TW202104549A - Surface-coated phosphor particle, method for producing surface-coated phosphor particle, and light emitting device - Google Patents

Surface-coated phosphor particle, method for producing surface-coated phosphor particle, and light emitting device Download PDF

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TW202104549A
TW202104549A TW109111676A TW109111676A TW202104549A TW 202104549 A TW202104549 A TW 202104549A TW 109111676 A TW109111676 A TW 109111676A TW 109111676 A TW109111676 A TW 109111676A TW 202104549 A TW202104549 A TW 202104549A
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phosphor particles
coated phosphor
fluorine
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TWI829912B (en
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赤羽雅斗
江本秀幸
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日商電化股份有限公司
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    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
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Abstract

A surface-coated phosphor particle of the present invention includes a particle containing a phosphor and a coating portion that coats the surface of the particle, wherein the phosphor has a composition represented by the general formula M1 a M2 b M3 c Al3 N4-d Od (wherein M1 is one or more elements selected from the group consisting of Sr, Mg, Ca, and Ba, M2 is one or more elements selected from the group consisting of Li and Na, and M3 is one or more elements selected from the group consisting of Eu and Ce), in which the values for a, b, c, and d satisfy each of the following formulas: 0.850≤a≤1.150, 0.850≤b≤1.150, 0.001≤c≤0.015, 0≤d≤0.40, 0≤d/(a+d)<0.30, and the coating portion forms at least part of the outermost surface of the particle and contains a fluorine-containing compound containing elemental fluorine and elemental aluminum such that the elemental fluorine content is at least 15% by mass but not more than 30% by mass of the entire surface-coated phosphor particle.

Description

表面被覆螢光體粒子、表面被覆螢光體粒子之製造方法以及發光裝置Surface-coated phosphor particles, method for manufacturing surface-coated phosphor particles, and light-emitting device

本發明關於表面被覆螢光體粒子、表面被覆螢光體粒子之製造方法及發光裝置。The present invention relates to surface-coated phosphor particles, a method for manufacturing surface-coated phosphor particles, and a light-emitting device.

發光二極體(LED)和螢光體組合而形成之發光裝置,已被廣泛地使用於照明裝置或液晶顯示裝置之背光等。尤其液晶顯示裝置使用發光裝置時,有高色彩再現性之需求,故期望使用為螢光光譜之半值全寬(下列簡稱為「半值寬」)狹小的螢光體。Light-emitting devices formed by combining light-emitting diodes (LEDs) and phosphors have been widely used in lighting devices or backlights of liquid crystal display devices. Especially when the liquid crystal display device uses a light emitting device, there is a demand for high color reproducibility, so it is desirable to use a phosphor with a narrow full width at half maximum (hereinafter referred to as "half width") of the fluorescent spectrum.

作為以往使用的半值寬狹小之紅色螢光體已知有由Eu2+ 活化之氮化物螢光體或氮氧化物螢光體。就它們的代表性之純氮化物螢光體而言,有Sr2 Si5 N8 :Eu2+ 、CaAlSiN3 :Eu2+ (簡稱為CASN)、(Ca,Sr)AlSiN3 :Eu2+ (簡稱為SCASN)等。CASN螢光體及SCASN螢光體在610~680nm之範圍有峰部波長,其半值寬為較狹小之75nm以上且90nm以下。然而,將這些螢光體作為液晶顯示用之發光裝置使用時,有色彩再現範圍更擴大之需求、且有半值寬更狹小之螢光體之需求。As the conventionally used red phosphor with a narrow half-value width, a nitride phosphor or an oxynitride phosphor activated by Eu 2+ is known. For their representative pure nitride phosphors, there are Sr 2 Si 5 N 8 : Eu 2+ , CaAlSiN 3 : Eu 2+ (referred to as CASN), (Ca, Sr)AlSiN 3 : Eu 2+ (Referred to as SCASN) and so on. CASN phosphors and SCASN phosphors have peak wavelengths in the range of 610 to 680 nm, and their half-value widths are narrower than 75 nm and less than 90 nm. However, when these phosphors are used as light-emitting devices for liquid crystal displays, there is a demand for a wider color reproduction range and a demand for phosphors with a narrower half-value width.

近年來,就顯示半值寬為70nm以下之窄帶域紅色螢光體而言,已知有SrLiAl3 N4 :Eu2+ (簡稱為SLAN)螢光體,應用此螢光體之發光裝置可期待有優異之演色性或色彩再現性。 In recent years, SrLiAl 3 N 4 :Eu 2+ (abbreviated as SLAN) phosphors are known for displaying red phosphors with a half-value width of less than 70nm in the narrow band region. Light-emitting devices using this phosphor can be Expect excellent color rendering or color reproducibility.

專利文獻1揭示了具有特定組成之SLAN螢光體。 [先前技術文獻] [專利文獻]Patent Document 1 discloses a SLAN phosphor having a specific composition. [Prior Technical Literature] [Patent Literature]

專利文獻1:日本特開2017-088881號公報Patent Document 1: Japanese Patent Application Publication No. 2017-088881

[發明所欲解決之課題][The problem to be solved by the invention]

SLAN螢光體有和水接觸即會輕易分解之性質。此性質成為隨時間的經過而發光強度降低之主要原因。近年來,針對使用了SLAN螢光體之發光裝置的可靠性需要有更進一步的提升,且針對SLAN螢光體之耐濕性亦需要有更進一步的提升。 [解決課題之手段]SLAN phosphor has the property of being easily decomposed when it comes in contact with water. This property becomes the main reason why the luminous intensity decreases with the passage of time. In recent years, the reliability of light-emitting devices using SLAN phosphors needs to be further improved, and the moisture resistance of SLAN phosphors also needs to be further improved. [Means to solve the problem]

本發明人們探討後之結果,發現含有SLAN螢光體或類似其結晶結構之氮化物螢光體之粒子,雖還不清楚詳細的機制,但已可明確得知藉由使該粒子表面至少由含氟化合物構成且將相對於粒子整體之氟元素之含量設為預定值以上,可抑制在水暴露環境下的螢光強度降低,亦即,可提升耐濕性。The inventors of the present invention found that particles containing SLAN phosphors or nitride phosphors similar to its crystalline structure. Although the detailed mechanism is not yet clear, it is clear that by making the surface of the particles at least The composition of a fluorine-containing compound and setting the content of the fluorine element relative to the entire particle to a predetermined value or more can suppress the reduction of the fluorescence intensity in a water-exposed environment, that is, it can improve the moisture resistance.

依據本發明,可提供一種表面被覆螢光體粒子,包含: 含螢光體粒子、以及 被覆該粒子表面之被覆部; 該螢光體具有通式M1 a M2 b M3 c Al3 N4-d Od 表示之組成,惟M1 係選自於Sr、Mg、Ca及Ba中之1種以上之元素,M2 係選自於Li、及Na中之1種以上之元素,M3 係選自於Eu及Ce中之1種以上之元素,該a、b、c、及d符合下列各式; 0.850≦a≦1.150 0.850≦b≦1.150 0.001≦c≦0.015 0≦d≦0.40 0≦d/(a+d)<0.30 該被覆部構成該粒子之最表面之至少一部分,且包含了含有氟元素及鋁元素之含氟化合物, 相對於該表面被覆螢光體粒子整體,氟元素之含有率為15質量%以上且30質量%以下。According to the present invention, a surface-coated phosphor particle can be provided, comprising: phosphor-containing particles and a coating part covering the surface of the particle; the phosphor has the general formula M 1 a M 2 b M 3 c Al 3 N 4-d O d represents the composition, but M 1 is one or more elements selected from Sr, Mg, Ca and Ba, M 2 is one or more elements selected from Li and Na, M 3 is one or more elements selected from Eu and Ce, the a, b, c, and d meet the following formulas: 0.850≦a≦1.150 0.850≦b≦1.150 0.001≦c≦0.015 0≦d≦0.40 0≦d/(a+d)<0.30 The coating constitutes at least a part of the outermost surface of the particle, and contains a fluorine-containing compound containing fluorine and aluminum. Relative to the entire surface-coated phosphor particle, fluorine The element content is 15% by mass or more and 30% by mass or less.

此外,依據本發明,可提供一種上述表面被覆螢光體粒子之製造方法,包括下列步驟:混合步驟,將原料予以混合;煅燒步驟,將由該混合步驟得到的混合體予以煅燒;酸處理步驟,將由該煅燒步驟得到的煅燒物和酸性溶液予以混合;及氟處理步驟,將經該酸處理步驟之該煅燒物和含有氟元素之化合物予以混合; 該混合步驟中,該Al之莫耳比設為3時之該M1 之投入量,按莫耳比計為1.10以上且1.20以下。In addition, according to the present invention, a method for manufacturing the above-mentioned surface-coated phosphor particles can be provided, which includes the following steps: a mixing step, mixing the raw materials; a calcining step, calcining the mixture obtained from the mixing step; an acid treatment step, The calcined product obtained by the calcination step and the acid solution are mixed; and the fluorine treatment step is to mix the calcined product and the fluorine element-containing compound after the acid treatment step; in the mixing step, the molar ratio of the Al is set The input amount of the M 1 at 3 o'clock is 1.10 or more and 1.20 or less in molar ratio.

此外,依據本發明,可提供一種發光裝置,具有上述表面被覆螢光體粒子、及發光元件。 [發明之效果]In addition, according to the present invention, it is possible to provide a light-emitting device having the above-mentioned surface-coated phosphor particles and a light-emitting element. [Effects of Invention]

依據本發明,可提供關於提升耐濕性之氮化物螢光體粒子之技術。According to the present invention, it is possible to provide a technology for improving the moisture resistance of nitride phosphor particles.

下列,針對本發明之實施形態進行詳細地說明。Hereinafter, the embodiments of the present invention will be described in detail.

實施形態之表面被覆螢光體粒子包含:含螢光體之粒子、以及被覆該粒子表面之被覆部。下列針對表面被覆螢光體粒子之詳細內容進行說明。The surface-coated phosphor particles of the embodiment include: phosphor-containing particles, and a coating portion covering the surface of the particles. The following describes the details of surface-coated phosphor particles.

