TW202041477A - Glass substrate conveying device, laminated glass manufacturing device, and laminated glass manufacturing method to provide a conveying device for glass substrate for suppressing breakage of the glass substrate when the glass substrate is separated from the roll - Google Patents

Abstract

A conveying device 11 of a glass substrate 1 is provided with: a roll-out roller 21 for rolling out a conveying substrate 4 including a glass substrate 1 and a first protective material 5; a protective material winding roller 23 which winds the first protective material 5 from the glass substrate 1; a winding roll 41 which is arranged on the downstream side in the conveying direction of the roll-out roller 21 to wind the glass substrate 1; and a static electricity elimination part 15 which is arranged between the roll-out roller 21 and the winding roll 41.

Description

Glass substrate conveying device, laminated glass manufacturing device, and laminated glass manufacturing method

The present invention relates to a conveying device for glass substrates, a manufacturing device for laminated glass, and a manufacturing method for laminated glass.

In recent years, as flexible substrates for optical films included in image display devices such as liquid crystal displays and organic EL (Electroluminescence) displays, thin glass substrates are gradually being used from the viewpoint of heat resistance and the like. Specifically, transparent conductive glass formed by forming a transparent conductive layer such as indium tin oxide (ITO) on a thin glass substrate is used as a touch panel film.

In order to mass produce this optical film, a roll-to-roll method is adopted. That is, a long and flexible thin glass substrate is transported by rollers such as a driving roller or a guide roller, and a functional layer such as a transparent conductive layer is formed by a sputtering method. Finally, the laminated glass with the functional layer is wound into a roll State (refer to Patent Document 1). [Prior Technical Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2014-109073

[The problem to be solved by the invention]

However, in Patent Document 1, there are cases where heating is performed at a high temperature of 400° C. or more during film formation of the functional layer, so the thin glass substrate being conveyed is conveyed and formed into a film without a protective material or the like being laminated. That is, the thin glass substrate is separately transported and formed into a film.

Therefore, the thin glass substrate is in direct contact with the roller. Compared with the previous plastic substrates, the thin glass substrate has a smoother surface, so it is prone to adhesion to the roller. As a result, when the thin glass substrate is separated from the roller, the thin glass substrate may be damaged.

The present invention provides a glass substrate conveying device, a laminated glass manufacturing device, and a laminated glass manufacturing method that suppress damage to the glass substrate. [Technical means to solve the problem]

The present invention [1] includes a conveying device for a glass substrate, which is a conveying device for conveying a flexible glass substrate, and is provided with: a first roller for conveying the substrate with the glass substrate and protective material Winding out; a second roller, which winds the protective material from the glass substrate; a third roller, which is arranged on the downstream side of the conveying direction of the first roller, and winds up the glass substrate; and a static elimination part, which is arranged Between the first roller and the third roller.

According to the conveying device for the glass substrate, the static elimination part is provided between the first roller and the third roller, so that the electricity charged by the glass substrate can be removed. Therefore, when the glass substrate is in contact with a roller such as a guide roller, it is possible to suppress the adhesion (adhesion) between the glass substrate and the roller caused by electrification. Therefore, when the glass substrate is separated from the roller, the load on the glass substrate can be reduced, and the damage of the glass substrate can be suppressed.

The present invention [2] includes the glass substrate conveying device as described in [1], which further includes a driving roller, and the static elimination unit is arranged on the downstream side of the conveying direction of the driving roller.

According to this glass substrate conveying device, which is provided with a drive roller, the glass substrate can be conveyed reliably and continuously. In addition, the destaticizing part is arranged on the downstream side of the driving roller. Therefore, the electrification of the glass substrate caused by the contact with the driving roller can be destaticized. As a result, the glass substrate caused by the driving roller can be suppressed. damaged.

The present invention [3] includes a manufacturing apparatus for laminated glass, which includes: a conveying device as described in [1] or [2]; and a film forming device arranged between the first roller and the third roller, A functional layer is provided on the glass substrate under vacuum.

According to the conveying device for the laminated glass substrate, the conveying device and the film forming device are provided, and therefore, the glass substrate can be prevented from being damaged and the functional layer can be provided on the glass substrate. Therefore, laminated glass can be manufactured reliably.

The present invention [4] includes the manufacturing apparatus for laminated glass as described in [3], wherein the static elimination part has a first static elimination part and a second static elimination part, and the first static elimination part is provided in the film forming apparatus. On the upstream side in the conveying direction, the second static elimination unit is provided on the downstream side in the conveying direction of the film forming apparatus.

According to the conveying device of the laminated glass, the static elimination part (the first static elimination part or the second static elimination part) is provided on the upstream side and the downstream side of the film forming device. Therefore, it is possible to suppress the electrification of the glass substrate before and after the film formation. Therefore, the damage of the glass substrate can be suppressed more reliably.

