TW202036614A - Method for manufacturing inductor - Google Patents
Method for manufacturing inductor Download PDFInfo
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- TW202036614A TW202036614A TW109104982A TW109104982A TW202036614A TW 202036614 A TW202036614 A TW 202036614A TW 109104982 A TW109104982 A TW 109104982A TW 109104982 A TW109104982 A TW 109104982A TW 202036614 A TW202036614 A TW 202036614A
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/04—Fixed inductances of the signal type with magnetic core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F27/00—Details of transformers or inductances, in general
- H01F27/24—Magnetic cores
- H01F27/255—Magnetic cores made from particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Coils Or Transformers For Communication (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
Abstract
Description
本發明係關於一種電感器之製造方法。The present invention relates to a method of manufacturing an inductor.
先前,已知電感器搭載於電子機器等,被用作電壓轉換構件等之無源元件。Previously, it has been known that inductors are mounted on electronic devices and the like and used as passive components such as voltage conversion components.
例如提出一種電感器,其具備由磁性材料構成之長方體狀之晶片本體部、及埋設於該晶片本體部之內部之銅等內部導體(參照專利文獻1)。For example, an inductor is proposed that includes a rectangular parallelepiped chip main body made of a magnetic material and internal conductors such as copper embedded in the chip main body (see Patent Document 1).
於專利文獻1中,藉由印刷將包含導電膏之導體層積層複數層,而製造電感器。
[先前技術文獻]
[專利文獻]In
[專利文獻1]日本專利特開平10-144526號公報[Patent Document 1] Japanese Patent Laid-Open No. 10-144526
[發明所欲解決之問題][The problem to be solved by the invention]
然而,近年來,對電感器要求更高之電感。However, in recent years, higher inductance is required for inductors.
本發明提供一種能夠製造電感優異之電感器之製造方法。 [解決問題之技術手段]The present invention provides a manufacturing method capable of manufacturing an inductor with excellent inductance. [Technical means to solve the problem]
本發明(1)包含一種電感器之製造方法,其具備:第1步驟,其係將配線配置於基板之厚度方向一表面,該配線具備導線及被覆上述導線之絕緣層,且具有剖視大致圓形狀;第2步驟,其係將第1磁性片材以被覆上述配線之圓周面中剖視時超過180°之區域之方式,配置於上述基板之厚度方向一表面,上述第1磁性片材含有第1磁性粒子、及用以將上述第1磁性粒子分散之第1黏合劑;及第4步驟,其係利用第2磁性片材被覆上述第1磁性片材之厚度方向一表面,上述第2磁性片材含有包含在面方向上配向之第2各向異性磁性粒子之第2磁性粒子、及用以將上述第2磁性粒子分散之第2黏合劑,上述第1磁性片材被覆上述圓周面之上述區域及上述基板之上述一表面。The present invention (1) includes a method for manufacturing an inductor, which includes: a first step of arranging wiring on a surface of a substrate in the thickness direction; the wiring includes a wire and an insulating layer covering the wire, and has a cross-sectional view Circular shape; the second step is to arrange the first magnetic sheet on a surface of the substrate in the thickness direction so as to cover an area exceeding 180° in the circumferential surface of the wiring, the first magnetic sheet Containing first magnetic particles, and a first binder for dispersing the first magnetic particles; and a fourth step of covering a surface of the first magnetic sheet in the thickness direction with a second magnetic sheet. 2 The magnetic sheet contains second magnetic particles including second anisotropic magnetic particles aligned in the plane direction, and a second binder for dispersing the second magnetic particles, and the first magnetic sheet covers the circumference The aforementioned area of the surface and the aforementioned one surface of the aforementioned substrate.
於該方法中,於第2步驟中,將第1磁性片材以被覆配線之圓周面中剖視時超過180°之區域之方式,配置於基板之厚度方向一表面,故而可密集地配置第1磁性粒子。其結果,能夠製造電感優異之電感器。In this method, in the second step, the first magnetic sheet is arranged on one surface of the substrate in the thickness direction so that the first magnetic sheet is covered by the circumferential surface of the wiring in an area exceeding 180° when viewed in cross section, so that the first magnetic sheet can be densely arranged 1 Magnetic particles. As a result, an inductor with excellent inductance can be manufactured.
進而,於第4步驟中,第2磁性片材被覆第1磁性片材之厚度方向一表面,故而可密集地配置配線之周邊區域中之第1磁性粒子及第2磁性粒子。因此,能夠製造電感更優異之電感器。Furthermore, in the fourth step, the second magnetic sheet covers one surface of the first magnetic sheet in the thickness direction, so that the first magnetic particles and the second magnetic particles in the peripheral area of the wiring can be densely arranged. Therefore, an inductor with better inductance can be manufactured.
因此,根據該製造方法,能夠使周邊區域中之第1磁性粒子及第2磁性粒子之配置密集,從而能夠製造具有優異電感之電感器。Therefore, according to this manufacturing method, the arrangement of the first magnetic particles and the second magnetic particles in the peripheral region can be dense, and an inductor with excellent inductance can be manufactured.
本發明(2)包含如(1)所記載之電感器之製造方法,其中上述第1磁性粒子包含第1各向異性磁性粒子,該第1各向異性磁性粒子於上述第1磁性片材中在面方向上配向。The present invention (2) includes the method for manufacturing an inductor as described in (1), wherein the first magnetic particles include first anisotropic magnetic particles, and the first anisotropic magnetic particles are contained in the first magnetic sheet Align in the surface direction.
根據該方法,於第2步驟中,將第1磁性片材配置於基板之厚度方向一表面,於第1磁性片材中,第1各向異性磁性粒子沿著基板之厚度方向一表面配向。因此,可抑制面向該厚度方向一表面,於配線之上述區域中之圓周方向兩端緣處使第1各向異性磁性粒子沿著配線之圓周方向配向,因此,電感器之直流重疊特性優異。According to this method, in the second step, the first magnetic sheet is arranged on one surface in the thickness direction of the substrate. In the first magnetic sheet, the first anisotropic magnetic particles are aligned along the thickness direction of the substrate. Therefore, it is possible to prevent the first anisotropic magnetic particles from aligning along the circumferential direction of the wire at the circumferential end edges of the above-mentioned area of the wire facing a surface in the thickness direction. Therefore, the DC superimposing characteristic of the inductor is excellent.
並且,由於第1磁性片材被覆配線之周面之超過180°之區域,故而於該區域之圓周方向兩端緣處,可使第1各向異性磁性粒子之配向方向自配線之圓周方向變化為沿著基板之一表面之方向,並且密集地配置第1各向異性磁性粒子。其結果,可製造電感更優異之電感器。In addition, since the first magnetic sheet covers the area where the peripheral surface of the wiring exceeds 180°, at both ends of the area in the circumferential direction, the alignment direction of the first anisotropic magnetic particles can be changed from the circumferential direction of the wiring The first anisotropic magnetic particles are densely arranged along the direction of one surface of the substrate. As a result, an inductor with more excellent inductance can be manufactured.
因此,根據該方法,可製造電感及直流重疊特性優異之電感器。Therefore, according to this method, an inductor with excellent inductance and DC superimposition characteristics can be manufactured.
本發明(3)包含如(1)或(2)所記載之電感器之製造方法,其中上述基板係離型片材,該電感器之製造方法進而具備:第3步驟,其係去除上述基板;及第5步驟,其係將第3磁性片材以被覆自上述第1磁性片材之厚度方向另一表面露出之上述圓周面之方式,配置於上述第1磁性片材之厚度方向另一表面,上述第3磁性片材含有第3磁性粒子、及用以將上述第3磁性粒子分散之第3黏合劑。The present invention (3) includes the method for manufacturing an inductor as described in (1) or (2), wherein the substrate is a release sheet, and the method for manufacturing the inductor further includes: a third step of removing the substrate And the fifth step, which is to cover the circumferential surface exposed from the other surface of the first magnetic sheet in the thickness direction of the third magnetic sheet, arranged in the thickness direction of the first magnetic sheet On the surface, the third magnetic sheet includes third magnetic particles and a third binder for dispersing the third magnetic particles.
於該方法中,由於將第3磁性片材進而配置於第1磁性片材之厚度方向另一表面,故而可密集地配置配線之周邊區域中之第1磁性粒子、第2各向異性磁性粒子及第3磁性粒子。因此,能夠製造電感更優異之電感器。In this method, since the third magnetic sheet is further arranged on the other surface of the first magnetic sheet in the thickness direction, the first magnetic particles and the second anisotropic magnetic particles in the peripheral area of the wiring can be densely arranged And the third magnetic particle. Therefore, an inductor with better inductance can be manufactured.
特別是,由於第3磁性片材被覆自第1磁性片材之厚度方向另一表面露出之圓周面,故而可於與自第1磁性片材露出之配線之圓周面對應之區域中,密集地配置第3磁性粒子。其結果,能夠製造電感優異之電感器。In particular, since the third magnetic sheet is covered on the circumferential surface exposed from the other surface in the thickness direction of the first magnetic sheet, it can be densely located in the area corresponding to the circumferential surface of the wiring exposed from the first magnetic sheet The third magnetic particles are arranged. As a result, an inductor with excellent inductance can be manufactured.
本發明(4)包含如(3)所記載之電感器之製造方法,其中上述第3磁性粒子包含第3各向異性磁性粒子,該第3各向異性磁性粒子於上述第3磁性片材中在面方向上配向。The present invention (4) includes the method for manufacturing an inductor as described in (3), wherein the third magnetic particles include third anisotropic magnetic particles, and the third anisotropic magnetic particles are contained in the third magnetic sheet Align in the surface direction.
根據該方法,於第5步驟中,可使第3各向異性磁性粒子於與自第1磁性片材露出之配線之圓周面對應之區域中配向,並且密集地配置第3各向異性磁性粒子。其結果,可製造電感更優異之電感器。According to this method, in the fifth step, the third anisotropic magnetic particles can be aligned in a region corresponding to the circumferential surface of the wiring exposed from the first magnetic sheet, and the third anisotropic magnetic particles can be densely arranged . As a result, an inductor with more excellent inductance can be manufactured.
本發明(5)包含如(3)或(4)中所記載之電感器之製造方法,其係依序實施上述第1步驟、上述第2步驟及上述第3步驟,隨後同時實施上述第4步驟及上述第5步驟。The present invention (5) includes the method of manufacturing an inductor as described in (3) or (4), which implements the above-mentioned first step, the above-mentioned second step, and the above-mentioned third step in sequence, and then simultaneously performs the above-mentioned fourth step. Steps and
於該方法中,由於同時實施第4步驟及第5步驟,故而與依序實施第4步驟及第5步驟之方法相比,可縮短製造時間。因此,可高效地製造電感器。In this method, since the fourth step and the fifth step are performed at the same time, the manufacturing time can be shortened compared with the method of sequentially performing the fourth step and the fifth step. Therefore, the inductor can be manufactured efficiently.
本發明(6)包含如(3)至(5)中任一項所記載之電感器之製造方法,其中上述第2步驟中之上述第1黏合劑及上述第5步驟中之上述第3黏合劑含有B階段熱硬化性成分,該電感器之製造方法進而具備第6步驟,該第6步驟係進而使上述第1黏合劑及上述第3黏合劑之上述B階段熱硬化性成分同時C階段化。The present invention (6) includes the method for manufacturing an inductor as described in any one of (3) to (5), wherein the first adhesive in the second step and the third adhesive in the fifth step The agent contains a B-stage thermosetting component, and the inductor manufacturing method further includes a sixth step, which further makes the B-stage thermosetting components of the first adhesive and the third adhesive simultaneously C-stage化.
於該方法中,由於在第6步驟中,使第1黏合劑及第3黏合劑之B階段熱硬化性成分同時C階段化,故而與對第1黏合劑及第3黏合劑之B階段熱硬化性成分依序實施C階段化之方法相比,可縮短製造時間。因此,能夠高效地製造電感器。In this method, in the sixth step, the B-stage thermosetting components of the first adhesive and the third adhesive are simultaneously C-staged. Therefore, it is combined with the B-stage heat treatment of the first adhesive and the third adhesive. Compared with the method where the curable components are sequentially C-staged, the manufacturing time can be shortened. Therefore, the inductor can be manufactured efficiently.
本發明(7)包含如(1)或(2)中所記載之電感器之製造方法,其中上述基板係第3磁性片材,其包含第3磁性粒子、及用以將上述第3磁性粒子分散之第3黏合劑,上述第3黏合劑含有熱硬化性成分之硬化物。The present invention (7) includes the method for manufacturing an inductor as described in (1) or (2), wherein the substrate is a third magnetic sheet, which includes third magnetic particles, and is used to combine the third magnetic particles The dispersed third adhesive, the third adhesive contains a cured product of a thermosetting component.
於該方法中,由於基板為第3磁性片材,故而無須實施去除如離型膜之基板之步驟。因此,可削減步驟數,可容易地製造電感器。In this method, since the substrate is the third magnetic sheet, there is no need to perform the step of removing the substrate such as the release film. Therefore, the number of steps can be reduced, and the inductor can be easily manufactured.
本發明(8)包含如(7)所記載之電感器之製造方法,其中上述第3磁體粒子包含第3各向異性磁體粒子,該第3各向異性磁體粒子於上述第3磁體片材中在面方向上配向。The present invention (8) includes the method for manufacturing an inductor as described in (7), wherein the third magnet particles include third anisotropic magnet particles, and the third anisotropic magnet particles are contained in the third magnet sheet Align in the surface direction.
於該方法中,由於第3磁性粒子包含在第3磁性片材中沿面方向配向之第3各向異性磁性粒子,故而第3各向異性磁性粒子可沿著配線中面向第3磁性片材之部分配向。因此,能夠製造電感更優異之電感器。 [發明之效果]In this method, since the third magnetic particles include the third anisotropic magnetic particles oriented in the surface direction in the third magnetic sheet, the third anisotropic magnetic particles can face the third magnetic sheet along the wiring. Partial alignment. Therefore, an inductor with better inductance can be manufactured. [Effects of Invention]
本發明之電感器之製造方法可製造電感優異之電感器。The inductor manufacturing method of the present invention can manufacture an inductor with excellent inductance.
<第1實施形態> 1.電感 參照圖1A~圖2B來說明根據本發明之第1實施形態獲得之電感器。<The first embodiment> 1. Inductance The inductor obtained according to the first embodiment of the present invention will be described with reference to FIGS. 1A to 2B.
再者,圖1A將剖面進行陰影處理後示出,圖1B係表示磁性層中之各向異性磁性粒子之配向之剖視圖。再者,於包含圖1B之本案圖式中,為了易於理解本發明,誇大地描畫磁性粒子(包含各向異性磁性粒子)之形狀及配置。Furthermore, FIG. 1A shows the cross section after being shaded, and FIG. 1B is a cross-sectional view showing the alignment of the anisotropic magnetic particles in the magnetic layer. Furthermore, in the drawing of this project including FIG. 1B, in order to facilitate the understanding of the present invention, the shape and arrangement of the magnetic particles (including anisotropic magnetic particles) are exaggeratedly drawn.