本實施形態之粒子構成之螢光體由通式M1 a M2 b M3 c Al3 N4-d Od 表示。a、b、c、4-d、及d表示各元素之莫耳比。The phosphor composed of particles of this embodiment is represented by the general formula M 1 a M 2 b M 3 c Al 3 N 4-d O d . a, b, c, 4-d, and d represent the molar ratio of each element.

上述通式中,M1 係選自於Sr、Mg、Ca及Ba中之1種以上之元素。較理想為M1 至少包含Sr。M1 之莫耳比a之下限宜為0.850以上較理想,0.950以上更理想。另一方面,M1 之莫耳比a之上限宜為1.150以下較理想,1.100以下更理想,1.050以下還更理想。藉由令M1 之莫耳比a落在上述範圍內,可提升結晶結構穩定性。In the above general formula, M 1 is an element selected from one or more of Sr, Mg, Ca, and Ba. It is more desirable that M 1 contains at least Sr. The lower limit of the molar ratio a of M 1 is preferably 0.850 or more, more preferably 0.950 or more. On the other hand, the upper limit of the molar ratio a of M 1 is preferably 1.150 or less, more preferably 1.100 or less, and even more preferably 1.050 or less. By making the molar ratio a of M 1 fall within the above range, the stability of the crystal structure can be improved.

上述通式中,M2 係選自於Li、及Na中之1種以上之元素。較理想為M2 至少包含Li。M2 之莫耳比b之下限宜為0.850以上較理想,0.950以上更理想。另一方面,M2 之莫耳比b之上限宜為1.150以下較理想,1.100以下更理想,1.050以下還更理想。藉由令M2 之莫耳比a落在上述範圍內,可提升結晶結構穩定性。In the above general formula, M 2 is one or more elements selected from Li and Na. It is more desirable that M 2 contains at least Li. The lower limit of the molar ratio b of M 2 is preferably 0.850 or more, more preferably 0.950 or more. On the other hand, the upper limit of the molar ratio b of M 2 is preferably 1.150 or less, more preferably 1.100 or less, and even more preferably 1.050 or less. By making the molar ratio a of M 2 fall within the above range, the stability of the crystal structure can be improved.

上述通式中,M3 係添加至母體結晶之活化劑,亦即構成螢光體之發光中心離子之元素,且係選自於Eu、及Ce中之1種以上之元素。M3 可依據需求之發光波長而進行選擇,理想為至少包含Eu。 M3 之莫耳比c之下限宜為0.001以上較理想,0.005以上更理想。另一方面,M3 之莫耳比c之上限宜為0.015以下較理想,0.010以下更理想。藉由令M3 之莫耳比c之下限落在上述範圍內,可得到充分之發光強度。此外,藉由令M3 之莫耳比c之上限落在上述範圍內,可抑制濃縮消光且使發光強度維持在充分之值。In the above general formula, M 3 is an activator added to the matrix crystal, that is, an element constituting the luminescence center ion of the phosphor, and is an element selected from one or more of Eu and Ce. M 3 can be selected according to the required emission wavelength, and ideally contains Eu at least. The lower limit of the molar ratio c of M 3 is preferably 0.001 or more, more preferably 0.005 or more. On the other hand, the upper limit of the molar ratio c of M 3 is preferably 0.015 or less, more preferably 0.010 or less. By making the lower limit of the molar ratio c of M 3 fall within the above range, sufficient luminous intensity can be obtained. In addition, by making the upper limit of the molar ratio c of M 3 fall within the above range, it is possible to suppress concentration extinction and maintain the luminous intensity at a sufficient value.

上述通式中,氧之莫耳比d之下限宜為0以上較理想,0.05以上更理想。另一方面,氧之莫耳比d之上限宜為0.40以下較理想,0.35以下更理想。藉由令氧之莫耳比d落在上述範圍內,可穩定螢光體之結晶狀態且使發光強度維持在充分之值。 此外,螢光體中之氧元素之含量未達2質量%較理想,1.8質量%以下更理想。氧元素之含量未達2質量%的話,可讓螢光體之結晶狀態穩定化且使發光強度維持在充分之值。In the above general formula, the lower limit of the molar ratio d of oxygen is preferably 0 or more, more preferably 0.05 or more. On the other hand, the upper limit of the molar ratio d of oxygen is preferably 0.40 or less, more preferably 0.35 or less. By making the molar ratio d of oxygen fall within the above range, the crystalline state of the phosphor can be stabilized and the luminous intensity can be maintained at a sufficient value. In addition, the content of oxygen in the phosphor is preferably less than 2% by mass, and more preferably less than 1.8% by mass. If the oxygen content is less than 2% by mass, the crystalline state of the phosphor can be stabilized and the luminous intensity can be maintained at a sufficient value.

M1 及氧之莫耳比,亦即,從a、d算出之d/(a+d)之值之下限宜為0以上較理想,0.05以上更理想。另一方面,d/(a+d)之值之上限宜為未達0.30較理想,0.25以下更理想。藉由令d/(a+d)落在上述範圍內,可讓螢光體之結晶狀態穩定化且使發光強度維持在充分之值。The molar ratio of M 1 and oxygen, that is, the lower limit of the value of d/(a+d) calculated from a and d is preferably 0 or more, more preferably 0.05 or more. On the other hand, the upper limit of the value of d/(a+d) is preferably less than 0.30, more preferably less than 0.25. By making d/(a+d) fall within the above range, the crystalline state of the phosphor can be stabilized and the luminous intensity can be maintained at a sufficient value.

被覆部構成上述含螢光體粒子之最表面的至少一部分。該被覆部包含了含有氟元素及鋁元素之含氟化合物。 含氟化合物中,宜為氟元素和鋁元素直接共價鍵結較理想,更具體而言,宜為含氟化合物含有(NH4 )3 AlF6 或AlF3 中之一者或兩者較理想。又,含氟化合物亦可由含有氟元素及鋁元素之單一種化合物構成。 藉由上述之被覆部構成含螢光體粒子之表面之至少一部分,可提升構成粒子之螢光體之耐濕性。又,考量使螢光體之耐濕性更進一步提升的觀點,被覆部含有AlF3 更理想。The coating portion constitutes at least a part of the outermost surface of the phosphor-containing particles. The coating includes a fluorine-containing compound containing fluorine and aluminum. Among the fluorine-containing compounds, it is preferable that the fluorine element and the aluminum element be directly covalently bonded. More specifically, it is preferable that the fluorine-containing compound contains one or both of (NH 4 ) 3 AlF 6 or AlF 3 . In addition, the fluorine-containing compound may be composed of a single compound containing a fluorine element and an aluminum element. By forming at least a part of the surface of the phosphor particles containing the above-mentioned covering part, the moisture resistance of the phosphor particles constituting the particles can be improved. In addition, from the viewpoint of further improving the moisture resistance of the phosphor, it is more desirable that the coating part contains AlF 3.

被覆部之態樣無特別限制,只要係被覆部被覆粒子表面之至少一部分之構成即可,亦可為被覆粒子表面整體之構成。就被覆部之態樣而言,可列舉例如:多數的粒子狀之含氟化合物分散在含螢光體粒子之表面之態樣、含氟化合物續性地被覆含螢光體粒子之表面之態樣。The aspect of the coating part is not particularly limited, as long as the coating part covers at least a part of the surface of the particle, and it may also be the entire surface of the coating particle. As for the state of the coating, for example, a state in which a large number of particulate fluorine-containing compounds are dispersed on the surface of the phosphor-containing particles, and a state in which the fluorine-containing compound continuously covers the surface of the phosphor-containing particles kind.

本實施形態中,氟元素相對於表面被覆螢光體粒子整體之含有率為15質量%以上且30質量%以下。藉由氟元素相對於表面被覆螢光體粒子整體之含有率為15質量%以上可提高耐濕性。藉由氟元素相對於表面被覆螢光體粒子整體之含有率為30質量%以下可提高耐濕性並使發光強度維持在充分之值。 氟元素相對於表面被覆螢光體粒子整體之含有率之下限宜為18質量%以上較理想,20質量%以上更理想。此外,氟元素相對於表面被覆螢光體粒子整體之含有率之上限宜為27質量%以下較理想,25質量%以下更理想。藉由令氟元素之含有率之下限落在上述範圍內,可更進一步地提高耐濕性。此外,藉由令氟元素之含有率之上限落在上述範圍內,能夠使耐濕性更進一步地提高且使發光強度維持在充分之值。 又,氟元素係源自後述使用作為原料之金屬元素之氟化物,或在後述之氟處理步驟被添加者,不構成螢光體之結晶結構。In this embodiment, the content rate of the fluorine element with respect to the entire surface-coated phosphor particles is 15% by mass or more and 30% by mass or less. The moisture resistance can be improved by the content of the fluorine element relative to the entire surface-coated phosphor particles being 15% by mass or more. The content of the fluorine element relative to the entire surface-coated phosphor particles is 30% by mass or less, which improves the moisture resistance and maintains the luminous intensity at a sufficient value. The lower limit of the content of the fluorine element relative to the entire surface-coated phosphor particles is preferably 18% by mass or more, and more preferably 20% by mass or more. In addition, the upper limit of the content of the fluorine element relative to the entire surface-coated phosphor particles is preferably 27% by mass or less, and more preferably 25% by mass or less. By making the lower limit of the fluorine element content rate fall within the above range, the moisture resistance can be further improved. In addition, by making the upper limit of the content rate of the fluorine element fall within the above-mentioned range, the moisture resistance can be further improved and the emission intensity can be maintained at a sufficient value. In addition, the fluorine element is derived from the fluoride of the metal element used as the raw material described later, or is added in the fluorine treatment step described later, and does not constitute the crystal structure of the phosphor.

依據本實施形態之表面被覆螢光體粒子,可抑制水暴露環境下之螢光強度,理想為可抑制90%RH以上等的高濕環境下之螢光強度的降低,更理想為可抑制高溫高濕環境下之螢光強度的降低。According to the surface-coated phosphor particles of this embodiment, it is possible to suppress the fluorescence intensity in a water-exposed environment, ideally it is possible to suppress the reduction of the fluorescence intensity in a high-humidity environment such as 90%RH or more, and it is more desirable to suppress the high temperature The reduction of fluorescence intensity in high humidity environment.

