TW202117258A - Non-oriented vapor chamber - Google Patents

Abstract

The present invention provides a non-oriented vapor chamber. The non-oriented vapor chamber comprises: a top plate having a first structural surface; a lower plate having a second structural surface facing the first structural surface; a macro channel formed on at least one of the first structural surface and the second structural surface by an etching process, and forming a passage through which a gaseous working fluid flows from an evaporation part to a condensation part by thermal energy; and a micro channel formed on at least one of the first structural surface and the second structural surface by the etching process to have a groove having a width smaller than that of the macro channel, disposed between an adjacent pair of macro channels, and forming a passage through which a liquid working fluid moves from the condensation part to the evaporation part by capillary force, wherein the macro channel includes an outer heat radiation channel occupying at least a part of an outermost channel on the upper plate or the lower plate.

Description

Non-directional soaking plate

The invention relates to a non-directional soaking plate for releasing heat from a heat source.

The Vapor Chamber is a device that uses the latent heat of the phase transition between liquid and gas to remove heat from the object. The soaking plate has a different method from the general heat transfer system (conduction, convection, radiation), and has the advantage of quickly removing heat and discharging from the object.

Most of the currently known soaking plates are designed to operate in a single direction. Specifically, the heat source is located in the lower part of the chamber, and the gas vaporized by the heat source rises and condenses into a liquid in a condensation section provided in the upper part of the chamber. The condensed liquid drops again to the lower side of the heat source due to gravity.

The difference is that, in order to make the soaking plate operate without being restricted by the directionality, a wick structure of fiber material can also be used. However, the capillary structure of the fiber material needs to be manufactured through heat treatment (ionization, high temperature heating), and there are disadvantages such as excessive thickness of the product and expensive manufacturing.

In addition, most of the heat pipes similar to the soaking plate are composed of cylindrical copper pipes, and are widely used in cooling devices of electronic devices. Recently, due to the ever-increasing demand for ultra-thinness and thin version, cylindrical copper heat pipes or soaking plates are stamped and flattened to make products and use them. However, these thicknesses have reached the level of 2.0mm, and compared with the thickness, the demand for ultra-thinness has reached the technical limitation, and it is difficult to control the thickness of the product below 1mm during manufacturing. Moreover, in the process of welding the upper plate and the lower plate to each other, the plastic deformation caused by the increase in manufacturing time and overheating can also cause the phenomenon of soft nitriding and other phenomena.

The object of the present invention is to provide a non-directional soaking plate whose thickness is reduced to a minimum through a thinning process to achieve the effect of maximizing heat dissipation.

Another object of the present invention is to provide a non-directional soaking plate that can be manufactured through a thinning process to prevent the structural strength from becoming low during use.

In order to successfully solve the above problems, the present invention aims to provide a non-directional soaking plate, including: an upper plate having a first structure surface; a lower plate having a second structure surface opposite to the first structure surface ; A large channel is formed on at least one of the first structure surface and the second structure surface by an etching process, and is formed to enable the vapor phase operating fluid to flow from an evaporation portion to a condensation portion based on thermal energy And a microchannel formed on at least one of the first structure surface and the second structure surface by an etching process, the microchannel having a groove with a smaller width than the large channel, and Disposed at a position between two adjacent large channels, the microchannel is also formed with a passage capable of moving the operating fluid in the liquid phase from the condensation part to the evaporation part based on capillary force; wherein, the The large channel includes an outer heat releasing channel, and the outer heat releasing channel occupies at least a part of the outermost channel of one of the upper plate or the lower plate.

Wherein, the upper plate and the lower plate are respectively formed of a quadrangular shape with four sides; the outer heat radiation channel occupies all of the outermost channels of the four sides of the upper plate or the lower plate, And a structure surrounding the microchannel is formed.

Wherein, at least one of the upper plate and the lower plate further includes an interval maintaining protrusion formed in the large channel to protrude, so as to maintain the state that the upper plate and the lower plate are separated from each other.

