TW202133976A - Solder paste, metal-coated particle for solder paste, and connection structure - Google Patents

Solder paste, metal-coated particle for solder paste, and connection structure Download PDF

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TW202133976A
TW202133976A TW110107330A TW110107330A TW202133976A TW 202133976 A TW202133976 A TW 202133976A TW 110107330 A TW110107330 A TW 110107330A TW 110107330 A TW110107330 A TW 110107330A TW 202133976 A TW202133976 A TW 202133976A
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metal
solder
particles
solder paste
connection
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TW110107330A
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Chinese (zh)
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栗浦良
久永聡
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日商積水化學工業股份有限公司
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Publication of TW202133976A publication Critical patent/TW202133976A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/02Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
    • B23K35/0205Non-consumable electrodes; C-electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/16Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

Abstract

The present invention provides a solder paste which does not easily wet and expand in an unintended area at a time of connection, easily maintains a shape of a connection portion formed by the solder paste in a connection structure after the connection, and is capable of maintaining a high connection strength even if the connection structure after the connection is subjected to a thermal shock or a physical impact. A solder paste according to the present invention includes a plurality of solder particles and a plurality of metal-coated particles. The metal-coated particle has a specific gravity of 6.0 or less and includes a base material particle and a metal portion disposed on a surface of the base material particle. The metal portion includes metal capable of forming an intermetallic compound with solder, includes metal capable of performing melt-bonding with solder, or includes metal capable of diffusing with solder.

Description

焊料糊、焊料糊用金屬被覆粒子及連接結構體Solder paste, metal coated particles for solder paste, and connection structure

本發明係關於一種包含複數個焊料粒子及複數個不同於焊料粒子之粒子之焊料糊。又,本發明係關於一種焊料糊中使用之金屬被覆粒子。又,本發明係關於一種使用上述焊料糊或金屬被覆粒子之連接結構體。The present invention relates to a solder paste containing a plurality of solder particles and a plurality of particles different from the solder particles. In addition, the present invention relates to a metal-coated particle used in solder paste. In addition, the present invention relates to a connected structure using the above-mentioned solder paste or metal-coated particles.

已知一種包含焊料之各向異性導電材料。上述各向異性導電材料中之焊料粒子之含量例如為80重量%以下。An anisotropic conductive material containing solder is known. The content of the solder particles in the anisotropic conductive material is, for example, 80% by weight or less.

另一方面,已知一種包含大量焊料之焊料接合材料。焊料接合材料例如為焊料糊等。焊料接合材料中之焊料粒子之含量例如超過80重量%。On the other hand, a solder joint material containing a large amount of solder is known. The solder bonding material is, for example, solder paste. The content of the solder particles in the solder joint material exceeds 80% by weight, for example.

上述焊料接合材料用於獲得各種連接結構體。作為連接結構體之連接,例如可例舉:軟性印刷基板與玻璃基板之連接(FOG(Film on Glass,鍍膜玻璃));半導體晶片與軟性印刷基板之連接(COF(Chip on Film,薄膜覆晶));半導體晶片與玻璃基板之連接(COG(Chip on Glass,玻璃覆晶));軟性印刷基板與玻璃環氧基板之連接(FOB(Film on Board,鍍膜板));以及電子零件、模組或其等之封裝體與硬質印刷基板之連接(SMT(Surface mount technology,表面黏著技術))等。The above-mentioned solder bonding materials are used to obtain various connected structures. As the connection of the connection structure, for example, the connection between the flexible printed substrate and the glass substrate (FOG (Film on Glass)); the connection between the semiconductor chip and the flexible printed substrate (COF (Chip on Film, chip on film)) )); the connection between the semiconductor chip and the glass substrate (COG (Chip on Glass, chip on glass)); the connection between the flexible printed substrate and the glass epoxy substrate (FOB (Film on Board, coated board)); and electronic parts, molds The connection (SMT (Surface mount technology, surface mount technology)), etc. between the package or its package and the hard printed circuit board.

於使電極間電性連接時,上述焊料接合材料例如藉由網版印刷等選擇性地塗佈於電路基板等之作為焊接部之電極上。其次,積層半導體晶片等,使焊料熔融後進行固化。藉由已固化之焊料,使電極間電性連接。When the electrodes are electrically connected, the above-mentioned solder bonding material is selectively coated on the electrode as the soldering portion of the circuit board or the like by screen printing or the like. Next, semiconductor wafers and the like are laminated, and the solder is melted and then solidified. Through the solidified solder, the electrodes are electrically connected.

下述專利文獻1中揭示有一種熱硬化性樹脂組合物中分散有複數個焊料粒子之焊料糊。上述焊料糊可包含熔點高於上述焊料粒子之高熔點金屬粒子。The following Patent Document 1 discloses a solder paste in which a plurality of solder particles are dispersed in a thermosetting resin composition. The solder paste may include high melting point metal particles having a higher melting point than the solder particles.

下述專利文獻2中揭示有一種包含塗錫銅粉、樹脂以及溶劑之導電糊。上述塗錫銅粉於銅粒子之表面被覆有錫或錫合金。上述錫或錫合金之被覆量為上述塗錫銅粉整體之1質量%~33質量%。 [先前技術文獻] [專利文獻]The following Patent Document 2 discloses a conductive paste containing tin-coated copper powder, resin and solvent. The copper powder coated with tin is coated with tin or tin alloy on the surface of the copper particles. The coating amount of the tin or tin alloy is 1% to 33% by mass of the entire tin-coated copper powder. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本專利特開2013-220466號公報 [專利文獻2]日本專利特開2018-131666號公報[Patent Document 1] Japanese Patent Laid-Open No. 2013-220466 [Patent Document 2] Japanese Patent Laid-Open No. 2018-131666

[發明所欲解決之問題][The problem to be solved by the invention]

先前之焊料糊於連接時有時會潤濕擴散至未意欲之區域。The previous solder paste sometimes wets and spreads to unintended areas during connection.

又,於如專利文獻1所記載之包含高熔點金屬粒子之焊料糊中,高熔點金屬粒子有時難以均勻地分散於焊料糊中。因此,於連接後之連接結構體中,有時無法充分維持由焊料糊形成之連接部之形狀。如專利文獻2所記載之塗錫銅粉於連接後之連接結構體中,有時亦難以均勻地分散於焊料糊中。In addition, in a solder paste containing high melting point metal particles as described in Patent Document 1, it may be difficult to uniformly disperse the high melting point metal particles in the solder paste. Therefore, in the connected structure after the connection, the shape of the connection portion formed by the solder paste may not be sufficiently maintained in some cases. As described in Patent Document 2, the tin-coated copper powder is sometimes difficult to be uniformly dispersed in the solder paste in the connected structure after the connection.

又,關於先前之焊料糊,於連接後之連接結構體暴露於熱衝擊下或物理衝擊下時,有時由焊料糊形成之連接部會產生龜裂或剝離。因此,存在連接強度降低之情況。In addition, regarding the previous solder paste, when the connected structure after the connection is exposed to thermal shock or physical shock, the connection part formed by the solder paste may crack or peel off. Therefore, the connection strength may decrease.

本發明之目的在於提供一種焊料糊及焊料糊用金屬被覆粒子,上述焊料糊於連接時難以潤濕擴散至未意欲之區域,於連接後之連接結構體中容易維持由焊料糊形成之連接部之形狀,且連接後之連接結構體即便暴露於熱衝擊下或物理衝擊下亦可維持高連接強度。又,本發明之目的在於提供一種使用上述焊料糊或上述焊料糊用金屬被覆粒子之連接結構體。 [解決問題之技術手段]The object of the present invention is to provide a solder paste and metal-coated particles for solder paste. The solder paste is difficult to wet and spread to unintended areas during connection, and it is easy to maintain the connection part formed by the solder paste in the connection structure after the connection. The shape of the connection structure after connection can maintain high connection strength even if exposed to thermal shock or physical shock. In addition, an object of the present invention is to provide a connected structure using the above-mentioned solder paste or the above-mentioned metal-coated particles for the solder paste. [Technical means to solve the problem]

根據本發明廣泛之態樣,提供一種焊料糊,其包含複數個焊料粒子及複數個金屬被覆粒子,且上述金屬被覆粒子之比重為6.0以下,上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部,上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。According to a broad aspect of the present invention, there is provided a solder paste comprising a plurality of solder particles and a plurality of metal-coated particles, and the metal-coated particles have a specific gravity of 6.0 or less, and the metal-coated particles have base particles and are arranged on the base. The metal part on the surface of the material particle includes a metal capable of forming an intermetallic compound with solder, a metal capable of fusion bonding with solder, or a metal capable of diffusing together with solder.

根據本發明廣泛之態樣,提供一種焊料糊用金屬被覆粒子(以下,有時記為「金屬被覆粒子」),其比重為6.0以下,且具有基材粒子及配置於上述基材粒子之表面上之金屬部,上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。According to a broad aspect of the present invention, there is provided a metal-coated particle for solder paste (hereinafter, sometimes referred to as "metal-coated particle"), which has a specific gravity of 6.0 or less, and has substrate particles and arranged on the surface of the substrate particles. The upper metal part includes a metal capable of forming an intermetallic compound with the solder, or a metal capable of fusion bonding with the solder, or a metal capable of diffusing together with the solder.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述基材粒子為樹脂粒子或有機無機混合粒子。In a specific aspect of the solder paste and metal-coated particles of the present invention, the substrate particles are resin particles or organic-inorganic hybrid particles.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述金屬部於上述金屬部之外表面部分包含能夠與焊料形成金屬間化合物之上述金屬,或者包含能夠與焊料熔融結合之上述金屬,或者包含能夠與焊料一起擴散之上述金屬。In a specific aspect of the solder paste and the metal-coated particles of the present invention, the metal portion includes the metal capable of forming an intermetallic compound with solder on the outer surface portion of the metal portion, or includes the aforementioned metal capable of fusion bonding with solder Metals, or include the above-mentioned metals that can diffuse with solder.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述金屬部於上述金屬部之外表面部分包含鎳、金、錫或含錫之合金。In a specific aspect of the solder paste and metal-coated particles of the present invention, the metal portion includes nickel, gold, tin, or an alloy containing tin on the outer surface portion of the metal portion.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述金屬部於上述金屬部之外表面部分包含錫或含錫之合金。In a specific aspect of the solder paste and metal-coated particles of the present invention, the metal part contains tin or an alloy containing tin on the outer surface portion of the metal part.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述金屬部之平均厚度相對於上述基材粒子之粒徑的比為0.005以上。In a specific aspect of the solder paste and metal-coated particles of the present invention, the ratio of the average thickness of the metal portion to the particle size of the base particles is 0.005 or more.

於本發明之焊料糊及金屬被覆粒子之某一特定態樣中,上述金屬被覆粒子於上述金屬部之外表面上具有防銹劑或助焊劑。In a specific aspect of the solder paste and the metal-coated particles of the present invention, the metal-coated particles have a rust inhibitor or flux on the outer surface of the metal part.

於本發明之焊料糊之某一特定態樣中,上述焊料糊進而包含有機溶劑及助焊劑中之至少一者。In a specific aspect of the solder paste of the present invention, the solder paste further includes at least one of an organic solvent and a flux.

於本發明之焊料糊之某一特定態樣中,焊料糊100重量%中,上述焊料粒子之含量為50重量%以上。In a specific aspect of the solder paste of the present invention, the content of the above-mentioned solder particles in 100% by weight of the solder paste is 50% by weight or more.

於本發明之焊料糊之某一特定態樣中,焊料糊100重量%中,上述焊料粒子與上述金屬被覆粒子之合計含量為51重量%以上。In a specific aspect of the solder paste of the present invention, the total content of the solder particles and the metal-coated particles in 100% by weight of the solder paste is 51% by weight or more.

根據本發明廣泛之態樣,提供一種連接結構體,其具備:表面具有第1連接區域部之第1連接對象構件、表面具有第2連接區域部之第2連接對象構件、以及連接上述第1連接對象構件與上述第2連接對象構件之連接部,且上述連接部由上述焊料糊形成,上述第1連接區域部與上述第2連接區域部藉由自上述焊料粒子形成之焊料而電性連接或物理連接。According to a broad aspect of the present invention, there is provided a connection structure including: a first connection object member having a first connection region on the surface, a second connection object member having a second connection region on the surface, and the first connection The connection part of the connection target member and the second connection target member, and the connection part is formed of the solder paste, and the first connection region part and the second connection region part are electrically connected by solder formed from the solder particles Or physical connection.

根據本發明廣泛之態樣,提供一種連接結構體,其具備:表面具有第1連接區域部之第1連接對象構件、表面具有第2連接區域部之第2連接對象構件、以及連接上述第1連接對象構件與上述第2連接對象構件之連接部,且上述連接部由包含複數個焊料粒子及複數個金屬被覆粒子之焊料糊形成,上述金屬被覆粒子為如上所述之金屬被覆粒子,上述第1連接區域部與上述第2連接區域部藉由自上述焊料粒子形成之焊料而電性連接或物理連接。 [發明之效果]According to a broad aspect of the present invention, there is provided a connection structure including: a first connection object member having a first connection region on the surface, a second connection object member having a second connection region on the surface, and the first connection The connection part of the connection target member and the second connection target member, and the connection part is formed of a solder paste containing a plurality of solder particles and a plurality of metal-coated particles. The metal-coated particles are the metal-coated particles as described above. 1 The connection area portion and the second connection area portion are electrically or physically connected by solder formed from the solder particles. [Effects of Invention]

本發明之焊料糊具有複數個焊料粒子及複數個金屬被覆粒子,上述金屬被覆粒子之比重為6.0以下,上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部。關於本發明之焊料糊,上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。本發明之焊料糊由於具備上述構成,故於連接時難以潤濕擴散至未意欲之區域,於連接後之連接結構體中容易維持由焊料糊形成之連接部之形狀,且連接後之連接結構體即便暴露於熱衝擊下或物理衝擊下亦可維持高連接強度。The solder paste of the present invention has a plurality of solder particles and a plurality of metal-coated particles, the metal-coated particles have a specific gravity of 6.0 or less, and the metal-coated particles have base particles and metal parts arranged on the surfaces of the base particles. Regarding the solder paste of the present invention, the metal portion includes a metal capable of forming an intermetallic compound with solder, or a metal capable of fusion bonding with solder, or a metal capable of diffusing together with solder. Since the solder paste of the present invention has the above-mentioned structure, it is difficult to wet and spread to unintended areas during connection, and it is easy to maintain the shape of the connection portion formed by the solder paste in the connection structure after the connection, and the connection structure after the connection The body can maintain high connection strength even when exposed to thermal shock or physical shock.

本發明之焊料糊用金屬被覆粒子之比重為6.0以下,且具有基材粒子及配置於上述基材粒子之表面上之金屬部。本發明之焊料糊用金屬被覆粒子之上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。本發明之焊料糊用金屬被覆粒子由於具備上述構成,故可較佳地用於焊料糊。包含本發明之焊料糊用金屬被覆粒子之焊料糊於連接時難以潤濕擴散至未意欲之區域,於連接後之連接結構體中容易維持由焊料糊形成之連接部之形狀,且連接後之連接結構體即便暴露於熱衝擊下或物理衝擊下亦可維持高連接強度。The metal-coated particles for solder paste of the present invention have a specific gravity of 6.0 or less, and have substrate particles and metal parts arranged on the surface of the substrate particles. The metal portion of the metal-coated particles for solder paste of the present invention contains a metal capable of forming an intermetallic compound with solder, or contains a metal capable of fusion bonding with solder, or contains a metal capable of diffusing together with solder. Since the metal-coated particles for solder paste of the present invention have the above-mentioned structure, they can be suitably used for solder paste. The solder paste containing the metal-coated particles for solder paste of the present invention is difficult to wet and spread to unintended areas during connection, and it is easy to maintain the shape of the connection part formed by the solder paste in the connection structure after the connection, and after connection The connection structure can maintain high connection strength even when exposed to thermal shock or physical shock.

以下,說明本發明之詳情。Hereinafter, the details of the present invention will be explained.

(焊料糊用金屬被覆粒子) 本發明之焊料糊用金屬被覆粒子(以下,有時記為「金屬被覆粒子」)之比重為6.0以下。本發明之金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部。本發明之金屬被覆粒子之上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。(Metal coated particles for solder paste) The metal-coated particles for solder paste of the present invention (hereinafter, sometimes referred to as "metal-coated particles") have a specific gravity of 6.0 or less. The metal-coated particle of the present invention has a substrate particle and a metal part arranged on the surface of the substrate particle. The metal part of the metal-coated particle of the present invention contains a metal capable of forming an intermetallic compound with solder, or contains a metal capable of fusion bonding with solder, or contains a metal capable of diffusing together with solder.

本發明之金屬被覆粒子由於具備上述構成,故可較佳地用於焊料糊。Since the metal-coated particles of the present invention have the above-mentioned structure, they can be suitably used for solder paste.

包含本發明之金屬被覆粒子之焊料糊於連接時難以潤濕擴散至未意欲之區域。原因是上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部,且上述金屬被覆粒子之比重為6.0以下。上述金屬被覆粒子容易均勻地分散於上述焊料糊中,因此焊料糊於連接時難以潤濕擴散至未意欲之區域。The solder paste containing the metal-coated particles of the present invention is difficult to wet and spread to unintended areas during connection. The reason is that the metal-coated particles have substrate particles and metal parts arranged on the surface of the substrate particles, and the specific gravity of the metal-coated particles is 6.0 or less. The metal-coated particles are easily uniformly dispersed in the solder paste, so the solder paste is difficult to wet and spread to unintended areas during connection.