如圖1A~圖1B所示,該電感器1具有於面方向上延伸之形狀。具體而言,電感器1具有於厚度方向上對向之一表面及另一表面,且該等一表面及另一表面均具有沿著面方向所包含之方向,且配線2(下述)傳輸電流之方向(相當於紙面深度方向)及與厚度方向正交之第1方向的平坦形狀。As shown in FIGS. 1A to 1B, the
電感器1具備配線2及磁性層3。The
配線2具有剖視大致圓形狀。具體而言,配線2於與作為傳輸電流之方向之第2方向(傳輸方向)(紙面深度方向)正交之剖面(第1方向剖面)處切斷時,具有大致圓形狀。The
配線2係被覆有絕緣層之電線,具體而言,具備導線6及被覆該導線6之絕緣層7。The
導線6係具有於第2方向上較長地延伸之形狀之導電線。又,導線6具有與配線2共有中心軸線之剖視大致圓形狀。The
作為導線6之材料,例如可列舉銅、銀、金、鋁、鎳及其等之合金等金屬導體,較佳為列舉銅。導線6可為單層構造,亦可為於芯導體(例如銅)之表面進行了鍍覆(例如鎳)等之複層構造。Examples of the material of the
導線6之半徑R1例如為25 μm以上,較佳為50 μm以上,且例如為2000 μm以下,較佳為200 μm以下。The radius R1 of the
絕緣層7保護導線6免受化學品或水之侵蝕,且防止導線6與磁性層3之短路。絕緣層7被覆導線6之整個外周面(圓周面)。The insulating
絕緣層7具有與配線2共有中心軸線(中心C)之剖視大致圓環形狀。The insulating
作為絕緣層7之材料,例如可列舉聚乙烯醇縮甲醛、聚酯、聚酯醯亞胺、聚醯胺(包含尼龍)、聚醯亞胺、聚醯胺醯亞胺及聚胺基甲酸酯等絕緣性樹脂。該等材料可單獨使用1種,亦可併用2種以上。As the material of the insulating
絕緣層7可由單層構成,亦可由複數層構成。The insulating
絕緣層7之厚度R2於圓周方向之任一位置處在配線2之徑向上大致均勻,例如為1 μm以上,較佳為3 μm以上,且例如為100 μm以下,較佳為50 μm以下。The thickness R2 of the insulating
導線6之半徑R1與絕緣層7之厚度R2之比(R1/R2)例如為1以上,較佳為10以上,例如為500以下,較佳為100以下。The ratio (R1/R2) of the radius R1 of the
配線2之半徑R(=導線6之半徑R1+絕緣層7之厚度R2)例如為25 μm以上,較佳為50 μm以上,且例如為2000 μm以下,較佳為200 μm以下。The radius R of the wiring 2 (= the radius R1 of the
磁性層3提高了電感器1之電感。磁性層3被覆配線2之整個外周面(圓周面)。磁性層3形成電感器1之外形。具體而言,磁性層3具有於面方向(第1方向及第2方向)上延伸之矩形狀。更具體而言,磁性層3具有於厚度方向上對向之一表面及另一表面,磁性層3之一表面及另一表面之各者分別形成電感器1之一表面及另一表面。The
磁性層3含有各向異性磁性粒子8及黏合劑9。具體而言,磁性層3之材料係含有各向異性磁性粒子8及黏合劑9之磁性組合物。較佳為,磁性層3係熱硬化性樹脂組合物(包含各向異性磁性粒子8及下述熱硬化性成分之組合物)之硬化物。The
作為構成各向異性磁性粒子8之磁性材料,例如可列舉軟磁體、硬磁體。自電感之觀點來看,較佳為列舉軟磁體。Examples of the magnetic material constituting the anisotropic
作為軟磁體,例如可列舉以純物質狀態包含1種金屬元素之單一金屬體、及例如1種以上之金屬元素(第1金屬元素)與1種以上之金屬元素(第2金屬元素)及/或非金屬元素(碳、氮、矽、磷等)之共熔體(混合物)即合金體。該等可單獨使用或併用。As the soft magnetic material, for example, a single metal body containing one metal element in a pure state, and for example, one or more metal elements (first metal element) and one or more metal elements (second metal element) and/or The eutectic (mixture) of non-metallic elements (carbon, nitrogen, silicon, phosphorus, etc.) is the alloy body. These can be used alone or in combination.
作為單一金屬體,例如可列舉僅由1種金屬元素(第1金屬元素)構成之金屬單質。作為第1金屬元素,例如自鐵(Fe)、鈷(Co)、鎳(Ni)及其他作為軟磁體之第1金屬元素而含有之金屬元素中適當選擇。As the single metal body, for example, a metal element composed of only one type of metal element (first metal element) can be cited. As the first metal element, for example, iron (Fe), cobalt (Co), nickel (Ni), and other metal elements contained as the first metal element of the soft magnetic material are appropriately selected.
又,作為單一金屬體,例如可列舉包括僅包含1種金屬元素之芯、及修飾該芯之表面一部分或全部之包含無機物及/或有機物質之表面層的形態、例如包含第1金屬元素之有機金屬化合物或無機金屬化合物經分解(例如熱分解)後的形態。作為後一種形態,更具體而言,可列舉包含鐵作為第1金屬元素之有機鐵化合物(具體而言為羰基鐵)經熱分解所得之鐵粉(有時稱為羰基鐵粉)等。再者,修飾僅包含1種金屬元素之部分之包含無機物質及/或有機物質之層的位置不限於如上所述之表面。再者,作為可獲得單一金屬體之有機金屬化合物或無機金屬化合物,並無特別限定,可自能獲得軟磁體之單一金屬體之公知或常用之有機金屬化合物或無機金屬化合物中適當選擇。In addition, as a single metal body, for example, a form including a core containing only one metal element and a surface layer containing an inorganic substance and/or organic substance that modifies a part or all of the surface of the core, such as a form containing a first metal element The form of an organic metal compound or an inorganic metal compound after decomposition (for example, thermal decomposition). As the latter form, more specifically, iron powder (sometimes referred to as carbonyl iron powder) obtained by thermal decomposition of an organic iron compound (specifically, carbonyl iron) containing iron as the first metal element, and the like. Furthermore, the position of the layer containing the inorganic substance and/or the organic substance that modifies the part containing only one metal element is not limited to the surface as described above. Furthermore, the organometallic compound or inorganic metal compound that can obtain a single metal body is not particularly limited, and it can be appropriately selected from known or commonly used organometallic compounds or inorganic metal compounds that can obtain a single metal body for soft magnets.
合金體係1種以上之金屬元素(第1金屬元素)與1種以上之金屬元素(第2金屬元素)及/或非金屬元素(碳、氮、矽、磷等)之共熔體,只要為可用作軟磁體之合金體者,則並無特別限定。Alloy system The eutectic of more than one metal element (first metal element) and more than one metal element (second metal element) and/or non-metal elements (carbon, nitrogen, silicon, phosphorus, etc.), as long as it is There are no particular restrictions on what can be used as an alloy body for soft magnetic materials.
第1金屬元素係合金體中之必需元素,例如可列舉鐵(Fe)、鈷(Co)、鎳(Ni)等。再者,若第1金屬元素為Fe,則合金體係設為Fe系合金,若第1金屬元素為Co,則合金體係設為Co系合金,若第1金屬元素為Ni,則合金體係設為Ni系合金。The essential elements in the first metal element-based alloy body include, for example, iron (Fe), cobalt (Co), nickel (Ni), and the like. Furthermore, if the first metal element is Fe, the alloy system is set to Fe-based alloy; if the first metal element is Co, the alloy system is set to Co-based alloy; if the first metal element is Ni, the alloy system is set to Ni-based alloy.
第2金屬元素係合金體中次要地含有之元素(副成分),且係與第1金屬元素相容(共熔)之金屬元素,例如可列舉鐵(Fe)(第1金屬為Fe以外之元素時)、鈷(Co)(第1金屬元素為Co以外之元素時)、鎳(Ni)(第1金屬元素為Ni以外之元素時)、鉻(Cr)、鋁(Al)、矽(Si)、銅(Cu)、銀(Ag)、錳(Mn)、鈣(Ca)、鋇(Ba)、鈦(Ti)、鋯(Zr)、鉿(Hf)、釩(V)、鈮(Nb)、鉭(Ta)、鉬(Mo)、鎢(W)、釕(Ru)、銠(Rh)、鋅(Zn)、鎵(Ga)、銦(In)、鍺(Ge)、錫(Sn)、鉛(Pb)、鈧(Sc)、釔(Y)、鍶(Sr)及各種稀土元素等。該等可單獨使用或併用2種以上。The second metal element is an element (secondary component) contained in the alloy body and is compatible (eutectic) with the first metal element. For example, iron (Fe) (the first metal is other than Fe) (When the first metal element is an element other than Co), cobalt (Co) (when the first metal element is an element other than Co), nickel (Ni) (when the first metal element is an element other than Ni), chromium (Cr), aluminum (Al), silicon (Si), copper (Cu), silver (Ag), manganese (Mn), calcium (Ca), barium (Ba), titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), molybdenum (Mo), tungsten (W), ruthenium (Ru), rhodium (Rh), zinc (Zn), gallium (Ga), indium (In), germanium (Ge), tin (Sn), lead (Pb), scandium (Sc), yttrium (Y), strontium (Sr) and various rare earth elements. These can be used individually or in combination of 2 or more types.
非金屬元素係合金體中次要地含有之元素(副成分),且係與第1金屬元素相容(共熔)之非金屬元素,例如可列舉硼(B)、碳(C)、氮(N)、矽(Si)、磷(P)、硫(S)等。該等可單獨使用或併用2種以上。The non-metallic element is an element (secondary component) contained in the alloy body and is compatible (eutectic) with the first metal element. For example, boron (B), carbon (C), nitrogen (N), silicon (Si), phosphorus (P), sulfur (S), etc. These can be used individually or in combination of 2 or more types.
作為合金體之一例之Fe系合金,例如可列舉磁性不鏽鋼(Fe-Cr-Al-Si合金)(包含電磁不鏽鋼)、鐵矽鋁合金(Fe-Si-Al合金)(包含超級鐵矽鋁合金)、坡莫合金(Fe-Ni合金)、Fe-Ni-Mo合金、Fe-Ni-Mo-Cu合金、Fe-Ni-Co合金、Fe-Cr合金、Fe-Cr-Al合金、Fe-Ni-Cr合金、Fe-Ni-Cr-Si合金、矽銅(Fe-Cu-Si合金)、Fe-Si合金、Fe-Si-B(-Cu-Nb)合金、Fe-B-Si-Cr合金、Fe-Si-Cr-Ni合金、Fe-Si-Cr合金、Fe-Si-Al-Ni-Cr合金、Fe-Ni-Si-Co合金、Fe-N合金、Fe-C合金、Fe-B合金、Fe-P合金、鐵氧體(包含不鏽鋼系鐵氧體、進而Mn-Mg系鐵氧體、Mn-Zn系鐵氧體、Ni-Zn系鐵氧體、Ni-Zn-Cu系鐵氧體、Cu-Zn系鐵氧體、Cu-Mg-Zn系鐵氧體等軟鐵氧體、鐵鈷合金(Fe-Co合金)、Fe-Co-V合金、Fe基非晶合金等。Fe-based alloys as an example of the alloy body include magnetic stainless steel (Fe-Cr-Al-Si alloy) (including electromagnetic stainless steel), iron-silicon aluminum alloy (Fe-Si-Al alloy) (including super iron-silicon aluminum alloy) ), Permalloy (Fe-Ni alloy), Fe-Ni-Mo alloy, Fe-Ni-Mo-Cu alloy, Fe-Ni-Co alloy, Fe-Cr alloy, Fe-Cr-Al alloy, Fe-Ni -Cr alloy, Fe-Ni-Cr-Si alloy, silicon copper (Fe-Cu-Si alloy), Fe-Si alloy, Fe-Si-B (-Cu-Nb) alloy, Fe-B-Si-Cr alloy , Fe-Si-Cr-Ni alloy, Fe-Si-Cr alloy, Fe-Si-Al-Ni-Cr alloy, Fe-Ni-Si-Co alloy, Fe-N alloy, Fe-C alloy, Fe-B Alloys, Fe-P alloys, ferrites (including stainless steel ferrites, Mn-Mg ferrites, Mn-Zn ferrites, Ni-Zn ferrites, Ni-Zn-Cu ferrites Ferrite, Cu-Zn ferrite, Cu-Mg-Zn ferrite and other soft ferrites, iron-cobalt alloy (Fe-Co alloy), Fe-Co-V alloy, Fe-based amorphous alloy, etc.
作為合金體之一例之Co系合金,例如可列舉Co-Ta-Zr及鈷(Co)基非晶合金等。Examples of Co-based alloys of alloy bodies include Co-Ta-Zr and cobalt (Co)-based amorphous alloys.
作為合金體之一例之Ni系合金,例如可列舉Ni-Cr合金等。As an example of an alloy body, Ni-based alloys include, for example, Ni-Cr alloys.
於該等軟磁體中,自磁特性之觀點來看,較佳為列舉合金體,更佳為列舉Fe系合金,進而較佳為列舉鐵矽鋁合金(Fe-Si-Al合金)。又,作為軟磁體,較佳為列舉單一金屬體,更佳為列舉以純物質狀態包含鐵元素之單一金屬體,進而較佳為列舉鐵單質或者鐵粉(羰基鐵粉)。Among these soft magnets, from the standpoint of self-magnetic properties, alloy bodies are preferably cited, Fe-based alloys are more preferably cited, and iron-silicon aluminum alloys (Fe-Si-Al alloys) are more preferably cited. In addition, as the soft magnetic material, a single metal body is preferably used, a single metal body containing an iron element in a pure state is more preferably used, and an iron element or iron powder (carbonyl iron powder) is more preferably used.
作為各向異性磁性粒子8之形狀,自各向異性之觀點來看,例如可列舉扁平狀(板狀)、針狀等,自面方向(二維)上相對磁導率良好之觀點來看,較佳為列舉扁平狀。As the shape of the anisotropic
扁平狀之各向異性磁性粒子8之扁率(扁平度)例如為8以上,較佳為15以上,且例如為500以下,較佳為450以下。扁率係例如設為將各向異性磁性粒子8之平均粒徑(平均長度)(下述)除以各向異性磁性粒子8之平均厚度所得之縱橫比而算出。The flatness (flatness) of the flat anisotropic
各向異性磁性粒子8之平均粒徑(平均長度)例如為3.5 μm以上,較佳為10 μm以上,且例如為200 μm以下,較佳為150 μm以下。若各向異性磁性粒子8為扁平狀,則其平均厚度例如為0.1 μm以上,較佳為0.2 μm以上,且例如為3.0 μm以下,較佳為2.5 μm以下。The average particle diameter (average length) of the anisotropic
黏合劑9使各向異性磁性粒子8分散於磁性層3內。又,黏合劑9於特定方向上分散於磁性層3中。較佳為,黏合劑9含有B階段熱硬化性成分之硬化物。再者,關於黏合劑9,將於下述製造方法中之第1磁性片材51、第2磁性片材52及第3磁性片材53之說明中詳細說明。The
於磁性層3中,各向異性磁性粒子8於黏合劑9內配向並且均勻地配置。In the
磁性層3於剖視時(於第1方向剖面處切斷時)具有周邊區域4及外側區域5。The
周邊區域4係配線2之周邊區域,以與配線2之整個外周面(圓周面)接觸之方式位於配線2之周圍。周邊區域4具有與配線2共有中心軸線之剖視大致圓環狀。更具體而言,周邊區域4係磁性層3中之位於自配線2之中心C至配線2之半徑R之1.5倍以內之範圍的區域。即,周邊區域4係如下區域:位於自配線2之外周緣(周邊區域4之內周緣)起朝徑向外側離開配線2之半徑R之0.5倍距離之範圍。The
周邊區域4具備第1區域11及第2區域12。The
第1區域11於周邊區域4中在圓周方向上相互隔開間隔地配置有2個。具體而言,第1區域11具備第3區域13、及相對於第3區域13隔開間隔地配置於厚度方向另一側之第4區域14。Two first regions 11 are arranged in the
第3區域13至少被覆配線2之包含厚度方向一端緣E1之外周圓弧面,例如至少被覆配線2之包含厚度方向一端緣E1之第1半圓弧(於配線2之厚度方向一側,連結配線2之第1方向兩端緣E2及E3之一個半圓弧)面23之一部分或全部。較佳為,第3區域13被覆配線2之上述第1半圓弧面23之一部分,更具體而言,於徑向上投影時,包含於配線2之一個半圓弧面,另一方面,不與配線2之第1方向兩端緣E2及E3重疊,而配置於第1方向兩端緣E2及E3之內側。The
再者,配線2之厚度方向一端緣E1係沿著厚度方向通過配線2之中心C之第1假想線L1與配線2之厚度方向一側之圓弧面(第1半圓弧面23)相交之部分。Furthermore, one end edge E1 of the thickness direction of the
又,配線2之第1方向兩端緣E2及E3係沿著第1方向通過配線2之中心C之第3假想線L3與配線2之圓周面相交之2個部分。In addition, both end edges E2 and E3 of the
第4區域14隔著配線2之中心C與第3區域13對向配置。第4區域14至少被覆配線2之包含厚度方向另一端緣E4之外周圓弧面,例如被覆配線2之包含厚度方向另一端緣E4之第2半圓弧(於配線2之厚度方向另一側,連結第1方向兩端緣E2及E3之另一半圓弧)面24之一部分。具體而言,於徑向上投影時,第4區域14包含於配線2之第2半圓弧面24,另一方面,不與配線2之第1方向兩端緣E2及E3重疊,而配置於配線2之第1方向兩端緣E2及E3之內側。The fourth area 14 is arranged to face the
配線2之厚度方向另一端緣E4係沿著厚度方向通過配線2之中心C之第1假想線L1與第2圓弧面24相交之部分。The other end edge E4 of the thickness direction of the
第3區域13之中心角C1之角度α1與第4區域14之中心角C2之角度α2係分別根據用途及目的而適當設定,其等之合計角度(α1+α2)例如未達360°,較佳為270°以下,且例如超過180°,較佳為200°以上。The angle α1 of the central angle C1 of the
具體而言,第3區域13之中心角C1之角度α1例如為90°以上,較佳為超過90°,更佳為120°以上,且例如未達180°,較佳為165°以下。又,角度α1較佳為鈍角。Specifically, the angle α1 of the central angle C1 of the
第4區域14之中心角C2之角度α2例如為15°以上,且例如為60°以下,較佳為45°以下。又,角度α2較佳為銳角。The angle α2 of the central angle C2 of the fourth region 14 is, for example, 15° or more, and for example, 60° or less, preferably 45° or less. Moreover, the angle α2 is preferably an acute angle.
