TW202036928A - Quantum dot light-emitting diodes comprising doped zno electron transport layer - Google Patents

Quantum dot light-emitting diodes comprising doped zno electron transport layer Download PDF

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TW202036928A
TW202036928A TW108148372A TW108148372A TW202036928A TW 202036928 A TW202036928 A TW 202036928A TW 108148372 A TW108148372 A TW 108148372A TW 108148372 A TW108148372 A TW 108148372A TW 202036928 A TW202036928 A TW 202036928A
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quantum dot
dot light
equal
transport layer
electron transport
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保羅 H 霍洛韋
金伯賢
亞歷山大 季托夫
克里希納 阿闍黎
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美商納諾光子公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/16Electron transporting layers
    • H10K50/165Electron transporting layers comprising dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/16Electron transporting layers
    • H10K50/166Electron transporting layers comprising a multilayered structure

Abstract

Articles and methods related to quantum dot light-emitting diodes are generally provided. A quantum dot light-emitting diode may comprise a first electrode, a quantum dot light-emitting layer disposed on the first electrode, an electron transport layer disposed on the quantum dot light-emitting layer, and second electrode disposed on the electron transport layer. The electron transport layer may comprise nanoparticles comprising ZnO doped with one or more dopants and/or capped with one or more ligands. The quantum dot light-emitting layer may comprise two or more electron transport layers, each of which may independently comprise ZnO doped with one or more dopants and/or capped with one or more ligands. The nanoparticles may have a number average diameter of less than or equal to 5 nm.

Description

包含摻雜ZnO電子傳遞層之量子點發光二極體Quantum dot light emitting diode containing doped ZnO electron transport layer

本揭示係關於量子點發光二極體,且更特定言之係關於用於其之摻雜電子傳遞層。The present disclosure relates to quantum dot light-emitting diodes, and more specifically to the doped electron transport layer used for them.

此章節中之陳述僅提供與本揭示相關之背景資訊且可不構成先前技術。The statements in this section only provide background information related to the present disclosure and may not constitute prior art.

量子點發光二極體能夠在施加電壓於其上後產生光。現存量子點發光二極體通常自安置於兩個電極之間的量子點發光層中之量子點發光。所施加電壓可使得電子及電洞自此等電極流入量子點層中,在量子點層可捕獲電子及電洞並將其重組生成光子。一些量子點發光二極體進一步包括電子傳遞層以有助於將電子自陰極傳遞至量子點發光層。然而,現存電子傳遞層受諸如不期望地低之功函數之缺點影響,減小電子傳遞之效率。因此,需要經改良之電子傳遞層。Quantum dot light-emitting diodes can generate light after voltage is applied to them. Existing quantum dot light-emitting diodes usually emit light from quantum dots placed in a quantum dot light-emitting layer between two electrodes. The applied voltage allows electrons and holes to flow from these electrodes into the quantum dot layer, where the electrons and holes can be captured and recombined to generate photons. Some quantum dot light-emitting diodes further include an electron transport layer to help transport electrons from the cathode to the quantum dot light-emitting layer. However, the existing electron transport layer suffers from disadvantages such as an undesirably low work function, reducing the efficiency of electron transport. Therefore, an improved electron transport layer is needed.

大體上描述摻雜ZnO電子傳遞層、相關組件及相關方法。Generally describe the doped ZnO electron transport layer, related components and related methods.

在一些實施例中,提供量子點發光二極體。量子點發光二極體包含第一電極、安置於該第一電極上之量子點發光層、安置於該量子點發光層上之電子傳遞層及安置於該電子傳遞層上之第二電極。電子傳遞層包含奈米粒子,該等奈米粒子包含摻雜有一或多種摻雜物之ZnO,且該等奈米粒子之數目平均直徑小於或等於5 nm。In some embodiments, quantum dot light emitting diodes are provided. The quantum dot light-emitting diode includes a first electrode, a quantum dot light-emitting layer arranged on the first electrode, an electron transfer layer arranged on the quantum dot light-emitting layer, and a second electrode arranged on the electron transfer layer. The electron transport layer includes nanoparticles, the nanoparticles include ZnO doped with one or more dopants, and the number average diameter of the nanoparticles is less than or equal to 5 nm.

在一些實施例中,提供一種製造量子點發光二極體之方法。該方法包含組裝電子傳遞層第一電極、第二電極及量子點發光層。電子傳遞層包含奈米粒子,該等奈米粒子包含摻雜有一或多種摻雜物之ZnO,且該等奈米粒子之數目平均直徑小於或等於5 nm。In some embodiments, a method of manufacturing a quantum dot light-emitting diode is provided. The method includes assembling a first electrode of an electron transport layer, a second electrode, and a quantum dot light-emitting layer. The electron transport layer includes nanoparticles, the nanoparticles include ZnO doped with one or more dopants, and the number average diameter of the nanoparticles is less than or equal to 5 nm.

自當結合隨附圖式考慮時本發明之各種非限制性實施例之以下詳細描述,本發明之其他優勢及新穎特徵將變得顯而易見。在本說明書及以引用的方式併入之文獻包括衝突及/或不一致的揭示內容之情況下,應以本說明書為準。若兩個或多於兩個以引用的方式併入之文獻相對於彼此包括衝突及/或不一致的揭示內容,則應以具有更遲有效日期之文獻為準。Other advantages and novel features of the present invention will become apparent from the following detailed description of various non-limiting embodiments of the present invention when considered in conjunction with the accompanying drawings. In the case of conflicting and/or inconsistent disclosure content in this specification and documents incorporated by reference, this specification shall prevail. If two or more documents incorporated by reference include conflicting and/or inconsistent disclosures relative to each other, the document with the later effective date shall prevail.

在以下描述中,參考隨附圖式,該等隨附圖式形成本文之一部分,且其中以說明可實踐本發明之具體實施例之方式展示。應理解,在不脫離本發明範疇之情況下,可採用其它實施例,且可發生結構變化。In the following description, reference is made to the accompanying drawings, which form a part of this document, and are shown in a manner that illustrates specific embodiments in which the present invention can be practiced. It should be understood that without departing from the scope of the present invention, other embodiments may be adopted, and structural changes may occur.

本揭示大體上係關於用於量子點發光二極體之摻雜ZnO電子傳遞層及相關聯之製品及方法。可將電子傳遞層安置於陰極(自其將電子注入量子點發光二極體中)與量子點發光層(在其中將電子與自電洞傳遞層傳遞之電洞重組以產生光子)之間。本文所描述之一些電子傳遞層可有利地具有高電子傳導率值。舉例而言,一些電子傳遞層可包含一或多種增大電子傳遞層整體之電子傳導率之摻雜物。具有高電子傳導率值之電子傳遞層可有利地促成電子以大數量經由電子傳遞層傳遞。The present disclosure generally relates to doped ZnO electron transport layers for quantum dot light-emitting diodes and related products and methods. The electron transport layer can be placed between the cathode (from which electrons are injected into the quantum dot light-emitting diode) and the quantum dot light-emitting layer (in which electrons are recombined with the holes transferred from the hole transport layer to generate photons). Some of the electron transport layers described herein can advantageously have high electronic conductivity values. For example, some electron transport layers may include one or more dopants that increase the overall electron conductivity of the electron transport layer. An electron transport layer with a high electron conductivity value can advantageously facilitate the transport of electrons through the electron transport layer in large numbers.

本文所描述之量子點發光二極體可適合用於廣泛多種應用中,諸如平板TV螢幕、數位攝影機、行動電話、AR/VR顯示器、Li-Fi通訊、採光及手持型比賽主控台。The quantum dot light-emitting diode described in this article can be used in a wide variety of applications, such as flat-panel TV screens, digital cameras, mobile phones, AR/VR displays, Li-Fi communications, daylighting, and handheld game consoles.

圖1展示根據一個實施例之量子點發光二極體之示意圖。圖1中,量子點發光二極體包含基板110、安置於基板上之陽極120、安置於陽極上之電洞注入層130、安置於電洞注入層上之電洞傳遞層140、安置於電洞傳遞層上之量子點發光層150、安置於量子點發光層上之電子傳遞層160及安置於電子傳遞層上之陰極170。如本文所用,當層被稱為「安置於另一層上」時,其可直接安置於層上或亦可存在中間層。「直接安置於另一層上」之層意謂不存在中間層。因此,應理解一些量子點發光二極體可包括圖1中未展示及/或安置於圖1中所展示之兩層之間的其他層。藉助於實例,在一些實施例中,量子點發光二極體包含兩個電洞注入層及/或兩個電洞傳遞層。在例如量子點發光二極體包含兩個電洞注入層之情況下,可將第二電洞注入層安置於第一電洞注入層與電洞傳遞層之間。相似地,包含兩個電洞傳遞層之量子點發光二極體可包含安置於第一電洞傳遞層與量子點發光層之間的第二電洞傳遞層。Figure 1 shows a schematic diagram of a quantum dot light-emitting diode according to an embodiment. In FIG. 1, the quantum dot light-emitting diode includes a substrate 110, an anode 120 arranged on the substrate, a hole injection layer 130 arranged on the anode, a hole transfer layer 140 arranged on the hole injection layer, and a hole transfer layer 140 arranged on the hole injection layer. The quantum dot light-emitting layer 150 on the hole transport layer, the electron transport layer 160 placed on the quantum dot light-emitting layer, and the cathode 170 placed on the electron transport layer. As used herein, when a layer is referred to as being "disposed on another layer," it can be directly disposed on the layer or an intermediate layer may also be present. The layer "placed directly on another layer" means that there is no intermediate layer. Therefore, it should be understood that some quantum dot light emitting diodes may include other layers not shown in FIG. 1 and/or disposed between the two layers shown in FIG. 1. By way of example, in some embodiments, the quantum dot light emitting diode includes two hole injection layers and/or two hole transport layers. For example, in the case where the quantum dot light-emitting diode includes two hole injection layers, the second hole injection layer may be disposed between the first hole injection layer and the hole transfer layer. Similarly, the quantum dot light emitting diode including two hole transport layers may include a second hole transport layer disposed between the first hole transport layer and the quantum dot light emitting layer.

應理解,當量子點發光二極體包含兩個或多於兩個同一類型之層(例如兩個或多於兩個電洞注入層、兩個或多於兩個電洞傳遞層)時,同一類型之兩層可為相同的或可以一或多種方式不同。舉例而言,量子點發光二極體可包含兩個或多於兩個同一類型之層,該等層在化學組成、摻雜水平、帶隙、形態、厚度方面及/或以另一方式不同。It should be understood that when the quantum dot light-emitting diode includes two or more layers of the same type (for example, two or more hole injection layers, two or more hole transport layers), Two layers of the same type can be the same or can be different in one or more ways. For example, a quantum dot light-emitting diode may include two or more layers of the same type, which are different in chemical composition, doping level, band gap, morphology, thickness, and/or in another way .

當在兩個電極之間施加電壓時,陽極120可將電洞注入至電洞注入層130中。隨後可將電洞經由電洞傳遞層140傳遞。施加電壓亦可使得陰極170注入及經由電子傳遞層160傳遞。所注入電洞及所注入電子可在量子點發光層150中(例如在其中之一或多個量子點處)組合以形成激子。激子可經重組以發光。When a voltage is applied between the two electrodes, the anode 120 can inject holes into the hole injection layer 130. The hole can then be transferred via the hole transfer layer 140. The application of voltage can also cause the cathode 170 to inject and pass through the electron transport layer 160. The injected holes and injected electrons may be combined in the quantum dot light-emitting layer 150 (for example, at one or more of the quantum dots) to form excitons. The excitons can be recombined to emit light.

一些實施例係關於形成量子點發光二極體之方法,諸如圖1中所展示之量子點發光二極體、包含圖1中所展示之一或多個層的量子點發光二極體及/或包含圖1中未展示之其他層的量子點發光二極體。在一些實施例中,方法包含將一或多個層組裝在一起以形成量子點發光二極體。可藉由將一個層沈積於另一層上將該等層組裝在一起以形成量子點發光二極體。該等層可按圖1中所展示之次序沈積(亦即可將陽極沈積於基板上,可將電洞注入層沈積於陽極上,可將電洞傳遞層沈積於電洞注入層上,可將量子點發光層沈積於電洞傳遞層上,可將電子傳遞層沈積於量子點發光層上及可將陰極沈積於電子傳遞層上),按相反次序沈積(亦即可將電子傳遞層沈積於陰極上,可將量子點發光層沈積於電子傳遞層上,可將電洞傳遞層沈積於量子點發光層上,可將電洞注入層沈積於電洞傳遞層上,可將陽極沈積於電洞注入層上及可將基板沈積於陽極上),按圖1中所展示之次序或相反次序但省去形成其中所展示的層中之一者沈積及/或按另一適合次序沈積。可採用沈積之多種適合形式,諸如旋塗、真空沈積、列印、噴塗、捲塗、浸塗、衝壓及類似形式。Some embodiments relate to methods of forming quantum dot light-emitting diodes, such as the quantum dot light-emitting diode shown in FIG. 1, the quantum dot light-emitting diode including one or more layers shown in FIG. 1, and/ Or include quantum dot light-emitting diodes with other layers not shown in FIG. 1. In some embodiments, the method includes assembling one or more layers together to form a quantum dot light emitting diode. The layers can be assembled by depositing one layer on the other to form a quantum dot light-emitting diode. The layers can be deposited in the order shown in Figure 1 (that is, the anode can be deposited on the substrate, the hole injection layer can be deposited on the anode, the hole transport layer can be deposited on the hole injection layer, The quantum dot light-emitting layer is deposited on the hole transport layer, the electron transport layer can be deposited on the quantum dot light-emitting layer and the cathode can be deposited on the electron transport layer), and the deposition is in the reverse order (that is, the electron transport layer can be deposited On the cathode, the quantum dot light-emitting layer can be deposited on the electron transport layer, the hole transport layer can be deposited on the quantum dot light-emitting layer, the hole injection layer can be deposited on the hole transport layer, and the anode can be deposited on the The hole injection layer and the substrate may be deposited on the anode) are deposited in the order shown in FIG. 1 or the reverse order but omitting the formation of one of the layers shown therein and/or in another suitable order. Various suitable forms of deposition can be used, such as spin coating, vacuum deposition, printing, spraying, coil coating, dip coating, stamping and the like.

