TW202120323A - Multilayer body - Google Patents
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- TW202120323A TW202120323A TW109134096A TW109134096A TW202120323A TW 202120323 A TW202120323 A TW 202120323A TW 109134096 A TW109134096 A TW 109134096A TW 109134096 A TW109134096 A TW 109134096A TW 202120323 A TW202120323 A TW 202120323A
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- laminated body
- glass plate
- laminate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
Abstract
Description
本發明係關於一種積層體。The present invention relates to a laminated body.
先前,已知有貼附於物品以裝飾該物品之積層體。作為此種積層體,例如已知有由基材膜、金屬層、黏著劑層等積層而成之具有電磁波透過性及金屬光澤之裝飾膜。Previously, there have been known laminates attached to an article to decorate the article. As such a laminate, for example, a decorative film having electromagnetic wave permeability and metallic luster, which is laminated by a base film, a metal layer, an adhesive layer, etc., is known.
此種膜因呈金屬光澤而外觀上具有高級感,同時兼具電磁波透過性,因此適宜用於裝飾收發電波之裝置。例如,用於行動電話或智慧型手機、電腦等之殼體、或者汽車前部之裝飾等。進而,近年來,隨著IoT(Internet of Things,物聯網)技術之發展,家電製品或生活機器等亦具備了通信功能,從而此種膜於更廣泛領域之應用亦為人們所期待。This kind of film has a sense of luxury in appearance due to its metallic luster, and also has electromagnetic wave permeability, so it is suitable for decorating devices that transmit and receive radio waves. For example, it is used in the housing of mobile phones, smart phones, computers, etc., or the decoration of the front of cars. Furthermore, in recent years, with the development of IoT (Internet of Things) technology, home appliances or household appliances have also provided communication functions, so that the application of such films in a wider range of fields is also expected by people.
例如,於專利文獻1中,揭示有一種金屬光澤之非導電性轉印膜,其係轉印於成形射出物上之轉印膜,其特徵在於具備:保護層、積層於上述保護層上之印刷層、以島狀結構蒸鍍於上述印刷層上且具有非導電性之金屬蒸鍍層、及積層於上述金屬蒸鍍層上之接著層。 先前技術文獻 專利文獻For example, Patent Document 1 discloses a metallic luster non-conductive transfer film, which is a transfer film that is transferred onto a molded object, and is characterized by having: a protective layer and a protective layer laminated on the protective layer A printed layer, a non-conductive metal vapor-deposited layer vapor-deposited on the above-mentioned printed layer in an island-like structure, and an adhesive layer laminated on the above-mentioned metal vapor-deposited layer. Prior art literature Patent literature
專利文獻1:日本專利特表2014-509268號公報Patent Document 1: Japanese Patent Special Form No. 2014-509268
[發明所欲解決之問題][The problem to be solved by the invention]
關於此種積層體,有時會期望對外觀進行著色。作為滿足此種需求之方法,可考慮進而積層光學調整層作為構成積層體之層的方法。 關於具有光學調整層之積層體,有時期望於光學調整層上具有黏著劑層之構成,例如依序具備基材、光學調整層及黏著劑層之構成。於例如要對被黏著構件從內側(視認面之相反側)進行裝飾之情形時,便需要此種構成之積層體(膜)。若將此種構成之膜貼於透明之被黏著構件之內側而使用,則可對被黏著構件賦予藉由光學調整層而著色之外觀。又,膜位於被黏著構件之內側,因此不易受損。進而,被黏著構件位於外側,因此可使被黏著構件之質感於製品中充分地展現。Regarding such a laminate, it is sometimes desirable to color the appearance. As a method to meet such a demand, a method of further laminating an optical adjustment layer as a layer constituting the laminated body can be considered. Regarding a laminate having an optical adjustment layer, it is sometimes desirable to have a configuration with an adhesive layer on the optical adjustment layer, for example, a configuration with a substrate, an optical adjustment layer, and an adhesive layer in this order. For example, when the adhered member is to be decorated from the inside (the side opposite to the visible surface), a laminate (film) of such a structure is required. If the film of this structure is pasted on the inside of a transparent adhered member and used, the adhered member can be given an appearance colored by the optical adjustment layer. In addition, the film is located inside the adhered member, so it is not easily damaged. Furthermore, the adhered member is located on the outside, so that the texture of the adhered member can be fully displayed in the product.
然而,此種膜存在如下問題:紫外線或溫度、濕度等各種因素會導致光學調整層變質,從而造成其外觀發生變化。However, this kind of film has the following problem: ultraviolet rays, temperature, humidity and other factors can cause deterioration of the optical adjustment layer, resulting in a change in its appearance.
本案發明係鑒於上述問題而完成者,其目的在於提供一種積層體,該積層體可裝飾被黏著構件而賦予其著色外觀,進而可抑制紫外線或溫度、濕度等各種因素所導致之外觀變化。 [解決問題之技術手段]The present invention was completed in view of the above-mentioned problems, and its object is to provide a laminate that can decorate the adhered member to give it a colored appearance, and further suppress the appearance change caused by various factors such as ultraviolet rays, temperature, and humidity. [Technical means to solve the problem]
解決上述問題之本發明之積層體係依序具備基材膜、光學調整層、障壁層及黏著劑層者,其中光學調整層係含有選自由金屬氧化物、金屬氮化物及金屬硫化物所組成之群中之至少一種且折射率為1.75以上之層,障壁層係含有金屬氧化物及/或金屬氮化物之層,黏著劑層係包含透明黏著劑之層。 於本發明之積層體之一態樣中,可於基材膜與光學調整層之間進而具備金屬層。 於本發明之積層體之一態樣中,可使金屬層包含至少一部分處於互不連續狀態之複數個部分。 於本發明之積層體之一態樣中,可於基材膜與金屬層之間進而具備含氧化銦層。 於本發明之積層體之一態樣中,可使光學調整層含有Si及/或Nb。 於本發明之積層體之一態樣中,可使障壁層含有SiO2 。 於本發明之積層體之一態樣中,可行的是,將積層體經由黏著劑層貼合於玻璃板,然後將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體而獲得反射光譜,及隔著玻璃板對貼合於玻璃板之積層體照射紫外光24小時後,將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體而獲得反射光譜,使用上述兩個反射光譜算出之色差ΔE為3以下。 於本發明之積層體之一態樣中,可行的是,將積層體經由黏著劑層貼合於玻璃板,然後將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體而獲得反射光譜,及將貼合於玻璃板之積層體於溫度65℃且濕度90%之環境下保持500小時後,將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體而獲得反射光譜,上述兩個反射光譜中之極小波長之差為15 nm以下。 [發明之效果]The laminated system of the present invention that solves the above problems sequentially includes a substrate film, an optical adjustment layer, a barrier layer, and an adhesive layer, wherein the optical adjustment layer contains a metal oxide, a metal nitride, and a metal sulfide. At least one layer in the group with a refractive index above 1.75, the barrier layer is a layer containing metal oxide and/or metal nitride, and the adhesive layer is a layer containing a transparent adhesive. In one aspect of the laminate of the present invention, a metal layer may be further provided between the base film and the optical adjustment layer. In one aspect of the laminated body of the present invention, the metal layer may include at least a plurality of portions in a discontinuous state. In one aspect of the laminate of the present invention, an indium oxide-containing layer may be further provided between the base film and the metal layer. In one aspect of the laminate of the present invention, the optical adjustment layer may contain Si and/or Nb. In one aspect of the laminate of the present invention, the barrier layer may contain SiO 2 . In one aspect of the laminated body of the present invention, it is feasible to bond the laminated body to the glass plate via an adhesive layer, and then irradiate visible light in the range of 380 nm to 780 nm to the laminated body through the glass plate Obtain the reflection spectrum, and irradiate the laminated body attached to the glass plate with ultraviolet light through the glass plate for 24 hours, and then irradiate the visible light in the range of 380 nm to 780 nm through the glass plate to the laminated body to obtain the reflection spectrum. , The color difference ΔE calculated using the above two reflection spectra is 3 or less. In one aspect of the laminated body of the present invention, it is feasible to bond the laminated body to the glass plate via an adhesive layer, and then irradiate visible light in the range of 380 nm to 780 nm to the laminated body through the glass plate Obtain the reflection spectrum, and after keeping the laminated body attached to the glass plate in an environment with a temperature of 65°C and a humidity of 90% for 500 hours, the visible light with a wavelength of 380 nm to 780 nm is irradiated to the laminated layer through the glass plate The reflectance spectrum is obtained by mass, and the minimum wavelength difference between the above two reflectance spectra is 15 nm or less. [Effects of Invention]
本案發明之積層體可裝飾被黏著構件而賦予其著色外觀,進而可抑制紫外線或溫度、濕度等各種因素所導致之外觀變化。The laminated body of the present invention can decorate the adhered member to give it a colored appearance, and further can suppress the appearance change caused by various factors such as ultraviolet rays, temperature, and humidity.