第3區域13之中心角C1之角度α1相對於第4區域14之中心角C2之角度α2較大,其等之比(角度α1/角度α2)例如超過1,較佳為1.5以上,且為3以下,較佳為2以下。The angle α1 of the central angle C1 of the
於該第1區域11中,各向異性磁性粒子8沿著配線2之圓周方向配向。In the first region 11, the anisotropic
於第3區域13及第4區域14之各者中,各向異性磁性粒子8之相對磁導率較高之方向(例如,若各向異性磁性粒子8為扁平形狀,則為各向異性磁性粒子8之面方向)與圓周方向大致一致。具體而言,將各向異性磁性粒子8之面方向和與該各向異性磁性粒子8於徑向內側對向之圓周面相接之切線的角度為15°以下之情形定義為各向異性磁性粒子8沿圓周方向配向。In each of the
沿圓周方向配向之各向異性磁性粒子8之數量與第1區域11中所包含之各向異性磁性粒子8之總數之比率例如超過50%,較佳為70%以上,更佳為80%以上。即,於第1區域11中,可包含例如未達50%,較佳為30%以下,更佳為20%以下之未沿圓周方向配向之各向異性磁性粒子8。The ratio of the number of anisotropic
相對於整個周邊區域4,第1區域11之面積(第3區域13及第4區域14之總面積)比率例如為40%以上,較佳為50%以上,更佳為60%以上,且例如為90%以下,較佳為80%以下。The ratio of the area of the first area 11 (total area of the
第1區域11之圓周方向之相對磁導率例如為5以上,較佳為10以上,更佳為30以上,且例如為500以下。徑向之相對磁導率例如為1以上,較佳為5以上,且例如為100以下,較佳為50以下,更佳為25以下。又,圓周方向相對於徑向之相對磁導率之比(圓周方向/徑向)例如為2以上,較佳為5以上,且例如為50以下。若相對磁導率為上述範圍,則電感優異。The relative permeability in the circumferential direction of the first region 11 is, for example, 5 or more, preferably 10 or more, more preferably 30 or more, and for example, 500 or less. The relative magnetic permeability in the radial direction is, for example, 1 or more, preferably 5 or more, and for example, 100 or less, preferably 50 or less, and more preferably 25 or less. In addition, the ratio of relative permeability (circumferential direction/radial direction) of the circumferential direction to the radial direction is, for example, 2 or more, preferably 5 or more, and for example, 50 or less. If the relative permeability is in the above range, the inductance is excellent.
相對磁導率例如可藉由使用了磁性材料測試夾具之阻抗分析器(Agilent公司製造,「4291B」)來測定。The relative permeability can be measured by, for example, an impedance analyzer (manufactured by Agilent, "4291B") using a magnetic material test fixture.
第2區域12係各向異性磁性粒子8未沿著配線2之圓周方向配向之圓周方向非配向區域。換言之,於第2區域12中,各向異性磁性粒子8沿著配線2之圓周方向以外之方向(例如第1方向或徑向)配向或不配向。The
第2區域12於周邊區域4中在圓周方向上相互隔開間隔地配置有2個。具體而言,第2區域12具備第5區域15及第6區域16,其等隔著通過配線2之厚度方向一端緣E1及另一端緣E2之第1假想直線L1相互隔開間隔地配置。Two
第5區域15相對於第1假想直線L1配置於第1方向一側。第5區域15夾於第3區域13之圓周方向一端面與第4區域14之圓周方向另一端面之間,具體而言,連續於第3區域13之圓周方向一端面與第4區域14之圓周方向另一端面。The
第6區域16相對於第5區域15隔開間隔地對向配置於第1方向另一側。第6區域16相對於第1假想直線L1配置於第1方向另一側,且以第1假想直線L1為軸相對於第5區域15線對稱。即,第6區域16連續於第3區域13之圓周方向另一端面及第4區域14之圓周方向一端面。The
藉此,於第1區域11中,在圓周方向上依序配置有第3區域13、第5區域15、第4區域14及第6區域16。Thereby, in the first area 11, the
而且,於連結作為假想圓弧之一例之第1假想圓弧A1之中心C3與作為假想圓弧之一例之第2假想圓弧A2之中心C4的作為假想直線之一例之第2假想直線L2上,不存在配線2之中心C,上述第1假想圓弧A1連結第5區域15中之作為圓周方向一端之第1端E5及作為圓周方向另一端之第2端E6,上述第2假想圓弧A2連結第6區域16中之作為圓周方向一端之第3端E7及作為圓周方向另一端之第4端E8。Furthermore, on the second virtual straight line L2 as an example of a virtual straight line connecting the center C3 of the first virtual arc A1, which is an example of a virtual arc, and the center C4 of the second virtual arc A2, which is an example of a virtual arc , There is no center C of the
再者,第1端E5係第5區域15中位於圓周方向一端面之徑向中央部之部分。第2端E6係第5區域15中位於圓周方向另一端面之徑向中央部之部分。第3端E7係第6區域16中位於圓周方向一端面之徑向中央部之部分。第4端E8係第6區域16中位於圓周方向另一端面之徑向中央部之部分。In addition, the first end E5 is a portion located at the radial center portion of one end surface in the circumferential direction in the
具體而言,配線2之中心C隔開間隔地配置於第2假想直線L2之第1方向一側。Specifically, the center C of the
詳細而言,配線2之中心C例如相較第2假想直線L2而言,以配線2之半徑R之0.2倍以上且0.7倍以下之距離位於厚度方向一側,較佳為,相較第2假想直線L2而言,以配線2之半徑R之0.3倍以上且0.5倍以下之距離位於厚度方向一側。In detail, the center C of the
又,配線2之厚度方向另一端緣E4不存在於第2假想直線L2上,具體而言,隔開間隔地位於第2假想直線L2之厚度方向另一側。Moreover, the other end edge E4 of the thickness direction of the
又,於第2區域12(第5區域15及第6區域16之各者)中,由配向方向不同之至少2種各向異性磁性粒子8形成交叉部(頂部)20。例如,於第5區域15中,第1粒子17與第2粒子18構成大致三角形之至少兩邊,藉此,形成第1交叉部(第1頂部)21,該第1粒子17係隨著自第1端部E5(與第3區域13相接之部分)趨向第2端部E6(與第4區域14接觸之部分)而朝配線2之徑向外側配向之各向異性磁性粒子8,該第2粒子18係隨著自第2端部E6趨向第1端部E5而於第1方向上配向之各向異性磁性粒子8。具體而言,第1粒子17與第2粒子18以及第3粒子19形成大致三角形(較佳為銳角三角形),該第3粒子19係於第5區域15中配線2最接近之區域中沿圓周方向配向之各向異性磁性粒子8。Furthermore, in the second region 12 (each of the
又,於第6區域16中,第1粒子17與第2粒子18構成大致三角形之至少兩邊,藉此,形成第2交叉部(第2頂部)22,該第1粒子17係隨著自第4端E8(與第3區域13相接之部分)趨向第3端部E7(與第4區域14相接之部分)而朝配線2之徑向外側配向之各向異性磁性粒子8,該第2粒子18係隨著自第3端部E7趨向第4端E8而於第1方向上配向之各向異性磁性粒子8。具體而言,第1粒子17與第2粒子18以及第3粒子19形成大致三角形(較佳為銳角三角形),該第3粒子19係於第6區域16中配線2最接近之區域中沿圓周方向配向之各向異性磁性粒子8。Moreover, in the
於第1方向上投影時,交叉部20(第1交叉部21及第2交叉部22之各者)不與配線2之中心C重疊。具體而言,於第1方向上投影時,交叉部20隔開間隔地配置於較配線2之中心C更靠厚度方向另一側。When projecting in the first direction, the intersection 20 (each of the
又,於第1方向上投影時,交叉部20隔開間隔地配置於配線2之厚度方向另一端緣E4之厚度方向一側。In addition, when projecting in the first direction, the crossing
於第2區域12(第5區域15及第6區域16之各者)中,各向異性磁性粒子8之相對磁導率較高之方向(例如就扁平狀各向異性磁性粒子而言,為粒子之面方向)不與以配線2之中心C為中心之圓周面之切線一致。更具體而言,將各向異性磁性粒子8之面方向與該各向異性磁性粒子8所處之配線2之外周面(圓周面)所成之角度超過15度之情形定義為各向異性磁性粒子8未沿圓周方向配向。In the second region 12 (each of the
未沿圓周方向配向之各向異性磁性粒子8之數量相對於第2區域12中所包含之各向異性磁性粒子8總數的比率例如超過50%,較佳為70%以上,且例如為95%以下,較佳為90%以下。The ratio of the number of anisotropic
於第2區域12中,例如可包含沿圓周方向配向之各向異性磁性粒子8。沿圓周方向配向之各向異性磁性粒子8之數量相對於第2區域12中所包含之各向異性磁性粒子8之總數的比率例如未達50%,較佳為30%以下,且例如為5%以上,較佳為10%以上。The
再者,於包含在圓周方向上配向之各向異性磁性粒子8之情形時,較佳為沿圓周方向配向之各向異性磁性粒子8配置於第2區域12之最內側區域、即配線2之表面附近。Furthermore, when the anisotropic
第2區域12之面積(第5區域15及第6區域16之總面積)比率相對於整個周邊區域4例如為10%以上,較佳為20%以上,且例如為60%以下,較佳為50%以下,更佳為40%以下。The area ratio of the second region 12 (total area of the
而且,於周邊區域4中,各向異性磁性粒子8之填充率(存在比率)例如為40體積%以上,較佳為45體積%以上,更佳為50體積%以上,進而較佳為55體積%以上,特佳為60體積%以上。若周邊區域4中之各向異性磁性粒子8之填充率為上述下限以上,則電感器1可獲得優異之電感。Furthermore, in the
又,周邊區域4中之各向異性磁性粒子8之填充率例如為95體積%以下,較佳為90體積%以下。若各向異性磁性粒子8之填充率為上述上限以下,則電感器1具有優異之機械強度。In addition, the filling rate of the anisotropic
特別是,於第1區域11及第2區域12之各區域中,各向異性磁性粒子8之填充率例如為40體積%以上,較佳為45體積%以上,更佳為50體積%以上,進而較佳為55體積%以上,特佳為60體積%以上,且例如為95體積%以下,較佳為90體積%以下。In particular, in each of the first region 11 and the
再者,第1區域11中之各向異性磁性粒子8之填充率及第2區域12中之各向異性磁性粒子8之填充率可相同抑或不同。Furthermore, the filling rate of the anisotropic
各向異性磁性粒子8之填充率可藉由實際比重測定、SEM照片二值化等而算出。The filling rate of the anisotropic
另一方面,周邊區域4中之黏合劑9之存在比率例如為各向異性磁性粒子8之上述填充率之其餘部分。On the other hand, the abundance ratio of the
又,於周邊區域4,儘可能地抑制孔隙(空隙、間隙)之形成,較佳為配線2及磁性層3間不存在孔隙。即,周邊區域4較佳為無孔隙(void-free)。In addition, in the
外側區域5係磁性層3中除周邊區域4以外之區域。外側區域5以於周邊區域4之外側,與周邊區域4連續之方式配置。The
於外側區域5中,各向異性磁性粒子8沿著面方向(特別是第1方向)配向。In the
於外側區域5中,各向異性磁性粒子8之相對磁導率較高之方向(例如就扁平狀各向異性磁性粒子而言,為粒子之面方向)與第1方向大致一致。更具體而言,將各向異性磁性粒子8之面方向與第1方向所成之角度為15°以下之情形定義為各向異性磁性粒子8於第1方向上配向。In the
於外側區域5中,於第1方向上配向之各向異性磁性粒子8之數量相對於外側區域5中所包含之各向異性磁性粒子8之總數之比率超過50%,較佳為70%以上,更佳為90%以上。即,於外側區域5中,可包含未達50%、較佳為30%以下、更佳為10%以下之未於第1方向上配向之各向異性磁性粒子8。In the
又,外側區域5中之各向異性磁性粒子8之填充率可與周邊區域4中之各向異性磁性粒子8之填充率相同抑或不同。In addition, the filling rate of the anisotropic
於外側區域5中,第1方向之相對磁導率例如為5以上,較佳為10以上,更佳為30以上,且例如為500以下。厚度方向之相對磁導率例如為1以上,較佳為5以上,且例如為100以下,較佳為50以下,更佳為25以下。又,第1方向相對於厚度方向之相對磁導率之比(第1方向/厚度方向)例如為2以上,較佳為5以上,且例如為50以下。In the
於外側區域5中,各向異性磁性粒子8之填充率並無特別限定,例如為40體積%以上,較佳為45體積%以上,更佳為50體積%以上,進而較佳為55體積%以上。特佳為60體積%以上,且例如為95體積%以下,較佳為90體積%以下。In the
磁性層3之厚度例如為配線2之半徑R之例如2倍以上,較佳為3倍以上,且例如為20倍以下。具體而言,磁性層3之厚度例如為100 μm以上,較佳為200 μm以上,且例如為2000 μm以下,較佳為1000 μm以下。再者,磁性層3之厚度係磁性層3之一表面及另一表面間之距離。The thickness of the
2.電感器之製造方法
參照圖2A~圖3F來說明該電感器1之製造方法。2. Manufacturing method of inductor
The method of manufacturing the
該電感器1之製造方法具備第1步驟~第6步驟。於該電感器1之製造方法中,依序實施第1步驟、第2步驟及第3步驟,隨後,同時實施第4步驟、第5步驟及第6步驟。The manufacturing method of the
(第1步驟)
如圖2A所示,於第1步驟中,首先,準備配線2及作為離型膜之第1離型片材41,該第1離型片材41係基板之一例。(Step 1)
As shown in FIG. 2A, in the first step, first, the
第1離型片材41具有於面方向上延伸之大致片材形狀。第1離型片材41之材料係根據其用途及目的來適當選擇,具體而言,例如可列舉聚對苯二甲酸乙二酯(PET)等聚酯、例如聚甲基戊烯、聚丙烯等聚烯烴等。又,第1離型片材41之厚度方向一表面及/或另一表面可實施離型處理。第1離型片材41之厚度例如為1 μm以上,且例如為1000 μm以下。The
其後,於第1步驟中,將配線2及第1離型片材41配置於平板加壓機42。After that, in the first step, the
平板加壓機42具備可於厚度方向上加壓之第1板43及第2板44。於平板加壓機42中,第2板44隔開間隔地對向配置於第1板43之厚度方向一側。再者,平板加壓機42具備未圖示之熱源。The
又,於平板加壓機42,設置有腔室,該腔室係用以使配置於平板加壓機42並供於加壓機之構件處於真空狀態。In addition, the
於第1步驟中,首先,將第1離型片材41配置於第1板43,隨後,將配線2配置於第1離型片材41之厚度方向一表面。具體而言,使配線2之厚度方向另一端緣E4與第1離型片材41之一表面接觸。In the first step, first, the
再者,此時,第1離型片材41及第1板43配置於腔室內。於其後之步驟中配置之各構件均配置於腔室內。In addition, at this time, the
(第2步驟)
於第2步驟中,首先,如圖2A所示,準備第1磁性片材51。同時,準備第2離型片材45及離型緩衝片材46。(Step 2)
In the second step, first, as shown in FIG. 2A, the first
[第1磁性片材]
第1磁性片材51具有於面方向上延伸之大致片材形狀。具體而言,第1磁性片材51具有於厚度方向上對向之一表面及另一表面。[First Magnetic Sheet]
The first
第1磁性片材51係用以形成磁性層3中之至少第2區域12、第3區域13(之一部分或全部)、及外側區域5之一部分之磁性片材。The first
再者,第1磁性片材5構成為藉由第2步驟中之熱壓(參照圖2B)而變形(流動)。Furthermore, the first
又,第1磁性片材51含有作為第1磁性粒子之一例之第1各向異性磁性粒子81及第1黏合劑91。第1各向異性磁性粒子81與各向異性磁性粒子8相同。具體而言,第1磁性片材51由含有第1各向異性磁性粒子81及第1黏合劑91之第1磁性組合物形成為大致片材形狀。In addition, the first
於該第1磁性片材51中,藉由第1黏合劑91使第1各向異性磁性粒子81以於面方向上配向之方式均勻地分散。In the first
第1磁性片材51係單片片材或複數片片材之積層體(積層片材),較佳為積層片材,更佳為包含內側片材54及外側片材55之2層片材,該內側片材54於熱壓時與配線2接觸,該外側片材55配置於內側片材之厚度方向一側。The first
第1磁性組合物(第1磁性片材51)中之第1各向異性磁性粒子81之體積比率例如為40體積%以上,較佳為45體積%以上,更佳為50體積%以上,進而較佳為55體積%以上,特佳為60體積%以上,且例如為95體積%以下,較佳為90體積%以下。若第1各向異性磁性粒子81之體積比率為上述範圍,則可於周邊區域4中密集地配置第1各向異性磁性粒子81。藉此,可獲得電感優異之電感器1。The volume ratio of the first anisotropic
又,第1磁性組合物(第1磁性片材51)中之第1各向異性磁性粒子81之體積比率例如亦宜為40體積%以下,進而為35體積%以下,且為20體積%以上,進而為25體積%以上。若第1各向異性磁性粒子81之體積比率為上述範圍,則可儘可能地抑制周邊區域4中之孔隙之存在,因此,可於周邊區域4中,將第1各向異性磁性粒子81與第2各向異性磁性粒子82及第3各向異性磁性粒子83(下述)一起密集地配置。其結果,可獲得電感優異之電感器1。In addition, the volume ratio of the first anisotropic
若第1磁性片材51係內側片材54與外側片材55之2層積層片材,則外側片材55之各向異性磁性粒子8之體積比率較佳為高於內側片材54之體積比率。如此一來,第1磁性片材51可更靈活地追隨於配線2之圓周面中剖視時超過180°之區域(以下稱為優弧(major arc))。If the first
作為第1黏合劑91,例如可列舉丙烯酸系樹脂等熱塑性成分、例如環氧樹脂組合物等熱硬化性成分。丙烯酸系樹脂例如包含含羧基之丙烯酸酯共聚物。環氧樹脂組合物例如包含作為主劑之環氧樹脂(例如甲酚酚醛清漆型環氧樹脂等)、環氧樹脂用硬化劑(例如酚系樹脂等)、及環氧樹脂用硬化促進劑(例如咪唑化合物等)。Examples of the first adhesive 91 include thermoplastic components such as acrylic resins, and thermosetting components such as epoxy resin compositions. The acrylic resin includes, for example, a carboxyl group-containing acrylate copolymer. The epoxy resin composition contains, for example, an epoxy resin (for example, a cresol novolak type epoxy resin, etc.) as a main agent, a hardener for epoxy resin (for example, a phenol resin, etc.), and a hardening accelerator for epoxy resin ( For example, imidazole compounds, etc.).