本實施形態之表面被覆螢光體粒子中,相對於波長300nm的光照射之擴散反射率,例如宜為56%以上較理想,更理想為58%以上,還更理想為60%以上。 此外,表面被覆螢光體粒子中,相對於螢光光譜之峰部波長的光照射之擴散反射率,例如宜為85%以上較理想,更理想為86%以上。藉由具備如此之特性,可更提高發光效率且更提升發光強度。In the surface-coated phosphor particles of this embodiment, the diffuse reflectance with respect to light irradiation with a wavelength of 300 nm is preferably 56% or more, more preferably 58% or more, and still more preferably 60% or more. In addition, in the surface-coated phosphor particles, the diffuse reflectance of light irradiation with respect to the peak wavelength of the fluorescence spectrum is, for example, preferably 85% or more, and more preferably 86% or more. With such characteristics, the luminous efficiency can be further improved and the luminous intensity can be further improved.

本實施形態之表面被覆螢光體粒子之一例,以波長455nm之藍光進行激發時,宜為峰部波長落在640nm以上且670nm以下之範圍內,半值寬為45nm以上且60nm以下較理想。藉由具備如此之特性,可期待有優異之演色性、色彩再現性。As an example of the surface-coated phosphor particles of this embodiment, when excited by blue light with a wavelength of 455nm, the peak wavelength should fall within the range of 640nm or more and 670nm or less, and the half-value width should be 45nm or more and 60nm or less. With such characteristics, excellent color rendering and color reproducibility can be expected.

本實施形態之表面被覆螢光體粒子之一例,以波長455nm之藍光進行激發時,宜為發光色之色純度在CIE-xy色度圖中x值宜符合0.680≦x<0.735較理想。藉由具備如此之特性,可期待有優異之演色性、色彩再現性。x值為0.680以上的話可期待色純度更良好之紅色發光,x值若為0.735以上之值則會超過CIE-xy色度圖內之最大值,宜為符合上述範圍較理想。As an example of the surface-coated phosphor particles of this embodiment, when excited by blue light with a wavelength of 455nm, the color purity of the luminescent color should preferably be 0.680≦x<0.735 in the CIE-xy chromaticity diagram. With such characteristics, excellent color rendering and color reproducibility can be expected. If the x value is 0.680 or more, red light with better color purity can be expected. If the x value is 0.735 or more, it will exceed the maximum value in the CIE-xy chromaticity diagram. It is better to meet the above range.

本實施形態中,藉由對於酸處理步驟中酸及溶劑之種類、酸之濃度,氫氟酸處理步驟中,氫氟酸之濃度、氫氟酸處理之時間,氫氟酸處理後進行的加熱步驟中之加熱溫度及加熱時間等予以適當地調整等,可於含螢光體粒子之表面形成含有氟元素及鋁元素之含氟化合物,並可將粒子中之氟元素之含有率控制在預定之範圍內。In this embodiment, the type of acid and solvent in the acid treatment step, the acid concentration, the concentration of hydrofluoric acid, the time of hydrofluoric acid treatment in the hydrofluoric acid treatment step, and the heating performed after the hydrofluoric acid treatment The heating temperature and heating time in the step can be adjusted appropriately to form a fluorine-containing compound containing fluorine and aluminum on the surface of phosphor-containing particles, and the content of fluorine in the particles can be controlled to a predetermined value Within the range.

依據上述說明之表面被覆螢光體粒子,藉由包含了含有氟元素及鋁元素之含氟化合物之被覆部被覆螢光體粒子表面,可提高氮化物螢光體之耐濕性並且可長時間維持發光強度。According to the above-mentioned surface-coated phosphor particles, the surface of the phosphor particles is coated by the coating part containing the fluorine-containing compound containing the fluorine element and the aluminum element, which can improve the moisture resistance of the nitride phosphor and can be used for a long time. Maintain luminous intensity.

(表面被覆螢光體粒子之製造方法) 本實施形態之表面被覆螢光體粒子,可藉由下列步驟而製造: 將原料予以混合之混合步驟、將混合步驟而得到的混合體進行煅燒之煅燒步驟、將煅燒步驟而得到的煅燒物和酸性溶液予以混合之酸處理步驟、將經酸處理步驟之煅燒物、含有氟元素之化合物予以混合之氟處理步驟。除上述之步驟外,其他還可追加將氟處理步驟而得到的結果物施予加熱處理之加熱步驟。(Method for manufacturing surface-coated phosphor particles) The surface-coated phosphor particles of this embodiment can be manufactured by the following steps: The mixing step in which the raw materials are mixed, the calcination step in which the mixture obtained in the mixing step is calcined, the acid treatment step in which the calcined product obtained in the calcining step and the acid solution are mixed, the calcined product that has undergone the acid treatment step, contains The fluorine treatment step in which compounds of fluorine elements are mixed. In addition to the above-mentioned steps, it is also possible to add a heating step of subjecting the resultant obtained in the fluorine treatment step to heat treatment.

(混合步驟) 混合步驟,係將經可得到作為目的之表面被覆螢光體粒子之方式而稱量之各原料予以混合而得到粉末狀之原料混合體之步驟。將原料予以混合之方法無特別限制,例如使用研缽、球磨機、V型混合機、行星式軋機等混合裝置充分地混合之方法。又,對於會和空氣中之水分或氧氣發生激烈反應之氮化鍶、氮化鋰等,使用內部經取代為惰性氣體環境之手套箱內或使用混合裝置來操作較為適當。(Mixing step) The mixing step is a step of mixing the raw materials weighed in such a way that the target surface-coated phosphor particles can be obtained to obtain a powdery raw material mixture. The method of mixing the raw materials is not particularly limited, and for example, a method of sufficiently mixing using a mixing device such as a mortar, a ball mill, a V-type mixer, and a planetary mill. In addition, for strontium nitride, lithium nitride, etc., which will react violently with moisture or oxygen in the air, it is more appropriate to use a glove box whose interior is replaced with an inert gas environment or use a mixing device.

混合步驟中,Al之莫耳比設為3時之M1 之投入量為莫耳比1.10以上較理想。藉由令M1 之投入量按莫耳比計為1.10以上,可抑制在煅燒步驟中之M1 因揮發等導致螢光體中之M1 不足,M1 不易發生缺陷,結晶結構之結晶性可維持良好。此結果推測可得到窄帶域之螢光光譜並提高發光強度。此外,混合步驟中,Al之莫耳比設為3時之M1 之投入量宜按莫耳比計為1.20以下較理想。藉由令M1 之投入量按莫耳比計為1.20以下,可抑制含M1 之異相的增加,可輕易去除酸處理步驟之異相並提高發光強度。In the mixing step, when the molar ratio of Al is set to 3, the input amount of M 1 is preferably 1.10 or more in molar ratio. By setting the input amount of M 1 to be 1.10 or more in terms of molar ratio, it is possible to suppress the lack of M 1 in the phosphor due to volatilization of M 1 in the calcination step, and M 1 is not prone to defects, and the crystallinity of the crystal structure Can be maintained well. This result infers that a narrow-band fluorescence spectrum can be obtained and the luminous intensity can be improved. In addition, in the mixing step, when the molar ratio of Al is set to 3, the input amount of M 1 should preferably be 1.20 or less in molar ratio. By making the input amount of M 1 less than 1.20 in terms of molar ratio, the increase of the out-of-phase containing M 1 can be suppressed, the out-of-phase in the acid treatment step can be easily removed, and the luminous intensity can be increased.

混合步驟中所使用之各原料,可選自於含在螢光體之組成之金屬元素之金屬單體及含該金屬元素之金屬化合物構成之群組中之1種以上。就金屬化合物而言,可列舉例如:氮化物、氫化物、氟化物、氧化物、碳酸鹽、氯化物等。其中,考量可提升螢光體之發光強度之觀點,就含M1 及M2 之金屬化合物而言可適當地使用氮化物。具體而言,就含M1 之金屬化合物而言,可列舉如:Sr3 N2 、SrN2 、SrN等。就含M2 之金屬化合物而言,可列舉如:Li3 N、LiN3 等。就含M3 之金屬化合物而言,可列舉如:Eu2 O3 、EuN、EuF3 。就含Al之金屬化合物而言,可列舉如:AlN、AlH3 、AlF3 、LiAlH4 等。又,因應必要亦可添加助焊劑。就助焊劑而言,可列舉如:LiF、SrF2 、BaF2 、AlF3 等。Each raw material used in the mixing step can be selected from one or more of the group consisting of the metal element of the metal element contained in the composition of the phosphor and the metal compound containing the metal element. Examples of metal compounds include nitrides, hydrides, fluorides, oxides, carbonates, and chlorides. Among them, considering that the luminous intensity of the phosphor can be improved, the nitride can be suitably used for the metal compound containing M 1 and M 2. Specifically, as for the metal compound containing M 1 , for example, Sr 3 N 2 , SrN 2 , SrN, etc. can be cited. As for the metal compound containing M 2 , for example, Li 3 N, LiN 3 and the like can be cited. As for the metal compound containing M 3 , for example, Eu 2 O 3 , EuN, EuF 3 can be mentioned. As for the metal compound containing Al, for example, AlN, AlH 3 , AlF 3 , LiAlH 4 and the like can be cited. In addition, flux can also be added as necessary. As for the flux, for example, LiF, SrF 2 , BaF 2 , AlF 3 and the like can be cited.

(煅燒步驟) 煅燒步驟係將上述原料之混合體填充至煅燒容器之內部並煅燒。前述煅燒容器宜為具備氣密性提高之結構較理想,煅燒容器之內部宜充滿氬氣、氦氣、氫氣、氮氣等非氧化性氣體之環境氣體較理想。煅燒容器宜係由在高溫之環境氣體下仍穩定,難以和原料之混合體及其反應產物進行反應之材質所構成較理想,例如宜為使用氮化硼製、碳製之容器、鉬或鉭或鎢等高熔點金屬製之容器較理想。(Calcination step) The calcining step is to fill the mixture of the above-mentioned raw materials into the calcining vessel and calcinate. The aforementioned calcining vessel should preferably have a structure with improved airtightness, and the interior of the calcining vessel should be filled with non-oxidizing gases such as argon, helium, hydrogen, and nitrogen. The calcining container should preferably be made of materials that are stable under high-temperature ambient gas and are difficult to react with the mixture of raw materials and their reaction products. For example, it is preferable to use a container made of boron nitride, carbon, molybdenum or tantalum. Or a container made of high melting point metal such as tungsten is ideal.