以下,使用附圖對用以實施本發明之形態進行詳細敍述。再者,本發明不受以下所說明之實施方式限定。又,於以下之附圖中,有時對發揮相同作用之構件、部位標註相同之符號而進行說明,有時省略或簡化重複之說明。又,附圖中記載之實施方式係為了清楚地說明本發明而模式化者,未必準確地表示實際之尺寸或比例尺。Hereinafter, the mode for implementing the present invention will be described in detail with reference to the drawings. In addition, this invention is not limited by embodiment demonstrated below. In addition, in the following drawings, members and parts that perform the same function may be described with the same reference numerals, and repeated descriptions may be omitted or simplified. In addition, the embodiments described in the drawings are those modeled in order to clearly explain the present invention, and do not necessarily represent actual dimensions or scales accurately.
[積層體]
圖1中示出本發明之一實施方式之積層體之概略剖視圖。本實施方式之積層體1依序具備基材膜10、光學調整層13、障壁層14及黏著劑層15。[Layered body]
Fig. 1 shows a schematic cross-sectional view of a laminate according to an embodiment of the present invention. The laminate 1 of this embodiment includes a
<基材膜>
基材膜10例如可使用包含聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯、聚醯胺、聚氯乙烯、聚碳酸酯(PC)、環烯烴聚合物(COP)、聚苯乙烯、聚丙烯(PP)、聚乙烯、聚環烯烴、聚胺基甲酸酯、壓克力(PMMA,聚甲基丙烯酸甲酯)、ABS(丙烯腈-丁二烯-苯乙烯樹脂)等均聚物或共聚物之膜。該等構件亦不會對下文所述之光輝性或電波透過性產生影響。但是,由於後續會於基材膜10上形成各種層,故較佳為可耐受蒸鍍或濺鍍等之高溫者,因此上述材料中,較佳為例如聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、壓克力、聚碳酸酯、環烯烴聚合物、ABS、聚丙烯、聚胺基甲酸酯。其中,自耐熱性與成本之平衡性良好之方面考慮,較佳為聚對苯二甲酸乙二酯、環烯烴聚合物、聚碳酸酯或壓克力。基材膜10可為單層膜,亦可為積層膜。就加工之容易性等而言,厚度例如較佳為6 μm~250 μm左右。又,為了增強與形成於基材膜10上之層之附著力,亦可實施電漿處理或易接著處理等。又,基材膜10亦可具有遮光性,詳細情況將於下文敍述。<Base film>
The
於基材膜10,亦可視需要形成平滑性或防眩性硬塗層。藉由設置硬塗層,可提高耐擦傷性。
尤其是藉由設置平滑性硬塗層,而於設置下文所述之金屬層12之情形時能提高金屬光澤感,另一方面,藉由設置防眩性硬塗層,能防止眩光。
硬塗層可藉由塗佈含有硬化性樹脂之溶液而形成。作為硬化性樹脂,可例舉:熱硬化型樹脂、紫外線硬化型樹脂、電子束硬化型樹脂等。作為硬化性樹脂之種類,可例舉:聚酯系、丙烯酸系、胺基甲酸酯系、丙烯酸胺基甲酸酯系、醯胺系、矽酮系、矽酸鹽系、環氧系、三聚氰胺系、氧雜環丁烷系、丙烯酸胺基甲酸酯系等各種樹脂。該等硬化性樹脂可適當選擇一種或兩種以上而使用。其中,自硬度較高,能夠實現紫外線硬化且生產性優異考慮,較佳為丙烯酸系樹脂、丙烯酸胺基甲酸酯系樹脂、及環氧系樹脂。On the
<含氧化銦層>
於積層體1具備下文所述之金屬層12之情形時,可於基材膜10與金屬層12之間具備含氧化銦層11。
作為含氧化銦層11,既可使用氧化銦(In2
O3
)本身,亦可使用例如銦錫氧化物(ITO)或銦鋅氧化物(IZO)之類的含有銦及除銦以外之金屬(第二金屬)之複合氧化物。但是,要想使濺鍍步驟中之放電穩定性較高,更佳為含有第二金屬之ITO或IZO。藉由使用含氧化銦層11,容易使金屬層12成為島狀之不連續構造,而先前不易成為不連續構造之鋁等亦可容易地應用於金屬層12中,詳細情況將於下文敍述。<Indium oxide-containing layer> When the laminated body 1 includes the
於含氧化銦層11使用ITO之情形時,ITO所包含之氧化錫(SnО2
)之重量比率、即含有率(含有率=(SnO2
/(In2
O3
+SnO2
))×100)並無特別限定,例如為2.5 wt%~30 wt%,更佳為3 wt%~10 wt%。When ITO is used in the indium oxide-containing
又,於含氧化銦層11使用IZO之情形時,IZO所包含之氧化鋅(ZnO)之重量比率、即含有率(含有率=(ZnO/(In2
O3
+ZnO))×100)例如為2 wt%~20 wt%。In addition, when IZO is used in the indium oxide-containing
就電磁波透過性及生產性之觀點而言,含氧化銦層11之厚度通常較佳為1000 nm以下,更佳為50 nm以下,進而較佳為20 nm以下。另一方面,為了易於形成不連續狀態之金屬層12,含氧化銦層11之厚度較佳為1 nm以上,更佳為2 nm以上,進而較佳為5 nm以上。From the viewpoint of electromagnetic wave permeability and productivity, the thickness of the indium oxide-containing
<金屬層>
積層體1可於基材膜10與光學調整層13之間進而具備金屬層12。積層體1藉由進而具備金屬層12,可成為金屬光澤膜。藉由設為此種構成,可對被裝飾之物品(被黏著構件)賦予著色金屬光澤色調外觀。
於積層體1具備金屬層12之情形時,金屬層12形成於基材膜10上(具備含氧化銦層11之情形時形成於含氧化銦層11上)。於該情形時,金屬層12較佳為包含至少一部分處於互不連續狀態之複數個部分12a。該等部分12a係至少一部分處於互不連續之狀態,換言之,至少一部分被間隙12b隔開。若複數個部分12a被間隙12b隔開,則積層體1之薄片電阻變大,與電波之相互作用較小,因此可使電波透過。
再者,本說明書中所謂之「不連續之狀態」意指複數個部分12a被間隙12b相互隔開,其結果彼此電絕緣之狀態。藉由電絕緣,金屬層12之薄片電阻變大,可獲得電波透過性。即,藉由以不連續狀態形成之金屬層12,可確保充分之光輝性,並且亦可確保電波透過性。<Metal layer>
The laminate 1 may further include a
作為包含複數個部分12a及間隙12b之不連續構造,並無特別限定,例如可例舉島狀構造或龜裂構造,但就生產性之觀點而言,較佳為島狀構造。The discontinuous structure including a plurality of
島狀構造係金屬粒子彼此相互獨立,且以相互略微分離或一部分接觸之狀態密鋪而成之構造。
島狀構造之金屬層12例如可藉由將金屬以蒸鍍、濺鍍等方式形成於基材膜10上(具備含氧化銦層11之情形時形成於含氧化銦層11上)而形成。
藉由蒸鍍或濺鍍等而形成之金屬層12於基材膜10上成為不連續狀態之機制之詳細情況尚不明確,但認為不連續構造之形成容易度與被賦予之金屬層12於基體上之表面擴散性相關。因此,認為基體溫度較高,金屬層12相對於基體之潤濕性較小,且構成金屬層12之金屬之熔點較低之情況下更容易形成不連續構造。因此,於以下之實施例中,使用鋁(Al)作為構成金屬層12之金屬,但關於其他諸如鋅(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)等熔點相對較低之金屬,認為亦可藉由相同之方法形成不連續構造。