可採用多種適合基板。在一些實施例中,其可有利於基板具有光學透明度、包括一或多個光滑的表面、能夠易於處置及/或具有極好的防水性。在一些實施例中,基板包含玻璃及/或聚合物。適合聚合基板之非限制性實例包括聚對苯二甲酸伸乙酯基板及聚碳酸酯基板。Various suitable substrates can be used. In some embodiments, it can be beneficial for the substrate to have optical transparency, include one or more smooth surfaces, be easy to handle, and/or have excellent water resistance. In some embodiments, the substrate includes glass and/or polymer. Non-limiting examples of suitable polymeric substrates include polyethylene terephthalate substrates and polycarbonate substrates.

可採用多種適合陽極。在一些實施例中,陽極包含金屬及/或陶瓷。適合金屬之非限制性實例包括鎳(Ni)、鉑(Pt)、金(Au)、銀(Ag)及銥(Ir)。適合陶瓷之非限制性實例包括氧化銦錫(ITO)及氧化銦鋅(IZO)。A variety of suitable anodes can be used. In some embodiments, the anode includes metal and/or ceramic. Non-limiting examples of suitable metals include nickel (Ni), platinum (Pt), gold (Au), silver (Ag), and iridium (Ir). Non-limiting examples of suitable ceramics include indium tin oxide (ITO) and indium zinc oxide (IZO).

在一些實施例中,電洞注入層包括聚合物及/或陶瓷。適合類型之聚合物之非限制性實例包括聚(3,4-伸乙二氧基噻吩):聚苯乙烯對磺酸鹽(PEDOT:PSS)衍生物、PVK、聚(甲基丙烯酸甲酯) (PMMA)及/或聚苯乙烯。適合陶瓷之非限制性實例包括氧化物、氮化物、碳化物、硫化物、鹵鹽、檸檬酸鹽、亞硝酸鹽、磷酸鹽、硫氰酸鹽、碳酸氫鹽及硫化物鹽。適合氧化物之非限制性實例包括MoO3 、Al2 O3 、WO3 、V2 O5 、NiO、MgO、HfO2 、Ga2 O3 、Gd2 O3 、La2 O3 、SiO2 、ZrO2 、Y2 O3 、Ta2 O3 、TiO2 及BaO。適合氮化物之一個實例為Si3 N4 。適合碳化物之一個實例為SiC。適合硫化物之一個實例為ZnS。鹵鹽之適合陰離子之非限制性實例包括碘陰離子、溴陰離子、氯陰離子及氟陰離子。鹵鹽之適合陽離子之非限制性實例包括銅陽離子(例如鹵鹽可為CuI、CuBr、CuI及/或CuCl)、鹼金屬陽離子(例如鹵鹽可包含鋰陽離子及/或可包含LiF及/或LiCl)及鹼土金屬陽離子(例如鹵鹽可包含鎂陽離子及/或可包含MgF2 )。當量子點發光二極體包含兩個或多於兩個電洞注入層時,各電洞注入層可獨立地包含一或多個上文所描述之材料。In some embodiments, the hole injection layer includes polymer and/or ceramic. Non-limiting examples of suitable types of polymers include poly(3,4-ethylenedioxythiophene): polystyrene parasulfonate (PEDOT:PSS) derivatives, PVK, poly(methyl methacrylate) (PMMA) and/or polystyrene. Non-limiting examples of suitable ceramics include oxides, nitrides, carbides, sulfides, halide salts, citrates, nitrites, phosphates, thiocyanates, bicarbonates, and sulfide salts. Non-limiting examples of suitable oxides include MoO 3 , Al 2 O 3 , WO 3 , V 2 O 5 , NiO, MgO, HfO 2 , Ga 2 O 3 , Gd 2 O 3 , La 2 O 3 , SiO 2 , ZrO 2 , Y 2 O 3 , Ta 2 O 3 , TiO 2 and BaO. An example of a suitable nitride is Si 3 N 4 . An example of a suitable carbide is SiC. An example of a suitable sulfide is ZnS. Non-limiting examples of suitable anions for halide salts include iodide anion, bromide anion, chloride anion and fluoride anion. Non-limiting examples of suitable cations for halide salts include copper cations (e.g., halide salts can be CuI, CuBr, CuI, and/or CuCl), alkali metal cations (e.g., halide salts can include lithium cations and/or can include LiF and/or LiCl) and alkaline earth metal cations (for example, the halide salt may contain magnesium cations and/or may contain MgF 2 ). When the quantum dot light-emitting diode includes two or more hole injection layers, each hole injection layer may independently include one or more of the materials described above.

電洞傳遞層可包括聚合物、有機分子及/或陶瓷。適合聚合物之非限制性實例包括聚[(9,9-二辛基茀基-2,7-二基)-共-(4,4'-(N-(4-第二丁基苯基))二苯胺)] (TFB)、聚(9-乙烯基咔唑) (PVK)、聚(N,N'-雙(4-丁基苯基)-N,N'-雙(苯基)聯苯胺) (聚TPD)、聚[9-第二丁基-2,7-二氟-9H-氮雜芴] (PVF)、聚(9,9-二辛基茀基-2,7-二基) (PFO)、聚[(9,9-雙(3'-(N,N-二甲胺基)丙基)-2,7-茀)-交替-2,7-(9,9-二辛基茀)] (PFN-DOF)、聚[(9,9-雙(3'-((N,N-二甲基)-N-乙基銨)-丙基)-2,7-茀)-交替-2,7-(9,9-二辛基茀)] (PFNBr)、聚-N-乙烯基咔唑、聚苯乙炔、聚對苯、聚甲基丙烯酸酯衍生物、聚(9,9-辛基茀)、聚(螺-茀)、參(3-甲基苯基苯基胺基)三苯胺(間MTDATA)、聚[2-甲氧基-5-(2'-乙基己氧基)-1,4-苯乙炔] (MEH-PPV)及聚[2-甲氧基-5-(3',7'-二甲基辛氧基)-1,4-苯乙炔] (MDMO-PPV)。適合有機分子之非限制性實例包括TPD (N,N'-雙(3-甲基苯基)-N,N'-二苯基聯苯胺)、NPB (N,N'-二(1-萘基)-N,N'-二苯基-(1,1'-聯二苯)-4,4'-二胺)、4,4',4"-參(咔唑-9-基)三苯胺(TCTA)、4'-雙(咔唑-9-基)聯二苯(CBP)、3,3'-二(9H-咔唑-9-基)聯二苯(mCBP)及1,3-雙(咔唑-9-基)苯(mCP)。適合陶瓷之非限制性實例包括碘化銅(I) (CuI)、硫氰酸銅(I) (CuSCN)、鎵酸銅(CuGaO2 )及鋁酸銅(CuAlO2 )。當量子點發光二極體包含兩個或多於兩個電洞傳遞層時,各電洞傳遞層可獨立地包含上文所描述的材料中之一或多者。The hole transport layer may include polymers, organic molecules, and/or ceramics. Non-limiting examples of suitable polymers include poly((9,9-dioctylphenyl-2,7-diyl)-co-(4,4'-(N-(4-second butylphenyl) )) Diphenylamine)) (TFB), poly(9-vinylcarbazole) (PVK), poly(N,N'-bis(4-butylphenyl)-N,N'-bis(phenyl) Benzidine) (polyTPD), poly(9-second butyl-2,7-difluoro-9H-azafluorene) (PVF), poly(9,9-dioctyl phenylene-2,7- Diyl) (PFO), poly((9,9-bis(3'-(N,N-dimethylamino)propyl)-2,7-茀)-alternative-2,7-(9,9 -Dioctyl pyridium)] (PFN-DOF), poly[(9,9-bis(3'-((N,N-dimethyl)-N-ethylammonium)-propyl)-2,7 -茀)-alternate-2,7-(9,9-dioctyl 茀)] (PFNBr), poly-N-vinylcarbazole, polyphenylene vinylene, poly(p-phenylene), polymethacrylate derivatives, Poly(9,9-octyl 茀), poly (spiro-茀), ginseng (3-methylphenylphenylamino) triphenylamine (m-MTDATA), poly(2-methoxy-5-(2 '-Ethylhexyloxy)-1,4-phenylacetylene] (MEH-PPV) and poly[2-methoxy-5-(3',7'-dimethyloctyloxy)-1,4 -Phenylacetylene] (MDMO-PPV). Non-limiting examples of suitable organic molecules include TPD (N,N'-bis(3-methylphenyl)-N,N'-diphenylbenzidine), NPB (N,N'-bis(1-naphthalene) Group)-N,N'-diphenyl-(1,1'-biphenyl)-4,4'-diamine), 4,4',4"-ginseng (carbazol-9-yl) three Aniline (TCTA), 4'-bis(carbazol-9-yl)biphenyl (CBP), 3,3'-bis(9H-carbazol-9-yl)biphenyl (mCBP) and 1,3 -Bis(carbazol-9-yl)benzene (mCP). Non-limiting examples of suitable ceramics include copper iodide (I) (CuI), copper thiocyanate (I) (CuSCN), copper gallate (CuGaO 2 ) And copper aluminate (CuAlO 2 ). When the quantum dot light-emitting diode includes two or more hole transport layers, each hole transport layer can independently include one of the materials described above or More.

電洞傳遞層可具有多種適合形態。在一些實施例中,電洞傳遞層包含一或多種奈米粒子。此等奈米粒子可為結晶、非結晶、或部分結晶及部分非結晶。舉例而言,在一些實施例中,電洞傳遞層包含奈米晶體。當電洞傳遞層包含奈米粒子時,其可進一步包含一或多種圍繞及/或鈍化奈米粒子(例如封端奈米粒子)之配體。適合配體之非限制性實例包括油酸、1-十六硫醇、1-辛硫醇、1-十二硫醇、1-己硫醇、乙硫醇、丁硫醇、1-戊硫醇、1-丙硫醇、1,2-乙二硫醇、1,4-丁二硫醇、1,6-己二硫醇、1,8-辛二硫醇、1,10-癸二硫醇、矽烷(例如3-胺丙基三乙氧基矽烷、三乙氧基矽烷基丁醛、3-異氰酸酯基丙基三乙氧基矽烷、3-巰基丙基三甲氧基矽烷、11-氰基十一烷基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷及2-[甲氧基(聚伸乙基氧基)丙基]三甲氧基矽烷)、三乙氧基矽烷基十一醛及N-(三甲氧基矽烷基丙基)乙二胺三乙酸。當量子點發光二極體包含兩個或多於兩個包含奈米粒子之電洞傳遞層時,各電洞傳遞層可獨立地包含上文所描述的配體中之一或多者。The hole transport layer can have various suitable forms. In some embodiments, the hole transport layer includes one or more types of nanoparticles. These nanoparticles can be crystalline, non-crystalline, or partially crystalline and partially non-crystalline. For example, in some embodiments, the hole transport layer includes nanocrystals. When the hole transport layer includes nanoparticles, it may further include one or more ligands that surround and/or inactivate the nanoparticles (for example, capped nanoparticles). Non-limiting examples of suitable ligands include oleic acid, 1-hexadecyl mercaptan, 1-octyl mercaptan, 1-dodecane mercaptan, 1-hexyl mercaptan, ethyl mercaptan, butane mercaptan, 1-pentyl mercaptan Alcohol, 1-Propanethiol, 1,2-ethanedithiol, 1,4-butanedithiol, 1,6-hexanedithiol, 1,8-octandithiol, 1,10-decanedithiol Mercaptan, silane (e.g. 3-aminopropyltriethoxysilane, triethoxysilyl butyraldehyde, 3-isocyanatopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 11- Cyanoundecyltrimethoxysilane, 3-propenoxypropyltrimethoxysilane and 2-[methoxy(polyethyleneoxy)propyl]trimethoxysilane), triethoxy Silyl undecyl aldehyde and N-(trimethoxysilyl propyl) ethylene diamine triacetic acid. When the quantum dot light-emitting diode includes two or more hole transport layers containing nanoparticles, each hole transport layer may independently include one or more of the ligands described above.

當電洞傳遞層包含奈米粒子時,該等奈米粒子可具有多種適合直徑。在一些實施例中,電洞傳遞層包含平均直徑小於或等於200 nm、小於或等於150 nm、小於或等於100 nm、小於或等於75 nm、小於或等於50 nm、小於或等於25 nm、小於或等於10 nm、小於或等於5 nm或小於或等於2 nm之奈米粒子。電洞傳遞層可包含平均直徑大於或等於1 nm、大於或等於2 nm、大於或等於5 nm、大於或等於10 nm、大於或等於25 nm、大於或等於50 nm、大於或等於75 nm、大於或等於100 nm或大於或等於150 nm之奈米粒子。上文提及之範圍的組合亦為可能的(例如小於或等於200 nm且大於或等於1 nm)。其他範圍亦為可能的。奈米粒子之數目平均直徑可藉由電子顯微法測定。當量子點發光二極體包含兩個或多於兩個包含奈米粒子之電洞傳遞層時,各電洞傳遞層可獨立地包含平均直徑在上文所描述的範圍中之一或多者中的奈米粒子。When the hole transport layer contains nano particles, the nano particles can have various suitable diameters. In some embodiments, the hole transport layer includes an average diameter less than or equal to 200 nm, less than or equal to 150 nm, less than or equal to 100 nm, less than or equal to 75 nm, less than or equal to 50 nm, less than or equal to 25 nm, less than Nanoparticles of 10 nm or less, 5 nm or less or 2 nm or less. The hole transport layer may include an average diameter greater than or equal to 1 nm, greater than or equal to 2 nm, greater than or equal to 5 nm, greater than or equal to 10 nm, greater than or equal to 25 nm, greater than or equal to 50 nm, greater than or equal to 75 nm, Nanoparticles greater than or equal to 100 nm or greater than or equal to 150 nm. Combinations of the aforementioned ranges are also possible (for example, less than or equal to 200 nm and greater than or equal to 1 nm). Other ranges are also possible. The number and average diameter of nanoparticles can be determined by electron microscopy. When the quantum dot light-emitting diode includes two or more hole transport layers containing nanoparticles, each hole transport layer may independently include one or more of the average diameters in the above-described range Nanoparticles in the.