[煅燒溫度] 煅燒步驟中之煅燒溫度之下限宜為900℃以上較理想,1000℃以上更理想,1100℃以上還更理想。另一方面,煅燒溫度之上限宜為1500℃以下較理想,1400℃以下更理想,1300℃以下還更理想。藉由令煅燒溫度落在上述範圍內,可減少煅燒步驟結束後之未反應原料,且可抑制主結晶相的分解。[Calcination temperature] The lower limit of the calcination temperature in the calcination step is preferably 900°C or higher, more preferably 1000°C or higher, and more preferably 1100°C or higher. On the other hand, the upper limit of the calcination temperature is preferably 1500°C or less, more preferably 1400°C or less, and even more preferably 1300°C or less. By keeping the calcination temperature within the above range, unreacted raw materials after the completion of the calcination step can be reduced, and the decomposition of the main crystalline phase can be suppressed.

[煅燒環境氣體之種類] 就煅燒步驟中之煅燒環境氣體之種類而言,例如可適當地使用包含氮作為元素之氣體。具體而言,可列舉如氮及/或氨,尤其氮較理想。此外,同樣地,可適當地使用氬氣、氦氣等惰性氣體。又,煅燒環境氣體可由1種之氣體構成,亦可為多數種類之氣體之混合氣體。[Types of calcination ambient gas] Regarding the type of the calcining atmosphere in the calcining step, for example, a gas containing nitrogen as an element can be suitably used. Specifically, nitrogen and/or ammonia can be mentioned, and nitrogen is particularly preferable. In addition, in the same way, inert gases such as argon and helium can be suitably used. In addition, the calcining environment gas can be composed of one type of gas, or a mixed gas of many types of gas.

[煅燒環境氣體之壓力] 煅燒環境氣體之壓力可因應煅燒溫度而選擇,通常為0.1MPa・G以上且10MPa・G以下之範圍之加壓狀態。煅燒環境氣體之壓力越高,螢光體之分解溫度越高,但考量工業生產性宜為0.5MPa・G以上且1MPa・G以下較理想。[Pressure of calcination ambient gas] The pressure of the calcination environment gas can be selected according to the calcination temperature, and is usually in the pressure state in the range of 0.1MPa・G or more and 10MPa・G or less. The higher the pressure of the calcination environment gas, the higher the decomposition temperature of the phosphor, but considering the industrial productivity, it is ideal to be 0.5MPa・G or more and 1MPa・G or less.

[煅燒時間] 煅燒步驟中之煅燒時間,可在存在大量未反應物、或一次粒子成長不足、或粒子間產生之燒結等之問題不會發生之時間範圍進行選擇。實施形態之表面被覆螢光體粒子之製造方法中,煅燒時間之下限為宜為0.5小時以上較理想,1小時以上更理想,2小時以上還更理想。此外,煅燒時間之上限宜為48小時以下較理想,36小時以下更理想,24小時以下還更理想。[Calcination time] The calcination time in the calcination step can be selected within a time range in which problems such as a large amount of unreacted substances, insufficient primary particle growth, or sintering between particles do not occur. In the method for producing surface-coated phosphor particles of the embodiment, the lower limit of the calcination time is preferably 0.5 hours or more, more preferably 1 hour or more, and more preferably 2 hours or more. In addition, the upper limit of the calcination time is preferably 48 hours or less, more preferably 36 hours or less, and more preferably 24 hours or less.

藉由煅燒步驟而得到的煅燒物之狀態,會依據原料摻合、煅燒條件而為粉狀、塊狀等各種狀態。為了預備實際使用作為表面被覆螢光體粒子時,亦可具備將得到的煅燒物製成預定之尺寸之粉末的解碎、粉碎步驟及/或分離操作步驟。又,表面被覆螢光體粒子之平均粒徑,考量得到激發光之吸收效率及充分的發光效率之觀點,使用作為LED用之表面被覆螢光體粒子時,宜將表面被覆螢光體粒子之平均粒徑調整為5μm以上且30μm以下。此外,上述之解碎、粉碎步驟為了防止有源自該處理之雜質混入,與煅燒物接觸之機器之構件宜為氮化矽、氧化鋁、矽鋁氮氧化物之類之高韌性陶瓷製較理想。The state of the calcined product obtained by the calcination step may be in various states such as powdery or massive depending on the blending of the raw materials and the calcination conditions. In order to prepare for actual use as surface-coated phosphor particles, the obtained calcined product may be provided with a disintegration, pulverization step, and/or separation operation step to form a powder of a predetermined size. In addition, considering the average particle size of the surface-coated phosphor particles, considering the absorption efficiency of excitation light and sufficient luminous efficiency, when using the surface-coated phosphor particles for LEDs, it is preferable to set the surface-coated phosphor particles to The average particle size is adjusted to 5 μm or more and 30 μm or less. In addition, in order to prevent the mixing of impurities originating from the process in the above-mentioned disintegration and pulverization steps, the components of the machine contacting the calcined material should preferably be made of high toughness ceramics such as silicon nitride, alumina, and silicon aluminum oxynitride. ideal.

(酸處理步驟) 酸處理步驟中使用之酸性溶液宜為水溶液較理想,與酸性溶液之接觸,一般係例如在包含硝酸、鹽酸、乙酸、硫酸、甲酸、磷酸中之1種以上之酸性之水溶液中將上述煅燒物予以分散,並經數分鐘至數小時攪拌。 具體而言,在有機溶劑及酸性溶液之混合溶液中將上述煅燒物予以分散,經數分鐘至數小時攪拌後,可使用有機溶劑進行洗淨。藉由酸處理可溶解去除包含於原料之雜質元素、源自煅燒容器之雜質元素、煅燒步驟產生的異相、於粉碎步驟中混入之雜質元素。同時可去除微粉,故可抑制光的散射,且還提升螢光體之光吸收率。 又,有機溶劑可使用甲醇、乙醇、2-丙醇等醇及丙酮等酮。酸性溶液為硝酸、鹽酸、乙酸、硫酸、甲酸、磷酸中之1種以上。就該等溶液之混合比率而言,例如,能夠以酸性溶液相對於有機溶劑為0.1體積%以上且3體積%以下之濃度之方式製備。(Acid treatment step) The acidic solution used in the acid treatment step is preferably an aqueous solution. The contact with the acidic solution is generally, for example, the above-mentioned calcined product in an acidic aqueous solution containing at least one of nitric acid, hydrochloric acid, acetic acid, sulfuric acid, formic acid, and phosphoric acid. Disperse and stir for several minutes to several hours. Specifically, the above-mentioned calcined product is dispersed in a mixed solution of an organic solvent and an acidic solution, and after stirring for several minutes to several hours, it can be washed with an organic solvent. The acid treatment can dissolve and remove the impurity elements contained in the raw materials, the impurity elements originating from the calcination vessel, the heterogeneous phase generated in the calcination step, and the impurity elements mixed in the pulverization step. At the same time, the fine powder can be removed, so the scattering of light can be suppressed, and the light absorption rate of the phosphor can also be improved. In addition, as the organic solvent, alcohols such as methanol, ethanol, and 2-propanol, and ketones such as acetone can be used. The acidic solution is at least one of nitric acid, hydrochloric acid, acetic acid, sulfuric acid, formic acid, and phosphoric acid. Regarding the mixing ratio of these solutions, for example, it can be prepared so that the acidic solution has a concentration of 0.1% by volume or more and 3% by volume or less with respect to the organic solvent.

(氟處理步驟) 氟處理步驟中,就混合至經酸處理步驟之煅燒物之含氟元素之化合物而言,可適當地使用氫氟酸水溶液。氫氟酸水溶液之濃度之下限宜為25%以上較理想,27%以上更理想,30%以上還更理想。另一方面,氫氟酸水溶液之濃度之上限宜為38%以下較理想,36%以下更理想,34%以下還更理想。藉由令氫氟酸水溶液之濃度為25%以上,可在含螢光體粒子之最表面的至少一部分形成有含(NH4 )3 AlF6 之被覆部。另一方面,令氫氟酸水溶液之濃度為38%以下,可抑制粒子和氫氟酸的反應過於激烈。 經酸處理步驟之煅燒物與氫氟酸水溶液之混合,可利用攪拌器等攪拌手段進行。上述煅燒物與氫氟酸水溶液之混合時間之下限宜為5分鐘以上較理想,10分鐘以上更理想,15分鐘以上更理想。另一方面,上述煅燒物與氫氟酸水溶液之混合時間之上限宜為30分以下較理想,25分鐘以下更理想,20分鐘以下還更理想。藉由令上述煅燒物與氫氟酸水溶液之混合時間落在上述範圍,可穩定地在含螢光體粒子之最表面的至少一部份形成有含(NH4 )3 AlF6 之被覆部。(Fluorine treatment step) In the fluorine treatment step, an aqueous hydrofluoric acid solution can be suitably used for the fluorine element-containing compound mixed into the calcined product subjected to the acid treatment step. The lower limit of the concentration of the hydrofluoric acid aqueous solution is preferably 25% or more, more preferably 27% or more, and more preferably 30% or more. On the other hand, the upper limit of the concentration of the hydrofluoric acid aqueous solution is preferably 38% or less, more preferably 36% or less, and more preferably 34% or less. By setting the concentration of the hydrofluoric acid aqueous solution to 25% or more, at least a part of the outermost surface of the phosphor-containing particles can be formed with a coating portion containing (NH 4 ) 3 AlF 6. On the other hand, setting the concentration of the hydrofluoric acid aqueous solution to 38% or less can inhibit the reaction of particles and hydrofluoric acid from being too intense. The mixing of the calcined product after the acid treatment step and the hydrofluoric acid aqueous solution can be carried out by stirring means such as a stirrer. The lower limit of the mixing time of the above-mentioned calcined product and the aqueous hydrofluoric acid solution is preferably 5 minutes or more, more preferably 10 minutes or more, and more preferably 15 minutes or more. On the other hand, the upper limit of the mixing time of the above-mentioned calcined product and the hydrofluoric acid aqueous solution is preferably 30 minutes or less, more preferably 25 minutes or less, and even more preferably 20 minutes or less. By making the mixing time of the calcined product and the hydrofluoric acid aqueous solution fall within the above range, a coating containing (NH 4 ) 3 AlF 6 can be stably formed on at least a part of the outermost surface of the phosphor-containing particles.

