TW202106612A - Method for producing hydrogen fluoride - Google Patents

Method for producing hydrogen fluoride Download PDF

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TW202106612A
TW202106612A TW109121588A TW109121588A TW202106612A TW 202106612 A TW202106612 A TW 202106612A TW 109121588 A TW109121588 A TW 109121588A TW 109121588 A TW109121588 A TW 109121588A TW 202106612 A TW202106612 A TW 202106612A
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hydrogen fluoride
aqueous solution
mass
sulfuric acid
acid
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TW109121588A
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Chinese (zh)
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佐藤英俊
大深直俊
諸隈辰馬
天野庄三
和田光浩
飯島朋範
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日商三井化學股份有限公司
日商下關三井化學股份有限公司
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    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/19Fluorine; Hydrogen fluoride

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  • Inorganic Chemistry (AREA)
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Abstract

The present invention addresses the problem of providing a method for producing hydrogen fluoride, whereby it becomes possible to provide hydrogen fluoride with high efficiency using synthetic fluorite or the like. The present invention is a method for producing hydrogen fluoride, comprising: a first step of reacting a mixture comprising at least one compound selected from an alkali metal fluoride and an alkaline earth metal fluoride, an inorganic acid and an Si element-containing compound to produce an aqueous solution A containing hydrogen fluoride and hexafluorosilicic acid and at least one compound selected from an alkali metal salt and an alkaline earth metal salt; a second step of condensing the aqueous solution A to produce an aqueous solution B which is a condensed solution containing hydrogen fluoride and hexafluorosilicic acid; and a third step of adding sulfuric acid to the aqueous solution B to generate a gas containing silicon tetrafluoride and hydrogen fluoride, and then separating and collecting hydrogen fluoride from the gas.

Description

氟化氫的製造方法Manufacturing method of hydrogen fluoride

本揭示是有關於一種氟化氫的製造方法。This disclosure relates to a method for producing hydrogen fluoride.

氟化氫於水溶液或氣體的狀態下被用作半導體裝置的蝕刻材料或各種氟化物的製造原料。Hydrogen fluoride is used as an etching material for semiconductor devices or as a raw material for manufacturing various fluorides in the state of an aqueous solution or gas.

作為工業上的氟化氫(hydrogen fluoride,HF)的製造方法,已知有將以氟化鈣(CaF2 )為主要成分的天然螢石與硫酸混合而進行加熱的方法。一般而言,組合使用被稱作共捏合機(ko-kneader)的帶套管的預反應器與外熱式旋轉窯,藉由兩階段的反應步驟產生氟化氫(HF)。旋轉窯藉由使約500℃的熱風在套管中流通而被加熱,反應混合物的溫度於與預反應器連接的旋轉窯的入口附近為約100℃,朝向位於其相反側的旋轉窯的出口而上升,於出口附近為約300℃。產生固體形狀的無水石膏作為副生成物。As an industrial production method of hydrogen fluoride (HF), a method of mixing natural fluorite containing calcium fluoride (CaF 2 ) as a main component with sulfuric acid and heating is known. Generally speaking, a combination of a pre-reactor with a sleeve called a ko-kneader and an externally heated rotary kiln is used to produce hydrogen fluoride (HF) through a two-stage reaction step. The rotary kiln is heated by circulating hot air of about 500°C in the sleeve. The temperature of the reaction mixture is about 100°C near the entrance of the rotary kiln connected to the pre-reactor, toward the outlet of the rotary kiln on the opposite side. The rise is about 300°C near the exit. Anhydrous gypsum in a solid shape is produced as a by-product.

於該方法中,亦正在研究使用藉由氟的固定化處理而獲得的人工螢石代替天然螢石。但是,人工螢石的粒徑或雜質的含量與天然螢石大不相同,因此其反應性亦大不相同。因此,人工螢石的利用停留於天然螢石中混合兩成左右的人工螢石而使用的程度。為了提高人工螢石的比例,亦正在研究改善人工螢石的粒徑或雜質的含量的設計(例如專利文獻1及專利文獻2)。但是,該些設計存在作為氟化氫的原料的人工螢石的價格過高的問題。In this method, research is also underway to use artificial fluorite obtained by immobilization of fluorine instead of natural fluorite. However, the particle size or impurity content of artificial fluorite is very different from that of natural fluorite, so its reactivity is also very different. Therefore, the utilization of artificial fluorite remains to the extent that about 20% of artificial fluorite is mixed with natural fluorite. In order to increase the proportion of artificial fluorite, designs for improving the particle size and impurity content of artificial fluorite are also being studied (for example, Patent Document 1 and Patent Document 2). However, these designs have a problem that the price of artificial fluorite, which is a raw material of hydrogen fluoride, is too high.

作為不使用旋轉窯而使用人工螢石的氫氟酸的製造方法,例如於專利文獻3中記載一種方法,所述方法是使氟化鈣與硫酸反應來製造氟化氫的方法,其包括:(a)以硫酸/氟化鈣的莫耳比成為0.9~1.1的量,於0℃~70℃的溫度下使平均粒徑1 μm~40 μm的氟化鈣粒子及硫酸進行混合及反應,獲得固體狀反應混合物的步驟;以及(b)將該固體狀反應混合物加熱至100℃~200℃的溫度並使其反應,生成氟化氫在氣相中獲得的步驟。 [現有技術文獻] [專利文獻]As a method of producing hydrofluoric acid using artificial fluorite without using a rotary kiln, for example, a method described in Patent Document 3 is a method of reacting calcium fluoride with sulfuric acid to produce hydrogen fluoride, which includes: (a ) The molar ratio of sulfuric acid/calcium fluoride is 0.9-1.1, and calcium fluoride particles with an average particle diameter of 1 μm-40 μm and sulfuric acid are mixed and reacted at a temperature of 0°C to 70°C to obtain a solid And (b) the step of heating the solid reaction mixture to a temperature of 100°C to 200°C and reacting to generate hydrogen fluoride in the gas phase. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利特開2015-74575號公報 [專利文獻2]日本專利特開2015-54809號公報 [專利文獻3]日本專利特開2011-011964號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-74575 [Patent Document 2] Japanese Patent Laid-Open No. 2015-54809 [Patent Document 3] Japanese Patent Laid-Open No. 2011-011964

[發明所欲解決之課題] 發明者等人進行了研究,結果可知於專利文獻3所記載的發明中存在如下情況:固體狀反應混合物中的氟化氫的含有率低,難以將人工螢石中的氟效率良好地轉換成氟化氫。因此,本揭示中課題在於提供一種可使用人工螢石等效率良好地提供氟化氫的氟化氫的製造方法。[The problem to be solved by the invention] The inventors conducted studies, and as a result, it was found that in the invention described in Patent Document 3, the content of hydrogen fluoride in the solid reaction mixture is low, and it is difficult to efficiently convert the fluorine in the artificial fluorite into hydrogen fluoride. Therefore, the subject of the present disclosure is to provide a method for producing hydrogen fluoride that can efficiently supply hydrogen fluoride using artificial fluorite or the like.

[解決課題之手段] 本揭示是有關於例如下述[1]~[11]。 [1] 一種氟化氫的製造方法,其包括: 第一步驟,使包含選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物、無機酸、以及含Si元素的化合物的混合物反應,獲得包含氟化氫及六氟矽酸的水溶液A、與選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物; 第二步驟,將所述水溶液A濃縮,獲得作為包含氟化氫及六氟矽酸的濃縮液的水溶液B;以及 第三步驟,對所述水溶液B賦予硫酸,產生包含四氟化矽及氟化氫的氣體,自所述氣體中分離氟化氫並加以回收。 [2] 如[1]所述的氟化氫的製造方法,其中所述含Si元素的化合物為選自由四氟化矽及二氧化矽所組成的群組中的至少一種。 [3] 如[1]或[2]所述的氟化氫的製造方法,其中選自所述鹼金屬鹽及鹼土金屬鹽中的至少一種化合物是化合水的比率為19質量%以上的二水石膏。 [4] 如[1]至[3]中任一項所述的氟化氫的製造方法,其中所述第一步驟是於無機酸的濃度為40質量%以下且溫度90℃以下的條件下進行。 [5] 如[1]至[4]中任一項所述的氟化氫的製造方法,其中作為包含選自所述鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物的原料,使用以乾燥重量計包含60質量%以上的氟化鈣的人工螢石。 [6] 如[1]至[5]中任一項所述的氟化氫的製造方法,其中相對於選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物1莫耳,使用無機酸1.0莫耳~1.5莫耳、含Si元素的化合物0.2莫耳~1.0莫耳。 [7] 如[1]至[6]中任一項所述的氟化氫的製造方法,其中相對於水溶液B的總質量,所述水溶液B中的六氟矽酸的含有率為35質量%以上,且所述水溶液B中的F元素與Si元素的莫耳比(F/Si)為6.0以上。 [8] 如[1]至[7]中任一項所述的氟化氫的製造方法,其中所述第三步驟是於所述水溶液B中加入75質量%以上的濃硫酸或發煙硫酸,進行脫水分解,而產生包含四氟化矽及氟化氫的氣體, 使80質量%以上的硫酸吸收所述氟化氫而獲得吸收液, 將所述吸收液加溫至100℃以上,使氟化氫揮發並回收氟化氫。 [9] 如[1]至[8]中任一項所述的氟化氫的製造方法,其中將所述第三步驟中生成的氟化氫分離並回收後獲得的無機酸水溶液用作第一步驟中的無機酸水溶液的至少一部分。 [10] 如[1]至[9]中任一項所述的氟化氫的製造方法,其中將所述第三步驟中生成的氟化氫分離並回收後獲得的無機酸水溶液提高濃度,而於第三步驟再利用。 [11] 如[1]至[10]中任一項所述的氟化氫的製造方法,其中回收所述第三步驟中生成氟化氫時副產生的四氟化矽,並將該四氟化矽及該四氟化矽與水的反應產物中的至少一者作為所述第一步驟中的含Si元素的化合物的至少一部分而使用、或者於所述第三步驟中添加至所述水溶液B中而使用。[Means to solve the problem] This disclosure relates to, for example, the following [1] to [11]. [1] A manufacturing method of hydrogen fluoride, which includes: The first step is to react a mixture containing at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides, inorganic acids, and Si element-containing compounds to obtain an aqueous solution A containing hydrogen fluoride and hexafluorosilicic acid, and At least one compound selected from alkali metal salts and alkaline earth metal salts; In the second step, the aqueous solution A is concentrated to obtain an aqueous solution B as a concentrated solution containing hydrogen fluoride and hexafluorosilicic acid; and In the third step, sulfuric acid is applied to the aqueous solution B to generate a gas containing silicon tetrafluoride and hydrogen fluoride, and the hydrogen fluoride is separated from the gas and recovered. [2] The method for producing hydrogen fluoride as described in [1], wherein the Si element-containing compound is at least one selected from the group consisting of silicon tetrafluoride and silicon dioxide. [3] The method for producing hydrogen fluoride according to [1] or [2], wherein at least one compound selected from the alkali metal salt and alkaline earth metal salt is dihydrate gypsum having a water ratio of 19% by mass or more . [4] The method for producing hydrogen fluoride according to any one of [1] to [3], wherein the first step is performed under the conditions that the concentration of the inorganic acid is 40% by mass or less and the temperature is 90° C. or less. [5] The method for producing hydrogen fluoride according to any one of [1] to [4], wherein as a raw material containing at least one compound selected from the alkali metal fluoride and alkaline earth metal fluoride, it is used to dry Artificial fluorite containing 60% by weight or more of calcium fluoride. [6] The method for producing hydrogen fluoride according to any one of [1] to [5], wherein an inorganic acid of 1.0 is used relative to 1 mol of at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides Mol ~ 1.5 mol, Si element-containing compound 0.2 mol ~ 1.0 mol. [7] The method for producing hydrogen fluoride according to any one of [1] to [6], wherein the content of hexafluorosilicic acid in the aqueous solution B is 35% by mass or more relative to the total mass of the aqueous solution B , And the molar ratio (F/Si) of the F element to the Si element in the aqueous solution B is 6.0 or more. [8] The method for producing hydrogen fluoride according to any one of [1] to [7], wherein the third step is to add 75% by mass or more of concentrated sulfuric acid or fuming sulfuric acid to the aqueous solution B to perform Dehydrate and decompose to produce gas containing silicon tetrafluoride and hydrogen fluoride, The hydrogen fluoride is absorbed by 80% by mass or more of sulfuric acid to obtain an absorption liquid, The absorption liquid is heated to above 100°C to volatilize the hydrogen fluoride and recover the hydrogen fluoride. [9] The method for producing hydrogen fluoride according to any one of [1] to [8], wherein the inorganic acid aqueous solution obtained after separating and recovering the hydrogen fluoride generated in the third step is used as the At least a part of the inorganic acid aqueous solution. [10] The method for producing hydrogen fluoride according to any one of [1] to [9], wherein the inorganic acid aqueous solution obtained after separating and recovering the hydrogen fluoride generated in the third step increases the concentration, and the third step Steps to reuse. [11] The method for producing hydrogen fluoride according to any one of [1] to [10], wherein silicon tetrafluoride that is by-produced when hydrogen fluoride is generated in the third step is recovered, and the silicon tetrafluoride and At least one of the reaction products of silicon tetrafluoride and water is used as at least a part of the Si element-containing compound in the first step, or is added to the aqueous solution B in the third step use.

