurations shown in different embodiments. Regarding the same action and effect produced by the same configuration of the plural embodiments, each embodiment will not be repeated one by one. Furthermore, the present invention is not limited to the above-mentioned embodiment. For example, it is obvious to those skilled in the art that various changes, improvements, combinations, etc. can be made.
10:光學平台
20:雷射光源
23:摺鏡
24A,24B:光束掃描器
25A,25B:聚光透鏡
26:功率計
30:偏光方向調整光學系
31:第1反射鏡
32:第2反射鏡
33:第3反射鏡
36:第1調整機構
37:第2調整機構
38:圓弧
40:偏光光束分光器
51:支撐構件
52:定位塊
53:升降構件
54:鏡架
55,56:長孔
60A,60B:加工對象物
70:移動機構
71:控制裝置10: Optical platform
20: Laser light source
23:
[圖1]係一實施例之光束分歧裝置的概略立體圖。 [圖2]中,圖2A係表示光束分歧裝置的各光學組件的配置及雷射光束的光軸的位置關係之概略平面圖,圖2B係表示各光學組件的配置及雷射光束的光軸的位置關係之概略側視圖。 [圖3]係第2調整機構的概略前視圖。 [圖4]係圖1~圖3所示之實施例的變形例之雷射加工裝置的概略圖。 [圖5]係表示另一實施例之偏光方向調整光學系的第1反射鏡、第2反射鏡、及第3反射鏡的位置關係之概略圖。[Fig. 1] is a schematic perspective view of a beam splitting device according to an embodiment. In [FIG. 2], FIG. 2A is a schematic plan view showing the arrangement of the optical components of the beam splitting device and the positional relationship of the optical axis of the laser beam, and FIG. 2B shows the arrangement of the optical components and the optical axis of the laser beam A schematic side view of the positional relationship. [Fig. 3] A schematic front view of the second adjustment mechanism. Fig. 4 is a schematic diagram of a laser processing apparatus according to a modification of the embodiment shown in Figs. 1 to 3. Fig. 5 is a schematic diagram showing the positional relationship of the first mirror, the second mirror, and the third mirror of the polarization direction adjusting optical system of another embodiment.
10:光學平台 10: Optical platform
20:雷射光源 20: Laser light source
30:偏光方向調整光學系 30: Polarization direction adjustment optics
31:第1反射鏡 31: The first mirror
32:第2反射鏡 32: 2nd mirror
33:第3反射鏡 33: 3rd mirror
36:第1調整機構 36: The first adjustment mechanism
37:第2調整機構 37: The second adjustment mechanism
40:偏光光束分光器 40: Polarized beam splitter
PD:偏光方向 PD: Polarization direction
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