在一些實施例中,合乎需要的是電洞傳遞層相對薄。不希望受任何特定理論束縛,咸信較厚層相比於較薄層可展現增加之載子吸收損失。游離載子吸收損失可能不合需要地使得由量子點發光層發出之光在電洞傳遞層中再吸收而非由量子點發光二極體發出。電洞傳遞層之厚度可為小於或等於1微米、小於或等於750 nm、小於或等於500 nm、小於或等於250 nm、小於或等於100 nm、小於或等於75 nm、小於或等於50 nm、小於或等於25 nm、小於或等於10 nm、小於或等於5 nm或小於或等於2 nm。在一些實施例中,電洞傳遞層之厚度為大於或等於1 nm、大於或等於2 nm、大於或等於5 nm、大於或等於10 nm、大於或等於25 nm、大於或等於50 nm、大於或等於75 nm、大於或等於100 nm、大於或等於250 nm、大於或等於500 nm或大於或等於750 nm。上文提及之範圍的組合亦為可能的(例如小於或等於1微米且大於或等於1 nm)。其他範圍亦為可能的。電洞傳遞層之厚度可藉由電子顯微法量測。當量子點發光二極體包含兩個或多於兩個電洞傳遞層時,各電洞傳遞層可獨立地具有上文所描述的範圍中之一或多者之厚度。In some embodiments, it is desirable that the hole transport layer is relatively thin. Without wishing to be bound by any particular theory, it is believed that thicker layers can exhibit increased carrier absorption losses compared to thinner layers. The free carrier absorption loss may undesirably cause the light emitted by the quantum dot light-emitting layer to be reabsorbed in the hole transport layer instead of being emitted by the quantum dot light-emitting diode. The thickness of the hole transport layer can be less than or equal to 1 micron, less than or equal to 750 nm, less than or equal to 500 nm, less than or equal to 250 nm, less than or equal to 100 nm, less than or equal to 75 nm, less than or equal to 50 nm, Less than or equal to 25 nm, less than or equal to 10 nm, less than or equal to 5 nm, or less than or equal to 2 nm. In some embodiments, the thickness of the hole transport layer is greater than or equal to 1 nm, greater than or equal to 2 nm, greater than or equal to 5 nm, greater than or equal to 10 nm, greater than or equal to 25 nm, greater than or equal to 50 nm, greater than Or equal to 75 nm, greater than or equal to 100 nm, greater than or equal to 250 nm, greater than or equal to 500 nm, or greater than or equal to 750 nm. Combinations of the aforementioned ranges are also possible (for example, less than or equal to 1 micron and greater than or equal to 1 nm). Other ranges are also possible. The thickness of the hole transport layer can be measured by electron microscopy. When the quantum dot light emitting diode includes two or more hole transport layers, each hole transport layer can independently have a thickness of one or more of the above-described ranges.

電洞傳遞層可藉由多種適合方法製造。在一些實施例中,電洞傳遞層藉由包含奈米晶體之溶液合成之方法製造。可藉由例如旋塗、浸漬及/或噴塗至基板及/或量子點發光二極體之其他層上來將奈米晶體形成至層中。當量子點發光二極體包含兩個或多於兩個電洞傳遞層時,各電洞傳遞層可獨立地由上文所描述的方法中之一或多者製造。The hole transport layer can be manufactured by a variety of suitable methods. In some embodiments, the hole transport layer is manufactured by a solution synthesis method containing nanocrystals. Nano crystals can be formed into the layer by, for example, spin coating, dipping, and/or spraying onto the substrate and/or other layers of the quantum dot light-emitting diode. When the quantum dot light emitting diode includes two or more hole transport layers, each hole transport layer can be independently manufactured by one or more of the methods described above.

量子點發光層可包含多種適合類型之量子點。量子點可為奈米結晶,可為非結晶或可為部分結晶及部分非結晶。在一些實施例中,量子點發光層包含第II-VI族化合物半導體量子點,諸如第II-VI族化合物半導體奈米晶體量子點。適合第II-VI族化合物半導體奈米晶體量子點之非限制性實例包括包含CdS、CdSe、ZnS、ZnSe、HgS、HgSe及/或HgTe之彼等量子點。在一些實施例中,量子點發光層包含第III-V族化合物半導體量子點,諸如第III-V族化合物半導體奈米晶體量子點。適合第III-V族化合物半導體奈米晶體量子點之非限制性實例包括包含GaN、InN、AlN、GaP、GaAs、InP、GaSb、InSb、InAs及其合金之彼等量子點。在一些實施例中,量子點發光層包含第IV-VI族化合物半導體量子點,諸如第IV-VI族化合物半導體奈米晶體量子點。適合第IV-VI族化合物半導體奈米晶體量子點之非限制性實例包括包含PbS、PbSe及/或PbTe之彼等量子點。一些量子點可能不含Cd及/或實質上不含Cd (例如一些量子點可包含不含Cd之InP)。The quantum dot light-emitting layer may include various suitable types of quantum dots. Quantum dots can be nanocrystalline, non-crystalline, or partially crystalline and partially non-crystalline. In some embodiments, the quantum dot light-emitting layer includes group II-VI compound semiconductor quantum dots, such as group II-VI compound semiconductor nanocrystal quantum dots. Non-limiting examples of quantum dots suitable for group II-VI compound semiconductor nanocrystals include quantum dots including CdS, CdSe, ZnS, ZnSe, HgS, HgSe, and/or HgTe. In some embodiments, the quantum dot light-emitting layer includes III-V compound semiconductor quantum dots, such as III-V compound semiconductor nanocrystal quantum dots. Non-limiting examples of nanocrystalline quantum dots suitable for III-V compound semiconductors include quantum dots including GaN, InN, AlN, GaP, GaAs, InP, GaSb, InSb, InAs, and alloys thereof. In some embodiments, the quantum dot light-emitting layer includes group IV-VI compound semiconductor quantum dots, such as group IV-VI compound semiconductor nanocrystal quantum dots. Non-limiting examples of quantum dots suitable for group IV-VI compound semiconductor nanocrystals include quantum dots including PbS, PbSe and/or PbTe. Some quantum dots may be Cd-free and/or substantially Cd-free (for example, some quantum dots may include Cd-free InP).

量子點可具有均勻組成或可具有空間上變化之組成。舉例而言,在一些實施例中,量子點發光層包含核殼量子點(例如CdSe/ZnS核/殼、CdS/ZnSe核/殼、InP/ZnS核/殼及類似者)。核殼量子點可包含具有第一組成之核心及具有第二不同組成的圍繞核心之殼層。在一些此等實施例中,形成核之材料具有相對較小帶隙(例如CdSe、CdS等)且形成殼之材料具有相對較大帶隙(例如ZnS、ZnSe等)。藉助於實例,核殼量子點可具有包含CdSe及/或CdS之核及包含ZnS及/或ZnSe之殼。適合核殼量子點之其他實例描述於US 9,887,318中,該案出於所有目的以全文引用之方式併入本文中。Quantum dots may have a uniform composition or may have a spatially varying composition. For example, in some embodiments, the quantum dot light-emitting layer includes core-shell quantum dots (eg, CdSe/ZnS core/shell, CdS/ZnSe core/shell, InP/ZnS core/shell, and the like). The core-shell quantum dot may include a core having a first composition and a shell layer surrounding the core having a second different composition. In some of these embodiments, the material forming the core has a relatively small band gap (such as CdSe, CdS, etc.) and the material forming the shell has a relatively large band gap (such as ZnS, ZnSe, etc.). By way of example, a core-shell quantum dot may have a core including CdSe and/or CdS and a shell including ZnS and/or ZnSe. Other examples suitable for core-shell quantum dots are described in US 9,887,318, which is incorporated herein by reference in its entirety for all purposes.

本文所描述之量子點發光層中所採用的量子點可具有在數奈米至數百奈米範圍內之直徑。舉例而言,量子點發光層可包含平均直徑小於或等於200 nm、小於或等於150 nm、小於或等於100 nm、小於或等於75 nm、小於或等於50 nm、小於或等於25 nm、小於或等於10 nm、小於或等於5 nm或小於或等於2 nm之量子點。量子點發光層可包含平均直徑大於或等於1 nm、大於或等於2 nm、大於或等於5 nm、大於或等於10 nm、大於或等於25 nm、大於或等於50 nm、大於或等於75 nm、大於或等於100 nm或大於或等於150 nm之量子點。上文提及之範圍的組合亦為可能的(例如小於或等於200 nm且大於或等於1 nm)。其他範圍亦為可能的。量子點發光層中量子點之數目平均直徑可藉由電子顯微法測定。The quantum dots used in the quantum dot light-emitting layer described herein may have a diameter in the range of several nanometers to hundreds of nanometers. For example, the quantum dot light-emitting layer may include an average diameter of less than or equal to 200 nm, less than or equal to 150 nm, less than or equal to 100 nm, less than or equal to 75 nm, less than or equal to 50 nm, less than or equal to 25 nm, less than or equal to Quantum dots equal to 10 nm, less than or equal to 5 nm, or less than or equal to 2 nm. The quantum dot light-emitting layer may include an average diameter greater than or equal to 1 nm, greater than or equal to 2 nm, greater than or equal to 5 nm, greater than or equal to 10 nm, greater than or equal to 25 nm, greater than or equal to 50 nm, greater than or equal to 75 nm, Quantum dots greater than or equal to 100 nm or greater than or equal to 150 nm. Combinations of the aforementioned ranges are also possible (for example, less than or equal to 200 nm and greater than or equal to 1 nm). Other ranges are also possible. The average diameter of the number of quantum dots in the quantum dot light-emitting layer can be measured by electron microscopy.

本文所描述之量子點發光層中所採用的量子點可在多種適合波長下發光。舉例而言,量子點發光層可包含發出紫外光、可見光及/或紅外光之量子點。若光為可見光,則其可為多種適合顏色。藉助於實例,在一些實施例中,量子點發光層包含發出紅光、橙光、黃光、綠光、藍光、靛藍光或紫光之量子點。在一些實施例中,量子點發光層包含在大於或等於100 nm、大於或等於150 nm、大於或等於200 nm、大於或等於250 nm、大於或等於300 nm、大於或等於350 nm、大於或等於400 nm、大於或等於450 nm、大於或等於500 nm、大於或等於550 nm、大於或等於600 nm、大於或等於650 nm、大於或等於700 nm、大於或等於750 nm、大於或等於800 nm、大於或等於850 nm、大於或等於900 nm、大於或等於950 nm、大於或等於1微米、大於或等於1.5微米、大於或等於2微米、大於或等於2.5微米、大於或等於3微米、大於或等於3.5微米、大於或等於4微米或大於或等於4.5微米之波長下發光之量子點。在一些實施例中,量子點發光層包含在小於或等於5微米、小於或等於4.5微米、小於或等於4微米、小於或等於3.5微米、小於或等於3微米、小於或等於2.5微米、小於或等於2微米、小於或等於1.5微米、小於或等於1微米、小於或等於950 nm、小於或等於900 nm、小於或等於850 nm、小於或等於800 nm、小於或等於750 nm、小於或等於700 nm、小於或等於650 nm、小於或等於600 nm、小於或等於550 nm、小於或等於500 nm、小於或等於450 nm、小於或等於400 nm、小於或等於350 nm、小於或等於300 nm、小於或等於250 nm、小於或等於200 nm或小於或等於150 nm之波長下發光之量子點。上文提及之範圍之組合亦為可能的(例如大於或等於100 nm且小於或等於5微米)。其他範圍亦為可能的。由量子點發光層發出之波長可藉由使用UV-vis-IR光譜法測定。The quantum dots used in the quantum dot light-emitting layer described herein can emit light at a variety of suitable wavelengths. For example, the quantum dot light-emitting layer may include quantum dots emitting ultraviolet light, visible light, and/or infrared light. If the light is visible light, it can be a variety of suitable colors. By way of example, in some embodiments, the quantum dot light-emitting layer includes quantum dots that emit red light, orange light, yellow light, green light, blue light, indigo blue light, or violet light. In some embodiments, the quantum dot light-emitting layer is contained in a light emitting layer greater than or equal to 100 nm, greater than or equal to 150 nm, greater than or equal to 200 nm, greater than or equal to 250 nm, greater than or equal to 300 nm, greater than or equal to 350 nm, greater than or equal to Equal to 400 nm, greater than or equal to 450 nm, greater than or equal to 500 nm, greater than or equal to 550 nm, greater than or equal to 600 nm, greater than or equal to 650 nm, greater than or equal to 700 nm, greater than or equal to 750 nm, greater than or equal to 800 nm, greater than or equal to 850 nm, greater than or equal to 900 nm, greater than or equal to 950 nm, greater than or equal to 1 micron, greater than or equal to 1.5 microns, greater than or equal to 2 microns, greater than or equal to 2.5 microns, greater than or equal to 3 microns, Quantum dots that emit light at wavelengths greater than or equal to 3.5 microns, greater than or equal to 4 microns, or greater than or equal to 4.5 microns. In some embodiments, the quantum dot light-emitting layer is contained within 5 microns or less, 4.5 microns or less, 4 microns or less, 3.5 microns or less, 3 microns or less, 2.5 microns or less, or Equal to 2 microns, less than or equal to 1.5 microns, less than or equal to 1 micron, less than or equal to 950 nm, less than or equal to 900 nm, less than or equal to 850 nm, less than or equal to 800 nm, less than or equal to 750 nm, less than or equal to 700 nm, less than or equal to 650 nm, less than or equal to 600 nm, less than or equal to 550 nm, less than or equal to 500 nm, less than or equal to 450 nm, less than or equal to 400 nm, less than or equal to 350 nm, less than or equal to 300 nm, Quantum dots that emit light at wavelengths less than or equal to 250 nm, less than or equal to 200 nm, or less than or equal to 150 nm. Combinations of the ranges mentioned above are also possible (for example, greater than or equal to 100 nm and less than or equal to 5 microns). Other ranges are also possible. The wavelength emitted by the quantum dot light-emitting layer can be measured by using UV-vis-IR spectroscopy.

