TW202123449A - Complex full color led display panel and manufacturing method thereof - Google Patents

Complex full color led display panel and manufacturing method thereof Download PDF

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TW202123449A
TW202123449A TW108145315A TW108145315A TW202123449A TW 202123449 A TW202123449 A TW 202123449A TW 108145315 A TW108145315 A TW 108145315A TW 108145315 A TW108145315 A TW 108145315A TW 202123449 A TW202123449 A TW 202123449A
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semiconductor material
led display
color led
display panel
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TW108145315A
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詹世豪
曾少澤
黃耀賢
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進化光學有限公司
黃耀賢
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Abstract

The present invention discloses a complex full color LED display panel, comprising: M numbers of long shaped light-emitting (LSLE) structures formed on a first surface of a double side polished transparent substrate (DSPTS), wherein each LSLE structure comprises a long shaped buffer layer, a long shaped first semiconductor layer, a long shaped active layer, and a long shaped second semiconductor layer, and an insulation layer is formed for covering the LSLE structures. Moreover, there are M×N numbers of first conductive layer and M×N numbers of transparent conductive layer provided in the insulation layer, and M×N numbers of second conductive layer are formed on the insulation layer. As such, the M×N numbers of first conductive layer can be connected to M numbers of conductive lines, and the M×N numbers of second conductive layer can be connected to M numbers of conductive lines, such that the complex full color LED display panel of the present invention can be easily integrated with a display driver circuit by way of COF or COG.

Description

複合式全彩LED顯示面板及其製造方法 Composite full-color LED display panel and manufacturing method thereof

本發明係關於自發光(Self-luminous)顯示面板之技術領域,尤指一種複合式全彩LED顯示面板及其製造方法。 The present invention relates to the technical field of self-luminous display panels, in particular to a composite full-color LED display panel and a manufacturing method thereof.

已知,現有的平面顯示器的種類包括液晶顯示器(LCD)、有機發光二極體(Organic light-emitting diode,OLED)顯示器,以及發光二極體(LED)顯示器。熟悉顯示面板設計與製作的工程師必然知道,液晶顯示器具有非自發光、低效率、低動態範圍、需要偏振濾光等缺點。OLED顯示器雖然屬於自發光型顯示器,然而,藍光OLED元件的低可靠性和低效率(~5%QE)成為OLED顯示器的最主要缺陷。 It is known that the types of existing flat panel displays include liquid crystal displays (LCD), organic light-emitting diode (OLED) displays, and light-emitting diode (LED) displays. Engineers who are familiar with the design and manufacture of display panels must know that liquid crystal displays have the disadvantages of non-self-luminous, low efficiency, low dynamic range, and the need for polarization filtering. Although OLED displays are self-luminous displays, the low reliability and low efficiency (~5%QE) of blue OLED components have become the main drawbacks of OLED displays.

相反的,紅光、綠光、和藍光LED元件的製作技術都非常成熟,使得LED顯示器具有自發光、高效率、高動態範圍、高反應速度、以及超過50,000小時的使用壽命等優勢。因此,就中、小型的顯示器領域而言,LED顯示器已經逐漸取代傳統的液晶顯示器而成為中、小型顯示器 之主流。近年來,LED顯示器技術越趨成熟,已經廣泛地應用於智慧型手機(smart phone)、電視、電腦螢幕、和智慧型手錶等產品之中,因此業界更致力於發展次毫米發光二極體(Mini LED)顯示器以及微型發光二極體(Micro LED)顯示器,以使LED顯示器具有更高的解析度。 On the contrary, the production technology of red, green, and blue LED components is very mature, making LED displays have the advantages of self-luminescence, high efficiency, high dynamic range, high response speed, and a service life of more than 50,000 hours. Therefore, in the field of medium and small displays, LED displays have gradually replaced traditional liquid crystal displays and become medium and small displays. The mainstream. In recent years, LED display technology has become more mature and has been widely used in products such as smart phones, TVs, computer screens, and smart watches. Therefore, the industry is more committed to the development of sub-millimeter light-emitting diodes ( Mini LED) display and micro light emitting diode (Micro LED) display, so that the LED display has a higher resolution.

值得說明的是,如台灣專利號I633645的圖7所示,為了使得一LED顯示面板的各個LED元件之一陽極端和一陰極端都可以順利地電連接至外部的驅動電路,包含複數條陽極端連接電極和複數條陰極端連接電極的一透明導電基板係被設置於該外部驅動電路與各個LED元件之陽極端和陰極端之間,作為所述外部驅動電路與各個LED元件之間的電連接橋梁。 It is worth noting that, as shown in Figure 7 of Taiwan Patent No. I633645, in order to enable one anode terminal and one cathode terminal of each LED element of an LED display panel to be smoothly electrically connected to an external driving circuit, a plurality of anode terminals are included. A transparent conductive substrate connecting electrodes and a plurality of cathode terminal connecting electrodes is arranged between the external driving circuit and the anode and cathode terminals of each LED element, as an electrical connection between the external driving circuit and each LED element bridge.

通常,所述透明導電基板之該些陽極端連接電極和該些陰極端連接電極係由氧化銦錫(Indium Tin Oxide,ITO)或氧化鋅(Zinc oxide,ZnO)製成。必須考慮的是,這些材料的阻值高於銅、銀等常用的金屬電極。熟悉顯示器驅動晶片設計與製作的電子工程師應可理解,阻值相對較高的該些陽極端連接電極和該些陰極端連接電極必然會衍生不可預期的負載效應,導致顯示器驅動晶片無法完美地區動LED顯示面板的各個子畫素(亦即,LED元件),因而降低使用者體驗(User experience,UX)。 Generally, the anode terminal connecting electrodes and the cathode terminal connecting electrodes of the transparent conductive substrate are made of indium tin oxide (ITO) or zinc oxide (ZnO). It must be considered that the resistance of these materials is higher than that of commonly used metal electrodes such as copper and silver. Electronic engineers who are familiar with the design and manufacture of display driver chips should understand that the relatively high resistance of the anode terminal connection electrodes and the cathode terminal connection electrodes will inevitably generate unexpected load effects, resulting in the display driver chip not being able to move perfectly. Each sub-pixel (ie, LED element) of the LED display panel reduces the user experience (UX).

由上述說明可知,如何使具有M×N個LED發光結構的一LED顯示面板能夠輕易地與一顯示驅動晶片相互整 合,實為業界亟欲解決的課題。有鑑於此,本案之發明人係極力加以研究創作發明,而終於研發完成本發明之一種複合式全彩LED顯示面板及其製造方法。 From the above description, it can be known how to make an LED display panel with M×N LED light-emitting structures can be easily integrated with a display driver chip. Together, it is an issue that the industry urgently wants to solve. In view of this, the inventor of this case tried his best to research and create inventions, and finally developed a composite full-color LED display panel and manufacturing method of the present invention.

本發明之主要目的在於提供一種複合式全彩LED顯示面板,其中,M個長條狀發光結構形成於一雙面拋光透光基板的一第一表面之上。特別地,各所述長條狀發光結構包含一長條狀緩衝層、一長條狀第一半導體材料層、一長條狀主動層、以及一長條狀第二半導體材料層,且一絕緣層形成於該第一表面之上並覆蓋所述長條狀發光結構。該絕緣層內更製作有M×N個第一導電層以及M×N個透明導電層,使得各所述長條狀第一半導體材料層之上設有N個第一導電層,且所述長條狀第二半導體材料層之上設有N個透明導電層。進一步地,該絕緣層之上設有M×N個第二導電層,使得各透明導電層部分地由該第二導電層所覆蓋連接。如此設計,利用M條第一共電極線路連接M×N個第一導電層且使用N條第二共電極線路連接M×N個第二導電層,使得一顯示驅動晶片易於透過COF或者COG的方式而與本發明之複合式全彩LED顯示面板相互整合。 The main purpose of the present invention is to provide a composite full-color LED display panel, in which M elongated light-emitting structures are formed on a first surface of a double-sided polished light-transmitting substrate. In particular, each of the strip-shaped light-emitting structures includes a strip-shaped buffer layer, a strip-shaped first semiconductor material layer, a strip-shaped active layer, and a strip-shaped second semiconductor material layer, and an insulating layer The layer is formed on the first surface and covers the elongated light-emitting structure. M×N first conductive layers and M×N transparent conductive layers are further fabricated in the insulating layer, so that N first conductive layers are provided on each of the elongated first semiconductor material layers, and N transparent conductive layers are arranged on the elongated second semiconductor material layer. Further, M×N second conductive layers are provided on the insulating layer, so that each transparent conductive layer is partially covered and connected by the second conductive layer. In this design, M first common electrode lines are used to connect M×N first conductive layers and N second common electrode lines are used to connect M×N second conductive layers, so that a display driver chip can easily pass through COF or COG. It is integrated with the composite full-color LED display panel of the present invention.