進而,關於包含本發明之金屬被覆粒子之焊料糊,於連接後之連接結構體中容易維持由焊料糊形成之連接部之形狀。原因是上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部,且上述金屬被覆粒子之比重為6.0以下。進一步原因是上述金屬被覆粒子之上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。Furthermore, regarding the solder paste containing the metal-coated particles of the present invention, it is easy to maintain the shape of the connecting portion formed of the solder paste in the connected structure after the connection. The reason is that the metal-coated particles have substrate particles and metal parts arranged on the surface of the substrate particles, and the specific gravity of the metal-coated particles is 6.0 or less. A further reason is that the metal portion of the metal-coated particles contains a metal capable of forming an intermetallic compound with solder, or contains a metal capable of fusion bonding with solder, or contains a metal capable of diffusing together with solder.

進而,關於包含本發明之金屬被覆粒子之焊料糊,連接後之連接結構體即便暴露於熱衝擊下或物理衝擊下亦可維持高連接強度。原因是上述焊料糊包含上述金屬被覆粒子。上述連接結構體之連接部中包含上述金屬被覆粒子或上述基材粒子。上述金屬被覆粒子或上述基材粒子有效地防止連接部產生龜裂及發生剝離。其結果,連接後之連接結構體即便暴露於熱衝擊下或物理衝擊下,亦可維持高連接強度。Furthermore, regarding the solder paste containing the metal-coated particles of the present invention, the connected structure after the connection can maintain high connection strength even if it is exposed to thermal shock or physical shock. The reason is that the aforementioned solder paste contains the aforementioned metal-coated particles. The connection part of the said connection structure contains the said metal-coated particle or the said base material particle. The metal-coated particles or the substrate particles effectively prevent cracks and peeling in the connection portion. As a result, even if the connected structure after the connection is exposed to thermal shock or physical shock, the high connection strength can be maintained.

以下,參照圖式具體地說明本發明。再者,於圖1及下述圖中,不同之部位能夠相互替換。Hereinafter, the present invention will be specifically explained with reference to the drawings. Furthermore, in Fig. 1 and the following figures, different parts can be replaced with each other.

圖1係表示本發明之第1實施方式之金屬被覆粒子的剖視圖。Fig. 1 is a cross-sectional view showing a metal-coated particle according to the first embodiment of the present invention.

圖1所示之金屬被覆粒子1具有基材粒子2及金屬部3。金屬部3配置於基材粒子2之表面上。於第1實施方式中,金屬部3與基材粒子2之表面相接,金屬部3之形狀為層狀。金屬被覆粒子1為基材粒子2之表面經金屬部3被覆而得之被覆粒子。基材粒子2之整個表面經金屬部3被覆。The metal-coated particle 1 shown in FIG. 1 has a base particle 2 and a metal part 3. The metal part 3 is arranged on the surface of the substrate particle 2. In the first embodiment, the metal portion 3 is in contact with the surface of the substrate particle 2, and the shape of the metal portion 3 is layered. The metal-coated particles 1 are coated particles obtained by coating the surface of a substrate particle 2 with a metal part 3. The entire surface of the substrate particle 2 is covered by the metal part 3.

於金屬被覆粒子1中,金屬部3為單層金屬層。上述金屬被覆粒子之上述金屬部可覆蓋上述基材粒子之整個表面,上述金屬部亦可覆蓋上述基材粒子之表面之一部分。再者,上述金屬部可與上述基材粒子之表面相接亦可不相接。於上述基材粒子與上述金屬部之間可配置除上述金屬部以外之層。就進一步有效地發揮本發明之效果之觀點而言,上述金屬部較佳為與上述基材粒子之表面相接。In the metal-coated particle 1, the metal part 3 is a single-layer metal layer. The metal part of the metal-coated particle may cover the entire surface of the substrate particle, and the metal part may cover a part of the surface of the substrate particle. Furthermore, the metal part may or may not be in contact with the surface of the substrate particle. A layer other than the metal part may be arranged between the substrate particle and the metal part. From the viewpoint of further effectively exerting the effects of the present invention, the metal portion is preferably in contact with the surface of the substrate particle.

圖2係表示本發明之第2實施方式之金屬被覆粒子的剖視圖。Fig. 2 is a cross-sectional view showing a metal-coated particle according to a second embodiment of the present invention.

圖2所示之金屬被覆粒子1A具有基材粒子2A及金屬部3A。金屬部3A配置於基材粒子2A之表面上。於第2實施方式中,金屬部3A與基材粒子2A之表面相接,金屬部3A之形狀為層狀。金屬被覆粒子1A為基材粒子2A之表面經金屬部3A被覆而得之被覆粒子。基材粒子2A之整個表面經金屬部3A被覆。The metal-coated particle 1A shown in FIG. 2 has a base particle 2A and a metal part 3A. The metal part 3A is arranged on the surface of the substrate particle 2A. In the second embodiment, the metal portion 3A is in contact with the surface of the substrate particle 2A, and the shape of the metal portion 3A is layered. The metal-coated particles 1A are coated particles obtained by coating the surface of a substrate particle 2A with a metal portion 3A. The entire surface of the substrate particle 2A is covered with the metal part 3A.

金屬部3A具有作為內層之第1金屬部3AA及作為外層之第2金屬部3AB。基材粒子2A之表面上配置有第1金屬部3AA。第1金屬部3AA之外表面上配置有第2金屬部3AB。The metal part 3A has a first metal part 3AA as an inner layer and a second metal part 3AB as an outer layer. The first metal part 3AA is arranged on the surface of the substrate particle 2A. The second metal part 3AB is arranged on the outer surface of the first metal part 3AA.

上述金屬被覆粒子之上述金屬部可為單層金屬層,亦可為包含2層以上層之多層金屬層。上述第1金屬部與上述第2金屬部可形成為不同組成之金屬部,亦可形成為相同組成之金屬部。The metal portion of the metal-coated particles may be a single-layer metal layer, or may be a multi-layer metal layer including two or more layers. The first metal part and the second metal part may be formed as metal parts with different compositions, or may be formed as metal parts with the same composition.

圖3係表示本發明之第3實施方式之金屬被覆粒子的剖視圖。Fig. 3 is a cross-sectional view showing a metal-coated particle according to a third embodiment of the present invention.

圖3所示之金屬被覆粒子1B具備基材粒子2B及配置於基材粒子2B之表面上之金屬部3B。金屬部3B具有作為內層之第1金屬部3BA及位於該內層之外側之第2金屬部3BB。於第3實施方式中,金屬部3B與基材粒子2B之表面相接,第1金屬部3BA之形狀為層狀,第2金屬部3BB之形狀為凸狀。金屬被覆粒子1B為基材粒子2B之表面經金屬部3B被覆而得之被覆粒子。基材粒子2B之整個表面經金屬部3B被覆。金屬部3BB為凸狀部。第2金屬部3BB突起。第1金屬部3BA之外表面經第2金屬部3BB部分地被覆。The metal-coated particle 1B shown in FIG. 3 includes a base particle 2B and a metal part 3B arranged on the surface of the base particle 2B. The metal part 3B has a first metal part 3BA as an inner layer and a second metal part 3BB located on the outer side of the inner layer. In the third embodiment, the metal portion 3B is in contact with the surface of the substrate particle 2B, the shape of the first metal portion 3BA is layered, and the shape of the second metal portion 3BB is convex. The metal-coated particles 1B are coated particles obtained by coating the surface of the substrate particle 2B with a metal portion 3B. The entire surface of the substrate particle 2B is covered with the metal part 3B. The metal part 3BB is a convex part. The second metal part 3BB protrudes. The outer surface of the first metal part 3BA is partially covered by the second metal part 3BB.

上述金屬被覆粒子之上述金屬部可包含1個金屬部,亦可包含2個以上金屬部。上述第1金屬部與上述第2金屬部可形成為不同組成之金屬部,亦可形成為相同組成之金屬部。The metal part of the metal-coated particle may include one metal part, or may include two or more metal parts. The first metal part and the second metal part may be formed as metal parts with different compositions, or may be formed as metal parts with the same composition.

上述金屬被覆粒子中之上述基材粒子可經上述金屬部完全被覆,亦可不完全被覆。上述基材粒子可具有未經上述金屬部被覆之部分。上述作為內層之金屬部可經外側之上述金屬部完全被覆,亦可不完全被覆。上述作為內層之金屬部可具有未經外側之上述金屬部被覆之部分。The substrate particles in the metal-coated particles may be completely covered by the metal portion, or may not be completely covered. The said base material particle may have the part which is not covered with the said metal part. The metal part as the inner layer may be completely covered by the metal part on the outer side, or may be incompletely covered. The metal part as the inner layer may have a portion that is not covered by the metal part on the outer side.

上述金屬被覆粒子之比重為6.0以下。上述金屬被覆粒子之比重較佳為5.5以下,更佳為5.0以下,更佳為4.5以下,進而較佳為4.0以下,進而更佳為3.5以下。若上述金屬被覆粒子之比重為上述上限以下,則上述金屬被覆粒子容易更均勻地分散於焊料糊中。因此,於連接後之連接結構體中容易進一步維持由焊料糊形成之連接部之形狀。上述金屬被覆粒子之比重可為1.1以上,亦可為1.5以上。The specific gravity of the metal-coated particles is 6.0 or less. The specific gravity of the metal-coated particles is preferably 5.5 or less, more preferably 5.0 or less, more preferably 4.5 or less, still more preferably 4.0 or less, and still more preferably 3.5 or less. If the specific gravity of the metal-coated particles is equal to or less than the above upper limit, the metal-coated particles are likely to be more uniformly dispersed in the solder paste. Therefore, it is easy to further maintain the shape of the connecting portion formed by the solder paste in the connected structure after the connection. The specific gravity of the metal-coated particles may be 1.1 or more, or 1.5 or more.

上述金屬被覆粒子之比重可使用比重瓶(Pycnometer)或電子比重計等進行測定。上述金屬被覆粒子之比重特佳為使用電子比重計進行測定。作為上述電子比重計,可例舉Alfa Mirage公司製造之「EW-300SG」等。The specific gravity of the metal-coated particles can be measured using a pycnometer, an electronic hydrometer, or the like. The specific gravity of the metal-coated particles is particularly preferably measured using an electronic hydrometer. As the above electronic hydrometer, "EW-300SG" manufactured by Alfa Mirage, etc. may be mentioned.

關於上述金屬被覆粒子,上述基材粒子之總表面積100%中,具有上述金屬部之部分之面積(金屬部之被覆率)較佳為5%以上,更佳為10%以上,更佳為30%以上,進而較佳為50%以上,特佳為70%以上,最佳為80%以上。上述基材粒子之總表面積100%中,具有上述金屬部之部分之面積較佳為100%以下。若具有上述金屬部之部分之面積為上述下限以上,則進一步有效地發揮本發明之效果。Regarding the metal-coated particles, in 100% of the total surface area of the substrate particles, the area of the portion having the metal portion (the coverage rate of the metal portion) is preferably 5% or more, more preferably 10% or more, and more preferably 30 % Or more, more preferably 50% or more, particularly preferably 70% or more, most preferably 80% or more. In 100% of the total surface area of the substrate particles, the area of the portion having the metal portion is preferably 100% or less. If the area of the part having the metal part is greater than or equal to the above lower limit, the effect of the present invention can be more effectively exhibited.

上述基材粒子之總表面積100%中,具有上述金屬部之部分之面積可藉由如下方式算出,即,使用SEM-EDX(Scanning Electron Microscope-Energy Dispersive X-Ray spectrometer,掃描式電子顯微鏡-能量色散X射線光譜儀)對導電性粒子之剖面加以分析後進行元素繪圖,從而進行圖像分析。In 100% of the total surface area of the substrate particles, the area of the part with the metal part can be calculated as follows, that is, using SEM-EDX (Scanning Electron Microscope-Energy Dispersive X-Ray spectrometer, scanning electron microscope-energy Dispersive X-ray spectrometer) analyzes the cross-section of conductive particles and then performs elemental mapping to perform image analysis.

上述金屬被覆粒子之粒徑較佳為1 μm以上,更佳為3 μm以上,並且,較佳為100 μm以下,更佳為30 μm以下。若上述金屬被覆粒子之粒徑為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。The particle diameter of the metal-coated particles is preferably 1 μm or more, more preferably 3 μm or more, and is preferably 100 μm or less, and more preferably 30 μm or less. If the particle diameter of the metal-coated particles is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the effects of the present invention can be more effectively exhibited.

上述金屬被覆粒子之粒徑較佳為平均粒徑,更佳為數量平均粒徑。上述金屬被覆粒子之粒徑例如可藉由如下方式求出,對於任意50個金屬被覆粒子,藉由電子顯微鏡或光學顯微鏡進行觀察,算出各金屬被覆粒子之粒徑之平均值,或者使用粒度分佈測定裝置算出。於利用電子顯微鏡或光學顯微鏡進行觀察時,每個金屬被覆粒子之粒徑作為以圓相當徑計之粒徑求出。於利用電子顯微鏡或光學顯微鏡進行觀察時,任意50個金屬被覆粒子之以圓相當徑計之平均粒徑幾乎等於以球相當徑計之平均粒徑。於粒度分佈測定裝置中,每個金屬被覆粒子之粒徑作為以球相當徑計之粒徑求出。上述金屬被覆粒子之平均粒徑較佳使用粒度分佈測定裝置算出。The particle diameter of the metal-coated particles is preferably an average particle diameter, and more preferably a number average particle diameter. The particle size of the metal-coated particles can be obtained, for example, by observing any 50 metal-coated particles with an electron microscope or an optical microscope, and calculating the average value of the particle size of each metal-coated particle, or using the particle size distribution Calculated by the measuring device. When observing with an electron microscope or an optical microscope, the particle diameter of each metal-coated particle is calculated as the diameter equivalent to a circle. When observed with an electron microscope or an optical microscope, the average particle diameter of any 50 metal-coated particles in terms of circle-equivalent diameter is almost equal to the average particle diameter of sphere-equivalent diameter. In the particle size distribution measuring device, the particle size of each metal-coated particle is determined as the particle size in terms of the equivalent diameter of the sphere. The average particle diameter of the metal-coated particles is preferably calculated using a particle size distribution measuring device.

上述金屬被覆粒子之粒徑之變異係數(CV值)較佳為10%以下,更佳為5%以下。若上述金屬被覆粒子之粒徑之變異係數為上述上限以下,則上述金屬被覆粒子容易更均勻地分散於焊料糊中。The coefficient of variation (CV value) of the particle diameter of the metal-coated particles is preferably 10% or less, more preferably 5% or less. If the coefficient of variation of the particle diameter of the metal-coated particles is equal to or less than the above upper limit, the metal-coated particles are likely to be more uniformly dispersed in the solder paste.

上述變異係數(CV值)可如下進行測定。The aforementioned coefficient of variation (CV value) can be measured as follows.

CV值(%)=(ρ/Dn)×100 ρ:金屬被覆粒子之粒徑之標準偏差 Dn:金屬被覆粒子之粒徑之平均值CV value (%)=(ρ/Dn)×100 ρ: The standard deviation of the particle size of the metal-coated particles Dn: the average value of the particle size of the metal-coated particles

上述金屬被覆粒子之形狀並無特別限定。上述金屬被覆粒子之形狀可為球狀,可為球狀以外之形狀,亦可為扁平狀等形狀。The shape of the metal-coated particles is not particularly limited. The shape of the metal-coated particles may be a spherical shape, a shape other than a spherical shape, or a shape such as a flat shape.

上述金屬部之平均厚度相對於上述基材粒子之粒徑的比(上述金屬部之平均厚度/上述基材粒子之粒徑)較佳為0.0001以上,更佳為0.001以上,進而較佳為0.005以上,特佳為0.01以上。若上述比為上述下限以上,則進一步有效地發揮本發明之效果。上述比(上述金屬部之平均厚度/上述基材粒子之粒徑)較佳為1以下,更佳為0.5以下。若上述比為上述上限以下,則容易降低比重。The ratio of the average thickness of the metal portion to the particle size of the substrate particles (average thickness of the metal portion/particle size of the substrate particles) is preferably 0.0001 or more, more preferably 0.001 or more, and still more preferably 0.005 Above, 0.01 or more is particularly preferred. If the said ratio is more than the said lower limit, the effect of this invention will be exhibited more effectively. The ratio (average thickness of the metal portion/particle diameter of the substrate particle) is preferably 1 or less, and more preferably 0.5 or less. If the above-mentioned ratio is equal to or less than the above-mentioned upper limit, it is easy to reduce the specific gravity.

上述金屬部之平均厚度僅考慮上述基材粒子上存在金屬部之區域,不考慮上述基材粒子上不存在金屬部之區域。於上述金屬部部分地配置於上述基材粒子之表面上之情形時,上述金屬部之厚度為零之區域之厚度(即零)於求出上述金屬部之平均厚度時不被納入考慮。The average thickness of the metal part only considers the area where the metal part exists on the substrate particle, and does not consider the area where the metal part does not exist on the substrate particle. When the metal part is partially arranged on the surface of the substrate particle, the thickness of the region where the thickness of the metal part is zero (ie, zero) is not taken into consideration when calculating the average thickness of the metal part.

上述金屬部之平均厚度可藉由例如使用穿透式電子顯微鏡(TEM),觀察金屬被覆粒子之剖面來進行測定。上述金屬部之平均厚度較佳為藉由算出任意50個金屬被覆粒子之各金屬部之厚度的平均值而求出。The average thickness of the metal part can be measured by observing the cross-section of the metal-coated particle, for example, using a transmission electron microscope (TEM). The average thickness of the metal part is preferably obtained by calculating the average value of the thickness of each metal part of any 50 metal-coated particles.

就進一步有效地發揮本發明之效果之觀點而言,上述金屬被覆粒子較佳於上述金屬部之外表面上包含防銹劑或助焊劑。上述金屬被覆粒子於上述金屬部之外表面上可包含防銹劑,亦可包含助焊劑。From the viewpoint of further effectively exerting the effects of the present invention, the metal-coated particles preferably contain a rust inhibitor or a flux on the outer surface of the metal portion. The metal-coated particles may contain a rust inhibitor or flux on the outer surface of the metal part.