The present invention [5] includes a manufacturing method of laminated glass, which sequentially includes: a preparation step, which prepares a conveying substrate with a flexible glass substrate and a protective material; and a peeling step, which is derived from the above glass substrate The protective material is peeled off from the protective material; and the film forming step is to provide a functional layer on the glass substrate under vacuum; and before and/or after the film forming step, an antistatic step for removing static electricity from the glass substrate is provided.

According to the manufacturing method of the laminated glass, the glass substrate can be destaticized, and therefore the electricity charged by the glass substrate can be removed. Therefore, the adhesion between the glass substrate and the roll can be suppressed, and the load during separation can be reduced. Therefore, it is possible to provide a functional layer on the glass substrate while preventing damage to the glass substrate. As a result, laminated glass can be manufactured reliably.

The present invention [6] includes the method for manufacturing laminated glass as described in [5], wherein the above-mentioned destaticizing step is carried out at least before the above-mentioned film forming step.

According to the manufacturing method of the laminated glass, the glass substrate is destaticized before the film formation, so that the damage of the glass substrate before the film formation can be suppressed.

The present invention [7] includes the manufacturing method of laminated glass as described in [5] or [6], wherein the above-mentioned destaticizing step is performed before and after the above-mentioned film forming step.

According to the manufacturing method of the laminated glass, the static elimination step is performed before and after the film formation step, and therefore, the electrification of the glass substrate before and after the film formation can be suppressed. Therefore, the damage of the glass substrate can be suppressed more reliably. [Effects of Invention]

According to the glass substrate conveying device of the present invention, the glass substrate can be conveyed while suppressing damage to the glass substrate. Furthermore, according to the manufacturing apparatus of the laminated glass of the present invention and the manufacturing method using the same, the laminated glass can be manufactured while suppressing the damage of the glass substrate.

1. Transport the film forming device 1, a transport film forming apparatus 10 as an embodiment of the manufacturing apparatus of the present invention will be described.

The transport film-forming apparatus 10 shown in FIG. 1 transports the glass substrate 1 and provides a transparent conductive layer (an example of a functional layer) 2 on one side in the thickness direction thereof to produce a transparent conductive glass (an example of a laminated glass) 3. Specifically, the transport film forming device 10 peels off the first protective material 5 (an example of the protective material) from the roll-shaped transport substrate 4, and transports the glass substrate 1 as a single body, and secondly, a transparent conductive layer is provided on the glass substrate 1 2. The transparent conductive glass 3 is produced. Next, the second protective material 6 is laminated on the transparent conductive glass 3 and wound into a roll.

The transport film forming device 10 includes a transport device 11, a sputtering device (an example of a film forming device) 12, and a cooling device 13. The conveying device 11 includes an unwinding unit 14, an antistatic unit 15, and a winding unit 16. The static elimination part 15 includes a first static elimination part 17 and a second static elimination part 18. Specifically, the transport film forming apparatus 10 is provided with an unwinding portion 14 and a first one in order from the upstream side in the transport direction (hereinafter, abbreviated as "upstream") to the downstream side (hereinafter, abbreviated as "downstream") in the transport direction. The static electricity part 17, the sputtering device 12, the cooling device 13, the second static electricity removing part 18 and the winding part 16. The details will be described below.

The unwinding part 14 is arranged on the most upstream side of the conveying device 11 and unwinds the long conveyed substrate 4.

The unwinding portion 14 includes an unwinding roller (an example of a first roller) 21, a first driving roller (an example of a driving roller) 22, a protective material winding roller (an example of a second roller) 23, and an unwinding housing 24.

The unwinding roller 21 is provided with a roll-shaped conveying base material 4. That is, on the peripheral surface of the unwinding roller 21, the conveying base material 4 elongated in the conveying direction is wound. The unwinding roller 21 is a cylindrical member having a rotating shaft that rotates in the conveying direction and extending in the width direction. In addition, in this specification, the following various rollers (unwind roller 21, first to second drive rollers (22, 40), protective material take-up roller 23, first to fifth guide rollers (26, 28, 31, 38, 43), the first to second cooling rollers (34, 35), the take-up roller 41, the protective material take-out roller 42, the nip roller 44) all have a rotating shaft that rotates in the conveying direction and extends in the width direction Cylindrical member.

In addition, the unwinding roller 21 is configured to be driven by external power or the like, and to be able to rotate in the arrow direction shown in FIG. 1. That is, the configuration of the unwinding roller 21 and the driving roller is described in detail in the first driving roller 22.

The first driving roller 22 applies power to the glass substrate 1 of the conveying substrate 4 provided on the unwinding roller 21 to be unwound to the downstream side. That is, the glass base material 1 is unwound from the unwinding roller 21, and is conveyed to the 1st static elimination part 17.