為了達成上述本發明之目的,本發明係提供所述複合式全彩LED顯示面板之一實施例,其包括: In order to achieve the above objectives of the present invention, the present invention provides an embodiment of the composite full-color LED display panel, which includes:

一雙面拋光透光基板,具一第一表面與一第二表面; A double-sided polished light-transmitting substrate with a first surface and a second surface;

一緩衝層,形成於該第一表面之上; A buffer layer formed on the first surface;

一第一半導體材料層,形成於該緩衝層之上;其中,利用雷射切割技術對該第一半導體材料層和該緩衝層進行切割,以於該雙面拋光透光基板的該第一表面之上製作出複數條切割道,進而利用該複數條切割道將該緩衝層分割成M個長條狀緩衝層,同時將該第一半導體材料層分割成M個長條狀第一半導體材料層; A first semiconductor material layer is formed on the buffer layer; wherein, laser cutting technology is used to cut the first semiconductor material layer and the buffer layer to polish the first surface of the transparent substrate on both sides A plurality of dicing lanes are fabricated on top, and then the plurality of dicing lanes are used to divide the buffer layer into M elongated buffer layers, and at the same time, the first semiconductor material layer is divided into M elongated first semiconductor material layers ;

M個長條狀主動層,分別形成於該M個長條狀第一半導體材料層之上; M elongated active layers are respectively formed on the M elongated first semiconductor material layers;

M個長條狀第二半導體材料層,分別形成於該M個長條狀主動層之上; M long strip-shaped second semiconductor material layers are respectively formed on the M long strip-shaped active layers;

M×N個第一導電層,其中,每個所述長條狀第一半導體材料層之上係形成有N個所述第一導電層; M×N first conductive layers, wherein N first conductive layers are formed on each of the elongated first semiconductor material layers;

一絕緣層,覆於該M×N個第一導電層與該M個長條狀第二半導體材料層之上,且填入該複數條切割道之中;其中,該絕緣層之上開設有M×N個開口; An insulating layer covering the M×N first conductive layers and the M long strip-shaped second semiconductor material layers, and filling the plurality of cutting channels; wherein, the insulating layer is provided with M×N openings;

M×N個透明導電層,分別透過該M×N個開口而形成於該M個長條狀第二半導體材料層之上,使得每個所述長條狀第二半導體材料層之上形成有N個所述透明導電層; The M×N transparent conductive layers are respectively formed on the M elongated second semiconductor material layers through the M×N openings, so that each of the elongated second semiconductor material layers is formed with N of the transparent conductive layers;

M×N個第二導電層,分別形成於該M×N個透明導電層之上;以及 M×N second conductive layers are respectively formed on the M×N transparent conductive layers; and

一光轉換單元,設置於該M×N個第二導電層之上,且包括M×N個光轉換部分別對應於該M×N個透明導電層。 A light conversion unit is arranged on the M×N second conductive layers and includes M×N light conversion parts corresponding to the M×N transparent conductive layers.

並且,本發明係同時提供前述複合式全彩LED顯示 面板的製造方法,包括以下步驟: Moreover, the present invention also provides the aforementioned composite full-color LED display The manufacturing method of the panel includes the following steps:

(1)提供具一第一表面與一第二表面的一雙面拋光透光基板; (1) Provide a double-sided polished light-transmitting substrate with a first surface and a second surface;

(2)依序形成一緩衝層、一第一半導體材料層、一主動層、以及一第二半導體材料層於該第一表面之上; (2) Sequentially forming a buffer layer, a first semiconductor material layer, an active layer, and a second semiconductor material layer on the first surface;

(3)利用微影蝕刻技術和一第一光阻層製作出完全貫穿該第二半導體材料層、該主動層、以及部分蝕刻該第一半導體材料層之N個長條狀凹槽,進而利用該N個長條狀凹槽將該第二半導體材料層分割成M個長條狀第二半導體材料層,同時將該主動層分割成M個長條狀主動層,之後去除該第一光阻層; (3) Using lithographic etching technology and a first photoresist layer to make N long grooves that completely penetrate the second semiconductor material layer, the active layer, and partially etch the first semiconductor material layer, and then use The N elongated grooves divide the second semiconductor material layer into M elongated second semiconductor material layers, and at the same time, divide the active layer into M elongated active layers, and then remove the first photoresist Floor;

(4)以一第二光阻層覆於該長條狀第二半導體材料層之上,且令各所述長條狀凹槽之側壁覆有該第二光阻層; (4) Covering the elongated second semiconductor material layer with a second photoresist layer, and making the sidewalls of each of the elongated grooves covered with the second photoresist layer;

(5)令各所述長條狀凹槽之中形成有M個第一導電層; (5) M first conductive layers are formed in each of the elongated grooves;

(6)利用雷射切割技術對各個所述長條狀凹槽的底部進行切割,以於該雙面拋光透光基板的該第一表面之上製作出複數條切割道,進而利用該複數條切割道將該緩衝層分割成M個長條狀緩衝層,同時將該第一半導體材料層分割成M個長條狀第一半導體材料層; (6) Using laser cutting technology to cut the bottom of each of the elongated grooves, so as to form a plurality of cutting channels on the first surface of the double-sided polished light-transmitting substrate, and then use the plurality of cutting channels. The dicing lane divides the buffer layer into M elongated buffer layers, and at the same time divides the first semiconductor material layer into M elongated first semiconductor material layers;

(7)令各所述長條狀第二半導體材料層之上形成有N個第三光阻層; (7) N third photoresist layers are formed on each of the elongated second semiconductor material layers;

(8)形成一絕緣層覆蓋該M個長條狀第二半導體材料層,且令該絕緣層填入該M個長條狀凹槽以及該複數個切割道之中; (8) An insulating layer is formed to cover the M long strip-shaped second semiconductor material layers, and the insulating layer is filled into the M long strip-shaped grooves and the plurality of cutting channels;

(9)去除M×N個所述第三光阻層,使得該絕緣層具有M×N個開口用以露出該第二半導體材料層; (9) removing the M×N third photoresist layers, so that the insulating layer has M×N openings for exposing the second semiconductor material layer;

(10)在利用微影蝕刻技術和一第四光阻層PR4的情況下,令M×N個透明導電層分別形成於該M×N個開口之中; (10) In the case of using photolithography and a fourth photoresist layer PR4, M×N transparent conductive layers are formed in the M×N openings;

(11)利用微影蝕刻技術以及一第五光阻層,於該絕緣層之上製作出M×N個第二導電層,且每個所述第二導電層係部份地覆蓋在一個所述透明導電層之上;以及 (11) Using photolithographic etching technology and a fifth photoresist layer, M×N second conductive layers are formed on the insulating layer, and each of the second conductive layers partially covers a Above the transparent conductive layer; and

(12)去除該第五光阻層之後,於該出M×N個第二導電層之上設置包括M×N個光轉換部的一光轉換單元,完成一複合式全彩LED顯示面板之製作。 (12) After the fifth photoresist layer is removed, a light conversion unit including M×N light conversion parts is arranged on the M×N second conductive layer to complete a composite full-color LED display panel Make.

在一可行實施例中,本發明之複合式全彩LED顯示面板更包括: In a feasible embodiment, the composite full-color LED display panel of the present invention further includes:

M條第一橋接導線,其中,各所述第一橋接導線與排列在同一列的N個所述第一導電層連接,且各所述第一橋接導線之上形成有一第一共電極。 M first bridging wires, wherein each of the first bridging wires is connected to the N first conductive layers arranged in the same column, and a first common electrode is formed on each of the first bridging wires.

在一可行實施例中,本發明之複合式全彩LED顯示面板更包括: In a feasible embodiment, the composite full-color LED display panel of the present invention further includes:

N條第二橋接導線,其中,各所述第二橋接導線與排列在同一行的M個所述第二導電層連接,且各所述第二橋接導線之上形成有一第二共電極。 N second bridging wires, wherein each of the second bridging wires is connected to M of the second conductive layers arranged in the same row, and a second common electrode is formed on each of the second bridging wires.

在一可行實施例中,本發明之複合式全彩LED顯 示面板與一驅動電路模組組合成一全彩LED顯示裝置,該驅動電路模組具有M個第一接點用以分別與該M個第一共電極電性連接,且該驅動電路模組還具有N個第二接點用以分別與該N個第二共電極電性連接。 In a feasible embodiment, the composite full-color LED display of the present invention The display panel and a driving circuit module are combined to form a full-color LED display device. The driving circuit module has M first contacts for electrically connecting with the M first common electrodes, and the driving circuit module also There are N second contacts for electrically connecting with the N second common electrodes respectively.

在一可行實施例中,包含本發明之複合式全彩LED顯示面板以及與驅動電路模組的全彩LED顯示裝置進一步與一觸控面板組合成一全彩LED觸控顯示裝置,且該觸控面板置於該光轉換單元之上。 In a possible embodiment, the full-color LED display device including the composite full-color LED display panel of the present invention and the drive circuit module is further combined with a touch panel to form a full-color LED touch display device, and the touch The panel is placed on the light conversion unit.

於前述本發明之複合式全彩LED顯示面板的實施例中,該雙面拋光透光基板可為下列任一者:雙面拋光藍寶石基板、雙面拋光尖晶石基板、雙面拋光碳化矽基板、雙面拋光玻璃基板、或雙面拋光石英基板。 In the foregoing embodiment of the composite full-color LED display panel of the present invention, the double-sided polished transparent substrate can be any of the following: double-sided polished sapphire substrate, double-sided polished spinel substrate, double-sided polished silicon carbide Substrate, double-sided polished glass substrate, or double-sided polished quartz substrate.