又,認為容易藉由含氧化銦層11使金屬層12成為島狀之不連續構造之原因在於:含氧化銦層11使構成金屬層12之金屬之表面擴散性提高。The island-like structure is a structure in which metal particles are independent of each other and are densely spread in a state of being slightly separated or partially in contact with each other.
The
島狀構造之金屬層12之厚度並無特別限定,要想提高金屬光澤感,較佳為設為20 nm以上,更佳為設為30 nm以上。另一方面,要想提高電磁波透過性,島狀構造之金屬層12之厚度較佳為設為100 nm以下,更佳為設為70 nm以下。
又,島狀構造之金屬層12中之金屬之部分12a之圓相當徑並無特別限定,通常為10~1000 nm左右。又,各部分12a彼此之距離並無特別限定,通常為10~1000 nm左右。
其等例如可根據SEM(Scanning Electron Microscope,掃描式電子顯微鏡)圖像求出。The thickness of the
龜裂構造係金屬薄膜被龜裂分斷之構造。
龜裂構造之金屬層12例如可藉由在基材膜10上(具備含氧化銦層11之情形時於含氧化銦層上)設置金屬薄膜層,並進行彎曲延伸使金屬薄膜層產生龜裂而形成。此時,藉由在基材膜10與金屬薄膜層之間設置包含伸縮性差、即容易由於延伸而產生龜裂之素材的脆性層,可容易地形成龜裂構造之金屬層12。The cracked structure is a structure in which the metal film is broken by cracks.
For the
構成金屬層12之金屬之種類並無特別限定,可為1種金屬,亦可為2種以上之金屬。
如上所述,認為不連續構造之形成容易程度與在基體(基材膜)上之表面擴散性相關,且基體溫度較高,金屬層相對於基體之潤濕性較小,且金屬層之材料之熔點較低之情況下更容易形成不連續構造,因此就該觀點而言,較佳為金屬層含有熔點相對較低之金屬,例如較佳為含有選自由Al、Zn、Pb、Cu、Ag所組成之群中之至少一種金屬、及以該金屬為主成分之合金中之任一種。尤其是自光輝性或穩定性、價格等理由考慮,較佳為金屬層含有Al或Al合金。又,於使用Al合金之情形時,較佳為將Al含量設為50質量%以上。The type of metal constituting the
於積層體1具備含氧化銦層11之情形時,金屬層12之厚度與含氧化銦層11之厚度之比(金屬層之厚度/含氧化銦層之厚度)較佳為0.1~100之範圍,更佳為0.3~35之範圍。When the laminate 1 is provided with the indium oxide-containing
<光學調整層>
光學調整層13係含有選自由金屬氧化物、金屬氮化物及金屬硫化物所組成之群中之至少一種且折射率為1.75以上之層。
若光學調整層13之折射率為1.75以上,則可獲得著色外觀。為了獲得色調更深之外觀,光學調整層13之折射率較佳為1.8以上,更佳為1.9以上。又,就厚度控制性之觀點而言,光學調整層13之折射率較佳為3.5以下,更佳為3.0以下。
又,光學調整層13亦可為折射率不同之層的積層體。<Optical adjustment layer>
The
構成光學調整層13之材料並無特別限定,可適當地使用選自由金屬氧化物、金屬氮化物及金屬硫化物所組成之群中之至少一種。再者,此處所謂之金屬氧化物、金屬氧化物、金屬硫化物所含有之金屬元素包括Si等半金屬元素。又,選自由金屬氧化物、金屬氮化物及金屬硫化物所組成之群中之至少一種包括金屬氮氧化物、金屬氧硫化物、金屬硫氮化物。又,金屬氧化物可為單一金屬元素之氧化物(單一氧化物),亦可為複數種金屬元素之氧化物(複合氧化物)。同樣地,金屬氮化物可為單一金屬元素之氮化物(單一氮化物),亦可為複數種金屬元素之氮化物(複合氮化物),金屬硫化物可為單一金屬元素之硫化物(單一硫化物),亦可為複數種金屬元素之硫化物(複合硫化物)。
作為光學調整層13之材料,更具體而言,例如可例舉:CeO2
(2.30)、Nb2
O3
(2.15)、Nb2
O5
(2.20)、SiNx
(2.03)、Sb2
O3
(2.10)、TiO2
(2.35)、Ta2
O5
(2.10)、ZrO2
(2.05)、ZnO(2.10)、ZnS(2.30)等[上述各材料之括號內之數值為折射率]。
尤其是,光學調整層13較佳為包含Si及/或Nb,例如較佳為含有Nb2
O5
及/或SiNX
,更佳為由Nb2
O5
及/或SiNX
構成。The material constituting the
光學調整層13之厚度較佳為10 nm~1000 nm。就成本之觀點而言,更佳為800 nm以下,進而較佳為500 nm以下。又,就色調之觀點而言,較佳為15 nm以上,更佳為20 nm以上,進而較佳為30 nm以上。The thickness of the
<障壁層>
障壁層14係含有金屬氧化物及/或金屬氮化物之層。再者,此處所謂之金屬氧化物、金屬氧化物所含有之金屬元素包括Si等半金屬元素。又,金屬氧化物及/或金屬氮化物包括金屬氮氧化物。又,金屬氧化物可為單一金屬元素之氧化物(單一氧化物),亦可為複數種金屬元素之氧化物(複合氧化物)。同樣地,金屬氮化物可為單一金屬元素之氮化物(單一氮化物),亦可為複數種金屬元素之氮化物(複合氮化物)。
本發明人等發現,積層體1之外觀變化係由以下原因引起,即於將積層體1暴露於紫外線(UV線)、或置於高溫高濕環境下時,光學調整層13與黏著劑層15反應。因此,藉由在光學調整層13與黏著劑層15之間設置障壁層14以抑制其等之反應,可抑制積層體1之外觀變化。<Barrier layer>
The
形成障壁層14之材料並無特別限定,只要為透明且不與黏著劑層15及光學調整層13反應之材料即可,例如較佳為SiO2
、Al2
O3
、AZO等,較佳為包含SiO2
,更佳為由SiO2
構成。The material for forming the
就透明性之觀點而言,障壁層14較佳為光學吸收較小。例如障壁層對波長550 nm之光之吸收率較佳為20%以下,更佳為10%以下,進而較佳為5%以下。障壁層之吸收率可藉由以下所示之方法進行測定。From the viewpoint of transparency, the
(吸收率之測定方法)
將積層體1經由黏著劑層15貼合於玻璃板,使用日立高新技術公司製造之分光光度計U-4100將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體1而獲得反射光譜及透過光譜,從1減去反射光譜及透過光譜中之波長550 nm時之反射率及透過率,將所得之值作為吸收率。(Measurement method of absorptance)
The laminated body 1 is attached to the glass plate via the
要想抑制光學調整層13與黏著劑層15之反應,障壁層之厚度較佳為10 nm以上,更佳為20 nm以上,尤佳為40 nm以上。另一方面,就彎曲性之觀點而言,較佳為300 nm以下,更佳為200 nm以下,尤佳為100 nm以下。In order to suppress the reaction between the
再者,積層體1亦可具備複數層障壁層。例如,於基材膜(具備金屬層12之情形時於金屬層)與光學調整層13之間亦然可具備障壁層。In addition, the laminated body 1 may include a plurality of barrier layers. For example, a barrier layer may also be provided between the base film (the metal layer when the
<黏著劑層>
黏著劑層15係包含透明黏著劑之層。
本實施方式之積層體1例如可經由黏著劑層15貼附於透明被黏著構件之內側(視認側之相反側)而使用,藉此從內側裝飾被黏著構件。<Adhesive layer>
The