Wherein, there are a plurality of the interval maintaining protrusions, and they are arranged in a zigzag shape along one direction.

Wherein, the upper plate and the lower plate may have different thicknesses.

Wherein, the large channel and the micro channel are arranged alternately side by side on one of the upper plate and the lower plate; the other of the upper plate and the lower plate includes a scratch area , The scratch area has a scratch groove with a smaller width than that of the microchannel.

Wherein, the scratch area corresponds to the area formed by the large channel and the micro channel.

Wherein, the scratch groove is formed by performing metal brush contact and rotation operations on the other of the upper plate and the lower plate.

Wherein, the upper plate and the lower plate respectively further include a welding groove formed on the outer surface of the upper plate and the lower plate, and the upper plate and the lower plate are irradiated by laser to the welding groove to make the upper plate And the lower plate are welded and joined to each other.

As mentioned above, the non-directional heat spreading plate in the present invention forms large channels and micro channels by etching at least one of the first structure surface of the upper plate and the second structure surface of the lower plate, thereby making the non-directional The thickness of the type soaking plate is reduced as a whole.

Furthermore, the large channel occupies at least a part of the outermost channel of the upper plate or the lower plate, so that the operating fluid in the vapor phase flows continuously, so that the heat it has can be efficiently released to the outside.

In addition, the upper plate and the lower plate are fused to each other by welding, so during the manufacturing process, it is possible to prevent the problem of the overall strength of the upper plate and the lower plate from decreasing due to the influence of heat.

In addition, the interval maintaining protrusions formed on the large channel can suppress the compression of the upper plate and the lower plate during use.

100,100’,200,300: Non-directional soaking plate

110,210,310: upper board

111, 311: the first structural plane

112: The first appearance

113, 133: Injection port forming part

114,134: Welding slot

115, 135, 215, 235: Interval maintenance bump

130,230,330: lower board

131, 331: the second structural surface

132: The Second Exposure

150, 250, 350: large aisle

155: Outer heat release channel

170,270,370: microchannel

390: scratched area

EZ: Evaporation Department

CZ: Condensation part

Figure 1 is a schematic exploded perspective view showing a non-directional soaking plate according to an embodiment of the present invention;

FIG. 2 is a detailed cross-sectional view showing the assembled state of the non-directional soaking plate shown in FIG. 1;

Fig. 3 is a modified embodiment of the non-directional heat equalizing plate shown in Fig. 2, showing an exploded view of the finished non-directional heat equalizing plate;

4 is a specific cross-sectional view showing a non-directional soaking plate according to another embodiment of the present invention;

Figure 5 is an exploded cross-sectional view showing the non-directional soaking plate shown in Figure 4; and

Fig. 6 is a detailed cross-sectional view showing another embodiment of the non-directional soaking plate in the present invention.

Hereinafter, the non-directional heat spreading plate based on the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. In this specification, even in mutually different embodiments, the same or similar reference numerals will be assigned to the same or similar structures, and the description of this part will be replaced by the original description.

FIG. 1 is a schematic exploded perspective view showing a non-directional uniform heat plate 100 according to an embodiment of the present invention.

It can be seen from the drawings that the non-directional soaking plate 100 is composed of an upper plate 110 and a lower plate 130 as a whole.

The upper plate 110 and the lower plate 130 are each constituted by a rectangular flat plate. The structure can be made of metal material, for example, it can be made of copper alloy. The upper plate 110 and the lower plate 130 are superimposed and combined structures, and may have the same size and shape.

The opposite surfaces between the upper plate 110 and the lower plate 130 are respectively composed of a first structure surface 111 and a second structure surface 131. On this opposite surface, structures such as the large channel 150 (refer to FIG. 2) can be manufactured through an etching process. On the upper plate 110 and the lower plate 130, the surfaces exposed to the outside are constituted by a first exposed surface 112 and a second exposed surface 132, respectively. In addition, protruding injection port formation portions 113 and 133 are formed at one corner of the upper plate 110 and the lower plate 130. The injection port forming parts 113 and 133 are cut off after the operating fluid is injected into the large channel 150.