於前述本發明之複合式全彩LED顯示面板的實施例中,該絕緣層的製程材料為一氧化物,且該緩衝層的製造材料可為下列任一者:未摻雜的氮化鎵(undoped GaN)、氮化鋁(AlN)、或氧化鋅(ZnO)。 In the foregoing embodiment of the composite full-color LED display panel of the present invention, the insulating layer is made of an oxide, and the buffer layer can be made of any one of the following: undoped gallium nitride ( undoped GaN), aluminum nitride (AlN), or zinc oxide (ZnO).

於前述本發明之複合式全彩LED顯示面板的實施例中,該長條狀主動層於該長條狀第一半導體材料層與該長條狀第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一未摻雜的氮化鎵(undoped GaN)層與一氮化銦鎵(InxGa1-xN)層的一多重交互堆疊結構。並且,對應於該多重量子井結構包含彼此交互堆疊的多個所 述未摻雜的氮化鎵層與多個所述氮化銦鎵層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個空轉換部。 In the foregoing embodiment of the composite full-color LED display panel of the present invention, the elongated active layer forms a multiple quantum well between the elongated first semiconductor material layer and the elongated second semiconductor material layer Structure, and the multiple quantum well structure is a multiple alternate stacked structure of an undoped GaN layer and an indium gallium nitride (In x Ga 1-x N) layer. And, corresponding to the multiple quantum well structure including a plurality of undoped gallium nitride layers and a plurality of indium gallium nitride layers stacked alternately with each other, the M×N light conversion parts include: a plurality of red A light conversion section, a plurality of green light conversion sections, and a plurality of empty conversion sections.

於前述本發明之複合式全彩LED顯示面板的實施例中,該長條狀主動層於該長條狀第一半導體材料層與該長條狀第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一氮化鋁鎵(AlxGa1-xN)層與一氮化銦鎵(InxGa1-xN)層的多重交互堆疊結構。並且,對應於該多重量子井結構包含彼此交互堆疊的多個所述未摻雜的氮化鎵層與多個所述氮化銦鎵層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個藍光轉換部。 In the foregoing embodiment of the composite full-color LED display panel of the present invention, the elongated active layer forms a multiple quantum well between the elongated first semiconductor material layer and the elongated second semiconductor material layer Structure, and the multiple quantum well structure is a multiple alternating stack structure of an aluminum gallium nitride (Al x Ga 1-x N) layer and an indium gallium nitride (In x Ga 1-x N) layer. And, corresponding to the multiple quantum well structure including a plurality of undoped gallium nitride layers and a plurality of indium gallium nitride layers stacked alternately with each other, the M×N light conversion parts include: a plurality of red A light conversion section, a plurality of green light conversion sections, and a plurality of blue light conversion sections.

<本發明> <The present invention>

1‧‧‧複合式全彩LED顯示面板 1‧‧‧Composite full-color LED display panel

10‧‧‧雙面拋光透光基板 10‧‧‧Double-sided polished translucent substrate

101‧‧‧第一表面 101‧‧‧First surface

102‧‧‧第二表面 102‧‧‧Second surface

10G‧‧‧切割道 10G‧‧‧cutting road

11B‧‧‧緩衝層 11B‧‧‧Buffer layer

11BL‧‧‧長條狀緩衝層 11BL‧‧‧Long buffer layer

11N‧‧‧第一半導體材料層 11N‧‧‧First semiconductor material layer

11NL‧‧‧長條狀第一半導體材料層 11NL‧‧‧Elongated first semiconductor material layer

11A‧‧‧主動層 11A‧‧‧Active layer

11AL‧‧‧長條狀主動層 11AL‧‧‧Strip active layer

11P‧‧‧第二半導體材料層 11P‧‧‧Second semiconductor material layer

11PL‧‧‧長條狀第二半導體材料層 11PL‧‧‧Long strip of second semiconductor material layer

1T‧‧‧透明導電層 1T‧‧‧Transparent conductive layer

1P‧‧‧第一導電層 1P‧‧‧First conductive layer

2P‧‧‧第二導電層 2P‧‧‧Second conductive layer

12‧‧‧絕緣層 12‧‧‧Insulation layer

12O‧‧‧開口 12O‧‧‧Open

15‧‧‧光轉換單元 15‧‧‧Optical Conversion Unit

15R‧‧‧紅光轉換部 15R‧‧‧Red light conversion part

15G‧‧‧綠光轉換部 15G‧‧‧Green Light Conversion

15B‧‧‧藍光轉換部 15B‧‧‧Blu-ray Conversion

15N‧‧‧空轉換部 15N‧‧‧Air Conversion Department

BL1‧‧‧第一橋接導線 BL1‧‧‧First bridge wire

BL2‧‧‧第二橋接導線 BL2‧‧‧Second bridge wire

CE1‧‧‧第一共電極 CE1‧‧‧First common electrode

CE2‧‧‧第二共電極 CE2‧‧‧Second common electrode

2‧‧‧驅動電路模組 2‧‧‧Drive circuit module

21‧‧‧第一接點 21‧‧‧First contact

22‧‧‧第二接點 22‧‧‧Second contact

TP‧‧‧觸控面板 TP‧‧‧Touch Panel

S1-S‧‧‧步驟 S1-S‧‧‧Step

PR1‧‧‧第一光阻層 PR1‧‧‧First photoresist layer

PR2‧‧‧第二光阻層 PR2‧‧‧Second photoresist layer

PR3‧‧‧第三光阻層 PR3‧‧‧The third photoresist layer

PR4‧‧‧第四光阻層 PR4‧‧‧The fourth photoresist layer

PR5‧‧‧第五光阻層 PR5‧‧‧Fifth photoresist layer

RG1‧‧‧長條狀凹槽 RG1‧‧‧Long groove

<習知> <Learning>

no

圖1A與圖1B顯示本發明之一種複合式全彩LED顯示面板的示意性側剖視圖; 1A and 1B show schematic side cross-sectional views of a composite full-color LED display panel of the present invention;

圖2A顯示光轉換單元的第一示意性立體圖; Fig. 2A shows a first schematic perspective view of the light conversion unit;

圖2B顯示光轉換單元的第二示意性立體圖; Fig. 2B shows a second schematic perspective view of the light conversion unit;

圖3A顯示本發明之複合式全彩LED顯示面板與一驅動電路模組的第一示意性立體圖; 3A shows a first schematic perspective view of the composite full-color LED display panel and a driving circuit module of the present invention;

圖3B顯示本發明之複合式全彩LED顯示面板與一驅動 電路模組的第二示意性立體圖; Figure 3B shows the composite full-color LED display panel and a driver of the present invention A second schematic perspective view of the circuit module;

圖4顯示本發明之複合式全彩LED顯示面板與一驅動電路模組的上視圖; 4 shows a top view of the composite full-color LED display panel and a driving circuit module of the present invention;

圖5顯示本發明之複合式全彩LED顯示面板以及一觸控面板的示意性側剖視圖; 5 shows a schematic side sectional view of the composite full-color LED display panel and a touch panel of the present invention;

圖6A、圖6B與圖6C顯示本發明之一種複合式全彩LED顯示面板的製造方法的流程圖;以及 6A, 6B and 6C show a flow chart of a method for manufacturing a composite full-color LED display panel of the present invention; and

圖7A至圖7M顯示本發明之複合式全彩LED顯示面板的示意性製造流程圖。 7A to 7M show a schematic manufacturing flow chart of the composite full-color LED display panel of the present invention.

為了能夠更清楚地描述本發明所提出之一種複合式全彩LED顯示面板及其製造方法,以下將配合圖式,詳盡說明本發明之較佳實施例。 In order to be able to more clearly describe the composite full-color LED display panel and its manufacturing method proposed by the present invention, the preferred embodiments of the present invention will be described in detail below in conjunction with the drawings.

複合式全彩LED顯示面板的結構 Structure of composite full-color LED display panel

圖1A與圖1B顯示本發明之一種複合式全彩LED顯示面板的示意性側剖視圖。本發明之複合式全彩LED顯示面板1主要包括:具有一第一表面101與一第二表面102的一雙面拋光透光基板10、M個長條狀緩衝層11BL、M個長條狀第一半導體材料層11NL、M個長條狀主動層11AL、M個長條狀第二半導體材料層11PL、M×N個第一導電層1P、一絕緣層12、M×N個透明導電層1T、M×N個 第二導電層2P、以及一光轉換單元15。於圖1A中,該光轉換單元15設置在該M×N個第二導電層2P之上。另一方面,圖1B繪示該光轉換單元15亦可設置在該雙面拋光透光基板10的該第二表面102之上。 1A and 1B show schematic side cross-sectional views of a composite full-color LED display panel of the present invention. The composite full-color LED display panel 1 of the present invention mainly includes: a double-sided polished light-transmitting substrate 10 having a first surface 101 and a second surface 102, M elongated buffer layers 11BL, and M elongated First semiconductor material layer 11NL, M elongated active layers 11AL, M elongated second semiconductor material layers 11PL, M×N first conductive layers 1P, an insulating layer 12, M×N transparent conductive layers 1T, M×N The second conductive layer 2P and a light conversion unit 15. In FIG. 1A, the light conversion unit 15 is disposed on the M×N second conductive layers 2P. On the other hand, FIG. 1B shows that the light conversion unit 15 may also be disposed on the second surface 102 of the double-sided polished light-transmitting substrate 10.