The first driving roller 22 is configured to be driven by external power or the like and to be able to rotate in the arrow direction shown in FIG. 1. Specifically, a gear (not shown) is provided at the end of the rotating shaft of the first drive roller 22, and a motor (not shown) is connected to the gear to rotate the first drive roller 22 in the arrow direction. The first driving roller 22 is rotated by the driving force of the motor.

The protective material winding roller 23 peels the first protective material 5 from the conveying base material 4 and winds up the first protective material 5. The protective material winding roller 23 is arranged in the vicinity of the unwinding roller 21. The protective material winding roller 23 is a driving roller, and is configured to be driven by external power or the like and capable of rotating in the arrow direction shown in FIG. 1.

The unwinding housing 24 houses the unwinding roller 21, the first driving roller 22, and the protective material winding roller 23 in the inside thereof.

The roll-out shell 24 is configured to be able to adjust its inside to a vacuum state. Specifically, a vacuum pump (not shown) is connected to the roll-out shell 24 to discharge the air inside the shell 24 to the outside. Furthermore, in this specification, the vacuum state refers to, for example, a state where the air pressure is 0.1 Pa or less, preferably 1×10 ^-3 Pa or less.

The first static elimination part 17 is arranged on the downstream side of the unwinding part 14 so as to be adjacent to the unwinding part 14. The first destaticizing section 17 destaticizes the glass substrate 1.

The first static elimination unit 17 includes a first static elimination machine 25, a first guide roller 26, and a first static elimination cover 27.

The first static elimination machine 25 reduces the charge of the glass substrate 1. The first destaticizer 25 is arranged on the downstream side of the first drive roller 22 and on the upstream side of the first guide roller 26.

As the first antistatic machine 25, for example, a corona discharge type antistatic machine, an ionizing radiation type antistatic machine, and the like can be cited.

The corona discharge type static elimination machine ionizes the air by corona discharge, and makes the ionized air contact the glass substrate 1, thereby performing static elimination. As a corona discharge type static elimination machine, for example, any of a voltage application type and a self-discharge type may be used.

The ionizing radiation type destaticizer performs destaticizing by, for example, contacting ionizing radiation such as soft X-rays, alpha particles, and ultraviolet rays with the glass substrate 1.

The first guide roller 26 guides the glass substrate 1 transported from the first drive roller 22 through the first destaticizer 25 to the second guide roller 28 of the sputtering device 12. The first guide roller 26 is arranged on the downstream side of the first destaticizer 25 and on the upstream side of the second guide roller 28.

The first antistatic cover 27 houses the first antistatic machine 25 and the first guide roller 26 inside. The first antistatic cover 27 is configured to be able to adjust its inside to a vacuum state.

The sputtering device 12 is arranged on the downstream side of the first static elimination part 17 so as to be adjacent to the first static elimination part 17. The sputtering device 12 sputters the glass substrate 1 in the film formation area 33 (film formation chamber) to form the transparent conductive layer 2.

The sputtering device 12 includes a second guide roller 28, a sputtering target 29, a heater 30, a third guide roller 31, and a sputtering cover 32.

The second guide roller 28 guides the glass substrate 1 conveyed from the first guide roller 26 to the film formation area 33. The second guide roller 28 is arranged on the downstream side of the first guide roller 26 and on the upstream side of the sputtering target 29.

The sputtering target 29 is a raw material of the transparent conductive layer 2. The sputtering target 29 and the glass base material 1 are opposingly arranged on the downstream side of the second guide roller 28 and the upstream side of the third guide roller 31 at an interval.

As the material of the sputtering target 29, for example, it may be selected from the group consisting of In, Sn, Zn, Ga, Sb, Nb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W The metal oxide of at least one metal.

Specifically, for example, indium-containing oxides such as indium tin composite oxide (ITO) can be cited, for example, antimony-containing oxides such as antimony tin composite oxide (ATO) can be cited, and indium-containing oxides are preferably cited. ITO is more preferable.

The heating machine 30 heats the glass substrate 1 or the transparent conductive glass 3 obtained thereafter. It is arranged on the downstream side of the second guide roller 28 and on the upstream side of the third guide roller 31 with an interval from the glass substrate 1. In addition, the heating machine 30 is arranged on the opposite side of the sputtering target 29 with the glass substrate 1 as a reference.

The film formation area 33 is divided into the middle of the conveyance direction between the second guide roller 28 and the third guide roller 31, and the sputtering target 29 and the heater 30 are arranged in the film formation area 33.

The third guide roller 31 guides the glass substrate 1 (that is, the transparent conductive glass 3) to be formed to the first cooling roller 34 of the cooling device 13. The third guide roller 31 is arranged on the downstream side of the sputtering target 29 and on the upstream side of the first cooling roller 34 (described below).

The sputtering cover 32 houses the second guide roller 28, the sputtering target 29, the heater 30, and the third guide roller 31. The sputtering cover 32 is configured to be able to adjust its inside to a vacuum state.

