TW202108524A - Glass substrate conveying device, and laminated glass manufacturing device and manufacturing method capable of suppressing breakage of a glass substrate - Google Patents

Abstract

A conveying device 11 for a glass substrate 1 of the present invention is provided with: a roll-out roller 21 configured to roll out the flexible glass substrate 1; a take-up roller 41 configured to take up the glass substrate 1; and first to fourth guide rollers (26, 28, 31, 38) arranged between the roll-out roller 21 and the take-up roller 41 in a conveying direction of the glass substrate 1. The surface of the first to fourth guide rollers (26, 28, 31, 38) has a maximum height roughness Rz of 1.0 [mu]m or more.

Description

Conveying device of glass substrate, manufacturing device and manufacturing method of laminated glass

The present invention relates to a conveying device for a glass substrate, a manufacturing device and a manufacturing method for laminated glass, and more specifically, to a conveying device for a glass substrate, a manufacturing device for laminated glass provided with the conveying device, and using the manufacturing device The manufacturing method of laminated glass.

In recent years, thin glass substrates with excellent heat resistance have been used as flexible substrates for optical films equipped in image display devices such as liquid crystal displays and organic EL (Electroluminescence) displays. Specifically, transparent conductive glass in which a transparent conductive layer such as indium tin oxide (ITO) is formed on a thin glass substrate is used as a touch panel film.

In order to mass-produce this optical film, a roll-to-roll method is adopted. That is, it is wound on the unwinding roll, the long and flexible thin glass substrate is unrolled, and the guide roll is used for conveying, and the transparent conductive layer and other functional layers are formed by sputtering method, etc., and the winding is used Roll-up laminated glass provided with a thin glass substrate and functional layers (for example, refer to Patent Document 1 below).

In addition, it has also been disclosed that the surface roughness Ra of the glass transport roller is 0.5 μm or less (for example, refer to Patent Document 2 below). [Prior Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2014-109073 [Patent Document 2] Japanese Patent Laid-Open No. 2009-84100

[The problem to be solved by the invention]

However, the thin glass substrate described in Patent Document 1 has a flat (smooth) surface compared to the previous plastic substrate. Therefore, the phenomenon of close contact with the guide roller (adhesion) is likely to occur. In particular, when the glass transport roller described in Patent Document 2 is used as a guide roller, the surface roughness Ra of the glass transport roller is small, being 0.5 μm, and therefore blocking is more likely to occur.

If the thin glass substrate adheres to the guide roller, greater force is required to make the thin glass substrate separate from the guide roller. As a result, there is a disadvantage that the thin glass substrate, which is more fragile than the plastic substrate, is easily damaged. Therefore, if the thin glass substrate is damaged, the thin glass substrate cannot be transported in a roll-to-roll system.

Furthermore, in this specification, "damage" means that the thin glass substrate is torn in its entire thickness direction, which is different from the following "scratch".

The present invention provides a glass substrate conveying device, a laminated glass manufacturing device, and a manufacturing method that can suppress damage to the glass substrate. [Technical means to solve the problem]

The present invention (1) includes a glass substrate conveying device, which is provided with: a take-up roller configured to take up a flexible glass substrate; a take-up roller to take up the glass substrate And a guide roller, which is arranged between the unwinding roller and the winding roller in the conveying direction of the glass substrate; and the surface of the guide roller has a maximum height roughness Rz of 1.0 μm or more.

In the glass substrate conveying device, since the guide roller has a large maximum height roughness Rz of 1.0 μm or more, the adhesion of the glass substrate to the surface of the guide roller can be suppressed. Therefore, it is possible to suppress breakage of the glass substrate when it is separated from the guide roller. Therefore, the glass base material can be reliably conveyed between the unwinding roll and the winding roll.

The present invention (2) includes the glass substrate conveying device according to (1), wherein the surface of the guide roller has a maximum height roughness Rz of 50 μm or less.

However, if the maximum height roughness Rz of the surface of the guide roller exceeds 50 μm, the surface of the glass substrate will be scratched when the glass substrate is in contact with the surface of the guide roller.

Furthermore, in this specification, the so-called "scratch" refers to the formation of recesses on the surface of the glass substrate to damage the surface of the glass substrate, which is different from the "breakage" in which the glass substrate is torn in the entire thickness direction.

However, in the glass substrate conveying device, since the guide roller has a maximum height roughness Rz of 50 μm or less, the surface scratches of the glass substrate can be suppressed.

The present invention (3) includes the glass substrate conveying device according to (1) or (2), further comprising a driving roller arranged between the unwinding roller and the winding roller in the conveying direction, And it is configured to be given power for conveying the glass substrate, and the surface of the driving roller has a maximum height roughness Rz of 0.8 μm or less.

Since this glass base material conveying device is equipped with a drive roller, it can convey a glass base material more reliably.

Moreover, since the surface of the drive roller has a maximum height roughness Rz of 0.8 μm or less, the surface of the drive roller can be prevented from sliding relative to the glass substrate, the tension applied to the glass substrate can be controlled, and the rotation of the drive roller can be reliably Switch to the transportation of the glass substrate, so that the glass substrate can be transported more reliably.

The present invention (4) includes a manufacturing device for laminated glass, which is provided with: the conveying device according to any one of (1) to (3); and a film forming device, which is arranged in the above-mentioned unwinding roller and the above-mentioned conveying direction Between the above-mentioned winding rollers, it is configured to provide a functional layer on the above-mentioned glass substrate under vacuum.

Since the conveying device of the laminated glass substrate is provided with the aforementioned conveying device and the film forming device, it is possible to suppress the breakage of the glass substrate and to provide a functional layer on the glass substrate. Therefore, laminated glass can be manufactured reliably.

The present invention (5) includes a method for manufacturing laminated glass, which is a method for manufacturing laminated glass using the manufacturing device for laminated glass as in (4), and includes the following steps: rolling out the glass substrate from the unwinding roll The glass substrate is guided by the guide roller; the functional layer is set on the glass substrate by the film forming device under vacuum; and the glass substrate and the function are wound by the winding roller Layers of laminated glass.