The specific structure of the above-mentioned non-directional soaking plate 100 will be described in detail with reference to FIG. 2. FIG. 2 is a detailed cross-sectional view showing the non-directional heat equalizing plate 100 of FIG. 1 in an assembled state.

2, in order to combine the upper plate 110 and the lower plate 130, welding grooves 114 and 134 are formed along the edges of the first exposed surface 112 and the second exposed surface 132. The welding grooves 114 and 134 can be manufactured by etching the upper plate 110 and the lower plate 130. The welding grooves 114 and 134 can weld the upper plate 110 and the lower plate 130 by irradiating a laser to complete the welding. Through the above-mentioned welding, the thermal deformation of the welding point and the surroundings can be minimized, and the welding performance can be improved, and the plastic deformation (nitrocarburizing) of the upper plate 110 and the lower plate 130 caused by the thermal deformation can be suppressed. This not only can maintain the original rigidity of the thin non-directional soaking plate 100, but also can maintain a higher elasticity than the original one.

Through the etching process of the first structure surface 111 and the second structure surface 131, the large channel 150 and the micro channel 170 can be formed. The large channels 150 and the micro channels 170 are alternately arranged side by side. In this embodiment, the large channel 150 has four, and the micro channel 170 has three. The micro channel 170 is arranged at a position between a pair of adjacent large channels 150.

The large channel 150 is a structure formed by performing an etching process on the first structure surface 111 and the second structure surface 131. The height when the first structure surface 111 and the second structure surface 131 are etched may be the same. This part of the structure forms a passage through which the operating fluid in the vapor phase flows from the evaporation part EZ (refer to FIG. 3) to the condensation part CZ (refer to FIG. 3) based on thermal energy.

Space maintaining protrusions 115 and 135 are formed inside the large channel 150. The space maintaining protrusions 115 and 135 are formed by the unetched portions during the etching process. The interval maintaining protrusions 115 and 135 are respectively formed on the upper plate 110 or the lower plate 130, and may have the same height. Space maintaining protrusion 115, 135 It is possible to prevent the upper plate 110 and the lower plate 130 from being compressed by an external force, so that the large channel 150 maintains its stable shape. The external force referred to here refers to the external force acting from the outside to the inside of the non-directional soaking plate 100 relative to the vacuum inside the large channel 150. In this drawing, the interval maintaining protrusions 115 and 135 are only shown conceptually, and the specific form can be understood with reference to the content of FIG. 3.

The outermost channel in the large channel 150 may be referred to as an outer heat radiation channel 155. Under the action of the outer heat radiation channel 155 located on the outermost side of the non-directional heat equalizing plate 100, the operating fluid in the vapor phase efficiently releases heat energy to the outside. The outer heat radiation channel 155 may occupy all of the outermost channel or a part of it.

The microchannel 170 is also a structure formed by etching the first structure surface 111 and the second structure surface 131. The micro-channel 170 is also similar to the above-mentioned situation, and the height of the first structure surface 111 and the second structure surface 131 during etching may be the same. This part of the structure is used to form a passage for the liquid phase operating fluid to return to the evaporation part EZ from the condensation part CZ under the action of capillary force. In order to make the effect of the capillary force continue normally, the micro channel 170 has a groove with a narrower width than the large channel 150. Based on the above capillary force, the operating fluid in the liquid phase moves into the groove without being affected by gravity. In this embodiment, 2 to 5 grooves are formed in one microchannel 170.

Now referring to Fig. 3, the structure of the additional part of the non-directional heat equalizing plate 100' that is actually manufactured will be described by way of example. Fig. 3 is a modified embodiment of the non-directional heat equalizing plate 100 shown in Fig. 2, showing an exploded view of the finished non-directional heat equalizing plate 100'.