作為第1黏合劑91,可分別單獨使用或併用熱塑性成分及熱硬化性成分,較佳為併用熱塑性成分及熱硬化性成分。As the
即,較佳為,第1黏合劑91至少含有熱硬化性成分。若第1黏合劑91至少含有熱硬化性成分,則可使第1磁性片材51成為具有流動性之B階段,而供第1各向異性磁性粒子81以較高之調配比率均勻地分散,並且於第2步驟之熱壓中,第1磁性片材51可靈活地變形,且追隨並被覆於配線2之圓周面處之優弧。That is, it is preferable that the first adhesive 91 contains at least a thermosetting component. If the
再者,關於第1黏合劑91(第1磁性組合物)之更詳細之配方,記載於日本專利特開2014-165363號公報等中。Furthermore, a more detailed formulation of the first adhesive 91 (first magnetic composition) is described in Japanese Patent Laid-Open No. 2014-165363 and the like.
第1磁性組合物(第1磁性片材51)中之第1黏合劑91之體積比率係上述磁性粒子48之體積比率之其餘部分。The volume ratio of the
為了製作第1磁性片材51,將第1各向異性磁性粒子81及第1黏合劑91進行調配,將其等均勻地混合而製備第1磁性組合物。此時,將視需要使用溶劑(有機溶劑)來製備第1磁性組合物之清漆。其後,將清漆塗佈於未圖示之剝離膜並乾燥,製作第1磁性片材51。In order to produce the first
第1磁性片材51之厚度(若為積層片材則為總厚度)係適當設定為維持可藉由第2步驟之熱壓而被覆外側區域5之至少配線2之厚度方向一端緣E1之形狀。具體而言,第1磁性片材51之厚度為配線2之半徑R之例如3倍以下,較佳為2倍以下,更佳為未達2倍,進而較佳為1.5倍以下,特佳為1.25倍以下,且例如為0.1倍以上,較佳為0.2倍以上。The thickness of the first magnetic sheet 51 (in the case of a laminated sheet, the total thickness) is appropriately set to maintain a shape that can cover at least one end E1 of the
(第2離型片材)
第2離型片材45具有與第1離型片材41相同之構成,由上述可知,其材料係根據用途及目的而適當選擇。(Second release sheet)
The
(離型緩衝片材)
離型緩衝片材46係可於隨後說明之第2步驟中,在熱壓後(參照圖2C)使第1磁性片材51自第2板44分離之離型片材。又,離型緩衝片材46亦為用於如下用途之緩衝片材,於第2步驟中之熱壓時(參照圖2B),使第2板44之壓力對應於配線2之圓周面之優弧之形狀,分散地作用於第1磁性片材51,使第1磁性片材51產生變形,從而使第1磁性片材51追隨於配線2之圓周面之優弧。(Release buffer sheet)
The
離型緩衝片材46具有於面方向上延伸之片材形狀,且具有厚度方向一表面及另一表面。The
離型緩衝片材46之一表面可於第2步驟中,與第2板44(下述)呈面狀接觸。離型緩衝片材46之一表面係沿著面方向之平坦面。One surface of the
離型緩衝片材46之另一表面可與第2離型片材45之厚度方向一表面接觸,而使第1磁性片材51變形。離型緩衝片材46之另一表面與一表面隔開間隔地對向配置於厚度方向另一側。離型緩衝片材46之另一表面係平行於一表面,且沿著面方向之平坦面。The other surface of the
離型緩衝片材46於厚度方向一側依序具備第1層47、第2層48及第3層49。The
(第1層)
第1層47係針對第1磁性片材51之離型層(第1離型層)。第1層47係具有沿著面方向延伸之形狀之薄膜(皮膜)。又,第1層47係自厚度方向另一側被覆隨後說明之第2層48之被覆層(外殼層)。對第1層47之厚度方向另一表面可實施適當之剝離處理。(Level 1)
The
第1層47具有如下物性:於隨後之第2步驟之熱壓中,可介隔第2離型片材45追隨於第1磁性片材51之一表面,另一方面,其厚度於熱壓前後實質上未變化。又,第1層47係可於熱壓中在面方向(具體而言為第1方向)上伸長之層。再者,第1層47於第2步驟中之熱壓溫度(例如110℃)下,較隨後說明之第2層48硬。The
作為第1層47之材料,可列舉非熱流動材料,該非熱流動材料藉由下述第2步驟中之熱壓而至少不於第1方向上流動。As the material of the
非熱流動材料含有例如聚對苯二甲酸丁二酯(PBT)等芳香族聚酯、及例如聚烯烴等作為主成分。The non-heat-flowing material contains, for example, aromatic polyester such as polybutylene terephthalate (PBT), and, for example, polyolefin as main components.
(第2層)
第2層48係夾於第1層47及第3層49之間之中間層。第2層48係流動層,其於第1步驟中之熱壓時,於第1方向及厚度方向上流動,使第1層47追隨於第1磁性片材51之一表面。(Level 2)
The
第2層48係較第1層47柔軟之柔軟層,具體而言,可於第2步驟中之熱壓時變形。具體而言,第2層48之110℃下之拉伸儲存模數E'例如低於第1層47之110℃下之拉伸儲存模數E'。The
作為第2層48之材料,可列舉藉由下述第2步驟中之熱壓而於第1方向及厚度方向上流動之熱流動材料。熱流動材料例如包含烯烴-(甲基)丙烯酸酯共聚物(乙烯-(甲基)丙烯酸甲酯共聚物等)、或烯烴-乙酸乙烯酯共聚物等作為主成分。As the material of the
(第3層)
第3層49係針對第2板44之離型層(第2離型層)。第3層49之形狀、物性、材料及厚度與第1層47之形狀、物性、材料及厚度相同。(Level 3)
The
(離型緩衝片材之厚度)
離型緩衝片材46之厚度例如為50 μm以上,且例如為500 μm以下。又,第1層47及第3層49之厚度分別例如為5 μm以上、50 μm以下,第2層48之厚度例如為30 μm以上、300 μm以下。第2層48之厚度與第1層47之厚度之比率例如為2以上,較佳為5以上,更佳為7以上,且例如為15以下。(Thickness of release buffer sheet)
The thickness of the
離型緩衝片材46可使用市售品,例如使用離型膜OT-A、離型膜OT-E等離型膜OT系列(積水化學工業公司製造)等。For the
然後,藉由平板加壓機42依序夾住第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。Then, the
繼而,藉由平板加壓機42介隔第1離型片材41、第2離型片材45及離型緩衝片材46,對配線2及第1磁性片材51進行熱壓。Then, the
例如,使第2板44以接近第1板43之方式移動,介隔離型緩衝片材46及第2離型片材45將第2板44向第1磁性片材51壓抵(加壓)。For example, the
同時,藉由熱源將第1磁性片材51與離型緩衝片材46進行加熱。At the same time, the first
加壓壓力例如為0.1 MPa以上,較佳為0.3 MPa以上,且例如為10 MPa以下,較佳為5 MPa以下。The pressurizing pressure is, for example, 0.1 MPa or more, preferably 0.3 MPa or more, and for example, 10 MPa or less, preferably 5 MPa or less.
加熱溫度具體而言例如為100℃以上,較佳為105℃以上,且例如為190℃以下,較佳為150℃以下。Specifically, the heating temperature is, for example, 100°C or higher, preferably 105°C or higher, and, for example, 190°C or lower, preferably 150°C or lower.
加壓時間例如為10秒以上,較佳為20秒以上,且例如為1000秒以下,較佳為100秒以下。The pressing time is, for example, 10 seconds or more, preferably 20 seconds or more, and for example, 1000 seconds or less, preferably 100 seconds or less.