[發明的效果] 根據本揭示的氟化氫的製造方法,可提供一種可使用人工螢石來效率良好地提供氟化氫的氟化氫的製造方法。另外,於本揭示的氟化氫的製造方法中,作為副生成物而獲得的石膏並非無水石膏或半水石膏,而為商業上有用的二水石膏,因此本揭示的氟化氫的製造方法中經濟性優異。另外,於本揭示的氟化氫的製造方法中,作為副生成物而獲得的二氧化矽的純度高,因此本揭示的氟化氫的製造方法中經濟性優異。另外,於本揭示的氟化氫的製造方法中,可將硫酸或四氟化矽等其他副生成物用於本揭示的氟化氫的製造方法,因此本揭示的氟化氫的製造方法中經濟性優異。[Effects of the invention] According to the method for producing hydrogen fluoride of the present disclosure, it is possible to provide a method for producing hydrogen fluoride that can efficiently supply hydrogen fluoride using artificial fluorite. In addition, in the hydrogen fluoride production method of the present disclosure, the gypsum obtained as a by-product is not anhydrous gypsum or hemihydrate gypsum, but is commercially useful dihydrate gypsum. Therefore, the hydrogen fluoride production method of the present disclosure is excellent in economy . In addition, in the method for producing hydrogen fluoride of the present disclosure, the purity of silicon dioxide obtained as a by-product is high, and therefore, the method for producing hydrogen fluoride of the present disclosure is excellent in economy. In addition, in the production method of hydrogen fluoride of the present disclosure, other by-products such as sulfuric acid or silicon tetrafluoride can be used in the production method of hydrogen fluoride of the present disclosure. Therefore, the production method of hydrogen fluoride of the present disclosure is excellent in economy.

本揭示的氟化氫的製造方法包括下述的第一步驟、第二步驟及第三步驟。 <第一步驟> 第一步驟是使包含選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物、無機酸、以及含Si元素的化合物的混合物反應,獲得包含氟化氫(HF)及六氟矽酸(H2 SiF6 )的水溶液A、與選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物的步驟。The manufacturing method of hydrogen fluoride of the present disclosure includes the following first step, second step, and third step. <First step> The first step is to react a mixture containing at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides, inorganic acids, and Si element-containing compounds to obtain hydrogen fluoride (HF) and hexafluoride A step of an aqueous solution A of silicic acid (H 2 SiF 6 ) and at least one compound selected from alkali metal salts and alkaline earth metal salts.

於第一步驟中,利用含Si元素的化合物,將藉由選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物與無機酸水溶液的反應所生成的氟化氫(HF)固定為六氟矽酸(H2 SiF6 )。 於第一步驟中,不存在含Si元素的化合物的情況下,作為鹼土金屬的代表例的氟化鈣(CaF2 )與作為無機酸的代表例的硫酸(水溶液)的反應依照下述式(1)進行。於該反應中,由於生成的氟化氫停留於溶液中,故式(1)的平衡關係成立,反應於中途停止。例如於30質量%硫酸水溶液中,於反應率30%左右時反應停止。In the first step, a compound containing Si is used to fix hydrogen fluoride (HF) generated by the reaction of at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides with an aqueous inorganic acid solution as hexafluorosilicon Acid (H 2 SiF 6 ). In the first step, in the absence of a Si element-containing compound, the reaction of calcium fluoride (CaF 2 ) as a representative example of alkaline earth metals and sulfuric acid (aqueous solution) as a representative example of inorganic acids is in accordance with the following formula ( 1) Proceed. In this reaction, since the generated hydrogen fluoride stays in the solution, the equilibrium relationship of the formula (1) is established, and the reaction stops in the middle. For example, in a 30% by mass sulfuric acid aqueous solution, the reaction stops when the reaction rate is about 30%.

[數式1] CaF2 (s)+H2 SO4 (sol)⇄CaSO4 ·2H2 O+2HF(sol) (1)[Equation 1] CaF 2 (s)+H 2 SO 4 (sol)⇄CaSO 4 ·2H 2 O+2HF (sol) (1)

於本揭示的第一步驟中,藉由含Si元素的化合物,式(1)的平衡向右側傾斜,因此可促進氟化鈣(CaF2 )的分解。因此,認為氟化鈣的分解率優異。In the first step of the present disclosure, with the Si element-containing compound, the balance of formula (1) is tilted to the right, so that the decomposition of calcium fluoride (CaF 2) can be promoted. Therefore, it is considered that the decomposition rate of calcium fluoride is excellent.

為了提高CaF2 的分解率、即為了使式(1)向右側前進,例如考慮(i)使式(1)中生成的HF揮發而排除至系統外、或(ii)使式(1)中生成的HF與矽酸、硼酸反應並轉換成H2 SiF6 、HBF4 等其他化合物。 於本揭示中,於所述(ii)中,向反應系統中加入與HF反應的含Si元素的化合物,藉此將HF轉換成H2 SiF6 ,使式(1)向右側前進。In order to increase the decomposition rate of CaF 2 , that is, to advance the formula (1) to the right, for example, consider (i) volatilize the HF generated in the formula (1) and exclude it from the system, or (ii) use the formula (1) The generated HF reacts with silicic acid and boric acid and is converted into H 2 SiF 6 , HBF 4 and other compounds. In the present disclosure, in (ii), a Si element-containing compound that reacts with HF is added to the reaction system, thereby converting HF into H 2 SiF 6 , and formula (1) is advanced to the right.

根據含Si元素的化合物的種類,反應的HF的配比數如下述式(2)及式(3)所示般變化,但均可獲得相同的效果。例如於使用SiO2 作為含Si元素的化合物的情況下,成為式(2),於使用SiF4 的情況下,成為式(3)。 [數式2] SiO2 (s)+6HF(sol)→H2 SiF6 (sol)+2H2 O   (2) SiF4 (g)+2HF(sol)→H2 SiF6 (sol)             (3)Depending on the type of the Si element-containing compound, the ratio of the reacted HF varies as shown in the following formulas (2) and (3), but the same effect can be obtained. For example, when SiO 2 is used as the Si element-containing compound, it becomes formula (2), and when SiF 4 is used, it becomes formula (3). [Equation 2] SiO 2 (s) + 6HF (sol) → H 2 SiF 6 (sol) + 2H 2 O (2) SiF 4 (g) + 2HF (sol) → H 2 SiF 6 (sol) (3 )

如所述般,於本揭示的氟化氫的製造方法中,不僅使鹼金屬或鹼金屬氟化物與無機酸進行反應,而且使其反應產物與含Si元素的化合物進行反應,藉此可促進鹼金屬或鹼金屬氟化物的分解,效率優異。另外,可獲得作為副生成物的鹼金屬鹽或鹼土金屬鹽,因此具有廢棄物少的優點。As described above, in the production method of hydrogen fluoride of the present disclosure, not only the alkali metal or alkali metal fluoride is reacted with the inorganic acid, but also the reaction product is reacted with the Si element-containing compound, thereby promoting the alkali metal Or the decomposition of alkali metal fluoride is excellent in efficiency. In addition, an alkali metal salt or alkaline earth metal salt can be obtained as a by-product, so it has the advantage of less waste.

作為所述鹼金屬氟化物,可列舉:氟化鋰、氟化鈉、氟化鉀等。作為所述鹼土金屬氟化物,可列舉:氟化鈣、氟化鍶、氟化鋇等。 作為選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物,並無特別限制,可較佳地使用氟化鈣(CaF2 )。As said alkali metal fluoride, lithium fluoride, sodium fluoride, potassium fluoride, etc. are mentioned. As said alkaline earth metal fluoride, calcium fluoride, strontium fluoride, barium fluoride, etc. are mentioned. The at least one compound selected from alkali metal fluorides and alkaline earth metal fluorides is not particularly limited, and calcium fluoride (CaF 2 ) can be preferably used.

作為包含CaF2 的原料,可列舉螢石或人工螢石,可將該些原料直接用於本揭示的氟化氫的製造方法。就活用本揭示的特徵的觀點而言,可較佳地使用人工螢石。Examples of the raw material containing CaF 2 include fluorite or artificial fluorite, and these raw materials can be directly used in the method for producing hydrogen fluoride of the present disclosure. From the viewpoint of utilizing the characteristics of the present disclosure, artificial fluorite can be preferably used.

人工螢石中的氟化鈣(CaF2 )的含有率越高越佳,以乾燥量計較佳為60質量%以上,更佳為80質量%以上。與先前的氟化氫的製造方法不同,本揭示的氟化氫的製造方法並非自CaF2 直接製造HF,而是經由H2 SiF6 獲得HF,因此於先前的使用人工螢石的氟化氫的製造方法中可能成為問題的SiO2 、CaCO3 、Ca(OH)2 等雜質難以成為問題。因此,作為選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物,較佳為使用人工螢石。The higher the content of calcium fluoride (CaF 2 ) in the artificial fluorite, the better, and it is preferably 60% by mass or more in terms of dry content, and more preferably 80% by mass or more. Different from the previous method of producing hydrogen fluoride, the method of producing hydrogen fluoride of the present disclosure does not directly produce HF from CaF 2 but obtains HF from H 2 SiF 6. Therefore, it may be used in the previous production method of hydrogen fluoride using artificial fluorite. The problematic impurities such as SiO 2 , CaCO 3 , and Ca(OH) 2 are unlikely to be a problem. Therefore, as at least one compound selected from alkali metal fluorides and alkaline earth metal fluorides, artificial fluorite is preferably used.

