TW202102706A - Crucible and vapor deposition apparatus - Google Patents
Crucible and vapor deposition apparatus Download PDFInfo
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Description
本發明是有關於一種坩堝與蒸鍍機台。The invention relates to a crucible and an evaporation machine.
坩堝作為一種容器,主要應用於灼燒固體物質,能夠應用於材料的蒸發、濃縮或結晶,例如蒸鍍製程。在蒸鍍製程作業時,產線人員會先將坩堝放置在機台內的無氧銅座內,再添加蒸鍍材料至坩堝內。接著繼續做後續的製程作業,將晶圓放置在鍍鍋上,然後關上腔門,執行蒸鍍製程。待製程結束後,產線人員先將產品取出,接著再次添加所需蒸鍍材料至坩堝內,接著繼續重覆前述的蒸鍍製程作業模式生產。As a kind of container, the crucible is mainly used for burning solid materials, and can be used for the evaporation, concentration or crystallization of materials, such as the evaporation process. During the evaporation process, the production line staff will first place the crucible in the oxygen-free copper seat in the machine, and then add the evaporation material to the crucible. Then continue to do the subsequent process operations, place the wafer on the plating pot, and then close the chamber door to perform the vapor deposition process. After the process is over, the production line personnel first take out the product, and then add the required vapor deposition materials to the crucible again, and then continue to repeat the aforementioned vapor deposition process operation mode production.
然而,由於坩堝係由產線人員置放在加熱容器,無法有效控制人為因素,容易造成坩堝放置不正確,造成坩堝的位置偏移,使得坩堝有一側貼至無氧銅座之壁面。當坩堝貼壁時,容易造成坩堝之貼壁端冷卻速度較快,即坩堝之未貼壁端與坩堝之貼壁端的加熱程度不同,導致無法均勻加熱。However, since the crucible is placed in the heating container by the production line personnel, human factors cannot be effectively controlled, which easily causes the crucible to be placed incorrectly, causing the position of the crucible to shift, and one side of the crucible is attached to the wall of the oxygen-free copper seat. When the crucible is attached to the wall, it is easy to cause the crucible's adhering end to cool faster, that is, the heating degree of the crucible's unattached end and the crucible's adhering end is different, resulting in the inability to uniformly heat.
再者,因坩堝之貼壁端冷卻速度較快,連帶導致製程中坩堝之貼壁端的功率使用,會大於坩堝之未貼壁端之功率,或者電源容易跳動不穩定,換言之,貼壁的坩堝造成無法在製程中達到穩定控制功率。Furthermore, because the crucible’s adhering end has a faster cooling rate, the power used on the adhering end of the crucible in the process will be greater than that of the unattached end of the crucible, or the power supply is prone to beating and unstable. In other words, the adhering crucible As a result, it is impossible to achieve stable control power during the manufacturing process.
此外,貼壁的坩堝也較容易損壞,不僅降低坩堝之使用壽命以外,損壞的坩堝需要立即更換,也會提高生產成本。In addition, the crucible attached to the wall is also more prone to damage, which not only reduces the service life of the crucible, but the damaged crucible needs to be replaced immediately, which will also increase the production cost.
因此,如何改良並能提供一種『坩堝與蒸鍍機台』來避免上述所遭遇到的問題,係業界所待解決之課題。Therefore, how to improve and provide a "crucible and evaporation machine" to avoid the above-mentioned problems is a problem to be solved in the industry.
本發明提供一種坩堝與蒸鍍機台,能使坩堝內的材料均勻受熱,並能穩定控制電源,提升坩堝使用壽命以及降低生產成本。The invention provides a crucible and an evaporation machine, which can uniformly heat the materials in the crucible, and can stably control the power supply, increase the service life of the crucible and reduce the production cost.
本發明之一實施例提出一種坩堝,包括一坩堝本體以及至少一凸出部。坩堝本體內具有一容置槽。凸出部設置於坩堝本體之外壁面,凸出部由坩堝本體之外壁面向外凸出延伸。An embodiment of the present invention provides a crucible including a crucible body and at least one protrusion. The crucible body has a containing groove. The protruding part is arranged on the outer wall surface of the crucible body, and the protruding part protrudes outward from the outer wall surface of the crucible body.
