TW202122766A - Analog device and control method of the same, temperature sensor, and analog element associating system - Google Patents
Analog device and control method of the same, temperature sensor, and analog element associating system Download PDFInfo
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Abstract
Description
本發明係關於設置於IC(積體電路)晶片之類比裝置及其控制方法、溫度感測器、及類比元件對應系統。The present invention relates to an analog device installed on an IC (Integrated Circuit) chip, a control method thereof, a temperature sensor, and an analog component corresponding system.
於CMOS(Complementary Metal Oxide Semiconductor)製程中,將數位電路與類比電路混合載置於單一IC晶片上具有小型化、高速動作化及低耗電化之優點。然而,設計使用有MOS電晶體之類比裝置時的問題之一係製造期間產生的裝置特性偏差。隨著製程微細化,電晶體之偏差增大,由此,類比裝置之特性偏差增大。結果,有上述類比裝置無法實現特定性能的擔心。In the CMOS (Complementary Metal Oxide Semiconductor) process, mixing digital circuits and analog circuits on a single IC chip has the advantages of miniaturization, high-speed operation, and low power consumption. However, one of the problems when designing analog devices using MOS transistors is the deviation of device characteristics during manufacturing. With the miniaturization of the manufacturing process, the deviation of the transistor has increased, and as a result, the deviation of the characteristics of the analog device has increased. As a result, there is a concern that the above-mentioned analog devices cannot achieve specific performance.
為了抑制上述類比裝置之特性偏差,考慮增大上述類比裝置之面積。然而,該情形時,不僅上述類比裝置之尺寸會大型化,且耗電及製造成本亦會增大。 [先前技術文獻] [非專利文獻]In order to suppress the characteristic deviation of the above-mentioned analog device, consider increasing the area of the above-mentioned analog device. However, in this case, not only the size of the above-mentioned analog device will increase, but also the power consumption and manufacturing cost will increase. [Prior Technical Literature] [Non-Patent Literature]
[非專利文獻1]T. Sundstrom and A. Alvandpour, 「Utilizing process variations for reference generation in a flash ADC,」 IEEE Trans. Circuits Syst. II Express Briefs, vol. 56, no. 5, pp. 364-368, 2009 [非專利文獻2]V. H. Chen and L. Pileggi, 「An 8.5mW 5GS / s 6b Flash ADC with Dynamic Offset Calibration in 32nm CMOS SOI,」 in IEEE Symposium on VLSI Circuits, 2013, pp. 264-265 [非專利文獻3]T. Someya, A.K.M.M. Islam, T. Sakurai, and M. Takamiya, 「An 11-nW CMOS temperature-to-digital converter utilizing sub-threshold current at sub-thermal drain voltage,」 IEEE Journal of Solid-State Circuits, vol.54, no.3, pp.613-622, 2019 [非專利文獻4]H. Wang and P.P. Mercier, 「Near-zero-power temperature sensing via tunneling currents through complementary metal-oxide-semiconductor transistors,」 Scientific Reports, vol.7, no.1, p.4427, 2017 [非專利文獻5]A.K.M.M. Islam, J. Shiomi, T. Ishihara, and H. Onodera, 「Wide-supply-range all-digital leakage variation sensor for on-chip process and temperature monitoring,」 IEEE Journal of Solid-State Circuits, vol.50, no.11, pp.2475-2490, 2015. [非專利文獻6]K. Yang, Q. Dong, W. Jung, Y. Zhang, M. Choi, D. Blaauw, and D. Sylvester, 「A 0.6nJ -0.22/+0.19℃ inaccuracy temperature sensor using exponential subthreshold oscillation dependence,」 IEEE International Solid-State Circuits Conference, pp.160-162, 2017 [非專利文獻7]T. Tsunomura, A. Nishida, F. Yano, A.T. Putra, K. Takeuchi, S. Inaba, S. Kamohara, K. Terada, T. Hiramoto, and T. Mogami, 「Analyses of 5 σ Vth fluctuation in 65nm-MOSFETs using takeuchi plot,」 Symposium on VLSI Technology, pp.156-157, June 2008 [非專利文獻8]M.J.M. Pelgrom, A.C.J. Duinmaijer, and A.P.G. Welbers, 「Matching properties of MOS transistors,」 IEEE Journal of Solid-State Circuits, vol.24, no.5, pp.1433-1439, Oct. 1989[Non-Patent Literature 1] T. Sundstrom and A. Alvandpour, "Utilizing process variations for reference generation in a flash ADC," IEEE Trans. Circuits Syst. II Express Briefs, vol. 56, no. 5, pp. 364-368 , 2009 [Non-Patent Document 2] V. H. Chen and L. Pileggi, "An 8.5mW 5GS / s 6b Flash ADC with Dynamic Offset Calibration in 32nm CMOS SOI," in IEEE Symposium on VLSI Circuits, 2013, pp. 264-265 [Non-Patent Document 3] T. Someya, AKMM Islam, T. Sakurai, and M. Takamiya, "An 11-nW CMOS temperature-to-digital converter utilizing sub-threshold current at sub-thermal drain voltage," IEEE Journal of Solid-State Circuits, vol.54, no.3, pp.613-622, 2019 [Non-Patent Document 4] H. Wang and P.P. Mercier, "Near-zero-power temperature sensing via tunneling currents through complementary metal-oxide-semiconductor transistors," Scientific Reports, vol.7, no.1, p.4427, 2017 [Non-Patent Document 5]AKMM Islam, J. Shiomi, T. Ishihara, and H. Onodera, "Wide-supply-range all-digital leakage variation sensor for on-chip process and temperature monitoring," IEEE Journal of Solid-State Circuits, vol.50, no.11, pp.2475-2490, 2015. [Non-Patent Document 6] K. Yang, Q. Dong, W. Jung, Y. Zhang, M. Choi, D. Blaauw, and D. Sylvester, "A 0.6nJ -0.22/+0.19℃ inaccuracy temperature sensor using exponential subthreshold oscillation dependence,'' IEEE International Solid-State Circuits Conference, pp.160-162, 2017 [Non-Patent Document 7] T. Tsunomura, A. Nishida, F. Yano, AT Putra, K. Takeuchi, S. Inaba, S. Kamohara, K. Terada, T. Hiramoto, and T. Mogami, "Analyses of 5 σ Vth fluctuation in 65nm-MOSFETs using takeuchi plot,'' Symposium on VLSI Technology, pp.156-157, June 2008 [Non-Patent Document 8] M.J.M. Pelgrom, A.C.J. Duinmaijer, and A.P.G. Welbers, "Matching properties of MOS transistors," IEEE Journal of Solid-State Circuits, vol.24, no.5, pp.1433-1439, Oct. 1989
[發明所欲解決之課題][The problem to be solved by the invention]
針對上述問題,非專利文獻1、2中揭示了將類比信號轉換為6位元之數位信號之快閃型ADC(Analog-to-Digital Convertor)。該ADC中,於單一IC晶片上設置有:63個比較器,其等輸入有上述類比信號;以及解碼器,其將來自該63個比較器之信號轉換為6位元之數位信號。上述比較器之各者利用偏置電壓遵循常態分佈(normal distribution)這一點,取代參考電壓而將上述偏置電壓用作AD轉換的基準。In response to the above problems, Non-Patent
於上述ADC之情形時,由於利用了比較器之偏置電壓的偏差(裝置的特性偏差),故無須抑制上述偏差。因此,無須增大比較器之面積,能夠抑制耗電及製造成本之增大。In the case of the above-mentioned ADC, since the deviation of the bias voltage of the comparator (the characteristic deviation of the device) is used, there is no need to suppress the above deviation. Therefore, there is no need to increase the area of the comparator, and the increase in power consumption and manufacturing cost can be suppressed.
另一方面,必須精確地測定各比較器之偏置電壓。然而,難以精確地在上述IC晶片上(on chip)測定上述偏置電壓。而且,當用上述IC晶片之外部測定設備測定上述偏置電壓時,需要高性能的測定設備,而且,必須將用以測定上述偏置電壓之輸出埠(port)設置於上述IC晶片。On the other hand, the bias voltage of each comparator must be accurately measured. However, it is difficult to accurately measure the above-mentioned bias voltage on the above-mentioned IC chip (on chip). Moreover, when measuring the bias voltage with the external measuring equipment of the IC chip, a high-performance measuring equipment is required, and an output port for measuring the bias voltage must be provided in the IC chip.
本發明之一態樣之目的在於實現能夠推定與類比裝置之動作相關的類比元件之第1特性之值之類比裝置等。 [用以解決課題之手段]An object of one aspect of the present invention is to realize an analog device or the like capable of estimating the value of the first characteristic of an analog element related to the operation of the analog device. [Means to solve the problem]
本發明之一態樣之類比裝置係設置於IC晶片,其中:上述類比裝置具備進行類比動作之複數個類比元件、及控制該類比裝置之動作之控制裝置,上述類比元件之各者具有:第1特性,其與上述類比裝置之動作相關,且偏差遵循統計分佈;以及第2特性,其與第1特性相關,且能夠在晶片上(on chip)測定;上述控制裝置係依據第2特性之測定值將複數個上述類比元件定序,且基於與第1特性相關的上述統計分佈及上述類比元件之順序使第1特性之值與上述類比元件相對應。An analog device of one aspect of the present invention is provided on an IC chip, wherein: the analog device includes a plurality of analog elements for performing analog operations, and a control device for controlling the motion of the analog device, each of the analog elements has: 1 characteristic, which is related to the action of the above-mentioned analog device, and the deviation follows a statistical distribution; and the second characteristic, which is related to the first characteristic and can be measured on chip; the above-mentioned control device is based on the second characteristic The measured value ranks the plurality of the analog elements, and the value of the first characteristic corresponds to the analog element based on the statistical distribution related to the first characteristic and the order of the analog elements.
而且,本態樣之電容器(condenser) 設備中,上述控制裝置較佳為使與第1特性之特定值對應之上述類比元件動作。另外,上述控制裝置亦可使與第1特性之特定值對應之上述類比元件以外的類比元件停止。Furthermore, in the condenser device of this aspect, the control device preferably operates the analog element corresponding to the specific value of the first characteristic. In addition, the control device may also stop analog elements other than the analog element corresponding to the specific value of the first characteristic.