形成黏著劑層15之黏著劑並無特別限定,只要為透明黏著劑即可,例如可單獨使用丙烯酸系黏著劑、橡膠系黏著劑、矽酮系黏著劑、聚酯系黏著劑、胺基甲酸酯系黏著劑、環氧系黏著劑、及聚醚系黏著劑中之任一種、或者組合2種以上而使用。就透明性、加工性及耐久性等觀點而言,較佳為使用丙烯酸系黏著劑。The adhesive forming the
雖然黏著劑層15之厚度並無特別限定,但可藉由使其變薄而提高可見光透過性或膜厚精度、平坦性,因此較佳為100 μm以下,更佳為75 μm以下,進而較佳為50 μm以下。Although the thickness of the
黏著劑層15整體之全光線透過率並無特別限定,以按照JIS K7361所測得之任意可見光波長時之值計,較佳為10%以上,更佳為30%以上,進而較佳為50%以上。黏著劑層15之全光線透過率越高越佳。The total light transmittance of the
黏著劑層15較佳為在貼附至被黏著構件之前由剝離襯墊保護。The
<其他層>
本實施方式之積層體1除了上述基材膜10、含氧化銦層11、金屬層12、光學調整層13、障壁層14、黏著劑層15以外,亦可根據用途具備其他層,只要發揮本發明之效果即可。
例如,本實施方式之積層體1亦可於基材膜10之與形成光學調整層13之側相反一側之面,具備不具有可見光透過性之遮光性層。藉由具備遮光性層,例如於將本實施方式之積層體1用於裝飾電子機器殼體之情形時,可防止通過積層體1視認出殼體內部之電路。
遮光性層之材質並無特別限定,例如,可將作為上述基材膜10所可使用之材料而例示之材料著色成黑色而使用。
又,於不具備遮光性層之積層體中,亦可藉由將基材膜10設為遮光性,而發揮與具備遮光性層之情形相同之效果。<Other floors>
In addition to the
<耐紫外線性及耐高溫高濕性>
作為使光學調整層13與黏著劑層15進行反應之因素之一,可例舉紫外線或溫度及濕度。本實施方式之積層體1藉由具備障壁層14,而即便於暴露於紫外線之情形時或暴露於高溫高濕環境下之情形時,亦不容易進行光學調整層13與黏著劑層15之反應。本實施方式之積層體1之耐紫外線性(暴露於紫外線之情形時光學調整層13與黏著劑層15之反應難度)或耐高溫高濕性(暴露於高溫高濕環境下之情形時光學調整層13與黏著劑層15之反應難度)例如可使用反射光譜進行評估。<UV resistance and high temperature and humidity resistance>
As one of the factors that cause the
例如,將積層體1經由黏著劑層15貼合於玻璃板,然後將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體1而獲得反射光譜(以下亦稱為「初始反射光譜」),並且將貼合於該玻璃板之積層體1暴露於紫外線或高溫高濕環境下之後,將波長380 nm~780 nm之範圍之可見光線隔著玻璃板照射至積層體1而獲得反射光譜(以下亦簡稱為「紫外線照射後之反射光譜」或「暴露於高溫高濕環境下之後之反射光譜」),藉由對上述兩個反射光譜進行比較,可對耐紫外線性或耐高溫高濕性進行評估。For example, the laminated body 1 is bonded to a glass plate via the
本發明之實施方式之積層體中,將上述積層體經由上述黏著劑層貼合於玻璃板,然後將波長380 nm~780 nm之範圍之可見光線隔著上述玻璃板照射至上述積層體而獲得反射光譜,並且將紫外光隔著上述玻璃板照射至貼合於上述玻璃板之上述積層體24小時之後,將波長380 nm~780 nm之範圍之可見光線隔著上述玻璃板照射至上述積層體而獲得反射光譜,使用上述兩個反射光譜算出之色差ΔE較佳為3以下。 就耐紫外線性之觀點而言,積層體1之使用初始反射光譜與24小時紫外線照射後之反射光譜所算出之色差ΔE較佳為3以下,更佳為2.5以下,進而較佳為2以下。 使用初始反射光譜及24小時紫外線照射後之反射光譜、與CIE標準光源(CIE standard illuminant)D65之相對光譜分佈求出紫外線照射前後之CIE-L* a* b* 表色系統中之L* 值、a* 值及b* 值,使用該等值求出紫外線照射前後之色差ΔL* 、Δa* 及Δb* ,使用該等色差根據以下之式求出色差ΔE。 ΔE={(ΔL* )2 +(Δa* )2 +(Δb* )2 }0.5 In the laminated body of the embodiment of the present invention, the laminated body is bonded to a glass plate via the adhesive layer, and then visible light having a wavelength in the range of 380 nm to 780 nm is irradiated to the laminated body through the glass plate. Reflect spectrum, and irradiate ultraviolet light through the glass plate to the laminated body bonded to the glass plate for 24 hours, and then irradiate visible light in the range of 380 nm to 780 nm through the glass plate to the laminated body To obtain the reflection spectrum, the color difference ΔE calculated using the above two reflection spectra is preferably 3 or less. From the viewpoint of ultraviolet resistance, the color difference ΔE calculated using the initial reflection spectrum of the laminate 1 and the reflection spectrum after 24 hours of ultraviolet irradiation is preferably 3 or less, more preferably 2.5 or less, and even more preferably 2 or less. Use the initial reflectance spectrum and the reflectance spectrum after 24 hours of UV irradiation, and the relative spectral distribution of CIE standard illuminant D65 to calculate the CIE-L * a * b * L * value in the color system before and after UV irradiation , A * value and b * value, use these values to find the color difference ΔL * , Δa * and Δb * before and after UV irradiation, and use the color difference to find the color difference ΔE according to the following formula. ΔE={(ΔL * ) 2 +(Δa * ) 2 +(Δb * ) 2 } 0.5