Since the manufacturing method of this laminated glass uses the conveying device of the above-mentioned laminated glass, it can suppress that a glass base material adheres to a guide roller. Therefore, it is possible to suppress breakage of the glass base material when it is separated from the guide roll, and furthermore, to provide a functional layer on the glass base material, so that laminated glass can be reliably manufactured. [Effects of Invention]

The glass substrate conveying device of the present invention can suppress the damage of the glass substrate.

According to the manufacturing apparatus and manufacturing method of laminated glass of the present invention, the damage of the glass substrate can be suppressed, and the functional layer can be provided on the glass substrate.

1. Transport the film forming device Referring to Fig. 1, a transport film forming apparatus which is an embodiment of the manufacturing apparatus of the present invention will be described.

The transport film forming apparatus 10 shown in FIG. 1 transports the glass substrate 1 while providing a transparent conductive layer (an example of a functional layer) 2 (see FIG. 2C) on the thickness direction of the glass substrate 1 to produce transparent conductive glass (laminated glass) An example) 3. Specifically, the transport film forming apparatus 10 peels off the first protective material 5 from the roll-shaped transport base material 4 (described below) to separately transport the glass base material 1, and subsequently, the transparent conductive layer 2 is provided on the glass base material 1. The transparent conductive glass 3 is produced, and then the second protective material 6 is laminated on the transparent conductive glass 3 and wound into a roll.

The transport film forming device 10 includes a transport device 11, a sputtering device (an example of a film forming device) 12, and a cooling device 13. Furthermore, the conveying device 11 includes an unwinding section 14, a static elimination section 15, and a winding section 16. Furthermore, the static elimination part 15 includes a first static elimination part 17 and a second static elimination part 18. The transport film forming apparatus 10 is provided with an unwinding section 14, a first static electricity removal section 17, and a first antistatic section 17, from the upstream side in the transport direction (hereinafter, abbreviated as the "upstream side") to the downstream side (hereinafter, abbreviated as the "downstream side") in the transport direction. The sputtering device 12, the cooling device 13, the second static elimination part 18, and the winding part 16. Hereinafter, these are described in detail.

The unwinding part 14 is arranged on the most upstream side in the conveying device 11. The unwinding part 14 unwinds the long conveying base material 4. The unwinding part 14 includes a unwinding roller 21, a first driving roller (an example of a driving roller) 22, a protective material winding roller 23, and a winding-out housing 24.

On the unwinding roller 21, a roll-shaped conveying base material 4 is placed. That is, on the surface (peripheral surface) of the unwinding roller 21, the conveying base material 4 elongated in the conveying direction is wound. The unwinding roller 21 is a cylindrical member, which has a rotating shaft that rotates in the conveying direction and extends in the width direction. In addition, in this embodiment, the following various rollers (unwinding roller 21, first to second driving rollers (22, 40), protective material winding roller 23, first to fourth guide rollers (26, 28, 31, 38), the protective material guide roller 43, the first to second cooling rollers (34, 35), the winding roller 41, the protective material unwinding roller 42, the nip roller 44) are all cylindrical members, that is, they have The axis of rotation rotates in the direction and extends in the width direction (the direction orthogonal to the conveying direction and the thickness direction).

The unwinding roller 21 is configured to be driven by external power or the like to rotate in the arrow direction shown in FIG. 1.

The first driving roller 22 is arranged on the downstream side of the unwinding roller 21. The first drive roller 22 is configured to be provided with power for conveying the glass substrate 1 from the outside. Thereby, the first drive roller 22 rotates in the arrow direction shown in FIG. 1 based on the above-mentioned external power. Specifically, a gear (not shown) is provided at the end of the rotating shaft of the first drive roller 22, and a motor (not shown) is connected to the gear to rotate the first drive roller 22 in the direction of the arrow. . The first driving roller 22 is rotated by the driving force of the motor.

Thereby, the first driving roller 22 conveys the glass substrate 1 of the conveying substrate 4 placed on the unwinding roller 21 to the first destaticizing part 17.

In addition, the first drive roller 22 is different from the second drive roller 40 (described below) arranged adjacent to the nip roller 44, and is configured to contact one surface (contact surface) 51 (refer to FIG. 2B) in the thickness direction of the glass substrate 1 In this state, the other surface (non-contact surface) 52 (see FIG. 2B) in the thickness direction of the glass substrate 1 is not in contact with other conveying members (nip roller 44, etc.).

The material of the first drive roller 22 is not particularly limited, and examples thereof include metals, resins, ceramics, etc., preferably metals.

The surface of the first drive roller 22 is flat, for example, and specifically, has a maximum height roughness Rz of 1 μm or less, preferably 0.8 μm or less, more preferably 0.5 μm or less, and still more preferably 0.3 μm or less. In addition, the surface of the first drive roller 22 preferably has a maximum height roughness Rz of 0.001 μm or more, for example. In addition, the maximum height roughness Rz of the surface of the 1st drive roller 22 is measured based on JIS B 0601 (2009). The maximum height roughness Rz of the surface of the following other rolls is also measured based on the same method as above.

If the maximum height roughness Rz of the surface of the first drive roller 22 is less than the above upper limit, the surface of the first drive roller 22 can be prevented from sliding relative to the glass substrate 1, the tension applied to the glass substrate 1 can be controlled, and the The rotation of the material of the first drive roller 22 is reliably converted into the conveyance of the glass substrate 1, so that the glass substrate 1 can be conveyed more reliably.

If the maximum height roughness Rz of the surface of the first drive roller 22 is greater than or equal to the above lower limit, the glass substrate 1 can be conveyed reliably.

In order to set the surface of the first drive roller 22 to the above-mentioned maximum height roughness Rz, for example, the surface of the drive roller 22 is flattened. The planarization treatment is not particularly limited, and examples thereof include electroplating, electroless plating, and polishing. Alternatively, the first drive roller 22 having the surface with the above-mentioned maximum height roughness Rz may be prepared in advance.