如上文所描述,本文所描述之量子點發光二極體可包含摻雜ZnO電子傳遞層。電子傳遞層可包含多種適合摻雜物。在一些實施例中,電子傳遞層包含n型摻雜物。不希望受任何特定理論束縛,咸信此等摻雜物可有利地減小電子傳遞層之費米(Fermi)能量及功函數。咸信此減少可有助於通過其之電子傳遞且可引起形成電子傳遞層與量子點發光層之間的歐姆接觸,其可藉由提供更多電子至量子點發光層,增大發光二極體之量子之電荷重組效率。適合摻雜物之非限制性實例包括第1族摻雜物(例如Li、Na、K、Rb及/或Cs)、第2族摻雜物(例如Be、Mg、Ca、Sr及/或Ba)、第3族摻雜物(例如Sc、Y及/或La)、第4族摻雜物(例如Ti、Zr及/或Hf)、第5族摻雜物(例如V、Nb及/或Ta)、第6族摻雜物(例如Cr、Mo及/或W)、第7族摻雜物(例如Mn、Tc及/或Re)、第8族摻雜物(例如Fe、Ru及/或Os)、第9族摻雜物(例如Co、Rh及/或Ir)、第13族摻雜物(例如B、Al、Ga、In及/或Tl)、第14族摻雜物(例如C、Si、Ge、Sn及/或Pb)及/或第17族摻雜物(例如F、Cl、Br及/或I)。應理解一些電子傳遞層可恰好包含一種類型之摻雜物,而一些電子傳遞層可包含多於一種類型之摻雜物。在此等情況下,各摻雜物可獨立地為上文所列之摻雜物中之一者。As described above, the quantum dot light-emitting diode described herein may include a doped ZnO electron transport layer. The electron transport layer may contain various suitable dopants. In some embodiments, the electron transport layer includes n-type dopants. Without wishing to be bound by any particular theory, it is believed that these dopants can advantageously reduce the Fermi energy and work function of the electron transport layer. It is believed that this reduction can help electron transfer through it and can cause the formation of ohmic contact between the electron transfer layer and the quantum dot light-emitting layer, which can increase the light-emitting diode by providing more electrons to the quantum dot light-emitting layer The charge recombination efficiency of the quantum of the body. Non-limiting examples of suitable dopants include group 1 dopants (e.g., Li, Na, K, Rb, and/or Cs), group 2 dopants (e.g., Be, Mg, Ca, Sr, and/or Ba ), Group 3 dopants (such as Sc, Y and/or La), Group 4 dopants (such as Ti, Zr and/or Hf), Group 5 dopants (such as V, Nb and/or Ta), Group 6 dopants (e.g. Cr, Mo and/or W), Group 7 dopants (e.g. Mn, Tc and/or Re), Group 8 dopants (e.g. Fe, Ru and/or Or Os), Group 9 dopants (e.g. Co, Rh and/or Ir), Group 13 dopants (e.g. B, Al, Ga, In and/or Tl), Group 14 dopants (e.g. C, Si, Ge, Sn and/or Pb) and/or Group 17 dopants (for example, F, Cl, Br and/or I). It should be understood that some electron transport layers may contain exactly one type of dopant, and some electron transport layers may contain more than one type of dopant. In these cases, each dopant may independently be one of the dopants listed above.

當電子傳遞層包含摻雜ZnO時,摻雜ZnO可包含多種適合量之摻雜物。在一些實施例中,摻雜ZnO包含一定量之摻雜物以使得摻雜物與Zn之比率大於或等於0.001、大於或等於0.002、大於或等於0.005、大於或等於0.0075、大於或等於0.01、大於或等於0.02、大於或等於0.05、大於或等於0.075、大於或等於0.1、大於或等於0.2、大於或等於0.3、或大於或等於0.4。在一些實施例中,摻雜ZnO包含一定量之摻雜物以使得摻雜物與Zn之比率小於或等於0.5、小於或等於0.4、小於或等於0.3、小於或等於0.2、小於或等於0.1、小於或等於0.075、小於或等於0.05、小於或等於0.02、小於或等於0.01、小於或等於0.0075、小於或等於0.005或小於或等於0.002。上文提及之範圍的組合亦為可能的(例如大於或等於0.001且小於或等於約0.5)。當電子傳遞層包含有包含多於一種摻雜物之ZnO時,各摻雜物與Zn之比率可獨立地在上文所描述的範圍中之一或多者中。相似地,電子傳遞層中所有摻雜物之總量與Zn之比率可處於上文所描述的範圍中之一或多者內。When the electron transport layer contains doped ZnO, the doped ZnO may contain various appropriate amounts of dopants. In some embodiments, the doped ZnO includes a certain amount of dopant such that the ratio of dopant to Zn is greater than or equal to 0.001, greater than or equal to 0.002, greater than or equal to 0.005, greater than or equal to 0.0075, greater than or equal to 0.01, Greater than or equal to 0.02, greater than or equal to 0.05, greater than or equal to 0.075, greater than or equal to 0.1, greater than or equal to 0.2, greater than or equal to 0.3, or greater than or equal to 0.4. In some embodiments, the doped ZnO includes a certain amount of dopant such that the ratio of dopant to Zn is less than or equal to 0.5, less than or equal to 0.4, less than or equal to 0.3, less than or equal to 0.2, less than or equal to 0.1, Less than or equal to 0.075, less than or equal to 0.05, less than or equal to 0.02, less than or equal to 0.01, less than or equal to 0.0075, less than or equal to 0.005, or less than or equal to 0.002. Combinations of the aforementioned ranges are also possible (for example, greater than or equal to 0.001 and less than or equal to about 0.5). When the electron transport layer includes ZnO including more than one dopant, the ratio of each dopant to Zn may independently be in one or more of the ranges described above. Similarly, the ratio of the total amount of all dopants in the electron transport layer to Zn can be within one or more of the ranges described above.

亦應理解一些實施例可能關於包含未摻雜ZnO之電子傳遞層。此等電子傳遞層可進一步包含摻雜ZnO或可缺少摻雜ZnO。在一些實施例中,量子點發光二極體包含一個包含摻雜ZnO之電子傳遞層且進一步包含第二電子傳遞層,該第二電子傳遞層包含未摻雜ZnO。若量子點發光二極體包含兩個包含摻雜ZnO之電子傳遞層,則兩層可包含相同類型之摻雜ZnO及/或可包含不同類型之摻雜ZnO (例如包含不同摻雜物、摻雜物之不同組合及/或不同量之一或多種摻雜物的ZnO)。電子傳遞層可具有多種適合形態。在一些實施例中,電子傳遞層包含一或多種奈米粒子(例如一或多種包含摻雜ZnO之奈米粒子、一或多種包含未摻雜ZnO之奈米粒子)。此等奈米粒子可為結晶、非結晶、或部分結晶及部分非結晶。當電子傳遞層包含奈米粒子時,其可進一步包含一或多種圍繞及/或鈍化奈米粒子(例如封端奈米粒子)之配體。適合配體之非限制性實例包括油酸、1-十六硫醇、1-辛硫醇、1-十二硫醇、1-己硫醇、乙硫醇、丁硫醇、1-戊硫醇、1-丙硫醇、1,2-乙二硫醇、1,4-丁二硫醇、1,6-己二硫醇、1,8-辛二硫醇、1,10-癸二硫醇、3-巰基丙酸、4-巰基苯甲酸、苯甲酸、苯甲胺、矽烷(例如3-胺丙基三乙氧基矽烷、三乙氧基矽烷基丁醛、3-異氰酸酯基丙基三乙氧基矽烷、3-巰基丙基三甲氧基矽烷、11-氰基十一烷基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、三乙氧基矽烷基十一醛、N-(三甲氧基矽烷基丙基)乙二胺三乙酸、2-[甲氧基(聚伸乙基氧基)丙基]三甲氧基矽烷及正矽酸四乙酯)及腺苷5'-單磷酸酯。當量子點發光二極體包含兩個或多於兩個包含奈米粒子之電子傳遞層時,各電子傳遞層可獨立地包含上文所描述的配體中之一或多者。It should also be understood that some embodiments may relate to an electron transport layer containing undoped ZnO. These electron transport layers may further include doped ZnO or may lack doped ZnO. In some embodiments, the quantum dot light-emitting diode includes an electron transport layer including doped ZnO and further includes a second electron transport layer, and the second electron transport layer includes undoped ZnO. If the quantum dot light-emitting diode contains two electron transport layers containing doped ZnO, the two layers may contain the same type of doped ZnO and/or may contain different types of doped ZnO (for example, containing different dopants, doped Different combinations of impurities and/or different amounts of one or more dopants of ZnO). The electron transport layer can have various suitable forms. In some embodiments, the electron transport layer includes one or more nanoparticles (for example, one or more nanoparticles containing doped ZnO, one or more nanoparticles containing undoped ZnO). These nanoparticles can be crystalline, non-crystalline, or partially crystalline and partially non-crystalline. When the electron transport layer includes nanoparticles, it may further include one or more ligands that surround and/or inactivate the nanoparticles (for example, capped nanoparticles). Non-limiting examples of suitable ligands include oleic acid, 1-hexadecyl mercaptan, 1-octyl mercaptan, 1-dodecane mercaptan, 1-hexyl mercaptan, ethyl mercaptan, butane mercaptan, 1-pentyl mercaptan Alcohol, 1-Propanethiol, 1,2-ethanedithiol, 1,4-butanedithiol, 1,6-hexanedithiol, 1,8-octandithiol, 1,10-decanedithiol Mercaptan, 3-mercaptopropionic acid, 4-mercaptobenzoic acid, benzoic acid, benzylamine, silane (e.g. 3-aminopropyltriethoxysilane, triethoxysilyl butyraldehyde, 3-isocyanate propyl Triethoxysilane, 3-mercaptopropyltrimethoxysilane, 11-cyanoundecyltrimethoxysilane, 3-propenyloxypropyltrimethoxysilane, triethoxysilane ten Monoaldehyde, N-(trimethoxysilylpropyl)ethylenediaminetriacetic acid, 2-[methoxy(polyethyleneoxy)propyl]trimethoxysilane and tetraethylorthosilicate) and Adenosine 5'-monophosphate. When the quantum dot light-emitting diode includes two or more electron transport layers including nanoparticle, each electron transport layer may independently include one or more of the ligands described above.

當電子傳遞層包含奈米粒子時,該等奈米粒子可具有多種適合直徑。在一些實施例中,電子傳遞層包含平均直徑小於或等於200 nm、小於或等於150 nm、小於或等於100 nm、小於或等於75 nm、小於或等於50 nm、小於或等於25 nm、小於或等於10 nm、小於或等於5 nm或小於或等於2 nm之奈米粒子。電子傳遞層可包含平均直徑大於或等於1 nm、大於或等於2 nm、大於或等於5 nm、大於或等於10 nm、大於或等於25 nm、大於或等於50 nm、大於或等於75 nm、大於或等於100 nm或大於或等於150 nm之奈米粒子。上文提及之範圍之組合亦為可能的(例如小於或等於200 nm且大於或等於1 nm,或小於或等於5 nm且大於或等於1 nm)。其他範圍亦為可能的。奈米粒子之數目平均直徑可藉由電子顯微法測定。When the electron transport layer contains nano particles, the nano particles can have various suitable diameters. In some embodiments, the electron transport layer includes an average diameter less than or equal to 200 nm, less than or equal to 150 nm, less than or equal to 100 nm, less than or equal to 75 nm, less than or equal to 50 nm, less than or equal to 25 nm, less than or equal to Nanoparticles equal to 10 nm, less than or equal to 5 nm, or less than or equal to 2 nm. The electron transport layer can include an average diameter greater than or equal to 1 nm, greater than or equal to 2 nm, greater than or equal to 5 nm, greater than or equal to 10 nm, greater than or equal to 25 nm, greater than or equal to 50 nm, greater than or equal to 75 nm, greater than Nanoparticles of 100 nm or greater or 150 nm. Combinations of the aforementioned ranges are also possible (for example, less than or equal to 200 nm and greater than or equal to 1 nm, or less than or equal to 5 nm and greater than or equal to 1 nm). Other ranges are also possible. The number and average diameter of nanoparticles can be determined by electron microscopy.

當電子傳遞層包含兩個或多於兩個類型之奈米粒子時,各類型的奈米粒子之直徑可獨立地在上文所列之範圍中之一或多者中及/或電子傳遞層中所有奈米粒子一起之直徑可在上文所列之範圍中之一或多者中。相似地,當量子點發光二極體包含兩個或多於兩個包含奈米粒子之電子傳遞層時,各電子傳遞層可獨立地具有前述句子中所描述的特性。When the electron transport layer contains two or more types of nanoparticle, the diameter of each type of nanoparticle can independently be in one or more of the ranges listed above and/or the electron transport layer The diameter of all the nanoparticles together can be in one or more of the ranges listed above. Similarly, when the quantum dot light-emitting diode contains two or more electron transport layers containing nanoparticles, each electron transport layer can independently have the characteristics described in the preceding sentence.