作為第一步驟中使用的無機酸,例如可列舉:鹽酸、硝酸、磷酸、硫酸等。該些中,就進一步提高與人工螢石的反應性的觀點而言,較佳為硫酸。就容易處理的觀點而言,硫酸較佳為以硫酸水溶液的形態使用。作為第一步驟中使用的無機酸,亦可以成為40質量%以下的方式添加後述的第三步驟中副成的65質量%~80質量%的硫酸等無機酸來使用。As the inorganic acid used in the first step, for example, hydrochloric acid, nitric acid, phosphoric acid, sulfuric acid and the like can be cited. Among these, from the viewpoint of further improving the reactivity with artificial fluorite, sulfuric acid is preferred. From the viewpoint of ease of handling, sulfuric acid is preferably used in the form of an aqueous sulfuric acid solution. As the inorganic acid used in the first step, an inorganic acid such as 65% by mass to 80% by mass of sulfuric acid that is by-produced in the third step described later may be added so as to be 40% by mass or less.

反應液中的無機酸的濃度只要進行反應,則並無特別限制,就獲得二水石膏的觀點而言,較佳為40質量%以下,更佳為20質量%~30質量%。所謂反應液中的無機酸的濃度是指於反應開始的時間點添加無機酸總量時的無機酸的濃度。因此,於滴加無機酸添加的情況下,反應液中的實際的無機酸的濃度有時與此處所述的反應液中的無機酸的濃度不同。另外,所謂反應液中的無機酸的濃度,於包含多種無機酸的情況下是指其合計的濃度。The concentration of the inorganic acid in the reaction liquid is not particularly limited as long as the reaction proceeds. From the viewpoint of obtaining dihydrate gypsum, it is preferably 40% by mass or less, and more preferably 20% by mass to 30% by mass. The concentration of the inorganic acid in the reaction solution refers to the concentration of the inorganic acid when the total amount of the inorganic acid is added at the time when the reaction starts. Therefore, when the inorganic acid is added dropwise, the actual concentration of the inorganic acid in the reaction solution may be different from the concentration of the inorganic acid in the reaction solution described here. In addition, the concentration of the inorganic acid in the reaction solution means the total concentration when a plurality of types of inorganic acids are included.

作為第一步驟中使用的含Si元素的化合物,並無特別限制,例如可列舉二氧化矽(SiO2 )、四氟化矽(SiF4 )等。就提高反應效率的觀點而言,較佳為選自由四氟化矽及二氧化矽所組成的群組中的至少一種。於使用人工螢石的情況下,人工螢石中作為雜質而包含的SiO2 亦可作為含Si元素的化合物來使用。另外,於第三步驟中生成的SiF4 、或於第二步驟中揮發的SiF4 、於第二步驟中產生的SiO2 等亦可作為含Si元素的化合物來使用。The Si element-containing compound used in the first step is not particularly limited, and examples thereof include silicon dioxide (SiO 2 ), silicon tetrafluoride (SiF 4 ), and the like. From the viewpoint of improving reaction efficiency, it is preferably at least one selected from the group consisting of silicon tetrafluoride and silicon dioxide. In the case of using artificial fluorite, SiO 2 contained as an impurity in the artificial fluorite can also be used as a Si element-containing compound. Further, in a third step generates SiF 4, or the second step in the volatile SiF 4, resulting in a second step, SiO 2, etc. can also be used as the compound containing Si element.

作為包含SiO2 的材料,可使用以SiO2 為主要成分的矽藻土、矽酸粉、副產生膠質二氧化矽、含二氧化矽的灰塵、及矽膠、水玻璃、波來鐵(pearlite)等矽酸鹽化合物。 另外,就進一步提高後述的過濾性的觀點而言,亦可包含鹼金屬鹽或鹼土金屬鹽的晶種。作為晶種,並無特別限制,較佳為使用第一步驟中生成的漿料液的一部分。As a material containing SiO 2 , diatomaceous earth with SiO 2 as the main component, silicic acid powder, by-product colloidal silica, silica-containing dust, silica gel, water glass, and pearlite can be used. And other silicate compounds. In addition, from the viewpoint of further improving the filterability described later, a seed crystal of an alkali metal salt or an alkaline earth metal salt may be included. The seed crystal is not particularly limited, but it is preferable to use a part of the slurry liquid produced in the first step.

於第一步驟中,相對於選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物1莫耳,較佳為使用無機酸1.0莫耳~1.5莫耳、含Si元素的化合物0.2莫耳~1.0莫耳,更佳為使用無機酸1.0莫耳~1.4莫耳、含Si元素的化合物0.30莫耳~0.50莫耳,進而佳為使用無機酸1.0莫耳~1.4莫耳、含Si元素的化合物0.30莫耳~0.40莫耳。In the first step, with respect to 1 mol of at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides, it is preferable to use an inorganic acid of 1.0 mol to 1.5 mol, and a Si element-containing compound of 0.2 mol. ~1.0 mol, more preferably inorganic acid 1.0 mol ~ 1.4 mol, Si element-containing compound 0.30 mol ~ 0.50 mol, more preferably inorganic acid 1.0 mol ~ 1.4 mol, Si element-containing Compound 0.30 mol ~ 0.40 mol.

關於無機酸的量,就進一步提高二水石膏的產率、且進一步降低殘留的無機酸的濃度而使後述的第三步驟效率化的觀點而言,較佳為設為所述上限值以下,為了促進氟化鈣等的分解反應,較佳為設為所述下限值以上。關於含Si元素的化合物的量,為了進一步提高過濾性,較佳為設為所述上限值以下,為了進一步促進氟化鈣等的分解反應,即為了使所述式(1)更向右移動,較佳為設為所述下限值以上。Regarding the amount of the inorganic acid, from the viewpoint of further increasing the yield of dihydrate gypsum and further reducing the concentration of the remaining inorganic acid to make the third step described later more efficient, it is preferably set to the upper limit or less. In order to promote the decomposition reaction of calcium fluoride and the like, it is preferably set to be more than the above-mentioned lower limit. Regarding the amount of the Si element-containing compound, in order to further improve the filterability, it is preferably set below the upper limit, in order to further promote the decomposition reaction of calcium fluoride and the like, that is, in order to make the formula (1) more to the right The movement is preferably set to be equal to or higher than the above-mentioned lower limit.

第一步驟的反應例如可將選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物與水混合,向該混合液中滴加硫酸等無機酸,並且添加含Si元素的化合物來進行。The reaction in the first step can be carried out, for example, by mixing at least one compound selected from alkali metal fluorides and alkaline earth metal fluorides with water, adding an inorganic acid such as sulfuric acid to the mixed solution dropwise, and adding a Si element-containing compound.

就提高氟化鈣等的分解率的觀點而言,第一步驟中的反應溫度較佳為高。另一方面,就提高石膏的化合水的含量來獲得二水石膏的觀點而言,反應溫度較佳為95℃以下,更佳為90℃以下,進而佳為80℃以下,特佳為70℃以下。另外,就進一步提高後述的過濾性的觀點而言,反應溫度較佳為80℃以下。反應溫度例如可設為10℃~95℃,較佳為常溫~90℃,更佳為30℃~80℃,進而佳為50℃~70℃。於第一步驟的反應中,發熱量根據使用的含Si元素的化合物的種類與量而不同,較佳為視需要進行加熱或冷卻,將反應溫度維持在所述範圍。From the viewpoint of increasing the decomposition rate of calcium fluoride and the like, the reaction temperature in the first step is preferably high. On the other hand, from the viewpoint of increasing the water content of gypsum to obtain dihydrate gypsum, the reaction temperature is preferably 95°C or lower, more preferably 90°C or lower, still more preferably 80°C or lower, particularly preferably 70°C the following. In addition, from the viewpoint of further improving the filterability described later, the reaction temperature is preferably 80°C or lower. The reaction temperature can be set to, for example, 10°C to 95°C, preferably normal temperature to 90°C, more preferably 30°C to 80°C, and still more preferably 50°C to 70°C. In the reaction of the first step, the calorific value varies according to the type and amount of the Si element-containing compound used, and it is preferable to heat or cool as necessary to maintain the reaction temperature within the above range.

就進一步提高氟化鈣等的分解率的觀點而言,第一步驟中的反應時間、即無機酸的總量添加或自滴加開始至反應結束的時間較佳為長。另一方面,若反應時間長,則效率差。就兼顧分解率與效率的觀點而言,反應時間例如可設為0.5小時~8小時,較佳為1小時~7小時,更佳為2小時~6小時,進而佳為2.5小時~5小時。From the viewpoint of further increasing the decomposition rate of calcium fluoride and the like, the reaction time in the first step, that is, the total amount of inorganic acid addition or the time from the start of dropwise addition to the end of the reaction is preferably long. On the other hand, if the reaction time is long, the efficiency is poor. From the viewpoint of both the decomposition rate and efficiency, the reaction time can be set to, for example, 0.5 hours to 8 hours, preferably 1 hour to 7 hours, more preferably 2 hours to 6 hours, and still more preferably 2.5 hours to 5 hours.

第一步驟中的無機酸的濃度與溫度條件較佳為無機酸為40質量%以下、且溫度90℃以下的條件。若為該範圍,則可有效率地獲得二水石膏,且有過濾效率優異的傾向。The concentration and temperature conditions of the inorganic acid in the first step are preferably conditions where the inorganic acid is 40% by mass or less and the temperature is 90°C or less. If it is this range, dihydrate gypsum can be obtained efficiently, and there exists a tendency for the filtration efficiency to be excellent.

於第一步驟中,獲得包含氟化氫及六氟矽酸的水溶液A、與作為固體的選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物的混合物。由於在第二步驟中使用水溶液A,故較佳為將第一步驟中獲得的所述混合物分為水溶液A與鹼金屬鹽或鹼土金屬等固體。分類的方法只要可進行第二步驟,則並無特別限制。作為分類的方法,例如可列舉過濾。過濾的具體方法只要可進行第二步驟,則並無特別限制,例如可使用濾芯式過濾器(cartridge filter)等進行。In the first step, a mixture of an aqueous solution A containing hydrogen fluoride and hexafluorosilicic acid and at least one compound selected from alkali metal salts and alkaline earth metal salts as a solid is obtained. Since the aqueous solution A is used in the second step, it is preferable to divide the mixture obtained in the first step into the aqueous solution A and solids such as alkali metal salts or alkaline earth metals. The classification method is not particularly limited as long as the second step can be performed. As a method of classification, for example, filtering can be cited. The specific method of filtration is not particularly limited as long as the second step can be carried out, and for example, it can be carried out using a cartridge filter or the like.

水溶液A中的氟成分與矽成分的莫耳比(F/Si)較佳為3.0以上,更佳為3.5以上。F/Si的莫耳比的上限並無特別限制,但現實中為6.0以下。若F/Si為所述下限值以上,則可縮短第二步驟,能量效率優異,因此較佳。The molar ratio (F/Si) of the fluorine component to the silicon component in the aqueous solution A is preferably 3.0 or more, more preferably 3.5 or more. The upper limit of the molar ratio of F/Si is not particularly limited, but it is actually 6.0 or less. If F/Si is more than the lower limit, the second step can be shortened, and the energy efficiency is excellent, so it is preferable.