基材粒子: 上述基材粒子之材料並無特別限定。上述基材粒子之材料可為有機材料,亦可為無機材料。作為僅由上述有機材料形成之基材粒子,可例舉樹脂粒子等。作為僅由上述無機材料形成之基材粒子,可例舉除金屬以外之無機粒子等。作為由上述有機材料及上述無機材料兩者形成之基材粒子,可例舉有機無機混合粒子等。就使上述金屬被覆粒子之比重容易進一步降低,進一步有效地發揮本發明之效果之觀點而言,上述基材粒子較佳為樹脂粒子或有機無機混合粒子,更佳為樹脂粒子。Substrate particles: The material of the aforementioned substrate particles is not particularly limited. The material of the aforementioned substrate particles may be organic materials or inorganic materials. As the substrate particles formed only of the above-mentioned organic material, resin particles and the like may be mentioned. As the substrate particles formed only of the above-mentioned inorganic materials, inorganic particles other than metals and the like can be mentioned. Examples of substrate particles formed of both the above-mentioned organic material and the above-mentioned inorganic material include organic-inorganic hybrid particles. From the viewpoint of making the specific gravity of the metal-coated particles easier to further decrease and further effectively exerting the effects of the present invention, the substrate particles are preferably resin particles or organic-inorganic hybrid particles, and more preferably resin particles.

作為上述有機材料,可例舉:聚乙烯、聚丙烯、聚苯乙烯、聚氯乙烯、聚偏二氯乙烯、聚異丁烯、聚丁二烯等聚烯烴樹脂;聚甲基丙烯酸甲酯及聚丙烯酸甲酯等丙烯酸樹脂;聚碳酸酯、聚醯胺、苯酚-甲醛樹脂、三聚氰胺-甲醛樹脂、苯并胍胺-甲醛樹脂、脲甲醛樹脂、酚系樹脂、三聚氰胺樹脂、苯并胍胺樹脂、脲樹脂、環氧樹脂、不飽和聚酯樹脂、飽和聚酯樹脂、聚對苯二甲酸乙二酯、聚碸、聚苯醚、聚縮醛、聚醯亞胺、聚醯胺醯亞胺、聚醚醚酮、聚醚碸、二乙烯苯聚合物、以及二乙烯苯共聚物等。作為上述二乙烯苯共聚物等,可例舉二乙烯苯-苯乙烯共聚物及二乙烯苯-(甲基)丙烯酸酯共聚物等。就進一步有效地發揮本發明之效果之觀點而言,上述基材粒子之材料較佳為使1種或2種以上之具有乙烯性不飽和基之聚合性單體聚合而得之聚合物。Examples of the above-mentioned organic materials include polyolefin resins such as polyethylene, polypropylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, polyisobutylene, and polybutadiene; polymethyl methacrylate and polyacrylic acid. Acrylic resins such as methyl esters; polycarbonate, polyamide, phenol-formaldehyde resin, melamine-formaldehyde resin, benzoguanamine-formaldehyde resin, urea-formaldehyde resin, phenolic resin, melamine resin, benzoguanamine resin, urea Resins, epoxy resins, unsaturated polyester resins, saturated polyester resins, polyethylene terephthalate, polycarbonate, polyphenylene ether, polyacetal, polyimide, polyimide imine, poly Ether ether ketone, polyether agglomerate, divinylbenzene polymer, and divinylbenzene copolymer, etc. As said divinylbenzene copolymer etc., a divinylbenzene-styrene copolymer, a divinylbenzene-(meth)acrylate copolymer, etc. are mentioned. From the viewpoint of further effectively exerting the effects of the present invention, the material of the substrate particles is preferably a polymer obtained by polymerizing one or more types of polymerizable monomers having ethylenic unsaturated groups.

於使具有乙烯性不飽和基之聚合性單體聚合而獲得上述基材粒子之情形時,作為上述具有乙烯性不飽和基之聚合性單體,可例舉非交聯性單體與交聯性單體。In the case of polymerizing a polymerizable monomer having an ethylenically unsaturated group to obtain the substrate particles, examples of the polymerizable monomer having an ethylenically unsaturated group include non-crosslinking monomers and crosslinking Sexual monomer.

作為上述非交聯性單體,可例舉:作為乙烯系化合物之苯乙烯、α-甲基苯乙烯、氯苯乙烯等苯乙烯單體;甲基乙烯醚、乙基乙烯醚、丙基乙烯醚等乙烯醚化合物;乙酸乙烯酯、丁酸乙烯酯、月桂酸乙烯酯、硬脂酸乙烯酯等酸乙烯酯化合物;氯乙烯、氟乙烯等含鹵素之單體;作為(甲基)丙烯酸系化合物之(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異𦯉酯等(甲基)丙烯酸烷基酯化合物;(甲基)丙烯酸2-羥基乙酯、甘油(甲基)丙烯酸酯、聚氧乙烯(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯等含氧原子之(甲基)丙烯酸酯化合物;(甲基)丙烯腈等含腈之單體;(甲基)丙烯酸三氟甲酯、(甲基)丙烯酸五氟乙酯等含鹵素之(甲基)丙烯酸酯化合物;作為α-烯烴化合物之二異丁烯、異丁烯、Linealene、乙烯、丙烯等烯烴化合物;作為共軛二烯化合物之異戊二烯、丁二烯等。Examples of the above-mentioned non-crosslinkable monomers include: vinyl compounds, such as styrene monomers such as styrene, α-methylstyrene, and chlorostyrene; methyl vinyl ether, ethyl vinyl ether, and propyl ethylene Vinyl ether compounds such as ether; vinyl acetate, vinyl butyrate, vinyl laurate, vinyl stearate and other acid vinyl ester compounds; halogen-containing monomers such as vinyl chloride and vinyl fluoride; as (meth)acrylic acid Compounds of methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, (meth) Alkyl (meth)acrylate compounds such as lauryl acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, cyclohexyl (meth)acrylate, isopropyl (meth)acrylate, etc.; 2-hydroxyethyl (meth)acrylate, glycerol (meth)acrylate, polyoxyethylene (meth)acrylate, glycidyl (meth)acrylate and other oxygen atom-containing (meth)acrylate compounds; Nitrile-containing monomers such as (meth)acrylonitrile; halogen-containing (meth)acrylate compounds such as trifluoromethyl (meth)acrylate and pentafluoroethyl (meth)acrylate; as α-olefin compounds Olefin compounds such as diisobutylene, isobutylene, linealene, ethylene, and propylene; isoprene and butadiene as conjugated diene compounds.

作為上述交聯性單體,可例舉:作為乙烯系化合物之二乙烯苯、1,4-二乙烯氧基丁烷、二乙烯基碸等乙烯基單體;作為(甲基)丙烯酸系化合物之四羥甲基甲烷四(甲基)丙烯酸酯、聚四亞甲基二醇二丙烯酸酯、四羥甲基甲烷三(甲基)丙烯酸酯、四羥甲基甲烷二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯等多官能(甲基)丙烯酸酯化合物;作為烯丙基化合物之(異)氰尿酸三烯丙酯、偏苯三酸三烯丙酯、鄰苯二甲酸二烯丙酯、二烯丙基丙烯醯胺、二烯丙醚;作為矽烷化合物之四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、異丙基三甲氧基矽烷、異丁基三甲氧基矽烷、環己基三甲氧基矽烷、正己基三甲氧基矽烷、正辛基三乙氧基矽烷、正癸基三甲氧基矽烷、苯基三甲氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二異丙基二甲氧基矽烷、三甲氧基矽烷基苯乙烯、γ-(甲基)丙烯醯氧基丙基三甲氧基矽烷、1,3-二乙烯基四甲基二矽氧烷、甲基苯基二甲氧基矽烷、二苯基二甲氧基矽烷等矽烷烷氧化物化合物;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、二甲氧基甲基乙烯基矽烷、二甲氧基乙基乙烯基矽烷、二乙氧基甲基乙烯基矽烷、二乙氧基乙基乙烯基矽烷、乙基甲基二乙烯基矽烷、甲基乙烯基二甲氧基矽烷、乙基乙烯基二甲氧基矽烷、甲基乙烯基二乙氧基矽烷、乙基乙烯基二乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等含聚合性雙鍵之矽烷烷氧化物;十甲基環五矽氧烷等環狀矽氧烷;單末端改性聚矽氧油、兩末端聚矽氧油、側鏈型聚矽氧油等改性(反應性)聚矽氧油;(甲基)丙烯酸、順丁烯二酸、順丁烯二酸酐等含羧基單體等。Examples of the above-mentioned crosslinkable monomers include vinyl monomers such as divinylbenzene, 1,4-divinyloxybutane, and divinyl sulfonate as vinyl compounds; as (meth)acrylic compounds Of tetramethylolmethane tetra(meth)acrylate, polytetramethylene glycol diacrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane di(meth)acrylate , Trimethylolpropane tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, glycerol tri(meth)acrylate, glycerol di(meth)acrylate Ester, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, 1,4-butanediol bis(methyl) ) Polyfunctional (meth)acrylate compounds such as acrylate; triallyl (iso)cyanurate, triallyl trimellitate, diallyl phthalate, dienes as allyl compounds Propyl acrylamide, diallyl ether; tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyl Triethoxysilane, isopropyltrimethoxysilane, isobutyltrimethoxysilane, cyclohexyltrimethoxysilane, n-hexyltrimethoxysilane, n-octyltriethoxysilane, n-decyltrimethyl Oxysilane, phenyltrimethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diisopropyldimethoxysilane, trimethoxysilylstyrene, γ-( (Meth)acryloxypropyltrimethoxysilane, 1,3-divinyltetramethyldisiloxane, methylphenyldimethoxysilane, diphenyldimethoxysilane and other silanes Oxide compounds; vinyl trimethoxy silane, vinyl triethoxy silane, dimethoxy methyl vinyl silane, dimethoxy ethyl vinyl silane, diethoxy methyl vinyl silane, two Ethoxyethyl vinyl silane, ethyl methyl divinyl silane, methyl vinyl dimethoxy silane, ethyl vinyl dimethoxy silane, methyl vinyl diethoxy silane, ethyl Vinyl diethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, etc., containing polymerizable properties Silane alkoxides with double bonds; cyclic siloxanes such as decamethylcyclopentasiloxane; modified polysiloxane oils at one end, polysiloxane oils at both ends, side chain polysiloxane oils, etc. ( Reactivity) Polysiloxane oil; (meth)acrylic acid, maleic acid, maleic anhydride and other carboxyl-containing monomers.

作為上述無機材料,可例舉:二氧化矽、氧化鋁、鈦酸鋇、氧化鋯、碳黑、矽酸玻璃、硼矽酸玻璃、鉛玻璃、鈉鈣玻璃及鋁矽酸鹽玻璃等。Examples of the above-mentioned inorganic materials include silica, alumina, barium titanate, zirconia, carbon black, silicate glass, borosilicate glass, lead glass, soda lime glass, aluminosilicate glass, and the like.

上述基材粒子可為有機無機混合粒子。上述基材粒子可為核殼粒子。於上述基材粒子為有機無機混合粒子之情形時,作為上述基材粒子之材料之無機物,可例舉二氧化矽、氧化鋁、鈦酸鋇、氧化鋯及碳黑等。上述無機物較佳為非金屬。由上述二氧化矽形成之基材粒子並無特別限定,可例舉藉由如下方式獲得之基材粒子,即,使具有2個以上水解性烷氧基矽烷基之矽化合物水解而形成交聯聚合物粒子後,視需要進行焙燒。作為上述有機無機混合粒子,可例舉由交聯之烷氧基矽烷基聚合物及丙烯酸樹脂形成之有機無機混合粒子等。The aforementioned substrate particles may be organic-inorganic hybrid particles. The aforementioned substrate particles may be core-shell particles. When the substrate particle is an organic-inorganic hybrid particle, the inorganic substance of the material of the substrate particle may, for example, be silica, alumina, barium titanate, zirconia, carbon black, and the like. The above-mentioned inorganic substance is preferably a non-metal. The substrate particles formed of the above-mentioned silicon dioxide are not particularly limited, and examples thereof include substrate particles obtained by hydrolyzing a silicon compound having two or more hydrolyzable alkoxysilyl groups to form crosslinks. After the polymer particles, they are fired as necessary. As the above-mentioned organic-inorganic hybrid particles, organic-inorganic hybrid particles formed of a crosslinked alkoxysilyl polymer and acrylic resin, etc. may be mentioned.

上述有機無機混合粒子較佳為具有核及配置於該核之表面上之殼的核殼型有機無機混合粒子。上述核較佳為有機核。上述殼較佳為無機殼。上述基材粒子較佳為具有有機核及配置於上述有機核之表面上之無機殼的有機無機混合粒子。The organic-inorganic hybrid particles are preferably core-shell organic-inorganic hybrid particles having a core and a shell arranged on the surface of the core. The aforementioned core is preferably an organic core. The above-mentioned shell is preferably an inorganic shell. The substrate particle is preferably an organic-inorganic hybrid particle having an organic core and an inorganic shell arranged on the surface of the organic core.

作為上述有機核之材料,可例舉上述有機材料等。As the material of the above-mentioned organic core, the above-mentioned organic material and the like can be mentioned.

作為上述無機殼之材料,可例舉作為上述基材粒子之材料所例舉之無機物。上述無機殼之材料較佳為二氧化矽。上述無機殼較佳為藉由如下方式形成,即,於上述核之表面上藉由溶膠凝膠法使金屬烷氧化物形成殼狀物後,對該殼狀物進行焙燒。上述金屬烷氧化物較佳為矽烷烷氧化物。上述無機殼較佳為由矽烷烷氧化物形成。As the material of the above-mentioned inorganic shell, the inorganic substances exemplified as the material of the above-mentioned base particle can be exemplified. The material of the above-mentioned inorganic shell is preferably silicon dioxide. The inorganic shell is preferably formed by forming a shell of metal alkoxide on the surface of the core by a sol-gel method, and then firing the shell. The above-mentioned metal alkoxide is preferably a silane alkoxide. The above-mentioned inorganic shell is preferably formed of silane alkoxide.

金屬部: 上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。上述金屬部可包含能夠與焊料形成金屬間化合物之金屬,可包含能夠與焊料熔融結合之金屬,亦可包含能夠與焊料一起擴散之金屬。上述金屬部亦可進而包含除能夠與焊料形成金屬間化合物之金屬、能夠與焊料熔融結合之金屬及能夠與焊料一起擴散之金屬以外的金屬。Metal Department: The metal part includes a metal capable of forming an intermetallic compound with the solder, or a metal capable of fusion bonding with the solder, or a metal capable of diffusing together with the solder. The metal part may include a metal capable of forming an intermetallic compound with the solder, may include a metal capable of fusion bonding with the solder, or may include a metal capable of diffusing together with the solder. The metal portion may further include metals other than metals capable of forming intermetallic compounds with solder, metals capable of fusion bonding with solder, and metals capable of diffusing together with solder.

就進一步有效地發揮本發明之效果之觀點而言,上述金屬部較佳於上述金屬部之外表面部分包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。From the viewpoint of further effectively exerting the effects of the present invention, the metal portion preferably contains a metal capable of forming an intermetallic compound with solder, or a metal capable of fusion bonding with solder, or contains a metal that can form an intermetallic compound with solder, or contains Metal that can diffuse with solder.

再者,能夠與焊料形成金屬間化合物之金屬係於金屬之平衡狀態圖中可形成與錫之金屬間化合物者。能夠與焊料熔融結合之金屬係可藉由加熱而熔融,從而與焊料結合者。能夠與焊料一起擴散之金屬係不會因加熱而熔融,但於焊料熔融時金屬於焊料中擴散者。Furthermore, the metal capable of forming an intermetallic compound with solder is one that can form an intermetallic compound with tin in the equilibrium state diagram of the metal. A metal that can be melted and combined with solder can be melted by heating to bond with solder. The metal that can diffuse with the solder does not melt due to heating, but the metal diffuses in the solder when the solder melts.

就進一步有效地發揮本發明之效果之觀點而言,能夠與焊料形成金屬間化合物之金屬較佳為鎳、金、鈀、銦、銀、銅、錫或含錫之合金,更佳為鎳、金、錫或含錫之合金,進而較佳為錫或含錫之合金。就進一步有效地發揮本發明之效果之觀點而言,能夠與焊料熔融結合之金屬較佳為銦、錫或含錫之合金,更佳為錫或含錫之合金。就進一步有效地發揮本發明之效果之觀點而言,能夠與焊料一起擴散之金屬較佳為鎳、金、鈀、銀或銅,進而較佳為鎳或金。From the viewpoint of further effectively exerting the effects of the present invention, the metal capable of forming an intermetallic compound with the solder is preferably nickel, gold, palladium, indium, silver, copper, tin or tin-containing alloys, more preferably nickel, Gold, tin or tin-containing alloy, more preferably tin or tin-containing alloy. From the viewpoint of further effectively exerting the effects of the present invention, the metal capable of fusion bonding with the solder is preferably indium, tin, or an alloy containing tin, more preferably tin or an alloy containing tin. From the viewpoint of further effectively exerting the effects of the present invention, the metal capable of diffusing together with the solder is preferably nickel, gold, palladium, silver, or copper, and more preferably nickel or gold.

就進一步有效地發揮本發明之效果,以及進一步有效地提高連接可靠性之觀點而言,上述金屬部較佳為包含鎳、金、鈀、銦、銀、銅、錫或含錫之合金,更佳為包含鎳、金、錫或含錫之合金,進而較佳為包含錫或含錫之合金。From the viewpoint of further effectively exerting the effects of the present invention and further effectively improving the connection reliability, the metal part preferably contains nickel, gold, palladium, indium, silver, copper, tin or an alloy containing tin, and more Preferably it contains nickel, gold, tin, or an alloy containing tin, and more preferably contains tin or an alloy containing tin.