本文所描述之陰極中可採用多種適合材料。在一些實施例中,其有利於陰極具有相對低的功函數,可有助於將電子注入電子傳遞層及/或注入電子注入層。陰極之功函數可為例如小於或等於4.8 eV、小於或等於4.6 eV、小於或等於4.4 eV、小於或等於4.2 eV、小於或等於3.9 eV、小於或等於3.7 eV、小於或等於3.5 eV、小於或等於3.2 eV、小於或等於3 eV、小於或等於2.8 eV、小於或等於2.6 eV、小於或等於2.4 eV、小於或等於2.2 eV、小於或等於2 eV或小於或等於1.8 eV。陰極之功函數可大於或等於1.5 eV、大於或等於1.8 eV、大於或等於2 eV、大於或等於2.2 eV、大於或等於2.4 eV、大於或等於2.6 eV、大於或等於2.8 eV、大於或等於3 eV、大於或等於3.2 eV、大於或等於3.5 eV、大於或等於3.7 eV、大於或等於3.9 eV、大於或等於4.2 eV、大於或等於4.4 eV或大於或等於4.6 eV。上文提及之範圍之組合亦為可能的(例如小於或等於4.8 eV且大於或等於1.5 eV,小於或等於3.9 eV且大於或等於1.5 eV)。其他範圍亦為可能的。A variety of suitable materials can be used in the cathode described herein. In some embodiments, it is advantageous for the cathode to have a relatively low work function, and can facilitate injection of electrons into the electron transport layer and/or into the electron injection layer. The work function of the cathode can be, for example, less than or equal to 4.8 eV, less than or equal to 4.6 eV, less than or equal to 4.4 eV, less than or equal to 4.2 eV, less than or equal to 3.9 eV, less than or equal to 3.7 eV, less than or equal to 3.5 eV, less than 3.2 eV or less, 3 eV or less, 2.8 eV or less, 2.6 eV or less, 2.4 eV or less, 2.2 eV or less, 2 eV or less or 1.8 eV or less. The work function of the cathode can be greater than or equal to 1.5 eV, greater than or equal to 1.8 eV, greater than or equal to 2 eV, greater than or equal to 2.2 eV, greater than or equal to 2.4 eV, greater than or equal to 2.6 eV, greater than or equal to 2.8 eV, greater than or equal to 3 eV, greater than or equal to 3.2 eV, greater than or equal to 3.5 eV, greater than or equal to 3.7 eV, greater than or equal to 3.9 eV, greater than or equal to 4.2 eV, greater than or equal to 4.4 eV or greater than or equal to 4.6 eV. Combinations of the aforementioned ranges are also possible (for example, less than or equal to 4.8 eV and greater than or equal to 1.5 eV, less than or equal to 3.9 eV and greater than or equal to 1.5 eV). Other ranges are also possible.

在一些實施例中,陰極包含具有低功函數之金屬及/或金屬合金,諸如Ca、Cs、Ba、Al、Mg、Ag及/或其合金。在一些實施例中,陰極包含具有低功函數之氧化物,諸如ITO。陰極中可包括之材料類型之其他實例包括鹼金屬鹽、鹵鹽及鹼金屬鹵鹽(例如LiF)。陰極可包含兩種材料之組合,其中至少一種具有低功函數,諸如Ca與Al之組合、LiF與Ca之組合及/或LiF與Al之組合。In some embodiments, the cathode includes metals and/or metal alloys with low work functions, such as Ca, Cs, Ba, Al, Mg, Ag, and/or alloys thereof. In some embodiments, the cathode includes an oxide having a low work function, such as ITO. Other examples of the types of materials that can be included in the cathode include alkali metal salts, halide salts, and alkali metal halide salts (such as LiF). The cathode may include a combination of two materials, at least one of which has a low work function, such as a combination of Ca and Al, a combination of LiF and Ca, and/or a combination of LiF and Al.

本文所描述之量子點發光二極體可包封於樹脂中。舉例而言,本文所描述之一些量子點發光二極體可包封於可UV固化樹脂中。在一些實施例中,樹脂包含不飽和羧酸(例如丙烯酸、甲基丙烯酸、苯甲酸、3-丁烯酸、巴豆酸)及/或促進經包封QD-LED之正向老化的另一適合物種。適合樹脂之非限制性實例包括美國專利第9,780,256號(出於所有目的將其以全文引用的方式併入本文中)中所描述的彼等樹脂。The quantum dot light-emitting diode described herein can be encapsulated in resin. For example, some of the quantum dot light-emitting diodes described herein can be encapsulated in a UV curable resin. In some embodiments, the resin includes unsaturated carboxylic acid (such as acrylic acid, methacrylic acid, benzoic acid, 3-butenoic acid, crotonic acid) and/or another suitable for promoting the positive aging of the encapsulated QD-LED Species. Non-limiting examples of suitable resins include those resins described in US Patent No. 9,780,256 (which is incorporated herein by reference in its entirety for all purposes).

在一些實施例中,本文所描述之一或多個層,諸如電子傳遞層、量子點發光層、電洞傳遞層或其他層,可藉由溶液塗佈製程沈積。適合溶液塗佈製程之非限制性實例包括溶膠-凝膠塗佈、旋塗、列印、鑄造、衝壓、浸塗、捲塗(roll-to-roll coating)及/或噴塗。在一些實施例中,溶液塗佈製程可為所期望的,因為其可能比形成薄膜之其他方法成本更低及/或可在比形成薄膜之其他方法更低溫度下執行。溶液塗佈製程期間所採用的流體可為包含如上文所描述之前驅物材料及分散溶劑之分散液。分散溶劑可包含水性溶劑(諸如水)及/或有機溶劑(諸如醇)。適合醇之非限制性實例包括異丙醇、乙醇、甲醇、丁醇、戊醇、鯨蠟醇及/或2-甲氧基乙醇。In some embodiments, one or more of the layers described herein, such as an electron transport layer, a quantum dot light-emitting layer, a hole transport layer, or other layers, can be deposited by a solution coating process. Non-limiting examples of suitable solution coating processes include sol-gel coating, spin coating, printing, casting, stamping, dip coating, roll-to-roll coating and/or spray coating. In some embodiments, the solution coating process may be desirable because it may be less costly than other methods of forming thin films and/or may be performed at a lower temperature than other methods of forming thin films. The fluid used during the solution coating process can be a dispersion containing the precursor material and the dispersion solvent as described above. The dispersion solvent may include an aqueous solvent (such as water) and/or an organic solvent (such as alcohol). Non-limiting examples of suitable alcohols include isopropanol, ethanol, methanol, butanol, pentanol, cetyl alcohol, and/or 2-methoxyethanol.

在沈積之後,可使膜在70℃至200℃下在氮氣、氬氣、氦氣、空氣及/或氧氣中退火。After deposition, the film can be annealed in nitrogen, argon, helium, air, and/or oxygen at 70°C to 200°C.

熱退火可包含將所沈積前驅物加熱至高於或等於50℃、高於或等於75℃、高於或等於100℃、高於或等於125℃、高於或等於150℃或高於或等於175℃之溫度。熱分解可包含將所沈積前驅物加熱至低於或等於200℃、低於或等於175℃、低於或等於150℃、低於或等於125℃、低於或等於100℃或低於或等於75℃之溫度。上文提及之範圍的組合亦為可能的(例如高於或等於50℃且低於或等於200℃)。其他範圍亦為可能的。Thermal annealing may include heating the deposited precursor to a temperature higher than or equal to 50°C, higher than or equal to 75°C, higher than or equal to 100°C, higher than or equal to 125°C, higher than or equal to 150°C, or higher than or equal to 175°C The temperature of ℃. Thermal decomposition may include heating the deposited precursor to less than or equal to 200°C, less than or equal to 175°C, less than or equal to 150°C, less than or equal to 125°C, less than or equal to 100°C or less than or equal to The temperature is 75°C. Combinations of the ranges mentioned above are also possible (for example, higher than or equal to 50°C and lower than or equal to 200°C). Other ranges are also possible.

熱退火可包含將所沈積前驅物加熱至上文提及之範圍中之一或多者中的溫度持續大於或等於1 min、大於或等於2 min、大於或等於5 min、大於或等於10 min、大於或等於20 min、大於或等於30 min、大於或等於1小時、大於或等於2小時、大於或等於5小時、大於或等於10小時、大於或等於20小時或大於或等於50小時之時間段。熱分解可包含將所沈積前驅物加熱至上文提及之範圍中之一或多者中的溫度持續小於或等於100小時、小於或等於50小時、小於或等於20小時、小於或等於10小時、小於或等於5小時、小於或等於2小時、小於或等於1小時、小於或等於30 min、小於或等於20 min、小於或等於10 min、小於或等於5 min或小於或等於2 min之時間段。上文提及之範圍的組合亦為可能的(例如小於或等於1 min且大於或等於1小時)。其他範圍亦為可能的。Thermal annealing may include heating the deposited precursor to a temperature in one or more of the above-mentioned ranges for greater than or equal to 1 min, greater than or equal to 2 min, greater than or equal to 5 min, greater than or equal to 10 min, Time period greater than or equal to 20 minutes, greater than or equal to 30 minutes, greater than or equal to 1 hour, greater than or equal to 2 hours, greater than or equal to 5 hours, greater than or equal to 10 hours, greater than or equal to 20 hours, or greater than or equal to 50 hours . Thermal decomposition may include heating the deposited precursor to a temperature in one or more of the above-mentioned ranges for less than or equal to 100 hours, less than or equal to 50 hours, less than or equal to 20 hours, less than or equal to 10 hours, Time period less than or equal to 5 hours, less than or equal to 2 hours, less than or equal to 1 hour, less than or equal to 30 min, less than or equal to 20 min, less than or equal to 10 min, less than or equal to 5 min or less than or equal to 2 min . Combinations of the aforementioned ranges are also possible (for example, less than or equal to 1 min and greater than or equal to 1 hour). Other ranges are also possible.

如本文所描述之熱退火可在氮氣、氬氣、氦氣、空氣及/或氧氣存在下進行。The thermal annealing as described herein can be performed in the presence of nitrogen, argon, helium, air, and/or oxygen.

藉由以下實例可更好地瞭解一些實施例之其他態樣及其優勢。 實例The following examples can better understand other aspects and advantages of some embodiments. Instance

現將參考以下實例更詳細描述本發明。然而,本文所描述之實例僅出於解釋之目的且並不意欲以任何方式限制本發明教示之範疇。 比較實例1The present invention will now be described in more detail with reference to the following examples. However, the examples described herein are for explanatory purposes only and are not intended to limit the scope of the teachings of the present invention in any way. Comparative example 1

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm分別旋塗60 s及30 s將量子點及未摻雜ZnO奈米晶體依序沈積至TFB上。未摻雜ZnO奈米晶體之平均直徑小於5 nm。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至未摻雜ZnO奈米晶體上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。 實例1The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The quantum dots and undoped ZnO nanocrystals were sequentially deposited on the TFB by spin coating at 2000 rpm for 60 s and 30 s, respectively. The average diameter of undoped ZnO nanocrystals is less than 5 nm. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the undoped ZnO nanocrystal through a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide. Example 1

製備三種不同量子點發光二極體,各自包含電子傳遞層,電子傳遞層包含摻雜有不同類型之摻雜物的ZnO奈米晶體。一種量子點發光二極體包含有包含摻雜有5 mol% Cs之ZnO奈米晶體的電子傳遞層,一種量子點發光二極體包含有包含摻雜有10 mol% Mg之ZnO奈米晶體的電子傳遞層,及一種量子點發光二極體包含有包含摻雜有5 mol% Ga之ZnO奈米晶體的電子傳遞層。各量子點發光二極體均藉由遵循下文段落中所描述的程序來製造。Prepare three different quantum dot light-emitting diodes, each containing an electron transport layer, which contains ZnO nanocrystals doped with different types of dopants. A quantum dot light-emitting diode contains an electron transport layer containing ZnO nanocrystals doped with 5 mol% Cs, and a quantum dot light-emitting diode contains an electron transport layer containing ZnO nanocrystals doped with 10 mol% Mg The electron transport layer and a quantum dot light emitting diode include an electron transport layer containing ZnO nanocrystals doped with 5 mol% Ga. Each quantum dot light-emitting diode is manufactured by following the procedure described in the following paragraphs.

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm分別旋塗60 s及30 s將量子點及摻雜ZnO奈米晶體依序沈積至TFB上。摻雜ZnO奈米晶體之平均直徑在比較實例1之未摻雜ZnO奈米晶體之平均直徑的10%以內。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至氧化鋁奈米粒子上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The quantum dots and doped ZnO nanocrystals were sequentially deposited on the TFB by spin coating at 2000 rpm for 60 s and 30 s, respectively. The average diameter of the doped ZnO nanocrystals is within 10% of the average diameter of the undoped ZnO nanocrystals of Comparative Example 1. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the alumina nanoparticle via a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide.

圖2展示實例1及比較實例1之電流密度隨電壓而變。具有圓形、三角形及菱形之實線展示來自實例1之資料且具有正方形之實線展示來自比較實例1之資料。實例1具有比比較實例1低之洩漏電流且比比較實例1穩定得多,而實例1之總電阻與比較實例1相似。此改良可歸因於由於在兩種材料之間形成歐姆接觸而減小Al陰極與ZnO電子傳遞層之間的注入障壁。Al陰極與摻雜ZnO電子傳遞層之間的歐姆接觸指示摻雜ZnO電子傳遞層之傳導帶具有接近量子點發光層之傳導帶之能量的能量。咸信此引起摻雜ZnO電子傳遞層中之電子有效注入至量子點發光層之傳遞帶中。不希望受任何特定理論束縛,咸信ZnO中之費米能量可根據

Figure 02_image001
自標稱摻雜密度提取,其中Ei 為ZnO之固有費米能量;k 為波茲曼常數;T 為溫度;及Nd / a 為標稱供體/受體摻雜密度。方程式假設所有供體/受體均離子化,其對於此實例中所描述的電子傳遞層之摻雜水平之範圍而言為合理的。當電子傳遞層摻雜至足夠程度時,咸信所添加電子由摻雜物提供且相關聯之降低的費米能量引起摻雜ZnO電子傳遞層中之電子直接注入至量子點發光層之傳導帶。咸信此直接注入有利地截獲存在於量子點發光層中之界面缺損。Figure 2 shows the current density of Example 1 and Comparative Example 1 as a function of voltage. The solid lines with circles, triangles, and diamonds show the data from Example 1 and the solid lines with squares show the data from Comparative Example 1. Example 1 has a lower leakage current than Comparative Example 1 and is much more stable than Comparative Example 1, and the total resistance of Example 1 is similar to Comparative Example 1. This improvement can be attributed to the reduction of the injection barrier between the Al cathode and the ZnO electron transport layer due to the formation of ohmic contacts between the two materials. The ohmic contact between the Al cathode and the doped ZnO electron transport layer indicates that the conduction band of the doped ZnO electron transport layer has an energy close to the energy of the conduction band of the quantum dot light-emitting layer. It is believed that this causes the electrons in the doped ZnO electron transport layer to be effectively injected into the transport band of the quantum dot light-emitting layer. Without wishing to be bound by any specific theory, it is believed that the Fermi energy in ZnO can be based on
Figure 02_image001
Extracted from the nominal doping density, where E i is the intrinsic Fermi energy of ZnO; k is the Boltzmann constant; T is the temperature; and N d / a is the nominal donor/acceptor doping density. The equation assumes that all donors/acceptors are ionized, which is reasonable for the range of doping levels of the electron transport layer described in this example. When the electron transport layer is doped to a sufficient degree, it is believed that the added electrons are provided by the dopant and the associated reduced Fermi energy causes the electrons in the doped ZnO electron transport layer to be directly injected into the conduction band of the quantum dot light-emitting layer . It is believed that this direct injection advantageously intercepts the interface defects existing in the quantum dot light-emitting layer.