就縮短第二步驟的觀點、及提高能量效率的觀點而言,水溶液A中的六氟矽酸的濃度較佳為20質量%~35質量%。 水溶液A中的無機酸的濃度、即反應結束後的無機酸的濃度較佳為1質量%~5質量%。若殘留的無機酸的濃度為5質量%以下,則有後述的第三步驟中的氟化氫的回收效率進一步提高的傾向。其原因在於:氟化氫容易溶解於硫酸等無機酸水溶液中,於自無機酸水溶液分離時容易殘存。From the viewpoint of shortening the second step and the viewpoint of improving energy efficiency, the concentration of hexafluorosilicic acid in the aqueous solution A is preferably 20% by mass to 35% by mass. The concentration of the inorganic acid in the aqueous solution A, that is, the concentration of the inorganic acid after the completion of the reaction, is preferably 1% by mass to 5% by mass. If the concentration of the remaining inorganic acid is 5 mass% or less, the recovery efficiency of hydrogen fluoride in the third step described later tends to be further improved. The reason is that hydrogen fluoride is easily dissolved in an aqueous inorganic acid solution such as sulfuric acid, and is likely to remain when separated from the aqueous inorganic acid solution.

作為第一步驟中獲得的選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物,可例示:氯化鈉、硫酸鈉、硝酸鈉、磷酸鈉、氯化鉀、硫酸鉀、硝酸鉀、磷酸鉀、氯化鎂、硫酸鎂、硝酸鎂、磷酸鎂、氯化鈣、硫酸鈣、硝酸鈣、磷酸鈣等。其中,較佳為硫酸鈣。進而,作為硫酸鈣,可列舉:無水石膏、半水石膏、二水石膏。該些中,就進一步抑制經時吸濕的觀點而言,較佳為二水石膏。二水石膏的經時吸濕少,因此是作為工業原料的利用價值高的二水石膏。就進一步抑制經時吸濕的觀點而言,二水石膏所含的化合水的量較佳為19質量%以上。如所述般,根據本揭示的氟化氫的製造方法,可獲得選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物,該化合物是作為工業原料而利用價值高的化合物。As at least one compound selected from alkali metal salts and alkaline earth metal salts obtained in the first step, examples thereof include sodium chloride, sodium sulfate, sodium nitrate, sodium phosphate, potassium chloride, potassium sulfate, potassium nitrate, and potassium phosphate , Magnesium chloride, magnesium sulfate, magnesium nitrate, magnesium phosphate, calcium chloride, calcium sulfate, calcium nitrate, calcium phosphate, etc. Among them, calcium sulfate is preferred. Furthermore, examples of calcium sulfate include anhydrous gypsum, hemihydrate gypsum, and dihydrate gypsum. Among these, from the viewpoint of further suppressing moisture absorption over time, dihydrate gypsum is preferred. Dihydrate gypsum has little moisture absorption over time, so it is a dihydrate gypsum with high utility value as an industrial raw material. From the viewpoint of further suppressing moisture absorption over time, the amount of the water of synthesis contained in the dihydrate gypsum is preferably 19% by mass or more. As described above, according to the method for producing hydrogen fluoride of the present disclosure, at least one compound selected from alkali metal salts and alkaline earth metal salts can be obtained, and this compound is a compound with high utility value as an industrial raw material.

<第二步驟> 第二步驟是將所述水溶液A濃縮而獲得作為包含氟化氫(HF)及六氟矽酸(H2 SiF6 )的濃縮液的水溶液B的步驟。若不經過第二步驟而將水溶液A供於後述的第三步驟,則於第三步驟中生成的每單位氟化氫的無機酸量變多,並且副產生的無機酸水溶液中殘留的氟化氫量亦增加,氟化氫的回收量相應地減少。即,藉由在第二步驟中進行濃縮,可有效率地回收氟化氫。<Second Step> The second step is a step of concentrating the aqueous solution A to obtain an aqueous solution B as a concentrated solution containing hydrogen fluoride (HF) and hexafluorosilicic acid (H 2 SiF 6 ). If the aqueous solution A is supplied to the third step described later without going through the second step, the amount of inorganic acid per unit of hydrogen fluoride produced in the third step increases, and the amount of residual hydrogen fluoride in the by-produced aqueous inorganic acid solution also increases. The amount of hydrogen fluoride recovered is correspondingly reduced. That is, by performing concentration in the second step, hydrogen fluoride can be efficiently recovered.

第二步驟的主要目的是將HF留在水溶液中的同時,使H2 O及SiF4 揮發而進行濃縮。藉此,可提高最終的HF的回收效率。The main purpose of the second step is to concentrate H 2 O and SiF 4 while leaving HF in the aqueous solution. In this way, the final HF recovery efficiency can be improved.

H2 SiF6 為強酸,僅於水溶液中穩定,且並無酐。據報告H2 SiF6 即便於常溫下減壓濃縮,亦可僅濃縮至60.92質量%。H2 SiF6 作為H2 SiF6 不揮發,進行分解而作為SiF4 與HF進行蒸發,但揮發性高的SiF4 優先蒸發。於水溶液A的濃縮中,H2 SiF6 濃度低的期間,幾乎僅有水蒸發,H2 SiF6 濃度接近35質量%時,SiF4 與水一起蒸發。該情況表示隨著H2 SiF6 的濃度變高,推進溶液中的 [數式3] H2 SiF6 ⇄SiF4 +2HF 解離,SiF4 變得容易揮發。H2 SiF6 分解而生成的HF的大部分殘留於溶液中,HF被濃縮。若進一步濃縮,則HF亦開始蒸發,最後成為共沸混合物。其間,關於水溶液A中的H2 SiF6 的濃度,最初與濃縮一起增加,隨著HF的增加而轉變為減少。H 2 SiF 6 is a strong acid, which is only stable in aqueous solutions and has no anhydride. It is reported that even if H 2 SiF 6 is concentrated under reduced pressure at room temperature, it can be concentrated to only 60.92% by mass. H 2 SiF 6 H 2 SiF 6 as a non-volatile, decomposed as SiF 4 and HF was evaporated, but the high priority evaporated volatile SiF 4. In the concentration of the aqueous solution A, when the H 2 SiF 6 concentration is low, almost only water evaporates, and when the H 2 SiF 6 concentration is close to 35% by mass, SiF 4 evaporates together with water. This situation indicates that as the concentration of H 2 SiF 6 becomes higher, [Equation 3] H 2 SiF 6 ⇄SiF 4 +2HF in the solution is promoted to dissociate, and SiF 4 becomes easy to volatilize. Most of the HF generated by the decomposition of H 2 SiF 6 remains in the solution, and the HF is concentrated. If it is further concentrated, the HF also starts to evaporate and finally becomes an azeotropic mixture. Meanwhile, with regard to the concentration of H 2 SiF 6 in the aqueous solution A, it initially increased together with the concentration, and changed to a decrease as HF increased.

於本揭示中,藉由在HF的蒸發變得顯著之前停止濃縮,例如藉由在常壓且116℃~118℃下停止濃縮,可濃縮至H2 SiF6 的含有率為35質量%以上,且莫耳比(F/Si)為6.0以上。因此,濃縮液較佳為濃縮液的六氟矽酸的含有率相對於濃縮液的總質量而為35質量%以上,且濃縮液中的F元素與Si元素的莫耳比(F/Si)為6.0以上。In the present disclosure, by stopping the concentration before the evaporation of HF becomes significant, for example, by stopping the concentration at normal pressure at 116°C to 118°C, the concentration can be concentrated to a content rate of H 2 SiF 6 or more of 35% by mass. And the molar ratio (F/Si) is 6.0 or more. Therefore, it is preferable that the concentrated liquid is that the hexafluorosilicic acid content of the concentrated liquid is 35% by mass or more relative to the total mass of the concentrated liquid, and the molar ratio of the F element to the Si element in the concentrated liquid (F/Si) Above 6.0.

藉由提高利用濃縮而獲得的水溶液B中的H2 SiF6 與HF的濃度、特別是HF的濃度,可提高第三步驟中的無水氟化氫的回收量,減少濃硫酸的使用量。By increasing the concentration of H 2 SiF 6 and HF in the aqueous solution B obtained by concentration, particularly the concentration of HF, the recovery amount of anhydrous hydrogen fluoride in the third step can be increased and the amount of concentrated sulfuric acid used can be reduced.

若將藉由第二步驟的濃縮而蒸發的SiF4 與H2 O冷卻並凝縮,則獲得六氟矽酸水溶液與SiO2 的漿料。 此處獲得的SiO2 是將藉由濃縮而蒸發的SiF4 與H2 O凝縮而成者,附著的母液中存在的六氟矽酸藉由乾燥而可容易地揮發,因此可作為極高純度的非晶二氧化矽來回收。 If SiF 4 and H 2 O evaporated by the second step of concentration are cooled and condensed, a slurry of hexafluorosilicic acid aqueous solution and SiO 2 is obtained. The SiO 2 obtained here is obtained by condensing SiF 4 evaporated by concentration and H 2 O. The hexafluorosilicic acid present in the attached mother liquor can be easily volatilized by drying, so it can be used as extremely high purity Of amorphous silicon dioxide to be recycled.

第二步驟中的濃縮方法只要可對水溶液A進行濃縮,則並無特別限制,例如只要利用常溫下的蒸餾、減壓下的蒸餾等公知的方法進行即可。其中,較佳為常溫下的蒸餾及減壓下的蒸餾。特別是減壓下的蒸餾容易進行濃縮,因此較佳。The concentration method in the second step is not particularly limited as long as the aqueous solution A can be concentrated. For example, it may be performed by a known method such as distillation at normal temperature and distillation under reduced pressure. Among them, distillation at normal temperature and distillation under reduced pressure are preferred. In particular, distillation under reduced pressure is easy to concentrate, so it is preferred.

於在常壓下進行蒸餾的情況下,較佳為將水溶液A升溫至100℃~120℃、較佳為110℃~120℃、更佳為116℃~118℃。關於水溶液A的溫度,為了提高濃縮率,較佳為所述下限值以上,就降低氟化氫的損耗的觀點而言,較佳為所述上限值以下。 於在減壓下進行蒸餾的情況下,較佳為於20 kPa(絕對壓力)的條件下將水溶液升溫至68℃~85℃。In the case of distillation under normal pressure, it is preferable to raise the temperature of the aqueous solution A to 100°C to 120°C, preferably 110°C to 120°C, more preferably 116°C to 118°C. Regarding the temperature of the aqueous solution A, in order to increase the concentration rate, it is preferably equal to or higher than the above-mentioned lower limit, and from the viewpoint of reducing the loss of hydrogen fluoride, it is preferably equal to or lower than the above-mentioned upper limit. In the case of performing distillation under reduced pressure, it is preferable to heat the aqueous solution to 68°C to 85°C under the condition of 20 kPa (absolute pressure).

於第二步驟中獲得的水溶液B中,莫耳比(F/Si)較佳為6.0以上,更佳為6.5~8.0,進而佳為6.8~7.2。就使第三步驟效率化的觀點而言,莫耳比(F/Si)較佳為所述下限值以上,作為現實中可能的值可設為所述上限值以下。莫耳比(F/Si)可藉由調整成為終點的溫度來變更。In the aqueous solution B obtained in the second step, the molar ratio (F/Si) is preferably 6.0 or more, more preferably 6.5 to 8.0, and still more preferably 6.8 to 7.2. From the viewpoint of making the third step more efficient, the molar ratio (F/Si) is preferably equal to or higher than the lower limit value, and can be set to be equal to or lower than the upper limit value as a practically possible value. The molar ratio (F/Si) can be changed by adjusting the temperature at the end point.