於第2步驟中,藉由第2板44相對於第1板43移動,而將腔室封閉,繼而,使腔室內之環境為真空狀態,繼而,第1板43、第1離型片材41、配線2、第1磁性片材51、第2離型片材45、離型緩衝片材46及第2板44該等於厚度方向上鄰接之構件彼此相互接觸(緊貼、密接),繼而,第2板44進一步移動(熱壓開始)。In the second step, the chamber is closed by moving the
於是,於厚度方向上投影時,離型緩衝片材46中與配線2重疊之重疊部分34因配線2之第1半圓弧面23及第2板44而於厚度方向上變窄的同時被擠壓(夾壓)。Therefore, when projecting in the thickness direction, the overlapped
另一方面,於厚度方向上投影時,離型緩衝片材46中不與配線2重疊之非重疊部分35不會受到上述夾壓。On the other hand, when projecting in the thickness direction, the
於是,第2層48之重疊部分34中之熱流動材料朝向非重疊部分35流動(擠出)(變形)(詳細而言為塑性變形)。於是,於非重疊部分35,基於來自上述重疊部分34之熱流動材料之流動(擠出)之流動壓力增大。非重疊部分35之流動壓力作用於厚度方向之兩側。Then, the hot-fluid material in the overlapping
流動壓力中之作用於厚度方向另一側之流動壓力將非重疊部分35之第1層47朝厚度方向另一側擠出(壓下),並且介隔該第1層47將第1磁性片材51中與非重疊部分35於厚度方向上對向之被擠出部分38朝厚度方向另一側擠出(壓下)。Among the flow pressures, the flow pressure acting on the other side of the thickness direction extrudes (presses down) the
其後,基於上述流動壓力產生之被擠出部分38之擠出(壓下)持續至被擠出部分38包裹配線2之第1方向兩端緣E3及E4,進而被覆(接觸到)配線2之第2圓弧面24(但,厚度方向另一端緣E4除外)為止。Thereafter, the extrusion (pressing) of the extruded
然後,藉由被擠出部分38與第2圓弧面24接觸,如圖2B所示,形成第2區域12。Then, as the extruded
於熱壓後,離型緩衝片材46之另一表面例如具有與配線2之第1半圓弧面23對應之形狀。After hot pressing, the other surface of the
第2離型片材45追隨於離型緩衝片材46之另一表面,具體而言追隨於第1層47。The
再者,熱壓後之第1磁性片材51例如為B階段。具體而言,第1磁性片材51之第1黏合劑91所含有之熱硬化性成分為B階段。Furthermore, the first
藉此,熱壓後之第1磁性片材51具有至少包含上述第2區域12之形狀。即,如圖2B之放大圖所示,於第2區域12中,各向異性磁性粒子8未沿著配線2之圓周方向配向。Thereby, the first
又,第1磁性片材51具有隆起部25及平坦部26。In addition, the first
隆起部25被覆配線2之外周面(厚度方向另一端緣E4除外),且具有與第1半圓弧面23類似(或者相似)之剖視彎曲形狀。隆起部25具有第1方向中央朝向厚度方向一側突出(隆起)之形狀。隆起部25具有1個第2頂部27。The raised
平坦部26具有自隆起部25之第1方向兩端面朝第1方向兩外側分別延伸之大致平板形狀。The
藉此,第1磁性片材51以被覆配線2之圓周面之優弧之方式,配置於第1離型片材41之厚度方向一表面。Thereby, the first
配線2之圓周面之優弧係自第1半圓弧面23及其圓周方向兩端之各者沿著圓周方向趨向厚度方向另一端緣E4,但未到達厚度方向另一端緣E4之圓弧面(圓周面之一部分)。The superior arc of the circumferential surface of the
熱壓後之第1磁性片材51之厚度係以確保具有上述隆起部25及平坦部26之形狀之方式設定。具體而言,第1磁性片材51之第2頂部27處之厚度與配線2之半徑R之比率例如為0.01以上,較佳為0.03以上,且例如為8以下,較佳為2以下。平坦部26之厚度與配線2之半徑R之比率例如為0.05以上,較佳為0.2以上,且例如未達5,較佳為1.5以下。The thickness of the first
具體而言,第1磁性片材51之第2頂部27處之厚度例如為1 μm以上,較佳為5 μm以上,且例如為200 μm以下,較佳為100 μm以下。又,平坦部26之厚度例如為25 μm以上,較佳為50 μm以上,且例如為200 μm以下,較佳為150 μm以下。Specifically, the thickness at the second
(第3步驟)
於第3步驟中,首先,解除圖2B所示之平板加壓機42之加壓,繼而,自平板加壓機42取出第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。(Step 3)
In the third step, first, the pressurization of the
繼而,如圖2C所示,將第1離型片材41自第1磁性片材51之另一表面及配線2之厚度方向另一端緣E4剝離。Then, as shown in FIG. 2C, the
又,將第2離型片材45及離型緩衝片材46自第1磁性片材51之一表面剝離。In addition, the
(第4步驟、第5步驟及第6步驟)
如圖3E所示,同時實施第4步驟、第5步驟及第6步驟。(
於第4步驟中,藉由第2磁性片材52被覆第1磁性片材51之厚度方向一表面。於第5步驟中,藉由第3磁性片材53被覆第1磁性片材51之厚度方向另一表面。於第6步驟中,使第1黏合劑91(參照圖2A)、第2黏合劑92(參照圖3D)及第3黏合劑93(參照圖3D)之熱硬化性成分C階段化。In the fourth step, one surface of the first
如圖3D所示,於第4步驟及第5步驟中,首先,準備第2磁性片材52及第3磁性片材53。As shown in FIG. 3D, in the fourth step and the fifth step, first, the second
第2磁性片材52及第3磁性片材53之各者可具有與第1磁性片材51相同之構成。Each of the second
再者,第2磁性片材52含有第2各向異性磁性粒子82及第2黏合劑92,於第2黏合劑92中,例如,第2各向異性磁性粒子82於面方向上配向。第2黏合劑92所含有之熱硬化性成分為B階段,因此第2磁性片材52為B階段。又,第2磁性片材52若為積層體(積層片材),則各片材之第2各向異性磁性粒子82之存在比率相同或不同,較佳為相同。又,第2磁性片材52中之第2各向異性磁性粒子82之存在比率可與第1各向異性磁性粒子81之存在比率相同或不同。Furthermore, the second
當第2各向異性磁性粒子82之存在比率與第1各向異性磁性粒子81之存在比率不同,且第1各向異性磁性粒子81之存在比率為40體積%以下時,可將第2各向異性磁性粒子82之存在比率設定為高於第1各向異性磁性粒子81之存在比率。具體而言,第2磁性片材52中之第2各向異性磁性粒子82之存在比率與第1磁性片材51中之第1各向異性磁性粒子81之存在比率之比(第2磁性片材52中之第2各向異性磁性粒子82之存在比率/第1磁性片材51中之第1各向異性磁性粒子81之存在比率)例如為1.1以上,較佳為1.2以上,更佳為1.5以上,且例如為3以下,較佳為2.5以下。於此情形時,具體而言,第2磁性片材52中之第2各向異性磁性粒子82之存在比率例如為45體積%以上,較佳為50體積%以上,更佳為55體積%以上,進而較佳為60體積%以上,且例如為95體積%以下,較佳為90體積%以下。When the existence ratio of the second anisotropic
若第2各向異性磁性粒子82之上述比及/或存在比率處於上述範圍內,則可儘可能地抑制第2磁性片材52與第1磁性片材51之間存在孔隙。因此,可於周邊區域4中密集地配置第1各向異性磁性粒子81及第2各向異性磁性粒子82。其結果,可獲得電感優異之電感器1。If the above-mentioned ratio and/or the existence ratio of the second anisotropic
第2磁性片材52之厚度(若為積層片材則為總厚度)為配線2之半徑R之例如0.5倍以上,較佳為1倍以上,更佳為1.5倍以上,且例如為5倍以下,較佳為3倍以下。The thickness of the second magnetic sheet 52 (in the case of a laminated sheet, the total thickness) is, for example, 0.5 times or more of the radius R of the
第3磁性片材53含有作為第3磁性粒子之一例之第3各向異性磁性粒子83及第3黏合劑93,例如,於第3黏合劑93中,第3各向異性磁性粒子83於面方向上配向。第3黏合劑93所含有之熱硬化性成分為B階段,因此第3磁性片材53為B階段。又,第3磁性片材53若為積層體(積層片材),則各片材與第3各向異性磁性粒子83之存在比率相同或不同,較佳為相同。又,第3磁性片材53中之第3各向異性磁性粒子83之存在比率可與第1各向異性磁性粒子81之存在比率相同或不同。The third
當第3各向異性磁性粒子83之存在比率與第1各向異性磁性粒子81之存在比率不同,且第1各向異性磁性粒子81之存在比率為40體積%以下時,將第3各向異性磁性粒子83之存在比率設定為高於第1各向異性磁性粒子81之存在比率。具體而言,第3磁性片材53中之第3各向異性磁性粒子83之存在比率與第1磁性片材51中之第1各向異性磁性粒子81之存在比率之比(第3磁性片材53中之第3各向同性磁性粒子83之存在比率/第1磁性片材51中之第1各向異性磁性粒子81之存在比率)例如為1.1以上,較佳為1.2以上,更佳為1.5以上,且例如2.5以下,較佳為2以下。於此情形時,具體而言,第3磁性片材53中之第3各向異性磁性粒子83之存在比率例如為40體積%以上,較佳為45體積%以上,更佳為50體積%以上,進而較佳為55體積%以上,特佳為60體積%以上,且例如為95體積%以下,較佳為90體積%以下。When the existence ratio of the third anisotropic
若第3各向異性磁性粒子83之上述比及/或存在比率處於上述範圍內,則可儘可能地抑制第3磁性片材53與第1磁性片材51之間存在孔隙,其結果,可於周邊區域4中密集地配置第1各向異性磁性粒子81及第3各向異性磁性粒子83。因此,可獲得電感優異之電感器1。If the above-mentioned ratio and/or the abundance ratio of the third anisotropic
第3磁性片材53之厚度(若為積層片材則為總厚度)為配線2之半徑R之例如0.5倍以上,較佳為1倍以上,且例如為5倍以下,較佳為3倍以下。The thickness of the third magnetic sheet 53 (in the case of a laminated sheet, the total thickness) is, for example, 0.5 times or more of the radius R of the
隨後,將第2磁性片材52及第3磁性片材53配置於平板加壓機42。具體而言,於第1板43及第2板44之間,朝向厚度方向一側依序配置第1離型片材41、第3磁性片材53、配線2及第1磁性片材51、第2磁性片材52、以及第2離型片材45。Subsequently, the second
再者,第1離型片材41及/或第2離型片材45可再利用上述第3步驟中所去除之第1離型片材41及/或第2離型片材45,還可準備並配置其他第1離型片材41及/或第2離型片材45。Furthermore, the
再者,於該第4步驟及第5步驟之熱壓中,未將如第2步驟中使用之離型緩衝片材46配置於平板加壓機42。Furthermore, in the hot pressing of the fourth step and the fifth step, the
隨後,藉由平板加壓機將第3磁性片材53、配線2及第1磁性片材51、以及第2磁性片材52進行熱壓。熱壓之條件與第2步驟中之條件相同。Subsequently, the third
第2磁性片材52之另一表面藉由熱壓而追隨於第1磁性片材51之隆起部25之形狀。但,第2磁性片材52之一表面維持其平坦形狀。The other surface of the second
即,第2磁性片材52被覆第1磁性片材51之厚度方向一表面,該第1磁性片材51被覆配線2之圓周面之優弧及第1離型片材41之一表面(實施第4步驟)。That is, the second
又,第3磁性片材53之另一表面藉由熱壓而維持其平坦形狀。In addition, the other surface of the third
另一方面,於第3磁性片材53之一表面中,與配線2之厚度方向另一端緣E4對向之對向部28朝厚度方向另一側略微移動(後退、下降、陷入)。即,於第3磁性片材53之一表面中,對向部28朝其第1方向外側移動,相對於與第1離型片材41之一表面平行之第2平坦部29,朝厚度方向一側略微凹下。On the other hand, on one surface of the third
第1磁性片材51之另一表面與第3磁性片材53之一表面之第2平坦部分29緊貼,相對於配線2之厚度方向另一端緣E4朝厚度方向一側略微移動。The other surface of the first
即,第3磁性片材53以被覆自第1磁性片材51之厚度方向另一表面露出之配線2之圓周面(包含厚度方向另一端緣E4之圓弧面)之方式,配置於第1磁性片材51之厚度方向另一表面(實施第5步驟)。That is, the third
藉此,於厚度方向上投影時,在與配線2重疊之部分中,朝向厚度方向一側依序配置有第3磁性片材53、配線2、第1磁性片材51及第2磁性片材52。又,於厚度方向上投影時,在不與配線2重疊之部分中,朝向厚度方向一側依序配置有第3磁性片材53、第1磁性片材51及第2磁性片材52。Thereby, when projecting in the thickness direction, the third
藉由上述熱壓,與第4步驟及第5步驟同時實施第6步驟。By the above-mentioned hot pressing, the sixth step is performed simultaneously with the fourth step and the fifth step.
選擇熱壓之條件,以便可使第1黏合劑91、第2黏合劑92及第3黏合劑93之熱硬化性C階段化。The conditions of the hot pressing are selected so that the thermosetting properties of the
於該第6步驟中,第1磁性片材51中之第1黏合劑91、第2磁性片材52中之第2黏合劑92及第3磁性片材53中之第3黏合劑93藉由上述熱壓而C階段化。In this sixth step, the first adhesive 91 in the first
因此,黏合劑9含有B階段熱硬化性成分之硬化物(C階段狀物)。Therefore, the adhesive 9 contains a cured product of a B-stage thermosetting component (C-stage product).
再者,藉由第1磁性片材51、第2磁性片材52及第3磁性片材53之C階段化,第1磁性片材51及第2磁性片材52之邊界、以及第1磁性片材51及第3磁性片材53之邊界分別消失,形成包含第1磁性片材51、第2磁性片材52及第3磁性片材53之一個磁性層3(參照圖1A)。但,於圖3F中記載了上述邊界,以便明確地示出第1磁性片材51、第2磁性片材52及第3磁性片材53之配置。Furthermore, by the C-stageization of the first
3.用途
電感器1係電子機器之一零件、即用以製作電子機器之零件,且係不包含電子元件(晶片、電容器等)或供安裝電子元件之安裝基板,而以單個零件之形式流通,可於產業上利用之器件。3.
電感器1例如搭載(組裝)於電子機器等。雖未圖示,但電子機器具備安裝基板及安裝於安裝基板之電子元件(晶片、電容器等)。而且,電感器1經由焊料等連接構件安裝於安裝基板,且與其他電子機器電性連接,作為線圈等無源元件發揮作用。The
而且,於該方法中,如圖2B所示,於第2步驟中,將第1磁性片材51以被覆配線2之優弧之方式配置於第1離型片材41之厚度方向一表面,故而可於被覆與配線2之優弧對應之區域之第1磁性片材51中,使各向異性磁性粒子8沿著配線2之圓周方向配向。因此,所獲得之電感器1電感優異。Furthermore, in this method, as shown in FIG. 2B, in the second step, the first
又,於第2步驟中,將第1磁性片材51配置於第1離型片材41之厚度方向一表面,故而於第1磁性片材51中,第1各向異性磁性粒子81沿著第1離型片材41之厚度方向一表面配向。因此,可抑制於面向第1離型片材41之厚度方向一表面且與配線2之優弧對應之區域中之圓周方向兩端緣、即第2區域12中,使第1各向異性磁性粒子81沿著配線2之圓周方向配向,因此,電感器1之直流重疊特性優異。In the second step, the first
並且,由於第1磁性片材51被覆配線2之圓周面之優弧,故而於該優弧之圓周方向兩端緣,可使第1各向異性磁性粒子81之配向方向自配線2之圓周方向變化為沿著第1離型片材41之一表面之方向,並且密集地配置第1各向異性磁性粒子81。其結果,能夠製造電感優異之電感器1。In addition, since the first
進而,如圖3F所示,於第4步驟中,第2磁性片材52被覆第1磁性片材51之厚度方向一表面,故而可使配線2之周邊區域4中之包含第1各向異性磁性粒子81及第2各向異性磁性粒子82之各向異性磁性粒子8之配置密集。因此,可製造電感更優異之電感器1。Furthermore, as shown in FIG. 3F, in the fourth step, the second
因此,根據該製造方法,可使周邊區域4中之各向異性磁性粒子8之配置密集,故而能夠製造具有優異之電感,並且直流重疊特性亦優異之電感器1。Therefore, according to this manufacturing method, the anisotropic
又,於該方法中,如圖3F所示,將第3磁性片材53進而配置於第1磁性片材51之厚度方向另一表面,故而可使配線2之周邊區域4中之包含第1各向異性磁性81、第2各向異性磁性粒子及第3各向異性磁性粒子83之各向異性磁性粒子8之配置密集。因此,可製造電感更優異之電感器1。Furthermore, in this method, as shown in FIG. 3F, the third
特別是,由於第3磁性片材53被覆自第1磁性片材51之厚度方向另一表面露出之圓周面,故而可於與自第1磁性片材51露出之配線2之圓周面對應之區域中,密集地配置第3各向異性磁性粒子83。其結果,能夠製造電感優異之電感器1。In particular, since the third
又,於該方法中,同時實施第4步驟及第5步驟,故而與依序實施第4步驟及第5步驟之方法(參照下述變化例)相比,可縮短製造時間。因此,能夠高效地製造電感器1。In addition, in this method, the fourth step and the fifth step are simultaneously performed, and therefore, the manufacturing time can be shortened compared with the method of sequentially performing the fourth step and the fifth step (refer to the following modification example). Therefore, the
於該方法中,於第6步驟中,使第1黏合劑91及第3黏合劑93之B階段熱硬化性成分同時C階段化,故而與依序對第1黏合劑91及第3黏合劑93之B階段熱硬化性成分之實施C階段化之方法(參照下述變化例)相比,可縮短製造時間(參照下述變化例)。因此,能夠高效地製造電感器。In this method, in the sixth step, the B-stage thermosetting components of the
<第1實施形態之變化例> 於變化例中,對與第1實施形態相同之構件及步驟附上相同之參照符號,並省略其詳細之說明。又,除特別記載以外,變化例發揮與第1實施形態相同之作用效果。進而,可將第1實施形態及其變化例適當組合。<Variations of the first embodiment> In the modified example, the same reference numerals are attached to the same members and steps as in the first embodiment, and detailed descriptions thereof are omitted. In addition, the modified example exhibits the same functions and effects as the first embodiment except for special descriptions. Furthermore, the first embodiment and its modification examples can be appropriately combined.
於第1實施形態中,第4步驟及第5步驟與第6步驟同時實施。但是,可實施第4步驟及第5步驟,然後實施第6步驟。In the first embodiment, the fourth step and the fifth step are implemented simultaneously with the sixth step. However, steps 4 and 5 can be implemented, and then step 6 can be implemented.
於第1實施形態中,第4步驟與第5步驟同時實施。但是,亦可依序實施第4步驟與第5步驟。具體而言,於該變化例中,如圖4A~圖6H所示,依序實施第1步驟、第2步驟、第4步驟、第3步驟、第5步驟及第6步驟。In the first embodiment, the fourth step and the fifth step are implemented simultaneously. However, the fourth step and the fifth step can also be performed in sequence. Specifically, in this modified example, as shown in FIGS. 4A to 6H, the first step, the second step, the fourth step, the third step, the fifth step, and the sixth step are sequentially performed.