而且,本態樣之電容器設備中,進而具備測定第2特性之測定裝置,上述控制裝置亦可依據由上述測定裝置測定出之第2特性的測定值而將複數個上述類比元件定序。Furthermore, the capacitor device of this aspect is further provided with a measuring device for measuring the second characteristic, and the control device may also sequence a plurality of the analog elements based on the measured value of the second characteristic measured by the measuring device.
一例中,可列舉:上述類比元件係電晶體,上述類比元件之第1特性係上述電晶體之閾值電壓,上述類比元件之第2特性係上述電晶體之次臨界漏電流(sub-threshold leakage current)。In one example, the analog element is a transistor, the first characteristic of the analog element is the threshold voltage of the transistor, and the second characteristic of the analog element is the sub-threshold leakage current of the transistor. ).
另一例中,可列舉:上述類比元件係比較器,上述類比元件之第1特性係上述比較器之偏置電壓,上述類比元件之第2特性係上述比較器所包含之複數個電晶體之一部分動作停止時的輸出電壓與上述複數個電晶體之另一部分動作停止時的輸出電壓之差。In another example, the analog element is a comparator, the first characteristic of the analog element is the bias voltage of the comparator, and the second characteristic of the analog element is a part of the plurality of transistors included in the comparator. The difference between the output voltage when the operation is stopped and the output voltage when the other part of the plurality of transistors is stopped.
本發明之另一態樣之類比裝置之控制方法中,該類比裝置係設置於IC晶片,且該類比裝置具備進行類比動作之複數個類比元件,上述類比元件之各者具有與上述類比裝置之動作相關且偏差遵循統計分佈之第1特性、及與第1特性相關且能夠在晶片上測定之第2特性,上述類比裝置之控制方法包括下述步驟:依據第2特性之測定值將複數個上述類比元件定序之步驟;以及基於與第1特性相關的上述統計分佈及上述類比元件之順序使第1特性之值與上述類比元件相對應之步驟。In another aspect of the control method of an analog device of the present invention, the analog device is provided on an IC chip, and the analog device is provided with a plurality of analog elements that perform analog operations, and each of the analog elements has a similar value to that of the analog device. The first characteristic that is action-related and the deviation follows the statistical distribution, and the second characteristic that is related to the first characteristic and can be measured on the chip, the control method of the above analog device includes the following steps: according to the measured value of the second characteristic, a plurality of The step of sequencing the above-mentioned analog components; and the step of making the value of the first characteristic correspond to the above-mentioned analog components based on the above statistical distribution related to the first characteristic and the order of the above-mentioned analog components.
本發明之又一態樣之溫度感測器係設置於IC晶片上,其具備:電容器(capacitor);複數個電晶體,其等與該電容器並聯連接;複數個開關元件,其等設置於上述電容器與上述複數個電晶體之各者之間;以及控制裝置,其控制該複數個開關元件;該控制裝置係針對上述複數個電晶體之各者,測定來自上述電容器之電流放電至上述電晶體而上述電容器之電壓降低至特定電壓為止的放電時間,將上述複數個電晶體之至少2個放電時間之比作為溫度資訊輸出。Another aspect of the present invention is that the temperature sensor is arranged on an IC chip, and includes: a capacitor; a plurality of transistors connected in parallel with the capacitor; and a plurality of switching elements, etc., are provided above Between the capacitor and each of the plurality of transistors; and a control device that controls the plurality of switching elements; the control device measures the current discharged from the capacitor to the transistor for each of the plurality of transistors The discharge time until the voltage of the capacitor drops to a specific voltage is output as temperature information by the ratio of at least two discharge times of the plurality of transistors.
本發明之其他態樣之溫度感測器具備:複數個類比元件,其等設置於IC晶片上,且進行類比動作;以及控制裝置,其控制該類比元件之動作;上述類比元件之各者具有:第1特性,其偏差遵循統計分佈;以及第2特性,其與第1特性相關,且能夠在晶片上測定;上述控制裝置係依據第2特性之測定值將複數個上述類比元件定序,且基於與第1特性相關的上述統計分佈及上述類比元件之順序使第1特性之值與上述類比元件相對應。 [發明之效果]A temperature sensor of another aspect of the present invention includes: a plurality of analog elements, which are arranged on an IC chip and perform analog operations; and a control device, which controls the motion of the analog elements; each of the above-mentioned analog elements has : The first characteristic, the deviation of which follows a statistical distribution; and the second characteristic, which is related to the first characteristic and can be measured on the chip; the above-mentioned control device is based on the measured value of the second characteristic to sequence the plurality of the above-mentioned analog components, And based on the statistical distribution related to the first characteristic and the order of the analog element, the value of the first characteristic corresponds to the analog element. [Effects of Invention]
根據本發明之一態樣,實現可推定與類比裝置之動作相關的類比元件之第1特性之值這一效果。According to one aspect of the present invention, it is possible to estimate the value of the first characteristic of the analog element related to the operation of the analog device.
〔實施形態1〕[Embodiment 1]
以下,對本發明之一實施形態進行詳細說明。 (溫度感測器之構成)Hereinafter, an embodiment of the present invention will be described in detail. (Composition of temperature sensor)
圖1係表示本發明之一實施形態之溫度感測器1(類比裝置)的概略構成之電路圖。Fig. 1 is a circuit diagram showing a schematic configuration of a temperature sensor 1 (an analog device) according to an embodiment of the present invention.
溫度感測器1設置於單一IC晶片,包含控制裝置2、切換部3、類比電晶體群Tr、偏壓產生電路4、電容器5、充電用電晶體6、反轉放大器7、TDC(時間‐數位轉換器,Time-to-Digital Convertor)8、及運算單元9。另外,從小型化、高速動作化、低耗電化等觀點來考慮,上述IC晶片較佳為CMOS之IC晶片。The
控制裝置2控制溫度感測器1之動作。具體來說,控制裝置2被輸入時脈信號Clock及TDC8之結果。控制裝置2構成為控制切換部3所包含之開關元件之開啟及關閉,且控制充電用電晶體6之閘極電位。The
切換部3構成為將電容器5之一電極選擇性地連接於N個電晶體Mn中之任一者的源極端子。另外,N為2以上之自然數。The
圖2係表示切換部3的一構成例之電路圖。如圖2所示,切換部3包含N個開關元件S(第1開關元件S1
~第N開關元件SN
)。各開關元件S係數位地進行動作之微細的MOSFET(Metal-Oxide Semiconductor Field-Effect Transistor)。FIG. 2 is a circuit diagram showing an example of the configuration of the
類比電晶體群Tr包含N個電晶體Mn(第1電晶體Mn1
~第N電晶體MnN
)(類比元件),各電晶體Mn係微細的n型MOSFET。第k電晶體Mnk
(k為1~N之整數)中,源極端子接地,汲極端子經由切換部3之第k開關元件Sk
而連接於電容器5,閘極端子連接於偏壓產生電路4。各電晶體Mn類比地進行動作,亦即,被施加閾值電壓Vth
以下的偏置電壓Vb
而被利用。因N個電晶體Mn微細,故製造時其特性會產生不可忽視的偏差。關於這一點將在後面敘述。The analog transistor group Tr includes N transistors Mn (first transistor Mn 1 to N-th transistor Mn N ) (analog elements), and each transistor Mn is a fine n-type MOSFET. K-th transistor Mn k (N k is an integer of 1 ~), the source terminal is grounded, the drain terminal via the switching section of the switching element S k 3 k of the
偏壓產生電路4產生要施加至N個電晶體Mn之閘極‐源極間之偏置電壓Vb 。偏置電壓Vb 小於第1電晶體Mn1 ~第N電晶體MnN 之任一者的閾值電壓Vth1 ~VthN 。 The bias voltage generating circuit 4 generates a bias voltage V b to be applied between the gate and the source of the N transistors Mn. The bias voltage V b is lower than the threshold voltage V th1 to V thN of any one of the first transistor Mn 1 to the Nth transistor Mn N.