於第二步驟中獲得的水溶液B中,H2 SiF6 的含有率較佳為35質量%以上,更佳為37.0質量%~44.0質量%。就使第三步驟效率化的觀點而言,H2 SiF6 的含有率較佳為所述下限值以上,作為現實中可能的值可設為所述上限值以下。In the aqueous solution B obtained in the second step, the content of H 2 SiF 6 is preferably 35% by mass or more, more preferably 37.0% to 44.0% by mass. From the viewpoint of improving the efficiency of the third step, the content of H 2 SiF 6 is preferably equal to or higher than the lower limit, and can be set to be equal to or lower than the upper limit as a practically possible value.

<第三步驟> 第三步驟是對所述水溶液B賦予硫酸,產生包含四氟化矽(SiF4 )及氟化氫(HF)的氣體,自所述氣體中分離氟化氫並加以回收的步驟。另外,自所述氣體回收的氟化氫可藉由再次進行蒸發及冷卻而液化,來提高濃度。<Third step> The third step is a step of applying sulfuric acid to the aqueous solution B to generate a gas containing silicon tetrafluoride (SiF 4 ) and hydrogen fluoride (HF), and separating and recovering hydrogen fluoride from the gas. In addition, the hydrogen fluoride recovered from the gas can be evaporated and cooled again to be liquefied to increase the concentration.

第三步驟的目的是自藉由第二步驟製造的濃縮液即水溶液B中分離氟化氫,使H2 SiF6 及SiF4 的濃度降低。 只要可達成第三步驟的目的,則具體的手段並無限制,但於第三步驟中,較佳為進行下述(i)及(ii),並任意地進行(iii)。The purpose of the third step is to separate hydrogen fluoride from the concentrated solution produced in the second step, that is, the aqueous solution B, so as to reduce the concentration of H 2 SiF 6 and SiF 4. As long as the purpose of the third step can be achieved, the specific means is not limited, but in the third step, it is preferable to perform the following (i) and (ii), and optionally perform (iii).

(i)於水溶液B中加入75質量%以上的濃硫酸或發煙硫酸,進行脫水分解,來產生包含HF與SiF4 的氣體。於該步驟中,藉由脫水分解,產生氟化氫與四氟化矽,氟化氫及四氟化矽同時揮發。 (ii)使80質量%以上的硫酸吸收所述氟化氫來獲得吸收液。於該步驟中,於HF與SiF4 的混合氣體中添加80質量%以上的硫酸,使硫酸吸收HF來製備吸收液,自混合氣體中選擇性地回收HF。 (iii)將所述吸收液加熱至100℃以上,使氟化氫揮發並回收氟化氫。於該步驟中,較佳為將揮發的氟化氫冷卻並液化來回收。(I) Add 75% by mass or more of concentrated sulfuric acid or fuming sulfuric acid to the aqueous solution B, and perform dehydration and decomposition to generate a gas containing HF and SiF 4. In this step, by dehydration and decomposition, hydrogen fluoride and silicon tetrafluoride, hydrogen fluoride and silicon tetrafluoride are volatilized simultaneously. (Ii) The hydrogen fluoride is absorbed by 80% by mass or more of sulfuric acid to obtain an absorption liquid. In this step, 80% by mass or more of sulfuric acid is added to the mixed gas of HF and SiF 4 to make the sulfuric acid absorb HF to prepare an absorption liquid, and HF is selectively recovered from the mixed gas. (Iii) Heating the absorption liquid to above 100°C to volatilize hydrogen fluoride and recover hydrogen fluoride. In this step, it is preferable to cool and liquefy the volatilized hydrogen fluoride for recovery.

關於所述(i)中的加入濃硫酸或發煙硫酸時的水溶液B的溫度,只要可使藉由利用硫酸進行的H2 SiF6 的分解而產生的HF及SiF4 氣化,則並無特別限制,例如可設為80℃~130℃,更佳為設為100℃~130℃。Regarding the temperature of the aqueous solution B when concentrated sulfuric acid or fuming sulfuric acid is added in (i), as long as HF and SiF 4 generated by the decomposition of H 2 SiF 6 with sulfuric acid can be vaporized, there is no It is particularly limited, and for example, it can be set to 80°C to 130°C, more preferably 100°C to 130°C.

所述(i)中的利用硫酸的分解反應可於常壓下進行,亦可於減壓下進行。就減少殘留於水溶液中的HF量而進一步提高產率的觀點而言,較佳為於減壓下進行。The decomposition reaction using sulfuric acid in (i) can be carried out under normal pressure or under reduced pressure. From the viewpoint of reducing the amount of HF remaining in the aqueous solution and further increasing the yield, it is preferably performed under reduced pressure.

於所述(i)中,就減少殘留於水溶液中的HF量而進一步提高產率的觀點而言,較佳為由惰性氣體進行通氣。作為惰性氣體,例如可列舉:氮氣、氬氣、SiF4 氣體。惰性氣體的通氣可自添加硫酸時進行,亦可於利用硫酸的分解進行或結束後進行。根據該方法,即便於殘留2質量%的HF的情況下,亦可將殘留量降低至0.5質量%左右。In the above (i), from the viewpoint of reducing the amount of HF remaining in the aqueous solution and further increasing the yield, it is preferable to ventilate with an inert gas. Examples of the inert gas include nitrogen, argon, and SiF 4 gas. The aeration of the inert gas may be performed from the time of adding sulfuric acid, or may be performed after the decomposition of sulfuric acid is performed or after the end. According to this method, even when 2% by mass of HF remains, the residual amount can be reduced to about 0.5% by mass.

於所述(i)中,就減少殘留於水溶液中的HF量而進一步提高產率的觀點而言,較佳為添加沸點比較低的烷烴等烴。In the above (i), from the viewpoint of reducing the amount of HF remaining in the aqueous solution and further increasing the yield, it is preferable to add a hydrocarbon such as alkane having a relatively low boiling point.

所述(i)之後的水溶液是包含少量HF的稀硫酸。藉由變更濃縮液的濃度或濃硫酸等的添加量,該稀硫酸中的硫酸濃度例如可設為60質量%~85質量%。就進一步降低HF的含量的觀點而言,稀硫酸中的硫酸濃度較佳為80質量%~85質量%。另外,就使再利用容易的觀點而言,稀硫酸中的硫酸濃度較佳為70質量%~80質量%。稀硫酸例如可作為磷酸工廠等原料的一部分使用,或者於本揭示的各步驟中使用。The aqueous solution after (i) is dilute sulfuric acid containing a small amount of HF. By changing the concentration of the concentrated solution or the addition amount of concentrated sulfuric acid, the sulfuric acid concentration in the dilute sulfuric acid can be set to 60% by mass to 85% by mass, for example. From the viewpoint of further reducing the content of HF, the sulfuric acid concentration in the dilute sulfuric acid is preferably 80% by mass to 85% by mass. In addition, from the viewpoint of facilitating reuse, the sulfuric acid concentration in the dilute sulfuric acid is preferably 70% by mass to 80% by mass. Dilute sulfuric acid can be used as a part of raw materials such as phosphoric acid factories, or used in each step of the present disclosure, for example.

就有效率地回收HF的觀點而言,稀硫酸中的HF的含有率較佳為5質量%以下,更佳為3質量%以下,進而佳為2質量%以下,特佳為1質量%以下。From the viewpoint of efficient recovery of HF, the content of HF in the dilute sulfuric acid is preferably 5% by mass or less, more preferably 3% by mass or less, still more preferably 2% by mass or less, particularly preferably 1% by mass or less .

於所述(ii)中,於所述混合氣體中加入濃硫酸,將HF溶解於濃硫酸中,從而製備包含HF及H2 SO4 的吸收液。於混合氣體中亦包含H2 O,該H2 O被濃硫酸吸收,因此包含於吸收液中。吸收液中的HF的濃度例如為30質量%以上,較佳為35質量%以上。In the above (ii), concentrated sulfuric acid is added to the mixed gas, and HF is dissolved in the concentrated sulfuric acid to prepare an absorption liquid containing HF and H 2 SO 4. The mixed gas also contains H 2 O. The H 2 O is absorbed by concentrated sulfuric acid and therefore contained in the absorption liquid. The concentration of HF in the absorption liquid is, for example, 30% by mass or more, preferably 35% by mass or more.

於所述(ii)中,SiF4 氣體未被吸收而殘留。因此,較佳為回收於生成氟化氫時副產生的四氟化矽,並將該四氟化矽及該四氟化矽與水的反應產物中的至少一者作為所述第一步驟中的含Si元素的化合物的至少一部分而使用,或者於所述第三步驟中添加至所述水溶液B中而使用。排出至系統外的化合物減少,因此具有經濟性優異的傾向。In the above (ii), the SiF 4 gas is not absorbed but remains. Therefore, it is preferable to recover the silicon tetrafluoride that is by-produced when hydrogen fluoride is generated, and use at least one of the silicon tetrafluoride and the reaction product of the silicon tetrafluoride and water as the content in the first step. At least a part of the compound of Si element is used, or it is added to the aqueous solution B in the third step and used. Since the number of compounds discharged to the outside of the system is reduced, the economy tends to be excellent.

於所述(iii)中,將所述吸收液加熱至100℃以上、較佳為120℃,保持例如30分鐘並將揮發的氣體加以冷卻,藉此可獲得HF的濃度為99質量%的水溶液。In the above (iii), the absorbing liquid is heated to 100°C or higher, preferably 120°C, and maintained, for example, for 30 minutes, and the volatilized gas is cooled, thereby obtaining an aqueous solution with a HF concentration of 99% by mass .

分離並回收所生成的氟化氫後的殘留液體成為硫酸水溶液。較佳為將該硫酸水溶液作為第一步驟中的無機酸的至少一部分而使用。排出至系統外的化合物減少,因此具有經濟性優異的傾向。另外,較佳為提高該硫酸水溶液的濃度,於第三步驟中再利用。排出至系統外的化合物減少,因此具有經濟性優異的傾向。作為提高濃度的方法,例如可列舉脫水蒸餾。The residual liquid after separating and recovering the generated hydrogen fluoride becomes an aqueous sulfuric acid solution. It is preferable to use the sulfuric acid aqueous solution as at least a part of the inorganic acid in the first step. Since the number of compounds discharged to the outside of the system is reduced, the economy tends to be excellent. In addition, it is preferable to increase the concentration of the sulfuric acid aqueous solution and reuse it in the third step. Since the number of compounds discharged to the outside of the system is reduced, the economy tends to be excellent. As a method of increasing the concentration, for example, dehydration distillation can be cited.

作為與先前已知的本揭示的第三步驟類似的方法,有如下方法:使用二段反應器,於第一段幾乎僅使SiF4 蒸發,於更嚴格的條件的第二段主要使HF揮發。然而,難以使SiF4 與HF分別蒸發,有時HF的產率會降低。相對於此,根據本揭示的第三步驟,揮發等操作容易,且可以高產率回收HF。As a method similar to the previously known third step of the present disclosure, there is the following method: using a two-stage reactor, in the first stage almost only SiF 4 is evaporated, and in the second stage under stricter conditions, HF is mainly volatilized . However, it is difficult to evaporate SiF 4 and HF separately, and sometimes the yield of HF may decrease. In contrast, according to the third step of the present disclosure, operations such as volatilization are easy, and HF can be recovered in a high yield.