(加熱步驟) 藉由氟處理而得到的結果物作為被覆部含有(NH4 )3 AlF6 時,亦可在上列步驟之後實施加熱步驟。加熱步驟中加熱溫度之下限宜為220℃以上較理想,250℃以上更理想。另一方面,上述加熱溫度之上限宜為500℃以下較理想,450℃以下更理想,400℃以下還更理想。 藉由令加熱溫度為220℃以上,可因進行下述反應式(1)而使(NH4 )3 AlF6 變換為AlF3 。 (NH4 )3 AlF6 →AlF3 +3NH3 +3HF・・・(1) 另一方面,藉由令加熱溫度為500℃以下,可良好地維持螢光體之結晶結構並提高發光強度。 加熱時間之下限宜為1小時以上較理想,1.5小時以上更理想,2小時以上還更理想。另一方面,加熱時間之上限宜為6小時以下較理想,5.5小時以下更理想,5小時以下還更理想。藉由令加熱時間落在上述範圍內,可更確實地使(NH4 )3 AlF6 變換為耐濕性更高之AlF3 。 又,加熱步驟宜在大氣中或氮環境氣體下實施較理想。藉此,加熱環境氣體之物質本身可不妨礙上述反應式(1)而產生目的之物質。(Heating step) When the resultant obtained by the fluorine treatment contains (NH 4 ) 3 AlF 6 as the coating portion, the heating step may be performed after the above step. The lower limit of the heating temperature in the heating step is preferably 220°C or higher, and more preferably 250°C or higher. On the other hand, the upper limit of the heating temperature is preferably 500°C or less, more preferably 450°C or less, and even more preferably 400°C or less. By setting the heating temperature to 220° C. or higher, (NH 4 ) 3 AlF 6 can be converted into AlF 3 by the following reaction formula (1). (NH 4 ) 3 AlF 6 →AlF 3 +3NH 3 +3HF・・・(1) On the other hand, by setting the heating temperature below 500°C, the crystalline structure of the phosphor can be maintained well and the luminous intensity can be improved. The lower limit of the heating time is preferably more than 1 hour, more preferably more than 1.5 hours, and more preferably more than 2 hours. On the other hand, the upper limit of the heating time is preferably 6 hours or less, more preferably 5.5 hours or less, and more preferably 5 hours or less. By keeping the heating time within the above range, (NH 4 ) 3 AlF 6 can be more reliably converted into AlF 3 with higher moisture resistance. In addition, the heating step should preferably be carried out in the atmosphere or under a nitrogen atmosphere. Thereby, the substance itself that heats the ambient gas can produce the target substance without hindering the above-mentioned reaction formula (1).

藉由以上說明之表面被覆螢光體粒子之製造方法,可製造出耐濕性提升,且可更長時間維持發光強度之氮化物螢光體粒子。According to the above-described method for producing surface-coated phosphor particles, it is possible to produce nitride phosphor particles that have improved moisture resistance and can maintain luminous intensity for a longer period of time.

(發光裝置) 實施形態之發光裝置具有上述實施形態之表面被覆螢光體粒子及發光元件。 就發光元件而言,可單獨使用紫外LED、藍色LED、螢光燈或將它們組合使用。期望發光元件係可發出250nm以上且550nm以下波長之光,其中宜為420nm以上且500nm以下之藍色LED發光元件較理想。(Light-emitting device) The light-emitting device of the embodiment has the surface-coated phosphor particles and the light-emitting element of the above-mentioned embodiment. As for the light-emitting element, ultraviolet LED, blue LED, fluorescent lamp can be used alone or in combination. It is desirable that the light-emitting element can emit light with a wavelength of 250 nm or more and 550 nm or less, and a blue LED light-emitting element of 420 nm or more and 500 nm or less is preferable.

就發光裝置使用之螢光體粒子而言,除了上述實施形態之表面被覆螢光體粒子以外,還可併用擁有其他發光色之螢光體粒子。就其他發光色之螢光體粒子而言,有藍色發光螢光體粒子、綠色發光螢光體粒子、黃色發光螢光體粒子、橙色發光螢光體粒子、紅色螢光體,可列舉例如:Ca3 Sc2 Si3 O12 :Ce、CaSc2 O4 :Ce、β-SiAlON:Eu、Y3 Al5 O12 :Ce、Tb3 Al5 O12 :Ce、(Sr、Ca、Ba)2 SiO4 :Eu、La3 Si6 N11 :Ce、α-SiAlON:Eu、Sr2 Si5 N8 :Eu等。上述可和實施形態之表面被覆螢光體粒子併用之螢光體粒子無特別限制,可因應發光裝置須求的亮度或演色性等而適當地進行選擇。藉由將上述實施形態之表面被覆螢光體粒子和其他發光色之螢光體粒子混合,可實現日光白或燈泡色等各種色溫之白色。 就發光裝置而言,有照明裝置、背光裝置、圖像顯示裝置及訊號裝置。Regarding the phosphor particles used in the light-emitting device, in addition to the surface-coated phosphor particles of the above-mentioned embodiment, phosphor particles having other luminous colors can also be used in combination. For phosphor particles of other luminescent colors, there are blue luminescent phosphor particles, green luminescent phosphor particles, yellow luminescent phosphor particles, orange luminescent phosphor particles, and red phosphor, for example : Ca 3 Sc 2 Si 3 O 12 : Ce, CaSc 2 O 4 : Ce, β-SiAlON: Eu, Y 3 Al 5 O 12 : Ce, Tb 3 Al 5 O 12 : Ce, (Sr, Ca, Ba) 2 SiO 4 : Eu, La 3 Si 6 N 11 : Ce, α-SiAlON: Eu, Sr 2 Si 5 N 8 : Eu, etc. The above-mentioned phosphor particles that can be used in combination with the surface-coated phosphor particles of the embodiment are not particularly limited, and can be appropriately selected in accordance with the brightness or color rendering required by the light-emitting device. By mixing the surface-coated phosphor particles of the above-mentioned embodiment with phosphor particles of other luminous colors, white of various color temperatures such as daylight white or bulb color can be realized. As far as light-emitting devices are concerned, there are lighting devices, backlight devices, image display devices, and signal devices.

本實施形態之發光裝置,藉由採用上述實施形態之表面被覆螢光體粒子,可實現高光強度同時可提高可靠性。In the light-emitting device of this embodiment, by using the phosphor particles coated on the surface of the above-mentioned embodiment, high light intensity can be achieved and reliability can be improved.

以上,以就本發明的實施形態進行描述,但這些僅為本發明的範例,亦可採用上述以外的各種構成。 [實施例]Above, the embodiments of the present invention have been described, but these are only examples of the present invention, and various configurations other than the above can be adopted. [Example]

以下,藉由實施例及比較例就本發明進行說明,但本發明並不限於此。Hereinafter, the present invention will be described with examples and comparative examples, but the present invention is not limited to these.