In addition, the sputtering device 12 is not shown, but it is equipped with other elements (anode, cathode, Ar gas introduction mechanism, etc.) for performing sputtering.

Specific examples of the sputtering device 12 include bipolar sputtering devices, electron cyclotron resonance sputtering devices, magnetron sputtering devices, ion beam sputtering devices, and the like.

The cooling device 13 is arranged on the downstream side of the sputtering device 12 so as to be adjacent to the sputtering device 12. The cooling device 13 cools the transparent conductive glass 3 heated in the sputtering device 12.

The cooling device 13 includes a first cooling roll 34, a second cooling roll 35, and a cooling housing 36.

The first cooling roll 34 is arranged on the upstream side in the cooling device 13, and the second cooling roll 35 is arranged on the downstream side of the first cooling roll 34. In addition, the first cooling roller 34 and the second cooling roller 35 are also driving rollers, respectively.

The surface temperature of the first cooling roll 34 and the second cooling roll 35 can be maintained at, for example, 280°C or lower, preferably 150°C or lower, and, for example, 40°C or higher, preferably 100°C or higher.

The cooling housing 36 accommodates the first cooling roller 34 and the second cooling roller 35 inside. The cooling shell 36 is configured to be able to adjust its inside to a vacuum state.

The second static elimination unit 18 is arranged on the downstream side of the cooling device 13 so as to be adjacent to the cooling device 13. The second destaticizing part 18 destaticizes the transparent conductive glass 3.

The second static elimination unit 18 includes a second static elimination machine 37, a fourth guide roller 38, and a second static elimination cover 39.

The second static elimination machine 37 reduces the charge of the glass substrate 1. The second destaticizer 37 is arranged on the downstream side of the second cooling roller 35 and the upstream side of the third guide roller 31. As a specific example of the second antistatic machine 37, the same as the first antistatic machine 25 can be cited.

The fourth guide roller 38 guides the transparent conductive glass 3 transported from the second cooling roller 35 through the second static elimination machine 37 to the second driving roller 40 of the winding section 16. The fourth guide roller 38 is arranged on the downstream side of the second destaticizer 37 and on the upstream side of the second drive roller 40.

The second antistatic cover 39 accommodates the second antistatic device 37 and the fourth guide roller 38 inside. The second antistatic cover 39 is configured to be able to adjust its inside to a vacuum state.

The winding part 16 is arranged on the most downstream side in the conveying device 11, and is arranged on the downstream side of the second static elimination machine 37 so as to be adjacent to the second static elimination machine 37. The winding unit 16 winds the transparent conductive glass 3 together with the second protective material 6.

The winding unit 16 includes a second driving roller 40, a winding roller (an example of a third roller) 41, a protective material winding roller 42, a fifth guide roller 43, a nip roller 44, and a winding cover 45.

The second drive roller 40 applies power for winding the transparent conductive glass 3 conveyed from the second static elimination part 18 to the downstream side. That is, the second drive roller 40 guides the transparent conductive glass 3 to the winding roller 41.

The winding roller 41 winds up the laminated body 7 of the transparent conductive glass 3 and the second protective material 6 conveyed between the fifth guide roller 43 and the nip roller 44. The take-up roller 41 is also a driving roller.

The second protective material 6 in a rolled form is provided on the protective material unwinding roller 42. That is, the second protective material 6 that is elongated in the conveying direction is wound on the peripheral surface of the protective material unwinding roller 42. The protective material unwinding roller 42 is a driving roller, and winds the second protective material 6 to the fifth guide roller 43.

The fifth guide roller 43 guides the second protection material 6 unwound from the protection material unwinding roller 42 to the nip roller 44. The fifth guide roller 43 is arranged in the middle of the conveying direction of the protective material unwinding roller 42 and the nip roller 44.

The nip roller 44 and the second drive roller 40 laminate the second protective material 6 on the transparent conductive glass 3. The nip roller 44 and the second driving roller 40 are arranged to face each other with a slight interval.

The winding cover 45 accommodates the second driving roller 40, the winding roller 41, the protective material winding roller 42, the fifth guide roller 43, and the nip roller 44 in the inside thereof. The take-up cover 45 is configured to be able to adjust its inside to a vacuum state.

2. Manufacturing method of transparent conductive glass 1 and 2, the method of manufacturing the transparent conductive glass 3 using the transport film forming apparatus 10 will be described. The manufacturing method of the transparent conductive glass 3 includes in order: a preparation step, which prepares the substrate 4 to be conveyed; a peeling step, which peels the first protective material 5 from the glass substrate 1; and the first antistatic step, which is for glass The substrate 1 is destaticized; the film forming step is to provide a transparent conductive layer 2 on the glass substrate 1 under vacuum; the cooling step is to cool the transparent conductive glass 3; the second destaticizing step is to The conductive glass 3 is destaticized; and the winding step is to wind the transparent conductive glass 3 to the winding roller 41. Hereinafter, each step is described in detail.