電容器5中,一電極連接於切換部3、充電用電晶體6之汲極端子及反轉放大器7之輸入端子,另一電極接地。In the
充電用電晶體6係數位地進行動作之微細的MOSFET。充電用電晶體6中,源極端子連接於高電位側的電源電壓Vdd
,汲極端子連接於電容器5,閘極端子連接於控制裝置2。The charging transistor is a tiny MOSFET that operates at six coefficients. In the charging
反轉放大器7中,輸入端子連接於電容器5,輸出端子連接於TDC8。In the inverting
TDC8被輸入時脈信號Clock、及反轉放大器7之結果。TDC8對電容器5之輸出電壓Vout
減少至給定的閾值電壓Vc
所需之放電時間進行測量。TDC8將放電時間以數位值的形式輸出至控制裝置2與運算單元9。TDC8 is the result of inputting the clock signal Clock and inverting the
運算單元9被輸入時脈信號Clock、及來自TDC8的放電時間。運算單元9包含2個揮發性記錄介質(暫存器)10a、10b及邏輯電路11。2個揮發性記錄介質10a、10b分別暫時地記憶來自TDC8的2個放電時間。邏輯電路11算出記憶於揮發性記錄介質10a之放電時間及記憶於揮發性記錄介質10b之放電時間的放電時間比,並將與放電時間比對應之數位信號作為表示溫度之溫度資訊輸出。然後,未圖示的控制裝置在接收上述數位信號的情況下,基於校正資料並根據放電時間比算出溫度並輸出。此處,未圖示的控制裝置可以是同一IC晶片內之控制裝置,亦可以是其他晶片之控制裝置。另外,上述溫度之算出方法(數位信號之輸出方法)之詳細情況將在後面敘述。
(溫度感測器之動作)The
圖3係表示圖1所示之溫度感測器1之動作例之流程圖。FIG. 3 is a flowchart showing an example of the operation of the
當溫度感測器1開始溫度感測(START)時,控制裝置2從初始設定k=1起開始動作(步驟S1)。控制裝置2首先執行測量電容器5通過第k電晶體Mnk
放電的情況下的第k放電時間dk
的子程式(步驟S2)。另外,稍後將描述該子程式。然後,控制裝置2將第k放電時間寫入至控制裝置2內之揮發性記錄介質(步驟S3),並判斷是否滿足k=N(步驟S4)。若步驟S4中為「否」,則將k增加1(步驟S5),且返回至步驟S2。When the
若步驟S4中為「是」,則控制裝置2結束放電時間的測量,並讀出所測量出之第1放電時間d1
~第N放電時間dN
(步驟S6)。然後,控制裝置2以放電時間按升序(或者降序)排列的方式將第1電晶體Mn1
~第N電晶體MnN
排序(sort)(步驟S7)。亦即,控制裝置2按放電時間之升序(或者降序)將第1電晶體Mn1
~第N電晶體MnN
定序。If "YES" in step S4, the
在如上述般完成排序後,控制裝置2如以下方式選擇第1參考電晶體Tr1
及第2參考電晶體Tr2
。After the sequencing is completed as described above, the
控制裝置2讀出第1參考電晶體Tr1
之位次(步驟S8)。然後,將第1電晶體Mn1
~第N電晶體MnN
中的位於該位次之第i電晶體Mni
選擇為第1參考電晶體Tr1
(步驟S9),並將選擇結果寫入至控制裝置2內之揮發性記錄介質中(步驟S10)。同樣地,控制裝置2讀出第2參考電晶體Tr2
之位次(步驟S11)。然後,將第1電晶體Mn1
~第N電晶體MnN
中的位於該位次之第j電晶體Mnj
選擇為第2參考電晶體Tr2
(步驟S12),並將選擇結果寫入至控制裝置2內之揮發性記錄介質中(步驟S13)。另外,控制裝置2可同時執行或以相反的順序執行步驟S8~S10及步驟S11~S13。另外,稍後將描述步驟8、11中讀出之位次。The
在如以上般進行選擇後,控制裝置2如以下方式測量第1參考放電時間dref1
及第2參考放電時間dref2
。After making the selection as described above, the
控制裝置2讀出關於第1參考電晶體Tr1
之選擇結果(步驟S14),設置測量第i放電時間di
之設定k=i(步驟S15),執行測量電容器5通過第k電晶體Mnk
放電時的第k放電時間dk
的子程式(步驟S16)。然後,控制裝置2將第i放電時間di作為第1參考放電時間dref1
寫入至運算單元9內之第1揮發性記錄介質10a中(步驟S17)。同樣地,控制裝置2讀出關於第2參考電晶體Tr2
之選擇結果(步驟S18),設置測量第j放電時間dj
之設定k=j(步驟S19),執行測量電容器5通過第k電晶體Mnk
放電時的第k放電時間dk
的子程式(步驟S20)。然後,控制裝置2將第j放電時間dj作為第2參考放電時間dref2
寫入至運算單元9內之第2揮發性記錄介質10b中(步驟S21)。Read control means 2 about the first reference transistor Tr selection result (step S14) of a provided measurement i-discharge time D i of the set k = i (Step S15), performs measuring
之後,運算單元9讀出第1參考放電時間dref1
與第2參考放電時間dref2
(步驟S22)。然後,運算單元9使用邏輯電路11來算出第1參考放電時間dref1
與第2參考放電時間dref2
的放電時間比dref1
/dref2
(步驟S23),產生數位信號並輸出(步驟S24)。另外,運算單元9亦可於算出放電時間比dref1
/dref2
後,讀出校正資料,基於放電時間比dref1
/dref2
及校正資料來算出絕對溫度並輸出。然後,判定是否結束(步驟S25),若為「是」,則結束溫度感測(END),若為「否」,則返回至步驟14。After that, the
揮發性記錄介質中記憶之資訊,若溫度感測結束則被抹除。因此,溫度感測器1每次開始溫度感測時會重複從步驟S1起之動作。
(測量放電時間之子程式)The information stored in the volatile recording medium will be erased if the temperature sensing ends. Therefore, the
圖4係表示圖3所示之測量電容器5通過第k電晶體Mnk
放電時的第k放電時間dk
的子程式(步驟S2、16、20)之一例的流程圖。4 is a flowchart showing an example of a subroutine (steps S2, 16, 20) of the k -th discharge time d k when the measuring
當開始子程式時(START),首先,開始充電(步驟S31)。步驟S31中,控制裝置2向切換部3發出指令,使得切換部3將全部開關元件設為開啟狀態,且將類比電晶體群Tr自電容器5切斷。切斷後,控制裝置2施加充電用電晶體6之閘極電壓,使得充電用電晶體6為通電狀態。然後,對於電容器5之兩端之電位差Vout
,判定是否Vout
=Vdd
(步驟S32)。若步驟S32中為「否」,則繼續充電,若為「是」,則結束充電(步驟S33)。步驟S33中,控制裝置2施加充電用電晶體6之閘極電壓,使得充電用電晶體6成為非通電狀態。When the subroutine is started (START), first, charging is started (step S31). In step S31, the
充電結束後,開始放電(步驟S34),同時,放電時間之測量亦開始(步驟S35)。步驟S34中,控制裝置2向切換部3發出指令,使得僅將第k電晶體Mnk
連接於電容器5,並保持其他電晶體與電容器5切斷之狀態。圖2所示之切換部3僅將第k開關元件Sk
設為關閉狀態,並保持其他開關元件為開啟狀態。步驟S35中,TDC8於Vout
<Vdd
間,測量從Vout
=Vdd
之時間點起的經過時間,對該經過時間進行數位轉換並繼續輸出。After the charging is completed, the discharge is started (step S34), and at the same time, the measurement of the discharge time is also started (step S35). In step S34, the
放電中,控制裝置2判定是否Vout
<Vc
(步驟S36)。Vc
係電容器5之電位差的給定閾值。若步驟S36中為「否」,則繼續放電。若為「是」,則判斷電容器5已充分放電,而結束放電(步驟S37)。同時,放電時間之測量亦結束(步驟S38)。步驟S37中,控制裝置2向切換部3發出指令,使得切換部3將全部開關元件設為開啟狀態。步驟S38中,獲取在該時間點從TDC8輸出之經過時間作為第k放電時間dk
。
(先前技術之溫度感測器)During discharging, the
先前技術之晶片上(on chip)型溫度感測器中利用各種測定原理。Various measurement principles are used in the on-chip temperature sensor of the prior art.
作為一例,有使用具有相同特性之雙極電晶體之帶隙型溫度感測器(非專利文獻3、4)。作為另一例,有利用具有相同特性之2個MOSFET之次臨界特性之溫度感測器(非專利文獻5、6)。然而,任一方式中,均無法實現低耗電且輸出值與溫度處於線性關係(PTAT, proportional-to-absolute-temperature)之晶片上型溫度感測器。As an example, there is a band gap type temperature sensor using bipolar transistors with the same characteristics (
而且,任一方式均需要具有相同特性之2個電晶體。製造電晶體時,會產生電晶體之特性偏差,且電晶體尺寸越小,該特性偏差越大。在製造電晶體後,難以準確地測定電晶體之特性。因此,先前技術中,以較可製造之最小尺寸大的尺寸來製造電晶體,藉此可減小電晶體之特性偏差。 (本發明之溫度感測器之測定原理)Moreover, either method requires two transistors with the same characteristics. When the transistor is manufactured, the characteristic deviation of the transistor will occur, and the smaller the size of the transistor, the greater the characteristic deviation. After manufacturing the transistor, it is difficult to accurately measure the characteristics of the transistor. Therefore, in the prior art, the transistor is manufactured in a size larger than the minimum size that can be manufactured, thereby reducing the characteristic deviation of the transistor. (The measuring principle of the temperature sensor of the present invention)
以下,對本發明之溫度感測器1之測定原理進行詳細說明。Hereinafter, the measurement principle of the
圖5係用以說明測定原理之電路圖。圖6係表示圖5所示之電路中之第1、2電晶體Mn1 、Mn2 之電壓電流特性的一例之曲線圖,更詳細而言,係表示汲極‐源極間電壓為固定情況下的閘極‐源極間電壓與汲極電流之關係之一例的圖。Figure 5 is a circuit diagram for explaining the principle of measurement. Fig. 6 is a graph showing an example of the voltage and current characteristics of the first and second transistors M n1 and M n2 in the circuit shown in Fig. 5. In more detail, it shows the case where the drain-source voltage is fixed The diagram below shows an example of the relationship between the voltage between the gate and the source and the drain current.
圖5所示之2個電路中,除第1電晶體Mn1
與第2電晶體Mn2
外均相同。電容器5施加至第1電晶體Mn1
之汲極‐源極間之電壓VDS1
係與電容器5施加至第2電晶體Mn2
之汲極‐源極間之電壓VDS2
相同。這2個電路能夠藉由切換部3僅將第1開關元件S1
或僅將第2開關元件S2
設為關閉狀態而實現。In the two circuits shown in Figure 5, except for the first transistor M n1 and the second transistor M n2 , they are all the same. The voltage V DS1 between the drain and the source of the
圖6所示之例中,第1電晶體Mn1 之閾值電壓Vth1 大於第2電晶體Mn2 之閾值電壓Vth2 。將較閾值電壓Vth1 、Vth2 小之偏置電壓Vb 施加至第1電晶體Mn1 之閘極源極間,將相同的偏置電壓Vb 施加至第2電晶體Mn2 之閘極源極間。此時,第1電晶體Mn1 中流動汲極電流I1 ,第2電晶體Mn2 中流動汲極電流I2 。該些汲極電流I1 、I2 係次臨界漏電流,且如圖6所示表示不同的值。近似地由下述式(1)、(2)表示。In the example shown in FIG. 6, the threshold voltage V th1 of the first transistor M n1 is greater than the threshold voltage V th2 of the second transistor M n2 . Apply a bias voltage V b smaller than the threshold voltages V th1 and V th2 between the gate and source of the first transistor M n1 , and apply the same bias voltage V b to the gate of the second transistor M n2 Between the source. At this time, the first transistor M n1 flowing drain current I 1, the second transistor M n2 flowing drain current I 2. The drain currents I 1 and I 2 are subcritical leakage currents, and they represent different values as shown in FIG. 6. It is approximately represented by the following equations (1) and (2).