(實施例1) 為具有M1 a M2 b M3 c Al3 N4-d Od 表示之組成之螢光體,為了得到符合M1 =Sr,M2 =Li,M3 =Eu者,係將Sr3 N2 (Taiheiyo Cement Corporation製)、Li3 N(Materion Corporation製)、AlN(Tokuyama Corporation製)、Eu2 O3 (信越化學工業股份有限公司製)作為各原料使用,作為助焊劑係使用LiF(和光純藥股份有限公司製)。在令Al之莫耳比為3時之Sr之投入量為莫耳比之1.15且Eu之投入量為莫耳比之0.0115。相對於前述原料混合物與助焊劑之合計量100質量%係添加5質量%之LiF。又,係以如前述令Al之莫耳比為3時之投入量為莫耳比之0.0115之方式將Eu投入。 以下,針對實施例1之表面被覆螢光體粒子之製造方法具體地記載。 在大氣中將AlN、Eu2 O3 及LiF稱量並混合,再以網目150μm之尼龍篩將凝集團解碎,得到預混合物。 將前述預混合物移動到維持在水分1ppm以下、氧1ppm以下之惰性環境氣體之手套箱中。之後,以化學計量比(a=1、b=1)中a值超過15%且b值超過20%之方式將前述Sr3 N2 及Li3 N稱量後,追加摻合而混合後,再以網目150μm之尼龍篩將凝集團解碎而得到螢光體之原料混合物。由於Sr及Li在煅燒中容易分散,故摻合了比理論值還多的量。 然後,將前述原料混合物填充至附蓋之圓筒型BN製容器(電化股份有限公司製)。 然後,將填充了螢光體之原料混合物之前述容器從手套箱中取出後,放入附具備石墨隔熱材之碳加熱器之電氣爐(富士電波工業股份有限公司製),實施煅燒步驟。 在煅燒步驟開始時,先暫時將電氣爐內進行脫氣至真空狀態,在室溫至0.8MPa・G之加壓氮環境氣體下開始進行煅燒。電氣爐內之溫度到達1100℃後,維持溫度繼續煅燒8小時,之後冷卻至室溫。將得到的煅燒物利用研缽進行粉碎後,以網目75μm之尼龍篩進行分類並回收。 作為酸處理步驟係對於MeOH(99%)(國產化學股份有限公司製)添加了HNO3 (60%)(和光純藥股份有限公司製)之混合溶液中加入煅燒物之粉體並攪拌3小時後,進行分離而得到螢光體粉末。 將得到的螢光體粉末添加至30%氫氟酸水溶液中,藉由攪拌15分鐘而實施氟處理步驟。氟處理步驟之後,利用MeOH進行傾析使溶液洗淨至中性為止,在過濾而進行固液分離後,乾燥固體成分並使其全部通過網目45μm之篩而解開凝集團,進而得到實施例1之表面被覆螢光體粒子。(Example 1) It is a phosphor with a composition represented by M 1 a M 2 b M 3 c Al 3 N 4-d O d , in order to obtain one that conforms to M 1 =Sr, M 2 =Li, and M 3 =Eu , Sr 3 N 2 (manufactured by Taiheiyo Cement Corporation), Li 3 N (manufactured by Materion Corporation), AlN (manufactured by Tokuyama Corporation), and Eu 2 O 3 (manufactured by Shin-Etsu Chemical Co., Ltd.) are used as raw materials as auxiliary materials. The flux is LiF (manufactured by Wako Pure Chemical Industries, Ltd.). When the molar ratio of Al is set to 3, the input amount of Sr is 1.15 of the molar ratio and the input amount of Eu is 0.0115 of the molar ratio. With respect to 100% by mass of the total amount of the aforementioned raw material mixture and flux, 5% by mass of LiF is added. In addition, Eu was injected in such a way that the injection amount when the molar ratio of Al was 3 as described above was 0.0115 of the molar ratio. Hereinafter, the manufacturing method of the surface-coated phosphor particles of Example 1 will be specifically described. AlN, Eu 2 O 3 and LiF are weighed and mixed in the air, and then the agglomerates are broken with a nylon sieve with a mesh of 150 μm to obtain a premix. Move the aforementioned premix to a glove box maintained at an inert atmosphere with moisture below 1 ppm and oxygen below 1 ppm. After that, after weighing the aforementioned Sr 3 N 2 and Li 3 N so that the value of a exceeds 15% and the value of b exceeds 20% in the stoichiometric ratio (a=1, b=1), they are additionally blended and mixed, Then, the agglomerated group is broken with a nylon sieve with a mesh of 150 μm to obtain a raw material mixture of the phosphor. Since Sr and Li are easily dispersed during calcination, they are blended in an amount larger than the theoretical value. Then, the aforementioned raw material mixture was filled into a cylindrical BN container with a lid (manufactured by Denka Co., Ltd.). Then, the container filled with the raw material mixture of the phosphor was taken out of the glove box, and placed in an electric furnace (manufactured by Fuji Denpa Co., Ltd.) with a carbon heater equipped with a graphite heat insulating material, and a calcination step was performed. At the beginning of the calcination step, the electric furnace is temporarily degassed to a vacuum state, and the calcination is started under a pressurized nitrogen atmosphere at room temperature to 0.8MPa・G. After the temperature in the electric furnace reaches 1100°C, maintain the temperature and continue calcination for 8 hours, and then cool to room temperature. After pulverizing the obtained calcined product with a mortar, it was sorted and recovered by a nylon sieve with a mesh of 75 μm. As an acid treatment step, MeOH (99%) (manufactured by Domestic Chemical Co., Ltd.) added HNO 3 (60%) (manufactured by Wako Pure Chemical Industries, Ltd.) into a mixed solution with calcined powder and stirred for 3 hours After that, separation is performed to obtain phosphor powder. The obtained phosphor powder was added to a 30% hydrofluoric acid aqueous solution, and a fluorine treatment step was performed by stirring for 15 minutes. After the fluorine treatment step, decantation with MeOH was used to wash the solution until it became neutral, and after filtration for solid-liquid separation, the solid content was dried and all passed through a 45 μm sieve to untie the condensed clusters, thereby obtaining an example The surface of 1 is coated with phosphor particles.

(實施例2) 施予氟處理後,對於全部通過網目45μm之篩而解開凝集團之螢光體粉末,在大氣環境氣體下實施250℃、4小時之加熱處理,除此之外,經與實施例1同樣的原料之投入量及程序而得到實施例2之表面被覆螢光體粒子。(Example 2) After fluorine treatment, all the phosphor powders that pass through a 45μm mesh to dissolve the condensed phosphor powder are subjected to a heat treatment at 250°C for 4 hours in an atmospheric atmosphere, except that it is the same as in Example 1 The input amount and procedure of the raw materials to obtain the surface-coated phosphor particles of Example 2.

(實施例3) 施予氟處理後,對於全部通過網目45μm之篩而解開凝集團之螢光體粉末,在大氣環境氣體下實施300℃、4小時之加熱處理,除此之外,經與實施例1同樣的原料之投入量及程序而得到實施例3之表面被覆螢光體粒子。(Example 3) After fluorine treatment, all the phosphor powders that pass through a 45μm mesh to unwrap the condensed phosphor powder are subjected to a heat treatment at 300°C for 4 hours under atmospheric atmosphere, except that it is the same as in Example 1 The input amount and procedure of the raw materials to obtain the surface-coated phosphor particles of Example 3.

(實施例4) 施予氟處理後,對於全部通過網目45μm之篩而解開凝集團之螢光體粉末,在大氣環境氣體下實施350℃、4小時之加熱處理,除此之外,經與實施例1同樣的原料之投入量及程序而得到實施例4之表面被覆螢光體粒子。(Example 4) After fluorine treatment, all the phosphor powders that passed through a 45μm mesh to unwrap the condensed phosphor powder were subjected to a heating treatment at 350°C for 4 hours under atmospheric atmosphere, except that the same procedure as in Example 1 was carried out. The input amount and procedure of the raw materials to obtain the surface-coated phosphor particles of Example 4.

(實施例5) 施予氟處理後,對於全部通過網目45μm之篩而解開凝集團之螢光體粉末,在大氣環境氣體下實施400℃、4小時之加熱處理,除此之外,經與實施例1同樣的原料之投入量及程序而得到實施例5之表面被覆螢光體粒子。(Example 5) After fluorine treatment, all the phosphor powders that passed through a 45μm mesh to unwrap the condensed phosphor powder were subjected to a heat treatment at 400°C for 4 hours under atmospheric atmosphere, except that it was the same as in Example 1. The input amount and procedure of the raw materials to obtain the surface-coated phosphor particles of Example 5.

(比較例1) 未實施氟處理,除此之外,經與實施例1同樣的原料之投入量及程序而得到比較例1之螢光體粒子。(Comparative example 1) Except that the fluorine treatment was not performed, the phosphor particles of Comparative Example 1 were obtained through the same raw material input amount and procedure as in Example 1.

(比較例2) 氟處理係使用10%氫氟酸水溶液,除此之外,經與實施例1同樣的原料之投入量及程序而得到比較例2之螢光體粒子。(Comparative example 2) A 10% hydrofluoric acid aqueous solution was used for the fluorine treatment. The phosphor particles of Comparative Example 2 were obtained through the same raw material input amount and procedure as in Example 1 except that the 10% hydrofluoric acid aqueous solution was used.

(比較例3) 氟處理係使用20%氫氟酸水溶液,除此之外,經與實施例1同樣的原料之投入量及程序而得到比較例3之螢光體粒子。(Comparative example 3) A 20% hydrofluoric acid aqueous solution was used for the fluorine treatment. The phosphor particles of Comparative Example 3 were obtained through the same raw material input amount and procedure as in Example 1 except that the 20% hydrofluoric acid aqueous solution was used.

針對各實施例之表面被覆螢光體粒子及各比較例之螢光體粒子,求出將全部結晶相合計之化學組成(亦即,通式:M1 a M2 b M3 c Al3 N4-d Od )之各元素的下標a~d。 上述下標a~d的求出係對於得到的螢光體粒子利用下列之方法進行分析而求得。亦即,針對Sr、Li、Al及Eu係利用ICP發光分光分析裝置(SPECTRO股份有限公司製,CIROS-120),針對O及N係利用氧氮分析計(堀場製作所股份有限公司製,EMGA-920)之分析結果而算出。關於實施例及比較例之螢光體之a~d之數值如表1所示。For the surface-coated phosphor particles of each example and the phosphor particles of each comparative example, the chemical composition (that is, the general formula: M 1 a M 2 b M 3 c Al 3 N The subscripts a~d of each element of 4-d O d ). The above subscripts a to d are obtained by analyzing the obtained phosphor particles by the following method. That is, an ICP emission spectrophotometer (manufactured by SPECTRO Co., Ltd., CIROS-120) is used for Sr, Li, Al, and Eu systems, and an oxygen and nitrogen analyzer (manufactured by Horiba Manufacturing Co., Ltd., EMGA- 920) based on the analysis results. The numerical values of a to d of the phosphors of the Examples and Comparative Examples are shown in Table 1.

(利用X射線繞射法進行分析) 針對各實施例之表面被覆螢光體粒子及各比較例之螢光體粒子使用X射線繞射裝置(Rigaku Corporation製UltimaIV),藉由使用了CuKα線之粉末X射線繞射圖案而確認到其結晶結構。針對實施例1,2θ在16.5°以上且17.5°以下之範圍確認到對應(NH4 )3 AlF6 之峰部。針對實施例2~5,2θ在14°以上且15°以下之範圍確認到對應AlF3 之峰部。另一方面,比較例1、2皆未觀察到對應(NH4 )3 AlF6 之峰部或對應AlF3 之峰部任一者。比較例3則未確認到對應AlF3 之峰部,但觀察到對應(NH4 )3 AlF6 之小峰部。(Analysis by X-ray diffraction method) For the surface-coated phosphor particles of each example and the phosphor particles of each comparative example, an X-ray diffraction device (UltimaIV manufactured by Rigaku Corporation) was used. The powder X-ray diffraction pattern confirmed its crystal structure. With respect to Example 1, the peak portion corresponding to (NH 4 ) 3 AlF 6 was confirmed in the range of 2θ above 16.5° and below 17.5°. For Examples 2 to 5, the peaks corresponding to AlF 3 were confirmed in the range of 2θ above 14° and below 15°. On the other hand, in Comparative Examples 1 and 2, neither the peak corresponding to (NH 4 ) 3 AlF 6 nor the peak corresponding to AlF 3 was observed. In Comparative Example 3, no peak corresponding to AlF 3 was confirmed, but a small peak corresponding to (NH 4 ) 3 AlF 6 was observed.