如以上般,根據本揭示的氟化氫的製造方法,除HF以外排出至系統外者為二水石膏及SiO2 。藉由本揭示的製造方法而獲得的二水石膏及SiO2 的雜質含量低,可直接作為產品而市售。 [實施例]As described above, according to the method for producing hydrogen fluoride of the present disclosure, the dihydrate gypsum and SiO 2 are discharged out of the system in addition to HF. The dihydrate gypsum and SiO 2 obtained by the manufacturing method of the present disclosure have low impurity content, and can be directly sold as products on the market. [Example]

以下示出實施例中進行的各種測定方法。 (1)含有率的測定方法 (1-1)F含有率分析 F含有率是將賽默(Thermo)製造的氟離子電極9409BN安裝於堀場製作所(股)的離子計F-72上,利用氟離子計法進行測定。 (1-2)Si含有率分析 Si含有率是使用日立高新技術(Hitachi High-technologies)(股)製造的偏光塞曼原子吸光光度計ZA3300,利用原子吸光法來測定。 (1-3)H2 SO4 分析 關於SO4 2- ,於日本戴安(Dionex)股份有限公司製造的離子色譜法ICS-1600上安裝管柱AS18,溶離液是使用KOH,並利用離子色譜法來進行測定。以測定的SO4 2- 的含量為基礎,計算H2 SO4 的含量。The various measurement methods performed in the examples are shown below. (1) Measuring method of content rate (1-1) Analysis of F content rate F content rate is the fluoride ion electrode 9409BN manufactured by Thermo (Thermo) is installed on the ion meter F-72 of Horiba Manufacturing Co., Ltd., and fluorine is used. The ion meter method is used for the measurement. (1-2) Analysis of Si content The Si content is measured by the atomic absorption method using the polarized Zeeman atomic absorption photometer ZA3300 manufactured by Hitachi High-technologies. (1-3) Analysis of H 2 SO 4 Regarding SO 4 2- , column AS18 was installed on the ion chromatography ICS-1600 manufactured by Dionex Co., Ltd., the eluent was KOH, and ion chromatography was used. Method to perform the measurement. Calculate the H 2 SO 4 content based on the measured SO 4 2- content.

(2)二水石膏的化合水的測定方法 二水石膏的化合水是依據JIS R 9101(1995)來測定。加熱溫度設為250℃。(2) Method for measuring the water of dihydrate gypsum The combined water of dihydrate gypsum is measured in accordance with JIS R 9101 (1995). The heating temperature was set to 250°C.

[實施例1] -第一步驟- 於帶攪拌機及套管的12 L氟樹脂內襯反應器中,加入一般化學產業中獲得的人工螢石B(乾燥品:CaF2 含量:85.0質量%、SiO2 含量:2.4質量%)1,848 g及水6,180 g,製成漿料狀,進行攪拌並且加熱至60℃。花費30分鐘向其中滴加75質量%硫酸2,896 g,並且向反應槽中吹入SiF4 氣體1,654 g。在此期間,進行除熱以使得反應溫度不超過70℃。於硫酸的滴加結束後,為了熟化而繼續攪拌2小時。利用濾芯式過濾器對該漿料進行過濾,回收固體成分4,118 g與濾液(水溶液A)8,440 g。固體成分為二水石膏,利用甲醇進行清洗,於50℃下乾燥後的重量為3,500 g。濾液(水溶液A)包含氟化氫(HF)及六氟矽酸(H2 SiF6 )。六氟矽酸的濃度為27.6質量%,H2 SO4 的濃度為3.2質量%。另外,莫耳比(F/Si)為5.71。二水石膏的化合水為19.5質量%。[Example 1]-The first step-In a 12 L fluororesin lined reactor equipped with a stirrer and a sleeve, artificial fluorite B obtained in the general chemical industry (dried product: CaF 2 content: 85.0% by mass, SiO 2 content: 2.4% by mass) 1,848 g and 6,180 g of water were made into a slurry form, stirred and heated to 60°C. It took 30 minutes to drop 2,896 g of 75% by mass sulfuric acid, and 1,654 g of SiF 4 gas was blown into the reaction tank. During this period, heat removal was performed so that the reaction temperature did not exceed 70°C. After the dropwise addition of sulfuric acid was completed, stirring was continued for 2 hours for maturation. The slurry was filtered with a cartridge filter, and 4,118 g of solid content and 8,440 g of filtrate (aqueous solution A) were recovered. The solid content is dihydrate gypsum, washed with methanol, and the weight after drying at 50°C is 3,500 g. The filtrate (aqueous solution A) contains hydrogen fluoride (HF) and hexafluorosilicic acid (H 2 SiF 6 ). The concentration of hexafluorosilicic acid was 27.6% by mass, and the concentration of H 2 SO 4 was 3.2% by mass. In addition, the molar ratio (F/Si) was 5.71. The combined water of dihydrate gypsum is 19.5% by mass.

-第二步驟- 向包括溫度計保護管兩根(液溫與氣相的溫度測定用)與氣體出口的1,000 ml的氟樹脂製瓶(對市售的瓶進行了焊接加工而成者)中,裝入第一步驟中獲得的濾液1,055 g,於常壓下進行濃縮蒸餾直至液溫達到118℃,從而獲得773 g的濃縮液。重覆進行兩次第一步驟與第二步驟,從而獲得1,546 g的濃縮液。濃縮液(水溶液B)包含六氟矽酸37.6質量%、H2 SO4 7.4質量%,莫耳比(F/Si)為7.01。-Second step- To a 1,000 ml fluororesin bottle (made by welding a commercially available bottle) that includes two thermometer protection tubes (for measuring the temperature of liquid and gas phase) and a gas outlet, 1,055 g of the filtrate obtained in the first step was charged, and concentrated and distilled under normal pressure until the liquid temperature reached 118°C, thereby obtaining 773 g of concentrated liquid. The first step and the second step were repeated twice to obtain 1,546 g of concentrated solution. The concentrated solution (aqueous solution B) contained 37.6% by mass of hexafluorosilicic acid, 7.4% by mass of H 2 SO 4 , and a molar ratio (F/Si) of 7.01.

-第三步驟(i)(ii)- 將包括攪拌機與溫度計的2,000 ml特氟隆(註冊商標)反應器浸漬於油浴中,進行攪拌並且保持於120℃。使用管泵同時向其中滴加所述濃縮液(六氟矽酸:37.6質量%、莫耳比(F/Si):7.01、H2 SO4 :7.4質量%)928 g與98質量%硫酸1,840 g,開始六氟矽酸的脫水分解。濃縮液與濃硫酸分別調節為於大約60分鐘同時結束滴加。於滴加結束的同時,利用氣泵使自後述的吸收瓶排出的SiF4 氣體返回,起泡30分鐘並排除反應液中的HF。對其間揮發出的氣體,放入各90 g的98質量%硫酸,於串聯連接的兩根氟樹脂製吸收瓶中,使其起泡並使硫酸吸收HF。該吸收瓶浸漬於設定為10℃的冷水浴中進行冷卻。-The third step (i) (ii)-A 2,000 ml Teflon (registered trademark) reactor including a stirrer and a thermometer was immersed in an oil bath, stirred and kept at 120°C. Using a tube pump, 928 g of the concentrated solution (hexafluorosilicic acid: 37.6 mass%, molar ratio (F/Si): 7.01, H 2 SO 4 : 7.4 mass%) and 98 mass% sulfuric acid 1,840 were simultaneously added dropwise thereto. g, start the dehydration decomposition of hexafluorosilicic acid. The concentrated solution and concentrated sulfuric acid were adjusted so that the dripping was ended simultaneously in about 60 minutes. Simultaneously with the end of the dripping, the SiF 4 gas discharged from the absorption bottle described later was returned by an air pump, bubbling for 30 minutes, and HF in the reaction solution was removed. Put 90 g of 98% by mass sulfuric acid into two fluororesin absorption bottles connected in series with the volatilized gas between them to make the sulfuric acid absorb HF by foaming. The absorption bottle was immersed in a cold water bath set at 10°C for cooling.

自特氟隆(註冊商標)反應器中回收殘留的液體2,412 g。其組成為含有0.5質量%的HF的約75質量%H2 SO4 。 自兩根吸收瓶中回收硫酸吸收液309 g。其組成為H2 SO4 :55.3質量%、HF:36.4質量%、H2 O:8.3質量%。 此處產生的SiF4 用於HF排除用途,並且另外利用水洗滌器吸收,回收含有SiO2 與六氟矽酸的水溶液。該水溶液的莫耳比(F/Si)為5。 重覆兩次第一步驟~第三步驟(i)、(ii),獲得618 g的硫酸吸收液。硫酸吸收液的組成如所述般。2,412 g of residual liquid was recovered from the Teflon (registered trademark) reactor. Its composition is about 75% by mass H 2 SO 4 containing 0.5% by mass of HF. 309 g of sulfuric acid absorption liquid was recovered from the two absorption bottles. The composition is H 2 SO 4 : 55.3% by mass, HF: 36.4% by mass, and H 2 O: 8.3% by mass. The SiF 4 produced here is used for HF elimination purposes, and is additionally absorbed by a water scrubber to recover the aqueous solution containing SiO 2 and hexafluorosilicic acid. The molar ratio (F/Si) of this aqueous solution was 5. Repeat steps 1 to 3 (i) and (ii) twice to obtain 618 g of sulfuric acid absorption solution. The composition of the sulfuric acid absorption solution is as described above.

-第三步驟(iii)- 使用包括500 ml的蒸發罐、冷水凝縮器(5℃)、及浸漬於冷水浴(5℃)中的100 ml接受器(receiver)的氟樹脂製的單蒸餾裝置,進行自所述硫酸吸收液的HF回收。將硫酸吸收液450 g裝入蒸發罐中,進行加熱使HF蒸發,利用冷水凝縮器使蒸發的HF凝縮,將凝縮液貯存於接受器中。緩慢進行加熱,花費大約1小時將硫酸吸收液升溫至120℃,進而維持該溫度30分鐘。放置冷卻後,回收蒸發罐的殘留液293 g與凝縮液157 g。於蒸發罐的殘留液中包含2.3質量%的HF。凝縮液的組成是HF為99質量%。-The third step (iii)- A single distillation apparatus made of fluororesin including a 500 ml evaporator, a cold water condenser (5°C), and a 100 ml receiver immersed in a cold water bath (5°C) was used to perform the extraction from the sulfuric acid absorption liquid HF recovery. Put 450 g of sulfuric acid absorption liquid into an evaporation tank, heat it to evaporate HF, use a cold water condenser to condense the evaporated HF, and store the condensed liquid in a receiver. The heating was performed slowly, and the temperature of the sulfuric acid absorption liquid was increased to 120° C. in about 1 hour, and the temperature was maintained for 30 minutes. After being left to cool, 293 g of residual liquid and 157 g of condensed liquid in the evaporation tank were recovered. The residual liquid in the evaporation tank contains 2.3% by mass of HF. The composition of the condensed liquid is 99% by mass of HF.

[比較例1] 與實施例1同樣地進行第一步驟,回收濾液(水溶液A)8,440 g。濾液(水溶液A)包含氟化氫(HF)及六氟矽酸(H2 SiF6 )。六氟矽酸的濃度為27.6質量%,H2 SO4 的濃度為3.2質量%。另外,莫耳比(F/Si)為5.71。[Comparative Example 1] The first step was performed in the same manner as in Example 1, and 8,440 g of the filtrate (aqueous solution A) was recovered. The filtrate (aqueous solution A) contains hydrogen fluoride (HF) and hexafluorosilicic acid (H 2 SiF 6 ). The concentration of hexafluorosilicic acid was 27.6% by mass, and the concentration of H 2 SO 4 was 3.2% by mass. In addition, the molar ratio (F/Si) was 5.71.