就進一步有效地發揮本發明之效果,以及進一步有效地提高連接可靠性之觀點而言,上述金屬部較佳為於上述金屬部之外表面部分包含鎳、金、鈀、銀、銅、錫或含錫之合金,更佳為於上述金屬部之外表面部分包含鎳、金、鈀、銦、錫或含錫之合金。就進一步有效地發揮本發明之效果,以及進一步有效地提高連接可靠性之觀點而言,上述金屬部進而較佳為於上述金屬部之外表面部分包含鎳、金、錫或含錫之合金。From the viewpoint of further effectively exerting the effects of the present invention and further effectively improving the connection reliability, the metal part preferably contains nickel, gold, palladium, silver, copper, tin or the outer surface of the metal part. The tin-containing alloy is more preferably nickel, gold, palladium, indium, tin or tin-containing alloy in the outer surface portion of the metal part. From the viewpoint of further effectively exerting the effects of the present invention and further effectively improving the connection reliability, the metal part further preferably contains nickel, gold, tin, or an alloy containing tin on the outer surface portion of the metal part.

上述金屬部100重量%中,錫之含量較佳為0.1重量%以上,更佳為1重量%以上,並且,較佳為100重量%以下,更佳為90重量%以下。上述錫之含量可為80重量%以下,可為60重量%以下,可為40重量%以下,可為20重量%以下,亦可為10重量%以下。若上述錫之含量為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。In 100% by weight of the metal part, the content of tin is preferably 0.1% by weight or more, more preferably 1% by weight or more, and is preferably 100% by weight or less, and more preferably 90% by weight or less. The content of the tin may be 80% by weight or less, 60% by weight or less, 40% by weight or less, 20% by weight or less, or 10% by weight or less. If the content of tin is at least the above lower limit and below the above upper limit, the effects of the present invention will be more effectively exhibited.

於上述金屬部為多層之情形時,含錫之層100重量%中,錫之含量較佳為0.1重量%以上,更佳為1重量%以上,並且,較佳為100重量%以下,更佳為90重量%以下。上述錫之含量可為80重量%以下,可為60重量%以下,可為40重量%以下,可為20重量%以下,亦可為10重量%以下。若上述錫之含量為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。When the metal part is multilayered, the content of tin in 100% by weight of the tin-containing layer is preferably 0.1% by weight or more, more preferably 1% by weight or more, and preferably 100% by weight or less, more preferably It is 90% by weight or less. The content of the tin may be 80% by weight or less, 60% by weight or less, 40% by weight or less, 20% by weight or less, or 10% by weight or less. If the content of tin is at least the above lower limit and below the above upper limit, the effects of the present invention will be more effectively exhibited.

較佳為上述金屬部由焊料形成。更佳為上述金屬部之外表面部分由焊料形成。Preferably, the metal part is formed of solder. More preferably, the outer surface portion of the metal portion is formed of solder.

上述焊料較佳為基於JIS Z3001:熔接術語,熔點為450℃以下之金屬(低熔點金屬)。該低熔點金屬表示熔點為450℃以下之金屬。低熔點金屬之熔點較佳為300℃以下。又,上述焊料包含錫。上述焊料所含之金屬100重量%中,錫之含量較佳為30重量%以上,更佳為40重量%以上,進而較佳為70重量%以上,特佳為90重量%以上。若上述焊料中之錫之含量為上述下限以上,則進一步有效地發揮本發明之效果。The above-mentioned solder is preferably a metal (low melting point metal) with a melting point of 450°C or less based on JIS Z3001: welding term. The low melting point metal refers to a metal with a melting point of 450°C or less. The melting point of the low melting point metal is preferably 300°C or less. In addition, the above-mentioned solder contains tin. In 100% by weight of the metal contained in the solder, the content of tin is preferably 30% by weight or more, more preferably 40% by weight or more, still more preferably 70% by weight or more, particularly preferably 90% by weight or more. If the content of tin in the solder is greater than or equal to the above lower limit, the effects of the present invention will be more effectively exhibited.

再者,金屬部或包含金屬之層中之各種金屬之含量能夠使用高頻感應耦合電漿發射光譜分析裝置(堀場製作所公司製造之「ICP-AES」)或螢光X射線分析裝置(島津製作所公司製造之「EDX-800HS」)等進行測定。In addition, the content of various metals in the metal part or the metal-containing layer can be analyzed by a high-frequency inductively coupled plasma emission spectrometer ("ICP-AES" manufactured by Horiba Manufacturing Co., Ltd.) or a fluorescent X-ray analysis device (Shimadzu Manufacturing Co., Ltd.) "EDX-800HS" manufactured by the company), etc. for measurement.

構成上述焊料之低熔點金屬並無特別限定。該低熔點金屬較佳為錫或含錫之合金。該合金可例舉:錫-銀合金、錫-銅合金、錫-銀-銅合金、錫-鉍合金、錫-鋅合金、錫-銦合金等。就對於連接對象構件之濡濕性優異之方面而言,上述低熔點金屬較佳為錫、錫-銀合金、錫-銀-銅合金、錫-鉍合金、錫-銦合金。更佳為錫-鉍合金、錫-銦合金。The low melting point metal constituting the aforementioned solder is not particularly limited. The low melting point metal is preferably tin or an alloy containing tin. The alloy may be exemplified by tin-silver alloy, tin-copper alloy, tin-silver-copper alloy, tin-bismuth alloy, tin-zinc alloy, tin-indium alloy, and the like. In terms of excellent wettability of the connection target member, the low melting point metal is preferably tin, tin-silver alloy, tin-silver-copper alloy, tin-bismuth alloy, and tin-indium alloy. More preferred are tin-bismuth alloys and tin-indium alloys.

為了進一步提高連接強度,上述焊料可包含鎳、銅、銻、鋁、鋅、鐵、金、鈦、磷、鍺、碲、鈷、鉍、錳、鉻、鉬、鈀等金屬。又,就進一步提高連接強度之觀點而言,上述焊料較佳為包含鎳、銅、銻、鋁或鋅。就進一步提高連接強度之觀點而言,用以提高連接強度之該等金屬之含量於焊料100重量%中較佳為0.0001重量%以上,且較佳為1重量%以下。In order to further improve the connection strength, the aforementioned solder may contain metals such as nickel, copper, antimony, aluminum, zinc, iron, gold, titanium, phosphorus, germanium, tellurium, cobalt, bismuth, manganese, chromium, molybdenum, and palladium. In addition, from the viewpoint of further improving the connection strength, the solder preferably contains nickel, copper, antimony, aluminum, or zinc. From the viewpoint of further improving the connection strength, the content of the metals used to increase the connection strength in 100% by weight of the solder is preferably 0.0001% by weight or more, and preferably 1% by weight or less.

上述金屬部可由1層形成。上述金屬部亦可由複數層形成。即,上述金屬部可具有2層以上之積層結構。就進一步有效地提高導通可靠性之觀點而言,上述金屬部較佳為具有2層以上之積層結構。The metal part may be formed in one layer. The above-mentioned metal part may be formed of a plurality of layers. That is, the above-mentioned metal part may have a laminated structure of two or more layers. From the viewpoint of further effectively improving the conduction reliability, it is preferable that the metal part has a laminated structure of two or more layers.

於上述基材粒子之表面上形成金屬部之方法並無特別限定。作為形成上述金屬部之方法,可例舉:無電解鍍覆方法、電鍍方法、物理碰撞方法、機械化學反應方法、物理蒸鍍或物理吸附方法、以及將金屬粉末或者包含金屬粉末與黏合劑之糊塗佈於基材粒子之表面之方法。形成上述金屬部之方法較佳為無電解鍍覆、電鍍或物理碰撞方法。作為上述物理蒸鍍方法,可例舉真空蒸鍍、離子鍍覆及離子濺鍍等方法。又,上述物理碰撞方法使用Theta Composer(徳壽工作所公司製造)等。The method of forming a metal part on the surface of the said base material particle is not specifically limited. Examples of methods for forming the above-mentioned metal parts include: electroless plating methods, electroplating methods, physical collision methods, mechanochemical reaction methods, physical vapor deposition or physical adsorption methods, and metal powder or a combination of metal powder and a binder. A method of applying paste on the surface of substrate particles. The method of forming the above-mentioned metal part is preferably an electroless plating, electroplating, or a physical collision method. As the above-mentioned physical vapor deposition method, methods such as vacuum vapor deposition, ion plating, and ion sputtering may be mentioned. In addition, the above-mentioned physical collision method uses Theta Composer (manufactured by Tokusu Works Co., Ltd.) or the like.

防銹劑: 上述金屬部之外表面可藉由防銹劑進行防銹處理。上述金屬被覆粒子於上述金屬部之外表面上可具有由防銹劑形成之防銹膜。Rust inhibitor: The outer surface of the metal part can be treated with an anti-rust agent. The metal-coated particles may have an anti-rust film formed of an anti-rust agent on the outer surface of the metal part.

作為上述防銹劑,可例舉具有碳數6~22之烷基之化合物(以下有時記為化合物A)等。上述防銹劑可為不含磷之化合物。上述防銹劑可例舉磷酸烷基酯化合物或烷基硫醇等。上述防銹劑可僅使用1種,亦可併用2種以上。As the above-mentioned rust inhibitor, a compound having an alkyl group having 6 to 22 carbon atoms (hereinafter may be referred to as compound A) and the like may be mentioned. The aforementioned rust inhibitor may be a compound that does not contain phosphorus. The rust inhibitor may, for example, be an alkyl phosphate compound or an alkyl mercaptan. As for the said rust inhibitor, only 1 type may be used, and 2 or more types may be used together.

若上述化合物A之烷基碳數為6以上,則金屬部更難生銹。若上述化合物A之烷基碳數為22以下,則導電性變高。上述化合物A之烷基碳數較佳為16以下。上述烷基可具有直鏈結構,亦可具有支鏈結構。上述烷基較佳為具有直鏈結構。If the alkyl carbon number of the compound A is 6 or more, the metal part is more difficult to rust. When the number of carbon atoms in the alkyl group of the compound A is 22 or less, the conductivity becomes higher. The number of carbon atoms in the alkyl group of the compound A is preferably 16 or less. The above-mentioned alkyl group may have a linear structure or a branched structure. The above-mentioned alkyl group preferably has a linear structure.

上述化合物A只要具有碳數6~22之烷基則並無特別限定。上述化合物A較佳為具有碳數6~22之烷基之磷酸酯或其鹽、具有碳數6~22之烷基之亞磷酸酯或其鹽、或具有碳數6~22之烷基之烷氧基矽烷。上述化合物A較佳為具有碳數6~22之烷基之烷基硫醇或具有碳數6~22之烷基之二烷基二硫醚。上述具有碳數6~22之烷基之化合物A較佳為磷酸酯或其鹽、亞磷酸酯或其鹽、烷氧基矽烷、烷基硫醇或二烷基二硫醚。藉由使用該等適宜之化合物A,可使上述金屬部更難生銹。就更難生銹之觀點而言,上述化合物A較佳為上述磷酸酯或其鹽、亞磷酸酯或其鹽、或烷基硫醇,更佳為上述磷酸酯或其鹽、或亞磷酸酯或其鹽。上述化合物A可僅使用1種,亦可併用2種以上。The compound A is not particularly limited as long as it has an alkyl group having 6 to 22 carbon atoms. The above-mentioned compound A is preferably a phosphoric acid ester or a salt thereof having an alkyl group having 6 to 22 carbons, a phosphite ester or a salt thereof having an alkyl group having 6 to 22 carbons, or an alkyl group having 6 to 22 carbons. Alkoxysilane. The above-mentioned compound A is preferably an alkyl mercaptan having an alkyl group having 6 to 22 carbons or a dialkyl disulfide having an alkyl group having 6 to 22 carbons. The compound A having an alkyl group having 6 to 22 carbon atoms is preferably a phosphoric acid ester or a salt thereof, a phosphite ester or a salt thereof, an alkoxysilane, an alkyl mercaptan, or a dialkyl disulfide. By using these suitable compounds A, the metal parts can be made more difficult to rust. From the viewpoint of being more difficult to rust, the above-mentioned compound A is preferably the above-mentioned phosphate or its salt, phosphite or its salt, or alkyl mercaptan, and more preferably the above-mentioned phosphate or its salt, or phosphite Or its salt. The above-mentioned compound A may use only 1 type, and may use 2 or more types together.

上述化合物A較佳為具有能夠與金屬部之外表面反應之反應性官能基。上述防銹劑較佳為與上述金屬部化學鍵結。藉由存在上述反應性官能基、以及進行上述化學鍵結,上述防銹劑難以產生剝離,結果金屬部更難生銹。The above-mentioned compound A preferably has a reactive functional group capable of reacting with the outer surface of the metal part. The rust inhibitor is preferably chemically bonded to the metal part. The presence of the above-mentioned reactive functional group and the above-mentioned chemical bonding make it difficult for the above-mentioned rust inhibitor to peel off. As a result, the metal part is harder to rust.

作為上述具有碳數6~22之烷基之磷酸酯或其鹽,例如可例舉:磷酸己酯、磷酸庚酯、磷酸單辛酯、磷酸單壬酯、磷酸單癸酯、磷酸單十一烷基酯、磷酸單十二烷基酯、磷酸單十三烷基酯、磷酸單十四烷基酯、磷酸單十五烷基酯、磷酸單己酯單鈉鹽、磷酸單庚酯單鈉鹽、磷酸單辛酯單鈉鹽、磷酸單壬酯單鈉鹽、磷酸單癸酯單鈉鹽、磷酸單十一烷基酯單鈉鹽、磷酸單十二烷基酯單鈉鹽、磷酸單十三烷基酯單鈉鹽、磷酸單十四烷基酯單鈉鹽及磷酸單十五烷基酯單鈉鹽等。亦可使用上述磷酸酯之鉀鹽。Examples of the above-mentioned phosphoric acid ester or its salt having an alkyl group having 6 to 22 carbon atoms include: hexyl phosphate, heptyl phosphate, monooctyl phosphate, monononyl phosphate, monodecyl phosphate, monoundecyl phosphate Alkyl ester, monododecyl phosphate, monotridecyl phosphate, monotetradecyl phosphate, monopentadecyl phosphate, monohexyl phosphate monosodium salt, monoheptyl monosodium phosphate Salt, monooctyl phosphate monosodium salt, monononyl phosphate monosodium salt, monodecyl phosphate monosodium salt, monoundecyl phosphate monosodium salt, monododecyl phosphate monosodium salt, monophosphate monosodium salt Tridecyl monosodium salt, monotetradecyl phosphate monosodium salt and monopentadecyl phosphate monosodium salt, etc. Potassium salts of the above-mentioned phosphoric esters can also be used.

作為上述具有碳數6~22之烷基之亞磷酸酯或其鹽,例如可例舉:亞磷酸己酯、亞磷酸庚酯、亞磷酸單辛酯、亞磷酸單壬酯、亞磷酸單癸酯、亞磷酸單十一烷基酯、亞磷酸單十二烷基酯、亞磷酸單十三烷基酯、亞磷酸單十四烷基酯、亞磷酸單十五烷基酯、亞磷酸單己酯單鈉鹽、亞磷酸單庚酯單鈉鹽、亞磷酸單辛酯單鈉鹽、亞磷酸單壬酯單鈉鹽、亞磷酸單癸酯單鈉鹽、亞磷酸單十一烷基酯單鈉鹽、亞磷酸單十二烷基酯單鈉鹽、亞磷酸單十三烷基酯單鈉鹽、亞磷酸單十四烷基酯單鈉鹽及亞磷酸單十五烷基酯單鈉鹽等。亦可使用上述亞磷酸酯之鉀鹽。Examples of the phosphite or salt thereof having an alkyl group having 6 to 22 carbon atoms include hexyl phosphite, heptyl phosphite, monooctyl phosphite, monononyl phosphite, and monodecyl phosphite. Ester, monoundecyl phosphite, monododecyl phosphite, monotridecyl phosphite, monotetradecyl phosphite, monopentadecyl phosphite, monopentadecyl phosphite Hexyl ester monosodium salt, monoheptyl phosphite monosodium salt, monooctyl phosphite monosodium salt, monononyl phosphite monosodium salt, monodecyl phosphite monosodium salt, monoundecyl phosphite Monosodium salt, monododecyl phosphite monosodium salt, monotridecyl phosphite monosodium salt, monotetradecyl phosphite monosodium salt and monopentadecyl phosphite monosodium Salt etc. Potassium salts of the above-mentioned phosphites can also be used.

作為上述具有碳數6~22之烷基之烷氧基矽烷,例如可例舉:己基三甲氧基矽烷、己基三乙氧基矽烷、庚基三甲氧基矽烷、庚基三乙氧基矽烷、辛基三甲氧基矽烷、辛基三乙氧基矽烷、壬基三甲氧基矽烷、壬基三乙氧基矽烷、癸基三甲氧基矽烷、癸基三乙氧基矽烷、十一烷基三甲氧基矽烷、十一烷基三乙氧基矽烷、十二烷基三甲氧基矽烷、十二烷基三乙氧基矽烷、十三烷基三甲氧基矽烷、十三烷基三乙氧基矽烷、十四烷基三甲氧基矽烷、十四烷基三乙氧基矽烷、十五烷基三甲氧基矽烷及十五烷基三乙氧基矽烷等。As the above-mentioned alkoxysilane having an alkyl group having 6 to 22 carbon atoms, for example, hexyltrimethoxysilane, hexyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, Octyltrimethoxysilane, octyltriethoxysilane, nonyltrimethoxysilane, nonyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, undecyltrimethoxysilane Oxysilane, undecyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, tridecyltrimethoxysilane, tridecyltriethoxysilane Silane, tetradecyltrimethoxysilane, tetradecyltriethoxysilane, pentadecyltrimethoxysilane and pentadecyltriethoxysilane, etc.