如圖4A所示,於第1步驟中,將配線2配置於第1離型片材41之厚度方向一表面。As shown in FIG. 4A, in the first step, the
隨後,如圖4B所示,於第2步驟中,利用平板加壓機42夾住第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46,隨後,利用平板加壓機42介隔第1離型片材41、第2離型片材45及離型緩衝片材46將配線2及第1磁性片材51進行熱壓。藉此,將第1磁性片材51以被覆配線2之圓周面之優弧之方式,配置於第1離型片材41之厚度方向一表面。Subsequently, as shown in FIG. 4B, in the second step, the
隨後,如圖5D所示,實施第4步驟。具體而言,首先,解除圖4B所示之平板加壓機42之加壓,繼而,如圖4C所示,於將第1離型片材41、配線2及第1磁性片材51配置於平板加壓機42之狀態下,自平板加壓機42取出第2離型片材45及離型緩衝片材46。Subsequently, as shown in FIG. 5D, the fourth step is implemented. Specifically, first, the pressurization of the
其後,於第4步驟中,將第2磁性片材52及第2離型片材45另行配置於第1磁性片材51之厚度方向一側。After that, in the fourth step, the second
繼而,如圖5D所示,使用平板加壓機42對第2磁性片材52進行熱壓。藉此,第2磁性片材52被覆第1磁性片材51之一表面。Then, as shown in FIG. 5D, the second
如圖6G所示,實施第3步驟。具體而言,首先,解除圖5D所示之平板加壓機42之加壓,自平板加壓機42取出第1離型片材41、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45。As shown in Fig. 6G, the third step is implemented. Specifically, first, the pressurization of the
於第3步驟中,繼而,如圖5E所示,將第1離型片材41自第1磁性片材51之另一表面及配線2之厚度方向另一端緣E4剝離。In the third step, then, as shown in FIG. 5E, the
隨後,如圖5F所示,實施第5步驟。Subsequently, as shown in FIG. 5F, the fifth step is implemented.
具體而言,於第5步驟中,將第1離型片材41、第3磁性片材53、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45配置於平板加壓機42。Specifically, in the fifth step, the
於第5步驟中,如圖6G所示,藉由平板加壓機42對第3磁性片材53進行熱壓。藉此,將第3磁性片材53以被覆配線2之厚度方向另一端緣E4之方式配置於B階段之第1磁性片材51之另一表面。此時,配線2之厚度方向另一端緣E4陷入對向部。In the fifth step, as shown in FIG. 6G, the third
於第5步驟之後或者與第5步驟同時地實施第6步驟。具體而言,使第1磁性片材51、第2磁性片材52及第3磁性片材53予以C階段化,而形成C階段磁性層3。藉此,獲得具備配線2及被覆配線2之磁性層3之電感器1。Perform the sixth step after the fifth step or simultaneously with the fifth step. Specifically, the first
其後,如圖6H所示,自平板加壓機42取出電感器1。After that, as shown in FIG. 6H, the
該變化例及第1實施形態中,較佳為第1實施形態。若為第1實施形態,則同時實施第4步驟及第5步驟,故而可減少製造步驟數,可容易地製造電感器1。Among the modified examples and the first embodiment, the first embodiment is preferable. In the first embodiment, since the fourth step and the fifth step are performed at the same time, the number of manufacturing steps can be reduced, and the
於第1實施形態之第2步驟中,如圖2B所示,將第2離型片材45配置於平板加壓機42,但亦可不配置第2離型片材45而實施熱壓。In the second step of the first embodiment, as shown in FIG. 2B, the
於第2磁性片材52中,第2各向異性磁性粒子82於面方向上配向,但第2各向異性磁性粒子82亦可不於面方向上配向。In the second
<第2實施形態> 於第2實施形態中,對與第1實施形態及其變化例相同之構件及步驟附上相同之參照符號,並省略其詳細之說明。又,除特別記載以外,第2實施形態可發揮與第1實施形態及其變化例相同之作用效果。進而,可適當地組合第1實施形態、第2實施形態及其等之變化例。<The second embodiment> In the second embodiment, the same reference numerals are attached to the same members and steps as in the first embodiment and its modifications, and detailed descriptions thereof are omitted. In addition, the second embodiment can exhibit the same effects as those of the first embodiment and its modifications except for special descriptions. Furthermore, it is possible to appropriately combine the first embodiment, the second embodiment, and modification examples thereof.
於圖1A~圖1B所示之第1實施形態中,於厚度方向上投影時,交叉部20隔開間隔地配置於配線2之厚度方向另一端緣E4之厚度方向一側,例如,如圖7A~圖7B所示,亦可與配線2之厚度方向另一端緣E4重疊。In the first embodiment shown in FIGS. 1A to 1B, when projecting in the thickness direction, the
如圖7A~圖7B所示,第2實施形態之電感器1之第4區域14較第1實施形態之電感器1之第4區域14窄。具體而言,第4區域14之中心角C2之角度α2未達15°且超過0°。As shown in FIGS. 7A to 7B, the fourth area 14 of the
其次,參照圖8A~圖9F來說明該電感器1之製造方法。Next, a method of manufacturing the
電感器1之製造方法具備第1步驟~第6步驟。於該電感器1之製造方法中,依序實施第1步驟、第2步驟及第3步驟,隨後,同時實施第4步驟及第5步驟。又,第6步驟係分批地實施,具體而言,分割為第2步驟中之熱壓時、以及第4步驟及第5步驟中之熱壓時來實施。The method of manufacturing the
(第1步驟)
如圖8A所示,於第1步驟中,將配線2配置於第1離型片材41之厚度方向一表面。(Step 1)
As shown in FIG. 8A, in the first step, the
(第2步驟及第6步驟之一部分)
隨後,如圖8B所示,藉由平板加壓機42依序夾住第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。繼而,藉由平板加壓機42對第1磁性片材51進行熱壓。藉此,第1磁性片材51以被覆配線2之圓周面之優弧之方式,配置於第1離型片材41之厚度方向一表面。(Part of
於第2步驟之後或與第2步驟同時,藉由平板加壓機42之熱源將第1磁性片材51加熱,使第1磁性片材51予以C階段化(實施第6步驟之一部分)。After the second step or at the same time as the second step, the first
(第3步驟)
於第3步驟中,首先,解除圖8B所示之平板加壓機42之加壓,繼而,如圖8C所示,自平板加壓機42取出第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。(Step 3)
In the third step, first, the pressurization of the
繼而,將第1離型片材41自第1磁性片材51之另一表面及配線2之厚度方向另一端緣E4剝離。Then, the
又,將第2離型片材45及離型緩衝片材46自第1磁性片材51之一表面剝離。In addition, the
(第4步驟及第5步驟、第6步驟之其餘部分)
如圖9E所示,同時實施第4步驟及第5步驟。(
如圖9D所示,於第4步驟及第5步驟中,首先,於平板加壓機42配置第1離型片材41、第3磁性片材53、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45。再者,第1磁性片材51及第3磁性片材53均為B階段。As shown in FIG. 9D, in the fourth step and the fifth step, first, the
隨後,如圖9E所示,藉由平板加壓機42對第1磁性片材51及第3磁性片材53進行加壓。Subsequently, as shown in FIG. 9E, the first
藉此,第2磁性片材52被覆第1磁性片材51之厚度方向一表面。Thereby, the second
第3磁性片材53以被覆配線2之厚度方向另一端緣E4之方式配置於第1磁性片材51之厚度方向另一表面。此時,抑制了於C階段且相對硬質之第1磁性片材51之另一表面之移動,且抑制了配線2之厚度方向另一端緣E4向第3磁性片材53之對向部28陷入。即,第3磁性片材53之一表面可維持平坦狀。The third
其後,藉由平板加壓機42之熱源將第2磁性片材52及第3磁性片材53加熱,使第2磁性片材52及第3磁性片材53予以C階段化(實施第6步驟之其餘部分)。After that, the second
藉此,獲得具備配線2及磁性層3之電感器1。Thereby, the
如圖9F所示,自平板加壓機42取出電感器1。As shown in FIG. 9F, the
第1實施形態及第2實施形態中,較佳為第1實施形態。根據第1實施形態,於第6步驟中,使第1黏合劑91及第3黏合劑93之B階段熱硬化性成分同時C階段化,故而與對第1黏合劑91及第3黏合劑93之B階段熱硬化性成分依序實施C階段化之第2實施形態相比,可縮短製造時間。因此,可容易地製造電感器1。Among the first embodiment and the second embodiment, the first embodiment is preferable. According to the first embodiment, in the sixth step, the B-stage thermosetting components of the
<第2實施形態之變化例> 於變化例中,對與第2實施形態相同之構件及步驟附上相同之參照符號,並省略其詳細之說明。又,除特別記載以外,變化例發揮與第2實施形態相同之作用效果。進而,可將第2實施形態及其變化例適當組合。<Variations of the second embodiment> In the modified example, the same reference numerals are attached to the same members and steps as in the second embodiment, and detailed descriptions thereof are omitted. In addition, the modified example exhibits the same functions and effects as the second embodiment except for special descriptions. Furthermore, the second embodiment and its modification examples can be appropriately combined.
於第2實施形態中,同時實施第4步驟及第5步驟、以及第6步驟之其餘部分。但是,可實施第4步驟及第5步驟,然後實施第6步驟之其餘部分。In the second embodiment, the fourth step, the fifth step, and the rest of the sixth step are simultaneously implemented. However, steps 4 and 5 can be implemented, and then the rest of
於第2實施形態中,同時實施第4步驟與第5步驟。但是,亦可依序實施第4步驟與第5步驟。In the second embodiment, the fourth step and the fifth step are simultaneously implemented. However, the fourth step and the fifth step can also be performed in sequence.
於該變化例中,如圖10A~圖12H所示,依序實施第1步驟、第2步驟、第4步驟、第3步驟及第5步驟。又,第6步驟係分批地實施。In this modified example, as shown in FIGS. 10A to 12H, the first step, the second step, the fourth step, the third step, and the fifth step are sequentially performed. In addition, the sixth step is implemented in batches.
如圖10A所示,於第1步驟中,將配線2配置於第1離型片材41之厚度方向一表面。As shown in FIG. 10A, in the first step, the
如圖10B所示,隨後實施第2步驟,並且使第1磁性片材51予以C階段化。即,實施第6步驟之一部分。具體而言,藉由平板加壓機42,將第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46依序夾住,隨後,藉由平板加壓機42,介隔第1離型片材41、第2離型片材45及離型緩衝片材46對配線2及第1磁性片材51進行熱壓。又,藉由平板加壓機42之熱源,使第1磁性片材51予以C階段化(實施第6步驟之一部分)。As shown in FIG. 10B, the second step is subsequently implemented, and the first
如圖11D所示,隨後實施第4步驟。具體而言,首先,解除圖10B所示之平板加壓機42之加壓,繼而,如圖10C所示,於將第1離型片材41、配線2及第1磁性片材51配置於平板加壓機42之狀態下,自平板加壓機42取出第2離型片材45及離型緩衝片材46。As shown in Fig. 11D, the fourth step is subsequently implemented. Specifically, first, the pressurization of the
其後,於第4步驟中,將第2磁性片材52及第2離型片材45另行配置於第1磁性片材51之厚度方向一側。After that, in the fourth step, the second
如圖11D所示,繼而,使用平板加壓機42對第2磁性片材52進行熱壓。藉此,第2磁性片材52被覆第1磁性片材51之一表面。As shown in FIG. 11D, next, the second
如圖11F所示,隨後實施第3步驟。As shown in FIG. 11F, the third step is then implemented.
於第3步驟中,具體而言,首先,解除圖11D所示之平板加壓機42之加壓,自平板加壓機42取出第1離型片材41、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45。In the third step, specifically, first, the pressurization of the
於第3步驟中,繼而,如圖11E所示,將第1離型片材41自第1磁性片材51之另一表面及配線2之厚度方向另一端緣E4剝離。In the third step, then, as shown in FIG. 11E, the
如圖12G所示,隨後實施第5步驟。As shown in Figure 12G, the fifth step is then implemented.
如圖11F所示,於第5步驟中,首先,具體而言,將第1離型片材41、第3磁性片材53、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45配置於平板加壓機42。As shown in FIG. 11F, in the fifth step, first, specifically, the
於第5步驟中,如圖12G所示,藉由平板加壓機42對第3磁性片材53進行熱壓。藉此,第3磁性片材53以被覆配線2之厚度方向另一端緣E4之方式配置於C階段之第1磁性片材51之另一表面。In the fifth step, as shown in FIG. 12G, the third
於第5步驟之後或與第5步驟同時地,實施第6步驟之其餘部分。具體而言,藉由平板加壓機42之熱源,使第2磁性片材52及第3磁性片材53予以C階段化,形成包含第3磁性片材53、第1磁性片材51及第2磁性片材52之磁性層3。藉此,獲得具備配線2及被覆配線2之磁性層3之電感器1。After
如圖12H所示,其後,自平板加壓機42取出電感器1。As shown in FIG. 12H, after that, the
又,於上述變化例中,與圖10B所示之對配線2配置第1磁性片材51之第2步驟同時地,使第1磁性片材51予以C階段化,但使第1磁性片材51予以C階段化之時期只要為將第1磁性片材51之另一表面配置於第3磁性片材53之第5步驟(參照圖5G)前,則並無特別限定,例如亦可與圖11D所示之配置第2磁性片材52之第4步驟一起實施。Furthermore, in the above-mentioned modification, simultaneously with the second step of arranging the first
又,可使第1磁性片材51及第2磁性片材52同時C階段化。將第2磁性片材52配置於B階段之第1磁性片材51之一表面,其後,使第1磁性片材51及第2磁性片材52同時C階段化。
又,可使第2磁性片材52予以C階段化,其後,將第3磁性片材53配置於第1磁性片材51之另一表面,繼而,使其C階段化。In addition, the first
又,亦可將第3磁性片材53配置於第1磁性片材51之另一表面,其後,將第2磁性片材52配置於第1磁性片材51之一表面。於此情形時,亦可使第3磁性片材53及第2磁性片材52同時C階段化,且使第3磁性片材53予以C階段化,其後,使第2磁性片材52予以C階段化。Furthermore, the third
又,亦可如圖13A所示,於第1步驟中,將配線2配置於C階段之第3磁性片材53(基板之一例)之厚度方向一表面,而非配置於第1離型片材41。In addition, as shown in FIG. 13A, in the first step, the
具體而言,首先,製作C階段之第3磁性片材53,並將其配置於第1離型片材41之厚度方向一表面。第3磁性片材53中之第3黏合劑93含有B階段熱硬化性成分之硬化物。Specifically, first, the third
繼而,藉由平板加壓機42夾住第1離型片材41、C階段之第3磁性片材53、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。Then, the
如圖13B所示,實施第2步驟。於該第2步驟中,藉由平板加壓機42依序夾住第1離型片材41、第3磁性片材53、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。As shown in Fig. 13B, the second step is performed. In this second step, the
繼而,藉由平板加壓機42介隔第1離型片材41、第2離型片材45及離型緩衝片材46對第3磁性片材53、配線2及第1磁性片材51進行熱壓。藉此,第1磁性片材51以被覆配線2之圓周面之優弧之方式配置於C階段之第3磁性片材53之厚度方向一表面。Then, the
隨後,於第4步驟中,首先,解除圖13B所示之平板加壓機42之加壓,繼而,如圖13C所示,於將第1離型片材41、第3磁性片材53、配線2及第1磁性片材51配置於平板加壓機42之狀態下,自平板加壓機42取出第2離型片材45及離型緩衝片材46。Subsequently, in the fourth step, first, the pressurization of the
隨後,於之後之第4步驟中,另行將第2磁性片材52及第2離型片材45配置於第1磁性片材51之厚度方向一側。藉由平板加壓機42夾住第1離型片材41、第3磁性片材53、配線2、第1磁性片材51、第2磁性片材52及第2離型片材45。Subsequently, in the subsequent fourth step, the second
其後,如圖14D所示,藉由平板加壓機42對第2磁性片材52進行加壓。Thereafter, as shown in FIG. 14D, the second
其後,使第2磁性片材52及第1磁性片材51予以C階段化。藉此,形成包含第3磁性片材53、第1磁性片材51及第2磁性片材52之磁性層3。After that, the second
其後,如圖14E所示,獲得電感器1。Thereafter, as shown in FIG. 14E,
於上述變化例中,使第1磁性片材51及第2磁性片材52同時C階段化,但例如亦可於使第1磁性片材51予以C階段化之後,使第2磁性片材52予以C階段化。In the above modification, the first
<其他變化例> 於該變化例中,對與第1及第2實施形態相同之構件及步驟附上相同之參照符號,並省略其詳細之說明。又,除特別記載以外,變化例可發揮與第1及第2實施形態相同之作用效果。進而,可將第1及第2實施形態以及其變化例適當組合。<Other variation examples> In this modified example, the same reference numerals are attached to the same members and steps as in the first and second embodiments, and detailed descriptions thereof are omitted. In addition, unless otherwise specified, the modified example can exhibit the same effects as the first and second embodiments. Furthermore, the first and second embodiments and their modified examples can be appropriately combined.