[數1] [數2] 此處,T表示絕對溫度,K表示依存於製造製程之係數,n表示次臨界係數,k表示玻爾茲曼常數,q表示電荷量,λ1 、λ2 、α1 、α2 表示正係數,VDS1 表示第1電晶體Mn1 之汲極‐源極間電壓,VDS2 表示第2電晶體Mn2 之汲極‐源極間電壓。因VDS1 ≒VDS2 ,且λ1 、λ2 、α1 、α2 之偏差可忽視,故近似為α1 T-α2 T≒0、λ1 VDS1 -λ2 VDS2 =≒0。因此,T由下述式(3)近似。[Number 1] [Number 2] Here, T represents the absolute temperature, K represents the coefficient dependent on the manufacturing process, n represents the subcritical coefficient, k represents Boltzmann's constant, q represents the amount of charge, and λ 1 , λ 2 , α 1 , and α 2 represent positive coefficients , V DS1 represents the drain-source voltage of the first transistor M n1 , and V DS2 represents the drain-source voltage of the second transistor M n2 . Because V DS1 ≒ V DS2 , and the deviation of λ 1 , λ 2 , α 1 , and α 2 can be ignored, it is approximated as α 1 T-α 2 T≒0, λ 1 V DS1 -λ 2 V DS2 =≒0. Therefore, T is approximated by the following equation (3).
[數3] 根據式(3),可用不依存於偏置電壓Vb 之方式算出絕對溫度T。因閾值電壓Vth1 、Vth2 (第1特性)為第1電晶體Mn1 與第2電晶體Mn2 之特性值,故為常數。因此,絕對溫度T與汲極電流之比I2 /I1 的自然對數處於線性關係。此處,若適當地設定ΔVth =Vth1 -Vth2 ,則於任意溫度範圍內線性近似自然對數,藉此絕對溫度T可與汲極電流比I2 /I1 近似為線性關係。利用該線性關係,能夠不依存於偏置電壓Vb 地進行輸出值與溫度處於線性關係的溫度感測。[Number 3] According to equation (3), the absolute temperature T can be calculated without depending on the bias voltage V b. Since the threshold voltages V th1 and V th2 (first characteristic) are characteristic values of the first transistor M n1 and the second transistor M n2 , they are constants. Therefore, the natural logarithm of the ratio I 2 /I 1 of the absolute temperature T to the drain current is in a linear relationship. Here, if ΔV th =V th1 −V th2 is appropriately set, the natural logarithm can be linearly approximated in any temperature range, whereby the absolute temperature T can be approximately linearly related to the drain current ratio I 2 /I 1. Using this linear relationship, temperature sensing in which the output value and temperature are in a linear relationship can be performed independently of the bias voltage V b.
圖2所示之2個電路中,電容器5以相同的電源電壓Vdd
充電,第1電晶體Mn1
及第2電晶體Mn2
中被施加相同的偏置電壓Vb
。該情形時,下述式(4)近似地成立。In the two circuits shown in FIG. 2, the
[數4]
此處,d1
係指以包含第1電晶體Mn1
之電路(圖2之左側的電路),電容器5之輸出電壓Vout
減少至給定的閾值電壓Vc
所需之時間,d2
係指以包含第2電晶體Mn2
之電路(圖2之右側的電路),電容器5之輸出電壓Vout
減少至相同的給定閾值電壓Vc
所需之放電時間。[Number 4] Here, d 1 refers to the time required for the output voltage V out of the
因此,汲極電流比I2 /I1 可與絕對溫度近似為線性關係,因此放電時間比d1 /d2 亦可與絕對溫度近似為線性關係。由此,可藉由測定放電時間比d1 /d2 而進行溫度感測。 (電晶體之選出方法)Therefore, the drain current ratio I 2 /I 1 can be approximately linearly related to the absolute temperature, so the discharge time ratio d 1 /d 2 can also be approximately linearly related to the absolute temperature. Thus, temperature sensing can be performed by measuring the discharge time ratio d 1 /d 2. (How to select transistors)
如上所述,N個電晶體Tr之特性存在不可忽視之偏差。據報告,當在1個晶片製造許多個MOSFET時,該MOSFET的閾值電壓遵循由下述式(5)表示之常態分佈(統計分佈)(非專利文獻7)。該分佈之標準偏差σ根據皮爾格羅姆定律(Pelgrom’s Law)由下述式(6)求出(非專利文獻8)。As described above, the characteristics of the N transistors Tr have deviations that cannot be ignored. It is reported that when many MOSFETs are manufactured on one wafer, the threshold voltage of the MOSFETs follows a normal distribution (statistical distribution) represented by the following formula (5) (Non-Patent Document 7). The standard deviation σ of this distribution is calculated from the following equation (6) based on Pelgrom's Law (Non-Patent Document 8).
[數5] [數6] 此處,AVth 係依存於製造製程之參數,W係電晶體之閘極寬度之設計值,L係電晶體之閘極長度之設計值。因此,式(5)中之標準偏差σ係由製造製程及電晶體尺寸之設計所決定之常數值。[Number 5] [Number 6] Here, A Vth is a parameter that depends on the manufacturing process, the design value of the gate width of the W series transistor, and the design value of the gate length of the L series transistor. Therefore, the standard deviation σ in formula (5) is a constant value determined by the manufacturing process and the design of the transistor size.
因此,難以設定第1電晶體Mn1 之閾值電壓Vth1 及第2電晶體Mn2 之閾值電壓Vth2 以適當地獲得ΔVth =Vth1 -Vth2 。然而,可從第1電晶體Mn1 ~第N電晶體MnN 中選擇第1參考電晶體Tr1 與第2參考電晶體Tr2 ,以適當地獲得ΔVth =Vth , ref1 -Vth , ref2 。此處,Vth , ref1 係第1參考電晶體Tr1 之閾值電壓,Vth , ref2 係第2參考電晶體Tr2 之閾值電壓。Thus, it is difficult to set the first transistor M n1 threshold voltage V th1 of the second transistor M n2 of the threshold voltage V th2 to properly obtain ΔV th = V th1 -V th2. However, the first reference transistor Tr 1 and the second reference transistor Tr 2 can be selected from the first transistor Mn 1 to the N- th transistor Mn N to appropriately obtain ΔV th =V th , ref1 −V th , ref2 . Here, V th , ref1 are the threshold voltages of the first reference transistor Tr 1 , and V th , ref2 are the threshold voltages of the second reference transistor Tr 2 .
圖7係表示類比電晶體群Tr中之閾值電壓Vth 之偏差之圖。FIG. 7 is a diagram showing the deviation of the threshold voltage V th in the analog transistor group Tr.
如圖7所示,被排序之N個電晶體Mn之閾值電壓Vth 如上述般遵循常態分佈。因此,根據統計性的推定,第1參考電晶體Tr1 從開始便以下述式(7)所求出之比率的位次而存在。同樣地,第2參考電晶體Tr2 從開始便以下述式(8)所求出之比率的位次而存在。As shown in FIG. 7, the threshold voltage V th of the N transistors Mn that are sorted follows the normal distribution as described above. Therefore, based on statistical estimation, the first reference transistor Tr 1 has existed in the order of the ratio calculated by the following formula (7) from the beginning. Similarly, the second reference transistor Tr 2 has existed from the beginning in the order of the ratio calculated by the following formula (8).
[數7]
[數8]
上述步驟8中讀出之第1參考電晶體Tr1
之位次係由式(7)求出之位次,步驟S11中讀出之第2參考電晶體Tr2
之位次係由式(8)求出之位次。[Number 7] [Number 8] The order of the first reference transistor Tr 1 read in the
上述統計性推定係越接近常態分佈之中心,準確度越高。因此,參考閾值電壓Vth , ref1
、Vth , ref2
較佳為以其算術平均接近常態分佈之中心的方式被選擇。上述統計性推定係母數越多準確度越高。因此,較佳為N較大。N個電晶體Mn因與先前技術之感測器晶片中類比地進行動作之電晶體不同,是微細的,故即使N較大,亦可將溫度感測器1小型化。而且,這種統計性推定亦可以是例如β分佈及γ分佈等常態分佈以外的統計分佈。
(電晶體之排序方法)The above statistical inference system is closer to the center of the normal distribution, the higher the accuracy. Therefore, the reference threshold voltages V th , ref1 , V th , and ref2 are preferably selected in such a way that their arithmetic average is close to the center of the normal distribution. The greater the number of the above statistical presumptions, the higher the accuracy. Therefore, it is preferable that N is larger. Since the N transistors Mn are different from the transistors that operate analogously in the sensor chip of the prior art, they are fine. Therefore, even if N is large, the
上述子程式中流經第i電晶體Mni 之電流Ii 於Vc =0V之情況下,根據MOSFET之次臨界特性,近似地由下述式(9)表示。When the current I i flowing through the i-th transistor M ni in the above subroutine is at V c =0V, according to the subcritical characteristics of the MOSFET, it is approximately expressed by the following formula (9).
[數9] 此處,λi 、αi 表示正係數,Vthi 表示第i電晶體Mni 之閾值電壓,VDSi 表示第i電晶體Mni 之汲極‐源極間電壓。[Number 9] Here, λ i, α i denotes a positive coefficient, V thi i th represents the threshold voltage of the transistor M ni, V DSi is the i transistor M ni the drain - source voltage.
因此,閾值電壓Vthi 越大,電流Ii 越小。Therefore, the larger the threshold voltage V thi , the smaller the current I i.
若從N個電晶體Mn中比較第i電晶體Mni 與第j電晶體Mnj ,則近似地由下述式(10)表示之關係成立。Comparing the i-th transistor Mn i and the j-th transistor Mn j among N transistors Mn, the relationship approximately expressed by the following formula (10) holds.