本發明之實施方式之積層體中,將上述積層體經由上述黏著劑層貼合於玻璃板,然後將波長380 nm~780 nm之範圍之可見光線隔著上述玻璃板照射至上述積層體而獲得反射光譜,並且將貼合於上述玻璃板之上述積層體於溫度65℃且濕度90%之環境下保持500小時後將波長380 nm~780 nm之範圍之可見光線隔著上述玻璃板照射至上述積層體而獲得反射光譜,上述兩個反射光譜中之極小波長之差較佳為15 nm以下。 就耐高溫高濕性之觀點而言,積層體1之初始反射光譜中之極小波長(反射率成為極小值時之波長;以下亦稱為「底部波長」)、與暴露於高溫高濕環境下500小時後之反射光譜中之極小波長的差較佳為15 nm以下,更佳為10 nm以下,進而較佳為5 nm以下。In the laminated body of the embodiment of the present invention, the laminated body is bonded to a glass plate via the adhesive layer, and then visible light having a wavelength in the range of 380 nm to 780 nm is irradiated to the laminated body through the glass plate. Reflect spectrum, and keep the laminate bonded to the glass plate for 500 hours in an environment with a temperature of 65°C and a humidity of 90%, and then irradiate visible light with a wavelength in the range of 380 nm to 780 nm through the glass plate. The layered body is used to obtain the reflection spectrum, and the difference between the minimum wavelengths in the above two reflection spectra is preferably 15 nm or less. From the viewpoint of high temperature and humidity resistance, the minimum wavelength in the initial reflection spectrum of the laminate 1 (the wavelength at which the reflectance becomes the minimum value; hereinafter also referred to as the "bottom wavelength") and exposure to high temperature and high humidity environment The minimum wavelength difference in the reflection spectrum after 500 hours is preferably 15 nm or less, more preferably 10 nm or less, and still more preferably 5 nm or less.
<電波透過性>
於積層體1具備金屬層12之情形時,如上所述較佳為將金屬層12設為不連續之構造以提高電波透過性。
積層體1之電波透過性例如可根據電波透過衰減量進行評估。
再者,微波頻帶(5 GHz)之電波透過衰減量與毫米波雷達之頻帶(76~80 GHz)之電波透過衰減量之間存在相關性,表現為相對接近之值,因此微波頻帶之電波透過性優異之積層體(金屬光澤膜)於毫米波雷達之頻帶中之電波透過性亦優異。
本實施方式之積層體1之微波頻帶(5 GHz)之電波透過衰減量較佳為10[-dB]以下,更佳為5[-dB]以下,進而較佳為2[-dB]以下。若大於10[-dB],則存在90%以上之電波被遮斷之問題。<Radio wave permeability>
When the laminated body 1 is provided with the
金屬層12之薄片電阻(具備含氧化銦層11之情形時係作為含氧化銦層11與金屬層12之積層體之薄片電阻)亦與電波透過性相關。
金屬層12之薄片電阻(具備含氧化銦層11之情形時係作為含氧化銦層11與金屬層12之積層體之薄片電阻)較佳為100 Ω/□以上,於該情形時,微波頻帶(5 GHz)之電波透過衰減量成為10~0.01[-dB]左右。
金屬層12之薄片電阻(具備含氧化銦層11之情形時係作為含氧化銦層11與金屬層12之積層體之薄片電阻)更佳為200 Ω/□以上,進而較佳為600 Ω/□以上,尤佳為1000 Ω/□以上。
薄片電阻可按照JIS-Z2316-1:2014利用渦電流測定法進行測定。The sheet resistance of the metal layer 12 (when the indium oxide-containing
電波透過衰減量及薄片電阻受金屬層12之材質或厚度等影響。又,於積層體1具備含氧化銦層11之情形時,亦受含氧化銦層11之材質或厚度等影響。The attenuation of the electric wave and the sheet resistance are affected by the material or thickness of the
<反射率之最大值與最小值之差>
積層體1之黏著劑層15側之面於波長380 nm~780 nm之範圍內之反射率之最大值與最小值之差較佳為30%以上。若反射率之最大值與最小值之差為30%以上,則可使外觀之著色較深。就著色之深淺之觀點而言,更佳為35%以上,進而較佳為40%以上。再者,反射率之最大值與最小值之差之上限並無特別限制。<Difference between the maximum and minimum reflectivity>
The difference between the maximum value and the minimum value of the reflectance of the surface on the side of the
[積層體之製造]
於基材膜10上形成含氧化銦層11之情形時之形成方法並無特別限定,例如可例舉:真空蒸鍍法、濺鍍法、離子鍍覆法等。要想即便面積大也可以嚴格地控制厚度,較佳為濺鍍法。[Manufacturing of laminated body]
The formation method in the case of forming the indium oxide-containing
於基材膜10上(形成有含氧化銦層11之情形時於含氧化銦層11上)形成金屬層12之情形時之形成方法亦無特別限定,例如可例舉:真空蒸鍍法、濺鍍法等。The method of forming the
於基材膜10上(形成有金屬層12之情形時於金屬層12上)形成光學調整層13之方法亦無特別限定,例如可例舉:真空蒸鍍法、濺鍍法、離子鍍覆法、塗敷法等。The method for forming the
於光學調整層13上形成障壁層14之方法亦無特別限定,例如可例舉:真空蒸鍍法、濺鍍法、離子鍍覆法、塗敷法等。The method of forming the
黏著劑層15可藉由在障壁層14塗佈黏著劑組合物等操作而形成。
黏著劑組合物之塗佈可使用慣用之塗佈機,例如凹版輥式塗佈機、逆輥塗佈機、接觸輥塗佈機、浸漬輥塗佈機、棒式塗佈機、刮刀塗佈機、噴霧塗佈機等進行。乾燥溫度並無特別限定,較佳為40℃~200℃,進而較佳為50℃~180℃,尤佳為70℃~120℃。乾燥時間亦無特別限定,較佳為5秒~20分鐘,進而較佳為5秒~10分鐘,尤佳為10秒~5分鐘。The
[積層體之用途] 本實施方式之積層體1例如貼附於透明之被黏著構件之內側(視認側之相反側)之面而使用。作為透明之被黏著構件,例如可使用包含玻璃或塑膠之構件,但並非限定於此。[Use of laminated body] The laminated body 1 of the present embodiment is used by sticking, for example, on the surface of the inner side (the side opposite to the visible side) of a transparent adhered member. As a transparent member to be adhered, for example, a member including glass or plastic can be used, but it is not limited to this.