在可行的實施例中,該雙面拋光透光基板10可為下列任一者:雙面拋光藍寶石基板、雙面拋光尖晶石基板、雙面拋光碳化矽基板、雙面拋光玻璃基板、或雙面拋光石英基板。特別地,在該第一表面101之上形成有一緩衝層11B和一第一半導體材料層11N的情況下,本發明利用雷射切割技術對該第一半導體材料層11N和該緩衝層11B進行切割,以於該雙面拋光透光基板10的該第一表面101之上製作出複數條切割道10G(如圖1A所示),進而利用該複數條切割道10G將該緩衝層11B分割成M個所述長條狀緩衝層11BL,同時將該第一半導體材料層11N分割成M個所述長條狀第一半導體材料層11NL。並且,該M個長條狀主動層11AL分別形成於該M個長條狀第一半導體材料層11NL之上,且該M個長條狀第二半導體材料層11PL分別形成於該M個長條狀主動層11AL之上。如圖1A所示,每個所述長條狀第一半導體材料層11NL之上係形成有N個所述第一導電層1P,使得複合式全彩LED顯示面板1包含M×N個所述第一導電層1P。 In a feasible embodiment, the double-sided polished light-transmitting substrate 10 can be any of the following: double-sided polished sapphire substrate, double-sided polished spinel substrate, double-sided polished silicon carbide substrate, double-sided polished glass substrate, or Double-sided polished quartz substrate. In particular, when a buffer layer 11B and a first semiconductor material layer 11N are formed on the first surface 101, the present invention uses laser cutting technology to cut the first semiconductor material layer 11N and the buffer layer 11B. , To fabricate a plurality of cutting lanes 10G (as shown in FIG. 1A) on the first surface 101 of the double-sided polished light-transmitting substrate 10, and then use the plurality of cutting lanes 10G to divide the buffer layer 11B into M The elongated buffer layers 11BL are divided into M of the elongated first semiconductor material layers 11NL at the same time the first semiconductor material layer 11N is divided. In addition, the M elongated active layers 11AL are respectively formed on the M elongated first semiconductor material layers 11NL, and the M elongated second semiconductor material layers 11PL are respectively formed on the M elongated Above the active layer 11AL. As shown in FIG. 1A, N first conductive layers 1P are formed on each of the elongated first semiconductor material layers 11NL, so that the composite full-color LED display panel 1 includes M×N The first conductive layer 1P.

並且,該絕緣層12係覆於該M×N個第一導電層1P 與該M個長條狀第二半導體材料層11PL之上,且填入該複數條切割道10G之中。在可行的實施例中,該絕緣層12的製程材料為一氧化物,且圖1A繪示該絕緣層12之上開設有M×N個開口12O。特別地,本發明令M×N個所述透明導電層1T分別透過該M×N個開口12O而形成於該M個長條狀第二半導體材料層11PL之上,使得每個所述長條狀第二半導體材料層11PL之上形成有N個所述透明導電層1T。進一步地,該M×N個第二導電層2P分別形成於該M×N個透明導電層之上,且該光轉換單元15設置於該M×N個第二導電層2P之上(如圖1A所示)。值得說明的是,每個長條狀第二半導體材料層11PL之上共設有N個所述透明導電層1T,其中各所述透明導電層1T除了用以提升所述長條狀第二半導體材料層11PL之注入電流的均勻度以外,同時也用以作為具有特定面積的一光耦出件(Light outcoupling member)。換句話說,每個長條狀第二半導體材料層11PL之上共設有N個所述光耦出件(亦即,透明導電層1T)。 In addition, the insulating layer 12 covers the M×N first conductive layers 1P On top of the M long strip-shaped second semiconductor material layers 11PL, and filled into the plurality of dicing lanes 10G. In a feasible embodiment, the processing material of the insulating layer 12 is an oxide, and FIG. 1A shows that the insulating layer 12 is provided with M×N openings 120. In particular, in the present invention, the M×N transparent conductive layers 1T are formed on the M long strip-shaped second semiconductor material layers 11PL through the M×N openings 120 respectively, so that each of the long strips N transparent conductive layers 1T are formed on the shaped second semiconductor material layer 11PL. Further, the M×N second conductive layers 2P are respectively formed on the M×N transparent conductive layers, and the light conversion unit 15 is disposed on the M×N second conductive layers 2P (as shown in FIG. Shown in 1A). It is worth noting that a total of N transparent conductive layers 1T are provided on each elongated second semiconductor material layer 11PL, and each of the transparent conductive layers 1T is used to enhance the elongated second semiconductor material. In addition to the uniformity of the injected current of the material layer 11PL, it is also used as a light outcoupling member with a specific area. In other words, there are a total of N light out-coupling elements (that is, the transparent conductive layer 1T) on each elongated second semiconductor material layer 11PL.

更詳細地說明,前述長條狀緩衝層11BL的製程材料通常為未摻雜的氮化鎵(undoped GaN)、氮化鋁(AlN)、或氧化鋅(ZnO)。另一方面,該長條狀第一半導體材料層11NL之製造材料為N型氮化鎵(n-type gallium nitride,n-GaN),且該長條狀第二半導體材料層11PL之製 造材料為P型氮化鎵(p-type gallium nitride,p-GaN)。並且,該長條狀主動層11AL通常會在該長條狀第一半導體材料層11NL與該長條狀第二半導體材料層11PL之間形成一個多重量子井結構。值得特別說明的是,在所述多重量子井結構為一未摻雜的氮化鎵(undoped GaN)層與一氮化銦鎵(InxGa1-xN)層的一多重交互堆疊結構的情況下,只要施予電壓驅動至該長條狀第一半導體材料層11NL和該長條狀第二半導體材料層11PL,M個所述長條狀主動層11AL會透過M×N個所述透明導電層1T(即,光耦出件)發出一藍色光。另一方面,若所述多重量子井結構為一氮化鋁鎵(AlxGa1-xN)層與一氮化銦鎵(InxGa1-xN)層的多重交互堆疊結構,只要施予電壓驅動至該長條狀第一半導體材料層11NL和該長條狀第二半導體材料層11PL,M個所述長條狀主動層11AL會透過M×N個所述透明導電層1T(即,光耦出件)發出一紫色光。 In more detail, the process material of the aforementioned long buffer layer 11BL is usually undoped GaN, aluminum nitride (AlN), or zinc oxide (ZnO). On the other hand, the manufacturing material of the elongated first semiconductor material layer 11NL is n-type gallium nitride (n-GaN), and the manufacturing material of the elongated second semiconductor material layer 11PL is P-type gallium nitride (p-type gallium nitride, p-GaN). Moreover, the elongated active layer 11AL usually forms a multiple quantum well structure between the elongated first semiconductor material layer 11NL and the elongated second semiconductor material layer 11PL. It is worth noting that the multiple quantum well structure is a multiple interactive stack structure of an undoped gallium nitride (undoped GaN) layer and an indium gallium nitride (In x Ga 1-x N) layer. In the case of applying voltage to drive the elongated first semiconductor material layer 11NL and the elongated second semiconductor material layer 11PL, the M elongated active layers 11AL will pass through the M×N The transparent conductive layer 1T (ie, the light coupling-out member) emits a blue light. On the other hand, if the multiple quantum well structure is a multiple alternate stacked structure of an aluminum gallium nitride (Al x Ga 1-x N) layer and an indium gallium nitride (In x Ga 1-x N) layer, as long as A voltage is applied to drive the elongated first semiconductor material layer 11NL and the elongated second semiconductor material layer 11PL, and the M elongated active layers 11AL will pass through the M×N transparent conductive layers 1T ( That is, the optical coupling output member emits a purple light.

繼續參閱圖2A與圖2B,其分別顯示光轉換單元15的一第一示意性立體圖和一第二示意性立體圖。於本發明的一實施例之中,如圖1A所示,該光轉換單元15係設置在該M×N個第二導電層2P之上,且包括M×N個光轉換部分別對應於該M×N個透明導電層1T。必須補充說明的是,如圖2A所示,對應於各所述光耦出件(即,透明導電層1T)係射出一藍色光,本發明係令光轉換單元15的M× N個光轉換部包括:複數個紅光轉換部15R、複數個綠光轉換部15G以及複數個空(blank)轉換部15N。在一實施例中,紅光轉換部15R和綠光轉換部15G分別由一紅光轉換材料與一綠光轉換材料組成,且所述紅光轉換材料與綠光轉換材料可以是螢光粉或量子點。 Continue to refer to FIGS. 2A and 2B, which show a first schematic perspective view and a second schematic perspective view of the light conversion unit 15 respectively. In an embodiment of the present invention, as shown in FIG. 1A, the light conversion unit 15 is disposed on the M×N second conductive layers 2P, and includes M×N light conversion parts respectively corresponding to the M×N transparent conductive layers 1T. It must be added that, as shown in FIG. 2A, corresponding to each of the light coupling-out members (ie, the transparent conductive layer 1T) emits a blue light, the present invention makes the M× of the light conversion unit 15 The N light conversion parts include a plurality of red light conversion parts 15R, a plurality of green light conversion parts 15G, and a plurality of blank conversion parts 15N. In an embodiment, the red light conversion portion 15R and the green light conversion portion 15G are respectively composed of a red light conversion material and a green light conversion material, and the red light conversion material and the green light conversion material may be phosphors or Quantum dots.