[數10] 在Vc >0V之情況,放電時間比di /dj ≒Ij /Ii 之關係亦成立。因此,放電電流Ii 越小,放電時間di 越長。因此,上述步驟S7中,以放電時間(第2特性)按升序排列的方式將N個電晶體Mn排序,藉此以閾值電壓按升序排列的方式將N個電晶體Mn排序。[Number 10] In V c> 0V case, the discharge time ratio d i / d j ≒ I j / I i the relation is also established. Therefore, the discharge current I i, the longer the discharge time d i. Therefore, in the above step S7, the N transistors Mn are sorted in an ascending order of discharge time (the second characteristic), thereby sorting the N transistors Mn in an ascending order of threshold voltage.
而且,圖7之上側之圖表示相對於放電時間d之閾值電壓Vth 。這亦表示閾值電壓Vthk 越大,放電時間dk 越長。 (作用效果)In addition, the graph on the upper side of FIG. 7 shows the threshold voltage V th with respect to the discharge time d. This also means that the larger the threshold voltage V thk , the longer the discharge time d k. (Effect)
如上所述,本發明之溫度感測器1中,對類比電晶體群Tr所包含之N個電晶體Mn,以按放電時間d之升序或降序排列的方式排序(定序)。然後,基於閾值電壓Vth
之偏差的常態分佈及電晶體Mn之順序,使閾值電壓Vth
與電晶體Mn相對應。因此,可在晶片上推定各電晶體Mn的其他電晶體Mn所對應的閾值電壓Vth
之相對值。As described above, in the
本發明之溫度感測器1從類比電晶體群Tr所包含之N個電晶體Mn中,選擇第1參考電晶體Tr1
與第2參考電晶體Tr2
,以適當地獲得ΔVth
=Vth , ref1
-Vth , ref2
。藉此,可使溫度感測器1適當地動作。因此,無須測定電晶體Mn之閾值電壓Vth
,便可檢測出溫度資訊,因此無須增大溫度感測器1之面積,可抑制耗電及製造成本之增大。而且,不需要用以測定閾值電壓Vth之高性能的測定裝置。The
本發明之溫度感測器1不需要相同特性之複數個類比電晶體,且容許類比電晶體之特性發生偏差。因此,本發明之溫度感測器1中,可將類比電晶體微細化,因而溫度感測器1能夠節省電流地動作,從而能夠節省電力及小型化。The
本發明之溫度感測器1不需要參考電壓或參考電流。因此,本發明之溫度感測器1能夠節省電力及小型化。The
本發明之溫度感測器1不需要非揮發性記錄介質。因此,本發明之溫度感測器1能夠節省電力及小型化。The
本發明之溫度感測器1在每次進行溫度感測時,進行電晶體Mn之排序及參考電晶體Tr1
、Tr2
之選出。即使N個中的少數電晶體Mn劣化,N個電晶體Mn所遵循之分佈亦無實質變化。因此,本發明之溫度感測器1中,即使少數電晶體Mn劣化,亦可抑制溫度感測之精度劣化,能夠繼續維持作為溫度感測器1之功能。
〔實施形態2〕The
以下將說明本發明之其他實施形態。另外,為了方便說明,對具有與上述實施形態中所說明之構件相同功能之構件附上相同符號,且不再重複其說明。Hereinafter, other embodiments of the present invention will be described. In addition, for convenience of description, members having the same functions as those described in the above-mentioned embodiments are given the same reference numerals, and the description thereof will not be repeated.
圖12係表示本實施形態之切換部3的一構成例之電路圖。FIG. 12 is a circuit diagram showing an example of the configuration of the
如圖12所示,切換部3為樹型(tree type)。圖12示出由二元樹構成之例,亦可包含三元樹、四元樹、五元樹等二元樹以外的類型。如圖12所示,當由二元樹構成時,並聯連接於電容器5之寄生電容與log2
(N)成比例。因此,與以1段並聯連接有N個開關元件S之圖2所示的構成例(寄生電容N)相比,可減小寄生電容並縮短放電時間。As shown in FIG. 12, the
圖13表示圖12所示之切換部3之將第1電晶體Mn1
連接於電容器5時的等效電路。
(適當的閾值電壓差)FIG. 13 shows an equivalent circuit when the first transistor Mn 1 is connected to the
如上所述,絕對溫度T由下述式(11)近似地表示。As described above, the absolute temperature T is approximately expressed by the following formula (11).
[數11] 因這是近似的,故較佳為以使近似誤差小的方式決定閾值電壓差ΔVth (第1特性)。[Number 11] Since this is an approximation, it is preferable to determine the threshold voltage difference ΔV th (first characteristic) so that the approximation error is small.
作為一例,模擬中之圖1所示之電路中,將切換部3設為圖12所示之構成,使ΔVth
以2mV為單位在-80mV到-60mV之間變化,且於0~100℃之範圍內,求出第1參考電晶體Tr1
之放電時間d1
與第2參考電晶體Tr2
之放電時間d2
的放電時間比d1
/d2
。圖8示出該模擬結果。As an example, in the circuit shown in Fig. 1 in the simulation, the
根據圖8所示之模擬結果,算出調整過自由度的決定係數(Adjust-R2 )。調整過自由度的決定係數為評估直線性之值。調整過自由度的決定係數越接近1,放電時間比d1 /d2 與溫度T之關係的直線性越高。圖9示出該調整過自由度的決定係數。According to the simulation results shown in Figure 8, the coefficient of determination (Adjust-R 2 ) of the adjusted degrees of freedom is calculated. The coefficient of determination of the adjusted degrees of freedom is the value for evaluating the linearity. The closer the coefficient of determination of the adjusted degree of freedom is to 1, the higher the linearity of the relationship between the discharge time ratio d 1 /d 2 and the temperature T is. Fig. 9 shows the coefficient of determination of the adjusted degree of freedom.
如圖9所示,當ΔVth =-64mV時,直線性最接近1。因此,ΔVth =-64mV為最佳閾值電壓差。 (誤差之評估)As shown in Fig. 9, when ΔV th = -64mV, the linearity is closest to 1. Therefore, ΔV th = -64mV is the optimal threshold voltage difference. (Evaluation of error)
上述模擬例中,對設定為ΔVth =-64mV之情況之測定誤差進行評估。In the above simulation example, the measurement error in the case where ΔV th =-64mV is set is evaluated.
將圖1所示之類比電晶體群Tr設為N=1024,並隨機產生10次。然後,執行步驟S1~S13,獲得10組參考閾值電壓之組(Vth , ref1 ,Vth , ref2 )。需留意,於該時間點,各組中均產生Vth , ref1 -Vth , ref2 ≠-64mV之誤差。Set the analog transistor group Tr shown in Fig. 1 to N=1024, and randomly generate 10 times. Then, steps S1 to S13 are executed to obtain 10 sets of reference threshold voltages (V th , ref1 , V th , ref2 ). It should be noted that at this point in time, errors of V th , ref1- V th , ref2 ≠ -64mV occurred in each group.
使用該10組參考閾值電壓的組合,於0~100℃之範圍內測定放電時間比d1 /d2 。圖10示出該測定結果。Using the combination of the 10 sets of reference threshold voltages, the discharge time ratio d 1 /d 2 was measured in the range of 0-100°C. Fig. 10 shows the results of this measurement.
於20℃與80℃這2點校正圖10所示之測定結果,藉此算出溫度。圖11示出該算出溫度之誤差。The temperature is calculated by calibrating the measurement results shown in Fig. 10 at two points of 20°C and 80°C. Fig. 11 shows the error of the calculated temperature.
如圖11所示,即使在最壞之情形時,誤差亦為±1.2℃以內。As shown in Figure 11, even in the worst case, the error is within ±1.2°C.
另外,為了減小該誤差,增大N即可。容許誤差所需的N之大小,由本領域中具有通常知識者基於統計性推論而適當地決定。 〔實施形態3〕In addition, in order to reduce this error, it is sufficient to increase N. The size of N required for the allowable error is appropriately determined by a person with ordinary knowledge in the field based on statistical inferences. [Embodiment 3]
以下將說明本發明之其他實施形態。另外,為了方便說明,對具有與上述實施形態所說明之構件相同功能的構件附上相同符號,且不再重複其說明。Hereinafter, other embodiments of the present invention will be described. In addition, for convenience of description, members having the same functions as those described in the above-mentioned embodiments are given the same reference numerals, and the description thereof will not be repeated.
圖14係表示本實施形態之快閃型ADC20(類比裝置、AD轉換器)之概略構成之電路圖。FIG. 14 is a circuit diagram showing the schematic configuration of the flash ADC 20 (analog device, AD converter) of this embodiment.
如圖14所示,ADC20包含取樣保持電路21、比較器群22、開關矩陣23、編碼器24、電壓測定電路25、控制裝置26、及開關元件群27。As shown in FIG. 14, the
取樣保持電路21保持輸入電壓Vin
。所保持之輸入電壓Vin
施加至比較器群22。The sample-and-
比較器群22包含M個比較器Cp(第1比較器Cp1
~第M比較器CpM
),各比較器Cp包含複數個微細的MOSFET。各比較器Cp中,2個輸入端子之一者連接於取樣保持電路21,另一者接地。各比較器Cp中,輸出端子連接於開關矩陣23,並且經由開關元件群27連接於電壓測定電路25。而且,各比較器Cp中,基於來自控制裝置26之構成信號切換電路構成。另外,比較器Cp之詳細情況將在後面敘述。The
開關矩陣23基於來自控制裝置26之開關信號,從來自比較器群22之M個輸入信號中選擇N-1個(N為小於M之自然數),重新排列後輸出至編碼器24。The
編碼器24將來自開關矩陣23之N個輸入信號編碼後輸出。具體來說,編碼器24針對N-1個輸入信號檢測0與1之邊界,並基於該檢測結果進行編碼。The
電壓測定電路25測定各比較器Cp之輸出電壓。電壓測定電路25將測定結果通知給控制裝置26。The
控制裝置26控制ADC20之動作。具體而言,控制裝置26從電壓測定電路25輸入有各比較器Cp之輸出電壓。控制裝置26構成為控制各比較器Cp、開關矩陣23及開關元件群27中之電路構成。
(ADC之動作)The
圖15係表示圖14所示之ADC20之動作例之流程圖。FIG. 15 is a flowchart showing an example of the operation of the
若接通電源,控制裝置26從初始設定i=0開始動作(步驟S41)。控制裝置26首先選擇第i比較器(comparator)(步驟S42),如以下般測定並記錄與偏置電壓對應之電壓(步驟S43)。因此,控制裝置26將開關元件群27控制為關閉狀態。When the power is turned on, the
圖16係表示比較器Cp之一構成例之電路圖。本實施形態之比較器Cp與先前之快閃型ADC中使用之比較器之不同之處在於,新設置有開關元件S1 ~S3 ,其他構成相同。Fig. 16 is a circuit diagram showing a configuration example of the comparator Cp. The difference between the comparator Cp of this embodiment and the comparator used in the previous flash ADC is that the switching elements S 1 to S 3 are newly provided, and the other structures are the same.