作為利用本實施方式之積層體裝飾之構件之用途,例如可例舉:車輛用構造零件、車載用品、電子機器之殼體、家電機器之殼體、構造用零件、機械零件、各種汽車用零件、電子機器用零件、傢俱、廚房用品等生活用動產用途、醫療機器、建築材料之零件、其他構造用零件或外裝用零件等。更具體而言,車輛相關可例舉:儀錶板、控制台盒、門把手、門飾材、變速桿、踏板類、手套箱、保險桿、引擎蓋、擋泥板、行李箱、車門、天窗、支柱、座椅、方向盤、ECU(electronic control unit,電子控制單元)盒、電氣零件、引擎周邊零件、驅動系統/齒輪周邊零件、進氣/排氣系統零件、冷卻系統零件等。作為電子機器及家電機器,更具體而言可例舉:冰箱、洗衣機、吸塵器、微波爐、空調、照明機器、電熱水器、電視、時鐘、排風扇、投影機、揚聲器等家電製品類;電腦、行動電話、智慧型手機、數位相機、平板型PC(Personal Computer,個人電腦)、隨身聽、手持遊戲機、充電器、電池等電子資訊機器等。 [實施例]As the use of the member decorated with the laminate of the present embodiment, for example, there can be exemplified: automotive structural parts, automotive supplies, housings of electronic equipment, housings of home appliances, structural parts, mechanical parts, and various automotive parts , Electronic equipment parts, furniture, kitchen supplies and other household movable products, medical equipment, parts of construction materials, other structural parts or exterior parts, etc. More specifically, vehicle-related examples include: dashboards, console boxes, door handles, door trims, gear levers, pedals, glove boxes, bumpers, hoods, mudguards, luggage compartments, doors, sunroofs , Pillar, seat, steering wheel, ECU (electronic control unit, electronic control unit) box, electrical parts, engine peripheral parts, drive system/gear peripheral parts, intake/exhaust system parts, cooling system parts, etc. Examples of electronic equipment and home appliances include more specifically: refrigerators, washing machines, vacuum cleaners, microwave ovens, air conditioners, lighting equipment, electric water heaters, televisions, clocks, exhaust fans, projectors, speakers and other home appliances; computers, mobile phones , Smart phones, digital cameras, tablet PCs (Personal Computers), walkmans, handheld game consoles, chargers, batteries and other electronic information equipment. [Example]
以下,利用實施例對本發明具體地進行說明,但本發明不受該等實施例任何限定。Hereinafter, the present invention will be specifically described using examples, but the present invention is not limited in any way by these examples.
<實施例1~3、及比較例1之積層體之製造> 作為基材膜,使用於三菱樹脂公司製造之PET膜(厚度50 μm)之一面形成有厚度2000 μm之熱硬化樹脂之膜。 首先,將ITO靶安裝於DC(direct current,直流)磁控濺鍍裝置,一面導入Ar氣體,一面進行濺鍍,藉此沿著基材膜之面直接形成厚度為8 nm之含氧化銦層(ITO層)。形成ITO層時之基材膜之溫度設定為130℃。ITO所包含之氧化錫(SnО2 )之含有率(含有率=(SnO2 /(In2 O3 +SnO2 ))×100)為10 wt%。<Production of laminates of Examples 1 to 3 and Comparative Example 1> As a base film, a PET film (50 μm thick) manufactured by Mitsubishi Plastics Co., Ltd. was formed with a thermosetting resin having a thickness of 2000 μm formed on one side. First, install the ITO target on a DC (direct current, direct current) magnetron sputtering device, introduce Ar gas on one side, and sputter on the other side, thereby directly forming an indium oxide-containing layer with a thickness of 8 nm along the surface of the substrate film (ITO layer). The temperature of the base film when forming the ITO layer was set to 130°C. The content rate of tin oxide (SnO 2 ) contained in ITO (content rate=(SnO 2 /(In 2 O 3 +SnO 2 ))×100) is 10 wt%.
其次,將鋁(Al)靶安裝於交流濺鍍裝置(AC(alternating current,交流):40 kHz),一面導入Ar氣體,一面進行濺鍍,藉此於ITO層之上形成厚度為30 nm之金屬層(Al層)。獲得之Al層為不連續層。形成Al層時之基材膜之溫度設定為130℃。再者,關於金屬層之厚度之測定方法將於下文敍述。Secondly, the aluminum (Al) target was installed in an AC sputtering device (AC (alternating current, AC): 40 kHz), and Ar gas was introduced on one side and sputtered on the other side, thereby forming a thickness of 30 nm on the ITO layer. Metal layer (Al layer). The obtained Al layer is a discontinuous layer. The temperature of the base film when forming the Al layer was set to 130°C. Furthermore, the method for measuring the thickness of the metal layer will be described below.
其次,將鋁(Al)靶安裝於交流濺鍍裝置(AC:40 kHz),一面導入О2 氣體,一面進行濺鍍,藉此於Al層之上形成厚度為10 nm之障壁層(AlOx 層)。形成AlOx 層時之基材膜之溫度設定為130℃。Secondly, the aluminum (Al) target was installed in an AC sputtering device (AC: 40 kHz), while introducing О 2 gas, while sputtering was performed, thereby forming a barrier layer (AlO x) with a thickness of 10 nm on the Al layer. Floor). The temperature of the base film when forming the AlO x layer was set to 130°C.
其次,將Si靶(AC:40 kHz)安裝於交流濺鍍裝置,一面導入O2 氣體及N2 氣體,一面進行濺鍍,藉此於AlOx 層上形成170 nm之光學調整層(SiNx 層)。形成SiNx 層時之基材膜之溫度設定為-8℃。Secondly, a Si target (AC: 40 kHz) was installed in an AC sputtering device, and O 2 gas and N 2 gas were introduced while sputtering was performed on the other side, thereby forming a 170 nm optical adjustment layer (SiN x) on the AlO x layer. Floor). The temperature of the base film when forming the SiN x layer is set to -8°C.
其次,將Si靶(AC:40 kHz)安裝於交流濺鍍裝置,一面導入Ar氣體及O2 氣體,一面進行濺鍍,藉此於SiNx 層上形成20 nm之障壁層(SiO2 層)。形成SiO2 層時之基材膜之溫度設定為-8℃。Next, a Si target (AC: 40 kHz) was installed in an AC sputtering device, and Ar gas and O 2 gas were introduced while sputtering was performed on the other side, thereby forming a 20 nm barrier layer (SiO 2 layer) on the SiN x layer . The temperature of the base film when forming the SiO 2 layer was set to -8°C.
其次,於SiO2 層上貼附黏著劑層(光學用透明黏著片材,厚度25 μm,日東電工股份有限公司製造之名為「CS9861UAS」之商品),從而獲得實施例1之積層體。Next, an adhesive layer (optical transparent adhesive sheet, thickness 25 μm, a product named "CS9861UAS" manufactured by Nitto Denko Co., Ltd.) was attached to the SiO 2 layer to obtain the laminate of Example 1.