First, the base material 4 is prepared to be conveyed on the unwinding roller 21 (preparation step). Specifically, the base material 4 is prepared to be transported and installed on the unwinding roller 21.

The conveying base material 4 includes a glass base material 1 and a first protective material 5 in the thickness direction (see FIG. 2A). That is, the conveying base material 4 is a glass base material with a protective material. The conveying base material 4 is elongated in the conveying direction, and is wound into a roll shape. A known or commercially available one can be used for such a roll-shaped transport base material 4.

The glass substrate 1 has a film shape (including a sheet shape), and is formed of transparent glass. Examples of glass include alkali-free glass, soda glass, borosilicate glass, aluminosilicate glass, and the like.

The glass substrate 1 has flexibility, and its thickness is, for example, 250 μm or less, preferably 100 μm or less, and for example, 10 μm or more, preferably 40 μm or more.

The first protective material 5 prevents damage caused by the contact between the glass substrates 1 when the roll-shaped glass substrate 1 is rolled out. The first protective material 5 has a film shape and is arranged on one surface of the glass substrate 1 in the thickness direction.

As the first protective material 5, for example, an adhesive film, spacer paper, etc. can be cited.

The adhesive film has a polymer film and an adhesive layer in the thickness direction.

Examples of polymer films include polyester films (polyethylene terephthalate films, polybutylene terephthalate films, polyethylene naphthalate films, etc.), polycarbonate films, Olefin-based film (polyethylene film, polypropylene film, cycloolefin film, etc.), acrylic film, polyether-based film, polyarylate-based film, melamine-based film, polyamide-based film, polyimide-based film , Cellulose film, polystyrene film.

The adhesive layer is a pressure sensitive adhesive layer, for example, acrylic adhesive layer, rubber adhesive layer, silicone adhesive layer, polyester adhesive layer, polyurethane adhesive layer , Polyamide-based adhesive layer, epoxy-based adhesive layer, vinyl alkyl ether-based adhesive layer, fluorine-based adhesive layer, etc.

As the spacer paper, for example, Dolin paper, Japanese paper, kraft paper, cellophane, synthetic paper, top coat paper, etc. can be cited.

The thickness of the first protective material 5 is, for example, 10 μm or more, preferably 30 μm or more, and for example, 1000 μm or less, preferably 500 μm or less.

Next, the transport film forming apparatus 10 is operated. Specifically, the various housings (rolling-out housing 24, first de-staticizing cover 27, second de-staticizing cover 39, take-up cover 45) are all adjusted to vacuum, and various drive rollers (rolling out Roller 21, first to second drive rollers (22, 40), protective material winding roller 23, first to fifth guide rollers (26, 28, 31, 38, 43), first to second cooling rollers (34, 35) ), the winding roller 41, the protective material unwinding roller 42, the nip roller 44)) are all driven to rotate. In addition, the static elimination unit 15 (the first static elimination machine 25 and the second static elimination machine 37), the cooling device 13, the sputtering device 12, and the like are also operated. Thereby, the conveying base material 4 is conveyed to the downstream side, and the peeling step, the first destaticizing step, the film forming step, the cooling step, the second destaticizing step, and the winding step are sequentially performed.

Specifically, in the unwinding part 14, the conveying base material 4 is unwound from the unwinding roller 21. At this time, the first protective material 5 is peeled off from the glass substrate 1 on which the substrate 4 is conveyed. The first protective material 5 is wound up to the protective material winding roller 23, and the glass base material 1 is individually conveyed toward the first driving roller 22 (see FIG. 2B).

After that, the glass base material 1 is in direct contact with the first drive roller 22 on one surface in the thickness direction, and is conveyed from the unwinding section 14 to the first static elimination section 17. At this time, due to the driving force and frictional force of the first driving roller 22, one surface of the glass substrate 1 in the thickness direction is charged.

In the first destaticizing part 17, the glass substrate 1 is destaticized by the operation of the first destaticizing machine 25. That is, the amount of electricity carried by the glass substrate 1 is reduced. At this time, the first static elimination part 17 performs static elimination from one side in the thickness direction of the glass substrate 1 so as to eliminate static electricity from one side in the thickness direction of the glass substrate 1.

After that, the destaticized glass substrate 1 is guided to the first guide roller 26 and conveyed to the sputtering device 12.

In the sputtering device 12, the glass substrate 1 is guided by the second guide roller 28 and transported to the film formation area 33. In the film formation area 33, the glass substrate 1 is sputtered.

In sputtering, gas is supplied and a voltage is applied from a power supply to accelerate gas ions and irradiate the sputtering target 29 to sputter the target material from the surface of the sputtering target 29 to deposit the target material on the surface of the glass substrate 1.