3, the upper plate 110 and the lower plate 130 are respectively arranged in a quadrangular shape with four sides, and the outer heat radiation channel 155 can occupy all of the outermost channel relative to the four sides of the upper plate 110 and the lower plate 130. Based on the above structure, the micro-channel 170 exists like an island in the enclosed area due to the outer heat-radiating channel 155. Therefore, the heat energy contained in the fluid running in the vapor phase can be more efficiently released from the outer heat dissipation channels 155 located on each side to the outside.

A plurality of interval maintaining protrusions 115 and 135 may be provided in the large channel 150. The interval maintaining protrusions 115 and 135 may generally appear in a cylindrical shape, a quadrangular column shape, a hemispherical shape, or the like. The above-mentioned interval maintaining protrusions 115 and 135 may be arranged in a zigzag shape or a lattice shape along a reverse direction. Therefore, the operating fluid in the vapor phase is not restricted by the direction in which the large channel 150 extends, and can also diffuse in the direction intersecting the above-mentioned direction. In addition, the interval maintaining protrusions 115 and 135 are not continuous protrusions to form a wall, but a fixed form such as a cylindrical shape. Therefore, compared to the method of forming a wall, a larger space can be ensured.

Referring now to FIG. 4 and FIG. 5, another form of non-directional soaking plate 200 will be described. 4 is a detailed cross-sectional view showing a non-directional heat equalizing plate 200 according to another embodiment of the present invention; FIG. 5 is an exploded cross-sectional view showing the non-directional heat equalizing plate 200 shown in FIG. 4.

4 and 5, the basic structure of the non-directional heat equalizing plate 200 and the aforementioned non-directional heat equalizing plate 100 are substantially the same, but the structures of the upper plate 210 and the lower plate 230 are asymmetrical to each other , There is a difference in this point.

First, the upper plate 210 has a thicker thickness than the lower plate 230. For example, if the thickness of the upper plate 210 is 0.25 mm, the thickness of the lower plate 230 may be 0.1 mm. Therefore, the overall thickness of the non-directional soaking plate 200 can be as thin as about 0.4 mm. Furthermore, the width of the upper plate 210 or the lower plate 230 can be made 15~200mm, and the length is 40~200mm. In order to ensure that the general copper soaking plate is not affected by the operating characteristics in the direction of gravity, the sintering process or the capillary structure (wick) are used. However, due to the manufacturing process, it cannot be manufactured with a thickness of less than 1.0mm, and currently only reaches 2.5mm High-level products have completed real mass production and are now on the market. In the non-directional soaking plate 200 in this embodiment, the soaking plate is less than 1.0 mm, and even products with a thickness of 0.4 mm and below this thickness can ensure good operating characteristics.

Due to the difference in the thickness of the upper plate 210 and the lower plate 230, the height of the etching performed on the upper plate 210 and the lower plate 230 to make the large channel 250 as the micro channel 270 will also be different. For example, if 0.17 mm is etched on the upper plate 210, the etching height on the lower plate 230 may be 0.05 mm. Moreover, if the width of the large channel 250 is 4 to 5 mm, the width of the groove on the micro channel 270 may be 0.01 to 0.1 mm. Furthermore, the width of the interval maintaining protrusions 215 and 235 on the large channel 250 can be maintained at a level between 0.3 mm and 0.5 mm.

Finally, referring to FIG. 6, another non-directional soaking plate 300 of another form will be described in detail. FIG. 6 is a detailed cross-sectional view showing a non-directional heat equalizing plate 300 according to another embodiment of the present invention.

6, the basic structure of the non-directional heat equalizing plate 300 and the aforementioned non-directional heat equalizing plate 200 are substantially the same, but the large channel 350 and the micro channel 370 are different in the formation of the lower plate 330 .

Specifically, compared to the upper plate 310, the lower plate 330 may have a thicker thickness. Large channels 350 and micro channels 370 are formed on such lower plate 330. For this reason, it is feasible to etch and manufacture corresponding large channels 350 and micro channels 370 only on the second structure surface 331. Therefore, the large channels 350 and the micro channels 370 can be alternately arranged side by side on the lower plate 330.