本發明之另一實施例提出一種蒸鍍機台,包括一金屬座體以及一坩堝。坩堝設置於金屬座體之內。坩堝包括一坩堝本體以及至少一凸出部。坩堝本體內具有一容置槽,容置槽用以添加一蒸鍍材料。凸出部設置於坩堝本體之外壁面,凸出部由坩堝本體之外壁面向外凸出延伸,且各凸出部抵接於金屬座體之內壁面。Another embodiment of the present invention provides a vapor deposition machine including a metal base and a crucible. The crucible is arranged in the metal base body. The crucible includes a crucible body and at least one protrusion. The crucible body has a accommodating groove, and the accommodating groove is used for adding an evaporation material. The protruding part is arranged on the outer wall surface of the crucible body, the protruding part protrudes and extends outward from the outer wall surface of the crucible body, and each protruding part abuts against the inner wall surface of the metal base body.
在本發明之一實施例中,上述外壁面為坩堝本體之一側壁,凸出部為由側壁向外延伸的一環型凸出結構。In an embodiment of the present invention, the outer wall surface is a side wall of the crucible body, and the protruding part is a ring-shaped protruding structure extending outward from the side wall.
在本發明之一實施例中,上述外壁面為坩堝本體之一底壁,凸出部為由底壁向外延伸的一環型凸出結構。In an embodiment of the present invention, the outer wall surface is a bottom wall of the crucible body, and the protruding portion is a ring-shaped protruding structure extending outward from the bottom wall.
在本發明之一實施例中,上述外壁面為坩堝本體之一側壁與一底壁,各凸出部包括一第一凸出部與一第二凸出部,第一凸出部為由側壁向外延伸的一第一環型凸出結構,第二凸出部為由底壁向外延伸的一第二環型凸出結構。In an embodiment of the present invention, the outer wall surface is a side wall and a bottom wall of the crucible body, each protruding portion includes a first protruding portion and a second protruding portion, the first protruding portion is formed by the side wall A first annular protruding structure extends outward, and the second protruding part is a second annular protruding structure extending outward from the bottom wall.
在本發明之一實施例中,上述外壁面為坩堝本體之一側壁,凸出部係沿著在側壁之周向方向排列。In an embodiment of the present invention, the outer wall surface is a side wall of the crucible body, and the protrusions are arranged along the circumferential direction of the side wall.
在本發明之一實施例中,上述外壁面為坩堝本體之一底壁,凸出部係沿著在底壁之周向方向排列。In an embodiment of the present invention, the outer wall surface is a bottom wall of the crucible body, and the protrusions are arranged along the circumferential direction of the bottom wall.
在本發明之一實施例中,上述外壁面為坩堝本體之一側壁與一底壁,凸出部包括一第一凸出部與一第二凸出部,第一凸出部係沿著在側壁之周向方向排列,第二凸出部係沿著在底壁之周向方向排列。In an embodiment of the present invention, the outer wall surface is a side wall and a bottom wall of the crucible body, the protruding part includes a first protruding part and a second protruding part, and the first protruding part is along the The side walls are arranged in the circumferential direction, and the second protrusions are arranged along the circumferential direction of the bottom wall.
在本發明之一實施例中,上述坩堝本體包括一填入端面、一底壁以及一側壁,容置槽連通填入端面,側壁連接於填入端面與底壁之間。In an embodiment of the present invention, the crucible body includes a filling end surface, a bottom wall and a side wall, the containing groove communicates with the filling end surface, and the side wall is connected between the filling end surface and the bottom wall.
在本發明之一實施例中,上述金屬座體為一銅座。In an embodiment of the present invention, the metal base body is a copper base.
基於上述,在本發明之坩堝與蒸鍍機台之中,在坩堝之外壁面設置凸出部,外壁面可為坩堝本體之側壁或底壁,如此一來,不管如何放置坩堝在金屬座體內,藉由凸出部抵接於金屬座體之內壁面,可使坩堝保持在金屬座體的中間位置,而不會偏移,也不會使得坩堝有一側貼至無氧銅座之壁面的情況,故可使坩堝在使用上,能使坩堝內的材料均勻受熱,並能穩定控制功率。Based on the above, in the crucible and vapor deposition machine of the present invention, a protrusion is provided on the outer wall of the crucible. The outer wall can be the side wall or the bottom wall of the crucible body. In this way, no matter how the crucible is placed in the metal base , By abutting the protruding part on the inner wall of the metal base, the crucible can be kept in the middle of the metal base without shifting, and it will not make one side of the crucible stick to the wall of the oxygen-free copper base Therefore, the crucible can be used, the materials in the crucible can be heated uniformly, and the power can be controlled stably.