另一方面,如圖2B所示,對應於各所述光耦出件(即,透明導電層1T)係射出一紫色光,所述光轉換單元15的M×N個光轉換部則包括:複數個紅光轉換部15R、複數個綠光轉換部15G以及複數個藍光轉換部15B。在一實施例中,紅光轉換部15R、綠光轉換部15G和藍光轉換部15B分別由一紅光轉換材料、一綠光轉換材料與一藍光轉換材料組成,且所述紅光轉換材料、綠光轉換材料和藍光轉換材料皆可為螢光粉或量子點。可以理解成,M×N個透明導電層1T與M×N個光轉換部視為M×N個次畫素。補充說明的是,透明導電層1T可以是一氧化銦錫(ITO)層,亦可為金、銀、鉑、銅、鋁、鉻、鈀、銠等薄金屬層(<10nm)。 On the other hand, as shown in FIG. 2B, corresponding to each of the light coupling-out elements (that is, the transparent conductive layer 1T) emits a purple light, and the M×N light conversion parts of the light conversion unit 15 include: A plurality of red light conversion parts 15R, a plurality of green light conversion parts 15G, and a plurality of blue light conversion parts 15B. In an embodiment, the red light conversion portion 15R, the green light conversion portion 15G, and the blue light conversion portion 15B are respectively composed of a red light conversion material, a green light conversion material, and a blue light conversion material, and the red light conversion material, Both the green light conversion material and the blue light conversion material can be phosphors or quantum dots. It can be understood that the M×N transparent conductive layers 1T and the M×N light conversion parts are regarded as M×N sub-pixels. It is supplemented that the transparent conductive layer 1T may be an indium tin oxide (ITO) layer, or a thin metal layer (<10 nm) such as gold, silver, platinum, copper, aluminum, chromium, palladium, and rhodium.

圖3A與圖3B顯示本發明之複合式全彩LED顯示面板與一驅動電路模組的第一與第二示意性立體圖。特別說明的是,圖3A與圖3B之中並未繪出雙面拋光透光基板10以及絕緣層12,目的在於清楚地顯示出各所述長條狀第一半導體材料層11NL之上的N個第一導電層1P,並顯 示出各所述長條狀第二半導體材料層11PL之上的N個第二導電層2P以及N個透明導電層1T。依據本發明之設計,所述複合式全彩LED顯示面板1還包括M條第一橋接導線BL1,其中,各所述第一橋接導線BL1皆與排列在同一列的N個所述第一導電層1P連接,且各所述第一橋接導線BL1之上形成有一第一共電極CE1。此外,所述複合式全彩LED顯示面板1還進一步包括N條第二橋接導線BL2,其中各所述第二橋接導線BL2皆與排列在同一行的M個所述第二導電層2P連接,且各所述第二橋接導線BL2之上形成有一第二共電極CE2。 3A and 3B show first and second schematic perspective views of the composite full-color LED display panel and a driving circuit module of the present invention. In particular, FIGS. 3A and 3B do not depict the double-sided polished light-transmitting substrate 10 and the insulating layer 12, and the purpose is to clearly show the N on each of the elongated first semiconductor material layers 11NL. A first conductive layer 1P, and show Shown are N second conductive layers 2P and N transparent conductive layers 1T on each of the elongated second semiconductor material layers 11PL. According to the design of the present invention, the composite full-color LED display panel 1 further includes M first bridging wires BL1, wherein each of the first bridging wires BL1 is arranged in the same row as the N first conductive wires. The layers 1P are connected, and a first common electrode CE1 is formed on each of the first bridge wires BL1. In addition, the composite full-color LED display panel 1 further includes N second bridge wires BL2, wherein each of the second bridge wires BL2 is connected to the M second conductive layers 2P arranged in the same row. And a second common electrode CE2 is formed on each of the second bridging wires BL2.

由圖1A可知,各所述第一導電層1P係由絕緣層12所覆蓋,且各所述第二導電層2P設置在該絕緣層12之上。因此,在利用各所述第一橋接導線BL1與排列在同一列的N個所述第一導電層1P連接以及使用各所述第二橋接導線BL2與排列在同一行的M個所述第二導電層2P連接的情況下,係有利於使用COF(Chip ON Film)技術進而使得本發明之複合式全彩LED顯示面板1與一驅動電路模組2組合成一全彩LED顯示裝置。如圖3A與圖3B所示,該驅動電路模組2具有M個第一接點21用以分別與該M個第一共電極CE1電性連接,且該驅動電路模組2還具有N個第二接點22用以分別與該N個第二共電極CE2電性連接。另一方面,圖4顯示本發明之複合式全彩LED顯示面板與一 驅動電路模組的上視圖。比較圖3A與圖4之後,應可得知圖4係繪示本發明之複合式全彩LED顯示面板1亦可透過COG(Chip On Glass)技術而與一驅動電路模組2組合成一全彩LED顯示裝置。 It can be seen from FIG. 1A that each of the first conductive layers 1P is covered by an insulating layer 12, and each of the second conductive layers 2P is disposed on the insulating layer 12. Therefore, when each of the first bridging wires BL1 is connected to the N first conductive layers 1P arranged in the same column, and each of the second bridging wires BL2 is used with the M second conductive layers arranged in the same row. When the conductive layer 2P is connected, it is advantageous to use COF (Chip ON Film) technology to combine the composite full-color LED display panel 1 and a driving circuit module 2 of the present invention into a full-color LED display device. As shown in FIGS. 3A and 3B, the driving circuit module 2 has M first contacts 21 for electrically connecting with the M first common electrodes CE1, and the driving circuit module 2 also has N The second contacts 22 are used for electrically connecting with the N second common electrodes CE2 respectively. On the other hand, Figure 4 shows the composite full-color LED display panel of the present invention and a Top view of the drive circuit module. After comparing FIG. 3A with FIG. 4, it should be understood that FIG. 4 shows that the composite full-color LED display panel 1 of the present invention can also be combined with a driving circuit module 2 to form a full-color display panel through COG (Chip On Glass) technology. LED display device.

進一步地,圖5顯示本發明之複合式全彩LED顯示面板1以及一觸控面板TP的示意性側剖視圖。在一擴增實施例中,由驅動電路模組2和本發明之複合式全彩LED顯示面板1所組成的全彩LED顯示裝置還可進一步與一觸控面板TP組合成一全彩LED觸控顯示裝置,且該觸控面板TP置於該光轉換單元15之上。 Further, FIG. 5 shows a schematic side cross-sectional view of the composite full-color LED display panel 1 and a touch panel TP of the present invention. In an expanded embodiment, the full-color LED display device composed of the driving circuit module 2 and the composite full-color LED display panel 1 of the present invention can be further combined with a touch panel TP to form a full-color LED touch A display device, and the touch panel TP is placed on the light conversion unit 15.

複合式全彩LED顯示面板的製造方法 Manufacturing method of composite full-color LED display panel

圖6A、圖6B與圖6C顯示本發明之一種複合式全彩LED顯示面板的製造方法的流程圖。並且,圖7A至圖7M為複合式全彩LED顯示面板的示意性製造流程圖。如圖6A與圖7A所示,製造方法係首先執行步驟S1和步驟S2:提供具一第一表面101與一第二表面102的一雙面拋光透光基板10,且依序形成一緩衝層11B、一第一半導體材料層11N、一主動層11A、以及一第二半導體材料層11P於該第一表面101之上。接著,如圖7A與圖7B所示,於步驟S3之中,係利用微影蝕刻技術和一第一光阻層PR1製作出完全貫穿該第二半導體材料層11P、該主動層11A、以及部分蝕刻該第一半導體材料層11N之N個長條狀凹槽 RG1,進而利用該N個長條狀凹槽RG1將該第二半導體材料層11P分割成M個長條狀第二半導體材料層11PL,同時將該主動層11A分割成M個長條狀主動層11AL,之後去除該第一光阻層PR1。 6A, 6B, and 6C show a flowchart of a method for manufacturing a composite full-color LED display panel of the present invention. 7A to 7M are schematic manufacturing flowcharts of the composite full-color LED display panel. As shown in FIGS. 6A and 7A, the manufacturing method first performs step S1 and step S2: a double-sided polished transparent substrate 10 with a first surface 101 and a second surface 102 is provided, and a buffer layer is sequentially formed 11B, a first semiconductor material layer 11N, an active layer 11A, and a second semiconductor material layer 11P on the first surface 101. Next, as shown in FIGS. 7A and 7B, in step S3, a photolithography technique and a first photoresist layer PR1 are used to fabricate completely through the second semiconductor material layer 11P, the active layer 11A, and part of Etch N long grooves of the first semiconductor material layer 11N RG1, and then use the N elongated grooves RG1 to divide the second semiconductor material layer 11P into M elongated second semiconductor material layers 11PL, and at the same time divide the active layer 11A into M elongated active layers 11AL, then the first photoresist layer PR1 is removed.