Specific examples of sputtering include bipolar sputtering, electron cyclotron resonance sputtering, magnetron sputtering, ion beam sputtering, and the like.

As the gas used for sputtering (that is, the gas to be introduced into the film formation region 33), for example, an inert gas such as argon (Ar) can be cited. Preferably, a reactive gas such as oxygen can be used in combination.

The air pressure during sputtering (that is, the air pressure of the film formation region 33) is a vacuum, preferably less than 1.0 Pa, more preferably 0.5 Pa or less.

Thereby, in the film formation area 33, the transparent conductive layer 2 is formed into a film on one surface of the thickness direction of the glass substrate 1, and the transparent conductive glass 3 is obtained (refer FIG. 2C).

In addition, simultaneously with sputtering, the transparent conductive glass 3 is heated by the heating machine 30.

The heating temperature is, for example, 300°C or higher, preferably 400°C or higher, and for example, 800°C or lower, and preferably 600°C or lower. Thereby, for example, when the transparent conductive layer 2 is an ITO layer, the ITO layer can be crystallized at a high temperature simultaneously with the film formation, and the conductivity can be improved.

After that, the transparent conductive glass 3 is guided to the third guide roller 31 and transported to the cooling device 13.

In the cooling device 13, the transparent conductive glass 3 is in contact with the first cooling roller 34 and the second cooling roller 35 in order to be cooled.

The surface temperature of each cooling roll (34, 35) is, for example, 280°C or lower, preferably 150°C or lower, and, for example, 40°C or higher.

At this time, from the viewpoint of the expansion of the contact area between the transparent conductive glass 3 and the cooling rollers 34 and 35 (and the improvement of cooling efficiency), the first cooling roller 34 and the second cooling roller 35 may cross between them. The transparent conductive glass 3 is transported in the opposite direction. That is, the transparent conductive glass 3 is conveyed so that one end of the first cooling roller 34 in the radial direction is in contact with the other end of the second cooling roller 35 in the radial direction.

At this time, the other surface of the glass substrate 1 of the transparent conductive glass 3 in the thickness direction is in direct contact with the second cooling roller 35 and is transported from the cooling device 13 to the second static electricity removal section 18. At this time, due to the driving force and frictional force of the second cooling roller 35, the other surface in the thickness direction of the transparent conductive glass 3 (the surface on the glass substrate 1 side) is charged.

After that, the cooled transparent conductive glass 3 is transported to the second destaticizing part 18.

In the second antistatic part 18, the transparent conductive glass 3 is destaticized by the operation of the second antistatic machine 37. That is, the amount of electricity carried by the glass substrate 1 of the transparent conductive glass 3 is reduced. At this time, the second antistatic part 18 removes static electricity from the other side in the thickness direction of the transparent conductive glass 3 in order to remove static electricity from the other side in the thickness direction of the transparent conductive glass 3 (the surface on the glass substrate 1 side).

After that, the transparent conductive glass 3 that has been destaticized is guided to the fourth guide roller 38 and conveyed to the winding unit 16.

In the winding part 16, the second protection material 6 is unwound from the protection material unwinding roller 42, is guided to the fifth guide roller 43, and is conveyed to the nip roller 44.

On the other hand, the transparent conductive glass 3 passes between the second drive roller 40 and the nip roller 44 together with the second protective material 6, and the second protective material 6 is layered in an area in the thickness direction of the transparent conductive glass 3.

After that, the transparent conductive glass 3 is wound up to the winding roller 41 together with the second protective material 6. Specifically, a laminate 7 (refer to FIG. 2D) provided with a transparent conductive glass 3 and a second protective material 6 arranged on the other surface in the thickness direction (the surface opposite to the transparent conductive layer 2) is wound into a roll shape.

3. The use of transparent conductive glass The transparent conductive glass 3 is used for optical devices such as image display devices, for example. When an image display device (specifically, an image display device with image display elements such as an LCD (Liquid Crystal Display) module, an organic EL module, etc.) is provided with a transparent conductive glass 3, it is transparent The conductive glass 3 is used, for example, as a base material for touch panels, an anti-reflection base material, etc., and is preferably used as a base material for touch panels. As the form of the touch panel, various methods such as an optical method, an ultrasonic method, an electrostatic capacitance method, and a resistive film method can be cited, and it is particularly suitable for an electrostatic capacitance method touch panel.

In addition, the conveying device 11 in the conveying film-forming apparatus 10 includes an unwinding roller 21, a protective material winding roller 23, a winding roller 41, and a static elimination unit 15.

Therefore, the electricity charged on the surface of the glass substrate 1 can be removed. Therefore, when the glass substrate 1 is in contact with other rollers such as the first guide roller 26, the adhesion between the glass substrate 1 and other rollers caused by electrification can be suppressed. Therefore, when the glass substrate 1 is separated from other rolls, the load on the glass substrate 1 can be reduced, and the damage of the glass substrate 1 can be suppressed.