為讓本發明能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the present invention more comprehensible, the following embodiments are specially cited and are described in detail below in conjunction with the accompanying drawings.
以下結合附圖和實施例,對本發明的具體實施方式作進一步描述。以下實施例僅用於更加清楚地說明本發明的技術方案,而不能以此限制本發明的保護範圍。The specific implementation of the present invention will be further described below in conjunction with the accompanying drawings and embodiments. The following embodiments are only used to illustrate the technical solutions of the present invention more clearly, and cannot be used to limit the protection scope of the present invention.
需說明的是,在各個實施例的說明中,所謂的「第一」及「第二」係用以描述不同位置的元件,這些元件並不因為此類用辭而受到限制。此外,為了說明上的便利和明確,圖式中各元件的厚度或尺寸,係以誇張或省略或概略的方式表示,且各元件的尺寸並未完全為其實際的尺寸。It should be noted that in the description of each embodiment, the so-called "first" and "second" are used to describe elements at different positions, and these elements are not limited by such terms. In addition, for convenience and clarity of description, the thickness or size of each element in the drawings is expressed in an exaggerated or omitted or schematic manner, and the size of each element is not entirely its actual size.
圖1為本發明之坩堝一實施例的示意圖。請參閱圖1,本實施例之坩堝係用於蒸鍍製程。坩堝包括一坩堝本體1以及至少一凸出部20,其中坩堝本體1包括一填入端面11、一底壁12以及一側壁13。坩堝本體11本身為呈柱狀的容器,坩堝本體11內具有一容置槽14,容置槽14連通填入端面11,側壁13連接於填入端面11與底壁12之間。Fig. 1 is a schematic diagram of an embodiment of the crucible of the present invention. Please refer to FIG. 1, the crucible of this embodiment is used for the evaporation process. The crucible includes a
在本實施例中,凸出部20設置於坩堝本體1之外壁面,凸出部20由坩堝本體1之外壁面向外凸出延伸。在此所述外壁面例如為坩堝本體1之側壁13,即凸出部20為由側壁13向外延伸的一環型凸出結構。環型凸出結構可參閱圖2A,凸出部20係繞著側壁13之周向方向形成環型凸出結構。此外,如圖1所示,沿坩堝本體1之軸向方向上,凸出部20鄰近於填入端面11之一端,即凸出部20至底壁12的高度距離大於凸出部20至填入端面11的距離,使得凸出部20較遠離於底壁12之一端,然,本發明不對此加以限制。在一未繪示實施例中,凸出部鄰近於底壁之一端,即凸出部至底壁的高度距離小於凸出部至填入端面的距離;或者,使得凸出部至底壁的高度距離等於凸出部至填入端面的距離。In this embodiment, the protruding
此外,如圖2B所示,凸出部22的數量可為多個,多個凸出部22係沿著在側壁13之周向方向排列,換言之,本實施例的凸出部,可以如圖1或圖2A是在側壁13向外延伸的環型凸出結構,或者,如圖2B是在側壁13向外延伸多個凸出部22,多個凸出部22並未連接在一起。當然,在一未繪示實施例中,可以將部分凸出部22連接在一起,而有部分凸出部22未連接在一起。此外,這些凸出部22可以配置在鄰近底壁12或遠離底壁12之相同高度位置或不同高度位置,端視實際產品而可調整。In addition, as shown in FIG. 2B, the number of