(利用XPS進行表面分析) 針對各實施例之表面被覆螢光體粒子及各比較例之螢光體粒子,實施利用XPS的表面分析。針對各實施例之表面被覆螢光體粒子係在螢光體粒子之最表面確認到Al及F存在且Al和F共價鍵結。另一方面,比較例1、2未確認到Al和F共價鍵結,比較例3則雖然微弱但確認到Al和F共價鍵結。 從利用XPS得到的表面分析結果及利用X射線繞射法的分析,可確認實施例1之表面被覆螢光體粒子係在螢光體粒子之最表面之至少一部份為(NH4 )3 AlF6 構成,實施例2~5之表面被覆螢光體粒子係在螢光體粒子之最表面之至少一部份為AlF3 構成。 此外,可認為比較例1、2在螢光體粒子之最表面無存在(NH4 )3 AlF6 及AlF3 ,比較例3則無存在AlF3 而有些許(NH4 )3 AlF6 存在。(Surface analysis using XPS) For the surface-coated phosphor particles of each example and the phosphor particles of each comparative example, surface analysis using XPS was performed. For the surface-coated phosphor particles of each example, it was confirmed that Al and F existed and Al and F were covalently bonded on the outermost surface of the phosphor particles. On the other hand, in Comparative Examples 1 and 2, Al and F were not confirmed to be covalently bonded, and in Comparative Example 3, although it was weak, Al and F were confirmed to be covalently bonded. From the surface analysis results obtained by XPS and the analysis by X-ray diffraction method, it can be confirmed that the surface-coated phosphor particles of Example 1 are at least part of the outermost surface of the phosphor particles as (NH 4 ) 3 The surface-coated phosphor particles of Examples 2 to 5 are made of AlF 6 and at least a part of the outermost surface of the phosphor particles is made of AlF 3 . In addition, it can be considered that Comparative Examples 1 and 2 do not have (NH 4 ) 3 AlF 6 and AlF 3 on the outermost surface of the phosphor particles, and Comparative Example 3 does not have AlF 3 but slightly (NH 4 ) 3 AlF 6 exists.

(氟元素之含有率) 各實施例中之氟元素相對於表面被覆螢光體粒子整體之含有率及各比較例中之氟元素相對於螢光體粒子整體之含有率,係從利用試樣燃燒裝置(三菱化學分析技術股份有限公司製,AQF-2100H)及離子層析(Nippon Dionex K.K.股份有限公司製,ICS1500)得到的分析結果而算出。(Content rate of fluorine element) The content rate of the fluorine element relative to the entire surface-coated phosphor particles in each example and the content rate of the fluorine element relative to the entire phosphor particle in each comparative example are based on the use of a sample combustion device (Mitsubishi Chemical Analysis Technology Co., Ltd. product, AQF-2100H) and ion chromatography (Nippon Dionex KK Co., Ltd. product, ICS1500) were calculated based on the analysis results.

(擴散反射率) 擴散反射率係利用將積分球裝置(ISV-469)安裝至日本分光股份有限公司製紫外可見分光光度計(V-550)而測定。使用標準反射板(spectralon)進行基線校正,並安裝填充有各實施例之表面被覆螢光體粒子或各比較例之螢光體粒子之固體試樣固定架,實施對於波長300nm之光進行擴散反射率、及對於峰部波長之光之擴散反射率之測定。(Diffuse reflectance) The diffuse reflectance was measured by attaching an integrating sphere device (ISV-469) to an ultraviolet-visible spectrophotometer (V-550) manufactured by JASCO Corporation. Use a standard reflector (spectralon) for baseline calibration, and install a solid sample holder filled with surface-coated phosphor particles of each embodiment or phosphor particles of each comparative example, and implement diffuse reflection of light with a wavelength of 300nm Measurement of the diffuse reflectance of light at the peak wavelength.

(發光特性) 色度x係利用分光光度計(大塚電子股份有限公司製MCPD-7000)進行測定,並利用下列程序而算出。 將各實施例之表面被覆螢光體粒子或各比較例之螢光體粒子以使凹型光析管之表面平滑之方式進行填充,安裝上積分球。利用光纖將從發光光源(Xe 燈)分光出455nm波長之藍色單色光導入至此積分球。將此單色光作為激發光源,照射螢光體之試樣,進行試樣之螢光光譜測定。 從得到的光譜資料求出峰部波長及峰部之半值寬。 此外,色度x係從螢光光譜資訊之465nm至780nm之範圍之波長域資訊依據JIS Z 8724:2015,算出JIS Z 8781-3:2016規定之XYZ色彩系統中CIE色度座標x值(色度x)。(Luminous characteristics) The chromaticity x is measured by a spectrophotometer (MCPD-7000 manufactured by Otsuka Electronics Co., Ltd.), and calculated by the following program. The surface-coated phosphor particles of each example or the phosphor particles of each comparative example were filled in such a way that the surface of the concave light analysis tube was smooth, and an integrating sphere was installed. Use optical fiber to split blue monochromatic light with a wavelength of 455nm from the light source (Xe lamp) into this integrating sphere. Use this monochromatic light as the excitation light source to irradiate the sample of the phosphor to perform the fluorescence spectrum measurement of the sample. Calculate the peak wavelength and the half-value width of the peak from the obtained spectral data. In addition, the chromaticity x is based on the wavelength domain information in the range of 465nm to 780nm of the fluorescence spectrum information according to JIS Z 8724:2015, and the CIE chromaticity coordinate x value (color) in the XYZ color system specified in JIS Z 8781-3:2016 is calculated. Degree x).

(高溫高濕試驗前後之發光強度比) 針對各實施例之表面被覆螢光體粒子及各比較例之螢光體粒子,測定高溫高濕試驗開始前之發光強度I0 。然後,使用恆溫恆濕器(大和科學股份有限公司製,IW-222),測定載置在60℃、90%RH之環境經50小時之高溫高濕試驗後之發光強度I1 。從得到的測定值算出發光強度比I1 /I0 (%)。 此外,測定載置在60℃、90%RH之環境經100小時之高溫高濕試驗後之發光強度I2 。從得到的測定值算出發光強度比I2 /I0 (%)。 關於發光強度比I1 /I0 、I2 /I0 得到的結果如表1所示。 又,發光強度之測定,係使用經玫瑰紅B及次標準光源進行校正的分光螢光光度計(日立先端科技股份有限公司製,F-7000)進行測定。亦即,使用附屬在光度計之固體試樣固定架,測定激發波長455nm之螢光光譜。 各實施例之表面被覆螢光體粒子及比較例3之螢光體粒子之螢光光譜之峰部波長為656nm。此外,比較例1、2之螢光體粒子之螢光光譜之峰部波長為657nm。將於螢光光譜之峰部波長的強度值作為表面被覆螢光體粒子或螢光體粒子之發光強度。(Luminous intensity ratio before and after the high-temperature and high-humidity test) For the surface-coated phosphor particles of each example and the phosphor particles of each comparative example, the luminous intensity I 0 before the start of the high-temperature and high-humidity test was measured. Then, using a thermohygrostat (manufactured by Daiwa Scientific Co., Ltd., IW-222), the luminous intensity I 1 after 50 hours of high temperature and high humidity test placed in an environment of 60° C. and 90% RH was measured. The emission intensity ratio I 1 /I 0 (%) was calculated from the obtained measurement value. In addition, the luminous intensity I 2 after 100 hours of high temperature and high humidity test placed in an environment of 60°C and 90% RH was measured. The emission intensity ratio I 2 /I 0 (%) was calculated from the obtained measurement value. Table 1 shows the results obtained regarding the luminous intensity ratios I 1 /I 0 and I 2 /I 0. In addition, the measurement of the luminous intensity was performed using a spectrofluorometer (manufactured by Hitachi Advanced Technology Co., Ltd., F-7000) calibrated with Rose Bengal B and a substandard light source. That is, a solid sample holder attached to the photometer was used to measure the fluorescence spectrum with an excitation wavelength of 455 nm. The peak wavelength of the fluorescence spectrum of the surface-coated phosphor particles of each example and the phosphor particles of Comparative Example 3 is 656 nm. In addition, the peak wavelength of the fluorescence spectrum of the phosphor particles of Comparative Examples 1 and 2 was 657 nm. The intensity value of the peak wavelength of the fluorescence spectrum is used as the luminous intensity of the surface-coated phosphor particles or phosphor particles.