如圖15A所示,於第1步驟中,可介隔感壓接著層61將配線2配置於第1離型片材41之一表面。As shown in FIG. 15A, in the first step, the
感壓接著層61於第2方向上延伸且形成為厚度較薄之細片狀。感壓接著層61之第1方向之長度相對於配線2之半徑R之比率例如為0.5以下、0.25以下。The pressure-
如圖15B所示,於第2步驟中,第1磁性片材51以填充於感壓接著層61之第1方向兩側之方式被覆配線2之圓周面之優弧。As shown in FIG. 15B, in the second step, the first
如圖15C所示,電感器1於第3磁性片材53與厚度方向另一端緣E4之間可不殘存感壓接著層61,或者,雖未圖式,但亦可於第2步驟後去除感壓接著層61。As shown in FIG. 15C, the
又,如圖16A所示,可於第1步驟中,將配線2以隔開間隙62之方式配置於第1離型片材41之一側。例如,藉由於配線2之第2方向兩端部與第1離型片材41之間介置隔離件(未圖示),而使第2方向之兩側拉伸,並且確保將配線2之厚度方向另一端緣E4與配線2之一表面隔開之間隙62。Moreover, as shown in FIG. 16A, in the first step, the
如圖16B所示,於第2步驟之熱壓中,第1磁性片材51填充至間隙62中,被覆配線2之整個圓周面。As shown in FIG. 16B, in the hot pressing in the second step, the first
其後,如圖16C所示,利用第2磁性片材52被覆第1磁性片材51之一表面。Thereafter, as shown in FIG. 16C, one surface of the first
其後,例如同時實施加熱及加壓,使第1磁性片材51之第1黏合劑91及第2磁性片材52之第2黏合劑92予以C階段化。After that, for example, heating and pressure are simultaneously applied to make the
藉此,形成包含第1磁性片材51及第2磁性片材52之磁性層3。Thereby, the
於該方法中,可不配置第3磁性片材53,而利用磁性層3被覆配線2之厚度方向另一端緣E4。因此,可削減步驟數。In this method, the third
再者,如圖16C之假想線所示,亦可視需要進而將第3磁性片材53配置於第2磁性片材52之另一表面。Furthermore, as shown by the imaginary line in FIG. 16C, the third
又,亦可如圖2A所示,於第1步驟中,使配線2與第1離型片材41之一表面接觸,如圖6B之假想線箭頭所示,隨後調整第2步驟中之加壓條件等,使形成第1磁性片材51之第1磁性組合物以被覆配線2之厚度方向另一端緣E4之方式,沒入配線2之厚度方向另一側。於該變化例中,無需上述隔離件,因此,可容易地製造電感器1。Alternatively, as shown in FIG. 2A, in the first step, the
於第1實施形態及第2實施形態中,列舉了第1各向異性磁性粒子81作為第1磁性粒子之一例,但,例如第1磁性粒子亦可不具有各向異性,而例如具有各向同性。作為此種第1各向同性磁性粒子之形狀,例如可列舉大致球形狀。作為大致球形狀之第1各向同性磁性粒子,例如可列舉大致球形狀之鐵粒子等。第1各向同性磁性粒子之平均粒徑例如為0.1 μm以上,較佳為0.5 μm以上,且例如為200 μm以下,較佳為150 μm以下。In the first embodiment and the second embodiment, the first anisotropic
又,如第1實施形態之圖2A、其變化例之圖4A、第2實施形態之圖8A及其變化例之圖10A及圖13A所示,第1各向異性磁性粒子81於第1磁性片材51中在面方向上配向,但並不限定於此,亦可不於第1磁性片材51中沿著面方向配向。In addition, as shown in FIG. 2A of the first embodiment, FIG. 4A of its modification, and FIG. 8A of the second embodiment and FIG. 10A and FIG. 13A of its modification, the first anisotropic
於第1實施形態及第2實施形態中,列舉了第3各向異性磁性粒子83作為第3磁性粒子之一例,例如,第3磁性粒子可不具有各向異性,而例如具有各向同性。作為此種第3各向同性磁性粒子之形狀,例如可列舉大致球形狀。作為大致球形狀之第3各向同性磁性粒子,例如可列舉大致球形狀之鐵粒子等。第3各向同性磁性粒子之平均粒徑例如為0.1 μm以上,較佳為0.5 μm以上,且例如為200 μm以下,較佳為150 μm以下。In the first embodiment and the second embodiment, the third anisotropic
又,如第1實施形態之圖3D、其變化例之圖5F、第2實施形態之圖9D、其變化例之圖11F及圖13C所示,第3各向異性磁性粒子83於第3磁性片材53中在面方向上配向,但並不限定於此,亦可不於第3磁性片材53中沿著面方向配向。In addition, as shown in Fig. 3D of the first embodiment, Fig. 5F of the modification, Fig. 9D of the second embodiment, Fig. 11F and Fig. 13C of the modification, the third anisotropic
如圖1B及圖7B所示,於第1實施形態及第2實施形態中,各向異性磁性粒子8至少於第1區域11中沿著配線2之圓周方向配向,但並不限定於此,亦可不沿著配線2之圓周方向配向。As shown in FIGS. 1B and 7B, in the first embodiment and the second embodiment, the anisotropic
又,磁性層3中之磁性粒子(第1磁性粒子、第2各向異性磁性粒子82及第3磁性粒子)之比率(填充率)不限於上述,例如隨著遠離配線2,可變高抑或變低。為了製造磁性層3中之磁性粒子之比率隨著遠離配線2而變高之電感器1,例如,將第2磁性片材52中之第2各向異性磁性粒子82之存在比率設定得高於第1磁性片材51中之磁性粒子之存在比率。In addition, the ratio (filling rate) of the magnetic particles (the first magnetic particle, the second anisotropic
又,如上所述,於磁性層3中之磁性粒子之填充率隨著遠離配線2而變高或變低之變化例中,磁性層3可為複數層。於此情形時,可利用複數片磁性片材中之用以被覆配線2之外周面之1片磁性片材對配線2進行加壓,其後,用其餘之磁性片材對其等進行加壓,或者,亦可一次(統一)用複數片磁性片材對配線2進行加壓。例如,可一次利用一實施形態之第1磁性片材51、第2磁性片材52及第3磁性片材53對配線2進行加壓。具體而言,可同時實施圖13A所示之第1步驟、圖13B所示之第2步驟及圖13C所示之第4步驟。
[實施例]Furthermore, as described above, in the variation example where the filling rate of the magnetic particles in the
以下示出實施例及比較例,更具體地說明本發明。再者,本發明不受任何實施例及比較例限定。又,以下之記載中所使用之調配比率(含有比率)、物性值及參數等具體數值可代替上述「用以實施發明之形態」中所記載之對應於其等之調配比率(含有比率)、物性值及參數等相應記載之上限(定義為「以下」、「未達」之數值)或下限(定義為「以上」、「超過」之數值)。Examples and comparative examples are shown below to explain the present invention more specifically. In addition, the present invention is not limited by any Examples and Comparative Examples. In addition, specific numerical values such as blending ratios (content ratios), physical property values, and parameters used in the following descriptions can be substituted for the blending ratios (content ratios) corresponding to them described in the above-mentioned "modes for implementing the invention" The upper limit (defined as the value of "below" or "not reached") or lower limit (defined as the value of "above" or "exceeding") corresponding to the corresponding records of physical property values and parameters.
實施例1
<基於第1實施形態之電感器之製造例>
於實施例1中,基於第1實施形態來製造電感器1。具體而言,如圖2A~3F所示,依序實施第1步驟、第2步驟及第3步驟,隨後,同時實施第4步驟、第5步驟及第6步驟。Example 1
<Production example of inductor based on the first embodiment>
In Example 1, the
(第1步驟)
準備配線2及第1離型片材41。(Step 1)
The
具體而言,準備半徑R為110 μm之配線2。導線6之半徑R1為100 μm,絕緣層7之厚度R2為10 μm。Specifically, wiring 2 with a radius R of 110 μm is prepared. The radius R1 of the
另行準備厚度50 μm之包含PET之第1離型片材41。Separately, a
繼而,如圖2A所示,將配線2配置於第1離型片材41之厚度方向一表面。Then, as shown in FIG. 2A, the
(第2步驟)
準備第1磁性片材51、第2離型片材45及離型緩衝片材46。(Step 2)
The first
具體而言,準備由內側片材54與外側片材55之積層片材構成之第1磁性片材51作為B階段片材,該內側片材54之各向異性磁性粒子8之比率為50體積%,該外側片材55之各向異性磁性粒子8之比率為60體積%。內側片材54及外側片材55之配方係如表1中所記載。Specifically, a first
又,作為第2離型片材45,準備有包含TPX(註冊商標)之離型膜(Mitsui Chemicals Tohcello公司製造)。In addition, as the
又,準備有將2片離型膜OT-A110(積水化學工業公司製造)積層而得之離型緩衝片材46。In addition, a
離型緩衝片材46之厚度(離型膜OT-A110之總厚度)為110 μm,具備厚度為15 μm之第1層47、厚度T2為80 μm之第2層48、及厚度為15 μm之第3層49。第1層47及第3層49之110℃下之拉伸儲存模數E'為190 MPa,其材料含有聚對苯二甲酸丁二酯作為主成分。第2層48之110℃下之拉伸儲存模數E'為5.6 MPa,其材料含有乙烯-甲基丙烯酸甲酯共聚物作為主成分。The thickness of the release buffer sheet 46 (total thickness of the release film OT-A110) is 110 μm, with a
隨後,藉由平板加壓機42依序夾住第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。Subsequently, the
如圖2B所示,繼而,於2 MPa之加壓壓力、110℃且60秒之加壓條件下,藉由平板加壓機42對配線2及第1磁性片材51進行熱壓。As shown in FIG. 2B, next, the
圖17A中示出第2步驟後之配線2及第1磁性片材51之剖面之SEM照片。FIG. 17A shows an SEM photograph of the cross section of the
(第3步驟)
於第3步驟中,首先,解除圖2B所示之平板加壓機42之加壓,繼而,如圖2C所示,自平板加壓機42取出第1離型片材41、配線2、第1磁性片材51、第2離型片材45及離型緩衝片材46。繼而,將第1離型片材41自第1磁性片材51之另一表面及配線2之厚度方向另一端緣E4剝離。又,將第2離型片材45及離型緩衝片材46自第1磁性片材51之一表面剝離。(Step 3)
In the third step, first, the pressurization of the
(第4步驟、第5步驟及第6步驟)
準備有第2磁性片材52及第3磁性片材53。(
具體而言,準備5片具有與第1磁性片材51中之外側片材55相同配方(各向異性磁性粒子8之比率為60體積%)之片材,並準備由其等之積層片材構成之第2磁性片材52作為B階段片材。Specifically, prepare 5 sheets with the same formula as the
又,準備4片與第1磁性片材51中之外側片材55相同配方(各向異性磁性粒子8之比率為60體積%)之片材、及1片與第1磁性片材51中之內側片材54相同配方(各向異性磁性粒子8之比率為50體積%)之片材,將其等積層,準備由其等之積層片材構成之第3磁性片材53作為B階段片材。In addition, prepare 4 sheets of the same formulation as the
如圖3D所示,隨後,於第1板43及第2板44之間,朝向厚度方向一側依序配置第1離型片材41、第3磁性片材53、配線2及第1磁性片材51、第2磁性片材52、以及第2離型片材45(PET膜)。As shown in FIG. 3D, subsequently, between the
如圖3E所示,繼而,於2 MPa之加壓壓力、170℃且900秒之加壓條件下,平板加壓機42對第3磁性片材53、配線2、第1磁性片材51及第2磁性片材52進行熱壓。藉此,使第1黏合劑91、第2黏合劑92及第3黏合劑93中之熱硬化性成分C階段化。As shown in FIG. 3E, then, under the pressurizing conditions of 2 MPa, 170° C. and 900 seconds, the
藉此,藉由包含C階段之第1磁性片材51、第2磁性片材52及第3磁性片材53之磁性層3,被覆配線2之圓周面,製造圖1A〜圖1B所示之電感器1。Thereby, the circumferential surface of the
其後,如圖3F所示,自平板加壓機42取出電感器1。After that, as shown in FIG. 3F, the
將電感器1之剖面之SEM照片示於圖17B中。The SEM photograph of the cross section of the
實施例2
<基於第1實施形態之變化例之電感器之製造例>
於實施例2中,基於圖4A~圖6H所示之第1實施形態之變化例來製造電感器1。具體而言,除了依序實施第1步驟、第2步驟、第4步驟、第3步驟、第5步驟及第6步驟以外,以與實施例1相同之方式進行處理。Example 2
<Production example of inductor based on the variation of the first embodiment>
In Example 2, the
該電感器1係如圖7A~圖7B所示,將其剖面之SEM照片示於圖18中。The
實施例3~實施例5
根據表1,除了變更第1磁性片材51之配方以外,以與實施例1相同之方式進行處理,製造電感器1。Example 3 ~ Example 5
According to Table 1, except for changing the formula of the first
比較例1
於第1板43之厚度方向一側,依序配置厚度50 μm之包含PET之第1離型片材41、C階段之第3磁性片材53、B階段之第1接著層、與實施例1相同之配線2、B階段之第2接著層、C階段之第2磁性片材52、包含TPX之第2離型片材45、將2片離型膜OT-A110(積水化學工業公司製造)積層所得之離型緩衝片材46,將由其等構成之積層體夾入第1板43及第2板44之間。Comparative example 1
On one side in the thickness direction of the
再者,第1接著層及第2接著層均係不包含各向異性磁性粒子8,而包含熱硬化性樹脂之B階段片材。第1接著層及第2接著層之厚度分別為2 μm。In addition, both the first adhesive layer and the second adhesive layer are B-stage sheets that do not include the anisotropic
C階段之第2磁性片材52及C階段之第3磁性片材53之配方係如表1所記載,均為完全硬化之硬化體。The formulations of the second
隨後,於平板加壓機42、2 MPa之加壓壓力、170℃且900秒之加壓條件下,藉由平板加壓機42對上述積層體進行熱壓,而製造電感器1。Subsequently, the laminated body was hot-pressed by the flat-
將比較例1之電感器1之剖面之SEM照片示於圖19中。The SEM photograph of the cross section of the
由圖19可知,於配線2之第2圓弧面24以及第1方向兩端緣E2及E3與第1磁性片材51(磁性層3)之間形成有孔隙。As can be seen from FIG. 19, voids are formed between the second
比較例2
於第1板43之厚度方向一側,依序配置厚度50 μm之包含PET之第1離型片材41、C階段之第3磁性片材53、第1感壓接著層、與實施例1相同之配線2、第2感壓接著層、C階段之第2磁性片材52、包含TPX之第2離型片材45、將2片離型膜OT-A110(積水化學工業公司製造)積層所得之離型緩衝片材46,將包含其等之積層體夾入第1板43及第2板44之間。Comparative example 2
On one side of the
再者,第1感壓接著層及第2感壓接著層均係不包含各向異性磁性粒子8,而包含丙烯酸系感壓接著劑(黏著劑)之感壓接著帶(黏著帶)。第1感壓接著層及第2感壓接著層之厚度分別為5 μm。Furthermore, both the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer do not include anisotropic
C階段之第2磁性片材52及C階段之第3磁性片材53之配方係如表1所記載,均為完全硬化之硬化體。The formulations of the second
隨後,於平板加壓機42、加壓壓力2 MPa、110℃且60秒之加壓條件下,藉由平板加壓機42對上述積層體進行熱壓,而製造電感器1。Subsequently, the laminated body was hot-pressed by the
於配線2之第2圓弧面24以及第1方向兩端緣E2及E3與第1磁性片材51(磁性層3)之間形成有孔隙。A void is formed between the second
<填充率>
根據SEM照片之剖視圖之二值化,算出電感器1之周邊區域4中之各向異性磁性粒子8之填充率。具體而言,於SEM照片中,將白色鑑定為各向異性磁性粒子8,將黑色鑑定為黏合劑9,然後,根據第1區域11中白色之剖面積之比率,求出各向異性磁性粒子8之填充率(存在比率)。<Filling rate>
According to the binarization of the cross-sectional view of the SEM photograph, the filling rate of the anisotropic
將其等之結果示於表1中。The results are shown in Table 1.