The protective material winding roller 23 is arranged in the vicinity of the unwinding roller 21. The protective material winding roller 23 peels (leaves) the first protective material 5 from the conveying base material 4 and winds up the first protective material 5. The protective material winding roller 23 is configured to be driven by external power or the like to rotate in the direction of the arrow shown in FIG. 1.

The unwinding housing 24 accommodates the unwinding roller 21, the first driving roller 22, and the protective material winding roller 23 in the inside thereof. The roll-out shell 24 is constructed to adjust its inside to a vacuum state. Specifically, a vacuum pump (not shown) that discharges the air inside the casing 24 to the outside is connected to the roll-out casing 24. In addition, in this specification, the "vacuum state" refers to, for example, a state where the air pressure is 0.1 Pa or less, preferably 1×10 ^-3 Pa or less.

The first static elimination part 17 is arranged on the downstream side of the unwinding part 14 so as to be adjacent to the unwinding part 14. The first static elimination unit 17 removes static electricity from the glass substrate 1. The first static elimination unit 17 includes a first static elimination machine 25, a first guide roller (an example of a guide roller) 26, and a first static elimination housing 27.

The first static elimination machine 25 reduces the charge of the glass substrate 1. The first destaticizer 25 is arranged on the downstream side of the first drive roller 22 and on the upstream side of the first guide roller 26. Examples of the first antistatic machine 25 include a corona discharge type antistatic machine, an ionizing radiation type antistatic machine, and the like.

The first guide roller 26 guides the glass substrate 1 transported from the first drive roller 22 through the first static elimination machine 25 to the second guide roller 28 of the sputtering device 12. The first guide roller 26 is arranged on the downstream side of the first destaticizer 25 and on the upstream side of the second guide roller 28.

The material of the first guide roller 26 is not particularly limited, and examples thereof include metals, resins, ceramics, and the like, preferably metals.

The surface of the first guide roller 26 has a maximum height roughness Rz of 1.0 μm or more.

When the surface of the first guide roller 26 has a maximum height roughness Rz of less than 1.0 μm, the glass substrate 1 will adhere to the surface of the first guide roller 26. Therefore, in order to separate the glass substrate 1 from the first guide roller 26, a large tension is required. If a large tension is applied to the glass substrate 1, the glass substrate 1 will be damaged.

The surface of the first guide roller 26 has a maximum height roughness Rz of preferably 2 μm or more, more preferably 5 μm or more, and still more preferably 10 μm or more, and has, for example, preferably 100 μm or less, more preferably The maximum height roughness Rz of 50 μm or less, more preferably 30 μm or less.

If the surface of the first guide roller 26 is greater than or equal to the above lower limit, the adhesion of the glass substrate 1 to the surface of the first guide roller 26 can be effectively suppressed. Therefore, there is no need to apply a large tension to the glass substrate 1 being conveyed, and therefore, the first guide roller 26 can reliably guide the glass substrate 1.

On the other hand, if the surface of the first guide roller 26 is equal to or less than the above upper limit, scratches on the surface (one surface and the other surface in the thickness direction) of the glass substrate 1 can be suppressed.

In order to set the maximum height roughness Rz of the surface of the first guide roller 26, for example, a first guide roller 26 having a flat surface is prepared, and then the surface of the first guide roller 26 is roughened (roughened). The roughening treatment is not particularly limited. Specific examples of the roughening treatment include, for example, thermal spraying (for example, the formation of a thermal spray coating described in Japanese Patent Laid-Open No. 2017-0665189, etc.) and electroless plating (for example, Japanese Patent Laid-Open No. 2016- Formation of the spray coating described in 103138 Bulletin, etc.), sandblasting, etching, etc. Alternatively, the first guide roller 26 having a surface with the above-mentioned maximum height roughness Rz in advance may be prepared.

The first static elimination housing 27 houses the first static elimination machine 25 and the first guide roller 26 inside. The first antistatic housing 27 is configured to adjust its inside to a vacuum state.

The sputtering device 12 is arranged on the downstream side of the first destaticizing section 17 so as to be adjacent to the first destaticizing section 17. The sputtering device 12 sputters the glass substrate 1 in the film formation area 33 to form the transparent conductive layer 2 (see FIG. 2C).

The sputtering device 12 includes a second guide roller (an example of a guide roller) 28, a sputtering target 29, a heater 30, a third guide roller (an example of a guide roller) 31, and a sputtering housing 32.

The second guide roller 28 guides the glass substrate 1 conveyed from the first guide roller 26 to the film formation area 33. The second guide roller 28 is arranged on the downstream side of the first guide roller 26 and on the upstream side of the sputtering target 29. The structure of the second guide roller 28 is the same as the structure of the first guide roller 26.

The sputtering target 29 is a raw material of the transparent conductive layer 2. The sputtering target 29 is disposed on the downstream side of the second guide roller 28 and the upstream side of the third guide roller 31 facing the glass substrate 1 with an interval therebetween. The sputtering target 29 faces the side 51 of the glass substrate 1 in the thickness direction.

Examples of materials for the sputtering target 29 include those selected from the group consisting of In, Sn, Zn, Ga, Sb, Nb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W The metal oxide of at least one metal. Specifically, for example, indium-containing oxides such as indium tin composite oxide (ITO), antimony-containing oxides such as antimony tin composite oxide (ATO), etc. can be cited, preferably indium-containing oxides, more preferably ITO.

The heating machine 30 heats the glass substrate 1 and the transparent conductive glass 3 obtained therefrom. On the downstream side of the second guide roller 28 and the upstream side of the third guide roller 31, they are arranged at a distance from the glass substrate 1. In addition, with the glass substrate 1 as a reference, the heater 30 is arranged opposite to the sputtering target 29 on the opposite side. The heating machine 30 faces the other side 52 of the glass substrate 1 in the thickness direction.

The film formation area 33 is divided in the middle of the conveyance direction of the second guide roller 28 and the third guide roller 31. In the film formation area 33, a sputtering target 29 and a heater 30 are arranged.