作為上述具有碳數6~22之烷基之烷基硫醇,例如可例舉:己硫醇、庚硫醇、辛硫醇、壬硫醇、癸硫醇、十一烷基硫醇、十二烷基硫醇、十三烷基硫醇、十四烷基硫醇、十五烷基硫醇及十六烷基硫醇等。上述烷基硫醇較佳為於烷基鏈之末端具有硫醇基。As the alkyl mercaptan having an alkyl group having 6 to 22 carbon atoms, for example, hexyl mercaptan, heptyl mercaptan, octyl mercaptan, nonyl mercaptan, decyl mercaptan, undecyl mercaptan, and decyl mercaptan may be mentioned. Dialkyl mercaptan, tridecyl mercaptan, tetradecyl mercaptan, pentadecyl mercaptan and hexadecyl mercaptan, etc. The above-mentioned alkyl mercaptan preferably has a thiol group at the end of the alkyl chain.

作為上述具有碳數6~22之烷基之二烷基二硫醚,例如可例舉:二己基二硫醚、二庚基二硫醚、二辛基二硫醚、二壬基二硫醚、二癸基二硫醚、二-十一烷基二硫醚、二-十二烷基二硫醚、二-十三烷基二硫醚、二-十四烷基二硫醚、二-十五烷基二硫醚及二-十六烷基二硫醚等。Examples of the dialkyl disulfide having an alkyl group having 6 to 22 carbon atoms include dihexyl disulfide, diheptyl disulfide, dioctyl disulfide, and dinonyl disulfide. , Didecyl disulfide, di-undecyl disulfide, di-dodecyl disulfide, di-tridecyl disulfide, di-tetradecyl disulfide, di- Pentadecyl disulfide and dihexadecyl disulfide, etc.

助焊劑: 上述金屬部之外表面可藉由助焊劑加以處理。藉由使用助焊劑,可防止上述金屬部中金屬之氧化,或者去除異物或氧化膜。上述助焊劑並無特別限定。作為上述助焊劑,可使用焊料接合等中通常使用之助焊劑。Flux: The outer surface of the metal part can be treated with flux. By using flux, the oxidation of the metal in the metal part can be prevented, or foreign matter or oxide film can be removed. The above-mentioned flux is not particularly limited. As the above-mentioned flux, fluxes commonly used in solder bonding and the like can be used.

作為上述助焊劑,可例舉:氯化鋅、氯化鋅與無機鹵化物之混合物、氯化鋅與無機酸之混合物、熔鹽、磷酸、磷酸之衍生物、有機鹵化物、肼、胺化合物、有機酸及松脂等。上述助焊劑可僅使用1種,亦可併用2種以上。Examples of the above-mentioned flux include: zinc chloride, a mixture of zinc chloride and inorganic halides, a mixture of zinc chloride and inorganic acids, molten salts, phosphoric acid, phosphoric acid derivatives, organic halides, hydrazine, and amine compounds , Organic acids and rosin, etc. Only one type of the above-mentioned flux may be used, or two or more types may be used in combination.

作為上述熔鹽,可例舉氯化銨等。作為上述有機酸,可例舉:乳酸、檸檬酸、硬脂酸、麩胺酸及戊二酸等。作為上述松脂,可例舉活化松脂及非活化松脂等。上述助焊劑較佳為具有2個以上羧基之有機酸或松脂。上述助焊劑可為具有2個以上羧基之有機酸,亦可為松脂。藉由使用具有2個以上羧基之有機酸、松脂,使連接強度及導通可靠性進一步提高。As said molten salt, ammonium chloride etc. are mentioned. As said organic acid, lactic acid, citric acid, stearic acid, glutamic acid, glutaric acid, etc. are mentioned. As said rosin, activated rosin and non-activated rosin, etc. are mentioned. The above-mentioned flux is preferably an organic acid or rosin having two or more carboxyl groups. The above-mentioned flux may be an organic acid having two or more carboxyl groups, or may be rosin. By using organic acids and rosin with two or more carboxyl groups, the connection strength and conduction reliability are further improved.

作為上述具有2個以上羧基之有機酸,例如可例舉:琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸及癸二酸等。Examples of the organic acid having two or more carboxyl groups include succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, and sebacic acid.

作為上述胺化合物,可例舉:環己胺、二環己胺、苄胺、二苯甲基胺、咪唑、苯并咪唑、苯基咪唑、羧基苯并咪唑、苯并三唑及羧基苯并三唑等。Examples of the above-mentioned amine compounds include: cyclohexylamine, dicyclohexylamine, benzylamine, benzhydrylamine, imidazole, benzimidazole, phenylimidazole, carboxybenzimidazole, benzotriazole, and carboxybenzo Triazole and so on.

上述松脂為以松香酸為主要成分之松香類。作為上述松香類,可例舉松香酸及丙烯酸改性松香等。助焊劑較佳為松香類,更佳為松香酸。藉由使用該等適宜之助焊劑,使助焊劑效果進一步提高。The rosin mentioned above is a rosin with rosin acid as the main component. As said rosin, abietic acid, acrylic modified rosin, etc. are mentioned. The flux is preferably rosin, more preferably rosin acid. By using these suitable fluxes, the flux effect is further improved.

上述助焊劑之活性溫度(熔點)較佳為50℃以上,更佳為70℃以上,進而較佳為80℃以上,並且,較佳為200℃以下,更佳為190℃以下,更佳為160℃以下,進而較佳為150℃以下,進而更佳為140℃以下。若上述助焊劑之活性溫度為上述下限以上及上述上限以下,則使助焊劑效果進一步提高。The activation temperature (melting point) of the above-mentioned flux is preferably 50°C or higher, more preferably 70°C or higher, still more preferably 80°C or higher, and preferably 200°C or lower, more preferably 190°C or lower, more preferably 160°C or lower, more preferably 150°C or lower, and still more preferably 140°C or lower. If the activation temperature of the flux is above the above lower limit and below the above upper limit, the effect of the flux is further improved.

上述助焊劑之熔點可藉由示差掃描熱量測定(DSC)求出。作為示差掃描熱量測定(DSC)裝置,可例舉SII公司製造之「EXSTAR DSC7020」等。The melting point of the above-mentioned flux can be determined by differential scanning calorimetry (DSC). As a differential scanning calorimetry (DSC) device, "EXSTAR DSC7020" manufactured by SII Corporation can be mentioned.

又,上述助焊劑之沸點較佳為200℃以下。Moreover, it is preferable that the boiling point of the said flux is 200 degrees C or less.

上述助焊劑較佳為藉由加熱而釋出陽離子之助焊劑。藉由使用利用加熱而釋出陽離子之助焊劑,而使連接強度及導通可靠性進一步提高。The above-mentioned flux is preferably a flux that releases cations by heating. By using a flux that releases cations by heating, the connection strength and conduction reliability are further improved.

作為上述藉由加熱而釋出陽離子之助焊劑,可例舉上述熱陽離子起始劑(熱陽離子硬化劑)。As the above-mentioned flux that releases cations by heating, the above-mentioned thermal cationic initiator (thermal cation hardener) can be mentioned.

就進一步提高助焊劑效果之觀點而言,上述助焊劑較佳為酸化合物與鹼化合物之鹽。From the viewpoint of further enhancing the effect of the flux, the flux is preferably a salt of an acid compound and an alkali compound.

上述酸化合物較佳為具有羧基之有機化合物。作為上述酸化合物,可例舉:作為脂肪族系羧酸之丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、檸檬酸、蘋果酸;作為環狀脂肪族羧酸之環己基羧酸、1,4-環己基二羧酸;作為芳香族羧酸之間苯二甲酸、對苯二甲酸、偏苯三甲酸及乙二胺四乙酸等。就進一步有效地提高連接強度,以及進一步有效地提高導通可靠性之觀點而言,上述酸化合物較佳為戊二酸、環己基羧酸或己二酸。The above-mentioned acid compound is preferably an organic compound having a carboxyl group. Examples of the above-mentioned acid compounds include: aliphatic carboxylic acids such as malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, citric acid, Malic acid; cyclohexyl carboxylic acid, 1,4-cyclohexyl dicarboxylic acid as cyclic aliphatic carboxylic acid; phthalic acid, terephthalic acid, trimellitic acid and ethylene diamine as aromatic carboxylic acid Tetraacetic acid and so on. From the viewpoint of further effectively improving the connection strength and further effectively improving the conduction reliability, the above-mentioned acid compound is preferably glutaric acid, cyclohexyl carboxylic acid or adipic acid.

上述鹼化合物較佳為具有胺基之有機化合物。作為上述鹼化合物,可例舉:二乙醇胺、三乙醇胺、甲基二乙醇胺、乙基二乙醇胺、環己胺、二環己胺、苄胺、二苯甲基胺、2-甲基苄胺、3-甲基苄胺、4-第三丁基苄胺、N-甲基苄胺、N-乙基苄胺、N-苯基苄胺、N-第三丁基苄胺、N-異丙基苄胺、N,N-二甲基苄胺、咪唑化合物及三唑化合物。就進一步有效地提高連接強度,以及進一步有效地提高導通可靠性之觀點而言,上述鹼化合物較佳為苄胺。The above-mentioned base compound is preferably an organic compound having an amino group. As the above-mentioned base compound, diethanolamine, triethanolamine, methyldiethanolamine, ethyldiethanolamine, cyclohexylamine, dicyclohexylamine, benzylamine, benzhydrylamine, 2-methylbenzylamine, 3-methylbenzylamine, 4-tert-butylbenzylamine, N-methylbenzylamine, N-ethylbenzylamine, N-phenylbenzylamine, N-tert-butylbenzylamine, N-isopropyl Benzylamine, N,N-dimethylbenzylamine, imidazole compounds and triazole compounds. From the viewpoint of further effectively improving the connection strength and further effectively improving the conduction reliability, the above-mentioned alkali compound is preferably benzylamine.

(焊料糊) 本發明之焊料糊包含複數個焊料粒子及複數個金屬被覆粒子。本發明之焊料糊含有金屬被覆粒子。本發明之焊料糊可使用上述金屬被覆粒子。本發明之焊料糊所含之上述金屬被覆粒子之比重為6.0以下。本發明之焊料糊所含之上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部。本發明之焊料糊所含之上述金屬被覆粒子的上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。(Solder paste) The solder paste of the present invention includes a plurality of solder particles and a plurality of metal-coated particles. The solder paste of the present invention contains metal-coated particles. The above-mentioned metal-coated particles can be used for the solder paste of the present invention. The specific gravity of the metal-coated particles contained in the solder paste of the present invention is 6.0 or less. The metal-coated particles contained in the solder paste of the present invention have a base particle and a metal part arranged on the surface of the base particle. The metal portion of the metal-coated particles contained in the solder paste of the present invention includes a metal capable of forming an intermetallic compound with solder, or a metal capable of fusion bonding with solder, or a metal capable of diffusing together with solder.

「焊料糊」之術語包括藉由加熱而熔融以使連接對象構件連接之糊狀的焊料接合材料。The term "solder paste" includes a paste-like solder bonding material that is melted by heating to connect the connection object members.

上述焊料粒子之粒徑相對於上述基材粒子之粒徑的比(上述焊料粒子之粒徑/上述基材粒子之粒徑)較佳為0.1以上,更佳為0.5以上,進而較佳為1以上,特佳為1.5以上。上述比(上述焊料粒子之粒徑/上述基材粒子之粒徑)較佳為20以下,更佳為15以下,進而較佳為10以下,特佳為8以下。若上述比為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。The ratio of the particle diameter of the solder particles to the particle diameter of the substrate particles (the particle diameter of the solder particles/the particle diameter of the substrate particles) is preferably 0.1 or more, more preferably 0.5 or more, and still more preferably 1 Above, 1.5 or more is particularly preferred. The above-mentioned ratio (the particle diameter of the solder particles/the particle diameter of the substrate particles) is preferably 20 or less, more preferably 15 or less, still more preferably 10 or less, and particularly preferably 8 or less. If the said ratio is more than the said lower limit and the said upper limit, the effect of this invention will be exhibited more effectively.

上述焊料糊中,上述焊料粒子之含量較佳為20重量%以上,更佳為30重量%以上,進而較佳為50重量%以上,特佳為70重量%以上。上述焊料糊中,上述焊料粒子之含量較佳為99.99重量%以下,更佳為99.90重量%以下,進而較佳為99.00重量%以下,特佳為98.00重量%以下。若上述焊料粒子之含量為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。In the solder paste, the content of the solder particles is preferably 20% by weight or more, more preferably 30% by weight or more, still more preferably 50% by weight or more, and particularly preferably 70% by weight or more. In the solder paste, the content of the solder particles is preferably 99.99% by weight or less, more preferably 99.90% by weight or less, still more preferably 99.00% by weight or less, and particularly preferably 98.00% by weight or less. If the content of the solder particles is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the effects of the present invention can be more effectively exhibited.

上述焊料糊中,上述金屬被覆粒子之含量較佳為0.01重量%以上,更佳為0.10重量%以上,進而較佳為0.50重量%以上,特佳為1.00重量%以上。上述焊料糊中,上述金屬被覆粒子之含量較佳為70重量%以下,更佳為50重量%以下,進而較佳為30重量%以下,特佳為20重量%以下。若上述金屬被覆粒子之含量為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。In the solder paste, the content of the metal-coated particles is preferably 0.01% by weight or more, more preferably 0.10% by weight or more, still more preferably 0.50% by weight or more, and particularly preferably 1.00% by weight or more. In the solder paste, the content of the metal-coated particles is preferably 70% by weight or less, more preferably 50% by weight or less, still more preferably 30% by weight or less, and particularly preferably 20% by weight or less. If the content of the metal-coated particles is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the effects of the present invention can be more effectively exhibited.

上述焊料糊中,上述焊料粒子與上述金屬被覆粒子之合計含量較佳為21重量%以上,更佳為31重量%以上,進而較佳為51重量%以上,特佳為71重量%以上。上述焊料糊中,上述焊料粒子與上述金屬被覆粒子之合計含量較佳為100重量%以下,更佳為99.9重量%以下,進而較佳為99.0重量%以下,特佳為98.0重量%以下。若上述焊料粒子與上述金屬被覆粒子之合計含量為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。In the solder paste, the total content of the solder particles and the metal-coated particles is preferably 21% by weight or more, more preferably 31% by weight or more, still more preferably 51% by weight or more, and particularly preferably 71% by weight or more. In the solder paste, the total content of the solder particles and the metal-coated particles is preferably 100% by weight or less, more preferably 99.9% by weight or less, still more preferably 99.0% by weight or less, and particularly preferably 98.0% by weight or less. If the total content of the solder particles and the metal-coated particles is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the effects of the present invention can be more effectively exhibited.

本發明之焊料糊可包含有機溶劑及助焊劑中之至少一者。本發明之焊料糊可包含有機溶劑,亦可包含助焊劑。又,本發明之焊料糊亦可視需要包含觸變劑或界面活性劑等添加劑。The solder paste of the present invention may include at least one of an organic solvent and a flux. The solder paste of the present invention may include an organic solvent, and may also include a flux. In addition, the solder paste of the present invention may optionally contain additives such as a thixotropic agent or a surfactant.

焊料粒子: 上述焊料粒子之粒徑較佳為0.1 μm以上,更佳為1 μm以上,並且,較佳為100 μm以下,更佳為50 μm以下。若上述焊料粒子之粒徑為上述下限以上及上述上限以下,則進一步有效地發揮本發明之效果。Solder particles: The particle size of the solder particles is preferably 0.1 μm or more, more preferably 1 μm or more, and is preferably 100 μm or less, and more preferably 50 μm or less. If the particle diameter of the solder particles is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the effects of the present invention can be more effectively exhibited.

上述焊料粒子之粒徑較佳為平均粒徑,更佳為數量平均粒徑。上述焊料粒子之粒徑例如可藉由如下方式求出,即,藉由電子顯微鏡或光學顯微鏡觀察任意50個焊料粒子,算出各焊料粒子之粒徑之平均值,或者使用粒度分佈測定裝置算出。於利用電子顯微鏡或光學顯微鏡進行觀察時,每個焊料粒子之粒徑作為以圓相當徑計之粒徑求出。於利用電子顯微鏡或光學顯微鏡進行觀察時,任意50個焊料粒子之以圓相當徑計之平均粒徑幾乎等於以球相當徑計之平均粒徑。於粒度分佈測定裝置中,每個焊料粒子之粒徑作為以球相當徑計之粒徑求出。上述焊料粒子之平均粒徑較佳為使用粒度分佈測定裝置算出。The particle diameter of the solder particles is preferably an average particle diameter, and more preferably a number average particle diameter. The particle size of the solder particles can be determined, for example, by observing any 50 solder particles with an electron microscope or an optical microscope and calculating the average value of the particle sizes of each solder particle, or by using a particle size distribution measuring device. When observing with an electron microscope or an optical microscope, the particle diameter of each solder particle is calculated as the diameter equivalent to a circle. When observing with an electron microscope or an optical microscope, the average diameter of any 50 solder particles in terms of circle equivalent diameter is almost equal to the average diameter of sphere equivalent diameter. In the particle size distribution measuring device, the particle size of each solder particle is calculated as the particle size in terms of the equivalent diameter of the sphere. The average particle size of the solder particles is preferably calculated using a particle size distribution measuring device.

上述焊料粒子之粒徑之變異係數(CV值)較佳為15%以下,更佳為10%以下。若上述焊料粒子之粒徑之變異係數為上述上限以下,則容易使上述焊料粒子更均勻地分散於焊料糊中。The coefficient of variation (CV value) of the particle diameter of the solder particles is preferably 15% or less, more preferably 10% or less. If the coefficient of variation of the particle diameter of the solder particles is equal to or less than the upper limit, it is easy to disperse the solder particles more uniformly in the solder paste.

上述變異係數(CV值)可如下進行測定。The aforementioned coefficient of variation (CV value) can be measured as follows.

CV值(%)=(ρ/Dn)×100 ρ:焊料粒子之粒徑之標準偏差 Dn:焊料粒子之粒徑之平均值CV value (%)=(ρ/Dn)×100 ρ: Standard deviation of the size of solder particles Dn: the average value of the diameter of the solder particles

上述焊料粒子之形狀並無特別限定。上述焊料粒子之形狀可為球狀,可為球狀以外之形狀,亦可為扁平狀等形狀。The shape of the aforementioned solder particles is not particularly limited. The shape of the above-mentioned solder particles may be a spherical shape, a shape other than a spherical shape, or a shape such as a flat shape.