又,如表1所示般變更SiO2 層之厚度,除此之外,與實施例1同樣地獲得實施例2及3之積層體。 又,不形成SiO2 層,而是於SiNx 層上形成黏著劑層,除此之外,與實施例1同樣地獲得比較例1之積層體。 In addition, except that the thickness of the SiO 2 layer was changed as shown in Table 1, the laminates of Examples 2 and 3 were obtained in the same manner as Example 1. In addition, instead of forming an SiO 2 layer, an adhesive layer was formed on the SiN x layer. In the same manner as in Example 1, a laminate of Comparative Example 1 was obtained except that an adhesive layer was formed on the SiN x layer.
<金屬層之厚度之測定方法>
首先,如圖2所示,從積層體適當地抽選出邊長為5 cm之正方形區域3,藉由將該正方形區域3之縱邊及橫邊各自之中心線A、B分別四等分而獲得共計5個點「a」~「e」,選擇該5個點作為測定部位。
繼而,對所選擇之測定部位各自之截面圖像(穿透式電子顯微鏡照片(TEM圖像))進行測定,從所獲得之TEM圖像抽選包含5個以上金屬粒子之視角區域。
使針對5處測定部位分別抽選之視角區域中之金屬層之總截面面積除以視角區域之橫寬,將所得之值設為各視角區域之金屬層之膜厚,將5處測定部位分別抽選之各視角區域之金屬層之膜厚的平均值作為金屬層之厚度(nm)。<Measuring method of thickness of metal layer>
First, as shown in Figure 2, a
<薄片電阻之測定> 對於實施例1~3、及比較例1之積層體,使用Napson公司製造之非接觸式電阻測定裝置NC-80MAP,依據JIS-Z2316,利用渦電流測定法對作為金屬層與含氧化銦層之積層體之薄片電阻進行測定,結果均為1 kΩ以上。<Measurement of sheet resistance> For the laminates of Examples 1 to 3 and Comparative Example 1, the non-contact resistance measuring device NC-80MAP manufactured by Napson Company was used in accordance with JIS-Z2316, and the eddy current measurement method was used to measure the difference between the metal layer and the indium oxide-containing layer. The sheet resistance of the laminate was measured, and the results were all 1 kΩ or more.
<對溫度及濕度之耐久性之評估> 將實施例1~3、及比較例1之積層體經由黏著劑層貼合於玻璃板。其後,置於溫度65℃且濕度90%之高溫高濕環境中,保持500小時。於置於高溫高濕環境中之前、在高溫高濕環境中經過240小時後之時間點、及經過500小時後之時間點,分別如下所述地測定分光反射率。 於測定分光反射率時,使用分光測色計,將波長380 nm~780 nm之範圍之可見光線以5 nm之間隔隔著玻璃板照射至積層體,測定反射光之分光反射率。<Evaluation of durability of temperature and humidity> The laminates of Examples 1 to 3 and Comparative Example 1 were bonded to a glass plate via an adhesive layer. After that, it was placed in a high-temperature and high-humidity environment with a temperature of 65°C and a humidity of 90% for 500 hours. Before being placed in a high temperature and high humidity environment, at a time point after 240 hours in a high temperature and high humidity environment, and at a time point after 500 hours, the spectral reflectance was measured as described below. When measuring the spectral reflectance, use a spectrophotometer to irradiate visible light with a wavelength of 380 nm to 780 nm to the laminate through a glass plate at 5 nm intervals to measure the spectral reflectance of the reflected light.
以此方式獲得波長380 nm~780 nm之範圍之反射光譜,將其中之極小波長(底部波長)及極大波長(峰值波長)示於表1中。In this way, the reflection spectrum of the wavelength range from 380 nm to 780 nm was obtained, and the minimum wavelength (bottom wavelength) and the maximum wavelength (peak wavelength) are shown in Table 1.
又,使用以此方式獲得之波長380 nm~780 nm之範圍之反射光譜、CIE標準光源D65之相對光譜分佈,計算CIE-L* a* b* 表色系統中之L* 值、a* 值及b* 值。使用該等計算值,求出置於高溫高濕環境之前(初始值)、與在高溫高濕環境中經過240小時後之時間點(經過240 h後)及經過500小時後之時間點(經過500 h後)的色差ΔL* 、Δa* 及Δb* ,使用以下之式子計算色差ΔE。將結果示於表1。 ΔE={(ΔL* )2 +(Δa* )2 +(Δb* )2 }0.5 Also, use the reflectance spectrum of the wavelength range of 380 nm ~ 780 nm obtained in this way and the relative spectral distribution of the CIE standard light source D65 to calculate the L * value and a * value in the CIE-L * a * b * color system And b * value. Using these calculated values, find the time point before the high temperature and high humidity environment (initial value), the time point after 240 hours in the high temperature and high humidity environment (after 240 h), and the time point after 500 hours (elapsed). After 500 h), the color difference ΔL * , Δa *, and Δb * are calculated using the following formula. The results are shown in Table 1. ΔE={(ΔL * ) 2 +(Δa * ) 2 +(Δb * ) 2 } 0.5
[表1]
於比較例1中,置於高溫高濕環境下500小時之後,反射光譜之底部波長向20 nm短波長側偏移。 另一方面,於實施例1~3中,即便置於高溫高濕環境下500小時之後,反射光譜之底部波長及峰值波長亦不偏移,高溫高濕耐久性優異。In Comparative Example 1, after being placed in a high temperature and high humidity environment for 500 hours, the bottom wavelength of the reflection spectrum shifted to the short wavelength side of 20 nm. On the other hand, in Examples 1 to 3, even after being placed in a high temperature and high humidity environment for 500 hours, the bottom wavelength and peak wavelength of the reflection spectrum did not shift, and the high temperature and high humidity durability was excellent.
<實施例4~7、及比較例2之積層體之製造> 形成150 nm之Nb2 O5 層以代替SiNx 層作為光學調整層,除此之外,與實施例1同樣地製造實施例4之積層體。再者,Nb2 O5 層之形成係藉由將Nb靶(AC:40 kHz)安裝於交流濺鍍裝置,一面導入Ar氣體及O2 氣體,一面進行濺鍍而進行。形成Nb2 O5 層時之基材膜之溫度設定為-8℃。 又,如表2所示般變更SiO2 層之厚度,除此之外,與實施例4同樣地獲得實施例5及6之積層體。 又,於AlOx 層與Nb2 O5 層之間進而形成50 μm之SiO2 層,除此之外,與實施例5同樣地獲得實施例7之積層體。表2之「SiO2 層厚度」一欄中之50/50意指2層SiO2 層之厚度均為50 μm。 又,並不形成SiO2 層,而是於Nb2 O5 層上形成黏著劑層,除此之外,與實施例4同樣地獲得比較例2之積層體。<Production of laminates of Examples 4-7 and Comparative Example 2> An example was produced in the same manner as in Example 1, except that a 150 nm Nb 2 O 5 layer was formed instead of the SiN x layer as the optical adjustment layer 4 of the layered body. In addition, the formation of the Nb 2 O 5 layer was performed by mounting a Nb target (AC: 40 kHz) in an AC sputtering device, introducing Ar gas and O 2 gas, and performing sputtering. The temperature of the base film when forming the Nb 2 O 5 layer was set to -8°C. In addition, except that the thickness of the SiO 2 layer was changed as shown in Table 2, the laminates of Examples 5 and 6 were obtained in the same manner as Example 4. In addition, a 50 μm SiO 2 layer was further formed between the AlO x layer and the Nb 2 O 5 layer. In the same manner as in Example 5, a laminate of Example 7 was obtained. The 50/50 in the column of "SiO 2 layer thickness" in Table 2 means that the thickness of both SiO 2 layers is 50 μm. In addition, instead of forming an SiO 2 layer, an adhesive layer was formed on the Nb 2 O 5 layer. In the same manner as in Example 4, except that an adhesive layer was formed, a laminate of Comparative Example 2 was obtained.