對於該濾液(水溶液A)而言,不進行第二步驟而用於第三步驟(i)及(ii)。具體而言,將包括攪拌機與溫度計的2,000 ml特氟隆(註冊商標)反應器浸漬於油浴中,進行攪拌並且保持於120℃。使用管泵同時向其中滴加濾液(水溶液A)(六氟矽酸:27.6質量%、莫耳比(F/Si):5.71、H2 SO4 :3.2質量%)718.6 g與98質量%硫酸1840 g,開始六氟矽酸的脫水分解。濃縮液與濃硫酸分別調節為於大約60分鐘同時結束滴加。於滴加結束的同時,利用氣泵使自後述的吸收瓶排出的SiF4 氣體返回,起泡30分鐘並排除反應液中的HF。對其間揮發出的氣體,放入各90 g的98質量%硫酸,於串聯連接的兩根氟樹脂製吸收瓶中,使其起泡並使硫酸吸收HF。該吸收瓶浸漬於設定為10℃的冷水浴中進行冷卻。The filtrate (aqueous solution A) was used in the third steps (i) and (ii) without performing the second step. Specifically, a 2,000 ml Teflon (registered trademark) reactor including a stirrer and a thermometer was immersed in an oil bath, stirred and maintained at 120°C. Using a tube pump, the filtrate (aqueous solution A) (hexafluorosilicic acid: 27.6 mass%, molar ratio (F/Si): 5.71, H 2 SO 4 : 3.2 mass%) 718.6 g and 98 mass% sulfuric acid was added dropwise to it at the same time 1840 g, the dehydration decomposition of hexafluorosilicic acid began. The concentrated solution and concentrated sulfuric acid were adjusted so that the dripping was ended at the same time in about 60 minutes. Simultaneously with the end of the dripping, the SiF 4 gas discharged from the absorption bottle described later was returned by an air pump, bubbling for 30 minutes, and HF in the reaction solution was removed. Put 90 g of 98% by mass sulfuric acid into two fluororesin absorption bottles connected in series with the volatilized gas between them to make the sulfuric acid absorb HF by foaming. The absorption bottle was immersed in a cold water bath set at 10°C for cooling.

自兩根吸收瓶中回收硫酸吸收液236 g。其組成為H2 SO4 :62.3質量%、HF:15.7質量%、H2 O:8.1質量%。本比較例1中使用與實施例1為相同量的吸收用硫酸。但是,關於作為沸硫酸而可自吸收瓶回收的HF的濃度,相對於實施例1的36.4質量%,本比較例1為15.7質量%。因此可知,不經過第二步驟的本比較例1相對於實施例1而言效率明顯差。236 g of sulfuric acid absorption liquid was recovered from the two absorption bottles. The composition is H 2 SO 4 : 62.3% by mass, HF: 15.7% by mass, and H 2 O: 8.1% by mass. In this comparative example 1, the same amount of sulfuric acid for absorption as in Example 1 was used. However, the concentration of HF that can be recovered from the absorption bottle as boiling sulfuric acid is 15.7% by mass in Comparative Example 1 with respect to 36.4% by mass in Example 1. Therefore, it can be seen that the efficiency of this comparative example 1 which does not go through the second step is significantly lower than that of the example 1.

[試驗例1] 作為原料,使用半導體產業中排出的人工螢石A(乾燥品:CaF2 含量:78.4質量%、SiO2 :0.88質量%、CaSO4 ·2H2 O:9.3質量%)、將濃硫酸稀釋成75質量%的硫酸、作為SiO2 源而市售的矽藻土,來實施第一步驟。 秤量人工螢石A 99.6 g(以CaF2 計為1.0莫耳)、與以SiO2 計合計包含0.33莫耳的矽藻土,放入500 ml氟樹脂製容器中,加入水150 g使其漿料化,進行攪拌並且升溫至65℃。繼而,利用分液漏斗花費30分鐘滴加以H2 SO4 計包含1.3莫耳的75質量%H2 SO4 。 依照所述式(1)進行反應,於硫酸滴加結束後於4小時停止反應,立即進行過濾,從而獲得濾液(水溶液A)。過濾殘渣於水洗及甲醇清洗後,於105℃下乾燥1小時,從而獲得乾燥固體成分。[Test Example 1] As a raw material, artificial fluorite A (dried product: CaF 2 content: 78.4 mass%, SiO 2 : 0.88 mass%, CaSO 4 ·2H 2 O: 9.3 mass%) discharged from the semiconductor industry was used as a raw material. Concentrated sulfuric acid was diluted to 75% by mass of sulfuric acid, diatomaceous earth commercially available as a source of SiO 2 , and the first step was implemented. Weigh 99.6 g of artificial fluorite A ( 1.0 mol based on CaF 2 ) and diatomaceous earth containing 0.33 mol in total based on SiO 2 and put them into a 500 ml fluororesin container. Add 150 g of water to make a slurry Materialize, stir and raise the temperature to 65°C. Then, 75% by mass H 2 SO 4 containing 1.3 mol in H 2 SO 4 was dropped over 30 minutes using a separatory funnel. The reaction was carried out in accordance with the aforementioned formula (1), the reaction was stopped 4 hours after the end of the sulfuric acid dropwise addition, and filtration was immediately performed to obtain a filtrate (aqueous solution A). After the filtration residue was washed with water and methanol, it was dried at 105°C for 1 hour to obtain a dry solid content.

(1)過濾性的評價 根據過濾時的漿料的滯留時間,依照下述評價基準,來評價過濾性。再者,過濾是使用在供溶液通過的部位的內徑為4.5 cm的過濾器架上設置網眼1 μm的膜濾器的過濾器裝置,利用真空泵抽吸的同時進行。 ~評價基準~ A:漿料的滯留時間為60秒以下。 B:漿料的滯留時間超過60秒且為90秒以下。 C:漿料的滯留時間超過90秒。(1) Evaluation of filterability Based on the residence time of the slurry during filtration, the filterability was evaluated in accordance with the following evaluation criteria. In addition, the filtration is performed using a filter device in which a membrane filter with a mesh of 1 μm is installed on a filter holder with an inner diameter of 4.5 cm at a portion through which the solution passes, and is carried out while being sucked by a vacuum pump. ~Evaluation Criteria~ A: The residence time of the slurry is 60 seconds or less. B: The residence time of the slurry exceeds 60 seconds and is 90 seconds or less. C: The residence time of the slurry exceeds 90 seconds.

(2)化合水量的評價 根據獲得的乾燥固體成分,並依照所述方法來測定化合水量。 (3)分解率的測定 秤量乾燥固體成分的質量,根據乾燥固體成分的質量及用作原料的人工螢石的質量來求出分解率。分解率由下式表示。 分解率(%)=[乾燥固體成分的質量(g)/人工螢石的質量(g)]×100(2) Evaluation of combined water Based on the obtained dry solid content, the amount of combined water is determined in accordance with the method described. (3) Determination of decomposition rate Weigh the mass of the dry solid content, and calculate the decomposition rate based on the mass of the dry solid content and the mass of the artificial fluorite used as a raw material. The decomposition rate is expressed by the following formula. Decomposition rate (%)=[mass of dry solid content (g)/mass of artificial fluorite (g)]×100

[試驗例2~試驗例15] 如表1所記載般變更使用的原料的莫耳比率、反應溫度及反應時間,除此以外與試驗例1同樣地實施第一步驟。將過濾性、化合水、分解率的評價結果示於表1。[Test Example 2-Test Example 15] The first step was carried out in the same manner as in Test Example 1, except that the molar ratio, reaction temperature, and reaction time of the raw materials used were changed as described in Table 1. Table 1 shows the evaluation results of filterability, combined water, and decomposition rate.

[表1]   原料(莫耳比) 反應條件 過濾性 化合水(質量%) 分解率(%) CaF2 H2 SO4 SiO2 反應溫度(℃) 時間(h) 試驗例1 1 1.3 0.33 65 4 A 20.4 95.9 試驗例2 1 1.3 0.33 75 4 A 17.7 95 試驗例3 1 1.3 0.33 85 4 C 11.4 95.8 試驗例4 1 1.3 0.33 常溫 4 A 19.6 91 試驗例5 1 1 0.33 65 4 B 18.1 85.2 試驗例6 1 1.05 0.33 65 4 A 20.1 92.1 試驗例7 1 1.05 0.33 65 2 A 20.2 94 試驗例8 1 1.05 0.3 65 2 A 未測定 90.2 試驗例9 1 1.1 0.33 65 4 A 19.6 91.3 試驗例10 1 1.1 0.33 常溫 4 A 19.2 83.6 試驗例11 1 1.1 0.47 65 4 B 19.1 90.5 試驗例12 1 1.1 0.7 65 4 C 17.3 87.8 試驗例13 1 1.1 0.33 65 1 C 未測定 78.8 試驗例14 1 2 0.33 65 2 A 未測定 96.2 試驗例15 1 1.3 0.0 65 4 C 9.9 26.3 [Table 1] Raw material (mole ratio) Reaction conditions Filterability Combined water (mass%) Decomposition rate (%) CaF 2 H 2 SO 4 SiO 2 Reaction temperature (℃) Time (h) Test example 1 1 1.3 0.33 65 4 A 20.4 95.9 Test example 2 1 1.3 0.33 75 4 A 17.7 95 Test example 3 1 1.3 0.33 85 4 C 11.4 95.8 Test Example 4 1 1.3 0.33 Room temperature 4 A 19.6 91 Test Example 5 1 1 0.33 65 4 B 18.1 85.2 Test Example 6 1 1.05 0.33 65 4 A 20.1 92.1 Test Example 7 1 1.05 0.33 65 2 A 20.2 94 Test Example 8 1 1.05 0.3 65 2 A Not determined 90.2 Test Example 9 1 1.1 0.33 65 4 A 19.6 91.3 Test Example 10 1 1.1 0.33 Room temperature 4 A 19.2 83.6 Test Example 11 1 1.1 0.47 65 4 B 19.1 90.5 Test Example 12 1 1.1 0.7 65 4 C 17.3 87.8 Test Example 13 1 1.1 0.33 65 1 C Not determined 78.8 Test Example 14 1 2 0.33 65 2 A Not determined 96.2 Test Example 15 1 1.3 0.0 65 4 C 9.9 26.3

相對於試驗例的評價結果的考察 (關於反應溫度) 於「試驗例1~試驗例4」、「試驗例9、試驗例10」中,反應溫度以外的條件分別相同,僅使反應溫度變化。由表1所示的結果可知,反應溫度越高而CaF2 分解率越提高。另一方面,可知若反應溫度變高,則化合水的量下降,若超過80℃則生成半水石膏,若超過90℃則生成無水石膏,過濾性降低。由以上可知,第一步驟中的反應溫度較佳為80℃以下,更佳為50℃~70℃。Examination of the evaluation results relative to the test example (regarding the reaction temperature) In "Test Example 1 to Test Example 4", "Test Example 9, Test Example 10", the conditions other than the reaction temperature were the same, and only the reaction temperature was changed. From the results shown in Table 1, it can be seen that the higher the reaction temperature, the higher the CaF 2 decomposition rate. On the other hand, it can be seen that if the reaction temperature becomes higher, the amount of combined water decreases, if it exceeds 80°C, hemihydrate gypsum is formed, and if it exceeds 90°C, anhydrous gypsum is formed, and filterability is reduced. From the above, the reaction temperature in the first step is preferably 80°C or lower, more preferably 50°C to 70°C.