[表1]   實施例1 實施例2 實施例3 實施例4 實施例5 比較例1 比較例2 比較例3 投入之Sr比例(※1) 1.15 1.15 1.15 1.15 1.15 1.15 1.15 1.15 螢光體粒子組成(通式之下標) 及d/(a+d)之值 a 1.02 1.02 1.00 1.01 1.01 0.96 0.94 0.95 b 0.99 0.98 0.97 0.96 0.97 0.95 0.97 0.97 c 0.009 0.008 0.008 0.008 0.008 0.008 0.008 0.008 d 0.34 0.08 0.07 0.11 0.15 0.36 0.14 0.21 d/(a+d) 0.25 0.07 0.07 0.10 0.13 0.27 0.13 0.18 氫氟酸處理 30%氫氟酸水溶液 30%氫氟酸水溶液 30%氫氟酸水溶液 30%氫氟酸水溶液 30%氫氟酸水溶液 10%氫氟酸水溶液 20%氫氟酸水溶液 加熱溫度(℃) 無加熱處理 250 300 350 400 無加熱處理 無加熱處理 無加熱處理 利用X射線繞射之分析 (NH4 )3 AlF6 AlF3 AlF3 AlF3 AlF3 (NH4 )3 AlF6 氟元素含有率 (質量%) 23.1 21.3 22.6 22.2 20.8 0.14 8.7 13.6 擴散反射率(%) 300nm 76 75 73 68 69 75 73 74 峰部波長 93 93 89 88 86 92 93 93 峰部波長(nm) 656 656 656 656 656 657 657 656 半值寬(nm) 56 56 55 55 54 57 56 56 CIE x值 0.711 0.711 0.709 0.711 0.709 0.710 0.711 0.710 高溫高濕試驗50小時後之發光強度比I1 /I0 (%) 91 98 100 94 89 25 26 19 高溫高濕試驗100小時後之發光強度比I2 /I0 (%) 46 97 99 94 85 23 23 13 ※1 令Al之莫耳比為3時之Sr莫耳比[Table 1] Example 1 Example 2 Example 3 Example 4 Example 5 Comparative example 1 Comparative example 2 Comparative example 3 Sr ratio invested (※1) 1.15 1.15 1.15 1.15 1.15 1.15 1.15 1.15 Phosphor particle composition (subscript of general formula) and value of d/(a+d) a 1.02 1.02 1.00 1.01 1.01 0.96 0.94 0.95 b 0.99 0.98 0.97 0.96 0.97 0.95 0.97 0.97 c 0.009 0.008 0.008 0.008 0.008 0.008 0.008 0.008 d 0.34 0.08 0.07 0.11 0.15 0.36 0.14 0.21 d/(a+d) 0.25 0.07 0.07 0.10 0.13 0.27 0.13 0.18 Hydrofluoric acid treatment 30% hydrofluoric acid aqueous solution 30% hydrofluoric acid aqueous solution 30% hydrofluoric acid aqueous solution 30% hydrofluoric acid aqueous solution 30% hydrofluoric acid aqueous solution no 10% hydrofluoric acid aqueous solution 20% hydrofluoric acid aqueous solution Heating temperature (℃) No heat treatment 250 300 350 400 No heat treatment No heat treatment No heat treatment Analysis using X-ray diffraction (NH 4 ) 3 AlF 6 AlF 3 AlF 3 AlF 3 AlF 3 no no (NH 4 ) 3 AlF 6 Fluorine element content rate (mass%) 23.1 21.3 22.6 22.2 20.8 0.14 8.7 13.6 Diffuse reflectance (%) 300nm 76 75 73 68 69 75 73 74 Peak wavelength 93 93 89 88 86 92 93 93 Peak wavelength (nm) 656 656 656 656 656 657 657 656 Half width (nm) 56 56 55 55 54 57 56 56 CIE x value 0.711 0.711 0.709 0.711 0.709 0.710 0.711 0.710 Luminous intensity ratio after 50 hours of high temperature and high humidity test I 1 /I 0 (%) 91 98 100 94 89 25 26 19 Luminous intensity ratio after 100 hours of high temperature and high humidity test I 2 /I 0 (%) 46 97 99 94 85 twenty three twenty three 13 ※1 Let the molar ratio of Al be the molar ratio of Sr at 3

如表1所示,螢光體粒子之最表面之至少一部分由包含了含有氟元素及鋁元素之含氟化合物之被覆部構成的實施例1~5,經50小時之高溫高濕試驗後之發光強度的降低受到顯著的抑制,與比較例1~3相比,可確認到發光強度比I1 /I0 大幅地提高,耐濕性優異。此外,實施例2~4可確認到在經100小時之高溫高濕試驗後之發光強度比I2 /I0 ,相較於經50小時之高溫高濕試驗後之發光強度比I1 /I0 後幾乎未有降低,耐濕性尤其優異。 又,比較例3因(NH4 )3 AlF6 之產量不充分,故認為無法得到充分之耐濕。As shown in Table 1, at least a part of the outermost surface of the phosphor particles is composed of a coating part of a fluorine-containing compound containing fluorine and aluminum. The results are obtained after 50 hours of high temperature and high humidity test The decrease in luminous intensity was significantly suppressed, and compared with Comparative Examples 1 to 3, it was confirmed that the luminous intensity ratio I 1 /I 0 was greatly improved, and it was confirmed that the moisture resistance was excellent. In addition, in Examples 2 to 4, it can be confirmed that the luminous intensity ratio I 2 /I 0 after the 100-hour high-temperature and high-humidity test is compared to the luminous intensity ratio I 1 /I after the 50-hour high-temperature and high-humidity test. There is almost no decrease after 0 , and the moisture resistance is especially excellent. In addition, in Comparative Example 3, because the yield of (NH 4 ) 3 AlF 6 was insufficient, it was considered that sufficient moisture resistance could not be obtained.

本申請案係主張以在2019年4月9日申請之日本申請案特願2019-074459號為基礎之優先權,其完整內容係全部納入本發明。This application claims priority based on Japanese application Japanese Patent Application No. 2019-074459 filed on April 9, 2019, and its entire content is incorporated into the present invention in its entirety.

no

Claims (11)

一種表面被覆螢光體粒子,包含: 含螢光體之粒子、以及 被覆該粒子表面之被覆部; 該螢光體具有通式M1 a M2 b M3 c Al3 N4-d Od 表示之組成,惟M1 係選自於Sr、Mg、Ca及Ba中之1種以上之元素,M2 係選自於Li、及Na中之1種以上之元素,M3 係選自於Eu及Ce中之1種以上之元素,該a、b、c、及d符合下列各式; 0.850≦a≦1.150 0.850≦b≦1.150 0.001≦c≦0.015 0≦d≦0.40 0≦d/(a+d)<0.30 該被覆部構成該粒子之最表面之至少一部分,且包含了含有氟元素及鋁元素之含氟化合物, 相對於該表面被覆螢光體粒子整體,氟元素之含有率為15質量%以上且30質量%以下。A surface-coated phosphor particle, comprising: a particle containing a phosphor and a coating part covering the surface of the particle; the phosphor has the general formula M 1 a M 2 b M 3 c Al 3 N 4-d O d Represents the composition, but M 1 is selected from more than one element of Sr, Mg, Ca and Ba, M 2 is selected from more than one element of Li and Na, and M 3 is selected from One or more elements of Eu and Ce, the a, b, c, and d meet the following formulas: 0.850≦a≦1.150 0.850≦b≦1.150 0.001≦c≦0.015 0≦d≦0.40 0≦d/( a+d)<0.30 The coating constitutes at least a part of the outermost surface of the particle, and contains a fluorine-containing compound containing fluorine and aluminum. The content of fluorine is relative to the entire surface-coated phosphor particle 15% by mass or more and 30% by mass or less. 如請求項1之表面被覆螢光體粒子,其中,該含氟化合物中,氟元素和鋁元素直接共價鍵結。The surface-coated phosphor particles of claim 1, wherein in the fluorine-containing compound, the fluorine element and the aluminum element are directly covalently bonded. 如請求項1或2之表面被覆螢光體粒子,其中,該含氟化合物含有(NH4 )3 AlF6 或AlF3 中任一者或兩者。The surface-coated phosphor particles of claim 1 or 2, wherein the fluorine-containing compound contains either or both of (NH 4 ) 3 AlF 6 or AlF 3. 如請求項1或2之表面被覆螢光體粒子,其中,該M1 至少包含Sr,該M2 至少包含Li,該M3 至少包含Eu。The surface-coated phosphor particle of claim 1 or 2, wherein the M 1 contains at least Sr, the M 2 contains at least Li, and the M 3 contains at least Eu. 如請求項1或2之表面被覆螢光體粒子,其中,相對於波長300nm的光照射之擴散反射率為56%以上,相對於螢光光譜之峰部波長的光照射之擴散反射率為85%以上。The surface-coated phosphor particles of claim 1 or 2, wherein the diffuse reflectance relative to light irradiation with a wavelength of 300 nm is 56% or more, and the diffuse reflectance relative to light irradiation with the peak wavelength of the fluorescence spectrum is 85 %the above. 如請求項1或2之表面被覆螢光體粒子,其中,以波長455nm之藍光進行激發時,峰部波長落在640nm以上且670nm以下之範圍內,半值寬為45nm以上且60nm以下。For example, the surface-coated phosphor particles of claim 1 or 2, wherein when excited by blue light with a wavelength of 455 nm, the peak wavelength falls within the range of 640 nm or more and 670 nm or less, and the half-value width is 45 nm or more and 60 nm or less. 如請求項1或2之表面被覆螢光體粒子,其中,以波長455nm之藍光進行激發時,發光色之色純度在CIE-xy色度圖中,x值符合0.680≦x<0.735。For example, the surface-coated phosphor particles of claim 1 or 2, wherein when excited by blue light with a wavelength of 455nm, the color purity of the luminescent color is in the CIE-xy chromaticity diagram, and the value of x meets 0.680≦x<0.735. 一種表面被覆螢光體粒子之製造方法,係如請求項1至7中任一項之表面被覆螢光體粒子之製造方法,包括下列步驟: 混合步驟,將原料予以混合; 煅燒步驟,將由該混合步驟得到的混合體予以煅燒; 酸處理步驟,將由該煅燒步驟得到的煅燒物和酸性溶液予以混合;及 氟處理步驟,將經該酸處理步驟之該煅燒物和含有氟元素之化合物予以混合; 該混合步驟中,該Al之莫耳比設為3時之該M1 之投入量,按莫耳比計為1.10以上且1.20以下。A method for producing surface-coated phosphor particles is the method for producing surface-coated phosphor particles according to any one of claims 1 to 7, comprising the following steps: a mixing step, mixing raw materials; a calcination step, The mixture obtained in the mixing step is calcined; the acid treatment step is to mix the calcined product obtained from the calcining step and the acid solution; and the fluorine treatment step is to mix the calcined product and the fluorine element-containing compound after the acid treatment step In the mixing step, the input amount of M 1 when the molar ratio of Al is set to 3 is 1.10 or more and 1.20 or less in terms of molar ratio. 如請求項8之表面被覆螢光體粒子之製造方法,其中,該酸處理步驟中,該酸性溶液使用氟濃度為25%以上之氫氟酸水溶液。The method for producing surface-coated phosphor particles according to claim 8, wherein, in the acid treatment step, the acidic solution uses a hydrofluoric acid aqueous solution with a fluorine concentration of 25% or more. 如請求項8之表面被覆螢光體粒子之製造方法,其中,更具備加熱步驟,對於由該氟處理步驟得得到的結果物施予加熱處理。The method for producing surface-coated phosphor particles according to claim 8, which further includes a heating step, and heat treatment is applied to the result obtained by the fluorine treatment step. 一種發光裝置,具有:如請求項1至7中任一項之表面被覆螢光體粒子、及發光元件。A light-emitting device having: the surface-coated phosphor particles according to any one of claims 1 to 7, and a light-emitting element.
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