開關元件S1
~S3
藉由控制裝置26控制。開關元件S1
設置於被輸入有輸入電壓Vin
之FET32之閘極端子與電源電壓Vdd
之間。開關元件S2
設置於被輸入有基準電壓Vref
之FET33之閘極端子與電源電壓Vdd
之間。開關元件S3
設置於輸出端子Vout +
、Vout -
之間。輸出端子Vout +
、Vout -
連接於電壓測定電路25。The switching elements S 1 to S 3 are controlled by the
上述構成之比較器Cp中,若將開關元件S1
設為開啟狀態,將開關元件S2
、S3
設為關閉狀態,則於FET33、35流動電流。此時,電壓測定電路25測定之電壓(以下,稱作第1測定電壓)成為上述電流之函數,且呈現出FET33、35之特性。In the comparator Cp configured as described above, when the switching element S 1 is turned on and the switching elements S 2 and S 3 are turned off, current flows through the
接下來,若將開關元件S2
設為開啟狀態,將開關元件S1
、S3
設為關閉狀態,則於FET32、34流動電流。此時,電壓測定電路25測定之電壓(以下,稱作第2測定電壓)成為上述電流之函數,呈現出FET32、34之特性。因此,第1測定電壓及第2測定電壓之差成為比較器Cp之偏置電壓所對應的電壓。另外,AD轉換動作時,開關元件S1
~S3
維持開啟狀態。Next, when the switching element S 2 is set to the on state, and the switching elements S 1 and S 3 are set to the off state, current flows through the
參考圖15,控制裝置26將i增加1(步驟S44),且判定是否滿足i<M(步驟S45)。若步驟S45中為「是」,則返回至步驟S42。15, the
若步驟S45中為「否」,則控制裝置26將開關元件群27控制為開啟狀態,另一方面,以所記錄之上述電壓按升序(或者降序)排列的方式,將第1比較器Cp1
~第M比較器CpM
排序(步驟S46)。亦即,控制裝置2根據上述電壓之升序(或者降序),將第1比較器Cp1
~第M比較器CpM
定序。If “No” in step S45, the
接下來,控制裝置26如以下般從M個比較器Cp中選擇N-1個比較器Cp(步驟S47)。Next, the
圖17係表示比較器Cp之偏置電壓的分佈之曲線圖。比較器Cp因由複數個電晶體構成,故其偏置電壓如圖17所示般遵循常態分佈。因此,可使已排序之第1比較器Cp1
~第M比較器CpM
與遵循常態分佈之偏置電壓之值相對應。結果,控制裝置26可選擇與具有特定電壓間隔之N-1個偏置電壓Voffset1
~VoffsetN - 1
對應之N-1個比較器Cp。另外,N依存於編碼器24之輸出信號之位元數n,為N=2n
。Fig. 17 is a graph showing the distribution of the bias voltage of the comparator Cp. Since the comparator Cp is composed of a plurality of transistors, its bias voltage follows a normal distribution as shown in FIG. 17. Therefore, the sorted first comparator Cp 1 ˜M-th comparator Cp M can be made to correspond to the value of the bias voltage following the normal distribution. As a result, the
接下來,控制裝置26決定所選擇之比較器Cp與非選擇之比較器Cp之構成,產生表示所決定之構成的構成信號並發送至比較器群22(步驟S48)。該情形時,可藉由停止非選擇之比較器Cp之動作而減少耗電。Next, the
接下來,控制裝置26以所選擇之比較器Cp的輸出信號按偏置電壓Voffset1
~VoffsetN - 1
之順序排列的方式,產生開關信號並發送至開關矩陣23(步驟S49)。藉此,完成了將類比之輸入電壓Vin
進行AD轉換為n位元之數位信號的準備,故開始上述AD轉換之動作。
(作用效果)Next, the
如上所述,本實施形態之ADC20中,與非專利文獻1、2同樣地,利用偏置電壓遵循常態分佈這一點,不將參考電壓供給至比較器Cp,而是取而代之地,利用偏置電壓。因此,無須增大比較器之面積,可抑制耗電及製造成本之增大。As described above, in the
進而,本實施形態之ADC20中,根據比較器Cp所包含之複數個FET之一部分動作停止之情況下之第1測定電壓(輸出電壓)與複數個FET之另一部分動作停止之情況下之第2測定電壓之差,將比較器Cp定序。然後,基於偏置電壓之常態分佈及比較器Cp之順序,使偏置電壓之值與比較器Cp相對應。因此,可推定各比較器Cp之偏置電壓。結果,不需要用以測定上述偏置電壓之高性能的測定裝置。Furthermore, in the
藉此,可自M個比較器Cp中利用N-1個比較器Cp,藉由開關矩陣23使N-1個比較器Cp之輸出信號按偏置電壓之順序重新排列,藉由編碼器24適當地輸出n位元之數位信號。因此,與非專利文獻1、2之ADC相比,本實施形態之ADC20追加開關矩陣23,另一方面,不需要利用許多個加法器之華萊士(Wallace)樹型解碼器。開關矩陣23可由複數個開關元件構成,因此,與非專利文獻1、2之華萊士樹型解碼器相比,本實施形態之開關矩陣23及編碼器24可抑制電路規模。
〔實施例1〕Thereby, N-1 comparators Cp can be used from the M comparators Cp, and the output signals of the N-1 comparators Cp can be rearranged in the order of the bias voltage by the
藉由模擬對本實施形態之ADC20之輸入輸出特性及DNL(微分非線性誤差,Differential Non-Linearity)進行性能評估。在以下條件下進行模擬。
・比較器Cp具有偏置電壓。
・比較器Cp之偏置電壓遵循期望值μ=0mV、標準偏差σ=90mV之常態分佈。
・輸入電壓Vin
設為-90mV≦Vin
≦90mV之範圍。
・輸出設為6位元。The performance evaluation of the input and output characteristics and DNL (Differential Non-Linearity) of the
上述DNL被用作ADC之性能評估中使用之指標。使用輸出碼為i時之輸入電壓Vi、及以ADC為理想時之輸入寬度VLSB‐ideal =Vref /2N ,DNL由下式(12)表示。The above-mentioned DNL is used as the index used in the performance evaluation of ADC. Used when the output code of the input voltage i Vi, and V LSB-ideal input width when the ADC is over in = V ref / 2 N, DNL is represented by the formula (12).
DNL[i]={(Vi + 1 -Vi )/(VLSB‐ideal )}-1 (0<i<2N -1) (12)。DNL[i]={(V i + 1 -V i )/(V LSB-ideal )} -1 (0<i<2 N -1) (12).
亦即,DNL表示某個輸出碼之步寬的理想值與實測值之差,單位由LSB(Least Significant Bit)表示,且用能夠檢測實際電壓值之最小電壓值VLSB‐ideal 進行標準化。 (輸入輸出特性)That is, DNL represents the difference between the ideal value of the step width of a certain output code and the actual measured value, and the unit is expressed by LSB (Least Significant Bit), and is standardized with the minimum voltage value V LSB-ideal that can detect the actual voltage value. (Input and output characteristics)
模擬中,產生M=5000個比較器作為總體,並選出26 -1=63個比較器Cp(N=64,n=6)。對所選出之比較器Cp,使用圖14所示之ADC20,算出0~63之輸出碼中之DNL。將其結果表示於圖18。In the simulation, M=5000 comparators are generated as a whole, and 2 6 -1=63 comparators Cp (N=64, n=6) are selected. For the selected comparator Cp, use the ADC20 shown in Figure 14 to calculate the DNL in the output code from 0 to 63. The results are shown in Fig. 18.
圖18係表示輸出碼與DNL之關係之曲線圖。若參考圖18,則本實施例中,滿足-0.3<DNL<+0.3。因此,可理解ADC20良好地發揮功能。
(比較器之母數)Figure 18 is a graph showing the relationship between the output code and DNL. Referring to FIG. 18, in this embodiment, -0.3<DNL<+0.3 is satisfied. Therefore, it can be understood that the
而且,對於各母數(1000、2000、3000、4000、5000、7000、10000),每300次執行DNL,調查比較器Cp之母數與DNL之關係。將其結果表示於圖19。In addition, for each mother number (1000, 2000, 3000, 4000, 5000, 7000, 10000), DNL is executed every 300 times, and the relationship between the mother number of the comparator Cp and the DNL is investigated. The results are shown in Fig. 19.
圖19係表示母數與DLN之關係之曲線圖。圖19中,以±3σ評估DNL之最大值與最小值。當DNL之絕對值為1以上時,會出現遺漏碼(missing code),因此要求滿足-1<DNL<+1。參考圖19,可以理解,若母數為3000以上,則滿足-1<DNL<1,不會出現遺漏碼。 (比較器之偏置電壓)Figure 19 is a graph showing the relationship between the number of mothers and DLN. In Figure 19, the maximum and minimum values of DNL are evaluated with ±3σ. When the absolute value of DNL is more than 1, a missing code will appear, so it is required to satisfy -1<DNL<+1. Referring to FIG. 19, it can be understood that if the number of mothers is more than 3000, -1<DNL<1 is satisfied, and no missing codes will appear. (Bias voltage of comparator)
圖20係表示本實施例中之比較器Cp之概略構成之電路圖。關於圖20所示之比較器Cp,使電晶體MP3之閾值電壓ΔVthp3 發生變化,利用HSPICE分析偏置電壓Voffset 之變化。將其分析結果表示於圖21。另外,分析條件如以下般設定。 ・Vref =0 ・Vin 之振幅:1mV ・CLK頻率:1GHz ・電晶體(MOSFET)之尺寸:L=65nm,W=140nm ・閾值電壓之範圍:ΔVthp3 =±40mV。FIG. 20 is a circuit diagram showing the schematic configuration of the comparator Cp in this embodiment. Regarding the comparator Cp shown in FIG. 20, the threshold voltage ΔV thp3 of the transistor MP3 is changed, and the change in the offset voltage V offset is analyzed by HSPICE. The analysis results are shown in Fig. 21. In addition, the analysis conditions are set as follows.・V ref =0 ・V in amplitude: 1mV ・CLK frequency: 1GHz ・Transistor (MOSFET) size: L=65nm, W=140nm ・Threshold voltage range: ΔV thp3 =±40mV.