上述焊料較佳為基於JIS Z3001:熔接術語,熔點為450℃以下之金屬(低熔點金屬)。該低熔點金屬表示熔點為450℃以下之金屬。低熔點金屬之熔點較佳為300℃以下。又,上述焊料包含錫。上述焊料所含之金屬100重量%中,錫之含量較佳為30重量%以上,更佳為40重量%以上,進而較佳為70重量%以上,特佳為90重量%以上。若上述焊料中之錫含量為上述下限以上,則進一步有效地發揮本發明之效果。The above-mentioned solder is preferably a metal (low melting point metal) with a melting point of 450°C or less based on JIS Z3001: welding term. The low melting point metal refers to a metal with a melting point of 450°C or less. The melting point of the low melting point metal is preferably 300°C or less. In addition, the above-mentioned solder contains tin. In 100% by weight of the metal contained in the solder, the content of tin is preferably 30% by weight or more, more preferably 40% by weight or more, still more preferably 70% by weight or more, particularly preferably 90% by weight or more. If the tin content in the solder is more than or equal to the above lower limit, the effects of the present invention will be more effectively exhibited.

再者,焊料粒子中之各種金屬之含量能夠使用高頻感應耦合電漿發射光譜分析裝置(堀場製作所公司製造之「ICP-AES」)或螢光X射線分析裝置(島津製作所公司製造之「EDX-800HS」)等進行測定。Furthermore, the content of various metals in the solder particles can be analyzed by a high-frequency inductively coupled plasma emission spectrometer ("ICP-AES" manufactured by Horiba) or a fluorescent X-ray analyzer ("EDX" manufactured by Shimadzu) -800HS”) and so on.

構成上述焊料之低熔點金屬並無特別限定。該低熔點金屬較佳為錫或含錫之合金。該合金可例舉:錫-銀合金、錫-銅合金、錫-銀-銅合金、錫-鉍合金、錫-鋅合金、錫-銦合金等。就進一步有效地提高連接強度,以及進一步有效地提高導通可靠性之觀點而言,上述低熔點金屬較佳為錫、錫-銀合金、錫-銀-銅合金、錫-金合金、錫-銻合金、錫-鉛合金、錫-鉍合金、錫-銦合金。The low melting point metal constituting the aforementioned solder is not particularly limited. The low melting point metal is preferably tin or an alloy containing tin. The alloy may be exemplified by tin-silver alloy, tin-copper alloy, tin-silver-copper alloy, tin-bismuth alloy, tin-zinc alloy, tin-indium alloy, and the like. From the viewpoint of further effectively improving the connection strength and further effectively improving the conduction reliability, the above-mentioned low melting point metal is preferably tin, tin-silver alloy, tin-silver-copper alloy, tin-gold alloy, tin-antimony Alloy, tin-lead alloy, tin-bismuth alloy, tin-indium alloy.

為了進一步提高連接強度,上述焊料可包含鎳、銅、銻、鋁、鋅、鐵、金、鈦、磷、鍺、碲、鈷、鉍、錳、鉻、鉬、鈀等金屬。又,就進一步提高連接強度之觀點而言,上述焊料較佳為包含鎳、銅、銻、鋁或鋅。就進一步提高連接強度之觀點而言,用以提高連接強度之該等金屬之含量於焊料100重量%中較佳為0.0001重量%以上,並且,較佳為1重量%以下。In order to further improve the connection strength, the aforementioned solder may contain metals such as nickel, copper, antimony, aluminum, zinc, iron, gold, titanium, phosphorus, germanium, tellurium, cobalt, bismuth, manganese, chromium, molybdenum, and palladium. In addition, from the viewpoint of further improving the connection strength, the solder preferably contains nickel, copper, antimony, aluminum, or zinc. From the viewpoint of further improving the connection strength, the content of the metals used to increase the connection strength in 100% by weight of the solder is preferably 0.0001% by weight or more, and more preferably 1% by weight or less.

就進一步有效地發揮本發明之效果之觀點而言,上述焊料粒子較佳為Sn-Ag-Cu粒子(SAC粒子)、Sn-Bi粒子或Pb-Sn粒子,更佳為Sn-Ag-Cu粒子(SAC粒子)或Sn-Bi粒子,進而較佳為Sn-Ag-Cu粒子(SAC粒子)。上述焊料粒子可為Sn-Ag-Cu粒子(SAC粒子),可為Sn-Bi粒子,亦可為Pb-Sn粒子。From the viewpoint of further effectively exerting the effects of the present invention, the above-mentioned solder particles are preferably Sn-Ag-Cu particles (SAC particles), Sn-Bi particles or Pb-Sn particles, and more preferably Sn-Ag-Cu particles (SAC particles) or Sn-Bi particles, more preferably Sn-Ag-Cu particles (SAC particles). The above-mentioned solder particles may be Sn-Ag-Cu particles (SAC particles), Sn-Bi particles, or Pb-Sn particles.

助焊劑: 藉由使用上述助焊劑,可防止焊料粒子、金屬被覆粒子及電極中之金屬氧化,或者去除異物或氧化膜。作為上述焊料糊中之上述助焊劑,可例舉上述金屬被覆粒子之說明欄所記載之助焊劑。Flux: By using the above-mentioned flux, it is possible to prevent the oxidation of solder particles, metal-coated particles and the metal in the electrode, or to remove foreign matter or oxide film. As the above-mentioned flux in the above-mentioned solder paste, the flux described in the description column of the above-mentioned metal-coated particles can be exemplified.

於上述焊料糊包含上述助焊劑之情形時,上述焊料糊100重量%中,上述助焊劑之含量較佳為0.01重量%以上,更佳為0.1重量%以上,進而較佳為0.5重量%以上,並且,較佳為30重量%以下,更佳為25重量%以下。若上述助焊劑之含量為上述下限以上及上述上限以下,則於焊料及電極之表面更難形成氧化覆膜,進而,可進一步有效地去除焊料及電極之表面所形成之氧化覆膜。When the solder paste contains the flux, the content of the flux in 100% by weight of the solder paste is preferably 0.01% by weight or more, more preferably 0.1% by weight or more, and still more preferably 0.5% by weight or more, In addition, it is preferably 30% by weight or less, and more preferably 25% by weight or less. If the content of the flux is above the above lower limit and below the above upper limit, it is more difficult to form an oxide film on the surface of the solder and the electrode, and furthermore, the oxide film formed on the surface of the solder and the electrode can be removed more effectively.

有機溶劑: 藉由使用上述有機溶劑,可使焊料糊之操作性提高,或使焊料糊之黏度得以調整。作為上述焊料糊中之上述有機溶劑,可例舉:乙醇等醇化合物;丙酮、甲基乙基酮、環己酮等酮化合物;甲苯、二甲苯、四甲基苯等芳香族烴化合物;溶纖劑、甲基溶纖劑、丁基溶纖劑、卡必醇、甲基卡必醇、丁基卡必醇、丙二醇單甲醚、二丙二醇單甲醚、二丙二醇二乙醚、三丙二醇單甲醚等二醇醚化合物;乙酸乙酯、乙酸丁酯、乳酸丁酯、乙酸溶纖劑、丁基溶纖劑乙酸酯、卡必醇乙酸酯、丁基卡必醇乙酸酯、丙二醇單甲醚乙酸酯、二丙二醇單甲醚乙酸酯、碳酸丙二酯等酯化合物;辛烷、癸烷等脂肪族烴化合物;以及石油醚、石腦油等石油系溶劑等。Organic solvents: By using the above-mentioned organic solvent, the operability of the solder paste can be improved, or the viscosity of the solder paste can be adjusted. Examples of the organic solvent in the solder paste include: alcohol compounds such as ethanol; ketone compounds such as acetone, methyl ethyl ketone, and cyclohexanone; aromatic hydrocarbon compounds such as toluene, xylene, and tetramethylbenzene; Cellosolve, methyl cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, tripropylene glycol monomethyl ether Glycol ether compounds; ethyl acetate, butyl acetate, butyl lactate, cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether Ester compounds such as acetate, dipropylene glycol monomethyl ether acetate, and propylene carbonate; aliphatic hydrocarbon compounds such as octane and decane; and petroleum solvents such as petroleum ether and naphtha.

於上述焊料糊包含上述有機溶劑之情形時,上述焊料糊100重量%中,上述有機溶劑之含量較佳為0.01重量%以上,更佳為0.1重量%以上,進而較佳為0.5重量%以上,並且,較佳為30重量%以下,更佳為25重量%以下。若上述有機溶劑之含量為上述下限以上及上述上限以下,則可使焊料糊之操作性提高,且連接後之連接部難以產生空隙。When the solder paste contains the organic solvent, the content of the organic solvent in 100% by weight of the solder paste is preferably 0.01% by weight or more, more preferably 0.1% by weight or more, and even more preferably 0.5% by weight or more, In addition, it is preferably 30% by weight or less, and more preferably 25% by weight or less. If the content of the organic solvent is greater than or equal to the aforementioned lower limit and less than or equal to the aforementioned upper limit, the workability of the solder paste can be improved, and it is difficult to generate voids in the connected portion after the connection.

其他成分: 上述焊料糊可包含乙烯基樹脂、熱塑性樹脂、硬化性樹脂、熱塑性嵌段共聚物及彈性體等作為其他成分。Other ingredients: The aforementioned solder paste may contain vinyl resins, thermoplastic resins, curable resins, thermoplastic block copolymers, elastomers, and the like as other components.

作為上述乙烯基樹脂,可例舉:乙酸乙烯酯樹脂、丙烯酸樹脂及苯乙烯樹脂等。作為上述熱塑性樹脂,可例舉:聚烯烴樹脂、乙烯-乙酸乙烯酯共聚物及聚醯胺樹脂等。作為上述硬化性樹脂,可例舉:環氧樹脂、聚胺基甲酸酯樹脂、聚醯亞胺樹脂及不飽和聚酯樹脂等。再者,上述硬化性樹脂可為常溫硬化型樹脂、熱硬化型樹脂、光硬化型樹脂或濕氣硬化型樹脂。上述硬化性樹脂可與硬化劑併用。作為上述熱塑性嵌段共聚物,可例舉:苯乙烯-丁二烯-苯乙烯嵌段共聚物、苯乙烯-異戊二烯-苯乙烯嵌段共聚物、苯乙烯-丁二烯-苯乙烯嵌段共聚物之氫化物、以及苯乙烯-異戊二烯-苯乙烯嵌段共聚物之氫化物等。作為上述彈性體,可例舉苯乙烯-丁二烯共聚橡膠、及丙烯腈-苯乙烯嵌段共聚橡膠等。As said vinyl resin, vinyl acetate resin, acrylic resin, styrene resin, etc. are mentioned. As said thermoplastic resin, a polyolefin resin, an ethylene-vinyl acetate copolymer, a polyamide resin, etc. are mentioned. As said curable resin, epoxy resin, polyurethane resin, polyimide resin, unsaturated polyester resin, etc. are mentioned. Furthermore, the above-mentioned curable resin may be a room temperature curable resin, a thermosetting resin, a light curable resin, or a moisture curable resin. The above-mentioned curable resin may be used in combination with a curing agent. Examples of the above-mentioned thermoplastic block copolymers include styrene-butadiene-styrene block copolymers, styrene-isoprene-styrene block copolymers, and styrene-butadiene-styrene block copolymers. The hydrogenated product of block copolymer, and the hydrogenated product of styrene-isoprene-styrene block copolymer, etc. As said elastomer, a styrene-butadiene copolymer rubber, an acrylonitrile-styrene block copolymer rubber, etc. are mentioned.

(連接結構體) 本發明之連接結構體具備:表面具有第1連接區域部之第1連接對象構件、表面具有第2連接區域部之第2連接對象構件、以及連接上述第1連接對象構件與上述第2連接對象構件之連接部。於本發明之連接結構體中,上述連接部由上述焊料糊形成。上述連接部包含自上述焊料粒子形成之焊料、及上述金屬被覆粒子或自上述金屬被覆粒子形成之粒子。於本發明之連接結構體中,上述第1連接區域部與上述第2連接區域部藉由自上述焊料粒子形成之焊料而電性連接。(Connection structure) The connection structure of the present invention includes: a first connection object member having a first connection region portion on the surface, a second connection object member having a second connection region portion on the surface, and connecting the first connection object member and the second connection object The connecting part of the component. In the connection structure of the present invention, the connection portion is formed of the solder paste. The connection portion includes solder formed from the solder particles, and the metal-coated particles or particles formed from the metal-coated particles. In the connection structure of the present invention, the first connection region portion and the second connection region portion are electrically connected by solder formed from the solder particles.

於上述連接部中,上述金屬被覆粒子中之上述金屬部較佳為與焊料形成金屬間化合物,或者與焊料結合,或者與焊料一起擴散。In the connection portion, the metal portion in the metal-coated particles preferably forms an intermetallic compound with solder, is combined with solder, or diffuses together with solder.

於上述連接結構體中,上述金屬被覆粒子或自上述金屬被覆粒子形成之粒子可與上述第1連接區域部及上述第2連接區域部兩者均不相接,亦可僅與上述第1連接區域部及上述第2連接區域部中之一者相接。In the above-mentioned connection structure, the metal-coated particles or particles formed from the metal-coated particles may not be in contact with both the first connection region portion and the second connection region portion, or may only be connected to the first connection region. The area part and one of the above-mentioned second connection area parts are in contact with each other.

上述連接部之平均厚度較佳為比上述金屬被覆粒子或自上述金屬被覆粒子形成之粒子之粒徑大。The average thickness of the connection portion is preferably larger than the particle diameter of the metal-coated particles or particles formed from the metal-coated particles.

圖4係示意性地表示使用包含圖1所示之金屬被覆粒子之焊料糊之連接結構體的剖視圖。Fig. 4 is a cross-sectional view schematically showing a connection structure using a solder paste containing the metal-coated particles shown in Fig. 1.

圖4所示之連接結構體21具備:第1連接對象構件22、第2連接對象構件23、以及連接第1連接對象構件22與第2連接對象構件23之連接部24。連接部24由包含複數個焊料粒子及金屬被覆粒子1之焊料糊形成。The connection structure 21 shown in FIG. 4 includes a first connection object member 22, a second connection object member 23, and a connection portion 24 that connects the first connection object member 22 and the second connection object member 23. The connecting portion 24 is formed of a solder paste including a plurality of solder particles and metal-coated particles 1.

連接部24包含自複數個焊料粒子形成之焊料24a。連接部24包含自金屬被覆粒子1形成之粒子24b。The connecting portion 24 includes solder 24a formed from a plurality of solder particles. The connecting portion 24 includes particles 24 b formed from the metal-coated particles 1.

第1連接對象構件22表面(上表面)具有複數個或單一之第1連接區域部22a。第2連接對象構件23表面(下表面)具有複數個或單一之第2連接區域部23a。第1連接區域部22a與第2連接區域部23a藉由自焊料粒子形成之焊料24a而電性連接或物理連接。因此,第1連接對象構件22與第2連接對象構件23藉由焊料24a而電性連接或物理連接。The surface (upper surface) of the first connection object member 22 has plural or single first connection region portions 22a. The surface (lower surface) of the second connection object member 23 has a plurality of or a single second connection region portion 23a. The first connection region portion 22a and the second connection region portion 23a are electrically or physically connected by solder 24a formed from solder particles. Therefore, the first connection object member 22 and the second connection object member 23 are electrically or physically connected by the solder 24a.

上述連接結構體之製造方法並無特別限定。作為上述連接結構體之製造方法之一例,可例舉如下方法等:於上述第1連接對象構件與上述第2連接對象構件之間配置上述焊料糊,獲得積層體後,對該積層體進行加熱及加壓。藉由加熱及加壓,使上述焊料糊所含之焊料粒子熔融,藉由自焊料粒子形成之焊料而將連接區域部之間電性連接或物理連接。上述加壓之壓力為9.8×104 Pa~4.9×106 Pa。上述加熱之溫度為120℃~220℃。The manufacturing method of the said connection structure is not specifically limited. As an example of the method of manufacturing the above-mentioned connected structure, the following method may be mentioned: the above-mentioned solder paste is placed between the above-mentioned first connection object member and the above-mentioned second connection object member to obtain a layered body, and then the layered body is heated And pressurization. The solder particles contained in the solder paste are melted by heating and pressing, and the connection regions are electrically or physically connected by the solder formed from the solder particles. The above-mentioned pressurization pressure is 9.8×10 4 Pa to 4.9×10 6 Pa. The above heating temperature is 120°C to 220°C.

上述第1連接對象構件及第2連接對象構件並無特別限定。作為上述第1連接對象構件及第2連接對象構件,具體而言,可例舉:半導體晶片、半導體封裝體、LED(Light Emitting Diode,發光二極體)晶片、LED封裝體、電容器及二極體等電子零件;以及樹脂膜、印刷基板、軟性印刷基板、軟性扁平電纜、剛撓結合基板、玻璃環氧基板及玻璃基板等電路基板等電子零件等。上述第1連接對象構件及第2連接對象構件較佳為電子零件。The above-mentioned first connection target member and second connection target member are not particularly limited. As the above-mentioned first connection object member and second connection object member, specifically, a semiconductor chip, a semiconductor package, an LED (Light Emitting Diode) chip, an LED package, a capacitor, and a diode may be mentioned. Electronic parts such as body; and electronic parts such as resin film, printed circuit board, flexible printed circuit board, flexible flat cable, rigid-flex board, glass epoxy substrate and circuit board such as glass substrate. The first connection target member and the second connection target member are preferably electronic components.

上述連接區域部可為電極。The above-mentioned connection region part may be an electrode.