圖3為本發明之坩堝另一實施例的示意圖。請參閱圖3,需說明的是,圖3的坩堝與圖1的坩堝相似,其中相同的構件以相同的標號表示且具有相同的功能而不再重複說明,以下僅說明差異處,圖3的坩堝與圖1的坩堝的差異在於:在此所述外壁面為坩堝本體1之底壁12,即凸出部30為由底壁12向外延伸的一環型凸出結構。環型凸出結構可參閱圖4A,凸出部30係繞著底壁12之周向方向形成環型凸出結構,且環型凸出結構位於底壁12之邊緣側。然,本發明不對此加以限制,在一未繪示實施例中,可將環型凸出結構設置底壁12之內部。Fig. 3 is a schematic diagram of another embodiment of the crucible of the present invention. Please refer to Figure 3, it should be noted that the crucible of Figure 3 is similar to the crucible of Figure 1, wherein the same components are denoted by the same reference numerals and have the same functions without repeating the description. Only the differences are described below. The difference between the crucible and the crucible in FIG. 1 is that the outer wall surface here is the
此外,如圖4B所示,凸出部32的數量可為多個,多個凸出部32係沿著在底壁12之周向方向排列,換言之,本實施例的凸出部,可以如圖3或圖4A是在底壁12向外延伸的環型凸出結構,或者,如圖4B是在底壁12向外延伸多個凸出部32,多個凸出部32並未連接在一起。當然,在一未繪示實施例中,可以將部分凸出部32連接在一起,而有部分凸出部32未連接在一起。此外,這些凸出部32可以配置在鄰近底壁12之邊緣側或內部之相同位置或不同位置,端視實際產品而可調整。In addition, as shown in FIG. 4B, the number of
圖5為本發明之坩堝又一實施例的示意圖。請參閱圖5,需說明的是,圖5的坩堝與圖1及圖3的坩堝相似,其中相同的構件以相同的標號表示且具有相同的功能而不再重複說明,以下僅說明差異處,圖5的坩堝所述外壁面為坩堝本體1之底壁12與側壁13,凸出部50包括第一凸出部52與第二凸出部54。第一凸出部52為由側壁13向外延伸的第一環型凸出結構,第一環型凸出結構係第一凸出部52繞著側壁13之周向方向所形成。第二凸出部54為由底壁12向外延伸的一第二環型凸出結構。然,本發明不對此加以限制,此外,如圖5所示,沿坩堝本體1之軸向方向上,第一凸出部52鄰近於填入端面11之一端,即第一凸出部52至底壁12的高度距離大於第一凸出部52至填入端面11的距離,使得第一凸出部52較遠離於底壁12之一端,然,本發明不對此加以限制。在一未繪示實施例中,第一凸出部鄰近於底壁之一端,即第一凸出部至底壁的高度距離小於第一凸出部至填入端面的距離;或者,使得第一凸出部至底壁的高度距離等於第一凸出部至填入端面的距離。Fig. 5 is a schematic diagram of another embodiment of the crucible of the present invention. Please refer to Figure 5. It should be noted that the crucible of Figure 5 is similar to the crucible of Figures 1 and 3, in which the same components are represented by the same reference numerals and have the same functions and will not be repeated. The following only describes the differences. The outer wall surface of the crucible in FIG. 5 is the
此外,在一未繪示實施例中,第一凸出部52亦可如圖2B之凸出部22所示,即第一凸出部52的數量可為多個,多個第一凸出部52係沿著在側壁13之周向方向排列;當然,可以將部分第一凸出部連接在一起,而有部分第一凸出部未連接在一起。此外,這些第一凸出部可以配置在鄰近底壁12或遠離底壁12之相同高度位置或不同高度位置,端視實際產品而可調整。In addition, in an embodiment that is not shown, the
在本實施例中,第二凸出部54係沿著在底壁12之周向方向排列,第二凸出部54係繞著底壁12之周向方向形成環型凸出結構,且環型凸出結構位於底壁12之邊緣側。然,本發明不對此加以限制,在一未繪示實施例中,可將環型凸出結構設置底壁12之內部。在一未繪示實施例中,第二凸出部54亦可如圖4B之凸出部32所示,即第二凸出部54的數量可為多個,多個第二凸出部54係沿著在底壁12之周向方向排列;當然,可以將部分第二凸出部連接在一起,而有部分第二凸出部未連接在一起。此外,這些第二凸出部可以配置在鄰近底壁12之邊緣側或內部之相同位置或不同位置,端視實際產品而可調整。In this embodiment, the
圖6為本發明之蒸鍍機台一實施例的示意圖。請參閱圖6,本實施例之圖1至圖5所示之坩堝係用於蒸鍍製程。本發明不限制蒸鍍機台之類型,蒸鍍機台包括金屬座體60以及如圖1至圖5所示坩堝。金屬座體60內設置有一槽體62,金屬座體60為一無氧銅座。坩堝可容置在槽體62中,坩堝本體1之容置槽14用以添加一蒸鍍材料M,該蒸鍍機台是利用一加熱源70對坩堝本體1內的蒸鍍材料M進行加熱,在一實施例中,加熱源70可為電子束,即使用電子束來加熱坩堝本體1內的蒸鍍材料M。由於第一凸出部52與第二凸出部54抵接於金屬座體60中槽體62之內壁面,使得坩堝不管如何放置,皆可使坩堝保持在金屬座體60的中間位置,而不會偏移,也不會使得坩堝有一側貼至無氧銅座之壁面的情況,故可使坩堝在使用上,能使坩堝內的材料均勻受熱,並能穩定控制功率,提升坩堝使用壽命以及降低生產成本。上述係以圖5所示坩堝作為舉例,亦可將圖1至圖4所示坩堝用於上述蒸鍍機台之中。Fig. 6 is a schematic diagram of an embodiment of the vapor deposition machine of the present invention. Please refer to FIG. 6, the crucible shown in FIG. 1 to FIG. 5 of this embodiment is used for the vapor deposition process. The present invention does not limit the type of the vapor deposition machine. The vapor deposition machine includes a