In addition, the conveying device 11 further includes the first driving roller 22, and therefore, the glass substrate 1 can be conveyed reliably and continuously. In addition, the first destaticizer 25 is disposed on the downstream side of the first drive roller 22, so that the glass substrate 1 can be destaticized due to the contact with the first drive roller 22. As a result, it can be suppressed The glass substrate 1 is damaged by the first drive roller 22.

In particular, if the first driving roller 22 is in direct contact with the smooth surface of the glass substrate 1, it is easy to generate static electricity on the surface of the glass substrate 1 due to friction caused by the rotation of the first driving roller 22. Therefore, by arranging the first destaticizing part 17 immediately after the first driving roller 22, the electrification of the glass substrate 1 can be reduced immediately and surely. On the other hand, in the transparent conductive glass 3, in terms of the contact between the transparent conductive layer 2 and the first cooling roller 34 (driving roller), the transparent conductive layer 2 is not as smooth as the glass surface, and it is difficult to generate static electricity, so it is not particularly necessary Immediately after the first cooling roller 34 (driving roller) which is in contact with the transparent conductive layer 2, an electrostatic discharge part is arranged. On the other hand, if the second static elimination part 18 is arranged immediately after the second cooling roller 35 (drive roller) in contact with the glass substrate 1, the damage caused by the electrification of the glass substrate 1 can be effectively suppressed.

In addition, the transport film forming apparatus 10 includes a transport device 11 and a sputtering device 12.

Therefore, the transparent conductive layer 2 is provided on the glass substrate 1 so that the glass substrate 1 can be prevented from being damaged. Therefore, the transparent conductive glass 3 can be manufactured reliably.

In addition, the static elimination part 15 has a first static elimination part 17 and a second static elimination part 18, the first static elimination part 17 is provided on the upstream side of the sputtering device 12, and the second static elimination part 18 is provided on the sputtering device 12 The downstream side.

Therefore, before and after the film formation of the transparent conductive layer 2, the charging of the glass substrate 1 or the transparent conductive glass 3 can be suppressed. Therefore, the damage of the glass substrate 1 or the transparent conductive glass 3 can be suppressed more reliably, and the transparent conductive glass 3 can be manufactured reliably.

The manufacturing method of the transparent conductive glass 3 sequentially includes: a preparation step, which prepares the conveying substrate 4 provided with the glass substrate 1 and the first protective material 5; and the peeling step, which peels the first protective material from the glass substrate 1 5; and the film forming step, which is to provide a transparent conductive layer 2 on the glass substrate 1 under vacuum; and before and after the film forming step, the glass substrate 1 is provided with an antistatic step for removing static electricity.

Therefore, it is possible to suppress adhesion between the glass substrate 1 and the roller when they are in contact with each other, and reduce the load during separation. Therefore, the transparent conductive layer 2 is provided on the glass substrate 1 so that the glass substrate 1 can be prevented from being damaged. As a result, the transparent conductive glass 3 can be manufactured reliably.

Especially with regard to the destaticizing step, it is performed before and after the film forming step. Therefore, before and after the film formation of the transparent conductive layer 2, the charging of the glass substrate 1 or the transparent conductive glass 3 can be suppressed. Therefore, the damage of the glass substrate 1 or the transparent conductive glass 3 can be suppressed more reliably, and the transparent conductive glass 3 can be manufactured reliably.

4. Variations Hereinafter, a modification example of the embodiment shown in FIG. 1 will be described. In addition, these modified examples also exhibit the same effects as the above-mentioned embodiment.

(1) In the embodiment shown in FIG. 1, two static elimination parts 15 are arranged before and after the sputtering device 12. That is, the destaticizing step is performed before and after the film forming step. For example, although not shown, the static elimination part 15 may include only the first static elimination part 17, and may also include only the second static elimination part 18. That is, the destaticizing step may be implemented only as a step before sputtering film formation, or it may be implemented only as a subsequent step.

Preferably, the embodiment shown in FIG. 1 can be cited. In this embodiment, the electricity generated by contact with the driving rollers arranged before and after the sputtering device 12 can be destaticized at any time, and the damage of the glass substrate 1 caused by charging can be reliably suppressed.

(2) In the embodiment shown in FIGS. 1 and 2, the transparent conductive glass 3 is exemplified as the laminated glass, that is, the transparent conductive layer 2 is exemplified as the functional layer. For example, although not shown, it is The functional layer may be, for example, a hard coat layer, an optical adjustment layer, a metal layer (for example, a non-transparent conductive layer such as a copper layer), etc. In addition, as the functional layer, it may be one layer or two or more layers.