The third guide roller 31 guides the glass substrate 1 (specifically, the transparent conductive glass 3 provided with the glass substrate 1 and the transparent conductive layer 2 in the thickness direction) (see FIG. 2C) after the film formation to The first cooling roll 34 of the cooling device 13. The third guide roller 31 is arranged on the downstream side of the sputtering target 29 and on the upstream side of the first cooling roller 34 (described below). The configuration of the third guide roller 31 is the same as that of the first guide roller 26.

The sputtering housing 32 houses the second guide roller 28, the sputtering target 29, the heater 30, and the third guide roller 31. The sputtering housing 32 constitutes a film forming chamber including a film forming area 33. The sputtering shell 32 is configured to adjust its interior to a vacuum state. In addition, although not shown, the sputtering apparatus 12 includes other elements (anode, cathode, Ar gas introduction device, etc.) for performing sputtering. Specific examples of the sputtering device 12 include a two-pole type sputtering device, an electron cyclotron resonance type sputtering device, a magnetron type sputtering device, an ion beam type sputtering device, and the like.

The cooling device 13 is arranged on the downstream side of the sputtering device 12 so as to be adjacent to the sputtering device 12. The cooling device 13 cools the transparent conductive glass 3 heated by the sputtering device 12. The cooling device 13 includes a first cooling roll 34, a second cooling roll 35, and a cooling housing 36.

The first cooling roll 34 is arranged on the upstream side in the cooling device 13. The second cooling roll 35 is arranged on the downstream side of the first cooling roll 34. The first cooling roll 34 and the second cooling roll 35 are each configured to be driven by external power or the like to rotate in the arrow direction shown in FIG. 1.

The surface temperature of the first cooling roll 34 and the second cooling roll 35 is, for example, 280° C. or lower, preferably 150° C. or lower, and maintained at, for example, 40° C. or higher, preferably 100° C. or higher.

The cooling housing 36 accommodates the first cooling roller 34 and the second cooling roller 35 inside. The cooling shell 36 is configured to adjust its inside to a vacuum state.

The second static elimination unit 18 is arranged on the downstream side of the cooling device 13 so as to be adjacent to the cooling device 13. The second static elimination part 18 removes static electricity from the transparent conductive glass 3. The second static elimination unit 18 includes a second static elimination machine 37, a fourth guide roller (an example of a guide roller) 38, and a second static elimination housing 39.

The second static elimination machine 37 reduces the charge of the glass substrate 1. The second destaticizer 37 is arranged on the downstream side of the second cooling roll 35 and on the upstream side of the fourth guide roll 38. The configuration of the second antistatic machine 37 is the same as that of the first antistatic machine 25.

The fourth guide roller 38 guides the transparent conductive glass 3 transported from the second cooling roller 35 by the second static elimination machine 37 to the second driving roller 40 of the winding unit 16. The fourth guide roller 38 is arranged on the downstream side of the second destaticizer 37 and on the upstream side of the second drive roller 40. The structure of the fourth guide roller 38 is the same as that of the first guide roller 26.

The second static elimination housing 39 houses the second static elimination machine 37 and the fourth guide roller 38 inside. The second antistatic housing 39 is configured to adjust its inside to a vacuum state.

The winding part 16 is arranged on the most downstream side in the conveying device 11 and is arranged on the downstream side of the second static elimination machine 37 so as to be adjacent to the second static elimination machine 37. The winding part 16 winds up the transparent conductive glass 3 together with the 2nd protective material 6 (refer FIG. 2D). The winding unit 16 includes a second driving roller 40, a winding roller 41, a protective material unwinding roller 42, a protective material guide roller 43, a nip roller 44, and a winding housing 45.

The second driving roller 40 is arranged on the downstream side of the fourth guide roller 38 and on the upstream side of the winding roller 41. The second driving roller 40 is configured to be provided with power for conveying the transparent conductive glass 3 including the glass substrate 1 from the outside. Thereby, the second drive roller 40 rotates in the arrow direction shown in FIG. 1 based on the above-mentioned external power. Thereby, the second drive roller 40 conveys the transparent conductive glass 3 to the winding roller 41.

However, the second driving roller 40 is configured such that the other surface 54 of the second protective material 6 in the thickness direction is in contact with the nip roller 44 in a state in which it is in contact with one surface 53 in the thickness direction of the transparent conductive glass 3. That is, the second driving roller 40 and the nip roller 44 constitute a nip mechanism.

The maximum height roughness Rz of the surface of the second drive roller 40 is not particularly limited. The maximum height roughness Rz of the surface of the second drive roller 40 is, for example, greater than the maximum height roughness Rz of the surface of the first drive roller 22, and specifically, exceeds 0.8 μm.

The winding roller 41 winds up the laminated body 7 (described below) of the transparent conductive glass 3 and the second protective material 6 conveyed between the second driving roller 40 and the nip roller 44. The take-up roller 41 is configured to be driven by external power or the like to rotate in the arrow direction shown in FIG. 1.

The protective material unwinding roller 42 is arranged in the vicinity of the winding roller 41. The second protective material 6 in the form of a roll is placed on the protective material unwinding roller 42. That is, the second protective material 6 long in the conveying direction is wound on the surface of the protective material unwinding roller 42. The protective material unwinding roller 42 is configured to be driven by external power or the like to rotate in the direction of the arrow shown in FIG. 1. The protection material unwinding roller 42 unwinds the second protection material 6 to the protection material guide roller 43.

The protection material guide roller 43 guides the second protection material 6 unwound from the protection material unwinding roller 42 to the nip roller 44. The protective material guide roller 43 is arranged in the middle of the conveying direction of the protective material unwinding roller 42 and the nip roller 44.

The nip roller 44 and the second drive roller 40 laminate the second protective material 6 on the transparent conductive glass 3. The nip roller 44 is arranged to face the second drive roller 40. The nip roller 44 is configured such that its surface and the surface of the second drive roller 40 can sandwich and laminate the transparent conductive glass 3 and the second protective material 6. Examples of the material of the nip roller 44 include elastomers such as rubber.