圖21係表示閾值電壓ΔVthp3 與偏置電壓Voffset 的關係之曲線圖。若參考圖21,則能夠理解閾值電壓ΔVthp3 與偏置電壓Voffset 大致處於線性關係。因此,認為若電晶體MP3之閾值電壓之偏差遵循常態分佈,則偏置電壓亦遵循常態分佈。而且,預想若其他的電晶體之閾值電壓之偏差遵循常態分佈,則偏置電壓亦遵循常態分佈。 (比較器之必要數)FIG. 21 is a graph showing the relationship between the threshold voltage ΔV thp3 and the offset voltage V offset. If referring to FIG. 21, it can be understood that the threshold voltage ΔV thp3 and the offset voltage V offset are approximately in a linear relationship. Therefore, it is considered that if the deviation of the threshold voltage of the transistor MP3 follows the normal distribution, the bias voltage also follows the normal distribution. Moreover, it is expected that if the deviation of the threshold voltage of other transistors follows the normal distribution, the bias voltage also follows the normal distribution. (Necessary number of comparators)
參考圖17,可理解為第1偏置電壓Voffset1 及第N-1偏置電壓VoffsetN - 1 之機率密度最小。某比較器Cp進入第N-1偏置電壓VoffsetN - 1 之誤差之位置及容許範圍(2σ±0.1σ)內的概率由下式(13)表示。Referring to Figure 17, it is understood as a first bias voltage V offset1 N-1 and the second bias voltage V offsetN - a minimum density of probability. A comparator Cp N-1 enters the first bias voltage V offsetN - Probability of 1 and the position error of the allowable range (2σ ± 0.1σ) represented by the following formula (13).
[數12] 而且,以95%之概率在上述容許範圍內包含至少1個比較器Cp之必要數N的條件為N≧4/P。另外,第1偏置電壓Voffset1 之情形亦相同。[Number 12] Furthermore, the condition that the necessary number N of at least one comparator Cp is included within the above allowable range with a probability of 95% is N≧4/P. In addition, the same applies to the first offset voltage V offset1.
上述式(13)所示之概率依存於標準偏差σ,且依存於誤差之位置及容許範圍。因此,類比元件之必要數N可能依存於作為對象之類比裝置而大不相同。 〔實施例2〕The probability shown in the above formula (13) depends on the standard deviation σ, and also depends on the position of the error and the allowable range. Therefore, the necessary number N of analog components may vary greatly depending on the target analog device. [Example 2]
圖22係以垂直線條表示本實施例之ADC中之比較器Cp之偏置電壓的分佈之曲線圖。FIG. 22 is a graph showing the distribution of the bias voltage of the comparator Cp in the ADC of this embodiment with vertical lines.
藉由模擬對本實施形態之ADC20之輸入輸出特性、DNL及INL(積分非線性誤差,Integral Non-Linearity)進行性能評估。模擬按照以下之條件進行。
・比較器Cp具有偏置電壓。
・比較器Cp之偏置電壓如後述般遵循藉由蒙特卡羅分析(Monte Carlo analysis)所得之分佈函數。
・輸入電壓Vin
設為-90mV≦Vin
≦90mV之範圍。
・輸出設為6位元。The performance evaluation of the input and output characteristics, DNL and INL (Integral Non-Linearity) of the
關於比較器Cp之偏置電壓,比較器Cp之偏置電壓遵循如以下方式獲得之分佈函數。於60nm製程中製作5000個相同構成之比較器Cp,測定各比較器Cp之偏置電壓。然後,藉由蒙特卡羅分析,獲得前述比較器Cp之偏置電壓之分佈函數。因此,模擬中,從藉由蒙特卡羅分析所得之分佈函數中隨機地選擇比較器Cp之偏置電壓。Regarding the bias voltage of the comparator Cp, the bias voltage of the comparator Cp follows the distribution function obtained as follows. 5,000 comparators Cp of the same configuration were fabricated in a 60nm manufacturing process, and the bias voltage of each comparator Cp was measured. Then, by Monte Carlo analysis, the distribution function of the bias voltage of the aforementioned comparator Cp is obtained. Therefore, in the simulation, the bias voltage of the comparator Cp is randomly selected from the distribution function obtained by Monte Carlo analysis.
上述INL係被用作ADC之性能評估中所使用之另一個指標。使用輸出碼為i時的輸入電壓Vi 、及以ADC為理想時之輸入寬度VLSB‐ideal =Vref /2N ,INL由下式(14)表示。The above-mentioned INL is used as another indicator used in the performance evaluation of the ADC. Using the output code when the input voltage V i of i, and input to the ADC is over the width of the V LSB-ideal = V ref / 2 N, INL represented by the following formula (14).
INL[i]={(Vi + 1 -V0 )/(VLSB‐ideal )}-i (0<i<2N ) (14)。INL[i]={(V i + 1 -V 0 )/(V LSB-ideal )}-i (0<i<2 N ) (14).
亦即,INL表示某個輸出碼的理想輸入閾值與實測輸入閾值之差,單位由LSB表示,由能夠檢測實際電壓值之最小電壓值VLSB‐ideal 進行標準化。That is, INL represents the difference between the ideal input threshold of a certain output code and the measured input threshold. The unit is represented by LSB, and it is standardized by the minimum voltage value V LSB-ideal that can detect the actual voltage value.
當遵循期望值μ=0mV、標準偏差σ=90mV之常態分佈時,ADC20之輸入輸出特性理論上滿足-0.47<DNL<+0.53及-1.23<INL<+1.24。When following the normal distribution of expected value μ=0mV and standard deviation σ=90mV, the input and output characteristics of ADC20 theoretically satisfy -0.47<DNL<+0.53 and -1.23<INL<+1.24.
首先,假設圖22所示之本實施例2之比較器Cp的偏置電壓之分佈遵循常態分佈,將偏置電壓作為AD轉換之基準進行利用。該AD轉換之結果為,ADC20之輸入輸出特性滿足-0.49<DNL<+0.80及-1.85<INL<+0.44。該結果比理論預測差。因此,推定本實施例2之比較器Cp的偏置電壓是遵循與上述常態分佈相比發生了變形之分佈。例如,有時會因電晶體特性之非線性等,上述偏置電壓偏離常態分佈。First, assume that the distribution of the bias voltage of the comparator Cp of the second embodiment shown in FIG. 22 follows the normal distribution, and the bias voltage is used as a reference for AD conversion. As a result of the AD conversion, the input and output characteristics of ADC20 satisfy -0.49<DNL<+0.80 and -1.85<INL<+0.44. The result is worse than the theoretical prediction. Therefore, it is estimated that the bias voltage of the comparator Cp of the second embodiment follows a distribution that is deformed compared to the above-mentioned normal distribution. For example, sometimes the above-mentioned bias voltage deviates from the normal distribution due to the nonlinearity of the transistor characteristics.
接下來,求出與圖22所示之分佈適配(fit)之β分佈。β分佈可表現不對稱之統計分佈。圖22中以曲線示出所求出之適配的β分佈。Next, find the β distribution that fits the distribution shown in Fig. 22. The beta distribution can show an asymmetric statistical distribution. Fig. 22 shows the calculated beta distribution as a curve.
而且,假設本實施例2之比較器Cp之偏置電壓遵循上述β分佈,將偏置電壓作為AD轉換之基準進行利用。該AD轉換之結果為,ADC20之輸入輸出特性滿足-0.62<DNL<+0.61及-0.44<INL<+1.41。該結果較利用了常態分佈時之結果有所改善。因此,比起利用常態分佈,利用β分佈可進一步改善ADC20之輸入輸出特性。Furthermore, assuming that the bias voltage of the comparator Cp of the second embodiment follows the above-mentioned β distribution, the bias voltage is used as a reference for AD conversion. As a result of the AD conversion, the input and output characteristics of the
因此,可理解,控制裝置26藉由選擇並利用各種統計分佈中之最適之統計分佈,而發揮ADC20之最佳性能。
(附記事項)Therefore, it can be understood that the
另外,上述實施形態中,電壓測定電路25及控制裝置26係設置於ADC20之內部,但也可設置於ADC20之外部。
〔藉由軟體實現之例〕In addition, in the above embodiment, the
溫度感測器1及ADC20之控制區塊(尤其控制裝置2、26)可由形成於積體電路(IC晶片)等的邏輯電路(硬體)實現,亦可由軟體實現。The control blocks of the
於後者之情形時,溫度感測器1具備執行實現各功能之軟體即程式的命令之電腦。該電腦例如具備1個以上之處理器,並且具備記憶有上述程式之電腦可讀取之記錄介質。而且,上述電腦中,上述處理器從上述記錄介質讀取上述程式並執行,藉此達成本發明之目的。作為上述處理器,例如可使用CPU(Central Processing Unit)。作為上述記錄介質,可使用「非暫時的有形介質」,例如,ROM(Read Only Memory)等之外,亦可使用磁帶、碟片、卡、半導體記憶體、可程式化邏輯電路等。而且,亦可進而具備擴展上述程式之RAM(Random Access Memory)等。而且,上述程式可經由能夠傳輸該程式之任意的傳輸介質(通信網路或廣播等)供給至上述電腦。另外,本發明之一態樣亦能夠以上述程式由電子傳輸而實施之嵌入於載波之資料信號的形態而實現。In the latter case, the
本發明不限於上述各實施形態,可在請求項所示之範圍內進行各種變更,關於將不同實施形態中分別揭示之技術手段適當組合而獲得的實施形態亦包含於本發明之技術範圍內。The present invention is not limited to the above-mentioned embodiments, and various modifications can be made within the scope shown in the claims. Embodiments obtained by appropriately combining the technical means disclosed in different embodiments are also included in the technical scope of the present invention.