作為設置於上述連接對象構件之電極,可例舉:金電極、鎳電極、錫電極、鋁電極、銅電極、鉬電極、銀電極、SUS(Steel Use Stainless,日本不鏽鋼標準)電極及鎢電極等金屬電極。於上述連接對象構件為軟性印刷基板之情形時,上述電極較佳為金電極、鎳電極、錫電極、銀電極或銅電極。於上述連接對象構件為玻璃基板之情形時,上述電極較佳為鋁電極、銅電極、鉬電極、銀電極或鎢電極。再者,於上述電極為鋁電極之情形時,可為僅由鋁形成之電極,亦可為於金屬氧化物層之表面積層有鋁層之電極。作為上述金屬氧化物層之材料,可例舉摻雜有三價金屬元素之氧化銦及摻雜有三價金屬元素之氧化鋅等。作為上述三價金屬元素,可例舉:Sn、Al及Ga等。Examples of electrodes provided on the above-mentioned connection object member include: gold electrodes, nickel electrodes, tin electrodes, aluminum electrodes, copper electrodes, molybdenum electrodes, silver electrodes, SUS (Steel Use Stainless, Japanese stainless steel standards) electrodes, tungsten electrodes, etc. Metal electrode. When the connection object member is a flexible printed circuit board, the electrode is preferably a gold electrode, a nickel electrode, a tin electrode, a silver electrode, or a copper electrode. When the connection object member is a glass substrate, the electrode is preferably an aluminum electrode, a copper electrode, a molybdenum electrode, a silver electrode, or a tungsten electrode. Furthermore, when the above-mentioned electrode is an aluminum electrode, it may be an electrode formed only of aluminum, or an electrode with an aluminum layer on the surface area of the metal oxide layer. As the material of the metal oxide layer, indium oxide doped with trivalent metal element and zinc oxide doped with trivalent metal element can be mentioned. As the above-mentioned trivalent metal element, Sn, Al, Ga, etc. may be mentioned.

以下,列舉實施例及比較例,具體地說明本發明。本發明並不僅限定於以下之實施例。Hereinafter, examples and comparative examples are given to specifically explain the present invention. The present invention is not limited to the following examples.

作為基材粒子,準備以下之粒子。As the substrate particles, the following particles were prepared.

樹脂粒子1:積水化學工業公司製造之「Micropearl SP-220」(由二乙烯苯共聚物形成之樹脂粒子,粒徑20 μm)Resin particle 1: "Micropearl SP-220" manufactured by Sekisui Chemical Industry Co., Ltd. (resin particles made of divinylbenzene copolymer, particle size 20 μm)

樹脂粒子2:積水化學工業公司製造之「Micropearl SP-210」(由二乙烯苯共聚物形成之樹脂粒子,粒徑10 μm)Resin particles 2: "Micropearl SP-210" manufactured by Sekisui Chemical Industry Co., Ltd. (resin particles made of divinylbenzene copolymer, particle size 10 μm)

樹脂粒子3:積水化學工業公司製造之「Micropearl SP-295」(由二乙烯苯共聚物形成之樹脂粒子,粒徑5 μm)Resin particles 3: "Micropearl SP-295" manufactured by Sekisui Chemical Industry Co., Ltd. (resin particles made of divinylbenzene copolymer, particle size 5 μm)

有機無機混合粒子1:具有由丙烯酸樹脂形成之有機核、及由交聯烷氧基矽烷基聚合物形成之無機殼的有機無機混合粒子(根據下述合成例1製作,粒徑20 μm)Organic-inorganic hybrid particles 1: Organic-inorganic hybrid particles having an organic core formed of acrylic resin and an inorganic shell formed of a cross-linked alkoxysilyl polymer (produced according to Synthesis Example 1 below, particle size 20 μm)

<合成例1> 於安裝有攪拌機及溫度計之500 mL反應容器內添加0.13重量%之氨水溶液300 g。其次,於反應容器內之氨水溶液中緩慢添加甲基三甲氧基矽烷4.1 g、乙烯基三甲氧基矽烷19.2 g及聚矽氧烷氧基低聚物(信越化學工業公司製造之「X-41-1053」)0.7 g之混合物。一面攪拌,一面使其等進行水解反應及縮合反應,然後添加25重量%氨水溶液2.4 mL。使粒子自氨水溶液中單離,使所得之粒子於氧分壓10-17 atm、350℃下焙燒2小時,獲得有機無機混合粒子。<Synthesis Example 1> In a 500 mL reaction vessel equipped with a stirrer and a thermometer, 300 g of 0.13% by weight ammonia solution was added. Next, slowly add 4.1 g of methyltrimethoxysilane, 19.2 g of vinyltrimethoxysilane, and polysiloxane alkoxy oligomer (X-41 manufactured by Shin-Etsu Chemical Co., Ltd.) to the ammonia solution in the reaction vessel. -1053") 0.7 g mixture. While stirring, the hydrolysis reaction and the condensation reaction were carried out, and then 2.4 mL of a 25% by weight aqueous ammonia solution was added. The particles are separated from the aqueous ammonia solution, and the resulting particles are calcined at an oxygen partial pressure of 10 -17 atm and 350° C. for 2 hours to obtain organic-inorganic mixed particles.

鎳粒子1:粒徑20 μmNickel particles 1: particle size 20 μm

銅粒子1:粒徑10 μmCopper particles 1: Particle size 10 μm

(實施例1) 金屬被覆粒子之製作: 於樹脂粒子1之外表面上,藉由無電解鍍覆而形成內層為鎳層且外層為錫層之金屬層,獲得金屬被覆粒子。於所得之金屬被覆粒子中,金屬部為層狀。(Example 1) Production of metal coated particles: On the outer surface of the resin particles 1, a metal layer with an inner layer of nickel and an outer layer of tin is formed by electroless plating to obtain metal coated particles. In the obtained metal-coated particles, the metal portion is layered.

含金屬被覆粒子之焊料糊之製備: 調配所得之金屬被覆粒子2.0重量份及SAC糊(包含SAC粒子之焊料糊,千住金屬工業公司製造之「M705-RGS800」,SAC粒子之粒徑20 μm)98.0重量份,使用行星式攪拌機,於1200 rpm、120秒及0.2 kPa之條件下進行攪拌,獲得含金屬被覆粒子之焊料糊。Preparation of solder paste containing metal coated particles: The prepared metal coated particles 2.0 parts by weight and SAC paste (solder paste containing SAC particles, "M705-RGS800" manufactured by Senju Metal Industry Co., Ltd., the particle size of SAC particles 20 μm) 98.0 parts by weight, using a planetary mixer, Stir under the conditions of 1200 rpm, 120 seconds and 0.2 kPa to obtain a solder paste containing metal-coated particles.

(實施例2及3) 如下述表1所示設定基材粒子之種類,除此以外,與實施例1同樣地獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Examples 2 and 3) Except for setting the type of substrate particles as shown in Table 1 below, the same procedure as in Example 1 was carried out to obtain metal-coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例4) 於樹脂粒子1之外表面上,藉由無電解鍍覆形成內層為鎳層且其外側為錫突起之金屬部,而獲得金屬被覆粒子。於所得之金屬被覆粒子中,金屬部之外表面為突起狀,鎳層上局部形成錫之突起。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 4) On the outer surface of the resin particle 1, a metal part with a nickel layer as the inner layer and tin protrusions on the outer side is formed by electroless plating to obtain metal-coated particles. In the obtained metal-coated particles, the outer surface of the metal portion is protrusion-like, and tin protrusions are locally formed on the nickel layer. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例5) 準備實施例1之金屬被覆粒子。藉由助焊劑(松香)對該粒子之外表面進行處理,而獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 5) The metal-coated particles of Example 1 were prepared. The outer surface of the particles is treated with flux (rosin) to obtain metal-coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例6) 於樹脂粒子1之外表面上,藉由無電解鍍覆形成內層為鎳層且外層為錫與銀之合金層之金屬層,而獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 6) On the outer surface of the resin particles 1, a metal layer with an inner layer of nickel and an outer layer of an alloy layer of tin and silver is formed by electroless plating to obtain metal coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例7) 於樹脂粒子1之外表面上,藉由無電解鍍覆形成內層為鎳層且外層為金層之金屬層,而獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 7) On the outer surface of the resin particle 1, a metal layer with an inner layer of nickel and an outer layer of gold is formed by electroless plating to obtain metal coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例8) 除變更金屬層之厚度以外,與實施例1同樣地獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 8) Except for changing the thickness of the metal layer, metal-coated particles were obtained in the same manner as in Example 1. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例9) 於樹脂粒子1之外表面上,藉由無電解鍍覆形成鎳之金屬層,而獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 9) On the outer surface of the resin particles 1, a metal layer of nickel is formed by electroless plating to obtain metal-coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(實施例10及11) 準備實施例1之金屬被覆粒子。如下述表1所示變更金屬被覆粒子之含量,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Examples 10 and 11) The metal-coated particles of Example 1 were prepared. Except changing the content of the metal-coated particles as shown in Table 1 below, in the same manner as in Example 1, a solder paste containing metal-coated particles was obtained.

(實施例12) 準備實施例1之金屬被覆粒子。將焊料糊之種類自SAC糊變更為SnBi糊(包含Sn-Bi粒子之焊料糊,千住金屬工業公司製造之「L20-BLT-T7F」,Sn-Bi粒子之粒徑20 μm),除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 12) The metal-coated particles of Example 1 were prepared. Change the type of solder paste from SAC paste to SnBi paste (solder paste containing Sn-Bi particles, "L20-BLT-T7F" manufactured by Senju Metal Industry Co., Ltd., Sn-Bi particle size 20 μm), except for this In the same manner as in Example 1, a solder paste containing metal-coated particles was obtained.

(實施例13) 於樹脂粒子1之外表面上,藉由無電解鍍覆形成內層為鎳層且外層為金層之金屬層,而獲得金屬被覆粒子。使用所得之金屬被覆粒子,並且將焊料糊之種類自SAC糊變更為SnBi糊(包含Sn-Bi粒子之焊料糊,千住金屬工業公司製造之「L20-BLT-T7F」,Sn-Bi粒子之粒徑20 μm),除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 13) On the outer surface of the resin particle 1, a metal layer with an inner layer of nickel and an outer layer of gold is formed by electroless plating to obtain metal coated particles. Use the obtained metal-coated particles, and change the type of solder paste from SAC paste to SnBi paste (solder paste containing Sn-Bi particles, "L20-BLT-T7F" manufactured by Senju Metal Industry Co., Ltd., particles of Sn-Bi particles Diameter 20 μm), except for that, in the same manner as in Example 1, a solder paste containing metal-coated particles was obtained.

(實施例14) 準備實施例1之金屬被覆粒子。將焊料糊之種類自SAC糊變更為Pb-Sn糊(包含Pb-Sn粒子之焊料糊,千住金屬工業公司製造之「OZ 295-162F-50-8」,Pb-Sn粒子之粒徑20 μm),除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 14) The metal-coated particles of Example 1 were prepared. Change the type of solder paste from SAC paste to Pb-Sn paste (solder paste containing Pb-Sn particles, "OZ 295-162F-50-8" manufactured by Senju Metal Industry Co., Ltd., Pb-Sn particle size 20 μm ) Except for this, in the same manner as in Example 1, a solder paste containing metal-coated particles was obtained.

(實施例15) 如下述表1所示設定基材粒子之種類,除此以外,與實施例1同樣地獲得金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬被覆粒子之焊料糊。(Example 15) Except for setting the type of substrate particles as shown in Table 1 below, the same procedure as in Example 1 was carried out to obtain metal-coated particles. Except for using the obtained metal-coated particles, a solder paste containing metal-coated particles was obtained in the same manner as in Example 1.

(比較例1) 準備SAC糊(包含SAC粒子之焊料糊,千住金屬工業公司製造之「M705-RGS800」,SAC粒子之粒徑20 μm)本身作為焊料糊。(Comparative example 1) Prepare SAC paste (solder paste containing SAC particles, "M705-RGS800" manufactured by Senju Metal Industry Co., Ltd., with a particle size of SAC particles of 20 μm) itself as the solder paste.

(比較例2) 準備樹脂粒子1。將金屬被覆粒子變更為樹脂粒子1,除此以外,與實施例1同樣地獲得含樹脂粒子之焊料糊。(Comparative example 2) Prepare resin particles 1. Except for changing the metal-coated particles to resin particles 1, the same procedure as in Example 1 was carried out to obtain a resin particle-containing solder paste.

(比較例3) 準備鎳粒子1。將金屬被覆粒子變更為鎳粒子1,除此以外,與實施例1同樣地獲得含金屬粒子之焊料糊。(Comparative example 3) Prepare nickel particles 1. Except for changing the metal-coated particles to nickel particles 1, the same procedure as in Example 1 was carried out to obtain a metal particle-containing solder paste.

(比較例4) 如下述表2所示設定基材粒子之種類,除此以外,與實施例1同樣地獲得具備內層為鎳層且外層為錫層之金屬層之金屬被覆粒子。使用所得之金屬被覆粒子,除此以外,與實施例1同樣地獲得含金屬粒子之焊料糊。(Comparative Example 4) Except for setting the types of substrate particles as shown in Table 2 below, in the same manner as in Example 1, metal-coated particles provided with a metal layer in which the inner layer is a nickel layer and the outer layer is a tin layer were obtained. Except having used the obtained metal-coated particles, the same procedure as in Example 1 was carried out to obtain a metal particle-containing solder paste.

(比較例5) 準備銅粒子1。將金屬被覆粒子變更為銅粒子1,除此以外,與實施例1同樣地獲得含金屬粒子之焊料糊。(Comparative Example 5) Prepare copper particles 1. Except for changing the metal-coated particles to copper particles 1, the same procedure as in Example 1 was carried out to obtain a metal particle-containing solder paste.

(評估) 以如下所述之方式獲得連接結構體A。(Evaluate) The connected structure A was obtained in the following manner.

準備銅板(一邊為10.0 mm之大致正方形狀,高0.1 mm)作為第1連接對象構件。準備矽晶片(一邊為2.0 mm之大致正方形狀,高0.1 mm)作為第2連接對象構件。使用縱2.5 mm、橫2.5 mm及高100 μm之金屬遮罩,於第1連接對象構件上網版印刷所得之焊料糊。印刷後積層第2連接對象構件,而獲得積層體。於平均升溫溫度:1.2℃/秒、峰值溫度:焊料粒子之熔點+8℃之條件下對所得之積層體進行回焊處理,獲得連接結構體A。Prepare a copper plate (approximately square with 10.0 mm on one side and 0.1 mm in height) as the first connection object member. A silicon wafer (approximately square with a side of 2.0 mm and a height of 0.1 mm) was prepared as the second connection target member. Use a metal mask with a length of 2.5 mm, a width of 2.5 mm, and a height of 100 μm to print the solder paste on the first connection object component on the screen. After printing, the second connection object member is laminated to obtain a laminated body. Under the conditions of average heating temperature: 1.2°C/sec, peak temperature: melting point of solder particles + 8°C, the resulting laminate was reflowed to obtain a connected structure A.

以如下所述之方式獲得連接結構體B。The connected structure B was obtained in the following manner.

準備銅板(一邊為50.0 mm之大致正方形狀,高0.1 mm)作為連接對象構件。使用縱2000 μm、橫500 μm及高120 μm之金屬遮罩,於連接對象構件上網版印刷所得之焊料糊。於平均升溫溫度:1.2℃/秒、峰值溫度:焊料粒子之熔點+8℃之條件下對印刷後之銅板進行回焊處理,獲得連接結構體B。Prepare a copper plate (approximately square with a side of 50.0 mm and a height of 0.1 mm) as the member to be connected. A metal mask with a length of 2000 μm, a width of 500 μm, and a height of 120 μm is used for the solder paste obtained by printing on the connecting target component. Under the conditions of average heating temperature: 1.2°C/sec, peak temperature: melting point of solder particles + 8°C, the printed copper plate was reflowed to obtain the connection structure B.

(1)初始剪切強度 對於剛回焊處理後所得之連接結構體A測定剪切強度。剪切強度使用Nordson製造之「Dage4000」,測定斷裂時之強度。(1) Initial shear strength The shear strength of the connected structure A obtained immediately after the reflow treatment was measured. The shear strength uses "Dage4000" manufactured by Nordson to measure the strength at break.

(2)經時後之剪切強度 準備測定了初始剪切強度後之連接結構體A。進行1000次如下循環之TCT(Temperature Cycling Test,溫度循環測試)試驗,而獲得經時後之連接結構體,上述TCT試驗之1次循環係指將-45℃及30分鐘作為低溫側之條件,將125℃及30分鐘作為高溫側之條件的熱變動。與(1)初始剪切強度之測定同樣地測定經時後之剪切強度。(2) Shear strength after time The connection structure A is prepared after the initial shear strength has been measured. Perform 1000 cycles of the TCT (Temperature Cycling Test) test as follows to obtain the connected structure after time. The above-mentioned 1 cycle of the TCT test refers to the conditions of -45°C and 30 minutes as the low temperature side. 125°C and 30 minutes are regarded as the thermal fluctuation of the conditions on the high temperature side. The shear strength after time was measured in the same manner as in (1) the measurement of the initial shear strength.

(3)分散性 對於剛回焊後所得之連接結構體A,觀察其剖面。此時,以焊料連接部之1/2高度線區分為上部及下部,計算各部分所存在之粒子數。用十分制算出其比率,並作為分散性之指標(例:上6/下4)。上下比率越接近,判斷為分散性越高。(3) Dispersibility Observe the cross-section of the connected structure A obtained immediately after reflow. At this time, the half height line of the solder connection part is divided into upper and lower parts, and the number of particles present in each part is calculated. Calculate the ratio using the ten-point system and use it as an indicator of dispersion (e.g. up 6/down 4). The closer the upper and lower ratios are, the higher the dispersibility is judged to be.