The winding housing 45 accommodates the second driving roller 40, the winding roller 41, the protective material unwinding roller 42, the protective material guide roller 43, and the nip roller 44 in the inside thereof. The take-up housing 45 is configured to adjust its inside to a vacuum state.

2. Manufacturing method of transparent conductive glass 1 and 2A to 2D, the method of manufacturing the transparent conductive glass 3 using the transport film forming apparatus 10 will be described. The manufacturing method of the transparent conductive glass 3 includes: a preparation step, which prepares the substrate 4 to be transported; a peeling step, which peels off the first protective material 5 from the glass substrate 1; and a transport step, which is performed by the first to second 2 The driving rollers (22, 40) transport the glass substrate 1; the guiding step is to guide the glass substrate 1 through the first to fourth guide rollers (26, 28, 31, 38); the film forming step is to The transparent conductive layer 2 is disposed on the glass substrate 1 under vacuum; the cooling step is to cool the transparent conductive glass 3; and the winding step is to wind the transparent conductive glass 3 onto the winding roller 41. Hereinafter, each step is described in detail.

First, the base material 4 is prepared to be transported on the unwinding roller 21 (preparation step). Specifically, the base material 4 is prepared to be transported and placed on the unwinding roller 21.

The conveying base material 4 is a glass base material with a protective material. Specifically, the glass base material 1 and the first protective material 5 are provided in this order toward the other side in the thickness direction (see FIG. 2A). The conveying base material 4 is elongated in the conveying direction, and is wound into a roll shape. A known or commercially available one can be used for such a roll-shaped conveying base material 4.

The glass substrate 1 has a film shape (including a sheet shape), and is formed of transparent glass. Examples of the glass include alkali-free glass, soda glass, borosilicate glass, and aluminosilicate glass.

The glass substrate 1 has flexibility.

On the other hand, the mechanical strength of the glass substrate 1 is generally low (fragile), and the distance L between the two ends at break in the bending test measured below is, for example, 15 mm or less, or 20 mm or less.

As shown in Fig. 4, specifically, the glass substrate 1 is cut and processed to a length of 120 mm, and both ends in the longitudinal direction are clamped to each of two jigs 81 arranged opposite to each other with an interval.部82. Then, the two jigs 81 are slowly approached to each other, and the length L between the two clamping portions 82 when the glass substrate 1 is broken is obtained as the distance L between the two ends when the glass substrate 1 is broken.

The other surface 52 in the thickness direction of the glass substrate 1 is flat. Specifically, the other surface 52 in the thickness direction of the glass substrate 1 has a maximum height roughness Rz of, for example, 1 μm or less, 0.1 μm or less, and furthermore, of 0.01 μm or less, and a maximum height roughness Rz of, for example, 0.0001 μm or more. Like the other surface 52 described above, one surface 51 in the thickness direction of the glass substrate 1 is flat and has the maximum height roughness Rz described above.

The thickness of the glass substrate 1 is, for example, 250 μm or less, preferably 200 μm or less, more preferably 150 μm or less, still more preferably 100 μm or less, and, for example, 10 μm or more, preferably 40 μm or more.

Commercially available products can be used for such a glass substrate 1, and for example, G-leaf series (manufactured by Nippon Electric Glass Co., Ltd.) can be used.

The first protective material 5 prevents the glass substrates 1 from contacting each other to be damaged when the roll-shaped glass substrate 1 is rolled out. The first protective material 5 has a film shape and is arranged on the other surface 52 of the glass substrate 1 in the thickness direction.

As the first protective material 5, for example, an adhesive film, spacer paper, etc. may be mentioned.

The film with adhesive has a polymer film and an adhesive layer in the thickness direction.

Examples of polymer films include polyester films (polyethylene terephthalate film, polybutylene terephthalate film, polyethylene naphthalate film, etc.), polycarbonate film, Olefin-based film (polyethylene film, polypropylene film, cycloolefin film, etc.), acrylic film, polyether-based film, polyarylate-based film, melamine-based film, polyamide-based film, polyimide-based film , Cellulose-based films, and polystyrene-based films.

The adhesive layer is a pressure-sensitive adhesive layer, such as acrylic adhesive layer, rubber adhesive layer, silicone adhesive layer, polyester adhesive layer, polyurethane adhesive layer, Polyamide-based adhesive layer, epoxy-based adhesive layer, vinyl alkyl ether-based adhesive layer, fluorine-based adhesive layer, etc.

As the spacer paper, for example, Dowling paper, Japanese paper, kraft paper, cellophane, synthetic paper, top coat paper, etc. can be mentioned.

The thickness of the first protective material 5 is, for example, 10 μm or more, preferably 30 μm or more, and, for example, 1000 μm or less, preferably 500 μm or less.

Subsequently, the transport film forming apparatus 10 is operated. Specifically, all the casings (the unwinding casing 24, the first antistatic casing 27, the sputtering casing 32, the cooling casing 36, the second antistatic casing 39, and the winding casing 45) are vacuumed, and all the drive rollers ( Take-up roller 21, first to second drive rollers (22, 40), protective material take-up roller 23, first to second cooling rollers (34, 35), take-up roller 41, protective material take-up roller 42) Rotation drive. In addition, the static elimination unit 15 (the first static elimination machine 25 and the second static elimination machine 37), the cooling device 13, the sputtering device 12, and the like are also operated. Thereby, the conveyed base material 4 is conveyed to the downstream side (conveying step), and the peeling step, the film forming step, the cooling step, and the winding step are performed in this order. In addition, with all the guide rollers (the first guide roller 26, the second guide roller 28, the third guide roller 31, the fourth guide roller 38), the protective material take-up roller 23, the protective material take-up roller 42, the protective material guide The rotation of the roller 43 and the nip roller 44 implements the guiding step.