圖3展示實例1及比較實例1之電流效率(CE)隨亮度而變及圖4展示實例1及比較實例1之外部量子效率(EQE)隨亮度而變。具有圓形、三角形及菱形之實線展示來自實例1之資料且具有正方形之實線展示來自比較實例1之資料。實例1之CE比比較實例1之CE高得多。另外,實例1之峰值外部量子效率高於比較實例1之峰值外部量子效率。因為實例1及比較實例1具有相對低水平之洩漏電流,咸信實例1之高CE及高峰值外部量子效率由減小的費米能量及所得減小的摻雜ZnO電子傳遞層與量子點發光層之間的注入障壁而產生。FIG. 3 shows the current efficiency (CE) of Example 1 and Comparative Example 1 as a function of brightness and FIG. 4 shows the external quantum efficiency (EQE) of Example 1 and Comparative Example 1 as a function of brightness. The solid lines with circles, triangles, and diamonds show the data from Example 1 and the solid lines with squares show the data from Comparative Example 1. The CE of Example 1 is much higher than that of Comparative Example 1. In addition, the peak external quantum efficiency of Example 1 is higher than that of Comparative Example 1. Because Example 1 and Comparative Example 1 have a relatively low level of leakage current, it is believed that the high CE and high peak external quantum efficiency of Example 1 are derived from the reduced Fermi energy and the resulting reduced doped ZnO electron transport layer and quantum dots. The injection barrier between the layers is produced.

圖5展示實例1及比較實例1之T50 使用期限隨時間而變。具有圓形、三角形及菱形之實線展示來自實例1之資料且具有正方形之實線展示來自比較實例1之資料。正方形、圓形及三角形符號展示來自此等具有摻雜ZnO奈米晶體之樣品的資料,該等摻雜ZnO奈米晶體具有Cs、Mg及Ga。具有摻雜ZnO電子傳遞層之裝置的使用期限高於具有未摻雜ZnO電子傳遞層之裝置的使用期限。 比較實例2Figure 5 shows that the T 50 service life of Example 1 and Comparative Example 1 varies with time. The solid lines with circles, triangles, and diamonds show the data from Example 1 and the solid lines with squares show the data from Comparative Example 1. The square, circle and triangle symbols show data from these samples with doped ZnO nanocrystals, which have Cs, Mg, and Ga. The lifetime of the device with the doped ZnO electron transport layer is higher than the lifetime of the device with the undoped ZnO electron transport layer. Comparative example 2

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm分別旋塗60 s及30 s將量子點及未摻雜ZnO奈米晶體依序沈積至TFB上。未摻雜ZnO奈米晶體之平均直徑小於5 nm。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至未摻雜ZnO奈米晶體上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。 實例2The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The quantum dots and undoped ZnO nanocrystals were sequentially deposited on the TFB by spin coating at 2000 rpm for 60 s and 30 s, respectively. The average diameter of undoped ZnO nanocrystals is less than 5 nm. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the undoped ZnO nanocrystal through a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide. Example 2

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm分別旋塗60 s及30 s將量子點及摻雜有5 mol% Rb之ZnO奈米晶體依序沈積至TFB上。摻雜ZnO奈米晶體之平均直徑在比較實例2之未摻雜ZnO奈米晶體之平均直徑的10%以內。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至氧化鋁奈米粒子上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. Quantum dots and ZnO nanocrystals doped with 5 mol% Rb were sequentially deposited on TFB by spin coating at 2000 rpm for 60 s and 30 s, respectively. The average diameter of the doped ZnO nanocrystals is within 10% of the average diameter of the undoped ZnO nanocrystals of Comparative Example 2. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the alumina nanoparticle via a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide.

圖6展示實例2及比較實例2之電流密度隨電壓而變。具有圓形之實線展示來自實例2之資料及具有正方形之實線展示來自比較實例2之資料。實例2具有比比較實例2更高的洩漏電流且比比較實例2更不穩定,而實例2之總電阻與比較實例2相似。然而,實例2之接通電壓為0.4 V,小於比較實例2之接通電壓。此改良可歸因於由於在兩種材料之間形成歐姆接觸而減小Al陰極與ZnO電子傳遞層之間的注入障壁。咸信量子點發光層與摻雜ZnO電子傳遞層之間的界面截獲注入電子。Figure 6 shows the current density of Example 2 and Comparative Example 2 as a function of voltage. The solid line with a circle shows the data from Example 2 and the solid line with a square shows the data from Comparative Example 2. Example 2 has a higher leakage current than Comparative Example 2 and is more unstable than Comparative Example 2, and the total resistance of Example 2 is similar to Comparative Example 2. However, the turn-on voltage of Example 2 is 0.4 V, which is smaller than that of Comparative Example 2. This improvement can be attributed to the reduction of the injection barrier between the Al cathode and the ZnO electron transport layer due to the formation of ohmic contacts between the two materials. It is believed that the interface between the quantum dot light-emitting layer and the doped ZnO electron transport layer intercepts injected electrons.

圖7展示實例2及比較實例2之電流效率(CE)隨亮度而變及圖8展示實例2及比較實例2之外部量子效率(EQE)隨亮度而變。具有圓形之實線展示來自實例2之資料及具有正方形之實線展示來自比較實例2之資料。實例2之CE比比較實例2之CE高得多。另外,實例2之峰值外部量子效率高於比較實例2之峰值外部量子效率。儘管實例2及比較實例2具有相對高水平之洩漏電流,但咸信實例2之高CE及高峰值外部量子效率係由於減小的費米能量及所得減小之摻雜ZnO電子傳遞層與量子點發光層之間的注入障壁。 比較實例3FIG. 7 shows the current efficiency (CE) of Example 2 and Comparative Example 2 as a function of brightness and FIG. 8 shows the external quantum efficiency (EQE) of Example 2 and Comparative Example 2 as a function of brightness. The solid line with a circle shows the data from Example 2 and the solid line with a square shows the data from Comparative Example 2. The CE of Example 2 is much higher than that of Comparative Example 2. In addition, the peak external quantum efficiency of Example 2 is higher than that of Comparative Example 2. Although Example 2 and Comparative Example 2 have relatively high levels of leakage current, it is believed that the high CE and high peak external quantum efficiency of Example 2 are due to the reduced Fermi energy and the resulting reduced doped ZnO electron transport layer and quantum The injection barrier between the point emitting layers. Comparative example 3

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm分別旋塗60 s及30 s將量子點及未摻雜ZnO奈米晶體依序沈積至TFB上。未摻雜ZnO奈米晶體之平均直徑小於5 nm。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至未摻雜ZnO奈米晶體上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。 實例3The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The quantum dots and undoped ZnO nanocrystals were sequentially deposited on the TFB by spin coating at 2000 rpm for 60 s and 30 s, respectively. The average diameter of undoped ZnO nanocrystals is less than 5 nm. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the undoped ZnO nanocrystal through a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide. Example 3

製備兩種不同量子點發光二極體,各自包含包含一層矽烷配體封端ZnO奈米晶體及一層未封端ZnO奈米晶體之電子傳遞雙層。一種量子點發光二極體包含一電子傳遞層,該電子傳遞層包含摻雜有5 mol% Mg之矽烷配體封端ZnO奈米晶體(實例3-1)及未封端ZnO。另一量子點發光二極體包含一電子傳遞層,該電子傳遞層包含矽烷配體封端ZnO及摻雜有5 mol% Mg之未封端ZnO奈米晶體(實例3-2)。各量子點發光二極體均藉由遵循下文段落中所描述的程序來製造。Two different quantum dot light-emitting diodes were prepared, each containing an electron transport double layer containing a layer of silane ligand-terminated ZnO nanocrystal and a layer of uncapped ZnO nanocrystal. A quantum dot light-emitting diode includes an electron transport layer that includes silane ligand-terminated ZnO nanocrystals doped with 5 mol% Mg (Example 3-1) and unterminated ZnO. Another quantum dot light-emitting diode includes an electron transport layer that includes silane ligand-terminated ZnO and unterminated ZnO nanocrystals doped with 5 mol% Mg (Example 3-2). Each quantum dot light-emitting diode is manufactured by following the procedure described in the following paragraphs.

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,以3000 rpm將TFB旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以2000 rpm旋塗60 s將量子點沈積至TFB上。隨後,形成電子傳遞雙層。首先,將矽烷封端ZnO奈米晶體以3500 rpm旋塗至量子點上30 s。隨後,將所得製品放入保持在70℃下之加熱板中30分鐘。隨後,將未封端ZnO奈米晶體旋塗至矽烷封端ZnO奈米晶體上。在此等步驟之後,將所得製品放入保持在100℃下之加熱板中30分鐘。兩種類型之ZnO奈米晶體之平均直徑均在比較實例3之未摻雜ZnO奈米晶體之平均直徑的10%以內。量子點為綠色的基於Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至氧化鋁奈米粒子上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, TFB was spin-coated onto the PEDOT:PSS-coated substrate at 3000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The quantum dots were deposited on the TFB by spin coating at 2000 rpm for 60 s. Subsequently, an electron transport double layer is formed. First, silane-terminated ZnO nanocrystals were spin-coated onto the quantum dots at 3500 rpm for 30 s. Subsequently, the resulting product was placed in a hot plate maintained at 70°C for 30 minutes. Subsequently, the uncapped ZnO nanocrystals were spin-coated onto the silane-capped ZnO nanocrystals. After these steps, the resulting product was placed in a hot plate kept at 100°C for 30 minutes. The average diameters of the two types of ZnO nanocrystals are within 10% of the average diameter of the undoped ZnO nanocrystals of Comparative Example 3. Quantum dots are green Cd-based core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the alumina nanoparticle via a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide.

圖9展示實例3-1、實例3-2及比較實例3之電流密度隨電壓而變。實線展示來自比較實例3之資料以及虛線及點線分別展示來自實例3-1及3-2之資料。實例3-1及3-2具有比比較實例3更高的電力接通電壓及比比較實例3更低之總電阻。此等改善可歸因於由於在此等層之間形成歐姆接觸而減小陰極與電子傳遞層之間的注入障壁。此等改良亦可由於在電子傳遞層與量子點發光層之間形成歐姆接觸。咸信電子傳遞層與量子點發光層之間的歐姆接觸係由於量子點發光層與矽烷配體封端ZnO電子傳遞層之間的界面處之低水平的缺損而形成。亦咸信此界面處之缺損下層藉由用矽鈍化ZnO之表面缺損來減小矽烷配體封端ZnO電子傳遞層之功函數且ZnO/二氧化矽(核/殼)奈米粒子展現相比於未封端ZnO奈米粒子更強的量子侷限效應。Figure 9 shows the current density of Example 3-1, Example 3-2 and Comparative Example 3 as a function of voltage. The solid line shows the data from Comparative Example 3 and the dashed and dotted lines show the data from Examples 3-1 and 3-2, respectively. Examples 3-1 and 3-2 have a higher power-on voltage than Comparative Example 3 and a lower total resistance than Comparative Example 3. These improvements can be attributed to the reduction of the injection barrier between the cathode and the electron transport layer due to the formation of ohmic contacts between these layers. These improvements can also be due to the formation of ohmic contacts between the electron transport layer and the quantum dot light-emitting layer. It is believed that the ohmic contact between the electron transport layer and the quantum dot light-emitting layer is formed due to the low-level defects at the interface between the quantum dot light-emitting layer and the silane ligand-terminated ZnO electron transport layer. It is also believed that the defect lower layer at this interface reduces the work function of the ZnO electron transport layer blocked by the silane ligand by passivating the surface defect of ZnO with silicon, and the ZnO/silica (core/shell) nanoparticle shows a comparison Stronger quantum confinement effect on unblocked ZnO nanoparticles.

圖10展示實例3-1、實例3-2及比較實例3之外部量子效率(EQE)隨電流密度而變。實線展示來自比較實例3之資料以及虛線及點線分別展示來自實例3-1及3-2之資料。實例3-2之EQE比比較實例3及實例3-1之彼等EQE高得多。另外,實例3-2之峰值外部量子效率高於比較實例3及實例3-1之彼等峰值外部量子效率。咸信實例3-2之緩慢效率下降及高峰值外部量子效率由於量子點發射層中之經改良電荷平衡。亦咸信電子傳遞雙層與量子點發光層之間的界面處減小數量之缺損及相關聯之減小的包含矽烷封端奈米粒子之電子傳遞層的功函數產生此經改良之電荷平衡,矽烷封端奈米粒子包含Mg摻雜ZnO。 實例4Figure 10 shows the external quantum efficiency (EQE) of Example 3-1, Example 3-2 and Comparative Example 3 as a function of current density. The solid line shows the data from Comparative Example 3 and the dashed and dotted lines show the data from Examples 3-1 and 3-2, respectively. The EQE of Example 3-2 is much higher than those of Comparative Example 3 and Example 3-1. In addition, the peak external quantum efficiency of Example 3-2 is higher than those of Comparative Example 3 and Example 3-1. It is believed that the slow efficiency drop and high peak external quantum efficiency of Example 3-2 are due to the improved charge balance in the quantum dot emitting layer. It is also believed that the reduced number of defects at the interface between the electron transport double layer and the quantum dot light-emitting layer and the associated reduced work function of the electron transport layer containing silane-terminated nanoparticles produce this improved charge balance , Silane-terminated nanoparticles contain Mg-doped ZnO. Example 4

及製備包含電子傳遞雙層之量子點發光二極體,該電子傳遞雙層包含一層摻雜有15 mol% Mg的矽烷配體封端ZnO奈米晶體及一層未封端ZnO奈米晶體。所採用的程序描述於以下段落中。And preparing a quantum dot light-emitting diode comprising an electron transport double layer, the electron transport double layer comprising a layer of silane ligand-terminated ZnO nanocrystals doped with 15 mol% Mg and a layer of uncapped ZnO nanocrystals. The procedure used is described in the following paragraphs.