<電感>
使導線6之傳輸方向兩端部自絕緣層7及磁性層3露出而形成2個露出部,使該等露出部連接於阻抗分析器(Agilent公司製造:4294A),求出電感,以下述基準評估電感器1之電感。
◎:電感為110 H以上
○:電感為90 H以上,未達110 H
△:電感為60 H以上,未達90 H
×:電感未達60 H
將其等之結果示於表1中。<Inductance>
The two ends of the
[表1]
再者,上述發明係作為本發明之例示之實施形態而提供,但此僅為例示,不應限定性地解釋。本領域技術人員所明確之本發明之變化例包含於下述申請專利範圍中。 [產業上之可利用性]In addition, the above-mentioned invention is provided as an exemplary embodiment of this invention, but this is only an illustration, and should not be interpreted restrictively. Variations of the present invention clear to those skilled in the art are included in the scope of the following patent applications. [Industrial availability]
電感器例如搭載於電子機器等。The inductor is mounted on, for example, electronic equipment.
1:電感器 2:配線 3:磁性層 4:周邊區域 5:外側區域 6:導線 7:絕緣層 8:各向異性磁性粒子 9:黏合劑 11:第1區域 12:第2區域 13:第3區域 14:第4區域 15:第5區域 16:第6區域 17:第1粒子 18:第2粒子 19:第3粒子 20:交叉部(頂部) 21:第1交叉部(第1頂部) 22:第2交叉部(第2頂部) 23:第1半圓弧面 24:第2半圓弧面 25:隆起部 26:平坦部 27:第2頂部 28:對向部 29:第2平坦部 34:重疊部分 35:非重疊部分 38:被擠壓部分 41:第1離型片材 42:平板加壓機 43:第1板 44:第2板 45:第2離型片材 46:離型緩衝片材 47:第1層 48:第2層 49:第3層 51:第1磁性片材 52:第2磁性片材 53:第3磁性片材 54:內側片材 55:外側片材 61:感壓接著層 62:間隙 81:第1各向異性磁性粒子(第1磁性粒子之一例) 82:第2各向異性磁性粒子(第2磁性粒子之一例) 83:第3各向異性磁性粒子(第3磁性粒子之一例) 91:第1黏合劑 92:第2黏合劑 93:第3黏合劑 A1:第1假想圓弧 A2:第2假想圓弧 C:配線之中心 C1:中心角(第3區域) C2:中心角(第4區域) C3:第1假想圓弧之中心 C4:第2假想圓弧之中心 E1:端緣 E2:端緣 E3:端緣 E4:端緣 E5:第1端 E6:第2端 E7:第3端 E8:第4端 L1:第1假想線 L2:第2假想線 L3:第3假想線 R1:半徑 R2:厚度 α1:中心角(第3區域)之角度 α2:中心角(第4區域)之角度1: Inductor 2: Wiring 3: Magnetic layer 4: Surrounding area 5: Outer area 6: Wire 7: Insulation layer 8: Anisotropic magnetic particles 9: Adhesive 11: Zone 1 12: Zone 2 13: Zone 3 14: Zone 4 15: Zone 5 16: Zone 6 17: The first particle 18: The second particle 19: The third particle 20: Intersection (top) 21: 1st intersection (1st top) 22: 2nd intersection (2nd top) 23: The first semicircular arc surface 24: The second semicircular arc surface 25: Uplift 26: flat part 27: Top 2 28: Opposite Department 29: 2nd flat part 34: Overlap 35: non-overlapping part 38: Squeezed part 41: The first release sheet 42: Flat press 43: first board 44: second board 45: The second release sheet 46: Release buffer sheet 47: Level 1 48: Layer 2 49: Layer 3 51: The first magnetic sheet 52: The second magnetic sheet 53: The third magnetic sheet 54: Inside sheet 55: Outer sheet 61: Pressure sensitive adhesive layer 62: gap 81: The first anisotropic magnetic particle (an example of the first magnetic particle) 82: The second anisotropic magnetic particle (an example of the second magnetic particle) 83: The third anisotropic magnetic particle (an example of the third magnetic particle) 91: The first adhesive 92: The second adhesive 93: third adhesive A1: The first imaginary arc A2: The second imaginary arc C: The center of wiring C1: Center angle (zone 3) C2: Center angle (zone 4) C3: Center of the first imaginary arc C4: The center of the second imaginary arc E1: End edge E2: End edge E3: End edge E4: End edge E5: End 1 E6: end 2 E7: End 3 E8: End 4 L1: The first imaginary line L2: The second imaginary line L3: 3rd imaginary line R1: radius R2: thickness α1: The angle of the center angle (the third area) α2: The angle of the center angle (the 4th area)
圖1A~圖1B係根據本發明之第1實施形態獲得之電感器之剖視圖,圖1A係剖面經陰影處理之剖視圖,圖1B係表示磁性層中之各向異性磁性粒子之配向之剖視圖。
圖2A~圖2C係說明製造第1實施形態之電感器之方法之步驟圖,圖2A表示於第1離型片材配置配線之第1步驟,圖2B表示利用第1磁性片材被覆配線之第2步驟,圖2C表示去除第1離型片材之第3步驟。
圖3D~圖3F係繼圖2C之後,說明製造第1實施形態之電感器之方法之步驟圖,圖3D表示配置第2磁性片材及第3磁性片材之步驟,圖3E表示利用第2磁性片材被覆第1磁性片材之一表面之第4步驟、及利用第3磁性片材被覆B階段之第1磁性片材之另一表面之第5步驟,圖3F表示取出電感器之步驟。
圖4A〜圖4C係說明第1實施形態之變化例之製造方法之步驟圖,圖4A表示於第1離型片材配置配線之第1步驟,圖4B表示利用第1磁性片材被覆配線之第2步驟,圖4C表示配置第2磁性片材之步驟。
圖5D~圖5F係繼圖4C之後,說明第1實施形態之變化例之製造方法之步驟圖,圖5D表示利用第2磁性片材被覆第1磁性片材之一表面之第4步驟,圖5E表示去除第1離型片材之第3步驟,圖5F表示配置第3磁性片材之步驟。
圖6G~圖6H係繼圖5F之後,說明第1實施形態之變化例之製造方法之步驟圖,圖6G表示利用第3磁性片材被覆B階段之第1磁性片材之另一表面之第5步驟,圖6H表示取出電感器之步驟。
圖7A~圖7B係根據本發明第2實施形態獲得之電感器之剖視圖,圖7A係表示剖面經陰影處理之剖視圖,圖7B係表示磁性層中之各向異性磁性粒子之配向之剖視圖。
圖8A~圖8C係說明製造第2實施形態之電感器之方法之步驟圖,圖8A表示於第1離型片材配置配線之第1步驟,圖8B表示利用第1磁性片材被覆配線之第2步驟,圖8C表示去除第1離型片材之第3步驟。
圖9D~圖9F係繼圖8C之後,說明製造第2實施形態之電感器之方法之步驟圖,圖9D表示配置第2磁性片材及第3磁性片材之步驟,圖9E表示利用第2磁性片材被覆第1磁性片材之一表面之第4步驟、及利用第3磁性片材被覆C階段之第1磁性片材之另一表面之第5步驟,圖9F表示取出電感器之步驟。
圖10A~圖10C係說明第2實施形態之變化例之製造方法之步驟圖,圖10A表示於第1離型片材配置配線之第1步驟,圖10B表示利用第1磁性片材被覆配線之第2步驟,圖10C表示配置第2磁性片材之步驟。
圖11D~圖11F係繼圖10C之後,說明第2實施形態之變化例之製造方法之步驟圖,圖11D表示利用第2磁性片材被覆第1磁性片材之一表面之第4步驟,圖11E表示去除第1離型片材之第3步驟,圖11F表示配置第3磁性片材之步驟。
圖12G~圖12H係繼圖11F之後,說明第2實施形態之變化例之製造方法之步驟圖,圖12G表示利用第3磁性片材被覆C階段之第1磁性片材之另一表面之第5步驟,圖12H表示取出電感器之步驟。
圖13A~圖13C係說明第2實施形態之又一變化例之製造方法之步驟圖,圖13A表示於C階段之第3磁性片材配置配線之步驟,圖13B表示利用第1磁性片材被覆配線及第3磁性片材之一表面之步驟,圖13C表示配置第2磁性片材之步驟。
圖14D~圖14E係繼圖13C之後,說明第2實施形態之又一變化例之製造方法之步驟圖,圖14D表示利用第2磁性片材被覆第1磁性片材之步驟,圖14E表示取出電感器之步驟。
圖15A~圖15C係電感器之製造方法之變化例之剖視圖,圖15A表示介隔感壓接著層將配線配置於第1離型片材之一表面之步驟,圖15B表示利用第1磁性片材被覆配線之圓周面中剖視時超過180°之區域、及第1磁性片材之一表面之步驟,圖15C表示獲得電感器之步驟。
圖16A~圖16C係電感器之製造方法之變化例之剖視圖,圖16A表示將配線與第1離型片材隔開間隔地配置之步驟,圖16B表示利用第1磁性片材被覆配線之圓周面及第1磁性片材之一表面之步驟,圖16C表示獲得電感器之步驟。
圖17A~圖17B係實施例1之SEM照片之圖像處理圖,圖17A係第2步驟後之SEM照片,圖17B係電感器之SEM照片。
圖18係實施例2之電感器之SEM照片之圖像處理圖。
圖19係比較例1之電感器之SEM照片之圖像處理圖。1A to 1B are cross-sectional views of an inductor obtained according to the first embodiment of the present invention, FIG. 1A is a cross-sectional view of the cross-section shaded, and FIG. 1B is a cross-sectional view showing the alignment of anisotropic magnetic particles in the magnetic layer.
2A to 2C are diagrams illustrating the steps of the method of manufacturing the inductor of the first embodiment. FIG. 2A shows the first step of arranging the wiring on the first release sheet, and FIG. 2B shows the first step of covering the wiring with the first magnetic sheet. The second step, FIG. 2C shows the third step of removing the first release sheet.
Figures 3D to 3F are diagrams illustrating steps of the method of manufacturing the inductor of the first embodiment following Figure 2C. Figure 3D shows the steps of arranging the second magnetic sheet and the third magnetic sheet, and Figure 3E shows the use of the second magnetic sheet. The fourth step of covering one surface of the first magnetic sheet with a magnetic sheet, and the fifth step of covering the other surface of the first magnetic sheet of stage B with a third magnetic sheet. Figure 3F shows the step of taking out the inductor .
4A ~ 4C is a step diagram illustrating the manufacturing method of a modification of the first embodiment, FIG. 4A shows the first step of disposing the wiring on the first release sheet, and FIG. 4B shows the first step of covering the wiring with the first magnetic sheet The second step, FIG. 4C shows the step of arranging the second magnetic sheet.
Figures 5D to 5F are step diagrams illustrating the manufacturing method of the modification of the first embodiment following Figure 4C. Figure 5D shows the fourth step of covering one surface of the first magnetic sheet with the second magnetic sheet. 5E shows the third step of removing the first release sheet, and FIG. 5F shows the step of arranging the third magnetic sheet.
FIGS. 6G to 6H are steps diagrams illustrating the manufacturing method of the modification of the first embodiment following FIG. 5F. FIG. 6G shows the third magnetic sheet covering the other surface of the first magnetic sheet of stage B. 5 steps, Figure 6H shows the steps to take out the inductor.
7A to 7B are cross-sectional views of an inductor obtained according to the second embodiment of the present invention, FIG. 7A is a cross-sectional view of the cross-section shaded, and FIG. 7B is a cross-sectional view of the alignment of anisotropic magnetic particles in the magnetic layer.
8A to 8C are diagrams illustrating the steps of the method of manufacturing the inductor of the second embodiment. FIG. 8A shows the first step of arranging the wiring on the first release sheet, and FIG. 8B shows the first step of covering the wiring with the first magnetic sheet. The second step, Fig. 8C shows the third step of removing the first release sheet.
9D to 9F are subsequent to FIG. 8C, illustrating the steps of the method of manufacturing the inductor of the second embodiment, FIG. 9D shows the steps of disposing the second magnetic sheet and the third magnetic sheet, and FIG. 9E shows the use of the second magnetic sheet. The fourth step of covering one surface of the first magnetic sheet with a magnetic sheet, and the fifth step of covering the other surface of the first magnetic sheet of stage C with a third magnetic sheet. Fig. 9F shows the step of taking out the inductor .
10A to 10C are diagrams illustrating the steps of the manufacturing method of the modification of the second embodiment. FIG. 10A shows the first step of arranging wiring on the first release sheet, and FIG. 10B shows the first step of covering the wiring with the first magnetic sheet. The second step, Fig. 10C shows the step of arranging the second magnetic sheet.
11D to 11F are diagrams illustrating steps of the manufacturing method of a modification of the second embodiment following FIG. 10C. FIG. 11D shows the fourth step of covering one surface of the first magnetic sheet with the second magnetic sheet. 11E shows the third step of removing the first release sheet, and FIG. 11F shows the step of arranging the third magnetic sheet.
Figures 12G to 12H are step diagrams illustrating the manufacturing method of the modification of the second embodiment following Figure 11F. Figure 12G shows the third magnetic sheet covering the other surface of the first magnetic sheet of the
2:配線 2: Wiring
5:外側區域 5: Outer area
6:導線 6: Wire
7:絕緣層 7: Insulation layer
8:各向異性磁性粒子 8: Anisotropic magnetic particles
9:黏合劑 9: Adhesive
12:第2區域
12:
13:第3區域
13:
15:第5區域
15:
16:第6區域
16:
20:交叉部(頂部) 20: Intersection (top)
21:第1交叉部(第1頂部) 21: 1st intersection (1st top)
23:第1半圓弧面 23: The first semicircular arc surface
24:第2半圓弧面 24: The second semicircular arc surface
25:隆起部 25: Uplift
26:平坦部 26: flat part
27:第2頂部
27:
34:重疊部分 34: Overlap
35:非重疊部分 35: non-overlapping part
38:被擠壓部分 38: Squeezed part
41:第1離型片材 41: The first release sheet
42:平板加壓機 42: Flat press
43:第1板 43: first board
44:第2板 44: second board
45:第2離型片材 45: The second release sheet
46:離型緩衝片材 46: Release buffer sheet
47:第1層
47:
48:第2層
48:
49:第3層
49:
51:第1磁性片材 51: The first magnetic sheet
54:內側片材 54: Inside sheet
55:外側片材 55: Outer sheet
81:第1各向異性磁性粒子(第1磁性粒子之一例) 81: The first anisotropic magnetic particle (an example of the first magnetic particle)
91:第1黏合劑 91: The first adhesive
E1:端緣 E1: End edge
E2:端緣 E2: End edge
E3:端緣 E3: End edge
E4:端緣 E4: End edge
Claims (8)
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JP2019044775A JP7398197B2 (en) | 2019-03-12 | 2019-03-12 | Inductor manufacturing method |
JP2019-044775 | 2019-03-12 |
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TW202036614A true TW202036614A (en) | 2020-10-01 |
TWI828865B TWI828865B (en) | 2024-01-11 |
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CN (1) | CN113544806A (en) |
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JP3844270B2 (en) * | 1997-07-22 | 2006-11-08 | Necトーキン株式会社 | Noise suppression parts |
JP5054445B2 (en) * | 2007-06-26 | 2012-10-24 | スミダコーポレーション株式会社 | Coil parts |
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CN113544806A (en) | 2021-10-22 |
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JP2020150063A (en) | 2020-09-17 |
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