Specifically, in the unwinding section 14, the conveying base material 4 is unwound from the unwinding roller 21. At this time, the first protective material 5 is peeled from the glass substrate 1 (peeling step). The first protective material 5 is wound on the protective material winding roller 23. On the other hand, the glass base material 1 is conveyed to the 1st static elimination part 17 (refer FIG. 2B) by the 1st drive roller 22 alone (conveyance step). In the state where one surface 51 of the thickness direction of the glass substrate 1 is in contact with the first drive roller 22, the other surface 52 (non-contact surface 52) of the thickness direction of the glass substrate 1 is not in contact with other members. Even if the glass base material 1 comes into contact with the first driving roller 22 and is charged, the first static elimination machine 25 of the first static elimination part 17 can be operated to remove static electricity.

Then, the glass substrate 1 is guided to the sputtering device 12 by the first guide roller 26 (guide step).

Then, in the sputtering device 12, the glass substrate 1 is guided to the film formation area 33 by the second guide roller 28 (guide step). In the film formation area 33, sputtering is performed on the glass substrate 1. Specific examples of sputtering include a two-pole sputtering method, an electron cyclotron resonance sputtering method, a magnetron sputtering method, an ion beam sputtering method, and the like. The air pressure during sputtering (that is, the air pressure of the film forming area 33) is a vacuum, preferably less than 1.0 Pa, more preferably 0.5 Pa or less.

Thereby, in the film-forming area 33, the transparent conductive layer 2 is formed on one surface 51 of the glass substrate 1 in the thickness direction, and a transparent conductive layer having the glass substrate 1 and the transparent conductive layer 2 in order toward the thickness direction is manufactured. Flexible glass 3 (refer to FIG. 2C) (film forming step).

In addition, at the same time as sputtering, the transparent conductive glass 3 is heated by the heating machine 30.

The surface temperature of the transparent conductive glass 3 heated by the heater 30 is, for example, 200° C. or higher, preferably 300° C. or higher, more preferably 400° C. or higher, and, for example, 800° C. or lower, preferably 600° C. or lower. With this, for example, when the material of the transparent conductive layer 2 is ITO, the transparent conductive layer 2 can be crystallized at a high temperature simultaneously with the film formation of the transparent conductive layer 2 so that the conductivity of the transparent conductive layer 2 can be improved.

After that, the transparent conductive glass 3 is guided to the cooling device 13 by the third guide roller 31 (guide step).

In the cooling device 13, the transparent conductive glass 3 contacts the first cooling roll 34 and the second cooling roll 35 in this order to be cooled (cooling step).

The surface temperature of each cooling roll (34, 35) is, for example, 280°C or lower, preferably 150°C or lower, and, for example, 40°C or higher.

At this time, from the viewpoint of enlarging the contact area between the transparent conductive glass 3 and the cooling rollers 34 and 35 (and further improving the cooling efficiency), the rotating shaft of the first cooling roller 34 and the rotating shaft of the second cooling roller 35 are connected The transparent conductive glass 3 is transported by cross-cutting of the line segment.

At this time, in the glass substrate 1 of the transparent conductive glass 3, the other surface 52 in the thickness direction directly contacts the second cooling roll 35. On the other hand, in the transparent conductive layer 2 of the transparent conductive glass 3, one surface 53 in the thickness direction directly contacts the first cooling roller 34. After that, the transparent conductive glass 3 is transported from the cooling device 13 to the second static electricity removal unit 18.

At this time, on the other side 52 in the thickness direction of the transparent conductive glass 3 (the other side 52 in the thickness direction of the glass substrate 1), even if it is charged due to friction with the second cooling roller 35, it can be statically removed by the second The second static elimination device 37 of the section 18 operates to remove static electricity. Furthermore, since the transparent conductive layer 2 is conductive on one surface 53 in the thickness direction of the transparent conductive glass 3 (the surface 53 in the thickness direction of the transparent conductive layer 2), even if it rubs against the first cooling roller 34, it is usually not charged. .

After that, the transparent conductive glass 3 is guided to the winding part 16 by the fourth guide roller 38 (guide step).

In the winding part 16, the second protective material 6 is wound out from the protective material unwinding roller 42, is guided by the protective material guide roller 43, and is conveyed to the nip roller 44.

On the other hand, the transparent conductive glass 3 passes between the second drive roller 40 and the nip roller 44 together with the second protective material 6, and the second protective material 6 is laminated to the other surface 52 of the transparent conductive glass 3 in the thickness direction.

In the state where one surface 53 of the transparent conductive glass 3 in the thickness direction of the laminated body 7 is in contact with the second driving roller 40, the other surface 54 (contact surface 54) in the thickness direction of the second protective material 6 in the laminated body 7 is in contact with the nip roller 44 (Be pressurized).

After that, the transparent conductive glass 3 is wound up on the winding roller 41 together with the second protective material 6 (winding step). Specifically, a laminate 7 (see FIG. 2D) provided with a transparent conductive glass 3 and a second protective material 6 arranged on the other surface 52 in the thickness direction (the surface 52 opposite to the transparent conductive layer 2) is wound In a roll. The layered body 7 is provided with a second protective material 6, a glass base material 1 and a transparent conductive layer 2 in this order toward one side in the thickness direction.

3. Purpose of transparent conductive glass The transparent conductive glass 3 is used for optical devices such as image display devices, for example. When the transparent conductive glass 3 is installed in an image display device (specifically, an image display device having image display elements such as an LCD (liquid crystal display, liquid crystal display) module, an organic EL module, etc.), it is transparent The conductive glass 3 is used, for example, as a base material for touch panels, an anti-reflection base material, etc., and is preferably used as a base material for touch panels. As the form of the touch panel, various methods such as an optical method, an ultrasonic method, an electrostatic capacitance method, and a resistive film method can be cited, and it is particularly suitable for use in an electrostatic capacitance method touch panel.

4. The effect of an implementation method In addition, in the conveying device 11, each of the first to fourth guide rollers (26, 28, 31, 38) has a large maximum height roughness Rz of 1.0 μm or more. Therefore, it is possible to suppress the adhesion of the glass substrate 1 in close contact with the surfaces of the first to fourth guide rollers (26, 28, 31, 38). Therefore, the glass substrate 1 can be prevented from being damaged when it is separated from each of the first to fourth guide rollers (26, 28, 31, 38). Therefore, the glass base material 1 can be reliably conveyed between the unwinding roller 21 and the winding-up roller 41. As shown in FIG.