如圖7C所示,於步驟S4之中,係以一第二光阻層PR2覆於該長條狀第二半導體材料層11PL之上,且令各所述長條狀凹槽RG1之側壁覆有該第二光阻層PR2。接著,於步驟S5之中,令各所述長條狀凹槽RG1之中形成有M個第一導電層1P(如圖7D所示)。值得注意的是,於步驟S6之中,如圖7E所示,本發明利用雷射切割技術對各個所述長條狀凹槽RG1的底部進行切割,以於該雙面拋光透光基板10的該第一表面101之上製作出複數條切割道10G,進而利用該複數條切割道10G將該緩衝層11B分割成M個長條狀緩衝層11BL,同時將該第一半導體材料層11N分割成M個長條狀第一半導體材料層11NL。繼續地,如圖7F所示,步驟S7係令各所述長條狀第二半導體材料層11PL之上形成有N個第三光阻層PR3。 As shown in FIG. 7C, in step S4, a second photoresist layer PR2 is used to cover the elongated second semiconductor material layer 11PL, and the sidewalls of each of the elongated grooves RG1 are covered There is the second photoresist layer PR2. Next, in step S5, M first conductive layers 1P are formed in each of the elongated grooves RG1 (as shown in FIG. 7D). It is worth noting that in step S6, as shown in FIG. 7E, the present invention uses laser cutting technology to cut the bottom of each of the elongated grooves RG1 to polish the transparent substrate 10 on both sides. A plurality of cutting lanes 10G are formed on the first surface 101, and then the buffer layer 11B is divided into M elongated buffer layers 11BL by using the plurality of cutting lanes 10G, and the first semiconductor material layer 11N is divided into M long strip-shaped first semiconductor material layers 11NL. Continuing, as shown in FIG. 7F, in step S7, N third photoresist layers PR3 are formed on each of the elongated second semiconductor material layers 11PL.

如圖7G所示,於步驟S8之中,形成一絕緣層12覆蓋該M個長條狀第二半導體材料層11PL,且令該絕緣層12填入該M個長條狀凹槽RG1以及該複數個切割道10G之中。並且,如圖7H所示,步驟S9係去除M×N個所述第三光阻層PR3,使得該絕緣層12具有M×N個開口12O用以露 出該第二半導體材料層11P。進一步地,如圖7I和圖7J所示,於步驟S10之中,係在利用微影蝕刻技術和一第四光阻層PR4的情況下,令M×N個透明導電層1T分別形成於該M×N個開口12O之中。 As shown in FIG. 7G, in step S8, an insulating layer 12 is formed to cover the M elongated second semiconductor material layers 11PL, and the insulating layer 12 is filled with the M elongated grooves RG1 and the Among the multiple cutting lanes 10G. And, as shown in FIG. 7H, step S9 is to remove the M×N third photoresist layers PR3, so that the insulating layer 12 has M×N openings 120 for exposing The second semiconductor material layer 11P is formed. Further, as shown in FIG. 7I and FIG. 7J, in step S10, using the photolithography technique and a fourth photoresist layer PR4, M×N transparent conductive layers 1T are respectively formed on the Among M×N openings 120.

如圖7K和圖7L所示,於步驟S11之中,利用微影蝕刻技術以及一第五光阻層PR5,於該絕緣層12之上製作出M×N個第二導電層2P,且每個所述第二導電層2P係部份地覆蓋在一個所述透明導電層1T之上。最終,如圖7M所示,於步驟S12之中,係在去除該第五光阻層PR5之後,接著於該出M×N個第二導電層2P之上設置包括M×N個光轉換部的一光轉換單元15,完成一複合式全彩LED顯示面板1之製作。 As shown in FIGS. 7K and 7L, in step S11, using photolithography and a fifth photoresist layer PR5, M×N second conductive layers 2P are formed on the insulating layer 12, and each One of the second conductive layers 2P partially covers one of the transparent conductive layers 1T. Finally, as shown in FIG. 7M, in step S12, after the fifth photoresist layer PR5 is removed, then the M×N second conductive layers 2P are disposed on the M×N second conductive layer 2P including M×N light conversion parts. A light conversion unit 15 completes the production of a composite full-color LED display panel 1.

如此,上述係已完整且清楚地說明本發明之一種複合式全彩LED顯示面板及其製造方法;並且,經由上述可得知本發明係具有下列之優點: In this way, the above system has completely and clearly explained a composite full-color LED display panel of the present invention and its manufacturing method; and, from the above, it can be seen that the present invention has the following advantages:

(1)在本發明之複合式全彩LED顯示面板的結構設計中,M個長條狀發光結構形成於一雙面拋光透光基板10的一第一表面101之上。特別地,各所述長條狀發光結構包含一長條狀緩衝層11BL、一長條狀第一半導體材料層11NL、一長條狀主動層11AL、以及一長條狀第二半導體材料層11PL,且一絕緣層12形成於該第一表面102之上並覆蓋所述長條狀發光結構。該絕緣層12內更製作有M× N個第一導電層1P以及M×N個透明導電層1T,使得各所述長條狀第一半導體材料層11NL之上設有N個第一導電層1P,且所述長條狀第二半導體材料層11PL之上設有N個透明導電層1T。進一步地,該絕緣層12之上設有M×N個第二導電層2P,使得各透明導電層1T部分地由該第二導電層2P所覆蓋連接。如此設計,利用M條第一共電極線路BL1連接M×N個第一導電層1P且使用N條第二共電極線路BL2連接M×N個第二導電層2P,使得一顯示驅動晶片易於透過COF或者COG的方式而與本發明之複合式全彩LED顯示面板1相互整合。 (1) In the structural design of the composite full-color LED display panel of the present invention, M elongated light-emitting structures are formed on a first surface 101 of a double-sided polished light-transmitting substrate 10. In particular, each of the strip-shaped light-emitting structures includes a strip-shaped buffer layer 11BL, a strip-shaped first semiconductor material layer 11NL, a strip-shaped active layer 11AL, and a strip-shaped second semiconductor material layer 11PL , And an insulating layer 12 is formed on the first surface 102 and covers the elongated light-emitting structure. The insulating layer 12 is further made with M× N first conductive layers 1P and M×N transparent conductive layers 1T, so that each of the elongated first semiconductor material layers 11NL is provided with N first conductive layers 1P, and the elongated second N transparent conductive layers 1T are provided on the semiconductor material layer 11PL. Further, M×N second conductive layers 2P are provided on the insulating layer 12, so that each transparent conductive layer 1T is partially covered and connected by the second conductive layer 2P. In this design, M first common electrode lines BL1 are used to connect M×N first conductive layers 1P, and N second common electrode lines BL2 are used to connect M×N second conductive layers 2P, so that a display driver chip is easily penetrated. COF or COG is integrated with the composite full-color LED display panel 1 of the present invention.

必須加以強調的是,上述之詳細說明係針對本發明可行實施例之具體說明,惟該實施例並非用以限制本發明之專利範圍,凡未脫離本發明技藝精神所為之等效實施或變更,均應包含於本案之專利範圍中。 It must be emphasized that the above detailed description is a specific description of possible embodiments of the present invention, but this embodiment is not intended to limit the patent scope of the present invention. Any equivalent implementation or modification that does not deviate from the technical spirit of the present invention, All should be included in the patent scope of this case.

1‧‧‧複合式全彩LED顯示面板 1‧‧‧Composite full-color LED display panel

10‧‧‧雙面拋光透光基板 10‧‧‧Double-sided polished translucent substrate

101‧‧‧第一表面 101‧‧‧First surface

102‧‧‧第二表面 102‧‧‧Second surface

10G‧‧‧切割道 10G‧‧‧cutting road

11BL‧‧‧長條狀緩衝層 11BL‧‧‧Long buffer layer

11NL‧‧‧長條狀第一半導體材料層 11NL‧‧‧Elongated first semiconductor material layer

11AL‧‧‧長條狀主動層 11AL‧‧‧Strip active layer

11PL‧‧‧長條狀主動層 11PL‧‧‧Long active layer

1T‧‧‧透明導電層 1T‧‧‧Transparent conductive layer

1P‧‧‧第一導電層 1P‧‧‧First conductive layer

2P‧‧‧第二導電層 2P‧‧‧Second conductive layer

12‧‧‧絕緣層 12‧‧‧Insulation layer

12O‧‧‧開口 12O‧‧‧Open

15‧‧‧光轉換單元 15‧‧‧Optical Conversion Unit

15R‧‧‧紅光轉換部 15R‧‧‧Red light conversion part

15G‧‧‧綠光轉換部 15G‧‧‧Green Light Conversion

Claims (23)