(關於SiO2 量) 於不添加SiO2 、僅使用源自人工螢石的0.014 mol的SiO2 作為SiO2 的試驗例15中,CaF2 的分解率為30%以下,相對於此,添加了SiO2 的其他試驗例中CaF2 的分解率均為70%以上。 根據僅SiO2 的添加量不同的「試驗例7、試驗例8」的比較、「試驗例9、試驗例11、試驗例12」的比較可知,試驗例7及試驗例9的SiO2 的添加量為0.33莫耳時分解率最高,於SiO2 的添加量少於0.33莫耳多於0.33莫耳時,分解率均降低。 另外,根據「試驗例9、試驗例11、試驗例12」的比較可知,若SiO2 過多,則過濾性降低。認為其原因在於未反應的微細SiO2 殘留在漿料中。(Regarding the amount of SiO 2 ) In Test Example 15 where SiO 2 was not added and only 0.014 mol of SiO 2 derived from artificial fluorite was used as SiO 2 , the decomposition rate of CaF 2 was 30% or less. In other test examples of SiO 2 , the decomposition rate of CaF 2 is all 70% or more. According to the comparison of "Test Example 7, Test Example 8" and "Test Example 9, Test Example 11, Test Example 12" that differ only in the amount of SiO 2 added, it can be seen that the addition of SiO 2 in Test Example 7 and Test Example 9 When the amount is 0.33 mol, the decomposition rate is the highest. When the addition amount of SiO 2 is less than 0.33 mol and more than 0.33 mol, the decomposition rate decreases. In addition, from the comparison of "Test Example 9, Test Example 11, and Test Example 12", it can be seen that if there is too much SiO 2 , the filterability decreases. It is considered that this is because the unreacted fine SiO 2 remains in the slurry.

(關於硫酸量) 若增大相對於CaF2 的硫酸的量(莫耳比),則CaF2 的分解率變高,但殘留於濾液中的硫酸量增加,於接下來的第二步驟中,SiF4 與HF容易揮發。於SiO2 的存在下,即便為當量的硫酸,分解率亦超過85%,於1.05倍等量時為90%~94%,於2倍等量時亦為96.2%。(Regarding the amount of sulfuric acid) If the amount of sulfuric acid (molar ratio) relative to CaF 2 is increased, the decomposition rate of CaF 2 becomes higher, but the amount of sulfuric acid remaining in the filtrate increases. In the next second step, SiF 4 and HF are easy to volatilize. In the presence of SiO 2 , even the equivalent of sulfuric acid, the decomposition rate is more than 85%, 90% to 94% when 1.05 times the equivalent amount, and 96.2% when 2 times the equivalent amount.

(關於滯留時間) 根據試驗例9及試驗例13的結果,若延長反應時的滯留時間(滴加H2 SO4 後的反應時間),則有分解率提高、石膏結晶變大的傾向,但如試驗例6及試驗例7般,若反應時的滯留時間超過2小時,則看不到差異。因此可知,滯留時間為2小時~4小時時充分。(Regarding residence time) According to the results of Test Example 9 and Test Example 13, if the residence time during the reaction ( reaction time after dropping H 2 SO 4 ) is prolonged, the decomposition rate will increase and the gypsum crystals will tend to increase, but Like Test Example 6 and Test Example 7, if the residence time during the reaction exceeds 2 hours, no difference is seen. Therefore, it can be seen that it is sufficient when the residence time is 2 hours to 4 hours.

[試驗例16](減壓蒸餾) 使用1 L的氟樹脂製減壓蒸餾裝置,裝入實施例1的第一步驟中獲得的濾液(六氟矽酸:27.6質量%、莫耳比(F/Si):5.71、H2 SO4 :3.2質量%)910 g,於15 kPa絕對壓力下進行濃縮蒸餾。進行蒸餾直至罐殘留的溫度達到75℃為止,結果作為罐殘留而獲得402 g的濃縮液,其組成為六氟矽酸:38.5質量%、莫耳比(F/Si):7.03、H2 SO4 :7.2質量%。[Test Example 16] (Vacuum Distillation) Using a 1 L fluororesin vacuum distillation apparatus, the filtrate obtained in the first step of Example 1 (hexafluorosilicic acid: 27.6 mass%, molar ratio (F /Si): 5.71, H 2 SO 4 : 3.2% by mass) 910 g, concentrated and distilled under an absolute pressure of 15 kPa. Distillation was performed until the temperature of the tank residue reached 75°C. As a result, 402 g of concentrated liquid was obtained as tank residue. Its composition was hexafluorosilicic acid: 38.5 mass%, molar ratio (F/Si): 7.03, H 2 SO 4 : 7.2% by mass.

[試驗例17](無起泡操作) 於實施例1中,不進行第三步驟(i)的起泡操作,除此以外與實施例1同樣地進行第三步驟(i)及(ii)。 回收的硫酸吸收液的組成為含有2.2質量%的HF的約75質量%H2 SO4 溶液。[Test Example 17] (No foaming operation) In Example 1, the foaming operation of the third step (i) was not performed, and the third steps (i) and (ii) were performed in the same manner as in Example 1, except that the foaming operation of the third step (i) was not performed. . The composition of the recovered sulfuric acid absorption liquid was an approximately 75% by mass H 2 SO 4 solution containing 2.2% by mass of HF.

no

no

Claims (11)

一種氟化氫的製造方法,其包括: 第一步驟,使包含選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物、無機酸、以及含Si元素的化合物的混合物反應,獲得包含氟化氫及六氟矽酸的水溶液A、與選自鹼金屬鹽及鹼土金屬鹽中的至少一種化合物; 第二步驟,將所述水溶液A濃縮,獲得作為包含氟化氫及六氟矽酸的濃縮液的水溶液B;以及 第三步驟,對所述水溶液B賦予硫酸,產生包含四氟化矽及氟化氫的氣體,自所述氣體中分離氟化氫並加以回收。A method for manufacturing hydrogen fluoride, which includes: The first step is to react a mixture containing at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides, inorganic acids, and Si element-containing compounds to obtain an aqueous solution A containing hydrogen fluoride and hexafluorosilicic acid, and At least one compound selected from alkali metal salts and alkaline earth metal salts; In the second step, the aqueous solution A is concentrated to obtain an aqueous solution B as a concentrated solution containing hydrogen fluoride and hexafluorosilicic acid; and In the third step, sulfuric acid is applied to the aqueous solution B to generate a gas containing silicon tetrafluoride and hydrogen fluoride, and the hydrogen fluoride is separated from the gas and recovered. 如請求項1所述的氟化氫的製造方法,其中所述含Si元素的化合物為選自由四氟化矽及二氧化矽所組成的群組中的至少一種。The method for producing hydrogen fluoride according to claim 1, wherein the Si element-containing compound is at least one selected from the group consisting of silicon tetrafluoride and silicon dioxide. 如請求項1或請求項2所述的氟化氫的製造方法,其中選自所述鹼金屬鹽及鹼土金屬鹽中的至少一種化合物是化合水的比率為19質量%以上的二水石膏。The method for producing hydrogen fluoride according to claim 1 or 2, wherein at least one compound selected from the alkali metal salt and alkaline earth metal salt is dihydrate gypsum having a water ratio of 19% by mass or more. 如請求項1至請求項3中任一項所述的氟化氫的製造方法,其中所述第一步驟是於無機酸的濃度為40質量%以下且溫度90℃以下的條件下進行。The method for producing hydrogen fluoride according to any one of claims 1 to 3, wherein the first step is performed under the conditions that the concentration of the inorganic acid is 40% by mass or less and the temperature is 90°C or less. 如請求項1至請求項4中任一項所述的氟化氫的製造方法,其中作為包含選自所述鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物的原料,使用以乾燥重量計包含60質量%以上的氟化鈣的人工螢石。The method for producing hydrogen fluoride according to any one of Claims 1 to 4, wherein as a raw material containing at least one compound selected from the alkali metal fluorides and alkaline earth metal fluorides, a dry weight containing Artificial fluorite containing 60% by mass or more of calcium fluoride. 如請求項1至請求項5中任一項所述的氟化氫的製造方法,其中相對於選自鹼金屬氟化物及鹼土金屬氟化物中的至少一種化合物1莫耳,使用無機酸1.0莫耳~1.5莫耳、含Si元素的化合物0.2莫耳~1.0莫耳。The method for producing hydrogen fluoride according to any one of claims 1 to 5, wherein the inorganic acid is used from 1.0 mol to 1 mol of at least one compound selected from the group consisting of alkali metal fluorides and alkaline earth metal fluorides. 1.5 mol, Si element-containing compound 0.2 mol ~ 1.0 mol. 如請求項1至請求項6中任一項所述的氟化氫的製造方法,其中相對於水溶液B的總質量,所述水溶液B中的六氟矽酸的含有率為35質量%以上,且所述水溶液B中的F元素與Si元素的莫耳比(F/Si)為6.0以上。The method for producing hydrogen fluoride according to any one of claims 1 to 6, wherein the content of hexafluorosilicic acid in the aqueous solution B is 35% by mass or more relative to the total mass of the aqueous solution B, and The molar ratio (F/Si) of the F element to the Si element in the aqueous solution B is 6.0 or more. 如請求項1至請求項7中任一項所述的氟化氫的製造方法,其中所述第三步驟是於所述水溶液B中加入75質量%以上的濃硫酸或發煙硫酸,進行脫水分解,而產生包含四氟化矽及氟化氫的氣體, 使80質量%以上的硫酸吸收所述氟化氫而獲得吸收液, 將所述吸收液加溫至100℃以上,使氟化氫揮發並回收氟化氫。The method for producing hydrogen fluoride according to any one of claims 1 to 7, wherein the third step is to add 75% by mass or more of concentrated sulfuric acid or fuming sulfuric acid to the aqueous solution B for dehydration and decomposition, And produce gas containing silicon tetrafluoride and hydrogen fluoride, The hydrogen fluoride is absorbed by 80% by mass or more of sulfuric acid to obtain an absorption liquid, The absorption liquid is heated to above 100°C to volatilize the hydrogen fluoride and recover the hydrogen fluoride. 如請求項1至請求項8中任一項所述的氟化氫的製造方法,其中將所述第三步驟中生成的氟化氫分離並回收後獲得的無機酸水溶液用作第一步驟中的無機酸水溶液的至少一部分。The method for producing hydrogen fluoride according to any one of claims 1 to 8, wherein the inorganic acid aqueous solution obtained after the hydrogen fluoride generated in the third step is separated and recovered is used as the inorganic acid aqueous solution in the first step At least part of. 如請求項1至請求項9中任一項所述的氟化氫的製造方法,其中將所述第三步驟中生成的氟化氫分離並回收後獲得的無機酸水溶液提高濃度,而於第三步驟再利用。The method for producing hydrogen fluoride according to any one of claims 1 to 9, wherein the inorganic acid aqueous solution obtained after separating and recovering the hydrogen fluoride generated in the third step increases the concentration, and is reused in the third step . 如請求項1至請求項10中任一項所述的氟化氫的製造方法,其中回收所述第三步驟中生成氟化氫時副產生的四氟化矽,並將所述四氟化矽及所述四氟化矽與水的反應產物中的至少一者作為所述第一步驟中的含Si元素的化合物的至少一部分而使用、或者於所述第三步驟中添加至所述水溶液B中而使用。The method for producing hydrogen fluoride according to any one of claims 1 to 10, wherein silicon tetrafluoride that is by-produced when hydrogen fluoride is generated in the third step is recovered, and the silicon tetrafluoride and the At least one of the reaction products of silicon tetrafluoride and water is used as at least a part of the Si element-containing compound in the first step, or is added to the aqueous solution B in the third step and used .
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