<薄片電阻之測定> 對於實施例4~7、及比較例2之積層體,與實施例1~3、及比較例1同樣地測定薄片電阻,結果均為1 kΩ以上。<Measurement of sheet resistance> Regarding the laminates of Examples 4 to 7 and Comparative Example 2, the sheet resistance was measured in the same manner as in Examples 1 to 3 and Comparative Example 1, and the results were all 1 kΩ or more.
<對於紫外光之耐久性之評估> 將實施例4~7、及比較例2之積層體經由黏著劑層貼合於玻璃板。其後,投入至UV試驗機中,一面隔著玻璃板對積層體照射紫外光,一面保持500小時。於投入至UV試驗機之前、投入至UV試驗機後經過24小時之時間點、經過240小時之時間點、及經過500小時之時間點,分別與實施例1~3、及比較例1同樣地測定分光反射率,求出極小波長(底部波長)及極大波長(峰值波長)、以及ΔE。 表2中示出於投入至UV試驗機之前、投入至UV試驗機後經過240小時之時間點、及經過500小時之時間點之極大及極小波長、以及投入至UV試驗機後經過24小時之時間點之ΔE。<Evaluation of durability of ultraviolet light> The laminates of Examples 4 to 7 and Comparative Example 2 were bonded to a glass plate via an adhesive layer. After that, it was put into a UV tester, and the laminate was irradiated with ultraviolet light through the glass plate, and the laminate was kept for 500 hours. Before putting into the UV tester, 24 hours after putting into the UV tester, 240 hours, and 500 hours, the same as in Examples 1 to 3 and Comparative Example 1, respectively The spectral reflectance is measured, and the minimum wavelength (bottom wavelength) and maximum wavelength (peak wavelength), and ΔE are determined. Table 2 shows the maximum and minimum wavelengths at the time of 240 hours before the UV tester, the 240 hours after the UV tester, and the 500 hours after the UV tester, and the 24 hours after the UV tester. ΔE at the time point.
[表2]
於比較例2中,照射紫外光經過24小時後之ΔE較大。 另一方面,於實施例4~7中,即便照射紫外光經過24小時後,ΔE亦較小,紫外光耐久性優異。 [產業上之可利用性]In Comparative Example 2, the ΔE is greater after 24 hours of exposure to ultraviolet light. On the other hand, in Examples 4-7, even after 24 hours of ultraviolet light irradiation, ΔE was small, and ultraviolet light durability was excellent. [Industrial availability]
根據本發明,可提供一種積層體,其可裝飾被黏著構件而賦予其著色外觀,進而抑制紫外線或溫度、濕度等各種因素所導致之外觀變化。According to the present invention, it is possible to provide a laminated body that can decorate the adhered member to give it a colored appearance, thereby suppressing changes in appearance caused by various factors such as ultraviolet rays, temperature, and humidity.
參照特定之實施態樣並且詳細地對本發明進行了說明,但本技術領域之業者應知曉可不脫離本發明之精神及範圍地進行各種變更或修正。 本申請案係基於2019年9月30日提出申請之日本專利申請案(特願2019-179322),其內容係以參照之形式引入至本文中。The present invention has been described in detail with reference to specific embodiments, but those skilled in the art should know that various changes or modifications can be made without departing from the spirit and scope of the present invention. This application is based on a Japanese patent application (Japanese Patent Application 2019-179322) filed on September 30, 2019, and the content is incorporated herein by reference.
1:積層體
3:正方形區域
10:基材膜
11:含氧化銦層
12:金屬層
12a:部分
12b:間隙
13:光學調整層
14:障壁層
15:黏著劑層
A,B:中心線
a~e:點1: Layered body
3: square area
10: Substrate film
11: Indium oxide layer
12:
圖1係本發明之一實施方式之積層體之概略剖視圖。 圖2係用以說明本發明之一實施方式之積層體的金屬層之膜厚之測定方法之圖。Fig. 1 is a schematic cross-sectional view of a laminate according to an embodiment of the present invention. Fig. 2 is a diagram for explaining a method of measuring the film thickness of a metal layer of a laminate according to an embodiment of the present invention.
1:積層體 1: Layered body
10:基材膜 10: Substrate film
11:含氧化銦層 11: Indium oxide layer
12:金屬層 12: Metal layer
12a:部分 12a: part
12b:間隙 12b: gap
13:光學調整層 13: Optical adjustment layer
14:障壁層 14: barrier layer
15:黏著劑層 15: Adhesive layer
Claims (8)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019179322 | 2019-09-30 | ||
JP2019-179322 | 2019-09-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202120323A true TW202120323A (en) | 2021-06-01 |
Family
ID=75336925
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109134096A TW202120323A (en) | 2019-09-30 | 2020-09-30 | Multilayer body |
TW109134097A TW202120324A (en) | 2019-09-30 | 2020-09-30 | Laminate and article |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109134097A TW202120324A (en) | 2019-09-30 | 2020-09-30 | Laminate and article |
Country Status (2)
Country | Link |
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TW (2) | TW202120323A (en) |
WO (2) | WO2021065839A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023190612A1 (en) * | 2022-03-30 | 2023-10-05 | 日東電工株式会社 | Laminate, light-emitting device, and sensing device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101377393B1 (en) * | 2011-01-13 | 2014-03-25 | (주)엘지하우시스 | Metal-colored and non-conductive transfer film |
JP6181981B2 (en) * | 2013-05-30 | 2017-08-16 | 住友理工株式会社 | Transparent laminated film |
JP6584187B2 (en) * | 2015-07-22 | 2019-10-02 | 日東電工株式会社 | Laminated body and method for producing the same |
JP6400062B2 (en) * | 2016-10-24 | 2018-10-03 | 日東電工株式会社 | Electromagnetic wave transmitting metallic luster member, article using the same, and metallic thin film |
-
2020
- 2020-09-28 WO PCT/JP2020/036743 patent/WO2021065839A1/en active Application Filing
- 2020-09-28 WO PCT/JP2020/036745 patent/WO2021065840A1/en active Application Filing
- 2020-09-30 TW TW109134096A patent/TW202120323A/en unknown
- 2020-09-30 TW TW109134097A patent/TW202120324A/en unknown
Also Published As
Publication number | Publication date |
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TW202120324A (en) | 2021-06-01 |
WO2021065840A1 (en) | 2021-04-08 |
WO2021065839A1 (en) | 2021-04-08 |
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