綜上所述,在本發明之坩堝與蒸鍍機台之中,在坩堝之外壁面設置凸出部,外壁面可為坩堝本體之側壁或底壁,如此一來,不管如何放置坩堝在金屬座體內,藉由凸出部抵接於金屬座體之內壁面,可使坩堝保持在金屬座體的中間位置,而不會偏移,也不會使得坩堝有一側貼至無氧銅座之壁面的情況,故可使坩堝在使用上,能使坩堝內的材料均勻受熱,並能穩定控制功率。In summary, in the crucible and vapor deposition machine of the present invention, a protrusion is provided on the outer wall of the crucible. The outer wall can be the side wall or the bottom wall of the crucible body. In this way, no matter how the crucible is placed on the metal In the base body, by abutting the protruding part on the inner wall surface of the metal base body, the crucible can be kept in the middle position of the metal base body without shifting, and it will not make one side of the crucible stick to the wall surface of the oxygen-free copper base Therefore, the crucible can be used, the materials in the crucible can be heated uniformly, and the power can be controlled stably.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to those defined by the attached patent scope.
1:坩堝本體
11:填入端面
12:底壁
13:側壁
14:容置槽
20、22:凸出部
30、32:凸出部
50:凸出部
52:第一凸出部
54:第二凸出部
60:金屬座體
62:槽體
70:加熱源
M:蒸鍍材料1: Crucible body
11: Fill in the end face
12: bottom wall
13: side wall
14: accommodating
圖1為本發明之坩堝一實施例的示意圖。 圖2A為圖1之俯視圖。 圖2B為本發明之凸出部另一實施例的俯視圖。 圖3為本發明之坩堝另一實施例的示意圖。 圖4A為圖3之俯視圖。 圖4B為本發明之凸出部另一實施例的俯視圖。 圖5為本發明之坩堝又一實施例的俯視圖。 圖6為本發明之蒸鍍機台一實施例的示意圖。Fig. 1 is a schematic diagram of an embodiment of the crucible of the present invention. Fig. 2A is a top view of Fig. 1. Fig. 2B is a top view of another embodiment of the protrusion of the present invention. Fig. 3 is a schematic diagram of another embodiment of the crucible of the present invention. Fig. 4A is a top view of Fig. 3. Fig. 4B is a top view of another embodiment of the protrusion of the present invention. Figure 5 is a top view of another embodiment of the crucible of the present invention. Fig. 6 is a schematic diagram of an embodiment of the vapor deposition machine of the present invention.
1:坩堝本體 1: Crucible body
11:填入端面 11: Fill in the end face
12:底壁 12: bottom wall
13:側壁 13: side wall
14:容置槽 14: accommodating slot
50:凸出部 50: protrusion
52:第一凸出部 52: The first protrusion
54:第二凸出部 54: second protrusion
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