Unlike the lower plate 330, a scratch area 390 may be formed on the upper plate 310. The scratched area 390 is formed with scratched grooves that are smaller than the grooves of the microchannel 370. After the scratched groove is in contact with the metal brush on the first structure surface 311 of the upper plate 310, it is formed under the rotating mechanical force. The groove formed under the action of the brush is a natural form that can be randomly formed without directionality. The scratch area 390 corresponds to the area formed by the large channel 350 and the micro channel 370, and is formed on the first structure surface 311 as a whole.

Based on the above structure, the scratch area 390 formed on the upper plate 310 with a relatively thin thickness not only does not increase the overall thickness, but also improves the overall performance. In addition, since the scratch area 390 is formed on the entire area, the operating fluid condensed from the large channel 350 quickly moves to the heat generating part through the scratch area 390 or to the heat generating part through the micro channel 370. In such a situation, the circulation process of evaporation and condensation of the operating fluid can be better carried forward, and the efficiency of heat release can be improved.

The above-mentioned non-directional soaking plate is not limited to the structure and operation mode of the above-mentioned embodiment. In each of the above embodiments, all or part of them can be selectively combined and changed to complete the corresponding functions.

100: Non-directional soaking plate

110: upper board

111: The first structural plane

112: The first appearance

114,134: Welding slot

115, 135: Interval maintenance bump

130: lower board

131: The second structural surface

132: The Second Exposure

150: large channel

155: Outer heat release channel

170: Micro channel

Claims (9)

A non-directional soaking plate, including: An upper board with a first structural surface; The lower board is provided with a second structure surface opposite to the first structure surface; A large channel is formed on at least one of the first structure surface and the second structure surface by an etching process, and is formed with a vapor-phase operating fluid that can flow from an evaporation part to a condensation part based on thermal energy Access; and A microchannel is formed on at least one of the first structure surface and the second structure surface by an etching process, the microchannel has a groove with a smaller width than the large channel, and is arranged in two At positions between the adjacent large channels, the microchannels are also formed with a passage that enables the operating fluid in the liquid phase to move from the condensation part to the evaporation part based on capillary force; Wherein, the large channel includes an outer heat releasing channel, and the outer heat releasing channel occupies at least a part of the outermost channel of one of the upper plate or the lower plate. The non-directional soaking plate according to claim 1, wherein: The upper plate and the lower plate are respectively formed by a quadrangle with four sides; The outer heat radiation channel occupies all of the outermost channels of the four sides of the upper plate or the lower plate, and forms a structure that surrounds the microchannels. The non-directional heat equalizing plate according to claim 1, wherein at least one of the upper plate and the lower plate further includes a space maintaining protrusion formed in the large channel to protrude to maintain the The state where the upper board and the lower board are separated from each other. The non-directional heat equalizing plate according to claim 3, wherein the interval maintaining protrusions are provided in a plurality, and are arranged in a zigzag shape in one direction. The non-directional heat equalizing plate according to claim 1, wherein the upper plate and the lower plate have different thicknesses. The non-directional soaking plate according to claim 1, wherein: The large channels and the micro channels are arranged alternately side by side on one of the upper plate and the lower plate; The other of the upper plate and the lower plate includes a scratched area, and the scratched area has a scratched groove with a smaller width than that of the microchannel. The non-directional heat spreading plate according to claim 6, wherein the scratch area corresponds to an area formed by the large channel and the micro channel. The non-directional heat equalizing plate according to claim 6, wherein the scratch groove is formed by performing metal brush contact and rotation operations on the other of the upper plate and the lower plate. The non-directional heat equalizing plate according to claim 1, wherein the upper plate and the lower plate respectively further include a welding groove formed on the outer surface thereof, and the upper plate and the lower plate are formed by aligning The welding groove is irradiated with laser, so that the upper plate and the lower plate are welded and joined to each other.

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