On the other hand, if the maximum height roughness Rz of the surface of each of the first to fourth guide rollers (26, 28, 31, 38) exceeds 50 μm, the first to fourth guide rollers ( 26, 28, 31, 38) the surface of the glass substrate 1 (the one surface 51 and the other surface 52 in the thickness direction) will be scratched.

However, when each of the first to fourth guide rollers (26, 28, 31, 38) has a maximum height roughness Rz of 50 μm or less in the conveying device 11, the surface of the glass substrate 1 can be suppressed Bruises.

The conveying device 11 further includes each of the first to second driving rollers (22, 40), so that the glass substrate 1 can be conveyed more reliably.

Moreover, when the surface of each of the first to second drive rollers (22, 40) has a maximum height roughness Rz of 0.8 μm or less, it is possible to suppress the difference between the first to second drive rollers (22, 40) The surface slides with respect to the glass base material 1, and the rotation of each of the first to second drive rollers (22, 40) can be reliably converted into the conveyance of the glass base material 1, so that the glass base material 1 can be conveyed more reliably.

In addition, since the transport film forming apparatus 10 includes the transport device 11 and the sputtering device 12, the glass substrate 1 can be prevented from being damaged, and the transparent conductive layer 2 can be provided on the glass substrate 1. Therefore, the transparent conductive glass 3 can be manufactured reliably.

Moreover, since the manufacturing method of the transparent conductive glass 3 uses the said conveying film-forming apparatus 10, it can suppress that the glass base material 1 adheres to the 1st-4th guide rollers (26, 28, 31, 38). Therefore, the glass substrate 1 can be prevented from being damaged when it is separated from the first to fourth guide rollers (26, 28, 31, 38), and furthermore, the transparent conductive layer 2 can be provided on the glass substrate 1 to reliably produce a laminate 7.

4. Variations In the following modification examples, the same reference numerals are given to the same components and steps as those of the above-mentioned one embodiment, and detailed descriptions thereof are omitted. In addition, each modified example can exhibit the same effects as those of the first embodiment, except for special descriptions. Furthermore, an embodiment and its modification examples can be appropriately combined.

As an example of the guide roller of the present invention, the first guide roller 26, the second guide roller 28, the third guide roller 31, and the fourth guide roller 38 are exemplified, but the number may be singular or plural (except 4 other than).

In addition, it is only necessary that at least one surface of any of the four guide rollers has the maximum height roughness Rz (1.0 μm or more). Preferably, any surface of the four guide rollers has the above-mentioned maximum height roughness Rz.

In addition, the conveying device 11 includes first to second driving rollers (22, 40) arranged between the unwinding roller 21 and the winding roller 41, but for example, although not shown, the first to second driving rollers may not be provided. (22, 40) and provided with first to fourth guide rollers (26, 28, 31, 38).

Furthermore, as shown in FIG. 3, as an example of the conveying device of the present invention, the following conveying device 8 can also be exemplified: without the sputtering device 12, the first drive roller 22, and the second drive roller 40 (refer to FIG. 1) but provided The unwinding roller 21, the winding roller 41, and the first guide roller 26 arranged therebetween.

In addition, in the embodiment shown in FIGS. 1 and 2, the transparent conductive layer 2 is exemplified as a functional layer, but as a functional layer, for example, although not shown, it may be, for example, a hard coat layer, an optical adjustment layer, or a metal layer. (For example, a non-transparent conductive layer such as a copper layer) and the like. In addition, as the functional layer, it may be one layer or two or more layers.

In the embodiment shown in FIG. 1, the sputtering device 12 is exemplified as a film forming device, but for example, although not shown, vacuum film forming devices such as a vacuum vapor deposition device and a chemical vapor deposition device may also be cited. [Example]

Examples and comparative examples are shown below to explain the present invention more specifically. In addition, the present invention is not limited to any Examples and Comparative Examples. In addition, the specific values of the blending ratio (ratio), physical property values, and parameters used in the following descriptions can be replaced with the corresponding blending ratios (ratio), physical property values, parameters, etc., as described in the above-mentioned "embodiment". (Defined as "below", "not reached" value) or lower limit (defined as "above", "over" value).

Example 1 The transport film forming apparatus 10 described in one embodiment is prepared. The maximum height roughness Rz of each of the first to fourth guide rollers (26, 28, 31, 38) was measured based on JIS B 0601 (2009), and the results were all 1.0 μm.

The maximum height roughness Rz of each of the first to second drive rollers (22, 40) was measured based on JIS B 0601 (2009), and the results were all 0.2 μm.

Next, a G-leaf (manufactured by Nippon Electric Glass Co., Ltd.) with a thickness of 50 μm and a maximum height roughness Rz of 0.001 μm on the other side 52 in the thickness direction, and the first protective material 5 arranged on the other side 52 in the thickness direction The conveying substrate 4 is placed on the unwinding roll 21 as the glass substrate 1 (preparation step).

Then, the peeling step, the film forming step, the cooling step, and the winding step are sequentially implemented. In addition, the conveying step is performed by the first to second driving rollers (22, 40), and the guiding step is performed by the first to fourth guide rollers (26, 28, 31, 38).

In the film forming step, a transparent conductive layer 2 with a material of ITO and a thickness of 130 nm is formed on one side 51 of the glass substrate 1 in the thickness direction.

Example 2 ~ Example 4 According to Table 1, the maximum height roughness Rz of the surface of the first to fourth guide rollers (26, 28, 31, 38) was changed, except that the treatment was performed in the same manner as in Example 1.

Comparative example 1 to comparative example 2 According to Table 1, change the maximum height roughness Rz of the surface of the first to fourth guide rollers (26, 28, 31, 38), except that the treatment is performed in the same manner as in Example 1, and try to transport the glass substrate材1.