將PEDOT:PSS溶液經由針筒過濾器(0.45 μm)過濾且隨後以3000 rpm旋塗至經ITO塗佈之玻璃基板上60 s。其後,將所得基板在145℃下焙烤15 min。隨後將經PEDOT:PSS塗佈之基板轉移至氮氣填充球狀盒子中。隨後,將形成電洞傳遞層之材料以2000 rpm旋塗至經PEDOT:PSS塗佈之基板上30 s,隨後將基板在150℃下焙烤30 min。藉由以4000 rpm旋塗60 s將不含Cd之InP量子點及摻雜ZnO奈米晶體依序沈積至電洞傳遞層上。隨後,形成電子傳遞雙層。首先,將摻雜有15 mol% Mg之矽烷封端ZnO奈米晶體以3500 rpm旋塗至量子點上30 s。隨後,將所得製品放入保持在70℃下之加熱板中30分鐘。隨後,將摻雜有15 mol% Mg之未封端ZnO奈米晶體旋塗至矽烷封端ZnO奈米晶體上。在此等步驟之後,將所得製品放入保持在100℃下之加熱板中30分鐘。兩種類型之ZnO奈米晶體之平均直徑均在比較實例3之未摻雜ZnO奈米晶體之平均直徑的10%以內。量子點為紅色的不含Cd之核/殼膠態奈米晶體。使用熱蒸發經由陰影遮罩將Al電極(100 nm)沈積至氧化鋁奈米粒子上。最終,將裝置包封於可紫外固化樹脂中且隨後由玻璃載片覆蓋。The PEDOT:PSS solution was filtered through a syringe filter (0.45 μm) and then spin-coated onto the ITO-coated glass substrate at 3000 rpm for 60 s. Thereafter, the obtained substrate was baked at 145°C for 15 min. The PEDOT:PSS coated substrate was then transferred to a nitrogen-filled spherical box. Subsequently, the material for forming the hole transfer layer was spin-coated on the PEDOT:PSS-coated substrate at 2000 rpm for 30 s, and then the substrate was baked at 150°C for 30 min. The Cd-free InP quantum dots and doped ZnO nanocrystals were sequentially deposited on the hole transport layer by spin coating at 4000 rpm for 60 s. Subsequently, an electron transport double layer is formed. First, silane-terminated ZnO nanocrystals doped with 15 mol% Mg were spin-coated onto quantum dots at 3500 rpm for 30 s. Subsequently, the resulting product was placed in a hot plate maintained at 70°C for 30 minutes. Subsequently, the unblocked ZnO nanocrystals doped with 15 mol% Mg were spin-coated onto the silane blocked ZnO nanocrystals. After these steps, the resulting product was placed in a hot plate kept at 100°C for 30 minutes. The average diameters of the two types of ZnO nanocrystals are within 10% of the average diameter of the undoped ZnO nanocrystals of Comparative Example 3. Quantum dots are red Cd-free core/shell colloidal nanocrystals. The Al electrode (100 nm) was deposited on the alumina nanoparticle via a shadow mask using thermal evaporation. Finally, the device is encapsulated in a UV curable resin and then covered by a glass slide.

圖11展示實例4之電流密度隨電壓而變。實線(t1.1)及虛線(t2.3)分別展示來自在製造之後1天及2天所量測的實例4之資料。實例4在t1.1及t2.3具有1.7 V之穩定光學接通電壓。圖12展示實例4之外部量子效率(EQE)隨電流密度而變。實線(t1.1)及虛線(t2.3)分別展示來自在製造之後1天及2天所量測的實例4之資料。實例4之峰值EQE在t1.1在276 Cd/m2 下為13.17%及在t2.3在264 Cd/m2 下為13.1%。咸信穩定效率係由於量子點發光層中經改良之電荷平衡,由於電子傳遞雙層與量子點發光層之間的界面處之缺損量減小及由於電子傳遞雙層之功函數減小。Figure 11 shows the current density of Example 4 as a function of voltage. The solid line (t1.1) and the dashed line (t2.3) show data from Example 4 measured 1 day and 2 days after manufacturing, respectively. Example 4 has a stable optical turn-on voltage of 1.7 V at t1.1 and t2.3. Figure 12 shows the external quantum efficiency (EQE) of Example 4 as a function of current density. The solid line (t1.1) and the dashed line (t2.3) show data from Example 4 measured 1 day and 2 days after manufacturing, respectively. The peak EQE of Example 4 was 13.17% at t1.1 at 276 Cd/m 2 and 13.1% at t2.3 at 264 Cd/m 2 . It is believed that the stable efficiency is due to the improved charge balance in the quantum dot light-emitting layer, due to the decrease in the amount of defects at the interface between the electron transport double layer and the quantum dot light-emitting layer, and the decrease in the work function of the electron transport double layer.

本文之實施方式實質上僅為例示性,且因此並不脫離所描述之實施方式的要旨的變化形式意欲在教示之範疇內。此等變化不應視為背離教示之精神及範圍。The embodiments herein are merely illustrative in nature, and therefore variations that do not depart from the gist of the described embodiments are intended to be within the scope of teaching. Such changes should not be regarded as a departure from the spirit and scope of the teaching.

儘管在本文中已描述及說明了本發明之若干實施例,但一般熟習此項技術者將容易地設想多種其他方法及/或結構來執行功能及/或獲得結果及/或一或多種本文所描述之優勢,且此等變化及/或修改各自可視為在本發明之範疇內。更一般而言,熟習此項技術者將容易地瞭解,本文所描述之所有參數、尺寸、材料及組態均欲為例示性的且實際參數、尺寸、材料及/或組態將視使用本發明教示之特定應用而定。熟習此項技術者將認識到或能夠僅使用常規實驗即可確定本文所描述之本發明特定實施例的許多等效物。因此應理解,前述實施例僅藉由實例呈現且在隨附申請專利範圍及其等效物之範疇內,本發明可以不同於特定描述及主張之其他方式來實施。本發明係關於本文所描述之各個別特徵、系統、製品、材料、套組及/或方法。另外,若此等特徵、系統、製品、材料、套組及/或方法相互間無不一致,則兩種或多於兩種此等特徵、系統、製品、材料、套組及/或方法之任何組合均包括於本發明之範疇內。Although several embodiments of the present invention have been described and illustrated herein, those skilled in the art will easily conceive a variety of other methods and/or structures to perform functions and/or obtain results and/or one or more of the The advantages described, and these changes and/or modifications are each considered to be within the scope of the present invention. More generally speaking, those familiar with this technology will easily understand that all the parameters, dimensions, materials and configurations described in this article are intended to be illustrative and the actual parameters, dimensions, materials and/or configurations will depend on the use of this Depending on the specific application of the invention teaching. Those skilled in the art will recognize or be able to determine many equivalents to the specific embodiments of the invention described herein using only routine experimentation. Therefore, it should be understood that the foregoing embodiments are presented only by examples and are within the scope of the appended patent application and its equivalents, and the present invention can be implemented in other ways different from the specific description and claims. The present invention relates to the individual features, systems, articles, materials, kits, and/or methods described herein. In addition, if these features, systems, products, materials, sets and/or methods are not inconsistent with each other, then any of two or more of these features, systems, products, materials, sets and/or methods Combinations are all included in the scope of the present invention.

如本文中所定義及使用之所有定義應理解為控制在辭典定義、以引用之方式併入的文獻中的定義及/或所定義術語之普通含義內。All definitions as defined and used herein should be understood to be controlled within the dictionary definitions, definitions in documents incorporated by reference, and/or ordinary meanings of the defined terms.

除非截然相反地指示,否則如在本說明書及申請專利範圍中所使用之不定冠詞「一(a/an)」應理解為意謂「至少一個」。Unless indicated to the contrary, the indefinite article "一 (a/an)" used in this specification and the scope of the patent application should be understood to mean "at least one."

如本文在說明書及申請專利範圍中使用之片語「及/或」應理解為意謂如此結合之要素的「任一者或兩者」,亦即,在一些情況下結合地存在且在其他情況下未結合地存在的要素。使用「及/或」列出之多個要素應以相同方式解釋,亦即,如此結合之「一或多個」要素。可視情況存在除了藉由「及/或」條項所具體識別之要素以外的其他要素,無論與具體識別之彼等要素相關或不相關。因此,作為非限制性實例,提及「A及/或B」在結合諸如「包含」等開放式措辭使用時,在一個實施例中,可僅指A (視情況包括除B以外之要素);在另一實施例中,可僅指B (視情況包括除A以外之要素);在又一實施例中,可指A及B兩者(視情況包括其他要素);等。The phrase "and/or" as used herein in the specification and the scope of the patent application should be understood as meaning "either or both" of the elements so combined, that is, in some cases they exist in combination and in others In the case of uncombined elements. Multiple elements listed with "and/or" should be interpreted in the same way, that is, "one or more" elements so combined. There may be other elements other than the elements specifically identified by the "and/or" item, regardless of whether they are related or not related to the specifically identified elements. Therefore, as a non-limiting example, referring to "A and/or B" when used in conjunction with open-ended expressions such as "includes", in one embodiment, it can refer to only A (including elements other than B as appropriate) ; In another embodiment, it may refer to B only (including elements other than A as appropriate); in another embodiment, it may refer to both A and B (including other elements as appropriate); etc.

如在本說明書及申請專利範圍中所用,「或」應理解為具有與上文所定義之「及/或」相同的含義。舉例而言,當分離清單中之項目時,「或」或「及/或」應解釋為包括性的,亦即,包括要素之數目或清單及(視情況)額外未列出項目的至少一個以及多於一個。僅截然相反地指示的術語,諸如「…中之僅一者」或「…中之恰好一者」或當用於申請專利範圍中時,「由…組成」將指包括要素的數目或清單中之恰好一個要素。一般而言,如本文所用,術語「或」當前面具有排他性術語(諸如「任一」、「…中之一者」、「…中之僅一者」或「…中之恰好一者」)時,應僅解釋為指示排他性替代物(亦即,「一者或另一者,但非兩者」)。當用於申請專利範圍中時,「主要由…組成」應具有如其在專利法律領域中所使用之普通含義。As used in this specification and the scope of the patent application, "or" should be understood to have the same meaning as "and/or" defined above. For example, when separating items in the list, "or" or "and/or" should be interpreted as inclusive, that is, including the number or list of elements and (as appropriate) at least one of the additional unlisted items And more than one. Terms that indicate only the opposite, such as "only one of" or "exactly one of" or when used in the scope of a patent application, "consisting of" will refer to the number or list of elements included It happens to be an element. Generally speaking, as used herein, the term "or" precedes an exclusive term (such as "any", "one of", "only one of" or "exactly one of") At the time, it should only be interpreted as indicating an exclusive alternative (ie, "one or the other, but not both"). When used in the scope of patent application, "mainly composed of" should have its ordinary meaning as used in the field of patent law.

如本說明書及申請專利範圍中所用,關於一或多個要素之清單的片語「至少一個」應理解為意謂由要素之清單中要素之任何一或多個中選出的至少一個要素,但未必包括要素之清單內具體列出的每一及每個要素中之至少一者,且未必排除要素之清單中之要素的任何組合。此定義亦允許可視情況存在除片語「至少一個」所指的要素之清單內具體識別的要素以外的要素,而無論與具體識別的彼等要素相關抑或不相關。因此,作為非限制性實例,「A及B中之至少一者」 (或等效地「A或B中之至少一者」或等效地「A及/或B中之至少一者」)在一個實施例中可指至少一個(視情況包括多於一個) A而不存在B (且視情況包括除B以外的要素);在另一實施例中,指至少一個(視情況包括多於一個) B而不存在A (且視情況包括除A以外的要素);在又一實施例中,指至少一個(視情況包括多於一個) A及至少一個(視情況包括多於一個) B (且視情況包括其他要素);等。As used in this specification and the scope of the patent application, the phrase "at least one" in relation to a list of one or more elements should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but It does not necessarily include each and at least one of each element specifically listed in the element list, and does not necessarily exclude any combination of elements in the element list. This definition also allows the existence of elements other than those specifically identified in the list of elements referred to by the phrase "at least one", regardless of whether they are related or not related to the specifically identified elements. Therefore, as a non-limiting example, "at least one of A and B" (or equivalently "at least one of A or B" or equivalently "at least one of A and/or B") In one embodiment, it may refer to at least one (including more than one as the case may be) A but not B (and optionally including elements other than B); in another embodiment, at least one (including more than one as the case may be A) B does not exist in A (and optionally includes elements other than A); in another embodiment, it means at least one (including more than one as the case may be) A and at least one (including more than one as the case may be) B (And other elements as appropriate); etc.

亦應理解,除非截然相反地指示,否則在本文所主張之包括超過一個步驟或操作之任何方法中,該方法之步驟或操作之次序無需侷限於敍述該方法之步驟或操作之順序。It should also be understood that, unless indicated to the contrary, in any method claimed herein that includes more than one step or operation, the order of the steps or operations of the method need not be limited to the order in which the steps or operations of the method are described.