例如,亦可藉由設置於IC晶片之外之控制裝置,來使具備設置於IC晶片之複數個類比元件之類比裝置,進行第1特性之值與類比元件相對應之控制。該情形時,亦不需要高性能之測定設備。For example, a control device provided outside the IC chip can be used to make an analog device equipped with a plurality of analog elements provided on the IC chip to control the value of the first characteristic corresponding to the analog element. In this case, there is no need for high-performance measuring equipment.
1:溫度感測器(類比裝置、類比元件對應系統) 2:控制裝置 3:切換部 4:偏壓產生電路 5:電容器 6:充電用電晶體 7:反轉放大器 8:TDC(測定裝置) 9:運算單元 10a、10b:揮發性記錄介質 11:邏輯電路 20:ADC(類比裝置、類比元件對應系統) 21:取樣保持電路 22:比較器群(複數個類比元件) 23:開關矩陣 24:編碼器 25:電壓測定電路(測定裝置) 26:控制裝置 27:開關元件群 32,33,34,35:FET Adjust-R2 :調整過自由度的決定係數 Clock:時脈信號 Cp1 ~CpM :第1比較器~第M比較器 d1 :第1參考電晶體之放電時間 d2 :第2參考電晶體之放電時間 I1 ,I2 :汲極電流 Ii :電流 Mn1 ,Mn1 :第1電晶體 Mn2 ,Mn2 :第2電晶體 Mni ,Mni :第i電晶體 Mnj :第j電晶體 MnN :第N電晶體 MP3:電晶體 S1 ~SN :第1開關元件~第N開關元件 Tr:電晶體群(複數個類比元件) Vb :偏置電壓 Vdd :電源電壓 Vin :輸入電壓 Vref :基準電壓 Vth1 ,Vth2 , ΔVthp3 :閾值電壓 Vth , ref1 :第1參考電晶體之閾值電壓 Vth , ref2 :第2參考電晶體之閾值電壓 Voffset ,Voffset1 ~VoffsetN - 1 :偏置電壓 Vout :輸出電壓 Vout + ,Vout - :輸出端子1: Temperature sensor (analog device, analog device corresponding system) 2: Control device 3: Switching section 4: Bias voltage generating circuit 5: Capacitor 6: Charging transistor 7: Inverting amplifier 8: TDC (measuring device) 9: Operation unit 10a, 10b: Volatile recording medium 11: Logic circuit 20: ADC (analog device, analog component corresponding system) 21: Sample and hold circuit 22: Comparator group (plural analog components) 23: Switch matrix 24: Encoder 25: Voltage measurement circuit (measuring device) 26: Control device 27: Switching element group 32, 33, 34, 35: FET Adjust-R 2 : Adjusting the coefficient of determination of the degree of freedom Clock: Clock signal Cp 1 ~Cp M : the first comparator ~ the M- th comparator d 1 : the discharge time of the first reference transistor d 2 : the discharge time of the second reference transistor I 1 , I 2 : the drain current I i: the current Mn 1 , M n1: a first transistor Mn 2, M n2: the second transistor Mn i, M ni: i-th transistor Mn j: j-th transistor Mn N: N-transistor MP3: transistor S 1 ~ S N: first to N-th switching element switching element Tr: transistor group (a plurality of analog elements) V b: bias voltage V dd: voltage supply V in: input voltage V ref: reference voltage V th1, V th2, ΔV thp3 : the threshold voltage V th, ref1: threshold first reference transistor's threshold voltage V th, ref2: the threshold of the second reference transistor's threshold voltage V offset, V offset1 ~ V offsetN - 1: bias voltage V out: output voltage V out + ,V out - : output terminal
圖1係表示本發明之一實施形態之溫度感測器的概略構成之電路圖。 圖2係表示上述溫度感測器中之切換部的一構成例之電路圖。 圖3係表示上述溫度感測器的動作例之流程圖。 圖4係表示上述流程所包含之子程式(subroutine)的一例之流程圖。 圖5係用以說明上述溫度感測器的測定原理之電路圖。 圖6係表示第1、2電晶體之電壓電流特性的一例之曲線圖。 圖7係表示上述溫度感測器之類比電晶體群中之閾值電壓的偏差之圖。 圖8係表示本發明之另一實施形態之溫度感測器中之溫度與放電時間比的對應關係之曲線圖。 圖9係表示上述溫度感測器中之電晶體之閾值電壓差與調整過自由度的決定係數之關係之曲線圖。 圖10係表示上述溫度感測器中之溫度與放電時間比的對應關係之曲線圖。 圖11係表示上述溫度感測器中之算出溫度的誤差之曲線圖。 圖12係表示上述溫度感測器中之切換部的一構成例之電路圖。 圖13係表示上述切換部中將第1電晶體連接於電容器時之等效電路。 圖14係表示本發明之其他實施形態之快閃型ADC的概略構成之電路圖。 圖15係表示上述ADC的動作例之流程圖。 圖16係表示上述ADC中之比較器的一構成例之電路圖。 圖17係表示上述比較器之偏置電壓的分佈之曲線圖。 圖18係表示上述ADC之一實施例中之輸出碼與DNL的關係之曲線圖。 圖19係表示上述實施例中之母數與DLN的關係之曲線圖。 圖20係表示上述實施例中之比較器的概略構成之電路圖。 圖21係表示上述比較器中之電晶體之閾值電壓與上述比較器之偏置電壓的關係之曲線圖。 圖22係以垂直線條(vertical bar)表示上述ADC之一實施例中之比較器之偏置電壓的分佈之曲線圖。Fig. 1 is a circuit diagram showing a schematic configuration of a temperature sensor according to an embodiment of the present invention. Fig. 2 is a circuit diagram showing a configuration example of a switching unit in the above-mentioned temperature sensor. Fig. 3 is a flowchart showing an example of the operation of the above-mentioned temperature sensor. Fig. 4 is a flowchart showing an example of a subroutine included in the above process. Fig. 5 is a circuit diagram for explaining the measuring principle of the above-mentioned temperature sensor. Fig. 6 is a graph showing an example of the voltage and current characteristics of the first and second transistors. FIG. 7 is a diagram showing the deviation of the threshold voltage in the analog transistor group of the above-mentioned temperature sensor. FIG. 8 is a graph showing the corresponding relationship between the temperature and the discharge time ratio in the temperature sensor of another embodiment of the present invention. FIG. 9 is a graph showing the relationship between the threshold voltage difference of the transistor in the temperature sensor and the determination coefficient of the adjusted degree of freedom. Fig. 10 is a graph showing the corresponding relationship between the temperature in the temperature sensor and the discharge time ratio. Fig. 11 is a graph showing the error of the calculated temperature in the above-mentioned temperature sensor. Fig. 12 is a circuit diagram showing a configuration example of the switching unit in the above-mentioned temperature sensor. Fig. 13 shows an equivalent circuit when the first transistor is connected to the capacitor in the above-mentioned switching section. Fig. 14 is a circuit diagram showing a schematic configuration of a flash ADC according to another embodiment of the present invention. Fig. 15 is a flowchart showing an example of the operation of the above-mentioned ADC. Fig. 16 is a circuit diagram showing a configuration example of the comparator in the ADC. Fig. 17 is a graph showing the distribution of the bias voltage of the above-mentioned comparator. Fig. 18 is a graph showing the relationship between the output code and DNL in an embodiment of the above-mentioned ADC. Fig. 19 is a graph showing the relationship between the mother number and DLN in the above embodiment. Fig. 20 is a circuit diagram showing the schematic configuration of the comparator in the above-mentioned embodiment. FIG. 21 is a graph showing the relationship between the threshold voltage of the transistor in the comparator and the bias voltage of the comparator. FIG. 22 is a graph showing the distribution of the bias voltage of the comparator in an embodiment of the above-mentioned ADC with vertical bars.
無no
1:溫度感測器(類比裝置、類比元件對應系統) 1: Temperature sensor (analog device, analog component corresponding system)
2:控制裝置 2: control device
3:切換部 3: Switching part
4:偏壓產生電路 4: Bias voltage generating circuit
5:電容器 5: Capacitor
6:充電用電晶體 6: Transistor for charging
7:反轉放大器 7: Inverting amplifier
8:TDC(測定裝置) 8: TDC (determination device)
9:運算單元 9: arithmetic unit
10a、10b:揮發性記錄介質 10a, 10b: Volatile recording media
11:邏輯電路 11: Logic circuit
Clock:時脈信號 Clock: clock signal
Mn1~MnN:第1電晶體~第N電晶體 Mn 1 ~Mn N : 1st transistor ~ Nth transistor
Tr:電晶體群(複數個類比元件) Tr: Transistor group (multiple analog components)
Vdd:電源電壓 V dd : power supply voltage
Claims (8)
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JP2019200993A JP2022180671A (en) | 2019-11-05 | 2019-11-05 | Analog device, method for controlling the same, temperature sensor, and analog-element-associated system |
JP2019-200993 | 2019-11-05 |
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TW202122766A true TW202122766A (en) | 2021-06-16 |
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JP (1) | JP2022180671A (en) |
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JP5359886B2 (en) * | 2007-12-28 | 2013-12-04 | 日本電気株式会社 | Temperature measuring apparatus and method |
JP2016213531A (en) * | 2015-04-28 | 2016-12-15 | 国立大学法人金沢大学 | AD converter and AD conversion method |
US20170234816A1 (en) * | 2015-05-11 | 2017-08-17 | The Trustees Of Columbia University In The City Of New York | Temperature sensor based on direct threshold-voltage sensing for on-chip dense thermal monitoring |
JP2018087888A (en) * | 2016-11-29 | 2018-06-07 | 京セラディスプレイ株式会社 | Temperature detection circuit and liquid crystal display panel |
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