However, since the glass substrate 1 was adhered to the first guide roller 26 and the glass substrate was damaged, the glass substrate 1 could not be transported thereafter. As a result, the transparent conductive layer 2 could not be formed, and the laminate 7 could not be obtained. It is also impossible to wind the layered body 7 by the wind-up roller 41.

[Assessment] ＜Damage of glass substrate＞ The damage of the glass substrate 1 of each of Example 1 to Comparative Example 2 was evaluated according to the following criteria. ○: The glass substrate 1 is not damaged. ×: The glass substrate was damaged due to adhesion to the guide roller.

＜Scratches on the other side of the glass substrate in the thickness direction＞ The other side 52 in the thickness direction of the glass substrate 1 of each of Example 1 to Comparative Example 2 was observed with a camera, and evaluated according to the following criteria. ○: No scratches are observed on the other surface 52 of the glass substrate 1 in the thickness direction. ×: Scratches are observed on the other surface 52 in the thickness direction of the glass substrate 1.

[Table 1] Table 1 Examples, comparative examples Example 1 Example 2 Example 3 Example 4 Comparative example 1 Comparative example 2 The arithmetic average roughness of the surface of the 1st~4th guide roller Rz(μm) 1 2.5 20 55 0.2 0.8 The arithmetic average roughness of the surface of the 1st~2nd drive roller Rz(μm) 0.2 0.2 0.2 0.2 0.2 0.2 Assessment Damage to the glass substrate ○ ○ ○ ○ X X Scratches on the surface of the glass substrate ○ ○ ○ X ○ ○

In addition, the above-mentioned invention is provided as an exemplary embodiment of this invention, but it is only an illustration, and cannot be interpreted restrictively. Variations of the present invention that have been clarified by those in this technical field are included in the scope of the following patent applications.

1: Glass substrate 2: Transparent conductive layer 3: Transparent conductive glass 4: Transport substrate 5: The first protective material 6: The second protective material 7: Laminated body 8: Conveying device 10: Transporting the film forming device 11: Conveying device 12: Sputtering device 13: Cooling device 14: Roll out part 15: Go to the static department 16: Coiling section 17: The first anti-static part 18: The second anti-static part 21: Roll out roller 22: 1st drive roller 23: Protective material take-up roller 24: Roll out the shell 25: The first anti-static machine 26: The first guide roller 27: No. 1 anti-static shell 28: The second guide roller 29: Sputtering target 30: heating machine 31: The third guide roller 32: Sputtering shell 33: Film-forming area 34: 1st cooling roll 35: 2nd cooling roll 36: Cooling shell 37: The second anti-static machine 38: 4th guide roller 39: The second to the static shell 40: 2nd drive roller 41: take-up roller 42: Protective material roll-out roller 43: Protective material guide roller 44: nip roller 45: Coiling shell 51: One side of the thickness direction of the glass substrate 52: The other side of the thickness direction of the glass substrate 53: One side in the thickness direction of transparent conductive glass 54: The other side of the thickness direction of the second protective material 81: Fixture 82: stuck part

Fig. 1 shows a transport film forming apparatus as an embodiment of the manufacturing apparatus of the present invention. 2A to 2D are cross-sectional views of the conveyed objects conveyed by the conveying film forming device of Fig. 1, Fig. 2A shows the first protective material and glass substrate rolled out from the unwinding roller, and Fig. 2B shows the conveyed material to the first driving roller The glass substrate, FIG. 2C shows the glass substrate and the transparent conductive layer conveyed to the cooling device, and FIG. 2D shows the second protective material, the transparent conductive layer and the glass substrate wound by the winding roller. Fig. 3 shows a modified example of the conveying device of the present invention. Figure 4 shows two jigs used in the bending test of the glass substrate.

1: Glass substrate

3: Transparent conductive glass

4: Transport substrate

5: The first protective material

6: The second protective material

7: Laminated body

10: Transporting the film forming device

11: Conveying device

12: Sputtering device

13: Cooling device

14: Roll out part

15: Go to the static department

16: Coiling section

17: The first anti-static part

18: The second anti-static part

21: Roll out roller

22: 1st drive roller

23: Protective material take-up roller

24: Roll out the shell

25: The first anti-static machine

26: The first guide roller

27: No. 1 anti-static shell

28: The second guide roller

29: Sputtering target

30: heating machine

31: The third guide roller

32: Sputtering shell

33: Film-forming area

34: 1st cooling roll

35: 2nd cooling roll

36: Cooling shell

37: The second anti-static machine

38: 4th guide roller

39: The second to the static shell

40: 2nd drive roller

41: take-up roller

42: Protective material roll-out roller

43: Protective material guide roller

44: nip roller

45: Coiling shell

Claims (5)

A conveying device for glass substrates, characterized in that: Take-up roller, which is constructed by taking out a flexible glass substrate; Take-up roller, which is constructed by taking up the above-mentioned glass substrate; and The guide roller is arranged between the unwinding roller and the winding roller in the conveying direction of the glass substrate; and The surface of the guide roller has a maximum height roughness Rz of 1.0 μm or more. The glass substrate conveying device of claim 1, wherein the surface of the guide roller has a maximum height roughness Rz of 50 μm or less. For the glass substrate conveying device of claim 1 or 2, further comprising a drive roller arranged between the unwinding roller and the winding roller in the conveying direction, and is configured to be provided for conveying The power of the above glass substrate, The surface of the above-mentioned driving roller has a maximum height roughness Rz of 0.8 μm or less. A manufacturing device for laminated glass, which is characterized by having: Such as the conveying device of any one of claims 1 to 3; and The film forming apparatus is arranged between the unwinding roll and the winding roll in the conveying direction, and is configured to provide a functional layer on the glass substrate under vacuum. A method for manufacturing laminated glass, characterized in that it is a method for manufacturing laminated glass using the manufacturing device for laminated glass as in claim 4, and includes the following steps: Rolling the above-mentioned glass substrate from the above-mentioned unwinding roller; Guide the glass substrate by the guide roller; Disposing the functional layer on the glass substrate under vacuum by the film forming device; and The laminated glass provided with the glass substrate and the functional layer is wound up by the winding roller.

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