一種複合式全彩LED顯示面板,包括: A composite full-color LED display panel, including: 一雙面拋光透光基板,具一第一表面與一第二表面; A double-sided polished light-transmitting substrate with a first surface and a second surface; 一緩衝層,形成於該第一表面之上; A buffer layer formed on the first surface; 一第一半導體材料層,形成於該緩衝層之上;其中,利用雷射切割技術對該第一半導體材料層和該緩衝層進行切割,以於該雙面拋光透光基板的該第一表面之上製作出複數條切割道,進而利用該複數條切割道將該緩衝層分割成M個長條狀緩衝層,同時將該第一半導體材料層分割成M個長條狀第一半導體材料層; A first semiconductor material layer is formed on the buffer layer; wherein, laser cutting technology is used to cut the first semiconductor material layer and the buffer layer to polish the first surface of the transparent substrate on both sides A plurality of dicing lanes are fabricated on top, and then the plurality of dicing lanes are used to divide the buffer layer into M elongated buffer layers, and at the same time, the first semiconductor material layer is divided into M elongated first semiconductor material layers ; M個長條狀主動層,分別形成於該M個長條狀第一半導體材料層之上; M elongated active layers are respectively formed on the M elongated first semiconductor material layers; M個長條狀第二半導體材料層,分別形成於該M個長條狀主動層之上; M long strip-shaped second semiconductor material layers are respectively formed on the M long strip-shaped active layers; M×N個第一導電層,其中,每個所述長條狀第一半導體材料層之上係形成有N個所述第一導電層; M×N first conductive layers, wherein N first conductive layers are formed on each of the elongated first semiconductor material layers; 一絕緣層,覆於該M×N個第一導電層與該M個長條狀第二半導體材料層之上,且填入該複數條切割道之中;其中,該絕緣層之上開設有M×N個開口; An insulating layer covering the M×N first conductive layers and the M long strip-shaped second semiconductor material layers, and filling the plurality of cutting channels; wherein, the insulating layer is provided with M×N openings; M×N個透明導電層,分別透過該M×N個開口而形成於該M個長條狀第二半導體材料層之上,使得每個所述長條狀第二半導體材料層之上形成有N個所述透明導電層; The M×N transparent conductive layers are respectively formed on the M elongated second semiconductor material layers through the M×N openings, so that each of the elongated second semiconductor material layers is formed with N of the transparent conductive layers; M×N個第二導電層,分別形成於該M×N個透明導電層之 上;以及 M×N second conductive layers are respectively formed on the M×N transparent conductive layers On; and 一光轉換單元,設置於該M×N個第二導電層之上,且包括M×N個光轉換部分別對應於該M×N個透明導電層。 A light conversion unit is arranged on the M×N second conductive layers and includes M×N light conversion parts corresponding to the M×N transparent conductive layers. 申請專利範圍第1項所述之複合式全彩LED顯示面板,更包括: The composite full-color LED display panel described in item 1 of the scope of patent application further includes: M條第一橋接導線,其中,各所述第一橋接導線與排列在同一列的N個所述第一導電層連接,且各所述第一橋接導線之上形成有一第一共電極。 M first bridging wires, wherein each of the first bridging wires is connected to the N first conductive layers arranged in the same column, and a first common electrode is formed on each of the first bridging wires. 申請專利範圍第2項所述之複合式全彩LED顯示面板,更包括: The composite full-color LED display panel described in item 2 of the scope of patent application includes: N條第二橋接導線,其中,各所述第二橋接導線與排列在同一行的M個所述第二導電層連接,且各所述第二橋接導線之上形成有一第二共電極。 N second bridging wires, wherein each of the second bridging wires is connected to M of the second conductive layers arranged in the same row, and a second common electrode is formed on each of the second bridging wires. 申請專利範圍第3項所述之複合式全彩LED顯示面板,其中,所述複合式全彩LED顯示面板與一驅動電路模組組合成一全彩LED顯示裝置,該驅動電路模組具有M個第一接點用以分別與該M個第一共電極電性連接,且該驅動電路模組還具有N個第二接點用以分別與該N個第二共電極電性連接。 The composite full-color LED display panel described in item 3 of the scope of patent application, wherein the composite full-color LED display panel and a drive circuit module are combined to form a full-color LED display device, and the drive circuit module has M The first contacts are used for electrically connecting with the M first common electrodes, and the driving circuit module further has N second contacts for electrically connecting with the N second common electrodes, respectively. 申請專利範圍第4項所述之複合式全彩LED顯示面板,其中,所述全彩LED顯示裝置與一觸控面板組合成一全彩LED觸控顯示裝置,且該觸控面板置於該光轉換單元之上。 The composite full-color LED display panel described in item 4 of the scope of patent application, wherein the full-color LED display device and a touch panel are combined to form a full-color LED touch display device, and the touch panel is placed in the light Above the conversion unit. 申請專利範圍第1項所述之複合式全彩LED顯示面板,其中,該雙面拋光透光基板可為下列任一者:雙面拋光藍寶石基板、雙面拋光尖晶石基板、雙面拋光碳化矽基板、雙面拋光玻璃基板、或雙面拋光石英基板。 The composite full-color LED display panel described in item 1 of the scope of patent application, wherein the double-sided polished light-transmitting substrate can be any of the following: double-sided polished sapphire substrate, double-sided polished spinel substrate, double-sided polished Silicon carbide substrate, double-sided polished glass substrate, or double-sided polished quartz substrate. 申請專利範圍第1項所述之複合式全彩LED顯示面板,其中,該絕緣層的製程材料為一氧化物,且該緩衝層的製造材料可為下列任一者:未摻雜的氮化鎵(undoped GaN)、氮化鋁(AlN)、或氧化鋅(ZnO)。 The composite full-color LED display panel described in item 1 of the scope of patent application, wherein the insulating layer is made of an oxide, and the buffer layer can be made of any one of the following: undoped nitride Gallium (undoped GaN), aluminum nitride (AlN), or zinc oxide (ZnO). 申請專利範圍第1項所述之複合式全彩LED顯示面板,其中,該長條狀第一半導體材料層之製造材料為N型氮化鎵(n-type gallium nitride,n-GaN),且所述長條狀第二半導體材料層之製造材料為P型氮化鎵(p-type gallium nitride,p-GaN)。 The composite full-color LED display panel described in item 1 of the scope of patent application, wherein the manufacturing material of the elongated first semiconductor material layer is n-type gallium nitride (n-GaN), and The manufacturing material of the elongated second semiconductor material layer is p-type gallium nitride (p-GaN). 申請專利範圍第1項所述之複合式全彩LED顯示面板,其中,該長條狀主動層於該長條狀第一半導體材料層與該長 條狀第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一未摻雜的氮化鎵(undoped GaN)層與一氮化銦鎵(InxGa1-xN)層的一多重交互堆疊結構。 The composite full-color LED display panel described in item 1 of the scope of patent application, wherein the elongated active layer forms a multiple layer between the elongated first semiconductor material layer and the elongated second semiconductor material layer. Quantum well structure, and the multiple quantum well structure is a multiple alternate stacked structure of an undoped GaN layer and an indium gallium nitride (In x Ga 1-x N) layer. 申請專利範圍第9項所述之複合式全彩LED顯示面板板,其中,對應於該多重量子井結構包含彼此交互堆疊的多個所述未摻雜的氮化鎵層與多個所述氮化銦鎵層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個空轉換部。 The composite full-color LED display panel according to item 9 of the scope of patent application, wherein the multiple quantum well structure includes a plurality of the undoped gallium nitride layers and a plurality of the nitrogen layers alternately stacked with each other. Indium gallium oxide layer, the M×N light conversion parts include: a plurality of red light conversion parts, a plurality of green light conversion parts, and a plurality of empty conversion parts. 申請專利範圍第1項所述之複合式全彩LED顯示面板,其中,該長條狀主動層於該長條狀第一半導體材料層與該長條狀第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一氮化鋁鎵(AlxGa1-xN)層與一氮化銦鎵(InxGa1-xN)層的多重交互堆疊結構。 The composite full-color LED display panel described in item 1 of the scope of patent application, wherein the elongated active layer forms a multiple layer between the elongated first semiconductor material layer and the elongated second semiconductor material layer. Quantum well structure, and the multiple quantum well structure is a multiple alternate stack structure of an aluminum gallium nitride (Al x Ga 1-x N) layer and an indium gallium nitride (In x Ga 1-x N) layer. 申請專利範圍第11項所述之複合式全彩LED顯示面板,其中,對應於該多重量子井結構包含彼此交互堆疊的多個所述未摻雜的氮化鎵層與多個所述氮化銦鎵層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個藍光轉換部。 The composite full-color LED display panel described in item 11 of the scope of patent application, wherein the multiple quantum well structure includes a plurality of the undoped gallium nitride layers and a plurality of the nitride layers alternately stacked with each other. Indium gallium layer, the M×N light conversion parts include: a plurality of red light conversion parts, a plurality of green light conversion parts, and a plurality of blue light conversion parts. 