在申請專利範圍中以及在上述說明書中,諸如「包含」、「包括」、「攜載」、「具有」、「含有」、「涉及」、「持有」、「由…組成」及其類似者之全部過渡性片語應理解為開放的,亦即,意謂包括(但不限於)。僅過渡片語「由…組成」及「主要由…組成」應分別為封閉或半封閉過渡片語,如美國專利局專利審查程序手冊(United States Patent Office Manual of Patent Examining Procedures)第2111.03節中所闡述。In the scope of patent application and in the above description, such as "include", "include", "carry", "have", "contain", "involve", "hold", "consisting of" and similar All transitional phrases of the author should be understood as open, that is, it means including (but not limited to). Only the transitional phrases "consisting of" and "mainly composed of" should be closed or semi-closed transitional phrases respectively, as in Section 2111.03 of the United States Patent Office Manual of Patent Examining Procedures Elaborated.

110:基板 120:陽極 130:電洞注入層 140:電洞傳遞層 150:量子點發光層 160:電子傳遞層 170:陰極110: substrate 120: anode 130: hole injection layer 140: hole transfer layer 150: Quantum dot light-emitting layer 160: electron transport layer 170: cathode

隨附圖式包括在內以提供對本發明之進一步理解且併入及構成本申請案之一部分,其說明本發明之實施例且與實施方式一起用以解釋本發明之原理。在圖式中: 圖1為說明根據一些實施例之量子點發光二極體之結構的透視圖; 圖2為展示實例1及比較實例1中所描述之量子點發光二極體之電流密度隨電壓而變的圖式; 圖3為展示實例1及比較實例1中所描述之量子點發光二極體之外部量子效率隨亮度而變的圖式; 圖4為展示實例1及比較實例1中所描述之量子點發光二極體之電流效率隨亮度而變的圖式; 圖5為展示實例1及比較實例1中所描述之量子點發光二極體之T50 使用期限隨亮度而變的圖式; 圖6為展示實例2及比較實例2中所描述之量子點發光二極體之電流密度隨電壓而變的圖式; 圖7為展示實例2及比較實例2中所描述之量子點發光二極體之外部量子效率隨亮度而變的圖式; 圖8為展示實例2及比較實例2中所描述之量子點發光二極體之電流效率隨亮度而變的圖式; 圖9為展示實例3及比較實例3中所描述之量子點發光二極體之電流密度隨電壓而變的圖式; 圖10為展示實例3及比較實例3中所描述之量子點發光二極體之外部量子效率隨電流密度而變的圖式; 圖11為展示實例4中所描述之量子點發光二極體之電流密度隨電壓而變的圖式;及 圖12為展示實例4中所描述之量子點發光二極體之外部量子效率隨電流密度而變的圖式。The accompanying drawings are included to provide a further understanding of the present invention and are incorporated into and constitute a part of this application, which illustrate the embodiments of the present invention and together with the implementations are used to explain the principle of the present invention. In the drawings: Figure 1 is a perspective view illustrating the structure of a quantum dot light-emitting diode according to some embodiments; Figure 2 is a diagram showing the current density of the quantum dot light-emitting diode described in Example 1 and Comparative Example 1 A graph showing changes in voltage; Fig. 3 is a graph showing the external quantum efficiency of the quantum dot light-emitting diodes described in Example 1 and Comparative Example 1 as a function of brightness; Fig. 4 is a graph showing the changes in Example 1 and Comparative Example 1 He described the quantum dot light emitting current efficiency diode of the function of the luminance variation of the drawings; FIG. 5 shows example 1 and Comparative example 1 described in the quantum dot light emitting diodes of the T 50 period of use with the luminance change Figure 6 is a diagram showing the current density of the quantum dot light-emitting diode described in Example 2 and Comparative Example 2 as a function of voltage; Figure 7 is a diagram showing the quantum dot described in Example 2 and Comparative Example 2 The graph of the external quantum efficiency of light-emitting diodes as a function of brightness; FIG. 8 is a graph showing the current efficiency of the quantum dot light-emitting diodes described in Example 2 and Comparative Example 2 as a function of brightness; FIG. 9 is Shows the graph of the current density of the quantum dot light-emitting diodes described in Example 3 and Comparative Example 3 as a function of voltage; Figure 10 shows the exterior of the quantum dot light-emitting diodes described in Example 3 and Comparative Example 3 The graph of quantum efficiency as a function of current density; Figure 11 is a graph showing that the current density of the quantum dot light-emitting diode described in Example 4 varies with voltage; and Figure 12 is a graph showing the quantum described in Example 4 The graph of the external quantum efficiency of a point-emitting diode as a function of current density.

110:基板 110: substrate

120:陽極 120: anode

130:電洞注入層 130: hole injection layer

140:電洞傳遞層 140: hole transfer layer

150:量子點發光層 150: Quantum dot light-emitting layer

160:電子傳遞層 160: electron transport layer

170:陰極 170: cathode

Claims (33)

一種量子點發光二極體,其包含: 第一電極; 安置於該第一電極上之量子點發光層; 安置於該量子點發光層上之電子傳遞層,其中該電子傳遞層包含奈米粒子,該等奈米粒子包含摻雜有一或多種摻雜物的ZnO,且其中該等奈米粒子之數目平均直徑小於或等於5 nm;及 安置於該電子傳遞層上之第二電極。A quantum dot light-emitting diode, which comprises: First electrode A quantum dot light-emitting layer arranged on the first electrode; An electron transport layer disposed on the quantum dot light-emitting layer, wherein the electron transport layer includes nano particles, the nano particles include ZnO doped with one or more dopants, and the number of the nano particles is average The diameter is less than or equal to 5 nm; and A second electrode arranged on the electron transport layer. 如請求項1之量子點發光二極體,其中該等摻雜物中之至少一種係選自由以下組成之群:Na、K、Rb、Cs、Mg、Ca、Sr、Ba、Al、Ga、In、Si、Ge及Sn。Such as the quantum dot light-emitting diode of claim 1, wherein at least one of the dopants is selected from the group consisting of Na, K, Rb, Cs, Mg, Ca, Sr, Ba, Al, Ga, In, Si, Ge and Sn. 如任一前述請求項之量子點發光二極體,其中該電洞傳遞層中一或多種摻雜物與Zn之莫耳比係大於或等於0.001且小於或等於0.5。The quantum dot light-emitting diode of any one of the preceding claims, wherein the molar ratio of one or more dopants in the hole transport layer to Zn is greater than or equal to 0.001 and less than or equal to 0.5. 如任一前述請求項之量子點發光二極體,其中該等奈米粒子為結晶的。Such as the quantum dot light-emitting diode of any of the foregoing claims, wherein the nano particles are crystalline. 如任一前述請求項之量子點發光二極體,其中該量子點發光二極體進一步包含安置於該第一電極與該量子點發光層之間的電洞傳遞層。A quantum dot light-emitting diode according to any one of the preceding claims, wherein the quantum dot light-emitting diode further comprises a hole transport layer disposed between the first electrode and the quantum dot light-emitting layer. 如請求項5之量子點發光二極體,其中該量子點發光二極體進一步包含安置於該第一電極與該電洞傳遞層之間的電洞注入層。The quantum dot light emitting diode of claim 5, wherein the quantum dot light emitting diode further includes a hole injection layer disposed between the first electrode and the hole transfer layer. 如任一前述請求項之量子點發光二極體,其中該電子傳遞層包含複數個圍繞該等奈米粒子之配體。The quantum dot light-emitting diode of any one of the foregoing claims, wherein the electron transport layer includes a plurality of ligands surrounding the nanoparticles. 如請求項7之量子點發光二極體,其中該複數個配體包含矽烷。Such as the quantum dot light-emitting diode of claim 7, wherein the plurality of ligands comprise silane. 如任一前述請求項之量子點發光二極體,其進一步包含第二電子傳遞層。A quantum dot light-emitting diode according to any one of the preceding claims, which further includes a second electron transport layer. 如請求項9之量子點發光二極體,其中該第二電子傳遞層包含奈米粒子,該等奈米粒子包含ZnO。For example, the quantum dot light-emitting diode of claim 9, wherein the second electron transport layer includes nano particles, and the nano particles include ZnO. 一種製造量子點發光二極體之方法,其包含: 組裝電子傳遞層與第一電極、第二電極及量子點發光層, 其中該電子傳遞層包含奈米粒子,該等奈米粒子包含摻雜有一或多種摻雜物之ZnO,及 其中該等奈米粒子之數目平均直徑小於或等於5 nm。A method of manufacturing quantum dot light-emitting diodes, which comprises: Assemble the electron transport layer, the first electrode, the second electrode and the quantum dot light-emitting layer, Wherein the electron transport layer includes nano particles, and the nano particles include ZnO doped with one or more dopants, and The average diameter of the number of these nanoparticles is less than or equal to 5 nm. 如請求項11之方法,其中該等摻雜物中之至少一種係選自由以下組成之群:Na、K、Rb、Cs、Mg、Ca、Sr、Ba、Al、Ga、In、Si、Ge及Sn。Such as the method of claim 11, wherein at least one of the dopants is selected from the group consisting of Na, K, Rb, Cs, Mg, Ca, Sr, Ba, Al, Ga, In, Si, Ge And Sn. 如請求項11至12中任一項之方法,其中該電洞傳遞層中一或多種摻雜物與Zn之莫耳比係大於或等於0.001且小於或等於0.5。The method according to any one of claims 11 to 12, wherein the molar ratio of the one or more dopants in the hole transport layer to Zn is greater than or equal to 0.001 and less than or equal to 0.5. 如請求項11至13中任一項之方法,其中該等奈米粒子為結晶的。The method of any one of claims 11 to 13, wherein the nanoparticles are crystalline. 如請求項11至14中任一項之方法,其中該量子點發光二極體進一步包含安置於該第一電極與該量子點發光層之間的電洞傳遞層。The method according to any one of claims 11 to 14, wherein the quantum dot light-emitting diode further comprises a hole transport layer disposed between the first electrode and the quantum dot light-emitting layer. 如請求項15之方法,其中該量子點發光二極體進一步包含安置於該第一電極與該電洞傳遞層之間的電洞注入層。The method of claim 15, wherein the quantum dot light-emitting diode further comprises a hole injection layer disposed between the first electrode and the hole transfer layer. 如請求項11至16中任一項之方法,其中該電子傳遞層包含複數個圍繞該等奈米粒子之配體。The method according to any one of claims 11 to 16, wherein the electron transport layer comprises a plurality of ligands surrounding the nanoparticles. 如請求項17之方法,其中該複數個配體包含矽烷。The method of claim 17, wherein the plurality of ligands comprise silane. 如請求項11至18中任一項之方法,其中組裝該電子傳遞層與該第一電極、該第二電極及該量子點發光層包含執行溶液塗佈製程。The method according to any one of claims 11 to 18, wherein assembling the electron transport layer with the first electrode, the second electrode, and the quantum dot light-emitting layer includes performing a solution coating process. 如請求項19之方法,其中該溶液塗佈製程係選自由以下組成之群:溶膠-凝膠塗佈、旋塗、列印、鑄造、衝壓、浸塗、捲塗及噴塗。Such as the method of claim 19, wherein the solution coating process is selected from the group consisting of sol-gel coating, spin coating, printing, casting, stamping, dip coating, coil coating and spraying. 如請求項19至20中任一項之方法,其中藉由該溶液塗佈製程沈積該電子傳遞層。The method according to any one of claims 19 to 20, wherein the electron transport layer is deposited by the solution coating process. 如請求項19至21中任一項之方法,其中藉由該溶液塗佈製程沈積該量子點發光層。The method according to any one of claims 19 to 21, wherein the quantum dot light-emitting layer is deposited by the solution coating process. 如請求項19至23中任一項之方法,其中藉由該溶液塗佈製程沈積電洞傳遞層。The method according to any one of claims 19 to 23, wherein the hole transport layer is deposited by the solution coating process. 如請求項23之方法,其中將該量子點發光層沈積至該電洞傳遞層上。The method of claim 23, wherein the quantum dot light-emitting layer is deposited on the hole transport layer. 如請求項11至24中任一項之方法,其中將該電子傳遞層沈積至該量子點發光層上。The method according to any one of claims 11 to 24, wherein the electron transport layer is deposited on the quantum dot light-emitting layer. 如請求項11至25中任一項之方法,其進一步包含組裝第二電子傳遞層與該電子傳遞層、該第一電極、該第二電極及該量子點發光二極體。The method of any one of claims 11 to 25, further comprising assembling a second electron transport layer and the electron transport layer, the first electrode, the second electrode, and the quantum dot light-emitting diode. 如請求項26之方法,其中該第二電子傳遞層包含奈米粒子,該等奈米粒子包含ZnO。The method of claim 26, wherein the second electron transport layer includes nano particles, and the nano particles include ZnO. 如請求項26至27中任一項之方法,其中藉由溶液塗佈製程沈積該第二電子傳遞層。The method according to any one of claims 26 to 27, wherein the second electron transport layer is deposited by a solution coating process. 如請求項28之方法,其中該溶液塗佈製程係選自由以下組成之群:溶膠-凝膠塗佈、旋塗、列印、鑄造、衝壓、浸塗、捲塗及噴塗。Such as the method of claim 28, wherein the solution coating process is selected from the group consisting of sol-gel coating, spin coating, printing, casting, stamping, dip coating, coil coating and spraying. 如請求項11至29中任一項之方法,其進一步包含執行熱退火步驟。The method according to any one of claims 11 to 29, which further comprises performing a thermal annealing step. 如請求項30之方法,其中在高於或等於70℃且低於或等於200℃之溫度下執行該熱退火。The method of claim 30, wherein the thermal annealing is performed at a temperature higher than or equal to 70°C and lower than or equal to 200°C. 如請求項30至31中任一項之方法,其中在氮氣、氬氣、氦氣、空氣及/或氧氣存在下執行該熱退火。The method of any one of claims 30 to 31, wherein the thermal annealing is performed in the presence of nitrogen, argon, helium, air, and/or oxygen. 一種藉由如請求項11至32中任一項之方法所形成的量子點發光二極體。A quantum dot light-emitting diode formed by the method according to any one of claims 11 to 32.
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