(4)滲出 於連接結構體A之製作階段,於回焊前測定焊料糊印刷部之面積。其後,於剛回焊處理後,對所得之連接結構體A評估連接部之平面面積。評估回焊後之連接部之面積相對於回焊前之平面面積的增加比率。將回焊前之平面面積設為100%,將增加面積(%)作為滲出值。平面面積使用KEYENCE公司製造之「VHX」進行測定。(4) Exudation In the production stage of the connection structure A, the area of the solder paste printed part is measured before reflow. Thereafter, immediately after the reflow treatment, the resulting connection structure A was evaluated for the planar area of the connection portion. Evaluate the increase ratio of the area of the connection after reflow to the area of the plane before reflow. Set the plane area before reflow as 100%, and set the increase area (%) as the exudation value. The plane area is measured using "VHX" manufactured by KEYENCE.

(5)短路 對於剛回焊處理後所得之連接結構體B(共5個),評估有無電極間之短路。(5) Short circuit For the connection structure B (5 in total) obtained immediately after the reflow treatment, evaluate whether there is a short circuit between the electrodes.

將詳情及結果示於下述表1~3。The details and results are shown in Tables 1 to 3 below.

[表1]    金屬被覆粒子 焊料糊 基材粒子 外側之金屬部 防銹劑或助焊劑 比重 焊料粒子 金屬被覆粒子 種類 粒徑 (μm) 形態 金屬之種類 種類 含量 (wt%) 含量 (wt%) 實施例1 樹脂粒子1 20 Sn - 2.3 SAC 86.3 2.0 實施例2 樹脂粒子2 10 Sn - 3.0 SAC 86.3 2.0 實施例3 樹脂粒子3 5 Sn - 4.1 SAC 86.3 2.0 實施例4 樹脂粒子1 20 突起 Sn - 2.3 SAC 86.3 2.0 實施例5 樹脂粒子1 20 Sn 2.3 SAC 86.3 2.0 實施例6 樹脂粒子1 20 SnAg合金 - 2.3 SAC 86.3 2.0 實施例7 樹脂粒子1 20 Au - 1.7 SAC 86.3 2.0 實施例8 樹脂粒子1 20 Sn - 4.5 SAC 86.3 2.0 實施例9 樹脂粒子1 20 Ni - 2.1 SAC 86.3 2.0 實施例10 樹脂粒子1 20 Sn - 2.3 SAC 83.8 5.0 實施例11 樹脂粒子1 20 Sn - 2.3 SAC 87.5 0.5 實施例12 樹脂粒子1 20 Sn - 2.3 SnBi 88.2 2.0 實施例13 樹脂粒子1 20 Au - 1.7 SnBi 88.2 2.0 實施例14 樹脂粒子1 20 Sn - 2.3 PbSn 90.1 2.0 實施例15 有機無機混合粒子1 20 Sn - 2.6 SAC 86.3 2.0 [Table 1] Metal coated particles Solder paste Substrate particles Outer metal part Rust inhibitor or flux proportion Solder particles Metal coated particles type Particle size (μm) form Type of metal type Content (wt%) Content (wt%) Example 1 Resin particles 1 20 Floor Sn - 2.3 SAC 86.3 2.0 Example 2 Resin particles 2 10 Floor Sn - 3.0 SAC 86.3 2.0 Example 3 Resin particles 3 5 Floor Sn - 4.1 SAC 86.3 2.0 Example 4 Resin particles 1 20 Protruding Sn - 2.3 SAC 86.3 2.0 Example 5 Resin particles 1 20 Floor Sn Have 2.3 SAC 86.3 2.0 Example 6 Resin particles 1 20 Floor SnAg alloy - 2.3 SAC 86.3 2.0 Example 7 Resin particles 1 20 Floor Au - 1.7 SAC 86.3 2.0 Example 8 Resin particles 1 20 Floor Sn - 4.5 SAC 86.3 2.0 Example 9 Resin particles 1 20 Floor Ni - 2.1 SAC 86.3 2.0 Example 10 Resin particles 1 20 Floor Sn - 2.3 SAC 83.8 5.0 Example 11 Resin particles 1 20 Floor Sn - 2.3 SAC 87.5 0.5 Example 12 Resin particles 1 20 Floor Sn - 2.3 SnBi 88.2 2.0 Example 13 Resin particles 1 20 Floor Au - 1.7 SnBi 88.2 2.0 Example 14 Resin particles 1 20 Floor Sn - 2.3 PbSn 90.1 2.0 Example 15 Organic-inorganic hybrid particles 1 20 Floor Sn - 2.6 SAC 86.3 2.0

[表2]    金屬被覆粒子 焊料糊 基材粒子 外側之金屬部 防銹劑或助焊劑 比重 焊料粒子 金屬被覆粒子 種類 粒徑 (μm) 形態 金屬之種類 種類 含量 (wt%) 含量 (wt%) 比較例1 - - - - - - SAC - - 比較例2* 樹脂粒子1 20 - - - 1.1 SAC 86.3 2.0 比較例3* 鎳粒子1 20 - - - 8.9 SAC 86.3 2.0 比較例4 鎳粒子1 20 Sn - 9.0 SAC 86.3 2.0 比較例5* 銅粒子1 10 - - - 9.1 SAC 86.3 2.0 *使用基材粒子本身來代替金屬被覆粒子 [Table 2] Metal coated particles Solder paste Substrate particles Outer metal part Rust inhibitor or flux proportion Solder particles Metal coated particles type Particle size (μm) form Type of metal type Content (wt%) Content (wt%) Comparative example 1 - - - - - - SAC - - Comparative example 2* Resin particles 1 20 - - - 1.1 SAC 86.3 2.0 Comparative example 3* Nickel particles 1 20 - - - 8.9 SAC 86.3 2.0 Comparative example 4 Nickel particles 1 20 Floor Sn - 9.0 SAC 86.3 2.0 Comparative example 5* Copper particles 1 10 - - - 9.1 SAC 86.3 2.0 *Use base particles themselves instead of metal coated particles

[表3]    評估 初始剪切強度(MPa) 經時後之剪切強度 (MPa) 經時後之剪切強度降低率 分散性(上/下) 滲出 短路 (發生數/總個數) 實施例1 70.7 69.3 2% (5/5) 104% 0/5 實施例2 69.5 68.8 1% (5/5) 102% 0/5 實施例3 66.3 65.6 1% (5/5) 103% 0/5 實施例4 67.0 65.7 2% (5/5) 103% 0/5 實施例5 65.2 63.9 2% (5/5) 103% 0/5 實施例6 59.9 57.5 4% (5/5) 102% 0/5 實施例7 70.6 65.3 7% (5/5) 103% 0/5 實施例8 78.5 78.3 0% (5/5) 101% 0/5 實施例9 62.4 58.6 6% (6/4) 102% 0/5 實施例10 62.0 60.5 2% (5/5) 100% 0/5 實施例11 63.0 59.2 6% (5/5) 105% 0/5 實施例12 57.0 55.6 3% (5/5) 103% 0/5 實施例13 53.0 49.2 7% (5/5) 103% 0/5 實施例14 61.8 59.0 4% (7/3) 102% 0/5 實施例15 64.8 63.5 2% (5/5) 104% 0/5 比較例1 60.0 46.2 23% - 117% 4/5 比較例2* 20.5 9.6 53% (9/1) 101% 0/5 比較例3* 57.0 49.6 13% (2/8) 103% 0/5 比較例4 61.3 53.9 12% (2/8) 103% 0/5 比較例5* 62.3 55.4 11% (2/8) 104% 0/5 *使用基材粒子本身來代替金屬被覆粒子 [table 3] Evaluate Initial shear strength (MPa) Shear strength after time (MPa) Decrease rate of shear strength after time Dispersibility (up/down) Ooze Short circuit (number of occurrences/total number) Example 1 70.7 69.3 2% (5/5) 104% 0/5 Example 2 69.5 68.8 1% (5/5) 102% 0/5 Example 3 66.3 65.6 1% (5/5) 103% 0/5 Example 4 67.0 65.7 2% (5/5) 103% 0/5 Example 5 65.2 63.9 2% (5/5) 103% 0/5 Example 6 59.9 57.5 4% (5/5) 102% 0/5 Example 7 70.6 65.3 7% (5/5) 103% 0/5 Example 8 78.5 78.3 0% (5/5) 101% 0/5 Example 9 62.4 58.6 6% (6/4) 102% 0/5 Example 10 62.0 60.5 2% (5/5) 100% 0/5 Example 11 63.0 59.2 6% (5/5) 105% 0/5 Example 12 57.0 55.6 3% (5/5) 103% 0/5 Example 13 53.0 49.2 7% (5/5) 103% 0/5 Example 14 61.8 59.0 4% (7/3) 102% 0/5 Example 15 64.8 63.5 2% (5/5) 104% 0/5 Comparative example 1 60.0 46.2 twenty three% - 117% 4/5 Comparative example 2* 20.5 9.6 53% (9/1) 101% 0/5 Comparative example 3* 57.0 49.6 13% (2/8) 103% 0/5 Comparative example 4 61.3 53.9 12% (2/8) 103% 0/5 Comparative example 5* 62.3 55.4 11% (2/8) 104% 0/5 *Use base particles themselves instead of metal coated particles

1,1A,1B:金屬被覆粒子 2,2A,2B:基材粒子 3,3A,3B:金屬部 3AA:第1金屬部 3AB:第2金屬部 3BA:第1金屬部 3BB:第2金屬部 21:連接結構體 22:第1連接對象構件 22a:第1連接區域部 23:第2連接對象構件 23a:第2連接區域部 24:連接部 24a:焊料 24b:粒子1, 1A, 1B: metal coated particles 2, 2A, 2B: substrate particles 3, 3A, 3B: Metal Department 3AA: Part 1 Metal 3AB: The second metal part 3BA: Part 1 Metal 3BB: The second metal part 21: Connection structure 22: The first connection object member 22a: The first connection area 23: The second connection object member 23a: The second connection area 24: Connection part 24a: Solder 24b: particles

圖1係表示本發明之第1實施方式之金屬被覆粒子的剖視圖。 圖2係表示本發明之第2實施方式之金屬被覆粒子的剖視圖。 圖3係表示本發明之第3實施方式之金屬被覆粒子的剖視圖。 圖4係示意性地表示使用包含圖1所示之金屬被覆粒子之焊料糊之連接結構體的剖視圖。Fig. 1 is a cross-sectional view showing a metal-coated particle according to the first embodiment of the present invention. Fig. 2 is a cross-sectional view showing a metal-coated particle according to a second embodiment of the present invention. Fig. 3 is a cross-sectional view showing a metal-coated particle according to a third embodiment of the present invention. Fig. 4 is a cross-sectional view schematically showing a connection structure using a solder paste containing the metal-coated particles shown in Fig. 1.

Claims (19)

一種焊料糊,其包含複數個焊料粒子及複數個金屬被覆粒子,且 上述金屬被覆粒子之比重為6.0以下,且 上述金屬被覆粒子具有基材粒子及配置於上述基材粒子之表面上之金屬部, 上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。A solder paste comprising a plurality of solder particles and a plurality of metal-coated particles, and The specific gravity of the metal-coated particles is 6.0 or less, and The metal-coated particles have a substrate particle and a metal part arranged on the surface of the substrate particle, The metal part includes a metal capable of forming an intermetallic compound with the solder, or a metal capable of fusion bonding with the solder, or a metal capable of diffusing together with the solder. 如請求項1之焊料糊,其中上述基材粒子為樹脂粒子或有機無機混合粒子。The solder paste according to claim 1, wherein the substrate particles are resin particles or organic-inorganic hybrid particles. 如請求項1或2之焊料糊,其中上述金屬部於上述金屬部之外表面部分包含能夠與焊料形成金屬間化合物之上述金屬,或者包含能夠與焊料熔融結合之上述金屬,或者包含能夠與焊料一起擴散之上述金屬。The solder paste of claim 1 or 2, wherein the metal portion contains the metal capable of forming an intermetallic compound with solder on the outer surface portion of the metal portion, or contains the metal that can be fused with solder, or contains the metal that can be combined with solder. The above metals diffused together. 如請求項1或2之焊料糊,其中上述金屬部於上述金屬部之外表面部分包含鎳、金、錫或含錫之合金。The solder paste of claim 1 or 2, wherein the metal part contains nickel, gold, tin, or an alloy containing tin on the outer surface portion of the metal part. 如請求項1或2之焊料糊,其中上述金屬部於上述金屬部之外表面部分包含錫或含錫之合金。The solder paste of claim 1 or 2, wherein the metal part contains tin or an alloy containing tin on the outer surface portion of the metal part. 如請求項1或2之焊料糊,其中上述金屬部之平均厚度相對於上述基材粒子之粒徑的比為0.005以上。The solder paste according to claim 1 or 2, wherein the ratio of the average thickness of the metal portion to the particle diameter of the substrate particle is 0.005 or more. 如請求項1或2之焊料糊,其中上述金屬被覆粒子於上述金屬部之外表面上具有防銹劑或助焊劑。The solder paste of claim 1 or 2, wherein the metal-coated particles have an anti-rust agent or flux on the outer surface of the metal part. 如請求項1或2之焊料糊,其進而包含有機溶劑及助焊劑中之至少一者。Such as the solder paste of claim 1 or 2, which further includes at least one of an organic solvent and a flux. 如請求項1或2之焊料糊,其中焊料糊100重量%中,上述焊料粒子之含量為50重量%以上。Such as the solder paste of claim 1 or 2, wherein in 100% by weight of the solder paste, the content of the above-mentioned solder particles is 50% by weight or more. 如請求項1或2之焊料糊,其中焊料糊100重量%中,上述焊料粒子與上述金屬被覆粒子之合計含量為51重量%以上。The solder paste of claim 1 or 2, wherein the total content of the solder particles and the metal-coated particles in 100% by weight of the solder paste is 51% by weight or more. 一種焊料糊用金屬被覆粒子,其比重為6.0以下,且 具有基材粒子及配置於上述基材粒子之表面上之金屬部, 上述金屬部包含能夠與焊料形成金屬間化合物之金屬,或者包含能夠與焊料熔融結合之金屬,或者包含能夠與焊料一起擴散之金屬。A metal-coated particle for solder paste with a specific gravity of 6.0 or less, and Having a substrate particle and a metal part arranged on the surface of the substrate particle, The metal part includes a metal capable of forming an intermetallic compound with the solder, or a metal capable of fusion bonding with the solder, or a metal capable of diffusing together with the solder. 如請求項11之焊料糊用金屬被覆粒子,其中上述基材粒子為樹脂粒子或有機無機混合粒子。The metal-coated particles for solder paste according to claim 11, wherein the substrate particles are resin particles or organic-inorganic hybrid particles. 如請求項11或12之焊料糊用金屬被覆粒子,其中上述金屬部於上述金屬部之外表面部分包含能夠與焊料形成金屬間化合物之上述金屬,或者包含能夠與焊料熔融結合之上述金屬,或者包含能夠與焊料一起擴散之上述金屬。The metal-coated particles for solder paste according to claim 11 or 12, wherein the metal portion contains the metal capable of forming an intermetallic compound with solder on the outer surface portion of the metal portion, or contains the metal capable of fusion bonding with solder, or Contains the above-mentioned metals that can diffuse with solder. 如請求項11或12之焊料糊用金屬被覆粒子,其中上述金屬部於上述金屬部之外表面部分包含鎳、金、錫或含錫之合金。The metal-coated particle for solder paste according to claim 11 or 12, wherein the metal portion contains nickel, gold, tin, or an alloy containing tin on the outer surface portion of the metal portion. 如請求項11或12之焊料糊用金屬被覆粒子,其中上述金屬部於上述金屬部之外表面部分包含錫或含錫之合金。The metal-coated particle for solder paste according to claim 11 or 12, wherein the metal part contains tin or an alloy containing tin on the outer surface portion of the metal part. 如請求項11或12之焊料糊用金屬被覆粒子,其中上述金屬部之平均厚度相對於上述基材粒子之粒徑的比為0.005以上。The metal-coated particle for solder paste according to claim 11 or 12, wherein the ratio of the average thickness of the metal portion to the particle diameter of the base particle is 0.005 or more. 如請求項11或12之焊料糊用金屬被覆粒子,其於上述金屬部之外表面上具有防銹劑或助焊劑。For example, the metal-coated particles for solder paste of claim 11 or 12 have an anti-rust agent or flux on the outer surface of the metal part. 一種連接結構體,其具備:表面具有第1連接區域部之第1連接對象構件、 表面具有第2連接區域部之第2連接對象構件、以及 連接上述第1連接對象構件與上述第2連接對象構件之連接部,且 上述連接部由如請求項1至10中任一項之焊料糊形成, 上述第1連接區域部與上述第2連接區域部藉由自上述焊料粒子形成之焊料而電性連接或物理連接。A connection structure comprising: a first connection object member having a first connection region portion on the surface, A second connection target member having a second connection area portion on the surface, and The connecting portion connecting the first connection object member and the second connection object member, and The above-mentioned connecting portion is formed of a solder paste as in any one of claims 1 to 10, The first connection region portion and the second connection region portion are electrically or physically connected by solder formed from the solder particles. 一種連接結構體,其具備:表面具有第1連接區域部之第1連接對象構件、 表面具有第2連接區域部之第2連接對象構件、以及 連接上述第1連接對象構件與上述第2連接對象構件之連接部,且 上述連接部由包含複數個焊料粒子及複數個金屬被覆粒子之焊料糊形成, 上述金屬被覆粒子為如請求項11至17中任一項之金屬被覆粒子, 上述第1連接區域部與上述第2連接區域部藉由自上述焊料粒子形成之焊料而電性連接或物理連接。A connection structure comprising: a first connection object member having a first connection region portion on the surface, A second connection target member having a second connection area portion on the surface, and The connecting portion connecting the first connection object member and the second connection object member, and The above-mentioned connecting portion is formed of a solder paste containing a plurality of solder particles and a plurality of metal-coated particles, The above-mentioned metal-coated particles are metal-coated particles according to any one of claims 11 to 17, and The first connection region portion and the second connection region portion are electrically or physically connected by solder formed from the solder particles.
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