一種複合式全彩LED顯示面板的製造方法,包括以下步驟: A method for manufacturing a composite full-color LED display panel includes the following steps: (1)提供具一第一表面與一第二表面的一雙面拋光透光基板; (1) Provide a double-sided polished light-transmitting substrate with a first surface and a second surface; (2)依序形成一緩衝層、一第一半導體材料層、一主動層、以及一第二半導體材料層於該第一表面之上; (2) Sequentially forming a buffer layer, a first semiconductor material layer, an active layer, and a second semiconductor material layer on the first surface; (3)利用微影蝕刻技術和一第一光阻層製作出完全貫穿該第二半導體材料層、該主動層、以及部分蝕刻該第一半導體材料層之N個長條狀凹槽,進而利用該N個長條狀凹槽將該第二半導體材料層分割成M個長條狀第二半導體材料層,同時將該主動層分割成M個長條狀主動層,之後去除該第一光阻層; (3) Using lithographic etching technology and a first photoresist layer to make N long grooves that completely penetrate the second semiconductor material layer, the active layer, and partially etch the first semiconductor material layer, and then use The N elongated grooves divide the second semiconductor material layer into M elongated second semiconductor material layers, and at the same time, divide the active layer into M elongated active layers, and then remove the first photoresist Floor; (4)以一第二光阻層覆於該長條狀第二半導體材料層之上,且令各所述長條狀凹槽之側壁覆有該第二光阻層; (4) Covering the elongated second semiconductor material layer with a second photoresist layer, and making the sidewalls of each of the elongated grooves covered with the second photoresist layer; (5)令各所述長條狀凹槽之中形成有M個第一導電層,接著去除該第四光阻層; (5) M first conductive layers are formed in each of the elongated grooves, and then the fourth photoresist layer is removed; (6)利用雷射切割技術對各個所述長條狀凹槽的底部進行切割,以於該雙面拋光透光基板的該第一表面之上製作出複數條切割道,進而利用該複數條切割道將該緩衝層分割成M個長條狀緩衝層,同時將該第一半導體材料層分割成M個長條狀第一半導體材料層; (6) Using laser cutting technology to cut the bottom of each of the elongated grooves, so as to form a plurality of cutting channels on the first surface of the double-sided polished light-transmitting substrate, and then use the plurality of cutting channels. The dicing lane divides the buffer layer into M elongated buffer layers, and at the same time divides the first semiconductor material layer into M elongated first semiconductor material layers; (7)令各所述長條狀第二半導體材料層之上形成有N個第三光阻層; (7) N third photoresist layers are formed on each of the elongated second semiconductor material layers; (8)形成一絕緣層覆蓋該M個長條狀第二半導體材料層,且令該絕緣層填入該M個長條狀凹槽以及該複數個切割道之中; (8) An insulating layer is formed to cover the M long strip-shaped second semiconductor material layers, and the insulating layer is filled into the M long strip-shaped grooves and the plurality of cutting channels; (9)去除M×N個所述第三光阻層,使得該絕緣層具有M×N個開口用以露出該第二半導體材料層; (9) removing the M×N third photoresist layers, so that the insulating layer has M×N openings for exposing the second semiconductor material layer; (10)在利用微影蝕刻技術和一第四光阻層的情況下,令M×N個透明導電層分別形成於該M×N個開口之中; (10) In the case of using a photolithographic etching technique and a fourth photoresist layer, M×N transparent conductive layers are respectively formed in the M×N openings; (11)利用微影蝕刻技術以及一第五光阻層,於該絕緣層之上製作出M×N個第二導電層,且每個所述第二導電層係部份地覆蓋在一個所述透明導電層之上;以及 (11) Using photolithographic etching technology and a fifth photoresist layer, M×N second conductive layers are formed on the insulating layer, and each of the second conductive layers partially covers a Above the transparent conductive layer; and (12)去除該第五光阻層之後,於該出M×N個第二導電層之上設置包括M×N個光轉換部的一光轉換單元,完成一複合式全彩LED顯示面板之製作。 (12) After the fifth photoresist layer is removed, a light conversion unit including M×N light conversion parts is arranged on the M×N second conductive layer to complete a composite full-color LED display panel Make. 申請專利範圍第13項所述之複合式全彩LED顯示面板的製造方法,其中,排列在同一列的N個所述第一導電層同時被連接至一條第一橋接導線,且M條所述第一橋接導線各設有一第一共電極。 The method for manufacturing a composite full-color LED display panel according to item 13 of the scope of the patent application, wherein the N first conductive layers arranged in the same row are simultaneously connected to a first bridging wire, and the M Each of the first bridging wires is provided with a first common electrode. 申請專利範圍第14項所述之複合式全彩LED顯示面板的製造方法,其中,排列在同一行的M個所述第二導電層同時被連接至一條第二橋接導線,且N條所述第二橋接導線各設有一第二共電極。 The method for manufacturing a composite full-color LED display panel according to item 14 of the scope of patent application, wherein the M second conductive layers arranged in the same row are simultaneously connected to one second bridge wire, and N Each of the second bridging wires is provided with a second common electrode. 申請專利範圍第15項所述之複合式全彩LED顯示面板的製造方法,其中,所述複合式全彩LED顯示面板與一驅動電路模組組合成一全彩LED顯示裝置,該驅動電路模組具有M個第一接點用以分別與該M個第一共電極電性連接,且該驅動電路模組還具有N個第二接點用以分別與該N個第二共電極電性連接。 The method for manufacturing a composite full-color LED display panel according to item 15 of the scope of patent application, wherein the composite full-color LED display panel and a drive circuit module are combined to form a full-color LED display device, and the drive circuit module There are M first contacts for electrically connecting with the M first common electrodes, and the driving circuit module also has N second contacts for electrically connecting with the N second common electrodes, respectively . 申請專利範圍第13項所述之複合式全彩LED顯示面板的製造方法,其中,該雙面拋光透光基板可為下列任一者:雙面拋光藍寶石基板、雙面拋光尖晶石基板、雙面拋光碳化矽基板、雙面拋光玻璃基板、或雙面拋光石英基板。 The method for manufacturing a composite full-color LED display panel described in item 13 of the scope of patent application, wherein the double-sided polished light-transmitting substrate can be any of the following: double-sided polished sapphire substrate, double-sided polished spinel substrate, Double-sided polished silicon carbide substrate, double-sided polished glass substrate, or double-sided polished quartz substrate. 申請專利範圍第13項所述之複合式全彩LED顯示面板的製造方法,其中,該絕緣層的製程材料為一氧化物,且該緩衝層的製造材料可為下列任一者:未摻雜的氮化鎵(undoped GaN)、氮化鋁(AlN)、或氧化鋅(ZnO)。 The manufacturing method of the composite full-color LED display panel described in item 13 of the scope of patent application, wherein the manufacturing material of the insulating layer is an oxide, and the manufacturing material of the buffer layer can be any of the following: undoped Of gallium nitride (undoped GaN), aluminum nitride (AlN), or zinc oxide (ZnO). 申請專利範圍第18項所述之複合式全彩LED顯示面板的製造方法,其中,該第一半導體材料層之製造材料為N型氮化鎵(n-type gallium nitride,n-GaN),且所述第二半導體材料層之製造材料為P型氮化鎵(p-type gallium nitride, p-GaN)。 The method for manufacturing a composite full-color LED display panel described in item 18 of the scope of patent application, wherein the manufacturing material of the first semiconductor material layer is n-type gallium nitride (n-GaN), and The manufacturing material of the second semiconductor material layer is p-type gallium nitride (p-type gallium nitride, p-GaN). 申請專利範圍第18項所述之複合式全彩LED顯示面板的製造方法,其中,該主動層於該第一半導體材料層與該第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一未摻雜的氮化鎵(undoped GaN)層與一氮化銦鎵(InxGa1-xN)層的一多重交互堆疊結構。 The method for manufacturing a composite full-color LED display panel according to item 18 of the scope of patent application, wherein the active layer forms a multiple quantum well structure between the first semiconductor material layer and the second semiconductor material layer, and the The multiple quantum well structure is a multiple alternate stacked structure of an undoped GaN layer and an indium gallium nitride (In x Ga 1-x N) layer. 申請專利範圍第20項所述之複合式全彩LED顯示面板的製造方法,其中,對應於該多重量子井結構包含彼此交互堆疊的多個所述未摻雜的氮化鎵層與多個所述氮化銦鎵層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個空轉換部。 The method for manufacturing a composite full-color LED display panel according to item 20 of the scope of patent application, wherein the multiple quantum well structure includes a plurality of the undoped gallium nitride layers and a plurality of all stacked alternately with each other. In the indium gallium nitride layer, the M×N light conversion parts include: a plurality of red light conversion parts, a plurality of green light conversion parts, and a plurality of empty conversion parts. 申請專利範圍第18項所述之複合式全彩LED顯示面板的製造方法,其中,該主動層於該第一半導體材料層與該第二半導體材料層之間形成一個多重量子井結構,且該多重量子井結構為一氮化鋁鎵(AlxGa1-xN)層與一氮化銦鎵(InxGa1-xN)層的多重交互堆疊結構。 The method for manufacturing a composite full-color LED display panel according to item 18 of the scope of patent application, wherein the active layer forms a multiple quantum well structure between the first semiconductor material layer and the second semiconductor material layer, and the The multiple quantum well structure is a multiple alternate stacked structure of an aluminum gallium nitride (Al x Ga 1-x N) layer and an indium gallium nitride (In x Ga 1-x N) layer. 申請專利範圍第22項所述之複合式全彩LED顯示面板的製造方法,其中,對應於該多重量子井結構包含彼此交互堆疊的多個所述未摻雜的氮化鎵層與多個所述氮化銦鎵 層,該M×N個光轉換部包括:複數個紅光轉換部、複數個綠光轉換部以及複數個藍光轉換部。 The method for manufacturing a composite full-color LED display panel according to item 22 of the scope of the patent application, wherein the multiple quantum well structure includes a plurality of the undoped gallium nitride layers and a plurality of all stacked alternately with each other. Indium Gallium Nitride Layer, the M×N light conversion parts include: a plurality of red light conversion parts, a plurality of green light conversion parts, and a plurality of blue light conversion parts.
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