(3) In the embodiment shown in FIG. 1, the sputtering apparatus 12 is exemplified as the film forming apparatus. For example, although not shown, vacuum film forming apparatuses such as vacuum vapor deposition apparatus and chemical vapor deposition apparatus may be mentioned. .

Furthermore, the above-mentioned invention provides an exemplary embodiment of the present invention, but this is only an example and cannot be interpreted in a limited manner. Variations of the present invention that are obvious to those skilled in the art are included in the scope of the following patent applications. [Industrial availability]

The conveying device of glass substrate and the manufacturing device of laminated glass are used for the manufacture of laminated glass.

1: Glass substrate 2: Transparent conductive layer 3: Transparent conductive glass 4: Transport substrate 5: The first protective material 6: The second protective material 7: Laminated body 10: Transporting the film forming device 11: Conveying device 12: Sputtering device 13: Cooling device 14: Roll out 15: Go to the static department 16: Coiling section 17: The first antistatic part 18: The second antistatic part 21: Roll out roller 22: 1st drive roller 23: Protective material take-up roller 24: Roll out the shell 25: The first anti-static machine 26: The first guide roller 27: The first anti-static cover 28: The second guide roller 29: Sputtering target 30: heating machine 31: The third guide roller 33: Film forming area 34: 1st cooling roll 35: 2nd cooling roll 36: Cooling shell 37: The second antistatic machine 38: 4th guide roller 39: The second anti-static cover 40: 2nd drive roller 41: take-up roller 42: Protective material roll out roller 43: 5th guide roller 44: nip roller 45: take-up cover

Fig. 1 shows an embodiment of the transport film forming apparatus of the present invention. Figures 2A-D show a cross-sectional view of the transported object transported by the transport film forming device of Figure 1, Figure 2A shows the transported object at the stage of winding to the unwinding roll (ie, transporting the substrate), and Figure 2B shows the transporting from the unwinding roll Fig. 2C shows the conveyed material (that is, transparent conductive glass) from the film forming area to the cooling device, and Fig. 2D shows the conveyed material (ie, transparent conductive glass) at the stage of the first drive roller. 5 The conveyed material (ie, the laminated body of the transparent conductive glass and the second protective material) at the stage where the guide roller is wound to the take-up roller.

1: Glass substrate

3: Transparent conductive glass

4: Transport substrate

5: The first protective material

6: The second protective material

7: Laminated body

10: Transporting the film forming device

11: Conveying device

12: Sputtering device

13: Cooling device

14: Roll out

15: Go to the static department

16: Coiling section

17: The first antistatic part

18: The second antistatic part

21: Roll out roller

22: 1st drive roller

23: Protective material take-up roller

24: Roll out the shell

25: The first anti-static machine

26: The first guide roller

27: The first anti-static cover

28: The second guide roller

29: Sputtering target

30: heating machine

31: The third guide roller

32: Sputtering cover

33: Film forming area

34: 1st cooling roll

35: 2nd cooling roll

36: Cooling shell

37: The second antistatic machine

38: 4th guide roller

39: The second anti-static cover

40: 2nd drive roller

41: take-up roller

42: Protective material roll out roller

43: 5th guide roller

44: nip roller

45: winding cover

Claims (7)

A conveying device for glass substrate, characterized in that it is a conveying device for conveying flexible glass substrates, and have: The first roller rolls out the conveying substrate provided with the glass substrate and the protective material; A second roll that winds the protective material from the glass substrate; The third roller is arranged on the downstream side in the conveying direction of the first roller, and winds up the glass substrate; and a static elimination section, which is arranged between the first roller and the third roller. Such as the glass substrate conveying device of claim 1, which is further provided with a driving roller, and The static elimination part is arranged on the downstream side in the conveying direction of the drive roller. A manufacturing device for laminated glass, which is characterized by having: Such as the conveying device of claim 1 or 2; and The film forming apparatus is arranged between the first roll and the third roll, and provides a functional layer on the glass substrate under vacuum. Such as the manufacturing device of laminated glass of claim 3, wherein the static elimination part has a first static elimination part and a second static elimination part, The first antistatic part is provided on the upstream side of the transport direction of the film forming apparatus, The second static elimination unit is provided on the downstream side in the conveying direction of the film forming apparatus. A method for manufacturing laminated glass, which is characterized in that: The preparation step is to prepare a transport substrate with a flexible glass substrate and protective material; A peeling step, which is to peel the protective material from the glass substrate; and The film forming step is to provide a functional layer on the glass substrate under vacuum; and Before and/or after the above-mentioned film forming step, an antistatic step of removing the above-mentioned glass substrate is provided. The method for manufacturing laminated glass according to claim 5, wherein the static elimination step is performed at least before the film forming step. The method for manufacturing laminated glass according to claim 5 or 6, wherein the static elimination step is performed before and after the film forming step.

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